Thursday, March 11, 2010
Opening remark (9:20-9:30)
Invited Talks 1 (9:30-12:10)
9:30

I-01	New formation process of solar-grade Si from metallurgical-grade Si by chemicaltransport in near atmospheric-pressure hydrogen plasma		

K. Yasutake, H. Ohmi, and H. Kakiuchi		Osaka University, Japan, JST, CREST, Japan

10:05

PLASMAS IN LIQUIDS AND THEIR APPLICATIONS

I-02

		

B. Graham		

Queen’s University Belfast, UK
Coffee Break (10:40-11:00)

11:00

I-03

Future prospects in plasma etching		O. Joubert1, E. Pargon1, G. Cunge1, T. Chevolleau1, M. Darnon1, L. Vallier1, T. David2,
S. Barnola2, and T. Lill3
		

1

11:35

Plasma nanoscience: synergies and opportunities

I-04

		

LTM (CNRS-UJF-INPG), France, 2CEA-LETI, France, 3Applied Materials Inc., USA

K. Ostrikov

		CSIRO Materials Science and Engineering, Australia, The University of Sydney, Australia
Lunch (12:10-13:20)
Invited Talks 2 (13:20-15:05)
13:20

I-05

Plasma Biology: What happens when cells meet plasma molecules?

		

M.G. Kong		

Loughborough University, UK

13:55

I-06	Nanobiodevice from Single Biomolecule and Cell Analysis to Biomedical
Applications

		

Y. Baba		Nagoya University, Japan, National Institute of Advanced Industrial Science andTechnology (AIST), Japan
14:30

I-07

PLASMA MEDICINE		A. Fridman

		Drexel University, USA

Coffee Break (15:05-15:25)
Contributed Talks 1 (15:25-17:05)
15:25

O-01	Bacterial inactivation using atmospheric pressure capillary tube based
micro-plasma system with hollow inner electrode		C.-C. Weng1, T.-Y. Lin1, H.-H. Chen1, J.-D. Liao1, C.-C. Ho2, and Y.-T. Ho2

		

1

15:45

National Cheng Kung University, Taiwan, 2Taiwan Plasma Corp., Taiwan

O-02	Plasma needle treatments of the human peripheral blood-derived multipotent
mesenchymal stem cells (hPB-MSC)		S. Lazović 1, N. Puač1, M. Miletić 2, D. Maletić 1, G. Malović 1, D. Bugarski3, S. Mojsilović 3,
P. Milenković 2, and Z. Lj. Petrović 1
		1Institute of Physics, Serbia, 2Faculty of Stomatology, Serbia, 3Institute for the Medical
Research, Serbia
16:05

O-03 Computer simulation of 3C-SiC powder production at initial stage of nucleation

		

A. Bondareva, and G. Zmievskaya		M.V. Keldysh institute of applied mathematics of Russian Academy of Sciences, Russia

16:25

O-04	Raman and AFM studies of fabricated Graphitic Carbon Nanostructures on n-Si
<111> With Extremely Non-Equilibrium Plasma conditions

		Y. Malhotra, S. Roy, and M.P. Srivastava		University of Delhi, India

16:45

O-X	Study of hafnium oxide nano-scale film deposited using Dense Plasma Focus asa gate dielectric for a MOS device		

A. Srivastava1, and Y. Malhotra2

		1

Indian Institute for Information Technology, India, 2University of Delhi, India

Poster Session (17:10-18:40)
P-01	In-situ growth of a single nano needle on a metal whisker induced by periodicallyscanning electron beam and its field emission property
B. Liang, C. Chen, A. Ogino, and M. Nagatsu
Shizuoka University, Japan
P-02

Non-isothermal Growth of Carbon Nanotubes
F.-L. Lu, W.-Y. Chen, and J.-M. Ting
National Cheng Kung University, Taiwan

P-03

Synthesis and Fabrication of Functional Nanomaterials
J. Hahm
Penn State University, USA

P-04	In-situ observations of growth processes of carbon nanowalls using spectroscopic
ellipsometry
K. Yasuda1, S. Kondo1, K. Yamakawa2, H. Kondo1, M. Hiramatsu3, M. Sekine1, and M. Hori1	1Nagoya University, Japan, 2Katagiri Engineering Co., Ltd., Japan, 3Meijo University, Japan
P-05

