www . mksinst . c o m

Mass SpectrometrySolutions

CirrusTM3POWERFUL AND VERSATILE ATMOSPHERIC GAS ANALYSIS
Designed for researchers and engineers who require fast, sensitive, reliable monitoring ofgases at atmospheric pressure, the Cirrus™ 3 system provides superior analytical results in acompact, powerful, versatile platform for the lab or production facility.
Building on proven Cirrus Quadrupole Mass Spectrometry technology, the Cirrus 3 combines
state-of-the-art performance in compact benchtop and rack-mounted formats. With a heatedcapillary inlet and fast scan speed (250 points per second), gas compositions can be tracked
over wide dynamic range (ppb to percentage levels) more reliably.
Enhancements in capillary and oven design ensure precise temperature control and stability,
allowing you to obtain high quality data with greater confidence in your results. The versatile
Cirrus 3 system with its automatable software control can be optimized and customized for avariety of applications, from industrial processes to research applications.
Featuring automatic start-up and shut-down routines and built-in vacuum and heaterinterlocking for system protection, Cirrus systems are easy to install and operate. Cirrus
3 systems are manufactured from quality, field-proven materials to ensure reliability
and maximize up-time. Particular consideration has been paid to ease of service andmaintenance.

Features & Benefits
Reliable Performance• Monitors multiple gas species over a wide
dynamic range from trace levels (ppb) to 		high abundance (percentage levels)• Fast response – 250 data points per
second, and capillary inlet heated up to 		300°C• Precise and stable user-defined
temperature control with enhanced oven 		and capillary designs• Detect gases up to 300 amu. High
resolution options (1-100HP)
Versatile and Easy to Use• Recipe-driven Process Eye™ Professional 		supports gas monitoring and quantitation 		
applications• Customizable ‘Recipe-based’ software
provides automated operation and 		calibration• Fully network compatible via direct
Ethernet interface• Compact benchtop and rack-mountformats ideal for laboratory and 			manufacturing environments• Modular design for ease of maintenenceand service• Multiple inlet options for sampling different
gas conditions:— Fused silica (up to 150°C) and 				 stainless steel (up to 300°C) capillaries— Low flow capillaries— Multi-stream inlet (4-, 8-, and 16-way)— Automated variable pressure inlet 				 control (option)

Applications

Heating and Vacuum System•
••••
•
•••
•
•

The Cirrus 3 features a number of advancements in designthat aid stability and reproducibility of results. The vacuum
chamber (with quadrupole analyzer) and inlet interface
assembly is housed within a precision engineered stainlesssteel oven, providing low heat sink characteristics. Thisoffers high temperature uniformity and eliminates potential
cold spots that could otherwise cause undesirable sample
condensation and variance in analyses. The oven design
enables user-defined temperature control of the oven andcapillary, allowing for finer analytical control.

Monitoring trace contaminants in process gases
Gas purity and manufacturing QC
Catalyst studies – Chemisorption
Thermal analysis – TGA, DTA, DSC
Fuel cell monitoring and development
Fermentation and exhaust monitoring
Heat treatment/furnace monitoring
Membrane studies
Glove box gas monitoring
Lamp manufacturing
Freon detection and identification

Introduction
Cirrus systems are based on Quadrupole Mass
Spectrometry, widely acknowledged as a preferred platform
technology for many atmospheric pressure gas analysis
applications. The Cirrus 3 system, with its improved
temperature control and compact design, provides highlevels of performance and robustness in space-efficientand flexible configurations that are ideal for a wide rangeof analytical applications.
Precision engineered to provide fast and reproducible data,
Cirrus 3 can accurately detect and quantify gases andgas mixtures, from one or more sampling locations with asingle instrument. Gas composition can be monitored overa wide dynamic range, from percentage levels down to thesub ppm range.

The quadrupole analyzer itself is contained within astainless steel vacuum chamber which is pumped bya high compression turbo molecular/diaphragm pump
combination. The vacuum system is backed by an internal
4-stage diaphragm pump to maintain the integrity of thecompact design. The entire Cirrus 3 vacuum chamber canalso be baked to reduce residual gas background species
and to minimize any memory effects.
Gas Inlet
An essential feature of any gas analyzer is the ability tonot contaminate or alter the gas sample in any way. TheCirrus 3 inlet assembly incorporates either fused silica or
stainless steel capillaries that can be heated to a stableuser-defined temperature. The inlet assembly allows
for easy replacement of capillaries, while the optimized
insulation maximizes stability and reduces heat radiation.

Cirrus 3 is an ideal choice for atmospheric gas analysis
whether you work in a research setting or a manufacturing
environment. By combining Process Eye Professional
software with MKS technical support, Cirrus can beintegrated, optimized, and automated to your precisespecifications. Ultimately, users across your organization
realize greater benefits of the power of quadrupole mass
spectrometry.

The low volume and surface area of the assembly serves
to maximize response speed while minimizing memory
effects. Cirrus 3 systems can also be configured with
inlets for multi-stream sampling, stainless steel capillaries
for resistance to fluorine-based compounds, and apressure controller inlet (incorporating a gas independentcapacitance manometer) to allow sampling from sourcesthat vary from the nominal 1 bar inlet requirement. TheCirrus 3 vacuum system utilizes a high compression
turbo molecular pump, so light gases such as hydrogenand helium can be sampled with no additional expensive
pumping requirements.

