JEITA Guideline
for F-GHG Characterization and Management

Established in October, 2011
Prepared by
Semiconductor Environment and Safety Committee

Published by
Japan Electronics and Information Technology Industries Association(JEITA)1

In case of a disagreement between the translation and the original Japaneseversion of the guideline or technical report, the original version will prevail.

2

[NOTICE]This Guideline will be approved by the Semiconductor Environment and Safety Committee in October,
2011.

[Foreword]

Global warming is thought a serious problem with which the world is faced now.

We think that an understanding the amount of F-GHG emissions is important for JEITA members in order totackle global warming. Suitable and efficient techniques to identify the amount of F-GHG emissions playsuccessful roll.

According to the 2006 edition of the IPCC (Intergovernmental Panel on Climate Change) guideline, eachdefault value for the DRE (Destruction or Removal Efficiency) of an abatement system can be utilized under
the using conditions that the system performance is measured and achieved.

This document provides following guidance to plan the emissions reduction for a user of F-GHG.
For suitable characterization of F-GHG emissions from a manufacturing tool and an abatement system
How to measure the F-GHG emissions
How to determine the frequency of the measurement
How to plan the emissions measurement
How to manage the data

We at JEITA Semiconductor Environment and Safety Committee disclose this guideline for determining
scope of F-GHG emissions characterization. In addition, we will continually update the guideline to meetengineering and management technologies improved hereafter. We hope this guideline is effectively andwidely used.

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Contents of this guideline

1 Purpose
2 Scope3 Limitations
4 Referenced Standards and Documents
5 Terminology
6 Measurement Tool
7 Characterization Method of F-GHG
8 Characterization Timing and Frequency for F-GHG Emissions
9 Characterization Data Management
10 Revision History
11 Referenced Document
12 Related Information
13 Authors and Cooperators

1 Purpose
1.1 This guideline proposes the efficient measuring method of the amount of F-GHG emissions, and the
management of characterization.
1.2 This guideline proposes the efficient measuring method of the utilization of F-GHG for manufacture
tools and the DRE of F-GHG for abatement systems in Semiconductor and Liquid crystal industries.
1.3 This guideline proposes the management method of the timing, the frequency and the measurement
procedures.
1.4 This guideline provides users with the technical know-how which can be used for the operation
management of process tools and abatement systems.

2 Scope
2.1 This guideline is applied to the characterization of the amount of emissions and the utilization of
F-GHG of the manufacturing tools in Semiconductor and Liquid crystal industries
2.2 This guideline is applied to the characterization of the amount of emissions and the DRE of F-GHG
of the abatement systems in Semiconductor and Liquid crystal industries
2.3 This guideline aims at the following seven kinds of greenhouse gas mainly used by the semiconductor
industry among FCs (Fluorinated Compounds). We denote these gases as F-GHG.
(1) CF4, (2) C2F6, (3) C3F8, (4) c-C4F8, (5) CHF3, (6) SF6, (7) NF34

3 Limitations
3.1 This guideline does not obligate characterization of F-GHG emissions, the utilization and the DRE.
3.2 This guideline is not intended to restrict characterization method of F-GHG emissions, the utilizationand the DRE.
3.3 This guideline is not intended to restrict data management of F-GHG emissions, the utilization and theDRE.
3.4 This guideline does not set targets about F-GHG emissions, the utilization, the DRE and thecharacterization frequency of F-GHG.
3.5 This guideline is not the one taking the place of the law and the restriction of the region of the user.

NOTICE: This guideline does not purport to address safety issues, if any, associated with its use. Users of
this guideline establish appropriate safety and health practices and determine the applicability of regulatoryor other limitations prior to use on their responsibility.

