J. Inst. Electrostat. Jpn.

, 31, 3 (2007) 119 124

ᶧ/ᶧ♽ߦ߅ߌࠆ㕒㔚ࡊࡠ࠮ࠬ (II)㧙㕒㔚ಝ㓸૞↪ࠍ↪޿ߚ᳓/ᴤࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻ㧙㊄ᴛ⺈ม㧖,1㧘㜞ᯅఝ੺㧖㧖
㧔2006 ᐕ 9 ᦬ 15 ᣣฃઃ ; 2007 ᐕ 3 ᦬ 28 ᣣฃℂ㧕Electrostatic Process in Liquid/Liquid System (II)㧙 Resolution of W/O Emulsion by Using an Electrostatic Agglomeration Method 㧙Seiji KANAZAWA,*,1 and Yusuke TAKAHASHI**(Received September 15, 2006 ; Accepted March 28, 2007)

Demulsification of W/O emulsion was carried out by the injections of positive and negative charged water
droplets using the method of dc electrostatic atomization. The atomized water droplets with both polarities
capture the suspended small water droplets in the emulsion and then collide with each other by means of
Coulomb force. The aggregated droplets fall down due to the gravity as well as EHD flow effect, resulting in theseparation of water and oil. The test liquid, which was prepared by the ac electrostatic atomization technique,maintained a state of emulsion for longer time if no electric field was applied. When the oppositely charged
droplets were injected into the test liquid, the emulsion with a dull color gradually became transparent as a time
elapsed. It was found that two injections of oppositely charged water droplets were effective for resolving theemulsion.

1.

ߪߓ߼ߦᛛⴚ 㧕ߦ↪޿ࠄࠇߡ޿ࠆ߇㧘ߘߩၮ␆⎇ⓥߣߒߡ W/O ࠛࡑᶧ/ᶧ♽ߢߩ㕒㔚᳇⃻⽎ߦߟ޿ߡߪߎࠇ߹ߢᄙߊߩ⎇ⓥ߇

࡞࡚ࠪࡦߩ㕒㔚ಽ㔌ߦߟ޿ߡߪᄙߊߩႎ๔߇޽ࠆ 㧕㧚ߐࠄߥߐࠇߡ߈ߚ㧚2 ⒳㘃ߩᶧ૕߇ᷙߑࠆ⁁ᴫߦ߅޿ߡ㔚⇇ࠍ߆ߦ㔚᳇⊛⸃੃ൻߦട߃ߡ᳇ᵃᵈ౉ 㧕߿⿥㖸ᵄߩ૬↪ 㧕߇ⴕߌࠆߎߣߢ㧘ᷙว߿ಽ㔌ߣ޿ߞߚ⃻⽎߇↢ߓࠆ‫⎇ᧄޕ‬ⓥߢߪ㧘ࠊࠇߡ޿ࠆ߇㧘ߘߩಽ㔌ߦߪ㒢⇇߇޽ࠆ㧚᳓Ṣߩಽᭂലᨐߦᶧ/ᶧ♽ߢߩ㕒㔚ࡊࡠ࠮ࠬߣߒߡࠛࡑ࡞࡚ࠪࡦߩ↢ᚑߣߘߩࠃࠆಝ㓸ߢߪ᳓Ớᐲ߇ૐߊߥࠆ߶ߤ㧘᳓Ṣ㑆ߩ〒㔌߇㐳ߊߥ෻ኻߩᠲ૞ߢ޽ࠆ⸃੃ൻࠍหߓⵝ⟎ߢ⥄࿷ߦⴕ߃ࠆᚻᴺߩࠅ㧘ๆᒁജ߇ૐਅߔࠆ㧚ߘߩߚ߼㧘ᦨ⚳⊛ߦߪ 0.1%⒟ᐲߩ᳓

⏕┙ࠍ⋡⊛ߣߒߡ޿ࠆ㧚߇ᧂಽ㔌ߩ߹߹ᴤਛߦᱷ⇐ߔࠆߎߣߦߥࠆ 㧕㧚೨࿁ߩႎ๔ 㧕ߢߪ‫ޟ‬ᶧ/ᶧ♽ߦ߅ߌࠆ㕒㔚ࡊࡠ࠮ࠬ(Σ) 㧙ᱜߣ⽶ߦ⩄㔚ߒߚᏪ㔚᳓Ṣࠍᴤ⋧ਛߦಽᢔߐߖߡᴤਛߦ㕒㔚ᓸ☸ൻߦࠃࠆ᳓/ᴤࠛࡑ࡞࡚ࠪࡦߩ૞⵾㧙‫ߣޠ‬㗴ߒߡ㧘੤ሽ࿷ߔࠆਇ⚐‛߹ߚߪᱷ⇐ߔࠆᓸዊ᳓Ṣࠍ᝝ᝒᓟ㧘ࠢ࡯ࡠࡦᵹ㜞㔚⇇ߦࠃࠆ㕒㔚ᓸ☸ൻࠍ↪޿ߡᐔဋ☸ᓘ߇⚂ 10Pm ߩ᳓૞↪ജߦࠃࠅ㧘ߔߺ߿߆ߦಝ㓸ߐߖࠆߎߣ߇ߢ߈ࠇ߫㧘ߘߩṢࠍᴤਛߦಽᢔߒ㧘⇇㕙ᵴᕈ೷ࠍ૶߁ߎߣߥߊචᢙᤨ㑆቟ቯᓟ⢈ᄢൻߒߚ᳓Ṣߪ㊀ജᴉ㒠ߒߡ᛽಴ߔࠆߎߣ߇ߢ߈ࠆ㧚ߒߒߚ W/O㧔ᴤਛ᳓ဳ㧕ࠛࡑ࡞࡚ࠪࡦߩ૞⵾߇น⢻ߢ޽ࠆߎߣߚ߇ߞߡ㧘ല₸ߩ⦟޿ᶧ૕ᠲ૞߇น⢻ߦߥࠆߣ⠨߃ࠄࠇࠆ㧚ࠍ␜ߒߚ㧚෻ኻߩᠲ૞ߢ޽ࠆ⸃੃ൻߪ㧘↥ᬺ⊛ߦߪ㕒㔚⣕Ⴎߐࠄߦ㧘ࠢ࡯ࡠࡦ૞↪ജࠍᄢ߈ߊߔࠆߦߪᵹേ߿੤ᵹ㔚⇇㧘⿥㖸ᵄߥߤߩ⵬ഥᚻᲑࠍ↪޿ࠆߎߣߦࠃࠅ᳓Ṣห჻ࠍធㄭ

