኱Ẽ୰ᚤ㔞᭷ᐖ㔠ᒓ໬Ꮫ✀ࡢ࣐ࣝࢳࢫࢣ࣮ࣝゎᯒጧ ᫂⋢࣭Ᏹ㒔ᐑ ⪽஑኱㝔࣭⌮࣭໬Ꮫ  ởᰁ኱Ẽᚤ⢏Ꮚ୰࡟Ꮡᅾࡍࡿᚤ㔞᭷ᐖ㔠ᒓࡢࢧ࢖ࢬศᕸࠊ໬Ꮫ≧ែࡣࠊ⏕య࡬ࡢᙳ㡪ࢆ᥎ᐃࡍࡿୖ࡛୙ྍḞ࡞᝟ሗ࡛࠶ࡿࠋᮏ◊✲ࡣࠊࢩࣥࢡࣟࢺࣟࣥᨺᑕග;⥺྾཰➃ศᯒ㸦;$1(6㸧ࠊ⢊ᮎ;⥺ᅇᢡ㸦;5'㸧ࠊ㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾㸦6(0㸧ࠊ㏱㐣㟁Ꮚ㢧ᚤ㙾㸦7(0㸧ࡲ࡛ࠊࣂࣝࢡ࠿ࡽ
ࢼࣀࡢ࣐ࣝࢳࢫࢣ࣮ࣝゎᯒἲࢆ☜❧ࡋࠊ᭷ᐖඖ⣲໬Ꮫ✀ࡢࡼࡾṇ☜࡞᝟ሗࢆᚓࡿࡇ࡜ࢆ┠ⓗ࡜ࡋࡓࠋࡑࡢゎᯒἲࢆ⡿ᅜᶆ‽≀㉁◊✲ᡤ㸦1,67㸧ࡢᶆ‽኱Ẽヨᩱ㸦▼Ⅳ⅊ᶆ‽ࠊᕷ⾤ᆅᶆ‽኱Ẽࠊᐊෆᶆ‽኱Ẽ㸧࡟㐺⏝ࡋࡓࠋ;$1(6࡟ࡼࡿ໬Ꮫ✀ྠᐃࡣ3E0Q&Uࢆᑐ㇟࡜ࡋ࡚ࠊࡑࢀࡒࢀࡢඖ⣲࡟ᑐࡋ࡚ࠊᩘ✀㢮ࡢ␗࡞ࡿ⣧໬ྜ≀ࡢࢫ࣌ࢡࢺࣝࢆ ᐃࡋ࡚ࠊ⤖ྜ≧ែ࡟ࡼࡗ࡚;$1(6ࡢᙧ≧࡟ኚ໬ࡀ⌧ࢀࡿࡇ࡜ࢆ
☜ㄆࡋࡓࠋ
ᐇ㝿ࡢࢧࣥࣉࣝ࡟࠾࠸࡚ࠊ3Eࡣ஧౯࡛ࠊᒇෆᶆ‽኱Ẽ୰࡛◲໬≀࡜ࡋ࡚ࠊᕷ⾤ᆅᶆ‽኱Ẽ୰࡛ࡣ◲㓟ሷ࡜ࡋ࡚Ꮡᅾࡍࡿࡇ࡜ࡀࢃ࠿ࡗࡓࡀࠊ6(0ࠊ7(0࡟ࡼࡿศᯒ࠿ࡽࡣࠊᕷ⾤ᶆ‽࡟࠾
࠸࡚3Eࡣࡼࡾ⣽⢏ࡢࢼࣀ⢏Ꮚ࡜ࡋ࡚኱㔞࡟Ꮡᅾࡍࡿ୍᪉ࠊᒇෆᶆ‽࡛ࡣẚ㍑ⓗ⢒⢏ࡢ⢏Ꮚ࡜ࡋ࡚Ꮡᅾࡋࡓࠋ0Qࡣ࡝ࡢᶆ‽ヨᩱ࡟࠾࠸࡚ࡶ஧౯࡛ࠊ◲໬≀ࡀ୺࡞໬Ꮫ✀࡛࠶ࡿࡇ࡜ࡀ♧၀
ࡉࢀࡓࠋ&Uࡣࢡ࣐ࣟ࢖ࢺ࡜࠸࠺㖔≀ࡀ୺࡟Ꮡᅾࡍࡿࡇ࡜ࡀ♧၀ࡉࢀࡓࠋ
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ओࢽࢥࣥ ⢭ᶵ࢝ࣥࣃࢽ࣮ ḟୡ௦༙ᑟయ㟢ග⿦⨨࡜ࡋ࡚ ([WUHPH8OWUDYLROHW ග㸦(89㸪Ȣ QP㸧ࢆ⏝࠸ࡓ (89㟢ග⿦⨨㛤Ⓨࡣᐇ㦂ᶵ࠿ࡽ㔞⏘⏝㟢ගᶵ࡬࡜㐍ࢇ࡛࠸ࡿࠋ㟢ගගᏛ⣔࡜ࡋ࡚ࡣᚑ᮶ࡢࡼ࠺࡞
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⣔ࡀ᥇⏝ࡉࢀ࡚࠸ࡿࠋ
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ࢺ࡛࠶ࡿ୍᪉ࠊගᏊ࢚ࢿࣝࢠࡀ㧗࠸ࡓࡵࠊ(89 ග࡜⿦⨨ࡢṧ␃࢞ࢫ࡛࠶ࡿỈศᏊ࡜ࡀග໬Ꮫ
཯ᛂࢆ㉳ࡇࡋࠊከᒙ⭷⾲㠃ࢆ㓟໬ࡉࡏࠊ࣑࣮ࣛࡢ཯ᑕ⋡ࢆపୗࡉࡏࡿၥ㢟ࡀ࠶ࡿࠋ ࣑࣮ࣛࡢ⪏㓟໬ᛶࢆྥୖࡉࡏࡿࡓࡵ࡟࣑࣮ࣛከᒙ⭷ୖ࡟ಖㆤᒙ㸦FDSSLQJ ᒙࠊ⣙ QP㸧ࡀ௜ࡅࡽࢀ࡚࠸ࡿࡀࠊಖㆤᒙ࡟ࡼࡾ⪏㓟໬ᛶ࡟ᕪࡀฟ࡚ࡃࡿࡓࡵࠊಖㆤᒙࡢ㑅ᐃࡀ㔜せ࡜࡞ࡿࠋ
✀ࡢಖㆤᒙ௜ࡁ࣑࣮ࣛࢧࣥࣉࣝࡢ⪏㓟໬ᛶࢆホ౯ࡋࡓ 㓟໬≀ಖㆤᒙQPཌ㸸6L2
7L292&U20Q2<21E25X25K23G26Q2/D2&H2:2 ࠋホ౯㸦(89ග↷ᑕ㸧ࡣ1776XSHU$/,61HZ68%$58%/6$*$/6%/࡟࡚⾜ࢃࢀࡓࠋྛࢧࣥ
ࣉࣝࢆ┿✵୰㸦Ỉ⵨Ẽᅽ[3D㹼[3D㸧࡟⨨ࡁࠊ(89ග↷ᑕ㸦-PP㸧࡟ࡼࡿ࣑࣮ࣛ཯ᑕ⋡ኚ໬㸦㓟໬ࡢᙳ㡪㸧ࢆホ౯ࡋࡓࠋ ࢧࣥࣉࣝ୰࡛ࡣ7L292&U21E2&H2ಖㆤᒙ࣑࣮ࣛࡣ཯ᑕ⋡పୗࡀᑠࡉࡃࠊୗᒙ
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⦓ᐦ࡞ᵓ㐀࡟ᡂࡗ࡚࠸ࡿ࡜⪃࠼ࡽࢀࡿࠋಖㆤᒙ⭷ࡢᒁᡤᵓ㐀ゎᯒࢆᐇ᪋㸦63ULQJ࡟࡚㸧ࠊ
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᫖ᖺࠊ㟢ගᶵගᏛ⣔ホ౯ࡢࡓࡵ࡟6$*$/6ࡢ%/ࢆ❧ୖࡆࠊ㐠⏝ࢆ㛤ጞࡋࡓࠋࡇࢀ࡟ࡼࡾ
ಖㆤᒙࡢᒁᡤᵓ㐀࡜ᴟ➃⣸እ⥺↷ᑕ࡟ࡼࡿ⪏㓟໬ᛶ࡜ࡢ㛵ಀࠊࡉࡽ࡟ࡣ(89㟢ග⿦⨨㛵㐃ࡢㄪᰝࡶຍ㏿࡛ࡁࡿ࡜⪃࠼࡚࠸ࡿࠋ
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㸫㸫NIKON CORPORATION
Corporate Planning Department
Month Day, Year⢛᥊ታ㛎⢛᥊㪜㪬㪭㔺శⵝ⟎ౝ䈱ᱷ⇐㪟㪉㪦䋨᳓⫳᳇䋩䈮䉋䉎෻኿శቇ♽䊚䊤䊷䈱㉄ൻ䈮䉋䉎෻኿₸䈱ૐਅ䈏໧㗴䈫䈭䉎䇯㪜㪬㪭㔺శⵝ⟎䈱ᄙጀ⤑䊚䊤䊷㉄ൻ଻⼔ጀ䋨㪺㪸㫇㫇㫀㫅㪾 㫃㪸㫐㪼㫉㪀䈱⠴㉄ൻᕈ෸䈶⤑᭴ㅧ䉕㉄ൻ‛଻⼔ጀ䈮䈧䈇䈩⹏ଔ䈚䈢䇯

Extreme Ultraviolet㔺శᯏᄙጀ⤑䊚䊤䊷䈱⠴㉄ൻᕈ⹏ଔ

⹏ଔ䉰䊮䊒䊦

Capping layer

SiO 2

TiO 2

V2 O 5

Cr2 O 3

Mn2 O 3

Y2O 3

ǻReflectance/%

-0.3

-0.2

-0.3

-0.7

-0.5

0.1

3

䊺䊆䉮䊮
᧻ᚑ⑲৻䇮ⷺ⼱ᐘା䇮㕍ᧁ⾆ผ䇮ᴡ↰⌀ᄥ㇢䇮᧛਄ൎᒾNb 2 O5
0.1

Density /(g/cm )

2.95

4.25

3.36

5.22

5.03

5.03

4.5

Capping layer

RuO2

Rh2 O 3

La2 O3

CeO 2

WO 3

PdO

SnO2

ǻReflectance/%

0.2

0.1

-0.3

-2.3

-0.5

-0.7

-0.4

Density /(g/cm3)

7.04

8.02

9.7

7

6.51

7.65

7.3

㰱Reflectance:
Si/Mo ᄙጀ⤑䋨㰰=0.39䇮d=7.014nm+଻⼔ጀ䋩䈱෻኿₸Ꮕ䇯෻኿₸䈲⸘▚୯䋨⴫ਛ䈱ኒᐲ䉕૶↪䋩䇯

Oxide capping layer 1.7nm
with low absorption

Si/Mo multi-layer mirror਻Ꮊᄢቇ⿥㜞࿶㔚ሶ㗼ᓸ㏜ቶ䊶਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷วห䉲䊮䊘䉳䉡䊛╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩

2╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩

NIKON CORPORATION
Corporate Planning Department
Month Day, Year

Apparatus⠴㉄ൻᕈ৻ᰴ⹏ଔNIKON CORPORATION
Corporate Planning Department
Month Day, Year

InsideApparatus⠴㉄ൻᕈੑᰴ⹏ଔ

Folding mirror
SR-beamLordchamber

Photo
diode

Cr2O3
Mn2O3
Y2O3
Nb2O5
RuO2
Rh2O3

0.92

PdO
SnO2

0.90

La2O3

0

50

100

150
2

Dose/(J/mm )

200

1.02

V2O5

1.00

Cr2O3
Mn2O3

0.98

Nb2O5

0.96

RuO2

0.94

Rh2O3
CeO2

0.92

WO3

1.00

0

50

WO3

100

150

Cap

(ǻR/Ro)/(1kJ/mm2)

