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Silicon Compounds:
Silanes and Silicones

A Survey ofProperties and Chemistry
3rd Edition
Edited by Barry Arkles & Gerald L. Larson
Copyright© 2013 byGelest, Inc., Morrisville, PA
ISBN 978-0-578-12235-9
The authors would like to acknowledge theinvaluable contributions of:
Roy Anderson
Jonathan Goff
Aki Imamura
Ed Kimble

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Gelest, Inc.

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Gabrielle Lockwood
Janis Matisons
Youlin Pan
Martin Reinert

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ABOUT GELEST
Gelest, Inc. has broad expertise in silane, silicone and metal-organic technology to enable your technology.
Gelest products find applications in:F

Photolithography
Polymer Synthesis
Separation Science
Solid State Ionics
Superconductors
Synthetic Organic Chemistry
Synthetic Inorganic ChemistryO

Advanced Ceramics
Adhesives and Sealants
Chemical Vapor Deposition
Coupling Agents and Composites
Conductive Coatings
Metallization
Microelectronics
Optical Coatings

Gelest, Inc. provides a full range of manufacturing services for support of its product lines, including:

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Custom Synthesis
Bulk Manufacturing

Further information on the following subjects is available upon request.

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Group IV Organometallics
SiliconGermanium
Tin
Lead

Metal Alkoxides
Metal Diketonates
Metal-Organic Monomers
Silicon-Based Blocking Agents
Silicon-Based Reducing Agents
Silicon-Based Cross-Coupling Agents
Silane Coupling Agents

Silicones
Reactive Silicones
Inert Silicones

Performance Products
Coatings
Impregnants
Gels

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TABLE OF CONTENTS
Introduction

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Section 1- Silicon Chemistry Articles

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About Gelest . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .2
Order Information . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .6
Terms and Conditions for Sale . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .7
Using this Handbook . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .8
Abbreviations . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .9
Beware-Water, Water Everywhere . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 10
Hydrolytic Sensitivity . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 10
Intellectual Caution . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11
General Safety Information . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12
Using the Gelest Website . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 13
Special Packaging . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 16

PRO

An Organosilicon Chemistry Primer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24
Naming Silicon Compounds. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Silicon Esters by Barry Arkles . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29
Polysilanes by Hee-Gweon Woo, Myong-Shik Cho and Bo-Hye Kim. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 37
Silicon-Based Anion Relay Chemistry by Gerald L Larson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 45
Bioactive Organosilanes by Scott McN. Sieburth . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 55
Cross-Coupling of Silanols and Silanolates by Scott E. Denmark. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 63
Silicon-Based Blocking Agents by Gerald L. Larson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 71
Silicon-Based Reducing Agents by Gerald L. Larson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 99
Silanes and Surfaces by Barry Arkles . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 120
Bond Dissociation Energies of Organosilicon Compounds by Robin Walsh . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 163
Si NMR: Some Practical Aspects by Frank Uhlig . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 167
Infrared Analysis of Organosilicon Compounds by Phil Launer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 177

Section 2- Silicon Compounds: Registry of Products and Properties
Silicon Compounds . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 181
Silicon Molecular Formula Index . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 417

Section 3- Silicone Articles

Ring-Opening Polymerization of Cyclosiloxanes by Julian Chojnowski . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 443
Telechelic Siloxane Oligomers: Versatile Starting Materials for Novel Polymers and Applications by Iskender Yilgor . . . . . . 453

Section 4- Silicone Polymers: Registry of Products and Properties
Silicone Fluids – Stable Inert Media . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 459
Reactive Silicones – Forging New Polymer Links . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 489
Silicone Index . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 553

Section 5- Performance Products . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 557
Section 6- Metal-Organic Compounds: Abbreviated Listing
Boiling Point – Pressure Monogaph . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 608
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Main Site
11 Steel Rd East
Morrisville, PA

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Stroofstraben, Germany
Frankfurt am Mai
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Enabling Your Technology

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①９９＋％と記載されている商品：９９％以上 例：SIA0610.1 3-AMINOPROPYLTRIETHOXYSILANE, 99+%
②９６％と記載されている商品 ：９６％以上 例：SIC2275.0 1-CHLOROETHYLTRIMETHYLSILANE, 96%③９５％と記載されている商品 ：９２％以上 例：SIC2271.0 2-CHLOROETHYLTRIETHOXYSILANE, 95%④tech と記載されている商品 ：Total active component を数値として示しています。
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2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE の実際の純度を規定するものではありません。

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取扱い注意事項（１） 本カタログ収録の商品には「毒物及び劇物取締法」、「消防法」等の関連法規に該当するものがありますので、法規を遵守し、取扱い、保管には十分ご注意下さい｡（２） 化学薬品には危険性がある事を認識いただき、化学知識をお持ちになった専門家による取扱いをお願いいたします。
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下記の商品は、ＪＮＣ㈱製サイラエースを販売いたしております。

SIA0589.0→ｻｲﾗｴｰｽS310 SIA0591.0→ｻｲﾗｴｰｽS320 SIA0610.0→ｻｲﾗｴｰｽS330 SIE4670.0→ｻｲﾗｴｰｽS530
SIG5840.0→ｻｲﾗｴｰｽS510 SIM6476.0→ｻｲﾗｴｰｽS810 SIM6487.4→ｻｲﾗｴｰｽS710 SIV9112.0→ｻｲﾗｴｰｽS220
SIV9220.0→ｻｲﾗｴｰｽS210

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USING THIS HANDBOOK
We have attempted to provide physical properties, phrases and references which refer both to behavior and reported uses of
the compounds in this handbook. They are drawn from literature, patents, communications to Gelest and our direct determinations
and experience. We expressly disclaim any responsibility for the accuracy of this information. We expressly do not make any
recommendations concerning the use of the compounds.
Molecular Weight

Refractive Index

Boiling point/mm(Melting Point)

Product Code
Product Name

OCH 3
H 2C

CHCH 2Si

OCH 3

OCH 3

SIA0540.0

ALLYLTRIMETHOXYSILANE
162.26
0.963 25 1.4036 25
146-8
C6H14O3Si
Flashpoint: 46°C (115°F)
Adhesion promoter for vinyl-addition silicones
Allylation of ketones, aldehydes and imines w/ dual activation of a Lewis Acid and fluoride ion.1
1. Yamasaki, S.; et al. J. Am. Chem. Soc. 2002, 124 , 6536.
F&F: Vol 18, p 14; Vol 19, p 360; Vol 20, p 85; Vol 21, p 3, Vol 12, p 395
HYDROLYTIC SENSITIVITY: 7 reacts slowly with moisture/waterTSCA

219-855-8

HMIS: 3-2-1-X

10g

50g

References2kg

O[2551-83-9]

Other
Physical
Properties

F

Empirical Formula

Specific Gravity

Hazardous Material Information
System Ratings (Health-Flammability-Reactivity) See BelowCAS #METI #PR
O

Indicates Product Listedin TSCA Inventory (E= Exempt - Naturally Occurring Substance)(L= Low Volume Exemption)(S= Significant New Use Restriction)

HYDROLYTIC SENSITIVITY: 10 most sensitive to water; 0 least sensitive (see p.13 for details)Commercial Status- produced on a regular basis for inventory
Developmental Status- available to support development andcommercialization

HAZARD RATING INDEX

Health Hazard

Flammability Hazard

Reactivity Hazard

4 - Extreme: Highly Toxic — May befatal on short term exposure. Special
protective equipment required.
3 - Serious: Toxic —Avoid inhalationor skin contact.
2 - Moderate: Moderately Toxic — May
be harmful if inhaled or absorbed.
1 - Slight: Slightly toxic — May cause
slight irritation.
0 - Minimal: All Chemicals have somedegree of toxicity.

4 - Extreme: Extremely flammable gas
or liquid. Flash Point below 73°F
3 - Serious: Flammable — Flash Point
73°F to 100°F
2 - Moderate: Combustible —Requires moderate heating to ignite.
Flash Point 100°F to 200°F
1 - Slight: Slightly combustible —Requires strong heating to ignite.
0 - Minimal: Will not burn undernormal circumstances.

4 - Extreme: Explosive at room
temperature
3 - Serious: May explode if shocked,
heated under confinement or mixed
with water.
2 - Moderate: Unstable, may reactwith water.
1 - Slight: May react if heated or mixed
with water
0 - Minimal: Normally stable, does
not react with water
X - Protective Equipment: Consult
supervisor for instructions.

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ABBREVIATIONS
2, 2’ azobis(isobutyronitrile)

orl

oral

ALD

Atomic Layer DepositionPc

critical pressurecaapproximate concentration

PCVD

plasma assisted chemical vapor depositionCalcalories (equivalent to 4.1868 joules)

ppm

parts per million (1 x 10 -6)

Ctemperature in °Centigrade

rbt

rabbitCecoefficient of thermal expansion

RTV

room temperature vulcanizing resincSt

centistoke

SAM

self-assembled monolayerddecomposess, sub.

sublimesd4 (20°)specific gravity or density

Tc

critical temperature

CVD

chemical vapor deposition

Tg

glass transition temperaturee, Q

copolymerization cross propagation factors according
to the Alfrey-Price treatment: e (esu) is associatedwith radical and monomer polarization; Q (kcal/mole) is afunction of monomer reactivity principally
determined by resonance.

TLV

threshold limit value; the concentration of an airborne
constituent to which workers may be exposed
repeatedly, day by day, without adverse effect

TSCA

Toxic Substance Control Act; compounds so
designated have been listed in the TSCA inventory
L = Low Volume Exemption; S = Significant New Use
Restriction; E = Exempt (naturally occurring substance)

O

F

AIBN

Fieser & Fieser, Reagents for Organic Syntbesis, Wiley

g

grams

gpg

guinea pig

H

hour

ihl

inhalationipr

intraperitoneal

ivn

intravenousLClethal concentrationLD

lethal doseLolowest reported

MEHQhydroquinone, monomethyl ether

mus

mouse

Mn

molecular weight, number average

PR
O

F&F

MOCVD metal-organic chemical vapor depositionnDv, visc.

viscosityγ

surface tension, mγ/m=dynes/cm.

γccritical surface tension∆Hcomb heat of combustion∆Hformheat of formation∆Hfus

heat of fusion∆Hvap

heat of vaporization

50

50% fatality of test animals

100

100% fatality of test animals°

degrees C unless otherwise noted (°C = °K-273.15)>

greater than<less thanrefractive index (sodium D line-589.3 nm)

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9BEWARE –WATER, WATER EVERYWHERE
The effective utilization of most of the compounds offered by Gelest demands awareness of humidity in the laboratory environment. The
three most common problems with water are as follows:
1. Irreversible hydrolysis occurs with metal alkoxides, Grignards, silicon halides and germanium halides.
2. Binding of water with stable compounds can take place, forming stoichiometric hydrates. This most often occurs with metal salts
including pentanedionates.
3. Reversible absorption of unbound water to stable compounds. The metal organic salts frequently contain absorbed water which
can be removed by vacuum drying or dessication.

F

While vacuum systems and glove boxes provide insurance in protecting compounds from water contact, these techniques are usually notnecessary if the user has facile technique and works in nitrogen or argon purged systems. The difficulty in transferring the compounds
increases enormously when relative humidity exceeds 80% and the more rigorous techniques may be required.

O

HYDROLYTIC SENSITIVITY

We have attempted to rate the effect of moisture and water on the compounds provided. The rating is somewhat subjective, but isdesigned to provide a guideline for investigators unfamiliar with the classes of compounds offered in this handbook.

reacts extremely rapidly with moisture and oxygen – may be pyrophoric
glove box or sealed system required

9

reacts extremely rapidly with atmospheric moisture – may be pyrophoric
glove box or sealed system required

8

reacts rapidly with moisture, water, protic solvents
work under dry inert gases such as nitrogen or argon

7

reacts slowly with moisture/water
purge bottles and equipment with dry nitrogen

6

forms irreversible hydrate
purge bottles and equipment with dry air or nitrogen5

forms reversible hydrate
purge bottles and equipment with dry air or nitrogen4

no reaction with water under neutral conditions
keep containers tightly closed

3

reacts with aqueous basekeep containers tightly closed

2

reacts with aqueous acidkeep containers tightly closed

1

no significant reaction with aqueous systems
keep containers tightly closed

0

forms stable aqueous solutions
keep containers tightly closed

PR
O

10

10

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Enabling Your Technology

INTELLECTUAL CAUTION
The Gelest handbook is presented with the intention of stimulating development of new chemistry and applications for organometallics.
In order to do so, we have taken a few liberties. Be careful of the following:
1. We have included formulas with each of the listing which present structural organic features of the compounds. For the mostpart, the formulas do not represent coordination, molecular complexity, or ionic nature of the compounds depicted.

F

2. Applications and references cited in the literature are not meant to be complete. The references are selected subjectively, basedon either their interest or their representative nature in research or commercial activities. We have not substantiated whether
applications are practical or if they are protected by patents.

毒性O

一般的な安全衛生情報について

PR
O-CN、-N3、-NMe2、-NEt2、-NCO、-NCS、-OMe、-Cl の原子団が直接ケイ素、ゲルマニウム、錫に結合している場合には、水又はプロトン性溶剤中で分解して毒性物質を生成する場合がありますので十分注意をお払い下さい。
低級トリアルキル錫化合物は高毒性を示します。トリエチル錫とトリメチル錫化合物は溶媒和化５配位化合物を形成し神経組織に直接影響を与えます。ジアルキル錫体や高級アルキル基置換体になると毒性は減少します。ニトリルまたはアジド化合物を取り扱う場合には、特別な注意が必要です。芳香族シラトランはきわめて高レベルの毒性を有しています。カタログ収録の大部分の化合物は毒性試験を行っておりませんので、取り扱う際には適切な装置対応や保護具使用等、あらゆる予防措置を講じて下さい。
爆発の危険性

アジ化物は重金属、特に銅及び鉛と接触すると爆発性の不安定物質を生成する可能性があります。アジドシランがビニルクロロシランと反応すると爆発性化合物を生じます。フェニル其と水素を含有するシランはハロゲン化アル
ミニウムの存在下で、激しく不均化することがあります。N-リチオ及びソジオシラザン類は空気に触れると爆発する事があります。テトラアルキル鉛は加熱すると分解爆発する恐れがあります。
火災の危険性

ケイ素、ゲルマニウム、錫原子に３個ないし、それ以上の水素原子が結合しているケイ素、ゲルマニウム、錫化合
物は、いずれも発火の危険性を持っています。クロロアミノシランの混合物は紙などの可燃性物質に接触すると自然発火する場合があります。全ての有機ケイ素化合物及び水素含有ケイ素化合物は可燃性です。引火点（f.p.）を参照下さい。水素及びアルコキシ基を有するシラン化合物は、金属塩、アミンや白金触媒の存在下で不均化反応を起こし発火性物質を生成することがあります。
眼への危険性全てのケイ素化合物の蒸気に、眼を曝すのは非常に危険です。特に、トリエトキシシラン、テトラメトキシシラン
及びトリエトキシシランは一見無害に見えますが、角膜組織への浸透性が非常に高く、甚だしい場合には失明に至る可能性がありますので、取り扱いには十分注意してください。
腐食の危険性
ケイ素に結合した塩素は非常に不安定な為、クロロシラン類は水又はプロトン性溶剤に接触すると塩化水素を発生し腐食性を発現します。全てのクロロシラン類は多くの材質を侵すと同様に、人体の部位を危険に曝す腐食性を持っています。アルカリ金属及びアルカリ土類金属のアルコキシド類は強い塩基性で腐食性を有しています。
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11

GENERAL SAFETY INFORMATION

PR
O

O

F

Toxicity Hazard

Explosion Hazard

Flammability Hazards

Eye Hazard

Corrosivity Hazard

12

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Enabling Your Technology

PR
O

O

F

INFORMATION ON USING THE GELEST WEBSITE - www.gelest.com

The Gelest website is accessed through www.gelest.com. It provides options that allow one to:
–
–
–
–
–
–
–

search for a specific compound by name or registry (CAS) number.
obtain an MSDS for a compound.
obtain available size information.
register to order materials on the internet.
obtain a list of compounds as a function of application.
obtain a list of compounds containing a specific functionality.
obtain a list of compounds containing certain linkages, groups or functionalities
via the “Tanimoto Similarity” search which allows for searching by structure or substructure.
–access articles on the chemistry of the various types handled by Gelest.
–
obtain titles to current publications in silicon chemistry.
As an example of a search:
1.
Go to Product Search to obtain the screen as shown in figure 1.
2.
Select Advanced Query to get figure 2 without structure.
3.
Draw in the partial structure after selecting substructure from the dropdown box.
4.
In the example shown in figure 2 with structure the substructure contains thetBu-Si-O-S linkage. The search will find all structures with this linkage.
5.
The search provides the two structures shown in figure 3. Each structure, along with all
available information, can be individually accessed as in figure 4.
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13

F
O

Figure 1

PRO

The product search feature will assist you inquickly locating technical information, references
and properties on products offered by Gelest. If
you are unable to locate a particular product ofinterest please send an email to our technicalassistance service: sales@gelest.com.

The Advanced Query feature allows you to search by structure or substructure using the ChemDraw Plugin. It also
allows you to search by Product Code, Molecular Weight,
and Chemical Formula.

14

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O

O

F

Enabling Your Technology

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15

F

Special Closures for Glass Bottles

Our standard closures for bottles are conventional phenolic caps with polyethylene cone-seal liners. We offer
several options to meet special packaging requirements.

O

Solid Fluoropolymer Caps
Improved storage stability, particularly color, can be achievedby utilizing a solid fluoropolymer cap with a PTFE liner.

PR
O

Product CodezCAP-T-38/439

Fits
2.5L and 4L bottles

each
inquireSeptum Seal Caps
Septum seal caps allow syringe dispensing of air-sensitive
materials. The phenolic caps have a PTFE face on a silicone
disc. (0.25mm PTFE/2.25mm silicone).
Product CodezCAP-S-38/430
zCAP-S-33/400
zCAP-S-28/400
zCAP-S-22/400
zCAP-S-20/400
zCAP-S-18/400

16

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Gelest, Inc.

Fits
2.5L and 4L bottles
1 qt.
1 pt.
4 oz.
1 oz. and 2 oz.
1/2 oz.

(215) 547-1015

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Enabling Your Technology

Low Pressure Disposable CylindersO

Capacity
280ml
900ml
2400mlNominal Tare
0.44 kg
0.95 kg
1.70 kg

DOT
Specification
DOT-4B 240
DOT-4B 420 ET
DOT-4B 300

PRO

Product CodezCYL-G-0280
zCYL-G-0900
zCYL-G-2400

F

Gas Dispensing Cylinders
These cylinders are fabricated from carbon
steel. Standard fittings provided for gas
distribution are Nupro brass needle valves
with 1/4˝ Swagelok outlets. Cylinders are
DOT specified and rated at 240 psi. Empty
cylinders are shipped unassembled.

each
inquireinquireinquireLiquid Dispensing Cylinders
These cylinders are fabricated from carbon
steel under the specifications listed above,
but are fitted with a gas inlet and liquid
eduction tube. The brass valves have 1/4”
NPT outlets. Empty cylinders are shipped
unassembled.

Product CodeCapacity

Nominal Tareeach

zCYL-L-0280
zCYL-L-0900
zCYL-L-2400

280ml
900ml
2400ml0.69 kg
1.21 kg
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17

O

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Bulk Cylinders

PR
O

These carbon steel cylinders are for storing and dispensing bulk quantities of hazardousor air sensitive liquids and compressible gases. The cylinders meet the listed DOT
specifications and pressure ratings. All cylinders are fitted for both liquid and gas
dispensing. zCYL-B-022 is equipped with a dual port brass valve. zCYL-B-100 has
two brass valves with CGA 660 connections. zCYL-B-225 & zCYL-B-450 have 1”NPT
stainless ball valve (liquid) and a ¾” NPT stainless ball valve (vapor).
Product Code Capacity

Nominal Tare Pressure RatingzCYL-B-022
21.5 liters
14.7 kg
4BA400 - 400 psi
zCYL-B-100* 100 liters
33.7 kg
4BW260 - 260 psi
zCYL-B-225
225 liters
96.2 kg
4BW240 - 240 psi
zCYL-B-450
450 liters
150.6 kg
4BW240 - 240 psi*Heavy duty version suitable for pyrophoric material available, please inquire

18

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eachinquireinquireinquireinquireEnabling Your Technology

Stainless Steel Bulk Cylinders
Electropolished 316L stainless steel
cylinders for storing and dispensing bulk
quantities of corrosive or high purity
liquids and compressible gases. Headconfiguration includes four ¼˝ NPT pipe
fittings and 2˝ access port. The priceincludes two ¼˝ stainless needle valvesequipped ¼˝ Swagelok fittings.

Product Code Capacity

Pressure
Rating Nominal TarezCYL-S-004
zCYL-S-019

185 psi
185 psiF

HeightDOT
Specifications

DiameterHeighteach

UNIAI/X1.8/1390
UNIAI/X1.2/1390

229mm
229mm

273mm
616mm

inquireinquireDOT
Specifications

DiameterHeighteach

UNIAI/X1.2/1480

305mm

1070mminquireProduct Code Capacity

Pressure
Rating Nominal Tare

DOTSpecifications

DiameterHeighteach

zCYL-S-209

72 psiUNIAI/X1.8/640

610mm

1141mminquireO

4.5 kg9.6 kgPRO

3.8 liters
19 liters

Product Code Capacity

Pressure
Rating Nominal TarezCYL-S-060

185 psi

60 liters

209 liters

24.8 kg

70.8 kg

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19

Bubblers - Special Delivery Systems

O

F

Bubblers are usually employed with special delivery control systems associated with chemical vapor deposition.
They have both above liquid level access and dip tubes. In most applications the dip tube is used to sparge an
inert carrier gas through the liquid allowing transport of the product as a vapor. Bubblers are fabricated from 316L
stainless steel, rated at 260psi and equipped with high vacuum fittings. Bubblers ordered empty are shipped with
VCR fittings detached. Bubbler ordered with chemicals have fittings and gaskets assembled. Valve connections
are SS-4-VCR-3; Fillport is modified SS-8-VCR-1-8. They are manufactured to DOT specification DOT-4B 260.

PR
O

150ml
Bubbler

Product CodezBUB-S-0150

Capacity
150ml

4000ml
Bubbler

1000ml
Bubbler

Product CodezBUB-S-1000
zBUB-S-4000
20

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Nominal TarePrice
1.05 kginquireCapacity
1000ml4000mlGelest, Inc.

Nominal TarePrice
2.05 kginquire3.28 kginquire(215) 547-1015

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Enabling Your Technology

420 mlStainless Steel High Pressure Cylinders

O

F

High pressure 304 stainless steel cylinders are utilized as sample cylinders
or lecture-bottles for high purity and corrosive gases. Maximum pressure is
1800psi. They may be equipped with either CGA 350 (hydride and reducinggas) or CGA 330 (corrosive, typically chlorine or fluorine containing gas)valves. Cylinders are manufactured to DOT-3E 1800 specifications. Nominaltare with protective caps and plugs detached is 1.17 kg.
Product Code
Valve TypeCapacity
EachzCYL-HPS-0420-35
CGA 350
420ml
inquirezCYL-HPS-0420-33
CGA 330
420ml
inquireAluminum High Pressure Cylinders

PR
OHigh pressure aluminum alloy cylinders provide a high purity package fornon-corrosive gases. They are nonmagnetic and lightweight (about 1/3
lighter than steel cylinders) and are manufactured to consistently higher
weight and dimensional tolerances. Maximum pressure is 2000psi. Valves
are stainless steel with CGA 350 connections. Aluminum alloy cylinders are
suitable for silicon hydrides, germanium hydrides and other reducing gases.
DOT
Product CodeCapacity Nominal Tare Specification
EachzCYL-HPA-6000
6.0 liters
7.6 kgDOT-3AL 2216 inquirezCYL-HPA-29000
29 liters
22.7 kg
DOT-3AL 2015 inquirezCYL-HPA-49000
49 liters
39.5 kg
DOT-3AL-2216 inquire

29 Liter

6.0 Liter

Mini-Cylinders

Product CodezCYL-HPS-0050
zCYL-G-0025

Construction
Rating316 stainless 1000psig
carbon steel
350psig

Capacity
50 mls25 mlsNominal Tare* Price
303.2ginquire186.7ginquire*excluding caps

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21

Sublimation-Entrainer

O

F

Sublimation-Entrainers provide delivery sources for high-vapor pressure solids utilized in ALD and CVD
applications. The reservoir portion can be filled to level with solids. The domed head has a directed inlet for carrier
gas and a side exit for delivery. The reservoir can be heated to moderate temperatures (150°C) to increase vapor
pressure of solids and allow entrainment by carrier gases. An extra port is provided for evacuation or thermocouple
access. Sublimation-entrainers are fabricated from 316L stainless steel and equipped with high vacuum fittings.
Valve connections are SS-4-VCR-3. Auxilliary port is SS-8-VCR-1-8.

Capacity
275ml

Nominal Tare
2.80 kg

PR
O

Product CodezSUE-S-0275

PriceinquireStainless Steel Pails and Drums

Stainless steel pails and drums provide the the most cost-effective way to safely store and transport corrosive liquids.
The closed-head pails have ¾˝ and 2˝ threaded bungs. They are manufactured to DOT specification UN1A1/X1.8/270.

208L (55 gallon)

19L (5 gallon)

Product CodezDR-S-019
zDR-S-208

22

Capacity
19 liters
208 liters

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Gauge
19
18

Gelest, Inc.

Nominal Tare
4.37 kg
21.7 kg(215) 547-1015

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EachinquireinquireSiliconCompounds
Section 1-Silicon Chemistry Articles

F

An Organosilicon Chemistry Primer . . . . . . . . . . . . . . . . . . . . . 24
Naming Silicon Compounds . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Silicon Esters
by Barry Arkles . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29

O

Polysilanes
by Hee-Gweon Woo, Myong-Shik Cho
and Bo-Hye Kim . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 37

Silicon-Based Anion Relay Chemistryby Gerald L Larson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 45
Bioactive Organosilanes
by Scott McN. Sieburth . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 55

PR
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Cross-Coupling of Silanols and Silanolates
by Scott E. Denmark . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 63
Silicon-Based Blocking Agentsby Gerald L. Larson. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 71
Silicon-Based Reducing Agentsby Gerald L. Larson. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 99
Silanes and Surfaces
by Barry Arkles . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 120
Bond Dissociation Energies of Organosilicon Compounds
by Robin Walsh . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 163
Si NMR: Some Practical Aspects
by Frank Uhlig . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 167

Infrared Analysis of Organosilicon Compounds
by Phil Launer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 177

Section 2-Silicon Compounds:
Registry of Products and Properties
Silicon Compounds . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 181

Silicon Molecular Formula Index . . . . . . . . . . . . . . . . . . . . . . . 417

AN ORGANOSILICON CHEMISTRY PRIMER
Organosilanes are compounds containing a silicon to carbon bond. The chemistry of these compounds is generally similar to thechemistry of organic compounds. The silicon atom is more electropositive than carbon, leading to four primary distinctions.
1. Nucleophilic substitution at silicon is more facile than at carbon.
2. Bond energies with the electronegative elements oxygen, fluorine and chlorine are greater than with a carbon.
3. A silicon-carbon bond stabilizes a carbanion in the alpha position, and a carbocation in the beta position.

F

4. The Si-H bond is polarized with Si+ and H-, generally resulting in an anti-Markovnikov addition to olefins under catalytic
conditions and the ability under limited conditions to transfer hydride.

O

Organosilanes are derived from elemental silicon. Silicon in turn is produced from silica or quartz.

Chlorosilanes are often intermediates in production of organosilanes.

PRO

The chlorosilanes can be reacted either with Grignard reagents or alkali metal organics to give organic substitution. For example:

RLi + SiCl 4

RSiCl 3 + LiCl

A more efficient route is through hydrosilylation of an olefin, which is catalyzed by such materials as chloroplatinic acid, di-t-butyl
peroxide, and in limited instances amine complexes and aluminum chloride.

The greatest quantities of organosilanes are methyl substituted. They are produced by a direct process.

Chlorosilanes undergo several important reactions. Chlorine may be replaced with hydrogen either by treatment with hydride
reducing agents or transfer of a hydride from other silyl hydrides.

Chlorosilanes react with protic materials, forming alkoxysilanes with alcohols, aminosilanes with primary and secondary amines,
and silanols with water.

24

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Enabling Your Technology

The reaction with water is particularly important in that it provides a basis for silicone manufacture. Dimethyldichlorosilane isdifunctional. It reacts with water to form cyclic or straight chain polymers.

F

Alkoxysilanes (silane esters) undergo most of the reactions of chlorosilanes and are generally more convenient reagents. They are
more resistant to hydrolysis. Increasing the size or steric bulk of the alkoxy group decreases reactivity. Like chlorosilanes, they yieldsiloxanes on hydrolysis, but the byproduct is alcohol rather than hydrogen chloride. They undergo exchange with hydroxyl containing
materials under conditions similar to those for transesterification of carboxylic acid esters.

Alkoxysilanes undergo displacement of -OR on reaction with Grignard reagents, and reduction on treatment with metal hydrides.

O

Hydrogen bound to silicon can behave as a reducing agent. Triethylsilane and diphenylsilane are employed in the reduction of ketones
and esters. Polymethylhydrosiloxane has similar properties.

Halogenoid substituted silanes exhibit unique properties. The halogenoids include isocyanate, isothiocyanate, azide and nitrile groups.
The last two are of particular synthetic importance since they replace hydrazoic acid and hydrogen cyanide in many synthetic reactions.
Silylation is the replacement of the active hydrogen in a compound with a substituted silane group. The conspicuous applications are
the preparation of blocked intermediates and derivatization for chromatography.

PR
O

Surface synthesis and modification of a wide range of substrates may be accomplished with silanes. Deposition techniques include
the preparation of silicon for semiconductors with silane, dichlorosilane, and trichlorosilane. Silicon carbide deposition is carried out
at high temperature with methyltrichlorosilane. Silicon dioxide may be deposited from acyloxysilanes by a thermal process or by ahydrolytic process from esters.

Utilization of organosilanes has been directed toward surface modification rather than synthesis. Dimethyldichlorosilane,
dimethyldiethoxysilane, trimethylchlorosilane and hexamethyldisilazane are employed to reduce surface interaction of siliceous
materials and aluminas. Fluorinated alkylsilanes provide surfaces with even lower surface energy.

Treatment of surfaces can be used to tailor surfaces with particular properties for chromatography, extraction, and exchange resin
applications. Self-assembled monolayers of these materials have been employed in microcontact printing.
Silanes with reactive organic substitution are employed in thermoset and thermoplastic composites as coupling agents. Amine, olefin,
methacrylate, mercaptan, epoxy and cationic functionalities are usually employed. Bonding may be directly through covalent bonds orby modification of filler affinity through introduction of hydrogen bonding or ionic interaction sites.

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25

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O

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NAMING SILICON COMPOUNDS

26

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Enabling Your Technology

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27

F
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PR
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28

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SILICON ESTERS

By Barry Arkles
Reprinted from
Kirk-Othmer Encyclopedia of Chemical Technology,
Fourth Edition, Volume 22, Pages 69-81
ISBN 0-471-52691-6 Copyright©1997 by John Wiley & Sons, Inc.

Properties

Silicon esters are silicon compounds that contain an oxygen
bridge from silicon to an organic group, ie, Si–OR. The earliest
reported organic silicon compounds contain four oxygen bridges
and are often named as derivatives of orthosilicic acid, Si(OH)4.
The most conspicuous material is tetraethyl orthosilicate [78-104], Si(OC2H5)4. The advent of organosilanes that contain silicon–carbon bonds, Si–C, initiated an organic nomenclature by which
compounds are named as alkoxy derivatives. For example Si(OC2H5)4
becomes tetraethoxysilane. The compound CH3Si(OCH3)3 is named
methyltrimethoxysilane. Whereas the latter usage is preferred,
the literature even in the mid-1990s, particularly in ceramics(qv) technology, contains the older terms. Acyloxysilanes, eg,
tetraacetoxysilane, Si(OOCCH3)4, are also members of this class.
The chemistry and applications of acyloxysilanes are significantly
different from those of the alkoxysilanes.

The tetraalkoxysilanes possess excellent thermal stability andliquid behavior over a broad temperature range that widens withlength and branching of the substituents. The physical propertiesof the silane esters, particularly the polymeric esters containing
siloxane bonds, ie, Si–O–Si, are often likened to the silicone oils.
These have low pour points and similar temperature–viscosity
relationships. The alkoxysilanes generally have sweet, fruity odorsthat become less apparent as molecular weight increases. With the
exception of tetramethoxysilane, trimethoxysilane, triethoxysilane,
and a few closely related compounds that can be absorbed into
corneal tissue, causing eye damage, the alkoxysilanes generally
exhibit low levels of toxicity.

O

F

Silicon Esters

PRO

The physical properties of commercial alkoxysilanes areprovided in Table 1. Two classes of silane esters have very distinct
properties and are generally considered apart from alkoxysilanes.
Silatranes are compounds derived from trialkanolamines
and have silicon–nitrogen coordination. These are generallyhydrolytically stable and have unique physiological properties(3). A second special class of monomeric esters are cyclic diestersof polyethyleneoxide glycols designated sila-crowns, which haveapplication as catalysts (4). Neither silatranes nor sila-crowns are
considered herein.

Applications for tetraalkoxysilanes cover a broad range. These
compounds are classified roughly according to whether the Si–OR
bond is expected to remain intact or to be hydrolyzed in the final
application. Applications in which the Si–OR bond is hydrolyzed
include binders for foundry-mold sands used in invest- ment andthin-shell castings, binders for refractories (qv), resins, coatings(qv), sol–gel glasses, cross-linking agents, and adhesion promoters.
Applications in which the Si–OR bond remains intact include heattransfer and hydraulic fluids (qv). In general, the lower molecularweight compounds, eg, tetraethoxysilane and tetramethoxysilane,
are used in reactive applications, whereas compounds such as tetra2-ethylhexoxysilane are associated with mechanical applications.
Methyl- and phenyltrialkoxysilanes are primarily used in the
production of silicone resins and coatings. Longer-chain materials,
eg, propyl-, isobutyl-, and octyltrialkoxysilanes, are used inhydrophobic coatings, primarily for masonry and concrete. The
hydridoalkoxysilanes, triethoxysilane and trimethoxysilane, areintermediates for the production of organofunctional silanes.
Organosilane esters in which there is a functional or reactive
substitution of the organic radical are used as coupling agents.
Tetraethoxysilane and its polymeric derivatives account for >75%
of all production of nonfunctional silane esters.

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Aryloxy- and acyloxysilanes are often solids. The aryloxysilanes have excellent thermal stability. Acyloxy and mixed
acyloxyalkoxysilanes have poor thermal stability. Thermal
decomposition has been noted attemperatures as low as 110°C andis generally observed by 170°C.
The most significant difference between the alkoxysilanes
and silicones is the susceptibility of the Si–OR bond to hydrolysis(see Silicon Compounds, Silicones). The simple alkoxysilanes areoften operationally viewed as liquid sources of silicon dioxide (seeSilica). The hydrolysis reaction, which yields polymers of silicic
acid that can be dehydrated to silicon dioxide, is of considerable
commercial importance. The stoichiometry for hydrolysis fortetraethoxysilane isGelest, Inc.

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29

Table 1. Physical Properties of Silane Estersa
CAS
Registry
NumberFormulamethyltrimethoxysilane[1185-55-3]

CH3Si(OCH3)3

102–103

0.955

1.36460.5

8methyltriethoxysilane[2031-67-6]

CH3Si(OC2H5)3

141–143

0.895

1.38320.623ethyltrimethoxysilane[5314-55-6]

C2H5Si(OCH3)3

124–125

0.949

1.38380.527ethyltriethoxysilane[78-07-8]

C2H5Si(OC2H5)3

158–159

0.896

1.39550.7

40

13,720propyltrimethoxysilane[1067-25-0]

C3H7Si(OCH3)3

142

0.939

1.388034

7,420

propyltriethoxysilane[141-57-1]

C3HSi(OC2H5)3

179–180

0.892

1.395657

isobutyltrimethoxysilane[18395-30-7]

i-C4H9Si(OCH3)3

154

0.933

1.396042pentyltriethoxysilane[2761-24-2]

C5H1Si(OC2H5)3

95–61.3

0.895

1.405968octyltriethoxysilane[2943-75-1]

C8H17Si(OC2H5)3

98–92

<−40

0.875

1.4160octadecyltrimethoxysilane[3069-42-9]

C18H37Si(OCH3)3

1700.1

13–17

0.885

1.4391octadecyltriethoxysilane[112-04-9]

C18H37Si(OC2H5)3

165–92

10–12

0.87

1.4386phenyltriethoxysilane[780-69-8]

C6H5Si(OC2H5)3

112–3100.996

1.4718

47.7

CompoundBoiling
pointb,°C

Melting
point,°C

Density,g/cm3

Refractive
Viscosity, FlashLD50
index,
ΔHvap,
mm2/s point, (oral, rat)nD
kJ/molc
(=cP)
°C
mg/kg

Monoorganoalkoxysilanes

FO

Tetraorganoxysilanes and Polyorganoxysiloxanes

32.6

1.9

12,500d>2,000100

140>5,00096

2,830[681-84-5]

Si(OCH3)4

121–1222

1.032

1.3668

46.8

0.5

20

700

tetraethoxysilane[78-10-4]

Si(OC2H5)4

169

−85

0.934

1.3838

46.0

0.7

46

6,270

tetrapropoxysilane[682-01-9]

Si(O-n-C3H7)4

224–225

<−80

0.916

1.4012

1.7

95

tetraisopropoxysilanee[1992-48-9]

Si(O-i-C3H7)4

185–186

<−22

0.887

1.3845

46.8

1.2

60

tetrabutoxysilane[4766-57-8]

Si(O-n-C4H9)4

1154

<−80

0.899

1.4128

61.9

2.3

110

tetrakis(s-butoxy)silane[5089-76-9]

Si(O-sec-C4H9)4

872

0.885

1.4000

f

2.1

104

tetrakis(2-ethyl-butoxy)silane[78-13-7]

Si(OCH2CH(C2H5)2)4

4.4

f

116

22,130tetrakis(2-ethyl-hexoxy)silane[115-82-2]

Si(OCH2CH(C2H5)(C4H9))4

6.8

f

188

>22,000

tetrakis(2-methoxy-ethoxy)silane[2157-45-1]

140

tetraphenoxysilane

PRO

tetramethoxysilane

166–720.27

<−70

0.892

1.4309

1941

<−80

0.88

1.4388Si(OCH2CH2OCH3)4

17–8210

<−70

1.079

1.42194.4[1174-72-7]

Si(OC6H5)4

236–70.13

48–49

1.141

1.5540g

6.6h

hexaethoxydisiloxane[2157-42-8](C2H5O)3SiOSi(OC2H5)3

230–232

0.998

1.3914ethylsilicate 40i[18954-71-7]

ca(OSi(OC2H5)2)4-5

290–310−90 1.05–1.06

1.3914

4–5

tetracetoxysilane[5623-90-3]

Si(OOCCH3)4

1480.8 110 sub

1.06

1.422

methyltriacetoxysilane[4253-34-3]

CH3Si(OOCCH3)3

87–80.440

1.175

1.408385

ethyltriacetoxysilane[17689-77-9]

C2H5Si(OOCCH3)3

1071

7–9

1.143

1.4123106

di-t-butoxydiacetoxysilane[13170-23-5](t-C4H9O)2Si(OOCCH3)2

1020.7−41.0196

1.404

95

70.6

43

Acyloxysilanesa Ref. 1. b Subscript denotes pressure, other than atmospheric, in kPa. To convert kPa to psi, multiply by 0.145. cTo convert kJ to kcal, divide by 4.184. d Ref. 2. Value may
be questionable. eModel compound; not of commercial significance. f At 38°C. gAt 60°C. hAt 55°C. i Nominal values; commercial values may vary. Properties given are forthe average compound containing 40 wt % silicon dioxide.

30

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Enabling Your Technologyn Si(OC2H5)4 + 2x H2Oacid or base( Si(OC2H5)4(1-x)O2x )y + 4x ROH

Preparation of metal oxides by the sol–gel route proceeds
through three basic steps: (1) partial hydrolysis of metal alkoxides
to form reactive monomers; (2) the polycondensation of thesemonomers to form colloid-like oligomers (sol formation); and (3)additional hydrolysis to promote polymerization and crosslinking
leading to a three-dimensional matrix (gel formation). Although
presented herein sequentially, these reactions occur simultaneously
after the initial processing stage.

O

where x is the mol% partial hydrolysis. If the alkoxysilane isan organoalkoxysilane, eg, methyltriethoxysilane or phenyltriethoxysilane, the hydrolysis proceeds analogously to give theorganosilsesquioxanes, (RSiO1.5)n , instead of the dioxides, (SiO2)n.
Likewise diorganodialkoxysilanes yield silanediols upon hydrolysis.
Whereas the hydrolysis process is not usually considered to be an
equilibrium reaction, the equilibrium constant for the reaction is~2 × 10−3. The reversibility of the reaction only plays a significant
role when the hydrolysis products are soluble (9).

preparing specialty metal oxide glasses and ceramics by hydrolyzing
a chemical precursor or mixture of chemical precursors that passsequentially through a solution state and a gel state before being
dehydrated to a glass or ceramic. The use of sol–gel technology has
increased dramatically since 1980. A variety of techniques havebeen developed to prepare fibers, microspheres, thin films (qv), fine
powders, and monoliths. Applications for this technology include
protective coatings, catalysts, piezoelectric devices, waveguides,
lenses, high strength ceramics, superconductors, insulating
materials, and nuclear waste encapsulation. The flexibility of sol–gel technology allows unique access to multicomponent oxidesystems and low temperature process regimes. An excellent review
of sol–gel chemistry is available (13).

F

Silicon dioxide never forms directly during hydrolysis.
Intermediate ethoxy derivatives of silicic acid and polysilicatesform as hydrolysis progresses. The polysilicates grow in molecularweight until most or all of the ethoxy groups are removed anda nonlinear network of Si–O–Si remains. The development ofcyclic and cube structures containing 3–8 silicon atoms also
occurs (5–7). A numerical modeling system for the hydrolysisof tetraethoxysilane has been developed (8). The viscosity ofthe solution increases until gelation or precipitation. Partiallyhydrolyzed materials of this type often contain more than enoughsilanols, Si–OH, to displace most of the remaining ethoxy groups
in an acid- or base-catalyzed condensation. The stoichiometricequation for partial hydrolysis is

PRO

Monomer formation or partial hydrolysis

Redistilled tetraethoxysilane containing less than 1 ppm
chloride added to neutral 18 × 106 Ω water purged with nitrogen influorocarbon bottles does not hydrolyze to a gel for over 6 months(10). Without special precautions, tetraethoxysilane hydrolyzes toa gel in ~10 d ; tetramethoxysilane hydrolyzes in ~2 d ; and tetran-butoxysilane in ~25 d . The hydrolysis reaction is catalyzed byacid or base. Acid-catalyzed hydrolysis generally proceeds more
rapidly than base hydrolysis, and leads to more linear polymers
than base hydrolysis. In contrast to base-catalyzed hydrolysis,
there is a significant rate difference between the rate of hydrolysisof the first and second alkoxy groups in the presence of acid(see Table 1).
For binder preparation, dilute hydrochloric or acetic acids
are preferred, because these facilitate formation of stable silanol
condensation products. When more complete condensationor gelation is preferred, a wider range of catalysts, including
moderately basic ones, is employed. These materials, which areoften called hardeners or accelerators, include aqueous ammonia,
ammonium carbonate, triethanolamine, calcium hydroxide,
magnesium oxide, dicyclohexylamine, alcoholic ammonium
acetate, and tributyltin oxide (11, 12).

Sol–Gel Process Technology and Chemistry
The complete hydrolysis of tetraalkoxysilanes under highly
controlled conditions, usually without the presence of fillers, isassociated with sol–gel technology (qv). Sol–gel is a method for
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Sol formation or polycondensation

Gelation or cross-linking

Si
O

O

Si

R

O

O
O

Si

O

O

H

Si

O

O

H

H
O

O

Si

R

O

O
O

Si

O

O

H

Si

O

O

H

Δ, −Η2Ο
-C2H5OH

SiO2 gelwhere R is C2H5.
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Nonhydrolytic methods for the formation of silicon dioxidefrom tetraalkoxysilanes have been reported (14, 15). Others havebeen reinvestigated (16):2 HCOOH + Si (OC2 H5 )4

SiO2 + 2 C2 H5 OH + 2 HCOOC2 H5

Si (OCH2 C6 H5 )4 + SiCl4

SiO2 + 4 C6 H5 CH2 Cl

Simple alkyl- and aryltrialkoxysilanes have three rather thanfour matrix coordinations in the polymeric hydrolysates, leading
to less rigid structures than those derived from tetraalkoxysilanes.
These and other changes in physical characteristics, e.g. wetting
and partition properties, make these materials more appropriate
in a variety of coating applications, where tetraalkoxysilanes
are not acceptable. These materials are variously referred to as
T-resins, organosilsesquioxanes, and ormosils, from the termorganic modified silicas. Methylsilsesquioxanes are stable to
400°C. Phenylsilsesquioxanes are stable to 475°C.

Preparation
The principal method of silicon ester production is describedby Von Ebelman’s 1846 synthesis (21):F

As polymerization and cross-linking progress, the viscosityof the sol gradually increases until the sol–gel transition point isreached. At this point the viscosity abruptly increases and gelation
occurs. Further increases in cross-linking are promoted by drying
and other dehydration methods. Maximum density is achieved ina process called densification in which the isolated gel is heated
above its glass-transition temperature. The densification rate andtransition (sintering) temperature are influenced primarily by themorphology and composition of the gel.

SiCl4 + 4 C2 H5 OH

The reaction is generalized toO

The Si–OR bond undergoes a variety of reactions apartfrom hydrolysis and condensation. In one of the more important
aspects of reactivity, it is associated with the production of silicone
intermediates and with cross-linking reactions for silicone room
temperature vulcanizing materials (RTVs) (17). The reactivity of
the Si–OR bond is in many cases analogous to the Si–Cl bond,except that the reactions are more sluggish. These reactions
become increasingly more sluggish with greater bulk and stericscreening of the alkoxy group. Reactions that have been reviewed(18–20) include the following:

Si (OC2 H5 )4 + 4 HCl

PR
O

Process considerations must not only take into accountcharacteristics of the particular alcohol or phenol to be esterified,
but also the self-propagating by-product reaction, which results inpolymer formation.

O

SiOR + (R′C)2OOO

SiOCR′ + R′COR

In comparison to the Si–OR bond, the Si–C bond can beconsidered essentially unreactive if the organic moiety is a simple
unsubstituted hydrocarbon. If the organic moiety is substituted asin the case of a trialkoxysilane, the chemistry is more appropriately
considered elsewhere (see Silicon Compounds, Silanes; SiliconCompounds, Silylating Agents).

32

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Methods used to remove hydrogen chloride include theuse of refluxing solvents or reaction mixtures, sparging dry air
or nitrogen through the reaction mixture, and conducting thereaction in vapor phase or under applied vacuum. Amines canbe employed as base-acceptors, but generally this is not practicalcommercially. In batch processes, the alcohol is always added
to the chlorosilane. Continuous processes involve (1) pumping
the alcohol and chlorosilane together in a mixing section,(2) introducing the chlorosilane vapor countercurrent to liquidalcohol, or (3) introducing chlorosilane vapor in a two-column
reaction distillation scheme in which substoichiometric alcohol
is introduced center-column to a chlorosilane, removing HCland unreacted alcohol in the overhead, and in the second stagea slight excess of the alcohol is introduced center-column,
recovering the excess overhead and removing product from thebottom. All processes provide a method for removal of by-producthydrogen chloride. The energy of activation for the reaction of
ethanol with silicon tetrachloride in the vapor phase is 64.9 kJ/mol(15.5 kcal/mol) (22). The initial stages of the esterification
processes are endothermic because the heat of evaporation of HClcools the reaction mixture. In the last stages of esterification, themixtures are usually heated during the final addition of alcohol.
Tertiary alkoxides cannot be formed in this manner.

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O
SiCl + (RO)3CH

SiOR + RCl + ROCH

SiCl + NaOR
SiH + HOR

catalyst

SiOR + NaCl
SiOR + H2

O
SiCl + RCH

CH2

SiOH + HOR
SiCl + CH3 NO2SiSR + HOR

SiOCH2CH(Cl)RSiOR + H2 O
SiOCH3 + NO2 Cl
SiOR + H2 S

The acyloxysilanes are produced by the reaction of ananhydride and a chlorosilane.

O

Although known since the 1940s and 1950s (23, 24), catalyzed
direct reactions of alcohols using silicon metal have become
important commercial technology in the 1990s for production oflower esters. Patents have reported the reactions of methanol andethanol with silicon in high boiling solvents, or in contained reaction
products to give high yields of trialkoxysilanes and tetraalkoxysilanes(25, 26). It has been demonstrated that in the presence of a methoxy
compound, where M is a metal, and under moderate pressure,
substantial improvements in yield can be achieved (27).

Other preparative methods for alkoxysilanes, in approximate
order of declining utility, are given by the following equations (34–40):

F

In the batch production of tetraethoxysilane from silicontetrachloride, the initial reaction product contains at least 90 wt% tetraethoxysilane with a 28 wt % SiO2 content. Distillation
removes alcohol and high boiling impurities, and the distilled
product contains at least 98% tetraethoxysilane and is called pureethyl silicate. Partially hydrolyzed or polymeric versions where
substantial portions have an average of 4–5 silicon atoms and 40
wt % SiO2 or have an average of 5–8 silicon atoms and a 50 wt% SiO2 content are referred to as ethylsilicate 40 and ethylsilicate
50, respectively. Ethylsilicate 50 has a branched structure withapproximately 30–35% of all silicon atoms bonded to two othersby oxygen bridges; 35–38% are bonded to three silicon atoms;
and 12–16% are bonded to four silicon atoms. Model systems forhydrolyzed tetraethoxysilane which include cube as well as cyclic
structures have been prepared (4).

O

SiCl4 + 4 (RC)2OOO

Si(OCR)4 + 4 RCClPR
O

The analogous reaction between anhydrides and alkoxysilanes
also produces acyloxysilanes. The direct reaction of acids
with chlorosilanes does not cleanly lead to full substitution.
Commercial production of methyltriacetoxysilane directly frommethyltrichlorosilane and acetic acid has been made possible by
the addition of small amounts of acetic anhydride or EDTA, or
acceptance of dimethyltetraacetoxydisiloxane in the final room
temperature vulcanizing (RTV) application (41–43). A reaction that
leads to the formation of acyloxysilanes is the interaction of acidchlorides with silylamides.

The synthesis of triethoxysilane (28) and trimethoxysilane(29) has also been achieved by direct process. In 1980 there were
no direct processes for the production of alkoxysilanes. In 1995
Silbond in Weston, Michigan, and Carboline in St. Louis, Missouri,
operated processes for the production of tetraethoxysilane in the
United States, and OSi/Witco announced start-up of a process to
produce triethoxysilane and tetraethoxysilane in Termoli, Italy.

Apart from the direct action of an alcohol on a chlorosilane
or silicon, the only other commercial method used to prepare
alkoxysilanes is transesterification.

Transesterification, an equilibrium reaction, is practical only
when the alcohol to be esterified has a high boiling point and theleaving alcohol can be removed by distillation. The most widelyused catalysts are sodium alcoholates and organic titanates,
although amines are also used (30, 31).
A provocative reaction of ethylene glycol directly with silicon
dioxide that leads to a complex mixture of oligomeric and cyclic
ester species has been reported (32). This reaction proceeds in thepresence of sodium hydroxide or in the presence of high boiling
tertiary amines (33).

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Toxicity
The alkoxysilanes generally have a low order of toxicity, which
may be associated with their alcoholic products of hydrolysis.
Notable exceptions are tetramethoxysilane and two hydridosilanes,
trimethoxysilane and triethoxysilane. Triethoxymethoxysilane
is the lowest member of the series in which the hazard issubstantially reduced. Vapors of these materials may be absorbed
directly into corneal tissue, causing blindness (44). The onset of
corneal damage is noted by a scratchy feeling in the eyes, usually
2–4 h after exposure. The effects of exposure to the methoxysilanes
are rarely reversible. This is a significant consideration for worker
safety. Especially because of the pleasant minty or fruity fragrance,
warnings of exposure to silicon esters are frequently ignored.

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Water Repellents

Precision Casting

Protective and consolidating coatings for masonry and otherapplications are produced from methyl-, propyl-, isobutyl-, andoctyltrialkoxysilanes (57). Applications for these materials are in two
principal markets: vertical, i.e. buildings; and horizontal, i.e. bridge
decks, parking garages, etc. Performance characteristics such as
substrate penetration often make use of lower alkyltrialkoxysilanes,
important where salt penetration is a concern. A water repellent
based on isobutyltrimethoxysilane is marketed under the tradename of Chem-Trete by Hüls. The ability of longer alkyls to form
stable emulsions makes them preferred for cost and safety (58). A
product based on octyltriethoxysilane is marketed under the tradename Enviroseal by Harris Specialty Chemical.

The ethoxysilanes are used as binders in precision casting forinvestment and thin-shell processing (45–47). Ethylsilicate 40 andits partial hydrolysates are preponderant. In the investment process,
3–10% excess water is added to a prehydrolyzed silicate binder.
This is mixed with refractory material. If the refractory material
contains magnesium oxide or calcium hydroxide, gelation occurs in
40–60 min. If these additives are not present or an accelerated cureis required, catalysts are added to the binder prior to mixing withthe refractory. In the thin-shell process, fusible patterns are dipped
into slurries made of a refractory and ethylsilicate binder. Curing isaccomplished by air drying or exposure to ammonia vapor. Ethanolfrom hydrolysis is either allowed to evaporate or is burned off before
firing. The utilization of silicate esters has diminished since the1980s, owing to their partial replacement by colloidal silicas.

Bonded Phases

Substrate-bond hydrocarbon coatings for high pressureliquid chromatography (HPLC) and flash chromatography
are prepared from octyltrialkoxysilanes and other long-chain
alkyltrialkoxysilanes (see Chromatography).

O

Cements and Ceramics

F

Uses

Refractory cements and ceramics (qv) are preparedfrom slurries of silica, zirconia, alumina, or magnesia and a
prehydrolyzed silicate (see Cement). Calcining at 1000°C yields
cured refractory shapes (48, 49).

Glass Frosting

Hydraulic fluids (qv) for high altitude supersonic aircraft
and thermal exchange applications including solar panels employ
fluids such as tetrakis(2-ethylhexoxy)silane. These products havebeen marketed under the trade name Coolanol by Monsanto.

Silicone Room Temperature
Vulcanizing Cross-Linking

PRO

Deposition of silicon dioxide is used to impart a translucent
coating on glass (qv) (50). The surfaces are either exposed totetraethoxysilane or tetramethoxysilane under high moisture
conditions, or the alkoxysilanes are ignited and the resulting
powder is applied to the surface.

Hydraulic and Heat-Transfer Fluids

Paints and Coatings

Ethoxysilanes are used in high temperature, zinc-rich paints(see Paint) (51, 52). Methyl- and phenyltrialkoxysilanes are used
to prepare abrasion-resistant coatings for plastics (53), particularly
polycarbonate (54, 55), and dielectric coatings and seals for highvoltage electrical components, including television tubes.

Sol–Gel Glasses and Ceramics

Although sol–gel is actually a process, not a product, several
classes of materials are associated with the sol–gel process. Sol–gelderived materials include fine powders, coatings and monoliths,
and aerogels (qv). Sol–gel-derived powders are produced by the
Stöber process (56) and variations of it. The products are usedin catalysis and chromatography. Unmodified silica coatings are
employed in the preparation of ion-free coatings on glass used inliquid crystal displays (LCDs), coatings for eyewear, and industrial
and automotive plastic glazing. Small-diameter lenses and gradientindex (GRIN) optics are in commercial development, as of 1996.
Aerogels derived from tetraethoxysilane have extremely great
potential as insulating materials. BASF has introduced a productbased on this technology called Basogel.

34

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Condensation-cured polydimethylsiloxanes contain terminal
silanol groups which condense with the silanols produced by ambientmoisture hydrolysis of acyloxysilanes. Methyltriacetoxysilane,
ethyltriacetoxysilane, and tetraacetoxysilane are the mostcommonly used cross-linking agents.

Spin-On Glass
In microelectronic applications, films of silicon dioxide aredeposited on silicon substrates by the application of a partiallyhydrolyzed solution of tetraethoxysilane or methyltriethoxysilane(59, 60). A product based on this technology is marketed under
the name Accuspin by AlliedSignal.

Chemical Vapor Deposition
Chemical vapor deposition (CVD) of silicon dioxide fromtetraethoxysilane assisted by the presence of oxygen and a plasma
is an important technology for the deposition of pure and modified
dielectrics for microelectronics (61). An alternative method for thedeposition of silicon dioxide utilizes di-t-butoxydiacetoxysilane (62).

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Bibliography

Rubber Chem. Tech. Revs. 52, 437 (1979).

Related Articles
Silicon Compounds, Silanes; Silicones; Heat-Exchange
Technology; Paint

References
1. B. Arkles, Silicon, Germanium, Tin, and Lead Compounds: A
Survey of Properties and Chemistry, Gelest, Inc., Tullytown,Pa., 1995.
2. N. Sax and R. Lewis, Dangerous Properties of Industrial
Materials, Van Nostrand Reinhold Co., Inc., New York, 1989.

4. B. Arkles, R. Anderson, and K. King, Organometallics 2,454 (1983).
5. J. F. Brown Jr., J. Am. Chem. Soc. 87, 4317 (1965).

20. M. G. Voronkov, V. P. Mileshevich, and Yu. A. Yuzhelevski,
The Siloxane Bond, Plenum Publishing Corp., New York,1978.
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23. U.S. Pat. 2,473,260 (June 26, 1946), E. G. Rochow(to General Electric).

24. U.S. Pat. 3,072,700 (Jan. 8, 1963), N. de Wit (to Union Carbide).
25. B. Kanner and K. M. Lewis, in K. M. Lewis and D. G.
Rethwisch, eds., Catalyzed Direct Reactions of Silicon,
Elsevier Science, Inc., New York, 1993, p. 39.

P. Cagle and co-workers, in B. Zelinski and co-workers, eds.,
Better Ceramics Through Chemistry IV, MRS Proc. 180, 1990,
p. 961.

26. U.S. Pat. 4,323,690 (Apr. 6, 1982), J. F. Montle, H. J. Markowsi,
P. D. Lodewyck, and D. F. Schneider (to Carboline).
27. U.S. Pat. 4,113,761 (Sept. 12, 1978), G. Kreuzberg, A. Lenz,
and W. Rogher (to Dynamit Nobel).
28. Jpn. Kokai Tokkyo Koho 80 28,929 (Feb. 29, 1980), S. Suzuki,
T. Imaki, and T. Yamamura (to Mitsubishi).
29. U.S. Pat. 5,084,590 (Jan. 28, 1992), J. S. Ritscher and T. E.
Childress (to Union Carbide).

PR
O

6.

19. R. C. Mehrotra, V. D. Gupta, and G. Srivastiva, Rev. Silicon,
Germanium, Tin Lead Comp. 1, 299 (1975).

O

3. M. G. Voronkov, in G. Bendz and I. Lindqvist, eds.,
Biochemistry of Silicon and Related Problems, Plenum
Publishing Corp., New York, 1977, p. 395.

18. B. Arkles, in G. Silverman and P. Rackita, eds., Grignard
Reagents, Marcel Dekker, New York, 1996, p. 667.

F

“Silicon Esters and Ethers” under “Silicon Compounds”
in ECT 1st ed., Vol. 12, pp. 371–372, by E. G. Rochow, Harvard
University; in ECT 2nd ed., Vol. 18, pp. 216–221, by A. R.
Anderson, Anderson Development Co.; in ECT 3rd ed., Vol. 20,
pp. 912–921, by B. Arkles, Petrarch Systems, Inc.

7. F. Feher, D. Newman, and J. Walzer, J. Am. Chem. Soc. 111,
1741 (1989).

8. B. D. Kay and R. A. Assink, J. Non Cryst. Sol. 104, 112 (1988).
9. B. Arkles, J. Steinmetz, J. Zazyczny, and P. Mehta in K. L.
Mittal, ed., Silanes & Other Coupling Agents, VSP, 1993, p. 91.

30. P. D. George and J. R. Ladd, J. Am. Chem. Soc. 75, 987 (1953).
31. H. Steimann, G. Tschernko, and H. Hamann, Z. Chem. 17,
89 (1977).
32. R. M. Laine, Nature 353, 640 (1991).
33. R. M. Laine, Chem. Mat. 6, 2177 (1994).

10. Technical data, Gelest, Inc., Tullytown, Pa., 1992.

34. L. M. Shore, J. Am. Chem. Soc. 76, 1390 (1959).

11. U.S. Pat. 2,550,923 (May 1, 1951), C. Shaw, J. E. Hocksford,
and W. E. Smith (to Shaw and Langish-Smith); U.S. Pat.
2,795,022 (June 11, 1957), N. Shaw (to Shaw Process).

35. U.S. Pat. 2,381,137 (May 14, 1942), W. I. Patnode and R. O.
Sauer (to General Electric).

12. H. G. Emblem and T. R. Turger, Trans. Br. Ceram. Soc.
78(5), 1979.

37. V. Day, W. Klemperer, V. Mainz, and D. Millar, J. Am. Chem.
Soc. 107, 8262 (1985).

13. C. J. Brinker, G. W. Scherer, Sol-Gel Science, Academic Press,
Orlando, Fla., 1990.

38. A. Weiss and G. Reiff, Z. Anorg. Allg. Chem. 311, 151 (1961).

14. U.S. Pat. 4,950,779 (Aug. 21, 1990), J. H. Wengrovius andV. M. VanValkenburgh (to General Electric).

15. U.S. Pat. 5,441,718 (Aug. 15, 1995), K. Sharp (to E. I. du Pont
de Nemours & Co., Inc.).

16. S. Acosta and co-workers, in S. Acosta and co-workers, Better
Ceramics Through Chemistry VI, MRS Proc. 346, 1994, p. 43.
17. E. L. Warrick, O. R. Pierce, K. E. Polmanteer, and J. C. Saam,

www.AZmax.co.jp TEL: 03-5543-1630

36. D. Seyferth and E. G. Rochow, J. Org. Chem. 20, 250 (1955).

39. M. E. Havill, I. Jofee, and H. W. Post, J. Org. Chem. 13,
280 (1948).
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H. D. Erasmus, and F. M. Fowler (to Union Carbide).
41. U.S. Pat. 3,9784,198 (Aug. 10, 1976), B. Ashby(to General Electric).

42. U.S. Pat. 4,329,484, L. P. Peterson (to General Electric).

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3543. U.S. Pat. 4,332,956 (June 1, 1982), L. A. Tolentino(to General Electric).
44. H. F. Smith, The Effect of Tetramethylorthosilicate on the Eyes,
Carbide and Carbon Chemicals Industrial Fellowship 274-1,
Mellon Institute, Pittsburgh, Pa.
45. A. Dunlop, Foundry Trade J. 75, 107 (1945).
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Bros. Ltd.).

49. U.S. Pat. 2,678,282 (May 11, 1954), C. Jones (to Pilkington
Bros. Ltd.).
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O

51. U.S. Pat. 3,056,684 (Oct. 11, 1962), S. L. Lopata (to Carboline).

F

48. H. G. Emblem and I. R. Walters, J. Appl. Chem., Biotechnol.
27, 618 (1977).

52. D. M. Berger, Met. Finishing 72(4), 27 (1979).

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Harris (to Dow Corning).
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PR
O

55. U.S. Pat. 4,491,508 (Jan. 1, 1985), D. R. Olson and K. K. Webb
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36

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Enabling Your Technology

Polysilanes: Dehydrocoupling of Hydrosilanes

Hee-Gweon Woo*1, Myong-Shik Cho1, and Bo-Hye Kim2
Nanotechnology Research Center and Department of Chemistry,
Chonnam National University, Gwangju 500-757, Korea
2
Department of Korean Medicinal Supply, Dongshin University, Naju 520-714, Korea* Corresponding author. Phone: 82-62-530-3378; Fax: 82-62-530-3389;
E-mail: hgwoo@chonnam.ac.kr
1O

Organic polymers mainly consist of carbon (group 14) atoms
linked together or separated by heteroatoms such as oxygenor nitrogen.1 Most of them seldom decompose in nature andtend to and burn with the release of toxic chemicals, leading toserious environmental pollution and fatal damage. Furthermore,
the availability of raw materials for organic polymers is limitedby the expected shortage of petroleum/coal natural resources.2
Main group metal-containing and transition metal-containing
inorganic polymers have been heavily reviewed by many
authors3 and are beyond the scope of this article. Main groupmetalloid-containing inorganic polymers possessing unusual
properties are made up of mainly boron (group 13), silicon/
germanium/tin (group 14), phosphorous (group 15), and sulfur(group 16) atoms, which do not originate from petroleum/coalresources.1b,2 In particular, silicon-based polymers exhibit quite
unusual properties as advanced specialty materials.4

xylene at reflux temperature has some serious problems: (1)intolerance of certain reducible functional groups, (2) lack of
reproducibility from the heterogeneous reaction medium, and(3) limitations in control of the stereochemistry and molecularweight distribution. Some improvements have been made bytuning several factors under ultrasonic activation.10b As analternative, the catalytic dehydrocoupling of hydrosilanes,
mediated by transition metal group 4 metallocene such as
dimethyltitanocene or dimethylzirconocene, was first reported
by Harrod and coworkers (eq. 1).

F

Introduction-H2

Cp2TiMe2

Si

(1)

Ph n

PR
O

n PhSiH3

H

For the heavier elements in group 14 the formation of
D-D bonds to produce a long chain polymer has proven to bedifficult because stable unsaturated D=D species, analogues ofvinyl compounds, can be prepared only in the combination withsterically bulky substituents, which deter their polymerization.1,4-6
Wurtz-type coupling of dichlorosilanes using an alkali metal
dispersion has widely been used in industry, but is very
problematic. As an alternative, dehydrocoupling of hydrosilanes
to polysilanes is a useful synthetic route. Hydrosilanes possess
an Si-H bond (bond energy of 320 kJ/mole) that is more reactive
than the C-H bond of hydrocarbons (bond energy of 416 kJ/
mol).7 This article mainly describes some of the recent advancesthat have been made by us with respect to silicon-based polymers
prepared by the dehydrocoupling of hydrosilanes.

Linear-Selective Dehydrocouplingof Hydrosilanes to Polysilanes

Polysilanes are used for many applications in ceramics/
composites, photoelectronics, photoresistors, and nonlinear
optics.8,9 The peculiar optoelectronic properties of polysilanes
are due to sigma-conjugation of the silicon atoms in the polymer
chain, varying with the molecular weight, conformation,and substituents of the polymer.10a Wurtz-type coupling of
dihalosilanes with an alkali metal dispersion in toluene or
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The dehydrocoupling of hydrosilanes generally produces
a mixture of linear polysilanes and cyclic oligosilanes, leading
to the decrease of polymer molecular weights and impropermolecular weight distribution. Several studies to improve thesituation were made with great efforts by many researchers
worldwide.11-13 For the selective production of linear polysilane
the careful design of new group 4 metallocene-based catalyst
systems is important with proper tuning of other factors suchas addition rate/order of reagents, reaction temperature, among
others.12a Linear (high molecular weight) polysilanes can be usedas precursors for making functional polysilanes by introducing
useful functional groups on the silicon atoms of linear polysilane
backbone. The Tilley group reported the synthesis of highmolecular weight polyphenylsilanes with number-averagemolecular weight (Mn) of ca. 5300 and 4700 g/mol through thecareful control of the reaction conditions of the phenylsilane
dehydrocoupling using zirconocene-based catalysts.12a,14 The
Tanaka15 and Harrod16 groups also prepared polyphenylsilanes
with Mn of ca. 4600 and 7300 g/mol, respectively, from thedehydrocoupling of phenylsilane by using the zirconocenebased combination catalysts of[Me2N(CH2)3-H4C5](Me5C5)ZrCl2/2MeLi andCp(Me5C5)ZrCl2/2n-BuLi/(C6F5)3B, respectively.
A comprehensive survey of the catalytic dehydrocoupling ofhydrosilanes under the influence of a wide range of early and latetransition metal complexes was recently provided by Corey.13b

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37

n PhSiH3-H2
Cp2TiMe2(M = Ti, Zr, Hf)

H
(2)

Si
Ph n

PR
O

O

Woo’s in-situ catalyst system of Cp’2MCl2/Hydride is different
from the catalyst systems using Cp’2MCl2/2RLi of Corey, Tanaka,and Harrod. True catalytic species in the dehydrocoupling ofhydrosilanes could be a metallocene-based hydride according to
the sigma-bond metathesis mechanism.12,13b Inorganic hydrides
effectively can produce a metallocene hydride by Cl/H metathesis
between inorganic hydride and metallocene dichloride whereas
two alkyllithiums produce a metallocene hydride via a complex
process (e.g., reductive elimination of metallocene alkyls or reaction
with hydrosilane after Cl/R metathesis). No appreciable induction
period is observed for the Cp’2MCl2/Hydride combination catalyst.
For Cp’2TiCl2/Hydride combination catalyst the molecular weight
distributions measured from the GPC traces were bimodal,
indicating the presence of linear polysilanes and cyclic oligosilanes.
The formation of cyclic oligosilanes can be estimated by integrationof the GPC peaks. The peaks corresponding to SiH in the 1H NMR
spectrum can visually be separated as linear polysilane (δ 4.2~ 4.8 ppm range) and cyclic oligosilane (δ 4.9 ~ 5.3 ppm range).
The formation of the cyclic oligosilanes can be also estimatedby integration of the 1H NMR peaks, and is used as a means ofcross-checking the cyclic/linear ratio. Woo et al. also examined
the other group 4 metallocene-based combination catalysts forthe dehydrocoupling of phenylsilane under various reaction
conditions. The dehydrocoupling of phenylsilane with Cp’2MCl2/
Red-Al (M = Zr, Hf) combination catalysts rapidly produces mainly
linear polyphenylsilanes. The linear selectivity increases in theorder: Cp2Ti (64%) < Cp2Zr (92%) < Cp(C5Me5)Zr (95%) < Cp2Hf(99%) < Cp(C5Me5)Hf (<99%).17b The higher linear-selectivity of
the hafnocene relative to the zirconocene is likely due to the lower
intrinsic dehydrocoupling activity (originating from stronger Hf-H
and Hf-Si bond strengths). The lower linear-selectivity of titanocene
relative to zirconocene and hafnocene is due probably to the combined
effect of greater intrinsic dehydrocoupling activity (stemmingfrom much weaker Ti-H and Ti-Si bond strengths) and muchsmaller atomic size (overriding steric crowding around the metal
center) of Ti.18 The change in linear selectivity is more pronounced
than in other catalytic combination systems: Cp2TiCl2/2MeLi(55%) < Cp2ZrCl2/2MeLi (75%), Cp2TiCl2/2n-BuLi (75%) <Cp(C5Me5)ZrCl2/2n-BuLi (80%) < Cp2HfCl2/2MeLi (85%).16,18
The coordinating environment around the metal center of
the Cp2MCl2/Red-Al combination catalysts could be different
from other catalytic systems such as Cp2MCl2/2R’Li.14,15,18,20

Red (or Vitride; sodium bis(2-methoxyethoxy)aluminum
hydride; Na[H2Al(OCH2CH2OMe)2], soluble in toluene andcommercially available) will be stoichiometrically converted
into Na[Cl2Al(OCH2CH2OMe)2] after reacting with dichlorometallocene. The coordinating structure of the present
catalytic system could be similar to the zwitterionic structurein the Cp2ZrCl2/2n-BuLi/(C6F5)3B catalytic system.16,19 The
Na[Cl2Al(OCH2CH2OMe)2] moiety may influence by simply
coordinating to the metal through an H, Cl-bridge or H, OMebridge between the group 4 metal and Al metal. The favorable
steric demands imposed by the Cp ring and cocatalyst moiety
could prevent the formation of the inactive dimer of metallocene
hydride and could suppress the cyclic oligomer formationby chain scission reaction as well, leading to greater chain
elongation.15, 16 However, an overriding steric demand resultsin low dehydrocoupling activity. The order of dehydrocoupling
activity for the various zirconocenes turned out to be the sameas the sequence of Tilley12 and Harrod16: (C5Me5)2Zr << Cp2Zr< Cp(C5Me5)Zr. The (C5Me5)2ZrCl2/Red-Al combination catalyst
thus slowly produces a mixture of dimer, trimer, and tetramer. In
addition, the order of linear-selectivity for the dehydrocouplingof phenylsilane catalyzed by hydrides with Cp2ZrCl2 was found to
be Super Hydride (82%) < N-Selectride (88%) < Red-Al (92%).17c
The dehydrocoupling of PhCH2SiH3 yields only low-molecularweight oligomers since an alkylsilane is generally less reactive thanan arylsilane.20 The molecular weights of polymers increase withhigher catalyst concentration (1 mol% versus 5 mol%), but it islittle affected by longer reaction times (1 day versus 5 days).17b As
expected, linear selectivity and molecular weights decrease withadding solvent and with heating, which was similarly observedin other catalytic systems.12a,16 The reason could be because
dilution and heating could hamper the tight coordination of
the Na[Cl2Al(OCH2CH2OMe)2] moiety to the metal center. The
proper coordination of the aluminium moiety to the catalyst center
should be necessary for the linear selectivity. Linear selectivity andmolecular weights decrease drastically by adding 4 Å molecularsieve (MS 4Å). The interaction of Na[Cl2Al(OCH2CH2OMe)2]
moiety with MS 4Å might prevent the close coordination ofNa[Cl2Al(OCH2CH2OMe)2] moiety to the metal center.17b An
exact molar ratio of Red-Al to dichlorometallocene is necessary
to replace both chlorines to attain high reactivity. The inactivity
observed for higher molar ratios of Red-Al to dichlorometallocene
could be attributed to over-complexation of Red-Al moieties tothe metal, blocking the empty coordination site necessary forthe dehydrocoupling of silane.18 The poor activity is observed
for lower molar ratios of Red-Al to dichlorometallocene. All theexperimental results described above firmly suggest that better
catalysts affording higher linear-selectivity and higher-molecularweight polymer can be properly designed by tuning the steric andelectronic character of the catalyst environment, including metal,
ligand and co-catalyst moieties.

F

Woo and co-workers recently developed a facile, highlylinear-selective dehydrocoupling catalyst system of phenylsilane:
Cp’2MCl2/Hydride (Cp’ = C5H5 or C5Me5; M = Ti, Zr, Hf;
Hydride = Red-Al, Selectride, Super Hydride) combination
catalysts (eq. 2).11, 17

38

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It is interesting to note that the dehydrocoupling of
p-fluorophenylsilane using Cp2ZrCl2/Red-Al produced soluble
armophous polysilane (ca. 75%) and sparingly-soluble crystalline

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Enabling Your Technology

Linear high molecular weight polysilanes can be used as
precursors for making functional polysilanes by introducing
functional groups on the linear polysilane. The Si-H bonds inthe backbone chain of poly(hydrophenylsilane) are transformed
to Si-Cl bonds using a mild chlorinating reagent, CCl4. The Si-Cl
bonds in the poly(chlorophenylsilane) can be replaced by various
nucleophiles such as cyclopropyl, epoxy, aziridinyl, pyridyl,
bipyridyl, phosphinyl, poly(ethylene oxide), thiol, etc. to give newfunctional polymers which can be used for applications in sensors,ion-exchange resins, batteries, drug delivery, metal nanomaterials
preparation, etc.17e

As an alternative to the Wurtz coupling of 1,1-dichlorosilole,
the homogeneous dehydrocoupling methodology wasdemonstrated in Tanaka’s earlier report of the dehydrocoupling
synthesis of poly(dibenzosilole).30a Trogler and co-workers recently
reported the 1,1-dehydrocoupling of 1,1-dihydrotetraphenylsilole(1) to an electroluminescent polysilole (2) (Mw ca. 4000-6000 g/mol), having hydrogen end groups, in high yield 80-90% yieldusing 1 mol% of the late transition metal complexes [(Ph3P)3RhCland (Ph3P)4Pd] as catalysts (eq. 4).29b,30b

Ph

Ph

Si

PR
O
Ph

E
Cl

Cl

Ph

Ph

H
n

-H2

[RhCl(cod)2]2 orPt(PMe3)4 (1 mol%)(5)2

The same authors also synthesized poly(tetraphenylgermole)(Mw ca. 5800-6500 g/mol) in > 92% yield by dehydrocoupling of
1,1-dihydrotetraphenylgermole using the same catalysts. The UVvis spectrum of poly(tetraphenylgermole) shows an absorption
at 377 nm, which is assignable to both the σ-σ* transition of the
Ge-Ge backbone chain and π-π* transition of the germole ring.
The polygermole is intensively photoluminescent, emitting green
light at 487 nm.31 The hydrogen end groups of the polysiloles andpolygermoles are then transformed to other useful functionalgroups by various chemical reactions in usual manner. 31

As an alternative to the heterogeneous Wurtz reductive
coupling of dichlorosilole and the homogeneous late-transitionmetal-complex-catalyzed dehydrocouplig of 1, Woo et al. alsosynthesized 2 in high yield by homogeneous dehydrocoupling of
1 under mild conditions, catalyzed with inorganic hydrides suchas Selectrides {MB[CH(CH3)C2H5]3H; M = Li, Na, K}, Red-Al{Na[H2Al(OCH2CH2OCH3)2]}, and Super-Hydride [LiB(C2H5)3H]
as shown in eq. 6.32a,b

Ph

E
MeO

Ph

Si
2

(3)

2. MeOH(M = Li, Na, K)

Ph

H

1

1. M (2 eq.)Ph

(Ph3P)3RhCl or(Ph3)4Pd (1 mol%)

H

H

1

Ph

Ph

Ph

(4)

-H2

Similarly, Woo and co-workers prepared 2 (Mw ca. 55006200 g/mol) in > 95% yield by dehydrocoupling of 1 using[RhCl(COD)2] 2 and Pt(PMe3)4 as catalyst (eq. 5).31

Polysilanes
having low oxidation potentials and a highlying HOMO display interesting optoelectronic properties due
to sigma-conjugation along the silicon backbone chain in thepolymer.10,24 Siloles (silacyclopentadienes), with low reduction
potential and low-lying LUMO’s, have attracted considerable
attention because of their unusual electronic properties.25, 26 They
can be used as electron-transporting materials in devices.27 A
silole does not luminesce in diluted solution but does luminesce
in concentrated solution, implying that polysiloles could exhibit
different luminescent behavior from that of monomeric siloles.25
Polysiloles, which are expected to have hybrid properties ofpolysilanes and siloles by nature in the structure, can be preparedby 1,1- or 2,5-coupling reactions of siloles using various synthetic
coupling methods.28 Electroluminescent poly(silole-co-silane)s have also been synthesized in several laboratories.29 West et
al. reported the synthesis of polysiloles and polygermole (Mwca. 5200-5700 g/mol) that have methoxy end groups in 3037% yield by heterogeneous Wurtz 1,1-dehydrocoupling of
1,1-dichlorotetraphenylsilole with 2.0 equivalents of Li, Na, K
metal in refluxing THF for 3 days (eq. 3).28a
21-23

Ph

Ph

Ph

Ph

O

Homodehydrocoupling
and Codehydrocoupling of
1,1-Dihydrotetraphenylsilole
and 1,1-Dihydrotetraphenylgermole
to Electroluminescent Polymers

Tamao and collaborators had earlier reported the Wurtz
coupling synthesis of polysiloles.28dFpolysilane (ca. 25%) in toluene and chloroform. The twopolysilanes are soluble in THF and pyridine. In comparison, thedehydrocoupling of p-fluorophenylsilane using Cp2TiCl2/Red-Al
gives soluble polysilane only.17c The crystalline polysilane may haveinteractions17b in the polymer molecules either between Si and F or
between the F and the phenyl ring. Molecular Orbial calculations
favors the first of these interactions.

1

OMe
n

-H2
< 50 mol% of hydride
THF, 25 °C, 24 h

(6)2

E = Si, Ge

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39

Ph

Ph

(7)

-H2

1

Red-Al (100 mol%)
THF, 25 °C, 1 h

PhPhFor the dehydrocoupling reaction of 1 to 2, K-Selectride
and Super-Hydride were the most active catalysts examined. 2
also can be prepared in high yield directly from the reaction of
1,1-dichlorotetraphenylsilole instead of 1 in the presence of <1.5 equiv of Red-Al (instead of < 0.5 equiv).32c Unlike in the caseof late-transition-metal-complex-catalyzed dehydrocoupling(generally proceeded by oxidative addition/reductive elimination
processes),30,31 catalysis for the conversion of 1 to 2 by earlytransition metallocenes, Cp2MCl2/Red-Al (M = Ti, Zr, Hf)17
is ineffective in the dehydrocoupling of 1 because 1 is stericallydemanding, considering that steric effect is a dominant factor in
the four-centered transition state in the sigma-bond metathesis
mechanism.12 The Woo group proposed a mechanism involving
the preferential attack of a hydride ion on either the silicon atom
or silole ring of 1 to form an activated anionic intermediate suchas a pentacoordinated sigma-complex or pi-complex (Figure 1).32

O

:Si:

Hydride, but the molecular weight increased in the order: RedAl < K-Selectride < Super-Hydride. Like the polysiloles preparedby West and co-workers,28a these polysiloles have a characteristic
UV absorption around 300 nm, assigned to the σ-σ* transition of
the Si-Si backbone chain. They are photoluminescent, emitting
green light at 520 nm when the excitation is at 330 nm. These
polysiloles are strongly electroluminescent around 520 nm. The
similar dehydrocoupling of 1,1-dihydrotetraphenylgermole withthe hydrides produced polygermole in high yield. Furthermore
the co-dehydrocoupling of 1 and 1,1-dihydrotetraphenylgermole(with varying the mixing mole ratio) with the hydrides producedpoly(silole-co-germole)s in high yield.31

F

Dehydrocoupling of 1 catalyzed by < 50mol% (i.e., M-H/Si-H≤ 0.5) of Red-Al yielded 2 as light yellow powders. Polymers withmolecular weights (Mw) of 4600 and 4100 g/mol were isolated in
86% and 78% yields when 15 mol% and 50 mol% of Red-Al wereused, respectively. Polymer yields and molecular weights when
15 mol% of Red-Al was used were higher compared to polymers
obtained when 50 mol% of Red-Al was used. Products from thereaction of 1 with 15 mol%. 25 mol%, and 50 mol% Red-Al wereseparated by preparative GPC and were characterized by NMR
spectroscopy. Shorter oligomers such as silole dimer or trimer
were not found in products. However, when 100 mol% of Red-Al(i.e., M-H/Si-H = 1) was used, the formation of silole dianion 333
was observed without forming 2 (eq. 7).

PRO

In a similar manner, the dehydrocoupling of 1 using 15 mol%of Selectrides and Super-Hydride at 25 ºC for 24 hours produces
2 in 77-78% isolated yield. The molecular weight (Mw) andpolydispersity index (PDI) of all the polysiloles are in the rangeof 4300-5800 g/mol and 1.1-1.2, respectively. Polymerization yieldand polymer molecular weight increased in the order: L-Selectride< N-Selectride < K-Selectride. This trend appears to be closely
related to the ionic character of the Selectrides. The polymerization
yields were almost equal for Red-Al, K-Selectride, and Super-

Ph

Ph

1

Ph

Ph

Ph

Ph

H

H—

Ph

Si —

H

Ph

—
Si

Ph

H
H
-complex

H

Ph

Ph

H

H

Ph

Ph

Ph

H—

.Si.

Ph

2 H•

Ph

Ph

Si
•

n

•

Figure 1. Possible mechanism for the formation of polysilole 2 from the dehydrocoupling of 1.

40

Ph-complex

Ph

Ph

Si:

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2

Enabling Your Technology

Si-O/Si-Si Dehydrocoupling of Hydrosilane
with Alcohol to Poly(alkoxysilane)s

PhSiH3 + 1.5 EtOH

PhSiH3+
EtOH(M = Ti, Zr,), 50 °C

or Cp2M' )M' = Cp, Ni)
50 °C

(8)

OEt

Cp2MCl2/Red-Al

EtO

OEt + PhSi(OEt)3

Si

Ph

n

www.AZmax.co.jp TEL: 03-5543-1630

PhSi(OEt)350 °C

Cp2TiCl2/Red-Al

PhSiH3 + 3.0 EtOH

(9b)

PhSi(OEt)3

50 °C

Similarly, the combinative Si-Si/Si-O dehydrocoupling
reactions of mixed hydrosilanes with alcohols (two differenthydrosilanes were used in the same mole ratio; 0.5:0.5:1.5 moleratio) at 50 ºC, catalyzed by Cp2MCl2/Red-Al (M = Ti, Zr) andCp2M´ (M´ = Co, Ni), producing co-poly(alkoxysilane)s in onepot in high yield (eq. 10) were reported.37a

PR
O
Numerous studies were reported either on the alcoholysis ofhydrosilanes (i.e., Si-O coupling) or on the dehydropolymerizationof silanes (i.e., Si-Si coupling) under the influence of varioustransition metal complex catalysts.13,34,35a-c,36 Poly(alkoxysilane)s can be used as important precursors for preparing interesting
polysilane-siloxane hybrids by sol-gel methods in the presenceof an acid/base catalyst in the reverse micellar environment.37a
Woo and co-workers first described the combinative Si-Si/Si-O
dehydrocoupling reaction of hydrosilanes with alcohols (1:1.5
mole ratio) at 50 oC, catalyzed by Cp2MCl2/Red-Al (M = Ti, Zr)
and Cp2M´ (M = Co, Ni), producing poly(alkoxysilane)s in onepot in high yield (eq. 8).

(9a)

Cp2HfCl2/Red-AlO

A wide range of catalysts (e.g., acids, bases, and homogeneous/heterogeneous transition metal catalysts) have been used for the
Si-O dehydrocoupling of alcohols with silanes.13a,34,35a The Si-O
dehydrocoupling of bis-hydrosilanes with diols, catalyzed byrhodium complex, yielding polysiloxanes was reported.35b,c The
Si-S dehydrocoupling of hydrosilanes with dithiols to produce
polysilathianes was also reported.35d Si-Si dehydrocouplingof hydrosilanes with late transition metal complex catalysts
produces a mixture of oligomers along with significant amountsof disproportionated by-products.13b Harrod et al. reviewed therecent dehydrocoupling of hydrosilanes with alcohols.11 The
transition metal complexes of group VIII (Ni, Co, Rh, Pd, Ir, Pt,etc.) have been extensively used in the catalytic dehydrocouplingof hydrosilanes with various nucleophilic reagents.36 A recent
survey written by Corey on the catalytic dehydrocoupling ofhydrosilanes in the presence of a range of early and late transition
metal complexes has appeared.13b

The hydrosilanes include p-C6H4SiH3 (X = H, CH3, OCH3, F),
PhCH2SiH3, and (PhSiH2)2. The alcohols include MeOH, EtOH,
i-PrOH, PhOH, and CF3(CF2) 2CH2OH. The weight averagemolecular weights (Mw) of the resulting poly(alkoxysilane)s ranged from 600 to 8000 g/mol. However, Cp2M´ (M´ = Co,Ni) have no catalytic activity toward Si-Si dehydrocoupling ofprimary hydrosilanes in an inert atmosphere (e.g., dry N2 or Ar
gas atmosphere).37b Interestingly, the dehydrocoupling reactions ofphenylsilane with ethanol (1:1.5 mole ratio) using Cp2HfCl2/RedAl, and phenylsilane with ethanol (1:3 mole ratio) using Cp2TiCl2/
Red-Al gave only triethoxyphenylsilane as product (eq. 9a-b).38

F

The activated anionic intermediate could lose both adihydrogen molecule and a hydride ion (this hydride may
participate again in the catalytic cycle) sequentially to form asilylene type of silole. If the activated anionic intermediate accepts
another hydride ion, a silole dianion 3 will be formed by losing two
dihydrogen molecules. The silylene type of silole will then either
self-couple or keep inserting into the Si-H bond of 1, forming
2. For the homodehydrocoupling of 1,1-dihydrogermole topolygermole or co-dehydrocoupling of 1,1-dihydrogermole with
1,1-dihydrosilole to poly(silole-co-germole)s the same mechanism
in Figure 1 should be applied.

0.5 RSiH3+
0.5 R'SiH3
+
EtOH

EtO

Cp2MCl2/Red-Al(M = Ti, Zr,), 50 °C
or Cp2M' )M' = Cp, Ni)
50 °C
OEt

OEt

Si

Si

Ph

x

Ph

(10)

OEt
n-x

+ R'Si(OEt)3 + RSi(OEt)3

In a similar manner, Woo and co-workers performed
the combinative Si-Si/Si-O dehydrocoupling reactions ofhydrosilanes with mixed alcohols (two different alcohols wereused in the same mole ratio; 1:0.75:0.75 mole ratio) at 50 ºC,
catalyzed by Cp2MCl2/Red-Al (M = Ti, Zr) and Cp2M´ (M´ =Co, Ni), producing copoly(alkoxysilane)s in one-pot in highyield.37a The bonding characters [mixing interaction between
σ (silicon) orbital and n (oxygen) orbital] of Si-O bonds inpoly(dialkoxysilylene)s were studied in detail using various
levels of molecular orbital calculations.37c

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41

Ring-Opening/Dehydrocouplingof Hydrosilane and Lactone
Harrod and coworkers first reported the reductive
ring-opening/dehydrocoupling copolymerization of b- andg-butyrolactones (four- and five membered cyclic esters) anda secondary hydrosilane PhMeSiH2 using Cp2TiMe2 catalyst
to give polysiloxane type copolymers, [OSiPhMeO(CH2)4]and [OSiPhMeO(CH2)2(CH)CH3]n, respectively, which haventhe regularly alternating structure of reduced lactone (i.e.,
dialkoxyolefinic unit) and silylene moieties without ester
functional groups in the polymer chain (eq. 11).39
(11)

O
or

Cp2TiCl2 )5 mol%)O+ RSiH3

Cp2MCl2/Red-Al

80 °C, 10 h

O

(12)

O

O

+ PhMeSiH2

O

F

O

In contrast, Woo and coworkers first reported the nonreductive
ring-opening/dehydrocoupling
copolymerizationof e–caprolactone (1, a seven-membered cyclic ester) withvarious primary hydrosilanes (RSiH3: phenylsilane, p-tolylsilane,
benzylsilane, p-methylbenzylsilane, and phenethylsilane) andsecondary hydrosilanes (RR’SiH2: phenylmethylsilane anddiphenylsilane) using Cp2MCl2/Red-Al (M = Ti, Zr, Hf) catalysts
to produce random poly(caprolactone-co-silane)s without
appreciable reduction of ester functional groups in the polymer
chain (eq. 12).40(M = Ti, Zr, Hf)[(C=O)(CH2)5O]x[HSiR]y

Red-Al is used as a catalyst to synthesize the syndiotactic
polyester by the ring-opening polymerization of L-lactide topoly(L-lactide) which is an interesting biocompatible polymer.41
Thus, it is interesting to note that the same reactions yield different
products depending on the type of lactone and catalyst.

PR
O

Ph

O

Si

O

Summary

CH2 CH2 CH2 CH2

Me

n

or

Ph

O

Si

Me

42

O

CH2 CH2 CH2nwww.AZmax.co.jp TEL: 03-5543-1630

Hydrosilanes possessing reactive Si-H bond are used insynthesizing various types of polysilanes by dehydrocouplingunder the influence of various organometallic promoters.42
Catalytic Si-Si/Si-O coupling of hydrosilanes with hydrosilanes,
alcohols, and lactones to silicon-based polymers are describedin this article as selective examples of our recent researchdevelopments. These silicon-containing polymers can be used as
precursors to prepare useful functional materials for fabricating
electronic devices. Extensive further studies, versatile applications
and commercial productions are currently in progress.

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Enabling Your Technology

1. (a) Odian, G. Principles of Polymerization, 3rd ed.; John
Wiley & Sons: New York, 1991. (b) Allcock, H. R.; Lampe, F.
W. Contemporary Polymer Chemistry, 2nd ed.; Prentice-Hall
Inc.: New York, 1990; Chapter 9.
2. (a) Inorganic and Organometallic Polymers II; WisianNeilson, P., H.R. Allcock, H. R., Wynne, K. J., Eds.; ACS
Symposium Series 572; American Chemical Society:
Washington, D.C., 1994. (b) Design, Activation, andTransformation of Organometallics into Common and Exotic
Materials; Laine, R. M., Ed.; NATO ASI Series E, no. 141;
Martinus Nijhof: Amsterdam, 1988. (c) Gates, D. P. Annu.
Rep. Prog. Chem., Sect. A 2003, 99, 453.

16. Dioumaev, V. K.; Harrod, J. F. Organometallics 1994, 13, 1548.
17. (a) Woo, H.-G.; Kim, S.-Y.; Han, M. K.; Cho, E. J.; Jung, I.
N. Organometallics 1995, 14, 2415. (b) Woo, H.-G.; Song,
S.-J. Chem. Lett. 1999, 457. (c) Woo, H.-G.; Kim, B.-H.,
manuscript in preparation. (d) Resel, R.; Leising, G.; Lunzer,
F.; Marschner, C. Polymer 1998, 39, 5257. (e) Woo, H.-G.;
Kim, B.-H., manuscript in preparation.
18. Li, H.; Gauvin, F.; Harrod, J. F. Organometallics 1993, 12, 575.
19. Dioumaev, V. K.; Harrod, J. F. Organometallics 1996, 15, 3859.
20. Campbell, W. H.; Hilty, T. K.; Yurga, L. Organometallics 1989,
8, 2615.
21. (a) Aitken, C.; Harrod, J. F.; Gill, U. S. Can. J. Chem. 1987,
65, 1804. (b) Harrod, J. F.; Yun, S. S. Organometallics 1987,
6, 1381. (c) Aitken, C.; Barry, J.-P; Gauvin, F.; Harrod, J. F.;
Malek, A.; Rousseau, D. Organometallics 1989, 8, 1732. (d)Harrod, J. F.; Ziegler, T.; Tschinke, V. Organometallics 1990,
9, 897. (e) Woo, H.-G.; Harrod, J. F.; Henique, J.; Samuel, E.
Organometallics 1993, 12, 2883. (f) Britten, J.; Mu, Y.; Harrod,
J. F.; Polowin, J.; Baird, M. C.; Samuel, E. Organometallics
1993, 12, 2672.

O

3. (a) Ciardelli, F.; Tsuchida, E.; Wohrle, D. MacromoleculeMetal Complexes; Springer-Verlag: Berlin, 1996. (b)Pittman, Jr., C. U.; Carraher, Jr., C. E.; Zeldin, M.; Sheats,
J.; Culbertson, B. M. Metal-Containing Polymeric Materials;
Plenum Press: New York, 1996.

15. Choi, N.; Onozawa, S.-Y.; Sakakura, T.; Tanaka, M.
Organometallics 1997, 16, 2765.

F

References

4. (a) Silicon in Polymer Synthesis; Kricheldorf, E. R., Ed.;
Springer-Verlag: Berlin, 1996. (b) Silicon-containing
Polymers; Jones, R. G., Ed.; The Royal Society of Chemistry:
Cambridge, 1995.
5. (a) Regitz, M.; Binger, P. Angew. Chem. Int. Ed. 1988, 27,1484. (b) West, R. Angew. Chem. Int. Ed. 1987, 26, 1201.

PRO

6. Sakamoto, K; Yoshida, M.; Sakurai, H. Macromolecules 1990,
23, 4494.

22. (a) Woo, H.-G.; Tilley, T. D. J. Am. Chem. Soc. 1989, 111, 3757.
(b) H.-G. Woo, H.-G.; Tilley, T. D. J. Am. Chem. Soc. 1989, 111,
8043. (c) Woo, H.-G.; Walzer, J. F.; Tilley, T. D. Macromolecules
1991, 24, 6863. (d) Woo, H.-G.; Heyn, R. H.; Tilley, T. D.
J. Am. Chem. Soc. 1992, 114, 5698. (e) Woo, H.-G.; Walzer, J.
F.; Tilley, T. D. J. Am. Chem. Soc. 1992, 114, 7047. (f) Banovetz,
J. P.; Suzuki, H.; Waymouth, R. M. Organometallics 1993, 12,4700. (g) Imori, T.; Woo, H.-G.; Walzer, J. F.; Tilley, T. D.
Chem. Mater. 1993, 5, 1487. (h) Corey, J. Y.; Huhmann, J. L.;
Zhu, X.-H. Organometallics 1993, 12, 1121.

7. (a) Walsh, R. Acc. Chem. Res. 1981, 14, 246. (b) Dewar,
M. J. S. Organometallics 1986, 5, 375. (c) Jackson, R. A. J.
Organomet. Chem. 1979, 166, 17.
8. West, R. J. Organomet. Chem. 1986, 300, 327.

9. Silicon-Based Polymer Science; Ziegler, J. M., Fearon, F. W. G.,
Eds.; Advances in Chemistry Series 224; American Chemical
Society: Washington, D.C., 1990.

10. (a) Miller, R. D.; Michl, J. Chem. Rev. 1989, 89, 1359 andreferences cited therein. (b) Matyjaszewski, K.; Chen, Y. L.; Kim,
H. K. in Inorganic and Organometallic Polymers; Zeldin, M.,
Wynne, K. J., Allcock, H. R., Eds.; ACS Symposium Series 360;
American Chemical Society: Washington D. C., 1988; p 78.
11. Gauvin, F.; Harrod, J. F.; Woo, H.-G. Adv. Organomet. Chem.
1998, 42, 363 and references cited therein.
12. (a) Tilley, T. D. Acc. Chem. Res. 1993, 26, 22 and references
cited therein. (b) Tilley, T. D. Comments Inorg. Chem. 1990,
10, 37.

13. (a) Corey, J. Y. Adv. Silicon Chem. 1991, 1, 327 and references
cited therein. (b) Corey, J. Y. Adv. Organomet. Chem. 2004,
51, 1 and references cited therein.
14. Banovetz, J. P.; Stein, R. M.; Waymouth, R. M.
Organometallics 1991, 10, 3430.

www.AZmax.co.jp TEL: 03-5543-1630

23. (a) Woo, H.-G.; Kim, S.-Y.; Kim, W.-G.; Cho, E. J.; Yeon, S.
H.; Jung, I. N. Bull. Korean Chem. Soc. 1995, 16, 1109. (b)Woo, H.-G.; Song, S.-J.; Han, M.-K.; Cho, E. J.; Jung, I. N.
Bull. Korean Chem. Soc. 1995, 16, 1242. (c) Woo, H.-G.; Song,
S.-J. Bull. Korean Chem. Soc. 1996, 17, 494. (d) Woo, H.-G.;
Song, S.-J. Bull. Korean Chem. Soc. 1996, 17, 1040. (e) Woo,
H.-G.; Kim, B.-H.; Song, S.-J.; Han, M.-K.; Kim, S.-Y.; Kim,
J.-H.; Lee, J. S. Bull. Korean Chem. Soc. 2000, 21, 935.
24. West, R. in Comprehensive Organometallic Chemistry II;
Davis, A. G., Ed.; Pergamon Press: Oxford, 1995; pp 77-110.
25. Luo, J.; Xie, Z.; Lam, J. W. Y.; Cheng, L.; Chen, H.; Qiu, C.;
Kwok, H. S.; Zhan, X.; Liu, Y.; Zhu, D.; Tang, B. Z. J. Chem.
Soc., Chem. Commun. 2001, 1740.
26. (a) Sohn, H.; Woo, H.-G.; Powell, D. R. J. Chem. Soc., Chem.
Commun. 2000, 697. (b) Woo, H.-G.; Kim, B.-H.; Sohn, H.
Chem. Lett. 2000, 544.
27. Tamao, K.; Uchida, M.; Izumizawa, T.; Furukawa, K.;
Yamaguchi, S. J. Am. Chem. Soc. 1996, 118, 11974.

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4328. (a) Sohn, H.; Huddleston, R. R.; Powell, D. R.; West, R. J. Am.
Chem. Soc. 1999, 121, 2935. (b) Tamao, K.; Yamaguchi, S.
Pure Appl. Chem. 1996, 68, 139. (c) Yamaguchi, S.; Tamao,
K. J. Chem. Soc., Dalton Trans. 1998, 3693. (d) Yamaguchi,
S.; Jin, R.-Z.; Tamao, K. J. Am. Chem. Soc. 1999, 121, 2937.
(e) Kanno, K.; Ichinohe, M.; Kabuto, C.; Kira, M. Chem. Lett.
1998, 99.

39. Shu, R.; Harrod, J. F.; Lebuis, A. M. Can. J. Chem. 2002,
80, 489.

29. (a) Sanji, T.; Sakai, T.; Kabuto, C.; Sakurai, H. J. Am. Chem.
Soc. 1998, 120, 4552. (b) Sohn, H.; Sailor, M. J.; Magde, D.;
Trogler, W. C. J. Am. Chem. Soc. 2003, 125, 3821. (c) Woo,
H.-G.; Kim, B.-H.; Song, S.-J., manuscript in preparation.

42. H. G. Woo is indebted to the Korea Research Foundation(Grant Number KRF-2006-C00095) for its generous supportof his research reported herein.

31. Kim, B.-H.; Cho, M.-S.; Kong, J.-I.; Woo,H.-G.., manuscript
in preparation.

O

32. Kim, B.-H.; Woo, H.-G. Organometallics 2002, 21, 2796. (b)Woo, H.-G.; Song, S.-J.; Kim, B.-H.; Yun, S. S. Mol. Cryst. Liq.
Cryst. 2000, 349. 87. (c) Kim, B.-H.; Cho, M.-S.; Kong, J.-I.;
Woo, H.-G.; Lee, S.-W.; Lee, C.-J. Mol. Cryst. Liq. Cryst. 2004,
425, 243.

41. Li, H.; Wang, C.; Bai, F.; Yue, J.; Woo, H.-G. Organometallics
2004, 23, 1411.

F

30. (a) Chauhan, B. P. S.; Shimizu, T.; Tanaka, M. Chem. Lett.
1997, 785. (b) Trogler, W. C.; Sohn, H.; Liu, S.; Toal, S.
Abstracts of Papers (225th ACS National Meeting, New
Orleans, March 23-27, 2003), INOR-746.

40. Kim, B.-H.; Woo, H.-G.; Kim, W.; Li, H. J. Chem. Tech. &Biotech. 2006, 81, 746.

PRO

33. (a) Hong, J.-H.; Boudjouk, P. J. Am. Chem. Soc. 1993,
115, 5883. (b) Hong, J.-H.; Boudjouk, P.; Castellino, S.
Organometallics 1994, 13, 3387. (c) West, R.; Sohn, H.;
Bankwitz, U.; Calabrese, J.; Apeloig, Y.; Mueller, T. J. Am.
Chem. Soc. 1995, 117, 11608.

34. (a) Lukevics, E.; Dzintara, M. J. Organomet. Chem. 1985,
295, 265. (b) Pitt, C. G. Homoatomic Rings, Chains, andMacromolecules of Main-Group Elements; Rheingold, A. L.,
Ed.; Elsevier Scientific Publishing Company: Amsterdam,
1977; p 203.

35. (a) Bedard, T. C.; Corey, J. Y. J. Organomet. Chem. 1992,
428, 315. (b) Li, Y.; Kawakami, Y. Macromolecules 1999, 32,
6871. (c) Zhang, R.; Mark, J. E.; Pinhas, A. R. Macromolecules
2000, 33, 3508. (d) Baruah, J. B.; Osakada, K.; Yamamoto, T.
Organometallics 1996, 15, 456.

36. (a) Sommer, L. H.; Lyons, J. E. J. Organomet. Chem. 1967, 89,
1521. (b) Corriu, R. J. P.; Moreau, J. J. J. Chem. Soc., Chem.
Commun. 1973, 38. (c) Ojima, I.; Kogure, T.; Nihonyanagi,M.; Kono, H.; Inaba, S.; Nagai, Y. Chem. Lett. 1973, 501.
37. (a) Kim, B.-H.; Park, S.-H.; Kim, M.-S.; Woo, H.-G.,
manuscript in preparation. (b) Kim, B.-H.; Woo, H.-G.,
manuscript in preparation. (c) Koe, J. R.; Motonaga, M.;
Fujiki, M.; West, R. Macromolecules 2001, 34, 706.
38. Kim, B.-H.; Cho, M.-S.; Kim, M.-A.; Woo, H.-G. J.
Organomet. Chem. 2003, 685, 93.

44

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Enabling Your Technology

Silicon-Based Anion Relay Chemistry
By Gerald L Larson

Introduction

Scheme 2: Type II Anion Relay Chemistry
+

Nu

O

SiR 3

O

O

+

R

SiR 3

R 3 SiO
R

E

ASG

ASG

R 3SiO

E

ASG

n

n

ASG

F

Nu

Anion Relay Chemistry of Type I

Tietze et al were the first to report the use of lithiated2-trimethylsilyl-1,3-dithiane with epoxides in conjunction witha 1,4-rearrangement of the TMS group from carbon to oxygen
resulting in the α-lithiodithiane, which then reacted with a second
equivalent of the epoxide to lead to homo-coupled β,β’-dihydroxyketones. Activation for the trimethylsilyl group migration was
brought about via the addition of 12-crown-6 as a promoter (Eq. 1).3
1. n-BuLi, THF

S

HO-30 to 0°, 4 h

S

2.

TMS

O

R

(2.2 eq)

S

OH

S

(1)

R

R

THF, 12-c-4-20° then hydrolysis

In that same year, Schaumann and coworkers employed asimilar approach to generate functionalized cyclopentanols asshown in Eqs. 2 and 3.4
OH

ASG

The Type II ARC process features a silicon-containing
electrophile capable of reacting with a nucleophile to generate an
oxyanion and thereby establish the foundation for carbon to oxygen
silicon migration. This process permits introduction of various
nucleophiles and in turn, migration of the organosilyl group fromcarbon to oxygen to generate a carbanion capable of trapping anelectrophile. Clearly, the ability to incorporate a nucleophile, alinchpin, and an electrophile presents the synthetic chemist with arange of options, which are illustrated in Scheme 2. Combinations of
the Type I ARC and Type II ARC approaches can provide methods
for the integration of a wide variety of functionalities with a very
high degree of regio- and stereoselectivity. Thus, these synthons canbe employed in the exploitation of three-component (nucleophile,linchpin, and electrophile) Diversity-Oriented Synthesis (DOS).
The purpose of this mini-review is to present a number of examples
that illustrate the potential utility of the ARC protocols.5

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E

R (% yield) Ph (65); 4-ClC 6H 4 (41); 4-MeC 6H 4 (54); 4-MeOC 6H 4 (63); Me (89)

R

R

R 3SiO

E

Nu

PR
O
ASG

SiR 3

ASG

n
Nu

R 3SiO

Scheme 1: Type I Anion Relay Chemistry
O

SiR 3

ASG

n

O

The Brook rearrangement, in which a suitably positioned
silyl group can be induced to migrate in an intramolecular fashion
to an oxyanion with concomitant generation of a carbanion,
can be used for the synthesis of small molecules in a numberof ways.1,2 Whereas the original Brook rearrangement, initiallyemploying α-hydroxyorganosilanes, involved a 1,2-shift togenerate an α-silyloxycarbanion, this highly-useful concept has
been expanded over the years to include more distant silyl shifts.
In particular, the Smith group at the University of Pennsylvania,
based on some early work of Tietze3 and Schaumann,4 has taken
this concept to an impressive level in what they have termed
Anion Relay Chemistry (ARC). The applications of ARC havebeen carried out via two general classes, namely Type I ARC andType II ARC. In Type I ARC, an α-silyl carbanion is treated witha suitable electrophilic substrate such as an epoxide or aldehyde
to generate a trialkylsilyl-containing oxyanion, which undersuitable conditions relocates the silyl group to the oxygen withthe generation of a carbanion at the original nucleophilic site
in the process. This path, wherein an electrophile is introducedin the first step and a second electrophile is introduced in thesecond step, is illustrated schematically in Scheme 1.

M eS

SM e

Li

SiR 3

+

O

1. -78 to -50°
OTs

2. H 2O, Et2 O, NH 4 Cl

Li

S

M eS
TMS 8-0%

R 3Si = TM S; TBS

S

(2)

M eS

TBS 46%

OH

+

O

TMS

1. -78 to -50°
OTs

2. H 2 O, Et2 O, NH 4 Cl

(3)

S
S

65%

A Type I approach to benzannulated cyclooctanols, again
using a dithiane Anion Stabilizing Group (ASG), was subsequently
reported. In this case the α-silylated lithium reagent 2 is reactedwith epoxide 1 and the rearranged carbanion cyclized via
intramolecular substitution at the benzyl chloride (Eq. 4).6

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45

+

Me 3Si

SMe

Li

SMe

O

1

2
MeS

SMe

1. THF, -78 to -50°
2. TBAF•3H 2O, THF, rt

OH
46%

R1

Br
R 1CHO, -78°

SiR 3

S

SiR 3

S

3

4

R 3Si = TM S; TES; TBS
Ph

Ph

OH

OH

TMS

S

OH

TES

S

92%

90%

97%

OH

t-BuLi

S

R 3Si

S

2. HCl, EtOH

Li

S

OSiR 3

2. n-BuLi

OH

R 3Si

S

OH

R 3Si

S

2. n-BuLi

5S

(5)

S

(5)

S

S

Ph

S

H

R 3Si

O

2. KOt-Bu

S

84%

R

Br

S

SiR 3

2. RCHO, Et2O

SiR 3

S
R
OSiR 3

3. electrophile
THF, DMPU

(10)

E

S

7 examples: 50 - 80%
Phwww.AZmax.co.jp TEL: 03-5543-1630

OTBS

OTM S

OTES

Ph

OH

A three-component Type I approach to 2,3-disubstituted
thiophenes has been reported. This useful sequence starts with
2-trialkylsilyl-3-bromothiophene 3, prepared in high yield in asingle step from 3-bromothiophene. Thus, metal-halogen exchangeof 3 generates not the more common α-silyl carbanion, but rather
a β-silyl carbanion. The reaction of this lithium reagent with an
46

OLi

1. t-BuLi

Bu

66%

56%

(7)

S

3. allyl bromide

OH

OH

OSiR 3

S

S

S

Bu

OH

OTBS

OTES

(6)

S

H

1. n-BuLi

Ph

67%

S

Bu

R 3Si

6
12 examples: 36 - 90%

OTMS

R 3Si (% yield) TMS (82); TES (60); TBS (78)

KHMDS

E

OH

OH

; TBS (94)

(9)

Bu

S

Bu

R 3Si

OSiR 3S

R 3Si (% yield) TMS (82); TES (60); TBS (78)

1. SO 3, py

S

S

R1

electrophile

Li

R 3Si

R 3Si (% yield) TM S (92); TES (91); TBS (94)

BS

4

R1

S

DMPU, -30°

SiR 3

S

1. SO 3, py

OTBS

TBS

S

R1

PR
O
S

1. Cl

(8)
OH

t-BuLi, Et 2OO

It has been demonstrated in Type I ARC that a [1,5]-Brook
rearrangement is possible. Crossover experiments by the Smithgroup confirmed the intramolecular nature of the rearrangement,
which presumably occurs via a 6-membered silicate transition
state.6 The ASG in this study was the dithiane group, and the best
conditions for the Brook rearrangement employed potassium
hexamethyldisilazide (KHMDS) in THF, which provided theO-silylated rearranged product in better than 95% yield, irrespectiveof the steric bulk of the trialkylsilyl group; however, the rates forthe more hindered silanes were slower. Alternatively, the initiallithium alkoxide formed from the reaction of n-butyllithium withan aldehyde can be treated with potassium tert-butoxide to initiate
the rearrangement. The resultant carbanion can then be trappedwith a suitable electrophile (Eqs. 5-7).7 A similar study aimed at a[1,6]-Brook rearrangement proved to be intermolecular in natureand led to a predominance of protiodesilylation in addition to thedesired silyl ether intermediate.

aldehyde led to the thienylmethyl alcohol derivative 4. The lithium
salt of 4 did not result in the migration of the silyl group to give
5 even when activated with the addition of TMEDA, 12-crown-4
or HMPA. Fortunately, the use of NaHMDS or KHMDS or t-BuLi
in the presence of DMPU gave a nearly quantitative conversion of
the C-silyl to the O-silyl intermediate, electrophilic substitution ofwhich produced the 2,3-disubstituted thiophene 6. Overall yieldsof this three-component DOS sequence were modest to good (Eqs.
8-10). The sequence can also be carried out in a one-pot protocol
with comparable yields.8

F

(4)
Cl

S
65%

S

S

OH

OH
74%

50%

Anion Relay Chemistry of Type II
It has been shown that the nitrile group is a suitable ASG for
Type II ARC protocols as shown in Eq. 11.9

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SiM e 3

O

Ph

S

1.

(2 eq)

S

2. HMPAOH
S

3. allyl bromide

Ph

S

Enabling Your Technology

4. HCl68%; d.r. >98:2

1. n-Bu 2CuLi, Et2O

TMS

O

Li

-78 to -40°
2. allyl bromide, THF

CN

SiM e 3O

-78 to 0°
TMSO

Ph

S

1.

(14)
(2 eq)

S

2. HMPAOH
S

3. allyl bromide

CN

Ph

S

4. HCl

64%; d.r. >98:2

(11)
Li

58%

The silylated epoxy dithiane 7 serves as an excellent Type II
reagent as a lead into β-hydroxydiketone derivatives. (Eq. 12).10 In
this instance a dithiane nucleophile is initially introduced and anelectrophile is added after the rearrangement.
1. n-BuLi

TBS
S

S S

7

S

OTBS SO

SiM e 3SPh

THF, Et2O (1:3)-30°, 20 min
O
Cl

69%

H

Ph

O

8

Ph

SiMe 3O

H

SiMe 3

SiM e 3

O

Ph

SPh

SPh

17

18

In general, it was found that the α-phenylsilyl derivatives 8 – 14
showed excellent diastereotopic ratios (Eqs. 13 and 14), whereas the
α-silylthiophenyl systems 15 - 18 gave ratios ranging from 1:4 to 1:1(Eqs. 15 and 16). The high selectivity is attributed to a minimizationof the A1,3 strain that is available to the α-phenyllithium reagent, but
not the α-thiophenyllithium intermediate.11
LiO

SiM e 3
Ph

1.

S

(13)
(2 eq)

S

2. HMPA

S

S

(16)

OH

2. HMPAS

3. allyl bromide

PhS

55%; d.r. 1:1

OH

2. CuI, HMPA/THF (1:1)

H
SiMe 3(17)

3. Electrophile

E

4. TBAF, THF

Ph

(55);

SnBu 3

(65);

(69);

S

SPh

•

(64)

(58);

(71);

Ph

2. CuI, HMPA/THF (1:1)
H

3. BrCH 2CO 2Et

SiMe 3

4. TBAF, THF

O

(18)
O

20

19

Li

(56)

1. n-BuLi

O

68%; d.r. >98:2

1.
S
SiM e 3www.AZmax.co.jp
2. HMPAPh
3. allyl bromide

1.

(2 eq)

Thus, reaction of 19 with n-butyllithium followed by theaddition of CuI and HMPA to bring about the silyl groupmigration and then an electrophile to give the cross-couplingchemistry followed by deprotection of the silyl ether gives riseto the corresponding o-substituted benzyl alcohol. An sp2-sp2
cross-coupling of the intermediate organocopper reagent with thepromotional assistance of Pd(PPh3)4 permits the regioselective
introduction of the vinyl group in 56% yield. The choice of solvent
system and a full equivalent of copper(I) iodide proved crucial in
the success of the reaction. Trapping with ethyl α-bromoacetate
results in the benzolactone 20 (Eq. 18).

4. HClOS

1. n-BuLi

E (% yield)

OH

3. allyl bromideS58% ; d.r. 1:1

15

SiM e 3

O

O

19

SPh

14

SPh

16

Ph

11

SiMe 3O

13O

SiMe 3

O

Ph

Ph

12

SiMe 3SiMe 3

10

Ph

O

O

9

SiMe 3O

SiM e 3HPh

SOne of the intriguing and highly useful discoveries in ARC has
been that an sp2 carbanion can be generated in the Brook process.
This has been shown in the thiophene linchpin chemistry illustrated
in Eqs. 9 and 10, as well as in Eq. 12 above. In a similar manner,o-trimethylsilylbenzaldehyde 19 can be used as a bifunctional
linchpin (aldehyde and aryl ring, in this case), for Type II ARC.
With this substrate, the aldehyde is converted into an oxyanion to
set up the silyl migration, thereby rendering the ortho-position of
the aryl group the site for subsequent reactivity (Eq. 17).12

PR
O

With the ultimate goal of utilizing a three-component,
Type II ARC tactic for the construction of non-racemic, biologically active natural products, the chiral, non-racemic linchpins
8 – 18 were prepared and studied as to their diastereoselectivity
in ARC transformations.
SiM e 33. allyl bromide

4. HCl

HMPA

O

OH
S

O

3.

S

2. HM PA
4. HClO

S(15)(2 eq)

Li

S S

O

SPh

1.

F

2.

(12)

SiM e 3OS

(14)
(2 eq)

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S

S

Ph

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47

Scheme 3This three-component linchpin coupling sequence allows
for the introduction of various nucleophiles as well as theelectrophile shown above. Thus, when trapped with allyl bromide
as the electrophile a number of carbon nucleophiles resulted in thegeneration of different o-allylated benzyl alcohol derivatives (Eq. 19).
Use of the metalated dithiane provides the mask α-hydroxyketone
moiety (Eq. 20). An iterative approach using this concept illustrates
the potential for variations on this theme as exemplified in Eq. 21.
1. RLiO

SiMe 3(19)
S S

4. TBAF, THF

S S
OH

S S

3. allyl bromide
4. TBAF, THF(10 mol% )CH 2 Cl2 , 55°

O

19

OTBS S S

S S

2. CuI, HMPA/THF (1:1)

O

F
O

(78%)

K

SiMe 3

Grubb's cat.

OTBS S S

S S

1.

4-pentenoic acid
DCC, DMAP, CH 2Cl 2

R

3. allyl bromide

R (% yield) M e (68); allyl (66); vinyl (68); Ph (60)H

OTBS S S

S S

HO

19

O

TMSO

OH

2. CuI, HMPA/THF (1:1)
H

1. K 2CO 3, MeOH

OTBS S S

S S

(20)

O

NCS, AgNO 3,O

MeOH, H 2O (4:1), 0°(78% )
1. n-BuLi, KOt-Bu, THF
S S

OTBS O

O

PR
O

2.

O

TBS

S S

O

2% HCl, EtOH
22 syn 13% overall yield from (-)-21
23 anti 12% overall yield from (-)-21(-)-21

3. 19, THF

H

O

O

OH

O

O

O

4. CuI (1.2 eq), HMPA, THF (1:1)

O

OH

O
O

O

5. allyl bromide, THF

S S

OTBS S S

(21)

TMSO

63% ; syn:anti 1.25:1

As a further extension of this chemistry, chemoselective
deprotection of the TMS ether, esterification with 4-pentenoic
acid, ring-closing metathesis,13 conversion of the dithianes tocarbonyls14 and deprotection of the TBS ether provided the highlysubstituted macrocycles 22 and 23 in 6 steps from (-)-21 in 13%
and 12% overall yields, respectively. To illustrate the generality ofthis high-yielding sequence all 12 stereoisomers 22 and 23 of the
10-membered macrocycles resulting from the use of 4-pentenoic
acid and 2-methyl-4-pentenoic acid as well as the 12 stereoisomersof the saturated macrocycle 24 were prepared (Scheme 3).

24

Based on the assumption that the lithium salt of the o-silylated
benzyl alcohol 25 is in equilibrium with the corresponding cyclic
silicate 26 (Eq. 22), oxasilacycles 27, 28, and 29 (Eqs. 23, 24 and25) were prepared to investigate whether these compounds could
provide access to the same reaction coordinate.
LiO

Si

Li

R

R1

OH

O

Si

R

R1

26

25

Br

SiMe 2O

1. HCl (cat), DHP, rt
2. n-BuLi, Me 2ClSiH, -78°

n-Bu

(22)

(23)

n-Bu

3. TsOH, M eOH, rt
27 62%n-BuO

1. n-BuLi, -78°

OH+

2. (HMe 2 Si) 2NH
3. KOt-Bu, rt

SiMe 2(24)n-Bu
28 71%

48

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H

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n-BuLi, -78°
2. M e 2ClSiH, Et 3N, 0° to rt

n-Bu

O

SiMe 2(25)

O

1. n-BuLi, -78°

O
H

n-Bu

2. (HMe 2 Si) 2NH+

SiMe 2(24)

n-Bu

3. KOt-Bu, rtEnabling Your Technology
28 71%O
n-BuLi, -78°
HO

2. M e 2ClSiH, Et 3N, 0° to rt

O

(25)

SiMe 2

2. CuI, HMPA

n-Bu

OH

OH

(26)

n-Bu

3. RX

OTBS

(28)

R

TBSO

n-Bu

TBSO

I

syn:anti ca. 1:1

In addition to trapping aliphatic and carbonyl electrophiles,
substrates 26 and 27 can be employed in the Type II ARC protocol
with cross-coupling of the intermediate aryl or vinyl copper
species when catalyzed by (Ph3P)4Pd (Eqs. 29 and 30).15
SiMe 2

1. MeLi, THF

2. CuI, HMPA

n-Bu

3. PhI, (Ph 3P) 4Pd (5 mol% )

OH

(29)

n-Bu

4. HCl

27

Ph

69%

(30)

O

SiMe 2

2. CuI, HM PA

n-Bu

3. PhI, (Ph 3 P) 4Pd (5 mol% )28

OH

1. M eLi, THF

Ph

n-Bu

4. HCl64%

Taking advantage of the ability to use ARC for the generationof aryl species as the ASG, the Smith group was able to use 1-oxa2-silacyclopentenes 27 and 28 in combination with addition ofa nucleophile to the silyl group, to bring about the migration of
the silyl group and, ultimately, cross-coupling the resulting aryl
anion with suitable aryl and vinyl electrophilic partners. The
cross-coupling steps were only carried out with aryl and vinyl
iodides and were catalyzed by the addition of either PdCl2/Ph3P or(Ph3P)4Pd (Eqs. 31, 32, and 33).

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45%

The overall yields are modest, but nevertheless highly
useful when DOS is considered. The same outcome can bereached starting with the o-trimethylsilylbenzyl alcohol 30
confirming that the identical products can be synthesizedfrom distinctly different starting materials, strongly
suggesting the involvement of the same reactive intermediates(cf., 25, 26) in each reaction.16

PR
O

Type II Anion Relay Chemistrywith Cross-Coupling Bond Formation

(33)

nBu

(Ph 3P) 4Pd

RX (% yield) allyl bromide (79%); benzyl bromide (64% ); benzophenone (62%)

O

CuL

nBu

2. CuI, HMPA

OH

4. HCl29

1. t-BuLi, THF

O

n-Bu

TMSO

27

1. MeLi
2. CuI, HMPA

(32)
69%

SiM e 2nBu

n-Bu

4. HClSiMe 2

4. HClO(27)

R

RX (% yield) allyl bromide (67%); benzyl bromide (61% ); methyl iodide (59%); PhI (64% )

O

nBu

F

OH

1. M eLi
3. RX

28

Ar

ArI (% yield) 4-MeOC 6H 4I (50); 4-NCC 6H 4I (60); 4-O 2NC 6 H 4I (64)

2. CuI, HMPA

n-Bu

OH

1. M eLi, THF
2. CuI, HM PA

30

4. HClSiMe 269%

3. ArI, (Ph 3P) 4Pd (3 mol% )RX (% yield) allyl bromide (68%); benzyl bromide (74% ); methyl iodide (78%); PhI (65% )O

SiMe 3

nBu

R

3. RX
27

(31)

ArI (% yield) 4-M eOC 6H 4I (55); 4-NCC 6H 4I (69); 4-O 2NC 6 H 4I (57)

Indeed, it was observed that these key synthons permit
preparation of o-alkyl benzyl alcohols (Eqs. 26, 27 and 28).15
1. M eLi

nBu

4. HCl27

syn:anti 4:1

SiMe 2Ar

3. ArI, (Ph 3P) 4Pd (3 mol%)
29 65%O

OH

1. M eLi
2. CuI, HM PA

nBu

n-Bu

3. (PPh 3) 3RhCl, THF, 66°

SiMe 2

In addition to the incorporation of the o-benzyl alcohol
unit into the synthetic scheme, the intermediate 27 representsa system similar to that used by Hiyama in the intermolecularcross-coupling of aryl and vinyl moieties.17 In this sequence thenucleophilic aryl or vinyl partner comes from the organolithium
reagent and, therefore, accomplishes the cross-coupling of anorganolithium reagent with an aryl or vinyl halide. Thus, reactionof 27 with a suitable nucleophile such as phenyllithium followed by
the cross-coupling protocol gives the intermolecular cross-coupled
product. When a polar solvent such as DMSO was employed, silyl
migration occurred and the principle cross-coupling product wasthat with the benzyl alcohol partner (Scheme 4).

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(34)

SiMe 2O

1. NuLi, THF

nBu

2. THF, -78° to rt, 1 h27

viacannula

PdCl 2 (3 mol%)
dpca (4 mol% )CuI (10 mol% )(215) 547-1015

THF

preparedEX

rt, 30 min

catalyst

then rt, 2 h

Nu-E

EX = aryl or vinyl iodide

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49

Scheme 4
Ph

O

Ph

MeO

Ph

NC
96%

CO 2M e
75%

32

N

N

N
85%

95%

C 5H 11M eO

SiM e 3

N

35

M eO

Tr

81% from ArLi

67%

82% from ViLi

79% from ArLi

82% from ViLi

77% from ViLi

67% from ViLi

OTBS
HO

Ph
72%

TBSO

ODM B
78%

Applications of ARC to theSynthesis of Natural ProductsO

MeO
81% from ViLi

36

The three-component ARC reaction of 2-triethylsilyldithiane,(R)-propylene oxide, and 37 served to provide an earlyintermediate in the synthesis of cryptocarya triacetate (7 steps;
23% overall yield), cryptocaryolone (8 steps; 18% overall yield),and cryptocaryolone diacetate (9 steps; 18% overall yield). This
compares with earlier syntheses of these natural products in 13,
14, and 15 steps, respectively.19

MeO

MeO

84% from ArLi

O

AcO

AcO

The combination of the ARC and cross-coupling
was extended to include vinyl systems utilizing theβ-trimethylsilylcrotonaldehyde 31 as a synthon for the exploratory
work. As with the aryl cross-coupling reactions shown in Eq. 35,
the addition of a catalytic amount of (Ph3P)4Pd was employed tobring about the sp2-sp2 cross-coupling step. This chemistry was
extended to include the 3-trimethylsilylbut-3-enal 32, and therelated chiral synthons 33 and 34. A further extension of thisARC/cross-coupling chemistry was employed using the chiralepoxides 34 and 35 where the epoxide group is the oxyanion
source for the subsequent Brook rearrangement.18

O

Cryptocarya diacetate

HO

3. RX, rt, 2 h
31

Cryptocarya triacetate
O
AcO

HO

-78°, 1 h

S S

37
86%

-40°, 1 h
HM PA, -50°, 15 minO

3.

-78°, to rt 16 h

Asymmetric allylation of β-triethylsilylpropynal 38 with
Leighton’s reagent20 provided the γ-silyl alcohol in 74% yieldand 77% ee. This served as a linchpin for the construction of thelower portion of an early intermediate in a formal synthesis of(-)-cochleamycin A (Scheme 5).21
O
H

H
O
H
H

R

H

OAc

HO

Bu

(-)-Cochleamycin A

4. 1N HCl, rt, 10 min

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OMOM OTES

OM OM
2.

R (% yield) allyl (65); Bn (66); PhS (68); Bu 3 Sn (63)

50

O

AcO

(36)

O

2. CuI, HMPA:THF (1:1), rt, 30 minO

1. n-BuLi, HMPA, Et 2O

1. n-BuLi, Et2 O, -78°, 30 min
OH

AcO

Cryptocaryolone diacetate(35)
SiMe 3

AcO

O

S

TES

AcO

O

Cryptocaryolone

S

O

O

O

HO

PR
O

However, when the lower-polarity THF was employed the
product was that of the intermolecular cross-coupling reaction.
The success of this chemistry was highly dependent on the modeof addition, which involved pre-formation of the catalyst systemand careful addition of a mixture of 27 and the aryllithium reagent
at low temperature.16 Most importantly, these results confirm
that the adduct of the “transfer reagent” 27 and organolithium
in the intermolecular cross-coupling is analogous to the Negishi
organozinc, Kumada organomagnesium, Suzuki organoboron,
or Stille organotin reagents, but without, in some cases (Suzuki,
Stille, and Hiyama), the need to synthesize and isolate the coupling
partner prior to cross-coupling. Moreover, the silicon transfer
agent 27 can be recovered and reused.

O

SiMe 3O

C 5H 11

Ph

N

34

33

O
Ph

Ph

SiMe 3

F

NC

O

76%

92% from Br
O

SiMe 3Ph

MeO 2C92%

O

SiM e 3

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Enabling Your Technology

Scheme 5
Ph

O

S S

O

+
TES

Si
N
Me

H
37

Cl

OH

1. t-BuLi, HMPA, THF

-10°

OTBS

4A M S, -78°, 10 min

OH

S S

toluene

S

TES

S

O

S

O
40

76%

-30°, 60 min
OH

n-BuLi, HMPATES

The reaction of epoxide 41 with 2-tert-butyldimethylsilyldithiane
followed by a 1,4-Brook rearrangement and further iteration via
reaction with epoxide 42 provided an efficient entry to the southernhalf of the natural product (+)-rimocidin.25

OTES

S S
Li

EtO
Br

EtO

EtO

OTES

S S

EtO

TBAF

EtO

S S

OTES

EtO

OH

Scheme 6H

SiCO, PhH, 60°

OHii. MeLi, Et2O, -78 to -20°

O

OH

O

TBS

OH

(+)-Rimocidin
PMP

O

O

S

OTES

O
OBn
41

S

3. THF-HMPA, -78° to rt, 5 h

TBS

PR
O
TBSO

CuBr•M e 2S, DMPU, 23°

TBSO

OH

O

42

n-Pr

OH

S S

4. TBDPSO

OTES

MeI, -78 to 23°

OH

1. t-BuLi, Et 2O, -78 then -45°, 1 h

38n-BuLi, THF, -78°

NH 2
CO 2 H

OH

O

n-Pr

2. TESCl, Et 3N, CH 2Cl2, -20°

n-Pr

O

2.

1. i. [Rh(acetone)2 -(POPh) 3) 2BF 4
t-Bu

OH

O

The Leighton group exploited the Brook rearrangement toaccomplish the formation of a trisubstituted olefin in their 2006
synthesis of dolabelide B (Scheme 6). Allylic alcohol 38, formed
via a Rh-catalyzed tandem silylformylation-crotylsilylationand chemoselective TES protection, was treated with n-BuLi
followed by introduction of CuBr·Me2S and DMPU to initiate
silicon migration.22,23 The resulting vinyl copper intermediate wasquenched with MeI to complete the E-olefin in 92% yield.

Me
OH

O

O

F

S S

(38)
S

2.

TBS

PMP
TBSO

HO

S S

S STBSOOOOBn

TBDPSO

OAc

O

O

OAc

HO

OH

OH

Dolabelide B

The diepoxy linchpins 39 and 40 were used in the tandem
linchpin cyclization to carbafuranose sugars with modest
stereoselectivity being observed.24
OH

1. t-BuLi, HMPA, THF

S

O

S

O

O
Li
-78 to -35°

-78°, 30 min

OLi

TMS

THF, -78 to 0°, 10 min

HO

OH

OTBS
(37)

+
S
19%

OAc
3 steps

OTBS
S

Br

2. 0.5 M H 2 SO 4

OBn

OBn

1.

61%

-30°, 90 min
OH

(40)
43

KO-t-Bu, THF

S

OBn
39

TMS

H

OTBS
+

2.

TBS

ARC also served extremely well in the synthesis of a cytotoxic
gorgonian sesquiterpene 44 through the simple linchpin 43;
3-methylpentadienyllithium was employed as the nucleophilewith methallyl bromide as the electrophile in this short threecomponent ARC approach.8

OBn

4A MS, -78°, 10 min

S

(39)
65%

n-Pr

S

S

44

8%

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51

Equally significant, the dithiane multicomponent linchpin
strategy (Type I ARC) was successfully employed in theconstruction of the AB and CD spiroketals of (+)-spongistatin 1.26
Thus, intermediate 45 was converted to the spiro A and B structure
and intermediate 46 to the spiro C and D portion.

1.

t-BuLi, Et 2O, -78 to -45°, 1 h

S

2.
S

OH

TBS

O
O
O

HO

OH

O

H

A similar approach was employed in a short and efficientsynthesis of (-)-indolizine 223AB. In this synthesis, tertbutyldimethylsilyldithiane is the Type I linchpin with epoxide 48
and aziridine 49 as the first and second electrophiles, respectively.
The three-step single pot reaction sequence provided the desiredintermediate 50 in 56% yield (Eq. 44). The thusly formedintermediate, 50, was converted to (-)-indolizidine 223AB in 4 steps
with an overall yield of the longest (10-step) sequence of 10%.28

O

H

O

AcO

OAc
OH

Spongistatin 1
1. t-BuLi, Et2O, -78 to -45°, 1 h

HO

2. NapOSRO

Et2 O, -78 to -25°, 2 h

S
TES

3.

R = TES

45

OPMB

58%

N

OH OH

S S

NapO

LiO

O

RO

O

OTES

Indolizidine 223AB

OPM B

Et2 O-HMPA, -45 to -25°, 16 h

1. t-BuLi, Et2O, -78 to -45, 1 h

(41)

HO 2C

PR
O

H

A

O

B

48
-78 to -25, 5 hOS

1. t-BuLi, Et2O, -78 to -45°, 1 hOS

Et 2O, -78 to -25°, 1 h

S

TES

RO

3.

RO

OTBS
NHTs
TBSO

3.

50 56%NTs
49
HMPA, Et2O, -78 to 0

TBS

OH

S S

S

S

S

OTBS

OTES

2. BnO

(44)

2. O

H

O

AcO

OTBS

O

Alkaloid 205B

OMe

O

H

O

47

O

O

THF-DM E, -78 to 0°

H

H

O

OH

OTBS
NHTs

Et2 O, -78 to -20°, 2 h

S

F

H

O

S

O

3.

H

OBPS

O

OH

HO

(43)

OBPS

BnO

OTBS

O

R = TBS46

63-69%(42)

THF-HMPA, -78° to rt

BnO

H

D

TBSO

O
O

OMe

C

O

H

(-)-Indolizidine 223AB

A three-component, Type II ARC route to the southern
portion of the spirastrellolides also proved to be highly successful.
In this event the linchpin was the epoxy silyldithiane 51 and theelectrophile the chiral epoxide 52. The result of this three-stepsingle pot sequence was 53 formed in 77% yield, demonstrating
once again the versatility of the ARC approach.29

A Type I dithiane three-component linchpin coupling
approach has also been used in the synthesis of the neotropicalpoison-frog alkaloid (-)-205B. Starting from the simple TBSsubstituted dithiane in a two-step, single-pot reaction intermediate
47 was prepared in 53% yield. This was carried on to the alkaloidin an overall yield of 5.6% over 19 steps.27

OH

HO

O
F

O

OM e

E
O

O

O

A O

HO

HO

H

H

O
HO

N

N

H

H

B

OH

O
C

H

Spirastrellolide A

H

Alkaloid (-)-205B
52

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Cl

O

H
H

D

www.gelest.com

OMe

Enabling Your Technology

SS

2.

R

(45)

1. n-BuLi, KOt-Bu
THF, 78, 0.5 h
O

TBS
51

O

S S

56

Scheme 7

THF, -78, 2 h

O

O

BnO

3.

OMe

R

O

R

52
THF, -78 to 0

O

Nu

TMS

TMS

+ Nu
OTf

OTBS S S

S S

57 R = HOOBnO58 R = M e

OM e

53 77%

R

OH

OH

OH

OH

OH

16

28

HO

O

HO

R = H (+)-micoticin A
R = Me (+)-micoticin B

S

S

3. O

TBS

TBSO

O

OH

R

O

(46)

The key organosilyl substrates employed in this study were2-trimethylsilyl-3-triflatobenzaldehyde 57 and 2-trimethylsilyl-3triflatoacetophenone 58. The concept is illustrated in Scheme 6,
wherein the benzylic alkoxide can be generated via nucleophilic
attack. Addition to the proximal silyl group with accompanying lossof the triflate anion leads to formation of the benzyne intermediate.
Initial studies with intermolecular reactions employing 56 or 57
as the linchpin revealed excellent conversion to and trapping of
the benzyne intermediate with ketene diethylketal (Eq. 47), benzyl
azide (Eq. 48), and 2,5-dimethylfuran (Eq. 49).
H

O

OH

EtO
TMS

1.

EtO
(47)
MeLi, THF

OTf

O

-78°, 10 min

57

OTBS

BnO

TMS

O

OTf

(1.0 eq.)

OH S SR— TfO

HM PA, THF-78° to rt, 3 h

S S

TMS

Nu

PR
O

1. t-BuLi, Et2O
-78 to — 45°
2. O
OBn (2.3 eq.)
Et2O, -78 to -25° 1 h

O

Nu

O

A five-component synthesis of the C(16-28) fragment of
mycoticins A and B was accomplished in 59% yield. The thusly
generated key intermediate 54 was converted to the substructure
55 via conversion of the dithiane groups to the carbonyl, selective
reduction and formation of the acetonides.30
OH

F

OH

OTf

78%

2. HCl, rt, 1 h

OBn

54

H

O

H

TMS

O

O

O

O

HO

O

2. Benzyl azide, THF, -78°, 2 min
3. HCl, rt, 10 min

OTfO

1. MeLi, Et2 O, -78°, 10 min

As a potential route to the preparation of the interestingand important macrocycles represented by example 56, theSmith group embarked on DOS study of a Type II linchpin that
could accept a nucleophile and rearrange with the formation of abenzyne intermediate, which could then lead to the macrocyclic
portion of the molecule (Scheme 7).31

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O

N

Ph
N

+

N

N
N

Ph
67%; 3.3:1

55

ARC Leading to An Organofunctional
Benzyne Intermediate

H

N

57

OTBS

O

O

1.

O

(48)

OH

TM S
OTf

58

O

MeLi, THF
-78°, 10 min
2. HCl, rt, 1 h

(49)

78%

Intramolecular trapping of the benzyne intermediates also
proved possible as shown in Eqs. 50, 51 and 52. With relation to
the ARC method, it should be noted that the use of the fluoridepromoted benzyne formation using o-(trimethylsilyl)phenyltriflate
as a precursor is well established.32

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53

N3

5. For a review on applications towards total syntheses consult: Smith,A. B., III; Wuest, W. M. Chem. Commun. 2008, 5883.

HO
1. KHMDS, THF

TM S

N

-78° to rt, 2 h

OTf

(50)

N

2. HCl, rt, 10 min
76%

8. Devarie-Baez, N. O.; Shuhler, B. J.; Wang, H.; Xian, M. Org. Lett.
2007, 9, 4655.

O
HO

O

1. KHM DS, THF

9. Smith, A. B., III; Kim, D.-S.; Xian, M. Org. Lett. 2007, 9, 3307.

-78° to rt, 2 h

TM S

(51)

O

2. TBAF, THF, rt, 20 min
3. PCC, CH 2Cl2, rt, 1 h

OTf

10. Smith, A. B., III; Xian, M. J. Am. Chem. Soc. 2006, 128, 66.
11. Smith, A. B., III; Tong, R. Org. Lett. 2010, 12, 1260.

82%

12. Smith, A. B., III; Kim, W.-S.; Wuest, W. M. Angew. Chem. Int. Ed.
2008, 47, 7082.

OHO

1. KHMDS, THF
TMS-78° to rt, 2 h

13. Grubbs, R. H. Tetrahedron, 2004, 60, 7117.

(52)

2. TBAF, THF, rt, 20 min
OTf

3. MnO 2, EtOH, rt, 12 h

14. Corey, E. J.; Erickson, B. W. J. Org. Chem. 1971, 36, 3553.

58%

TMS

OTM S

SO 2 Ph

THF

+

Ph

16. Smith, A. B., III; Hoye, A. T.; Martinez-Solorio, D.; Kim,
W.-S.; Tong, R. J. Am. Chem. Soc. 2012, 134, 4533.

(53)

75%

17. Nakao, Y.; Takeda, M.; Matsumoto, T.; Hiyama, T. Angew. Chem. Int.
Ed. 2010, 49, 4447 and references therein.
18. Smith, A. B., III; Kim, W.-S.; Tong, R. Org. Lett. 2010, 12, 588.
19. Wang, X.; Wang, W.; Zheng, H.; Su, Y.; Jiang, T.; He, Y.; She, X. Org.
Lett. 2009, 11, 3136.
20. Kinnaird, J. W. A.; Ng, P. Y.; Kubota, K.; Wang, X.; Leighton,
J. L. J. Am. Chem. Soc. 2002, 124, 7920.

PR
O

Ph

Li

15. Smith, A. B., III; Tong, R.; Kim, W.-S.; Maio, W. A. Angew. Chem. Int.
Ed. 2011, 50, 8904.

O

Similar approaches, in which silyl migration leads to an anion
with a β-leaving group and subsequent generation of a multiple bond,have been used for the generation of olefins from loss of a leavinggroup in α-substituted acylsilanes (Eq. 53)33 and the phenylsulfonylgroup from 59 (Eq. 54).34 Another related example involves the
opening of epoxide 60 (Eq. 55) and subsequent reactivity.35
O

6. Genrich, F.; Schaumann, E. Tetrahedron Lett. 2009, 50, 6187.
7. Smith, A. B., III; Xian, M.; Kim, W.-S.; Kim, D.-S. J. Am. Chem. Soc.
2006, 128, 12368.

N

F

HO

Ph

SO 2Ph

TM S

Ph

Ph

1. n-BuLi, THF-78°, 20 min

LiO

59

21. Mukherjee, S.; Lee, D. Org. Lett. 2009, 11, 2916.

SO 2 PhTMS

2. PhCHO, -78° to 0

(54)

TMSO

Ph

Ph

85% ; E:Z 60:40

22. Zacuto, M. J.; O’Malley, S. J.; Leighton, J. L. J. Am. Chem. Soc. 2002,
124, 7890.
23. Zacuto, M. J.; O’Malley, S. J.; Leighton, J. L. Tetrahedron 2003, 59, 8889.

(55)

O

TBS

OTBS

O

LDA, THF

CNTBS

24. Leung, L. M. H.; Gibson, V.; Linclau, B. J. Org. Chem. 2008, 73, 9197.

OTBS

25. Smith, A. B., III; Foley, M. A.; Dong, S.; Orbin, A. J. Org. Chem.
2009, 74, 5987.

CN

60

TBSO

26. Smith, A. B., III; Doughty, V. A.; Lin, Q.; Zhuang, L.; McBriar, M. D.;
Boldi, A. M.; Moser, W. H.; Murase, N.; Nakayama, K.; Sobukawa,
M. Angew. Chem. Int. Ed. 2001, 40, 191.

OTBS

27. 27.

CNSmith, A. B. III; Kim, D.-S. Org. Lett. 2005, 7, 3247.

28. Smith A. B., III; Kim, D.-S. J. Org. Chem. 2006, 71, 2547.

RX, -80°, 5 min

29. Smith, A. B., III; Kim, D.-S. Org. Lett. 2007, 9, 3311.

TBSO

OTBS
R
CN

30. Smith, A. B., III; Pitram, S. M. Org. Lett. 1999, 1, 2001.
31. Smith, A. B., III; Kim, W.-S. Proc. Nat. Acad. Sci. 2011, 108, 6787.

References

32. Reich, H. J.; Holtan, R. C.; Bolm, C. J. Am. Chem. Soc. 1990, 112, 5609.

1. Brook, A. G. Silicon Compounds: Silanes and Silicones, Arkles, B. andLarson, G. Eds. Gelest, Inc. Morrisville, PA 2008, 58.

2. Brook, A. G. Acc. Chem. Res. 1974, 7, 77.
3. Tietze, L. F.; Geissler, H.; Gewert, J. A.; Jakobi, U. Synlett 1994, 511.
4. Fischer, M.-R.; Kirschning, A.; Michel, T.; Schaumann, E. Angew.
Chem. Int. Ed. 1994, 33, 217.

54

www.AZmax.co.jp TEL: 03-5543-1630

33. Menichetti, S.; Stirling, C.J. M. J. Chem. Soc., Perkin Trans. 1 2002, 28.
34. Takeda, K.; Kawanishi, E.; Sasaki, M.; Takahashi, Y.; Yamaguchi, K.
Org. Lett. 2002, 4, 1511.
35. Snowden, T. S., Handbook of Reagents for Organic Synthesis: Reagentsfor Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed. John Wileyand Sons, 2011, 697.

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Enabling Your Technology

Bioactive Organosilanes

Scott McN. Sieburth
Department of Chemistry, Temple University, 1901 N. 13th Street, Philadelphia, PA 19122
scott.sieburth@temple.edu

Si

Log P = 4.7

Log P = 4.0

Fbiologically unstable structures:
Si

Si H

hydrosilanesSisilylenessilacyclopropanes

Figure 1. Comparisons of Si and C structures.

O

Organosilanes, which are entirely man made, are best known
as inert, biologically compatible substances. Of course, like theircarbon analogs, biologically active organosilanes can be devised anddiscovered. The close analogy between carbon and silicon properties
has intrigued chemists for decades. Highly successful fungicidal
and insecticidal crop protectants with a central silicon atom areestablished commercial products (see Figure 2), but organosilanes
remain a largely untapped resource as pharmaceuticals. The vastarray of organosilane intermediates currently available, coupledwith increasingly powerful synthetic methods for organosilane
construction, has led to a renaissance in bioactive organosilane
research. This brief review will describe some of the historicalhighlights of the search for bioactivity in organosilanes andcontemporary advances. Additional information can be found in
earlier reviews, which began to appear as early as 1967.1-9

Use of silicon in bioactive molecules has been most successful
in the agricultural chemical industry, where regulatory issues
are perhaps less arduous than the pharmaceutical arena. Twoorganosilanes are successful commercial products, the fungicide
flusilazole 1 and the insecticide silafluofen 2.18,19 The performanceof these products under field conditions underscores theenvironmental and metabolic stability of organosilanes. In bothcases, closely related carbon-based structures are known.20,21

PRO

Silicon and its organic derivatives have no intrinsic
toxicity,10,11 and as the element structurally and chemically mostsimilar to carbon it is not surprising that the pursuit of siliconbased pharmaceuticals has a substantial history. Organosiliconchemistry is, in many ways, easier than all-carbon chemistry,
particularly when considering sterically congested systems.

Not all silicon structures can be directly translated into
carbon compounds, and vise versa (see Figure 7), especially when
considering application in an aqueous, oxygen-rich environment.
For example, Si–H bonds are rapidly oxidized in vivo.13 Double
bonds to silicon are extremely unstable under almost allconditions,14,15 and silicon in a three-membered ring can bereactive with water and air.16,17

Substitution of a molecule’s carbon atom by silicon is themost subtle alteration possible. Organosilanes, in comparison
with the corresponding carbon compounds, are slightly larger: theSi–C bond is 20% longer than a C–C bond and a trimethylsilylgroup has a volume that is about 20% larger than a tert-butylgroup.12 Organosilanes are generally more lipophilic than thecorresponding carbon structure, although this may not be true
for the rather polar silanols. The octanol–water partition has beenmeasured for several analogous structures such as trimethylsilyl
and tert-butyl benzenes (Figure 1, see also Figure 6).7

F

F

Si

N

1

F

N
N

Si
O

O

2

Figure 2. Commercial crop protection chemicals, fungicide
flusilazole 118 and insecticide silafluofen 2.19

Clinical Trials of Organosilanes
Clinical trials have been conducted with organosilanes for anumber of diseases, some of which are shown in Figure 3. Additional
examples can be found in Figures 5 and 13. Organosilane derivativesof the topoisomerase inhibitor campothecin, in which a trialkylsilylgroup provides a lipophilic anchor at C-7, have proven to be effective
anticancer agents.22,23 Karenitecin 3 has undergone successful Phase
II clinical trials as a treatment for metastatic melanoma.24

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Si

Bioactive Organosilanes
Without Carbon Analogy

N

N

3

N
H
Si

O

N

OH O

4

N Si
O
N

A number of interesting organosilanes with biological activity
have been discovered that do not have analogous carbon structures,
Figure 4. The cis-1,3-diphenyl cyclotetrasiloxane 7, cisobitan, wasdiscovered to have estrogenic activity, subsequently determined tobe consistent with its metabolism to 8.32 Diphenylsilanediol 9 was
found to have anticonvulsant activity and was tested in pre-clinical
trials as a potential treatment for epilepsy.33

CO2H

O

Si

N
N
N HO Si
N
N

O

N

F

5

Si

Si
O

X

N

6

HO OH
Si

X

O
Si

Si O

7 X=H
8 X = OH

The phthalocyanine 4 (Pc 4), incorporating a siloxane withboth tetra- and hexavalent silicon atoms, is a singlet oxygen
generator when exposed to visible light and oxygen. With apropensity to target cancer cells, Pc 4 has proven to be very
effective in clinical trials. The cellular site(s) of interaction of 4
have been suggested.25,26

O

Cl

10

OO
Si

OO

N

O

HO

Si

11

O

N

O

O

N

Silperisone 6 is a centrally acting muscle relaxant that actson the sodium channel. A better separation of voluntary andinvoluntary muscle control was found for 6 relative to its nonsilicon based analogs.31

Approaches to Organosilane
Drug Discovery

There are two fundamentally different approaches to
identifying bioactive organosilanes, design and random screening.
Design of a molecule requires knowledge of the chemical details ofa biological process, or a bioactive chemical structure as a starting
point. This approach has a prominent intellectual component at
the beginning of the discovery process. Conservative modificationof a known bioactive structure, such as substitution of a quaternarycarbon with silicon, has a high probability for success. In contrast,
random screening of organosilanes in a biological screen of interest
generally has a low probability for success and relies entirely on
chance for a discovery of significance. Random screening can,however, lead to a quantum leap in structural novelty that isbeyond the analogy design process.

56

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Si

N

NH
O

O

OO

12

Figure 4. Bioactive organosilanes without carbon analogy.

PRO

Bis-trimethylsilylbenzamide 5 (TAC-101) is an anticancer
treatment that is selective for the retinoic acid-alpha receptor. Phase
I/II studies have shown good efficacy.27 More recent studies havefound 5 to have angiogenesis effects,28 and potential application asa treatment for autoimmune disease29 as well as dementia.30

9in vivoO

Figure 3. Organosilanes that have undergone clinical trials.

O Si

F

7

The silatranes with their pentavalent silicon (10–12), easily
prepared from trichlorosilanes and triethanolamine, have been
extensively studied.34 The chloromethyl derivative 10 has amultitude of attributes, especially healing, promotion of hair
growth, and antitumor effects.35 Successful wound healingstudies in man have been reported. In contrast, phenylsilatrane
11 has affinity for the picrotoninin receptor and is therefore
quite toxic, with potential use as a rodenticide. Recently, thesilatrane-substituted thymidine 12 was discovered to haveanticancer properties against a number of cell lines. The optimalstereochemistry for the three methyl substituents of the tricyclic
silatrane group has not been established.36

Early Examples of the Silicon-for-Carbon
Substitution Strategy

The recognition that a trimethylsilyl group could substitutefor a tert-butyl group was tested more than 40 years ago with
insecticide 14.37 Carbamates 1338 and 14 are both excellent
inhibitors of acetylcholine esterase, a traditional insecticide /nerve agent target. As insecticides, 13 and 14 are very similar.37
More recently triflluoromethyl ketone 15,39 a reversible inhibitorof acetylcholine esterase, was the starting point for development of
the trimethylsilyl analogue 16 (zifrosilone).40 Ketone 10 advanced
to clinical trials as a potential treatment for Alzheimer’s disease.41

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Enabling Your Technology
H
N

13

Si

O

14

O

O

Si

O

Si

CF3

which two carbons of the retinoid agonist Bexarotene 22 have been
exchanged for silicon to give 21. A rather significant conformationalchange for the nonaromatic ring accompanies this substitution,
but the two are nearly identical in their pharmacology.45

H
N

O

CF3

15

16

An early and notable design failure was the use of a silane
as a less persistent analog of DDT 17. Replacement of the centralcarbon of 17 with silicon to give 18 resulted in a substance without
insecticidal activity. The lack of toxicity with 18 was subsequently
understood to be a result of the larger overall size of the molecule.42

Cl

Cl

Cl

Cl

Cl

H
Si

Cl

17

Cl

18

Figure 6. DDT analog 18 was inactive.

Figure 8. Double silicon switch in silicon analog 21of the retinoid antagonist bexarotene 22.45

Organosilane Analogs—Silicon
Substitution for Methylene Group Carbon

Replacement of a carbon bearing hydrogens with siliconrequires additional substitution because the Si–H bond is readilyoxidized.13 This type of alteration can be used to block sites ofmetabolism, however the substantial steric bulk change is potentiallyproblematic. This substitution was explored in the context of the
estradiol skeleton, Figure 9, where silicon at C-6 in 23 was expected
to prevent metabolic oxidation at this position, and enhance theduration of activity. Unfortunately, this substitution was found toeliminate the hormonal activity of estradiol 24.46,47
OH

PR
O

A study of barbiturate analogs with trimethylsilylmethyl
and tert-amyl groups found that in mice the silane 19 had a faster
onset and longer duration of action than carbon equivalent 20.
Evaluation of these structures included measurement of their
partitioning between chloroform and pH 7.4 phosphate buffer,and silane 19 was found to be significantly more lipophilic than
the tert-amyl 20.43
O

Si

HN

O

N
H

O

19

N
H

O

20

Partition Coefficient(chloroform / pH 7.4 phosphate buffer)
6.42
2.84

Figure 7. Barbiturate analogs.

Organosilane Analogs—The Silicon Switch
Approach with Quaternary Carbons

The recognition that substitution of a quaternary carbon witha silicon atom will yield a product that is subtly different, yet an
entirely new intellectual property entity,44 has led to a substantial
exploration of this concept. In addition to the examples in Figures
2, 3 and 5, Figure 8 illustrates a recently reported structure in

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OH

H

H
Si

HO

H

23

H
H

HO

H

24

Figure 9. Substitution of C-6 of estradiol 24
by a dimethylsilyl group.

Naturally occurring polyamines such as spermine 25 areassociated with anticancer properties, attributed to both intrinsic
antioxidative effects and their ability to chelate reactive oxygenproducing metals. These properties are enhanced when spermine
25 is altered to include a dimethylsilyl group 26. The enhanced
lipophilicity of the silane also increases the association of thepolyamine with phospholipid monolayers.48-50

O

HN

O

22

O

Cl

H

CO2H

21

Figure 5. Trimethylsilyl and tert-butyl group interchange
creates novel insecticides and pharmaceuticals. Zifrosilone 16
entered clinical trials as a treatment for Alzheimer’s disease.

Cl

CO2H

Si

F

O

Gelest, Inc.

H
N

H2N

25
H2N

N
H

spermine
H
N

Si

26

NH2

N
H

NH2

Figure 10. Insertion of a dimethylsilyl group into apolyamine leads to anticancer agent 26 with in vitro activity.

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57

Replacement of a methylene group by a dimethylsilyl groupin the amino acid proline 28, yielding 27, has led to a range ofapplications. This substitution does not significantly change theconformation of the five-membered ring, nor does it lead toaltered polypeptide conformations. The silicon substitution does
endow derivatives with enhanced lipophilicity, measured for
Fmoc derivatives 29 and 30, and a resistance to degradation.51 A
substance P analog incorporating sila-proline 27 was potent andhad enhanced resistance to proteases.52 Incorporation of 27 inproline-rich cell-penetrating peptides did not change secondary
structure, and enhanced cellular uptake.53
CO2H

27

Sip

Si

28

29

Log P =1.3

30

Log P =0.094

H
N

Si

O

H3N

O

N
H

O

O

H
N

N
H

O

O

H3N

O

N
H

O

O

Si

33
Ki = 0.42 mM

O

N
H

OH
H
N

O

34
Ki = 7.9 mMOX

35 a X = Sib X=HFigure 12. Trimethylsilyl alanine in modified peptides.

PR
O

Organosilane Analogs—Silicon Replacementof Methine and Aryl Group Carbon

Replacement of a hydrogen on alanine with a trimethylsilylgroup yields a non-natural amino acid that has been proposed as areplacement for both phenylalanine and for leucine. As inhibitorsof the aspartic protease renin, trimethylsilyl alanine derivative
31a was nearly as effective as the phenylalanine 31b.54 Dipeptide
inhibitors of thermolysin 32–34 have been described. Replacementof leucines individually gave, for 33, a slightly better inhibitor andfor 34 an order of magnitude poorer inhibition.55
Replacing a tyrosine with trimethylsilyl alanine in the
structure of Cetrorelix to give 35a, or with a tert-Leu to give 35b,
led to equivalent antagonism of gonadotropin-releasing hormone
in rats for both structures. The effect of silane 35a was substantiallylonger lasting, however, than the carbon analog 35b.56

A recently developed bioactive organosilane is 36 where
the o-toluyldimethylsilane moiety replaced the dithienyl groupof 37. Silane 36 was the first orally active inhibitor of squalene
epoxidase57 and effectively lowered cholesterol biosynthesis inrats. Gem-dimethyl carbon analog 38, also an effective inhibitorof squalene epoxidase,58 appears to have been designed by analogy
with the silane.

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O

D-Cit—Leu—Arg—Pro—D-Ala—NH2

N

Figure 11. Silaproline (Sip) 27. Substitution in polypeptides
leads to higher lipophilicity with retention of biological activity.

58

O

N
H

O

Ph

Cl

CO2H

N
Fmoc

H3N

O

H
N

31 a X = SiMe3 KD = 2.1
b X = PhKD = 1.2

32
Ki = 0.61 mM

CO2H

Pro

CO2H

N
Fmoc

N
H

O

N
H

F

N
H

X

OH

H
N

O

Si

O

H
Boc N

Si

OR

S

S

36

OR

S

37
OR = O

O

OR

38
N

Figure 13. Silane 36 is an orally active
inhibitor of cholesterol biosynthesis.59

Organosilane Analogs—The Silicon Switch
with Tertiary Ethers and Alcohols
Alcohols and ethers can be starting points for introduction ofsilicon in bioactive substances. The Si–O bond, while very strong,is also somewhat labile. This is particularly clear in optically active
silanols, which racemize in the presence of water. In addition,silanols are slightly more acidic, and better hydrogen bonding,than carbinols. Trialkyl(or aryl)silanols and silyl ethers have beenfound to have a very interesting level of biological activities (seealso Figure 4).

The interesting siloxane 39 has been tested as a skeletal muscle
relaxant in several mammals, including man.6 Doses up to 100
mg of 39 were well tolerated in healthy males.60 Similar biologicalGelest, Inc.

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Enabling Your Technology

Si
N

MeO

O
Si

O

N

39

40

Figure 14. Skeletal muscle relaxant 39.6
Similar evaluation of the carbon analog has not been reported.

Silicon can substitute for an unstable carbon atom as well.68
Hydrolysis of amides and esters proceed through a tetrahedral
intermediate such as 47, and inhibition of these hydrolytic enzymes
is an important area of drug design. Silanediols can mimic thehydrated carbonyl of 47. Three silanediol enzyme inhibitors
have been prepared, with enzyme inhibition of 2.7–40 nM; in allcases nearly as effective as the corresponding carbinol, ketone
or phosphinic acid. Symmetric 50 inhibits the HIV protease, anaspartic protease.69 Silanediols 51 and 52 inhibit the metalloproteases
angiotensin-converting enzyme (ACE) and thermolysin,
respectively.70-72 Inhibition of ACE is an important approach tocontrolling hypertension. A crystal structure of 52 bound at theactive site of thermolysin found it to bind in a conformation nearly
identical to a corresponding phosphinamide inhibitor.73
O

H
N

P'

N
H

H
N

O

An altered profile is also seen for silanol 44, in comparison
to its carbinol analog haloperidol. These dopamine receptor
antagonists interact with the human dopamine receptors. In
comparison with the carbinol, the silanol is nearly 5-fold more
selective for the D2 receptor.65 The consequences of this selectivity
are not yet known.

PR
O
Si

N

Cl

O

41

O

OMe

OH
Si

43

HO
Si

O

N

N

O

42

H
N

OH

N

Cl

OH

O

P

HO OH
Si

H
N

50

O
HO

H2N

48

49

H
N
O

H
N
O

51

O

O

HO OH
Si

N
O

CO2H

H
N
O

HO OH
Si

52

H
N
O

O
OH

Figure 16. Silanediols as mimics of the unstable hydrated
carbonyl group 47, and its use as protease inhibitors.

F-Amino SilanesN

45

Figure 15. Silanols prepared in silicon switch strategy studies.

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P'
+

OMe

N

44

OH

O

47

O

F

HO
Si

Si

O

46

H
N

Perhaps no silicon switch has been more successful thanp-fluoro-sila-difenidol 45. Silanol 45 is more active as a muscarinic
antagonist than the carbon analog by factors of 32-81, dependingon the receptor subtype.66,67 Silanol 45 is a commercially available
pharmacological tool.
OH

P

P'
H HO OH
H
N
N
N
H
O
O
P

protease+H2OO

A number of silanols have been prepared as analogs ofknown bioactive carbinols, Figure 15. Carbinol 41 has potent
hypolipidemic activity in mice, with similar activity to the carbon
analog. The silanol, however, is less toxic than the carbinol in
repeated dosings.62 The silane analog 42 of the experimental
antipsychotic panamesine was found to be a 3-fold better ligand
for the sigma-1 receptor.63 Silanol 43, an analog of the serotonin/
noradrenalin reuptake inhibitor venlafaxine, has a pharmacological
profile that differs from its carbon analog. The (R) isomer (shown)
inhibits noradrenaline reuptake 10-fold more potently than it
inhibits serotonin and dopamine reuptake transporters.64

Organosilane Analogs—Silicon Substitution
for Unstable Carbon

F

activities have not been reported for the carbon analog 40, which
has been evaluated for hypolipidemic activity.61

Positioning a primary amine adjacent to a trialkylsilane yields
a compound with special properties.74 The simplest example,
aminomethyltrimethylsilane 53 is an inactivator of monoamineoxidase enzymes MAO-A and MAO-B, proceeding through anelectron transfer mechanism.75,76 In contrast, the carbon analog 54
is a substrate for the enzymes. Disabling MAO-A is a potential
treatment for depression whereas MAO-B inactivation can play arole in the treatment of Parkinson’s disease.77,78

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59

The four homologous aminomethylsilanes 53 and 55–58 were
tested as inhibitors of the semicarbazide-sensitive amine oxidase,finding 58 > 53 ~ 57 >> 56.79 It was subsequently reported that
33c was a selective inhibitor of MAO-B.80 Inhibition of diamineoxidase by diamines related to 53 have also been evaluated.81 All
a-aminosilane MAO inactivators are characterized as electronrich silyl substituted methylamines.
H2N

53
H2N

H2N

54

Si

H2N

Si

56

Si

55

F

H2N

Si

57

OH
N
N

76

N

rat

H

rabbit

OH

64

68

rat

Si

63

+

65

Si H

66

H +
OR

67

H
CO2H

Si OH

fast

69

Figure 18. Comparative metabolism of organosilanes.13

As a model for the partially oxidized silanes in silicones,
hexamethyldisiloxane 70 is metabolized in rats to give hydrolysis
product 73 and the corresponding hydroxymethyl products 71, 72
and 74. In addition, loss of methyl to give dimethylsilanediol 75
was observed.82
OH

Si
O
Si

70

rat

Si
O
Si

71

OH

+
N

N
N

Si
O
Si

72

78

39

Si

HO

+

HO

MeO

N

81

O
Si

+

O
glucuronide

N

N
N

OH

79

N

O
Si

80

OH
Si

H
N

82

Overall, the metabolic fate of organosilanes appears to follow
rather standard pathways so long as strained or silicon hydrides
are avoided.

Future Prospects
The last two decades have seen the successful launch andmarketing of organosilane pesticides. It seems likely that thenext several years will see approval of the first organosiliconpharamaceutical. Novel organosilane structures with biologicalactivity continue to be identified and this will likely result in newclinical evaluations. Hopefully additional insight into metabolism
and reaction pathways will emerge.

+
OH

OH
Si

+

OH
Si

+

HO OH
Si

OH

73

74

75

Figure 19. Metabolic fate of hexamethyldisiloxane.82
60

OH

+

OH

Si

OH

+

Si

rats, man

O
Si

O

+ HO

OH

62

61

OH

Figure 21. Metabolism of skeletal muscle relaxant 39 gave
oxidation of the aromatic ring and cleavage of the N–C bond.60,84

OH

Si

Si

77

N

N

MeO

PR
O

rabbitSi

N

Si

In general, the metabolic pathways for organosilanes follows
pathways expected for the corresponding carbons structures. In arough comparison of 59 and 61, Fessenden found similar metabolic
rates, and standard oxidation products, Figure 18. In contrast,
Si–H bond-containing structure 68 was found by Fessenden to beoxidized and excreted much more rapidly in vivo than 64.13
60

OH

rat

Si

F

The fate of skeletal muscle relaxant 39 has been studied inboth rats and man. Notably, dealkylation of the methyl ether andthe nitrogen and oxidation of the aromatic ring gave the major
metabolites. Hydroxylation of the silicon methyl groups was notreported.60,84

Figure 17. Inactivators of monoamine oxidases.

59

F

Figure 20. Oxidation of carbon surrounding
the silicon in fungicide simeconazole 76.83

58

Metabolism of Organosilanes

F

F

Si

F

N

F
H2N

A study of the triazole fungicide simeconazole 76 found thatoxidation of the carbons surrounding the silicon was the majoroxidation path. These paths included cleavage of the Si–C bonds.83

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Enabling Your Technology

1. Englebienne, P., Hoonacker, A. V., Drug Design Reviews Online 2005, 2, 467-83.
2. Mills, J. S., Showell, G. A. Expert Opinion On Investigational
Drugs 2004, 13, 1149-57.
3. Bains, W., Tacke, R. Current Opinion in Drug Discovery andDevelopment 2003, 6, 526-43.
4. Sieburth, S. M. “Isosteric Replacement of Carbon with
Silicon in the Design of Safer Chemicals”, in Designing Safer
Chemicals, DeVito, S. C., Garrett, R. L., Eds.; American
Chemical Society:Washington, DC 1996, pp 74-83.
5. Tacke, R., Linoh, H., Patai, S., Rappoport, Z.
“Bioorganosilicon Chemistry”, in The Chemistry of Organic
Silicon Compounds(2), John Wiley & Sons:New York 1989, pp1143-206.

22. Bom, D., Curran, D. P., J. Med. Chem. 2000, 43, 3970-80.
23. Song, L., Bevins, R., J. Med. Chem. 2006, 49, 4344-55.
24. Daud, A., Valkov, N., Clinical Cancer Research Clinical Cancer
Research 2005, 11, 3009-16.
25. Morris, R. L., Varnes, M. E., Photochem. Photobiol. 2002, 75,
652-61.
26. Xue, L. -. y., Chiu, S. -. m., Oncogene 2001, 20, 3420-7.
27. Rizvi, N. A., Marshall, J. L., J. Clin. Oncol. 2002, 20, 3522-32.
28. Minagawa, N., Nakayama, Y., Oncol Res 2004, 14, 407-14.
29. Miyagawa, N., Homma, T., Pharmacology 2003, 67, 21-31.
30. Shudo, K., Kagechika, H., Biological & Pharmaceutical
Bulletin 2004, 27, 1887-9.

O

6. Barcza, S. “The Value and New Directions of Silicon
Chemistry for Obtaining Bioactive Compounds”, in Silicon
Chemistry, Corey, E. R., Corey, J. Y., Gaspar, P. P., Eds.;
Wiley:New York 1988, pp 135-44.

21. Sieburth, S. M., Lin, S. Y., Engel, J. F., Greenblatt, J. A.,
Burkart, S. E., Gammon, D. W., Crombie, L. “Silane Analogs
of MTI-800: Biology and Chemistry”, in Recent Advancesin the Chemistry of Insect Control II, Royal Society ofChemistry:London 1990, pp 142-50.

F

References

7. Fessenden, R. J., Fessenden, J. S. Adv. Organomet. Chem.
1980, 18, 275-99.

8. Tacke, R., Wannagat, U. Top. Curr. Chem. 1979, 84, 1-75.

32. Alfthan, O., Andersson, L., Scandinavian Journal of Urology
and Nephrology 1983, 17, 37-43.
33. Cunningham, J. G., Ford, R. B., Amer. J. Vet. Res. 1981, 42,
2178-81.

PRO

9. Fessenden, R. J., Fessenden, J. S. Adv. Drug Res. 1967, 4,
95-132.

31. Kocsis, P., Farkas, S., J. Pharmacol. Exp. Ther. 2005, 315,
1237-46.

10. Cassidy, S. Manufacturing Chemist 1989, December, 51.

11. Friedberg, K. D., Schiller, E. “Silicon”, in Handbook on
Toxicity of Inorganic Compounds, Seiler, H. G., Sigel, H., Eds.;
Marcel Dekker:New York 1988, pp 595-617.

12. Liu, G., Sieburth, S. M. Org. Lett. 2005, 7, 665-8.

13. Fessenden, R. J., Hartman, R. A. J. Med. Chem. 1970, 13, 52-4.

14. Guliashvili, T., El-Sayed, I., Angew. Chem. Int. Ed. 2003, 42,
1640-2.
15. Ottosson, H. Chem. Eur. J. 2003, 9, 4144-55.

16. Seyferth, D., Annarelli, D. C. J. Am. Chem. Soc. 1975, 97,
2273-5.

34. Voronkov, M. G. Top. Curr. Chem. 1979, 84, 77-135.
35. Kazimirovskaya, V. B., D’yakov, V. M., Pharm. Chem. J. 2001,
35, 465-7.
36. Black, C. A., Ucci, J. W., Bioorg. Med. Chem. Lett. 2002, 12,3521-3.
37. Metcalf, R. L., Fukuto, T. R. J. Econ. Ent. 1965, 58, 1151.
38. David, W. A. L., Metcalf, R. L., J. Econ. Ent. 1960, 53, 1021.
39. Nair, H. K., Quinn, D. M. Bioorg. Med. Chem. Lett. 1993, 3,2619-22.
40. Hornsperger, J., Collard, J., Biochemical Society Transactions
1994, 22, 758-66.

17. Franz , A. K., Woerpel, K. A. Acc. Chem. Res. 2000, 33, 813-20.

41. Cutler, N. R., Seifert, R. D., Clin Pharmacol Ther 1995, 58, 54-61.

18. Moberg, W. K., Basarab, G. S., Cuomo, J., Liang, P. H.,
Greenhalgh, R., Roberts, T. R. “Biologically Active
Organosilicon Compounds: Silicon-Containing Triazole
Fungicides”, in Pesticide Science and Biotechnology,
Blackwell Scientific:Boston 1986, pp 57-60.

43. Woo, D. V., Christian, J. E., Can. J. Pharm. Sci. 1979, 14, 12-4.

19. Sieburth, S. M., Manly, C. J., Pestic. Sci. 1990, 28, 289-307.
20. Itoh, H., Kajino, H., Bioorg. Med. Chem. 2002, 10, 4029-34.

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42. Fahmy, M. A. H., Fukuto, T. R., J. Agric. Food Chem. 1973,
21, 585-91.
44. Showell, G. A., Mills, J. S. Drug Discovery Today 2003, 8, 551-6.
45. Daiss, J. O., Burschka, C., Organometallics 2005, 24, 3192-9.
46. Barcza, S., Hoffman, C. W. Tetrahedron 1975, 31, 2363-7.
47. Pitt, C. G., Friedman, A. E., Tetrahedron 1975, 31, 2369-77.

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6149. Gaboriau, F., Vaultier, M., Redox Report 2005, 10, 9-18.
50. Berdysheva-Desert, O., Desbat, B., Colloids Surf., B 2005, 42,
227-34.
51. Cavelier, F., Vivet, B., J. Am. Chem. Soc. 2002, 124, 2917-23.
52. Cavelier, F., Marchand, D., J. Peptide Res. 2004, 63, 290-6.
53. Pujals, S., Fernández-Carneado, J., J. Am. Chem. Soc. 2006,
128, 8479-83.
54. Weidmann, B. Chimia 1992, 46, 312-3.
55. Ishikawa, H., Yamanaka, H., Appl. Microbiol. Biotechnol.
1999, 53, 19-22.
56. Tacke, R., Merget, M., Organometallics 2000, 19, 3486-97.
57. Chugh, A., Ray, A., Prog. Lipid Res. 2003, 42, 37-50.
58. Sawada, M., Matsuo, M., Eur. J. Pharmacol. 2001, 431, 11-6.

80. Danzin, C., Zreika, M., Biochemical Society Transactions
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81. Van Dorsselaer, V., Schirlin, D., Bioorganic Chemistry 1996,
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83. Wakabayashi, K., Sadakane , S., J. Pest. Sci. 2005, 30, 90-8.
84. Dain, J. G., Nicoletti, J. Xenobiotica 1995, 25, 951-61.

O

59. Gotteland, J., Brunel, I., J. Med. Chem. 1995, 38, 3207-16.

79. Danzin, C., Collard, J., Bioorg. Med. Chem. Lett. 1995, 5,2363-6.

F

48. Berdycheva, O., Desbat, B., Chem. Phys. Lipids 2003, 125, 1-11.

60. Tse, F. L. S., Jaffe, J. M., J. Clin. Pharmacol. 1984, 24, 47-57.

61. Bennett, G. B., Houlihan, W. J., J. Med. Chem. 1976, 19, 709-14.
62. Tacke, R., Bentlage-Felten, A., Z Naturforsch [B] 1986, 41B,
649-54.
63. Ilg, R., Burschka, C., Organometallics 2006, 25, 5396-408.

PRO

64. Daiss, J. O., Burschka, C., Organometallics 2006, 25, 1188-98.
65. Tacke, R., Heinrich, T., Organometallics 2004, 23, 4468-77.
66. Tacke, R., Terunuma, D., J. Organomet. Chem. 1995, 501,
145-54.

67. Tacke, R., Handmann, V. I., Organometallics 2002, 21, 3727-32.

68. Sieburth, S. M., Chen, C. -. A. Eur. J. Org. Chem. 2006, 311-22.
69. Chen, C. -. A., Sieburth, S. M., Chem. Biol. 2001, 8, 1161-6.
70. Mutahi, M. w. a., Nittoli, T., J. Am. Chem. Soc. 2002, 124,7363-75.
71. Kim, J., Hewitt, G., J. Org. Chem. 2005, 70, 5781-9.

72. Kim, J., Sieburth, S. M. J. Org. Chem. 2004, 69, 3008-14.
73. Juers, D. H., Kim, J., Biochemistry 2005, 44, 16524-8.

74. Picard, J. P. Adv. Organomet. Chem. 2005, 52, 175-375.

75. Silverman, R. B., Banik, G. M. J. Am. Chem. Soc. 1987, 109,2219-20.
76. Silverman, R. B. Acc. Chem. Res. 1995, 28, 335-42.

77. Youdim, M. B. H., Weinstock, M. NeuroToxicology 2004, 25,
243-50.
78. Ives, N. J., Stowe, R. L., BMJ 2004, 329, 593-9.

62

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CROSS-COUPLING OF SILANOLS AND SILANOLATESScott E. Denmark
Reynold C. Fuson Professor of Chemistry
University of Illinois – Urbana-Champaign

t-Bu

O

O
Si
O
t-Bu

OTES

(2)

1. t-BuLi, THF –50°
2. Me2SiClH, –72°
3. H2O

t-Bu

O
Si
O
t-Bu

O

Me Me
Si
H [(p-cymene)RuCl2]2
C6H6/MeCN, 1:1

OTES
(94%)

t-Bu

H2O (2.0 equiv)

O
Si
O
t-Bu

O

Me Me
Si
OH

OTES
(84%)

O

Organosilanols (and their conjugate bases) find ubiquitous
application as stabilizing ligands in coordination chemistry of maingroup and transition metals complexes.1 However, prior to 2000,
the only applications of silanols in organic synthesis was the use of
KOTMS for the mild saponification of methyl esters2 and nitriles3
and as an oxygen nucleophile in enantioselective allylic substitution.4
However, in 2000 two independent reports demonstrated theutility of organosilanols as donors in cross-coupling reactions
under activation by silver(I) oxide5 or TBAF.6 The advantages oforganosilanols as coupling partners are manifold in comparison to
the halosilanes, including: (1) ease of synthesis, (2) stability toward
oxygen and moisture, (3) ease of purification, (4) chemical stability,and (5) diversity of synthetic methods for their preparation. An
additional advantage of significant synthetic importance is theability to activate the cross-coupling of organosilanols with Brønsted
bases, thus avoiding the incompatibilities associated with fluoride.7,8Moreover, the conjugate bases of organosilanols are stable, often
free flowing powders that are “self-activating” cross-coupling
partners, i.e. require no additional activators.9 These two variantsof cross-coupling are presented separately because of the differencesin substrate scope. Even those cross-coupling reactions thatundoubtedly involve the silanolate salt through in situ generation
will be presented in the silanol section, only those cross-couplings
that employ the preformed, isolated silanolates are included in thesubsequent section.

hydrolysis (acetate buffer) the latter is converted to the silanol byoxidation with water or an alcohol under catalysis by ruthenium
or iridium complexes (Eq. 2).11

F

Introduction

PR
O

Hydrosilylation of alkynes is a powerful method for creating
carbon-silicon bonds with site and stereoselectivity. For thismethod, silanol surrogates are needed and can be found in the many
commercially available hydrosilanes bearing chloro, alkoxy, or
silyloxy substituents. More robust surrogates such as benzylsilanes
are also available. The steric course of the hydrosilylation isdependent upon the transition-metal catalyst: (1) platinum catalysts(e.g. H2PtCl6, (DVDS)Pt•(t-Bu3P))12 react with terminal alkynes togive (E)-1-alkenylsilanes via a syn process whereas [(C6H6)RuCl2]2
promotes an anti addition process to afford (Z)-alkenylsilanes.13
Remarkably, the cationic ruthenium complex [(Cp)Ru(MeCN)3]+ PF6–
reacts with terminal alkynes to afford 2-alkenylsilanes.14

Silanols

Preparation

Many different methods are available for the preparationof silanols and silanol surrogates from a variety of precursors.
The most common method for introduction of a silanol unit
involves the reaction of an organometallic reagent (lithium
or magnesium) with a silicon electrophile. The most directprocess involves the reaction of the organometallic reagent withhexamethylcyclotrisiloxane (D3) (Eq. 1).10
Br

TBSO

1. t-BuLi, ether, –78°
2. D3, –78°→ rt
3. H2OA palladium-catalyzed insertion method has been developed
to allow the introduction of silanols on cyclic substrates wherein
formation of an organometallic reagent is precluded by sensitive
functionality (Eq. 3).15 For effective reaction with aryl bromides,a bulky electron-rich phosphine (JohnPhos)16 is required. The pHof the workup is critical to suppress formation of the disiloxane.

SiMe2OH

(1)

TBSO

Me

+ (SiMe2OEt)2
Br

PdCl2 (5%)
JohnPhos (10%)
i-Pr2EtN (300%)
NMP, 60°

O
1.0 M HOAc

Me

CH3CN

(3)
SiMe2OH

Cross-Coupling(93%)

This method works well for aryl- and alkenyllithium reagents.
Less reactive organometallic species, or those unstable at higher
temperatures require more reactive silicon electrophiles such as
dimethyldichlorosilane or dimethylchlorosilane. Whereas theformer can be converted into the corresponding silanol by mild
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O

Fluoride Activation
Arylsilanols. Only a simple phenyl group has been transferredunder these conditions by the use of phenyldimethylsilanol in
combination with a limited number of aryl iodides. A stoichiometricamount of silver(I) oxide is also used together with TBAT.17

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Alkenylsilanols. This class represents a very large number ofexamples that employ acyclic and cyclic alkenylsilanes of varying
substitution patterns in cross-coupling with aryl, heteroaryl andalkenyl halides. The stereospecificity of cross-coupling of simple
alkenylsilanes is illustrated for a prenylating agent (Eqs. 4 and 5).18
SiMe2OH+Me

THF, rt, 115 min+MePd(dba)2 (5%)
THF, rt, 580 min

CN

Me

O

O

SiMe2OH

NO2(70%) Me

CN

I

Me

Pd(PPh3)4 (5%)
TBAF (100%)
THF, 60º, 2 h(78%)

Brønsted Base Activation. For this disparate collection ofcross-coupling reaction conditions, the only unifying characteristic
is that the activators are all Brønsted bases. Thus, under this rubric isfound activation by silver(I) oxide, potassium trimethylsilanolate,cesium carbonate, cesium hydroxide, potassium tert-butoxide,sodium hexamethyldisilazide, and sodium or potassium hydride.
Undoubtedly, the corresponding silanolate is being formed tosome extent and is likely the active component. However, because
the parent silanol is the species employed in these processes, these
conditions are be described herein.

O

For the iodide electrophiles, no phosphine ligand isneeded and the reactions take place at room temperature withelectron-deficient, electron-rich and sterically hindered arenes.
In a competition study, dimethyl-, diethyl-, diisopropyl- anddiphenylsilanols react at approximately the same rate underactivation by TBAF.19

Me

+

(5)

THPO

TBAF (200%)

I

(88%)

(9)

(76%)

THPO

(8)

O

2. Pd(dba)2 (5%)
rt, THF, 20 min

THPO

TBAF (200%)

SiMe2OH

SiMe2OH

OH

1. TBAF (200%)

I

Alkynylsilanols. A limited set of simple alkynylsilanols
undergo a “copper-free”, Sonogashira-type cross coupling witharyl iodides using (Ph3P)4Pd and TBAF (Eq. 9).22

(4)
I
NO2

Pd(dba)2 (5%)

O

+

F

THPO

OH

Arylsilanols. The first reported use of silanols in a crosscoupling reaction employed a full equivalent of silver(I) oxide
as the activator in the presence of Pd(OAc)2 in warm THF.5,23,24
Phenylsilanols bearing electron-donating and withdrawing groups
can be used with similarly modified aryl iodides. It is likely thatsilver activates the arylpalladium iodide by abstraction of aniodide to form a cationic palladium(II) species and activates thearylsilanol through formation of a hypercoordinate complex. Theintermediacy of a palladium(II) silanolate was not suggested.

PR
O

Cross-couplings with alkenyl iodides and bromides
proceed with high geometrical selectivity and only minor
amounts of cine substitution products (Eq. 6).6,18,20
Diisopropylsilanols give slightly higher geometrical selectivities
compared to dimethylsilanols.6
n-C5H11+

SiR2OH(6)IOH

R = MeR = i-Pr[allylPdCl]2 (2.5 mol %)TBAF (2.0 equiv)

OH

n-C5H11

THF, rt

R = Me: (64%) 87.2/12.2, Z,Z/other isomers
R = i-Pr: (68%) 92.4/7.6, Z,Z/other isomers

Aryl triflates can participate in cross-coupling reactions but theconditions need to be carefully adjusted. To facilitate the oxidative
addition step, an electron-rich, hindered phosphine (John-Phos) isneeded and, to suppress fluoride-assisted S–O bond cleavage of thetriflate, the TBAF is hydrated with 6 to 8 equiv of water (Eq. 7).21 For
electron deficient aryl triflates, TBAF•30H2O is required.
n-C5H11SiMe2OHJohnPhos (10%)
PdBr2 (5%)+

Me

Phenylsilanols can also undergo cross-coupling in the presenceof cesium bases (carbonate or hydroxide). However, the bases mustcarry 2-3 molecules of water of hydration to reverse the formationof inactive disiloxanes formed from the silanols under the elevatedtemperatures needed to effect cross-coupling with aryl iodides andbromides (90-110˚).25,26 In addition, ligands play an important rolein suppressing the formation of homocoupling products from aswell as reduction of the electrophile (Eqs. 10 and 11).

Me
n-C5H11SiMe2OH

OMe+
Br(86%) Z/E = 99.6:0.4

α-Alkoxyalkenylsilanols, both cyclic (pyranyl and furanyl)
and acyclic undergo ready cross-coupling with aryl iodides under
the standard conditions with TBAF (Eq. 8).

64dppb (10%)
toluene, 90°, 18 h

Br

TfO

TBAF•6 H2O (200%)
dioxane, rt, 25 h

+

MeO

(7)

Cs2CO3 + 3H2O (200%)[allylPdCl]2 (5%)

SiMe2OH

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MeO

CsOH•H2O + 2H2O (200%)[allylPdCl]2 (5%), dppb (10%)
dioxane/toluene (4:1)
110°, 24 h

(10)
(79%)
OMe
(11)
(82%)

The failure of disiloxanes to undergo cross-coupling under
Brønsted base activation sharply contrasts their behavior underfluoride activation. The limited scope of arylsilanol TG and harshreaction conditions limited the utility of this method, which has

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Enabling Your Technology

been replaced by the use of the preformed potassium silanolate
salts (vide infra).

(12)
Pd2(dba)3•CHCl3 (5%)
NaOt-Bu (200%)

OMe
I

SiMe2OH +N
Boc

Pd2(dba)3•CHCl3 (5%)
NaOt-Bu (200%)

I
+

(13)
N
Boc
(82%)

CF3

NaOt-Bu (200%)
toluene, 55º, 20 h

CN

N
Me
(80%)

Cl

OTBS

2. Pd2(dba)3•CHCl3 (5%)
toluene, 50º, 24 h

Cl

N
Bn

SiMe2OH

OTBS

N

1. NaH (120%), toluene+

CF3

2. cat. 55 (2.5%)
toluene, 50°, 12 h

(t-Bu)3PPd

Cl

PdP(t-Bu)3

Cl

(16)

N
Bn

CF3

N
Bn

SiMe2OH

n-C5H11Cl+

1. NaH, tolueneN

2. [allylPdCl]2 (2.5%)
RuPhos (5.0%)
toluene, 70º, 12 h

N
Bn

(20)

SiMe2OH(19)

1. PhNCO (5.0 equiv)
Et3N (40%)
Me
toluene, 110ÞC
Si OMe + n-PrNO2
2. 1.0 M HOAc
Me
CH3CN, rt

Ph

N

Et

Me
HO

Si

Me

O
Ph

(21)
Me

N

Ph

Gelest, Inc.

Me
HO

N

O
Ph

Cu(OAc)2 (100%)

(78%)

O2N

OH 1. KHCO3 (3.0 equiv)MeN
dioxane, reflux
Si OMe +Cl 2. 1.0 M HOAc
Ph
Me
CH3CN

N

In addition, 2-furyl-, 2-thienyl- and N-Boc-(2-pyrrolyl)
dimethylsilanols undergo cross-coupling under these conditions
with a similar scope of electrophile (Eq. 18).

Et

Pd2(dba)3•CHCl3 (5%)
NaOt-Bu (250%)
toluene, 40º

(49%)

(17)

(87%)

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N(71%) Bn

SiMe2(Oi-Pr)

(64%)

Me

n-C5H11n-C5H11Cl

2. 10 mM HCl (0.04 equiv)(15)(76%) Boc

Br

(73%)

Another sequential process that first constructs a silylated
heterocycle, which is then used for cross-coupling, involves the[3+2] cycloaddition of nitrile oxides with alkynylsilyl ethers (Eqs.
20 and 21).34 The nitrile oxides can be generated under two different
conditions, both sufficiently mild to allow the use of an alkynylsilyl
methyl ether as the 2π-component. The [3+2] cycloadditions proceed
in modest regioselectivity (ca. 4-5:1) and the minor constitutional
isomer can be removed easily. The cross-coupling reactions require
extensive optimization to suppress protiodesilylation. As had been
seen before, copper salts, in this case copper(II) acetate, are used tomaximize the yield of the cross-coupling product.

Me

1. NaHMDS (120%), toluene

NHBn

+

PR
O
I

CN

1. Ph3P (5%), Pd(OAc)2 (5%)
H2O (3.0 equiv), LiCl (1.0 equiv)
K2CO3 (5.0 equiv), DMF, 100°, 2 hI

n-C5H11

Me

+

(18)

O

The 3-substituted-2-indolylsilanols in Scheme 34 are preparedby a variant of the Larock indole synthesis that employs alkynylsilyl
ethers and places the silanol group in the 2-position for coupling(Eq. 19).30 2-Iodo-N-alkyl anilines are used as precursors with both
isopropyl and tert-butylsilyl ethers. These silyl ethers are sufficiently
robust to withstand the Larock heteroannulation conditions and canbe deprotected with very mild acid hydrolysis. The sequence thenallows for the controlled construction of 2,3-disubstituted indoles
from anilines whereby unsymmetrical alkynes would otherwise
lead to mixtures of constitutional isomers. The cross-coupling ofisolated, preformed sodium silanolate salts represent the third
variant and is discussed in the next section.

CN

A more general protocol involves the stoichiometricdeprotonation of the heteroarylsilanol with either sodium hydrideor sodium hexamethyldisilazide. This modification allows a numberof important advances including the elimination of copper(I) salts
to suppress protiodesilylation (no protons) and the ability to crosscouple with aryl and heteroaryl bromides and chlorides (Eqs. 1517).29,30 For the less reactive electrophiles an appropriate phosphine
ligand or precatalyst is needed to effect oxidative addition. S-Phos,31
Ru-Phos32 and the palladium(I) dimer33 serve well in this capacity.
SiMe2OHN
Boc

CN

1. NaH (120%), toluene
2. Pd(I) dimer (2.5%)
toluene, 50º, 3 h(14)

Pd2(dba)3•CHCl3 (5%)
dppb (20%), CuI (100%)

+

Br

O

N
Me

MeO

CF3 Cu(OAc)2 (25%)
toluene, rt, 4 hBr
SiMe2OH

N
Boc
(75%)

CuI (100%)
toluene, 50º, 24 h

MeO
SiMe2OH
N
Boc

MeO

O

+

F

Heteroarylsilanols. A significant number of π-excessive
heteroaromatic silanols have been prepared and three different
conditions for their cross-coupling reactions have been developed,
two of which involve the use of the parent silanol.27-29 N-Bocand N-methyl-2-indolyldimethylsilanol undergo smooth crosscoupling with aryl bromides and iodides in the presence of
sodium tert-butoxide and 1.0 equiv of copper(I) iodide to suppress
protiodesilylation (Eqs. 12-14). The amount of copper can be
reduced to 25 mol % with activated indole derivatives.

SiMe2OH

Si

O

Me

(33%)

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Ph

Pd2(dba)3•CHCl3 (5%)
NaOt-Bu (250%)

NO

Cu(OAc)2 (100%)
toluene, 40º
O2N

www.gelest.com

(63%)

65

Alkenylsilanols. Several different methods of activation havebeen employed for this family of organosilanols including silver(I)oxide5 (Eq. 22), KOTMS35,36 (Eq. 23), sodium tert-butoxide37,38(Eq. 24), and potassium hydride39 (Eq. 25). Both aromaticand olefinic iodides are active partners. Functional groupcompatibility is good and the reactions are stereospecific withrespect to the alkenylsilanol unit. Diisopropylsilanols react
significantly slower (ca. 20-fold) compared to dimethylsilanols
under activation by KOTMS.
SiMe2OH

n-C6H13

OMe

+
I

OMe

Ag2O (100%)(22)

n-C6H13

THF, 60°, 4 h(95%)

SiMe2OH

Me2Si

CN

+

S

O

I
CN

Pd(dba)2 (2.5%)

S

dioxane, rt, 0.5 h
O

(83%)
BnO

SiMe2OH
+

O

OBn

I

PR
O

O
t-Bu2Si

(23)

Me2Si

KOTMS (200%)

Although silanolate salts are certainly the reactive species
in the cross-coupling reactions carried out under Brønsted
base activation, these salts are always generated in situ from theparent silanol. Depending upon the strength of the Brønsted base
employed, the formation of the silanolate may or may not be
quantitative. Moreover, the conjugate acid remains in the reaction
mixture (except in the case of NaH and KH). The pre-formationand isolation of the sodium or potassium silanolates (from thecorresponding hydrides) offers a number of preparative advantages.
First, silanols dimerize to the corresponding disiloxanes in thepresence of acids or bases, and isolating the metal salt prevents
this process. Second, using the isolated preformed silanolate
in the reaction not only simplifies the experimental procedure(adding one reagent as opposed to the silanol and base), but also
ensures that the cross-coupling partner is always present in its
active form. Moreover, a metal silanolate can be generated cleanlywith a stoichiometric quantity of metal hydride, without the needfor an excess of an activator. The use of an excess of the activator
can be problematic in the cross-coupling reaction for several
reasons. Surplus activator (i.e. KOt-Bu, KOSiMe3) can competewith silanolate for the Pd center of the arylpalladium halide. As acompetitive inhibitor, the activator can form an inactive species in
the cross-coupling reaction where it serves as a ligand on the Pd(II)aryl complex. This process sequesters palladium in an inactive form,and subsequently slows the cross-coupling reaction.41 Silanolate
must displace the activator to allow the Pd to reenter the catalytic
cycle as the palladium silanolate. An excess of the activator can also
limit functional group compatibility. For example, when NaOtBu is employed with substrates bearing ethyl esters, a competingtransesterification reaction takes place.42 Furthermore, excess
amounts of hydride reagents give reduction products,36 and areincompatible with substrates bearing sensitive functional groups.
The direct introduction of the silanolate avoids these problems andmany of these salts are stable, free-flowing powders.

F(Ph3P)4Pd (5%)

Silanolates

OTES

OPiv

BnO

Pd2(dba)3•CHCl3 (5%)

O
t-Bu2Si

t-BuONa (200%)
toluene, 50°, 5 h

(24)

O

OPiv

(82%)

OTES

SiMe2OH

BnMe2Si

OBn

O+

CO2t-BuI

CO2t-BuPd(dba)2 (2.5%)
KH (130%)

THF, rt, 4 h(25)

BnMe2Si(81%)

Alkynylsilanols. As is the case with trimethylsilylalkynes,
the silanol version of the Sonogashira reaction offers little
advantage under activation by fluoride, but activation by
KOTMS leads to a significantly more rapid transmetalation(room temperature compared to 65-120˚). Copper(I) iodide
is essential for clean cross-coupling and in this report the substrates
are limited to aryl iodides (Eq. 26).40
SiMe2OH +n-C5H11OH

I

DME, rt, 3 h66

n-C5H11MeO

SiMe2O–K+

Cl
+

Cl

OMe

(t-Bu3P)2Pd (5%)(27)

toluene, 90°, 8 h

Br

(71%)

KOTMS (200%)
PdCl2(PPh3)2 (2.5%)
CuI (5%)Arylsilanolates. The limitations encountered in the crosscoupling of arylsilanols under Brønsted base activation (Eqs.
10, 11) are substantially overcome by the use of potassium
arylsilanolate salts in combination with (t-Bu3P)2Pd.42 A wide
range of arylsilanolates bearing various functional groups (alkoxy,
dialkylamino, trifluoromethyl, fluoro, chloro, alkoxycarbonyl)
couple effectively with aryl bromides and chlorides bearing anequally diverse set of functional groups (halo, alkoxy, silyloxy,
alkoxycarbonyl) in good yield. In addition, various heteroaromatic
bromides function as cross-coupling partners (Eqs. 27-31). Other
ligand/catalyst combinations show more limited generality.43

OH (26)(84%)

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SiMe2O–K+
Cl

Gelest, Inc.

+

Br(215) 547-1015

OTBS

OTBS
(t-Bu3P)2Pd (2.5%)(28)

toluene, 90°, 3.5 hClwww.gelest.com(57%)

Enabling Your Technology

SiMe2O–Na+
Cl

NMe2

(t-Bu3P)2Pd (7.5%)

+
Br

(76%)

Cl

OTBS

OTBS

(t-Bu3P)2Pd (5%)(58%)

toluene, 90°, 5 h

Cl

F3C

SiMe2O–K+
+
Me2N

(29)

THF, 90°, 3 h

SiMe2O–K+
+
F3C

NMe2

Cl

(30)
N

N

(t-Bu3P)2Pd (2.5%)(31)

toluene, 90°, 3 hBr+toluene, 70º, 1 h

Me
R1
Et
H
Me

N

–

SiMe2O Na
N
SEM

+

Cl

+

N
SEM
(92%)

CN

(33)

[allylPdCl]2 (2.5%)
SPhos (5%)
toluene, 90º, 3 h

(73%)

Br

SiMe2O–Na+
N
Boc

I

+

OTBS

Pd2(dba)3•CHCl3 (5%)+

SiMe2O–K+

SiMe2O–K+

n-C5H11SiMe2O–Na+

MeO

SiMe2O–Na+

+

N

N

(40)

[allylPdCl]2 (2.5%)
SPhos (5%)
THF, 66º, 3.0 h

n-C5H11N(87%) (E)/(Z) = 99.6:0.4

Br

(41)

[allylPdCl2]2 (2.5%)
DME, 85°, 4 h
OSiEt3(86%)

NMe(65%) Me

THF, 60º, 5 h

OSiEt3Br[allylPdCl2]2 (2.5%)

+

(42)

DME, 85°, 12 h

Me2N

Me2N
(73%)

Sodium 2-butenyldimethylsilanolate (E/Z = 80:20) affords
good yields of the γ-substituted product with electron-rich andelectron-poor bromides (Eqs. 43-45).

(35)

SiMe2O–Na+ +

O

OTBS

γ

γ + α (76%), γ:α = 13:1
+

OTBS

Me

O

Me

N

+
Boc

toluene, 70°, 20 h

(44)

Boc

γ

γ + α (67%), γ:α = 25:1

Alkenylsilanolates. Although alkenylsilanols undergo efficient cross-coupling by various methods of activation with
Brønsted bases, the preformed potassium salts are highly effective

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Me

Pd(dba)2 (5%)
norbornadiene (5%)

Br
SiMe2O–Na+

OTBS

α

(37)

(67%)

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toluene, 70°, 8 h

OTBS

(82%)

THF, 60º, 6.5 hMePd(dba)2 (5%)
norbornadiene (5%)

Br

(36)

[allylPdCl]2 (2.5%)
SPhos (5%)

Cl

OTBS

+

Me

OTBS

Cl

+

N
Boc

Pd(t-Bu3P)2 (5%)

+

+

(34)

Me

O

(39)

Allylsilanolates. The sodium salts of allyldimethylsilanol and2-butenyldimethylsilanol undergo palladium-catalyzed crosscoupling with a wide variety of aryl bromides to afford allylated
and crotylated arenes.45 The reaction of the allyldimethylsilanolate
affords good yields of the allylation products from both electronrich and sterically hindered bromides (Eqs. 41, 42).

Br

cat. 55 (2.5%)

Br

Me OMeyield (%) (E)/(Z)9798.8:1.2
89
98.6:1.4
95
99.5:0.5

dioxane, 90º, 0.5 hCl

SiMe2O–Na+

n-C5H11

toluene, 50º, 12 hCl(t-Bu)3PPd
PdP(t-Bu)3

R1[allylPdCl]2 (2.5%)
SPhos (5%)

OTBS

SiMe2O–Na+

SiMe2O–Na+

THF, 66º, 0.5 h

OMe

OTBS

(63%)

n-C5H11Cl

R2(97%) (Z)/(E) = 99.5:0.5

N
SEM N

Br

toluene, 50º, 24 h

N
Me

+

R2 (E)/(Z)H 98.9:1.1
Et 98.6:1.4
Et >99.5:0.5

PR
O

CN

SiMe2O–K+(38)[allylPdCl]2 (2.5%)
SPhos (5%)

O

+

(32)

[allylPdCl]2 (2.5%)
SPhos (5%)

Cl
–

R2
R1

(80%)

Me2N

Heteroarylsilanolates. The successful cross-coupling of in situ
generated sodium silanolates of π-excessive heterocyclic silanols
illustrated in Eqs. 12-17 can be extended to other heterocycles andcoupling partners by the use of preformed salts. For example, thepreformed N-SEM-2-indolylsilanolate can engage in cross-couplingwith a variety of aryl and heteroaryl bromides and chlorides (Eqs.
32, 33) whereas the 5-bromo-N-Boc-2-indolylsilanolate couples
with iodides selectively (Eq. 34)29 and finally N-Me-3-pentyl2-indolylsilanolate (formed by a Larock annulation process)30
couples cleanly with a variety of aryl bromides (Eq. 35). Moreover,a large number of 2-benzofuranylsilanolates undergo smooth
coupling under similar conditions (Eqs. 36, 37).42
SiMe2O NaN
SEM

in reactions with aromatic and heteroaromatic chlorides.44 These
reactions display superior generality with respect to the acceptor,
extremely high stereospecificity for a number of different
alkenylsilanolate substitution patterns and overall higher yields
than the couplings with the corresponding bromides or iodides(Eqs. 38-40). The absence of byproducts derived from reduction
or homocoupling of the electrophile accounts for the better
performance of these reactions.

