, 32, 1 (2008) 31 36

J. Inst. Electrostat. Jpn.

ᄢ᳇࿶㕖ᐔⴧࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ὇⚛ੑ㊀⚿วߩ㉄ൻ෻ᔕߦ߅ߌࠆ᡼㔚๟ᵄᢙߩᓇ㗀㑐 ญ ⑲ ବ㧖,1㧘㗇 ⾐ ⟵ ᓼ㧔2007 ᐕ 8 ᦬ 31 ᣣฃઃ㧧2008 ᐕ 2 ᦬ 20 ᣣฃℂ㧕

Effect of Discharge Frequency on Oxidation of Carbon Double Bond
Using Atmospheric Pressure Non-equilibrium Plasma Jet
Hidetoshi SEKIGUCHI,*,1 and Yoshinori SUGA
(Received August, 31 2007; Accepted February, 20 2008)

Oxidation of 1-decene having a carbon double bond was studied using a non-equilibrium plasma jet at atmosphericpressure. The plasma jet was generated with a low frequency (LF) power source below a frequency of 10kHz tocompare the previous results using a radio frequency (RF) power source. The experimental results showed that
1-nonanal was most produced among oxidation products and its production closely related to ozone concentration inthe jet, suggesting that ozone oxidized the carbon double bond by different reaction mechanism as compared with theoxidation with RF plasma jet where oxygen atom was a key species. The comparative experiments were further
carried out using styrene and the results confirmed that the different oxidation mechanisms predominantly proceededfor LF and RF plasma jets similarly to the oxidation of 1-decene.
1.

ߥߤߩᵴᕈ⒳ߦࠃࠆ⹜ᢱ߿⋡⊛↢ᚑ‛ߩಽ⸃߇ᛥ೙ߢ߈㧘ߐߪߓ߼ߦᄢ᳇࿶㕖ᐔⴧࡊ࡜࠭ࡑߪ㧘ߘߩฬߩㅢࠅ㧘ᄢ᳇࿶ਅߢࠟࠬࠄߦ㧘ᶧ૕⴫㕙ߦࠫࠚ࠶࠻ࠍᾖ኿ߐߖࠆᶧ⋧ਇဋ৻෻ᔕߣߥ᷷ᐲߩૐ޿ࡊ࡜࠭ࡑߢ޽ࠆߎߣ߆ࠄ㧘ࡊ࡜ࠬ࠴࠶ࠢߥߤ㜞᷷ࠆߚ߼㧘Ყセ⊛ਇ቟ቯߥ╙৻↢ᚑ‛ߥߤ߇ᶧ૕ਛߢᄬᵴߔࠆ

ߦᒙ޿᧚ᢱߩ⴫㕙ᡷ⾰ࠍߪߓ߼ߣߔࠆࡑ࠹࡝ࠕ࡞ࡊࡠ࠮ࠬߎߣߦࠃࠅᓟ⛯෻ᔕ߇ㆱߌࠄࠇࠆ㧚ߎߩߚ߼ᓥ᧪ߩဋ৻᳇⋧߆ࠄ㧘ឃࠟࠬ࡮ᑄ᳓ಣℂ߿Ვ⩶ߥߤߩⅣႺࡊࡠ࠮ࠬ߹ߢ㧘᭽‫ޘ‬෻ᔕߦᲧߴㆬᛯ₸߇ะ਄ߔࠆߣᦼᓙߐࠇߡ޿ࠆ 19)㧚ߥᔕ↪߇⎇ⓥߐࠇߡ޿ࠆ㧚ߘߩਛߩ৻ߟߦൻቇวᚑ߳ߩᔕ↪

਄ㅀߒߚࠛࡐࠠࠪൻߩታ㛎 18)ߢߪ㧘770kHz ߩ㜞๟ᵄ(RF)߇޽ࠅ㧘ਛߢ߽㕖ᐔⴧࡊ࡜࠭ࡑࠍ೑↪ߒߚࠝ࠱ࡦวᚑߪ㧘໡㔚Ḯࠍ೑↪ߒߚᄢ᳇࿶㕖ᐔⴧࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߡ޿ᬺࡊࡠ࠮ࠬߣߒߡ᏷ᐢߊ೑↪ߐࠇߡ޿ࠆߩߪ๟⍮ߢ޽ࠈ߁㧚ࠆ㧚ߎߩࡊ࡜࠭ࡑߪ᡼㔚ᵄᒻߩⷰኤ߆ࠄᄢ᳇࿶ࠣࡠ࡯ࡊ࡜࠭߹ߚ὇ൻ᳓⚛ߩᡷ⾰1-9)

10-14)

