Modular-Design Femtosecond Lasers
for Industry and Science
Tunable pulse duration,
100 fs – 20 ps
Maximum pulse energy
of up to 4 mJ
Down to < 100 fs right atthe output
Pulse-on-demand andBiBurst for pulse control
Up to 5 th harmonic or
tunable extensions
CEP stabilization or
repetition rate locking
Thermally-stabilized andsealed designPHAROS
Pulse energy vs fundamental repetition rate

PHAROS-PH2-UP
Typical pulse duration

1.0

4000

Intensity, a.u.

0.8
0.690 fs

1000

0.4
0.2-500

0Delay, fs500

1500

1000

Pulse energy, µJ0.0-1500 -1000

PHAROS-PH2-UP
Typical spectrum

1001.0Intensity, a.u.

0.80.6

PHAROS PH2-4mJ / 20 W, 4 mJ

21.9 nmPHAROS PH2-2mJ-SP / 20 W, 2 mJ

0.40.0

PHAROS PH2-20W / 20 W, 400 µJ

100.2

1010

1020

1030
1040
1050
Wavelength, nm

1060

PHAROS PH2-10W / 10 W, 200 µJ

1101001000

Repetition rate, kHz

WWW.LIGHTCON.COM

Specifications
Model

PH2-10W

PH2-20W-SP

PH2-4mJ

PH2-UPOUTPUT CHARACTERISTICS
Center wavelength 1)

1030 ± 10 nm

Pulse duration

10 W

Pulse duration tuning range

20 W< 290 fs< 190 fs

< 450 fs 3)< 100 fs

290 fs – 10 ps(20 ps on request)

190 fs – 10 ps(20 ps on request)

450 fs – 10 ps

100 fs – 10 ps

4 mJ

0.4 mJ2)

Maximum pulse energy

0.2 mJ

0.4 mJ

1 mJ

2 mJ

Repetition rate

Single-shot – 1 MHz

Pulse selection

Single-shot, pulse-on-demand, any fundamental repetition rate division

Polarization

Linear, horizontal

Beam quality, M²< 1.2
3.3 ± 0.3 mm

Beam diameter 4)< 1.3
4.0 ± 0.5 mm

4.5 ± 0.5 mm

Beam pointing stability< 1.26.6 ± 0.7 mm

4.5 ± 0.5 mm< 20 µrad/°C

Pre-pulse contrast< 1 : 1000

Post-pulse contrast< 1 : 200

Pulse-to-pulse energy stability, 24 h

< 0.5%5)Long-term power stability, 100 h 5)

< 0.5%

MAIN OPTIONS
Oscillator output 6)
Harmonic generator

1 – 7 W, 50 – 250 fs, ≈ 1035 nm, ≈ 76 MHz
515 nm, 343 nm, 257 nm, or 206 nm

7)

320 – 10000 nm

Optical parametric amplifier 8)
BiBurst option

Tunable GHz and MHz burst with burst-in-burst capability

CEP stabilization

Optional

Repetition rate lockingPHYSICAL DIMENSIONS
Laser head (L × W × H) 9)

827 × 492× 250 mm

730 × 419 × 230 mm

Chiller (L × W × H)

590 × 484 × 267 mm

24 V DC power supply (L × W × H) 9)

280 × 144 × 49 mm

730 × 419× 230 mm

ENVIRONMENTAL & UTILITY REQUIREMENTS
Operating temperature

15 – 30 °C (air conditioning recommended)

Relative humidity
Electrical requirements

Rated power

Power consumption< 80% (non-condensing)
Laser

100 V AC, 12 A – 240 V AC, 5 A, 50 – 60 Hz

Chiller

100 – 230 V AC, 50 – 60 HzLaser

1000 W

Chiller

1400 W

Laser

600 W

Chiller

1000 W

Precise wavelengths for specific models are available
on request.

5)

2)

Assuming Gaussian pulse shape.

6)

3)

Pulse duration can be reduced to < 250 fs if pulse peakintensity of > 50 GW/cm2 is tolerated by customer
setup.

1)

4)

FW 1/e2, measured at laser output, using maximum
pulse energy.