F

Cl

+

Me
α

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Boc

67

Scheme 1

Br
SiMe2O–Na++

SiMe2O–Na+N
Boc

Me i-BuPd(dba)2 (5%)
norbornadiene (5%)
toluene, 70°, 20 h

N
Boc

γ

γ + α (83%), γ:α = 19:1
+

i-Bu

Me

H

N
Boc

α

Br

SiMe2O–Na+

R

Me
Me
+
γ

R

α

(E)/(Z)
80:20
>97:3
80:20
>97:3

R
PhCO
PhCO
OMe
OMe

R

yield (%) γ/α
14:1
81
24:1
79
7.2:1
46
18:1
46

In γ-site-selective cross-coupling reactions of unsymmetrically
substituted allylic silanes, a new stereogenic center is created. With
the aid of enantiomerically enriched and configurationally definedallylic dimethylsilanolates, the stereochemical course of the SE2’
process has been elucidated. This study has revealed a strong andconsistent stereochemical correlation for the cross-coupling ofenantiomerically enriched allylic dimethylsilanolate (Eq. 47).46

In the presence of [allylPdCl]2 and 4,4’-(trifluoromethyl)
dibenzylideneacetone a wide range of aryl bromides undergo highly
γ-site selective cross-coupling with perfect syn SE2’ stereospecificity.
These results are interpreted in terms of an intramoleculartransmetalation via a chair-like, transition structure. In the preferredtransition structure, the Si–O–Pd linkage controls the delivery of
the palladium electrophile to the γ-terminus of the allylic silane.
The palladium is tricoordinate and the alkene takes up the fourthcoordination site in the square-planar complex. The pseudoequatorial orientation of the iso-butyl group assures high selectivity
in the formation of an E double bond in the product. In addition,
the allylic methyl group is positioned orthogonal to the ligand planeof palladium to avoid unfavorable steric interactions. An alternativetransition state structure that also involves an intramoleculardelivery of the palladium moiety suffers from severe 1,3-diaxal
steric strain between the iso-butyl and allylic methyl group.
68

Aryl (R)

Me

i-Bu
H

Si

Me
O

H

i-Bu

Me i-Bu

Pd L
Aryl

Aryl (S)Total Synthesis with Silanolates

Papulacandin D.37,38 The papulacandins are a family of
antifungal agents, isolated from the deuteromycetous fungus
Papularia sphaerosperma that have demonstrated potent invitro antifungal activity against various pathogens. All of thepapulacandins are amphipathic molecules composed of an aromatic
moiety linked via a spirocyclic structure to a lactose moiety withtwo different aliphatic acyl side-chains. The simplest member of thefamily, papulacandin D, lacks the O-(6’-acyl-β-galactoside) at theO-(4) position. The key strategic disconnection for the synthesis ofpapulacandin D requires the cross-coupling of a 2-pyranylsilanol
with an aryl halide (Scheme 51). Although α-oxyalkenylsilanols
are competent substrates for cross-coupling, the requirement
for fluoride activation is clearly incompatible with the silyl ether
protecting groups planned in the total synthesis. Therefore, fluoridefree conditions for the cross-coupling had to be developed.

PRO

Pd(dba)2
norbornadiene
toluene, 70°, 20 h

(46)

+

Me

O

In general, high γ-site selectivities are obtained with catalysts
bearing π-acidic ligands such as dba. Norbornadiene assists incatalyst turnover. The scope in aromatic bromide is good and theγ-site selectivity is generally higher than 10:1. Interestingly, the useof pure sodium (E)-2-butenyldimethylsilanolate led to a noticeable
improvement in the γ-site selectivity (Eq. 46). The role of π-acidic
ligands and double bond geometry are interpreted in terms of akinetically controlled, γ-selective transmetalation followed bydirect reductive elimination to form the branched product.
Me

L
Me2
Aryl
Si O Pd
H

(45)

i-Bu

Aryl (R)

Pd(0), Aryl–Br

Na+(R)-(Z)MeMe

syn SE2'

F

Me

www.AZmax.co.jp TEL: 03-5543-1630

The actual synthesis required the cross-coupling of theglycal silanol 3 with the protected iodo resorcinol derivative 4(Scheme 2).
Scheme 2O
t-Bu2SiOO
1

THF, –78° to rt, 1 h
(89%)

OTES

[(p-cymene)RuCl2]2, H2O
C6H6/MeCN, rt 1 h(84%)

Gelest, Inc.

O
t-Bu2Si

t-BuLi, HSiMe2ClO
t-Bu2Si

Pd2(dba)3•CHCl3,
NaOt-Bu, toluene
50°, 5 h
(82%)

O
2

+

O

PivO

OBn

O
O

OPiv
OTES
5

OH

O

O

HO
O

papulacandin D(215) 547-1015

HO

HO
HO
O

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OBn

I

OTES

BnO
O
t-Bu2SiOTES

SiMe2OH BnOO

3

SiMe2HO

OH

4

Enabling Your Technology

Scheme 4

To prepare 3, silyl-protected glycal 1 is lithiated at C(1) followedby capture with chlorodimethylsilane. The resulting hydrosilane
2 is subjected to a ruthenium-catalyzed, oxidative hydrolysis toafford the base-sensitive silanol 3. The key cross-coupling reactionof 4 was quite challenging because of protiodesilylation of 3, butultimately this critical transformation could be achieved efficiently
using sodium tert-butoxide as the Brønsted-base activator andPd2(dba)3•CHCl3 as the catalyst to provide C-arylglycal 5 in goodyield. Glycal 5 contains the entire carbon framework of the sugar
fragment of papulacandin D.

SiMe2Bn
6

9
NaH, Pd2(dba)3•CHCl3
touene, rt(77%) dr = 3:1
I

THPO

SiMe2Bn

CO2Et

Pd(dba)2, TBAF
THF, rt

10

F

(79%)

THPO

CO2Et

11

O
Me

OH

OH

Me

O

RK-397.39,47 The silicon-based cross-coupling reaction
is mechanistically unique in that two different modes oftransmetalation are possible. This mechanistic duality has significant
preparative utility because the different mechanistic pathways canbe accessed via complementary reaction conditions. The feasibilityof using both modes of activation in a single reagent is illustrated
by sequential Brønsted base/fluoride-promoted cross-coupling
reactions using the linchpin reagent (E,E)-[(4-benzyldimethylsilyl)1,3-butadienyl]dimethylsilanol 6. This bifunctional reagent can
combine with two electrophiles under complementary conditions
for the construction of unsymmetrical polyenes. In the first crosscoupling reaction, 6 is treated with KOTMS in the presence ofan aryl iodide and Pd(dba)2 to afford the (1-aryl-1,3-butadienyl)
benzylsilane 7. The benzyldimethylsilyl group is inert under these
conditions. Subsequently, treatment of 7 with TBAF effects thesecond cross-coupling reaction which proceeds smoothly to afford
the unsymmetrical 1,4-diaryl-1,3-butadiene 8 (Scheme 3).

HOMe2Si

I

THPO

Me

OH

OH

OH

OH

OH

OH

RK-397

Summary and Outlook

PRO

The impact of transition metal catalyzed cross-coupling
reactions cannot be overestimated. This Nobel Prize winningchemistry has transformed the practice of synthetic organic
chemistry in academic and industrial laboratories alike. The
ability to construct single bonds between sp3, sp2 and sp hybridized
carbon atoms in myriad chemical environments has enabled
the straightforward, strategic disconnection of target molecules
into pairwise combinations of donors and acceptors. The recent
development of high performance ligands has enabled the use of
more and more acceptors such as chlorides, tosylates, phosphates
and carboxylates. However on the donor side, the boronic acidderivatives have monopolized the attention of practitioners,
particularly in the pharmaceutical sector. This preference has
stimulated the commercial production of hundreds of boronic
acid derivatives, which then leads to the self fulfilling consequenceof using only these reagents and disregards the advantages and insome cases superiority of other donors including tin and silicon.

Scheme 3
I

SiMe2Bn

HOMe2Si

6

MeO

SiMe2BnTMSOK, Pd(dba)2
dioxane, rt, 1 h

MeO

7

(88%)

CO2Et

CO2Et

I

TBAF, Pd(dba)2
THF, rt, 15 min

MeO

8

(88%)

The total synthesis of the polyene-polyol antifungal agent RK397 aptly demonstrates the power of complementary modes ofactivation for silicon-based cross-coupling reaction (Scheme 4).
Whereas in the above synthetic study, both electrophiles are aryl
iodides, for the construction of the polyene fragment of RK-397,
however, the cross-coupling reaction with two alkenyl iodides isrequired. This extension is challenging because alkenyl iodides areless reactive. Thus, for the cross-coupling of 6 with alkenyl iodide 9,
NaH is employed instead of KOTMS as the Brønsted base promoter.
The stoichiometric generation of the silanolate using a strong basesuch as NaH provides heightened reactivity. The resulting triene 10
is then combined with ethyl (E)-3-iodopropenoate under fluoridepromoted cross-coupling conditions to afford tetraene 11. This key
fragment is then incorporated onto the polyol fragment, to complete
the total synthesis of RK-397.

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One of the unique advantages (and to some extent also
drawbacks) of silicon are the literally dozens of organosilane
moieties that can participate in cross-coupling reactions from themost inert trialkylsilanes to the highly reactive trichlorosilanes.
This diversity allows for precise tuning of the reactivity andfunctional compatibility of the donor for a specific cross-coupling
reaction. Of course, this diversity also presents a challenge for theexperimentalist to identify which of the many options would be
optimal. Fortunately, a recent comprehensive review of the area
provides a thorough treatment of the advantages of each activatinggroup and the transformations for which it is suitable together
with the reaction conditions needed to effect the cross-coupling.48

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69

The advantages of cross-coupling reactions with organosiliconcompounds include ease of introduction of the silicon moiety,functional compatibility, mildness of reaction conditions,non-toxicity of reagents, low molecular weight overhead andminimized waste stream. With the availability of more and moresilicon containing building blocks and precursors, such as thosecomplied in this brochure, we are confident that the use of siliconbased cross-coupling processes will soon take their rightful place
along with the other workhorse processes.

References
1. Lickiss, P. In Adv. Inorg. Chem.; Academic Press, Inc.: 1995;
Vol. 42, p 147.

A. Bull. Chem. Soc. Jpn. 2000, 73, 749.
25. Denmark, S. E.; Ober, M. H. Org. Lett. 2003, 5, 1357.
26. Denmark, S. E.; Ober, M. Adv. Synth. Catal. 2004, 346, 1703.
27. Denmark, S. E.; Baird, J. D. Org. Lett. 2004, 6, 3649.
28. Denmark, S. E.; Baird, J. D. Org. Lett. 2006, 8, 793.
29. Denmark, S. E.; Baird, J. D.; Regens, C. S. J. Org. Chem. 2008,
72, 1440.
30. Denmark, S. E.; Baird, J. D. Tetrahedron 2009, 65, 3120.
31. Barder, T. E.; Walker, S. D.; Martinelli, J. R.; Buchwald, S. L.
J. Am. Chem. Soc. 2005, 127, 4685.
32. Milne, J. E.; Buchwald, S. L. J. Am. Chem. Soc. 2004,
126, 13028.

3. Merchant, K. J. Tetrahedron Lett. 2000, 41, 3747.

33. Werner, H.; Kühn, A. J. Organomet. Chem. 1979, 179, 439.

4. Lyothier, I.; Difieber, C.; Carreira, E. M. Angew. Chem. Int.
Ed. 2006, 45, 6204.

34. Denmark, S. E.; Kallemeyn, J. M. J. Org. Chem. 2005, 70, 2839.
35. Denmark, S. E.; Tymonko, S. A. J. Am. Chem. Soc. 2005,
127, 8004.

O

5. Hirabayashi, E.; Mori, A.; Kawashima, J.; Suguro, M.;
Nishihara, Y.; Hiyama, T. J. Org. Chem. 2000, 65, 5342.

F

2. Laganis, E. D.; Chenard, B. L. Tetrahedron Lett. 1984, 50, 5831.

36. Denmark, S. E.; Sweis, R. F. J. Am. Chem. Soc. 2001, 123, 6439.

6. Denmark, S. E.; Wehrli, D. Org. Lett. 2000, 2, 565.

7. Denmark, S. E.; Sweis, R. F. Chem. Pharm. Bull. 2002, 50, 1531.

37. Karabelas, K.; Hallberg, A. J. Org. Chem. 1986, 51, 5286.
38. Denmark, S. E.; Regens, C. S.; Kobayashi, T. J. Am. Chem. Soc.
2007, 129, 2774.

9. Denmark, S. E.; Regens, C. S. Acc. Chem. Res. 2008, 41, 1486.

39. Denmark, S. E.; Fujimori, S. J. Am. Chem. Soc. 2005, 127, 8971.

10. Denmark, S. E.; Butler, C. R. Hexamethylcyclotrisiloxane.
e-EROS Encyclopedia of Reagents for Organic Synthesis[Online Early Access]. Published Online: 2007. (accessed
DOI: 10.1002/047084289X.rn00784).

40. Denmark, S. E.; Tymonko, S. A. J. Org. Chem. 2003, 68, 9151.

PRO

8. Denmark, S. E.; Sweis, R. F. Acc. Chem. Res. 2002, 35, 835.

11. Lee, M.; Ko, S.; Chang, S. J. Am. Chem. Soc. 2000, 122, 12011.
12. Chandra, G.; Lo, P. Y.; Hitchcock, P. B.; Lappert, M. F.
Organometallics 1987, 6, 191.

13. Denmark, S. E.; Pan, W. T. Org. Lett. 2002, 4, 4163.

14. Trost, B. M.; Ball, Z. T. J. Am. Chem. Soc. 2005, 127, 17644.

41. Denmark, S. E.; Sweis, R. F. J. Am. Chem. Soc. 2004, 126, 4876.
42. Denmark, S. E.; Smith, R. C.; Chang, W.-T. T.; Muhuhi, J. M.
J. Am. Chem. Soc. 2009, 131, 3104.

43. Denmark, S. E.; Smith, R. C.; Tymonko, S. A. Tetrahedron
2007, 63, 5730.
44. Denmark, S. E.; Kallemeyn, J. M. J. Am. Chem. Soc. 2006,
128, 15958.

15. Denmark, S. E.; Kallemeyn, J. M. Org. Lett. 2003, 5, 3483.

45. Denmark, S. E.; Werner, N. S. J. Am. Chem. Soc. 2008,
130, 16382.

16. Wolfe, J. P.; Singer, R. A.; Yang, B. H.; Buchwald, S. L. J. Am.
Chem. Soc. 1999, 121, 9550.

46. Denmark, S. E.; Werner, N. S. J. Am. Chem. Soc. 2010,
132, 3612.

17. Napier, S.; Marcuccio, S. M.; Tye, H.; Whittaker, M.
Tetrahedron Lett. 2008, 49, 3939.

47. Denmark, S. E.; Fujimori, S. In Strategies and Tactics inOrganic Synthesis; Harmata, M. A., Ed.; Elsevier: Amsterdam,
2008; Vol. 7.

18. Denmark, S. E.; Pan, W. J. Organomet. Chem. 2002, 653, 98.

19. Denmark, S. E.; Neuville, L.; Christy, M. E. L.; Tymonko, S. A.
J. Org. Chem. 2006, 71, 8500.

48. Chang, W.-T. T.; Smith, R. C.; Regens, C. S.; Bailey, A. D.;
Werner, N. S.; Denmark, S. E. Org. React. 2011, 75, 214.

20. Denmark, S. E.; Neuville, L. Org. Lett. 2000, 2, 3221.
21. Denmark, S. E.; Sweis, R. F. Org. Lett. 2002, 4, 3771.

22. Chang, S.; Yang, S. H.; Lee, P. H. Tetrahedron Lett. 2001,
42, 4833.
23. Hirabayashi, K.; Kawashima, J.; Nishihara, Y.; Mori, A.;
Hiyama, T. Org. Lett. 1999, 1, 299.
24. Hirabayashi, K.; Kondo, T.; Toriyama, F.; Nishihara, Y.; Mori,
70

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O

F

Silicon-Based Blocking Agents

PR
O

Gerald L. Larson, Ph.D.
Vice President, Research Products

Materials for protection of:
Alcohols
Phenols
Diols
AminesCarboxylic Acids
ThiolsMaterials for:Derivatization for gas chromatographic analyses
Synthetic transformations

SILICON-BASED BLOCKING AGENTS

Introduction of the Silyl Groups
In general smaller groups on silicon make the trisubstituted
silyl group more reactive and easier to introduce. Thus, a generalrelative reactivity scale is: Me3Si > Ph2MeSi > Et3Si > iPrMe2Si >t
BuMe2Si > tBuPh2Si > ThMe2Si (where Th = thexyl) > iPr3Si. The
leaving group on silicon also plays a role in both reactivity andbyproducts. The general relative reactivity of R3Si-X as a function of
X is: X = CN > OTf > I > Br > Cl > trifluoroacetamido > acetamido> R2N > RO. Others, such as perchlorates, and sulfates, thoughvery reactive, are not very practical. These general reactivity
trends will not apply to all sets of reaction conditions, but present
a practical working guide.

O

The ideal protecting group for an active-hydrogen moiety
such as an alcohol or amine would be one that would mimic thehydrogen atom itself, but be much more flexible in its reactivity. It
would readily go on in high yield, be stable over as wide a variety ofreaction conditions as possible and, at the same time, be selectively
removable in the presence of other functional groups including
other protecting groups. While no single silyl group can fulfill allof these conditions in all cases, the available range of silicon-based
blocking agents can offer the synthetic chemist viable answers tonearly every protection-deprotection challenge. The ability to vary
the organic groups on silicon introduces the potential to alter the
R3Si group in terms of both its steric and electronic characteristics
and thereby influence the stability of the silylated species to awide variety of reaction and deprotection conditions. This allows
the synthetic chemist to select a silyl protecting group that can,for example, be simultaneously removed during the work-up
of the reaction step(s) that required the protection, or that canbe selectively removed in the presence of another silyl or otherprotecting group.

The use of silicon-based blocking agents has been reviewed
with regard to reaction/deprotection,1-7 oxidation of silyl ethers,8and selective deprotection9.

F

General Considerations

PRO

In addition to having the ability to be fine-tuned to fit
a particular need, the ease and high-yield introduction anddeprotection of the silyl protecting groups contribute significantly
to their popularity and utility.

The introduction of the silyl group depends on the natureof the silyl group itself and the substrate. Silyl groups are mostoften used for the protection of alcohols in the form of their silyl
ethers. Generally, the less sterically hindered the silyl group theeasier it is to introduce (and, indeed, to remove). The introductionof the sterically unimpeded trimethylsilyl group to a primary,secondary or tertiary alcohol is a straightforward process taking
place with a variety of reagents under several mild, high-yieldreaction conditions. On the other hand, the introduction of themore sterically demanding tert-butyldimethylsilyl group requires
reaction of the alcohol with tert-butyldimethylchlorosilane in
the presence of imidazole as a catalyst10 and the formation of thetert-butyldimethylsilyl ether of tertiary alcohols is very difficult.
Alternatively, a more reactive form such as tert-butyldimethylsily
trifluoromethanesulfonate can be used.

The commonly utilized trisubstituted silyl protecting groups
and their acronyms are shown below.
Me

Me

Si

Me

Me

TMS

Me

DMIPS

TBS

72

Si

Me

Si

Me

Ph

DMPS

MDPS

Me
Si

Ph

Ph

Consideration of Byproducts

The introduction of a silyl group onto an alcohol, amineor other active hydrogen system is the result of a substitution
reaction at silicon releasing the protonated form of the leavinggroup from silicon. This leaving group can be acidic, e.g. HCl,
HBr, HI, HO3SCF3; basic, e.g. NH3, Me2NH, Et2NH; or neutral,e.g. CH3CONH2, CH3CONHMe, CF3CONH2, CF3CONHMe. The
effect of the nature and physical properties of these leaving groups
on the reaction product and purification must be considered whenselecting a silicon-based protecting group.

Et

Et

Si

Si

Et

TIPS

TES

Me

Ph

Me

Si

Si

Si

Me

Ph

Me

TBDPS

TDS

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Stability of Silyl-Protected Functional Groups
The relative stabilities of the silyl-protected functionalgroups, for example, alcohols as silyl ethers, is roughly the sameas the relative rates for their introduction. It must be remembered,however, that the stability of the system is dependent upon thespecific reaction conditions and, in particular, the pH. For example,

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phenyl-substituted silyl ethers are equal or more reactive thantheir trimethylsilyl counterparts under alkaline conditions, but lessreactive under acidic conditions. In general terms, however, therelative stabilities of the silyl-protected functional groups will follow
the order of: iPr3Si > ThMe2Si > tBuPh2Si > tBuMe2Si > iPrMe2Si >Et3Si > Ph2MeSi > Me3Si. Again, this order is meant to be a general
guide as the actual stabilities will depend on the pH of the medium
as well as other reaction conditions. The results of a study of thestability of various silyl ethers as a function of the groups on silicon
and the nature of the alcohol towards various hydrolysis conditions
and common organic reagents are shown in Table 1. The reader
is referred to the excellent review by Crouch and Nelson on theselective deprotection of silyl groups in synthesis.9

butyldimethyl-chlorosilane requires the presence of imidazole as acatalyst.10 The high stability of TBS-protected groups to a varietyof reaction conditions, its clean NMR characteristics, and its easeof removal with fluoride ion makes it a popular choice among thesilicon-based blocking agents. TBS ethers can be removed in thepresence of TIPS,15 and TBDPS,16 ethers.

The Trimethylsilyl, TMS, GroupF

Enabling Your Technology

The TIPS group is one of the most sterically hindered silyl
protecting groups, being removed only slowly under standard acidor base-catalyzed hydrolysis conditions. TIPS ethers show a stability
greater than TBS ethers. Reaction with tetrabutylammonium
fluoride is a common method for TIPS desilylations.17 The TIPS
group is usually introduced from triisopropylchlorosilane, but
triisopropylsilane15 or the triflate16 can also be used.

The Thexyldimethylsilyl, TDS, GroupThe TDS group was proposed as a silyl blocking agent thatwould have more stability than the TBS group and whose reagent,
TDS-Cl, would be less expensive to produce commercially.18
TDS-Cl is a liquid making it somewhat easier to handle this airsensitive material than the corresponding solid TBS-Cl. The TDS
group provides protection for alcohols, amines, carboxylic acids,
and thiols. In the even of low reactivity the more reactive triflate
derivative, TDS-OTf, can be used. Reaction of TDS-Cl with alcohols
is carried out under conditions like those for the TBS-Cl silylations.

O

Common reagents for this reaction are trimethylchlorosilane,
TMCS, and hexamethyldisilazane, HMDS, although others areused depending on the leaving group from silicon. The reaction oftrimethylchlorosilane with an alcohol liberates HCl, which must be
trapped. This is normally achieved with the presence of a tertiaryamine. Hexamethyldisilazane reacts with alcohols to give ammonia
as a byproduct. This can be simply led away from the reaction
or trapped. The reactions of HMDS in the absence of a catalyst
are oftentimes quite slow. Common catalysts are TMCS, lithium
salts, ammonium chloride among others. Trimethylsilylation
reagents which liberate neutral byproducts are bis(trimethylsilyl)
trifluoroacetamide, bis(trimethylsilyl)acetamide and others aslisted in Table 2.

The Triisopropylsilyl, TIPS, GroupPRO

The tert-Butyldiphenylsilyl, TBDPS, GroupIf greater reactivity is necessary one can turn to the morereactive species such as the (dimethylamino)trimethylsilane,cyanotrimethylsilane, and trimethylsilyl triflate.

Deprotection of the TMS group is usually accomplished bymild hydrolysis in aqueous or alcohol medium. Trimethylsilyl
ethers can be deprotected in the presence of TES ethers.11,12

The Triethylsilyl, TES, Group

The triethylsilyl protecting group is primarily used for theprotection of alcohols, although other functional groups can be andhave been protected as their TES derivatives. The stability of thetriethylsilyl ethers falls between those of the corresponding TMS
and TBS ethers. The most common reagent for the introduction of
the TES group is triethylchlorosilane and the methods used for thereaction are those that are employed for TMCS. TES ethers can beselectively removed in the presence of TBS ethers.13

The tert-Butyldimethylsilyl, TBS, GroupThe TBS group is used for the protection of alcohols10,
amines14, thiols14, lactams14, and carboxylic acids14. The TBS groupis commonly introduced via tert-butyldimethylchlorosilane,
although other, more-reactive derivatives, such as the triflate, can beused. Because of its steric bulk the reaction of an alcohol with tert-

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The TBDPS group has greater steric demands than the TBS
group and, therefore, tends to form more stable silylated species thantheir corresponding TBS analogs.19 Alcohols, amines,20 amides,21hydroxamic acids,22 and carboxylic acids23 are among the groups
that have been blocked by the TBDPS group. Deprotection is usually
through the reaction with tetrabutylammonium fluoride, TBAF.

Phenyl-Substituted Silyl Groups

Phenyldimethylsilyl, diphenylmethylsilyl, and triphenylsilylgroups are also used to protect alcohols. While these reagents bringno special steric advantages to the blocking agent picture they dobring an electronic one. Phenylsilyl ethers are more stable towards
acid with an increase in stability following an increase in phenyl
substitution.24 A similar stability towards alkaline hydrolysis is
not seen. The stability of the diphenylmethylsilyl ethers has been
carefully studied.25 Introduction of the phenyl-substituted silylgroups is through their respective chlorides.

Other Trialkylsilyl Groups
In principle any trialkylsilyl group can be considered a silyl
blocking agent, though not all are, of course, used in that manner.
The more notable ones can be found in the Tables along withpertinent information concerning reactivity and stability.

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Special Silicon-Based Blocking AgentsThe commonly employed silicon-based agents for theprotection of diols and related species such as diamines andhydroxyacids are shown below.

Diisopropylchlorosilane has been shown to provide
both protective and stereoselective reactive properties in thesilylation/reduction of β-hydroxyketones.35 The chloromethyldimethylchlorosilane has been very effectively used in the analyticalarena taking advantage of the greater electron capture detection of
the chlorine atom.36,37 Suitably substituted alcohols can be reactedwith bromomethyldimethylchlorosilane to silylate the hydroxyl,
followed by a radical cyclization and functionalization of thesilicon-carbon bond to provide diols, or α-methyl alcohols.38,39
The (pentafluorophenyl)dimethylsilyl group has been successfully
used in the derivatization of hydroxysteroids, which can bedetected at femtogram levels.40 Carboxylic acids are protected as
their trimethylsilylethyl esters with the advantage of being readilycleaved with the elimination of ethylene.41

Me

Me

Et

Ph

Et

Ph

Si

Si

Si

DMS

DES

DPS

Me
Si

Me
Si

Me

Si

Me

STABASE

Di-tert-Butylisobutylsilyltrifluoromethane sulfonate
In 2011 professor E. J. Corey and coworkers (Org. Lett. 2011,
13, 4120.) reported a new very sterically hindered and stableorganosilyl protecting group, Di-tert-Butylisobutylsilyltrifluorom
ethane sulfonate, given the acronym BIBS. This novel organosilane
is readily prepared in good yield in a process that Gelest has scaled
up to commercial quantities. The Corey group has shown that thestable protection of alcohols, phenols, primary and secondaryamines, carboxylic acids as well as silyl enol ethers is possible.
In addition impressive selectivity of the protection of a primaryamine versus an aniline, a carboxylic acid versus a primary alcohol,a primary amine versus a primary alcohol and a silyl enol ether
versus a phenol was demonstrated.

O

DTBS

F

Bridging Blocking Agents

Si

Si

PR
O

Si

BSB

DIPS

Me
Me

Si

O

Si

TMDS

Me

i

Me

i

Pr
Pr

Si

O

Si

i

Pr

i

Pr

TIPDS

R1R 2NCO 2-BIBS

The use of various silylene units such as the dimethyl-(DMS)26,
diethyl-(DES)27, diisopropyl-(DIPS)28, di-tert-butyl-(DTBS)28,29
and diphenylsilylene(DPS)30 groups have been employed forthe protection of diols, hydroxyacids, diamines, and similar
difunctional systems. Here again, as expected, the more hindered
the silicon center the more stable the silylated species becomes.
Thus, the DTBS ethers of diols are hydrolytically stable between
pH 4 and pH 10. The 6- and 7-membered ring systems from 1,3and 1,4-diols, respectively, are more stable than the 5-memberedrings that result from the reaction of 1,2-diols. The disilylethane
derivative, tetramethyldisilylethane (STABASE) is used for theprotection of primary amines, including those of the esters ofaminoacids.31 The tetraisopropyldisiloxanyl (from TIPDS) unit
is highly useful for the protection of the 3’,5’-dihydroxy units ofnucleosides.32 The benzostabase group can be used to protect
primary aliphatic and aromatic amines.33,34
74

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ArO-BIBS

R1R 2NH
CO2

RO-BIBSSi OTf

RCO 2-BIBS

R1NH 2

R1NH-BIBS

BIBSOTf

Deprotection

The clean deprotection or desilylation of a silyl-protectedfunctional group is essential to its utility. The relative stability
correlation of trisubstituted silyl ethers towards hydrolysis underacid catalysis is TMS ≅ DMPS ≅ MDPS < TES ≅ DMIPS < TPS <TBS < TDS < TIPS < TBDPS < DTBMS.42 The relative stabilities
towards hydrolysis in base is TMS ≅ DMPS ≅ MDPS < DMIPS ≅TES < TBDPS ≅ TBS < TDS < TIPS < DTBMS.42 Denmark andcoworkers25 have looked at the steric and electronic effects on thedesilylation of silyl ethers in acid and base.
In addition the long-range structural effects on the desilylationof silyl ethers has been investigated.43

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Enabling Your Technology

Table 1
Resistance of Silylated Alcohols to Chemical Transformations
t1/2 for Si-OR bond scission at room temperature
Blocking group

HCl -THF

KF methanol

CH3MgBrin ethern-Butyl lithium

LAH -THF

Pyridinium Chlorochromate

n-butanol<15 min

2 min

48 hr

2 hr

30 min<30 mincyclohexanol<15 min2 min>48 hr

3 hr

1 hr<30 min<15 min

24 hr>48 hr

50 hr

24 hr

<30 min<15 min

2 hr

no reaction

24 hr

1 hr

<30 mincyclohexanol<15 min

20 hr

no reaction>48 hr

2 hr<30 mint-butanol<15 minno reaction

no reaction

no reaction

no reaction

1 hr

cyclohexylMe2Si-

cyclohexanol< 15 min10 hr

no reaction

36 hr

2 hr

<30 min

Pr(CH3)2Si-

cyclohexanol

10-30 min24-30 hrno reaction>60 hr

3 hr<30 minn-butanol>3 hr

no reaction

no reaction

no reaction

25 hr

10 hr

cyclohexanol>3 hr

no reaction

no reaction

no reaction>50 hr>20 hrt-butanol

no reaction

no reaction

no reaction

no reaction

no reaction>20 hrn-butanol

16 hr

no reaction

no reaction

no reaction>30 hr22 hrcyclohexanol

30 hr

no reaction

no reaction

no reaction

no reaction

50 hr

t-butanol

no reaction

no reaction

no reaction

no reaction

no reaction

no reaction

cyclohexanol

no reaction

no reaction

no reaction

no reaction

no reaction>72 hrn-butanol

no reaction

100 hrno reaction

no reaction

no reaction

no reaction

cyclohexanol

no reaction

no reaction

no reaction

no reaction

no reaction

no reaction

t-butanol

no reaction

no reaction

no reaction

no reaction

no reaction

no reaction(C2H5)3Si-i

BuMe2Si-t

HexylMe2Si-

t

Pr3Si-

PROi

O

t-butanol
n-butanolF(CH3)3Si-

Substrate

BuPh2Si-t

Product
SIT8510.0
Trimethylchorosilane, TMCS
[75-77-4]

StructureSi

SIT8430.0
Trimethylbromosilane, TMBS
[2857-97-8]

SIT8620.0
Trimethylsilyltrifluoromethanesulfonate TMSOTf[27607-77-8]

Cl

Si

SIT8564.0
Trimethyliodosilane, TMIS
[16029-98-4]

Table 2
Trimethylsilyl Blocking Agents

Br

Si

I

F

F
O
Si

S
O

F
O

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Comments
Reacts in presence of HCl acceptor.6 Will silylate strong
acids with expulsion of HCl.119 High purity grade available,
SIT8510.1. Protects hindered alcohols w/ Mg/DMF.120

Pricing
25g ¥3,400
750g ¥14,400
3kg ¥60,000
15kg inquire

More reactive than SIT8510.0 Less reactive, but more Less
reactive, photolytically stable than SIT8564.0.121

25g ¥7,600
2.5kg ¥189,000

Extremely reactive silylating agent.121 Used with HMDS for
25g ¥8,300
hindered alcohols.122 Forms enol silyl ethers with ketones and 100g ¥31,800
SIT8620.0.123
2.5kg ¥260,000

Strong silylating agent for C- or O-silylations.123,124 Reacts w/
nitroalkanes to give N, N-bis (trimethylsiloxy)enamines.125,126
These are useful reagents.127

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25g ¥8,600
100g ¥28,400
2.5kg ¥230,00075

Table 2 (continued)
Si

H
N

Si

Si

N

F

N

Si

Si

O

Si

N

Si

Si
O
N

F
F

F

Si

More reactive than SIH6110.0. Releases neutral acetamide
upon re-action. Both silyl groups used. Used for silylation in
analytical applications.133 Reactions catalyzed by acid. Forms
enol silyl ethers in ionic liquids.134
More reactive than BSA (SIB1846.0). Commonly used
for analytical purposes. Reacts very well in DMF or
acetonitrile.14,133

PR
O

SIH6110.0
Hexamethyldisilazane, HMDS
[999-97-3]
SID3605.0
Dimethylaminotrimethylsilane,
TMSDMA[2083-91-2]
SID3398.0
Diethylaminotrimethylsilane,
TMSDMEA[996-50-9]
SIB1846.0
Bis(Trimethylsilyl)acetamide,
BSA[10416-59-8]
SIB1876.0
Bis(Trimethylsilyl)trifluoroacetamide, BSTFA[25561-30-2]

N

Releases toxic HCN upon reaction. Extremely reactive
25g inquire
silylating agent for acids and alcohols. Amines and thiols react 1.5kg inquire
more slowly than acids and alcohols. Does not react withamides, ureas or carbonates.128 Silylates amino acids.129*includes liquid dispensing cylinder
Releases ammonia upon reaction. Both trimethylsilyl groups
25g ¥5,600
used. Silylations catalyzed by SIT8510.0 and other reagents.6 1.5kg ¥23,200
14kg ¥130,000
Similar to SID6110.0 and SID3398.0 Liberates Me2NH upon
25g ¥8,000
reaction. Liberates Me2NH upon reaction. Silylates urea100g ¥20,100
formaldehyde polycondensates.130 Silylates phosphorous
2kg ¥207,000
acids.131
Releases diethylamine upon reaction. Moderately strong
25g ¥7,200
silylating agent. Selectively silylates equatorial over axial
100g ¥27,300
hydroxyls.132
2kg ¥207,000

O

SIT8585.0
Trimethysilyl Cyanide
TMSCN[7677-24-9]

SIB1878.0
Bis(Trimethylsilyl)urea,BSU[18297-63-7]
SIM6576.0
N-Methyl-N-Trimethylsilyl-Trifluoroacetamide MSTFA[24589-78-4]
SIT8590.0
Trimethylsilylimidazole, TMSIM[7449-74-3]

Si

76

N
H

Si

Silylation reagent similar to SIB1846.0, but with liquid,
volatile byproduct

N
H

O

F

N

F

N

Si

O

50g ¥4,500
250g ¥19,800
10kg ¥245,000
25g ¥22,500
100g ¥65,500

SiPowerful silylating agent for alcohols. Does not react withaliphatic amines.6

25g ¥6,100
100g ¥21,400
2kg ¥170,000

Reacts with 1°, 2° and 3° alcohols.137

25g ¥21,500

By-product is acetone. Good for alcohols and acids.138
Provides acetonides with diols.115

5g ¥25,700

Used for silylation of acids, alcohols, thiols, amides andketones.139,14025g ¥28,400
100g ¥84,600

Used for 3° alcohols and enolizable ketones.141,142

10g ¥27,300

O

O

Si

O

O

Si

O
O

25g ¥18,800
100g ¥53,300
2kg ¥275,000

F

N

SIT8572.0
2-Trimethylsiloxypent-2-en-4-one[13257-81-3]
SII6460.0
Isopropenoxytrimethylsilane,
IPOTMS[1833-53-0]
SIM6496.0
1-Methoxy-1-trimethysiloxy2-methyl-1-propene[31469-15-5]
SIM6571.5
Methyl Trimethylsilylacetate[2916-76-9]Si

By-product is urea. Used for alcohols and acids.135 Used insynthesis of penicillins and cephalosporins.136O25g ¥8,200
100g ¥18,800
2kg ¥156,000

Si

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Table 2 (continued)

Product
SIT8250.0
Triethylchlorosilane[994-30-9]

Si

O

Si

Cl

Si

O

Si

N

N+

N-

SID3603.0
N,N-Dimethylaminotriethylsilane[3550-35-4]

Si

Neutral propylene by-product. Acid-catalyzed silylations.
Used for acids146 and thiols.147 Employed in thesynthesis of N-trimethylsilylpyridinium triflate an active
trimethylsilylating agent.148
Hydroxyl group protecting unit. Deprotected with fluoride
ion.149 Used to protect carboxylic acids.150,151 Protects
anomeric center of pyranosides.152 Used for the introductionof hydroxymethyl group.153

25g ¥13,800
100g ¥36,800
1.5kg ¥203,000

Cl

SIB1937.0
n-Butyldimethyl(dimethylamino)silane[181231-67-4]
SIT8335.0
Triethylsilyl-trifluoromethanesulfonate[79271-56-0]
SII6462.0
Isopropyldimethylchlorosilane[3634-56-8]
SIB1935.0 and SIB1935.2
tert-Butyldimethylchlorosilane[18162-48-6]

SIB1935.4
tert-Butyldimethylchlorosilane,
3M in THF
[18162-48-6]
SIB1935.5
tert-Butyldimethylchlorosilane,
2.85M in toluene[18162-48-6]

5g ¥27,800
25g ¥101,000
10g ¥12,500
50g ¥39,500

Comments
Stability of ethers intermediate between TMS and TBS
ethers.154 Good for 1°, 2°, 3° alcohols. Can be cleaved inpresence of TBS, TIPS and TBDPS ethers.10

Pricing
10g ¥6,800
50g ¥18,800
2kg ¥122,000

Very reactive triethylsilyl protecting group. Dimethylamine
by-product produced.

50g ¥41,900

PR
O

N

5g ¥14,100

Table 3
Trialkylsilyl Blocking Agents

StructureSi

Silylation of ketones, alcohols, acetylenes, thiols under the
influence of fluoride ion.143-145d

O

SIT8588.5
2-(Trimethylsilyl)ethoxymethylchloride, 95%, SEM-Cl[76513-69-4]
SIT8580.0
Trimethylsilyl Azide[4648-54-8]

OF

SIE4901.6
Ethyl Trimethylsilylacetate[4071-88-9]
SIA0555.0
Allytrimethylsilane[762-72-1]

Reactive aminofunctional organosilane.

10g ¥15,400
50g ¥53,800

More reactive than SIT8250.0. Useful for more hinderedalcohols.155

10g ¥11,100
50g ¥38,700
2kg ¥385,000

Ethers comparable in stability to those of TES-protected
ethers.156

25g ¥20,400
100g ¥58,600
2kg inquire

Excellent for 1° and 2° alcohols. Silylation catalyzed byimidazole. Stable to many reagents.22 Can be selectively
cleaved in presence of acetate, THP and benzyl ethers157
among others.158

25g ¥8,300
100g ¥20,300
750g ¥191,400
2kg inquire
100g ¥18,600
2kg ¥99,900

Si

N

F

O
S

F

F

Si

O

O

Si

Cl

Si

Cl

Si

Cl

Si

100g ¥19,400
2kg ¥99,900
750g inquireCl

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77

Table 3 (continued)
SIB1938.0
tert-butyldimethylsilane[29681-57-0]
O

F
F

S

5g ¥13,500
25g ¥43,800

O

More reactive than SIB1935.0159 Converts acetates to TBS
ethers.160

10g ¥18,800
50g ¥65,000
2kg inquire

Employed in silylations for analytical purposes.161,162

5g ¥26,800

Reactive sterically hindered orgaosilane.

1g ¥20,400

Si

O

F

O

F

Si

N

F

F

F

SIB1967.0
tert-Butyldimethylsilyltrifluoromethanesulfonate[69739-34-0]
SIB1966.0
N-(tert-Butyldimethylsilyl)-N-trifluoroacetamide[77377-52-7]
SIB1964.0
tert-butyldimethylsilylimidazole

Si

Sterically hindered organosilane capable of dehydrogenative76
H coupling.

Si
N

Si

H

Si

Sterically hindered neohexylchlorosilane protecting group.

25g ¥12,500
100g ¥32,600

Used in selective silylation of internal alcohols or diols.163
Employed in the o-vinylation of phenols via silylation/
direction sequence.164

10g ¥33,200
50g ¥122,300

ON

SID4065.0
3,3-Dimethylbutyldimethylchlorosilane[56310-20-4]
SID3120.0
Di-tert-butylchlorosilane[56310-18-0]

Cl

PR
O

Cl

SIT8384.0
Triisopropylchlorosilane[13154-24-0]

SIT8387.0
Triisopropylsilyl-trifluoromethanesulfonate[80522-42-5]
SIT8384.5
Triisopropyl(dimethylamino)silane[181231-66-3]
SIT8385.0
Triisopropylsilane[6485-79-6]

F

O

F

O

F

S

Cl

O

Si

Si

SIT7906.0
Thexyldimethylchlorosilane[67373-56-2]

More reactive than SIT8384.0.167 Used to make Tsoc,(triisopropylsilyloxycarbonyl) protecting groups for amines.168

10g ¥16,400
50g ¥55,400
2kg inquire

Reactive sterically hindered organosilane.

10g ¥27,800

N

Si

SIA0535.0
Allyltriisopropylsilane[24400-84-8]

78

Si

TIPS ethers more stable than TBS ethers.24 Protects carboxylic 25g ¥11,200
acids.165 Used in synthesis of free-4-hydroxylhexopyranoses.166 100g ¥36,700
2kg ¥183,000

H

Si

Si

Cl

Silylates strong acids with loss of hydrogen.167 Silylates 1°
alcohols selectively.25

25g ¥10,000
100g ¥22,600
1.5kg ¥220,000

Reaction w/ triflic acid and then pyridine gives the activetriisopropylsilylating agent, triisopropylsilylpyridinium
triflate.148

5.0g ¥36,300

Ethers show stability similar to or greater than the TBS ethers. 25g ¥17,200
Used for 1° and 2° amines.29,169 Selective for 1° alcohols.169
100g ¥48,300
750g inquire

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Si

O

H
Si

H

Si

Highly sterically-hindered blocking agent useful for
protection of alcohols, amines, acids, enol silyl ethers.37

10g ¥47,200

Highly sterically-hindered silane for potential
dehydrogenative silylation.37,76

10g ¥51,200

Highly sterically-hindered silane for potential
dehydrogenative silylation.

10g ¥25,200

Table 4
Phenyl-Containing Blocking Agents

Structure
Si

Comments
Forms more stable ethers than TBS ethers.31 Used to protect
phenols,170 amines,171 carboxylic acids, and amides.172,173

Cl

Used in analytical procedures.175

Si

Cl

PR
O

SIP6728.0
Phenyldimethylchlorosilane[768-33-2]
SID4586.0
Diphenyltetramethyldisilazane[3449-26-1]
SIP6729.0
Phenyldimethylsilane[766-77-8]
SID4552.0
Diphenylmethylchlorosilane[144-79-6]

SO

SID3258.0
Di-tert-butylmethylsilane[56310-20-4]

Product
SIB1968.0
tert-Butyldiphenylchlorosilane[58479-61-1]

FF

SID3224.0
Di-tert-butylisobutylsilane
BIBS-H[1314639-86-4]

F
O

O

SID3226.0
Di-tert-butylisobutylsilyltrifluoromethanesulfonate, BIBS
[1314639-86-5]

Table 3 (continued)

F

Si

H
N

Si

Si

H

Reacts with alcohols in presence of Wilkinson’s catalyst.177
Stability versus other silyl ethers studied.60

Cl

Si

SIT8645.0
Triphenylchlorosilane[76-86-8]

Si

SIA0575.0
Allyltriphenylsilane[18752-21-1]

Cl

Si

SID4552.5
Diphenylmethyl(dimethylamino)silane[68733-63-1]
SIB1026.4
1,3-Bis(4-biphenyl)-1,1,3,3-tetramethyldisilazane

Similar to SIP6728.0. Emits ammonia upon reaction. Usedfor silylation of capillary columns.176

Si

Si

H
N

Pricing
10g ¥5,000
50g ¥15,600
2kg ¥295,000

25g ¥9,700
100g ¥25,700
2kg ¥116,400
5g ¥13,000
25g ¥41,600
2kg inquire
25g ¥14,600
100g ¥39,500
2kg inquire
25g ¥8,600
100g ¥31,000
2.5kg ¥84,400

Ethers hydrolyze comparably to TMS ethers in base and 4
times slower in acid.178 Can lead to solid products.179

25g ¥17,800
100g ¥50,100

Reaction w/triflic acid and then pyridine gives
triphenylsilylpyridinium triflate, an active triphenylsilylating
agent.148

2.5g ¥17,200

More reactive than SID4552.0. Liberates dimethylamine uponreaction.

25g ¥16,200

Reactivity and stability similar to that of SID4586.0

10g ¥44,300

N

Si

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Table 5Specialty Silicon-Based Blocking Agents

Comments
Ethers detectable at femtogram level by ECD. Forms excellent
derivatives for mass spectral analysis.117,118,180,181

Pricing
5g ¥46,400

Used for protection of acids.182,183

10g ¥28,400
50g ¥103,200

Can form cyclic products with appropriate 1,2-difunctional
substrates.184 Used in analytical applications for greater ECD
detectability.185

25g ¥7,700
750g ¥47,700
2kg ¥399,000

Has been applied to the synthesis of diols and β-methyl
alcohols.186,187

25g ¥20,400
100g ¥58,600

Silylates and reduces β-hydroxy ketones selectively.188
Photochemically removable.189

5g ¥14,100
25g ¥45,900

SIH5840.4(Heptadecafluoro-1,1,2-2-tetrahydradecyl)-dimethylchlorosilane[74612-30-9]
SIB1815.5
Bis(tridecafluoro-1,1,2,2-tetrahydrooctyldimethylsiloxy)-methylchlorosilane
SIB1837.0
Bis(trimethylsiloxy)dichlorosilane[2750-44-9]
SIC2266.8
7-[3-(Chlorodimethylsilyl)propoxy]-4-methylcoumarin[129119-77-3]
SIC2056.2(-)-Camphanyldimethylchlorosilane[684284-12-6]
SID4074.0(Dimethylchlorosilyl)methyl-7,7-dimethylnorpinane[72269-53-5]
SIM6472.7(-)-Menthyldimethylsilane

Potential blocking agent for fluorous phase synthesis.190

5g ¥15,100
25g ¥50,100

F

F
Si

PR
O

F

O

Cl

F

Product
Structure
SIP6716.1
FF
PentafluorophenyldimethylchloF
Si Cl
rosilane
FLOPHEMESYL CHLORIDEF
F[20082-71-7]
SIT8589.2
TrimethylsilylethanolSiHO[2916-68-9]
SIC2285.0
ChloromethyldimethylchlorosiCl
Si
lane
Cl
[1719-57-9]
SIB1890.0
Cl
BromomethyldimethylchlorosiBrSi
lane[16532-02-8]
SID3535.0
H
DiisopropylchlorosilaneSi[2227-29-4]

7

F

F

F

F

F

Si

5

F

O

Si

Potential blocking agent for fluorous phase synthesis.190

5g ¥49,900

Sterically-hindered for the protection of diols

25g ¥34,200

Flourescent tag silicon-based protecting group.116

10g ¥24,700

Chiral silicon-based protecting group.

10g ¥26,800

Chiral silicon-based blocking agent.

10g ¥13,300

Chiral silicon-based protecting group via dehydrogenativesilylation.76

5g ¥48,500

Cl

2

Si

O

Cl

Cl

Si

O

Si

Cl

Si

O

O

O

Si

Cl

Si
Cl

Si

80

Cl

F

H

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SIH6102.0
Hexamethylcyclotrisilazane[1009-93-4]

Si

N

N

N

Si

N

Si

Si

HN
Si

Si

Si

Cl

Pricing
500g inquire
2kg inquire

More reactive than SIB4120.0. Reacted with diols,195
diamines,196 and treatment for glass.197

25g ¥11,900
100g ¥31,000
2kg inquire

Similar to SIB1072.0.

50g ¥39,500
2kg inquire

Silylates diols with loss of ammonia. Similar in reactivity to
HMDS.198,199

NH

N
H

SID4510.1
Diphenyldichlorosilane[80-10-4]

25g ¥5,300
100g ¥11,000
2kg ¥42,400

Similar to, but more stable derivatives than dimethylsilylenes.

25g ¥11,900
100g ¥31,000
1kg inquire
10g ¥9,000
50g ¥25,700
1kg ¥203,000

Cl

Cl

Cl

Si

SID3205.0
Di-tert-butyldichlorosilane[18395-90-9]

SID3345.0
Di-tert-butylsilylbis(trifluoromethanesulfonate)[85272-31-7]

SID3534.0
Di-isopropylbis(trifluoromethanesulfonyl)silane[85272-30-6]

Cl

Cl

Si

F

O
O

O

S

F
F

O

SIB1042.0
Bis(dimethylchlorosilyl)ethaneSi
Cl[13528-93-3]
SIT7273.0
Tetraisopropyldichlorodisiloxane Cl Si[69304-37-6]

More reactive than SID3205.0.42 Converts 1,3-diols to cyclic
protected 1,3-diols.207 Reacts w/1,3-diols in preference to
1,2-diols.208

5g ¥17,200
25g ¥44,800

More reactive than SID3345.0. Protects diols209

5g ¥33,700

F

F

F

S

O

5g ¥31,000
25g ¥113,800

F

O

Si

F

F

S

O

Used to protect 1,2-diols,43 and 1,3- diols.205 Forms 4,6-cyclic
di-tert-butylsilylenediyl ethers w/glycopyranosides.206

Cl

O

Si

Forms tethered silyl ethers from diols.42,202,203 Protects 3’,5’hydroxyls of nucleosides, but less effectively than SIT7273.0.204

ClSi

25g ¥6,200
100g ¥10,400
2kg ¥174,000

Reacts with alcohols,200 diols,195 2-hydroxybenzoic acids.201

PR
O

SID3402.0
Diethyldichlorosilane[996-50-9]
SID3537.0
Diisopropyldichlorosilane[7751-38-4]

Cl

Comments
Reacts with alcohols,191 diols,925 and hydroxy carboxylic
acids.193 Employed as a protecting group/template inC-glycoside synthesis.194

F

SIB1072.0
Bis(Dimethylamino)dimethylsilane[3768-58-9]
SIB1068.0
Bis(Diethylamino)dimethylsilane[4669-59-4]

Structure
Cl

O

Product
SID4120.0 and SID4120.1
Dimethyldichlorosilane[75-78-5]

Table 6
Bridging Silicon-Based Blocking Agents

O
O

O

S

F

O

F

F

Cl

Si

O

Si

Cl

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Protection for 1° amines,210,211 including amino acid esters.212

25g ¥9,300
100g ¥22,500

Highly useful for protection of 3’,5’- dihydroxynucleosides.46
Protects 1,2-diequatorial diols.213

5g ¥9,400
25g ¥45,600
2kg ¥307,000

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Table 6 (continued)
H
Si

SIB1048.2
1,3-Bis(chlorodimethylsilyl)-proSi
Cl
pane[2295-06-9]
SIT7087.0
O
1,1,3,3-Tetracyclopentyl-dichloSi
Si
Cl Cl
rodisiloxane

Used to protect anilines,48 amines,188 and amino acids.214

2.5g ¥41,100

Potentially useful silylating agent for diols and related
systems.

5g ¥31,000

Used in the protection of 3’,5’-dihydroxynucleosides.

5g ¥20,700
25g ¥72,400

H

Si

Si

Cl

F

SIB1084.0
1,2-Bis(dimethylsilyl)benzene[17985-72-7]

Table 7
Deprotection Of 1° Silyl Ethers In The Presence Of Other 1° Silyl Ethers9
In the Presence of:
1° TMS
1° TMS

1° TIPS

1° TBS

1° TBDPSNaHCO3367

NaOH/EtOH132
MCM-41368

NaOH/EtOH132
Cu(NO3)2133, Ce(NO3)3133[Bu2(NCS)Sn]2O134
BiCl3369 Bi(O2CCF3)3369
K2CO3370, MCM-41368

NaOH/EtOH132
Cu(NO3)2133
Ce(NO3)3133
HCl132,135

TFA371
H2/Pd-C372
MCM-41368

HF/py136
TCNQ/MeCN/H2O137
DDQ/MeCN/H2O137,138
CSA373, IBX/DMSO374
MCM-41368, H2/Pd-C372

SiF4/CH2Cl2139
DDQ/MeCN/H2O137,138
MCM-41/MeOH140
CSA375,376, H2/Pd-C372,377
MSOTf/HCO2DPM/SiO2378
ZnBr2/H2O379

PRO

1° TES

1° TESO

Deprotection of:

1° TIPSTMSOTf/HCO2DPM, SiO2378

1° TBS

HCl/EtOH132
H2SiF6/tBuOH141,142
NaOH/EtOH15
Cyclohexene/PdO143
Alumina144
H2SO4380, CSA381,382
PPTS383, H2SiF6384
H2/Pd-C372,377
TMSOTf/Et3N/MeOH385
CeCl3•7H2O/NaI386
Decaborane387

TsOH/THF/H2O145
Cl2CHCO2H146,147
TBAF148, TBSOTf149
HOAC388, PPTS389
TBAF390, DDQ391
MnO2/AlCl3392
DMSO/H2O393
H2/Pd-C372

HCl132,150,394,395
HOAc/THF/H2O19,151-154
CSA/MeOH155,156,164
PPTS157,158,399-403, TsOH159
MeOH/CCl4160, Cu(NO3)2133
Ce(NO3)3133, Cyclohexene/PdO143
Alumina145, SiF4/CH2Cl2139
DDQ/MeCN/H2O137,138
AcBr/CH2Cl2161, TMSOTf162
HF-py/THF163, PPTS/EtOH164
H2SO4396, TFA397.398, TsOH404, 405
CSA406-408, LL-ALPS-SO3H409
AcCl/MeOH410, Zn(BF4)2411
Cu(OTf)2/Ac2O412, InCl3413
CeCl3•7H2O/NaI386
Ce(OTf)4/THF/H2O414
PdCl2(MeCN)2415, I2/MeOH416
Br2/MeOH417, IBr418
LiCl/DMF419, CCl4/MeOH420
CeCl3•7H2O421, ZnBr2/H2O379
ZrCl4/Ac2O422, HF-pyr423,424
I2/KOH400, H2/Pd-C372,377
Bu4NOH/MeOH425, TBAF426
TMSOTf/HCO2DPM/SiO2378
Decaborane387

1° TBDPS

KOH427

TBAF/HOAc166,428,429
TBATB/MeOH165
NaOH429-431, Bu4NOH428

LiAlH4167
HF-py432, TBAF390

82

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Table 8
Deprotection Of 1° Silyl Ethers In The Presence Of 2° Silyl Ethers9
Deprotection of: In the Presence of:
2° TES

2° TIPS

1° TMS

Rexyn 101
K2CO3/MeOH169
Alumina170
HOAc433
Swern
conditions434

NaHCO3Swernconditions434

1° TES

Swern
conditions434

HOAc172,437,438
CSA384, PPTS435
HBr/PPh3436
HF-pyr367,
TBAF/HOAc439,440
TBAF441-446 KF447
LiOH367
Swern
cond.434,448,449
CrO3-2pyr450
HF-pyr451

1° TIPSHF-pyr373

2° TBDPS

HOAc/H2O/THF172,174
RMgX175, HCl454, HBr/PPh3436
CSA384,451,455, PPTS456, TFA457,458 HF/
pyr459,460, HF447, TMSOTf/i-Pr2EtN461,
TBAF384, TBAF/HOAc439, KF447, Swern
cond.462

SiF4/CH2Cl2139
DDQ/MeCN/H2O137,138
TsOH448
citric acid463
TMSOTf/i-Pr2NEt461
TMSOTf/Et3N/MeOH385

171

HOAc172
TMSOTf/i-Pr2NEt452
HF-pyr367,453
LiOH367

TBAF176 , CSA464
TBAF453, SiF4465
POCl3-DMF466(TfO)2O-DMF466
CBr4/MeOH467
CAN/SiO2468

TFA/H2O/THF177

TFA/H2O/THF178
CSA469HCl15,179,470,471
HOAc 180,181,473-477
TsOH/PPTS182
HF/py183,184
NaOH15
Cyclohexene/PdO143
TsOH185,186
H2SO4472
HOAc87-91
CSA381-383,470,478-481
PPTS482
TsOH483
NH4Cl/MeOH484
HF-pyr479,480,485-487
TBAF488 polymeric
DCKA617
TBAF•3H2O384

HCl187,489, HOAc172,490-492
TFA/H2O/THF188,189
CSA/MeOH156, PPTS190
Acid Amberlite191
NH4F192, HF/MeCN193,194
H2SiF6/tBuOH142, HF/py195
H2/wet Pd196, AgOAc197
NBS/DMSO198, TBAF199,200
MeOH/CCl4160, NaOH15
Cyclohexene/PdO201, Alumina141,202
CAN/iPrOH203, POCl3/DMP204(CF3SO2)2)/DMF204
CSA381-383,401,479,480,493-502
PPTS389,401,496,497,519-544
TsOH404,405,510
TsOH/Bu4NHSO4511, TFA398,512-516
acidic CHCl3517, Cu(OTf)2/Ac2O412
BCl3518, HF-py479,480,485-545, HF546,547
H2SiF6548, NH4F549, TBAF/HOAc452,550,564
TBAF551-555, TAS-F556, CBr4-hν557,558,
Jones rgt.523 LiBr/18-C-6559
CAN/i-PrOH560, POCl3-DMF466,561(TfO)2O-DMF466 H2/Pd-C372, QFC562
Bu4NBr3/MeOH425, MnO2/AlCl3392
Oxone563, CAN/SiO2468

HOAc/H2O/THF205,206
TsOH207-209
PPTS158,210,211
TBAF212
HF/py113
HF/Et3N214
IBr/DCM81
HCl179
HOAc758
CSA407,408,759,760
PPTS761-764
TsOH764-766
HF-pyr696
HF469,767-769
H2SiF6713
TMSOTf/Et3N/MeOH385
Cu(OTf)2/Ac2O412
Zn(OTf)2411
K2CO3466
NaOH752
TBTU770
QFC polymeric
DCKA618
InCl3413

NaH/HMPA215
HF-pyr568
KOH/18-C-6569

NaH/HMPA218 , NaOH217
KOH/MeOH218
TBAF199,219,220,524,529,576
NH4F193,570,571, NaOH/DMPU567
KOH/18-C-6569
TBAF/HOAc428,519,526,565, 568,566,572-575
TAS-F577, NaH/propargyl alcohol395

HF/py223
alumina144, CSA578
HF-py432,579, NH4F570
TBAF469,580
POCl3-DMF466(TfO)2O-DMF466

PRO

1° TBS

2° TBSBF3OEt2

367

O

168

F

2° TMS

1° TBDPS

TBAF/
HOAc565,566
NaOH/DMPU567

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Table 9
Deprotection Of 1° Silyl Ethers In The Presence Of 3° Silyl Ethers9
Deprotection of:

In the Presence of:
3° TMS

1° TMS

3° TES

3° TIPS

3° TBDPS

Amberlyst-15583
TBAF/HOAc440

HOAc771

PPTS

1° TES

HF/py235,479,525,533,587
CSA376,586 , PPTS435

1° TIPSTBAF235 SiF4224
HF

584,585

1° TBDPS

CSA
HF-pyr479,525,533,587

TBAF227,543,772
TBAF/HOAc588
CSA219,228 407,408,773
NH4F41 , H2SiF6142
SiF4/CH2Cl2139
MeOH/CCl4160HF-py544
oxone563

376,581,586

F

1° TBS

3° TBS224

TBAF/HOAc566

TAS-F774

Deprotection of:

In the Presence of:

2° TMS

Amberlyst 15168

1° TES

1° TIPS

1° TBS

2° TES

HF/py225

1° TBDPS

HCl229
K2CO3/MeOH230,231
TsOH589
citric acid548
H2SiF6548
NaOH471

HCl232 , TsOH233
Acetone/Me2C(OMe)2/CSA234
PhSeCl/K2CO3235, TBAF236
PPTS237,238 , Alumina170
K2CO3/MeOH239, HOAc590
CSA591, TsOH589,592,594
BF3-OEt2590, TMS-OTf531

TFA177
H2SiF6/HF/H2O240
HCl595
HOAc469
CSA380,451
PPTS596
H2SO4380
Ph3P-HBr380
HF-pyr367,384,453
HF-Et3N597

DDQ/MeCN/H2O138
HCl/py241
NH4Cl242,243
TBAF/THF/
NH4Cl(s)242
HF-py370
I2/Ag2CO3598,599
Pd/C, MeOH600
H2, Pd/C372

HCl135,234,520,529,603,604
HOAc245,395 , Cl3CCO2H246
TsOH247,382,602-604, HF/MeCN248,249
PhSeCl/K2CO3235, TBAF156,599,607
DDQ/MeCN/H2O138
SiF4/CH2Cl2139
CSA/CHCl3/MeOH250
CSA601, PPTS164,602
H2SO4607, BF3-OEt2382,602
Et3N-HF608
HF-pyr609,2,4,4,6-tetrabromo2,5-cyclohexadienone/PPh3611
H2, Pd/C612, ZnBr2/H2O379

H2SiF6/HF/H2O208
CSA596

DIBAL-H251
MnO2/AlCl3392

HCl15,252 , HOAc/H2O/TH253,254
TsOH255,256, PPTS158,257,432,613
BF3OEt2258 , TMSOTf162
HF/MeCN188 , TBAF155
SiF4/CH2Cl2139, CSA/MeOH164
H2SiF6569, TMS-OTf/Et3N385
TMS-OTf432,614, Cu(OTf)2/Ac2O412
InCl3413, LiAlH4615,616, IBr775
P2O5/(MeO)2CH2405, LiCl/DMF419
polymeric DCKA618
ZnBr2/H2O379, Zn(BF4)2411

TBAF464PRO

1° TMSO

Table 10
Deprotection Of 2° Silyl Ethers In The Presence Of 1° Silyl Ethers9

2° TIPS
2° TBS

2° TBDPS

84

NaH/HMPA259
TBATB/MeOH165

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Table 11
Deprotection Of 2° Silyl Ethers In The Presence Of 1° Silyl Ethers9

2° TMSIn the Presence of:
2° TMS

2° TESTBAF
SiO2-Cl/ NaI776

HF-pyrTBAF446
KF567

Citric Acid/MeOH
TBAF/HOAc262,263
FeCl3264
TBAF464
KF447
NaOH471
H2SiF6548

HOAc13,275
TBAF276,436,498
TsOH632
TFA633,634
HF-py533,579
TBAF/ HOAc439(NH4)HF2635
KF447
NaOH/DMPU567

TFA177,277,278
HOAc279-281
PPTS11,479,636,
MoO5/HMPA272,283
WO5/HMPA282,283
HF-py/py-THF284
H2SO4380 TFA637
HF-py367,638,639
Zn(OTf)2/EtSH656
NH4F637
Amberlyst-15641

260

2° TBS

2° TBDPS

HCl , TsOH
HOAc/H2O/THF268
PPTS269,622, HF/Et3N270
Citric Acid/MeOH271,272
Cu(NO3)2133, Ce(NO3)3133
DDQ/wet EtOAc273
K2CO3/MeOH239
HOAc620,621, TsOH594, CSA623
HF-pyr533,582, HF/Et3N624
BF3-OEt2625,626, K2CO3627-629
TBAF630, KF447,567

TBAF274
Cu(NO3)2133
Ce(NO3)3133
K2CO3628,629
NaIO4631

HOAc/H2O/THF278
TFA177,277,278,633,634,652,
PPTS11,285,286,613,623,646,651,683
HF/MeCN287
HF/py287,288,384,437,454,533,609,582,606,653,654
DDQ/MeCN/H2O138
MoO5/HMPA282,283
WO5/HMPA282,283
PTSA/MeOH289
TfOH/H2O-THF290
TBAF/THF291
PPTS/MePH292
MCM-41/MeOH140
HCl642,643, HOAc569,644,645
CSA373,596
TsOH460
HF-Et3N435,655
HF781
Zn(OTf)2/EtSH656, TiCl3(O-iPr)654
TBAF/HOAc439,658
TBAF395,436,498,659,660, KF447
NaOH/DMPU567MCM-41368
PdCl2/CuCl/H2O661

HOAc/H2O/THF293
CSA294
TBAF155,295,665,666
SiF4/CH2Cl2139
DDQ/MeCN/H2O138
HF/MeCN287
HF/py286
HCl662
HOAc469,663
HF664
K2CO3667
NaIO4631

HF536,674

TBAF297,668,669
PTSA/MeOH298
TsOH480
HF/Et3N639, LiAlH4670

NaIO4631

HCl15,671,672
H2SiF6(aq)142
HOAc280,281
HF/MeCN188
TBAF263,300,383
CSA479,673
HF536,674
Et3N-3HF675
H2SiF6/Et3N676

HCl15
CSA302,439,677
TsOH303
HF/MeCN188,304-306
LiAlH4167
KF/H2O307
TBAF274,308-311,499,619,534,535,616,651,683-688,777
H2SO4678, HF-py679,680
HF681
BF3-OEt2682
P2O5/(MeO)2CH2405
MnO2/AlCl3392

TsOH312-314
HCO2H/THF/H2O315
CSA316
PPTS317,318,694,695
HF/MeCN319
TBAF200,320,321
SiF4/CH2Cl2139
Cu(NO3)2133
Ce(NO3)3133
DDQ/MeCN/H2O138
HCl689,690
HOAc691-693
HF-pyr696,697
TMS-OTf432,614
BF3-OEt2698
Sc(OTf)3699
NaIO4631

261

265

266,267PRO

O

2° TES

2° TIPS
533,582

F

Deprotection of:

2° TIPS

2° TBS

HCl299

TBAF654

2° TBDPS

TBAF/THF179

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Table 12
Deprotection Of 2° Silyl Ethers In The Presence Of 3° Silyl Ethers9
Deprotection of:
2° TMSIn the Presence of:
3° TMS

3° TES

TsOH

HOAc , CSAKF447,567, HF-py533,582

267,3222° TES

268

3° TIPS

3° TBS

700

TsOH323, HF-pyr531,579,
HCl642,643, PPTS701
HF-py384,533,582 TBAF436,702

HOAc324
CSA199HCl440
TfOH7032° TIPS
H2SiF6/tBuOH/H2O142

HOAc325
CSA326,327
TBAF328,329
TfOH703
HF704

F

2° TBS

2° TBDPS

Deprotection of:

In the Presence of:
1° TMS

3° TMS

1° TES

1° TIPS

1° TBS

1° TBDPS

PPTS/MeOH330
PPTS778, HCl595

ClCH2CO2H/MeOH146
HCl705, BH3-SMe2706

HCl398, HOAc771
BF3-OEt2707,708, K2CO3398

HF-Et3N597
TBAF709

SiO2331
TBAF/ NH4Cl709

TBAF709PRO

3° TESO

Table 13
Deprotection Of 3° Silyl Ethers In The Presence Of 1° Silyl Ethers9

3° TIPS
3° TBS

LiAlH4326,332

3° TBDPS

Table 14
Deprotection Of 3° Silyl Ethers In The Presence Of 2° Silyl Ethers9

Deprotection of:

In the Presence of:

2° TIPS

2° TBS

2° TBDPS

3° TMS

2° TMS

2° TES

TBAF/HOAc263,711

HCl333,398,705
LiAlH4334
TBAF335
FeCl3336
HF681 , BH3-THF712
TBAF/HOAc711
K2CO3398

HCl224
H2SiF6713,714
K2CO3715

3° TES

TBAF/HOAc711

Et3NHF337,338
HF-Et3N435,655
TBAF/HOAc711

TBAF/HOAc711

TBAF324
TBAF/HOAc711

3° TIPS
3° TBS

3° TBDPS

86

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Table 15
Deprotection Of 3° Silyl Ethers In The Presence Of 3° Silyl Ethers9
Deprotection of:

In the Presence of:
3° TMS

3° TES

3° TIPS

3° TMS

HCl/THF

3° TBS

3° TBDPS

339

3° TES
3° TIPS
3° TBS

CSA3403° TBDPS

ArOTMSIn the Presence of:
1° TMS

1° TBS

2° TBS

Dowex 1-X8
(HO- form)341

TBAF, BiCl3
Bi(O2CCF3)3369, Bi(OTf)3369
PIFA-MK10717
342,343

369

3° TBS

1° TBDPS

TBAF
SiO2718

NaOH132

ArOTBS

NaOH132, K2CO3/Kryptofix
222/MeCN345
TBAF346,347,429,717,719-721
KF/18-crown-6347
KF/Al2O3/MeCN348
KF-Al2O3722
CsF/RX/DMF728, K2CO3724,
CsCO3725, Et3NO726, LiOH727
NaOH/ TBAH728, KOH729
LiOH/RX/DMF730, TMG731
PIFA-MK10717, DMSO/H2O393

K2CO3/Kryptofix
222/MeCN345
TBAF344,346, CSA732
TBAF719,733,734
K2CO3724
CsF/CH3CN735
Et3NO726
NaOH/TBAH728
KOH736
LiOH/RX/DMF730
KF-Al2O3737

PR
O

ArOTES

2° TBDPS

344

O

Deprotection of:

F

Table 16
Deprotection Of Phenolic Silyl Ethers In The Presence Of Alkyl Silyl Ethers9

10% HCl349

TBATB/MeOH165
Zn(BH4)2411
TBAF750,751
NaOH/TBAH728

ArOTIPS

PIFA-MK10717

NaOH754

TBAF753
NaOH754

ArOTBDPSNaOH132
PIFA-MK10717

TMG731

TMG731

Table 17
Deprotection Of Alkyl Silyl Ethers In The Presence Of Phenolic Silyl Ethers9

Deprotection of:

In the Presence of:

ArOTMS

1° TMS

ArOTES

Dowex CCR-2(H+ form)341

ArOTBSArOTIPSArOTBDPS

HCl132

HCl132
Amberlite IR-120 (H+form)351

HCl1322° TMS
1° TES
2° TES

Pd/C/MeOH600

Amberlite IR-120 (H+form)351

ZnBr2/H2O379

ZnBr2/H2O379

ZnBr2/H2O379

PPTS738
BiBr3/Et3SiH779
ZnBr2/H2O379

ZnBr2/H2O379

ZnBr2/H2O379

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Table 17 (continued)
Deprotection of:

In the Presence of:
ArOTMS

ArOTESArOTBS

1° TBSArOTIPSArOTBDPS, TFA , PPTS
HCl
HF/MeCN345,354,355, BF3OEt2345,356
SiF4/CH2Cl2139, MeOH/CCl4160
TMSCl/H2O/CH3CN357
Oxone/MeOHaq358,563
Nafion-H/NaI739, LL-ALPS-SO3H409
AcCl/MeOH410, TMS-Cl/H2O740
TMS-Cl/NaI/H2O740, Me2SBr2739
TBSOTf/THPOAc741
BiBr3/H2O/MeCN742
BiCl3/NaI743, CeCl3•7H2O727
CuOTf, Ac2O412, Sc(OTf)3/H2O699
ZnBr2/H2O379, InCl3413
ZrCl4/Ac2O422, decaborane387
Ce(OTf)4/THF/H2O414
CBr4/MeOH467, I2/MeOH744
CAN/SiO2468, Oxone/MeOH563
H2/Pd-C780

HCl
Amberlite IR-120 (H+form)351
HF-pyr746
BF3-OEt2747
ZnBr2/H2O379
ZrCl4/Ac2O422

HCl132,476
ZnBr2/H2O379
InCl3413
BiOClO4745

TFA359,749, BF3OEt2345,356
HF/MeCN346, PPTS345
SiF4/CH2Cl2139, Nafion-H/NaI739
BiBr3/H2O/ MeCN742, BiCl3/NaI743
CeCl3•7H2O727, ZnBr2/H2O379
InCl3413, Me2SBr2739

TFA749ZnBr2/H2O379

ZnBr2/H2O379

HCl132, CBr4/MeOH467
I2/MeOH744

HCl132, Sc(OTf)3/H2O 696
CBr4/MeOH467, I2/MeOH744

HCl132

HCl132, Sc(OTf)3/H2O699
CBr4/MeOH467, I2/MeOH744

353

345,735

132

OF

132,3522° TBS

1° TIPSPR
O

1°TBDPS

Table 18
Deprotection Of Silylene- And Disiloxane-Protected Diols
In The Presence Of 2° Alkyl Silyl Ethers

Deprotection of:

In the Presence of:

2°TMS

2°TES

2°TIPSDTBS silylene

2°TBS

2°TBDPS

HF/py
KF/MeOH307,362,363
29,122,360,361

TIPDS silioxane

HF/MeCN364

Table 19
Deprotection Of Aryl Silyl Ethers In The Presence Of Another Aryl Silyl Ether

Deprotection of:

In the Presence of:

ArOTMS

ArOTES

AROTBSArOTIPSArOTBDPS

ArOTMS
ArOTES

SbCl3754, KF-Al2O3737
CCl4/MeOH755
NaClO2/NaH2PO4/py756

ArOTBS

HCl754ArOTIPSArOTBDPS

88

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Generic Silylation Procedures
Hexamethyldisilazane, SIH6110.0,
in the trimethylsilylation of alcohols.

6.

One equivalent of the alcohol to be silylated is mixed with
0.5 equivalents of hexamethyldi-silazane, SIH6110.0, in an
inert solvent or without solvent. Warming the reaction to
40 - 50 °C or adding a drop of trimethylchlorosilane cansignificantly accelerate the rate of reaction. The reaction isallowed to continue until no further evidence of the evolutionof ammonia is observed. For primary and secondary alcohols
the reaction is quite rapid and nearly quantitative. For tertiary
alcohols the reaction may be slower.
2.

Trimethylchlorosilane, SIT8510.0 and SIT8510.1,
in the trimethylsilylation of alcohols.

7.

Triethylchlorosilane, SIT8250.0, tert-Butyldimethylchlorosilane, SIB1935.0, tert- Butyldiphenylchlorosilane,
SIB1968.0, Triisopropylchlorosilane, SIT8384.0, or
Thexyldimethylchlorosilane, SIT7906.0, in the silylationof alcohols.
The alcohol (1 equiv.) is dissolved in DMF along withthe chlorosilane (1.1 equiv.) and imidazole (2.2 equiv.) or
2,6-lutidine (2.2 equiv.). The reaction is usually heated toabout 40 °C for 10 - 20 h for completion.

Trimethylbromosilane, SIT8430.0, or Trimethyliodosilane,
SIT8564.0, in the trimethylsilylation of alcohols.

8.

tert-Butyldimethylsilylation of an alcohol
in dichloromethane.

The tert-butyldimethylsilylation of an alcohol has been carriedout by treating 0.89 equiv. of tert- butyldimethylchlorosilane
in dichloromethane with 0.91 equiv. of the alcohol, 1.19 equiv.
of triethylamine and 0.036 equiv. of 4-dimethylaminopyridine
at room temperature for several hours.

PR
O

3.

The acid (1 equiv.) is dissolved in carbon tetrachloride (othersolvents such as dichloromethane can probably be used as well)and allyltrimethylsilane, SIA0555.0, is added. To this reaction
mixture is added about 3 drops (for 10 mmol reaction) of
trifluoromethanesulfonic acid. The reaction is very fast and iscomplete when the evolution of propylene ceases.

O

One equivalent of the alcohol, 1.1 equivalent of pyridine
or triethylamine are mixed in an inert solvent and one
equivalent of trimethylchlorosilane, SIT8510.0 or SIT8510.1,
is added. The amine can also be used as the solvent of thereaction. The reaction can be followed by any of the standard
techniques including thin layer and gas chromatography. The
reaction is quite fast with primary and secondary alcohols
and slower with tertiary alcohols. The trimethylsilylation ofamides and amines can be accomplished by a modificationof this procedure wherein the reaction mixture is heated toreflux for 16 h.

Allyltrimethylsilane, SIA0555.0, in the silylationof carboxylic acids.

F

1.

One equivalent of the alcohol, 1.1 equivalent of asuitable amine base are mixed in an inert solvent and thetrimethylbromosilane, SIT8430.0, or trimethyliodosilane,
SIT8564.0, is added. These reagents are more reactive towards
hindered alcohols than the trimethylchlorosilane.

4.

Trimethyliodosilane, SIT8564.0, Hexamethyldisilazane,
SIH6110.0 combination in the trimethylsilylation ofhindered alcohols.

The alcohol (1 equiv.), trimethyliodosilane, SIT8564.0,(2.2 equiv.) and hexamethyldisilazane (1.1 equiv.) are mixed
in pyridine as solvent and the reaction mixture is stirred atroom temperature.

5.

Trimethylsilyltrifluoromethanesulfonate, SIT8620.0,
or Trimethylsilyl Cyanide, SIT8585.1, in thetrimethylsilylation of hindered alcohols.

9.

The alcohol (1 equiv.) is reacted with triisopropylsilyltrifluoromethanesulfonate, SIT8387.0, in dichloromethane with 2,6lutidine (2.2 equiv.) as catalyst. The reaction can be carriedout as low as -78 °C in less than 5 h.

10. tert-Butyldimethylsilyltrifluoromethanesulfonate,
SIB1967.0, in the silylation of alcohols.
The alcohol (1 equiv.) is treated with tert-butyldimethylsily
ltrifluoromethanesulfonate as a 1 M solution in a 50:50 byvolume mixture of pyridine and dichloromethane. Additional
SIB1967.0 may have to be added to finish the reaction for lessreactive alcohols.

11. Di-tert-Butylsilylbis(trifluoromethanesulfonate),
SID3345.0, in the silylation of diols.

Trimethylsilylation with these very reactive silanes is carriedout by the simple mixing of the alcohol and the silane in
an inert solvent and allowing the reaction to occur, usuallyat room temperature. CAUTION: Hydrogen cyanide is
generated in the reaction with trimethylsilyl cyanide.

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Triisopropylsilyltrifluoromethanesulfonate, SIT8387.0,
in the silylation of alcohols.

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The diol (1 equiv.) is reacted with di-tert-butylsilylbis(trifluor
omethanesulfonate), SID3345.0, (1.2 equiv.) and 2,6-lutidine(3.0 equiv.) in chloroform and allowed to react at 0 to 25 °C.
1,3-Diols and 1,4-diols are, in general, more reactive than
1,2-diols.

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8912. tert-Butyldiphenylchlorosilane, SIB1968.0,
in the silylation of primary amines.

20. Dimethylaminotrimethylsilane, TMSDMA, SID3605.0
and Diethylaminotrimethylsilane, TMSDEA, SID3398.0.

The amine (1 equiv.) is reacted with tertbutyldiphenylchlorosilane, SIB1968.0, and triethylamine (1.5 equiv.) in acetonitrile at room temperature for 1-3 h. Secondary amines do
not react.

The alcohol or amine (1 equiv.) is reacted with the aminotrimethylsilane and dimethylamine or diethylamine isdistilled off as the reaction proceeds. These reagents are particularly useful in the silylation of amines. HMDS, SIH6110.0,
is preferred for the trimethylsilylation of alcohols.

13. 1,2-Bis(chlorodimethylsilyl)ethane, SIB1042.0,
in the silylation of primary amines.

21. Trimethylsilylimidazole, TMSI, SIT8590.0.

F

The amine (1 equiv.) is reacted with the 1,2-bis(chlorodimethylsilyl)ethane (1 equiv.) and triethylamine (2 equiv.) in
dichloromethane at room temperature for 2-3 h. A convenient way to isolate the product is to filter, concentrate, add
pentane, filter again and concentrate to give the product inhigh purity without distillation.

An alternative procedure for the silylation with theaminosilanes is with acid catalysis. This is best achieved
with ammonium sulfate, trimethylchlorosilane as well as
trichloroacetic acid.
Trimethylsilylimidazole, SIT8590.0, is a very reactive trimethylsilylating agent, especially for alcohols.

14. 1,1,3,3-tetraisopropyl-1,3-dichlorodisiloxane,
SIT7273.0, in the silylation of nucleosides.

15. 1,2-Bis(dimethylsilyl)benzene, SIB1084.0.

22. N,O-Bis(trimethylsilyl)acetamide, BSA, SIB1846.0.

O

The nucleoside (1 equiv.) is reacted with the silane, SIT7273.0,
and imidazole (4.4 equiv.) in DMF at room temperature. The
yields are about 80 percent.

It is typically reacted with an equivalent amount of the hydroxyl
group(s) in the presence or absence of an acid catalyst.

The amine (1 equiv.) is reacted with the silane, SIB1084.0,
with a catalytic amount of Wilkinson’s catalyst, tris(triphenylphosphine)rhodium (I) chloride, in toluene solution.

23. N,O-Bis(trimethylsilyl)trifluoroacetamide,
BSTFA, SIB1876.0.
The alcohol (1 equiv.) is reacted with N, O-bis(trimethylsilyl)
trifluoroacetamide, SIB1876.0, (0.5 equiv.) in an inert
solvent with or without trimethylchlorosilane catalysis.
This has the advantage of producing the liquid by-product,
trifluoroacetamide, which is oftentimes more easily removed
than the solid acetamide from SIB1846.0 or diphenylurea from
SIB1878.0. 24. N, N-Bis(trimethylsilyl)urea, BSU, SIB1878.0.

PRO

16. Trimethylsilylethanol, SIT8589.2, in the protectionof a carboxylic acid.

The alcohol (1 equiv.) is reacted with N,O-bistrimethylsilylacetamide, SIB1846.0, (0.5 equiv.) in an inert solvent. The reaction proceeds faster with a small amount of trimethylchlorosilane as catalyst.

The acid (1 equiv.) is reacted with 2-trimethylsilylethanol,
SIT8589.2, (1 equiv.), dicyclohexylcarbodiimide (1 equiv.)
in ethyl acetate with a catalytic amount of DMAP added. A
typical reaction is about 12 h at room temperature.

17. Triisopropylchlorosilane, SIT8384.0, in protectionof a sulfonic acid.

The acid (1 equiv.) is reacted with triisopropylchlorosilane,
SIT8384.0, (1.4 equiv.) and triethylamine (1 equiv.) in dichloromethane for 1 h at -35 °C and 15 h at room temperature.

18. Triisopropylsilyltrifluoromethansulfonate, SIT8387.0, as
precursor to Triisopropylcarbamate, Tsoc, protecting group.

The amine to be protected in the presence of triethylamine isreacted with carbon dioxide (introduced as a gas or as dry ice)
at -78 °C for 30-60 min. This mixture is then treated with triisopropylsilyltrifluo-romethanesulfonate, SIT8387.0, at room
temperature. The reaction mixture can be washed with water
without hydrolysis of the protecting group.

19. Formation of acetonides of diols withIsopropenoxytrimethylsilane, SII6460.0.

The diol (1 equiv.) is mixed with isopropenoxytrimethylsilane,
SII6460.0, in an inert solvent (THF, ether, toluene) and 1 or 2
drops of concentrated HCl or trimethylchlorosilane, is added.
The reaction is complete in less than 30 min.

90

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Two equivalents of this solid trimethylsilylating agent isreacted with the alcohol (1 equiv.) in an inert solvent. The
solid, insoluble diphenylurea produced is readily removed byfiltration and the product is purified.

Deprotection Of Silyl Ethers
1.

Acid-Catalyzed cleavage of trimethylsilyl ethers.

The silylated alcohol (0.4 mmol) in dichloromethane (4 mL)
is treated with a drop of 1N HCl and the reac- tion mixture isstirred for 30 min.
In a transeterification approach a 0.5 M solution of thetrimethylsilylated alcohol in methanol is treated withpyridinium p-toluenesulfonate (PPTS) at room temperaturefor 30 min. The lower boiling trimethyl- methoxysilane isremoved by distillation.

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Base-Catalyzed cleavage of trimethylsilyl ethers.
The mildest conditions for the base-catalyzed cleavage oftrimethylsilyl ethers is the treatment of a methanol solutionof the silylated alcohol with an excess of potassium carbonate
for 1-2 h.

3.

Selective cleavage of a triethylsilyl ether with hydrogen
fluoride-pyridine —representative procedure for thecleavage of silyl ethers with HF•pyridine.
Treatment of 180 mmol of the silylated alcohol with 4 mL of
the stock solution of hydrogen fluoride-pyridine solution(2 mL of HF•pyridine, 4 mL pyridine and 16 mL THF) for 2-3 hresults in the cleavage of the tri- ethylsilyl ether.

4.

Acid-catalyzed cleavage of triethylsilyl ethers.
A cold (0 °C) methanol solution of the silyl ether is treatedwith p-toluenesulfonic acid (0.33 equiv.) for 1-2 h. A solutionof the silyl ether in THF is treated with an aqueous solution of
trifluoromethane-sulfonic acid.
Cleavage of a tert-butyldimethylsilyl ether with tetra-nbutylammonium fluoride —representative procedure forthe deprotection of silyl ethers with TBAF.

1.
2.
3.
4.
5.
6.
7.
8.
9.
10.
11.
12.
13.
14.
15.
16.

Greene, T.; Wuts, P.G.M.; Protecting Groups in Organic Synthesis;
2nd ed.; Wiley, New York, 1991.
Kocienski, P. J.; “Protecting Groups; Thieme: Stuttgart, 1994.
Lalonde, M.; Chan, T. H. Synthesis, 1985, 817.
Olsson, L.-I. Acta Pharm. Suec. 1986, 23, 370.
Birkofer, L.; Ritter, A. Newer Methods in Preparative Organic
Chemistry, Vol. V. p 211, Academic Press, New York, 1968.
Pierce, A. E.; Silylation of Organic Compounds, Pierce ChemicalCo., Rockford, IL, 1968.
Klebe, J. F.; Acct. Chem. Res. 1970, 299.
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Corey, E. J.; Venkateswarlu, A. J. Am. Chem. Soc., 1972, 94, 6190.
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1987, 992.
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Hannessian. P.; Lavallee, P. Can. J. Chem. 1975, 53, 2975.
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Sommer, L. H. Stereochemistry, Mechanism, and Silicon,
McGraw-Hill, New York, NY 1965, 126.
Denmark, S. E., et al. J. Org. Chem. 1987, 52, 165.
Trost, B. M., et al. Tetrahedron Lett. 1983, 48, 3252 and references
cited therein.
Mai, K.; Patil, G. J. Org. Chem. 1986, 51, 3545.
Corey, E. J.; Hopkins, P.B. Tetrahedron Lett. 1982, 23, 4871.
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Barlos, K., et al. J. Org. Chem. 1982, 47, 1324.
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Poole, C. F.; Zlatkis, A. J. Chromatogr. Sci. 1979, 17, 115.
White, J. D., et al. J. Org. Chem. 1993, 57, 2270.
Kunz, H.; Waldman, H. Comprehensive Organic Synthesis; Trost,
B.M.; Fleming, I.; Eds.; Pergamon: Oxford, 1991; Vol. 6, pp 631.
Bastiaansen, P. M. F. M et al. J. Org. Chem. 1995, 60, 6154.
Marsmann, H. C.: Horn, H. Z. Z. Naturforsch. 1972, 27b, 1448.
Nishiguchi, I., et al. Synthesis, 2000, 1025.
Schmidt, H. A. Chemiker-Ztg. 1980, 104, 253.
Häässig, R., et al. Chem. Ber. 1982, 115, 1990.
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O

5.

References

F

2.

PR
O

A solution of the silyl ether in THF (approximately 4 M)
is treated with 3 equiv. of 1 M tetra-n-butyl-ammo- nium
fluoride in THF at ambient temperature until the silyl ether isconverted. This usually requires from 2 - 16 h.

17.
18.
19.
20.
21.
22.
23.
24.

6.

Cleavage of a tert-butyldimethylsilyl ether withtris(dimethylamino)sulfur-(trimethylsilyl)difluoride,
SIT8715.0 —representative procedure for the deprotectionof silyl ethers with TAS-F.

A dilute (0.4 M) solution of the alcohol in THF is added to the
SIT8715.0 at ambient temperature and the resulting solution
is stirred for 1 - 2 h.

7.

Cleavage of a tert-butyldimethylsilyl ether withhydrofluoric acid —representative procedure for the
deprotection of silyl ethers with HF.

Hydrofluoric acid (49% aqueous solution, excess) is added
to the silyl ether in acetonitrile at 0 °C. After stir- ring fora short time (10 - 30 min usually) the reaction is carefully
quenched by the addition of saturated aqueous sodiumhydrogen carbonate (CAUTION: STRONG EVOLUTION
OF CARBON DIOXIDE).

8.

Cleavage of a tert-butyldiphenylsilyl ether with tetra-nbutylammonium fluoride in acetic acid.

A stock solution of TBAF in acetic acid is prepared (0.15 mLof HOAc per 1.0 mL of 1 M TBAF in THF). The silyl ether
is dissolved in THF and reacted with an excess of the stock
solution for several h.

www.AZmax.co.jp TEL: 03-5543-1630

25.
26.

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Gelest, Inc.

(215) 547-1015

www.gelest.com

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Gelest, Inc.

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Enabling Your Technology

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781. Wang, Y.-G.; Kobayashi, Y. Org. Lett. 2002, 4, 4615.
782. Liang, H.; Hu, L.; Corey, E. J. Org. Lett. 2011, 13, 4120.

PR
O

O

695. Liu, P.; Panek, J. S. J. Am. Chem. Soc. 2000, 122, 1235.
696. Williams, D. R.; Plummer, S. V.; Patnaik, S. Angew. Chem. Intl. Ed.,
Eng. 2003, 42, 3934.
697. Williams, D. R.; Clark, M. P.; Berliner, M. A. Tetrahedron Lett.
1999, 40, 2287.
698. Harris, J. M.; O’Doherty, G. A. Tetrahedron Lett. 2002, 43, 8195.
699. Oriyama, T.; Kobayashi, Y.; Noda, K. Synlett 1998, 1047.
700. Churcher, I.; Hallett, D.; Magnus, P. J. Am. Chem. Soc. 1998,
120, 3518.
701. Terauchi, T., et al. Tetrahedron Lett. 2003, 44, 7741.
702. Takahashi, T.; Watanabe, H.; Kitahara, T. Tetrahedron Lett. 2003,
44, 9219.
703. Magnus, P., et al. J. Am. Chem. Soc. 1997, 119, 6739.
704. Semmelhack, M. F.; Gu, Y.; Ho, D. M. Tetrahedron Lett. 1997,
38, 5583.
705. Lenz, R.; Giese, B. J. Am. Chem. Soc. 1997, 119, 2784.
706. Takamura, M., et al. Synlett 2003, 353.
707. Mori, Y., et al. J. Org. Chem. 2003, 68, 9050.
708. Mori, Y.; Takase, T.; Noyori, R. Tetrahedron Lett. 2003, 44, 2319.
709. Lampe, T. F. J.; Hoffmann, H. M. R. Tetrahedron Lett. 1996,
37, 7695.
710. Taber, D. F., et al. J. Am. Chem. Soc. 1999, 121, 5589.
711. Smith III, A. B., et al. J. Am. Chem. Soc. 1997, 119, 962.
712. Blaehr, L. K. A., et al. J. Org. Chem. 2003, 68, 1367.
713. Kim, S., et al. J. Am. Chem. Soc. 1999, 121, 2056.
714. Kim, S.; Sutton, S. C.; Fuchs, P. L. Tetrahedron Lett. 1995, 36, 2427.
715. Crimmins, M. T., et al. J. Am. Chem. Soc. 1996, 118, 7513.
716. Boyer, F.-D., et al. Org. Lett. 2001, 3, 3095.
717. Tohma, H., et al. J. Am. Chem. Soc. 2003, 125, 11235.
718. Yang, Z.-Q.; Danishefsky, S. J. J. Am. Chem. Soc. 2003, 125, 9602.
719. Shen, R., et al. J. Am. Chem. Soc. 2003, 125, 7889.
720. Drake, D. J., et al. J. Med. Chem. 1998, 41, 3596.
721. Melnick, M., et al. J. Med. Chem. 1996, 39, 2795.
722. Blass, B. E.; Harris, C. L.; Portlock, D. E. Tetrahedron Lett. 2001,
42, 1611.
723. Oriyama, T.; Noda, K.; Yatabe, K. Synlett 1997, 701.
724. Wilson, N. S.; Keay, B. A. Tetrahedron Lett. 1997, 38, 187.
725. Jiang, Z.-Y.; Wang, Y.-G. Tetrahedron Lett. 2003, 44, 3859.
726. Zubaidha, P. K.; Bhosale, S. V.; Hashmi, A. M. Tetrahedron Lett.
2002, 43, 7277.
727. Ankala, S. V.; Fenteany, G. Tetrahedron Lett. 2002, 43, 4729.
728. Crouch, R. D., et al.Tetrahedron Lett. 1999, 40, 3133.
729. Jiang, Z.-Y.; Wang, Y.-G. Chem. Lett. 2003, 32, 568.
730. Ankala, S. V.; Fenteany, G. Synlett 2003, 825.
731. Oyama, K.-I.; Kondo, T. Org. Lett. 2003, 5, 209.
732. Angle, S. R.; Wada, T. Tetrahedron Lett. 1997, 38, 7955.
733. Schwarz, S., et al. Steroids 1999, 64, 460.
734. Smith III, A. B.; Zheng, J. Tetrahedron 2002, 58, 6455.
735. Nicolaou, K. C., et al. Angew. Chem. Intl. Ed., Eng. 2000, 39, 1084.
736. Suzuki, E., et al. Steroids 1999, 64, 551.
737. Nicolaou, K. C., et al. Angew. Chem. Intl. Ed., Eng. 1999, 38, 240.
738. Layton, M. E.; Morales, C. A.; Shair, M. D. J. Am. Chem. Soc. 2002,
124, 773.
739. Rani, S.; Babu, J. L.; Vankar, Y. D. Synth. Commun. 2003, 33, 4043.
740. Grieco, P. A.; Markworth, C. J. Tetrahedron Lett. 1999, 40, 665.
741. Suzuki, T.; Oriyama, T. Synthesis 2001, 555.
742. Bajwa, J. S., et al. Tetrahedron Lett. 2000, 41, 6021.

98

www.AZmax.co.jp TEL: 03-5543-1630

Acknowledgements:
Sincere thanks are given to Georg Thieme Verlag, Stuttgart,
Germany, http://www.thieme.de/chemistry/journals.html,
publishers to Synthesis, for permission to use data from the article
Selective Deprotection of Silyl Ethers, T.D. Nelson and R.D.
Crouch, Synthesis, 1996, 1031.

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O

F

Silicon-Based Reducing Agents

Gerald L. Larson, Ph.D.
Vice President, Research Products

PR
O

Materials for the reduction of:
Aldehydes
KetonesAcetals
Ketals
EstersLactones
Thioesters
Enamines
IminesAcids
AmidesHalidesOlefins
Metal Halides

General Considerations

Hydridosilanes are readily produced on an industrial
scale through the use of Grignard chemistry starting withtrichlorosilane, methyldichlorosilane, and dimethylchlorosilane,
among others, as key raw materials. Alternatively, the
Si-X (X = primarily Cl or OR) bond can be reduced to Si-H.
The organosilanes are basically hydrocarbon-like in that they
are stable to water, are, in general, flammable and are lipophilic. In
contrast to hydrocarbons, the low molecular weight silanes suchas monosilane, methylsilane, and dichlorosilane are pyrophoric.
The silanes will react with base or, more slowly, with acid to givethe corresponding siloxane with the evolution of hydrogen gas.
They show a strong, characteristic, carbonyl-like absorption in theinfrared at about 2200 cm-1.1
The metallic nature of silicon and its low electronegativity
relative to hydrogen - 1.8 versus 2.1 on the Pauling scale - lead topolarization of the Si-H bond such that the hydrogen is hydridic
in nature. This provides an ionic, hydridic reducing agent thatis milder than the usual aluminum-, boron-, and other metalbased hydrides. Thus, triethylsilane, among others, has beenused to provide the hydride in Lewis acid-catalyzed reductionsof various carbenium ion precursors. In addition, the Si-H bondcan be employed in various radical reductions wherein the silane
provides the hydrogen radical.

PR
O

O

The widely used organometallic-based reducing agents canbe broadly classified as either ionic, such as lithium aluminum
hydride and sodium borohydride, or free-radical such as tri-nbutyltin hydride. The mechanistic differences between these twoclasses of reducing agents very often complement one another intheir ability to reduce organic substrates. Organosilanes have beenfound to possess the ability to serve as both ionic and free-radical
reducing agents. These reagents and their reaction by-products aresafer and more easily handled and disposed of than other reagents.
Their reductive abilities are accomplished by changes in the natureof the groups attached to silicon, which can modify the characterof the Si-H bond in the silane. For example, the combinationof a triethylsilane and an acid has proven to be excellent for the
reduction of substrates that can generate a “stable” carbenium
ion intermediate. Examples of substrates that fall into this classare olefins, alcohols, esters, lactones, aldehydes, ketones, acetals,
ketals, and other like materials. On the other hand triphenylsilane
and especially tris(trimethylsilyl)silane have proven to be freeradical reducing agents that can substitute for tri-n-butyltin
hydride. The reductions with silanes can take place with acidcatalysis in which the silane provides the hydride to a carbenium
ion intermediate. This is often the situation in the reductionof carbonyls, ketals, acetals and similar species. Additionally,
the silane reductions can also be carried out with fluoride ion
catalysis to generate a silane with more hydridic character.

F

Introduction

SILICON-BASED REDUCING AGENTS

Some of the key reductions possible with silanes are
summarized in Table 1.

100

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Table 2 shows the Si-H bond strengths for several silanes.
From these data the rather wide variation in the Si-H bondstrengths from tris(trimethylsilyl)silane on the low-energy end totrifluorosilane on the high-energy end can be noted. This is yet

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another example of the extraordinary effect that groups attachedto silicon can have on the chemistry of the silane and that theseeffects can go beyond the simple steric effects that have been so
successfully applied with the silicon-based blocking agents.2-4

As an example of a free radical reduction, the diphenylsilane
reduction of thioesters to ethers has been recently reported.22
This reaction uses the catalytic triphenyltin hydride as the actual
reducing agent.

Table 2 Bond Strengths Of Various Hydridosilanes

S

Bond StrengthkJ mol-1

kcal mol-1

Ref

F3Si-H

SIT8373.0

419

100

5

Et3Si-H

SIT8330.0

398

95

6

Me3Si-H

SIT8570.0

398

95

7

H3Si-H

SIS6950.0

384

92

6

Cl3Si-H

SIT8155.0

382

91

5

PhMeHSi-H

SIP6742.0

382

91

6

Me3SiSiMe2-H

not offered

378

90

6

PhH2Si-H

SIP6750.0

377

90

6

(MeS)3Si-H

not offered

366

87

6

H3SiSiH2-H

SID4594.0

361

86

5

(Me3Si)3Si-H

SIT8724.0

351

84

6

O

Silicon-based reductions have been reviewed, though neverin a comprehensive manner.6,8-13 A comprehensive review has
been published.14

Silicon-Based Radical Reductions

Griller and Chatgilialoglu6 realized that the low bond energyof the Si-H bond in tris(trimethylsilyl)silane compared well withthat of the Sn-H bond in tri-n-butyltin hydride (322 kJmol-1; 77
kcal mol-1), and that this reagent should, therefore, be a viable
alternative for radical reductions and one that would avoid thepotential problems of working with toxic tin materials and trace
tin-containing impurities in the final product. This proved to be thecase, and a number of radical reductions with tris(trimethylsilyl)silane have been reported and reviewed.15,16 Included among
these are the reductions of organic halides, 17-19 esters,20 xanthates,
selenides, sulfides, thioethers, and isonitriles.21

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60%2) AIBN/85-100 °C

Ionic Reductions with Silanes—
General Considerations
As pointed out above the silanes provide a mild form of thehydride and as such can be useful in various hydridic reductions.
The general and, admittedly simplified, view of such reductions
can be visualized as shown below where a carbenium ion is
reduced by a silane. In this scenario, the carbenium ion receives
the hydride from the silane, and the silane takes on the leavinggroup from the carbon center.
5&;  56L+

5&+  56L;It has been shown that in the gas phase the reaction shown
below is exothermic by approximately 8 kcal/mol indicating thatthe trimethylsilicenium ion is, at least in the gas phase, more stable
than the tert-butyl carbenium ion.23 Although the existence of freesilicenium ions do not exist in solution under normal, “unbiased”
conditions, it can be assumed that the silicon center is free to takeon considerable positive charge in its reactions. Reductions basedon this premise include those of olefins, ketones, aldehydes, esters,organic halides, acid chlorides, acetals, ketals, alcohols as well as
metal salts.

PR
O

Although triethylsilane has been the most popular of thesilicon-based reducing agents, in principal any Si-H-containing
system can provide the hydride for many or most of these reductions.
Considerations would include availability, economics, and siliconcontaining by-products. The silicon-containing by-products areusually the silanol or disiloxane in the case of the trisubstituted
silanes, or silicones in the case of the di- or monosubstituted silane
reducing agents. Such considerations can result in greater ease ofhandling and purification of the final product.

O

Ph 3 SnH cat.
Et 3 B/rt/1h

F

Product CodeO

Compound

1) Ph 2 SiH 2&+  & &+  6L+&+ & + &+  6L

Silane Reduction of Alcohols to Alkanes
The general equation for the silane reduction of alcohols toalkanes is illustrated below. The reaction proceeds best when thealcohol can lead to a stabilized carbenium ion. Thus, secondary andtertiary aliphatic alcohols and benzylic alcohols are readily reduced.
Trialkyl substituted silanes are more reactive than dialkylsilanes
and di- or triarylsilanes. Typical and highly effective conditions forthese reductions are treatment of the alcohol with the silane andtrifluoroacetic acid in dichloromethane. Triethylsilane is often thesilane of choice due to its ease of handling and high reactivity.23,24
5 &2+5 6L+$FLG
FDWDO\VW

5 & +5 6L2+DQGRU5 6L26L5 

The reduction of secondary alcohols with a silane and a protic
acid does not occur. These reductions require the use of a strong
Lewis acid such as boron trifluoride or aluminum chloride.25,26

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Primary aliphatic alcohols are not reduced with silanes.27
Benzylic alcohols, on the other hand, are reduced under rather
mild conditions to the corresponding toluene derivative.28
t

Bu

Bu

t

R 3 Si-H

Me

Bu

Br
t

Bu

Et 3 SiH, AlCl 3

CH 2 Cl2 /TFA
t

t

Bu

39%

The selective reduction of a benzylic alcohol in the presence ofbenzyl ethers, a tetrahydrofuran and an acetal has been reported.29
OEt

BnO
Et 3 Si-H/TFA

HO OBnCH 2 Cl2 / rt
76%

MeO

O

OEt
OBn

MeO

OH

Ph

OH

Ph

The reduction of organic halides with pentacoordinate
hydridosilanes has been reported.36
Tertiary alkyl fluorides can be reduced to the alkane in excellent
yield.37 β-Chloro ethyl ethers are cleanly reduced to the alkane.38 An
allyl chloride was reduced in the presence of an allylic tosylate.39
O

Ph

O

CH 2 Cl 2 , rt, 20 h

F

O

95%

Ph

Et 3 SiH, CH 2 Cl 2

H

HOEt 2 O •BF 3
92%

Me

O

H

Et 3 SiH, CHCl3

OMe

N

M eO

H

O

Me

OMe

The reduction of an allylic alcohol in the presence of a tertiary
alcohol is possible.33
HO

Et3 SiH, PdCl2

Cl

O

O
95%

Ph 2 SiH 2 , ZnCl2 , Pd(PPh 3 )4

SO 2Tol

The reduction of α-halo ketones and α-halo esters has been reported to occur with the combinations of PhSiH3/Mo(CO)6,40 Ph2SiH2/
ZnCl2/(PPh3)4Pd,40 and Et3SiH/PdCl238 with the first of these proving
to be the best. 2-Bromopropiophenone was reduced to propiophenone with polymethylhydrogensiloxane, PMHS, without reductionof the carbonyl.41
2

2

OH

OH

Et 3 SiH, LiClO 4%U30+63G 33K %Q1
0H&10H 62  RK

52%

Silane Reduction of Alkyl Halides

As with the reduction of alcohols to alkanes, the acid-catalyzed reduction of alkyl halides to alkanes requires the formationof a relatively stable carbenium ion intermediate that can accept
the hydride from the silane. Thus, tertiary, secondary, allylic andbenzylic halides lend themselves to this type of reduction. Undercertain conditions primary halides can be reduced, but carbenium
ion rearrangements are a problem.34,35
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SO 2Tol

THF, rt, 12 h, 50°, 6 h

58%

Et 2 O, rt, 16 h

102

O

rt, 10 min

Ph

O

N

MeO

O

OH

OH

O

Ph

CH 2 Cl 2 , –20 o , 8 h

Cl

H

O

Et 3 SiH, BF 3 •OEt 2

Ph

90%

HO

57%

100%

Et 3 SiH, B(C 6 F 5 ) 3

Et 2 O •BF 3 , 0 o , 0.5 h

OH

H

AlCl3

Trialkylsilanes, being better hydride donors, provide lessrearranged product in these reductions than their dialkyl or
monoalkyl counterparts.35

PR
O

Ph

Et 3 SiHCl

O

Primary alcohols can be reduced to the alkane when the reaction is catalyzed by the very strong Lews acid, tris(pentafluorophenyl)borane. The reaction requires two equivalents of the silane as
the first equivalent serves to silylate the alcohol. It is believed thatthe silylated alcohol is nucleophilically displaced in these transformations.30 On the other hand, with boron trifluoride etherate as
the catalyst, the benzylic alcohol can be reduced in the presence ofa primary or secondary alcohol.31,32

26%

F

O

+

HCl

Bu

BnO

D
Et 3 SiD
AlCl3

OH
t

Br



The tetramethyldisiloxane reduction of an aryl chloride in thepresence of a benzophenone moiety was carried out in high yield.42
The high-yield reduction of an aryl triflate has been reported.43

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PPh 3 , dioxane, reflux, 15 h

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CF 3

Nn-C 10H 21

dppp, DMF, 60°, 3 d

CF 3

CF 3

N

Et3 SiH, Pd(OAc)2

OTf

N

CF 3
95%

Silane Reduction of Alkynes

Trityl ethers are readily removed as triphenylmethane withtriethylsilane and triethylsilyltriflate as the catalyst.53
OTr

The reduction of p-tolylacetylene with triethylsilane gave
p-ethyltoluene although in low yield.44

OH

BzO
BzO

O

OTr
O
HO

BzO
O

21%

Most of the alkyne reductions have been carried out onsuitable enynes, diynes, or bromo acetylene derivatives to produce
cyclic products.45-47
TBSO

HOAc, ClCH 2 CH 2 Cl, rt

OTMS

OTMS

n-C 16H 33

O

OH
HO

C 16H 33-n

PhO

Et 3 SiH, Pd(PPh 3 )4
Cs 2 CO 3 , DMF, 80°, 3 h48%

Silane Reduction of Aromatics

Et 3 SiH, B(C 6 F 5 )3
CH 2 Cl 2 , rt, 20 h

n-C 16H 34+ n-C 16H 33OSiEt3

Et3 SiH, TFA

OBu-t

45%

Ph

H

Ph

Ethyldimethylsilane and a ruthenium catalyst were used toreduce aliphatic carboxylic acids to the corresponding alcohol.56
With tris(pentafluorophenyl)borane as catalyst, triethylsilane
reduces carboxylic acids to the alkane.57,58
OOH

Et 3 SiH, TFA, F 3 B•OEt2
20 o , 4 min

PhPh

EtMe 2 SiH, catalyst

OH

1,4-dioxane, 20°, 0.5 h

O

72%

70%

O

Et 3 SiH, TFA, 55°, 15 h

O

O

S

45%

(OC)2Ru

OSiEt 3

Anthracene was reduced to 9,10-dihydroanthracene in goodyield with triethylsilane and boron trifluoride hydrate.50 The partial reduction of other polyaromatics was reported.50

CO 2H

Ru(CO) 2
Ru(CO) 2 O

Et 3 SiH, B(C 6 F 5 ) 3
CH 2 Cl 2 , rt, 20 h

Et 3 SiH, F3 B•OH 2

94%

CH 2 Cl 2 , 25 o , 1 h

89%

The pyridine ring of quinoline was reduced in preference to thebenzene ring. The isolated product was the N-silylated derivative.
Some of the dihydroreduction product was also observed.51,52
PhMeSiH 2 , Cp 2 TiM e 2

N98%

Silane Reduction of Carboxylic Acids

PRO

Furans are reduced to tetrahydrofurans with triethylsilane
under suitable catalysis.48 Thiophenes can be similarly reduced.49+ Ph 3CH

Under the influence of the strong Lewis acid, tris(pentafluorophenyl)borane, dialkyl ethers were cleaved in high yield.54
A tertiarybutylcyclopropenyl ether was reduced to give the cyclopropene.55

Ph

S

OH
O
HO

O

87%

O

90%

O

O
BzO

98%

PMHS, Pd 2 (bpa)3 •CHCl 3 , (o-tol)3 P

Br

BzO

CH 2 Cl 2 , rt, 5 minHOrt, 120 hO

BzO

Et 3 SiH, Et 3 SiOTf

OTr

Et3 SiH, TFA

H

TBSO

Silane Reduction of EthersFNn-C 10H 21+

80 o , 8 h

N

SiPhMeH
56%

N

SiPhMeH
18%

Silane Reduction of Esters and Lactones

The reduction of esters and lactones has proven to be possible
with the isolation of the corresponding alcohol, ether, hemiacetal,
or monosilyl acetal. Thus, an ester was reduced to the alcohol ingood yield in the presence of an epoxide.59 A methyl ester was
selectively reduced to the alcohol in the presence of a tert-butyl
ester.60 A butyrolactone was reduced to the tetrahydrofuran,56 as
well as to a hemiacetal.56,61,62
H
O

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OEt

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O

OH

103

O

O

MeO

Et 3 SiHO
PMHS, Cp 2 TiCl 2 , n-BuLi

OBu-t

HO

o

THF, –78 , 1 h

OBu-t

PhCHO

O

O

O

TBAF/Alumina, MeC 6 H 5 , rt

O

91%

O

Both an intermolecular63 and an intramolecular version of theconversion of an ester to a silyl acetal have been reported.64,65
O
OMe

OMe

MeC 6 H 5 , 100°, 16 h
92%

Mes2Si O

SiMes 2HO

TBAF, 0°

O

Et

OEt

O

91%

O

Et

Et

n-C 4H 9CHO

CHO

+

OEt

C 6 H 6 , 80°, 2 h

OEt

74%

O

6%

OSiEt3O

Et 3 SiH, ClRh(PPh 3 )3

OEt

Et3Si

C 6 H 6 , 70°, 3 h

+

OEt

Et3Si

OCH 3

CH 2 Cl2 /0 °C/10 min
100%+

Me 3SiOO

Me 3 SiH, RhCl3 •3H 2 O, 25°

O

O

34%

OSiEt 3OSiEt3O

Et 3 SiH, RhH(PPh 3 )4H

CO 2Pr-i

MePh, 50°, 16 h

CO 2Pr-i

CO 2Pr-i

+

20%

40%

Silane Reduction of Aldehydes

The acid-catalyzed reduction of aldehydes with silanes works
best in the presence of water.69 In addition esters can be formed
when an organic acid is the catalyst employed.70
O

Et3 SiH

H
n

104

O

TFA

C 7H 15 CHO

Et 3 SiH
F 3 B•OEt 2+(n-C 7 H 15) 2O
66%

OH

+

+

n-C 7H 15-OH

O 2 CCF 3

34%

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rt/45 min
83%

CHO

28%

O

OCH 3

CHO
Et 3 SiH/TFA

OCH 3

The conversion of aromatic aldehydes to benzylic halides has
also been shown.74-76 The best reducing agent for this seems to be
tetramethyldisiloxane.

OEt

52%

O

100%

CH 3

Et 3 SiH/BF 3

PR
O

OEt

n-C 5H 11 -O-C 6 H 13-n

CH 2 Cl2 /0 °C/2h

Aromatic aldehydes can be fully reduced to the corresponding
toluene derivative.71,73

OSiEt3OSiEt3Et 3 SiH, ClRh(PPh 3 )3

Et 3 SiH/Me 3 SiI

n-C 6 H 13OSiMe 3

dr = 98:2

Et

The reduction of α,β-unsaturated esters can occur with
1,4-adddition to provide the silyl ketene acetal or the β-silyl ester.66
The intermediate silyl ketene acetal can be trapped with a suitableelectrophile either in an intermolecular or intramolecular fashion.67,68
O+O

CO 2EtAn extremely high-yield reductive conversion of aldehydes
to unsymmetrical ethers involves the reaction of the aldehydewith a trimethylsilyl ether in the presence of a silane and a strong
Lewis acid, with trimethylsilyl triflate being especially efficient.72
Such silicon-based reductive-condensation chemistry should beapplicable to combinatorial chemistry where product isolation isa crucial issue.

F

OSiEt3Et 3 SiH, EtI, Et 2 NH, [RuCl 2 (CO) 3 ]298%

An excellent alternative for the reduction of aldehydes toalcohols is through the use of triethylsilane with uncomplexedboron trifluoride in dichloromethane.71 This method gives thecorresponding alcohol in high yield and very short reaction times.

OH

PMHS, Cp 2 Ti(OC 6 H 4 -Cl-p)2O

PhCH 2 OH

H 2 O/H 2 SO 4
sulfolane

BnO
O

80%

Et3 SiH

87%

BnO

PhCH 2-O-CH 2Ph

TFA

CH 2I
(HMe 2 Si) 2 O/Me 3 SiCl
NaI/CH 3 CN/0 °C/5 min

Cl

95%

Cl

Under catalysis by fluoride ion aldehydes are reduced to thecorresponding silyl ether of the alcohol. Hydrolysis of the silyl
ethers provides the unprotected alcohols. Cesium fluoride has beenshown to be an excellent promoter for these conversions,77,78 as havetetra-n-butyl ammonium fluoride (TBAF) and tris(diethylamino)
sulfonium difluorotrimethylsilicate (TASF).79 This can also be used
as a route to trimethylsilyl-protected alcohols from aldehydes.
2 n-C 6H 12CHO

Ph 2 SiH 2
CsF(n-C 7H 15 O)2SiPh 2

The reduction of aldehydes to alcohols has also been carriedout with polylmethylhydrogensiloxane (PMHS) as the hydride
source. In this case, the work-up includes reaction with methanol
to release the free alcohol.80
The selective reduction of aldehydes over ketones can berealized with polymethylhydrogensiloxane as the reducing agent
with fluoride ion-catalysis.81

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Enabling Your Technology
O
Ph

H

+
Ph

Ph
PMHS

n

The reduction of aryl ketones (acetophenone derivatives)to the methylene is readily accomplished.86 Triethylsilane withtitanium tetrachloride works best for this transformation, thoughother systems also work well.

87%

+

TBAF

O

OH

OH
Ph

Bu

n

< 8%

Bu

O

The reductive amidation of aldehydes proved possible via the
acid-catalyzed triethylsilane reduction in the presence of a nitrile
or a primary amide.82,83
PhCHO + CH 3CN

aq. H 2 SO 4

PhCH 2NHCOMe

Et 3 SiHAr

1. Me 3 SiH, TMSOTf, CH 2 Cl 2

Ph

O

O

HO

O

O

O

O

Me 3 SiH, TMSOTf+

CH 2 Cl 2 , 0°, 4 h, then rt, 2 hO

The reduction of α,β-unsaturated aldehydes can occur in a
1,2- or 1,4-fashion.84
Ph 2 SiH 2 , (Ph 3 P)3 RhClO

0°, 4 h then rt, 2 h

2. H 2 O

HO 2C
96%

CHO

R

F

N
H

M eC 6 H 5 , 120 o , 18 h

Ar

Cyclic ethers can be formed in the reduction of diketones orhydroxyketones.88-90 Epoxy ketones can lead to ethers as well.91

80%

Et 3 SiH, TFA, PhCONH 2

HO 2C

Acid

The selective reduction of aryl ketones to alcohols over dialkyl
ketones can be carried out with phenyldimethylsilane in the presence of cuprous chloride or cuprous acetate.87

O
CHO

R 3 SiH

R

42%

42%

OH

0o, 1 h97%

O

Et 3 SiH, TMSOTf

Et 3 SiH, (Ph 3 P)3 RhCl

CHO

S

CHO

rt, 1 h

O

OH

:

O

:

S

O

CH 2 Cl 2 , 0°, 15 min
97%

PR
O

97%

Silane Reduction of Ketones

Silanes have been used for the reduction of ketones toalcohols with excellent results.85 The reduction of ketones or
aldehydes in the presence of acetonitrile and an acid provides analkyl acetamide.82 The comparable reduction of aldehydes to alkyl
acetamides is also possible.82
HO

HO

H

O

O

H
α:β ratio = 1:4

Et3 SiH/CH 3 CN

In a similar manner, the reduction of ketones and aldehydes
to esters has been reported.82 This reaction is always accompaniedwith the formation of the symmetrical ether.
O+

rt/1.5h75%
CHO

Et 3 SiH/HCOOH
rt/8h

O 2CH

+

www.AZmax.co.jp TEL: 03-5543-1630

OH

Br

Me 2 ClSiH, In(OH)3
CHCl 3 , rt, 4 h

Cl

99%

O

Cl
I

TMDS, I 2 , CH 2 Cl 2
–5 o , 5 min
76%

Cl

O

O
25%

H

Cl
Br

H O 2CCF 3

Et 3 SiH/TFAOONHCOMe75% aq. H 2 SO 4 /rt/65h

H

81%

OH

TFA

H

O

–78°, 6 h; 0°, 12 h

O

The reductive halogenation of ketones has been shown. Thus,
acetophenone derivatives are converted to benzylic halides.92,93 An
ynone was converted to the propargyl chloride in good yield.92

H

Et3 SiH

Ph 3 SiH, catalyst, CH 2 Cl 2

Me 2 ClSiH, In(OH)3
CHCl3 , 0 o , 0.3 h
78%

2

O

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105

The reduction of aliphatic ketones to the methylene is best
accomplished with the tris(pentafluorophenyl)borane catalyst.94
O
PMHS, B(C 6 F 5 )3 , CH 2 Cl 2
rt, 5 - 20 min

The reduction of acids and esters to alcohols with polymethylhydrogensiloxane occurs in good yields in the presence oftitanium tetraisopropoxide100 or tetrabutylammonium fluoride.101
The reduction of esters has also been carried out with diphenylsilane and rhodium catalysis.102

90%

OBn
OEt

Dimethyl(diethylamino)silane served as the reducing agent
and the amine source in the reductive amination of acetophenone.95

O

PMHS

OMe

8

CH 2 Cl 2 , 0 o to rt, 36 h+0°, 30 min

O

O

OH

3%
Et3 SiH, (Ph 3 )3 RhCl+

80°, 25 h

O

The triethoxysilane reduction of esters to alcohols in highyields is possible.103 This transformation also takes place withPMHS as the reducing agent.104,105
COOEt(EtO)3 SiH/Ti(O i Pr)4
40 - 50 °C

O

97%

O

OH

90%

6%

O

O

PR
O
O

HO 2C

O

HO

O

PMHS/toluene
94%

Et3 SiH, TFA, 0 o , 1 hrt, 48 h

Cl CF 3

The reduction of imines to amines with trichlorosilane anddichlorosilane was reported. Dichlorosilane gave the best results.107

O

95%

HO 2C

OMe

O

HO

Cl CF 382%

The reduction of amides to the amine has been shown tooccur in high yields employing triethylsilane or diphenylsilane.98,99
O

M eC 6 H 5 , 100°96%

The one-pot reduction of amides to aldehydes with
diphenylsilane has been reported.99 This provides a potentiallyhighly-useful, non-oxidative entry into aldehydes.
O

NC

10

TBSO

106

O

Ph 2 SiH 2 , Ti(OPr-i) 4 , 20°

NPr-i2

NC

80%

O

Ph 2 SiH 2 (1.1 eq)

NMe 2Ti(OPr-i)4 (1 eq)

10

TBSO

87%

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H

F 3 B•OEt 2

S

OMe
H
N

Cl2 SiH 2 90%
Cl3 SiH61%

The reduction of oximes to alkoxyamines is accomplishedwith phenyldimethylsilane and trifluoroacetic acid.108

N

Et 3 SiH, Re(CO) 10 , Et2 NH

SilaneN

S

Silane Reduction of Other Carbonyl Systems

NO

TBAF/Al2 O 3

Ph 2 SiH 2 , ZnCl2

Pd(PPh 3 ) 4 , rt, 1 hOH

Cp 2 Ti(OC 6 H 4 Cl)2

O

O

OH

The conversion of lactones to lactols was accomplished via atitanium-catalyzed reduction with PMHS.106

Some selectivity was seen in the reduction of an enone in thepresence of a ketal96 and an acid, allyl alcohol, and halide.97
O

OH

F

Et 2 SiH 2 , (Ph 3 )3 RhCl

8

TBAF
95%

65%

The reduction of α,β-unsaturated ketones can occur in a 1,2or 1,4-fashion.84

OH

89%

O

NEt2

Et 2 NSiHMe 2 , TiCl 4

O

OBn

PMHS
Ti(O iPr)4 /THF

R1
R2

N

OR 3

PhMe 2 SiH
TFA

R1
R2

OR 3
NH

Silane Reduction of Acetals, Ketals and Aminals
The silane reduction of acetals and ketals occurs readily in thepresence of a variety of silanes and acid catalysts. Both arylalkyl
and dialkyl ketals can be reduced to the methylene group.107
1. Et 3 SiH, SnBr2 -AcBr,

O

O

H

Ph

CH 2 Cl2 , rt, 24 hO

2. n-Bu 3 SnH, AIBN,C 6 H 6 , reflux, 0.5 h

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Ph77%

Enabling Your Technology
MeO

OMe

H
N

1. Et 3 SiH, SnBr2 -AcBr,O

CH 2 Cl 2 , rt, 24 hNPh

2. n-Bu 3 SnH, AIBN,C 6 H 6 , reflux, 0.5 h

Ph

Ph

NPh

N

67%

The reduction of the acetal of benzaldehyde was carried out
in good yield in the presence of an alkyl azide.109 The reduction ofa peroxymethyl ketal occurred to give triethylmethoxysilane andkeep the peroxide group as well as a primary alkyl iodide.110 In
another similar example the peroxide functionality was lost.110

N

Et 3 SiH, TFA
50°, 64 h

MeO

MeO

58%

N
H

MeO

N
H

MeO

O

O
Et 3 SiH, TFA, CH 2 Cl 2

BnO

PMHS, AlCl 3 , Et 2 O, CH 2 Cl 2

O
O

N3

rt, 12 h

7

69%

H

O O

Et3 SiH, HOTf

I

O

I
H

O

O

Et3 SiH, HOTf
51%

O

CO 2MeEt3 SiH, TFA
rt, 4 h

HO

79%

N

N

Me

H

O

O

N
H

OH

Et 3 SiH, TFA

NHMe

CHCl3 , rt, 1- 4 h

MeO

91%

O

Et 3 SiH, TFA

MeO 2CCHCl3 , rt, 20 h

N

MeO

O

O

Et 3 SiH, TFA

CHCl3 , rt, 22 h

O

+
70%

N

Me

OH

O

2 Et 3 SiH/TFA+

MeO 2C

63%

Fmoc N75%

Not surprisingly the ionic reduction of suitable olefins, i.e.
those which can generate a relatively stable carbenium ion, canbe carried out by silanes in the presence of an acid catalyst. The
ability to generate the carbenium ion is essential to the successof the reaction. For example, 1-methylcyclohexene is readily
reduced to methylcyclohexane whereas cyclohexene itself is not
reduced under the same and even more forcing conditions.118 The
most common set of conditions for these reductions is an excess
of trifluoroacetic acid, a strong acid with a conjugate base of low
nucleophilicity, and triethylsilane.119-123 Likewise, terminal olefinsthat are not styrenic in nature and 1,2-disubstituted olefins are not
reduced with silanes, again, due to the inability to form a suitablecarbenium ion intermediate. On the other hand, the reduction ofenol ethers and similar olefins which can form good carbenium
ions is possible.122,124

PR
O
Me

O

Silane Reduction of Olefins

CO 2MeNO20°, 24 hOAminals and hemiaminals are reduced to amines.111
N-Trimethylsilyloxymethylimines can be reduced to the corresponding imine.112 Related reactions are also possible.113,114

N

N

O

O

O

CO 2MeEt 3 SiH, TFA, CHCl3

56%

H

N

56%

CO 2MeNO O

Cl0°, 6 h then rt, 6 h

N

N3

7

MeO

Cl

HO

F

H
Ph

H
N

O

Fmoc NMeO

The reduction of α,β-unsaturated carbonyls to theirsaturated counterparts is conveniently carried out withsilanes in the presence of a rhodium or copper catalyst.125,126

OH

O nC 12H 25

98%

Silane Reduction of Enamines and Enamides
The organosilane reduction of enamines has been reported.116
The reduction of enamides can be carried out selectively in thepresence of enones.117,118

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100%

Gelest, Inc.

PhMe 2 SiH

O nC 12H 25

CuCl/DMI

O

O

95%

O

O

Bu 3 SnH; 40 min 80%

conditions[Ph 3 PCuH] 6 5 mol %(215) 547-1015

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PhSiH 3 ; 8 min 86%

107Ojima and Kogure84 have shown that the reduction ofα,β-unsaturated ketones or aldehydes with triethylsilane or
ethyldimethylsilane gives 1,4-addition resulting in reduction of
the double bond whereas diphenylsilane gives 1,2-addition andstraight reduction of the carbonyl.
OHOsilane+(Ph 3 P)3 RhCl
EtMe 2 SiH
Ph 2 SiH 2

2%
99%

O

O

H

TFA/CH 2 Cl2

1) Et 3 SiH

2The reduction of 4-tert-butylcyclohexanone with triethylsilane
or dimethylphenylsilane preferentially gives the trans product.
Very high trans to cis stereoselectivity of this transformation withtriethoxysilane and TBAF was reported as was the reduction of
3-phenyl-2-butanone to anti 3-phenyl-2-butanol.134
The stereoselective silane reduction of β-hydroxy ketones
with diisopropylchlorosilane has been demonstrated.135-137

2) NaOH/H 2 O

OO3) [O]The reduction of a trisubstituted olefin in the presence of anester was shown.129
Et 3 SiH/TFA

O 2CCH 3i

PrNO 2 /LiClO 490%

N

Et3 SiH

TFA, 25 o

100%

1

108

TFA

3K0H 6L+
7)$

BnO
+

OAc

NH

Ph

99

%Q2

1+

3K



OAc

1

%Q2
2$F

1+

3K



 

2$F

 

The Lewis acid-catalyzed triphenylsilane reduction ofhemiketals was shown to occur with high stereoselectivity.140
S

S

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NH

Ph

73%

2$F

3K

O

80%

1) SnCl4
2) HF/H 2 O

BnOPhMe 2 SiH

2%Q

Et 3 SiH
TFAiPr
Pr Si-HO
O

Et 3 NOAc

PhO 2CCH 3

The silane reduction of acetylenes to alkanes is not apractical approach to this transformation.130 The reduction ofvinylcyclopropane gave ethylcyclopropane in quantitative yield.131
Vinyl ethers are reduced to the corresponding alkyl ether.132

O

Pr2 ClSiH

90%

Et 3 SiH/TFA

PrNO 2 /LiClO 4i

The highly diastereoselective reduction of oximes has beenreported.108 The diastereoselectivity was much higher than thatreported for the corresponding reduction with lithium aluminum
hydride in diethyl
O 2CCH 3ether.
BnO

i

i

H

PR
O

H3

26L(W

(W  6L+&)&2+OH

TFA/CH 2 Cl2O

Bu2 MeSiH/CF 3 CO 2 H

O

O

H

t

O

Et 3 SiH

O 2 CCF 3

O

98%
1%

An example of the reduction of a styrenic double bond in thepresence of another double bond and a ketone is shown below.127
The double bond of an α,β-unsaturated ketone was reduced withthe triethylsilane/acid combination, though regeneration of the
ketones was necessary.128

H

Doyle and West133 demonstrated that the acid-catalyzed
reduction of alkyl-substituted cyclohexanones with di-tertbutylsilane, di-tert-butylmethylsilane and tri-tert-butylsilane
proceeds with predominant formation of the less stable isomer as
the trifluoroacetate. For example, 4-tert-butylcyclohexanone gives
67% of the cis-4-tert-butylcyclohexyl trifluoroacetate.

F

O

Stereoselective Silane-Based Reductions

Ph

Gelest, Inc.

S

Ph
O
OH

(215) 547-1015

S

PhMe 2 SiH/TiCl4
CH 2 Cl2 /5 min

Ph

O

H

Ph

cis:trans = 82:1

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Enabling Your Technology

Asymmetric silane reductions

O

A very efficient asymmetric reduction of arylalkyl ketones has
been shown. The reaction, which does not work well for prochiraldialkyl ketones, is carried out with PMHS in the presence of achiral titanium catalyst.138
O

OEt

PM HS, (Ph 3 P)CuHPhO
PMHS, (Ph 3 P)CuH

O

PMHS

OH

Buchwald and coworkers139 have reported the reduction of iminesin very high enantiomeric excess through the use of a titanium
catalyst activated with phenylsilane and the reduction withpolymethylhydrogen siloxane or phenylsilane. The asymmetric
reduction of imines has been reported in very high enantiomeric
excesses.139,145-147
HN

N

Activated Ti cat.

O60°, pyrrolidine, MeOH, THF

Ph96%; 99% ee

FA number of asymmetric, silane-based reductions have beenreported. In many cases these result in very high enantioselectivity and offer an alternative to the asymmetric hydrogenation protocol. Enones have been reduced in a 1,2-fashion, as well as in a
1,4-manner, with high ee values.141,142

O

H

t-BuOH, MeC 6 H 5 , 0°Ph

2. PMHS, ketone, MeOH, 15°, 4 hPhO

73% yield; 73% ee

PMHS or PhSiH 3

90%; 84% eeslow addition of 3° amine

98% ee

95%

N

PR
O

Cl

HN

PhSiH 3 , catalyst

OMe

The intermediate enol silyl ether from the reduction of anenone can be trapped with benzyl bromide.143

OEt92%; 98% ee

OH

1. PhSiH 3 , (EBTHI)Ti, MeOH,

H

t-BuOH, MeC 6 H 5 , 0°

"Ti"/C 6 H 6

O

O

OMe

i-BuNH 2 , 65°, 2.5 h

E:Z = 15:1

Cl92%, 99% ee

Reductions With Other Group 14 Hydrides

O

The tri-n-butyltin hydride reductions are well-known andhave been reviewed.148 A recent report shows that tri-n-butyltin
hydride can provide the hydrogen for the reductive aminationof ketones and aldehydes, thus providing an alternative tosodium cyanoborohydride for this transformation.149 This sametransformation was reported using polymethylhydrogen siloxane,
PMHS, as the reducing agent.150

Ph 2 SiH 2 , CuCl, NaOBu-t(S)-p-Tol-BINAP, MeC 6 H 5 , 0°, 2 - 3 h

PhOSiPh 2H

BnBr, TBATO

CH 2 Cl 2 /MeC 6 H 5 , rtPhR

95% ee1+R2

R 2 NH 2+ ClO 4-

NR 2

Bu 3 SnH

R

DMF

1

R2

Triphenylgermane has been shown to reduce acid chlorides toaldehydes with palladium(0) catalysis.151

O

O

Bn

R

Cl

Ph

R

Pd(PPh 3 )4H

HMPA/80-100 °C

Tri-n-butylgermane has been employed in the reductive
alkylation of active olefins, in particular acrylonitrile.152

69%; dr = 94:6

The DTBM-SEGPHOS-catalyzed PMHS reduction ofα,β-unsaturated esters provides the saturated ester in highenantiomeric excess.144

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O

Ph 3 GeH

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CN

+

R-I

(215) 547-1015

Bu 3 GeH

R

AIBN/80 °C/8h

www.gelest.com

CN
54 - 79 %+R-H
3 - 14 %109

Reducing Agent
SIT8330.0
TRIETHYLSILANE[617-86-7]
TSCA

Structure

Table 3Tri-Substituted Silane Reducing Agents
C2H5

C2H5

Si

H

C2H5
SIT8570.0
TRIMETHYLSILANE[993-07-7]
TSCA

CH3
H Si CH3

in cylinder

CH3
CH

CH2CH2CH3
H

25g ¥10,000
100g ¥22,600
1.5kg inquire

More effective radical-based reagent for reduction of organic
halides than the trialkylsilanes.156 Compares well with tri-nbutyltin hydride in reduction of enones to ketones.63 Shows
good selectivity in the reduction of cyclic hemiacetals.77
Converts O-acetyl furanoses and pyranoses to deoxy sugars.159

25g ¥17,200
100g ¥55,400
2kg inquire

Reactivity similar to that of triethylsilane.

10g ¥13,000
50g ¥34,500

O

H3C
HC Si H
H3C
CH
H3C CH3

Si H

Very sterically-hindered silane. Used as a cation scavenger inthe deprotection of peptides.158

Si CH2CH2CH3
CH2CH2CH3

PRO
SIT8185.0
TRIETHOXYSILANE[998-30-1](CH2)5CH3 Reactivity similar to that of triethylsilane but has higher boiling

CH3(CH2)5Si

H

point and produces a higher boiling by-product.

25g ¥19,900
100g ¥57,000(CH2)5CH3

OC2H5

H Si OC2H5
OC2H5

SIT8721.0
TRIS(TRIMETHYLSILOXY)SILANE[1873-89-8]

100g inquire
1kg inquireF

H3C

SIT8665.0
TRIPHENYLSILANE[789-25-3]
TSCA

SIT8376.0
TRI-n-HEXYLSILANE[2929-52-4]
TSCA

Pricing
25g ¥6,500
250g ¥32,300
2.5kg inquire

CH3

SIT8385.0
TRIISOPROPYLSILANE[6485-79-6]

SIT8709.0
TRI-n-PROPYLSILANE[998-29-8]
TSCA

Comments
Used to reduce metal salts.153 Enhances deprotection of
t-butoxycarbonyl-protected amines and tert-butylesters.154 Usedin the reductive amidation of oxazolidinones with amino acids
to provide dipeptides.155 Converts aldehydes to symmetrical andunsymmetrical ethers. 156 Used in the ‘in-situ’ preparation ofdiborane and haloboranes.157
Potential reducing agent that will produce low boilinghexamethyldisiloxane by-product.

Si(CH3)3O

Reduces esters in the presence of zinc hydride catalyst.52
Reduces aldehydes and ketones to alcohols via the silyl ethers inpresence of fluoride ion.160 Gives 1,2-reduction of enones to allyl
alcohols.161

25g ¥11,900
100g ¥31,000
2kg inquire

Gives highly stereoselective reduction of substituted
cyclohexanones.51

25g ¥14,100
100g ¥37,900
2kg inquire

H Si O Si(CH3)3O

Si(CH3)3

SIT8724.0
TRIS(TRIMETHYLSILYL)SILANE[1873-77-4]

SID3258.0
DI-tert-BUTYLMETHYLSILANE[56310-20-4]

110

Undergoes exothermic decomposition at >100 °C. Radicalbased reducing agent for organic halides, selenides, xanthates
and isocyanides and ketones in high yields.20 Can provide
H Si Si(CH3)3 complementary stereoselectivity to tri-n-butyltin hydride in the
reduction of gem dihalides.162 Mild reducing agent in nucleoside
Si(CH3)3
chemistry.163
Used in reductive trifluoroacetolysis of ketones. Reacts faster
H3C
CH3than di-tert-butylsilane.72
C
H
H3C
Si
H3C
CH3
C
H3C
CH3

Si(CH3)3

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2.5g ¥11,900
10g ¥31,000

10g ¥25,200

Enabling Your Technology

Table 3 (continued)
CH3CH2

SID4125.0
DIMETHYLETHOXYSILANE[14857-34-2]
TSCA
SID4555.0
DIPHENYLMETHYLSILANE[776-76-1]
TSCA

25g ¥13,500
100g ¥36,300

Used in a silylation-reduction-allylation sequence of β-hydroxy
esters to homoallylic-substituted 1,3-diols.164 Used in thesilylation-hydrosilation-oxidation of allyl alcohols to 1,3-diols.165
Reaction carried out in diastereoselective manner. Reduces
β-hydroxy ketones to anti-1,3 diols. 166

5g ¥14,100
25g ¥45,900
2kg inquireWill form high-boiling polymeric by-products with aqueous
work-up.

25g ¥4,900
500g ¥30,700750g inquire

CH3

CH3
CH

H Si ClCH
CH3CH3H Si Cl
CH3

F

H3C

Similar to triethylsilane with lower boiling point.

Si

CH3CH2

H3C
SID4070.0
DIMETHYLCHLOROSILANE[1066-35-9]
TSCA

H

Will form high-boiling polymeric by-products with aqueous
work-up.

CH3
H Si OC2H5
CH3O

SID3410.0
DIETHYLMETHYLSILANE[760-32-7]
TSCA
SID3535.0
DIISOPROPYLCHLOROSILANE[2227-29-4]
TSCA

25g ¥13,000
100g ¥34,200
2.5kg inquire

Used to reduce α-alkoxy ketones to diols and α-amino ketones
to aminoethanols with high stereoselectivity.167

25g ¥14,100
100g ¥37,900
2kg inquire

SIE4894.0
H
CH3
ETHYLDIMETHYLSILANE
Si[758-21-4]
CH3
CH3CH2TSCA
SIE4890.0
H
Cl
ETHYLDICHLOROSILANE
Si[1789-58-8]
Cl
CH3CH2
TSCA
SIM6504.0
H3C
Cl
METHYLDICHLOROSILANE[75-54-7]
Si
TSCA
H
Cl

Similar to triethylsilane with lower boiling point.

10g ¥20,400

Will form high-boiling polymeric by-products with aqueous
work-up.

25g ¥24,100
100g ¥70,800
2kg inquire

Provides better diastereoselective reductive aldol reaction
between an aldehyde and an acrylate ester than other silanes.168
Forms high-boiling polymeric by-products upon aqueous workup.

25g ¥4,300
750g ¥78,000
2kg inquire
20kg inquire

SIM6506.0
METHYLDIETHOXYSILANE[2031-62-1]
TSCA

Will form high-boiling polymeric by-products with aqueous
work-up.

25g ¥11,400
100g ¥37,900

CH3
H

PR
O

Si

SIO6619.0
CH3 Similar to triethylsilane with much higher boiling point.
OCTADECYLDIMETHYLSICH3(CH2)16CH2 Si H
LANE
CH3[32395-58-7]

5g ¥15,100
25g ¥50,700

SIP6729.0
PHENYLDIMETHYLSILANE[766-77-8]
TSCA

25g ¥14,600
100g ¥39,500
2kg inquire

CH3
Si H
CH3

www.AZmax.co.jp TEL: 03-5543-1630

Used to reduce α-amino ketones to aminoethanols with highstereoselectivity.167 Used in the fluoride ion-catalyzed reductionof aldehydes and ketones, and α-substituted alkanones to threo
products.42 Erythro reduction of a-substituted alkanones todiols and aminoethanols.169 Together with CuCl reduces aryl
ketones, but not dialkyl ketones.170 Used in the silylformylationof acetylenes.171 Excellent reducing agent for the reduction ofenones to saturated ketones.172 Shows better selectivity than
LAH in the reduction of oximes to alkoxyamines.57

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111

Table 3 (continued)
SIP6737.0
PHENYLMETHYLCHLOROSILANE[1631-82-9]TSCA

10g ¥20,400
50g ¥71,300

Contains two available hydrides for reduction. Has potential forstereoselective reduction of dicarbonyls.

5g ¥15,100

H
Si
CH3

Cl

Si

Cl
Cl

Si

H

H

Will form high-boiling polymeric by-products withaqueous work-up. Reduces aromatic carbonyl systems togive benzyltrichlorosilanes, which can be desilylated totoluenes.173-175 Reduces phosphine oxides to phosphines.176

Cylinder packaging recommended

Cl

Structure

SID3342.0
DI-tert-BUTYLSILANE[30736-07-3]

H3C

Table 4
Dialkylsilyl Reducing Agents

Comments
Very low boiling point silane that is a gas at atmosphericconditions.

CH3
H Si H
CH3

Sterically-hindered silane reducing agent.

H

PR
O

H3C
H3C

H3C

SID3368.0
DICHLOROSILANE[4109-96-0]
TSCA
SID3368.2
DICHLOROSILANE, 25% inxylene[4109-96-0]
TSCA
SID3415.0
DIETHYLSILANE[542-91-6]
TSCA
SID4559.0
DIPHENYLSILANE[775-12-2]
TSCA

Si

C

Gives improved yields in reduction of imines over that oftrichlorosilane.56

Cl

Si

H

Cl

H

Cl

CH3CH2H

400g inquire
2kg inquire

Used in the ‘in-situ’ preparation of diborane and haloboranes.157

10g ¥15,100
50g ¥50,100
2kg inquire

Used in the preparation of silyl-substituted alkylidene
complexes of tantalum.177 Used in the ionic reduction of enones
to saturated ketones.178 Used in the reductive cyclization of
unsaturated ketones.179,180 Reduces esters in the presence ofzinc hydride catalyst.53 Reduces α-halo ketones in presenceof Mo(0).181 Reduces thio esters to ethers.22 Reduces esters
to alcohols with Rh catalysis.49 Employed in the asymmetric
reduction of methyl ketones114 and other ketones.182,183
Reductively cleaves allyl acetates.184
Used in the preparation of silyl-substituted alkylidene complexesof tantalum.177

25g ¥19,400
100g ¥55,200
2kg inquire

Si

H

H

Si

H

H
Si
CH3

112

includes gas cylinderCl

CH3CH2

SIP6742.0
PHENYLMETHYLSILANE[766-08-5]
TSCA

250g inquire
2kg inquire

includes gas cylinder

Easier to handle form of dichlorosilane.

SiH

5g ¥19,400

H

CH3

H

Pricing
50g inquire

includes gas cylinder

CH3
C

O

Reducing Agent
SID4230.0
DIMETHYLSILANE[1111-74-6]TSCA

25g inquire
2kg inquire
20kg inquireF

SIT7537.0
1,1,4,4-TETRAMETHYL-1,4- H
DISILABUTANE
Si

SIT8155.0
TRICHLOROSILANE[10025-78-2]
TSCA

Will form high-boiling polymeric by-products with aqueous
work-up.

H

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(215) 547-1015

www.gelest.com

10g ¥15,100
50g ¥50,100
2kg inquire

Enabling Your Technology

Structure

Comments

CH3(CH2)4CH2 H
SiHH

25g ¥15,600
100g ¥43,200

H

CH3(CH2)16CH2 Si H
H

10g ¥17,800
50g ¥60,700
1.5kg inquireH
CH3(CH2)6CH2 Si H

F

H

SIP6750.0
PHENYLSILANE[694-53-1]
TSCA

Employed in the reduction of esters to ethers.185 Reduces α,βunsaturated ketones to saturated ketones in the presence of
tri-n-butyltin hydride.186 Reduces tin amides to tin hydrides.187
Used in the tin-catalyzed reduction of nitroalkanes to alkanes.188
Reduces α-halo ketones in presence of Mo(0).181

H
Si
H

H

Table 6
Siloxane-Based Silane Reducing Agents

Structure
H(CH 3)2SiO
O

H(CH 3)2SiO

Si O

Si
O

H(CH 3)2SiO

O

O Si

O

Comments
Solid siloxane reducing agent. Offers 8 Si-H bonds.
Potential for easy removal of silicon by-products.

OSi(CH 3)2H

Si

H(CH 3)2SiO

Si

O

O

Pricing
2.5g ¥13,800
10g ¥36,900O
OSi(CH 3)2H

O
Si

Si

O

OSi(CH 3)2H

OSi(CH 3)2H

SIH6117.0
High molecular weight silane reducing agent.
CH3
CH3
CH3
1,1,3,3,5,5-HEXAMETHYL
H Si O Si O Si H
TRISILOXANE[1189-93-1]
CH3
CH3
CH3
TSCA
SIP6718.0
H
PENTAMETHYLCYCLOPENTASILOXANE, 90%
Si O[6166-86-5]
CH3 5
TSCA
SIH5844.0
CH3
CH3
CH3
HEPTAMETHYLTRISILOXH Si O Si O Si CH3
ANE[2895-07-0]
CH
CH
CH
3

5g ¥14,600
25g ¥48,000
2kg inquire

Si O

PR
O

Reducing Agent
SIO6696.5
OCTAKIS(DIMETHYLSILOXY)-T8SILSESQUIOXANE[125756-69-6]

Pricing
10g ¥22,000
50g ¥77,700

O

Reducing Agent
SIH6166.2
n-HEXYLSILANE[1072-14-6]
TSCA
SIO6635.0
n-OCTADECYLSILANE[18623-11-5]
TSCA
SIO6712.5
n-OCTYLSILANE[871-92-1]
TSCA

Table 5Mono-Substituted Silane Reducing Agents3

10g ¥8,500
50g ¥23,600
2kg inquire
25g ¥13,800
100g ¥36,900
2kg inquire
10g ¥31,000

3

SIP6736.5
PHENYLHYDRO-CYCLOSILOXANES, contains linears.

High-boiling siloxane reducing agent.

5g ¥19,400
25g ¥67,100

Si O

H

3-4

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113

Table 6 (continued)
SIP6826.0
PHENYLTRIS(DIMETHYLSILOXY)SILANE, 95%[18027-45-7]
TSCA

H

Si

25g ¥13,000
100g ¥35,000
2kg inquire

Sterically-hindered silane reducing agent with potential fordiastereoselective reductions.

5g ¥14,600
25g ¥46,900
2kg inquire

Si CH3

H3C
CH3HHigh molecular weight silane reducing agent.

O
O Si
O

CH3

Si CH3H3C

H

CH3 H3C CH3
CH
CH

H Si

O

Si H

CH
H3C
SIT7278.0
TETRAKIS(DIMETHYLSILOXY)SILANE[17082-47-2]
TSCA
SIT7530.0
1,3,5,7-TETRAMETHYLCYCLO-TETRASILOXANE[2370-88-9]
TSCA

CH3 H3C

CH3High molecular weight silane reducing agent.
H(CH 3)2SiO

Si

H(CH 3)2SiO

H
O
H
CH 3

OSi(CH 3)2H

Si

O

Si

OSi(CH 3)2H

H

CH 3

Si

Si

O
O
CH 3

25g ¥14,100
100g ¥37,900

HHigh molecular weight silane reducing agent.

25g ¥13,100
100g ¥34,600
3kg inquire

Reduces aromatic aldehydes to benzyl halides.38 Used in
the reductive halogenation of aldehydes and epoxides.189

25g ¥4,300
250g ¥21,500
1.5kg inquireHigh molecular weight silane reducing agent.

25g ¥14,100
100g ¥37,900
2kg inquire

Potential reducing agents in the mode of HMS-991 or
HMS-992.

100g ¥8,500-20,400

CH 3

PR
O

SIT7546.0
1,1,3,3-TETRAMETHYLDISILOXANE[30110-74-8]
TSCA

CH

F

H3C

O

SIT7274.0
1,1,3,3-TETRAISOPROPYL-DISILOXANE[18043-71-5]

SIT8721.0
TRIS(TRIMETHYLSILOXY)SILANE[1873-89-8]

CH3

H Si

CH3

O

CH3

Si H
CH3

Si(CH3)3O

H Si O Si(CH3)3O

Si(CH3)3

METHYLHYDROSILOXANE-DIMETHYLSILOXANECOPOLYMERS
HMS-013 through HMS-501
having various MW’s, viscosities, and hydride content.
[68037-59-2]
TSCA
HMS-991 or HMS-992
POLYMETHYLHYDROSILOXANE[63148-57-2]
TSCA

114

Reduces lactones to lactols.55 Reduces aldehydes, ketones,
HMS-991
esters, lactones, triglycerides and epoxides to alcohols with
100g ¥7,700
zinc hydride catalysis.52 With titanium tetraisopropoxide
3kg ¥40,600
HMS-992
catalysis, carries out reductive amination of ketones
100g ¥8,500
and aldehydes82 and the reduction of acids or esters to
3kg ¥47,000
1° alcohols.50 With TBAF catalysis, selectively reduces
aldehydes over ketones.43 Used to generate tri-n-butyltin
hydride ‘in-situ’ and in a one-pot hydrostannylation/Stillecoupling sequence.190 Reduces esters to alcohols.54

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(215) 547-1015

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Enabling Your Technology

Table 7
Germanium And Tin-Based Reducing Agents

Reducing Agent
Structure
SNT8130
TRI-n-BUTYLTIN HYDRIDE
C4H9[688-73-3]
TSCA

Comments
Has been reviewed.80 Catalyzes the Si-H reduction of a,βunsaturated ketones.186 Useful in the reductive amination of
ketones and aldehydes to form 3° amines.81

C4H9
Sn H
C4H9

Pricing
10g ¥9,300
250g ¥23,500
50g inquire
1kg inquire
3kg inquire
2.5g ¥23,500
10g ¥66,300

Reduces acid chlorides to aldehydes in presence of Pd(0).83
Effects free-radical reductive addition of alkyl halides toolefins.191 Reduces benzylic chlorides 70x faster than silyl
hydrides.192

GET8660
TRIPHENYLGERMANE[2816-43-5]

Readily adds to terminal acetylenes and olefins.193 Used in
the reductive alkylation of acrylonitrile and enones.84

2.5g ¥21,500
10g ¥59,500

GET8560
TRIMETHYLGERMANE[1449-63-4]

Effects halogen displacement of alkyl halides with hydrogen
when exposed to UV.194

2.5g ¥33,500
10g ¥99,000

OREFERENCESF

GET8100
TRI-n-BUTYLGERMANE[998-39-0]

Arkles, B., Silanes, In The Kirk Othmer Encyclopedia of
Chemical Technology, 4th Ed., Kroschwitz, J. I., Howe-Grant,M., Eds.; Wiley: New York, 1997, Vol. 22, p38.

12. Kursanov, D.N. et al. Ionic Hydrogenation and Related
Reactions; Harwood Academic Publishers, Chur,
Switzerland, 1985.

2.

Lalonde, M.; Chan, T. H. Synthesis, 1985, 817.

13. Nagai, Y. Org. Prep. Proced. Int. 1980, 12, 13.

3.

Nelson, T. D.; Crouch, R. D. Synthesis, 1996, 1031.

4.

“Silicon-Based Blocking Agents”, Larson, G. L. Ed.; Gelest,
Inc. 1999.

14. Larson, G. L.; Fry, J. L. “Ionic and Organometallic-Catalyzed
Organosilane Reductions”, Denmark, S. E. Ed.; John Wileyand Sons, 2008, 71, 1-737.

5.

Walsh, R. Acc. Chem. Res., 1981, 14, 246. Walsh, R. Bond
Dissociation Energies in Organosilicon Compounds, In
Silicon, Germanium, Tin & Metal Alkoxides Diketonates andCarboxylates, Arkles, B. Ed.; Gelest, Inc. 1998, pp 92-99.

6.

Chatgilialoglu, C. Chem. Rev. 1995, 95, 1229.

16. Chatgilialoglu, C. Acc. Chem. Res. 1992, 25, 188.

7.

Ding, L.; Marshall, P. J. Am. Chem. Soc. 1992, 114, 5754.
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2000, pp 171-188.

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8.

Colvin, E. Silicon in Organic Synthesis, pp 325-336,
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19. Sano, H.; Ogata, M.; Migita, T. Chem. Lett. 1986, 77.

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Weber, W. P. Silicon Reagents for Organic Synthesis,
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Gelest, Inc.

(215) 547-1015

www.gelest.com

115

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28. Barclay, L. R. C.; Sonawane, H. R.; MacDonald, M. C.
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www.AZmax.co.jp TEL: 03-5543-1630

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116

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Gelest, Inc.

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www.gelest.com

Enabling Your Technology

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1988, 44, 3771.
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O

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F

81. Kobayashi, Y.; et al. Tetrahedron 1997, 53, 1627.

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PRO

93. Lecea, B.; Aizpurua, J. M.; Palomo, C. Tetrahedron 1985,
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www.AZmax.co.jp TEL: 03-5543-1630

123. Carey, F. A.; Tremper, H. S. J. Org. Chem. 1969, 34, 4.

131. Parnes, Z. N.; Khotimskaya, G. A.; Kudryavtsev, R. V.;
Kursanov, D. N. Bull. Acad. Sci. USSR, Div. Chem. Sci. (Engl.
Transl.) 1972, 21, 854; Chem. Abstr. 1972, 77, 87932.
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Sci. USSR, Div. Chem. Sci. (Engl. Transl.) 1972, 21, 1927;
Chem. Abstr. 1973, 78, 28811.
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117

135. Kobayashi, Y.; Ito, Y.; Terashima, S. Bull. Chem. Soc. Jpn.
1989, 62, 3041.

165. Bergen, S. H. et al. J. Am. Chem. Soc. 1992, 114, 2121.

136. Smonou, I. Tetrahedron Lett. 1994, 35, 2071.

167. Fujita, M.; Hiyama, T. J. Am. Chem. Soc. 1984, 106, 4629.

137. Lewis, M. D.; Cha, J. K.; Kishi, Y. J. Am. Chem. Soc. 1982,
104, 4976.
138. Nishiyama, Y. et al. Chem. Lett. 1997, 165.

166. Anwar, S.; Davis, A. P. Tetrahedron 1988, 44, 3761.
168. Taylor, S. J.; Morken, J. P. J. Am. Chem. Soc. 1999, 121, 12202.
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170. Ito, H. et al. Synlett. 2000, 479.

139. Carter, M. B. et al. J. Am. Chem. Soc. 1994, 116, 11667.
140. Yun, J.; Buchwald, S. L. J. Am. Chem. Soc. 1999, 121, 5640.
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Lover, A. A. Org. Lett. 2004, 6, 1273.

171. Eguchi, M. et al. Tetrahedron Lett. 1993, 34, 915.
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143. Lipshsutz, B. H.; Servesko, J. M.; Taft, B. R. J. Am. Chem. Soc.
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175. Benkeser, R. A. et al. J. Am. Chem. Soc. 1970, 92, 3232.
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144. Verdaguer, X.; Lange, U. E. W.; Buchwald, S.L. Angew. Chem.
Int. Ed. Engl. 1998, 37, 1103.

177. Diminnie, J. B.; Xue, Z. J. Am. Chem. Soc. 1997, 119, 12657.
178. Kablaoni, N. M.; Buchwald, S. L. J. Am. Chem. Soc. 1995,
117, 6785.

O

145. Verdaguer, X.; Lange, U. E. W.; Reding, M. T.; Buchwald, S.
L. J. Am. Chem. Soc. 1996, 118, 6784.

F

142. Yun, J.; Buchwald, S. L. Org. Lett. 2001, 3, 1129.

146. Reding, M. T.; Buchwald, S. L. J. Org. Chem. 1998, 63, 6344.

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PRO

149. Suwa, T. et al. Synlett. 2000, 556.

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150. Chandrasekhar. S.; Reddy, Ch. R.; Ahmed, M. Synlett.
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44, 6295.

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1984, 25, 3123.

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118

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Silanes and Surfaces: Hydrophobicity,
Hydrophilicity and Coupling Agentsby Barry Arkles
TABLE OF CONTENTS

PR
O

O

F

Silanes and Surface Modification ................................................................................... 120
Wettability and Contact Angle ....................................................................................... 121
Critical Surface Tension and Adhesion .......................................................................... 122
How does a Silane Modify a Surface? ............................................................................ 123
Selecting a Silane for Surface Modification................................................................... 124
Hydrophobic Surface Treatments ................................................................................... 125
Hydrophilic Surface Treatments ..................................................................................... 127
Range of Water Interaction with Surfaces...................................................................... 128
Reacting with the Substrate ............................................................................................ 129
Silane Requirements for Surface Coverage .................................................................... 129
Silane Coupling Agents .................................................................................................. 130
Selecting a Silane Coupling Agent - Polymer Applications .......................................... 131

Special Topics

Dipodal Silanes ................................................................................................................ 135
Dipodal Silane Selection Guide ....................................................................................... 136
Linker Length .................................................................................................................. 137
Combining Polarity and Non-Polarity in Silane Surface Treatments ............................. 138
Partition, Orientation and Self-Assembly in Bonded Phases .......................................... 139
Modification of Metal Substrates .................................................................................... 140
Thermal Stability of Silanes ............................................................................................ 141
Cyclic Azasilanes ............................................................................................................. 142
Aqueous Systems & Water-Borne Silanes....................................................................... 143
Masked Silanes - Latent Functionality ............................................................................ 144
Difficult Substrates .......................................................................................................... 145
Applying Silanes .............................................................................................................. 146

Selection Guides

Hydrophobic Silane Selection Guide .............................................................................. 148
Coupling Agent Selection Guide ..................................................................................... 158

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119Silanes and Surface Modification

Silanes are silicon chemicals that possess a hydrolytically sensitive center that can react with inorganic
substrates such as glass to form stable covalent bonds and possess an organic substitution that alters the physicalinteractions of treated substrates.

OCH2CH3
CH3CH2CH2CH2CH2CH2CH2CH2— Si— OCH2CH3
organic substitution allows permanent property modificationF

OCH2CH3

Applications include:
Architectural Coatings
Water-Repellents
Anti-stiction Coatings for MEMs
Mineral Surface Treatments
Fillers for Composites
Pigment DispersantsDielectric Coatings
Anti-fog Coatings
Release Coatings
Optical (LCD) Coatings
Bonded Phases
Self-Assembled Monolayers (SAMs)
Crosslinkers for Silicones
Nanoparticle Synthesis

PR
O

Property modifications include:
Hydrophobicity
ReleaseDielectric
Absorption
Orientation
Hydrophilicity
Charge ConductionOhydrolyzeable alkoxy (alcohol) groups

In contrast with silanes utilized as coupling agents in adhesive applications, silanes used to modify thesurface energy or wettability of substrates under normal conditions do not impart chemical reactivity to thesubstrate. They are often referred to as non-functional silanes. The main classes of silanes utilized to effectsurface energy modification without imparting reactivity are:Hydrophobic Silanes
MethylLinear Alkyl
Branched Alkyl
Fluorinated Alkyl
Aryl
Dipodal120

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Hydrophilic Silanes
Polar
Hydroxylic
Ionic
Charge inducible /charge switchable
Embedded Hydrophilicity
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Contact Angle Defines Wettability

Wettability and Contact Angle

Contact Angle of Water on
Smooth SurfacesF

A surface is said to be wetted if a liquid spreads over the surface
evenly without the formation of droplets. When the liquid iswater and it spreads over the surface without the formationof droplets, the surface is said to be hydrophilic. In terms ofenergetics, this implies that the forces associated with theinteraction of water with the surface are greater than the cohesive
forces associated with bulk liquid water. Water droplets formon hydrophobic surfaces, implying that the cohesive forces
associated with bulk water are greater than the forces associatedwith the interaction of water with the surface. Practically,hydrophobicity and hydrophilicity are relative terms. A simple
quantitative method for defining the relative degree of interactionof a liquid with a solid surface is the contact angle of a liquid
droplet on a solid substrate. If the contact angle of water is lessthan 30°, the surface is designated hydrophilic since the forcesof interaction between water and the surface nearly equal thecohesive forces of bulk water and water does not cleanly drainfrom the surface. If water spreads over a surface and the contact
angle at the spreading front edge of the water is less than 10°,the surface is often designated as superhydrophilic (provided thatthe surface is not absorbing the water, dissolving in the water orreacting with the water). On a hydrophobic surface, water forms
distinct droplets. As the hydrophobicity increases, the contact
angle of the droplets with the surface increases. Surfaces withcontact angles greater than 90° are designated as hydrophobic.
The theoretical maximum contact angle for water on a smoothsurface is 120°. Micro-textured or micro-patterned surfaces
with hydrophobic asperities can exhibit apparent contact angles
exceeding 150° and are associated with superhydrophobicity andthe “lotus effect”.

PR
O

O

heptadecafluorodecyltrimethoxysilane*(heptafluoroisopropoxy)propyltrichlorosilane*poly(tetrafluoroethylene)poly(propylene)
octadecyldimethylchlorosilane*
octadecyltrichlorosilane*tris(trimethylsiloxy)silylethyldimethylchlorosilane
octyldimethylchlorosilane*
dimethyldichlorosilane*
butyldimethylchlorosilane*
trimethylchlorosilane*poly(ethylene)poly(styrene)poly(chlorotrifluoroethylene)
human skindiamondgraphitesilicon (etched)talc
chitosansteelmethacryloxypropyltrimethoxysilane
gold, typical (see gold, clean)triethoxysilylpropoxy(triethylenoxy)dodecanoate*
intestinal mucosa
glycidoxypropyltrimethoxysilane*
kaolinplatinum
silicon nitride
silver iodide
methoxy(polyethyleneoxy)propyltrimethoxysilane*soda-lime glass
gold, clean

Ordinary Surface“typical wetting”

Hydrophobic“poor wetting”

Hydrophilic“good wetting”

115°
109-111°108-112°108°110°
102-109°104°
104°
95-105°100°
90-100°88-103°94°90°
75-90°
87°86°
86-88°
50-55°
80-81°
70-75°
70°
66°
61-2°
50-60°
49°
42-46°
40°
28-30°
17°
15.5°
<15°
<10°

*Note: Contact angles for silanes refer to smooth treatedsurfaces.

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121

Critical Surface Tension and Adhesion

Critical surface tensions

While the contact angle of water on a substrate is a good
indicator of the relative hydrophobicity or hydrophilicity ofa substrate, it is not a good indicator for the wettability ofthe substrate by other liquids. The contact angle is given by
Young’s equation:
sv – sl = lv • cosewhere sl = interfacial surface tension, lv = surface tensionof liquid.

c
mN/m

6-7

heptadecafluorodecyltrichlorosilane

12.0poly(tetrafluoroethylene)

18.5

octadecyltrichlorosilane

20-24

methyltrimethoxysilane

22.5

nonafluorohexyltrimethoxysilane

23.0

vinyltriethoxysilane

25

paraffin wax

25.5

ethyltrimethoxysilane

27.0

propyltrimethoxysilane

28.5

glass, soda-lime (wet)30.0poly(chlorotrifluoroethylene)

31.0

poly(propylene)

31.0

F

Critical surface tension is associated with the wettability or
release properties of a solid. It serves as a better predictor of
the behavior of a solid with a range of liquids.

heneicosafluorododecyltrichlorosilane

O

Liquids with a surface tension below the critical surface
tension (c) of a substrate will wet the surface, i.e., show acontact angle of 0 (cose = 1). The critical surface tension is
unique for any solid and is determined by plotting the cosineof the contact angles of liquids of different surface tensions andextrapolating to 1.

PR
O

Hydrophilic behavior is generally observed by surfaces
with critical surface tensions greater than 45 dynes/cm. As
the critical surface tension increases, the expected decrease incontact angle is accompanied with stronger adsorptive behavior
and with increased exotherms.

poly(propylene oxide)

32

polyethylene

33.0

trifluoropropyltrimethoxysilane

33.5

3-(2-aminoethyl)-aminopropyltrimethoxysilane

33.5

poly(styrene)

34

p-tolyltrimethoxysilane

34

cyanoethyltrimethoxysilane

34aminopropyltriethoxysilane

35

acetoxypropyltrimethoxylsilane

37.5

Hydrophobic behavior is generally observed by surfaces
with critical surface tensions less than 35 dynes/cm. At first, thedecrease in critical surface tension is associated with oleophilic
behavior, i.e. the wetting of the surfaces by hydrocarbon oils.
As the critical surface tensions decrease below 20 dynes/
cm, the surfaces resist wetting by hydrocarbon oils and areconsidered oleophobic as well as hydrophobic.

polymethylmethacrylate39

polyvinylchloride

39

phenyltrimethoxysilane

40.0

chloropropyltrimethoxysilane

40.5

mercaptopropyltrimethoxysilane

41

glycidoxypropyltrimethoxysilane

42.5

poly(ethyleneterephthalate)43

In the reinforcement of thermosets and thermoplastics withglass fibers, one approach for optimizing reinforcement is tomatch the critical surface tension of the silylated glass surface
to the surface tension of the polymer in its melt or uncured
condition. This has been most helpful in resins with no obvious
functionality such as polyethylene and polystyrene. Silane
treatment has allowed control of thixotropic activity of silica
and clays in paint and coating applications. Immobilizationof cellular organelles, including mitochondria, chloroplasts,
and microsomes, has been effected by treating silica withalkylsilanes of C8 or greater substitution.

poly(ethylene oxide)43-45

copper (dry)44aluminum (dry)45iron (dry)46nylon 6/6

45-6

glass, soda-lime (dry)47silica, fused

78

titanium dioxide (anatase)91

ferric oxide

107

tin oxide

111

122

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Note: Critical surface tensions for silanes refer to smooth treatedsurfaces.

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How does a Silane Modify a Surface?

Hydrolytic Deposition of Silanes

PR
O

Hydrolysis Considerations

O

F

Most of the widely used organosilanes have one organic
substituent and three hydrolyzable substituents. In the vast
majority of surface treatment applications, the alkoxy groups ofthe trialkoxysilanes are hydrolyzed to form silanol-containing
species. Reaction of these silanes involves four steps. Initially,hydrolysis of the three labile groups occurs. Condensation tooligomers follows. The oligomers then hydrogen bond with
OH groups of the substrate. Finally, during drying or curing, acovalent linkage is formed with the substrate with concomitantloss of water. Although described sequentially, these reactions
can occur simultaneously after the initial hydrolysis step. At
the interface, there is usually only one bond from each siliconof the organosilane to the substrate surface. The two remaining
silanol groups are present either in condensed or free form. The
R group remains available for covalent reaction or physicalinteraction with other phases.
Silanes can modify surfaces under anhydrous conditions
consistent with monolayer and vapor phase deposition
requirements. Extended reaction times (4-12 hours) at elevatedtemperatures (50°-120°C) are typical. Of the alkoxysilanes,
only methoxysilanes are effective without catalysis. The mosteffective silanes for vapor phase deposition are cyclic azasilanes.
Water for hydrolysis may come from several sources. It may
be added, it may be present on the substrate surface, or it may
come from the atmosphere. The degree of polymerization of thesilanes is determined by the amount of water available and theorganic substituent. If the silane is added to water and has low
solubility, a high degree of polymerization is favored. Multiple
organic substitution, particularly if phenyl or tertiary butylgroups are involved, favors formation of stable monomericsilanols.
The thickness of a polysiloxane layer is also determinedby the concentration of the siloxane solution. Although amonolayer is generally desired, multilayer adsorption resultsfrom solutions customarily used. It has been calculated that
deposition from a 0.25% silane solution onto glass could resultin three to eight molecular layers. These multilayers could beeither inter-connected through a loose network structure, orintermixed, or both, and are, in fact, formed by most deposition
techniques. The orientation of functional groups is generally
horizontal, but not necessarily planar, on the surface of thesubstrate.
The formation of covalent bonds to the surface proceeds witha certain amount of reversibility. As water is removed, generally
by heating to 120°C for 30 to 90 minutes or evacuation for 2 to
6 hours, bonds may form, break, and reform to relieve internal
stress.
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B. Arkles, CHEMTECH, 7, 766, 1977

Anhydrous Deposition of SilanesR
H3C Si CH3
OCH 3
+
OH

∆

- CH3OHR

H3C Si CH3
O

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123

OH

Selecting A Silane for Surface Modification Inorganic Substrate Perspective

O

H
O

O

Factors influencing silane surface modification selection include:
Concentration of surface hydroxyl groups
Type of surface hydroxyl groups
Hydrolytic Stability of the bond formed
Physical dimensions of the substrate or substrate features

H

H

H

HO

O
OH

PR
O

O

F

Surface modification is maximized when silanes react with thesubstrate surface and present the maximum number of accessible
sites with appropriate surface energies. An additional considerationis the physical and chemical properties of the interphase region.
The interphase can promote or detract from total system properties
depending on its physical properties such as modulus or chemical
properties such as water/hydroxyl content.
Hydroxyl-containing substrates vary widely in concentrationand type of hydroxyl groups present. Freshly fused substrates
stored under neutral conditions have a minimum numberof hydroxyls. Hydrolytically derived oxides aged in moist air
have significant amounts of physically adsorbed water which caninterfere with coupling. Hydrogen bonded vicinal silanols react more
readily with silane coupling agents, while isolated or free hydroxyls
react reluctantly.
Silanes with three alkoxy groups are the usual starting point for
substrate modification. These materials tend to deposit as polymericfilms, effecting total coverage and maximizing the introduction oforganic functionality. They are the primary materials utilized incomposites, adhesives, sealants, and coatings. Limitations intrinsic
in the utilization of a polylayer deposition are significant fornano-particles or nano-composites where the interphase dimensions
generated by polylayer deposition may approach those of the substrate.
Residual (non-condensed) hydroxyl groups from alkoxysilanes canalso interfere in activity. Monoalkoxy-silanes provide a frequently
used alternative for nano-featured substrates since deposition islimited to a monolayer.
If the hydrolytic stability of the oxane bond between the silane
and the substrate is poor or the application is in an aggressive aqueous
environment, dipodal silanes often exhibit substantial performance
improvements. These materials form tighter networks and may offer
up to 105x greater hydrolysis resistance making them particularly
appropriate for primer applications.

H

124

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Water droplets on a (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane-treated silicon wafer
exhibit high contact angles, indicative of the low
surface energy. Surfaces are both hydrophobic andresist wetting by hydrocarbon oils. (water droplets
contain dye for photographic purposes).

Silane Effectiveness on Inorganics
SUBSTRATES
SilicaEXCELLENT Quartz

GOOD

SLIGHT

POOR

Glass
Aluminum (AlO(OH))
Alumino-silicates (e.g. clays)
SiliconCopperTin (SnO)
Talc
Inorganic Oxides (e.g. Fe2O3, TiO2, Cr2O3)
Steel, Iron
Asbestos
NickelZinc
Lead
Marble, Chalk (CaCO3)
Gypsum (CaSO4)
Barytes (BaSO4)
Graphite
Carbon Black

Estimates for Silane Loading on Siliceous Fillers
Average Particle Size
<1 micron
1-10 microns
10-20 microns>100 microns(215) 547-1015

Amount of Silane(minimum of monolayer coverage)
1.5%
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0.75%
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Enabling Your Technology

Hydrophobic Silane Surface Treatments

OH
OH
OH

OH

OH
OH

OH

OH

OH

OH

complete coverage

PR
O

O

F

Factors which contribute to the ability of an organosilane to generate ahydrophobic surface are its organic substitution, the extent of surface coverage,
residual unreacted groups (both from the silane and the surface) and the
distribution of the silane on the surface.
Aliphatic hydrocarbon substituents or fluorinated hydrocarbon substituents are
the hydrophobic entities which enable silanes to induce surface hydrophobicity.
Beyond the simple attribute that in order to generate a hydrophobic surface theorganic substitution of the silane must be non-polar, more subtle distinctions
can be made. The hydrophobic effect of the organic substitution can be related
to the free energy of transfer of hydrocarbon molecules from an aqueous
phase to a homogeneous hydrocarbon phase. For non-polar entities, van der
Waals interactions are predominant factors in interactions with water and suchinteractions compete with hydrogen bonding in ordering of water molecules. Van
der Waals interactions for solid surfaces are primarily related to the instantaneouspolarizeability of the solid which is proportional to the dielectric constant or
permittivity at the primary UV absorption frequency and the refractive index
of the solid. Entities which present sterically closed structures that minimize
van der Waals contact are more hydrophobic than open structures that allow
van der Waals contact. Thus, in comparison to polyethylene, polypropylene andpolytetrafluoroethylene are more hydrophobic. Similarly methyl-substituted
alkylsilanes and fluorinated alkylsilanes provide better hydrophobic surface
treatments than linear alkyl silanes.
Surfaces to be rendered hydrophobic usually are polar with a distributionof hydrogen bonding sites. A successful hydrophobic coating must eliminate or
mitigate hydrogen bonding and shield polar surfaces from interaction with waterby creating a non-polar interphase. Hydroxyl groups are the most common sites
for hydrogen bonding. The hydrogens of hydroxyl groups can be eliminatedby oxane bond formation with an organosilane. The effectiveness of a silane inreacting with hydroxyls impacts hydrophobic behavior not only by eliminating
the hydroxyls as water adsorbing sites, but also by providing anchor points forthe non-polar organic substitution of the silane which shields the polar substrates
from interaction with water.
Strategies for silane surface treatment depend on the population of hydroxyl
groups and their accessibility for bonding. A simple conceptual case is thereaction of organosilanes to form a monolayer. If all hydroxyl groups are cappedby the silanes and the surface is effectively shielded, a hydrophobic surface isachieved. Practically, not all of the hydroxyl groups may react leaving residualsites for hydrogen bonding. Further, there may not be enough anchor points on
the surface to allow the organic substituents to effectively shield the substrate.
Thus the substrate reactive groups of the silane, the conditions of deposition, theability of the silane to form monomeric or polymeric layers and the nature of
the organic substitution all play a role in rendering a surface hydrophobic. The
minimum requirements of hydrophobicity and economic restrictions for different
applications further complicate selection.
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incomplete hydroxyl reaction

few bonding opportunities= (CH3)3Si = trimethylsilyl

Hypothetical
Trimethylsilylated
Surfaces
Pyrogenic silica has 4.44.6 OH/nm2. Typicallyless than 50% are reacted.
Other substrates have fewer
opportunities for reaction.

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125Superhydrophobicity and Oleophobicity

F

Hydrophobicity vs Water Permeability
Although silane and silicone derived coatings are in
general the most hydrophobic, they maintain a highdegree of permeability to water vapor. This allows
coatings to breathe and reduce deterioration at thecoating interface associated with entrapped water.
Since ions are not transported through non-polar
silane and silicone coatings, they offer protection tocomposite structures ranging from pigmented coatings to rebar reinforced concrete.

Superhydrophobic
Surface:Cassie StateO

Hydrophobicity is frequently associated with oleophilicity, the affinity of a substance for oils, since nonpolar organic substitution is often hydrocarbon in natureand shares structural similarities with many oils. The
hydrophobic and oleophilic effect can be differentiatedand controlled. At critical surface tensions of 20-30
mN/m, surfaces are wetted by hydrocarbon oils and arewater repellent. At critical surface tensions below 20,hydrocarbon oils no longer spread and the surfaces areboth hydrophobic and oleophobic. The most oleophobicsilane surface treatments have fluorinated long-chain alkyl
silanes and methylated medium chain alkyl silanes.
Superhydrophobic surfaces are those surfaces that
present apparent contact angles that exceed the theoreticallimit for smooth surfaces, i.e. >120°. The most common
examples of superhydrophobicity are associated withsurfaces that are rough on a sub-micron scale and contact
angle measurements are composites of solid surface
asperities and air; denoted as the Cassie state. Perfectlyhydrophobic surfaces (contact angles of 180°) have been
prepared by hydrolytic deposition of methylchlorosilanes
as microfibrillar structures.

PR
O

Perfect Hydrophobicity-180°

Automotive side windows are treated with fluoroalkylsilanes to provide
self-cleaning properties. Water beads remove soil as they are blown
over the glass substrate during acceleration.

1) CH3SiCl3
toluenetrace H20

2)ethanol extraction

toluene-swollen crosslinked covalently
attached methylsilicone

SEM imageThe methylsilicone
phase separates inethanol to form a
covalently attachedfibrillar network.
Fiber diameter is~20 nm. Ellipsometry
indicates a film
thickness of ~20 nm.

T. McCarthy, J. Am. Chem. Soc., 2006, 128, 9052.

126

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Enabling Your Technology

Hydrophilic Silane Surface Treatments

Anti-fog coatings

PR
O

O

F

The vast majority of surfaces are hydrophilic. Water is omnipresent applied to one
in the environment, yet the precise nature of interaction of water side of a visor canwith specific surfaces is largely unknown. Water adsorption may be prepared frombe uniform or in isolated patches. It may be driven by a number of combinations ofdifferent physical and chemical processes. The adsorption of water polyalkylene oxideby a surface may be assisted or retarded by other adsorbents present functional silanesin the environment. The purpose of applying a hydrophilic surface and film-forming
treatment is to control both the nature and extent of interaction of hydrophilic silanes.
water with a surface.
The controlled interaction of water with substrates can offer
various degrees of hydrophilicity ranging from physi-sorption
Heats of Immersion in Water, mJ/m2
to chemi-sorption and centers for ion-interaction. The utility ofhydrophilic surfaces varies widely. Anti-fog coatings exploit hightitanium dioxide225-250
surface energies to flatten water droplets rather than allowing themtalc
220-260
aminopropyltriethoxysilane*230-270
to form light-scattering droplets. In biological systems hydrophilic
silicon dioxide210-225
surfaces can reduce nonspecific bonding of proteins. Hydrophilicglass
200-205
coatings with hydrogen bonding sites allow formation of tightly
vinyltris(methoxyethoxy)silane*
110-190
adherent layers of water with high lubricity in biological systems
mercaptopropyltrimethoxysilane*
80-170graphite
32-35
and the ability to resist oil adsorption in anti-graffiti coatings.
polytetrafluoroethylene
24-25
They can also be used to disperse particles in aqueous coatingsand oil-in-water emulsions. Hydrophilic coatings with ionic sites *Data for silane treated surfaces in this table is primarily
form antistatic coatings, dye receptive surfaces and can generate from B. Marciniec et al, Colloid & Polymer Science, 261,
conductive or electrophoretic pathways. Thick films can behave as 1435, 1983 recalculated for surface area.
polymeric electrolytes in battery and ion conduction applications.
Water Interaction with PEGylated Silanes
In general, surfaces become more hydrophilic in the series: non- The mostcommon strategy for non-hydroxylic polar
polar < polar, no hydrogen-bonding < polar, hydrogen-bonding modification of organic molecules is the incorporation ofoxide units (PEG). The interaction of water< hydroxylic < ionic. The number of sites and the structure and poleyethylene
with one, two and three PEG units incorporated into adensity of the interphase area also have significant influence on silane is depicted.
hydrophilicity.
Much of the discussion of hydrophobicity centers around highcontact angles and their measurement. As a corollary, low or 0° contact
angles of water are associated with hydrophilicity, but practicallythe collection of consistent data is more difficult. Discriminating
between surfaces with a 0° contact angle is impossible. The use ofheat of immersion is a method that generates more consistent data
for solid surfaces, provided the surface does not react with, dissolve
or absorb the tested liquid. Another important consideraton iswhether the water adsorbed is “free” or “bound.” Free water is watermolecules
that is readily desorbed under conditions of less than 100% relative 1 water molecule 1 water molecule 1.5 water
per EG unit
(single bridge bonded, (double bridge bonded,humidity. If water remains bound to a substrate under conditions of less≈ 20 kJ/mole)≈ 34 kJ/mole) (per molecule 34 kJ/mole)than 100% relative humidity, the surface is considered hygroscopic.
Another description of hygroscopic water is a boundary layer ofwater adsorbed on a surface less than 200nm thick that cannot be
removed without heating. A measure of the relative hygroscopic nature of surfaces is given by the water activity,
the ratio of the fugacity, or escaping tendency, of water from a surface compared to the fugacity of pure water.
The hydrophilicity of a surface as measured or determined by contact angle is subject to interference byloosely bound oils and other contaminants. Heats of immersion and water activity measurements are less subject
to this interference. Measurements of silane-modified surfaces demonstrate true modification of the intrinsic
surface properties of substrates. If the immobilized hydrophilic layer is in fact a thin hydrogel film, then swelling
ratios at equilibrium water absorbtion can provide useful comparative data.
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127

Hydrophilic Silane Surface Treatments (continued)

Controlling hydrophilic interaction with silane surface treatments is accomplished by the selection of asilane with the appropriate hydrophilic substitution. The classes of substitution are:••••

Aortic stents are coatedto promote hydrophilicity,
coupling to polymers anddrug delivery systems.

Polar, Non-Hydrogen Bonding
Polar, Hydrogen-Bonding
Hydroxylic
Ionic-Charged

PR
O

O

F

The selection of the class of hydrophilic subsitution is dependent on the application. If it is sufficient forwater to spread evenly over a surface to form a thin film that washes away and dries off quickly without leaving‘drying spots’, then a polar aprotic silane is preferred. If a coating is desired that reduces non-specific bindingof proteins or other biofoulants, then a polar hydrogen-bonding material such as a polyether functional silane
is preferred. A very different application for a polar non-hydroxylic materials is thin film proton conduction
electrolytes. Lubricious coatings are usually hydroxylic since they require a restrained adsorbed phase ofwater. Antistatic coatings are usually charged or charge-inducible as are ion-conductive coatings used in theconstruction of thin-film batteries. A combination of hydrophilicity and hydrophobicity may be a requirement incoatings which are used as primers or in selective adsorption applications such as chromatography. Formulation
limitations may require that hydrophilicity is latent and becomes unmasked after application.
Factors affecting the intrinsic hydrolytic stability of silane treated surfaces are magnified when the water isdrawn directly into the interface. Even pure silicon dioxide is ultimately soluble in water (at a level of 2-6ppm),
but the kinetics, low concentration for saturation and phase separation, make this a negligible consideration inmost applications. The equilibrium constant for the rupture of a Si-O-Si bond by water to two Si-OH bonds
is estimated at 10 -3. Since at minimum 3 Si-O-Si bonds must be simultaneously broken under equilibrium
conditions to dissociate an organosilane from a surface, in hydrophobic environments the long-term stability isa minor consideration. Depending on the conditions of exposure to water of a hydrophilic coating, the long-term
stability can be an important consideration. Selection of a dipodal, polypodal or other network forming silane as
the basis for inducing hydrophilicity or as a component in the hydrophilic surface treatment is often obligatory.

Range of Water Interaction with Surfaces

interaction
lowsuperhydrophobic
oleophobic
lipophobic
oleophilic
lipophilichydrophobic

moderatestrong128

description

surfaceexamplemeasurement parametercontact angle

fluorocarbon

water-sliding angle
critical surface tensionhydrocarbon

polarhydrophilicpolymeroxide surface

heat of immersion

hygroscopic

polyhydroxylic

water activityhydrogel film

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Enabling Your Technology

Reacting with the Substrate
Leaving Groups

Bond Dissociation Energies
Bond

Dissociation Energy(kcal/mole)

Me3Si-NMe2
Me3Si-N(SiMe3)2
Me3Si-Cl
Me3Si-OMe
Me3Si-OEt
Me3Si-OSiMe3

98
109
117
123
122
136

F

The reaction of an organofunctional silane with a surface
bearing hydroxyl group results in a substitution reaction at silicon
and the formation of the silylated surface where the silicon iscovalently attached to the surface via an oxygen linkage. Thisconnection may be formed directly or in the presence of water
through a reactive silanol intermediate. In general the reactivity ofhydroxylated surfaces with organo-functional silanes decreases in
the order: Si-NR2 > Si-Cl > Si-NH-Si > Si-O2CCH3 > Si-OCH3 >Si-OCH2CH3. An analysis of the relevant bond energies indicatesthat the formation of the Si-O-surface bond is the driving force forthe reaction under dry and aprotic conditions. Secondary factors
contributing to the reactivity of organofunctional silanes witha surface are the volatility of the byproducts, the ability of the
byproduct to hydrogen bond with the hydroxyls on the surface, theability of the byproduct to catalyze further reactions, e.g. HCl or
acetic acid, and the steric bulk of the groups on the silicon atom.
Although they are not the most reactive organosilanes,
the methoxy and ethoxysilanes are the most widely usedorganofunctional silanes for surface modification. The reasons forthis include the fact that they are easily handled and the alcohol
byproducts are non-corrosive and volatile. The methoxysilanes arecapable of reacting with substrates under dry, aprotic conditions,while the less reactive ethoxysilanes require catalysis for suitable
reactivity. The low toxicity of ethanol as a byproduct of the reaction
favors the ethoxysilanes in many commercial applications. The
vast majority of organofunctional silane surface treatments are
performed under conditions in which water is a part of the reaction
medium, either directly added or contributed by adsorbed water on
the substrate or atmospheric moisture.

Common Leaving Groups
Advantage

Disadvantage

dimethylamine

reactive,
volatile byproducttoxichydrogen chloride

reactive,
volatile byproductcorrosive

silazane (NH3)

volatile

limited availability

methoxy

moderate reactivity,
neutral byproductmoderate toxicity

ethoxylow toxicity

lower reactivity

PR
O

O

Type

Silane Requirements for Surface Coverage

Surface Area of Common Substrates, m2/g
Type

m2/g

E-Glass

0.10-0.12

Hydrolytic Deposition – creating a minimum uniform coverage
Silica, ground
The majority of surface modifications are affected by the
Silica, diatomaceoushydrolytic deposition of trialkoxysilanes. Specific Wetting Surface
Calcium silicate(SWS) is a value determined empirically for the amount of silane
Clay, kaolin
required to obtain minimum uniform multilayer coverage on a
Talc
substrate.
Silica, fumed
amount of silane (g) = amount of substrate (g) x surface area of filler (m2/g)
specific wetting surface
Specific Wetting Surface (SWS) numbers are found throughout the catalog.

1-2
1-3.5
2.6
7
7
150-250

Monolayer Deposition

Monolayer deposition is a widely used term, but the definition of a monolayer is usually contextual. The
simplest definition is that there is an attachment of a surface treatment molecule to every surface atom. However
coverage of this type is probably never the case. In general, monolayer coverage refers to the reaction of thesurface treatment molecule with available hydroxyl groups on the surface, but this is also almost never achieved.
For example, hydrated fumed silica has 4.4-4.6 –OH/nm2. A high surface fumed silica contains has a surface areaof 3.25 x 1020 nm2/gram and thus 1.5 x 1021 hydroxyls. If this is divided by Avogadro’s number, 6.02 x 1023, 2.4
x10-3 moles of silane are required to provide coverage on 1 gram of fumed silica. Monolayer bonding of a silane
with a molecular weight of 200 would deposit 0.5 g silane per gram of silica. In fact, most monolayer depositionsof silanes result in about 10% of the calculated requirement, i.e. 0.5g silane per gram of fumed silica.
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129

Silane Coupling Agents

Organofunctional
Group

LinkerSiliconatom

R’

PolymerR(CH 2)n

R’ R

HO Si

(CH2)nHydrolyzable
GroupsPRO

The general formula for a silane coupling agent typicallyshows the two classes of functionality. X is a hydrolyzablegroup typically alkoxy, acyloxy, halogen or amine. Followinghydrolysis, a reactive silanol group is formed, which cancondense with other silanol groups, for example, those on thesurface of siliceous fillers, to form siloxane linkages. Stablecondensation products are also formed with other oxides suchas those of aluminum, zirconium, tin, titanium, and nickel.
Less stable bonds are formed with oxides of boron, iron,and carbon. Alkali metal oxides and carbonates do not form
stable bonds with Si-O-. The R group is a nonhydrolyzableorganic radical that may posses a functionality that imparts
desired characteristics.
The final result of reacting an organosilane with asubstrate ranges from altering the wetting or adhesion
characteristics of the substrate, utilizing the substrate tocatalyze chemical transformations at the heterogeneousinterface, ordering the interfacial region, and modifying its
partition characteristics. Significantly, it includes the ability
to effect a covalent bond between organic and inorganic
materials.

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O
O

R

Si

X X

130

HO Si

O

OH
O
Si O Si
SubstrateOH
O Surface
HO Si
O(CH 2)nO

R-(CH2)n—Si—X3

Polymer

OH
Si OH
OH

F

Silane coupling agents have the ability to form a durable
bond between organic and inorganic materials. Encounters
between dissimilar materials often involveat least one
member that’s siliceous or has surface chemistry withsiliceous properties; silicates, aluminates, borates, etc., arethe principal components of the earth’s crust. Interfaces
involving such materials have become a dynamic areaof chemistry in which surfaces have been modified inorder to generate desired heterogeneous environments or
to incorporate the bulk properties of different phases into a
uniform composite structure.

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X

TrialkoxysilaneR(CH2)nH3C Si CH3
X
Monoalkoxysilane

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Substrate
SurfaceEnabling Your Technology

Selecting A Silane Coupling Agent Polymer Applications

F

Coupling agents find their largest application in the areaof polymers. Since any silane that enhances the adhesionof a polymer is often termed a coupling agent, regardlessof whether or not a covalent bond is formed, the definition
becomes vague. In this discussion, the parochial outlook
will be adopted, and only silanes that form covalent bonds
directly to the polymer will be considered. The covalentbond may be formed by reaction with the finished polymer
or copolymerized with the monomer. Thermoplastic bondingis achieved through both routes, although principally theformer. Thermosets are almost entirely limited to the latter.
The mechanism and performance of silane coupling agentsis best discussed with reference to specific systems. The
most important substrate is E-type fiberglass, which has 6-15
silanol groups per mμ2.

O

HC CH2+ H2C

O

Thermosets

Acrylate Coupling Reaction

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(CH2)nSiradicalsourceCH3

PRO

Acrylates, methacrylates and Unsaturated Polyesters,
owing to their facility for undergoing free-radical
polymerization, can be modified by copolymerization withsilanes that have unsaturated organic substitution. The usual
coupling agents for thermoset polyesters undergo radical
copolymerization in such systems. These resins, usuallyof loosely defined structure, often have had their viscosity
reduced by addition of a second monomer, typically styrene.
In general, better reinforcement is obtained when the silane
monomer matches the reactivity of the styrene rather than the
maleate portion of the polyester.
Methacrylyl and styryl functional silanes undergo addition
much more readily than vinylsilanes. A direct approach toselecting the optimum silane uses the e and Q parametersof the Alfrey-Price treatment of polymerization. Here eindicates the polarity of the monomer radical that forms at
the end of a growing chain, while Q represents the resonancestabilization of a radical by adjacent groups. Optimum
random copolymerization is obtained from monomers
with similar orders of reactivity. Vinyl functional silanes
mismatch the reactionary parameters of most unsaturated
polyesters. However, they can be used in direct high pressurepolymerization with olefins such as ethylene, propylene anddienes.

C CO
CH3

CHCH 2 CCH2

CHCH 2C O
O(CH2)nSi

Unsaturated Polyester (Styrene) Coupling Reaction+

Polymer

CH2

CH Si

peroxide

Si
CH2
CH2
Polymer
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131

Urethanes

Moisture-Cureable Urethanes

Si

O
Polymer -NCNCH 2CH 2CH 2

Si

H H

CH 3

NCO

HOCH 2CH 2+

HOCH 2CH 2

NCH 2CH 2CH 2

Si

NCO

O

N

CH 2CH 2

NCH 2CH 2CH 2 Si
C OCH 2CH 2

O

CH 3

C N

O

Polyurethane Coupling Reactions

H2NCH 2CH2NHCH 2CH2CH2

PRO

Epoxycyclohexyl and glycidoxy functionalsilanes are used to pretreat the filler or blended
with the glycidylbisphenol-A ether. Amine
functional silanes can likewise be used topretreat the filler or blended with the hardener
portion. Treatment of fillers in epoxy adhesives
improves their dispersibility and increases themechanical properties of the cured resin. A
large application area is glass cloth-reinforced
epoxy laminates and prepregs in aerospace andelectrical printed circuit board applications.

O
H2C CH CH2 O

+

CH3

OH

CH2

OCH 2 CH

CH3
CH2O

CH2

CH3

Gelest, Inc.

OO CH2 CH CH2

CH2
CH3

OH

CH3

CH2O

Phenolic resins are divided into base catalyzed
single-step resins called resols or better known acidcatalyzed two-step systems called novolaks. Althoughfoundry and molds are formulated with resols such asaminopropylmethyldialkoxysilanes, the commercial utilizationof silanes in phenolic resins is largely limited to novolak/
glass fabric laminates and molding compounds. The phenolichydroxyl group of the resins readily react with the oxirane ringof epoxy silanes to form phenyl ether linkages. When phenolic
resins are compounded with rubbers, as in the case with nitrile/
phenolic or vinyl butyral/phenolic adhesives, or impactresistant molding compounds, additional silanes, particularly
mercapto-functional silanes, have been found to impart greaterbond strength than silanes that couple to the phenolic portion.
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Si

CH3

Phenolics

132

H 2NCH 2CH 2CH 2

O

Aminosilanes have the general ability to convert isocyanate
functional urethane prepolymers to systems that crosslink in thepresence of water and a tin catalyst. The preferred aminosilanes aresecondary containing methyl, ethyl or butyl substitutions on nitrogen.

Epoxies+

Polymer-NCO

F

Thermoset urethane can be effectively coupled with two typesof silanes. The first type, including isocyanate functional silanes,
may be used to treat the filler directly or integrally blended with thediisocyanate (TDI, MDI, etc.) prior to cure. Amine and alkanolaminefunctional silanes, on the other hand, are blended with the polyol
rather than the diisocyanate. Isocyanate functional silanes couple withthe polyol. Alkanolamine functional silanes react with the isocyanate
to form urethane linkages, while amine silanes react with theisocyanates to yield urea linkages. A typical application for coupledurethane system is improving bond strength with sand in abrasionresistant, sand-filled flooring resins.

OCH 2 CH CH2NCH 2CH2NCH 2CH2CH2
H

Epoxy Coupling Reaction

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SiEnabling Your Technology

Thermoplastics

F

Scanning electron
micrograph at a broken
gear tooth from a
non-coupled glass fiber/
acetal composite. Notethat cleavage occurred
between fibers.

Scanning electron
micrograph at a broken
gear tooth from an aminosilane-coupled glass
fiber/nylon 6/6 composite. Note how fibers
have broken as well as
matrix.

PR
OO

Thermoplastics provide a greater challenge
in promoting adhesion through silane coupling
agents than thermosets. The silanes must react withthe polymer and not the monomeric precursors,which not only limits avenues for coupling, butalso presents additional problems in rheology andthermal properties during composite formulation.
Moreover mechanical requirements here arestringently determined. Polymers that containregular sites for covalent reactivity either in the
backbone or in a pendant group include polydienes,
polyvinylchloride, polyphenylene sulfide, acrylic
homopolymers, maleic anhydride, acrylic, vinyl
acetate, diene-containing copolymers, and halogen
or chlorosulfonyl-modified homopolymers.
A surprising number of these are coupled byaminoalkylsilanes. Chlorinated polymers readily
form quaternary compounds while the carboxylate
and sulfonate groups form amides and sulfonamides
under process conditions. At elevated temperatures,the amines add across many double bonds althoughmercaptoalkylsilanes are the preferred coupling
agents. The most widely used coupling agents, theaminoalkylsilanes, are not necessarily the best.
Epoxysilanes, for example, are successfully usedwith acrylic acid and maleic acid copolymers.

Chopped fiberglass
strand sized with aminosilanes is a commonlyused reinforcement forhigh temperature thermoplastics.

Thermoplastic Condensation Polymers

The group of polymers that most closely
approaches theoretical limits of composite strength
does not appear to contain regular opportunities
for covalent bond formation to substrate. Most of
the condensation polymers including polyamides,
polyesters, polycarbonates, and polysulfones are inthis group. Adhesion is promoted by introducing
high energy groups and hydrogen bond potential
in the interphase area or by taking advantageof the relatively low molecular weight of thesepolymers, which results in a significant opportunity
for end-groupreactions. Aminoalkylsilanes,
chloroalkylsilanes, and isocyanatosilanes are theusual candidates for coupling these resins. This
group has the greatest mechanical strength of thethermoplastics, allowing them to replace the castmetals in such typical uses as gears, connectors andbobbins.
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H

H

Gelest, Inc.

SiOCNCH 2CH2CH2+

OO
OCH 2CH2CH2CH2

OCH 2CH2CH2CH2C O CH2CH2CH2CH2OH
n

O C

O

O

O C

C

O
O

CH2CH2CH2CH2On

C NCH 2CH2CH2 Si
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133

Polyolefins

Vinylsilanes
are used in
PE and EPDM
insulated wireand cableO

F

The polyolefins and polyethers present no direct opportunity to covalent coupling. Until recently, the principal
approach for composite formulation was to match the surface
energy of the filler surface, by treating it with an alkylsubstituted silane, with that of the polymer. For optimum reinforcement, preferred resins should be of high molecular weight,
linear, and have low melt viscosity. Approaches to improved
composite strength have been through compatibility withlong-chain alkylsilanes or aminosilanes. Far more effective
is coupling with vinyl or methacryloxy groups, particularly
if additional coupling sites are created in the resin by addition of peroxides. Dicumyl peroxide and bis(t-butylperoxy)compounds at levels of 0.15% to 0.25% have been introduced
into polyethylene compounded with vinylsilane-treated glass
fibers for structural composites or vinylsilane-treated clay
for wire insulation. Increases of 50% in tensile and flexural
properties have been observed in both cases when comparedto the same silane systems without peroxides.
Another approach for coupling polypropylene and polyethylene is through silylsulfonylazides. Unlike azide boundto silicon, sulfonyl azides decompose above 150°C to form amolecule of nitrogen and a reactive nitrene that is capable ofinsertion into carbon-hydrogen bonds, forming sulfonamides,
into carbon-carbon double bonds, forming triazoles, and into
aromatic bonds, forming sulfonamides. Fillers are treated firstwith the silane and then the treated filler is fluxed rapidly withpolymer melt.

PR
O

N3SO 2

134

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CH 2CH 2

CH 3
Si(CH 2CH)+

SIA0790.0
CH 3

120-140 °C(CHCH)HNSO 2
CH 2CH 2Si

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Enabling Your Technology

Dipodal Silanes

Dipodal tetrasulfide silanes are used in “green” tires

O

F

Functional dipodal silanes and combinations of non-functional
dipodal silanes with functional silanes have significant impact on
substrate bonding, hydrolytic stability and mechanical strength ofmany composites systems. They possess enabling activity in many
coatings, particularly primer systems and aqueous immersion
applications. The effect is thought to be a result of both theincreased crosslink density of the interphase and a consequence ofthe fact that the resistance to hydrolysis of dipodal materials (withthe ability to form six bonds to a substrate) is estimated at close
to 100,000 times greater than conventional coupling agents (withthe ability to form only three bonds to a substrate).
Both because dipodal silanes may not have functional groups
identical to conventional coupling agents or because of economic
considerations, conventional coupling agents are frequently usedin combination with a non-functional dipodal silanes. In a typicalapplication a dipodal material such as bis(triethoxysilyl)ethane(SIB1817.0) is combined at a 1:5 to 1:10 ratio with a traditional
coupling agent. It is then processed in the same way as the
traditional silane coupling agent.

Dipodal vs Conventional Silanes

Functional Dipodals

in acidic aqueous environments

PRO

Chemical resistance test in 6N HCl

Water contact angle

120.0

H

H

N

N CH2CH2 N

H

100.0

CH2 CH2CH2CH2CH2 CH2

CH2

CH2

80.0

CH2 CH2

CH2

CH2

60.0
40.0
20.0

SIB1824.0
SIO6715.0
SIB1829.0
SID4632.0(CH3O)3Si

Si(OCH 3)3(C2H5O)3Si

0hr
24hr
72hr
168hr
336hr
504hr
840hr
1176hr1680hr2352hr3024hr3696hr4368hr5040hr5712hr6752hr8064hr8736hr9408hr10080hr
10752hr
11592hr

S S
CH2
CH2

H
C C

H

Si(OC2H5)3

TitaniumNo silane
Methacryloxypropylsilane
Methacryloxypropylsilane + 10% dipodal

Nil
0.25
10.75

Cold-rolled steel
Nil
7.0
28.0
(cohesive failure)

CH2

CH2

CH2

SB1820..0Si(OC2H5)3

SIB1824.6

Non-Functional Dipodals(C2H5O)3Si

CH2CH2 Si(OC2H5)3

SIB1817.0

Wet adhesion to metals (N/cm)

10% in i-PrOH

CH2(C2H5O)3Si

Glass surfaces treated with: bridged dipodal silane SIB1824.0 1,8-bis (triethoxysilyl)octane;
conventional silane SIO6715.0 n-octyltriethoxysilane; pendant dipodal silane SIB1829.0
1,2-bis(trimethoxysilyl)decane; conventional silane, SID4632.0 n-decyltriethoxysilane.

Primer on metal

Si(OCH 3)3
SIB1834.0

SIB1833.0

0.0

Effect of dipodal -SiCH2CH2Si- on the bond strength ofa crosslinkable ethylene-vinyl acetate primer formulation(CH3O)3Si(C2H5O)3Si CH2CH2CH2CH2CH2CH2CH2CH2

Si(OC2H5)3

SIB1824.0(CH3O)3Si

Si(OCH 3)3

CH2CH2
CH2CH2 Si(OCH 3)3

90º peel strength after 2 h in 80ºC water.

