協奏的量子ビーム研究の最前線 ―蓄電池・ソフトマター―

In-situ/operando X-ray absorption spectroscopy
for energy science at beamline 7.3.1 of the ALS
Feipeng Yang#1, Yi-Sheng Liu#1, Xuefei Feng#1, Per-Anders Glans1, James Nasiatka1,
Dmitriy Voronov1, Jun Feng2, Yi-De Chuang1, Howard Padmore1, Jinghua Guo1
1Advanced Light source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
2Department of Materials Science and Engineering, Institute for Quantum Science and Engineering, South Universityof Science and Technology, Shenzhen 518055, Guangdong, P.R. China#: equal contribution
The new endstation at the bending magnet beamline 7.3.1 of the Advanced Light Source (ALS), Lawrence Berkeley National Laboratory (LBNL), has been commissioned and is open for general user operation. The beamline
is repurposed from the previous photoemission electron microscopy (PEEM) to X-ray absorption spectroscopy■
要旨(XAS) with in-situ/operando capabilities. The simplest optical scheme that combines a spherical grating
monochromator and a downstream horizontal focusing mirror maximizes the incident photon ‰ux at this beamline. The endstation integrated with in-situ/operando capabilities will fulˆll the increasing demand for XAS technique, beneˆting not only the discovery of new materials but also the synergy across diŠerent ˆelds of discipline. The details of the beamline and endstation designs and their performance are presented in this article.

but important technique is in high demand in synchrotron

1. Introduction
Synchrotron-based

facilities worldwide.
X-ray

absorption

spectroscopy(XAS), which measures the X-ray absorption coe‹cient as

At the Advanced Light Source (ALS), the beamtime

a function of incident photon energy, is a probe sensitive toproposals for soft X-ray XAS at beamline 8.0.1 are compet-

the oxidation state, bond length, and coordination chemis-

ing with others that request novel spectroscopy such as thetry for various materials, including solid, liquid, and gas.1,2)

resonant inelastic X-ray scattering (RIXS)20,21) at the same

Since the early 1990s, XAS has been a well-developed, ex-beamline. As a result, this beamline is heavily oversub-

tremely powerful tool for routine studies of the electronic

scribed and only a small fraction of the huge demand forstructure of target samples with elemental and chemical

time-consuming in-situ/operando XAS measurements cansensitivity.35)

The demand for accessing synchrotron-

be met. To mitigate this beamtime bottleneck, developing

based XAS spectroscopy has been growing steadily as aa new endstation dedicated for soft XAS at a diŠerent

result of advanced material synthesis methods and prompt

beamline is inevitable. In addition, this endstation can alsomaterial discovery, especially in energy science and cataly-

facilitate the material discovery with the aid of machine

sis research. For example, XAS has been deployed in thelearning22) in the future.

studies of graphene oxide wrapped magnesium complex
for hydrogen storage, Cu nanoparticle catalysts for CO2

The new endstation is located at beamline 7.3.1, which is

reduction, SnOx/Pt-Cu-Ni heterojunction catalyst for ORR,

repurposed from the previous photoemission electron

and lithium 3d transition metal oxide battery materials.611)

microscopy (PEEM) beamline. Since its operation, it has

Additionally, the tremendous eŠorts in improving thesigniˆcantly alleviated the oversubscription of beamline

doping12),

nano-

8.0.1 for XAS studies. This endstation is actively used inscaling1315), encapsulation16), and hybridization in thethe characterization of critical samples from the Hydrogenmaterial stability and performance by(MOF)1719),

to name a few,

Materials Advanced Research Consortium (HyMARC) for

often require XAS as a characterization tool to evaluate thehydrogen storage, Joint Center for Energy Storage

chemical property at the microscopic level and guide the

Research (JCESR) for battery research, and Liquid Sun-next-stage sample modiˆcations. Consequently, this simple

light Alliance (LiSA) for liquid sunlight, artiˆcial pho-metal-organic framework

306 ● 放射光 Nov. 2021 Vol.34 No.6
(C) 2021 The Japanese Society for Synchrotron Radiation Research特集 ■ 協奏的量子ビーム研究の最前線

tosynthesis. Its in-situ/operando capability enables the
probing of transient species, such as those at the battery
working electrode/electrolyte interfaces.1,2326)―蓄電池・ソフトマター―