4 Referenced Standards and Documents

5 Terminology

Abbreviation

Standard nomenclature

1

DRE

Destruction or Removal Efficiency

2

FCs

Fluorinated Compounds

3

F-GHG

Fluorinated GreenHouse Gas

4

FT-IR

Fourier Transform - InfraRed

5

IPCC

Intergovernmental Panel on Climate Change

6

ISMI

International SEMATECH Manufacturing Initiative

7

QMS

Quadrupole Mass Spectrometer

8

SEMI

Semiconductor Equipment and Materials International

9

SEMATECH

Semiconductor Manufacturing Technology Institute

6 Measurement Tool
The certificated tool should be used for the measurement.
The outline of FT-IR and QMS illustrated as a measurement tool in this guideline should be referred to "12.1
Outlines of measuring instruments" in "12 Related Information".

57 Characterization Method of F-GHG
The amount of each emission is defined as the production of the concentration, the flow rate and time.

Vi = Ci × Fi × T
Vi: Gas volume for ith gas
T : Total time for measurement
Ci: Concentration for ith gas
Fi: Gas flow rate for ith gas

This chapter shows the characterization method.
1) Measure the F-GHG concentration.
2) Measure flow rate and time.
3) Calculate the amount of F-GHG including the by-product exhausted from the equipment and various
devices.
By the calculating of the amount of F-GHG from the result of measurement, the utilization and the DRE ofeach equipment tool can be known.
F-GHG including the by-product exhausted from F-GHG and F-GHG input to the equipment tools are objectof the measurement.
T

Vi = ∫ Ci (t ) × Fi (t )dt
0

Vi: Gas volume for ith gas
t : Measurement timing
T : Total time for measurement
Ci(t): Concentration for ith gas
Fi(t): Gas flow rate for ith gas

7.1 Measurement of F-GHG concentration
7.1.1 Generally accepted methods such as FT-IR are used for the measurement of F-GHG concentration.
7.1.2 The emissions from equipment including by-products should be measured for grasping of the F-GHG
concentration.
7.1.3 The simple characterization method by FT-IR can be used for the measurement of the F-GHG
concentration. The detail of the simple characterization method by FT-IR is shown in section 11 Referenced
Document ( 1) Simple Method for PFC Characterization using FT-IR Rev 2.20 ).

7.2 Identification of F-GHG flow rate

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7.2.1 The method for the identification of total flow amount are1) actual measurement.
2) sum of all input gas flows.
3) calculation from the result of measurement of the gas concentration at outlet of equipment, under thecondition of inactive gas (that does not change its quantity inside of equipment) by fixed flow andconcentration at inlet of equipment is supplied.
4) calculation from the result of measurement of the gas concentration at outlet of equipment, under thecondition of F-GHG such as CF4 by fixed flow and concentration is supplied. However, the caution
should be paid at the use of degradable gas like CF4 as follows. On condition that there is thepossibility of reaction in the equipment, the gas is inputted from after equipment where the temperature
properly goes down. On condition that there is no possibility of reaction in the equipment, the gas is
inputted from the inlet of the equipment.

7.3 Identification of F-GHG flow time
7.3.1 The F-GHG flow time can be identified by the time which input gases are flowing, as follows
1) Actual measurement time.
2) Duration of gas turn on.

7.4 System Configuration
Typical configuration of measurement is shown in Figure 7.4-1.

ExhaustProcess gas

FT-IR

Process tool
Dilution gas

Abatement

FT-IR

systemFigure 7.4-1 Typical configuration of measurement

7.5 Scene to be measured
A measurement sequence example is shown below.
Details of each step are discussing in following sections.

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Process tool [plasma OFF]

Flowing quantity is changed based on the peakflow and the process gas is thrown.

Abatement system [OFF]Cell Length
Optimization

FT-IR measurement

NG

Linearity Check
OK

Process tool [plasma OFF]

Process tool [plasma ON]

Abatement [OFF ]Abatement [ON]Abatement [OFF]Abatement [ON]FT-IR measure.

FT-IR measure.

FT-IR measure.

FT-IR measure.