SIB1831.0

Si(OCH 3)3
SIB1829.0

P. Pape et al, in Silanes and Other Coupling Agents, ed. K. Mittal, 1992, VSP, p105

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135

Non-Functional Dipodal Silane Selection Guide
aliphatic
5 Hydrolyzeable Groups

6 Hydrolyzeable Groups

Product Code/Name

Product Code/Name

Product Code/Name

1

SIB1635.0
bis(methyldimethoxysilyl)methane2

SIB1615.0
bis(methyldiethoxysilyl)ethane2

SIB1632.0
bis(methyldimethoxysilyl)ethane

SIB1821.0
bis(triethoxysilyl)methane
SIT8185.8
1-(triethoxysilyl)-2(diethoxymethylsilyl)ethane

SIB1817.0
bis(triethoxysilyl)ethaneF

Spaceratoms

4 Hydrolyzeable Groups

SIB1829.0
1,2-bis(trimethoxysilyl)decane

O

2

SIB1830.0
bis(trimethoxysilyl)ethane

6

SIB1832.0
1,6-bis(trimethoxysilyl)hexane

6

SIB1829.7
1,6-bis(trimethoxysilyl)-2,5-dimethylhexane

PR
O

8
8

SIB1824.0
1,8-bis(triethoxysilyl)octane
SIB1832.7
1,8-bis(trimethoxysilyl)octane

aromatic/heteroatom

4 Hydrolyzeable Groups

5 Hydrolyzeable Groups

6 Hydrolyzeable Groups

Product Code/Name

Product Code/Name

Product Code/Namearomatic

SIB1831.0
bis(trimethoxysilylethyl)benzene

aromatic

SIB1816.6
bis(triethoxysilyl)benzene

aromatic

SIB1832.2
bis(trimethoxysilylmethyl)benzene

ethylene oxide

SIB1824.84
bis(triethoxysilylpropyl)poly(ethyleneoxide)siloxane

SIB1820.2
bis(triethoxysilylethyl)tetramethyldisiloxane

136

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Enabling Your Technology

Linker LengthF

Effect of linker length on the separation ofaromatic hydrocarbons

PR
O

O

An important factor in controlling the effectivenessand properties of a coupled system is the linker between
the organic functionality and the silicon atom. The
linker length imposes a number of physical property andreactivity limitations. The desirability of maintaining thereactive centers close to the substrate are most importantin sensor applications, in heterogeneous catalysis, fluorescent materials and composite systems in which theinterfacing components are closely matched in modulus
and coefficient of thermal expansion. On the other
hand, inorganic surfaces can impose enormous stericconstraints on the accessibility of organic functionalgroups in close proximity. If the linker length is longthe functional group has greater mobility and can extend
further from the inorganic substrate. This has importantconsequences if the functional group is expected toreact with a single component in a multi-component
organic or aqueous phases found in homogeneousand phase transfer catalysis, biological diagnostics
or liquid chromatography. Extended linker length isalso important in oriented applications such as selfassembled monolayers (SAMs). The typical linker
length is three carbon atoms, a consequence of the factthat the propyl group is synthetically accessible and has
good thermal stability.

T. Den et al, in “Silanes, Surfaces, Interfaces” D. Leyden ed., 1986 p403.

Silanes with short linker length
CH3Cl

H3C Si O Si Cl
CH3

SIT8572.6

Silanes with extended linker length
OCH 3

CH3CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2 Si OCH 3

SIH5925.0

Cl

OCH 2CH3N C CH2CH2 Si OCH 2CH3
OCH 2CH3N

SIC2445.0

Cl

C CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2ClCl
CH2CH2CH2CH2 Si Cl

SIH6175.0

SIC2456.3

OC2H5
+ OCH
O
3
OC2H
OC2H5
SIC2445.0
5CH3COCH 2Si OCH 3
HO CH2 Si O CH2 Si OC2H5
OCH 3
OC2H5
OC2H5

Si Cl

SIC2456.3
SIH5925.0

OC2H5
SIT8572.6

HO CH2 Si OC2H5

OCH 3

SIP6724.9

Cl
Cl

SIA0055.0

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CH3OCH 2CH2O

CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2CH2

SIM6491.5

Si Cl
Cl

SIP6724.9

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137

Combining Polarity and Non-Polarity in Silane
Surface Treatments

Contact Angles of Water and Hexadecaneon Silane Layers with Tipped and Embedded Polar Groups

TippedEmbeddedContact angle (degrees)

Hydrophobic control
Dodecyltriethoxysilane (SID4632.0)

Water Hexadecane
100
21

Hydrophilic tipped silanes(Methoxytriethyleneoxy)trimethoxysilylundecanoate (SIM6493.7)
Methoxyethoxyundecyltrichlorosilane(SIM6491.5)
Hydrophilic embedded silanes
Triethoxysilylpropoxy(triethyleneoxy)octadecanoate
Triethoxysilylpropoxy(triethyleneoxy)dodecanoate (SIT8186.3)
Triethoxysilylpropoxy(hexaethyleneoxy)octadecanoate
Triethoxysilylpropoxy(hexaethyleneoxy)dodecanoate

74

7

73

5

68

28

62

6

F

Silane surface treatments with either tipped or embedded polarity
provide an avenue to overcome traditional limitations imposed bysurface energetics. They allow formation of surfaces that respond tosolvent, electrical potential and thermal transitions by dramaticallyvarying wettability. Silane treated substrates associated with avariety of multiphasic applications, including particle dispersion,
reversed-phase HPLC and diagnostic assays can also take advantage
of surfaces which combine polarity with non-polarity.
Comparative contact angle data of various silanes with polar
substitution having degrees of hydrogen bonding and in which
the polar groups are either embedded or are tipped along withhydrophobic and hydrophilic controls demonstrate interesting
trends. Tipped polar silanes show higher contact angles with water
than the embedded polar silanes, regardless of opportunities forhydrogen-bonding. The number of PEG units has relatively small
impact on contact angle of the tipped silanes although an increasein number of PEG units does correlate to decreased water contact
angle. PEG units embedded in silanes have a stronger effect on
contact angle than PEG units in the tipped analogs. Hexadecane
contact angle seems to be controlled by the number of carbon atoms
in the carbon chain, although a step-change increase in contact angle
is observed with C18-PEG silanes.
Polarity is generally associated with hydrophilicity. Nonpolarity is generally associated with hydrophobicity. In the caseof surface treatments, it may be that the term hydrophobic (“waterhating” or “water fearing”) suggests a too simplistic explanation. It
appears not so much that hydrocarbons hate water, but that water
hates hydrocarbons. Hydrocarbons appear indifferent to water. In
the case of alkylsilanes tipped with polar groups, water molecularinteraction proceeds until interaction with the hydrocarbon. In thecases of alkylsilanes in which polar groups are embedded near thesurface, the hydrocarbon poses only a small barrier to the access ofwater to the polar groups.

SilaneSilane Surface Treated Particles – Effect on Rheology
45 wgt% TiO2 in Mineral Oil

60000.0

Viscosity (cps)50000.040000.051500.041500.033625.030000.020000.0
10000.0
0.0

1850.0
C12PEG3Si
C8Si
C12Si
C18Si
(SIT8163.3) (SIO6715.0) (SID4632.0)) (SIO6645.0))

Dispersion viscosity of different silane treated titanium dioxide pigment at 65%
loading in mineral oil. DodecanoylPEG3silane (SIT8186.3) with embeddedpolarity provides lower viscosity than octyl-, dodecyl- and octadecylsilanes.

65 wgt% red iron oxide in Ethylhexylpalmitate
46
00
0

0.0

600000.0500000.0

100000.0

193
000
.0

261
25.
0

200000.0

136
000
.0

155
000
.0

300000.0

10
52
50
.0

400000.0

0.0dGelest, Inc.

17

ate

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16

tre

138

3

Un

The incorporation of polar functionality into hydrocarbon substituted
silanes can have dramatic effects on the dispersion of particles.
Depending on the media, the appropriate mixed polarity surface
treatment can improve dispersion, reduce viscosity or increaseloading.

35

0.0
61
A0
SI
Si
C3 )
-9 2.7
G6 49
PE M6
I
(S
i )
8S .0
C1 645
6
IO
(S
i )
2S .0
C1 4632
ID(S
Si .0)
C8 15
67
IO
(S
i
3S )
EG .3
2P 63
C1 IT81(S

Particle Dispersion Utilizing Silanes with Embedded Polarity

28

B. Arkles et al in “Silanes & Other Coupling Agents Vol 5, K. Mittal Ed. p.51
VSP (Brill) 2009.

Viscosity (cps)

PR
O

O

Hydrophilic control
Methoxy(polyethyleneoxy)6-9propyltrimethoxysilane (SIM6492.7)

42

147
500
.0

It may be desirable for a surface treatment to possess both polargroups and non-polar groups. The polarity may either embedded
below a hydrocarbon tail (i.e. proximal to the surface) or tipped at theend of the hydrocarbon (i.e. proximal to the contacting phase).

Dispersion viscosity of different silane treated iron oxide pigments at 65%
loading in 2-ethylhexylpalmitate. DodecanoylPEG3silane (SIT8186.3) withembedded polarity provides lower viscosity than alkyl, polyethyleneoxide,
and aminopropyl substituted silanes.

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Enabling Your Technology

Partition, Orientation and
Self-Assembly in Bonded Phases

Normal Phase HPLC of Carboxylic Acids with a
C23-Silane Bonded Phase

Chromatography

Octadecyl, cyanopropyl and branched tricocyl silanes
provide bonded phases for liquid chromatography. Reversephase thin-layer chromatography can be accomplished bytreating plates with dodecyltrichlorosilane.

Liquid Crystal Displays

H3C

The interphase can also impose orientation of the bulk
phase. In liquid crystal displays, clarity and permanence ofimage are enhanced if the display can be oriented parallel orperpendicular to the substrate. The use of surfaces treated withoctadecyl(3-(trimethoxysilyl)propyl) ammonium chloride(perpendicular) or methylaminopropyl-trimethoxysilane(parallel) has eliminated micromachining operations The
oriented crystalline domains often observed in reinforced
nylons have also been attributed to orientation effects of thesilane in the interphase.

Si CH3F

Cl

O

Orientation effects of silanes for passive LCDs

OCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUMOCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM
CHLORIDE
CHLORIDE (SIO6620.0)(SIO6620.0)

Self-Assembled Monolayers (SAMs)

PR
O

A Self-Assembled Monolayer (SAM) is a one molecule
thick layer of material that bonds to a surface in anordered way as a result of physical or chemical forces
during a deposition process. Silanes can form SAMs
by solution or vapor phase deposition processes. Most
commonly, chlorosilanes or alkoxysilanes are used and once
deposition occurs a chemical (oxane) bond forms with thesurface rendering a permanent modification of the substrate.
N-METHYLAMINOPROPYLTRIMETHOXYSILANE (SIM6500.0)
Applications for SAMs include micro-contact printing, soft
lithography, dip-pen nanolithography, anti-stiction coatingsand orientation layers involved in nanofabrication of MEMs,
fluidic microassemblies, semiconductor sensors and memory
devices.
Common long chain alkyl silanes used in the formationof SAMs are simple hydrocarbon, fluoroalkyl and end-group
substituted silanes. Silanes with one hydrolyzeable group
F. Kahn., Appl. Phys. Lett. 22, 386, 1973
maintain interphase structure after deposition by forming
Micro-Contact Printing Using SAMs
a single oxane bond with the substrate. Silanes with threehydrolyzeable groups form siloxane (silsesquioxane)
spin casting of sol-gel precursor
polymers after deposition, bonding both with eachand soft bake
PDMS
other as well as the substrate. For non-oxide metal“inked” with solution
amorphous oxide
substrates, silyl hydrides may be used, reacting withof C -Silane in hexane
Substrate
Substrate
the substrate by a dehydrogenative coupling.
The perpendicular orientation of silanes withmicrocontact printing of C -Silane
polishing and crystallization
C10 or greater length can be utilized in microSAMs of C -Silane
contact printing and other soft lithography methods.
crystallization oxide
Substrate(2-3nm)Substrate
Here the silane may effect a simple differential
adsorption, or if functionalized have a direct sensor
effect.
18

18

18

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139Modification ofMetal Substrates

The optimum performance of silanes is associatedwith siliceous substrates. While the use of silanes
has been extended to metal substrates, both theeffectiveness and strategies for bonding to these lessreactive substrates vary. Four approaches of bonding
to metals have been used with differing degrees ofsuccess. In all cases, selecting a dipodal or polymericsilane is preferable to a conventional trialkoxy silane.

figure courtesy of

M. Banaszak-HollF

Metals that form stable hydrides, e.g. titanium,
zirconium, nickel. In a significant departure fromtraditional silane coupling agent chemistry, the abilityof certain metals to form so-called amorphous alloys
with hydrogen is exploited in an analogous chemistry
in which hydride functional silanes adsorb and thencoordinate with the surface of the metal.1 Most silanes ofthis class possess only simple hydrocarbon substitution
such as octylsilane. However they do offer organic
compatibility and serve to markedly change wet-outof the substrate. Both hydride functional silanes andtreated metal substrates will liberate hydrogen in thepresence of base or with certain precious metals such as
platinum and associated precautions must be taken.

O

Metals that form hydrolytically stable surface
oxides, e.g. aluminum, tin, titanium. These oxidized
surfaces tend to have sufficient hydroxyl functionality
to allow coupling under the same conditions applied tothe siliceous substrates discussed earlier.

Octysilane adsorbed on titanium

PR
O

Metals that form hydrolytically or mechanicallyunstable surface oxides, e.g. iron, copper, zinc.
These oxidized surfaces tend to dissolve in waterleading to progressive corrosion of the substrate orform a passivating oxide layer without mechanicalstrength. The successful strategies for coupling to thesesubstrates typically involves two or more silanes. One
silane is a chelating agent such as a diamine, polyamineor polycarboxylic acid. A second silane is selectedwhich has a reactivity with the organic component andreacts with the first silane by co-condensation. If afunctional dipodal or polymeric silane is not selected,
10-20% of a non-functional dipodal silane typically
improves bond strength.
Metals that do not readily form oxides, e.g.
nickel, gold and other precious metals. Bonding
to these substrates requires coordinative bonding,typically a phosphine, sulfur (mercapto), or aminefunctional silane. A second silane is selected which hasa reactivity with the organic component. If a functional
dipodal or polymeric silane is not selected, 10-20%
of a non-functional dipodal silane typically improves
bond strength.

OCH 3
N

CH2CH2SCH 2CH2CH2Si

OCH 3

OCH 3
SIP6926.2

140

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H
H2C

CH(CH 2)8CH2Si H
SIU9048.0

H

Metal

Coupling Agents for Metals*
Class
Screening
Candidates

Copper

Amine

Gold

SulfurPhosphorus

Iron
Tin

SSP-060
SIU9048.0

SIT8398.0

SIT7908.0
SID4558.0

SIP6926.2
SIB1091.0

Amine
Sulfur

SIB1834.0
SIB1824.6

WSA-7011
SIM6476.0

Amine

SIB1835.5

Titanium Epoxy
HydrideSIG5840.0
SIU9048.0

SIE6668.0

Zinc

SSP-060
SIT8402.0

SIT8398.0
SIT8192.6

Amine
Carboxylate*These coupling agents are almost always used in conjunction with asecond silane with organic reactivity or a dipodal silane.
1. B. Arkles et al J. Adhesion Science Technol, 2012, 26, 41.

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Enabling Your Technology

Thermal Stability of Silane
Coupling Agents

Relative Thermal Stability of Silanes
X
Si X
X

R

CH2

X
Si X
X

(alpha substitution)R

CH2CH2CH2

X
Si X
X

(gamma substitution)(beta substitution)F

R

CH2CH2

R

Greater Stability
CH2

CH2CH2

R

CH2

X
Si X
X

X
Si X
X

O

The general order of thermal stability
for silane coupling agents is depicted.Most
commercial silane coupling agents haveorganic functionality separated from the silicon
atom by three carbon atoms and are referred to
as gamma-substituted silanes. The gammasubstituted silanes have sufficient thermal
stability to withstand short-term process
conditions of 350°C and long-term continuous
exposure of 160°C. In some applications
gamma-substituted silanes have insufficient
thermal stability or other system requirementsthat can eliminate them from consideration.
In this context, some comparative guidelines
are provided for the thermal stability ofsilanes. Thermogravimetric Analysis (TGA)
data for hydrolysates may be used for benchmarking. The specific substitution also plays
a significant role in thermal stability. Electron
withdrawing substitution reduces thermal
stability, while electropositive groups enhancethermal stability.

(ethylene bridged
substituted aromatic)(substituted aromatic)

PR
O

Thermal Stability of Silanes
220°
360°
395°

390°
435°

495°

485°

Flexible multi-layer circuit boards forcell-phones utilize polyimide films coupledwith chloromethylaromatic silanes.

530°
25% weight loss of dried hydrolysates as determined by TGA

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141

CH 2
CH 2

H2C

Si

OCH 3

nC 4H9SIB1932.4

OCH 3

CH 2

H2C

2
N

Si

CH 3CH 2CH 2CH 2

OCH 3
OCH 3

+
OH

OH
Substrate

H

H

NCH 2CH2CH2CH3

NCH 2CH2CH2CH3

CH2

CH2

CH2

CH2

CH2

CH2

CH3O Si OCH 3
O

H
N

CH3O

H

N

Si

O
O
CH 3 CH 3

Si

OCH 3

O
Substrate

B. Arkles et al in Silanes and other Coupling Agents, Vol. 3. K Mittal ed VSP, 2004, p179.

Extent of reaction of organosilanes with fumed silica

PR
O

N

CH 2

O

Volatile cyclic azasilanes are of particularinterest in the surface modification of hydroxylcontaining surfaces, particularly inorganic surfaces
such as nanoparticles and other nano-featured
substrates. In these applications the formation ofhigh functional density monolayers is critical. The
cyclic azasilanes react with hydroxyl groups of awide range of substrates at low temperatures by aring-opening reaction that does not require water asa catalyst. Significantly, no byproducts of reaction
form. The reactions of cyclic azasilanes are rapid
at room temperature, even in the vapor phase.
They also react rapidly at room temperature withisolated non-hydrogen bonded hydroxyls which
do not undergo reaction with alkoxysilanes undersimilar conditions. The four most common cyclic
azasilanes structures are depicted.

Anhydrous deposition with Cyclic Azasilanes

F

Cyclic Azasilanes

H
N

N

Si

H MeO OMe

SID3543.0

H3C

N

Si

H3C

CH3

CH3

SIM6501.4

M. Vedamuthu et al, J. Undergrad., Chem. Res., 1, 5, 2002

SIT8187.2
142

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Enabling Your Technology

Aqueous Systems & Water-borne Silanes
Relative Hydrolysis Rates of Hydrolyzable Groups

PR
O

O

1

F

Before most surface modification processes,
700
alkoxysilanes are hydrolyzed forming silanol-containing
t-Butoxyspecies. The silanol-containing species are highly
Isopropoxy
reactive intermediates which are responsible for bond500
Ethoxyformation with the substrate. In principal, if silanol
Methoxyethoxy
species were stable, they would be preferred for surface
Methoxy
treatments. Silanols condense with other silanols or withalkoxysilanes to form siloxanes. This can be observed
when preparing aqueous treatment solutions. Initially,100
since most alkoxysilanes have poor solubility in water,
10
1
two phases are observed. As the hydrolysis proceeds,a single clear phase containing reactive silanols forms.
With aging, the silanols condense forming siloxanes andHydrolysis Profile of Phenylbis(2-methoxyethoxy)silanol
the solution becomes cloudy. Eventually, as molecularweight of the siloxanes increases, precipitation occurs.
Hydrolysis and condensation of alkoxysilanes isdependent on both pH and catalysts. The general objective
in preparing aqueous solutions is to devise a system inwhich the rate of hydrolysis is substantially greater than
the rate of condensation beyond the solubility limit of
the siloxane oligomers. Other considerations are thework-time requirements for solutions and issues related
to byproduct reactivity, toxicity or flammability.
F. Osterholtz et al in Silanes and Other Coupling Agents ed K. Mittal, VSP, 1992, p119
Stable aqueous solutions of silanes are more
Profile for Condensation of Silanols to Disiloxanes
readily prepared if byproduct or additional alcohol
glycidoxypropylsilanetriol
is present in the solution since they contribute to an
equilibrium condition favoring monomeric species.
glycidoxypropylmethylsilanediol
Water-borne coupling agent solutions are usually
free of VOCs and flammable alcohol byproducts. Most
aminopropyldimethylsilanol
water-borne silanes can be described as hydroxyl-richsilsesquioxane copolymers. Apart from coupling, silane
monomers are included to control water-solubility andextent of polymerization. Water-borne silanes act as
pD (pH in D 0)
primers for metals, additives for acrylic latex sealants
and as coupling agents for siliceous surfaces.
E. Pohl et al in Silanes Surfaces and Interfaces ed., D. Leyden, Gordon and Breach, 1985, p481.
2

1. B. Arkles et al, “Factors contributing to the stability of alkoxysilanes in aqueous
solutions”, J. Adhesion Science Technology, 1992, 6(1), 193.

H2N

H2C
H2C

+
NH 2δ

CH2

Si

H
−
Oδ

OH

O

H2C

CH2

CH2
Si
O
OH

CH3
Si
m OH

+
NH 2δ

H
δ−
O

CH2
Si

O
n

OH

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CH2
CH2

Water-borne Silsesquioxane Oligomers
Mole %

Molecular Weight %Weight in solution

WSA-7011
Aminopropyl
WSA-9911
Aminopropyl
WSA-7021 Aminoethylaminopropyl

65-75
100
65-75

250-500
270-550
370-650

25-28
22-25
25-28

WSAV-6511

60-65

250-500

25-28

Code

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143

Masked Silanes - Latent Functionality
pretreated fillers for composites which can react
prematurely with moisture before melt compoundingor vulcanization. A general approach is to mask theorganic functionality of the silane which converts it toa storage-stable form and then to trigger the demasking
with moisture, or heat concomitant with bonding orcomposite formation.

Masked Silanes - Moisture Triggered
Single-component liquid-cure epoxy adhesives
and coatings employ dimethylbutylidene blocked
amino silanes. These materials show excellent storage
stability in resin systems, but are activated by moistureprovided by water adsorbed on substrate surfaces orfrom humidity. Deblocking begins in minutes and isgenerally complete within two hours in sections with adiffusional thickness of less than 1mm.

F

Maximum bond strength in some adhesion andbonding systems requires that the organic functionalityof a silane coupling agent becomes available during
a discrete time period of substrate - matrix contact.
Examples are epoxy adhesives in which reaction of thesilane with the resin increases viscosity of an adhesiveto the extent that substrate wet-out is inhibited andO

Hydrolysis of Blocked Aminosilanes(SID4068.0/H20/THF = 1/10/20wt%)
100

Hydrolysis of Blocked Aminosilanes

Storage Stability of Epoxy Coating Solutions

Hydrolysis of Blocked Aminosilane

Hydrolysis Rate (%)

80
with blocked
and unblocked aminosilanes
Aminosilane - SIA0610.0

60(SID4068.0/H20/THF = 1/10/20wt%)

OC2H5

H2NCH 2CH2CH2Si

100

OC2H5

PR
O

10

6

H3C

40

CH2

Blocked Aminosilane - SID4068.0

0Control
3

0

3

5

Days

15

OC2H5

OC2H5

CH3

0

2

OC2H5

C NCH 2CH2CH2Si

20

4

CH3
CH

30

Time(min)
7

60

14

HydrolysisRate
Rate(%)(%)
Hydrolysis

Viscosity (cSt)

8

OC2H5

MIBK
EtOH

80
60

MIBK
EtOH

40

20
120
0

0

Epoxy Resin Solution: 50 parts bisphenol A epoxide,
5 parts SID4068.0 or SIA0610.0, 50 parts toluene.

3
1 of 1

15

30

60

120

Time (min)Time(min)1 of 1An alternative is to use the moisture adsorbed onto fillers to liberate alcohol which, in turn, demasks the organic functionality.

Masked Silanes - Heat Triggered

Isocyanate functionality is frequently delivered to resin systems during elevated temperature bonding or melt processing
steps. Demasking temperatures are typically 160-200°C.

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OOH

Difficult Substrates

O

Na

+

Ca

Substrates with low concentrations of non-hydrogen bondedhydroxyl groups, high concentrations of calcium, alkali metals
or phosphates pose challenges for silane coupling agents.

Removing Surface Impurities
Eliminating non-bonding metal ions such as sodium,
potassium and calcium from the surface of substrates
can be critical for stable bonds. Substrate selection
can be essential. Colloidal silicas derived fromtetraethoxysilane or ammonia sols perform far better
than those derived from sodium sols. Bulk glass
tends to concentrate impurities on the surface during
fabrication. Although sodium concentrations derived
from bulk analysis may seem acceptable, the surface
concentration is frequently orders of magnitude higher.
Surface impurities may be reduced by immersion in 5%hydrochloric acid for 4 hours, followed by a deionizedwater rinse, and then immersion in deionized water
overnight followed by drying.
Oxides with high isoelectric points can adsorb carbon
dioxide, forming carbonates. These can usually beremoved by a high temperature vacuum bake.

PR
O

O

F

Silane coupling agents are generally recommended for
applications in which an inorganic surface has hydroxyl groups
and the hydroxyl groups can be converted to stable oxane bonds
by reaction with the silane. Substrates such as calcium carbonate,copper and ferrous alloys, and high phosphate and sodium glasses
are not recommended substrates for silane coupling agents. In cases
where a more appropriate technology is not available a number ofstrategies have been devised which exploit the organic functionality,
film-forming and crosslinking properties of silane coupling agentsas the primary mechanism for substrate bonding in place of bonding
through the silicon atom. These approaches frequently involve two
or more coupling agents.
Calcium carbonate fillers and marble substrates do not form
stable bonds with silane coupling agents. Applications of mixedsilane systems containing a dipodal silane or tetraethoxysilane in
combination with an organofunctional silane frequently increases
adhesion. The adhesive mechanism is thought to be due to the low
molecular weight and low surface energy of the silanes which allows
them initially to spread to thin films and penetrate porous structures
followed by the crosslinking which results in the formation of asilica-rich encapsulating network. The silica-rich encapsulating
network is then susceptible to coupling chemistry comparable tosiliceous substrates. Marble and calciferous substrates can also
benefit from the inclusion of anhydride-functional silanes which,under reaction conditions, form dicarboxylates that can form salts
with calcium ions.
Metals and many metal oxides can strongly adsorb silanes if achelating functionality such as diamine or dicarboxylate is present.
A second organofunctional silane with reactivity appropriate to theorganic component must be present. Precious metals such as gold
and rhodium form weak coordination bonds with phosphine andmercaptan functional silanes.
High phosphate and sodium content glasses are frequently themost frustrating substrates. The primary inorganic constituent issilica and would be expected to react readily with silane coupling
agents. However alkali metals and phosphates not only do not formhydrolytically stable bonds with silicon, but, even worse, catalyze
the rupture and redistribution of silicon-oxygen bonds. The firststep in coupling with these substrates is the removal of ions fromthe surface by extraction with deionized water. Hydrophobic
dipodal or multipodal silanes are usually used in combination withorganofunctional silanes. In some cases polymeric silanes withmultiple sites for interaction with the substrate are used. Some ofthese, such as the polyethylenimine functional silanes can couple tohigh sodium glasses in an aqueous environment.

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Increasing Hydroxyl Concentration

Hydroxyl functionalization of bulk silica and glass may be
increased by immersion in a 1:1 mixture of 50% aqueous
sulfuric acid : 30% hydrogen peroxide for 30 minutes
followed by rinses in D.I. water and methanol and thenair drying. Alternately, if sodium ion contamination is notcritical, boiling with 5% aqueous sodium peroxodisulfate
followed by acetone rinse is recommended1.
1. K. Shirai et al, J. Biomed. Mater. Res. 53, 204, 2000.

Catalyzing Reactions in Water-Free Environments
Hydroxyl groups without hydrogen bonding react slowly
with methoxy silanes at room temperature. Ethoxy silanes
are essentially non-reactive. The methods for enhancing
reactivity include transesterification catalysts and agents
which increase the acidity of hydroxyl groups on the substrate by hydrogen bonding. Transesterification catalysts
include tin compounds such as dibutyldiacetoxytin andtitanates such as titanium isopropoxide. Incorporation oftransesterification catalysts at 2-3 weight % of the silane
effectively promotes reaction and deposition in many
instances. Alternatively, amines can be premixed with solvents at 0.01-0.5 weight % based on substrate prior or concurrent to silane addition. Volatile primary amines such as
butylamine can be used, but are not as effective as tertiaryamines such as benzyldimethylamine or diamines such as
ethylenediamine. The more effective amines, however, aremore difficult to remove after reaction1.
1. S. Kanan et al, Langmuir, 18, 6623, 2002.

Hydroxylation by Water Plasma & Steam Oxidation
Various metals and metal oxides including silicon andsilicon dioxide can achieve high surface concentrationsof hydroxyl groups after exposure to H2O/O2 in highenergy environments including steam at 1050° andwater plasma1.
1. N. Alcanter et al, in “Fundamental & Applied Aspects ofChemically Modified Surfaces” ed. J. Blitz et al, 1999, Roy.
Soc. Chem., p212.

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Applying Silanes

Fig. 1 Reactor for slurry

Deposition from aqueous alcohol solutions is the most facile method for treatment of powders.
preparing silylated surfaces. A 95% ethanol-5% water solution is adjusted Separate filtration andto pH 4.5-5.5 with acetic acid. Silane is added with stirring to yield a 2% drying steps are required.
final concentration. Five minutes should be allowed for hydrolysis andsilanol formation. Large objects, e.g. glass plates, are dipped into the solution, agitated gently, andremoved after 1-2 minutes. They are rinsed free of excess materials by dipping briefly in ethanol.
Particles, e.g. fillers and supports, are silylated by stirring them in solution for 2-3 minutes andthen decanting the solution. The particles are usually rinsed twice briefly with ethanol. Cure of thesilane layer is for 5-10 mins at 110°C or 24 hours at room temperature (<60% relative humidity).

F

Deposition from aqueous solution is employed for most commercial fiberglass systems. The
alkoxysilane is dissolved at 0.5-2.0% concentration in water. For less soluble silanes, 0.1% of a
non-ionic surfactant is added prior to the silane and an emulsion rather than a solution is prepared.
The solution is adjusted to pH 5.5 with acetic acid. The solution is either sprayed onto the substrateor employed as a dip bath. Cure is at 110-120°C for 20-30 minutes. Stability of aqueous silane
solutions varies from 2-12 hours for the simple alkyl silanes. Poor solubility parameters limit theuse of long chain alkyl and aromatic silanes by this method. Distilled water is not necessary, butwater containing fluoride ions must be avoided.

O

Bulk deposition onto powders, e.g. filler treatment, is usually accomplishedby a spray-on method. It assumes that the total amount of silane necessary
is known and that sufficient adsorbed moisture is present on the filler tocause hydrolysis of the silane. The silane is prepared as a 25% solution
in alcohol. The powder is placed in a high intensity solid mixer, e.g. twincone mixer with intensifier. The methods are most effective. If the filler isdried in trays, care must be taken to avoid wicking or skinning of the top
layer of treated material by adjusting heat and air flow.

PR
O

Fig. 2 Vacuum
tumble dryers canbe used for slurry
treatmentof powders.

Integral blend methods are used in composite formulations. In this method the silane isused as a simple additive. Composites can be prepared by the addition of alkoxysilanes todry-blends of polymer and filler prior to compounding. Generally 0.2 to 1.0 weight percent
of silane (of the total mix) is dispersed by spraying the silane in an alcohol carrier onto apreblend. The addition of the silane to non-dispersed filler is not desirable in this techniquesince it can lead to agglomeration. The mix is dry-blended briefly and then melt compounded.
Vacuum devolatization of byproducts of silane reaction during melt compounding isnecessary to achieve optimum properties. Properties are sometimes enhanced by adding 0.51.0% of tetrabutyl titanate or benzyldimethylamine to the silane prior to dispersal.
Anhydrous liquid phase deposition of chlorosilanes, methoxysilanes, aminosilanes andcyclic azasilanes is preferred for small particles and nano-featured substrates. Toluene,
tetrahydrofuran or hydrocarbon solutions are prepared containing 5% silane. The mixture isrefluxed for 12-24 hours with the substrate to be treated. It is washed with the solvent. The
solvent is then removed by air or explosion-proof oven drying. No further cure is necessary.
This reaction involves a direct nucleophilic displacement of the silane chlorines by thesurface silanol. If monolayer deposition is desired, substrates should be predried at 150°C for
4 hours. Bulk deposition results if adsorbed water is present on the substrate. This method is
cumbersome for large scale preparations and rigorous controls must be established to ensure
reproducible results. More reproducible coverage is obtained with monochlorosilanes.
Chlorosilanes can also be deposited from alcohol solution. Anhydrous alcohols, particularly
ethanol or isopropanol are preferred. The chlorosilane is added to the alcohol to yield a2-5% solution. The chlorosilane reacts with the alcohol producing an alkoxysilane and HCl.
Progress of the reaction is observed by halt of HCl evolution. Mild warming of the solution(30-40°C) promotes completion of the reaction. Part of the HCl reacts with the alcohol to
produce small quantities of alkyl halide and water. The water causes formation of silanols
from alkoxysilanes. The silanols condense on the substrate. Treated substrates are cured for5-10 mins. at 110°C or allowed to stand 24 hours at room temperature.
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Fig. 3 Twin-cone blenders
with intensive mixing bars areused for bulk deposition ofsilanes onto powders.

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Applying Silanes

F

Vapor Phase Deposition
Silanes can be applied to substrates under dry aprotic conditions bychemical vapor deposition methods. These methods favor monolayer
deposition. Although under proper conditions almost all silanes canbe applied to substrates in the vapor phase, those with vapor pressures>5 torr at 100°C have achieved the greatest number of commercial
applications. In closed chamber designs, substrates are supported
above or adjacent to a silane reservoir and the reservoir is heated to
sufficient temperature to achieve 5mm vapor pressure. Alternatively,
vacuum can be applied until silane evaporation is observed. In still
another variation the silane can be prepared as a solution in toluene,
and the toluene brought to reflux allowing sufficient silane to enterthe vapor phase through partial pressure contribution. In general,
substrate temperature should be maintained above 50° and below 120°to promote reaction. Cyclic azasilanes deposit the quickest- usuallyless than 5 minutes. Amine functional silanes usually deposit rapidly(within 30 minutes) without a catalyst. The reaction of other silanes
requires extended reaction times, usually 4-24 hours. The reaction canbe promoted by addition of catalytic amounts of amines.

Figure 4.
Apparatus for vapor
phase silylation.

O

Figure 5.
Spin-coaterfor deposition
on wafers.

PRO

Spin-On
Spin-On applications can be made under hydrolytic conditions
which favor maximum functionalization and polylayer deposition
or dry conditions which favor monolayer deposition. For hydrolytic
deposition 2-5% solutions are prepared (see deposition from aqueous
alcohol). Spin speed is low, typically 500 rpm. Following spindeposition a hold period of 3-15 minutes is required before rinse solvent.
Dry deposition employs solvent solutions such as methoxypropanol or
ethyleneglycol monoacetate (EGMA). Aprotic systems utilize toluene
or THF. Silane solutions are applied at low speed under a nitrogenpurge. If strict monolayer deposition is preferred, the substrate shouldbe heated to 50°. In some protocols, limited polylayer formation is
induced by spinning under an atmospheric ambient with 55% relative
humidity.
Spray Application
Formulations for spray applications vary widely depending on
end-use. They involve alcohol solutions and continuously hydrolyzed
aqueous solutions employed in architectural and masonry applications.
The continuous hydrolysis is effected by feeding mixtures of silane
containing an acid catalyst such as acetic acid into a water stream bymeans of a venturi (aspirator). Stable aqueous solutions (see waterborne silanes), mixtures of silanes with limited stability (4-8 hours)
and emulsions are utilized in textile and fiberglass applications.
Complex mixtures with polyvinyl acetates or polyesters enter into thelatter applications as sizing formulations.

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Figure 6.
Sprayapplicationof silaneson large
structures.

Figure 7.
Spray &
contact roller
application ofsilanes onfiberglass.

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147

Hydrophobic Silane Selection Guide

Hydrophobic silanes employed in surface moodification form the following major categories:
Methyl-Silanes
Linear Alkyl-Silanes
Branched Alkyl-Silanes
Aromatic-Silanes
Fluorinated Alkyl-Silanes
Dialkyl-Silanes

148
150
152
154
156
156

F

Methyl-Silanes very hydrophobic, hydrolysates stable to 425°C, acceptable performance to 600°C reported, volatile
3 Hydrolyzable Groups
Hydrolyzable Groups

Product Codechloromethoxy
ethoxypropoxy
methoxyalkoxyacetoxy
dimethylamine
other amine
silazane (NH)oxime

SIM6520.0
SIM6560.0
SIM6555.0
SIM6579.0
SIM6585.0
SIM6519.0
SIT8712.0
SIT8710.0

Product NameO

methyltrichlorosilane
methyltrimethoxysilane
methyltriethoxysilane
methyltri-n-propoxysilane
methyltris(methoxyethoxy)silane
methyltriacetoxysilane
tris(dimethylamino)methylsilane
tris(cyclohexylamino)methylsilane

methyltris(methylethylketoximino)silane

PR
O

SIM6590.0

Methyl-SiloxanylSilanes

3 or more Hydrolyzable Groups

Hydrolyzable Groups

2 silicon atom compounds
chloroethoxyacetoxy

Product Code

Product Name

SIT8572.6
SIT7095.0

trimethylsiloxytrichlorosilane
tetraethoxy-1,3-dimethyldisiloxane

SIM6560.2

methyltrimethoxysilane, oligomeric hydrolysate

SID4236.0

dimethyltetramethoxydisiloxane

3 silicon atom compounds
chloromethoxy
ethoxychlorooligomeric polysiloxanes
chloromethoxy
ethoxyamine/silazane
silanolselected specialties

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F

Fumed silica treated withhexamethyldisilazane
floats on water.

2 Hydrolyzable Groups

1 Hydrolyzable Group

Product Name

Product Code

Product Name

SID4120.0
SID4123.0
SID4121.0

dimethyldichlorosilane
dimethyldimethoxysilane
dimethyldiethoxysilane

SID4076.0
SIB1072.0
SIB1068.0
SIH6102.0

dimethyldiacetoxysilanebis(dimethylamino)dimethylsilanebis(diethylamino)dimethylsilane
hexamethylcyclotrisilazane

SIT8510.0
SIT8566.0
SIT8515.0
SIT8568.0
SIM6492.8
SIA0110.0
SID3605.0
SID3398.0
SIH6110.0

trimethylchlorosilane
trimethylmethoxysilane
trimethylethoxysilane
trimethyl-n-propoxysilane
methoxypropoxytrimethylsilane
acetoxytrimethylsilane
dimethylaminotrimethylsilane
diethylaminotrimethylsilane
hexamethyldisilazane

PR
O

O

Product Code

2 Hydrolyzable Groups
Product Code

Product Name

SID3372.0
SIT7534.0

dichlorotetramethyldisiloxane
tetramethyldiethoxydisiloxane

SID3360.0

dichlorohexamethyltrisiloxane

SID3394.0
SIB1837.0

1,5-diethoxyhexamethyltrisiloxane
bis(trimethylsiloxy)dichlorosilane

DMS-K05
DMS-XM11
DMS-XE11
DMS-N05
DMS-S121 Hydrolyzable Group
Product Code

Product Name

SIP6717.0

pentamethylacetoxydisiloxane

SIB1843.0

bis(trimethylsiloxy)methylmethoxysilane

chlorine terminated polydimethylsiloxane
methoxy terminated polydimethylsiloxane
ethoxy terminated polydimethylsiloxane
dimethylamine terminated polydimethylsiloxane
silanol terminated polydimethylsiloxane

SID4125.0

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Hydrophobic Silane Selection Guide
Linear Alkyl-Silanes
Hydrolyzable Groups

3 Hydrolyzable Groups
Product Code

Product Name

C2hydrophobic, treatment for microporous mineral powders used as fillers for plastics

C3hydrophobic, treatment for microporous mineral powders used as fillers for plastics

C4

moderate hydrophobicity, penetrates microporous structures, minimal organic compatibility

SIE4901.0
SIE4901.4
SIE4901.2
SIE4899.0

ethyltrichlorosilane
ethyltrimethoxysilane
ethyltriethoxysilane
ethyltriacetoxysilane

chloromethoxy
ethoxyamine/silazane

SIP6915.0
SIP6918.0
SIP6917.0

propyltrichlorosilane
propyltrimethoxysilane
propyltriethoxysilane

F

chloromethoxy
ethoxyacetoxy

chloromethoxy
ethoxyamine/silazane

C6n-butyltrichlorosilane
n-butyltrimethoxysilane
n-butyltriethoxysilane

SIP6720.0
SIP6720.2

pentyltrichlorosilane
pentyltriethoxysilane

SIH6167.0
SIH6168.5
SIH6167.5

hexyltrichlorosilane
hexyltrimethoxysilane
hexyltriethoxysilane

SIH5846.0

heptyltrichlorosilane

SIO6713.0
SIO6715.5
SIO6715.0

octyltrichlorosilane
octyltrimethoxysilane
octyltriethoxysilane

chloromethoxy
ethoxySID2663.0
SID2670.0
SID2665.0

decyltrichlorosilane
decyltrimethoxysilane
decyltriethoxysilane

chloroSIU9050.0

undecyltrichlorosilane

moderate hydrophobicity with minimal organic compatibility

chloroethoxyO

C5

SIB1982.0
SIB1988.0
SIB1986.0

moderate hydrophobicity with moderate organic compatibility

chloromethoxy
ethoxyC7

moderate hydrophobicity with moderate organic compatibility

C8hydrophobic with moderate organic compatibility - generally most economical

chloroPR
Ochloromethoxy
ethoxyamine
silazane (NH)C10hydrophobic, concentrates on surface of microporous structures

C11hydrophobic, concentrates on surface of microporous structures, forms SAMs

C12hydrophobic, concentrates on surface of microporous structures, forms SAMs

C14hydrophobic, concentrates on surface of microporous structures, forms SAMs

C16

forms hydrophobic and oleophilic coatings, liquid a room temperature, forms SAMs

C18

forms hydrophobic and oleophilic coatings allowing full miscibility with parafinic materials, forms SAMs

C20

forms hydrophobic and oleophilic coatings, solid at room temperature

C20-24

forms hydrophobic and oleophilic coatings, solid at room temperature

chloromethoxy
ethoxychlorochloromethoxy
ethoxychloromethoxy
ethoxyamine
proprietarychlorochloroethoxyC26-C34

SIT7093.0

SIH5920.0
SIH5925.0
SIH5922.0

SIO6640.0
SIO6645.0
SIO6642.0
SIO6648.0
SIS6952.0/PPI-GC18
SIE4661.0

dodecyltrichlorosilane
dodecyltrimethoxysilane
dodecyltriethoxysilane
tetradecyltrichlorosilane
hexadecyltrichlorosilane
hexadecyltrimethoxysilane
hexadecyltriethoxysilane
octadecyltrichlorosilane
octadecyltrimethoxysilane
octadecyltriethoxysilane
octadecyltris(dimethylamino)silane
Siliclad®/Glassclad® 18
eicosyltrichlorosilane

SID4621.0
SID4622.09

docosyltrichlorosilane blend
docosyltriethoxysilane blend

forms hydrophobic and oleophilic coatings, solid at room temperature

chloro150

SID4630.0
SID4635.0
SID4632.0

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2 Hydrolyzable Groups

1 Hydrolyzable Group

Product Name

Product Code

Product Name

SIE4896.0

ethylmethyldichlorosilane

SIE4892.0

ethyldimethylchlorosilane

SIP6912.0
SIP6914.0

propylmethyldichlorosilane
propylmethyldimethoxysilane

SIP6910.0
SIP6911.0

propyldimethylchlorosilane
propyldimethylmethoxysilane

SID4591.0

dipropyltetramethyldisilazane

SIB1972.0

butylmethyldichlorosilane

SIB1934.0

pentylmethyldichlorosilane

SIH6165.6

hexylmethyldichlorosilane

SIH5845.0

heptylmethyldichlorosilane

SIO6712.0

octylmethyldichlorosilane

SIO6712.2octylmethyldiethoxysilane

SID2662.0

decylmethyldichlorosilane

Long chain alkylsilanes areprocessing additives forcrosslinked polyethylene(XLPE) used in wireand cable.

n-butyldimethyl(dimethylamino)silane

SIO6711.0
SIO6711.1

octyldimethylchlorosilane
octyldimethylmethoxysilane

SIO6711.3
SID4404.0

octyldimethyl(dimethylamino)silane
dioctyltetramethyldisilazane

SID2660.0

decyldimethylchlorosilane

PR
O

SIP6719.9

n-butyldimethylchlorosilane

O

SIB1937.0

F

Product Codedodecylmethyldiethoxysilane

SIO6625.0
SIO6629.0
SIO6627.0

octadecylmethyldichlorosilane
octadecylmethyldimethoxysilane
octadecylmethyldiethoxysilane

SID4620.0

docosylmethyldichlorosilane blend

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dodecyldimethylchlorosilane

SIO6615.0
SIO6618.0

octadecyldimethylchlorosilane
octadecyldimethylmethoxysilane

SIO6617.0

octadecyldimethyl(dimethylamino)silane

SIT8045.0

triacontyldimethylchlorosilane blend

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d ® 18SID4629.0

SID4627.0

Glasscla

dodecylmethyldichlorosilane

Control

SID4628.0

Surface conductivity ofglass substrates is reduced
by application of hydrophobic
coatings. Surface arc-tracking
is eliminated on fluorescentlight bulbs.

151

Hydrophobic Silane Selection Guide
Branched and Cyclic Alkyl-Silanes
3 Hydrolyzable Groups
Hydrolyzable Groups

Product Code

Product Namechloromethoxy
ethoxychloroSII6453.0
SII6453.7
SII6453.5
SIB1985.0

isobutyltrichlorosilane
isobutyltrimethoxysilane
isobutyltriethoxysilane
t-butyltrichlorosilane

chloromethoxy

SIC2555.0
SIC2557.0

chloroethoxychlorochloromethoxy

SID4069.0
SID4068.4
SIT7906.6
SIC2480.0
SIC2482.0

C3chloroC5

C7

norbornene
chlorochloro(3,3-dimethylbutyl)trichlorosilane(3,3-dimethybutyl)triethoxysilane
thexyltrichlorosilane
cyclohexyltrichlorosilane
cyclohexyltrimethoxysilane

SIB0997.0
SIC2470.0

bicycloheptyltrichlorosilane(cyclohexylmethyl)trichlorosilane

PR
O

C8

cyclopentyltrichlorosilane
cyclopentyltrimethoxysilane

O

C6

F

C4

chloromethoxy
ethoxychloroSII6457.0
SII6458.0
SII6453.5
SIC2490.0

isooctyltrichlorosilane
isooctyltrimethoxysilane
isooctyltriethoxysilane
cyclooctyltrichlorosilane

SIA0325.0

adamantylethyltrichlorosilane

SIT8162.4

7-(trichlorosilylmethyl)pentadecane

SID4401.5(di-n-octylmethylsilyl)ethyltrichlorosilane

SIT8162.0

13-(trichlorosilylmethyl)heptacosane

C 10

C 12
C 16

C 18

silahydrocarbon
chloroC 24chloroC 28chloro152

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2 Hydrolyzable Groups

1 Hydrolyzable Group

Product Name

Product Code

Product NameSII6463.0

isopropylmethyldichlorosilane

SII6462.0

isopropyldimethylchlorosilane

SII6452.8

isobutylmethyldimethoxysilane

SII6452.5

isobutyldimethylchlorosilane

SIB1972.2

t-butylmethyldichlorosilane

SIB1935.0

t-butyldimethylchlorosilane

SID4065.0(3,3-dimethylbutyl)dimethylchlorosilane

SIT7906.0
SIC2465.0

thexyldimethylchlorosilane
cyclohexyldimethylchlorosilane

SIB0994.0

bicycloheptyldimethylchlorosilane

O

cyclohexylmethyldichlorosilane
cyclohexylmethyldimethoxysilane

PR
O

SIC2468.0
SIC2469.0

F

Product Code

Isobutyltriethoxysilane
solutions in ethanol
are applied by sprayto protect architecture.

SII6456.6

isooctyldimethylchlorosilane

SID4074.0(dimethylchlorosilyl)methylpinane

SID4401.0(di-n-octylmethylsilyl)ethyldimethylchlorosilane

SIC2266.5

11-(chlorodimethylsilylmethyl)tricosane

SIC2266.0

13-(chlorodimethylsilylmethyl)heptacosane

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153

Hydrophobic Silane Selection Guide
Phenyl- and Phenylalkyl-Silanes
3 Hydrolyzable Groups
Hydrolyzable Groups
spacer atoms = 0

Product Code

Product Name

Moderate hydrophobicity, hydrolysates stable to 325° C; UV, radiation resistantchloro
SIP6810.0
phenyltrichlorosilane
methoxy
SIP6822.0
phenyltrimethoxysilane
ethoxy
SIP6821.0
phenyltriethoxysilane
acetoxy
SIP6790.0
phenyltriacetoxysilane
oxime/amine
SIP6826.5
phenyltris(methylethylketoximino)silane

spacer atoms = 1

chlorospacer atoms = 4
chloromethoxy
chlorospacer atoms > 4

phenethyltrichlorosilane
phenethyltrimethoxysilane

SIP6744.6(3-phenylpropyl)trichlorosilane

SIP6724.9
SIP6724.92
SIP6723.3

4-phenylbutyltrichlorosilane
4-phenylbutyltrimethoxysilane
phenoxypropyltrichlorosilane

SIP6736.4
SIP6723.4

phenoxyundecyltrichlorosilane
phenylhexyltrichlorosilane

PRO

chlorochlorochloroFspacer atoms = 3

benzyltrichlorosilane
benzyltriethoxysilane
1-phenyl-1-trichlorosilylbutaneO

spacer atoms = 2

chloroSIB0970.0
ethoxySIB0971.0
chloro
SIP6813.0
More hydrophobic, acid resistant than phenyl
chloro
SIP6722.0
methoxy
SIP6722.6
amine/silazane

Substituted Phenyl- and Phenylalkyl-Silanes
spacer atoms = 0

spacer atoms = 2More hydrophobic than phenyl, peroxide crosslinkablechloro
SIT8040.0
methoxy
SIT8042.0
Greater compatibility with styrenics, acrylics
methyl/chloro
ethyl/chloro
ethyl/methoxy
SIE4897.5
t-butyl/chloro
SIB1973.0

p-tolyltrichlorosilane
p-tolyltrimethoxysilane

chloro3-(p-methoxyphenyl)propyltrichlorosilane

ethylphenethyltrimethoxysilanep-(t-butyl)phenethyltrichlorosilane

spacer atoms = 3

Napthyl-Silanes

SIM6492.5

Forms high refractive index coatings

methoxy
chloroSIN6597.0
SIN6596.0

1-napthyltrimethoxysilane(1-napthylmethyl)trichlorosilane

Specialty Aromatic- Silanes

spacer atoms = 0
chlorospacer atoms = 4
chloro154

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2 Hydrolyzable Groups

1 Hydrolyzable Group

Product Name

Product Code

Product Name

SIP6738.0
SIP6740.0
SIP6739.0

phenylmethyldichlorosilane
phenylmethyldimethoxysilane
phenylmethyldiethoxysilane

SIP6728.0

phenyldimethylchlorosilane

SIP6728.4

phenyldimethylethoxysilane

SIP6736.8

phenylmethylbis(dimethylamino)silane

SIP6738.5

1-phenyl-1-methyldichlorosilylbutane

SIB0962.0

benzyldimethylchlorosilane

SIP6721.5

phenethylmethyldichlorosilane

SP6721.0

phenethyldimethylchlorosilane

SIM6512.5(2-methyl-2-phenethyl) methydlichlorosilane

SIP6721.2

phenethyldimethyl(dimethylamino)silane

SIP6744.0(3-phenylpropyl)methyldichlorosilane

SIP6743.0(3-phenylpropyl)dimethylchlorosilane

SIP6724.8

4-phenylbutylmethyldichlorosilane

SIP6724.7

4-phenylbutyldimethylchlorosilane

SIP6723.25

phenoxypropylmethyldichlorosilane

SIP6723.2

phenoxypropyldimethylchlorosilane

SIP6736.3
SIP6729.5(6-phenylhexyl)dimethylchlorosilane(12-phenyldodecyl)dimethylchlorosilane

SIT8030.0

p-tolyldimethylchlorosilane

SIE4897.2

m,p-ethylphenethyldimethylchlorosilane

SIB1972.5

p-(t-butyl)phenethyldimethylchlorosilane

SIP6723.0m-phenoxyphenyldimethylchlorosilane

SIN6598.0

p-nonylphenoxypropyldimethylchlorosilane

PR
O

O

F

Product Code

SIT8035.0
SIT8035.6

p-tolylmethydichlorosilane
p-tolylmethyldimethoxysilane

SIM6511.0(p-methylphenethyl)methyldichlorosilane

SIM6492.4

3-(p-methoxyphenyl)propylmethyldichlorosilane

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155

Hydrophobic Silane Selection Guide
Fluorinated Alkyl-Silanes - linear

C6

C8

C 10

Product CodeModerately polar hydrophobic coating
chloro
SIT8371.0
methoxy
SIT8372.0
amine/silazane
Hydrophobic films
chloroSIN6597.6
methoxy
SIN6597.7
ethoxySIN6597.65
amino/silazane
SIN6597.4
Hydrophobic, oleophobic films
chloro
SIT8174.0
methoxy
SIT8176.0
ethoxySIT8175.0
Forms oleophobic films with extremely low surface energy
chloro
SIH5841.0
methoxy
SIH5841.5
ethoxySIH5841.2

C 12
chloroProduct Name
(3,3,3-trifluoropropyl)trichlorosilane(3,3,3-trifluoropropyl)trimethoxysilane
nonafluorohexyltrichlorosilane
nonafluorohexyltrimethoxysilane
nonafluorohexyltriethoxysilane
nonafluorohexyltris(dimethylamino)silane(tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane(tridecafluoro-1,1,2,2-tetrahydrooctyl)trimethoxysilane(tridecafluoro-1,1,2,2-tetrahydrooctyl)triethoxysilane(heptadecafluoro-1,1,2,2-tetrahydrodecyl)trichlorosilane(heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane(heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane

O

C3

3 Hydrolyzable Groups

F

Hydrolyzable Groups

SIH5840.25

heneicocyl-1,1,2,2-tetrahydrodecyltrichlorosilane

Fluorinated Alkyl-Silanes - branched
1 x 3 fluorinated carbons chloro
methoxy

heptafluoroisopropoxypropyltrichlorosilane
heptafluoroisopropoxypropyltrimethoxysilane

SIB1706.0

bis(nonafluorohexyldimethylsiloxy)methylsilylethyldimethylchlorosilane

SIT8176.3

tridecafluoro-2-(tridecafluorohexyl)decyltrichlorosilane

PRO

2 x 4 fluorinated carbons chloro

SIH5842.0
SIH5842.2

2 x 6 fluorinated carbons chloro

DiAlkyl Silanes

2 Hydrolyzable Groups

Highest Carbon #
C2

C2

C3

C3

C4

C4

C4

C3

C5

C5

C6

C8

156

Next Carbon #C6

C8

Hydrolyzable Groups

Product Code

Product NamechloroethoxySID3402.0
SID3404.0

diethyldichlorosilane
diethyldiethoxysilane

chloromethoxy

SID3537.0
SID3538,0

diisopropyldichlorosilane
diisopropyldimethoxysilane

chloromethoxy
methoxy
ethoxySID3203.0
SID3214.0
SID3530.0
SID3528.0

di-n-butyldichlorosilane
di-n-butyldimethoxysilane
diisobutyldimethoxysilane
diisobutyldiethoxysilane

methoxy

SII6452.6

isobutylisopropyldimethoxysilane

chloromethoxy

SID3390.0
SID3391.0

dicyclopentyldichlorosilane
dicyclopentyldimethoxysilane

chlorochloro

SID3510.0
SID3382.0

di-n-hexyldichlorosilane
dicyclohexyldichlorosilane

chloromethoxy

SID4400.0
SID4400.4

di-n-octyldichlorosilane
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Enabling Your Technology

2 Hydrolyzable Groups

1 Hydrolyzable Group

Product Code

Product Name

Product Code

Product Name

SIT8369.0
SIT8370.0(3,3,3-trifluoropropyl)methyldichlorosilane(3,3,3-trifluoropropyl)methyldimethoxysilane

SIT8364.0(3,3,3-trifluoropropyl)dimethylchlorosilane

SIB1828.4

bis(trifluoropropyl)tetramethyldisilazane

SIN6597.5

nonafluorohexylmethyldichlorosilane

SIN6597.3

nonafluorohexyldimethylchlorosilane

F

SIN6597.4(tridecafluoro-1,1,2,2-tetrahydrooctyl)methyldichlorosilane

SIT8170.0(tridecafluoro-1,1,2,2-tetrahydrooctyl)dimethylchlorosilane

SH5840.6(heptadecafluoro-1,1,2,2-tetrahydrodecyl)methyldichlorosilane

SIH5840.4(heptadecafluoro-1,1,2,2-tetrahydrodecyl)dimethylchlorosilane

PR
O

O

SIT8172.0

Pigments treated with hydrophobic silanes resist agglomeration in highly polar
vehicle and film-forming compositions such as those used in nail polish.

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157

Acrylate-silanes
in dental
restorative
composites.

Silane Coupling Agents for Thermosets
Selection Chart

Coupling Agent Class

Acrylate, UV cure

CH2 C
H

Diallylphthalaten(COOCCH2 CH

CH2 )2

Epoxy
CH 3
C

O
H2C CH CH 2 O

OHO CH 2 CH CH 2 O

CH 3

CH 3
CH 2

O
O CH 2 CH CH 2

CH 3

n

Acrylate
Vinyl/Olefin
Amine
Vinyl/Olefin
DipodalAmine
Anhydride
Epoxy
Dipodal

O
C

O

O CH2

O

O

Polyimide

Amine
Epoxy

O

N

N

R

O

O

Furan

n

CH2 O

O

SIA0591.0
SIE4668.0

CH3 OCH2 NH

Melamine

N

N

NHCH 2 OCH3N

NHCH 2 OCH3Parylene

CH2 CH2nSIM6487.4
SIA0610.0
SIT8398.0

SIT8398.0
SIE4670.0

Amine
Halogen
Dipodal

SIA0599.2
SIC2295.5
SIB1833.0

SIA0591.0
SIC2296.2

Amine
Epoxy

SIA0611.0
SIG5840.0

SIA0599.0

Amine
Hydroxyl
Dipodal

SIA0611.0
SIB1140.0
SIB1833.0

SIA0599.0
SIT8717.0

HalogenVinyl/Olefinic
Dipodal

SIC2295.5
SIS6990.0
SIB1832.0

SIM6487.4
VMM-010

Amine
Epoxy

SIA0611.0
SIE4670.0

SIT8187.5
SIG5840.0

Acrylate
Amine

SIM6487.4
SIB1828.0

SIA0200.0

Acrylate
Vinyl/Olefin

SIM6487.4
SIS6994.0

Amine
Hydroxyl

SIA0610.0
SIB1140.0

SIU9055.0

Amine
Isocyanate
Sulfur

SIA0610.0
SII6455.0
SIM6476.0

SIM6500.0

PROn

SIA0200.0
SIS6990.0
SIA0591.0
SIS6964.0
SIB1824.5
SIA0591.0
SIT8192.6
SIG5840.0
SIB1834.0

O

Epoxy, UV Cure

Suggestions for Primary ScreeningFO
C OCH3OH

Phenol-formaldehyde

CH2 OHO

Methylmethacrylate, castC OCH 3

CH2C

CH3

O

Polyester, unsaturated

Urea-formaldehyde

Urethane
H3C

COCH CHCOCH2 CH2 OCH2 CH2 O

O

n

O

HOCH2 NHCNHCH 2 NHCNHCH 2 OH

CH3
O
CH2
CH3

158

n

N C O

CH3
CH2CHO(CH2CHO)n CH2CH

SIV9112.0n

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Enabling Your Technology

Diamine-silanes
couplepolycarbonate
in CDsSilane Coupling Agents for Thermoplastics
Selection Chart

Coupling Agent Class
CH2 O

PolyacetalnSuggestions for Primary Screening

Vinyl/Olefin

SIS6994.0

Amine

SIU9058.0

SIA0610.0

Amine
Dipodal
Water-borne

SIA0610.0
SIB1834.1
WSA-7011

SIA0614.0
SSP-060

Amine
Halogen

SIA0610.0
SIC2295.5

O
C OCH3CH2 C
HnPolyamideO
NH(CH 2 )mCOOPolyamide-imide

n

N

N

R

H
O

Polybutylene terephthalate

CO(CH2 )mO

O

O

n

Amine
Isocyanate

SIA0610.0
SII6455.0

Amine

SIA0591.0

O

O C

n

PR
O

Polycarbonate

C

CH 3
C
CH 3

O

O

n

F

Polyacrylate

O

Polyether ketone

Polyethylene

O

n

Amine
Dipodal

SIA0591.0
SIT8717.0nAmine
Vinyl/Olefin

SIA0591.0
SSP-055

Amine
HalogenSulfur

SIA0605.0
SIC2295.5
SIM6476.0

Acrylate
Azide
Vinyl/Olefin

SIM6487.4
SIA0780.0
VEE-005

Acrylate
Dipodal

SIM6487.4
SIB1831.0

Amine

SIA0591.0

SIU9055.0

Amine

SIA0611.0

SIU9058.0

Amine
Sulfur

SIA0605.0
SIM6474.0

SIB1825.0

C

CH2 CH2

Polyphenylene sulfide

S

n

CH3

Polypropylene

CH2 CHn

CH2 CH

PolystyrenenCH3

Polysulfone

O

S

O

CH3

SSP-055

n

CH2

CH2
O

O
CH2 CH2 CH3

Polyvinyl chloride

SIT8398.0
SIV9112.0

OC

Polyvinyl butyral

SIA0610.0

n

Cl
CH2CH

n

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159

Silane Coupling Agents for Sealants & Elastomers

Water-borne aminosilanes
increase bondingof acrylic
latexsealants

Selection ChartO

Acrylic latex

C OCH 3CH2C
CH3CH2 CHCHCH 2

OCH2 CH

Epichlorohydrin

CH2 Cl n

Fluorocarbon

Acrylate
SulfurVinyl/Olefinn(CF2 CF2 )m(CH2 CF2 )n

CH2 C

CH2C

CH2 CH

Polysulfide

SIA0605.0
SIM6474.0

Amine
Dipodal

SIB1834.1
SIT8717.0

SIM6474.0
SSP-055

SIM6476.0
VEE-005n

SulfurVinyl/Olefin

SIM6474.0
SSP-055

SIM6476.0
VEE-005

Epoxy
Sulfur

SIG5840.0
SIB1825.0

Epoxy
Sulfur

SIG5840.0
SIB1825.0

SIM6476.0

Amine
Sulfur

SIA0605.0
SIB1825.0

SIM6486.0

Amine
Vinyl/Olefin
Dipodal

SIA0605.0
SIV9098.0
SIB1824.0

Acrylate
Vinyl/Olefin

SIM6487.4
SIA0540.0

CH2 CH CH

CH2 CH2 S

CH2 CH

SBR

Silicone(hydroxyl terminated)

Silicone(vinyl terminated)nn

CH2 CH CH

n

CH3

CH3

CH3

HO Si O

Si O

Si OH

CH3

CH3

n CH3

CH3

CH3

CH3

H2 C CH Si O Si O Si CH CH2
CH3SIM6476.0
VEE-005

SulfurVinyl/Olefin

CN

Nitrile160

CHCH 2

SIM6487.4
SIB1825.0
SSP-055

n

CHCH 2Cl

Neoprene

SIV9218.0
WSA-6511

Amine
SulfurPRO

CH3Isoprene

SIM6487.4
SIV9210.0
WSA-7021

O

Butyl

n

Acrylate
Vinyl/Olefin
Water-borne

Suggestions for Primary Screening

F

Coupling Agent Class

CH3 n CH3

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SIA0589.0
VMM-010

VMM-010

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Enabling Your Technology
aldehyde-,amino-, andhydroxylsilanes couple
DNA in array
technology

Silane Coupling Agents for Biomaterials
Selection Chart

Site/Type

Oligonucleotides

Coupling Classhydroxyl
diaminesemicarbazide

Co-reactant
cobalt ethylenediamine

Suggestionsfor Screening
SIB1140.0
SIA0591.0

SIS6944.0

terminal favoredpendant amine
pendant amine
pendant amine

vinyl/olefin
aldehydediamineepoxy

SIO6708.0
SIT8194.0
SIA0594.0
SIE4675.0

O

DNA

F

G. McGall et al, J. Am. Chem. Soc., 119, 5081, 1997. F. Chow, in“Silylated Surfaces” D. Leyden ed., Gordon & Breach, 1978, p.301.
M. Podyminogin et al, Nucleic Acid Res., 2001, 29, 5090.

SIU9049.0
SID3543.0
SIG5838.0

A. Bensimon, Science, 265, 2096, 1994. J. Grobe et al, J.
Chem. Soc. Chem. Commun, 2323, 1995. C. Kneuer et al, Int’l J.
Pharmaceutics, 196(2), 257, 2000.

lysinelysinelysinecysteinetyrosine
heparinatedimmunoglobin
antibody

aldehyde
amine
amine
sulfurnitrobenzamide
amine/quat
pyridyl-thio
cyano

PR
O

Proteinglutaraldehyde
thiophosgene
dithionite
NaNO2/HCl

SIT8194.0
SIA0611.0
SIA0611.0
SIM6476.0
SIT8191.0
SSP-060
SIP6926.4
SIC2456.0

SIA0595.0
SIA0599.0
SIT8415.0

J. Grobe et al, J. Chem. Soc. Chem. Commun, 2323, 1995. H. Weetall, US Pat. 3,652,761. G. Royer, CHEMTECH,
4, 699, 1974. S. Bhatia et al, Anal. Biochem., 178, 408, 1989. J. Venter et al, Proc. Nat. Acad. Soc., 69(5), 1141,
1972. R. Merker et al, Proc. Artificial Heart Prog. Conf., June 9-13, 1969 HEWNIH, p29. S. Falipou, Fundamental &Applied Aspects of Chemically Modified Surfaces, p389, 1999.

Cell-Organelle

chloroplast
mitochondria

mitochondria
on silica bead

alkyl
alkyl

SIO6645.0
SIO6645.0

B. Arkles et al, in “Silylated Surfaces” D. Leyden ed., Gordon & Breach,
1978, p363. B. Arkles et al, J. Biol. Chem., 250, 8856, 1975.

Whole Cellerythrocytes

short alkyl

erythrocytes on
glass wall

SIE4901.4

B. Arkles et al, in “Silylated Surfaces” D. Leyden ed., Gordon & Breach,
1978, p363.

Whole Cell(causing lysis)

procaryotic

alkyl-quat

Tissuehistological samples

W. White et al in “Silanes, Surfaces & Interfaces”
ed. D. Leyden, Gordon & Breach, 1986, p. 107.

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SID3392.0
SIA0611.0(215) 547-1015

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SIA0610.0
161

F
O

PR
O
162

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Enabling Your Technology

BOND DISSOCIATION ENERGIESIN ORGANOSILICON COMPOUNDS
By Robin Walsh
Department of Chemistry, University of Reading
Whiteknights, PO Box 224

O

All practicing chemists need to know bond strengths. How
else can they have any idea of the magnitude of the forces holding
the atoms together in a molecule? Traditionally we express thestrengths of these forces as energies, and additionally we focus
strongly on dissociation energies because it is natural to ask “howmuch energy does it take to break a bond?” This has to be madeclear at the outset because the term ‘bond energy’ without thequalifier ‘dissociation’ has the different meaning of an average.
Not only is the meaning different, but the values are often quite
different, and this is particularly true in silicon chemistry.

the desired bond dissociation energy, ∆HfO(R) and ∆HfO(X) are
the radical product enthalpies of formation and ∆HfO(RX) is themolecular enthalpy of formation. Thus, the reliability of a particulardissociation energy depends on three ancillary ∆HfO values. The
current database of enthalpies of formation of organosiliconcompounds and radicals is not particularly large and, most seriousof all, the traditional method of measurement, calorimetry, hasalmost become extinct in the world’s chemistry laboratories. In
light of this it is not surprising that ab initio theoretical chemistry
has taken over the task of calculating, but it carries the risk that,
if theory outpaces experiment too far, we build our quantitative
edifice on increasingly inadequate foundations.

F

Introduction

Values

The currently best data for all Si-X bonds have undergone
increases of ca + 2kcal mol-1 (and occasionally more) since
my 1981 review. This is now quite well documented and arose
because erroneous assumptions were made about the magnitudeof activation energies for reactions of silyl radicals with HI and
HBr (which have now been experimentally measured). Listed here
are the data, based on experiment, for representative molecules
containing Si-H, Si=C, Si-Si, Si-Hal, Si-O, and Si-N bonds. Values
from theory are generally in reasonable, if not precise, agreement,
but are not given here.

PRO

The purpose of this brief account is to provide a summaryof current values and to use these values to illustrate aspectsof structure and bonding in organosilicon compounds andilluminate some of the synthetically most well known processes oforganosilicon chemistry. It is not meant as an exhaustive review.
For those who wish to delve more deeply, some useful references
are offered at the end of the article.

Measurement

There are many methods of measuring bond dissociationenergies. One of the most appealing, because it is the mostdirect, is somehow to dial in and record the exact amount ofenergy needed to break the bond and watch the molecule fallapart into two fragments. In principle this can be done nowadays
by the technique of laser-induced photodissociation. But thecircumstances need to be favorable (the molecule must absorb in
the right energy region!) and only a few selected values have beenobtained in this way (and none yet in organosilicon compounds).
By and large the more successful methods are less direct. The bulkof them fall into the categories of kinetics, spectroscopy and ion
threshold measurements. The scope of this article is too limited
to offer experimental details of these methods. Over the period of
my own involvement in this field (some 30 years) there has beensteady refinement starting from a situation where some values wereuncertain to as much as ± 10 kcal mol-1 (and a lot not known at all)to one where many are now known to ± 1 kcal mol-1 and some tobetter than ± 0.5 kcal mol-1. In 1966, for example, the average bondenergy, D(Si-H) = 77 kcal mol-1 was quoted for D(H3Si-H) which is
now known to have a value of 91.8 ± 0.5 kcal mol-1.
It needs to be remembered, however, that the bulk of bonddissociation energy values come, not from measurement at all, but
indirectly, by use of thermochemical cycles, viz, where D(R-X) is

www.AZmax.co.jp TEL: 03-5543-1630(i) Si-H bonds

The data of table 1 show that Si-H bonds, for which dissociationenergies are known, lie in the range of 84 – 104 kcal mol-1. They
are generally slightly weaker than the analogous C-H bonds inorganic compounds (exceptions are ArnH3-nSi-H bonds). Me-, Cland F- substituents are bond strengthening, while R3Si- and Phare bond weakening. These effects can be understood in terms ofelectronegativity (the bond strengtheners) and the rather limited
willingness of Si-centered radicals to delocalize with π-bonded
systems (Ph substituent). Whereas Me substituents were originally
thought to have no effect on Si-H bonds, they appear now to exert
a small but significant strengthening. The same is true for all other
Si-X bonds to a greater or lesser extent (see tables 2-4).
(ii) Si-C bonds

The data of table 2 gives values for Si-C bonds showing them
to be as strong as, and in some cases, stronger than, the analogous
C-C bonds. It is interesting to note that Me substitution strengthens
when at silicon but weakens when at carbon.

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(iii) Si-Si bonds(i) Hydrosilylation

The data of table 3 shows that the Si-Si bonds are subject tothe same influences as Si-H bonds. It was noted earlier that thesilyl substituent weakening effect extends to elemental silicon itself
where the average Si-Si bond energy is 54 kcal mol-1. Si-Si bonds
are definitely weaker than analogous C-C bonds.

R3SiH + C2H4

H° = D(Si-H) + Dπ(C=C) + D(Si-C) - D(C-H)(vi) Si-N and SiN-X bonds(vii) π-bond energies

These are the values required for the notional process, where theproduct species is the supposed 1,2-diradical with non-interacting(orthogonal) singly occupied orbitals. The values come from heatsof hydrogenation (estimated) and σ-bond dissociation energies. The

• •
M M

+

92

-

100

H° = -33 kcal mol-1
It is the turning of the C=C π-bond into σ-bonds (the essenceof a polymerization process) which makes this viable.
(ii) Polysiloxane creation from silanone monomer

R
Si O
R

R2Si O

H° = Dπ(Si=O) - D(Si-O)
=

61

-

136

H° = -75 kcal mol-1

The driving force here is the significant advantage of the
Si-O σ-bond over its π-bond. Interestingly, if we consider the
more realistic model reaction starting from Me2Si(OH)2 withthe elimination of H2O, a crude estimate comes up with ∆Ho = 0,
because we are just rearranging the Si-O and O-H bonds in theprocess. Undoubtedly ∆Ho is negative for this latter process becauseof the significantly stronger Si-O bonds in alternating –Si-O-Si-Opolysiloxane chains (recall the stronger Si-O bond in (Me3Si)2O

PRO

The data of table 6 show the same features as that oftable 5, viz strong Si-N bonds and striking Me3Si substituent
strengthening effects. The N-H bond in (Me3Si)2NH is actuallystronger than in NH3.

M M

65

O

The data of table 5 reveal the high strengths of Si-O bonds,
but also the significant strengthening effect of an Me3Si group as
a substituent on oxygen. Thus, the O-H bond in Me3SiOH has astrength close to that in H2O (119 kcal mol-1). Also the Si-O bondin (Me3Si)2O is much stronger than that in Me3SiOMe.

+F(v) Si-O and SiO-X bonds

94=(iv) Si-Hal bonds
The data of table 4 shows the extraordinarily high strengthsof the Si-halogen bonds. The Si-F bond in SiF4 is the strongest
single bond known. The Si-hal and, indeed, the Si-O and Si-N
bonds (see tables 5 and 6) are all much stronger than their carbon
counterparts. This has been attributed to pπ- back bonding, butother explanations are possible.

R3SiCH2CH3(iii) Polycarbosilane from polysilane

reference values for purely organic species show that, approximately,
the Si=Si and Si=C π-bonds have 40% and 60% of the strengths of
the C=C bond, whereas the Si=O π-bond has 80% of that for C=O.

Applications

A number of the commercially significant processes(prototypes) of organosilicon chemistry are examined here fromthe point of view of their reaction enthalpies as approximately
estimated from bond dissociation energies. While ∆Ho alone is nota sufficient criterion by which to determine the potential viabilityof a process, the majority of processes do have negative values (i.e.
are exothermic).

Me
Si
Me

Me
Si
Me

Me
Si CH2MeMeSi CH2Me

H° = D(Si-Si) + D(C=H) + D(Si-C) - D(Si-H)
=

79

+ 100

+

93

- 95

H° = -9 kcal mol-1

The driving enthalpy here is rather small but again there is
probably a strengthening of Si-C bonds in alternating –Si-C-Si-Cchains (just as for Si-O bonds in polysiloxanes) which would makethe reaction more exothermic.
Because they are so important, I include additionally two
more processea whose overall enthalpies are more easily related to164

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Enabling Your Technology(iv) The direct processSi(cryst) + 2 MeCl(g)Me2SiCl2(g)———H° = 2D(Si-Si) + 2D(C-Cl) - 2D(Si-C) - 2D(Si-Cl)=

2 x 54+2 x 83- 2 x 86 - 2 x 95

H° = -68 kcal mol-1
This brings out clearly the strong driving forces of thisreaction, viz, the significant gains in bond energy of Si-C over SiSi and of Si-Cl over C-Cl.
(v) The dream process

SiO2 (cryst) + 2 CH4(g)

+ H2O

—
—
—
H° = 2D(Si-O) + 2D(C-H) - 2D(Si-C) - 2D(O-H)= 2 x 111

+ 2 x 104 -2 x 76 - 2 x 111

This brief review provides current values of key dissociationenergies of the commonly encountered bonds in organosiliconcompounds. They are used to illustrate, by rapid estimate, thethermochemical viability of several of the well-known commercial
processes. It is hoped that the availability of these numbers, and this
rapid estimate approach, will encourage organosilicon chemists intheir search for new and viable organosilicon processes of the future.

Some Good References

1. Walsh, R. “Bond dissociation energy values in siliconcontaining compounds and some of their implication”,
Accounts of Chemical Research, 1981, 14, 246-252.
2. Walsh, R. “Thermochemistry”, chapter 5 in The Chemistry ofOrganic Silicon Compounds, eds. S. Patai; Z. Rappoport, John
Wiley and Sons Ltd., 1999, pp 371-391.
3. Becerra, R.; Walsh, R. “Thermochemistry”, Chapter 4 in The
Chemistry of Organic Silicon Compounds, Rappoport, Z.;
Apeloig, Y. Eds. John Wiley and Sons Ltd. 1998, pp153-180.
4. Benson, S. W. Thermochemical Kinetics, John Wiley and Sons,
2nd Ed. 1976.

PRO

H° = +56 kcal mol-1

Summary

O

Me
Si O
Me

by the strengths of the O-H bonds formed in the by-product watermolecule. Although variants on this reaction have been reportedwith retention of all four Si-O bonds, the prospect of replacing twoof them by Si-C bonds in any kind of direct reaction looks remotefrom the thermochemical viewpoint.

Faverage bond energies (although with some dissociation energies
involved as well). The required values are shown in table 8 and are
all estimated from known compounds, including solids!

This is clearly an endothermic process and could only be
brought about with a significant energy input. The problem lies in
the requirement to break the relatively strong C-H bonds comparedto the Si-C bonds made. Interestingly the other requirement, viz,to break two (out of four) of the Si-O bonds, is compensated forTable 1 Some Si-H bond dissociation energies (kcal mol-1)
Bond
H3Si-H
Me3Si-H
Ph3Si-H(Me3Si)3Si-H
Cl3Si-H
F3Si-H
H3SiSiH2-H
PhSiH2-H

5. Berkowitz, J.; Ellison, C. B.; Gutman, D. “Three methods tomeasure RH bond energies”, Journal of Physical Chemistry,
1994, 98, 2744-2765.

Table 2 Some Si-C bond dissociation energies (kcal mol-1)

D(Si-H)
91.8
94.6
88.7
84.7
94.4
103.3
89.4
91.3

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H3Si-MeMeH2Si-Me
Me2HSi-Me
Me3Si-Me
Me3Si-Et(215) 547-1015

D(Si-C)
89.6
91.1
92.5
94.2
92.3

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165

Table 3 Some Si-Si bond dissociation energies (kcal mol-1) Table 4 Some Si-Si bond dissociation energies (kcal mol-1)
Bond
H3Si-F
H3Si-Cl
H3Si-Br
H3Si-I

D(Si-C)
76.7
74.8
73.1
79.3

Table 5 Some Si-O and SiO-X bond dissociationenergies (kcal mol-1)
D(Si-O)
133
123
122
136

Table 7 Some π-bond energies (kcal mol-1)

D(Si-N)
Bond
100
Me3Si-NHMe
98
Me3Si-NMe2
109
Me3Si-N(SiMe3)2

166

Bond
F3Si-F
Cl3Si-Cl
Br3Si-Br
I3Si-I

Dπ(Si-O) Bond37
H2C=CH2
27
61
H2C=O

Dπ(SiO-X)
65

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D(Si-X)
167
110
90
68

D(SiN-X)
Bond
111(Me3Si)2N-H
87(Me3Si)2N-Me

Table 8 Some average bond energies (kcal mol-1)

PR
O

Bond
H3Si=CH2
H2Si=SiH2
H2Si=O

D(Si-X)
158
117
102
82

Table 6 Some Si-O and SiO-X bond dissociationenergies (kcal mol-1)

D(SiO-X)
118
96
98

Bond
Me3SiO-H
Me3SiO-Me
Me3SiOEt

Bond
Me3Si-F
Me3Si-Cl
Me3Si-Br
Me3Si-IO

Bond
Me3Si-OH
Me3Si-OMe
Me3Si-OEt
Me3Si-OSiMe3

D(Si-X)
152
109
90
71

F

Bond
H3Si-SiH3
H3Si-Si2H5
H5Si2-Si2H5
Me3Si-SiMe3

75

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Bond
Si-Si
Si-C
Si-Cl
Si-O

(215) 547-1015—

D(Si-X)
54
76
95
111

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Enabling Your Technology

Si NMR: SOME PRACTICAL ASPECTS

29

Professor Frank Uhlig
Institute for Inorganic Chemistry
Technical University of Graz, A-8010 Graz, Austria
Professor Heinrich Chr. Marsmann
Institute of Inorganic and Analytical Chemistry
Paderborn University, D-33098 Paderborn, P.O. 1621, Germany

O

Silicon is in many respects one of the more importantelements in both nature and chemistry. On one hand silicatesconstitute the main material of the earth’s crust, and on theother hand organosilicon compounds are often used in element
organic chemistry or as building blocks in material science. This isreflected also in literature concerning silicon NMR. For example,
one of the fastest growing sections in the last years comprises theapplication to material sciences and here especially the solid-statesilicon NMR. Of the naturally occurring isotopes 28Si (92.21%),29
Si (4.70%), and 30Si (3.09%), 29Si is the isotope with spin of ½ andhas a magnetic moment. This puts it in the same league together
with the other elements of group 14 of the Periodic Table of theelements such as carbon, germanium, tin and lead. All of theseelements, with the exception of germanium, have at least one
isotope with a nuclear spin of ½ (Table 1).

After the first report by Lauterbur et al. in 19622 there have been
only a few papers per year. However, since the beginning of the
1980s this has changed dramatically. Our own data collection of29
Si chemical shifts now contains about 13,000 data sets for morethan 6,500 compounds.3 a quick literature search yields around25, 000 compounds with a measured 29Si chemical shift. Becauseof these huge amounts of material available in silicon NMR, alldiscussions or reviews must be limited to special and selected
research fields.

F

Introduction

General Aspects
Use of Standards

PRO

The only magnetic isotope of silicon is 29Si, which has a
nuclear spin of ½, a magnetic moment of -0.9609 and, therefore,a receptivity of 3.69x10-4 compared to that of 1H. It can becharacterized as a magnetically diluted isotope of medium
sensitivity.4 Similar to 1H or 13C NMR the referencing is mostly
done relative to tetramethylsilane (Me4Si, TMS), which has
the advantages of having a low boiling point, a relatively shortrelaxation time and being essentially chemically inert. Therefore,
if necessary, it can be added directly to the sample. However, its
resonance is in a shift range where the resonances of many other

Table 1 shows that 29Si NMR has a higher share in the isotopic
mixture, but the absolute value of the magnetic moment is slightly
lower than that of 13C. This leads to a lower resonance frequency. A
complication arises from the fact that spin and magnetic moment
are antiparallel leading to a negative sign of the gyromagnetic
ratio. Concerning these facts silicon NMR had a slow start.

Table 1 | Group 14 Elements, parameters of selected isotopes
IsotopeNaturalAbundance

NuclearSpin

Magnetic
Moment μd )rel.a)

abs.b)

Recept.
rel. to 13C

C

1.108

½

0.7022

1.59x10-2

1.76x10-4

1

Si

4.7

½

-0.5548

7.84x10-3

3.69x10-4

2.1

Ge

7.76

9⁄2c)

-0.8768

1.4x10-3

1.08x10-4

0.61

Snd)

8.58

½

-1.0409

5.18x10-3

4.44x10-3

25.2

Pb

22.6

½

0.58439.16x10-3

2.07x10-3

11.8

13

29

73

119

207

Sensitivitya) At constant field and equal number of nuclei; b) product of relative sensitivity and natural abundance; c) quadrupole moment,-0.18x10-28m; d) isotope used in most tin NMR experiments, for other relevant nuclei see reference 1 and the cited reviews.

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167

More common, except for precision measurement, is to use
no standard compound at all in the sample (tube interchange
technique). In such a case the referencing is done relative to asample containing TMS in the same solvent as it was used in theunknown sample.
Negative values of the silicon chemical shift are to low
frequency and high field compared to TMS. Special care must be
given by using silicon chemical shift data from earlier reviews andoriginal papers. Some of these employ the magnetic field definitionof chemical shifts instead of the currently accepted frequency
based one, resulting in a reversed sign for chemical shift data.

3. If broad lines are measured, one might be able tosubtract it from a blank spectrum obtained underotherwise identical conditions.
One other characteristic feature regarding spectra oforganosilicon compounds is usually observed under broad band
decoupling of protons. Resonances of silicon atoms containing
organic substituents split into many lines by spin-spin couplings
with the protons. This is mostly prevented by decoupling
experiments. However, the Nuclear Overhauser Effect (NOE) canthen lead to zero signals, if the (29Si,1H) dipole-dipole contribution
T1DD to the longitudinal relaxation paths of the silicon is close
to 1.52. The relaxation times depend on the correlation times ofa molecule, therefore, the signal intensity of a 29Si spectrum with
NOE varies with the temperature. Again, there are three ways toturn around the situation:
1. Adding a shift-free relaxation reagent, for example,
the well-known Cr(acac)3 in a concentration of ca.
10-2 molar.
2. Use of inverse gated decoupling. Here proton
decoupling is only active during acquisition withlong waiting times (3 to 5 times the relaxation timeT1) between scans. The advantage of not polluting
the sample is offset by ineffective use of spectrometer
time, which can be alleviated somewhat by using
shorter pulses (40°) and shorter recovery times (20s).

O

Problems in 29Si NMR, pulse techniquesF

organosilicon compounds occur and so misinterpretations are
possible. Two general strategies are usable to avoid this problem.
The first is the use of secondary standards. Some secondaryreference standards as known from the literature are collected inTable 2. Unfortunately, due to their higher reactivity, in contrast
to TMS, they are useful only for a limited number of applications.

There is a number of aspects for running into difficulties inmeasuring silicon NMR. The first of it concerns the fact that silicon
containing materials such as glass and ceramics constitute a majorpart of the construction material of the probe head and probe tube
resulting in a broad background signal at approximately -110 ppm.
There are three general methods to avoid this potential problem:

3. Use of population transfer pulse programs such as
INEPT or DEPT.5

PRO

1. In the case of narrow signals, the smallest sweep
width possible should be used.

2. Population transfer pulse programs such as DEPT or
INEPT can be used if the silicon atoms are couplingwith protons or fluorine.

Table 2 | Current and historic reference compounds for silicon NMR
Name

FormulaCommon Abbreviation

Chemical Shifta),b)

Tetramethylsilane

Me4Si

TMS

0.0

Tetrakis(trimethylsilyl)methane(Me3Si)4C

Hexamethylsiloxane(Me3Si)2O

M2

6.53

Octamethylcyclotetrasiloxane(Me2SiO)4

D4-19.86

Tetramethoxysilane(MeO)4Si

TMOS-78.54

Tetraethoxysilane(EtO)4Si

TEOS

Tetrafluorosilane

F4Si-113.5

Tetrakis(trimethylsiloxy)silane(Me3SiO)4Si

Silicon Oil(Me2SiO)x

3.6

M4Q

8.62 / -104.08-22.0a) Relative to tetramethylsilane (TMS). b) the use of silicone-containing greases for your equipment can lead to “impurity” resonances
around -22 ppm.
168

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A third disadvantage in measuring silicon NMR spectra is
related especially with “pure” inorganic compounds containing
only 29Si as the useful isotopic nucleus. In such cases single pulse
experiments are applicable only. Due to the slow relaxation timewith such compounds, a 30° pulse is used with repetition rates ofabout 20 seconds.

The border lines for silicon(IV) compounds are given by thetetraiodosilane 3 with a chemical shift of -350 ppm and the central
silicon atom of dihypersilylplumbandiyl 4 with +197 ppm.9,10

Solid state 29Si NMR differs from that of solutions inasmuch
as the spatial interactions are not averaged out by particle motion,
resulting in broad lines and all the problems that are related to thatfact. Literature on 29Si solid state NMR is to be found.6

Derivatives containing the trimethylsilyl group (Me3Si)
abbreviated also as TMS, form the largest group of compoundswith a known 29Si Shift. One reason to introduce one of thesegroups into a molecule is to obtain a certain substitution patternin organic chemistry.11 Another reason is, for example, the fact
to make substances now containing Me3SiO- or Me3SiN- groups
instead of labile protons in HO- or NH-groups easier to handle.
For instance, the volatility or the solubility in organic solvents ismuch better for the derivatized compound. The TMS group isalso useful for the characterization of such compounds by NMR
methods.20 The shift of TMS groups ranges from -34.4 ppm for
Me3Si-K+ up to 83.6 ppm for [Me3Si]+[B(C6F5)3]-.21,22 An overview
about typical shift ranges of trimethylsilyl-substituted compounds
is given in Scheme 1.

PR
O

O

The majority of 29Si NMR shifts are found in a range between+50 and -200 ppm. However, as far as is known, the current
upfield and downfield “world records” are formed by divalent
silicon compounds. The largest upfield shift is measured for the
decamethylsilicocene 1 with -392 ppm.7 The highest downfield
shift is given for 2 with 567 ppm.8

The name hypersilyl is used mainly as abbreviation for
the tris(trimethylsilyl)silyl substituent, as supersilyl is used as
abbreviation for the tri-tert-butylsilyl group.

F

Chemical Shifts-392 ppm+567 ppm

Scheme 1 | Typical shift ranges for trimethylsilyl-substituted derivatives. Selected borderline examples for each class are given.

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169

End- (M)Middle- (D)GroupsM
7 – 9 ppm

D

(Q)

T

Me2
Cl2
Me/H

-17 to –22Me-55 to –65

Me2Cl ~5
MeCl2 ~ -20
~ -48
Cl3

~ -73
~ -35

HO

~ -100

H

~ -85

Me/O

~ -55

Ph

~ -78

Ph3

Ph/OH ~ -70

~ -10

Ph2

-105 to -115

The chemistry of silicon-containing double bonds was a rapid
growing field during the last 20-25 years. For silicon-silicon double
bonds the 29Si chemical shifts are reported from ca. 50 ppm up
to ca. 160 ppm, for example 49.4 ppm for [Mes((Me3Si)2N)Si]2;25
156.2 ppm for (t-BuMe2Si)2Si=Si(Sii-Pr2Me)2;26 and for siliconcarbon double bonds a range of ca. 130 ppm is given, for example
13.1 ppm for [2,4,6-i-Pr3C6H2]2Si=C=C(Ph)t-Bu;27 144.2 ppm for
Me2Si=C(SiMe3)Sit-Bu2Me.28 The chemical shifts of silicon having
a double bond to a transition metal strongly depends on thesubstituents on the transition metal and the metal itself. Chemical
shifts are observed in a range of ca. 10 ppm, for example -9.4
ppm for [t-BuO)2Si=Fe(CO)4]•THF23 and nearly 141.9 ppm for[(Me2NC10H6)(H)Si=Mn(CO)2(MeCp)].24

O

R = Me3

Trifunctional (T) Tetrafunctional (Q)Branching Groups+18 ppm.12 the same is true for carbosilanes. Resonances for silicon
atoms bonded to 4 carbon atoms are found between -4 and +20
ppm.12 A report concerning silthianes has appeared.13 Oligomericand polymeric silanes are discussed in detail in the literature andsome of the appropriate references can be consulted there.14 The
ranges of chemical shifts of building components for oligosilanes
are collected in Table 3. The skeleton of these compounds is similar
to those of alkanes. A number of studies on substituted di- andtrisilanes are also discussed in the article mentioned above.14

F

One of the first uses of 29Si NMR was its application in theanalysis of siloxane polymers. Although it is still possible torecognize and isolate individual molecules, the main view is todissect the molecules into building units (Scheme 2).

-42±3

The data of a number of other transition metal complexes arecollected in some reviews.12,14-16 Due to the large variety for thebonding situations of the silicon a great spread of chemical shifts
ranging from 289 ppm up to -150 ppm is observed.17,18

PRO

The main difference between the building units is thenumber of oxygen atoms connected to a silicon atom. Except for
the M group, the exchange of an R substituent for oxygen leads
to an upfield shift. The chemical shifts of the building units are
sensitive to neighbor effects in the chain structure revealing
the microstructure of polymers. The chemical shifts of allbuilding groups are modified be ring strain if cyclic siloxanes areinvestigated by 29Si NMR.

Silazanes possess structural similarities to siloxanes and canbe rationalized by the analogous principles, however, the rangeof chemical shifts is smaller. The total region extends from -62 to

For other compounds, especially for higher coordinatedsilicon derivatives, general collections of silicon chemical shifts
may be consulted.3,12,19

Table 3 | Selected chemical shifts of polysilane units in ppm
R

End Group
R3Si-Si

Middle Group
R2Si(Si)2

Trifunctional Group
RSi(Si)3

Tetrafunctional Group
Si(Si)4Me-4 ± 5-28 to -50-65 to -95-109 to -165b)

Ph-19 ± 3-40 to -50-75 to -85

Ph/H

-30

-65 ± 5Me/H

-35 ± 2-70 ± 5

Me2/Cla)28 ± 2t-Bu

20 to 30a) BrMe2Si, 21ppm; IMe2Si, 2 ppm. b) Exception Si(SiCl3)3(SiCl2SiCl3), -79.5 ppm

170

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Coupling Constants

1. Coupling with 100 % isotopes such as H, F, or P
gives the well-known splitting patterns in the 29Si
spectra. Couplings with quadrupolar nuclei such as
the isotopes of chlorine are usually not observed.
1

19

31

2. Coupling with other rare spins such as 29Si, 119/117Sn, or
13
C leads to smaller satellite lines left and right to themain line according to their abundance in the usual29
Si spectra.

Si-X
Coupling (X)1H

420 – 75

10 – 3 (SiMe)
13 – 1 (SiXH)

8-1

F

488 – 108

91 – 17

16 - 2P

256 – 1644 - <1C

113 – 37

18 - 4Si

186 – 23

24 - <1Sn

750 – 120

100 – 35

1

19

31

13

J(Si-X)a)J(Si-X)a)2

J(Si-X)a)

3

29

119

60 - 12a) Reported in Hz and largest to smallest

O

The ranges of some silicon-element coupling constants arefound in Table 4. The sign of coupling constants over one bond ismostly negative because of he negative magnetogyric ratio of the29
Si. Exceptions are found if the silicon is connected to an elementwith tightly bonded s-electrons, for example 19F or 31P.

Table 4 | Ranges of selected silicon element coupling constants

F

All magnetic nuclei in a molecule interact and the splitting
caused by this interaction gives rise to typical coupling patterns.
Two cases can be distinguished:

Reviews, Databases of Si NMR data
29

PR
O

A large number of review articles deal with selected andspecial fields of 29SI NMR, but only a limited number of generalcollections of 29Si NMR chemical shifts or coupling s=constants
exist. An electronic version of a 29Si database is available from theauthors of this article.3 further information is available via theworld wide web (http://www.silicium-nmr.de) or directly fromthe authors.
Table 5 | Selected 29Si NMR chemical shifts5
FormulaEmpirical Formula

Chemical Shift [ppm]a)Gelest Product Code

Et4Si

C8H20Si

7.1

SIT7115.0

Me4Si

C4H12Si

0

SIT7555.0

Me3SiCl

C3H9ClSi

30

SIT8510.0
SIT8510.1

Me3SiBrC3H9BrSi

26

SIT8430.0

Me3SiI

C3H9ISi

8.7

SIT8564.0

Me3SiF

C3H9FSi

31.0

SIT8525.0

Me3SiOSO2CF3

C4H9F3O4SSi

44

SIT8620.0

Me3SiCCH

C5H10Si-17.5

SIE4904.0

Me3SiCCSiMe3

C8H18Si2-19.4

SIB1850.0

Me2SiCl2

C2H6Cl2Si

32

SID4120.0

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171Chemical Shift [ppm]a)Gelest Product Code

MeSiCl3

CH3Cl3Si

12SIM6520.0
SIM6520.1

Ph4Si

C24H20Si-14

SIT7755.0

Ph3SiCl

C18H15ClSi

1.5

SIT8645.0

Ph3SiF

C18H15FSi

4.35

SIT8655.0

Ph2SiCl2

C12H10Cl2Si

6.2

SID4510.0
SID4510.1

Ph2SiF2

C12H10Cl2Si

PhSiCl3

C12H10F2Si

Cl4Si

Cl4Si

Br4Si

Br4Si

I4Si

I4Si

F4Si

F4Si

H2SiCl2

H2SiCl2

HSiCl3F

Empirical Formula-3.0

SID4530.0-0.8

SIP6810.0-18

SIT7085.0

O

Formula

SIT7050.0-350

SIT7123.0-112

SIT7120.0-11.3

SID3368.0
SID3368.2

HSiCl3-9.4

SIT8155.0(H2C=CHCH2)4Si

C12H20Si-2

SIT7020.0

H2C=CHCH2SiMe2Cl

C5H11ClSi

27.2

SIA0460.0

H2C=CHCH2SiMeCl2

C4H8Cl2Si

26.8

SIA0470.0

H2C=CHCH2SiCl3

C12H20Cl3Si

8

SIA0520.0

H2C=CHSiCl3

C2H3Cl3Si-3

SIV9110.0

PhCH2SiCl3

C7H7Cl3Si

7.2

SIB0970.0

MeSi(CH2Cl)Cl2

C2H5Cl3Si

21.6

SIC2290.0

Me2Si(CH2Cl)2

C4H10Cl2Si-3.5

SIB1051.0

C8H19ClSi

35.8

SIT7906.0

C6H15ClSi

33

SIB1935.0

PR
O

-92

Me2CHC(Me)2SiMe2Cl
t-BuMe2SiCl

172

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Empirical Formula

Chemical Shift [ppm]a)Gelest Product Code

PhMeSiHCl

C7H9ClSi

1.3

SIP6738.0

Me2HClSi

C2H7ClSi-11.1

SID4070.0

PhSiH3C6H8ClSi-60

SIP6750.0

Ph2SiH2

C12H12Si-34

SID4559.0

Ph3SiHC12H12Si-17 to -22

SIT8665.0

Me2SiH2

C18H16Si-37 to -48

SIM6515.0

MeSiH3

CH6Si-65

SID4230.0

Me3SiHC3H10Si-17

SIT8570.0

Et3SiHC6H16Si

0.2

SIT8330.0(EtO)3SiH

C6H16O3Si-60 to -65

SIT8185.0(EtO)4Si ; TEOSC6H8O4Si-82

SIT7110.0
SIT7110.1(PhO)4Si

C6H8O4Si-101.1

--

PR
O

O

F

Formula(MeO)4Si; TMOS

C4H12O4Si-79.5

SIT7510.0
SIT7510.2(MeO)3SiCl

C3H9ClO3Si

-66.6

--

(MeO)2SiCl2

C2H6Cl2O2Si

-52.6

--

MeOSiCl3

CH3Cl3OSi

-36.1

--

EtOSiCl3C2H5Cl3OSi

-38.3

--

Ph2Si(OH)2

C12H12O2Si-33.9

SID4560.0

Ph3SiOH

C18H16OSi-12 to -24

SIT8695.0

Et3SiOH

C6H16OSi

19.3

SIT8332.0

Me3SiONa

C3H9NaOSi-4 to -11

SIS6988.0

Me3SiOSiMe3

C6H18OSi

6

SIH6115.0

Me3SiOOSiMe3

C6H18O2Si

27.3

SIB1868.0

Me3SiSSiMe3

C6H18SSi

13

SIH6116.0

Me3SiOSiMe2OSiMe3; MDM

C8H24O2Si3

6.5(Me3Si)-22 (Me2Si)

SIO6703.0

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173

Empirical Formula

Chemical Shift [ppm]a)Gelest Product Code

Me3SiO(SiMe2O)3SiMe3; MD3M

C12H24O4Si5

6.8(Me3Si)-21.9 (2xMe2Si)-22.6 (1xMe2Si)

SID4626.0(Me3SiO)4Si; M4Q

C12H36O4Si5

8 (Me3Si)-105 (Si)

SIT7298.0(Me3SiO)3SiMe; M3T

C10H30O3Si

7(Me3Si)-65 (Si)

SIM6592.0(Me2SiO)3; D3

C6H18O3Si3-9SIH6105.0
SIH6105.1(PhMeSiO)3

C21H24O3Si3-20.8

SIT8705.0(Ph2SiO)3

C36H30O3Si3

-33.8

--

(Me2SiO)4; D4

C8H24O4Si4-20

SIO600.0(MeHSiO)4; D4’

C4H16O4Si4-32.5

SIT7530.0(Ph2SiO)4

C48H40O4Si4-46

SIO6705.0(Me2SiO)x; silicone oil

Molecular Weight160-430,000-22

DMS-TxxOF

FormulaPRO

T8 silsesquioxane
R = vinyl

C16H24O12Si8-79.4

SIO6706.0

R = Me2HSiO

C16H56O20Si16

0.5(Me2HSi)

SIO6696.5

R=H

H8O12Si8-84.5

SIH6168.0

Me2HSiOSiHMe2

C4H14OSi2-5

SIT7546.0

Me2ClSiOSiClMe2

C4H12Cl2OSi2

9.6

SID3372.0

Me2ClSiOSiMe2OSiMe2Cl

C6H18Cl2O2Si3-18.3(Me3Si)
2.3 (SiCl)

SID3360.0

Cl3SiOSiCl3

Cl6OSi-46

SIH5910.0(MeO)3SiSi(OMe)3

C6H18O6Si2-52.5

SIH6101.0

R = vinyl

C8H15NO3Si-80

SIV9097.0

R = MeC7H15NO3Si-63

SIM6518.0

C8H24N4Si-28.1

SIT7276.0(Me2N)4Si

174

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Empirical Formula

Chemical Shift [ppm]a)Gelest Product Code

(Me2N)3SiMe

C7H21N3Si-17

SIT8712.0(Et2N)2SiMe2

C6H18N2Si-1.8

SIB1095.0

Me2NSiMe3

C5H15NSi-6

SID3605.0(Me3Si)2NH; HMDS or HMDZ

C6H19NSi

2.2

SIH6110.0(Me3SiNSiMe3

C9H27NSi3

2.4

SIN6595.0(Me2SiNH)3

C6H21N3Si3-4SIT6102.0(Me2SiNH)4

C8H28N4Si4-8.2

SIO6698.0(Me3SiO)3B

C9H27BO3Si3

12.3

SIT8718.0(Me3SiO)P=O

C9H27O4PSi3

20

SIT8723.0(Me3Si)3P

C9H27PSi3

0.2

SIT8723.4

Me3SiSiMe3

C6H18Si2-19.5

SIH6109.0

PhMe2SiSiMe2Ph

C16H22Si2-21.8

SID4584.0

PR
O

O

F

FormulaPh2MeSiSiMePh2

C26H26Si2-22

SID4238.0

Ph3SiSiPh3

C36H30Si2-26.5

SIH6155.0

ClMe2SiSiMe2Cl

C4H12Cl2Si2

17

SID3370.0

Cl2MeSiSiClMe2

C4H12Cl2Si2

15.4 (SiCl)
25 (SiCl2)--

Cl2MeSiSiCl2MeC2H6Cl4Si2

18--

Cl3SiSICl3

Cl6Si2-6.2

SIH5905.0(Me2Si)6C12H36Si6-41.6

SID4623.0(Me3Si)3SiMe

C10H30Si4-12.5(Me3Si)-87.9 (SiMe)--(Me3Si)4Si

C12H36Si5-9.8(Me3Si)-135.5 (Si)

SIT7308.0

n-Bu3SnSiMe3

C15H36SiSn-8

SNT8585a) Chemical shifts without decimal point are due to different values with deviations of ±2 ppm.

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175

1. Brevard, C.; Granger, P. “Handbook of High Resolution
Multinuclear NMR”, John Wiley & Sons, Chichester, 1982.
2. Lauterbur, P. C. “Determination Phys. Meth.”, 1962, 2, 511.
3. Hermann, U.; Marsmann, H. Uhlig, F. 29Si NMR Database
System (PC based, see also http://www.silicium-nmr.de)
4. Harris, R. K.; Mann, B. E.; “NMR and the Periodic Table”,
Academic Press, New York, 1978.
5. Blinka, T. A.; Helmer, B. J.; West, R. Adv. Organomet. Chem.
1984, 23, 193.

20. Schraml, J. Prog. Nucl. Magn. Res. Spect.1990, 22, 289.
21. Olah, G. A.; Hunadi, R. J. J. Am. Chem. Soc. 1990, 102, 6989.
22. Lickiss, P. D. in “The Chemistry of Organic Silicon Compounds”
Patai, S.; Rappoport, Z. Eds. John Wiley & Sons, Chichester,Vol. 2, 1998.
23. Lickiss, P. D. Chem. Soc. Rev. 1992.
24. Corriu, R. J. P.; Chauhan, B. P. S.; Lanneau, G. F.
Organometallics, 1995, 14, 1646.
25. West, R. Angew. Chem. 1987, 99, 1231.

26. Kira, M.; Ohya, S.; Iwamoto, T.; Ichinhe, M.; Kabuto, C.
Organometallics, 2000, 19, 1817.
27. Trommer, M.; Miracle, G. E.; Eichler, B. E.; Powell, D. R.;
West, R. Organometallics, 1997, 16, 5737.
28. a) Wiberg, N.; Wagner, G.; Muller, G. Angew. Chem. 1985, 97,
220. b) Baines, K. M.; Brook, A. G.; Ford, R. R.; Lickiss, P. D.;
Saxena, A. Organometallics, 1989, 8, 693.

O6. a) Engelhardt, G.; Michel, D. “High Resolution Solid
State NMR or Silicates and Zeolites”, John Wiley & Sons,
Chichester, 1987. b) Babonneau, F.; Gualandris, V.; Maquet,J.; Massiot, D.; Janicke, M. T.; Chmelka, B. F. J. Sol-Gel Scienceand Technology 2000, 19, 113. C) Matijasic, A.; Lewis, A. R.;
Marichal, C.; Delmonte, L.; Chezeau, J.-M.; Patarin, J. Phys.
Chemistry Chemical Physics 2000, 2, 2807.

19. Williams, E. A.; Cargioli, J. D. in “Annual Reports in NMR
Spectroscopy” 1979, Vol. 9, Academic Press, New York, 221.

F

References

7. Jutzi, P.; Holtmann, U.; Kanne, D.; Kruger, C.; Blam, R.;
Gleiter, R. Hyala-Kryspin, I. Chem. Ber. 1989, 122, 1629.

8. Kira, M.; Ishida, S.; Iwamoto, T.; Kabuto, C.; J. Am. Chem.
Soc. 1999, 121, 9722.

30. Wrackmeyer, B. J. Organomet. Chem. 1979, 166, 353.
31. Sharma, S.; Pannell, K. H. Organometallics 2000, 19, 1225.

PRO

9. a) Marsmann, H. C.; Horn, H. G. Chem.-Ztg. 1972, 96, 456.
b) Niemann, U.; Marsmann, . C. Naturforsch. 1975, 30b, 202.

29. Boesveld, M.; Hitchcock, B.; Lappert, M. F.; Liu, D. S.; Tian, S.
Organometallics 2000, 19, 4030.

10. Klinkhammer, K. W.; Schwarz, W. Angew. Chem. 1995,
107, 1448.

32. Harloff, J.; Popowski, E.; Fuhrmann, H. J. Organomet. Chem.
1999, 592, 136.

11. Colvin, E. “Silicon in Organic Synthesis” Butterworths,
London, 1981.

33. Marsmann, H. C.; Horn, H. G. Naturforsch. 1972, 27b, 1448.
34. Marsmann, H. C. unpublished results.

12. Marsmann, H. C. in “NMR Basic Principles and Progress”
Vol. 17, Springer Verlag, Heidelberg, 1981.

35. a) Schraml, J. Coll. Czech. Chem. Commun. 1977, 42, 1165.
b) Herzog, U. J. Prakt. Chem. 2000, 342, 379.

13. a) Horn, H.-G. J. Prakt. Chem. 1992, 334, 201. B) Roewer, G.;
Herzog, U. Main Group Metal Chemistry” 1999, 22, 579. c)
Herzog, U.; Bohme, U.; Rheinwald, G. J. Organomet. Chem.
2000, 612, 133.

36. Tran, D. T. T.; Corrigan, F. Organometallics 2000, 19, 5202.

14. Williams, E. A. in “The Chemistry of Organic SiliconCompounds” Patai, S.; Rapport, Z. Eds. John Wiley & Sons,
Chichester, Vol. 1 1997, 511.
15. Likiss, P. D. Chem. Soc. Rev. 1992, 271.

16. Krentz, R.; Pommeroy, R. K. Inorg. Chem. 1985, 24, 2976.

17. Arnold, J.; Tilley, T. D.; Rheingold, A. L.; Geib, S. J.; Inorg.
Chem. 1987, 26, 2106.

18. Kawano, Y.; Tobita, H.; Ogino, H.; J. Organomet. Chem. 1992,
428, 125.

176

www.AZmax.co.jp TEL: 03-5543-1630

37. Haase, M.; Klingebiel, U.; Boese, R.; Polk, M. Chem. Ber.
1986, 119, 1117.
38. Marsmann, H. C.; Boese, H.; Flindt, E. P. Z. Anorg. Allg.
Chem. 1977, 430, 155.
39. Wiberg, N.; Worner, A.; Karagiosoff, K.; Klapotke, T.-M.
unpublished results.
40. Westerhausen, M.; Digester, M.; Schwarz, W. Inorg. Chem.
1997, 36, 521.
41. Cradock, S.; Ebsworth, E. A. V. Hosmane, N. S.; McKay, K. M.
Angew. Chem. 1975, 87, 207.

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INFRARED ANALYSIS OF ORGANOSILICON COMPOUNDS:
SPECTRA-STRUCTURE CORRELATIONS
Complied by Philip J. Launer, Updated by Barry Arkles

The references list three excellent reviews of spectra-structure
correlations for organosilicon compounds. Each review contains
some discussion of the molecular vibrations associated with theinfrared bands. The reviews also offer a quick way to locate theoriginal literature for many of the correlations.

O

The positions of infrared bands characteristic of someorganosilicon groups are shown in the following table. Ideally,
these correlations should be used for liquids or solutions. Infrared
band positions for a crystalline solid often show shifts and splitting
when compared with band positions of the sample in the liquidstate. However, non-crystalline solids (amorphous polymers,
glasses) tend to have infrared spectra that are similar to theirsolution spectra.

This table presents empirical correlations between spectra andstructure. The table does not show the types of vibrations (stretching,bending, rocking etc.) that give rise to the infrared bands. Empiricalcorrelations can guide the chemist who is using infrared to follow
the course of the reaction, to analyze a commercial product, or to
identify an unknown. The correlations become even more useful if
the chemist learns the vibrational origins of the bands. The chemist
then will be in a better position to anticipate interferences by othergroups. Knowledge of the vibrational origins also will help thechemist to understand shifts in a group frequency caused by strain
in a bond, coupling of vibrations, or change in the electronegativityof neighboring atoms.

F

The infrared spectrum reveals vibrations of atoms inmolecules. The beauty of the spectrum is the close and accessible
relationship between infrared bands and molecular structure.
Certain groups of atoms have characteristic vibration frequencies
which persist in different compounds. These groups (i.e. Si-OCH3,
C=O, Si-CH=CH2, BF4-) are the very kind of functional groupschemists are interested in. This is why infrared spectroscopy is anindispensable tool for organosilicon research.

References

1. D. R. Anderson in “Analysis of Silicones,” A. Lee Smith,editor, Wiley-Interscience, New York, 1974, Chapter 10.

PR
O

These spectra-structure correlations are the result of workby many investigators. Major contributions have been made by
A. Lee Smith and his colleagues at Dow Corning Corporation.
In addition to previously-published data, we have included
some correlations based on our experience in the analysis oforganosilicon compounds.
There is increasing interest in carbon-containing siliconcompounds as precursors of high-performance ceramics.
Accordingly, the table gives data on the infrared bands of somesilicon-containing ceramics.
Group

Frequency in cm-1

Si—CH3In polysiloxanes:

1275-1245, 865-750

2. L .J. Bellamy, “The Infra-red Spectra of Complex Molecules,”3rd ed., Chapman and Hall, London, 1975, Chapter 20.

3. A. Lee Smith, Spectrochim. Acta 1960, 16, 87.

Comments(M) 1250, 840, 755(D) 1260, 860 (weak), 800

The Si—CH3 group is easily recognized by a strong, sharp band at about
1260 cm-1 together with one or more strong bands in the range 865-750
cm-1. Some (CH3)3Si— compounds show a 1250 cm-1 band split into two
components with the weaker component often appearing as a shoulder on
the higher frequency side of the band. Blocks of dimethyl D units show arelatively weak band at 860 cm-1. In many copolymers containing dimethyl
D units (random or alternative, not block), the 860 cm-1 band shifts to 845
cm-1 and becomes stronger.

(T) 1270, 780-760

Si—CH2CH3

1250-1220, 1020-1000,
975-945

The 1250-1220 cm-1 Si—CH2 band is much weaker than the analogues 1260
cm-1 Si—CH3 band.

Si—CH2(CH2)xCH3

1220-1170

As the alkyl group becomes longer, the Si—CH2— band moves to lower
frequency; n-propyl, 1220-1200 cm-1; n-butyl, 1200-1190 cm-1; longer chains,
1190-1170 cm-1

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GroupFrequency in cm-1

Comments

Si—CH=CH2

1600, 1410, ca. 1010, ca. 960

If other alkenyl groups and aryl groups are absent, C—H bands at 3060 and
3020 cm-1 help to identify Si—CH=CH2.

Si—CH2—CH=CH2

1640-1630, 1190-1140, 990, 930(appears as shoulder in somecompounds), 920-890

The isomeric group, Si—CH=CH-CH3, shows a different pattern with astrong band at 970 cm-1 due to trans —CH=CH—.

3300 (C-H), 2040 (CThese are strong, narrow bands. In Si—C C-Si compounds the 3300 cm-1
band is absent, and the C C band is so weak that it is difficult to identify.

Si—C

CH

C)

The 1430 cm-1 band is so narrow that its intensity in a recorded spectrum isgreatly influenced by the resolution of the spectrometer and the scanningspeed. When two phenyl groups are attached to the silicone, the strong
1120 cm-1 band usually is split into a doublet. The 1030 and 1000 cm-1 bands,
normally weak, become much stronger in cyclotrisiloxanes. Specific Siphenyl compounds often can be identified by the pattern in the range 760690 cm-1, where there is a strong band in the region 700-710 cm-1 and one tothree week, medium or strong bands in the region 760-710 cm-1.

1600-1590, 1430, 1130-1110,
1030, 1000, 760-710, 700-690

FIn polysiloxanes:O

730, 700
Intensities approx. equal

740, 720, 700
Intensities increase as frequency
of band decreases

1130-1000

Siloxanes show one or more very strong infrared bands in the region of1130-1000 cm-1. Disiloxanes and small-ring cyclosiloxanes show a single
Si—O—Si band. As the siloxane chains become longer or branched, the
Si—O—Si absorption becomes broader and more complex, showing two
or more overlapping bands. A band associated with Si-O rocking can beobserved at 455 cm-1

PR
O

Si—O—Si

R3SiOSiR3
disiloxanes

1080-1040

Some unusual shifts in the disiloxane band: Cl3SiOSiCl3, 1115 cm-1
(inductive effect); (CH3)2SiOSi(CH3)2CH2CH2, 920 cm-1 (strained ring).

[R2SiO]3 cyclic trimers

1020-1010[R2SiO]4-5
cyclic tetramers and pentamers

1090-1075

Cyclic trimers, tetramers, and pentamers have a single Si—O—Si band. As
the ring becomes larger (D6, D7, etc), the Si—O—Si band gradually widens
and splits.

[(CH3)2SiO]x
Poly(dimethylsiloxnae)

1090, 1020

[RSiO1.5]8, 10, or 121130-1115[RSiO1.5]x1160-1000

Polysiloxanes made up of T units [RSiO1.5]x, often show a broad,structureless absorption covering the entire region 1160-1000 cm-1.
In other preparations of all-T polymers, there are two distinct bands — one
at about 1130 cm-1, the other at about 1040 cm-1

Si—CH2—Si

1080-1040

The disilylmethylene band is strong and sharp. The sharpness helps
distinguish it from Si—O—Si bands.

Si—CH2CH2—Si

1180-1120

This is a strong, sharp band. Caution: The band does not appear in this range
when the disilylethylene group is part of a strained ring.

1135

Compounds containing the p-substituted silphenylene group show a strong,
sharp band at 1135 cm-1.

178

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Long chains of dimethyl D units show very strong, distinct bands of about
equal intensity at 1090 and 1020 cm-1.

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Group

Frequency in cm-1

Comments

Si—H

2280-2080, 950-800

The Si—H group is readily identified by a strong band in the range 22802080 cm-1. There usually is no interference from other bands in this part ofthe spectrum. The exact position of the 2280-2080 band is very sensitive tothe electronegativity of the groups attached to the silicon. (For details, see
the references.)

Si—H
in amorphous silicon

2150-2000

Si—H bands at three or more frequencies in the range 2150-2000 cm-1 havebeen found in amorphous silicon (a-Si). There still is some uncertainty
about the correlations between these band positions and the nature of theother groups on the Si atom.

1030-820

SiF2 and SiF3 compounds show two bands in this range.

625-425

SiCl2 and SiCl3 compounds usually show two bands in this range.

Si—OH3690 (free OH), 3400-3200(hydrogen-bonded OH), 950-810

Si-OD

2742

Isolated Si—OH groups on silica show a sharp band at 3750 cm-1 [R.S.
McDonald, J. Phys. Chem. 62, 1168 (1958)]. Free silanol groups in organo
silicon compounds show a sharp band at about 3690 cm-1. Aryl silanols show
slightly lower frequencies than alkyl silanols. Two ways to tell the difference
between Si—OH and C—OH: The free Si—OH band at 3390 cm-1 is at a significantly higher frequency than the free C—OH band. Si—OH compounds
show absorption, often a single broad band, in the range 950-810 cm-1.
This band is observed after D2O exchange with isolated Si-OH in silica.

Si—O—Metal

1000-900

Si—OR

1110-1000

Si—OCH32840 (sharp), 1190, 1100-1080(strong)

Si—OCH2CH3

1170-1160, 1100 and 1075
(strong doublet), 970-940

O

F

Si-F
Si—Cl

Silanolates show a strong band in the range 1000-900 cm-1. Si—O—Ti
compounds show a strong band at ca. 925 cm-1.

PR
O

Si—alkoxy compounds have one or more strong bands in the 1110-1000
cm-1 range. If siloxane is present in a sample, the 1110-1000 cm-1 band is
apt to be masked by strong Si—O—Si absorption. In such cases, the alkoxygroup often can be identified by using other bands.

Si—OCH2CH2CH31155(weak), 1100 and 1085
(strong doublet), 1020

Si–OCH(CH3)2

1385 and 1370 (sharp, well-defined
doublet), 1175, 1140-1110, 10551030 (strongest band in the set), 890

Si—NH2

1240, 975

The phenoxy group attached to silicon has strong bands at about 1240 and975 cm-1.

1770-1725, 1370, 1260-1195,
1050-1000, 970-925

Two of these bands are sensitive to the number of acetoxy groups attached toa silicon atom. The correlations are not perfect, but here are the tendencies:
In the interval 1770-1725 cm-1, as the number of acetoxy groups increases,
the band shifts to higher frequency. In the interval 1260-1195 cm-1, as thenumber of acetoxy groups increases, the band shifts to lower frequency.

3500-3390 (NH2, doublet
in this interval), 1550-1540

Tris(trimethylsilyl)amine (also called nonamethyltrisilazane, “NMTS”) has astrong Si—N—Si band at 915 cm-1.

3390 (NH, single band),
1200-1150, 950-920

Si—N32180-2120

Compounds containing the azide group attached to silicon have a strong
N=N=N band in the interval 2180-2120 cm-1. See W. R. Peterson, Reviewson Silicon, Germanium, Tin and Lead Compounds 1974, 1, 193.

Si—N=C=O

2280

Trimethylsilylisocyanate has a very strong —N=C=O band at 2280 cm-1.
This band position is close to the high frequency end of the range 2275-2250
cm-1 for N=C=O attached to carbon.

Si—CH2CH2CF3

1210, 1130, 1070, 1025, 900

The 1210 cm-1 band is the strongest one of the set.

Si—CH2Cl

1395, 1180

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(RO)3Si—CH2CH2CH2X
where X is

Frequency in cm-1

Comments

1580, 1485, 1380, 1090, 1015, 810

These are strong, narrow bands.

Silanes having this general formula, where X is a reactive group, are used
as coupling agents. For some of these silanes, the infrared spectrum isdominated by bands of the (RO)3Si-part of the structure, and bands due tothe reactive group are not obvious. In such cases, it often is a good idea tohydrolyze the trialkoxysilane to the resin, [O1.5SiCH2CH2CH2X]n, and torecord the infrared spectrum of the resin. This eliminates the many bands
due to Si—OR and replaces them with one or two broad Si—O—Si bands.
When 3-aminopropyl compounds are hydrolyzed in air, the —NH2 groupreacts with carbon dioxide and water, and one gets a resin containing—NH3+ -HCO3 [see S. R. Culler, H. Ishida, and J. K. Koenig, Appl. Spect.
1984, 38, 1]. This salt structure is characterized by the following bands:
3400-2000 (several broad bands), 1640 (shoulder), 1575 (strong),
1480 cm-1(strong).

1310, 910, 860
2245(CN), 1190-1175

3370 and 3290 (NH2, weak
doublet), 1595 (broad, weak)
2560 (S—H, weak)
1720 (C=O), 1640 (C=C)

1725-1660

ca. 1000

In compounds having a carbonyl group β to silicon C=O frequency in
10-20 cm-1 lower than that of the carbon analog. This is attributed to the
inductive effect of the R3SiC— group. [see G. L. Larson, D. Hernandez, I.
Montes de Lopez-Cepero and L. E. Torres, J. Org. Chem. 1985, 50, 5260 andreferences therein for examples of these kinds of molecules](CH3)HSi=CH2, stable at 35°K in argon mixture, has a strong band at 989
cm-1 due to Si=C stretch (see C. A. Arrington et al., J. Am. Chem. Soc. 1984,
106, 525; and G. Raabe et al., J. Am. Chem. Soc. 1986, 108, 671. For a goodsummary of all the Si=C infrared results reported to date, see the review
by A. G. Brook and K. M. Baines in Advances in Organometallic Chemistry
1986, 25.
Solid silenes of the type [(CH3)3Si]2Si=C[OSi(CH3)3]R, where R is a bulkygroup, are stable at room temperature in the absence of air. These silenes
show a strong band at 1135-1130 cm-1 probably due to the Si—O—C stretch
in the Si—O—C=Si group (see A. G. Brook et al., J. Am. Chem. Soc. 1982,
104, 5667.

PR
O

Si=C (silenes)O3045 (C—H of three-memberedring, weak), 1250

F

Group

CERAMICS
Silicon carbide

ca. 800

Silicon nitride

ca. 840

Silicon dioxide

ca. 1100180

www.AZmax.co.jp TEL: 03-5543-1630

Silicon carbide occurs in the bewildering number of crystal modifications.
It also occurs as amorphous material (a-SiC). We do not have detailed
spectra-structure correlations for these forms. We expect that the different
forms will have small differences in the infrared spectra, but that all forms of
SiC will show strong absorption at or near 800 cm-1.
Amorphous Si3N4 has a strong, broad absorption band at ca. 840 cm-1.

All forms of SiO2 show a strong band at 1110-1080 cm-1. In addition to thisstrong band, there are other bands that help to identify the kind of SiO2:
α-Quartz (a crystal form of SiO2)—1170 (sharp band on the slope of thestrong 1080 band), 800 and 780 (well-defined, sharp doublet), and 695 cm-1.
Cristobalite (another crystal form)—1200 (a narrow shoulder or “step”), 795,
and 620 cm-1.
Amorphous silica (includes silica gel, silica glass, “fused quartz”, precipitatedsilica, and fumed silica)—ca. 1220 (a very broad shoulder) and 810-800 cm-1.
The 810-800 cm-1 absorption of amorphous silica is broader and weaker than
the 800 cm-1 region bands of α-quartz and cristobalite.

Gelest, Inc.

(215) 547-1015

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O
O
F

Silicon Compounds

Commercial Status—produced on a regularbasis for inventory

PR

Developmental Status—available to support
development and commercialization

Specifications
For all chemicals listed the purity, unless otherwise noted, is 97% minimum, e.g. SIC2268.0 CHLOROMETHYLDIMETHOXYSILANE has a minimum
purity of 97%. All other purity specifications listed are minimum purity; for example SIC2275.0 1-CHLOROETHYLTRIMETHYLSILANE, 96% has aminimum purity of 96%, and SIA0610.1 3-AMINOPROPYLTRIETHOXYSILANE, 99+% has a minimum purity >99%. Purity listed as tech indicatesthe assay for total active components, e.g.. SIC2070.0 2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE tech-95 indicates that the material has 95%
functional activity but contains other isomers or analogous compounds with similar activity (actual purity for the nominal compound is not specified).

Name
x

O
Si

(3-ACETAMIDOPROPYL)TRIMETHOXYSILANE

221.33

162-5° / 2-3

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[57757-66-1]
HMIS: 3-2-1-X

OO

bp °C/mm(mp °C)

D420

nD20

1.07361.441

1.031251.430125117° / 62Flashpoint: 65°C (149°F)

1.17725

1.439025

143° / 70
Flashpoint: 82°C (180°F)

1.27225

1.442725

0.983

1.410

SIA0006.0

O
N
H

Mw

10g ¥51,700

SIA0010.0

O

ACETOXYETHYLDIMETHYLCHLOROSILANECl C6H13ClO2Si

108-9° / 50
Flashpoint: 63°C (145°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18306-45-1]
HMIS: 3-2-1-X
25g ¥25,700

Si

O
O

SIA0015.0

ACETOXYETHYLMETHYLDICHLOROSILANE
C5H10Cl2O2Si

Si

O

201.12

O
O
F

Cl
Cl

O

180.71

See also SIC2267.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18163-34-3]
TSCA EC 242-045-0 HMIS: 3-2-1-X
25g ¥23,600

SIA0020.0

ACETOXYETHYLTRICHLOROSILANE

Cl

Cl C4H7Cl3O2Si

Si

O

Cl

221.54

See also SIA0025.0, SIC2270.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18204-80-3]
TSCA EC 242-092-7 HMIS: 3-2-1-X
25g ¥20,400

100g ¥58,600

SIA0025.0

O

O

O

Si

O

O

O

ACETOXYETHYLTRIMETHOXYSILANE, 95%
C7H16O5SiO

Si

60° / 0.2

108-9° / 2725g ¥17,200

1.061

1.411

0.94861.44681.035

1.40401.042025

1.4092100g ¥48,300

SIA0035.0

N

N

Si

O

208.29HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[72878-29-6]
TSCA
HMIS: 3-3-1-X

OO

250.37>280° forms acetoxytriethoxysilane with extrusion of ethylene.1
1. Ezbiansky, K. A. et al. Chemical Processing of Dielectrics, Insulators & Electronic Ceramics, MRS Proc. 2000; Vol. 606, p.251.
See also SIC2271.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[22538-45-0]
HMIS: 2-2-1-X
25g ¥19,900

SIA0030.0

O
O

ACETOXYETHYLTRIETHOXYSILANE
C10H22O5Si

ACETOXYETHYLTRIS(DIMETHYLAMINO)SILANE
C10H25N3O2Si

247.42105° / 5

Employed in ALD, CVD of SiO2
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1356113-09-1]
HMIS: 3-3-1-X
10g ¥45,900

N

SIA0038.0

ACETOXYHEPTAMETHYLCYCLOTETRASILOXANE
C9H24O6Si4

PR

Si

O

O

O

Si

O

Si

O

O

Si

80° / 425g ¥31,600

SIA0050.0

O

ACETOXYMETHYLTRIETHOXYSILANE
C9H20O5Si

O

Si

O

O

O

106° / 1525g ¥20,400

100g ¥58,600

SIA0055.0

ACETOXYMETHYLTRIMETHOXYSILANE, 95%
C6H14O5Si

O

Si

O

236.34

Hydrolyzes to form stable silanol solutions in neutral water
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5630-83-1]
TSCA-L
HMIS: 2-2-1-X

O

O

O

194.26HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65625-39-0]
TSCA-L
HMIS: 3-2-1-X

190-1°
Flashpoint: 56°C (133°F)
10g ¥16,400

1.085

1.40310.86725

1.406025

50g ¥55,400

SIA0060.0

O

ACETOXYMETHYLTRIMETHYLSILANE
TRIMETHYLSILYLMETHYL ACETATE

O

182

340.63

Employed in PECVD of SiO2 dielectrics
See also SIH5842.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14697-86-0]
HMIS: 3-2-1-X

Si

C6H14O2Si

146.26HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2917-65-9]
TSCA EC 220-849-2 HMIS: 2-4-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

136-7°
Flashpoint: 20°C (68°F)
25g ¥47,500(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIA0070.0

Cl

Cl

Si

O

Cl
O

4-ACETOXYPHENETHYLTRICHLOROSILANE
C10H11Cl3O2Si
297.64126-9° / 1
Contains 3-8% isomers
Intermediate for phenolic phases
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[627882-90-0]/[282534-42-3]
HMIS: 3-2-1-X
10g ¥26,300(39-41°)

SIA0075.0Si

3-{2-[ACETOXY(POLYETHYLENEOXY)PROPYL]}HEPTAMETHYLTRISILOXANE, tech-95
600 - 750
1.032
Viscosity: 30 cSt
Flashpoint: 79°C (174°F)
Si
TOXICITY: oral rat, LD50: >2,000 mg/kg
Surfactant
O
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
Si[125997-17-3]
TSCA
HMIS: 2-1-0-X
25g ¥9,300
100g ¥22,500

1.4461

O

O
O

O

6-9

O
O
F

SIA0078.0

O

O

Si

n

2-[(ACETOXY(POLYETHYLENEOXY)PROPYL]TRIETHOXYSILANE, 95%
500 - 700
Viscosity: 50 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

O

O

O

0.912

1.4098142° / 73
1.15125
Flashpoint: 85°C (185°F)
Acetolysis of polydimethylsiloxane copolymers allows acrylation for photocrosslinking.1
1. Bouten, B. et al. Eur. Polym. J. 1995, 31,1173.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5290-24-4]
TSCA EC 226-126-8 HMIS: 3-2-1-X
25g ¥13,000
750g ¥106,000

1.443425

3-(3-ACETOXYPROPYL)HEPTAMETHYLTRISILOXANE
C12H30O4Si3O

Si

1.452725g ¥24,100

SIA0088.0

Si

O

1.071

322.6267-70° / 0.8

Surfactant
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18044-09-2]
HMIS: 2-2-0-X

OSi

25g ¥20,400

COMPOUNDSO

SIA0090.0

O

Cl

O

Si

Cl
O

215.15

SIA0092.0

3-ACETOXYPROPYLMETHYLDIMETHOXYSILANE
C8H18O4Si

OO

3-ACETOXYPROPYLMETHYLDICHLOROSILANE
C6H12Cl2O2Si

Si

206.31HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

O

110° / 525g ¥19,900

SIA0100.0

3-ACETOXYPROPYLTRIMETHOXYSILANE
C8H18O5Si
222.3192° / 2
1.062
1.4146γc of treated surfaces: 37.5 mN/m
Flashpoint: 93°C (199°F)
Forms sol-gel derived epoxidation catalyst in combination with titanium diisopropoxide bispentanedionate.1
1. Müller, C. et al. Catal. Lett. 2000, 64(1), 9-14, DOI 10.1023/A:109074617565
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[59004-18-1]
EC 261-552-8 HMIS: 3-1-1-X
25g ¥8,500
100g ¥19,900
2kg ¥192,000

O

O

Si

PR

O

O

COMMERCIALO

SILICONO

SIA0110.0

O-TRIMETHYLSILYL ACETATE

C5H12O2Si

Si

O

132.23

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 9-1939[2754-27-0]
TSCA EC 220-404-2 HMIS: 3-4-1-X

103-4°(-32°)
Flashpoint: 4°C (39°F)
Vapor pressure, 30˚: 35 mm
25g ¥4,700

0.891100g ¥14,700

1.3890COMMERCIALACETOXYTRIMETHYLSILANE

O

2kg ¥105,000

SIA0114.0

O

Cl

O

9

11-ACETOXYUNDECYLTRICHLOROSILANE
C13H25Cl3O2Si

147-9° / 1
Flashpoint: >110°C (>230°F)
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[53605-77-9]
HMIS: 3-1-1-X
10g ¥27,100

SiCl

347.781.084

SIA0115.0

OO

11-ACETOXYUNDECYLTRIETHOXYSILANE
C19H40O5Si

O

9

Si

O

O

376.61HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[959053-85-1]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

163-4° / 0.8

0.936

1.43261.0g ¥34,200(215) 547-1015

www.gelest.com

183

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIA0120.2
O

O

H
N

N
H

O

Si
O

O

N-(ACETYLGLYCYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 5% in methanol
C10H22N2O5Si
278.38(171-3°)
Flashpoint: 11°C (52°F)
Amino acid-tipped silane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1274903-53-5]
HMIS: 3-4-1-X
25g ¥14,100

0.80

SIA0126.0
O

O

O

N

Si

O

O

O
HO

3-(N-ACETYL-4-HYDROXYPROLYLOXY)PROPYLTRIETHOXYSILANE, 25% in ethanol
C16H31NO7Si
377.51
Flashpoint: 15°C (59°F)
Amino acid-tipped silane
Hydrophilic reagent for biomimetic surface modification
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1300591-79-0]
HMIS: 2-3-0-X
5g ¥51,200

0.872

SIA0127.0

NH

HN

O

O

Si

O

N-(N-ACETYLLEUCYL)-3-AMINOPROPYLTRIETHOXYSILANE, 12-15% in ethanol
C17H36N2O5Si
376.58Flashpoint: 15°C (59°F)
Hydrophobic amino acid-tipped silane
See also SIA0120.0, SIA0126.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1367348-25-1]
HMIS: 2-3-1-X
2.5g ¥36,900

O
O
F

O

O

0.816

SIA0130.0

ACETYLTRIMETHYLSILANE

1-TRIMETHYLSILYLETHANONEC5H12OSiSi

113-4°
Flashpoint: 8°C (46°F)

Silyl building block.
1. Larson, G. et al. Synth. Comm. 1990, 20, 1095.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[13411-48-8]
HMIS: 2-4-1-X

O

0.811

1.4110

1.062

1.465

0.950

1.426025

0.931

1.40845g ¥22,500

SIA0146.0

O

O
Si

N
H

O

3-ACRYLAMIDOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
C15H37NO4Si4
407.80

O
Si

N
H

O

3-ACRYLAMIDOPROPYLTRIMETHOXYSILANE, tech-95
C9H19NO4Si
233.34
Inhibited with MEHQ
See also SIM6480.73
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[57577-96-5]
HMIS: 3-2-1-X store <5°C

10g ¥37,400

SIA0150.0

Si

O

O

O
Si

Si

145-50° / 0.25

Comonomer for oxygen permeable polymers
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[115258-10-1]
HMIS: 2-2-1-X store <5°C

(40-43°)10g ¥51,700

SIA0160.0OPR(2-ACRYLOXYETHOXY)TRIMETHYLSILANE
2-TRIMETHYLSILOXYETHYLACRYLATEOO

C8H16O3Si

Si

188.2990-4° / 6

See also SIM6481.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18269-99-3]
HMIS: 3-2-1-X store <5°C

25g ¥23,100

SIA0180.0

O

O

O

H
N

HO

O

Si

O

N-(3-ACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE, 50% in ethanol
C15H31NO6Si
349.50Inhibited with MEHQ
Flashpoint: 15°C (59°F)
1
Used to stabilize Stober silica suspensions.
1. Park, B. et al. J. Mater. Sci. 1992, 27, 5692
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[123198-57-2]
HMIS: 3-4-1-X store <5°C
25g ¥46,900

SIA0184.0

O

O

O

Si
O

O
Si
O

O

(ACRYLOXYMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95
C15H22O5Si
310.42
Inhibited with MEHQ; mixed m-,p-; α-,β- isomers
Coupling agent for UV cure systems w/less oxygen sensitivity
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[141813-19-6](m)/[141813-20-9] (p)HMIS: 3-3-1-X store <5°C

10g ¥42,700

SIA0182.0

ACRYLOXYMETHYLTRIMETHOXYSILANE
C7H14O5Si

O
O

184

116.24

1

O

206.2742-6° / 0.15

Coupling agent, comonomer for ormosils
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21134-38-3]
TSCA-L
HMIS: 3-3-1-X store <5°C

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.060

25g ¥61,800(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm

158.2735° / 6.5

(mp °C)

D420

nD20

0.868

1.424825

0.9076

1.422

SIA0186.0

OO

ACRYLOXYMETHYLTRIMETHYLSILANE
C7H14O2Si

Si

Undergoes UV polymerization
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[67186-35-0]
HMIS: 3-3-0-X store <5°C

10g ¥26,800

SIA0190.0O(3-ACRYLOXYPROPYL)DIMETHYLMETHOXYSILANE, 95%
C9H18O3Si
202.3254-5° / 0.1
Inhibited with MEHQ
Flashpoint: 85°C (185°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[111918-90-2]
HMIS: 3-2-1-X store <5°C
5g ¥24,700

O
O

Si

O

O

Si

Si

(3-ACRYLOXYPROPYL)METHYLBIS(TRIMETHYLSILOXY)SILANE, tech-90
C13H30O4Si3
334.63
Inhibited with MEHQ; contains difunctional disiloxane monomer
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[177617-17-3]
HMIS: 3-2-0-X store <5°C

O
Si

O

Cl

O

108° / 2OOFO

25g ¥88,300

SIA0194.0

Si

5g ¥21,500

25g ¥75,600

SIA0196.0(3-ACRYLOXYPROPYL)METHYLDICHLOROSILANE
C7H12Cl2O2Si

227.1573° / 0.1

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[71550-63-5]
TSCA EC 275-614-7 HMIS: 3-2-1-X store <5°C
5g ¥16,400

Cl

1.15

1.458525

0.947

1.4139

1.01

1.431

25g ¥55,400(3-ACRYLOXYPROPYL)METHYLDIETHOXYSILANE, 95%
C11H22O4Si
246.3840° / 1
Inhibited with MEHQ
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[146666-71-9]
HMIS: 3-2-1-X store <5°C
25g ¥23,100

O

O

Si
O

SIA0198.0

O(3-ACRYLOXYPROPYL)METHYLDIMETHOXYSILANE, 95%
O C9H18O4Si
218.3365° / 0.35
Inhibited with MEHQ
Si
Employed in fabrication of photoimageable, low shrinkage multimode waveguides.1
1. Xu, C. et al. Chem. Mater. 1996, 8, 2701.
O
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13732-00-8]
TSCA-L
HMIS: 3-2-1-X store <5°C
50g ¥17,800

O250g ¥62,200

SIA0199.0

O(3-ACRYLOXYPROPYL)TRICHLOROSILANE
C6H9Cl3O2Si
247.5868° / 0.4
1.26
Inhibited with MEHQ
Flashpoint: >100°C (>212°F)
See also SIA0200.0
Cl
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[38595-89-0]
TSCA-L
HMIS: 3-1-1-X store <5°C
5g ¥14,600
25g ¥48,000

Cl

O

Si

Cl

1.4631

SIA0200.0

O
O

Si

O

O

O

O

SIA0200.2(3-ACRYLOXYPROPYL)TRIMETHOXYSILANE, oligomeric hydrolysate(CH2)3O

Si

O

Viscosity: 8-12 cSt
Employed in rapid prototyping
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X store <5°C

O
n

O

Si

O

O

Si

1.2

25g ¥27,300

OSi(3-ACRYLOXYPROPYL)TRIS(TRIMETHYLSILOXY)SILANE, tech-95
C15H36O5Si4
408.79136-8° / 1
Inhibited with MEHQ; contains difunctional siloxane
Flashpoint: 93°C (199°F)
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17096-12-7]
HMIS: 3-2-0-X store <5°C
5g ¥17,200

SIA0315.0OO

Si

100g ¥80,900

SIA0210.0

Si

O

COMMERCIAL(3-ACRYLOXYPROPYL)TRIMETHOXYSILANE, 96%
C9H18O5Si
234.3268° / 0.4(<-20°)
1.06
1.4155
Inhibited with BHT
Flashpoint: 123°C (253°F)
Coupling agent for epoxies, UV cure coatings
Employed in optical fiber coatings.1
In combination with dipodal silane, SIB1833.0, increases strength and hydrolytic stability of dental composites.2
1. Yokoshima, M. et al. Chem. Abstr. 113, 15746d; Jap. Pat. 02133338, 1990.
2. Matinlinna, J. et al. Acta Odontol. Scand. 2012, 70, 405.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3727[4369-14-6]
TSCA
HMIS: 3-1-1-X store <5°C
25g ¥13,500
100g ¥36,300
2kg ¥170,000

PRO

SILICONOCOMPOUNDS

SIA0197.0

ACRYLOXYTRIISOPROPYLSILANE
C12H24O2Si

228.4194-6° / 7

Monomer for marine anti-foulant coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[157859-20-6]
HMIS: 2-3-1-X store <5°C

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

0.88

1.41800.910

1.448525g ¥58,600

25g ¥28,400(215) 547-1015

www.gelest.com

185

Name

bp °C/mm(mp °C)

D420

nD20

0.89391.4112

SIA0320.0

O

ACRYLOXYTRIMETHYLSILANEO-(TRIMETHYLSILYL)ACRYLATE

C6H12O2Si
144.2564-5° / 100
Inhibited with MEHQ
Flashpoint: 26°C (79°F)
See also SIM6491.0, SIT8584.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13688-55-6]
TSCA
HMIS: 3-3-1-X store <5°C
25g ¥20,400

SiO100g ¥58,600

SIA0325.0

Cl
Si

ADAMANTYLETHYLTRICHLOROSILANE
C12H19Cl3Si
297.73135° / 3(36-7°)
1.2204
Contains approximately 25% α-isomerFlashpoint: 155°C (310°F)
Forms silica bonded phases for reverse phase chromatography.1
1. Yang, S. S.; Gilpin, R. K. Anal. Chem. 1988, 59, 2750.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[37843-11-1]
TSCA EC 253-687-6 HMIS: 3-1-1-X
5g ¥25,200
25g ¥90,400

Cl1.5135

O
O
F

Cl

Mw

SIA0400.0

3-(N-ALLYLAMINO)PROPYLTRIMETHOXYSILANE, 95%
C9H21NO3Si

O
Si

N
H

O

O

219.36

Coupling agent for polyesters
Coupling agent for acrylic coatings for glass containers.1
1. Hashimoto. Y. et al. Eur. Pat. Appl. EP 289,325, 1988.
See also SIA0415.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2077[31024-46-1]
TSCA EC 250-435-7 HMIS: 3-2-1-X

106-9° / 25
Flashpoint: 88°C (190°F)

10g ¥17,200

0.98925

1.499250.770

1.412725

1.01

1.51770.907

1.449050g ¥58,600

SIA0402.0

ALLYLAMINOTRIMETHYLSILANE, 96%
N-(TRIMETHYLSILYL)ALLYLAMINE

N
H

Si

C6H15NSi

129.28110-2°
Flashpoint: 10°C (50°F)

Protected amine; undergoes hydrosilylation
See also SIB1825.7
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10519-97-8]
HMIS: 3-4-1-X
25g ¥21,500

100g ¥62,100

SIA0415.0

NO

N-ALLYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
C8H17NO2Si

Si

O

187.3152-4° / 3

Coupling agent for nanoparticles
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[618914-49-1]
HMIS: 3-3-1-X
10g ¥36,300

SIA0433.0(S,S)-2-ALLYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE

1-OXA-3-AZA-2-SILACYCLOPENTANE, 2-CHLORO-3,4-DIMETHYL-5-PHENYL-2-(2-PROPENYL), (4S,5S)

C13H18ClNOSi

PR

O

267.82

Used in the enantioselective allylation of aldehydes and imines.1,2
O
Ph
O
+ BnO
Si
H
N Cl
Me
Me

Si

N

Cl

120° / 0.1

toluene-10°, 2hOH

BnO

85%; 88% ee

1. Kinnaird, J. W. A. et al. J. Am. Chem. Soc. 2002, 124, 7920.
2. Berger, R. et al. J. Am. Chem. Soc. 2003, 125, 9596.
See also SIP6724.95
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[447440-43-9]
HMIS: 3-2-1-X
5g ¥41,600

SIA0440.0

SiCl

163-6° / 50
Flashpoint: 27°C (81°F)

10g ¥16,200

50g ¥54,400

SIA0441.0

Si

Cl

186

ALLYL(CHLOROMETHYL)DIMETHYLSILANE, 95%
C6H13ClSi
148.71
Contains isomers
Cl
Grignard is a nucleophilic hydroxymethylating agent.1
1. Tamao, K. et al. Tetrahedron Lett. 1984, 25, 4249.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[75422-66-1]
HMIS: 2-3-0-X

ALLYL(3-CHLOROPROPYL)DICHLOROSILANE
217.6060-3° / 0.6
Cl C6H11Cl3Si
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[166970-54-3]
HMIS: 3-2-1-X
5g ¥38,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.172

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIA0445.0

ALLYLDICHLOROSILANE

Cl

H

Si

Cl
O

C3H6Cl2Si

141.0797°
Flashpoint: -4°C (25°F)
1
Pt catalysts induce autopolymerization or may cross-couple with other olefins.
1. Lee, B. et al. Main Group Chemical News 1995, 1, 53.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3937-28-8]
EC 223-515-4 HMIS: 3-4-2-X
5g ¥17,200

1.0862725g ¥58,600

SIA0447.0

HSi

4,4-DICHLORO-4-SILABUTENE

ALLYLDIMETHOXYSILANE
C5H12O2Si

O

132.23

107-9°HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18147-35-8]
HMIS: 3-4-1-X

0.877

1.44505g ¥18,800

SIA0460.0

OOF

ALLYLDIMETHYLCHLOROSILANE, 95%
C5H11ClSi
134.68110-2°
Contains β-methylvinyl isomerFlashpoint: 5°C (41°F)
Reagent for steroid derivatization for GC/MS analysis.1,2
Used in intramolecular, stereoselective allylation of hemiacetals.3
1. Philippou, G. J. Chromatogr. 1976, 129, 384.
2. Poole, C. F.; Zlatkis, A. J. Chromatogr. Sci. 1979, 17, 115.
3. Esteban, J. et al. Org. Lett. 2008, 10, 4843.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2042[4028-23-3]
TSCA EC 223-706-2 HMIS: 3-4-1-X
5g ¥13,500

ClSi

0.8964

1.419525g ¥43,800

ALLYLDIMETHYL(DIISOPROPYLAMINO)SILANE
C11H25NSi

SiN

199.4279-81° / 13Flashpoint: 62°C (144°F)

0.815

1.447069-70°
Flashpoint: -20°C (-4°F)

0.70525

1.402925

0.935

1.519

1.076

1.44190.87125

1.405525

0.811

1.42101.040

1.4555

Stereoselective α-hydroxyallylation reagent.
1. Tamao, K. et al. J. Org. Chem. 1987, 52, 957.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[106948-24-7]
TSCA
HMIS: 3-2-1-X
10g ¥54,900
1

SIA0464.0

H

Si

ALLYLDIMETHYLSILANE, 95%
C5H12Si

100.24Dry-development resist produced by plasma polymerization.1
1. Fujitsu, Chem. Abstr.101, 31148n; Jap. Patent 59013323, 1984.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[3937-30-2]
TSCA
HMIS: 2-4-2-X

5g ¥17,800

ALLYL(4-METHOXYPHENYL)DIMETHYLSILANE
C12H18OSiO

206.36253°
Flashpoint: 102°C (216°F)

See also SIV9079.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68469-60-3]
HMIS: 2-1-0-X

SILICON

SIA0469.0Si

5g ¥26,800

PR

SIA0470.0

Cl

COMPOUNDS

SIA0461.0

ALLYLMETHYLDICHLOROSILANE, 95%

3-(DICHLOROMETHYLSILYL)-1-PROPENE

Si

C4H8Cl2Si

Cl

155.10119-20°Flashpoint: 27°C (81°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2042[1873-92-3]
TSCA EC 217-498-2 HMIS: 3-3-2-X
25g ¥27,300

100g ¥80,900

SIA0485.0

O

ALLYLMETHYLDIMETHOXYSILANE, tech-95
C6H14O2Si
146.26
Contains β-methylvinyl isomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67681-66-7]
EC 266-901-8 HMIS: 3-3-1-X

SiO

127-8°
5g ¥26,300

SIA0476.0

O

ALLYLOXY-t-BUTYLDIMETHYLSILANE
C9H20OSiSi

172.35

Undergoes hydroboration and hydrosilylation
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[85807-85-8]
HMIS: 3-3-1-X

120° / 50
Flashpoint: 32°C (90°F)
10g ¥21,500

SIA0479.0

O

O
n

Si

O-ALLYLOXY(POLYETHYLENEOXY)TRIMETHYLSILANE, tech-95
470 - 560
Average of 10 -(OCH2CH2)- units
Viscosity: 20 - 25 cSt
Hydrophilic monomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-3-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

25g ¥13,000(215) 547-1015

100g ¥34,500

www.gelest.com

187

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.789

1.3970

SIA0480.0

ALLYLOXYTRIMETHYLSILANE

O-TRIMETHYLSILYLALLYL ALCOHOL

C6H14OSi

130.26

Regioselective silylating agent.
For the S-allylation of sulfides.2
Can be isomerized to the enol silyl ether of propanal.3
1. Chan, T. et al. J. Organomet. Chem. 1979, 179, C24.
2. Vedejs, E. et al. J. Org. Chem. 1981, 46, 3353.
3. Fielding, J.; Roberts, B. P. Tetrahedron Lett. 2001, 42, 4061.
See also SIA0476.0, SIM6497.0, SIV9089.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2960[18146-00-4]
TSCA EC 242-031-4 HMIS: 3-4-1-X
1

Si

O

100-2°
Flashpoint: 0°C (32°F)

25g ¥16,700

100g ¥46,400

4-ALLYLOXY-(2-TRIMETHYLSILOXY)DIPHENYLKETONEsee SIT8570.5 2-TRIMETHYLSILOXY-4-ALLYLOXYDIPHENYLKETONE
11-ALLYLOXYUNDECYLTRIMETHOXYSILANE
C17H36O4Si

O
O

Si

11

O

O
O
F

SIA0482.0

O

332.56140° / 0.5

ω-olefin for functional self-assembled monolayers (SAMs)
See also SID4618.0, SIU9049.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1196453-35-6]
HMIS: 2-1-0-X

0.914

1.4415

1.16825

1.5351250.80011.40605g ¥42,700

SIA0486.0

Cl

ALLYLPHENYLDICHLOROSILANE, 95%
C9H10Cl2Si

Si

217.17100-2° / 8
Flashpoint: 76°C (169°F)

Allylation synthon
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7719-03-1]
TSCA EC 231-747-2 HMIS: 3-2-1-X
50g ¥65,000

Cl

SIA0489.0

OSi

m-ALLYLPHENYLPROPYLTRIETHOXYSILANE
C18H30O3Si

OO

322.52

Coupling agent for amine functional aromatic optical coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

5g ¥40,600

SIA0490.0

Si

O

Si

1-ALLYL-1,1,3,3-TETRAMETHYLDISILOXANE
C7H18OSi2

174.39H See also SIV9097.5

131-2°
Flashpoint: 10°C (50°F)

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18387-26-3]
HMIS: 2-3-1-X

5g ¥20,400

SIA0520.0

PR

ALLYLTRICHLOROSILANE
C3H5Cl3Si
175.52
117-8°
1.201
Vapor pressure, 16˚: 10 mm
Flashpoint: 31°C (88°F)
ΔHvap: 39.3 kJ/mole
TOXICITY: ivn mouse, LD50: 56 mg/kg
Review of synthetic utility.1
2
Effects asymmetric allylation of aldehydes after reaction with chiral diols.

SiCl3 +

i

Pr2EtN, MeCN

ArCHO

Ar

catalyst, -45°C

OH

Used in the highly enantioselective allylation of aromatic aldehydes.3,4

Cl

Si

Cl

Cl

188

PhCHO +

Cl3Si

1.4460OH

CH2Cl2, iPr2EtN
catalyst, -78°C, 8-10 h

Ph

Enantioselectively allylates aryl aldehydes with high ee values.
Undergoes enantioselective allylation of aldehydes to form homoallylic alcohols.6
Allylates carbonyls with base catalysis as opposed to allyltrimethylsilane (SIA0555.0), which requires Lewis acid catalysis.7
Chiral Phosphoramides catalyze the enantioselective allylation of aromatic, heteroaromatic, as well as cinnamyl aldehydes.8
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 10-14.
2. Wang, Z. et al. J. Chem. Soc., Chem. Commun. 1996, 2261.
3. Shimada. T. et al. Org. Lett. 2002, 4, 2799.
4. Malkov, A. et al. Org. Lett. 2002, 4, 1047.
5. Simonini, V. et al. Adv. Synth. Catal. 2008, 350, 561.
6. Massa, A. et al. Tetrahedron: Asymmetry 2009, 20, 202.
7. Kobayashi, S.; Nishio, K. Tetrahedron Lett. 1993, 34, 3453.
8. Denmark, S. E. et al. J. Org. Chem. 1994, 59, 6161.
See also SIO6708.0, SIV9110.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2037[107-37-9]
TSCA EC 203-485-9 HMIS: 3-3-2-X
10g ¥11,400
50g ¥35,300

www.AZmax.co.jp

TEL: 03-5543-1630

5

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

C9H20O3Si
204.34176°
0.9030Vapor pressure, 100˚: 50 mm
Flashpoint: 47°C (117°F)
Dipole moment: 1.79 debye
Extensive review on the use in silicon-based cross-coupling reactions.1
1. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. Ed., John Wiley and Sons, 233, 2011.
See also SIA0489.0, SIA0540.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2066[2550-04-1]
TSCA EC 219-843-2 HMIS: 2-2-1-X
10g ¥12,700
50g ¥40,600

1.4074

SIA0525.0

ALLYLTRIETHOXYSILANE

3-(TRIETHOXYSILYL)-1-PROPENE

O
Si

O

O

SIA0535.0

ALLYLTRIISOPROPYLSILANE
C12H26Si

130° / 16
Flashpoint: 76°C (169°F)
Alkylated by primary alkyl bromides with greater regiospecificity than allyltrimethylsilane.1
1. Muchowski, J. et al. Tetrahedron Lett. 1985, 26, 5375.
F&F: Vol 13, p 11
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[24400-84-8]
HMIS: 2-2-0-X
5g ¥36,300

0.824

1.4670O
O
F

Si

198.43

SIA0540.0

SiOO

146-8°
Flashpoint: 46°C (115°F)

0.9632585-6°Flashpoint: 7°C (45°F)

0.71931.403625

Adhesion promoter for vinyl-addition silicones
Allylation of ketones, aldehydes and imines with dual activation of a Lewis Acid and fluoride ion.1
Used in the regioselective generation of the thermodynamically more stable enol trimethoxysilyl ethers, which in turn are used in theasymmetric generation of quaternary carbon centers.2
Converts arylselenyl bromides to arylallylselenides.3
Allylates aryl iodides.4
1. Yamasaki, S. et al. J. Am. Chem. Soc. 2002, 124, 6536.
2. Ichibakase, T. et al. Tetrahedron Lett. 2008, 49, 4427.
3. Bhadra, S. et al. J. Org. Chem. 2010, 75, 4864.
4. Mowery, M. E.; DeShong, P. J. Org. Chem. 1999, 64, 1684.
F&F: Vol 18, p 14; Vol 19, p 360; Vol 20, p 85; Vol 21, p 3, Vol 12, p 395
See also SIA0525.0, SIB1832.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2066[2551-83-9]
TSCA EC 219-855-8 HMIS: 3-2-1-X
10g ¥10,900
50g ¥33,200
2kg ¥205,000

COMMERCIAL

O

162.26

SIA0555.0

114.261.4074

SILICONALLYLTRIMETHYLSILANE
C6H14Si

Si

PgO

O

+

SiMe3

O

N

BF3OEt2

CH2Cl2, rt

PgO

OH

Diallylates ketones via their ketals.
1. Handbook for Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 14-24.
2. Weber, W. In Silicon Reagents for Organic Synthesis; Springer-Verlag: 1983, p173.
3. Fleming, I. Synthesis 1979, 761.
4. Hosomani, N. Acc. Chem. Res. 1988, 21, 200.
5. Habane, S. et al. Macromol. Chem. Phys. 1998, 199, 2211.
6. Wilczek, L. et al. J. Polym. Sci., Part A: Polym. Chem. 1987, 25, 3255.
7. Dussault, P. H.;Liu, X. Org. Lett. 1999, 1, 1391.
8. Weng, D. K. et al. J. Org. Chem. 1999, 64, 4233.
9. De Armas, P. et al. Org. Lett. 2000, 3, 3513.
10. De, S. K.; Gibbs, R. A. Tetrahedron Lett. 2005, 46, 8345.
11. Kabalka, G. W. et al. Organometallics 2007, 26, 4112.
12. Kataki, D.; Phukan, P. Tetrahedron Lett. 2009, 50, 1958.
13. Galy, N. et al. Tetrahedron 2011, 67, 1448.
F&F: Vol. 7, p 370; Vol. 8, p 273; Vol. 9, p 155; Vol. 10, p 1, p 4, p 439; Vol. 11, p 16, p 532; Vol.12, p 223; Vol. 13, p 11, p 295, p 305, p
343; Vol. 14, p 18; Vol. 15, p 286, p 378, p 403, p 411; Vol. 21, p 11, p 12, p 89.
See also SIM6513.0
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid(既) 2-3737[762-72-1]
TSCA EC 212-104-5 HMIS: 2-4-0-X
25g ¥13,800
100g ¥36,800
1.5kg ¥203,000
13

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALPR

Versatile synthon- transfers allyl group, highly nucleophilic double bond
Key reviews.1,2Undergoes polymerization with zirconocene complexes.5
Provides functional termination of living carbocationic polymerized polyisobutylenes.6
Allylates dioxolanes.7
Allylates imines under fluoride catalysis.8
Provides alternative for the formation of trans-allyl-2,3-O-isopropylidene-protected pyrrolidines.9
Carries out deoxygenative allylation of benzylic alcohols.10
Allylates lithium alkoxides w/ loss of the lithium oxide.11
Forms benzylic homoallylic alcohols in a 3-component reaction w/ aldehydes.12
Cbz
Cbz

N

COMPOUNDSALLYLTRIMETHOXYSILANE
C6H14O3Si

189

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.861251.4008SIA0575.0

ALLYLTRIPHENYLSILANE
C21H20SiOSi(88-90°)2.5g ¥17,200

SIA0585.0

ALLYLTRIS(TRIMETHYLSILOXY)SILANE
C12H32O3Si4

SiO

336.73

Reaction with fluoroalkanoyl peroxides yields fluorinated siloxanes.
1. Sawada, H. et al. Chem. Abstr. 115, 256270k; Yukagaku 1991, 40, 730.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[7087-21-0]
HMIS: 2-2-0-X
1

Si

O

Si

300.48Provides stereoselective synthesis of dienes.1
1. Ikeda, Y. et al. Bull. Chem. Soc. Jpn. 1986, 59, 657.
See also SIV9265.0
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[18752-21-1]
HMIS: 2-1-0-X

Si

110-1° / 20
Flashpoint: 67°C (153°F)

10g ¥20,700

50g ¥72,400

OOF

ALUMINOSILANE- see SID2780.0 DI-s-BUTOXYALUMINOXYTRIETHOXYSILANE
ALUMINUM SILICATE - see SIK6463.5, KAOLIN, calcined

SIA0587.0

4-AMINOBUTYLTRIETHOXYSILANE, 95%
C10H25NO3Si

O

H2N

Si

O

O

235.40114-6° / 14
0.94125
Flashpoint: 109°C (228°F)
TOXICITY: oral rat, LD50: 1,620 mg/kg

Amino-functional coupling agent
See also SIA0587.07
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3069-30-5]
HMIS: 2-1-1-X

10g ¥17,000

1.427025

50g ¥57,000

SIA0587.05

4-AMINO-3,3-DIMETHYLBUTYLMETHYLDIMETHOXYSILANE
C9H23NO2Si

O

Si

H2N

205.37

Flashpoint: 100°C (212°F)
TOXICITY: oral rat, LD50: 631 mg/kg

O Comonomer for non-yellowing textile lubricants

See also SIA0605.0, SIP6828.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[156849-43-3]
TSCA
HMIS: 3-2-1-X

25g ¥13,500

0.924825

1.4365100g ¥36,300

SIA0587.07

4-AMINO-3,3-DIMETHYLBUTYLTRIMETHOXYSILANE

Si

H2N

AMINONEOHEXYLTRIMETHOXYSILANE

C9H23NO3Si

OO

221.37230°
Flashpoint: 97°C (207°F)

Sterically hindered primary amine coupling agent
Non-yellowing aminosilane coupling agent for flexible adhesives and sealants
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[157923-74-5]
TSCA
HMIS: 3-1-1-X

25g ¥9,800

0.977100g ¥28,900

1.43022kg ¥156,000

SIA0587.1

1-AMINO-2-(DIMETHYLETHOXYSILYL)PROPANE, 85%
C7H19NOSi
161.32
Contains 3-aminopropyldimethylethoxysilane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

PR

O

H2N

Si

Amino-functional coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[31024-49-4]
HMIS: 3-2-1-X

N
H

190

N
H

85-9° / 2Flashpoint: 88°C (190°F)

0.90025

1.451325

0.960

1.451825g ¥31,000

SIA0587.5

N-(2-AMINOETHYL)-3-AMINOISOBUTYLMETHYLDIMETHOXYSILANE, 95%
C9H24N2O2Si
220.39

O

H2N

1.431

5g ¥24,700

N-(2-AMINOETHYL)-3-AMINOISOBUTYLDIMETHYLMETHOXYSILANE, 95%
C9H24N2OSi
204.39

Si

Si

0.85

SIA0587.2

O

H2N

101-7° / 100

O

Amino-functional coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[23410-40-4]
TSCA EC 245-642-4 HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

131° / 15
Flashpoint: 96°C (205°F)
25g ¥27,300(215) 547-1015

www.gelest.com

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIA0588.0

H2N(AMINOETHYLAMINOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-90
C14H26N2O3Si
298.46126-30° / 0.2
1.02
Mixed m-,p- isomers
Flashpoint: >110°C (>230°F)
1
Coupling agent for polyimides.
Photochemically sensitive (194nm).2
Forms self assembled monolayers.3
Reagent for charge heterogeneity in micropatterning.4
1. Arkles, B. et al. Modern Plastics 1980, 57, 64.
2. Dressick, W. et al. Thin Solid Films 1996, 284, 568.
3. Harnett, C. et al. Appl. Phys. Lett. 2000, 76, 2466.
4. Chen, J. et al. Nano Lett. 2002, 2, 393.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[74113-77-2]
TSCA
HMIS: 3-1-1-X
25g ¥25,200
100g ¥74,000

N
H

O

Si

O

O

1.5083

SIA0588.8
N
H

N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIETHOXYSILANE
C10H26N2O2Si
234.41

108-110° / 1.5
Flashpoint: >110°C (>230°F)

0.923

1.445

O
O
F

O

H2N

Si

Adhesion promoter for silanol-functional silicones on metal substrates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[70240-34-5]
EC 274-494-3 HMIS: 3-2-1-X

O

25g ¥16,200

サイラエース S310
N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIMETHOXYSILANE, tech-95
C8H22N2O2Si
206.36265°
0.97525
1.444725
Specific wetting surface: 380 m2/g
Flashpoint: 90°C (194°F)
O
Autoignition temperature: 280˚C
SiComonomer for silicones in textile softeners and hair care formulations
Coupling agent for furan-quartz sand floor coating systems
O
Adhesion promoter for urea-formaldehyde binders on flexible substrates
See also SIA0587.5, SIP6828.4
100g ¥4,800
1kg ¥9,300
サイラエース S310
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2084[3069-29-2]
TSCA EC 221-336-6 HMIS: 3-1-1-X
25g inquire
2kg inquire
16kg inquireN
H

COMMERCIAL

H2N

SIA0590.0

SILICONN
H

COMMERCIAL

H2N

N-(2-AMINOETHYL)-3-AMINOPROPYLSILANETRIOL, 25% in water, mainly oligomers
C5H16N2O3Si
180.281.00
pH: 10.0-10.5
Flashpoint: >110°C (>230°F)
OH
Internal hydrogen bonding stabilizes solution
Si
OH Additive for CMP slurries
HO
Aqueous primer, adhesion promoter for resin-to-metal applications
See also WSA-7021 for greater hydrolytic stability
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[68400-09-9]
TSCA
HMIS: 2-0-0-X
100g ¥6,100
2kg ¥40,500
18kg ¥284,000

SIA0590.5

N-(2-AMINOETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 95%
C11H28N2O3Si
264.55

O

N
H

Si

O

O

Coupling agent with slower hydrolysis than SIA0591.0, SIA0592.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2059[5089-72-5]
TSCA EC 225-806-1 HMIS: 3-1-1-X

PR

H2N

156° / 15
Flashpoint: 148°C (298°F)

0.994

COMPOUNDS

SIA0589.0

1.436725

25g ¥19,400

サイラエース S320
N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-95

SIA0591.0

H2N

N-[3-(TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE; DAMO

O

N
H

Si

O

O

H2N

N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 98%

O

N
H

Si

O

N-[3-(TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE; DAMOOC8H22N2O3Si

222.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1760-24-3]
TSCA EC 217-164-6 HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

140° / 15
Flashpoint: 150°C (302°F)
25g ¥6,200(215) 547-1015

1.01925100g ¥12,200

www.gelest.com

1.45025

COMMERCIAL

SIA0591.1

COMMERCIAL

C8H22N2O3Si
222.36140° / 15
1.019251.45025
Flashpoint: 150°C (302°F)
Contains 2-6% N,N’-Bis[(trimethoxysilyl)propyl]ethylenediamine
Viscosity: 6.5 cSt
TOXICITY: oral rat, LD50: 7,460 mg/kg
Surface tension: 36.5 mN/m
Autoignition temperature: 300˚C
Specific wetting surface: 358 m2/g
Coefficient of thermal expansion: 0.8 x 10-3
Coupling agent for polyamides, polycarbonates (e.g. in CDs), polyesters and copper/brass adhesion
Film-forming coupling agent/primer, fiberglass size component
For cyclic version see SID3543.0, for pre-hydrolyzed version see SIA0590.0
Used in the immobilization of copper (II) catalyst on silica.1
Used together w/ SID3396.0 to anchor PdCl2 catalyst to silica for acceleration of the Tsuji-Trost reaction.2
1. Wu, Q.; Wang, L. Synthesis 2008, 2007.
2. Noda, H. et al. Angew. Chem., Int. Ed. Engl. 2012, 51, 8017.
100g ¥4,400
1kg ¥9,300
サイラエース S320
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2083[1760-24-3]
TSCA EC 217-164-6 HMIS: 3-1-1-X
25g inquire
2kg inquire
16kg inquire

2kg ¥52,000

191

Name

N
H

11

Si

O

O

bp °C/mm

N-(2-AMINOETHYL)-11-AMINOUNDECYLTRIMETHOXYSILANE
C16H38N2O3Si
334.57

155-9° / 0.4(mp °C)

D420

nD20

0.87325

1.45150.905

1.47690.92825

1.438525

1.11

1.45010.76971.4168SIA0595.0

O

H2N

Mw

Coupling agent with extended spacer-group for remote substrate binding
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[121772-92-7]
HMIS: 3-1-1-X

5g ¥40,600

SIA0592.0

N-(2-AMINOETHYL)-2,2,4-TRIMETHYL-1-AZA-2-SILACYCLOPENTANE
C8H20N2Si
172.35NH2

N

Si

54-6° / 2

Coupling agent for vapor phase modification of nanoparticles
See also SID3543.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18246-33-8]
HMIS: 3-2-1-X
10g ¥24,100

SIA0592.6
H
N

H2N

O

Si

Long-chain amino coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15129-36-9]
HMIS: 3-2-1-X

O

6

N-(6-AMINOHEXYL)AMINOMETHYLTRIETHOXYSILANE, 95%
C13H32N2O3Si
292.49160° / 0.1
Flashpoint: >110°C (>230°F)

O
O
F

O

25g ¥11,100

100g ¥28,400

SIA0594.0

H
N

H2N

N-(6-AMINOHEXYL)AMINOPROPYLTRIMETHOXYSILANE, 95%
C12H30N2O3Si
278.47

O

O

Si

6

O

3

Employed in immobilization of DNA.
Employed for immobilization of PCR primers on beads.2
1. Kneuer, C. et al. Int’l. J. Pharmaceutics 2000, 196, 257.
2. Andreadis, J. et al. Nuc. Acid Res. 2000, 28, E-5.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[51895-58-0]
HMIS: 3-1-1-X
1

160-5° / 0.15
Flashpoint: >110°C (>230°F)

10g ¥16,200

50g ¥44,800

SIA0596.0

AMINOMETHYLTRIMETHYLSILANE(TRIMETHYLSILYL)METHYLAMINE

H2N

C4H13NSi
103.24
94-5°
Hygroscopic
Flashpoint: 9°C (48°F)
Reacts with nitrourea to form corresponding α-silylurea.1
Forms imines which when reacted with fluoride ion generate 2-aza-allylanion chemistry.2,3,4
Form imines which are precursors to imidazolidines.5,6
1. Seyferth, D. et al. J. Organomet. Chem. 1972, 44, 279.
2. Achiwa, K. et al. Chem. Lett. 1984, 2041.
3. Tsuge, O. et al. Bull. Chem. Soc. Jpn. 1986, 59, 2537.
4. Imai, N. et al. Chem. Pharm. Bull. 1987, 35, 2085.
5. Achiwa, K.; Sekiya, M. Chem. Lett. 1981, 1213.
6. Achiwa, K. et al. Chem. Pharm. Bull. 1983, 31, 3939.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18166-02-4]
HMIS: 3-4-0-X
5g ¥41,600

Si

O

O

O

3-(m-AMINOPHENOXY)PROPYLTRIMETHOXYSILANE, tech-95
C12H21NO4Si
271.39Amber liquid
High temperature coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55648-29-8]
TSCA
HMIS: 3-1-1-X

PR

H2N

Si

O

O

Si

O

O

192

10g ¥19,400

1.02

1.495

1.19

1.518750g ¥67,100

m-AMINOPHENYLTRIMETHOXYSILANE, 95%
C9H15NO3Si
213.31
Contains other isomers
Coupling agent for polyimides used in electronics
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[70411-42-6]
TSCA-L
HMIS: 3-1-1-X

110-4° / 0.6
Flashpoint: 180°C (356°F)
5g ¥32,600

SIA0599.1

NH2

Si

125-135° / 0.5

SIA0599.0

O

H2N

O

25g ¥153,900

SIA0598.0

O

p-AMINOPHENYLTRIMETHOXYSILANE, 95%
C9H15NO3Si
213.31
110-4° / 0.6(60-62°)
Contains other isomers
Flashpoint: 180°C (356°F)
Coupler for silica-poly(phenyleneterephthalamide) composite films.1
Together with phenyltrimethoxysilane, SIP6822.0, can be used to increase the dispersibility of mesoporous silica.2
1. Mark, J. et al. J. Mater. Chem. 1997, 7, 259.
2. Banet, P. et al. Langmuir 2008, 24, 9030.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33976-43-1]
EC 251-772-2 HMIS: 3-1-1-X
5g ¥42,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.984

1.45080.87225

1.4489SIA0599.4
H2N

O

H
N

O

O

Si
O

3-4

H2N

SIA0602.0OSi

N-3-[(AMINO(POLYPROPYLENOXY)]AMINOPROPYLTRIMETHOXYSILANE, 60 - 65%
337 - 435
3-4 propylenoxy units
Contains amine-terminated polypropylene oxide
Coupling agent with film-forming capability
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X
25g ¥26,300
3-AMINOPROPYLDIISOPROPYLETHOXYSILANE
C11H27NOSi

217.4378-80° / 0.4

Forms hydrolytically stable amino-functional bonded phases and monolayers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[117559-36-1]
HMIS: 3-2-0-X

5g ¥19,400

25g ¥67,100

SIA0603.0

O
O
F

H2N

3-AMINOPROPYLDIMETHYLETHOXYSILANE
C7H19NOSi
161.32
ΔHform: 618 kJ/mole
Coupling agent for DNA array technology
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18306-79-1]
TSCA
HMIS: 3-2-1-X

OSi

78-9° / 24
Flashpoint: 73°C (163°F)
5g ¥16,200

0.85725

1.427625

25g ¥54,400

SIA0603.4

3-AMINOPROPYLDIMETHYLFLUOROSILANE, 95%

0.905

COMPOUNDS

135.26141-5°
Contains isomers
Forms monolayers on oxide surfaces
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[153487-58-2]
HMIS: 3-4-1-X
10g ¥40,000

Si

SIA0604.0

N-(3-AMINOPROPYLDIMETHYLSILYL)AZA-2,2-DIMETHYL-2-SILACYCLOPENTANE

Si

N

3-[(2,2-DIMETHYL-1-AZA-2-SILACYCLOPENT-1-YL)DIMETHYLSILYL]-1-PROPANAMINE
NH2 C H N Si
230.50
10

Si

26

2

1.4705

2

Employed in vapor phase derivatization of porous silica.1
1. Brandhuber, D. et al. J. Mater. Chem. 2005, 15, 3896.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[388606-32-4]
HMIS: 3-1-1-X
10g ¥31,600

SIA0604.5

Si
O

Si

H2N

O
Si

3-AMINOPROPYLMETHYLBIS(TRIMETHYLSILOXY)SILANE
C10H29NO2Si3

279.6175-8° / 0.75

0.856

1.415285-8° / 8
0.916
Flashpoint: 85°C (185°F)
TOXICITY: oral rat, LD50: 4,760 mg/kg

1.4272

HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[42292-18-2]
HMIS: 2-2-0-X store <5°C

10g ¥9,800

50g ¥28,900

SIA0605.0

H2N

Coupling agent for foundry resins, including phenolic novolaks and resols
Vapor phase deposition >150˚ on silica yields high density amine functionality.1
1. Ek, S. et al. Langmuir 2003, 19, 3461.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3179-76-8]
TSCA EC 221-660-8 HMIS: 3-2-1-X

PR

Si

O

191.3425g ¥3,400

2kg ¥54,300

COMMERCIALO

3-AMINOPROPYLMETHYLDIETHOXYSILANE, 95%
C8H21NO2Si

SILICON

H2N

F C5H14FNSi

15kg ¥264,000

SIA0607.0

H2N

3-AMINOPROPYLPENTAMETHYLDISILOXANE

Si

O

Si

3-(PENTAMETHYLSILOXANYL)PROPANAMINE

C8H23NOSi2

205.45HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[23029-21-2]
HMIS: 2-2-0-X

67-70° / 6

0.843

1.41355g ¥28,400

SIA0608.0

O

Si

OH

OH

3-AMINOPROPYLSILANETRIOL, 22-25% in water
C3H11NO3Si
137.21
pH: 10.0-10.5
Mainly oligomers; monomeric at concentrations <5%
Water-borne, VOC-free coupling agent
Internal hydrogen bonding stabilizes solution
See also WSA-7011 for greater hydrolytic stability
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[58160-99-9] / [29159-37-3]
TSCA EC 261-145-5 HMIS: 2-0-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

Flashpoint: >110°C (>230°F)

25g ¥6,100(215) 547-1015

1.06

2kg ¥40,500

www.gelest.com

COMMERCIAL

H2
N H

18kg ¥193,000

193

Name

Mw

bp °C/mm(mp °C)

D420

nD20

C9H23NO3Si
221.37122-3° / 30
0.951
Viscosity: 1.6 cSt
Flashpoint: 104°C (219°F)
ΔHvap: 49.4 kJ/mole
TOXICITY: oral rat, LD50: 1,780 mg/kg
Treated surface contact angle, water: 59°
Vapor pressure, 100˚: 10 mm
γc of treated surfaces: 37.5 mN/m
Primary irritation index: 6.50
Specific wetting surface: 353 m2/g
Widely used coupling agent for phenolic, epoxy, polyamide and polycarbonate resins
Effects imobilization of enzymes.1
Used to bind Cu(salicylaldimine) to silica.2

1.4225

サイラエース S330
3-AMINOPROPYLTRIETHOXYSILANE

SIA0610.0

GAPS, AMEO, A-1100

O
H2N

O

Si
O

Cu

COMMERCIAL

N

O
O
F

N

Si

Aminosilanes are widely used ascoupling agents for fiberglass
insulation and composites

O

O

O

Si

O

O

O

1. Enzymes 1976, 84, 55915.
2. Murphy, E. F. et al. Inorg. Chem. 2003, 42, 2559.
See also SIA0608.0 for pre-hydrolyzed version; SID4068.0 for blocked amine version
サイラエース S330
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2061[919-30-2]
TSCA EC 213-048-4 HMIS: 3-1-1-X
25g inquire

100g ¥4,900
2kg inquire

1kg ¥9,300
16kg inquire

SIA0610.1

O
H2N

O

Si

3-AMINOPROPYLTRIETHOXYSILANE 99+%
C9H23NO3Si

221.37

Low fluorescence grade for high throughput screening
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2061[919-30-2]
TSCA EC 213-048-4 HMIS: 3-1-1-X

O

122-3° / 30
Flashpoint: 104°C (219°F)

0.951

1.422525g ¥27,800** in fluoropolymer bottle

SIA0611.0

3-AMINOPROPYLTRIMETHOXYSILANE
C6H17NO3Si
Vapor pressure, 67˚: 5 mm

80° / 81.027
1.4240Flashpoint: 83°C (181°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 300˚C
Coupling agent with superior reactivity in vapor phase and non-aqueous surface treatments
Hydrolysis rate vs SIA0610.0: 6:1
Used to immobilize Cu and Zn Schiff base precatalysts for formation of cyclic carbonates.1
1. Tasci, Z.; Ulusoy, M. J. Organomet. Chem. 2012, 713, 104.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2061[13822-56-5]
TSCA EC 237-511-5 HMIS: 3-2-1-X
25g ¥4,500
2kg ¥50,000
18kg ¥267,000

O

Si
O

PR

SIA0612.0

H2N

3-AMINOPROPYLTRIMETHYLSILANE
C6H17NSi
131.30pKa: 10.75
See also SIA0604.5, SIA0620.0
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[18187-14-9]
HMIS: 3-3-0-XSi

58° / 30

0.783125

1.466125

1.066

1.448

152° / 47
0.89125
Flashpoint: >110°C (>230°F)
See also SIA0604.5, 3-AMINOPROPYLMETHYLBIS(TRIMETHYLSILOXY)SILANEHYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[25357-81-7]
TSCA
HMIS: 2-1-0-X
10g ¥15,100
50g ¥50,100

1.4110255g ¥52,800

SIA0614.0

O

O

O

3

Coupling agent for melt compounding of polyamides and epoxides
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[87994-64-7]
EC 289-365-7 HMIS: 3-2-1-X

H2N

Si

O

Si

O

Si

Flashpoint: 68°C (154°F)
25g ¥16,200

SIA0620.0

O

H2N

3-AMINOPROPYLTRIS(METHOXYETHOXYETHOXY)SILANE, 95%
443.61

Si C18H41NO9Si

3-AMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 95%
C12H35NO3Si

Si

353.76AMINOTRIPHENYLSILANE - see SIT8628.0 TRIPHENYLAMINOSILANE

194

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALO
H2N

179.29

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.89525

1.435225

SIA0630.0

O
H2N

11

F
NH4+

O

F

128-32° / 1
1.0g ¥38,500

SIA0705.0

F
Si--

F

11-AMINOUNDECYLTRIETHOXYSILANE
C17H39NO3Si
333.59Contains ~ 5% isomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[116821-45-5]
HMIS: 2-2-1-X

O

Si

AMMONIUM HEXAFLUOROSILICATE+ H8F6N2Si

F NH4

F

劇物

178.14

Fluoride ion source
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions(既) 1-313[16919-19-0]
TSCA EC 240-968-3 HMIS: 3-0-0-X

2.011

250g ¥7,700

2.5kg ¥23,300

H
N

O
O
F

AMYLTRICHLOROSILANE - see SIP6720.0 PENTYLTRICHLOROSILANEAMYLTRIETHOXYSILANE - see SIP6720.2 PENTYLTRIETHOXYSILANEANHYDRIDE FUNCTIONAL SILANE - see SIT8192.6 3-(TRIETHOXYSILYL)PROPYLSUCCINIC ANHYDRIDE

SIA0710.0

ANILINOTRIMETHYLSILANESi

N-TRIMETHYLSILYLANILINE

C9H15NSi
165.31
Dipole moment: 1.37 debye
Dielectric constant: 1000Hz: 3.90
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3768-55-6]
TSCA EC 223-197-7 HMIS: 3-2-1-X

98-9° / 19

0.940

1.52202.35

1.53-1.57

Al2O3MgOSiO2·H2O
411.35(>900° dec.) 2.61-2.62
Particle Size: <35 μm
Mohs Hardness: 2.0-2.5
3
Typical bulk density, not compacted: 0.21 g/cm
Monoclinic prismatic
Surface area: 50 m2/g
Open channel structure, elongate crystal
Exhibits sorptive properties, used as desiccant, pharmaceuticals adjuvant
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12174-11-7]
TSCA-E
HMIS: 1-0-0-X
500g ¥8,500
8kg ¥49,000

1.57

25g ¥19,400

SIA0740.0

Ca4KO20Si8(F,OH)∙8H2O

Mohs Hardness: 4.5-5.0
A tectosilicate (framework of linked SiO4 tetrahedron with all oxygen atoms shared)
Starting point for alkoxyfunctional sheet polymers.1
1. Yeh, L. et al. Polym. Prepr. 1991, 32(3), 508.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[58572-15-9]
TSCA-E
HMIS: 1-0-0-X
250g ¥27,800

SIA0760.0

ATTAPULGITEPALYGORSKITE, FULLER’S EARTH

Crystal structure image
courtesy of webmineral.com

SIA0770.0(AZIDOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-90
C12H19N3O3Si
281.39CAUTION: CAN FORM EXPLOSIVE COMPOUNDS IN CONTACT WITH COPPER AND SILVER COMPOUNDS
Mixed isomers
Reagent for “click” chemistry
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1245946-78-4]
HMIS: 4-2-1-X
5g ¥27,300

PR
O

Si

-

N

N

+

O

O

N

1.11

1.49725

1.14

1.49725

SILICONFLUORAPOPHYLLITECOMPOUNDSAPOPHYLLITE, pieces

SIA0774.0

O

Si

-

N

N
+

N

O

O

p-AZIDOMETHYLPHENYLTRIMETHOXYSILANE, 90%
C10H15N3O3Si
AVOID CONTACT WITH METALS

253.33

See also SIA0770.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83315-74-6]
HMIS: 4-2-1-X

2.5g ¥38,500

SIA0775.0(AZIDOMETHYL)TRIMETHYLSILANE, 95%
TRIMETHYLSILYLMETHYL AZIDE-NN+

C4H11N3Si
AVOID CONTACT WITH METALS

N

Si

129.2450° / 60

0.87

Flashpoint: 6°C (43°F)
Review of synthetic utility.1
Intermediate for trimethylsilyltriazoles.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 657.
2. Tsuge, O. et al. Chem. Lett. 1983, 1131.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[87576-94-1]
HMIS: 3-3-1-X
2.5g ¥51,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

195

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.147

1.4634

SIA0777.0
O

N

Si

N

O

O

-N

N+

N

S

-N

O

1-TRIETHOXYSILYL-6-SULFONAZIDE-n-HEXANE

C12H27N3O5SSi
353.51AVOID CONTACT WITH METALS
Amber-brown liquid
Inserts nitrenes into aliphatics and aromatics at temperatures >110°C
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[96550-26-4]
HMIS: 3-1-1-X

O

6

N+

6-AZIDOSULFONYLHEXYLTRIETHOXYSILANE, tech-95

O

Si

O

N
S

Used with click chemistry to introduce and immobilize discrete complexes onto the SBA-15 surface.1
Used in the preparation of poly-L-lysine to silica nanoparticles.2
1. Nakazawa, J. et al. J. Am. Chem. Soc. 2012, 134, 2750.
2. Kar, M. et al. Langmuir, 2010, 26, 5772.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83315-69-9]
HMIS: 4-1-1-X
1.0 g ¥35,300

SIA0780.0

OO

247.37

Flashpoint: 114°C (237°F)

O
O
F

N

3-AZIDOPROPYLTRIETHOXYSILANE
C9H21N3O3Si
AVOID CONTACT WITH METALS

25g ¥43,800

SIA0790.0

O

4-(AZIDOSULFONYL)PHENETHYLTRIMETHOXYSILANE, 22-25% in methanol/toluene
4-[2-(TRIMETHOXYSILYL)ETHYL]-1-BENZENESULFONYL AZIDEOSiC11H17N3O5SSi
331.42AVOID CONTACT WITH METALSContains hydrolysis oligomers
Extremely reactive coupling agent
Inserts nitrenes into aliphatics and aromatics at temperatures >110°C
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68479-60-7]
TSCA EC 270-862-2 HMIS: 3-4-1-X

O

O

0.90

1.55

Flashpoint: 29°C (4°F)

25g ¥41,100

AZIDOTRIMETHYLSILANE - see SIT8580.0 TRIMETHYLSILYLAZIDE

O
–N

N+

N

Si

O

11

Si
Si
O

11-AZIDOUNDECYLTRIMETHOXYSILANE, 95%
C14H31N3O3Si
AVOID CONTACT WITH METALSOOBENZOYLOXYPROPYLTRIMETHOXYSILANE
C13H20O5Si

O

O

O

Cl

145° / 0.2

1.104

1.480625g ¥24,100N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-90
C15H28N2O3Si
312.481.035
Contains aminoethylaminopropyltrimethoxysilane
Flashpoint: 69°C (156°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[209866-89-7]
TSCA
HMIS: 3-2-1-X
25g ¥11,900
100g ¥31,000

1.4902

SIB0957.0

OSi

284.38SIB0956.0

O

Si

N
H

1.03455g ¥52,200

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76241-02-6]
TSCA
HMIS: 3-2-1-X

PR

O

H

135-40° / 0.25

SIB0959.0

O
Si

N
H

2.5g ¥35,300

Blocking agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[309963-45-9]
HMIS: 3-2-1-X store <5°C

O

H
N

111° / 0.05

Forms “click” functionalized surfaces
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[334521-23-2]
HMIS: 3-1-1-X

BENZHYDRYLOXYBIS(TRIMETHYLSILOXY)CHLOROSILANE, 95%
C19H29ClO3Si3
425.15SiO

H
N

317.50

SIB0950.0

O

Cl

SIA0795.0

OO

N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE hydrochloride, 50% in methanol
C15H28N2O3Si∙HCl
348.950.942
Amber liquidFlashpoint: 9°C (48°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[623938-90-9]
TSCA
HMIS: 3-3-1-X
25g ¥8,800
100g ¥20,700

1.4104

SIB0960.0

N-BENZYLAMINOMETHYLTRIMETHYLSILANE
C11H19NSi

193.36

Intermediate for cyanoaminosilanes.
Used in the preparation of trifluoromethylated azomethine ylide.2
1

N
H

Si

90° / 5Flashpoint: 116°C (241°F)

1. Padwa, A. et al. J. Org. Chem. 1985, 50, 4006.
2. Tran, G. et al. J. Org. Chem. 2012, 77, 11071.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[53215-95-5]
HMIS: 3-2-0-X

196

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

5g ¥16,400(215) 547-1015

0.88

25g ¥55,400

www.gelest.com

1.4960Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.949

1.50400.949

1.5040

SIB0962.0

BENZYLDIMETHYLCHLOROSILANE
C9H13ClSi

Si

Cl

184.7475-6° / 15
Flashpoint: 73°C (163°F)
Useful for the preparation of benzyldimethylsilyl derivatives capable of cross-coupling reactions.1,2
1. Zhao, Z.; Snieckus, V. Org. Lett. 2005, 7, 2523.
2. Trost, B. M.; Machacek, M. R.; Ball, Z. T. Org. Lett. 2003, 5, 1895.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1833-31-4]
TSCA
HMIS: 3-2-1-X
10g ¥21,500

50g ¥75,600

SIB0964.0

BENZYLDIMETHYLSILANE
C9H14SiSi

70° / 15
Flashpoint: 65°C (149°F)

Intermediate for aminosubstituted vinylsilanes and pyrollidones.1
Useful for the preparation of benzyldimethylsilyl derivatives capable of cross-coupling reactions.2
1. Mlyra, K. et al. Org. Lett. 2000, 2, 385.
2. Singh, R.; Singh, G. C.; Ghosh, S.K. Eur. J. Org. Chem. 2007, 5376.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1631-70-5]
TSCA
HMIS: 2-2-1-X
10g ¥21,500

O
O
F

H

150.30

SIB0966.0

NO

N-BENZYL-N-METHOXYMETHYL-N-(TRIMETHYLSILYLMETHYL)AMINE, 96%
C13H23NOSi
237.4176° / 0.3
Flashpoint: 66°C (151°F)
Forms chiral pyrrolidines by asymmetric 1,3-dipolar addition.1
1. Kotain, L. et al. Org. Process Res. Dev. 2005, 9, 193.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[93102-05-7]
HMIS: 2-2-0-X
5g ¥28,900

0.928

1.492

180.320.916

1.4770225.58140-2° / 10
1.288Flashpoint: 87°C (189°F)
TOXICITY: oral rat, LD50: 2,830 mg/kg

1.527

COMPOUNDS

SIB0968.0

BENZYLOXYTRIMETHYLSILANEBENZYL TRIMETHYLSILYL ETHER

C10H16OSi

92° / 19
Flashpoint: 73°C (163°F)
In combination with TMS triflate cleaves β-lactams to chiral β-amidocyanides.1
With fluoride effects ring-opening polymerization of caprolactone.2
1. Kita, Y. et al. J. Org. Chem. 1994, 59, 938.
2. Endo, T. et al. Jap. Pat. App. 04283591, 1991; Chem. Abstr. 118,1030208.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14642-79-6]
HMIS: 2-2-1-X
25g ¥17,800

Si

O

Cl

Si
Cl

O

BENZYLTRICHLOROSILANE
C7H7Cl3Si
Dipole moment: 1.78 debye

See also SIC2470.0, SID4555.5, SIP6722.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[770-10-5]
TSCA EC 212-219-0 HMIS: 3-2-1-X
25g ¥21,500

O100g ¥62,100

SIB0971.0

BENZYLTRIETHOXYSILANE
C13H22O3Si

254.40

PR

Si

Cl

SIB0970.0

O

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2549-99-7]
TSCA EC 219-841-1 HMIS: 2-1-0-X

148° / 26
Flashpoint: 127°C (261°F)
10g ¥14,600

0.986

1.462825

0.8933

1.4941

2.66

1.56-1.57

0.92625

1.460425

SILICONSi

50g ¥54,400

SIB0973.0

Si

BENZYLTRIMETHYLSILANE
C10H16Si

164.32

190-1°
Flashpoint: 62°C (144°F)

Source of benzyl anions.1
1. Benneteau, B. et al. Bull. Chem. Soc. Fr. 1985, 90, 11.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[770-09-2]
TSCA EC 212-218-5 HMIS: 2-2-0-X

10g ¥13,300

SIB0980.0
BERYL

BERYLLIUM ALUMINUM SILICATEAl2Be3O18Si6-80 mesh powder

Crystal structure image
courtesy of webmineral.com

537.49(1,410°)TOXICITY: carcinogenic by inhalation
Mohs Hardness: 7.5-8High thermal conductivity filler
A cyclosilicate (framework derived from rings of linked SiO4 tetrahedra w/Si:O ratio 1:3)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1302-52-9]
TSCA-E EC 215-101-7 HMIS: 4-0-0-X
500g ¥31,100

SIB0981.0
SiO(5-BICYCLO[2.2.1]HEPT-2-ENYL)DIMETHYLETHOXYSILANE
C11H20OSi

196.36

Undergoes ROMP reactions
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[899823-76-8]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

67° / 3.525g ¥28,900(215) 547-1015

www.gelest.com

197

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.991

1.4800

SIB0982.0[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]DIMETHYLCHLOROSILANE, tech-95, endo/exo isomers
Cl C H ClSi
214.81
231-2°
11 19
Flashpoint: 104°C (219°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[120543-78-4]
HMIS: 3-1-1-X
25g ¥30,500

Si

SIB0984.0

Cl[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]METHYLDICHLOROSILANE, tech-95, endo/exo isomers
C10H16Cl2Si
235.2385-7° / 1

Si
Cl

SIB0986.0[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRICHLOROSILANE, tech-95, endo/exo isomers
255.6491-3° / 1
Cl C9H13Cl3Si
Si
Flashpoint: >110°C (>230°F)
See also SIC2464.0
Cl
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[54076-73-2]
HMIS: 3-1-1-X
25g ¥39,500

1.5010

SIB0988.0

O
Si

1.223

O
O
F

Cl

1.09

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[198570-38-6]
HMIS: 3-1-1-X
25g ¥30,000

O[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRIMETHOXYSILANE, tech-95, endo/exo isomers
C12H22O3Si
242.3965° / 10OHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68323-30-8]
HMIS: 2-1-1-X

1.02

1.458

1.151

1.49380.959

1.452525

1.2973

1.498825g ¥38,500

SIB0990.0Cl(5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDICHLOROSILANE, 95%
C8H12Cl2Si
207.1774-5° / 10
Flashpoint: 86°C (187°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18245-94-8]
TSCA EC 242-122-9 HMIS: 3-2-1-X
10g ¥20,700

Si
Cl

SIB0990.3(5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDIETHOXYSILANE
C12H22O2Si

O

226.39Comonomer for ROMP reactive resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[113276-73-6]
HMIS: 2-2-1-X

SiO

65-7° / 125g ¥21,000

SIB0991.0

Cl

Cl

Si
Cl

(5-BICYCLO[2.2.1]HEPT-2-ENYL)TRICHLOROSILANE
C7H9Cl3Si

227.5975-6° / 10
Flashpoint: 87°C (189°F)

See also SIC2464.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[14319-64-3]
TSCA
HMIS: 3-2-1-X
10g ¥19,400

50g ¥67,100

PR

SIB0992.0(5-BICYCLO[2.2.1]HEPT-2-ENYL)TRIETHOXYSILANENORBORNENYLTRIETHOXYSILANE

C13H24O3Si

O

O

Si

O

256.42106-8° / 8
Flashpoint: 98°C (208°F)

Coupling agent for norbornadiene rubbers
Component in low dielectric constant films
Undergoes ring-opening metathetic polymerization (ROMP) with RuCl2(P(C6H5)3)3.1
1. Finkelstein, E. 10th Int’l Organosilicon Symp. Proc. 1993, P-120.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18401-43-9]
TSCA EC 242-278-8 HMIS: 2-2-1-X
10g ¥12,500

0.960

1.448650g ¥39,500

SIB0994.0Si

52-5° / 1
Flashpoint: 87°C (189°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[117046-42-1]
HMIS: 3-2-1-X
25g ¥28,400
917188.77

0.99

SIB0997.0

Cl(5-BICYCLO[2.2.1]HEPTYL)TRICHLOROSILANECl C7H11Cl3Si

Si

Cl

198

Cl (5-BICYCLO[2.2.1]HEPTYL)DIMETHYLCHLOROSILANEC H ClSi

229.6163-4° / 4.5
Flashpoint: 83°C (181°F)

1.2678See also SIA0325.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18245-29-9]
TSCA EC 242-121-3 HMIS: 3-2-1-X
10g ¥14,600

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4919

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

246.81125° / 0.4(69-71°)

D420

nD20

1.05

1.5278SIB0999.0

4-BIPHENYLYLDIMETHYLCHLOROSILANE
C14H15ClSi

Si

Cl High refractive index blocking agent

See also SIP6723.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[41081-31-6]
HMIS: 3-1-1-X

2.5g ¥40,600

SIB0999.5

4-BIPHENYLYLTRIETHOXYSILANE
C18H24O3Si

OSi

316.47152° / 0.25

Forms high refractive index resins
See also SIN6596.8, SIP6723.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18056-97-8]
HMIS: 2-2-1-X

OO

5g ¥36,300

OOF

SIB1000.0O

1,3-BIS[(ACRYLOXYMETHYL)PHENETHYL]TETRAMETHYLDISILOXANE, tech-95
C28H38O5Si2
510.78Mixed isomers; inhibited with MEHQ
Flashpoint: 110°C (230°F)
O
Crosslinker for UV cure systems
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
2[140220-31-1]
HMIS: 3-1-0-X store <5°C
5g ¥20,400

SiO

1.52723

SIB1020.0OSi

140-4° / 25

0.892

1.4367COMPOUNDS

O

2,2-BIS(ALLYLOXYMETHYL)-1-TRIMETHYLSILOXYBUTANE, 95%
C15H30O3Si
286.48
Contains monoallyloxybis(trimethylsiloxy)silane analog
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[211923-87-4]
HMIS: 2-2-1-X

25g ¥16,200

SIB1021.5

NH2

Si

NH

2

O

1,3-BIS(2-AMINOETHYLAMINOMETHYL)TETRAMETHYLDISILOXANE, tech-95
C10H30N4OSi2
278.55Curing agent for epoxies
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid(既) 7-455[83936-41-8]
HMIS: 3-2-0-X

140-5° / 2

0.941

25g ¥55,400

SIB1022.0

O
H2N

Si

BIS(p-AMINOPHENOXY)DIMETHYLSILANE
C14H18N2O2Si

O

NH2274.39Intermediate for polyimides
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1223-16-1]
HMIS: 3-1-0-X

195-9° / 0.5(60-64°)Flashpoint: >110°C (>230°F)
5g ¥16,200

25g ¥54,400

SIB1024.0

Si

PR

O

0.8972550g ¥39,500

1.448025

COMMERCIAL

Si

H2N

1,3-BIS(3-AMINOPROPYL)TETRAMETHYLDISILOXANE
C10H28N2OSi2
248.52132-9° / 11
Contains isomers
Flashpoint: 91°C (196°F)
pKb: 5.5
NH2
Endcapper for aminopropyl terminated silicones
Plasticizing hardener for epoxies
Monomer for polyimides, polyamides
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 7-453[2469-55-8]
TSCA EC 219-588-7 HMIS: 3-2-0-X
10g ¥12,500

SILICONO

2kg ¥264,000

SIB1026.2

SiO

1,3-BIS[(BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TETRAMETHYLDISILOXANE
C22H38OSi2
374.72
145-150° / 5
Mixed endo/exo isomers
Flashpoint: >110°C (>230°F)
Oxygen etch resistant monomer for photoresists
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[198570-39-7]
HMIS: 2-1-0-X
10g ¥36,900

Si

0.944

1.4830

SIB1026.4

Si

HN

1,3-BIS(4-BIPHENYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
C28H31NSi2
437.73
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[916667-75-9]
HMIS: 2-1-1-X

Si

220-5° / 1(74-76°)10g ¥44,300

SIB1026.8

Si

O

O

Si

1,2-BIS(t-BUTYLDIMETHYLSILOXY)ETHANE
C14H34O2Si2

290.95HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[66548-22-9]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

121-3° / 10

(45-6°)

25g ¥22,500(215) 547-1015

www.gelest.com

199

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIB1027.0
O

O

HO

OH

Si

O

Si

1,3-BIS(3-CARBOXYPROPYL)TETRAMETHYLDISILOXANE
C12H26O5Si2

306.51(46-9°)Monomer for silicone modified polyamides and carbohydrates
Forms metal chelating polymers by reaction with azomethine complexes.1
1. Marcu, M. et al. J. Appl. Organometallic Chem. 2003, 17, 693.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[3353-68-2]
TSCA
HMIS: 2-1-0-X

10g ¥20,400

50g ¥71,300

SIB1030.0

Si

BIS[2-(CHLORODIMETHYLSILYL)ETHYL]BENZENE
C14H24Cl2Si2
319.42
116-7° / 0.2
Mixed isomers
Flashpoint: 187°C (369°F)
Intermediate for silahydrocarbon polymers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[74129-20-7]
TSCA
HMIS: 3-1-1-X
50g ¥54,400

Si

Cl

Cl

1.02

O
O
F

SIB1042.0

1,2-BIS(CHLORODIMETHYLSILYL)ETHANETETRAMETHYLDICHLORODISILETHYLENE

Si

Si

Cl

Cl

C6H16Cl2Si2

215.27

198-9°(36-9°)
Flashpoint: 40°C (104°F)

Review of synthetic utility.1
Reagent for protection of primary amines, including amino acids.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 48-50.
2. Djuric, S. et al. Tetrahedron Lett. 1981, 22, 1787.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13528-93-3]
TSCA EC 236-871-0 HMIS: 3-2-1-X
25g ¥9,300
100g ¥22,500

SIB1046.0

1,6-BIS(CHLORODIMETHYLSILYL)HEXANE, 95%

Si

Cl C H Cl Si

Si

10

24

2

2

271.38113-6° / 3
Flashpoint: 150°C (302°F)

0.961

1.4538

106-7° / 0.4
Flashpoint: 180°C (356°F)

0.946

1.45401.02441.4647

See also SIB1048.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[14799-66-7]
HMIS: 3-1-1-X
25g ¥19,900

6

Cl

Cl

SIB1048.0

Cl C H Cl Si

1,8-BIS(CHLORODIMETHYLSILYL)OCTANE, 95%

Si

Si

12

28

2

2

299.43

Intermediate for silahydrocarbon polymers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5089-28-1]
EC 225-804-0 HMIS: 3-1-1-X
25g ¥14,600

8100g ¥39,500

SIB1048.2

Si

Cl

Si

1,3-BIS(CHLORODIMETHYLSILYL)PROPANE
C7H18Cl2Si2

229.3094° / 19

Forms cyclic derivatives of polyalkyleneoxides suitable for anionic copolymerization.1
Cl 1. Zundel, T. et al. Macromol. 1998, 31, 2724.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2295-06-9]
HMIS: 3-2-1-X
5g ¥31,000