REV. 240522 | SALES@LIGHTCON.COM

Under stable environmental conditions. Expressed as
normalized root mean squared deviation (NRMSD).
Available simultaneously. Contact sales@lightcon.com
for details or customized solutions.

7)

Integrated. For external harmonic generator, refer toHIRO.

8)

Integrated. For more options and OPAs for -4mJ and-UP models, refer to www.lightcon.com

9)

Dimensions depend on laser configuration andintegrated options.

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTED OR
SCATTERED RADIATION

CLASS 4 LASER PRODUCTFemtosecond Lasers | Wavelength-Tunable Sources | Micromachining Applications

Maximum output powerBeam properties
PHAROS
Typical M² measurement dataPHAROS
Typical near-field beam profile

PHAROS
Typical far-field beam profile

Beam diameter, µm

M²X = 1.09
M²Y = 1.07800
600
400200350

400450500

550600650

Z location, mmStability measurements
PHAROS
Long-term power stability
20.18
Output power, W

20.16
20.14
20.12
20.10
20.08
20.06

NRMSD = 0.03%
0100

200300Time, h400

500

600

Output power of industrial-grade PHAROS lasers operating
24/7 and the current of the pump diodes over the years
34
Pump Current, A

Pump Current, A

444240383687654

Output power, WPHAROS output power and the stability of beam direction with powerlock enabled, across varying environmental conditions

32302826Year 2012 2013 2014 2015 2016 2017 2018 2019 2020 2021 2022 2023 2024
Output Power, W

Output Power, W

Year 2009 2010 2011 2012 2013 2014 2015 2016 2017 2018 2019 2020 2021 2022 2023 2024

87654PHAROS
Typical pulse-to-pulse energy stability

20.6

λ = 1030 nm

20.4
20.2
20.0

NRMSD = 0.08%

NRMSD = 0.10%

Beam direction, µrad

19.8
40.0
20.0
0.0

0.96

Horizontal
Vertical-20.0-40.0

0.98

1.00
Pulse energy, a.u.

1.021.04

29.0Temp., °C

Micromachining Applications | Wavelength-Tunable Sources | Femtosecond Lasers

1000

28.0
27.0
26.0
25.002468101214Time, h1618202224WWW.LIGHTCON.COM

CEP stabilizationsynchronized amplifier have a < 350 mrad standard deviation.
The CEP drift occurring inside the amplifier and the user’s setup
can be compensated with an out of loop f-2f interferometer,
which is a part of the complete PHAROS active CEP stabilization
package.

PHAROS
Short-term CEP stability operating at 200 kHz repetition rate

PHAROS
Long-term CEP stability operating at 200 kHz repetition rate
1.00

STD = 102 mrad

Carrier-envelope phase, rad

Carrier-envelope phase, rad

1.00
0.75
0.50
0.25
0.00
-0.25
Percentile range
Average
Overall STD range

-0.50
-0.75
-1.00

05

10

1520Time, s25

30

35

0.50
0.25
0.00
-0.25
Percentile range
Average
Overall STD range

-0.50
-0.75
-1.00

40

STD = 177 mrad

0.75

02

468Time, h101214

Repetition rate locking
The repetition rate locking system can assure an integratedtiming jitter of less than 200 fs for RF reference frequencies larger
than 500 MHz. Continuous phase shifting is available on request.

Phase noise data of PHAROS oscillator
locked to a 2.8 GHz RF source

Timing jitter stability over 14 hPHAROS oscillator locked to a 2.8 GHz RF source
25-140

20-150-160

15-170

10-180-190

5-200
0-210

10-¹

10⁰
10¹Frequency, kHzTiming jitter (BW 500 kHz), fs

50.0-130

Integrated timing jitter, fs

Power spectral density, dBrad²/Hz

The oscillator of PHAROS laser can be customized for repetition
rate locking applications. Coupled with the necessary feedbackelectronics, the repetition rate is synchronized to an external RF
source using the two piezo stages installed inside the cavity.

