SYSTEMS

Advanced Pulsed Laser Deposition
WITH IN SITU RHEED
THIN FILM GROWTH WITH ATOMIC PRECISIONTSST Advanced Pulsed Laser Deposition systems with in situ RHEED are state-ofthe-art, highly flexible PLD systems for thin film research at atomic level, ideallysuited and field proven for research on a large variety of materials including complex
oxides.
EXPERIENCE
Closely collaborating with the Universityof Twente, TSST integrates fundamental
knowledge on thin film growth andparameter optimisation in its designsof the PLD systems. Therefore, thesystems offer full flexibility in alteringand investigating the essential parameters such as gas mixtures, processpressure, fluence, target-to-substratedistance and substrate temperature
with the highest possible accuracy.

SERVICETSST PLD systems are installed andacceptance tested on site by experienced
TSST engineers. A full user training ispart of the installation procedure, during which monolayer growth control
using RHEED is demonstrated.
TSST engineers are always available forsupport, while our software with extensive data logging supports quick andeffective remote service.

TSST is specialised incustomised products.
With almost 20 yearsof experience TSST isable to offer individuallydesigned systems andcomponents adapted
to the need of ourcustomer. This includes
preparing a system forfuture upgrades.

System characteristics•Thin film growth of highest quality complex materials•

Single monolayer growth control with RHEED•

Fully customised design, including adaptation to a specific lab layout•

Remote support, service and on site training by TSST engineers•

Down to 5.0x10-10 mbar base pressure•

Up to 1100°C growth temperature•

Up to 6 odd shaped targets for heterostructure growth

Twente Solid State Technology BV

SYSTEMS

Advanced Pulsed Laser Deposition* optional
Typical System Specifications
VACUUM CHAMBER
Chamber shape

Cylindrical, spherical*

Base pressure<10-8 mbar, down to 5.0x10-10 mbar*

Pumping

Turbo (700l/s), TSP*, Ion getter*

Bakeout*

Heating tape, bakeout tent

Process gases, pressure

O₂, Ar, N₂, O₃* automated up/downstream pressure control

Infrared laser

Up to 1100°C, 10x10mm substrates

Radiation

Up to 1000°C, <1”, <2”* substrates

Resistive

Up to 900°C, <1” substrates

Movement

X, Y, Z, tilt, azimuth movement

Shutter

Allows use of RHEED while closed

Movement

X, Y, Z, scanning stage, spinning*Amount of targets

Up to 6

Targetsize

Odd shaped up to 1”, 2”*

Transfer

Individual or whole carousel

Electron gun specifications

30kV, higher voltages*

Operational process pressure

Up to 0.5 mbar

PumpingDifferentially pumped

HEATER STAGE

TARGET STAGE

HIGH PRESSURE RHEED

Vibrational limiting solutions
Optimal signal-to-noise by stabilisation solutions for magnetic effects of the heater

OPTICS
Fluence

Full range flexibility for complex materials and metal ablation

Fluence controlManual or with attenuator*

Spotsize

1.0-3.0 mm², homogeneous fluence by mask imaging

SafetyFully enclosed, UV tight, visually transparantPumping

Turbo (>70l/s)

Base pressure<10-5 mbar

LOADLOCK

Heater and target storage*

TSST CONTROL SOFTWARE
Full manual to automated control,
including growth recipes and parameter logging

Institutenweg 25
PO Box 256
7500 AG ENSCHEDEThe Netherlands

T +31 (0) 53 2030 244
F +31 (0) 53 2030 248
info@tsst.nl
www.tsst.nl

Twente Solid State Technology BV