Identification of carbon nanostructures obtained by synthesis of powder residues
from discarded tires
R. Mis-Fernández1, C.R. Rios-Soberanis1, J. Arenas-Alatorre2, and J.A. Azamar-Barrios3	1Centro de Investigación Científica de Yucatán, Unidad de Materiales, México, 2Instituto deFísica de la UNAM, Departamento de Materia Condensada, México, 3Centro de Investigación yde Estudios Avanzados (CINVESTAV) del IPN-Unidad Mérida, México
P-06

Investigation of influence of Single Carbon Nano Wall structure on Field EffectTransistor electrical parameters and characteristics

	A. Malinowski1,2,3, M. Hori1, M. Sekine1, H. Kondo1, L. Lukasiak2, A. Jakubowski2, andD. Tomaszewski3
	1Nagoya University, Japan, 2Warsaw University of Technology, Poland, 3Institute of Electron
Technology, Poland
P-07

Dense Plasma Focus assisted formation of Carbon Nanoloops on Quartz substrate
S. Roy, and M.P. Srivastava
University of Delhi, India

P-08	Synchrotron X-ray diffraction analyses of carbon nanowalls synthesized byradical-injection plasma-enhanced chemical vapor deposition system
H. Kondo1, W. Takeuchi1, S. Kondo1, K. Yamakawa2, M. Hiramatsu3, M. Sekine1, and M. Hori1	1Nagoya University, Japan, 2Katagiri Engineering Co., Ltd., Japan, 3Meijo University, Japan
P-09	Diamond Deposition on Thick Substrates by Cooled Acetylene/Oxygen Combustion
Flame
Y. AndoAshikaga Institute of Technology, Japan
P-10	Increase of Young’s modulus of diamond-like carbon by using Adamantane as
Precursor Material in Plasma-Enhanced CVD
S. Moroto, H. Kousaka, and N. Umehara
Nagoya University, Japan

P-11	Hardness increase of amorphous carbon film coated by pulsed-plasma ablation of
PTFE
S. Kawara1, H. Koizumi2, H. Kousaka1, K. Yamada3, and N. Umehara1	1Nagoya University, Japan, 2Japan Aerospace Exploration Agency, Japan, 3Asahi Glass Co. Ltd.,
Japan
P-12

The rotational temperature of the CH radical differentiates hydrogenated amorphous
carbon etching from deposition
T.A.R. Hansen, P.G.J. Colsters, M.C.M. van de Sanden, and R. Engeln
Eindhoven University of Technology, The Netherlands

P-13	Light Extraction Enhancement of GaN-based Light Emitting Diodes using
Nano-patterned Sapphire Substrates
S.-M. Kim1, H.-S. Oh1, J.-H. Baek1, S.-Y. Park2, and W.-H. Huh2
Korea Photonics Technology Institute (KOPTI), Korea, 2Extol Inc., Nagoya University, Korea

1

P-14	Simulation and Experimental Verification of Inductively-Coupled Fluorocarbon
PlasmasF. Itazu1, K. Nakamura1, and M. Tanaka2	1Chubu University, Japan, 2PEGASUS Software Inc., Japan
P-15

Applying Reactive Ion Etching for the Fabrication of PhoXonic Crystals	D. Dudek1, V. Reboud1, N. Kehagias1, J. Cuffe1, and C.S. Torres1,2	1Catalan Institute of Nanotechnology and (ICN-CIN2) Campus Bellaterra, Spain, 2Institute for
Research and Advanced Studies, Spain
P-16

Dissociation channel of c-C4F8 to CF2 radical in reactive plasma
T. Hayashi1, K. Ishikawa1, M. Sekine1, M. Hori1, A. Kono1, and K. Suu2

	1Nagoya University, Japan, 2ULVAC Inc., Japan
P-17	ANISOTROPIC DRY ETCHING OF ZnO FILMS IN FLUORINE-BASED INDUCTIVELYCOUPLED PLASMAS
J.C. Park1, H.W. Kim1, H.J. Jeong2, J.H. Koo2, G.W. Lee2, B.W. Lee2, and H. Cho1
Pusan National University, Korea, 2Korea Maritime University, Korea

