ICPST-41 (Makuhari Messe, June 25-28, 2024) PROGRAM
June 25, 2024
304

J.25

17:00-19:00
Welcome Reception

June 26, 2024
301

J.26

302

303

304

9:30-9:45

Opening Remarks
9:30

Takeo Watanabe (Univ. of Hyogo)
A0. Plenary
Session Chairperson:
Takeo Watanabe (Univ. of Hyogo)
A00-01 9:45-10:30"Photo Materials readiness at theeve of High NA EUVL HVM"
(Plenary)
Danilo De Simone, imec, Belgium
10:30-10:50
10:45
10:50

Coffee Break

A12. Organic and Hybrid Solar
Cells – Materials Device Physics
and Processes I
Session Chairperson:
Itaru Osaka (Hiroshima Univ.)

A3. Self-Assembly Materials andProcesses (DSA, BCP, SAM, ASD,
Infiltration, Nanostructured Materials,
Advanced Devices using Self
Assembly, etc.) I
Session Chairpersons:Seiji Nagahara（Tokyo Electron) andTakuya Isono (Hokkaido Univ.)
A03-01 10:50-11:20

A12-01 10:45-11:15

Y. Liao, W.C. Chen and Redouane
Borsali, Grenoble Alpes Univ., France
A03-02 11:20-11:50

Safa, Shoaee 1,2, 1 Paul Drude Inst.
for Solid State Electronics and 2
Univ. of Potsdam, Germany
A12-02 11:15-11:40

Self-assembly of carbohydrate block
copolymer systems : from
nanoparticles to thin films tophotonic crystals (Invited)

Charges on the Move: thePhysics and Perspective ofOrganic Solar Cells (Keynote)

Sequence Control for Various Typesof Copolymers toward SequenceDependent Self-Assembly (Invited)

Direct Observation of Charge
Formation at the Interfaces
between Tin-Based Perovskite
and Fullerene Derivatives
Revealed by Electron Spin
Resonance (Invited)

Makoto Ouchi, Kyoto Univ., Japan
A03-04 11:50-12:10

Systematic synthesis andnanostructural characterization of
hybrid material consisting of sugar
and inorganic polymer

Kazuhiro Marumoto, Univ. of
Tsukuba, Japan
A12-03 11:40-11:55

Taiki Nishimura 1, Feng Li 1, Takuya
Yamamoto 1, Kenji Tajima 1, Redouane
Borsali 2, Hsin-Lung Chen 3, Toshifumi
Satoh 1 and Takuya Isono 1, 1 Hokkaido
Univ., Japan, 2 Univ. Grenoble Alpes,
France and 3 Natl. Tsing Hua Univ.,
Taiwan12:10-13:40
13:00
13:15

13:40

Lunch BreakA3. Self-Assembly Materials andProcesses (DSA, BCP, SAM, ASD,
Infiltration, Nanostructured Materials,
Advanced Devices using Self
Assembly, etc.) II
Session Chairpersons:Teruaki Hayakawa (Tokyo Inst. ofTechnol.) and Redouane Borsali(Cermav, Grenoble Alpes Univ.)

Nongeminate Charge
Recombination in Conjugated
Polymer Films Blended withAcceptor Molecules

Kazuki Kohzuki and Hideo Ohkita,
Kyoto Univ., Japan
11:55-13:15
A11. Chemistry for Advanced
Photopolymer Sci. I
Session Chairpersons:
Haruyuki Okamura (Osaka
Metropolitan Univ.) and Akinori
Shibuya (FUJIFILM)

A2. NanobioTechnol. I
Session Chairpersons:Takanori Ichiki(Univ. of Tokyo) andYukihiro Kanda (iCONM)

Lunch BreakA11-01 13:00-13:20

A02-01 13:00-13:20

A12-04 13:15-13:40

Kang Qi 1, Hiroaki Takehara 1,2
and Takanori Ichiki 1,2, 1 The Univ.
of Tokyo and 2 iCONM, Japan

Chieh-Ting Lin, Natl. Chung Hsing
Univ., Taiwan

Degradation of Modified
Polystyrenes Having
Degradable Units by Near
Infrared Light Irradiation in The
Presence of A Photon
Upconversion Nanoparticle
and A Photoacid Generator
Haruyuki Okamura and Kiwa
Mihono, Osaka Metropolitan Univ.,
Japan

Evaluation of biodegradable
PLLA nanofiber-based
piezoelectric sensor

A12. Organic and Hybrid Solar
Cells – Materials Device Physics
and Processes II
Session Chairperson:
Hideo Ohkita (Kyoto Univ.)

Improving Performance ofHybrid Sn-Pb Perovskite Solar
Cells through Optimized Hole
Transport Layer Design (Invited)June 26, 2024
301

J.26

A03-03 13:40-14:10

Post-polymerization modification ofpristine PS-b-PMMA (Invited)
Takuya Isono, Hokkaido Univ., Japan

302

303

304

A11-02 13:20-13:40

A02-02 13:20-13:40

A12-05 13:40-14:05

Photo-induced Decrosslinkingof Oxime-ester Based
Covalent Adaptable Networks
in Film State
Suyama Kanji 1 and Hirokazu
Hayashi 2, 1Osaka Metropolitan
Univ. and 2 ORIST, Japan

A03-05 14:10-14:40

DSA materials filtration for EUV
pattern rectification (Invited)
Toru Umeda, Nihon Pall, Japan

A03-06 14:40-15:10

Kinetics and Orientation Study ofFast Assembling Flouro-BCP(Invited)
Zhenyu Yang, Tangjun Zhang, Xiaofei
Qian and Hai Deng, Fudan Univ., China

A03-07 15:10-15:30

Synthesis of Poly (heptafluorobutyl
methacrylate)-b-Poly(diaryliodonium-1-(methacryloyloxy)
benzene-4-sulfonate acid salt) andthe Directed Self-assembly Study
Xiaofei Qian, Guangya Wu, Tao Liu, Hai
Deng, Fudan Univ., China

15:30-15:50

Coffee BreakA02-03 13:40-14:00

A12-06 14:05-14:30

Hitomi Betsumiya, Tsumoru
Morimoto and Tsuyoshi Kawai,
NAIST, Japan

Yukihiro Kanda 1,2, Takuma Jinbo
1,2, Hiroaki Takehara 1,2 andTakanori Ichiki 1,2, 1 iCONM and 2
The Univ. of Tokyo, Japan
14:00-14:10

