MMC Activities..............1
BEANS Pj ....................5
Topic .........................6
Overseas Trends............7
Member’s Profiles .........8

MMC Activities

MicroNano 2008 Report
MicroNano 2008 was held for four days Tuesday, July 29

MicroNano, and this appears to be one of the reasons that thethrough Friday, August 1, 2008 at the Tokyo International

event is held in such high regard.

Exhibition Center (Tokyo Big Sight) and the Ariake
Washington Hotel (Ariake, Koto-ku, Tokyo). The exhibition

Micromachines and MEMS devices are now key systems
and devices that are essential for the manufacture of various

was a resounding success, and the sponsors would once again
like to express their appreciation to all who attended.

products in the manufacturing industry. As the sole venue thatcombines together both the micromachine industry and theThis year, as last year, MicroNano 2008 featured both an

MEMS industry, the organizers of MicroNano feel both a senseinternational exhibition and a conference. The number ofcompanies exhibiting at the exhibition came to 358 (in 483of mission and an obligation to meet the high expectations
placed on the event. Next year and in future years, they willbooths). As in past years, the total number of visitors during
the three days of the exhibition continues to increase: whereas

continue to strive to increase the appeal of MicroNano andmake it an event at which the achievements in these industries

last year’s total attendance was 12,424, this year it was 14,075

can be shared with visitors. Next year is particularly– an increase of 13% over last year, and a new record.
Attendance by overseas visitors was 2.7 times greater than thenoteworthy in that the Exhibition Micromachine / MEMS willcelebrate its 20th anniversary. The tentative dates and venue

previous year. The increase was undoubtedly due to the fact
that, in addition to the Micromachine / Nanotech Symposium, afor MicroNano 2009 are shown below. The organizers hope thatboth exhibitors and visitors will once again attend andvariety of international conferences were held duringotherwise support the event.

MicroNano 2008, including the Japan-Germany Business
Forum and the MIF Overseas Affiliate Workshop. At these andalmost all of the other venues, attendance was so great that thehandouts that had been prepared proved to be insufficient toMicroNano 2009 (tentative)

meet the demand. The success of the event is a sure sign that
MicroNano has become firmly established as a Tokyo Big Sight- 20th Exhibition Micromachine / MEMS
- Conference

event, as well as a sign of the increased interest in

Wednesday, July 29 - Friday, July 31, 2009
East Hall Nos. 5 & 6, Tokyo International
Exhibition Center (Tokyo Big Sight), Ariake, Tokyo

micromachine and MEMS technology. Beginning last year,
MicroNano has featured both micromachines and MEMS, witha full array of MEMS exhibits. No other exhibition, in Japan oreven overseas, offers exhibits in the MEMS field on the scale of

19th Exhibition Micromachine / MEMS
The 19th Exhibition Micromachine / MEMS was held in theWest Hall Nos. 1 & 2 at the Tokyo International Exhibition
Center (Tokyo Big Sight) as one of the events in MicroNano
2008. Both the total number of exhibitors and the total numberof attendees set a new record for the exhibition: 358 exhibitors
and a total of 14,075 attendees over the three days of theexhibition.
The Micromachine Center booth featured both display
panels and survey materials introducing the Center’s activities,
as well as exhibits of actual wafers and devices that enabled
visitors to gain a thorough understanding of MEMS devices. Thebooth and its exhibits were very popular with attendees.

Internet Home Page : http://www.mmc.or.jp/

In addition, a separate MemsONE Consortium boothfeatured an explanation of the functions of the MemsONE

Year

Venue

Total No. of Attendees

software for MEMS design.
As the table below shows, the scale of the exhibition has

19th(2008)

Tokyo International
Exhibition Center(Tokyo Big Sight)

14,075been increased each year to accommodate the expansion of theMEMS industry. Next year, the 20th Exhibition Micromachine /18th(2007)

Tokyo InternationalExhibition Center(Tokyo Big Sight)

12,424MEMS is scheduled to be held July 29 - 31, 2009. The exhibition

17th(2006)

Tokyo Forum

11,73616th(2005)

Science Museum

9,098

venue will remain the same – Tokyo International Exhibition
Center (Tokyo Big Sight) – but the exhibition hall will change
to the East Hall Nos. 5 & 6.