߳ߩ㕖ᐔⴧࡊࡑߦㄭ޿߽ߩߣ⠨߃ࠄࠇߚ㧚ਥߥ㉄ൻ෻ᔕ↢ᚑ‛ߦߪ㧘⋡⊛࡜࠭ࡑߩㆡ↪߽ᣢߦᢙᄙߊ⎇ⓥߐࠇߡ޿ࠆ㧚ᚒ‫࡜ࡊߩߎ߽ޘ‬‛ߣߒߚ 1,2-ࠛࡐࠠࠪ࠺ࠞࡦߩઁ㧘1-࠺ࠞ࠽࡯࡞㧘2-࠺ࠞࡁ࠭ࡑࠍൻቇวᚑߦᔕ↪ߔࠆ⎇ⓥࠍㅴ߼ߡ߅ࠅ㧘⺃㔚૕ࡃ࡝ࠕࡦ㧘1-ࡁ࠽࠽࡯࡞߇ᬌ಴ߐࠇߚ㧚Fig.1 ߦߪផ᷹ߒߚ෻ᔕ⚻〝߿ࡔ࠲ࡁ࡯࡞วᚑ15-17)߿㧘ᄢ᳇ࠍ㧘ߘߒߡ࿑ਛߩ⍫ශߩᄥߐߪ㧘ᓧࠄࠇߚ⚿ᨐࠍ〯߹߃㧘ߘ࿶㕖ᐔⴧ㉄⚛ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ೑↪ߒߚ 1-࠺࠮ࡦߩࠛࡐߩ⿠ߎࠅᤃߐࠍቯᕈ⊛ߦ␜ߒߚ߽ߩߢ޽ࠆ㧚ߎߎߢ 1,2-ࠛࡐ᡼㔚ࠍ೑↪ߒߚࡌࡦ࠯ࡦ߿࠻࡞ࠛࡦߩㇱಽ㉄ൻ18)ࠍ⹜ߺߡ޿ࠆ㧚․ߦᓟ⠪ߩᣇᴺߢߪ㧘᡼㔚ਛߦ෻ᔕࠠࠪ࠺ࠞࡦ㧘1-࠺ࠞ࠽࡯࡞㧘2-࠺ࠞࡁࡦߪ㧘ࡊ࡜࠭ࡑਛߩ㉄⹜ᢱࠍଏ⛎ߒߥ޿ߚ߼㧘᡼㔚ਛߦሽ࿷ߔࠆ㜞ࠛࡀ࡞ࠡ࡯㔚ሶ⚛ේሶ㧔O(3P)㧕߇↢ᚑߩ⿠ὐߣߥࠆߣ⠨߃ࠄࠇߚ㧚ߒ߆ߒ㧘ࠠࠪൻࠠ࡯ࡢ࡯࠼㧦ᄢ᳇࿶㕖ᐔⴧࡊ࡜࠭ࡑࠫࠚ࠶࠻㧘ㇱಽ㉄ൻ㧘᡼㔚๟ᵄᢙ㧘1-࠺࠮ࡦ㧘ࠬ࠴࡟ࡦ* ᧲੩Ꮏᬺᄢቇᄢቇ㒮ℂᎿቇ⎇ⓥ⑼ൻቇᎿቇኾ᡹
㧔152-8552 ᧲੩ㇺ⋡㤥඙ᄢጟጊ 2-12-1㧕
Department of Chemical Engineering, Graduate School ofScience and Technology, Tokyo Institute of Technology, 2-12-1O-okayama, Meguro-ku, Tokyo 152-8552, Japan1
hsekiguc@chemeng.titech.ac.jp1-ࡁ࠽࠽࡯࡞ߛߌߪઁߩ↢ᚑ‛ߣ↢ᚑ᜼േ߇⇣ߥߞߡ߅ࠅ㧘หߓਛ㑆૕ࠍ⚻↱ߔࠆ߆ਇ᣿ߥߚ߼㧘ὐ✢ߢ␜ߒߡ޿ࠆ㧚߹ߚ㧘RF 㔚Ḯࠍ↪޿ߚታ㛎ߢߪ㉄⚛ࠍട߃ࠆߎߣߢࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ᷷ᐲ߇਄᣹ߒ㧘ߘࠇߦ઻޿⹜ᢱ߇ើ⊒ߔࠆߣ޿ߞߚ໧㗴߽޽ߞߚ㧚ᧄ⎇ⓥߢߪ㧘ᄢ᳇࿶㕖ᐔⴧ㉄⚛ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ㉄ൻࡊࡠ࠮ࠬߩ෻ᔕࡔࠞ࠾࠭ࡓߦኻߔࠆ⍮⷗ࠍࠃࠅᷓ޿߽32

3212008ߩߣߔࠆߎߣࠍ⋡⊛ߣߒߡ㧘ࡊ࡜࠭ࡑ⊒↢↪ߩ᡼㔚ߦ 10kHzࠍ↪޿ߡ᳇ᶧਔ⋧ߩ෼₸ࠍ⸘▚ߒߚ㧚ߎߎߢ Cg,i, Cl,i ߪߘࠇߙ⒟ᐲߩૐ๟ᵄ(LF)㔚Ḯࠍ↪޿㧘޿ࠊࠁࠆ⺃㔚૕ࡃ࡝ࠕ᡼㔚ࡊࠇ᳇૕ਛ㧘ᶧ૕ਛߩ i ᚑಽỚᐲ㧘F ߪ᳇૕ᵹ㊂㧘t ߪ෻ᔕᤨ㑆㧘࡜࠭ࡑࠫࠚ࠶࠻ࠍ೑↪ߒߡ὇⚛ੑ㊀⚿วߩ㉄ൻࠍ⹜ߺߚ߽

V ߪ෻ᔕᓟߦᱷߞߚ⹜ᢱߩ૕Ⓧ㧘ninit. decene ߪ෻ᔕ೨ߩ 1-࠺࠮ߩߢ޽ࠆ㧚ߎߩૐ๟ᵄൻߦࠃࠅ㧘ࡊ࡜࠭ࡑߪࡈࠖ࡜ࡔࡦ࠻⁁ࡦߩ‛⾰㊂ߢ޽ࠆ㧚ߩ᡼㔚ߣߥࠆ߽ߩߩ㧘ዋ㔚ജൻ߇㆐ᚑߢ߈㧘ࡊ࡜࠭ࡑࠫࠚ࠶

߹ߚ㧘1-࠺࠮ࡦߩ⚿ᨐ߆ࠄផ᷹ߐࠇߚ㉄ൻᯏ᭴߇ઁߩ⹜ᢱ

࠻ߩ᷷ᐲ߽ਅߍࠆߎߣ߇ߢ߈ࠆߣᦼᓙߐࠇࠆ㧚ߘߒߡ RF ߩߦኻߒߡ߽ห᭽ߢ޽ࠆ߆ࠍᬌ⸽ߔࠆߚ߼㧘෻ᔕ‛ߦࠬ࠴࡟ࡦታ㛎⚿ᨐߣߩᲧセࠍⴕ߁ߎߣߦࠃࠅ㧘๟ᵄᢙߩ㆑޿ߣ෻ᔕᕈ

ࠍ↪޿ߚታ㛎߽ⴕߞߚ㧚RF 㔚Ḯ(ASTECH, LG-10S)ࠍ↪޿ߚታ㛎߽ 1-࠺࠮ࡦ㧘ࠬ࠴ߣߩ⋧㑐ࠍ⠨ኤߔࠆ㧚% *  %*1
䎔䎐䎱䏒䏑䏄䏑䏄䏏% * 1 *%%**% *⚛ߣࠕ࡞ࠧࡦߩᷙวࠟࠬࠍ↪޿ߡ޿ࠆ㧚ߥ߅㧘਄ㅀߒߚࠃ߁% *  %1%*
䎕䎐䎧䏈䏆䏄䏑䏒䏑䏈O࡟ࡦࠍ⹜ᢱߣߒߡⴕߞߚ㧚ߎߩ႐ว߽ࡊ࡜࠭ࡑࠟࠬߦߪ㧘㉄*% * 1 *%%**๟ᦼਛߦ RF ಴ജࠍශടߒߡ޿ࠆഀวࠍ␜ߔ㧚਄⸥ߩ෻ᔕታ㛎ߣߪ೎ߦ㧘᡼㔚ߦࠃߞߡ↢ߓߚࠝ࠱ࡦ߇㊀䎔䎏䎕䎐䎨䏓䏒䏛䏜䏇䏈䏆䏄䏑䏈ⷐߥᓎഀࠍߒߡ޿ࠆߣ⠨߃ࠄࠇߚߚ߼㧘޿ߊߟ߆ߩ᧦ઙߩ߽% *  %*%*1

ߣߢ LF, RF ߩਔ᡼㔚ߢߩࡊ࡜࠭ࡑࠫࠚ࠶࠻ਛߩࠝ࠱ࡦỚᐲ䎔䎐䎧䏈䏆䏄䏑䏄䏏ࠍࠝ࠱ࡦ⸘㧔ࠝࠠ࠻ࡠ࠾ࠢࠬ␠, OZM-7000G㧕ߢಽᨆߒߚ㧚࿑㧝 1-࠺࠮ࡦߣ㉄⚛ේሶߣߩ෻ᔕᯏ᭴
Fig.1 Reaction mechanism of 1-decen with oxygen atom.
2.