ࠠ࡯ࡢ࡯࠼㧦ᶧ/ᶧ♽㧘W/O(ᴤਛ᳓ဳ)ࠛࡑ࡞࡚ࠪࡦ㧘㕒㔚ಝ㓸㧘㕒㔚ᓸ☸ൻ㧘 EHD㧚* ᄢಽᄢቇᎿቇㇱ㔚᳇㔚ሶᎿቇ⑼㧔870-1192 ᄢಽᏒᣤ㊁ේ
700㧕
Department of Electrical and Electronic Engineering, Faculty ofEngineering, Oita University, 700 Dannoharu, Oita 870-1192,Japan** ᄥᐔᵗ࠮ࡔࡦ࠻ᩣᑼળ␠਄⏷Ꮏ႐⸳஻ㇱ㧔049-0193 ർᶏ㆏ർ᢯Ꮢ⼱ᅢ 1-151㧕
Taiheiyo Cement Co., Kamiiso Plant, 1-151, Taniyoshi, Hokuto,Hokkaido 049-0193, Japan1
skana@cc.oita-u.ac.jpߐߖࠆߎߣ߇㊀ⷐߣߥࠆ 㧕㧚ߒ߆ߒߥ߇ࠄ㧘㕒㔚ಝ㓸ᴺߪ ESP㧔㔚᳇㓸ߓࠎⵝ⟎㧕߳ߩᔕ↪ᛛⴚߣߒߡ㧘ᾍߥߤߩࠨࡉࡒࠢࡠࡦ☸ሶߦㆡ↪ߒ㧘ࠃࠅ㜞޿㓸ߓࠎ₸ࠍᓧߚႎ๔଀ 㧕߇޽ࠆ߇㧘ᶧ૕ਛߦಽᢔߔࠆᓸዊᶧṢߩಝ㓸ᴺߣߒߡߩᔕ↪଀ߪ޽߹ࠅߥ޿㧚ᴤ⋧ਛߩ᳓⋧ߩ㒰෰ߪ㧘ේᴤߩ⣕Ⴎಣℂએᄖߢߪ㧘ශ೚ᯏߩࠗࡦࠠᵞᵺᶧߩౣ↢ 㧕ߥߤ߳ߩᣂߚߥ⹜ߺ߽޽ࠅ㧘੹ᓟ㧘ⅣႺ⽶⩄ૐᷫߩߚ߼ߩ࡝࡙࡯ࠬᛛⴚߣߒߡ㊀ⷐߦߥࠆߣ⠨߃ࠄࠇࠆ‫ޕ‬ߘߎߢᧄ⎇ⓥߢߪᶧ/ᶧ♽ߢߩ㕒㔚ᓸ☸ൻߢ৻⥸ߦ↪޿ࠄ120 (38)

31

32007

Oscilloscopeࠇࠆࡁ࠭࡞㔚ᭂࠍⵝ⟎ო㕙ߦኻะߐߖߡ⸳⟎ߒ㧘ᱜ㧘⽶ߦᏪ㔚ߒߚᓸ☸ൻ᳓Ṣࠍᵈ౉ߒߡ㕒㔚ಝ㓸૞↪ߦࠃࠆ W/O ࠛࡑ

Needle Valve࡞࡚ࠪࡦߩ㜞ㅦ⸃੃ൻࠍⴕ߁ⵝ⟎ࠍ⸳⸘ߒߚ㧚㔚᳇ᵹ૕ജቇ
⊛㧔EHD㧕ലᨐࠍ૬↪ߒߡ㧘ࠛࡑ࡞࡚ࠪࡦਛߩᏪ㔚᳓Ṣߩᵹേߦࠃࠆⴣ⓭㧘ಝ㓸ࠍଦㅴߐߖߚ㧚߹ߚ㧘ᱜ࡮⽶ߦᏪ㔚ߒߚPIN Photodiode᳓Ṣࠍᵈ౉ߒߚ႐วߣࡁ࠭࡞㔚ᭂߦ㔚࿶ߛߌශടߒߡ᳓Ṣ

2.