1

P-18	Investigation of VHF Capacitively Coupled Plasma with DC Bias for Low-k film
Etching Process
T. Kimura1, T. Yamaguchi1, K. Takeda1,2, C. Koshimizu3, M. Sekine1,2, and M. Hori1,2
	1Nagoya University, Japan, 2JST-CREST, Japan, 3Tokyo Electron AT Limited, Japan
P-19

The Improvement of Metal Etch Under Cut Margin with normal temperature process
K.-H. HAN1,2, J.-K. LEE2, J.-H. SANG2, D.-W. KIM, and D.-H. KIM1

	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea

P-20

In Situ Fourier Transform Infrared Diagnostics of Surface Reaction Layers andReaction Products in Cl2 Plasma Etching of Si
H. Miyata, H. Tsuda, Y. Takao, K. Eriguchi, and K. Ono
Kyoto University, Japan

P-21

Improvement of Active Pixel Sensor Open Etch Process
J.-H. YOO1,2, D.-H. KIM1, J.-J. PARK2, J.-S. HYUN2, B.-G. JEON2, and S.-I. KIM2

	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea
P-22

Atomic-scale analysis of plasma-surface interactions and feature profile evolution bymolecular dynamics approaches
H. Tsuda, T. Nagaoka, Y. Takao, K. Eriguchi, and K. Ono
Kyoto University, Japan

P-23	The Improvement of 90nm Metal Etch Under Cut Margin with normal temperatureprocess
K.-H. HAN1,2, J.-K. LEE2, J.-H. SANG2, D.-W. KIM, and D.-H. KIM1
	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea
P-24

Discharge properties of diamond etched by reactive ion etcher with MgO electrodeT. Misu, S. Ono, T. Higa, M. Goto, K. Koh, and T. Arai
Kanagawa Institute of Technology, Japan

P-25	Investigation of Si3N4 liner disappearance caused by high density plasma at shallow
trench isolation process
B.-C. CHOI1,2, T.-J. KIM2, E.-G. LEE2, J.-S. PARK2, R.-K. LEE2, B.-S. KIM2, and D.-H. KIM1
	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea
P-26

Effects of Plasma Process Fluctuation on Variation in MOS Device Parameters
K. Eriguchi, Y. Nakakubo, A. Matsuda, M. Kamei, Y. Takao, and K. Ono
Kyoto University, Japan

P-27	Study of high voltage transistor (HVTR) leakage path modeling at shallow trench
isolation structure
D.-M. SEO1,2, J.-K. LEE2, J.-H. SANG2, and S.-O. Choi2
	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea
P-28

Role of Oxygen atoms in the Growth of Magnetron Sputter-Deposited ZnO Films
A. Morita, J. Jin, and H. Shirai
Saitama University, JapanP-30

New roll coater using microwave plasma for touch screen manufacturing
I. Liang1, H. Ogawa1, K. Kato2, K. Iseki3, and H. Sugai1
Chubu University, Japan, 2Nagoya Industrial Research Institute, Japan, 3Toyobo Co. Ltd, Japan1

P-31	Comparison of wire properties and reliability(TCT,PCT,HTST) between Au-Ag-Pd and4N Au Wire bonding
M.-I. KIM1,2, B.-J. KIM2, S.-M. Yang2, S.-H. LEE2, C.-S. LEE2, S.-M. SHIN2, and D.-H. KIM1
	1Samsung Institute of Technology (SSIT) University, Korea, 2Samsung Electronics Co. Ltd.,
Korea
P-32	Evaluation of Plasma Sheath Thickness in Reactive Plasmas by Discrete Ion-Focusing
EffectE. Stamate, and M. Draghici
Technical University of Denmark, DenmarkP-33

Deposition of transparent conductive films by a DC Arc Plasmatron
O.V. Penkov, V.Yu. Plasksin, S.B. Joa, C.H. Kim, and H.J. Lee
Jeju National University, Korea

P-34	Deodorant of Sweat by TiO2 Coated on Wool Textile Using Atmospheric Plasma Jet
Supplied with TTIP Solution
M. Hayakawa, S. Parajulee, and S. Ikezawa
Chubu University, Japan
P-35

