NNT 2022 (October 5-7, Toyama Internatinal Conference Center, Toyama, Japan) Program
October 5, 2022
No.

TimeAuthor and Affiliation

Paper Title

CountryRoom A (2F)
5A-1: Opening and Plenary Session I (12:00-14:50) → (12:40-14:50)
Opening Remark

5A-1-1

12:00-12:10

5A-1-2

12:10-12:50 (Plenary)

5A-1-3

Intelligent Nanostructures for Instant Mobile Health Self-Test

Chair: Ryutaro Maeda (Xi'an Jiaotong Univ., China)
Chair: Helmut Schift (Paul Scherrer Institute (PSI), Switzerland)
Yoshihiko Hirai, Organizing Chair, Osaka Metropolitan Univ., Japan
Stephen Y. Chou, Essenlix and Princeton Univ., USAUSA

12:50-13:30 (Plenary)Thanner Christine, EV Group, Austria

Austria

5A-1-4

Nanoimprint Lithography for Semiconductor Manufacturing
13:30-14:10 (Plenary)

Anupam MITRA, KIOXIA, JapanJapan

5A-1-5

14:10- 14:50 with R2R Submicron Electrode Formation Technology

Masayuki Abe, Asahi Kasei, JapanJapan

Withdrawn

Nanoimprinting – From Niche to High Volume Manufacturing

Development of Smart Logistic Solution Using Flexible Sensor(Plenary)

5A-2: Video & industry I (14:50-15:40) (Video)
5A-2-T1

14:50-14:55 GEOMATEC Co., Ltd.

5A-2-T214:55-15:00 Autex Inc.
Meisho Kiko Co., Ltd.

5A-2-T3
5A-2-T4

15:00-15:05 Canon Inc.

5A-2-T5

15:05-15:10 Iwasaki Electric Co., Ltd.

5A-2-T6

15:10-15:15 Ohara Quartz.Co.,Ltd.

5A-2-T7

15:15-15:20 TOKYO OHKA KOGYO CO., LTD.

5A-2-T8

15:20-15:25 ZEON CORPORATION

5A-2-T9

15:25-15:30 Obuducat Technologies AB

5A-2-T10

15:30-15:35 Gunei Chemical Industry Co., Ltd.

5A-2-T11

15:35-15:40 TAZMO CO., LTD.
KYODO INTERNATIONAL INC.

5A-2-T12

5A-3: Evening Session I (16:00-17:30)

Roll-to-Plate Nanoimprint Lithography for mass manufacturing Jan Matthijs ter Meulen, Erhan Ercan, Kidong Lee and Bram J. F. Titulaer,

5A-3-1

16:00-16:30 of NanoOptics (Invited)

5A-3-2

16:30-16:50

5A-3-3

16:50-17:10 digital image correlation analysis

5A-3-4

17:10-17:30
17:30-17:50

5A-4-1

17:50-18:20

5A-4-2

18:20-18:40

Netherlands

Rio Yamagishi 1, Sayaka Miura 1, Kaori Yasuda 1, Riku Miyazaki 1, Yuki
Kawano 2, Yoshiyuki Yokoyama 2, Naoto Sugino 3, Takao Kameda 3,Satoshi Takei 1, 1 Toyama Pref. Univ., 2 Toyama Industrial Technol. Res.
and Development Center and 3 Sanko Gosei, JapanJapan

Nanoimprinted speckle patterns for mechanical testing using

E.C. Kursun 1, S. Supreeti 2, K.G.F. Janssens 1, H. Schift 1, P. Spätig 1, 1
Paul Scherrer Inst., Switzerland, 2 Technische Univ. Ilmenau, Germany

Switzerland

Defect reduction technology in replica template process

Ryo Kobayashi, Akihiko Ando, Hideaki Sakurai and Shingo Kanamitsu,
Kioxia, JapanJapanBreak

Nanoimprinted meta-surface(meta-lens) (Invited) (Online)

Chair: Jun Taniguchi (Tokyo Univ. of Sci., Japan)
Chair: Juha Rantala (Inkron Oy, Finland)
Heon Lee, Korea Univ., Korea

