EB滅菌ビジネスの世界動向と光子発生技術研究所
山田廣成㈱光子発生技術研究所㈱みらくるセンター立命館大学特任教授

IAEAワークショップ”New Generation of EB Accelerators
for Emerging Radiation Processing Applications”出席報告Tuesday, 8 September 2015
Session II
Participants’ Presentations **IAEA Technical Meeting

09.30 – 10.30

Mr. André WEIDAUER - Germany
Electron treatment of seed: an environmental friendly Treatment methodwith future potential

10:30 – 11:30

Mr. Hironari YAMADA – Japan
Title to be received

11.45 – 12.45

Mr. Bumsoo HAN – Korea, Republic ofRequirements of Electron Accelerator for Environmental Application

14:00-15:00

Mr. Andrez CHEMILIEWSKI – Poland
Accelerators for the future research, industry and environmentalon

New Generation of EB Accelerators for Emerging Radiation Processing
Applications
7-11 September 2015.”
IAEA Headquarters Vienna, AUSTRIA(M0E03 – Meeting Room - Building M)
PROVISIONAL AGENDA
Monday, 7 September 2015

applications
15.00 – 16.00

radiation processing
16.30 – 17.30

Mr. Aleksandr Bryzgin – Russia
ILU accelerators for EB and X-ray

Wednesday, 9 September 2015
Session III

Participants’ Discussion : ALL PARTICIPANTS

9:30-10:30

Mr Urs V.LAUPPI – Switzerland
Permanent sealed, compact ebeam engine

10:30-11:30

Mr Peter MCINTOSH – United Kingdom
Title to be received

Division of Physical and11:45 – 12:45

 Mr. Mr Joao Alberto OSSO JUNIOR (Head, Radioisotope

Mr Robert Kepher – United States of America
Title to be received

14.00 – 15.00

Products and Radiation Technology Section ) Mr Sunil Sabharwal(Scientific Secretary)
Scope and Objectives of the Technical Meeting

Mr. Peng WEI - China
The development and outlook of the EB irradiation facilities and their

15.30 – 17.30

Session I:

Introductory Session

9.30 - 10.00

Opening of the meeting by: Mr Aldo Malavasi, (Deputy Director General, NuclearApplications) Ms. M. Venkatesh (Director ofChemical Sciences)

Election of the Chairperson and reporter
Adoption of the agenda

applications in China

Participants’ Presentations **10.30 – 11.30

Mr. Philippe DETHIER – Belgium
New 2nd generation Rhodotron

11.30 – 12.30

Mr. Wilson CALVO - Brazil
11.30 – 13.00
Mobile Unit with an Electron Beam Accelerator to Treat Industrial

09.30- 11.00

Effluents for Reuse Purposes in Brazil
Mr. David BROWN - Canada
Title to be received

Discussion "Emerging scenario of electron beam applications”

Thursday, 10 September 2015
Session IV
Discussion and Initiating Preparation of Technical Document;- ALL
PARTICIPANTS

Session II:

14.00 – 15.00

Mr. Z.Zimek – Poland
Reliability and availability of high power electron accelerators for

14.00 – 15.30

Discussion "New generation accelerators – meeting techno-commercial
needs of emerging applications”
Discussion “Strategies for enhancing deployment ofEB technologies:

enhancing mutual cooperation among stakeholders and the potential
IAEA role”
Preparation of a technical report : scope/contents/structure of the meeting
report/conclusions/recommendations

ExistingDrugcross MedicalFoodMedical
Security develop cancer
link
Sterilziation irradition isotopes printing packaging Tires and NDT ment treatment

Accelerator type
low power microtron
DC accelerator
table top synchrotron
single cavity low frequency linac
existing high frequency linac
conv cyclotrons
single cavity multi-pass (Rhodotron)
linac driven FEL
Proton linac
high power microtron
compact rhodotron
high energy rhodotron (40 MeV)
evolvinghigh power/efficent copper linac
circular light sources
multi-cavity low frequency linac
Compact SC cyclotrons (5T)
emerging Compact SRF Linacs
high power SRF linac (MW)SRF Energy Recovery Linac
pulsed Low energy/high current
New laser plasma wakefieldtechnology beam driven plasma wakefield
but utility FFAG
unknown Dielectric wall
Integrable Optics CircularYes
Yes

