高分子学会九州支部外国人学者講演会

Synchrotron Grazing Incidence X-Ray Scatteringand Its Applications in Characterizing Nanostructuresof Polymeric Nanosystems

Prof. Moonhor Ree
Pohang Accelerator Laboratory (Pal), Department of Chemistry,
Center for Integrated Molecular Systems,
National Research Lab for Polymer Synthesis and Physics,
Polymer Research Institute,Pohang University of Science & Technology (Postech),
Republic of Korea

主催：高分子学会九州支部
共催：九州大学
九州大学

高分子機能創造リサーチコア、シンクロトロンリサーチコア
21 世紀 COE プログラム「分子情報科学の機能イノベーション」

日時：2006 年 7 月 4 日（火）16:00-17:30
場所：九州大学箱崎地区旧研究所言語文化部箱崎分室 201 室
http://www.kyushu-u.ac.jp/map/campusmap/hakozaki/hakozaki.html(地図中 63 番）
Ree 教授は、韓国を代表する高分子科学者で、特に放射光を利用した高分子のナノ構造の解析で世界的に著名な研究者です。佐賀シンクロトロン訪問および SAS2006（京都）、SRP-3（播磨SPring-8）での招待講演のために来日される機会に、高分子学会九州支部主催の講演会を箱崎地区で開催いたします。多数ご出席下さいますようご案内申し上げます。

連絡先：高原 淳
九州大学先導物質化学研究所
分子集積化学部門
電話 092-642-2721
http://takahara.ifoc.kyushu-u.ac.jp
e-mail:takahara@cstf.kyushu-u.ac.jp

Synchrotron Grazing Incidence X-Ray Scattering
and Its Applications in Characterizing Nanostructures of Polymeric Nanosystems
Moonhor Ree
Pohang Accelerator Laboratory (Pal), Department of Chemistry, Center for Integrated Molecular Systems,
National Research Lab for Polymer Synthesis and Physics, Polymer Research Institute, and BK21 Program,Pohang University of Science & Technology (Postech), Pohang 790-784, Republic of Korea
E-mail, ree@postech.edu; Tel, +82-54-279-2120; Fax, +82-54-279-3399
A schematic optical setup of grazing incidence X-ray scattering (GIXS) is given and compared with that ofconventional transmission X-ray scattering (TXS) in Fig. 1. Synchrotron GIXS has several important advantages overtransmission X-ray and neutron scattering as well as scanning and transmission electron microscopies: (i) a highly
intense scattering pattern is always obtained, even for films of nanoscale thickness as well as nanostructures onsubstrates, because the X-ray beam path length through the film plane is sufficiently long; (ii) there is no unfavorable
scattering from the substrate on which the film is coated; and (iii) easy sample preparation [1-9]. For these advantages,
in recent years the GIXS has become the major analytical tool for characterizing structures and properties of a variety ofnanostructures and nanoscale thin films in a single and multilevels. However, the quantitative analysis of measured
GIXS data requires developing a new proper scattering theory because of the complexity of GIXS phenomenon due tothe scatterings from the transmission and reflected X-ray and the refraction effect, which is very far from theconventional transmission and reflection X-ray and neutron scattering. We have newly developed a GIXS theory and its
data analysis method [1,2]. In our study GIXS measurements with synchrotron radiation sources were conductedstatically and in-situ for a series of nanoscale thin films prepared from nanoporous dielectrics, block copolymers, brushpolymers, and molecular assemblies (Figs. 1, 2, and 3) [1-9]. All GIXS measurements were performed at the Pohang
Accelerator Laboratory (PAL) (Fig. 4) [10]. The measured scattering data were analyzed in detail by using the newly
developed GIXS scattering theory. All GIXS results will be discussed in details with considering the materials
chemistry and nanostructure formation process parameters. [This study was supported by the Korea Science &Engineering Foundation (National Research Lab Program: Contract No. 2005-01385) and by the Ministry of Education(BK21 Program). Synchrotron GIXS measurements were supported by the Ministry of Science and Technology andPOSCO.]
GIXS/TXSqzziyfx 2òòqyqx

fBeamstop(wtPMMA = 0.311) AFMqzzúy2
PS-b-PMMA Films
GIXSHEXqyPS-b-PI (wtPI=0.634) filmqxx

120 oC (HPL)

140 oC

160 oC (Gyroid)

Beamstop
2.0 µ m × 2.0 µ m(wtPMMA = 0.345)
HPL

2.0 µ m × 2.0 µ m

Fig. 1. Schematic diagrams of GIXS and TXS.

Fig. 2. AFM and GIXS results ofPS-b-PMMA films.

Fig. 3. Thermal phase transition of aPS-b-PI film.

Fig. 4. Synchrotron facility of Pohang Accelerator Laboraory (Pal)at Pohang University of Science & Technology (Postech)

References[1] B. Lee, J. Yoon, W. Oh, Y. Hwang, K. Heo, K. S. Jin, J. Kim, K.-W. Kim, and M. Ree, Macromolecules 38 (2005) 3395.
[2] B. Lee, I. Park, J. Yoon, S. Park, J. Kim, K.-W. Kim, T. Chang, and M. Ree, Macromolecules 38 (2005) 4311.
[3] I. Park, B. Lee, J. Ryu, K. Im, J. Yoon, M. Ree, and T. Chang, Macromolecules 38 (2005) 10532.
[4] B. Lee, W. Oh, J. Yoon, Y. Hwang, J. Kim, B. G. Landes, J. P. Quintana, and M. Ree, Macromolecules 38 (2005) 8991.
[5] B. Lee, W. Oh, Y. Hwang, Y.-H. Park, J. Yoon, K. S. Jin, K. Heo, J. Kim, K.-W. Kim, and M. Ree, Adv. Mater. 17 (2005) 696.
[6] B. Lee, Y.-H. Park, Y.-T. Hwang, W. Oh, J. Yoon, and M. Ree, Nature Materials 4 (2005) 147.
[7] Y. Kim, S. Cook, S.M. Tuladhar, S.A. Choulis, J. Nelson, J.R. Durrant, D.D.C. Bradley, M. Giles, I. McCulloch, C.-S. Ha, andM. Ree, Nature Materials 5 (2006) 197.
[8] W. Oh, Y.-t. Hwang, Y. H. Park, M. Ree, S.-H. Chu, K. Char, J. K. Lee, and S. Y. Kim, Polymer, 44 (2003) 2519.
[9] J.-S. Kim, H.-C. Kim, B. Lee, and M. Ree, Polymer 46 (2005) 7394.
[10] M. Ree and I.S. Ko, Phys. High Tech. (Korea) 14 (2005) 2.