Plasma Effect on the Physical Properties of Tin Oxide Thin Film
M. Medhat, H.M. El-Sayed, M.A. Saudy, and M. Saleh
Ain Shams University, Egypt

P-36	Development of Scratch Test Methodology and Characterization of Surface Damage ofTi (O, N) Film
S. Parajulee, M. Hayakawa, and S. Ikezawa
Chubu University, Japan
P-37	Atmospheric PECVD deposition of nanostructured titanium oxide thin layers bymeans of barrier-torch discharge
S. Kment1, O. Churpita1, Z. Hubicka1, M. Cada1, J. Olejnicek, P. Kluson2, and L. Jastrabik1	1Institute of Physics AS CR, Czech Republic, 2Institute of Chemical Process Fundamentals AS
CR, Czech Republic
P-38	Microstructure of Ni-Based Metallic Glass Coating by Gas Tunnel Type Plasma
Spraying
A. Kobayashi1, T. Kuroda1, H. Kimura2, and A. Inoue2
Osaka University, Japan, 2Tohoku University, Japan1

P-39	Visible light active Photocatalytic properties of nanocrystalline TiO2 Synthesized byReactive Plasma Processing
M. Vijay1, V. Selvarajan1, K.P. Sreekumar2, and P.V. Ananthapadmanabhan2
Bharathiar University, India, 2Bhabha Atomic Research Centre, India

1

P-40	TiO2 Coating Fabricated by Atmospheric Pressure Microwave Plasma Spray Using
Suspension
T. Kondo, T. Yasui, and M. Fukumoto
Toyohashi University of Technology, Japan
P-41	Optical characterization of TiO2-based plasma sprayed coatings for photocatalytic
applications
P. Ctibor
Academy of Sciences of the Czech Republic, Czech Republic
P-42

Enhancement of Reactive Atmospheric Plasma Sprayed Aluminum Particles
M. Shahien, M. Yamada, T. Yasui, and M. Fukumoto
Toyohashi University of Technology, Japan

P-43	Synthesis of DNA Conjugated Gold Nanoparticles Using Gas-Liquid Interfacial
PlasmasQ. Chen1, T. Kaneko1,2, and R. Hatakeyama1
Tohoku University, Japan, 2CREST/JST, Japan1

P-44	Deposition of Hydrophobic Nano-Film on Polymeric Surface with Radio Frequency
Fluorocarbon Plasma Polymerization
C. Huang, C.-I. Lin, C.-H. Pan, and C.-Y. Tsai
Yuan Ze University, Taiwan
P-45

Study of the interaction mechanism of colloidal nanoparticles with laser beam
A. Pyatenko, and N. Koshizaki
National Institute of Advanced Industrial Science and Technology (AIST), Japan

P-46

Non-linear properties of lead-based PMN-PT solid solution nanocomposites
J.-W. Hyun, Y.-J. Kim, and J.-W. Park
Dankook University, Korea

P-47	Fabrication of Gold Nanoparticles in Supercritical CO2-Assisted Pulsed Laser
Ablation
S. Machmudah, Y. Kuwahara, Wahyudiono, M. Sasaki, and M. Goto
Kumamoto University, Japan

P-48

Porosity in solids: computer simulation of blistering at nucleation fluctuation stage
A. Bondareva, and G. Zmievskaya
M.V. Keldysh institute of applied mathematics of Russian Academy of Sciences, Russia

P-50

Charging and Magnetizing Characteristics of Co Nanodots
K. Makihara, A. Kawanami, M. Ikeda, R. Ashihara, and S. Miyazaki
Hiroshima University, Japan

P-51

Effect of different sputtering time on the synthesis of copper nano particles grown on
AISI 304 substrate by cylindrical magnetron sputtering system
M. Ghoranneviss, M. Eshghabadi, and A. Mahmoodi
Science and research branch center I.A.U, Iran

P-52

Quasi-Bragg grating with sub-wavelength particles
K. Ishikawa, N. Ebizuka, K. Takeda, H. Kondo, M. Sekine, and M. Hori
Nagoya University, Japan

