MMC Activities..............1
MEMS-ONE Pj...............5
Column.......................6
Overseas Trends............7
Member’s Profiles .........8

MMC Activities“MicroNano 2006” Micromachine Exposition
Overview“MicroNano 2006,” a micromachine exposition organized by the Micromachine Center, will be held in Tokyo November 6-9, 2006.
Each year the Micromachine Center holds the Exhibition MICROMACHINE and International Micromachine-Nanotech Symposium inTokyo. This year, in order to promote industry interchange in micro-nano fields (micromachines, MEMS etc.) in a more effective manner,a variety of events will be held under the title “MicroNano 2006.” Additional events will include a MEMS Forum and a briefing to present
the achievements of the Project for Development of a Design and Analysis Support System for MEMS (MEMS-ONE Project).
An overview of MicroNano 2006 is presented below. We encourage all interested parties to attend.

Date : Monday, November 6 - Thursday, November 9, 2006
Venue : Tokyo International Forum (Yurakucho, Tokyo)** Note: the MEMS International Standardization Workshop will be held in the Conference Square of the
Mitsubishi Building (Marunouchi, Tokyo).

Events :1. Exhibition MICROMACHINE : The 17th International Trade Show for Micro/MEMS & Nanotechnologies(International exhibition of superfine/fine processing, MEMS, nanotechnology and biotechnology)
Tuesday, November 7 - Thursday, November 9, 2006 10:00 a. m. - 5:00 p. m.
Venue : Tokyo International Forum Entrance fee : 500 yen / person
2. MEMS International Standardization Workshop(Exploring the frontiers of MicroNano material evaluation technologies)
Monday, November 6, 2006 10:00 a. m. - 4:25 p. m.
Venue : Conference Square, Mitsubishi Building (Marunouchi, Tokyo)

Entrance fee : Free

3. MEMS Forum(Aiming for growth in MEMS-related industries)
Tuesday, November 7, 2006 10:00 a. m. - 4:35 p. m.
Venue :Tokyo International Forum, Hall D7 Entrance fee : Free
4. 12th International Micromachine / Nanotech Symposium(Exploring the frontiers of nanotechnology and integrated MEMS innovation and business)
Wednesday, November 8, 2006 9:00 a. m. - 5:55 p. m.
Venue : Tokyo International Forum, Hall D7
Entrance fee : 20,000 yen / person (MMC - MEMS Industry Forum members 16,000 yen / person)
5. MEMS-ONE Project Achievements(Introduction to MEMS-ONE functions & features and demonstration of use / information on alpha and beta release)
Thursday, November 9, 2006 1:00 p. m. - 4:15 p. m.
Venue : Tokyo International Forum, Hall D7 Entrance fee : FreeIn addition, the 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences (µTAS2006) will be held
concurrently (November 5-9, 2006 at Tokyo International Forum, Hall C, Hall B5 and Hall B7).

Internet Home Page : http://www.mmc.or.jp/

Largest ever Exhibition MICROMACHINE to be held in Tokyo
Exhibition MICROMACHINE (The 17th International Trade Show
for Micro/MEMS & Nanotechnologies), an international exhibition ofsuperfine / fine processing, MEMS, nanotechnology andbiotechnology, will be held in Tokyo for three days from Tuesday,
November 7 through Thursday, November 9, 2006.
In the past, the exhibition has been held at the Science Museum
near the Imperial Palace, but this year the venue will change toTokyo International Forum in Yurakucho. The rapid increase in
exhibitors resulting from the recent growth in the micromachine,
MEMS and nanotechnology fields meant that a more spacious venue
was needed.
Last year’s exhibition featured 256 companies and organizations
presenting exhibitions in 362 booths. This year’s exhibition is
expected to host approximately 280 companies and organizations atapproximately 430 booths, making this the largest exhibition yet.
Exhibition MICROMACHINE will showcase new technologies andnew products in the fields of superfine and fine processing, MEMS
(microelectromechanical systems) and nanotechnology. It is thelargest exhibition of its kind in Japan. We invite all interested parties
to attend.
The exhibition office is distributing complimentary tickets to theexhibition. For more information, call Mesago Messe Frankfurt at(+81) 3-3262-8456. You may also pre-register at the exhibition’s
website (http://www.micromachine.jp).