Yes

Yes

Yes

Yes

Yes
Yes

Yes
Yes

Yes
Yes

Yes
Yes

Yes

Yes

Yes

Yes

Yes
Yes

Yes

Yes
Yes
Yes
Yes

Yes

Yes
Yes
Yes

Yes
Yes

Yes
Yes

Yes
Yes
Yes
Yes

Yes
Yes

Yes
Yes
Yes
Yes

Yes
Yes

Yes
Yes
Yes
Yes

Yes
Yes

Yes
Yes
Yes

Yes

Yes

Yes

Yes
Yes
Yes
Yes

Yes
Yes
YesYesYes

CONCLUSIONS
1) There is１）EBの利用はは産業利用及び環境保全で増加している。
a large and growing number of EB applications in industrial
processing２）国やIAEAによりEB技術をラボからインダストリーへ移転
and environmental preservation.
2) There isする強力なプログラムが必用である。
a need for strong programs supported by the governments ofmember states to move technology from the laboratory to industry.
3) There is３）ユーザーとサプライヤーの繋がりを強化する必要があり、
a need to strengthen the connections between end users andsuppliers. IAEAは重要な役割を果たすことができる。
The IAEA can play a pivotal role.
4) There is４）低エネルギーEBはインク定着、コーティング、接着剤とし
a growing use of low energy electron beam (EB) accelerators forthe curing ofinks, coatings and adhesives.て需要が増加している。
5) Many existing
applications require accelerators of 10’s of kW but with lower５）１０KW以上のEBを必要とする多くのアプリケーションがcosts, higher efficiency, and simpler operation. Evolution of existing industrial
有るが、低コストで、高い加速効率を有し、簡単なオペレーシ
accelerators
can improve performance, reliability, efficiency, and lower costs toョンが望まれる。既存のEB装置は、パフォーマンスや、信頼
some extent.
性を向上させる必要がある。
6) There aremany emerging and exciting applications which require higherbeam powerand efficiency to make them commercially viable. Some require６）５MeV以上で、MWクラスのEBを必要とする多くのアプリ
very high power(MW class) and high energy (5-10MeV) with high wall plug
ケーションがある。
efficiencies.
７）タイヤのクロスリンキングや種子表面の殺菌、農地の滅
7) Encourage
wider geographical deployment of established applications, such
菌、排水の滅菌において、開発途上国で大きな需要がある。
as, tire crosslinking,surface seed treatment for agriculture, municipal
wastewater and other applications.

8) There is a growing need for mobile EB facilities for different applications:industrial wastewater
treatment, seed disinfestations, environmental
８）移動式のEB装置に需要が有る。汚染水の処
remediation, etc.
理や環境の保全には移動式が必用である。
9) Small EB facilities including mobile accelerators are needed to develop
applications.９）移動式のEBや小型EBはさらに需要を探すことができる。 spending on big science accelerators drives the10) Large government
majority ofマイクロトロンは高エネルギー、小型でハイパワ
advanced
accelerator R&D worldwide. Industrial accelerator１０）多くの国で、ビッグサイエンスで加速器に巨大
builders areoften not well connected to these efforts. The United States ofーであり、これら要請に応えることができる。
な予算が付けられている。そして、多くの場合、産America, Europe and China are now encouraging such connections.
1台で３０ｋW出すことができる。
業とラボのコネクションは強いとは言えない。
Programs are required.
10台を並列に並べれば300ｋWを発生できる。
１１）超電導リナックの様な革新的な加速器技術は11) Revolutionaryaccelerator systems based on new technologies like
全長は4.5m。
superconducting
Radio Frequency (SRF) and improved RF systems
加速器の小型化や低コスト化に貢献すると思われdeveloped30台ならば、９００ｋW、長さ14m、幅60cm。
forbig science accelerators may provide a path to very highる。
power, high １２）IAEAは産業用加速器プロバイダー、放射線
efficiency accelerators with significantly smaller capital &operating cost, and of substantially reduced size.
化学ラボと繋がりがあるが、もっと強化するのが12) The IAEA
is connecting industrial accelerator groups, research facilities
良い。
and radiation
chemistry labs, and there is a need for more connections.

http://www-pub.iaea.org/iaeameetings/50814/ICARST-2017

The scope of the conference is meant to cover, but is not limited to, the following
topical areas:• Recent advances in radiation chemical sciences• Current radiation technology trends• Setting up of new radiation facilities• Production and transportation of cobalt-60• New generation electron beam accelerators and X-ray sources• Radiation sterilization• Radiation modification of polymeric materials• Radiation chemistry in the synthesis and design of nanomaterials• Development of advanced materials using radiation technology• Surface curing using radiation technologies• Radiation treatment of gaseous pollutants, industrial wastewaters, municipal wastewater,sludge and emerging organic pollutants• Use of radiation technology for cultural heritage imaging and preservation• Radiation chemical aspects related to water coolant systems in nuclear reactors, fuelreprocessing and nuclear waste management• Operational experience from radiation facility operations• Radiation dosimetry• Implementing quality management practices for the control of radiation processes• New generation safety and control features in radiation facilities• Applications of tracers and radiotracers for studying industrial and environmental processes• Thin layer activation method for wear measurement• Nucleonic control and measurement systems• Radiation detection techniques and equipment• Computational fluid dynamics and numerical modelling of residence time distribution• Radiation based imaging technologies• Economic aspects of radiation technologies vis-à-vis conventional technologies• Educational tools and methods for human resource development in this field実用の時代を迎えた
卓上型放射光装置