Keisuke Tajima 1, Kyohei Nakano 1,
Iat Wai Leong 2, Daisuke Hashizume1, Kirill Bulgarevich 1, Kazuo
Takimiya 1,3, Yusuke Nishiyama 4and Toshio Yamazaki 1, 1 RIKEN, 2
Osaka Univ., 3 Tohoku Univ. and 4
JEOL, JapanThe design and synthesis ofnovel photorelease
compounds from 1,4naphthoquinone derivative

Synthesis, self-assembly andapplications of carbohydratebased amphiphiles
Sami HALILA, Grenoble Alpes
Univ., France

Effects of solvents on the
preparation of PLLA/PEDOT:PSS conductive polymer
alloysCoffee BreakA2. NanobioTechnol. II
Session Chairpersons:Takanori Ichiki(Univ. of Tokyo) andYukihiro Kanda (iCONM)

14:20-14:30

A11. Chemistry for Advanced
Photopolymer Sci. II
Session Chairpersons:
Haruyuki Okamura (Osaka
Metropolitan Univ.) and Kanji
Suyama (Osaka Metropolitan
Univ.)

A02-04 14:10-14:30

A11-05 14:30-14:50

A02-05 14:30-14:50

Mina Han, Kongju Natl. Univ.,
Korea

Kento Toyoda, Takanori Ichiki,
Naohiro Seo and Chiharu Mizoi,
The Univ. of Tokyo, Japan
A02-06 14:50-15:10

Effect of light-sensitive azobased polymer matrices on
fluorescent one-dimensional
nanostructures

15:25

A11-06 14:50-15:10

15:50

Pyae Thu and Mina Han, Kongju
Natl. Univ., Korea
A11-07 15:10-15:30

Influence of Solvents andSubstituent Effect on the
Photoresponsive Properties of
Azo Chromophores
A3. Self-Assembly Materials andProcesses (DSA, BCP, SAM, ASD,
Infiltration, Nanostructured Materials,
Advanced Devices using Self
Assembly, etc.) III
Session Chairpersons:Takehiro Seshimo (Tokyo Ohka Kogyo)
and Makoto Ouchi (Kyoto Univ.)

Yasuhiro Tachibana, RMIT Univ.,
Australia

Keisuke Yamamoto 1, Hiromi
Kuramochi 1 and Takanori Ichiki
1,2, 1 The Univ. of Tokyo and 2
iCONM, Japan

Coffee Break

14:30

Charge Carrier Dynamics ofLead-Based Halide Perovskite(Invited)

A11-03 13:40-14:00

A11-04 14:00-14:20

14:10

Shape Classification by Deep
Learning Analysis Based on
Scattered Light Intensity of
Nanoparticles in Liquid by NTA
MethodRhodamine B Nanopigment,
Thermal Stability improvementin tri-Component
Photoinitiating Systems for 3D
Printing using hybrid photoresin

Atefeh Nezhadebrahim 1,2,
Morteza Ebrahimi 3 and Xavier
Allonas 2, 1 Qom Univ. of Technol.,Iran, 2 Univ. of Haute Alsace,France, 3 Amirkabir Univ. ofTechnol., Iran

Functionalization of poly-Llactic acid microneedle tips
using photopolymerization ofhydrogels

Masahiro Fukuhara 1,2, Yukihiro
Kanda 1,2, Hiroaki Takehara 1,2,
Akira Matsumoto 1,2,3 andTakanori Ichiki 1,2, 1 Univ. ofTokyo, 2 iCONM and 3 Tokyo
Medical and Dental Univ., Japan

Development of microfluidic
devices for automatedcollection of extracellular
vesiclesFree-flow electrophoresis
device for heterogeneous
exosome fractionation

Shusuke Sato 1 and Takanori
Ichiki 1,2, 1 iCONM and 2 The
Univ. of Tokyo, Japan

Tautomeric Organic
Semiconductors Exhibiting
Intramolecular Double Proton
Transfer (Invited)

A12-07 14:30-14:55

Development of p/n
Heterojunction Nanoparticle
Photocatalyst Based on
Crystalline Semiconducting
Polymer for Highly Efficient
Hydrogen Evolution (Invited)
Tsubasa Mikie, Kouichiro Hayashi,
Chiyu Fujita, and Itaru Osaka,
Hiroshima Univ., Japan
A12-08 14:55-15:10

The Correlation between
Reduction Potentials by Cyclic
Voltammetry and Electron
Affinities by Low-Energy Inverse
Photoelectron Spectroscopy
Mihiro Kubo and Hiroyuki Yoshida,
Chiba Univ., Japan

15:10-15:25

Coffee Break

A12. Organic and Hybrid Solar
Cells – Materials Device Physics
and Processes III
Session Chairpersons:Itaru Osaka (Hiroshima Univ.) and
Hideo Ohkita (Kyoto Univ.)
A12-09 15:25-15:50

Development of Nonfullerene
Acceptors for Green-Light
Wavelength-Selective Organic
Solar Cells towards Agrivoltaics(Invited)
Yutaka Ie 1, Shreyam Chatterjee 1,
Seihou Jinnai 1 and Yasuyuki
Watanabe 2, 1Osaka Univ. and 2
Suwa Univ. of Sci., Japan

June 26, 2024
301

J.26

A03-08 15:50-16:20

Achieving Ultra-Small Features with
Chemically Engineered Block
Copolymers (Invited)

Teruaki Hayakawa 1, Shinsuke Maekawa
1, Ryota Uehara 1, Riku Mizusaki 1,
Kodai Nagashima 1, Yuta Nabae 1, Kan
Hatakeyama 1, Takehiro Seshimo 2,
Takahiro Dazai 2 and Kazufumi Sato 2,
1Tokyo Inst. of Technol. and Tokyo Ohka
Kogyo, Japan

A03-09 16:20-16:40

Expanding the Formation Region of
Double Gyroid Structures from ABC
Triblock Terpolymers by Solution
Casting
Yuta Miyamori, Yuta Nabae, Kan
Hatakeyama and Teruaki Hayakawa,Tokyo Inst. of Technol., Japan
A03-10 16:40-17:00

Synthesis of star-shaped ABC
miktoarm terpolymers via arm-first
approach
Kodi Nagashima, Yuta Nabae, Kan
Hatakeyama and Teruaki Hayakawa,Tokyo Inst. of Technol., Japan
A03-11 17:00-17:20

Functional Group Influence on Block
Copolymer Segment Interactions:
An Analysis via Flory-Huggins andHansen Solubility Parameters
Zhengdan Lin, Kan Hatakeyama, Yuta
Nabae and Teruaki Hayakawa, Tokyo
Inst. of Technol., Japan
A03-12 17:20-17:40