Fiscal 2006 MEMS International Standardization Workshop & Program
A MEMS International Standardization Workshop will beheld as one of the events of MicroNano 2006 with the aim ofstrategic deployment of international standardization in the
MEMS field. The Workshop will invite researchers from aroundthe world who are working on the front lines of this field andhave produced outstanding cutting-edge achievements. These
researchers will talk about MEMS-related microtechnology andnanotechnology and about their experiences on the front lines
of evaluating these technologies. Another objective of theworkshop will be to deepen mutual understanding on the partof researchers in different countries.

Date : Monday, November 6, 2006 10:00 a. m. - 4:25 p. m.
Venue : Conference Square M+(Mitsubishi Bldg. 10F, 2-5-2 Marunouchi, Chiyoda-ku, Tokyo)( http://www.emplus.jp/access/ )Language : English
Entrance fee : Free
Sponsored by : Micromachine Center
MEMS International Standardization Workshop Executive Committee
Cosponsored by : New Energy and Industrial Technology Development
Organization (NEDO)
Support provided by : Ministry of Economy, Trade and Industry

Session 1
10 : 0010 : 05-

Opening Ceremony
Opening remarks
Words of welcome from sponsors

Session 2
10 : 10-

Frontiers of MEMS Devices“Glass Properties for Electrostatic Bonding in Process of the Packaging of MEMS Devices”
Prof. Dr. Sekwang Park (Kyunpook National University, Korea)“CNT Nano Electromechanical Transducers”
Prof. Dr. Christofer Hierold (ETH Zurich, Switzerland)“MEMS-based Nanopatterning : New Challenges and Opportunities for Materials Science”
Prof. Juergen Brugger (EPFL, Switzerland)– lunch –10 : 4011 : 1011 : 40Session 3
13 : 0013 : 3014 : 0014 : 3014 : 5015 : 2015 : 50-

Session 4
16 : 20-

Yakichi Higo (Professor, Tokyo Institute of Technology and Chair, Workshop Executive Committee)
Sumio Kozawa (General Manager, New Energy and Industrial Technology Development Organization [NEDO])MEMS Evaluation Techniques and Standardization“MEMS Standardization Project at NIST”
Dr. Michael Gaitan (National Institute of Standards and Technology, U.S.A.)“Measurement of Micro-Tensile Properties for Gold Thin Film Using Micro-ESPI Technology”
Dr. Yong-Hak Huh (Korea Research Institute of Standards and Science, Korea)“Mechanical Material Characterization at the MEMS Materials Laboratory of IMTEK”
Prof. Dr. Oliver Paul (University of Freiburg, Germany)– Break –“Deformation and Fatigue Mechanisms of Structural Films”
Prof. Christopher L. Muhlstein (The Pennsylvania State University, U.S.A.)“Round-Robin Test on Fatigue of Thin Films for MEMS Applications in Japan”
Prof. Kazuki Takashima (Kumamoto University, Japan)“A Comprehensive Assessment of Fatigue Failure in
Micron-Scale Polycrystalline Silicon Structural Films for MEMS”
Prof. Robert O. Ritchie (University of California at Berkeley, U.S.A.)
Closing Ceremony
Closing remarks
Naotake Oyama (Chair, MMC Standardization Project Committee)

2MEMS Forum- Aiming for growth in MEMS-related industries -Tuesday, November 7, 2006 10:00 a.m. - 4:35 p.m. Tokyo International Forum Hall D7Sponsored by : MEMS Industry Forum
Cosponsored by : Ministry of Economy, Trade and Industry, The New Energy and Industrial
Technology Development Organization (NEDO)
Support provided by : Kitakyushu Foundation for the Advancement of Industry, Science andTechnology; MEMS Park Consortium
Entrance fee : Free

