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<<１級／化学>>問1
2.

A method for producing a substrate in which a resist layer is patterned on asurface of a base substrate, the method comprising the steps of:coating the base substrate with a chemically amplified resist to form the resist
layer covering the surface of the base substrate;irradiating a portion of the resist layer with ultraviolet light through a mask
having a predetermined pattern to generate a chemically active species in theirradiated portion;
heating the resist layer to promote a chemical reaction catalyzed by thechemically active species, so that a region whose solubility in a developer has beenchanged is formed in the resist layer; anddeveloping the resist layer with the developer so that the region of the resist
layer is selectively left or removed.

問2[0002]
Electrically conductive particles having a size of several nanometers (hereafterreferred to as nanoparticles) have chemical, optical, and electromagnetic properties thatare not observed in particles having a size larger than 1 micrometer and hence havebeen attracting attention.

Nanoparticles are expected to be applied to, for example,

catalyst materials for chemical reactions and magnetic powders for magnetic recording
media.
[0003]
In general, nanoparticles are produced by a gas-phase process or a liquid-phaseprocess.

Issues faced in both of these processes are enhancing the quality of theresultant nanoparticles and increasing the productivity. The liquid-phase process isadvantageous in that a large amount of nanoparticles can be easily produced without
the need for substrates, but has the drawbacks that impurity contamination tends tooccur and control of the nanoparticle shape is difficult.

問3[0028]
The slab obtained by casting method A has a large thickness, and the coolingrate in the metal structure is relatively low at 0.5 to 20 K/s, and thus intermetalliccompounds, such as alloy M, that crystallize in the central portion of the slab may havea size reaching 5 to 50 micrometers.

In this case, peeling may occur between theintermetallic compounds and the matrix during plastic deformation of the final
annealed plate.

In contrast, when the casting apparatus of the present embodiment isused, the slab thickness can be controlled so as to be reduced, and the cooling rate in theregions extending to a depth of one-fifth of the plate thickness below the surfaces can beincreased to 15 to 150 K/s, and therefore, the particle diameter of intermetallic
compounds in the regions at a depth of 5 to 25 micrometers below the plate surfaces ofthe final annealed plate becomes 2 micrometers or less.

問4
Example:Productionof

isopropyl(-)-cis-2-aminocyclohexanecarboxylatemethanesulfonate
To a solution of 100 mmol of isopropyl cyclohexanone-2-carboxylate in 150 ml ofmethanol, 500 mmol of ammonium formate was added.

After the resulting mixture

was heated under reflux for 24 hours, the mixture was cooled to room temperature, andthe solvent was distilled off under reduced pressure.

To the residue, 50 ml of ethyl

acetate and 30 ml of water were added, and then the organic layer was separated anddried over sodium sulfate.
residuewasAfter the solvent was removed under reduced pressure, thecrystallizedfrommethanoltogiveisopropylofisopropyl

2-amino-1-cyclohexenecarboxylate as white crystals.
Underanitrogen

atmosphere,

10mmol2-amino-1-cyclohexenecarboxylate thus obtained, 10 mmol of methanesulfonic acid, 0.1
mmol of a Ru catalyst, and 8 ml of methanol were placed in a stainless steel autoclave,and the mixture was kept at 333 K under 3 MPa pressure of hydrogen for 16 hours withstirring to give isopropyl (-)-cis-2-aminocyclohexanecarboxylate methanesulfonate.