Overseas Trends

2nd Japan-Korea-China MEMS Standardization Workshop heldin Gyeongju, South Korea (June 22 - 23, 2006)
The Micromachine Center is playing a leading role in
MEMS international standardization activities. As a result of
the Center's activities, Japan has led other countries inpromoting such standardization activities as the publication of
the “MEMS Glossary,” “Tension test methods for thin filmmaterials” and “Fatigue test methods for thin film materials”.*
In recent years, South Korea has also begun active efforts inthis area.
Japan and South Korea in particular feel that it is important
to exchange views regarding MEMS standardization and seek
future cooperation. As a result, last year the first Japan-KoreaChina MEMS Standardization Workshop was held. TheWorkshop provides a forum for discussions relating tostandardization proposals and the possibility of conducting joint
research relating to MEMS standardization. This year thesecond Workshop was held June 22 - 23, 2006 in Korea and at
the Concord Hotel in Gyeongju, South Korea.
Gyeongju is a historic city that served as the capital during
the Silla Era. It is also famous throughout the world for its many
historical treasures.

Next, there were three presentations by Japanese
researchers. First was Professor Iwaoka of Kanazawa Instituteof Technology, who gave a presentation entitled “MEMSTechnology Trends and Needs of MEMS Standardization forIndustry.” He spoke about overall technical trends relating toMEMS and, based on a comparison of the technicalinfrastructure for IC and MEMS, emphasized the need for astrategic standards program in the MEMS field. Next, Professor
Takashima of Kumamoto University gave a presentation entitled“Round-Robin Test on Fatigue of Thin Films for MEMS
Applications in Japan.” He presented an overview of the roundrobin fatigue tests conducted from 2003 through 2005 andtalked about a draft proposal for a thin film fatigue test method
to be presented to the IEC TC/WG4. Finally, Associate
Professor Tsuchiya of Kyoto University gave a presentation
entitled “Humidity Effect on Tensile Strength and Fatigue
Properties of Single Crystal Silicon Microstructures.” He spoke
about the latest research into the fatigue properties of single
crystal silicon microstructures.
This second Japan-Korea-China MEMS Standardization
Workshop was significant in that the presentations fromJapanese speakers served to showcase the outstanding andinnovative nature of Japan’s standardization proposals relating
to MEMS material evaluation. Moreover, the Koreanpresentations demonstrated the great interest in Korea in bothstandardization in the MEMS field and research into techniques
for evaluating thin film materials and underscored the intensive
efforts being made in Korea with regard to standardization. At
the Welcome Party held at the Gyeongju Concord Hotelfollowing the presentations, there was a spirited exchange ofperspectives and technical knowledge between the Japaneseand Korean researchers. The location and other details for thenext Workshop are expected to be decided this autumn.

Professor Sekwang Park of Kyungpook National University,
the project leader for the International ElectrotechnicalCommission (IEC) TC/WG4, presided over the Workshop.
Seven lectures were presented on the special theme of “Thinfilm testing of MEMS and NEMS.”

Photo 1 Concord Hotel (Gyeongju)
Unfortunately there were no attendees from China.
However, seven delegate from Japan, from such organizations
as the International Standardization Engineering Laboratory,
Kumamoto University, Kanazawa Institute of Technology, Kyoto
University, New Energy and Industrial Technology
Development Organization (NEDO) and so on, were inattendance, and approximately 20 persons from South Korea
attended. The attendees listened to lectures and participated ina discussion of the latest research developments andstandardization in this field.
Following words of welcome from Professor Park, there
were four presentations from Korean researchers. Dr. Nak-Kyu
Lee of the Korea Academy of Industrial Technology (KAITECH)
gave a presentation entitled “Micro Material Property
Measurement Technology of Micro Thin Film Materials.”Professor Chung-Seog Oh of Kumoh National Institute ofTechnology gave a lecture entitled “Some Efforts in Improving
the Mechanical Properties Measurement Acciracy for ThinFilms.” Dr. Yong-Hak Huh of the Korea Research Institute ofStandards and Science (KRISS) gave a presentation entitled“Measurement of Micro-tensile Properties for Thin Film
Materials using Micro-ESPI Technique.” Finally, Professor JunHyub Park of TongMyong University gave a presentation
entitled “Tensile and Fatigue Test of Thin Film by New Test
Procedure.”

Photo 2 Speakers and participants from JapanTop left : Professor Iwaoka
Bottom left : Associate Professor Tsuchiya
Top right : Professor Takashima
Bottom right : Director Owada* “MEMS Glossary” (FY2005 International Standard [IS])“Tension test methods for thin film materials” (FY2006
International Standard [IS])“Fatigue test methods for thin film materials” (Proposed FY2006
New Process [NP])7