Compact, Few-Cycle, CEP-Stable
OPCPA Systems
Few cycle pulses in a compact
footprint
800 nm, 1600 nm, 2000 nm,
or 3000 nm output

High repetition rate, up to MHz

High contrast seed source for
CPA and OPCPA systems
Exceptional power, pulse
energy and CEP stability

SH / TH options

Specifications
Center wavelength

800 nm

1600 nm2000 nmPump source 1)

PHAROS / CARBIDE

Pump power 1)

20 – 480 W

Pump pulse energy 1)

0.2 – 8 mJ

Repetition rate

3000 nm

1 kHz – 1 MHz> 7%> 10%> 9%> 6%

Pulse duration 2)< 10 fs< 40 fs< 25 fs< 45 fs

Transform-limited pulse duration 2) 3)< 6 fs< 30 fs< 15 fs< 35 fs

Conversion efficiency

2)< 250 mrad

CEP stability, 1h 2) 4)
Long-term power stability, 8 h 2) 5)< 1.5%

Pulse-to-pulse energy stability, 1 min 2) 5)< 1.5%

1)

2)

For using other pump sources, such as thin-disk orinnoslab lasers, contact sales@lightcon.com.

3)

Uncompressed, for seeding larger amplifiers.

4)

CEP values calculated from unaveraged, single-shotmeasurements.

5)

Expressed as normalized root mean squared deviation(NRMSD).

Typical values. For custom inquiries, contact
sales@lightcon.com.

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTED OR
SCATTERED RADIATION

CLASS 4 LASER PRODUCTORPHEUS-OPCPA example spectra of four models
1.0

Intensity, a.u.

0.8
0.6
0.4
0.2
0700

900

1100

1300

1500

1700

1900

2100

2300

2500

2700

2900

3100

3300

3500

Wavelength, nm

WWW.LIGHTCON.COM

ORPHEUS-OPCPA temporal profile output pulses at 2 µm

10⁰

Intensity, a.u.

10 ̄ ⁴10 ̄ ⁶10 ̄ ⁸

Intensity, a.u.

1.00

0.75

0.50

40.75

20.50

00.25-20.00
1700

1800

1900

2000 2100

2200-42300 2400

Wavelength, nm

0.25

10 ̄ ¹⁰10 ̄ ¹²-100-75-50-25

0Delay, ps

25

50

75

Retrieved pulse
τ = 24.6 fs

0.00

100

TL pulse
τ = 22.7 fs-100-50

0Time, fs

50

100

ORPHEUS-OPCPA CEP stability* (3 μm, 1 kHz)
Wavelength, nm

630
620
610

560
555
550

ππ

2
10-1-2-π210-1-2-π

CEP, rad

CEP, radORPHEUS-OPCPA CEP stability* (800 nm, 100 kHz)
Wavelength, nm

Stability

STD = 127 mrad
020406080100150140160180

STD = 43 mrad
0246Time, min

101.10

1.10

1.05

1.05

1.00

1.00

NRMSD = 0.42%

NRMSD = 0.55%
0102030Time, min

4050

600246810

ORPHEUS-OPCPA long-term output stability at 2 µm

1.0

8.6

0.5

8.5
Power, W

Phase, rad0.90

Time, hORPHEUS-OPCPA CEP stability* (2 µm, 100 kHz) withoutslow-loop CEP stabilization

0.0-0.5

8.4
8.3
NRMSD = 0.184 %STD = 99 mrad
-1.0

140.951.95
0.90

12ORPHEUS-OPCPA long-term output stability at 800 nm

Power, a.u.

Pulse energy, a.u.