Chiral Crystallization Directed by Chiral Near-Field Force with Hiromasa Niinomi 1, An-Chieh Cheng 2, Teruki Sugiyama 3, Miho Tagawa
4, Hiroshi Yoshikawa 5, Satoshi Uda 1, Tomoya Oshikiri 1 and Masaru
Nanostructured Plasmonic Metasurfaces
Nakagawa 1, 1 Tohoku Univ., 2 Hokkaido Univ., 3 National Yang Ming Chiao
Tung Univ., Taiwan, 4 Nagoya Univ., 5 Osaka Univ., Japan
NIL-Based Patterning of Chemically Strengthened GlassesJoão Gaspar 1, Ye Zhou 1, Prasanna Venkatesh Krishnan 1, Kristian Thulin
1, Patrik Lundström 1, Virginia Soares 2 and Virginia Chu 2, 1 Obducat
18:40-19:00
Technologies, Sweden and 2 INESC MN, Portugal
Effects of planetary spin-coating on the preparation of thin

5A-4-4Morphotonics, The Netherlands

High-resolution nanoimprint lithography of pharmaceuticalingredients containing volatile solvents achieved with gaspermeable porous mold

5A-4: Evening Session II (17:50-19:20)

5A-4-3Chair: Hiroshi Hiroshima (AIST, Japan)
Chair: Marc Verschuuren (SCIL Nanoimprint Solutions, The Netherlands)

19:00-19:20 films for imprinting (Online)

Kazuki Tokumaru and Koichiro Ogata, Natl. Inst. of Technol., Oita College,JapanKorea

JapanSwedenJapan

NNT 2022 (October 5-7, Toyama Internatinal Conference Center, Toyama, Japan) Program
October 6, 2022
Room A (2F)
Chair: Jun Taniguchi (Tokyo Univ. of Sci., Japan)
Chair: Joao Gaspar (Obducat Technologies)

6A-5: Morning Session I (8:40-10:50)
6A-5-1

8:40-9:10

From Visible Wavelengths to Near Infrared: Direct
Nanoimprint Lithography for High Aspect Ratio, All-Inorganic
Metalenses, Waveguides and Diffractive Optics (Invited)

6A-5-2

9:10-9:30

Filler-Free NIL Compatible Ultra-High Refractive Index Resins
Carlos Pina-Hernandez and Keiko Munechika, HighRI Optics, USAfor Patterning Diffractive Optical Elements

USA

6A-5-3

9:30-9:50

Atom-scale-precision fluorescence alignment demonstrated by Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa and Masaru
computational simulation
Nakagawa, Tohoku Univ., JapanJapan

6A-5-4

9:50-10:10

6A-5-5

10:10-10:30 surface lattice resonance in ZrO2 nanoparticle arrays

6A-5-6

10:30-10:50 optical components

High efficiency crystalline metalens with TiO2 sol gel process

Photoluminescence enhancement by electric and magnetic
Material × Process – critical factors of NIL manufacturedVincent J. Einck, Andrew McClung, Dae Eon Jung, Amir Arbabi and JamesJ. Watkins, Univ. of Massachusetts, USAUSA

Wonjoong Kim 1, Joohoon Kim 2, Chanwoong Park 1, Hojung Choi 1, Ick
Chan Joo 3, Junsuk Rho 2,4,5 and Heon Lee 1, 1 Korea Univ., 2 POSTECH,
3 MIRTEC, 4 POSCO-POSTECH-RIST and 5 NINT, Korea

Korea

M. Higashino, S. Murai, T. Y. Lo, S. Tomita and K. Tanaka, Kyoto Univ.,
JapanJapan

Juha Rantala, Inkron Oy, Finland

FinlandFoyer (3F)
10:50-11:10 Coffee BreakRoom A (2F)
6A-6: Oral & industry I (11:10-11:50）
6A-6-T1

11:10-11:20 GEOMATEC Co., Ltd.

6A-6-T2

11:20-11:30 Autex Inc.

Chair: Kenichi Nomura (AIST, Japan)

Meisho Kiko Co., Ltd.

6A-6-T3
6A-6-T4

11:30-11:35 Canon Inc. (Video)

6A-6-T5

11:35-11:40 Iwasaki Electric Co., Ltd. (Video)

6A-6-T6

11:40-11:50 Ohara Quartz.Co.,Ltd.