PR

SIB1048.3

Cl

Si

O

2

BIS[(3-CHLORODIMETHYLSILYL)PROPYL] ETHER
C10H24Cl2OSi2

287.37

Ether bridged dipodal silane; intermediate for hybrid silicones
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

107-9° / 0.5
Flashpoint: >110°C (>230°F)

1.4522255g ¥41,100

SIB1048.8

Cl

Si

O

Si

Cl

1,3-BIS(3-CHLOROISOBUTYL)TETRAMETHYLDISILOXANE
C12H28Cl2OSi2

315.43130-5° / 5

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18388-70-0]
HMIS: 3-1-0-X

25g ¥11,900

0.989

1.452825

1.075

1.456725

1.08

1.470825

100g ¥31,000

SIB1051.0

Si

Cl

Cl

Cl

200

BIS(CHLOROMETHYL)DIMETHYLSILANE
C4H10Cl2Si
157.11
163-4°
Dipole moment: 2.21 debye
Flashpoint: 46°C (115°F)
Cl HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2917-46-6]
TSCA EC 220-848-7 HMIS: 2-2-0-X
10g ¥14,100

50g ¥45,900

SIB1053.0

Si

BIS(CHLOROMETHYL)METHYLCHLOROSILANE, 95%
C3H7Cl3Si
177.53
172-3°
Dipole moment: 2.21 debye
Flashpoint: 42°C (108°F)
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18171-56-7]
TSCA EC 242-057-6 HMIS: 3-2-1-X
25g ¥41,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Si

Si

O

O

Cl
Si

3,5-BIS(CHLOROMETHYL)OCTAMETHYLTETRASILOXANE, 95%
C10H28Cl2O3Si4
379.58128° / 10
Viscosity: 3.6 cSt.
Functionalizeable building block
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17988-79-3]
HMIS: 2-2-0-X
25g ¥25,200

Si

O

O

D420

nD20

(-77°)

1.00625

1.42100.9944

1.4169

1,3-BIS(CHLOROMETHYL)-1,1,3,3-TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
C14H40Cl2O5Si6
527.90122-4° / 1

O
Si

O

O
Si

(mp °C)SIB1054.0

Si

Si

O

Si

bp °C/mm

SIB1053.5

Cl

Cl

Mw

Si

Functionalizeable building block
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17909-34-1]
HMIS: 2-1-0-X

Cl

25g ¥59,700

SIB1055.0

SiO

1.4400

O
O
F

Si
Cl

1,3-BIS(CHLOROMETHYL)TETRAMETHYLDISILOXANE
C6H16Cl2OSi2
231.27204-5°(-90°)
1.050
Viscosity, 0°: 3.5 cSt
Flashpoint: 73°C (163°F)
Viscosity, 25°: 2.0 cSt
ΔHvap: 38.5 kJ/mole
Cl End-capper for silicones allowing transition to organic blocks
Intermediate for siloxane-modified polyimides
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 7-500[2362-10-9]
TSCA EC 219-109-1 HMIS: 2-2-0-X
25g ¥11,900
100g ¥31,000

SIB1055.3

ClClIntermediate for difunctional monomers and coupling agents
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33317-65-6]
TSCA EC 251-455-9 HMIS: 3-2-1-X

82° / 0.3
Flashpoint: 145°C (293°F)

1.272

1.4902

1.03

1.427

0.99625

1.448425

173-7° / 1
Flashpoint: 95°C (203°F)

1.16625

1.4799161-2° / 2
Flashpoint: 105°C (221°F)

0.934

1.444110g ¥67,100

SIB1055.8

Si

O

Si

Cl

254.06COMPOUNDSSi

BIS(3-CHLOROPROPYL)DICHLOROSILANE
C6H12Cl4Si

Cl

O
Si

1,3-BIS(3-CHLOROPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95
C18H48Cl2O5Si6
584.00HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[163124-51-4]
HMIS: 2-2-0-X

O

25g ¥25,700

2

SIB1056.0

Cl 1,3-BIS(3-CHLOROPROPYL)TETRAMETHYLDISILOXANE

Cl
Si

C10H24Cl2OSi2OSi

287.38128° / 7
Flashpoint: 92°C (198°F)

See also SIB1048.8, SIB1055.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 7-500[18132-72-4]
TSCA EC 242-018-3 HMIS: 2-2-0-X

25g ¥25,200

100g ¥74,000

SIB1057.0

BIS(CYANOPROPYL)DICHLOROSILANE

PR
Cl

N

Si

C8H12Cl2N2Si

Cl

N

劇物

235.19SILICONCl

Forms polymers used as polar phases in gas chromatography
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1071-17-6]
TSCA
HMIS: 3-1-1-X
10g ¥42,200

SIB1058.0

1,3-BIS(CYANOPROPYL)TETRAMETHYLDISILOXANE, 95%

N C12H24N2OSi2

N

Si

H

Cl

O

268.51Silylates capillary GC columns imparting polarity.1
1. Blum, W. J. High Resol. Chrom., Chromatog. Comm. 1986, 9, 120.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18027-80-0]
HMIS: 2-1-0-X

Si

10g ¥15,400

1,2-BIS(DICHLOROMETHYLSILYL)ETHANE - see SIB1614.0 1,2-BIS(METHYLDICHLOROSILYL)ETHANE

Cl Cl

Si

劇物

Si

H

Cl

SIB1064.0

BIS(DICHLOROSILYL)METHANE, tech-95
CH4Cl4Si2

214.03

146-7°HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18081-42-0]
HMIS: 3-3-1-X
5g ¥19,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.37

1.466

25g ¥67,100

www.gelest.com

201

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.826

1.435

SIB1068.0

BIS(DIETHYLAMINO)DIMETHYLSILANE
C10H26N2Si

N

N

Si

202.42

192-5°
Flashpoint: 35°C (95°F)

Silylates diamines to cyclic diaminosilanes.
1. Schwartz, E. et al. J. Org. Chem. 1981, 50, 5469.
See also SID4040.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4669-59-4]
TSCA EC 225-116-0 HMIS: 3-3-1-X
50g ¥39,500
1

SIB1069.0
N

N

Si
H

BIS(DIETHYLAMINO)SILANE
C8H22N2Si

174.1670° / 30

0.804

ALD precursor for HfSiOx dielectric films.1
1. Katamreddy, R. et al. J. Electrochem. Soc. 2008, 155, G163.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[27804-64-4]
HMIS: 4-2-1-X
10g ¥27,300

HN

BIS(DIMETHYLAMINO)DIETHYLSILANE
C8H22N2Si

N

Si

O
O
F

SIB1070.0

174.3662-3° / 15
Flashpoint: 30°C (86°F)

0.83724

1.4362

128-9°(-98°)
Flashpoint: -3°C (27°F)

0.810

1.416922

0.824

1.4460

Couples silanol terminated siloxanes
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[33287-52-4]
HMIS: 3-3-1-X
50g ¥51,700

SIB1072.0

N

BIS(DIMETHYLAMINO)DIMETHYLSILANE
C6H18N2Si

N

Si

146.31

Couples silanol terminated siloxanes
See also SIB1185.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3768-58-9]
TSCA EC 223-200-1 HMIS: 3-4-1-X
25g ¥11,900

100g ¥31,000

SIB1073.0

1,2-BIS(DIMETHYLAMINODIMETHYLSILYL)ETHANE, 96%
ETHYLENEBIS(TETRAMETHYLSILANAMINE)

C10H28N2Si2

232.52

101-3° / 13Flashpoint: 46°C (115°F)

Review of synthetic utility.
Protecting group for aromatic amines.2
Used to prepare a 2-thia-1,5-disilacyclopentane, which transfers sulfur.3
1

N

Si

Si

Me2Si
Me2N

N

Me2Si

SiMe2
NMe2

S

SiMe2

+ H2S

+ 2

ZnI2

130°, 1 h
75%
O

Ph

Me2Si

S

SiMe2

DMAC, CsF
120°
81%

F

S

Ph

Ph

O

O

PR

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 50-51.
2. Guggenheim, T. L. Tetrahedron Lett. 1984, 25, 1253; F&F: 12, 476.
3. Guggenheim, T. L. Tetrahedron Lett. 1987, 28, 6139.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[91166-50-6]
HMIS: 3-3-1-X
10g ¥17,800
50g ¥60,700

SIB1074.0

N

Si

BIS(DIMETHYLAMINO)DIPHENYLSILANE
C16H22N2Si

139-40° / 2
Flashpoint: 95°C (203°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1027-62-9]
TSCA EC 213-838-9 HMIS: 3-2-1-X
10g ¥16,200

N270.45

SIB1075.0

BIS(DIMETHYLAMINO)METHYLSILANE, 96%
C5H16N2Si

N

Si

N

H

132.28112-3°
Flashpoint: -3°C (27°F)
Autoignition temperature: 300˚C

0.798

Crosslinking agent for deep UV and EB resist applications.1
Component in self-sealing refrigerant systems.2
1. Irmscher, M. et al. J. Photopolym. Sci. Technol. 1996, 9, 497.
2. Packo, J. J.; Bailey, D. L. U.S. Patent 4,379,067, 1983.
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required(既) 2-3198[22705-33-5]
TSCA EC 245-163-0 HMIS: 4-4-2-X
25g ¥27,800
100g ¥82,500

BIS(DIMETHYLAMINO)PHENYLCHLOROSILANE - see SIP6724.6 PHENYLBIS(DIMETHYLAMINO)CHLOROSILANE
BIS(DIMETHYLAMINO)PHENYLMETHYLSILANE - see SIP6736.8 PHENYLMETHYLBIS(DIMETHYLAMINO)SILANE

202

1.414

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm

204.4690-3° / 20

(mp °C)

D420

nD20

0.83025

1.455325

0.820

1.4332

SIB1077.0

N

Si

Si

1,2-BIS(DIMETHYLAMINO)TETRAMETHYLDISILANE
C8H24N2Si2N

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[26798-99-2]
HMIS: 3-3-1-X
10g ¥34,700

SIB1080.0
N
N

BIS(DIMETHYLAMINO)VINYLMETHYLSILANE
C7H18N2Si

146-7°
Flashpoint: -4°C (25°F)
Chain extender for silicone fluids that introduces Pt and peroxide cure sites
Undergoes BuLi-catalyzed anionic polymerization.1
1. Stober, M. et al. J. Org. Chem. 1967, 32, 2740.
See also SIV9081.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13368-45-1]
TSCA EC 236-437-0 HMIS: 3-4-2-X
10g ¥17,800

Si

158.32OOF

SIB1082.0

4,4’-BIS(DIMETHYLETHOXYSILYL)BIPHENYL
C20H30O2Si2

O

Si

Si
O

358.63

Intermediate for thermally stable polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[201603-69-2]
HMIS: 2-2-0-X

168-9° / 0.1

0.980

1.5380

0.893

1.511

118° / 35
0.872
Flashpoint: 77°C (171°F)
TOXICITY: oral mouse, LD50: 1,535 mg/kg

1.50001.0g ¥22,500

SIB1084.0

1,2-BIS(DIMETHYLSILYL)BENZENE
C10H18Si2

Si
Si

H
Si

129° / 50
Flashpoint: 71°C (160°F)

Acetylenes undergo dehydrogenative double silylation to yield cyclics.1
Aldehydes undergo dehydrogenative double silylation to yield disila-2-oxacyclohexanes.2
Reacts with ω-hydroxycarboxylates with Rh to form lactones.3
Employed in the high-yield reduction of amides to amines in the presence of other reducible groups.4
1. Tanaka, M. et al. Bull. Soc. Chim. Fr. 1993, 129, 667.
2. Uchimaru, Y. et al. Organometallics 1992, 11, 2639.
3. Mukaiyama, T. et al. Chem. Lett. 1997, 2, 18.
4. Hanada, S. et al. J. Am. Chem. Soc. 2009, 131, 15032.
F&F: Vol. 20, p 40.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17985-72-7]
HMIS: 2-2-1-X
2.5g ¥41,100

H

1,4-BIS(DIMETHYLSILYL)BENZENE
C10H18Si2

194.42

Building block for silphenylene polymers
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2488-01-9]
TSCA EC 219-638-8 HMIS: 2-2-1-X

H

Si

H

Si

50g ¥60,700

1,2-BIS(DIMETHYLSILYL)ETHANE - see SIT7537.0 1,1,4,4-TETRAMETHYLDISILABUTANESIB1088.0

1,1’-BIS(DIMETHYLSILYL)FERROCENE
C14H22FeSi2PRFe

10g ¥17,800

SILICON

SIB1086.0

SiH

194.42COMPOUNDS

H

H

302.35HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1295-15-4]
HMIS: 3-2-1-X

294-5°
Flashpoint: 50°C (122°F)

1.007

1.56400.976

1.54781.07

1.57461.0g ¥31,000

SIB1090.0

SiSi

H BIS[(p-DIMETHYLSILYL)PHENYL]ETHER, 96%

C16H22OSi2286.52

Building block for silphenylene polymers
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[13315-17-8]
HMIS: 2-2-1-X

O

Si

BIS(2-DIPHENYLPHOSPHINOETHYL)METHYLSILYLETHYLTRIETHOXYSILANE, mixed isomers
C37H50O3P2Si2
660.92OOP25g ¥37,400

SIB1091.0

OSi

138-40° / 0.2

Analogous structures form ruthenium(II) complexes with high selectivity for hydrogenation and non-leachable binding to solid supports.1
1. Wu, D. et al. Chem. Mater. 2005, 17, 3951.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X
1.0g ¥60,700

P

SIB1092.0

O

O

Si

O

Si

1,3-BIS[2-(3,4-EPOXYCYCLOHEXYL)ETHYL]TETRAMETHYLDISILOXANE, 90%
C20H38O3Si2
382.69(-40°)
0.997
Viscosity: 40 cSt
Flashpoint: 200°C (392°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
UV-initiated polymerization with weak acid donors
1
Contributes to high diffraction efficiency in holographic media.
1. Cho, Y. et al. Sci. Tech. Adv. Mater. 2005, 6, 435.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18724-32-8]
TSCA-L
HMIS: 2-1-1-X
25g ¥13,500
100g ¥36,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.476

203

Name

Mw

bp °C/mm

220.4682° / 25

(mp °C)

D420

nD20

0.849

1.4160

SIB1094.0

BIS(ETHOXYDIMETHYLSILYL)METHANE
Si

O

4,4,6,6-TETRAMETHYL-3,7-DIOXA-4,6-DISILANONANE

Si

C9H24O2Si2O

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17887-25-1]
HMIS: 2-3-1-X

5g ¥22,500

SIB1097.0

BIS(2-ETHYLHEXYL)DICHLOROSILANE
C16H34Cl2Si
Si

132-8° / 1.5

0.949

Cl

O
O
F

Cl

325.40Intermediate for soluble polysilanes
Used to make silicon-bridged cyclopentadithiophene-based polymers that exhibit a high degree of luminescence quenching and low
band gap silole-containing polythiophenes.1,2
1. Huang, J.-H. et al. J. Phys. Chem. C. 2011, 115, 2398.
2. Hou, J. et al. J. Am. Chem. Soc. 2008, 130, 16144.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1089687-03-5]
HMIS: 3-1-1-X
10g ¥53,800

SIB1110.0

O

O

Si

1,5-BIS(GLYCIDOXYPROPYL)-3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE
C23H42O6Si3
498.84

O
Si

O

O

Si

Monomer for silicone modified epoxy resins
See also SIT8715.6
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[865811-59-2]
HMIS: 2-1-0-X

O

1.106

1.4763

0.996

1.452

25g ¥23,100

SIB1115.0

O

O

O
Si

O

Si

F

184-7° / 2(-48 to -50°)
Flashpoint: 110°C (230°F)

25g ¥8,800

100g ¥20,700

2kg ¥204,000

SIB1120.0

FF

1,3-BIS(GLYCIDOXYPROPYL)TETRAMETHYLDISILOXANE
C16H34O5Si2
362.61
Viscosity: 8-12 cSt
Monomer for silicone modified epoxy resins
End-capper for epoxy terminated silicones
See also SIB1110.0, SIT8715.6
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base(既) 7-1546[126-80-7]
TSCA EC 204-803-9 HMIS: 3-1-0-X

Si
F

F

O

2

7

1,3-BIS(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TETRAMETHYLDISILOXANE
C24H20F34OSi21026.5190° / 5
Employed in NIMS direct desorption MALDI analysis.1
1. Woo, H. et al. Nature Protocols 2008,3, 1341; doi:10.1038/nprot.2008.110.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[129498-18-6]
HMIS: 3-0-0-X(0 to -5°)

1.557

1.335

0.93

1.45260.90251.449250.92

1.409025

10g ¥53,800

SIB1130.0

1,3-BIS(4-HYDROXYBUTYL)TETRAMETHYLDISILOXANE, 95%

HOOH 5,5,7,7-TETRAMETHYL-6-OXA-5,7-DISILAUNDECAN-1,11-DIOL

C12H30O3Si2

278.54

O

Si

PR

Si

148-50° / 2
Flashpoint: 110°C (230°F)

End-capper for carbinol-terminated silicones used in contact lenses.
1. Deichert, W. et al. U.S. Patent 4,153,641, 1979; 4,189,546, 1980.
See also SIB1144.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5931-17-9]
HMIS: 2-1-0-X
110g ¥15,600

50g ¥52,200

SIB1135.0

HOSi

1,4-BIS(HYDROXYDIMETHYLSILYL)BENZENE, tech-95
C10H18O2Si2
226.42(135°)
Contains bis(hydroxydimethylsilylphenyl)tetramethyldisiloxane
OH
Intermediate for silphenylene polymers.1
1. Dvornic, P.; Lenz, R. High Temperature Siloxane Elastomers; Huthig & Wepf: Heidelberg, Germany, 1990.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2754-32-7]
TSCA EC 220-405-8 HMIS: 2-1-0-X
10g ¥21,500
50g ¥75,600

Si

SIB1138.0

HO

Si

O

1,3-BIS(3-(2-HYDROXYETHOXY)PROPYL)TETRAMETHYLDISILOXANE, 95%
C14H34O5Si2
338.59Viscosity: 41 cSt
Flashpoint: 186°C (366°F)
2 HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[441307-02-4]
HMIS: 2-2-1-X
25g ¥28,900

O

SIB1140.0

HO
HO

204

N

O

O

Si

O

N,N-BIS(2-HYDROXYETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 62% in ethanol
C13H31NO5Si
309.48
Contains 2-3% hydroxyethylaminopropyltriethoxysilane
Flashpoint: 24°C (75°F)
2
Specific wetting surface: 252 m /g
Urethane polymer coupling agent
Employed in surface modification for preparation of oligonucleotide arrays.1
1. McGall, G. et al. Proc. Natl. Acad. Sci. 1996, 93, 1355.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7538-44-5]
TSCA EC 231-408-9 HMIS: 3-4-0-X
25g ¥11,400

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TEL: 03-5543-1630

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(215) 547-1015

100g ¥29,400

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COMMERCIALOEnabling Your Technology
Name

OH

bp °C/mm(mp °C)

D420

nD20

SIB1142.0

HO

N,N’-BIS(2-HYDROXYETHYL)-N,N’-BIS(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINE, 66-68% in methanol
C18H44N2O8Si2
472.73
Flashpoint: 13°C (55°F)
Dipodal silane forming hydrophilic surfaces
See also SIH6171.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[214362-07-9]
HMIS: 3-4-1-X
25g ¥21,000

N

N

O
O

Mw

O

Si

Si

O

O

O

OH

HO

SIB1144.0

1,3-BIS(3-HYDROXYISOBUTYL)TETRAMETHYLDISILOXANE

1,3-BIS(3-HYDROXY-2-METHYLPROPYL)TETRAMETHYLDISILOXANE

C12H30O3Si2

O

Si

0.98

Si

278.54100-110° / 2
Flashpoint: >110°C (>230°F)

Endcapper for carbinol terminated polysiloxanes
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[29706-30-7]
HMIS: 2-1-0-X

50g ¥42,200

OOF

SIB1145.0

1,3-BIS(HYDROXYPROPYL)TETRAMETHYLDISILOXANE, 95%

3,3’-(1,1,3,3-TETRAMETHYL-1,3-DISILOXANEDIYL)BIS(1-PROPANOL)OH C10H26O3Si2

Si

O

Si

N

N

Si

75° / 20
Flashpoint: 45°C (113°F)

Hydroxypropyl group undergoes rearrangements.1
1. Speier, J. et al. J. Org. Chem. 1960, 25, 1637.
See also SIB1144.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18001-97-3]
EC 241-916-2 HMIS: 2-2-0-X

NN

250.4825g ¥32,600

0.953125

1.447225

100g ¥98,400

SIB1185.0

BIS(1-IMIDAZOLYL)DIMETHYLSILANE, tech-95
C8H12N4Si

192.29COMPOUNDS

HO(52-5°)HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[179611-74-6]
HMIS: 2-1-1-X
5g ¥21,500

SIB1205.0

BIS(INDENYL)DIMETHYLSILANE
C20H20Si
288.46
Viscous yellow oil
Intermediate for zirconocene copolymerization catalyst.1
1. Lehtinen, C. et al. Eur. Polym. J. 1997, 33, 115.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[136946-83-3]
HMIS: 2-2-0-X

O

C

C
N

Si

Si

O

1.060

1.612

0.99801.44891.044

1.46605g ¥32,600

O SIB1250.0

BIS(3-ISOCYANATOPROPYL)TETRAMETHYLDISILOXANE, 96%
C12H24N2O3Si2
300.50N(6-9°)

131-2° / 1.5

Intermediate for silicone-urethanes
Forms permselective membranes.1
1. Jpn. Kokai Tokkyo Koho, 1984, JP 59209610 A 19841128
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[20160-69-4]
HMIS: 3-2-1-X

SILICON

Si

155° / 425g ¥72,400

PR

SIB1380.0O

1,3-BIS(3-METHACRYLAMIDOPROPYL)TETRAMETHYLDISILOXANE
C18H36N2O3Si2
384.67
Si O
Contains isomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
2
HMIS: 2-2-0-X store <5°CN
H

5g ¥59,100

SIB1390.0

O

O

O

Si

O

OH

2

25g ¥61,800

1,3-BIS(3-METHACRYLOXYPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95
C26H58O9Si6
683.250.989
Viscosity: 15 cSt
Flashpoint: >100°C (>212°F)
Oxygen permeable cross-linker
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[80722-63-0]
HMIS: 3-1-0-X store <5°C
25g ¥16,400
100g ¥44,800

SiO

Hydrophilic cross-linking monomer
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[71223-24-0]
HMIS: 2-1-0-X store <5°C

SIB1400.0OO

1,3-BIS(3-METHACRYLOXY-2-HYDROXYPROPOXYPROPYL)TETRAMETHYLDISILOXANE, tech-95
C24H46O9Si2
534.79

O

Si

O

Si

2

1.432

SIB1402.0

O
O

O

Si
2

1,3-BIS(3-METHACRYLOXYPROPYL)TETRAMETHYLDISILOXANE
C18H34O5Si2
386.64127° / 3
0.96625
Viscosity: 5 cSt
Flashpoint: >100°C (>212°F)
Functional endcapper for silicone polymerization
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18547-93-8]
TSCA EC 242-419-3 HMIS: 3-1-0-X store <5°C
25g ¥21,000
100g ¥60,200

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TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.448825

205

Name
Si

bp °C/mm(mp °C)

D420

nD20

0.997

1.419

SIB1403.0

1,3-BIS(METHACRYLOXY)-2-TRIMETHYLSILOXYPROPANE, 95%
C14H24O5Si
300.42125-30° / 1
Inhibited with MEHQHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[247244-66-2]
HMIS: 3-1-1-X store <5°C
25g ¥28,900

O
O

O
O

O

Cl-

O

Mw

SIB1500.0

O

NH+

Si

O

O
O

BIS(METHOXYETHYL)-3-TRIMETHOXYSILYLPROPYLAMMONIUM CHLORIDE, 60% in methanol
C12H29NO5Si∙HCl
331.91
Flashpoint: 11°C (52°F)
Hydrophilic ammonium salt; forms anti-fog surface films
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X
25g ¥16,200

SIB1550.0

O

O
O
F

O

Si

2-4

BIS(METHOXYTRIETHYLENEOXYPROPYL)TETRAMETHYLDISILOXANE
C24H54O9Si2
542.86
Contains PEG 2-4 homologs
O
Employed in battery electrolyte applications
2
See also SIB1765.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
HMIS: 2-1-0-X

25g ¥17,800

SIB1610.0

O
NSi

BIS(N-METHYLBENZAMIDO)ETHOXYMETHYLSILANE, tech-90
C19H24N2O3Si
356.50OON

Neutral cross-linker for silicone RTVs.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16230-35-6]
TSCA EC 240-354-5 HMIS: 2-1-1-X

SiSi25g ¥10,600

1.13100g ¥26,800

SIB1612.0ClCl

210° / 1(-13°)
Flashpoint: 150°C (302°F)
TOXICITY: oral rat, LD50: 2,840 mg/kg
Autoignition temperature: 410˚CCl

1,4-BIS(METHYLDICHLOROSILYL)BUTANE, 95%
C6H14Cl4Si2

284.1795-7° / 5

1.165Intermediate for carbosilazane polymers.1
Cl 1. Huggins, J. Ger. Offen. DE 114219A1, 1992.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[38958-24-6]
HMIS: 3-2-1-X
10g ¥19,400

SIB1614.0

1,2-BIS(METHYLDICHLOROSILYL)ETHANE

Cl

Cl

2,2,5,5-TETRACHLORO-2,5-DISILAHEXANE

Si

Si

Cl

Cl

C4H10Cl4Si2
256.11
208-210°(31-3°)
1.2628
Contains 1-5% 1,1-isomerFlashpoint: 94°C (201°F)
Dipodal coupling agent
See also SIB1612.0, SIB1615.0, SIB1632.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2065[3353-69-3]
TSCA EC 222-123-0 HMIS: 3-2-1-X
25g ¥13,500
100g ¥36,300

1.4760

SIB1615.0

1,2-BIS(METHYLDIETHOXYSILYL)ETHANE
C12H30O4Si2

O

PR

O

Si

Si

O

294.54

See also SIB1630.0, SIB1632.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18043-74-8]
EC 241-953-4 HMIS: 2-2-1-X

O80° / 1.5
Flashpoint: >65°C (>150°F)

0.92

1.417

0.918

1.42140.937

1.438525g ¥21,000

SIB1618.0O

1,2-BIS(METHYLDIETHOXYSILYL)ETHYLENE
C12H28O4Si2
292.52Mixed cis/trans isomers - primarily trans
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[124279-15-8]
HMIS: 2-3-1-X

O

Si

Si

O

O

80° / 225g ¥25,200

SIB1620.0

O

O

H
N

Si

BIS(METHYLDIETHOXYSILYLPROPYL)AMINE, 95%
C16H39NO4Si2

Si

O

O

F

F

F

206

155° / 0.6

25g ¥14,600

100g ¥39,500

SIB1630.0

SiSi

365.66

Dipodal coupling agent
See also SIB1822.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[31020-47-0]
HMIS: 2-1-1-X

F

1,2-BIS(METHYLDIFLUOROSILYL)ETHANE
C4H10F4Si2

190.29

114°

1.118

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[170381-99-4]
HMIS: 3-3-1-X
10g ¥25,700

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TEL: 03-5543-1630

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(215) 547-1015

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Enabling Your Technology
Name

Mw

bp °C/mm

238.43130-5° / 35

(mp °C)

D420

nD20

0.96791.41350.968

1.4121

SIB1632.0O

1,2-BIS(METHYLDIMETHOXYSILYL)ETHANE
C8H22O4Si2

O

Si

Si

O

See also SIB1615.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[98789-40-3]
HMIS: 3-2-1-X

O

10g ¥28,900

SIB1635.0

BIS(METHYLDIMETHOXYSILYL)METHANE

O O

2,2,4,4-TETRAMETHOXY-1,3-DISILAPENTANE

O

184°

5g ¥30,000

SIB1645.0

O

O
O
F

BIS(METHYLDIMETHOXYSILYLPROPYL)-N-METHYLAMINE, 95%
C13H33NO4Si2
323.58Viscosity: 6 - 7 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

Si
O

N

224.40Forms thermally stable coatings
See also SIB1094.0, SIB1632.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18297-79-5]
HMIS: 4-3-1-X

O

O

Si

O

C7H20O4Si2

Si

Si

140° / 2

0.951

1.43681.00

1.4522525g ¥16,200

SIB1660.0

O
O

n

O

Si

O

N

Si

H

100g ¥8,500

2kg ¥69,100

18kg ¥295,000

SIB1680.0

O

N

Flashpoint: >110°C (>230°F)

COMPOUNDSO

BIS[(3-METHYLDIMETHOXYSILYL)PROPYL]POLYPROPYLENE OXIDE
600 - 800
Viscosity: 6,000-10,000 cSt.
Hydrophilic dipodal silane
W/tin catalyst forms moisture-cross-linkable resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[75009-88-0]
TSCA
HMIS: 3-1-1-X
BIS(MORPHOLINO)SILANE
C8H18N2O2Si

202.3385° / 1

1.048

Employed in CVD
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-3-1-X
5g ¥27,800

H

SIB1705.0

F

F
F

F

F

3

F

Cl

Si

F

3

F

F

Cl

BIS(NONAFLUOROHEXYL)DICHLOROSILANE
C12H8Cl2F18Si

F

593.16

Forms release coatings, polymers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[156323-66-9]
HMIS: 3-2-1-X
10g ¥51,200

SIB1706.0

F

F
F

F
Si

3

F

O

Si
2

Si

[BIS(NONAFLUOROHEXYLDIMETHYLSILOXY)METHYL]SILYLETHYLDIMETHYLCHLOROSILANE, 95%
C21H33ClF18O2Si4
807.26128° / 0.2

1.24425

1.370525

1.30225

1.34825

1.33251.340125

1.373

1.4181

C12H34O2Si4
322.74254-5°(-52°)
0.820
Viscosity, 25°: 3 cSt
Flashpoint: 92°C (198°F)
Vapor pressure, 100˚: 4 mm
Vehicle for cosmetics and perfumes
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[6231-68-1]
HMIS: 2-2-1-X
25g ¥13,000
100g ¥34,500

1.410

Forms self-cleaning surfaces
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

F

Si

3

F

O

F

BIS(NONAFLUOROHEXYLDIMETHYLSILOXY)METHYLSILANE, 95%
H F O Si3
686.6017 24 18 2

HC

Si

Fluorous phase reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[147986-73-0]
HMIS: 2-1-1-X

2

F

O

Si

3

F

2

F

O

F

5g ¥24,700

Si

F

O

BIS(NONAFLUOROHEXYL)TETRAMETHYLDISILOXANE
C16H20F18OSi2
626.47150° / 45
Viscosity: 3.6 cSt
Low refractive index fluid
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[122179-35-5]
TSCA-L
HMIS: 2-2-0-X
25g ¥22,500

SIB1710.0

F BIS(PENTAFLUOROPHENYL)DIMETHOXYSILANE

C14H6O2F10Si

F

104° / 1.5

SIB1709.0

FFF

5g ¥35,300

SIB1708.0

F

PR

F

Cl

SILICONSiOCOMMERCIAL

O

F F

F

424.27

Unit for hydrogen-free resins, useful in optical fiber applicationsF
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[223668-68-6]
HMIS: 3-3-1-X

F

90° / 135g ¥37,700

SIB1735.0

1,2-BIS(PENTAMETHYLDISILOXANYL)ETHANE

Si

2,2,4,4,7,7,9,9-OCTAMETHYL-3,8-DIOXA-2,4,7,9-TETRASILADECANE

O
Si

Si
O

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

207

Name

Mw

bp °C/mm(mp °C)

260.41180° / 4(78-81°)

D420

nD20

0.97925

1.454525

SIB1760.0

BIS(PHENYLETHYNYL)DIMETHYLSILANE
C18H16Si

Reductive cyclization yields siloles, oligosiloles.1
Useful in silicon-mediated Sonogashira cross-coupling reactions.2
1. Tamao, K. J. Am. Chem. Soc. 1994, 116, 11715.
2. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2170-08-3]
HMIS: 2-2-1-X

Si

5g ¥36,300

SIB1765.0

1,3-BIS(TETRAHYDROFURFURYLOXYPROPYL)TETRAMETHYLDISILOXANE
C20H42O5Si2
418.72
Viscosity: 13 cSt
Si O
Surface tension (neat): 23.6 mN/m
Surface tension, 0.1% in water: 24 mN/m
2
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions
HMIS: 1-2-0-X

O

165° / 1025g ¥32,600

O
O
F

O

SIB1770.0

O

Si
Si

H

Si

O

Cl

Cl

Si

Si

Cl

Cl

Cl

Si
Cl

Cl Cl

Cl

0.845

1.41

1.469

1.47301.24961.475425g ¥34,200

BIS(TRICHLOROSILYL)ACETYLENE
C2Cl6Si2

292.91

173-4°(23-4°)
Flashpoint: 82°C (180°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18038-55-6]
HMIS: 3-2-1-X
10g ¥44,300

Cl

10

1,2-BIS(TRICHLOROSILYL)DECANE
C10H20Cl6Si2

409.16114° / 1

Bonded phase for HPLC stable over wide range of pH
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[620987-03-3]
TSCA-L
HMIS: 3-2-1-X
25g ¥19,400

SIB1809.0

1,10-BIS(TRICHLOROSILYL)DECANE, tech-95
C10H20Cl6Si2

Cl

Si

Cl

90-5° / 20

SIB1808.0

Cl

Si

Si

294.69SIB1805.0

Cl

Cl

Cl

1,2-BIS(TETRAMETHYLDISILOXANYL)ETHANE, 95%
C10H30O2Si4HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[229621-70-9]
HMIS: 2-2-1-X

Cl

Cl

H

Si

409.16

See also SIB1815.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52217-62-6]
HMIS: 3-2-1-X

120° / 0.5

1.232

10g ¥16,400

SIB1810.0

Cl

Cl
Si

Cl

PR

Cl

1,2-BIS(TRICHLOROSILYL)ETHANE, 95%
C2H4Cl6Si2
296.94
201°(24-5°)
1.4829Contains 1,1-isomerFlashpoint: 65°C (149°F)
Cl
Si
Forms mesoporous sol-gel structures
Forms 6-arm stars with anionic polystyrene.1
Cl
1. Frater, D. et al. J. Polym. Sci., Part B: Polym. Phys. 1997, 35, 587.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2504-64-5]
TSCA EC 219-710-9 HMIS: 3-2-1-X
25g ¥16,200
100g ¥37,900

1.4770

SIB1811.0

BIS(TRICHLOROSILYLETHYL)BENZENE, tech-95

Cl

Cl

Cl

Cl

Si

Cl

Cl

F F F F F F

Si

Cl

F

F F

F F

Cl

Si

Cl C10H12Cl6Si2

401.09Mixed isomers
Cl HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[107602-27-7]
HMIS: 3-2-1-X

210° / 0.5

1.29

25g ¥28,900

SIB1809.5

Si

Cl 1,6-BIS(TRICHLOROSILYLETHYL)DODECAFLUOROHEXANE
Cl

F

C10H8Cl6F12Si2

625.04110-2° / 0.1(118-122°)

Forms hydrolysis-resistant oleophobic coatings
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35192-54-2]
HMIS: 3-1-1-X
5g ¥35,300

SIB1811.5

Cl

Cl

Cl

Si

Si

Cl

208

F

F

Cl

Cl

8

1,8-BIS(TRICHLOROSILYLETHYL)HEXADECAFLUOROOCTANE
C12H8Cl6F16Si2
725.06
Forms hydrolysis-resistant oleophobic coatings
See also SIB1809.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[445303-83-3]
HMIS: 3-1-1-X

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TEL: 03-5543-1630

Gelest, Inc.

142-4° / 0.6(69-70°)1.0g ¥40,600(215) 547-1015

www.gelest.com

1.5284

Enabling Your Technology
Name
O
Cl

O

Si

Cl

Cl

bp °C/mm(mp °C)

D420

nD20

SIB1811.7

BIS(TRICHLOROSILYLETHYL)PHENYLSULFONYL CHLORIDE, mixed isomers, 40% in toluene
C10H11Cl7O2SSi2499.60Flashpoint: 4°C (39°F)
Cl
Forms bonded phases with increased resistance to hydrolysis
Si
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl
HMIS: 3-4-1-X
10g ¥44,800

Cl

S

Mw

1.03

SIB1812.0
Cl
Si

Si

Cl

Cl

Cl

Cl Cl
Cl

BIS(TRICHLOROSILYL)METHANE
CH2Cl6Si2

1,1-BIS(TRICHLOROSILYLMETHYL)ETHYLENECl C H Cl Si

Cl
Si

14

Cl

Si

4

1.55671.474025g ¥41,600

6

6

2

322.98240-2°

1.4052

1.4931SIB1813.7

1,2-BIS(TRICHLOROSILYL)OCTADECANE
C18H36Cl6Si2

Cl

521.37

186-9° / 0.2

1.103

Hydrolysis resistant dipodal bonded phase for high acidity aqueous HPLC
See also SIB1815.1
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-1-1-X
10g ¥36,300

Cl

Cl

183°

Allylic silane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[78948-04-6]
HMIS: 3-2-1-X
10g ¥40,600

ClCl

282.90

SIB1813.5

SiCl

1.475950g ¥46,900

Nucleus for star polymers and dendrimers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4142-85-2]
TSCA-L
HMIS: 3-2-1-X
5g ¥13,000

Cl

Cl

Si

Forms mesoporous sol-gel structures
See also SIB1809.5, SIB1814.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13083-94-8]
TSCA EC 235-994-7 HMIS: 3-2-1-X
10g ¥14,300

1.327

SIB1814.0

Cl

Cl

Cl

Si

Si

Cl

Cl

Cl

1,8-BIS(TRICHLOROSILYL)OCTANE
C8H16Cl6Si2

381.10140° / 1
Flashpoint: 115°C (239°F)

Forms mesoporous sol-gel structures
See also SIB1824.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[52217-53-5]
EC 257-748-8 HMIS: 3-1-1-X
25g ¥13,000

1.22

1.47571.43941.4732100g ¥34,200

SIB1815.0

ClCl

310.97

PR
Cl

Cl

Cl

1,3-BIS(3-TRICHLOROSILYLPROPOXY)-2-DECYLOXYPROPANE
C19H38Cl6O3Si2
583.40

Si

Cl

O

O

O

Cl

Cl

(29-30°)

SIB1815.1

ClCl

115-7° / 4

Forms mesoporous sol-gel structures
1
Cl Intermediate for “dumbbell” POSS structures.
1. Araki, H. et al. Polym. J. 2012, 44, 340.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18171-50-1]
HMIS: 3-2-1-X
10g ¥26,000

SiSi

1,3-BIS(TRICHLOROSILYL)PROPANE
C3H6Cl6Si2

COMPOUNDS

Cl

Si

148-50° / 10
Flashpoint: 75°C (167°F)

SIB1813.0

ClSi

353.05

O
O
F

Cl

Cl

1,6-BIS(TRICHLOROSILYL)HEXANE
C6H12Cl6Si2

Cl

SILICONCl

9190-200° / 0.4

1.158

Dipodal C18 analog with embedded hydrophilicity
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[862912-02-5]
HMIS: 3-1-1-X
10g ¥36,300

SiCl

SIB1815.3

Cl

Cl

Si

3,3-BIS(TRICHLOROSILYLPROPOXYMETHYL)-5-OXA-TRIDECANE, 95%
C20H40Cl6O3Si2
597.42

Cl

O

O

7

O

Cl Si

220-2° / 0.9

1.135

Dipodal hydrophobic surface treatment with embedded hydrophobicity for chromatography
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[862911-99-7]
HMIS: 3-1-1-X
10g ¥25,700

Cl

Cl

SIB1815.4

Cl
Cl

Si
Cl

O

11

2

BIS(TRICHLOROSILYLUNDECYL) ETHER
C22H44Cl6OSi2

593.48HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-1-1-X
1.0g ¥52,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

209

Name
F

F
F

O

Si

5

F

F

BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLCHLOROSILANE
921.06
122-4° / 1.6

Blocking agent for fluorous phase chemistry
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[521069-01-2]
HMIS: 3-2-1-X

O

Si

nD20

5

BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLSILANE
H F O Si3
886.64136° / 3
21 24 26 2

Reducing agent for fluorous phase synthesis
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[521069-00-1]
HMIS: 3-2-1-X

1.414

1.34255g ¥40,600

SIB1816.0

F

1,3-BIS(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TETRAMETHYLDISILOXANE
C20H20F26OSi2
826.4981-2° / 11(-40 to -45°)
1.460
Viscosity: 6-7 cSt.
Si O
Low refractive index fluid
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
2[71363-70-7]
HMIS: 2-1-0-X
25g ¥30,800
100g ¥92,600

5F

5g ¥49,900

1.336922

O
O
F

F

1.437

H C

Si
2

F

D420

SIB1815.7

FFF(mp °C)Cl C21H23ClF26O2Si3

Si
2

F

bp °C/mm

SIB1815.5

F

F

Mw

SIB1816.6

O

O

O

Si

Si

O

O

1,4-BIS(TRIETHOXYSILYL)BENZENE
C18H34O6Si2

O

402.64

Forms phenylene-bridged silica with ordered pore walls.1,2
1. Inagaki, S. et al. Nature 2002, 416, 304.
2. Wang, W. et al. Chem. Mater. 2003, 15, 4886.
See also SIB1811.0, SIB1831.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2615-18-1]
HMIS: 2-2-1-X

130-2° / 0.4

5g ¥19,400

1.015

1.45491.047

1.503925g ¥67,100

SIB1816.8

O

O

O

Si

Si

O

O

O

4,4’-BIS(TRIETHOXYSILYL)BIPHENYL
C24H38O6Si2

478.73

Reagent for mesoporous silicas
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[123640-93-7]
HMIS: 2-2-1-X

203-6° / 0.3
Flashpoint: >110°C (>230°F)
5g ¥53,800

SIB1817.0

1,2-BIS(TRIETHOXYSILYL)ETHANEHEXAETHOXYDISILETHYLENE, BSE

C14H34O6Si2
ΔHvap: 101.5 kJ/mole

O
Si

O

O

PR

O

96° / 0.3(-33°)
0.957
1.4052
Flashpoint: 107°C (225°F)
TOXICITY: oral rat, LD50: 161 mg/kg
Vapor pressure, 150°: 10mm
Additive to silane coupling agents formulations that enhances hydrolytic stability
Employed in corrosion resistant coatings/primers for steel and aluminum.1,2
Sol-gels of α,ω-bis(trimethoxysilyl)alkanes reported.3
Component in evaporation-induced self-assembly of mesoporous structures.4
Forms mesoporous, derivatizeable molecular sieves.5,6Hydrolysis kinetics studied.7
1. Van Ooij, W. et al. J. Adhes. Sci. Technol. 1997, 11, 29.
2. Van Ooij, W. et al. Chemtech 1999, 28, 3302.
3. Loy, D. A. et al. J. Am. Chem. Soc. 1999, 121, 5413.
4. Lu, Y. et al. J. Am. Chem. Soc. 2000, 122, 5258.
5. Molde, B. et al. Chem. Mater. 1999, 11, 3302.
6. Cho, E. et al. Chem. Mater. 2004, 16, 270.
7. Diaz-Benito, B. Colloids and Surfaces A: Physicochemical Aspects 2010, 369, 53.
See also SIB1821.0, SIT8185.8
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16068-37-4]
TSCA EC 240-212-2 HMIS: 3-1-1-X
25g ¥7,400
100g ¥16,400
2kg ¥104,100

SIB1820.0

1,2-BIS(TRIETHOXYSILYL)ETHYLENE, 95%OO

4,4,7,7-TETRAETHOXY-3,8-DIOXA-4,7-DISILADEC-5-ENE

O

Si

Si

O

O

O

C14H32O6Si2
352.57~80% trans isomer
Forms ethylene-bridged mesoporous silicas.1
1. Vercaemst, C. et al. Chem. Mater. 2009, 21, 5792.
See also SIB1618.0, SIB1832.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[87061-56-1]
HMIS: 2-2-1-X

122-5° / 4

5g ¥14,600

0.958

1.4168

0.945

1.421

25g ¥48,000

SIB1820.2

O
O

Si

O

O

Si

210

O

Si

O
Si

O

1,3-BIS(TRIETHOXYSILYLETHYL)TETRAMETHYLDISILOXANE
C20H50O7Si4
514.95
Contains isomers
Dipodal hydrophobic surface treatment
See also SIB1824.0, SIB1829.7, DMS-XT11
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[117680-21-4]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

125-135° / 0.1
Flashpoint: >110°C (>230°F)

25g ¥22,500(215) 547-1015

www.gelest.com

COMMERCIAL

O
Si

O

354.59

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.10

1.533

SIB1820.5

O

O
Si

O

S

O

O

O

O

O

O

Si

O

Si
2-4

BIS(TRIETHOXYSILYLETHYL)VINYLMETHYLSILANE
C19H44O6Si3O

Si

2kg ¥182,600

SIB1818.0

OSi

BIS[m-(2-TRIETHOXYSILYLETHYL)TOLYL]POLYSULFIDE, tech-90
C30H50O6S(2-4)Si2
627 - 691
Dark, viscous liquidFlashpoint: 55°C (131°F)
Coupling agent for SBR rubber
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[198087-81-9]/[85912-75-0]/[67873-85-2] TSCA
HMIS: 2-2-1-X
25g ¥11,900

452.82141° / 0.15

See also SIB1824.9
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

0.943

5g ¥38,500

SIB1821.0

BIS(TRIETHOXYSILYL)METHANE
Si

C13H32O6Si2

O

Si

O

O
O
F

4,4,6,6-TETRAETHOXY-3,7-DIOXA-4,6-DISILANONANE

O O

O

340.56

114-5° / 3.5

Intermediate for sol-gel coatings, hybrid inorganic-organic polymers
Forms methylene-bridged mesoporous structures.1
Forms modified silica membranes that separate propylene/propane mixtures.2
1. Zhang, W. et al. Chem. Mater. 2005, 17, 6407.
2. Kanezashi, M. et al. J. Membr. Sci. 2012, 415-416, 478.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18418-72-9]
TSCA-L
HMIS: 3-2-1-X

O

0.974125g ¥22,500

1.4098100g ¥65,500

1,8-BIS(TRIETHOXYSILYL)OCTANE
C20H46O6Si2

O

O

Si

Si

O

O

O

OH

O

O

HO

5-8

O

O

Si

O

Si

0.926

1.4240

0.959

1.421

100g ¥29,400

BIS-[3-(TRIETHOXYSILYLPROPOXY)-2-HYDROXYPROPOXY]POLYETHYLENE OXIDE, 65% in ethanol
C24H54O11Si2(C2H4O)5-8
800 - 900
Flashpoint: 21°C (70°F)
Hydrophilic dipodal silane
See also SIB1824.82
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-4-1-X
25g ¥24,100

O

O

O

172-5° / 0.75

SIB1824.2

OO

438.76

Employed in sol-gel synthesis of mesoporous structures
Crosslinker for moisture-cure silicone RTVs with improved environmental resistanceSol-gels of α,ω-bis(trialkoxysilyl)alkanes reported.1
1. Loy, D.A. et al. J. Am. Chem. Soc. 1999, 121, 5413.
See also SIB1820.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52217-60-4]
TSCA
HMIS: 2-1-1-X
25g ¥11,400

SILICONOCOMPOUNDSSIB1824.0

SIB1824.4

O

O

Si

O

O

O

O

Si

O

O

For solid-state synthesis of oligonucleotides
See also SIH6171.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[862911-98-6]
HMIS: 2-4-1-X

PR

HO

2,2-BIS(3-TRIETHOXYSILYLPROPOXYMETHYL)BUTANOL, 50% in ethanol
C24H54O9Si2
542.86

0.899

Flashpoint: 15°C (59°F)

10g ¥48,000

SIB1824.5

O

H
N

Si

O

Si

O

O

160° / 0.6
Flashpoint: 162°C (324°F)

25g ¥7,200

0.97

1.4265
COMMERCIALOO

BIS(3-TRIETHOXYSILYLPROPYL)AMINE, 95%
C18H43NO6Si2
425.71
Viscosity: 5.5 cSt
Coupling agent for polyamides with improved hydrolytic stability
Adhesion promoter, crosslinking agent for hot melt adhesives
Adhesion promoter for aluminum-polyester multilayer laminates
Adhesion promoter, crosslinker for 2-part condensation cure silicones
See also SIB1833.0, SIT8187.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13497-18-2]
TSCA EC 236-818-1 HMIS: 3-1-1-X

100g ¥15,400

2kg ¥105,000

SIB1824.56

BIS(3-TRIETHOXYSILYLPROPYL)CARBONATE
C19H42O9Si2

O

O

Si

O

O

2

470.71

Forms thermally labile bridged silsesquioxanes.1
O
1. Loy, D.A. et al. Chem. Mater. 1999, 11, 3333.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[88321-11-3]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

150° / 101.020

10g ¥33,200(215) 547-1015

www.gelest.com

211

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.025

1.457

SIB1824.6

BIS[3-(TRIETHOXYSILYL)PROPYL]DISULFIDE, 90%

Si

S

O

C18H42O6S2Si2
474.82
Contains sulfide and tetrasulfide
dipodal coupling agent/vulcanizing agent for rubbers
Intermediate for mesoporous silicas with acidic pores.1
1. Alauzun, J. et al. J. Am. Chem. Soc. 2006, 128, 8718.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[56706-10-6]
TSCA EC 260-350-7 HMIS: 2-2-1-X

O
S

Si

O

O

Flashpoint: 75°C (167°F)

25g ¥9,800

100g ¥24,100

COMMERCIAL

BIS(TRIETHOXYSILYL)-4,5-DITHIOOCTANE

OO

2kg ¥94,000

SIB1824.8

1,7-BIS(4-TRIETHOXYSILYLPROPOXY-3-METHOXYPHENYL)-1,6-HEPTADIENE-3,5-DIONE, tech-90
C39H60O12Si2
777.07
UV max: 220, 232(vs), 354(broad)
Metal chelating chromophore

O
O

Si

O

O
O

O
O
F

*

O

2

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[947329-82-0]
HMIS: 2-1-1-X

O

O

HN

NH
O

O

Si

O

n
O

O

Si

N,N’-BIS-[(3-TRIETHOXYSILYLPROPYL)AMINOCARBONYL]POLYETHYLENE OXIDE (10-15 EO)
UREASILO

O

0.5g ¥51,200

SIB1824.82

1,000 - 1,200
Viscosity: 300-350 cSt
Dipodal hydrophilic silane
In combination with sulfolane forms gel electrolyte for solar cells.1
Forms proton conducting hybrid organic-inorganic polymer electrode membranes.2
1. Stathatos, E. et al. Adv. Funct. Mater. 2004, 14, 45.
2. Honma, I. et al. J. Membr. Sci. 2001, 185, 83.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[178884-91-8]
TSCA
HMIS: 1-1-1-X
25g ¥18,300

1.088

1.458325

250° dec.
1.095
Flashpoint: 91°C (196°F)
TOXICITY: oral rat, LD50: 16,400 mg/kg

1.49

100g ¥51,700

Antifog coatings can be formed from combinations of polyalkyleneoxide functional silanes and film-forming hydrophilic silanes

O

O

O

O

Si

O

SIB1824.84

25-30

Si

PR
O

6-8

6-8

O

O

Si

25g ¥25,700

SIB1824.9

OOO(38-42°)

Hydrolytically stable hydrophilic silane
Proton conducting polymer electrolyte.1
1. Ghosh, B. et al. Chem. Mater., 2010, 22, 1483.
See also SIB1860.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[666829-33-0]
HMIS: 2-1-1-X

O

O

O

BIS(3-TRIETHOXYSILYLPROPYL)POLYETHYLENE OXIDE (25-30 EO)
1,400 - 1,600

Si

O

O

1,3-[BIS(3-TRIETHOXYSILYLPROPYL)POLYETHYLENOXY]-2-METHYLENEPROPANE
C50H104O20Si2 (av)1113.50

OO

Vinyl functional hydrophilic dipodal coupling agent for protein immobilization
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

1.0g ¥80,900

SIB1825.0

O

212

Si

S

O

BIS[3-(TRIETHOXYSILYL)PROPYL]TETRASULFIDE, tech-95
TESPT

C18H42O6S4Si2
538.94
Contains distribution of S2 - S10 species; average 3.8
Viscosity: 11 cSt
2Adhesion promoter for precious metals
Coupling agent / vulcanizing agent for “green” tires
Adhesion promoter for PVD copper on parylene.1
1. Pimanpang, S. et al. J. Vac. Sci. Technol. A 2006, 24, 1884.
See also SIB1820.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3124[40372-72-3]
TSCA EC 254-896-5 HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

100g ¥13,000(215) 547-1015

2kg ¥50,000

www.gelest.com

18kg ¥214,000

COMMERCIALOSEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.047

1.4696

SIB1827.0

O

O

H
N

Si

N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]THIOUREA, 90%
C19H44N2O6SSi2
484.73
Viscous yellow liquid
Pour point: -60˚Forms films on electrodes for determination of mercury.1
1. Guo, Y. et al. J. Pharm. Biol. Anal. 1999, 19 175.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69952-89-2]
HMIS: 2-1-1-X

S

O

2

Flashpoint: >110°C (>230°F)

25g ¥39,000

SIB1828.0
O

H
N

Si

O

See also SIB1835.5, SIU9055.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69465-84-5]
HMIS: 2-1-1-X

O

3,5-BIS(TRIFLUOROMETHYL)PHENYLDIMETHYLSILANE, 95%
C10H10F6Si
272.26

F

Si

F

F

Si

F

Si

O

Si

Si

1.085

1.36510.984

1.43031.068

1.40911.08

1.473450g ¥42,700

1,3-BIS(TRIFLUOROPROPYL)TETRAMETHYLDISILOXANE
C10H20F6OSi2
326.44
Viscosity: 2 cSt
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[690-56-2]
HMIS: 2-1-0-X

75° / 10(-88 to -90°)

25g ¥21,500

100g ¥75,100

SIB1829.0

1,2-BIS(TRIMETHOXYSILYL)DECANE
C16H38O6Si2

O
O

1.386

76-9° / 10
Flashpoint: 78°C (172°F)

SIB1828.5

FFO

1,3-BIS(TRIFLUOROPROPYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
C10H21F6NSi2
325.45

Fluorinated blocking agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[39482-87-6]
TSCA EC 254-470-9 HMIS: 2-2-1-X

Si

F

F

1.11

2.5g ¥61,800O382.65Pendant dipodal silane; employed in high pH HPLC
Employed in the fabrication of luminescent molecular thermometers.1
1. Brites, C. et al. New J. Chem. 2011, 35, 1173.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[832079-33-1]
TSCA-L
HMIS: 3-2-1-X

OO

130-2° / 0.4

25g ¥16,200

100g ¥44,800

SIB1829.7

OOO

1,6-BIS(TRIMETHOXYSILYL)-2,5-DIMETHYLHEXANE
C14H34O6Si2

PR

Si

Si

O

O

354.59Forms hydrolytically stable hydrophobic coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

O

125-8° / 0.2

COMPOUNDS

Si

1.4125

SIB1828.4

F

F

H
N

1.23

F

F

F

54-6° / 3

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[33558-36-0]
HMIS: 2-2-1-X

F

F

F

100g ¥32,600

SIB1828.2

FFH

25g ¥12,500

O
O
F

2

0.923

Flashpoint: 17°C (63°F)

SILICONO

N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]UREA, 60% in ethanol
C19H44N2O7Si2
468.7325g ¥33,200

SIB1830.0

O

O

Si

Si

O

O

O

1,2-BIS(TRIMETHOXYSILYL)ETHANE
C8H22O6Si2
CAUTION: INHALATION HAZARD
AIR TRANSPORT FORBIDDEN

270.43O

Employed in fabrication of multilayer printed circuit boards.1
1. Palladino, J. U.S. Patent 5,073,456, 1991.
See also SIB1817.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18406-41-2]
TSCA EC 242-285-6 HMIS: 4-2-1-X

103-4° / 5Flashpoint: 65°C (149°F)
TOXICITY: inh rat, LC50: 2.4 ppm
Vapor pressure, 20˚: 0.08 mm

25g inquire

100g inquire

SIB1831.0

O

O

Si

O

O

Si
O

O

BIS(TRIMETHOXYSILYLETHYL)BENZENE, tech-95
C16H30O6Si2
374.58Mixed isomers
Forms high refractive index coatings
Forms resins that absorb organics from aqueous media.1
1. Edmiston, P. et al. Sep. Purif. Technol. 2009, 66, 532.
See also SIB1832.2, SIB1833.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[58298-01-4]
TSCA
HMIS: 2-1-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

148-50° / 0.1
Flashpoint: 193°C (379°F)

10g ¥12,200(215) 547-1015

50g ¥38,500

www.gelest.com

213

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.014

1.42131.097

1.4725

SIB1832.0

1,6-BIS(TRIMETHOXYSILYL)HEXANE
C12H30O6Si2

O

O

O

Si

Si

O

O

O

326.54Sol-Gels of α,ω-bis(trimethoxysilyl)alkanes reported.
1. Loy, D.A. et al. J. Am. Chem. Soc. 1999, 121, 5413.
See also SIB1824.0, SIB1829.7
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3732[87135-01-1]
HMIS: 3-2-1-X
1161° / 2Flashpoint: 95°C (203°F)

10g ¥17,100

50g ¥48,000

SIB1832.2

1,4-BIS(TRIMETHOXYSILYLMETHYL)BENZENE
C14H26O6Si2

O
Si

O

O

O

O

Si

346.53124-5° / 0.05

Forms adherent films on metal substrates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[193358-40-6]
HMIS: 3-1-1-X

O

10g ¥51,200

O

O

Si

1,1-BIS(TRIMETHOXYSILYLMETHYL)ETHYLENE, tech-95
C10H24O6Si2
296.47
Contains ~ 10% cyclic siloxane condensation products
Dipodal coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[143727-20-2]
HMIS: 3-3-1-X

O

Si

O

O
O
F

SIB1832.5

OO

230-3°

1.05

1.42925

0.981

1.424

0.922

1.384251.040

1.43205g ¥52,200

SIB1832.7

OO

1,8-BIS(TRIMETHOXYSILYL)OCTANE
C14H34O6Si2

O

Si

Si

O

O

O

354.59138° / 0.2

See also SIB1824.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[105566-68-5]
HMIS: 3-2-1-X

25g ¥26,800

SIB1832.8

1,11-BIS(TRIMETHOXYSILYL)-4-OXA-8-AZAUNDECAN-6-OL, 50% in methanol

O
Si

O

3,3,15,15-TETRAMETHOXY-2,7,16-TRIOXA-11-AZA-3,15-DISILAHEPTADECAN-9-OL

OO

C15H37NO8Si2

OH

O
N
H

Si

O

O

415.63

Provides strong glass-to-glass bonds
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[126552-46-3]
HMIS: 3-4-1-X

Flashpoint: 11°C (52°F)
25g ¥9,800

100g ¥24,700

SIB1833.0

BIS(3-TRIMETHOXYSILYLPROPYL)AMINE, 96%
C12H31NO6Si2

O

H
N

Si

Si

O

O

Dipodal coupling agent
Secondary amine allows more control of reactivity with isocyanates
Low level incorporation with acryloxypropyltrimethoxysilane, SIA0200, increases strength and hydrolytic stability of dental composites.1
1. Matinlinna, J. et al. Acta Odontol. Scand. 2012, 70, 405.
See also SIB1824.5, SID1834.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[82985-35-1]
TSCA EC 280-084-5 HMIS: 3-1-1-X
25g ¥3,700
2kg ¥82,900
18kg ¥336,000

PR

O

O

Si

O

SIB1833.4

O

1,3-BIS(TRIMETHOXYSILYLPROPYL)BENZENE
C18H34O6Si2

O

O

O

Si

O

SIB1834.0

N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 62% in methanol
C14H36N2O6Si2
384.62
Contains N,N-isomerFlashpoint: 20°C (68°F)
Coupling agent for polyamides with enhanced hydrolytic stability
Provides improved solder resistance for printed circuit boards
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3620[68845-16-9]
TSCA EC 272-453-4 HMIS: 3-4-1-X
25g ¥8,500

HNO

5g ¥41,900

O

O

Si

O

COMMERCIAL

NH

402.64

Forms mesoporous silicas
See also SIB1831.0, SIB1832.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

OSi

152° / 4Flashpoint: 113°C (235°F)

0.89

100g ¥19,900

2kg ¥110,000

SIB1834.1

O

O

Si
O

214

H
N

O
N
H

COMMERCIAL

O

O

341.56SiO

O

N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 95%
C14H36N2O6Si2
384.62
Contains N,N-isomer
Coupling agents for polyamides with enhanced hydrolytic stability
Forms thin film environments for metal ions.1
1. He, J. et al. RIKEN Review 2002, 45, 27.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68845-16-9]
TSCA EC 272-453-4 HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

Flashpoint: >110°C (>230°F)

10g ¥13,000(215) 547-1015

1.050

50g ¥41,600

www.gelest.com

1.4428

Enabling Your Technology
NameO

BIS(3-TRIMETHOXYSILYLPROPYL) FUMARATE, 96%
C16H32O10Si2

O
O
O

Si

Si

O

O

Si

(mp °C)

D420

nD20

O

440.59

Dipodal silane
Adhesion promoter for Pt-cure silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3371-62-8]
TSCA
HMIS: 3-1-1-X

Flashpoint: >110°C (>230°F)

1.118

1.443

1.023

1.430

25g ¥20,400

SIB1835.0

BIS(3-TRIMETHOXYSILYLPROPYL)-N-METHYLAMINE
C13H33NO6Si2

NO

bp °C/mm

SIB1834.5

O
O

O

Mw

O

O

Si

O

355.58See also SIB1828.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[31024-70-1]
HMIS: 2-1-0-X

OO

175° / 10
Flashpoint: 106°C (223°F)
25g ¥21,500

100g ¥62,100

O

O

H
N

Si

O
O
F

SIB1835.2

N,N’-BIS(3-TRIMETHOXYSILYLPROPYL)THIOUREA, tech-90
C13H32N2O6SSi2
400.66
Viscosity: 160-200 cSt
Forms mesoporous silicas that chelate metals
See also SIB1827.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

S

O

2

1.13

1.485

1.004

1.448810g ¥22,500

H
N

Si
O

O

2

O
Si

Flashpoint: >110°C (>230°F)

25g ¥8,500

100g ¥19,900

2kg ¥102,000

SIB1835.8Si

1,4-BIS(TRIMETHYLSILOXY)BENZENE
C12H22O2Si2

254.48

246°

(46°)

Reacts w/p-difluorobenzene in presence of 0.1% CsF at 260° in chlorobenzene forming polyethers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[90162-40-6]
HMIS: 2-2-1-X
25g ¥42,700

O

SIB1836.0

OSi

1,2-BIS(TRIMETHYLSILOXY)CYCLOBUTENE, 95%
C10H22O2Si2

230.4682-6° / 10
Flashpoint: 61°C (142°F)

0.897

1.4349173°(-53°)
Flashpoint: 54°C (129°F)
Vapor pressure, 57°: 12 mm

1.00171.398392-4° / 50
Flashpoint: 63°C (145°F)

0.858

1.386

Precursor to cyclobutanedione.
Undergoes Aldol condensations with carbonyls.2
Undergoes photocycloadditions.3
1. Dennis, J. et al. In Organic Synthesis; Wiley & Sons: New York, 1990; Collect. Vol. 7, 112.
2. Shimada, J. et al. J. Am. Chem. Soc. 1984, 106, 1759.
3. Hijfte, L. et al. Tetrahedron 1984, 40, 4371.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17082-61-0]
HMIS: 3-2-1-X
5g ¥22,500
1

O

PR

Si

SILICONO

N,N’-BIS(3-TRIMETHOXYSILYLPROPYL)UREA, 95%
C13H32N2O7Si2
384.58Amber liquid
Viscosity: 100 - 250 cSt
Adhesion promoter for 2-part condensation cure silicone RTVs
See also SIB1828.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18418-53-6]
TSCA
HMIS: 3-2-1-X

COMMERCIALOCOMPOUNDSSIB1835.5

SIB1837.0

BIS(TRIMETHYLSILOXY)DICHLOROSILANE

O

Si

Cl

Si

3,3-DICHLOROHEXAMETHYLTRISILOXANE

O

Si

Cl

C6H18Cl2O2Si3

277.37

Sterically hindered protecting group for diols
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2750-44-9]
HMIS: 3-2-1-X
25g ¥34,200

SIB1838.0

1,3-BIS(TRIMETHYLSILOXY)-1,3-DIMETHYLDISILOXANE, 95%

H

Si

O

3H,5H-OCTAMETHYLTETRASILOXANE

H

Si

O

Si

O

Si

C8H26O3Si4

282.63

Undergoes hydrosilylation reactions
See also SIH6116.6
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base(既) 7-477[16066-09-4]
TSCA EC 240-209-6 HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

10g ¥11,900(215) 547-1015

50g ¥37,400

www.gelest.com

215

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.842

1.40360.862

1.388325

SIB1840.0

1,2-BIS(TRIMETHYLSILOXY)ETHANEETHYLENE GLYCOL BIS(TRIMETHYLSILYL ETHER)

O

Si

Si

O

C8H22O2Si2
ΔHvap: 48.5 kJ/mole

206.43

Converts α,β-unsaturated aldehydes to acetals.1,2
1. Hwu, J. et al. J. Org. Chem. 1987, 52, 188.
2. Tsunoda, T. Tetrahedron Lett. 1980, 21, 1357.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7381-30-8]
EC 230-950-3 HMIS: 3-2-1-X

165-6°
Flashpoint: 46°C (115°F)
Vapor pressure, 70°: 25 mm

50g ¥26,300

SIB1843.0

Si

O

BIS(TRIMETHYLSILOXY)METHYLMETHOXYSILANESiMETHOXYHEPTAMETHYLTRISILOXANE

C8H24O3Si3

Si

O

252.5382° / 47

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7671-19-4]
HMIS: 3-2-1-X

25g ¥24,100

O
O
F

O

SIB1844.0

BIS(TRIMETHYLSILOXY)METHYLSILANE

Si

Si

O

H

Si

O

O

141-2°
Flashpoint: 27°C (81°F)
Critical temperature: 280.2˚C
Critical pressure: 14.81 bar
50g ¥6,200

0.8136250g ¥20,900

1.38152kg ¥139,000

SIB1845.0Si

3-[BIS(TRIMETHYLSILOXY)METHYLSILYLPROPOXY]SULFOLANE, 95%
C14H34O5SSi3
398.74

Si
O

O

222.51

See also SIB1838.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base(既) 7-477[1873-88-7]
TSCA EC 217-496-1 HMIS: 2-3-1-X

O

Si

S

C7H22O2Si3COMMERCIAL

1,1,1,3,5,5,5-HEPTAMETHYLTRISILOXANE

O

152-4° / 0.4

Surfactant
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[502925-36-2]
HMIS: 2-1-0-X

1.034

1.4452525g ¥20,400

BIS(TRIMETHYLSILOXY)VINYLMETHYLSILANE - see SIV9082.0 VINYLMETHYLBIS(TRIMETHYLSILOXY)SILANE

SIB1846.0

N,O-BIS(TRIMETHYLSILYL)ACETAMIDE
BSA

C8H21NOSi2O
N

71-3° / 35(-24°)
0.832
Flashpoint: 42°C (108°F)
TOXICITY: oral rat, LD50: 1,580 mg/kg

1.418

133-5°
Flashpoint: 2°C (36°F)

1.413

Versatile blocking agent
Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 58-72.
F&F: Vol. 13, p 34; Vol. 16, p 285; Vol. 20, p 50; Vol. 21, p 62.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3273[10416-59-8]
TSCA EC 233-892-7 HMIS: 3-2-1-X
25g ¥8,200
100g ¥18,800
2kg ¥156,000PRSi

203.43

SIB1850.0

BIS(TRIMETHYLSILYL)ACETYLENE
C8H18Si2Si

170.40

(22°)

0.770

Versatile reagent for introducing unsaturation
Key reviews.1,2,3
Used to prepare 1,2-bis(aryl)acetylenes.3
Reacts with internal acetylenes to form 1,2,4,5-tetrasubstituted benzenes.4
Useful in silicon-mediated Sonogashira cross-coupling reactions.5
Used to prepare 4-alkynylthiazoles.6
1. Weber, W. In Silicon Reagents for Organic Synthesis; Springer-Verlag: 1983, p129.
2. Vollhardt, P. Acc. Chem. Res. 1977, 10, 1.
3. Nishihara, Y. et al. J. Org. Chem. 2000, 65, 1780.
4. Li, S. et al. Org. Lett. 2009, 11, 3318.
5. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
6. Arunkukmar, K. et al. Tetrahedron Lett. 2012, 53, 3885.
F&F: Vol. 4, p 42; Vol. 5, p 44; Vol. 8, p 146; Vol.9, p 142; Vol. 10, p 126; Vol. 10, p 126; Vol. 13, p 97, p 309; Vol. 14, p 116.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[14630-40-1]
TSCA EC 238-671-9 HMIS: 2-4-1-X
10g ¥13,500
50g ¥43,800

Si

SIB1852.0

Si

216

O

O

O

O

Si

BIS(TRIMETHYLSILYL)ACETYLENEDICARBOXYLATE
C10H18O4Si2

258.42Synthetic intermediate with readily cleavable silyl groups.1
1. Verboom, W. et al. Synthesis 1981, 807.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76734-92-4]
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

78-80° / 0.05
Flashpoint: 67°C (153°F)

0.988

10g ¥42,700(215) 547-1015

www.gelest.com

1.4390COMMERCIALSiEnabling Your Technology
NameSi

N-6,9-BIS(TRIMETHYLSILYL)ADENINE
C11H21N5Si2

N
NN

bp °C/mm(mp °C)

D420

nD20

0.948

1.4275

SIB1852.3

NH

N

Mw

279.49See also SIB1857.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17995-04-9]
TSCA EC 241-911-5 HMIS: 1-1-0-X

Si

124° / 0.25
(87°)
Flashpoint: 110°C (230°F)
5g ¥39,500

SIB1852.6

BIS(TRIMETHYLSILYL) ADIPATEC12H26O4Si2

O
O

Si

Si

O
O

290.51

Intermediate for polyamide synthesis
See also SIB1862.0, SIB1870.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18105-31-2]
TSCA EC 242-002-6 HMIS: 2-2-0-X

134-6° / 12Flashpoint: 75°C (167°F)

100g ¥27,100

SIB1852.7

Si

O
O
F

N,N-BIS(TRIMETHYLSILYL)ALLYLAMINE
C9H23NSi2N

72° / 15
Flashpoint: 43°C (109°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7688-51-9]
EC 231-699-2 HMIS: 4-3-1-X
25g ¥51,200Si

201.46

0.817

1.440

1.004

1.51780.821

1.4351

BIS(TRIMETHYLSILYLAMINE - see SIH6110.0 HEXAMETHYLDISILAZANE

SIB1852.8

Si

221.4355-60° / 0.4

Intermediate for polydimethylphosphazenes.1
1. Neilson, R. et al. Inorg. Chem. 1982, 21, 3568.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[63744-11-6]
HMIS: 3-2-1-X
10g ¥46,900

SIB1853.0Si

1,4-BIS(TRIMETHYLSILYL)BENZENE
C12H22Si2

Si

222.48194-5°(92-4°)
Flashpoint: 175°C (347°F)

Undergoes electrophilic substitutions of the aryl-Si bond
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[13183-70-5]
HMIS: 2-1-0-X

50g ¥36,300

SIB1853.5

BIS(TRIMETHYLSILYL)BISPHENOL A

O

Si

4,4’-ISOPROPYLIDENEBIS(TRIMETHYLSILOXYPHENOL)

O

Si

C21H32O2Si2

372.65179° / 1.5

Monomer for substitution polymerization with fluoroaromatics (byproduct Me3SiF).1,2,3
1. Kricheldorf, H. et al. J. Polym. Sci., Polym. Chem. Ed. 1983, 21, 2283.
2. Takekoshi, T. et al. J. Polym. Sci., Part A: Polym. Chem. 1997, 35, 759.
3. Herbert, C. et al. Macromolecules 1996, 29, 7709.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4387-16-0]
HMIS: 2-2-1-X
100g ¥34,500

SIB1854.0

PR

BIS(TRIMETHYLSILYL)BUTADIYNE
C10H18Si2

SiSi

194.42COMPOUNDSSiN

BIS(TRIMETHYLSILYL)AMINODIMETHYLPHOSPHINE
C8H24NPSi2

SILICONP(107-9°)Stable crystalline form of butadiyne; synthon for heterocycles.1
Used to prepare multidentate 1,2,3-triazole chelate ligands.2
Undergoes 6+2 cycloaddition with cycloheptatriene.3
1. Jacobs, P. M. et al. Heterocycl. Chem. 1977, 14, 1115.
2. Fuller, T. J. et al. Organometallics 2008, 27, 5430.
3. Hilt, G. et al. Synthesis 2009, 3305.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[4526-07-2]
HMIS: 2-3-1-X

10g ¥33,700

SIB1856.0

N

Si

C

Si

N

BIS(TRIMETHYLSILYL)CARBODIIMIDE
C7H18N2Si2
186.40164°(-23°)
Dipole moment: 1.48 debye
Flashpoint: 42°C (108°F)
1
Highly reactive equivalent of cyanamide; converts quinones to dicyanoquinodiimines.
Trans-silylation reaction with methyltrichlorosilane yields Si-C-N ceramic intermediate.2
1. Aumüller, A. et al. Angew. Chem. 1984, 96, 437.
2. Gabriel, A. et al. Chem. Mater. 1999, 11, 412.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1000-70-0]
TSCA EC 213-673-2 HMIS: 3-2-1-X
25g ¥34,200

BIS(TRIMETHYLSILY)CHLOROMETHANE - see SIB1864.0 BIS(TRIMETHYLSILYL)METHYL CHLORIDESi

SIB1857.0

NH
N
N

O

Si

BIS(TRIMETHYLSILYL)CYTOSINEC10H21N3OSi2
255.47
UV max, Bu2O: 306, 275, 236.5 nm
See also SIB1858.6, SIB1873.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18037-10-0]
TSCA EC 241-945-0 HMIS: 2-2-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

123° / 18(122°)
Flashpoint: 65°C (149°F)
5g ¥35,300(215) 547-1015

www.gelest.com

217

Name

Mw

bp °C/mm(mp °C)

264.6097-9° / 0.5(29-31°)

D420

nD20

0.759

1.4374

SIB1857.7

S

S

Si

Si

2,2-BIS(TRIMETHYLSILYL)-1,3-DITHIANE
C10H24S2Si2

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13411-46-6]
HMIS: 3-2-1-X

5g ¥20,400

SIB1857.9

1,2-BIS(TRIMETHYLSILYL)ETHYLENE, 90%
C8H20Si2
172.42156-8°
Primarily trans isomer
Reacts w/aryl iodides to form (E)-β-trimethylsilylstyrenes.1
1. Karabelas, K.; Hallberg, A. J. Org. Chem. 1989, 54, 1773.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1473-61-6]/[18178-60-4]
HMIS: 2-4-0-X
10g ¥50,100Si

Si(-18°)

SIB1858.0
Si

270.52(57-9°)

O
O
F

Si

1,3-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENE
C16H22Si2

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[38170-80-8]
HMIS: 3-3-0-X store <5°C

5g ¥25,200

SIB1858.2

SiSi

1,4-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENE
C16H22Si2

270.52(119-121°)

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[19938-13-5]
HMIS: 3-3-0-X

SiO

BIS(TRIMETHYLSILYL)-5-FLUOROURACIL

F

N
Si

O

2,4-BIS(TRIMETHYLSILOXY)-5-FLUOROURACIL

C10H19FN2O2Si2

274.44HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17242-85-2]
HMIS: 3-3-1-X

N

SIB1859.0

N,O-BIS(TRIMETHYLSILYL)HYDROXYLAMINE
C6H19NOSi2

OSi

5g ¥28,900

SIB1858.6

1.050

1.45900.830

1.41102.5g ¥36,300

78-9° / 100
Flashpoint: 28°C (82°F)

Review of synthetic utility.1
Lithiated derivative reacts w/ aldehydes and ketones to give hydroxyimines.2,3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 75-76.
2. King, F. D. et al. J. Chem. Soc., Chem. Commun. 1978, 351.
3. Hoffmann, R. V.; Buntain, G. A. Synthesis, 1987, 831.
F&F: Vol. 6, p 58.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[22737-37-7]
EC 245-188-7 HMIS: 2-3-1-X
10g ¥38,500

Si

N
H

177.40114° / 14
Flashpoint: 43°C (109°F)

SIB1860.0

BIS(TRIMETHYLSILYL) ITACONATEO

BIS(TRIMETHYLSILYL)-2-METHYLENEBUTANEDIONATE

O

O

Si

C11H22O4Si2

O

O

Si

274.46

Hydrocarbon soluble
Copolymerizes with styrene and acrylates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55494-04-7]
HMIS: 2-2-1-X

PRSi

70° / 0.025

25g ¥16,400

0.964

1.43390.91.40530.9702

1.41600.752

1.4170100g ¥45,900

SIB1861.0

O

Si

O

O,O-BIS(TRIMETHYLSILYL) LACTATE
C9H22O3Si2

234.45HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17596-96-2]
HMIS: 2-2-1-X

200°
10g ¥26,800

SIB1862.0

O

Si

O

BIS(TRIMETHYLSILYL) MALONATE
C9H20O4Si2

O

O

Si

248.43

Reagent for the preparation of β-ketoacids.
1. Schmidt, V. et al. Monatsh. Chem. 1967, 98, 1492.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18457-04-0]
EC 242-342-5 HMIS: 2-3-1-X
163-6° / 1
Flashpoint: 28°C (82°F)

10g ¥19,400

SIB1863.0

Si

218

Si

BIS(TRIMETHYLSILYL)METHANE
C7H20Si2
ΔHvap: 38.5 kJ/mole
Surface tension: 18.9 mN/m

160.41132-3°(-71°)
Flashpoint: 12°C (54°F)
Critical temperature: 301˚C
Critical pressure: 1.99 mPa

Exhibits very high excess electron mobility: 63 cm2/V s.1
For synthesis of silylated olefins by Peterson olefination of aldehydes and ketones.2
1. Holroyd, R. et al. Nucl. Instrum. Methods Phys. Res., Sect. A 1997, 390, 233.
2. Carter, M. et al. J. Chem. Soc., Chem. Commun. 1976, 679.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2117-28-4]
TSCA EC 218-322-7 HMIS: 2-4-0-X
10g ¥20,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

50g ¥71,300

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.7864

1.4267

SIB1863.2

Si

N,N-BIS(TRIMETHYLSILYLMETHYL)ACRYLAMIDE
C11H25NOSi2
243.50Inhibited with MEHQ
Analog of N-ISOPROPYLACRYLAMIDE, monomer for hydrogels
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
HMIS: 3-2-0-X store <5°C

N
Si

O

5g ¥69,200

SIB1863.3

BIS(TRIMETHYLSILYLMETHYL)AMINE

2,2,6,6-TETRAMETHYL-4-AZA-2,6-DISILAHEPTANE

C8H23NSi2Si

BIS(TRIMETHYLSILYL)METHYLAMINE - see SIH5843.0 HEPTAMETHYLTRISILAZANE

SIB1863.7

BIS(TRIMETHYLSILYLMETHYL)BENZYLAMINE
C15H29NSi2

NSi

279.57120-5° / 7

HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[144964-17-0]
HMIS: 2-2-0-X

0.877

10g ¥19,400

SIB1864.0

BIS(TRIMETHYLSILYL)METHYL CHLORIDE

2,2,4,4-TETRAMETHYL-3-CHLORO-2,4-DISILAPENTANE

C7H19ClSi2

72-3° / 22
Flashpoint: 48°C (118°F)

0.892

1.4490

Review of synthetic utility.1
Grignard reagent can be used to prepare sterically hindered aryl systems.2

ClSi

194.86

Si

SiMe3

Me3Si

MgCl

+

Pd(PPh3)4

Me3Si

THF, reflux

Br

SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 461-463.
2. Fukukawa, K.-A. et al. Macromolecules,2005, 38, 263.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5926-35-2]
HMIS: 2-2-0-X
5g ¥21,500

SIB1865.0

Si

Si

Cl

BIS(TRIMETHYLSILYLMETHYL)DICHLOROSILANE
C8H22Cl2Si3

274.43112-5° / 9

0.96

Polycarbosilane intermediate
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18420-19-4]
HMIS: 3-2-1-X
5g ¥26,000

PR

Cl

Si

COMPOUNDSSiSILICON

N
H

171°

O
O
F

Si

189.45

Opens epoxides with high regioselectivity.1
Forms imine with formaldehyde that does not readily trimerize.2 This aldimine can be used to form β-lactams.3,4
Reacts with ketones for form imines with (E)-isomer selectivity.5
1. Constantieux, T. et al. Synlett 1998, 510.
2. Capperucci, A. et al. J. Organomet. Chem. 1993, 458, C1.
3. Palomo, C. et al. Ang. Chem., Int. Ed. Engl. 1996, 35, 1239.
4. Palomo, C. et al. J. Chem. Soc., Chem. Commun. 1997, 233.
5. Palomo, C. et al. J. Org. Chem. 1997, 62, 2070.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17882-91-6]
HMIS: 2-3-0-X
5g ¥27,800

SIB1866.0

BIS(TRIMETHYLSILYLMETHYL)DIMETHOXYSILANE
C10H28O2Si3

Si

Si

O

Si

264.5967-8° / 1.5

Polycarbosilane intermediate
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[133941-26-1]
HMIS: 3-1-1-X

O

5g ¥30,000

SIB1866.6

4-[BIS(TRIMETHYLSILYL)METHYL]PYRIDINEC12H23NSi2

Si

237.49HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[138761-45-2]
HMIS: 2-2-0-X

SiN

5g ¥68,700

SIB1867.0

BIS(TRIMETHYLSILYLMETHYL)SULFIDEC8H22SSi2

Si

S

Si

206.5088° / 21
Flashpoint: 65°C (149°F)

Intermediate for synthesis of 3,4-bis(trimethylsilyl)thiophene.1
Synthetic equivalent of (methylthio)methyl anion in fluoride-promoted reactions.2
1. Ye, X. et al. J. Org. Chem. 1997, 62, 1940.
2. Hosomi, A. et al. Synlett 1991, 557.
See also SIB1872.0, SIH6116.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[4712-51-0]
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

0.844

1.457

5g ¥36,300(215) 547-1015

www.gelest.com

219

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIB1868.0

BIS(TRIMETHYLSILYL)PEROXIDEHEXAMETHYLDISILPEROXANE

O

O

Si

O
O
F

Si

C6H18O2Si2
178.3835° / 35(>135° dec.)
0.829
TRANSFER ONLY WITH PLASTIC ORGANIC-BASED PIPETTES - DECOMPOSES >135°
Detonations reported during transfers w/ metal hypodermic needles.
Activation energy for homolytic cleavage: 134 kJ/moleFlashpoint: >100°C (>212°F)
Key reviews.1,2
Reagent for Bayer-Villiger oxidation of ketones.4
Epoxidizes olefins with methyltrioxorhenium.5
With NaH converts benzylic nitro compounds to corresponding carbonyls.6
Oxidizes pyridines to pyridine-n-oxides in presence of Rhenium catalyst.7
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 79-81.
2. Ricci, A. et al. in Advances in Silicon Chemistry; Larson, G., Ed.; JAI Press: Greenwich, Co,1996; 3, p 63.
3. Davies, A. G. Tetrahedron 2007, 63, 10385.
4. Suzuki, M. et al. J. Org. Chem. 1982, 47, 902.
5. Fenelli, S. U.S. Patent 5,633,391, 1997.
6. Snaki, S. et al. Synth. Commun. 1999, 29, 4321.
7. Copéret, C. et al. Tetrahedron Lett. 1998, 39, 761.
F&F: Vol. 15, p 41; Vol. 16, p 43; Vol. 20, p 51; Vol. 21, p 63, p 166.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5796-98-5]
HMIS: 3-3-2-X store <5°C
10g ¥26,300

SIB1868.6

HP

Si

BIS(TRIMETHYLSILYL)PHOSPHINE
C6H19PSi2
AIR TRANSPORT FORBIDDEN

Si

178.3660° / 16(-38°)

0.819

Flashpoint: 17°C (63°F)
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[15573-39-4]
HMIS: 4-4-1-X
10g inquire* includes zCYL-G-0025 mini-cylinder

SIB1869.5

Si

NH
2

BIS(TRIMETHYLSILYL) SEBACATEC16H34O4Si2

O
Si

245.56

Forms cationic surfactants
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[31024-65-4]
HMIS: 3-2-0-X

0.805

1.44310.925

1.4342

0.90

1.481

5g ¥42,700

SIB1870.0

OSi

BIS(3-TRIMETHYLSILYLPROPYL)AMINE
C12H31NSi2

346.61143° / 1
Flashpoint: 105°C (221°F)

Reacts with bis(acyl chlorides) to form polyanhydrides.1
1. Kricheldorf, H. et al. Makromol. Chem., Rapid Commun. 1990, 11, 83.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18408-42-9]
HMIS: 2-1-1-X

OO

25g ¥14,600

100g ¥35,300

SIB1871.0

PR

BIS(TRIMETHYLSILYL)SELENIDE
C6H18SeSi2 毒物

225.3458-9° / 11(-7°)

Review of synthetic utility.1
Intermediate for preparation of CdSe quantum dots.2
Forms luminescent red l-lll-lV quantum dots.3
Converts aldehydes to selenoaldehydes under n-BuLi catalysis.4

O

Si

Se

Si

R

H

+

Me3SiSeSiMe3

Se

n-BuLi (cat)
R

Se
H
R

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 82-83.
2. Murray, C. et al. J. Am. Chem. Soc. 1993, 115, 8706.
3. Allen, P. et al. J. Am. Chem. Soc. 2008, 139, 9240.
4. Segi, M. et al. J. Am. Chem. Soc. 1988, 110, 1976.
See also SIH6116.0, SIB1873.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4099-46-1]
HMIS: 4-3-1-X
1.0g ¥86,700*
5g ¥167,000** includes zCYL-HPS-0010 cylinder

BIS(TRIMETHYLSILYL)SULFIDE - see SIH6116.0 HEXAMETHYLDISILTHIANE

220

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.877

1.4540

SIB1872.0

S

N

Si

HEXAMETHYLDISILATELLURANE

Si

C6H18Si2Te5g ¥26,300

273.9874° / 11

Intermediate for CdTe quantum dots
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4551-16-0]
HMIS: 4-2-1-X
O,O’-BIS(TRIMETHYLSILYL)THYMINE
C11H22N2O2Si2

O(13-4°)

0.97

2.5g ¥88,300

270.48125-9° / 15

Intermediate for preparation of nucleosides
See also SIB1857.0, SIB1858.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7288-28-0]
TSCA
HMIS: 2-2-1-X(73-5°)

1.0g ¥16,400

SIB1876.0

N,O-BIS(TRIMETHYLSILYL)TRIFLUOROACETAMIDE
BSTFA

O

C8H18F3NOSi2

N

F
F

257.4045-50° / 15(-10°)
Flashpoint: 24°C (75°F)

Silylation reagent for preparing derivatives of amino acids.1
1. Stalling, D. et al. Biochem. Biophys., Res. Comm. 1968, 31, 616.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-3613[25561-30-2]
TSCA EC 247-103-9 HMIS: 3-3-1-X
25g ¥18,800

Si

0.969

100g ¥53,300

1.3840COMMERCIAL

Si

F

59-61° / 12Flashpoint: 45°C (113°F)

SIB1873.4

NO

Useful for the preparation of “molecular wire” - acyclic azathienes.
1. Zibarev, A. et al. Heteroat. Chem. 1990, 1, 443.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18156-25-7]
HMIS: 2-2-1-X

1

BIS(TRIMETHYLSILYL)TELLURIDE

N
Si

206.46

SIB1873.0

Te

Si

Si

2kg ¥275,000

SIB1878.0

N
H

C7H20N2OSi2

Si

N
H

204.42(222-4°)Silylation reagent with solid byproduct
F&F: Vol. 16, p 82.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3250[18297-63-7]
TSCA EC 242-177-9 HMIS: 2-2-1-X

50g ¥4,500

250g ¥19,800

10kg ¥245,000

SIB1878.2

Ph
Ph

m-BIS(TRIPHENYLSILYL)BENZENE
C42H34Si2
594.90
Fluorescence max: 350-375; phosphorescence max: 450
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
Ph[18920-16-6]
HMIS: 1-1-0-X

Ph

Si

Si

Ph

Ph

(237-240°)1.0g ¥72,400

SIB1878.4

1,4-BIS(VINYLDIMETHYLSILYL)BENZENE
C14H22Si2

PR
Si

Si

O

0.912

1.51200.872

1.4163

1.190

1.531

1.121

1.514

BORON VINYLDIMETHYLSILOXIDETRIS(VINYLDIMETHYLSILYL)BORATEO

Si

92° / 3Forms polycarbosilane polymers by reaction with dihydride functional silanes in presence of Pt
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[4519-17-9]
HMIS: 2-2-1-X
25g ¥51,200

AKB159.5

SiB

246.50SILICONSi

BSU

COMMERCIAL

N,N’-BIS(TRIMETHYLSILYL)UREAOCOMPOUNDSSiBIS(TRIMETHYLSILYL)SULFUR DIIMIDE, 95%
C6H18N2SSi2

O
O
F

N

C12H27BO3Si3

O

314.4178° / 15

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[383189-04-6]
HMIS: 2-2-1-X

Si

10g ¥22,300

SIB1878.6

SiBr(4-BROMOBENZYL)TRIMETHYLSILANE
C10H15BrSi

243.22

Flashpoint: 114°C (237°F)
Reagent for preparing polymer-bound, fluoride-labile benzydryl crosslinkers.1
1. Routledge, A. et al. Tetrahedron Lett. 1998, 38, 8287.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17095-20-4]
HMIS: 2-2-0-X
5g ¥61,800

SIB1879.0
Br

Si

4-BROMO-N,N-BIS(TRIMETHYLSILYL)ANILINEC12H22BrNSi2

Si

See also SIC2264.8
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[5089-33-8]
HMIS: 3-1-1-X

N

www.AZmax.co.jp

TEL: 03-5543-1630

316.40

Gelest, Inc.

141-2° / 12Flashpoint: >110°C (>230°F)
25g ¥42,700(215) 547-1015

www.gelest.com

221

Name

bp °C/mm

225.2082-4° / 12

(mp °C)

D420

nD20

1.175

1.4590

SIB1879.1

O

Br

Mw

4-BROMOBUTOXYTRIMETHYLSILANE
C7H17BrOSiSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18292-36-9]
HMIS: 3-3-1-X

5g ¥26,800

SIB1879.2
Br

Si

Cl

4-BROMOBUTYLDIMETHYLCHLOROSILANE
C6H14BrClSi

229.6290-5° / 7.5

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52112-26-2]
HMIS: 3-2-1-X

1.242

10g ¥48,000

SIB1879.5

5-BROMO-2-(t-BUTYLDIMETHYLSILYL)PYRIMIDINEC10H17BrN2Si

N
N

Cl

Br

Si

Cl

Cl
O

Br

Si

1.509

1.0g ¥32,400

SIB1879.6

4-BROMOBUTYLTRICHLOROSILANE
C4H8BrCl3Si

270.4551-2° / 0.5

See also SIB1906.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69858-29-3]
HMIS: 3-1-1-X

1.524

10g ¥28,900

4-BROMOBUTYLTRIMETHOXYSILANE
C7H17BrO3Si

257.2068-9° / 1

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[226558-82-3]
HMIS: 3-2-1-X

1.259

1.44371.669

1.4901

1.169525

1.449325

10g ¥32,600

SIB1880.0

Cl

2-BROMOETHYLTRICHLOROSILANE, 95%

Cl C2H4BrCl3Si

Si

Br

1.232

SIB1879.7

OO

273.25HYDROLYTIC SENSITIVITY: 6: forms irreversible hydrate[121519-00-4]
HMIS: 2-1-1-X

Si

O
O
F

Br

171-2°
Flashpoint: 40°C (104°F)
Undergoes β-elimination at elevated temperature to form bromotrichlorosilane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[63802-82-4]
HMIS: 3-2-1-X
10g ¥14,600

Cl

242.4050g ¥48,000

SIB1886.0

7-BROMOHEPTYLTRIMETHOXYSILANE
C10H23BrO3Si

O
Si

Br
O

299.2883-5° / 1

See also SIB1909.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

O

10g ¥26,300

SIB1890.0

BROMOMETHYLDIMETHYLCHLOROSILANE
C3H8BrClSi

Cl

130-1°
1.375
1.4650Flashpoint: 41°C (106°F)
Precursor to various bromomethylsilanes and their Grignard or Li derivatives
Review of synthetic utility.1
Modifies ITO electrodes allowing bonding of polyvinylpyridine.2
Forms oxasilacycles via a silylation/free-radical addition sequence. The resulting oxasilacycles can be oxidized and desilylated todiols.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 85-92.
2. Privman, M. et al. J. Am. Chem. Soc. 2009, 131, 1314.
3. Newlander, K. A. et al. J. Org. Chem. 1997, 62, 6726.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[16532-02-8]
TSCA EC 240-601-7 HMIS: 3-2-1-X
25g ¥20,400
100g ¥58,600

PR
Br

Si

Br

SIB1891.6

Cl

O

Si

[11-(2-BROMO-2-METHYL)PROPIONYLOXY]UNDECYLTRICHLOROSILANE
454.75

Cl C15H28BrCl3O2Si

11 Cl

O

187.54

168-9° / 0.3

1.221

Tethered initiator for ATRP on silicon surfaces.1
1. Matyjaszewski, K. et al. Macromolecules 1999, 32, 8716.
See also SIT8397.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[255727-67-4]
HMIS: 3-1-1-X
1.0g ¥26,300

SIB1892.0

Br

222

Si

BROMOMETHYLTRIMETHYLSILANE
C4H11BrSi

167.12

Intermediate for trimethylsilylmethanethiol.1
1. Noller, D. et al. J. Org. Chem. 1952, 17, 1393.; F&F: Vol. 11, p 576.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18243-41-9]
TSCA
HMIS: 3-4-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

116-7°
Flashpoint: 16°C (61°F)

1.170

10g ¥30,500(215) 547-1015

www.gelest.com

1.4460Enabling Your Technology
Name

Mw

bp °C/mm

284.4881-4° / 5

(mp °C)

D420

nD20

1.22225

1.446

1.175

1.511

SIB1894.0

Cl 5-BROMOPENTYLTRICHLOROSILANE

C5H10BrCl3Si

SiBr

Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents

Cl[174094-37-2]

5-BROMOPENTYLTRIMETHOXYSILANE
C8H19BrO3Si

O
Si

Br

10g ¥32,600

271.22110° / 1

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[773893-02-0]
HMIS: 3-2-1-X

OO

HMIS: 3-2-1-X

SIB1894.2

10g ¥28,900

SIB1895.0

p-BROMOPHENOXY(t-BUTYL)DIMETHYLSILANE
C12H19BrOSi

Si

137° / 25
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[67963-68-2]
HMIS: 3-2-1-X
5g ¥19,400

O

287.27O
O
F

Br

SIB1899.0(4-BROMOPHENYLETHYNYL)TRIMETHYLSILANE
C11H13BrSi

Si

Cl

1.192

10g ¥40,600

1.68

1.567

1.63225

1.53925

1.63225

1.53925

1.094

1.451

1.618

1.491

1.293

1.4400

SIB1904.0

Si

BROMOPHENYLTRIMETHOXYSILANE
C9H13BrO3Si
277.19Mixed isomers
γc of treated surface: 43.5 mN/m
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17043-05-9]
HMIS: 3-1-1-X

OO

136° / 13.5
Flashpoint: 105°C (221°F)
10g ¥14,600

50g ¥48,000

SIB1904.3

O

Si

O

O

p-BROMOPHENYLTRIMETHOXYSILANE
C9H13BrO3Si

277.19See also SIB1904.0, SIC2332.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17043-05-9]
HMIS: 3-1-1-X

136° / 13.5
Flashpoint: 105°C (221°F)
10g ¥24,100

50g ¥86,200

SIB1904.5

O

PR

Br

3-BROMOPROPOXY-t-BUTYLDIMETHYLSILANE
C9H21BrOSi

Si

253.25

See also SIB1939.52, SIC2335.0, SII6400.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[89031-84-5]
HMIS: 2-2-1-X

182°
Flashpoint: 85°C (185°F)

SILICONO

Br(61-3°)BROMOPHENYLTRICHLOROSILANE
C6H4BrCl3Si
290.45106-8° / 6
Mixed isomers
Flashpoint: >110°C (>230°F)
Cl
Forms high refractive index resins
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[27752-77-8]
HMIS: 3-1-1-X
25g ¥14,600

SiBr60-80° / 0.2

SIB1903.0

ClBr

253.22

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[16116-78-2]
HMIS: 2-2-0-X

COMPOUNDSBr

5g ¥24,700

SIB1905.0

Cl

Cl

Si

Br

Cl

3-BROMOPROPYLTRICHLOROSILANE
C3H6BrCl3Si

256.4385-6° / 16
Flashpoint: 88°C (190°F)

Used in electrode modification
See also SIB1879.6, SIC2405.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13883-39-1]
TSCA EC 237-650-1 HMIS: 3-2-1-X
25g ¥20,400

100g ¥58,600

SIB1906.0

O

Br

O

Si

O

F

Si
F

243.17130° / 45
Flashpoint: 82°C (180°F)
Forms self-assembled monolayers which can be modified with pyridine ligands.1
1. Paulson, S. et al. J. Chem. Soc., Chem. Commun. 1992, 21, 1615.
See also SIB1879.7
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2079[51826-90-5]
EC 257-453-4 HMIS: 2-2-1-X
10g ¥23,100

SIB1906.5
Cl 4-BROMO-3,3,4,4-TETRAFLUOROBUTYLTRICHLOROSILANE

F

Br
F

3-BROMOPROPYLTRIMETHOXYSILANE
C6H15BrO3Si

Cl

C4H4BrCl3F4Si

342.42

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl
HMIS: 3-2-1-X
5g ¥29,400

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TEL: 03-5543-1630

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223

Name
F

F
Si

F

(mp °C)

D420

nD20

1.351

1.4950

4-BROMO-3,3,4,4-TETRAFLUOROBUTYLTRIMETHOXYSILANE
C7H13BrF4O3Si
329.17OOF

bp °C/mm

SIB1906.7

O

Br

Mw

Building block for functional silanes with fluorinated spacer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

5g ¥28,900

BROMOTRIMETHYLSILANE - see SIT8430.0 TRIMETHYLBROMOSILANE

SIB1907.0

3-BROMO-1-(TRIMETHYLSILYL)-1-PROPYNE, 95%
C6H11BrSi

Si

Br

Cl

Si
11

44-5° / 2Flashpoint: 62°C (144°F)

Reagent for preparation of terminal conjugated enynes.1
Used to prepare homopropargylic and allenyl alcohols.2
1. Gibson, A. et al. Synthesis 1991, 5, 414.
2. Liu, M.-J.; Loh, T.-P. J. Am. Chem. Soc. 2003, 125, 13042.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[38002-45-8]
HMIS: 3-2-1-X

O
O
F

Br

191.155g ¥29,400

SIB1907.6

11-BROMOUNDECYLDIMETHYLCHLOROSILANE, 95%
C13H28BrClSi
327.80170° / 1
Contains undecyldimethylchlorosilane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[330457-42-6]
HMIS: 3-1-1-X
10g ¥24,100

1.03

SIB1907.8

H
Br

H

Si
11

H

11-BROMOUNDECYLSILANE
C11H25BrSi

265.31

100-2° / 0.5

Forms SAMs on titanium, gold and silicon surfaces.1
1. Arkles, B. et al. J. Adhes. Sci. Technol. 2012, 26, 41.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[469904-33-4]
HMIS: 2-3-1-X

1.02

5g ¥42,200

SIB1908.0

Cl
Br

Cl

Si

Cl

11

11-BROMOUNDECYLTRICHLOROSILANE, 95%
C11H22BrCl3Si
368.64172° / 1
Contains undecyltrichlorosilane
Treated surface contact angle, water: 91°
Self-assembled monolayers attach/orient polymer films.1
1. Menzel, H. et al. Gummi. Fasern. Kunstst. 1997, 50, 288.
See also SIB1909.0, SIC2427.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[79769-48-5]
HMIS: 3-1-1-X
10g ¥22,500

1.26

SIB1909.0

O
Br

O

Si
O

PR

11

11-BROMOUNDECYLTRIMETHOXYSILANE, 95%
C14H31BrO3Si
355.39Contains undecyltrimethoxysilane
See also SIB1886.0, SIC2429.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17947-99-8]
HMIS: 2-1-0-X

158° / 0.8

1.119

1.4559

1.163

1.458

10g ¥24,700

SIB1910.0

1-BROMOVINYLTRIMETHYLSILANE
C5H11BrSi

Br

179.1355-7° / 80Flashpoint: 15°C (59°F)

Employed in cyclopentene annulations
Review of synthetic utility.1
Starting material for preparation of α-trimethylsilylvinylketone.2
Starting material for preparation of trisubstituted olefins.3
Potential for cross-coupling protocols to yield α-substituted vinylsilanes.4
Reacts with dichlorocarbene followed by fluoride-promoted elimination to formcyclopropenes.5

Br

SiMe3

Si

Cl3CO2NaCl

glyme-diglyme
90°

Cl
SiMe3

TBAF

Br

Cl
Br

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 109-110.
2. Stork, G. et al. J. Am. Chem. Soc. 1973, 95, 6152.
3. Miller, R. et al. J. Org. Chem. 1979, 44, 4623.
4. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
5. Billups, W. E. et al. Tetrahedron Lett. 1984, 25, 3935.
F&F: Vol. 7, p 193; Vol. 8, p 56, p 515; Vol. 9, p 56; Vol. 10, p 442; Vol. 11, p 286.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[13683-41-5]
EC 237-195-9 HMIS: 2-4-1-X
5g ¥36,900

224

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(215) 547-1015

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Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.167

1.467

1.05

1.4495

SIB1910.1

2-BROMOVINYLTRIMETHYLSILANE

Br

2-(TRIMETHYLSILYL)VINYLBROMIDE

C5H11BrSi
179.1350-1° / 52
Contains 10-15% cis-isomerFlashpoint: 29°C (84°F)
Slowly decomposes above 60° yielding ethylene
Potential for cross-coupling protocols to yield β-substituted vinylsilanes.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
F&F: Vol. 11, p 82.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[41309-43-7]
HMIS: 2-3-1-X
5g ¥26,800

Si

BSA - see SIB1846.0 N,O-BIS(TRIMETHYLSILYL)ACETAMIDESIB1926.0

Cl
Si

O
O
F

Cl

3-BUTENYLMETHYLDICHLOROSILANE
C5H10Cl2Si
169.13143-5°
Mixed isomers - primarily internal cis/trans
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15983-86-5]
HMIS: 3-3-1-X
10g ¥19,400

SIB1927.2(E)-2-BUTENYLTRICHLOROSILANE(E)-CROTYLTRICHLOROSILANE

C4H7Cl3Si

189.54

142°

1.20

1.455

1.20

1.455

Cl
Si

Cl

Cl

COMPOUNDS

Converted to chiral reagent for the enantioselective crotylation of aldehydes.1

1. Kim, H.; Ho, S.; Leighton, J. L. J. Am. Chem. Soc. 2011, 133, 6517.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[52885-13-9]
HMIS: 3-3-1-X
2.5g ¥78,800

SIB1927.4(Z)-2-BUTENYLTRICHLOROSILANE(Z)-CROTYLTRICHLOROSILANE

C4H7Cl3Si

189.54

142°

Cl
Si
Cl

PR

Cl

SILICON

Converted to chiral reagent for the enantioselective crotylation of aldehydes.1

1. Kim, H.; Ho, S.; Leighton, J. L. J. Am. Chem. Soc. 2011, 133, 6517.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[49749-84-0]
HMIS: 3-3-1-X
2.5g ¥78,800

SIB1928.0

O

O

Si

O

3-BUTENYLTRIETHOXYSILANE, 95%
C10H22O3Si
Mixed isomers (mainly 3-butenyl)

218.37

See also SIA0525.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[57813-67-9]
HMIS: 2-2-1-X

64° / 6(-80°)
0.90
Flashpoint: 73°C (163°F)
TOXICITY: oral rat, LD50: >5,000 mg/kg
25g ¥36,300

SIB1930.0

SiO

3-BUTENYLTRIMETHYLSILANE
C7H16Si

128.29112-3°

Homoallylic silane
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[763-13-3]
HMIS: 2-4-0-X

10g ¥25,700

0.73

1.410227

0.761

1.391350g ¥92,600

SIB1932.0

Si

t-BUTOXYTRIMETHYLSILANE
C7H18OSi

146.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[13058-24-7]
HMIS: 2-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

104°
Flashpoint: 14°C (57°F)
25g ¥14,600(215) 547-1015

www.gelest.com

225

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIB1932.2
Si

N
H

O

O

235.40102° / 3.5
0.947
1.424625
Flashpoint: 110°C (230°F)
Reacts with isocyanate resins (urethanes) to form moisture cureable systems
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[31024-56-3]
TSCA EC 250-437-8 HMIS: 2-1-1-X
25g ¥6,600
2kg ¥72,300
17kg ¥318,000

COMMERCIAL

n-BUTYLAMINOPROPYLTRIMETHOXYSILANE
C10H25NO3Si

O

SIB1932.3

t-BUTYLAMINOPROPYLTRIMETHOXYSILANE
C10H25NO3Si

O
Si

N
H

O

O

235.4098-9° / 3

See also SIC2464.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[174219-86-4]
HMIS: 2-2-1-X

0.924

1.4208

0.941

1.438

0.921

1.41570.87511.42055g ¥29,400

SIB1932.4

SiO

203.3663-71° / 3
Flashpoint: 85°C (185°F)

O
O
F

O

N-n-BUTYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
C9H21NO2Si

Coupling agent for nanoparticles.1
Interlayer bonding agent for anti-reflective lenses.2
1. Arkles, B. et al. In Silanes and Other Coupling Agents; Mittal, K., Ed.; 2004; Vol. 3, p.179.
2. Su, K. et al. U.S. Patent Appl. 2012 2672,790, 2012.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[618914-44-6]
TSCA
HMIS: 3-2-1-X
25g ¥22,500

N

SIB1932.5

O
Si

O

Si

Si

O

O
4

Cl
Si

Cl

140-2° / 1

10g ¥28,900

SIB1932.8

t-BUTYL(DICHLOROMETHYL)DIMETHYLSILANE
C7H16Cl2Si

199.2070° / 20

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[138983-08-1]
HMIS: 3-3-0-X store <5°C

(42-5°)

2.5g ¥48,000

SIB1933.0

ClSi[2-(9-BUTYLDECAMETHYLPENTASILOXANYL)ETHYL]TRIETHOXYSILANE
C22H58O7Si6
603.21
Contains isomers
Phase collapse resistant bonded phase
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

H

Cl

t-BUTYLDICHLOROSILANE
C4H10Cl2Si

157.11

108-9°
Flashpoint: 5°C (41°F)

Sterically hindered hydrosilylation reagent
See also SII6452.3, SIP6725.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[85121-42-2]
HMIS: 3-4-1-X
5g ¥28,600

SIB1934.0

n-BUTYLDIMETHYLCHLOROSILANE

PRSi

Cl C6H15ClSi

150.72

138°
Flashpoint: 39°C (102°F)

Forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[1000-50-6]
TSCA
HMIS: 3-2-1-X
25g ¥16,200

100g ¥44,800

SIB1935.0

SiCl

150.72

124-6°(87-90°)0.830
Flashpoint: 22°C (72°F)
Autoignition temperature: 405˚C
Silylation reagent - derivatives resistant to Grignards, alkyl lithium compounds, etc.
Blocking agent widely used in prostaglandin synthesis
F&F: Vol. 4, p 57, p 176; Vol. 5, p 74; Vol. 6, p 78; Vol. 8, p 58; Vol. 9, p 77; Vol. 10, p 62; Vol. 11, p 88; Vol. 12, p 83.
See also SIB1967.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18162-48-6]
TSCA EC 242-042-4 HMIS: 3-4-1-X
25g ¥8,300
100g ¥20,300
2kg ¥191,400

Si

Cl

t-BUTYLDIMETHYLCHLOROSILANE, 1.0M in methylene chloride, 12.2-12.4% solution
C6H15ClSi
150.72
124-6°
1.225
Flashpoint: 57°C (136°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2041[18162-48-6]
TSCA EC 242-042-4 HMIS: 3-2-1-X
100g ¥17,800
2.5kg ¥116,100

Si

Cl

t-BUTYLDIMETHYLCHLOROSILANE, 3M in tetrahydrofuran, 51-52% solution
C6H15ClSi
150.72
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2041[18162-48-6]
TSCA EC 242-042-4 HMIS: 3-4-1-X

226

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TEL: 03-5543-1630

Gelest, Inc.

0.872

Flashpoint: -14°C (7°F)
100g ¥18,600(215) 547-1015

2kg ¥99,900

www.gelest.com

COMMERCIAL

SIB1935.4

COMMERCIAL

SIB1935.2

COMMERCIAL

t-BUTYLDIMETHYLCHLOROSILANE
C6H15ClSi
Vapor pressure, 100°: 476 mm

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.866

1.460

0.772

1.422

0.79

1.401

0.71

1.402625

0.701

1.40050.840

1.4240

0.915

1.432

0.893

1.43000.89925

1.431325

Si

Cl

t-BUTYLDIMETHYLCHLOROSILANE, 2.85M in toluene, 48-52% solution
C6H15ClSi
150.72
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2041[18162-48-6]
TSCA EC 242-042-4 HMIS: 3-4-1-X

Flashpoint: 4°C (39°F)
100g ¥19,400

COMMERCIAL

SIB1935.5

2kg ¥99,900

SIB1937.0

n-BUTYLDIMETHYL(DIMETHYLAMINO)SILANE
C8H21NSiSi
NOHighly reactive reagent for bonded phases without acidic byproduct
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[181231-67-4]
TSCA
HMIS: 3-3-1-X

47-9° / 12Flashpoint: 26°C (79°F)
10g ¥15,400

50g ¥53,800

SIB1937.3

n-BUTYLDIMETHYLMETHOXYSILANE
C7H18OSi

146.30

135°

O
O
F

Si

159.35HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[64712-50-1]
HMIS: 3-3-1-X

10g ¥15,400

SIB1937.5

n-BUTYLDIMETHYLSILANESi

H C6H16Si

116.28

Silane reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1001-52-1]
HMIS: 2-4-1-X

101-2°
Flashpoint: -6°C (21°F)
25g ¥20,700

t-BUTYLDIMETHYLSILANE
C6H16SiSi

H

116.28

Silane reducing agent
Silylates phenols in presence of tris(pentafluorophenyl)borane.1
Precursor for SiC thin films by supersonic jet epitaxy.2
1. Blackwell, J. M. et al. J. Org. Chem. 1999, 64, 4887.
2. Boo, J. et al. Thin Solid Films 1998, 324, 124.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[29681-57-0]
HMIS: 2-4-1-X

81-3°
(13°)
Flashpoint: -11°C (12°F)
Autoignition temperature: 290˚C

5g ¥13,500

COMPOUNDSSIB1938.0

25g ¥43,800

Si

OH

t-BUTYLDIMETHYLSILANOL
C6H16OSi

132.28140°Flashpoint: 45°C (113°F)

Stable silanol
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18173-64-3]
HMIS: 2-2-0-X

5g ¥19,400

SILICON

SIB1939.0

25g ¥67,100

SIB1939.3

t-BUTYLDIMETHYLSILOXYACETALDEHYDE, 90%
C8H18O2Si
174.31
156-7°
Stabilized
Flashpoint: 60°C (140°F)
Employed in high ee synthetic reactions.1
1. Colbert, F. Eur. J. Org. Chem. 2006, 8, 1117
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[102191-92-4]
HMIS: 3-3-1-X
1.0g ¥17,800

Si

O

PR

O

5g ¥60,700

SIB1939.35

OSi

1-(t-BUTYLDIMETHYLSILOXY)-1,3-BUTADIENE, 95%
C10H20OSi

184.36

76-9° / 12

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[88346-87-6]
HMIS: 2-2-1-X

5g ¥67,100

SIB1939.5

OSi

4-(t-BUTYLDIMETHYLSILOXY)BUTYNE
C10H20OSi

184.3570-4° / 10
Flashpoint: 58°C (136°F)

Protected butynol
Potential for the synthesis of silyl-protected butynol derivatives.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[78592-82-2]
HMIS: 2-3-1-X

10g ¥22,000

SIB1939.52

Cl

O

Si

1-(t-BUTYLDIMETHYLSILOXY)-3-CHLOROPROPANE
C9H21ClOSi

208.80See also SIC2335.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[89031-82-3]
HMIS: 2-2-1-X

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TEL: 03-5543-1630

Gelest, Inc.

70-2° / 810g ¥26,300(215) 547-1015

www.gelest.com

227

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.969

1.454

0.935

1.455

0.8908

1.430

0.898

1.46341.001

1.47290.892

1.4350

SIB1939.55

OO

2-(t-BUTYLDIMETHYLSILOXY)CYCLOHEXANONEC12H24O2Si

Si

228.40HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[74173-08-3]
HMIS: 2-2-1-X

55-9° / 0.05
Flashpoint: 93°C (199°F)
5g ¥13,800

SIB1939.57
OO

6-(t-BUTYLDIMETHYLSILOXY)-3,4-DIHYDRO-2H-PYRAN
C11H22O2Si

Si

214.38HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[130650-09-8]
HMIS: 2-2-1-X

130-5° / 30
Flashpoint: 80°C (177°F)
1.0g ¥25,200

SIB1939.58

2-(t-BUTYLDIMETHYLSILOXY)ETHANOLETHYLENEGLYCOL, MONO-t-BUTYLDIMETHYLSILYL ETHERHO

C8H20O2Si

Si

176.3372-4° / 10

O
O
F

O

Decomposes >80˚C
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[102229-10-7]
HMIS: 3-2-1-X

10g ¥23,100

SIB1939.59

2-(t-BUTYLDIMETHYLSILOXY)ETHYLBROMIDE(2-BROMOETHOXY)-t-BUTYLDIMETHYLSILANE

OBr

C8H19BrOSi

Si

239.23

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[86864-60-0]
HMIS: 2-3-0-X

40-45° / 0.05
Flashpoint: 55°C (131°F)
10g ¥34,200

SIB1940.0

2-(t-BUTYLDIMETHYLSILOXY)PENT-2-EN-4-ONE
C11H22O2Si

O

O

Si

214.38Silylation reagent for alcohols under neutral or acidic conditions.1
Employed in preparative silylation of nucleotides.2
1. Veysoglu, T. et al. Tetrahedron Lett. 1981, 22, 1299.
2. Bigge, C. et al. J. Org. Chem. 1981, 46, 1994.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69404-97-3]
HMIS: 3-2-1-X

59-63° / 0.06
Flashpoint: 73°C (163°F)

5g ¥20,400

SIB1939.6

HO

4-(t-BUTYLDIMETHYLSILOXY)PHENOL
C12H20O2Si

O
Si

224.37(60-4°)HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[108534-47-0]
HMIS: 3-2-1-X

5g ¥33,700

SIB1939.65

O

Si
O

Si

328.55130° / 0.6

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

PR

O

O

4-(t-BUTYLDIMETHYLSILOXY)PHENYLTRIMETHOXYSILANE
C15H28O4Si2

2.5g ¥51,200

SIB1939.7

HOO

3-(t-BUTYLDIMETHYLSILOXY)PROPAN-1-OL
C9H22O2Si

Si

190.36

Allows selective one-sided reaction chemistry of propanediol
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[73842-99-6]
HMIS: 2-2-1-X

110° / 6
Flashpoint: 92°C (198°F)
5g ¥35,500

SIB1940.6

Li

O

Si

3-(t-BUTYLDIMETHYLSILOXY)-1-PROPYLLITHIUM, 1M in cyclohexane - 20-23 wgt%
C9H21LiOSi
180.29Flashpoint: -18°C (0°F)
Initiates “living” polymerizations
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[97057-70-0]
HMIS: 3-4-1-X store <5°C
50g ¥130,700

0.800

SIB1941.0p-(t-BUTYLDIMETHYLSILOXY)STYRENE
C14H22OSiSiO

234.4180° / 0.075

Undergoes radical1,2 and anionic polymerization.3,4,5
1. Packirisamy, S. et al. J. Polym. Sci., Part A: Polym. Chem. 1989, 27, 2811.
2. Xu, Y. et al. Polymer 1991, 32, 3103.
3. Hirao, A. et al. Makromol. Chem., Rapid Commun. 1982, 3, 941.
4. Hirao, A. et al. Makromol. Chem. 1985, 186, 1157.
5. Ito, H. et al. Polym. Mater. Sci. Eng. Preprints 1993, 68, 12.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[84494-81-5]
HMIS: 2-2-0-X

0.922

10g ¥46,900

t-BUTYLDIMETHYLSILYLCHLORIDE - see SIB1935.0 t-BUTYLDIMETHYLCHLOROSILANE

228

www.AZmax.co.jp

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Gelest, Inc.

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1.5091

Enabling Your Technology
Name

Mw

bp °C/mm

300.45138° / 0.4(mp °C)

D420

nD20

SIB1955.0(t-BUTYLDIMETHYLSILYL)DIPHENYLPHOSPHINE, 95%
C18H25PSi
P

1.103

Phosphinates olefins in presence of Bu4NF.1
1. Hayashi, M. et al. Tetrahedron Lett. 2004, 45, 9167.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[67187-53-6]
HMIS: 3-3-1-X store <5°C
2.5g ¥51,200

Si

SIB1963.0

O-(t-BUTYLDIMETHYLSILYL)HYDROXYLAMINE, 95%
C6H17NOSiO

NH2

154-7°(63-4°)
Flashpoint: 54°C (129°F)

Review of synthetic utility.1
Reacts with aldehydes and ketones to form protected oximes.2
Can be used to generate nitrosoalkenes in the absence of nucleophiles.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 124-125.
2. Denmark, S. E. et al. J. Org. Chem. 1984, 49, 4741.
3. Denmark, S. E.; Dappen, M. S. J. Org. Chem. 1984, 49, 798.
F&F: Vol. 2, p 85.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[41879-39-4]
HMIS: 3-2-1-X
10g ¥62,900

O
O
F

Si

147.29SIB1964.0

182.34Silylating agent
See also SIB1966.5, SIT8590.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[54925-64-3]
EC 259-398-1 HMIS: 2-1-1-X

NN53° / 0.2
Flashpoint: 99°C (210°F)

0.939

1.48001.0g ¥20,400

SIB1965.0

t-BUTYLDIMETHYLSILYLNITRILE

t-BUTYLDIMETHYLSILYLCYANIDE
C7H15NSi
劇物

141.29163-5°(76-8°)
Flashpoint: 45°C (113°F)

Review of synthetic utility.
Opens epoxides yielding t-butyldimethylsilyl protected β-isonitrile alcohols.2
Forms TBS-protected cyanohydrins in good yields.3
1

Si

N

N

CHO

+

t-BuMe2SiCN

KCN, 18-C-6

CH2Cl2, rt, 0.5 h
84%

N

OTBS

CN

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 120.
2. Gassman, P. et al. J. Org. Chem. 1986, 51, 5010.
3. Golinski, M. et al. J. Org. Chem. 1993, 58, 159.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[56522-24-8]
HMIS: 4-2-1-X
10g ¥32,600

PR

SIB1966.0

FF

N-(t-BUTYLDIMETHYLSILYL)-N-METHYLTRIFLUOROACETAMIDE
C9H18F3NOSi
241.33

O

Si

N

F

168-70°Flashpoint: 52°C (126°F)

1.023

COMPOUNDSSiSILICON

1-(t-BUTYLDIMETHYLSILYL)IMIDAZOLE
C9H18N2Si

1.4020Silyl protecting agent
Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 125-127.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[77377-52-7]
HMIS: 3-3-1-X
5g ¥26,800

SIB1966.3

t-BUTYLDIMETHYLSILYL-N-PHENYLBENZIMIDATEC19H25NOSi

Si

O

N

O

(71°)

5g ¥46,900

SIB1966.5

ON

311.49Silylation reagent.1
1. Tanabe, Y. et al. J. Chem. Soc., Chem. Commun. 2002, 1628
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[404392-70-7]
HMIS: 2-2-1-X

Si

N-(t-BUTYLDIMETHYLSILYL)PHTHALIMIDEC14H19NO2Si

261.39HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[79293-84-8]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

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(115-9°)5g ¥36,300(215) 547-1015

www.gelest.com

229

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.151

1.3848SIB1967.0

t-BUTYLDIMETHYLSILYLTRIFLUOROMETHANESULFONATE
C7H15F3O3SSi

O

F
F

O

S
F

264.33SiO65° / 10
Flashpoint: 36°C (97°F)

Review of synthetic utility.
Powerful silylation reagent and Lewis acid.2
Excellent promoter for gylcosidations, especially for trichloroacetimidates.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 127-135.
2. Review: Simchen, G. Advances in Silicon Chemistry; JAI Press: Greenwich, Co, 1991; Larson, G. L. Ed., Vol. 1, 189.
3. Roush, W. R. et al. Org. Lett. 1999, 1, 891; and Roush, W. R.; Narayan, S. Org. Lett. 1999, 1, 899.
F&F: Vol. 10, p 63; Vol. 12, p 86; Vol. 13, p 50, p 329; Vol. 15, p 54; Vol. 17, p 55.
See also SIT8335.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[69739-34-0]
EC 274-102-0 HMIS: 3-3-1-X
10g ¥18,800
50g ¥65,000
1

t-BUTYLDIMETHYLVINYLSILANE - See SIV9063.0 VINYL-t-BUTYLDIMETHYLSILANE

OOF

SIB1968.0

t-BUTYLDIPHENYLCHLOROSILANE
C16H19ClSi

90° / 0.015
Flashpoint: 112°C (234°F)
Vapor pressure, 100°: 0.02 mm

1.074

1.5680Blocking agent
Review of synthetic utility.1
Due to steric bulk can be converted to α-silyl aldehydes,2 which can be converted to olefins with high stereoselectivity.3
TBDPS
TBDPS
n-BuLi, THF
KH, THF
OH
Ph
Ph
Ph
CHO
30°, 90%-78°, 85%
Bu-n
Bu-n
Z:E = 97:3
BF3•OEt2
Bu-n
Ph
CH2Cl2, 0°, 87%

Cl

COMMERCIAL

Si

274.87

E:Z = 99:1

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 135-138.
2. Barbero, A. et al. J. Chem. Soc., Perkin Trans 1 1995, 1525.
3. Barbero, A. et al. Synthesis 2000, 1223.
F&F: Vol. 6, p 81; Vol. 12, p 81.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[58479-61-1]
TSCA EC 261-282-0 HMIS: 3-1-0-X
10g ¥5,000
50g ¥15,600
2kg ¥295,000

SIB1969.0

Si

t-BUTYLDIPHENYLMETHOXYSILANE
C17H22OSiO

270.45HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76358-47-9]
HMIS: 3-1-1-X

84-6° / 0.1(48-50°)Flashpoint: >110°C (>230°F)
10g ¥13,000

50g ¥41,600

SIB1971.0

t-BUTYLISOPROPYLDIMETHOXYSILANE
C9H22O2Si

PR

O

Si

190.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[109144-59-4]
HMIS: 3-2-1-X

O75° / 200.871

1.41891.0424

1.43121.0g ¥45,900

SIB1972.0

Cln-BUTYLMETHYLDICHLOROSILANE
C5H12Cl2Si

Si

Cl171.14148°
Flashpoint: 30°C (86°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18147-23-4]
TSCA EC 242-035-6 HMIS: 3-3-1-X
10g ¥15,600

SIB1972.2

Cl

Si

t-BUTYLMETHYLDICHLOROSILANE
C5H12Cl2Si

Cl

171.14130-2°(88-90°)Flashpoint: 26°C (79°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18147-18-7]
TSCA EC 242-034-0 HMIS: 3-3-1-X
5g ¥27,100

SIB1972.5Si230

p-(t-BUTYL)PHENETHYLDIMETHYLCHLOROSILANEH ClSi254.87122-3° / 2
14 23
Contains ~5% meta isomer, mixed α, β isomers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[93502-75-1]
HMIS: 3-2-1-X
25g ¥25,200

Cl C

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.95

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIB1973.0

Cl
Si

Cl

Cl

p-(t-BUTYL)PHENETHYLTRICHLOROSILANE
C12H17Cl3Si
295.71
124-9° / 2.5
Contains ~5% meta isomer, mixed α, β isomers
Flashpoint: 108°C (226°F)
For bonded phase HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[211925-40-5]
HMIS: 3-2-1-X
25g ¥24,100

1.16

SIB1974.0

Cl

t-BUTYLPHENYLDICHLOROSILANE
C10H14Cl2Si

126° / 25
Flashpoint: 83°C (181°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17887-41-1]
TSCA EC 241-835-2 HMIS: 3-2-1-X
5g ¥28,400

SiCl233.21

1.106

1.515

0.925

1.4124

SIB1974.2
O

O

Si

3-6

O

O

H

ω-BUTYLPOLY(DIMETHYLSILOXANYL)ETHYLTRIETHOXYSILANE, tech-95
600 - 850
5-8 (Me2SiO)
Hydrophobic surface treatment
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

25g ¥25,700

SIB1974.5

H n-BUTYLSILANE

Si

C4H12Si

H

88.22

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1600-29-9]
HMIS: 2-4-1-X

56-7°(-138°)

0.678

1.3922

0.782

1.3982525g ¥52,200

Cln-BUTYL-1,1,3,3-TETRAMETHYLDISILOXANE
C8H22OSi2Si

H Reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[12163-51-2]
TSCA
HMIS: 2-3-1-X

Cl

25g ¥10,300

2kg ¥164,200

Cl n-BUTYLTRICHLOROSILANEC H Cl Si

191.56142-3°
1.16083
Vapor pressure, 31°: 10 mm
Flashpoint: 45°C (113°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[7521-80-4]
TSCA EC 231-381-3 HMIS: 3-2-1-X
25g ¥14,600
100g ¥39,500
4

Cl

Si

153°

SIB1982.0

SiCl

190.439

1.4364

SIB1985.0

Cl

t-BUTYLTRICHLOROSILANE
C4H9Cl3Si

191.56142-3°(97-100°)
Flashpoint: 40°C (104°F)

1.16081.436

0.88831.40110.9312

1.3979Forms silanetriol
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18171-74-9]
TSCA EC 242-059-7 HMIS: 3-2-1-X
10g ¥16,200

iso-BUTYLTRICHLOROSILANE - see SII6453.0 ISOBUTYLTRICHLOROSILANE
iso-BUTYLTRIETHOXYSILANE - see SII6453.5 ISOBUTYLTRIETHOXYSILANE
iso-BUTYLTRIMETHOXYSILANE - see SII6453.7 ISOBUTYLTRIMETHOXYSILANE

SIB1986.0

n-BUTYLTRIETHOXYSILANE
C10H24O3Si

O

Si

O

O

O

n-BUTYLTRIMETHOXYSILANE
C7H18O3SiOO

25g ¥19,900

178.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[1067-57-8]
TSCA EC 213-936-1 HMIS: 3-2-1-X

164-5°
Flashpoint: 49°C (120°F)
25g ¥14,600

100g ¥39,500

SIB1989.0

O

Si

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4781-99-1]
HMIS: 2-2-1-X

192-3°
Flashpoint: 63°C (145°F)

SIB1988.0

OSi

220.38SILICONSi

COMMERCIAL

SIB1977.0

O

COMPOUNDS

Si

O
O
F

O

Si

PR

Si

O

t-BUTYLTRIMETHOXYSILANE
C7H18O3Si

178.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18395-29-4]
HMIS: 3-2-1-X

140-1°

0.903

1.394110g ¥41,400

BUTYNEDIOIC ACID derivatives - see SIB1852.0 BIS(TRIMETHYLSILYL)ACETYLENEDICARBOXYLATECALCIUM BOROSILICATE - see SID2605.0 DATOLITE

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

231

Name

Mw

bp °C/mm(mp °C)

D420

nD20

CaO3Si116.16(1,540°)2.69
Median particle size: 5-6 μm
Mohs hardness: 4.5-5
32
Typical bulk density, not compacted: 0.14 g/cm
Surface area: 2 m /g
ΔHform: -1,585 kJ/mole
Aspect ratio: ~12:1
Coefficient of thermal expansion: 6.5 x 10-6
Solubility, water: 0.95 g/l
Single chain silicate
Reinforcing filler for thermoplastics
Undergoes transition to pseudowollastonite at 1,200˚
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[13983-17-0]
TSCA EC 237-772-5 HMIS: 1-0-0-X
500g ¥7,400
2.5kg ¥17,400

1.62-1.64

SIC2050.0

CALCIUM METASILICATEWOLLASTONITE

O
-O

Si
OCa++

SIC2054.0

CALCIUM SILICIDE, tech-95, powder
CaSi2
96.25
Contains 3-5% Fe
Typical bulk density, not compacted: 0.87 g/cm3
Hydrolytic deposition of calcium silicide followed by extraction of calcium ions yields siloxene
Siloxene occurs in 2 photoluminescent forms.1

O
O
F

2.5

1. Harle, W. et al. In “Tailor-made Silicon-Oxygen Compounds”; Corriu, R. et al. Ed.; Vieweg: 1995; p99.
F&F: Vol. 6, p 510.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid(既) 1-1044[12013-56-8]
TSCA EC 234-588-7 HMIS: 1-1-1-X
250g ¥11,900

SIC2056.2(-)-CAMPHANYLDIMETHYLCHLOROSILANE

Si

2,2-DIMETHYL-3-(CHLORODIMETHYLSILYLMETHYL)BICYCLOHEPTANE

C12H23ClSi

Cl

230.85

Optically active blocking agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[684284-12-6]
HMIS: 3-2-1-X

10g ¥26,800

SIC2058.2

3-CARBAZOLYLPROPYLTRIETHOXYSILANE
C21H29NO3Si

N

O
Si
O

PR

O

371.55For non-linear optic materials
Employed in OLED fabrication.1
1. DeMais, T. et al. SPIE Proc. 1998, 3476, 338
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[221105-38-0]
HMIS: 2-2-1-X

185-195° / 0.3

1.072

1.552725

0.950

1.448325

0.903

1.43992.5g ¥67,100

SIC2065.0

10-(CARBOMETHOXY)DECYLDIMETHYLCHLOROSILANE
C14H29ClO2Si

O

O

Si

292.92133° / 0.3
Flashpoint: 105°C (221°F)

Long chain organofunctional silane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[53749-38-5]
HMIS: 3-1-1-X
10g ¥15,600

Cl50g ¥52,200

SIC2067.0

O

10-(CARBOMETHOXY)DECYLDIMETHYLMETHOXYSILANE
C15H32O3Si

O

O

Si

288.50Long chain organofunctional silane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1211488-83-3]
HMIS: 2-1-1-X

130° / 0.3

10g ¥17,000

50g ¥57,500

SIC2067.6

O

Cl

O

Si

Cl

O

Cl

O

Si
Cl

232

Cl

10-(CARBOMETHOXY)DECYLTRICHLOROSILANE
C12H23Cl3O2Si

333.75HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4211-29-4]
HMIS: 3-2-1-X

133-6° / 0.3

1.1

10g ¥25,200

SIC2068.0

2-(CARBOMETHOXY)ETHYLMETHYLDICHLOROSILANE, tech-95
C5H10Cl2O2Si
201.1298-9° / 25
Contains ~ 20% 1-(carbomethoxy)ethylmethyldichlorosilane isomerFlashpoint: 52°C (126°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18163-42-3]
TSCA
HMIS: 3-2-1-X
25g ¥26,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.18725

www.gelest.com

1.443925

Enabling Your Technology
Name

bp °C/mm(mp °C)

D420

nD20

C4H7Cl3O2Si
221.5490-2° / 25
1.325
Contains ~ 20% 1-(carbomethoxy)ethyltrichlorosilane isomerFlashpoint: >43°C (>110°F)
See also SIC2067.6
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18147-81-4]
TSCA EC 242-036-1 HMIS: 3-3-1-X
25g ¥16,200
100g ¥44,800

1.448

SIC2070.0O

2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE, tech 95
METHYL (3-TRICHLOROSILYLPROPIONATE)

Cl

O

Si

Cl

Cl

SIC2072.0

O

2-(CARBOMETHOXY)ETHYLTRIMETHOXYSILANE

O
Si
O
O

HO

METHYL (3-TRIMETHOXYSILYLPROPIONATE)

C7H16O5Si
208.29Contains ~ 20% 1-(carbomethoxy)ethyltrimethoxysilane isomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76301-00-3]
HMIS: 3-3-1-X

O

ONa+

1.069

1.410

10g ¥26,800

SIC2263.0

Na+

O-

Si

75° / 1.5
Flashpoint: >43°C (>110°F)

CARBOXYETHYLSILANETRIOL, DISODIUM SALT, 25% in water
C3H6Na2O5Si
196.14
pH: 12 - 12.5
In combination with aminofunctional silanes forms amphoteric silicas.1
1. Han, L. et al. Chem. Mater. 2007, 19, 2860.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[18191-40-7]
HMIS: 2-0-0-X

O
O
F

O

HO

Mw

1.1702525g ¥15,400

100g ¥42,100

SIC2264.0

S
O

Si
Si

N
Ce

N
Si

2-(CARBOXYMETHYLTHIO)ETHYLTRIMETHYLSILANE, 95%(TRIMETHYLSILYLETHYL)THIOACETIC ACIDSi

C7H16O2SSi
192.35143-4° / 7Contains 1-(carboxymethylthio)ethyltrimethylsilane
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18269-42-6]
HMIS: 2-1-0-X
10g ¥14,600

1.013

1.4811COMPOUNDSHO

SIC2264.6

Si

CERIUM(III) TRIS[BIS(TRIMETHYLSILYL)AMIDE]
CERIUM(lll) TRIS(HEXAMETHYLDISILAZIDE)NSi

C18H54CeN3Si6

Si

621.2895-9° / 10-4 sub.

(132-9°)Precursor for SrS:Ce thin film blue phosphors by CVD.1
1. Rees, W. et al. Chemical Aspects of Electronic Ceramic Processing, MRS Proc. 1998, 495, 83.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[41836-21-9]
HMIS: 3-2-1-X
5g ¥77,700

SILICONCHIRAL SILANES - see SIC2056.2, SID4074.0, SIM6472.7, SIP6731.5, SIT6731.6, SIT8190.0, SIT8192.4
4-[CHLOROBIS(1-METHYLETHYL)SILYL]BUTANENITRILE see SIC2450.0 3-CYANOPROPYLDIISOPROPYLCHLOROSILANE

SIC2264.8

SiN

271.93

See also SIB1879.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
7522-27-2
HMIS: 2-2-1-X

Si

PR

Cl

3-CHLORO-N,N-BIS(TRIMETHYLSILYL)ANILINEC12H22ClNSi2

157-157.5° / 25

1.103255g ¥26,300

SIC2265.0

Cl

4-CHLOROBUTYLDIMETHYLCHLOROSILANE
C6H14Cl2Si

Si

185.17

Cl See also SIC2277.0

100-2° / 30
Flashpoint: 45°C (113°F)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18145-84-1]
HMIS: 3-2-1-X
25g ¥21,500

1.029625

1.450325

100g ¥62,000

CHLORODIMETHYLOCTADECYLSILANE - see SIO6615.0 n-OCTADECYLDIMETHYLCHLOROSILANE

SIC2265.5

Cl

Si

Si

Cl

(CHLORODIMETHYLSILYL)-5-[2-(CHLORODIMETHYLSILYL)ETHYL]BICYCLOHEPTANE
C13H26Cl2Si2
309.43
Mixture of isomers
Forms polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[220527-24-2]
HMIS: 3-2-1-X
25g ¥16,200

1.03

1.48630.84825

1.454230

SIC2266.0

13-(CHLORODIMETHYLSILYLMETHYL)HEPTACOSANE, 95%
C30H63ClSi
487.37200-10° / 0.01

Forms hydrophobic bonded phases
See also SIC2266.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[194243-00-0]
TSCA
HMIS: 3-1-1-X
10g ¥34,500

Cl

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

233

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.887

1.457522

SIC2266.5

Cl

11-(CHLORODIMETHYLSILYL)METHYLTRICOSANE, tech-95
C26H55ClSi
431.27
Contains ~5% isomers
Forms self-assembled oleophilic monolayers
Employed as bonded phase in HPLC
See also SID4401.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

Si

170° / 0.075

10g ¥30,200

SIC2266.8

7-[3-(CHLORODIMETHYLSILYL)PROPOXY]-4-METHYLCOUMARIN, 10% in acetonitrile
C15H19ClO3Si
劇物
310.85
Fluorescence max: 390, 421, 521, 585 (excitation at 384 nm)
Flashpoint: 2°C (36°F)
λmax: 223, 248, 281, 323.5 (vs)
Fluorescent tag / protecting groupO
See also SIT8192.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[129119-77-3]
HMIS: 3-4-1-X
10g ¥24,700

Si
O

O

O
O
F

Cl

SIC2267.0

Cl
Si

Cl

2-CHLOROETHYLMETHYLDICHLOROSILANE
C3H7Cl3Si
177.53157°
Dipole moment: 1.96 debye
Flashpoint: 32°C (90°F)
See also SIA0015.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[7787-85-1]
TSCA EC 232-134-2 HMIS: 3-3-1-X store <5°C
25g ¥13,800

Cl

1.261

1.43991.02925

1.422250.904

1.4232

1.393

1.456

1.419

1.46401.00925

1.413025

0.964

1.42341.03251.452225

100g ¥37,100

SIC2268.0

O

2-CHLOROETHYLMETHYLDIMETHOXYSILANE
C5H13ClO2Si

Si

Cl

77° / 25
Flashpoint: 43°C (109°F)
50g ¥38,500

SIC2268.5

H

H

Si

Cl

168.70Eliminates ethylene at elevated temperatures or in presence of base
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2078[13508-51-5]
EC 236-834-9 HMIS: 2-2-1-X store <5°C

O

H
Cl

2-CHLOROETHYLSILANE
C2H7ClSi

94.61

69-71°

Intermediate for H3SiCl; employed in CVD of SiN.1
1. Arkles, B. et al. U.S. Patent 5,968,611, 1999.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18165-19-0]
HMIS: 3-4-1-X store <5°C

10g ¥27,300

SIC2269.0

1-CHLOROETHYLTRICHLOROSILANE, tech-95
C2H4Cl4Si
197.95
136-7°
Dipole moment: 2.30 debye
Flashpoint: 15°C (59°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2046[7787-82-8]
TSCA EC 232-133-7 HMIS: 3-4-1-X
25g ¥26,800

Cl

Si

Cl

0.800

Cl

SIC2270.0

Cl

PR

Cl

2-CHLOROETHYLTRICHLOROSILANE, 95%
C2H4Cl4Si
197.95152-3°
Dipole moment: 1.51 debye
Flashpoint: 28°C (82°F)
Eliminates ethylene at elevated temperatures or in presence of baseForms silsesquioxanes convertible to SiO2 films by thermal or UV methods.1
1. Arkles, B. et al. J. Sol-Gel Sci. Techn. 1997, 8, 465.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2046[6233-20-1]
TSCA EC 228-345-4 HMIS: 3-4-1-X
25g ¥13,500

Si

Cl

Cl

100g ¥36,300

SIC2271.0

OCl

2-CHLOROETHYLTRIETHOXYSILANE, 95%
C8H19ClO3Si

O

Si

226.77

Eliminates ethylene at elevated temperatures or in presence of base
Fruit ripening/abscission agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18279-67-9]
TSCA EC 242-156-4 HMIS: 2-2-1-XO

88-9° / 9Flashpoint: 48°C (118°F)

25g ¥15,600

100g ¥43,200

SIC2275.0

Cl

1-CHLOROETHYLTRIMETHYLSILANE, 96%
C5H13ClSi

118°
Flashpoint: 20°C (68°F)
Lithiated derivative reacts with aldehydes, ketones to form methylketones via epoxysilanes.1
1. Magnus, P. et al. J. Chem. Soc., Chem. Commun. 1978, 297.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[7787-87-3]
TSCA EC 232-135-8 HMIS: 2-4-0-X
10g ¥26,000Si

136.70

SIC2277.0

3-CHLOROISOBUTYLDIMETHYLCHLOROSILANECl C6H14Cl2Si

Cl

Si

234

www.AZmax.co.jp

185.1789° / 25
Flashpoint: 60°C (140°F)

See also SIC2278.0, SIC2336.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18145-83-0]
TSCA EC 242-030-9 HMIS: 3-2-1-X
25g ¥15,600

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

100g ¥43,200

www.gelest.com

Enabling Your Technology
Name

Cl

3-CHLOROISOBUTYLDIMETHYLMETHOXYSILANE
C7H17ClOSi

180.75182°

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18244-08-1]
TSCA
HMIS: 3-3-1-X(mp °C)

D420

nD20

0.95

1.433125

1.1703

1.46291.05425

1.427725

25g ¥19,100

SIC2279.0

ClCl

3-CHLOROISOBUTYLMETHYLDICHLOROSILANE
C5H11Cl3Si

196°
Vapor pressure, 80˚: 15 mm
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1628-11-1]
TSCA EC 216-620-1 HMIS: 3-2-1-X
25g ¥22,500

Si
Cl
O

205.59SIC2280.4

O

Si

Cl

bp °C/mm

SIC2278.0

O

Si

Mw

3-CHLOROISOBUTYLTRIMETHOXYSILANE
C7H17ClO3Si

O

212.7559-60° / 2

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17256-27-8]
HMIS: 3-2-1-X

OOF

25g ¥23,100(CHLOROMETHYL)ALLYLDIMETHYLSILANE - see SIA0440.0 ALLYL(CHLOROMETHYL)DIMETHYLSILANE

Cl
Cl

SIC2281.0

2-(CHLOROMETHYL)ALLYLTRICHLOROSILANE

Cl 2-(TRICHLOROSILYLMETHYL)ALLYL CHLORIDESi

C4H6Cl4Si

110° / 75
Flashpoint: 82°C (180°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18147-84-7]
HMIS: 3-2-1-X
10g ¥34,200Cl

223.991.34731.4846

SIC2282.0

ClSi

2-(CHLOROMETHYL)ALLYLTRIMETHOXYSILANE
C7H15ClO3Si

O

210.73

Versatile coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[39197-94-9]
HMIS: 3-2-1-X

O

128° / 70
Flashpoint: 89°C (192°F)

1.09

COMPOUNDS

O

2.5g ¥22,500

SIC2283.0OOCl

3-[2-(4-CHLOROMETHYLBENZYLOXY)ETHOXY]PROPYLTRICHLOROSILANE
C13H18Cl4O2Si
376.18

Cl

Si

Cl

Cl

Reactive long chain benzyl chloride functional silane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
2.5g ¥51,200

SIC2285.0

Cl

Si

C3H8Cl2Si

Cl

143.09115-6°
Flashpoint: 21°C (69°F)
Autoignition temperature: 355˚CEnd-capper for silicones
F&F: Vol. 16, p 71; Vol. 17, p 75; Vol. 21, p 129.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[1719-57-9]
TSCA EC 217-006-6 HMIS: 3-4-1-X
25g ¥7,700

1.0865750g ¥47,700

COMMERCIAL

CMDMCS

1.436018kg ¥399,000

PR

SIC2286.0

Cl

Si

CHLOROMETHYLDIMETHYLETHOXYSILANE
C5H13ClOSi
Dipole moment: 2.14 debyeO

152.70HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2078[13508-53-7]
TSCA EC 236-835-4 HMIS: 3-3-1-X

132-3°
0.94425
Flashpoint: 26°C (79°F)
TOXICITY: oral rat, LD50: 1,550 mg/kg

SILICONCHLOROMETHYLDIMETHYLCHLOROSILANE

1.4122525g ¥23,600

SIC2286.5

Cl

Si

CHLOROMETHYLDIMETHYLISOPROPOXYSILANE
C6H15ClOSi
166.73
Vapor pressure, 64°: 50 mm
Forms Grignard reagent
F&F: Vol. 14, p 186.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18171-11-4]
HMIS: 3-3-1-X

O

145°
Flashpoint: 28°C (82°F)

0.9473

1.419210g ¥16,200

SIC2287.0

Si

Cl(CHLOROMETHYL)DIMETHYLPHENYLSILANE
C9H13ClSi
184.73106° / 15
1.031
1.522
Dipole moment: 1.93 debye
Flashpoint: 53°C (127°F)
Review of synthetic utility.1
Readily forms Grignard reagent, which is useful for Peterson olefinations and as a masked hydroxyl moiety.2,3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 162-166.
2. Boons, G. J. P. H. et al. Tetrahedron Lett. 1989, 30, 229.
3. Rodgen, S. A.; Schaus, S. E. Org. Lett. 2006, 45, 4929.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1833-51-8]
TSCA EC 217-392-6 HMIS: 3-2-0-X
10g ¥14,600

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

235

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.89425

1.416825

SIC2289.0

Cl

Si

CHLOROMETHYLDIMETHYLSILANE
C3H9ClSi

81°
Flashpoint: 14°C (57°F)
Hydrosilylation of dendrimers with unsaturated termination allows functionalization.1
1. Meijboom, R. et al. J. Organomet. Chem. 2004, 689, 987.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[3144-74-9]
TSCA EC 221-556-2 HMIS: 2-4-1-X
10g ¥26,300

H

108.64

CHLOROMETHYLDIMETHYLVINYLSILANE - see SIV9065.0 VINYL(CHLOROMETHYL)DIMETHYLSILANE

SIC2289.5

Cl
Si

O

O

Si

1.405825

O
O
F

Si

3-(CHLOROMETHYL)HEPTAMETHYLTRISILOXANE
C8H23ClO2Si3
270.98185-6°(-85°)
0.918
Viscosity, 25°: 1 cSt
Vapor pressure, 102°: 40 mm
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17201-87-5]
HMIS: 2-2-0-X
25g ¥17,800
100g ¥50,100

SIC2290.0

CHLOROMETHYLMETHYLDICHLOROSILANE
C2H5Cl3Si
Vapor pressure, 20°: 11 mm
Dipole moment: 1.82 debye

Cl
Cl

Si

121-2°(-64°)
1.285
Flashpoint: 35°C (95°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 375˚CIntermediate for flusilazole fungicide.1
1. Moburg, K. U.S. Patent 4,510,136, 1995.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[1558-33-4]
TSCA EC 216-319-5 HMIS: 3-3-1-X
25g ¥11,900

Cl1.45001kg ¥81,200

SIC2292.0

OCl

163.51CHLOROMETHYLMETHYLDIETHOXYSILANE
C6H15ClO2Si
Vapor pressure, 70°: 20 mm

SiO

182.72

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2078[2212-10-4]
TSCA EC 218-657-9 HMIS: 3-3-1-X

160-1°
1.00025
Flashpoint: 38°C (100°F)
TOXICITY: oral rat, LD50: 1,300 mg/kg

1.407

25g ¥17,800

SIC2293.0

CHLOROMETHYLMETHYLDIISOPROPOXYSILANE
C8H19ClO2Si

O
Cl

Si

50-2° / 1.5
Flashpoint: 48°C (118°F)

0.970

1.4212

142°
Flashpoint: 22°C (72°F)

1.065

1.41230.8912

1.44771.00

1.5223

Grignard reagent behaves as nucleophilic hydroxymethylation agent
Forms stable Grignard reagent that after reaction and oxidation transfers a hydroxymethyl moiety.1
1. Tamao, K. et al. J. Org. Chem. 1983, 48, 2120.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2212-08-0]
HMIS: 2-2-0-X
10g ¥17,800

O

SIC2293.2

OCl

210.78CHLOROMETHYLMETHYLDIMETHOXYSILANE
C4H11ClO2Si
154.67
ΔHvap: 35 kJ/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2212-11-5]
HMIS: 3-4-1-X

Si

PR

O

25g ¥28,900

SIC2294.0

Si

Cl

O

CHLOROMETHYLPENTAMETHYLDISILOXANE
C6H17ClOSi2

Si

198.6253° / 10
Flashpoint: 43°C (109°F)

See also SIC2289.5
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17201-83-1]
HMIS: 2-2-0-X

10g ¥14,600

SIC2295.0

Si

Cl

SIC2295.1

Cl

Cl

236

((CHLOROMETHYL)PHENYLETHYL)DIMETHYLCHLOROSILANE
247.24134-5° / 20
Mixed m-, p-isomers
Flashpoint: 87°C (189°F)
Employed in surface initiated ATRP polymerization.1
1. von Werner, T.; Patten, T. E. J. Am. Chem. Soc. 1999, 121, 7408.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[68092-71-7]
TSCA EC 268-469-6 HMIS: 3-2-1-X
25g ¥30,500

Cl C H Cl Si
11 16
2

Si

((CHLOROMETHYL)PHENYLETHYL)METHYLDICHLOROSILANE
C10H13Cl3Si
267.66120-5° / 0.6
1.21
Mixed m-, p-isomers
Flashpoint: 104°C (219°F)
ClIntermediate for silicone analog of Merrifield resins.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[81870-64-6]
EC 279-841-2 HMIS: 3-1-1-X
25g ¥19,400
100g ¥55,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIC2295.2((CHLOROMETHYL)PHENYLETHYL)METHYLDIMETHOXYSILANE
C12H19ClO2Si
258.82Mixed m-, p-isomers
Intermediate for silicone analog of Merrifield resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[160676-60-8]/[160676-58-4]
HMIS: 2-1-1-X

O
Si

Cl

O

25g ¥37,900

SIC2295.3

Cl

Cl ((CHLOROMETHYL)PHENYLETHYL)TRICHLOROSILANE

Si

Cl

120-5° / 0.5

ClC9H10Cl4Si
288.08111-2° / 1.5
1.32
Mixed m-, p-isomers
Flashpoint: >100°C (>212°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[58274-32-1]
TSCA EC 261-196-3 HMIS: 3-1-1-X
25g ¥16,400
100g ¥45,600

SIC2295.5

O

1.4932525g ¥15,800

100g ¥36,900

2kg ¥275,000

Si

Si

O
Si

Cl

CHLOROMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed m,p; α,β isomers
C18H37ClO3Si4
449.28Mixed m-, p-; α-, β-isomers
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[167426-89-3]
HMIS: 3-2-0-X
25g ¥39,500

1.007

1.469

1.361

1.53951.14

1.4965COMPOUNDSO

SIC2296.0

Si

Cl (p-CHLOROMETHYL)PHENYLTRICHLOROSILANE, 95%
C7H6Cl4Si
260.02
142-4° / 15
Flashpoint: 78°C (172°F)
ClHigh temperature coupling agent
Employed in surface initiated ATRP of poly (N-isopropylacrylamide)1, poly(methyl methacrylate).2
1. Kikuchi, A. et al. Polymer Preprints 2005, 46, 124.
2. Kang, E. et al. Macromolecules 2005, 38, 7867.
See also SIC2283.0, SIC2295.3
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13688-90-9]
TSCA EC 237-203-0 HMIS: 3-2-1-X
25g ¥21,500

Flexible multi-layer circuit boards for cell-phones use polyimide films
coupled with chloromethyl aromatic silanes

SIC2296.2

OO

Cl

CHLOROMETHYLSILATRANE
C7H14ClNO3Si

Si

O

Cl

134-43° / 10
Flashpoint: 183°C (361°F)

25g ¥19,900

100g ¥57,000

2kg ¥578,000

SIC2297.0

NO

246.77

Coupling agent for polyimides, e.g. in printed circuit boards
Modifies silica for high-throughput peptide synthesis.1
1. Houghten, R. et al. J. Am. Chem. Soc. 2005, 127, 8582.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[24413-04-5]
TSCA EC 246-235-4 HMIS: 3-1-1-X

PR

Si(p-CHLOROMETHYL)PHENYLTRIMETHOXYSILANE, 95%
C10H15ClO3Si

COMMERCIALO

SILICON

Si

Cl

1.0925

SIC2295.7

OCl

115° / 1.5
Flashpoint: 130°C (266°F)

O
O
F
O

Si

Cl

((CHLOROMETHYL)PHENYLETHYL)TRIMETHOXYSILANE
C12H19ClO3Si
274.82Mixed m-, p-isomers
Adhesion promoter for polyphenylenesulfide and polyimide coatings
Employed as a high temperature coupling agent.1
1. Arkles, B. et al. Modern Plastics 1980, 57, 64.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68128-25-6]
TSCA EC 268-575-2 HMIS: 3-1-1-X

COMMERCIAL

O

223.73(221-2°)TOXICITY: oral rat, LD50: 3,000 mg/kg

Reported to stimulate tissue growth.
1. Voronkov, M. in Biochemistry of Silicon and Related Problems; Bendz, G., Ed.; Plenum, 1978, p 395.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[42003-39-4]
TSCA EC 255-621-1 HMIS: 2-1-0-X
10g ¥40,600
1O

SIC2298.0

Cl

Cl

Si

Cl

Cl

CHLOROMETHYLTRICHLOROSILANE
CH2Cl4Si
Viscosity, 20°: 0.5 cSt
Vapor pressure, 20°: 18 mm
ΔHvap: 157.8 kJ/mole
Dipole moment: 1.61 debye
Surface tension, 27°: 26.5 mN/m

183.92

117-8°
1.465
Flashpoint: 69°C (156°F)
TOXICITY: ipr rat, LD100: 150 mg/kg
Autoignition temperature: 380˚C
Critical temperature: 310°C
Thermal conductivity, 27°: 0.1420 W/m°C
Heat capacity, 27°: 0.912 kJ/kg°C

Decomposes at temperatures >250°
Building block for carbosilanes.1
1. Whitmarsh, C.; Interante, L. US Patent 5,153,295, 1992.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2046[1558-25-4]
TSCA EC 216-316-9 HMIS: 3-2-1-X
25g ¥13,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.4535100g ¥37,100

www.gelest.com

237

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIC2298.4

ClSi

90-1° / 25
1.048
1.406925
Flashpoint: 47°C (117°F)
TOXICITY: oral rat, LD50: 2,400 mg/kg
Grignard reacts with chlorosilanes or intermolecularly to form carbosilanes.1
1. Brondani, D. et al. Tetrahedron Lett. 1993, 34, 2111.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2079[15267-95-5]
TSCA EC 239-311-3 HMIS: 2-2-1-X
25g ¥10,800
100g ¥24,100
2kg ¥160,000

OO

212.75

COMMERCIAL

CHLOROMETHYLTRIETHOXYSILANE
C7H17ClO3Si

O

SIC2298.5

CHLOROMETHYLTRIISOPROPOXYSILANE
C10H23ClO3Si

O
SiO

195-8°

Si

CHLOROMETHYLTRIMETHOXYSILANE
C4H11ClO3Si

O

O

0.98361.414525g ¥28,900

SIC2298.6

OCl

254.82

Forms Grignard reagents
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18162-82-8]
TSCA-L
HMIS: 2-2-1-X

O

O
O
F

Cl

170.67

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2079[5926-26-1]
TSCA-L
HMIS: 3-4-1-X

156°
Flashpoint: 26°C (79°F)
10g ¥10,600

1.125

1.40700.886

1.418050g ¥32,100

SIC2305.0

Si

122.67

97-8°
Flashpoint: -2°C (28°F)
Autoignition temperature: 295°C
Vapor pressure, 20°: 24 mm

Reagent for Peterson olefination - conversion of cabonyls to olefins.1
1. Reviews: Anderson, R. Synthesis 1985, 717; Chan, T. Acc. Chem. Res. 1977, 10, 422.
See also SIB1892.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 2-3846[2344-80-1]
TSCA EC 219-058-5 HMIS: 2-4-0-X
25g ¥7,800

COMMERCIALCl

CHLOROMETHYLTRIMETHYLSILANE, 98%
C4H11ClSi
Dipole moment: 2.03 debye
Solubility, water: 0.4 g/l

100g ¥25,700

2kg ¥197,000

SIC2320.0

2-CHLOROMETHYL-3-TRIMETHYLSILYL1-PROPENE

Cl

2-(CHLOROMETHYL)ALLYLTRIMETHYLSILANE

C7H15ClSi

162-3°
Flashpoint: 43°C (109°F)
Annulation reagent - converts cyclic enones to fused methylene cyclopentanes.1
1. Knapp, S. et al. Tetrahedron Lett. 1980, 21, 4557.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18388-03-9]
HMIS: 3-2-0-X
5g ¥79,800

Si

Si
Si

CHLOROMETHYLTRIS(TRIMETHYLSILOXY)SILANE
C10H29ClO3Si4

Si

O

O

345.1372° / 1.5

See also SIC2289.5, SIC2294.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[41919-30-6]
TSCA-L
HMIS: 2-2-0-X

PRSi

1.45400.968

1.404410g ¥12,700

1.30

1.535

1.432

1.54181.08325

1.472125

1.06925

1.4742550g ¥40,600

SIC2328.0

Cl

Cl

Si

Cl

(CHLOROPHENYL)METHYLDICHLOROSILANE, 95%
C7H7Cl3Si
225.5878-82° / 4
Mixed isomers
Flashpoint: 91°C (196°F)
Intermediate for high refractive index silicone fluids
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[25898-35-5]
HMIS: 3-2-1-X
25g ¥36,300

SIC2330.0

Cl

Cl

Si

Cl

Cl

CHLOROPHENYLTRICHLOROSILANE, 95%
C6H4Cl4Si
246.00241-6°
Mixed isomers
Flashpoint: 95°C (203°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 3-3379[825-94-5]
TSCA EC 212-551-6 HMIS: 3-1-1-X
10g ¥15,600

50g ¥52,200

SIC2332.0

Cl

O

Si

O

O

CHLOROPHENYLTRIETHOXYSILANE
C12H19ClO3Si
274.82Mixed m-, p-isomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21700-74-3] (p-)/[53392-05-5] (m-) TSCA EC 244-533-9 HMIS: 3-1-0-X

143-5° / 20
Flashpoint: 103°C (217°F)
10g ¥23,300

SIC2332.3

Cl

p-CHLOROPHENYLTRIETHOXYSILANE
C12H19ClO3Si

O
Si
O

238

0.899

SIC2325.0

OCl

162.74O

274.82

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21700-74-3]
TSCA EC 244-533-9 HMIS: 3-1-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

82-4° / 0.07
Flashpoint: 103°C (217°F)
10g ¥42,700(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.996

1.506725

0.918

1.426125

1.04325

1.448825

0.93225

1.427250.941

1.42780.892

1.4342

1.07

1.565625

1.204

1.45800.9744

1.4260

SIC2334.0

Cl

p-CHLOROPHENYLTRIMETHYLSILANE
C9H13ClSi
Dipole moment: 1.70 debye

206-7°(0.0°)
Flashpoint: 49°C (120°F)
Vapor pressure, 120°: 50 mm
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[10557-71-8]
TSCA
HMIS: 3-2-0-X
25g ¥25,700

Si

184.74

SIC2335.0(3-CHLOROPROPOXY)ISOPROPYLDIMETHYLSILANE

1-(ISOPROPYLDIMETHYLSILOXY)-3-CHLOROPROPANE

Cl

C8H19ClOSi

Si

O

194.7772-3° / 10

Forms Grignard reagents
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1191036-21-1]
TSCA-L
HMIS: 2-2-1-X

5g ¥22,500

SIC2336.0

3-CHLOROPROPYLDIMETHYLCHLOROSILANE

171.14179°
Flashpoint: 40°C (104°F)

O
O
F

Cl

Cl C5H12Cl2SiSi

See also SIC2277.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[10605-40-0]
TSCA EC 234-234-1 HMIS: 3-2-1-X
10g ¥16,400

50g ¥55,400

SIC2337.0

3-CHLOROPROPYLDIMETHYLETHOXYSILANE
C7H17ClOSi

O

Si

180.75HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13508-63-9]
EC 236-837-5 HMIS: 2-3-1-X

Cl

Si

O

87° / 30
Flashpoint: 46°C (115°F)
25g ¥16,200

SIC2338.0

3-CHLOROPROPYLDIMETHYLMETHOXYSILANE, 95%
C6H15ClOSi

166.73

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18171-14-7]
EC 242-055-5 HMIS: 3-2-1-X

170-1°
Flashpoint: 39°C (102°F)

COMPOUNDSCl

10g ¥17,800

SIC2340.0

Cl

H 3-CHLOROPROPYLDIMETHYLSILANE

Si

C5H13ClSi

136.70134-6°HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18157-31-8]
TSCA
HMIS: 2-3-1-X

10g ¥25,700

Cl

3-CHLOROPROPYLDIPHENYLMETHYLSILANE, 95%
C16H19ClSi

Si

274.85

165-6° / 1.5

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2632-97-5]
HMIS: 2-1-0-X

SILICON

SIC2342.0

10g ¥25,200

SIC2350.0

3-CHLOROPROPYLMETHYLDICHLOROSILANE
C4H9Cl3Si

PR

Cl

Cl

Si

Cl

191.5668-70° / 15
Flashpoint: 86°C (187°F)

Cyclized intermediate can be converted to enoxysilacyclobutanes.1
1. Denmark, S. et al. J. Am. Chem. Soc. 1994, 116, 7026.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[7787-93-1]
TSCA EC 232-136-3 HMIS: 3-2-1-X
25g ¥8,800

100g ¥20,700

SIC2352.0

3-CHLOROPROPYLMETHYLDIETHOXYSILANE
C8H19ClO2Si

O

Cl

Si

210.77

Intermediate for functional silicone polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-XO

81-3° / 8Flashpoint: 80°C (176°F)
100g ¥14,600

SIC2353.0

3-CHLOROPROPYLMETHYLDIISOPROPOXYSILANE
C10H23ClO2Si

O

Cl

Si

O

92-4° / 100.93

25g ¥16,200

Si
O

3-CHLOROPROPYLMETHYLDIMETHOXYSILANE
C6H15ClO2Si
182.72
Specific wetting surface: 428 m2/g
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2078[18171-19-2]
TSCA EC 242-056-0 HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

70-2° / 11
Flashpoint: 80°C (176°F)
100g ¥7,400(215) 547-1015

1.025
2kg ¥57,500

www.gelest.com

1.425318kg ¥335,000

COMMERCIAL

SIC2355.0

OCl

238.84HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

239

Name

Mw

bp °C/mm

224.88

115-7° / 70

(mp °C)

D420

nD20

0.89925

1.418925

211.98181-2°
1.359
4
Dipole moment: 4.97 debye
Flashpoint: 84°C (183°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2046[2550-06-3]
TSCA EC 219-844-8 HMIS: 3-2-1-X
25g ¥7,700
2.5kg ¥71,000

1.4668

SIC2362.0
Si(3-CHLOROPROPYL)PENTAMETHYLDISILOXANE
C8H21ClOSi2

SiO

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18291-27-5]
HMIS: 2-2-0-X

Cl

25g ¥28,900

Cl

Cl 3-CHLOROPROPYLTRICHLOROSILANEC H Cl Si

Si

3

Cl

6

COMMERCIAL

SIC2405.0

Cl

SIC2407.0
SiO

240.80100-2° / 10
Flashpoint: 78°C (172°F)

1.009

1.420

O
O
F

Cl

3-CHLOROPROPYLTRIETHOXYSILANE
C9H21ClO3Si

O

COMMERCIALO

Adhesion promoter for polyamine and epoxy resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2079[5089-70-3]
TSCA EC 225-805-6 HMIS: 2-2-0-X

25g ¥3,400

2kg ¥37,800

18kg ¥214,000

SIC2410.0

Cl

O

Si
O

100° / 40
1.07725
Flashpoint: 78°C (172°F)
TOXICITY: oral rat, LD50: 5,628 mg/kg
Vapor pressure, 100°: 40 mm

25g ¥3,400

2kg ¥34,100

1.418325

COMMERCIALO

3-CHLOROPROPYLTRIMETHOXYSILANE
C6H15ClO3Si
198.72
Viscosity, 20°: 0.56 cSt
γc of treated surface: 40.5 mN/mSpecific wetting surface: 394 m2/g
Adhesion promoter for SBR hot-melt adhesives
Powder flow control additive for dry powder fire extinguishing media
see also SIC2280.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2079[2530-87-2]
TSCA EC 219-787-9 HMIS: 3-2-1-X

18kg ¥185,000

SIC2411.0

Cl

Si

Si

151°
Flashpoint: 49°C (120°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 2-2047[2344-83-4]
TSCA EC 219-059-0 HMIS: 2-2-0-X
10g ¥13,000

0.879

1.432

181° / 100
0.92225
Flashpoint: 85°C (185°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 7-500[18077-31-1]
EC 241-985-9 HMIS: 2-2-0-X
25g ¥16,200
100g ¥44,800

1.4108

3-CHLOROPROPYLTRIS(TRIMETHYLSILOXY)SILANE
C12H33ClO3Si4

O
O

150.7250g ¥41,600

SIC2413.0

SiCl

3-CHLOROPROPYLTRIMETHYLSILANE
C6H15ClSi

Si

O

Si

373.19SIC2414.0

CHLOROSILANE, 95%

PR

MONOCHLOROSILANE

H3ClSiPYROPHORIC; CONTAINS SILANE, DICHLOROSILANE
AIR TRANSPORT FORBIDDEN
ΔHvap: 21 kJ/mole

H

H

Si

Cl

H

O

Si

S

Cl

O

240

-30.4°(-118°)

1.145-113

Flashpoint: -90°C (-133°F)
TOXICITY: ihl rat, LC50: 4,257 ppm/1H
Critical temperature: -123°C
Critical pressure: 48.4 atm

See also SIC2268.5
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[13465-78-6]
TSCA EC 236-705-7 HMIS: 4-4-3-X store <5°C
10g inquire* includes gas dispensing cylinder zCYL-HPS-0420

SIC2415.0

Cl

Cl

66.56

Cl

2-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in methylene chloride
C8H8Cl4O2SSi
338.11
Contains 30% free sulfonic acid and small amounts of silylsulfonic acid condensation products
Employed in preparation of solid phase extraction columns
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[79793-00-3]
TSCA EC 279-267-2 HMIS: 4-2-2-X
25g ¥16,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.37100g ¥44,800

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIC2415.42-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in toluene
C8H8Cl4O2SSi
338.11
Flashpoint: 4°C (39°F)
Contains 30% free sulfonic acid and small amounts of silylsulfonic acid condensation products
See also SIB1811.7
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[79793-00-3]
TSCA EC 279-267-2 HMIS: 4-4-2-X
25g ¥17,200

1.08100g ¥48,300

Solid Phase Extraction (SPE) columns with benzenesulfonic acid functionalized
silica are utilized to analyse urine samples for amino acids and drug abuse

SIC2417.0

O
O

O

O

O

O
Cl

Si

S

O

O

O

100g ¥65,500

SIC2417.4

2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in toluene
C11H17ClO5SSi
324.85Flashpoint: 4°C (39°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[126519-89-9]25g ¥25,700

SIC2420.0

CHLOROTRIS(TRIMETHYLSILYL)SILANE, 95%
C9H27ClSi4

Si
Si

Si

Cl

Si

Cl

Cl

Si

9

Cl

283.1195-6° / 2

(47-9°)

Employed as a silylation reagent for photolithography substrates.1
1. Wilharm, P. et al. US Patent 5,162,559, 1992.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5565-32-2]
HMIS: 3-3-1-X
2.5g ¥28,900

Cl

SIC2427.0

11-CHLOROUNDECYLTRICHLOROSILANE
C11H22Cl4Si

324.19HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17963-32-5]
HMIS: 3-1-1-X

188° / 15
Flashpoint: >110°C (>230°F)

1.1204

1.46880.944

1.43900.98551.42260.88751.42992.15

1.48

10g ¥40,600

SIC2428.0

11-CHLOROUNDECYLTRIETHOXYSILANE
C17H37ClO3Si

O
Si

9

O

O

9

Si

O

112° / 0.01

10g ¥45,900

SIC2429.0

11-CHLOROUNDECYLTRIMETHOXYSILANE
C14H31ClO3Si

O

Cl

353.01HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[120876-31-5]
HMIS: 2-1-1-X

PR

Cl

COMPOUNDS

S

O
O
F

Cl

Si

1.3025SILICONO

2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in methylene chloride
C11H17ClO5SSi
324.85
Amber color
Contains free sulfonic acid
Treated silica acts as etherification catalyst.1
Reagent for surface initiated ATRP.2
Employed in mesostructured fuel-cell membranes.3
1. Sow, B. et al. Microporous and Mesoporous Mat’ls. 2005, 79, 129.
2. Fukuda, J. et al. Macromolecules 2000, 33, 2870.
3. Pereira, F. et al. Chem. Mater. 2008, 20, 1710.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[126519-89-9]
HMIS: 3-2-1-X
25g ¥22,500O

310.93

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17948-05-9]
HMIS: 2-1-1-X

156-8° / 2
Flashpoint: >110°C (>230°F)
10g ¥42,700

SIC2432.0

Cl

1-CHLOROVINYLTRIMETHYLSILANE
C5H11ClSi

134.68104-5°

Forms acetylene on treatment with Me4NF.1
1. Cunico, R. J. Organomet. Chem. 1978, 162, 1.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2441-29-4]
HMIS: 3-4-1-X
2.5g ¥33,200

Si

CLAY - see SIA0760.0, SIH5840.15, SIH5840.2, SIK6463.5, SIM6470.7, SIS6948.0, SIS6985.0

SIC2433.0

CLINOPTILOLITEHYDRATED SODIUM POTASSIUM CALCIUM ALUMINUM SILICATE

Na1.4K0.7Ca0.3Al4.5Si13.5O36∙12H2O
Particle Size: <74 μm

Crystal structure image
courtesy of webmineral.com

2830.35

Mohs Hardness: 3.5-4.0
Monoclinic

Colorless to white, platy, minute crystals
Used in molecular sieves, gas adsorption, detergents, cation exchange, catalysis
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12173-10-3]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

10kg ¥53,900

www.gelest.com

241

Name

Mw

bp °C/mm(mp °C)

D420

nD20

AKC252.8

F

F

O

F
F

O

Cu

1.49

140

Deposition
Rate(nm/min)

COMMERCIALF

F

COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX
C10H13CuF6O2Si
370.8450° / 50(-5°)
10-20% Copper(ll)Flashpoint: 72°C (162°F)
TOXICITY: oral rat, LD50: 540 mg/kg
Autoignition temperature: 340˚C
High deposition rate, stable, optimized precursor for copper.1,2,3

100

60

205

20
195

Si

185

1.2

1.0

175
0.8

165

O
O
F

1.4

Precursor Flow
Rate (cc/min)

Substrate
Temperature (°C)

1. Kaloyeros, A. et al. U.S. Patent 6,037,001, 2000.
2. Burke, A. et al. J. Appl. Phys. 1997, 82, 4651.
3. Braeckelmann, G. et al. J. Vac. Sci. Technol. B 1996, 14, 1828.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[139566-53-3]/[14781-45-4]
HMIS: 3-2-1-X

10g ¥20,500

50g ¥68,500

SIC2435.0

COPPER SILICIDE
Cu5Si
345.79Coarse granules
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[12159-07-8]
TSCA EC 235-286-8 HMIS: 2-0-0-X

Cu5Si(825°)

7.7 - 7.825g ¥26,300(Z)-CROTYLTRICHLOROSILANE - see SIB1927.2 (Z)-2-BUTENYLTRICHLOROSILANE(E)-CROTYLTRICHLOROSILANE - see SIB1927.4 (E)-2-BUTENYLTRICHLOROSILANE

SIC2436.0

N

Cl (3-CYANOBUTYL)DIMETHYLCHLOROSILANE

Si

C7H14ClNSi

劇物

175.7380-4° / 1

0.993

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
25g ¥16,200

Cl

N

Si

(3-CYANOBUTYL)METHYLDICHLOROSILANE
C6H11Cl2NSi
劇物

Cl(3-CYANOBUTYL)METHYLDIMETHOXYSILANE
C8H17NO2Si
劇物

Si

187.32Component in solvent resistant silicone resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[793681-94-4]
TSCA
HMIS: 3-2-1-X

PRO63° / 0.3

1.104

77° / 1.5
Flashpoint: 93°C (199°F)

0.947

1.42311.22

1.45890.9652

1.417125g ¥26,800

SIC2438.0

ClN

196.17

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[71550-62-4]
TSCA EC 275-613-1 HMIS: 3-2-1-X
25g ¥16,400

SIC2437.5

ON

100g ¥44,800

SIC2437.0

Cl (3-CYANOBUTYL)TRICHLOROSILANE
C5H8Cl3NSi
劇物

Si

Cl

216.5761-3° / 2

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[163155-56-4]
TSCA-L
HMIS: 3-2-1-X
25g ¥16,200

100g ¥44,800

SIC2439.0

NO(3-CYANOBUTYL)TRIETHOXYSILANE
C11H23NO3Si
劇物

O

Si

O

75° / 425g ¥13,500

SIC2439.5

12-CYANODODEC-10-ENYLTRICHLOROSILANE, tech-95

Cl

Cl

9

劇物
326.77
Primarily E isomer
Forms SAMs that interact with heavy metals
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

Cl C13H22Cl3NSi

SiN

245.39HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1049679-56-2]
HMIS: 2-2-1-X

166-9° / 1

5g ¥36,300

SIC2439.7
O

O

Si
N

242

9

O

12-CYANODODEC-10-ENYLTRIMETHOXYSILANE, tech-95
C16H31NO3Si
劇物
313.51Primarily E isomer
Forms SAMs that interact with heavy metals
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

5g ¥36,300(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

N

D420

nD20

1.20151.455025

0.9862

1.419284-6° / 10
(32-3°)
1.356
TOXICITY: oral rat, LD50: 2,000 mg/kg
Vapor pressure, 85°: 12 mm
Cl
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1071-22-3]
TSCA EC 213-986-4 HMIS: 3-2-1-X
10g ¥12,700

1.4615Cl
SiCl

bp °C/mm(mp °C)SIC2440.0

2-CYANOETHYLMETHYLDICHLOROSILANE
C4H7Cl2NSi
劇物

168.1060-4° / 4Flashpoint: 60°C (140°F)
Vapor pressure, 60°: 4 mm

Monomer for polar silicones used in GC phases
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1071-21-2]
TSCA EC 213-985-9 HMIS: 3-2-1-X
25g ¥42,700

NO

SIC2441.0

2-CYANOETHYLMETHYLDIMETHOXYSILANE
C6H13NO2Si
劇物

Si
O

159.2689-90° / 8

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2526-61-6]
HMIS: 3-2-1-X

N

2-CYANOETHYLTRICHLOROSILANE
C3H4Cl3NSi
劇物
ΔHvap: 46.9 kJ/mole

188.52OOFSi10g ¥40,600

SIC2442.0

Cl
Cl

Mw

Si

224-5°
0.9792
Flashpoint: 86°C (187°F)
TOXICITY: oral rat, LD50: 5,630 mg/kg

Crosslinker for moisture-cure silicone RTVs - improves fuel resistanceForms mesoporous organosilica in combination with bis(triethoxysilyl)ethane.1
1. Wahab, M. et al. Microporous and Mesoporous Materials, 2004, 69, 19.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[919-31-3]
TSCA EC 213-050-5 HMIS: 2-2-0-X

OO

217.3425g ¥5,900

100g ¥18,600

1.41402kg ¥104,100

SIC2446.0

N
Si
O

N

2-CYANOETHYLTRIMETHOXYSILANE
C6H13NO3Si
劇物
175.26γc of treated surfaces: 34 mN/m
Crosslinker for moisture-cure silicones - improves solvent resistanceSee also SIT8579.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2526-62-7]
TSCA EC 219-764-3 HMIS: 3-2-1-X

OO

112° / 15
Flashpoint: 79°C (174°F)

25g ¥15,400

1.079

1.4126100g ¥42,200

SIC2446.5

2-CYANOETHYLTRIMETHYLSILANE
C6H13NSi
劇物

Si

127.26102° / 30

0.8123

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18151-32-1]
HMIS: 2-3-0-X
1.0g ¥25,200

CYANOMETHYLTRIMETHYLSILANE - see SIT8579.0 TRIMETHYLSILYLACETONITRILE

SIC2450.0

3-CYANOPROPYLDIISOPROPYLCHLOROSILANE

4-[CHLOROBIS(1-METHYLETHYL)SILYL]BUTANENITRILE
C10H20ClNSi
劇物

95° / 0.2
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[113641-37-5]
TSCA
HMIS: 3-1-1-X
10g ¥28,900

PR

Si

N

Cl

217.82

0.97

SILICONO

2-CYANOETHYLTRIETHOXYSILANE
C9H19NO3Si
劇物

COMMERCIALNCOMPOUNDSSIC2445.0

SIC2451.0

3-CYANOPROPYLDIISOPROPYL(DIMETHYLAMINO)SILANE

N

Si

N

4-[DIMETHYLAMINOBIS(1-METHYLETHYL)SILYL]BUTANENITRILE
C12H26N2Si
劇物
226.44

Stable cyanofunctional bonded phase
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[163794-91-0]
TSCA
HMIS: 3-2-1-X

96-8° / 0.2

0.89

10g ¥41,900

SIC2452.0

3-CYANOPROPYLDIMETHYLCHLOROSILANE
4-(CHLORODIMETHYLSILYL)BUTYRONITRILE
C6H12ClNSi
劇物

Si

N

161.71

Coupling agent for antibodies.1

108-9° / 15
Flashpoint: 85°C (185°F)

0.986

1.4460

Cl Allows formation of electrostatic gated nanopore electrodes.2

1. Falipou, S. et al. Bioconjugate Chem. 1999, 10, 346.
2. Wang, G. et al. J. Am Chem. Soc. 2006, 128, 7679.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18156-15-5]
TSCA EC 242-039-8 HMIS: 3-2-1-X
25g ¥15,600

100g ¥43,200

SIC2452.2
NSi

N

3-CYANOPROPYLDIMETHYL(DIMETHYLAMINO)SILANE
C8H18N2Si
劇物

170.33

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[111873-32-6]
HMIS: 3-2-1-X
25g ¥39,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

243

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIC2453.0

3-CYANOPROPYLMETHYLDICHLOROSILANECl C5H9Cl2NSi

79-82° / 1
1.14525
Flashpoint: 92°C (198°F)
TOXICITY: oral, rat, LD50: 2,830 mg/kg
Monomer for silicone films for microelectrodes permeable to polar molecules
See also SIC2453.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1190-16-5]
TSCA EC 214-717-3 HMIS: 3-2-1-X
25g ¥15,100
100g ¥41,400

Si

N

Cl

3-CYANOPROPYLMETHYLDIMETHOXYSILANE
C7H15NO2Si
劇物

Si

82-3° / 3

0.99705g ¥11,100

1.423525g ¥33,700

O
O
F

Cl

3-CYANOPROPYLPHENYLDICHLOROSILANE
C10H11Cl2NSi
劇物

244.20145-8° / 2

1.1925

1.531225

1.103

1.497093-4° / 8
1.302
Flashpoint: 75°C (167°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1071-27-8]
TSCA EC 213-990-6 HMIS: 3-2-1-X
25g ¥13,000
100g ¥34,500

1.465

Monomer for high temperature polar phases for GC.
1. Kruppa, R. et al. U.S. Patent 4,063,911, 1977.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1078-96-2]
TSCA
HMIS: 3-2-1-X
10g ¥34,700
1Cl

SIC2453.8

3-CYANOPROPYLPHENYLDIMETHOXYSILANE, 95%
C12H17NO2Si
劇物

O
Si

235.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[204760-82-7]
HMIS: 3-2-1-X

O

Cl
Si

N

1.455125

SIC2453.7

SiN

173.29See also SIC2437.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[153723-40-1]
HMIS: 3-2-1-X

ON

182.12

SIC2453.5

O
N

劇物

Cl

Cl

138-9° / 1

10g ¥42,200

SIC2454.0

3-CYANOPROPYLTRICHLOROSILANE
4-(TRICHLOROSILYL)BUTYRONITRILEC4H6Cl3NSi
劇物

202.54

SIC2455.0

O
Si

N

O

O

O
Si

N

231.37

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1067-47-6]
TSCA EC 213-931-4 HMIS: 3-2-1-X

79-80° / 0.6
0.961
Flashpoint: 74°C (165°F)
TOXICITY: oral rat, LD50: 2,460 mg/kg
25g ¥13,500

1.4174100g ¥36,300

SIC2456.0

3-CYANOPROPYLTRIMETHOXYSILANE

O

4-(TRIMETHOXYSILYL)BUTYRONITRILE
C7H15NO3Si
劇物

189.29HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55453-24-2]
TSCA EC 259-646-9 HMIS: 3-2-1-X

PRO

3-CYANOPROPYLTRIETHOXYSILANE
C10H21NO3Si
劇物
Viscosity: 2.3 cSt

90-2° / 7

1.027

10g ¥12,500

1.441650g ¥48,500

SIC2456.3

11-CYANOUNDECYLTRICHLOROSILANE
C12H22Cl3NSi
劇物
314.76
162-4° / 1
Treated surface contact angle, water: 68°
Long chain organofunctional silane
See also SIC2439.7, SIC2456.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[724460-16-6]
HMIS: 3-2-1-X
5g ¥45,900

N

Cl

Si

Cl

Cl

SIC2456.5

11-CYANOUNDECYLTRIMETHOXYSILANE
C15H31NO3Si
劇物

N

O

O

1.075

301.50Long chain organofunctional silane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[253788-37-3]
HMIS: 2-1-1-X

SiO

160° / 1

0.933

1.43940.95725

1.47295g ¥45,900

SIC2457.0Si244[2-(3-CYCLOHEXENYL)ETHYL]DIMETHYLCHLOROSILANE
C10H19ClSi
202.80105-9° / 10
ClContains isomers
Flashpoint: 74°C (165°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5089-25-8]
HMIS: 3-2-1-X
25g ¥25,700

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.0771

1.4829SIC2458.0

Cl[2-(3-CYCLOHEXENYL)ETHYL]METHYLDICHLOROSILANE
C9H16Cl2Si
223.2279-81° / 2
Contains isomers
Flashpoint: 80°C (176°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17864-93-6]
TSCA EC 241-815-3 HMIS: 3-2-1-X
25g ¥25,200

Si
Cl

SIC2459.0
Cl
Cl

Si
Cl

[2-(3-CYCLOHEXENYL)ETHYL]TRICHLOROSILANE
C8H13Cl3Si
Contains isomers

243.6474-5° / 0.7
Flashpoint: 86°C (187°F)
TOXICITY: oral rat, LD50: 2,830 mg/kg
Autoignition temperature: 235°C
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18290-60-3]
TSCA EC 242-163-2 HMIS: 3-2-1-X
25g ¥24,700

1.23

SIC2459.5[2-(3-CYCLOHEXENYL)ETHYL]TRIETHOXYSILANE
C14H28O3Si
272.46
Contains isomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[77756-79-7]
HMIS: 2-1-1-X

O
O
F

O

O

Si
O

0.948

1.444

1.02

1.4476

67-8° / 16
Flashpoint: 51°C (124°F)

0.885

1.447

87-8° / 16
Flashpoint: 90°C (194°F)
TOXICITY: oral rat, LD50: 2,830 mg/kg

1.25

1.490578-9° / 6
Flashpoint: 60°C (140°F)

1.039

Flashpoint: 120°C (248°F)
10g ¥12,500

50g ¥39,500

O

O

Si
O

[2-(3-CYCLOHEXENYL)ETHYL]TRIMETHOXYSILANE
C11H22O3Si
230.38109° / 6
Contains isomers
Flashpoint: 80°C (176°F)
1
Orients liquid crystals in display devices.
Coupling agent for aramid fiber reinforced epoxy.2
1. Sharp, Chem. Abstr. 101,81758g; Jap. Patent JP 58122517, 1983.
2. Lechner, U. Chem. Abstr. 112, 218118x; Germ. Offen. DE 3820971, 1989.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67592-36-3]
TSCA EC 266-749-2 HMIS: 3-2-1-X
10g ¥9,800

COMPOUNDSSIC2460.0

50g ¥28,900

SIC2462.0(CYCLOHEXENYLOXY)TRIMETHYLSILANE
1-(TRIMETHYLSILOXY)CYCLOHEXENE

C9H18OSi

Reacts with ethylene oxide to give γ-hydroxy ketones.1
Reacts with aldehydes, acetals, and enones w/o Lewis acid catalysis in the presence of hexafluoro-2-propanol.2
Hydroboration/oxidation leads to trans-1,2-diols.3
Hydroboration/elimination converts silyl enol ethers to olefins.4
1. Lalic, G. et al. Tetrahedron Lett. 2000, 41, 763.
2. Ratnikov, M. O. et al. Angew. Chem., Int. Ed. Engl.2008, 47, 9739.
3. Larson, G. L. et al. J. Organomet. Chem. 1974, 76, 9.
4. Larson, G. L. et al. Tetrahedron Lett. 1975, 4005.
See also SIC2552.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[6651-36-1]
TSCA EC 229-675-1 HMIS: 3-2-1-X
10g ¥16,200

Si

SILICONO

170.33

SIC2464.0

3-CYCLOHEXENYLTRICHLOROSILANE
C6H9Cl3Si

215.58

PR

Cl

Si

Cl

Cl

See also SIB0986.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10137-69-6]
TSCA EC 233-377-7 HMIS: 3-2-1-X
50g ¥36,300

SIC2464.1

3-CYCLOHEXENYLTRIMETHOXYSILANE
C9H18O3Si

O

Si

See also SIB0992.0, SIC2464.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21619-76-1]
HMIS: 3-2-1-X

OO

202.325g ¥35,300

SIC2464.2

O

NH(N-CYCLOHEXYLAMINOMETHYL)TRIETHOXYSILANE, 95%
C13H29NO3Si

O

Si

275.46HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[26495-91-0]
TSCA EC 247-744-4 HMIS: 2-1-1-X

O

236°
Flashpoint: 119°C (246°F)
25g ¥10,900

0.950

1.43770.99

1.48625100g ¥27,600

SIC2464.4
N
H

O

Si

O
O

N-CYCLOHEXYLAMINOPROPYLTRIMETHOXYSILANE
C12H27NO3Si
Viscosity: 5-7 cSt

261.43

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3068-78-8]
TSCA EC 221-329-8 HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

114° / 3Flashpoint: >110°C (>230°F)
Autoignition temperature: 260°C
25g ¥16,200(215) 547-1015

www.gelest.com

245

Name

Mw

bp °C/mm(mp °C)

D420

nD20

52-3° / 2Flashpoint: 63°C (145°F)

0.956

1.462683° / 15
Flashpoint: 66°C (151°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5578-42-7]
TSCA EC 226-956-0 HMIS: 3-2-1-X
25g ¥11,100

1.095

1.4724

SIC2465.0

CYCLOHEXYLDIMETHYLCHLOROSILANE
C8H17ClSi

Si

Cl

176.76

Silane blocking agent with good resistance to Grignard reagents
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[71864-47-6]
HMIS: 3-2-1-X
25g ¥31,000

SIC2468.0

Cl

CYCLOHEXYLMETHYLDICHLOROSILANE
C7H14Cl2Si

Si
Cl

197.181kg ¥106,700

SIC2469.0

O

188.34196°
0.9472
Flashpoint: 66°C (151°F)
TOXICITY: oral rat, LD50: 3,000 mg/kg

1.4354O
O
F

Si

Donor for polyolefin polymerization
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17865-32-6]
TSCA
HMIS: 2-2-1-X

25g ¥3,400

100g ¥10,100

2kg ¥141,000

SIC2470.0

Cl(CYCLOHEXYLMETHYL)TRICHLOROSILANESiCl C7H13Cl3Si

Cl

231.6294-8° / 11

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18388-16-4]
TSCA EC 242-265-7 HMIS: 3-2-1-X
10g ¥42,700

SIC2480.0

CYCLOHEXYLTRICHLOROSILANE
C6H11Cl3Si

O

Cl

Si

Cl

Si

Cl

217.6090-1° / 10
Flashpoint: 91°C (196°F)

Intermediate for melt-processable silsesquioxane-siloxanes.
Employed in solid-phase extraction columns.2
1. Lichtenhan, J. et al. Macromolecules 1993, 26, 2141.
2. Tippins, B. Nature 1988, 334, 273.
See also SIB0997.0, SIC2555.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[98-12-4]
TSCA EC 202-639-2 HMIS: 3-2-1-X
25g ¥16,200
1

1.222

1.4774

0.995

1.433

100g ¥44,800

SIC2482.0

O

CYCLOHEXYLTRIMETHOXYSILANE
C9H20O3Si

O

204.34HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17865-54-2]
HMIS: 2-3-1-X

207-9°

10g ¥12,500

50g ¥39,500

SIC2485.0

Cl
Si

Cl

(4-CYCLOOCTENYL)TRICHLOROSILANE, 95%
C8H13Cl3Si

243.6449-53° / 0.2

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18441-88-8]
HMIS: 3-1-1-X
10g ¥22,500

PRCl

SIC2490.0

Cl

Si

Cl

Cl

CYCLOOCTYLTRICHLOROSILANE, 95%
C8H15Cl3Si

245.6585-9° / 1.25

1.19

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18290-59-0]
HMIS: 3-2-1-X
10g ¥16,700

SIC2492.0

O

Si

CYCLOOCTYLTRIMETHOXYSILANE
C11H24O3Si

O

232.40HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-3-1-X

O85° / 11.10

1.45370.99

1.45130.833

1.46705g ¥22,500

SIC2520.0(3-CYCLOPENTADIENYLPROPYL)TRIETHOXYSILANE
C14H26O3Si

O

Si

O

O

270.44

Dimer; may be cracked to monomer at ~ 190° at 100 mm
Employed in silica-supported purification of fullerenes.1
1. Nie, B. et al. J. Org. Chem. 1996, 61, 1870.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[102056-64-4]
HMIS: 2-1-1-X

115° / 0.5
Flashpoint: 100°C (212°F)

10g ¥20,400

SIC2522.0

Si

246

COMMERCIALCYCLOHEXYLMETHYLDIMETHOXYSILANE
C9H20O2Si
Vapor pressure, 20°: 12 mm

O

CYCLOPENTADIENYLTRIMETHYLSILANE
C8H14Si

138.29138-40°Flashpoint: 29°C (84°F)

3 isomers in equilibrium 5:1:2
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[25134-15-0]
TSCA
HMIS: 2-3-0-X
2.5g ¥27,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

169.13

1.156

1.4679128.290.804

1.4394

SIC2524.0

CYCLOPENTAMETHYLENEDICHLOROSILANE
1,1-DICHLORO-1-SILACYCLOHEXANE

Cl

C5H10Cl2Si

Si

170°
Flashpoint: 29°C (84°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2406-34-0]
HMIS: 3-3-1-X
10g ¥45,900

Cl

SIC2525.0

CYCLOPENTAMETHYLENEDIMETHYLSILANE
1,1-DIMETHYLSILACYCLOHEXANE

C7H16Si132-3°
Flashpoint: 30°C (86°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[4040-74-8]
TSCA EC 223-730-3 HMIS: 2-3-0-X
5g ¥25,200

Si

SIC2552.0(CYCLOPENTENYLOXY)TRIMETHYLSILANE

O
O
F

1-(TRIMETHYLSILOXY)CYCLOPENTENE

C8H16OSi

158-9°
Flashpoint: 38°C (100°F)
Reacts with aldehydes, acetals, and enones w/o Lewis acid catalysis in the presence of hexafluoro-2-propanol.1
1. Ratnikov, M. O. et al. Angew. Chem., Int. Ed. Engl.2008, 47, 9739.
See also SIC2462.0, SII6460.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[19980-43-9]
TSCA EC 243-448-4 HMIS: 2-2-1-X
10g ¥26,300

Si

H
Si
H
Cl
Si
Cl

156.300.878

1.43920.775

1.4404178-9°
1.225
Flashpoint: 77°C (171°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[14579-03-4]
TSCA EC 238-621-6 HMIS: 3-2-1-X
25g ¥17,800
100g ¥50,100

1.4713

SIC2554.0

H

CYCLOPENTYLSILANE
C5H12Si

100.24

Silane reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[80249-74-7]
HMIS: 2-4-1-X

89-90°
Flashpoint: -8°C (18°F)
5g ¥36,300

SIC2555.0

Cl

CYCLOPENTYLTRICHLOROSILANE
C5H9Cl3Si

203.57

SIC2557.0

Si

O

O

CYCLOPENTYLTRIMETHOXYSILANE
C8H18O3Si

190.310.99025

1.424025

1.185

1.4630114.260.794

1.4349141.071.201

1.4620HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[143487-47-2]
HMIS: 3-2-1-X

75° / 10
Flashpoint: 54°C (129°F)
10g ¥12,500

50g ¥39,500

SIC2564.0

Si

142-3°
Flashpoint: 25°C (77°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2406-33-9]
TSCA EC 219-299-6 HMIS: 3-3-1-X
10g ¥26,300

PRCl

CYCLOTETRAMETHYLENEDICHLOROSILANE
C4H8Cl2Si

Cl

155.10SILICONOCOMPOUNDS

O

50g ¥94,700

SIC2566.0

CYCLOTETRAMETHYLENEDIMETHYLSILANE
C6H14Si

107°
Flashpoint: 15°C (59°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1072-54-4]
HMIS: 2-4-0-X
5g ¥26,300

Si

SIC2568.0

CYCLOTRIMETHYLENEDICHLOROSILANE
1,1-DICHLOROSILACYCLOBUTANE

C3H6Cl2Si

Cl

Si

Cl

113-4°
Flashpoint: 9°C (48°F)
Reaction with LiN(iPr)2 and CH2X2 provides 1,1-dimethyl-2-halosilacyclopentanes.1
Arylchlorosilyl derivatives used in cross-coupling to biaryls.2
Vinylchlorosilyl derivatives used in cross-coupling to 1,3-butadienes.3
Starting material for spirocyclic organosilanes.4
1. Matsumoto, K. Tetrahedron 1993, 49, 8487.
2. Denmark, S. E.; Wu, Z. Org. Lett. 1999, 1, 1495.
3. Denmark, S. E.; Choi, J. Y. J. Am. Chem. Soc. 1999, 121, 5821.
4. Déjean, V. et al. Organometallics 2000, 19, 711.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2351-33-9]
TSCA EC 219-084-7 HMIS: 3-4-1-X
10g ¥24,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

50g ¥86,200

www.gelest.com

247

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.775

1.4290

SIC2570.0

CYCLOTRIMETHYLENEDIMETHYLSILANE
1,1-DIMETHYLSILETANE

C5H12Si
100.24
Ionization potential: 8.97 eV
Pyrolysis yields dimethylsilene
Review of synthetic utility.1
Undergoes insertion reactions.2
Undergoes polymerization.3
Undergoes reductive silylation of aldehydes.4
Reacts w/ aldehydes to form 3-substituted 1-sila-2-oxacycohexanes.5

O

SiMe2

H

+

Ph

t-BuOK (10 mol%)
THF, 0°
65%

O
Si
Me2

O
O
F

Si

82°
Flashpoint: -5°C (23°F)

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 261-262.
2. Matsumoto, K. et al. Tetrahedron Lett. 1990, 31, 6055.
3. Weyenberg, D. et al. J. Org. Chem. 1965, 30, 2618.
4. Hirano, H. et al. Org. Lett. 2006, 8, 483.
5. Takeyama, Y. et al. Tetrahedron Lett. 1990, 31, 6059.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2295-12-7]
TSCA EC 218-939-1 HMIS: 2-4-0-X Store <5°C
5g ¥27,300

SIC2572.0

CYCLOTRIMETHYLENEMETHYLCHLOROSILANE
C4H9ClSi

120.66103°
Flashpoint: 2°C (36°F)

0.985

1.4500

Review of synthetic utility.1!ntermediate for enoxysilacyclobutanes.2
Precursor to various aryl and alkenylsilacyclobutanes suitable as a nucleophile in silicon-based cross-coupling.3

Si

Me
Si Cl

MgBr

+

Me
Si

MeO

OMe
OMe

OMe

Cl

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 166-170.
2. Denmark, S. et al. J. Am. Chem. Soc. 1994, 116, 7026.
3. Denmark, S. E.; Sweis, R. F. Acc. Chem. Res. 2002, 35, 835.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2351-34-0]
HMIS: 3-4-1-X Store <5°C
5g ¥38,500

DANISHEFSKY’S DIENE - see SIM6494.0 1-METHOXY-3-(TRIMETHYLSILOXY)BUTADIENE

SID2605.0

DATOLITE
CaBSiO4O(OH)
Particle Size: <150 μm

PR159.98

2.9

1.63

210°
(-44°)
0.959
Flashpoint: 76°C (169°F)
Vapor pressure, 50°: 2 mm
Critical temperature: 344°C
Critical pressure: 1.03 mPa
Dielectric constant: 2.50
Octanol/water partition coefficient, log Kow: 5.5
Dipole moment: 1.22

1.3982

Mohs Hardness: 5.5
Monoclinic prismatic

Colorless, granular, brittle, transparent
Chemical feedstock for synthetic Colemanite, disodium octabirate
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
TSCA-E
HMIS: 1-0-0-X

Crystal structure image
courtesy of webmineral.com

500g ¥17,300

SID2650.0

DECAMETHYLCYCLOPENTASILOXANECYCLIC PENTAMER -D5

O

C10H30O5Si5
Viscosity: 3.87 cSt
ΔHcomb: -10,021 kJ/mole
ΔHvap: 50.2 kJ/mole
Surface tension, 20˚: 18.0 mN/mRing strain: 1.05 kJ/mole
Solubility, water: 0.03 mg/l

O

O

Si

Si

O

Si

O

370.77

Undergoes ring-opening polymerization
Vehicle for cosmetics
See also SID4625.0, SIM6592.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-475[541-02-6]
TSCA EC 208-764-9 HMIS: 1-2-0-X

100g ¥4,500

2kg ¥33,600

COMMERCIAL

Si

Si

17kg ¥115,000

SID2653.0

H

Si

248

O

Si

O

Si

O

Si

O

Si

H

1,1,3,3,5,5,7,7,9,9-DECAMETHYLPENTASILOXANE, 95%
C10H32O4Si5

356.79Intermediate for silicone block polymers
See also SIO6702.0, DMS-H03
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[995-83-5]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

100° / 20

0.881310g ¥26,800(215) 547-1015

www.gelest.com

1.3902

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

C10H30O3Si4
310.69194-5°(-76°)
0.8536
Viscosity: 1.5 cSt
Flashpoint: 63°C (145°F)
ΔHcomb: -9,581 kJ/mole
TOXICITY: oral rat, LD50: >1,000 mg/kg
ΔHvap: 50.2 kJ/mole
Autoignition temperature: 430˚C
Surface tension: 18.0 mN/mVapor pressure, 104°: 40 mm
Specific heat: 1.716 J/g/˚Dielectric constant: 2.39
Solubility in water: 6.7 ppb
Octanol/water partition coefficient, log Kow: 8.2
Solubility parameter: 7.0
Dipole moment: 1.22
See also SID4626.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-476[141-62-8]
TSCA EC 205-491-7 HMIS: 1-2-0-X
25g ¥7,400
250g ¥33,000

1.3895

SID2655.0

DECAMETHYLTETRASILOXANE
MD2M

O

Si

O

Si

Si

SID2660.0
8

Cl

Cl

8

Si
Cl

8

Cl

234.8898° / 2
0.866
Flashpoint: 137°C (279°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[38051-57-9]
TSCA EC 253-761-8 HMIS: 3-1-1-X
25g ¥14,100
100g ¥37,900

1.441

SID2662.0

n-DECYLMETHYLDICHLOROSILANE
C11H24Cl2Si

111-4° / 3
Flashpoint: 120°C (248°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18051-88-2]
TSCA EC 241-962-3 HMIS: 3-1-1-X
25g ¥14,600

ClSin-DECYLDIMETHYLCHLOROSILANE
C12H27ClSi

Cl

255.310.960

1.4490133-7° / 5
1.0540Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[13829-21-5]
TSCA EC 237-540-3 HMIS: 3-1-1-X
25g ¥9,800
100g ¥24,100

1.4528SID2663.0

n-DECYLTRICHLOROSILANE
C10H21Cl3Si

275.72

SID2665.0

n-DECYLTRIETHOXYSILANE
C16H36O3Si

O
Si
8

O

O

304.54HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2943-73-9]
EC 220-940-7 HMIS: 2-1-0-X

150° / 825g ¥20,600

0.87901.4220100g ¥49,900

COMPOUNDS

Si

O
O
F
SID2670.0

n-DECYLTRIMETHOXYSILANE
C13H30O3Si

O
Si
8

O

O

8

N

132° / 100.901.420925g ¥21,500

SID2671.0

n-DECYLTRIS(DIMETHYLAMINO)SILANE
C16H39N3Si

NSi

262.47For dipodal version see SIB1829.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3512[5575-48-4]
HMIS: 3-2-1-X

N

301.59122-4° / 1

SILICON

O

PR

Si

0.844

Vapor-phase reagent for SAMs
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1015787-64-0]
HMIS: 3-3-1-X
10g ¥25,700

DIACETOXYDI-t-BUTOXYSILANE - see SID2790.0 DI-t-BUTOXYDIACETOXYSILANE

Cl

Si

Cl

SID2742.0

DIALLYLDICHLOROSILANE
C6H10Cl2Si

181.14HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3651-23-8]
TSCA
HMIS: 3-3-1-X

165-6°

1.075

5g ¥27,800

SID2745.0

DIALLYLDIMETHYLSILANE, 95%

4,4-DIMETHYL-4-SILA-1,6-HEPTADIENESi

C8H16Si
140.30137°
Contains β-methylvinyl isomers
Flashpoint: 23°C (73°F)
Dipole moment: 0.54 debye
Cyclic polymerization forming linear [(sila-cyclohexane)methylene] polymers with Ziegler catalyst reported.1
1. Marvel, C. et al. J. Org Chem. 1960, 25, 1641.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1113-12-8]
TSCA EC 214-199-9 HMIS: 2-4-0-X
25g ¥27,300

0.768

1.42200.996

1.5750

SID2749.0

Si

DIALLYLDIPHENYLSILANE, 95%
C18H20Si
264.44140-1° / 2
Contains β-methylvinyl isomers
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[10519-88-7]
TSCA EC 234-061-1 HMIS: 2-1-0-X
10g ¥24,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

249

Name
Si
Si

O

Si

Si

O

bp °C/mm

1,3-DIALLYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
C18H46O5Si6
511.07125° / 1.7(mp °C)

D420

nD20

0.89

1.41410.821

1.4280

SID2752.0

O

O

Mw

O

Si

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[211931-07-6]
HMIS: 2-1-0-X

Si

10g ¥41,100

SID2754.0

1,3-DIALLYLTETRAMETHYLDISILOXANE, 95%
C10H22OSi2

F

Si

O

F

--

F Si
F F

179-80°10g ¥42,200

Reference Compound 1

NH4+

DIAMMONIUM PENTAFLUOROMETHYLSILICATE
CH11F5N2Si

NH4+174.19(162° dec.)

