EUV SASE_
FEL pÌTvÆr[CÌ»ói[1CH¡á1,2Cx~i1,2CÊì«¡1CLìq1,2C
oìî1Cî´q¼1CØºmº1,2Cåg×¿2Cå´¡F1,2v|

1»w¤ X ü©Rdq[U[væi{§679_5148 ºÉ§²pS²p¬õs 1_1_1

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SCSS ±Á¬íª­¶·éÉOiEUVjÌæÌ©È©­úË^Ì©Rdq[U[iSASE_FELjÌ

r[CÌ»óÆpÌTvÉÂ¢Äñ·éBEUV SASE_FEL ÌpÍC2008Nx©çöåÉæÁÄsíêÄ
¢éBr[CÌåv@íÆµÄCAbel[^[CpXZN^[CWõVXeCKXj^[CFEL ¯útFgb[U[ÉÂ¢ÄÐî·éBÜ½C[U[Æ FEL Ì^C~Oðªè·é EO TvO¤Ì¬ÊÉÂ¢ÄàÐî·éB1. Í¶ßÉt¯Ä¢éB±êÜÅÌ 2 N¼i2008N A ú©ç2010N
B újÅÀ{ÛèÍ×81

SCSS ±Á¬íÍC2005NÉCäªÆ©Ìû®ÅÌèCàO[v¾¯ÅÈ­CtXChCcCC^AC`FRCI_RpNgÈ X ü©Rdq[U[iXFELjÝÌÀÈÇO¤O[v©çÌ\¿àÜÜêÄ¢éBSCSS»Â\«]¿ðÚIÆµÄÝ³ê½B2006NÉ»ÌÚÌ EUV_FEL ðpµ½¤ÒÍ·ÅÉ100¼ð´¦Ä¢IªB¬³êCÅ ÌæÌ XFEL À@ÝvæªX^[géB¤ªìÍCXFEL pîÕZpJ­C´qªqÈµ½ãÉÍCXFEL Á¬íiÀ@jÌ R&D Ép³êÄ

wC´¬ªõCõ¨«CÞ¿ÈwCvY}ÈwCR

«½B2007NÉÍCÉOiEUVjÌæÉ¨¢ÄC©È©­úË^iSelf­amplied

spontaneousemission;

SASEjÌ©Rdq[U[iFELjÌoÍOaðB¬µq[gUC[WOC¼±ÌvZXÈÇ½òÉ
í½éB±êç¤¬ÊÌêÍC·ÅÉ_¶­\³êC{ÁWÅàñµÄ¢éB{eÅÍCEUV_FEL pÌTvÆr[CÌ»½B
SCSS ª­¶·éõig·51`61 nmjÍC´PxóÉÖµÄñ·éBæ 2 ÍÅÍ EUV_FEL ÌõÁ«É

iVNgúËõÌ10­{jC´ZpXitFÂ ¢ ÄÜ Æ ßé B æ 3 Í År [  C \ ¬ ð q× ½

gbÌæjCóÔRq[XÆ¢¤ 3 ÂÌå«ÈÁ¥ãCåÈ¤pîÕ@íÌÚ×ÉÂ¢ÄÐî·éBæ 4 Íé1)B±êçÍCg·ÍÙÈéª XFEL ÌÁ¥Æ¤ÊÅÍ FEL ¯útFgb[U[VXeÉÂ¢Äq×ªèCXFEL À@Ìr[C@íâÀ±éBæ 5 ÍÅÍ EO TvO@Éæé^C~Ovª u Ì  ± J ­ Ì ½ ß É SCSS Ì  p ¿ l Í É ß Ä À±ÉÂ¢Äñ·éBæ 6 ÍÅÍpÌTvÉÂ¢Ä¢BÜ½C±êÜÅÉÈ¢Á¥ðàÂ EUV ÌæÌ[

