Thursday, January 22
9:00

Registration

9:50

Opening remarks

10:00

I-1

Yasuo Suzuoki (Nagoya University)

Challenges in Si Nanoelectronics: Materials and Processes
Shigeaki Zaima (Nagoya University)

10:40

I-2

Cold Atmospheric Plasmas as an Infection Control Strategy
Michael Kong (Loughborough University, UK)

11:20

O-1

Effect of Rare Gas Flow and Electrode Polarity on the DC Atmospheric Discharge
H. Matsuura, T. Kiriishi, K. Nakano (Osaka Prefecture University)

11:40

O-2

Decomposition of organic substances in liquid using gas-liquid-interface plasmas,
and its analysis with FTIR spectroscopy
T. Morita, O. Sakai, T. Shirafuji, K. Tachibana (Kyoto University)

12:00
13:20

LunchI-3

Ultra low friction of Carbon Nitride coatings
Noritsugu Umehara (Nagoya University)

14:00

I-4

Physics of dual-frequency capacitive discharges
Pascal Chabert (CNRS-Ecole Polytechnique, France)

14:40

O-3

Measurements of electron energy distribution function in dual frequency
capacitively coupled plasma using laser Thomson scattering
K. Ando1, T. Kimura1, T. Yamaguchi1, K. Takeda1, K. Kubota2, C. Koshimizu2,A. Kono1, M. Sekine1, M. Hori1 (1Nagoya University., 2TEL AT Ltd)

15:00
15:20

Break
I-5

Electronegative plasmas: The pluses and minuses
William Graham (Queens University Belfast, UK)16:00O-4

Control of EEPF and plasma potential by varying the plasma system length
R. Boswell (Australian National University)

16:20

O-5

Evidence of Landau damping in low pressure helicon discharges
B. B. Sahu (Indian Institute of Technology)

16:40 ～ 18:15

Poster presentation

P-01
A Study on the application for Interlayer Dielectrics of Toluene-TEOS Hybrid Plasma-Polymer Thin
Films
S.-J. Cho, I.-S. Bae, and J.-H. Boo (Sungkyunkwan University, Korea)
P-02
Monitoring of Electron Density with Frequency Shift Probes in Reactive Processing Plasmas
K. Nakamura, Q. Zhang and H. Sugai (Chubu University)
P-03
Plasma Non-uniformity in Large Area / Very High Frequency Capacitive Discharges
S. K. Ahn, B. K. Na, J.B. Lee and H. Y. Chang (Korea Advanced Institute of Science and Technology,Korea)
P-04
Deposition profile control of plasma enhanced CVD carbon films in submicron wide trenches
M. Shiratani1, 4, J. Umetsu1, T. Nomura1, K. Inoue1, K. Koga1, Y. Setsuhara2, 4, M. Sekine3, 4, and M.
Hori3, 4 (1Kyushu University, 2Osaka University, 3Nagoya University, 4JST, CREST)
P-05
Preparation of water-repellent thin film with C2H2F2/Ar plasma and investigation of its adhesion
N. Wada, T. Misawa, Y. Ohtsu and H. Fujita (Saga University)
P-06
Wetting Behaviors of DLC Film Coated Nano-scale Double Roughening Pattern Surface
Y-J. Jang, H. Kousaka and N. Umehara (Nagoya University)
P-07
Basic study of bacteria inactivation at low discharge voltage by using microplasma
M. Yamada, M. A. Blajan and K. Shimizu (Shizuoka University)