Influence of Casting Solvent on theHigher-Order Structures of
ABC/ACB-Type Triblock
Copolymers Based on Polystyrene
and Polymethacrylates
Ryota Uehara 1, Shinsuke
Maekawa 1, Takehiro Seshimo 2,
Takahiro Dazai 2, Kazufumi Sato 2,
Kan Hatakeyama 1, Yuta Nabae 1
and Teruaki Hayakawa 1, 1 Tokyo
Inst. of Technol. and 2 Tokyo Ohka
Kogyo, Japan
17:40-18:00

Coffee Break
18:00-20:00

Panel symposium"Advanced Packaging for More
Moore and More than Moore era"
Pannelist
Dr. Markus Wöhrmann (Fraunhofer
Institute)Prof. Samuel Serna (MIT)Dr. Tetsuo Enomoto (Resonac)
Dr. Sanjay Malik (Fujifilm)
Dr. Ksenija Varga (EV Group)
Prof. Takeyasu Saito (Osaka
Metropolitan Univ.)
Chairperson(s)Prof. Takumi Ueno
Dr. Yasuharu Murakami (Resonac)

302
A11-08 15:30-15:50

Surface Hardness of UVsolidified Coatings containing
In-situ Synthesized, Selfdispersed Nano-gel domains
as a function of Surface
Roughness and Viscoelastic
Characteristics
Atefeh Nezhadebrahim 1, Saeid
Rastegar 2, Zahra Ranjbar 3 andHossein Yazdani-Ahmadabadi 4, 1
Qom Univ. of Technol., 2 RadSys
Pooshesh, 3 Inst. for Color Sci.
and Technol., Iran and 4 Univ. of
British Columbia, Vancouve

303

304
A12-10
15:50-16:15

Development of Non-Fullerene
Acceptors with π-Extended
Central Unit for Organic
Photovoltaic Devices (Invited)
Tomokazu Umeyama, Univ. of
Hyogo, Japan
A12-11
16:15-16:40

The Effects of Perovskite
Quantum Dot Additives on the
Perovskite Film Property and the
Photovolatic Conversion
Efficiency Enhancement of
Perovskite Solar Cells (Invited)
Qing Shen, Univ. of ElectroCommunications, Japan
A12-12 16:40-17:05

Organic Electron Transport
Materials for Tin Halide
Perovskite Solar Cells (Invited)
Tomoya Nakamura and Atsushi
Wakamiya, Kyoto Univ., Japan
A12-13 17:05-17:20

Recycling and Recovery of Lead
Iodide from Waste Perovskite
Solar Cells for New Device
Fabrication
Yu-Kai Chen, Chieh-Ting Lin and
Fan-Wei Liu, Natl. Chung Hsing
Univ., Taiwan

June 27, 2024
J.27

301

302

303

9:00

A5. EUV Lithography I
Session Chairpersons:Takeo Watanabe (Univ. of Hyogo) and
Danilo de Simone (imec)

A4. Computational / Analytical
Approach for Lithography
Processes I
Session Chairpersons:
Tomoki Nagai (JSR) and Kenji
Yoshimoto (Kanazawa Univ.)

9:30

A05-01 9:00-9:30

A10. Strategies and Materials for
Advanced Packaging Next
Generation MEMS Flexible
Devices I
Session Chairpersons:
Takumi Ueno (Shinshu Univ.) andSanjay Malik (FUJIFILM)
A10-01 9:00-9:30

EUV lithography: A material world(Invited)
Anna Lio, Intel, USA

Novel Chemical Mechanical
Polishing Process for Fine
Redistribution Layer withPatterned Photosensitive
Organic Dielectrics/Copper(Invited)
Takeyasu Saito, Osaka
Metropolitan Univ., Japan

A05-02 9:30-10:00

EUV CAR-NTD with new developer
for chemical stochastic defectreduction (Invited)
Toru Fujimori, Keiyu Ou, Naohiro Tango,
FUJIFILM, Japan

A05-03 10:00-10:20

Advanced development techniques
for extreme-tight pitch patterning
Hikari Tomori 1, Cong Que Dinh 1, Seiji
Nagahara 2, Kanzo Kato 2, Shinichiro
Kawakami 1, Yuhei Kuwahara 1, Soichiro
Okada 1, Kayoko Cho 1, Junji Nakamura
1, Shoichi Terada 1, Makoto Muramatsu
1, Alexandra Krawicz 2, Kathleen
McInerney 2, Nathan Antonovich 2 andLior Huli 2, 1 Tokyo Electron Kyushu and2 TEL Technol., Japan
10:20-10:30

Coffee Break
10:30
10:40

A5. EUV Lithography II
Session Chairpersons:
Hiroto Kudoh (Kansai Univ.) and Alex
Robinson (Univ. of Birmingham)

10:50
A05-04 10:30-10:50

A Novel Process to Reduce
Roughness in Chemical Amplified
Resists (CAR) for Next-Generation
Lithography

Kayoko Cho 1, Cong Que Dinh 1, Hikari
Tomori 1, Seiji Nagahara 2, Arisa Hara 1,
Seiji Fujimoto 1, Makoto Muramatsu 1, 1
Tokyo Electron Kyushu and 2 Tokyo
Electron, Japan

10:50

A05-05 10:50-11:10

Influence of the solvent in resist
solution and thin films on
aggregation size of chemicalcomponents
Shinji Yamakawa 1, Kouji Kuramoto 2,
Yuri Ebuchi 1, Atsunori Nakamoto 1,
Tetsuo Harada 1 and Takeo Watanabe 1,
1 Univ. of Hyogo and 2 KH Neochem,Japan

A10-02 9:30-10:00

Ultra-Efficient Broadband
Fiber-to-Chip Coupling via
Two-Photon Polymerization(Invited)

Samuel Serna 1,2, Luigi Ranno 2,
Shaoliang Yu 2,3, Drew Weininger
2, Qingyang Du 2, Jia Xu Brian Sia
2, Cosmin Popescu 2, Lionel C.
Kimerling 2, Anuradha Agarwal 2
and Tian Gu 2, 1 Bridgewater
State Univ., 2 MIT, USA and 3
Zhejiang Lab., China
A10-03 10:00-10:30

Directing Network
Degradability Using
Wavelength-Selective ThiolAcrylate Photopolymerization(Invited)

A04-01 9:00-9:30

Computational lithography for
anti-spacer multi-patterning(Invited)