6A-7: Poster Short Presentation (Video) (12:00-14:20)
SCIL Nanoimprint Solutions, turning your surfaces into

6A-7-P1

12:00-12:05 functions; direct patterning of nano-photonics

6A-7-P2

12:05-12:10

6A-7-P3

6A-7-P4

Marc A. Verschuuren and Jeroen Visser, SCIL Nanoimprint Solutions, TheNetherlands

Gas-permeable porous mold in nanoimprint lithography forsuper engineering plastic

Satoshi Takei 1, Sayaka Miura 1, Rio Yamagishi 1, Naoto Sugino 2, Takao
Kameda 2, Yuki Kawano 3 and Yoshiyuki Yokoyama 3, 1 Toyama Pref.
Univ., 2 Sanko Gosei and 3 Toyama Industrial Technol. Res. and Devel.
Center, Japan
Formation of the atomically stepped surface of the spin-coated Yuto Maeda 1, Naho Kaneko 1, Tomoaki Oga 1, Satoru Kaneko 2,1, Akifumi
Matsuda 1 and Mamoru Yoshimoto 1, 1 Tokyo Inst. of Technol. and 2
12:10-12:15 PEDOT:PSS conducting polymer thin film by thermal
nanoimprinting
Kanagawa Inst. Industrial. Sci. & Technol., Japan
Influence of atomic-scale thermal-nanoimprint patterning and Tomoaki Oga 1, Hisashi Miyazaki 2, Satoru Kaneko 3,1, Akifumi Matsuda 1
and Mamoru Yoshimoto 1, 1 Tokyo Inst. of Technol., 2 Natl. Defense
12:15-12:20 surface modification of the polymer substrate on growth offunctional oxide thin films
Academy and 3 Kanagawa Inst. of Industrial Sci. and Technol., Japan
High Aspect Ratio Nanopillars fabricated by UV Nanoimprint

TheNetherlands
JapanJapanJapan

Oliver S. Maier 1, Michael J. Haslinger 1, Michael Mühlberger 1, Sonja Kopp
1, Markus Pribyl 2, Philipp Taus 2, Heinz D. Wanzenboeck 2 and Elena
Guillen 1, 1 PROFACTOR and 2 Vienna Univ. of Technol., Austria

Austria

The Study of Bile Duct Stent Having Antifouling Properties

Atsushi Sekiguchi 1,2, 1 Osaka Metropolitan Univ. and 2 Litho Tech Japan,Japan

Japan

Computational study on the releasing process of slanted

1 Ryuhei Yamamura, 2 Yuusei Kunitou, 1 Kai Kameyama, 2 Masaaki
Yasuda and 2 Yoshihiko Hirai, 1 Osaka Pref. Univ. and 2 Osaka Metropolitan
Univ., JapanJapan

D. Nakamura, Y. Hirai, and M. Yasuda, Osaka Metropolitan Univ., JapanJapan

6A-7-P5

12:20-12:25 Lithography

6A-7-P6

12:25-12:30 Using Biomimetics Technique

6A-7-P7

12:30-12:35 diffraction structure for AR glasses

6A-7-P8

12:35-12:40 Resin

6A-7-P9

12:40-12:45 Resin

6A-7-P10

12:45-12:50 nanoimprint lithography using deep learning systems

6A-7-P11

12:50-12:55 structure

6A-7-P12

12:55-13:00

6A-7-P13

13:00-13:05 replica mold with line and space patterns on ultraviolet

Stochastic Simulation of Deactivation Effects in UV Curable
Compatibility of Thermal Property among in Nanoimprint

Study on smart process window design for thermal

Investigation of filling behavior of UV nanoimprint by bridge
Two-tone pattern transfer using nanoimprint and silver ink

Kai Kameyama 1, Yuusei Kunitou 2, Hiroaki Kawata 2, Masaaki Yasuda 2
and Yoshihiko Hirai 2, 1 Osaka Pref. Univ. and 2 Osaka Metropoiltan Univ.,Japan
Yuusei Kunitou 1, Ryuhei Yamamura 2, Kai Kameyama 2, Masaaki Yasuda
1 and Yoshihiko Hirai 1, 1 Osaka Metropolitan Univ. and 2 Osaka Pref. Univ.,
Japan