Electrometer

Reactorࠍᵈ౉ߒߥ޿႐วߣߩᲧセ߽ⴕߞߚ㧚ታ㛎ⵝ⟎ߣᣇᴺ

DC H.V.㧔㧗㧕

੹࿁⹜૞ߒߚW/O ࠛࡑ࡞࡚ࠪࡦ⸃੃ൻⵝ⟎ߩ᭎⇛࿑ࠍ࿑ߦ␜ߔ㧚࡝ࠕࠢ࠲࡯ߪ OO ߩࠕࠢ࡝࡞⵾ኈེ߆ࠄߥࠆ㧚࿑  ߦ␜ߔࠃ߁ߦ㜞㔚࿶ශട㔚ᭂߣߒߡࠬ࠹ࡦ࡟ࠬ⵾࿑㧝 ታ㛎ⵝ⟎ߩ᭴ᚑ
Fig.1 Schematic diagram of the experimental apparatus.

ࡁ࠭࡞㧔㐳ߐ OO㧘ౝᓘ OO㧘ᄖᓘ OO㧕ࠍ㧘ࠕ࡯ࠬ㔚ᭂߣߒߡࠛࡑ࡞࡚ࠪࡦ૞⵾ᤨߦߪࠬ࠹ࡦ࡟ࠬ⵾࡝ࡦࠣ㧔ౝ

Wire Electrodeᓘ OO㧘ᄖᓘ OO㧕ࠍ૶↪ߒߚ㧚೨ႎ 1) ߢㅀߴߚࠃ߁ߦ㧘Pipe߇ሽ࿷ߔࠆߚ߼⋥ᵹ㔚࿶ࠍශടߒߚߣ߈ߦߪ቟ቯൻߒߚᓸࠕ࡯ࠬ㔚ᭂߣߒߡ࡝ࡦࠣ㔚ᭂߩઍࠊࠅߦ࠲ࡦࠣࠬ࠹ࡦ✢㧔⋥Compressed AirRing Electrodeࡁ࠭࡞ኻ࡝ࡦࠣ㔚ᭂ♽ߩ႐ว㧘㔚ᭂ㑆ߦߪࠕࠢ࡝࡞⵾ߩო㕙☸ൻࠍⴕ߁ߎߣ߇ߢ߈ߥ޿ߩߢ㧘ࠛࡑ࡞࡚ࠪࡦ⸃੃ൻᤨߦߪ

DC H.V.㧔㧙㧕

Magnetic Stirrer
He-Ne Laser

Water

25mm

OilNozzle Electrode

Positive
DC H.V. (+)

60mm

Negative(-) DC H.V.

He-Ne Laser

20mm 100mmᓘ PO㧕ࠍⵝ⟎਄ㇱߦ⸳⟎ߒߚ‫✢ޕ‬㔚ᭂߩ૏⟎ߦߟ޿ߡߪ㧘ᓸ☸ൻߩ᭽ሶࠍ᷹ⷰߒߥ߇ࠄ㧘ࡁ࠭࡞㔚ᭂవ┵ߣ✢㔚ᭂߩ〒㔌ࠍ OO ߣߔࠆߎߣߢ㧘⋥ᵹ㔚࿶ߩශടߦ߅޿ߡ߽ PO࿑㧞 ⸃੃ൻߩߚ߼ߩ࡝ࠕࠢ࠲࡯Fig.2 Schematic diagram of the reactor for demulsification
process.

એਅߩᓸዊᶧṢߩ↢ᚑࠍน⢻ߦߒߚ㧚ߎߩ㔚ᭂ♽ࠍⵝ⟎ო㕙ߦኻะߒߡ⸳⟎ߒ㧘⋥ᵹ㔚࿶ߦࠃࠆ㕒㔚ᓸ☸ൻࠍ↪޿ߡ࡝ࠕࠢ࠲࡯ߩᏀฝߦ⸳⟎ߐࠇߚࡁ࠭࡞㔚ᭂ߆ࠄߘࠇߙࠇᱜߣ⽶Ꮺ㔚ᓸ☸ൻ᳓Ṣߩᵈ౉ߪⴕࠊߕ㧘᳓ࠍలႯߒߡ޿ߥ޿ࡁ࠭࡞㔚ᭂߦ㔚࿶ࠍශടߔࠆߎߣߢ㧘ߎࠇ߹ߢᄙߊታᣉߐࠇߡ޿ࠆㅢᏱߩ㔚᳇⊛⸃੃ൻ․ᕈ߽⹏ଔߒߚ‫ޕ‬ࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻ⁁ᴫߩ᷹ቯߦߪ㧘᳓ߣᴤߩಽ㔌ᐲࠍᢙ୯ൻߔࠆߚ߼ߦ࡟࡯ࠩశߩㅘㆊ․ᕈࠍ೑↪ߒߚ㧚*Ǵ0G ࡟࡯ࠩశࠍ࡝ࠕࠢ࠲࡯ߩᐩ߆ࠄ㜞ߐ OO ߩ૏⟎ߦᾖ኿ߒ㧘ࠛࡑ࡞࡚ࠪࡦࠍㅘㆊߒߚ࡟࡯ࠩశࠍ 2+0 RJQVQFKQFG ߢฃశߒ㧘ߘߩ಴ജ㔚࿶ࠍࠝࠪࡠࠬࠦ࡯ࡊߦࠃߞߡ᷹ቯߒߚ㧚࡟࡯ࠩశߩㅘㆊ₸ 6 ߪᰴᑼߢቯ⟵ߒߚ㧚TVW / Ou 100
Voil>%@