Program

MC : Keiichi Aoyagi, Secretary-general, Secretariat, MEMS Industry Forum

Session 1

Opening

10:00 --- 10:05

Opening address

Tamotsu Nomakuchi, Chairman,
MEMS Industry Forum

10:05 --- 10:10

Greetings from guest of honor

Taizo Takahashi, Director, Industrial Machinery Division,
Manufacturing Industries Bureau, Ministry of Economy,
Trade and Industry

10:10 --- 10:20

Introduction of MEMS
Industry Forum activities

Keiichi Aoyagi, Secretary-general, Secretariat,
MEMS Industry Forum

Session 2

MEMS Industrial Policy

10:20 --- 10:50

MEMS Industry Policy in Japan with a view
to International Competitiveness (tentative title)

Taizo Takahashi, Director, Industrial Machinery Division,
Manufacturing Industries Bureau, Ministry of Economy,
Trade and Industry

10:50 --- 11:20

MEMS Industry Policy and Business
Development in the U.S.

Micro and Nanotechnology Commercialization Education
Foundation (MANCEF) , Vice President Jane Niall

11:20 --- 11:50

MEMS Business :What Determines Success or Failure ?

Associate editor, Tsuneyuki Miyake,
Nikkei Business Publications Inc.

11:50 --- 13:00

Lunch

Session 3

Reinforcement of MEMS Industry Infrastructure

13:00 --- 13:30

Developing a Standard Menu for Functional
Enhancement of MEMS Foundries (tentative title)

Kazushi Tomii, Chair, Foundry Service Industry Committee, MEMS Industry Forum( General Manager, MEMS Foundry Services, Micro Fabrication Process
Development Center, Matsushita Electric Works Ltd. )13:30 --- 14:00

Activities of the MEMS / MS
Applied Research Forum

Nagao Miyashita, Chief-executive, Industry-Academia
Cooperation Center, Kitakyushu Foundation
for the Advancement of Industry, Science and Technology

Efforts to Develop MEMS Technology throughYoshiyuki Watanabe, Senior researcher,Electronics Information Technology Department,
Yamagata Research Institute of Technology

14:00 --- 14:30 Liaison with the Manufacturing Industry:
Local Publicly-Run Trials

Session 4

MEMS Technology Establishment and Industry - Academia Cooperation

14:30 --- 15:00

Road Map to MEMS
Technology Strategies

Sumio Kozawa, Director general, Machinery System
Technology Development Department, The New Energy
and Industrial Technology Development
Organization (NEDO)

Information From MEMS Industry
Foruml Academia Affiliates

Organizer: Professor Kazuo Sato, Nagoya University• Seed Technologies Contributing to
Optical-Integrated Devices

Minoru Sasaki, Assistant professor,
Hane-Sasaki Laboratory, Tohoku University• Fundamental Problems with MEMS
Accelerometers and Potential for Solutions
Provided by Venture BusinessAkira Umeda, Metrology Institute of Japan,
National Institute of Advanced Industrial Scienceand Technology (AIST)• Research at Kyoto University Nano-Microsystem
Engineering Laboratory

Professor Osamu Tabata,Nano-Microsystem Engineering Laboratory,
Kyoto University• Reports on Industry-Academia Liaison Activities
by The Japan Society for Precision Engineering
Expert Committee on Micro-Nanosystems
Research and the Tokyo Institute of Technology
Precision and Intelligence Laboratory (Horie Group)

Professor Mikio Horie, Precision andIntelligence Laboratory,
Tokyo Institute of Technology

Establishment of Core Technology to Strengthen
the Infrastructure of the MEMS Industry

Professor Hiroyuki Fujita, Institute of Industrial Science,
University of Tokyo

Closing address

Koichi Karaki, Vice-chairman,
MEMS Industry Forum

15:00 --- 16:00

16:00 --- 16:30
Closing
16:30 --- 16:35

3

The 12th International Micromachine / Nanotech Symposium- Innovations on Nanotech / Integrated MEMS and Forerunners of MEMS Business -November 8, 2006, The Tokyo International Forum, Tokyo
Sponsored by : Micromachine Center
Cosponsored by : Ministry of Economy, Trade and Industry, The New Energy and Industrial
Technology Development Organization (NEDO)
Entrance fee : 20,000yen / person (MMC-MEMS Industry Forum members 16,000yen / person)
Contact : Micromachine Center, Industry Department
MBR99Bldg.6F, 67 KandaSakumagashi, Chiyoda-ku, Tokyo 101-0026, Japan
Tel : 03-5835-1870