1

Nb2O5

0.19 ×10

-2

TiO2

2

TiO2

0.07 ×10

-2

V2O5

3

Cr2O3

-0.43 ×10

-2

4

CeO2

-0.53 ×10

-2

M n2O3
Nb2O5

5

V2O5

-0.59 ×10

-2

RuO2

6

Rh2O3

-1.12 ×10

-2

7

Mn2O3

-2.48 ×10

-2

CeO2
WO3

8

RuO2

-2.67 ×10

-2

9

WO3

-2.73 ×10

-2

10

Ru

-3.25 ×10

-2

Cr2O3

0.98

Rh2O3

0.96

0.90

CeO2

SampleInside

1.02

T iO2

0.94

200

0

2

400

800

1200

Irradiationchamber

PhotodiodeWater pressure 9.0e-4Pa

1.04
Relative reflectance

1600

Dose/(J/mm )2

4╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩

NIKON CORPORATION
Corporate Planning Department
Month Day, Year

Apparatus

NIKON CORPORATION
Corporate Planning Department
Month Day, Year䊂䊷䉺Ყセ

InsideFolding mirror෻኿₸ᄌൻ䋨ᾖᐲ෸䈶᳓⫳᳇࿶ଐሽᕈ䋩 (Ru(Ru-cap)

SR-beam
Photo
diode

1.E-06

1.E-05

1.E-04

1.E-03

1.E-021.02

0.0E+00

1.0e-5Pa
1.0e-4Pa
9.0e-4Pa

0.98

1.0e-2Pa050-4.0E-05

2

SAGASAGA-LS

0.96

Q-MS

-2.0E-05
drop rate/(J/mm)

Zr filter
Lord lock chamber

1.5e-6Pa

1.00

Relative reflectanceSampleRelative reflectance-6.0E-05-8.0E-05

a=1.53e-5
b=2.25e-4-1.0E-04-1.2E-04-1.4E-04

100

150

200
Water gas pressure/Pa

Irradiationchamber2

Dose/(J/mm )R/Ro=(a*ln(pressure)+b)*dose
1.E-06

SuperALIS䉋䉍⒖⸳

1.E-05

1.E-04

1.E-03

1.E-021.02

BL18䋺2008ᐕኾ↪BL䈫䈚䈩ㆇ↪㐿ᆎ䇯

0.0E+00

1.00

1.0e-6Pa
1.0e-5Pa
1.0e-4Pa
9.0e-4Pa

0.98

SuperALIS-2.0E-05-4.0E-05

2

drop rate/(J/mm)

SR-beam:SAGA
SAGA--LS BL18Light intensity:70mW/mm2
Light dose:1500J/mm2
Background Pressure:5e-7Pa

Relative reflectance

SAGA Light Source

Reference

Dose/(J/mm )3╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩

Relative reflectance

Relative reflectance

V2O5

1.00

0.94

Q-MS

Water pressure 9.0e-4Pa

SiO2
T iO2

0.96

Zr filter
Lord lock chamber

Irradiationchamber

1.02

0.98

SR-beam:NewSUBARU
NewSUBARU BL9(long undulator)
Light intensity:250mW/mm2
Light dose:1500J/mm2
Background Pressure:2e-7Pa

Relative reflectance

Water pressure 1.0e-4Pa
1.04

Carbon coated mirrors

SampleSR-beam:SuperALIS
SuperALIS SBL2
Light intensity:24mW/mm2
Light dose:180J/mm2
Background Pressure:5e-7Pa

lock
Q-MS

SR-beam-6.0E-05-8.0E-05

a=1.44e-5
b=1.96e-4

0.96-1.0E-04-1.2E-04-1.4E-04

0

50

100

150

200

Water gas pressure/Pa

2

Dose/(J/mm )SRశଐሽᕈ䈲䈭䈇䇯ᾖ኿䊂䊷䉺䈲৻⥌
5

6╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩㸫㸫NIKON CORPORATION
Corporate Planning Department
Month Day, YearNIKON CORPORATION
Corporate Planning Department
Month Day, Year

Capping Layer and Si Layer⠴㉄ൻᕈਃᰴ⹏ଔ

Durability - ion radius ratio
0.12

SAGA-LS

1.00

NewSUBARU

0.96
0.94

㹢䊂䊷䉺䈱ା㗬ᕈ䈏ะ਄䇯

0.92oxidant infiltration

0.90
0

400

800

Metal ion

0.1

SAGA-LS䈮䈩㐳ᤨ㑆ᾖ኿䈮䉋䉎⠴㉄ൻᕈ⹏ଔ䈏น⢻䈮䈭䈦䈢䇯

0.98

1200

Cap
Si

1600

2

Dose/(J/mm )Relative reflectancechangeRelative reflectance

1.02

0.08

All samples

0.06

good caps

0.04
0.02
0

-0.02

0.4

0.6

0.8

1

-0.04
Metal/Oxygen ion radius ratio

Oxygen ion

Tight packing
octahedron
contributes to antioxidation property.

Durability - Si oxidation

1.02

Si oxidation change/%

Relative reflectance20

ᰴ਎ઍEUV㔺శⵝ⟎䋨䊚䊤䊷䋩䈱⠴㉄ൻᕈ䈏੹ᓟ䈱⹏ଔኻ⽎䈫䈭䉎䇯
1.00
Sample1㹢ᄙጀ⤑଻⼔ጀ䈱ㆡᱜൻ䇯Sample2
Sample3

Si oxidation> Reflectance drop

10

0.98

0
0

400

800

1200

1600

-3

0

3

6

Relative reflectance drop2

Dose/(J/mm )78╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩

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RuO2 Layer ᭴ㅧ䉁䈫䉄Grazing Incidence
X-ray Diffraction
Al (200)¾㪪㪩శ䉕૶䈇䇮㉄ൻ‛㪜㪬㪭䊚䊤䋭଻⼔ጀ䈱⠴㉄ൻᕈ䉕⹏ଔ䈚䈢䋨䊚䊤䋭଻⼔ጀ䈱⠴㉄ൻᕈ䉕⹏ଔ䈚䈢䋨㪜㪬㪭㪜㪬㪭ᾖ኿㊂ᾖ኿㊂㪈㪌㪇
㪈㪌㪇㪄㪄㪈㪍㪇㪇㪡㪆㫄㫄㪉䋩䇯㪪㪩శ䉕૶䈇䇮㉄ൻ‛㪜㪬㪭㪈㪍㪇㪇㪡㪆㫄㫄㪉䋩䇯

1.2

Measurement䋺
Measurement䋺
SpringSpring-8
BL46XU, BL18B2

Normalized Intensity

1¾㪫㫀㪦㪉㪃㩷㪭㪉㪦㪌㪃㩷㪚㫉㪉㪦㪊㪃㩷㪥㪹㪉㪦㪌㪃㩷㪚㪼㪦㪉㪄଻⼔ጀ䈏⦟䈇⠴㉄ൻᕈ䉕␜䈚䈢䇯

No RuOx peaks

0.8
Mo (112)

0.6

Mo (110)Al (111)

Al (222)¾⠴㉄ൻᕈ䈱䉋䈇଻⼔ጀ䈲౎㕙૕䈱ኒ䈭᭴ㅧ䉕ᜬ䈦䈩䈇䉎䇯
⠴㉄ൻᕈ䈱䉋䈇଻⼔ጀ䈲౎㕙૕䈱ኒ䈭᭴ㅧ䉕ᜬ䈦䈩䈇䉎䇯䈖䈱᭴ㅧ䈏䇮㉄ൻᕈ‛⾰䈱᜛ᢔ㒐ᱛ䊶⠴㉄ൻᕈᡷༀ䈮ነਈ䈚䈩䈇䉎䈫⠨䈋䉌䉏䉎䇯Al (220)
Al (113)

0.4

Amorphous

0.2¾㪩㫌㪦㪉 ଻⼔ጀ䈱ዪᚲ᭴ㅧ⸃ᨆ䉕ⴕ䈦䈢䇯 䉝䊝䊦䊐䉜䉴⁁䈪౎㕙૕㪍㈩૏䈱᭴ㅧ䉕䉅䈧䈏䇮䉝䊝䊦䊐䉜䉴⁁䈪౎㕙૕㪍ห᭴ㅧ䈱ઁ䈱㉄ൻ⤑䈾䈬䇮⦟䈇⠴㉄ൻᕈ䉕␜䈘䈭䈎䈦䈢 䋨⛮⛯⺞ᩏਛ䋩䇯

0

RuO2

10

20

30

40

50

60

70

2ș/°

¾㪪㪘㪞㪘㪄
㪙㪣㪈㪏䋩䉕ᣂ⸳䈚䈢䇯䋩䉕ᣂ⸳䈚䈢䇯
㪪㪘㪞㪘㪄㪣㪪䈮ኾ↪䊎䊷䊤䉟䊮䋨㪣㪪䈮ኾ↪䊎䊷䊤䉟䊮䋨㪙㪣㪈㪏ᾖ኿ታ㛎䉕㐿ᆎ䈚䇮ᾖ኿⚿ᨐ䈲ઁ䈱㪪㪩䈪䈱⚿ᨐ䈫৻⥌䈚䈢䇯ᾖ኿ታ㛎䉕㐿ᆎ䈚䇮ᾖ኿⚿ᨐ䈲ઁ䈱㪪㪩䈪䈱⚿ᨐ䈫৻⥌䈚䈢䇯ኾ↪㪙㪣䈮䉋䉍㐳ᦼ㑆䈱⠴ਭ⹜㛎䊶㜞♖ᐲ䊂䊷䉺䈱ขᓧ䈏น⢻䈫䈭䉍䇮㊂↥↪㪜㪬㪭㪜㪬㪭㔺శⵝ⟎㔺శⵝ⟎ኾ↪㪙㪣䈮䉋䉍㐳ᦼ㑆䈱⠴ਭ⹜㛎䊶㜞♖ᐲ䊂䊷䉺䈱ขᓧ䈏น⢻䈫䈭䉍䇮㊂↥↪
䈱శቇ♽䋨䊚䊤䊷䋩㐿⊒䈱ടㅦ䈏น⢻䈫⠨䈋䈩䈇䉎䇯

Radial Distribution Function from EXAFS
Ru/O ion radius ratio䋺 ⚂0.6ห䈛᭴ㅧ䉕ᜬ䈧ઁ䈱଻⼔ጀ䈮Ყ䈼䇮RuO2ጀ䈱⠴㉄ൻᕈ䈲ૐ䈎䈦䈢䇯ઁ䈱factor䉕⠨䈋䉎ᔅⷐ䈏䈅䉎䇯

Short rangeorder䋺
6 coordinationoctahedron.