q×éB

·éàÌÅ

U[õðpµ½Vµ¢TCGXÌJñÖÌúÒàÜ

XFEL À@Ìr[CÉÖµÄÍC{ÁWÌÍÁÄ¢éB±Ì½ßäXÍCSCSS ±Á¬íð EUV_Íð´¦é½ßÉ{eÅÍÐîµÈ¢B²»¡Ì

FEL pÌõ¹Æ·é½ßÉCÁ¬íglÆÍÆ§

ÍC{ÌuSPring­8 É¨¯é XFEL/EUV_FEL r[µ½uEUV [U[À±vðÝµCEUV_FEL r[

C£3)¨æÑuXFEL/SPring­8CÌJ­É®õðißÄ«½B

Design Report£4)ðQÆµÄ¢½¾«½¢BBeamlineéûTechnical

EUV _FEL Ì  p Í C  [ U [ o Í O a B ¬ ¼ ã Ì
2007N10©ç2008N 3 ÜÅÉ¶ÈÈ XFEL pi

2. EUV_FEL ÌõÁ«¤ÛèÌRà³öiåjçÆãc³öikåjçÌ
2 O[vÌ¦Íð¾Ä±IÉJn³êCÌp¬Ê

SCSS ±Á¬íÍCdqr[GlM[250 MeV

à¾çê½2)B±Ì¬÷ðó¯Ä2008Nx©çöåÉæé

iXFEL À@Ì 1/32jÌü`Á¬íÆüú·15 mm ÌZpðJnµ½BöåÍN 3 ñÌy[XÅsíêCpüú^ó~AW

i¤ÛèÌO[vÉÁ¦ÄCêÊ©çÌåàó¯¨èCSASE Ì´ÉîÃ¢½CÅZg·ª51 nm ÌÉ[^[ðgÝí¹Ä\¬³êÄúËõ Sept. 2010 Vol.23 No.5  279(C) 2010 The Japanese Society for Synchrotron Radiation ResearchOÌæÌ©Rdq[U[õð¶¬·éB©­úËð¹ÆÅéB·é SASE ^ FEL ÍCõ­xCÔ\¢CXyNg\¢ªpXÉÙÈéBõÁ«ð Table 1 É¦·BSg

3. r[CÌTv·60 nm ÌXyNgð Fig. 1 É¦·BÂüÍVOVéBEUV _FEL r [   C  Ì T ª } ð Fig. 2 É ¦ · B

SASE_FEL ÍCÝèg·ðSÉÙÈÁ½XyNg

EUV ÌæÌõÍ·×ÄÌ¨¿Å­­zû³êé½ßC

Ìõð­UµCXyNgÌ½ÏÍCñ 1÷iFWHMj

r[CÉÍ^óuÇªÈ­C10|5 Pa ÈºÌ^óxbgCÔüÍ50VbgÌ½ÏXyNgÅÉÛ½êÄ¢éBÁ¬íglàÌr[CÍCA
Table 1

Performance of EUV SASE_FEL from the SCSS test
accelerator

nr[CÆõffVXe©çÈéBAnr[
CÍC2 Ì½Ê~[Éæè EUV [U[À±Radiation wavelength at saturation condition

51`61 nm

i9 m~14 mjÖ EUV_FEL õð±­Bã¬¤~[

Photon energy at saturation condition

20`24 eVÌõ²©çÌÞðÉæèCEUV_FEL õÍÁ¬ígl1÷àÌõffVXeÖ±©êé6)B±±ÅCEUV_FEL

Spectral width (FWHM)`30 mJ/pls

Pulse energy average at ID exit
Photons per pulse

3~1012 phs/pls

Intensity uctuation

10÷

Pulse duration (FWHM)`100 fs

Polarization

Horizontally linear

Repetition rate

20 Hz
(Design max: 60 Hz)

Power ratio of 2nd­order harmonics to thefundamental

0.1÷

Power ratio of 3rd­order harmonics to thefundamental

1÷Fig. 1

Spectra of EUV_FEL. Blue and red lines show a single­shot
spectrum and an average spectrum over 50 shots.