Japan

Japan

Yusuke Murakami and Jun Taniguchi, Tokyo Univ. of Sci., JapanJapan

K. Enomoto and J. Taniguchi, Tokyo Univ. of Sci., Japan

Japan

Tomohito Wakasa and Jun Taniguchi, Tokyo Univ. of Sci., Japan

Japan

Transfer durability of low concentration release agent coatednanoimprint lithography

NNT 2022 (October 5-7, Toyama Internatinal Conference Center, Toyama, Japan) Program
October 6, 2022
Crystal growth of GaN based nanowires using SiO2 masks
formed by nanoimprint lithography process

Mizuki Takahashi, Shiori Yamamura, Yukimi Jinno, Nanami Nakayama, SaeKatsuro, Yuki Yamanaka, Shiori Ii, Ayaka Shima, Soma Inaba, Tetsuya
Takeuchi, Motoaki Iwaya, Satoshi Kamiyama, Meijo Univ., JapanJapan

13:10-13:15 the plastic film

Natsuki Ogawa, Tomohiro Shimizu, Shoso Shingubara, Takeshi Ito, KansaiUniv., JapanJapan

6A-7-P16

Effect of nanopillar size on bactericidal and antibacterial
13:15-13:20 properties

Ikki Shingeya, Tomohiro Shimizu, Shoso Shingubara and Takeshi Ito,
Kansai Univ., JapanJapan

6A-7-P17

13:20-13:25 repellence and chemisorption for a shape-fixed residual layer
Tohoku Univ., Japan

6A-7-P14

13:05-13:10

6A-7-P15

Antibacterial property dependent with the nanopillar pitch on

Selection of adhesive molecular layers with monomer-

6A-7-P18

in UV nanoimprint lithography
Prediction of Durability of the Mold for Production of
13:25-13:30 Nanostructures in Ultraviolet Nanoimprint Lithography (UVNIL) using Machine Learning
Molecular dynamics study of effects of loading pressure on

Kanta Kawasaki, Akiko Onuma, Hiromasa Niinomi, and Masaru Nakagawa,Yuta Aoki, Junichiro Ono, Tomohito Wakasa, Jun Taniguchi and Shin-ichi
Satake, Tokyo Univ. of Sci., JapanJapan

Naoki Matamoto and Kazuhiro Tada, National Inst. of Technol., Toyama
College, JapanJapan

TienYang Lo, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., JapanJapan

6A-7-P19

13:30-13:35 shear properties of organic nanofilms

6A-7-P20

13:35-13:40 luminescence control

6A-7-P21

Fabrication of Flexible Sticker of Si metasurface by a Transfer
Yuto Inoue, Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., Japan
13:40-13:45 Process

6A-7-P22

13:45-13:50 and photolithography

6A-7-P23

13:50-13:55 nanofilaments inside clingfish mimicked tape by using FEM

6A-7-P24

simulation
Nanoimprint and nanoprint processes using Seamless Roller
13:55-14:00 Mold

6A-7-P25

14:00-14:05 resist made by laser direct write lithography (Online)

6A-7-P26

Fabrication of Ag nanoantenna sticker and application toFabrication of rose petal effect film by moth-eye structure mold Kazuki Arai, Takuto Wakasa, Kazuki Fujiwara and Jun Taniguchi, Tokyo
Univ. of Sci., JapanAnalysis of resistance against deformation stress ofMicromolds for glass molding by the carbonization of epoxy

Japan

Japan
Japan

Kazuma Tsujioka 1, Yasutaka Matsuo 1,3, Yuji Hirai 2 and Masatsugu
Shimomura 2, 1 Hokkaido Univ. and 2 CIST, JapanJapan

Makoto Okada, Asahi Kasei, JapanJapan

Muhammad Refatul Haq and Helmut Schift, Paul Scherrer Inst., Switzerland

Switzerland

14:05-14:10 holes by imprint and photolithography hybrid process

H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta, Osaka Metropolitan Univ.,
Japan

Japan

6A-7-P27

Imprint process for glass nano-patterning using silica nano14:10-14:15 powder

Yu Kubota and Fujio Tsumori, Kyushu Univ., JapanJapan

6A-7-P28

14:15-14:20 SIMILAR SCALE TO CERAMIC NANO PARTICLE

Ryoma Taira and Fujio Tsumori, Kyushu Univ., Japan

Japan

Fabrication of self-standing PMMA film with 0.5 μn through-

MICRO-POWDER-IMPRINTING USING MOLDS WITH

Foyer (3F)
6A-8: Poster session & Industrial exhibition On-site (14:20-16:00)
6A-8