ᧄ⎇ⓥ䈱৻ㇱ䈲䇮ᭂ┵⚡ᄖ✢䋨EUV䋩㔺శ䉲䉴䊁䊛㐿⊒䊒䊨䉳䉢䉪䊃䈱৻Ⅳ䈪ᭂ┵⚡ᄖ✢㔺శ䉲䉴䊁䊛ᛛⴚ㐿⊒ᯏ᭴䋨䋩䈏ᣂ䉣䊈䊦䉩䊷䊶↥ᬺᛛⴚ✚ว㐿⊒ᯏ᭴䋨䋩䈎䉌ᆔ⸤䉕ฃ䈔䈩䇮ታᣉ䈚䈢䉅䈱䈪䈜䇯
910╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩╙䋳࿁਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷⎇ⓥᚑᨐႎ๔ળ䋨䋰䋹㪆䋰䋳㪆䋰䋹䋩㸫㸫᪂タ㌾ X ⥺ࣅ࣮࣒ࣛ࢖ࣥ(BL10)ࡢ⌧≧ྜྷᮧ኱௓஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮(SAGA-LS)బ㈡┴❧஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮(SAGA Light Source)࡛ࡣࠊ┴᭷ࣅ࣮࣒ࣛ࢖
ࣥᩚഛࡢ➨ϩᮇィ⏬࡟ᇶ࡙ࡁࠊྍኚ೫ගᆺ࢔ࣥࢪ࣮ࣗࣞࢱࢆ฼⏝ࡍࡿ㌾ X ⥺ࣅ࣮࣒ࣛ࢖ࣥ
(BL10)ࡢᘓタࢆ㐍ࡵ࡚࠸ࡿࠋBL10 ࡣࠊྍኚ೫ග࢔ࣥࢪ࣮ࣗࣞࢱ࠿ࡽࡢගࢆࠊ୙➼้⥺㛫㝸ᖹ㠃ᅇᢡ᱁Ꮚࢆ⏝࠸ࡓྍኚ೫ゅᘧᩳධᑕศගჾ࡟ࡼࡗ࡚ศගࡋࠊ30㹼1200eV ࡢ࢚ࢿࣝࢠ࣮
⠊ᅖ࡛ࡢ฼⏝ࡍࡿࣅ࣮࣒ࣛ࢖࡛ࣥ࠶ࡿࠋ࢔ࣥࢪ࣮ࣗࣞࢱࡣ APPLE-II ᆺࢆ᥇⏝ࡋࠊ4 ิ࠿ࡽ࡞ࡿ☢ᴟิࡢ㓄⨨ࢆኚ᭦ࡍࡿࡇ࡜࡛Ỉᖹ㹼ᴃ෇ࠊ෇㹼ᆶ┤࡜࠸ࡗࡓከᵝ࡞೫ගࢆᣢࡘගࡀ฼
⏝ྍ⬟࡛࠶ࡿࠋ࢔ࣥࢪ࣮ࣗࣞࢱ☢ᴟิࡣ࿘ᮇ㛗ࡀ 72mmࠊ࿘ᮇᩘࡀ 28ࠊ᭱ᑠࢠࣕࢵࣉ್
30mm ࡛࠶ࡿࠋࡲࡓࠊ࢚ࣥࢻࢫࢸ࣮ࢩࣙࣥ࡟タ⨨ࡍࡿᐇ㦂⿦⨨࡜ࡋ࡚ࡣࠊග㟁Ꮚ㢧ᚤ㙾(PEEM)ࠊ㧗ศゎ⬟ゅᗘศゎග㟁Ꮚศග⿦⨨(ARPES)ࠊ➼ࢆணᐃࡋ࡚࠸ࡿࠋ
ᖹᡂ 18 ᖺᗘࡼࡾࣅ࣮࣒ࣛ࢖ࣥගᏛ⣔ࡢࢹࢨ࢖ࣥ࠿ࡽ㛤ጞࡋࡓᮏィ⏬ࡣࠊᖹᡂ 19 ᖺᗘ࡟
BL ᶵჾࡢヲ⣽タィཬࡧ〇సࡢⓎὀࠊ᫖ᖺᮎࡲ࡛࡟᪋タ࡬ࡢᶵჾタ⨨ཬࡧ┿✵❧ࡕୖࡆࡀ᏶
஢ࡋࠊ㡰ㄪ࡟㐍ᤖࡋ࡚࠸ࡿࠋ⌧ᅾࡣࠊᖹᡂ 21 ᖺᗘ༙ࡤࡢ࣮ࣘࢨ࣮࡬ࡢ౪⏝㛤ጞࢆ┠ᣦࡋ࡚ࠊࣅ࣮࣒ࣛ࢖ࣥཬࡧ

ᐃ⿦⨨ࡢ❧ࡕୖࡆ࣭ㄪᩚసᴗࢆ㐍ࡵ࡚࠸ࡿࠋᮏⓎ⾲࡛ࡣࠊࣅ࣮࣒ࣛ࢖ࣥࡢヲ⣽ࢹࢨ࢖ࣥࡸᘓタࡢ≧ἣࠊ❧ࡕୖࡆ࣭ㄪᩚసᴗࡢ㏵୰⤒㐣࡟ࡘ࠸࡚ሗ࿌ࡍࡿࠋ
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㸫㸫㸫㸫᪂ X ⥺฼⏝ࣅ࣮࣒ࣛ࢖ࣥ㸦BL11㸧ࡢ❧ୖࡆ≧ἣᒸᓥᩄᾈ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮ࣅ࣮࣒ࣛ࢖ࣥ BL11 ࡣᖹᡂ 20 ᖺᗘ࡟᪂ࡓ࡟タ⨨ࡉࢀࡓ೫ྥ
㟁☢▼ࢆග※࡜ࡍࡿ X ⥺ࣅ࣮࣒ࣛ࢖࡛ࣥ࠶ࡿ㸬ᮏᖺ 3 ᭶ࡼࡾ
XAFSᐃࡢ୍⯡࣮ࣘࢨ࣮࡬ࡢ౪⏝ࡀ㛤ጞࡉࢀ࡚࠸ࡿ㸬ᮏࣅ࣮࣒ࣛ࢖ࣥࡣ BL15 ࡜ྠᵝ࡟ Si(111)⤖ᬗࢆ⏝࠸ࡓ 2 ⤖ᬗศගჾࢆ
タ⨨ࡋ㸪2.1 ࠿ࡽ 23keV ⛬ᗘࡢ X ⥺ࢆ฼⏝ࡍࡿࡇ࡜ࡀ࡛ࡁࡿ㸬ᐇ㦂ࣁࢵࢳࡣ๓ᚋ 2 ⟠ᡤ㸦➨ 1 ᐇ㦂ࣁࢵࢳ㸪➨ 2 ᐇ㦂ࣁࢵࢳ㸧࡟ศ㞳ࡋ࡚ᘓタࡉࢀ࡚࠸ࡿ㸬ࡇࢀࡽᐇ㦂ࣁࢵࢳࡢ㛫࡟ࡣ㞟ග࣑࣮ࣛࢆタ⨨ࡍࡿணᐃ࡛㸪➨ 2 ᐇ㦂ࣁࢵࢳ࡟࠾࠸࡚ࡣ㞟ගࡋࡓX ⥺ࢆ฼⏝ࡍࡿࡇ࡜ࡀྍ⬟࡛࠶ࡿ㸬ᮏࣅ࣮࣒ࣛ࢖࡛ࣥࡣ୺࡟XAFS ࡸᑠゅᩓ஘➼ࡢ X ⥺ࢆ฼⏝ࡋࡓỗ⏝ⓗ࡞ᐇ㦂ࡀ⾜࠼ࡿࡼ࠺࡟࡞ࡿ㸬ࡲࡓ㸪2 ࡘࡢᐇ㦂ࣁࢵࢳࡢ㛫࡟タ⨨ࡉࢀࡓ┿✵ࣃࢫࢆ฼⏝ࡋ࡚㸪࣓࢝ࣛ㛗ࡀ 10m ௨ୖࡢ㉸ᑠゅᩓ஘ࡀ⾜࠼ࡿࡼ࠺࡟࡞ࡿࡶࡢ୍ࡘࡢ≉ᚩ࡛࠶ࡿ㸬
ᮏⓎ⾲࡛ࡣ㸪ࣅ࣮࣒ࣛ࢖ࣥࡢᛶ⬟ࡸ௒ᚋࡢᩚഛィ⏬࡟ࡘ࠸࡚ሗ࿌ࡍࡿ㸬

ᅗ BL11 ➨ 1 ᐇ㦂ࣁࢵࢳࡢᵝᏊ㸦ୖ㸧࡜タ⨨ࡉࢀࡓ XAFS ᐃࢩࢫࢸ࣒㸦ୗ㸧㸬

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㸫㸫㸫㸫┴᭷ࣅ࣮࣒ࣛ࢖ࣥ㸦BL9㸪BL12㸪BL15㸧ࡢ⌧≧ᒸᓥᩄᾈ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮
3 ᮏࡢ┴᭷ࣅ࣮࣒ࣛ࢖ࣥ㸦BL9㸪BL12㸪BL15㸧ࡣ㸪బ㈡┴ࡢ➨ 1 ᮇᩚഛィ⏬࡛ᩚഛࡉࢀࡓ
ࡢࡶ࡛㸪2006 ᖺᗘࡢ౪⏝㛤ጞᙜึ࠿ࡽࡢ㐠⏝ࡀ⾜ࢃࢀ࡚࠸ࡿ㸬ࡇࢀࡽࡢࣅ࣮࣒ࣛ࢖ࣥࡣ඲
࡚೫ྥ㟁☢▼ࢆග※࡜ࡋ࡚࠸ࡿ㸬BL9 ࡣ BL9a ࡜ BL9b ࡢ 2 ᮏࡢศᒱࣅ࣮࣒ࣛ࢖࡛ࣥᵓᡂࡉ
ࢀ࡚࠸ࡿ㸬BL9a ࡣศගჾࡣタ⨨ࡉࢀ࡚࠾ࡽࡎ㸪ⓑⰍගࢆ฼⏝ࡍࡿࣅ࣮࣒ࣛ࢖࡛ࣥ࠶ࡿ㸬ࢩࣥࢡࣟࢺࣟࣥගࡣࢡ࣮࣮࣒ࣜࣥࣝ࡟ᑟ࠿ࢀ㸪ⓑⰍࢺ࣏ࢢࣛࣇ㸪↷ᑕ࡞࡝ࡢᐇ㦂ࡀ⾜ࢃࢀ࡚࠸ࡿ㸬2008 ᖺᗘࡢቑ⠏᏶஢ᚋ࡟ࡣࣅ࣮࣒ࣛ࢖ࣥࡢᘏ㛗ࡀ⾜ࢃࢀ㸪ࡑࢀ࡟క࠸㸪ࢡ࣮࣮࣒ࣜࣥࣝࡢ⛣タࡶ⾜ࢃࢀࡓ㸬BL9b ࡣ 10㹼50eV ࡢ┿✵⣸እගࢆ฼⏝ࡍࡿࡇ࡜ࡀྍ⬟࡛࠶ࡿ㸬BL12ࡣ 40㹼1500eV ⛬ᗘࡢ㌾ X ⥺ࢆ฼⏝ࡍࡿࡇ࡜ࡢྍ⬟࡞ࣅ࣮࣒ࣛ࢖࡛ࣥ࠶ࡿ㸬ᐇ㦂⿦⨨࡟ࡣග㟁Ꮚศග⿦⨨࡜㌾㹖⥺྾཰ศග⿦⨨ࡀタ⨨ࡉࢀ࡚࠾ࡾ㸪ධᑕග࢚ࢿࣝࢠ࣮ࢆኚ໬ࡉࡏ࡞ࡀࡽ
ග㟁Ꮚࢫ࣌ࢡࢺࣝࢆᐃࡍࡿ῝ࡉ᪉ྥศᯒࡸ㌾ X ⥺྾཰ࢫ࣌ࢡࢺࣝࡢ೫ගゅᗘ౫Ꮡᛶࢆ

ᐃࡍࡿࡇ࡜࡟ࡼࡾᇶᯈୖ᭷ᶵศᏊࡢ㓄ྥᐃ࡞࡝ࢆ⾜࠺ࡇ࡜ࡀྍ⬟࡛࠶ࡿ㸬BL15 ࡣ 2.1 ࠿ࡽ 23keV ⛬ᗘࡢ X ⥺ࢆ฼⏝ࡍࡿࡇ࡜ࡢ࡛ࡁࡿ X ⥺ࣅ࣮࣒ࣛ࢖࡛ࣥ࠶ࡿ㸬ᐇ㦂⿦⨨ࡣᐇ㦂ࣁࢵࢳࡢ୰࡟タ⨨ࡉࢀ࡚࠸ࡿ㸬ᮏࣅ࣮࣒ࣛ࢖࡛ࣥࡣ㸪XAFS㸪⺯ගศᯒ㸪⢊ᮎ X ⥺ᅇᢡ㸪⾲㠃X ⥺ᅇᢡ㸪X ⥺ᑠゅᩓ஘➼㸪X ⥺ࢆ฼⏝ࡋࡓᵝࠎ࡞ᐇ㦂ࡀ⾜࠼ࡿࡼ࠺࡟࡞ࡗ࡚࠸ࡿ㸬
ᮏⓎ⾲࡛ࡣ㸪ࣅ࣮࣒ࣛ࢖ࣥ࡜ᐇ㦂⿦⨨ࡢ⌧≧㸪᭱㏆ࡢᡂᯝ㸪ࡑࡋ࡚௒ᚋࡢᩚഛィ⏬࡟ࡘ࠸࡚ሗ࿌ࡍࡿ㸬
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㸫㸫㸫㸫㌾㹖⥺ෆẆศගἲ࡟ࡼࡿ⢊ᮎࢲ࢖ࣖࣔࣥࢻ⾲㠃ࡢ◊✲℩ᡞᒣᐶஅࠊᑠᯘⱥ୍ࠊᒸᓥᩄᾈ
஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮㸦SAGA-LS㸧ࢲ࢖ࣖࣔࣥࢻࡣᩘከࡃࡢඃࢀࡓ≉㉁ࢆᣢࡘࡓࡵࠊᵝࠎ࡞ศ㔝࡛฼⏝ࡉࢀ࡚࠸ࡿࠋࡲࡓࠊ
ᚤ⢏Ꮚ໬࡟ࡼࡾࠊ᪂つᮦᩱࡸࣂ࢖࢜ࢭࣥࢧ࣮ࠊ⸆๣࣮࢟ࣕࣜ➼࡬ࡢᛂ⏝ࢆ┠ᣦࡋࡓ◊✲ࡶ┒ࢇ࡟࡞ࡗ࡚࠸ࡿࠋࡑࡢࡼ࠺࡞ᚤ⢏Ꮚ໬࡟ࡼࡾࠊ⾲㠃ࡢᛶ㉁ࡀࡲࡍࡲࡍ㔜せ࡞ᙺ๭ࢆ࠸࡚╔┠ࡋࠊᅛయ࠾ࡼࡧ⢊ᮎࢲ࢖ࣖࣔࣥࢻ࡟ᑐࡋ࡚྾཰➃㏆ഐ X⥺ᚤ⣽ᵓ㐀㸦NEXAFS㸧ศගᐃࢆ⾜࠸ࠊⅣ⣲ K Ẇ㏆ഐࡢ✵‽఩≧ែࡀ␗࡞ࡿ஦ࢆ☜ㄆࡋࡓࠋ