߼㧘RF ಴ജࠍ๟ᦼ 20ms㧘duty 30, 50%ߣ On-Off ೙ᓮߒߡශടߒ㧘᷷ᐲ਄᣹ࠍᛥ೙ߔࠆᣇ╷ࠍ⹜ߺߚ㧚ߎߎߢ duty ߣߪ 1% * 1 *%%
*
*%
%
*
*

ߦ RF 㔚Ḯߩ႐วߦߪࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ᷷ᐲ߇਄᣹ߔࠆߚ

ታ㛎᧦ઙࠍ Table 1,2 ߦ߹ߣ߼ߚ㧚ታ㛎ⵝ⟎߅ࠃ߮᧦ઙᧄታ㛎ߢ↪޿ߚታ㛎ⵝ⟎ࠍ Fig.2 ߦ㧘᡼㔚ㇱ⹦⚦ࠍ Fig.3 ߦ␜ߔ㧚ⵝ⟎╬ߪၮᧄ⊛ߦએ೨ߩታ㛎 18)ߣหߓߢ޽ࠆ㧚ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߪ㧘⍹⧷▤ౝㇱߩ࠲ࡦࠣࠬ࠹ࡦ᫔㔚ᭂ㧔㜞࿶஥㧕ߣ⍹⧷▤ᄖ஥ߩ SUS ▗㔚ᭂ㧔ធ࿾஥㧕ߣߩ㑆ߦ LF 㜞࿶㔚Ḯ
㧔TREK Inc., PM04015㧕ߩ಴ജࠍශടߒ㧘⊒↢ߐߖߚ㧚ࡊ࡜࠭ࡑࠟࠬߦߪ㧘㉄⚛ߣࠕ࡞ࠧࡦߩᷙวࠟࠬࠍ↪޿㧘ߘࠇߙࠇߩᵹ㊂ߪࡈࡠ࡯ࡔ࡯࠲࡯ߦࠃߞߡᄌ߃ࠄࠇࠆࠃ߁ߦߥߞߡ޿ࠆ㧚᡼㔚ߦࠃߞߡ↢ᚑߒߚࡊ࡜࠭ࡑߪ㧘⹜ᢱ↉ਛߩ 2.0ml
ߩᶧ૕ 1-࠺࠮ࡦߦᾖ኿ߐࠇࠆ㧚⹜ᢱ↉ᄖ⴫㕙ߪ಄ළᯏߦࠃߞ࿑㧞 ታ㛎ⵝ⟎࿑
Fig.2 Experimental apparatus.

ߡ಄ළߒߚ㧚↢ᚑ‛ߩಽᨆߪ㧘⹜ᢱᾖ኿ਛߦឃ಴ߐࠇࠆࠟࠬࠍࠟࠬࠪ࡝ࡦࠫߦࠃߞߡࠨࡦࡊ࡝ࡦࠣߒߚ߽ߩߣ㧘ታ㛎ᓟߩ⹜ᢱ↉ߦᱷߞߚᶧ૕⹜ᢱࠍ㧘ߘࠇߙࠇࠟࠬࠢࡠࡑ࠻ࠣ࡜ࡈ㧔ፉᵤ⵾૞ᚲ,GC-14B㧕ߢቯ㊂ಽᨆߒߚ㧚ߘߒߡ㧘᳇૕஥ߩ↢ᚑ‛ߦߟ޿ߡ
ߪ㧘

Yield

C g ,i u F u tninit .decene(1)߹ߚᶧ஥ߩ↢ᚑ‛ߦߟ޿ߡߪ㧘

Yield

Cl ,i u V
ninit .decene(2)࿑㧟 ࡊ࡜࠭ࡑࠫࠚ࠶࠻⊒↢ㇱ
Fig.3 Plasma jet configuration.

33⴫㧝 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩታ㛎᧦ઙ
Table 1 Experimental conditions for LF plasma jet.

SampleAmountVoltage (effective)

1-decene, styrene
2 ml
2, 3 kV

Frequency
Ar flow rate
O2 flow rate

100 Hz - 10 kHz
1.24 l/min㉄⚛ේሶએᄖߩኼ๮ߩ㐳޿ᵴᕈ⒳ߦࠃߞߡ↢ᚑߒߡ޿ࠆߣ
⠨߃ࠆߣ⺑᣿߇ߟߊ㧚Fig.5 ߪශട㔚࿶ࠍ 3kV ߣߒߚ႐วߩ⚿ᨐߢ޽ࠆ㧚Fig.4 ߣᲧセߔࠆߣ㧘๟ᵄᢙᄌൻߦኻߔࠆ᜼േߪ
ห᭽ߢ޽ࠆ߇㧘㜞޿๟ᵄᢙߢ 1-ࡁ࠽࠽࡯࡞ߩ෼₸߇ᷫዋߒ㧘ઍࠊࠅߦ 1,2-ࠛࡐࠠࠪ࠺ࠞࡦ߇Ⴧടߒߡ޿ࠆ㧚߹ߚ㧘ૐ޿๟ᵄᢙߢߪߤߩ↢ᚑ‛߽෼₸߇Ⴧടߒߚ㧚ߎࠇߪ㧘๟ᵄᢙࠍ㜞ߊߔࠆ㧘߹ߚ㔚࿶ࠍ਄ߍࠆߎߣߢࡊ࡜࠭ࡑࠫࠚ࠶࠻߇િ߮㧘

Reaction time

6.61 - 30.1 ml/min
60min

Temperature
Distance-14.7㷄
2 mm

ߣ⠨߃ࠄࠇࠆ㧚10kHz ߢߩ 1-ࡁ࠽࠽࡯࡞ߩ෼₸ߩᷫዋߦߟ޿

ߘࠇߦ઻޿ᄙߊߩ㉄⚛↱᧪ߩᵴᕈ⒳߇⹜ᢱߣ෻ᔕߒߚߚ߼

ߡߪᓟㅀߔࠆ㧚⴫㧞 㜞๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩታ㛎᧦ઙ
Table 2 Experimental conditions for RF plasma jet.
1-decene, styrene
2 mlFrequency
Voltage

700 kHz
3 kV(pk-pk)

Period

20 ms

duty

30% (for styrene oxidation)
50% (for 1-decene oxidation)

Ar flow rate

1.24 l/min (for styrene oxidation)
1.56 l/min (for 1-decene oxidation)

O2 flow rate

6.61 - 30.1 ml/min

Reaction time
Temperature
Distance60min-14.7㷄
2 mm

Products yield [–]SampleAmount0.03

1–Nonanal
1,2–Epoxydecane
1–Decanal
2–Decanone

0.02

0.01

010

2

3

10Frequency [Hz]104࿑㧠 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ 1-࠺࠮ࡦߩ㉄ൻߦ߅ߌࠆ᡼㔚๟ᵄᢙߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ (㔚࿶ 2kV, ㉄⚛ᵹ㊂ 30.1 ml/min)Fig.4 Products yield as a function of frequency
for 1-decene oxidation with LF plasma jet
at voltage=2 kV and O2=30.1 ml/min.

