Quantus HP100
Gas Analyzer
Reliable Gas Analysis forCorrosive and Non-corrosive
Process Environments

Real-Time Gas Analysis and Endpoint Detection
with a Low Cost of Ownership
INFICON Quantus® HP100 gas analyzer is based on
Self-Plasma Optical Emission Spectroscopy (SPOES)
technology and is designed to provide real-time leakdetection, endpoint detection and process monitoring
during semiconductor manufacturing. It has a muchbroader operational pressure range than its sister gas
analyzer Quantus LP100, which makes it compatible
with most of the semiconductor processes at highpressure range, including CVD, ALD and ALE, etc.
Quantus HP100 serves as a guard to the most criticalprocesses, and is an excellent companion to advancedsemiconductor equipment.
AN OPTICAL GAS ANALYZER WITH
SUB PPM DETECTION LIMIT
The technology node in the semiconductor industry
becomes smaller and smaller due to fast developmentof novel semiconductor tools, improved process controls
and strong market demands. This leads to stricter

process control and tighter tolerance for any impurity
and imperfection in many process chambers. Thus, morereliable, more sensitive gas analyzers are required during
semiconductor device fabrication. Quantus HP100 is a
newly-designed gas analyzer under the INFICON opticalgas analyzer portfolio that can work over a much broader
pressure range, while maintaining excellent sensitivity.
With its sub-ppm detection limit, Quantus HP100 canserve as an effective process monitor in most criticalsemiconductor chambers to minimize wafer scrap,
improve throughput and maximize yield.
REAL-TIME LEAK DETECTION
One of the most important applications of Quantus
HP100 is real-time leak detection. When air or otherunexpected gas molecules leak into the process chamber,the chemistry in the chamber changes and can severely
impact process quality. For Quantus HP100, a localized
plasma is generated in the analyzer where impurity

ADVANTAGES AT A GLANCEn Operating range of 1 Torr - 450 Torr
(tested for Ar, varies for other gas species)n Small Footprint: 6.4 in. H x 6.0 in. W x 8.3 in. L(162 mm x 153 mm x 210 mm)n Excellent detection limits < 1 PPMn

 Low maintenance, no pumps requiredn Easy installation using a standard KF25 connectionn Convenient field-replaceable plasma celln Fast sampling (20 Hz maximum)n Support by experienced field-trained
INFICON Engineersmolecules are excited and/or ionized. The electron
excitation and relaxation processes in the plasma
generate optical emissions including the unique emission
lines from the impurity molecules. Those emission lines
are the fingerprints of the impurities and can be detectedby an advanced spectrometer in the gas analyzer. Witha fast sampling rate, Quantus HP100 is capable ofdoing real-time leak detection that is important to today’s
semiconductor fabrication industry.
ENDPOINT DETECTIONGAS ANALYSIS WITHOUT PUMPS
Unlike other gas analyzers in the market that require
expensive pumping systems to provide gas analysis at
higher pressure, Quantus HP100 natively supports up to450 Torr for argon and 120 Torr for nitrogen, which makes
it compatible with the majority of the processes in thecutting-edge tech node. This feature dramatically reduces
the overall sensor size and the total cost of ownershipsince pump maintenance is not required.
EASY INSTALLATION

Another important application of Quantus HP100 isendpoint detection. Traditional endpoint detection by OES
relies on observing the plasma in the process chamber,so the etch transition between different layers on a wafer
can be detected. However, with the proliferation of remote
plasma etching in advanced technology nodes, the etchchamber is dark and traditional OES does not work in suchenvironments. Quantus HP100 solves this dilemma since
it has a localized plasma generation component in theanalyzer. This design unleashes the power of OES so theanalyzer can work in dark chambers, as well as other dark
locations including, but not limited to foreline and exhaustline, etc.

The slim design of Quantus HP100 and the standard
KF25 port make this analyzer very easy and flexible forinstallation. The wide operational pressure range allows
it to be installed on either a process chamber or on apumping line. With its compact form factor, low weight andsimplified connections, one person with minimum training
is capable of completing the sensor installation.
INFICON EXPERTISE AND SUPPORTINFICON has worldwide application development teams
and resources to provide professional evaluations andconsultations. Our experienced field application teams
can provide the most efficient and effective support toyour critical needs.

SPECIFICATIONSPERFORMANCE
Technology

Optical Emission Spectroscopy with integrated microwave microplasma, spectrometer, and RF power supply

Spectrometer Performance

200 to 850 nanometer wavelengths (UV-VIS) 16-bit full-scale resolution, 3648 pixels

Optical Resolution

1.34 nm

Exposure Time

Minimum of 1 ms

Sampling Frequency

Maximum of 20 Hz

Detection Limit< 1 PPM levels (Application dependent)

GAS SAMPLING INTERFACE
Sampling Environment

1-450 Torr for argon, and 1 - 120 Torr for nitrogen; operating range varies for other gas species

Vacuum Fitting

KF25

Serviceability

Sensor cell is field replaceable

Communication type

Ethernet cable connection

FACILITIESOperating Temp Range

0 to 50°C (Non-condensing, Sensor cell 80°C )Power Requirements

24 V (dc) @ 2.5A (AC / DC converter available)

Isolation Valve

Optional

APPROXIMATE DIMENSIONS AND WEIGHTS
Dimensions

6.4 in. H x 6.0 in. W x 8.3 in. L (162 mm x 153 mm x 210 mm)

Weight8.2 lb. (3.7 kg)

w w w. i n fi c on. c omr e a chus @inficon.com

Due to our continuing program of product improvements, specifications are subject to change without notice.
INFICON Quantus is a registered trademark of INFICON Holding AG.
All other trademarks are the property of their respective owners.
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