Hexacoordinate sliconReference compound. Data is provided for investigators. Not offered for sale by Gelest.

O
O
F

Si

214.45Cyclized to 7-member ring using Schrock’s catalyst.1
1. Forbes, M. et al. J. Am. Chem. Soc. 1992, 114, 10978.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17955-81-6]
HMIS: 2-2-0-X

SID2754.2

DIATOMACEOUS EARTH, calcined

SILICON DIOXIDE, DIATOMACEOUS

SiO2
Particle Size: <24 μm

60.09

2.3

Mohs hardness: 7.0
Irregular shaped

White, low density, low thermal conductivity
Used in filtration, polishing compounds, coatings, rubber, dental, polyolefin films, pharmaceutical applications
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[68855-54-9]
TSCA-E EC 272-489-0 HMIS: 1-0-0-X
500g ¥9,600
10kg ¥48,000

Specimen diatoms

SID2754.4

DIATOMACEOUS EARTH, uncalcined
KIESELGUHR

SiO2∙H2O
Particle Size: <24 μm

60.09 / 78.10

Cream/gray, low density, low thermal conductivity,
Used in filtration, polishing compounds, coatings, rubber, dental, polyolefin films
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[61790-53-2]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

O

O
O

Si

O

O

O

Si

DIBENZYLOXYDICHLOROSILANE, tech-95
C14H14Cl2O2Si

Cl

1.528

313.26

175-7° / 5

1.22

Pyrolytic degradation at >250° yields SiO2 and benzyl chloride (lachrymator)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18414-52-3]
HMIS: 3-2-1-X
10g ¥12,700SiBr360.44

Forms SiO2 at >200˚C
Thermal degradation of mixtures with gold mercaptan complexes gives “ruby” glass coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[151837-46-6]
HMIS: 3-2-1-X
25g ¥25,700

SID2755.0

Cl

SID2756.0

Cl

Br

1.18

10kg ¥48,000

SID2754.6

PR

O

1.46

DIAZOMETHYLTRIMETHYLSILANE - see SIT8588.0 TRIMETHYLSILYLDIAZOMETHANEDIBENZYLOXYDIACETOXYSILANE, tech-95
C18H20O6Si

O

2.0

Mohs Hardness: 5.5
Irregular shapedClCl

1,2-DIBROMOETHYLTRICHLOROSILANE
C2H3Br2Cl3Si

321.3090-1° / 11
Flashpoint: 65°C (149°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4170-50-7]
TSCA EC 224-031-6 HMIS: 3-2-1-X
10g ¥19,400

2.046

1.537

1.55

1.505

SID2758.0

Br

1,2-DIBROMOETHYLTRIMETHYLSILANE, 95%
C5H12Br2Si

Si

260.04HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18146-08-2]
HMIS: 3-2-0-X

Br

74-5° / 8(-11°)

5g ¥34,200

SID2764.0

Si

Br

250

Si

Si

Br

1,3-DIBROMOHEXAMETHYLTRISILANE, tech-95
C6H18Br2Si3
334.2795-105° / 10
Contains homologs
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[127725-93-3]
HMIS: 3-2-1-X
1.0g ¥35,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.25

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.0

1.42225

1.01961.4040

SID2768.0

Br

Si

Si

Br

Br

1,2-DIBROMOTETRAMETHYLDISILANE, tech-95
C4H12Br2Si2
276.1279° / 30
Contains homologs
See also SID2764.0, SID3370.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18209-83-1]
HMIS: 3-2-1-X
5g ¥45,900(40°)

SID2772.0

3,5-DIBROMO-1-TRIMETHYLSILYLBENZENE
C9H12Br2Si

Si

308.09(40°)

Building block for dendrimers
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17878-23-8]
HMIS: 3-1-0-X

Br

5g ¥39,500

SID2780.0
Al

Si

O

O

O

DI-s-BUTOXYALUMINOXYTRIETHOXYSILANE
C14H33AlO6Si

O

O

Oligomers

352.48O
O
FOFlashpoint: 23°C (73°F)

Name is for nominal structure - product is oligomeric oxoalkoxide
Employed in sol-gel preparation of mullites.1,2
1. Boilot, J. P. In Better Ceramics Through Chemistry III; MRS Proc. 1988; Vol. 121, p.121.
2. Columban, P. J. Mater. Res. 1998, 13, 803.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[68959-06-8]
TSCA EC 273-392-6 HMIS: 2-4-1-X
25g ¥11,900

100g ¥31,000

SID2790.0

O

Si

O

O

O
O
O

Si

O

102° / 5(-4°)
Flashpoint: 95°C (203°F)
Vapor pressure, 50˚: 0.03 mm

50g ¥9,000

3kg ¥68,700

15kg ¥198,000

SID2790.1

OO

Si

Adhesion promoter for silicone RTVs
Impregnant/binder for ceramic coatings
Source for silicon dioxide by LPCVD.1,3
Precursor for poly(di-t-butoxysiloxane) photoimageable polymers.2
O 1. Smolinsky, G. et al. Mater. Lett. 1986, 4, 256.
2. Senkevich, J. et al. Chem. Mater. 1999, 11, 1814.
3. Sakata, M. et al. J. Photopolymer Sci. and Tech. 1992, 5, 181.
See also SID2754.6, SID2790.1
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13170-23-5]
TSCA EC 236-112-3 HMIS: 3-2-2-X

OOO

DI-t-BUTOXYDIACETOXYSILANE, 98%
C12H24O6Si

292.40HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13170-23-5]
TSCA EC 236-112-3 HMIS: 3-2-2-X

102° / 5(-4°)
Flashpoint: 95°C (203°F)

1.0196100g ¥32,600

SID2792.0

DI-t-BUTOXYDIMETHOXYSILANE, tech-95
C10H24O4Si

PRO

292.40236.38HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[6852-04-6]
HMIS: 3-2-1-X

SID2795.0

80-83° / 10

1.4040COMMERCIALO

C12H24O6Si
ΔHvap: 342.0 kJ/mole

SILICON

SILICON DI-t-BUTOXIDE DIACETATEOCOMPOUNDS

DI-t-BUTOXYDIACETOXYSILANE, tech-96

5g ¥36,900

DI(t-BUTYLAMINO)SILANE

BIS(tert-BUTYLAMINO)SILANE

H
N

H
N

Si

H

H

C8H22N2Si

174.36167°
0.816Flashpoint: 30°C (86°F)
TOXICITY: oral rat, LD50: 250-500 mg/kg
Autoignition temperature: 190°C

Lithiation leads to polyhedral silazanes.1
1. Becker. G. et al. In Organosilicon Chem. III; Auner, N.; Weiss, J., Eds; Wiley-VCH: 1998; p. 346.
See also SIB1068.0, SIH6103.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[186598-40-3]
TSCA
HMIS: 3-3-1-X
10g ¥34,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

251

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.884

1.4414SID3120.0

DI-t-BUTYLCHLOROSILANE
C8H19ClSi

178.78

Review of synthetic utility.
Reagent for selective silylation of internal alcohols or diols.2
Used as a stable reagent for linking two organic moieties.3
1

H

Si

O
Si
O

Cl

82-4° / 45
Flashpoint: 39°C (102°F)O

xylene,

90%

Si
O

Cl

Si

O
O
F

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 198-201.
2. Tanino, K. et al. J. Org. Chem. 1998, 63, 2422.
3. Gillard, J. W. et al. Tetrahedron Lett. 1991, 32, 1145.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[56310-18-0]
HMIS: 3-2-1-X
10g ¥33,200
50g ¥122,300

SID3203.0

ClDI-n-BUTYLDICHLOROSILANE
C8H18Cl2Si

213.22212°
Flashpoint: 64°C (147°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[3449-28-3]
TSCA
HMIS: 3-2-1-X
10g ¥24,100

0.991

1.44481.009

1.456150g ¥86,200

SID3205.0

DI-t-BUTYLDICHLOROSILANE
C8H18Cl2Si

213.22

190-1°(-15°)
Flashpoint: 61°C (142°F)

Review of synthetic utility.
Reagent for protection of 1,2 and 1,3 diols.2
Used as the source for di-tert-butylsilylene, in particular for the thermal silylene precursor, 1-silabicyclo[4.2.0]heptane.3 The silabicycloheptane di-tert-butylsilylene precursor has been utilized in a number of synthetic applications.4,5,6
1

Cl
Si
Cl

Cl

Si

Cl

THF
Li metal

Si:

71%

Si:

Si

+

PR

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 201-207.
2. Trost, B. et al. Tetrahedron Lett. 1981, 22, 4999.
3. Driver, T. G.; Franz, A. K.; Woerpel, K. A. J. Am. Chem. Soc. 2002, 124, 6524.
4. Driver, T. G.; Woerpel, K. A. J. Am. Chem. Soc. 2004, 126, 9993.
5. Driver, T. G.; Woerpel, K. A. J. Am. Chem. Soc. 2003, 125, 10659.
6. Howard, B. E.; Woerpel, K. A. Org. Lett. 2007, 9, 4651.
See also SIB1865.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18395-90-9]
TSCA EC 242-273-0 HMIS: 3-2-1-X
5g ¥31,000
25g ¥113,800

SID3207.0

DI-t-BUTYLDIFLUOROSILANE
C8H18F2Si

F

Si

180.31Introduces Si into heteroaromatics.1
1. Ishiyama, T. et al. J. Chem. Soc., Chem. Commun. 2005, 5065
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[558-63-4]
HMIS: 3-3-1-X

F

134°

0.896

5g ¥65,000

SID3214.0

O

H

Si

252

Si

204.39See also SID3530.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18132-63-3]
TSCA
HMIS: 3-1-1-X

HHO

DI-n-BUTYLDIMETHOXYSILANE
C10H24O2Si

O

H

Si

125° / 50
Flashpoint: 103°C (217°F)

0.861

1.418725g ¥20,400

SID3220.0

1,3-DI-t-BUTYLDISILOXANE
C8H22OSi2

190.4390° / 100

Potential reducing agent: see G. L. Larson, J. L. Fry, “Ionic and Organometallic-Catalyzed Organosilane Reductions”, in Organic Reactions S. E. Denmark, Ed. Volume 71, John Wiley and sons, pp 1-771, 2008.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-3-1-X
2.5g ¥40,600

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TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm

200.4465-70° / 5(mp °C)

D420

nD20

0.78825

1.441125

SID3224.0

DI-t-BUTYLISOBUTYLSILANE
C12H28Si

H
Si

Sterically-hindered potential reducing agent: see G. L. Larson, J. L. Fry, “Ionic and Organometallic-Catalyzed Organosilane Reductions”, in Organic Reactions S. E. Denmark, Ed. Volume 71, John Wiley and sons, pp 1-771, 2008.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[1314639-85-4]
HMIS: 2-3-1-X
10g ¥51,200

SID3226.0

DI-t-BUTYLISOBUTYLSILYL TRIFLUOROMETHANESULFONATE
DI-t-BUTYLISOBUTYLSILYLTRIFLATEC13H27F3O3SSi

F

F

1.2525NH2+ BIBSOTfONHBIBS

Et3N (2 eq)

O
O
F

Si

F

S

100-1° / 1O

CH2Cl2, rt, 12 h

92%

Bn2NH

+

BIBSOTfO

Et3N (2 eq)

CO2 (1 atm)
CH2Cl2, rt, 12 h

Bn2N

1. Liang, H.; Hu. L.; Corey, E. J. Org. Lett. 2011, 13, 4120.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1314639-86-5]
HMIS: 3-1-1-X

O

BIBS

95%

10g ¥47,200

SID3255.0

Si

DI-t-BUTYLMETHYLCHLOROSILANE
C9H21ClSi

Cl

192.80HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2041[70892-81-8]
TSCA
HMIS: 3-2-1-X

191-3°
Flashpoint: 69°C (156°F)
10g ¥29,400

SID3258.0

DI-t-BUTYLMETHYLSILANE
C9H22Si

H

Si

158.36HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[56310-20-4]
HMIS: 3-3-1-X

155°
Flashpoint: 30°C (86°F)

0.758

1.4293

0.740

1.420

1.358

1.397510g ¥25,200

COMPOUNDS

O

348.49Highly selective and very robust silicon-based protecting group capable of protecting alcohols, phenols, amines, carboxylic acids, andcarbamates.1

DI-t-BUTYLSILANE
C8H20Si

H

Si

144.33

Thermal1 and ECR2 source for CVD of silicon carbide
1. Grow, J. Proc. Electrochem. Soc. 1996, 96, 60.
2. Friessnegg, T. et al. J. Appl. Phys. 1996, 80, 2216.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[30736-07-3]
TSCA
HMIS: 2-4-1-X

PR

H

128°
(-38°)
Flashpoint: -2°C (28°F)

5g ¥19,400

SID3345.0

DI-t-BUTYLSILYLBIS(TRIFLUOROMETHANESULFONATE)
C10H18F6O6S2Si

Si

Review of synthetic utility.1
Reagent for protection of diols.2
Used to doubly block sialic acid for use in efficient silylation reactions.3
Can protect diols and be regioselectively mono-deprotected.4

F

O

F

O

O

t-Bu

S

O

F

F

+

Ph

O

O

F

t-Bu

OH

OH

F

S

O

440.46

Si

t-Bu

Si

OTf
OTf

73-5° / .35
Flashpoint: 90°C (194°F)

t-Bu
THF, DMF
pyridine
87%

Ph

O

BF3, Me2S, KOAc
3A MS, CHCl3
allyltrimethylsilane
81%

Bu-t
O

Ph
t-Bu

Bu-t
O

O

Si

SILICON

SID3342.0

F
Si

Bu-t
OH

Ph

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 209-222.
2. Corey, E. J.; Hopkins, P. B. Tetrahedron Lett. 1982, 23, 4871.
3. Hanshima, S. Eur. J. Org. Chem. 2009, 4215.
4. Yu, M.; Pagenkopf, B. L. J. Org. Chem. 2002, 67, 4553.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[85272-31-7]
HMIS: 3-2-1-X
5g ¥17,200
25g ¥44,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

253

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.80

1.43530.809

1.4144

SID3349.0
Si

1,3-DI-n-BUTYL-1,1,3,3-TETRAMETHYLDISILAZANE
C12H31NSi2

Si

N
H

245.5581° / 2
Flashpoint: 86°C (187°F)

See also SIB1937.0, SID4591.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[82356-80-7]
HMIS: 2-2-1-X

25g ¥24,700

100g ¥72,400

SID3349.4

Si

1,3-DI-n-BUTYLTETRAMETHYLDISILOXANE
C12H30OSi2
246.5578° / 4
Viscosity: 1.6 cSt
Flashpoint: 76°C (169°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[4619-08-3]
HMIS: 2-3-0-X
25g ¥9,800

SiO

SID3351.5
P

232.4250-2° / 0.5

1.4820O
OF

DI-tert-BUTYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
C12H29PSi

Air sensitive liquid
Used in Suzuki cross-coupling reactions.1
1. Ionkin, A. S. et al. Organometallics 2005, 24, 619.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[76181-99-2]
HMIS: 4-4-1-X
2.5g ¥88,300

Si

DICARBOXYLIC ACIDS, SILYLATED - see
SIB1852.0 BIS(TRIMETHYLSILYL)ACETYLENEDICARBOXYLATESIB1852.6 BIS(TRIMETHYLSILYL) ADIPATESIB1860.0 BIS(TRIMETHYLSILYL) ITACONATESIB1862.0 BIS(TRIMETHYLSILYL) MALONATESIB1870.0 BIS(TRIMETHYLSILYL) SEBACATE

O
Cl
O
Cl

Cl

Si

Si

N

SID3354.0

N-(DICHLOROBORYL)HEXAMETHYLDISILAZANE
C6H18BCl2NSi2

Si

Si

O

2,4-DICHLOROBENZOYL PEROXIDE, 50% in polydimethylsiloxane
C14H6Cl4O4
380.00
1.26
SELF-ACCELERATING DECOMPOSITION TEMPERATURE: 60°C
Contains 5-10% dibutyl phthalate
TOXICITY: oral rat, LD50: 12,918 mg/kg
Typical silicone crosslinking temperature 90-100°C, 10-20 mins
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 3-1421[133-14-2]
TSCA EC 205-094-9 HMIS: 3-3-1-X
100g ¥13,300
500g ¥43,800

Cl

Si

O

Cl

82° / 111.4554

DICHLORODIMETHYLSILANE - see SID4120.0 DIMETHYLDICHLOROSILANE

SID3358.0

1,3-DICHLORO-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANE, 96%
C14H16Cl2OSi2
327.36158-9° / 3
Flashpoint: 165°C (329°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3582-72-7]
TSCA EC 222-708-0 HMIS: 3-1-1-X
25g ¥21,500

O

1.15325

1.5318Si

184°(-53°)
1.018
Flashpoint: 76°C (169°F)
Vapor pressure, 50°: 1 mm
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 7-742[3582-71-6]
TSCA EC 222-707-5 HMIS: 3-2-1-X
25g ¥15,100
100g ¥41,400

1.4071

SID3360.0

Si

Cl

Cl

242.10HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[6591-26-0]
HMIS: 3-3-1-X
10g ¥35,300

PR

Cl

2

Cl

B

SID3352.0

1,5-DICHLOROHEXAMETHYLTRISILOXANE, tech-95

Cl C6H18Cl2O2Si3
ΔHvap: 47.7 kJ/mole

277.37

SID3360.5

Si

Cl(DICHLOROMETHYL)(CHLOROMETHYL)DIMETHYLSILANE, tech-95
C4H9Cl3Si
191.56184°

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18171-70-5]
HMIS: 2-3-0-X

10g ¥16,200

1.20925

1.475325

1.237

1.4614

SID3361.0

Cl

Si

Cl

Cl

(DICHLOROMETHYL)DIMETHYLCHLOROSILANE, tech-95
C3H7Cl3Si

177.53149°(-49°)
Flashpoint: 27°C (81°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[18171-59-0]
TSCA EC 242-058-1 HMIS: 3-3-1-X
25g ¥18,000

DI(CHLOROMETHYL)METHYLCHLOROSILANE - see SIB1053.0 BIS(CHLOROMETHYL)METHYLCHLOROSILANE

Cl

Cl
Si

Cl

254

Cl

SID3362.0(DICHLOROMETHYL)METHYLDICHLOROSILANE, tech-95
C2H4Cl4Si
197.95148-9°(-43°)
Viscosity, 20°: 1 cSt
Flashpoint: 28°C (82°F)
ΔHvap: 29.3 kJ/mole
Surface tension, 27°: 30.5 mN/m
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2047[1558-31-2]
TSCA EC 216-317-4 HMIS: 3-3-1-X
25g ¥17,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.4116www.gelest.com

1.4700Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.040

1.44521.011

1.40273-(DICHLOROMETHYLSILYL)-1-PROPENE - see SIA0470.0 ALLYLMETHYLDICHLOROSILANE

SID3366.0(DICHLOROMETHYL)TRIMETHYLSILANE, tech-95
C4H10Cl2Si
157.11
134-5°
Dipole moment: 2.28 debye
Flashpoint: 25°C (77°F)
Lithiated compound, Me3SiCHClLi, reacts with methylenephosphines to yield phosphiranes.1
Converts aldehydes to 1,2-dichloroalkenes.2
1. Becker, P. et al. Chem. Ber. 1992, 125, 771.
2. Hosomi, A. et al. Tetrahedron Lett. 1983, 24, 4727.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[5926-38-5]
TSCA EC 227-658-3 HMIS: 3-3-0-X
25g ¥20,400

Cl
Si
Cl

SID3367.0

Si

Si

O

Si

O
Si

351.52

222°(-62°)
Flashpoint: 98°C (208°F)
Vapor pressure, 50°: 1 mm

Intermediate for siloxane block polymers.1
1. Yoshino, K. et al. Chem. Lett. 1990, 2133.
See also SID3360.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 7-462[2474-02-4]
TSCA EC 219-597-6 HMIS: 3-1-1-X
25g ¥20,400

O
O
F

Cl

O

1,7-DICHLOROOCTAMETHYLTETRASILOXANE, 95%
C8H24Cl2O3Si4

Cl100g ¥58,600

SID3367.6

ClCl

280.44260-1°
Flashpoint: 150°C (302°F)
Vapor pressure, 102°: 7 mm

1.553

1.564

Monomer for high refractive index resins
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[27137-85-5]
TSCA EC 248-254-3 HMIS: 3-1-1-X
25g ¥16,400

4,4-DICHLORO-4-SILABUTENE - see SIA0445.0 ALLYLDICHLOROSILANE
1,1-DICHLOROSILACYCLOBUTANE - see SIC2568.0 CYCLOTRIMETHYLENEDICHLOROSILANE
1,1-DICHLOROSILACYCLOPENTANE - see SIC2564.0 CYCLOTETRAMETHYLENEDICHLOROSILANE

SID3368.0

H

PR

Cl

Si

H

COMMERCIALClDICHLOROSILANE
H2Cl2Si
101.01
8.3°(-122°)
1.227
CAUTION: CAN FORM PYROPHORIC REACTION PRODUCTS ON CONTACT WITH WATER OR AMINESAIR TRANSPORT FORBIDDEN
Vapor pressure, -34°: 100 mm
Flashpoint: -37°C (-35°F)
Vapor pressure, 20°: 1.62 atm (23.8 psia)
TOXICITY: inh mouse, LC50: 144 ppm/4h
ΔHform: -314 kJ/mole
Autoignition temperature: 57.8°C
ΔHvap: 27.2 kJ/mole
Critical temperature: 176°C
Dipole moment: 1.17 debye
Critical pressure: 46.1 atm
Specific heat: 1.122 J/g/°
For epitaxial deposition
Undergoes hydrosilylation reactions
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required(既) 1-217[4109-96-0]
TSCA EC 223-888-3 HMIS: 4-4-3-X
250g inquire
2kg inquire* includes gas dispensing cylinder

COMPOUNDSSiClDICHLOROPHENYLTRICHLOROSILANE, 95%
C6H3Cl5Si
Isomeric mixture

SILICONCl

Cl

SID3368.1

Cl

Si

H

H

DICHLOROSILANE, 99.9+%
H2Cl2Si
101.01
8.3°(-122°)
1.227
CAUTION: CAN FORM PYROPHORIC REACTION PRODUCTS ON CONTACT WITH WATER OR AMINESAIR TRANSPORT FORBIDDEN
Flashpoint: -37°C (-35°F)
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required(既) 1-217[4109-96-0]
TSCA EC 223-888-3 HMIS: 4-4-3-X
250g inquire* includes zCYL-HPS-0420-33 cylinder

COMMERCIALCl

SID3368.3

Cl

Si

H

H

DICHLOROSILANE, 25% in heptane
H2Cl2Si
101.01
8.3°(-122°)
0.76
CAUTION: CAN FORM PYROPHORIC REACTION PRODUCTS ON CONTACT WITH WATER OR AMINESAIR TRANSPORT FORBIDDEN
Flashpoint: -37°C (-35°F)
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required(既) 1-217[4109-96-0]
TSCA EC 223-888-3 HMIS: 4-4-3-X
750g inquire
2kg inquire* includes liquid dispensing cylinder

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIAL

Cl

255

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SID3368.6

Si

Cl

DICHLOROSILANE, 25% in xylene
H2Cl2Si
101.01CAUTION: CAN FORM PYROPHORIC REACTION PRODUCTS ON CONTACT WITH WATER OR AMINESAIR TRANSPORT FORBIDDEN

H

0.94

HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required(既) 1-217[4109-96-0]
TSCA
HMIS: 3-4-2-X
750g inquire
2kg inquire* includes liquid dispensing cylinder

H

COMMERCIALCl

1,3-DICHLOROTETRAISOPROPYLDISILOXANE see SIT7273.0 1,1,3,3-TETRAISOPROPYL-1,3-DICHLORODISILOXANESID3370.0

Si

Si

Cl

187.20148-9°
Flashpoint: 37°C (99°F)

1.005

Primarily 1,2-dichloro with 1,1-dichloro isomer
See also SID2768.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2040[4342-61-4]
TSCA EC 224-400-1 HMIS: 3-3-1-X
25g ¥25,700

1.454

O
O
F

Cl

1,2-DICHLOROTETRAMETHYLDISILANE, 95%
C4H12Cl2Si2100g ¥75,800

SID3372.0

1,3-DICHLOROTETRAMETHYLDISILOXANESi

Cl C H Cl OSi
4

Si

O

12

2

203.222

138°(-37°)
Flashpoint: 15°C (59°F)
Vapor pressure, 25°: 8 mm

Diol protection reagent
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 7-472[2401-73-2]
TSCA EC 219-278-1 HMIS: 3-4-1-X
25g ¥13,600

1.039

100g ¥43,200

1.40542kg ¥214,000

SID3374.0

1,3-DICHLOROTETRAPHENYLDISILOXANE
C24H20Cl2OSi

Cl Cl
Si

O

Si

451.50238-41° / 1(36-8°)Monomer for high refractive index silicones
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7756-87-8]
TSCA EC 231-815-1 HMIS: 3-1-1-X
25g ¥19,900

SID3379.0

O

DICUMYL PEROXIDE, 25%; in polydimethylsiloxane 40%, with 35% calcium carbonate
C18H22O2
270.36

2

Catalyst for heat-cure silicone rubbers
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 3-1086[80-43-3]
TSCA EC 201-279-3 HMIS: 2-3-2-X
100g ¥13,800500g ¥45,900

SID3382.0

DICYCLOHEXYLDICHLOROSILANE
C12H22Cl2Si

Cl

Si

265.30123° / 0.4
Flashpoint: 149°C (300°F)

1.103

See also SID3390.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18035-74-0]
HMIS: 3-1-1-X
25g ¥28,900

Cl

SID3385.0(2-DICYCLOHEXYLPHOSPHINOETHYL)TRIETHOXYSILANE
C20H41O3PSi

PR
O

Si

P

O

O

388.60

Ligand for immobilization of precious metal catalytic complexes
See also SIB1091.0 SID4558.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55289-47-9]
HMIS: 3-1-0-X

140° / 0.03

0.979255g ¥45,900

SID3388.0

DI(CYCLOPENTADIENYL)DIMETHYLSILANE
C12H16Si

188.3473° / 25

Intermediate for metallocenes
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18053-74-2]
HMIS: 2-3-0-X
1.0g ¥34,200

Si

SID3390.0

DICYCLOPENTYLDICHLOROSILANE
C10H18Cl2Si

Cl

256

Si

Cl

237.24105-7° / 10
Flashpoint: 84°C (183°F)

See also SID3537.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[139147-73-2]
HMIS: 3-2-1-X
10g ¥11,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.110

50g ¥34,200

www.gelest.com

1.481125

COMMERCIALClEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

120° / 6
1.000Flashpoint: 102°C (216°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 235˚C

1.4663

SID3391.0

DICYCLOPENTYLDIMETHOXYSILANE
C12H24O2Si
Viscosity: 2.5 cSt
SiO

228.40

Employed in propylene polymerization
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[126990-35-0]
TSCA
HMIS: 3-1-1-X

O

10g ¥9,800

50g ¥28,900

SID3392.0

Cl-

N+

8

O

O

Si
O

Cl
O

1.4085

SID3393.0

Cl

Si

0.863

O
O
F

8

N,N-DIDECYL-N-METHYL-N-(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 40-42% in methanol
C27H60ClNO3Si
510.32
Contains 3-5% Cl(CH2)3Si(OMe)3
Flashpoint: 11°C (52°F)
In combination with TEOS forms high pore volume xerogels with adsorptive capacity.1
1. Markovitz, M. et al. Langmuir 2001, 17, 7085.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68959-20-6]
TSCA EC 273-403-4 HMIS: 3-4-0-X
25g ¥16,400

DIETHOXYDICHLOROSILANE, tech-90
C4H10Cl2O2Si
189.11
137-8°
Contains triethoxychlorosilane
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2043[4667-38-3]
HMIS: 3-3-1-X Store <5°C
10g ¥23,600

O

1.129

SID3394.0

Si

Si

O

Si

O

1,5-DIETHOXYHEXAMETHYLTRISILOXANE
C10H28O4Si3

296.59HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17928-13-1]
HMIS: 2-2-1-X

51-2° / 0.8

0.912

1.38890.950

1.43700.8499

1.423

0.80

1.40800.933625

1.414225

25g ¥34,700

COMPOUNDSOO

SID3395.0

SiO

1,1-DIETHOXY-1-SILACYCLOPENT-3-ENE, tech-95
C8H16O2Si

O

172.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67059-49-8]
HMIS: 2-3-1-X

168°
Flashpoint: 29°C (84°F)
10g ¥37,400

SID3395.2

1,2-DIETHOXYTETRAMETHYLDISILANE
C8H22O2Si2

Si

Si

O

85-9° / 50
Flashpoint: 42°C (108°F)

Cross-coupling reagent
Used to convert aryl bromides to aryldimethylsilanols useful for cross-coupling protocols.1
1. Denmark, S. E.; Kallemeyn, J. M. Org. Lett. 2003, 5, 3483.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18419-84-6]
HMIS: 2-3-1-X
1.0g ¥28,900

SILICONO

206.43

SID3395.3

N

Si

H

DIETHYLAMINODIMETHYLSILANE, 95%
C6H17NSi

131.30109-110°PR

Silylation reagent providing derivatives more volatile than corresponding TMS derivative for GC analysis
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1386-66-3]
HMIS: 3-3-1-X
25g ¥38,500

SID3395.4

Si

N(N,N-DIETHYLAMINOMETHYL)TRIETHOXYSILANE
C11H27NO3Si

OO

74-6° / 325g ¥15,100

100g ¥41,400

2kg ¥169,200

SID3395.6

O

Si

N

249.43

Catalyst for neutral cure 1-part RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15180-47-9]
TSCA-L
HMIS: 2-2-1-X

COMMERCIAL

O(N,N-DIETHYLAMINOMETHYL)TRIMETHOXYSILANE, 95%
C8H21NO3Si

O

207.40Charge control agent for toner particles
Crosslinker for moisture-cure silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67475-66-5]
TSCA-L
HMIS: 3-2-1-X

O

0.95

1.415

0.934

1.424525g ¥16,200

SID3396.0(N,N-DIETHYL-3-AMINOPROPYL)TRIMETHOXYSILANE
C10H25NO3Si

O

N

Si
O

O

235.40120° / 20
Flashpoint: 100°C (212°F)

Provides silica-supported catalyst for 1,4-addition reactions.1
Used together w/ SIA0591.0 to anchor PdCl2 catalyst to silica for acceleration of the Tsuji-Trost reaction.2
1. Mutukura, K. et al. Chem.-Eur. J. 2009, 15, 10871.
2. Noda, H. et al. Angew. Chem., Int. Ed. Engl.2012, 51, 8017.
See also SID3395.6, SID3547.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[41051-80-3]
TSCA EC 255-192-0 HMIS: 2-1-1-X
25g ¥16,200
100g ¥41,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

257

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.76271.4109SID3398.0(DIETHYLAMINO)TRIMETHYLSILANETMSDEANO

Si+ Me3SiNEt2

126-7°(-10°)
Flashpoint: 10°C (50°F)

COMMERCIAL

C7H19NSi
145.32
ΔHform: -367 kJ/mole
Silylation reagent
Review of synthetic utility.1
Reacts with benzynes and aldehydes to form o-aminobenzyl alcohols.2
Provides a convenient synthesis of enoltrimethylsilyl ethers.3

OSiMe3

MeI

60-75°, 2 h
91%

O
O
F

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 598-599.
2. Yoshida, H. et al. Org. Lett. 2007, 9, 3367.
3. Yamamoto, Y.; Matui, C. Organometallics 1997, 16, 2204.
F&F: Vol. 3, p 317; Vol. 4, p 544; Vol. 6, p 634; Vol. 18, p 382.
See also SID3395.3, SID3605.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[996-50-9]
TSCA EC 213-637-6 HMIS: 3-4-1-X
25g ¥7,200
100g ¥27,300
2kg ¥207,000

SID3399.0

O
Si

Si

O

O

O

Si

Si

Si

O

O

Si

Si
O

DIETHYLCYCLOSILOXANES((C2H5)2SiO)3-6
307 - 612
117-160° / 10>90% cyclotri- and cyclotetrasiloxanes
Specific heat: 1.8 J/g/˚
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2031-79-0]
HMIS: 1-2-0-X
10g ¥14,100

1.04-1.06

50g ¥45,900

SID3402.0

Cl

DIETHYLDICHLOROSILANE
C4H10Cl2Si
ΔHvap: 41.9 kJ/mole
Dipole moment: 2.4 debye
Surface tension: 30.3 mN/m

Cl

Si

157.11130°(-96.5°)1.0504Flashpoint: 27°C (81°F)
TOXICITY: oral rat, LD20: 1,000 mg/kg
Vapor pressure, 21°: 10 mm
Thermal conductivity: 0.134 W/m˚C
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[1719-53-5]
TSCA EC 217-005-0 HMIS: 3-3-1-X
25g ¥11,900
100g ¥31,000

1.4309SID3404.0

DIETHYLDIETHOXYSILANE
C8H20O2Si

O

O

Si

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[5021-93-2]
TSCA EC 225-706-8 HMIS: 2-2-1-X

157°
Flashpoint: 43°C (109°F)
Vapor pressure, 73°: 100 mm
10g ¥15,400

0.8622

1.402250g ¥51,200

SID3410.0

H

DIETHYLMETHYLSILANE
C5H14Si78°
0.705
Flashpoint: -24°C (-11°F)
In combination w/ Co2(CO)8 and Ph3P effects one carbon homologation of aldehydes
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[760-32-7]
TSCA EC 212-080-6 HMIS: 2-4-1-X
25g ¥13,500
100g ¥36,300

PRSi

176.33102.25

1.3984

SID3411.0

O

O

O

P

Si

O

O

(2-DIETHYLPHOSPHATOETHYL)METHYLDIETHOXYSILANE, tech-95
C11H27O5PSi
298.39Comonomer for hydrophilic coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18048-06-1]
HMIS: 3-2-1-X

124° / 2

1.020

1.427025

1.03125

1.421610g ¥24,100

SID3412.0(2-DIETHYLPHOSPHATOETHYL)TRIETHOXYSILANE, tech-95
DIETHYLPHOSPHONATOETHYLTRIETHOXYSILANE

O

O

P

O

258

C12H29O6PSi

O

Si

O

O

328.41

Water-soluble silane; anti-pilling agent for textiles.
Hydrolysis product catalytically hydrates olefins, forming alcohols.1
Forms corrosion resistant films for magnesium alloys.2
1. Young, F. et al. U.S. Patent 3,816,550, 1974.
2. Kramov, A. et al. Thin Solid Films 2006, 174, 514.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[757-44-8]
TSCA EC 212-056-5 HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

141° / 2Flashpoint: 70°C (158°F)

25g ¥17,200(215) 547-1015

100g ¥48,300

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SID3415.0

DIETHYLSILANE
C4H12Si
88.22
56°(-132°)
0.6837
Viscosity, 25°: 0.4 cSt.
Flashpoint: -20°C (-4°F)
ΔHcomb: -3,981 kJ/mole
Autoignition temperature: 218°C
ΔHform: -155 kJ/mole
ΔHvap: 30.1 kJ/mole
Employed in oxygen plasma assisted deposition of SiO2 for microelectronics.1
Directs the borylation of N-containing heterocycles.2
Allows direct functionalization of C-H bonds. Forms 1,3-diols from alcohols in good yields.3
Reduces esters to aldehydes in excellent yields.4
1. Levy, R. et al. Chem. Mater. 1993, 5, 1710.
2. Robbins, D. W. et al. J. Am. Chem. Soc.. 2010, 132, 4068.
3. Simmons, E. M.; Hartwig, J. F. Nature 2012, 483, 70; DOI: 10.1038/nature10785
4. Cheng, C.; Burkhart, M. Angew. Chem., Int. Ed. Engl. 2012, 51, 9422.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[542-91-6]
TSCA EC 208-834-9 HMIS: 3-4-1-X
10g ¥15,100
50g ¥50,100

Si
H

O
O
F

H

1.3921

SID3418.0

Si

1,3-DIETHYLTETRAMETHYLDISILOXANE
C8H22OSi2
190.43
155-6°(-120°)
0.7969Viscosity: 1.0 cSt
Flashpoint: 30°C (86°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2295-17-2]
HMIS: 2-3-0-X
25g ¥21,500
100g ¥61,800

SiO

1.4012PO

O

Forms α,β-unsaturated acids from carbonyls.1
1. Lombardo, L. et al. Synthesis 1978, 131.
F&F: Vol. 8, p 171.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[66130-90-3]
EC 266-171-0 HMIS: 2-2-1-X

Si

93° / 0.0005
Flashpoint: 44°C (111°F)

1.059

1.43000.842

1.41040.962

1.451810g ¥53,800

SID3425.0

1,3-DIETHYNYLTETRAMETHYLDISILOXANE
C8H14OSi2

Si

Si

O

182.37

122-8°
Flashpoint: 20°C (68°F)

End-capper for acetylene functional silicones
Useful in silicon-mediated Sonogashira cross-coupling reactions.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18204-93-8]
HMIS: 2-4-0-X Store <5°C

10g ¥59,100

SID3510.0Si

DI-n-HEXYLDICHLOROSILANE
Cl C12H26Cl2Si

Cl

269.33111-3° / 6
Flashpoint: 88°C (190°F)

See also SID3203.0, SID4400.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18204-93-8]
TSCA EC 242-093-2 HMIS: 3-2-1-X
10g ¥16,200

50g ¥54,400

PR

DIHYDROTETRAMETHYLDISILAZANE - see SIT7542.0 1,1,3,3-TETRAMETHYLDISILAZANEDIHYDROXYDIPHENYLSILANE - SID4560.0 DIPHENYLSILANEDIOLHOSiSILICONOOO

DIETHYL(TRIMETHYLSILOXYCARBONYLMETHYL)PHOSPHONATE, 95%
C9H21O5PSi
268.33

COMPOUNDS

SID3420.0

Reference Compound 2

OSi

1,3-DIHYDROXYTETRAMETHYLDISILOXANE
C4H14O3Si2

OH

166.33

(68°)

1.10

Condenses at room temperature to form cyclic and linear dimethylsiloxanes
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
HMIS: 2-3-0-X

SID3520.0

I

I

H

Si

H

DIIODOSILANE, 95%
H2I2Si283.9155-60° / 25
(-1°)
2.834
ΔHvap: 33.7 kJ/moleFlashpoint: 38°C (100°F)
Surface tension, 15°: 44.1 mN/mCleaves ethers; converts alcohols to iodides.1
Reagent for conversion of carbamates to ureas via isocyanates.2
1. Keinan, E. et al. J. Org. Chem. 1987, 52, 4846.
2. Gastaldi, S. et al. J. Org. Chem. 2000, 65, 3239.
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[13760-02-6]
HMIS: 3-2-2-X
10g ¥32,600

SID3526.0

DIISOBUTYLCHLOROSILANE
C8H19ClSi

Cl
Si

H

166-7°
Flashpoint: 42°C (108°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18279-73-7]
HMIS: 3-2-1-X
25g ¥38,500

www.AZmax.co.jp

TEL: 03-5543-1630

178.78

Gelest, Inc.

(215) 547-1015

0.995

www.gelest.com

1.4340

259

Name
Si

O

Mw

bp °C/mm

232.44221°(mp °C)

D420

nD20

0.845

1.41790.87

1.4167

SID3528.0

DIISOBUTYLDIETHOXYSILANE
C12H28O2SiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18297-14-8]
HMIS: 2-2-1-X

10g ¥27,800

SID3530.0
O

DIISOBUTYLDIMETHOXYSILANE
C10H24O2Si

OIntermediate for diisobutylsilanediol, a liquid crystal
Employed in polyolefin polymerization
See also SID3258.0, SID3391.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17980-32-4]
TSCA
HMIS: 2-1-1-X

204.39120° / 6
Flashpoint: 102°C (216°F)

25g ¥9,800

100g ¥24,100

COMMERCIALSi

2kg ¥125,400

SID3533.0(DIISOPROPYLAMINO)TRIMETHYLSILANE
C9H23NSi

Si

F

O

Si

F

S

O

O
O

O

F

S

O
O
F

N

F

O

F

F

173.37157°
Flashpoint: 28°C (82°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17425-88-6]
HMIS: 3-3-1-X

0.786

1.423285-6° / 2Flashpoint: >110°C (>230°F)

1.396

1.382

137°
Flashpoint: 22°C (72°F)

0.872

10g ¥38,500

SID3534.0

DIISOPROPYLBIS(TRIFLUOROMETHANESULFONYL)SILANE
C8H14F6O6S2Si
412.40

Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 241-248.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[85272-30-6]
HMIS: 3-2-1-X
10g ¥33,700

SID3535.0

DIISOPROPYLCHLOROSILANE
C6H15ClSi

150.72

Review of synthetic utility.1
Reduces β-hydroxyketones stereoselectively.2
Used in the tethered reactions of unsaturated alcohols.3
Used in the silicon-based cross-coupling of vinyl ethers with aryl iodides.4

Si

H
Cl

TBAF, APC (2.5 mol%)

1. t-BuLi, THF, -78 - 0°O

2. i-Pr2SiClH, -78 - 0°

O

I

Si
H

CO2Et

1.4278

CO2Et

O

PR

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 151-156.
2. Anwar, S. et al. Chem. Comm. 1986, 831.
3. Robertson, J. et al. Tetrahedron Lett. 1998, 39, 669.
4. Evans, P. A.; Baum, E. W. J. Am. Chem. Soc. 2004, 126, 11150.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[2227-29-4]
TSCA
HMIS: 3-4-1-X
5g ¥14,100
25g ¥45,900

SID3537.0

DIISOPROPYLDICHLOROSILANE
C6H14Cl2Si

185.1764-5° / 25
Flashpoint: 43°C (109°F)

1.026

1.4450

Review of synthetic utility.1
Forms bis(blocked) or tethered alcohols.2,3
Used as tether in ring-closing-metathesis (RCM) reaction.4
The bifunctional nature of the reagent allows for the templating of diverse groups in intermolecular reactions and ring formation.5

Cl

O

Cl

O
Si

Ph
Grubbs' catalyst
CH2Cl2, 40°
82%; Z:E 20:1

O

Si

O

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 222-228.
2. Bradford, C. et al. Tetrahedron Lett. 1995, 36, 4189.
3. Hutchinson, J. et al. Tetrahedron Lett. 1991, 32, 573.
4. Evans, P. A. et al. J. Am. Chem. Soc. 2003, 125, 14702.
5. Evans, P. A. et al. Angew. Chem., Int. Ed. Engl. 2003, 42, 1734.
See also SID3390.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[7751-38-4]
HMIS: 3-2-1-X
10g ¥9,000
50g ¥25,700
1kg ¥203,000

260

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALSi

PhEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

85-7° / 50
0.875Flashpoint: 43°C (109°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 240°C

1.4140

SID3538.0

O

176.33

Cocatalyst for α-olefin polymerization.1
1. Lee, S. et al. U.S. Patent 5,223,466, 1993.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18230-61-0]
TSCA
HMIS: 3-2-1-X

10g ¥7,200

50g ¥18,300

COMMERCIAL

O

Si

Si

DIISOPROPYLDIMETHOXYSILANE
C8H20O2Si
Viscosity: 1.0 cSt

2kg ¥146,000

SID3539.0

DIISOPROPYLETHOXYSILANE
C8H20OSiO
H

160.33

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[90633-16-2]
HMIS: 2-3-1-X

148°
Flashpoint: 35°C (95°F)

0.745

10g ¥34,700

Si

Si
O

H

O

0.70851.404125

10g ¥35,300

337.36

Intermediate for stable disilenes.1
1. West, R. et al. Science 1981, 214, 1343.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5599-27-9]
HMIS: 3-1-1-X

SID3543.0

2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE
C7H18N2O2Si

O

190.32(120-1°)
Flashpoint: >110°C (>230°F)

5g ¥52,200

71-3° / 2.5(61-2°)

Volatile coupling agent
See also SIB1932.4, SID3543.1
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[182008-07-7]
HMIS: 3-2-1-X
25g ¥27,800

SID3543.1

N
Si

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18209-66-0]
HMIS: 2-4-1-X

98-9°
Flashpoint: -11°C (13°F)

2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE, 10% in cyclohexane
C7H18N2O2Si
190.32O

0.79

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[182008-07-7]
25g ¥16,200

DIMETHOXYMETHYLSILYLPROPANETHIOL - see SIM6474.0 3-MERCAPTOPROPYLMETHYLDIMETHOXYSILANE

O

O
Si
O

O

3,5-DIMETHOXYPHENYLTRIETHOXYSILANE
C14H24O5Si

300.43

Adhesion promoter; cross-coupling reagent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

PRO

SID3544.0

136-8° / 0.6

1.050

5g ¥49,900

COMPOUNDS

N

HN

116.27

DIMESITYLDICHLOROSILANE
C18H22Cl2Si

H

HN

H

DIISOPROPYLSILANE
C6H16Si

SID3540.0

Cl

Si

H

SILICONCl

O
O
F

SID3539.4

SID3544.6

O

Si

Si

O

1,2-DIMETHOXYTETRAMETHYLDISILANE
C6H18O2Si2

178.38See also SID3395.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[10124-62-6]
HMIS: 3-4-1-X

S

O

138°
Vapor pressure, 43°: 1 5 mm

0.86831.44055g ¥29,400

SID3545.0

Si

2,2-DIMETHOXY-1-THIA-2-SILACYCLOPENTANE
C5H12O2SSi

164.2957-8° / 7

1.094

Reagent for modification of silver and gold surfaces; coupling agent for rubber
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[26903-85-5]
HMIS: 3-3-1-X
25g ¥27,100

O

SID3546.5

N

Si

Cl

(N,N-DIMETHYLAMINO)DIMETHYLCHLOROSILANE, 95%
C4H12ClNSi
137.68108-9°
0.908
Hazy liquidFlashpoint: 7°C (45°F)
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[18209-60-4]
TSCA EC 242-095-3 HMIS: 3-4-2-X
10g ¥19,400

SID3546.6(N,N-DIMETHYLAMINO)DIMETHYLSILANE, 95%

N

Si

H

DIMETHYLSILYLDIMETHYLAMINE

C4H13NSi
103.24
67-8°
Contains HMe2SiOSiMe2H
Flashpoint: -13°C (8°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[22705-32-4]
TSCA EC 245-162-5 HMIS: 3-4-1-X
10g ¥13,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.726
50g ¥43,800

www.gelest.com

261

Name
N

Si

Mw

bp °C/mm(mp °C)

D420

nD20

SID3546.8

H(DIMETHYLAMINO)METHYLETHOXYSILANE, tech-95
C5H15NOSi

100-1°
Flashpoint: 2°C (36°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[96836-74-7]
HMIS: 3-4-1-X
10g ¥25,200

O

133.27(DIMETHYLAMINO)OCTYLDIMETHYLSILANE - see SIO6711.3 n-OCTYLDIMETHYL(DIMETHYLAMINO)SILANE

SID3546.9

N

Si

N,N-DIMETHYLAMINOPENTAMETHYLDISILANE
C7H21NSi2

156°
Flashpoint: 22°C (72°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[26798-98-1]
HMIS: 3-3-1-X
25g ¥49,600

SiO

1.4431(N,N-DIMETHYL-3-AMINOPROPYL)METHYLDIMETHOXYSILANE
C8H21NO2Si
191.360.894

1.42030.94825

1.41500.80441.43250.741

1.397092° / 25

O
O
F

Si

0.75

SID3546.94

ON

175.42

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67353-42-8]
HMIS: 2-2-1-X

10g ¥21,500

SID3547.0

O
Si

N
O

(N,N-DIMETHYL-3-AMINOPROPYL)TRIMETHOXYSILANE
C8H21NO3Si

207.34

Derivatized silica catalyzes Michael reactions.1
1. Mode, J. et al. Synlett 1998, 625.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2530-86-1]
TSCA EC 219-786-3 HMIS: 2-2-1-X

O

106° / 30
Flashpoint: 99°C (210°F)

10g ¥12,500

50g ¥39,500

5-DIMETHYLAMINO-N-(3-TRIETHOXYSILYLPROPYL)NAPHTHALENE-1-SULFONAMIDE see SIT8187.0 N-(TRIETHOXYSILYLPROPYL)DANSYLAMIDE

SID3603.0

N(N,N-DIMETHYLAMINO)TRIETHYLSILANE
C8H21NSiSi

159.35HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3550-35-4]
HMIS: 3-3-1-X

166-7°
Flashpoint: 26°C (79°F)
50g ¥41,900

SID3605.0(N,N-DIMETHYLAMINO)TRIMETHYLSILANETMSDMA, PENTAMETHYLSILANAMINE

C5H15NSi
117.2785-6°
ΔHvap: 31.8 kJ/moleFlashpoint: -19°C (-2°F)
Selectively silylates equatorial hydroxyl groups in prostaglandin synthesis.1
Stronger silylation reagent than HMDS; silylates amino acids.2

Me

Si

OMe

PR

N

Me3SiNMe2
Me3SiOTf, CH2Cl2, 25°C

Dialkylaminotrimethylsilanes are used in the synthesis of pentamethinium salts.3
With aryl aldehydes converts ketones to α,β-unsaturated ketones.4
1. Yankee, E. et al. J. Am. Chem. Soc. 1972, 94, 3651.
2. Rühlman, K. Chem. Ber. 1961, 94, 1876.
3. Kořínek, M. et al. Synthesis 2009, 1291.
4. Mojtahedi, M. M. et al. Synthesis, 2011, 3821.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2083-91-2]
TSCA EC 218-222-3 HMIS: 3-4-1-X
25g ¥8,000

N

Me

H

COMMERCIAL

OMe

OTf

100g ¥20,100

2kg ¥207,000

SID4040.0

HN

HN

DIMETHYLBIS(s-BUTYLAMINO)SILANE, 95%
C10H26N2Si
Vapor pressure, 20°: 3 mm

202.42Si

82° / 15(<-50°)
0.81
Flashpoint: 40°C (104°F)
TOXICITY: oral rat, LD50: 907 mg/kg
Autoignition temperature: 225˚C (437˚F)

Chain extender for silicones
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[93777-98-1]
TSCA EC 298-130-8 HMIS: 3-3-1-X
25g ¥15,600

100g ¥43,200

SID4045.0

Si

262

Zr

DIMETHYL[BIS(CYCLOPENTADIENYL)SILYL] ZIRCONIUM DICHLORIDE
348.46
Color: yellow
Soluble: THF, methylene chloride
Catalyst for olefin polymerization
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[86050-32-0]
HMIS: 2-2-1-X
1.0g ¥64,400

Cl C12H14Cl2SiZr
Cl

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1.4271

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.849

1.42400.93

1.43725

SID4065.0(3,3-DIMETHYLBUTYL)DIMETHYLCHLOROSILANE
NEOHEXYLDIMETHYLCHLOROSILANE

C8H19ClSi

Si

Cl

178.78167°
Flashpoint: 38°C (100°F)

Blocking agent, forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[96220-76-7]
TSCA-L
HMIS: 3-3-1-X
25g ¥12,500

100g ¥32,600

SID4068.0

3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, tech-95
C15H33NO3Si
303.52134° / 5
Contains oligomers
Flashpoint: 131°C (268°F)
Preferred adhesion promoter for low viscosity epoxy systems
Coupling agent for epoxy coatings; blocked amine - moisture deblocked
O

O
O
F

O

CH3
CH

Si

O

CH2

OC2 H5CH3OC2 H5C NCH 2 CH2 CH2 Si+ H2 OOC2 H5

-

H3C
H3C

O

+ 3 H2 OO

H2 NCH 2 CH2 CH2 Si- 3 C2 H5 OH

CHCH2CCH3

See also SIM6572.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[116229-43-7]
TSCA
HMIS: 2-1-1-X

O

25g ¥7,700

100g ¥17,200

COMMERCIAL

H3 C

N

O

2kg ¥101,000

3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, 98%
C15H33NO3Si
303.52

O

O

Si

O

Cl

Si
Cl

Cl

Preferred adhesion promoter for low viscosity epoxy systems
Coupling agent for epoxy coatings; blocked amine - moisture deblocked
See also SIM6572.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[116229-43-7]
TSCA
HMIS: 2-1-1-X

134° / 5Flashpoint: 131°C (268°F)

0.93

1.43725

1.13551.44790.909

1.40680.868

1.382725g ¥25,700

SID4069.0(3,3-DIMETHYLBUTYL)TRICHLOROSILANE
NEOHEXYLTRICHLOROSILANE

C6H13Cl3Si

219.61

183-4°
Flashpoint: 68°C (155°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[105732-02-3]
HMIS: 3-3-1-X
25g ¥16,200

SILICONN

COMPOUNDS

SID4068.1

SID4069.4(3,3-DIMETHYLBUTYL)TRIETHOXYSILANE

O
Si

O

C12H28O3Si

248.44HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[41966-94-3]
HMIS: 2-2-1-X

PRO

NEOHEXYLTRIETHOXYSILANE

54-5° / 1.5
Flashpoint: 83°C (181°F)
25g ¥28,900

SID4070.0

DIMETHYLCHLOROSILANE, 98%
C2H7ClSi
ΔHvap: 26.2 kJ/mole
Surface tension: 17.1 mN/mUndergoes hydrosilylation reactions
Review of synthetic utility.1
Enantioselectively converts α-hydroxyketones to 1,2-diols.2

O

H

O

OH

+ ClMe2SiH

OSiMe2H

Et3N

O[Rh(cod)(diphosphine)]+ —OTf
CH2Cl2, rt, 24 h

36°(-111°)
Flashpoint: -25°C (-13°F)
Critical temperature: 202°C
Specific heat: 1.13 J/g/°
Thermal conductivity: 0.116 W/m˚K

COMMERCIAL

Si

Cl

94.62

OSiMe2HO SiMe2
O

K2CO3

OH

MeOH

OH

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 156-157.
2. Burk, M. J.; Feaster, J. E. Tetrahedron Lett. 1992, 33, 2099.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[1066-35-9]
TSCA EC 213-912-0 HMIS: 3-4-2-X
25g ¥4,900
750g ¥30,700
15kg ¥334,000(DIMETHYLCHLOROSILYL)(CHLOROMETHYLPHENYL)ETHANE see SIC2295.0 ((CHLOROMETHYL)PHENYLETHYL)DIMETHYLCHLOROSILANE

www.AZmax.co.jp

TEL: 03-5543-1630

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(215) 547-1015

www.gelest.com

263

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.957

1.478

SID4074.0(DIMETHYLCHLOROSILYL)METHYL-7,7-DIMETHYLNORPINANE

2-[(CHLORODIMETHYLSILYL)METHYL]-6,6-DIMETHYLBICYCLO[3.1.1]HEPTANE

Si
Cl

C12H23ClSi
230.8593-4° / 2
1*S,2*S,5*S
Flashpoint: 92°C (198°F)[α]d: -5.15; >95% optical purity
Acetylenic derivative forms chiral polymer membrane that resolves amino acids.1
1. Aoki, T. et al. Makromol. Chem., Rapid Commun. 1992, 13, 565.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[72269-53-5]
TSCA EC 218-562-2 HMIS: 3-2-1-X
10g ¥13,300

SID4074.4

3-4

Primarily trimer and tetramer
Hydrophobic surface treatment for silica
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA
HMIS: 2-4-1-X

0.69

Flashpoint: -23°C (-9°F)
100g ¥8,800

1.5kg ¥46,300

12kg ¥280,000

O
O
F

H
Si N

COMMERCIAL

1,1-DIMETHYLCYCLOSILAZANES, 22-25% in hexane

SID4075.0

Si O

3-6

222.5 - 445.0

132-245°

Polymerization grade cyclics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
TSCA
HMIS: 1-3-0-X

COMMERCIALDIMETHYLCYCLOSILOXANES, 99%((CH3)2SiO)3-6

0.96

2kg ¥18,800

17kg ¥88,000

SID4076.0

O

O

Si

O

DIMETHYLDIACETOXYSILANE
C6H12O4Si

O

176.24

164-6°
Flashpoint: 37°C (99°F)

Reagent for the preparation of cis-diols and corticosteroids.1
1. Kelley, R. J. Chromatogr. 1969, 43, 229.
F&F: Vol. 3, p. 113.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 9-1939[2182-66-3]
TSCA EC 218-562-2 HMIS: 2-3-1-X

100g ¥13,800

1.054

1.40300.834

1.4058500g ¥45,900

SID4080.0

O

Si

O

DIMETHYLDI-n-BUTOXYSILANE
C10H24O2Si
204.38Viscosity: 2 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1591-02-2]
TSCA EC 216-467-0 HMIS: 2-2-1-X

82° / 12Flashpoint: 79°C (174°F)
25g ¥12,700

SID4120.0

Si

Cl

Me2
Si

O

OTPS

OPMB

Cl

O

{Mo}-catalyst
C6H6, 20°C, 24 h

Me2
Si

OTPS

OPMB
I

I

Aids in the intramolecular Pinacol reaction.
HO

O

1.4055

COMMERCIALPR

DIMETHYLDICHLOROSILANE, 98%
C2H6Cl2Si
129.0670-1°(-76°)
1.0637
AIR TRANSPORT FORBIDDEN
Viscosity: 0.47 cSt
Flashpoint: -10°C (14°F)
Vapor pressure, 17°: 100 mm
TOXICITY: ihl rat, LC50: 930 ppm/4HSpecific heat: 0.92 J/g/°
Autoignition temperature: 410˚C
ΔHcomb: -2,055 kJ/mole
Critical temperature: 247.2°C
ΔHvap: 33.5 kJ/mole
Critical pressure: 34.4 atm
Surface tension: 20.1 mN/m
Flammability limit: 3.4-10.4%
Coefficient of thermal expansion: 1.3 x 10-3
Fundamental monomer for silicones
Review of synthetic utility.1
Employed in the tethering of two olefins for the cross metathesis-coupling step in the synthesis of Attenol A.2

3

1. Me2SiCl2, Mg-Al

CHO

2. NaOHaq

H
HOHO

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 228-230.
2. Van de Weghe, P. et al. Org. Lett. 2002, 4, 4105.
3. Corey, E. J.; Carney, R. L. J. Am. Chem. Soc. 1971, 93, 7318.
F&F: Vol. 3, p 114; Vol. 4, p 183.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[75-78-5]
TSCA EC 200-901-0 HMIS: 3-4-2-X
500g inquire
18kg inquire* zDR-S-019 or zCYL-S-019 container required - not included

264

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(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SID4120.1

Si

Cl

DIMETHYLDICHLOROSILANE, 99+%
C2H6Cl2Si
129.0670-1°(-76°)
1.06371.4055
AIR TRANSPORT FORBIDDEN
Redistilled
Flashpoint: -10°C (14°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[75-78-5]
TSCA EC 200-901-0 HMIS: 3-4-2-X
25g inquire
500g inquire
18kg inquire* zDR-S-019 or zCYL-S-019 container required - not included

COMMERCIALCl

SID4121.0O

1.3805OO
FO

114-5°(-97°)
0.8395Flashpoint: 11°C (52°F)
TOXICITY: oral rat, LDLo: 1,000 mg/kg
Vapor pressure, 25°: 15 mm
Coefficient of thermal expansion: 1.3 x 10-3

COMMERCIALSi

DIMETHYLDIETHOXYSILANE, 98%
C6H16O2Si
148.28Viscosity: 0.53 cSt
ΔHcomb: -4,684 kJ/mole
ΔHform: 837 kJ/mole
ΔHvap: 41.0 kJ/mole
Dipole moment: 1.39 debye
Hydrophobic surface treatment and release agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[78-62-6]
TSCA EC 201-127-6 HMIS: 2-4-1-X

100g ¥5,400

2kg ¥33,300

15kg ¥278,000

SID4122.0

F

DIMETHYLDIFLUOROSILANE
C2H6F2Si
AIR TRANSPORT FORBIDDEN

96.15

2-3°

(-88°)

Flashpoint: <0°C (<32°F)
Vapor pressure, 20°: 2.38 atm (35 psia)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[353-66-2]
TSCA EC 206-540-5 HMIS: 4-4-1-X
50g inquire* includes gas dispensing cylinder zCYL-G-0325

SID4123.0O25g ¥3,400

2kg ¥32,200

1.370815kg ¥209,000

SID4123.1

Si

DIMETHYLDIMETHOXYSILANE, 99+%ODMDMOS

C4H12O2Si

120.22

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1112-39-6]
TSCA EC 214-189-4 HMIS: 3-4-1-X

O

25g ¥6,400(-80°)

0.86461.3708500g ¥14,500

2,5-DIMETHYL-2,5-DISILAHEXANE - see SIT7537.0 1,1,4,4-TETRAMETHYL-1,4-DISILABUTANEDIMETHYLDIVINYLSILANE - see SID4606.0 DIVINYLDIMETHYLSILANE

PR
H

82°

SILICONO

82°(-80°)
0.8646
Flashpoint: -8°C (18°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 325˚C
Vapor pressure, 36°: 100 mm
Coefficient of thermal expansion: 1.3 x 10-3

COMMERCIALSi

DIMETHYLDIMETHOXYSILANE, 96%
C4H12O2Si
120.22
Contains methanol
Viscosity, 20˚: 0.44 cSt
ΔHcomb: 3,483 kJ/mole
ΔHform: 716 kJ/mole
Dipole moment: 1.33 debye
Provides hydrophobic surface treatments in vapor phase applications
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[1112-39-6]
TSCA EC 214-189-4 HMIS: 3-4-1-X

COMPOUNDSSiF

SID4125.0

Si

DIMETHYLETHOXYSILANE
C4H12OSi
Vapor pressure, 25°: 281 mm

O

104.22

Undergoes hydrosilylation reactions
Waterproofing agent for space shuttle thermal tiles.1
1. Hill, W. et al. Polym. Mater. Sci. Eng. 1990, 62, 668.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[14857-34-2]
TSCA EC 238-921-7 HMIS: 2-4-1-X

54-5°
0.757
Flashpoint: 15°C (59°F)
TOXICITY: oral rat, LD50: 5,000 mg/kg

25g ¥13,000

1.3683100g ¥34,200

DIMETHYLETHOXYVINYLSILANE - see SIV9072.0 VINYLDIMETHYLETHOXYSILANE

SID4145.0

Si

H
F

DIMETHYLFLUOROSILANE
C2H7FSi
78.16-9°(-115°)AIR TRANSPORT FORBIDDEN
ΔHvap: 23.4 kJ/mole
Undergoes hydrosilylation reactions
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[865-46-3]
HMIS: 4-4-1-X
25g inquire* includes gas dispensing cylinder zCYL-G-0325

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

265

Name

Si

Mw

bp °C/mm(mp °C)

D420

nD20

0.95325

1.3865SID4210.0

Cl

DIMETHYLMETHOXYCHLOROSILANE, tech-90
C3H9ClOSi
124.6477°
Contains dimethyldimethoxysilane
Flashpoint: -9°C (16°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2051[1825-68-9]
TSCA
HMIS: 3-4-1-X
25g ¥17,800

O100g ¥49,900

Reference Compound 4

DIMETHYLMETHYLENESILANE
C3H8SiSi

72.18

Transient intermediate
Synthesis: Barton, T. et al. J. Chem. Soc., Chem. Commun. 1972, 15, 861.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
[4112-23-6]

O
O
F

DIMETHYLOCTADECYLCHLOROSILANE - see SIO6615.0 n-OCTADECYLDIMETHYLCHLOROSILANEDIMETHYLPHENYLSILANE - see SIP6729.0 PHENYLDIMETHYLSILANE
2,2-DIMETHYL-2-SILA-3-CHLOROBUTANE - see SIC2275.0 1-CHLOROETHYLTRIMETHYLSILANE

SID4220.4

DIMETHYLSILA-11-CROWN-4, 95%OO

1,1-DIMETHYL-1,3,6,9,11-TETRAOXA-1-SILACYCLOUNDECANE

C8H18O4Si

O

Si

O

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18339-94-1]
EC 242-221-7 HMIS: 3-2-0-X

96° / 9Flashpoint: 77°C (171°F)

1.07

1.44871.08

1.452225g ¥17,200

SID4220.5

O

DIMETHYLSILA-14-CROWN-5, 95%

O

2,2-DIMETHYL-1,3,6,9,12-PENTAOXA-2-SILACYCLOTETRADECANE

O
O

206.31

C10H22O5Si

O

Si

250.37

Potential Li ion electrolyte
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[70851-49-9]
TSCA EC 274-934-4 HMIS: 2-1-0-X

125-9° / 0.5
Flashpoint: >110°C (>230°F)
TOXICITY: oral rat, LD50: 9,900 mg/kg
25g ¥18,000

SID4220.6

O

O

O

O
O

Si

O

DIMETHYLSILA-17-CROWN-6, 90%
C12H26O6Si
294.42
168-70° / 0.3
Contains other homologs
Flashpoint: >110°C (>230°F)
ΔH K+ complex formation: 33 kJ/mole
Phase transfer catalyst.1
Catalyst for cyanoacrylate polymerization on surface insesnsitive stubstrates.2
Forms functional hybrid carbon electrodes.3
1. Arkles, B. et al. Organometallics 1983, 2, 454.
2. O’Connor, J. Chemtech 1994, 24(9), 51.
3. Colilla, M. et al. Comptes Rendus Chimie 2010, 13, 227.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83890-22-6]
TSCA EC 281-175-2 HMIS: 2-1-0-X
10g ¥17,200

SID4220.7

DIMETHYLSILA-20-CROWN-7, 90%
C14H30O7Si
338.47
Contains other homologs
Ionophore selective for K+ ions
Inhibits ion mobility in electrical resins
Se also SID4221.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83890-23-7]
HMIS: 2-1-0-X

PR

O
O

O

O

O

O

Si

1.09

O

274-7° / 1
Flashpoint: >110°C (>230°F)

1.092

5g ¥21,700

SID4221.0

DIMETHYLSILACROWNS, mixed
C12H26O6Si

125-295° / 0.3
1.09
Flashpoint: >110°C (>230°F)
Contains: 70-75% Dimethylsila-17-crown-6, 10-20% dimethylsila-14-crown-5, 10-20% dimethylsila-20-crown-7
Low cost phase transfer catalyst
Reduces cure time for cyanoacrylates on cellulosic substrates.1
1. Lui, J. U.S. Patent 4,906,317, 1990.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83890-22-6] / [83890-23-7]
TSCA
HMIS: 2-1-0-X
25g ¥13,000
100g ¥34,200

266

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Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SID4230.0

DIMETHYLSILANE
2MS

C2H8Si60.17-20°(-150°)
0.68-20
ΔHcomb: -2,612 kJ/moleFlashpoint: <-40°C (<-40°F)
ΔHform: -96 kJ/mole
Vapor pressure, -80: 30 mm
ΔHvap: 23.0 kJ/mole
Dipole moment: 0.75 debye
CVD precursor for low k dielectric layers in damascene metallization applications
Generates cubic silicon carbide by plasma CVD.1
Epitaxial growth of cubic silicon carbide carried out by triode plasma CVD.2
1. Hashim, A. et al. Semiconductor Electronics, IEE Int’l. Conf. Proc. 2006, 646.
2. Yasuiet, K. et al. Appl. Surf. Sci. 2000, 159, 556.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1111-74-6]
TSCA EC 214-184-7 HMIS: 3-4-1-X
50g inquire* includes gas dispensing cylinder zCYL-G-0325

H

Si

H

Si

Reference Compound 5

O
O
F

OH

DIMETHYLSILANEDIOLC2H8O2Si

92.17(98-8°)

1.097

1.45425

Condenses at room temperature to form cyclic and linear dimethylsiloxanes
Synthesis: Hyde, J. J. Am. Chem. Soc. 1953, 75, 2166.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
[1066-42-8]

OH

SID4234.0

130.26

Undergoes ring-opening polymerization
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5833-47-6]
TSCA EC 227-416-7 HMIS: 2-4-0-X

Si

122-5°
Flashpoint: 14°C (57°F)
10g ¥15,600

1.426050g ¥47,700

DIMETHYLSILAPENTANESULFONATE - see SIT8599.0 TRIMETHYLSILYLPROPANESULFONIC ACID, SODIUM SALTDIMETHYLSILAZANE TETRAMER - see SIO6698.0 OCTAMETHYLCYCLOTETRASILAZANEDIMETHYLSILAZANE TRIMER - see SIH6102.0 1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE
1,1-DIMETHYLSILETANE - see SIC2570.0 CYCLOTRIMETHYLENEDIMETHYLSILANE

H

H

Si

Si

H

H

SID4235.0

1,4-DIMETHYLDISILETHANE

1,2-ETHANEDIYLBIS(METHYLSILANE), 2,5-DISILAHEXANE

C4H14Si2

118.33

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[4405-22-5]
HMIS: 3-4-1-X

96-8°
Flashpoint: -12°C (10°F)

0.726

1.422010g ¥35,300

DIMETHYLSILYLDIMETHYLAMINE - see SID3546.6 (N,N-DIMETHYLAMINO)DIMETHYLSILANE
1,4-DIMETHYL-1,1,4,4-TETRACHLORO-1,2-DISILETHYLENE - see SIB1614.0 BIS(METHYLDICHLOROSILYL)ETHANE

SID4236.0

O

Si

Si

1,3-DIMETHYLTETRAMETHOXYDISILOXANE, 95%
C6H18O5Si2

O

226.38HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18186-97-5]
TSCA EC 242-072-8 HMIS: 3-3-1-X

PR

O

O

O

165°
Flashpoint: 30°C (86°F)
10g ¥13,000

1.010

1.3834COMPOUNDSOSILICON

1,1-DIMETHYL-1-SILA-2-OXACYCLOHEXANE, 96%
C6H14OSi

50g ¥41,400

SID4238.0

Si

1,2-DIMETHYL-1,1,2,2-TETRAPHENYLDISILANE
C26H26Si2

Si394.66(142-4°)

Reacts with Li to form diphenylmethylsilyl lithium
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1172-76-5]
TSCA EC 214-632-1 HMIS: 2-2-0-X

10g ¥27,300

DIMETHYLTHEXYLSILYL CHLORIDE - see SIT7906.0 THEXYLDIMETHYLCHLOROSILANE

SID4241.0

O

O

Si
O

+
N

O
S

O

3-{[DIMETHYL(3-TRIMETHOXYSILYL)PROPYL]AMMONIO}PROPANE-1-SULFONATE, tech 95
C11H27NO6SSi
329.50White, hygroscopic solid
Zwitter-ionic betaine
O
Inhibits aggregation of silica nanoparticles.1,2
A viable option to PEGylation in preventing protein adsorption to silica.2
1. Estephan, Z. G. et al. Langmuir, 2010, 26, 16884.
2. Estephan, Z. G. et al. Langmuir, 2011, 27, 6794.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[151778-80-2]
HMIS: 3-2-1-X
25g ¥28,900

N,N-DIMETHYLTRIMETHYLSILYLAMINE - see SID3605.0 (N,N-DIMETHYLAMINO)TRIMETHYLSILANE

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

267

Name

O

O

bp °C/mm(mp °C)

D420

nD20

0.954

1.4091SID4245.0

O

P

Mw

O,O’-DIMETHYL(TRIMETHYLSILYL)PHOSPHITE, tech-95
C5H15O3PSi

182.23Carries out phosphonylations of aldimines.
1. Das, B, et al. J. Org. Chem. 2009, 74, 4393.
2. Hatano, M. et al. Tetrahedron Lett. 2009, 50, 3171.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[36198-87-5]
EC 252-908-3 HMIS: 3-2-1-X
1,2Si

73-7° / 56
Flashpoint: 38°C (100°F)

10g ¥24,700

SID4352.0

3-(2,4-DINITROPHENYLAMINO)PROPYLTRIETHOXYSILANE, 95%
N-[3-(TRIETHOXYSILYL)PROPYL]-2,4-DINITROPHENYLAMINE

C15H25N3O7Si
387.46
Viscous liquid or solid
UV max: 222, 258, 350(s), 410
Forms χ2 non-linear optical sol-gel materials by corona poling.1,2

O
Si

O

O

1. Toussaere, E. et al. Non-Linear Optics 1992, 2, 37.
2. Lebeau, J. et al. J. Mater. Chem. 1994, 4, 1855.
See also SIN6597.25
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[71783-41-0]
HMIS: 2-1-0-X

NO2

Cl

25g ¥24,100

SID4400.0

ClSi

1.5665

O
O
F

HN
O2N

(27-30°)Flashpoint: >110°C (>230°F)

DI-n-OCTYLDICHLOROSILANE
C16H34Cl2Si

6

325.44145° / 0.2

See also SIB1097.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18416-07-4]
HMIS: 3-2-1-X
25g ¥20,400

6

0.940

100g ¥58,300

SID4400.4

OSi

DI-n-OCTYLDIMETHOXYSILANE
C18H40O2Si

O6

316.60Hydrophobic surface treatment
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[947155-81-9]
HMIS: 3-2-1-X

6

132-4° / 0.2

0.854

1.438825g ¥33,200

SID4401.0

2-(DI-n-OCTYLMETHYLSILYL)ETHYLDIMETHYLCHLOROSILANE
C21H47ClSi2
391.23SiCl

165-6° / 0.1

0.859

Forms bonded phases for reverse phase chromatography
See also SIC2266.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[475213-03-7]
HMIS: 3-2-1-X
25g ¥35,300

Si

SID4401.5

Cl

2-(DI-n-OCTYLMETHYLSILYL)ETHYLTRICHLOROSILANE
C19H41Cl3Si2

Cl

432.06

166-8° / 0.1

0.966

Forms bonded phases for reverse phase HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl[475213-02-6]
HMIS: 3-2-1-X
25g ¥35,300

PR

Si

Si

SID4404.0

Si

NH

2

1,3-DI-n-OCTYL-1,1,3,3-TETRAMETHYLDISILAZANE
C20H47NSi2

357.77

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69519-51-3]
HMIS: 2-1-0-X

160-5° / 1
Flashpoint: >110°C (>230°F)

0.826

1.450010g ¥16,400

SID4406.0

1,3-DI-n-OCTYLTETRAMETHYLDISILOXANE
C20H46OSi2
358.76
122-5° / 0.2(-36°)
0.891
O
Viscosity, 25˚: 4.1 cSt
Flashpoint: >110°C (>230°F)
2End-capper for silicones with hydrocarbon compatibility used in cosmetics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18642-94-9]
HMIS: 2-1-0-X
25g ¥11,900
100g ¥30,800

Si1.474025

SID4465.0

N,N-DIOCTYL-N’-TRIETHOXYSILYLPROPYLUREA
C26H56N2O4Si

O

N

N
H

O

Si

O

268

O

488.83Forms hydrophobic phases with embedded hydrophilicity
Forms organic-inorganic vesicles (cerasomers).1
1. Hashizume, M. et al. J. Thin Solid Films 2003, 438, 20.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[259727-10-1]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

0.9242525g ¥26,800(215) 547-1015

www.gelest.com

1.452125

Enabling Your Technology
Name

Mw

bp °C/mm

391.88165° / 0.7(mp °C)

D420

nD20

SID4472.0

4,7-DIOXAOCTADECYLTRICHLOROSILANE, 95%
C16H33Cl3O2Si

Cl
Cl
O

O

Si

Cl

Forms C18 bonded phases with embedded hydrophilicity
See also SIB1815.1
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

1.028

10g ¥52,500

SID4480.0

2-(S)-[(DIPHENYL)(t-BUTYLDIMETHYLSILOXY)METHYL]PYRROLIDINEC23H33NOSi
367.59H(71-3°)HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[864466-71-7]
HMIS: 3-1-1-X

OSi

0.5g ¥67,100

SID4495.0

H

Si

Cl

O
O
F

DIPHENYLCHLOROSILANE, tech-95
C12H11ClSi

218.76143° / 10
Flashpoint: 105°C (221°F)

1.118

1.581

Review of synthetic utility.1
Precursor for silanediol-based peptidomimetic inhibitors.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 162.
2. Organ, M. G. et al. Org. Lett. 2002, 4, 2683.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 3-2634[1631-83-0]
TSCA EC 216-634-8 HMIS: 3-1-1-X
10g ¥18,800
50g ¥59,000

SID4510.0

ClCl

253.20304-5°(-22°)
1.2216
Flashpoint: 157°C (314°F)
TOXICITY: ipr mouse, LD50: 383 mg/kg
Vapor pressure, 125°: 2mm
Coefficient of thermal expansion: 0.7 x 10-3
Specific heat: 1.26 J/g/˚

Silicone monomer
Forms diol on contact with water
See also SID4588.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 3-2634[80-10-4]
TSCA EC 201-251-0 HMIS: 3-1-1-X
100g ¥7,300

1kg ¥23,000

1.5819COMMERCIALSiDIPHENYLDICHLOROSILANE, 95%
C12H10Cl2Si
Viscosity, 25˚: 4.1 cSt
ΔHvap: 62.8 kJ/mole
Dipole moment: 2.6 debye

20kg ¥265,000

COMPOUNDSDIPHENYLDIALLYLSILANE - see SID2749.0 DIALLYLDIPHENYLSILANEClDIPHENYLDICHLOROSILANE, 99%
C12H10Cl2Si

COMMERCIAL

Si

Cl

253.20304-5°(-22°)
1.2216
1.5819Flashpoint: 157°C (314°F)
TOXICITY: ipr mouse, LD50: 383 mg/kg
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 3-2634[80-10-4]
TSCA EC 201-251-0 HMIS: 3-1-1-X
25g ¥5,300
100g ¥11,000
750g ¥42,400

SID4525.0

SiO

272.42

Provides hydrophobic coatings with good thermal and UV resistance
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 3-2635[2553-19-7]
TSCA EC 219-860-5 HMIS: 2-1-0-X

167° / 15
Flashpoint: 175°C (347°F)
Vapor pressure, 125°: 2 mm
25g ¥5,000

1.0329100g ¥11,800

COMMERCIALDIPHENYLDIETHOXYSILANE
C16H20O2Si

O

SILICON

SID4510.1

PRN
H

1.52692kg ¥94,900

SID4530.0

Si

F
F

DIPHENYLDIFLUOROSILANE
C12H10F2Si
220.29156° / 50
1.145171.522125
ΔHvap: 54.0 kJ/moleFlashpoint: 87°C (189°F)
Dipole moment: 2.57 debye
Vapor pressure, 100°: 5 mm
Review of synthetic utility.1
Potential for the transfer of a phenyl group in silicon-based, Hiyama cross-coupling.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 276-277.
2. Hatanaka, Y. et al. Tetrahedron, 1994, 50, 8301.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[312-40-3]
TSCA EC 206-226-8 HMIS: 3-2-1-X
25g ¥19,400
100g ¥55,200

SID4535.0

O

DIPHENYLDIMETHOXYSILANE, 98%
C14H16O2Si
244.36
Viscosity, 25˚: 8.4 cSt
Intermediate for high temperature silicone resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 3-2635[6843-66-9]
TSCA EC 229-929-1 HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

161° / 15
Flashpoint: 121°C (250°F)
100g ¥7,200(215) 547-1015

1.07712kg ¥60,000

www.gelest.com

1.5447

COMMERCIAL

Si

O

18kg ¥343,000

269

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.128

1.5742SID4552.0

Cl

Si

O

Ni-Pr2O

1. n-BuLi, (-)-sparteine
Ph2MeSiCl, 70%

SiPh2MeO

2. DIBAL-H, 78%
3. PhNCO, 77%

COMMERCIALDIPHENYLMETHYLCHLOROSILANE
C13H13ClSi
232.78295°(-22°)
Viscosity: 5.3 cSt
Flashpoint: 141°C (286°F)
ΔHvap: 623.7 kJ/mole
Vapor pressure, 125°: 3 mm
Surface tension: 40.0 mN/m
Thermal conductivity: 0.112 W/m˚C
Review of synthetic utility.1
α-silylates esters, lactones; precursors to silyl enolates.2
C-Silylates carbamates as shown in the enantioselective example w/ a neryl carbamate.3

NHPh
O

O
O
F

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 381-388.
2. Larson, G. L. et al. J. Am. Chem. Soc. 1981, 103, 2418.
3. Duvold, T. et al. Biorg. Med. Chem. Lett. 2002, 12, 3569 and references therein.
F&F: Vol. 10, p 91; Vol. 12, p 321; Vol. 13, p 74.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 3-2461[144-79-6]
TSCA EC 205-639-0 HMIS: 3-1-1-X
25g ¥8,600
100g ¥31,000
1kg ¥84,400

SID4552.5(DIPHENYL)METHYL(DIMETHYLAMINO)SILANE
C15H19NSi

Si

241.41

See also SIT7753.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68733-63-1]
TSCA
HMIS: 3-3-1-XN

98-9° / 0.25

1.011

25g ¥16,200

SID4553.0

Si

DIPHENYLMETHYLETHOXYSILANE
C15H18OSi
242.39Viscosity, 25˚: 6.5 cSt
ΔHvap: 61.9 kJ/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 3-2639[1825-59-8]
EC 217-368-5 HMIS: 2-0-0-X

O

100-2° / 0.3(-27°)
Flashpoint: 165°C (329°F)
Vapor pressure, 125°: 3 mm
10g ¥10,300

1.018

1.544025

0.99731.569450g ¥31,000

SID4555.0

DIPHENYLMETHYLSILANE
C13H14Si
ΔHvap: 64.5 kJ/moleHSi

198.34

Employed in the kinetic resolution of racemic alcohols.1
1. Weickgenannt, A. et al. Angew. Chem., Int. Ed. Engl. 2010, 49, 2223.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[776-76-1]
TSCA EC 212-281-9 HMIS: 3-1-1-X

266-7°
Flashpoint: 120°C (248°F)
Vapor pressure, 100°: 1 mm

25g ¥14,100

100g ¥37,900

SID4555.5(DIPHENYLMETHYL)TRICHLOROSILANE
C13H11Cl3Si

PR

Cl

Si

301.67167-8° / 9(57-8°)

1.5821HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18089-94-6]
HMIS: 3-2-1-X
10g ¥45,900

Cl

Cl

SID4555.6(DIPHENYLMETHYL)TRIMETHOXYSILANE
C16H20O3Si

OSi

288.41HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

OO

120° / 1010g ¥40,600

SID4556.0

Si

O

Si

O

Si

O

Si

3,5-DIPHENYLOCTAMETHYLTETRASILOXANE, 95%
C20H34O3Si4
434.83140-5° / 0.4(-40°)
Viscosity, 20°: 6 cSt
Heat capacity, 27°: 1.569 kJ/kg°C
Surface tension, 25°: 32.5 mN/m
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[13270-97-8]
HMIS: 1-1-0-X
25g ¥17,800

0.979

1.47741.004

1.5630

SID4557.5

Si
P

270

O

(2-DIPHENYLPHOSPHINO)ETHYLDIMETHYLETHOXYSILANE
C18H25OPSi
316.46HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[359859-29-3]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

160° / 1
10g ¥41,600(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.05

1.5384SID4558.0

2-(DIPHENYLPHOSPHINO)ETHYLTRIETHOXYSILANE
C20H29O3PSi

P

182° / 1.3
Flashpoint: 134°C (273°F)

Immobilizing ligand for precious metals
Adhesion promoter for gold substrates in microelectronic applications.1
Forms stable bonds to silica and basic alumina suitable for catalyst immobilization.2
Forms luminescent gels on hydrolysis with (EtO)4Si and Eu(NO3)3.3
Used to immobilize an iridium catalyst for the enantioselective hydrogenation of aryl ketones.4
Used in the preparation of solid-phase Pd catalyst for Suzuki-Miyaura cross-coupling.5
1. Helbert, J. U.S. Patent 4,497,890, 1985.
2. Merchle, C. H. et al. Chem. Mater. 2001, 13, 3617.
3. Corriu, R. et al. J. Chem. Soc., Chem. Commun. 2001, 1116.
4. Liu, G. et al. Adv. Synth. Catal. 2008, 350, 1464.
5. Zhang, X. et al. Synthesis, 2011, 2975.
See also SIB1091.0, SID3385.0, SID4557.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18586-39-5]
TSCA EC 242-427-7 HMIS: 3-1-1-X
5g ¥15,400OSi

376.50

O

O
O
F

O

25g ¥51,200

SID4558.2

OP

Si

3-(DIPHENYLPHOSPHINO)PROPYLTRIETHOXYSILANE
C21H31O3PSi

O

390.53190° / 1
Flashpoint: >110°C (>230°F)

See also SIB1091.0, SID4558.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52090-23-0]
HMIS: 3-1-1-X

O

1.0g ¥26,300

SID4558.5

PSi

258.38120° / 0.2
Flashpoint: 10°C (50°F)

1.009

95-7° / 13Flashpoint: 98°C (208°F)

0.99691.6030COMPOUNDS(DIPHENYLPHOSPHINO)TRIMETHYLSILANE, 95%
C15H19PSi

Used in the synthesis of α,β-unsaturated 3-iminophosphines.
1. Shaffer, A. R.; Schmidt, J. A. R. Chem. Eur. J. 2009, 15, 2662.
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[17154-34-6]
HMIS: 3-3-1-X
5g ¥37,400
1

SID4559.0

H

Si

Reducing agent.1
Converts amides to aldehydes in combination with Ti(OiPr)4.2
Selective reduction of esters.3
Silylates 1,2-diols in presence of tris(pentafluorophenyl)borane.4
Used in enantioselective reduction of imines.5
1. F&F: Vol. 1, p 348.
2. Bower, S. et al. Angew. Chem., Int. Ed. Engl. 1996, 35, 1515.
3. Onta, T. et al. Tetrahedron Lett. 1999, 40, 6963.
4. Blackwell, J. M. et al. J. Org. Chem. 1999, 64, 4887.
5. Takai, I. et al. Organometallics 1999, 18, 2271.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[775-12-2]
TSCA EC 212-271-4 HMIS: 2-1-1-X

PRH

184.3125g ¥19,400

1.5795SILICON

DIPHENYLSILANE
C12H12Si100g ¥55,200

SID4560.0

OH
OH

COMMERCIALSiDIPHENYLSILANEDIOLC12H12O2Si
216.32(138-142° dec.)
ΔHcomb: 6,279 kJ/moleFlashpoint: >110°C (>230°F)
ΔHform: 1,046 kJ/mole
TOXICITY: ipr mouse, LD50: 2,500 mg/kg
Dipole moment: 1.74 debye
Bulk density: 0.4-0.5 g/ml
Anti-structuring (crepe hardening) additive for filled silicone elastomers
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 3-2638[947-42-2]
TSCA EC 213-427-4 HMIS: 2-1-0-X
100g ¥11,900500g ¥37,400

10kg ¥351,000

SID4582.0

H

Si

O

Si

O

O

Si

O

Si

Si

H

H

O

Si

H

1,3-DIPHENYLTETRAKIS(DIMETHYLSILOXY)DISILOXANE, 95%
C20H38O5Si6
527.03

Crosslinker for medium refractive index vinyl addition silicone elastomers
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[66817-59-2]
TSCA
HMIS: 2-1-1-X

95-6° / 0.25
Flashpoint: >110°C (>230°F)
5g ¥9,300

0.992

1.436725g ¥26,800

SID4584.0

SiSi

1,2-DIPHENYLTETRAMETHYLDISILANE
C16H22Si2
270.52111° / 1(34°)
0.9763
Optical bandgap: 6.0 eV
Flashpoint: 105°C (221°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1145-98-8]
HMIS: 2-1-0-X
10g ¥24,100
50g ¥86,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.5161

271

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.985

1.53840.976

1.5176SID4586.0

1,3-DIPHENYL-1,1,3,3-TETRAMETHYLDISILAZANE
C16H23NSi2

H
N

Si

Si

285.54HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3449-26-1]
TSCA EC 222-372-5 HMIS: 2-1-1-X

96-9° / 0.1
Flashpoint: 162°C (324°F)
5g ¥13,000

25g ¥41,600

SID4588.0

OSi

1,3-DIPHENYLTETRAMETHYLDISILOXANE
C16H22OSi2286.52155-8° / 13(-89°)
Viscosity: 3.45 cSt.
Flashpoint: 156°C (313°F)
ΔHvap: 56.1 kJ/moleSpecific heat: 1.76 J/g/°
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[56-33-7]
TSCA EC 200-265-4 HMIS: 2-1-0-X
50g ¥23,100

Si

SID4589.0

H(S)-(-)-[(DIPHENYL)TRIMETHYLSILOXYMETHYL]PYRROLIDINEC20H27NOSi
325.52

O
O
F

N
H

O

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[848821-58-9]
HMIS: 3-3-1-X

Si

5g ¥49,900

SID4589.5

DIPHENYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
C16H21PSi

Si

272.39139-43° / 0.6

1.005

1.581

0.80

1.429

0.80

1.43625

Air sensitive liquid
Used to make stable gold(I) complexes.1
1. Bardaji, M. Eur. J. Inorg. Chem. 1998, 989.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4451-96-1]
HMIS: 4-4-1-X
5g ¥77,700

P

DIPHENYLVINYLCHLOROSILANE - see SIV9074.0 VINYLDIPHENYLCHLOROSILANE

SID4590.0

O
K+ O

DIPOTASSIUM TRIS(1,2-BENZENEDIOLATO-O,O’)SILICATEC18H12K2O6Si

K+

O

Si

O

O

O

461.55(360°)

Undergoes reactions with Grignard reagents.1
1. Chuit, R. Chem. Rev. 1993, 93, 1371.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[101519-13-5]
HMIS: 2-0-0-X

2-

10g ¥20,400

SID4591.0

SiNH

1,3-DI-n-PROPYL-1,1,3,3-TETRAMETHYLDISILAZANE
C10H27NSi2

Si

217.51

See also SID4439.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14579-90-9]
HMIS: 3-2-1-X

84° / 9Flashpoint: 65°C (149°F)
25g ¥40,600

SID4592.0

1,3-DISILABUTANE

H

1-METHYLDISILMETHYLENE

C2H10Si2

90.27

PR

H

H

Si

Si

H

H

44-5°
Flashpoint: -19°C (-2°F)

For CVD of silicon carbide
Precursor for low temperature CVD of silicon carbide MEMS.1,2
1. Stoldt, C. et al. Sens.Actuators, A 2002, 97-8, 410.
2. Stoldt, C. et al. Appl. Phys. Lett. 2001, 347.
See also SIT8709.8
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[6787-86-6]
HMIS: 3-4-2-X store <5°C

5g ¥54,400

SID4593.0

1,4-DISILABUTANE

1,2-ETHANEDIYLBIS(SILANE)

H

H

Si

Si

H

H

H

H
H

272

Si

Si

C2H10Si2
90.27
45-6°
(-15°)
0.697
1.4141CAUTION: VAPORS HAVE BEEN REPORTED TO SPONTANEOUSLY IGNITE
Flashpoint: -31°’C (-24°F)
H
Autoignition temperature: 152˚C
1
Bonds to oxide-free titanium, gold and silicon substrates.
2
Forms 0.2-1.7% carbon doped silicon films.
1. Arkles, B. et al. J. Adhes. Sci. Technol. 2012, 26, 41.
2. Okada, L. et al. Surf. Sci. 1998, 418, 353.
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[4364-07-2]
HMIS: 2-4-2-X
5g ¥32,600

H

Reference Compound 3

H

Synthesis: Auner, N. et al. J. Organomet. Chem. 1980, 188, 1512.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
[287-55-8]

1,3-DISILACYCLOBUTANE
C2H8Si2

www.AZmax.co.jp

TEL: 03-5543-1630

88.26

Gelest, Inc.

57°(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

H

H

1,10-DISILADECANE
C8H22Si2

174.4435° / 0.3

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[4364-10-7]
HMIS: 2-3-1-X(mp °C)

D420

nD20

0.772

1.446110g ¥35,300

SID4594.0

H

Si

Si

H

H

-14.5°(-132°)

0.686-25

Autoignition temperature: <50˚C
Critical temperature: 158.85°C
Critical pressure: 50.63 atm
Employed in epitaxial deposition of silicon for solar and photoelectric devices.1
1. Lin, H. et al. Solid State Electron. 1996, 39, 1731.
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[1590-87-0]
EC 216-466-5 HMIS: 4-4-2-X
25g inquire* includes gas dispensing cylinder zCYL-HPS-0420-35

H

O
O
F

H

H

DISILANE, 99.9+%
H6Si2
62.22
CAUTION: PYROPHORIC, FORMS EXPLOSIVE MIXTURES WITH AIR
AIR TRANSPORT FORBIDDEN
Cylinder pressure: ~50 psi

SID4595.0

H

Si

Si

H

H

H

H

1,3-DISILAPROPANEDISILMETHYLENE

CH8Si2
76.24
CAUTION: PYROPHORIC, FORMS EXPLOSIVE MIXTURES WITH AIR
AIR TRANSPORT FORBIDDEN

14.7°

0.6974

1.41154

See also SIT8709.8
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[1759-88-2]
HMIS: 4-4-2-X
25g inquire* includes gas dispensing cylinder zCYL-G-0325

SID4598.0

Cl

Si

Cl

DI(p-TOLYL)DICHLOROSILANE, tech-95
C14H14Cl2Si
281.26225-6° / 50
Contains 4,4’-dimethylbiphenyl
Forms polymers with liquid crystal behavior.1
1. Lee, M. et al. Polymer 1993, 34, 4882.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18414-38-5]
HMIS: 3-2-1-X
10g ¥14,100

1.10

1.568

1.023

1.535325

1.08131.450950g ¥45,900

SiDI(p-TOLYL)DIMETHOXYSILANE
C16H20O2Si

O

272.42

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[92779-72-1]
HMIS: 3-2-1-X

O

140° / 0.5

25g ¥45,400

SID4600.0

Si

DIVINYLDICHLOROSILANE, 90%
C4H6Cl2Si

Cl

Cl

Si

O

118-9°
Flashpoint: 15°C (59°F)

Intermediate with t-BuLi for formation of silaspirocycles.
Intermediate through polydivinylsilazane or carbodiimide to Si-B-C-N ceramics.2
1. Goetze, B. et al. In Organosilicon III; Auner, N.; Weiss, J., Eds.; Wiley: 1997; p 102.
2. Muller, A. et al. Chem. Mater. 2002, 14, 3398.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2037[1745-72-8]
EC 217-118-5 HMIS: 3-4-1-X
5g ¥22,500

ClSi

153.09Cl

1SILICON

SID4599.0

COMPOUNDS

H

PR

H

H

Si

Si

bp °C/mm

SID4593.5

H

H

Mw

25g ¥79,800

SID4604.0

1,3-DIVINYL-1,3-DIMETHYL-1,3-DICHLORODISILOXANE
C6H12Cl2OSi2

227.2467° / 16
Flashpoint: 54°C (129°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15948-19-3]
EC 240-081-1 HMIS: 3-2-1-X
10g ¥16,200

1.090
50g ¥54,400

SID4606.0

DIVINYLDIMETHYLSILANE
C6H12SiSi

112.2582°
Flashpoint: 8°C (46°F)

Forms copolymers with maleic anhydride.1
Forms polyamine macrocycles on reaction with Li dialkylamides, e.g. LiEtNCH2CH2NEtLi.2
Forms “smart” silamine polymers on reaction with 3,6-diazaoctane.3
Potential vinyl nucleophile in cross-coupling reactions.4
1. Butler, G. et al. J. Polym. Sci. 1970, A1-8, 523.
2. Nagasaki, Y. et al. Chem. Lett. 1993, 1825.
3. Nagasaki, Y. et al. Chemtech 1997, 27(3), 23.
4. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[10519-87-6]
EC 234-060-6 HMIS: 2-4-0-X
5g ¥10,900

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.73371.417625g ¥33,200

www.gelest.com

273

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.001

1.5450

SID4607.0
Si

1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILAZANE
C18H23NSi2

Si

N
H

309.56

Employed in passivation of GC supports
Employed in “dip-pen” nanolithography.1
1. Ivanisevic, A. et al. J. Am. Chem. Soc. 2001, 123, 7887.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[23038-10-0]
HMIS: 2-1-1-X

118° / 1
Flashpoint: 165°C (329°F)

5g ¥32,100

SID4608.0

Si

1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANE
C18H22OSi2
310.54160° / 6
0.99525
Viscosity, 25˚: 4.7 cSt
Flashpoint: >110°C (>230°F)
End-capper for Pt cure silicone elastomers
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2627-97-6]
TSCA EC 220-101-5 HMIS: 2-1-0-X
10g ¥15,400
50g ¥53,800

SiO

1.531025

OO

Si

1,5-DIVINYL-3,3-DIPHENYL-1,1,5,5-TETRAMETHYLTRISILOXANE
C20H28O2Si3
384.70

Si

Si

Si

O
O

O

O

Si

1,5-DIVINYLHEXAMETHYLTRISILOXANE, 95%
C10H24O2Si3

Si

Si

Si

10g ¥19,400

Si
O

O

Si

80° / 20
Flashpoint: 32°C (90°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[136777-27-0]
HMIS: 1-3-0-X
10g ¥17,200Si

2-(DIVINYLMETHYLSILYL)ETHYLTRIETHOXYSILANE
C13H28O3Si2

288.5450g ¥58,600

79-81° / 0.15

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

0.895

5g ¥52,200

SID4610.5

1,5-DIVINYL-3-PHENYLPENTAMETHYLTRISILOXANE, 95%
C15H26O2Si3

322.63

O

117-8° / 5

10g ¥16,400

0.938

1.4646

0.96225

1.410025

0.7803

1.46130.819

1.440550g ¥55,400

119° / 19
Flashpoint: 58°C (136°F)
10g ¥18,800

SID4611.4

SiOSi

1,3-DIVINYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
C16H42O5Si6
483.0350g ¥65,000

120-5° / 5

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[94071-24-6]
EC 301-825-1 HMIS: 2-1-0-X

PRSi

306.51HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3682-26-6]
HMIS: 1-2-1-X

Si
O O

Si

1.4138SID4610.3

1,3-DIVINYLTETRAETHOXYDISILOXANE, 95%
C12H26O5Si2

OO

0.8619SID4611.0OSi

1.505750g ¥67,100

260.56HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17902-95-3]
HMIS: 1-1-0-X

O

0.976

SID4610.0OSi

141-4° / 1

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18586-22-6]
TSCA EC 242-426-1 HMIS: 1-1-0-X

O

Si

O
O
F

SID4609.0O10g ¥18,800

SID4614.0

1,4-DIVINYL-1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE
BIS(ETHENYLDIMETHYLSILYL)ETHANE

C10H22Si2

Si

Si

198.45165-9°
Flashpoint: 40°C (104°F)

Intermediate for curare analogs.1
Potential vinyl nucleophile in cross-coupling reactions.2
1. Tacke, R. et al. Z. Naturforsch., B: Anorg. Chem., Org. Chem. 1982, 37B, 1461.
2. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[84677-98-5]
HMIS: 2-2-0-X
10g ¥16,400

SID4611.6

SiSi

1,2-DIVINYLTETRAMETHYLDISILANE, 95%
C8H18Si2

170.4055° / 21

UV irradiation affords silene (Si=C) reactive intermediate
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1450-29-9]
HMIS: 2-3-1-X store <5°C

5g ¥33,700

SID4612.0

Si

274

N
H

Si

185.42

Adhesion promoter for negative photoresists
For silylation of glass capillary columns.1
1. Jaroniec, M. et al. J. High Resolut. Chromatogr. 1982, 5, 3.
See also SIT8736.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7691-02-3]
TSCA EC 231-701-1 HMIS: 3-3-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

160-1°
Flashpoint: 34°C (93°F)

50g ¥11,400(215) 547-1015

250g ¥35,300

www.gelest.com

2kg ¥133,300

COMMERCIAL

1,3-DIVINYL-1,1,3,3-TETRAMETHYLDISILAZANE
C8H19NSi2

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

139°
(-99°)
0.811
Flashpoint: 24°C (76°F)
TOXICITY: oral rat, LD50 >12,500 mg/kg

1.4123

SID4613.0

1,3-DIVINYLTETRAMETHYLDISILOXANE
C8H18OSi2SiO

Silicone end-capper
Potential vinyl nucleophile in cross-coupling reactions.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
See also SID4609.0, SID4610.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-483[2627-95-4]
TSCA EC 220-099-6 HMIS: 2-3-0-X

50g ¥6,000

2kg ¥110,000

COMMERCIAL

Si

186.4015kg ¥317,000

SID4616.0

1,3-DIVINYLTETRAPHENYLDISILOXANE, 95%
C28H26OSi2

434.6819

DOCOSENYLTRICHLOROSILANE, 90%,
C22H43Cl3Si
442.03
Contains internal isomers
Forms SAMs
Cl See also SIU9047.0, SID4623.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

Si
Cl

SID4618.0

DOCOSENYLTRIETHOXYSILANE, 95%
C28H58O3Si
470.88
Contains isomers
Forms self-assembled monolayers that can be modified to hydroxyls.1
1. Penansky, J. et al. Langmuir 1995, 11, 953.
See also SIA0482.0, SID4623.6, SIU9049.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[330457-44-8]
HMIS: 1-1-0-X

O
Si

19

O

O

Cl

Si

19

Cl

Cl

19

1.0g ¥41,100

DOCOSYLMETHYLDICHLOROSILANE, blend
C23H48Cl2Si
423.62
218-20° / 0.5(21-9°)
Contains C20 to C24 homologs
Flashpoint: 172°C (342°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[67892-56-2]
TSCA EC 267-590-1 HMIS: 3-1-1-X
50g ¥41,100

0.93

SID4621.0

PR
F F

F F

187-195° / 0.05

0.94

(18-22°)0.86

25g ¥34,200

SID4623.4

F F F F F F

F

1.0g ¥59,700

SID4620.0

DOCOSYLTRIETHOXYSILANE, blend
C28H60O3Si
472.87
Contains C20 to C24 homologs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 1-1-1-X

O

O

0.966

SID4622.0OSi

200-5° / 1

DOCOSYLTRICHLOROSILANE, blend
C22H45Cl3Si
444.04210° / 0.2(20-8°)
Contains C to C24 homologs
Flashpoint: 200°C (392°F)
Cl HYDROLYTIC20SENSITIVITY:
8: reacts rapidly with moisture, water, protic solvents[7325-84-0]
TSCA EC 230-802-8 HMIS: 3-1-1-X
25g ¥27,100

SiCl

5g ¥22,500

SID4617.0

COMPOUNDSCl

19(77-81°)

See also SID4608.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18769-05-6]
HMIS: 2-1-0-X

SILICON

Si

O

O
O
F

Si

Cl

Si

Cl DODECAFLUORODEC-9-ENE-1-YLTRICHLOROSILANE

C10H7Cl3F12Si

489.59Cl Forms self-assembled monolayers

Reagent for immobilization of DNA
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

F

1.0g ¥35,300

SID4623.6

F F F F F F

F

F F

F F

O

Si

F

O

O

DODECAFLUORODEC-9-ENE-1-YLTRIMETHOXYSILANE
C13H16F12O3Si

476.33Forms self-assembled monolayers
Reagent for immobilization of DNA
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

SID4625.0

O

Si

O

DODECAMETHYLCYCLOHEXASILOXANE
D6

Si

Si

O

O

Si
Si

O

Si

1.0g ¥35,300

O

C12H36O6Si6
445.93245°(-3°)
0.96721.4015
Viscosity, 25˚: 6.6 cSt
TOXICITY: oral rat, LD50: >1,000 mg/kg
ΔHcomb: -12,022 kJ/mole
Vapor pressure, 25˚: 0.03 mm
ΔHvap: 56.5 kJ/moleOctanol/water partition coefficient, log Kow: 6.3
Solubility, water, 23˚: 0.00513 mg/l
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-475[540-97-6]
TSCA EC 208-762-8 HMIS: 1-2-0-X
25g ¥20,400
100g ¥58,300
2kg ¥345,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

275

Name

Mw

bp °C/mm(mp °C)

D420

nD20

C12H36O4Si5
384.8491° / 3(-80°)
0.876
Viscosity, 25˚: 2.06 cSt
Flashpoint: 70°C (158°F)
ΔHcomb: -11,553 kJ/mole
Autoignition temperature: 430˚C
ΔHvap: 41.0 kJ/mole
Vapor pressure, 91˚: 3 mm
Surface tension: 18.7 mN/mSpecific heat: 1.352 J/g/°
Solubility parameter: 7.1
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[141-63-9]
TSCA EC 205-492-2 HMIS: 1-2-0-X
5g ¥8,800
25g ¥24,400

1.3925SID4626.0

DODECAMETHYLPENTASILOXANE
MD3M

O
Si

O

O

Si

Si

SID4627.0

Si

10

Si

O

DODECYLDIMETHYLCHLOROSILANE
C14H31ClSi

ClSi

LAURYLMETHICONEC19H46O2Si3
390.83180° / 3
Viscosity: 5.5 cSt
See also SIH6168.7, SIO6711.5
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[139614-44-1]
HMIS: 1-1-0-X
100g ¥24,700

O

10

Si

Cl

DODECYLMETHYLDICHLOROSILANE
C13H28Cl2Si

DODECYLMETHYLDIETHOXYSILANE
C17H38O2Si

SiO

DODECYLSILANE
C12H28Si

SiCl302.57140° / 0.5
Flashpoint: 152°C (305°F)

0.8452525g ¥22,500

200.440.7753

1.4382580° / 7120° / 3(-30°)
1.024
Flashpoint: 165°C (329°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[4484-72-4]
TSCA EC 224-769-9 HMIS: 3-1-1-X
25g ¥5,900
750g ¥54,000

1.4581

Forms SAMs on gold and titanium surfaces
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[872-19-5]
HMIS: 2-2-1-X
DODECYLTRICHLOROSILANE
C12H25Cl3Si

PR

Cl10g ¥24,100

303.77

SID4632.0

DODECYLTRIETHOXYSILANE
C18H40O3Si

O

25g ¥11,100

0.88425

1.433025

100g ¥28,400

SID4635.0

DODECYLTRIMETHOXYSILANE
C15H34O3Si

110-1° / 1
0.89425
1.428
Flashpoint: >110°C (>230°F)
Hydrophobic surface treatment that improves compatibility with hydrocarbon fluids and polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3069-21-4]
EC 242-332-4 HMIS: 3-2-1-X
25g ¥7,200
2kg ¥72,300
15kg ¥264,000

OO

152-3° / 3
Flashpoint: >110°C (>230°F)

SIE4661.0

Cl

Si

EICOSYLTRICHLOROSILANE, 95%
C20H41Cl3Si

225-7° / 3
Flashpoint: 230°C (446°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18733-57-8]
TSCA EC 242-545-9 HMIS: 3-0-1-X
25g ¥51,200

Cl

Cl

O

O

Si
O

290.52415.900.940

SIE4666.0

2-(3,4-EPOXYCYCLOHEXYL)ETHYLMETHYLDIETHOXYSILANE
C13H26O3Si
258.43
UV polymerizeable monomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14857-35-3]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

114-7° / 1

0.9762525g ¥26,800(215) 547-1015

www.gelest.com

1.424825

COMMERCIAL

Si

332.60HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18536-91-9]
TSCA EC 242-409-9 HMIS: 2-1-0-XO276

1.4581

SID4630.0

O

18

0.955

COMMERCIAL

Cl

10

1.4307

SID4629.6

H

H

O

283.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[60317-40-0]
TSCA EC 262-170-4 HMIS: 2-1-0-X

Si

Si

0.835

SID4629.0H

10(-14°)

124-7° / 3
Flashpoint: 143°C (289°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18407-07-3]
TSCA EC 242-286-1 HMIS: 3-1-1-X
25g ¥23,100

Cl
O

10

1.445

SID4628.0

Si

10

0.865

3-DODECYLHEPTAMETHYLTRISILOXANE, 95%Si

10291-3°

SID4627.6

O10

262.94HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[66604-31-7]
EC 266-421-9 HMIS: 3-2-1-X
25g ¥23,100

O
O
F

Si

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.015

1.4455

SIE4668.0
Si

O

O

Si

O

O

Si

N

246.382kg ¥93,500

95-7° / 0.25
1.065Flashpoint: 146°C (295°F)
TOXICITY: oral rat, LD50: 12,300 mg/kg
Vapor pressure, 152˚: 10 mm
Coefficient of thermal expansion: 0.8 x 10-3

Ring epoxide more reactive than glycidoxypropyl systems
UV initiated polymerization of epoxy group with weak acid donors
Forms UV-curable coating resins by controlled hydrolysis.1
Used to make epoxy-organosilica particles w/ high positive Zeta potential.2
1. Crivello, J.; Mao, Z. Chem. Mater. 1997, 9, 1554.
2. Nakamura, M.; Ishimura, K. Langmuir 2008, 24, 12228.
See also SIE4668.0, SIG5840.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 3-2647[3388-04-3]
TSCA EC 222-217-1 HMIS: 3-1-1-X
5,6-EPOXYHEXYLTRIETHOXYSILANE
C12H26O4Si

262.42

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[86138-01-4]
HMIS: 3-2-1-X

1.4490

サイラエース S530
100g inquire

100g ¥4,900
2kg inquire

1kg ¥9,300
18kg inquire

115-9° / 1.5
Flashpoint: 99°C (210°F)

0.96025

1.425425

10g ¥30,500

SIE4885.0

Si

N
Er

Si

N

Si

Si

ERBIUM TRIS(HEXAMETHYLDISILAZIDE)
C18H54ErN3Si6
648.43165° / 0.04 sub.
Color: pink
Employed in CVD of IR transmission optical materials.
Soluble: hexane, toluene, THF, dimethoxyethane
Dopant for semiconductors for optoelectonic applications.1
1. Just, O. et al. Mat. Res. Soc. Symp. Proc. 1996, 415, 111.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[103457-72-3]
HMIS: 2-1-1-X
5g ¥80,400(173-9°)SIE4885.8

O

H
N

Si

O

(3-(N-ETHYLAMINO)ISOBUTYL)METHYLDIETHOXYSILANE
C11H27NO2Si

233.43

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[275378-62-6]
HMIS: 3-2-1-X

89° / 2725g ¥25,200

SIE4886.0

O(3-(N-ETHYLAMINO)ISOBUTYL)TRIMETHOXYSILANE
C9H23NO3Si

Si

O

221.3795° / 100.95225
1.4234Flashpoint: 91°C (196°F)
Reacts with isocyanate resins (urethanes) to form moisture cureable systems
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[227085-51-0]
TSCA
HMIS: 3-2-1-X
25g ¥8,200
100g ¥18,800
2kg ¥104,100

COMMERCIALOHN

SILICONETHOXYTRIMETHYLSILANE - see SIT8515.0 TRIMETHYLETHOXYSILANE

PR

Si

100g ¥15,600

SIE4675.0

O

Si

O

25g ¥7,200

COMMERCIAL

Epoxy-silanes are essential for
performance of epoxy resin
encapsulants for microchipsO

サイラエース S810
2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIMETHOXYSILANE
C11H22O4Si
Viscosity: 5.2 cSt
γc of treated surfaces: 39.5 mN/mSpecific wetting surface: 317 m2/g

O
O
F

O

Adhesion promoter for water-borne coatings on alkaline substrates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[10217-34-2]
TSCA
HMIS: 2-1-1-X

114-7° / 0.4
Flashpoint: 104°C (219°F)

SIE4670.0

OO

288.46COMPOUNDSOCOMMERCIAL

2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIETHOXYSILANE
C14H28O4Si

O

SIE4890.0

Cl

Si

H

Cl

O

Si

O

1.4129SIE4891.0

1-ETHYL-2,2-DIMETHOXY-4-METHYL-1-AZA-2-SILACYCLOPENTANE
C8H19NO2Si
189.33NSi

ETHYLDICHLOROSILANE
C2H6Cl2Si
129.0674-6°(-107°)
1.093
Viscosity: 0.53 cSt
Flashpoint: -9°C (16°F)
ΔHform: -391 kJ/mole
Vapor pressure, 21°: 100 mm
ΔHvap: 7.5 kJ/mole
Critical temperature: 252˚C
Dipole moment: 2.04 debye
Surface tension: 21.7 mN/m
See also SIH6154.0, SIP6725.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[1789-58-8]
TSCA EC 217-255-0 HMIS: 3-4-2-X
25g ¥24,100
100g ¥70,800

Cyclic azasilane utilized for vapor-phase surface treatment of nano-featured substrates
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-3-1-X
25g ¥21,500

Cl

SIE4892.0

ETHYLDIMETHYLCHLOROSILANE
C4H11ClSi

91°
Flashpoint: -4°C (25°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[6917-76-6]
HMIS: 3-4-1-X
10g ¥13,000

www.AZmax.co.jp

TEL: 03-5543-1630

122.67

Gelest, Inc.

(215) 547-1015

0.87561.405050g ¥41,600

www.gelest.com

277

Name

bp °C/mm(mp °C)

D420

nD20

0.668

1.3783

SIE4894.0

H

Si

Mw

ETHYLDIMETHYLSILANE
C4H12Si

88.22

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[758-21-4]
TSCA EC 212-061-2 HMIS: 3-4-1-X

45-6°
Flashpoint: -25°C (-13°F)
10g ¥20,400

ETHYLENEBIS(TETRAMETHYLSILANAMINE) - see SIB1073.0 BIS(DIMETHYLAMINODIMETHYLSILYL)ETHANEETHYLENE GLYCOL BIS(TRIMETHYLSILYL) ETHER - see SIB1840.0 1,2-BIS(TRIMETHYLSILOXY)ETHANESIE4895.0
O

3-ETHYLHEPTAMETHYLTRISILOXANE
C9H26O2Si3
Viscosity, 20°: 1.3 cSt

172°(< -60°)0.828
Flashpoint: 45°C (113°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17861-60-8]
TSCA
HMIS: 1-3-0-X
100g ¥11,100

Si

O

Cl

250.56

1.394

SIE4896.0

O
O
F

Si

Si

ETHYLMETHYLDICHLOROSILANE
C3H8Cl2Si
143.09100°
Dipole moment: 2.32 debye
Flashpoint: 2°C (36°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[4525-44-4]
TSCA EC 224-860-3 HMIS: 3-4-1-X
25g ¥16,200

SiCl1.06301.4197100g ¥44,800

SIE4897.0(ETHYLMETHYLKETOXIMINO)TRIMETHYLSILANE, 95%O

Si

O-(TRIMETHYLSILYL)OXIME-2-BUTANONEC7H17NOSiN

159.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[37843-14-4]
HMIS: 2-3-1-X

65° / 75

0.82625

1.412525

1.00

1.520

0.996

1.477625

10g ¥16,200

SIE4897.2

Sim,p-ETHYLPHENETHYLDIMETHYLCHLOROSILANE, tech-95
C12H19ClSi
226.82Mixed isomers
Cl HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[253279-88-8]
HMIS: 3-2-1-X

100° / 0.4

5g ¥24,100

SIE4897.5

O
Si
O

O

m,p-ETHYLPHENETHYLTRIMETHOXYSILANE, tech-95
C13H22O3Si
254.40Mixed isomers
Component in optical hard coating resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[259818-29-6]
TSCA
HMIS: 3-2-1-X

93-6° / 4Flashpoint: 102°C (216°F)
25g ¥30,500

SIE4898.0

H

H

PR

Si

ETHYLSILANE
C2H8Si60.17-14°(-180°)
0.6396-14
CAUTION: MAY FORM EXPLOSIVE MIXTURES WITH AIR
ΔHcomb: -2,696 kJ/mole
Dipole moment: 0.81 debye
ΔHform: -84 kJ/mole
ΔHvap: 22.2 kJ/mole
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[2814-79-1]
HMIS: 3-4-1-X
50g inquire* includes gas dispensing cylinder zCYL-G-0325

H

SIE4899.0

O

Si

O

243.28Liquid cross-linker for silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 9-1939[17689-77-9]
TSCA EC 241-677-4 HMIS: 3-1-1-X

O

107-8° / 8(7-9°)
1.143
Flashpoint: 106°C (223°F)
TOXICITY: oral rat, LD50: 1,462 mg/kg
25g ¥3,400

2kg ¥48,000

1.4123

COMMERCIALOETHYLTRIACETOXYSILANEO C8H14O6Si

O

18kg ¥200,000

SIE4901.0

Si

Cl

278

Cl

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALClETHYLTRICHLOROSILANE
C2H5Cl3Si
163.51100-1°(-106°)
1.237
1.4260Viscosity: 0.48 cSt
Flashpoint: 27°C (81°F)
ΔHcomb: -2,696 kJ/mole
TOXICITY: oral rat, LD50: 1,330 mg/kg
ΔHform: -84 kJ/mole
Vapor pressure, 20°: 26 mm
ΔHvap: 37.7 kJ/mole
Vapor pressure, 30.4˚: 66 mm
ΔHfus: 7.0 kJ/mole
Critical temperature: 287˚C
Dipole moment: 2.1
Coefficient of thermal expansion: 1.5 x 10-3
Employed in the cobalt-catalyzed Diels-Alder approach to 1,3-disubstituted and 1,2,3-trisubstituted benzenes.1
1. Hilt, G.; Danz, M. Synthesis 2008, 2257.
F&F: Vol. 16, p 98.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[115-21-9]
TSCA EC 204-072-6 HMIS: 3-3-1-X
25g ¥3,400
1kg ¥32,000
20kg ¥258,000

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

158-9°(-78°)
0.896
Flashpoint: 40°C (104°F)
TOXICITY: oral rat, LD50: 13,720 mg/kg
Autoignition temperature: 235˚C (455˚F)
Vapor pressure, 50°: 10 mm
Critical temperature: 314˚CSpecific heat: 1.80 J/g/˚
Coefficient of thermal expansion: 1.5 x 10-3

1.3955

SIE4901.2
OSi

192.33OO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[78-07-9]
TSCA EC 201-080-1 HMIS: 3-2-1-X

SiO

500g ¥43,800

16kg ¥324,000

SIE4901.3

OO

100g ¥13,300

COMMERCIALETHYLTRIETHOXYSILANE
C8H20O3Si
Viscosity: 0.70 cSt
ΔHvap: 32.6 kJ/moleγc of treated surfaces: 26.3 mN/mOO

ETHYL 4-(TRIETHOXYSILYL)BENZOATE, 90%
C15H24O5Si

312.44

1.002

O
O
F

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[197662-64-9]
HMIS: 2-2-1-X

123-8° / 0.1
Flashpoint: >110°C (>230°F)
2.5g ¥72,400

SIE4901.4

O

O

Si

0.94882kg ¥42,000

1.383817kg ¥270,000

SIE4901.5

ETHYLTRIMETHYLSILANE
C5H14Si

102.25[3439-38-1]

HMIS: 1-4-0-X

63-4°

COMPOUNDSSiETHYLTRIMETHOXYSILANE
C5H14O3Si
150.25124-5°
Viscosity: 0.5 cSt
Flashpoint: 27°C (81°F)
ΔHcomb: 14,336 kJ/mole
Develops clear resin coating systems more readily than methyltrimethoxysilane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[5314-55-6]
TSCA EC 226-172-9 HMIS: 3-3-1-X
25g ¥3,600

COMMERCIAL

O

0.6842

1.3820157-8°
Flashpoint: 35°C (95°F)

0.876

1.414995-9° / 30
Flashpoint: 71°C (160°F)

0.897

1.44100.751251.451

0.86925

1.470525

0.85825

1..416625

1.010

1.575

10g ¥24,100

SIE4901.6

ETHYL (2-TRIMETHYLSILYL)ACETATE
C7H16O2Si

160.29OSiO

SILICON

Review of synthetic utility.
In combination with LDA converts ketones to α,β-unsaturated esters.2
Promotes the addition of alkylnitriles to imines.3
Reagent for conversion of carboxylic acids to β-hydroxyesters.4
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 297-299.
2. Larson, G. L. et al. Synth. Commun. 1999, 20, 1095.
3. Poisson, T. et al. J. Org. Chem. 2009, 74, 3516.
4. Wadhwa, K.; Verkade, J. J. Org. Chem. 2009, 74, 4368.
F&F: Vol. 7, p 150; Vol. 11, p 234, p 237.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[4071-88-9]
EC 223-783-2 HMIS: 2-3-0-X
5g ¥14,100
1

SIE4901.8

ETHYL 3-(TRIMETHYLSILYL)PROPYNOATEC8H14O2Si

PR

O

Si

O

170.29HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[16205-84-8]
HMIS: 3-2-0-X

5g ¥29,400

SIE4901.83

Si

ETHYNYL-t-BUTYLDIMETHYLSILANE
t-BUTYLDIMETHYLSILYLACETYLENE

C8H16Si

140.30116-7°
Flashpoint: 6°C (43°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[86318-61-8]
HMIS: 2-3-0-X
5g ¥59,100

SIE4901.85

Si

ETHYNYLCYCLOHEXYLDIETHYLSILANE
C12H22Si

194.39HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-3-1-X

74-7° / 3
1.0g ¥59,100

SIE4901.87

ETHYNYLCYCLOPENTYLDIETHYLSILANE
C11H20SiSi

180.36HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-3-1-X

82-3° / 8
1.0g ¥65,800

SIE4901.9
Si

ETHYNYLDIPHENYLMETHYLSILANE
C15H14Si

222.3786° / 0.5
Flashpoint: 113°C (235°F)

See also SIE4901.83
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17156-65-9]
HMIS: 2-2-1-X
2.5g ¥36,300

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

279

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.783

1.44300.709

1.3880

SIE4902.0

ETHYNYLTRIETHYLSILANE

TRIETHYLSILYLACETYLENE

C8H16Si

136°
Flashpoint: 17°C (63°F)
1
Reacts with enol silyl ethers to form α,α-bis-trans-β-triethylsilylethenyl ketones.
Useful in Sonogashira cross-coupling reactions w/ more stable silyl group than the trimethylsilyl group.2
1. Amemiya, R. et al. Tetrahedron Lett. 2006, 47, 1797.
2. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1777-03-3]
HMIS: 2-4-1-X
5g ¥24,100

Si

140.30

SIE4904.0

ETHYNYLTRIMETHYLSILANE, 98%
TRIMETHYLSILYLACETYLENE

C5H10Si
Vapor pressure, 20˚: 214 mm

52°Flashpoint: -26°C (-15°F)
Autoignition temperature: 310˚C

O
O
F

98.22

Doped polymer films are conductive
Review of synthetic utility.1
Ethynylates aromatic compounds.2
Precursor to trimethylsilylethynyl copper reagent.3
Lithiated derivative (n-BuLi treatment) reacts with halotriazines to produce monomers.4
Employed in ortho ethenylation of phenols.5
Undergoes Diels-Alder reactions with butadienes.6
Converts imines to propargyl amines.7
Forms propargylic amines from aldehydes and amines in aqueous system.8
Regioselectively forms either regioisomeric enyne upon addition to propargyl amines depending on catalyst employed.9
N

Bn

N

+H

SiMe3

Bn

[IrCl(COD)]2 (4.5 mole %)THF, rt

SiMe3

+

N

H

SiMe3

Cl

COMMERCIALSi

Pd(PPh3)2Cl2, CuI

Reacts w/ aryl aldehydes to form diethynylmethane derivatives.10
Useful in the preparation of unsymmetrical diarylacetylenes.11
I
PdCl2, CuI
SiMe3
+
Cl
Et
3N, C6H6, rt
Cl

Et2NH, DMF
microwave

N

SiMe3

SiMe3

DBU
H2O
I

Cl

90%

Br

PR

Br
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 569-580.
2. Austin, W. et al. J. Org. Chem. 1981, 46, 2280.
3. Sakata, H. et al. Tetrahedron Lett. 1987, 28, 5719.
4. Kouveetakis, J. et al. Chem. Mater. 1994, 6, 636.
5. Kobayashi, K.; Yamaguchi, M. Org. Lett. 2001, 3, 241.
6. Paik, S.-J. et al. Org. Lett. 1999, 1, 2045.
7. Fischer, C.; Carreira, E. M. Org. Lett. 2001, 3, 4319.
8. Wei, C.; Li, C.-J. J. Am. Chem. Soc. 2003, 125, 9584.
9. Matsuyama, N. et al. J. Org. Chem. 2009, 74, 3576.
10. Girard, D. et al. Tetrahedron Lett. 2007, 48, 6022.
11. Mio, M. et al. Org. Lett. 2002, 4, 3199.
See also SIT8606.5
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 2-3779[1066-54-2]
TSCA EC 213-919-9 HMIS: 2-4-1-X
5g ¥7,100
25g ¥16,000
1.5kg ¥230,000

Si

Si

N

Si

N

Eu

SIE4907.0

Si

EUROPIUM(III) TRIS(HEXAMETHYLDISILAZIDE)

N

Si

Si

EUROPIUM(III) TRIS[BIS(TRIMETHYLSILYLAMIDE)]

C18H54EuN3Si6
633.1382-4° / 10-4
Color: orange
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35789-02-7]
HMIS: 3-2-1-X
5g ¥59,100(159-162°)

FAUJASITE - see SIM6594.7 MOLECULAR SIEVES, 13X

SIF4906.0

FELDSPAR-POTASSIUM
MICROCLINE

Crystal structure image
courtesy of webmineral.com

280

KAlSi3O8
278.33
Particle Size: <24 μm
Mohs Hardness: 6.0
Typical bulk density, not compacted: 0.45 g/cm3
Triclinic pinacoidal
White, gray-white, short prismatic, blocky, massive, granular, translucent
Alumina and alkali source in the manufacture of glass and ceramics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12168-80-8]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

2.56

8kg ¥49,000

www.gelest.com

1.52

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

2.62

1.53

SIF4907.0

FELDSPAR-SODIUMALBITE

Crystal structure image
courtesy of webmineral.com

NaAlSi3O8
262.22
Particle Size: <24 μm
Mohs Hardness: 7.0
3
Typical bulk density, not compacted: 0.62 g/cm
Triclinic pinacoidal
Colorless to white, massive, granular, transparent to subtransparent
Alumina and alkali source in the manufacture of glass and ceramics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[68476-25-5]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

10kg ¥48,000

SIF4908.0

2-FERROCENYLETHYLTRIETHOXYSILANE
C18H28FeO3Si

376.361.0g ¥61,800

OOF

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

SIF4910.0

FeSi2

FERROSILICON
IRON SILICIDE

FeSi2
112.02
Contains 48.5% silicon
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[8049-17-0]
HMIS: 1-0-1-X(1,360°)4.75

500g ¥10,900

SIF4920.0

F

--

Si

H+

F

F

144.08 / 162.10
ΔHform: -2,331 kJ/mole
TOXICITY: scu frog, LDLo: 140 mg/kg
Etchant for glass, silicon dioxide
At low concentrations used as sterilizing agent in bottling plants
Desilylation reagent, selectively removes tBDMS groups in presence of TIPS groups.1
1. Mascarenas, J. et al. J. Org. Chem. 1986, 51, 1269.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions(既) 1-361[16961-83-4]
TSCA EC 241-034-8 HMIS: 3-0-0-X
1kg ¥22,900

1.23

1.35

0.945

1.474

PR

FLUORESCENT SILANES - see
SIC2058.2 3-CARBAZOLYLPROPYLTRIETHOXYSILANE
SIC2266.8 7-[3-(CHLORODIMETHYLSILYL)PROPOXY-4-METHYLCOUMARIN
SID4352.0 3-(2,4-DINITROPHENYLAMINO)PROPYLTRIETHOXYSILANE
SIM6502.0 O-4-METHYLCOUMARINYL-N-[3-(TRIETHOXYSILYL)PROPYL]CARBAMATE
SIT8186.2 7-TRIETHOXYSILYLPROPOXY-5-HYDROXYFLAVONE
SIT8187.0 N-(TRIETHOXYSILYLPROPYL)DANSYLAMIDE
SIT8192.4 (R)-N-TRIETHOXYSILYLPROPYL-O-QUININEURETHANE
FLUORINATED MONOMERS - see
SIT8366.0 (3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANE
SIV9205.0 VINYL(TRIFLUOROMETHYL)DIMETHYLSILANE
SIV9208.0 VINYL(3,3,3-TRIFLUOROPROPYL)DIMETHYLSILANECOMPOUNDSFHEXAFLUOROSILICIC ACID
H2F6Si∙H2O
劇物

SILICONH+

F

FLUOROSILICIC ACID, 22-25% in waterF

SIF4930.0

F

Si

4-FLUOROPHENYLTRIMETHYLSILANE
C9H13FSi

168.2892-3° / 60
Flashpoint: 46°C (115°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[455-17-4]
HMIS: 2-3-0-X
5g ¥28,900

FLUOROTRIETHOXYSILANE - see SIT8180.0 TRIETHOXYFLUOROSILANEFLUOROTRIMETHYLSILANE - see SIT8525.0 TRIMETHYLFLUOROSILANE

Si

Si

N

SIG4994.0

N

Gd

Si

Si

Si

N
Si

GADOLINIUM TRIS(HEXAMETHYLDISILAZIDE)Si

TRIS[N,N-BIS(TRIMETHYLSILYL)AMINO]GADOLINIUM III

N

Si

Si

C18H54N3GdSi6

638.41(161-7°)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35789-03-8]
HMIS: 3-2-1-X
5g ¥85,700

SIG4998.0

N

Ga

GALLIUM TRIS(HEXAMETHYDISILAZIDE)SiGALLIUM TRIS[BIS(TRIMETHYLSILYL)AMIDE]

N
Si

Si

C18H54GaN3Si6

550.88120° / 0.5 sub.

(187°)HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35450-28-3]
HMIS: 2-3-1-X
5g ¥77,700

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

281

Name

Mw

bp °C/mm(mp °C)

D420

nD20

4.19

1.83

3.9

1.87

SIG5100.0
GARNET

ALMANDITE

Al2Fe++3(SiO4)3
Particle Size: <150 μm; deep red-brownish black

497.75

Mohs Hardness: 7.0-8.0
Isometric hexoctahedral

High modulus, high hardness for coatings
More chemically resistant than Andradite Garnet
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1302-62-1]
TSCA-E
HMIS: 1-0-0-X

Crystal structure image
courtesy of webmineral.com

500g ¥9,600

10kg ¥48,000

SIG5105.0
GARNET

ANDRADITE

Ca3Fe+++2(SiO4)3
Particle Size: <150 μm

508.18

Mohs Hardness: 6.5-7.0
Isometric hexoctahedral

O
OF

Yellowish green, reddish brown, black
High modulus, high hardness for coatings
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[15078-96-3]
TSCA-E
HMIS: 1-0-0-X

Crystal structure image
courtesy of webmineral.com

500g ¥9,600

10kg ¥48,000

GEB1025

GERMANIUM(II) BIS(HEXAMETHYLDISILAZIDE)BIS[BIS(TRIMETHYLSILYL)AMINO]GERMANIUM(ll)C12H36GeN2Si4

Si

Si
N

Ge

N

Si

Si

393.3660° / 0.4

(32-3°)

Color: orange-yellow
Intermediate for germazene.1
Forms poly(germanium enolates) by reaction with α,β-unsaturated ketones.2
Reacts with carbon dioxide to form silylated isocyanates and carbodiimides.3
Forms 3-coordinate complexes with (Et3P)2Ptacac that reversibly bind CO2, H2.4
1. Chen, H. et al. Inorg. Chem. 1991, 30, 3390.
2. Kobayashi, S. et al. J. Am. Chem. Soc. 1992, 114, 4929.
3. Sita, L. et al. J. Am. Chem. Soc. 1996, 118, 10912.
4. Litz, K. et al. Organometallics 1995, 14, 5008.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[55290-25-0]
HMIS: 2-1-1-X
2.5g ¥25,500

SIG5210.0

GLASS SPHERES, (SOLID BOROSILICATE)

2.5

Particle size, average: 35 μm
E-glass composition: SiO2: 52-56%; CaO: 16-25%; Al2O3: 12-16%; B2O3: 5-10%[65997-17-3]
TSCA
HMIS: 1-0-0-X
500g ¥12,200

1.55

10kg ¥63,000

PP1-GC18

GLASSCLAD® 18

Octadecyl functional silane, 20% in t-butanol/diacetone alcohol

R

PR

O

Si

16

R

0.88

COMMERCIALO

γc of treated glass surface: 31 mN/m
Flashpoint: 10°C (50°F)
Coefficient of friction of treated glass surface: 0.2 - 0.3
Pour point: 4˚C
13
Surface resistivity of treated surface: 1.2 x 10 ohms
Hazy, amber liquid
Water-dispersible hydrophobic surface treatment
For application information see Gelest’s Performance Products Brochure
ControlO

R

Glassclad

Surface conductivity of glass substrates is reduced by application of Glassclad® 18. Surface arc-tracking is eliminated on fluorescentlight bulbs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA
HMIS: 2-4-1-X
100g ¥8,800
1.5kg ¥51,100
15kg ¥206,000

SIG5805.0

OO(S)-GLYCIDOXY-t-BUTYLDIMETHYLSILANE
C9H20O2Si

Si

188.34HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[123237-62-7]
HMIS: 3-2-1-X

Si

O

Si
O
Si

282

0.87

1.431

5g ¥46,900

SIG5820.0

OO

195-9°
Flashpoint: 74°C (165°F)(3-GLYCIDOXYPROPYL)BIS(TRIMETHYLSILOXY)METHYLSILANE
C13H32O4Si3
336.6596° / 0.5
0.910
Viscosity: 4 cSt
Flashpoint: >110°C (>230°F)
Epoxy resin diluent with good dielectric properties
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[7422-52-8]
TSCA EC 231-045-6 HMIS: 3-1-1-X
10g ¥13,500
50g ¥43,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4206

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.950

1.433725

122-6° / 5
0.97825
Flashpoint: 122°C (252°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg

1.431

SIG5825.0
OO(3-GLYCIDOXYPROPYL)DIMETHYLETHOXYSILANE
C10H22O3Si

OSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2072[17963-04-1]
TSCA EC 241-889-7 HMIS: 3-2-1-X

6-9

O

100° / 3Flashpoint: 87°C (189°F)
10g ¥15,100

50g ¥50,100

SIG5830.0

OO

218.37

1-GLYCIDOXYPROPYL-3-[METHOXY(POLYETHYLENEOXY)6-9PROPYL]TETRAMETHYLDISILOXANE
550 - 650

SiO

Reactive monomers may be formed by reaction with acrylic acid
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 2-2-1-X

OSi

25g ¥49,100

SIG5832.0

OO

248.39

O
O
F

O

Si

Employed in scratch resistant coatings for eye glasses
Coupling agent for latex systems with reduced tendancy to gel compared to SIG5840.0
See also SIE4668.0, SIG5836.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2072[2897-60-1]
TSCA EC 220-780-8 HMIS: 2-1-1-X
25g ¥10,800

O100g ¥28,400

COMMERCIAL(3-GLYCIDOXYPROPYL)METHYLDIETHOXYSILANE
C11H24O4Si
Viscosity: 3.0 cSt

2kg ¥136,000

O

O

Si

220.34

Relative hydrolysis rate vs. SIG5840.0: 7.5:1
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65799-47-5]
TSCA EC 265-929-8 HMIS: 3-1-1-X

O100° / 4Flashpoint: 105°C (221°F)
25g ¥16,700

1.02

1.431250.91525

1.42670.901

1.427125

1.00

1.425

100g ¥46,400

SIG5838.0

O

O

Si

O

(3-GLYCIDOXYPROPYL)PENTAMETHYLDISILOXANE
C11H26O3Si2

81° / 1.5
Flashpoint: 83°C (181°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18044-44-5]
HMIS: 3-2-0-X
5g ¥17,800

Si

262.50

SIG5838.5

O

O

Si

O

Si

(3-GLYCIDOXYPROPYL)-1,1,3,3-TETRAMETHYLDISILOXANE
C10H24O3Si2
248.47H

92-8° / 0.2

Monomer for epoxy vinyl-addition silicone hybrid polymers
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17980-29-9]
HMIS: 3-2-1-X

25g ¥21,500

SIG5839.0

O

O

O

Si

278.42124° / 3Flashpoint: 144°C (291°F)
Autoignition temperature: 225°C

Coupling agent for latex polymers
Primer for aluminum and glass to epoxy coatings and adhesives when applied as a 1-2% solution in solvent
See also SIE4675.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2071[2602-34-8]
TSCA EC 220-011-6 HMIS: 3-1-1-X
25g ¥4,300
100g ¥16,100

PR

O

COMMERCIAL

O(3-GLYCIDOXYPROPYL)TRIETHOXYSILANE
C12H26O5Si
Viscosity: 3 cSt

SILICON(3-GLYCIDOXYPROPYL)METHYLDIMETHOXYSILANE
C9H20O4SiOCOMPOUNDS

SIG5836.0

2kg ¥134,000

サイラエース S510
(3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE

SIG5840.0

O

O

O

O

Si

O

3-(2,3-EPOXYPROPOXY)PROPYLTRIMETHOXYSILANECOMMERCIAL

C9H20O5Si
236.34120° / 2(<-70°)
1.070
1.4290Viscosity: 3.2 cSt
Flashpoint: 135°C (276°F)
Surface tension: 38.5 mN/m
TOXICITY: oral rat, LD50: 8,400 mg/kg
Specific wetting surface area: 331 m2/g
Autoignition temperature: 231°C
Component in aluminum metal bonding adhesives
Coupling agent for epoxy composites employed in electronic “chip” encapsulation
Component in abrasion resistant coatings for plastic optics
Used to prepare epoxy-containing hybrid organic-inorganic materials.1
1. Innocenzi, P. et al. Chem. Mater. 1999, 11, 1672.
See also SIG5939.0, SIE4670.0, SIE4675.0
100g ¥4,900
1kg ¥9,300
サイラエース S510
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2071[2530-83-8]
TSCA EC 219-784-2 HMIS: 3-1-1-X
100g inquire
2kg inquire
18kg inquire

SIG5840.1

O
O

O

O

Si
O

(3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE, 99+%
C9H20O5Si

236.34

Low fluorescence grade for high-throughput screening
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2071[2530-83-8]
TSCA EC 219-784-2 HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

120° / 2(<-70°)
Flashpoint: 135°C (276°F)

1.070

1.429025g ¥51,200** in fluoropolymer bottle(215) 547-1015

www.gelest.com

283

Name

Mw

bp °C/mm(mp °C)

D420

nD20

2.59

1.56

SIH5840.15
HALLOYSITEKAOLINIC MINERAL

Al2Si2O5(OH)4
258.16
Particle Size: <24 μm
Mohs Hardness: 2.0
3
Typical bulk density, not compacted: 0.58 g/cm
Monoclinic domaticWhite, tubular and ultramicroscopic structure, transparent to translucent
Used in advanced ceramics, refractories
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12298-43-0]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

10kg ¥48,000

SIH5840.2

OO
F

HECTORITE(Na0.67)(Mg,Li)6Si8O20(OH,F)4
383.25
2.5
1.49
Particle Size: <24 μm
Mohs hardness: 1.5
Typical bulk density, not compacted: 0.50 g/cm3
Monoclinic, prismaticInternal surface area: ~750 m2/g
Montmorillonite (smectite) clay mineral-layered, with swelling and intercalation properties.1
Substrate for the polymerization of oligonucleotides.2
1. Pinnavaia, T. In Chemically Modified Surfaces in Catalysis; Miller, J., Ed.; American Chemical Society: Washington, DC, 1982; 192, p
241.
2. Prabahar, K. et al. J. Am. Chem Soc. 1994, 116, 10914.
See also SIS6985.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12173-47-6]
TSCA-E EC 235-340-0 HMIS: 1-0-0-X
2kg ¥23,500

SIH5840.25

F
F

F

HENEICOSAFLUORODODECYLTRICHLOROSILANE

F

Cl
Si

9

Cl

F

(PERFLUORODECYL)ETHYLTRICHLOROSILANE

C12H4Cl3F21Si
681.57γc of treated surfaces: 5-7 mN/m
Cl Renders surfaces oleophobic
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[102488-49-3]
HMIS: 3-1-1-X

90-2° / 1

(65-90°)1.7

2.5g ¥48,000

SIH5840.4(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)DIMETHYLCHLOROSILANEPERFLUORODECYL-1H,1H,2H,2H-DIMETHYLCHLOROSILANE

F

F

F

F

F

F

SIH5840.5

F

F

Si

7

(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)DIMETHYL(DIMETHYLAMINO)SILANE
C14H16F17NSi
549.3592-4° / 3
Packaged over copper powder
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-3-1-X
5g ¥32,100

N

PR

F

Si

7

C12H10ClF17Si
540.72
197-8°
1.51
1.3410
Packaged over copper powder
Treated onto silica to prepare a fluorinated surface for the embedding of a catalyst for Bonded Fluorous Phase Catalysis (BFPC) usedin dehydrogenative silylation of alcohols.1
Forms self-assembled monolayer resists that align nanowire arrays.2
Cl 1. Biffis, A.; Zecca, M.; Basato, M. Green Chemistry, 2003, 5, 170 and Biffis, A.; Braga, M.; Basato, M. Adv. Synth. Catal. 2004, 346,
451.
2. Takahashi, T. et al. J. Am. Chem. Soc. 2009, 131, 2102.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[74612-30-9]
HMIS: 3-2-1-X
5g ¥15,100
25g ¥50,100

F

F

F

SIH5840.6

F

F

1.423

(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)METHYLDICHLOROSILANE
561.14205-7°
Packaged over copper powder
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3102-79-2]
HMIS: 3-2-1-X
5g ¥17,200

Cl C11H7Cl2F17Si

1.630

1.345

C10H4Cl3F17Si
581.56
216-8°
1.703
Packaged over copper powder
TOXICITY: oral rat, LD50: >5,000 mg/kg
1γc of treated surfaces: 12 mN/m.
Cl 1. Brzoska, J. et al. Langmuir 1994, 10, 4367.
See also SIH5842.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[78560-44-8]
TSCA
HMIS: 3-2-1-X
5g ¥13,800
25g ¥44,800

1.3490

Si

7

Cl

F

(26-7°)
25g ¥58,600

SIH5841.0(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE

F

F

F

PERFLUORODECYL-1H,1H,2H,2H-TRICHLOROSILANE

F

Cl

Si

7

Cl

F

SIH5841.2

F
F

F

F

O
7

F

284

Si
O

O

(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIETHOXYSILANE
C16H19F17O3Si
610.38103-6° / 3
Packaged over copper powder
Hydrolysis in combination with polydimethoxysiloxane gives hard hydrophobic coatings.1
1. Oota, T. et al. Jpn. Kokai JP 06,293,782, 1993; Chem. Abstr. 1995, 122: 136317d.
See also SIP6720.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[101947-16-4]
HMIS: 3-2-1-X
5g ¥15,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.4072525g ¥51,200

www.gelest.com

1.3419

Enabling Your Technology
Name
F

F

F

Si

F

(mp °C)(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIMETHOXYSILANE
C13H13F17O3Si
568.30247°
Packaged over copper powder
Treated surface contact angle, water: 115˚γc of treated surfaces: 12 mN/m
Surface modification of titanium and silica substrates reduces coefficient of friction
Forms inorganic hybrids with photoinduceable refractive index reduction.1
1. Park, J.-U. et al. J. Mater. Chem. 2003, 13, 738.
See also SIH5842.2, SIN6597.65, SIT8175.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[83048-65-1]
TSCA-S
HMIS: 3-2-1-X
5g ¥16,800

O

O

F

bp °C/mm

D420

nD20

1.54

1.33125

SIH5841.5O7Mw

25g ¥48,000

Water droplets on silicon wafer
treated with SIH5841.5 exhibit
high contact angle

F

N(3-HEPTAFLUOROISOPROPOXY)PROPYLMETHYLDICHLOROSILANE
341.13

Cl C7H9Cl2F7OSi

F

Si

Cl

F

41-5° / 1

Monomer for low refractive index silicone fluids
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[20006-68-2]
TSCA EC 243-461-5 HMIS: 3-3-1-X
10g ¥36,300

SIH5842.0

F(3-HEPTAFLUOROISOPROPOXY)PROPYLTRICHLOROSILANE
C6H6Cl3F7OSi
361.5585-7° / 35
Specific wetting surface area: 356 m2/g
Si
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl[15538-93-9]
EC 239-589-6 HMIS: 3-3-1-X
5g ¥21,700

1.497

Cl

F

O

F
F

COMPOUNDS

O

F

F

N

1.386

SIH5841.9

F
F

F

Si

F

F

(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIS(DIMETHYLAMINO)SILANE
C16H22F17N3Si
607.4380-8° / 0.15
Packaged over copper powder
Employed in vapor phase deposition of oleophobic coatings
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[186599-45-1]
HMIS: 3-2-1-X
10g ¥75,100

N

7

F

F

SIH5841.7

F

O
O
F

F

F

1.3710

SIH5842.2

F

O

F

O

F
F

H
O

Si

O

D3D’

C7H22O4Si4SiSi

1.384110g ¥28,900

HEPTAMETHYLCYCLOTETRASILOXANE, tech-95

O

Si

O

39° / 0.5

SIH5842.5

PR

F

Si

O

3-(HEPTAFLUOROISOPROPOXY)PROPYLTRIMETHOXYSILANE
C9H15F7O4Si
348.29Contact angle, water on treated glass surface: 109-112°
Branched fluoroalkylsilane with low surface energy
Aligns liquid crystals.1
1. Jap. Pat. 57177121, 1982
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[19116-61-1]
HMIS: 3-2-1-X

SILICON

F

F

282.59Derivatizable ring-opening monomer
See also SIA0038.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[15721-05-8]
HMIS: 2-3-1-XO

165°(-27°)
Flashpoint: 46°C (115°F)

0.958

1.3965

0.798

1.418

10g ¥35,300

SIH5843.0

HEPTAMETHYLDISILAZANE

BIS(TRIMETHYLSILYL)METHYLAMINE

C7H21NSi2
175.42
Dielectric constant: 2.25
For GC derivatization
Reaction w/ isocyanates affords unsymmetrical carbodiimides
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[920-68-3]
TSCA EC 213-061-5 HMIS: 3-3-1-X

Si

148-50°Flashpoint: 27°C (81°F)

25g ¥11,900

100g ¥31,000

COMMERCIALSiN

2kg ¥192,000

1,1,1,3,5,5,5-HEPTAMETHYL-3-PHENYLTRISILOXANE - see SIP6736.2 3-PHENYLHEPTAMETHYLTRISILOXANE

SIH5844.0

Si

O

Si

1,1,1,3,3,5,5-HEPTAMETHYLTRISILOXANE, 90%OSi

H C7H22O2Si3

222.51HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2895-07-0]
EC 220-774-5 HMIS: 2-4-1-X

134-5°
Flashpoint: 21°C (70°F)

0.820

10g ¥31,000

1,1,1,3,5,5,5-HEPTAMETHYLTRISILOXANE - see SIB1844.0 BIS(TRIMETHYLSILOXY)METHYLSILANE

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

285

Name

Mw

bp °C/mm

228.4588° / 0.1

(mp °C)

D420

nD20

0.877

1.4640

SIH5844.5(E)-HEPTENYLDIISOPROPYLSILANOL
C13H28OSi

Undergoes Pd-catalyzed cross-coupling with activated aromatic iodides.1
Stable silanol for cross-coupling vinylations.2,3,4
Vinyl silanols cross-couple w/ aryl triflates and nonaflates.5
Potassium salts of silanols cross-couple in absence of fluoride.6
Si
1. Denmark, S. et al. Org. Syn. 2005, 81, 42.
OH
2. Denmark, S. E.; Sweis, R. F. J. Am. Chem. Soc. 2001, 123, 6439.
3. Denmark, S. E.; Pan, W. J. Organomet. Chem. 2002, 653, 98.
4. Denmark, S. E.; Wehrli, D. Org. Lett. 2000, 2, 565.
5. Denmark, S. E.; Sweis, R. F. Org. Lett. 2002, 4, 3771.
6. Denmark, S. E.; Kallemeyn, J. M. J. Am. Chem. Soc. 2006, 128, 15958.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[261717-41-3]
HMIS: 2-2-0-X
2.5g ¥76,400

SIH5845.0

OOF

Cl n-HEPTYLMETHYLDICHLOROSILANE

C8H18Cl2Si

207-8°
Flashpoint: 66°C (151°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18395-93-2]
TSCA EC 242-274-6 HMIS: 3-2-1-X
25g ¥28,900

Si
Cl

Cl

Si
Cl

Cl

213.220.978

1.439625

233.641.087

1.443925

SIH5846.0

n-HEPTYLTRICHLOROSILANE
C7H15Cl3Si

211-2°
Flashpoint: 64°C (147°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[871-41-0]
TSCA EC 212-807-7 HMIS: 3-2-1-X
25g ¥28,400

SIH5848.0

Si

1-HEPTYNYLTRIMETHYLSILANE
C10H20Si

168.35176°
Flashpoint: 42°C (108°F)

Useful in silicon-mediated Sonogashira cross-coupling reactions.
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[15719-56-9]
HMIS: 2-2-1-X
1

1.434410g ¥44,300

SIH5905.0

HEXACHLORODISILANE
HCDS

Cl

PR

Cl

Cl6Si2268.89144-6°(-1°)
CAUTION: HYDROLYSIS POLYMERS MAY IGNITE SPONTANEOUSLY, EVEN IN ABSENCE OF OXYGEN
ΔHcomb: -733 kJ/moleFlashpoint: 78°C (172°F)
ΔHform: -239 kJ/mole
Autoignition temperature: 320°C
ΔHvap: 46.5 kJ/mole
Vapor pressure, 40°: 12 mm
CVD precursor for SiN
1
Review of synthetic utility.
Converts phosphine oxides to phosphines with inversion of configuration.2
Catalyst for cyclotrimerization of acetylenes.3
Deoxygenates amineoxides.4

Cl

Si

Si

Cl

Cl

Cl

1.562

1.4750

O-

N+

N+

N

Cl3SiSiCl3
CHCl3, 20¡
80%

N

O-

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 309-310.
2. Mislow, K. et al. J. Am. Chem. Soc. 1969, 91, 2788, 7012, 7023.
3. Young, J. et al. J. Am. Chem. Soc. 1998, 120, 6834.
4. Homaidan, F. R.; Issidorides, C. H. Heterocycles, 1981, 16, 411.
F&F: Vol. 3, p 148.
See also SIH5905.1, SIO6601.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13465-77-5]
TSCA EC 236-704-1 HMIS: 3-3-2-X store <5°C
5g ¥14,100
25g ¥45,900

SIH5905.1

Cl

286

Cl

Cl

Si

Si

Cl

Cl

HEXACHLORODISILANE, 99.9%
HCDS

Cl

Cl6Si2268.89144-6°(-1°)
CAUTION: HYDROLYSIS POLYMERS MAY IGNITE SPONTANEOUSLY, EVEN IN ABSENCE OF OXYGEN
Flashpoint: 78°C (172°F)
Precursor for CVD of SiN films
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13465-77-5]
TSCA EC 236-704-1 HMIS: 3-3-2-X store <5°C
25g ¥104,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.562

www.gelest.com

1.4750Enabling Your Technology
Name

Cl
Si

Cl

Si

(mp °C)HEXACHLORODISILOXANE, 95%
Cl6OSi2
284.89137°
ΔHvap: 43.1 kJ/mole
Vapor pressure, 0˚: 1.5 mm
See also SIO6605.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[14986-21-1]
TSCA EC 239-070-4 HMIS: 3-0-2-X
10g ¥30,600

Cl

Cl Cl

bp °C/mm

D420

nD20

1.575

1.4280

SIH5910.0

Cl

O

Mw

SIH5915.0

2,2,4,4,6,6-HEXACHLORO-2,4,6-TRISILAHEPTANEBIS(DICHLOROMETHYLSILYLMETHYL)DICHLOROSILANE

SiSi

Cl C4H10Cl6Si3

Si
Cl Cl

SIH5917.0

Cl
Si
Cl

24

97-8° / 1.5

O
O
F

Cl Cl

355.10Carbosilane oligomer
Intermediate for disilabutanes.1
1. Jung, I. et al. Ger. Off. DE 4219375, 1992; Chem. Abstr. 118: 147789.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18243-10-2]
HMIS: 3-2-1-X
5g ¥28,400
HEXACOSYLTRICHLOROSILANE
C26H53Cl3Si
500.15(35-55°)
Blend
Contains C24-C30 homologs, a distilled cut product with more reproducible deposition than triacontylsilanes
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[60085-14-5]
HMIS: 3-3-1-X
25g ¥21,500

Cl

F F

F F

F F

F F

Cl

Si

F F

F

F F

F

Cl

Cl

F F

HEXADECAFLUORODODEC-11-EN-1-YLTRICHLOROSILANE
C12H7Cl3F16Si
589.61

Forms self-assembled monolayers; reagent for immobilization of DNA
See also SID4623.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

94-6° / 0.6

1.626

1.37131.414525

1.352625

COMPOUNDS

SIH5918.0

1.0g ¥45,900

SIH5919.0

F F

F F

F F

Si

F F

F

F F

F

O

F F

HEXADECAFLUORODODEC-11-EN-1-YLTRIMETHOXYSILANE
C15H16F16O3Si
576.35

O

O

Cl

Si

14

Cl

Si

HEXADECYLTRICHLOROSILANE, 95%
C16H33Cl3Si
359.88202° / 10
0.98
γc of treated surfaces: 21 mN/m
Flashpoint: 154°C (309°F)
See also SIH5925.0, SIT8162.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5894-60-0]
TSCA EC 227-575-2 HMIS: 3-1-1-X
25g ¥10,900100g ¥27,600
HEXADECYLTRIETHOXYSILANE, 95%
C22H48O3Si

388.71HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16415-13-7]
TSCA EC 240-465-9 HMIS: 2-1-1-X

OO

1.0g ¥51,200

SIH5920.0

1.4592

SIH5922.0

O
14

Cl

Forms self-assembled monolayers; reagent for immobilization of DNA
See also SID4623.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

90° / 0.5

SILICON

F F

PR

Cl

160-1° / 1

0.888

1.4370155° / 0.2
(-1°)
0.89
Flashpoint: 122°C (252°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 245˚C

1.435625g ¥9,500(-9°)

100g ¥23,300

SIH5925.0

O

Si

14

O

O

O

O

O

Si

Si

O

O

346.63

Water scavenger
Employed as rheology modifier for moisture crosslinkable HDPE
Modifier for moisture crosslinkable polyethylene (XLPE)HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16415-12-6]
TSCA EC 240-464-3 HMIS: 2-2-1-X

25g ¥5,900

2kg ¥73,000

COMMERCIAL

HEXADECYLTRIMETHOXYSILANE, 95%
C19H42O3Si
Viscosity: 7 cSt

16kg ¥356,000

SIH5935.0

O

HEXAETHOXYDISILANE, tech-95
C12H30O6Si2
326.54
Includes other disilanes
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5851-08-1]
HMIS: 3-3-1-X

123° / 15

0.972

1.413414

1.0152

1.43365g ¥31,000

SIH5945.0

O

O

Si
O

Si

O

1,1,3,3,5,5-HEXAETHOXY-1,3,5-TRISILACYCLOHEXANE
C15H36O6Si3

Si

Precursor for low dielectric constant films by CVD
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17955-67-8]
HMIS: 2-2-1-X

OO

www.AZmax.co.jp

TEL: 03-5543-1630

396.70

Gelest, Inc.

132-3° / 5

10g ¥31,600(215) 547-1015

www.gelest.com

287

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIH6070.0

Si

SIH6074.0

H
O

Cl

Cl

Si

Cl

1,1,1,5,5,5-HEXAETHYL-3-METHYLTRISILOXANE
C13H34O2Si3

Si

O

Si

Cl

Cl

Si
Cl
Cl
Cl

O

Cl

Si

0.86961.427

10g ¥27,800

SIH6080.0SiSi

81-2° / 1

HEXAFLUOROACETYLACETONE, TRIMETHYLSILYLENOL ETHER see SIT8571.05 2-TRIMETHYLSILOXY-1,1,1,5,5,5-HEXAFLUOROPENT-2-EN-4-ONE

Cl

Cl

Cl

306.67

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[13716-38-6]
HMIS: 2-2-1-X

O
O
F

Si

Si

COMMERCIALOSiHEXAETHYLDISILOXANE
C12H30OSi2
245.54231°(-115°)
0.84431.4340Viscosity, -50˚: 85 cSt
Flashpoint: 76°C (169°F)
Viscosity, 20˚: 2.35 cSt
Vapor pressure, 60°: 1 mm
ΔHcomb: 9,770 kJ/mole
Dipole moment: 0.66 debye
ΔHform: 984 kJ/moleSpecific heat: 1.84 J/g/°
Surface tension: 21.5 mN/mDielectric constant: 2.2
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-476[994-49-0]
TSCA EC 213-619-8 HMIS: 1-2-0-X
25g ¥9,500
100g ¥23,300
2kg ¥139,000

1,2,3,4,5,6-HEXAKIS[2-(METHYLDICHLOROSILYL)ETHYL]BENZENE
C24H42Cl12Si6
924.55(165-75°)

Core for dendrimer synthesis.
Soluble: toluene
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[194933-15-8]
HMIS: 3-2-1-X
5g ¥33,200

SIH6101.0

O

O

Si

Si

O

O

O

HEXAMETHOXYDISILANE, tech-95
C6H18O6Si2
242.37
ΔHcomb: 4,814 kJ/mole
ΔHform: 1,863 kJ/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5851-07-0]
HMIS: 4-4-1-X

98° / 201.095

1.40705g ¥27,300

SIH6102.0

N
H

NH
Si

SIH6103.0

PR

Si

Si

H

N

Si
N

Si

COMMERCIAL

HN

1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE
C6H21N3Si3
219.51
186-8°(-10°)
0.922
1.4448Viscosity, 20˚: 1.7 cSt
Flashpoint: 61°C (142°F)
ΔHform: 553 kJ/mole
Dipole moment: 0.92 debye
Dielectric constant: 1000Hz: 2.57
Modifies positive resists for O2 plasma resistance.1
Polymerizes to polydimethylsilazane oligomer in presence of Ru/H2.2
Silylation reagent for diols.3
1. Babich, E. et al. Microelectron. Eng. 1990, 11, 503.
2. Blum, Y. et al. U.S. Patent 4,216,383, 1986; U.S. Patent 4,788,309, 1988.
3. Birkofer, L. et al. J. Organomet. Chem. 1980, 187, 21.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 5-6044[1009-93-4]
TSCA EC 213-773-6 HMIS: 2-2-1-X
25g ¥6,200
100g ¥10,400
2kg ¥174,000

Si

N

H

H

1,2,3,4,5,6 HEXAMETHYLCYCLOTRISILAZANE, tech-95
C6H21N3Si3
219.51
Contains tetramer
Pyrolytic deposition in ammonia yields silicon nitride.1
1. Arkles, B. J. Electrochem. Soc. 1986, 133, 233.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2587-46-4]
HMIS: 2-2-1-X

56° / 55g ¥15,400

0.929

1.458025g ¥51,200

SIH6105.0

HEXAMETHYLCYCLOTRISILOXANE, 95%
D3

Si

288

Si

O

O

Si

222.46134°(64-6°)
Flashpoint: 35°C (95°F)
Vapor pressure, 25°: 10 mm
Dipole moment: 0.0
Ring strain: 10.5 kJ/mole
Surface tension, 74˚: 13.3 mN/m
Ea, polym: 73.7 kJ/mole

1.02

Undergoes ring-opening anionic polymerization
Review of synthetic utility.1
Reacts with three equivalents of an organolithium reagent to give derivatized dimethylsilanols.2,3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 310-313.
2. Frye, C. L. et al. J. Org. Chem. 1970, 35, 1308.
3. Sieburth, S. M.; Fensterbank. L. J. Org. Chem. 1993, 58, 6314.
See also SIH6105.1, SIT8366.0, SIT8737.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-475[541-05-9]
TSCA EC 208-765-4 HMIS: 1-3-0-X
100g ¥8,200500g ¥29,800
10kg ¥306,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALO

C6H18O3Si3
Contains other cyclics
ΔHform: 1,490 kJ/mole
ΔHvap: 39.8 kJ/mole
ΔHfus: 15.5 kJ/mole
ΔHpolym: 6.7 kJ/moleEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

222.46134°(64-6°)

1.02

nD20

SIH6105.1

O
Si

Si

O

HEXAMETHYLCYCLOTRISILOXANE, 98%
D3

O

C6H18O3Si3HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-475
TSCA EC 208-765-4 HMIS: 1-3-0-X[541-05-9]Si

100g ¥13,000

500g ¥42,700

SIH6109.0

HEXAMETHYLDISILANE
C6H18Si2
Viscosity: 1.0 cSt
ΔHcomb: 5,909 kJ/mole
ΔHform (gas): -494 kJ/mole
ΔHvap: 39.8 kJ/mole

1.4214O
O
F

Si

112-3°(12-14°)0.7293
Flashpoint: -1°C (30°F)
Vapor pressure, 20°: 22.9 mm
Ea decomposition at 545°K: 337 kJ/mole
Rotational barrier, Si-Si: 4.40 kJ/mole
Secondary NMR reference: δ = 0.045

Review of synthetic utility.1
Source for trimethylsilyl anion.2,3
Replaces aromatic nitriles with TMS groups in presence of [RhCl(cod)]2.4
Precursor for CVD of silicon carbide.5
Brings about the homocoupling of arenesulfonyl chlorides in the presence of Pd2(dba)3.6
Used as a solvent for the direct borylation of fluoroaromatics.7
Reacts with alkynes to form siloles.8
Undergoes the silylation of acid chlorides to give acylsilanes.9

O

R

Cl

+

O

1. MeLi, HMPA, THF-78 to 25 C

Me3SiSiMe3

2. CuCN, THF, -23¡
3. NH4ClR

COMMERCIAL

Si

146.38SiMe3COMPOUNDSHMD

SILICON

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 278-284.
2. Shippey, M. A. et al. J. Org. Chem. 1977, 42, 2654.
3. F&F: Vol. 10, p 96; Vol.11, p 253.
4. Tobisu, M. et al. J. Am. Chem. Soc. 2006, 128, 4152.
5. Thin Solid Films 1999, 252, 13.
6. Kashiwabara, T.; Tanaka, M. Tetrahedron Lett. 2005, 46, 7125.
7. Teltewskoi, M. et al. Angew. Chem., Int. Ed. Engl. 2010, 49, 3947.
8. Akagawa, K. et al. Synlett 2011, 22, 813.
9. Capperucci, A. et al. J. Org. Chem. 1988, 53, 3612.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 2-3711[1450-14-2]
TSCA EC 215-911-0 HMIS: 2-4-0-X
25g ¥13,000
100g ¥34,500
1.5kg ¥103,000

SIH6110.0

1,1,1,3,3,3-HEXAMETHYLDISILAZANEHMDS, HMDZ

Si

H
N

Si

161.39126-7°(<-76°)
0.7742
Flashpoint: 12°C (54°F)
TOXICITY: oral rat, LD50: 850 mg/kg
TOXICITY: ipr mouse, LDLo: 650 mg/kg
Autoignition temperature: 325˚C
Vapor pressure, 50°: 50 mm
pKa: 7.55
Dielectric constant: 1000 Hz: 2.27
Ea, reaction w/SiO2 surface: 73.7 kJ/moleVersatile silylation reagent; creates hydrophobic surfaces
Review of synthetic utility.1
Converts acid chlorides and alcohols to amines in a three-component reaction.2
Reacts with formamide and ketones to form pyrimidines.3
Lithium reagent reacts w/ aryl chlorides or bromides to provide primary anilines.4
Used to convert ketones to α-aminophosphonates.5

O

Ph

Treatment of fumed silica withhexamethyldisilazane renders ithydrophobic+ (TMS)2NH +

O
H

P

OEt

OEt

Yb(OTf)3 (10 mol%)
rt
89%

TMS
Ph

NH

PH

1.4080OEt

COMMERCIALPR

C6H19NSi2
Viscosity: 0.90 cSt
ΔHcomb: 25,332 kJ/mole
ΔHvap: 34.7 kJ/mole
Dipole moment: 0.37 debye
Surface tension: 18.2 mN/mSpecific wetting surface: 485 m2/g

OEt

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 317-319.
2. Li, H.-H. et al. Eur. J. Org. Chem. 2008, 3623.
3. Tyagarajan, S.; Chakravarty, P. K. Tetrahedron Lett. 2005, 46, 7889.
4. Lee, S.; Jorgensen, M.; Hartwig, J. F. Org. Lett. 2001, 3, 2729.
5. Heo, Y. et al. Tetrahedron Lett. 2012, 53, 3897.
F&F: Vol. 1, p 427; Vol. 2, p 159; Vol. 5, p 323; Vol. 6, p 273; Vol. 7, p 167; Vol. 8, p 29; Vol. 9, p 234; Vol. 11, p 38; Vol. 12, p 239; Vol.
13, p 141; Vol. 14, p 300.
HMDS-SG1L ¥8,500（製造元 JNC）
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 9-1324[999-97-3]
TSCA EC 213-668-5 HMIS: 2-4-1-X
25g ¥5,600
1.5kg inquire
14kg inquire

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

289

Name

bp °C/mm(mp °C)

D420

nD20

126-7°(<-76°)

0.7742

1.4080

HMDS-EG（製造元 JNC）

25g ¥6,200

1.5kg inquire

SIH6110.1

1,1,1,3,3,3-HEXAMETHYLDISILAZANE, 99%
HMDS, HMDZ

C6H19NSi2
161.39<5 ppm chloride
Photoresist adhesion promoter
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 9-1324[999-97-3]
TSCA EC 213-668-5 HMIS: 2-4-1-X

Si

1L ¥12,500

COMMERCIAL

H
N

Si

Mw

SIH6115.0

HEXAMETHYLDISILOXANE, 98%
MM, HMDSO

C6H18OSi2
Viscosity: 0.65 cSt
ΔHcomb: -5,864 kJ/mole
ΔHvap: 30.1 kJ/mole
Dipole moment: 0.78 debye
Surface tension: 15.9 mN/mSolubility parameter: 6.8
Solubility in water: 930 ppb

1.3774O
O
F

99-100°(-67°)
0.7636
Flashpoint: -1°C (30°F)
TOXICITY: oral gpg LDLo: 32,500 mg/kg
Autoignition temperature: 340˚C
Vapor pressure, 30°: 55 mm
Critical temperature: 243°C
Critical pressure: 1.91 mPa
Specific heat: 1.93 J/g/°
Dielectric constant: 2.17
Henry’s law constant: 4.5 atm-m3/mole

COMMERCIAL

O

Si

162.38

Review of synthetic utility.1
Exhibits high excess electron mobility: 22 cm2/V s.2
Plasma polymerization produces hydrophobic coatings on metals.3
Provides an excellent alternative to Lawesson’s reagent for the conversion of a carbonyl to a thiocarbonyl.4

Si

O

O

+

Me3Si-O-SiMe3

P4S10

O

S

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 313-317.
2. Holroyd, R. et al. Nucl. Instrum. Methods Phys. Res., Sect. A 1997, 390, 233.
3. Bonnar, M. et al. Chem. Phys. Vac. Dep. 1997, 3, 201.
4. Curphey, T. J. J. Org. Chem. 2002, 67, 6461.
See also SIH6115.1, SIH6070.0, SIO6703.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 2-2956[107-46-0]
TSCA EC 203-492-7 HMIS: 1-3-0-X
100g ¥4,400
1.5kg ¥23,200
14kg ¥124,000

SIH6115.1

Si

HEXAMETHYLDISILOXANE, 99.9%
C6H18OSi2
162.38
NMR grade
Plasma polymerization produces hydrophobic coatings on metal.1
1. Bonnar, M. et al. Chem. Phys. Vac. Dep. 1997, 3, 201.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 2-2956[107-46-0]
TSCA EC 203-492-7 HMIS: 1-3-0-X

Si

99-100°(-67°)

25g ¥5,100

0.76361.3774

1.5kg ¥55,000

HEXAMETHYLDISILPEROXANE - see SIB1868.0 BIS(TRIMETHYLSILYL)PEROXIDESIH6116.0

HEXAMETHYLDISILTHIANE

BIS(TRIMETHYLSILYL)SULFIDEPR

C6H18SSi2
178.45
162-4°
StenchFlashpoint: 26°C (79°F)
Dipole moment: 1.85 debye
Reviews.1,2
Used in the generation of SAMs of alkanethiolates on noble metal surfaces.3
Forms glycosyl sulfides.4
Opens epoxides regioselectively to form β-mercaptoethanols.5
HO
O
TBAF
+
Me
SiSSiMe
3
3
MeO
84%
MeO

S

Si

H

Si

290

O

Si

O

1.4598SH

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 83-84.
2. McGregor, W. et al. Chem. Soc. Rev. 1993, 199.
3. Hu, J.; Fox, M. A. J. Org. Chem. 1999, 64, 4959.
4. Dere, R. T. et al. J.Org. Chem. 2011, 76, 7539.
5. Degl’Innocenti, A. et al. Tetrahedron Lett. 1993, 34, 873.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3385-94-2]
TSCA EC 222-201-4 HMIS: 3-3-1-X
5g ¥28,900

H

Si

0.851

SIH6116.6

Si

1,1,1,5,5,5-HEXAMETHYLTRISILOXANE
C6H20O2Si3

208.48HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[93254-88-7]
HMIS: 3-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

135°
Flashpoint: 21°C (70°F)

0.819

10g ¥20,700(215) 547-1015

www.gelest.com

1.3801COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.8222

1.3811

SIH6117.0

1,1,3,3,5,5-HEXAMETHYLTRISILOXANE

O

H

Si

O

C6H20O2Si3

208.48Undergoes hydrosilylation reactions
See also SIB1770.0, SIT7546.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base(既) 7-477[1189-93-1]
TSCA EC 214-716-8 HMIS: 1-4-1-X

128°
Flashpoint: 20°C (68°F)

10g ¥8,500

50g ¥23,600

2kg ¥217,000

SIH6145.0

Si

Si

O

O
Si

300° / 1(188°)

1.23

O
O
F

O

HEXAPHENYLCYCLOTRISILOXANE
C36H30O3Si3
594.89
ΔHcomb: 18,711 kJ/mole
ΔHform: 963 kJ/mole
May be ring opened to diol with water and n-hexylamine.1
1. Tachikawa, M. et al. Chem. Mater. 1998, 10, 4154.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-473[512-63-0]
TSCA EC 208-145-3 HMIS: 1-0-0-X

25g ¥25,700

100g ¥75,800

SIH6155.0

HEXAPHENYLDISILANE
C36H30Si2

518.80(360-362°)

Si-Si bond cleaved by alkali metals to form triphenylsilyl anion
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 7-473[1450-23-3]
TSCA EC 215-913-1 HMIS: 2-1-0-X

SiSi

5g ¥25,200

25g ¥90,400

Si

1.6825

SIH6162.0

SiO

HEXAVINYLDISILOXANE, 95%
C12H18OSi2

Si

234.45

115-6° / 20
Flashpoint: 61°C (142°F)

End-capper for silicones
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[75144-60-4]
HMIS: 2-2-0-X

0.84

1.46670.895

1.44230.883

1.41851.021

1.43930.993

1.43935g ¥25,700

SIH6163.0

5-HEXENYLDIMETHYLCHLOROSILANE, 95%
C8H17ClSi
176.76183-4°
Contains other olefinic isomers
Flashpoint: 48°C (118°F)
Cl Copolymerizes with hexene, hexadiene
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[30102-73-9]
HMIS: 3-3-1-X
10g ¥19,900

Si

50g ¥69,200

SIH6164.0

SILICONSiOHEXAPHENYLDISILOXANE, 95%
C36H30OSi2534.80494°(224-5°)
Contains triphenylsilanol
Dipole moment: 1.03 debye
ΔHcomb: 19,979 kJ/moleSpecific heat: 1.26 J/g/˚
ΔHform: 224 kJ/mole
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1829-40-9]
TSCA EC 217-381-6 HMIS: 1-0-0-X
25g ¥19,900

COMPOUNDS

SIH6161.0

PR

Si

M’DM’

COMMERCIAL

H

Si

5-HEXENYLTRICHLOROSILANE, 95%
C6H11Cl3Si
217.6033-4° / 0.7
Contains other olefinic isomers
Flashpoint: 60°C (140°F)
Cl See also SIO6708.0, SIU9050.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18817-29-3]
HMIS: 3-2-1-X
10g ¥19,400

Cl

Si

Cl

SIH6164.2

5-HEXENYLTRIETHOXYSILANE, 95%
C12H26O3Si
246.43
Primarily α-olefin
See also SIO6709.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52034-14-7]
HMIS: 2-1-1-X

O

Si

O

O

97° / 1
Flashpoint: 86°C (187°F)
10g ¥20,400

SIH6165.0

Si

Cl

Cl

HEXYLDICHLOROSILANE
C6H14Cl2Si

185.16172-5°
Flashpoint: 64°C (147°F)
H See also SII6452.3, SIP6725.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2042[871-64-7]
HMIS: 3-2-1-X
5g ¥18,800

25g ¥65,000

SIH6165.6

SiCl

Cl HEXYLMETHYLDICHLOROSILANE
C7H16Cl2Si

204-6°
Flashpoint: 85°C (185°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[14799-94-1]
TSCA EC 238-864-8 HMIS: 3-2-1-X
25g ¥13,500

www.AZmax.co.jp

TEL: 03-5543-1630

199.19

Gelest, Inc.

(215) 547-1015

www.gelest.com

291

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.7182

1.4129SIH6166.2

HEXYLSILANE
H C6H16Si

Si

116.28H Reacts onto a Au surface to form monolayers of long alkyl chains.
1. Owens, T. M. et al. J. Am. Chem. Soc. 2002, 124, 6800.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1072-14-6]
TSCA EC 214-001-0 HMIS: 2-4-1-X

1

H

Cl

Cl

10g ¥22,000

50g ¥77,700

SIH6167.0

ClSi

114-5°
Flashpoint: 12°C (54°F)

HEXYLTRICHLOROSILANE
C6H13Cl3Si

219.61

191-2°
1.107
Flashpoint: 85°C (185°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[928-65-4]
TSCA EC 213-178-1 HMIS: 3-2-1-X
25g ¥9,800
100g ¥24,100

1.3473

SIH6167.5O

2kg ¥51,100

15kg ¥221,000

SIH6168.0

FSiF

1.40825

O
O
F

Si
O

0.860

COMMERCIALHEXYLTRIETHOXYSILANE
C12H28O3Si
248.44115° / 18
Viscosity: 3 cSt
Flashpoint: 95°C (203°F)
Employed in so-gel derived stationary phases for capillary electrochromatography.1
1. Li, W. et al. J. Chromatog., A 2004, 1044, 23.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[18166-37-5]
TSCA
HMIS: 2-1-1-X
25g ¥7,200

OF

HEXYLTRIFLUOROSILANE
C6H13F3Si

170.2588-91°
Flashpoint: -7°C (19°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[96164-66-8]
HMIS: 4-4-1-X
5g ¥42,700

0.984

1.35150.91125

1.4070

SIH6168.5

Si

HEXYLTRIMETHOXYSILANE
C9H22O3Si

OO

206.35

Surface modification of TiO2 pigments improves dispersion
See also SIO6715.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[3069-19-0]
TSCA EC 221-331-9 HMIS: 3-2-1-X

202-3°
Flashpoint: 62°C (144°F)

50g ¥4,400

2kg ¥45,000

16kg ¥350,000

HEXYNYLTRIMETHYLSILANE - see SIT8589.7 1-TRIMETHYSILYL-1-HEXYNE

SIH6168.7

Si
O
Si
O
Si

O

0.880

1.426

25g ¥14,100

HYDROXYETHOXYSILATRANE
SILATRANE GLYCOL

C8H17NO5Si

PR
O

100° / 0.5

SIH6171.0

NSi

4-R-8-HYDRO-9-[BIS(TRIMETHYLSILOXY)METHYLSILYL]LIMONENE
C17H38O2Si3
358.74
Viscosity: 4-5 cSt
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[1263044-00-3]/[1263043-99-7]
TSCA
HMIS: 1-1-0-X

OO

235.32

Soluble: water
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[56929-77-2]
HMIS: 3-1-0-X(>205° dec.)

1.05

25g ¥14,600

HO

O

O

Si

SIH6171.5

O

O

Si

O

O

N

OH

N-(HYDROXYETHYL)-N,N-BIS(TRIMETHOXYSILYLPROPYL)AMINE, 65% in methanol
C14H35NO7Si2
385.61
Flashpoint: 15°C (59°F)
Dipodal silane with hydroxyl functionality
See also SIB1142.0, SIB1824.4, SIH6172.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[264128-94-1]
TSCA
HMIS: 3-4-1-X
10g ¥25,700

0.97

SIH6172.0

O

HO

292

N

O

Si

O

N-(HYDROXYETHYL)-N-METHYLAMINOPROPYLTRIMETHOXYSILANE, 75% in methanol
C9H23NO4Si
237.37
Flashpoint: 11°C (52°F)
See also SIT8567.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[330457-46-0]
HMIS: 3-4-1-X
25g ¥18,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.99100g ¥50,900

www.gelest.com

1.417

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIH6175.0

HYDROXYMETHYLTRIETHOXYSILANE, 50% in ethanol

O

HO

Si
O

TRIETHOXYSILYLMETHANOL

C7H18O4Si
194.31
Contains equilibrium condensation oligomers
Flashpoint: 15°C (59°F)
Hydrolysis yields analogs of silica-hydroxymethylsilanetriol polymers.1,
2
Cohydrolysates form highly water dispersible nanoparticles.
Functionalizes magnetic particles utilized in nucleic acid separation.3
Functionalizes nanoparticles for “stealth therapeutic” biomedical applications.4
1. Arkles, B. et al. Silicon 2013, 5, 187; DOI 10.1007/s12633-013-9146-2
2. Du, H. et al. J. Colloid Interface Sci. 2009, 340, 202.
3. Templer, D. Eur. Pat. Appl. EP 1748 072 A1, 2007.
4. Neoh, K. G. et al. Polymer Chemistry 2011, 2, 747.
See also SIB1142.0, SIB1824.2, SIH6172.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[162781-70-6]
TSCA-L
HMIS: 2-4-0-X
25g ¥28,900

O

+
O
Si

HO

O
Si

O

O

O

O

0.866

O
O
F

SIH6177.0

HYDROXYMETHYLTRIMETHYLSILANE
C4H12OSi

Si

O

O

HO

Si

Si

6-9

Si

O

104.22

121-2°
0.82625
Flashpoint: 31°C (88°F)
TOXICITY: ipr mouse, LD50: 1,080 mg/kg

Nucleophilic hydroxymethylation reagent.1
1. Katritzky, A. et al. Tetrahedron Lett. 1987, 28, 1847.
F&F: Vol. 10, p 434; Vol. 14, p 331.
See also SIT8602.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3219-63-4]
TSCA EC 221-746-5 HMIS: 2-3-0-X

5g ¥24,100

1.432025

25g ¥86,200

SIH6185.0

3-[HYDROXY(POLYETHYLENEOXY)PROPYL]HEPTAMETHYLTRISILOXANE, 90%
550 - 650(-18°)
1.02
Viscosity, 25˚: 35 cSt
Flashpoint: 118°C (244°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[67674-67-3]
TSCA
HMIS: 1-1-0-X
25g ¥8,500
100g ¥19,400

1.446325

SIH6188.0

O

O

HO

Si

8-12

O

O

[HYDROXY(POLYETHYLENEOXY)PROPYL]TRIETHOXYSILANE, (8-12 EO), 50% in ethanol
575 - 750
Flashpoint: 15°C (59°F)
See also SIA0078.0, SIH6185.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-4-1-X
25g ¥26,800

0.889

1.401

0.905

1.4133

1.11625

1.560125

O
HO

Si

3-(3-HYDROXYPROPYL)HEPTAMETHYLTRISILOXANE, 95%

BIS(TRIMETHYLSILOXY)METHYL(HYDROXYPROPYL)SILANE

C10H28O3Si3

O

280.58

Hydrophilic trisiloxane
Forms acrylate esters
See also SIH6185.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17962-67-3]
HMIS: 2-2-0-X

PR

Si

OH

O

Si

O

O

SILICON

SIH6192.0SiO

82-5° / 2

COMPOUNDSTRIMETHYLSILYLMETHANOL

HO

25g ¥26,300

SIH6198.0

2-HYDROXY-4-(3-METHYLDIETHOXYSILYLPROPOXY)DIPHENYLKETONE, tech-90
C21H28O5Si
388.54
Amber liquid
Viscosity: 100-125 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X
25g ¥28,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

293

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.12025

1.54525

SIH6200.0

2-HYDROXY-4-(3-TRIETHOXYSILYLPROPOXY)DIPHENYLKETONE, tech-90
C22H30O6Si
418.56
Amber liquid
Viscosity, 25˚: 125-150 cSt
UV max: 230, 248, 296(s), 336
Strong UV blocking agent for optically clear coatings, absorbs from 210-420 nm
UV blocking agent.1
OH

O

O
Si

O
O

O
O
F

O

1. Anthony, B. U.S. Patent 4,495,360, 1985.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[79876-59-8]
TSCA
HMIS: 2-1-1-X

25g ¥20,400

100g ¥58,600

IMIDAZOLE DERIVATIVES - see
SIB1964.0 1-(t-BUTYLDIMETHYLSILYL)IMIDAZOLE
SIT8187.5 N-(3-TRIETHOXYSILYLPROPYL)4,5-DIHYDROIMIDAZOLE
SIT8590.0 N-(TRIMETHYLSILYL)IMIDAZOLE
3-(2-IMIDAZOLIN-1-YL)PROPYLTRIETHOXYSILANE see SIT8187.5 N-(3-TRIETHOXYSILYLPROPYL)4,5-DIHYDROIMIDAZOLE

SII6400.0

O

I

Si

(4-IODOBUTOXY)-t-BUTYLDIMETHYLSILANE
C10H23IOSi
314.28
Stabilized with copper
Alkylates acetylenes, allenes, ester enolates.1,2
1. Hermitage, S. et al. Tetrahedron Lett. 1998, 39, 3567.
2. Schostarez, H. et al. J. Org. Chem. 1996, 61, 8701.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[92511-12-1]
TSCA-L
HMIS: 2-2-1-X

75° / 0.55g ¥16,200

1.214

1.480

1.441

1.491025g ¥54,400

SII6450.0

IODOMETHYLTRIMETHYLSILANE
C4H11ISi

214.12140-2°
Flashpoint: 31°C (88°F)

Review of synthetic utility.1
Employed in silyl-methylation of alkynes.2
Converts aldehydes, ketones, α,β-enones to silyl enol ethers.3
Intermediate for allylic silane synthon, 2-(trimethylsilyl)ethyltriphenylphosphonium iodide.4
Useful for the introduction of the trimethylsilylmethyl group.5

I

N
Na

O

PR

Si

+

I

SiMe3

O

N

SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 323-336.
2. Schmid, R. et al. J. Am. Chem. Soc. 1980, 102, 5122.
3. Cazeau, P. et al. Tetrahedron 1987, 43, 2075, 2089.
4. Fleming, I. et al. Synthesis 1979, 446.
5. Vedejs, E. J. Org. Chem. 1985, 50, 2170.
F&F: Vol. 14, p 89.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[4206-67-1]
TSCA-L EC 224-123-6 HMIS: 2-3-0-X
10g ¥15,400
50g ¥51,200

SII6451.2(3-IODOPROPYL)METHYLDIISOPROPOXYSILANE
C10H23IO2Si

O

I

Si

330.27

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-XO

50-3° / 0.3

1.257

1.46231.475

1.471410g ¥25,700

SII6452.0

3-IODOPROPYLTRIMETHOXYSILANE
C6H15IO3Si

O

Si

I
O

294

O

290.17

Couples zeolite monolayers to glass.1
1. Ha, K. et al. Adv. Mater. 2002, 12(15), 1114.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14867-28-8]
TSCA-L
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

79-80° / 2
Flashpoint: 78°C (172°F)

10g ¥11,900(215) 547-1015

50g ¥37,400

www.gelest.com

Enabling Your Technology
Name

bp °C/mm(mp °C)

D420

nD20

(-57°)

2.035

Reference Compound 6

H
I

Mw

Si

IODOSILANE
H3ISi
158.0045-6°ΔHvap: 29.8 kJ/mole
Synthesis: Ward, L., Inorg. Synth., 1968, 11, 159.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
[13598-42-0]
HMIS: 4-4-2-X

H

H

IODOTRIMETHYLSILANE - see SIT8564.0 TRIMETHYLIODOSILANE

SII6452.2

I

1-IODO-2-(TRIMETHYLSILYL)ACETYLENE
C5H9ISiSi

224.11

130°

1.46

1.511

Light sensitive
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18163-47-8]
HMIS: 2-3-1-X store <5°C
1.0g inquire

IRON SILICIDE - see SIF4910.0 FERROSILICON

Si
Cl

O
O
F

SII6452.3

Cl

ISOBUTYLDICHLOROSILANE
C4H10Cl2Si

H

157.11120-5°
Flashpoint: 10°C (50°F)

1.0295

1.427

131-3°
Flashpoint: 18°C (64°F)

0.863

1.418725

178°
Flashpoint: 50°C (122°F)

0.867

1.41250.851

1.3962

1.162

1.4335190-1°
0.9104Flashpoint: 63°C (145°F)
TOXICITY: oral rat, LD50: >5,000 mg/kg

1.3908See also SIB1933.0, SIH6165.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18236-87-8]
HMIS: 3-4-1-X
10g ¥26,300

SII6452.5

ISOBUTYLDIMETHYLCHLOROSILANE
C6H15ClSiCl

See also SID4065.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[27490-70-6]
EC 248-493-3 HMIS: 3-4-1-X
10g ¥11,900

COMPOUNDS

Si

150.72

SII6452.6

ISOBUTYLISOPROPYLDIMETHOXYSILANE
C9H22O2Si
190.36
Viscosity: 1.2 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[111439-76-0]
TSCA
HMIS: 3-2-1-X

Si
O

O
Si
O

Cl

SII6452.8

ISOBUTYLMETHYLDIMETHOXYSILANE
C7H18O2Si

162.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18293-82-8]
EC 242-171-6 HMIS: 2-2-1-X

63° / 40
Flashpoint: 38°C (100°F)
25g ¥18,600

SII6453.0

Cl

ISOBUTYLTRICHLOROSILANE
C4H9Cl3Si

140°
Flashpoint: 37°C (99°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18169-57-8]
TSCA EC 242-053-4 HMIS: 3-3-1-X
25g ¥6,600

PRSi

10g ¥17,800

SILICON

O

Cl

191.56100g ¥13,800

SII6453.5

OSi

Hydrophobic surface treatment for microporous minerals
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17980-47-1]
TSCA EC 402-810-3 HMIS: 2-2-1-X

O

2kg ¥34,000

16kg ¥197,000

ISOBUTYLTRIMETHOXYSILANEOTRIMETHOXYSILYL-2-METHYLPROPANE

C7H18O3Si
Viscosity: 0.8 cSt

154°
0.933
1.3960Flashpoint: 42°C (108°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Branched structure provides hydrophobic surface treatments for architectural coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[18395-30-7]
TSCA EC 242-272-5 HMIS: 3-2-1-X
50g ¥6,400
2kg ¥37,800
17kg ¥190,000

www.AZmax.co.jp

TEL: 03-5543-1630

178.30

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALO

25g ¥6,100

SII6453.7

OSi

220.38COMMERCIALISOBUTYLTRIETHOXYSILANE, 98%
C10H24O3Si

O

295

Name
O

bp °C/mm(mp °C)

D420

nD20

SII6454.0
C

O

N

Si
C

3-ISOCYANATOPROPYLDIMETHYLCHLOROSILANE
C6H12ClNOSi

Si

Cl

Release additive for urethane prepolymer systems
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[165454-24-0]
HMIS: 3-3-1-X

Si

25g ¥28,900

SII6454.4

C

Cl 3-ISOCYANATOPROPYLMETHYLDICHLOROSILANE
C5H9Cl2NOSi
Si

N

198.12

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

Cl50° / 0.3

1.1916O
O
F

O

62-6° / 0.6
Flashpoint: 70°C (158°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17070-70-1]
TSCA EC 241-131-5 HMIS: 3-2-1-X
10g ¥35,300

3-(3-ISOCYANATOPROPYL)HEPTAMETHYLTRISILOXANE, 95%
C11H27NO3Si3
305.59SiN

177.71

SII6454.3
O

O

O

Mw

10g ¥46,900

SII6454.45

C

3-ISOCYANATOPROPYLMETHYLDIETHOXYSILANE, 95%
C9H19NO3Si

O
N

Si

217.34110-5° / 10

Reacts rapidly with amine and hydroxyl functional species that can hydrolyze to form siloxane polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33491-28-0]
HMIS: 3-2-1-X
10g ¥28,400

O

SII6454.5

OC

3-ISOCYANATOPROPYLMETHYLDIMETHOXYSILANE, tech-95
C7H15NO3Si
189.29Contains isomers
See also SID6454.45
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

O
N

Si
O

61° / 1

1.03

10g ¥32,600

SII6455.0

C

3-ISOCYANATOPROPYLTRIETHOXYSILANE, 95%
C10H21NO4Si

O
N

Si

130° / 20
Flashpoint: 80°C (176°F)

Component in hybrid organic/inorganic urethanes.1
1. Cuney, S. et al. Better Ceramics Through Chemistry VII (MRS. Symp. Proc.) 1996, 435, 143.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3880[24801-88-5]
TSCA EC 246-467-6 HMIS: 3-2-1-X
25g ¥5,000OO

247.370.990

100g ¥13,000

1.4190COMMERCIALO

2kg ¥95,000

SII6456.0

C

O
N

Si
O

3-ISOCYANOTOPROPYLTRIMETHOXYSILANE, 95%
C7H15NO4Si
Viscosity: 1.4 cSt

O

205.29PR

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3887[15396-00-6]
TSCA EC 239-415-9 HMIS: 3-2-1-X

95-8° / 10
Flashpoint: 108°C (226°F)
TOXICITY: oral rat, LD50: 878 mg/kg
Autoignition temperature: 265˚C
25g ¥10,900

1.073100g ¥27,600

1.4219COMMERCIALO

2kg ¥134,000

SII6456.6

ISOOCTYLDIMETHYLCHLOROSILANE

Cl C10H23ClSi

Si

206.8383-5° / 10

0.852

See also SID4065.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[79957-95-2]
EC 279-358-7 HMIS: 3-3-1-X
25g ¥22,500

SII6457.0

Cl

ISOOCTYLTRICHLOROSILANE

Cl 1-TRICHLOROSILYL-2,4,4-TRIMETHYLPENTANE

Si

Cl

C8H17Cl3Si
247.67117° / 50
1.0684
Contact angle, water on treated silica surface: 105˚Flashpoint: 85°C (185°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18379-25-4]
TSCA EC 242-262-0 HMIS: 3-2-1-X
25g ¥10,300
100g ¥25,700

1.4510

SII6457.5

O

Si

O

296

276.48Architectural water-repellent
Water scavenger for sealed lubricant systems
See also SII6458.0, SIO6715.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[35435-21-3]
TSCA EC 252-558-1 HMIS: 1-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

236°(<-80°)
0.880
Flashpoint: >65°C (>150°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 265˚C

50g ¥6,600(215) 547-1015

2kg ¥48,000

www.gelest.com

1.416015kg ¥164,000

COMMERCIALO

ISOOCTYLTRIETHOXYSILANE
C14H32O3Si
Viscosity: 2.1 cSt
Vapor pressure, 112°: 10mm

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

90° / 10
Flashpoint: 52°C (126°F)
Autoignition temperature: 310°C

0.887

1.4176

SII6458.0
O

Si

ISOOCTYLTRIMETHOXYSILANE
C11H26O3Si
Viscosity: 2 cSt.

234.41

Component in Anti-Graffiti coatings
See also SII6457.5, SIO6715.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34396-03-7]
TSCA EC 251-995-5 HMIS: 3-2-1-X

O

25g ¥6,600

100g ¥13,800

COMMERCIALO

2kg ¥72,000

SII6460.0

ISOPROPENOXYTRIMETHYLSILANE, 95%
2-(TRIMETHYLSILOXY)PROPENE

Si

94-5°
Flashpoint: -1°C (30°F)

0.786

1.396026

OO
F

O

C6H14OSi
130.26
Contains hexamethyldisiloxane
1
Reagent for synthesis of cyclic-acetone ketals.
This and other enol silyl ethers add enantioselectively to imines.2
1. Larson, G. et al. J. Org. Chem. 1973, 38, 3935.
2. Fuji, A. et al. J. Am. Chem. Soc. 1999, 121, 5450.
See also SIC2552.0, SIV9089.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2960[1833-53-0]
TSCA EC 217-393-1 HMIS: 2-4-1-X

5g ¥25,700

ISOPROPENYLTRIMETHYLSILANE - see SIP6905.0 2-PROPENYLTRIMETHYLSILANE

Cl

136.69114°
Flashpoint: 15°C (59°F)

See also SID4065.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[3634-56-8]
TSCA
HMIS: 3-4-1-X
25g ¥20,400

0.873

1.4138

0.725

1.391

100g ¥58,600

SII6463.1

Si

ISOPROPYLDIMETHYLSILANE
C5H14SiH

102.25

Sterically-hindered reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18209-61-5]
TSCA
HMIS: 3-4-1-X

67-8°
Flashpoint: -30°C (-22°F)
10g ¥28,900

4,4’-ISOPROPYLIDENEBIS(TRIMETHYLSILOXYPHENOL) - see SIB1853.5 BIS(TRIMETHYLSILYL)BISPHENOL A

Cl
Si
Cl
Cl
Si

ISOPROPYLMETHYLDICHLOROSILANE
C4H10Cl2Si

157.11

116-7°
Flashpoint: 14°C (57°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[18236-89-0]
HMIS: 3-4-1-X
10g ¥19,900

1.03325

1.42501.195

1.4319

H10Si4122.42101°(-99°)
0.793
PYROPHORIC
AIR TRANSPORT FORBIDDEN
ΔHvap: 32.5 kJ/mole
Precursor for low temp. epitaxy of doped crystalline silicon.1
Employed in low temperature CVD of amorphous silicon.2
1. Francis, T. et al. US Pat. Appl. 20120003819, 2012.
2. Kanoh, H. et al. Jpn. J. Appl. Phys. 1993, 32, 2613.
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[13597-87-0]
TSCA-L
HMIS: 3-4-3-X
5g inquire* includes z-CYL-HPS-0050

1.5449SII6463.3

ISOPROPYLTRICHLOROSILANE
C3H7Cl3Si

Cl

177.53123°(-88°)
Flashpoint: 32°C (90°F)

See also SII6453.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4170-46-1]
HMIS: 3-4-1-X
10g ¥38,500

PR

Cl

SII6463.0

SILICONSi

ISOPROPYLDIMETHYLCHLOROSILANE
C5H13ClSiCOMPOUNDSSII6462.0

SII6463.4

H

H

H

Si

H

H

Si

Si
H

H

Si

ISOTETRASILANE

H
H

H(TRISILYL)SILANE

ISOTHIOCYANATOTRIMETHYLSILANE - see SIT8592.0 TRIMETHYLSILYLISOTHIOCYANATEITACONIC ACID DERVATIVE - see SIB1860.0 BIS(TRIMETHYLSILYL)ITACONATESIK6463.5

KAOLIN, calcined

ALUMINUM SILICATEAl2O3·2SiO2·2H2O

Al2O7Si2∙2H2O
258.16
Particle size: 1-1.5 μm
Mohs Hardness: 2-2.5
Typical bulk density, not compacted: 0.17 g/cm3
γc: 44
Surface tension: 44 mN/m
See also SIH5840.15, SIK6463.6, SIK6463.8
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1332-58-7]
TSCA-E EC 310-194-1 HMIS: 1-0-0-X
500g ¥7,700

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

2.63

1.62

3kg ¥26,000

www.gelest.com

297

Name

Mw

bp °C/mm(mp °C)

D420

nD20

2.6

1.56

3.61

1.71

SIK6463.6

KAOLIN, uncalcined
KAOLINITE

Crystal structure image
courtesy of webmineral.com

Al2Si2O5(OH)4
258.16
Particle Size: <24 μm
Mohs Hardness: 1.5-2.0
Typical bulk density, not compacted: 0.28 g/cm3
Triclinic pedial
White, hexagonal platelets, micron and nano sized, transparent to translucent
Widely used as coating pigment in plastics, rubber, inks, adhesives & sealants, refractories, ceramics
See also SIH5840.15, SIK6463.5
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1332-58-7]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600
5kg ¥37,000

KARSTEDT’S CATALYSTS - see SIP6830.3, SIP6831.2, SIP6832.2

SIK6463.8

KYANITE
Al2SiO5
Particle Size: <44 μm

SiNWhite, long bladed crystals
Alumina & silica source, used in advanced ceramics, refractories
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1302-76-7]
TSCA-E
HMIS: 1-0-0-X

500g ¥25,800

SIL6464.0

LANTHANUM TRIS(HEXAMETHYLDISILAZIDE)
C18H54LaN3Si6

Si

N
La

N

Si

Si

Si

Pb++

Si

620.07100-2° / 10-4 sub.