2. Design
2.1

Beamline

The idea with beamline 7.3.1 was to make a system withThe designed photon energy range for this endstation isa minimum number of re‰ections, giving the smallest

from 250 eV (carbon K-edge) to 1650 eV (aluminum K-

horizontal focus. In the original design, the focal plane wasedge), covering the K-edge of light elements and L-edge ofat the sample surface for a PEEM, and the ˆeld of view (30

3d transition metals. It allows a detailed and high-statisticmm) of the PEEM eŠectively acted as a vertical exit slit.

detection of the 1s-2p and 2p-3d transitions, ideal for theAn elliptical mirror focused in the horizontal direction at

study of electrochemical operando battery materials whichhigh demagniˆcation, matching the horizontal to the verti-

usually involve the 3d transition metals. The high energy

cal ˆeld sizes. The very small vertical source size allows

end that reaches the magnesium (1320 eV) and Al (1570

the use of a very low line density (200 l/mm) and thiseV) K-edge is very useful because these elements play alimits the defocus aberration that is normally present in thecritical role in multivalent batteries and catalysis, respec-

spherical grating monochromator (SGM) design. In thistively, and there are only a handful of beamlines worldwide

way, longitudinally moveable exit slits do not have to bethat can cover this energy range across the synchrotron

used, to move to the zero-defocus position. The detailed

light sources worldwide in spite of the fact that magnesium

schematic layout of beamline 7.3.1 is shown in Fig. 1. The

and aluminum are becoming critical in multivalent

optical design uses an SGM followed by a downstream

batteries27,28) and catalysis29, respectively. The endstation

elliptical horizontal focus mirror (M1) and a ˆxed piezo-

has two chambers that are in series. The ˆrst chamber isdriven exit slit system near the endstation. This optical de-dedicated for the ultra-high vacuum (UHV) solid-statesign minimizes the number of optical elements to maximize

XAS measurement and the second chamber is for the in-the photon ‰ux on the sample. The CAD drawing of the in-situ measurements. There is a safety interlock between

ternal components of the monochromator is shown in Fig. 2.

these two chambers in case of vacuum failure during the in-

The grating substrate is held in a cradle by two cross-bars

situ/operando measurements.

under light compression using wave springs. This keeps
the grating secure, without applying enough clamping
force to distort the optical surface. Thermal stability isachieved by water cooling using a pair of trapezoidal
shaped bars with a thin layer of liquid eutectic Indium/Gal-

Fig. 1(Color online) Beamline 7.3.1 overview.

放射光 Nov. 2021 Vol.34 No.6 ● 307

Fig. 2

(Color online) Beamline
design.

monochromator

supportandlium (eGaIn) to provide thermal contact with the substrate. This allows for e‹cient thermal transfer without applying any stress on the substrate from both clamping
forces and thermal expansion of the grating. The
trapezoidal shape allows for optimizing the cooling along
the length of the grating to minimize any thermal deformation and slope errors.
The mounting cradle is attached to a central shaft that

Fig. 3(Color online) (a) Dimensions of the monochromator and(b) the grating e‹ciency vs. photon energy (eV) on the
monochromator with a ruling depth of 14 nm or 7 nm.

rotates about the grating axis using a high-precision stage
and sine-bar assembly. The sine-bar is a‹xed to the stage
using a ball and vee-groove mounting with spring loadingsine arm allows the fast and stable angular scan for quick

allowing for smooth rotation of the bar while allowing for

XAS measurements. The dimensions of the monochroma-

small amounts of translation at the attachment point. The

tor and the calculated grating e‹ciency are shown in Fig. 3.

cooling lines run down the center of this shaft and use a

The e‹ciency of the grating with 14 nm and 7 nm groove

novel modiˆed VCR feedthrough design that allows for a

depth is optimized at 470 eV and 920 eV, respectively.