Process Max. Load

Abatement Max. Load

Process Emission

System Emission

1) DRE for process maximum gas

2) DRE in real process

Figure 7.5-1 A measurement sequence example

7.6 Identification of the amount of F-GHG from and to process tool
7.6.1 The amount of each input F-GHG is calculated from input flow rate, flow time, and concentrationfor each input gas identified.
7.6.2 The amount of each F-GHG in exhaust is calculated from exhausted flow rate, flow time, andconcentration for each gas identified.
7.6.3 The utilization of F-GHG is calculated by the following formula from the amount of F-GHG input
to and exhausted from process tool.
F-GHG utilization = 1 - (amount of exhausted F-GHG) / (amount of F-GHG input)
The recipe must be selected as the measurements of every gas supplied to process tool are implemented. If
all F-GHG supplied in the tool could not be covered by a single recipe, the measurement to all of F-GHG
types supplied in the tool is accomplished by measuring with several recipes.
7.6.4 At least 5 wafers are processed at the measurement.
7.6.5 The utilization is calculated through all gas flowing period.

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7.6.6 The measurement of total exhaust flow amount is actual measuring and adds up individual input gas
flow amount. Since the gases such as dilution N2 of the pump don't change the volume in the process, andoccupy most part of exhaust, the volume change of process gases can be ignored.
7.6.7 Precautions at measurement of CVD cleaning
7.6.7.1 The measurement should be done at cleaning after deposition under the actual operating condition,
since the deposition in the chamber affects the F-GHG emissions including by-product.

7.7 Identification of the amount of F-GHG to and from an abatement system
7.7.1 The amount of abated F-GHG is calculated with the input flow rate, the flow time, and theconcentration for each input gas according the same method as for a process tool
7.7.2 DRE is calculated by the following formula.
DRE = 1 - (unabated F-GHG volume) / (F-GHG volume to be abated)or
DRE = 1 - (concentration of the exhausted F-GHG) / (F-GHG concentration to be abated)
7.7.3 The recipe must be selected as the measurements of every gas supplied to process tool are
implemented. If all F-GHG supplied in the tool could not be covered by a single recipe, the measurement toall of F-GHG types supplied in the tool is accomplished by measuring with several recipes.

7.8 Characterization method for DRE of plasma type abatement system
7.8.1 DRE is calculated by the following formula from the amount of F-GHG in the exhaust at plasma
on/off.
DRE=1 - (F-GHG volume at plasma on) / (F-GHG volume at plasma off)or
DRE=1 - (F-GHG concentration at plasma on) / (F-GHG concentration at plasma off)

7.9 Characterization methods for DRE of combustion type abatement system
7.9.1 Since total amount of gases such as fuel, oxygen and air, supplied to combustion unit is large, F-GHG
concentration is relatively low due to dilution effect. It is necessary to take care of selecting an appropriate
gas cell length.
The amount of F-GHG, air and fuel (become exhaust gases after burning) supplied to abatement system shallbe grasped.
F-GHG characterization should be conducted at outlet of the abatement system under combustion andnon-combustion, or at inlet and outlet of the abatement system under combustion. Measurements under
non-combustion are dangerous when the exhaust includes fuel gases.

9Abatement system
ExhaustProcess gas

FT-IR

FT-IR

Process tool

Fuel, Air

Dilution gas

Figure 7.9-1 Schematic diagram of measurement at combustion type abatement system

7.10 Characterization methods for DRE of heater type or catalyst type abatement system
7.10.1 F-GHG characterization should be conducted at inlet and outlet of the abatement system or at outletof the abatement system with the heater on/off.
7.10.2 DRE is calculated from input F-GHG volume to the abatement system and emitted F-GHG from theabatement system or emitted F-GHG volume with the heater on and off.
7.10.3 DRE is calculated from the ratio of emitted F-GHG volume with the heater on and off.
DRE = 1 - (emitted F-GHG volume at the heater on) / (emitted F-GHG volume at the heater off)

7.11 Methods of DRE for adsorption type or filtration type abatement system
7.11.1 F-GHG characterization should be conducted at inlet and outlet of the abatement system.
7.11.2 DRE (Adsorption rate, Filtration rate) is calculated from total input F-GHG to the abatement systemand emitted total F-GHG from the abatement system.
DRE = 1 - (exhausted F-GHG volume) / (input F-GHG volume)

7.12 Characterization methods of DRE for collection type equipment
7.12.1 F-GHG characterization should be conducted at inlet and outlet of the collection equipment.
7.12.2 DRE (Collection rate) is calculated from total input F-GHG to the collection equipment and emitted
total F-GHG from the collection equipment.
DRE = 1 - (emitted F-GHG volume*) / (input F-GHG volume)* Emitted F-GHG volume is equal to non-collected F-GHG volume.