100

Transmission of He-Ne laser [%]ߦ⩄㔚ߒߚᓸ☸ൻ᳓Ṣࠍᵈ౉ߢ߈ࠆࠃ߁ߦߒߚ㧚

80
60
40
20
000.02

0.04

0.06

0.08

0.1

0.120.14

Water concentration in w/o emulsion [%]㧔㧕ߚߛߒ㧘 VW/O ߪࠛࡑ࡞࡚ࠪࡦߩ႐วߩ಴ജ㔚࿶୯ߢ޽ࠅ㧘Voil ߪࠪ࡝ࠦ࡯ࡦᴤߩߺߩ႐วߦ߅ߌࠆ಴ജ㔚࿶୯ߢ޽ࠆ㧚ࠛࡑ࡞࡚ࠪࡦਛߩ᳓Ớᐲߣ࡟࡯ࠩߩㅘㆊ₸ߩ㑐ଥࠍ⺞ߴࠆߣ㧘࿑ 3 ߩࠃ߁ߦ㕖✢ᒻ⊛ߥ㑐ଥߢ޽ࠅ㧘࡟࡯ࠩశ߇ㅘㆊߔࠆߩߪࠛࡑ࡞࡚ࠪࡦਛߩ᳓Ớᐲ߇⚂ 0.04㨪0.12㧑ߩ▸࿐ߢ޽ࠆߎߣ߇ࠊ߆ߞߚ㧚ߎߩᩞᱜᦛ✢ࠍ↪޿ߡ࡟࡯ࠩశߩㅘㆊ₸࿑㧟 ࠛࡑ࡞࡚ࠪࡦਛߩ᳓Ớᐲߣ࡟࡯ࠩశㅘㆊ₸ߩ㑐ଥ
Fig.3 Relation between water concentration in the emulsion
and transmission of the laser beam.
߆ࠄᴤਛߩ᳓Ớᐲࠍ᳞߼ߚ㧚⸃੃ൻߔࠆߚ߼ߩ⹜ᢱ㧔W/O ࠛࡑ࡞࡚ࠪࡦ㧕ߪ೨ႎ 1) ߢㅀߴߚ੤ᵹ㔚⇇ߦࠃࠆ㕒㔚ᓸ☸ൻ㧔1kHz㧘8kV㧕ࠍ↪޿ߡ㧘ᐔဋ☸ᓘ߇⚂ 10Pm ߩᓸ☸ൻ᳓Ṣࠍᴤ⋧ߦಽᢔߔࠆߎߣߢ⇇㕙ᵴᕈ೷ࠍ૶↪ߔࠆߎߣߥߊ૞⵾ߒߚ㧚ಽᢔ⋧ߦߪ⫳⇐᳓㧔2

/(II)

121 (39)

࡯࠻㧔EHD㧕߇⷗߃ߥߊߥߞߡ޿ߊ⁁ᴫ߇ࠊ߆ࠆ㧚⚂ 8 ಽᓟ

⴫ 1 ᶧ૕⹜ᢱߩ‛ᕈ୯ (20͠)
Table 1 Physical properties of the sample liquids.
LiquidSilicone oil

Distilled water

Density [kg/m3]

935

1000

Viscosity [Pa㨯s]

9.410-3

110-3

Surface tension [N/m]20.110-3

7210-3

Relative permittivity [-]

2.62

80

Electric conductivity [S/m]110-131.710-4ߦߪ᳓Ớᐲ߇ 0.5%ߩ W/O ࠛࡑ࡞࡚ࠪࡦ߇૞⵾ߐࠇߚ㧚ߎߩW/O ࠛࡑ࡞࡚ࠪࡦߪ㊀ജᴉ㒠ߦࠃࠅ᳓߇ಽ㔌ߔࠆߚ߼ߦߪ
⚂ 15 ᤨ㑆߆߆ߞߚ㧚3.

ታ㛎⚿ᨐ߅ࠃ߮⠨ኤ 㕒㔚ಝ㓸ߦࠃࠆࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻ
૞⵾ߒߚࠛࡑ࡞࡚ࠪࡦߦኻߒߡ㔚ᭂߦߘࠇߙࠇᱜᭂᕈ㧘⽶ᭂᕈ⋥ᵹ㜞㔚࿶ࠍශടߔࠆߣ㧘ࡁ࠭࡞㔚ᭂㄭறߩࠛࡑ࡞࡚ࠪࡦਛߩᓸዊ᳓Ṣߪᱜ㧘⽶ߦ⩄㔚ߐࠇ㧘ࡁ࠭࡞߆ࠄࠕ࡯ࠬ㔚ᭂ

㨪4mL㧕
㧘ㅪ⛯⋧ߦߪࠪ࡝ࠦ࡯ࡦᴤ㧔10cSt㧘⚂ 400mL㧕ࠍ૶↪ߒ㧘᳓Ớᐲ߇ 0.5㨪1%ߦߥࠆࠃ߁ߦߒߚ㧚⫳⇐᳓ߪࡁ࠭࡞
㔚ᭂߦߟߥ߇ࠆࡄࠗࡊౝߦలႯߒ㧘ⓨ᳇㧔࿶ജ 2kg/cm2㧕ߢട࿶ߐࠇ㧘࠾࡯࠼࡞ࡃ࡞ࡉߦࠃࠅᵹ㊂⺞ᢛߒߡ㧘ࡁ࠭࡞ࠃࠅ

