Mass SpectrometrySolutions

Microvision 2Stability, Accuracy and Speed
The RGA your process can rely onAvoiding the Cost ofthe Unknown . . .
Whether your application is leak checking a sputteringchamber, obtaining the highest vacuum possible in asynchrotron or precisely controlling a thin film deposition
layer, the cost of not understanding the details of thegases in your vacuum chamber can be very expensive.
During the last decade residual gas analysis (RGA) has
evolved into a rugged sensor technique, integrated into
automated process control environments to provide vital
information to engineers on errors within the process andwarn when parameters are starting to move out of control.
The constant challenges for RGA technology are to:•Provide the highest sensitivity measurements of thegas species present in a vacuum•

Have robust sensors that keep working even in harshprocess environments•

Acquire the highest quality of data at the fastest
possible speeds•

Integrate seamlessly into the widest possible rangeof hardware and software systems

Microvision 2 is the latest innovation in RGA technology
from MKS, designed to meet all of the traditional
requirements for an RGA sensor but with data collection
at speeds unachievable with previous generation
technologies. In addition, the Microvision 2 is designed
to collect data at millisecond speeds per data point evenwhen measuring data over the full dynamic range of theRGA. This capability has been achieved without sacrificing
any of the necessary robustness, reliability and support
which have made MKS the world leader in RGA products
over the widest range of applications from semi-conductor
tools or particle accelerators to general industrial
applications.

Microvision 2 is the heart of the Vision 2000 series of processmonitoring RGAs

Technology Leadership
MKS was the first company to offer an RGA compatible
with modern Ethernet based web-enabled wide area
network installations. Microvision 2 continues thisdevelopment to a level that offers the highest flexibility
and connectivity through the use of industry standard
communication hardware and software.
Microvision 2 optimizes the roles required of a complex
sensor by having two dedicated processors;••

An optimized, proprietary processor for dataacquisition
An industry standard CE operating system processor
for external communications through field proven
TCP-IP technology

The advantages of this design approach are fast, accurate
data from a robust RGA sensor using industry standard,
flexible communication protocols. Microvision 2 also
provides a complete range of additional digital and analog
connections for integrated systems at the best possible
value for your investment.

Microvision 2 RGAs in situ on a latest generation synchrotron storage ring. Images courtesy of Diamond Light Source, UK.

Microvision 2 — the RGA
Your Process Can Rely On
Hardware Value &Performance

G raph s howing detec tor s ettling time when jumping to a mas s with nos ig nal from different mas s es within the meas urement rang e of the detec tor
5.0Sensors••

Greater resistance to the effects of contamination thana single filter
Greater sensitivity at higher masses compared tosingle filters, critical to monitoring many molecules
used in CVD processes•

Wide range of ion sources•

Twin independent filaments as standard to ensure
minimum downtime during critical process monitoring•S tarting ignal 1E 6 times higher than noise floor

4.0
P arts per million of full rang e s ig nal

Microvision 2 has field proven quadrupole mass analyzer
designs with pre-filters and optional post filters for;S tarting signal 1E 7 times higher than noise floor

S tarting signal 1E 5 times higher than noise floor
S tarting signal 1E 4 times higher than noise floor

3.0

S tatistical detection limit at specific measurement times

2.0
Measurements for very low
signals start after 20ms
1.0

0.0

-1.0
1101001000

S ettling and c ompleted meas urement time, millis ec onds

Signals close to the noise floor can still be reliably measured, even
immediately after measuring very large signals

Standard dual detector including a faraday detector
and microchannel plate electron multiplier for
detection to e-14 mbar partial pressures

Graph showing the data quality improvement with Microvision 2 electronics.
At the fastest data acquisition rates accuracy and precision for on peak measurement and peakratios is significantly better with Microvision 2 than traditional electronic designs

Electronics
1

Traditional RGA ratio Mass18:Mass17 peaks

Data acquisition occurs through all solid state, wide
dynamic range, fast settling detector electronics:
Prevents large peaks from causing false positive
measurements on small peaks•

Temperature stabilized critical components withimproved signal stability and baseline drift allow
the unit to be used without frequent recalibration
if the vacuum chamber is stable but ambient air
temperature fluctuates

0.8
Ratio of peaks•Microvision 2 Ratio Mass18:Mass17 peaks
0.9

0.7

Peak ratios are the same for alldata acquisition speeds with
Micovision 2, accuracy ismaintained.