7.13 Characterization methods of DRE for other type equipment
7.13.1 In the case of other equipment we described above DRE is calculated from total input F-GHG to theabatement system and emitted total F-GHG from the abatement system.
7.13.2 The case of equipment designed for F-GHG abatement other than we described above, DRE is
calculated from total input F-GHG to the abatement system and emitted total F-GHG from the abatement
system.

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7.14 By-product7.14.1 When process tools are used plasma reaction, DRE is measured following two cases.
1) At plasma off of process tool (DRE for process gas).
2) At plasma on of process tool (simultaneous DRE for process gas and by-products).
7.14.1.1 The measurement method of process tool plasma off
The measurement is implemented process tool plasma off and actual recipe process gas condition. Or, whenthe maximum load condition on the process is clear, it is possible to represent it by the result of ameasurement of the maximum load condition.
7.14.1.2 The measurement method of process tool plasma on
The measurement is implemented process tool plasma on and actual recipe process gas condition. Or, whenthe maximum load condition on the process is clear, it is possible to represent it by the result of ameasurement of the maximum load condition.

7.15 Others
Water spectrum on FT-IR should be subtracted for accurate characterization when the scrubber is connected
before measurement point and the water spectrum influences the result strongly.

8 Characterization Timing and Frequency for F-GHG Emissions
This chapter describes the timing of characterization to understand the F-GHG emissions from the tools andthe possibility (method) of frequency reduction of characterization.
8.1 Characterization Timing for F-GHG Emission
Timing of characterization should be determined from considering the shift during operation of the tool andthe change or improvement of tool conditions.
8.1.1 Basically, characterization should be conducted at the timing of application of this guideline,
installation, process condition change, application of new process recipe, and just before and after
maintenance for the process tool and/or the abatement system.
8.1.2 In addition, characterization should be conducted when the changes of the operating conditions
occurred, that is expected the utilization of the process tool or DRE of abatement system will decline.
Examples:Process recipe change (change of process gas, for example)
Modification of the process tool or abatement system

8.2 Possibility of the frequency reduction for the measurements for each tool11

8.2.1 When the recipe having the lowest utilization is recognized, we can represent the result with therecipe.
8.2.2 Some tools have recipes of different load of F-GHG. In the case, the biggest load of F-GHG recipe
should be chosen to measure. In this case the F-GHG emissions characterization would be reported larger
value than actual value (utilization has smaller value).
8.2.3 The case of process tools, the number of measurements can be reduced, when the performancestability of the process tools could be confirmed by that the utilization and emissions of byproducts. areconstant.
8.2.4 If the relationship between the fluctuation and utilization/DRE is confirmed,, the lowest value should
be applied to reduce the frequency of the measurement. For example, in the case of abatement systems, whena certain improvement of DRE after maintenance could be demonstrated by the measurement both before
and after maintenance, DRE measurement after maintenance can be reduced.

8.3 Possibility of measurement object reduction
8.3.1 The constitution of tool and abatement system are operated as a unit, outlet of the unit would bemeasured.
8.3.2 When the recipe and constitution of tool and abatement system are the same and these tool andabatement system are properly managed, and the result of either case would be applied. In the Figure 8.3-1,
as only <1> and <2> are the same, either of them would be measured.