single cooling line with no breaks, eliminating the need for

Therefore, they can be regarded as high- and low-energy

any air guarding. The rotation shaft and sine-bar assembly

grating, respectively. The angular motion of the monochro-are all mounted on a translation platform that moves themator for selecting monochromatic light is driven by an ex-

monochromator between the two grating settings. The

ternal sine bar (lever), for which the angle is calculated

monochromator assembly is ˆxed to an epoxy-granitefrom the sine bar movement projecting in the vertical direc-

mounting base that provides thermal and vibrational stabil-tion with hardware limit switches (as shown in Fig. 2). This

ity. There are two gratings in the monochromator. Thesedesign oŠers the angular (energy) scan in a fast, stable,

gratings, ruled on a single silicon substrate, have a 230 mm

and relatively simple fashion.

× 26 mm ruled area and are separated by 6 mm laterally.
They have the same line density (200 l/mm) but diŠerent

The downstream elliptical horizontal focusing mirror,

groove depths to cover disparate photon energy ranges.

which is 1 m in length, focuses the beam horizontally near

The grating with 14 nm and 7 nm groove depth covers

the exit slit location. The beam size and the transmitted

250-750 eV and 500-1500 eV, respectively.

spectral bandwidth are controlled by the four-piezo slit system shown in Fig. 4.

A grating carriage that houses these two gratings ismounted on a motorized linear translator that moves theThus 7.3.1 is the simplest possible conˆguration, withgratings across the beam path. A motorized sine-arm withthe highest throughput of any optical conˆguration. It

an optical encoder on the motor shaft drives the grating an-should be noted that in the case of the ALS upgrade,gle to change the incident photon energy. The design of the

ALS-U, the horizontal object size will be ˆve times smaller,

308 ● 放射光 Nov. 2021 Vol.34 No.6

特集 ■ 協奏的量子ビーム研究の最前線

Fig. 4―蓄電池・ソフトマター―(Color online) (a) 3D model of the piezo slit and the enlarged image of the slit assembly. (b) The photo of theslit without cover. (c) Set up of the system for slit size measurement. (d) Single slit diŠraction image with 2 V applied on the slit and 5 V applied on the horizontal aperture. (e) Exit slit size as a function of applied voltage. The
experimental data and linear ˆtted curve are shown as the round blue circles and blue line, respectively.

and so for the same image size, a new horizontally focusing

horizontal aperture, which is used to limit the horizontal

mirror can have an image distance about ˆve times larger

beamwidth on the sample. During the normal operation,

than at present and collect ˆve times the aperture. Due tothe voltage applied on aperture A-B pair is ＋5 V, cor-these features, with a design optimized for ALS-U, un-

responding to the ～700 mm opening. The parallel blades C

dulator-like photon ‰ux densities can be achieved at theand D form the vertical aperture and they are used as the

sample. The general idea was to make a system that was asexit slit for the monochromator. When the voltage across

low in cost as possible, but maintaining very high photon

the C-D pair is 0 V, the aperture is fully closed. The open-‰ux density, so that in principle it could be replicated to ex-

ing of the exit slit versus piezo driving voltage is calibrated

pand the scientiˆc program.

by the optical setup, see Fig. 4(c). A 650-nm laser is used toilluminate the slits to produce a diŠraction pattern on a

2.2

Piezo exit slit

screen 940 mm away from the slit assembly [Fig. 4(d)].

Unlike most soft X-ray beamlines, the exit slit of the

The edges of the diŠraction pattern are parallel to eachmonochromator is 20 mm upstream from the sample loca-

other, indicating a good parallelism and alignment of thetion in the ˆrst chamber. Limited by the available space,blades. By adjusting the piezo driving voltage and deter-

the traditional design of exit slit that comprises a motorizedmining the position of the diŠraction fringes, we obtain the

two-knife-edge assembly for SGM cannot be used. To

relationship between the slit size and the voltage, which isresolve this issue, a compact slit assembly was designed,

summarized in Fig. 4(e). As can be seen from this ˆgure,and the CAD model is shown in Fig. 4(a). The assembly

the slit size varies linearly with the applied voltage in themounted on a special 4.5”CF ‰ange contains three parts la-following way:

beled I, II, and III. The photograph of the slit assembly isshown in Fig. 4(b).

