MEUCFSGENa

Pall Filter Selection Guide

UltiKleen™ Series

Finer Filtration for High Purity Chemicals

Pall Corporation
25 Harbor Park Drive
Port Washington, NY 11050+1 516 484 3600 telephone+1 800 360 7255 toll free US
Microelectronics@pall.com
Nihon Pall Ltd.
6-５-1, Nishishinjuku,Shinjuku-ku
Tokyo 163-1325 Japan
Phone: +81.3.6901.5710
Fax: +81.3.5322.2109

Visit us on the web at www.pall.com
Pall Corporation has offices and plants throughout the world. For Pall
representatives in your area, please go towww.pall.com/corporate_contact.asp.
Because of technological developments related to the products, systems, and/or services
described herein, the data and procedures are subject to change without notice. Please consult
your Pall representative or visit www.pall.com to verify that this information remains valid.
Products in this document may be covered by one or more of the following patent numbers:
US5543047; US5690765; US6113784; US7083564; US7318800; EP0982061; EP0667800;
EP1380331.
©Copyright 2018. Pall Corporation, Pall,and UltiKleen, Kleen-Change are trademarks ofPall Corporation.® indicates a trademark registered in the USA.
is a service mark of Pall Corporation.

MEUCFSGENaApril 2018

UltiKleen™ Series
Filter Application
Chemicals / Application

SC-1/APM (NH3/H2O2/H2O)
SC-2/HPM (HCl/H2O2)
Chemical Delivery System

Temperature
Range

R.T. up to 90 ˚C
R.T. up to 194 ˚F

Removal Ratings

Product Name

50μm 10μm 0.2μm 0.1μm 50nm

Features
30nm

UltiKleen™ KC

●

●

●

Filter design assures stable ﬂow with excellent ﬂow characteristics.

UltiKleen™ G2 KC

●

●

●

Signiﬁcantly improves ﬂow performance with a larger diameter, G2,
cartridge design that increases ﬁlter area.

●

UltiKleen™ G2 Excellar KC≦150 ˚C≦ 302 ˚F≦170 ˚C≦338 ˚FH3PO4●StripperR.T. up to 194 ˚F

Single Wafer Tool

R.T. up to 120 ˚C
R.T. up to 248 ˚F●Has improved ﬁlter media durability for use with high temperature chemicals.
The optimized ﬁlter structure enables long term stable equipment operation.

●

UltiKleen™ G2 Excellar ERL KC (DV Type)●

Uses a non-dewetting PTFE membrane ﬁlter with a downstream vent structure
designed to prevent the ﬁlter media from dewetting.

UltiKleen™ G3 Excellar ER KC (DV Type)●

Incorporates an improved Kleen-ChangeⓇ structure with larger surface area. This achieves
ﬂow performance equal to or higher than a conventional 50 nm ﬁlter with a 20 nm rated ﬁlter.
Designed to provide high and stable ﬂuid ﬂow performancewith high viscosity chemicals.

●

●

●

●

UltiKleen™ STP KC

●

●

●

Reduces particle contamination by using an optimized media structure
to prevent captured gel particles from passing downstream.

UltiKleen™ JKC●●●A compact. space saving, and low pressure loss disposable assembly with a built-in
high ﬂow UltiKleen™ ﬁlter cartridge. Easily ﬁts commonly used tools and equipment.

UltiKleen™ SPM·G2 KCR.T. up to 90 ˚CIncorporates a non-dewetting PTFE membrane ﬁlter. Uses a high ﬂow 20 nm
membrane ﬁlter with retention established by Pall's proven rating methodology.

●

UltiKleen™ SPM-G2 KC (DV Type)
SPM/Piranha

Incorporates a non-dewetting PTFE membrane ﬁlter. Achieves the ﬂow
performance equal to a conventional 50 nm ﬁlter with a 30 nm rated ﬁlter.

●UltiKleen™ G2 Excellar ER / Excellar ERL KC（H2SO4/H2O2）

20nm

●

UltiKleen™ STG KC●●

Uses a multilayer media structure that efﬁciently captures gel particles
and signiﬁcantly extends ﬁlter service life.