ORPHEUS-OPCPA pulse-to-pulse energy stability at 800 nm

8Time, min01234Time, h56788.2

02030Time, h* All CEP values calculated from unaveraged, single-shot measurements.

www.phototechnica.co.jp

REV. 240522 | SALES@LIGHTCON.COM

10〒336-0017 埼玉県さいたま市南区南浦和 1-2-17

TEL:048-871-0067 FAX:048-871-0068

e-mail:voc@phototechnica.co.jp

4050

Femtosecond Lasers | Wavelength-Tunable Sources | OPCPA Systems | Spectroscopy Systems | Microscopy Sources | Applications

Intensity, a.u.

10 ̄ ²

1.00

Phase, rad

ORPHEUS-OPCPA high-dynamic-range third order
autocorrelation measurement system at 800 nm

High-Energy OPCPA Systems
Multi-TW peak-power pulses at up to 1 kHz

800 nm, 1600 nm, or 2000 nm output

Few-cycle pulse duration andhigh pre-pulse contrast

Robust design with < 1 hourwarm-up time

Exceptional CEP and pulse energy stability

Spectral-temporal pulse shaping options

WWW.LIGHTCON.COM

Specifications
Center wavelength

800 nmPump source

1600 nm

Repetition rate

10 Hz – 1 kHz

Maximum output pulse energy1)

250 mJ

100 mJ

50 mJ< 9 fs< 50 fs< 30 fs< 250 mrad

CEP stability, 1h 1) 2)< 1.5%

Long-term power stability, 8 h 1) 3)
Pulse-to-pulse energy stability, 1 min< 1.5%1) 3)

Typical values. For custom inquiries, contact

3)

sales@lightcon.com.
2)

Expressed as as normalized root meansquared deviation (NRMSD).

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTED ORSCATTERED RADIATION

CEP values calculated from unaveraged, single-shotmeasurements.

CLASS 4 LASER PRODUCTPerformance at 800 nm
OPCPA-HE output spectrum

OPCPA-HE system high-dynamic-range thirdorder autocorrelation measurement

1.00

10⁰

OPCPA-HE
fs frontend (not to scale)

0.75

10-4

Intensity, a.u.

Intensity, a.u.

10-2

10-6
10-8

0.25

Autocorrelator noise level

10-10
10-12-100-80-60-40-20020Delay, ps

40

60

80

0.00

100

53

151
535

010.5

545

0300

CE ,rad555
10250

σ( CE ) = 212 mrad
04800
900
Wavelength, nm

1000

1.00

σ(E²s), %28Time, h1216200Measured
Transform-limited

0.75

Intensity, a.u.

55-1700

OPCPA-HE output pulses' temporal profile measured
with a self-referenced spectral interferometry deviceσ( ¹⁰ min), mrad Intensity, a.u.

λ, nm

E, mJ

OPCPA-HE pulse energy, f-2f interferogramand CEP stability measured over 16 h-20.50

7.9 fs

0.50

0.25

0.00

-40

-200Time, fs

2040

Performance at 2000 nm

0.50

0.25
0.00

1.00

40.75

20.50

00.25

-20.00

10.4
10.2

1800

2000
2200
Wavelength, nm

Retrieved pulse

TL pulse

τ = 28.1 fsτ = 27.7 fs

2400

10.0Energy, mJ

0.75

OPCPA-HE pulse-to-pulse energy stability at 2 µmPhase, radIntensity, a.u.

1.00

Intensity, a.u.

OPCPA-HE output pulses' temporal profile at 2 µm

-4

9.8
9.6
9.4
NRMSD = 0.99 %Eavg = 9.6 mJ

9.2-100-500Time, fs

50

100

9.00134Time, hwww.phototechnica.co.jp
REV. 240522 | SALES@LIGHTCON.COM2〒336-0017 埼玉県さいたま市南区南浦和 1-2-17

TEL:048-871-0067 FAX:048-871-0068

e-mail:voc@phototechnica.co.jp

567Femtosecond Lasers | Wavelength-Tunable Sources | OPCPA Systems | Spectroscopy Systems | Microscopy Sources | Applications

Pulse duration 1)

1)2000 nm

Picosecond Nd:YAG lasers, seeded by ORPHEUS-OPCPA