P-08
Low temperature inner sterilization efficiency of wrapped materials in surface-wave plasmas
M. K. Singh1, L. Xu2, A. Ogino1 and M. Nagatsu1 (1Shizuoka University, 2Japan Science andTechnology Agency)
P-09
Impact of Remote Plasma Treatment on Formation of Metal Nanodots on Ultrathin SiO2
A. Kawanami, K. Shimanoe, K. Makihara, M. Ikeda, S. Higashi and S. Miyazaki (HiroshimaUniversity)
P-10
Arc Production of Nano-Tubes under High Gravity by Use of the Rotating-Acceleration Generator
G. Tan, T. Mieno (Shizuoka University)
P-11
Generation of metalocarbon nanocompounds as perspective structures for hydrogen storage
Iu.P. Veremii1, V.Ya. Chernyak1, S.A. Filatov2, S.V. Olszewski1, Eu.K. Safonov1 (1Taras Shevchenko
Kyiv National University, Ukraine 2Heat and Mass Transfer Institute of National Academy ofSciences of Belarus, Belarus)
P-12
Adhesion Measurement of Ti (O, N) Coatings on Glass by Scratch Test
S. Parajulee1, M. Hayakawa, S. Ikezawa (Chubu University)
P-13
Preparation of aluminum nitride thin film with dual frequency plasma sputtering
K.Hino1, T.Misawa1, Y.Ohtsu1, M.Akiyama2, and H.Fujita1 (1Saga University,2Measurement

Solution Research Center, AIST Kyushu)
P-14
Effect of substrate temperature on CNx films deposited by RF plasma assisted pulsed laser
deposition
S. Kimura, T. Yasui and M. Fukumoto (Toyohashi University of Technology)
P-15
Basic study of water treatment by low voltage discharge in bubbled water
S. Muramatsu, T. Sonoda, M. Blajan and K. Shimizu (Shizuoka University)

P-16
NOx Removal Processes by Microplasma Generation in Multiple Electrode Configuration
M. Blajan, M. Kanamori, H. Mimura and K. Shimizu (Shizuoka University)
P-17
Treatment of Organic Solution with Microwave Excited Plasmas
R. Saito, H. Sugiura, T. Ishijima and H. Toyoda (Nagoya University)
P-18
Laser measurement for control of hydrolysis TTIP solution used in atmospheric plasma jet
M. Hayakawa, P. Shankar and S. Ikezawa (Chubu University)
P-19
Observation of dielectric barrier discharge at various Xe/Ne mixture gas ratios
T. Yamamura, T. Misawa, Y. Ohtsu, H. Fujita (Saga University)
P-20
Rotational and vibrational temperatures of spark-plug assisted atmospheric pressure microwave
discharges operated with He and N2
M. A. M. ElSabbagh1, K. Sasaki1, M. Kaneko2, and Y. Ikeda2 (1Nagoya University, 2Imagineering Inc.)
P-21
Fabrication of amorphous carbon films using nonequilibrium atmospheric pressure plasma withultrahigh electron density
Y. Matsudaira1, H. Inui1, T. Kino1, H. Kano2, M. Sekine1,3, and M. Hori1,3 (1Nagoya University, 2NU
Eco-Engineering Co., Ltd., 3JST-CREST)
P-22
Low Power Atmospheric Pressure Microwave Plasma Spraying for low-melting-point substrates
K. Tsujimoto, T. Yasui and M. Fukumoto (Toyohashi University of Technology)
P-23
Structural Analysis of Zinc Oxide Nano-phosphors by Means of Electron Energy-controlled
Cathodoluminescence Technique
K. Shinji, Q. Ou, T. Matsuda, A. Ogino, and M. Nagatsu (Shizuoka University)

P-24
Plasma Synthesis and Property Elucidation of Nitrogen Atom Encapsulated Fullerene
J. U. Ahamed, S. Miyanaga, T. Kaneko, and R. Hatakeyama (Tohoku University)
P-25
Successive growth of CNTs by ion energy controlled surface wave plasma CVD at low temperature
J. Sato, T. Matsuda, A. Ogino, and M. Nagatsu (Shizuoka University)
P-26
Helium bubble formation on tungsten in dependence of fabrication method
M. Yamagiwa,W. Sakaguchi, S. Kajita, M. Takagi and N. Ohno (Nagoya University)
P-27
The effects of the moral ratio of KOH to HAuCl4 on the size and shape of the gold nanopaticles
synthesized using Solution Plasma Process
Y. K. Heo, S.M. Kim ,S.Y. Lee (Korea Aerospace University, Korea)
P-28
Influence of the N2 Partial Pressure on the Characteristic of the Cr-Zr-N Coatings Synthesized usinga Cr-Zr Segment Target
Y.S. Kim, G.S. Kim, S.Y. Lee (NMPL, Korea Aerospace University, Korea)
P-29
Characteristics of ZnO thin film using RF magnetron sputtering for active layer of TFT
Young Ryeol Kim, Yong Seob Park, and Byungyou Hong (Sungkyunkwan University, Korea)
P-30
Characteristics of transparent vanadium oxide thin films for the electrodes to thin film solar cell
Yong Seob Park, Young Ryeol Kim, Sung Uk Lee, and Byungyou Hong (Sungkyunkwan University,Korea)
P-31
Synthesis of platinum nanoparticles on carbon nanowalls by using supercritical fluid
K. Mase1, T. Machino1, H. Kano2, M. Hiramatsu3, M. Sekine1 and M. Hori1 (1Nagoya University, 2NU
Eco Engineering, Co., LTD., 3Meijo University)