3. ታ㛎⚿ᨐ߅ࠃ߮⠨ኤ
3.1LF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߦࠃࠆ 1-࠺࠮ࡦߩ㉄ൻታ㛎ߩ⚿ᨐ㧘એ೨ߩ RF ߩታ㛎ߣห᭽ߦ㧘ࠟࠬࠢࡠࡑ࠻ࠣ࡜ࡈߢቯ㊂ಽᨆߢ߈ࠆ⒟㧘Ყセ⊛ᄢ߈ߥࡇ࡯ࠢߢᬌ಴ߐࠇߚ

0.03↢ᚑ‛ߪ㧘1,2-ࠛࡐࠠࠪ࠺ࠞࡦߩઁ㧘1-ࡁ࠽࠽࡯࡞㧘1-࠺ࠞ࠽

1–Nonanal
1,2–Epoxydecane
1–Decanal
2–Decanone࡯࡞㧘2-࠺ࠞࡁࡦߢ޽ߞߚ㧚
Products yield [–]ශട㔚࿶ 2kV ߢ๟ᵄᢙࠍᄌൻߐߖߚߣ߈ߩฦ↢ᚑ‛ߩ෼₸߳ߩᓇ㗀ࠍ Fig.4 ߦ␜ߔ㧚ߎߎߢ෼₸ߪ᳇⋧ߣᶧ⋧ߩ๺ߢ޽ࠆ㧚એ೨ߩ RF ߩታ㛎ߣᲧߴ㧘ࡊ࡜࠭ࡑࠫࠚ࠶࠻᷷ᐲߩૐ
ਅߦࠃࠅ⹜ᢱߩ⫳⊒㊂ࠍᛥ߃ࠆ੐߇ߢ߈㧘߹ߚ㧘᳇⋧ߦሽ࿷ߒߚ↢ᚑ‛ߩ↢ᚑ㊂߽㧘‛⾰ߦࠃࠆ߇㧘ᶧ⋧ߩ߅߅ࠃߘ 10%

0.020.01એਅߢ޽ߞߚ㧚ߎߎߢᵈ⋡ߔߴ߈ὐߪ㧘1-ࡁ࠽࠽࡯࡞߇ᦨ߽ᄙߊ↢ᚑߐࠇߡ޿ࠆߎߣߢ޽ࠆ㧚߹ߚ㧘ᓟㅀߔࠆ RF ߩታ㛎⚿ᨐ߿એ೨ߩ RF ߩ⎇ⓥ⚿ᨐߣ⇣ߥࠅ 1,2-ࠛࡐࠠࠪ࠺ࠞࡦߩ

0෼₸߇ૐ޿㧚ߐࠄߦ㧘100Hz ߢߪ߶ߣࠎߤ෻ᔕ߇ㅴⴕߒߡ޿
ߥ޿߇㧘๟ᵄᢙߩჇടߣ౒ߦ㧘1-ࡁ࠽࠽࡯࡞ߪᄢ߈ߊჇടߔࠆ߽ߩߩ㧘ߘߩઁߩ㉄ൻ‛ߪࠊߕ߆ߦჇട߇⷗ࠄࠇࠆ⒟ᐲߢ
޽ࠆ㧚ߎߩේ࿃ߦߟ޿ߡߪᓟߢ߽⠨ኤߔࠆ߇㧘
LF ߩታ㛎ߢߪ㧘ࡊ࡜࠭ࡑࠫࠚ࠶࠻߇޽߹ࠅિ߮ߕ㧘1,2-ࠛࡐࠠࠪ࠺ࠞࡦߩ↢ᚑⷐ࿃ߣ⠨߃ࠄࠇࠆ㉄⚛ේሶ߇⹜ᢱᶧ㕙߹ߢචಽߦ೔㆐ߢ
߈ߥ߆ߞߚߎߣ߇ផ᷹ߐࠇࠆ㧚ߘߩ৻ᣇߢ㧘1-ࡁ࠽࠽࡯࡞ߪ
- 3 -

102

310
Frequency [Hz]104࿑㧡 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ 1-࠺࠮ࡦߩ㉄ൻߦ߅ߌࠆ᡼㔚๟ᵄᢙߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ (㔚࿶ 3kV, ㉄⚛ᵹ㊂ 30.1 ml/min)Fig.5 Products yield as a function of frequency
for 1-decene oxidation with LF plasma jet
at voltage=3 kV and O2=30.1 ml/min.

34

3212008ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ὇⚛ੑ㊀⚿วߩ㉄ൻ෻ᔕߦ߅ߌࠆ᡼㔚๟ᵄᢙߩᓇ㗀㧔㑐ญ⑲ବࠄ㧕ᰴߦ㧘ዉ౉ߔࠆࠟࠬਛߩ O2 ᵹ㊂ࠍᄌൻߐߖߚ⚿ᨐࠍ Fig.6

࡞ࠡ࡯ߩჇട߇㧘ࠃࠅᄙߊߩ㉄⚛ಽሶߩ⸃㔌ࠍᒁ߈⿠ߎߒ㧘ߦ␜ߔ㧚એ೨ߩ RF ߩታ㛎ߣ⇣ߥࠅ O2 ᵹ㊂ߦ઻߁⹜ᢱߩ⫳⊒ࠝ࠱ࡦ߇↢ᚑߐࠇࠆ߽ߩߣ⠨߃ࠄࠇࠆ㧚O2 ᵹ㊂ߦኻߔࠆ⚿ᨐ㊂ߩᄌൻߪࠊߕ߆ߢ޽ࠅ㧘ߎࠇߪࠫࠚ࠶࠻ߩ᷷ᐲᄌൻ߇߶ߣ