excitonIntensity (Arb. unit)ᯝࡓࡍࠋᮏ◊✲࡛ࡣࠊᚤ⢏Ꮚࡢ⢏ᚄ࡜⾲㠃㟁Ꮚ≧ែ࡜ࡢ㛵㐃࡟ࡘV*second-band-gap

(a)

(b)
280

ᅗ㸯(ୖ)࡟ࠊBL12 ࡟࡚⾜ࡗࡓⅣ⣲ K Ẇ㡿ᇦ NEXAFS ࢫ࣌ࢡࢺࣝ

290

300

310

Photon Energy (eV)

NEXAFS ࡢࠊ࡝ࡕࡽ࡟࠾࠸࡚ࡶ C1sЍV*㌶㐨㑄⛣⏤᮶ࡢࣆ࣮ࢡཬ
ࡧ࢚࢟ࢩࢺࣥ⏤᮶ࣆ࣮ࢡ㸦289.2eV㸧ࠊࣂࣥࢻࢠࣕࢵࣉ
㸦302.5eV㸧ࡀほࡉࢀࠊࡇࢀࡲ࡛ࡢሗ࿌౛࡜ྠᵝࡢࢫ࣌ࢡࢺࣝᙧ

Intensity (Arb. unit)

excitonࢆ♧ࡍࠋ(a)ᅛయࢲ࢖ࣖࣔࣥࢻ(100)࠾ࡼࡧ(b)⢊ᮎࢲ࢖ࣖࣔࣥࢻࡢCA

B(a)࿕૕䉻䉟䊟䊝䊮䊄(b)☳ᧃ䉻䉟䊟䊝䊮䊄≧࡛࠶ࡿࡇ࡜ࡀ☜ㄆࡉࢀࡓࠋḟ࡟ࠊప࢚ࢿࣝࢠ࣮㡿ᇦ㸦ᅗ㸯(ୗ)㸧࡟╔┠ࡍࡿ࡜ࠊ(a),(b)࡝ࡕࡽ࡟ࡶࠊC1sЍS*㌶㐨㑄⛣⏤᮶࡟ᖐᒓࡉࢀࡿࣆ࣮ࢡ AࠊB ࡀほࡉࢀࡓࠋ୍᪉࡛ࠊࢩࣙࣝࢲ࣮C ௜㏆ࡢࢫ࣌ࢡࢺࣝࡢᙧ≧ࡀࠊ⤖ᬗ࡜ᚤ⢏Ꮚ࡜࡛ࡣ␗࡞ࡗ࡚࠸ࡿࡇ࡜
ࡀศ࠿ࡗࡓࠋ௒ᚋࠊᚤ⢏Ꮚ໬࡟ࡼࡿ㟁Ꮚ≧ែࡢኚ໬ࡸ⢏Ꮚࢧ࢖ࢬ౫Ꮡᛶ࡟㛵ࡋ࡚ࠊග㟁Ꮚศග

282

284

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㸫㸫

288

290

ᅗ(ୖ) (a)ᅛయ࠾ࡼࡧ(b)⢊ᮎࢲ࢖ࣖࣔࣥ
ࢻࡢ NEXAFS ࢫ࣌ࢡࢺࣝ㸦Ⅳ⣲ K Ẇ㏆
ഐ㸧ࠋ (ୗ)ప࢚ࢿࣝࢠ࣮㡿ᇦࡢᣑ኱ᅗࠋᐃ⤖ᯝ࡜ేࡏ࡚ゎᯒࢆ㐍ࡵ࡚࠸ࡃணᐃ࡛࠶ࡿࠋ



286

Photon Energy (eV)㸫㸫㉸ఏᑟ࢘࢕ࢢ࣮ࣛࣅ࣮࣒ࣛ࢖ࣥ㸦%/㸧タ⨨ィ⏬࡟ࡘ࠸࡚
Ἑᮏṇ⚽ࠊ㝮㇂࿴Ⴙࠊᒸᓥᩄ㐀஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮  ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮࡛ࡣࠊ┴᭷ࣅ࣮࣒ࣛ࢖ࣥࡢ➨ϩᮇᩚഛィ⏬ࡀ㐍⾜୰࡛ࠊᖹᡂ  ᖺᗘࡲ࡛࡟ᐇ㦂◊✲Ჷࡢቑ⠏࡜ࣅ࣮࣒ࣛ࢖ࣥ %/㸦ྍኚ೫ග࢔ࣥࢪ࣮ࣗࣞࢱ
ࣅ࣮࣒ࣛ࢖ࣥ㸧࠾ࡼࡧ┴᭷ࣅ࣮࣒ࣛ࢖ࣥ %/㸦◳ ; ⥺೫ྥ㟁☢▼ࣅ࣮࣒ࣛ࢖ࣥ㸧ࡢ  ᮏࡢቑタࡀ᏶஢ࡋ࡚࠸ࡿࠋࣅ࣮࣒ࣛ࢖ࣥ %/ ࡣᮏィ⏬࡛ᩚഛࡍࡿ  ᮏ┠ࡢࣅ࣮࣒ࣛ࢖࡛ࣥࠊ
㉸ఏᑟ࢘࢕ࢢ࣮ࣛࢆᤄධග※࡜ࡋࠊNH9 ⛬ᗘࡲ࡛ࡢ㧗࢚ࢿࣝࢠ࣮㡿ᇦࢆ࢝ࣂ࣮ࡍࡿࡇ
࡜࡛ࠊࢯࣇࢺ࣐ࢸࣜ࢔ࣝࡸࣂ࢖࢜ศ㔝➼࡛ࡢ᪂つ࣮ࣘࢨ࣮⋓ᚓࡀᮇᚅࡉࢀࡿࠋ⌧ᅾࠊᤄධ
ග※ࢆྵࡴࣅ࣮࣒ࣛ࢖ࣥ඲యࡢ௙ᵝ⟇ᐃ࣭タィࡀ࡯ࡰ⤊஢ࡋࠊᖹᡂ  ᖺᗘ୰ࡢᘓタ᏶஢࡜ᖹᡂ  ᖺᗘࡢ᪩࠸᫬ᮇ࡛ࡢඹ⏝㛤ጞࢆ┠ᣦࡋ࡚సᴗࢆ㐍ࡵ࡚࠸ࡿࠋᮏⓎ⾲࡛ࡣࠊ⟇ᐃࡉࢀࡓࣅ࣮࣒ࣛ࢖ࣥ௙ᵝࡢᴫ␎࡟ࡘ࠸࡚㏙࡭ࡿࠋ  ᮏࣅ࣮࣒ࣛ࢖࡛ࣥග※࡟᥇⏝ࡍࡿ㉸ఏᑟ࢘࢕ࢢ࣮ࣛࡣࠊ࣓࢖࣏࣮ࣥࣝࡀ㉸ఏᑟ㟁☢▼ࠊ୧➃ࡢࢧ࢖ࢻ࣏࣮ࣝࡀỌஂ☢▼࠿ࡽᵓᡂࡉࢀࡿࠋ࣓࢖࣏࣮ࣥࣝࡢ☢ሙᙉᗘࢆ ࢸࢫࣛ࡜
ࡍࡿࡇ࡜࡛ࠊ᪤Ꮡࡢ೫ྥ㟁☢▼ග※ࡼࡾ㧗࢚ࢿࣝࢠ࣮ഃ࡟ࢩࣇࢺࡋࡓ㸦⮫⏺࢚ࢿࣝࢠ࣮
NH9㸧ࢫ࣌ࢡࢺࣝࡢᨺᑕගࢆᚓࡿࡇ࡜ࡀ࡛ࡁࠊࡑࡢ ; ⥺ᙉᗘࡣ NH9 ࡛⣙  ᱆ࠊ
NH9 ࡛  ᱆௨ୖ㧗ࡃ࡞ࡿࡇ࡜ࡀぢ㎸ࡲࢀࡿࠋ  ࣅ࣮࣒ࣛ࢖ࣥගᏛ⣔ࡣࠊ6L  ࢆศග⤖ᬗ࡜ࡍࡿ  ⤖ᬗศගჾ࡜ࠊ‴᭤෇⟄ᆺ㞟ග࣑࣮࡛ࣛᵓᡂࡍࡿணᐃ࡛࠶ࡿࠋᐇ㦂ࢫࢸ࣮ࢩࣙࣥࡣࠊࢱࣥࣃࢡ㉁⤖ᬗ ; ⥺ᵓ㐀ゎᯒ⏝࡜ࠊ;⥺࢖࣓࣮ࢪࣥࢢ࣭㧗࢚ࢿࣝࢠ࣮;$)6 ⏝ࡢ  ࡘࡢࣁࢵࢳࢆ࣑࣮ࣛୗὶ࡟ࢱࣥࢹ࣒࡟㓄⨨ࡋࠊ㞟ග࣑࣮ࣛࡢどᩳゅ࡜᭤⋡ࢆኚ᭦ࡍࡿࡇ࡜࡛ࠊ୧ࣁࢵࢳෆ࡟㞟ගࣅ࣮࣒ࢆ౪⤥ࡍࡿࡇ࡜ࡀ
࡛ࡁࡿࠋࡲࡓࠊศගჾୖὶ࡟ගᏛࣁࢵࢳࢆタ⨨ࡋࠊⓑⰍࢺ࣏ࢢࣛࣇ࢕➼ࡢ฼⏝ᐇ㦂ࡶྍ⬟
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㸫㸫㸫㸫