14th International Micromachine / Nanotech Symposium
On the first day of MicroNano 2008, July 29, 2008, the 14th
International Micromachine / Nanotech Symposium was held at
the Ariake Tokyo Bay Washington Hotel. As indicated by thesymposium’s subtitle (“Technology Convergence MEMS, LSI.
Nano and Bio”) the focus of this year’s symposium was 2 ndgeneration MEMS, for which integration with semiconductors is
being pursued, as well as BEANS, the 3rd generation MEMS thatare intended to integrate nano- and biotechnologies.
In the morning keynote address entitled “MEMS
Industrialization Perspective in Japan,” Kyoto University
Professor and NEDO Program Manager Hidetoshi Kotera gave an
overview of the MEMS integration and fusing of different fields
currently being promoted in Japan, covering such aspects as
national government policy and industry-academic liaison efforts.
Next, Roger T. Howe of Stanford University gave an absorbing
presentation about integrated MEMS efforts in the UnitedStates and new efforts aimed at future MEMS development.
The afternoon sessions began with the MEMS LSI
Integration session. Albert Chang of the Asia PacificMicrosystems (APM) foundry in Taiwan gave a presentation on
CMOS / MEMS integration from a foundry perspective. Yoshiaki
Toyoshima of Toshiba Corporation gave a presentation oncooperation and integration with regard to MEMS and CMOS.
Wilbur Catabay of the Silicon Valley Technology Center spokeabout deployment of the technology in 8” wafers in the MEMS
integration process. In the final presentation in that session,
Susumu Sugiyama of Ritsumeikan University spoke about theFine MEMS project which will be completed this year. In thesepresentations, the speakers introduced MEMS integration
efforts from a variety of perspectives and expressed a variety ofopinions.
In the next session, entitled “MEMS EmergingApplications,” Uwe Kleinkes of the iVAM Microtechnology

Professor Hidetoshi Kotera

Network in Germany spoke about new applications for
MicroSystems Technology (MST) at European companies.
Yoshio Sekiguchi of Omron Corporation gave a presentation on
MEMS microphones and deployment in 8” wafer manufacture.
Ryo Ota of Olympus Corporation spoke about bio and medical
applications for cantilever and mirror devices. Each of thesepresentations focused on the latest applications for MEMS
technologies and the latest trends in commercial development.
The final session was entitled “Emerging Technology:BEANS” and focused on the integration of MEMS with nanoand bio technologies. Jouni Ahopelto of VTT spoke about thenanoimprinting technology currently being promoted in Europe
and the nanopatterning technology expected to be promoted inthe future. Ichiro Yamashita of Matsushita Electric Industrialgave a presentation on the nanopatterning technology thatutilizes the self-organizing property of proteins and theapplication of this technology in device development. Finally,Associate Professor Koji Miyazaki of the Kyushu Institute ofTechnology spoke about the BEANS project, whose goal is toachieve high performance exceeding that of thermoelectric
power generation through the control of nanostructures. In thissession as well, there was spirited discussion of research trends,
technological potential and so on.
The symposium was filled to capacity (200 persons) andwas a resounding success, thanks not only to the outstanding
presentations but also to the hard work of the Steering
Committee and Program Committee and the international
advisors, as well as to all who provided their assistance andcooperation in emceeing and coordinating operations on theday of the event.
The 15th International Micromachine / Nanotech Symposium
will be held next year, once again as part of MicroNano 2009.

Symposium venue

2Albert Chang

Professor Roger T. Howe

Japanese-German Micro / Nano Business Forumthrough industry-government-academic cooperation. The final
presentation, by Professor Masayoshi Esashi of Tohoku
University (a MEMS Industry Forum advisor), focused on
business development through open collaboration on the part ofindustry and academia.
Moreover, on Thursday, July 31, an International Affiliate
Workshop was held at a special venue set up at MicroNano
2008. The workshop featured presentations on the activities ofaffiliates in Korea, Brazil and Singapore.