www//htpp/photon-production.co.jp

The latest machine MIRRORCLE-CV4
HP model produced last year for
HITACHI Ltd.

MIC1-CT system installed in a factory

蛍光Ｘ線は原子が放出するので360°方向に出る
大電流ではターゲットが溶けるため、X線フラックスには限界がある。
磁場で電子を曲げて制動放射を発生

10 m

MIRRORCLEのX
線発生機構

ターゲットのクーロン力で電子を曲げて制動放射を発生
ターゲットが微小であるため発熱が起こらない。
大電流が可能25 m

１．数keVから数10MeVまでの連続X線を発生分光して様々な高度分析を実現 XAFS,小角散乱、残留応力測定
Synchrotron
透過力の高いX線で非破壊検査が可能

２．世界最小光源点を実現
ミクロンサイズの解像度でCTが可能

３．大きな発散角
大型構造物の非破壊検査が可能
高精度医療診断を実現

InjectorＸ線

X-ray CT systemsampleX-ray port

Flat panel detector

Li電池のCT

500Hz, 200mA
Target : W39s
S-O：550 mm
S-D：2600 mm
FP １sec./frame
360°/ 600 frame

内部の電極の様子がかなりきれいに撮影できた。

内部電極が網目状になっていることも確認。

One-cylinder engine CT image

MIRRORCLE-６Xの解像度測定

11倍拡大

検出器：150μm/pixel イメージングプレート

Pb1mm
Point

Pt100μm
Point

Cu25μm
Point

W10μm
Point

W10μm
Line

W2.5μmLine2531405063 [μm]

Shape dependence of edge effectx110.5mmthick plateA

X-rayx1110mmφRodAB

X-ray

B10mm

10mm

凸shapePlane sample

X-raytarget：W10μmφWireAir bubble in water
A5mmφpipe
B

X-raytarget：W10μmφWire

x11A
B

10mm

凹shapetarget：Cu25μmφRod

凹凸shape sample
target：W10μmφWire非破壊検査事例

高いコントラストを活かして、微妙な違いも判
別可能

金属内部の接着剤が見える

窒化チタンが見え見え
る
密度差を識
別

コンプトン散乱は、電子密度に依存しZには依らない
ので、密度測定に適している第3次産業革命が始まっている材料深部の残留応力測定実施例

X線残留応力測定原理
X線回折法を用いて、材料の回折ピークを観測し、材料の向きを変化させたときのピークのシフト量から残留応力を求める。
ψ多結晶では微結晶がランダムにあらゆる方向を向いている
応力が加わると…

2θ

面間隔が変化2θ’

同じ面の回折光を測定しても2θの値が変化する
変化の割合から残留応力が求まる

エネルギー分散

波長分散

測定は反射でも透過でも可II2θ

エネルギー

波長λのX線を角度ごとにカウント

ある角度でのX線のエネルギーおよび強度を測定

ストレインゲージで応力を図りつつX線回折方を適用して、
140
ψ

1200°
0.2°
0.4°
0.6°
0.8°
1.0°

Intensity (a.u.)

100
80
60
40200252θ / degree

0.2115272931
Energy / keV

33

MIRRORCLEを用いた結果：
43.2 MPa

0.211
0.21050.21

歪みゲージの測定結果： 41.6
MPa0.20950.209
00.0001

0.0002sin2ψ

0.00030.000435

深部の残留応力評価
測定している箇所
2θ：2.4°
ビーム幅：500umの場合、

tt≒20umw≒500umw

ψ1.00°
0.5°
1°

0.9

Intensity (a.u.)

0.80.70.60.50.40.3

遮蔽コンクリート

0.2

CV-10.1

ガラスキャピラリ

0.051

Ge検出器

ガラスキャピラリ

サンプル遮蔽コンクリート

5253545556575859606162636465

Energy / keV

テストピースによるFe(110)回折ピーク

歯車の残留応力測定
ガラスキャピラリ

測定箇所①
測定箇所②5mm

3mm

17mm

サンプルホルダー

検出器

MIRRORCLE-6XHP

マイクロトロンの特長
Photon Production Laboratory Co. Ltd.