Fax : 03-5835-1873

E-mail:front@mmc.or.jp

Program
Opening

Chairperson : Keiichi Aoyagi, Micromachine Center

9:00 --- 9:05

Opening Remarks

Tamotsu Nomakuchi, Micromachine Center

9:05 --- 9:10

Guest Speech

Taizo Takahashi, Industrial Machinery Division,
Manufacturing Industries Bureau, METI

Keynote Session Towards the Next Generation of MEMS

Chairperson : Keiichi Aoyagi, Micromachine Center

9:15 --- 10:00

Advances in Research and Applications ofIntegrated MEMS in Japan

Isao Shimoyama, The University of Tokyo

10:00 --- 10:45

Advances in MEMS Integration :MEMS First or MEMS Last ?

Thomas W. Kenny, Stanford University

Session 1

Cutting Edge of MicroNano Science and Technology

10:45 --- 11:15

Fusion of Top-down and Bottom-up
Processing Using Neutral Beam

Seiji Samukawa, Tohoku University

11:15 --- 11:45

Preparation and Properties ofMulticomponent Nanocrystal Superlattices

Christpher B. Murray,
IBM, The T.J. Watson Reserch Center

11:45 --- 12:15

Organic and Organic-Inorganic
Hybrid Molecular Devices

Cherie R. Kagan,
IBM, The T.J. Watson Reserch Center

12:15 --- 13:30

Chairperson : Osamu Tabata, Kyoto University

Lunch

Session 2

Forefront of MEMS Business

Chairperson : Isao Shimoyama, The University of Tokyo

13:30 --- 14:00

CMOS/ MEMS integration is a key tosuccess of Silicon Resonator

Emmanuel Quevy, Silicon Clocks Inc.

14:00 --- 14:30

Reconfigurable RF Circuits for Future
Mobile Terminals

Shoichi NARAHASHI, NTT DoCoMo, Inc.

14:30 --- 15:00

Development of Medical Devices for Minimally
Invasive Diagnostics and Treatment Using
Micro/nano Technology

Yoichi Haga, Tohoku University

15:00 --- 15:30

MEMS@Bosch- Automotive Applications and beyondPeter Ernst, Robert BOSCH GmbH

15:30 --- 15:50

Break

Session 3

CMOS / MEMS & MEMS/MEMS Integration

15:50 --- 16:20

CMOS/ MEMS Integration by Poly Si Ge

Kris Baert, IMEC

16:20 --- 16:50

Carbon Nanotube-based Machine Elements for
Nano-scale Mechanisms and Technologies
Required to Transition Them From the Lab to Products

Martin Culpepper,
Massachusetts Institute of Technology

16:50 --- 17:20

Advanced Packaging is the BreakthoughTechnology of MEMS Commerciarization

Joerg Froemel, Fraunhofer IZM

17:20 --- 17:50

Optical MEMS towards Integration and Large Scale

Hiroshi Toshiyoshi, The University of Tokyo

Closing Remarks

Keiichi Aoyagi, Micromachine Center

Chairperson : Takashi Usuda, AIST

Closing
17:50 --- 17:55

4

MEMS-ONE Project Achievements
This will be the final year of the Project forDevelopment of a Design and Analysis Support System
for MEMS (MEMS-ONE Project). The MEMS-ONE
Project was established with the aim of setting up an
infrastructure to provide systems support for thegrowth and development of the Micro Electro
Mechanical Systems (MEMS) industry. MEMS-ONE
development is entering the final stages; even lastyear, only fragments were visible, but beginning withthis fiscal year, verification after combining elements
has been conducted, enabling the overall picture to be
glimpsed.
When the MEMS-ONE system is launched, thegraphical user interface (GUI) function that serves as
the basic framework for the system appears. Thisfunction allows users to perform analysis in aninteractive manner, and the results of analysis can beeasily checked by means of figures, graphs andanimations. Steady progress is also being made withregard to novice support features such as theacquisition of a knowledge database and data on
material properties.
In the future, integrated verification of the overall
MEMS-ONE system will be conducted to increase theoverall completeness of the system. In addition, avigorous effort is being made to increase the volume ofdata acquisition in anticipation of the issue of alphaand beta (final) releases.