6$*$/6%/ ࡟࠾ࡅࡿ '(,ᐃࢩࢫࢸ࣒

㝮㇂࿴Ⴙ ࠊ⡿ᒣ᫂⏨ ࠊἙᮏṇ⚽ ࠊᒸᓥᩄᾈ ࠊᖹ஭ᗣᬕ ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮
ᰴᘧ఍♫᪥❧〇సᡤᇶ♏◊✲ᡤᅇᢡᙉㄪ࢖࣓࣮ࢪࣥࢢἲ 'LIIUDFWLRQ(QKDQFHG,PDJLQJ'(, ࡣࠊ఩┦࢖࣓࣮ࢪࣥࢢἲ
࡜࿧ࡤࢀࡿ ; ⥺᧜ീἲࡢ  ࡘ࡛ࠊ㏆ᖺὀ┠ࢆ㞟ࡵ㛤Ⓨࡀ㐍ࡵࡽࢀ࡚࠸ࡿᡭἲ࡛࠶ࡿࠋᚑ᮶ࡢ
㏱㐣ᆺ ; ⥺᧜ീἲࠊ࠸ࢃࡺࡿࣞࣥࢺࢤࣥ෗┿ࡀ≀㉁ࡢ྾཰ᕪࢆࢥࣥࢺࣛࢫࢺ࡜ࡋ࡚ീࢆᚓࡿࠋ
ࡇࢀ࡟ᑐࡋࠊ'(, ࡛ࡣࠊヨᩱ㏱㐣ᚋࡢീࢆ࢔ࢼࣛ࢖ࢨ࣮⤖ᬗࢆ⏝࠸࡚ศᯒࡍࡿࡇ࡜࡛ࠊᒅᢡ
࡟ࡼࡿࢥࣥࢺࣛࢫࢺࢆ⤖ീࡋࠊ఩┦ࢩࣇࢺࢆྍど໬ࡍࡿࠋࡇࢀ࡟ࡼࡾࠊ⏕యヨᩱࡸ㧗ศᏊᮦᩱࡢࡼ࠺࡟㍍ඖ⣲࡛ᵓᡂࡉࢀ྾཰ࡢ㠀ᖖ࡟ᑡ࡞࠸≀㉁࡟ࡘ࠸࡚㧗ឤᗘࡢほᐹࡀྍ⬟࡟࡞ࡿࠋ ᡃࠎࡣࠊ6$*$/6 ࡢ◳ ; ⥺ࣅ࣮࣒ࣛ࢖ࣥ %/ ࡟࠾࠸࡚ࠊࡇࡢ '(,ᐃࢩࢫࢸ࣒ࡢᩚഛࢆ

⾜࠸ࠊࡇࡢᛶ⬟ホ౯ᐇ㦂ࢆ⾜ࡗࡓࠋࣔࣀࢡ࣓࣮ࣟࢱ࠿ࡽࡢධᑕ ; ⥺ࡣ 6L ࡢ㠀ᑐ⛠཯ᑕ⤖ᬗࢆ⏝࠸࡚⦪᪉ྥࡢࣅ࣮࣒ࢧ࢖ࢬࡀᣑ኱ࡉࢀ࡚ヨᩱ࡟ධᑕࡍࡿࠋヨᩱࢆ㏱㐣ࡋࡓ࢖࣓࣮ࢪࡣ
6L ࡢᑐ⛠⤖ᬗ࡟ࡼࡾศᯒࡉࢀ࡚ &&' ࣓࡛࢝ࣛ⏬ീࢆྲྀᚓࡍࡿࠋヨᩱࡣ rᅇ㌿ࡍࡿࢫࢸ࣮ࢪ࡟タ⨨ࡉࢀ࡚࠾ࡾࠊࡇࢀࢆᅇ㌿ࡉࡏ࡞ࡀࡽ㡰ḟ࢖࣓࣮ࢪࣥࢢࢆ⾜࠺ࡇ࡜࡟ࡼࡾ '(,&7 ീࢆ᧜ᙳࡍࡿࡇ࡜ࡀ࡛ࡁࡿࠋ
 Ⓨ⾲࡛ࡣ %/ ࡟タ⨨ࡉࢀࡓ '(,ᐃࢩࢫࢸ࣒ࡢᴫせ࡜ࡇࢀࢆ⏝࠸ࡓ ᐃ⤖ᯝ࡟ࡘ࠸࡚⤂

௓ࡍࡿࠋ
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㸫㸫

Diffraction Enhanced Imaging (DEI)
2-D detectorᓥ᧪䈱ㅘㆊX✢௝䊶䊶䊶ኒᐲ䈱䉮䊮䊃䊤䉴䊃䈱ૐ䈇ㇱಽ䈱ឬ↹䈲⧰ᚻ଀䋺 㑐▵䈱エ㛽⚵❱䇮⢖䇮䈏䉖⚦⢩╬䈱↢૕⚵❱᳖䇮㜞ಽሶ╬䈱シర⚛䈎䉌䈭䉎‛⾰SAGA-LS BL15䈮
䈮䈍䈔䉎DEI᷹ ቯ 䉲䉴 䊁䊛

SampleAnalyzer crystal

n=1-įLȕn: ዮ᛬₸䇮į䈲૏⋧䉲䊐䊃䇮ȕ䈲ๆ෼䈮ነਈ䈜䉎

SAGA-LS BL15䈮䈮䈍 䈔 䉎
DEI᷹᷹ቯ䉲䉴䊁䊛

(b) DEI image⋡⊛䋺 SAGA-LS䈱⎬X✢䊎䊷䊛䊤䉟䊮
BL15䈮䈍䈇䈩DEI᷹ቯⵝ⟎䉕ዉ౉䈚䇮DEI᷹ቯ䉕⏕┙䈜䉎䇯

DEI᷹
᷹ቯⵝ⟎CCD䉦䊜䊤
䊶⸃௝ᐲ 4872 pixel㬍3248 pixel䊶᦭ല౉ജ䉣䊥䉝 36 mm㬍24 mm
䊶1䊏䉪䉶䊦䈅䈢䉍䈱ಽ⸃⢻ ȝPએਅ䊶䉲䊮䉼䊧䊷䉺 GaO䇮2䌾30keV(5䌾15keV䈮ᦨㆡൻ)TC slit 2
TC slit 1

Storage ring⹜ᢱ࿁ォᯏ᭴
䊶⹜ᢱ䉕360㫦࿁ォ(CT᠟ᓇ䈮↪䈇䉎)䊶౞ᩇ PPĳ 䈱వ┵ㇱ䈮⹜ᢱ䉕࿕ቯ

Experimental hutch♖ኒ࿁ォⵝ⟎
䊶ᦨዊⷺᐲㅍ䉍0.01arcsec
䊶䉝䊅䊤䉟䉱⚿᥏䈱೙ᓮ䈮૶↪

DEI᷹ቯ䉲䉴䊁䊛

᭴ㅧ⑼ቇ䉟䊜䊷䉳䊮䉫ಽᨆ䊎䊷䊛䊤䉟䊮

Clear contrast!

⹜ᢱ䈎䉌䈱ㅘㆊX✢௝䉕䉝䊅䊤䉟䉱⚿᥏䈪ⷺᐲಽᨆĺį䈱ⓨ㑆ᓸಽ䉕ᬌ಴シర⚛䈪䈲į䈲ȕ䈱2䌾3ᩴᄢ䈐䈇ĺ㜞ᗵᐲ䈱᠟ᓇ䈏น⢻Si(111) double crystal
monochromator(a) Transmission image

Diffraction Enhanced Imaging (DEI) ᴺ㓈⼱๺༹1䇮
䇮☨ጊ᣿↵2䇮䇮ᴡᧄᱜ⑲1䇮䇮ጟፉᢅᶈ1䇮䇮ᐔ ੗ ᐽ ᥍ 1
1SAGA-LS䇮
䇮2ᣣ
ᣣ┙ၮ␆⎇

Total reflection mirror

Less contrast!
Sample૏⋧䉮䊮䊃䊤䉴䊃䉟䊜䊷䉳䊮䉫ᴺ
Ј X✢䈱૏⋧䈱䈝䉏䉕นⷞൻ䈜䉎䈖䈫䈪䇮シర⚛䈮ኻ䈚䈩㜞ᗵᐲ䈮䈭䉎X✢ๆ෼ಽశ (XAFS)ⰯశX✢ಽᨆ
X✢࿁᛬(☳ᧃ䇮⭯⤑╬)䉟䊜䊷䉳䊮䉫(䊃䊘䉫䊤䊐䉞䇮DEI╬)
ዊⷺX✢ᢔੂ

ኻ⒓䊶㕖ኻ⒓Si⚿᥏䊶㕖ኻ⒓⚿᥏䈲䊎䊷䊛᜛ᄢ䇮ኻ⒓⚿᥏䈲䉝䊅䊤䉟䉱䈮૶↪
䊶෻኿䈲220䇮111䈱2ㅢ䉍䉕↪ᗧ䊶㕖ኻ⒓ⷺ 111䈲6.7㫦䇮220䈲11㫦䊶14keVᤨ䈮౉኿䊎䊷䊛䈱❑᏷䉕⚂10୚䈮䇯(❑᏷10mmએ਄䈱䊎䊷䊛䉕೑↪น⢻)䊶⚿᥏䈱ᱡ䉕䈭䈒䈜䈢䉄⚿᥏ਔ஥䈮ḴടᎿ䇯

BL15䈱䊎䊷䊛․ᕈ

DEI᷹ቯ⚿ᨐ䉝䊅䊤䉟䉱䊷⚿᥏䈱䊨䉾䉨䊮䉫䈮䉋䉎௝䈱ᄌൻ㕖ኻ⒓⚿᥏䈮౉኿䈜䉎䊐䉤䊃䊮䊐䊤䉾䉪䉴᜛ᄢᓟ䈱䊎䊷䊛ᢿ㕙(ฦ↹௝䈱᣿ᐲ䈲䉥䊷䊃䉴䉬䊷䊦䈪⴫␜)

10
10
10
10
10

8

6

40 mm
4

2

0

0

5

10

15
Energy (keV)

20

25

30

(b) 䊏䊷䉪

(a) ૐⷺ஥

60 mm
X✢䈱䉣䊈䊦䉩䊷䋺 14 keV䊎䊷䊛᜛ᄢ䇮䉝䊅䊤䉟䉱⚿᥏䈮䈲Si(111)䉕૶↪

Intensity

2

Incident flux (count/sec/300mA/mm )䉰䊮䊒䊦䋺 䊎䊆䊷䊦⚌
10

10

(c)

(a)
(b)

14 keV䈪䈲䇮4x107 photon/sec/mm2䈱䊐䉤䊃䊮䈏౉኿䈜䉎
(⫾Ⓧ䊥䊮䉫㔚ᵹ୯300 mA឵▚)(c) 㜞ⷺ஥

㸫㸫

Angle

䉁 䈫䉄

DEI᷹ቯ⚿ᨐ
Phase gradient image

DEI CT䈮䉋䉎ᢿ㕙௝૏⋧௝䈱⸘▚) ( x, y )

2S

O ³

M x ( x, y )dx

SAGA-LS䈱⎬X✢䊎䊷䊛䊤䉟䊮BL15䈮DEI᷹ቯⵝ⟎䉕ዉ౉䈚䈢䇯䊎䊆䊷䊦⚌䇮⊒ᵃ䉴䉼䊨䊷䊦䈭䈬䈱㜞ಽሶ᧚ᢱ䈱DEI CT䈱᠟ᓇ䉕ⴕ䈦䈢䇯䈖䈱⚿ᨐ䇮䈖䈱䉋䈉䈭シర⚛䈎䉌䈭䉎᧚ᢱ䈱ౝㇱ᭴ㅧ䉕᣿⍎䈮ⷰኤ䈜䉎䈖䈫䈏䈪䈐䈢䇯O : ‫ޓ‬X✢ߩᵄ㐳䊎䊆䊷䊦⚌ⷺᐲ䈱䈝䉏䈱นⷞൻM x ( x, y )䉰䊮䊒䊦䉕࿁ォ䈘䈞䈭䈏䉌㗅ᰴ᠟ᓇ䉕ⴕ䈇䇮䈖䉏䉕วᚑ䈜䉎䈖䈫䈪䇮‛૕䈱CT௝䉕ᓧ䉎੹ᓟ䈱⸘↹¦ k T k I ( x, y , T k )¦ I ( x, y , T )k᷹ቯᤨ㑆䈱⍴❗(ᤨಽഀ᷹ቯ䈭䈬䈱น⢻ᕈ䉕ត䉎)䉋䉍㜞䉣䊈䊦䉩䊷X✢䈱೑↪(ㅘㆊജ䈱Ⴧᄢ䈮䉋䉍䇮᷹ቯ⹜ᢱ䉕ᄢ䈐䈒䈪䈐䉎)k㜞ಽሶ᧚ᢱ䈱ౝㇱ᭴ㅧ䉕᣿⍎䈮ⷰኤ䈜䉎䈖䈫䈏䈪䈐䈢