ࠍ Fig.8 ߦ␜ߔ㧚O2 ᵹ㊂ࠍჇടߐߖࠆߣࠝ࠱ࡦỚᐲ߇਄᣹ߒࠎߤή߆ߞߚߎߣߦኻᔕߒߡ޿ࠆ㧚⚿ᨐࠍ⷗ࠆߣ㧘O2 ᵹ㊂ߩߡ޿ࠆ㧚ࠕ࡞ࠧࡦߩᵹ㊂ࠍ࿕ቯߒߡ޿ࠆߚ߼㧘O2 ᵹ㊂ࠍჇടჇടߦኻߒ㧘1-ࡁ࠽࠽࡯࡞ߪჇട௑ะࠍ␜ߔ߇㧘ߘࠇએᄖߩ

ߐߖࠆߣࡊ࡜࠭ࡑਛߩ O2 Ớᐲ߇਄߇ࠆߚ߼ߣ⠨߃ࠄࠇࠆ㧚↢ᚑ‛ߪᷫዋ௑ะࠍ␜ߒߡ޿ࠆ㧚․ߦᶧ⋧ߢߪ㧘1-ࡁ࠽࠽࡯ߎࠇࠄߩ᷹ⷰߐࠇߚ௑ะߪ㧘Figs.4-6 ߢ᷹ⷰߐࠇߚ 1-ࡁ࠽࠽࡞એᄖߪ߶ߣࠎߤ↢ᚑߐࠇߡ޿ߥ߆ߞߚ㧚ߎߩߎߣ߆ࠄ߽㧘࡯࡞ߩ↢ᚑ᜼േߦ৻⥌ߒߡ߅ࠅ㧘1-ࡁ࠽࠽࡯࡞ߪ 1-࠺࠮ࡦߣ

1-ࡁ࠽࠽࡯࡞ߩ↢ᚑࡔࠞ࠾࠭ࡓߪ 1,2-ࠛࡐࠠࠪ࠺ࠞࡦߥߤߩࠝ࠱ࡦߣߩ෻ᔕߦࠃߞߡ↢ᚑߔࠆ߽ߩߣផ᷹ߐࠇࠆ㧚ߚߛߒ㧘ઁߩ㉄ൻ↢ᚑ‛ߣ⇣ߥࠆߣ⠨߃ࠄࠇࠆ㧚ታ㛎ߢߪ㧘O2 ᵹ㊂ࠍ

๟ᵄᢙ 10kHz ߢ O2 ᵹ㊂߇ᦨ߽ᄙ޿႐วߦ 1-ࡁ࠽࠽࡯࡞ߩ↢Ⴧടߐߖࠆߣࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ෼❗߇᷹ⷰߐࠇߚߎߣ߆ᚑ෼₸ߪૐ޿㔚࿶ߩ߶߁߇㜞߆ߞߚ߇㧘Fig.8 ߩหᵹ㊂ߢߩࠝࠄ㧘ࠟࠬਛߩ O2 Ớᐲ߇Ⴧടߒߡ߽ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ෼❗

࠱ࡦỚᐲߪ㔚࿶ߩჇടߦኻߒߡࠝ࠱ࡦỚᐲ߽㜞ߊߥߞߡ߅

ߩᓇ㗀߇ᄢ߈ߊ㧘⚿ᨐ⊛ߦ⹜ᢱߣធ⸅ߔࠆ㗔ၞߢߪ㉄⚛ේሶࠅ㧘ߎߩὐߦߟ޿ߡߪࠫࠚ࠶࠻ਛߢߩฦᵴᕈ⒳ߩ᜼േࠍ⹦ߒ

ߥߤߩኼ๮ߩ⍴޿࡜ࠫࠞ࡞Ớᐲ߇ዊߐߊߥߞߚߣ⠨߃ࠄࠇࠆ㧚ߊ⺞ߴࠆᔅⷐ߇޽ࠆ㧚1-ࡁ࠽࠽࡯࡞ߩ↢ᚑ߇ࠝ࠱ࡦߣߩ෻ᔕߢ޽ࠆߎߣࠍᬌ⸽

1–Nonanal
1,2–Epoxydecane
1–Decanal
2–Decanoneߔࠆታ㛎ߣߒߡ㧘᡼㔚ㇱ⍹⧷▤಴ญߦᦝߦ㐳ߐ⚂ 12cm ߩ⍹⧷▤ࠍធ⛯ߒ㧘ߘߩవ┵ࠍ⹜ᢱᶧߦᝌ౉ߒߡ㧘1-࠺࠮ࡦߩ㉄

0.02

Ozone concentration [ppm]Products yield [–]

0.03

200

0.01

100

00

102030

Oxygen flow rate [ml/min]࿑㧢 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ 1-࠺࠮ࡦߩ㉄ൻߦ߅ߌࠆ㉄⚛ᵹ㊂ߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ(㔚࿶ 2kV, ๟ᵄᢙ 10 kHz)
Fig.6 Products yield as a function of O2 flow rate
for 1-decene oxidation with LF plasma jetat voltage=2 kV and frequency=10 kHz.
3.2

0102Frequency [Hz]104࿑㧣 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ߦࠃࠅ↢ᚑߒߚࠝ࠱ࡦ
Ớᐲߦኻߔࠆ᡼㔚๟ᵄᢙߩᓇ㗀 (㔚࿶ 2kV)
Fig.7 Ozone generation as a function of frequency
in LF plasma jet at voltage=2 kV.

LF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ਛߩࠝ࠱ࡦỚᐲ

Ozone concentration [ppm]

LF ߩታ㛎ߢߪ㧘1-ࡁ࠽࠽࡯࡞ߣઁߩ㉄ൻ‛ߣߩ↢ᚑ᜼േߦ㆑޿߇㗼⪺ߦ⃻ࠇߚ㧚߹ߚએ೨ߩ RF ߩታ㛎ߦ߅޿ߡ߽㧘㔚200ᭂㇱಽߣ⹜ᢱߣߩ〒㔌ࠍ 3㨪30mm ߣᄌൻߐߖߚ㓙ߦ 1-ࡁ࠽࠽࡯࡞ࠍ㒰ߊ 1,2-ࠛࡐࠠࠪ࠺ࠞࡦ╬ߩ㉄ൻ‛ߪ〒㔌߇㐳ߊߥࠆߣᷫዋߔࠆߩߦኻߒ㧘1-ࡁ࠽࠽࡯࡞ߩ↢ᚑ㊂ߪ〒㔌ߦࠃߞ