Ulrich Welling 1, Hironobu Taoka
1, Hans-Jürgen Stock 1, Wolfgang
Demmerle 1, Bernd Küchler 1,
Lawrence Melvin 1, David Power2, Charlotte Cutler 2, Michael
Murphy 2 and Jody Grzeskowiak
2, 1 Synopsys, Japan and 2 TEL
Technol. Center, America, USA
A04-02 9:30-10:00

Stochasticity in extreme
ultraviolet lithography (Invited)
Takahiro Kozawa, Osaka Univ.,
Japan

A04-03 10:00-10:30

Atomistic Mechanism of
Chemical Vapor Deposition
Process by Tight-Binding
Quantum Chemical Molecular
Dynamics Simulations (Invited)
Momoji Kubo and Nobuki Ozawa,
Tohoku Univ., Japan

10:30-10:40

10:30-10:50

A10. Strategies and Materials for
Advanced Packaging Next
Generation MEMS Flexible
Devices II
Session Chairpersons:
Yasuharu Murakami (Resonac)
and Samuel Serna (MIT)A10-04 10:40-11:10

Innovative thin film polymer
application for component
embedding and polymer
hybrid bonding (Invited)

Markus Woehrmann, Thomas
Fritzsch, Robert Gernhardt,
Charles-Aix Manier and Violeta
Prodanovic, Fraunhofer IZM,
Germany
A10-05 11:10-11:40

Highly Functional Materials for
Advanced Package (Invited)
Tetsuya Enomoto, Mika Kobune,
Kazutoshi Furuzono, Masahiro
Matsunaga, Naoki Takahara andTakashi Kawamori, Resonac,Japan

B2. プラズマ光化学と高分子表面機
能化 I
Session Chairpersons:
呉 準席（大阪公立大学）
近藤 伸一（岐阜薬科大学）

B02-01 9:30-9:50

大気圧 Ar を使用したマイクロ波
アフターグロープラズマによるポリ
テトラフルオロエチレンの高速表
面処理
小駒 益弘, 田中邦翁, 上智大学

Kailong Jin and Saleh Alfarhan,
Arizona State Univ., USA

Coffee Break

304

Coffee Break

B02-02 9:50-10:10

CCP-CVD 法により作製した
SiO:CH 微粒子堆積膜のマイクロスケール構造駒崎陸 1, 中泉有稀 1, 井上泰志 1,
高井治 2, 1 千葉工業大学, 2 関東学院大学

B02-03 10:10-10:30

プラズマ放電により成膜されたDLC 膜におけるケモメトリックスを応用したラマンスペクトル解析
小佐野芳寿 1,2, 福江紘幸 1, 鷹林将1, 國次真輔 1, 今井裕一 1, 中谷達
行 1, 1 三菱鉛筆, 2 岡山理科大学

A4. Computational / Analytical
Approach for Lithography
Processes II
Session Chairpersons:
Tomoki Nagai (JSR) and Takahiro
Kozawa (Osaka Univ.)
A04-04 10:50-11:20

Hybrid Simulation of Pattern
Formation for Chemically
Amplified Resists in Electron
Beam Lithography (Invited)
Masaaki Yasuda, Daiki Nakamuraand Hiroto Wakamatsu, Osaka
Metropolitan Univ., Japan
A04-05 11:20-11:50

Computational approach
towards precise control of DSA
interfacial roughness (Invited)
Kenji Yoshimoto, Kanazawa Univ.,
Japan

11:50-13:30

Lunch Break

10:30-10:50

Coffee BreakB2. プラズマ光化学と高分子表面機
能化 II
Session Chairpersons:
井上 泰志（千葉工業大学）
中谷 達行（岡山理科大学）
B02-04 10:50-11:10

大気圧ヘリウムマイクロプラズマ
アレーを用いたポリマー表面の処
理時間依存性今中海舟, 白藤立, 呉準席, 大阪公立大学

June 27, 2024
301

J.27

A05-06 11:10-11:30

Spatial Distribution Analysis of
Functional Groups in Resist Thin
Films Using Reflection-mode
Resonant Soft X-ray Scattering
Yuri Ebuchi, Atsunori Nakamoto, Shinji
Yamakawa, Tetsuo Harada and Takeo
Watanabe, Univ. of Hyogo, Japan
A05-07 11:30-11:50

302
A10-06 11:40-12:00

Key Dielectric Material
Requirements for Advanced
Packaging Applications(Invited)

303
11:50-13:30

Lunch Break

13:00
13:20

Lunch Break

B02-06 11:30-11:50

メカノケミカル固相重合による pH
応答性高分子ミセルの開発
近藤伸一 1, 土井直樹 1, 笹井泰志
2, 山内行玄 3, 葛谷昌之 1, 1 岐阜薬科大学, 2 岐阜医療科学大学, 3 松
山大学
12:00-13:20

Lunch Break
A10. Strategies and Materials for
Advanced Packaging Next
Generation MEMS Flexible
Devices III
Session Chairpersons:Markus Woehrmann (Fraunhofer
IZM) and Sanjay Malik (FUJIFILM)

13:30

A10-07 13:20-13:50

Pushing the Limits of Digital
Patterning by EVG’s Maskless
Lithography and High–
Resolution Wave Control
Mosaics (Invited)
Ksenija Varga 1, Martin Weinhart
1, Roman Holly 1, Tobias Zenger
1, Boris Považay 1, Thomas
Uhrmann 1, Hirotaka Takishita 2,
Yoshinori Taguchi 2, Johannes
Koch 3 and Matthias Schicke 3,
1 EV Group, Austria, 2 Fujifilm
Electronic Mterials, Japan andFujifilm Electronic Materials,
Belgium
13:50

A5. EUV Lithography III
Session Chairpersons:Shinji Yamakawa (Univ. of Hyogo) andRobert Brainard (Univ. at Albany)

A10-08 13:50-14:20

Cautions in analyses of theoxidation state of a copper
surface. (Invited)
Yugo Kubo, Sumitomo ElectricIndustries, Japan
A10-09 14:20-14:40

A05-08 13:50-14:20

Dry Deposition and Dry
Development of Metal Oxide-Based
Photoresist (Invited)
Nizan Kenane 1, Will Wu 1, Guoyan
Zhang 1, Steven Zhang 1, Linh Hoang 1,
Timothy Weidman 1, Ji Yeon Kim 1, Da Li
1, Jengyi Yu 1, Samantha Tan 1,
Benjamin Kam 2, Ching-Chung Huang 2,
Ali Haider 2, Anuja De Silva 2, Nitinkumar
Upadhyay 3, Nicolas Maldonado Pinos 3,
Gregory Denbeaux 3, Robert Brainard 3
and Mark H. Sherwood 4, 1 Lam
Research, Fremont, 2 Lam Research,
IMEC 3 Univ. at Albany, and 4 IBM, USA
A05-09 14:20-14:40