P-53

Toxicity of CIGS nano-particles
S. Iwashita, H. Miyata, Y. Yamada, K. Koga, M. Shiratani, M. Hirata, Y. Kiyohara, and A. Tanaka
Kyushu University, Japan

P-54	Mass Spectrometric Measurement of Neutral Radicals in SiH4/H2 High Density
Microwave Plasma
T. Kuroda, T. Ishijima, and H. Toyoda
	Nagoya University, Japan
P-55

Microcrystalline Silicon Film Deposition by 915 MHz High-Density Microwave Plasma
J. Sakai, T. Ishijima, and H. Toyoda
Nagoya University, Japan

P-56	Analysis of Plasma Interactions with Soft Materials Using Combinatorial Plasma
Process Analyzer
K. Takenaka1,4, Y. Setsuhara1,4, K. Cho1,4, M. Shiratani2,4, M. Sekine3,4, and M. Hori3,4
	1Osaka University, Japan, 2Kyushu University, Japan, 3Nagoya University, Japan, 4Japan Scienceand Technology Agency, CREST, Japan
P-57	Protein patterning with selective adsorption on surface by partial plasma
polymerization
H. Takahashi, T. Ii, A. Irie, and H. Muguruma
Shibaura Institute of Technology, Japan

P-58

Experimental Verification of Etching Effect of Microorganism Due to Oxygen Radicals
Y. Zhao, A. Tsukasaki, A. Ogino, and M. Nagatsu
Shizuoka University, Japan

P-59

Study of bacteria sterilization at low discharge voltage by using microplasma
Y. Komuro, M. Blajan, and K. Shimizu
Shizuoka University, Japan

P-60

Analysis of plant nutrients by laser-induced breakdown spectroscopy
T. Ohta1, K. Yamamoto1, and M. Ito2
Wakayama University, Japan, 2Meijo University, Japan

1

P-61

Surface-wave Plasma Induced Grafting Polymerization of Polyethylene Glycol onto
Polymer Surface and Immobilization of L-Cysteine
Z. Shao, S. Noguchi, A. Ogino, and M. Nagatsu
Shizuoka University, Japan

P-62	Decomposition of Dimethyl Sulfide(DMS) using Atmospheric Argon Micro-plasma
System
H.-H. Chen, C.-C. Weng, J.-D. Liao, W.-H. Kang, L.-M. Whang, C.-C. Chao, and J.-E. Chang
National Cheng Kung University, Taiwan
P-63	Observation of Microwave Plasma Ignition in Water using High-Speed Camera andCalculation of Temperature Distribution around Coaxial ElectrodeY. Hattori, S. Mukasa, S. Nomura, and H. Toyota
Ehime University, Japan
P-64

Control of plasma and cavitation bubble in liquid-phase laser ablation by applying
supersonic wave
A. Fujikawa, N. Takada, and K. Sasaki
Nagoya University, Japan

P-65	Surface Activation of Poly (vinylidene fluoride) Membrane by Cyclonic AtmosphericPressure Plasma Processing
R.-S. Juang, H.-Y. Cheng, C.-Y. Tsai, Y.-C. Chang, and C. Huang
Yuan Ze University, Taiwan
P-66

Hollow plate effects on microwave plasma production at high pressure
S. Ohta1, I. Liang1, K. Kato2, K. Nakamura1, and H. Sugai1
Chubu University, Japan, 2Nagoya Industrial Research Institute, Japan

1

P-67

Hydrothermal Pulsed Discharge Plasma for Conversion of Organic Compounds	Wahyudiono, M. Mitsugi, H. Watanabe, K. Nagafuchi, T. Kiyan, M. Sasaki, H. Akiyama, and
M. GotoKumamoto University, Japan
P-68	Measurements of electron energy distribution accelerated in the cathode region in
CCP by using energy analyzer
T. Matsubara1, T. Muranaka1, T. Hayashi1, A. Kono1, N. Mizutani2, and K. Suu2
Nagoya University, Japan, 2ULVAC Inc., Japan1