Quadrupole Analyzer

Maintenance and AccessAt the heart of every Cirrus 3 system is a precision-built
quadrupole analyzer incorporating a closed ion source,a triple mass filter, and a dual (Faraday and Secondary
Electron Multiplier) detector system. This analyzer
configuration is selected to optimize sensitivity and longterm performance stability.

The Cirrus 3 internal oven has a removable cover allowing
easy access to the inlet interface, vacuum chamber,and analyzer ion source. This is particularly helpful forroutine maintenance, such as filament and capillary
replacement. A hot cathode (ion) gauge is incorporated
for independent vacuum pressure measurement andto provide an interlock signal for protection of the mass
spectrometer. A temperature sensor also ensures that theelectron multiplier detector cannot be switched on at hightemperatures, preserving its life. The Cirrus 3 is designedwith a lubricant-free pumping system. No elastomer seals
are used in the sample inlet system or in the high vacuum
region of the system.

Process Eye™ Professional Software
Cirrus 3 is operated using proven Process Eye
Professional software, a recipe-driven platform that
communicates with the system over a TCP/IP network.
Process Eye Professional is designed for use with thelatest Microsoft® operating systems including 32 bit or 64bit Windows® 7 and 10.

Options• Multiple gas stream inlet (4-, 8- or 16-way)• Corrosive gas sampling version• Regulated ion source pressure option to compensate forvariation in inlet pressure and gas composition• High mass resolution (1-100 amu HP)

Features and Benefits include:• Data presented in units relevant to the application• Fully automated operation and calibration• New workflow ''Recipes'' for quantitative applications• User-configurable alarms and warnings• Can be configured to track data from other process
sensors (temperature, pressure, flow, etc.)

Cirrus 3 rack-mount configuration

Specifications
Dimensions & Weight
Benchtop System
Rack-mount System

593mm L x 291mm W x 470mm H, 35 Kg
577mm L x 482mm W x 266mm (6U) H, 35 Kg

Mass Range

1-100 amu; 100HP, 1-200 amu and 1-300 amu options

Detection Limits		Gas dependent, typically < 100 ppb for non-interfering species

Electron Energy & Emission Current 		Operator variable
Operating Temperature and Humidity Range

5°C to 35°C, 20% to 80% RH (non-condensing)Oven Temperature

180°C for bakeout. User-definable for operation – typically 80°C

Capillary Inlet 											2.0m long with ¼'' Swagelok® end connection, heated to 150°C 			(optional heating to 300°C, with stainless steel only). 				Standard fused silica and optional stainless steel. User-definable temperaturecontrol.

Gas Consumption 		

20 ml/min (Lower uptake rate capillaries options are available)

Sample Pressure		

1 bar nominal

Pumping System						High compression turbo-molecular pump with internal 4-stage diaphragmbacking pump standard. Corrosive gas tolerant pumping with all internal pumps
optional.

Vacuum Hardware 								60 l/s turbo molecular pump with high conductance analyzer housing, inlet 		system, automated vacuum controller (RVC) completely interlocked and		integrated.

Automated Inlet Pressure Controller					A 640 (Baratron® capacitance manometer based) automated inlet pressure		controller is available as an option

Recommended PC Spec

Microsoft 32 bit or 64 bit Windows 7 or 10

Computer Interface		

1 x RJ45 Ethernet LAN port required

I/O Capability 								4 analog inputs (-11 to +11 volt, 22 bit) 					2 analog outputs (0-10 volt, 12 bit)
16 TTL digital I/O				Power		Universal mains input 100 – 240 VAC / 50 – 60 Hz			Power required: 700W maximum (during bakeout); 300W typicalCompliance		
CEOrdering Information
Rack-mount Instrument Product Ordering Codes:
Cirrus 3 (100 amu): 473-12E-ASP30
Cirrus 3 (200 amu): 473-22E-ASP30
Cirrus 3 (300 amu): 473-32E-ASP30

Benchtop Instrument Product Ordering Codes:
Cirrus 3 (100 amu): 474-12E-ASP30								Cirrus 3 (200 amu): 474-22E-ASP30								Cirrus 3 (300 amu): 474-32E-ASP30
For other options such as filament type, corrosion resistance, inlet pressure control, lower inlet flow capillaries and capillary material and temperature,contact a local MKS sales office for applications assistance.

Dimensional Drawing —Note: Unless otherwise specified, dimensions are nominal values in millimeters.

MKS Instruments, Inc.
Global Headquarters
2 Tech Drive, Suite 201
Andover, MA 01810

MKS Instruments, Inc.
Mass Spectrometry
Solutions

3635 Peterson Way		
Tel: 978.645.5500			Santa Clara, CA 95054
Tel: 408.750.0300
Tel: 800.227.8766 (in USA)
Web: www.mksinst.com
Cirrus 3 - 11/18© 2018 MKS Instruments, Inc.
All rights reserved.

MKS Instruments, Inc.
Mass SpectrometrySolutionsS sisCowley Way			Crewe, Cheshire CW1 6AG
Tel: +44.1270.250150

MKS products provided subject to the US Export Regulations. Diversion or transfer contrary to US law is prohibited.
Some Baratron® capacitance manometer products may not be exported to many end user countries without both US 		and local government export licenses under ECCN 2B230.
Specifications are subject to change without notice. mksinst™, Cirrus™, and Process Eye™ are trademarks andBaratron® is a registered trademark of MKS Instruments, Inc. Microsoft® and Windows® are registered trademarks ofMicrosoft Corporation. Swagelok® is a registered trademark of Swagelok Marketing Co.