Slit size (mm) ＝ 96.73 × Voltage (V) - 100.27( 1)

Part I is the main component of the slit assembly. It has

With full ＋5 V, the full opening of the exit slit will be 383

the piezo bending actuators with position sensors. The con-

mm. The repeatability of the slit size has been tested andtrol units are from Physik Instruments (PI) GmbH & Co.

the stability is longer than three weeks.

KG. Four aluminum knife-edges marked A-D in the ˆgureare mounted on the tip of the piezo bending actuators.

Part II is the electric feedthrough for the piezo actuators.

Their positions can be changed by applying voltages on the

These feedthroughs are connected to the E-651 piezo am-

piezo benders, allowing one to precisely adjust the gap be-pliˆer and high precision power supply units. Part III are

tween the knife-edges. Parallel blades A and B form thethe ˆducial monuments. They are used to set the perpen-

放射光 Nov. 2021 Vol.34 No.6 ● 309

dicularity for apertures A-B and C-D and the parallelism

terlock system. The endstation is to be an automatedbetween blades in each aperture.

beamline in the next few years to maximize its XAS
throughput to satisfy the growing demand from user

2.3

Experimental Endstationsgroups.

The endstation consists of two experimental chambers.
The ˆrst chamber (upstream) is dedicated for the UHV
solid-state XAS measurements. It is equipped with a

3. XAS spectra measured at beamline 7.3.1

cryostat with two sample stages, which can host 20-30 sam-The operation energy range for beamline 7.3.1 is fromples simultaneously. The conventional XAS detection

250 eV to 1650 eV, which covers the absorption edges

modes include the total electron yield (TEY, sample-to-from carbon to aluminum K-edges, and calcium to zinc L-

ground current), total ‰uorescence yield (TFY, chan-edges. The energy resolution of the beamline is limited byneltron multiplier), and partial ‰uorescence yield (PFY,the piezo exit slit system. The low energy grating has its

silicon drift detector) modes. For this UHV solid-statee‹ciency optimized at the titanium L-edge (450 eV),

XAS chamber at beamline 7.3.1, a channeltron multiplierwhere the grating parameters also give the best spectral

and a sample-to-ground current ampliˆer was used to col-resolving power around 6,000. The energy resolution willlect TFY and TEY signals, respectively. The upper sample

deteriorate progressively with increasing or decreasing thestage has two internal electrical contacts for connecting theincident photon energy away from this energy. This is ex-

reference and counter electrodes in the static liquid cell,

pected as the exit slit is stationary and will not be able towhose details were reported previously.30) We also deve-

compensate for the aberrations when the grating does not

loped a vacuum suitcase for transferring air-sensitive sam-fulˆll the Rowland condition.

ples from Ar-ˆlled glovebox to the load-lock chamber ofthis experimental chamber without exposure to the air.

In Fig. 5(a), we show the titanium L-edge XAS spectrum

This suitcase can also be used in other endstations at beam-in TEY mode from TiO2 powder (black curve). The spec-line 8.0.1, allowing users to perform multiple spectroscopic

trum is overlaid with that from beamline 8.0.1 (red curve).

measurements on the same samples.

In this ˆgure, one can see the salient spin-orbit splitting (L2and L3 edge) features from unoccupied Ti t2g and eg or-

The second chamber downstream of the UHV chamber

bitals. The observation of two weaker pre-peaks aroundis designed for the in-situ UHV XAS experiment. It can

457 eV and the agreement to the spectrum recorded atalso accommodate the high pressure (10－5 Torr) liquid jet

beamline 8.0.1 substantiate the claim of high spectral reso-

experiment setup. However, the second chamber is still un-

lution at this photon energy.

der development due to the ongoing design of a safety in-

Fig. 5(Color online) (a) High-resolution Ti L-edge TEY XAS spectra measured at beamline 7.3.1 and beamline 8.0.1.
(b) Magnesium K-edge XAS spectrum and (c) Aluminum K-edge XAS spectra of spinel and lithium aluminum
hydride.