P-32
Evaluation of the efficiencies of multi photon ionization processes and their effect on laser Thomson
scattering diagnostics
K. Fukuyama, M. Aramaki and A. Kono (Nagoya University)
P-33
Thomson scattering measurements of 10-GHz-excited micro ECR plasma
Y. Kawamura, M. Aramaki and A. Kono (Nagoya University)
P-34
Spectral emission characteristics of a micro-ECR-plasma light source for VUV emission intensitycalibration
T. Hoshino, M. Aramaki, and A. Kono (Nagoya University)
P-35
Thomson scattering measurements of 10-GHz-excited cavity-type microgap plasma
Y. Harada, M. Aramaki and A. Kono (Nagoya University)
P-36
Study of Photo detachment Cross Section Measurement
S. Kinbara, M. Aramaki and A. Kono (Nagoya University)
P-37
Negative ion measurement generated on sputter target in rf discharge
T. Muranaka1, H. Obuchi1, T. Hayashi1, A. Kono1, M. Aramaki1, N. Mizutani2 and K. Suu2 (1NagoyaUniversity, 2ULVAC)
P-38
Optimization of Probe-Laser LIF System for Observation of Laser-Cooled Ions in a Linear RF Trap
S. Kameyama1, M. Aramaki1, Y. Sakawa2, T. Shoji1, and A. Kono1 (1Nagoya University, 2OsakaUniversity)
P-39
Detection of Energetic Negative Ions in an RF Magnetron Plasma
K. Goto1, T. Ishijima1, N. Ohshima2, K. Kinoshita2 and H. Toyoda1 (1Nagoya University, 2NEC)

P-40
Measurements of ion energy and active-species fluxes in ICP N2 Plasmas
Y. Horikawa1, K. Kurihara2 and K. Sasaki1 (1Nagoya University, 2Toshiba Corporation)
P-41
Dependence of IED on magnetic field in reactive plasma
H. Obuchi1, T. Muranaka1, T. Hayashi1, A. Kono1, M. Aramaki1, N. Mizutani2 and K. Suu2 (1NagoyaUniversity, 2ULVAC)
P-42
SiH4 Dissociation Process in Microwave-Excited H2/SiH4 Plasma
H. Endo, H. Asano, T. Ishijima and H. Toyoda (Nagoya University)
P-43
Mechanism of sputter deposition process employing a Si target and H2/Ar Gas mixture
K. Fukaya, A. Tabata, and K. Sasaki (Nagoya University)
P-44
Measurements of absolute density and translational temperature of hydrogen atoms in the highpressure VHF capacitively coupled plasma
Y. Abe1, K. Takeda1, M. Sekine1,2 and M. Hori1,2 (1Nagoya University, 2JST-CREST)
P-45
Formation of carbon nanowall by using radical injection plasma enhanced Chemical Vapor
Deposition and its electrochemical evaluation
H. Watanabe1, M. Hiramatsu1 and M. Hori2 (1Meijo University, 2Nagoya University)
P-46
Fabrication of Single Carbon Nanowall Using Electron Beam Excited Plasma Enhanced CVD
H. Mikuni1, W.Takeuchi1, M. Hiramatsu2, H. Kano3, Y. Tokuda4, M. Hori1
1NagoyaUniversity,2Meijo