Process equipment

Abatement
equipment

Type aaType yyType aaType aaType yyyタイプ

Type yyyType bbタイプ

Type yyManufacturer Y
Combination<1> a-yType bbType zzタイプ
Manufacturer Z<2> a-y<3> a-yy<4> b-y<5> b-zFigure 8.3-1 Combination of process tool type and abatement system type

8.4 Risk with the reduction of the measurement frequency
8.4.1 Many reporting rule require that DRE/utilization keep the given level. Since the reduction of
measurement frequency makes the term longer, when DRE/utilization did not satisfy the given level,
disadvantageous emissions should be reported tracing back a long period.

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9 Characterization Data Management
Results of characterization should be recorded to verify.
Information of the tools or the abatement systems
Process information
Recipe used at the time of data characterization
Total process run numbers or hours after the previous dry cleaning of process chamber
Measurement information
Measurement instrument name
Manufacturer’s name
Measurement method
Calibration data
All data for characterization
Recommended methods to verify reliability of F-GHG emissions characterization data as to the tools,
the abatement systems, the measurement instrument or the measurement condition
Contact information for an inquiry

10 Revision History

11 Referenced Document

1) Simple Method for PFC Characterization using FT-IR Rev 2.20
2) Guideline for Environmental Characterization of Semiconductor Process Tool
Revision 2 (ISMI Technology Transfer #06124825B-ENG (December 9, 2009))
3) Protocol for Measuring Destruction or Removal Efficiency (DRE) of FluorinatedGreenhouse Gas Abatement system in Electronics Manufacturing

12 Related Information
12.1 Outlines of measuring instruments
FT-IR and QMS are shown below as representatives of measuring instruments.
12.1.1 Fourier Transform Infrared Spectrometer
Figure12.1-1 shows FT-IR configuration. FT-IR is comprised of a light source, a sample stage, spectral
photometry (an interferometer, a detector, an amplifier, and an A/D converter), a Fourier transform unit, adata processor, and a display and recorder.

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Spectral photometryLightsourceInterferometer

A/D converter

SampleFouriertransform unit

AmplifierDetector

Data
processor

Display and recorderFigure12.1-1 Configuration of FT-IR

FT-IR measures the interferogram of the sample transmitted light in a Michelson interferometer and gets theabsorption spectrum of the sample by Fourier transforming the interferogram. Each F-GHG concentration in
the sample is measured by analyzing the spectrum data.
(1) Attention on the measurement
1) Appropriate gas cell length should be selected at the measurements referring to the Table 12.1-1
Length of gas cell and measurable range (ppm) shorter cell length should be used when we measurehigh concentrations, and longer cell length those of low concentrations. In addition, the sample gas
concentrations should be moderate appropriate range by diluting with such as nitrogen gas.

Table 12.1-1 Length of gas cell and measurable range (ppm)
Gas Name

CF4
CHF3
C2F6
C3F8
C4F8
SF6
NF3
CO
CO2
COF2
OF2
HF
SiF4
SO2
NO
NO2
N2O

Cell Length: 1 cm

Cell Length: 10 cm

Cell Length: 4 m

Lower
limit

Upper
limit

Lower
limit

Upper
limit

Lower
limit

Upper
limit

3
14
10
5
25
4
27
500
10
100
2550
125
45
15
1100
140
360

40000
40000
40000
50000
18000
3400
30000
30000
13500
10000
80000
72000
5700
12600
50000
14000
15000

0.3
1.4
1.0
0.5
2.5
0.4
2.7
50
1.0
10
255
12.5
4.5
1.5
110
14
36

4000
4000
4000
5000
1800
340
3000
3000
1350
1000
8000
7200
570
1260
5000
1400
1500

0.008
0.035
0.025
0.013
0.063
0.01
0.068
1.25
0.025
0.25
6.375
0.313
0.113
0.038
2.75
0.35
0.9