14:20-16:00 Poster Session

Room A (2F)
Chair: Jan Matthijs ter Meulen (Morphotonics, The Netherlands)
Chair: Kenichi Nomura (AIST, Japan)

6A-9: Evening Session III (16:00-17:30)
6A-9-1

6A-9-2

6A-9-3

6A-9-416:00-16:30

Electric-field-driven Jet Deposition Micro-nano 3D Printing andHongbo Lan, Xiaoyang Zhu and Guangming Zhang, Qingdao Univ. ofits Applications in Manufacturing Advanced Circuits andTechnol., China
Electronics (Invited) (Online)

Hierarchical Micro-/Nanostructured Substrates for the Growth Michael Mühlberger 1, Sonja Kopp 1, Alison Deyett 2, Markus Pribyl 3,Michael Haslinger 1, Anica Siegel 1, Philipp Taus 3, Elena Guillen 1, Aranxa
of Cardiomyocytes made by Nanoimprint Lithography
Torres Caballero 2, Bozhidar Baltov 4, Leif Yde 5, Jan Stensborg 5, Sasha
16:30-16:50
Mendjan 2, Steffen Hering 4, Heinz D. Wanzenboeck 3, 1 PROFACTOR,
Austria, 2 Institute of Molecular Biotechnology, 3 Technical Univ. Wien, 4Chanpharm, Austria and 5 Stensborg, Denmark
Development of optical anti-reflection with anti-fogging
16:50-17:10 property combined with nanostructure and specially designed Kazuma Kurihara and Hokari Ryohei, AIST, Japanvacuum deposition
Analysis of Elastic Contacts in Chemical Mechanical Polishing Joscha S. Kappel 1, Robert Kirchner 2, Sascha Bott 3, Benjamin LilienthalUhlig 1, Johann W. Bartha 2, 1 Fraunhofer-IPMS, 2 Dresden Univ. of
17:10-17:30 by using Nanoimprint Lithography as a Characterization
MethodTechnol., 3 GlobalFoundries Dresden Module One, Germany

China

AustriaJapan

Germany

Foyer (3F)
17:30-17:50 Coffee BreakRoom A (2F)
6A-10: Evening Session IV (17:50-19:00)

Chair: Koji Asakawa (KIOXIA, Japan)
Chair: Kenichi Nomura (AIST, Japan)

6A-10-1

17:50-18:20

Demonstration of Micromirror Fabrication for Co-packaged
Optics Using UV Nanoimprint (Invited)

F. Nakamura 1, K. Suzuki 2, A. Noriki 2 and T. Amano 2, 1 PETRA and 2
AIST, JapanJapan

6A-10-2

18:20-18:40

Combining UV-curable polymeric materials for advanced
optical designs (Online)

M. Brehm, R. Richter, M. Trinkwalder, M. Follner and S. Prinz, DELO
Industrial Adhesives, Germany

Germany

6A-10-3

18:40-19:00

Antibacterial film using oligoglucosamine derivatives innanoimprint lithography utilizing biomimetics technology

Sayaka Miura 1, Rio Yamagishi 1, Riku Miyazaki 1, Kaori Yasuda 1, Naoto
Sugino 2, Takao Kameda 2, Yuki Kawano 3, Yoshiyuki Yokoyama 3, Satoshi
Takei 1, 1 Toyama Prefectural Univ., 2 Sanko Gosei and 3 Toyama Industrial
Technol. Res. and Development Center JapanJapan

NNT 2022 (October 5-7, Toyama Internatinal Conference Center, Toyama, Japan) Program
October 7, 2022
Room A (2F)
7A-11: Morning Session II (9:00-10:50)
7A-11-1

9:00-9:30

Chair: Koji Asakawa (KIOXIA, Japan)
Chair: Michael Mühlberger (PROFACTOR, Austria)

Ultra-High Throughput Electron Beam Lithography System for Takaomi Ito 1, Takumi Watanabe 1, Satoshi Nagai 1, Sung-won Youn 2,Nanoimprint Mold Fabrication (Invited)
Kenta Suzuki 2 and Hiroshi Hiroshima 2, 1 Elionix and 2 AIST, Japan