1.5kV
2kV
2.5kV100ߡ૛ࠅᓇ㗀ࠍฃߌߥ߆ߞߚ㧚ߘߎߢ਄ㅀߒߚࠃ߁ߦ㧘1-ࡁ࠽࠽࡯࡞ߩ↢ᚑ᜼േ߇ኼ๮ߩ㐳޿ᵴᕈ⒳ߦ⿠࿃ߔࠆߣ⠨߃㧘น⢻ᕈߩ޽ࠆ߽ߩߣߒߡࠝ࠱ࡦࠍ୥⵬ߦ޽ߍߚ㧚ߔߥࠊߜ㧘1ࡁ࠽࠽࡯࡞ߪࠝ࠱ࡦߦࠃߞߡ↢ᚑߐࠇࠆ߽ߩߣផ᷹ߒ㧘ฦታ

00㛎᧦ઙߢࠫࠚ࠶࠻ਛߩࠝ࠱ࡦỚᐲࠍ᷹ቯߒߚ㧚๟ᵄᢙߦኻߔࠆࠝ࠱ࡦỚᐲߩᓇ㗀ࠍ Fig.7 ߦ␜ߔ㧚࿑߆ࠄ

1020
Oxygen flow rate [ml/min]30࿑㧤 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ߦࠃࠅ↢ᚑߒߚࠝ࠱ࡦ
Ớᐲߦኻߔࠆ㉄⚛ᵹ㊂ߩᓇ㗀 (๟ᵄᢙ 10kHz)
Fig.8 Ozone generation as a function of O2 flow ratein LF plasma jet at frequency=10 kHz.

᣿ࠄ߆ߥࠃ߁ߦ㧘๟ᵄᢙߩჇടߣ౒ߦᕆỗߥࠝ࠱ࡦỚᐲߩ਄᣹߇᷹ⷰߐࠇߡ޿ࠆ㧚ߎࠇߪ㧘๟ᵄᢙߩჇടߦ઻߁ᛩ౉ࠛࡀ

- 4 -

350.01ൻࠍ⹜ߺߚ㧚ߎࠇߪ㧘᡼㔚ㇱࠍㅢㆊߒߚࠟࠬ߇ᣂߚߦขࠅઃ

1–Nonanal
1,2–Epoxydecane
1–Decanal
2–Decanoneߌߚ⍹⧷▤ࠍㅢㆊߔࠆ㓙ߦ㧘ኼ๮ߩ⍴޿ᵴᕈ⒳㧔ߚߣ߃߫㉄
Products yield [–]⚛ේሶߥߤ㧕ߪᄬᵴߒ㧘ኼ๮ߩ㐳޿ࠝ࠱ࡦ߿቟ቯߥ㉄⚛ಽሶߛߌ߇⍹⧷▤߆ࠄឃ಴ߐࠇࠆߎߣࠍᗐቯߒߚ߽ߩߢ޽ࠅ㧘ࠝ࠱ࡦߩ෻ᔕ߇㗼⪺ߦ⃻ࠇࠆߣ⠨߃ࠄࠇࠆ㧚ታ㛎ߩ⚿ᨐ㧘੍ᗐߐࠇߚߣ߅ࠅ 1-࠺࠮ࡦ߇෻ᔕߒ㧘1-ࡁ࠽࠽࡯࡞߇↢ᚑߒߚ㧚

0.005߹ߚ㧘ߘࠇએᄖߦ⷗ࠄࠇߚ↢ᚑ‛ߩࠟࠬࠢࡠࡑ࠻ࠣ࡜ࡈߩࡇ
࡯ࠢ㕙Ⓧߪ㧘1-ࡁ࠽࠽࡯࡞ߩ 100 ಽߩ 1 એਅߢ޽ࠅ㧘ߎߩߎߣ߆ࠄ߽㧘1-ࡁ࠽࠽࡯࡞ߩ↢ᚑ߇ࠝ࠱ࡦߦᒝߊଐሽߒߡ޿ࠆ
ߎߣ߇␜ໂߐࠇߚ㧚00৻⥸ߦࠕ࡞ࠤࡦߩࠝ࠱ࡦ⸃ⵚߪ㧘(3)ᑼߦ␜ߔࠃ߁ߦࠝ࠱ࡦ

20
Oxygen flow rate [ml/min]40࿑㧥 㜞๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ 1-࠺࠮ࡦߩ㉄ൻ
ߦ߅ߌࠆ㉄⚛ᵹ㊂ߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ
Fig.9 Products yield as a function of O2 flow rate for
1-decene oxidation with RF plasma jet.

ߣߩ෻ᔕߦࠃߞߡࠝ࠱࠾࠼߇↢ᚑߐࠇ㧘੝㋦ߥߤߩㆶర೷ߦ
ࠃࠅࠕ࡞࠺ࡅ࠼߿ࠤ࠻ࡦߦಽ⸃ߐࠇࠆ㧚ᧄ෻ᔕ႐ߢߪㆶర೷
߇ሽ࿷ߒߥ޿߇㧘ߎࠇߦ㘃ૃߒߚᯏ᭴ࠍㅢߒ㧘1-ࡁ࠽࠽࡯࡞
߇↢ᚑߒߚߣ⠨߃ࠄࠇࠆ㧚ߥ߅㧘ߎߩᯏ᭴ߢㅴࠎߢ޿ࠆߩߢ

3.4

޽ࠇ߫ࡎ࡞ࡓࠕ࡞࠺ࡅ࠼߇↢ᚑߔࠆߎߣߦߥࠆ߇㧘ᧄ⎇ⓥߢ

ࠬ࠴࡟ࡦߩ㉄ൻ෻ᔕ⹜ᢱߦࠬ࠴࡟ࡦࠍ↪޿ߚ႐ว㧘LF 㔚Ḯߣ RF 㔚Ḯߩታߪࠪࠬ࠹ࡓߩ໧㗴߆ࠄᬌ಴ߢ߈ߥ߆ߞߚ㧚㛎ߣ߽㧘↢ᚑ‛ߦߪ㧘Fig.10 ߦ␜ߔࠃ߁ߦ㧘ࡌࡦ࠭ࠕ࡞࠺ࡅ
࠼㧘ࠬ࠴࡟ࡦࠝࠠࠪ࠼㧘ࡈࠚ࠾࡞ࠕ࠮࠻ࠕ࡞࠺ࡅ࠼㧘ࠕ࠮࠻(3)ࡈࠚࡁࡦ߇⷗ࠄࠇߚ㧚ߎࠇࠄߪߘࠇߙࠇ 1-࠺࠮ࡦߩ㉄ൻߩ႐วߩ㧘1-ࡁ࠽࠽࡯࡞㧘1,2-ࠛࡐࠠࠪ࠺ࠞࡦ㧘1-࠺ࠞ࠽࡯࡞㧘2-