Program :Session 1 : Opening
1:00 - 1:15 Sponsor’s greetings
1:15 - 1:30 Greetings from guest of honor
1:30 - 2:00 Keynote address:“Expectations for MEMS-ONE basedon Fine-MEMS”
2:00 - 2:15 BreakSession 2 : Overview of MEMS-ONE functions &demonstration
2:15 - 2:35 Overview and characteristics of functions
2:35 - 3:20 From design conceptualization to process
mask design and operational testing
3:20 - 3:25 Q & A session
Session 3 : MEMS-ONE alpha release
3:25 - 3:35 Future release plans
3:35 - 3:50 Alpha release
3:50 - 4:00 Q & A session
Session 4 : Closing
4:00 - 4:15 MEMS-ONE Support Center concept
Registration :–To register for the briefing, please send an email
with your name, company name, department,
position, address, email address, telephone
number and fax number to the following email
address : mems1@mmc.or.jp
When your registration has been confirmed, aconfirmation email will be sent. On the day of thebriefing, please bring a copy of the confirmation
email and present it to the receptionist. If you
have not pre-registered but would like to registeron the day of the event, please see thereceptionist prior to the start of the briefing.
However, same-day registration will be permitted
only on a space-available basis, so we encourage
you to register in advance.
–Deadline for registration : Wednesday, November
1, 2006
For more information :If you have any questions regarding the briefing,please call the MEMS-ONE Project Office at (+81)
3-5835-1870.

This autumn a briefing will be held to announce theachievements of the MEMS-ONE Project. This briefing
will feature up-to-date information on such topics as
an overview of the functions that will ultimately beprovided in MEMS-ONE and their characteristics, ademonstration showing how to use the program,anticipated dates for the issue of alpha and beta
releases and so on. This briefing will differ from theone held last year in that it will feature enhanced
content based on the actual software currently being
developed. In addition, the venue has been changed to
the Tokyo International Forum. A video presentation
on MEMS-ONE will be presented at Exhibition
MICROMACHINE as well, in addition to ademonstration featuring sample analyses, panel
exhibits and pamphlet distribution.
The program for the briefing is shown below. We
invite all interested parties to attend.

Copies of the alpha release and beta release will be
distributed in accordance with the following schedule.
1 ) The purpose of distributing the alpha release is toenable users to evaluate the current state of
execution of the program. The results of theevaluation will be reflected in the beta release to
the greatest degree possible in order to make theprogram more complete. The alpha release isscheduled for mid-November 2006. You will beable to register to receive a copy of the alpharelease beginning in early October.
2 ) The beta release will be the final version
representing the ultimate achievement of the
MEMS-ONE Project. It is tentatively scheduled forrelease in May 2007.

Date/Time : Thursday, November 9, 2006
1:00 - 4:15 p.m.
Venue : Tokyo International Forum, Hall D7
Entrance fee : Free
Sponsored by : Micromachine Center
MEMS-ONE Project Promotion
Committee
Cosponsored by : New Energy and Industrial
Technology Development
Organization (NEDO)
Support provided by : Ministry of Economy,
Trade and Industry

5Column

Current State of Nanobiotechnology Research and MEMS
Yoshinobu Baba, Professor, Nagoya University, Director of Nanobio Research, Health Technology
Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
energy by applying mechanical energy to a single-molecule
motor. Moreover, it is also becoming possible to use MEMS to
conduct research into cell patterning (used in cell manipulation
and regenerative medicine) and so on.