(145-9°)Catalyst for Tischenko reaction.1
Employed in CVD of lanthanum silicate.2
1. Bebenbach, H. et al. Angew. Chem., Int. Ed. Engl. 1998, 37, 1569.
2. Aspinal, H. C. et al. Chem. Vap. Deposition 2003, 9, 7.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35788-99-9]
HMIS: 2-1-1-X
5g ¥77,700

PBL6300

O-O

Mohs Hardness: 5.0-7.0
Triclinic pinacoidal

O
OF

Crystal structure image
courtesy of webmineral.com

Si

162.05O-

LEAD MONOSILICATEO3PbSi
劇物
283.28Equivalent composition: 85% PbO, 15% SiO2
Soluble: dil HCl
3
Typical bulk density, not compacted: 1.69 g/cm
-6
Coefficient of thermal expansion: 9.3 x 10
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems(既) 1-534[10099-76-0]
TSCA EC 233-246-4 HMIS: 2-0-0-X
250g ¥12,500(700-730°)

6.5

2.01

2.84

1.53

SIL6465.0

LEPIDOLITE
K(LiAl)3(Si,Al)4O10(F,OH)2
Particle Size: <74 μm

Li+

F
F

Mohs Hardness: 2.0-3.0
Monoclinic

White, tubular crystals, cleavable masse,
Source of lithium (3-4%) for glass, ceramics, batteries, lubricants
See also SIS6988.5
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7439-93-2]
TSCA-E
HMIS: 1-0-0-X

PR

Crystal structure image
courtesy of webmineral.com

388.30500g ¥10,900

10kg ¥58,000

LITHIUM ALUMINUM SILICATE, see - SIS6988.5 SPODUMENE

F

Si-F

F
F

SIL6466.5

Li+

LITHIUM HEXAFLUOROSILICATE, dihydrate
F6Li2Si∙2H2O
劇物

155.96 / 191.99(100° dehydrates)

Soluble: water, methanol
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions(既) 1-327[17347-95-4]
TSCA EC 241-372-6 HMIS: 3-0-0-X

2.330

10g ¥20,400

SIL6467.0

LITHIUM HEXAMETHYLDISILAZIDE, 95%
LITHIUM BIS(TRIMETHYLSILYL)AMIDE

C6H18LiNSi2

Si

Li

N

Si

298

167.33

114-6° / 1(71-2°)

Sterically-hindered strong baseDegrades slowly at room temperature - solutions exhibit enhanced stability
Review of synthetic utility.1
Converts aryl halides to anilines.2
O

O

Br

1. (Me3Si)2NLi, Pd(dba)2, tBu3P
2. HClOO

NH2Reacts with ketones and esters in the presence of triethylamine to form the (E)-enol silyl ether with high selectivity.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 356-367.
2. Lee, S. et al. Org. Lett. 2001, 3, 2729.
3. Godenschwager, P. F.; Collum, D. B. J. Am. Chem. Soc. 2008, 130, 8726.
F&F: Vol. 4, p 296; Vol. 5, p 393; Vol. 7, p 197; Vol. 12, p 280; Vol. 13, p 165, p 188, p 257; Vol. 14, p 194; Vol. 15, p 207; Vol. 16, p 16,
p 357; Vol. 17, p 33; Vol. 21, p 251.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4039-32-1]
TSCA EC 223-725-6 HMIS: 3-3-1-X store <5°C
25g ¥11,400
100g ¥29,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIL6467.2

Li

N
Si

COMMERCIAL

LITHIUM HEXAMETHYLDISILAZIDE, 0.85M in hexane
C6H18LiNSi2
167.330.716
19 - 21 wgt %Flashpoint: -23°C (-9°F)
Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 356-367.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4039-32-1]
TSCA EC 223-725-6 HMIS: 3-4-1-X
100g ¥8,300
2.5kg ¥95,000

Si

SIL6467.4

N
Si

O
-O

Si

SIL6469.0

LITHIUM METASILICATE
Li2O3Si
89.89
Solubility in water, 70°: 0.6 g/l
Bulk density: 0.8-0.9 g/cc
See also SIL6469.5
Li+ HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid
[10102-24-6]
TSCA EC 233-270-5 HMIS: 1-0-0-X

O-

O

Si

2.52

500g ¥26,800

SIL6469.2

O- Li+
Li+ -(1,204°)O- Li+

O- Li+LITHIUM ORTHOSILICATE, tech-95
Li4O4Si

119.85

Potential for use as an electrolyte-electrode material.1
1. Chang, C. C. Materials & Design 2001, 22, 617.
HYDROLYTIC SENSITIVITY: 6: forms irreversible hydrate[13453-84-4]
EC 236-634-1 HMIS: 3-1-1-X

2.326

25g ¥67,100

LITHIUM POLYSILICATE, 20% in water
Li2O11Si5
330.30
pH: 11-12
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[12627-14-4]
TSCA EC 235-730-0 HMIS: 2-0-0-X

TOXICITY: oral rat; LD50: 16,540 mg/kg
100g ¥6,100

1.160

1kg ¥12,300

20kg ¥123,000

COMMERCIAL

SIL6469.5

COMPOUNDS

Li+

O
O
F

Li

COMMERCIAL

LITHIUM HEXAMETHYLDISILAZIDE, 1.25M in tetrahydrofuran
C6H18LiNSi2
167.330.90
23-25 wgt %Flashpoint: -14°C (7°F)
Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 356-367.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4039-32-1]
TSCA EC 223-725-6 HMIS: 3-4-1-X
100g ¥13,500
2kg ¥62,000

Si

LITHIUM SILICIDELITHIUM-SILICON ALLOY

Li6-7Si2
97.8 - 104.7
44% Li; -60 - +200 mesh powder
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[68848-64-6]
HMIS: 3-3-2-X
25g ¥51,200

PR

SIL6469.7

Li

+ -

O

LITHIUM TRIMETHYLSILANOLATE
C3H9LiOSiSi

SILICON

SIL6469.6

96.13

Employed in light emitting electrochemical cells (LECs)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2004-14-0]
HMIS: 3-2-1-X

10g ¥22,500

SIL6470.0

Li+ -CSiF

LITHIUM (TRIMETHYLSILYL)ACETYLIDE, 0.5M in tetrahydrofuran
C5H9LiSi
104.1512-13 wgt %Flashpoint: -14°C (7°F)
Forms conductive anisotropic films on reaction with halotriazines.1
Intermediate for synthesis of alkylgalliumacetylides.2
1. Kouvetakis, J. Chem. Mater. 1994, 6, 636.
2. Lee, K. et al. J. Organomet. Chem. 1993, 449, 53.
See also SIT8594.1
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[54655-07-1]
HMIS: 3-4-1-X
25g ¥13,000

0.829

100g ¥34,500

SIM6470.5

F

F
Si-- F++
Mg
F
F

MAGNESIUM HEXAFLUOROSILICATEF6MgSi∙6H2O
劇物
166.39 / 274.48>120 dec.
1.788
Solubility in water: 1.07 g/l
TOXICITY: oral rat, LD50: 200 mg/kg
Employed in pressure treatment of wood, moth treatment for textiles
See also SIA0705.0
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid(既) 1-329[16949-65-8]
TSCA EC 241-022-2 HMIS: 3-0-0-X
500g ¥10,400
10kg ¥81,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

299

Name

Mw

bp °C/mm(mp °C)

D420

nD20

2.3

1.48

2.75

1.54-1.59

SIM6470.7

MAGNESIUM MONTMORILLONATESAPONITE

Ca0.1Na0.1Mg2.25Fe0.75Si3AlO10(OH)2∙4H2O
Particle Size: <24 μm

Crystal structure image
courtesy of webmineral.com

480.19

Mohs Hardness: 1.5-2.0
Monoclinic prismaticWhite, fine-grained, translucent
Moderate cation exchange capacity, translucent
Silane modifications more hydrolytically stable than Bentonite; may be exfoliated
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1319-41-1]
TSCA-E EC 215-289-0 HMIS: 1-0-0-X
500g ¥9,600

10kg ¥48,000

SIM6471.0

MAGNESIUM SILICATE, hydrous
TALC

Mg3O10(OH)2Si4
379.28Median particle size: 3-6 μm
Mohs Hardness: 1.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[13376-74-4]
TSCA-E
HMIS: 1-0-0-X

OO
F(1,557° dec.)

Crystal structure image
courtesy of webmineral.com

2.5kg ¥17,700

10kg ¥54,000

SIM6472.0

MAGNESIUM SILICIDE, powder
Mg2Si
76.71
Specific heat: 836.8 J/kg/°
Thermal conductivity: 7.91 W/m ˚C
Source for disilane, higher silanes.1
1. Arkles, B. Kirk-Othmer Encyclopedia of Chemical Technology; 1997; 22, p38.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[22831-39-6]
TSCA EC 245-254-5 HMIS: 1-3-1-X

Mg2Si(1,102°)

1.94

25g ¥19,400

SIM6472.7(-)-MENTHYLDIMETHYLSILANE
C12H26Si

Si

H

83° / 0.5

0.829

1.54820.975

1.44461.000

1.45025g ¥48,500

SIM6473.0

O(MERCAPTOMETHYL)METHYLDIETHOXYSILANE, 95%
C6H16O2SSi

Si
HS

198.42

Optically active reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 3-2-1-X

180.34HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55161-63-2]
HMIS: 3-2-1-X

O60° / 10
Flashpoint: 58°C (136°F)
10g ¥27,300

SIM6474.0

HSSi

180.34

Intermediate for silicones in thiol-ene UV-cure systems
Adhesion promoter for polysulfide sealants
Used to make thiol-organosilica nanoparticles.1
1. Nakamura, M.; Ishimura, K. Langmuir 2008, 24, 5099.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-3498[31001-77-1]
TSCA EC 250-426-8 HMIS: 3-2-1-X

PRO

3-MERCAPTOPROPYLMETHYLDIMETHOXYSILANE, 96%
C6H16O2SSi

96° / 30
Flashpoint: 93°C (199°F)

100g ¥9,800

2kg ¥108,000

18kg ¥520,000

SIM6475.0

3-MERCAPTOPROPYLTRIETHOXYSILANE, 95%
C9H22O3SSi

O

HS

Si

O

300

O

238.42For blocked version see SIO6704.0
Used to make thiol-organosilica nanoparticles.1
1. Nakamura, M.; Ishimura, K. Langmuir 2008, 24, 5099.
See also SIO6704.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2045[14814-09-6]
TSCA EC 238-883-1 HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

210°
0.9325Flashpoint: 88°C (190°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg

25g ¥12,700(215) 547-1015

100g ¥33,700

www.gelest.com

1.4331COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

サイラエース S810
3-MERCAPTOPROPYLTRIMETHOXYSILANE
C6H16O3SSi
196.3493° / 40
1.051251.450225
Viscosity: 2 cSt
Flashpoint: 96°C (205°F)
γc of treated surfaces: 41 mN/m
TOXICITY: oral rat, LD50: 2,380 mg/kg
O
Specific wetting surface: 348 m2/g
Primary irritation index: 0.19
HS
Si
Coupling agent for EPDM and mechanical rubber applications
O
Adhesion promoter for polysulfide adhesives
O
For enzyme immobilization.1
Treatment of mesoporous silica yields highly efficient heavy metal scavenger.2
Couples fluorescent biological tags to semiconductor CdS nanoparticles.3
Modified mesoporous silica supports Pd in coupling reactions.4
Used to make thiol-organosilica nanoparticles.5
Forms modified glass and silica surfaces suitable for SILAR fabrication of CdS thin films.6
1. Stjernlöf, P. et al. Tetrahedron Lett. 1990, 31, 5773.
2. Liu, J. et al. Science 1997, 276, 923.
3. Bruchez, M. et al. Science 1998, 281, 2013.
4. Crudden, C. et al. J. Am. Chem. Soc. 2005, 127, 10045.
5. Nakamura, M.; Ishimura, K. Langmuir 2008, 24, 5099.
Adhesion promoter for structural
6. Sun, H. et al. J. Dispersion Sci. Technol. 2005, 26, 719.
polysulfide glass sealants
See also SID3545.0, SIM6476.1, SIM6475.0
100g ¥4,900
1kg ¥9,300
サイラエース S810
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2045[4420-74-0]
TSCA EC 224-588-5 HMIS: 3-2-1-X
100g inquire
2kg inquire
18kg inquire

COMMERCIALOOFSIM6476.0

SIM6476.1

SiOO

Low fluorescence grade for high-throughput screening
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2045[4420-74-0]
TSCA EC 224-588-5 HMIS: 3-2-1-X

93° / 40
Flashpoint: 96°C (205°F)

1.051251.450225

0.84961.453925g ¥27,800** in fluoropolymer bottle

SIM6479.0

HS

Si

HS

11

3-MERCAPTOPROPYLTRIMETHYLSILANE
C6H16SSi

148.3497° / 30

Forms self-assembled monolayers on gold
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[13399-93-4]
HMIS: 3-3-0-X

5g ¥42,700

SIM6479.3

O

11-MERCAPTOUNDECYLOXYTRIMETHYLSILANE
C14H32OSSiSi

276.55

Forms SAMs with “detachable mushroom heads”
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[394210-97-0]
HMIS: 2-2-1-X

1.0g ¥26,000

SIM6480.0

11-MERCAPTOUNDECYLTRIMETHOXYSILANE, 95%
C14H32O3SSi

O

HS

Si

10

O

PR

O

308.55150° / 0.5

Stabilizes ionic liquid drop micro-reactors.1
1. Zhang, X. et al. J. Nanotechnol. 2012, 3, 33.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[877593-17-4]
HMIS: 3-2-1-X

0.955

COMPOUNDS

HS

196.34

SILICON

3-MERCAPTOPROPYLTRIMETHOXYSILANE, 99+%
C6H16O3SSi

O

2.5g ¥52,200

SIM6480.6

METHACRYLAMIDOTRIMETHYLSILANE, tech-95

H
N

TRIMETHYLSILYLMETHACRYLAMIDE

C7H15NOSi
157.2860° / 0.5
Contains N, O tautomers
Readily polymerized in non-polar media; may be deblocked to form hydrophilic polymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18295-89-1]
HMIS: 2-2-1-X store <5°C
10g ¥17,200

Si

O

Si
Si

O

O

Si

50g ¥58,600

SIM6480.7

OHN(65-8°)(3-METHACRYLAMIDOPROPYL)BIS(TRIMETHYLSILOXY)METHYLSILANE
C14H33NO3Si3
347.68Inhibited with BHT
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 2-2-0-X store <5°C

25g ¥61,800

SIM6480.73

H
N

O

O

O

Si
O

(3-METHACRYLAMIDOPROPYL)TRIETHOXYSILANE, tech-95
C13H27NO4Si
289.44
Contains 3-methacrylamidopropyldiethoxymethoxysilane
Flashpoint: >110°C (>230°F)
Hydrophilic coupling agent
Intermediate for contact lens monomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[109213-85-6]
HMIS: 2-2-1-X store <5°C
25g ¥33,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.0225www.gelest.com

301

Name

Mw

bp °C/mm(mp °C)

D420

nD20

C9H18O3Si
202.3265° / 0.9
0.928
Inhibited with MEHQ
Flashpoint: 76°C (169°F)
Forms copolymers with methyl methacrylate, butyl methacrylate, etc.
Group transfer polymerization yields polymers suitable for contact lenses.1
Monomer for synthesis of hydroxyethyl functional methacrylates.2
Undergoes anionic polymerization.3
1. Seidner, L. et al. U.S. Patent 5,244,981, 1993.
2. Hirao, A. et al. Macromol. 1986, 19, 1294.
3. Nagasaki, Y. et al. Polym. Prepr. 1997, 38, 514.
See also SIM6485.9
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17407-09-9]
EC 241-432-1 HMIS: 3-2-1-X store <5°C
25g ¥12,500
100g ¥32,600

1.4280SIM6481.0

METHACRYLOXYETHOXYTRIMETHYLSILANE
2-(TRIMETHYSILOXY)ETHYL METHACRYLATE

O
O

O

Si

O

O

O

N
H

O-(METHACRYLOXYETHYL)-3-[BIS(TRIMETHYLSILOXY)METHYLSILYL]PROPYLCARBAMATE, tech-95
C17H37NO6Si3
435.74OOFOSIM6481.05

Si

O

Si

O

Si

Hydrophilic monomer candidate for contact lens applications
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 2-2-0-X store <5°C

1.008

1.4453

1.05125

1.4462525g ¥104,200

SIM6480.8

O
O

O

O

O

N
H

Si
O

O

O-(METHACRYLOXYETHYL)-N-(TRIETHOXYSILYLPROPYL)CARBAMATE, 90%
C16H31NO7Si
377.51
Inhibited with MEHQ
Hydrophilic monomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[115396-93-5]
HMIS: 3-2-1-X store <5°C

25g ¥15,600

100g ¥43,200

SIM6481.15

O

3-(3-METHACRYLOXY-2-HYDROXYPROPOXY)PROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE, tech-95
SIGMA

Si

O

O
O

HO

Si

C17H38O6Si3
422.74
Inhibited with MEHQ
Flashpoint: 180°C (356°F)
Contact lens monomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69861-02-5]
HMIS: 2-2-0-X store <5°C
25g ¥38,500

OSi

SIM6481.1

O
O

O

H
N

HO

Si

O

O

(METHACRYLOXYMETHYL)BIS(TRIMETHYLSILOXY)METHYLSILANE, 95%OO

1.4084

SIM6481.2

Si

O

N-(3-METHACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE, 50% in ethanol
C16H33NO6Si
363.530.910
Inhibited with MEHQ
Flashpoint: 11°C (52°F)
Employed in conservation/consolidation of stone.1
1. Wheeler, G. In Ninth Int’l Cong. On Deterioration and Conservation of Stone; Fassina, Ed.; Elsevier: 2000; Vol. 2, 541.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[96132-98-8]
HMIS: 3-4-1-X store <5°C
25g ¥17,200
100g ¥48,300

METHACRYLOXYMETHYLHEPTAMETHYLTRISILOXANE

C12H28O4Si3
320.60Inhibited with MEHQHYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18166-40-0]
HMIS: 3-2-0-X store <5°C

PR

Si
O

Si

90-1° / 2

0.917

1.41500.94471.428225

25g ¥28,900

SIM6481.3

O

O

Si

(METHACRYLOXYMETHYL)DIMETHYLETHOXYSILANE
C9H18O3Si
202.3262-3° / 0.3
Inhibited with MEHQHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5577-70-8]
HMIS: 3-2-1-X store <5°C
50g ¥55,400

O

SIM6481.43

O(METHACRYLOXYMETHYL)METHYLDIETHOXYSILANE
C10H20O4Si
Inhibited with MEHQ

O

O

Si

O

221°
0.977
Flashpoint: 88°C (190°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[121177-93-3]
TSCA
HMIS: 2-2-1-X store <5°C

25g ¥14,600

SIM6481.46

O

O

O

Si
O

302

232.35(METHACRYLOXYMETHYL)METHYLDIMETHOXYSILANE
C8H16O4Si
Inhibited with MEHQ

204.30205°
1.020Flashpoint: 82°C (180°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 300˚C

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3978-58-3]
HMIS: 3-2-1-X store <5°C

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

25g ¥11,900(215) 547-1015

100g ¥31,000

www.gelest.com

1.4274

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.954

1.454

1.003

1.5068SIM6481.48
Si

O

O
Si

Si

O

O
Si

METHACRYLOXYMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed isomers
C22H42O5Si4
498.91
160-180° / 0.2
Inhibited with MEHQHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[108587-59-3]/[108587-60-6]
HMIS: 2-2-0-X store <5°C
25g ¥46,900

SIM6481.5(METHACRYLOXYMETHYL)PHENYLDIMETHYLSILANE(PHENYLDIMETHYLSILYL)METHYL METHACRYLATEOO

C13H18O2Si
234.37
106-7° / 1
Inhibited with MEHQ
Flashpoint: 105°C (221°F)
High refractive index silane monomer
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18052-92-1]
TSCA
HMIS: 3-1-0-X store <5°C
25g ¥32,600

Si

O

O
O

Si

O
O
F

SIM6482.0

METHACRYLOXYMETHYLTRIETHOXYSILANE
C11H22O5Si
262.3865-8° / 2
1.000
Inhibited with MEHQ
Flashpoint: 100°C (212°F)
Treatment of fumed silica in acrylic casting compositions accelerates polymerization.1
1. Morozova, E. et al. Chem. Abstr. 95,98753g; Plast. Massy 1981, 7.
See also SIM6483.0, SIM6487.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5577-72-0]
TSCA
HMIS: 3-2-1-X store <5°C
10g ¥15,600
50g ¥52,200

OO

1.4225

O

O

Si
O

O

METHACRYLOXYMETHYLTRIMETHOXYSILANE
C8H16O5Si
220.3048-50° / 2(-44°)
1.070
1.4271
Inhibited with MEHQ
Flashpoint: 92°C (198°F)
Viscosity: 1.5 cSt
TOXICITY: oral rat, LD50: >2,000 mg/kg
Hydrolysis rate > 10 X SIM6487.4
Autoignition temperature: 285°C
Modification of novolac resin affords bilevel resists having attributes of trilevel resists.1
1. Reichmanis, E.; Smolinsky, G. U.S. Patent 4,481,049, 1984.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[54586-78-6]
TSCA
HMIS: 3-2-1-X store <5°C
10g ¥7,200
50g ¥18,300
2kg ¥206,000

SIM6485.6

OO

METHACRYLOXYMETHYLTRIMETHYLSILANE
C8H16O2Si
172.3098° / 75
Inhibited with MEHQ
Flashpoint: 45°C (113°F)
Polymerizeable monomer
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18269-97-1]
HMIS: 3-2-0-X store <5°C
10g ¥14,600

Si

O
O

1.428225

0.926

1.415022

50g ¥48,000

SIM6485.8

SiO

0.88325

Si

Si

O

O
Si

METHACRYLOXYMETHYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
C14H34O5Si4
394.75130-5° / 1
Inhibited with MEHQ
Oxygen permeable monomer
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[74681-63-3]
HMIS: 3-2-0-X store <5°C
10g ¥13,800

50g ¥44,800

SILICONOCOMPOUNDS

SIM6483.0

PR

O

SIM6486.14

METHACRYLOXYPENTAMETHYLDISILOXANEOOPENTAMETHYLDISILOXANYL METHACRYLATE

C9H20O3Si2
232.43
Inhibited with MEHQ
Forms oxygen-permeable, wettable contact lenses.1
1. Powell, J. U.S. Patent 4,581,184, 1986.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4880-04-0]
HMIS: 3-3-1-X store <5°C

Si

O

Si

45° / 10.925

25g ¥35,300

100g ¥106,900

SIM6485.9

O

O

Si

4-6

O

O

O

Si

O
Si

1.022

Average of 4-6 -(OCH2CH2)- units
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-3-1-X store <5°C

100g ¥28,900

SIM6486.0

Si

O

O-METHACRYLOXY(POLYETHYLENEOXY)TRIMETHYLSILANE, 95%
C15H30O6Si, C17H34O7Si, C19H38O8Si
335 - 425

3-METHACRYLOXYPROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE, 95%
C14H32O4Si3
348.66
83-5° / 1.5
Inhibited with MEHQ
Flashpoint: 147°C (297°F)
Employed in silicone-modified hydroxyl contact lenses.1
1. Van der Laan, D. et al. EP 940693 A2, 1999.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[19309-90-1]
TSCA EC 242-954-2 HMIS: 3-1-0-X store <5°C
10g ¥17,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.912

www.gelest.com

303

Name

(mp °C)

D420

nD20

METHACRYLOXYPROPYLBIS(TRIMETHYLSILOXY)SILANOL-METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 1:4 blend
C13H30O5Si3
350.630.94
Inhibited with MEHQ
A stable hydrophilic blend for preparation of rigid gas permeable contact lenses
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[83692-44-8]/[17096-07-0]
HMIS: 2-2-0-X store <5°C
25g ¥24,100

O
Si

O

bp °C/mm

SIM6486.1

Si

O

Mw

OH

O
Si

Si

O

O
O

Si

O

O

Si

Si

SIM6486.2

3-METHACRYLOXYPROPYLDIMETHYLCHLOROSILANE, tech-95
C9H17ClO2Si
220.7778° / 1
Inhibited with MEHQ, BHT
Flashpoint: 85°C (185°F)
Si
Cl Coupling agent for nanocomposites
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[24636-31-5]
TSCA EC 246-377-7 HMIS: 3-2-1-X store <5°C
10g ¥21,500

O
O

1.012

1.4510

O

Si

O

O
O
F

SIM6486.4

O

METHACRYLOXYPROPYLDIMETHYLETHOXYSILANE, 95%
C11H22O3Si
230.3875-6° / 0.4
Inhibited with MEHQHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13731-98-1]
HMIS: 3-2-1-X store <5°C
10g ¥26,800

0.926

1.43710.944

1.4381

1.10825

1.4552

SIM6486.5

O
O

Si

O

C

Si

i-C4H9O O
Si O

O
i-C4H9O

Si

i-C4H9CH2

H2C

i-C4H9

Si
O

O
Si
O

CH2

Si
O i-C4H9
O

O Si

Si

METHACRYLOXYPROPYLHEPTAISOBUTYL-T8-SILSESQUIOXANE, tech-95
C35H74O14Si8
943.64
Inhibited with MEHQHigh oxygen permeability monomer
Soluble: THF, hexane
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[307531-94-8]
HMIS: 1-1-0-X store <5°C

O

C
O

O

50g ¥54,400

SIM6486.65

CH2
H3C

METHACRYLOXYPROPYLDIMETHYLMETHOXYSILANE, 95%
C10H20O3Si
216.3570-2° / 0.5
Inhibited with MEHQ
Component in positive tone 157 nm resist.1
1. Tegou, E. et al. Chem. Mater. 2004, 16, 2567.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[66753-64-8]
EC 266-472-7 HMIS: 3-2-1-X store <5°C
10g ¥16,200

i-C4H9i-C4H9(108-112°)

10g ¥28,900

SIM6486.7

O

METHACRYLOXYPROPYLMETHYLDICHLOROSILANE, 95%

O

Si
Cl

Cl C H Cl O Si
8 14
2 2

241.1975° / 2
Inhibited with MEHQ, BHT
Flashpoint: 92°C (198°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18301-56-9]
TSCA EC 242-185-2 HMIS: 3-2-1-X store <5°C
50g ¥46,400

SIM6486.8

O

METHACRYLOXYPROPYLMETHYLDIETHOXYSILANE, 95%
C12H24O4Si
260.4095° / 1
0.965
Inhibited with MEHQ
Flashpoint: 136°C (277°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2075[65100-04-1]
HMIS: 3-1-1-X store <5°C
10g ¥15,100
50g ¥50,100

PR

O

O

Si

O

SIM6486.9

O

METHACRYLOXYPROPYLMETHYLDIMETHOXYSILANE, 95%

O C10H20O4Si

O

Si

O

235.6965° / 0.35
1.000
Inhibited with MEHQ
Flashpoint: 115°C (239°F)
1
Monomer for hybrid inorganic-organic composites.
1. Taylor-Smith, R. Polym. Mater. Sci. Eng., Preprints 1997, 77, 503.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2075[14513-34-9]
EC 238-518-6 HMIS: 3-1-1-X store <5°C
25g ¥15,400
100g ¥42,200

1.4355

SIM6487.0

O

O

Si

O

N

O

O
O

Si

METHACRYLOXYPROPYLPENTAMETHYLDISILOXANE, 95%
C12H26O3Si2
274.51120-5° / 1
0.90125
Inhibited with MEHQ
Flashpoint: 110°C (230°F)
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18151-85-4]
TSCA EC 242-037-7 HMIS: 3-1-0-X store <5°C
10g ¥17,800
50g ¥60,700

SIM6487.1

METHACRYLOXYPROPYLSILATRANE, 95%
C13H23NO5Si
301.41
Inhibited with MEHQ; contains methanol, viscous liquid or solid
Si
OO
Component in marine bio-fouling resistant coatings
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[27692-57-5]
HMIS: 3-1-0-X store <5°C

1.17025

10g ¥13,500

50g ¥43,800

METHACRYLOXYPROPYLSILOXANE MACROMER - see MCR-M11 in polymer section

304

1.4330www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4340Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

METHACRYLOXYPROPYL TERMINATED POLYDIMETHYLSILOXANE - see DMS-R05

SIM6487.17

O
O

O

O
Si

O

O

O
O

3-METHACRYLOXYPROPYLTRIACETOXYSILANE, tech-90
C13H20O8Si
332.38140-5° / 0.7
Inhibited with BHT/MEHQ
Flashpoint: >135°C (>275°F)
Viscosity: 15-25 cSt
Contains methacryloxypropylacetoxysiloxane oligomers
Adhesion promoter for silicone and acrylate resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[51772-85-1]
TSCA
HMIS: 3-1-1-X store <5°C
25g ¥35,300

1.16SIM6487.2

O

1.4650OOFMETHACRYLOXYPROPYLTRICHLOROSILANE, tech-95
C7H11Cl3O2Si
261.6196-8° / 1
1.251
Inhibited with MEHQ, BHT
Flashpoint: >94°C (>200°F)
Cl
1
Employed as adhesion promotor for acrylates in microcontact printing.
Si
Used in facilitating polymer brush growth on silica.2
Cl 1. Carter, K. et al. Polym. Preprints 2002, 43(1), 403.
Cl
2. Beinhoff, M. et al. Chem. Mater. 2006, 18, 3425.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7351-61-3]
TSCA EC 230-878-2 HMIS: 3-1-1-X store <5°C
25g ¥18,000
100g ¥50,900

O

SIM6487.3

METHACRYLOXYPROPYLTRIETHOXYSILANE
C13H26O5Si
290.43130° / 4
0.985
Inhibited with MEHQ
Flashpoint: 128°C (262°F)
See also SIM6482.0, SIM6487.35
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2076[21142-29-0]
TSCA EC 244-239-0 HMIS: 3-1-1-X store <5°C
10g ¥10,900
50g ¥33,200

O

Si

O
O

O

1.4277METHACRYLOXYPROPYLTRIISOPROPOXYSILANE
C16H32O5Si
332.51
0.942
Inhibited with MEHQ, HQ
TOXICITY: oral rat, LD50: >5,000 mg/kg
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[80750-05-6]
TSCA EC 279-538-5 HMIS: 2-2-1-X store <5°C
25g ¥16,200
100g ¥44,800

O

Si

O
O

O

COMPOUNDS

SIM6487.35

O

1.4234

サイラエース S710
METHACRYLOXYPROPYLTRIMETHOXYSILANE
C10H20O5Si
248.3578-81° / 1(-48°)
1.045
1.4310Inhibited with MEHQ, HQ
Flashpoint: 108°C (226°F)
Viscosity: 2 cSt
TOXICITY: oral rat, LD50: 3,000 mg/kg
Copolymerization parameters-e,Q: 0.07, 2.7
Primary irritation index: 1.19
Specific wetting surface: 314m2/g
Coupling agent for radical cure polymer systems
See SIA0200.0 for acrylate-functional UV cureable analog
Widely used coupling agent for unsaturated polyester-fiberglass composites.1
Copolymerized with styrene in formation of sol-gel composites.2
Employed in dental polymer composites.3
1. Arkles, B. Chemtech 1977, 7, 713.
2. Wei, Y. et al. J. Mater. Res. 1993, 8, 1143.
3. Matinlinna, J. et al. Int. J. Prosthodontics 2004, 17, 157.
See also SIM6483.0, SIM6487.3
100g ¥4,900
1kg ¥9,300
サイラエース S710
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2076[2530-85-0]
TSCA EC 219-785-8 HMIS: 3-1-1-X store <5°C
100g inquire
2kg inquire
18kg

SIM6487.4

O

O

Si

O

O

O

SIM6487.4LI

O

Si

O

O

O

O

Si

O

O

O

METHACRYLOXYPROPYLTRIMETHOXYSILANE, low inhibitor grade
C10H20O5Si
248.3578-81° / 1
Contains <10 ppm BHT, hydroquinones
Employed in dental restorative composites
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2076[2530-85-0]
TSCA EC 219-785-8 HMIS: 3-1-1-X store <5°C
25g ¥18,300

1.045

1.4310SIM6487.5

O

O

COMMERCIALPRO

SILICONOOOMETHACRYLOXYPROPYLTRIS(METHOXYETHOXY)SILANE, tech-80
C16H32O8Si
380.51128° / 10
1.06
Inhibited with MEHQ
Flashpoint: 195°C (383°F)
Contains methacryloxypropylbis(methoxyethoxy)methoxysilane and methacryloxypropyl(methoxyethoxy)dimethoxysilane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2074[57069-48-4]
TSCA EC 260-537-3 HMIS: 3-1-1-X store <5°C
50g ¥25,700

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305

Name

(mp °C)

D420

nD20

METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE

OO

bp °C/mm

SIM6487.6

Si

O

Mw

Si

O

O

TRIS(TRIMETHYLSILOXY)PROPYL METHACRYLATE

C16H38O5Si4
422.82139° / 1
0.930
Inhibited with MEHQ
Flashpoint: 200°C (392°F)
1,2
Important monomer in gas permeable contact lens technology.
1. Gaylord, N. U.S. Patent 3,808,178, 1974.
2. Arkles, B. Chemtech 1983, 13, 542.
See also SIM6487.6-06, SIM6481.2, SIA0210.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17096-07-0]
EC 241-165-0 HMIS: 3-1-0-X store <5°C
25g ¥11,400
100g ¥29,400

SiSi

1.417625

SIM6487.6-06

METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 94%
422.82139° / 1
0.930
Inhibited with MEHQ
Flashpoint: 200°C (392°F)
Contains 6% difunctional disiloxane SIB1400.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17096-07-0]/[80722-63-0]
HMIS: 3-1-0-X store <5°C
25g ¥11,400
100g ¥29,400

O
O

Si

O

O
Si

1.417625

O
O
F

Si

O

Si

SIM6487.6-20

Si

O

O
O

Si

O

O
Si

METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 80%422.82139° / 1
0.930
Inhibited with MEHQ
Flashpoint: 200°C (392°F)
Contains 20% difunctional disiloxane SIB1400.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17096-07-0]/[80722-63-0]
HMIS: 3-1-0-X store <5°C
25g ¥11,400
100g ¥29,400

Si

1.417625

SIM6487.8

Si

O

O
O

Si
O

Si

O

Si

METHACRYLOXYPROPYLTRIS(VINYLDIMETHYLSILOXY)SILANE, tech-95
C19H38O5Si4
458.85
Inhibited with MEHQ
Flashpoint: >200°C (>392°F)
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17096-10-5]
HMIS: 3-1-0-X store <5°C
50g ¥44,800

0.952

SIM6491.0

METHACRYLOXYTRIMETHYLSILANE
C7H14O2Si
158.2743-58° / 23
Inhibited with MEHQ
Flashpoint: 32°C (90°F)
Blocked methacrylate which can be deblocked following polymerization.1
1. Jarus, A. et al. Polym. Mater. Sci. Eng. 1999, 81, 509.
See also SIA0320.0, SIB1860.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13688-56-7]
HMIS: 3-3-1-X store <5°C
25g ¥14,600

O
Si

O

0.885

1.4716100g ¥39,500

METHALLYLTRIMETHYLSILANE - see SIM6513.0 (2-METHYLPROPENYL)TRIMETHYLSILANE

SIM6491.5

11-(2-METHOXYETHOXY)UNDECYLTRICHLOROSILANE
Cl C H Cl O Si

PR

Cl

O

O

Si

11

14

Cl

29

3

2

363.83145-9° / 1.25

1.07

Forms self-assembled monolayers with “hydrophilic tips”
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[943349-49-3]
HMIS: 3-2-1-X
5g ¥25,200

SIM6491.7

O

O

O

O

Si

11

O

11-(2-METHOXYETHOXY)UNDECYLTRIMETHOXYSILANE
C17H38O5Si

350.57

See also SIM6493.7
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

152-3° / 0.3
Flashpoint: >110°C (>230°F)

0.947

5g ¥34,200

SIM6492.0

METHOXYMETHYLTRIMETHYLSILANE
C5H14OSiO

Si

118.2583-4°
Flashpoint: -5°C (23°F)

Employed in the homologation of aldehydes and ketones.1,2
1. Magnus, P.; Roy, G. J. Chem. Soc., Chem. Commun. 1979, 822-3.
2. Magnus, P.; Roy, G. Organometallics 1982, 1, 553-9.
F&F: Vol. 10, p 246; Vol. 11, p 331.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[14704-14-4]
HMIS: 2-4-0-X store <5°C

0.755

10g ¥31,600

N-(METHOXYMETHYL)-N-(TRIMETHYLSILYLMETHYL)BENZYLAMINE see SIB0966.0 N-BENZYL-N-METHOXYMETHYL-N-(TRIMETHYLSILYLMETHYL)AMINE

306

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1.391525

Enabling Your Technology
Name

Mw

bp °C/mm

212.74100° / 0.1(mp °C)

D420

nD20

1.12

1.528

SIM6492.3
O

1-(4-METHOXYPHENYL)-1-CHLOROSILACYCLOBUTANE
C10H13ClOSi

Si

Underoes Pd-catalyzed cross-coupling with activated aromatic iodides.1
1. Denmark, S. et al. Org. Lett. 1999, 1, 1495.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[251453-07-3]
HMIS: 3-2-1-X
2.5g ¥39,500

Cl

SIM6492.4

Cl 3-(p-METHOXYPHENYL)PROPYLMETHYLDICHLOROSILANE

C11H16Cl2OSi

115-6° / 0.3
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[134438-26-9]
HMIS: 3-1-1-X store <5°C
25g ¥25,200

Si
Cl

O

263.24

1.13

SIM6492.5
Cl
Cl

Cl

O

3-(p-METHOXYPHENYL)PROPYLTRICHLOROSILANE
C10H13Cl3OSi

283.66

128-9° / 1
Flashpoint: >110°C (>230°F)

1.226

O
O
F

Si

Forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[163155-57-5]
HMIS: 3-1-1-X
25g ¥24,100

SIM6492.53

p-METHOXYPHENYLTRIETHOXYSILANE
C13H22O4Si

O

Si

1.018251.471

1.09425

1.48685g ¥22,500

Si

p-METHOXYPHENYLTRIMETHOXYSILANE
C10H16O4Si

O

228.3285-90° / 0.15

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[35692-27-4]
HMIS: 3-2-1-X

O

COMPOUNDS

SIM6492.55

OO

91-2° / 0.15

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21130-91-6]
HMIS: 2-2-1-X

OO

270.405g ¥17,200

SIM6492.57

OO

Cl 2-[METHOXYPOLY(ETHYLENOXY)6-9PROPYL]DIMETHYLCHLOROSILANE, tech-90

CH3O(CH2CH2O)6-9(CH2)3(CH3)2ClSi

Si

6-9

431 - 563

1.05

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥27,800

SIM6492.58

O

O
6-9

2-[METHOXYPOLY(ETHYLENOXY)6-9PROPYL]DIMETHYLMETHOXYSILANE, tech-90
CH3O(C2H4O)6-9(CH2)3(CH3)2Si(OCH3)
427 - 559
Flashpoint: >65°C (>150°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X
5g ¥32,600

O

Si

PR

Si

2-[METHOXY(POLYETHYLENEOXY)6-9PROPYL]HEPTAMETHYLTRISILOXANE, tech-90
CH3O(CH2CH2O)6-9(CH2)3(CH3)[OSi(CH3)3]2Si
559 - 691
(0°)
1.007
Viscosity: 22 cSt
Flashpoint: 116°C (241°F)“Super-wetter” Surface tension of 0.1% aqueous solution: 21-22 mN/m
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[27306-78-1]
TSCA
HMIS: 2-1-0-X
100g ¥8,500
2kg ¥53,200

O

6-9

Si

1.4416

COMMERCIAL

O

O

1.44425

SIM6492.6

Si

O

1.01

SILICONO

SIM6492.66

2-[METHOXY(POLYETHYLENEOXY)6-9PROPYL]TRICHLOROSILANE, tech-90
CH3O(C2H4O)6-9(CH2)3Cl3Si
472 - 604

Cl

O

O

Cl

Si

Cl

6-9

1.130

Forms hydrophilic surfaces
Provides protein antifouling surface.1
1. Cecchet, F. et al. Langmuir 2006, 22, 1173.
See also SIM6491.5, SIM6493.2
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[36493-41-1]
TSCA
HMIS: 3-2-1-X
10g ¥23,600

SIM6492.7

O

O

O

O

Si

6-9

O

2-[METHOXY(POLYETHYLENEOXY)6-9PROPYL]TRIMETHOXYSILANE, tech-90
CH3O(C2H4O)6-9(CH2)3Si(OCH3)3
459 - 591
(-8°)
1.076
Viscosity: 29 cSt
Flashpoint: 88°C (190°F)
Treated surface contact angle, water: 36°
Reduces non-specific binding of proteins
Forms charge neutral coatings on CdSe quantum dots which conujugate DNA.1
1. Parak, W. et al. Chem. Mater. 2002, 14, 2113.
See also SIA0078.0, SIB1824.84, SIH6188.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65994-07-2]
TSCA
HMIS: 2-2-1-X
25g ¥27,600
100g ¥69,000

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TEL: 03-5543-1630

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www.gelest.com

1.403

307

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIM6492.72

O
O

O

Si
O

9-12

1.45125

SIM6492.73

OOO

2-[METHOXY(POLYETHYLENEOXY)9-12PROPYL]TRIMETHOXYSILANE, tech-90
CH3(C2H4O)9-12(CH2)3OSi(OCH3)3
591 - 723
1.071
Flashpoint: 88°C (190°F)
See also SIM6492.7, SIM6492.73
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65994-07-2]
TSCA
HMIS: 2-2-1-X
25g ¥23,600
100g ¥69,000O

2-[METHOXY(POLYETHYLENEOXY)21-24PROPYL]TRIMETHOXYSILANE, tech-90
CH3O(CH2CH2O)21-24(CH2)3Si(OCH3)3
1,120 - 1,250

O

Si
O

21-24

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65994-07-2]
HMIS: 2-2-1-X

1.0g ¥25,700

SIM6492.8

SiO

162.30132°(-40°)
Flashpoint: 20°C (68°F)
Vapor pressure, 50°: 30 mm

0.83

1.3965OOF

O(1-METHOXY-2-PROPOXY)TRIMETHYLSILANE
C7H18O2Si
Viscosity: 2 cSt

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[55816-62-1]
HMIS: 3-4-1-X

25g ¥22,000

SIM6493.0

3-METHOXYPROPYLTRIMETHOXYSILANE
C7H18O4Si

O
Si

O

O

O

Cl

O

O

O

Si

3

O

Cl

100g ¥44,800

SIM6493.2

Cl METHOXYTRIETHYLENEOXYPROPYLTRICHLOROSILANE

339.71148° / 0.3

1.034[METHOXYTRI(ETHYLENEOXY)PROPYL]HEXAMETHYLTRISILOXANYLETHYLTRIETHOXYSILANE, tech-95
C24H58O9Si4
603.06OSi

Si25g ¥16,200

0.995

SIM6493.3

SiO

98-9° / 40
Flashpoint: 53°C (127°F)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[228700-87-6]
TSCA-L
HMIS: 3-2-1-X
10g ¥35,800

O

O

Reduces electrostatic forces on substrates used for AFM studies.1
1. McNamee, C. et al. Biophys. J. 2007, 93, 324.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33580-59-5]
HMIS: 3-2-1-X
C10H21Cl3O4Si

Si

3

194.30

Reduces protein adsorption on modified substrates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

O

10g ¥26,300

SIM6493.4

METHOXYTRIETHYLENEOXYPROPYLTRIMETHOXYSILANE
C13H30O7Si

O
O

Si

3

O

O

O

O

Si

3

140° / 0.2

1.163

1.43210.885

1.454510g ¥37,400

SIM6493.7

OO

326.46

Forms polymeric proton-conducting electrolytes.1
1. Ritchie, J. et al. Chem. Mater. 2006, 18,504.
See also SIT7122.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[132388-45-5]
TSCA-L
HMIS: 3-2-1-X
METHOXYTRIETHYLENEOXYUNDECYLTRIMETHOXYSILANE

PR

O

11

O

PEG3C11 Silane

C21H46O7Si

438.68HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

1.0g ¥25,700

METHOXYTRIMETHYLSILANE - see SIT8566.0 TRIMETHYLMETHOXYSILANE

SIM6494.0

1-METHOXY-3-(TRIMETHYLSILOXY)BUTADIENE, 95%
DANISHEFSKY’S DIENE

C8H16O2Si
172.30
Contains trans-4-methoxy-3-buten-2-one
Diels-Alder cyclohexenone building block.1
Asymmetrically adds to aldehydes.2
Cycloadds with high ee values to n-butylglyoxylate.3
Reacts with imines to give optically active 6-substituted piperidenones.4

68-9° / 14
Flashpoint: 45°C (113°F)

OMe3

O

O

Si

Me3SiO+

RCHO

1) catalyst
2) TFA

O
O

R

34-99% yield
58-98% ee

1. Danishefsky, S. Acc. Chem. Res. 1981, 14, 400.
2. Furuno, H. et al. Org. Lett. 2000, 2, 49.
3. Motoyama, Y. et al. Tetrahedron 2001, 57, 853.
4. Mancheño, O. G. et al. J. Am. Chem. Soc. 2004, 126, 456.
F&F: Vol. 6, p 370; Vol. 7, p 233; Vol. 9, p 303; Vol. 10, p 260; vol. 11, p 332; Vol. 12, p 321; Vol. 13, p 178.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[54125-02-9]
HMIS: 2-2-1-X store <5°C
5g ¥42,700

308

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TEL: 03-5543-1630

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(215) 547-1015

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Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.858

1.4150SIM6496.0

1-METHOXY-1-(TRIMETHYLSILOXY)-2-METHYL-1-PROPENE
METHYL(TRIMETHYLSILYL)DIMETHYLKETENE ACETAL

C8H18O2Si

174.31

Review of synthetic utility.
Initiator for group transfer polymerization.2
With SmI2 converts ketones and aldehydes to silyl enol ethers.3
Cross-couples with aryl bromides.4
Undergoes α-arylation to form 2-aryl acetates.5
Reacts with fullerenes to form α-fullerenyl esters.6
Adds to ethyl propiolate in a 2+2 cycloaddition fashion.7
1O

OSiMe3OMe
OSiMe3

ZnCl2 (cat)

EtO2C

CH2Cl2, rt, 15 h

O
O
F

Si

O

+

57° / 15
Flashpoint: 43°C (109°F)

OMe

CO2Et

COMPOUNDS

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 376-380.
2. Webster, O. et al. Science 1983, 222, 39.
3. Hydrio, J. et al. Synthesis 1997, 68, 1.
4. Hama, T. et al. J. Am. Chem. Soc. 2003, 125, 11176.
5. Liu, X.; Hartwig, J. F. J. Am. Chem. Soc. 2004, 126, 5182.
6. Nakamura, E. et al. Org. Lett. 2008, 10, 4923.
7. Quendo, A.; Rousseau, Tetrahedron Lett. 1988, 29, 6443.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[31469-15-5]
TSCA
HMIS: 2-2-1-X
25g ¥28,400
100g ¥84,600

SIM6496.3(1-METHOXYVINYL)TRIMETHYLSILANE, 95%
C6H14OSiSi

102-4°
Flashpoint: 0°C (32°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[79678-01-6]
HMIS: 3-4-0-X
5g ¥32,600O130.260.803

1.41800.79611.40510.917325

1.422425

SIM6497.0(2-METHYLALLYLOXY)TRIMETHYLSILANE, 95%
C7H16OSiSi

144.29HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[25195-85-1]
HMIS: 3-3-1-X

122°
Flashpoint: 12°C (54°F)
25g ¥31,600

SILICON

TRIMETHYL[(2-METHYL-2-PROPEN-1YL)OXY]SILANEO

SIM6498.0

N-METHYLAMINOPROPYLMETHYLDIMETHOXYSILANE
C7H19NO2Si

O

H
N

Si

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[31024-35-8]
EC 250-434-1 HMIS: 3-2-1-X

PRO

177.3293° / 25
Flashpoint: 80°C (176°F)
25g ¥19,600

100g ¥56,000

SIM6500.0

H
N

O

Si

O

25g ¥9,500

0.978252kg ¥121,000

1.419415kg ¥580,000

SIM6500.5

Si

H
N

106° / 30
Flashpoint: 82°C (180°F)

COMMERCIALO

N-METHYLAMINOPROPYLTRIMETHOXYSILANE
C7H19NO3Si
193.32γc of treated surfaces: 31 mN/m
pKb25, H2O: 5.18
Orients liquid crystals
Reacts with urethane prepolymers to form moisture-curable resins
See also SIB1932.2, SIB1932.3, SIM6572.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3069-25-8]
TSCA EC 221-334-5 HMIS: 3-2-1-X

O

O

Si

O

Si

N-METHYLAMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE
C13H37NO3Si4

367.78HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[40965-80-8]
HMIS: 2-2-0-X

165° / 50
25g ¥53,800

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

309

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.813

1.4308SIM6501.4

N-METHYL-AZA-2,2,4-TRIMETHYLSILACYCLOPENTANE
C7H17NSi

143.30137°
Flashpoint: 14°C (57°F)

Employed in vapor phase modification of nanoparticles

H

H3 C
2

Si

N

CH 3

N
Si

N
CH 3
+

CH 2

CH 3

OH

H 3 C CH
CH 3

OH

Substrate

H

CH 3

CH 2

Si CH 3
O

N
H3 C
CH 3

CH 3

CH 2
CH

CH 2
Si
O

CH 3

O
O
F

Substrate

See also SIB1932.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18387-19-4]
TSCA
HMIS: 3-4-1-X

25g ¥16,200

100g ¥44,800

N-METHYL-N-(t-BUTYLDIMETHYLSILYL)TRIFLUOROACETAMIDE see SIB1966.0 N-(t-BUTYLDIMETHYLSILYL)-N-METHYLTRIFLUOROACETAMIDE

SIM6502.0

O-4-METHYLCOUMARINYL-N-[3-(TRIETHOXYSILYL)PROPYL]CARBAMATE
C20H29NO7Si
423.54
Soluble: THF
UV max: 223, 281, 319.5 (vs)Immobilizeable fluorescent compound.1

O
O

Si

O

NH
O

O

O

1. Arkles, B. U.S. Patent 4,918,200, 1990.
See also SIC2266.8, SIM6565.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[129119-78-4]
HMIS: 2-2-1-X

10g ¥35,300

Reference Compound 7

H
Si

O

(88-90°)H

Cl

METHYLCHLOROSILANE
CH5ClSi
80.59
8-9°
ΔHvap: 26.0 kJ/mole
Synthesis: Weyenburg, D., J. Organomet. Chem., 1965, 3, 489.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.
[993-00-0](-135°)

0.935-80

METHYLCYCLOHEXYLDICHLOROSILANE - see SIC2468.0 CYCLOHEXYLMETHYLDICHLOROSILANE

SIM6504.0

H

PR

Si

Cl

115.0341-2°(-93°)
1.1047
Flashpoint: -28°C (-18°F)
TOXICITY: ihl rat, LCLo: 300 ppm/4H
TOXICITY: ipr rat, LD50: 15 mg/kg
Autoignition temperature: 230°C
Vapor pressure, 24°: 400 mm
Critical temperature: 215-8°C
Critical pressure: 37.7 atm

1.4222

COMMERCIALCl

METHYLDICHLOROSILANE
CH4Cl2Si
Viscosity: 0.60 cSt
ΔHcomb: 163 kJ/mole
ΔHvap: 29.3 kJ/mole
Dipole moment: 1.91 debye
Coefficient of thermal expansion: 1.0 x 10-3
Specific heat: 0.8 J/g/°

Undergoes hydrosilylation reactions
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 2-2041[75-54-7]
TSCA EC 200-877-1 HMIS: 4-4-2-X
25g ¥4,300*
2kg ¥78,000*
20kg inquire* in liquid dispensing cylinder zCYL-L-2400** requires zCYL-S-019 cylinder or zDR-S-019 stainless steel pail

METHYLDICHLOROSILYL(CHLOROMETHYLPHENYL)ETHANE see SIC2295.1 ((CHLOROMETHYL)PHENYLETHYL)METHYLDICHLOROSILANE

SIM6506.0

METHYLDIETHOXYSILANE
DEMS

O

Si
O

310

H

C5H14O2Si
ΔHcomb: 3,713 kJ/mole

134.25

F&F: Vol. 12, p 82.
See also SIP6725.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[2031-62-1]
TSCA EC 217-982-3 HMIS: 3-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

98-9°
Flashpoint: 10°C (50°F)
Autoignition temperature: 245˚C

25g ¥11,400(215) 547-1015

0.829

100g ¥37,900

www.gelest.com

1.3275

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

61°
(-136°)
Flashpoint: -17°C (1°F)

0.861

1.360

SIM6508.0

METHYLDIMETHOXYSILANE
C3H10O2Si
106.20Viscosity: 0.5 cSt
Dipole moment: 1.32 debye
See also SIM6506.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052[16881-77-9]
TSCA EC 240-914-9 HMIS: 4-4-1-X

O
Si

H

O

25g ¥23,600

100g ¥69,000

METHYLDIPHENYLSILANE - see SID4555.0 DIPHENYLMETHYLSILANE
METHYLDODECYLDICHLOROSILANE - see SID4628.0 DODECYLMETHYLDICHLOROSILANEO

SIM6509.0

O

Si

O

3,4-METHYLENEDIOXYPHENYLTRIETHOXYSILANE
C13H20O5Si

O

284.38HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[376353-50-3]
HMIS: 2-2-1-X

O

2.5g ¥59,100

METHYLHYDROCYCLOSILOXANES, 95%(CH3HSiO)3-5

Si
3-5

Undergoes hydrosilylation reactions
See also SIT7530.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[68037-53-6]
TSCA
HMIS: 2-3-1-X

134-204°
Flashpoint: 31°C (88°F)

25g ¥7,200

0.99

250g ¥30,500

1.39

3kg ¥154,000

SIM6511.0

p-(METHYLPHENETHYL)METHYLDICHLOROSILANE, 95%

Cl (p-TOLYLETHYL)METHYLDICHLOROSILANE
C10H14Cl2Si
233.21103-5° / 2
Si
α:β ~ 40:60
Flashpoint: 95°C (203°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl[718635-97-3]/[63126-87-4]
TSCA-L
HMIS: 3-1-1-X
50g ¥26,800

1.510025

0.966

1.484

1.11651.51520.754

1.4283

SIM6511.2(p-METHYLPHENETHYL)METHYLDIMETHOXYSILANE, 95%

O

Si

O

(p-TOLYLETHYL)METHYLDIMETHOXYSILANE

C12H20O2Si
224.38
Contains isomers
See also SIE4897.2, SIN6597.1
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[722542-79-2]/[722542-80-5]
TSCA
HMIS: 3-2-1-X

115° / 325g ¥7,700

100g ¥17,200

SIM6512.5

Cl

Si

Cl

(2-METHYL-2-PHENYLETHYL)METHYLDICHLOROSILANE
METHYL(α-METHYLPHENETHYL)DICHLOROSILANE

C10H14Cl2Si

233.21

104-5° / 9

See also SIP6738.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13617-28-2]
TSCA EC 237-102-1 HMIS: 3-1-1-X
25g ¥16,400

SILICON

1.10

COMPOUNDSMETHYLISOPROPYLDICHLOROSILANE - see SII6463.0 ISOPROPYLMETHYLDICHLOROSILANE
METHYLOCTADECYLDICHLOROSILANE - see SIO6625.0 n-OCTADECYLMETHYLDICHLOROSILANE
METHYL(PHENETHYL)DICHLOROSILANE - see SIP6721.5 PHENETHYLMETHYLDICHLOROSILANE

PR

H

180 - 300

COMMERCIALO
O
F

SIM6510.0

METHYLPHENYLDICHLOROSILANE - see SIP6738.0 PHENYLMETHYLDICHLOROSILANE
4-METHYLPHENYLTRICHLOROSILANE - see SIT8040.0 p-TOLYLTRICHLOROSILANE

SIM6513.0(2-METHYL-2-PROPENYL)TRIMETHYLSILANEMETHALLYLTRIMETHYLSILANE

Si

C7H16Si

128.29112-4°
Flashpoint: -6°C (21°F)

Transfers methallyl group
Carbonyls undergo Sakurai catalyzed allylation, yielding methallyl-Me3SiO- compounds.1
1. Hollis, T. et al. Tetrahedron Lett. 1993, 34, 4309.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18292-38-1]
HMIS: 2-4-1-X
25g ¥25,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

100g ¥74,000

www.gelest.com

311

Name

Mw

bp °C/mm(mp °C)

D420

nD20

46.14

-57°

(-157°)

0.628-58

SIM6515.0

METHYLSILANE

1MS
CH6Si
CAUTION: CAN FORM EXPLOSIVE MIXTURES WITH AIR

ΔHcomb: -2,612 kJ/mole
ΔHform: -29 kJ/mole
ΔHvap: 19.3 kJ/mole
Dipole moment: 0.73 debye

Si

H

H

Plasma polymerization yields dry process photoresist.1
Intermediate for poly(methylsilane) precursor to silicon carbide.2
Deposits SiC on Si and Ge at 400 - 500˚C.3
Source for hydrogenated amorphous silicon carbide films.4
1. Dabbagh, G. et al. J. Photopolym. Sci. Tech. 1998, 11, 651.
2. Fhang, Z. et al. J. Am. Ceram. Soc. 1991, 74, 670.
3. Takatsuka, T. et al. Appl. Surf. Sci. 2000, 162, 156.
4. Lee, M. et al. in “Chemical Aspects of Electronic Ceramics Processing” Arkles, B. ed., MRS Proc. 1998, 495, 153.
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[992-94-9]
TSCA EC 213-598-5 HMIS: 3-4-3-X
50g inquire* includes gas dispensing cylinder zCYL-G-2400

O
O
F

H

Flashpoint: <-40°C (<-40°F)
Autoignition temperature: 130°C
Vapor pressure, -80°: 241 mm
Vapor pressure, 21°: 14 atm (210 psia)
Critical temperature: 79.3˚C

SIM6515.1

METHYLSILANE, 99.9+%

H

CH6Si

Si

H

H

-57°

(-157°)

0.628-58

Flashpoint: <-40°C (<-40°F)
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[992-94-9]
TSCA EC 213-598-5 HMIS: 3-4-3-X
25g inquire* includes gas dispensing cylinder zCYL-HPS-0420-35

SIM6518.0

METHYLSILATRANEN

METHYLTRIPTYCHSILOXAZOLIDINE
C7H15NO3Si

Si

O

46.14

CAUTION: CAN FORM EXPLOSIVE MIXTURES WITH AIR

O

O

189.28174° / 31(152°)
Dipole moment: 7.57 debye
TOXICITY: ipr rat, LD50: 5,000 mg/kg
Five-coordinate silicon with physiological activity
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2288-13-3]
TSCA EC 218-928-1 HMIS: 2-2-0-X
5g ¥11,900
25g ¥37,400

SIM6518.5(METHYLTHIO)TRIMETHYLSILANE

S

120.29Stench
1
Reagent for thioacetylation of carbonyl compounds.
1. Evans, D. et al. J. Am. Chem. Soc. 1977, 99, 5009.
See also SIH6116.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3908-55-2]
TSCA EC 223-466-9 HMIS: 3-4-1-X
C4H12SSiSi

O

110-4°
Flashpoint: 21°C (70°F)

0.85

1.45101.175

1.40835g ¥73,500

METHYLTRIACETOXYSILANE, 95%
C7H12O6Si

O

Si
O

O

O

220.25

Most common cross-linker for condensation cure silicone RTVs
For liquid version see blend, SIM6519.2
See also SIE4899.0, SIV9098.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4253-34-3](既) 9-1939
TSCA EC 224-221-9 HMIS: 3-2-1-X

O

87-8° / 3
(40°)
Flashpoint: 85°C (185°F)
Vapor pressure, 94°: 9 mm

50g ¥4,000

2kg ¥62,000

18kg ¥224,000

SIM6519.2

METHYLTRIACETOXYSILANE-ETHYLTRIACETOXYSILANE 80:20 Blend
Liquid crosslinker for silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4253-34-3]
TSCA EC 224-221-9 HMIS: 3-2-1-X

Br

Si

Br

312

1.17

Flashpoint: 85°C (185°F)
100g ¥10,100

1kg ¥53,100

Reference Compound 8
METHYLTRIBROMOSILANE

Br

CH3Br3Si

282.82131-2°(-28°)

2.21325

Synthesis: McCusker, P. J. Am. Chem. Soc. 1953, 75, 1583.
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.

[4095-09-4]

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.515225

COMMERCIALPR

SIM6519.0

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

66.4°
(-78°)
1.275
Flashpoint: -15°C (5°F)
TOXICITY: ihl rat, LDLo: 450 ppm/4H
Autoignition temperature: 395°C
Vapor pressure, 13.5°: 100 mm
Critical temperature: 243˚C
Critical pressure: 39 atm
Coefficient of thermal expansion: 1.3 x 10-3

1.4110SIM6520.0

METHYLTRICHLOROSILANE, 98%

149.48

CH3Cl3Si

Viscosity: 0.46 cSt
ΔHvap: 31.0 kJ/mole
Surface tension: 20.3 mN/m
Ionization potential: 11.36 eVSpecific heat: 0.92 J/g/°

Si

Cl

COMMERCIAL

Fundamental builing-block for silicone resins
Forms silicon carbide by pyrolysis
Review of synthetic utility.1
In a synergistic fashion with boron trifluoride etherate catalyzes the crossed imino aldehyde pinacol coupling.2

Cl

Zn-Cu (2 eq.)

Cl

PMP

BF3•OEt2 (2 eq.)

PMP

MeSiCl3 (4 eq.)

NH

O
O
F

N

Ph

H

+

PhCHO

Ph

MeCN, 0°-rt
97%

Ph

OH

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 389-393.
2. Shimizu, M. et al. Synlett. 2002, 1538.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[75-79-6](既) 2-2041
TSCA EC 200-902-6 HMIS: 3-4-2-X
25g ¥3,400500g ¥8,000
20kg inquire* does not include container. zDR-S-019 or zCYL-S-019 requiredCl

Cl

CH3Cl3Si

149.4866.4°

In combination with H2 forms SiC by CVD.1
1. Josiek, A. et al. Chem. Vap. Dep. 1996, 2, 17.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[75-79-6](既) 2-2041
TSCA EC 200-902-6 HMIS: 3-4-2-X
25g ¥13,000(-78°)

1.275

1.4110500g ¥71,400

METHYL (3-TRICHLOROSILYL)PROPIONATE - see SIC2070.0 2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE

SIM6555.0

METHYLTRIETHOXYSILANE

Si

C7H18O3Si

Viscosity: 0.6 cSt
Dipole moment: 1.72 debyeOO

178.30Low cost hydrophobic surface treatment
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2031-67-6](既) 2-2052
TSCA EC 217-983-9 HMIS: 1-3-1-X

142°
0.8948Flashpoint: 30°C (86°F)
TOXICITY: oral rat, LD50: 12,500 mg/kg
Autoignition temperature: 225˚C (437˚F)
Vapor pressure, 25°: 6 mm
25g ¥3,400

2kg ¥35,000

1.3832

COMMERCIAL

O

15kg ¥146,000

METHYL(TRIFLUOROPROPYL)DICHLOROSILANE see SIT8369.0 (3,3,3-TRIFLUOROPROPYL)METHYLDICHLOROSILANE

SIM6558.0

F

PR

METHYLTRIFLUOROSILANESiSILICONSi

METHYLTRICHLOROSILANE, 99%

COMPOUNDS

SIM6520.1

Cl

100.11-30°(-73°)AIR TRANSPORT FORBIDDEN
Dipole moment: 2.80 debye
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[373-74-0]
TSCA EC 206-770-6 HMIS: 3-2-1-X
50g inquire* includes gas dispensing cylinder zCYL-G-0900
CH3F3SiF

F

SIM6559.0

METHYLTRI-n-HEXYLSILANE

298.63140° / 0.25
Viscosity, -40˚: 150 cSt
Viscosity, 25˚: 6 cSt
Silahydrocarbon with excellent low temperature lubricating characteristics
See also SIM6577.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3429-60-5]
HMIS: 1-2-0-X
100g ¥45,900

0.80925

1.444525

102-3°(-78°)
0.955
Flashpoint: 8°C (46°F)
TOXICITY: oral rat, LD50: 12,500 mg/kg
Autoignition temperature: 255°C

1.3696

C19H42Si

4

Si

4

4

SIM6560.0

METHYLTRIMETHOXYSILANE

O

O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

25g ¥3,400(215) 547-1015

2kg ¥22,000

www.gelest.com

COMMERCIAL

Si

136.22
Viscosity: 0.50 cSt
ΔHcomb: 4,780 kJ/mole
Dipole moment: 1.60 debye
Intermediate for coating resins
See also SIM6560.1, SIM6560.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1185-55-3](既) 2-2052
TSCA EC 214-685-0 HMIS: 3-4-1-X
C4H12O3Si

O

17kg ¥140,000

313

Name

O
Si

Mw

bp °C/mm(mp °C)

D420

nD20

(-78°)

0.955

1.3696

1.143

1.402

SIM6560.1

METHYLTRIMETHOXYSILANE, 99%

O

136.22

C4H12O3SiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 214-685-0 HMIS: 3-4-1-X

102-3°
Flashpoint: 8°C (46°F)
100g ¥15,100[1185-55-3]500g ¥60,000

SIM6560.2

METHYLTRIMETHOXYSILANE, oligomeric hydrolysateO

700 - 1,000
25-30 wgt % methoxy groups
Viscosity: 20-25 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[181186-37-8]
TSCA
HMIS: 2-2-1-X

Si
O

O

n

100g ¥8,300

SIM6565.0

4-METHYL-7-TRIMETHYLSILOXYCOUMARIN

248.35

O

O

Si

O

(54-66°)1.57525OOF

C13H16O3Si

Fluorescent compound
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67909-31-3]
HMIS: 2-1-1-X

10g ¥30,000

SIM6570.0

METHYL-3-(TRIMETHYLSILOXY)CROTONATESiO

METHYL 3-TRIMETHYLSILOXY-2-BUTENOATEC8H16O3Si

O
O

188.2980-90% trans isomer
Equivalent of methylacetoacetate dianion.1
1. Chan, T. et al. J. Chem. Soc., Chem. Commun. 1979, 578.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[62269-44-7]
EC 263-483-9 HMIS: 2-2-1-X

57-9° / 9Flashpoint: 63°C (145°F)

0.939

1.44350.785

1.40900.890

1.41400.96325

1.426710g ¥28,400

SIM6571.0

O

2-METHYL-1-(TRIMETHYLSILOXY)-1-PROPENE

Si

144.29C7H16OSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-4-1-X

82-6° / 100
Flashpoint: 14°C (57°F)
10g ¥25,200[6651-34-9]

SIM6571.5

O

METHYL TRIMETHYLSILYLACETATE

O

146.26C6H14O2Si

Si

Employed in synthesis of α,β-unsaturated esters.
1. Larcheveque, M. et al. J. Chem. Soc., Chem. Commun. 1981, 877.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[2916-76-9]
EC 220-845-0 HMIS: 2-4-0-X
162-4° / 50
Flashpoint: 15°C (59°F)

10g ¥27,300

METHYL(TRIMETHYLSILYL)DIMETHYLKETENE ACETAL see SIM6496.0 1-METHOXY-1-(TRIMETHYLSILOXY)-2-METHYL-1-PROPENE

SIM6572.0

O

N-METHYL-N-TRIMETHYLSILYL-3-AMINOPROPYLTRIMETHOXYSILANE, 95%
C10H27NO3Si2
265.50
Contains N-methylaminopropyltrimethoxysilane
See also SID4068.9
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥40,600

PR

Si

Si

N

O

O

SIM6574.0

O

METHYL N-TRIMETHYLSILYLCARBAMATE

O

N
H

147.25C5H13NO2Si

Si

Blocking agent employed in preparation of cephalosporins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18147-09-6]
HMIS: 3-3-1-X

66-7° / 15
Flashpoint: 32°C (90°F)
25g ¥25,700

SIM6575.0

METHYL 3-TRIMETHYLSILYLPROPYNOATEO

156.26

C7H12O2Si

Si

65-70° / 10

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[42201-71-8]
HMIS: 3-3-1-XO

1.44605g ¥51,700

SIM6576.0

F
F

314

N-METHYL-N-TRIMETHYLSILYLTRIFLUOROACETAMIDE, 96%

O

N
F

Si

MSTFA
C6H12F3NOSi

199.25Silylation reagent with volatile byproducts.1
1. Donike, M. J. Chromatogr. 1969, 42, 103.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[24589-78-4]
TSCA EC 246-331-6 HMIS: 3-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

131-2°
1.074
Flashpoint: 26°C (79°F)
TOXICITY: ipr mouse, LDLo, 1,000 mg/kg

25g ¥22,500(215) 547-1015

100g ¥65,500

www.gelest.com

1.3800Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.813

1.45200.878

1.4085

SIM6577.0

METHYLTRI-n-OCTYLSILANE

382.79210° / 5
Viscosity, -54˚: 1,500 cSt
Flashpoint: >110°C (>230°F)
Viscosity, 25˚: 19 cSt
Sila-hydrocarbon lubricant.1
1. Tamborski, C. et al. Ind. Eng. Chem. 1983, 22, 172.
See also SIM6559.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3510-72-3]
TSCA
HMIS: 1-1-0-X
100g ¥35,300
C25H54Si

6

Si

6

6

SIM6579.0

O

METHYLTRI-n-PROPOXYSILANE

Si

220.38

C10H24O3Si

OO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052
TSCA EC 226-978-0 HMIS: 2-2-1-X

83-4° / 13Flashpoint: 60°C (140°F)
25g ¥22,500

OOF[5581-66-8]

METHYLTRIS(CYCLOHEXYLAMINO)SILANE - see SIT8710.0 TRIS(CYCLOHEXYLAMINO)METHYLSILANE

H

O

Si
O

Si

H

METHYLTRIS(DIMETHYLSILOXY)SILANE

268.61

C7H24O3Si4

Crosslinker for silicone RTVs
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17082-46-1]
EC 241-136-2 HMIS: 2-2-1-X

OSi

SIM6582.0

164°(-155°)
Flashpoint: 63°C (145°F)
Vapor pressure, 60°: 19 mm
25g ¥17,200

0.8612

1.3852100g ¥48,300

SIM6585.0

METHYLTRIS(METHOXYETHOXY)SILANE

O

O

O
Si

O

O

O

268.38

C10H24O6Si

145° / 15

1.045

1.4178110-1° / 2(-22°)
0.982
Flashpoint: 90°C (194°F)
TOXICITY: oral rat, LD50: 2,000-3,000 mg/kg

1.454825

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17980-64-2]
TSCA EC 241-906-8 HMIS: 3-1-0-X

25g ¥14,600

SIM6590.0

METHYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95

O
Si

O

METHYLTRIS(2-BUTANONEOXIME)SILANE
C13H27N3O3Si

NO

301.46

Neutral cross-linker for condensation cure silicones
See also SIV9280.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[22984-54-9](既) 2-2039
TSCA EC 245-366-4 HMIS: 2-2-1-X

N

100g ¥7,700

2kg ¥48,500

COMMERCIAL

N

16kg ¥174,000

SIM6590.2

O

N

METHYLTRIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
C19H39N3O3Si
385.61

O

Si

0.93

1.451360° / 6(-74°)
0.8497
Flashpoint: 64°C (147°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Vapor pressure, 100°: 40 mm

1.3880

Low toxicity neutral cross-linker for moisture cure silicone RTVs
See also SIM6590.0, SIV9081.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[37859-57-7]
HMIS: 2-1-1-X

PR

N

O

N

COMPOUNDSSiSILICONH

100g ¥10,900

SIM6592.0

O

Si

M3T
C10H30O3Si4

Viscosity: 1.57 cSt
Dipole moment: 1.11 debyeSiO

310.69Cosmetic vehicle
See also SIB1735.0, SID2650.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17928-28-8]
TSCA EC 241-867-7 HMIS: 1-2-0-X

Si

100g ¥8,500

1kg ¥40,900

COMMERCIALO

METHYLTRIS(TRIMETHYLSILOXY)SILANE

Si

10kg ¥279,000

METHYLVINYLDICHLOROSILANE - see SIV9084.0 VINYLMETHYLDICHLOROSILANE

SIM6593.0

MOLECULAR SIEVES, 3A, powder
K9Na3[AlO2)12(SiO2)12]∙27H2O

Face of cubic array oftruncated octahedra withalternating Si and Al atoms
at vertices

Nominal pore diameter: 3Å
Typical bulk density, not compacted: 0.48 g/cm3
Equilibrium water absorption, 55% RH: 22%
Adsorbs water and ammonia, excludes ethane
Dries polar liquids such as methanol, ethanol, propylene
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[63231-69-6]
TSCA
HMIS: 1-0-0-X

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TEL: 03-5543-1630

Gelest, Inc.

1kg ¥28,200(215) 547-1015

www.gelest.com

315

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIM6594.0

MOLECULAR SIEVES, 4A, powder
ZEOLITE A
Na12[AlO2)12(SiO2)12]∙27H2O

Nominal pore diameter: 4Å
Typical bulk density, not compacted: 0.37 g/cm3
Equilibrium water absorption, 55% RH: 22%
Adsorbs di-n-butylamine, excludes tri-n-butylamine
Dries liquids such as acetone, DMF, DMSO, pyridine
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[70955-01-0]
TSCA
HMIS: 1-0-0-X

1kg ¥28,200

SIM6594.2

MOLECULAR SIEVES, 4A, beads
Na12[AlO2)12(SiO2)12]∙27H2O

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
TSCA
HMIS: 1-0-0-X[70955-01-0]

1kg ¥28,700

OOF

SIM6594.5

MOLECULAR SIEVES, 5A, powder
Ca4.5Na3[(AlO2)12∙30H2O

Nominal pore diameter: 5Å
Adsorbs butanol, excludes iso compounds
Efficient drying media for gases
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[69912-79-4]
TSCA
HMIS: 1-0-0-X

1kg ¥31,900

SIM6594.7

MOLECULAR SIEVES, 13X, powder
FAUJASITE
Na86[(AlO2)86(SiO2)106]∙XH2O

Nominal pore diameter: 10Å
Equilibrium water absorption, 55% RH: 28%
Removes mercaptans from hydrocarbons
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[12173-28-3]
TSCA
HMIS: 1-0-0-X

1kg ¥25,000

SIM6594.8

MOLYBDENUM DISILICIDE, 99+%152.13
particle size: 5-10 μm
Thermal conductivity: 65 W/m˚C
Employed in plasma spray refractory coatings including spacecraft engines
Reacts slowly with HF and HNO3
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[12136-78-6]
TSCA EC 235-231-8 HMIS: 2-2-0-X
100g ¥25,700
MoSi2(~1,930°)

6.31

MSTFA - see SIM6576.0 N-METHYL-N-TRIMETHYLSILYLTRIFLUOROACETAMIDE

SIM6594.85
MULLITE319.54
3.05
Particle Size: <44 μm
Mohs Hardness: 6.0-7.0
3
Typical bulk density, not compacted: 0.74 g/cm
Orthorhombic dipyramidal
Colorless, remelted or calcined clay
Alumina & silica source, used in refractories, advanced ceramics, metallurgy
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1302-93-8]
TSCA-E
HMIS: 1-0-0-X
500g ¥10,900
10kg ¥58,000

PR

Al6Si2O13

Crystal structure image
courtesy of webmineral.com

1.64

SIM6594.9

MUSCOVITEPOTASSIUM MICA
K2O∙3Al2O3∙6SiO2∙2H2O

Crystal structure image
courtesy of webmineral.com
Cl

Si

Cl

Cl

316

760.62 / 796.65
Particle Size: 50 μm medianMohs Hardness: 2.5-3.0
Typical bulk density, not compacted: 0.25 g/cm3
Monoclinic prismaticDielectric constant: 6.0-6.6
White, monoclinic, fine, platy crystals, transparent
Forms composites or, after exfoliation, nanocomposites
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12001-26-2]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

2.77-2.88

1.55-1.61

4kg ¥36,000

SIN6596.0(1-NAPHTHYLMETHYL)TRICHLOROSILANE
C11H9Cl3Si

275.64150-1° / 7

1.3112

Intermediate for high refractive index resins
See also SID4553.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17998-59-3]
HMIS: 3-2-1-X
10g ¥34,200

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TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.5974

Enabling Your Technology
Name
1-NAPHTHYLTRIETHOXYSILANESi

C16H22O3Si

O

290.43

See also SIP6720.77
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17938-06-6]
HMIS: 2-1-1-X(mp °C)

D420

nD20

121-3° / 0.1
Flashpoint: >110°C (>230°F)

1.047625

1.52735g ¥53,300

SIN6597.0

OO

bp °C/mm

SIN6596.8

O
O

Mw

Si

1-NAPHTHYLTRIMETHOXYSILANE
C13H16O3Si

O

248.35150° / 2

Employed in high refractive index surface modification
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18052-76-1]
HMIS: 3-2-1-X(33-5°)

1.55625g ¥53,300

NEOHEXYLDIMETHYLCHLOROSILANE - see SID4065.0 (3,3-DIMETHYLBUTYL)DIMETHYLCHLOROSILANE

O
O
F

SIN6597.07

H
Si

H
H

H

H

Si
Si

PYROPHORIC
Dipole moment: 0.0 debye

H

Si

Si

H

H

H

H

132-4°

Vapor pressure, 25°: 15 mm
Vapor pressure, 67°: 50 mm

Employed in CVD epitaxy of silicon.1,2,3
Forms silicon nanowires by gold nanoparticle catalyzed deposition.4
1. Sturm, J. et al. ECS Transactions, 2008, 16, 799.
2. Chung, K. et al. Appl. Phys. Lett. 2008, 92, 113506.
3. Singh, K. et al. U.S. Patent 7,645,339, 2010.
4. Kampken, B. et al. Beilstein J. Nanotech. 2012, 3, 535.
See also SII6463.4, SIT8709.6
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[15947-57-6]
HMIS: 3-4-3-X
5g ¥209,000** includes zCYL-HPS-0050 cylinder

SIN6597.1

O

NEOPHYLMETHYLDIMETHOXYSILANE
C13H22O2Si

Si

238.40HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[157223-33-1]
HMIS: 3-2-1-X

O

0.976

1.48432.59

1.53

10g ¥39,300

SIN6597.23
NEPHELINESYENITE-K(Na,K)AlSiO4

Particle Size: <24 μm

146.08

Mohs Hardness: 6.0
Hexagonal pyramidal

White, hexagonal prismatic, rough faces
Source of AL K. Flux for advanced ceramics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[37244-96-5]
TSCA-E
HMIS: 1-0-0-X

Crystal structure image
courtesy of webmineral.com

500g ¥9,600

10kg ¥53,900

PR

SIN6597.2

NIOBIUM DISILICIDE, 99+%

149.08-325 mesh powder
Conductivity: 6.3 mohm-cm
Component in ultrahigh temperature composites for jet engines.1
1. Bewlay, B. et al. MRS Bull. 2003, 28(9), 646.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[12034-80-9]
TSCA EC 234-812-3 HMIS: 1-0-0-X(1,950°)

NbSi2

NbSi2

COMPOUNDS

H

152.52

H12Si5H

SILICON

NEOPENTASILANE

5.7

25g ¥31,600

SIN6597.24

-

O

N+

4-NITRO-4’(N-ETHYL-N-TRIMETHOXYSILYLCARBAMATO)AMINOAZOBENZENE, tech-95

N

O

N

DISPERSE RED SILANE
C23H33N5O7Si

N

O

O

O

Si

O

NH

O

519.62(78-85°)
UV max: 474 nm
Soluble: THF, DMF
Chromophoric silane- forms hybrid organic-inorganic materials w/ second-order nonlinear optics.1
1. Cui, Y. et al. Dyes & Pigments, 2004, 62, 43.
See also SIN6597.25
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[675129-70-1]
HMIS: 3-1-1-X
1.0g ¥42,700

SIN6597.25

NITROVERATRYLOXYCARBONYLAMIDOPROPYLTRIETHOXYSILANE, 10% in tetrahydrofuran

O

O
O

Si
O

N
H

O

O
O2N

O

N-TRIETHOXYSILYLPROPYL-O-4,5-DIMETHOXY-2-NITROBENZYLCARBAMATE
C19H32N2O9Si
460.56

UV max: 365 nm
Photosensitive silane for lithography.1
1. del Campo, A. et al. Angew. Chem. 2005, 44, 4707
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[188541-09-5]
HMIS: 3-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

Flashpoint: -14°C (7°F)

1.0g ¥77,700(215) 547-1015

www.gelest.com

317

Name
NONAFLUOROHEXYLDIMETHYLCHLOROSILANE

F
F

F

F F

F

Si
F

F

F

Cl
F

F F

F

Si
F

F

Cl NONAFLUOROHEXYLMETHYLDICHLOROSILANE
C7H7Cl2F9Si

1.214

F

Cl

361.11

112-3° / 120

1.454

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[38436-16-7](既) 2-2047
TSCA-L EC 253-930-6 HMIS: 3-3-1-X
10g ¥15,400

SIN6597.6

NONAFLUOROHEXYLTRICHLOROSILANE

Cl

F
F

349.31

SIN6597.5

FF

1.342286-8° / 35
Flashpoint: 42°C (108°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-3-1-X
10g ¥26,800

C10H16F9NSi

N

F

F F

nD20

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[119386-82-2]
HMIS: 3-3-1-X
10g ¥15,400
NONAFLUOROHEXYLDIMETHYL(DIMETHYLAMINO)SILANE

F

F

162-4°

D420

SIN6597.4

F
Si

F

Cl

F

F
F

C8H10ClF9Si

Si
F

340.69(mp °C)O
O
F

F

bp °C/mm

SIN6597.3

F

F F

F

Mw

381.53C6H4Cl3F9Si

Cl

70-2° / 15

1.542

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[78560-47-1]
TSCA-L
HMIS: 3-2-1-X
10g ¥10,600

50g ¥32,100

SIN6597.65

F

F F

F

Si
F

F

NONAFLUOROHEXYLTRIETHOXYSILANE

O

F

O

410.35
Critical surface tension, treated surface: 23 mN/mOleophobic, hydrophobic surface treatment
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[102390-98-7]
TSCA-L
HMIS: 2-2-1-X
C12H19F9O3Si

O

96° / 151.201

25g ¥25,200

100g ¥63,500

1.3502

2.5kg ¥348,000

SIN6597.7

F

F

F F

O

F
F

Si
F

F

F

F

F

N
Si

F

F

68-9° / 15
Flashpoint: 71°C (160°F)

10g ¥14,400

1.335

1.337650g ¥37,400

SIN6597.8

FF

368.27
Viscosity: 2 cSt
Improves hydrolytic stability of dental composites.1
1. Nikei, S. et al. J. Dent. Res. 2002, 81(7), 482.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[85877-79-8]
TSCA-L
HMIS: 3-2-1-X
C9H13F9O3Si

O

O

F F

NONAFLUOROHEXYLTRIMETHOXYSILANEFNNONAFLUOROHEXYLTRIS(DIMETHYLAMINO)SILANE
C12H22F9N3Si

N

407.4082-4° / 5Flashpoint: 42°C (108°F)

1.200

Forms low surface energy films by vapor phase deposition
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[186599-46-2]
TSCA-L
HMIS: 3-3-1-X
10g ¥45,900

SIN6597.9

NONAMETHYLTRISILAZANENITRILOTRIS(TRIMETHYLSILANE)
C9H27NSi3

233.5876° / 12(70°)
pKa: 4.70
Flashpoint: 67°C (153°F)
Reagent for the preparation of TMS nitrido-metal complexes from metal halides.1
Used in the trifluoromethylation of ketones with HCF3.2
1. Rhiel, M. et al. Angew. Chem. 1994, 106, 599.
2. Lange, S. et al. J. Org. Chem. 2000, 65, 8848.
See also SIT8715.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1586-73-8]
TSCA EC 216-445-0 HMIS: 2-2-1-X
50g ¥26,800

PR

Si

N

Si

Si

O

8

Si

Cl

0.863

1.455

0.963

1.4925

SIN6598.0

p-NONYLPHENOXYPROPYLDIMETHYLCHLOROSILANE, tech-95
C20H35ClOSi
355.04181° / 0.75

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-1-1-X
10g ¥34,200

SIO6600.0

OCTA(AMINOPHENYL)-T8-SILSESQUIOXANE

1153.64
Mixture of 1 and 2 regio isomers, exo and endo
Component in low density organic aerogels for aerospace applications
Building block for polyimide nanocomposites.1
1. Tamaki, R. et al. Chem. Mater. 2003, 15, 793.
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[518359-82-5]
HMIS: 2-1-0-X
C48H48N8O12Si8318

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

5g ¥55,400(215) 547-1015

www.gelest.com

COMMERCIALF
F

Enabling Your Technology
Name

Si

213-5°(-67°)
Flashpoint: 78°C (172°F)
Autoignition temperature: 320°C
Vapor pressure, 90°: 10 mm
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13596-23-1]
EC 237-041-0 HMIS: 3-2-1-X
10g ¥77,700

1.61

1.513

Cl Cl

Si

Si

1.36

1.4585Cl Cl

Cl399.88

Cl8O2Si3

184°(-47°)
Vapor pressure, 0°: 1.5 mm

Forms self-assembled monolayers with orientation normal to substrate
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[31323-44-1]
TSCA EC 250-570-1 HMIS: 3-0-2-X
10g ¥51,200

SIO6606.0

OO

NH+ Cl-Contains homologs
ΔHvap: 51 kJ/mole

OCTACHLOROTRISILOXANE, 95%

OCTADECYLBIS(TRIETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 50% in ethanol
C36H80ClNO6Si2
714.66
Contains 4-6% bis(triethoxysilylpropyl)amine
Flashpoint: 15°C (59°F)
Dipodal quat, immobilizable phase transfer catalyst
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X
25g ¥22,500

Si O
O

Si O
O

0.894

1.42425

SIO6607.0

407.15
Contains ethoxydichlorosilane analog
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33734-79-1]
HMIS: 3-2-1-X
C22H47ClO2Si

164° / 2

0.90

COMPOUNDSOCTADECYLDIETHOXYCHLOROSILANE, tech-95

O
Cl
Si
16
O

25g ¥25,200

SIO6608.0

n-OCTADECYLDIISOBUTYLCHLOROSILANE, 95%
C26H55ClSi

Cl

Si
16

431.27

Forms hydrolytically stable monolayers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[162578-86-1]
HMIS: 3-2-1-X

196-8° / 0.2

0.856

1.459

0.828

1.459

25g ¥55,400

SIO6610.0

n-OCTADECYLDIISOBUTYL(DIMETHYLAMINO)SILANE, 95%

N

Si
16

439.89214-220° / 0.4
Contains non-functional silahydrocarbons
Flashpoint: >110°C (>230°F)
1Provides highly stable C18 stationary phases for LC.
1. Kirkland, J. et al. LC-GC Int’l. 1993, 6, 436.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[151613-23-9]
HMIS: 2-1-0-X
5g ¥26,300
C28H61NSi

SILICON16

367.88Cl8Si3

SIO6605.0

Cl

O

OCTACHLOROTRISILANE, 96%

O
O
F

O

Si

nD20

SIO6611.0

PR

Cl

Cl

Cl
Cl

D420

Cl

Si

bp °C/mm

SIO6601.0

Si

Cl
Cl

(mp °C)

Cl

Cl

Mw

n-OCTADECYLDIISOBUTYLSILANESi

C26H56Si

H

396.62

Sterically hindered, oleophilic reducing agent
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-2-1-X

16

170-9° / 0.4
Flashpoint: >110°C (>230°F)

0.78325

1.0g ¥26,000

SIO6615.0

16

Si

16

Cl

n-OCTADECYLDIMETHYLCHLOROSILANEDIMETHYL-n-OCTADECYLCHLOROSILANE
C20H43ClSi

347.10159° / 0.1(28-30°)0.85629
Contains 5-10% C18 isomers
Flashpoint: 201°C (394°F)
Employed in bonded HPLC reverse phases.1
1. Wise, S. et al. In Silanes Surfaces & Interfaces; Leyden, D., Ed.; Gordon & Breach: 1986; p349.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18643-08-8](既) 2-2041
TSCA EC 242-472-2 HMIS: 3-1-1-X
25g ¥9,100
2kg ¥118,000

1.449829

COMMERCIALSi

Cl

SIO6615.1

n-OCTADECYLDIMETHYLCHLOROSILANE, 97%
DIMETHYL-n-OCTADECYLCHLOROSILANE
C20H43ClSi

347.10159° / 0.1(28-30°)0.85629
Contains <5% C18 isomers
Flashpoint: 201°C (394°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18643-08-8](既) 2-2041
TSCA EC 242-472-2 HMIS: 3-1-1-X
25g ¥13,700
100g ¥36,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.499829

319

Name

Si
16

bp °C/mm(mp °C)

D420

nD20

SIO6615.2

n-OCTADECYLDIMETHYLCHLOROSILANE, 70% in toluene

347.10159° / 0.1
Contains 5-10% C18 isomers
Flashpoint: 24°C (75°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18643-08-8](既) 2-2041
TSCA EC 242-472-2 HMIS: 3-4-1-X
25g ¥9,800

COMMERCIAL

Cl

Mw

0.854

C20H43ClSi

750g ¥53,000

SIO6617.0

n-OCTADECYLDIMETHYL(DIMETHYLAMINO)SILANE

355.72
Contains 5-10% C18 isomers
Forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76328-77-3]
TSCA
HMIS: 3-3-1-X

Si

160° / 0.1

C22H49NSi

N

16

10g ¥16,400

0.81751.451250g ¥55,400

SIO6618.0

n-OCTADECYLDIMETHYLMETHOXYSILANE

16

H

Si

184-6° / 0.2

1.444

25g ¥17,200

0.789

1.448

100g ¥48,300

SIO6619.0

n-OCTADECYLDIMETHYLSILANE

312.66

C20H44Si

150-5° / 0.4

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[32395-58-7]
HMIS: 2-2-1-X

16

0.8325OO
F

Si

342.68
Contains 5-10% C18 isomers
1
Employed in SAM resist.
1. Oh, T. et al. Mol. Cryst. Liq. Cryst. Sci. Technol., Sect. A 1999, 337, 7.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[71808-65-6]
TSCA EC 276-039-4 HMIS: 2-1-0-X
C21H46OSiO

5g ¥15,100

25g ¥50,700

SIO6619.5

OCTADECYLDIMETHYL(3-TRIHYDROXYSILYLPROPYL)AMMONIUM CHLORIDE, 5% in water
C23H52ClNO3Si
454.2
Si
pH: 6.1-6.3
OH
Anti-static compoundHO
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions
HMIS: 1-0-0-X
100g ¥9,800
OH

N

+

Cl

-

16

0.988

2kg ¥41,000

SIO6620.0

Si
O

O

PR

16

SIO6622.0

Si

3-OCTADECYLHEPTAMETHYLTRISILOXANE, 95%
STEARYL TRIMETHICONEC25H58O2Si3

O

474.99Viscosity: 13 cSt
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[167160-55-6]
HMIS: 1-1-0-X

Si

O

16

Si

1.4334

0.9425

1.452

0.862

1.4533100g ¥26,300

SIO6624.0

Cl

O

Si

16

0.825

Cl

n-OCTADECYLMETHOXYDICHLOROSILANE, tech-95

383.51
144-7° / 1.5
Contains 5-10% C18 isomers
Maintains reactivity of octadecyltrichlorosilane, but with reduced HCl byproduct
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[211934-50-8]
HMIS: 3-1-1-X
25g ¥13,800
C19H40Cl2OSi

100g ¥37,100

SIO6624.4

H OCTADECYLMETHYLCHLOROSILANE

Si

16

320

C19H41ClSi

Cl

333.07

175-7° / 0.5(18-19°)HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[124694-97-9]
TSCA-L
HMIS: 3-1-1-X
10g ¥22,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALO
N+ Cl-OCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 60% in methanol
C26H58ClNO3Si
496.290.89
Contains 3-5% Cl(CH2)3Si(OMe)3
Flashpoint: 15°C (59°F)
Autoignition temperature: 230°C
Employed as a glass lubricant
Orients liquid crystals
Provides an antistatic surface coating
Dispersion/coupling agent for high density magnetic recording media.1
Application as immobilizable antimicrobial reported.2
1. Vincent, H. In Chemically Modified Oxide Surfaces; D. Leyden, D., Ed.; Gordon & Breach: 1990; p.305.
2. White, W. et al. In Silanes, Surfaces & Interfaces; Leyden, D., Ed.; Gordon & Breach: 1986; p.107.
See also SID3392.0, SIO6606.0, SID6619.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[27668-52-6](既) 2-2095
TSCA EC 248-595-8 HMIS: 3-4-0-X
25g ¥10,800
2kg ¥73,000
16kg ¥272,000Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIO6625.0

Cln-OCTADECYLMETHYLDICHLOROSILANE

185° / 2.5(24-6°)
0.930
Flashpoint: 185°C (365°F)
TOXICITY: oral rat, LD50: 200-2,000 mg/kg
Autoignition temperature: 230°C
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5157-75-5](既) 2-2041
TSCA EC 225-931-1 HMIS: 3-1-1-X
25g ¥11,100500g ¥74,000
C19H40Cl2Si

Si
16

Contains 5-10% C18 isomers
Viscosity: 7 cStCl
Cl367.52

SIO6625.1

n-OCTADECYLMETHYLDICHLOROSILANE

Si
16367.52185° / 2.5
Contains <5% C18 isomers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5157-75-5]
TSCA EC 225-931-1 HMIS: 3-1-1-X
25g ¥19,400
C19H40Cl2Si

Cl(24-6°)

0.930

SIO6627.0

n-OCTADECYLMETHYLDIETHOXYSILANE

O

386.73
Contains 5-10% C18 isomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67859-75-0]
TSCA EC 267-423-2 HMIS: 2-1-0-XSi
16

197° / 2Flashpoint: >110°C (>230°F)

0.852

1.44070.85

1.4427OO
F

C23H50O2SiO

25g ¥13,500

C21H46O2Si

Contains 5-10% C18 isomers

Si
16

O

358.68HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 274-936-5 HMIS: 3-1-0-X[70851-50-2]

190° / 3(12-18°)Flashpoint: >110°C (>230°F)
Autoignition temperature: 225°C
25g ¥17,200

100g ¥48,300

SIO6635.0

n-OCTADECYLSILANE

284.60
Contains 4-6% C18 isomers
1
Forms self-assembled monolayers on titanium.
Reacts onto a gold surface to form monolayers of long alkyl chains.2
Forms SAMs on titanium, gold and silicon surfaces.3
1. Fadea, A. et al. J. Am. Chem. Soc. 1989, 121, 12184.
2. Owens, T. M. et al. J. Am. Chem. Soc. 2002, 124, 6800.
3. Arkles, B. et al. J. Adhes. Sci. Technol. 2012, 26, 41.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18623-11-5]
TSCA EC 242-453-9 HMIS: 2-1-1-X
C18H40Si

H

H

Si
16

H

195° / 15(29°)
Flashpoint: >110°C (>230°F)

25g ¥15,600

0.794100g ¥43,200

SIO6640.0

n-OCTADECYLTRICHLOROSILANE, 95%
OTS
C18H37Cl3Si

Cl

PR

Si

16

Cl

COMMERCIAL

Cl

387.93160-2° / 3(22°)
0.950221.4602
Contains 5-10% C18 isomers
Flashpoint: 189°C (372°F)
Provides lipophilic surface coatings
Employed in patterning and printing of electroactive molecular films.1,2
Immobilizes physiologically active cell organelles.3
Treated substrates increase electron transport of pentacene films.4
1. Huan, Z. et al. Synth. Met. 1997, 85, 1375.
2. Jeon, J. et al. Langmuir 1997, 13, 3382.
3. Arkles, B. et al. J. Biol. Chem. 1976, 250, 8856.
4. Skankar, K. et al. J. Mater. Res. 2004, 19, 2003.
See also SIO6624.0 for reduced chloride version; SIB1813.7 for dipodal version; SID4472.0 for embedded hydrophilicity version
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[112-04-9](既) 2-2041
TSCA EC 203-930-7 HMIS: 3-1-1-X
25g ¥3,900
750g ¥48,000
15kg ¥298,000

SILICONn-OCTADECYLMETHYLDIMETHOXYSILANECOMPOUNDS

SIO6629.0

O

SIO6640.1

Cl

Cl

Si

16

Cl

n-OCTADECYLTRICHLOROSILANE

387.93160-2° / 3Contains <5% C18 isomers
Highest concentration of terminal silane substitution
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[112-04-9](既) 2-2041
TSCA EC 203-930-7 HMIS: 3-1-1-X
25g ¥6,400
C18H37Cl3Si(22°)

0.950221.46020.87

1.4386100g ¥15,100

SIO6642.0

n-OCTADECYLTRIETHOXYSILANE, 95%

O

O

Si

16

O

416.76
Contains 5-10% C18 isomers
Forms hydrophobic, oleophilic coatings
See also SIB1974.2, SIH5922.0, SIS6952.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7399-00-0]
EC 230-995-9 HMIS: 2-1-0-X
C24H52O3Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

165-9° / 2(10-12°)
Flashpoint: >150°C (>302°F)

25g ¥11,400(215) 547-1015

100g ¥28,900

www.gelest.com

321

Name

Mw

bp °C/mm(mp °C)

D420

nD20

170° / 0.1(13-17°)0.885
Flashpoint: 140°C (284°F)
TOXICITY: oral rat, LD50: >5,000 mg/kg

1.439

SIO6645.0

n-OCTADECYLTRIMETHOXYSILANE, 95%

374.68

C21H46O3Si

O

O

Si
O

N
16

n-OCTADECYLTRIS(DIMETHYLAMINO)SILANE

N

Si

25g ¥6,800

2kg ¥136,000

15kg ¥400,000

SIO6648.0

413.82

C24H55N3Si

220-230° / 0.1

0.857

Forms SAMs by MOCVDHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
5g ¥26,300

N

O
O
F

16

Forms hydrophobic, oleophilic coatings
Forms clear, ordered films with tetramethoxysilane.1
Undergoes oscillatory adsorption to form SAMs.2
1. Shimjima, A. et al. J. Am. Chem. Soc. 1998, 120, 4528.
2. Thomsen, L. et al. Surf. & Interface Analysis 2005, 37, 472.
See also SIS6952.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3069-42-9]
TSCA EC 221-339-2 HMIS: 2-1-1-X

COMMERCIAL

Contains 5-10% C18 isomers

SIO6660.0

O

O

O

O

Si

Si

Si

O

O

O

OCTAETHOXY-1,3,5-TRISILAPENTANE

O

472.80

C18H44O8Si3

125° / 4

Forms periodic mesoporous particles by sol-gel.1
1. Mohanty, P. et al. Nanoscale Res. Lett. 2009, 4, 169.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1263429-91-9]
HMIS: 3-2-1-X

0.9886

1.418410g ¥20,400

SIO6696.5

OCTAKIS(DIMETHYLSILOXY)-T8-SILSESQUIOXANEOCTAKIS(DIMETHYLSILOXY)OCTAPRISMOSILSESQUIOXANE
C16H56O20Si16
1017.98(>300° dec.)

Soluble: hexane, methylene chloride
Forms derivatives suitable for composite dental materials.1
1. Sellinger, A. et al. Chem. Mater. 1996, 8, 1592.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[125756-69-6]
HMIS: 2-1-1-X

2.5g ¥13,800

10g ¥36,900

SIO6696.9

OCTAKIS(TETRAMETHYLAMMONIUM)-T8-SILSESQUIOXANE, hydrate
C32H96N8O20Si8.XH2O1137.85(135-143°)

HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[69667-29-4]
HMIS: 3-1-0-X

10g ¥16,200

50g ¥54,400

SIO6698.0

1,1,3,3,5,5,7,7-OCTAMETHYLCYCLOTETRASILAZANE

SiHN

OCTAMETHYLSILANETETRAMINE
C8H28N4Si4

NHSi

292.68ΔHform: 787 kJ/moleForms α-Si3N4 by ammonia thermal synthesis.1
1. Schaible, S. et al. Applied Organomet. Chem. 1993, 7, 53.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1020-84-4]
TSCA EC 213-817-4 HMIS: 2-2-1-X

Si

HN

NH

PR

Si

H

H

Si

N

1,2,3,4,5,6,7,8-OCTAMETHYLCYCLOTETRASILAZANE, 95%N

C8H28N4Si4Si

Si

0.950221.458250.97

1.480025

175-6°(17.4°)
0.956
Flashpoint: 51°C (124°F)
Autoignition temperature: 400˚C
Vapor pressure, 23°: 1 mm
Critical temperature: 314°C
Critical pressure: 1.03 mPa
Specific heat: 502 J/g/˚
Coefficient of thermal expansion: 0.8 x 10-3
Cryoscopic constant: 11.2
Henry’s law constant, Hc: 3.4 ± 1.7
Ea, polym: 79 kJ/mole

1.396825g ¥13,000

100g ¥34,500

SIO6699.0

Si

N

225°
(97°)
Flashpoint: 66°C (151°F)

N

H

292.68104-5° / 3.5

See also SIH6103.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2587-47-5]
HMIS: 2-2-1-X

10g ¥15,900

50g ¥53,300

H

SIO6700.0

OCTAMETHYLCYCLOTETRASILOXANE, 98%
D4
C8H24O4Si4

Si

O

Si

Si

O

Si

O

296.61

Solubility, water: 50 μg/l
Basic building block for silicones by ring-opening polymerization
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[556-67-2](既) 7-475
TSCA EC 209-136-7 HMIS: 1-2-0-X

322

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

100g ¥4,500(215) 547-1015

2kg ¥24,000

www.gelest.com

15kg ¥137,000

COMMERCIALO

Viscosity: 2.3 cSt
ΔHfus: 18.4 kJ/mole
ΔHvap: 45.6 kJ/mole
Dipole moment: 1.09 debye
Dielectric constant: 2.39
Ring strain: 1.00 kJ/mole
Surface tension, 20˚: 17.9 mN/m
Octanol/water partition coefficient, log Kow: 5.1

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

3H,5H-OCTAMETHYLTETRASILOXANE - see SIB1838.0 1,3-BIS(TRIMETHYLSILOXY)-1,3-DIMETHYLDISILOXANE

SIO6702.0

1,1,3,3,5,5,7,7-OCTAMETHYLTETRASILOXANE, 80% in octamethylcyclotetrasiloxane
Si

Si

O

Si

O

Si

H

(1,7 H)-OCTAMETHYLTETRASILOXANE, M’DDM’
C8H26O3Si4

282.63

169-70°See also SIH6117.0, DMS-HO3 in polymer section
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1000-05-1]
TSCA EC 213-669-0 HMIS: 2-2-1-X

0.863

1.387525g ¥19,400

SIO6703.0

OCTAMETHYLTRISILOXANE
MDM
C8H24O2Si3

O

Si

O
O
F

Si

COMMERCIAL

O

Si

236.53
152-3°(-86°)
0.820
1.3848Viscosity, -70˚: 20 cSt
Flashpoint: 39°C (102°F)
Viscosity, 20˚: 1.0 cSt
Autoignition temperature: 418°C
ΔHcomb: -7,786 kJ/mole
Vapor pressure, 25°: 3.9 mm
ΔHvap: 169.1 kJ/mole
Critical temperature: 290°C
Dipole moment: 0.80 debye
Coefficient of thermal expansion: 1.3 x 10-3
Dielectric constant: 2.30
Thermal conductivity, 27°: 0.1107 W/m°C
Solubility parameter: 7.0
Heat capacity, 27°: 1.546 kJ/kg°C
Solubility, water: 34 ppb
Surface tension: 17.4 mN/mHigh purity, non-polar solvent
See also SIE4895.0, SID2655.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[107-51-7] (既) 7-476
TSCA EC 203-497-4 HMIS: 1-3-0-X
25g ¥6,600
500g ¥38,500
2.5kg ¥93,000

C17H36O4SSiO

5

364.62

O

Si

S

O

O

Masked mercaptan - deblocked with alcohols
Latent coupling agent for butadiene rubber
See also SID3545.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[220727-26-4]
TSCA
HMIS: 2-1-1-X

0.9686
Flashpoint: 176°C (349°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg

25g ¥10,300

1.4515100g ¥25,700

SIO6705.0

OCTAPHENYLCYCLOTETRASILOXANE, 95%

Si
O

O

Si

Si

O

793.18
ΔHcomb: 26,909 kJ/mole
ΔHform: -13,307 kJ/mole
Employed in preparation of diphenylsiloxane copolymers
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[546-56-5] (既) 7-473
TSCA EC 208-904-9 HMIS: 1-1-0-X
C48H40O4Si4O
Si

332° / 1(197-9°)25g ¥8,800

1.185

1.62

1.185

1.62

0.80

1.4455500g ¥65,000

SIO6705.1

OCTAPHENYLCYCLOTETRASILOXANE, 98%

Si
O

O

Si

C48H40O4Si4

O

Si

O

Si

793.18332° / 1

Phenylsiloxanes can be employed as anti-stiction coatings for MEMS.1
1. Martin, J. In Nanotribology; S. Hsu, Kluwer Academic, 2001.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[546-56-5](既) 7-473
TSCA EC 208-904-9 HMIS: 1-1-0-X(197-9°)SILICON

S-(OCTANOYL)MERCAPTOPROPYLTRIETHOXYSILANECOMPOUNDS

SIO6704.0

PR

H

O

500g ¥94,700

SIO6705.5

OCTAPHENYL-T8-SILSESQUIOXANE
C48H40O12Si81033.52(350°)HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[5256-79-1]
TSCA
HMIS: 2-1-0-X

10g ¥22,500

SIO6706.0

OCTAVINYL-T8-SILSESQUIOXANE

633.04
UV absorption, max: 264 nm; emission 287 nm
Soluble: THF, chloroform, hexane
Undergoes hydrosilylation reactions with monomers and polymers.1,2
1. Weidner, R. et al. U.S. Patent 5,047,492, 1997.
2. Kobayashi, T. et al. Chem. Lett. 1998, 763.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[69655-76-1]
HMIS: 1-1-0-X(273° dec.)

C16H24O12Si85g ¥50,100

SIO6707.0
5Si

7-OCTENYLDIMETHYLCHLOROSILANE, tech-95

204.8198° / 11
Contains 10-15% internal olefin isomers
Flashpoint: 95°C (203°F)
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17196-12-2]
TSCA EC 241-236-6 HMIS: 3-1-1-X
25g ¥18,300
C10H21ClSi

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

323

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIO6707.5

7-OCTENYLDIMETHYLSILANE, tech-95

170.36
Contains 10-15% internal olefin isomers
H Polymerizes w/ Pt catalyst
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[52770-61-3]
HMIS: 2-2-1-X
C10H22Si

Si

5

Cl
5

55-7° / 60.760

5g ¥27,800

SIO6708.0

7-OCTENYLTRICHLOROSILANE, tech-95

245.65223-4°
Contains 10-15% internal olefin isomers
Flashpoint: 94°C (201°F)
Immobilizes DNA at terminus.1
Cl 1. Bensimon, A. et al. Science 1994, 265, 2096.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[52217-52-4]
TSCA EC 257-747-2 HMIS: 3-2-1-X
10g ¥13,300

Si
Cl

1.07

C8H15Cl3Si

1.457850g ¥42,700

SIO6709.0

OO
F

7-OCTENYLTRIMETHOXYSILANE, tech-95

232.3948-9° / 0.1
Contains 10-15% internal olefin isomers
Flashpoint: 95°C (203°F)
Coupling agent for “in situ” polymerization of acrylamide for capillary electrophoresis.1
Employed in stretched DNA fibers for FISH (Fluorescent In Situ Hybridization) mapping.2
Surface treatment for FISH and replication mapping on DNA fibers.3
1. Cifuentes, A. et al. J. Chromatogr., A 1999, 830(2), 423.
2. Labit, H. et al. BioTechniques 2008, 45, 649.
3. Labit, H. et al. Biotechniques Protocol Guide 2010 (48) doi 10.2144/000113255.
See also SIA0489.0, SIU9049.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[52217-57-9]
TSCA
HMIS: 3-1-1-X
5g ¥13,800

0.941.43050.875

1.45500.833

1.4560222-5°
0.873
Flashpoint: 97°C (207°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18162-84-0](既) 2-2041
TSCA EC 242-044-5 HMIS: 3-1-1-X
25g ¥13,500
100g ¥29,400

1.432825

C11H24O3Si

O
5

Si

O

O

25g ¥44,800

SIO6710.5

n-OCTYLDIISOPROPYLCHLOROSILANE

262.9495-9° / 0.5
Flashpoint: >110°C (>230°F)
Reagent for preparation of HPLC stationary phases with high stability and efficiency.1
1. Kirkland, J. et al. J. Chromatogr. Sci. 1994, 32, 473.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[117559-37-2]
HMIS: 3-1-1-X
10g ¥26,300
C14H31ClSi

Si

6

Cl

SIO6710.7

n-OCTYLDIISOPROPYL(DIMETHYLAMINO)SILANE
C16H37NSiSi

6271.57

Reagent for HPLC bonded phases without acidic byproducts
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[151613-25-1]
TSCA
HMIS: 3-2-1-X

N

105° / 0.7

25g ¥76,100

SIO6711.0

n-OCTYLDIMETHYLCHLOROSILANE

Si

C10H23ClSi

Cl

PR

6

206.83

SIO6711.3

Si

6n-OCTYLDIMETHYL(DIMETHYLAMINO)SILANE
C12H29NSi

N

215.45HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X[110348-62-4]

94-6° / 10
Flashpoint: 69°C (156°F)

0.80251.43470.813

1.42300.753

1.426225g ¥26,300

SIO6711.1

n-OCTYLDIMETHYLMETHOXYSILANE
C11H26OSi

Si

6

O

202.42

See also SIO6711.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[93804-29-6]
EC 298-404-7 HMIS: 3-2-1-X

221-223°
Flashpoint: 82°C (180°F)
25g ¥25,700

SIO6711.4

6

324

Si

n-OCTYLDIMETHYLSILANE

H

C10H24Si

172.39HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[40934-68-7]
HMIS: 2-3-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

50° / 210g ¥20,400(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

D420

nD20

334.7284° / 0.3(-62°)
0.819
1.4128Viscosity: 3 cSt
Flashpoint: 69°C (156°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17955-88-3]
TSCA-L EC 241-881-3 HMIS: 2-2-0-X
25g ¥9,000
100g ¥21,500
2kg ¥136,000

O
Si

Cl
Si

SIO6712.0

n-OCTYLMETHYLDICHLOROSILANE

227.2594° / 6
0.9761
Flashpoint: 98°C (208°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[14799-93-0](既) 2-2041
TSCA EC 238-863-2 HMIS: 3-2-1-X
25g ¥10,300500g ¥49,600
C9H20Cl2SiClCOMMERCIALCAPRYLYL METHICONEC15H38O2Si3

Si1.4440

SIO6712.2

OO
F

n-OCTYLMETHYLDIETHOXYSILANE

O

246.47

C13H30O2Si

Si

6(mp °C)

3-OCTYLHEPTAMETHYLTRISILOXANE
O

6

bp °C/mm

SIO6711.5

Si

6

Mw

80-2° / 2Flashpoint: >110°C (>230°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-0-X

O

25g ¥10,100[2652-38-2]

0.84781.4190100g ¥24,900

SIO6712.4

O

218.42

C11H26O2Si

87-9° / 5Flashpoint: 94°C (201°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 288-374-3 HMIS: 3-2-1-X

25g ¥11,400[85712-15-8]

0.858

1.4190

0.746

1.425

100g ¥29,400

COMPOUNDS

Si

6

SIO6712.5

n-OCTYLSILANE

H

Si

6

H

144.33

C8H20SiH

162-3°
Flashpoint: 36°C (97°F)

Fugitive inhibitor of hydrosilylation.1
Forms SAMs on titanium, gold and silicon surfaces.2
1. Lewis, K. et al. U.S. Patent 5,534,609, 1989.
2. Arkles, B. et al. J. Adhes. Sci. Technol. 2012, 26, 41.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[871-92-1]
TSCA EC 212-817-1 HMIS: 3-3-1-X

10g ¥17,800

50g ¥60,700

iso-OCTYLTRICHLOROSILANE - see SII6457.0 ISOOCTYLTRICHLOROSILANE

Si

6

Cl

247.67224-6°(<-50°)
1.0744
1.4490Flashpoint: 96°C (205°F)
Vapor pressure, 125°: 1 mm
SiO2 surface modification improves pentacene organic electronic performance.1
1. Tiwari, S. H. et al. Organic Electronics, 2012, 13, 18.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[5283-66-9](既) 2-2041
TSCA EC 226-112-1 HMIS: 3-1-1-X
25g ¥4,500
750g ¥32,000
18kg ¥286,000
C8H17Cl3Si

PR

Cl

n-OCTYLTRICHLOROSILANECOMMERCIALCl

SIO6713.0

SILICONn-OCTYLMETHYLDIMETHOXYSILANEO

SIO6715.0

n-OCTYLTRIETHOXYSILANE

276.48

C14H32O3Si

Viscosity: 1.9 cSt

6

O

O

Widely used in architectural hydrophobation
Surface treatment for pigments in cosmetic vehicles and composites
May be formulated to stable water emulsions.1
Suppresses nucleation behavior in ZnO-polylactic acid composites.2
1. Depasquale, R. et al. U.S. Patent 4,648,904, 1987.
2. Bussiere, P. et al. Phys. Chem. Chem. Phys. 2012, 14, 12301.
See also SIO6715.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2943-75-1](既) 2-3784
TSCA EC 220-941-2 HMIS: 2-1-0-X

OO

2kg ¥41,000

15kg ¥190,000

SIO6715.2

C8H17

Si

50g ¥3,600

1.4160COMMERCIAL

O

Si

98-9° / 2(<-40°)
0.875
Flashpoint: 109°C (228°F)
TOXICITY: oral rat, LD50: >5,110 mg/kg
Vapor pressure, 75°: 1 mm

OCTYLTRIETHOXYSILANE, oligomeric hydrolysateOnViscosity: 400-600 cSt
Reactive hydrophobic surface treatment with reduced volatile by-products
See also SIP6917.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1385031-14-0]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

0.979

1.454

100g ¥9,900(215) 547-1015

www.gelest.com

325

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.907

1.417

SIO6715.5

n-OCTYLTRIMETHOXYSILANE

Si

6

Viscosity: 1.0 cSt

OOTreatment for particles used in non-aqueous liquid dispersions
See also SID4635.0, SII6458.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3069-40-7]
TSCA EC 221-338-7 HMIS: 3-1-1-X

191-2°
Flashpoint: 68°C (154°F)
Vapor pressure, 75°: 0.1 mm

25g ¥3,800

2kg ¥60,000

15kg ¥284,000

SIO6715.7

n-OCTYLTRIS(TRIMETHYLSILOXY)SILANE, 95%Si

CAPRYLYL TRIMETHICONEC17H44O3Si4O
SiO

408.8890° / 1(<-40°)
0.857
1.411
Viscosity: 3-4 cSt
Flashpoint: 106°C (223°F)
See also SIO6711.5
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[187592-85-4]
HMIS: 1-1-0-X
100g ¥11,100
1kg ¥37,000
10kg ¥353,000

Si

O

Si

O
O
F

6

234.41

C11H26O3Si

SIO6715.9
OLIVINE(Mg-FORSTERITE, Fe-FAYALITE)2·SiO4
Mg2Fe2SiO4

153.31

Particle Size: <400 μm

3.32

1.63

88-90° / 10
Flashpoint: 95°C (203°F)

1.36725

1.447073° / 0.4
Flashpoint: >110°C (>230°F)

1.33251.4493

Mohs Hardness: 6.5-7.0
Orthorhombic dipyramidal

Yellowish-green, isomorphous, thick tubular crystals
Used in metallurgy, refractories, abrasives
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[19086-72-7]
TSCA-E
HMIS: 1-0-0-X

Crystal structure image
courtesy of webmineral.com

500g ¥9,600

10kg ¥48,000

SIP6715.55

3-(m-PENTADECYLPHENOXYPROPYL)HEPTAMETHYLTRISILOXANE, tech-90
C31H62O3Si3
567.09Flashpoint: >110°C (>230°F)
C15H31
Cashew nut oil modified silicone
See also SIT8011.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
HMIS: 1-1-0-X
25g ¥45,900

Si
O
O

Si
O
Si

F

SIP6716.0

O

O

F

Si
O

F

FLOPHEMESYL CHLORIDE
C8H6ClF5Si

PR

Cl

SIP6716.2

PENTAFLUOROPHENYLPROPYLDIMETHYLCHLOROSILANE

F

Si

Cl

F

F

F

Cl

F

Si

F

260.67

Derivatizing agent for electron capture detection (ECD)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[20082-71-7]
TSCA EC 243-506-9 HMIS: 3-2-1-X
5g ¥46,400

F

F

F

5g ¥67,100

PENTAFLUOROPHENYLDIMETHYLCHLOROSILANE

Si
F

458.54

SIP6716.1

F

F

C20H31F5O4Si

For non-covalent immobilization of proteins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[944721-47-5]
HMIS: 3-2-1-X

F

F

PENTAFLUOROPHENOXYUNDECYLTRIMETHOXYSILANE

O

11

F

F

C11H12ClF5Si

302.74

Bonded phase employed in taxol analysis.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[157499-19-9]
TSCA
HMIS: 3-1-1-X
5g ¥25,700

SIP6716.3

PENTAFLUOROPHENYLPROPYLMETHYLDICHLOROSILANE
C10H9Cl2F5Si

323.16

128-9° / 20

1.378

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1220126-66-8]
HMIS: 3-2-1-X
5g ¥28,400

Cl

F

F

Cl

F

Si

F

F

Cl

Cl

SIP6716.4

PENTAFLUOROPHENYLPROPYLTRICHLOROSILANE
C9H6Cl3F5Si

343.5899° / 0.75

(27-30°)1.495

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[78900-02-4]
HMIS: 3-1-1-X
2.5g ¥20,400

F

326

COMMERCIAL

O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4620Enabling Your Technology
Name
F
Si

PENTAFLUOROPHENYLPROPYLTRIMETHOXYSILANE

F

F

O

O

bp °C/mm

330.3397° / 0.75

(mp °C)

D420

nD20

1.27

1.4273

1.24

1.4180

SIP6716.6

O

F

Mw

F

C12H15F5O3Si

See also SIP6716.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[303191-26-6]
HMIS: 2-1-1-X

2.5g ¥23,600

SIP6716.7

PENTAFLUOROPHENYLTRIETHOXYSILANE

F

Si
F

F

O

F

O

F

Si
F

Forms hydrogen-free silicone resins useful in optical coatings
See also SIB1710.0, SIT8345.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[20083-34-5]
HMIS: 2-2-1-X

O

F

O

F
F

130° / 10
Flashpoint: 104°C (219°F)

5g ¥26,800

25g ¥96,800

SIP6716.73

PENTAFLUOROPHENYLTRIMETHOXYSILANE

288.24C9H9F5O3Si

O

210-215°

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[223668-64-2]
HMIS: 3-2-1-X

2.5g ¥52,200

SIP6716.8

F

PENTAFLUOROPHENYLTRIMETHYLSILANE

F
F

240.25170-2°
Flashpoint: 54°C (129°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1206-46-8]
HMIS: 2-2-0-X
10g ¥20,400
C9H9F5Si

Si
F

330.33

C12H15F5O3Si

O

1.261

1.43300.90

1.388725

0.86841.44300.998

1.39120.758

1.37401.093

1.5797OSiO

1,1,1,3,3-PENTAMETHYL-3-ACETOXYDISILOXANE
C7H18O3Si2

Si

206.39HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 274-767-7 HMIS: 2-2-1-X

149-50°Flashpoint: 40°C (104°F)
10g ¥13,000[70693-47-9]

SIP6717.5

Si

Si
H

1,3,5,7,9-PENTAMETHYLCYCLOPENTASILOXANE, 90%

Si

O

H

Si

134-5°HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1560-28-7]
TSCA EC 216-330-5 HMIS: 3-3-1-X
10g ¥23,600

SIP6718.0

OSiO

166.80C5H15ClSi2

O

300.64
Contains other cyclic homologs
ΔHvap: 47.3 kJ/mole
See also SIM6510.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[6166-86-5](既) 7-477
TSCA EC 228-204-7 HMIS: 3-2-1-X
C5H20O5Si5

H

Si

H

PR

H

O

Si

PENTAMETHYLCHLORODISILANE

Cl

168°
(-108°)
Flashpoint: 39°C (102°F)

25g ¥13,800

100g ¥36,900

SILICON

SIP6717.0

O

COMPOUNDS

F

O
O
F

F

SIP6719.0

PENTAMETHYLDISILOXANE

148.35C5H16OSi2

O

Si

Si

Undergoes hydrosilylation reactions
Converts functionalized dienes to hydroxymethylcyclopentanes.1

MeOOC

H

MeOOC

+ HMe2SiOSiOMe3

86-7°
Flashpoint: -4°C (25°F)

1. Pd cat.
2. [O]

1. Pei, T.; Widenhoefer, R. A. Org. Lett. 2000, 2, 1469.
See also SIB1977.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[1438-82-0](既) 7-477
TSCA EC 215-873-5 HMIS: 2-4-1-X

OH

MeOOC
MeOOC

25g ¥12,500

Me100g ¥32,600

1,1,3,5,5-PENTAMETHYL-1,5-DIVINYL-3-PHENYLTRISILOXANE see SID4610.5 1,5-DIVINYL-3-PHENYLPENTAMETHYLTRISILOXANE

SIP6719.5

1,1,3,5,5-PENTAPHENYL-1,3,5-TRIMETHYLTRISILOXANE

Si

O

Si

O

Si

546.89240-5° / 0.5(-25°)
Viscosity: 175 cSt
Flashpoint: 243°C (470°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3390-61-2](既) 7-474
TSCA EC 222-222-9 HMIS: 1-1-0-X
25g ¥20,400
C33H34O2Si3

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

327

Name

Mw

bp °C/mm(mp °C)

D420

nD20

430.82261-2°(-140°)

0.99431.4373

SIP6719.7
O

Si

PENTAVINYLPENTAMETHYLCYCLOPENTASILOXANE, 95%Si

C15H30O5Si5OO

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17704-22-2]
TSCA EC 241-712-3 HMIS: 2-1-0-X

Si

Si

O

O

Si

Cl

C5H11

50g ¥35,300

SIP6719.9

PENTYLMETHYLDICHLOROSILANE

Si

185.17170°
Mixed isomers
Flashpoint: 29°C (84°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13682-99-0](既) 2-2041
TSCA EC 237-194-3 HMIS: 3-3-1-X
25g ¥20,400
C6H14Cl2Si

Cl

0.99925

1.432825

SIP6720.0

PENTYLTRICHLOROSILANE

ClSi

AMYLTRICHLOROSILANE
C5H11Cl3Si

Cl

Cl

O
O
F

C5H11

10g ¥11,400

209.59171-2°
1.142
Mixed isomers
Flashpoint: 30°C (86°F)
Viscosity: 1.1 cSt
TOXICITY: oral rat, LD50: 2,430 mg/kg
Specific heat: 1.47 J/g/˚
See also SII6453.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[107-72-2](既) 2-2041
TSCA EC 203-515-0 HMIS: 3-3-1-X
25g ¥19,900

1.4456

SIP6720.2

PENTYLTRIETHOXYSILANE

O

C5H11

Si

AMYLTRIETHOXYSILANE
C11H26O3Si

234.41
Mixed isomers
Viscosity: 2.1 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2761-24-2](既) 2-2052
TSCA EC 220-429-9 HMIS: 2-2-1-X

OO

95-6° / 1.3
0.895
Flashpoint: 68°C (154°F)
TOXICITY: oral rat, LD50: 20,000 mg/kg

1.405925g ¥19,900

SIP6720.3

PERFLUOROALKYLETHYLTRIETHOXYSILANE

O

O

Si

Rf

O

510.3 - 610.4
Contains (perfluorobutyl)ethyl, (perfluorohexyl)ethyl and (perfluorooctyl)
ethyl homologs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[51851-37-7]/[101947-16-4]
TSCA
HMIS: 3-2-1-X

1.38-1.39

10g ¥18,000

PERFLUORODECYL-1H,1H,2H,2H-TRICHLOROSILANE see SIH5841.0 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE

F

SIP6720.5

O

F

O

Si
F

O
9

PR

F F

PERFLUORODODECYL-1H,1H,2H,2H-TRIETHOXYSILANE-PERFLUOROTETRADECYL-1H,1H,2H,2H-TRIETHOXYSILANE MIXTURE, 80%
710 - 810
157-198° / 1.5(25-75°)
Contains ~ 5% SIH5841.2, balance higher homologs
For the preparation of low surface energy substrates.
See also SIH5840.25
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[885275-56-9]/[853403-04-0]
HMIS: 2-1-1-X
5g ¥46,900

PERFLUOROOCTYL-1H,1H,2H,2H-DIMETHYLCHLOROSILANE see SIT8170.0 (TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLCHLOROSILANE

SIP6720.71

F(4-PERFLUOROOCTYLPHENYL)TRIETHOXYSILANE

O

F

C20H19F17O3Si

Si

F

F F

O

O

7

658.50

Thermally stable to >300°
Contact angle treated glass surface, water: 115°.1
1. Kondo, Y. J. Oleoscience 2004, 53, 143.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

101-3° / 1
Flashpoint: >110°C (>230°F)

1.448

1.0g ¥65,000

SIP6720.72

F

F

F F

F

F F

328

FF

O

FF

F F

O

O

O

n

3 Si

O

O

[PERFLUORO(POLYPROPYLENEOXY)]METHOXYPROPYLTRIMETHOXYSILANE, 20% in fluorinated hydrocarbon
4,000 - 8,000
Contact angle, water: 112˚
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[870998-79-0]
TSCA
HMIS: 2-0-1-X
10g ¥61,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.5

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

2.3

1.5

1.1

1.580925

SIP6720.73
PERLITE

318.22
Particle Size: <44 μm
3
Typical bulk density, not compacted: 0.05 g/cm
Gray, glassy volcanic rock, concentric fracture, silica source
Used in metallurgy, abrasives, filtration, absorbent, cryogenics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[93763-70-3]
TSCA-E
HMIS: 1-0-0-X
Na2OK2OAl2O3SiO2500g ¥9,600

10kg ¥63,000

SIP6720.77

9-PHENANTHRENYLTRIETHOXYSILANE
O

340.48

C20H24O3Si

OSiHigh refractive index monomer
See also SIN6596.8
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21591-53-7]
TSCA-L
HMIS: 2-1-0-X

5g ¥30,000

O
O
F

O

173-5° / 0.5(20-30°)Flashpoint: >110°C (>230°F)

SIP6720.8

PHENETHYLDIISOPROPYLCHLOROSILANE

Si

254.86105-9° / 0.3
Mixed α-, β- isomers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[151613-24-0]
TSCA
HMIS: 3-2-1-X
5g ¥41,100

0.970

C14H23ClSi

Cl

PHENETHYLDIMETHYLCHLOROSILANE

198.7756° / 0.2
Contains α-, β-isomers
Flashpoint: 70°C (158°F)
See also SIP6724.7
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17146-08-6]
TSCA EC 241-207-8 HMIS: 3-2-1-X
50g ¥48,500

0.999

1.51850.890

1.4946219.1999° / 6
1.127
Contains α-, β-isomers
Flashpoint: 80°C (176°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[772-65-6]
TSCA EC 212-253-6 HMIS: 3-2-1-X
25g ¥14,600
100g ¥39,500

1.5120

C10H15ClSi

SiCOMPOUNDS

SIP6721.0

SIP6721.2

PHENETHYLDIMETHYL(DIMETHYLAMINO)SILANE

Si

207.39Contains 10-15% α-isomer
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[181231-68-5]
TSCA
HMIS: 3-2-1-X
C12H21NSi

N

109° / 210g ¥36,900

SIP6721.5

Si

Cl

PHENETHYLMETHYLDICHLOROSILANE

METHYL(PHENETHYL)DICHLOROSILANE
C9H12Cl2Si

SILICONCl

SIP6722.0

Cl

239.6093-6° / 3
1.240
Contains α-, β-isomers
Flashpoint: 91°C (196°F)
Treated surface contact angle, water: 88°
TOXICITY: oral rat, LD50: 2,830 mg/kg
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[940-41-0]
TSCA EC 213-371-0 HMIS: 3-2-1-X
25g ¥11,400
100g ¥28,900
C8H9Cl3Si

PR

Si

PHENETHYLTRICHLOROSILANE

Cl

Cl

1.5185

SIP6722.6

PHENETHYLTRIMETHOXYSILANE, tech-95

Si

O

O

95-6° / 2Flashpoint: 109°C (228°F)

25g ¥10,600

1.037

100g ¥28,900

1.4753

COMMERCIAL

226.35
Contains α-, β-isomers
Component in optical coating resins
In combination with TEOS forms hybrid silicalite-1 molecular sieves.1
1. Yeong, Y. et al. Adv. Mater. Res. 2008, 47-50, 238.
See also SIE4897.5, SIM6511.2, SIP6731.8
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[49539-88-0]
TSCA EC 256-363-2 HMIS: 3-1-1-X
C11H18O3SiO

2kg ¥109,500

SIP6722.8

PHENETHYLTRIS(TRIMETHYLSILOXY)SILANE

Si
Si

O

Si

400.81110° / 0.8(-58°)
0.93
Contains α-, β-isomers
Flashpoint: >110°C (>230°F)
Viscosity: 4.4 cSt
Fluid with both silicone and hydrocarbon compatibility
See also SIO6715.7, SIP6826.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[211935-21-6]
HMIS: 1-1-0-X
25g ¥11,900
100g ¥31,000
C17H36O3Si4

O

O

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.44025

329

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.11251.560325

1.034

1.5052

SIP6723.0

3-PHENOXYPHENYLDIMETHYLCHLOROSILANE, 95%O

Cl C14H15ClOSi

262.81
102-6° / 1
Contains other isomers
1
End-capper for low-temperature lubricating fluids.
1. Gardos, M. ASLE Transactions 1972, 18, 31.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[41318-68-7]
HMIS: 3-2-1-X
5g ¥30,500

Si

SIP6723.2

3-PHENOXYPROPYLDIMETHYLCHLOROSILANE
C11H17ClOSi
O

228.7890-2° / 0.25

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl [69733-73-9]
HMIS: 3-2-1-X
25g ¥17,200

Si100g ¥48,300

SIP6723.25

OO
F

3-PHENOXYPROPYLMETHYLDICHLOROSILANE

Cl C10H14Cl2OSiOCl

249.21110° / 1

1.158

1.51501.25741.5190HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[28229-56-3]
HMIS: 3-2-1-X
25g ¥25,700

Si

SIP6723.3

3-PHENOXYPROPYLTRICHLOROSILANE

Cl

Si

O
Cl

Cl

269.63

C9H11Cl3OSi

40° / 0.02
Flashpoint: >110°C (>230°F)

See also SIM6492.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[60333-76-8]
HMIS: 3-1-1-X
25g ¥15,400

100g ¥42,200

SIP6723.5

O

PHENOXYTRIMETHYLSILANE
TRIMETHYLSILYLPHENOXIDEC9H14OSiSi

166.3081° / 23(-55°)
Flashpoint: 52°C (126°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 3-2640
TSCA EC 216-211-8 HMIS: 3-2-1-X

0.920

1.478225g ¥12,500[1529-17-5]

SIP6723.4

Cl

Si

O

11

Cl 11-PHENOXYUNDECYLTRICHLOROSILANE

381.85

C17H27Cl3OSi

166-7° / 0.3

1.08925

Forms SAMs that orient pentadecene
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[526204-46-6]
HMIS: 3-1-1-X
5g ¥59,100

SIP6723.6

O

Si

O

PHENYLACETOXYTRIMETHYLSILANE

208.330.982

1.4780255°
1.04Flashpoint: 106°C (223°F)
1Polycondensation reaction with silanol functional PDMS oligomers forms low pourpoint fluids.
1. Andranov, K. et al. Bull. Acad. Sci. USSR 1962, 11, 1492.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17890-10-7]
HMIS: 3-2-1-X
25g ¥11,100
100g ¥28,400

1.5147

C11H16O2Si

96-7° / 0.7
Flashpoint: 77°C (171°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

25g ¥13,000[2078-18-4]

PHENYLALLYLDICHLOROSILANE - see SIA0486.0 ALLYLPHENYLDICHLOROSILANE

PR

SIP6723.67(PHENYLAMINOMETHYL)METHYLDIMETHOXYSILANE, 95%O

NH

C10H17NO2Si

Si
O

211.34

SIP6723.7

NH

269.42

C13H23NO3Si

Si

O

Converts isocyanate-terminated polyurethanes to moisture curable resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3473-76-5]
HMIS: 3-2-1-X

O

135-7° / 4
Flashpoint: >110°C (>230°F)
25g ¥9,800

1.00425100g ¥24,100

1.485252kg ¥146,000

COMMERCIAL

N-PHENYLAMINOMETHYLTRIETHOXYSILANEO

SIP6724.0

O

Si

O

330

N-PHENYLAMINOPROPYLTRIMETHOXYSILANE

255.38Specific wetting surface: 307 m2/g
Oxidatively stable coupling agent for polyimides, phenolics, epoxies
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3068-76-6](既) 3-2644
TSCA EC 221-328-2 HMIS: 3-1-1-X
C12H21NO3Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

132-5° / 0.3
Flashpoint: 165°C (329°F)
25g ¥4,000(215) 547-1015

1.07

2kg ¥63,000

www.gelest.com

1.504

18kg ¥395,000

COMMERCIALH
NO

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

226.830.96425

1.497925

247.241.0925

SIP6724.6

N

PHENYLBIS(DIMETHYLAMINO)CHLOROSILANE, 95%

Si

1-CHLORO-N,N,N’,N’-TETRAMETHYL-1-PHENYLSILANEDIAMINE
C10H17ClN2Si
228.80Cl

127-9° / 23
Hazy liquidFlashpoint: 73°C (163°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[25374-10-1]
TSCA EC 246-907-7 HMIS: 3-2-2-X
25g ¥38,500

N

SIP6724.7

Cl 4-PHENYLBUTYLDIMETHYLCHLOROSILANE

Si

85-7° / 0.6
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[32328-67-9]
TSCA-L
HMIS: 3-1-1-X
25g ¥32,600
C12H19ClSi

SIP6724.8

Cl

4-PHENYLBUTYLMETHYLDICHLOROSILANE

Si

105-9° / 1.5
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17776-69-1]
HMIS: 3-1-1-X
25g ¥32,600
C11H16Cl2Si

O
O
F

Cl

SIP6724.9

SiCl

267.6682° / 0.4
Flashpoint: >110°C (>230°F)

Forms HPLC bonded phases for separation of aromatics.1
1. Den, T. et al. in “Silanes, Surfaces, Interfaces” D. Leyden ed., 1986, 403.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17886-88-3]
TSCA-L
HMIS: 3-1-1-X
25g ¥27,800

1.192

1.51211.006

1.4742100g ¥82,700

SIP6724.92

O

O

Si

O

4-PHENYLBUTYLTRIMETHOXYSILANE

254.40C13H22O3Si

80° / 0.5
Flashpoint: >110°C (>230°F)

See also SIP6724.9, SIP6736.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[152958-91-3]
HMIS: 3-2-1-X

25g ¥32,600

SIP6724.95(S,S)-2-PHENYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE

1-OXA-3-AZA-2-SILACYCLOPENTANE, 2-CHLORO-3,4-DIMETHYL-5-PHENYL-2,5-DIPHENYL, (4S,5S)
C16H18ClNOSi
303.86138° / 0.5

Viscous liquid
Catalyzes the enantioselective Friedel-Crafts alkylation of benzoylhydrazones.1

H

O

Ph

N

+

Si

Cl

i-PrO2C

NMe2

PR

N

NHBz

H

Me

O

Ph

1.016

i-PrO2CCOMPOUNDSCl C10H13Cl3Si

NHNHBzSi(1.5 eq)
N Cl
Metoluene, -20°, 43 h

NMe2

65%; 95% ee

SILICON

4-PHENYLBUTYLTRICHLOROSILANE

Cl

Promotes a tandem asymmetric Aza-Darzens-ring-opening reaction to α-amino-β-chloro esters and α-amino-β-aryl esters.2
1. Shirakawa, S. et al. J. Am. Chem. Soc. 2005, 127, 2858
2. Valdez, S. C.; Leighton, J. L. J. Am. Chem. Soc. 2009, 131, 14638.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[680592-40-9]
HMIS: 2-2-1-X
5g ¥32,600

SIP6724.98

PHENYLCHLOROSILANE

H

Si

Cl

H

Cl

142.66

1.526

41° / 9Flashpoint: 54°C (129°F)

65-6° / 10
1.2115Flashpoint: 48°C (118°F)
Carries out thionation and selenation of amides and lactams with elemental sulfur or selenium, respectively.1
1. Shibahara, F. et al. Org. Lett. 2009, 11, 3064.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1631-84-1](既) 3-2634
TSCA EC 216-635-3 HMIS: 3-2-1-X
10g ¥15,600
50g ¥52,200

1.5257

Intermediate for dendron synthesis.
1. Cuadrado et al. J. Am. Chem. Soc. 1997, 119, 7613.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4206-75-1]
TSCA EC 224-124-1 HMIS: 3-3-1-X
5g ¥26,800
1

SIP6725.0

PHENYLDICHLOROSILANE

Cl

Si

1.070

C6H7ClSi

H

C6H6Cl2Si

www.AZmax.co.jp

TEL: 03-5543-1630

177.10

Gelest, Inc.

(215) 547-1015

www.gelest.com

331

Name

Mw

bp °C/mm

196.3280-4° / 10

(mp °C)

D420

nD20

0.953325

1.48141.006

1.4907

SIP6725.2

O

PHENYLDIETHOXYSILANE

Si

C10H16O2Si

H

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17872-93-4]
HMIS: 2-2-1-X

O

SIP6726.0

O

PHENYLDIMETHYLACETOXYSILANE

194.30

C10H14O2Si

Si

10g ¥24,100

O

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 241-836-8 HMIS: 2-2-1-X

127-9° / 44
Flashpoint: 72°C (162°F)
25g ¥36,900[17887-60-4]

SIP6728.0

PHENYLDIMETHYLCHLOROSILANE

170.71
192-3°
1.032
1.5082
Viscosity: 1.4 cSt
Flashpoint: 61°C (142°F)
ΔHvap: 47.7 kJ/mole
Vapor pressure, 25°: 1 mm
Cl Forms
cuprate.1
1. Fleming, I.; Terrett, N. K. Tetrahedron Lett. 1984, 25, 5103.
F&F: Vol. 7, p 133; Vol. 8, p 196; Vol. 11, p 209; Vol. 12, p 210.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[768-33-2](既) 3-2641
TSCA EC 212-193-0 HMIS: 3-2-1-X
25g ¥9,700
100g ¥25,700
750g ¥116,400

SIP6728.4

PHENYLDIMETHYLETHOXYSILANE

180.32
Viscosity: 1.3 cSt
Dipole moment: 1.34 debye
Antiepileptic activity in petit mal syndrome
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1825-58-7](既) 2-2639
TSCA EC 217-366-4 HMIS: 2-2-1-X
C10H16OSiSiO

93° / 250.926
Flashpoint: 61°C (142°F)
TOXICITY: oral rat, LD50: 2,460 mg/kg
10g ¥9,800

1.479950g ¥28,900

SIP6729.0

PHENYLDIMETHYLSILANEDIMETHYLPHENYLSILANE
C8H12Si

136.27

156-7°(-124°)
Flashpoint: 38°C (100°F)
Vapor pressure, 25°: 4 mm

Review of synthetic utility.1
Used to prepare α-phenyldimethylsilyl esters with high enantioselectivity.2
Yields optically active reduction products with chiral Rh or Pd catalysts.3
Undergoes 1,4-addition to pyridines forming N-silylated dihydropyridines.4
Hydrosilylation of 1,4-bis(trimethylsilyl)butadiyne can go to the trisilyl allene or the trisilyl enyne.5

RhCl(PPh3)3

H

Me3Si

SiMe3

+ PhMe2SiH

Pt(PPh3)4PRSi100°, 2 h86%100°, 2 h
94%

Me3Si

PhMe2Si
H

0.889

•

1.4995

SiMe3

SiMe2PhSiMe2Ph

Me3Si
SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 254-255.
2. Zhang, Y.-Z. et al. Angew. Chem., Int. Ed. Engl. 2008, 47, 8496.
3. F&F: Vol. 12, p 209; Vol. 13, p 123; Vol. 15, p 168.
4. Gutsulyak, D. V. et al. Angew. Chem., Int. Ed. Engl. 2011, 50, 1384.
5. Kusumoto, T. et al. Bull. Chem. Soc. Jpn. 1992, 65, 1280.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[766-77-8]
TSCA EC 212-170-5 HMIS: 2-2-1-X
25g ¥14,600
100g ¥39,500

SIP6729.2

PHENYLDIMETHYLSILANOL

Si

OH

152.26

C8H12OSi

60-2°/1
Flashpoint: 91°C (196°F)

Reagent for cross-coupling
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5272-18-4]
EC 217-366-7 HMIS: 2-1-0-X

0.997

1.5120

0.921

1.487

5g ¥28,900

PHENYLDIMETHYLSILYLMETHYL METHACRYLATE see SIM6481.5 (METHACRYLOXYMETHYL)PHENYLDIMETHYLSILANE

SIP6729.5

Si
12

332

Cl

12-PHENYLDODECYLDIMETHYLCHLOROSILANE
C20H35ClSi

339.03

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

172-4° / 0.25
5g ¥87,800(215) 547-1015

www.gelest.com

COMMERCIAL

Si

O
O
F

C8H11ClSi

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.184

1.5321

SIP6730.0

PHENYLETHYLDICHLOROSILANE

Cl

205.16

C8H10Cl2Si

Viscosity, 20°: 1.2 cSt
ΔHvap: 49.8 kJ/moleSiCl

225-6°
Flashpoint: 92°C (198°F)
Vapor pressure, 100°: 13 mmHeat capacity, 27°: 1.420 kJ/kg°C

Monomer for Hyde’s first silicone
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1125-27-5](既) 3-2641
TSCA EC 214-407-8 HMIS: 3-2-1-X
25g ¥42,700

SIP6731.5(R)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREA

O
N
H

N
H

Si

O

O

368.55
Viscous liquid or solid
Optically active silane; treated surfaces resolve enantiomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[131206-15-0]
HMIS: 2-1-0-X
C18H32N2O4Si

O

Flashpoint: >110°C (>230°F)

1.052525g ¥26,800(S)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREA

O

Si

O

O

368.55
Viscous liquid or solid
Optically active silane; treated surfaces resolve enantiomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[67240-22-2]
HMIS: 2-1-0-X
C18H32N2O4Si

O

N
H

Flashpoint: >110°C (>230°F)

1.052525g ¥32,600

SiO

2-PHENYLETHYLTRIMETHOXYSILANE

226.351.037

1.47530.906

1.54070.896

1.5284298.6095° / 5(-56°)
0.909
Viscosity, 25°: 2 cSt
Flashpoint: 64°C (147°F)
Surface tension, 27°: 30.8 mN/m
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[546-44-1]
HMIS: 2-2-1-X
25g ¥15,600
100g ¥43,200

1.4468

C11H18O3Si

See also SIP6722.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[49539-88-0]
EC 256-363-2 HMIS: 3-1-1-X

O

121-2° / 6

25g ¥19,400

SIP6732.0

PHENYLETHYNYLDIMETHYLSILANE

Si

160.29C H Si

H 10 12HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-2-1-X[87290-97-9]

33-4° / 0.3
Flashpoint: 76°C (169°F)
5g ¥25,200

SIP6736.0

PHENYLETHYNYLTRIMETHYLSILANE

174.3267° / 5Flashpoint: 82°C (180°F)
Reacts with tetraphenylcyclopentadienone to form pentaphenylphenyltrimethylsilane.1
Cross couples with aryl halides and triflates as well as homocouples to 1,2-diynes.2
Undergoes alkynyl cross metathesis reactions.3
Provides the ethynyl silver acetylide.4
Reacts w/ propargyl chlorides to form 1,2-diene-4-ynes.5
Ethynylsilanes react w/ propargyl halides to form 1,4-diynes.6
1. Jianhua, C. et al. In Silicon Chemistry; Corey, J., et al. Ed.; Wiley: 1988: p. 105.
2. Nashihara, Y. et al. J. Org. Chem. 2000, 65, 1780.
3. Furstner, A.; Mathes, C. Org. Lett. 2001, 3, 221.
4. Vitérisi, A. et al. Tetrahedron Lett. 2006, 47, 2779.
5. Montel, F. et al. Org. Lett. 2006, 8, 1905.
6. Kuninobu, Y.; Ishii, E.; Takai, K. Angew. Chem., Int. Ed. Engl. 2007, 46, 3296.
See also SIB1760.0 BIS(PHENYLETHYNYL)DIMETHYLSILANEHYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2170-06-1]
HMIS: 2-2-1-X
5g ¥9,800
C11H14Si

Si

SILICONOCOMPOUNDS

SIP6731.8

PR

N
H

O
O
F

SIP6731.6

25g ¥28,900

SIP6736.2

3-PHENYLHEPTAMETHYLTRISILOXANE, 95%

Si

1,1,1,3,5,5,5-HEPTAMETHYL-3-PHENYLTRISILOXANE
C13H26O2Si3

O

Si

O

Si

SIP6736.3

SiCl

6-PHENYLHEXYLDIMETHYLCHLOROSILANE

254.88

C14H23ClSi

Forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[97451-53-1]
HMIS: 3-1-1-X

6

132-3° / 1.5

0.942

1.49315g ¥30,000

SIP6736.32

Si
6

N

6-PHENYLHEXYLDIMETHYL(DIMETHYLAMINO)SILANE
C16H29NSi

263.49120° / 0.5

Forms bonded phases for HPLCHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1223044-18-5]
HMIS: 3-2-1-X
5g ¥41,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

333

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.14361.5065

1.08

1.561

SIP6736.4

6-PHENYLHEXYLTRICHLOROSILANE

Cl
Si

95° / 0.1
Flashpoint: >110°C (>230°F)

See also SIP6724.9
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18035-33-1]
HMIS: 3-1-1-X
5g ¥28,400Cl

6295.71

C12H17Cl3Si

Cl

SIP6736.5

PHENYLHYDROCYCLOSILOXANES, tech-95

366.58 - 610.99
Contains linears
Viscosity: 10-15 cSt
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-2-1-X((C6H5)HSiO)3-5

Si

3-4

5g ¥19,400

25g ¥67,100

SIP6736.8

N

PHENYLMETHYLBIS(DIMETHYLAMINO)SILANE

O
O
F

H

108-9° / 11
Flashpoint: 78°C (172°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[33567-83-8]
HMIS: 3-2-1-X
10g ¥16,200
C11H20N2Si

Si
N

Cl
Si

208.381.4982156.591.5171

SIP6737.0

PHENYLMETHYLCHLOROSILANE

H

176-7°
1.054
Flashpoint: 40°C (104°F)
Vapor pressure, 113°: 100 mm
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1631-82-9](既) 3-2641
TSCA EC 216-633-2 HMIS: 3-2-1-X
10g ¥20,400
50g ¥71,300
C7H9ClSi

SIP6737.5

PHENYLMETHYLCYCLOSILOXANES, 95%

408.7 - 544.9
130-240° / 1.5
Hazy liquid - may contain solids
Flashpoint: >200°C (>392°F)
Contains tetrasiloxanes and trisiloxanes, cis and trans isomers present
Suppresses male hormonal response
Silicone monomer
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[546-45-2]
TSCA EC 208-900-7 HMIS: 3-1-0-X
25g ¥14,600
100g ¥39,500

1.1

1.545

205-6°(-53°)
1.187
Flashpoint: 82°C (180°F)
TOXICITY: ipr mouse, LD50: 300 mg/kg
Autoignition temperature: >400˚C
Vapor pressure, 82.5°: 13 mm

1.5180C21H24O3Si3 - C28H32O4Si4

Si

3-4

SIP6738.0

PHENYLMETHYLDICHLOROSILANE

191.13C7H8Cl2Si

Cl
Si

Monomer for high temperature silicones
F&F: Vol. 10, p 91; Vol. 11, p 247; Vol. 12, p 231.
See also SIP6730.0, SIP6740.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[149-74-6](既) 3-2641
TSCA EC 205-746-2 HMIS: 3-2-1-X
25g ¥7,700

PRCl

Viscosity, 20°: 1.2 cSt
ΔHvap: 48.1 kJ/mole

500g ¥23,600

SIP6738.5

1-PHENYL-1-(METHYLDICHLOROSILYL)BUTANE

87-9° / 1
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
25g ¥35,300

C11H16Cl2Si

Cl

Si

Cl

247.24

1.1

1.512

0.963

1.4690

SIP6739.0

OSiO

PHENYLMETHYLDIETHOXYSILANE

210.35
Dipole moment: 1.32 debye
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[775-56-4](既) 3-2639
TSCA EC 212-275-6 HMIS: 2-2-1-X
C11H18O2Si

117-8° / 31
Flashpoint: 89°C (192°F)
25g ¥10,300

100g ¥25,700

SIP6740.0

Si
O

334

PHENYLMETHYLDIMETHOXYSILANE

199-200°
0.9934
1.4694Flashpoint: 76°C (169°F)
TOXICITY: oral rat, LD50: 892 mg/kg
Additive to coupling agent systems, increasing interface flexibility, UV stability
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3027-21-2](既) 3-2639
TSCA EC 221-192-4 HMIS: 3-2-1-X
25g ¥5,300
2kg ¥110,000
18kg ¥524,000
C9H14O2Si

Viscosity, 20°: 1.65 cSt

www.AZmax.co.jp

TEL: 03-5543-1630

182.29

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALOEnabling Your Technology
Name
PHENYLMETHYLSILANE

122.24

C7H10Si

Si

Used in the preparation of vicinal diamines.
1. Rangareddy, K. et al. J. Org. Chem. 2004, 69, 6843.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[766-08-5]
TSCA EC 212-160-0 HMIS: 3-3-1-X
1H(mp °C)

D420

nD20

139-40°Flashpoint: 25°C (77°F)

0.88951.505810g ¥15,100

50g ¥50,100

PHENYLMETHYLVINYLCHLOROSILANE - see SIV9094.0 VINYLPHENYLMETHYLCHLOROSILANE

H

SIP6742.5

3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE

Si

C11H22O2Si3

O

270.5588° / 6Chain extender for 2-component RTVs
See also SIH6117.0, SIP6826.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17962-34-4]
EC 241-886-0 HMIS: 2-2-1-XSi

1.02325

1.44712525g ¥25,700

O
O
F

O
H

bp °C/mm

SIP6742.0

H

Si

Mw

SIP6743.0(3-PHENYLPROPYL)DIMETHYLCHLOROSILANE

Si

Cl

212.78

C11H17ClSi

75° / 0.5
Flashpoint: 103°C (217°F)

See also SIP6724.7
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17146-09-7]
TSCA EC 241-208-3 HMIS: 3-1-1-X
5g ¥8,000

0.963

50g ¥35,000(3-PHENYLPROPYL)METHYLDICHLOROSILANE

Si

233.21

C10H14Cl2Si

96-8° / 4

1.08625

1.509025

0.96231.4804

1.2239

1.514

1.176

1.55201.196

1.5525HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
Cl [17776-66-8]
TSCA
HMIS: 3-2-1-X
25g ¥28,900

SIP6744.2

3-PHENYLPROPYLMETHYLDIMETHOXYSILANE

O

224.37

C12H20O2Si

SiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

100-2° / 4
Flashpoint: >110°C (>230°F)
25g ¥36,300[1233513-31-9]

SIP6744.6(3-PHENYLPROPYL)TRICHLOROSILANE
253.63
Cl C9H11Cl3SiSi
See also SIP6724.9
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/waterCl[13617-40-8]
HMIS: 3-2-1-X

Cl

110° / 1025g ¥34,200

SIP6745.0

Se

Si(PHENYLSELENOMETHYL)TRIMETHYLSILANE, 95%
C10H16SeSi

毒物

243.29106° / 6
Flashpoint: 95°C (203°F)

Synthetic equivalent of formyl carbanion.
1. White, J. et al. Tetrahedron Lett. 1983, 24, 4539.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[56253-60-2]
EC 260-077-3 HMIS: 3-2-1-X

PR

1

SILICONClCOMPOUNDS

SIP6744.05g ¥52,200

SIP6747.0

PHENYLSELENOTRIMETHYLSILANE, 95%
PHENYLTRIMETHYLSILYLSELENIDE
C9H14SeSi 毒物

SeSi

229.2692-3° / 5

Review of synthetic utility.1
Catalytic radical initiator for alkylselenation and other radical reactions.2
Asymmetrically opens epoxides.3
Regio- and stereoselectively adds to acetylenes under palladium catalysis.4

Ph+

Me3SiSePh

Pd(PPh3)4

PhSe
Ph

(-5°)

SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 421-422.
2. Pandey, G. et al. J. Org. Chem. 2000, 65, 4309.
3. Tiecco, M. et al. Tetrahedron 2008, 64, 3337.
4. Detty, M. R. J. Org. Chem. 1979, 44, 4528.
F&F: Vol. 9, p 373.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33861-17-5]
HMIS: 3-2-1-X
5g ¥73,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

335

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.86811.5125

SIP6750.0

PHENYLSILANE

108.21C6H8Si

ΔHvap: 34.8 kJ/mole

H
Si

H

H

Reducing reagent in radical reductions.1
Yields ISiH3 on treatments with HI in presence of AlI3.2
Adds to norbornene with high ee.3
1. Barton, D. et al. Synlett 1991, 435.
2. Tamizhmani, G. et al. Chem. Mater. 1990, 2, 473.
3. Gountchev, T. I.; Tilley, T. D. Organometallics 1999, 18, 5661.
F&F: Vol. 5, p 523; Vol. 17, p 284; Vol. 21, p 487.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[694-53-1]
TSCA EC 211-772-5 HMIS: 2-4-1-X

120°(-64 to -68°)
Flashpoint: 8°C (46°F)
UVmax, nm: 218(vs), 263, 268, 275

5g ¥14,600

25g ¥48,000

SIP6770.0

PHENYLTHIOTRIMETHYLSILANE

182.36

Review of synthetic utility.
Converts adehydes to phenylsulfides.2
Converts aromatic aldehydes to coupled diols with Yb metal.3
Reacts w/ aryl fluorides to provide phenylaryl thioethers.4
Converts enol silyl ethers into vinylsulfides.5
1

S

OSiMe3Si

72° / 8Flashpoint: 33°C (91°F)

0.963

1.5320OOF

C9H14SSi+

PhSSiMe3

SPh

ZnI2

BF3Et2O, rt
65%

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 414-418.
2. Glass, R. Synth. Commun. 1976, 6, 47.
3. Fujiwara, Y. et al. Tetrahedron Lett. 1996, 37. 3465.
4. Liu, C. et al. Synlett 2011, 22, 1143.
5. Degl’innocenti, A. et al. Synlett.1992, 499.
F&F: Vol. 10, p 426; Vol. 12, p 535; Vol. 16, p 278.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4551-15-9]
TSCA EC 224-916-7 HMIS: 3-3-1-X
25g ¥32,600

SIP6775.0(PHENYLTHIOMETHYL)TRIMETHYLSILANE

S
Si

155-6° / 50
Flashpoint: 39°C (102°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[17873-08-4]
HMIS: 2-3-0-X
5g ¥19,400
C10H16SSi

196.380.967

SIP6790.0

O

PHENYLTRIACETOXYSILANE, tech-90

O

O
O

O

282.32

Cross-linker for moisture-cure clear glass sealants
Decomposes >250°
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18042-54-1]
TSCA EC 241-952-9 HMIS: 3-1-1-X

PR

Si

C12H14O6Si

O

144-6° / 2(36-7°)
Flashpoint: 102°C (216°F)

1.19391.4708201°(-33°)
1.324
Flashpoint: 91°C (196°F)
TOXICITY: oral rat, LD50: 2,340 mg/kg
Vapor pressure, 75°: 10 mm
Critical temperature: 438˚CSpecific heat: 1.00 J/g/°
Coefficient of thermal expansion: 1.2 x 10-3

1.524725g ¥21,500

SIP6810.0

PHENYLTRICHLOROSILANE
C6H5Cl3Si

Si

Cl

Cl

211.55Intermediate for high refractive index resins
Immobilizes pentacene films.1
1. Shankar, K. et al. J. Mater. Res. 2004, 19, 2003.
See also SIT8040.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[98-13-5](既) 3-2634
TSCA EC 202-640-8 HMIS: 3-2-1-X
25g ¥3,400

1kg ¥25,000

COMMERCIALCl

Viscosity: 1.08 cSt
ΔHvap: 47.7 kJ/mole
Dipole moment: 2.41 debye
Surface tension: 27.9 mN/m

18kg ¥214,000

SIP6813.0

1-PHENYL-1-TRICHLOROSILYLBUTANE

78-80° / 0.8
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥32,600

C10H13Cl3Si
Cl
Si
Cl

336

Cl

www.AZmax.co.jp

TEL: 03-5543-1630

267.65

Gelest, Inc.

(215) 547-1015

1.201

www.gelest.com

1.518

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

112-3° / 10
0.996
Flashpoint: 96°C (205°F)
TOXICITY: oral rat, LD50: 2,830 mg/kg
Autoignition temperature: 265˚C
Vapor pressure, 75°: 1 mm
Coefficient of thermal expansion: 0.9 x 10-3

1.4718

SIP6821.0

PHENYLTRIETHOXYSILANE

240.37

C12H20O3Si

Viscosity, 25˚: 1.7 cSt
Dipole moment: 1.85 debye
Surface tension: 28 mN/mDielectric constant: 4.12

O
O

O

(+)

+

THF, 60°C

(rac)

O
O
F

OBz

TBAF, Pd(dba)2

PhSi(OEt)3

Ph

Extensive review on the use in silicon-based cross-coupling reactions.3
1. Canrado, K. et al. Chem. Mater. 2001, 13, 3766.
2. Correia, R.; DeShong, P. J. Org Chem. 2001, 66, 7159.
3. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[780-69-8](既) 3-2635
TSCA EC 212-305-8 HMIS: 2-1-1-X
100g ¥5,000
2kg ¥39,000

17kg ¥195,000

PHENYLTRIFLUOROSILANE, 95%

162.19101-2°(-19°)
Dipole moment: 2.77 debye
Flashpoint: -5°C (23°F)
Catalyzes the reaction of trimethylsilylmethyl imidates with dipolarophiles.1

1.21691.4110211°(-25°)
1.064
Flashpoint: 86°C (187°F)
TOXICITY: ivn mouse, LD50: 180 mg/kg
Vapor pressure, 108°: 20 mm

1.4734C6H5F3Si

F
Si
F

OMe

Ph

F

Me3Si

N

Ph

PhSiF3 (1.2 eq.), CH2Cl2

MeOOC

97%

MeOOC

COOMe

Ph

COMPOUNDSSIP6821.5

COOMe

N
H

Ph

1. Washizuka, K. et al. Tetrahedron 1999, 55, 12969.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[368-47-8]
HMIS: 3-4-1-X
50g ¥39,800

SIP6822.0

PHENYLTRIMETHOXYSILANE

198.29Viscosity, 25˚: 2.1 cSt
Dipole moment: 1.77 debye
Dielectric constant: 4.44
Intermediate for high temperature silicone resins
Hydrophobic additive to other silanes with excellent thermal stabilty
Cross couples with aryl halides.1

Br+

PhSi(OMe)3

+PhSi(OMe)3

TBAF

Phenylates heteroaromatic carboxamides.2

O

Si
O

O

N

O

S

NH2

Ph

Pd(OAc)2, R3P

Cu(OAc)2
TBAF

N

O

S

NHPh

Directly couples with 1o alkyl bromides and iodides.3
Converts carboxylic acids to phenyl esters and vinyl carboxylates.4
Converts arylselenyl bromides to arylphenylselenides.5
Reacts with anhydrides to transfer both phenyl and methoxy and thus form the mixed diester.6
Used in the nickel-catalyzed direct phenylation of C-H bonds in heteroaromatic system such as benzoxazoles.7
Immobilization reagent for aligned metallic single wall nanotubes (SWNT).8,9
Extensive review on the use in silicon-based cross-coupling reactions.10
1. Mowery, M. E.; DeShong, P. J. Org. Chem. 1999, 64, 1684.
2. Lam, P. Y. S. et al. Tetrahedron Lett. 2001. 42, 2427.
3. Young, J.-Y.; Fu, G. C. J. Am. Chem. Soc. 2003, 125, 5616.
4. Luo, F. et al. Synthesis 2010, 2005.
5. Bhadra, S. et al. J. Org. Chem. 2010, 75, 4864.
6. Luo, F. et al. J. Org. Chem. 2010, 75, 5379.
7. Hachilya, H. et al. Angew. Chem., Int. Ed. Engl. 2010, 49, 2202.
8. LeMieux, M. Science 2008, 321, 101.
9. Nish, A. et al. Nature Nanotechnol. 2007, 2, 640.
10. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
See also SIP6821.0, SIP6722.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2996-92-1](既) 3-2635
TSCA EC 221-066-9 HMIS: 3-2-1-X
100g ¥5,000
2kg ¥35,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALPR

C9H14O3Si

SILICONSi

COMMERCIAL

Improves photoresist adhesion to silicon nitride
Electron donor component of polyolefin polymerization catalyst complexes
Effective treatment for organic-grafted clays.1
Phenylates allyl benzoates.2

18kg ¥210,000

337

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.064

1.47340.872

1.4908

SIP6822.1

O

PHENYLTRIMETHOXYSILANE, 99+%Si

198.29C9H14O3Si

O

211°(-25°)
Flashpoint: 86°C (187°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 221-066-9 HMIS: 3-2-1-X

O

100g ¥14,600[2996-92-1]

SIP6823.0

PHENYLTRIMETHYLSILANE

150.30169-70°Viscosity: 1.1 cSt
Flashpoint: 40°C (104°F)
Dipole moment: 0.44 debye
Used to silylate and determine acid number of hydroxyl groups in aluminosilicate.1
1. Song, W. et al. J. Am. Chem. Soc. 2003, 125, 13964.
See also GEP6806, SIT6997.2, SIT8043.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[768-32-1]
TSCA EC 212-192-5 HMIS: 2-2-0-X
25g ¥18,800
C9H14SiOOFSi

SIP6824.0

1-PHENYL-1-TRIMETHYLSILOXYETHYLENE

192.33

C11H16OSiSi

Undergoes cross-aldol condensation with ketones.1
1. Organic Synthesis; Wiley & Sons: New York; 1993; Collect. Vol. 8, 323.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13735-81-4]
HMIS: 2-2-1-X

O

53-4° / 1
Flashpoint: 78°C (172°F)

0.938

1.50200.961

1.51930.942

1.439628

5g ¥17,200

SIP6824.6

1-PHENYL-3-TRIMETHYLSILYL-2-PROPYN-1-OL

204.34

C12H16OSi

Si
OH
H

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X

330.68C12H26O3Si4

O

Si

O
Si
H

H

Crosslinker for vinylphenylsilicone 2-component elastomers
See also SID4582.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18027-45-7]
TSCA EC 241-940-3 HMIS: 2-2-1-X

91° / 2
Flashpoint: 87°C (189°F)

25g ¥13,000

100g ¥35,000

COMMERCIALPHENYLTRIS(DIMETHYLSILOXY)SILANE

Si

10g ¥49,600[89530-43-7]

SIP6826.0

Si
O

Flashpoint: >110°C (>230°F)

2kg ¥203,000

SIP6826.5

NO

PHENYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95

O
Si

C18H29N3O3Si

NO

363.53

Neutral cross-linker for condensation cure silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34036-80-1]
TSCA
HMIS: 3-2-1-X

PR

N

60-5° / 3Flashpoint: >61°C (>142°F)
50g ¥8,800

0.995

250g ¥25,800

SIP6827.0

PHENYLTRIS(TRIMETHYLSILOXY)SILANE

Si

O

Si

TRIS(TRIMETHYLSILOXY)PHENYLSILANE, PHENYLTRIMETHICONEC15H32O3Si4
372.76Si

O

Si

Viscosity, -40˚: 20 cSt
Viscosity, 20˚: 3.8 cSt
Surface tension: 27.2 mN/m

264-6°(-102°)
0.924
Flashpoint: 127°C (261°F)
TOXICITY: oral rat, LDLo: >34,500 mg/kg
Autoignition temperature: 430˚C
Vapor pressure, 105°: 1 mm

See also SIP6736.2, SIO6715.7
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2116-84-9](既) 7-474
TSCA EC 218-320-6 HMIS: 1-1-0-X

100g ¥8,800

1kg ¥38,800

1.436825

10kg ¥265,000

PHENYLVINYLDICHLOROSILANE - see SIV9092.0 VINYLPHENYLDICHLOROSILANE

SIP6827.7

PHLOGOPITEMAGNESIUM MICA
KMg3[AlO(SiO3)3](F,OH)

Crystal structure image
courtesy of webmineral.com

338(>1,500°)
Particle size: <74 μm
Mohs Hardness: 2.0-2.5
3
Typical bulk density, not compacted: 0.28 g/cm
Monoclinic prismatic
Specific heat: 0.88 J/g/˚Transparent amber prismatic coarse platey crystals
Employed in flat films, accoustical deadening, electrical insulation, coatings
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12251-00-2]
TSCA-E
HMIS: 1-0-0-X
100g ¥8,500
5kg ¥36,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

2.8

1.53

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIP6828.0

PHTHALOCYANATODICHLOROSILANE, tech-90

DICHLORO(29H,31H-PHTHALOCYANATO)SILICON
C32H16Cl2N8Si

611.52λmax: 702 nm
1
Forms stacked phthalocyanines.
1. Anderson, A. et al. J. Am. Chem. Soc. 1985, 107, 192.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[19333-10-9]
TSCA EC 242-969-4 HMIS: 2-1-0-X
1.0g ¥20,400(430° sub.)5g ¥71,300

PINANE DERIVATIVES - see SID4074.0 (DIMETHYLCHLOROSILYL)METHYL-7,7-DIMETHYLNORPINANE

SIP6828.4
O
Si

C10H24N2O2Si

232.40Adhesion promoter for metal substrates
Comonomer for silicones
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[128996-12-3]
HMIS: 3-2-1-X

95-7° / 2Flashpoint: 123°C (253°F)

0.99

1.462825

OO
F

N[3-(1-PIPERAZINYL)PROPYL]METHYLDIMETHOXYSILANE

O

HN

25g ¥16,200

SIP6828.6(N-PIPERIDINO)TRIMETHYLSILANE
1-TRIMETHYLSILYLPIPERIDINE
C8H19NSI

157.33
Dipole moment: 0.95 debye
pKa: 18.81
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3768-56-7]
TSCA EC 233-198-2 HMIS: 3-3-1-X

160-1°

0.832

1.442310g ¥25,700

SIP6829.2

PLATINUM CARBONYL CYCLOVINYLMETHYLSILOXANE COMPLEXOSSKO CATALYSTC8H18OPtSi2∙CO

1.02

Pt0.CO.(CH2=CH(Me)SiO)4 1.85 - 2.1% platinum concentration in vinylmethylcyclic siloxanes

Catalyst for Si-H addition to olefins; silicone vinyl addition cure catalyst
Employed in elevated temperature curing silicones
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[73018-55-0]
TSCA
HMIS: 2-2-0-X

5g ¥19,400

25g ¥67,100

SIP6830.3

PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEXKARSTEDT CATALYSTC24H54O3Pt2Si6

474.680.98

3-3.5% platinum concentration in vinyl terminated polydimethylsiloxane, 200 cSt
Complex is Pt[O(SiMe2CH=CH2)2]1.5
Neutral catalyst for Si-H addition to olefins, silicone vinyl addition cure catalyst
Employed in room temperature curing silicones
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68478-92-2]
TSCA EC 270-844-4 HMIS: 2-2-0-X

5g ¥16,400

25g ¥55,400

SIP6831.2

PR

PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene
KARSTEDT CATALYSTC24H54O3Pt2Si6

474.68Flashpoint: 38°C (100°F)

2.1-2.4% platinum concentration
Hot catalyst employed in room temperature curing silicones
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68478-92-2]
TSCA EC 270-844-4 HMIS: 2-3-0-X

CH3

CH3 CH3

Si

O

Pt

Si

5g ¥19,400

0.8852COMPOUNDSSiSILICONN

1.495425g ¥67,100

SIP6831.2LC

CH3 PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene, LOW COLOR
KARSTEDT CATALYSTC24H54O3Pt2Si6

474.680.89

Flashpoint: 38°C (100°F)

2.0 - 2.2% platinum concentration
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68478-92-2]
TSCA EC 270-844-4 HMIS: 2-3-0-X

10g ¥45,900

SIP6832.2

PLATINUM-CYCLOVINYLMETHYLSILOXANE COMPLEXASHBY-KARSTEDT CATALYST

1.02

2.0 - 2.3% platinum concentration in cyclic methylvinylsiloxanes
Neutral catalyst for Si-H additions to olefins
Silicone vinyl addition cure catalyst employed in moderately elevated temperature curing silicones
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68585-32-0]
TSCA EC 271-555-6 HMIS: 2-2-0-X
5g ¥18,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

25g ¥59,100

www.gelest.com

339

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.845

1.43442.67

1.3991

SIP6833.2

PLATINUM-OCTANAL/OCTANOL COMPLEXLAMOREAUX CATALYSTO
0.
Pt CH(CH2)6CH3

F
K+ F

Flashpoint: 81°C (178°F)

2 - 2.5% platinum concentration in octanol
Catalyst for Si-H additions to olefins
Silicone vinyl addition cure catalyst
Increases flammability resistance of silicones
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[68412-56-6]
TSCA EC 270-195-7 HMIS: 2-2-0-X

F

POTASSIUM HEXAFLUOROSILICATEF

25g ¥50,100

F6K2Si

劇物

220.29Solubility in water: 17 deg : 1.2 g/l
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[16871-90-2]
TSCA EC 240-896-2 HMIS: 2-0-0-X

dec.
TOXICITY: oral gpg, LD50: 500 mg/kg

O
O
F

Si-- F K+
F

5g ¥15,100

SIP6885.0500g ¥13,000

SIP6890.0

POTASSIUM HEXAMETHYLDISILAZIDE, 11% in toluene, 0.5M
POTASSIUM BIS(TRIMETHYLSILYL)AMIDE
C6H18KNSi2

Si
K

N
Si

199.49(194-5°)Flashpoint: 4°C (39°F)

0.877

Review of synthetic utility.
Sterically hindered base.2
Anionic initiator for preparation of polyalkylene oxides.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 432-453.
2. Es-Sayed, M. et al. Synlett 1992, 12, 962.
3. Yokoyama, M. Bioconjugate Chem. 1992, 3, 275.
F&F: Vol. 4, p 407; Vol. 10, p 38, p 326; Vol. 13, p 257; Vol. 16, p 282.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[40949-94-8]
HMIS: 3-4-1-X
400g ¥37,200
2kg ¥126,500
1

SIP6890.1

K

N
Si

OH
K+ -O

Si

POTASSIUM BIS(TRIMETHYLSILYL)AMIDE
C6H18KNSi2

K+ O -

199.490.898

Flashpoint: -14°C (7°F)

Sterically hindered base.1
1. Es-Sayed, M. et al. Synlett 1992, 12, 962.
F&F: Vol. 4, p 407; Vol. 10, p 38, p 326; Vol. 13, p 257; Vol. 16, p 282.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[40949-94-8]
HMIS: 3-4-1-X
400g ¥23,400

2kg ¥79,800

SIP6898.0

POTASSIUM METHYLSILICONATE, 40% in water

132.23
pH: 13
Aqueous water repellent concentrate for impregnation of mineral-based construction materials.1
1. Sinica, M. et al. Materials Science (Medziagotyra) 2007, 13, 229.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[31795-24-1]
TSCA
HMIS: 3-0-0-X
500g ¥13,000

1.29

CH5KO3Si

PR

OH

POTASSIUM HEXAMETHYLDISILAZIDE, 20% in THF

SIP6898.5

POTASSIUM PHENYLDIMETHYLSILANOLATE, 95%
C8H11KOSi

Si

190.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

10g ¥32,600

SIP6899.0

POTASSIUM TRIETHYLSILANOLATE, 95%
C6H15KOSi

K+ -O

340

Si

170.37

Soluble: methylene chloride, THF
Reagent for cross-coupling reactions - greater solubility, reactivity than KOSiMe3
Used as a nucleophiles in the enantioselective formation of allyl alcohols from allyl carbonates.1
Employed in an inexpensive vinylation of aryl bromides.2
Catalyst for the cross-coupling of aryl and vinylsilanes.3
1. Lyothier, I. et al. Angew. Chem., Int. Ed. Engl. 2006, 45, 6204.
2. Denmark, S. E.; Butler, C.R. J. Am. Chem. Soc. 2008, 130, 3690.
3. Jeffery, T. Tetrahedron Lett. 1999, 40, 1673.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[25706-33-6]
HMIS: 3-2-1-X
10g ¥19,400

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

50g ¥67,100

www.gelest.com

COMMERCIALSiEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIP6901.0

POTASSIUM TRIMETHYLSILANOLATE, tech-95

128.29Contains potassium hydroxide, hexamethyldisiloxane
Initiates silicone (cyclic siloxane) polymerizations.
Cleaves esters under non-aqueous conditions.1
Catalyzes fluoride-free, silicon-based cross-coupling reactions.2
Converts difluorobenzenes to fluorophenols.3
Catalyst for the cross-coupling of aryl and vinylsilanes.4
1. Laganis, E. et al. Tetrahedron Lett. 1984, 25, 5831.
2. Denmark, S. E.; Regens, C. S. Accts. Chem. Res. 2008, 41, 1486.
3. Li, J. et al. Synlett 2009, 633.
4. Jeffery, T. Tetrahedron Lett. 1999, 40, 1673.
F&F: Vol. 12, p 414.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[10519-96-7]
TSCA EC 234-062-7 HMIS: 3-2-1-X(134-8° dec.)

C3H9KOSi

K+ -O

Si

25g ¥14,600

100g ¥39,500

K+ -O

O
O
F

SIP6901.2

POTASSIUM TRIMETHYLSILANOLATE, 2M in tetrahydrofuran

128.2926-29 wgt %; contains <5% methanol
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[10519-96-7]
TSCA EC 234-062-7 HMIS: 3-4-1-X
C3H9KOSiSi

0.91

Flashpoint: -14°C (7°F)
25g ¥8,800

2kg ¥90,900

SIP6902.0

POTASSIUM VINYLDIMETHYLSILANOLATE, tech-90
C4H9KOSiSi

140.30(> 130˚C dec.)
Flashpoint: >110°C (>230°F)

Initiates silicone (cyclic siloxane) polymerizations
Soluble: THF
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥18,300

COMPOUNDS

K+ -O

SIP6902.1

Si

Pr

N

PRASEODYMIUM TRIS(HEXAMETHYLDISILAZIDE)

Si

N

Si

622.0788-90° / 10-4
Color: light green
Precursor for 15-21 k dielectric films.1
1. Kukli, K. et al. Chem Mater. 2004, 16, 5162.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35789-00-5]
HMIS: 3-2-1-X
5g ¥81,400
C18H54N3PrSi6Si

Si(154-7°)PRASEODYMIUM ZIRCONIUM SILICATE
Pr0.25Zr1.75Si2O8 (approx.)

Particle size 15-22 µm; bright yellow color
Spinel structure
Ceramic pigment
Undergoes color change (whitens) when pulsed with Nd:YAG laser (532 nm, 240 mJ).1
1. Gugger, H. et al. Eur. Pat. Appl. EP 1987-810049, 1987.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[68187-15-5]
TSCA EC 269-075-7 HMIS: 2-0-0-X
25g ¥14,600(>1,250°)

SILICON

SIP6902.2

PR

Si

N

4.5

SIP6902.4

PROPARGYLOXY-t-BUTYLDIMETHYLSILANEO

C9H18OSiSi

170.32

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76782-82-6]
HMIS: 4-3-1-X

40° / 8

0.84

1.429

0.833

1.40900.990

1.4461255g ¥19,900

SIP6903.0

PROPARGYLOXYTRIMETHYLSILANE

O-TRIMETHYLSILYLPROPARGYL ALCOHOL
C6H12OSiO

Si

128.25110-1°
Flashpoint: 27°C (81°F)
TOXICITY: oral rat, LD50: 650 mg/kg

Reagent for the preparation of 1,4-dienes1, 4-en-1-ynes.2
Sonogashira cross-coupling would yield silyl-protected propargyl alcohol derivatives.3
1. Knochel, P. et al. J. Organomet. Chem. 1986, 309, 1.
2. Mesnard, D. et al. J. Organomet. Chem. 1991, 420, 163.
3. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5582-62-7](既) 2-2959
TSCA EC 226-981-7 HMIS: 3-3-1-X
25g ¥25,700

SIP6902.6

O
O

O
N
H

Si
O

O

O-(PROPARGYL)-N-(TRIETHOXYSILYLPROPYL) CARBAMATE, 90%
C13H25NO5Si
303.43110-20° / 0.2
Inhibited with MEHQ
Flashpoint: 95°C (203°F)
1
Surface derivatization reagent enabling “click” chemistry of nanoparticles.
1. Achatz, D. et al. Sensors and Actuators B 2010, 150, 211.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[870987-68-1]
HMIS: 2-2-1-X
25g ¥24,100

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

341

Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.05931.43950.72

1.4061

SIP6904.0

Cl

1-PROPENYLMETHYLDICHLOROSILANE, 95%

155.10124-7°
Flashpoint: 28°C (82°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18142-37-5]
HMIS: 3-3-1-X
2.5g ¥45,900
C4H8Cl2Si

Si
Cl

SIP6905.0

2-PROPENYLTRIMETHYLSILANE, 95%
ISOPROPENYLTRIMETHYLSILANE
C6H14SiSi

114.2683°
Flashpoint: -12°C (10°F)

For introduction of the 2-propenyl group via cross-coupling.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18163-07-0]
HMIS: 2-4-0-X

Si

n-PROPYLDIMETHYLCHLOROSILANE

O
O
F

Cl

5g ¥46,900

SIP6910.0

136.70113-4°
Flashpoint: 10°C (50°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17477-29-1](既) 2-2041
TSCA EC 241-492-9 HMIS: 3-4-1-X
25g ¥16,400
C5H13ClSi

0.8726

1.4138100g ¥45,600

SIP6910.3

n-PROPYLDIMETHYL(DIMETHYLAMINO)SILANE

NSi

C7H19NSiO

Si

145.32135-8°

0.767

Volatile capping, hydrophobizing agent for nanoparticles
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[77303-23-2]
HMIS: 3-3-1-X
25g ¥59,100

SIP6911.0

n-PROPYLDIMETHYLMETHOXYSILANE

132.280.787

1.392725

1.027

1.425

0.86891.3931

123-4°
1.185
Flashpoint: 35°C (95°F)
Vapor pressure, 16°: 10 mm
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[141-57-1](既) 2-2041
TSCA EC 205-489-6 HMIS: 3-3-1-X
25g ¥3,600
2.5kg ¥66,000

1.4290C6H16OSi

94-6°

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18182-14-4]
HMIS: 3-3-1-X

10g ¥25,200

SIP6912.0

Cln-PROPYLMETHYLDICHLOROSILANE

157.11125°
Viscosity, 20°: 0.8 cSt
Flashpoint: 27°C (81°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4518-94-9](既) 2-2041
TSCA EC 224-843-0 HMIS: 3-3-1-X
25g ¥14,300
C4H10Cl2Si

Si
Cl100g ¥39,000

SIP6914.0

n-PROPYLMETHYLDIMETHOXYSILANE

O

148.28

C6H16O2Si

Si

126°

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18173-73-4]
HMIS: 3-3-1-X

O

25g ¥26,300

SIP6915.0

n-PROPYLTRICHLOROSILANE

Si

Cl

177.53C3H7Cl3Si

PR

Cl

ΔHvap: 36.4 kJ/mole

COMMERCIALCl

SIP6917.0

n-PROPYLTRIETHOXYSILANE

O

Si

O

206.36

C9H22O3Si

179-80°Flashpoint: 57°C (135°F)

0.8916

Architectural masonry water repellant
Surface modifier for TiO2 particles that improves dispersibility but does not reduce photocatalytic activity.1
1. Ukaji, E. et al. Appl. Surf. Sci. 2007, 254, 563.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2550-02-9](既) 2-2052
TSCA EC 219-842-7 HMIS: 2-2-1-X
25g ¥3,400
2kg ¥46,000

1.395616kg ¥184,000

SIP6917.2

PROPYLTRIETHOXYSILANE, oligomeric hydrolysate

O

O

Si

O

n

342

Viscosity: 25-40 cSt
Reactive hydrophobic surface treatment with reduced volatile by-products
See also SIO6715.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[314270-00-3]
TSCA
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.03

100g ¥6,700(215) 547-1015

www.gelest.com

1.4243

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIP6918.0

n-PROPYLTRIMETHOXYSILANE

Si

164.27

C6H16O3SiO

γc of treated surface: 28.5 mN/mDonor in Zeigler-Natta polymerization catalyst systems for polyolefins
Hydrophobic surface treatment
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1067-25-0](既) 2-2052
TSCA EC 213-926-7 HMIS: 3-3-1-XO

142°
0.93225
Flashpoint: 34°C (93°F)
TOXICITY: oral rat, LD50: 7,420 mg/kg

25g ¥3,400

2kg ¥36,000

1.3880COMMERCIAL

O

16kg ¥165,000

SIP6921.0

Si

PROPYLTRIS(TRIMETHYLSILOXY)SILANE

O

O

Si

338.74234-7°
Viscosity: 2 cSt
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[60111-46-8]
HMIS: 1-2-0-X
100g ¥25,700
C12H34O3Si4

Si

O

O
O
F

Si

PROPYNYLTRIMETHYLSILANE - see SIT8606.5 1-TRIMETHYLSILYLPROPYNE

SIP6923.0

104-5° / 18
Flashpoint: 71°C (160F)
Allylates ketones and aldehydes in the absence of palladium catalysis. Source for other 2- pyridyl allylsilanes.1
Extensive review on the use in silicon-based cross-coupling reactions.2
1. Kamei, T. et al. Org. Lett. 2005, 7, 4725.
2. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[118722-54-6]
HMIS: 3-2-1-X store <5°C
2.5g ¥52,200

Si

SIP6926.2

O

Si

S
N

3-(2-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANE

O

O

Si

O

N

1.089

1.498

301.48160-2° / 0.2
1.09
pKa: 4.8
Immobilizable ligand for immunoglobulin lgG separation using hydrophobic charge induction chromatography (HCIC)HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[198567-47-4]
HMIS: 3-2-1-X
10g ¥36,300

1.5037

C13H23NO3SSi

301.48HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[29098-72-4]
HMIS: 3-2-1-X

156-7° / 0.25

10g ¥34,700

SIP6926.4

OS

1.5046COMPOUNDS

177.32

C10H15NSi

3-(4-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANEO

C13H23NO3SSi

SIP6928.0

2-(4-PYRIDYLETHYL)TRIETHOXYSILANE

N

Si

O

PR

O

269.43105° / 0.9
Amber liquid
Forms self-assembled layers which can be “nano-shaved” by scanning AFM.1
1. Rosa, L. et al. Mater. Lett.2009, 63, 961.
See also SIP6930.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[98299-74-2]
HMIS: 3-2-1-X
10g ¥35,000
C13H23NO3Si

O

1.00

1.462424

1.06

1.4755SILICON(2-PYRIDYL)ALLYLDIMETHYLSILANE, 90%

N

SIP6930.0

2-(2-PYRIDYLETHYL)TRIMETHOXYSILANE

O

N

Si

O

2-(TRIMETHOXYSILYLETHYL)PYRIDINEC10H17NO3Si

O

227.33

See also SIP6928.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[27326-65-4]
HMIS: 3-1-1-X

105° / 0.3
Flashpoint: >110°C (>230°F)
10g ¥16,400

50g ¥55,400

SIP6932.0

2-PYRIDYLTRIETHOXYSILANE

O

O

Si

O

N

C11H19NO3Si

241.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[213602-91-6]
HMIS: 2-2-1-X

5g ¥42,700

SIP6934.0

3-PYRIDYLTRIETHOXYSILANE

O

O

Si
O
N

C11H19NO3Si

241.36

Extensive review on the use in silicon-based cross-coupling reactions.1
1. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[129663-08-7]
HMIS: 2-2-1-X
2.5g ¥53,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

343

Name

Mw

bp °C/mm

151.2874° / 21

(mp °C)

D420

nD20

0.91125

1.48852.84

1.54

SIP6942.0

2-PYRIDYLTRIMETHYLSILANE
C8H13NSiN

Undergoes facile cross-coupling reactions
Useful as a hydroxymethyl synthon.1
Extensive review on the use in silicon-based cross-coupling reactions.2
1. Itami, K. et al. J. Org. Chem. 2001, 66, 3970.
2. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[13737-04-7]
HMIS: 3-2-1-X
5g ¥42,200

Si

SIP6943.0

PYROPHYLLITE

360.31
Particle Size: <24 μm
Mohs Hardness: 1.5-2.0
3
Typical bulk density, not compacted: 0.40 g/cm
Triclinic pinacoidal
Brown green, fine grain, foliated platy cleavage, alumina source, high internal surface area
Used in refractories, ceramics, adsorbent, plastics, rubber, cement, anti-caking agent
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12269-78-2]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

OOF

Al2(Si4O10)(OH)2

Crystal structure image
courtesy of webmineral.com

6kg ¥43,500

QUARTZ, - see SIS6964.0 SILICON DIOXIDE, crystalline
QUATS - see SID3392.0, SIO6620.0, SIS6994.0, SIT7090.0, SIT8395.0, SIT8405.0, SIT8412.0, SIT8414.0, SIT8415.0
QUININE SILANE - see SIT8192.4 (R)-N-TRIETHOXYSILYLPROPYL-O-QUININEURETHANERHENIUM V11 OXIDE TRIMETHYLSILOXIDE - see SIT8598.0 TRIMETHYLSILYLPERRHENATE

Si
Si

N

SIS6943.4

N
Sm

Si

SAMARIUM TRIS(HEXAMETHYLDISILAZIDE)

Si

631.52

C18H54N3Si6Sm

N

83-4° / 1x10-4 sub.

(93-105°)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35789-01-6]
HMIS: 3-2-1-X
1.0g ¥42,700

Si

Si

SIS6944.0

3-(4-SEMICARBAZIDYL)PROPYLTRIETHOXYSILANE, tech-95

O
H2N

N
H

C10H25N3O4Si

O
N
H

Si
O

O

279.41

Employed in immobilization of oligonucleotides.
1. Podyminogin, M. et al. Nucleic Acids Res. 2001, 29, 5090.
See also SIO6708.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[106868-88-6]
HMIS: 3-1-1-X
1Flashpoint: >110°C (>230°F)

1.08

1.45932.0

1.52

5g ¥52,800

SIS6948.0
SEPIOLITE

613.82
Particle Size: <35 μm
Mohs Hardness: 2.0
Typical bulk density, not compacted: 0.35 g/cm3
Orthorhombic
Surface Area: 300 m2/g
Unit cell structure 50% larger than Attapulgite, elongate crystal
Exhibits sorptive properties, used as desiccant, pharmaceuticals adjuvant
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[63800-37-3]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600
Mg4Si6O15∙6H2O

PR

Crystal structure image
courtesy of webmineral.com

6kg ¥37,600

SILACROWN - see SID4220.4 TO SID4221.0

Reference Compound 9
SILANE

H

Si

32.12
-112°
(-185°)
0.680-185
Viscosity of gas, 25˚C: 116 micropoise
TOXICITY: ihl rat, LC50: 9,600 ppm/4H
ΔHform: -34 kJ/mole
Vapor pressure, -118°: 530 mm
ΔHvap: 12.39 kJ/mole
Critical temperature: -3.5˚CHeat capacity, 25˚: 42.86 kJ/mole
Critical pressure: 47.8 atm
Bond dissociation energy: 377 kJ/mole
Flammability limit, lower: 1.37%
Reference compound. Data is provided for investigators. Gelest offers silane as mixtures with argon (SIS6950.1) and nitrogen(SIS6950.4)
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[7803-62-5]
TSCA EC 232-263-4 HMIS: 3-4-3-X
H4Si

H

H

H

SIS6950.1

SILANE, 7.0 - 7.5% in argon

H

H

Si
H

344

32.12
-112°
WARNING: PYROPHORIC - MAY FORM EXPLOSIVE MIXTURES WITH AIR
SURFACE TRANSPORT ONLY - UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
H4Si

H(-185°)

0.680-185

Employed in epitaxial deposition of silicon
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[7803-62-5]
TSCA EC 232-263-4 HMIS: 3-4-3-X
100g inquire* includes gas dispensing cylinder zCYL-HPA-6000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420(-185°)

0.680-185

nD20

SIS6950.4

SILANE, 7.0 - 7.5% in nitrogen

H
H

32.12
-112°
WARNING: PYROPHORIC - MAY FORM EXPLOSIVE MIXTURES WITH AIR
SURFACE TRANSPORT ONLY - UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
H4Si

Si

H

Employed in epitaxial deposition of silicon
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[7803-62-5]
TSCA EC 232-263-4 HMIS: 3-4-3-X
100g inquire* includes gas dispensing cylinder zCYL-HPA-6000

H

SIS6951.0

1-SILA-3-CYCLOPENTENE, tech-95
3-SILOLENE
C4H8Si

Si
H

84.19

69-70°HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[7049-25-4]
HMIS: 2-4-1-X store <5°C

H

0.848

1.46582.5g ¥52,200

O
O
F

3-SILAPENTANE - see SID3410.0 DIETHYLSILANE

SIS6952.0

O
R

SIS6955.0

SILICON, 99% powder

28.0862,680°(1,420°)2.330
Particle size: <75 μm (-200 mesh)
Critical temperature: 4,920˚C
ΔHcomb: 28.5 kJ/g-atom
Critical pressure: 1,450 atm
ΔHfus: 46.5 kJ/g-atomSpecific heat, 25˚: 0.678 J/g/˚
ΔHsub: 377 kJ/g-atom
Thermal conductivity: 0.84 J/sec/cm2/°C/cm
ΔHvap: 297 J/moleElectronegativity: 1.8
Atomic number: 14
Van der Waal’s radius: 1.7ÅDielectric constant: 12
Covalent radius: 1.11Å
Electron mobility, 27˚: 1,300 cm2/volt-sec
Lattice constant:, 25˚: 5.429 x 10-8
Hole mobility, 27˚: 500 cm2/volt-sec
Young’s modulus: 10,890 kg/mm2
Hardness: 7.0 moh; 48 shore
Electrical conductivity: 0.1 microohms-1
Intrinsic resistivity: 0.23 megaohm
Relative abundance-28Si: 92.21%; 29Si: 4.70%; 30Si: 3.096%
Silicon composes 27.7% of the earth’s crust
The need for silicon in mammalian nutrition has been established
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7440-21-3]
TSCA EC 231-130-8 HMIS: 1-3-0-X
250g ¥15,000
SiSi

COMPOUNDS

O

0.88
Amber liquidFlashpoint: 25°C (77°F)
Coefficient of friction of treated glass surface: 0.2 - 0.3
Surface resistivity of treated surface: 1.2 x 1013 ohms
γc of treated glass surface: 31 mN/mR
For application information see Gelest Performance Products Brochure
Reduces blood protein adsorption.1
Anti-stiction coating for polysilicon.2
1. Arkles, B. et al. In Silanes Surfaces & Interfaces; Leyden, D., Ed; Gordon & Breach: 1986; p 91.
2. Almanza-Workman, A. et al. J. Electrochem. Soc. 2002, 149, H6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[39443-39-5]
TSCA
HMIS: 2-3-1-X
100g ¥8,800
1.5kg ¥54,000
15kg ¥213,000

PR

16

Si

Octadecyl functional silane, 20% in t-butanol/diacetone alcohol

COMMERCIALO

SILICLAD®

SILICONR

W-SI-76-0.4

SILICON WAFER
Si

76 mm (3 inch) x 3 mm (0.125 inch)
Orientation: <100>
UndopedSingle side polished
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7440-21-3]
TSCA EC 231-130-8 HMIS: 0-0-0-X
5 wafers ¥80,400

W-SIN-76-0.4

SILICON WAFER

Si

Si

76 mm (3 inch) x 3 mm (0.125 inch)
Resistivity: 0.01 Ω-cm
N-doped (phosphorus)
Orientation: <100>
Single side polished
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7440-21-3]
TSCA EC 231-130-8 HMIS: 0-0-0-X
Each ¥51,200

W-SIP-76-0.4

SILICON WAFER

Si

Si

76 mm (3 inch) x 3 mm (0.125 inch)
Resistivity: 0.01 Ω-cm
P-doped (boron)
Orientation: <100>
Single side polished
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7440-21-3]
TSCA EC 231-130-8 HMIS: 0-0-0-X
Each ¥45,900

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

345

Name

Mw

bp °C/mm(mp °C)

D420

nD20

40.10
(2,700°)35-60μ (~200-450 mesh equivalent)
Hardness, Mohs: 9.5
ΔHform: -109 kJ/mole
Dielectric constant: 9.7-10.2
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[409-21-2](既) 7-174
TSCA EC 206-991-8 HMIS: 1-0-0-X
250g ¥10,200

3.23

2.65

60.09
(1,610°)2.20
76 mm (3 inch) x 3 mm (0.125 inch)
Resistivity: 1014 Ω-cm
Both sides polished
Hardness, Mohs: 6
Fused quartz
Suitable substrate for coupling agent treatments and immobilization studies
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7631-86-9]
TSCA EC 231-545-4 HMIS: 0-0-0-X
Each ¥20,400
5 wafers ¥71,100

1.4585

SIS6959.0

SILICON CARBIDE, powder

SiC

CSi

W-SIO-76-03

SILICON DIOXIDE WAFER
SiO2SILICON DIOXIDE, amorphous

OH

OH

OH

OH

OH

OH

60.09

Ultimate particle size: 12 - 20 nm
Surface area: 200 m2/g
Isoelectric point: 2.2

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
TSCA
HMIS: 2-0-0-X(>1,600°)
TOXICITY: oral rat, LD50: 8,160 mg/kg
γc: 44 mN/m
Bulk density: ~50 g/l
pH, (4% aqueous slurry): 3.5-4.5
500g ¥9,600[112945-52-5]

2.2

1.46

2.2

1.46

2.2

1.45

2.2

1.45

COMMERCIALOH

COMMERCIAL

Fumed silica
SiO2

OH

COMMERCIAL

OH

O
O
F

SIS6960.0OH

2kg ¥29,000

SIS6961.0

Fumed silica, D4 treated
SiO2

60.09
Ultimate particle size: 20 nm
2
Surface area: 300 m /g
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[68583-49-3]/[7631-86-9]
TSCA EC 271-514-2 HMIS: 2-0-0-X

Bulk density: ~50 g/l(>1,600°)

500g ¥14,900

COMMERCIAL

SILICON DIOXIDE, amorphous, OCTAMETHYLCYCLOTETRASILOXANE TREATED

2kg ¥42,100

SIS6962.0

SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
Fumed silica, HMDZ treated
SiO2

60.09

Ultimate particle size: 20 nm
Surface area: 150-200 m2/g(>1,600°)
Carbon content: 3%
Calculated ratio: (CH3)3Si/HO-Si: 2/1= (CH3)3Si- = trimethylsilyl group

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
TSCA EC 272-697-1 HMIS: 2-0-0-X[68909-20-6]/[7631-86-9]500g ¥17,300

2kg ¥50,000

SIS6962.1M30

SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED

PR

Fumed silica, HMDZ treated
SiO2

60.09

Ultimate particle size: 20 nm
Surface area: 150-200 m2/g(>1,600°)
Carbon content: 2-3%
Calculated ratio: (CH3)3Si/HO-Si: 1/1= (CH3)3Si- = trimethylsilyl group

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
TSCA EC 272-697-1 HMIS: 2-0-0-X[68909-20-6]/[7631-86-9]500g ¥15,200

2kg ¥42,600

SIS6962.1N30

SILICON DIOXIDE, amorphous, CYCLIC AZASILANE/HEXAMETHYLDISILAZANE TREATED
SiO2
60.09
(>1,600°)
2.2
1.45
Ultimate particle size: 20 nm
Carbon content: 4-7%
2
Surface area: 150-200 m /g
Calculated ratio: CH3NHCH2CH2CH2Si/(CH3)3Si/HO-Si:
1/2/1
NH-CH3= CH3NHCH2CH2CH2Si(CH3)2

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
TSCA
HMIS: 2-0-0-X

500g ¥33,700

SIS6963.0

SILICON DIOXIDE, amorphous GEL, 30% in isopropanol

SiO2

346

COLLOIDAL SILICA in isopropanol
SiO2

60.09
Particle size: 10 nm
Viscosity: 3-20 cSt.
HYDROLYTIC SENSITIVITY: 6: forms irreversible hydrate[112926-00-8]
TSCA
HMIS: 2-3-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

0.9725Flashpoint: 12°C (54°F)
500g ¥25,200(215) 547-1015

2.5kg ¥92,800

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIS6963.2

SILICON DIOXIDE, amorphous GEL, 15% in water
COLLOIDAL SILICA
SiO2

60.09
Particle size, average: 4-5 nm
pH: 9.1
2
Surface area: 600-650 m /g
Ammonium stabilizing counterion
For preparation of silica catalytic supports
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[7631-86-9](既) 1-548
TSCA EC 231-545-4 HMIS: 3-0-0-X
1kg ¥14,400

SiO2

1.29

4kg ¥46,000

SIS6963.4

SILICON DIOXIDE, amorphous GEL, 40% in water
COLLOIDAL SILICA
SiO2

60.09
Particle size, average: 20-22 nm
pH: 9.1
Surface area: 135-150 m2/g
Ammonium stabilizing counterion
For preparation of silica catalytic supports
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[7631-86-9](既) 1-548
TSCA EC 231-545-4 HMIS: 3-0-0-X
1kg ¥11,200

O
O
F

SiO2

1.29

4kg ¥35,700

SIS6964.0

SILICON DIOXIDE, crystalline

1.540

SIS6964.4

SILICON DIOXIDE, fused

SiO2

SYNTHETIC
SiO2

60.09
(1,585°)
Particle Size: <55 μm; amorphous glass
Mohs Hardness: 5.5-6.5
Coefficient of Thermal Expansion, 5˚C - 35˚C: 0.52 ppm/K
Clear, transparent, exceptional transmittance
Used in high energy laser optics, optical fibers, photolithography, filler for electronic composites
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[60676-86-0](既) 1-548
TSCA-E
HMIS: 1-0-0-X
500g ¥12,000

2.203

1.45

SIS6966.0

60.09
200-400 mesh (35-70 μm)
pH, (5% aqueous slurry): 6.7-7.3
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[7631-86-9]
TSCA EC 231-545-4 HMIS: 1-0-0-X
SiO2

PR

SiO2

SILICON DIOXIDE, precipitated

SiS2

Pore size: 150 Å
Surface area: 300 m2/g
500g ¥30,000

COMPOUNDS

Crystal structure image
courtesy of webmineral.com

60.09
2,230°(1,610°)2.65
Particle Size: <10 μm
TOXICITY: oral rat, LD50: 3,160 mg/kg
3
Typical bulk density, not compacted: 0.24 g/cm
Mohs Hardness: 7.0
ΔHform: -858 kJ/mole
Trigonal trapezohedral
Isoelectric point: 2.2
Dielectric constant: 3.8-5.4
Clear, transparent cryptocrystalline
Employed in abrasives, filtration, refractories, ceramics
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[7631-86-9](既) 1-548
TSCA EC 231-545-4 HMIS: 1-0-0-X
500g ¥7,200
10kg ¥47,000

SILICONQUARTZ POWDER
SiO2SIS6967.0

SILICON DISULFIDE, 95%
S2Si

92.21

1,090° sub.

2.02

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13759-10-9]
TSCA EC 237-344-8 HMIS: 3-3-1-X
10g ¥55,400

SILICONE OIL - See CONVENTIONAL SILICONE FLUIDS in Polymer Section

SIS6968.0

SILICON HEXABORIDE

SiB6

B6Si

92.95

(1,950°)
Thermal conductivity: 9 W/m˚CElectrical conductivity: 6.5 ohm-cm

High temperature ceramic
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[12008-29-6]
TSCA EC 234-535-8 HMIS: 2-1-0-X

2.430

25g ¥35,300

SIS6970.0

SILICON MONOXIDE

SiO

44.08
(1,880°)2.13
2-6 μm powder
Coefficient of thermal expansion: 4.6 x10-6
ΔHform: -5.9 kJ/mole
ΔHvap: 320.6 kJ/mole
Evaporation at 1,000 - 1,400˚ at 2 X 10-6 mm gives near IR anti-reflective coatings
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[10097-28-6](既) 1-814
TSCA EC 233-232-8 HMIS: 1-0-0-X
25g ¥15,600
OSi

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.98

347

Name

Mw

bp °C/mm(mp °C)

D420(1,900°)

3.44

nD20

SIS6972.0

SILICON NITRIDE, powder140.280.5-1.0 μm powder
Dielectric constant: 6.1
Primarily α-phase
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12033-89-5](既) 1-493
TSCA EC 234-796-8 HMIS: 1-0-0-X
N4Si3

Si3N4

25g ¥13,000

SILICON TETRAACETATE - see SIT6998.0 TETRAACETOXYSILANE
SILICON TETRABROMIDE - see SIT7050.0 TETRABROMOSILANE
SILICON TETRACHLORIDE - see SIT7085.0 TETRACHLOROSILANE

SIS6975.0

SILLIMANITE

162.05

Al2SiO5

3.24

Mohs Hardness: 7.0
Orthorhombic dipyramidal

1.65

O
O
F

Particle Size: <44 μm

Crystal structure image
courtesy of webmineral.com

Brownish green, acicular crystals
Alimina & silica source, used in refractories, advanced ceramics, metallurgy, abrasives
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1332-58-7]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600

10kg ¥44,000

SILOXENE - see SIC2054.0 CALCIUM SILICIDESIS6977.0

SODIUM ALLYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran

Na+ -OC5H11NaOSi

138.22

Flashpoint: -14°C (7°F)
Extensive review on the use in silicon-based cross-coupling reactions.1
1. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
HMIS: 2-4-1-X
10g ¥51,200

Si

SIS6980.0

SODIUM BIS(TRIMETHYLSILYL)AMIDE, 95%
N-SODIOHEXAMETHYLDISILAZANE
C6H18NNaSi2

Na

N-

Si

183.37202° / 1-2(165-7°)

Soluble: hexane, toluene, ether, THF
Review of synthetic utility.1
Reacts with allyl chloride in toluene to form cyclopropene.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 468-478.
2. Binger, P. et al. Org. Synth. 1999, 77, 254.
F&F: Vol. 1, p 1046; Vol. 3, p 261; Vol. 6, p 442; Vol. 7, p 329; Vol. 12, p 441, p 446; Vol. 16, p 307; Vol. 21, p 401.
See also SIS6980.2
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1070-89-9]
TSCA EC 213-983-8 HMIS: 3-3-1-X
50g ¥35,300+

Si

SIS6980.2

SODIUM BIS(TRIMETHYLSILYL)AMIDE, 2M in tetrahydrofuranN-O

Na+ -O

183.370.90

Flashpoint: -14°C (7°F)

Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 468-478.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1070-89-9]
TSCA EC 213-983-8 HMIS: 3-4-1-X
100g ¥13,000
2kg ¥136,000
16kg ¥484,000

Si

PR

Si

C6H18NNaSi2

SIS6980.6

SODIUM (2-FURYL)DIMETHYLSILANOLATEC6H9NaO2Si

Si

164.24HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[879904-88-8]
HMIS: 3-3-1-X(65-80°)10g ¥49,900

SIS6981.0

F

Na+

Si--

F

F

SODIUM HEXAFLUOROSILICATEF

F6Na2Si

F

Na+

F

348

Component in aluminum etching solutions
Solubility in water: 6.5 g/l
See also SIP6885.0
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[16893-85-9]
TSCA EC 240-934-8 HMIS: 3-0-0-X

TOXICITY: oral rat, LD50: 125 mg/kg

25g ¥7,400

2.679500g ¥12,500

SODIUM METASILICATEDISODIUM TRIOXOSILICATE(Na2O3Si)nO

O- Na+

188.06

SIS6982.0

O- Na+

Si

劇物

n122.06

Solubility in water, 30˚: 270 g/l
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[6834-92-0] (既) 1-508
TSCA EC 229-912-9 HMIS: 1-0-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(1,088°)TOXICITY: oral rat, LD50: 1,280 mg/kg
500g ¥8,800(215) 547-1015

3kg ¥28,400

www.gelest.com

2.4

1.3120COMMERCIALNa+Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIS6983.0
Na+ -O

SODIUM (4-METHYLPHENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
C9H13NaOSi
188.27

Si

Cross-coupling reagent
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
HMIS: 2-4-1-X

10g ¥35,300

SIS6984.0

SODIUM METHYLSILICONATE, 30% in water
-

O Na

+

OH

116.12
Viscosity: 10 cSt.
pH: 13.0
Forms economical water-repellent coatings
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[16589-43-8]
TSCA EC 240-648-3 HMIS: 3-0-0-X

COMMERCIAL

OH
Si

Flashpoint: -14°C (7°F)

1.24

CH5NaO3Si

100g ¥6,600

2.5kg ¥26,000

20kg ¥164,000

OOF

SIS6985.0

SODIUM MONTMORILLONITE CLAY

BENTONITE(Na,0.5Ca)0.7(AL,Mg,Fe)4(Si,Al)8O20(OH)4∙XH2O

Particle size <24 μm
Mohs hardness: 1.5-2.0
Typical bulk density, not compacted: 0.48 g/cm3
Surface area: >750 m2/g
Pillared, interlayered clay - may be exfoliated for composite and catalyst applications.1
1. Gil, A. et al. Catal. Rev. 2000, 42, 145.
See also SIH5840.2, SIM6470.7
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1318-93-0]
TSCA-E EC 215-288-5 HMIS: 1-0-0-X
100g ¥6,600

2kg ¥25,600

Si

O- Na+SODIUM ORTHOSILICATE, tech-90

184.04

Na4O4Si(1,018°)Disproportionates to metasilicate and sodium hydroxide
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[13472-30-5]
TSCA EC 236-741-3 HMIS: 3-0-0-X store <5°C

500g ¥23,600

SIS6986.1

SODIUM PHENYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
C8H11NaOSi
174.25(87-94°)neat
Flashpoint: -14°C (7°F)

HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate
HMIS: 2-4-1-X

10g ¥27,300[7646-75-5]

SIS6987.0

SODIUM (2-THIENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
C6H9NaOSSi
180.31S

Na+ -O

Sodium silanolate generated “in-situ”.1

t

Br

Si

SiMe2OHPRS

Bu3PPd+Flashpoint: -14°C (7°F)

Cl

PdPtBu3(2.5 mol%)

NaH, toluene, 50°

EtO2C

67%

1. Denmark, S. E.; Baird, J. D. Org. Lett. 2006, 8, 793.
HYDROLYTIC SENSITIVITY: 5: forms reversible hydrate[879904-87-7]
HMIS: 2-4-1-X

S

EtO2C

COMPOUNDS

Na+

Si

10kg ¥101,000

SIS6986.0

O-

O- Na+
Na+ -O

1.48

SILICON

Na+ -O

2.3

10g ¥49,900

SIS6988.0

SODIUM TRIMETHYLSILANOLATE, 96%
C3H9NaOSi

Na+ -OSi

112.18(147-150° dec.)