Fig. 2 Schematic layout of EUV_FEL beamline.

280  úËõ Sept. 2010 Vol.23 No.5

EUV SASE_FEL pÌWJ ¡ EUV SASE_FEL pÌTvÆr[CÌ»óõÌpXGlM[ÆXyNgª»ê¼êtHg_CÜñÅ§ß¦ð 1 ÷ÈºÉ}¦é±ÆªÅ«éB»ÝCI[hÆ¼üËªõíÉæÁÄªè³êéBÀ±Ìr[

Snit400 nmjÆ Alit500 nmjªr[CÅCã¬[ÍCID oûÌ15.6 m º¬ÉÊu·éBÀ

pÂ\Å

éB

±àÌr[CÉÍC¤pîÕ@íiKXAbe
l[^[CpXZN^[C4 ÛÀXbgCKXj^[CÅÌAbel[^[Cªò`o[CWõVXe

3.2

pXZN^[

FEL ÌpÀ±É¨¢ÄCÔuÌpXñ©çCÓCõvt@Cj^[jª®õ³êÄ¢éBKXA

ÌpXðIðµÄÀ±uÉ±­±ÆªµÎµÎKvÆbel[^[ÆKXj^[Ìãº¬É·®rCVXe³êéBá¦ÎCÇÝoµÌx¢sÌÌ 2 ³oíðªzu³êÄ¢éB³çÉCSCSS ±Á¬íÆ¯úµp¢½êCPêpX¾¯ðIðµÄ¿ÉÆËµ½¢½tFgb[U[VXeªpÅ«éB±ÌÍÅÆ¢¤P[XªÍCåÈ¤pîÕ@íÆµÄCpXZN^[CAbeXðIð·épXZN^[ðJ­µ½7)BpXZ

l[^[CWõVXeCKXj^[ÌÚ×ÉÂ¢Äñ

N^[ÍCr[TCYæèââå«¢Jûiq13 mmj
ðL·éW

·éB

éB±Ì½ßÌuÆµÄCCÓÌõp

~»i1 mm újÌ~ªñ]·é±ÆÅpXðIð·éàÌÅ

3.1

Abel[^[

éiFig. 4jBJûÍ~ÌüÍÉ45
ÔuÉÏÉzu³êC22.5
Ìñ]ÉJÂó

õ­xð¸³¹é½ßÉCKXÆÅÌÌ 2 íÞÌA

ÔªXCb`·éBJÂÌóÔÍZT[Éæèj^[bel[^[ªr[CÉzu³êÄ¢éBÆ­ÉC·éBFig. 5 Í{uÉæé(a)VOpXZNgCõÆ¨¿ÌÝìpðÏª·éÀ±É¨¢ÄCõ­xðLib)_upXZNgCic)pXÌÔø«iªüjÍÍÉ§ä·é±ÆÍñíÉdvÅ

éBKXAbel[^[ÍC·³1.2 m ÌKXZÉ Ar KXð±üµC³ÍÌáÅéBÁ¬íÌ^C~OM©ç15 ms ãÉZ

T[ªJóÔðm·éÆÆàÉõpXðZNgµÄðÏ¦é±ÆÉæè EUV_FEL Ìî{gÌ§ß¦ð100÷¢é±Æªí©éB±±ÅÍõ¹Ì^]ª20 Hz Ìêð`1÷öxÜÅ§äÅ«éiFig. 3)6)BAr KX³ÍCKX

¦ µ ½ ª C {  u Í SCSS  ± Á ¬ í Ì Å  J è Ô µ
é60 Hz ÜÅÇµCCÓÌÔ\¢ÌpX±üouÌJÂ§äÅsÁÄ¢éBKX³ÍiZxjª[gÅ­ÈéÆCEUV_FEL î{gÌ§ß¦ª¬³­ÈéBñðìèo·±ÆªÅ«éB§ß¦ª 1 ÷æè¬³¢ÌæÅÍC§ß FEL õÌå¬ª{pXZN^[Í[U[u©çÌgK[ðìÍ 3 ²gÆÈéB±êÍCî{gÌõGlM[ª®JnMÆµÄ^¦é±ÆàÅ«éB±êÉæè½Æ¦Ar ÌCI»|eVtßÉèC²g¬ªÉä

