Activities of the BEANS Laboratory

Goals of the BEANS Project
3. 3D Nanostructure Formation Processes

One goal of the BEANS Project is to establish integrated
micro/nano manufacturing technologies that combine the topdown approach of micromachining with the bottom-up
approach of nano/bio processes, the objective being to produce
innovative devices that will revolutionize our lives in such areas
as the environment and energy, medical care and welfare, andsafety and security. Specifically, we are attempting to merge
science and engineering while fusing dissimilar fields such as
MEMS and nano/bioengineering. Another goal of the project isto develop a set of new core process technologies (BEANSprocesses) required to create innovative next-generation
devices (BEANS) and to establish these core process
technologies as the BEANS platform.

• To produce damage-free 3D nanostructures (nanosize holes

with an aspect ratio of 100 or greater) in the etching surface
with atomic layer control by developing ultra-low-damage
neutral beam etching for use on glass, compound
semiconductors, and organic semiconductor material inaddition to silicon. Combining this technology withfemtosecond laser modification will give us a processing
technology for forming complex 3D nanostructures with a
precisely controlled isotropic/anisotropic nature to suit thedevice structure.
• To establish coating and deposition techniques for preventing
microstructures from sticking to one another due tointerfacial tension, using supercritical carbon dioxide fluid totransport raw material deep into the 3D nanostructure. This
technique will also be expanded to embed metal, oxide film,
block polymers, and other materials in microtrenches andmicroholes of 3D nanostructures (nanosize holes with an
aspect ratio of 100 or greater) with no gaps. The feasibility ofthese 3D nanostructure processes will be verified based onenvisioned devices.

Target of BEANS Project

4. Micro/Nanostructure Large-Area Continuous
Manufacturing Processes• To

develop process technologies capable of forming
functional films with electronic functions having an electron
mobility of 1 cm 2 /V-sec or greater and thin films withmechanical functions constructing micro/nano structures
while achieving a practical deposition rate using non-vacuum
deposition processes such as coating or self-assembly
processes.
• To establish a process technology capable of forming theabove high-level functional film over a meter-scale large-area
substrate by scanning the substrate to deposit a uniform film
_ 10%, with a patterning resolution nothickness within +greater than 200 µm and a processing time no greater thanthat of current vacuum devices.
• To develop processes for forming 3D nanostructures on a
fibrous substrate coated with a nanofunctional film at aprocessing speed of 20 m/min or better, and to develop
weaving integration process technologies to create sheet-likedevices that function even when deformed threedimensionally and to verify the functions of flexible sheet-likedevices.

Below is a description of the goals we hope to achieve uponcompletion of the project based on the R&D tasks set forth in
the basic project plan, and the rippling effect theseachievements will have on industry.

1. Bio Integration Processes• To conduct R&D on processes for forming biomaterials, suchas hydrogels and artificial lipid bilayers, having long-termstability. The purpose of this R&D is to establish processes
for forming artificial lipid bilayers that are capable ofperforming biomolecular measurements with great sensitivity
and can remain stable for at least one day in biocompatible
materials, such as hydrogel and microfluidic devices capableof functioning continuously in the body for at least threemonths.
• To produce advanced functions by constructing artificial cells
and artificial tissues. This will be achieved by establishingprocess technologies for producing bead capsules using a
microbead technique, synthesizing peptides for cell adhesion,and assembling 3D structures of micro-organs and cells forexpressing and preserving biofunctions.

In order to apply the achievements acquired above
extensively to BEANS manufacturing methods as a platform forprocesses that fuse different fields, future core processing
technologies will be modeled to simulate the processes. We will
also create a database with related processing knowledge andexpertise to build a design infrastructure for BEANS processes,
and will provide licensing for intellectual property rights
essential for commercializing BEANS manufacturing techniques
in order to remove all obstacles in the patenting process.
In the event that the BEANS Project achieves all of thegoals set forth above, BEANS processes will be recognized as aplatform for producing innovative devices that can revolutionize
the way we live. It is our hope that this platform will contributeextensively to business development and the cultivation of new
industries when adopted by companies in diverse industrial
fields.

2. Organic Material Integration Processes• To conduct R&D on producing high-performance organic

photovoltaic devices. Through this R&D, we hope to establish
processes for forming self-assembled nanostructures, such asorganic molecular nanopillars spaced at the sub-200-nm
carrier diffusion length of the organic semiconductor, organic
molecular nanoporous structures with uniform sub-100 nm
pores, and mesh or linear structures having a sub-100 nm
line-and-space (L/S) pattern. Basic functions such as theconversion rate will be verified based on the envisioned
design.

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