0.6

Peak ratios change at fasterdata acquisition speeds on
traditional RGA designs.

0.50.4•

Variable sensor conditions to match the needs of eachprocess•

Each optimization is separately stored in the RGA
and automatically recalled or recalibrated by software
recipes•

Flexible digital and analog I/O capability with adedicated gauge port as standard•

Option to add extra levels of I/O and communications
ports built into the RGA electronics

110100Measuring time per mass, milliseconds

Faster and more accurate responses are possible in closed-loop control
applications where the RGA is process criticalControls
A web interface using industry standard technology
allows control of the Microvision 2 as well as calibration,
operation and data export through a non platform-specificweb browser from anywhere on a network.
Using the documented ASCII protocol and TCP-IP
communication, any third party software can send andreceive commands and data from the Microvision 2.
Built-in web application for Microvision 2 control and data acquisition

1000Software Flexibility &Scalability without Compromise
In addition to the standard, built-in web applications,software control is also available through three Windowsapplications, offering the best possible fit to any customer’srequirements.
EasyView – provides basic RGA controls but with morefunctionality than the built-in web application:•Store RGA data and review it later in the Recall viewer•

Annotate graphs with notes stored into the data files•

Run several RGAs from one software package

Process Eye Professional – offering complete control of
all RGA parameters:•

Recipe driven control to allow the highest level offlexibility but with ease of use through the EasyView
recipe and Recipe Wizard•Ability to link to other systems through a variety ofmechanisms such as Modbus, ASCII, SECS protocols,
serial communications, TCP-IP, file exchange andmany others•

Flexibility to run customized data collection, alarm
condition checking and closed loop control operations

EasyView for simple control and data collection with multiple RGAs

TOOLweb RGA – specialized tool integration software
providing optimized methods to get the most reliable
information from RGAs on process tools:•Complete integration of RGA data with tool operation
and FDC systems•Levels of interdiction from passive monitoring of thetool vacuum, to process critical go/stop control ofindividual process chambers•Powerful web based reporting provides processengineers with highly valuable information to keep
tools running at peak efficiency

Process Eye Professional for flexible control through recipe-driven
data collection

Applications
Microvision 2 is useful in a wide range of situations whereknowing the contents of your chamber is critical to thesuccess of your process.
Semiconductor Manufacturing
Microvision 2 compliments other MKS RGAs and isavailable in a range of configurations which are optimized
for specific semiconductor needs:

TOOLweb RGA for complete integration with tool and factory
process control

Vision 2000-B: equipped with slit valve pressure sensors
connected to the Microvision 2 digital IO, this RGA isvaluable on any high vacuum cluster tool. It can detect
the smallest leaks which would not be identified by a totalpressure sensor, and synchronize alarm limit checks withslit valve movements at millisecond precision to determine
the exact component at fault.

Microvision 2 — the RGA
Your Process Can Rely On
300mm ResistTorr:
Microvision 2 fitted into a
process-optimized differentiallypumped vacuum systemwith a capillary inlet andindependent calibration bottle,
can prevent losing thousandsof dollars on scrap wafers dueto photoresist contamination inPVD tools.
Other standard and custom
configurations are available
for low pressure and nearatmospheric pressure furnace
tools, RTP and general leakchecking applications.
Microvision 2 installed as a
300mm Resist-Torr on a PVD
tool degas chamber

Large Scale Coating Tools
Microvision 2 is available in various configurations toaugment other MKS RGAs and match the needs of bothcluster based and in-line large scale coating tools.
Vision 2000-P: Microvision 2 can be fitted into a processoptimized, differentially pumped vacuum system with asingle path inlet designed to minimize response times tochanges in higher pressure PVD processes. This RGA
gives the best possible detection limits for monitoring
contamination in the process chamber.
Vision 2000-C/E: Microvision 2 fitted into a processoptimized, corrosion-protected, differentially pumped
vacuum system with a dual path, purge-protected sampling
inlet can help optimize the gas use and monitor thevacuum quality of CVD, chamber clean and wafer etchprocesses.
The Choice for High Mass Performance

Transmission %Microvision
Pre-filtered analyzer as standard
100for improved resistance to2 systems
contamination and enhanced
high-mass sensitivity
incorporatea pre-filtered
Triple Filter
analyzer as
Double Filter
10standard. WhileSingle Filter (4 inch)
protecting the240
060
180
120
300
main filter from a
Mass (amu)
gradual buildup
in contamination, the contamination resistant RF-only
pre-filter also strongly focuses ions exiting the ion source,
thereby improving both resolution and transmission (ameasure of ions successfully traveling between the ion
source and the detector). The optional triple filter analyzer
has both pre- and post-filters for further improvements inthe transmission of higher mass species.