47.5
45.0
42.5
40.0
37.5
35.0

30.0

10²Percentile range
Average
Overall STD range

32.502468Time, h101214Drawings
PHAROS-PH2-730 drawing.
PH2 or PH2-SP with FEC, BiBurst, or harmonics;
also, PH2-UP without harmonics

PHAROS-PH2-827 drawing
PH2 with -HE harmonics, PH2-4mJ, or PH2-UP with harmonics
Front view

288

Side view

310

Side view

7070

230

Front view

14272

250

12090
20

1H output
without HG
1030 nm2H output

3H / 4H output

515 nm343 nm / 257 nm

Top view

34*

1H output with/without HG
1030 nm2H output

3H / 4H output

515 nm343 nm / 257 nm

1H output with HG
1030 nm390.5*

Oscillator output

Top view

Oscillator
output

85.5*

85.5*

419

492

388.5*

Front view(*with oscillator output)

730

Front view(*with oscillator output)

www.phototechnica.co.jp
REV. 240522 | SALES@LIGHTCON.COM

34*〒336-0017 埼玉県さいたま市南区南浦和 1-2-17

TEL:048-871-0067 FAX:048-871-0068

e-mail:voc@phototechnica.co.jp

827

Femtosecond Lasers | Wavelength-Tunable Sources | Micromachining Applications

PHAROS lasers can be equipped with feedback electronics
for carrier-envelope phase (CEP) stabilization of the output
pulses. The carrier-envelope offset (CEO) of the PHAROS
oscillator is actively locked to 1/4th of the repetition rate with a< 100 mrad standard deviation. The CEP stable pulses from theAutomated Harmonic
Generators
515 nm, 343 nm, 257 nm,
or 206 nm output

Automated harmonic selection

Industrial-grade design

PHAROS with harmonic generatorSpecifications
Model

2H (-HE)

2H-3H (-HE)

2H-4H (-HE)

4H-5H

Output wavelength 1)(automated selection)

1030 nm
515 nm1030 nm
515 nm343 nm1030 nm
515 nm257 nm1030 nm
257 nm
206 nmPump pulse energy

20 – 4000 μJ

50 – 4000 μJ

20 – 4000 μJ

200 – 1000 μJ> 10% (4H) 2)> 5% (5H) 3)

Pump pulse duration

100 – 500 fs> 50% (2H)

> 50% (2H)
> 25% (3H)

> 50% (2H)
> 10% (4H) 2)≤ 400 μJ pump

< 1.15 (2H)

< 1.15 (2H)
< 1.2 (3H)

< 1.15 (2H)n/a (4H)

> 400 μJ pump

< 1.2 (2H)

< 1.2 (2H)
< 1.3 (3H)

< 1.2 (2H)
n/a (4H)

Conversion efficiency

Beam quality (M²)
typical values

1)

Depends on pump laser model.

2)

Maximum output power of 2 W at 20 – 1000 μJ pumpor 1 W at 1000 – 4000 μJ pump.

3)

Maximum output power of 150 mW.

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTED OR
SCATTERED RADIATION

CLASS 4 LASER PRODUCTPHAROS with HG pulse energy vs repetition rate

3H output power stability

4000
Output power, W

2.7

2000
1000

Pulse energy, µJ

600400200NRMSD
NRNNRM
NRMS
RM
RMS
R
MSD = 0.27%
MS
0.270.2.27
27
27%

2.6
2.5
2.4
2.3
2.2
2.1
2.0

100

050

100

150

200

250

300Time, h60
40

4H output power stability
1.56

20Output power, W

PHAROS-4 mJ

10SH (4 mJ pump)

6
4

TH (4 mJ pump)
SH (200 µJ pump)2
1n/a

TH (200 µJ pump)
12357

10REV. 240522 | SALES@LIGHTCON.COM

203050 70
Repetition rate, kHz100

200300500 700 1000

NRMSD = 0.23%

1.54
1.52
1.50
1.48
1.46
1.44

024681012Time, hフォトテクニカ株式会社〒336-0017 埼玉県さいたま市南区南浦和 1-2-17

TEL:048-871-0067 FAX:048-871-0068
e-mail:voc@phototechnica.co.jp
http://www.phototechnica.co.jp