The Japanese-German Micro / Nano Business Forum washeld on July 30 as part of MicroNano 2008. The forum wassponsored jointly by the Micromachine Center and the iVAM
Microtechnology Network of Germany, a MEMS Industry Forumoverseas affiliate.
In the opening ceremony, Peter Scholz, of the Industry andEnergy Ministry in Germany’s North Rhine-Westphalia (NRW)Province, and Keiichi Aoyagi, executive director of theMicromachine Center, spoke about the significance of the forum
and their expectations for this year’s event.
The sessions featured presentations from eight companies
and research organizations from Germany and other parts ofEurope that were also exhibitors at Exhibition Micromachine /MEMS. The presentations focused on MEMS packaging, autoassembly, laser processing 3-dimensional measurement andother state-of-the-art technologies, as well as new productannouncements. Presentations from Japan included adiscussion of the injection molding of metallic powder by Taisei
Kogyo Co., Ltd. (an iVAM Microtechnology Network member),a presentation by Matsushita Electric Works, a MEMS IndustryForum member, on its proprietary MID technology (MIPTECH),
and a presentation by Olympus Corporation on the latest
cantilever technologies and their application in businessactivities. The Micromachine Center also gave a presentation onefforts to promote industrial applications for MEMS in JapanMEMS Forum(3) Technical strategy roadmap for the MEMS field
Hideaki Watanabe, New Energy and Industrial TechnologyDevelopment Organization (NEDO)The MEMS Forum was held on August 1, 2008 at a special
venue set up within Exhibition Micromachine / MEMS. The
purpose of the MEMS Forum is to offer information about theactivities of the MEMS Industry Forum, a special projectcommittee of the Micromachine Center, and to provide a forum
for the exchange of views regarding MEMS, in order to achievea deeper common recognition of issues involved in the growthand expansion of MEMS-related industries.
This year’s MEMS Forum began with an overview of MEMS
Industry Forum activities by Keiichi Aoyagi, director of theMEMS Industry Forum secretariat. Session 1 focused on
current issues relating to the establishment of a MEMS industry
infrastructure. Session 2 featured presentations on theactivities of MEMS Industry Forum academy affiliates. Session 3
focused on the status of specific activities relating to issues inthe development of the MEMS industry, including international
standardization, personnel training, support for MEMS-related
research and development at the MEMS foundry experimental
research institutions established and operated by local
governments, and the infrastructure for MEMS design. Below isa list of the presentation titles and the names of the presentersfor each session in this year’s MEMS Forum.

Session 2 Industry-Academic Collaboration
Session 2 was a session on industry-academic collaboration,organized and chaired by Professor Kazuo Sato of the School ofGraduate Studies at Nagoya University. Presentations in thissession were from the perspective of industry-academic
collaboration, which supports the activities of the MEMS
Industry Forum, and were conducted by the following MEMS
Industry Forum academy affiliates.
(1) Remarks at the beginning of the industry-academic
collaboration session
Kazuo Sato, Nagoya University(2) Wearable microsensors: an advanced general sensingtechnology for achieving a safe and secure society
Kazusuke Maenaka, University of Hyogo(3) Mass production of next-generation optical elements
through ultra-precision micro three-dimensional
machine processing
Eiji Shamoto, Nagoya University(4) Introduction to the Micro Energy Research Council,
Micro / Nano Optical Specialist Forum, Japan Societyof Mechanical Engineers
Hiroki Kuwano, Tohoku University

Session 1 Advancement of MEMS Industries andTechnologies(1) Strengthening of MEMS industry infrastructure
Isao Shimoyama, The University of Tokyo(2) Toward MEMS market expansion:
1st generation MEMS - 3rd generation MEMS (BEANS)
Junji Adachi, Micromachine Center

Session 3 Issues for MEMS Industry Development
Session 3 focused on the committee activities of the MEMS
Industry Forum in the Micromachine Center, comprising3