The Choice for High Resolution Performance
A special modelof MicroVision
2 is available
for applications
requiring highpeak resolution.
Incorporating highfrequency RFelectronics, this unit
has a mass range of 1-6 amu and used in conjunction
with a triple filter analyzer, it is able to resolve helium anddeuterium at mass 4.
Ultra-High Vacuum Quality
Microvision 2 with an open ion source
analyzer is suitable for many highvacuum RGA applications. For UHV
pressures, a high performance UHV
source option is available. This source
incorporates a platinum source cage toreduce electron stimulated desorptionof gas species. For fast degassing
and minimal out-gassing, the UHV
source is based on a low thermal inertia design, and thecomponents are vacuum fired prior to assembly.
Operation in Harsh Environments
Certain applications require
the RGA to operate in anenvironment that could
damage the electronics when
they are directly coupled tothe analyzer. Microvision 2systems can be supplied withspecial extenders that allow
the analyzer to be operated inharsh environments (e.g. high temperature and/or ionizingradiation) with the control electronics located in a safe orshielded position. Two extenders are available (3 metersand 15 meters), each incorporating a radiation resistantcable and a high temperature analyzer interface. This
assembly provides a thermal break so that the high flange
temperature of the analyzer is not conducted to the wiringloom connecting the RGA to the electronics. Analyzers
can then be operated at temperatures of up to 200°C forfaraday detection and 150°C for multiplier detection.

Microvision 2Electronics
Mounted weight on flange

1.7kg

Power24V DC, 3A external universal voltage supply (included)

Max. operating conditions

Electronics: 40°C, 80% RH (non condensing)Communication

10/100 Base-T Ethernet, static or automatically assigned IP addresses

Data acquisition method

Dedicated real time acquisition processor

Data collection methods•  Analog scanning, full mass range 8, 16 or 32 points/amu•  Barchart scanning•  Peak-jump collection of up to 15 peaks per scan•  Complete recipe control to link multiple acquisition into a single scan
(Process Eye Professional and TOOLweb RGA only)

Number of stored sourcesettings•  6 sets including ion source parameters, alignment, resolution, detector calibrations•  Stored in electronics and recalled by EasyView, Process Eye Professional or TOOLweb RGA

Software controlled
tuning parameters•  Electron energy, 20 to 100eV•  Emission current, 0 to 2 mA (5 mA degas)•  Ion energy, 0 to 10V•  Ion extraction, 0 to -130V•  Filter pole bias, 0 to -10V to +10V

Multiplier protection

Automatic removal of over-range peaks from all scan modes, dedicated multiplier inhibit line forover temperature or over-pressure and X-trip filament and multiplier protect for over-pressure

Data acquisition speed< 3ms per point for analog scanning

Settling time to 1 ppm ofmaximum signal<20ms

Control method

CE operating system processor with web-server interface

Command structure

Documented ASCII command protocols

Software•  Built-in web applications allowing RGA control and data acquisition using a platform
independent web browser without the need for dedicated installed software•  EasyView, Process Eye Professional and TOOLweb RGA Windows software packages forWindows 2000, XP, or VistaInterfaces•  RJ45 socket: 10/100 Base-T Ethernet•  25 way D-type female: 16 configurable TTL I/O, one dedicated multiplier over temperature
inhibit input, includes power for ±15V (100mA), +24V (100mA) and ±3.3V (100mA)•  15 way D-type female: 4 analog in (-11V to +11V 22bit), 2 analog outputs (0-10V 12bit),includes power for ±15V (100mA), compound output from detector pre-amplifier•  9 way D-type female dedicated vacuum gauge port: -11 to +11V 22bit analog input, 1 digitalinput (gauge OK), 1 digital output (gauge enable) and gauge power +24V (100mA)•  3.5mm jack socket: Opto-isolated input for filament protect or control with auto detection ofpresence of the jack plug as failsafe•  2.5mm jack socket: Audio output for use with speaker and wired or wireless headphones