Nano-bio research is currently attracting a great deal ofattention in fields ranging from basic science and key
technology fields (such as electricity, electronics, machine,
physics, chemistry and life sciences) to biotechnology, medicine
and pharmaceutical research. 1) - 4) Nano-bio research falls into
two broad research categories: nanobiology (also known as
nano-bioscience), a research field of life science using
nanotechnology, and nano-biotechnology, a research fieldcreated through the integration of biotechnology with
nanobiotechnology. (Fig. 1)

There has been considerable progress in nano-bio researchin recent years, particularly in terms of the creation of researchdomains in which research would be impossible without
nanobiotechnology. Achievements in nano-bio research are
currently having a tremendous impact on the life sciences, tothe extent of rewriting what we know as common knowledge
about the life sciences. Moreover, most of this new research has
been created as a result of the deployment of MEMS in
nanobiotechnological research. However, the use of MEMS in
nanobiotechnological research has just begun, and most of thetechnologies produced through MEMS are not yet being appliedin nanobiotechnological research. In the future, the deploymentof various MEMS technologies in nanobiotechnological research
will bring about a technological revolution in the life sciences,
as well as in medical treatment and pharmaceutical research.
These technologies are expected to help us solve the mysteriesof life and aid in further progress in medical treatment andpharmaceutical research.

Nanobiology involves research to determine the properties
and structure of biological molecules at the single molecule
level, as well as research into primarily molecular motors andbiomachines and other molecular assemblies and intracellularbioreaction imaging and so on. Nanobiotechnology is rapidly
expanding from basic technologies such as gene expression andprotein measurement technologies using chips, sensors andMEMS to application fields such as medical diagnosis
technologies, nanomaterial-based drug delivery systems, genetherapy, systems engineering, regenerative medicine andnanomedicine. (Fig. 2) Moreover, with the recent progress in
MEMS and nanotechnology, research is expanding in thedomain that fuses nanobiotechnology with nanobiology.

1) Baba, Yoshinobu ed. “Nanotechnology and medical treatment”
Nippon Rinsho, February 2006)
2) Baba, Yoshinobu ed. “Isolation and measurement technologies in
the nanotechnology and biotechnology
MEMS era” (CMC Publishing Co., Ltd., 2006)
3) Baba, Yoshinobu ed. “Nanobiology: Using nanotechnology totransform biology” (Cellular Engineering,
August 2006)
4) Baba, Yoshinobu ed. “New directions in nanobiotechnologicalresearch made possible by chemistry”(Modern Chemistry, November 2006)

Effective use of MEMS technology is becoming an important
key to successful nano-bio research, particularly in thecurrently active research domain that fuses nanobiology andnanobiotechnology. Up to now, molecules and molecularassemblies were the principal target of nano-bio research.
However, MEMS is also coming to play an extremely importantrole in research into more complex systems such as cells andstructures. For example, with MEMS it is possible to analyze
the single-molecule gene expression information inside a single
cell, something heretofore thought to be impossible. It is also
now possible to study techniques for producing chemical

Nanobiology

Nanobiotechnology

Molecular structures/ function analysis
Single-molecule imaging
Single-molecule mechanics/ manipulation
Molecular assemblies/ biomachines
Single-cell manipulation
Intracellular imaging
Intracellular trafficking

Microspace reaction/
manipulation
Mechanical - biochemicalenergy conversion
Quantum dot imaging
Cellular devices/
regenerative medicine
Nanodevice molecular
manipulation

Nanodevices / micro-TAS
Bio-MEMS / molecular manipulation
Biochips / biosensors
Bio-imaging
Nanomaterials / quantum materials
Nano-DDS
Tissue engineering
Regenerative medicine

Fig. 1 Nano-bio research domains
a

b

c

d

e

f

g

h

i

methoxy head
PEG shell

500 nm
PLA core

200 nmpillar

50 nm

Fig. 2 Nanobiotechnologies studied by the Groupa. Nanopillar, b. Nanobowl, c. Nanofiber, d. Quantum dot, e. Quantum dot cluster
f. Biodevice, g. Monomolecular imaging, h. Nanotweezers, i. Intracellular molecular imaging