Î CCD JÌIõ^C~OÉí¹ÄõpXðØ

×ÄõzûfÊÏªñíÉå«¢±ÆÉNöµÄ¢éBµè¾µÄ¿É±­±ÆªÅ«éBÜ½½ÎÉCpXZ½ªÁÄCKXAbel[^[ÍC²g¬ªðÊ·nC

N^[ÌJÂZT[ÌMðp·êÎC[U[pXtB^[ÆµÄà@\·éBuÌ§änâf[^ûWnðCØèoµ½õpXÉ¯ú

êûCEUV_FEL ÌRq[X«ð©·C[WOÀ±ÅÍC´x CCD oíðp¢Ä¢éB±Ìæ³¹é±ÆàÂ\ÅéB{pXZN^[Í PC ©çÌR}hÉæé§äªÂ\ÅéB¤ÈÀ±ÅÍCÅÌAbel[^[ðp¢Ä²g¬ªà

Fig. 3

Transmission of the EUV_FEL as a function of gas pressureof Ar at a wavelength of 61 nm. Open circles denote meas­
ured data. The solid curve indicates the best­tting curve
based on double exponential function.

Fig. 4

Pulse selector.

úËõ Sept. 2010 Vol.23 No.5  281

Table 2 Parameters of focusing mirrors
Horizontally
focusing mirror

Verticallyfocusing mirror

Deection

Horizontal

Horizontal

Surface shape

Elliptic cylinder

CylinderCoating

SiC

SiC

Deected angle

171 deg

170 deg

Object distance

23.434 m

23.546 m

Image distance

1.112 m1m

Fig. 6

The focused beam prole measured by scanning a 10­mm
nickel pin hole placed in front of a gold plate. Actual verticaland horizontal sizes at the focal point were 8 mm and 12 mm,
respectively, which were obtained by deconvolution of themeasured sizes by the pinhole size.

[iTable 2jÉæè»ê¼ê

½yÑ¼ûüÉWõ³êéBWõ~[Ìº¬ÍCÂ®®Ap[`Éæé·³ r C`  o [ ðÝ ¯ C U õ  p 4 Û À X b
gC¯útFgb[U[±üp~[Cr[j^[C¯útFgb[U[Æ FEL Ì^C~Ovªp¬tHg_CI[hªõ³êÄ¢éBsz[¸iq10 mmjÉæèWõvt@CÌ]¿ðsÁ½Êð Fig. 6 É¦·BWõTCYiFWHMj
Íc 8 mmC¡12 mm Å
Fig. 5

Output signals of the ion chamber, the open sensor, and theaccelerator trigger measured with an oscilloscope. (a) Sin­gle­pulse extraction; (b) double­pulse selection; (c) frequen­cy division one­third.

