Largest ever Exhibition MICROMACHINE to be held in Tokyo
Exhibition MICROMACHINE (The 17th International Trade Show
for Micro/MEMS & Nanotechnologies), an international exhibition ofsuperfine / fine processing, MEMS, nanotechnology andbiotechnology, will be held in Tokyo for three days from Tuesday,
November 7 through Thursday, November 9, 2006.
In the past, the exhibition has been held at the Science Museum
near the Imperial Palace, but this year the venue will change toTokyo International Forum in Yurakucho. The rapid increase inexhibitors resulting from the recent growth in the micromachine,
MEMS and nanotechnology fields meant that a more spacious venue
was needed.
Last year’s exhibition featured 256 companies and organizations
presenting exhibitions in 362 booths. This year’s exhibition isexpected to host approximately 280 companies and organizations atapproximately 430 booths, making this the largest exhibition yet.
Exhibition MICROMACHINE will showcase new technologies andnew products in the fields of superfine and fine processing, MEMS
(microelectromechanical systems) and nanotechnology. It is thelargest exhibition of its kind in Japan. We invite all interested parties
to attend.
The exhibition office is distributing complimentary tickets to theexhibition. For more information, call Mesago Messe Frankfurt at(+81) 3-3262-8456. You may also pre-register at the exhibition’s
website (http://www.micromachine.jp).

Fiscal 2006 MEMS International Standardization Workshop & Program
A MEMS International Standardization Workshop will beheld as one of the events of MicroNano 2006 with the aim ofstrategic deployment of international standardization in theMEMS field. The Workshop will invite researchers from aroundthe world who are working on the front lines of this field andhave produced outstanding cutting-edge achievements. Theseresearchers will talk about MEMS-related microtechnology andnanotechnology and about their experiences on the front lines
of evaluating these technologies. Another objective of theworkshop will be to deepen mutual understanding on the partof researchers in different countries.

Date : Monday, November 6, 2006 10:00 a. m. - 4:25 p. m.
Venue : Conference Square M+(Mitsubishi Bldg. 10F, 2-5-2 Marunouchi, Chiyoda-ku, Tokyo)( http://www.emplus.jp/access/ )Language : English
Entrance fee : Free
Sponsored by : Micromachine Center
MEMS International Standardization Workshop Executive CommitteeCosponsored by : New Energy and Industrial Technology Development
Organization (NEDO)
Support provided by : Ministry of Economy, Trade and Industry

Session 1
10 : 0010 : 05-

Opening Ceremony
Opening remarks
Words of welcome from sponsors

Session 2
10 : 10-

Frontiers of MEMS Devices“Glass Properties for Electrostatic Bonding in Process of the Packaging of MEMS Devices”
Prof. Dr. Sekwang Park (Kyunpook National University, Korea)“CNT Nano Electromechanical Transducers”
Prof. Dr. Christofer Hierold (ETH Zurich, Switzerland)“MEMS-based Nanopatterning : New Challenges and Opportunities for Materials Science”
Prof. Juergen Brugger (EPFL, Switzerland)– lunch –10 : 4011 : 1011 : 40Session 3
13 : 0013 : 3014 : 0014 : 3014 : 5015 : 2015 : 50-Session 4
16 : 20-

Yakichi Higo (Professor, Tokyo Institute of Technology and Chair, Workshop Executive Committee)
Sumio Kozawa (General Manager, New Energy and Industrial Technology Development Organization [NEDO])MEMS Evaluation Techniques and Standardization“MEMS Standardization Project at NIST”
Dr. Michael Gaitan (National Institute of Standards and Technology, U.S.A.)“Measurement of Micro-Tensile Properties for Gold Thin Film Using Micro-ESPI Technology”
Dr. Yong-Hak Huh (Korea Research Institute of Standards and Science, Korea)“Mechanical Material Characterization at the MEMS Materials Laboratory of IMTEK”
Prof. Dr. Oliver Paul (University of Freiburg, Germany)– Break –“Deformation and Fatigue Mechanisms of Structural Films”
Prof. Christopher L. Muhlstein (The Pennsylvania State University, U.S.A.)“Round-Robin Test on Fatigue of Thin Films for MEMS Applications in Japan”
Prof. Kazuki Takashima (Kumamoto University, Japan)“A Comprehensive Assessment of Fatigue Failure in
Micron-Scale Polycrystalline Silicon Structural Films for MEMS”
Prof. Robert O. Ritchie (University of California at Berkeley, U.S.A.)
Closing Ceremony
Closing remarks
Naotake Oyama (Chair, MMC Standardization Project Committee)

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