Novel EUV Underlayer Design for
Metal Oxide Resist Patterning
Jiyoung Hwang, Jung-June Lee,
Hyeonwoo Shin, Bonki Ku, Jae Hwan
Sim and Jae-Bong Lim, DuPont
Electronics & Industrial, Korea
A05-10 14:40-15:00

Going Beyond the OhnishiParameter: Fast Etch Underlayers
for EUV Lithography

Stanfield Youngwon Lee, Min Kyung
Jang, Jae Yun Ahn, Jin Hong Park and
JaeBong Lim, DuPont Electronic &Industrial, Korea

紫外吸収分光法を用いたプラズマ
活性種中の活性窒素酸素種の定量測定
東尚希 1, 加藤晴輝 1, Endre J. Szili
2, 白藤立 1, 呉 準席 1, 1 大阪府立大学, 2 Univ. of South Australia

Sanjay Malik, Dimitri Janssen,
Stefan Vanclooster, Stephanie
Dilocker, Fujifilm Electronic
Materials, USA

Observation Result of ChemicalComposition Distribution of Resist
Thin Film by Photoemission
Electron Microscopy
Tsukasa Sasakura, Shinji Yamakawa,
Tetsuo Harada and Takeo Watanabe,
Univ. of Hyogo, Japan
11:50-13:50

304
B02-05 11:10-11:30

Quantum film photoactive
layers for infra-red CMOS
image sensors

Loic Paillardet 1, Benedicte Mortini
1, Halim Bilgen 1, Olivier Arnaud 1,
Lucie Mazet 1, Stephane AllegretMaret 1, Romain Duru 1, Maud
Bidaud 1, Ajay Singh 1, Andras
Pattantyus-Abraham 1, Jonathan
Steckel 1, Dmitri Aldakov 2 andJean-Marie Verilhac 3, 1
STMicroelectronics, 2 CNRS and 3
CEA-LITEN, France

A10-10 14:40-15:00

Development of Low
Temperature Processable
Polyimides for Organic Hybrid
Bonding Applications

Masaya Jukei 1, Kouta Nomura 1,
Takenori Fujiwara 2, Hitoshi Araki
1, Tomoyuki Honda 1, Yu Souji 1, 1
Toray Industries, 2 Toray
Singapore Research Center,Japan

11:50-13:30
A13. Fundamentals andApplications of Biomimetics
Materials and Processes I
Session Chairpersons:
Atsushi Sekiguchi (Litho TechJapan) and Hiroyuki Mayama(Asahikawa Medical Univ.)

Lunch BreakB3. 一般講演 I
Session Chairpersons:堀邊 英夫（大阪公立大学）
山本 雅史（香川高専）

A13-01 13:00-13:30

Bio-inspired Adhesive with
Reset-On Demand, ReuseMany (RORM) Modes(Keynote)
Masanobu Naito, NIMS, Japan
A13-02 13:30-13:50

Formation of Double
Roughness Structure on
PVDF/PMMA Blended Film
Using Atmospheric Pressure
Low-Temperature Plasma

Masashi Yamamoto 1, Ayumu
Takada 1, Nanaho Fujii 1, Atsushi
Sekiguchi 2 and Hideo Horibe 3, 1
Natl. Inst. of Technol., Kagawa
College, 2 Litho Tech Japan and 3
Osaka Metropolitan Univ., Japan
A13. Fundamentals andApplications of Biomimetics
Materials and Processes II
Session Chairpersons:
Masanobu Naito (NIMS) andTakayuki Murosaki (Asahikawa
Medical Univ.)
A13-03 13:50-14:10

Environmentally friendly
photolithography Technol.
using water-developable
photoresist materials derived
from plants

B03-01 13:30-14:00

二流体ジェット噴射面での物質攪
拌効果の検討真田俊之 1, 土居尚人 1, 渡部真将
1, 高橋広毅 2, 濱田 聡美 2, 今井正
芳 2, 1 静岡大学, 2 荏原製作所
B03-02 14:00-14:20

レーザーを用いたレジスト剥離における照射条件の最適化
面地和樹 1, 中尾友哉 1, 東田悠佑
1, 林克樹 1, 安國良平 1, 吉村政志
2, 山本竜也 3, 水谷匡希 3, 堀邊英夫 3, 神村共住 2, 1 大阪工業大学,
2 大阪大学, 3 大阪公立大学

B03-03 14:20-14:40

液中レーザー粉砕法を応用した有機-ポリマーハイブリッドナノマテリ
アルへの展開安國良平, 砂田明子, 増田直人, 阿部
晃汰, 神村共住, 大阪工業大学

Yuna Hachikubo, Sayaka Miura,
Mano Ando, Rio Yamagishi and
Satoshi Takei, Toyama Pref. Univ.,
Japan
A13-04 14:10-14:30

The development of bile duct
stent having antifoulingpropertiesby using
atmosphere pressure cold
plasma (2)Atsushi Sekiguchi 1, Masashi
Yamamoto 2 and Masayasu
Aikawa 3, 1 Litho Tech Japan, 2
Kagawa Univ. and 3 Saitama
Medical Univ., Japan
14:30-14:50

Coffee Break

14:40-14:50

Coffee BreakJune 27, 2024
301

J.27
14:50

302

A05-11 15:00-15:20

A10-11 15:00-15:20

Jordan Greenough 1, Ricardo Burke 2,
Nitin Uphadyay 2, Munsaf Ali 2, Shaheen
Hasan 3, Jacob Sitterly 2, Amir Hegazy
2, Steven Grzeskowiak 2 and Robert L.
Brainard 2, 1 Geminatio, 2 Univ. at
Albany and 3 Rensselaer Polytechnic
Inst., USA
A05-12 15:20-15:40

Kenichi Takeuchi, Chiharu Koga,
Tomoaki Shibata, Yu Aoki andYukika Aoki, Resonac, Japan

Positive-Tone Organoantimony
Resists for EUV

Positive-Tone Organoantimony
Resists: Mechanistic Studies

Jordan Greenough 1, Ricardo Burke 2,
Nitin Uphadyay 2, Munsaf Ali 2, Shaheen
Hasan 3, Jacob Sitterly 2, Steven
Grzeskowiak 2 and Robert L. Brainard 2,
1 Geminatio, 2 Univ. at Albany and 3 RPI,
USA