ߦะ߆ߞߡ↢ߓߚ EHD ᵹേߦࠃߞߡ⒖േߔࠆ㧚⩄㔚ߐࠇߚᓸዊ᳓Ṣ߇ࠢ࡯ࡠࡦ૞↪ജ㧔ๆᒁജ㧕ߦࠃߞߡ࡝ࠕࠢ࠲࡯ਛ
ᄩߢⴣ⓭ߔࠆߣಝ㓸߇⿠ߎࠅ㧘⢈ᄢൻߒߚ᳓Ṣߪ㊀ജᴉ㒠ߒߡ޿ߊߣ⠨߃ࠄࠇࠆ㧚ߒ߆ߒ㧘ߘࠇߙࠇߩࡁ࠭࡞㔚ᭂߦหᭂᵈ౉ߒߚ‫ޕ‬ή㔚࿶ᤨߦ߅ߌࠆ⫳⇐᳓ߩྃ಴㊂ߪ⚂ 0.14mL/minᕈߩ㔚࿶ࠍශടߔࠆߣ㧘ಝ㓸૞↪ߪ߶ߣࠎߤ⷗ࠄࠇߥ߆ߞߚ㧚ߢ޽ࠆ㧚ታ㛎ߪቶ᷷߇ 15㨪20͠ߩ߽ߣߢⴕߞߚ‫⴫ޕ‬㧝ߦ૶↪

ߎࠇߪ⩄㔚ߐࠇߚᓸዊ᳓Ṣ߇หᭂᕈߩߚ߼㧘ࠢ࡯ࡠࡦ૞↪ജߒߚᶧ૕⹜ᢱߩ‛ᕈ୯ࠍ␜ߔ㧚ߪ෻⊒ജߣߥࠅ㧘ⴣ⓭߇⿠ߎࠅߦߊ޿ߚ߼ߣ⠨߃ࠄࠇࠆ㧚߹࿑  ߪࠃࠅ቟ቯߒߚࠛࡑ࡞࡚ࠪࡦ߇૞⵾ߢ߈ࠆࠃ߁ߦ⏛᳇ᡬᜈⵝ⟎ࠍ૬↪ߒߥ߇ࠄ㕒㔚ᓸ☸ൻࠍⴕߞߡ޿ࠆ᭽ሶߢ޽ࠅ㧘ᤨ㑆߇⚻ߟߦߟࠇߡ࡝ࠕࠢ࠲࡯ౝߩᶧ૕ߪਇㅘ᣿ߣߥߞߚ㧘ශട㔚࿶ߩᄢ߈ߐࠍᄌൻߐߖߚ႐ว㧘࿑ 5 ߩࠃ߁ߦ㔚࿶߇ᄢ߈޿߶ߤ⸃੃ൻ߇ଦㅴߐࠇߚ㧚ߚߛߒ㧘15kV એ਄ߩ㔚࿶ශടߢߪ᡼㔚㖸߇⏕⹺ߐࠇ㧘ᴤߩഠൻ╬߳ߩᓇ㗀ࠍㆱߌࠆߡⵝ⟎ో૕ߦᐢ߇ࠅ㧘࡝ࠕࠢ࠲࡯ߩⵣ஥ߦ⾍ࠅઃߌߚᢥሼࠪ

Character sheet

Magnetic Stirrer(a) initial state(b) after 10 seconds(b) after 1 minute(b) after 8 minutes࿑㧠 W/O ࠛࡑ࡞࡚ࠪࡦߩ૞⵾ߩ᭽ሶ (1 kHz, 8kV)
Fig.4 Photographs of W/O emulsion production process.

122 (40)3132007ߚ߼㧘ߎࠇએ਄ߩ㔚࿶ߪශടߒߥ߆ߞߚ㧚ߦ⩄㔚ߒߚ᳓Ṣࠍᵈ౉ߒߚታ㛎ߢߪ㧘Ꮺ㔚᳓Ṣ߇㕒㔚ಝ㓸ߔ ⋥ᵹ㔚࿶ශടߦࠃࠆ㕒㔚ᓸ☸ൻࠆ᭽ሶ߇᷹ⷰߐࠇߚ㧚ಝ㓸ߒߚ᳓Ṣߦߐࠄߦ೎ߩ᳓Ṣ߇⓭౉⋥ ᵹ 㜞 㔚 ⇇ ߦ ࠃ ࠆ 㕒 㔚 ᓸ ☸ ൻ ߦ ߅ ޿ ߡ ᱜ ࡮⽶ ߦ ⩄ߒ⢈ᄢൻߔࠆ႐ว߽޽ߞߚ㧚߹ߚ㧘᳓Ớᐲ߇㜞޿߶ߤ⸃੃ൻ㔚ߒߚ᳓Ṣࠍ↢ᚑߒ㧘ࠛࡑ࡞࡚ࠪࡦਛߦᵈ౉ߔࠆ㧚߇ㅦߊⴕࠊࠇࠆߎߣ߇ࠊ߆ߞߚ㧚ߎࠇߪࠛࡑ࡞࡚ࠪࡦਛߦሽ࿑  ߪࡁ࠭࡞㧙✢㔚ᭂ♽ߦ߅޿ߡᱜᭂᕈߣ⽶ᭂᕈߩ⋥ᵹ㜞㔚࿷ߔࠆ᳓Ṣ߇ᄙ޿ߚ߼㧘᳓Ṣห჻ߩ㑆㓒߇⁜ߊ㧘ಝ㓸߇ଦㅴ࿶ࠍශടߒߚ႐วߩࡁ࠭࡞ㄭறߩ᳓Ṣߩ᭽ሶߢ޽ࠆ㧚⚦㐳ߊિᒛߒߚᶧṢߪ਄ਅߦᝄേߒ㧘ߘߩవ┵߆ࠄᓸ☸ൻ߇⿠߈ߡ޿ࠆ㧚߹ߚ㧘ශട㔚࿶ߩ਄᣹ߦߣ߽ߥ޿ࡁ࠭࡞߆ࠄࠕ࡯ࠬ㔚ᭂ߳ะ߆߁ᵹേ㧘ᶧ㕙߇਄᣹ߔࠆࡐࡦࡇࡦࠣ⃻⽎ߥߤߩ '*&350Pmലᨐ߇ᒝ߹ߞߡ޿ߊ᭽ሶ߇⏕⹺ߐࠇߚ㧚ߎࠇߪ㧘ࠗࠝࡦ࠼࡜࠶ࠣ࿶ജ߿ࠣ࡟࡯࠺ࠖࠛࡦ࠻ജ߇ࠃࠅᄢ߈ߊߥࠆߎߣ߇ේ
࿃ߣ⠨߃ࠄࠇࠆ㧚(a) Positive 13kV(b) Negative 㧙13kV࿑㧢 ⋥ᵹ㔚⇇ߦࠃࠆ㕒㔚ᓸ☸ൻ
Fig.6 Atomization images by dc electric field.