P-69	Deposition of Zn1-xMnxO thin films by Atmospheric Barrier-Torch Discharge andmeasurement of electron density from Stark broadening of Hb
J. Olejnicek, O. Churpita, Z. Hubicka, S. Kment, M. Cada, A. Dejneka, and L. JastrabikInstitute of Physics AS Cr, Czech Republic
P-70	Saturation of the Balmer-a line of atomic hydrogen in diode laser absorption
spectroscopy
R. Asakawa1, M. Goto2, and K. Sasaki1
Nagoya University, Japan, 2National Institute for Fusion Science, Japan1

P-71	Time Resolved Measurement of Hb Emission from Atmospheric-Pressure Pulsed
Microwave Plasma
A. Kamata, H. Yang, T. Ishijima, and H. Toyoda
Nagoya University, Japan
P-72	Measurement of Multiphoton Ionization Efficiency Relevant to Laser Thomson
scattering diagnostics
Y. Matsuda, M. Aramaki, and A. Kono
Nagoya University, Japan
P-73	Emission spectroscopy of microplasma in Ar/N2 mixture for surface treatment
applications
M. Blajan, S. Muramatsu, A. Umeda, and K. Shimizu
Shizuoka University, Japan
P-74

Measurement of plasma parameters of atmospheric pressure microplasma jet excitedby microwave
T. Shirasaki, M. Aramaki, and A. Kono
Nagoya University, Japan

P-75

Surface Loss Probabilities of H, N Radicals in Afterglow Plasma

	C.S. Moon1, K. Takeda1, S. Takashima2, M. Sekine1,5, Y. Setsuhara3,5, M. Shiratani4,5, and M. Hori1,5
	1Nagoya University, Japan, 2Plasma Center for Industrial Applications, Japan, 3Osaka
University, Japan, 4Kyushu University, Japan, 5Japan Society of Technology Agency, JapanP-76	Measurements of molecular nitrogen densities in sparkplug assisted atmosphericpressure microwave discharges using rotational Raman scattering
M. ElSabbagh1, S. Kado2, M. Kaneko3, Y. Ikeda3, and K. Sasaki1
Nagoya University, Japan, 2The University of Tokyo, Japan, 3Imagineering Inc., Japan

1

P-77

A Stable Large-Volume Fluorine Negative-Ion Source for Ultrafine Etching
M Abid Imtiaz, and T. Mieno
Shizuoka University, Japan

P-78

Effects of amplitude modulation of RF discharge volatege on ion saturation current
H. Miyata, S. Iwasita, Y. Yamada, K. Koga, and M. Shiratani
Kyushu University, Japan

P-79	Synthesis dynamics of nanoparticles produced by laser ablation of a solid target
immersed in pressurized water
W. Soliman, N. Takada, and K. Sasaki
Nagoya University, Japan
P-80

XPS Analysis of Plasma-Polymer Interactions for Organic-Inorganic Hybrid Materials
K. Cho1,4, K. Takenaka1,4, Y. Setsuhara1,4, M. Shiratani2,4, M. Sekine3,4, and M. Hori3,4

	1Osaka University, Japan, 2Kyushu University, Japan, 3Nagoya University, Japan, 4Japan Scienceand Technology Agency, CREST, Japan
P-81	Ha emission intensity measurements of H2+Ar+C7H8 plasmas in H-assisted plasma CVD
reactor	T. Nomura1, Y. Korenaga1, K. Koga1,4, M. Shiratani1,4, Y. Setsuhara2,4, M. Sekine3,4, and M. Hori3,4
	1Kyushu University, Japan, 2Osaka University, Japan, 3Nagoya University, Japan, 4JST CREST,Japan
P-82	Ar/H2O plasma treatment of multiwall carbon nanotubes for dispersion Improvement
in waterC. Chen, A. Ogino, B. Liang, and M. Nagatsu
Shizuoka University, JapanP-83

Deposition of n-type a-Si:H using SiH4+PH3 multi-hollow discharge plasma CVD
K. Nakahara, H. Sato, Y. Kawashima, K. Koga, and M. Shiratani
Kyushu University, Japan