Crack resistance evaluation
method of photoimageable
dielectrics for redistribution
layer

A10-12 15:20-15:40

Chemically amplified
photosensitive polyimides with
controllable taper angles
Lizhe Wang 1, Xue-yuan Cao 2,
Bin Jia 2, Lili Yuan 1, Shiyong
Yang 1,3 and Haixia Yang, 1, 1
Chinese Academy of Sci.s, 2
MINSEOA Advanced Material and3 Univ. of Chinese Academy of
Sci.s, China

15:30

15:40-15:50

15:40-15:50

15:50

A5. EUV Lithography IV
Session Chairpersons:
Toru Fujimori (FUJIFILM) and Anna Lio(Intel)A10. Strategies and Materials for
Advanced Packaging Next
Generation MEMS Flexible
Devices IV
Session Chairpersons:
Yasuharu Murakami and Ksenija
Varga (EV group)
A10-13 15:50-16:10

Coffee BreakA05-13 15:50-16:10

EUV lithography patterning using
Multi-Trigger Resist at low dose andhigh resolution
Alex Robinson 1,2, Carmen Popescu 2,
Greg O'Callaghan 2, Alexandra
McClelland 2, Catherine Storey 2, John
Roth 3 and Ed Jackson 3,
1 Univ. of Birmingham, 2 Irresistible
Materials and 3 Nano-C, UK

A05-14 16:10-16:30

Synthesis of resist materials
containing hemiacetal groups andtheir resist sensitivity

Kouta Iwane 1, Hiroto Kudo 1,
Kazumasa Okamoto 2 and Takahiro
Kozawa 2, 1 Kansai Univ. and 2 Osaka
Univ., Japan
A05-15 16:30-16:50

Synthesis Botryosin-type resist
materials containing acetal groups in
the main chain and its resist
sensitivity
Riku Akabane 1, Hiroto Kudo 1,
Kazumasa Okamoto 2 and Takahiro
Kozawa 2, 1 Kansai Univ. and 2 Osaka
Univ., Japan
A05-16 16:50-17:10

Current status of EUV flood
exposure tool at NewSUBARU
BL03

Ryuta Shiga, Shinji Yamakawa, Tetsuo
Harada and Takeo Watanabe, Univ. of
Hyogo, Japan
A05-17 17:10-17:30

Evaluation of the basic behavior ofacrylic resin changing its
composition by KrF, ArF and EUV
exposure

Yosuke Ohta 1, Atsushi Sekiguchi 1,
Takeo Watanabe 2, Tetsuo Harada 2,
Shinji Yamakawa 2, Hiroki Yamamoto 3
and Tadayuki Fujiwara 1, 1 Litho TechJapan, 2 Univ. of Hyogo and 3 Natl. Inst.s
for Quantum Sci. and Technol., Japan

Coffee Break

Superhydrophobic andconductive flexible sensor
powered by reservoir
computing for estimation ofwind and rain volume

Naruhito Seimiya 1, Seiji
Wakabayashi 2, Guren Matsumura
3, Haruki Nakamura 1, Kohei
Nakajima 4 and Kuniharu Takei 1,
1 Hokkaido Univ., 2 Osaka Pref.
Univ., 3 Osaka Metropolitan Univ.
and 4 The Univ. of Tokyo, Japan
A10-14 16:10-16:30

Flexible kirigami-structured
strain sensor

Masaki Teramoto and Kuniharu
Takei, Hokkaido Univ., Japan

A10-15 16:30-16:50

Characteristic of
Immunosorbent Assay using
Micro Capillary Arrays coatedby SiCOxHy CVD Films
Mana Honkawa 1, Daisuke Fujiki
1, Nobuyuki Terayama 2, Munehiro
Sugiyama 3, Sho Amano 1,
Masahiro Takeo 1, Tsunemasa
Saiki 4 and Yuichi Utsumi 1, 1
Univ. of Hyogo, 2 Shinko Seiki, 3Juntendo Univ. Shizuoka Hospitaland 4 Hyogo Prefectural Inst. ofTechnol., Japan

A10-16 16:50-17:10

Investigation of control ofwater contact angle bycomposition control of
SiCOxHy film formed on Si
substrate.
Daisuke Fujiki 1, Mana Honkawa
1, Nobuyuki Terayama 2, Eiji
Komatu 2, Jun Asano 2, Sho
Amano 1, Tsunemasa Saiki 3,
Satoru Suzuki 1 and Yuichi Utsumi
1, 1 Univ. of Hyogo, 2 Sinko Seikiand 3 Hyogo Prefectural Inst. ofTechnol., Japan

303

304

A13. Fundamentals andApplications of Biomimetics
Materials and Processes III
Session Chairpersons:
Atsushi Sekiguchi (Litho TechJapan) and Masanobu Naito(NIMS)

B3. 一般講演 II
Session Chairpersons:堀邊 英夫（大阪公立大学）
部家 彰（兵庫県立大学）

A13-05 14:50-15:10

B03-04 14:50-15:20

Takayuki Murosaki, Asahikawa
Medical Univ., Japan

マイクロ波励起水蒸気プラズマを用いたフォトレジスト除去プロセス
における発光分光診断のための基礎検討(Invited)

A13-06 15:10-15:30

石島達夫, 三浦敦, 榧森悠介, Thiha
Kyaw Swar, 中野裕介, 田中康規, 金
沢大学

TBA

Spontaneous Locomotion of a
Liquid Marble Irradiated by a
Near-Infrared Laser Beam
Hiroyuki Mayama, Asahikawa
Medical Univ., Japan
A13. Fundamentals andApplications of Biomimetics
Materials and Processes IV
Session Chairpersons:
Hiroyuki Mayama (Asahikawa
Medical Univ.) and Masashi
Yamamoto (Kagawa College)
A13-07 15:30-15:50

Evaluation of Antibacterial
Property of COP Resin
Surfaces with Micro RoughSurface Formed by Fine
Particle Bombarding. (Invited)

B03-05 15:20-15:40

現像液中の（ポリ）グリセロールがポジ型感光性ポリイミドの溶解性と感度に及ぼす影響
梶田舜平 1, 森清 1, 堀邊英夫 2, 1
阪本薬品工業, 2 大阪公立大学
B3. 一般講演 III
Session Chairpersons:堀邊 英夫（大阪公立大学）
石島 達夫（金沢大学）
B03-06 15:40-16:00