MICROTRON ishigh quality and compact accelerator
1MeV type

4MeV type

６５ｃｍ

6-10MeV type
２０ｃｍ

３０ｃｍ

We are experienced with 1
to 20 MeV MICROTRON as
an injector of synchrotron

１３０ｃｍ

20MeV typePrinciple of MICROTRON
Extraction channelElectron emitter
set the cavity wall

Electrontrajectories
Acceleration cavity

Electrons are accelerated through the cavity circulating under
the uniform magnetic field and extracted to the outside when
they reach the designed energy.

Comparison of microtron and linac
4MeV MICROTRON

4MeV LINAC

Beam output
Electrontrajectory

Extraction
channelPre-Buncher

RFElectrontrajectory

Beam output

Magnetyoke
Emitter

Energy spectrum

Energy spread is small.
Non lower energy
Emitter(25kV)

Energy spreadis large.
Lower energy
is included.
Acceleration tube(11cells)

Intensity [arb.]

Intensity [arb.]

Energy spectrum

RF cavity
RFEnergy [MeV]

Energy [MeV]

1) Electrons are emitted by RF gun.

1) Electrons are emitted by 25kV high voltage.

2) Electrons circulate under the uniform magnetic field andare accelerated passing through the cavity.

2) Electrons are pre-bunched by the buncher for matching
the acceleration phase in the cavity.

3) Electrons are extracted by the magnetic shield channel
after reaching the designed energy.

3) Electrons are accelerated passing through linear
acceleration cells.

*Electron energy is defined by the geometry between
acceleration point, extraction channel and magnetic field.

4) Electrons are extracted through the exit hole.

*Lower energy electrons are not extracted.
*Energy spread is less than 1%.

*Electron energy is defined by the RF power.
*Lower energy electrons are also accelerated.
*Energy spread is more than 4%.

Features of MICROTRON in comparison
with LINAC⑤⑥⑦⑧

Beam current is higher than that of LINAC.
Energy spread is smaller.
Compact and not heavy.
Power consumption is higher
because acceleration efficiency is higher.
Single cell is easier to fabricate.
High voltage floating terminal is unnecessary thus
the handling is safer.
Maintenance is easier. We only change filament
once a year.
Shielding material is reduced.
Intensity①②③④

Energy [MeV]

Energy [MeV]MICROTRON

LINAC

滅菌・殺菌事業の展開
Photon Production Laboratory Co. Ltd.

30KW average by one machine is possible
since peak current is high!
Model

2MeV high power type

10MeV high power type

Energy range [MV]28.0 - 10.0

Pulse beam current [mA]

500300

Pulse width [us]

5.0

5.0

Repitition rate [pps]

5,00

2,000

Average current [mA]2510

Beam output power [kW]530

Klystron specification(model, frequency,average output power)

2,856MHz

2,856MHz(50kW-ave)(60kW-ave)

Weight (main body) [kg]

600

800

W40 x D15 cm

W40 x D60 cm

Cooling water flow [L/min]

350

400

Price (MUSD)～3～4

Body size

100, 200 KW irradiation is possible intandem
Bendingmagnet setup since it is compact

Scanning horn

Enables machine
maintenance without
stopping irradiation by othermachines

Irradiation room

Irradiation test results by ＭＩＣ１
E-beam is extracted through 50 m thick Be
window

E-beam DOSE is monitored by the absorption rate in
FWT-60-1P film (Batch 1106, 44.5um).

Operationparameters

S-O distance

200mA, 30Hz, 200ns, 10s exposure

FWT-60-1P, 1106
film is patched on aacrylic plate.

11mm

Be windowCT

Quadrupole magnet

MIC1

Cooling the Be window

11mm

IR camera is used to monitor
the temperature of window.

Proof of e-beam dose of 1MeV machine at 200mA, 200ns, 30Hz,
10sec (12W) irradiation
FWT-60-1P, 1106 film
Before irradiation

Before605nm: 0.133
600nm: 0.133

After605nm: 1.648
600nm: 1.616

k605 = (1.648 - 0.133)/0.0445= 34.045
k600 = (1.616 – 0.133)/0.0445= 33.326
Q605 = 25.27 kGy
Q600 = 25.41 kGy

At 605nm: 0.136
At 600nm: 0.135

Operation parameters
After irradiation

At 605nm: 1.305
At 600nm: 1.268

Color is changed

金属技研殿と提携しました