Á½B±±ÅCWõTCYÍC

ªèliFWHMjc13 mmC¡16 mm ©çsz[TCYðfR{[V·é±ÆÉæè¾½BWõV

XeÌ§ß¦Í56÷ÅÁ½BpXGlM[10 mJ

Ì EUV_FEL õðWõµ½C»Ìs[N­xÍ100 TW/cm2 ð´¦éB³çÉCWõ_É Si îÂðu¢Ä EUV_

3.3

WõVXe

FEL ðÆË·éÆAu[Vª¶¶½BItC

EUV_FEL ðWõ·é±ÆÉæèCñíÉ­¢õdêÅ¸^v[u°÷¾ðp¢Ä\Ê`óðvªµ½BpÌ¶¬ªÂ\ÆÈèC±êÜÅÉÈ¢ñü`õw»Ûâõ

XGlM[0.9 mJ ÌðÅC10~12 mm ÌÌæÉ[³UN½ªúÒ³êéB½lÈÀ±ÉÎ·é½ßÉCÅ

90 nm ÌAu[V­ªvª³êC³çÉ»ÌüÓ_£Ì·¢ÄpIÈWõVXeÌ®õðsÁ½Bõw

ÉfuªÏª³ê½iFig. 7jB

fqS©ç¿ÜÅÌ£ð 1 m ÆµC½ÊàÅo

Ë·é±ÆðÝvvÆµ½BEUV_FEL õÍC2 Ì~

282  úËõ Sept. 2010 Vol.23 No.5

EUV SASE_FEL pÌWJ ¡ EUV SASE_FEL pÌTvÆr[CÌ»ó

3.4

KXj^[VXeª·é±ÆÍdvÅ

æ 2 ÍÅq×½æ¤ÉCSASE û®Å­¶·é EUV_
FEL õÍCVbgÉpXGlM[CÔ\¢C
XyNg\¢ªÙÈéB±êçõÁ«ðVbgÉvÌÏ®ªéBpXGlM[Í10÷öxèC­xÉq´ÈÀ±iñü`õw»ÛÈÇjÅÍCVbgÌf[^ªK{ÅéB±Ì½ßÉCä

XÍñjóÅpXGlM[ªªèÅ«éKXj^[
VXeðJ­µ½iFig. 8jB
KXj^[Ì´ÍCEUV_FEL õÌpXGl
M[ðõCIÊÅvª·éBKXj^[VXeÍC^óàÉ Ar KXð10|2 Pa ±üµCFEL ÆËÉæÁÄ

¶¶½õCIðdÉÅßWCoMðvAvÅCA/D Ro[^ðoÄf[^ûWnÉèCVbgÉL^·éB±±ÅCAr KXÉæéõzûÍ 1 ÷öxÅèCÙÆñÇÌõÍr[Cº¬¤É³êéBVXeÅL^³ê½l©çpXGlM[ÖÌr³ÍCY¤ÉúËüW¤ºÌJ[[^ChC
cÌ PTB/DESY ÌKXj^[ðp¢Äsíê½6)B

4. FEL ¯útFgb[U[VXe
Fig. 7Prole of a crater in silicon surface ablated by a single­shot
focused EUV_FEL with a 0.9 mJ pulse energy using scanningprobe microscopy. The crater shape was a cone with 10 mm(V) by 12 mm (H) and the maximum depth of 90 nm.

EUV_FEL ÌZpX«ð¶©µ½pÀ±ÆµÄCtFgb[U[pXÆgÝí¹½|vÉv[u@ÉæéÔªðvªªúÒ³êÄ¢éB|vÉv
[u@ÍC­ÍÈ|võÉæèÏ»iãNjµ½óÔðCv[uõÌxÔðÏ»³¹ÄÏª·é±ÆÅCõãNßöÉ¨¯é_Ci~NXðvª·éû@ÅèC [ U [ p  X ð |  v õ C FEL © ç Ì EUV õ ð v
[uõÆµCõdqªõ@âCzûªõ@ÈÇÅCõã
NóÔÌdqC´qC\¢Ìîñð¾é±ÆªÅ«éB
tFgb[U[pXñð­¶·é[h¯úIV[^ÍC¤Uí· L ÉÎµÄit2L/cicFõ¬jÆÈépXÔuðÂ½ßC¯úMÉÎµ¤Uí·ðt
B[hobN§ä·é±ÆÅC¯úµ½[U[pXñª¾çêéB¯úMÉÍCÁ¬íÌ238 MHz î RF
Fig. 8Mð 3 ªüµ½79.3 MHz Mðp¢Ä¢éB[U[Gas monitor system.