ポリグリセリン系メタクリレートを含むネガ型フォトレジストの銅基板への密着性と解像性
松下周平, 梶田瞬平, 森清, 阪本薬品
工業

Tomoko Nishitani 1,2, Tomohiro
Shimizu 1, Shoso Shingubara 1,
Takeshi Ito 1, 1 Kansai Univ. and 2
Surf Technol., Japan

A13-08 15:50-16:10

Antifouling evaluation ofpolymer nanopillars against
SiO2 particulate matters(Invited)

Zihao Zhao, Nan Liang, Tomohiro
Shimizu, Shoso Shingubara andTakeshi Ito, Kansai Univ., Japan
A13-09 16:10-16:30

Evaluating the Anti-biofilm
Performance of Si and Resin
Based Nanopillars (Invited)

Satoka Matsumoto 1, Shigemitsu
Tanaka 2, Toshihiro Nagao 2,
Tomohiro Shimizu 1, Shoso
Shingubara 1 and Takeshi Ito 1, 1
Kansai Univ. and 2 Osaka
Research Inst. of Industrial Sci.
and Technol., Japan

B03-07 16:00-16:30

原子状水素アニールによる Si リッ
チ SiOx 膜のエッチング機構(Invited)
部家 彰, 太田 和志, 井上 尚三, 春
山 雄一, 春山 雄一, 住友 弘二, 兵
庫県立大学

June 27, 2024
301

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303

17:40-17:50
PST Award

103
18:00-20:00
Banquet304

June 28, 2024
301

J.28
9:00

A6. Nanoimprint I
Session Chairperson:
Jun Taniguchi (Tokyo Univ. of Sci.)

9:30

A06-01 9:00-9:30

Nanoimprinting Lithography –Efficient scaling of complex shaped
nano patterns for high volume
production (Invited)Thomas Achleitner, EV Group, Austria
A06-02 9:30-9:50

Feature-size control by patterntransfer etching in nanoimprint
lithography for half-pitch 24 nm
damascene interconnect

10:00

Kenta Suzuki 1, Tetsuya Ueda 1, Hiroshi
Hiroshima 1, Yoshihiro Hayashi 1,
Masaki Ishida 2, Tomomi Funayoshi 2,
Hiromi Hiura 2, Noriyasu Hasegawa 2and Kiyohito Yamamoto 2, 1 AIST and 2
Canon, Japan
A06-03 9:50-10:10

Effect of substrate stiffness on
PMMA pattern profiles by thermal
nanoimprint process.

Hiroaki Kawata, Rina Tsunetou,
Yoshihiko Hirai and Hisao Kikuta, Osaka
Metropolitan Univ., Japan
A06-04 10:10-10:30

Nanoimprint lithography of
hyaluronic acid and collagen using
TiO2-SiO2 gas-permeable mold for
medical application
Rio Yamagishi and Satoshi Takei,
Toyama Prefectural Univ., Japan
10:30-10:50

Coffee Break

10:50

A6. Nanoimprint II
Session Chairperson:
Hiroaki Kawata (Osaka Metropolitan
Univ.)

A06-05 10:50-11:10

Hybrid Soft Replica Molds for
Residual Layer-Free Patterning
Yuri Nakamura and Jun Taniguchi, Tokyo
Univ. of Sci., Japan
A06-06 11:10-11:30

Durability test of replica mold in UV
nanoimprinting and enlargement ofmold patterned area by molds
stitching
Jun Taniguchi 1, Risa Tanaka 2 andTakeshi Ohsaki 2, 1 Tokyo Univ. ofSci. and 2 Toyo Gosei, Japan
A06-07 11:30-11:50

Application of self-aligned quadrable
patterning to fabrication of
nanoimprint mold with sub-12-nm
half-pitch
Kenta Suzuki, Tetsuya Ueda, Hiroshi
Hiroshima and Yoshihiro Hayashi, AIST,Japan
11:50-13:20
Lunch Break302
A8. Photopolymers in 3-D
Printing / Additive
Manufacturing
Session Chairpersons:
Masaru Mukai (Yokohama Natl.
Univ.) and Samuel Serna (MIT)A08-01 9:00-9:30

Photothermally Driven
Microgel Actuators Made byMicro Stereolithography(Invited)
Masaru Mukai, Shogo Oishi andShoji Maruo, Yokohama Natl.
Univ., Japan
A08-02 9:30-10:00

Digital photo patterning
polymers using a DLP 3D
printer (Invited)

Mikihiro Hayashi 1,2, 1 Nagoya
Inst. of Technol. and 2 JSTPRESTO, Japan

A08-03 10:00-10:20

Fabrication of NIL 3D resist
masters by grayscale Electron
Beam Lithography

Diana Stephany Fernandez Rodas
1,2, Jérôme Rêche 1,2 and Raluca
Tiron 1,2, 1 Univ. Grenoble Alpesand 2 CEA-Leti, France
A08-04 10:20-10:40

Novel Visible-Light TriComponent Photoinitiating
System for DLP 3D Printing:Achieving Superior Resolution
and Minimal Shrinkage

Atefeh Nezhadebrahim 1,2,
Morteza Ebrahimi 3 and Xavier
Allonas 2, 1 Qom Univ. of Technol.,Iran, 2 Univ. of Haute Alsace,France, 3 Amirkabir Univ. ofTechnol., Iran

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304

A14. Polyimides and High
Thermally Stable Resins Functionalization and Practical
Session Chairpersons:
Hitoshi Araki (Toray) and Teruaki
Hayakawa (Tokyo Inst. of Technol.)A14-01 09:30-10:00

Polyimides Compositions with
Low Dielectric Property andGood Flexibility Corresponding
to Redistribution Layers for
Next Generation
Heterogeneous Integration
technologies (Invited)
Takashi Tasaki, Takashi Yamguchi,
Taiyo Nakamura and Madoka
Yamashita, Arakawa Chemical
Industries, Japan
A14-02 10:00-10:20

Novel Low Df Photosensitive
Material for Redistribution
Layer
Akihiko Otoguro, Toshiharu
Kuboyama and Osamu Onishi,
Sumitomo Bakelite, Japan
A14-03 10:20-10:40

Polyimide-based releasematerial for rapid and precise
mass transfer ofsemiconductor chips

Koki Ishida, Risano Nakajima,
Kenta Aoshima, Yukari Jo,
Takenori Fujiwara and Daichi
Miyazaki, Toray Industries, Japan
A14-04 10:40-11:00

Synthesis and Dielectric
Properties of Polyimides
Containing Double-Decker
Silsesquioxane (DDSQ) in themain chain
Natsuko Sashi, Erina Yoshida,
Hayato Maeda, Kan Hatakeyama,
Yuta Nabae, Ririka Sawada, ShinjiAndo and Teruaki Hayakawa,Tokyo Inst. of Technol., Japan
A14-05 11:00-11:20

