Program
The 4th International Conference on PLAsma NanoTechnology & Science (IC-PLANTS 2011)

Thursday, March 10, 2011
141500Registration

0005

Opening Remarks

4516

Pascal Chabert (LPP Ecole Polytechnique, France)
Global Model of Micro Hollow Cathode Discharges in Argon

I-2

Roderick W. Boswell (Australian National University, Australia)
Plasma Propagation of a 13.56 MHz Asymmetric Surface Barrier Discharge in Atmospheric Pressure Air

O-1

Ho-Jun Lee, Hae June Lee (Pusan National Univeristy, Korea)
Weakly Magnetized Inductively Coupled Plasma Source for 450 mm Wafer Processing Tool

254505172518I-1

BreakIvan P. Ganachev, H. Sugai (Shibaura Mechatronics Corporation, Chubu University, Japan)

O-2 Optimal Aspect Ratio for Multi-hollow Microwave Discharge
I-305

Masaru Hori (Nagoya University, Japan)
High Speed Surface Modification with AC Excited Ultra High Density Non-Equilibrium Atmospheric Pressure Plasma*The bus for the banquet site will leave at 18:40 in front of the conference hall.

Banquet (19:00 ~ 21:00)

Friday, March 11, 201189Registration

45
2000

10

I-4

Jüergen Röpcke (Leibniz Institute for Plasma Science and Technology (INP Greifswald), Germany)
Applications of MIR-Laser Absorption Techniques for Plasma Diagnostics in Basic Research and Industry

I-5Seiichi Miyazaki (Nagoya University, Japan)
Application of Remote Hydrogen Plasma to Selective Processing for Ge-based Devices - Crystallization, Etching and Metallization

O-3

J-P Booth, E. V. Johnson, P-A. Delattre, T. Verbeke, and J-C Vanel (LPP Ecole Polytechnique, France)
RF Waveform Tailoring to Control Film Morphology during Nanocrystalline Silicon PECVD4000

112040121300Break

R.V. Bekarevich, S. Miura, Di Lu, A. Ogino, M. Nagatsu (Shizuoka University, Japan)

O-4 Effect of Ion Biasing Energy on Growth of Carbon Nanomaterials at Low Substrate Temperature Using Microwave Plasma CVD
M. Shiratani, N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga (Kyushu University, Japan)

O-5 Ultra Low Resistive NM Thick AZO Films Deposited by Magnetron Sputtering Using Solid Phase Crystallization
A. Hikita, T. Iwamoto, S. Kumagai, M. Sasaki (Toyota Technological Institute, Japan)

O-6 Light-Weighted Micromirror Fabricated Using Stacked Photoresist Masks Realized by UV Curing

2000144015 20LunchI-6Klaus Bartschat (Drake University, USA)
Benchmark Calculations of Atomic Data for Plasma Applications

I-7

Zoran Lj. Petrović (University of Belgrade, Serbia)
New phenomenology in description of Townsend discharges and gas breakdown: from standard size to micro discharges
H. Tsuda, Y. Takao, K. Eriguchi, K. Ono (Kyoto University, Japan)
Surface Roughness Formation during Si Etching in Cl 2 and Cl 2 /O 2 plasmas: Atomic-scale Analysis of Three-dimensional Feature
Profile Evolution

O-740

BreakPoster Session (16:00 ~ 18:00)

Saturday, March 12, 20118Registration

4500940I-8William G. Graham (Queen's University Belfast, UK)
The Physics and Chemistry of Plasmas in and onto Liquids

I-9Toshiro Kaneko (Tohoku University, Japan)
Generation of Controlled Gas-Liquid Interfacial Plasmas for Synthesis of Novel Nano-BioConjugates

O-8

F. Odeyemi, A. Rabinovich, A. Fridman (Drexel University, USA)Non Equilibrium Plasma Conversion of Pyrogas into Synthesis Gas

20103555

111555

BreakT. Hagino, H. Kano, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori (Nagoya University, Japan)

O-9 Synthesis of Nano-graphene by Plasma in Liquid Ethanol
Michael Kong (Loughborough University, UK)

I-10 Plasma Treatment of Living Tissues – How Penetrating are the Plasma-mediated Therapeutic Effects
Closing Remarks

Excursion(Departure from the conference site ~12:15, Return to Takayama station ~16:30)
Invited talk : 30 min presentation, 10 min discussions,Contributed talk : 15 min presentation, 5 min discussions