T k : ‫⚿࡯ࠩࠗ࡜࠽ࠕޓ‬᥏ߩ ⷺᐲ
I : ‫ߩߣߏ࡞࠮ࠢࡇޓ‬ᒝᐲ⊒ᵃ䉴䉼䊨䊷䊦

㸫㸫࢖࢜ࣥὀධ 6L& ⤖ᬗࡢ㌿఩ᵓ㐀ほᐹ▼ᆅ⪔ኴᮁ኱㇂ுኴᕝᡞΎ∞ᖹ஭ᗣᬕ
஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮ⓑ⚄ᬛ㛗⏫ಙ἞ᰴ ࢖࢜ࣥࢸࢡࣀࢭࣥࢱ࣮
ḟୡ௦ࣃ࣮࣡ࢹࣂ࢖ࢫ࡜ࡋ࡚ 6L& ࢆᐇ⏝໬ࡍࡿࡓࡵ࡟࢖࢜ࣥ
ὀධฎ⌮ࡣ୙ྍḞ࡛࠶ࡿࡀࠊࡑࢀ࡟ࡼࡗ࡚Ḟ㝗ᐦᗘࡀቑ኱ࡍࡿ
࡜⪃࠼ࡽࢀࡿࠋ࡜ࡃ࡟ࠊ࢖࢜ࣥὀධ࡟ࡼࡗ࡚⤖ᬗᡂ㛗᫬࠿ࡽᏑᅾࡍࡿ㌿఩ࡀ࡝ࡢࡼ࠺࡟ᵓ㐀ኚ໬ࡍࡿࡢ࠿㔜せ࡛࠶ࡾࠊ⯆࿡῝࠸ࠋࡑࡇ࡛ࠊ; ⥺ࢺ࣏ࢢࣛࣇ࢕࣮࡟ࡼࡗ࡚࢖࢜ࣥὀධࡋࡓ 6L& ⤖ᬗࡢḞ㝗ᵓ㐀ࢆほᐹࡋࡓࠋ࢖࢜ࣥࢸࢡࣀࢭࣥࢱ࣮ࡢ࢖࢜ࣥຍ㏿

0.5 mmჾࢆ⏝࠸࡚ࠊ6L& ࢙࢘ࣁ࣮  ࢖ࣥࢳᚄPP ཌ ࡢ୍㒊࡟$O࢖࢜ࣥࢆὀධࡋࡓࠋὀධᚋࠊ6$*$/6%/$ ࡛ⓑⰍ ; ⥺ࢺ࣏ࢢࣛࣇ࢕࣮ほᐹࢆ⾜ࡗࡓࠋ ᅇᢡᩬⅬࡢ࢖࢜ࣥᮍὀධ㡿ᇦ࡜ὀධ㡿ᇦࡢࢺ࣏ࢢࣛࣇ࢕࣮ീࢆᅗ࡟♧ࡍࠋᮍὀධ㡿ᇦ࡛ࡣࠊล≧㌿఩ ➽≧ ࡜ࡽࡏࢇ㌿఩ ࢻࢵࢺ≧ ࡀΰࡌࡗ࡚࠸ࡓࠋࡋ࠿ࡋࠊ
ὀධ㡿ᇦ࡛ࡣᵝᏊࡀ␗࡞ࡾࠊ࢖࣓࣮ࢪࢧ࢖ࢬ wP ๓ᚋࡢ࣐࢖
ࢡࣟࣃ࢖ࣉḞ㝗ࡀከࡃぢࡽࢀࡓࠋ$O ࢖࢜ࣥࡢ⾪✺࡟ࡼࡗ࡚㌿఩ࡢ࣮࣍ࣟࢥ࢔ࡀᦆയࢆཷࡅ࡚✵Ὕ໬ࡋࠊ኱ᆺḞ㝗 ࣐࢖ࢡࣟࣃ࢖
ࣉ ࡬࡜Ⓨ㐩ࡍࡿࡢ࡛ࡣ࡞࠸࠿࡜⪃࠼ࡽࢀࡿࠋ
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㸫㸫

0.5 mmᅗ㻌 SiC ⤖ᬗ 004 ᅇᢡᩬⅬ䛾䜲䜸䞁ᮍὀධ㡿ᇦ㻔ୖ㻕䛸ὀධ㡿ᇦ㻔ୗ㻕䛾䝖䝫䜾䝷䝣䜱䞊ീ䚹㸫㸫

6$*$/6⵳✚ࣜࣥࢢࡢᴫせỤ⏣ⱱࠊᒾᓮ⬟ᑛࠊ㧗ᯘ㞝୍ࠊ㔠Ᏻ㐩ኵ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮㸦6$*$/6㸧ᅜෆ࡟࠾࠸࡚ࣁ࣮ࢻ ; ⥺㡿ᇦ࡟㐩ࡍࡿᨺᑕගⓎ⏕ࡀྍ⬟࡞ *H9 ௨ୖࡢ㟁Ꮚ⵳✚ࣜࣥࢢࡢ࠺ࡕࠊእ㒊࣮ࣘࢨ࣮฼⏝ࢆ๓ᥦ࡜ࡋࡓࡶࡢࡣࠊ ྎ㸦63ULQJࠊ.(.3)$5ࠊ6$*$/6㸧ࡢࡳ࡛࠶ࡾࠊࡇࡢ࠺ࡕ 6$*$/6 ࡣරᗜ┴ࡢ 63ULQJ ௨す၏୍ࡢ᪋タ࡛࠶ࡿࠋ
6$*$/6 ග※ຍ㏿ჾࡣ *H9 㟁Ꮚ⵳✚ࣜࣥࢢ࡜ 0H9 ධᑕ⏝ࣜࢽ࢔ࢵࢡ࠿ࡽᡂࡿࠋࣜࢽ
࢔ࢵࢡ࠿ࡽ㟁Ꮚࣅ࣮࣒ࢆ⵳✚ࣜࣥࢢ࡟ධᑕࠊ㌶㐨ࢆಖᣢࡋࡓࡲࡲ *H9 ࡟ຍ㏿ࡋࡓᚋࠊ⵳
✚≧ែࢆ⥔ᣢࡋ࣮ࣘࢨ࣮࡟ᨺᑕගࢆ౪⤥ࡍࡿࠋ⵳✚ࣜࣥࢢࡣ࿘㛗 P ࡛ࠊ ྎࡢ೫ྥ㟁☢
▼࡜  ࡘࡢ  ᴟ㟁☢▼࠿ࡽ࡞ࡿᇶᮏ☢▼㓄ิࡀ  ᅇ⧞ࡾ㏉ࡉࢀࡓᵓ㐀࡜࡞ࡗ࡚࠸ࡿࠋ
⵳✚ࣜࣥࢢࡢᇶᮏග※ࡣ᭤⋡༙ᚄ P ☢ሙᙉᗘ 7 ࡢ೫ྥ㟁☢▼࡛࠶ࡿࠋ⮫⏺࢚ࢿࣝࢠ࣮ࡣ NH9 ࡛ࠊ࣮ࣘࢨ࣮฼⏝ᐇ⦼࡜ࡋ࡚ࡣ┿✵⣸እ㡿ᇦ࠿ࡽ NH9 ⛬ᗘࡢࣁ࣮ࢻ ; ⥺㡿ᇦ࡟ཬࡪࠋࡲࡓࡇࢀ࡟ຍ࠼┿✵⣸እ㸫㌾ ; ⥺㡿ᇦࡢ㧗㍤ᗘග※࡜ࡋ࡚ྍኚ೫ග $33/(ϩᆺ࢔ࣥࢪ࣮ࣗࣞࢱ బ㈡┴ ཬࡧỈᖹ೫ග࢔ࣥࢪ࣮ࣗࣞࢱ㸦బ㈡኱㸧ࡀ⵳✚ࣜࣥࢢ㛗┤⥺㒊㸦ࡑࢀ
ࡒࢀ /6/6㸧࡟タ⨨ࡉࢀ࡚࠸ࡿࠋࡲࡓ⌧ᅾࠊࡼࡾ㧗࢚ࢿࣝࢠ࣮ࡢ ; ⥺ࢽ࣮ࢬ࡟ᛂ࠼ࡿࡓࡵࠊ
㉸ఏᑟ࢘࢕ࢢ࣮ࣛࡢ㛤Ⓨࢆ㐍ࡵ࡚࠸ࡿࠋ☢ሙᙉᗘ 7ࠊ⮫⏺࢚ࢿࣝࢠ࣮NH9 ࡛⌧೫ྥ㟁☢
▼ࡢගᏊ࢚ࢿࣝࢠ࣮ୖ㝈࠿ࡽ NH9 ⛬ᗘࡲ࡛ࡢ㧗࢚ࢿࣝࢠ࣮㡿ᇦࢆ࢝ࣂ࣮ࡍࡿィ⏬࡛࠶ࡿࠋ ᖺᗘタィ〇సࡀᮏ᱁໬ࡋ  ᖺ᫓タ⨨ࢆ⾜࠺ணᐃ࡛࠶ࡿࠋ
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㸫㸫㸫㸫࢔ࣥࢪ࣮ࣗࣞࢱࢠࣕࢵࣉኚ᭦࡟㉳ᅉࡍࡿ COD ⿵ṇ࡜ࣅ࣮࣒ࣛ࢖࣮ࣥࣘࢨไᚚ⣔࠿ࡽࡢࢠࣕࢵࣉไᚚࢩࢫࢸ࣒
ᒾᓮ⬟ᑛ㸪㔠Ᏻ㐩ኵ㸪㧗ᯘ㞝୍, ᒾᓮ⬟ᑛ, Ụ⏣ⱱ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮
SAGA-LS 㟁Ꮚ⵳✚ࣜࣥࢢ㛗┤⥺㒊 LS3 ࡟タ⨨ࡉࢀࡓྍኚ೫ග࢔ࣥࢪ࣮ࣗࣞࢱ APPLE-2 ࡢࢠࣕࢵࣉኚ᭦࡟క࠺㌶㐨ኚືࢆᢚไࡍࡿࡓࡵࠊࣇ࢕࣮ࢻࣇ࢛࣮࣡ࢻ᪉ᘧࡢ COD(Closed Orbit
Distortion)⿵ṇࢩࢫࢸ࣒ࢆᵓ⠏ࡋࡓࠋࢩࢫࢸ࣒ᵓ⠏࡟࠶ࡓࡾࠊ࢔ࣥࢪ࣮ࣗࣞࢱࢠࣕࢵࣉ࠾ࡼ
ࡧ఩┦ኚ᭦࡟క࠺ COD ኚ఩ࢆィࡋࠊࢲ࢖࣏࣮ࣝᡂศࡢ୙ṇ☢ሙࡢ኱ࡁࡉࢆホ౯ࡋࡓࠋࡲ

ࡓ࢔ࣥࢪ࣮ࣗࣞࢱୖୗὶࡢࢫࢸ࢔ࣜࣥࢢ㟁☢▼࡟ࡼࡿ࢟ࢵࢡゅ࡟ᑐࡋ࡚ࡶྠᵝ࡟ COD ࡢኚ఩ࡼࡾᙉᗘࢆホ౯ࡋࡓࠋ⿵ṇࡢࡓࡵࡢࢫࢸ࢔ࣜࣥࢢ㟁☢▼㟁※タᐃ್ࡣࠊྛ BPM ࡛ࡢ CODኚ఩ࡀ᭱ᑠ࡟࡞ࡿࡼ࠺࡟᭱ᑠ 2 ஌ἲ࡟ࡼࡾỴᐃࡋࡓࠋࣉࣛࢼ࣮࣮ࣔࢻ࡟࠾࠸࡚ COD ⿵ṇࢆࡋ࡞࠸ሙྜࠊỈᖹ࣭ᆶ┤᪉ྥ࡜ࡶྛ BPM ࡢᶆ‽೫ᕪࡢ᭱኱࡛ 100Pm ⛬ᗘ࡛࠶ࡗࡓࡀࠊ⿵ṇ࡟ࡼࡾྛ᪉ྥ࡜ࡶ 10Pm ௨ୗ࡜ࡍࡿࡇ࡜ࡀ࡛ࡁࡓࠋྛ఩┦࡟ᑐࡋ࡚ࡶྠᵝࡢィࢆ⾜࠸ࠊ௵ពࡢࢠࣕࢵࣉ࠾ࡼࡧ఩┦࡟ᑐࡋ࡚㌶㐨⿵ṇࢆ⾜࠺ࢸ࣮ࣈࣝࢆసᡂࡋࡓࠋ࢔ࣥࢪ࣮ࣗࣞࢱୖୗ
ὶࡢࢫࢸ࢔ࣜࣥࢢ㟁☢▼㟁※ไᚚࢧ࣮ࣂࡣࠊ࢔ࣥࢪ࣮ࣗࣞࢱࡢࢠࣕࢵࣉ࠾ࡼࡧ఩┦᝟ሗࢆ
10Hz ࡛ㄞࡳྲྀࡾࠊ⿵ṇࢸ࣮ࣈࣝ࡟ᚑ࠸ᚲせ࡞㟁※タᐃ್ࢆ⮬ືⓗ࡟ฟຊࡋ࡚࠸ࡿࠋ
SAGA-LS ࡟࠾࠸࡚ࡣຍ㏿ჾไᚚ⣔࡜ࣅ࣮࣒ࣛ࢖ࣥไᚚ⣔㛫ࡣࣇ࢓࢖࢔ࣇ࢛࣮ࣝ࡟ࡼࡾࢿ
ࢵࢺ࣮࣡ࢡࡀ㐽᩿ࡉࢀ࡚࠸ࡿࠋࣅ࣮࣒ࣛ࢖࣮ࣥࣘࢨ࡟ࡼࡿࢠࣕࢵࣉࡢኚ᭦チྍ࡟ᑐࡋ࡚ࡣࠊ
≉ᐃࡢ 1 ྎࡢࣅ࣮࣒ࣛ࢖ࣥ PC ࠿ࡽ≉ᐃࡢຍ㏿ჾ PC ࡢࢩࣥࢢ࣏࣮ࣝࢺ࡟ᑐࡍࡿ࢔ࢡࢭࢫࡢࡳࢆチྍࡋࠊࢭ࢟ࣗࣜࢸ࢕ࣞ࣋ࣝࡢ⥔ᣢࡀྍ⬟࡞ TCP/IP ࡟ࡼࡿᑓ⏝ࡢ࢔ࣉࣜࢣ࣮ࢩࣙࣥࢆ
㛤Ⓨࡋࡓࠋ