Synthesis and Structural
Characterization of Polyimides
Containing Diphenylsiloxane
Unit

Riku Takahashi, Kan Hatakeyama,
Yuta Nabae and Teruaki
Hayakawa, Tokyo Inst. of Technol.,Japan
A14-06 11:20-11:40

Synthesis and properties ofsubstituted polyphenylene
ether sulfone with 4cyclohexylphenoxy groups inthe side chains

Kenatro Sone, Hayato Maeda,
Kan Hatakeyama, Yuta Nabae andTeruaki Hayakawa, Tokyo Inst. ofTechnol., Japan

11:50-13:20
Lunch BreakB3. 一般講演 II
Session Chairpersons:
岡村 晴之（大阪公立大学）
山川 進二（兵庫県立大学）

B03-08 10:00-10:20

スペックル光リソグラフィによる段差面へのランダムパターン一括形
成技術
菊池裕希, 田浦りこ, 大井一樹, 岩岡
友希, 堀内敏行, 小林宏史, 東京電機大学
B03-09 10:20-10:40

円錐ミラーを用いたパイプ試料への内面円周一括露光技術
服部将太郎, 新谷賢司, 小林賢治, 堀内敏行, 小林宏史, 東京電機大学
B03-11 10:40-11:00

分岐アルキル鎖を有するポリアク
リレートで表面修飾したシリカ微粒子からなるコロイド結晶膜
三島卓也, 松浦佐和, 岩田直人, 古海
誓一, 東京理科大学
B03-12 11:00-11:20

クマリン部位を有するポリアクリレート共重合体のモノマー配列の違
いが光二量化反応へ及ぼす影響伊藤 晨翔, 岩田 直人, 古海 誓一,
東京理科大学B03-13 11:20-11:40

Photoreaction of polysilyne andmethyl methacrylate

Yukihito Matsuura 1, Rikuo Kodama
1 and Tomoharu Tachikawa 2, 1 Natl.
Inst. Of Technol., Nara College and 2
Osaka, Gas Chemicals Japan

June 28, 2024
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301

13:20

A5. EUV Lithography IV
Session Chairpersons:Taku Hirayama (HOYA) and Yoshio
Kawai (Shin-Etsu Chemical)

13:40

A05-18 13:20-13:50

Advanced Spectroscopic Evaluation
to Overcome Limitations ofChemically Amplified and Metal
Oxide Resists for High NA EUV
Lithography (Invited)
Eric Mattson, James Blackwell, Florian
Gstrein, Lauren Doyle, Marie Krysak,
Brandon Holybee, Rob Jordan, Blake
Bluestein, Charles Mokhtarzadeh andScott Clendenning, Intel, USA
A05-19 13:50-14:10

Behavior of Secondary Electrons:
Estimation of the Ionization Yield inPoly(hydroxystyrene) under EUV
Irradiation Based on Binary
Encounter Theory and Continuous
Slowing-Down Spectrum
Takumi Ueno, Shinshu Univ., Japan
A05-20 14:10-14:30

Evaluation of electron blur fordifferent electron energies

Oleg Kostko 1, Maximillian Mueller 2 andPatrick Naulleau 1,3, 1Laｗrence
Berkeley Natl. Lab., 2 San Jose State
Univ. and 3 EUV Tech, Martinez, USA
A05-21 14:30-14:50

Investigating Byproduct Formation in
Positive Tone Resists with
Nanoprojectile Secondary Ion Mass
Spectrometry
Michael J. Eller 1, Jander Cruz 1, Dmitriy
S. Verkhoturov 2, Stanislav V.
Verkhoturov 2 and Emile A. Schweikert
2,3, 1 California State Univ., 2 Texas
A&M Univ. and 3 Bienne Technol. LLC,
USA
A05-22 14:50-15:10

Wafer Edge Protection Layer: A
solution for Metal Contamination
Issue in Advanced Patterning
Process

Takanori Kudo 1, JoonYeon Cho 2,
Aritaka Hishida 3, Salem Mullen 1,
Elizabeth Wolfer 1, Orest Polishchuk 1,
Charito Antonio 1 and Zhong Li 1, 1 EMD
Electronics, USA, 2 Merck Electronics,
Korea and 3 Merck Electronics, Japan
A05-23 15:10-15:30

Spin-on Metal Oxide Hard Mask as
Undelayer for EUV Lithography with
Chemically Amplified Resist

Zhong Li 1, Viktor Kampitakis 2,
Youngjun Her 2, Charito Antonio 1,
Takanori Kudo 1, Salem Mullen 1,
Elayaraja Muthuswamy 1, Orest
Polishchuk 1, Elizabeth Wolfer 1, Adam
Ware 1, Dong Yang 1, JoonYeon Cho 3
and Aritaka Hishida 4, 1EMD Electronics,
USA, 2 Merck Chemicals NV, Belgium, 3
Merck Electronics, Korea and 4 Merck
Electronics, Japan
15:30-15:40

Closing Remarks

Takeo Watanabe (Univ. of Hyogo)

302

303

B1. ポリイミド及び高温耐熱樹脂―
機能化と応用―Session Chairpersons:早川 晃鏡（東京工業大学）
荒木 斉（東レ）
B01-01 13:40-14:00

5,5’,6,6’-テトラヒドロキシ3,3,3’,3’-テトラメチルスピロビス
インダンをコアとする固有細孔
熱硬化性低誘電・低誘電損失樹脂の開発
芝崎 祐二, 川畑篤史, 昆野祐, 岩手大学

B01-02 14:00-14:20

イソソルビド骨格と長鎖アルキ
ル基を主鎖に有するバイオベー
スポリイミドの熱・光学・誘電物
性
澤田梨々花, 劉浩男, 矢島和尚, 高雄惇英, 安藤慎治, 東京工業大学
B01-03 14:20-14:40

三成分化学増幅型ポリイミドレ
ジストにおけるポリイミド樹脂のTg とレジスト感度との関係
間所 大貴 1, 高嶋 克彰 1, 田中
進 1, 山岡 洸平 2, 弓場 智之 2,堀邊 英夫 1, 1 大阪公立大学, 2
東レ

B01-04 14:40-15:00

PBI ナノファイバー/Nafion 電解質膜の燃料電池特性に与える
熱処理の影響
達川あかり, 中江豊崇, 山登正文,
川上浩良, 東京都立大学

304