310 ● 放射光 Nov. 2021 Vol.34 No.6

特集 ■ 協奏的量子ビーム研究の最前線―蓄電池・ソフトマター―

The goal of developing this endstation is to increase theO‹ce of Energy E‹ciency and Renewable Energy, FuelXAS capacity at the ALS, and one of the key metrics is the

Cell Technologies O‹ce under Contracts DE-AC52-

acquisition time for one good-statistics spectrum. With op-

07NA27344. This work is also supported by Director,

timized photon ‰ux from beamline 7.3.1, we can record one

O‹ce of Science, O‹ce of Basic Energy Sciences, of the

25-eV wide XAS spectrum at Ti L-edge in 6 minutes if us-

U.S. DOE under Contract DE-AC0205CH11231. Thising 0.1 eV energy step and 1 second acquisition time per

work was supported as part of the Joint Center for Energy

step. This acquisition time is actually shorter than what is

Storage Research (JCESR), an energy innovation hub

needed for a comparable measurement at beamline 8.0.1

funded by the U.S. DOE. This research used resources ofdue to the fast monochromator grating scanning mechan-

the Advanced Light Source, a U.S. DOE O‹ce of Scienceism. In Figs. 5(b) and 5(c), we show the Mg and Al K-edge

User Facility under contract no. DE-AC02-05CH11231.

XAS spectra from MgO, Al2MgO4, and LiAlH4, respective-

References

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4. Summary
The new endstation at ALS beamline 7.3.1 dedicated forsoft X-ray absorption spectroscopy with in-situ/operando
capability is now open for general user operation. The relatively simple optical design optimizes the incident photon‰ux and spectral resolution for performing routine XAS
measurements at this bending magnet beamline. The extended high photon energy end to reach the aluminum Kedge is beneˆcial for energy materials and catalysis
research. We show selected XAS spectra at Ti L-edge andMg and Al K-edge to validate the designed 6,000 and 3,000
resolving power, respectively. In addition, comparison
spectra with the neighboring undulator beamline 8.0.1 areprovided with comparable data quality and resolution. The
outcomes from the endstation are productive and increasing volumes of inquiries are received from many externaluser groups, including those for in-situ/operando XAS
measurements.

Acknowledgement
The authors acknowledge ˆnancial support through the

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Introduction of Authors

Feipeng Yang

Xuefei Feng

Advanced Light Source, Lawrence Berkeley National Laboratory
E-mail: feipeng_yang＠lbl.gov
Research interests: Soft X-ray Spectroscopy, X-ray and Neutron Scattering,In-situ/operando Synchrotron and Neutron Experiments, Polymers, Thin Films,
Battery, and Catalysis［Resume］
2013-2018: Ph.D. Candidate, Departmentof Polymer Science, The University of
Akron. Advisors: Dr. Mark D. Foster & Dr.
Mark D. Soucek
2019-present: Postdoctoral Fellow at theAdvanced Light Source, Lawrence Berkeley National Laboratory, Supervisor: Dr.
Jinghua Guo
2020-present: Postdoctoral Fellow in Joint
Center for Energy Storage Research(JCESR), a Department of Energy's
Energy Innovation Hub.

University of Science and Technology ofChina, National Synchrotron Radiation
Laboratory
E-mail: fengxf＠ustc.edu.cn
Main
scientiˆcactivities:
EnergySciences, Instrument Development for Insitu/Operando Synchrotron Radiation Experiments［Resume］
2004-2008: Studies of Material Chemistryat the University of Science and Technology of China.
2008-2014: Studies of Synchrotron Radiation and Application at National Synchrotron Radiation Laboratory, University of
Science and Technology of China.
2014-2016: Postdoctoral Fellow at the
Shanghai Institute of Microsystem and Information Technology, Chinese Academyof Sciences.
2016-2019: Postdoctoral Fellow at the Advanced Light Source, Lawrence Berkeley
National Laboratory.
2019-2021: Project Scientist at the Advanced Light Source, Lawrence Berkeley
National Laboratory.
2021-present: StaŠ Scientist at National
Synchrotron Radiation Laboratory, University of Science and Technology of China.

