Quantitative Microstructural Analysis

CALL FOR PARTICIPATION

Technical Work Area 37

Observation direction

Project 3
Development of guidelines for reproducible TEM specimen
preparation by focused ion beam processing
Objectives

Standardization Needs

The aim of this study is to develop
guidelines for site-specific specimen
preparation procedures using focusedion beam (FIB) processing fortransmission electron microscope(TEM). Semiconductor single crystal
Si and polycrystalline metals such as
Cu and steels are considered as
representative specimens.
TEM
specimen preparation is carried out
using the proposed FIB processing
procedure, and the thinning status isevaluated by TEM observations. The
reproducibility of the FIB procedure toproduce a similar thin lamella for TEM
by any operator is investigated.

In order to fabricate reliable thinlamellae for TEM observations, it isdesirable that a common FIB processing
technique is established worldwide even
if this applies only to some of the mostcommonly used specimens.
1)
2)

3)

Background
FIB processing using Ga ion source iswidely used as the TEM specimen
preparation technique, including anapplication system as the TEMspecimen preparation for the future
semiconductor production line. The
types of materials fabricated by theFIB range from semiconductors tometals, ceramics and even soft
materials,
resultingindifferent
fabrication conditions. The users ofFIB equipment range from beginners
to experts, and it is important toestablish best practice for consistentspecimen preparation to enableimproved reproducibility and reliability.

4)

Si single crystals and typical metal
polycrystals such as Cu and others
are considered as model ones.
Development of guidelines for FIB
fabrication procedures that enable
any operator to prepare the sitespecific thin lamellae for TEM
observation with the same quality.
By having fabrication procedurereported, important parameters in
the FIB processing will beextracted.
TEM observations of specimens
prepared by the FIB processing
are evaluated with regard to theFIB processing damage.

Relevant Standards

2μm
Basic procedure for TEM specimen preparation using FIB system.
Pre-deposition of protection layer is generally required for pick-up thearea selected. Minimizing of damage layer thickness on specimen
surface is also required for the reliable TEM observation.

Work ProgrammeFunding•Participants fund their own involvementin the project.

••••

Sept 22: Specimens will bedelivered to participants alongwith the protocols.
Oct/Nov 22: FIB processing ofthin lamellae and successive
TEM observation will be
undertaken by the participantsin accordance with the protocolsprovided.
Dec 22: Data submission andanalysis
Mar 23: Guidelines forreproducible TEM specimen
preparation will be established.
Apr/May 23: Discussions of thenext phase development.

Deliverables & Dissemination

ISO/NP 17297 FIB VocabularyISO/TC202/SC1 - in progress•

Relevant Committees•

ISO/TC 202-Microbeam analysis
ISO/TC 201-Surface analysis
ISO/TC 229-Nanotechnologies

SIM image of TEM
specimen on final
thinning processby FIB fabrication.

Results disseminated in a peerreviewed scientific journal.
Key guidelines for TEM
specimen preparation by FIB
will be established by the ISO in
the TC 202/SC3.

Project Status
The project is due to start in August2022 for a duration of 12 months.

For more information:
Project Leader

Dr Masaaki Sugiyama

Osaka University, Japansugiyama@mat.eng.osaka-u.ac.jp
TWA 37 Chair

Dr Vasile-Dan Hodoroaba

Federal Institute for Materials Researchand Testing (BAM), Germany
dan.hodoroaba@bam.dewww.vamas.org
August 2022