࿑㧣ߦࠪ࡝ࠦ࡯ࡦᴤਛߢ㧘⋥ᵹ㔚⇇ߦࠃࠅ᳓Ṣࠍ㕒㔚ᓸ☸
ൻߐߖߚߣ߈ߩᐔဋ☸ᓘߩශട㔚࿶ߦኻߔࠆᄌൻࠍ␜ߔ㧚↢200ᚑߐࠇߚᏪ㔚᳓Ṣߩᐔဋ☸ᓘߪ 13kV ߦ߅޿ߡ⚂ 60Pm ߢ޽ᭂᕈ㧘⽶ᭂᕈߣ߽ߦᐔဋ☸ᓘߪ߶߷╬ߒߊ㧘ᭂᕈߦࠃࠆᓸ☸
ൻᶧṢᓘ߳ߩᓇ㗀ߪ⷗ࠄࠇߥ߆ߞߚ㧚 ᱜߣ⽶ߦ⩄㔚ߒߚ᳓Ṣᵈ౉ߩലᨐ࿑ 8 ߪ㔚ᭂߦ⋥ᵹ㔚⇇ࠍශടߒ㧘㕒㔚ಝ㓸ߩ㓙ߦ㧘㕒㔚ᓸ☸ൻߦࠃࠅᱜ࡮⽶ߦ⩄㔚ߒߚ᳓Ṣࠍࠛࡑ࡞࡚ࠪࡦਛߦᵈ౉ߒߚ႐วߣᵈ౉ߒߥ޿႐วߩ⸃੃ൻߩታ㛎⚿ᨐࠍ␜ߒߡ޿ࠆ㧚

Droplet diameter [Pm]Droplet diameter [Pm]ߞߚ㧚㔚࿶ශടᤨߩᵹ㊂ߪ⚂ 0.3mL/min ߢ޽ߞߚ㧚߹ߚ㧘ᱜ
150

100

PositiveNegative50Ꮺ㔚᳓Ṣࠍᵈ౉ߒߚ႐วߩᣇ߇㧘࡟࡯ࠩ߇ 100%ㅘㆊߔࠆ߹ߢߩᤨ㑆߇᣿ࠄ߆ߦㅦߊ㧘㔚⇇ߩශടߩߺߩ⸃੃ൻߦᲧߴ㧘0ಝ㓸ߒߚ᳓Ṣ߇ᄢ߈ߊ㧘ᴉ㒠ߒߡ޿ߊ᳓Ṣᢙ߽ᄙ޿ߎߣ߇⋡1010.511ⷞߢ⏕⹺ߐࠇߚ㧚ߐࠄߦࠪ࡝ࠦ࡯ࡦᴤߩߺߩᴤ⋧ਛߦᱜ࡮⽶1212.513࿑㧣 ශട㔚࿶㧙ᐔဋ☸ᓘ․ᕈ
Fig.5 Relation between the applied voltage and mean diameterof droplets.

100

100

Transmission of He-Ne laser [%]Transmission of He-Ne laser [%]11.5

Applied voltage [kV]

80
60
40

10kV
11kV
12kV
13kV

2000

100

200

300

400

500

600

Time [s]806040Water 0.50% (without atomization)
Water 1% (without atomization)
Water 0.50% (with atomization)
Water 1% (with atomization)

200050100

150200250300

Time [s]࿑㧡 ⸃੃ൻ․ᕈ㧔ශട㔚࿶ߩᓇ㗀㧕Fig.5 The effect of the applied voltage on the electricalresolution of the W/O emulsion.

࿑㧤 ⸃੃ൻ․ᕈ㧔Ꮺ㔚ᶧṢᵈ౉ߩലᨐ㧕Fig.8 The effect of charged droplets injection on the electricalresolution of the W/O emulsion.