P-84	Surface temperature rise of a-Si:H films during deposition in silane multi-hollow
discharges
Y. Kawashima, K. Nakahara, H. Sato, W.M. Nakamura, K. Koga, and M. Shiratani
Kyushu University, JapanP-85	Numerical Analysis on Heat Convection in the Synthesis of Single Walled Carbon
Nanotubes by Arc Vaporization
G.-D. Tan, and T. Mieno
Shizuoka University, Japan
P-86	Effect of Post-Baking on Copper Adhesion to Polyimide Films Treated by High Density
Microwave Plasma
K. Usami1, T. Ishijima1, H. Toyoda1, K. Iseki2, H. Sugai3
Nagoya University, Japan, 2Toyobo Co. Ltd., Japan, 3Chubu University, Japan

1

Banquet (19:00-20:30)

Friday, March 12, 2010	Special session on Frontier science of interactions between plasmas andnano-interfaces (9:00-11:50)
9:00

S-01

Frontier science of interactions between plasmas and nano-interfaces		

M. Shiratani, and K. Koga

		

Kyushu University, Japan

9:30

S-02	Nano-interface plasmas generated in supercritical fluids and their application
to nanomaterials processing		K. Terashima, S. Stauss, H. Miyazoe, T. Shizuno, and K. Saito		

The University of Tokyo, Japan

10:00

Plasmas Involving Liquid Media, and Their Applications

S-03

		

T. Shirafuji, Y. Noguchi, J. Hieda, N. Saito, and O. Takai		

Nagoya University, Japan
Coffee Break (10:30-10:50)

10:50

S-04

Physical control of plasma and cavitation bubble in liquid-phase laser ablation

		

K. Sasaki, and N. Takada

		Nagoya University, Japan

11:20

S-05	Atmospheric Glow Discharges with Liquid Electrode – Toward Understanding of
Plasma-Liquid Interface –		F. Tochikubo, N. Shirai, and S. Uchida		Tokyo Metropolitan University, Japan
Lunch (11:50-13:00)

Invited Talks 3 (13:00-14:10)
13:00

I-08

Modelling of chlorine inductive discharges

		

P. Chabert, and E. Despiau-Pujo

		

Ecole Polytechnique, France

13:35

I-09	Plasma functionalized carbon nanomaterials for nanocomposite bio-scaffolds
and cell viability effects

		O.J. Yoon1, H.J. Lee2, S.S. Kim2, and N.-E. Lee1

		1

Sungkyunkwan University, Korea, 2Chung Ang University, Korea

Contributed Talks 2 (14:10-15:10)
14:10

O-05	Population inversion in a magnetized thermal plasma investigated by active andpassive spectroscopy

		

W.E.N. van Harskamp1, O. Gabriel2, D.C. Schram1, M.C.M. van de Sanden1, and R. Engeln1		1Eindhoven University of Technology, The Netherlands, 2Helmholtz-Zentrum fürMaterialien und Energie GmbH, Germany
14:30

O-06	Ultrafast heating in air at atmospheric pressure for nanotechnology
applications

		

D.Z. Pai, G.D. Stancu, F. Kaddouri, D.A. Lacoste, and C.O. Laux		

Ecole Centrale Paris, France

14:50

O-07	Anisotropic film construction using plasma nanotechnology (atomic
polymerization)

		

L. Hoferek1, R. Trivedi1, J. Mistrik1,2, and V. Cech1

		1Brno University of Technology, Czech Republic, 2University of Pardubice, Czech
Republic
Coffee Break (15:10-15:30)
Invited Talks 4 (15:30-17:50)
15:30

I-10

Tailoring nanostructures with low-temperature plasmas

		

U. Cvelbar		

Jozef Stefan Institure, Slovenia

16:05

Focused Inert Ion Beam systems for 3D rock tomography on the nano-scale

I-11

		

R. Boswell, and T. Senden

		

RSPE, ANU, Australia

16:40

ZnO nano-materials: Synthesis, Characteristic, and Application

I-12

		

S.-H. Nam, M.-H. Kim, S.-D. Lee, B. Hong, Y.-J. Kim, and J.-H. Boo		

Sungkyunkwan University, Korea

17:15

With the aim of establishing low-cost fabrication technology for

I-13

high-performance nitride-based light emitters		

H. Amano, M. Iwaya, S. Kamiyama, and I. Akasaki		Meijo University, Japan

17:50		

Closing Remarks