Yi-Sheng Liu
StaŠ scientist in Sigray Inc.
E-mail: ysliu2＠gmail.com
Main scientiˆc activities: In-situ/operando X-ray spectroscopies, energy
materials.
［Resume］
2006-2012: Ph.D. in Physics., Tamkang
University, New Taipei City
2012-2013: Application Engineer, Grand
Technology Inc., Hsinchu City
2013-2016: Postdoctoral Fellow, Advanced
Light Source, Lawrence Berkeley National
Laboratory
2016-2020: Project Beamline Scientist, Advanced Light Source, Lawrence Berkeley
National Laboratory2020-present: StaŠ scientist, Sigray Inc.,
Concord.

312 ● 放射光 Nov. 2021 Vol.34 No.6

Per-Anders Glans
Beamline Scientist, Advanced Light
Source, Lawrence Berkeley National
Laboratory
E-mail: paglans＠lbl.gov
Main scientiˆc activities: Developing ahigh-resolution photon-in-photon-out experiment station at a new beamline.
［Resume］
1996, M. Sc. In Applied Physics and Electrical Engineering, Linkoping University,
Linkoping, Sweden
2002, Ph.D. in Materials Science, Linkoping University, Linkoping, Sweden
2001-2007: Research Associate, Boston
University
2007-2009: Research Associate, Advanced
Light Source, Lawrence Berkeley National
Laboratory
2009-2014: Scientiˆc Engineering Associate, Advanced Light Source, Lawrence
Berkeley National Laboratory
2014-present, Research Scientist, Advanced Light Source, Lawrence Berkeley
National Laboratory

特集 ■ 協奏的量子ビーム研究の最前線―蓄電池・ソフトマター―

Jamie Nasiatka

Jun Feng

Instrumentation Engineer, Advanced
Light Source, Lawrence Berkeley National
Laboratory
E-mail: jrnasiatka＠lbl.gov
Main scientiˆc activities: Development ofhigh-stability precision positioning systems, Novel thermal management solutions for X-ray optics and synchrotronbased instrumentation［Resume］
1989-1997: StaŠ Engineer at Argonne National Laboratory, High Energy Physics Division
1997-1998: Senior Engineer and department manager, Aerometrics Corporation
1998-2002: Senior Engineer, Nectar Therapeutic Systems
2003-present: Instrumentation Engineer,
Advanced Light Source, Lawrence Berkeley National Laboratory

Professor of Department of Materials
Science and Engineering, Institute forQuantum Science and Engineering,Southern University of Science and Technology, Shenzhen 518055, Guangdong,
China,
E-mail: fengj＠sustech.edu.cn
Research interests: Advanced material
synthesis and characterization, Novel
photocathode materials, High brightness
electron beam, Ultrafast science, Quantum electron microscopy, Synchrotron
radiation instrument and application.
Publication in refereed journals: ＞100
［Resume］
1982-1986: Studies of physics at Sichuan
University, China.
1986-1991: Studies of physics and Doctoral
thesis at the Institute of Modern Physics.
1991-1993: Postdoctoral Fellow at the Institute of Applied Physics.
1993-1995: Visiting Scientist at the Institute of Physical and Chemical Research,
Japan.
1995-1998: Research Professor at the Institute of Applied Physics.
1998-2020: StaŠ Scientist at the Advanced
Light Source, Lawrence Berkeley National
Laboratory, USA.
2020-present, Professor of SusTech.