Table 3pXñ©çCdqo`Ì^C~OÉ¯úµ½ 1 kHz

Specication of the fs laser synchronized with the SCSS test accelerator

Wave length

Ave. Power

Rep. Rate

Pulse duration

Oscillator

800 nm

0.7 W

79.3 MHz

50 fs

Energy8.9 nJ

CPA

800 nm

3W

1 kHz

30 fs

3 mJ

OPA

Idler: 2.5_1.1 mm
Signal: 1.1_0.79 mm
SHI: 810_570 nm
SHS: 602_532 nm
SFI: 602_532 nm
SFS: 531_471 nm
FHI: 495_395 nm
FHS: 395_
285 nmSH_SFI: 301_266 nm
SH_SFS: 263_235.5 nm

\

1 kHz

\

50_150 mJ
50_200 mJ
1_30 mJ
10_70 mJ25_
48 mJ
27_108 mJ
1.5_2.5 mJ
0.1_8.5 mJ
2.3_8.4 mJ
4.9_8.6 mJ

úËõ Sept. 2010 Vol.23 No.5  283

Fig. 9Fig. 10

System of the fs laser synchronized with the SCSS test accelerator.

Schematic layout of the pump­probe experiment combining fs­laser and EUV­FEL.

Ì^C~OÅ 1 pXðØèoµC`[vpXIÈÊxíÆõwxíðp¢Ä¨èC»ê¼ê 1

íiChirped pulse amplier: CPAjÅ 3 mJ öxÜÅpsC7 fs Ì¸xÅ²®Å«éB·éB[h¯úIV[^yÑ CPA VXeÍC
TiFsapphire [U[ðp¢Ä¨èC­¶·é[U[pXÌg·Í800 nm Å

5. EO TvO@Éæé^C~OèéBCPA oÍð50÷r[Xvb^[Å 2 ªµCêûð FEL ¯úÀ±pÉCà¤¯ú[U[ðgÁ½|vÉv[uªèÍCEUV_êûðõpgbNíiOptical parametric am­

FEL ÌÂ\«ðå«­L°éBµ©µC»¶ÌZpÉæ

plier: OPAjÌãNõÆµÄp¢éBOPA ÍCõpé¯ú¸xÍStFgböxÉÀEªgbNøÊÉæèCãNõÌg·æè·¢g·Ìõð­ðñð·é½ßÉl¦çê½û@ªCg|XgvZXh

éB±ÌÀE¶µCA±IÉg·ð¸·é±ÆªÅ«éB­¶µ½

Å

OPA pXÌ 2 {gyÑãNõÆÌaügÈÇÉæèCèµÄ¨­±ÆÅÔ¸xðüã³¹éóÅÔO`OõÌg·ÂÏpXõð­¶·éBOPA ÌoéBÂÜèCªèÆÍÊÉVbgÌ^C~OðéB

|XgvZXÌïÌIÈû@ÍôÂ©l¦çêéªC

é½ßCFEL Ì^C~OÅ®ì·éVäXÍ EOielectro­opticaljTvOÆµÄmçêé

b^[ðp¢ÄØèoµÄ¢éBgpÂ\Èg·yÑoàÌ8,9)ðp¢½B±±ÅÍ FEL pXÅÍÈ­C»Ì³

Íð Table 3 ÉCVXeSÌ}ð Fig. 9 É¦·BÆÈédqr[Æ¯ú[U[pXÌ^C~OðÍÍ 1 kHz Å±êç CPA r[yÑ OPA r[ÍC»ê¼êõw

è·éBEO øÊÆÍCdêª©©éÆüÜ¦ªÏ»·éxíðoÄÀ±uÉ±«©êCFEL ~[`ñü`õw»ÛÅo[àÉÝ¯½[U[p~[ðp¢ÄCFEL r[ÈÌÅCLorentz Ï·ÉæèdêÍisûüÉ¼ÈÊàéB¡ÌêCdqr[ÍÎ_IÉÎµñ 2ÌpxÅÆË³êéiFig. 10jB[U[p