Incorporates a non-dewetting PTFE membrane.
A compact disposable assembly with a built-in 20 nm membrane ﬁlter.

●

UltiKleen™ JKC Excellar ER●

UltiKleen™ G2 Excellar KC

Incorporates a high ﬂow non-dewetting PTFE membrane. This achieves ﬂow performanceequal to or higher than a conventional 50 nm ﬁlter with a 30 nm rated ﬁlter.

●Incorporates a high ﬂow design 20 nm non-dewetting PTFE membrane ﬁlter.
Filter retention is established by Pall's proven rating methodology.

●UltiKleen™ G2 Excellar ER KC

Specifications
UltiKleen™

UltiKleen™ G2

UltiKleen™ G2
Excellar

UltiKleen™ G2
Excellar ER

UltiKleen™ G2
Excellar ERL

UltiKleen™ G3
Excellar ER

UltiKleen™ SPM-G2

Reference Datasheet

E98

E98, A106

E103

E114

——

MEUKSPM

Typical Application

SC-1, SC-2

SC-1, SC-2

SC-1, SC-2

SC-1, SC-2, SPM

SC-1, SC-2, SPM

SC-1, SC-2, SPM

SPM, H3PO420nm

20nm

20nm

FilterRemoval Ratings
Media Material
Filter Areas
Air Bubble Removal(Downstream Vent Construction )Features & Beneﬁts

50nm

0.1μm

0.2μm

50nm

0.1μm

0.2μm

30nm

50nm

50nm

0.1μm

0.2μm

PTFE

PTFE

Surface Modiﬁed PTFE

Surface Modiﬁed PTFE

Surface Modiﬁed PTFE

Surface Modiﬁed PTFE

PTFE

1.2 m2/12.9 ft2（10"Cartridge）

2.2 m2/23.7 ft2（10"Cartridge）

2.2 m2/23.7 ft2（10"Cartridge）

1.9 m2/20.5 ft2（10"Cartridge）

3.0 m2/32 ft2（10"Cartridge）

4.4 m2/47 ft2（10"Cartridge）

1.7 m2/18 ft2（10"Cartridge）

N/A

Available

Available

Available

Available

Available

Only available for 50nm

Adopts non-dewetting PTFE
membrane. Prevents ﬁlter
media from drying, enabling
stable circulating ﬂow rate.
Achieves ﬂow characteristics
equal to conventional 50 nm
ﬁlter with a 30 nm ﬁlter.

20nm ﬁlter proven by Pall's
original rating method.
Highly durable ﬁlter for hightemperature, high-viscosity
ﬂuid contributes to long-term
stable operation ofequipment.

Improved ﬁlter cartridge structure
increases effective ﬁltration area.
The result is signiﬁcantly higher
ﬂow performance suitable for thedemands of large diameter wafer
fabrication processes.

Kleen-Change® structure
redesigned for larger ﬁltration area
than ever and high ﬂow rate.
20nm microﬁltration and increased
circulating ﬂow rate inside the bath
contribute to signiﬁcantly improved
in-bath replacement speed.

Structure for improving ﬁlter
media durability at hightemperatures and preventing
damages to ﬁlter media.
Enables long-term stableequipment operation.

Improved ﬂow characteristics
with enlarged ﬁltration area.
This increases ﬂuid turnoverrate for improved cleaning
bath performance.

Signiﬁcantly improved ﬂow
characteristics for largediameter wafer fabrication
process.
Copes with larger pumpcapacity.

23

UltiKleen™ Series

Application at wet cleaning process

Flow Characteristics - 10" Kleen-Change® Assembly

Chemical Delivery System (CDS)

PALL

PALL

Batch (Recirculating) Cleaning Type

PALL

Product Name
(Kleen-Change®)

Removal Ratings

Liquid Flow Rate [L/min] (at 30kPa)