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㸫㸫㸫㸫ᨺᑕගᖸ΅ィ࡟ࡼࡿࣅ࣮࣒ࢧ࢖ࢬ
1ᐃ㧗ᯘ㞝୍ 1, 㔠Ᏻ㐩ኵ 1, ᒾᓮ⬟ᑛ 1, Ụ⏣ⱱ 1, ෠ቑከ႐ኵ 1, ኱ᇉⱥ᫂ 2஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮, 2 ி㒔኱Ꮫ࢚ࢿࣝࢠ࣮⌮ᕤᏛ◊✲ᡤ ⵳✚ࣜࣥࢢ࡟࠾ࡅࡿࣅ࣮࣒ࢧ࢖ࢬࡀタィ࡝࠾ࡾᐇ⌧ࡉࢀ࡚࠸ࡿ࠿࡝࠺࠿ࢆ☜ㄆࡍࡿࡓࡵ㸪ᨺᑕගᖸ΅ィࢆ⏝࠸࡚ࣅ࣮࣒ࢧ࢖ࢬࡢ

ᐃࢆ⾜ࡗࡓ㸬ᖸ΅ィࡣ 10 ᩘᖺ๓࡟ KEK-PF ࡢ୕ᶫ࡟ࡼࡗ࡚㛤Ⓨࡉࢀࡓᡭἲ࡛࠶ࡿ㸬ᨺᑕගࡢྍどගᡂศࢆ⏝࠸㸪ࢲࣈࣝࢫࣜࢵࢺ࡟ࡼࡗ࡚⏕ࡌࡓᖸ΅⦤ࡢࢥࣥࢺࣛࢫࢺ(ࣆ࣮ࢡ࡜ࢹ࢕ࢵࣉࡢᙉᗘẚ)࠿ࡽࣅ࣮࣒ࢧ࢖ࢬࢆỴᐃࡍࡿࡇ࡜ࡀ࡛
ࡁࡿ㸬ᖸ΅ィࡣ㸪᫖ᖺᗘᩚഛࡋࡓᨺᑕගࣔࢽࢱ⏝ࣅ࣮࣒ࣛ࢖ࣥ BL20 ࡢᬯᐊෆ࡟ᵓ⠏ࡋࡓ㸬ᬯᐊෆࡲ࡛㍺㏦ࡉࢀ࡚ࡁࡓྍどගࢆ㸪ࢲࣈࣝࢫࣜࢵࢺ㸪࢔ࢡ࣐ࣟࢸ࢕ࢵࢡࣞࣥࢬ(↔Ⅼ㊥㞳 f㸻500)㸪ND ࣇ࢕ࣝࢱ࣮㸪ᣑ኱ࣞࣥࢬ㸪೫ගࣇ࢕ࣝࢱ࣮(V೫ගࢆ㑅ᢥ)㸪ࣂࣥࢻࣃࢫࣇ࢕ࣝࢱ
࣮(500r5 nm)ࡢ㡰࡟㏱㐣ࡉࡏ㸪CCD ࣓࢝ࣛୖ࡟ᖸ΅⦤࡜ࡋ࡚⤖ീࡉࡏࡓ㸬ᖸ΅⦤ࡢᙧ≧ࢆ⌮ㄽᘧ࡜ࣇ࢕ࢵࢺࡋ࡚ゎᯒࡋࡓ⤖ᯝ㸪Ỉᖹ࣭ᆶ┤᪉ྥࡢࣅ࣮࣒ࢧ࢖ࢬࡣࡑࢀࡒࢀ㸪Vx㸻215r3
Pm㸪Vy㸻59r2 Pm ࡜ồࡲࡗࡓ㸬ィ⟬್ࡣVx㸻203 Pm㸪Vy㸻52 Pm ࡛࠶ࡾ㸪࡯ࡰ୍⮴ࡋ࡚࠸ࡿࡇ࡜ࡀ☜ㄆࡉࢀࡓ㸬࡞࠾㸪௒ᅇࡢ࠸㸬௒ᚋ㸪ᐃ࡛ࡣ㸪ᨺᑕගྲྀฟࡋ࣑࣮ࣛࡢ⇕ኚᙧࡣ⪃៖ࡉࢀ࡚࠸࡞

ᐃ⢭ᗘࢆྥୖࡉࡏࡿࡓࡵ㸪࣑࣮ࣛࡢ⇕ኚᙧࢆග⥺㏣㊧ἲ࡛ホ౯ࡍࡿࡓࡵࡢࣁࣝ

ࢺ࣐࣐ࣥࢫࢡࢆ BL20 ࡟タ⨨ࡍࡿணᐃ࡛࠶ࡿ㸬
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㸫㸫᡼኿శᐓᷤ⸘䈮䉋䉎䊎䊷䊛䉰䉟䉵᷹ቯ⋡⊛
SAGA-LS䈱⫾Ⓧ䊎䊷䊛䈱⸻ᢿ  䊎䊷䊛䉰䉟䉵䈱᷹ቯේℂ㜞ᨋ㓶৻A), ㊄቟㆐ᄦA), ጤፒ⢻ዅA), ᳯ↰⨃A), ౷Ⴧᄙ༑ᄦA), ᄢ၂⧷᣿B)A)਻Ꮊ䉲䊮䉪䊨䊃䊨䊮శ⎇ⓥ䉶䊮䉺䊷B)੩ㇺᄢቇ䉣䊈䊦䉩䊷ℂᎿቇ⎇ⓥᚲ

䊎䊷䊛䉰䉟䉵䈏ዊ䈘䈇႐วᐓᷤ❋䈱䉮䊮䊃䊤䉴䊃䈏䉋䈇(䊏䊷䉪䈫䊂䉞䉾䊒䈱ᒝᐲᲧ ᄢ)䊎䊷䊛䉰䉟䉵䈏ᄢ䈐䈇႐วᐓᷤ❋䈱䉮䊮䊃䊤䉴䊃䈏䉒䉎䈇(䊏䊷䉪䈫䊂䉞䉾䊒䈱ᒝᐲᲧ ዊ)⫾Ⓧ㔚ᵹ୯ 5 mAታ㛎ⵝ⟎ ᡼኿శ(นⷞశ)䊝䊆䉺↪䊎䊷䊛䊤䉟䊮᷹ቯ⚿ᨐ

BL20䈱ᥧቶౝ

᳓ᐔᣇะ
(D 5 mm)ု⋥ᣇะ
(D 10 mm)2

ℂ⺰ᑼ I ( z )䊧䊮䉵: ὶὐ〒㔌 f 500 mm
஍శ䊐䉞䊦䉺䊷: V஍శ䉕ㆬᛯ䊋䊮䊄䊌䉴䊐䉞䊦䉺䊷: 500 r 5 nm䊎䊷䊛䉰䉟䉵

E xH§ 'p ·1¸
 ¨K
1  N ¨© p ¸¹

2

Vy

OL
SD

1 §1·
ln¨ ¸
2 ¨© J ¸¹

sin zzz x䉁䈢䈲y, J: visibility (䉮䊮䊃䊤䉴䊃䉕⴫䈜㊂)
w: 䉴䊥䉾䊃䈱᏷, O: శ䈱ᵄ㐳, R: 䉴䊥䉾䊃䈫⚿௝ὐ䈫䈱〒㔌,
D: 䉻䊑䊦䉴䊥䉾䊃䈱㑆㓒, L: శḮὐ䈫䉴䊥䉾䊃䈫䈱〒㔌⫾Ⓧ䊥䊮䉫䈱䊎䊷䊛䉰䉟䉵䉕᷹ቯ䈜䉎䈢䉄䋬᡼኿శ䊝䊆䉺↪䊎䊷䊛䊤䉟䊮BL20䈱ᥧቶౝ䈮ᐓᷤ⸘䉕᭴▽䈚䈢䋮䊎䊷䊛䉰䉟䉵(䉣䊚䉾䉺䊮䉴)䈲⸘▚୯䈫䈾䈿৻⥌䈚䈩䈇䉎䈖䈫䈏⏕⹺䈘䉏䈢䋮Vy (Pm)᷹ቯ୯ 215 r 3 59 r 252⸘▚୯ 203Vx

V

sin c z䉁䈫䉄⸘▚୯䈫䈱Ყセ
Vx (Pm)

ª
·º ª
§ Sw
§ 2SD
·º
z  z 2 ¸»z  z1 ¸» «1  J cos¨
I 0 «sin c¨
¹¼ ¬
© OR
© OR
¹¼
¬

E yH

Ex, Ey: 䊔䊷䉺㑐ᢙ (Ex 1.133 m, Ey 9.763 m)
K: ಽᢔ㑐ᢙ (K 0.1704 m)'p/p: ㆇേ㊂䈵䉐䈏䉍 ('p/p 6.73u104)N
1 N(BL20: ஍ะ㔚⏛⍹5q䊎䊷䊛䊤䉟䊮) 䉣䊚䉾䉺䊮䉴H, 䉦䉾䊒䊥䊮䉫N