Used as a weak base for alkylation of phenols.1
Directly generates amines from carboxylic acids in a modified Curtius reaction.2
Important promoter for silicon-based cross-coupling reactions.3
1. Houpis, N. et al. Org. Lett. 2005, 7, 1947.
2. Ma, B.; Lee, C-W. Tetrahedron Lett. 2010, 51, 385.
3. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
See also SIP6901.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18027-10-6]
TSCA EC 241-939-8 HMIS: 3-1-0-X
25g ¥19,900
100g ¥57,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

349

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIS6988.5

SPODUMENE

LITHIUM ALUMINUM SILICATEAlLiO7Si2

202.09Particle Size: <74 μm
Mohs Hardness: 6.5-7.0
3
Typical bulk density, not compacted: 1.20 g/cm
Monoclinic prismaticWhite, prismatic crystals
Upon heating converts to eucryptite w/ negative thermal expansion coefficient: -8.5 x10-6
Lowers melt temperature of glasses and glazes
See also SIL6465.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12068-40-5]
TSCA EC 235-098-6 HMIS: 1-0-0-X
250g ¥11,600

Crystal structure image
courtesy of webmineral.com

2.650

SIS6988.6

STAUROLITE

811.89Particle Size: <74 μm
Mohs Hardness: 7.0-7.5
Monoclinic prismatic
Dark brown, short prismatic crystals, rough surfaces
Applications include: airblast abrasive, coatings, primers
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12182-56-8]
TSCA-E
HMIS: 1-0-0-X
500g ¥9,600
10kg ¥49,200

3.7

1.74

O
O
F

Fe1.4Li0.1Mg0.1Al8.6Si3.9Al0.1O21.7(OH)2.4

Crystal structure image
courtesy of webmineral.com

SIS6990.0

STYRYLETHYLTRIMETHOXYSILANE, tech-90
C13H20O3Si

OSi

Inhibited with t-butyl catecholOO

252.3898° / 0.1
1.02
Flashpoint: 97°C (207°F)
Copolymerization parameter, e,Q: -0.880, 1.500

Mixed m-, p-isomers and α-, β-isomers
Contains ethylphenethyltrimethoxysilane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[119181-19-0]/[52783-38-7]
TSCA-E
HMIS: 2-1-1-X store <5°C

10g ¥21,500

50g ¥75,600

SIS6993.0

H
N

N
H

O

Si
O

O

3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE, 40% in methanol
C17H30N2O3Si
338.52
Inhibited with BHT
Flashpoint: 11°C (52°F)
Coupling agent for unsaturated polyesters
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34937-00-3]
TSCA EC 252-297-3 HMIS: 3-4-1-X store <5°C
25g ¥9,300

N
H2

O

Si

100g ¥22,500

サイラエース S350
3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE HYDROCHLORIDE, 40% in methanol
C17H31ClN2O3Si
374.98Inhibited with BHT
Flashpoint: 11°C (52°F)
Viscosity: 2.3 cSt
Specific wetting surface area: 208 m2/g
Coupling agent for phenolic and epoxy fiberglass laminates (printed circuit boards)
See also SIS6989.0
サイラエース S350 100ml ¥4,900
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34937-00-3](既) 3-3387
TSCA EC 252-297-3 HMIS: 3-4-1-X store <5°C
25g inquire
2kg inquire

1.39002kg ¥97,800

PR

O

O

NH+ Cl-OOO(STYRYLMETHYL)BIS(TRIETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 40% in ethanol
C27H52ClNO6Si2
578.34
Inhibited with BHT, mixed m-, p-isomers
Flashpoint: 15°C (59°F)
Dipodal quaternary coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X store <5°C
25g ¥11,900

0.909

100g ¥31,000

O(STYRYLMETHYLENEOXY)TRIMETHYLSILANE - see SIV9061.0 (m,p-VINYLBENZYLOXY)TRIMETHYLSILANESTYRYLOXY(t-BUTYLDIMETHYL)SILANE - see SIB1941.0 p-(t-BUTYLDIMETHYLSILOXY)STYRENE

SIS6995.0

O

O

Si

11

O

350

O

11-(SUCCINIMIDYLOXY)UNDECYLDIMETHYLETHOXYSILANE, 95%
C19H37NO4Si
371.59
Reagent for immobilization of proteins via primary amines
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

195-200° / 0.6(28°)

1.0g ¥59,100(215) 547-1015

1.395

1L ¥9,300
15kg inquire

SIS6989.0

O

Si

0.91

www.gelest.com

COMMERCIAL

O

Si

0.871

SIS6994.0

Cl-

H
N

N

1.505

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420(2,200°)

9.14

nD20

SIT6996.0

TANTALUM SILICIDE, 99.9+%

TaSi2

237.12
Powder, average particle size: 10 μm
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12039-79-1]
TSCA EC 234-902-2 HMIS: 2-1-0-X
Si2Ta

10g ¥16,200

TAS-FLUORIDE - see SIT8715.0 TRIS(DIMETHYLAMINO)SULFUR(TRIMETHYLSILYL)DIFLUORIDE, 95%
TEOS - see SIT7110.0 TETRAETHOXYSILANE

Si

N

SIT6997.0
N
Tb

Si

TERBIUM TRIS(HEXAMETHYLDISILAZIDE)Si

C18H54N3Si6Tb
N

640.09(162-5°)

See also SIT6943.4
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[109433-86-5]
HMIS: 3-2-1-X
1.0g ¥48,000

Si

Si

O
O
F

Si

SIT6997.2

m-TERPHENYL-5’-YLTRIMETHYLSILANESi

C21H22Si

302.48(79-80°)HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[128388-53-4]
HMIS: 1-1-0-X
1.0g ¥38,500

SIT6998.0

O

O

Si

O

O
O

SILICON TETRAACETATE
C8H12O8Si

264.26

Decomposes rapidly above 175° to SiO2 and Ac2O
See also SID2790.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[562-90-3](既) 2-293
TSCA EC 209-239-7 HMIS: 2-1-1-X

148° / 6(111-5°)Flashpoint: >110°C (>230°F)

25g ¥13,500

100g ¥36,300

SIT7010.0

TETRAALLYLOXYSILANE

O

Si

114-6° / 12Flashpoint: 82°C (180°F)
Forms linear and branched carbosiloxane dendrimers by hydrosilylation/alcoholysis cycles.1
1. Bruning, K. et al. Synthesis 1999, 1931.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1067-43-2]
TSCA EC 213-930-9 HMIS: 3-2-1-X
10g ¥17,800
C12H20O4Si

OO

O

256.370.982

1.43360.83451.486450g ¥60,700

SIT7020.0

TETRAALLYLSILANE
C12H20Si

Si

192.3791° / 10
Flashpoint: 77°C (171°F)

PR

Starting point for dendrimer synthesis.1,2
1. Van der Made, A. et al. Adv. Mater. 1993, 5, 466.
2. Alonso, B. et al. J. Chem. Soc., Chem. Commun. 1994, 2575.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1112-66-9]
HMIS: 2-2-0-X

5g ¥21,700

SILICONOOCOMPOUNDSTETRAACETOXYSILANE, 95%O25g ¥76,600

SIT7050.0

TETRABROMOSILANE

Br

Br

Si

Br

Br

SILICON TETRABROMIDE
Br4Si

347.70154°(5°)
ΔHform: -297 kJ/mole
Vapor pressure, 0˚: 1.8 mm
ΔHvap: 37.9 kJ/mole
Critical temperature: 383˚C
Surface tension: 16.9 mN/m
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7789-66-4]
TSCA EC 232-182-4 HMIS: 3-1-2-X
10g ¥17,200

2.77225

1.5627320.54115° / 3(<-80°)
0.899
Viscosity: 2.33 cSt
Flashpoint: 78°C (172°F)
ΔHvap: 61.9 kJ/moleSpecific heat: 1.55 J/g/°
Dipole moment: 1.61 debye
Dielectric constant, 100 Hz: 2.92
Surface tension: 22.8 mN/m
Used in preparation of mesoporous silica spheres by surfactant templated synthesis.1
1. Huo, Q. et al. Chem. Mater. 1997, 9, 14.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4766-57-8](既) 2-2048
TSCA EC 225-305-8 HMIS: 2-2-0-X
100g ¥14,100500g ¥47,000

1.4128

SIT7062.0

TETRA-n-BUTOXYSILANETETRABUTYLORTHOSILICATEC16H36O4Si

O

O

Si
O

O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

351

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.799

1.4465

SIT7082.0

TETRA-n-BUTYLSILANE

256.55

C16H36Si

Viscosity: 10 cSt

Si

230-3°(-56°)
Flashpoint: 75°C (167°F)
Vapor pressure, 120°: 2 mm

See also SIM6559.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[994-79-6]
TSCA EC 213-621-9 HMIS: 2-2-0-X

100g ¥72,400

SIT7084.0

Cl Cl

H

25g ¥24,700

Si

1,1,3,3-TETRACHLORO-1,3-DISILABUTANE, tech-90

228.05
166-7°
Contains pentachloro-1,3-disilabutane
Flashpoint: 42°C (108°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[148859-49-8]
HMIS: 3-3-1-X
10g ¥23,600

Cl

1.32

C2H6Cl4Si2

SiCl

SIT7085.0

OOF

TETRACHLOROSILANE, 98%
SILICON TETRACHLORIDE
Cl4Si

169.90

Cl
Cl

Si

Cl

Cl

O

Ar

Ar

+

SiCl4

1.4153

COMMERCIAL

57.6°(-70°)
1.481
TOXICITY: ihl rat, LD50: 8,000 ppm/4H
Vapor pressure, 20°: 194 mm
Critical temperature: 234°C
Critical pressure: 37.0 atm
ΔHfus: 45.2 J/g
Coefficient of thermal expansion: 1.1 x 10-3
Specific heat: 0.84 J/g/˚
Reaction with living alkali metal terminated polymers results in star polymers
Primary industrial use - combustion with hydrogen and air to give fumed silica
Enantioselectively opens stilbine epoxides to trichlorosilylated chlorohydrins.1
Promotes the reaction of aldehydes with isocyanides.2
Viscosity: 0.35 cSt
ΔHform: -640 kJ/mole
ΔHvap: 31.8 kJ/mole
Surface tension: 19.7 mN/mDielectric constant: 2.40

OSiCl3

catalyst

Ar

Ar

Cl

1. Tao, B. et al. J. Am. Chem. Soc. 2001, 123, 353.
2. Denmark, S. E.; Fan, Y. J. Am. Chem. Soc. 2003, 125, 7825.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10026-04-7](既) 1-258
TSCA EC 233-054-0 HMIS: 3-0-2-X
25g ¥3,400*
2.5kg ¥36,500*
25kg ¥197,000*** includes solid fluoropolymer cap** requires zCYL-S-99 cylinder or zDR-S-09 stainless steel pail

SIT7085.1

Cl

TETRACHLOROSILANE, 99.99%

Si

169.90

Cl4Si

Cl

57.6°

(-70°)

1.481

1.4153

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10026-04-7]
TSCA EC 233-054-0 HMIS: 3-0-2-X
50g ¥97,000*
5kg ¥438,000*** includes zCYL-HPS-0050** includes stainless steel liquid dispensing cylinder zCYL-S-004

Cl

PR

SIT7087.0

1,1,3,3-TETRACYCLOPENTYLDICHLORODISILOXANE
C20H36Cl2OSi2OSi

419.58reagent for protection of 3’,5’ nucleosides
See also SIT7273.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[865811-56-9]
HMIS: 3-1-1-X

Si

Cl Cl

220° / 15g ¥20,700

1.087

1.50980.89101.39480.878

1.39711.00

1.457525g ¥72,400

SIT7089.0

Si

O

Si

O

Si

O

Si

O

TETRADECAMETHYLHEXASILOXANE

Si

Si

O

13

Cl

Si
13

Cl

MD4M
C14H42O5Si6

459.02245-6°(-59°)
Viscosity: 2.63 cSt
Flashpoint: 75°C (167°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[107-52-8]
TSCA EC 203-499-5 HMIS: 1-2-0-X
10g ¥23,600

SIT7090.0

O

ClN+

352

Si

O

O

TETRADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 50% in methanol
C22H50ClNO3Si
440.18
Contains 3-5% Cl(CH2)3Si(OMe)3
Flashpoint: 11°C (52°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[41591-87-1]
TSCA EC 255-451-8 HMIS: 3-4-0-X
25g ¥17,800

SIT7093.0

TETRADECYLTRICHLOROSILANE
C14H29Cl3Si

Cl

331.83

155-6° / 3

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18402-22-7](既) 2-2041
TSCA
HMIS: 3-1-1-X
25g ¥28,900

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALClEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.953

1.3912

169°(-77°)
0.9335Flashpoint: 46°C (115°F)
TOXICITY: oral rat, LD50: 6,270 mg/kg
Autoignition temperature: 260°C
Vapor pressure, 20°: 11.8 mm
Vapor pressure, 60°: 12 mm
Vapor pressure, 108°: 200 mm
Critical temperature: 616°C
Coefficient of thermal expansion: 1.1 x 10-3
Coefficient of thermal conductivity: 4.0

1.3818

SIT7095.0
OOSi

1,1,3,3-TETRAETHOXY-1,3-DIMETHYLDISILOXANE, 95%O
Si

C10H26O5Si2

OO

282.48HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 241-915-7 HMIS: 3-2-1-X[18001-60-0]

205°Flashpoint: 58°C (136°F)
25g ¥22,500

SIT7110.0

TETRAETHOXYSILANE, 98%

SiO

TEOS forms low density
insulating aerogels

TEOS forms low density insulating aerogels
Source by hydrolysis of SiO2 and sol-gel derived glasses.1
Intermediate for silica spheres with controlled dimensions.2
1. Brinker, C. et al. Sol-Gel Science; Academic Press: 1990.
2. Stöber, W. et al. J. Coll. Interface Sci. 1968, 26, 62.
See also polydiethoxysiloxane - PSI-021, GET7100
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[78-10-4](既) 2-2048
TSCA EC 201-083-8 HMIS: 2-2-1-X

100g ¥3,400

3kg ¥17,000

COMMERCIAL

O
O
F

O

17kg ¥120,000

COMPOUNDS

O

208.33

28-9% SiO2 equivalent
Viscosity: 0.8 cSt
ΔHvap: 46.0 kJ/mole
Dipole moment: 1.63 debye
Vapor viscosity, 60˚: 60 micropoise
Dielectric constant: 4.1
Solubility parameter: 7.87
Specific heat: 2.30 J/g/˚

SIT7110.2

TETRAETHOXYSILANE, 99.9+%

O

208.33
Low metal impurities grade
Intermediate for high purity SiO2 by oxygen plasma CVD and sol-gel
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[78-10-4](既) 2-2048
TSCA EC 201-083-8 HMIS: 2-2-1-X
C8H20O4Si

O
Si

O

O

169°
Flashpoint: 46°C (115°F)
500g ¥11,600

0.93351.38183kg ¥54,000

SIT7110.3

TETRAETHOXYSILANE, oligomeric hydrolysate

O

Si

O

O

n

H

650 - 800
Metal content: 20.5-21.5% Si (40-42% SiO2 equivalent)
Viscosity: 3-5 cSt
Base for zinc-rich paints
Crosslinker for two-component condensation cure (silanol) RTVs
See also SIT7510.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68412-37-3]
TSCA
HMIS: 2-2-1-X

HSi

1,3,5,7-TETRAETHYLCYCLOTETRASILOXANE, 95%

O

Si

Si

O

100g ¥4,800

2kg ¥19,000

1.398

18kg ¥143,000

SIT7112.0

PRO

1.05-1.07

O

Si

H

H

296.61
Contains other cyclics
ΔHcomb: 8,028 kJ/mole
ΔHform: 2,043 kJ/mole
Cyclic monomer - undergoes hydrosilylation reactions
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[16066-10-7]
HMIS: 2-2-1-X

0.981

1.4141144.33
153-5°(-82°)
0.762
Viscosity: 0.9 cSt
Flashpoint: 32°C (90°F)
ΔHcomb: -6,685 kJ/mole
Autoignition temperature: 235˚C
ΔHform: -172 kJ/mole
ΔHvap: 41.4 kJ/mole
Silicon dopant for n-type GaN thin films.1
1. Obuci, Y. et al. J. Cryst. Growth 1997, 170, 325.
See also SIE4901.5
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[631-36-7]
TSCA EC 211-155-0 HMIS: 2-3-0-X
10g ¥17,200
50g ¥58,600

1.4246

C8H24O4Si4

105° / 20

COMMERCIALETHYLSILICATE 40, POLY(DIETHOXYSILANE)[(C2H5O)2SiO]O

SILICONTETRAETHYLORTHOSILICATE; TEOS
C8H20O4SiO

25g ¥38,500

SIT7115.0

TETRAETHYLSILANE
C8H20Si

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

353

Name

Mw

bp °C/mm(mp °C)

104.08-95.7°(-90°)D420

nD20

SIT7120.0

TETRAFLUOROSILANE

SILICON TETRAFLUORIDE
F4Si
AIR TRANSPORT FORBIDDEN

F
F

Si

ΔHform: -1,616 kJ/mole
ΔHvap: 22.2 kJ/moleF

1.66-95

TOXICITY: ihl rat, LC50: 2,272 ppm/4hours/3days
Vapor pressure, -100°: 515 mm
Vapor density, 1 atm, 0°C: 4.67 g/l
Critical temperature: -14.15˚C
Critical pressure: 37.3 atm

F

F&F: Vol. 12, p 466.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7783-61-1](既) 1-343
TSCA EC 232-015-5 HMIS: 4-0-2-X
50g inquire* includes gas dispensing cylinder zCYL-G-2400

SIT7120.1

FSi

104.08

F4Si

F-95.7°(-90°)

1.66-95OOF

F

TETRAFLUOROSILANE, 99.99+%
AIR TRANSPORT FORBIDDENHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents(既) 1-343
TSCA
HMIS: 4-0-2-X
25g inquire* includes gas dispensing cylinder zCYL-HPS-0420

F[7783-61-1]

SIT7122.3

OO

3-(O-TETRAHYDROFURFURYL)CARBAMOYLPROPYLTRIETHOXYSILANE
C15H31NO6Si
349.50

O

O

Si

N
H

O

O

Reagent for “PEG-free” hydrophilic surface modification
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

1.05325

1.449525

25g ¥21,500

SIT7122.4

Si

O

O

O

Si

O

Si

3-(TETRAHYDROFURFURYLOXYPROPYL)HEPTAMETHYLTRISILOXANE
C15H36O4Si3
364.70Viscosity: 5 cSt

132-6° / 2
0.925025
Flashpoint: >110°C (>230°F)
Surface tension: 23.8 mN/m
Surface tension, 0.1% aqueous solution: 42 mN/m

1.42625

Silicone surfactant
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1361237-41-3]
HMIS: 1-2-0-X
100g ¥19,900

SIT7122.6

TETRAHYDROFURFURYLOXYPROPYLTRIETHOXYSILANE

O
O

O

O

Si

O

306.47

Reagent for “PEG-free” hydrophilic surface modification
See also SIT7122.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 1-2-1-XSi

535.70287-8°(120-1°)
4.198
ΔHform: -189.5 kJ/mole
ΔHfus: -29 kJ/mole
UV absorption max: 284 nm
May be reduced to silicon metal.1
Reacts with NH3 <500° to form SiN.2
1. Szekely,G. J. Electrochem. Soc. 1957, 104, 663.
2. Kaloyeros, A. et al. Chemical Aspects of Electronic Ceramic Processing MRS Proc 1998, 495.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13465-84-4](既) 1-746
TSCA EC 236-706-2 HMIS: 3-2-2-X
10g ¥30,500
50g ¥111,700

PR
N

C

N

O

O

N

Si

10g ¥28,900

I4Si

Tetraiodosilane can be ignitedin air forming SiO2 and purple
iodine vapors

C

0.990

TETRAIODOSILANE

I

I

O

130° / 0.3

SIT7123.0

I
I

C14H30O5Si

C

N

C

O

SIT7125.0

TETRAISOCYANATOSILANE

196.16
186°(25-6°)
ΔHvap: 54.0 kJ/moleFlashpoint: 50°C (122°F)
1
Forms hydrogen free films by CVD with trialkylamines.
1. Uchida, Y. et al. Mater. Res. Soc. Symp. Proc. (Amorphous Thin Films) 2001, 446.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3410-77-3](既) 1-1157
EC 222-297-8 HMIS: 3-2-1-X
10g ¥40,600
C4N4O4Si

1.442

1.46100.8772

1.3895

SIT7271.0

TETRAISOPROPOXYSILANE

O

O

Si
O

354

264.44
ΔHvap: 48,974 kJ/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1992-48-9](既) 2-2048
TSCA EC 217-875-1 HMIS: 2-2-1-X
C12H28O4Si

O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

185-6°
Flashpoint: 58°C (136°F)
25g ¥38,500(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.986

1.4543

SIT7273.0

1,1,3,3-TETRAISOPROPYL-1,3-DICHLORODISILOXANE
C12H28Cl2OSi2Si

120° / 1.5
Flashpoint: 76°C (169°F)

Review of synthetic utility.1
Reagent for protection of 3’,5’ hydroxy nucleosides.2,3
Key review in natural products synthesis.4
Protects the four equatorial hydroxyls of inositol in a single step.5
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 230-233.
2. Kanaya, E. N. et al. Biochemistry 1987, 26, 7159.
3. Markiewicz, W. J. Chem. Res. 1979, 24.
4. Ziegler, T. et al. Trends Org. Chem. 1997, 6, 91.
5. Martin-Lomas, M. et al. Eur. J. Org. Chem. 2000, 1539.
F&F: Vol. 16, p 125.
See also SIT7087.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[69304-37-6](既) 2-3942
HMIS: 3-2-1-X
5g ¥9,400
25g ¥45,600
750g ¥307,000

O
O
F

Cl

COMMERCIAL

O

Si

Cl

315.43

SIT7274.0SiH

1,1,3,3-TETRAISOPROPYLDISILOXANE

O

Si

246.54

C12H30OSi2

H

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-2-1-X[18043-71-5]

122-4° / 45
Flashpoint: 68°C (154°F)
5g ¥14,600

0.831

1.432725g ¥46,900

4

Si

C32H68O12Si

672.97

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[254455-63-5]
HMIS: 2-1-0-X

257° / 0.1

1.018

25g ¥21,700

SIT7276.0

TETRAKIS(DIMETHYLAMINO)SILANE
C8H24N4Si

N
N

Si

N

N

H

Si
O

Si

Si

Si

O

O

Si

0.88511.4436

188-90°Flashpoint: 67°C (153°F)

0.886

1.3841

H

1.02

1.422

SIT7278.0

TETRAKIS(DIMETHYLSILOXY)SILANE

3,3-BIS(DIMETHYLSILOXY)-1,1,5,5-TETRAMETHYLTRISILOXANE
C8H28O4Si5
328.73

Viscosity: 1.1 cSt
Crosslinker for vinyl functional silicones.1
1. Ando. T. et al. Polymer Gels and Networks 1993, 1, 45.
See also SID4582.0, SIP6826.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[17082-47-2]
TSCA
HMIS: 2-2-1-X

PR

H

74-5° / 19
(16°)
Flashpoint: 34°C (93°F)

Undergoes transamination reactions
Reacts with chromophores to form NLO active hybrid organic-inorganics.1
1. Kakkar, A. et al. J. Am. Chem. Soc. 1999, 121, 3657.
See also SIT8714.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1624-01-7]
TSCA EC 216-611-2 HMIS: 4-3-1-X
25g ¥52,200

HO

204.3925g ¥14,100

SILICONO

3

TETRAKIS(BUTOXYETHOXYETHOXY)SILANE, tech-95

O

COMPOUNDS

SIT7275.0O100g ¥37,900

SIT7281.0

1,3,5,7-TETRAKIS(2-DIPHENYLPHOSPHINOETHYL)TETRAMETHYLCYCLOTETRASILOXANE, 95%
C60H68O4P4Si4
1089.46

P

O

Si

P

Si

O

O

See also SIB1091.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[124998-64-7]
HMIS: 2-1-0-X
1.0g ¥59,100

P

Si
O

Si

P

SIT7282.0

TETRAKIS(ETHOXYETHOXY)SILANE, tech-95

O

O

O

O

O

Si

O

O

O

384.54
Contains tris(ethoxyethoxy)ethoxysilane
Viscosity: 5 cSt
Soluble in water-alcohol combinations, slowly hydrolyzing to SiO2
See also SIT7286.0, SIT7288.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18407-94-8](既) 2-2049
TSCA EC 242-287-7 HMIS: 2-1-0-X
C16H36O8Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

200° / 0.1
Flashpoint: 131°C (268°F)

50g ¥8,500(215) 547-1015

250g ¥24,700

www.gelest.com

355

Name

Mw

bp °C/mm(mp °C)

D420

nD20

194° / 1(<-73°)
0.880
Flashpoint: 188°C (370°F)
TOXICITY: oral rat, LD50: >22,000 mg/kg
Autoignition temperature: 304°C
Vapor pressure, 245°: 10 mm
Specific heat: 2.01 J/g/°
Coefficient of thermal expansion: 0.8 x 10-3

1.4388

SIT7283.0

TETRAKIS(2-ETHYLHEXOXY)SILANE

544.97
Viscosity, -40˚: 310 cSt
Viscosity, 25˚: 10.3 cSt
Viscosity, 38˚: 6.89 cSt
ΔHvap: 70.7 kJ/mole
Dielectric constant: 2.46
Surface tension: 26.7 mN/m
Suitable for extreme low temperature hydraulic fluid in sealed systems
See also SIT7291.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[115-82-2](既) 2-2048
TSCA EC 204-109-6 HMIS: 1-1-0-X
C32H68O4Si

O
O

Si

O

O

OH

Si

272.33
1.23
Viscosity: 800-1,200 cSt
Flashpoint: >110°C (>230°F)
Name is for nominal structure - contains cyclic and bridged species, ~ 5% ethoxy esters
Forms hierarchically organized hybrid silica monoliths.1
1. Hüsing, N. 13th Sol-Gel Workshop Proc. 2005, 18.
OH HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17622-94-5]
TSCA EC 241-598-5 HMIS: 3-1-1-X
25g ¥11,100
100g ¥28,400

O

O

HO

TETRAKIS(2-HYDROXYETHOXY)SILANE, tech 90
THES
C8H20O8Si

O
O

500g ¥38,500

1.454

O
O
F

HO

100g ¥11,900

SIT7283.5

SIT7285.0

OTETRAKIS(METHOXYETHOXYETHOXY)SILANE, tech-95

O

O

4

Si

C20H44O12Si

504.65HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 246-406-3 HMIS: 2-1-0-X[24685-89-0]

O

O

O

O

TETRAKIS(1-METHOXY-2-PROPOXY)SILANE, tech-95
C16H36O8Si

O
O

Si

O

O

O

1.079

1.4219100g ¥19,400

179-82° / 10
Flashpoint: 118°C (244°F)

100g ¥10,900

2.5kg ¥69,700

18kg ¥242,000

SIT7288.0

OO

328.43
Contains tris(methoxyethoxy)ethoxysilane
Viscosity: 4.9 cSt
Crosslinker for condensation cure silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2157-45-1](既) 2-2049
TSCA EC 218-470-2 HMIS: 3-1-0-X
C12H28O8Si

Si

1.4395

O

384.54HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA
HMIS: 1-2-0-X[18407-95-9]158° / 1
Flashpoint: >110°C (>230°F)

1.01

50g ¥15,600

SIT7289.0

O

Si

PR

N

TETRAKIS(METHYLETHYLKETOXIMINO)SILANE (50% in toluene)
C16H32N4O4Si
372.55

4

Crosslinker/adhesion promoter for moisture-cure silicones RTVs
See also SIT7290.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34206-40-1]
TSCA EC 251-882-0 HMIS: 3-4-1-X

0.938

Flashpoint: 4°C (39°F)

100g ¥16,200

SIT7290.0

TETRAKIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-90
C24H48N4O4Si

N

O

Si

4

C10H21

356

O

O

C8H17

Si

Crosslinker for moisture-cure silicone RTVs
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[156145-62-9]
TSCA
HMIS: 2-2-1-X(16-22°)0.950
Flashpoint: >65°C (>150°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 304˚C

1.456825g ¥14,600

SIT7291.0

C8H17

C10H21484.76

C8H17

O

O

TETRAKIS(2-OCTYLDODECYLOXY)SILANE, tech-95

ISOEICOSYLSILICATEC10H21 C80H164O4Si
1218.23>150° / 1
Viscosity: 100-110 cSt
Flashpoint: >110°C (>230°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions
C8H17[161395-68-5]
HMIS: 1-1-1-X
25g ¥16,400

0.863

C10H21

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.457

COMMERCIALTETRAKIS(METHOXYETHOXY)SILANE, tech-95

O
O

1.090

SIT7286.0OO

245° / 1
Flashpoint: 238°C (460°F)

Enabling Your Technology
Name
Si

TETRAKIS(2-TRICHLOROSILYLETHYL)SILANE, 95%

Cl

Si

Si

Cl

Cl

Cl

Si
Cl

C8H16Cl12Si5

Cl
Si

Cl
Cl

bp °C/mm(mp °C)

678.08165-95° / 0.2(49-51°)

D420

nD20

SIT7292.0

Cl
Cl

Mw

Cl

12 point terminator for living polymers, yielding star polymers
Nucleus for star gels.1
1. Sharp, K. Adv. Mater. 1998, 10, 1243
See also SIT8716.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[67776-46-9]
HMIS: 3-1-1-X
5g ¥46,900

Cl

Si

Cl
Cl

Si

Si

Cl
Cl

Cl

Cl

F

F

O

O
O

F
F

O

Si

O
Si

TETRAKIS(TRIFLUOROACETOXY)SILANE, tech-95

F

O

F

O

F

O

O
F

F
F

Si

565.86190° / 15 sub.

(>300° dec.)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[50350-62-4]
TSCA-L
HMIS: 3-2-1-X
5g ¥51,200

SIT7295.0

F
F

DODECACHLORONEOPENTASILANE
Cl12Si5

C8F12O8Si

480.15H-free SiO2 precursor
See also SIT7125.0 TETRAISOCYANATOSILANEHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2377-86-8]
HMIS: 3-1-1-X

25g ¥38,500

GET7296

O
Ge
O

Si
O
Si

TETRAKIS(TRIMETHYLSILOXY)GERMANE

429.35

C12H36GeO4Si475-80° / 4

Catalyst for polyester
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18766-53-5]
HMIS: 1-2-0-X(-62 to -59°)

0.967

1.40150.868

1.38950.900

1.42782.5g ¥44,500

SIT7298.0

TETRAKIS(TRIMETHYLSILOXY)SILANE

Si
O
Si

O
Si
O

Si
O
Si

M4Q
C12H36O4Si5

384.84

Viscosity: 2.9 cSt
Dipole moment: 1.10 debye

222°(-60°)
Flashpoint: 80°C (176°F)
Vapor pressure, 100°: 2 mm
Vapor pressure, 125°: 40 mm

Inert, volatile vehicle
See also SIM6592.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[3555-47-3]
TSCA EC 222-613-4 HMIS: 1-2-0-X

25g ¥16,200

100g ¥44,800

SIT7305.0

TETRAKIS(TRIMETHYLSILOXY)TITANIUM
TITANIUM TRIMETHYLSILOXIDEC12H36O4Si4Ti

PR
Si

O

Si

Ti
O

Si

O

Si

O

Si

O

Partial hydrolysis gives soluble polymer.1
Catalyst for condensation cure silicones.2
1. Bradley, D. et al. Can. J. Chem. 1963, 41, 629.
2. Buehler, F. A. U.S. Patent 3,235,495, 1966.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15990-66-6]
HMIS: 2-2-1-X

Si

110° / 10
Flashpoint: 51°C (124°F)

25g ¥14,600

100g ¥39,500

SIT7306.0

O

Zr
O

Si

Si

O

TETRAKIS(TRIMETHYLSILOXY)ZIRCONIUMTETRAKIS(TRIMETHYLSILOXY)ZIRCONIUM
C12H36O4Si4Zr

447.98HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

Si

Si

C

Si

404.66COMPOUNDSSiTETRAKIS(TRICHLOROSILYL)SILANECl

SILICON

Si

Cl

SIT7294.0

Cl

O
O
F

Cl

Cl

Cl

Si

135° / 0.1(150-2°)10g ¥39,500

SIT7307.0

TETRAKIS(TRIMETHYLSILYL)ALLENE, 95%

1,1,3,3-TETRAKIS(TRIMETHYLSILYL)-1,2-PROPADIENE
C15H36Si4

328.8080° / 0.5

1.477

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[3721-17-3]
HMIS: 3-2-0-X store <5°C
2.5g ¥52,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

357

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT7308.0

TETRAKIS(TRIMETHYLSILYL)SILANE

Si

320.85

C12H36Si5Si
Si(267° sub.)m.p. (sealed tube): 319-21°C
NMR standard
Mediates photochemical alkylation of heteroaromatic bases with alkyl halides.1
Precursor for CVD of amorphous hydrogenated silicon - carbon films.2
1. Togo, H. et al. Chem. Lett. 1991, 11, 2063.
2. Wrobel, A. et al. Chem. Mater. 1995, 7, 1403.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[4098-98-0]
HMIS: 2-2-0-X

SiSi

5g ¥25,200

25g ¥90,200

SIT7312.0

O
Si

TETRAKIS(VINYLDIMETHYLSILOXY)SILANE, 95%O
SiO

C16H36O4Si5

Si
O
Si

432.88130-5° / 2
Flashpoint: >100°C (>212°F)

Modifies modulus of vinyl-addition (Pt cure) silicone elastomers
See also SIT8725.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[60111-54-8]
EC 262-061-1 HMIS: 1-1-0-X

O
O
F

Si

25g ¥33,700

SIT7510.0

TETRAMETHOXYSILANE, 98%

TETRAMETHYLORTHOSILICATE; TMOS
C4H12O4Si 毒物
152.22
121-2°CAUTION: VAPORS CAN CAUSE BLINDNESS- GOGGLES MUST BE WORN
SURFACE TRANSPORT ONLY - UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN

O

Si

O

O

1.032

Flashpoint: 20°C (68°F)
TOXICITY: oral rat, LD50: 700 mg/kg
TOXICITY: ihl rat, LCLo:1,000 mg/m3/10M
Autoignition temperature: 245˚C
Vapor pressure, 25°: 12 mm
Specific heat: 1.6 J/g/˚
See PSI-026 Poly(dimethoxysiloxane) for safer version; see SIT7510.2 for high purity grade
Deposition frosting of glass
Cocatalyst with CsF for Michael additions
Converts aryl fluorides to anisole derivatives.1
1. Buckley, H. L. et al. Organometallics 2009, 28, 2356.
See also SIT7510.3, GET7500
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[681-84-5](既) 2-2048
TSCA EC 211-656-4 HMIS: 4-4-1-X
25g inquire
2kg inquire

1.3688Viscosity: 0.5 cSt
ΔHcomb: 2,905 kJ/mole
ΔHform: 1,256 kJ/mole
ΔHvap: 47.09 kJ/mole
Dipole moment: 1.75 debye

COMMERCIAL

O(4-5°)

18kg inquire

SIT7510.2

TETRAMETHOXYSILANE, 99+%

OO

毒物
152.22
121-2°(4-5°)
1.032
CAUTION: VAPORS CAN CAUSE BLINDNESS- GOGGLES MUST BE WORN
SURFACE TRANSPORT ONLY - UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
Flashpoint: 20°C (68°F)
Low metal impurity grade; for sol-gel derived optics
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[681-84-5](既) 2-2048
TSCA EC 211-656-4 HMIS: 4-4-1-X
25g inquire
3kg inquire
C4H12O4Si

Si

O

PR

O

1.3688

SIT7510.3

TETRAMETHOXYSILANE, oligomeric hydrolysateOSi

380 - 500
26.0-27.0% silicon - typically 3-5 silicon atoms (50-52% SiO2 equivalent)
Viscosity: 6-9 cSt.
Lower toxicity replacement for tetramethoxysilane
Highest SiO2 content precursor for sol-gel; intermediate for synthetic quartz
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[25498-02-6]
TSCA
HMIS: 3-2-1-X

O

O

3-6

TETRAMETHYLAMMONIUM SILICATE, 16-20% in waterO

O- +N(CH3)4

2.5kg ¥104,000

20kg ¥365,000

Hn

C8H26N2O4Si

242.39Intermediate for T8-cube silsesquioxanes
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[53116-81-7]
HMIS: 3-0-0-X

COMMERCIAL

O N(CH3)4Si

100g ¥13,000

1.389

SIT7516.0

-+

HO

1.17

1.072

1kg ¥29,000

18kg ¥281,000

SIT7520.0

TETRAMETHYLAMMONIUM SILOXANOLATE

N+

O

Si

N+

O
3-4

nominal structure

358

0.98

Viscous liquid which may solidify w/ time
1.5-2.0% nitrogen as endcapped polydimethylsiloxane
Siloxane equilibrium catalyst, decomposes >130°
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68440-88-0]
TSCA
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

25g ¥12,500(215) 547-1015

COMMERCIALMETHYLSILICATE, CONDENSED
CH3O[(CH3O)2SiO]3-6CH3

O

100g ¥32,600

www.gelest.com

1.438

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.852

1.48600.9912

1.3870

SIT7525.0

2,3,4,5-TETRAMETHYLCYCLOPENTADIENYLTRIMETHYLSILANE
C12H22Si
194.3945° / 0.03
Flashpoint: 73°C (163°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[134695-74-2]
HMIS: 2-2-0-X
5g ¥37,400

Si

SIT7530.0

1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
D’4; TMCTS
C4H16O4Si4

H

Si
H

H

H

Si

O
Si

In presence of oxygen plasma generates SiO2 films for microelectronics
Cyclic monomer- undergoes hydrosilylation reactions.1
Forms hybrid inorganic-organic polymers with dienes suitable for circuit board resins.2
Forms gate dielectrics by CVD.3
1. Michalczyk, M. et al. Chem. Mater. 1993, 5, 1687.
2. Leibfried, R. U.S. Patent 4,900,799, 1990.
3. Wang, A. et al. Res. Soc. Symp. Proc. 1997, 424, 281.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2370-88-9](既) 7-477
TSCA EC 219-137-4 HMIS: 2-3-1-X
25g ¥13,100

100g ¥34,600

3kg ¥219,000

SIT7530.1

1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE, 99+%

O

O

H

O

Si

H

O

Si
H

D’4; TMCTS
C4H16O4Si4

240.51
Low metals
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2370-88-9](既) 7-477
TSCA EC 219-137-4 HMIS: 2-3-1-X

134-5°(-69°)
Flashpoint: 31°C (88°F)

0.9912

1.387025g ¥164,000*
2.5kg ¥539,000*** includes zCYL-HPS-0050** includes stainless steel liquid dispensing cylinder zCYL-S-004

1,1,4,4-TETRAMETHYL-1,4-DICHLOROSILYLETHANE - see SIB1042.0 1,2-BIS(CHLORODIMETHYLSILYL)ETHANE

SIT7534.0

OSiO

1,1,3,3-TETRAMETHYL-1,3-DIETHOXYDISILOXANE

O
Si

222.43
Viscosity: 1.0 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18420-09-2](既) 7-492
TSCA EC 242-298-7 HMIS: 2-2-0-X
C8H22O3Si2

161°(-134°)
Flashpoint: 43°C (109°F)
25g ¥11,400

0.87881.3880100g ¥29,400

SIT7536.0

SiNH

2,2,5,5-TETRAMETHYL-2,5-DISILA-1-AZACYCLOPENTANE, 95%
C6H17NSi2
159.38Si

92° / 185
Flashpoint: 25°C (77°F)

0.842

1.434

0.74325

1.4215144.360.785

1.4380160.360.855

1.4142

See also SIB1073.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7418-19-1]
TSCA EC 231-036-7 HMIS: 2-3-1-X
5g ¥13,500

25g ¥43,800

PR

SIT7537.0

COMPOUNDSOSiSILICON

Si

O

O
O
F

Si

134-5°(-69°)
Flashpoint: 31°C (88°F)
Autoignition temperature: 270°C
Vapor pressure, 20°: 7.0 mm
Critical temperature: 278°C

COMMERCIAL

H

O

240.51

ΔHcomb: 5,308 kJ/mole
ΔHvap: 177.9 kJ/mole

1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE

H

1,2-BIS(DIMETHYLSILYL)ETHANE
C6H18Si2

Si

Si

H

146.38Precursor for “star” gel hybrid inorganic-organic polymers.
Forms α-SiC:H by remote plasma CVD.2
1. Michalczyk, M. et al. PCT Int’l Appl. 9406807, 1994.
2. Wrobel, A. M. et al. Thin Solid Films 2012, 520, 7100.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[20152-11-8]
HMIS: 2-4-1-X
1

125-8°
Flashpoint: 20°C (68°F)

5g ¥15,100

SIT7538.0SiSi

1,1,3,3-TETRAMETHYL-1,3-DISILACYCLOBUTANE

120-1°
Flashpoint: 1°C (34°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1627-98-1]
HMIS: 3-4-1-X
5g ¥34,700
C6H16Si2

SIT7540.0

2,2,5,5-TETRAMETHYL-2,5-DISILA-1-OXACYCLOPENTANE

Si

O

Si

TETRAMETHYLDISILAFURAN
C6H16OSi2

124°
Flashpoint: 15°C (59°F)
Undergoes ring-opening polymerization with tetramethylammonium siloxanoate.1
1. Suryananarayanam, B. et al. J. Polym. Sci. 1974, 12, 1089.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[7418-20-4]
TSCA EC 231-037-2 HMIS: 2-4-0-X
10g ¥16,700

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

50g ¥56,500

www.gelest.com

359

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.7202

1.429

0.766

1.4044

SIT7541.0

1,1,2,2-TETRAMETHYLDISILANE

H

Si

Si

4M2S
C4H14Si2

H

118.32

Forms low k carbon doped silicon dioxide films
Forms SiC nanowires by APCVD.1
1. Rho, D. Mater. Res. Soc. Symp. Proc. 2005, 832, 317.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[814-98-2]
TSCA
HMIS: 2-4-1-X

86-7°(-93°)
Flashpoint: -26°C (-15°F)

1.0g ¥32,600

SIT7542.0

1,1,3,3-TETRAMETHYLDISILAZANE

133.34

C4H15NSi2Si

Forms dimethylsilyl ethers with greater volatility than trimethylsilyl ethers
Review of synthetic utility.1
Converts unsaturated alcohols to diols.2
Converts homopropargylic alcohols to β-hydroxy ketones in a three-step process.3
Employed in the silylation/hydrosilylation of allylic alcohols leading to useful cyclic alkoxysilane intermediates.4

Si

O
O
F

H

H
N

99-100°Flashpoint: 11°C (52°F)
Autoignition temperature: 208˚C

HOH

H2PtCl6+ HMe2SiNHSiMe2HOO SiMe2

SiMe2H

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 488-490.
2. Tamao, K. et al. J. Am. Chem. Soc. 1988, 110, 3712.
3. Marshall, J. A.; Yanik, M.W. Org. Lett. 2000, 2, 2173.
4. Tamao, K. et al. J. Am. Chem. Soc. 1986, 108, 6090.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15933-59-2]
TSCA EC 240-072-2 HMIS: 3-4-1-X
25g ¥11,900
100g ¥31,000

1,1,4,4-TETRAMETHYLDISILETHYLENE - see SIT7537.0 1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE

SIT7546.0

1,1,3,3-TETRAMETHYLDISILOXANE, 98%
C4H14OSi2

Viscosity, 20˚: 0.56 cSt.
ΔHcomb: 4,383 kJ/mole
ΔHvap: 30.3 kJ/moleSi

H

Endcapper for polymerization of hydride terminated silicones
Employed in reductive halogenation of aldehydes and epoxides.1
Used to link ferrocenylsilane, polyolefin block copolymers into stable cylindrical forms.2
Employed in the high-yield reduction of amides to amines in the presence of other reducible groups.3
Reduces anisoles to arenes.4
Hydrosilylates terminal alkynes to form alkenylsilanes capable of cross-coupling w/ aryl and vinyl halides.5
1. Azipura et al. Tetrahedron Lett. 1984, 25, 3123.
2. Wang, X.-S. et al. J. Am. Chem. Soc. 2003, 125, 12686.
3. Hanada, S. et al. J. Am. Chem. Soc. 2009, 131, 15032.
4. Alvarez-Bercedo, P.; Martin, R. J. Am. Chem. Soc. 2010, 132, 17352.
5. Denmark, S. E.; Wang, Z. Org. Lett. 2001, 3, 1073.
See also SIH6117.0, SIB1838.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[3277-26-7](既) 7-477
TSCA EC 221-906-4 HMIS: 2-4-1-X
25g ¥4,300
250g ¥21,500

PR

Si

70-1°
0.757
Flashpoint: 12°C (54°F)
TOXICITY: oral mouse, LD50: 3,000 mg/kg
Autoignition temperature: 208˚C
Vapor pressure, 27°: 194.8 mm

1.3669COMMERCIAL

H

O

134.33

1.5kg ¥81,300

TETRAMETHYLORTHOSILICATE - see SIT7510.0 TETRAMETHOXYSILANE

SIT7555.0

TETRAMETHYLSILANE, 99+%
TMS
C4H12Si

Si

360

88.22
26.6-26.7°(-99°)
0.641
NMR grade
Flashpoint: -27°C (-17°F)
Viscosity: 0.4 cSt
TOXICITY: ihl rat, LC50: >5,000 ppm/4H
ΔHcomb: 3,851 kJ/mole
Autoignition temperature: 450˚C
ΔHform: -232 kJ/mole
Vapor pressure, 20°: 589 mm
ΔHfus: 6.7 kJ/mole
Critical temperature: 185˚C
ΔHvap: 26.8 kJ/mole
Critical pressure: 33 atm
Photoionization threshold: 8.1 eVHeat capacity: 195.2 joules/mole-K
Ce: 1.838 x 10-3
Dielectric constant: 1.92
Intermediate for α-SiC:H thin films by PECVD.1
1. Kim, D. et al. Thin Solid Films 1996, 283, 109.
See also GET7550
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[75-76-3](既) 2-660
TSCA EC 200-899-1 HMIS: 1-4-0-X
25g ¥8,500
100g ¥19,900

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.3588

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT7555.1

TETRAMETHYLSILANE, 99.9+%
TMS
C4H12Si

26.6-26.7°(-99°)
0.641
1.3588Flashpoint: -27°C (-17°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[75-76-3]
TSCA EC 200-899-1 HMIS: 1-4-0-X
25g ¥157,300*
2kg ¥463,000*** includes zCYL-HPS-0050** includes stainless steel liquid dispensing cylinder zCYL-S-004

Si

SIT7580.0

H
Si

H

Si

Si

2,2,3,3-TETRAMETHYLTETRASILANE, 95%

178.53

C4H18Si4

125-135°

Candidate material for nanowires.1
H 1. Arkles, B. et al. U.S. Patent Appl. 20120076840, 2012.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1364487-19-3]
HMIS: 2-4-1-X

H

5g ¥112,200

SIT7590.0

1,1,3,3-TETRA-n-OCTYLDIMETHYLDISILOXANE

555.11O C34H74OSi2

Si

2

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems
HMIS: 1-1-0-X

0.833211.449625

1.141260

1.553960

10g ¥28,900

TETRAMETHYLTETRAVINYLCYCLOTETRASILOXANE see SIT7900.0 1,3,5,7-TETRAVINYLTETRAMETHYLCYCLOTETRASILOXANE

SIT7600.0

OSi

400.50Viscosity, 55˚: 6.6 cSt.
ΔHvap: 70.1 kJ/mole
Dipole moment: 1.59 debye
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1174-72-7]
TSCA EC 214-638-4 HMIS: 4-2-1-X

OO

236-7° / 1(47-50°)Flashpoint: 160°C (320°F)

10g ¥27,300

TETRAPHENYLDICHLORODISILOXANE - see SID3374.0 1,3-DICHLOROTETRAPHENYLDISILOXANETETRAPHENYLDIMETHYLDISILANE - see SID4238.0 1,2-DIMETHYL-1,1,2,2-TETRAPHENYLDISILANE

SIT7753.0

1,1,3,3-TETRAPHENYL-1,3-DIMETHYLDISILAZANE

Si

H
N

409.68

C26H27NSi2

Deactivates glass capillary columns by persilylation.
1. Grob, K. et al. High Resol. Chrom. & Col Chrom. 1980, 3, 197.
See also SID4552.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[7453-26-1]
TSCA EC 231-227-5 HMIS: 2-1-0-X
1

Si

218-220° / 1.5(91°)
Flashpoint: >110°C (>230°F)

5g ¥13,000

25g ¥41,600

SIT7754.0

1,1,3,3-TETRAPHENYLDIMETHYLDISILOXANE

Si

O

410.66215° / 0.5(48-50°)Specific heat: 1.21 J/g/˚Flashpoint: 193°C (379°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[807-28-3]
TSCA EC 212-361-3 HMIS: 2-1-0-X
25g ¥13,500
C26H26OSi2

Si

1.07625

1.586625

SILICONTETRAPHENYLORTHOSILICATEC24H20O4Si

COMPOUNDSTETRAPHENOXYSILANE, tech-95

O

PR

H

Si

O
O
F

H

88.22

SIT7755.0

TETRAPHENYLSILANE

336.51228° / 3(236-7°)1.078
ΔHcomb: -13,459 kJ/moleSpecific heat: 1.2 J/g/˚
ΔHform: 246 kJ/moleHighly efficient UV-violet light emitting polymers formed by Pd-catalyzed copolymerization with fluorene compounds.1
1. Zhou, X. et al. Macromol. 2007, 40, 3015.
See also SIT7888.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1048-08-4]
TSCA EC 213-881-3 HMIS: 1-1-0-X
10g ¥18,000
C24H20Si

Si

SIT7757.0

1,1,5,5-TETRAPHENYL-1,3,3,5-TETRAMETHYLTRISILOXANE

484.82233° / 0.5
1.07
Viscosity: 38 cSt
Flashpoint: 221°C (430°F)
Surface tension, 25°: 35.5 mN/m
See also SIP6719.5, SIT8662.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[3982-82-9](既) 7-474
TSCA EC 223-620-5 HMIS: 1-1-0-X
25g ¥10,900100g ¥27,600
C28H32O2Si3

Si

O

Si

O

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.55125

361

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT7777.0

TETRA-n-PROPOXYSILANE

SILICON TETRA-n-PROPOXIDEC12H28O4Si

O

Si

O

O

224-5°(<-80°)
0.9158Flashpoint: 95°C (203°F)
Specific heat: 1.7 J/g/˚
Coefficient of thermal expansion: 9.12 x 10-4/°C100g ¥7,200

2kg ¥41,000

1.4012
COMMERCIAL

264.44
Viscosity: 1.66 cSt
Dipole moment: 1.48 debye
Dielectric constant: 2.92
Surface tension: 23.6 mN/m
Crosslinker for tin catalyzed condensation cure silicones
In combination with CTAB intermediate for mesoporous silica fibers.1
1. Kleits, F. et al. Chrom. Mater. 2001, 13, 3587.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[682-01-9](既) 2-2048
TSCA EC 211-659-0 HMIS: 2-2-1-X

O

16kg ¥234,000

SIT7880.0

n-TETRASILANE

H

Si

Si

Si

Si
H

H

H

DECAHYDRIDOTETRASILANE
H10Si4H PYROPHORIC
AIR TRANSPORT FORBIDDEN

122.42107°(-85 to -95°)

0.825

O
O
F

H

H

H

H

H

Contains 10-20% isotetrasilane
Vapor pressure, 20°: ~25 mm
Employed in low temperature CVD of amorphous silicon.1
1. Kanoh, H. et al. Jpn. J. Appl. Phys. 1993, 32, 2613.
See also SII6463.4, SIT8709.6
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[7783-29-1]
HMIS: 3-4-3-X
10g inquire* includes cylinder zCYL-HPS-0050

SIT7888.0

TETRA-p-TOLYLSILANE

392.62

C28H28SiSi(225-6°)

Tetrabromomethyl derivative formed on treatment with N-bromosuccinimide
See also SIT7755.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[10256-83-4]
HMIS: 2-1-0-X

1.079310g ¥40,600

SIT7896.0

1,1,3,3-TETRAVINYLDIMETHYLDISILOXANE, 95%
C10H18OSi2

O

Si

Si

210.4265-8° / 15
Flashpoint: 42°C (108°F)

End-capper for silicones
See also SIT7312.0, SIT7900.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[16045-78-6]
EC 240-187-8 HMIS: 2-2-0-X

0.852

1.44150.81525

1.461025

0.99224

1.494725g ¥54,900

SIT7897.0

TETRAVINYLSILANE

136.27130-1°
Viscosity: 0.6 cSt
Flashpoint: 18°C (64°F)
ΔHcomb: 5,412 kJ/mole
ΔHform: 22 kJ/mole
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1112-55-6]
TSCA EC 214-192-0 HMIS: 2-4-0-X
10g ¥21,000
C8H12Si

PR

Si

HN

Si

Si

N
H

Si

Si

50g ¥73,500

SIT7899.0

NHNH

1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILAZANE, 95%
C12H28N4Si4
340.72
Contains isomers and cyclic trisilazane analogs
See also SIT8736.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5162-63-0]
EC 225-940-0 HMIS: 2-1-1-X

104-7° / 4

25g ¥14,100

100g ¥37,900

SIT7900.0

Si

362

Si

O

O

Si

Si
O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIAL

O

1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
C12H24O4Si4
344.66110° / 10(-43°)
0.998
1.4342
Viscosity: 3.9 cSt
Flashpoint: 112°C (234°F)
Undergoes ring-opening polymerization
Review of synthetic utility.1
Modifier for Pt-catalyst in 2-component RTVs.2
Core molecule for dendrimers.3
Excellent and inexpensive reagent for vinylations in cross-coupling reactions for the formation of styrenes and dienes.4,5,6
Extensive review on the use in silicon-based cross-coupling reactions.7
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 484-487.
2. Kim, C. et al. Bull. Kor. Chem. Soc. 1997, 18, 164.
3. Broadbridge, R. et al. J. Chem. Soc., Chem. Commun. 1998, 1449.
4. Denmark, S. E.; Butler, C. R. Org. Lett. 2006, 8, 63.
5. Denmark, S. E.; Wang, Z. J. Organomet. Chem. 2001, 624, 372.
6. Denmark, S. E.; Wehrli, D. Org. Lett. 2000, 2, 565.
7. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
See also SIT8737.0, SIO6706.0, SIP6719.7
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2554-06-5](既) 7-483
TSCA EC 219-863-1 HMIS: 2-1-0-X
25g ¥7,600
100g ¥18,800
2kg ¥112,100

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

55-6° / 10
(14-15°)Flashpoint: 51°C (124°F)

0.911

1.4490

SIT7906.0

THEXYLDIMETHYLCHLOROSILANE
t-HEXYLDIMETHYLCHLOROSILANE
C8H19ClSi

178.78

Review of synthetic utility.
The N-silylated β-lactam shows increased hydrolytic stability over that of the analogous N-TBS derivative.2
1

CO2Bn

Si

O

Cl

N

CO2Bn

Si

O

t1/2 = 40 min

NSi

t1/2 = 90 min

OOF

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 263-265.
2. Wetter, H.; Oertle, K. Tetrahedron Lett. 1985, 26, 5515.
F&F: Vol. 13, p 74.
See also SID3226.0, SID4065.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[67373-56-2]
HMIS: 3-2-1-X
25g ¥17,200
100g ¥48,300

SIT7906.6

Cl

THEXYLTRICHLOROSILANE

70-2° / 15

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18151-53-6]
HMIS: 3-3-1-X
10g ¥40,600

SIT7906.9

S

2-THIENYL-t-BUTYLDIMETHYLSILANE

198.40

C10H18SSiSi

40-5° / 0.2
Flashpoint: 77°C (170°F)

0.929

165-6°
Flashpoint: 47°C (117°F)

0.945

1.49801.03

1.4460Intermediate for polythiophenes
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[163079-25-2]
HMIS: 2-2-0-X
2.5g ¥35,300

SIT7907.0

2-THIENYLTRIMETHYLSILANE

S
Si

2-(TRIMETHYLSILYL)THIOPHENE
C7H12SSi

156.32

Lithiates w/n-BuLi at 5-position
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18245-28-8]
HMIS: 2-2-1-X

SiN

10g ¥27,300

SIT7907.5

THIOBIS(HEXAMETHYLDISILAZANE)

Si
S

N

Si

352.84

C12H36N2SSi4

142-3° / 15

(65-7°)HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18243-89-5]
HMIS: 2-2-1-X
5g ¥42,700

PR

Si

COMPOUNDS

Cl

219.61C6H13Cl3Si

Cl

SILICONSi

SIT7907.7

O

Si

N

O

O

S

(THIOCYANATOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95
C13H19NO3SSi
297.44100-5° / 0.5
Contains isomers
Flashpoint: >110°C (>230°F)
On exposure to UV light of 254 nm undergoes conversion to isothiocyanate which reacts w/ amines, etc.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X
10g ¥48,000

SIT7908.0

3-THIOCYANATOPROPYLTRIETHOXYSILANE, 96%
C10H21NO3SSi

O

S

O

Si

Complexing agent for Ag, Au, Pd, Pt.1
Potential adhesion promoter for gold.2
1. Schilling, T. et al. Mikrochemica Acta 1996, 124, 235.
2. Ciszek, J. W. et al. J. Am. Chem. Soc. 2004, 126, 13172.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[34708-08-2]
TSCA EC 252-161-3 HMIS: 3-1-1-X

ON

263.4395° / 0.1
Flashpoint: 112°C (234°F)
TOXICITY: oral rat, LD50: 1,423 mg/kg

50g ¥10,300

250g ¥32,100

SIT7909.7

O

N
N
H

(3-(3-THYMINYL)PROPIONOXY)PROPYLTRIMETHOXYSILANE

O

Si

O
O

C14H24N2O7Si

O

O

O

360.44

Derivatized surfaces bind adenine modified polymers.1
1. Viswanathan, K. et al. Polymer Preprints 2005, 4602, 1133.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[879197-67-8]
HMIS: 2-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.0g ¥67,600(215) 547-1015

www.gelest.com

363

Name

Mw

bp °C/mm(mp °C)

D420

nD20

112° / 0.05
(37-8°)
Flashpoint: 56°C (133°F)

1.136

1.5140

SNB1025

TIN(ll) BIS(HEXAMETHYLDISILAZIDE)

Si
N

Sn

Intermediate for SnS quantum dots
Promotes conversion of aldehydes and ketones to N,N-dialkyleneamines.1,2
1. Burnell-Curty, C. et al. J. Org. Chem. 1992, 57, 5063.
2. Burnell-Curty, C. et al. Synlett 1993, 131.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[59863-13-7]
HMIS: 3-2-1-X
5g ¥12,500

NSi

439.47

C12H36N2Si4Sn

Si
Si

25g ¥36,500

SIT8005.0

TITANIUM SILICIDE, 95%, powder

112.03
Particle size, average: 4-8 μm; contains 3-5% iron
ΔHform: -335 kJ/mole
Resistivity: 123 μΏ•cm
Low and high resistivity phases present.1
1. Clevenger, L. A. et al. J. Appl. Phys. 1992, 72, 4978.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12039-83-7]
TSCA EC 234-904-3 HMIS: 2-1-0-X(1,540°)

Si2Ti

O
O
F

TiSi2

4.39

25g ¥8,500

100g ¥19,900

TITANIUM TRIMETHYLSILOXIDE - see SIT7305.0 TETRAKIS(TRIMETHYLSILOXY)TITANIUM
TMCS - see SIT8510.0 TRIMETHYLCHLOROSILANE
TMCTS - see SIT7530.0 1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANETMOS - see SIT7510.0 TETRAMETHOXYSILANE
TMS - see SIT7555.0 TETRAMETHYLSILANE, 99.9%
TMSDEA - see SID3398.0 DIETHYLAMINOTRIMETHYLSILANE

SIT8010.0

O-DL-a-TOCOPHEROLYLPROPYLDIMETHYLCHLOROSILANE, tech-90
C34H61ClO2Si
565.39

Cl

O

Si

O

Forms bonded phases
See also SIT8012.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥42,700

SIT8011.0

Si

O

O

O

Si

O

Si

O-DL-a-TOCOPHEROLYLPROPYLHEPTAMETHYLTRISILOXANE, tech-90
C39H76O4Si3
693.27220-50° / 0.1
Amber liquid
Viscosity: 650-750 cSt
Cosmetic vehicle
See also SIH6168.7
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[920741-92-0]
HMIS: 1-1-0-X
25g ¥51,200

0.92

1.472

0.956

1.485

0.945

1.495

184.74

1.00725

1.5055205.161.16091.53300.998

1.4820

SIT8012.0

O-DL-a-TOCOPHEROLYLPROPYLTRIETHOXYSILANE, tech-90
C38H70O5Si

O

O

Si

O

635.04

See also SIT8010.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

PR

O

O

10g ¥35,300

SIT8015.0

Si

O

O

O-DL-a-TOCOPHEROLYLTRIMETHYLSILANE, tech-90502.89Viscosity: 800-900 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2733-26-8]
HMIS: 0-1-1-X
C32H58O2Si

10g ¥25,200

SIT8030.0

p-TOLYLDIMETHYLCHLOROSILANE

Si

Cl

Si

Cl

O

Si
O

364

Cl

215-7°
Flashpoint: 67°C (153°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[35239-30-6]
TSCA EC 252-456-7 HMIS: 3-2-1-X
5g ¥14,100
C9H13ClSi

SIT8035.0

p-TOLYLMETHYLDICHLOROSILANE

161-5° / 7
Flashpoint: 80°C (176°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[25898-37-7]
TSCA
HMIS: 3-2-1-X
25g ¥42,700
C8H10Cl2Si

SIT8035.6

p-TOLYLMETHYLDIMETHOXYSILANE
C10H16O2Si

196.32

Monomer for radical crosslinked silicone elastomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17873-30-2]
HMIS: 3-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

114-6° / 22
Flashpoint: 78°C (172°F)
10g ¥37,900(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

bp °C/mm(mp °C)

D420

nD20

122.24147-8°(-6°)

0.87751.5112225.58218-20°1.28
γc of treated surface: 34 mN/m
Flashpoint: 92°C (198°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[701-35-9]
TSCA EC 211-854-0 HMIS: 3-2-1-X
25g ¥13,800
100g ¥36,900

1.522425

SIT8038.0

H

p-TOLYLSILANE

Si

H

H

C7H10Si

Intermediate for Bromosilane, Iodosilane
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[931-70-4]
HMIS: 2-4-1-X

10g ¥20,400

SIT8040.0

Cl
Si

Mw

p-TOLYLTRICHLOROSILANE

Cl

Cl

C7H7Cl3Si

SIT8041.0

p-TOLYLTRIETHOXYSILANE

254.40C13H22O3Si

OOO

0.9832

1.4664O
O
F

Si

115-7° / 8
Flashpoint: >110°C (>230°F)

Reagent for cross-coupling reactions
See also SIM6492.53, SIT8042.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18412-57-2]
HMIS: 2-1-1-X

5g ¥21,500

SIT8042.0

Si

O

O

75-8° / 8Flashpoint: 94°C (201°F)

10g ¥13,500

1.033

1.472625

0.86511.490850g ¥43,800

SIT8043.0

p-TOLYLTRIMETHYLSILANE

Si

Si

Cl

190-3°
Flashpoint: 46°C (115°F)
Vapor pressure, 73°: 10 mm
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3728-43-6]
HMIS: 2-2-0-X
5g ¥22,500

SIT8045.0

TRIACONTYLDIMETHYLCHLOROSILANE, blend

515.42
80% C30 and higher, 20% C22-C28
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[70851-52-4]
TSCA EC 274-938-6 HMIS: 3-1-0-X
25g ¥18,300
C32H67ClSi

29(60-82°)100g ¥51,700

SIT8045.4

3-TRIACONTYLHEPTAMETHYLTRISILOXANE, tech-85

Si

29

PR

Si

643.30(70-75°)0.85
Contains triacontene
TOXICITY: oral rat, LD50: >2,000 mg/kg
Cosmetic wax
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[401514-97-4]
HMIS: 1-0-0-X
100g ¥20,400
C37H82O2Si3

O
O

Si

SIT8046.0

Cl

Si

29

Cl

Si

29

TRIACONTYLMETHYLDICHLOROSILANE, blend

SiBr

535.84
80% C30 and higher, 20% C22-C28
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-1-1-X
25g ¥33,200

C31H64Cl2Si

Cl

Cl

Cl

Br

H

164.33

C10H16Si

COMPOUNDS

212.32γc of treated surface: 34 mN/m
Charge control surface treatment for electrostatic copier particles.1
Converts arylselenyl bromides to aryl-4-tolylselenides.2
1. Yamazaki, H. Jpn. Kokai JP 06027719 A2, 1994.
2. Bhadra, S. et al. J. Org. Chem. 2010, 75, 4864.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17873-01-7]
HMIS: 3-1-1-X
C10H16O3Si

SILICON

p-TOLYLTRIMETHOXYSILANE

O

SIT8048.0

TRIACONTYLTRICHLOROSILANE, blend

556.26(60-82°)
80% C30 and higher, 20% C22-C28
Employed in bonded phases for HPLC of carotenes
See also SIH5917.0 HEXACOSYLTRICHLOROSILANE; SIT8162.0 13-(TRICHLOROSILYLMETHYL)HEPTACOSANE
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[70851-48-8]
TSCA EC 274-933-9 HMIS: 3-1-1-X
25g ¥17,200
100g ¥48,300
C30H61Cl3Si

Reference Compound 10

Br

TRIBROMOSILANE
HBr3Si268.80111-2°(-73°)PYROPHORIC

Reference compound. Data is provided for investigators. Not offered for sale by Gelest.

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

365

Name

Mw

bp °C/mm

166.34180-1°(mp °C)

D420

nD20

0.80551.4662

SIT8060.0

TRIALLYLMETHYLSILANE
C10H18SiSi

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1112-91-0]
HMIS: 2-3-0-X

5g ¥26,800

SIT8085.0

TRI-t-BUTOXYCHLOROSILANE, 95%O

282.88C12H27ClO3Si

OSi

97° / 12

Esters with amino acids are versatile building blocks for peptide synthesis.1,2
1. Sharma, R. et al. Pept.: Biol Chem. Proc. Chin. Pept. Symp., 3rd Ed, 1995; p31; Chem. Abstr. 126:31636m.
2. Broadbridge, R. et al. J. Chem. Soc., Chem. Commun. 1998, 1449.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18105-64-1]
HMIS: 3-2-1-X
10g ¥19,400

ClO

SIT8088.0

O
O
F

TRI-t-BUTOXYSILANOL

264.44

C12H28O4Si

205-9°(65-6°)
Vapor pressure, 95°: 20 mm

Starting point for a wide range of MO2.SiO2 materials by sol-gel.1,2
Used to prepare single-site iron(III) centers on SBA-15 silica.3
Used in the preparation of tris(t-butoxy)siloxy derivatives of boron, precursors to B/Si materials.4
THF, Δ, 12 h

FeCl3

O
O

Si

OH

O

+ 3(t-BuO)3Si-O-Na

B(OBu-t)3Fe[OSi(OBu-t)3]3(THF)

74%

MePh, 80°

+ 3(t-BuO)3SiOH

1. Terry, K.; Tilley, T. D. Chem. Mater. 1991, 3, 1001.
2. Terry, K. et al. Chem. Mater. 1992, 4, 1290.
3. Nozaki, C. et al. J. Am. Chem. Soc. 2002, 124, 13194.
4. Fujdala, K. L. et al. Inorg. Chem. 2003, 42, 1140.
See also SIT8627.0 TRI-t-PENTOXYSILANOLHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18166-43-3]
HMIS: 2-1-1-X store <5°C

B[OSi(OBu-t)]3

10g ¥22,500

50g ¥79,800

SIT8090.0

TRI-(t-BUTYLAMINO)SILANE, 95%
C12H31N3Si

NH
HN

Si

245.4976-9° / 0.3
Flashpoint: 54°C (129°F)

0.827

1.428993-4° / 4Flashpoint: 80°C (176°F)

0.879

1.4472225-6°
Flashpoint: 83°C (181°F)
Vapor pressure, 90°: 5 mm

0.7994

1.4380CVD precursor for SiN films
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[205503-61-3]
HMIS: 3-2-1-X
10g ¥29,400

H

HN

SIT8091.0

TRI-n-BUTYLCHLOROSILANE
C12H27ClSi

Cl

See also SIT8384.0, SIT8378.6
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[995-45-9](既) 2-2041
TSCA EC 213-627-1 HMIS: 3-2-1-X
5g ¥16,400

PRSi

234.88

SIT8091.6

TRI-n-BUTYLSILANE
C12H28SiSi

200.44H

See also SIT8376.0, SIT8378.7
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[998-41-4]
HMIS: 2-2-1-X

25g ¥30,500

SIT8092.0

TRI-t-BUTYLSILANE, 95%
C12H28Si

Si

366

H

200.44142-6° / 100(33-44°)

Forms radical cation on radiolysis.1
Supersilyl starting material; forms a variety of sterically overloaded compounds.2
1. Rhodes, C. J. Organomet. Chem. 1993, 443, 19.
2. Wiberg, N. in Frontiers of Organosilicon Chem.; Bassindale, A., Ed.; Royal Society Chemistry: 1991; p. 263.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18159-55-2]
HMIS: 2-2-1-X
1.0g ¥38,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm

363.22102-3° / 0.5(mp °C)

D420

nD20

1.040

1.4880

SNT8585

TRI-n-BUTYLSTANNYLTRIMETHYLSILANE
TRIMETHYLSILYLTRI-n-BUTYLTIN
C15H36SiSn

Review of synthetic utility.1
Undergoes cis addition to terminal acetylenes with Bu3Sn internal.2
Intermediate for 3-substituted cyclobutenone.3
Sn-Si bond shown to react with COD Pt(cod)2 and phosphines to form bis((phosphino)silyl)tinplatinum(ll) complexes, which insert into
acetylenes.4
Used in the synthesis of α-amidotributylstannanes.5
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 719-723.
2. Chenard, B. et al. J. Org. Chem. 1986, 51, 3561.
3. Liebeskind, L. S. et al. J. Org. Chem. 1994, 59, 7917.
4. Sagawa, T. et al. Organometallics 2003, 22, 4433.
5. Mita, T.; et al. Synthesis 2012, 194.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17955-46-3]
HMIS: 2-1-1-X
2.5g ¥13,500
10g ¥33,800

Cl

Cl
Cl

Si
Cl

Cl

O
O
F

Sn Si

SIT8153.0

TRICHLOROMETHYLTRICHLOROSILANE, 50% in tolueneCl252.81
155-6°(115° neat)
Dark liquidFlashpoint: 4°C (39°F)
Source for dichlorocarbene.1
1. Cunico, R. et al. J. Organomet. Chem. 1978, 154, C45.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17760-13-3](既) 2-2046
TSCA EC 241-747-4 HMIS: 3-4-1-X
25g ¥34,200
CCl6Si

Cl
Cl

Si

+

PR

Cl

H

Et

HSiCl3

Bu4PClSiCl2 87%

Et

Et

+

HSiCl31.4020

Bu4PCl

Cl2Si
Et

Et

COMMERCIAL

劇物
135.4531.9°(-128°)
1.3417SURFACE TRANSPORT ONLY, UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
Viscosity, 25˚: 0.23 cSt
Flashpoint: -13°C (8°F)
ΔHform: -482 kJ/mole
TOXICITY: oral rat, LD50: 1,030 mg/kg
ΔHvap: 28.0 kJ/mole
TOXICITY: ihl mouse, LC50: 1,500 mg/m3/2H
Dipole moment: 0.97 debye
Autoignition temperature: 215˚C
Specific wetting surface: 240 m2/g
Vapor pressure, -70°: 2.5 mm
Surface tension: 14.3 mN/mVapor pressure, 14.5°: 400 mm
Specific heat: 1.05 J/g/°
Critical temperature: 234˚C
Coefficient of thermal expansion: 1.9 x 10-3
Critical pressure: 37 atm
Flammability limit: 6.9-70.0%
Reducing agent
Undergoes hydrosilylation reactions
Employed in production of high purity silicon metal
Generates chlorosilylene chemistry.1
Carries out thionation and selenation of amides and lactams with elemental sulfur or selenium, respectively.2
HCl3SiSILICON

TRICHLOROSILANE, 99%

COMPOUNDS

SIT8155.0

SiCl2 79%
Et

1. Jung, I. N. et al. Organometallics 2003, 22, 2551.
2. Shibahara, F. et al. Org. Lett. 2009, 11, 3064.
F&F: Vol. 3, p 298; Vol. 4, p 525; Vol. 5, p 688; Vol. 7, p 606; Vol. 11, p 553; Vol. 13, p 322; Vol. 14, p 82; Vol. 18, p 373.
See also SIT8155.1, GET8150
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10025-78-2](既) 1-224
TSCA EC 233-042-5 HMIS: 3-4-2-X
25g inquire
2kg inquire
20kg inquire* includes liquid dispensing cylinder zCYL-L-2400** requires zDR-S-019 or zCYL-S-019

SIT8155.1

TRICHLOROSILANE, 99.9+%

Cl

Cl

Si

Cl

劇物
135.4531.9°(-128°)
1.3417SURFACE TRANSPORT ONLY, UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
Flashpoint: -13°C (8°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10025-78-2](既) 1-224
TSCA EC 233-042-5 HMIS: 3-4-2-X
250g inquire
20kg inquire* includes stainless steel cylinder zCYL-HPS-0420-33** includes stainless steel cylinder zCYL-S-019
HCl3SiH

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4020

367

Name

Cl
Cl

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8155.3

Si

TRICHLOROSILANE, 2M (28-29%) in xylene
HCl3Si

H

劇物

135.450.949

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10025-78-2](既) 1-224
TSCA EC 233-042-5 HMIS: 3-4-2-X
400g ¥22,300

Cl

1-TRICHLOROSILYL-2-(CHLOROMETHYLPHENYL)ETHANE see SIC2295.3 ((CHLOROMETHYL)PHENYLETHYL)TRICHLOROSILANE
TRICHLOROSILYLETHYLCYCLOHEXENE - see SIC2459.0 [2-(3-CYCLOHEXENYL)ETHYL]TRICHLOROSILANE
Cl

SIT8157.0

2-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE

Cl

Si

240.59280° dec.
Fuming solid, moisture sensitive
See also SIP6930.0, 2-(4-PYRIDYLETHYL)TRIETHOXYSILANEHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17082-69-8]
TSCA EC 241-137-8 HMIS: 3-2-1-X
25g ¥19,900
C7H8Cl3NSi

O
O
F

Cl

N

(207°)

SIT8158.0

4-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE, 15-20% in tolueneCl240.59
Hazy liquid; extremely moisture sensitive
Flashpoint: 4°C (39°F)
1
Employed in polypyridine self-assembled monolayers.
1. Paulson, S. et al. J. Chem. Soc., Chem. Commun. 1992, 21, 1615.
See also SIP6930.0, 2-(4-PYRIDYLETHYL)TRIETHOXYSILANEHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17082-70-1]
TSCA EC 241-138-3 HMIS: 3-4-1-X
25g ¥13,000

Si

Cl

N

0.93

C7H8Cl3NSi

Cl

100g ¥34,500

2-(TRICHLOROSILYLMETHYL)ALLYL CHLORIDE - see SIC2281.0 2-(CHLOROMETHYL)ALLYLTRICHLOROSILANE

Cl

Cl

Si

13

Cl

Cl

Si

7

(20-35°)0.946

SIT8162.4

7-(TRICHLOROSILYLMETHYL)PENTADECANE, tech-95
2-HEXYLDECYLTRICHLOROSILANE
C16H33Cl3Si

0.985

SIT8163.0

O
Cl

2-DODECYLHEXADECYLTRICHLOROSILANE
C28H57Cl3Si

359.88146-152° / 0.2
Contains isomers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
10g ¥49,600

Cl
5

13-(TRICHLOROSILYLMETHYL)HEPTACOSANE, 95%

528.21215° / 0.01
Contains isomers
Forms bonded phases for HPLC applications
See also SIC2266.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[194242-99-4]
TSCA-L
HMIS: 3-1-1-X
10g ¥38,500

Cl
11

SIT8162.0

Cl

O

Si

C4H6Cl4O2Si

255.9948-50° / 0.35

1.41351.46351.473

1.3453

Derivatization leads to “removable spacer” for molecular imprinting
Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18098-86-7]
HMIS: 3-3-1-X
10g ¥40,000

PR

Cl

3-(TRICHLOROSILYL)PROPYLCHLOROFORMATE

SIT8170.0(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLCHLOROSILANEPERFLUOROOCTYL-1H,1H,2H,2H-DIMETHYLCHLOROSILANE
C10H10ClF13Si

F

F

F

Si

5

F

F

F

F

F

368

50g ¥40,600

SIT8172.0

F(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)METHYLDICHLOROSILANE
461.12
189-90°1.5525
Packaged over copper powder
Flashpoint: 51°C (124°F)
Vapor pressure, 76°: 12 mm
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[73609-36-6](既) 2-2047
EC 277-551-0 HMIS: 3-2-1-X
10g ¥15,400
50g ¥51,200

Cl C9H7Cl2F13Si

5F

440.70189-91°
Packaged over copper powder
Flashpoint: 52°C (126°F)
For branched fluorinated alkylsilane see SIB1706.0
Employed in column chromatography where low protein retentivity is required.1
Employed in solid phase extraction of fluorous phases.2
Modification of layered silicates yields film-forming compositions.3
Cl 1. Xindu, G. et al. J. Chromatogr. 1983, 269, 96.
2. Curran, D. J. Org. Chem. 1997, 62, 6714.
3. Ogawa, M. et al. Chem. Mater. 1998, 10, 3787.
See also SIN6597.3, SIT8719.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[102488-47-1]
HMIS: 3-2-1-X
10g ¥12,700

Si

Cl

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.3500Enabling Your Technology
Name
F

Si
H

F

75° / 25

D420

nD20

(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)SILANE
C8H7F13Si

Provides vapor-phase hydrophobic surfaces on titanium, gold, silicon
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous baseH [469904-32-3]
HMIS: 3-3-1-X

1.446

1.31841.639

1.352110g ¥53,800

SIT8174.0(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRICHLOROSILANE
C8H4Cl3F13Si
481.5584-5° / 17
Packaged over copper powder
Flashpoint: 54°C (129°F)
Cl
Lowers the coefficient of friction of silicon substrates.1Si
1. DePalma, V. et al. Langmuir 1989, 5, 868.
Cl See also SIH5841.0, SIT8716.3
Cl
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[78560-45-9](既) 2-2046
EC 278-947-6 HMIS: 3-2-1-X
10g ¥11,900

F

F

5

F

Si

5

O

O

O

F

Automotive side windows aretreated with fluoroalkylsilanes
to provide self-cleaning properties

F
F

F

SIT8176.0

F

Si

5

O

F
F

F

F

F F

F

F

F

F

F

F

F

F

F

F
F

F

F

F

F

F

F

O

1.44

1.3322

1.709

1.338

198.72
156-7°
1.01225
Contains tetraethoxysilane
Flashpoint: 47°C (117°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4667-99-6](既) 2-2043
TSCA EC 225-112-9 HMIS: 3-2-1-X
25g ¥22,500
100g ¥65,500

1.388

See also SIH5842.2, SIN6597.7
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[85857-16-5]
TSCA-L EC 288-657-1 HMIS: 3-1-1-X

Si

10g ¥15,200

50g ¥42,700

5,5,6,6,7,7,8,8,9,9,10,10,10-TRIDECAFLUORO-2-(TRIDECAFLUOROHEXYL)DECYLTRICHLOROSILANE, 95%
C16H7Cl3F26Si
827.63110-4° / 0.8
FContains ~ 5% isomers
Cl
Branched structure forms low surface tension SAMs
Cl
Si
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X
1.0g ¥31,000
ClF

SIT8178.0OO

60-2° / 0.5

SIT8176.3

PR

F

F

(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIMETHOXYSILANE
C11H13F13O3Si
468.29O

COMMERCIAL(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIETHOXYSILANE
C14H19F13O3Si
510.3686° / 1.5(<-38°)
1.351
1.3436
Viscosity: 3.5 cSt.
Flashpoint: 84°C (183°F)
ΔHvap: 66.1 kJ/moleγc of treated surface: 14 mN/mTreated surface contact angle, water: 110°Automotive side windows are treated with fluoroalkylsilanes to provide self-cleaning properties
See also SIN6597.65
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[51851-37-7]
TSCA EC 257-473-3 HMIS: 2-2-1-X
10g ¥11,700
50g ¥36,400
3kg ¥641,000

COMPOUNDS

F

F

50g ¥37,400

SIT8175.0

SILICON

F
F

H
5

F
F

378.21(mp °C)O
O
F

F

bp °C/mm

SIT8173.0

F

F

Mw

TRIETHOXYCHLOROSILANE, tech-95

Cl

O

SILICON CHLORIDE TRIETHOXIDEC6H15ClO3Si

SIT8180.0

TRIETHOXYFLUOROSILANE, 95%
C6H15FO3Si

O

O

Si
O

F

182.27133-134°
Vapor pressure, 25°: 3.3 mm

Employed in CVD of silicon dioxide films with low dielectric constants.1,2,3
1. Homma, T. et al. J. Electrochem. Soc. 1993, 140, 687.
2. Hayashi, T. et al. J. Ceram. Soc. Japan 1997, 105, 428.
3. Gorman, B. P. et al. Appl. Phys. Lett. 2001, 79, 4010.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[358-60-1]
TSCA
HMIS: 3-3-1-X
10g ¥13,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

0.94

50g ¥44,800

www.gelest.com

369

Name

Mw

bp °C/mm(mp °C)

D420

nD20

164.28131-2°(-170°)
0.8753
CAUTION: VAPORS CAUSE BLINDNESS - GOGGLES MUST BE WORNDISPROPORTIONATES IN PRESENCE OF BASE TO PYROPHORIC PRODUCTS
Contains trace Si-Cl for stability
Flashpoint: 26°C (79°F)
Viscosity: 0.6 cSt
TOXICITY: ivn mouse, LD50: 180 mg/kg
ΔHcomb: -4,604 kJ/mole
Vapor pressure, 20°: 20.2 mm
ΔHform: 925 kJ/mole
Critical temperature: 244˚C
ΔHvap: 175.4 kJ/mole
Dipole moment: 1.78 debye
Surface tension: 22.3 mN/mHydrosilylates olefins in presence of Pt
Review of synthetic utility.1
Reducing agent.2
Used to convert alkynes to (E)-alkenes via hydrosilylation-desilylation.3

1.3767

SIT8185.0

TRIETHOXYSILANE
C6H16O3Si

Si

H

O

1. (EtO)3SiH, [Cp*Ru(MeCN)3]PF6,
CH2Cl2n-C9H19
2. CuI, TBAF

O

O
O
F

O

O

n-C9H19

O

96%

Reduces amides to amines in the presence of Zn(OAc)2.4
Used in the reduction of phosphine oxides to phosphines.5

OP
Me PhPh

Ti(Oi-Pr)467°+ (EtO)3SiH (3 eq.)

Me

P Ph
Ph

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 501-505.
2. Boyer, J. et al. Synthesis 1981, 558.
3. Trost, B. M. et al. J. Am. Chem. Soc. 2002, 124, 7922.
4. Dos, S. et al. J. Am. Chem. Soc. 2010, 132, 1770.
5. Coumbe, T. et al. Tetrahedron Lett. 1994, 35, 625.
F&F: Vol. 11, p 564.
See also SIM6506.0, SIT8379.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[998-30-1](既) 2-2048
TSCA EC 213-650-7 HMIS: 4-3-1-X
25g ¥11,900
100g ¥31,000

SIT8177.0

p-(TRIETHOXYSILYL)ACETOPHENONE, 95%

O

O

Si

282.41

C14H22O4Si

O

120° / 0.3

1.02825

1.472725

0.96

1.414

100° / 0.5
0.946
Flashpoint: 102°C (216°F)
TOXICITY: oral rat, LD50: >500 mg/kg

1.4112

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[438569-05-2]
HMIS: 2-2-1-X

O(<-76°)

2.5g ¥65,000

SIT8185.3

TRIETHOXSILYLBUTYRALDEHYDE, tech-90

O

O

Si

234.37
Contains 3-TRIETHOXYSILYL-2-METHYLPROPANAL isomer andcyclic siloxy acetal, 2,2,6-TRIETHOXY-1-OXA-2-SILACYCLOHEXANE
Coupling agent for chitosan to titanium.1
1. Martin, H. et al. Appl. Surf. Sci. 2008, 254, 4599.
See also SIT8194.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[917773-12-7]/[88276-92-0]
TSCA-L
HMIS: 3-3-1-X
C10H22O4Si

PR

O

O

85-7° / 1

10g ¥40,600

SIT8185.8

1-(TRIETHOXYSILYL)-2-(DIETHOXYMETHYLSILYL)ETHANE

O

Si

Si

O

O

C13H32O5Si

O

324.56

Dipodal silane
Improves hydrolytic stability of silane adhesion promotion systems
Lower toxicity, easier to handle than bis(triethoxysilyl)ethane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18418-54-7]
TSCA
HMIS: 2-1-1-X

25g ¥11,100

100g ¥28,400

SIT8185.9

OO

2-(3-TRIETHOXYSILYLPHENYL)-1,3-DIOXOLANE

O

O

Si

O

C15H24O5Si

312.44

Extensive review on the use in silicon-based cross-coupling reactions.1
1. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1227828-43-4]
HMIS: 2-2-1-X
5g ¥61,800

TRIETHOXYSILYLPROPENE - see SIA0525.0 ALLYLTRIETHOXYSILANE

370

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

2kg ¥205,000

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm

3-[2-(3-TRIETHOXYSILYLPROPOXY)ETHOXY]SULFOLANE, 95%
C15H32O7SSi
384.56

190-4° / 0.4(mp °C)

D420

nD20

SIT8186.0
O

O

O

S

Si

O

O

O
O

Forms hydrophilic surfaces
See also SIT7122.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[502925-40-8]
HMIS: 2-2-1-X

1.122

10g ¥20,400

SIT8186.2
O

OH

O
Si

O

O

O

O

7-TRIETHOXYSILYLPROPOXY-5-HYDROXYFLAVONE, 50% in xylene
C24H30O7Si
458.58
Contains non-reactive dyestuffs
UV max: 350 nm
See also SID4352.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[945761-08-0]
HMIS: 2-3-1-X

Flashpoint: 30°C (86°F)

1.0g ¥16,200

5g ¥54,400

O

O

O

10

O

Si

3

O

TRIETHOXYSILYLPROPOXY(POLYETHYLENEOXY)DODECANOATE, tech-95
C27H56O8Si
536.820.977
2-4 EO Units
Contact angle (treated surface), water: 61-2°
Contact angle (treated surface), 2-ethylhexyl palmitate: <15°
Provides embedded hydrophilicity with oleophilic compatibility
Surface treatments stabilize particle dispersions.1
1. Arkles, B. et al. in Silanes and Other Coupling Agents; Mittal, K., Ed.; VSP (Brill), 2009, Vol. 5, p. 51.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1041420-54-5]
TSCA-L
HMIS: 2-1-1-X
25g ¥16,200
100g ¥44,800

1.447925

COMPOUNDS

Embedded polarity silanes are utilized to reduce particle-particle interaction
as demonstrated for yellow iron oxide pigment in 2-ethylhexylpalmitate
left: untreated, right: SIT8186.3 treated

SIT8186.45

O4-(TRIETHOXYSILYLPROPOXY)-2,2,6,6-TETRAMETHYLPIPERIDINE N-OXIDE, tech-85

N

TEMPO-SILANE
C18H38NO5Si

O

O

Si

O

O

376.58

Employed in nitroxyl mediated grafting of vinylsilanes to polyolefins.1
1. Weaver, J. et al. J. Polym. Sci., Part A: Polym. Chem. 2008, 46, 4542.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[913375-27-6]
HMIS: 2-2-1-X

10g ¥52,200

SIT8186.5

O

N-(3-TRIETHOXYSILYLPROPYL)-O-t-BUTYLCARBAMATE

O

O

N
H

Si

O

C14H31NO5Si

O

321.49Masked isocyanate
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[137376-38-6]
HMIS: 2-1-1-X

110-5° / 0.2
Flashpoint: >65°C (>150°F)
25g ¥14,600

0.990

1.43341.05225

1.419725

1.12

1.5421100g ¥39,500

SIT8186.7

O

N-[3-(TRIETHOXYSILYL)PROPYL]-2-CARBOMETHOXYAZIRIDINE, 95%
C13H27NO5Si
305.44

Reacts with fullerenes by 1,3-dipolar addition of azomethine ylide to yield pyrollidine adduct.1
1. Bianco, A. et al. J. Am. Chem. Soc. 1997, 119, 7550.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[193417-26-4]
HMIS: 3-2-1-X
2.5g ¥59,100

PR

O

N

O

Si

O

O

SILICONO

O
O
F

SIT8186.3

SIT8187.0

N-(TRIETHOXYSILYLPROPYL)DANSYLAMIDE

5-DIMETHYLAMINO-N-(3-TRIETHOXYSILYLPROPYL)NAPTHALENE-1-SULFONAMIDE
C21H34N2O5SSi
454.66115-9° / 0.1

O

Si

HN

O

S

O

O

O

Viscous liquid
UV max: 222(s), 256, 354
Fluorescent - employed as a tracer in UV cure composites
Soluble in toluene, tetrahydrofuran
Fluorescence probe for crosslinking in silicones.1
Employed in a chemically modified logic gate.2

N

1. Leezenberg, P. et al. Chem. Mater. 1995, 7, 1784.
2. Mu, L. et al. Angew. Chem., Int. Ed. Engl. 2009, 48, 3469.
See also SIT8192.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[70880-05-6]
TSCA EC 274-980-5 HMIS: 2-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.0g ¥43,800(215) 547-1015

www.gelest.com

371

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.974

1.432225

SIT8187.2
O

O

Si

O
Si

N

O

O

(1-(3-TRIETHOXYSILYL)PROPYL)-2,2-DIETHOXY-1-AZA-2-SILACYCLOPENTANE, tech-90
C16H37NO5Si2
379.64136-8° / 1
Contains bis(triethoxysilylpropyl)amine
Cyclic azasilane that acts as coupling agent for metal-oxide films
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1184179-50-7]
HMIS: 3-2-1-X
25g ¥28,400

SIT8187.5

N-(3-TRIETHOXYSILYLPROPYL)-4,5-DIHYDROIMIDAZOLE
3-(2-IMIDAZOLIN-1-YL)PROPYLTRIETHOXYSILANE, IMEO
C12H26N2O3Si
O
N

Si

O

O

O
O
F

N

COMMERCIAL

274.43134° / 2
1.005
1.452
Viscosity: 5 cSt.
Flashpoint: >110°C (>230°F)
Coupling agent for elevated temperature-cure epoxies
Utilized in HPLC of metal chelates.1
Forms proton vacancy conducting polymers with sulfonamides by sol-gel.2
Ligand for molecular imprinting of silica with chymotrypsin transition state analog.3
1. Suzuki, T. et al. Chem. Lett. 1994, 881.
2. De Zea Bermudez, V. et al. Sol-Gel Optics II, SPIE Proc. 1992, 1728, 180.
3. Markowitz, M. et al. Langmuir 2000, 16, 1759.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[58068-97-6]
TSCA EC 261-093-3 HMIS: 2-1-1-X
25g ¥8,200
100g ¥19,900
2kg ¥171,000

N-[3-(TRIETHOXYSILYL)PROPYL]-2,4-DINITROPHENYLAMINE see SID4352.0 3-(2.4-DINITROPHENYLAMINO)PROPYLTRIETHOXYSILANE, 95%

SIT8188.0

O

N
H

Si

O

O

Masked isocyanate
See also SIT8407.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17945-05-0]
TSCA EC 241-872-4 HMIS: 2-1-1-X

124-6° / 0.5
Flashpoint: 95°C (203°F)

25g ¥11,900

1.015

100g ¥31,000

1.43212kg ¥205,000

SIT8189.0

O

N-(3-TRIETHOXYSILYLPROPYL)GLUCONAMIDE, 50% in ethanol

O

HO

Si

N
H

HO

293.44

C12H27NO5Si

O

O

O

OH

GLUCONAMIDOPROPYLTRIETHOXYSILANE
C15H33NO9Si

399.51

Water soluble, hydrophilic silane
Modifies silica micro-capillaries to enhance flow of aqueous media.1
1. Constable, H. et al. Colloids Surf., A 2011, 380, 128.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[104275-58-3]
HMIS: 2-4-1-X
25g ¥11,900

HO
OH

0.951

Flashpoint: 15°C (59°F)

100g ¥31,000

SIT8189.5

N-(3-TRIETHOXYSILYLPROPYL)-4-HYDROXYBUTYRAMIDEOHO

C13H29NO5Si

O
Si
O

O

307.47

Anchoring reagent for light directed synthesis of DNA on glass.1
1. McGall, G. et al. J. Am. Chem. Soc. 1997, 119, 5081.
See also SIT8189.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[156214-80-1]
HMIS: 2-2-1-X

PR

N
H

10g ¥12,500

1.02

1.4533

1.11

1.472

0.98525

1.452650g ¥39,500

SIT8189.8

TRIETHOXYSILYLPROPYLMALEAMIC ACID, tech-90

H
N

O

OH

319.43
Contains condensation products and 10% ethanol
Viscosity: 600-900 cSt
Reagent for immobilization of anti-bodies on silicon nitride sensor chips.1
1. Kurihara, Y, et al. Langmuir 2012, 28, 13609.
See also SIT8192.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[33525-68-7]
TSCA EC 251-564-1 HMIS: 3-2-1-X
C13H25NO6Si

O

O

Si

O

O

25g ¥18,300

SIT8190.0

H
N

O

O

372

O

O

Si

O

(S)-N-TRIETHOXYSILYLPROPYL-O-MENTHOCARBAMATE
C20H41NO5Si

406.63

Optically active
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[68479-61-8]
TSCA EC 270-863-8 HMIS: 2-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

Flashpoint: >110°C (>230°F)
10g ¥25,200(215) 547-1015

www.gelest.com

COMMERCIALTRIETHOXYSILYLPROPYL ETHYLCARBAMATEOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8191.0

3-(TRIETHOXYSILYLPROPYL)-p-NITROBENZAMIDE

370.48
UV max: 224, 260, 292(s)Used to prepare diazotizable supports for enzyme immobilization.1(54-5°)

C16H26N2O6Si
O

H
N

O

1.5127

O

Si
O

N+

O

O-

O
O
F

1. Weetall, H. U.S. Patent 3,652,761, 1972.
See also SIN6597.25
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[60871-86-5]
TSCA EC 262-508-0 HMIS: 2-1-1-X

25g ¥24,100

SIT8192.0

N
H

O
S

Si

Si

6-9

O

O - K+

O

25g ¥7,700

100g ¥17,200

2kg ¥161,000

SIT8192.2

O

O

O

O

O

1.454025

COMPOUNDS

O

O

4-6

1.09

COMMERCIALOO

H

N-(TRIETHOXYSILYLPROPYL)-O-POLYETHYLENE OXIDE URETHANE, 95%
C10H22NO4SiO(CH2CH2O)4-6H
400-500
Contains some bis(urethane) analog
Viscosity: 75-125 cSt
Hydrophilic surface modifierForms PEGylated glass surfaces suitable for capillary electrophoresis.1
1. Razunguzwa, T. et al. Anal. Chem. 2006, 78, 4326
See also SIB1824.82
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[74695-91-3]
TSCA
HMIS: 2-1-1-X

O

TRIETHOXYSILYLPROPYL(POLYETHYLENEOXY)PROPYLPOTASSIUM SULFATE, 50% in ethanol
C25H53KO13SSi - C31H65KO16SSi
661 - 793
Flashpoint: 15°C (59°F)
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X
2.5g ¥51,700

SIT8192.4(R)-N-TRIETHOXYSILYLPROPYL-O-QUININEURETHANE, 95%
C30H45N3O6Si

Soluble: warm toluene
UV max: 236(s), 274, 324, 334
Fluorescent, optically active silane

O

Si
O

N
H

N

O

O

(82-4°)

SILICONO

O

571.79PRN

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

5g ¥36,900[200946-85-6]

SIT8192.6(3-TRIETHOXYSILYL)PROPYLSUCCINIC ANHYDRIDE, 95%
C13H24O6Si

O

Si

O

O

O

Viscosity: 20 cSt

304.41O

Coupling agent for dibasic surfaces
Acetic acid-catalyzed hydrolysis yields succinic acid derivatives
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[93642-68-3]
TSCA EC 297-566-6 HMIS: 2-1-1-X

135° / 0.2
1.070
Flashpoint: >100°C (>212°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg
Autoignition temperature: 250˚C

25g ¥13,800

100g ¥36,900

1.4405

COMMERCIALO

2kg ¥192,000(TRIETHOXYSILYLPROPYL)UREA - see SIU9055.0 UREIDOPROPYLTRIETHOXYSILANE

SIT8194.0

TRIETHOXYSILYLUNDECANAL, tech-95

O

O

O

Si

10

O

332.56
Treated surface contact angle, water: 70°
Long chain coupling agent for DNA
Provides greater stability for coupled proteins than shorter alkyl homologs.1
1. Seitz, O. et al. J. Mater. Chem. 2011, 21, 4384.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[116047-42-8]
HMIS: 2-2-1-X
C17H36O4Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

150-5° / 0.5

0.930

1.43435g ¥32,600(215) 547-1015

www.gelest.com

373

Name

Mw

bp °C/mm

366.61

160-5° / 0.25

(mp °C)

D420

nD20

0.893

1.41901.140

1.45610.89681.4313

SIT8194.5
O

O

Si

O

10

TRIETHOXYSILYLUNDECANAL, ETHYLENE GLYCOL ACETALO

C19H40O5Si

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[866935-66-2]
HMIS: 2-2-1-X

O

5g ¥38,500

SIT8195.0
O
SiO

TRIETHYLACETOXYSILANE

174.31
Surface tension: 24.5 mN/m
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5290-29-9](既) 9-1939
TSCA EC 226-128-9 HMIS: 2-2-1-X
C8H18O2Si

173-4°
Flashpoint: 41°C (106°F)
10g ¥15,600

SIT8210.0

TRIETHYLBROMOSILANE

66-7° / 24(-50°)
Flashpoint: 39°C (102°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1112-48-7]
TSCA EC 214-191-5 HMIS: 3-2-1-X
10g ¥17,200
C6H15BrSi

Br

195.17O
O
F

Si

SIT8250.0

TRIETHYLCHLOROSILANE
ΔHvap: 41.0 kJ/moleSiCl

150.72144-5°(-50°)
Flashpoint: 30°C (86°F)
Autoignition temperature: 280˚C
Vapor pressure, 25°: 7 mm

Forms silylated derivatives of alcohols stable to Grignard conditions.1
1. Arkles, B. In Handbook of Grignard Reagents; Silverman, G., Ed; Marcel Dekker: 1996; p667.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[994-30-9](既) 2-2041
TSCA EC 213-615-6 HMIS: 3-3-1-X
10g ¥6,800

50g ¥18,800

COMMERCIAL

C6H15ClSi

750g ¥122,000

SIT8280.0SiO

1,1,1-TRIETHYL-3,3-DIMETHYLDISILOXANE

Si

H

C8H22OSi2

190.43

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[80907-11-5]
HMIS: 2-3-1-X

10g ¥16,200

SIT8285.0

TRIETHYLETHOXYSILANE

Si

C8H20OSiO

160.33

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[597-67-1]
HMIS: 2-3-1-X

154-5°

0.816

1.414010g ¥27,300

SIT8290.0

TRIETHYLIODOSILANE

I

242.18
Dark amber liquid
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1112-49-8]
HMIS: 3-2-1-X
C6H15ISiPR

Si

40-5° / 2

5g ¥18,000

SIT8330.0

TRIETHYLSILANE, 98%

116.28107-8°(-157°)
0.73091.4123
Viscosity: 4.9 cSt.
Flashpoint: -3°C (27°F)
ΔHcomb: -5,324 kJ/mole
Autoignition temperature: 250˚C
ΔHform: -172 kJ/mole
Vapor pressure, 20°: 40 mm
Dipole moment: 0.75 debye
Surface tension: 20.7 mN/m
Versatile reducing agent; key reviews.1,2,3,4Silylates tertiary alcohols in presence of tris(pentafluorophenyl)borane.5
Silylates arenes in presence of Ru catalyst and t-butylethylene.6
Used in reductive cyclization of ynals.7
Readily converted directly to triethylsilyl carboxylates.8
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 506-514.
2. Nagai, Y. Org. Prep. Proc. Int. 1980, 12, 13.
3. F&F: Vol. 1, p 1218; Vol. 2, p 433; Vol. 3, p 304; Vol. 4, p 562; Vol. 6, p 652; Vol. 7, p 387; Vol. 8, p 501; Vol. 9, p 418; Vol. 10, p 483;
Vol. 11, p 482; Vol. 15, p 338; Vol. 16, p 356; Vol. 17, p 367.
4. Larson, G. L.; Fry, J. L. Ionic and Organometallic-Catalyzed Organosilane Reductions, Volume 71, Denmark, S. E., Ed. John WIley
and Sons, 2008
5. Blackwell, J. M. et al. J. Org. Chem. 1999, 64, 4887.
6. Ezbiansky, K. et al. J. Organometal. Chem. 1998, 17, 1455.
7. Tang, X.-Q.; Montgomery, J. J. Am. Chem. Soc. 1999, 121, 6098.
8. Chahan, M. et al. Org. Lett. 2000, 2, 1027.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[617-86-7]
TSCA EC 210-535-3 HMIS: 2-4-1-X
25g ¥6,500
250g ¥32,300
2.5kg ¥189,000
C6H16Si

374

H

www.AZmax.co.jp

TEL: 03-5543-1630

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www.gelest.com

COMMERCIALSiEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

132.2775° / 240.8647
ΔHvap: 50.6 kJ/moleFlashpoint: 57°C (135°F)
Dielectric constant: 2.66
Vapor pressure, 25.8°: 1 mm
pKa: 13.6
Dipole moment: 0.62 debye
Employed in phosphorodiamidate synthesis.1
1. Evans, D. et al. J. Am. Chem. Soc. 1978, 100, 3467.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[597-52-4]
TSCA EC 209-903-6 HMIS: 1-2-0-X
5g ¥10,900
25g ¥33,200

1.4329

SIT8332.0

TRIETHYLSILANOL
C6H16OSiSiOH

TRIETHYLSILYLACETYLENE - see SIE4902.0 ETHYNYLTRIETHYLSILANE

SIT8335.0

1.3892

O
O
F

O

F

1.169

Review of synthetic utility.1
Triethylsilylation reagent.2
In combination with lutidine selectively converts acetals to aldehydes without affecting silyl ethers.3
Reacts with esters to form both the silyl ketene acetal and the α-triethylsilyl ester.4
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 517-518.
2. Emde, H. et al. Synthesis 1982, 1.
3. Fujioka, H. et al. J. Am. Chem. Soc. 2006, 128, 5930.
4. Emde, H. et al. Liebigs Ann. Chem.1981, 1643.
See also SIT8387.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[79271-56-0]
EC 279-124-4 HMIS: 4-2-1-X
10g ¥11,100
50g ¥38,700
2kg ¥385,000

Si
O

S

F

85-6° / 12Flashpoint: 72°C (162°F)

SIT8339.0Si

1,1,1-TRIETHYL-3,3,3-TRIMETHYLDISILOXANE

O

204.46

C9H24OSi2Si

171-2°

Volatile siloxane with good range of solubility with organics and silicones
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2652-41-7]
HMIS: 1-3-0-X

0.811

1.41081.29

1.40680.980

1.3820100g ¥35,300

SIT8343.0

F

Si

F

m-(TRIFLUOROMETHYL)PHENYLTRIMETHOXYSILANE

O

F

O

F

F

F
F
F

F

O

266.29Cross-coupling reagent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[53883-59-3]
HMIS: 3-2-1-X

2.5g ¥59,100

SIT8345.0

O
Si

F

C10H13F3O3Si

O

p-TRIFLUOROMETHYLTETRAFLUOROPHENYLTRIETHOXYSILANE
C13H15F7O3Si
380.33O

Forms H-free resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[561069-04-3]
HMIS: 3-2-1-X

5g ¥30,500

25g ¥111,700

PR

SIT8356.0

TRIFLUOROMETHYLTRIETHYLSILANE

F

F

C7H15F3Si

Si

F

184.2856-7° / 60
Flashpoint: 0°C (32°F)

COMMERCIAL

O

F

264.34COMPOUNDS

C7H15F3O3SSi

SILICON

TRIETHYLSILYLTRIFLUOROMETHANESULFONATE

Trifluoromethylates aryl chlorides under mild conditions.1
1. Cho, E. J. et al. Science, 2010, 328, 1679.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[120120-26-5]
HMIS: 3-4-0-X
2.5g ¥34,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

375

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.96261.3304

SIT8362.0

TRIFLUOROMETHYLTRIMETHYLSILANE
RUPPERT’S REAGENTC4H9F3Si

142.2055°
Flashpoint: -10°C (14°F)

Key reviews.
Trifluoromethylates carbonyl compounds.4
Converts esters to trifluoromethyl ketones.5
Used to prepare trifluoromethyl vicinal ethylene diamines.6
1,2,3

O

But

S

N

NBn2

O
Me3SiCF3

But

TMAF

S

CF3
NBn
2

N
H
86% >99:1

Used in a simple preparation of potassium (trifluoromethyl)trifluoroborate.7

K[F3CB(OMe)3]

HF, rt, 6 hUsed to prepare trifluoromethyltitanium complexes.8
Trifluoromethylates aldehydes, ketones and imines in good yield.9
Silylates cyclopropenes to give cyclopropenyltrimethylsilanes.10
Trifluoromethylates terminal acetylenes.11
Gives trifluoromethylthiolation of terminal alkynes in the presence of sulfur.12

F
F

B(OMe)3, KF, THF
rt, 18 hOOF
Me3SiCF3

Si

CN

F

K[F3CBF3]

CN

KF, DMF+ S8 + CF3SiMe3

SCF3

air, rt75%

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 539-546.
2. Prakash, G. et al. Chem. Rev. 1997, 97, 757.
3. Singh, R. P.; Shreeve. J. M. Tetrahedron 2000, 56, 7613.
4. Prakash, G. et al. J. Am. Chem. Soc. 1989, 111, 393.
5. Singh, R. et al. J. Org. Chem. 1999, 64, 2873.
6. Prakash, G. K. S.; Mandal, M. J. Am. Chem. Soc. 2002, 124, 6538.
7. Molander, G. A.; Hoag, B. P. Organometallics 2003, 22, 3313.
8. Taw, F. L. et al. J. Am. Chem. Soc. 2003, 125, 14712.
9. Matsukawa, S.; Saijo, M. Tetrahedron Lett. 2008, 49, 4655.
10. Fordyce, E. A. F. et al. J. Chem. Soc., Chem. Commun. 2008, 1124.
11. Chu, L.; Qing, F.-L. J. Am. Chem. Soc. 2010, 132, 7262.
12. Chen, C. et al. J. Am. Chem. Soc. 2012, 134, 12454.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[81290-20-2]
HMIS: 3-4-0-X
5g ¥24,100
25g ¥86,200

TRIFLUOROMETHYLVINYLDIMETHYLSILANE - see SIV9205.0 VINYL(TRIFLUOROMETHYL)DIMETHYLSILANE

SIT8364.0

FF(3,3,3-TRIFLUOROPROPYL)DIMETHYLCHLOROSILANE
C5H10ClF3Si

PR

Si

F

F

Si

O

Si

F

Si

F

288°
1.2735TOXICITY: oral rat, LD50: >2,000 mg/kg

1.3720318.56
66-8° / 10(<-76°)
Viscosity, 25˚: 2 cSt
Flashpoint: 69°C (156°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[27703-88-4](既) 7-500
HMIS: 2-2-0-X
100g ¥50,900
C10H25F3O2Si3

C16H28F12O4Si4

624.73

See also SIT8366.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[429-67-4]
TSCA EC 207-060-9 HMIS: 1-1-0-X

25g ¥19,400

SIT8366.0(3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANE

F

468.5595° / 3
(35°)
1.24
1.371
Primarily trans isomerFlashpoint: 121°C (250°F)
Octanol/water partition coefficient, log Kow: 9.8
TOXICITY: oral rat, LD50: >10,700 mg/kg
Cyclic trimer; undergoes polymerization
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2374-14-3](既) 7-500
TSCA EC 219-154 7 HMIS: 2-1-0-X
25g ¥12,700
100g ¥33,700
4kg ¥339,000
C12H21F9O3Si3

O
3

376

1.375420

25g ¥43,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIAL

Si

0.95924

See also SIB1828.4
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1481-41-0](既) 2-2047
TSCA EC 216-039-3 HMIS: 3-4-1-X
5g ¥13,500(3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTETRASILOXANE

O

F

1.3727

SIT8365.5

F

4

F

1.113

3-(3,3,3-TRIFLUOROPROPYL)HEPTAMETHYLTRISILOXANE

O

F

118°
Flashpoint: 20°C (68°F)

SIT8365.0

Si

F

Cl

190.67

Enabling Your Technology
Name
Cl
Si

F

Cl

F

nD20

121-2°
1.2611
Flashpoint: 15°C (59°F)
TOXICITY: ipr mouse, 254 mg/kg
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[675-62-7](既) 2-2047
TSCA EC 211-623-4 HMIS: 3-4-1-X
10g ¥13,000
50g ¥41,600

1.3850(3,3,3-TRIFLUOROPROPYL)METHYLDICHLOROSILANE
C4H7Cl2F3Si

ΔHcomb: 2,788 kJ/mole

C6H13F3O2Si

211.08202.25HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[358-67-8](既) 2-2078
TSCA EC 206-619-4 HMIS: 3-4-1-X

O

131-2°
10g ¥12,500

1.089

1.358

1.395

1.385

50g ¥38,500

SIT8371.0

FFCl(3,3,3-TRIFLUOROPROPYL)TRICHLOROSILANE
C3H4Cl3F3Si

231.50113-4°
Flashpoint: 15°C (59°F)

O
O
F

Cl

Si

Cl

See also SIN6597.6
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[592-09-6](既) 2-2046
TSCA EC 209-744-2 HMIS: 3-4-1-X
10g ¥11,900

50g ¥37,400

SIT8372.0

F

O

F
O

F

Si

F
H

Si

O

Si

O

218.25144°
1.137
1.3546γc of treated surface: 33.5 mN/m
Flashpoint: 38°C (100°F)
Forms catalytic gels for aerobic oxidation of alcohols in combination with tetrapropylammonium perrhenate.1
1. Cirminna, R. et al. Org. Biomol. Chem. 2006, 4, 2637.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[429-60-7](既) 2-2079
TSCA EC 207-059-3 HMIS: 3-3-1-X
25g ¥22,400
100g ¥44,800
2.5kg ¥314,000

H

SIT8372.4

C6H13F3O3Si

TRIFLUOROPROPYLTRIS(DIMETHYLSILOXY)SILANE
C9H25F3O3Si4

O

Si

H

350.63

Crosslinker for Pt cure 2-component fluorosilicone RTVs
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[3410-32-0]
HMIS: 2-2-0-X

98-9° / 40

0.962

1.375325g ¥24,100

SIT8373.0

F
Si

F

F

TRIFLUOROSILANE, 50-75%

86.09-97.5°(-131°)AIR TRANSPORT FORBIDDEN
Balance tetrafluorosilane and difluorosilane
ΔHvap: 14.1 kJ/mole
Dipole moment: 1.26 debye
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13465-71-9]
HMIS: 4-2-2-X
25g inquire* includes gas dispensing cylinder zCYL-G-0900
HF3Si

H

SIT8374.0

PR

TRI-n-HEXYLCHLOROSILANE
C18H39ClSi

319.04154-5° / 5Flashpoint: >110°C (>230˚F)

0.871

1.456

160-1° / 5Flashpoint: 113°C (235°F)

0.799

1.4480COMPOUNDSSiSILICON(3,3,3-TRIFLUOROPROPYL)TRIMETHOXYSILANE, 98%

O

COMMERCIAL

F

F

D420

(3,3,3-TRIFLUOROPROPYL)METHYLDIMETHOXYSILANE

O
Si

F

(mp °C)

SIT8370.0

FF

bp °C/mm

SIT8369.0

F

F

Mw

See also SIT8091.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3634-67-1](既) 2-2041
TSCA EC 222-851-9 HMIS: 3-1-1-X
10g ¥17,800

Si

Cl

SIT8376.0

TRI-n-HEXYLSILANE
C18H40Si

284.61

See also SIT8378.7, SIT8625.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2929-52-4]
TSCA EC 220-893-2 HMIS: 2-2-1-X

SiH

25g ¥19,900

100g ¥57,000

SIT8378.1

HO

O

S

O

O

TRIHYDROXYSILYLETHYL PHENYLSULPHONIC ACID, 25% in water
C8H12O6SSi
264.33OH
Mixed isomers
Si
Forms hybrid organic-inorganic ionic membranes
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions
OH[143282-00-2]/[876338-08-8]
HMIS: 3-0-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

25g ¥24,700(215) 547-1015

www.gelest.com

377

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8378.3

3-(TRIHYDROXYSILYL)-1-PROPANESULFONIC ACID, 30-35% in water
C3H10O6SSi
202.26
pH: <1OH
Example of a silane with primary amine - condenses at elevated temperature to a disilazane
Employed in preparation of nanoscale ionic silicas.1
Si
OH Forms sulfonated fuel cell electrodes.2HO
1. Giannelis, E. et al. Appl. Organomet. Chem. 2010, 24, 581.
2. Eastcott, J. et al. J. Power Sources 2012,197,102.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[70942-24-4]
TSCA
HMIS: 3-0-0-X
25g ¥17,000

O
HO

S
O

1.12

100g ¥47,500

SIT8378.5

-O

P

O

Si

OH

3-(TRIHYDROXYSILYL)PROPYL METHYLPHOSPHONATE, MONOSODIUM SALT, 42% in water
C4H12NaO6PSi
238.18
1.25
Contains 4-5% methanol, sodium methylphosphonate
Flashpoint: 79°C (174°F)
1
Forms functionalized silica nanoparticles employed in amperometric glucose sensor.
1. Zhao, W. et al. Electrochim. Acta 2013, 89, 278.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[84962-98-1]
TSCA EC 284-799-3 HMIS: 1-2-0-X
100g ¥8,500
500g ¥24,700
2.5kg ¥95,000

O
O
F

Na+

OH

COMMERCIALHO

O

SIT8378.6

TRIISOBUTYLCHLOROSILANE

234.89225-8°
Flashpoint: 109°C (228°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13154-25-1]
HMIS: 3-1-1-X
10g ¥24,100
C12H27ClSi

Si

Cl

0.877

1.449

0.764

1.43500.854

1.38390.903

1.4520

SIT8378.7

TRIISOBUTYLSILANE

200.44

C12H28Si

SiH

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-2-1-X

204-6°
Flashpoint: 87°C (189°F)
10g ¥23,100[6485-81-0]

SIT8379.0

TRIISOPROPOXYSILANE, 95%OSi

206.35

C9H22O3SiOHO

35° / 5

Hydrolysis yields hydride functional polymers with greater linearity than triethoxysilane
Treatment with KH yields pentacoordinate dihydrosilicate.1
1. Corriu, R. et al. Organometallics 1992, 10, 3564.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[6675-79-2]
HMIS: 3-3-1-X
25g ¥36,300

SIT8384.0

TRIISOPROPYLCHLOROSILANE
TIPS-CHLORIDE
C9H21ClSi

PR

192.8179-80° / 10
Flashpoint: 62°C (144°F)
Autoignition temperature: 255˚C

Review of synthetic utility.1
Employed in nucleotide synthesis.2
Protection and stereocontrol of reaction of pyrroles.3
Quantitatively converts O-acetyl-protected glycosylthiomethyl phosphonate esters to their phosphonates.4
Used to form stable enol silyl ethers that can be oxidized to enones or β-TIPS-enones.5
Reacts with hydrazine to form the mono-TIPShydrazine, which can be converted to TIPS-protected hydrazones and further to unsymmetrical azines.6

i-Pr3SiCl

Cl+

H2NNH2

N

H
N

TIPS

98%
+

N

i-Pr3Si-NHNH2

PhCHO

N

H
N

TIPS

H
N

Ph

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 554-558.
2. Ogilvie, K. et al. Tetrahedron Lett. 1974, 2861. Ogilvie, K. et al. Carbohyd., Nucleosides, Nucleotides 1976, 3, 197.
3. Pattenden, G.; Robertson, G. M. Tetrahedron Lett. 1986, 27, 399.
4. Zhu, X. et al. J. Org. Chem. 2004, 69, 6843.
5. Yu, J.-Q. et al. Org. Lett. 2005, 7, 1415.
6. Justo de Pomar, J. C.; Soderquist, J. A. Tetrahedron Lett. 2000, 41, 3285.
F&F: Vol. 5, p 75.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13154-24-0](既) 2-2041
HMIS: 3-2-1-X
25g ¥11,200
100g ¥36,700
750g ¥183,000

378

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALSiOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

201.4376-8° / 8
(27-30°)Flashpoint: 67°C (153°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[181231-66-3]
HMIS: 3-2-1-X
10g ¥27,800

0.833

1.451

158.360.772

1.4358

SIT8384.5

TRIISOPROPYLDIMETHYLAMINOSILANE

Si

N,N-DIMETHYLTRIS(1-METHYLETHYL)SILANAMINE
C11H27NSi

N

SIT8385.0

TRIISOPROPYLSILANE, 98%H

100g ¥22,600

1.5kg ¥220,000

O
O
F

Si

COMMERCIAL

169-70°Flashpoint: 37°C (99°F)
Blocking agent forming derivatives stable in presence of Grignard reagents.
Selectively silylates primary alcohols in presence of secondary alcohols.1
1. Horner, L. et al. J. Organomet. Chem. 1985, 282, 155.
See also SIT8330.0, SIT8387.7
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[6485-79-6]
EC 613-702-2 HMIS: 2-3-1-X
25g ¥10,000
C9H22Si

SIT8384.8

1-(TRIISOPROPYLSILYL)PYRROLE

N

Si

223.43

C13H25NSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X[87630-35-1]

78° / 0.4
Flashpoint: 107°C (224°F)

0.904

1.492

1.136

1.41405g ¥23,600

TRIISOPROPYLSILYLTRIFLUOROMETHANESULFONATE
C10H21F3O3SSi

F

O

F

O

S
F

O

306.4145-6° / 0.03
Flashpoint: 100°C (212°F)

COMPOUNDS

SIT8387.0

Reactive form of TIPS protecting group
Review of synthetic utility.1
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 559-562.
2. Rucker, C. Chem. Rev. 1995, 95, 1009.
F&F: Vol. 11, p 567; Vol. 13, p 11; Vol. 21, p 254.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[80522-42-5]
HMIS: 3-1-1-X
10g ¥16,400
50g ¥55,400

Si

TRIMETHOXYPROPYLSILANE - see SIP6918.0 n-PROPYLTRIMETHOXYSILANE

SIT8392.0

122.2086-7°(-114°)
0.860
CAUTION: VAPORS CAUSE BLINDNESS - GOGGLES MUST BE WORNDISPROPORTIONATES IN PRESENCE OF BASE TO PYROPHORIC PRODUCTS
SURFACE TRANSPORT ONLY, UPS FORBIDDEN. AIR TRANSPORT FORBIDDEN
Contains Si-Cl for stability
Flashpoint: -24°C (-11°F)
ΔHcomb: -2,679 kJ/mole
TOXICITY: oral rat, LD50: 8,024 mg/kg
ΔHform: -599 kJ/mole
F&F: Vol. 19, p 167.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2487-90-3](既) 2-2048
TSCA EC 219-637-2 HMIS: 4-4-2-X
25g inquire
500g inquire* includes liquid dispensing cylinder zCYL-L-0900
C3H10O3Si

O
O

Si

PR

O

H

SIT8394.0

OON

1.3687

SILICON

TRIMETHOXYSILANE, 95%

N-[5-(TRIMETHOXYSILYL)-2-AZA-1-OXOPENTYL]CAPROLACTAM, 95%

O

N
H

Si

O

O

N-TRIMETHOXYSILYLPROPYLCARBAMOYLCAPROLACTAM
C13H26N2O5Si

318.45HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-1-1-X[106996-32-1](-39°)
Flashpoint: 136°C (277°F)

1.14

1.473925g ¥16,200

SIT8395.0

N+

Cl

O

-

Si

O

O

4-(TRIMETHOXYSILYLETHYL)BENZYLTRIMETHYLAMMONIUM CHLORIDE, 60% in methanol
C15H28ClNO3Si
333.93
Flashpoint: 11°C (52°F)
Candidate for exchange resins and extraction phases
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-3-1-X
25g ¥26,300

0.966

SIT8408.0

O

O

Si

6-9

O

COMMERCIALOOTRIMETHOXYSILYLPROPOXYPOLYETHYLENEOXIDE, METHYL ETHER, tech-85
CH3O(C2H4O)6-9(CH2)3Si(OCH3)3
459 - 591
(-8°)
1.076
1.403
Flashpoint: 88°C (190°F)
Hydrophilic surface treatment
Stabilizes colloidal silica sols in aqueous alcohol and aqueous glycol systems
See also SIT7122.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[65994-07-2]
TSCA
HMIS: 2-2-1-X
100g ¥8,800
2kg ¥72,300
20kg ¥385,000

TRIMETHOXYSILYLPROPYLANILINE - see SIP6724.0 N-PHENYLAMINOPROPYLTRIMETHOXYSILANE

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

379

Name

Mw

bp °C/mm(3-TRIMETHOXYSILYL)PROPYL 2-BROMO-2-METHYLPROPIONATE
C10H21BrO5Si
329.2790-5° / 0.5(mp °C)

D420

nD20

SIT8397.0
O

O
O

Br

Si

O

O

For surface initiated ATRP polymerization.1,2
1. Mulvihill, M. et al. J. Am. Chem. Soc. 2005, 127, 16040.
2. Huck, J. et al. J. Mater. Chem. 2004, 14, 730.
See also SIB1891.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[314021-97-1]
HMIS: 2-2-1-X

1.243255g ¥51,200

SIT8398.0

N
H

Si

O

Hardener, coupling agent for epoxies
See also SSP060, SIS6944.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[35141-30-1]
TSCA EC 252-390-9 HMIS: 3-1-1-X

1.4590O
OFO

114-8° / 2
1.030
Flashpoint: 137°C (279°F)
TOXICITY: oral rat, LD50: >2,000 mg/kg

100g ¥9,000

2kg ¥87,000

18kg ¥311,000

N-[3-(TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE see SIA0591.0 (2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE

SIT8401.0

O
K

+ -O

K+ -O

O

N-(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINETRIACETATE, TRIPOTASSIUM SALT, 30% in water
C14H25K3N2O9Si
510.75

O

N

N

Si

O

O

O
O- K+

Essentially silanetriol, contains KCl
Chelates metal ions
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[1309595-29-6]
HMIS: 2-0-0-X

25g ¥31,600

SIT8402.0

O
Na+ -O

Na+ -OON-(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINETRIACETATE, TRISODIUM SALT, 35% in water
C14H25N2Na3O9Si
462.42

O

N

N

Si

O

O

O
O- Na+

Essentially silanetriol, contains NaCl
Chelates metal ions
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[128850-89-5]/[1138444-28-6]
HMIS: 2-0-0-X

25g ¥16,200

1.26100g ¥44,800

SIT8405.0

S-(TRIMETHOXYSILYLPROPYL)ISOTHIOURONIUM CHLORIDE, 50% in water

NH
SH+

H2N

TRIHYDROXYPROPYLCARBAMIDOTHIOIC ACID HYDROCHLORIDE
C7H19ClN2O3SSi
274.84

O
Cl-

Si

O

O

pH: 6
Essentially silanetriol
Antimicrobial activity reported
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[84682-36-0]
TSCA EC 283-599-3 HMIS: 2-0-0-X

1.190

1.441

25g ¥17,800

TRIMETHOXYSILYLPROPYLMETHACRYLATE - see SIM6487.4 METHACRYLOXYPROPYLTRIMETHOXYSILANE

SIT8407.0

N-TRIMETHOXYSILYLPROPYLMETHYLCARBAMATEOMETHYL [3-(TRIMETHOXYSILYL)PROPYL]CARBAMATE
C8H19NO5Si

PR

O

O

N
H

Si

O

O

Viscosity: 12 cSt

237.32

See also SIT8188.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[23432-62-4]
HMIS: 3-2-1-X

102° / 0.75
Flashpoint: 99°C (210°F)
Autoignition temperature: 385˚C

1.108725g ¥20,400

SIT8410.0

N-(3-TRIMETHOXYSILYLPROPYL)PYRROLE

O

N

O

Si

O

229.35

C10H19NO3Si

For electrode modification, polypyrrole adhesion.1
1. Simon, R. et al. J. Am. Chem. Soc. 1982, 104, 2031.
See also SIT8187.5
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[80906-67-8]
HMIS: 3-1-1-X

105-7° / 1
Flashpoint: >110°C (>230°F)

1.017

1.463

1.136251.5123255g ¥33,200

SIT8411.0S

2-(3-TRIMETHOXYSILYLPROPYLTHIO)THIOPHENE

O

S

O

Si

O

380

COMMERCIAL

O

H
N

H2N

(3-TRIMETHOXYSILYLPROPYL)DIETHYLENETRIAMINE, tech-95
C10H27N3O3Si
265.43γc of treated surface: 37.5 mN/m

278.46
Contact angle, water on treated silica surface: 76˚
See also SIP6926.4
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1364140-50-0]
HMIS: 3-2-1-X
C10H18O3S2Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

125-7° / 0.4

10g ¥36,300(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8412.0

Br-

O
N+

Si

O

O

N-TRIMETHOXYSILYLPROPYL-N,N,N-TRI-n-BUTYLAMMONIUM BROMIDE, 50% in methanol
C18H42BrNO3Si
428.52
Flashpoint: 11°C (52°F)
Immobilizable phase transfer catalyst
See also SIT8422.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X
25g ¥28,400

0.92

SIT8414.0

Cl-

O
N+

Si

O

0.88

O
O
F

O

N-TRIMETHOXYSILYLPROPYL-N,N,N-TRI-n-BUTYLAMMONIUM CHLORIDE, 50% in methanol
C18H42ClNO3Si
384.08Flashpoint: 11°C (52°F)
Contains 3-5% chloropropyltrimethoxysilane and Bu3NH+ClComponent in hybrid organic-inorganic exchange resins.1
1. Lee, B. et al. Langmuir 2003,19, 4246.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[143203-33-2]
HMIS: 3-4-1-X
25g ¥24,900

SIT8415.0

N-TRIMETHOXYSILYLPROPYL-N,N,N-TRIMETHYLAMMONIUM CHLORIDE, 50% in methanol

N+

Si
O

O

Employed for bonded chromatographic phases
Anti-static agent
Used to treat glass substrates employed in electroblotting
Prevents contact electrification.1
1. Thomas, S. et al. J. Am. Chem. Soc. 2009, 131, 8746.
See also SIT8395.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[35141-36-7](既) 2-2095
TSCA EC 252-393-5 HMIS: 2-4-1-X

0.927

Flashpoint: 11°C (52°F)

25g ¥8,200

2kg ¥113,000

1.3966

COMMERCIAL

15kg ¥454,000

SIT8422.0

N+

9

Si

O

O

N-TRIMETHOXYSILYLUNDECYL-N,N,N-TRI-n-BUTYLAMMONIUM BROMIDE, 25% in dimethylformamide
C26H58BrNO3Si
540.74Flashpoint: 58°C (136°F)
Immobilizable phase transfer catalyst
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X
25g ¥25,700

0.96525

1.4428Reference Compound 11
TRIMETHYLAMINOSILANE

Si

NH2

C3H11NSi

89.21

SILICONBr-

O(-90°)

Unstable - loses NH3 at room temperature to form hexamethyldisilazane
Reference compound. Data is provided for investigators. Not offered for sale by Gelest.

[7379-79-5]

SIT8430.0

TRIMETHYLBROMOSILANE
BROMOTRIMETHYLSILANE
C3H9BrSi

Si

Br

153.0980°(-44°)
1.1725
1.422
ΔHform: -294 kJ/moleFlashpoint: -3°C (27°F)
ΔHvap: 30.8 kJ/mole
Ionization potential: 10.24 eV
Dipole moment: 2.34 debye
Review of synthetic utility.1
Converts acid chlorides to acid bromides.2
Deesterifies phosphorus esters.3
Converts nitroalkanes to nitroalkenes.4
Catalyzes the cross-coupling of heteroaromatics.5
Used in the synthesis of unsymmetrical phosphine oxides.6
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 92-100.
2. Schmidt, A. H. et al. Synthesis 1981, 216.
3. Chovinard, P. M.; Bartlett, P. A. J. Org. Chem. 1986, 51, 75.
4. Kunetsky, R. A. et al. Tetrahedron Lett. 2005, 46, 5203.
5. Kita, Y. et al. J. Am. Chem. Soc. 2009, 131, 1668.
6. Fougére, C. et al. Eur. J. Org. Chem. 2009, 6048.
F&F: Vol. 9, p 73; Vol. 10, p 59; Vol. 11, p 59; Vol. 12, p 799; Vol. 15, p 51; Vol. 16, p 50; Vol. 18, p 380; Vol. 19, p 373; Vol. 20, p 404.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2857-97-8]
TSCA EC 220-672-0 HMIS: 3-4-2-X
25g ¥7,600
2.5kg ¥189,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIAL

PR

Cl-

O

COMPOUNDS

N,N,N-TRIMETHYL-3-(TRIMETHOXYSILYL)-1-PROPANAMINIUM CHLORIDE
C9H24ClNO3Si
257.83

381

Name

Mw

bp °C/mm(mp °C)

D420

nD20

57.6°
(-57.7°)0.8580Flashpoint: -27°C (-17°F)
TOXICITY: ihl mouse, LDLo: 500 mg/m3/10M
Autoignition temperature: 395˚C
Vapor pressure, 20°: 190 mm
Vapor pressure, 50°: 591 mm
Critical temperature: 224.6°C
Critical pressure: 31.6 atm

1.3885

SIT8510.0

TRIMETHYLCHLOROSILANE
TMCS
C3H9ClSi

O
O
F

Cl

O

O

+ H2NCO2Et

COMMERCIAL

Si

108.64
Viscosity: 0.47 cSt
ΔHcomb: -2,989 kJ/mole
ΔHform: -354 kJ/mole
ΔHvap: 27.6 kJ/mole
Dipole moment: 2.09 debye
Surface tension: 17.8 mN/mSpecific heat: 1.76 J/g/°
Coefficient of thermal expansion: 1.2 x 10-3
Most economical and broadly used silylation reagent
Review of synthetic utility.1
Enhances Claisen rearrangement.2
Enhances the deprotection of tBOC-protected amino acids.3
Enhances ethylene glycol ketalization reaction.4
Catalyzes the formation of chlorohydrin esters from diols.5
Reviewed as water scavenger in reactions of carbonyl compounds.6
Facilitates Michael additions.7

Me3SiCl (1.1 eq.)

FeCl3•6H2O (5 mol%)rt, 12 h, 89%

NHCO2Et

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 170-182.
2. Snider, B. B.; Hawryluk, N. A. Org. Synth. 2000, 2, 635.
3. Chen, B. C. et al. J. Org. Chem. 1999, 64, 9294.
4. Chan, T. H. et al. Synthesis 1983, 203.
5. Eras, J. et al. J. Org. Chem. 2002, I, 8631.
6. Volochnuk, D. M. et al. Synthesis 2009, 3719.
7. Xu, L. W. et al. Chem. Commun. 2003, 2570.
F&F: Vol. 1, p 1232; Vol. 2, p 435; Vol.3, p 310; Vol. 4, p 32, p 537; Vol.5, p 709; Vol. 6, p 25; Vol. 7, p 66; Vol. 8, p 107; Vol. 9, p 112;
Vol. 10, p 96; Vol. 11, p 125; Vol. 12, p 126; Vol. 13, p 165; Vol. 14, p 175; Vol. 15, p 89; Vol. 16, p 85; Vol. 17, p 79; Vol. 19, p 374; Vol.
20, p 348, p 380, p 404; Vol.21, p 453.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[75-77-4](既) 2-2041
TSCA EC 200-900-5 HMIS: 3-4-2-X
25g ¥3,400
750g ¥14,400
3kg ¥60,000

SIT8510.1

TRIMETHYLCHLOROSILANE, 99+%

Si

C3H9ClSi

Cl

108.6457.6°
Flashpoint: -27°C (-17°F)

Redistilled “silylation” grade
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[75-77-4](既) 2-2041
TSCA EC 200-900-5 HMIS: 3-4-2-X
25g ¥5,300

0.85801.3885750g ¥25,100

SIT8515.0

TRIMETHYLETHOXYSILANE

PR
Si

ΔHcomb: 4,062 kJ/mole
ΔHvap: 140.2 kJ/mole
Dipole moment: 1.2 debyeO

118.25Anti-structuring additive for silicone rubber
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1825-62-3](既) 2-2052
TSCA EC 217-370-6 HMIS: 2-4-1-X

75-6°(-83°)
0.7573
Flashpoint: -27°C (-17°F)
TOXICITY: oral rat, LDLo: 1,400 mg/kg
Vapor pressure, 22°: 111 mm
Critical temperature: 233°C
25g ¥3,400

1.5kg ¥37,000

16-8°(-74°)

14kg ¥229,000

SIT8525.0

TRIMETHYLFLUOROSILANE

Si

C3H9FSi

F

Si

Cl

382

0.7930AIR TRANSPORT FORBIDDEN

Flashpoint: -35°C (-31°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[420-56-4]
TSCA EC 206-997-0 HMIS: 3-4-1-X
100g inquire* includes gas dispensing cylinder zCYL-G-0325

GET8561

Cl

Ge

92.19

TRIMETHYLGERMYLTRICHLOROSILANE

Cl

C3H9Cl3GeSi

252.1465-6° / 22

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[150112-38-2]
HMIS: 3-2-1-X
10g ¥41,500

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.3742www.gelest.com

COMMERCIALETHOXYTRIMETHYLSILANE
C5H14OSiEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8564.0

TRIMETHYLIODOSILANE
TRIMETHYLSILYL IODIDEC3H9ISiCOMMERCIAL

I

O
O
F

Si

200.10106-7°
1.470
1.4742
Stabilized with copper granules
Flashpoint: -2°C (28°F)
ΔHform: -218 kJ/mole
Vapor pressure, 25°: 40 mm
Dipole moment: 2.46 debye
Key reviews.1,2,3,4
Reagent for cleavage of ethers, esters, lactones.3
Used to dechlorinate aryl chlorides.4
Allylates aldehydes in the presence of allyl chloride and tin tetraiodide (SNT7946).5
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 325-336.
2. Olah, G. et al. In Advances in Silicon Chemistry; Larson, G., Ed.; JAI Press: Greenwich, Co, 1991; Vol. 1, p.1.
3. DePew, K. M. et al. J. Org. Chem. 1999, 121, 11953.
4. Sako, M. et al. J. Org. Chem. 2001, 66, 3610.
5. Masuyama, Y. et al. Tetrahedron Lett. 2005, 46, 2861.
F&F: Vol. 8, p 261;Vol. 9, p 19, p 55, p 113, p 151, p 216; Vol. 11, p 253, p 271, p 481; Vol. 12, p 259; Vol. 16, p 188; Vol. 18, p 383; Vol.
19, p 119, p 376; Vol. 20, p 407; Vol.21, p 458.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[16029-98-4]
TSCA EC 240-171-0 HMIS: 3-4-1-X
25g ¥8,300
100g ¥31,800
2.5kg ¥260,000
TRIMETHYLMETHOXYSILANE

0.7560Si

O100g ¥16,700

1.3678COMMERCIAL

104.2257-8°
ΔHcomb: 3,801 kJ/moleFlashpoint: -11°C (12°F)
Dipole moment: 1.18 debye
Forms lithiomethyl(methoxy)dimethylsilane upon reaction w/ tert-butyllithium.1
1. Bates, T. F. et al. J. Organometal. Chem. 2000, 595, 87.
F&F: Vol. 14, p 119.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1825-61-2](既) 2-2052
TSCA EC 217-369-0 HMIS: 3-4-1-X
25g ¥5,900
C4H12OSi

1.5kg ¥57,000

SIT8567.0

2,2,4-TRIMETHYL-1-OXA-4-AZA-2-SILACYCLOHEXANE

O
N

Si

TRIMETHYLSILAMORPHOLINEC6H15NOSi

145.28Masked hydroxyl group
Catalyst for urethane foams.1
1. Dahm, M. et al. U.S. Patent 3,620,984, 1971.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[10196-49-3]
TSCA EC 233-487-5 HMIS: 3-3-1-X

63° / 47

0.907

1.435

0.768

1.384

25g ¥16,200

COMPOUNDS

SIT8566.0

2,4,4-TRIMETHYLPENTYLTRICHLOROSILANE - see SII6457.0 ISOOCTYLTRICHLOROSILANE
TRIMETHYL-n-PROPOXYSILANEO

C6H16OSi

132.28HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-2052
TSCA EC 217-371-1 HMIS: 2-4-1-X[1825-63-4]

101-2°
Flashpoint: 10°C (50°F)
100g ¥44,300

SIT8570.0

TRIMETHYLSILANE
3MS
C3H10Si

ΔHcomb: -3,206 kJ/mole
ΔHform: -163 kJ/mole
ΔHvap: 24.3 kJ/mole
Dipole moment: 0.52 debye

Si

H

74.20

6.7°
(-135.9°)
0.6386.7
Flashpoint: <-20°C (<-4°F)
TOXICITY: ihl rat, LC50: >5,000 ppm/1H
Autoignition temperature: 320˚C
Vapor pressure, 25˚: 1,218 mm
Critical temperature: 158.85°C
Critical pressure: 31.48 atm

Forms trimethylsilylalkanes from olefins w/Pt catalyst
Employed in plasma treatment of surfaces.1
Treatment of titanium alloys and stainless steel surfaces inhibits biofilm formation.2
1. Hendricks, N. et al. Semiconductor Int’l. 2000, 23, 95.
2. Ma, Y. et al. Antimicrob. Agents Chemother. 2012, 56, 5923.
F&F: Vol. 1, p 1235; Vol. 2, p 441; Vol. 13, p 101; Vol. 16, p 292.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[993-07-7]
TSCA EC 213-603-0 HMIS: 2-4-1-X
100g inquire
1kg inquire* Prices include gas dispensing cylinder

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALPRSi

SILICON

SIT8568.0

383

Name

Mw

bp °C/mm(mp °C)

D420

nD20

90.20
99°
(9.5°)
0.8139Contains hexamethyldisiloxane
Flashpoint: 1°C (34°F)
ΔHform: 603 kJ/mole
Autoignition temperature: 395˚C
ΔHvap: 41.6 kJ/mole
Surface tension: 18.4 mN/mCondenses to form hexamethyldisiloxane
Camphor-like odor
See also SIP6729.2, SIT8332.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[1066-40-6](既) 2-589
TSCA
HMIS: 2-3-1-X store <5°C
25g ¥22,500
100g ¥65,500

1.3889

SIT8570.3

TRIMETHYLSILANOL, tech-95
HYDOXYTRIMETHYLSILANE
C3H10OSiSi

OH

TRIMETHYLSILANOL, POTASSIUM SALT - see SIP6901.0 POTASSIUM TRIMETHYLSILANOLATE

SIT8570.5
OO

2-TRIMETHYLSILOXY-4-ALLYLOXYDIPHENYLKETONEC19H22O3Si

326.47

182-4° / 0.4

Polymerizeable UV blocking agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[106359-89-1]
HMIS: 2-1-1-XO

1.562710g ¥12,500

1.013

1.509550g ¥39,500

SIT8570.7

O

2-TRIMETHYLSILOXYBENZALDEHYDE

194.31

C10H14O2Si

O

1.08

O
O
F

Si

Si

142° / 25

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1078-31-5]
TSCA EC 241-831-0 HMIS: 2-2-1-X

5g ¥25,200

SIT8570.8

O 4-TRIMETHYLSILOXYBENZALDEHYDE

Si

194.31

C10H14O2Si

83-4° / 3

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1012-12-0]
EC 213-789-3 HMIS: 2-2-1-X

O

1.518

5g ¥28,900

SIT8571.0

1-(TRIMETHYLSILOXY)-1,3-BUTADIENE

142.27C7H14OSi

Review of synthetic utility.
Reacts with phenylsulfenyl chlorides at γ-position.2
Used in efficient enantioselective synthesis of tamiflu.3
Undergoes Diels-Alder reactions with high stereoselectivity.4
1

O

Si

OSiMe3

Me3SiO

MeO2C

PR

+

131°
Flashpoint: 25°C (77°F)

Me3SiO

CO2Me

pressure

0.811

1.4480

CO2Me+

CH2Cl2
75%

H

50:1

H

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 677-680.
2. Fleming, I. et al. Tetrahedron Lett. 1979, 20, 3205.
3. Yamatsugu, K. et al. Angew. Chem., Int. Ed. Engl. 2009, 48, 1070.
4. Rigby, J. H.; Kierkus, P. C. J. Am. Chem. Soc. 1989, 111, 4125.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[6651-43-0]
HMIS: 2-3-1-X
25g ¥53,800

SIT8571.2

2-(TRIMETHYLSILOXY)-1,3-BUTADIENEVINYLMETHYLKETONE, TRIMETHYLSILYLENOL ETHER
C7H14OSi

Si
O

384

144.2750-5° / 50
Flashpoint: 12°C (54°F)

0.807

1.4290

Review of synthetic utility.1
Undergoes photocyclization to 2-cycloalkenones, yielding bicyclic vinylcyclobutanols.2
Copolymerizes with styrene using AIBN.3
Useful Diels-Alder diene yielding substituted cyclohexanones.4
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 681-684.
2. Demuth, M. et al. Helv. Chim. Acta 1988, 71, 1392; F&F 15: 346.
3. Penelle, J. et al. Polymer Preprints 1996, 37, 521.
4. F&F: Vol. 7, p 401; Vol. 12, p 539.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[38053-91-7]
HMIS: 3-4-1-X store <5°C
5g ¥17,800
25g ¥60,700

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

(111°)

0.819

1.4043

SIT8571.25

3-(TRIMETHYLSILOXY)-1-BUTYNE

O

142.27C7H14OSiSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-3-1-X[17869-76-0]

Flashpoint: 6°C (43°F)
5g ¥12,500

TRIMETHYLSILOXYCYCLOHEXENE - see SIC2462.0 (CYCLOHEXENYLOXY)TRIMETHYLSILANE
TRIMETHYLSILOXYCYCLOPENTENE - see SIC2552.0 (CYCLOPENTENYLOXY)TRIMETHYLSILANE

SIT8571.28(S)-2-[TRIMETHYLSILOXY(DIPHENYL)METHYL]PYRROLIDINEC20H27NOSi
O

H

N
H

325.52

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[937202-23-8]
HMIS: 3-2-1-X

Si

(73°)
0.5g ¥61,800

OOF(TRIMETHYLSILOXYETHYL) METHACRYLATE - see SIM6481.0 METHACRYLOXYETHOXYTRIMETHYLSILANE

SIT8571.3

0.950

Si

O

O

O

OAc

+

NO2

O

OSiMe3O

PPh3 (20 mol%)
THF, 0 - 80°
88%

O

1.436

O

NO2

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 684-693.
2. Casiraghi, G. et al. Synlett 2009, 1525.
3. Akiyama, T. et al. Adv. Synth. Catal. 2008, 350, 399.
4. Singh, R. P. et al. J. Am. Chem. Soc. 2010, 132, 9558.
5. Cho, C.-W.; Krische, M. J. Angew. Chem., Int. Ed. Engl. 2004, 43, 6689.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[61550-02-5]
HMIS: 2-4-1-X
5g ¥46,900

SIT8571.5

Si

O

F
F

2-TRIMETHYLSILOXY-1,1,1,5,5,5-HEXAFLUOROPENT-2-ENE-4-ONE
C8H10F6O2Si
280.25FFF

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[75108-40-6]
HMIS: 4-3-1-X

PR

F

O

125-7°(> 150˚C dec.)

10g ¥28,600

COMPOUNDS

156.2640-2° / 25
Inhibited with BHT
Flashpoint: 18°C (64°F)
Review of synthetic utility.1
Reviewed with other similar heterocycles.2
Used in a vinylogous Mannich reaction to form aminomethyl butenolides.3
Employed in asymmetric vinylogous aldol reaction with aldehydes.4
Adds to allyl acetates to form 5-allyl-γ-butenolides.5

C7H12O2Si

SILICON

2-(TRIMETHYLSILOXY)FURAN

SIT8572.0

2-TRIMETHYLSILOXYPENT-2-ENE-4-ONE

Si

O

4-(TRIMETHYLSILOXY)-3-PENTEN-2-ONE
C8H16O2Si

O

172.3063° / 3
Flashpoint: 58°C (136°F)

0.912

1.4530Adhesion promoter for photoresists on silicon nitride and titanium nitride.1
1. Endo, M. et al. Micro- and Nanopattering Polymers ACS Symposium; 1998, 706, 337.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13257-81-3]
TSCA EC 236-252-5 HMIS: 3-2-1-X
25g ¥21,500

SIT8572.3

N

1-(TRIMETHYLSILOXY)PHENYLACETONITRILEO

C11H15NOSi

Si

劇物

205.3391° / 0.5

0.978

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[25438-37-3]
HMIS: 3-2-1-X
1.0g ¥23,100

2-TRIMETHYLSILOXYPROPENE - see SII6460.0 ISOPROPENOXYTRIMETHYLSILANE

Si

O

Cl

Cl

Si

SIT8572.6

TRIMETHYLSILOXYTRICHLOROSILANE

128°
Flashpoint: 16°C (61°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2750-45-0]
HMIS: 3-4-1-X
25g ¥22,500
C3H9Cl3OSi2

Cl

www.AZmax.co.jp

TEL: 03-5543-1630

223.63

Gelest, Inc.

(215) 547-1015

1.1405www.gelest.com

1.4032

385

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.897

1.386625

0.88725

1.426425

SIT8572.7

TRIMETHYLSILOXYTRIETHOXYSILANE
Si

Si

62° / 9Flashpoint: >65°C (>150°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

OO

252.46

C9H24O4Si2OO25g ¥22,500[17861-35-7]

SIT8572.8

11-(TRIMETHYLSILOXY)UNDECYLTRIETHOXYSILANE
O
O

Si

11

406.75

C20H46O4Si2

O

Si

145° / 0.3

Masked hydroxyl - deprotected after deposition with acidic aqueous ethanol
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[75389-03-6]
HMIS: 2-1-1-X

O

5g ¥42,700

OOF

SIT8575.0

N-(TRIMETHYLSILYL)ACETAMIDE

O

131.25C5H13NOSi

N
H

Si

104° / 35(46-9°)
Flashpoint: 70°C (158°F)
TOXICITY: ipr mouse, LDLo: 350 mg/kg

Forms volatile TMS ethers from alcohols and sugars.
F&F: Vol. 1, p 1235.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13435-12-6]
TSCA EC 236-565-7 HMIS: 3-2-1-X

25g ¥16,200

100g ¥44,800

TRIMETHYLSILYL ACETATE - see SIA0110.0 ACETOXYTRIMETHYLSILANE

SIT8577.0

OSi

2-(TRIMETHYLSILYL)ACETIC ACID

132.2490-95° / 10
(40-2°)
Dissociation constant (Ka): 0.60 x 105
Flashpoint: 73°C (163°F)
1Intermediate for preparation of trimethylsilylketene.
1. Olah, G. et al. Synthesis 1989, 568.
F&F: Vol. 6, p 631.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2345-38-2]
TSCA EC 219-067-4 HMIS: 2-2-0-X
2.5g ¥33,200
C5H12O2Si

OH

SIT8579.0

TRIMETHYLSILYLACETONITRILE
TMSAN
C5H11NSi

劇物

113.2349-51° / 10
Flashpoint: 50°C (122°F)

Review of synthetic utility.1
Following lithiation with LDA may be alkylated with organobromides.2
Cyanomethylates quinolinium methiodides.3

N

PR

Me

I

Si

N

CsF, MeCN

CN

N

+

N

Me

Me

α-lithio derivative reacts with aldehydes to give (Z)-α,β-unsaturated nitriles.4
Used to cyanomethylation of aryl bromides.5
Minireview.6
Under lithium acetate catalysis reacts to cyanomethylate aldehydes and ketones.7

O

H

R

+

Me3Si

CN

1.4204CN

Me3SiCH2CN

-

0.829

OH

1. AcOLi (10 mol%)
DMF, 0°, 3h
2. HClaq, rt
91 - 98%

RCN

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 564-569.
2. Mauze, B. et al. J. Organomet. Chem. 1980, 411, 69.
3. Diaba, F. et al. J. Org. Chem. 2000, 65, 907.
4. Furuta, K. et al. Bull. Chem. Soc. Jpn. 1984, 57, 2768.
5. Wu, L.; Hartwig, J. F. J. Am. Chem. Soc. 2005, 127, 15824.
6. Merino-Montiel, P. Synlett 2009, 507.
7. Kawano, Y. et al. Chem. Lett. 2005, 34, 1508.
F&F: Vol. 10, p 427; Vol. 11, p 571, p 591.
See also SIC2446.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18293-53-3]
EC 242-169-5 HMIS: 3-3-0-X
5g ¥25,200
25g ¥90,400

TRIMETHYLSILYLACETYLENE - see SIE4904.0 ETHYNYLTRIMETHYLSILANE
TRIMETHYLSILYLALLYLAMINE - see SIA0402.0 ALLYLAMINOTRIMETHYLSILANE
TRIMETHYLSILYLALLYL ALCOHOL - see SIA0480.0 ALLYLOXYTRIMETHYLSILANE

386

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.876

1.4140

SIT8580.0

TRIMETHYLSILYL AZIDE, 96%

AZIDOTRIMETHYLSILANE
C3H9N3Si
115.2195-6°(-95°)CAUTION: HIGHLY TOXICCAN FORM EXPLOSIVE PRODUCTS WITH MONOVALENT HEAVY METALS (Cu, Ag, Pb) AND VINYLSILANES

Flashpoint: 30°C (86°F)
Autoignition temperature: 300˚C

Replaces hydrazoic acid
Soluble in hydrocarbons
Review of synthetic utility.1
Used in the preparation of glycosyl azides.2
OAc

AcO

O

N-

OAc

OAc

N3

Reacts with terminal acetylenes and allyl carbonates to give 1-allyl-3-substituted 1,2,3-triazoles.3
Used to prepare the energetically unstable 2,5,8-triazido-s-heptazine.4
Converts alcohols directly to azides with complete inversion.5
Used in a one-pot, click-conversion of amines to triazoles.6
Converts allyl alcohols to allyl azides.7
Reaction with bridged bicyclic olefins leads to 1,2,3-triazoles by retro-Diels-Alder reaction.8
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 26-31.
2. Soli, E. D.; DeShong, P. J. Org. Chem. 1999, 64, 9724.
3. Kamijo, S. et al. J. Am. Chem. Soc. 2003, 125, 7786.
4. Miller, D. R. et al. J. Am. Chem. Soc. 2004, 126, 5372.
5. Mukaiyama, T. et al. Chem. Lett. 2008, 37, 1072.
6. Savonnet, M. et al. J. Am. Chem. Soc. 2010, 132, 4418.
7. Ruepling, M. et al. Org. Lett. 2012, 15, 768.
8. Peterson, W. et al. J. Organomet. Chem. 1976, 121, 285.
F&F: Vol. 1, p 1236; Vol. 3, p 316; Vol. 5, p 354, p 719; Vol. 6, p 561, p 632; Vol. 9, p 21; Vol. 10, p 14, p 113; Vol. 11, p 32; Vol. 12, p
37; Vol. 13, p 34; Vol. 14, p 25; Vol. 15, p 16, p 342; Vol. 16, p 17; Vol. 17, p 23,p 157,p 378; Vol. 18, p 379, p 380; Vol. 19, p 371; Vol.
20, p 201,p 403; Vol. 21, p 151.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4648-54-8]
TSCA EC 225-078-5 HMIS: 4-3-2-X
10g ¥12,500
50g ¥39,500

SIT8580.7

O

S

TBAF

AcO

Si

O

TRIMETHYLSILYL BENZENESULFONATE
C9H14O3SSi

230.36HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 241-833-1 HMIS: 3-4-1-X[17882-06-3]

154-6° / 12Flashpoint: 8°C (48°F)

1.138

1.49301.054

1.5450

1.299

1.444

0.760

1.444

25g ¥33,200

SIT8581.0

Si

C9H13N3Si

191.31HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-3-1-X

PRN

1-TRIMETHYLSILYLBENZOTRIAZOLE

N[48183-36-4]

125-6° / 3
Flashpoint: 26°C (79°F)

COMPOUNDS

N+

O

Br

Me3SiN3

O
O
F

AcO

N

Si

O

SILICON

AcO

OAc

10g ¥31,000

N

SIT8582.0

TRIMETHYLSILYL BROMOACETATEOBr

C5H11BrO2Si

O

Si

211.13

Undergoes Reformatsky reactions.
1. Boldrini, G. et al. J. Org. Chem. 1983, 48, 4108.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18291-80-0]
EC 242-165-3 HMIS: 3-2-1-X
157° / 9Flashpoint: 47°C (117°F)

25g ¥19,900

SIT8582.5

3-(TRIMETHYLSILYL)-1,2-BUTADIENE, 95%
1-METHYL-1-(TRIMETHYLSILYL)ALLENE
C7H14SiC

Si

126.27111-2°
Contains 1-trimethylsilyl-1-butyne
Employed in [3+2] annulations of five-membered rings.1
1. Danheiser, R. et al. J. Am. Chem. Soc. 1981, 103, 1604.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[74542-82-8]
HMIS: 2-4-1-X store <5°C
1.0g ¥51,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

387

Name

Mw

bp °C/mm(mp °C)

D420

nD20

82° / 35
Flashpoint: 50°C (122°F)

0.85

1.4449156°
Flashpoint: 28°C (83°F)
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5930-98-3]
HMIS: 2-3-0-X
5g ¥21,500

0.854

1.4415

SIT8583.0

1-TRIMETHYLSILYLBUT-1-YNE-3-OL

Si

Phosphate ester adds to α,β-unsaturated malonates.
Useful in silicon-mediated Sonogashira cross-coupling reactions to give substituted propargyl alcohols.2
1. Song, Y. et al. Org. Lett. 2001, 3, 3543.
2. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[6999-19-5]
HMIS: 2-2-1-X
10g ¥18,300
1

SIT8583.2

O

4-TRIMETHYLSILYLBUT-3-YN-2-ONE

Si

C7H12OSi

140.26

O

S

O
O
F

SIT8584.0

OCl

142.27C7H14OSiHO

TRIMETHYLSILYLCHLOROSULFONATE, 95%
C3H9ClO3SSi

Si

188.7162-4° / 10
Flashpoint: 42°C (108°F)

1.23

1.424

49-50° / 10
Flashpoint: 30°C (86°F)

0.897

1.4252

Sulfonation reagent.
1. Schmidt, M. et al. Chem. Ber. 1962, 95, 47.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[4353-77-9]
EC 224-425-8 HMIS: 3-2-1-X
50g ¥23,600
1O

SIT8584.5

TRIMETHYLSILYL CROTONATEO

158.27

See also SIA0320.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18269-64-2]
HMIS: 3-3-1-X

5g ¥27,800

PR

O

Si

TRIMETHYLSILYL-2-BUTENOIC ACID
C7H14O2Si

388

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

99.21

118-9°(11-12°)0.744

1.3920

SIT8585.0

TRIMETHYLSILYLCYANIDETRIMETHYLSILYLNITRILE
C4H9NSi
劇物
CAUTION: HIGHLY TOXICAIR TRANSPORT FORBIDDEN

Contains trimethylchlorosilane

Flashpoint: 1°C (34°F)
Vapor pressure, 37˚: 37.3 mm
Yields cyanohydrins by reaction w/ ketones in the presence of Lewis acid catalysts
1,2Reviews.
Efficient conversion of carbonyls to cyanohydrins catalyzed by Cu(II) trifluoromethanesulfonate.3
Treatment with methanol generates HCN solutions.4
Adds to aldehydes with high stereoselectivity.5
Adds HCN to benzylhydrazones.6
NHBz
NHBz
Hf(OTf)4, Me3SiCN
N
HN
MeCN, rt

O
O
F
R

H

R

CN

79 - 99%

Opens epoxides with high enantioselectivity.7

Si

CN

NC

OH

1. Me3SiCN, AgOTf
2. NaHCO3 aq

PR

Used to protect aldehydes in formation of aldehyde-functional Grignard reagents.9
Undergoes very rapid Al-MCM-41-catalyzed reactions with aldehydes and ketones.10
Converts alcohols to isocyanides in good yields.11
Oxidatively α-cyanates tertiary amines.12
Employed in 3-component, one-pot Strecker conversion of aldehydes to α-amino nitriles.13,14
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 184-189.
2. Rasmussen, J. et al. In Advances in Silicon Chemistry; Larson, G., Ed.; JAI Press: Greenwich, Co, 1991; Vol. 1, p65.
3. Saravanan, D. et al. Tetrahedron Lett. 1998, 39, 3823.
4. Vachel, P.; Jacobsen, E. N. Org. Lett. 2000, 2, 867.
5. Belokon, Y. N.; North, M. Org. Lett. 2000, 2, 1617.
6. Manabe, K. et al. J. Org. Chem. 1999, 64, 8054.
7. Schaus, S. E.; Jacobsen, E. N. Org. Lett. 2000, 2, 1001.
8. Kitano, Y. et al. Synthesis 2001, 437.
9. Liu, C.-Y. et al. Org. Lett. 2006, 8, 617.
10. Iwanami, K. et al. J. Chem. Soc., Chem. Commun. 2008, 1002.
11. Okada, I.; Kitano, Y. Synthesis, 2011, 3997.
12. Han. W.; Ofial, A. R. J. Chem. Soc., Chem. Commun. 2009, 5024.
13. Karmekar, B.; Banerji, J. Tetrahedron Lett. 2010, 51, 2748.
14. Niknam, K. et al. Tetrahedron Lett. 2010, 51, 2959.
F&F: Vol. 4, p 542; Vol. 5, p 720; Vol. 6, p 632; Vol. 7, p 397; Vol. 8, p 133; Vol. 9, p 127; Vol. 10, p 1, p 112; Vol. 11, p 147; Vol. 12, p
148; Vol. 13, p 87; Vol. 14, p 107; Vol.15, p 102; Vol. 16, p 100, p 33, p 339; Vol. 18, p 381; Vol. 19, p 375; Vol. 20, p 405; Vol. 21, p
455.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7677-24-9]
TSCA EC 231-657-3 HMIS: 4-4-1-X
25g inquire
1.5kg inquire* includes liquid dispensing cylinder zCYL-L-2400

COMMERCIALN

YbCl3, chiral ligand

COMPOUNDS

Converts tertiary alcohols to isocyanides.8

OSiMe3

Me3SiCN, Mecn

SILICONO

SIT8585.1

TRIMETHYLSILYLCYANIDE, 99%

N

Si

TRIMETHYLSILYLNITRILE
C4H9NSi
劇物
CAUTION: HIGHLY TOXICAIR TRANSPORT FORBIDDEN

99.21

118-9°

Flashpoint: 1°C (34°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7677-24-9]
TSCA EC 231-657-3 HMIS: 4-4-1-X
25g inquire

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015(11-12°)0.744

1.3920250g inquire

www.gelest.com

389

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.72

1.436

SIT8588.0

TRIMETHYLSILYLDIAZOMETHANE, 2.0M in hexanes
C4H10N2Si

29-32 wgt %ΔHform: 24 kJ/mole
Decomposes on exposure to UVReview.1
Methenylates α-fluoro ketones.2
Converts aldehydes to acrylonitriles.3
Converts benzyl bromides to styrenes.4

Br
MeOOC

+ Me3SiCHN2

N+

N

Si

96°
Flashpoint: -22°C (-8°F)

Pd2dba3CHCl3 (2.5 mole %)AsPh3 (15 mole %)

MeOOC

56%

O
O
F

Homologates organoboranes.5
Converts acid chlorides to diazomethylketones.6
PhO-

114.22NO2Cl

Me3SiCHN2

THF, 0 - 23°C

Ph

O

N2

F

NO2

F

Converts aldehydes to terminal olefins.7
Chloromagnesium reagent reacts with α-keto esters to give t-butylpropiolates.8
Forms trimethylsilylcyclopropanes with enones.9
Converts alcohols to terminal olefins in a tandem oxidation-olefination sequence.10
Reacts with propargylic esters to form functionalized (Z)-1-trimethylsilyl-1,3-dienes.11
1. Anderson, R.; Anderson, S. Trimethylsilyldiazomethane. In Advances in Silicon Chemistry; Larson, G., Ed.; JAI Press: Greenwich,Co, 1991; Vol. 1, p 303.
2. Label, H.; Paquet, V. Org. Lett. 2002, 4, 1671.
3. Furuta, K. et al. Bull. Chem. Soc. Jpn. 1984, 57, 2768.
4. Greenman, K. L. et al. Tetrahedron 2001, 57, 5219.
5. Goddard, W. J.-P. et al. Org. Lett. 2000, 2, 1455.
6. Myers, A. G. et al. J. Am. Chem. Soc. 2001, 123, 7207.
7. Lebel, H.; Paquet, V. J. Am. Chem. Soc. 2004, 126, 320.
8. Hari, Y. et al. Tetrahedron Lett. 2008, 49, 4965.
9. Glass, A. C. et al. Org. Lett.. 2008, 10, 4855.
10. Davi, M.; Lebel, H. Org. Lett. 2009, 11, 41
11. Bray, C. V.-L. et al. Angew. Chem., Int. Ed. Engl. 2009, 48, 1439.
F&F: Vol. 4, p 543; Vol. 8, p 198; Vol. 10, p 431; Vol. 11, p 573; Vol. 12, p 538; Vol. 13, p 327; Vol. 15, p 344; Vol. 16, p 361; Vol. 19, p
55; Vol. 20, p 405, p 406; Vol. 21, p 128, p 239, p 456.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18107-18-1]
TSCA-L
HMIS: 4-3-1-X
25g ¥31,800

SIT8588.3

TRIMETHYLSILYLDIAZOMETHANE, 2M in diethyl ether

N+

-

0.773
Flashpoint: -40°C (-40°F)
TOXICITY: dermal rbt, LD50: >1,000 mg/kg
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[18107-18-1]
TSCA-L
HMIS: 4-4-1-X
25g ¥29,700
C4H10N2Si

28-32 wgt %114.22

PR

N

Si

F

O

F

390

SIT8588.4

F

O

S

O

O

Si

TRIMETHYLSILYL 2,2-DIFLUORO-2-(FLUOROSULFONYL)ACETATEC5H9F3O4SSi
250.27
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-3-1-X[120801-75-4]

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

156°
Flashpoint: 26°C (79°F)

1.28

25g ¥40,600(215) 547-1015

www.gelest.com

1.367

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.014

1.5330

SIT8589.0

2-TRIMETHYLSILYL-1,3-DITHIANE

192.42

C7H16S2Si

85° / 1
Flashpoint: 96°C (205°F)

Review of synthetic utility.
Employed in synthesis of acylsilanes.2
With BrF3 converts the oxygen of aldehydes and ketones to difluoromethyl groups.3
Used in the preparation of acylsilanes.4
1

S

S

S

+ MeI

S

Me3Si LiSi

O

HgCl2, CdCO3S

DMSO, H2O
42%

Me3Si

Me3Si

Used in the preparation of unsaturated dithioketene acetals in a Peterson reaction.5
Important reagent for Type I Anion Relay Chemistry (ARC).6
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 604-609.
2. Corey, E. J. et al. J. Am. Chem. Soc. 1967, 89, 434.
3. Cohen, O. et al. Tetrahedron 2009, 65, 1361.
4. Brinkmeyer, R. S. Tetrahedron Lett. 1979, 20, 207.
5. Carey, F. A.; Court, A. S. J. Org. Chem. 1972, 37, 4474.
6. Smith, A. B., III; Wuest, W. M. Chem. Commun. 2008, 5883.
F&F: Vol. 4, p 284; Vol. 10, p 380.
See also SIB1857.7
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[13411-42-2]
EC 236-504-4 HMIS: 2-1-1-X
5g ¥22,500

O
O
F

S

118.25C5H14OSi

Eliminates ethylene in presence of acid or base
Review of synthetic utility.1
Serves as an alcohol equivalent in reaction with aryl iodides.2
Can provide protection for the anomeric center of carbohydrates.3

53-5° / 11
Flashpoint: 56°C (133°F)
Decomposes >120˚C

HO

AcO

AcO

1.436

OAc

OAc

Si

0.945

O

OAc

+

OH

Me3Si

CSA (cat), C6H6

AcO

87%

AcO

NHAc

O

O

NHAc

Si
Me

3

PR

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 622-627.
2. Dibakar, M. et al. Tetrahedron Lett. 2011, 41, 5338.
3. Sowell, C. G. et al. Tetrahedron Lett. 1996, 37, 609.
F&F: Vol. 8, p 510.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2916-68-9]
EC 220-844-5 HMIS: 2-3-0-X
10g ¥28,400
50g ¥103,200

SILICON

2-(TRIMETHYLSILYL)ETHANOLCOMPOUNDS

SIT8589.2

SIT8588.5

2-(TRIMETHYLSILYL)ETHOXYMETHYL CHLORIDE, 95%
SEM-CHLORIDE
C6H15ClOSi

Cl

O

Si

166.72
Stabilized with iPr2MeN
1
Review of synthetic utility.
Hydroxyl group protection reagent, cleaved with fluoride.2
Useful in the introduction of a protected hydroxymethyl moiety.3
O
O
R
N
LDA, SEM-Cl
O-78 to -30¡
84%

57-9° / 8Flashpoint: 46°C (115°F)

1.4350

O

O
O

0.942

N

R

O

SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 628-632.
2. Lipshutz, B. et al. Tetrahedron Lett. 1980, 21, 3343.
3. Eichelberger, U. et al. Tetrahedron 2002, 58, 545.
F&F: Vol. 10, p 431; Vol. 15, p 344; Vol. 16, p 361.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[76513-69-4]
EC 278-483-4 HMIS: 4-3-1-X store <5°C
5g ¥27,800
25g ¥101,000

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

391

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.88

1.5320

1.055

1.475

SIT8588.7

2-[(TRIMETHYLSILYL)ETHYNYL]TOLUENE

188.34

C12H16Si

Si

50-8° / 0.5
Flashpoint: 90°C (194°F)

See also SIP6736.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[3989-15-9]
HMIS: 2-2-0-X store <5°C

5g ¥31,000

SIT8588.8

TRIMETHYLSILYLETHYNYLTRI-n-BUTYLTIN

1-TRIBUTYLSTANNYL-2-TRIMETHYLSILYLACETYLENE
C17H36SiSn
劇物

387.26

128-8° / 22

Converts vinyl mesylates to enynes.1
1. Barret, D. et al. J. Antibiotics 1997, 50, 100.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[81353-38-0]
HMIS: 3-1-0-X

Si

10g ¥29,400

O
O
F

Sn

SIT8589.7

1-TRIMETHYLSILYL-1-HEXYNE

Si

Si

O

154.33

C9H18Si

155°
Flashpoint: 37°C (99°F)

Undergoes Pd-catalyzed hydroesterification to form β-ethoxyvinylsilanes.1
1. Takeuchi, R. J. Chem. Soc., Perkin. Trans. 1 1993, 1031.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[3844-94-8]
HMIS: 2-4-1-X

0.770

1.431

0.860

1.40500.956

1.47565g ¥16,400

SIT8589.8

O-TRIMETHYLSILYLHYDROXYLAMINE, 95%NH2

105.21C3H11NOSi

See also SIB1963.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[22737-36-6]
HMIS: 3-4-1-X

98-9°
Flashpoint: 8°C (48°F)
10g ¥49,100

SIT8590.0

N-(TRIMETHYLSILYL)IMIDAZOLE

140.26C6H12N2Si

Dipole moment: 4.64 debye
pKb: 15.07
Trimethylsilylation reagent specific to hydroxyl groups
Review of synthetic utility.1
Shown to open an epoxide in a syn fashion.2

N

Si

O

O

+

N

N

acetoneN
SiMe3-78°, 0.5 h
90%

O

NH

COMMERCIAL

N

99° / 14
Flashpoint: 40°C (104°F)

OH

PR

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 640-645.
2. Adam, W. et al. J. Am. Chem. Soc. 1991, 113, 8005.
F&F: Vol. 2, p 412; Vol. 3, p 148; Vol. 7, p 399; Vol. 11, p 575.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18156-74-6]
TSCA EC 242-040-3 HMIS: 2-3-1-X
25g ¥6,100
100g ¥21,400
2kg ¥170,000

TRIMETHYLSILYL IODIDE - see SIT8564.0 TRIMETHYLIODOSILANE

SIT8591.0

TRIMETHYLSILYLISOCYANATE, 85%SiN115.21
91°
Hazy liquid; contains hexamethyldisiloxane
Flashpoint: -2°C (28°F)
1Converts Grignards to amides.
Reacts with diamines under pressure to form polyureas.2
1. Zh. Obshch. Khim. 1989, 59, 1202; F&F: 6, 634.
2. DiSalvo, A. U.S. Patent 3,940,370, 1976.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1118-02-1]
TSCA EC 214-256-8 HMIS: 3-4-1-X
25g ¥51,200
C4H9NOSi

C

O

0.867

1.396

0.931

1.4820

SIT8592.0

TRIMETHYLSILYLISOTHIOCYANATESi

N

C4H9NSSi

CS

131.27144°(-33°)
Flashpoint: 35°C (95°F)

Insecticidal, fungistatic activity
Heterocumulene reagent.1
Forms 1,2-diisothiocyanates from olefins with [bis(acetoxy)iodo]benzene.2
1. Neidelhein, R. et al. Synthesis 1975, 51.
2. Bruno, M. et al. Tetrahedron Lett. 1998, 39, 3847.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[2290-65-5]
TSCA EC 218-929-7 HMIS: 3-3-1-X
10g ¥14,600

50g ¥48,000

N-TRIMETHYLSILYLMETHACRYLAMIDE - see SIM6480.6 METHACRYLAMIDOTRIMETHYLSILANE

392

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.826

1.4190TRIMETHYLSILYLMETHACRYLATE - see SIM6491.0 METHACRYLOXYTRIMETHYLSILANE

O

SIT8593.0

O

S

TRIMETHYLSILYL METHANESULFONATE

168.29

C4H12O3SSiSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 233-220-2 HMIS: 3-3-1-X

O

103-4° / 25
Flashpoint: 30°C (86°F)
10g ¥17,800[10090-05-8]

TRIMETHYLSILYLMETHANOL - see SIH6177.0 HYDROXYMETHYLTRIMETHYLSILANE
TRIMETHYLSILYLMETHYL ACETATE - see SIA0060.0 ACETOXYMETHYLTRIMETHYLSILANE
TRIMETHYLSILYLMETHYLAMINE - see SIA0596.0 AMINOMETHYLTRIMETHYLSILANE
N-(TRIMETHYLSILYL)METHYLCARBAMATE - see SIM6574.0 METHYL-N-TRIMETHYLSILYLCARBAMATE
TRIMETHYLSILYL METHYL KETONE - see SIA0130.0 ACETYLTRIMETHYLSILANE

SIT8593.5

TRIMETHYLSILYLMETHYLLITHIUM, 1M in hexane

94.16
13-14 wgt %Flashpoint: -23°C (-9°F)
Selective base for the metallation of pyridines
F&F: Vol. 6, p 635; Vol. 9, p 495; Vol. 10, p 443; Vol. 11, p 581.
See also SIT8594.1
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1822-00-0]
HMIS: 4-4-1-X
100g ¥38,500

0.66

O
O
F

C4H11LiSi

Si

Li

SIT8594.0

Mg

Cl

+

C12H25-n

Me3SiCH2MgCl
CoCl2 (dpph)
Et2O, 20°74%

Highly useful inert ligand for the addition of Grignard reagents to aldehydes and ketones without enolization side reactions.3
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 666-674.
2. Ikeda, Y. et al. J. Am. Chem. Soc. 2002, 124, 6514.
3. Hatano, M. et al. J. Org. Chem. 2010, 75, 5008.
F&F: Vol. 6, p 636; Vol. 10, p 433; Vol. 15, p 343; Vol. 16, p 118; Vol. 18, p 384.
See also SIT8594.1
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13170-43-9]
HMIS: 3-4-2-X
100g ¥28,400

SIT8594.1

Mg

Cl

PR

Si

TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 3M in methyltetrahydrofuran
C4H11ClMgSi
146.9846-48 wgt %Flashpoint: -11°C (12°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13170-43-9]
HMIS: 3-3-2-X
100g ¥40,600

0.912

TRIMETHYLSILYLMETHYL METHACRYLATE - see SIM6485.6 METHACRYLOXYMETHYLTRIMETHYLSILANECOMPOUNDS

Si

n-C12H25Cl

0.777

Flashpoint: -45°C (-49°F)

SILICON

TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 1.0M in diethyl ether
C4H11ClMgSi
146.9819 wgt %Converts carbonyl compounds to olefins - Peterson reaction
Review of synthetic utility.1
Promotes the conversion of alkyl halides to (E)-β-alkylstyrenes.2

SIT8594.5(TRIMETHYLSILYLMETHYL)TRI-n-BUTYLTIN
C16H38SiSn

劇物

377.27146° / 2.5

Treatment with nBuLi affords Me3SiCH2Li, methenylation reagent.1
1. Seitz, D. et al. Synthesis 1981, 557.
F&F: Vol. 11, p 581.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[77425-85-5]
HMIS: 3-1-0-X

SnSi

10g ¥27,100

SIT8595.0

TRIMETHYLSILYLMETHYLTRIFLUOROMETHANESULFONATE, 96%
C5H11F3O3SSi
236.29

Si

O

O

S

O

F

F

Generation of azomethine ylides.1
Review on ylides from α-silylonium salts.2
Ylide precursor.3
Used to prepare imino[60]fullerenes.4
F 1. Padwa, A. et al. J. Org. Chem. 1979, 49, 3314.
2. Vedejs, E.; West, F. G. Chem. Rev. 1986, 86, 941.
3. F&F: Vol. 10, p 434; Vol.12, p 541; Vol. 13, p 329; Vol. 14, p 332.
4. Matsuo, K. et al. Org. Lett. 2009, 11, 4192.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[64035-64-9]
HMIS: 4-2-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

49-51° / 9Flashpoint: 48°C (118°F)

1.182

1.37605g ¥40,000(215) 547-1015

www.gelest.com

393

Name

Mw

bp °C/mm(mp °C)

204.91140°(-74°)

D420

nD20

0.897

1.4410

GET8595.5

Ge

TRIMETHYLSILYLMETHYLTRIMETHYLGERMANE

Si

C7H20GeSi

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2290-62-2]
HMIS: 2-3-0-X

5g ¥40,500

SIT8596.0

N-(TRIMETHYLSILYL)MORPHOLINEON

C7H17NOSiSi

159.30

Reagent for deoxynucleoside synthesis
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13368-42-8]
HMIS: 3-3-1-X

160°
Flashpoint: 27°C (81°F)
25g ¥29,400

TRIMETHYLSILYLNITRILE - see SIT8585.0 TRIMETHYLSILYLCYANIDETRIMETHYLSILYLPEROXIDE - see SIB1868.0 BIS(TRIMETHYLSILYL)PEROXIDESIT8598.0

O

TRIOXA(TRIMETHYLSILOXY)RHENIUM
C3H9O4ReSi

O

Re

O

O
O
F

TRIMETHYLSILYL PERRHENATE

323.3965-75° / 1 sub.

(79-81°)

Soluble: hydrocarbons, THF, chloroform; moisture sensitive
Reacts with Me3SiOR to form ReO3(OR).1
Catalyzes Prins cyclization reaction between homoallylic alcohols and aldehydes.2
1. Hermann, W. et al. Inorg. Chem. 1997, 36, 465.
2. Tadpetch, K.; Rychnovsky, S. D. Org. Lett. 2008, 10, 4839.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16687-12-0]
HMIS: 2-1-1-X store <5°C
2.5g ¥46,400

Si

O

TRIMETHYLSILYLPHENOXIDE - see SIP6723.5 PHENOXYTRIMETHYLSILANE

SIT8598.5

FF
O

2-(TRIMETHYLSILYL)PHENYLTRIFLUOROMETHANESULFONATE
C10H13F3O3SSi
298.35FS

O

70° / 2
Flashpoint: 96°C (205°F)

1.229

1.456

Review of synthetic utility.
Used as a convenient source of in-situ-generated benzyne.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 697-699.
2. Zhang, X.; Larock, R. C. Org. Lett. 2005, 7, 3973.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[88284-48-4]
HMIS: 3-2-1-X
5g ¥35,800
1

O

Si

TRIMETHYLSILYLPIPERIDINE - see SIP6828.6 (N-PIPERIDINO)TRIMETHYLSILANE

SIT8599.0

TRIMETHYLSILYLPROPANESULFONIC ACID SODIUM SALT, monohydrate

O
Na+

-

O

Si

S
O

2,2-DIMETHYL-2-SILAPENTANESULFONIC ACID, SODIUM SALT, DSS
C6H15NaO3SSi∙H2O
218.32/236.34(125° dec.)

Soluble: hot ethanol, water
Water (D2O) soluble reference for NMR.1
1. Konishi, Y.; Scheraga, H. A. Biochemistry 1980, 19, 1316.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[2039-96-5]
TSCA EC 218-031-5 HMIS: 2-1-0-X

5g ¥27,800

PR

SIT8602.0

3-(TRIMETHYLSILYL)-1-PROPANOL

HO

Si

0.832

1.4280170-2°
0.875
Flashpoint: 65°C (149°F)
TOXICITY: oral rat, LD50: 150 mg/kg
Hydromagnesiation of triple bond yields intermediates for terpene synthesis
Useful in silicon-mediated Sonogashira cross-coupling reactions to give substituted propargyl alcohols.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
F&F: Vol. 10, p 70; Vol. 11, p 164.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5272-36-6]
TSCA EC 226-094-5 HMIS: 3-2-0-X
5g ¥21,500
25g ¥75,600

1.4518

C6H16OSi

132.2896-8° / 80Flashpoint: 57°C (135°F)

See also SIH6177.0
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2917-47-7]
TSCA
HMIS: 3-2-1-X

10g ¥25,700

SIT8604.0

3-TRIMETHYLSILYLPROPARGYL ALCOHOL
3-TRIMETHYLSILYL-2-PROPYN-1-OL
C6H12OSiSi

HO

128.25O-TRIMETHYLSILYLPROPARGYL ALCOHOL - see SIP6903.0 PROPARGYLOXYTRIMETHYLSILANE
3-(TRIMETHYLSILYL)PROPARGYL BROMIDE - see SIB1907.0 3-BROMO-1-(TRIMETHYLSILYL)-1-PROPYNE

394

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.920

1.4280

SIT8605.0

3-TRIMETHYLSILYLPROPARGYLMETHACRYLATE, 95%OO
Si

3-METHACRYLOXYPROP-2-YNYLTRIMETHYLSILANE
C10H16O2Si
CAUTION: SENSITIZER

196.32

Forms polymers that undergo “click” chemistry.1,2
1. Quemener, D. et al. J. Polym. Sci., Part A: Polym. Chem. 2008, 46, 155.
2. Ladmiril, V. et al. J. Am. Chem. Soc., 2006, 128, 4823.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[214268-06-1]
HMIS: 3-3-1-X store <5°C
2.5g ¥42,700

SIT8606.0

O

3-TRIMETHYLSILYLPROPIONIC ACID

Si

142.26130-1° / 34
Flashpoint: 74°C (165°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[5683-30-7]
TSCA EC 227-145-4 HMIS: 3-2-0-X
10g ¥31,000

O
O
F

HO

2,2-DIMETHYL-2-SILAPENTANOIC ACID
C6H14O2Si

SIT8606.3
C6H10OSiSi
O

126.2352° / 30
Flashpoint: >25°C (>77°F)

Used in the preparation of 1,3,5-triynes.1
Potential for the synthesis of 3-subsubstituted alkynals.2
1. Mukai, C. et al. J. Org. Chem. 2001, 66, 5875.
2. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[2975-46-4]
HMIS: 2-3-0-X

0.862

1.44320.758

1.409125g ¥42,700

SIT8606.5
C6H12Si

112.2599-100°(-69°)
Flashpoint: -3°C (27°F)(See SSP-070 for polymer)Si5g ¥5,900

25g ¥20,000

1.5kg ¥327,000

SIT8606.6

3-TRIMETHYLSILYLPROPYNOIC ACIDHO

C6H10O2Si

PR

Si

O

142.23105-9° / 10
(47-9°)
Flashpoint: 96°C (205°F)

Potential for the preparation of propiolic acid derivatives.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
See also SIT8623.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[5683-31-8]
HMIS: 3-1-1-X

COMMERCIAL

Forms polymers with very high oxygen permeability.1
Polymerization catalyzed with TaCl5/(C6H5)3Bi.2
Converts aldehydes to 1,3-dienes in presence of Cp2Zr(H)Cl.3
Synthetic reagent.4
Used in the preparation of alkynylxenon fluoride.5
Useful in silicon-mediated Sonogashira cross-coupling reactions.6
1. Masuda, T. et al. J. Am. Chem. Soc. 1983, 105, 7473.
2. Masuda, T. et al. J. Polym. Sci., Part A: Polym. Chem. 1987, 25, 1353.
3. Maeta, H. et al. Tetrahedron Lett. 1992, 33, 5969.
4. F&F: Vol. 2, p 239; Vol. 6, p 638.
5. Schmidt, H. et al. Inorg. Chem. 2004, 43, 1837.
6. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[6224-91-5]
TSCA EC 228-314-5 HMIS: 2-4-0-X

SILICON

1-TRIMETHYLSILYLPROPYNECOMPOUNDS

3-TRIMETHYLSILYLPROPYNAL

5g ¥38,500

SIT8606.7(3-TRIMETHYLSILYL-2-PROPYNYL)TRIPHENYLPHOSPHONIUM BROMIDEC24H26BrPSi
453.44

P+

Br-

Si

Wittig Reagent
Employed in synthesis of terminal enynes.1,2
1. Corey, E. J.; Ruden, R. A. Tetrahedron Lett. 1973, 14, 1495.
2. Corey, E. J. et al. Tetrahedron Lett. 1973, 14, 3963.
HYDROLYTIC SENSITIVITY: 6: forms irreversible hydrate[42134-49-6]
HMIS: 3-2-1-X(166-7° dec.)

5g ¥62,900

2-TRIMETHYLSILYLPYRIDINE - see SIP6942.0 2-PYRIDYLTRIMETHYLSILANE

SIT8609.0

1-TRIMETHYLSILYLPYRROLIDINE, 95%N

Si

C7H17NSi

143.30

Building block in synthesis of nornicotine
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15097-49-1]
TSCA EC 239-149-3 HMIS: 3-4-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

139-40°Flashpoint: 4°C (39°F)

0.821

1.433010g ¥25,700(215) 547-1015

www.gelest.com

395

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.986

1.498

SIT8612.0

2-TRIMETHYLSILYLTHIAZOLEDONDONI REAGENT
C6H11NSSi

N

157.3151-3° / 10
Flashpoint: 62°C (144°F)

Review of synthetic utility.
Convenient substitute for 2-lithiothiazole for introducing various substituents at C-2 of the thiazole ring.2
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 712-719.
2. Dondoni, A. et al. J. Org. Chem. 1988, 53, 1748.
F&F: Vol. 16, p 362.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[79265-30-8]
HMIS: 2-3-1-X
5g ¥51,200
1SiS

2-(TRIMETHYLSILYLTHIOPHENE - see SIT7907.0 2-THIENYLTRIMETHYLSILANE

SIT8612.9

2-TRIMETHYLSILYL-1,2,3-TRIAZOLE

N

141.25

C5H11N3Si

Si

Undergoes Diels-Alder reactions.1
1. Peterson, W. et al. J.Organomet. Chem. 1976, 121, 285.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[13518-80-4]
HMIS: 3-3-1-X

N

145-6°
Flashpoint: 8°C (47°F)

0.952

O
O
F

N

10g ¥61,800

SIT8613.0

1-TRIMETHYLSILYL-1,2,4-TRIAZOLE

N

N

141.25

C5H11N3Si

N

Reagent for preparation of phosphorus triazolides.1
1. Kricheldorf, M. et al. Angew. Chem. 1976, 88, 337.
F&F: Vol. 4, p 66.
See also SIT8612.9
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18293-54-4]
TSCA EC 242-170-0 HMIS: 2-3-1-X

Si74° / 12Flashpoint: 18°C (64°F)

0.989

1.461

1.040

1.48805g ¥14,600

SNT8585

TRI-n-BUTYLSTANNYLTRIMETHYLSILANE
TRIMETHYLSILYLTRI-n-BUTYLTIN
C15H36SiSn

PR

Sn Si

363.22

SIT8616.0

Cl

Cl

TRIMETHYLSILYL TRICHLOROACETATEO

Cl

102-3° / 0.5

Review of synthetic utility.1
Undergoes cis addition to terminal acetylenes with Bu3Sn internal.2
Intermediate for 3-substituted cyclobutenone.3
Sn-Si bond shown to react with COD Pt(cod)2 and phosphines to form bis((phosphino)silyl)tinplatinum(ll) complexes, which insert into
acetylenes.4
Used in the synthesis of α-amidotributylstannanes.5
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 719-723.
2. Chenard, B. et al. J. Org. Chem. 1986, 51, 3561.
3. Liebeskind, L. S. et al. J. Org. Chem. 1994, 59, 7917.
4. Sagawa, T. et al. Organometallics 2003, 22, 4433.
5. Mita, T.; et al. Synthesis 2012, 194.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[17955-46-3]
HMIS: 2-1-1-X
2.5g ¥13,500
10g ¥33,800

235.57C5H9Cl3O2Si

Si

O

Reagent for trichloromethylation of ketones.
1. DeJesus, M. et al. Synth. Commun. 1987, 17, 1047.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[25436-07-1]
EC 246-980-5 HMIS: 3-3-1-X
170-3° / 12Flashpoint: 28°C (82°F)

1.237

1.441

0.949

1.45051.078

1.337010g ¥36,300

SIT8617.0

O

1,3,5-TRIMETHYL-1,3,5-TRIETHOXY-1,3,5-TRISILACYCLOHEXANE
C12H30O3Si3
306.63Si

SiSi

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1747-56-4]
HMIS: 2-2-1-XO

75-6° / 0.05
10g ¥28,900

O

F

TRIMETHYLSILYL TRIFLUOROACETATE

O

F

396

SIT8618.0

FO

C5H9F3O2Si

Si

186.21

For ring opening of cyclopropyl ketones.
1. Demuth. M. et al. Helv. Chim. Acta 1981, 64, 2759.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[400-53-3]
TSCA EC 206-923-7 HMIS: 3-4-1-X

www.AZmax.co.jp

1

TEL: 03-5543-1630

Gelest, Inc.

88-90°
Flashpoint: 0°C (32°F)

10g ¥9,300(215) 547-1015

50g ¥26,800

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

140-1°
Flashpoint: 40°C (104°F)
Autoignition temperature: 405˚C
Vapor pressure, 26°: 14 mm

1.225

1.360

SIT8620.0

TRIMETHYLSILYL TRIFLUOROMETHANESULFONATE
TRIMETHYLSILYLTRIFLATEC4H9F3O3SSi

F

Si

F

S

O

O

O
O
F

O

Review of synthetic utility.1
Reacts with ketones to form silyl enol ethers; Review.2
Enhances the addition of terminal acetylenes to aldehydes.3
Used in the nickel-catalyzed direct phenylation of C-H bonds in heteroaromatic system such as benzoxazoles.4
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 518-537.
2. Simchen, G. In Advances in Silicon Chemistry; Larson, G., Ed.; JAI Press: Greenwich, Co, 1991; Vol. 1, p189.
3. Downey, C. W. et al. J. Org. Chem. 2009, 74, 2904.
4. Hachilya, H. et al. Angew. Chem., Int. Ed. Engl. 2010, 49, 2202.
F&F: Vol. 6, p 639; Vol. 8, p 497; Vol. 10, p 438; Vol. 11, p 584; Vol. 12, p 543; Vol. 13, p 118, p 149, p 187, p 321, p 329; Vol. 14, p 119,
p 202, p 259, p 321, p 333; Vol. 15, p 66, p 102, p 108, p 346; Vol. 16, p 49, p 112, p 138, p 278, p 363; Vol. 17, p 26, p 379; Vol. 18, p
23, p 57, p 383; Vol. 20, p 408; Vol. 21, p 460.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[27607-77-8](既) 2-3617
TSCA EC 248-565-4 HMIS: 3-2-1-X
25g ¥8,600
100g ¥28,400
2.5kg ¥230,000

COMMERCIAL

F

222.25

SIT8622.0

O

C8H20O3Si2

Si

220.42

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 251-580-9 HMIS: 2-3-1-X

O

82-3° / 15
Flashpoint: 35°C (95°F)

0.918

1.412

50g ¥32,100[33581-77-0]

SIT8623.0

TRIMETHYLSILYL (TRIMETHYLSILYL)PROPYNOATEOSiO

C9H18O2Si2

Si

214.4264-5° / 1.5
Flashpoint: 43°C (109°F)

Potential for the synthesis of 3-substituted propiolic acid derivatives.1
1. Larson, G. L. “Silicon-Based Cross-Coupling Reagents” Gelest, Inc. 2011.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[97927-35-0]
HMIS: 3-2-1-X store <5°C

1.44002.5g ¥46,900

1,3,5-TRIMETHYL-1,3,5-TRIVINYLCYCLOTRISILAZANE see SIT8736.0 1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILAZANETRIMETHYLVINYLSILANE - see SIV9250.0 VINYLTRIMETHYLSILANETRIOCTYLMETHYLSILANE - see SIM6577.0 METHYLTRI-n-OCTYLSILANE

SIT8625.0

TRIOCTYLSILANE

368.76

C24H52Si

Si

H

See also SIT8376.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18765-09-8]
TSCA EC 242-559-5 HMIS: 2-1-1-X

163-5° / 0.15
Flashpoint: >110°C (>230°F)
10g ¥16,200

0.821

50g ¥54,400

SIT8627.0

TRI-t-PENTOXYSILANOL, 99%
C15H34O4Si

PR

O

O

Si

OH

306.51

Employed in ALD
See also SIT8088.0 TRI-t-BUTOXYSILANOLHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17906-35-3]
TSCA
HMIS: 2-1-1-X

O

96-9° / 2.5
Flashpoint: 106°C (223°F)

10g ¥35,800

0.944

1.454

COMPOUNDSTRIMETHYLSILYL (TRIMETHYLSILOXY)ACETATEOSILICONSi

50g ¥122,300

SIT8628.0

TRIPHENYLAMINOSILANE

Si

NH2

AMINOTRIPHENYLSILANE
C18H17NSi

275.43

Converts aryl chlorides to anilines.1
1. Huang, X.; Buchwald, S. L. Org. Lett. 2001, 3, 3417.
See also SIT8378.0 TRI-n-HEXYLSILYLAMINEHYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4215-80-9]
EC 224-147-7 HMIS: 2-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(60-2°)

5g ¥26,300(215) 547-1015

www.gelest.com

397

Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8645.0

TRIPHENYLCHLOROSILANE, 95%

294.85
188-9° / 3(91-2°)
1.16
Contains triphenylsilanol
Flashpoint: >200°C (>392°F)
Dipole moment: 2.14 debye
TOXICITY: ivn mouse, LD50: 56 mg/kg
Review of synthetic utility.1
Ether derivatives hydrolyze in acid at 0.25% the rate of corresponding Me3Si ethers.2
Reacts with AlBr3 and CO2 to directly form carboxylic acids from arenes and aryl halides.3
Used in the kinetic resolution of secondary alcohols.4
Used In an anion-relay approach to prepare sterically encumbered chiral binaphthols.5

C18H15ClSi

SiPh3

Br

Si

OSiPh3OSiPh3Cl

t-BuLi, THF

OH
OH

0° to rt, 85%

SiPh3

O
O
F

Br

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 182-184.
2. Sommer, L. H. Stereochemistry, Mechanism and Silicon; McGraw-Hill: 1965; p. 126.
3. Nemoto, K. et al. J. Org. Chem. 2010, 75, 7855.
4. Sheppard, C. I. et al. Org. Lett. 2011, 13, 3794.
5. Maruoka, K. et al. Bull. Chem. Soc. Jpn. 1988, 61, 2975.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[76-86-8](既) 3-2634
TSCA EC 200-989-0 HMIS: 3-1-1-X
25g ¥17,800
100g ¥50,100

SIT8652.0

TRIPHENYLETHOXYSILANE, tech-95

304.45
Contains triphenylsilanol
ΔHcomb: -10,967 kJ/mole
ΔHform: -671 kJ/mole
ΔHvap: 84.6 kJ/mole
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1516-80-9](既) 3-2635
TSCA EC 216-170-6 HMIS: 1-1-1-X
C20H20OSi

SiO(63-5°)
Flashpoint: >200°C (>392°F)
Vapor pressure, 200°: 5 mm
Dipole moment: 1.25 debye
10g ¥25,200

SIT8655.0

TRIPHENYLFLUOROSILANE

278.40207-10° / 12
(61-2°)
Dipole moment: 1.84 debye
Flashpoint: >200°C (>392°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[379-50-0]
TSCA EC 206-832-2 HMIS: 3-1-1-X
10g ¥21,500
C18H15FSi

Si

F

1.212

SIT8686.0(TRIPHENYLMETHYL)METHYLDICHLOROSILANE
TRITYLMETHYLDICHLOROSILANE
C20H18Cl2Si

Cl
Si

357.35(196-7°)

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[256343-28-9]
HMIS: 3-1-1-X
5g ¥26,800

PR

Cl

SIT8689.0

TRIPHENYLMETHYLSILANE

274.44

C19H18Si

196-8° / 9

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[791-29-7]
HMIS: 1-1-0-X

Si(65-7°)

1.088

25g ¥26,800

SIT8662.0

3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE, tech-95

Si

398

O

Si

O

Si

O

571.06210-230° / 0.3
Viscosity: 15 cSt
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[6689-19-6]
HMIS: 2-1-0-X
25g ¥25,200
C27H42O4Si5

Si

O

Si

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

1.144

www.gelest.com

1.501

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

SIT8665.0

TRIPHENYLSILANE

260.41

C18H16Si

160-5° / 3(42-4°)
Flashpoint: >200°C (>392°F)

Review of synthetic utility.
In presence of di-t-butylperoxide reduces esters to hydrocarbons.2
Undergoes dehydrogenative coupling with alcohols.3
1

Si

O

H

OH

+ Ph3SiH

KOH-18-C-6

O93%

1.6160OSiPh3OOF

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 733-739.
2. Sano, H. et al. Chem. Lett. 1986, 77.
3. Yamanoi, Y. J. Org. Chem. 2005, 70, 9607.
F&F: Vol. 12, p 209; Vol. 13, p 334.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[789-25-3]
TSCA EC 212-333-0 HMIS: 2-1-1-X
25g ¥17,200
100g ¥55,400

SIT8690.0

TRIPHENYLSILANETHIOLSiMERCAPTOTRIPHENYLSILANE
C18H16SSi

SH

292.47152° / 0.06

Soluble: toluene
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14606-42-9]
HMIS: 2-2-1-X(101-4°)5g ¥22,000

SIT8695.0

Si

OH

SIT8705.0

1,3,5-TRIPHENYLTRIMETHYLCYCLOTRISILOXANE, 90%

408.68160-90° / 5
Mixed cis/trans isomers
Flashpoint: >200°C (>392°F)
Hazy liquid, contains other cyclics
Silicone monomer
Suppresses male hormonal response
See also SIP6737.5 PHENYLMETHYLCYCLOSILOXANESHYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[546-45-2]
TSCA EC 208-900-7 HMIS: 3-1-0-X
25g ¥32,600

1.102

1.5402

199-201°
Flashpoint: 76°C (169°F)

0.88211.4401

173°
Flashpoint: 43°C (109°F)
Vapor pressure, 100°: 16 mm

0.758

1.42720.90011.5059

C21H24O3Si3

O
Si

Si

O

O
Si

TRIPHENYLVINYLSILANE - see SIV9265.0 VINYLTRIPHENYLSILANE

PR

SIT8707.0

TRI-n-PROPYLCHLOROSILANE
C9H21ClSi

Si

Cl

192.80SILICON

276.41(153-5°)
Dipole moment: 1.51 debye
Flashpoint: >200°C (>392°F)
Forms catalytic complex with vanadium oxychloride
Soluble: methylene chloride
Shifts double bond in terpenes.1
1. F&F: Vol. 6, p 655.
See also SIT8562.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[791-31-1](既) 3-2638
TSCA EC 212-339-3 HMIS: 2-1-0-X
25g ¥13,000
100g ¥34,500
C18H16OSi

COMPOUNDS

TRIPHENYLSILANOL

See also SIT8250.0, SIT8384.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[995-25-5](既) 2-2041
TSCA EC 213-624-5 HMIS: 3-2-1-X
10g ¥14,600

SIT8709.0

TRI-n-PROPYLSILANE

158.36
ΔHvap: 48.2 kJ/mole
Surface tension: 23.0 mN/m
See also SIT8091.6, SIT8378.7, SIT8385.0
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[998-29-8]
TSCA EC 213-649-1 HMIS: 2-2-1-X
C9H22Si

Si

H

H

H

Si

Si

50g ¥34,500

SIT8709.3

H

1,3,5-TRISILACYCLOHEXANECYCLOTRISILMETHYLENE
C3H12Si3SiH

10g ¥13,000

HH

132.38135°(-10°)

Single source precursor for beta-SiC by LPCVD at 800-1,000°.1
1. Lienhard, M. et al. in “Chemical Aspects of Electronic Ceramics Processing” Arkles, B. ed., MRS Proc. 1998, 495, 139.
See also SIT8709.8
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[291-27-0]
HMIS: 3-4-1-X
25g ¥114,800

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

399

Name

Mw

bp °C/mm(mp °C)

D420

nD20

52.9°

(-117°)

0.74301.4978

SIT8709.6
TRISILANE

H

H
H

Si

Si

92.32
PYROPHORIC
ΔHform: 121 kJ/mole
ΔHvap: 27.9 kJ/mole
Bond dissociation energy (Si-Si): 313 kJ/mole
Employed in low-temperature CVD of silicon and silicon alloys.1,2
Forms silicon nanowires initiated by gold seeds.3
H8Si3

H

H
Si

H

H H

Vapor pressure, 0˚: 95.5 mm

OOF

1. Akhtar, M. et al. MRS Proc. 1986, 70.
2. Todd, M. et al. U.S. Patent 6,821,825, 2004.
3. Heitsch, A. et al. J. Am. Chem. Soc. 2008, 130, 5436.
See also SII6463.4, SIN6597.07
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required
TSCA[7783-26-8]
HMIS: 3-4-3-X
5g ¥158,000*(L)* includes cylinder

SIT8709.8

1,3,5-TRISILAPENTANE

H
H

Si

Si
H

H

Si
H

H

H

BIS(SILYLMETHYL)SILANE
C2H12Si3

120.37100°
Flashpoint: -16°C (3°F)

0.76281.44910.96

1.486825

0.975

1.442

0.8762

1.43990.850221.432220.965

1.5039

Employed in ALD of SiC films
Employed in PECVD of silicon carbide and silicon carbonitride “seed” layers.1
H 1. Weidman, T. et al. US Patent Appl. 2012/0122302 A1, 2012.
See also SID4592.0, SIT8709.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA[5637-99-0]
HMIS: 3-4-2-X
25g ¥179,000*(L)* includes zCYL-HPS-0050 cylinder

SIT8710.0

TRIS(CYCLOHEXYLAMINO)METHYLSILANE, tech-95
C19H39N3Si

NH
HN

Si

TRIS(DIMETHYLAMINO)CHLOROSILANE, 95%

Cl

195.7762-3° / 12
Cloudy liquidFlashpoint: 28°C (82°F)
See also SIT8715.55
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[13307-05-6]
TSCA EC 236-331-4 HMIS: 3-3-2-X
25g ¥26,300
C6H18ClN3Si

PR

N

N

N

Si
N

N

N

Si
N

N

N

Si
N

400

100g ¥51,700

SIT8711.0NSi

169° / 3(19-20)Flashpoint: 72°C (161°F)
TOXICITY: oral rat, LD50: 637 mg/kg

Crosslinker for moisture-cure silicone RTVs
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15901-40-3](既) 3-3503
TSCA EC 240-040-8 HMIS: 3-1-1-X
25g ¥18,300

HNN

337.62

SIT8711.6

TRIS(DIMETHYLAMINO)ETHYLSILANE
C8H23N3Si

189.38HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-3-1-X[29489-57-4]

66-7° / 12Flashpoint: 32°C (90°F)
50g ¥59,100

SIT8712.0

TRIS(DIMETHYLAMINO)METHYLSILANE
C7H21N3Si

175.35

See also SIT8710.0, SIT8711.6
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[3768-57-8]
TSCA EC 223-199-8 HMIS: 3-3-1-X

55-6° / 17(-11°)
Flashpoint: 30°C (86°F)
10g ¥15,400

50g ¥51,200

SIT8713.0

TRIS(DIMETHYLAMINO)PHENYLSILANE
C12H23N3Si

237.42

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
TSCA EC 225-427-1 HMIS: 3-2-1-X[4840-75-9]

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

143-4° / 32
Flashpoint: 46°C (115°F)
10g ¥21,500(215) 547-1015

www.gelest.com

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

161.32

145-8°(-90°)

0.838

nD20

SIT8714.0

TRIS(DIMETHYLAMINO)SILANE
C6H19N3Si

AIR TRANSPORT FORBIDDEN
Vapor pressure, 4°: 1 6 mm

N
N

Si

Flashpoint: 25°C (77°F)
TOXICITY: oral rat, LD50: 595 mg/kg
TOXICITY: ihl rat, LC50: 38 ppm/4H
Hydrosilylates olefins in presence of Rh2Cl2(CO)41; reacts with ammonia to form silicon nitride prepolymers.1
Employed in low pressure CVD of silicon nitride.2
1. Review: Kanner, B. et al. In Silicon Chemistry; Corey, J. et al. Ed.; Wiley, 1988; p.123.
2. Levy, R. et al. J. Mater. Res. 1996, 11, 1483.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15112-89-7]
TSCA EC 239-165-0 HMIS: 4-3-2-X
10g inquire
50g inquire

H

N

SIT8714.1

TRIS(DIMETHYLAMINO)SILANE, 99.9+%

NSi

161.32

C6H19N3Si

145-8°(-90°)

0.838

AIR TRANSPORT FORBIDDEN

H

O
O
F

N

N

Flashpoint: 25°C (77°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15112-89-7]
TSCA EC 239-165-0 HMIS: 4-3-2-X
25g inquire* includes cylinder zCYL-HPS-0050

SIT8715.0

TRIS(DIMETHYLAMINO)SULFUR(TRIMETHYLSILYL)DIFLUORIDE, tech-95

N

Si

N

H

-

F

TAS-F
C9H27F2N3SSi

275.48
Contains tris(dimethylamino)sulfonium bifluoride
Soluble source for anhydrous fluoride ion.1
1. Middleton, W. J. U.S. Patent 3,940,402, 1976.
F&F: Vol. 10, p 452.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[59218-87-0]
HMIS: 3-3-2-X store <5°C
5g ¥77,700

SIT8715.4

Si

TRIS(DIMETHYLSILOXY)ETHOXYSILANE, tech-95

OO

C8H26O4Si4

Si

Si

O

H

298.63Mixed mode cure agent for silicone elastomers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[865811-55-8]
HMIS: 2-2-1-X

OSi

108-9° / 40

0.834

1.5875

0.804

1.423

10g ¥22,500

H

H

SIT8715.5

TRIS(DIMETHYLSILYL)AMINE, 95%Si

C6H21NSi3

N

Si

H

Si
H

Forms SiCN passivation coatings by CVD
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[21331-86-2]
TSCA EC 244-336-8 HMIS: 3-3-1-X

152-5°
Flashpoint: 55°C (131°F)
25g ¥37,900

SIT8715.55

N

TRIS(ETHYLMETHYLAMINO)CHLOROSILANE

PR
N

191.50Si

ClN

237.8475° / 3Cloudy liquid
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-3-1-X
10g ¥39,300

COMPOUNDSS+F

SILICONN

0.934

C9H24ClN3Si

SIT8715.6

O

O

Si

O

Si

3

H H

H

Si

H

H

N

Si
H

H

Si

H

H

TRIS(GLYCIDOXYPROPYLDIMETHYLSILOXY)PHENYLSILANE, 95%
C30H56O9Si4
673.11
Viscosity: 30-35 cSt.
Forms flexible epoxy resins with low dielectric constantSee also SIB1115.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[90393-83-2]
TSCA
HMIS: 2-1-0-X(-73°)
Flashpoint: >110°C (>230°F)

25g ¥18,000

1.05

1.4742100g ¥50,700

SIT8715.8

TRISILYLAMINE
H9NSi3107.3352°(-106°)

0.895-106

PYROPHORIC

See also SIC2268.5, SIH5905.1
HYDROLYTIC SENSITIVITY: 10: reacts extremely rapidly with moisture and oxygen - pyrophoric - sealed system required[13862-16-3]
HMIS: 4-4-3-X
25g ¥187,000** includes stainless steel cylinder zCYL-HPS-0420-35

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

401

Name
H
H

H

H
Si
Si

TRIS(SILYLMETHYL)SILANE

H

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-3-2-X

SiH(mp °C)

D420

nD20

61-2° / 30
Flashpoint: 35°C (95°F)

0.806

1.466925

25g ¥191,000** includes cylinder zCYL-HPS-0050

H

SIT8716.0

Cl
Cl

Cl

Si

TRIS(TRICHLOROSILYLETHYL)METHYLSILANE, tech-95

Cl

C7H15Cl9Si4

Si

Si
Cl

Si

Cl

Cl

Cl

Cl

Cl
Cl

Si

Si

Cl

Cl

TRIS(TRICHLOROSILYL)SILANE

432.43

HCl9Si4

H

60-2° / 0.2

HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[62257-60-7]
TSCA-L
HMIS: 3-2-1-X
5g ¥59,100

Cl
Cl

Si

1,1,2-TRIS(TRIETHOXYSILYL)ETHANE, tech-95

O

Si

O

(>25°)

SIT8716.1

ClSi

175-9° / 5

SIT8716.6

O
O

Cl
Si

530.61

9 point terminator for living polymers yielding star polymers
See also SIT7292.0 TETRAKIS(TRICHLOROSILYLETHYL)SILANEHYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[211945-95-8]
HMIS: 3-1-1-X
1.0g ¥19,400

O
O
F

Cl

164.48

C3H16Si4H[1385027-19-9]H

bp °C/mm

SIT8715.9

H

Si

Mw

O

O

O

516.85

C20H48O9Si3

Si

114-6° / 0.1

Intermediate for sol-gel derived abrasion resistant coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[151198-82-2]
HMIS: 3-2-1-X

O
O

0.993

5g ¥42,700

SIT8716.2

TRIS(TRIETHOXYSILYLMETHYL)AMINE, tech-90

O545.90
Contains ~5% bis(triethoxysilylmethyl)amine
Forms immobilized quaternary salts
see also SIT8716.3
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1250435-76-7]
HMIS: 2-2-1-X
C21H51NO9Si3

O
Si

N

O
3

156° / 0.7

0.99

5g ¥42,700

SIT8716.3

TRIS(TRIETHOXYSILYLPROPYL)AMINE, tech-95

OO

630.06

C27H63NO9Si3

Si

N

O

PR

3

200-5° / 1

Coupling agent/primer for metal substrates
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18784-74-2]
HMIS: 2-2-1-X

1.432225

25g ¥35,300

TRIS(TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANE see SIT8366.0 (3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANE

SIT8717.0

O

TRIS(3-TRIMETHOXYSILYLPROPYL)ISOCYANURATE, tech-95

O

O

O

O

O

Si

N

N

O

O

N

Si

402

1.170

Flashpoint: 102°C (216°F)

25g ¥6,600

100g ¥13,800

1.46102kg ¥104,100

SIT8717.7

TRIS(TRIMETHYLSILOXY)ANTIMONY

Si

O

O

Si

O

O

615.86
Viscosity: 325-350 cSt.
Coupling agent for polyimides to silicon metal
Adhesion promoter for hotmelt adhesives
Forms periodic mesoporous silicas.1
1. Zhang, W. et al. Chem. Mater. 2007, 19, 2663.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[26115-70-8]
TSCA EC 247-465-8 HMIS: 2-1-1-X
C21H45N3O12Si3OOANTIMONY TRIMETHYLSILOXIDEC9H27O3SbSi3 劇物

O

Forms static-charge conductive coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[194033-87-9]
HMIS: 3-2-1-X

Sb

Si

www.AZmax.co.jp

TEL: 03-5543-1630

389.32Gelest, Inc.