Dmitriy Voronov
StaŠ Scientist, Advanced Light Source,
Lawrence Berkeley National Laboratory
E-mail: dlvoronov＠lbl.gov
Main scientiˆc activity: Material Scienceand Engineering, Nanofabrication, Development of Advanced X-ray DiŠractive
Optics, X-ray Multilayers, Multilayer
Blazed Gratings.
［Resume］
1983-1989: Studies of Physics of Metals
and Semiconductors at National Technical
University, Ukraine.
1989-1997: Researcher at the Institute forSingle Crystals, National Academy of
Science of Ukraine.
1997-2007: X-ray Optics Laboratory, National Technical University, Ukraine.
2007-2011: Postdoctoral Researcher at theAdvanced Light Source, Lawrence Berkeley National Laboratory.
2011-2014: Physicist Project Scientist at
the Advanced Light Source, Lawrence Berkeley National Laboratory.
2014-present: StaŠ Scientist at the Advanced Light Source, Lawrence Berkeley
National Laboratory.

Yi-De Chuang
StaŠ Scientist, Advanced Light Source,
Lawrence Berkeley National Laboratory
E-mail: ychuang＠lbl.gov
Main scientiˆc activity: Condensed Matter Physics, Synchrotron Instrumentation,
Soft X-Ray Spectroscopies
Publication: ＞100, h-index 36［Resume］
1990-1994: BS, Physics, National Taiwan
University
1996-2001: PhD, Physics, University ofColorado at Boulder
2002-2006: Postdoctoral Researcher, Advanced Light Source, Lawrence Berkeley
National Laboratory
2006-2015: Physicist Scientist, Advanced
Light Source, Lawrence Berkeley National
Laboratory
2015-present: StaŠ Scientist, Advanced
Light Source, Lawrence Berkeley National
Laboratory

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Howard Padmore

Jinghua Guo

Advanced Light Source, Lawrence Berkeley National Laboratory
E-mail: hapadmore＠lbl.gov
Main scientiˆc activities: material science
using X-ray synchrotron techniques, Solidstate physics of photocathodes and plasmonic devices, DiŠractive X-ray imaging,and X-ray optics.
［Resume］
1977: B.Sc. in physics, Leicester University
1983: Ph.D., Leicester University, UK
1982-1988: Senior/Hier Scientiˆc O‹cer,
Surface Science Group, Daresbury
1989-1993: Principal Scientiˆc O‹cer,
Head Soft X-ray Group, Synchrotron Radiation Research Division, Daresbury
Laboratory, UK
1993-present, Group leader for experimental systems, Advanced Light Source,
Lawrence Berkeley National Laboratory
2005-present: Division Deputy, Advanced
Light Source, Lawrence Berkeley National
Laboratory
2018-present: Professor of Physics, Arizona State University.

Senior Scientist and RIXS Program Lead,
Advanced Light Source, Lawrence Berkeley National Laboratory
Adjunct Professor, Department of Chemistry and Biochemistry, University ofCalifornia at Santa Cruz
Fellow of the American Physical Society
E-mail: jguo＠lbl.gov
Research interests: In-situ / operando
XAS, XES, and RIXS studies of energy
storage, Controlled catalytic and chemical
reactions, Development of in-situ/operando soft X-ray spectroscopy instrumentation and automation controls, Development of spatial-time-dependent RIXS, Development of Fourier transform interferometry instrumentation for XAS and RIXS
［Resume］
1985: B.Sc., Zhejiang University, China
1995: Ph.D. in physics at Uppsala University, Sweden
1995-1997: Postdoc at Uppsala University,
Sweden1997-2001: Assistant Professor, Department of Physics, Uppsala University,
Sweden2001-2004: Research Scientist, Advanced
Light Source, Lawrence Berkeley National
Laboratory
2004-2014: StaŠ Scientist, Advanced Light
Source, Lawrence Berkeley National
Laboratory
2012-present: Adjunct Professor, Department of Chemistry and Biochemistry,
University of California, Santa Cruz
2014-present: Senior Scientist, Advanced
Light Source, Lawrence Berkeley National
Laboratory

Professional service and Honors:
1991-1994: Member of the editorial boardof the (UK) Institute of Physics Journal of
Measurement Science and Technology, J.
Phys. E
1999-2008: Member of the editorial boardof the Journal of Synchrotron Radiation
2008: Fellow Optical Society of America
2013: Fellow American Physical Society
2013: AVS Nerken Prize

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