University,3NUEco-Engineering Co., Ltd.,4Aichi

Institute ofTechnology)
P-47
Effects of H radical irradiation on synthesis of carbon nanowalls
S. Kondo1, Y. Itani1, K. Yamakawa2, S. Den2, M. Hiramatsu3, M. Sekine1 and M. Hori1 (1NagoyaUniversity, 2Katagiri Engineering Co., Ltd., 3Meijo University)

P-48
Irradiation of microwave to premixed gas burner flame
K. Shinohara, N. Takada, and K. Sasaki (Nagoya University)
P-49
Combinatorial Plasma Etching Process based on Plasma Nano-Science
C. S. Moon1, K. Takeda1, M. Sekine1,4, Y. Setsuhara2,4, M. Shiratani3,4, and M. Hori1,4 (1NagoyaUniversity, 2Osaka University, 3 Kyushu University, 4JST, CREST)
P-50
Effects of Oxygen on Etching Damage of Low-k Film Etching Process Employing Novel Fluorocarbon
Gas of C5F10O
E. Shibata1, H. Okamoto2, M. Sekine1, and M. Hori1 (1Nagoya University, 2Asahi Glass Company)
P-51
Precise Etching of Organic Low-k Film by Real-time Controlling Radical Density Ratio andSubstrate Temperature
H. Kuroda1, H. Yamamoto1, M. Ito2, T. Ohta2, M. Sekine1,3 and M. Hori1,3 (1Nagoya University,2Wakayama University, 3JST-CREST)

P-52
Damages on low-k films due to VUV, UV radiation, radical and ion in low-k films etching employing
H2 / N2 plasma
Y. Miyawaki1, K. Takeda1, M. Fukasawa2, K. Oshima2, K. Nagahata2, T. Tatsumi2, S. Takashima3, M.
Sekine1 and M. Hori1 (1Nagoya University, 2Sony Corporation, 3Nagoya Urban Industries Promotion
Corporation)
P-53
Analysis of Microstructure and Electrical Properties of Intrinsic ZnO Thin Films
Y. J. Kim, Y. S. Choi, I. S. Choi, J. G. Han (SungKyunKwan University, Korea)

18:30 ～ 20:00

BanquetFriday, January 23
9:00

Registration

9:40

I-6

Quantum chemical approach to reaction in process plasma
Toshio Hayashi (Nagoya University, Japan)

10:20

I-7

HID lamps: A high pressure micro dischargePeter Awakowicz (Ruhr-University Bochum, Germany)

11:00

O-6

Synthesis dynamics of nanoparticles produced by laser ablation of a solid target
immersed in water
W. Soliman, T. Nakano, N. Takada, K. Sasaki (Nagoya U.)

11:20

O-7

Surface enhanced Raman scattering of Au nanoneedles
Y. Yang1, Y. Li1, M. Tanemura2, M. Nogami2 (1East China University of Science andTechnology, 2Nagoya Institute of Technology)

11:40

O-8

Control over Wall Number of Carbon Nanotube Array
D. H. Lee, S. W. Kim, W. J. Lee* (KAIST, Korea)

12:00
13:20

Lunch
I-8

Plasma control for high conductivity TCO film
Jeon G. Han (SungKyunKwan University, Korea)

14:00

I-9

Combinatorial Plasma-Process Analyzer for Development of Plasma
Nano-Fabrication Processes
Yuichi Setsuhara (Osaka University, Japan)

14:40

O-9

High Deposition Rate of Highly Stable a-Si:H Films by Magnetically Enhanced
Multi-hollow Discharges
W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, H. Matsuzaki, K. Koga, M.
Shiratani (Kyushu U.)

15:00
15:20

Break
I-10

Plasma nanoarchitectronics: a novel platform for future nanotechnologies
Kostya Ken Ostrikov (Plasma Nanoscience Centre Australia, Australia )16:00O-10Formation condition of fiberform nanostructured tungsten by helium plasma
irradiation
W. Sakaguchi, S. Kajita, N. Ohno, M. Takagi (Nagoya U.)

16:20

O-11

Enhancement of Precision and Throughput of Nanopore Processing in Dielectric
Template-Assisted Nanoarray Synthesis by Using Pulsed Bias
X. Zhong, X. Wu and K. Ostrikov (Shanghai Jiao Tong U., China,Australia)

16:40

Closing

CSIRO,