᷹ቯ୯
⸘▚୯

䊎䊷䊛䉰䉟䉵䈎䉌᳞䉄䈢୯䉼䊠䊷䊮᷹ቯ䈎䉌᳞䉄䈢୯੹ᓟH (nmrad)29 r 425
N
0.012 r 0.002
0.011 r 0.003

䊊䊦䊃䊙䊮䊙䉴䉪䉕↪䈇䈢శ✢ㅊ〔ᴺ䈮䉋䉎᡼኿శข಴䈚䊚䊤䊷䈱ᾲᄌᒻ䈱⵬ᱜ⻢ㄉ᡼኿శ䊝䊆䉺↪䊎䊷䊛䊤䉟䊮䈱ᑪ⸳ਗ䈶䈮ᐓᷤ⸘䈱᷹ቯ䈮㑐䈚䈩䋬KEK-PF䈱ਃᯅ೑ⴕᢎ᝼䈮䈗ᜰዉ䈇䈢䈣䈐䉁䈚䈢䋮ᷓ䈒ᗵ⻢䈇䈢䈚䉁䈜䋮㸫㸫SAGA-LS ࡟࠾ࡅࡿ࣮ࣞࢨ࣮ࢥࣥࣉࢺࣥᩓ஘࣐࢞ࣥ⥺⏕ᡂࡢ᳨ウ㔠Ᏻ㐩ኵ㸪㧗ᯘ㞝୍, ᒾᓮ⬟ᑛ, Ụ⏣ⱱ஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮
SAGA-LS ⵳✚ࣜࣥࢢ࡟࠾ࡅࡿࣅ࣮࣒࢚ࢿࣝࢠ࣮ࣔࢽࢱ࣮ࡢᵓ⠏ཬࡧᑗ᮶ⓗ࡞࣐࢞ࣥ⥺฼⏝ᐇ㦂ࢆ┠ⓗ࡜ࡋ࡚㸪࣮ࣞࢨ࣮ࢥࣥࣉࢺࣥᩓ஘(LCS)࡟ࡼࡿ࣐࢞ࣥ⥺⏕ᡂࡢ᳨ウࢆ㐍ࡵ࡚࠸ࡿ㸬≉࡟ CO2 ࣮ࣞࢨ࣮ࡢᐇ⏝ୖࡢ᭷⏝ᛶ࡟╔┠ࡋ㸪CO2 ࣮ࣞࢨ࣮ࢆ⏝࠸ࡓ LCS ᐇ㦂⣔ࡢࢹࢨ࢖ࣥ㸪࣐࢞ࣥ⥺⏕ᡂ⋡ࡢホ౯ࢆ⾜ࡗࡓ㸬⵳✚㟁Ꮚ࢚ࢿࣝࢠ࣮1.4 GeV ࡟࠾࠸࡚Ἴ㛗 10.6 Pm ࡢ CO2 ࣮ࣞࢨ࣮࡟ࡼࡿ LCS ࣐࢞ࣥ⥺ࡢ᭱኱࢚ࢿࣝࢠ࣮ࡣ 3.5 MeV ࡛࠶ࡿ㸬ࡇࢀ࡟ᑐࡋ⵳✚ࣜࣥࢢࡢ㐠ື㔞࢔ࢡࢭࣉࢱࣥࢫࡣ 14
MeV ࡛㸪LCS ࡟ࡼࡿ཯═ࢆཷࡅࡓ㟁Ꮚࡣ RF ࣂࢣࢵࢺ࠿ࡽ㋾ࡾฟࡉࢀ࡞࠸㸬ࡑࡢࡓࡵ LCS
ࡣ௚ࡢᨺᑕග฼⏝࡜ඹᏑྍ⬟࡛࠶ࡾ㸪CO2 ࣮ࣞࢨ࣮ࡢ౑⏝ࡣᖖ⏝ࡢ࣐࢞ࣥ⥺⏕ᡂ࠾ࡼࡧࣅ࣮
࣒࢚ࢿࣝࢠ࣮ࣔࢽࢱ࣮࡜ࡋ࡚ࡢ㐠⏝ୖ኱ࡁ࡞࣓ࣜࢵࢺ࡜࡞ࡿ㸬ࡲࡓ CO2 ࣮ࣞࢨ࣮ࡣ௚ࡢࣞ
࣮ࢨ࣮࡜ẚ㍑ࡋ࡚ࢥࢫࢺᙜࡓࡾࡢฟຊ࡟ඃࢀࡿࡓࡵ㸪኱ᙉᗘ࣐࢞ࣥ⥺⏕ᡂ࡟ࡶ᭷฼࡛࠶ࡿ㸬ᮏィ⏬࡛ࡣ࣮ࣞࢨ࣮ගࢆ⵳✚ࣜࣥࢢ➨ 1 ࢭࣝ೫ྥ㒊ୗὶ࣏࣮ࢺ࠿ࡽධᑕ㛗┤⥺㒊 LS8 ࡬ᑟධࡍࡿ㸬࣮ࣞࢨ࣮ග࡜㟁Ꮚࣅ࣮࣒ࡢ┦஫స⏝㡿ᇦࡢ㛗ࡉࡣ LS8 ๓ᚋࡢᅄᴟ㸪භᴟ㟁☢▼㒊ࢆྵࡵ 5 m ⛬ᗘ࡛࠶ࡿ㸬࣮ࣞࢨ࣮ගᏛ⣔࡟ࡣἼ㛗 10.6 Pm ࡢ࣮ࣞࢨ࣮ගࡢ㏱㐣ᛶ࡟ඃࢀࡿ
ZnSe 〇ࣞࣥࢬ࡜㧗཯ᑕ⋡ࡢ Si ࣑࣮ࣛࢆ⏝࠸ࡿ㸬LCS ࢖࣋ࣥࢺ࣮ࣞࢺࡣ࣮ࣞࢨ࣮ග࡜㟁Ꮚࣅ࣮࣒ࡢගᏛ㛵ᩘࢆ⏝࠸࡚࣑ࣝࣀࢩࢸ࢕ィ⟬࡟ࡼࡾホ౯ࡋࡓ㸬Ỉ෭ࣇࣛࣥࢪ࡜࣑࣮ࣛ࡟ࡼࡿῶ
⾶ࢆ⪃៖ࡋࡓᐇຠⓗ࡞࣐࢞ࣥ⥺ᙉᗘࡣ㸪㟁Ꮚࣅ࣮࣒࢝ࣞࣥࢺ 100 mA㸪࣮ࣞࢨ࣮ฟຊ 10 Wࡢ᮲௳࡛ 3×106 photons/sec (࢚ࢿࣝࢠ࣮ᖜ 10%)࡜ぢ✚ࡶࡽࢀࡓ㸬㸫㸫㸫㸫䉲㩷 䊮㩷 䊘㩷 䉳㩷 䉡㩷 䊛㩷 䈱㩷 ⸥㩷 ㍳㩷
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ળ႐㩷 㵪㩷 ਻Ꮊᄢቇකቇㇱ㩷 ⊖ᐕ⻠ၴ㩷 㵪㩷

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㸫㸫㸫㸫࠶ ࡜ ࡀ ࡁ஑ᕞ኱Ꮫ㉸㧗ᅽ㟁Ꮚ㢧ᚤ㙾ᐊ࡜஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮ࡣ㸪ࠕ㉸㧗ᅽ㟁Ꮚ㢧ᚤ㙾㸭ࢩࣥࢡࣟࢺࣟࣥᨺᑕගࡀᣅࡃࢼࣀ࣮࣡ࣝࢻࠖࢆࢸ࣮࣐࡜ࡋ࡚㸪㸰㸮㸮㸷ᖺ㸱᭶㸷᪥࡟஑ᕞ኱Ꮫ་Ꮫ㒊ⓒᖺㅮᇽ࡛ྜྠࢩ࣏ࣥࢪ࣒࢘ࢆ㛤ദࡋࡲࡋࡓࠋᮏሗ࿌᭩ࡣࡑࡢෆ
ᐜࢆࡲ࡜ࡵࡓࡶࡢ࡛ࡍࠋࡲࡓ㸪௒ᅇࡢࢩ࣏ࣥࢪ࣒࢘ࡣ㸪஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮ࡢ➨୕ᅇ◊✲ᡂᯝሗ࿌఍㸪஑ᕞ኱Ꮫ㉸㧗ᅽ㟁Ꮚ㢧ᚤ㙾ᐊࡢ➨㸯㸴㸰ᅇ HVEM ◊✲఍㸪ࡉࡽ࡟୧ᶵ㛵ࡀᩥ㒊⛉Ꮫ┬࠿ࡽཷクࡋ࡚࠸ࡿࠕඛ➃◊✲᪋タඹ⏝࢖ࣀ࣮࣋ࢩࣙࣥ๰
ฟ஦ᴗ࣭ࢼࣀࢸࢡࣀࣟࢪ࣮ࢿࢵࢺ࣮࣡ࢡࣉࣟࢢ࣒ࣛࠖࡢ஑ᕞᆅ༊ࢼࣀࢸࢡࣀࣟࢪᣐⅬࢿࢵࢺ࣮࣡ࢡ஦ᴗࡢ୍⎔࡜ࡋ࡚ᐇ᪋ࡋࡲࡋࡓࠋࡸࡸ෕㛗࡞๓⨨ࡁ࡟࡞ࡾࡲࡋࡓࡀ㸪せࡣ㸪ࢼࣀ࡛ࣞ࣋ࣝᮦᩱࡸࣂ࢖࢜ヨᩱࡢィ ࣭ศᯒࢆ⾜࠺࡟࠶ࡓࡗ࡚஫࠸࡟┦⿵ⓗ࡞㛵ಀ࡟࠶ࡿ㟁Ꮚ㢧ᚤ㙾࡜ࢩࣥࢡࣟࢺࣟࣥᨺᑕගࢆ㸪௒ᚋࡼࡾ୍ᒙ࣮ࣘࢨ࣮ࡢⓙᵝ࡟౑࠸ࡇ࡞ࡋ࡚
㡬ࡁࡓ࠸࡜ࡢᛮ࠸࡛ྜྠ㛤ദ࡟⮳ࡗࡓࡶࡢ࡛ࡍࠋ
ᙜ᪥ࡣ㸪≉ูㅮ₇㸪ᇶㄪㅮ₇ࢆࡣࡌࡵ࡜ࡍࡿ㸯㸲௳ࡢࡈㅮ₇㸪㸰㸷௳ࡢ࣏ࢫࢱ࣮Ⓨ⾲ࡀ⾜ࢃࢀࡲࡋࡓࠋ࡜ࡃ࡟㸪㟁Ꮚ㢧ᚤ㙾ࢆ⏝࠸ࡓ୕ḟඖࢼࣀࣞ࣋ࣝほᐹࡸࢩࣥࢡࣟࢺࣟࣥ
ᨺᑕගࢆ⏝࠸ࡓ in-situ ほᐹ➼ࡢ㔜せᛶ࡜᭷⏝ᛶࢆ෌ㄆ㆑ࡉࡏࡽࢀࡲࡋࡓࠋࡲࡓ㸪ᖺᗘᮎࡢከᛁ࡞᫬ᮇ࡟ࡶ࠿࠿ࢃࡽࡎ⣙ 90 ྡࡢཧຍࢆ࠸ࡓࡔࡁࡲࡋࡓࠋࡇࢀࡶࡦ࡜࠼࡟ⓙᵝ᪉ࡢࡈᮇᚅ࡜ࡈ⌮ゎࡢ㈷≀࡜῝ࡃឤㅰ⏦ࡋୖࡆࡿḟ➨࡛ࡍࠋ௒ᅇࡢࢩ࣏ࣥࢪ࣒࢘ࡣୡ⏺ⓗ࡞⤒῭༴ᶵࡀ⚾ࡓࡕࡢ⏕άࢆࡶ⬣࠿ࡋ࠿ࡡ࡞࠸ཝࡋ࠸
≧ἣࡢୗ࡛㛤ദࡉࢀࡲࡋࡓࡀ㸪ࡑࡢ≧ἣࡣ௒ࡶ⥆࠸࡚࠸ࡲࡍࠋ㟁Ꮚ㢧ᚤ㙾ࡸࢩࣥࢡࣟࢺ
ࣟࣥᨺᑕගࢆ⏝࠸ࡓࢼࣀィ ࣭ศᯒᨭ᥼࡜⤒῭༴ᶵࡢ㛫࡟ࡣ㝸ࡓࡾࡀ࠶ࡿ࠿࡟ᛮ࠼ࡲࡍࠋ
ࡋ࠿ࡋ㸪⛉Ꮫᢏ⾡ࡢᡂᯝࡀ⌧ୗࡢᐇయ⤒῭ࢆᨭ࠼㸪ࡑࡢᑗ᮶ࢆᣅࡃ࡛࠶ࢁ࠺ࡇ࡜ࢆ⪃࠼ࡲࡍ࡜㸪⚾ࡓࡕࡶࡑࡢࡇ࡜ࢆ⫢࡟㖭ࡌ࡚௒ᚋඹࡼࡾ୍ᒙⓙᵝࡢࡈᮇᚅ࡟ࡑ࠼ࡲࡍࡼ࠺ດ
ຊࡍࡿᡤᏑ࡛ࡍࠋ┈ࠎࡢࡈᣦᑟ㸪ࡈ㠴᧡ࢆᐅࡋࡃ࠾㢪࠸⏦ࡋୖࡆࡲࡍࠋ

஑ᕞࢩࣥࢡࣟࢺࣟࣥග◊✲ࢭࣥࢱ࣮๪ᡤ㛗 ᖹ஭ ᗣᬕ㸫㸫