Call for papers

IC-PLANTS 2010

The 3rd International Conference on Plasma-Nanotechnology & Science

March 11-12, 2010
Meijo University, Nagoya JAPANSponsored by
Co-sponsored by

Supported by

Plasma Nanotechnology Research Center (PLANT), Nagoya University
Meijo University
Aichi Science and Technology Foundation(Tokai Region Knowledge Cluster Headquarters)
Scientific Research on Innovative Areas“Frontier science of interactions between plasmas and nano-interfaces”- Tokai division of the Japan Society of Applied Physics- Tokai Branch of The Institute of Electrical Engineers of Japan- Plasma Electronics Division, Japan Society of Applied Physics- Plasma Center for Industrial Applications,Nagoya Urban Industrial Promotion Corporation- The Surface Science Society of Japan- Japan Vacuum Industry AssociationPlasma processing technologies are the state of the art technologies leading the way through ultra-highperformance in Nano-materials, microelectronic devices, flat panels, etc. IC-PLANTS was organized foroffer an opportunity for discussions and exchange of recent progress of Plasma Science andNanotechnology among the Plasma COEs in the world. It is absolutely necessary to collaborate
between the research communities for clearing the complex issues in the interdisciplinary research
fields. 3rd IC-PLANTS is to be held in Meijo University, Nagoya, Japan. The Organizing Committee
invites you to the conference and welcomes the submission of your papers.

General Topics
Theme: “Plasma Nanotechnologies” & “Atmospheric pressure plasma and biotechnologies”
Topics: Nano-fabrication / Interactions between plasmas and nano-interfaces / Diagnostics andmonitoring of plasmas and Reaction surfaces / Nano-electronics / Nano-biology / Interdisciplinary
or integrated research with Plasma technologies / Nano-optics / MEMS NEMS technologies /Process technologies for flat panel display / Environmental technologies / Equipment technologies/ Emerging new conceptInvited Speakers:Bill Graham (Queen’s University Belfast, UK), Alexander Fridman (DrexelUniversity, USA), Olivier Joubert (LTM/CNRS, France), Michael Kong (Loughborough University,UK), Nae-Eung Lee (Sungkyunkwan University, Korea), Rod Boswell (The Australian National
University, Australia), Kiyoshi Yasutake (Osaka University, Japan), Hiroshi Amano (MeijoUniversity, Japan), Jin-Hyo Boo (Sungkyunkwan University, Korea), Uros Cvelbar (Jozef StefanInstitute, Slovenia), Pascal Chabert (Ecole Polytechnique, France), Masaharu Shiratani (KyushuUniversity, Japan), Kazuo Terashima (Tokyo University, Japan), Tatsuru Shirafuji (NagoyaUniversity, Japan), Koichi Sasaki (Nagoya University, Japan), Fumiyoshi Tochikubo (TokyoMetropolitan University, Japan), Kostya Ostrikov (CSIRO, Australia), Yoshinobu Baba (NagoyaUniversity, Japan)

Submission of Abstracts (Oral and Poster Sessions)

Abstract (A4 size, one or two pages) should be submitted by January 15, 2010 via web site.
Template is available at http://www.plasma.engg.nagoya-u.ac.jp/IC-2010/ .

Registration Fee

Early (by February 28, 2010) : General : ¥10,000.-, Student : Free
On-site: General : ¥15,000.-, Student : Free

Organizing Committee ChairContactMasaru Hori, Director, Plasma Nanotechnology Research Center, Nagoya University
Hirotaka Toyoda (Executive Committee Chair) e-mail : ic-plants@plasma.engg.nagoya-u.ac.jp

http://www.plasma.engg.nagoya-u.ac.jp/IC-2010/