20nm 30nm 50nm 0.1μm 0.2μm 10

UltiKleen™

●

●

●

UltiKleen™ G2

●

●

●

UltiKleen™ SPM-G2●●●

152025●●303540●PALL

ChemicalA

P Recirculating

ChemicalBPump

PALL

UltiKleen™ G2
Excellar

In line Heater

PALL

Single Wafer Cleaning TypePALLPALLPALL●

UltiKleen™ G2
Excellar ER●

UltiKleen™ G2
Excellar ERL●

UltiKleen™ G3
Excellar ER

●

●
●

●

●

●

●

●

●

●

●
●
●

Mixing Tank
* Liquid Flow Rate : In case of 3/4" T-Flow, Only UltiKleen G3 Excellar-ER 1" T-FlowPPALLP

Flow Characteristics - 5" Kleen-Change® AssemblyFilter(Kleen-Change®)

Specifications
FilterUltiKleen™ STPUltiKleen™ JKC

Reference Datasheet

E107

E112

A97

Typical Application

Stripper for Photo Resist

Stripper for Photo Resist

Compact size for small ﬂow

Removal Ratings

0.1μm 0.2μm 10μm 50μm

Media Material

PTFEPTFE

PTFE

Refer to datasheet

1.2 m2/12.9 ft2（10" type）
1.7 m2/18.3 ft2（G2 type）

0.13 m2/1.4 ft2

Only available for G2 Type

Only available for G2 Type

N/A

Optimized pore size andthickness of preﬁlter layer tocapture large quantities oflarge-size gel particles.
Demonstrates high foreign
particle ﬁltering capacity andsigniﬁcantly extends ﬁlter life.

Optimized structural design
for signiﬁcantly improved gel
particle removal performance.
Reduces particles on a wafer
and extends ﬁlter life.

Compact, low pressure loss
ﬁlter with space-saving
footprint, suitable for use as achemical ﬁlter for wafer
cleaning equipment or spincoater immediately before
ﬂuid is discharged.

Air Bubble Removal(Downstream Vent Construction )Features & Beneﬁts

●

50nm

0.1μm

0.2μm

50nm

0.1μm

0.2μm

UltiKleen™
Excellar
UltiKleen™
Excellar ER

Liquid Flow Rate [L/min] (at 30kPa)

20nm 30nm 50nm 0.1μm 0.2μm 0

UltiKleen™
UltiKleen™ STG

Filter Areas

Removal Ratings

●

●

246●

●

●

●

1012●

●

●

14●

●

* Liquid Flow Rate : In case of 1/2" Inline Flow

Flow Characteristics - JKC AssemblyFilter(Kleen-Change®)

Removal Ratings
20nm 30nm 50nm 0.1μm 0.2μm 0●

UltiKleen™ JKC
UltiKleen™ JKC
Excellar ER

Liquid Flow Rate [L/min] (at 20kPa)

●

1●

●

23●

●

●

For liquids with a different viscosity from water, multiply the pressure drop by the viscosity in centipoise.

48545●

UltiKleen™ Series
Dimensions
UltiKleen™ KC(3/4" Pillar Super 300P Series)

Dimensions
UltiKleen™ G2 KC
DV (Downstream Vent) TypeUltiKleen™ G2 KC
DV (Downstream Vent) TypeUltiKleen™ G3 KC
DV (Downstream Vent) TypeUltiKleen™ G3 KC
DV (Downstream Vent) Type(3/4" Pillar Super 300P Series)(3/4" Pillar Super 300P Series)
Male connections(1" Pillar Super 300P Series)(1" Pillar Super 300P Series)
Male connections

5inch Size UltiKleen™ KC(1/2" Pillar Super 300P Series)

91mm294mm

446 394mm mm

409 376mm mm

444 390mm mm

456 431mm mm

430 405mm mm

5inch Size UltiKleen™ KC(Non connection)

UltiKleen™ KC(Non connection)

UltiKleen™ G2 KC
DV (Downstream Vent) TypeUltiKleen™ G2 KC
DV (Downstream Vent) Type(3/4" Pillar Super 300P Series)(3/4" Pillar Super 300P Series)
Male connections

UltiKleen™ G3 KC
DV (Downstream Vent) Type
(1" Pillar Super 300P Series)

UltiKleen™ JKC(3/8" Pillar Super 300P Series)

197 213mm mm

Pillarﬁtting is a trademark ofNippon Pillar Packing Co., Ltd.

67