6

Overseas Trends

2nd Japan-Korea-China MEMS Standardization Workshop heldin Gyeongju, South Korea (June 22 - 23, 2006)
The Micromachine Center is playing a leading role in
MEMS international standardization activities. As a result of
the Center's activities, Japan has led other countries inpromoting such standardization activities as the publication of
the “MEMS Glossary,” “Tension test methods for thin film
materials” and “Fatigue test methods for thin film materials”.*
In recent years, South Korea has also begun active efforts inthis area.
Japan and South Korea in particular feel that it is important
to exchange views regarding MEMS standardization and seek
future cooperation. As a result, last year the first Japan-KoreaChina MEMS Standardization Workshop was held. The
Workshop provides a forum for discussions relating tostandardization proposals and the possibility of conducting joint
research relating to MEMS standardization. This year thesecond Workshop was held June 22 - 23, 2006 in Korea and at
the Concord Hotel in Gyeongju, South Korea.
Gyeongju is a historic city that served as the capital during
the Silla Era. It is also famous throughout the world for its many
historical treasures.

Next, there were three presentations by Japanese
researchers. First was Professor Iwaoka of Kanazawa Instituteof Technology, who gave a presentation entitled “MEMS
Technology Trends and Needs of MEMS Standardization for
Industry.” He spoke about overall technical trends relating to
MEMS and, based on a comparison of the technicalinfrastructure for IC and MEMS, emphasized the need for a
strategic standards program in the MEMS field. Next, Professor
Takashima of Kumamoto University gave a presentation entitled“Round-Robin Test on Fatigue of Thin Films for MEMS
Applications in Japan.” He presented an overview of the roundrobin fatigue tests conducted from 2003 through 2005 andtalked about a draft proposal for a thin film fatigue test method
to be presented to the IEC TC/WG4. Finally, Associate
Professor Tsuchiya of Kyoto University gave a presentation
entitled “Humidity Effect on Tensile Strength and Fatigue
Properties of Single Crystal Silicon Microstructures.” He spoke
about the latest research into the fatigue properties of single
crystal silicon microstructures.
This second Japan-Korea-China MEMS Standardization
Workshop was significant in that the presentations fromJapanese speakers served to showcase the outstanding andinnovative nature of Japan’s standardization proposals relating
to MEMS material evaluation. Moreover, the Koreanpresentations demonstrated the great interest in Korea in bothstandardization in the MEMS field and research into techniques
for evaluating thin film materials and underscored the intensive
efforts being made in Korea with regard to standardization. At
the Welcome Party held at the Gyeongju Concord Hotelfollowing the presentations, there was a spirited exchange ofperspectives and technical knowledge between the Japaneseand Korean researchers. The location and other details for the
next Workshop are expected to be decided this autumn.

Professor Sekwang Park of Kyungpook National University,
the project leader for the International ElectrotechnicalCommission (IEC) TC/WG4, presided over the Workshop.
Seven lectures were presented on the special theme of “Thinfilm testing of MEMS and NEMS.”

Photo 1 Concord Hotel (Gyeongju)
Unfortunately there were no attendees from China.
However, seven delegate from Japan, from such organizations
as the International Standardization Engineering Laboratory,
Kumamoto University, Kanazawa Institute of Technology, Kyoto
University, New Energy and Industrial Technology
Development Organization (NEDO) and so on, were inattendance, and approximately 20 persons from South Korea
attended. The attendees listened to lectures and participated ina discussion of the latest research developments andstandardization in this field.
Following words of welcome from Professor Park, there
were four presentations from Korean researchers. Dr. Nak-Kyu
Lee of the Korea Academy of Industrial Technology (KAITECH)
gave a presentation entitled “Micro Material Property
Measurement Technology of Micro Thin Film Materials.”Professor Chung-Seog Oh of Kumoh National Institute ofTechnology gave a lecture entitled “Some Efforts in Improving
the Mechanical Properties Measurement Acciracy for Thin
Films.” Dr. Yong-Hak Huh of the Korea Research Institute ofStandards and Science (KRISS) gave a presentation entitled“Measurement of Micro-tensile Properties for Thin Film
Materials using Micro-ESPI Technique.” Finally, Professor JunHyub Park of TongMyong University gave a presentation
entitled “Tensile and Fatigue Test of Thin Film by New Test
Procedure.”