Manabu Yasui, Kanagawa Industrial Technology Center(6) MemsONE functions and future plans (MEMS designand analysis support system) Ver. 1.1
Yukihisa Maeda, MemsONE Consortium, Nihon Unisys Excelutions

international standardization efforts in the MEMS field, issues
relating to the strengthening of the MEMS foundry
infrastructure, an example of a micro/nano manufacturingpersonnel training program (a topic currently being pursued byMEMS Industry Forum affiliate organizations), and the current
state of research and development assistance to local companies.
(1) International standardization trends in MEMS fields
Professor Kuniki Ohwada, Teikyo University(2) AIST training of micro / nano manufacturing personnel,
focusing on industry-academic personnel training
partnership projects
Ryutaro Maeda, National Institute of Advanced Industrial
Science and Technology (AIST)(3) Strengthening of MEMS foundry infrastructure
Susumu Sugiyama, Ritsumeikan University(4) Activities for the establishment of a MEMS Foundry Network
Fumihiko Sato, Omron Corporation and Chair, Foundry Service
Industry Committee, MEMS Foundry Network(5) Case studies of the use of MEMS technologies in
research and development assistance by theKanagawa Industrial Technology Center

This year, as last year, the MEMS Forum was held at a
special venue that had been set up within Exhibition
Micromachine / MEMS. On the day of the forum, the attendanceexceeded the capacity of the special venue (400 persons). TheMEMS Forum featured exhibits of new technologies andproducts. The Forum also facilitated participation in
conferences on MEMS-related technical trends and industry
trends, and provided an overview of the current state of MEMS
business and MEMS technologies and the prospects for both,and it was well-received by attendees.
The MEMS Industry Forum makes every effort to ensurethat the content of the MEMS Forum provides the opportunity
to enhance the common recognition of issues relating to thegrowth of MEMS-related industries. We hope that visitors willcontinue to attend and benefit from the MEMS Forum in futureyears as well.

Fine MEMS Project Interim Achievements Meetingachievements in nine consignment projects from the heads ofdevelopment in each area, followed by a lively discussion.
Even from the viewpoint of attendance, the meeting was a
resounding success. For this year’s meeting, 250 seats – morethan twice the number of last year’s interim achievements
meeting – had been prepared. However, by the time themeeting began, these seats were filled and that there were a lotof standing audience, and all 400 copies of the meeting material
prepared in advance had been handed out. Similarly, there weremany visitors to the NEDO Fine MEMS Project booth within theexhibition venue, and this booth soon became a site of a lively
discussion on the details of the interim achievements of theFine MEMS project and other issues. Judging from the air ofexcitement that pervaded both the meeting and the exhibition
venue from start to finish, expectations for this project are
extremely high, and both the meeting and the Fine MEMS
Project booth were deemd as a outstanding success aboutpublicizing the development efforts for highly integrated andcomplex MEMS manufacturing technologies. The responses
from a questionnaire survey conducted for meeting attendees
and exhibition booth visitors will be analyzed and used thequestionnaire data to rapidly achieve practical applications forthe manufacturing technologies developed as part of the Fine
MEMS Project.

As part of MicroNano 2008, a meeting was held to announce
the interim achievements of the Highly Integrated and Complex
MEMS Manufacturing Technology Development Project (FineMEMS Project) commissioned and subsidized by the New
Energy and Industrial Technology Development Organization(NEDO). The meeting was held on Thursday, July 31, 2008 at
the Tokyo International Exhibition Center (Tokyo Big Sight)
and was hosted by the NEDO and the Fine MEMS Project
Promotion Committee of the Micromachine Center, withsupport from the Ministry of Economy, Trade and Industry(METI).
At the opening ceremony, Akira Uehara, Executive directorof NEDO, delivered an address of welcome to the attendees onbehalf of the orgnizers. Next, Motoki Korenaga, deputy directorof the Manufacturing Industries Bureau of the Ministry ofEconomy, Trade and Industry, an invited guest, gave apresentation entitled “MEMS Industry Strategies andExpectations for the Fine MEMS Project.” Isao Shimoyama,
Dean of the Graduate School of Information Science andTechnology of The University of Tokyo and the leader of theFine MEMS Project, gave a presentation entitled “Overview ofFine MEMS Project” in which he presented an the outline of theproject’s achievements including grant projects. After thesepresentations, there were detailed reports on the latest

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