OtherMembers’ Profiles

Shineisha Co. Ltd.
1. Business Summary
Shineisha has specialized in the manufacturing of photomasks since 1963. By manufacturing photomasks over these last 46
years under the corporate philosophy “Meet the needs of our customers promptly and with 100% satisfaction,” we have done
our best to make some contribution to the semiconductor industry. Our clientele includes university research institutes,
corporate R&D institutes, and electronics companies.
After becoming a supporting member of the Micromachine Center in March 2009, Shineisha participated in the Exhibition
Micromachine/MEMS held in July of the same year with an exhibit on ultraprecision photomasks for MEMS. The company
remains committed to developing superior products with no equal.

2. Product Lines• Ultraprecision photomasks from 2”, 4”, 5”, 6”, 7”, 8”, and 9” up to a maximum size of 2  2.5 meters• Ultraprecision photomasks for MEMS, thin-film integrated circuits, master integrated circuits, MPUs, package substrates,and electronic parts• Photomasks for flat panel displays, such as flat-screen TVs• Photomasks and lead frames for printed circuit boards

3. Photomask Technology
Shineisha is equipped with more than ten writing tools required to manufacture photomasks of various sizes, as well as
inspection and repair systems. In addition to the VIOLD laser plotter, which we have used for some time, we recently added a
production line to our Sagamihara plant in Kanagawa Prefecture for manufacturing high-resolution chrome masks. The
production line was installed by the U.S. company Applied Materials, who purchased Etec Systems, and includes the CORE
laser lithography tool. CORE employs an argon ion laser with a wavelength of 363.8 nm that is capable of writing lines as fine
as 0.6µm with a line width precision of 0.05µm.
Photomasks for MEMS having a line width greater than 3µm are written with the conventional VIOLD system, while highresolutions masks with a finer line width are written using the CORE system, enabling us to provide more reasonable
photomasks to MEMS companies that have typically used semiconductor reticles. We hope that you take advantage of ourphotomasks when developing and producing your MEMS devices.

Steps in Photomask Fabrication
BlankWriteDevelopEtchAnalysis
When defects are detected in the primary
photomask fabrication process,the defective area must be analyzed
to identify the cause.

A glass substrate coated witha layer of metal and resist

A circuit design is written
by exposing the resist witha laser beam

Attach pellicle

Repair

The exposed resist isremoved to develop
the circuit pattern

The metal layer is etchedwherever the resist wasremoved

Measure andvisually inspect

Strip and clean

Inspect to determine whether
the shape, dimensions, andposition of the pattern matchthe design data

Resist not used for the circuit
pattern is removed andthe remaining structure cleaned

Photomask specifications
Any defects found in the visualinspection are repaired

A protective membrane,or pellicle, is attached
to prevent contamination

Defective parts are removed
by laser
Defective parts are repairedby focused ion beams

Substrate size

Substrate thickness

Material

The product is subsequently packaged and shipped to the customer

Announcement
We would like to announce the recent appointment of Hisao Sakuta (President and CEO of Omron Corporation) to replace
Tamotsu Nomakuchi (President and CEO of Mitsubishi Electric Corporation) as chairman of the Micromachine Center and chair ofthe BEANS Laboratory. We ask for your continued cooperation as we go forward.
The first address from the new director will be combined with his New Year’s address and included in the first edition of thequarterly magazine MICRONANO of 2010.

MICRONANO No. 69
MICRONANO is published quarterly by Micromachine Center (MMC), BEANS Technical Research Association(BEANS . TRA) to promote the international exchange of information related to micromachines, R&D and othertechnical topics, and is circulated free of change. Please send your comments about MICRONANO to the publisher :Keiichi Aoyagi, Executive Director, Micromachine Center (MMC)
MBR99 Bldg., 6F., 67 Kanda Sakumagashi, Chiyoda-ku, Tokyo 101-0026, Japan
Tel : +81-3-5835-1870, Fax : +81-3-5835-1873
Internet Home Page h t t p : / / w w w . m m c . o r . j p /Date of Issue : November 13, 2009