ÉW·éB]ÁÄCdqr[ÌßTÉ EO øÊÌXÆ FEL pXÌÆË^C~OÍC[U[p~[»ðu­ÆCdqr[ªÊÁ½uÔ¾¯üÜ¦ªÏ»éÌº¬ÉÝuµ½¬tHg_CI[hðp¢ÄC`10·éB±êð¯ú[U[Éæèm·êÎCdqr[ps Ì¸xÅªèÂ\ÅÆÌÎIÈ^C~Oðmé±ÆªoéBÈ¨C»éB^C~O²®ÉÍCdC

284  úËõ Sept. 2010 Vol.23 No.5

EUV SASE_FEL pÌWJ ¡ EUV SASE_FEL pÌTvÆr[CÌ»ó

Fig. 11

Principle of the timing measurement. (a) EO sampling. The
electric eld induces birefringence, changing the polariza­tion of laser pulse from linear to elliptical. (b) The cross­correlator converts the time structure into the spatial one tobe measured by the ICCD.
Fig. 12Ì¬xÍ\ª¬¢B³ÄCEO øÊÉæè¯ú[U[pXÉdqr[Ì^C~OðóµC»êðÇÝo·û@ÉàôÂ©í
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measured by ICCD (the lower panel). The upper panel
shows the integrated intensity of the image in the verticaldirection, which corresponds to the electron beam distribu­
tion. (b) The relative timing between the synchronized laser
and the electron beam.

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286  úËõ Sept. 2010 Vol.23 No.5

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index.html.

EUV SASE_FEL pÌWJ ¡ EUV SASE_FEL pÌTvÆr[CÌ»ó ÒÐî i [»w¤ X ü©Rdq[U[væi{ pO[v SCSS ±Á¬íp`[ `[[_[E­mail: nagasonospring8.or.jpêåFî X üªõCªqÈwC\ÊÈwmªðn
1993N¡l§åwåw@Hw¤È¨¿HwêUmÛöOúC¹C1997N_¶miwÉ¤åw@åwjC
1993NªqÈw¤¤Z¯C1999
NXEF[fÉúËõ{Ý MAX_labm¤õC2001Nú{wpU»ïÁÊ¤õiPDjC2002Nsåwåw
@Hw¤ÈèC2004NhCcÉnuNåwÀ±¨w¤ã¤õC2007N»w¤ X ü©Rdq
[U[væi{pO[v¤õðoÄC2008N 4 æè»EBH¡áà PxõÈw¤Z^[ §äîñòå å²¤õ»w¤ X ü©Rdq[U[væi{ pO[v f[^nJ­`[ ¤õE­mail: kudospring8.or.jpêåFúËõÈwÉ¨¯éîÕZpJ
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288  úËõ Sept. 2010 Vol.23 No.5

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EUV SASE_FEL pÌWJ ¡ EUV SASE_FEL pÌTvÆr[CÌ»ó

The present status of EUV_FEL beamline at SPring­8
Mitsuru NAGSONO1, Togo KUDO1,2, Tadashi TOGASHI1,2, Kenji TAMASAKU1,
Toko HIRONO1,2, Kensuke TONO1, Makina YABASHI1, Hiroaki KIMURA1,2,
Yasunori SENBA2, Haruhiko OHASHI1,2
1RIKEN, XFEL Project Head Oce, Kouto 1_
1_1, Sayo Hyogo 679_5148
2JASRI, Kouto 1_
1_1, Sayo Hyogo 679_5198

Abstract A beamline at the SCSS (SPring­8 Compact SASE Source) test accelerator is described. The
SCSS provides coherent, brilliant and ultra­short pulses based on a self­amplied spontaneous emission free­electron laser (SASE_FEL) scheme at wavelength 51 to 61 nm in the extreme ultraviolet (EUV) spectral
region. To utilize the characteristic features of this EUV radiation, we have constructed the EUV_FEL beam­line. A laser system synchronized with the EUV_FEL pulses has been installed and operated for users. An elec­tro­optic sampling (EOS) system to measure a time jitter between the synchronized laser and the electron
bunch has been tested.

úËõ Sept. 2010 Vol.23 No.5  289