Photo 2 Speakers and participants from JapanTop left : Professor Iwaoka
Bottom left : Associate Professor Tsuchiya
Top right : Professor Takashima
Bottom right : Director Owada* “MEMS Glossary” (FY2005 International Standard [IS])“Tension test methods for thin film materials” (FY2006
International Standard [IS])“Fatigue test methods for thin film materials” (Proposed FY2006
New Process [NP])7

Members' Profiles

Yokogawa Electric Corporation
1. MEMS technology efforts at Yokogawa
Measurement, control and information are thecore technology areas of Yokogawa, which
provides state-of-the-art “mother tools” for anindustrial world. Our major business areas are thecontrol equipment field, which is expanding due
to rising oil prices, and the measurement
equipment field that comprises semiconductor
testers and electronic instruments. In 2005,
Yokogawa celebrated its 90th anniversary, andthe Corporate Research and Development
Headquarters is hard at work developing leadingedge technologies to solve customer problems inanticipation of the company's centennial in 2015.
One area in which the company is focusing
particular effort is the use of MEMS technology to
produce key devices that can distinguish
Yokogawa’s products from those of its
competitors. In the 20 years since Yokogawa
began research into MEMS technology, thecompany has accumulated many basic
technologies. We are now employing thesetechnologies to develop new devices that will be
the seeds for both core businesses and new
businesses.
2. Current status of research and development
Some typical products and devices currently
under development are described below.
(1) Silicon resonant sensor device
The key device used in the Dpharp series ofprocess differential pressure sensors firstmarketed in 1991 is the miniature silicon resonant
sensor shown in Fig. 1. This was one of the first
products in the world to employ MEMS
technology, and ultimately 1.5 million came to be
used worldwide. We are increasing our share of
the world market, and we feel that it is only amatter of time before we are number one globally.
The Dpharp has grown to become one of
Yokogawa’s main products, and the company isplacing a great deal of emphasis on the ongoingdevelopment of the silicon sensors that is its corecomponent.

Director, Advanced Technology Research Center

Katsumi Isozaki(2) Tunable MEMS-VCSEL
The device shown in Fig. 2 is a tunable MEMS
vertical-cavity surface-emitting laser (MEMSVCSEL) currently being developed with thesupport of the NEDO High Integration Composite
MEMS Fabrication Technology Development
Project. Yokogawa is working to create this uniquedevice by combining compound semiconductor
technology with the Si-MEMS technology that hashelped to distinguish its products from those of its
competitors.
(3) Microreactor development efforts
A microreactor is a device that causes chemical
reactions to take place inside a tiny micro-fluid
channels. As the properties of this tiny space canbe freely manipulated, manufacturing plants canbe created with sizes and functions heretofore
impossible. MEMS is the key technology thatenables microreactors to be achieved.
Microreactor technology is expected to
revolutionize the manufacturing methods forpharmaceuticals and fine chemicals produced insmall lots using high value added functional
materials. Yokogawa is pursuing development of
microreactors on a priority basis. Fig. 3 shows amicroreactor chip for on-site gas manufacture,
currently being developed jointly with Mitsui
Chemicals, Inc.

Fig. 3 Microreactor device

Fig. 1 Si resonant sensor

Fig. 2 Tunable MEMS-VCSEL

3. Future efforts
MEMS is a manufacturing technology. For thisreason, it is important to combine MEMS withother technologies to increase added value. In
the future, Yokogawa will work to fuse MEMS
with chemical technologies, deploying theachievements in microreactors, biotechnology andfuel cells.
MICRONANO No. 57

MICRONANO is published quarterly by Micromachine Center (MMC) to promote the international exchange of
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