100
100
100
125
45
8.5
75
75
33.75
25
200
180
14.25
31.5
125
35
37.5

2) Some spectra may interfere mutually at measurement of gases containing multiple F-GHGs. For
minimizing quantification error, absorption spectrum for qualification should be selected not to be14

interfered by other spectra. Measurement without the range which can keep linearity between
absorption spectrum of infrared and concentration quantified, the results may have large error.
3) A simplified method for PFC measurement by FT-IR (Simple Method for PFC Characterization using
FT-IR) is recommended for easy selection of an appropriate spectrum and linearity range. In thisguideline, we strongly recommend the use of “Simple Method for PFC Characterization using FT-IR”
to aim the generalization of the methods which can identify the process gases include byproduct andwavelength of measurement.
Therefore, in this guideline, we specifically describe “Simple Method for PFC Characterization using
FT-IR”.
4) “A simplified method for PFC measurement by FT-IR” enables to set appropriate conditions for highly
accurate measurement. Because it provides information of byproduct gas, an appropriate IRabsorption spectrum for measurement and linearity range based upon input of a process gas to be
used.

12.1.2 Quadrupole Mass Spectrometer
Figure 12.1-2 shows QMS configuration. QMS is comprised by an ionization power supply, an ion source,
electrodes, a quadrupole power supply, a quadrupole electrode, a vacuum exhaust, a detector, an amplifier,an A/D converter, a data processor, and a display and recorder.

SampleIonization unit

Mass analysis unit

Ionization
power supply

Quadrupole
power supply

Ion Source

Electrodes

Quadrupoleelectrode

Detecting unit
A/D converter

Detector

AmplifierDataprocessor

Display andrecorderVacuum exhaust

Figure 12.1-2 Configuration of QMS

QMS mechanism is as follows.
1) Sample gas is ionized.
2) The Ion beam is separated depending on mass/electric charge ratio by an electric field and a magnetic
field.
3) The ratio of each molecule of the whole sample gas is estimated.

12.2 Outlines of the monitoring
Instruments other than we mentioned above are not recognized for a measuring instrument of F-GHG now.

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When an applicable technique appeared with the progress of usage or technology as a monitor for
management of F-GHG, we’ll list it below.

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13 Authors and Cooperators
Authors:
Minoru Kagino

Toshiba Corporation

Hiroshi Ito

Renesas Electronics Corporation

Isamu Namose

Seiko Epson Corporation

Yoshitomo Ogimura

Fuji Electric Co., Ltd.

Yuichi Hayashi

Fujitsu Semiconductor Ltd.

Naohiko Okamoto

Toshiba Corporation

Kunio Matsumura

Toshiba Mobile Display Co., Ltd.

Hiroshi NaruseToshiba Corporation

Mamoru Shinohara

Sony Corporation

Junichi Ishisaka

Panasonic Corporation

Shigeru Nishizawa

Fuji Electric Co., Ltd.

Nobutaka Tanaka

Sumitomo Electric Device Innovations Inc.

Hiroyuki Matsukura

Renesas Electronics Corporation

Tetsuya Kitagawa

Sony Corporation

Cooperators:
Satoshi Nitta

Otsuka Electronics Co., Ltd.

Akinori Tanaka

Fuji Electric Co., Ltd.

Takayuki Ogoshi

Renesas Electronics Corporation

Masaji Sakamura

Sanyo Semiconductor Co., Ltd.

Mineo Shimizu

Sony Corporation

Takanobu Nishida

Sharp Corporation

Takuji HorioOki Semiconductor Co., Ltd.

Kazumasa Abe

Sony Corporation

Kazuhiro Anraku

Oki Semiconductor Co., Ltd.

Yoshiaki Yamada

Renesas Electronics Corporation

Ryo Tsuchiya

Seiko Epson Corporation

Shinya Yoshioka

Elpida Memory, Inc.

Noriyoshi Takase

Mitsubishi Electric Corporation17

Revision

DatethRev. 1.0

20 October, 2011

Without permission all rights reserved* The copyright of this guideline belongs to Japan Electronics and Information Technology Industries
Association (JEITA).
Japan Electronics and Information Technology Industries Association (JEITA)Ote Center Bldg., 1-1-3, Otemachi, Chiyoda-ku, Tokyo 100-0004, Japan

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