/(II)

123 (41)ߐࠇ߿ߔ޿ߚ߼ߣ⠨߃ࠄࠇࠆ㧚Ꮺ㔚᳓Ṣࠍᵈ౉ߔࠆߎߣߢ࡟

0sec

࡯ࠩశ߇ 100%ㅘㆊߔࠆ߹ߢߦⷐߔࠆᤨ㑆ߪ㧘᳓Ớᐲ߇ 0.5%

30secߩ႐วߢ 70 ⑽㧘1%ߩ႐วߢ 50 ⑽⍴❗ߐࠇߚ㧚ߔߥࠊߜ㧘᳓ߩỚᐲ߇ૐ޿߶ߤ᳓Ṣห჻ߩ㑆㓒߇ᐢߊ㧘㔚⇇ߩශടߛߌߢ

60secߪಝ㓸߇ଦㅴߒߦߊ޿ߚ߼㧘Ꮺ㔚᳓Ṣࠍᵈ౉ߔࠆലᨐߪᄢ߈

90sec޿ߎߣ߇ࠊ߆ࠆ㧚࡟࡯ࠩ߇ㅘㆊߒᆎ߼ࠆߩߪ᳓Ớᐲ߇⚂ 0.12%એਅߦߥߞߡ

120sec߆ࠄߢ޽ࠆ߇㧘࡟࡯ࠩ߇ㅘㆊߒᆎ߼ߡ߆ࠄߩ⸃੃ൻߪㅘㆊߔ

150secࠆ೨ߦᲧߴߡ᳓ߩỚᐲ߇ૐߊߥߞߡ޿ࠆߚ߼㧘ㆃߊߥࠆ௑ะ
ߦ޽ߞߚ㧚ߘߩࠃ߁ߥ႐วߦ߅޿ߡ㧘Ꮺ㔚᳓Ṣࠍᵈ౉ߔࠆᣇ180sec߇㔚⇇ߩශടߩߺߦࠃࠆ⸃੃ൻߦᲧߴ㧘⸃੃ൻᐲߩ਄᣹₸ߪ

210sec㜞޿㧚ߎߩߎߣ߆ࠄᏪ㔚᳓Ṣߩᵈ౉ߦࠃࠆ㕒㔚ಝ㓸૞↪ߩଦㅴߪലᨐ⊛ߢ޽ࠆߎߣ߇ࠊ߆ߞߚ㧚߹ߚ㧘࿑ 9 ߦ⸃੃ൻߩᤨ

240sec㑆ߦኻߔࠆᱷ⇐ߒߡ޿ࠆ᳓ߩ㊂ߩᄌൻࠍ␜ߔ㧚ᦨ⚳⊛ߦ࡟࡯ࠩశߩㅘㆊ₸߇ 100%ߦߥࠅ㧘ࠛࡑ࡞࡚ࠪࡦਛߩ᳓Ớᐲ߇ 0.
04%એਅ߹ߢߦߥߞߚߎߣ߇ࠊ߆ࠆ㧚ߎࠇߪಽᭂലᨐߦࠃࠆ⸃੃ൻߢᱷ⇐ߔࠆ᳓ߩ㊂㧔0.1%⒟ᐲ㧕ࠃࠅዋߥ޿㧚એ਄ㅀߴߚ⸃੃ൻߩ⚿ᨐߪ࿑ 10㧘࿑ 11 ߦ␜ߔ⸃੃ൻᤨߩ࡝ࠕࠢ࠲࡯ౝߩࠛࡑ࡞࡚ࠪࡦߩ᭽ሶ߆ࠄ߽ࠊ߆ࠆ㧚ࠛࡑ࡞࡚ࠪࡦߩೋᦼ⁁ᘒߪ⊕Ộߒߡ޿ࠆ߇㧘⸃੃ൻ߇ㅴ߻ߦߟࠇߡ࿑ 4 ߩ႐วߣ(a) without atomization(b) with atomization࿑㧝㧜 0.5 % W/O ࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻㆊ⒟Fig.10 Resolution process of W/O emulsion (Initial state:
0.5 % W/O emulsion, positive electrode: +13 kV㧘
negative electrode: -13 kV㧕

0sec

หߓ૏⟎ߦ⾍ࠅઃߌߚᢥሼࠪ࡯࠻㧔r13kV㧕߇ᓢ‫ߡࠇ⃻ߦޘ‬ߊࠆߩ߇ࠊ߆ࠆ㧚Ꮺ㔚᳓Ṣߩᵈ౉ߦࠃࠅಽ㔌߇ടㅦߐࠇߡ޿
ࠆ᭽ሶ߇ࠊ߆ࠆ㧚ߐࠄߦ᳓ߩೋᦼỚᐲ߇㜞޿ࠛࡑ࡞࡚ࠪࡦߩ

30secᣇ߇㧘ಽ㔌ߐࠇ߿ߔ޿㧚

60sec
90sec

Water concentration [%]0.140.12120sec

Water 0.50% (without atomization)
Water 0.50% (with atomization)
Water 1% (without atomization)
Water 1% (with atomization)

0.1

150sec0.08

180sec0.06

210sec0.04

240sec0.02
0(a) without atomization
050

100

150

200250(b) with atomization

300Time [s]࿑㧥 ⸃੃ൻߦࠃࠆࠛࡑ࡞࡚ࠪࡦਛߩ᳓Ớᐲߩᤨ㑆ᄌൻ
Fig.9 Time dependence of remaining water concentration inthe emulsion. (Initial state: 0.5 % W/O emulsion or 1 %W/O emulsion, positive electrode: +13 kV㧘negativeelectrode: -13 kV㧕࿑㧝㧝 1 % W/O ࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻㆊ⒟Fig.11 Resolution process of W/O emulsion (Initial state: 1 %W/O emulsion, positive electrode: +13 kV㧘negativeelectrode: -13 kV㧕ࠍ⹜૞ߒ㧘ߘߩ╙  Ბ㓏ߣߒߡᱜ࡮⽶ߩਔᭂᕈߦ⩄㔚ߒߚᶧ
4.