7A-11-2

9:30-9:50

Nanofabrication of metal/semiconductor/metal structure for
efficient photocathode under strong coupling condition

7A-11-3

9:50-10:10

Nanoimprint-based plasmonic/non-plasmonic lattices forcontrolling light

7A-11-4

10:10-10:30 nanostructure enables skillful light diffusion and self-cleaning

7A-11-5properties
Simple Preparation of the Multi-functional Vulcanized Rubber
10:30-10:50 Microstructures

A novel optical diffuser inspired by Morpho butterfly’s

Japan

Tomoya Oshikiri 1, Xu Shi 2, Hiroaki Misawa 2,3 and Masaru Nakagawa 1, 1Tohoku Univ., 2 Hokkaido Univ., Japan and 3 National Yang Ming Chiao
Tung Univ., Taiwan

Japan

Shunsuke Murai and Katsuhisa Tanaka, Kyoto Univ., JapanJapanKazuma Yamashita 1, Takuma Hattori 1,2, Yuji Kuwahara 1,2 and Akira
Saito 1,2, 1 Osaka Univ. and 2 RIKEN Spring-8, JapanJapan

Yuji Hirai 1, Syun Uemura 1, Yasutaka Matsuo 2, Takahiro Okamatsu 3,Toshihiko Arita 4, Masatsugu Shimomura 1, 1 Chitose Institute of Technol., 2Hokkaido Univ., 3 YOKOHAMA RUBBER and 4 Tohoku Univ., JapanJapan

10:50-11:00 Break

7A-12: Oral & Industry II (11:00-11:50)
7A-12-T7

11:00-11:05 TOKYO OHKA KOGYO CO., LTD. (Video)

7A-12-T8

11:05-11:15 ZEON CORPORATION

7A-12-T9

11:15-11:25 Obuducat AB

7A-12-T10

11:25-11:35 Gunei Chemical Industry Co., Ltd.

7A-12-T11

11:35-11:40 TAZMO CO., LTD. (Video)

7A-12-T12

11:40-11:50 KYODO INTERNATIONAL INC.

7A-13: Plenary session II (12:10-14:20)
Development of Nanoimprint Lithography Tool (Plenary)

7A-13-1

12:10-12:50

7A-13-2

12:50-13:30 Metadevices (Plenary) (Online)

7A-13-3

13:30-14:10

7A-13-4

14:10-14:20 Closing Remark:Nanoimprint Technology for Plasmonic Sensors andBack to the future - nanoimprint revisited (Plenary)Award Ceremony

Chair: Jun Taniguchi (Tokyo Univ. of Sci., Japan)

Chair: Yoshihiko Hirai (Osaka Pref. Univ., Japan)
Chair: James J. Watkins (Univ. of Massachusetts, USA)
Toshiki Ito, CANON, JapanJapan

Stella W. Pang, City University of Hong Kong, Hong Kong, ChinaHong Kong

Helmut Schift, Paul Scherrer Institut, Switzerland

Switzerland

James J. Watkins (Univ. of Massachusetts, USA)

NNT 2022 (October 5-7, 2022, Toyama International Conference Center) Floor Map
3F

Technical Exhibition List

12P1P23P3P44P5P6P7P8657P98P10P1112911101011P12P13P14Coffee Break1298Poster Session

3F

7P15P16P17P18P19P20
P21P22P23
P24
P25
P26
P27P28Coffee Break3F65

Poster Session

Escalator

321EV

4

Tecnical Exhibition

6A-7: Poster Short Presentation (Video)(12:00-14:20, October 6)
6A-8: Poster session & Industrial exhibition On-site (14:20-16:00, October 6)
Poster Panel Available: 9:00-11:00
Poster Remove: 16:00-17:50

Room ANo Photo
No Video

2F

Registration Desk

All participants are requeste to register at
the registration desk. Please give yourname to get your name card.

Speaker2FSession Registration Desk

Chair personSessionRegistration

Secretariat
Registration Desk

Tourist Information
English Volunteer

EV2FAll authors are requested to register at thesession registration desk no later than 30min. before the session starts. Please picka name card point (blue) up there.