3.3

࠺ࠞࡁࡦߦኻᔕߔࠆߣ⠨߃ࠄࠇࠆ㧚ߔߥࠊߜ὇⚛ੑ㊀⚿วߦ

RF ࡊ࡜࠭ࡑࠫࠚ࠶࠻RF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ 1-࠺࠮ࡦߩ㉄ൻߩ⚿ᨐࠍኻߒ㧘ห᭽ߥ෻ᔕ߇ㅴⴕߔࠆߎߣ߇␜ໂߐࠇߚ㧚ಽᨆߢߪઁ

Fig.9 ߦ␜ߔ㧚಴ജߩ On-Off ೙ᓮߦࠃࠅᦨᄢߢ߽ 100͠⒟ᐲ

ߩࡇ࡯߽ࠢ⷗ࠄࠇߚ߇㧘ߘࠇࠄߩࡇ࡯ࠢ㕙Ⓧߪ਄⸥ 4 ⒳ߣᲧ

ߣࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ᷷ᐲࠍਅߍࠆߎߣ߇ߢ߈㧘ߘߩߚ߼ LFߴࠆߣዊߐߊ㧘߹ߚࠟࠬࠢࡠࡑ࠻ࠣ࡜ࡈ⾰㊂ಽᨆེߢ߽ಽᨆߩ႐วߣห⒟ᐲߦࠫࠚ࠶࠻ࠍᶧ㕙ߦㄭߠߌࠆߎߣ߇น⢻ߣߒߚ߇หቯߔࠆߦߪ⥋ࠄߥ߆ߞߚ㧚ߒߚ߇ߞߡ㧘ࡌࡦ࠯ࡦⅣߥߞߚ㧚ߚߛ㧘ߘࠇߢ߽⹜ᢱߩ⫳⊒㊂ߪ LF ߩታ㛎ߦᲧߴߡ߇⸃ⵚߒߚࠅ㧘㉄ൻߒߚ↢ᚑ‛ߪ߶ߣࠎߤή޿ߣ⸒߃ࠆ㧚⺃㔚૕ࡃ࡝ࠕ᡼㔚ࠍ೑↪ߒߚࡌࡦ࠯ࡦ߿࠻࡞ࠛࡦߩㇱಽ㉄ൻ

ᢙ୚⒟ᐲ޽ߞߚ㧚⚿ᨐࠍ⷗ࠆߣ㧘એ೨ߩ⎇ⓥࠃࠅ߽෼₸ߪૐ޿߽ߩߩ㧘LF ᡼㔚ߢߩ⚿ᨐߣ⇣ߥࠅ㧘1,2-ࠛࡐࠠࠪ࠺ࠞࡦ㧘16)ߢߪ㧘᡼㔚ਛߦ෻ᔕ⹜ᢱࠍዉ౉ߔࠆߚ߼ㇱಽ㉄ൻ߿ࡌࡦ࠯

1-࠺ࠞ࠽࡯࡞㧘2-࠺ࠞࡁࡦߣ޿ߞߚ㉄⚛ේሶߦࠃࠅ↢ᚑߔࠆ

ࡦⅣߩ⸃ⵚ߇⷗ࠄࠇߚ߇㧘ߎߩࠫࠚ࠶࠻ᣇᑼߢߪ㧘ߎࠇࠄࠃ㉄ൻ‛߇ᄙߊ↢ᚑߒ㧘߹ߚ㧘O2 ᵹ㊂ߦኻߒߎࠇࠄߩ㉄ൻ‛ߪࠅ᷷๺ߥ᧦ઙߢ෻ᔕ߇ㅴⴕߔࠆ߽ߩߣ޿߃ࠆ㧚ᷫዋ௑ะࠍ␜ߔߩߦኻߒ㧘ࠝ࠱ࡦ߆ࠄ↢ᚑߔࠆߣ⠨߃ࠄࠇߚO2 ᵹ㊂ࠍᄌൻߐߖߚ႐วߩ㧘
LF 㔚Ḯߢߩ⚿ᨐࠍ Fig.11 ߦ㧘

1-ࡁ࠽࠽࡯࡞ߛߌ߇㧘ᵹ㊂ࠍჇടߐߖࠆߣ⧯ᐓჇടߒߡ޿ࠆ

RF 㔚Ḯߢߩ⚿ᨐࠍ Fig.12 ߦ␜ߔ㧚LF ߩ႐วߦߪ᣿ࠄ߆ߦࡌ௑ะ߇⷗ࠄࠇࠆ㧚ࡦ࠭ࠕ࡞࠺ࡅ࠼ߩ↢ᚑ㊂߇ઁߣᲧセߒߡᄙߊ㧘ࠬ࠴࡟ࡦࠝࠠ

LF ߩ⚿ᨐ߆ࠄផ᷹ߐࠇߚࠃ߁ߦ 1-ࡁ࠽࠽࡯࡞ߩ↢ᚑߦߪࠪ࠼╬ߩ↢ᚑ߇߶ߣࠎߤ⷗ࠄࠇߥ޿ߩߦኻߒ㧘RF ߩ႐วߪࠝ࠱ࡦ߇㊀ⷐߥᓎഀࠍᜂߞߡ޿ࠆߣ⠨߃㧘RF ࡊ࡜࠭ࡑࠫࠚࡌࡦ࠭ࠕ࡞࠺ࡅ࠼ߩ↢ᚑ㊂ߪ㜞޿߽ߩߩ㧘ࠬ࠴࡟ࡦࠝࠠࠪ࠼࠶࠻ߩࠝ࠱ࡦỚᐲߩ᷹ቯ߽ⴕߞߚ㧚ߘߩ⚿ᨐ㧘ࡄ࡞ࠬ๟ᦼ╬ߩ↢ᚑ‛߇߆ߥࠅჇ߃ߡ޿ࠆߎߣ߇ࠊ߆ࠆ㧚߹ߚ㧘O2 ᵹ㊂20ms ߢߪ duty ࠍᄌ߃ߡ߽ࠝ࠱ࡦߪᬌ಴ߐࠇߥ߆ߞߚ㧚ߎࠇߦኻߔࠆ᜼േ߽㧘LF㧘RF ߣ߽ O2 ᵹ㊂ߩჇടߣߣ߽ߦࡌࡦ࠭

ߪࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ᷷ᐲ߇㜞޿ߚ߼ߣᕁࠊࠇࠆ㧚ߥ߅㧘㔚ࠕ࡞࠺ࡅ࠼ߩ↢ᚑ㊂߇Ⴧടߒߡ߅ࠅ㧘RF ߩ႐วߢߪታ㛎ὐḮߩቯᩰᄖߢ޽ࠆ߇๟ᦼࠍ 1ms ⒟ᐲ߹ߢ⪭ߣߒߚߣߎࠈ㧘߇ዋߥ޿߽ߩߩ㧘ࡈࠚ࠾࡞ࠕ࠮࠻ࠕ࡞࠺ࡅ࠼㧘ࠕ࠮࠻ࡈࠚࡁ

duty30%ߢ⚂ 30ppm ߩࠝ࠱ࡦࠍ᷹ⷰߒߚ㧚ߒ߆ߒߎߩ୯ߢ߽

ࡦߪ㧘ᵹ㊂Ⴧടߣ౒ߦᷫዋߒߡ߅ࠅ㧘ߎࠇࠄߪߔߴߡ 1-࠺࠮

LF ߩ႐วߦᲧߴ⚂ 1 ᩴዊߐߊ㧘ࠃߞߡ↢ᚑߔࠆࠝ࠱ࡦỚᐲߩࡦߩ LF, RF ߩታ㛎⚿ᨐߣ㘃ૃߒߡ޿ࠆ㧚1-࠺࠮ࡦߣߩ㆑޿ߪ㧘㆑޿߇㧘LF ߣ RF ߩ↢ᚑ‛ಽᏓߩ㆑޿ߦߟߥ߇ࠆ߽ߩߣ⠨߃RF ߩ႐วߦ߅޿ߡࠛࡐࠠࠪߢ޽ࠆࠬ࠴࡟ࡦࠝࠠࠪ࠼ࠃࠅ߽ࠄࠇࠆ㧚ࡌࡦ࠭ࠕ࡞࠺ࡅ࠼ߩᣇ߇㧘෼₸߇㜞޿ߎߣߢ޽ࠅ㧘ߎࠇߪࠬ࠴࡟ࡦߣ 1-࠺࠮ࡦߩ㉄⚛ේሶߦኻߔࠆ෻ᔕᕈߩ㆑޿ߢ޽ࠆ
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36

3212008ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚ὇⚛ੑ㊀⚿วߩ㉄ൻ෻ᔕߦ߅ߌࠆ᡼㔚๟ᵄᢙߩᓇ㗀㧔㑐ญ⑲ବࠄ㧕% * %*1ߣ⠨߃ࠄࠇࠆ㧚

Benzaldehydeߎߩࠃ߁ߦ㧘1-࠺࠮ࡦ㧘ࠬ࠴࡟ࡦߣ߽㉄ൻ‛߇↢ᚑߒߚߎ

1 *%%*% **%  %% *

Oxygen plasmaߣ߆ࠄ㧘ᄢ᳇࿶ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ೑↪ߒߚᧄᣇᴺߪᐢߊ὇

**⚛ੑ㊀⚿วߩ㉄ൻߦㆡ↪ߢ߈ࠆߣ੍ᗐߐࠇࠆ㧚ߘߒߡ㧘ࠃࠅ

Styereneoxideઃടଔ୯ߩ޽ࠆࠛࡐࠠࠪࠍวᚑߔࠆߦߪ㧘᡼㔚๟ᵄᢙߩ㜞޿*ᣇ߇᦭೑ߢ޽ࠆߣ⠨߃ࠄࠇࠆ㧚% * %1%*

Styerene

Acetphenone4.

% * %*%*1ᧄ⎇ⓥߢߪ LF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ೑↪ߒߚᄢ᳇࿶㕖ᐔⴧ

Phenylacetaldehyde

Products yield [–]߹ߣ߼࿑ 10 ࠬ࠴࡟ࡦ㉄ൻߦ߅ߌࠆ↢ᚑ‛
Fig.10 Products for styrene oxidation.

㉄⚛ࡊ࡜࠭ࡑࠍ↪޿ߡ㧘1-࠺࠮ࡦߩ὇⚛ੑ㊀⚿วߩ㉄ൻࠍ⹜

0.03ࠚ࠶࠻ߩታ㛎ߢߪ㧘RF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ⚿ᨐߣ⇣ߥࠅ㧘ߺ㧘RF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߩ⚿ᨐߣᲧセߒߚ㧚LF ࡊ࡜࠭ࡑࠫ

Benzaldehyde
Styreneoxide
Phenylacetaldehyde
Acetphenone

1-ࡁ࠽࠽࡯࡞߇ᦨ߽ᄙߊ↢ᚑߐࠇߚ㧚ߎࠇߣᐔⴕߒߡⴕߞߚࠝ࠱ࡦỚᐲߩ᷹ቯߦࠃࠅ㧘1-ࡁ࠽࠽࡯࡞ߪࠝ࠱ࡦߣߩ෻ᔕߦࠃߞߡ↢ᚑߐࠇࠆߣ⠨߃ࠄࠇߚ㧚RF ࡊ࡜࠭ࡑࠫࠚ࠶࠻ߣߩ0.02

㆑޿ߪ㧘ࠫࠚ࠶࠻ਛߦ↢ᚑߐࠇࠆࠝ࠱ࡦߣ㉄⚛ේሶߩỚᐲ߇᡼㔚๟ᵄᢙߦଐሽߔࠆߚ߼ߣ⠨߃ࠄࠇߚ㧚߹ߚ㧘⹜ᢱߦࠬ࠴࡟ࡦࠍ↪޿ߡታ㛎ࠍⴕ޿㧘1-࠺࠮ࡦߣห᭽ߥ⚿ᨐ߇ᓧࠄࠇ㧘

0.01

ᧄᣇᴺߪᐢߊ὇⚛ੑ㊀⚿วߩ㉄ൻߦㆡ↪ߢ߈ࠆߎߣ߇␜ໂߐࠇߚ㧚

001020ෳ⠨ᢥ₂S.L.Yao, T.Takemoto, F.Ouyang, A.Nakayama, E.Suzuki,A.Mizuno, and M.Okumoto: Energy Fuels, 14 (2000) 459
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J. Phys. Chem. A, 105 (2001) 5304
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Appl., 39 (2003) 340
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Appl., 40 (2004) 1476
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30

Oxygen flow rate [ml/min]࿑ 11 ૐ๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚࠬ࠴࡟ࡦߩ㉄ൻߦ߅ߌࠆ㉄⚛ᵹ㊂ߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ(㔚࿶ 2kV, ๟ᵄᢙ 10kHz)
Fig.11 Products yield as a function of O2 flow rate
for styrene oxidation with LF plasma jet
at voltage=2 kV and frequency=10 kHz.
0.03

Products yield [–]Benzaldehyde
Styreneoxide
Phenylacetaldehyde
Acetphenone
0.02

0.01

00102030

Oxygen flow rate [ml/min]࿑ 12 㜞๟ᵄࡊ࡜࠭ࡑࠫࠚ࠶࠻ࠍ↪޿ߚࠬ࠴࡟ࡦߩ㉄ൻߦ߅ߌࠆ㉄⚛ᵹ㊂ߦኻߔࠆ↢ᚑ‛෼₸ߩᄌൻ
Fig.12 Products yield as a function of O2 flow rate
for styrene oxidation with RF plasma jet.

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