߹ߣ߼㕒㔚ᓸ☸ൻࠍⴕ߁ࡁ࠭࡞㔚ᭂ♽ࠍ↪޿ߚᶧᶧ♽ᠲ૞ⵝ⟎Ṣߩᵈ౉ߦࠃࠆ㕒㔚ಝ㓸ࠍ೑↪ߒߚࠛࡑ࡞࡚ࠪࡦߩ⸃੃ൻ․ᕈߦߟ޿ߡ⺞ߴߚ㧚ታ㛎ߩ⚿ᨐ㧘એਅߩ⍮⷗߇ᓧࠄࠇߚ㧚

124 (42)31㧔1㧕 ⵝ⟎ო㕙ߦኻะߒߡ⸳⟎ߐࠇߚࡁ࠭࡞㔚ᭂߦߘࠇߙࠇᱜᭂᕈ㧘⽶ᭂᕈߩ⋥ᵹ㜞㔚࿶ࠍශടߔࠆߣࠛࡑ࡞࡚ࠪࡦਛߦᱷ⇐ߔࠆ᳓Ṣߪ㧘࡝ࠕࠢ࠲࡯ਛᄩ߳⒖േߒ㧘ⴣ⓭ߔࠆߎߣߢಝ㓸ߒ㧘㊀ജᴉ㒠ߒߡ޿ࠆ᭽ሶ߇⏕⹺ߢ߈ߚ㧚
㧔2㧕 ૞⵾ߒߚ W/O ࠛࡑ࡞࡚ࠪࡦߦኻߒߡ⋥ᵹ㔚⇇ࠍ↪޿ߚ㕒㔚ᓸ☸ൻߦࠃߞߡᱜ࡮⽶ߦ⩄㔚ߒߚ᳓Ṣࠍᵈ౉ߔࠆߣ㧘㔚⇇ߩශടߩߺߦࠃࠆ㕒㔚ಝ㓸ߦᲧߴߡ⸃੃ൻ
߇ᄢ߈ߊଦㅴߐࠇߚ㧚㧔3㧕 ࡟࡯ࠩశߩㅘㆊ₸ࠍ᷹ቯߔࠆߎߣߦࠃߞߡ⸃੃ൻߩ
ቯ㊂⊛ߥ⹏ଔࠍⴕߞߚ⚿ᨐ㧘૞⵾ߒߚ᳓Ớᐲ߇ 0.5㨪
1 %ߩ W/O ࠛࡑ࡞࡚ࠪࡦ߅޿ߡ㧘ಽ㔌ᠲ૞ᓟߩ᳓Ớᐲߪ㧘᷹ቯ㒢⇇ߩ 0.04 %એਅߢ޽ߞߚ㧚ෳ⠨ᢥ₂㜞ᯅఝ੺, ㊄ᴛ⺈ม, ㊁ᧄᐘᴦ㧦㕒㔚᳇ቇળ⹹, 30 (2006)82) ጊญቇ㧘ਛጊᢅ㓶㧦㕒㔚᳇ቇળ⹹, 20 (1996) 68
3) C. A. R. Pearce : British Journal of Applied Physics, 5(1954) 136
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13 (1974) 1391)

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K. Fujinawa, M. Morishita, M. Hozawa, N. Imaishi, and H.
Ino : J. Chem. Eng. Japan., 17 (1984) 832
6) T. Hano, T. Ohtake, and K. Takagi : J. Chem. Eng. Japan., 21(1988) 345
7) S. E. Taylor : Colloids and Surfaces, 29 (1988) 298) ૛ખ⾫㧘ᣧᎹഞ㧘⮮የ㓶╷㧦ᣣᧄ㘩ຠᎿᬺቇળ⹹, 41 (1994)
657
9) O. Urdahl, T. J. Williams, A. G. Bailey, and M. T. Thew : Trans.
IChemE., 74 (1996) 158
10) C.-M.Lee, G.W. Sams, and J.P. Wagner : Journal ofElectrostatics, 53 (2001) 111) ጊᧄᴺᵏ㧘⿒ፄୃ৻㧘㊄ᴛ⺈ม㧘ᄢਭ଻೑৻㧘㊁ᧄᐘᴦ㧦㕒㔚᳇ቇળో࿖ᄢળ⻠Ṷ⺰ᢥ㓸’01, p.35, 㕒㔚᳇ቇળ(2001)
12) J. S. Eow and M. Ghadiri : Chemical Engineering Journal, 85(2002) 357
13) P. J. Bailes and P. K. Kuipas : Chemical Engineering Science,56 (2001) 6279
14) L. J. Stack, P. A. Carney, H. B. Malone, and T. K. Wessels :Ultrasonics Sonochemistry, 12 (2005) 15315) 㕒㔚᳇ቇળ✬㧘㕒㔚᳇ࡂࡦ࠼ࡉ࠶ࠢ㧘p.591㧘ࠝ࡯ࡓ␠(1981)16) 㕒㔚᳇ቇળ✬㧘㕒㔚᳇ࡂࡦ࠼ࡉ࠶ࠢ㧘p.278㧘ࠝ࡯ࡓ␠(1981)
17) ㊄ᴛ⺈ม㧘ᄢਭ଻೑৻㧘㊁ᧄᐘᴦ㧘⿷┙ቱ⦟㧦㕒㔚᳇ቇળ⹹, 16 (1992) 323
18) ᳯ↰᣽ਯ㧘㕍ᧁ዁৻㧘㜞⦟๺ᐘ㧘ᧃ↰ⓛ㧦ਃ⪉㊀Ꮏᛛႎ,41 (2004) 246