Specifications

Microvision 2Analyzers

Double(standard configuration)

Ranges, amu

100, 200, 300

100, 200

1-6, 100, 200, 300

Max. operatingpressure

7.6e-5 Torr (1e-4 mbar)

7.6e-5 Torr (1e-4 mbar)

7.6e-5 Torr (1e-4 mbar)

Ion source sensitivity

2e-4 A/mbar

2e-4 A/mbar

2e-4 A/mbar

Min. detectable partialpressure, open ion source

3 standard deviations of baseline
noise at 300ms integration

3 standard deviations of baseline noise at 300ms integration

3 standard deviations of baseline noise at 300ms integration

Faraday

1.5e-11 Torr (2e-11 mbar)

1.5e-11 Torr (2e-11 mbar)

1.5e-11 Torr (2e-11 mbar)

Microchannel plate

3.8e-14 Torr (5e-14 mbar)

3.8e-14 Torr (5e-14 mbar)

3.8e-14 Torr (5e-14 mbar)

Single channel EMn/an/a

7.6e-15 Torr (1e-14 mbar)

Bakeout temperature

250°C (with extender orelectronics removed)

250°C (with extender orelectronics removed)

250°C (with extender orelectronics removed)

Operating temperature• 200°C (Faraday only withelectronics at 10-40°C)• 150°C (multiplier detection withelectronics 10-40°C andpressure <1e-8 mbar)• 90°C (multiplier detection withelectronics 10-40°C andpressure <1e-5 mbar)• 200°C (Faraday only withelectronics at 10-40°C)• 150°C (multiplier detection
with electronics 10-40°C andpressure <1e-8 mbar)• 90°C (multiplier detection withelectronics 10-40°C andpressure <1e-5 mbar)• 200°C (Faraday only withelectronics at 10-40°C)• 150°C (multiplier detection
with electronics 10-40°C andpressure <1e-8 mbar)• 90°C (multiplier detection withelectronics 10-40°C andpressure <1e-5 mbar)

Filament materials

Tungsten or Thoria coated Iridium

Tungsten or Thoria coatedIridiumTungsten or Thoria coatedIridium

UHV ion source

OptionStandardOption

UHV out-gassing rate

<1e-9 mbar -l/s

<1e-9 mbar -l/s

<1e-9 mbar -l/s

PVD ion source

Optionn/aOption

Cross beam ion source

Optionn/aOption

Resolution

Better than 10% valley for peaks ofequal height across mass range

Better than 10% valley forpeaks of equal height acrossmass range

Better than 10% valley forpeaks of equal height acrossmass range

Peak position drift±0.1 amu over 8 hours at stableflange temperature±0.1 amu over 8 hours at
stable flange temperature±0.1 amu over 8 hours at
stable flange temperature

Zero blast effect at mass 2(closed ion source)<5 ppm baseline levels next tomass 2n/a

<5 ppm baseline levels next tomass 2Flange fitting

DN 40 CF-F

DN 40 CF-F

DN 40 CF-F

Compliance5” Single

CETripleDimensional Drawings

431467624VDC

DIM D (UHV ION SOURCE OPTION)
35 (MINTUBE I/D)

DIM A (OPEN SOURCE & CROSS BEAM SOURCE)

6133°

CF70 FLANGEDIM B (CROSS BEAM ION SOURCE OPTION)

DIM C (PVD ION SOURCE OPTION)

123456789101112

STANDARD DETECTOR
19°6757.5MHV BNC CONNECTORFOR SEM HT.

Dimensional Drawing —Note: Unless otherwise specified, dimensions are nominal values mm.

MKS Instruments, Inc.
Global Headquarters
2 Tech Drive, Suite 201
Andover, MA 01810

CHANNELTRONDETECTOR OPTIONMKS Instruments, Inc.
Mass Spectrometry
Solutions

3635 Peterson Way		
Tel: 978.645.5500			Santa Clara, CA 95054
Tel: 408.750.0300
Tel: 800.227.8766 (in USA)
Web: www.mksinst.com
Microvision 2 - 2/18
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Mass Spectrometry
SolutionsS sisCowley Way			Crewe, Cheshire CW1 6AG
Tel: +44.1270.250150

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