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Fig. 3Fig. 4

Processing steps for manufacturing FZPs.

Fig. 5

SEM micrographs of a Ta FZP with a thickness of 2500 nm.
The outermost zone width is 250 nm.

Schematic drawing of the FZP structure and SEM micrographs of a Ta FZP showing (a) the inner zones and (b)the outermost zone with minimum linewidth of 25 nm.

166  úËõ May 2010 Vol.23 No.3

X üWõZpÁW ¡ X üimWõfqì»ZpÌ»óÆ«W]

Fig. 6Ta FZP consisting of two steps. The outermost period is 500
nm.

mm à`¬Â\ÅéB±Ì FZP ÌÅOÖÑüÌæð

Fig. 5 É¦·B
È¨CêÊIÈ FZP ÍzûÌÅ X üªÕÁ³êé±ÆFig. 7

Outline of the multilayer FZP fabrication process.

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kinoform ^ FZPié¢Íu [Y^ FZPj ÆÄÎêé8) BzIÈ kinoform `óÅÍCzûÉæé¹¸ðl¦È¯êÎ_ã100÷Ìø¦ª¾çêé18)Bµ©µC±
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Schematic drawing of a one­dimensional MLL structure.

é19_21) BFig. 6 É NTT_ATN Åì»µ½ 2 i\¢i X ü§ßwðÜßéÆ 3 i\¢jÌ FZP ð¦·B±Ì FZP ÌüÍ400 nm Å³Í 4 mm ÅéBÌû@ÍÞçÉæÁÄ Sputtered­Sliced FZP (SSFZP) Æ¼t¯çê½B±Ìû@Ì_ÍCÅÍêwÌúÝð
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168  úËõ May 2010 Vol.23 No.3ª

Fig. 11 Éì»µ½ 1 ³XÎ^ MLL ÌfÊ SEM Ê^Ìáð¦·B±ÌEGYÌÝvlÍÅ¬ü10nmCÅåü100 nmCS248CSú4.6 mm ÆµÄX üWõZpÁW ¡ X üimWõfqì»ZpÌ»óÆ«W]

Fig. 11

Cross­sectional SEM images of a MoSi2/Si multilayer.

Fig. 13

Cross­sectional SEM images of a MoSi2/Si multilayer on awire core.

Fig. 12 Results of beam size measurement of a one­dimensional
MLL at 20 keV.

Fig. 14Focused beam prole of rst­order diraction measured bya knife edge scan.

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Techniques for fabricating Fresnel zone plates forx­ray focusing: Current status and future challenges
Hisataka TAKENAKA

NTT_AT Nanofabrication Corporation
3_1 Morinosato Wakamiya, Atsugi­shi, Kanagawa 243_
0124, Japan

Abstract The development of Fresnel zone plates (FZPs) with resolution below 10 nm is strongly required
for x­ray microscopy and other micro/nano­analytical methods. This paper overviews current FZP fabrication
techniques based on electron beam (EB) lithography and introduces new approaches for the fabrication of amultilayer FZP and multilayer Laue lens, which can overcome the limitations due to EB lithography of denseand high aspect ratio line patterns in FZP fabrication.

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