80° / 31.14485g ¥28,400(215) 547-1015

www.gelest.com

1.4374

COMMERCIALSiEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

273.38184°(-35°)
0.825
ΔHvap: 42.3 kJ/moleFlashpoint: 42°C (108°F)
Surface tension: 16.6 mN/m
Source for borosilicate glass by CVD at 800°.1
1. Treichel, H. et al. Chem. Abstr. 109, 241901u; J. Phys. Colloq. (C4 Solid State Res. Conf.) 1988.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4325-85-3]
TSCA
HMIS: 2-2-1-X
25g ¥13,500
100g ¥36,300

1.3861

SIT8718.0

TRIS(TRIMETHYLSILOXY)BORON
BORON TRIMETHYLSILOXIDEC9H27BO3Si3

Si
O
B
O

O
O

Si

Si

Si

O

SIT8719.0

TRIS(TRIMETHYLSILOXY)CHLOROSILANE

Si

331.1078° / 5Flashpoint: 74°C (165°F)
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17905-99-6]
HMIS: 3-2-1-X
25g ¥17,200
C9H27ClO3Si4ClSi

0.92191.3941

O
O
F

O
Si

SIT8720.0

50g ¥47,800

0.885

1.42042kg ¥243,000

TRIS(TRIMETHYLSILOXY)PHENYLSILANE - see SIP6827.0 PHENYLTRIS(TRIMETHYLSILOXY)SILANE
TRIS(TRIMETHYLSILOXY)PROPYL METHACRYLATE see SIM6487.6 METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE

SIT8721.0

TRIS(TRIMETHYLSILOXY)SILANE

Si
O

Si

Si

H
O

296.66

C9H28O3Si4O

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base(既) 7-477
EC 217-497-7 HMIS: 2-2-1-X[1873-89-8]Si

64° / 10
Flashpoint: 50°C (122°F)
25g ¥14,100

0.852

1.38650.9056

1.41350.919

1.40780.937

1.4974100g ¥37,900

SIT8719.5

Si

O

O

Si

Si

Si

O

Si

Cl

[TRIS(TRIMETHYLSILOXY)SILYLETHYL]DIMETHYLCHLOROSILANE
C13H37ClO3Si5
417.32

SIT8721.2

PR
Si

Si

O

85° / 0.6

Forms highly hydrophobic monolayers
Candidate for self-cleaning surfaces
Water contact angle: advancing = receding = 104˚.1
1. McCarthy, T. et al. Langmuir 1999, 15, 7328.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[225794-57-0]
HMIS: 3-2-1-X
10g ¥25,700
TRIS(TRIMETHYLSILOXY)SILYLETHYLTRIETHOXYSILANE

O

Si

Si

O

O

Si

C17H46O6Si5

OO

486.98Provides non-fluorinated low surface energy coatings
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1356114-66-3]
HMIS: 2-2-1-X

140° / 0.2

COMPOUNDS

Converts acid chlorides to hydroxymethylketones.1
1. Wissner, A. J. Org. Chem. 1979, 44, 4617.
F&F: Vol. 8, p 523; Vol. 9, p 512.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[69097-20-7]
EC 273-864-1 HMIS: 2-2-1-X

90° / 1
Flashpoint: 58°C (136°F)

COMMERCIAL

O

Si

292.59

C11H28O3Si3

Si

O

O

SILICON

TRIS(TRIMETHYLSILOXY)ETHYLENE, 96%Si

10g ¥20,400

TRIS(TRIMETHYLSILYL)AMINE - see SIN6595.0 NONAMETHYLTRISILAZANE
TRIS(TRIMETHYLSILYL)BORATE - see SIT8718.0 TRIS(TRIMETHYLSILOXY)BORON

GET8721.5

Si

Si

GeH
Si

TRIS(TRIMETHYLSILYL)GERMANE
C9H28GeSi3

293.17

Readily converted to (Me3Si)3GeCl.
1. Brook, A. et al. J. Organomet. Chem. 1986, 299, 9.
[104164-54-7]
HMIS: 2-1-1-X
1

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

80° / 5Flashpoint: >110°C (>230°F)
1.0g ¥49,500(215) 547-1015

www.gelest.com

403

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.827

1.4640

SIT8722.0

TRIS(TRIMETHYLSILYL)METHANE

232.59C10H28Si3

Review of synthetic utility.
Sterically demanding “trisyl” group.2,3
Linear, thermally-induced NMR shifts.4
Metalation occurs with MeLi to form tris(trimethylsilyl)methyllithium.5
1

Si
Si

Me3Si

SiMe3

Me3Si

H

+ MeLi80° / 2
Flashpoint: 76°C (169°F)

Et2O-THF

Me3Si

SiMe3

Me3Si

Li

Reacts with LiOMe to form bis(trimethylsilyl)methyllithium.
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 746-747.
2. Cowley, A. Inorg. Synth. 1990, 27, 235.
3. Eaborn, C. et al. J. Organomet. Chem. 1975, 101, C40.
4. Sikorsky, W. et al. Magn. Reson. Chem. 1998, 36, 5118.
5. Cook, M. A. et al. J. Organomet. Chem. 1970, 24, 529.
6. Sakurai, H. et al. Tetrahedron Lett. 1973, 4193.
F&F: Vol. 20, p 422.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1068-69-5]
HMIS: 2-2-0-X
2.5g ¥31,000
6

O
O
F

Si

SIT8722.7

TRIS(TRIMETHYLSILYLMETHYL)PHOSPHINE

Si

292.62

C12H33PSi3PSi

70° / 1 sub.

(66-70°)

Soluble: hexane
Sterically hindered electron-rich phosphine ligand
See also SID4589.0
HYDROLYTIC SENSITIVITY: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system
required[18077-42-4]
EC 241-986-4 HMIS: 3-4-1-X
1.0g ¥54,900

Si

SIT8723.0

O
O
Si

P
O

TRIS(TRIMETHYLSILYL)PHOSPHATE

Si

314.5485-7° / 4(2-4°)
0.959
ΔHvap: 40.6 kJ/moleFlashpoint: >110°C (>230°F)
Surface tension, 20°: 19.5 mN/m
TOXICITY: oral rat, LD50: 3,440 mg/kg
Cocatalyst for epoxidation of allyl-TMS ethers with silylperoxides.1
1. Hiyama, T., Obayashi, M. Tetrahedron Lett. 1983, 24, 395.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[10497-05-9]
TSCA EC 234-028-1 HMIS: 2-1-0-X
25g ¥14,600
100g ¥39,500
C9H27O4PSi3

OSi

1.4089

SIT8723.4

TRIS(TRIMETHYLSILYL)PHOSPHINE, 10% in hexane
C9H27PSi3

102-5° / 16
(24-6° neat)
Flashpoint: -23°C (-9°F)

0.72

Review of synthetic utility.1
In combination with indium acetate forms InP quantum dots.2,3Promotes borylative dienylation/aldeyhyde coupling.4
Reaction with methyllithium gives lithium bis(trimethylsilyl)phosphide,5 which reacts with dialkylformamides to give functional phosphaalkenes.6
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 422-427.
2. Bharal, D. et al. J. Am. Chem. Soc. 2005, 127, 11364.
3. Kim, S. et al. J. Am. Chem. Soc. 2005, 127, 10526.
4. Cho, H. Y.; Morken, J. P. J. Am. Chem. Soc. 2010, 132, 7576.
5. Askham, F. R. et al. J. Am. Chem. Soc. 1985, 107, 7423.
6. Prischenko, A. A. et al. Heteroatom. Chem. 2010, 21, 441.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[15573-38-3]
HMIS: 4-4-2-X
10g ¥27,300
50g ¥98,900

PR

Si

Si

250.54PSi

SIT8723.6

TRIS(TRIMETHYLSILYL)PHOSPHITE, 95%

Si
P

Si

404

O

90-2° / 20
Flashpoint: 66°C (151°F)
Reacts with aryl bromides yielding arylbis(trimethylsilyl)phosphonic acid esters.1
Used for mild preparation of bis(TMS)phosphonates (Arbuzov reaction).2
1. Demik, N. N. et al. Chem. Abstr. 1991, 115, 183.
2. Rosenthol, A. F. et al. Tetrahedron Lett. 1975, 16, 977.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1795-31-9]
HMIS: 3-2-1-X
10g ¥22,500
C9H27O3PSi

O

O

Si

www.AZmax.co.jp

TEL: 03-5543-1630

298.55

Gelest, Inc.

(215) 547-1015

0.893

www.gelest.com

1.4072

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.806

1.489

SIT8724.0

TRIS(TRIMETHYLSILYL)SILANE

1,1,1,3,3,3-HEXAMETHYL-2-TRIMETHYLSILYLTRISILANE; TTMS
C9H28Si4
248.67

Si
Si

Si

H

Oxidizes slowly in contact with air at room temperature
Reviews.1,2
Efficient mediator in organic radical reactions.3
Initiates addition of alkyl iodides to activated olefins.4
Initiates and promotes the radical addition of perfluoroalkyl iodides to olefins in water.5
Hydrosilylates olefins in aqueous systems in presence of azo initiators.6
1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 747-754.
2. Chatgilialoglu, C. Chem. Eur. J. 2008, 14, 2310.
3. Chatgilialoglu, C. Acc. Chem. Res. 1992, 25, 188.
4. Kishimoto, Y.; Ikariya, T. J. Org. Chem. 2000, 65, 7656.
5. Barata-Vallejo, S.; Postigo, A. J. Org. Chem. 2010, 75, 6141.
6. Postigo, A. et al. Organometallics 2009, 28, 3282.
F&F: Vol. 15, p 358; Vol. 16, p 374; Vol. 17, p 395.
See also GET8100, GET8721.5
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1873-77-4]
HMIS: 2-2-1-X
2.5g ¥11,900
10g ¥31,000

O
O
F

Si

82-4° / 12Flashpoint: 55°C (131°F)

SIT8725.0

O

346.72
135-40° / 50
0.89
Contains higher homologs
Flashpoint: 179°C (354°F)
Modifier for Pt-cure silicone elastomers
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[60111-52-6]
TSCA-L EC 262-060-6 HMIS: 2-1-0-X
10g ¥16,400
50g ¥55,400
C13H30O3Si4

Si

Si

O

Si

1.4148

SIT8725.4

SiOSi

TRIS(VINYLDIMETHYLSILOXY)PHENYLSILANE, 95%
C18H32O3Si4

O
SiO

408.78112-5° / 2
Flashpoint: 130°C (266°F)

Nucleus for hydrosilylation-generated dendrimers
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[60111-47-9]
HMIS: 1-1-0-X

Si

10g ¥12,700

0.95

1.45890.934

1.46040.847

1.437250g ¥40,600

TRIS(VINYLDIMETHYLSILYL) BORATE - see AKB159.5 BORON VINYLDIMETHYLSILOXIDESIT8729.0

TRIVINYLCHLOROSILANE, 95%

Si

144.67C6H9ClSi

Cl

128-9°

Intermediate for dendritic structures.1
1. Hosmane, N. et al. J. Organomet. Chem. 2009, 694, 1690.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1871-21-2]
HMIS: 3-3-1-X
10g ¥26,800

50g ¥96,800

SIT8730.0

PR

TRIVINYLETHOXYSILANE, 95%

Si

154.28C8H14OSiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[70693-56-0]
TSCA EC 274-772-4 HMIS: 2-3-1-X

146-7°
10g ¥25,700

COMPOUNDSOSILICON

TRIS(VINYLDIMETHYLSILOXY)METHYLSILANE, 95%Si50g ¥92,600

SIT8732.0

TRIVINYLMETHOXYSILANE, 95%

Si140.25C7H12OSiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-4-1-X[193828-96-5]

131-3°
Flashpoint: 26°C (79°F)
2.5g ¥13,500

1.440010g ¥36,300

SIT8734.0

TRIVINYLMETHYLSILANE

124.26102°
Viscosity, 20˚: 0.5 cSt.
Flashpoint: 15°C (59°F)
ΔHform: -212 kJ/mole
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18244-95-6]
TSCA EC 242-120-8 HMIS: 2-4-0-X
25g ¥19,400

0.769

C7H12SiSi

1.4411

SIT8735.0

Si

O

Si

O

Si

1,3,5-TRIVINYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE, 95%

198-200°
Flashpoint: 40°C (104°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1529-65-3]
TSCA EC 216-220-7 HMIS: 1-2-0-X
10g ¥17,800
C11H24O2Si3

www.AZmax.co.jp

TEL: 03-5543-1630

272.57

Gelest, Inc.

(215) 547-1015

50g ¥60,700

www.gelest.com

405

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.772525

1.449825

0.939

1.4802

SIT8735.5

TRIVINYLSILANE, tech-95

Si110.22
Contains ethyldivinylsilane
1Intermediate for phosphinoalkylsilanes.
1. Joslin, F. Inorg. Chem. 1993, 32, 7221.
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[2372-31-8]
HMIS: 2-4-1-X

92-3°

C6H10SiH

10g ¥38,500

SIT8736.0

1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILAZANE, 95%

255.54
Contains cyclic tetrasilazane analog
Precursor of vinylsilazane preceramic polymers.1
Reacts with photoresists to give RIE resistance.2
Intermediate for polyborosilazanes.3
1. Toreki, W. et al. Ceram. Eng. Sci. Proc. 1990, 11, 1371.
2. Babich, E. et al. Microelectron. Eng. 1990, 11, 503.
3. Nghiem, Q.-D.; Kim, D.-P. J. Mater. Chem. 2005, 15, 2188.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5505-72-6]
EC 226-848-3 HMIS: 3-2-1-X
C9H21N3Si3

Si

Si

NH
Si

N
H

O
O
F

HN

106-9° / 11
Flashpoint: 85°C (185°F)

25g ¥10,900100g ¥27,600

SIT8737.0

1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILOXANE
C9H18O3Si3

Si

O
Si

80° / 20

Undergoes “living” anion ring-opening polymerization
Reagent for vinylations via cross-coupling protocols.1,2
1. Denmark, S. E.; Wang, Z. J. Organomet. Chem. 2001, 624, 372.
2. Denmark, S. E.; Butler, C. R. J. Am. Chem. Soc. 2008, 130, 3690.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3901-77-7](既) 7-483
TSCA EC 223-458-5 HMIS: 2-1-0-X

O
Si

O

258.505g ¥11,700

0.966925g ¥36,300

SIT8780.0

TUNGSTOSILICIC ACID hydrate

2,878.31 /3,328.69

H4O40SiW12∙26H2O / [(SiO4∙(W3O9)4]H4

Employed in density gradient columns; precipitation of alkaloids.
Soluble: water, methanol
Solution of 20g + 4g H2O has a density of 2.74
Anions self-assemble in monolayers on silver surfaces.1
1. Ge, M. et al. J. Am. Chem. Soc. 1996,118, 5812.
HYDROLYTIC SENSITIVITY: 0: forms stable aqueous solutions[12027-38-2]
TSCA EC 234-719-8 HMIS: 2-0-0-X

50g ¥32,600

SIT8787.0

TUNGSTEN SILICIDE

240.02
ΔHform: 154 kJ/mole
ΔHsub: 72.0 kJ/mole
Resistivity: 11-13 μΏcm
HYDROLYTIC SENSITIVITY: 2: reacts with aqueous acid[12039-88-2]
TSCA EC 234-909-0 HMIS: 1-0-0-X(2,165°)

Si2W

WSi2

9.88

25g ¥24,100

PR

SIU8850.0

ULTRAMARINE BLUESODIUM ALUMINOSULFOSILICATEAl6Na8-10O24S2-4Si6

TOXICITY: oral rat, LD50: >5,000 mg/kg

Color: deep blue
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[57455-37-5]
TSCA
HMIS: 1-0-0-X

2.3

500g ¥9,600

UMBELLIPHERONE-FUNCTIONAL SILANES - see SIC2266.9, SIM6502.0

SIU9045.0Si

810-UNDECENYLDIMETHYLCHLOROSILANE
C13H27ClSi

246.90100° / 2

0.872

242.4784-6° / 0.5

0.8105Cl HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18406-97-8]
HMIS: 3-2-1-X
5g ¥35,800
SIU9049.2

10-UNDECENYLOXYTRIMETHYLSILANE

O

9

406

Extended double bond
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14031-97-1]
HMIS: 1-2-1-X

25g ¥26,800

SIU9049.4

O
9

TRIMETHYLSILOXYUNDEC-1-ENE
C14H30OSi

Si

10

Cl

Si

Cl 11-UNDECENYLOXYUNDECYLTRICHLOROSILANE
Cl

C22H43Cl3OSi

458.03

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[14031-97-1]
HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.0g ¥63,900(215) 547-1015

www.gelest.com

1.421525

Enabling Your Technology
Name
10-UNDECENYLSILANE

H

H(mp °C)

184.40

C11H24SiSi

bp °C/mm

D420

nD20

0.76825

1.441525

SIU9048.0

H
8

Mw

Forms self-assembled monolayers on gold
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
HMIS: 2-3-1-X

2.5g ¥39,000

SIU9047.0

10-UNDECENYLTRICHLOROSILANE

Cl
8

Si

Cl

Cl

287.74100-2° / 0.8
Treated surface contact angle, water: 95°
Flashpoint: 105°C (221°F)
Derivatizable patterns formed by dip-pen nanolithography.1
1. Kooi, S. et al. Adv. Mater. 2004, 16, 1013
See also SID4623.4, SID4617.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17963-29-0]
TSCA
HMIS: 3-1-1-X
1.0g ¥13,500

1.04

C11H21Cl3Si

5g ¥43,800

O
O
F

SIU9049.0

10-UNDECENYLTRIMETHOXYSILANE

Cl

Si

O

9

Cl

9

1.43345g ¥45,900

SIU9049.5

UNDECYLOXYPROPYLTRICHLOROSILANE

347.81

C14H29Cl3OSi

195-8° / 10

Hydrophilic silane with embedded polar ether group
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents
HMIS: 3-2-1-X
5g ¥40,600

UNDECYLTRICHLOROSILANE

289.75

C11H23Cl3Si

Cl

Cl

Cl

0.908

SIU9050.0ClSi

102-5° / 1

When treated on glass provides a contact angle of 100°
See also SID4623.6, SID4618.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[872575-06-9]
HMIS: 2-1-1-X

OO

274.48

C14H30O3Si

155-60° / 15
Flashpoint: 107°C (225°F)

1.02

Employed in SAMS as a spacer molecule for functionally tipped silanes
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18052-07-8]
HMIS: 3-1-1-X
25g ¥38,500

SIU9055.0

UREIDOPROPYLTRIETHOXYSILANE, 50% in methanol

H
N

O

O

Si

O

NH2

C10H24N2O4Si

264.40Flashpoint: 11°C (52°F)
Contains ureidopropyltrimethoxysilane and related transesterification products
Coupling agent for polyamides and urea-formaldehyde resins
See also SIS6944.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[23779-32-0](既) 2-2968
TSCA EC 245-876-7 HMIS: 2-4-1-X
25g ¥4,500(-97°)

0.92

2kg ¥41,000

1.386

COMMERCIAL

O

16kg ¥235,000

SIU9058.0

UREIDOPROPYLTRIMETHOXYSILANE
C7H18N2O4Si

O

PR
H
N

O

Si

O

NH2

222.32Component in primers for tin alloys
Adhesion promoter for foundry resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[23843-64-3]
TSCA EC 245-904-8 HMIS: 2-2-1-X

217-225°
(-5°)
1.150
Flashpoint: 99°C (210°F)
TOXICITY: oral rat, LD50: >5,000 mg/kg
Autoignition temperature: 300˚C

25g ¥6,100

100g ¥11,900

1.38625

COMMERCIALOCOMPOUNDS

8SiSILICONO

2kg ¥110,000

SIV9061.0(m,p-VINYLBENZYLOXY)TRIMETHYLSILANE(TRIMETHYLSILOXYMETHYL)STYRENE
C12H18OSiO

Si

206.3556-60° / 0.15
Inhibited with BHT; mixed isomers
Forms hydrophilic copolymers
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[112270-66-3]
HMIS: 2-2-1-X store <5°C
10g ¥36,300

0.96251.53725

VINYLBENZYL(TRIMETHOXYSILYL)PROPYLETHANEDIAMINE HYDROCHLORIDE see SIS6994.0 3-N-(STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE HYDROCHLORIDE

SIV9062.0

VINYL(BROMOMETHYL)DIMETHYLSILANE
C5H11BrSi

Si

Br

179.13142°

See also SIV9065.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[211985-18-1]
HMIS: 3-3-0-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

1.16251.464

25g ¥62,900(215) 547-1015

www.gelest.com

407

Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.75651.4281

SIV9063.0

VINYL-t-BUTYLDIMETHYLSILANE, 95%

142.32

C8H18Si

Si

127°
Flashpoint: 19°C (66°F)

Precursor to α-silyl acetaldehyde.
1. Cunico, R. Tetrahedron Lett. 1986, 27, 4269.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[24858-02-4]
HMIS: 2-4-0-X
1

Cl
Si

10g ¥26,800

SIV9064.0

VINYL(CHLOROMETHYL)DIMETHOXYSILANE

166.68

C5H11ClO2Si

O

Multi-functional coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1314981-48-0]
HMIS: 3-3-1-X

O

10g ¥61,800

Cl
Si

Cl
Si

O

Si

O
O
F

SIV9065.0

VINYL(CHLOROMETHYL)DIMETHYLSILANE

134.68121-2°
Flashpoint: 14°C (57°F)
1Intermediate for the preparation of photocureable non-linear optical polymers.
Isomerizes in presence of FeCl3 to cyclopropyldimethylchlorosilane.2
1. LaBamy, P. et al. Chem. Abstr. 116, 107441k; Fr. Demande 2659340, 1991.
2. Zhun, V. et al. Zh. Obshch. Chem. 1990, 60, 1111.
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[16709-86-7]
TSCA EC 240-758-1 HMIS: 3-4-0-X
10g ¥15,600
C5H11ClSi

0.893

50g ¥52,200

SIV9066.0

1-VINYL-3-(CHLOROMETHYL)-1,1,3,3-TETRAMETHYLDISILOXANE
C7H17ClOSi2
208.84171-2°
Flashpoint: 46°C (115°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[88456-93-3]
HMIS: 3-2-0-X
25g ¥17,800

0.921

1.42460.75031.42300.884

1.413725

SIV9068.0

VINYLDIETHYLMETHYLSILANEETHENYLDIETHYLMETHYLSILANE
C7H16SiSi

128.29120°
Flashpoint: 15°C (59°F)

Forms oxygen permeable polymers
See also SIV9073.8
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18292-29-0]
HMIS: 2-4-0-X

10g ¥40,600

SIV9070.0

VINYLDIMETHYLCHLOROSILANE

120.65C4H9ClSi

82-3°
Flashpoint: -5°C (23°F)

Si

O

Me2
Si

Cl

+

OH

I
R

COMMERCIAL

PR

Review of synthetic utility.1
Used in synthesis of highly substituted unsaturated alcohols.2
Reductively cross-couples with allyl alcohols to form butenols after oxidation.3
Used to silylate unsaturated alcohols, which can be RCM-cyclized to a vinylsilyl ether, which in turn can be subjected to a silicon-based
cross-coupling.4

TBAF (2 eq.)
Pd(OAc)2
84 - 93%

R

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 157-161.
2. Denmark, S. E.; Lang, S. M. Org. Lett. 2001, 3, 1749.
3. Belardi J. K.; Micalizio, G. C. J. Am. Chem. Soc. 2008, 130, 16870.
4. Denmark, S. E.; Yang, S.-M. Org. Lett. 2003, 3, 1749.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[1719-58-0](既) 2-2042
TSCA EC 217-007-1 HMIS: 3-4-1-X
25g ¥7,100
250g ¥45,200

SIV9072.0

VINYLDIMETHYLETHOXYSILANE

Si

408

130.26
Dipole moment: 1.23 debye
Vinylates aryl halides.1
1. Denmark, S. E.; Butler, C. R. J. Am. Chem. Soc. 2008, 130, 3690.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5356-83-2](既) 2-2055
TSCA EC 226-341-7 HMIS: 2-4-1-X
C6H14OSiO

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

99-100°Flashpoint: 4°C (39°F)

10g ¥9,800(215) 547-1015

0.790

50g ¥28,900

www.gelest.com

1.3983

Enabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.813

1.36150.674425

1.388525

SIV9073.0

VINYLDIMETHYLFLUOROSILANE

Si

104.20
Dipole moment: 2.10 debye
1
Undergoes photochemical addition of Me2PH to yield ligand.
1. Grobe, J. et al. Z. Anorg. Allg. Chem. 1991, 592, 121.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[38755-76-9]
HMIS: 3-4-1-X

42-4°

C4H9FSiF

10g ¥21,500

SIV9073.5

Si

VINYLDIMETHYLSILANE

86.20

C4H10Si

36-7°

See also SIA0464.0, SIV9096.0, SIV9097.5
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[18243-27-1]
HMIS: 3-4-1-X store <5°C

H

10g ¥42,700

SIV9073.8

O
O
F

VINYLDI-n-OCTYLMETHYLSILANE

296.61

C19H40SiSi

118-9° / 0.2

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[475213-01-5]
HMIS: 2-1-0-X

0.793

1.4515

1.104

1.579

1.052

1.54891.5705

0.997

0.94

1.515

10g ¥32,600

SIV9074.0

Cl244.80125° / 0.5
Flashpoint: >110°C (>230°F)

Employed in the conversion of β-haloethanols to homoallylic alcohols.
1. Sugimoto, I. et al. J. Org. Chem. 1999, 64, 7153.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[18419-53-9]
TSCA EC 242-297-1 HMIS: 3-1-1-X
10g ¥14,600
150g ¥48,000

SIV9076.0

VINYLDIPHENYLETHOXYSILANE

254.40

C16H18OSiSiO

Vinyl group will undergo Diels-Alder reaction
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[17933-85-6]
TSCA EC 241-870-3 HMIS: 2-1-1-X

135° / 13Flashpoint: 97°C (207°F)
10g ¥16,200

50g ¥54,400

SIV9076.5

VINYLDIPHENYLMETHYLSILANE

224.3788° / 0.3
Flashpoint: 125°C (257°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[13107-13-6]
HMIS: 2-1-0-X
25g ¥35,300
C15H16Si

Si

SIV9077.0

VINYL(DIPHENYLPHOSPHINOETHYL)DIMETHYLSILANE
C18H23PSi

PRP

298.43

HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[76734-22-0]
HMIS: 2-2-0-X

Si

SILICONSi

DIPHENYLVINYLCHLOROSILANE
C14H13ClSi

COMPOUNDSVINYLDIPHENYLCHLOROSILANE

5g ¥46,900

SIV9079.0

VINYL(p-METHOXYPHENYL)DIMETHYLSILANE

Si

O

p-ANISYLDIMETHYLVINYLSILANE
C11H16OSi

192.3396-8° / 10

See also SIA0469.0
HYDROLYTIC SENSITIVITY: 4: no reaction with water under neutral conditions[55153-99-6]
HMIS: 2-2-0-X

10g ¥20,400

VINYLMETHYLBIS(DIMETHYLAMINO)SILANE - see SIB1080.0 BIS(DIMETHYLAMINO)VINYLMETHYLSILANE

SIV9080.0

VINYLMETHYLBIS(METHYLETHYLKETOXIMINO)SILANE, 95%

Si

O

N

O

N

(-40°)
Flashpoint: 31°C (88°F)
TOXICITY: oral rat, LD50: 1,840 mg/kg
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[73160-32-4]
HMIS: 3-3-1-X
50g ¥37,400
C11H22N2O2Si

www.AZmax.co.jp

TEL: 03-5543-1630

242.39

Gelest, Inc.

(215) 547-1015

0.92

www.gelest.com

409

Name

Mw

bp °C/mm(mp °C)

D420

nD20

89-94° / 1(-93°)
0.905
Flashpoint: >65°C (>150°F)
TOXICITY: oral rat, LD50: 1,160 mg/kg
Autoignition temperature: 266˚C

1.4505

SIV9081.0

Si

VINYLMETHYLBIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
C15H30N2O2Si
298.50
Contains isomers

O

N

O

Neutral chain extender for moisture-cure silicones
See also SIM6590.2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[156145-66-3]
TSCA
HMIS: 3-3-1-X

N

25g ¥11,100

2kg ¥138,600

SIV9082.0
Si

Si

O
Si

VINYLMETHYLBIS(TRIMETHYLSILOXY)SILANE
3-VINYLHEPTAMETHYLTRISILOXANE
C9H24O2Si3

248.5449° / 80.836
Dipole moment: 0.93 debye
Flashpoint: 51°C (124°F)
Copolymerization parameters- e,Q: -0.780, 0.036
Vapor pressure, 50°: 8 mm
Polymerization initiated with peroxides or polysilanes.1
1. Smenov, V. et al. Dokl. Akad. Nauk SSSR 1989, 309, 119.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[5356-85-4]
TSCA
HMIS: 1-2-0-X
25g ¥10,300
100g ¥26,000

1.3951OOFOSIV9083.0

O

O

Si
O

O

VINYLMETHYLDIACETOXYSILANE
C7H12O4Si

188.25HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water(既) 2-569
TSCA EC 220-954-3 HMIS: 3-2-1-X

56° / 9Flashpoint: 42°C (108°F)
10g ¥10,900[2944-70-9]

1.06351.425050g ¥33,200

SIV9084.0

VINYLMETHYLDICHLOROSILANE
C3H6Cl2Si

ClSi

141.0792-3°(-78°)
1.087
Flashpoint: 4°C (39°F)
TOXICITY: ipr mouse, LD50: 270 mg/kg
Critical temperature: 272˚C
Coefficient of thermal expansion: 1.4 x 10-3

Used as a tether in synthesis of C-glycosides.1
Reacts to vinylate aryl halides under NaOH-moderated conditions.2
1. Shuto, S. et al. J. Org. Chem. 2000, 65, 5547.
2. Hagiwara, E. et al. Tetrahedron Lett. 1997, 38, 439.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[124-70-9](既) 2-2042
TSCA EC 204-710-3 HMIS: 3-4-1-X
25g ¥3,400Cl

1kg ¥24,000

1.4270COMMERCIAL

Viscosity: 0.70 cSt
ΔHvap: 33.9 kJ/mole

18kg ¥261,000

SIV9085.0

160.29133-4°
Dipole moment: 1.27 debye
Flashpoint: 16°C (61°F)
Copolymerization parameters- e,Q; -0.86, 0.020
Chain extender, crosslinker for silicone RTVs and hydroxy-functional resins
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[5507-44-8](既) 2-2055
TSCA EC 226-850-4 HMIS: 2-4-1-X
25g ¥6,300

0.858

C7H16O2Si

Si

PR

O

2kg ¥77,000

1.3998COMMERCIAL

VINYLMETHYLDIETHOXYSILANE

O

15kg ¥361,000

SIV9086.0

VINYLMETHYLDIMETHOXYSILANE

103°
0.889
1.395
Flashpoint: 15°C (59°F)
Autoignition temperature: 245˚C
Vapor pressure, 20°: 38 mm
Additive to moisture-cure silane modified polyurethanes as a water scavenger to prevent premature cure
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[16753-62-1]
TSCA EC 240-816-6 HMIS: 3-4-1-X
25g ¥7,700
100g ¥17,200
2kg ¥72,300
C5H12O2Si

Viscosity: 0.7 cSt

SiO

132.23

SIV9087.0

1-VINYL-1-METHYLSILACYCLOPENTANE
C7H14SiSi

126.2753° / 50

HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[3944-18-1]
HMIS: 2-4-0-X

0.815

25g ¥65,000

SIV9088.0

Cl

410

Si

VINYLOCTYLDICHLOROSILANE

Cl

C10H20Cl2Si

7239.2695° / 5Flashpoint: 99°C (210°F)

0.99Intermediate for hydrocarbon compatible silicones
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[211985-85-2]
HMIS: 3-2-1-X
10g ¥25,200

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

1.4571COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

1.015

1.44540.77

1.3880

SIV9088.4
O
O

O
Si

N
H

O

O

O

O-(VINYLOXYBUTYL)-N-TRIETHOXYSILYLPROPYL CARBAMATE, tech-95
C16H33NO6Si
363.53
Inhibited with MEHQ
UV reactive coupling agent
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[159856-61-8]
HMIS: 3-2-1-X

10g ¥25,200

SIV9089.0

VINYLOXYTRIMETHYLSILANE

O-TRIMETHYLSILYLVINYL ALCOHOL
C5H12OSiOOF
25g ¥45,900

SIV9090.0

O

Si

74-5°
Flashpoint: -10°C (14°F)

Source of acetaldehyde enolate
Polymerized with SnCl4 or EtAlCl2 catalysts.1,2
Reacts with benzyl methyl ethers to form β-methoxyaldehydes.3
1. Murahasi, S. et al. J. Polym. Sci., Polym. Lett. Ed. 1965, 3, 245.
2. Nozakura, S. et al. J. Polym. Sci. 1973, 11, 1053.
3. Ying, B.-P. et al. Org. Lett. 2004, 6, 1523.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[6213-94-1](既) 2-2960
TSCA EC 228-281-7 HMIS: 3-4-1-X
5g ¥14,100

SiO

116.23Si

VINYLPENTAMETHYLDISILOXANE

174.39120°
Copolymerization parameters, e,Q: -0.810,0.034
Flashpoint: 12°C (54°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1438-79-5]
TSCA
HMIS: 2-4-0-X
25g ¥17,200

0.787

1.393025

203.1484-7° / 1.5(-43°)
1.19625
Viscosity, 20°: 1.2 cSt
Flashpoint: 90°C (194°F)
Surface tension, 27°: 32.5 mN/mHeat capacity, 27°: 1.243 kJ/kg°C
See also SIA0486.0, SIV9092.2
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[7719-02-0]
TSCA EC 231-746-7 HMIS: 3-2-1-X
10g ¥11,900
50g ¥37,400

1.5322

C7H18OSi2100g ¥48,300

VINYLPHENYLDICHLOROSILANE
C8H8Cl2Si

Si

Cl

Cl

SIV9092.2

VINYLPHENYLDIETHOXYSILANE
C12H18O2Si

SiO

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-2-1-X

120° / 17
Flashpoint: 88°C (190°F)
Autoignition temperature: 258˚C

0.959

1.48120.89191.504825g ¥28,900[40195-27-5]

SIV9093.0

VINYLPHENYLDIMETHYLSILANE
C10H14Si

162.3082° / 20
Flashpoint: 59°C (140°F)

Undergoes BuLi-catalyzed anionic polymerizations.1,2
1. Gan, Y. et al. Polymer Preprints 1993, 34, 548.
2. Rickle, G. J. Macromol Sci., Chem. 1986, A23, 1287.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1125-26-4]
HMIS: 2-3-0-X

Si

PR

O

222.3610g ¥11,900

SILICON

SIV9092.0

COMPOUNDSVINYLPHENETHYLTRIMETHOXYSILANE - see SIS6990.0 STYRYLETHYLTRIMETHOXYSILANE

50g ¥37,400

SIV9094.0

VINYLPHENYLMETHYLCHLOROSILANE
C9H11ClSi

Si

Cl

182.7279-80° / 3-4
Flashpoint: 72°C (162°F)

Endcapper for thermally stable Pt cure silicone elastomers
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[17306-05-7](既) 3-1165
TSCA EC 241-333-3 HMIS: 3-2-1-X
10g ¥12,700

1.034

1.51970.95

1.50050.891

1.511550g ¥40,600

SIV9095.0

VINYLPHENYLMETHYLMETHOXYSILANE
C10H14OSiSiO

178.30HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X[80252-60-4]

60-2° / 2Flashpoint: 68°C (154°F)
10g ¥13,800

50g ¥44,800

SIV9096.0

VINYLPHENYLMETHYLSILANE
C9H12SiSi

H

148.28HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
TSCA EC 241-830-5 HMIS: 2-2-1-X[17878-39-6]

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

56-7° / 7
Flashpoint: 58°C (136°F)
10g ¥26,300(215) 547-1015

www.gelest.com

411

Name
VINYLSILANE

58.16
ΔHcomb: -2,524 kJ/mole
ΔHvap: 21.4 kJ/mole
Dipole moment: 0.66 debye
HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base[7291-09-0]
EC 230-719-7 HMIS: 3-4-2-X
C2H6SiH

H(mp °C)

D420

nD20

-22.8°(-171 to -179°)

0.666-23

10g inquire* includes cylinder

SIV9097.0

N

VINYLSILATRANE

201.30(163-5°)Flashpoint: >110°C (>230°F)
TOXICITY: ipr mouse, LD50: 3,000 mg/kg
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[2097-18-9]
TSCA EC 218-262-1 HMIS: 1-1-0-X
10g ¥19,400
C8H15NO3Si

O

O

O
O
F

Si

O

bp °C/mm

SIV9096.7

H
Si

Mw

VINYL (MONO) TERMINATED POLYDIMETHYLSILOXANES - see MACROMERSVINYL (DI) TERMINATED POLYDIMETHYLSILOXANES - see REACTIVE SILICONES

SIV9097.5

O

Si

Si

O

VINYL-1,1,3,3-TETRAMETHYLDISILOXANE
C6H16OSi2H

HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
EC 259-923-4 HMIS: 2-3-1-X[55967-52-7]

1.394725g ¥25,200

112-3° / 1(10-13°)
1.167
1.423
Flashpoint: 88°C (190°F)
Crosslinker for moisture-cure silicone RTVs with greater liquid range for formulation, faster moisture-cure rate and better substrateadhesion properties than methyltriacetoxysilane
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[4130-08-9](既) 2-2036
TSCA EC 223-943-1 HMIS: 3-2-1-X store <5°C
100g ¥5,600
2kg ¥55,000
18kg ¥284,000

O
O

O

0.784

232.26

COMMERCIAL

VINYLTRIACETOXYSILANE
C8H12O6Si

O

107-8°
Flashpoint: 12°C (54°F)

SIV9098.0

OSi

160.36

SIV9099.0

VINYLTRI-t-BUTOXYSILANEO

C14H30O3Si

Si

O

274.47

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
EC 226-343-8 HMIS: 2-2-1-XO[5356-88-7]

54° / 2
Flashpoint: 79°C (174°F)
10g ¥21,000

0.869

50g ¥73,500

SIV9110.0

VINYLTRICHLOROSILANE
C2H3Cl3Si

Cl

161.49PR

Si

Viscosity: 0.50 cSt
ΔHform: -5,781 kJ/mole
ΔHvap: 33.1 kJ/moleCl

93°(-95°)
1.2426
Flashpoint: 21°C (69°F)
TOXICITY: oral rat, LD50: 3,160 mg/kg
Vapor pressure, 23°: 60 mm
Specific heat: 0.84 J/g/°
Coefficient of thermal expansion: 1.6 x 10-3

F&F: Vol. 5, p 749.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[75-94-5](既) 2-2037
TSCA EC 200-917-8 HMIS: 3-4-1-X
25g ¥7,200

1kg ¥26,600

1.4295

COMMERCIAL

Cl

20kg ¥255,000

サイラエース S220
VINYLTRIETHOXYSILANE

SIV9112.0

190.31
160-1°
0.903
1.3960
ΔHform: -1,940 kJ/moleFlashpoint: 44°C (111°F)
ΔHvap: 28.5 kJ/mole
TOXICITY: oral rat, LD50: 22,500 mg/kg
Dipole moment: 1.69 debye
Autoignition temperature: 268°C
Specific wetting surface area: 412 m2/g
Vapor pressure, 20˚: 5 mm
Copolymerization parameters- e,Q: -0.42, 0.028
Specific heat: 1.05 J/g/°γc of treated glass surface: 25 mN/m
Relative hydrolysis rate versus SIV9220.0, vinyltrimethoxysilane; 0.05
Forms copolymers with ethylene
Couples fillers or fiberglass to resins
Reacts with enamines to give (E)-β-silylenamines, which cross-couple w/ aryl iodides to give β-aryl enamines.1
Extensive review on the use in silicon-based cross-coupling reactions.2
1. Marciniec, B. et al. J. Org. Chem. 2005, 70, 8550.
2. Denmark, S. E. et al. Organic Reactions, Vol. 75, Denmark, S. E. ed., John Wiley and Sons, 233, 2011.
See VEE-005 for polymeric version
100g ¥4,900
1kg ¥9,300
サイラエース S220
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[78-08-0](既) 2-2066
TSCA EC 201-081-7 HMIS: 1-2-1-X
25g inquire
2kg inquire
16kg inquire
C8H18O3Si

Si
O

412

O

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.771

1.43400.978

1.35490.96825

1.376525

0.926

1.4373

SIV9116.0

VINYLTRIETHYLSILANE

142.32

146-7°
Flashpoint: 25°C (77°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[1112-54-5]
HMIS: 2-3-0-X
25g ¥60,700
C8H18Si

Si

SIV9205.0

F
Si

VINYL(TRIFLUOROMETHYL)DIMETHYLSILANE, 96%
C5H9F3Si

F

154.2180°
Flashpoint: -10°C (14°F)

Monomer for high permeability membranes
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[211985-86-3]
HMIS: 3-4-0-X

F

2.5g ¥22,500

10g ¥65,500

SIV9208.0

F

VINYL(3,3,3-TRIFLUOROPROPYL)DIMETHYLSILANE

113-5°
Flashpoint: 22°C (72°F)
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[84442-77-3]
HMIS: 2-4-0-X
2.5g ¥19,900
C7H13F3Si

182.26

O
O
F

Si

F

F

10g ¥57,000

SIV9209.0

73-5° / 12

Employed as a cross-linker and in vapor phase derivatization; byproduct is acetone
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[15332-99-7](既) 2-3197
TSCA EC 239-362-1 HMIS: 1-3-1-X
25g ¥8,500

O100g ¥19,900

2kg ¥121,000

SIV9210.0

VINYLTRIISOPROPOXYSILANE
C11H24O3Si

Copolymerization parameters- e,Q: -0.36, 0.031

SiO

232.39Used for free-radical cure water-borne resin systems
Adhesion promotor for vinyl acetate/ethylene latex
Relative hydrolysis rate versus vinyltrimethoxysilane; 0.0015
See also SIV9089.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18023-33-1](既) 2-2066
TSCA EC 241-931-4 HMIS: 1-2-1-X

O

サイラエース S210
VINYLTRIMETHOXYSILANE

179-81°
Flashpoint: 51°C (124°F)
Vapor pressure, 60°: 4 mm

25g ¥6,100

0.8659100g ¥11,900

1.396125
COMMERCIALO

2kg ¥83,000

SIV9220.0

O

148.23PR

Viscosity: 0.6 cSt
Copolymerization parameters- e,Q: -0.38, 0.031
Specific wetting surface area: 528 m2/g

COMMERCIAL

123°
0.970
1.3930Flashpoint: 28°C (82°F)
TOXICITY: oral rat, LD50: 8,000 mg/kg
Si O
Autoignition temperature: 235°C
Vapor pressure, 20°: 9 mm
O
Employed in two-stage1 and one-stage2 graft polymerization/crosslinking for PE
Copolymerizes with ethylene to form moisture crosslinkable polymers.3
Converts arylselenyl bromides to arylvinylselenides.4
Reacts with anhydrides to transfer both vinyl and methoxy and thus form the mixed diester.5
Cross-couples w/ α-bromo esters to give α-vinyl esters in high ee.6
1. Scott, H. U.S. Patent 3,646,155, 1972.
2. Swarbrick, P. et al. U.S. Patent 4,117,195, 1978.
3. Isaka, T. et al. U.S. Patent 4,413,066, 1983.
4. Bhadra, S. et al. J. Org. Chem. 2010, 75, 4864.
5. Luo, F. et al. J. Org. Chem. 2010, 75, 5379.
6. Strotman, N. A.; Sommer, S.; Fu, G. C. Angew. Chem., Int. Ed. Engl. 2007, 46, 3556.
Vinylsilanes are used in PE and
See also SIV9220.2
EPDM insulated wire and cable
100g ¥4,900
1kg ¥9,300
サイラエース S210
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2768-02-7](既) 2-2066
TSCA EC 220-449-8 HMIS: 3-3-1-X
25g inquire
2kg inquire
16kg inquire
C5H12O3Si

COMPOUNDS

226.35

C11H18O3Si

O

SILICONSi

COMMERCIAL

VINYLTRIISOPROPENOXYSILANE, tech-95

O

SIV9220.2

VINYLTRIMETHOXYSILANE, oligomeric hydrolysate

O

Si

O

O

Viscosity: 8-10 cSt
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[131298-48-1]
TSCA
HMIS: 2-2-1-X

1.10
100g ¥7,000

1.428

2kg ¥80,000n

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

413

Name

Mw

bp °C/mm(mp °C)

D420

nD20

100.2455°(-132°)
0.6903
Viscosity, 20˚: 0.5 cSt
Flashpoint: -20°C (-4°F)
ΔHcomb: 4,133 kJ/mole
TOXICITY: oral rat, LD50: >2,000 mg/kg
ΔHfus: 7.7 kJ/mole
Autoignition temperature: 295°C
Copolymerization parameters- e,Q: 0.04, 0.029
Forms polymers which can be fabricated into oxygen enrichment membranes
Review of synthetic utility.1,2
Polymerization catalyzed by alkyllithium compounds.2,3,4
Synthetic reactions of vinylsilanes reviewed.5,6Undergoes Heck coupling to (E)-β-substituted vinyltrimethylsilanes, which can be cross-coupled further.7

1.3910

SIV9250.0

VINYLTRIMETHYLSILANE
C5H12Si

I

Si

+

SiMe3

Bu4NOAc, Pd(OAc)2
DMF, MS-4A, 24 h
94%

SiMe3

O
O
F

Reacts w/ azides to form trimethylsilyl-substituted aziridines.8

N3

+

SiMe3

UV (50%)or 55° (61%)

Ph
N

SiMe3

1. Handbook of Reagents for Organic Synthesis, Reagents for Silicon-Mediated Organic Synthesis, Fuchs, P. L. Ed., John Wiley andSons, Ltd., 2011, p. 755-761.
2. Oku, J. et al. Polymer J. 1991, 23, 1377; Macromolecules 1992, 25, 2780.
3. Gan, Y. et al. Macromolecules 1996, 29, 8285.
4. Rickle, G. J. Macromol. Sci. 1987, A24, 93.
5. Hudrlik, P. In New Applications of Organometallic Reagents in Organic Synthesis; Seyferth, D., Ed.; Elsevier: 1976.
6. F&F: Vol. 5, p 375; Vol. 6, p 637.
7. Jeffery, T. Tetrahedron Lett. 1999, 40, 1673.
8. Bassindale, A. R. et al. J. Chem. Soc., Perkin Trans. 1 2000, 1173.
F&F: Vol. 9, p 498; Vol. 10, p 44; Vol. 11, p 41; Vol. 12, p 566.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[754-05-2]
TSCA EC 212-042-9 HMIS: 2-4-0-X
10g ¥9,800
100g ¥49,100

SIV9264.0

VINYLTRIPHENOXYSILANE
C20H18O3Si

OSi

334.45210° / 7

1.13025

1.56225284-6°
1.033625
Flashpoint: 115°C (239°F)
TOXICITY: oral rat, LD50: 2,960mg/kg
Autoignition temperature: 210°C
Vapor pressure, 108°: 2 mm

1.427125

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[18666-65-4]
TSCA EC 242-486-9 HMIS: 3-2-1-X

OO

25g ¥24,100

SIV9265.0

VINYLTRIPHENYLSILANE
C20H18Si

Si

PR
Si

H

(58-61°)
Flashpoint: >110°C (>230°F)

Reacts w/ organolithium reagents to form α-lithiotriphenylsilanes
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[18666-68-7]
TSCA EC 242-487-4 HMIS: 1-1-0-X

OSi

10g ¥15,600

SIV9269.5

H

VINYLTRIS(DIMETHYLSILOXY)SILANE
C8H24O3Si4

280.61HYDROLYTIC SENSITIVITY: 3: reacts with aqueous base
[160172-46-3]
TSCA
HMIS: 1-3-1-X

O

Si

O

Si

286.4545° / 1050g ¥41,100

H

SIV9275.0

VINYLTRIS(2-METHOXYETHOXY)SILANE
C11H24O6Si

280.39

O

414

O

O

Si

O

O

Employed in peroxide graft-moisture crosslinking of polyethylene
Relative hydrolysis rate versus SIV9220.0, vinyltrimethoxysilane; 0.50
Coupling agent for kaolin in EPDM/PE cable formulations.1
1. Arkles, B. et al. Modern Plastics 1987, 64, 138.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[1067-53-4](既) 2-2067
TSCA EC 213-934-0 HMIS: 3-1-1-X

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

50g ¥3,400(215) 547-1015

2kg ¥40,000

www.gelest.com

18kg ¥205,000

COMMERCIALOEnabling Your Technology
Name

Mw

bp °C/mm(mp °C)

D420

nD20

0.981

1.424

0.98225

1.465

SIV9277.0

O

VINYLTRIS(1-METHOXY-2-PROPOXY)SILANE
O
O

Si

322.47

C14H30O6Si

O

Flashpoint: 122°C (252°F)

HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 2-1-1-X

O

25g ¥10,900[303746-21-6]

100g ¥27,800

O

SIV9280.0

VINYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95
O

O

O
Si
Si

313.47113° / 0.1

Neutral cross-linker/coupling agent for condensation cure silicones
Byproduct: methylethylketoxime
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[2224-33-1]
TSCA EC 218-747-8 HMIS: 3-3-1-X

O
N(-22°)

50g ¥7,700

2kg ¥56,400

16kg ¥242,000

O
O
F

Si

C14H27N3O3Si

N

COMMERCIALN

SIV9300.0

VINYLTRIS(TRIMETHYLSILOXY)SILANE

Si

322.70
Dipole moment: 0.93 debye
Copolymerization parameters- e,Q: -0.690, 0.030
Undergoes hydrosilylation reactions
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[5356-84-3]
TSCA EC 226-342-2 HMIS: 2-2-0-X
C11H30O3Si4

O
Si

O

78° / 150.865725g ¥15,400

1.3971100g ¥42,200

Si

N
Si

N
Y

YTTRIUM(III) TRIS[BIS(TRIMETHYLSILYLAMIDE)]

Si

Si

N
Si

YTTRIUM(lll) TRIS(HEXAMETHYLDISILAZIDE)
C18H54N3Si6Y

570.06105° / 10-4 sub.

(180-4°)

Employed in CVD of yttria stabilized coatings
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[41836-28-6]
HMIS: 3-2-1-X
5g ¥67,100

SIZ9692.0

ZEOLITE-CHABAZITEHYDRATED SODIUM CHABAZITE
CaAl2Si4O12∙6H2O

PR

Crystal structure image
courtesy of webmineral.com

1039.07
1.73
Particle Size: <74 μm
Mohs Hardness: 4.0
Typical bulk density, not compacted: 0.18 g/cm3
Triclinic pinacoidal
Effective pore diameter: 4.3 Å
Bulk density: 0.55-0.60 g/cm3
Surface area: 500-550 m2/g
Electron Density: 2.07 gm/cc
Slurry pH: 8.5
Colorless to white
Used in molecular sieves, gas adsorption, detergents, cation exchange, catalysis
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12251-32-0]
TSCA-E
HMIS: 1-0-0-X
500g ¥10,900
3kg ¥37,900

1.48

SILICON

SIY9680.0

Si

COMPOUNDSWOLLASTONITE - see SIC2050.0 CALCIUM METASILICATEZEOLITE - FAUJASITE - see SIM6594.7 MOLECULAR SIEVES, 13X

SIZ9696.0

ZEOLITE-MORDENITE

HYDRATED CALCIUM SODIUM POTASSIUM ALUMINUM SILICATE
Ca0.6Na0.15K0.05Al2Si10O24∙7H2O
874.11

Crystal structure image
courtesy of webmineral.com

Particle Size: <74 μm
Mohs Hardness: 5.0
Typical bulk density, not compacted: 0.16 g/cm3
Orthorhombic pyramidal
Colorless to white prismatic minute crystals
Used in molecular sieves, gas adsorption, detergents, cation exchange, catalysis
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12445-20-4]
TSCA-E
HMIS: 1-0-0-X
500g ¥54,900

2.12

1.47

0.957

1.4506

SIZ9700.0

ZINC BIS(HEXAMETHYLDISILAZIDE)SiSi

N Zn NSi

Si

ZINC BIS[BIS(TRIMETHYLSILYL)AMIDE]
C12H36N2Si4Zn

386.1582-7° / 0.5(12-3°)
Flashpoint: 40°C (104°F)

Converts aryl bromides and chlorides to anilines.1
1. Lee, D.-Y.; Hartwig, J. F. Org. Lett. 2005, 7, 1169.
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[3999-27-7]
HMIS: 3-3-1-X
1.0g ¥38,500

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TEL: 03-5543-1630

Gelest, Inc.

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www.gelest.com

415

Name

Mw

bp °C/mm(mp °C)

D420

nD20

183.30(2,550°)4.56~200 mesh powder
Mohs Hardness: 7.5
14
Resistivity: 10 ohm-cm
Dielectric constant: 9.4 - 12.7
Forms zirconium boride ceramics in combination with SiB6.1
1. Low, I. Key Eng. Mater. 1992, 53b, 592.
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[10101-52-7](既) 1-550
TSCA-E EC 233-252-7 HMIS: 1-0-0-X
500g ¥10,900
2.5kg ¥35,500

1.925

SIZ9810.0
Cl

Si
N

Zr

Si

ZIRCONIUM BIS(HEXAMETHYLDISILAZIDE)DICHLORIDE, tech-95
C12H36Cl2N2Si4Zr
482.90

Si
Si

Cl

(50°)

Precursor for ALD of ZrO2.1
1. Nam, W. et al. Chem. Vap. Deposition 2004, 10, 201.
See also SIZ9920.0
HYDROLYTIC SENSITIVITY: 8: reacts rapidly with moisture, water, protic solvents[70969-28-7]
HMIS: 3-2-1-X
10g ¥31,600

N

SIZ9850.0

ZIRCONIUM SILICATEZIRCONO4SiZrO
OF

Crystal structure image
courtesy of webmineral.com

SIZ9860.0

ZIRCONIUM SILICIDE, powder, 99%

ZrSi2
Si
Si

N

Cl

Si
N

Si

4.880

25g ¥13,000

ZIRCONIUM TRIS(2,2,5,5-TETRAMETHYL-2,5-DISILAPYRROLIDINE)CHLORIDE, tech-95
C18H48ClN3Si6Zr
601.79Light yellow solid; contains tetrakis analog
For ALD of ZrO2
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water
HMIS: 3-2-1-X
10g ¥77,700(>200°)

PRSi(1,620°)

SIZ9920.0

Si

Zr

N

147.39Average particle size: 10 μm
HYDROLYTIC SENSITIVITY: 1: no significant reaction with aqueous systems[12039-90-6]
TSCA EC 234-911-1 HMIS: 2-0-0-X
Si2Zr

416

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TEL: 03-5543-1630

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Molecular Formula Index
Molecular formula Catalog #

Name

B6Si
Br4Si
CaO3Si
CaSi2
Cl4Si
Cl4Si
Cl6OSi2
Cl6Si2
Cl6Si2
Cl8O2Si3Cl8Si3
Cl12Si5
CCl6Si
CH2Cl4Si
CH2Cl6Si2
CH3Cl3Si
CH3Cl3Si
CH3F3Si
CH4Cl2Si
CH4Cl4Si2
CH5KO3Si
CH5NaO3Si
CH6Si
CH6Si
CH8Si2CSi
C2Cl6Si2
C2H3Br2Cl3Si
C2H3Cl3Si
C2H4BrCl3Si
C2H4Cl4Si
C2H4Cl4Si
C2H4Cl4Si
C2H4Cl6Si2
C2H5Cl3Si
C2H5Cl3Si
C2H6Cl2Si
C2H6Cl2Si
C2H6Cl2Si
C2H6Cl4Si2
C2H6F2Si
C2H6SiC2H7ClSi
C2H7ClSi
C2H7FSi
C2H8SiC2H8Si
C2H10Si2
C2H10Si2
C2H12Si3C3H4Cl3F3Si
C3H4Cl3NSi
C3H5Cl3Si
C3H6BrCl3Si
C3H6Cl2Si
C3H6Cl2Si
C3H6Cl2Si
C3H6Cl4Si
C3H6Cl6Si2
C3H6Na2O5Si
C3H7Cl3Si
C3H7Cl3Si
C3H7Cl3Si
C3H7Cl3Si
C3H7Cl3Si
C3H8BrClSi
C3H8Cl2Si
C3H8Cl2Si
C3H9BrSi
C3H9ClOSi
C3H9ClO3SSi
C3H9ClSi
C3H9ClSi
C3H9ClSi

SILICON HEXABORIDETETRABROMOSILANECALCIUM METASILICATECALCIUM SILICIDE, tech-95, powder
TETRACHLOROSILANE, 98%
TETRACHLOROSILANE, 99.99%
HEXACHLORODISILOXANE, 95%
HEXACHLORODISILANEHEXACHLORODISILANE, 99.9%
OCTACHLOROTRISILOXANE, 95%
OCTACHLOROTRISILANE, tech-95
TETRAKIS(TRICHLOROSILYL)SILANE
TRICHLOROMETHYLTRICHLOROSILANE, 50% in toluene
CHLOROMETHYLTRICHLOROSILANE
BIS(TRICHLOROSILYL)METHANEMETHYLTRICHLOROSILANE, 98%
METHYLTRICHLOROSILANE, 99%
METHYLTRIFLUOROSILANE
METHYLDICHLOROSILANE
BIS(DICHLOROSILYL)METHANE, tech-95
POTASSIUM METHYLSILICONATE, 40% in water
SODIUM METHYLSILICONATE, 30% in water
METHYLSILANE
METHYLSILANE, 99.9+%
1,3-DISILAPROPANE
SILICON CARBIDE, powder. 35-60μ
BIS(TRICHLOROSILYL)ACETYLENE
1,2-DIBROMOETHYLTRICHLOROSILANEVINYLTRICHLOROSILANE
2-BROMOETHYLTRICHLOROSILANE, 95%
1-CHLOROETHYLTRICHLOROSILANE, tech-95
2-CHLOROETHYLTRICHLOROSILANE, 95%(DICHLOROMETHYL)METHYLDICHLOROSILANE, tech-95
1,2-BIS(TRICHLOROSILYL)ETHANE, 95%
CHLOROMETHYLMETHYLDICHLOROSILANEETHYLTRICHLOROSILANEDIMETHYLDICHLOROSILANE, 98%
DIMETHYLDICHLOROSILANE, 99+%
ETHYLDICHLOROSILANE
1,1,3,3-TETRACHLORO-1,3-DISILABUTANE, tech-90
DIMETHYLDIFLUOROSILANEVINYLSILANE
2-CHLOROETHYLSILANEDIMETHYLCHLOROSILANEDIMETHYLFLUOROSILANEDIMETHYLSILANEETHYLSILANE
1,3-DISILABUTANE
1,4-DISILABUTANE
1,3,5-TRISILAPENTANE(3,3,3-TRIFLUOROPROPYL)TRICHLOROSILANE
2-CYANOETHYLTRICHLOROSILANE
ALLYLTRICHLOROSILANE
3-BROMOPROPYLTRICHLOROSILANE
ALLYLDICHLOROSILANECYCLOTRIMETHYLENEDICHLOROSILANEVINYLMETHYLDICHLOROSILANE
3-CHLOROPROPYLTRICHLOROSILANE
1,3-BIS(TRICHLOROSILYL)PROPANECARBOXYETHYLSILANETRIOL, DISODIUM SALT, 25% in water
BIS(CHLOROMETHYL)METHYLCHLOROSILANE, 95%
2-CHLOROETHYLMETHYLDICHLOROSILANE(DICHLOROMETHYL)DIMETHYLCHLOROSILANE, tech-95
ISOPROPYLTRICHLOROSILANE
n-PROPYLTRICHLOROSILANE
BROMOMETHYLDIMETHYLCHLOROSILANE
CHLOROMETHYLDIMETHYLCHLOROSILANEETHYLMETHYLDICHLOROSILANE
TRIMETHYLBROMOSILANEDIMETHYLMETHOXYCHLOROSILANE, 90%
TRIMETHYLSILYLCHLOROSULFONATE, 95%
CHLOROMETHYLDIMETHYLSILANE
TRIMETHYLCHLOROSILANE
TRIMETHYLCHLOROSILANE, 99+%

C3H9Cl3GeSi
C3H9Cl3OSi2
C3H9FSi
C3H9ISi
C3H9KOSiC3H9KOSi
C3H9LiOSi
C3H9N3Si
C3H9NaOSi
C3H9O4ReSi
C3H10OSi
C3H10O2Si
C3H10O3Si
C3H10O6SSi
C3H10Si
C3H16Si4
C3H11NOSi
C3H11NO3Si
C3H12Si3C4H3BrCl3F4Si
C4H6Cl2Si
C4H6Cl3NSi
C4H6Cl4O2Si
C4H6Cl4Si
C4H6Cl6Si2
C4H7Cl2F3Si
C4H7Cl2NSi
C4H7Cl3O2Si
C4H7Cl3O2Si
C4H7Cl3Si
C4H7Cl3Si
C4H8BrCl3Si
C4H8Cl2Si
C4H8Cl2Si
C4H8Cl2Si
C4H8SiC4H9ClSi
C4H9ClSi
C4H9Cl3Si
C4H9Cl3Si
C4H9Cl3Si
C4H9Cl3Si
C4H9Cl3Si
C4H9FSi
C4H9F3O3SSi
C4H9F3Si
C4H9KOSi
C4H9NOSi
C4H9NSSi
C4H9NSi
C4H9NSi
C4H10Cl2O2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl2Si
C4H10Cl4Si2
C4H10Cl6Si3
C4H10F4Si2
C4H10N2Si
C4H10N2Si
C4H10Si
C4H11BrSi
C4H11ClMgSi
C4H11ClMgSi
C4H11ClO2Si
C4H11ClO3Si
C4H11ClSi
C4H11ClSi
C4H11ISi
C4H11LiSi

TRIMETHYLGERMYLTRICHLOROSILANE
TRIMETHYLSILOXYTRICHLOROSILANE
TRIMETHYLFLUOROSILANE
TRIMETHYLIODOSILANEPOTASSIUM TRIMETHYLSILANOLATE, 95%
POTASSIUM TRIMETHYLSILANOLATE, 2M in tetrahydrofuran
LITHIUM TRIMETHYLSILANOLATE
TRIMETHYLSILYL AZIDESODIUM TRIMETHYLSILANOLATE
TRIMETHYLSILYL PERRHENATETRIMETHYLSILANOL, tech-95
METHYLDIMETHOXYSILANE
TRIMETHOXYSILANE, 95%
3-(TRIHYDROXYSILYL)-1-PROPANESULFONIC ACID, 30-35% in water
TRIMETHYLSILANE
TRIS(SILYLMETHYL)SILANE
O-TRIMETHYLSILYLHYDROXYLAMINE, 95%
3-AMINOPROPYLSILANETRIOL, 22-25% in water
1,3,5-TRISILACYCLOHEXANE
4-BROMO-3,3,4,4-TETRAFLUOROBUTYLTRICHLOROSILANEDIVINYLDICHLOROSILANE, 90%
3-CYANOPROPYLTRICHLOROSILANE
3-(TRICHLOROSILYL)PROPYLCHLOROFORMATE
2-(CHLOROMETHYL)ALLYLTRICHLOROSILANE
1,1-BIS(TRICHLOROSILYLMETHYL)ETHYLENE(3,3,3-TRIFLUOROPROPYL)METHYLDICHLOROSILANE
2-CYANOETHYLMETHYLDICHLOROSILANEACETOXYETHYLTRICHLOROSILANE
2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE, tech 95(E)-2-BUTENYLTRICHLOROSILANE(Z)-2-BUTENYLTRICHLOROSILANE
4-BROMOBUTYLTRICHLOROSILANE
ALLYLMETHYLDICHLOROSILANE, 95%
CYCLOTETRAMETHYLENEDICHLOROSILANE
1-PROPENYLMETHYLDICHLOROSILANE, 95%
1-SILA-3-CYCLOPENTENE, tech-95
CYCLOTRIMETHYLENEMETHYLCHLOROSILANEVINYLDIMETHYLCHLOROSILANE
n-BUTYLTRICHLOROSILANE
t-BUTYLTRICHLOROSILANE
3-CHLOROPROPYLMETHYLDICHLOROSILANE(DICHLOROMETHYL)(CHLOROMETHYL)DIMETHYLSILANE, tech-95
ISOBUTYLTRICHLOROSILANEVINYLDIMETHYLFLUOROSILANE
TRIMETHYLSILYLTRIFLUOROMETHANESULFONATETRIFLUOROMETHYLTRIMETHYLSILANEPOTASSIUM VINYLDIMETHYLSILANOLATE, tech-90
TRIMETHYLSILYLISOCYANATE, 75%
TRIMETHYLSILYLISOTHIOCYANATETRIMETHYLSILYLCYANIDETRIMETHYLSILYLCYANIDE, 99%
DIETHOXYDICHLOROSILANE, tech-90
BIS(CHLOROMETHYL)DIMETHYLSILANE
t-BUTYLDICHLOROSILANE(DICHLOROMETHYL)TRIMETHYLSILANE, tech-95
DIETHYLDICHLOROSILANEISOBUTYLDICHLOROSILANE
ISOPROPYLMETHYLDICHLOROSILANE
n-PROPYLMETHYLDICHLOROSILANE
1,2-BIS(METHYLDICHLOROSILYL)ETHANE
2,2,4,4,6,6-HEXACHLORO-2,4,6-TRISILAHEPTANE
1,2-BIS(METHYLDIFLUOROSILYL)ETHANE
TRIMETHYLSILYLDIAZOMETHANE, 1.0M in methylene chloride
TRIMETHYLSILYLDIAZOMETHANE, 2M in diethyl ether
VINYLDIMETHYLSILANE
BROMOMETHYLTRIMETHYLSILANE
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 1.0M in diethyl ether
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 3M in methyltetrahydrofuran
CHLOROMETHYLMETHYLDIMETHOXYSILANE
CHLOROMETHYLTRIMETHOXYSILANE
CHLOROMETHYLTRIMETHYLSILANEETHYLDIMETHYLCHLOROSILANEIODOMETHYLTRIMETHYLSILANE
TRIMETHYLSILYLMETHYLLITHIUM, 1M in hexane

GET8561
SIT8572.6
SIT8525.0
SIT8564.0
SIP6901.0
SIP6901.2
SIL6469.7
SIT8580.0
SIS6988.0
SIT8598.0
SIT8570.3
SIM6508.0
SIT8392.0
SIT8378.3
SIT8570.0
SIT8715.9
SIT8589.8
SIA0608.0
SIT8709.3
SIB1906.5
SID4600.0
SIC2454.0
SIT8163.0
SIC2281.0
SIB1813.5
SIT8369.0
SIC2440.0
SIA0020.0
SIC2070.0
SIB1927.2
SIB1927.4
SIB1879.6
SIA0470.0
SIC2564.0
SIP6904.0
SIS6951.0
SIC2572.0
SIV9070.0
SIB1982.0
SIB1985.0
SIC2350.0
SID3360.5
SII6453.0
SIV9073.0
SIT8620.0
SIT8362.0
SIP6902.0
SIT8591.0
SIT8592.0
SIT8585.0
SIT8585.1
SID3393.0
SIB1051.0
SIB1933.0
SID3366.0
SID3402.0
SII6452.3
SII6463.0
SIP6912.0
SIB1614.0
SIH5915.0
SIB1630.0
SIT8588.0
SIT8588.3
SIV9073.5
SIB1892.0
SIT8594.0
SIT8594.1
SIC2293.2
SIC2298.6
SIC2305.0
SIE4892.0
SII6450.0
SIT8593.5

PR

O
O
F

SIS6968.0
SIT7050.0
SIC2050.0
SIC2054.0
SIT7085.0
SIT7085.1
SIH5910.0
SIH5905.0
SIH5905.1
SIO6605.0
SIO6601.0
SIT7294.0
SIT8153.0
SIC2298.0
SIB1813.0
SIM6520.0
SIM6520.1
SIM6558.0
SIM6504.0
SIB1064.0
SIP6898.0
SIS6984.0
SIM6515.0
SIM6515.1
SID4595.0
SIS6959.0
SIB1805.0
SID2756.0
SIV9110.0
SIB1880.0
SIC2269.0
SIC2270.0
SID3362.0
SIB1810.0
SIC2290.0
SIE4901.0
SID4120.0
SID4120.1
SIE4890.0
SIT7084.0
SID4122.0
SIV9096.7
SIC2268.5
SID4070.0
SID4145.0
SID4230.0
SIE4898.0
SID4592.0
SID4593.0
SIT8709.8
SIT8371.0
SIC2442.0
SIA0520.0
SIB1905.0
SIA0445.0
SIC2568.0
SIV9084.0
SIC2405.0
SIB1815.0
SIC2263.0
SIB1053.0
SIC2267.0
SID3361.0
SII6463.3
SIP6915.0
SIB1890.0
SIC2285.0
SIE4896.0
SIT8430.0
SID4210.0
SIT8584.0
SIC2289.0
SIT8510.0
SIT8510.1

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

SILICONName

COMPOUNDS

Enabling Your Technology

Molecular formula Catalog #417

Molecular Formula Index

Name

C4H11N3Si
C4H12Br2Si3
C4H12ClNSi
C4H12Cl2OSi2
C4H12Cl2Si2
C4H12NaO6PSi
C4H12OSi
C4H12OSi
C4H12OSi
C4H12O2Si
C4H12O2Si
C4H12O3SSi
C4H12O3Si
C4H12O3Si
C4H12O4Si
C4H12O4Si
C4H12SSi
C4H12Si
C4H12Si
C4H12Si
C4H12Si
C4H12Si
C4H13NSi
C4H13NSi
C4H14OSi2
C4H14Si2
C4H14Si2
C4H15NSi2
C4H16O4Si4
C4H16O4Si4
C4H18Si4
C4N4O4Si
C5H8Cl3NSi
C5H9Cl2NOSi
C5H9Cl2NSi
C5H9Cl3O2Si
C5H9Cl3Si
C5H9F3O2Si
C5H9F3O4SSi
C5H9F3Si
C5H9ISi
C5H9LiSi
C5H10BrCl3Si
C5H10ClF3Si
C5H10Cl2O2Si
C5H10Cl2O2Si
C5H10Cl2Si
C5H10Cl2Si
C5H10Si
C5H11BrO2Si
C5H11BrSi
C5H11BrSi
C5H11BrSi
C5H11ClO2Si
C5H11ClSi
C5H11ClSi
C5H11ClSi
C5H11Cl3Si
C5H11Cl3Si
C5H11F3O3SSi
C5H11NSi
C5H11N3Si
C5H11NaOSi
C5H12Br2Si
C5H12Cl2Si
C5H12Cl2Si
C5H12Cl2Si
C5H12OSiC5H12OSiC5H12O2SSi
C5H12O2Si
C5H12O2Si
C5H12O2Si
C5H12O2Si(AZIDOMETHYL)TRIMETHYLSILANE, 95%
1,2-DIBROMOTETRAMETHYLDISILANE, tech-95(N,N-DIMETHYLAMINO)DIMETHYLCHLOROSILANE, 95%
1,3-DICHLOROTETRAMETHYLDISILOXANE
1,2-DICHLOROTETRAMETHYLDISILANE, 95%
3-(TRIHYDROXYSILYL)PROPYLMETHYLPHOSPHONATE,MONOSODIUM SALT,42% in water
DIMETHYLETHOXYSILANEHYDROXYMETHYLTRIMETHYLSILANE
TRIMETHYLMETHOXYSILANEDIMETHYLDIMETHOXYSILANE, 96%
DIMETHYLDIMETHOXYSILANE, 99+%
TRIMETHYLSILYL METHANESULFONATEMETHYLTRIMETHOXYSILANE
METHYLTRIMETHOXYSILANE, 99%
TETRAMETHOXYSILANE, 98%
TETRAMETHOXYSILANE, 99+%
(METHYLTHIO)TRIMETHYLSILANE
n-BUTYLSILANEDIETHYLSILANEETHYLDIMETHYLSILANETETRAMETHYLSILANE, 99+%
TETRAMETHYLSILANE, 99.9+%
AMINOMETHYLTRIMETHYLSILANE(N,N-DIMETHYLAMINO)DIMETHYLSILANE, 95%
1,1,3,3-TETRAMETHYLDISILOXANE, 98%
1,4-DIMETHYLDISILETHANE
1,1,2,2-TETRAMETHYLDISILANE
1,1,3,3-TETRAMETHYLDISILAZANE
1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE, 99+%
2,2,3,3-TETRAMETHYLTETRASILANE, 95%
TETRAISOCYANATOSILANE(3-CYANOBUTYL)TRICHLOROSILANE
3-ISOCYANATOPROPYLMETHYLDICHLOROSILANE
3-CYANOPROPYLMETHYLDICHLOROSILANE
TRIMETHYLSILYLTRICHLOROACETATECYCLOPENTYLTRICHLOROSILANE
TRIMETHYLSILYLTRIFLUOROACETATETRIMETHYLSILYL 2,2-DIFLUORO-2-(FLUOROSULFONYL)ACETATEVINYL(TRIFLUOROMETHYL)DIMETHYLSILANE
1-IODO-2-(TRIMETHYLSILYL)ACETYLENE
LITHIUM (TRIMETHYLSILYL)ACETYLIDE, 0.5M in tetrahydrofuran
5-BROMOPENTYLTRICHLOROSILANE(3,3,3-TRIFLUOROPROPYL)DIMETHYLCHLOROSILANEACETOXYETHYLMETHYLDICHLOROSILANE
2-(CARBOMETHOXY)ETHYLMETHYLDICHLOROSILANE, tech-95
3-BUTENYLMETHYLDICHLOROSILANECYCLOPENTAMETHYLENEDICHLOROSILANEETHYNYLTRIMETHYLSILANE
TRIMETHYLSILYL BROMOACETATE
1-BROMOVINYLTRIMETHYLSILANE
2-BROMOVINYLTRIMETHYLSILANEVINYL(BROMOMETHYL)DIMETHYLSILANEVINYL(CHLOROMETHYL)DIMETHOXYSILANE
ALLYLDIMETHYLCHLOROSILANE, 95%
1-CHLOROVINYLTRIMETHYLSILANEVINYL(CHLOROMETHYL)DIMETHYLSILANE
3-CHLOROISOBUTYLMETHYLDICHLOROSILANEPENTYLTRICHLOROSILANE
TRIMETHYLSILYLMETHYLTRIFLUOROMETHANESULFONATE, 96%
TRIMETHYLSILYLACETONITRILE
1-TRIMETHYLSILYL-1,2,4-TRIAZOLESODIUM ALLYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
1,2-DIBROMOETHYLTRIMETHYLSILANE, 95%
n-BUTYLMETHYLDICHLOROSILANE
t-BUTYLMETHYLDICHLOROSILANE
3-CHLOROPROPYLDIMETHYLCHLOROSILANEACETYLTRIMETHYLSILANEVINYLOXYTRIMETHYLSILANE
2,2-DIMETHOXY-1-THIA-2-SILACYCLOPENTANEACETOXYTRIMETHYLSILANE
ALLYLDIMETHOXYSILANE
2-(TRIMETHYLSILYL)ACETIC ACIDVINYLMETHYLDIMETHOXYSILANEPR

SIA0775.0
SID2768.0
SID3546.5
SID3372.0
SID3370.0
SIT8378.5
SID4125.0
SIH6177.0
SIT8566.0
SID4123.0
SID4123.1
SIT8593.0
SIM6560.0
SIM6560.1
SIT7510.0
SIT7510.2
SIM6518.5
SIB1974.5
SID3415.0
SIE4894.0
SIT7555.0
SIT7555.1
SIA0596.0
SID3546.6
SIT7546.0
SID4235.0
SIT7541.0
SIT7542.0
SIT7530.0
SIT7530.1
SIT7580.0
SIT7125.0
SIC2438.0
SII6454.4
SIC2453.0
SIT8616.0
SIC2555.0
SIT8618.0
SIT8588.4
SIV9205.0
SII6452.2
SIL6470.0
SIB1894.0
SIT8364.0
SIA0015.0
SIC2068.0
SIB1926.0
SIC2524.0
SIE4904.0
SIT8582.0
SIB1910.0
SIB1910.1
SIV9062.0
SIV9064.0
SIA0460.0
SIC2432.0
SIV9065.0
SIC2279.0
SIP6720.0
SIT8595.0
SIT8579.0
SIT8613.0
SIS6977.0
SID2758.0
SIB1972.0
SIB1972.2
SIC2336.0
SIA0130.0
SIV9089.0
SID3545.0
SIA0110.0
SIA0447.0
SIT8577.0
SIV9086.0

418

Molecular formula Catalog #Name

C5H12O3Si
C5H12Si
C5H12Si
C5H12Si
C5H12Si
C5H13ClOSi
C5H13ClO2Si
C5H13ClSi
C5H13ClSi
C5H13ClSi
C5H13ClSi
C5H13NOSi
C5H13NO2Si
C5H14FNSi
C5H14OSiC5H14OSiC5H14OSiC5H14O2Si
C5H14O3Si
C5H14Si
C5H14Si
C5H14Si
C5H15ClSi2
C5H15NOSi
C5H15NSi
C5H15O3PSi
C5H16N2O3Si
C5H16N2Si
C5H16OSi2
C5H20O5Si5
C6H3Cl5Si
C6H4BrCl3Si
C6H4Cl3F9Si
C6H4Cl4Si
C6H5Cl3Si
C6H5F3Si
C6H6Cl2Si
C6H6Cl3F7OSi
C6H7ClSi
C6H8SiC6H9ClSi
C6H9Cl3O2Si
C6H9Cl3Si
C6H9NaOSSi
C6H9NaO2Si
C6H10Cl2Si
C6H10OSi
C6H10O2Si
C6H10Si
C6H11BrSi
C6H11Cl2NSi
C6H11Cl3Si
C6H11Cl3Si
C6H11Cl3Si
C6H11NSSi
C6H12ClNOSi
C6H12ClNSi
C6H12Cl2OSi2
C6H12Cl2O2Si
C6H12Cl4Si
C6H12Cl6Si2
C6H12F3NOSi
C6H12N2Si
C6H12OSiC6H12OSiC6H12O2Si
C6H12O4Si
C6H12Si
C6H12Si
C6H13ClO2Si
C6H13ClSi
C6H13Cl3Si
C6H13Cl3Si
C6H13Cl3Si

VINYLTRIMETHOXYSILANE
ALLYLDIMETHYLSILANE, 90%
CYCLOPENTYLSILANECYCLOTRIMETHYLENEDIMETHYLSILANEVINYLTRIMETHYLSILANE
CHLOROMETHYLDIMETHYLETHOXYSILANE
2-CHLOROETHYLMETHYLDIMETHOXYSILANE
1-CHLOROETHYLTRIMETHYLSILANE, 96%
3-CHLOROPROPYLDIMETHYLSILANE
ISOPROPYLDIMETHYLCHLOROSILANE
n-PROPYLDIMETHYLCHLOROSILANE
N-(TRIMETHYLSILYL)ACETAMIDEMETHYL N-TRIMETHYLSILYLCARBAMATE
3-AMINOPROPYLDIMETHYLFLUOROSILANE, 95%
METHOXYMETHYLTRIMETHYLSILANE
TRIMETHYLETHOXYSILANE
2-(TRIMETHYLSILYL)ETHANOLMETHYLDIETHOXYSILANEETHYLTRIMETHOXYSILANEDIETHYLMETHYLSILANEETHYLTRIMETHYLSILANE
ISOPROPYLDIMETHYLSILANEPENTAMETHYLCHLORODISILANE(DIMETHYLAMINO)METHYLETHOXYSILANE, tech-95(N,N-DIMETHYLAMINO)TRIMETHYLSILANE
O,O’-DIMETHYL(TRIMETHYLSILYL)PHOSPHITE, tech-95
N-(2-AMINOETHYL)-3-AMINOPROPYLSILANETRIOL, 25% in water, mainly oligomers
BIS(DIMETHYLAMINO)METHYLSILANEPENTAMETHYLDISILOXANE
1,3,5,7,9-PENTAMETHYLCYCLOPENTASILOXANE, 90%
DICHLOROPHENYLTRICHLOROSILANE, 95%
BROMOPHENYLTRICHLOROSILANENONAFLUOROHEXYLTRICHLOROSILANE
CHLOROPHENYLTRICHLOROSILANE, 95%
PHENYLTRICHLOROSILANEPHENYLTRIFLUOROSILANE, 95%
PHENYLDICHLOROSILANE(3-HEPTAFLUOROISOPROPOXY)PROPYLTRICHLOROSILANEPHENYLCHLOROSILANEPHENYLSILANE
TRIVINYLCHLOROSILANE, 95%(3-ACRYLOXYPROPYL)TRICHLOROSILANE
3-CYCLOHEXENYLTRICHLOROSILANESODIUM (2-THIENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM (2-FURYL)DIMETHYLSILANOLATE
DIALLYLDICHLOROSILANE
3-TRIMETHYLSILYLPROPYNAL
3-TRIMETHYLSILYLPROPYNOIC ACIDTRIVINYLSILANE, tech-95
3-BROMO-1-(TRIMETHYLSILYL)-1-PROPYNE, 95%(3-CYANOBUTYL)METHYLDICHLOROSILANE
ALLYL(3-CHLOROPROPYL)DICHLOROSILANECYCLOHEXYLTRICHLOROSILANE
5-HEXENYLTRICHLOROSILANE, 95%
2-TRIMETHYLSILYLTHIAZOLE
3-ISOCYANATOPROPYLDIMETHYLCHLOROSILANE
3-CYANOPROPYLDIMETHYLCHLOROSILANE
1,3-DIVINYL-1,3-DIMETHYL-1,3-DICHLORODISILOXANE
3-ACETOXYPROPYLMETHYLDICHLOROSILANE
BIS(3-CHLOROPROPYL)DICHLOROSILANE
1,6-BIS(TRICHLOROSILYL)HEXANE
N-METHYL-N-TRIMETHYLSILYLTRIFLUOROACETAMIDE, 96%
N-(TRIMETHYLSILYL)IMIDAZOLEPROPARGYLOXYTRIMETHYLSILANE
3-TRIMETHYLSILYLPROPARGYL ALCOHOLACRYLOXYTRIMETHYLSILANEDIMETHYLDIACETOXYSILANEDIVINYLDIMETHYLSILANE
1-TRIMETHYLSILYLPROPYNE
ACETOXYETHYLDIMETHYLCHLOROSILANE
ALLYL(CHLOROMETHYL)DIMETHYLSILANE, 95%(3,3-DIMETHYLBUTYL)TRICHLOROSILANEHEXYLTRICHLOROSILANETHEXYLTRICHLOROSILANE

SIV9220.0
SIA0464.0
SIC2554.0
SIC2570.0
SIV9250.0
SIC2286.0
SIC2268.0
SIC2275.0
SIC2340.0
SII6462.0
SIP6910.0
SIT8575.0
SIM6574.0
SIA0603.4
SIM6492.0
SIT8515.0
SIT8589.2
SIM6506.0
SIE4901.4
SID3410.0
SIE4901.5
SII6463.1
SIP6717.5
SID3546.8
SID3605.0
SID4245.0
SIA0590.0
SIB1075.0
SIP6719.0
SIP6718.0
SID3367.6
SIB1903.0
SIN6597.6
SIC2330.0
SIP6810.0
SIP6821.5
SIP6725.0
SIH5842.0
SIP6724.98
SIP6750.0
SIT8729.0
SIA0199.0
SIC2464.0
SIS6987.0
SIS6980.6
SID2742.0
SIT8606.3
SIT8606.6
SIT8735.5
SIB1907.0
SIC2437.0
SIA0441.0
SIC2480.0
SIH6164.0
SIT8612.0
SII6454.0
SIC2452.0
SID4604.0
SIA0090.0
SIB1055.3
SIB1812.0
SIM6576.0
SIT8590.0
SIP6903.0
SIT8604.0
SIA0320.0
SID4076.0
SID4606.0
SIT8606.5
SIA0010.0
SIA0440.0
SID4069.0
SIH6167.0
SIT7906.6

O
O
F

Molecular formula Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Molecular Formula Index
Molecular formula Catalog #Name

C6H13F3O2Si
C6H13F3O3Si
C6H13F3Si
C6H13NO2Si
C6H13NO3Si
C6H13NSi
C6H14BrClSi
C6H14Cl2Si
C6H14Cl2Si
C6H14Cl2Si
C6H14Cl2Si
C6H14Cl2Si
C6H14Cl4Si2
C6H14OSiC6H14OSiC6H14OSiC6H14OSiC6H14OSiC6H14O2Si
C6H14O2Si
C6H14O2Si
C6H14O2Si
C6H14O3Si
C6H14O5Si
C6H14Si
C6H14Si
C6H14Si
C6H15BrO3Si
C6H15BrSi
C6H15ClOSi
C6H15ClOSi
C6H15ClOSi
C6H15ClO2Si
C6H15ClO2Si
C6H15ClO3Si
C6H15ClO3Si
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15ClSi
C6H15FO3Si
C6H15IO3Si
C6H15ISi
C6H15KOSi
C6H15NaO3SSi
C6H15NOSi
C6H15NSi
C6H16Cl2OSi2
C6H16Cl2Si2
C6H16OSiC6H16OSiC6H16OSiC6H16OSiC6H16OSiC6H16OSi2
C6H16OSi2
C6H16O2SSi
C6H16O2SSi
C6H16O2Si
C6H16O2Si
C6H16O3Si
C6H16O3Si
C6H16O3SSi
C6H16O3SSi
C6H16SSi
C6H16Si
C6H16Si
C6H16Si
C6H16Si(3,3,3-TRIFLUOROPROPYL)METHYLDIMETHOXYSILANE(3,3,3-TRIFLUOROPROPYL)TRIMETHOXYSILANE, 98%
HEXYLTRIFLUOROSILANE
2-CYANOETHYLMETHYLDIMETHOXYSILANE
2-CYANOETHYLTRIMETHOXYSILANE
2-CYANOETHYLTRIMETHYLSILANE
4-BROMOBUTYLDIMETHYLCHLOROSILANE
4-CHLOROBUTYLDIMETHYLCHLOROSILANE
3-CHLOROISOBUTYLDIMETHYLCHLOROSILANEDIISOPROPYLDICHLOROSILANEHEXYLDICHLOROSILANEPENTYLMETHYLDICHLOROSILANE
1,4-BIS(METHYLDICHLOROSILYL)BUTANE, 95%
ALLYLOXYTRIMETHYLSILANE
1,1-DIMETHYL-1-SILA-2-OXACYCLOHEXANE, 96%
ISOPROPENOXYTRIMETHYLSILANE, 95%(1-METHOXYVINYL)TRIMETHYLSILANE, 95%
VINYLDIMETHYLETHOXYSILANEACETOXYMETHYLTRIMETHYLSILANE
ALLYLMETHYLDIMETHOXYSILANE, tech-95
METHYLTRIMETHYLSILYLACETATE
3-TRIMETHYLSILYLPROPIONIC ACIDALLYLTRIMETHOXYSILANEACETOXYMETHYLTRIMETHOXYSILANE, 95%
ALLYLTRIMETHYLSILANECYCLOTETRAMETHYLENEDIMETHYLSILANE
2-PROPENYLTRIMETHYLSILANE, 95%
3-BROMOPROPYLTRIMETHOXYSILANE
TRIETHYLBROMOSILANE
CHLOROMETHYLDIMETHYLISOPROPOXYSILANE
3-CHLOROPROPYLDIMETHYLMETHOXYSILANE, 95%
2-(TRIMETHYLSILYL)ETHOXYMETHYL CHLORIDE, 95%
CHLOROMETHYLMETHYLDIETHOXYSILANE
3-CHLOROPROPYLMETHYLDIMETHOXYSILANE
3-CHLOROPROPYLTRIMETHOXYSILANE
TRIETHOXYCHLOROSILANE, tech-95
n-BUTYLDIMETHYLCHLOROSILANE
t-BUTYLDIMETHYLCHLOROSILANE
t-BUTYLDIMETHYLCHLOROSILANE, 1.0M in methylene chloride
t-BUTYLDIMETHYLCHLOROSILANE, 3M in tetrahydrofurant-BUTYLDIMETHYLCHLOROSILANE, 2.85M in toluene, 48-52% solution
3-CHLOROPROPYLTRIMETHYLSILANEDIISOPROPYLCHLOROSILANEISOBUTYLDIMETHYLCHLOROSILANE
TRIETHYLCHLOROSILANE
TRIETHOXYFLUOROSILANE, 95%
3-IODOPROPYLTRIMETHOXYSILANE
TRIETHYLIODOSILANEPOTASSIUM TRIETHYLSILANOLATE, 95%
TRIMETHYLSILYLPROPANESULFONIC ACID SODIUM SALT, monohydrate
2,2,4-TRIMETHYL-1-OXA-4-AZA-2-SILACYCLOHEXANE
ALLYLAMINOTRIMETHYLSILANE, 96%
1,3-BIS(CHLOROMETHYL)TETRAMETHYLDISILOXANE
1,2-BIS(CHLORODIMETHYLSILYL)ETHANE
t-BUTYLDIMETHYLSILANOL
n-PROPYLDIMETHYLMETHOXYSILANE
TRIETHYLSILANOLTRIMETHYL-n-PROPOXYSILANE
3-(TRIMETHYLSILYL)-1-PROPANOL
2,2,5,5-TETRAMETHYL-2,5-DISILA-1-OXACYCLOPENTANEVINYL-1,1,3,3-TETRAMETHYLDISILOXANE(MERCAPTOMETHYL)METHYLDIETHOXYSILANE, 95%
3-MERCAPTOPROPYLMETHYLDIMETHOXYSILANE, 96%
DIMETHYLDIETHOXYSILANE, 98%
n-PROPYLMETHYLDIMETHOXYSILANE
n-PROPYLTRIMETHOXYSILANE
TRIETHOXYSILANE
3-MERCAPTOPROPYLTRIMETHOXYSILANE
3-MERCAPTOPROPYLTRIMETHOXYSILANE, 99+%
3-MERCAPTOPROPYLTRIMETHYLSILANE
n-BUTYLDIMETHYLSILANE
t-BUTYLDIMETHYLSILANEDIISOPROPYLSILANEHEXYLSILANE

C6H16Si
C6H16Si2
C6H17ClOSi2
C6H17NOSi
C6H17NO3Si
C6H17NSi
C6H17NSi
C6H17NSi2
C6H18BCl2NSi2
C6H18Br2Si3
C6H18Cl2O2Si3
C6H18Cl2O2Si3
C6H18ClN3Si
C6H18KNSi2
C6H18KNSi2
C6H18LiNSi2
C6H18LiNSi2
C6H18LiNSi2
C6H18NNaSi2
C6H18NNaSi2
C6H18N2SSi2
C6H18N2Si
C6H18OSi2
C6H18OSi2
C6H18O2Si2
C6H18O2Si2
C6H18O3Si3
C6H18O3Si3
C6H18O5Si2
C6H18O6Si2
C6H18SSi2
C6H18SeSi2
C6H18Si2
C6H18Si2
C6H18Si2Te
C6H19NOSi2
C6H19NSi2
C6H19NSi2
C6H19N3Si
C6H19N3Si
C6H19PSi
C6H20O2Si3
C6H20O2Si3
C6H21NSi3
C6H21N3Si3
C6H21N3Si3
C7H6Cl4Si
C7H7Cl2F9Si
C7H7Cl3Si
C7H7Cl3Si
C7H7Cl3Si
C7H8Cl2Si
C7H8Cl3NSi
C7H8Cl3NSi
C7H9ClSi
C7H9Cl2F7OSi
C7H9Cl3Si
C7H10Si
C7H10Si
C7H11Cl3O2Si
C7H11Cl3Si
C7H12BrF4O3Si
C7H12Cl2O2Si
C7H12OSiC7H12OSiC7H12O2Si
C7H12O2Si
C7H12O4Si
C7H12O6Si
C7H12SSi
C7H12Si
C7H13Cl3Si
C7H13F3Si
C7H14ClNO3Si

TRIETHYLSILANE, 98%
1,1,3,3-TETRAMETHYL-1,3-DISILACYCLOBUTANECHLOROMETHYLPENTAMETHYLDISILOXANE
O-(t-BUTYLDIMETHYLSILYL)HYDROXYLAMINE, 95%
3-AMINOPROPYLTRIMETHOXYSILANE
3-AMINOPROPYLTRIMETHYLSILANEDIETHYLAMINODIMETHYLSILANE, 95%
2,2,5,5-TETRAMETHYL-2,5-DISILA-1-AZACYCLOPENTANE, 95%
N-(DICHLOROBORYL)HEXAMETHYLDISILAZANE
1,3-DIBROMOHEXAMETHYLTRISILANE, tech-95
BIS(TRIMETHYLSILOXY)DICHLOROSILANE
1,5-DICHLOROHEXAMETHYLTRISILOXANE, tech-95
TRIS(DIMETHYLAMINO)CHLOROSILANE, 95%
POTASSIUM HEXAMETHYLDISILAZIDE, 11% in toluene, 0.5M
POTASSIUM HEXAMETHYLDISILAZIDE, 20% in THF
LITHIUM HEXAMETHYLDISILAZIDELITHIUM HEXAMETHYLDISILAZIDE, 1M in hexane
LITHIUM HEXAMETHYLDISILAZIDE, 1.25M in tetrahydrofuran
SODIUM BIS(TRIMETHYLSILYL)AMIDE, 95%
SODIUM BIS(TRIMETHYLSILYL)AMIDE, 2M in tetrahydrofuran
BIS(TRIMETHYLSILYL)SULFUR DIIMIDE, 95%
BIS(DIMETHYLAMINO)DIMETHYLSILANEHEXAMETHYLDISILOXANE, 98%
HEXAMETHYLDISILOXANE, 99.9%
BIS(TRIMETHYLSILYL)PEROXIDE
1,2-DIMETHOXYTETRAMETHYLDISILANEHEXAMETHYLCYCLOTRISILOXANE, 95%
HEXAMETHYLCYCLOTRISILOXANE, 98%
1,3-DIMETHYLTETRAMETHOXYDISILOXANE, 95%
HEXAMETHOXYDISILANE, tech-95
HEXAMETHYLDISILTHIANE
BIS(TRIMETHYLSILYL)SELENIDEHEXAMETHYLDISILANE
1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE
BIS(TRIMETHYLSILYL)TELLURIDE
N,O-BIS(TRIMETHYLSILYL)HYDROXYLAMINE
1,1,1,3,3,3-HEXAMETHYLDISILAZANE
1,1,1,3,3,3-HEXAMETHYLDISILAZANE, 99%
TRIS(DIMETHYLAMINO)SILANE
TRIS(DIMETHYLAMINO)SILANE
BIS(TRIMETHYLSILYL)PHOSPHINE
1,1,1,5,5,5-HEXAMETHYLTRISILOXANE
1,1,3,3,5,5-HEXAMETHYLTRISILOXANE
TRIS(DIMETHYLSILYL)AMINE, 95%
1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE
1,2,3,4,5,6 HEXAMETHYLCYCLOTRISILAZANE, tech-95(p-CHLOROMETHYL)PHENYLTRICHLOROSILANE, 95%
NONAFLUOROHEXYLMETHYLDICHLOROSILANEBENZYLTRICHLOROSILANE(CHLOROPHENYL)METHYLDICHLOROSILANE, 95%
p-TOLYLTRICHLOROSILANEPHENYLMETHYLDICHLOROSILANE
2-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE
4-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE, 15-20% in toluene
PHENYLMETHYLCHLOROSILANE(3-HEPTAFLUOROISOPROPOXY)PROPYLMETHYLDICHLOROSILANE(5-BICYCLO[2.2.1]HEPT-2-ENYL)TRICHLOROSILANEPHENYLMETHYLSILANE
p-TOLYLSILANEMETHACRYLOXYPROPYLTRICHLOROSILANE, tech-95(5-BICYCLO[2.2.1]HEPTYL)TRICHLOROSILANE
4-BROMO-3,3,4,4-TETRAFLUOROBUTYLTRIMETHOXYSILANE(3-ACRYLOXYPROPYL)METHYLDICHLOROSILANE
4-TRIMETHYLSILYLBUT-3-YN-2-ONE
TRIVINYLMETHOXYSILANE, 95%
METHYL 3-TRIMETHYLSILYLPROPYNOATE
2-(TRIMETHYLSILOXY)FURANVINYLMETHYLDIACETOXYSILANE
METHYLTRIACETOXYSILANE, 95%
2-THIENYLTRIMETHYLSILANE
TRIVINYLMETHYLSILANE(CYCLOHEXYLMETHYL)TRICHLOROSILANEVINYL(3,3,3-TRIFLUOROPROPYL)DIMETHYLSILANE
CHLOROMETHYLSILATRANE

SIT8330.0
SIT7538.0
SIC2294.0
SIB1963.0
SIA0611.0
SIA0612.0
SID3395.3
SIT7536.0
SID3354.0
SID2764.0
SIB1837.0
SID3360.0
SIT8711.0
SIP6890.0
SIP6890.1
SIL6467.0
SIL6467.2
SIL6467.4
SIS6980.0
SIS6980.2
SIB1872.0
SIB1072.0
SIH6115.0
SIH6115.1
SIB1868.0
SID3544.6
SIH6105.0
SIH6105.1
SID4236.0
SIH6101.0
SIH6116.0
SIB1871.0
SIH6109.0
SIT7537.0
SIB1873.0
SIB1859.0
SIH6110.0
SIH6110.1
SIT8714.0
SIT8714.1
SIB1868.6
SIH6116.6
SIH6117.0
SIT8715.5
SIH6102.0
SIH6103.0
SIC2296.0
SIN6597.5
SIB0970.0
SIC2328.0
SIT8040.0
SIP6738.0
SIT8157.0
SIT8158.0
SIP6737.0
SIH5841.9
SIB0991.0
SIP6742.0
SIT8038.0
SIM6487.2
SIB0997.0
SIB1906.7
SIA0196.0
SIT8583.2
SIT8732.0
SIM6575.0
SIT8571.3
SIV9083.0
SIM6519.0
SIT7907.0
SIT8734.0
SIC2470.0
SIV9208.0
SIC2297.0

PR

O
O
F

SIT8370.0
SIT8372.0
SIH6168.0
SIC2441.0
SIC2446.0
SIC2446.5
SIB1879.2
SIC2265.0
SIC2277.0
SID3537.0
SIH6165.0
SIP6719.9
SIB1612.0
SIA0480.0
SID4234.0
SII6460.0
SIM6496.3
SIV9072.0
SIA0060.0
SIA0485.0
SIM6571.5
SIT8606.0
SIA0540.0
SIA0055.0
SIA0555.0
SIC2566.0
SIP6905.0
SIB1906.0
SIT8210.0
SIC2286.5
SIC2338.0
SIT8588.5
SIC2292.0
SIC2355.0
SIC2410.0
SIT8178.0
SIB1934.0
SIB1935.0
SIB1935.2
SIB1935.4
SIB1935.5
SIC2411.0
SID3535.0
SII6452.5
SIT8250.0
SIT8180.0
SII6452.0
SIT8290.0
SIP6899.0
SIT8599.0
SIT8567.0
SIA0402.0
SIB1055.0
SIB1042.0
SIB1939.0
SIP6911.0
SIT8332.0
SIT8568.0
SIT8602.0
SIT7540.0
SIV9097.5
SIM6473.0
SIM6474.0
SID4121.0
SIP6914.0
SIP6918.0
SIT8185.0
SIM6476.0
SIM6476.1
SIM6479.0
SIB1937.5
SIB1938.0
SID3539.4
SIH6166.2

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

SILICONName

COMPOUNDS

Enabling Your Technology

Molecular formula Catalog #419

Molecular Formula Index

Name

C7H14ClNSi
C7H14Cl2Si
C7H14OSiC7H14OSiC7H14OSiC7H14OSiC7H14O2Si
C7H14O2Si
C7H14O2Si
C7H14O5Si
C7H14Si
C7H14Si
C7H15ClO3Si
C7H15ClSi
C7H15Cl3Si
C7H15Cl9Si4
C7H15F3O3SSi
C7H15F3O3SSi
C7H15F3Si
C7H15NOSi
C7H15NO2Si
C7H15NO3Si
C7H15NO3Si
C7H15NO3Si
C7H15NO4Si
C7H15NSi
C7H16Cl2Si
C7H16Cl2Si
C7H16OSiC7H16OSiC7H16O2SSi
C7H16O2Si
C7H16O2Si
C7H16O5Si
C7H16O5Si
C7H16S2Si
C7H16Si
C7H16Si
C7H16Si
C7H16Si
C7H17BrOSi
C7H17BrO3Si
C7H17ClOSi
C7H17ClOSi
C7H17ClOSi2
C7H17ClO3Si
C7H17ClO3Si
C7H17NOSi
C7H17NOSi
C7H17NSi
C7H17NSi
C7H18Cl2Si2
C7H18N2O2Si
C7H18N2O2Si
C7H18N2O4Si
C7H18N2Si
C7H18N2Si2
C7H18OSi
C7H18OSi
C7H18OSi2
C7H18OSi2
C7H18O2Si
C7H18O2Si
C7H18O3Si
C7H18O3Si
C7H18O3Si
C7H18O3Si
C7H18O3Si2
C7H18O4Si
C7H18O4Si
C7H19ClN2O3SSi
C7H19ClSi2
C7H19NOSi
C7H19NOSi(3-CYANOBUTYL)DIMETHYLCHLOROSILANECYCLOHEXYLMETHYLDICHLOROSILANE
1-(TRIMETHYLSILOXY)-1,3-BUTADIENE
2-(TRIMETHYLSILOXY)-1,3-BUTADIENE
3-(TRIMETHYLSILOXY)-1-BUTYNE
1-TRIMETHYLSILYLBUT-1-YNE-3-OL
ACRYLOXYMETHYLTRIMETHYLSILANEMETHACRYLOXYTRIMETHYLSILANE
TRIMETHYLSILYL CROTONATEACRYLOXYMETHYLTRIMETHOXYSILANE
3-(TRIMETHYLSILYL)-1,2-BUTADIENE, 95%
1-VINYL-1-METHYLSILACYCLOPENTANE
2-(CHLOROMETHYL)ALLYLTRIMETHOXYSILANE
2-CHLOROMETHYL-3-TRIMETHYLSILYL1-PROPENE
n-HEPTYLTRICHLOROSILANE
TRIS(TRICHLOROSILYLETHYL)METHYLSILANE, tech-95
t-BUTYLDIMETHYLSILYLTRIFLUOROMETHANESULFONATE
TRIETHYLSILYLTRIFLUOROMETHANESULFONATETRIFLUOROMETHYLTRIETHYLSILANEMETHACRYLAMIDOTRIMETHYLSILANE, tech-95
3-CYANOPROPYLMETHYLDIMETHOXYSILANE
3-CYANOPROPYLTRIMETHOXYSILANE
3-ISOCYANATOPROPYLMETHYLDIMETHOXYSILANE, tech-95
METHYLSILATRANE
3-ISOCYANOTOPROPYLTRIMETHOXYSILANE, 95%
t-BUTYLDIMETHYLSILYLNITRILE
t-BUTYL(DICHLOROMETHYL)DIMETHYLSILANEHEXYLMETHYLDICHLOROSILANE(2-METHYLALLYLOXY)TRIMETHYLSILANE, 95%
2-METHYL-1-(TRIMETHYLSILOXY)-1-PROPENE
2-(CARBOXYMETHYLTHIO)ETHYLTRIMETHYLSILANE, 95%
ETHYL (2-TRIMETHYLSILYL)ACETATEVINYLMETHYLDIETHOXYSILANEACETOXYETHYLTRIMETHOXYSILANE, 95%
2-(CARBOMETHOXY)ETHYLTRIMETHOXYSILANE
2-TRIMETHYLSILYL-1,3-DITHIANE
3-BUTENYLTRIMETHYLSILANECYCLOPENTAMETHYLENEDIMETHYLSILANE(2-METHYL-2-PROPENYL)TRIMETHYLSILANEVINYLDIETHYLMETHYLSILANE
4-BROMOBUTOXYTRIMETHYLSILANE
4-BROMOBUTYLTRIMETHOXYSILANE
3-CHLOROISOBUTYLDIMETHYLMETHOXYSILANE
3-CHLOROPROPYLDIMETHYLETHOXYSILANE
1-VINYL-3-(CHLOROMETHYL)-1,1,3,3-TETRAMETHYLDISILOXANE
3-CHLOROISOBUTYLTRIMETHOXYSILANE
CHLOROMETHYLTRIETHOXYSILANE(ETHYLMETHYLKETOXIMINO)TRIMETHYLSILANE, 95%
N-(TRIMETHYLSILYL)MORPHOLINE
N-METHYL-AZA-2,2,4-TRIMETHYLSILACYCLOPENTANE
1-TRIMETHYLSILYLPYRROLIDINE, 95%
1,3-BIS(CHLORODIMETHYLSILYL)PROPANE
2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE
2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE, 10% in cyclohexane
UREIDOPROPYLTRIMETHOXYSILANE
BIS(DIMETHYLAMINO)VINYLMETHYLSILANE
BIS(TRIMETHYLSILYL)CARBODIIMIDEt-BUTOXYTRIMETHYLSILANE
n-BUTYLDIMETHYLMETHOXYSILANE
1-ALLYL-1,1,3,3-TETRAMETHYLDISILOXANEVINYLPENTAMETHYLDISILOXANEISOBUTYLMETHYLDIMETHOXYSILANE(1-METHOXY-2-PROPOXY)TRIMETHYLSILANE
n-BUTYLTRIMETHOXYSILANE
t-BUTYLTRIMETHOXYSILANEISOBUTYLTRIMETHOXYSILANE
METHYLTRIETHOXYSILANE
1,1,1,3,3-PENTAMETHYL-3-ACETOXYDISILOXANEHYDROXYMETHYLTRIETHOXYSILANE, 50% in ethanol
3-METHOXYPROPYLTRIMETHOXYSILANES-(TRIMETHOXYSILYLPROPYL)ISOTHIOURONIUM CHLORIDE, 50% in water
BIS(TRIMETHYLSILYL)METHYL CHLORIDE
1-AMINO-2-(DIMETHYLETHOXYSILYL)PROPANE, 85%
3-AMINOPROPYLDIMETHYLETHOXYSILANE

Molecular formula Catalog #PR

SIC2436.0
SIC2468.0
SIT8571.0
SIT8571.2
SIT8571.25
SIT8583.0
SIA0186.0
SIM6491.0
SIT8584.5
SIA0182.0
SIT8582.5
SIV9087.0
SIC2282.0
SIC2320.0
SIH5846.0
SIT8716.0
SIB1967.0
SIT8335.0
SIT8356.0
SIM6480.6
SIC2453.5
SIC2456.0
SII6454.5
SIM6518.0
SII6456.0
SIB1965.0
SIB1932.8
SIH6165.6
SIM6497.0
SIM6571.0
SIC2264.0
SIE4901.6
SIV9085.0
SIA0030.0
SIC2072.0
SIT8589.0
SIB1930.0
SIC2525.0
SIM6513.0
SIV9068.0
SIB1879.1
SIB1879.7
SIC2278.0
SIC2337.0
SIV9066.0
SIC2280.4
SIC2298.4
SIE4897.0
SIT8596.0
SIM6501.4
SIT8609.0
SIB1048.2
SID3543.0
SID3543.1
SIU9058.0
SIB1080.0
SIB1856.0
SIB1932.0
SIB1937.3
SIA0490.0
SIV9090.0
SII6452.8
SIM6492.8
SIB1988.0
SIB1989.0
SII6453.7
SIM6555.0
SIP6717.0
SIH6175.0
SIM6493.0
SIT8405.0
SIB1864.0
SIA0587.1
SIA0603.0

420

C7H19NO2Si
C7H19NO3Si
C7H19NSi
C7H19NSi
C7H20GeSi
C7H20N2OSi2
C7H20O4Si2
C7H20Si2
C7H21NSi2
C7H21NSi2
C7H21N3Si
C7H22O2Si3
C7H22O2Si3
C7H22O4Si4
C7H24O3Si4
C8F12O8Si
C8H4Cl3F13Si
C8H6ClF5Si
C8H7F13Si
C8H8Cl2Si
C8H8Cl4O2SSi
C8H8Cl4O2SSi
C8H9Cl3Si
C8H10ClF9Si
C8H10Cl2Si
C8H10Cl2Si
C8H10F6O2Si
C8H11ClOSi
C8H11ClSi
C8H11KOSi
C8H11NaOSi
C8H12Cl2N2Si
C8H12Cl2Si
C8H12N4Si
C8H12OSi
C8H12O6SSi
C8H12O6Si
C8H12O8Si
C8H12Si
C8H12Si
C8H13Cl3Si
C8H13Cl3Si
C8H13NSi
C8H14Cl2O2Si
C8H14F6O6S2Si
C8H14OSiC8H14OSi2
C8H14O2Si
C8H14O6Si
C8H14Si
C8H15Cl3Si
C8H15Cl3Si
C8H15NO3Si
C8H16Cl6Si2
C8H16Cl12Si5
C8H16OSiC8H16O2Si
C8H16O2Si
C8H16O2Si
C8H16O2Si
C8H16O3Si
C8H16O3Si
C8H16O4Si
C8H16O5Si
C8H16Si
C8H16Si
C8H16Si
C8H17ClSi
C8H17ClSi
C8H17Cl3Si
C8H17Cl3Si
C8H17NO2Si
C8H17NO2Si
C8H17NO5Si

Name

SIM6498.0 N-METHYLAMINOPROPYLMETHYLDIMETHOXYSILANE
SIM6500.0 N-METHYLAMINOPROPYLTRIMETHOXYSILANE
SID3398.0 (DIETHYLAMINO)TRIMETHYLSILANE
SIP6910.3 n-PROPYLDIMETHYL(DIMETHYLAMINO)SILANE
GET8595.5 TRIMETHYLSILYLMETHYLTRIMETHYLGERMANE
SIB1878.0 N,N’-BIS(TRIMETHYLSILYL)UREA
SIB1635.0 BIS(METHYLDIMETHOXYSILYL)METHANE
SIB1863.0 BIS(TRIMETHYLSILYL)METHANE
SID3546.9 N,N-DIMETHYLAMINOPENTAMETHYLDISILANE
SIH5843.0 HEPTAMETHYLDISILAZANE
SIT8712.0 TRIS(DIMETHYLAMINO)METHYLSILANE
SIB1844.0 BIS(TRIMETHYLSILOXY)METHYLSILANE
SIH5844.0 1,1,1,3,3,5,5-HEPTAMETHYLTRISILOXANE, 90%
SIH5842.5 HEPTAMETHYLCYCLOTETRASILOXANE, tech-95
SIM6582.0 METHYLTRIS(DIMETHYLSILOXY)SILANE
SIT7295.0 TETRAKIS(TRIFLUOROACETOXY)SILANE, tech-95
SIT8174.0 (TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRICHLOROSILANE
SIP6716.1 PENTAFLUOROPHENYLDIMETHYLCHLOROSILANE
SIT8173.0 (TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)SILANE
SIV9092.0 VINYLPHENYLDICHLOROSILANE
SIC2415.0 2-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in methylene chloride
SIC2415.4 2-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in toluene
SIP6722.0 PHENETHYLTRICHLOROSILANE
SIN6597.3 NONAFLUOROHEXYLDIMETHYLCHLOROSILANE
SIP6730.0 PHENYLETHYLDICHLOROSILANE
SIT8035.0 p-TOLYLMETHYLDICHLOROSILANE
SIT8571.5 2-TRIMETHYLSILOXY-1,1,1,5,5,5-HEXAFLUOROPENT-2-ENE-4-ONE
SIC2335.0 (3-CHLOROPROPOXY)ISOPROPYLDIMETHYLSILANE
SIP6728.0 PHENYLDIMETHYLCHLOROSILANE
SIP689805 POTASSIUM PHENYLDIMETHYLSILANOLATE, 95%
SIS6986.1 SODIUM PHENYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
SIB1057.0 BIS(CYANOPROPYL)DICHLOROSILANE
SIB0990.0 (5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDICHLOROSILANE, 95%
SIB1185.0 BIS(1-IMIDAZOLYL)DIMETHYLSILANE, tech-95
SIP6729.2 PHENYLDIMETHYLSILANOL
SIT8378.1 TRIHYDROXYSILYLETHYL PHENYLSULPHONIC ACID, 25% in water
SIV9098.0 VINYLTRIACETOXYSILANE
SIT6998.0 TETRAACETOXYSILANE, 95%
SIP6729.0 PHENYLDIMETHYLSILANE
SIT7897.0 TETRAVINYLSILANE
SIC2459.0 [2-(3-CYCLOHEXENYL)ETHYL]TRICHLOROSILANE
SIC2485.0 (4-CYCLOOCTENYL)TRICHLOROSILANE, 95%
SIP6942.0 2-PYRIDYLTRIMETHYLSILANE
SIM6486.7 METHACRYLOXYPROPYLMETHYLDICHLOROSILANE, 95%
SID3534.0 DIISOPROPYLBIS(TRIFLUOROMETHANESULFONYL)SILANE
SIT8730.0 TRIVINYLETHOXYSILANE, 95%
SID3425.0 1,3-DIETHYNYLTETRAMETHYLDISILOXANE
SIE4901.8 ETHYL 3-(TRIMETHYLSILYL)PROPYNOATESIE4899.0 ETHYLTRIACETOXYSILANE
SIC2522.0 CYCLOPENTADIENYLTRIMETHYLSILANE
SIC2490.0 CYCLOOCTYLTRICHLOROSILANE, 95%
SIO6708.0 7-OCTENYLTRICHLOROSILANE, tech-95
SIV9097.0 VINYLSILATRANE
SIB1814.0 1,8-BIS(TRICHLOROSILYL)OCTANE
SIT7292.0 TETRAKIS(2-TRICHLOROSILYLETHYL)SILANE, 95%
SIC2552.0 (CYCLOPENTENYLOXY)TRIMETHYLSILANE
SID3395.0 1,1-DIETHOXY-1-SILACYCLOPENT-3-ENE, tech-95
SIM6485.6 METHACRYLOXYMETHYLTRIMETHYLSILANE
SIM6494.0 1-METHOXY-3-(TRIMETHYLSILOXY)BUTADIENE, 90%
SIT8572.0 2-TRIMETHYLSILOXYPENT-2-ENE-4-ONE
SIA0160.0 (2-ACRYLOXYETHOXY)TRIMETHYLSILANE
SIM6570.0 METHYL-3-(TRIMETHYLSILOXY)CROTONATE
SIM6481.46 (METHACRYLOXYMETHYL)METHYLDIMETHOXYSILANE
SIM6483.0 METHACRYLOXYMETHYLTRIMETHOXYSILANE
SID2745.0 DIALLYLDIMETHYLSILANE, 95%
SIE4901.83 ETHYNYL-t-BUTYLDIMETHYLSILANE
SIE4902.0 ETHYNYLTRIETHYLSILANE
SIC2465.0 CYCLOHEXYLDIMETHYLCHLOROSILANE
SIH6163.0 5-HEXENYLDIMETHYLCHLOROSILANE, 95%
SII6457.0 ISOOCTYLTRICHLOROSILANE
SIO6713.0 n-OCTYLTRICHLOROSILANE
SIA0415.0 N-ALLYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
SIC2437.5 (3-CYANOBUTYL)METHYLDIMETHOXYSILANE
SIH6171.0 HYDROXYETHOXYSILATRANE

OOF

Molecular formula Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Molecular Formula Index
Name

C8H22SSi2
C8H22Si2
C8H23ClO2Si3
C8H23NOSi2
C8H23NSi2
C8H23N3Si
C8H24Cl2O3Si4
C8H24NPSi2
C8H24N2Si2
C8H24N4Si
C8H24O2Si3
C8H24O3Si3
C8H24O3Si4
C8H24O4Si4
C8H24O4Si4
C8H26N2O4Si
C8H26O3Si4
C8H26O3Si4
C8H26O4Si4
C8H28N4Si4
C8H28N4Si4
C8H28O4Si5
C9H6Cl3F5Si
C9H7Cl2F13Si
C9H9F5O3Si
C9H9F5Si
C9H10Cl2Si
C9H10Cl4Si
C9H11ClSi
C9H11Cl3OSi
C9H11Cl3Si
C9H12Br2Si
C9H12Cl2Si
C9H12Si
C9H13BrO3Si
C9H13BrO3Si
C9H13ClSi
C9H13ClSi
C9H13ClSi
C9H13ClSi
C9H13Cl3Si
C9H13FSi
C9H13F9O3Si
C9H13NaOSi
C9H13N3Si
C9H14OSi
C9H14O2Si
C9H14O3SSi
C9H14O3Si
C9H14O3Si
C9H14SSi
C9H14SeSi
C9H14Si
C9H14Si
C9H15F7O4Si
C9H15NO3Si
C9H15NO3Si
C9H15NSi
C9H16Cl2Si
C9H17ClO2Si
C9H17ClSi
C9H18F3NOSi
C9H18N2Si
C9H18OSi
C9H18OSi
C9H18O2Si2
C9H18O3Si
C9H18O3Si
C9H18O3Si
C9H18O3Si
C9H18O3Si3
C9H18O4Si
C9H18O5Si
C9H18Si

BIS(TRIMETHYLSILYLMETHYL)SULFIDE
1,10-DISILADECANE
3-(CHLOROMETHYL)HEPTAMETHYLTRISILOXANE
3-AMINOPROPYLPENTAMETHYLDISILOXANEBIS(TRIMETHYLSILYLMETHYL)AMINE
TRIS(DIMETHYLAMINO)ETHYLSILANE
1,7-DICHLOROOCTAMETHYLTETRASILOXANE, 95%
BIS(TRIMETHYLSILYL)AMINODIMETHYLPHOSPHINE
1,2-BIS(DIMETHYLAMINO)TETRAMETHYLDISILANETETRAKIS(DIMETHYLAMINO)SILANE
OCTAMETHYLTRISILOXANEBIS(TRIMETHYLSILOXY)METHYLMETHOXYSILANEVINYLTRIS(DIMETHYLSILOXY)SILANE
OCTAMETHYLCYCLOTETRASILOXANE, 98%
1,3,5,7-TETRAETHYLCYCLOTETRASILOXANE, 95%
TETRAMETHYLAMMONIUM SILICATE, 16-20% in water
1,3-BIS(TRIMETHYLSILOXY)-1,3-DIMETHYLDISILOXANE, 95%
1,1,3,3,5,5,7,7-OCTAMETHYLTETRASILOXANE, 80% in octamethylcyclotetrasiloxane
TRIS(DIMETHYLSILOXY)ETHOXYSILANE, tech-95
1,1,3,3,5,5,7,7-OCTAMETHYLCYCLOTETRASILAZANE
1,2,3,4,5,6,7,8-OCTAMETHYLCYCLOTETRASILAZANE, 95%
TETRAKIS(DIMETHYLSILOXY)SILANEPENTAFLUOROPHENYLPROPYLTRICHLOROSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)METHYLDICHLOROSILANEPENTAFLUOROPHENYLTRIMETHOXYSILANEPENTAFLUOROPHENYLTRIMETHYLSILANE
ALLYLPHENYLDICHLOROSILANE, 95%((CHLOROMETHYL)PHENYLETHYL)TRICHLOROSILANEVINYLPHENYLMETHYLCHLOROSILANE
3-PHENOXYPROPYLTRICHLOROSILANE(3-PHENYLPROPYL)TRICHLOROSILANE
3,5-DIBROMO-1-TRIMETHYLSILYLBENZENEPHENETHYLMETHYLDICHLOROSILANEVINYLPHENYLMETHYLSILANE
BROMOPHENYLTRIMETHOXYSILANE
p-BROMOPHENYLTRIMETHOXYSILANEBENZYLDIMETHYLCHLOROSILANE(CHLOROMETHYL)DIMETHYLPHENYLSILANE
p-CHLOROPHENYLTRIMETHYLSILANE
p-TOLYLDIMETHYLCHLOROSILANE[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRICHLOROSILANE, tech-95, endo/exo isomers
4-FLUOROPHENYLTRIMETHYLSILANENONAFLUOROHEXYLTRIMETHOXYSILANESODIUM (4-METHYLPHENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
1-TRIMETHYLSILYLBENZOTRIAZOLEPHENOXYTRIMETHYLSILANEPHENYLMETHYLDIMETHOXYSILANE
TRIMETHYLSILYL BENZENESULFONATEPHENYLTRIMETHOXYSILANEPHENYLTRIMETHOXYSILANE, 99+%
PHENYLTHIOTRIMETHYLSILANEPHENYLSELENOTRIMETHYLSILANE, 95%
BENZYLDIMETHYLSILANEPHENYLTRIMETHYLSILANE
3-(HEPTAFLUOROISOPROPOXY)PROPYLTRIMETHOXYSILANE
m-AMINOPHENYLTRIMETHOXYSILANE, 90%
p-AMINOPHENYLTRIMETHOXYSILANE, 90%
ANILINOTRIMETHYLSILANE[2-(3-CYCLOHEXENYL)ETHYL]METHYLDICHLOROSILANE
3-METHACRYLOXYPROPYLDIMETHYLCHLOROSILANE(5-BICYCLO[2.2.1]HEPTYL)DIMETHYLCHLOROSILANE
N-(t-BUTYLDIMETHYLSILYL)-N-METHYLTRIFLUOROACETAMIDE
1-(t-BUTYLDIMETHYLSILYL)IMIDAZOLE(CYCLOHEXENYLOXY)TRIMETHYLSILANE
PROPARGYLOXY-t-BUTYLDIMETHYLSILANE
TRIMETHYLSILYL (TRIMETHYLSILYL)PROPYNOATE(3-ACRYLOXYPROPYL)DIMETHYLMETHOXYSILANE, 95%
3-CYCLOHEXENYLTRIMETHOXYSILANEMETHACRYLOXYETHOXYTRIMETHYLSILANE(METHACRYLOXYMETHYL)DIMETHYLETHOXYSILANE
1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILOXANE(3-ACRYLOXYPROPYL)METHYLDIMETHOXYSILANE, 95%(3-ACRYLOXYPROPYL)TRIMETHOXYSILANE, 96%
1-TRIMETHYLSILYL-1-HEXYNE

SIB1867.0
SID4593.5
SIC2289.5
SIA0607.0
SIB1863.3
SIT8711.6
SID3367.0
SIB1852.8
SIB1077.0
SIT7276.0
SIO6703.0
SIB1843.0
SIV9269.5
SIO6700.0
SIT7112.0
SIT7516.0
SIB1838.0
SIO6702.0
SIT8715.4
SIO6698.0
SIO6699.0
SIT7278.0
SIP6716.4
SIT8172.0
SIP6716.73
SIP6716.8
SIA0486.0
SIC2295.3
SIV9094.0
SIP6723.3
SIP6744.6
SID2772.0
SIP6721.5
SIV9096.0
SIB1904.0
SIB1904.3
SIB0962.0
SIC2287.0
SIC2334.0
SIT8030.0
SIB0986.0
SIF4930.0
SIN6597.7
SIS6983.0
SIT8581.0
SIP6723.5
SIP6740.0
SIT8580.7
SIP6822.0
SIP6822.1
SIP6770.0
SIP6747.0
SIB0964.0
SIP6823.0
SIH5842.2
SIA0599.0
SIA0599.1
SIA0710.0
SIC2458.0
SIM6486.2
SIB0994.0
SIB1966.0
SIB1964.0
SIC2462.0
SIP6902.4
SIT8623.0
SIA0190.0
SIC2464.1
SIM6481.0
SIM6481.3
SIT8737.0
SIA0198.0
SIA0200.0
SIT8589.7

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMPOUNDS

Enabling Your Technology

Molecular formula Catalog #OOFSID3203.0 DI-n-BUTYLDICHLOROSILANE
SID3205.0 DI-t-BUTYLDICHLOROSILANE
SIH5845.0 n-HEPTYLMETHYLDICHLOROSILANE
SID3207.0 DI-t-BUTYLDIFLUOROSILANE
SIB1876.0 N,O-BIS(TRIMETHYLSILYL)TRIFLUOROACETAMIDESIB1680.0 BIS(MORPHOLINO)SILANE
SIC2452.2 3-CYANOPROPYLDIMETHYL(DIMETHYLAMINO)SILANE
SIP6829.2 PLATINUM CARBONYL CYCLOVINYLMETHYLSILOXANE COMPLEXSID4613.0 1,3-DIVINYLTETRAMETHYLDISILOXANESIB1939.3 t-BUTYLDIMETHYLSILOXYACETALDEHYDE, 90%
SIM6496.0 1-METHOXY-1-(TRIMETHYLSILOXY)-2-METHYL-1-PROPENE
SIT8195.0 TRIETHYLACETOXYSILANE
SIC2557.0 CYCLOPENTYLTRIMETHOXYSILANE
SIV9112.0 VINYLTRIETHOXYSILANE
SIA0092.0 3-ACETOXYPROPYLMETHYLDIMETHOXYSILANE
SID4220.4 DIMETHYLSILA-11-CROWN-4
SIA0100.0 3-ACETOXYPROPYLTRIMETHOXYSILANE
SIV9063.0 VINYL-t-BUTYLDIMETHYLSILANE, 95%
SIV9116.0 VINYLTRIETHYLSILANE
SIB1850.0 BIS(TRIMETHYLSILYL)ACETYLENE
SID4611.6 1,2-DIVINYLTETRAMETHYLDISILANE, 95%
SIB1939.59 2-(t-BUTYLDIMETHYLSILOXY)ETHYLBROMIDESIB1894.2 5-BROMOPENTYLTRIMETHOXYSILANE
SIC2293.0 CHLOROMETHYLMETHYLDIISOPROPOXYSILANE
SIC2352.0 3-CHLOROPROPYLMETHYLDIETHOXYSILANE
SIC2271.0 2-CHLOROETHYLTRIETHOXYSILANE, 95%
SID3120.0 DI-t-BUTYLCHLOROSILANE
SID3526.0 DIISOBUTYLCHLOROSILANE
SID4065.0 (3,3-DIMETHYLBUTYL)DIMETHYLCHLOROSILANE
SIT7906.0 THEXYLDIMETHYLCHLOROSILANE
SIE4891.0 1-ETHYL-2,2-DIMETHOXY-4-METHYL-1-AZA-2-SILACYCLOPENTANE
SIA0006.0 (3-ACETAMIDOPROPYL)TRIMETHOXYSILANE
SIT8407.0 N-TRIMETHOXYSILYLPROPYLMETHYLCARBAMATESIP6828.6 (N-PIPERIDINO)TRIMETHYLSILANE
SID4612.0 1,3-DIVINYL-1,1,3,3-TETRAMETHYLDISILAZANE
SIA0592.0 N-(2-AMINOETHYL)-2,2,4-TRIMETHYL-1-AZA-2-SILACYCLOPENTANE
SID3539.0 DIISOPROPYLETHOXYSILANE
SIT8285.0 TRIETHYLETHOXYSILANE
SIB1939.58 2-(t-BUTYLDIMETHYLSILOXY)ETHANOLSID3404.0 DIETHYLDIETHOXYSILANE
SID3538.0 DIISOPROPYLDIMETHOXYSILANE
SIE4901.2 ETHYLTRIETHOXYSILANE
SIT8622.0 TRIMETHYLSILYL (TRIMETHYLSILOXY)ACETATE
SIT7110.0 TETRAETHOXYSILANE, 98%
SIT7110.2 TETRAETHOXYSILANE, 99.9+%
SIT7283.5 TETRAKIS(2-HYDROXYETHOXY)SILANE, tech 90
SID3342.0 DI-t-BUTYLSILANE
SIO6712.5 n-OCTYLSILANE
SIT7115.0 TETRAETHYLSILANE
SIB1857.9 1,2-BIS(TRIMETHYLSILYL)ETHYLENE, 90%
SIC2362.0 (3-CHLOROPROPYL)PENTAMETHYLDISILOXANESIB1846.0 N,O-BIS(TRIMETHYLSILYL)ACETAMIDE
SIA0605.0 3-AMINOPROPYLMETHYLDIETHOXYSILANE, 95%
SID3546.94 (N,N-DIMETHYL-3-AMINOPROPYL)METHYLDIMETHOXYSILANE
SID3395.6 (N,N-DIETHYLAMINOMETHYL)TRIMETHOXYSILANE
SID3547.0 (N,N-DIMETHYL-3-AMINOPROPYL)TRIMETHOXYSILANE
SIB1937.0 n-BUTYLDIMETHYL(DIMETHYLAMINO)SILANE
SID3603.0 (N,N-DIMETHYLAMINO)TRIETHYLSILANE
SIB1865.0 BIS(TRIMETHYLSILYLMETHYL)DICHLOROSILANE
SIA0589.0 N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIMETHOXYSILANE, tech-95
SIA0591.0 N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-95
SIA0591.1 N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 98%
SIB1069.0 BIS(DIETHYLAMINO)SILANE
SIB1070.0 BIS(DIMETHYLAMINO)DIETHYLSILANE
SID2795.0 DI(t-BUTYLAMINO)SILANE
SIB1977.0 n-BUTYL-1,1,3,3-TETRAMETHYLDISILOXANESID3220.0 1,3-DI-t-BUTYLDISILOXANESID3418.0 1,3-DIETHYLTETRAMETHYLDISILOXANE
SIT8280.0 1,1,1-TRIETHYL-3,3-DIMETHYLDISILOXANESIB1840.0 1,2-BIS(TRIMETHYLSILOXY)ETHANE
SID3395.2 1,2-DIETHOXYTETRAMETHYLDISILANE
SIT7534.0 1,1,3,3-TETRAMETHYL-1,3-DIETHOXYDISILOXANESIB1632.0 1,2-BIS(METHYLDIMETHOXYSILYL)ETHANE
SIB1830.0 1,2-BIS(TRIMETHOXYSILYL)ETHANE

PR

C8H18Cl2Si
C8H18Cl2Si
C8H18Cl2Si
C8H18F2Si
C8H18F3NOSi2
C8H18N2O2Si
C8H18N2Si
C8H18OPtSi2∙CO
C8H18OSi2
C8H18O2Si
C8H18O2Si
C8H18O2Si
C8H18O3Si
C8H18O3Si
C8H18O4Si
C8H18O4Si
C8H18O5Si
C8H18Si
C8H18Si
C8H18Si2
C8H18Si2
C8H19BrOSi
C8H19BrO3Si
C8H19ClO2Si
C8H19ClO2Si
C8H19ClO3Si
C8H19ClSi
C8H19ClSi
C8H19ClSi
C8H19ClSi
C8H19NO2Si
C8H19NO4Si
C8H19NO5Si
C8H19NSI
C8H19NSi2
C8H20N2Si
C8H20OSi
C8H20OSi
C8H20O2Si
C8H20O2Si
C8H20O2Si
C8H20O3Si
C8H20O3Si2
C8H20O4Si
C8H20O4Si
C8H20O8Si
C8H20Si
C8H20Si
C8H20Si
C8H20Si2
C8H21ClOSi2
C8H21NOSi2
C8H21NO2Si
C8H21NO2Si
C8H21NO3Si
C8H21NO3Si
C8H21NSi
C8H21NSi
C8H22Cl2Si3
C8H22N2O2Si
C8H22N2O3Si
C8H22N2O3Si
C8H22N2Si
C8H22N2Si
C8H22N2Si
C8H22OSi2
C8H22OSi2
C8H22OSi2
C8H22OSi2
C8H22O2Si2
C8H22O2Si2
C8H22O3Si2
C8H22O4Si2
C8H22O6Si2

Name

SILICON

Molecular formula Catalog #421

Molecular formula Catalog #Molecular Formula Index

Molecular formula Catalog #422

C10H10F6Si
C10H11Cl2NSi
C10H11Cl3O2Si
C10H11Cl7O2SSi2
C10H12Cl6Si2
C10H12Si
C10H13ClOSi
C10H13Cl3OSi
C10H13Cl3Si
C10H13Cl3Si
C10H13Cl3Si
C10H13CuF6O2Si
C10H13F3O3SSi
C10H13F3O3Si
C10H14Cl2OSi
C10H14Cl2Si
C10H14Cl2Si
C10H14Cl2Si
C10H14Cl2Si
C10H14OSi
C10H14O2Si
C10H14O2Si
C10H14O2Si
C10H14Si
C10H15BrSi
C10H15ClO3Si
C10H15ClSi
C10H15NSi
C10H15N3O3Si
C10H16Cl2Si

Name

SIB1828.2
SIC2453.7
SIA0070.0
SIB1811.7
SIB1811.0
SIP6732.0
SIM6492.3
SIM6492.5
SIC2295.1
SIP6724.9
SIP6813.0
AKC252.8
SIT8598.5
SIT8343.0
SIP6723.25
SIB1974.0
SIM6511.0
SIM6512.5
SIP6744.0
SIV9095.0
SIP6726.0
SIT8570.7
SIT8570.8
SIV9093.0
SIB1878.6
SIC2296.2
SIP6721.0
SIP6923.0
SIA0774.0
SIB0984.0

3,5-BIS(TRIFLUOROMETHYL)PHENYLDIMETHYLSILANE, 95%
3-CYANOPROPYLPHENYLDICHLOROSILANE
4-ACETOXYPHENETHYLTRICHLOROSILANE
BIS(TRICHLOROSILYLETHYL)PHENYLSULFONYLCHLORIDE,mixed isomers,40% in toluene
BIS(TRICHLOROSILYLETHYL)BENZENE, tech-95
PHENYLETHYNYLDIMETHYLSILANE
1-(4-METHOXYPHENYL)-1-CHLOROSILACYCLOBUTANE
3-(p-METHOXYPHENYL)PROPYLTRICHLOROSILANE((CHLOROMETHYL)PHENYLETHYL)METHYLDICHLOROSILANE
4-PHENYLBUTYLTRICHLOROSILANE
1-PHENYL-1-TRICHLOROSILYLBUTANE
COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX
2-(TRIMETHYLSILYL)PHENYLTRIFLUOROMETHANESULFONATE
m-(TRIFLUOROMETHYL)PHENYLTRIMETHOXYSILANE
3-PHENOXYPROPYLMETHYLDICHLOROSILANE
t-BUTYLPHENYLDICHLOROSILANEp-(METHYLPHENETHYL)METHYLDICHLOROSILANE, 95%(2-METHYL-2-PHENYLETHYL)METHYLDICHLOROSILANE(3-PHENYLPROPYL)METHYLDICHLOROSILANEVINYLPHENYLMETHYLMETHOXYSILANEPHENYLDIMETHYLACETOXYSILANE
2-TRIMETHYLSILOXYBENZALDEHYDE
4-TRIMETHYLSILOXYBENZALDEHYDE
VINYLPHENYLDIMETHYLSILANE(4-BROMBENZYL)TRIMETHYLSILANE(p-CHLOROMETHYL)PHENYLTRIMETHOXYSILANE, 95%
PHENETHYLDIMETHYLCHLOROSILANE(2-PYRIDYL)ALLYLDIMETHYLSILANE, 90%
p-AZIDOMETHYLPHENYLTRIMETHOXYSILANE, 90%[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]METHYLDICHLOROSILANE, tech-95, endo/exo
isomers
SIN6597.4 NONAFLUOROHEXYLDIMETHYL(DIMETHYLAMINO)SILANE
SIB0968.0 BENZYLOXYTRIMETHYLSILANE
SIP6728.4 PHENYLDIMETHYLETHOXYSILANE
SIP6725.2 PHENYLDIETHOXYSILANE, 95%
SIP8035.6 p-TOLYLMETHYLDIMETHOXYSILANE
SIT8605.0 3-TRIMETHYLSILYLPROPARGYLMETHACRYLATE, 95%
SIT8042.0 p-TOLYLTRIMETHOXYSILANE
SIM6492.55 p-METHOXYPHENYLTRIMETHOXYSILANE
SIP6775.0 (PHENYLTHIOMETHYL)TRIMETHYLSILANE
SIP6745.0 (PHENYLSELENOMETHYL)TRIMETHYLSILANE, 95%
SIB0973.0 BENZYLTRIMETHYLSILANE
SIT8043.0 p-TOLYLTRIMETHYLSILANE
SIB1879.5 5-BROMO-2-(t-BUTYLDIMETHYLSILYL)PYRIMIDINE
SIP6724.6 PHENYLBIS(DIMETHYLAMINO)CHLOROSILANE, 95%
SIP6723.67 (PHENYLAMINOMETHYL)METHYLDIMETHOXYSILANE, 95%
SIP6930.0 2-(2-PYRIDYLETHYL)TRIMETHOXYSILANE
SID3390.0 DICYCLOPENTYLDICHLOROSILANE
SID3345.0 DI-t-BUTYLSILYLBIS(TRIFLUOROMETHANESULFONATE)
SIT7896.0 1,1,3,3-TETRAVINYLDIMETHYLDISILOXANE, 95%
SIB1135.0 1,4-BIS(HYDROXYDIMETHYLSILYL)BENZENE, tech-95
SIT8411.0 2-(3-TRIMETHOXYSILYLPROPYLTHIO)THIOPHENE
SIB1852.0 BIS(TRIMETHYLSILYL)ACETYLENEDICARBOXYLATE
SIT7906.9 2-THIENYL-t-BUTYLDIMETHYLSILANE
SIT8060.0 TRIALLYLMETHYLSILANE
SIB1084.0 1,2-BIS(DIMETHYLSILYL)BENZENE
SIB1086.0 1,4-BIS(DIMETHYLSILYL)BENZENE
SIB1854.0 BIS(TRIMETHYLSILYL)BUTADIYNE
SIC2457.0 [2-(3-CYCLOHEXENYL)ETHYL]DIMETHYLCHLORO-SILANE
SIB1858.6 BIS(TRIMETHYLSILYL)-5-FLUOROURACIL
SIT8410.0 N-(3-TRIMETHOXYSILYLPROPYL)PYRROLE
SIC2450.0 3-CYANOPROPYLDIISOPROPYLCHLOROSILANE
SIV9088.0 VINYLOCTYLDICHLOROSILANE
SIB1808.0 1,2-BIS(TRICHLOROSILYL)DECANE
SIB1809.0 1,10-BIS(TRICHLOROSILYL)DECANE, tech-95
SIB1828.5 1,3-BIS(TRIFLUOROPROPYL)TETRAMETHYLDISILOXANESIB1939.35 1-(t-BUTYLDIMETHYLSILOXY)-1,3-BUTADIENE, 95%
SIB1939.5 4-(t-BUTYLDIMETHYLSILOXY)BUTYNE
SIM6486.5 METHACRYLOXYPROPYLDIMETHYLMETHOXYSILANE, 95%
SIM6481.43 (METHACRYLOXYMETHYL)METHYLDIETHOXYSILANE
SIM6486.9 METHACRYLOXYPROPYLMETHYLDIMETHOXYSILANE, 95%
SIM6487.4 METHACRYLOXYPROPYLTRIMETHOXYSILANE
SIM6487.4LI METHACRYLOXYPROPYLTRIMETHOXYSILANE, low inhibitor grade
SIH5848.0 1-HEPTYNYLTRIMETHYLSILANE

OOF

SIC2445.0 2-CYANOETHYLTRIETHOXYSILANE
SII6454.45 3-ISOCYANATOPROPYLMETHYLDIETHOXYSILANE, 95%
SIA0146.0 3-ACRYLAMIDOPROPYLTRIMETHOXYSILANE, tech-95
SIO6712.0 n-OCTYLMETHYLDICHLOROSILANE
SIA0476.0 ALLYLOXY-t-BUTYLDIMETHYLSILANE
SIC2469.0 CYCLOHEXYLMETHYLDIMETHOXYSILANE
SIG5805.0 (S)-GLYCIDOXY-t-BUTYLDIMETHYLSILANE
SIA0525.0 ALLYLTRIETHOXYSILANE
SIC2482.0 CYCLOHEXYLTRIMETHOXYSILANE
SIM6486.14 METHACRYLOXYPENTAMETHYLDISILOXANE
SIG5836.0 (3-GLYCIDOXYPROPYL)METHYLDIMETHOXYSILANE
SIB1862.0 BIS(TRIMETHYLSILYL) MALONATE
SIA0050.0 ACETOXYMETHYLTRIETHOXYSILANE
SIG5840.0 (3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE
SIG5840.1 (3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE, 99+%
SIB1904.5 3-BROMOPROPOXY-t-BUTYLDIMETHYLSILANE
SIB1939.52 1-(t-BUTYLDIMETHYLSILOXY)-3-CHLOROPROPANE
SIC2407.0 3-CHLOROPROPYLTRIETHOXYSILANE
SID3255.0 DI-t-BUTYLMETHYLCHLOROSILANE
SIT8384.0 TRIISOPROPYLCHLOROSILANE
SIT8707.0 TRI-n-PROPYLCHLOROSILANE
SIB1940.6 3-(t-BUTYLDIMETHYLSILOXY)-1-PROPYLLITHIUM, 1M in cyclohexane - 20-23 wgt%
SIB1932.4 N-n-BUTYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
SIA0400.0 3-(N-ALLYLAMINO)PROPYLTRIMETHOXYSILANE, 95%
SIA0777.0 3-AZIDOPROPYLTRIETHOXYSILANE
SIT8736.0 1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILAZANE, 95%
SID3420.0 DIETHYL(TRIMETHYLSILOXYCARBONYLMETHYL)PHOSPHONATE, 95%
SIB1939.7 3-(t-BUTYLDIMETHYLSILOXY)PROPAN-1-OL
SIB1971.0 t-BUTYLISOPROPYLDIMETHOXYSILANE
SII6452.6 ISOBUTYLISOPROPYLDIMETHOXYSILANE
SIM6475.0 3-MERCAPTOPROPYLTRIETHOXYSILANE, 95%
SIH6168.5 HEXYLTRIMETHOXYSILANE
SIP6917.0 n-PROPYLTRIETHOXYSILANE
SIT8379.0 TRIISOPROPOXYSILANE, 95%
SIB1861.0 O,O-BIS(TRIMETHYLSILYL) LACTATE
SID3258.0 DI-t-BUTYLMETHYLSILANE
SIT8385.0 TRIISOPROPYLSILANE
SIT8709.0 TRI-n-PROPYLSILANE
SIA0587.05 4-AMINO-3,3-DIMETHYLBUTYLMETHYLDIMETHOXYSILANE
SIA0587.07 4-AMINO-3,3-DIMETHYLBUTYLTRIMETHOXYSILANE
SIA0610.0 3-AMINOPROPYLTRIETHOXYSILANE
SIA0610.1 3-AMINOPROPYLTRIETHOXYSILANE 99+%
SIE4886.0 (3-(N-ETHYLAMINO)ISOBUTYL)TRIMETHOXYSILANE
SIH6172.0 N-(HYDROXYETHYL)-N-METHYLAMINOPROPYLTRIMETHOXYSILANE, 75% in methanol
SID3533.0 (DIISOPROPYLAMINO)TRIMETHYLSILANE
SIB1852.7 N,N-BIS(TRIMETHYLSILYL)ALLYLAMINE
SIT8415.0 N-TRIMETHOXYSILYLPROPYL-N,N,N-TRIMETHYLAMMONIUM CHLORIDE,50% in methanol
SIT8715.55 TRIS(ETHYLMETHYLAMINO)CHLOROSILANE
SIA0587.2 N-(2-AMINOETHYL)-3-AMINOISOBUTYLDIMETHYLMETHOXYSILANE, 95%
SIA0587.5 N-(2-AMINOETHYL)-3-AMINOISOBUTYLMETHYLDIMETHOXYSILANE, 95%
SIT8339.0 1,1,1-TRIETHYL-3,3,3-TRIMETHYLDISILOXANESIB1094.0 BIS(ETHOXYDIMETHYLSILYL)METHANE
SIV9082.0 VINYLMETHYLBIS(TRIMETHYLSILOXY)SILANE
SIT8572.7 TRIMETHYLSILOXYTRIETHOXYSILANE
SIA0038.0 ACETOXYHEPTAMETHYLCYCLOTETRASILOXANE
SIT8372.4 TRIFLUOROPROPYLTRIS(DIMETHYLSILOXY)SILANE
SIE4895.0 3-ETHYLHEPTAMETHYLTRISILOXANE
SIT8718.0 TRIS(TRIMETHYLSILOXY)BORON
SIT8719.0 TRIS(TRIMETHYLSILOXY)CHLOROSILANE
SIC2420.0 CHLOROTRIS(TRIMETHYLSILYL)SILANE, 95%
SIT8715.0 TRIS(DIMETHYLAMINO)SULFUR(TRIMETHYLSILYL)DIFLUORIDE, tech-95
SIN6595.0 NONAMETHYLTRISILAZANE
SIT8723.6 TRIS(TRIMETHYLSILYL)PHOSPHITE, 95%
SIT8717.7 TRIS(TRIMETHYLSILOXY)ANTIMONY
SIT8723.0 TRIS(TRIMETHYLSILYL)PHOSPHATE
SIT8723.4 TRIS(TRIMETHYLSILYL)PHOSPHINE, 10% in hexane
GET8721.5 TRIS(TRIMETHYLSILYL)GERMANE
SIT8721.0 TRIS(TRIMETHYLSILOXY)SILANE
SIT8724.0 TRIS(TRIMETHYLSILYL)SILANE
SIH5841.0 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE
SID4623.4 DODECAFLUORODEC-9-ENE-1-YLTRICHLOROSILANE
SIB1809.5 1,6-BIS(TRICHLOROSILYLETHYL)DODECAFLUOROHEXANE
SIP6716.3 PENTAFLUOROPHENYLPROPYLMETHYLDICHLOROSILANE
SIT8170.0 (TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLCHLOROSILANE

PR

C9H19NO3Si
C9H19NO3Si
C9H19NO4Si
C9H20Cl2Si
C9H20OSi
C9H20O2Si
C9H20O2Si
C9H20O3Si
C9H20O3Si
C9H20O3Si2
C9H20O4Si
C9H20O4Si2
C9H20O5Si
C9H20O5Si
C9H20O5Si
C9H21BrOSi
C9H21ClOSi
C9H21ClO3Si
C9H21ClSi
C9H21ClSi
C9H21ClSi
C9H21LiOSi
C9H21NO2Si
C9H21NO3Si
C9H21N3O3Si
C9H21N3Si3
C9H21O5PSi
C9H22O2Si
C9H22O2Si
C9H22O2Si
C9H22O3SSi
C9H22O3Si
C9H22O3Si
C9H22O3Si
C9H22O3Si2
C9H22Si
C9H22Si
C9H22Si
C9H23NO2Si
C9H23NO3Si
C9H23NO3Si
C9H23NO3Si
C9H23NO3Si
C9H23NO4Si
C9H23NSi
C9H23NSi2
C9H24ClNO3Si
C9H24ClN3Si
C9H24N2OSi
C9H24N2O2Si
C9H24OSi2
C9H24O2Si2
C9H24O2Si3
C9H24O4Si2
C9H24O6Si4
C9H25F3O3Si4
C9H26O2Si3
C9H27BO3Si3
C9H27ClO3Si4
C9H27ClSi4
C9H27F2N3SSi
C9H27NSi3
C9H27O3PSi
C9H27O3SbSi3
C9H27O4PSi3
C9H27PSi3
C9H28GeSi3
C9H28O3Si4
C9H28Si4
C10H4Cl3F17Si
C10H7Cl3F12Si
C10H8Cl6F12Si2
C10H9Cl2F5Si
C10H10ClF13Si

Name

www.AZmax.co.jp

TEL: 03-5543-1630

C10H16F9NSi
C10H16OSi
C10H16OSi
C10H16O2Si
C10H16O2Si
C10H16O2Si
C10H16O3Si
C10H16O4Si
C10H16SSi
C10H16SeSi
C10H16Si
C10H16Si
C10H17BrN2Si
C10H17ClN2Si
C10H17NO2Si
C10H17NO3Si
C10H18Cl2Si
C10H18F6O6S2Si
C10H18OSi2
C10H18O2Si2
C10H18O3S2Si
C10H18O4Si2
C10H18SSi
C10H18Si
C10H18Si2
C10H18Si2
C10H18Si2
C10H19ClSi
C10H19FN2O2Si2
C10H19NO3Si
C10H20ClNSi
C10H20Cl2Si
C10H20Cl6Si2
C10H20Cl6Si2
C10H20F6OSi2
C10H20OSi
C10H20OSi
C10H20O3Si
C10H20O4Si
C10H20O4Si
C10H20O5Si
C10H20O5Si
C10H20Si

Gelest, Inc.

(215) 547-1015

www.gelest.com

Molecular Formula Index

Enabling Your Technology

Name

Molecular formula Catalog #Name

C10H21BrO5Si
C10H21ClSi
C10H21Cl3O4Si
C10H21Cl3Si
C10H21F3O3SSi
C10H21F6NSi2
C10H21NO3SSi
C10H21NO3Si
C10H21NO4Si
C10H21N3OSi2
C10H22N2O5Si
C10H22OSi2
C10H22O2Si2
C10H22O3Si
C10H22O3Si
C10H22O4Si
C10H22O5Si
C10H22O5Si
C10H22Si
C10H22Si2
C10H23BrO3Si
C10H23ClO2Si
C10H23ClO3Si
C10H23ClSi
C10H23ClSi
C10H23IOSi
C10H23IO2Si
C10H24Cl2OSi2
C10H24Cl2O2Si2
C10H24Cl2Si2
C10H24N2O2Si
C10H24N2O4Si
C10H24N3O4Si
C10H24O2Si
C10H24O2Si
C10H24O2Si
C10H24O2Si3
C10H24O3Si
C10H24O3Si
C10H24O3Si
C10H24O3Si2
C10H24O4Si
C10H24O6Si
C10H24O6Si2
C10H24S2Si2
C10H24Si
C10H25F3O2Si3
C10H25NO3Si
C10H25NO3Si
C10H25NO3Si
C10H25NO3Si
C10H25N3O2Si
C10H26N2O2Si
C10H26N2Si
C10H26N2Si
C10H26N2Si2
C10H26O3Si2
C10H26O5Si2
C10H27NO3Si2
C10H27NSi2
C10H27N3O3Si
C10H28Cl2O3Si4
C10H28N2OSi2
C10H28N2Si2
C10H28O2Si3
C10H28O4Si3
C10H28Si3
C10H29ClO3Si4
C10H29NO2Si3
C10H30N4OSi2
C10H30O2Si4
C10H30O3Si4
C10H30O3Si4
C10H30O5Si5(3-TRIMETHOXYSILYL)PROPYL 2-BROMO-2-METHYLPROPIONATE
7-OCTENYLDIMETHYLCHLOROSILANE, tech-95
METHOXYTRIETHYLENEOXYPROPYLTRICHLOROSILANE
n-DECYLTRICHLOROSILANETRIISOPROPYLSILYLTRIFLUOROMETHANESULFONATE
1,3-BIS(TRIFLUOROPROPYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
3-THIOCYANATOPROPYLTRIETHOXYSILANE, 96%
3-CYANOPROPYLTRIETHOXYSILANE
3-ISOCYANATOPROPYLTRIETHOXYSILANE, 95%
BIS(TRIMETHYLSILYL)CYTOSINEN-(ACETYLGLYCYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 5% in methanol
1,3-DIALLYLTETRAMETHYLDISILOXANE, 95%
1,2-BIS(TRIMETHYLSILOXY)CYCLOBUTENE, 95%
3-BUTENYLTRIETHOXYSILANE, 95%(3-GLYCIDOXYPROPYL)DIMETHYLETHOXYSILANE
TRIETHOXSILYLBUTYRALDEHYDE, tech-90
ACETOXYETHYLTRIETHOXYSILANEDIMETHYLSILA-14-CROWN-5
7-OCTENYLDIMETHYLSILANE, tech-95
1,4-DIVINYL-1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE
7-BROMOHEPTYLTRIMETHOXYSILANE
3-CHLOROPROPYLMETHYLDIISOPROPOXYSILANE
CHLOROMETHYLTRIISOPROPOXYSILANE
ISOOCTYLDIMETHYLCHLOROSILANE
n-OCTYLDIMETHYLCHLOROSILANE(4-IODOBUTOXY)-t-BUTYLDIMETHYLSILANE(3-IODOPROPYL)METHYLDIISOPROPOXYSILANE
1,3-BIS(3-CHLOROPROPYL)TETRAMETHYLDISILOXANE
BIS[(3-CHLORODIMETHYLSILYL)PROPYL] ETHER
1,6-BIS(CHLORODIMETHYLSILYL)HEXANE, 95%[3-(1-PIPERAZINYL)PROPYL]METHYLDIMETHOXYSILANEUREIDOPROPYLTRIETHOXYSILANE, 50% in methanol
3-(4-SEMICARBAZIDYL)PROPYLTRIETHOXYSILANE, tech-95
DI-n-BUTYLDIMETHOXYSILANEDIISOBUTYLDIMETHOXYSILANEDIMETHYLDI-n-BUTOXYSILANE
1,5-DIVINYLHEXAMETHYLTRISILOXANE, 95%
n-BUTYLTRIETHOXYSILANEISOBUTYLTRIETHOXYSILANE, 98%
METHYLTRI-n-PROPOXYSILANE(3-GLYCIDOXYPROPYL)-1,1,3,3-TETRAMETHYLDISILOXANE
DI-t-BUTOXYDIMETHOXYSILANE, tech-95
METHYLTRIS(METHOXYETHOXY)SILANE
1,1-BIS(TRIMETHOXYSILYLMETHYL)ETHYLENE, tech-95
2,2-BIS(TRIMETHYLSILYL)-1,3-DITHIANE
n-OCTYLDIMETHYLSILANE
3-(3,3,3-TRIFLUOROPROPYL)HEPTAMETHYLTRISILOXANE
4-AMINOBUTYLTRIETHOXYSILANE, 95%
n-BUTYLAMINOPROPYLTRIMETHOXYSILANE
t-BUTYLAMINOPROPYLTRIMETHOXYSILANE(N,N-DIETHYL-3-AMINOPROPYL)TRIMETHOXYSILANEACETOXYETHYLTRIS(DIMETHYLAMINO)SILANE
N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIETHOXYSILANE
BIS(DIETHYLAMINO)DIMETHYLSILANEDIMETHYLBIS(s-BUTYLAMINO)SILANE, 95%
N-(3-AMINOPROPYLDIMETHYLSILYL)AZA-2,2-DIMETHYL-2-SILACYCLOPENTANE
1,3-BIS(HYDROXYPROPYL)TETRAMETHYLDISILOXANE, 95%
1,1,3,3-TETRAETHOXY-1,3-DIMETHYLDISILOXANE, 95%
N-METHYL-N-TRIMETHYLSILYL-3-AMINOPROPYLTRIMETHOXYSILANE, 95%
1,3-DI-n-PROPYL-1,1,3,3-TETRAMETHYLDISILAZANE(3-TRIMETHOXYSILYLPROPYL)DIETHYLENETRIAMINE, 95%
3,5-BIS(CHLOROMETHYL)OCTAMETHYLTETRASILOXANE, 95%
1,3-BIS(3-AMINOPROPYL)TETRAMETHYLDISILOXANE
1,2-BIS(DIMETHYLAMINODIMETHYLSILYL)ETHANE, 95%
BIS(TRIMETHYLSILYLMETHYL)DIMETHOXYSILANE
1,5-DIETHOXYHEXAMETHYLTRISILOXANE
TRIS(TRIMETHYLSILYL)METHANE
CHLOROMETHYLTRIS(TRIMETHYLSILOXY)SILANE
3-AMINOPROPYLMETHYLBIS(TRIMETHYLSILOXY)SILANE
1,3-BIS(2-AMINOETHYLAMINOMETHYL)TETRAMETHYLDISILOXANE, tech-95
1,2-BIS(TETRAMETHYLDISILOXANYL)ETHANE, 95%
DECAMETHYLTETRASILOXANEMETHYLTRIS(TRIMETHYLSILOXY)SILANE
DECAMETHYLCYCLOPENTASILOXANE

C10H32O4Si5
C11H7Cl2F17Si
C11H9Cl3Si
C11H12ClF5Si
C11H13BrSi
C11H13F13O3Si
C11H14Si
C11H15NOSi
C11H16Cl2OSi
C11H16Cl2Si
C11H16Cl2Si
C11H16Cl2Si
C11H16OSi
C11H16OSi
C11H16O2Si
C11H17ClOSi
C11H17ClO5SSi
C11H17ClO5SSi
C11H17ClSi
C11H17N3O5SSi
C11H18O2Si
C11H18O3Si
C11H18O3Si
C11H18O3Si
C11H19ClSi

SID2653.0
SIH5840.6
SIN6596.0
SIP6716.2
SIB1899.0
SIT8176.0
SIP6736.0
SIT8572.3
SIM6492.4
SIC2295.0
SIP6724.8
SIP6738.5
SIP6824.0
SIV9079.0
SIP6723.6
SIP6723.2
SIC2417.0
SIC2417.4
SIP6743.0
SIA0790.0
SIP6739.0
SIP6722.6
SIP6731.8
SIV9209.0
SIB0982.0

C11H19NO3Si
C11H19NO3Si
C11H19NSi
C11H20N2Si
C11H20OSi
C11H20Si
C11H21Cl3Si
C11H21N5Si2
C11H22BrCl3Si
C11H22Cl4Si
C11H22N2O2Si
C11H22N2O2Si2
C11H22O2Si
C11H22O2Si
C11H22O2Si3
C11H22O3Si
C11H22O3Si
C11H22O4Si
C11H22O4Si2
C11H22O4Si2
C11H22O5Si
C11H23Cl3Si
C11H23NO3Si
C11H24Cl2Si
C11H24O2Si3
C11H24O3Si
C11H24O3Si
C11H24O3Si
C11H24O4Si
C11H24O6Si
C11H24Si
C11H25BrSi
C11H25NOSi2
C11H25NSi
C11H26OSi
C11H26O2Si
C11H26O3Si
C11H26O3Si
C11H26O3Si
C11H26O3Si2
C11H27NOSi
C11H27NO2Si
C11H27NO3Si
C11H27NO3Si3
C11H27NO6SSi
C11H27NSi
C11H27O5PSi
C11H28N2O3Si

SIP6932.0
SIP6934.0
SIB0960.0
SIP6736.8
SIB0981.0
SIE4901.87
SIU9047.0
SIB1852.3
SIB1908.0
SIC2427.0
SIV9080.0
SIB1873.4
SIB1939.57
SIB1940.0
SIP6742.5
SIC2460.0
SIM6486.4
SIE4670.0
SIA0197.0
SIB1860.0
SIM6482.0
SIU9050.0
SIC2439.0
SID2662.0
SIT8735.0
SIC2492.0
SIO6709.0
SIV9210.0
SIG5832.0
SIV9275.0
SIU9048.0
SIB1907.8
SIB1863.2
SIA0461.0
SIO6711.1
SIO6712.4
SII6458.0
SIO6715.5
SIP6720.2
SIG5838.0
SIA0602.0
SIE4885.8
SID3395.4
SII6454.3
SID4241.0
SIT8384.5
SID3411.0
SIA0590.5

1,1,3,3,5,5,7,7,9,9-DECAMETHYLPENTASILOXANE, 95%(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)METHYLDICHLOROSILANE(1-NAPHTHYLMETHYL)TRICHLOROSILANEPENTAFLUOROPHENYLPROPYLDIMETHYLCHLOROSILANE(4-BROMOPHENYLETHYNYL)TRIMETHYLSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIMETHOXYSILANEPHENYLETHYNYLTRIMETHYLSILANE
1-(TRIMETHYLSILOXY)PHENYLACETONITRILE
3-(p-METHOXYPHENYL)PROPYLMETHYLDICHLOROSILANE((CHLOROMETHYL)PHENYLETHYL)DIMETHYLCHLOROSILANE
4-PHENYLBUTYLMETHYLDICHLOROSILANE
1-PHENYL-1-(METHYLDICHLOROSILYL)BUTANE
1-PHENYL-1-TRIMETHYLSILOXYETHYLENE
VINYL(p-METHOXYPHENYL)DIMETHYLSILANEPHENYLACETOXYTRIMETHYLSILANE
3-PHENOXYPROPYLDIMETHYLCHLOROSILANE
2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in methylene chloride
2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in toluene(3-PHENYLPROPYL)DIMETHYLCHLOROSILANE
4-(AZIDOSULFONYL)PHENETHYLTRIMETHOXYSILANE, 22-25% in methanol/toluene
PHENYLMETHYLDIETHOXYSILANE
PHENETHYLTRIMETHOXYSILANE, tech-95
PHENYLETHYLTRIMETHOXYSILANEVINYLTRIISOPROPENOXYSILANE[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]DIMETHYLCHLOROSILANE, tech-95, endo/exo
isomers
2-PYRIDYLTRIETHOXYSILANE
3-PYRIDYLTRIETHOXYSILANE
N-BENZYLAMINOMETHYLTRIMETHYLSILANEPHENYLMETHYLBIS(DIMETHYLAMINO)SILANE(5-BICYCLO[2.2.1]HEPT-2-ENYL)DIMETHYLETHOXYSILANEETHYNYLCYCLOPENTYLDIETHYLSILANE
10-UNDECENYLTRICHLOROSILANE
N-6,9-BIS(TRIMETHYLSILYL)ADENINE
11-BROMOUNDECYLTRICHLOROSILANE, 95%
11-CHLOROUNDECYLTRICHLOROSILANEVINYLMETHYLBIS(METHYLETHYLKETOXIMINO)SILANE, 95%
O,O’-BIS(TRIMETHYLSILYL)THYMINE
6-(t-BUTYLDIMETHYLSILOXY)-3,4-DIHYDRO-2H-PYRAN
2-(t-BUTYLDIMETHYLSILOXY)PENT-2-EN-4-ONE
3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE[2-(3-CYCLOHEXENYL)ETHYL]TRIMETHOXYSILANEMETHACRYLOXYPROPYLDIMETHYLETHOXYSILANE, 95%
2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIMETHOXYSILANE(3-ACRYLOXYPROPYL)METHYLDIETHOXYSILANE, 95%
BIS(TRIMETHYLSILYL) ITACONATEMETHACRYLOXYMETHYLTRIETHOXYSILANE
UNDECYLTRICHLOROSILANE(3-CYANOBUTYL)TRIETHOXYSILANE
n-DECYLMETHYLDICHLOROSILANE
1,3,5-TRIVINYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE, 95%
CYCLOOCTYLTRIMETHOXYSILANE
7-OCTENYLTRIMETHOXYSILANE, tech-95
VINYLTRIISOPROPOXYSILANE(3-GLYCIDOXYPROPYL)METHYLDIETHOXYSILANEVINYLTRIS(2-METHOXYETHOXY)SILANE
10-UNDECENYLSILANE
11-BROMOUNDECYLSILANE
N,N-BIS(TRIMETHYLSILYLMETHYL)ACRYLAMIDEALLYLDIMETHYL(DIISOPROPYLAMINO)SILANE
n-OCTYLDIMETHYLMETHOXYSILANE
n-OCTYLMETHYLDIMETHOXYSILANE
ISOOCTYLTRIMETHOXYSILANE
n-OCTYLTRIMETHOXYSILANEPENTYLTRIETHOXYSILANE(3-GLYCIDOXYPROPYL)PENTAMETHYLDISILOXANE
3-AMINOPROPYLDIISOPROPYLETHOXYSILANE(3-(N-ETHYLAMINO)ISOBUTYL)METHYLDIETHOXYSILANE(N,N-DIETHYLAMINOMETHYL)TRIETHOXYSILANE
3-(3-ISOCYANATOPROPYL)HEPTAMETHYLTRISILOXANE, 95%
3-{[DIMETHYL(3-TRIMETHOXYSILYL)PROPYL]AMMONIO}PROPANE-1-SULFONATE,tech 95
TRIISOPROPYLDIMETHYLAMINOSILANE(2-DIETHYLPHOSPHATOETHYL)METHYLDIETHOXYSILANE, tech-95
N-(2-AMINOETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 95%

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

SILICON

PR

O
O
F

SIT8397.0
SIO6707.0
SIM6493.2
SID2663.0
SIT8387.0
SIB1828.4
SIT7908.0
SIC2455.0
SII6455.0
SIB1857.0
SIA0120.2
SID2754.0
SIB1836.0
SIB1928.0
SIG5825.0
SIT8185.3
SIA0025.0
SID4220.5
SIO6707.5
SID4614.0
SIB1886.0
SIC2353.0
SIC2298.5
SII6456.6
SIO6711.0
SII6400.0
SII6451.2
SIB1056.0
SIB1048.3
SIB1046.0
SIP6828.4
SIU9055.0
SIS6944.0
SID3214.0
SID3530.0
SID4080.0
SID4610.0
SIB1986.0
SII6453.5
SIM6579.0
SIG5838.5
SID2792.0
SIM6585.0
SIB1832.5
SIB1857.7
SIO6711.4
SIT8365.0
SIA0587.0
SIB1932.2
SIB1932.3
SID3396.0
SIA0035.0
SIA0588.8
SIB1068.0
SID4040.0
SIA0604.0
SIB1145.0
SIT7095.0
SIM6572.0
SID4591.0
SIT8398.0
SIB1053.5
SIB1024.0
SIB1073.0
SIB1866.0
SID3394.0
SIT8722.0
SIC2325.0
SIA0604.5
SIB1021.5
SIB1770.0
SID2655.0
SIM6592.0
SID2650.0

COMPOUNDS

Molecular formula Catalog #423

Molecular formula Catalog #Molecular Formula Index

424

Molecular formula Catalog #Name

C12H26N2O3Si
C12H26N2Si
C12H26O3Si
C12H26O3Si2
C12H26O3Si4
C12H26O4Si
C12H26O4Si2
C12H26O5Si
C12H26O5Si2
C12H26O5Si2
C12H26O6Si
C12H26O6Si
C12H26Si
C12H26Si
C12H27BO3Si3
C12H27ClO3Si
C12H27ClSi
C12H27ClSi
C12H27ClSi
C12H27NO3Si
C12H27NO5Si
C12H27N3O5SSi
C12H28Cl2OSi2
C12H28Cl2OSi2
C12H28Cl2Si2
C12H28N4Si4
C12H28O2Si
C12H28O3Si
C12H28O3Si
C12H28O4Si
C12H28O4Si
C12H28O4Si
C12H28O4Si2
C12H28O4Si3
C12H28O8Si
C12H28Si
C12H28Si
C12H28Si
C12H28Si
C12H28Si
C12H29NO5Si∙HCl

SIT8187.5
SIC2451.0
SIH6164.2
SIM6487.0
SIP6826.0
SIE4675.0
SIB1852.6
SIG5839.0
SIB1027.0
SID4611.0
SID4220.6
SID4221.0
SIA0535.0
SIM6472.7
AKB159.5
SIT8085.0
SID2660.0
SIT8091.0
SIT8378.6
SIC2464.4
SIT8188.0
SIA0780.0
SIB1048.8
SIT7273.0
SIB1048.0
SIT7899.0
SID3528.0
SID4069.4
SIH6167.5
SIT7271.0
SIT7777.0
SIT8088.0
SIB1618.0
SIM6481.2
SIT7286.0
SID3224.0
SID4629.6
SIT8091.6
SIT8092.0
SIT8378.7
SIB1500.0

C12H29NSi
C12H29O6PSi
C12H29PSi
C12H30N2O3Si
C12H30OSi2
C12H30OSi2
C12H30OSi2
C12H30O3Si2
C12H30O3Si2
C12H30O3Si3
C12H30O4Si2
C12H30O4Si3
C12H30O6Si2
C12H30O6Si2
C12H31NO6Si2
C12H31NSi2
C12H31NSi2
C12H31N3Si
C12H32O3Si4
C12H33ClO3Si4
C12H33PSi3
C12H34O2Si4
C12H34O3Si4
C12H35NO3Si
C12H36Cl2N2Si4Zr
C12H36GeN2Si4
C12H36GeO4Si4
C12H36N2SSi4
C12H36N2Si4Sn
C12H36N2Si4Zn
C12H36O4Si4Ti
C12H36O4Si4Zr

SIO6711.3
SID3412.0
SID3351.5
SIA0594.0
SID3349.4
SIH6070.0
SIT7274.0
SIB1130.0
SIB1144.0
SIT8617.0
SIB1615.0
SIA0088.0
SIB1832.0
SIH5935.0
SIB1833.0
SIB1869.5
SID3349.0
SIT8090.0
SIA0585.0
SIC2413.0
SIT8722.7
SIB1735.0
SIP6921.0
SIA0620.0
SIZ9810.0
GEB1025
GET7296
SIT7907.5
SNB1025
SIZ9700.0
SIT7305.0
SIT7306.0

N-(3-TRIETHOXYSILYLPROPYL)-4,5-DIHYDROIMIDAZOLE
3-CYANOPROPYLDIISOPROPYL(DIMETHYLAMINO)SILANE
5-HEXENYLTRIETHOXYSILANE, 95%
METHACRYLOXYPROPYLPENTAMETHYLDISILOXANE, 95%
PHENYLTRIS(DIMETHYLSILOXY)SILANE
5,6-EPOXYHEXYLTRIETHOXYSILANE
BIS(TRIMETHYLSILYL) ADIPATE(3-GLYCIDOXYPROPYL)TRIETHOXYSILANE
1,3-BIS(3-CARBOXYPROPYL)TETRAMETHYLDISILOXANE
1,3-DIVINYLTETRAETHOXYDISILOXANE, 95%
DIMETHYLSILA-17-CROWN-6, 90%
DIMETHYLSILACROWNS, mixed
ALLYLTRIISOPROPYLSILANE(-)-MENTHYLDIMETHYLSILANE
BORON VINYLDIMETHYLSILOXIDETRI-t-BUTOXYCHLOROSILANE, 95%
n-DECYLDIMETHYLCHLOROSILANE
TRI-n-BUTYLCHLOROSILANETRIISOBUTYLCHLOROSILANE
N-CYCLOHEXYLAMINOPROPYLTRIMETHOXYSILANE
TRIETHOXYSILYLPROPYL ETHYLCARBAMATE
6-AZIDOSULFONYLHEXYLTRIETHOXYSILANE, tech-95
1,3-BIS(3-CHLOROISOBUTYL)TETRAMETHYLDISILOXANE
1,1,3,3-TETRAISOPROPYL-1,3-DICHLORODISILOXANE
1,8-BIS(CHLORODIMETHYLSILYL)OCTANE, 95%
1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILAZANE, 95%
DIISOBUTYLDIETHOXYSILANE(3,3-DIMETHYLBUTYL)TRIETHOXYSILANEHEXYLTRIETHOXYSILANETETRAISOPROPOXYSILANETETRA-n-PROPOXYSILANE
TRI-t-BUTOXYSILANOL
1,2-BIS(METHYLDIETHOXYSILYL)ETHYLENE(METHACRYLOXYMETHYL)BIS(TRIMETHYLSILOXY)METHYLSILANE, 95%
TETRAKIS(METHOXYETHOXY)SILANE, tech-95
DI-t-BUTYLISOBUTYLSILANE
DODECYLSILANE
TRI-n-BUTYLSILANE
TRI-t-BUTYLSILANE, 95%
TRIISOBUTYLSILANE
BIS(METHOXYETHYL)-3-TRIMETHOXYSILYLPROPYLAMMONIUM CHLORIDE, 60% in
methanoln-OCTYLDIMETHYL(DIMETHYLAMINO)SILANE(2-DIETHYLPHOSPHATOETHYL)TRIETHOXYSILANE, tech-95
DI-tert-BUTYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
N-(6-AMINOHEXYL)AMINOPROPYLTRIMETHOXYSILANE, 95%
1,3-DI-n-BUTYLTETRAMETHYLDISILOXANEHEXAETHYLDISILOXANE
1,1,3,3-TETRAISOPROPYLDISILOXANE
1,3-BIS(4-HYDROXYBUTYL)TETRAMETHYLDISILOXANE, 95%
1,3-BIS(3-HYDROXYISOBUTYL)TETRAMETHYLDISILOXANE
1,3,5-TRIMETHYL-1,3,5-TRIETHOXY-1,3,5-TRISILACYCLOHEXANE
1,2-BIS(METHYLDIETHOXYSILYL)ETHANE
3-(3-ACETOXYPROPYL)HEPTAMETHYLTRISILOXANE
1,6-BIS(TRIMETHOXYSILYL)HEXANEHEXAETHOXYDISILANE, tech-95
BIS(3-TRIMETHOXYSILYLPROPYL)AMINE, 96%
BIS(3-TRIMETHYLSILYLPROPYL)AMINE
1,3-DI-n-BUTYL-1,1,3,3-TETRAMETHYLDISILAZANE
TRI-(t-BUTYLAMINO)SILANE, 95%
ALLYLTRIS(TRIMETHYLSILOXY)SILANE
3-CHLOROPROPYLTRIS(TRIMETHYLSILOXY)SILANE
TRIS(TRIMETHYLSILYLMETHYL)PHOSPHINE
1,2-BIS(PENTAMETHYLDISILOXANYL)ETHANEPROPYLTRIS(TRIMETHYLSILOXY)SILANE
3-AMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 95%
ZIRCONIUM BIS(HEXAMETHYLDISILAZIDE)DICHLORIDEGERMANIUM(II) BIS(HEXAMETHYLDISILYL)AMIDETETRAKIS(TRIMETHYLSILOXY)GERMANE
THIOBIS(HEXAMETHYLDISILAZANE)
TIN(ll) BIS(HEXAMETHYLDISILAZIDE)ZINC BIS(HEXAMETHYLDISILAZIDE)TETRAKIS(TRIMETHYLSILOXY)TITANIUMTETRAKIS(TRIMETHYLSILOXY)ZIRCONIUM

O
O
F

SIT8720.0 TRIS(TRIMETHYLSILOXY)ETHYLENE, 96%
SIV9300.0 VINYLTRIS(TRIMETHYLSILOXY)SILANE
SIH5840.25 HENEICOSAFLUORODODECYLTRICHLOROSILANE
SIH5918.0 HEXADECAFLUORODODEC-11-EN-1-YLTRICHLOROSILANE
SIB1705.0 BIS(NONAFLUOROHEXYL)DICHLOROSILANE
SIB1811.5 1,8-BIS(TRICHLOROSILYLETHYL)HEXADECAFLUOROOCTANE
SIH5840.4 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)DIMETHYLCHLOROSILANE
SID4510.0 DIPHENYLDICHLOROSILANE, 95%
SID4510.1 DIPHENYLDICHLOROSILANE, 99%
SID4530.0 DIPHENYLDIFLUOROSILANE
SID4495.0 DIPHENYLCHLOROSILANE, tech-95
SID4560.0 DIPHENYLSILANEDIOLSID4559.0 DIPHENYLSILANE
SID4045.0 DIMETHYL[BIS(CYCLOPENTADIENYL)SILYL] ZIRCONIUM DICHLORIDE
SIP6790.0 PHENYLTRIACETOXYSILANE, tech-95
SIP6716.6 PENTAFLUOROPHENYLPROPYLTRIMETHOXYSILANE
SIP6716.7 PENTAFLUOROPHENYLTRIETHOXYSILANE
SIP6824.6 1-PHENYL-3-TRIMETHYLSILYL-2-PROPYN-1-OL
SID3388.0 DI(CYCLOPENTADIENYL)DIMETHYLSILANE
SIT8588.7 2-[(TRIMETHYLSILYL)ETHYNYL]TOLUENESIB1973.0 p-(t-BUTYL)PHENETHYLTRICHLOROSILANE
SIP6736.4 6-PHENYLHEXYLTRICHLOROSILANE
SIC2453.8 3-CYANOPROPYLPHENYLDIMETHOXYSILANE, 95%
SIA0469.0 ALLYL(4-METHOXYPHENYL)DIMETHYLSILANE
SIV9061.0 (m,p-VINYLBENZYLOXY)TRIMETHYLSILANE
SIH6162.0 HEXAVINYLDISILOXANE, 95%
SIV9092.2 VINYLPHENYLDIETHOXYSILANE
SIB1895.0 p-BROMOPHENOXY(t-BUTYL)DIMETHYLSILANE
SIA0325.0 ADAMANTYLETHYLTRICHLOROSILANE
SIC2295.2 ((CHLOROMETHYL)PHENYLETHYL)METHYLDIMETHOXYSILANE
SIC2295.5 ((CHLOROMETHYL)PHENYLETHYL)TRIMETHOXYSILANE
SIC2332.0 CHLOROPHENYLTRIETHOXYSILANE
SIC2332.3 p-CHLOROPHENYLTRIETHOXYSILANE
SIE4897.2 m,p-ETHYLPHENETHYLDIMETHYLCHLOROSILANE, tech-95
SIP6724.7 4-PHENYLBUTYLDIMETHYLCHLOROSILANE
SIN6597.65 NONAFLUOROHEXYLTRIETHOXYSILANE
SIA0770.0 (AZIDOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-90
SIB1939.6 4-(t-BUTYLDIMETHYLSILOXY)PHENOL
SIM6511.2 (p-METHYLPHENETHYL)METHYLDIMETHOXYSILANE, 95%
SIP6744.2 3-PHENYLPROPYLMETHYLDIMETHOXYSILANE
SIP6821.0 PHENYLTRIETHOXYSILANE
SIT7010.0 TETRAALLYLOXYSILANE
SIT7020.0 TETRAALLYLSILANE
SIT8366.0 (3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANE
SIP6724.0 N-PHENYLAMINOPROPYLTRIMETHOXYSILANE
SIA0598.0 3-(m-AMINOPHENOXY)PROPYLTRIMETHOXYSILANE
SIP6721.2 PHENETHYLDIMETHYL(DIMETHYLAMINO)SILANE
SIB1879.0 4-BROMO-N,N-BIS(TRIMETHYLSILYL)ANILINE
SIC2264.8 3-CHLORO-N,N-BIS(TRIMETHYLSILYL)ANILINE
SID3382.0 DICYCLOHEXYLDICHLOROSILANE
SIC2456.3 11-CYANOUNDECYLTRICHLOROSILANE
SIN6597.8 NONAFLUOROHEXYLTRIS(DIMETHYLAMINO)SILANE
SIB0990.3 (5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDIETHOXYSILANE
SIB1835.8 1,4-BIS(TRIMETHYLSILOXY)BENZENE
SIB0988.0 [(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRIMETHOXYSILANE, tech-95, endo/exo isomers
SIE4901.85 ETHYNYLCYCLOHEXYLDIETHYLSILANE
SIT7525.0 2,3,4,5-TETRAMETHYLCYCLOPENTADIENYLTRIMETHYLSILANE
SIB1853.0 1,4-BIS(TRIMETHYLSILYL)BENZENE
SIC2067.6 10-(CARBOMETHOXY)DECYLTRICHLOROSILANE
SIC2056.2 (-)-CAMPHANYLDIMETHYLCHLOROSILANE
SID4074.0 (DIMETHYLCHLOROSILYL)METHYL-7,7-DIMETHYLNORPINANE
SIB1866.6 4-[BIS(TRIMETHYLSILYL)METHYL]PYRIDINE
SIT8713.0 TRIS(DIMETHYLAMINO)PHENYLSILANE
SIB1058.0 1,3-BIS(CYANOPROPYL)TETRAMETHYLDISILOXANE, 95%
SIB1250.0 BIS(3-ISOCYANATOPROPYL)TETRAMETHYLDISILOXANE, 96%
SIA0315.0 ACRYLOXYTRIISOPROPYLSILANE
SIB1939.55 2-(t-BUTYLDIMETHYLSILOXY)CYCLOHEXANONESID3391.0 DICYCLOPENTYLDIMETHOXYSILANE
SIM6486.8 METHACRYLOXYPROPYLMETHYLDIETHOXYSILANE, 95%
SIT7900.0 1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANESID2790.0 DI-t-BUTOXYDIACETOXYSILANE, tech-96
SID2790.1 DI-t-BUTOXYDIACETOXYSILANE, 98%
SID4630.0 DODECYLTRICHLOROSILANE
SID3510.0 DI-n-HEXYLDICHLOROSILANE

PR

C11H28O3Si3
C11H30O3Si4
C12H4Cl3F21Si
C12H7Cl3F16Si
C12H8Cl2F18Si
C12H8Cl6F16Si2
C12H10ClF17Si
C12H10Cl2Si
C12H10Cl2Si
C12H10F2Si
C12H11ClSi
C12H12O2Si
C12H12Si
C12H14Cl2SiZr
C12H14O6Si
C12H15F5O3Si
C12H15F5O3Si
C12H16OSi
C12H16Si
C12H16Si
C12H17Cl3Si
C12H17Cl3Si
C12H17NO2Si
C12H18OSi
C12H18OSi
C12H18OSi2
C12H18O2Si
C12H19BrOSi
C12H19Cl3Si
C12H19ClO2Si
C12H19ClO3Si
C12H19ClO3Si
C12H19ClO3Si
C12H19ClSi
C12H19ClSi
C12H19F9O3Si
C12H19N3O3Si
C12H20O2Si
C12H20O2Si
C12H20O2Si
C12H20O3Si
C12H20O4Si
C12H20Si
C12H21F9O3Si3
C12H21NO3Si
C12H21NO4Si
C12H21NSi
C12H22BrNSi2
C12H22ClNSi2
C12H22Cl2Si
C12H22Cl3NSi
C12H22F9N3Si
C12H22O2Si
C12H22O2Si2
C12H22O3Si
C12H22Si
C12H22Si
C12H22Si2
C12H23Cl3O2Si
C12H23ClSi
C12H23ClSi
C12H23NSi2
C12H23N3Si
C12H24N2OSi2
C12H24N2O3Si2
C12H24O2Si
C12H24O2Si
C12H24O2Si
C12H24O4Si
C12H24O4Si4
C12H24O6Si
C12H24O6Si
C12H25Cl3Si
C12H26Cl2Si

Name

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Molecular Formula Index

Enabling Your Technology
Name

C14H6O2F10Si
C14H13ClSi
C14H14Cl2O2Si
C14H14Cl2Si
C14H15ClOSi
C14H15ClSi
C14H16Cl2OSi2
C14H16F17NSi
C14H16O2Si
C14H18N2O2Si
C14H19F13O3Si
C14H19NO2Si
C14H22FeSi2
C14H22OSi
C14H22O4Si
C14H22Si2
C14H23ClSi
C14H23ClSi
C14H23ClSi
C14H24Cl2Si2
C14H24N2O7Si
C14H24O5Si
C14H24O5Si
C14H25K3N2O9Si

SIB1710.0
SIV9074.0
SID2755.0
SID4598.0
SIP6723.0
SIB0999.0
SID3358.0
SIH5840.5
SID4535.0
SIB1022.0
SIT8175.0
SIB1966.5
SIB1088.0
SIB1941.0
SIT8177.0
SIB1878.4
SIB1972.5
SIP6720.8
SIP6736.3
SIB1030.0
SIT7909.7
SIB1403.0
SID3544.0
SIT8403.0

C14H25N2Na3O9Si

SIT8402.0

C14H26N2O3Si
C14H26O3Si
C14H26O6Si2
C14H27N3O3Si
C14H28O3Si
C14H28O4Si
C14H29ClO2Si
C14H29Cl3OSi
C14H29Cl3O2Si
C14H29Cl3Si
C14H30OSi
C14H30O3Si
C14H30O3Si
C14H30O5Si
C14H30O6Si
C14H30O7Si
C14H31BrO3Si
C14H31ClO3Si
C14H31ClSi
C14H31ClSi
C14H31NO5Si
C14H31N3O3Si
C14H32OSSi
C14H32O3Si
C14H32O3Si
C14H32O4SSi
C14H32O4Si3
C14H32O6Si2
C14H33AlO6Si
C14H33NO3Si3
C14H34O2Si2
C14H34O5SSi3
C14H34O5Si2
C14H34O5Si4
C14H34O6Si2
C14H34O6Si2
C14H34O6Si2
C14H35NO7Si2
C14H36N2O6Si2
C14H36N2O6Si2
C14H40Cl2O5Si6
C14H42O5Si6
C15H14Si
C15H16F16O3Si
C15H16Si
C15H18OSi
C15H19ClO3Si

SIA0588.0
SIC2520.0
SIB1832.2
SIV9280.0
SIC2459.5
SIE4668.0
SIC2065.0
SIU9049.5
SIM6491.5
SIT7093.0
SIU9049.2
SIU9049.0
SIV9099.0
SIT7122.6
SIV9277.0
SID4220.7
SIB1909.0
SIC2429.0
SID4627.0
SIO6710.5
SIT8186.5
SIA0795.0
SIM6479.3
SII6457.5
SIO6715.0
SIM6480.0
SIM6486.0
SIB1820.0
SID2780.0
SIM6480.7
SIB1026.8
SIB1845.0
SIB1138.0
SIM6485.8
SIB1817.0
SIB1829.7
SIB1832.7
SIH6171.5
SIB1834.0
SIB1834.1
SIB1054.0
SIT7089.0
SIE4901.9
SIH5919.0
SIV9076.5
SID4553.0
SIC2266.8

BIS(PENTAFLUOROPHENYL)DIMETHOXYSILANEVINYLDIPHENYLCHLOROSILANEDIBENZYLOXYDICHLOROSILANE, tech-95
DI(p-TOLYL)DICHLOROSILANE, tech-95
3-PHENOXYPHENYLDIMETHYLCHLOROSILANE, 95%
4-BIPHENYLYLDIMETHYLCHLOROSILANE
1,3-DICHLORO-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANE, 96%(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)DIMETHYL(DIMETHYLAMINO)SILANEDIPHENYLDIMETHOXYSILANE, 98%
BIS(p-AMINOPHENOXY)DIMETHYLSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIETHOXYSILANE
N-(t-BUTYLDIMETHYLSILYL)PHTHALIMIDE
1,1’-BIS(DIMETHYLSILYL)FERROCENE
p-(t-BUTYLDIMETHYLSILOXY)STYRENE
p-(TRIETHOXYSILYL)ACETOPHENONE, 95%
1,4-BIS(VINYLDIMETHYLSILYL)BENZENE
p-(t-BUTYL)PHENETHYLDIMETHYLCHLOROSILANE
PHENETHYLDIISOPROPYLCHLOROSILANE
6-PHENYLHEXYLDIMETHYLCHLOROSILANE
BIS[2-(CHLORODIMETHYLSILYL)ETHYL]BENZENE(3-(3-THYMINYL)PROPIONOXY)PROPYLTRIMETHOXYSILANE
1,3-BIS(METHACRYLOXY)-2-TRIMETHYLSILOXYPROPANE, 95%
3,5-DIMETHOXYPHENYLTRIETHOXYSILANE
N-(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINETRIACETATE,TRIPOTASSIUM SALT,30%
in water
N-(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINETRIACETATE,TRISODIUM SALT, 35%
in water(AMINOETHYLAMINOMETHYL)PHENETHYLTRIMETHOXYSILANE, 90%(3-CYCLOPENTADIENYLPROPYL)TRIETHOXYSILANE
1,4-BIS(TRIMETHOXYSILYLMETHYL)BENZENEVINYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95[2-(3-CYCLOHEXENYL)ETHYL]TRIETHOXYSILANE
2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIETHOXYSILANE
10-(CARBOMETHOXY)DECYLDIMETHYLCHLOROSILANE
UNDECYLOXYPROPYLTRICHLOROSILANE
11-(2-METHOXYETHOXY)UNDECYLTRICHLOROSILANETETRADECYLTRICHLOROSILANE
10-UNDECENYLOXYTRIMETHYLSILANE
10-UNDECENYLTRIMETHOXYSILANEVINYLTRI-t-BUTOXYSILANETETRAHYDROFURFURYLOXYPROPYLTRIETHOXYSILANEVINYLTRIS(1-METHOXY-2-PROPOXY)SILANEDIMETHYLSILA-20-CROWN-7, 90%
11-BROMOUNDECYLTRIMETHOXYSILANE, 95%
11-CHLOROUNDECYLTRIMETHOXYSILANE
DODECYLDIMETHYLCHLOROSILANE
n-OCTYLDIISOPROPYLCHLOROSILANE
N-(3-TRIETHOXYSILYLPROPYL) O-t-BUTYLCARBAMATE
11-AZIDOUNDECYLTRIMETHOXYSILANE, 95%
11-MERCAPTOUNDECYLOXYTRIMETHYLSILANE
ISOOCTYLTRIETHOXYSILANE
n-OCTYLTRIETHOXYSILANE
11-MERCAPTOUNDECYLTRIMETHOXYSILANE, 95%
3-METHACRYLOXYPROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE, 95%
1,2-BIS(TRIETHOXYSILYL)ETHYLENE, 95%
DI-s-BUTOXYALUMINOXYTRIETHOXYSILANE(3-METHACRYLAMIDOPROPYL)BIS(TRIMETHYLSILOXY)METHYLSILANE
1,2-BIS(t-BUTYLDIMETHYLSILOXY)ETHANE
3-[BIS(TRIMETHYLSILOXY)METHYLSILYLPROPOXY]SULFOLANE
1,3-BIS(3-(2-HYDROXYETHOXY)PROPYL)TETRAMETHYLDISILOXANE, 95%
METHACRYLOXYMETHYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
1,2-BIS(TRIETHOXYSILYL)ETHANE
1,6-BIS(TRIMETHOXYSILYL)-2,5-DIMETHYLHEXANE
1,8-BIS(TRIMETHOXYSILYL)OCTANE
N-(HYDROXYETHYL)-N,N-BIS(TRIMETHOXYSILYLPROPYL)AMINE, 65% in methanol
N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 62% in methanol
N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 95%
1,3-BIS(CHLOROMETHYL)-1,1,3,3-TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
TETRADECAMETHYLHEXASILOXANEETHYNYLDIPHENYLMETHYLSILANEHEXADECAFLUORODODEC-11-EN-1-YLTRIMETHOXYSILANEVINYLDIPHENYLMETHYLSILANEDIPHENYLMETHYLETHOXYSILANE
7-[3-(CHLORODIMETHYLSILYL)PROPOXY]-4-METHYLCOUMARIN, 10% in acetonitrile

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Gelest, Inc.

(215) 547-1015

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COMPOUNDS

Molecular formula Catalog #OOFSID4626.0 DODECAMETHYLPENTASILOXANE
SIT7298.0 TETRAKIS(TRIMETHYLSILOXY)SILANE
SID4625.0 DODECAMETHYLCYCLOHEXASILOXANE
SIT7308.0 TETRAKIS(TRIMETHYLSILYL)SILANE
SID4555.5 (DIPHENYLMETHYL)TRICHLOROSILANE
SID4552.0 DIPHENYLMETHYLCHLOROSILANE
SIH5841.5 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIMETHOXYSILANE
SID4555.0 DIPHENYLMETHYLSILANE
SIT8345.0 p-TRIFLUOROMETHYLTETRAFLUOROPHENYLTRIETHOXYSILANE
SID4623.6 DODECAFLUORODEC-9-ENE-1-YLTRIMETHOXYSILANE
SIM6565.0 4-METHYL-7-TRIMETHYLSILOXYCOUMARIN
SIN6597.0 1-NAPHTHYLTRIMETHOXYSILANE
SIA0433.0 (S,S)-2-ALLYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE
SIC2283.0 3-[2-(4-CHLOROMETHYLBENZYLOXY)ETHOXY]PROPYLTRICHLOROSILANE
SIM6481.5 (METHACRYLOXYMETHYL)PHENYLDIMETHYLSILANE
SIT7907.7 (THIOCYANATOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95
SIS6990.0 STYRYLETHYLTRIMETHOXYSILANE, tech-90
SIB0959.0 BENZOYLOXYPROPYLTRIMETHOXYSILANE
SIM6509.0 3,4-METHYLENEDIOXYPHENYLTRIETHOXYSILANE
SIM6481.17 3-METHACRYLOXYPROPYLTRIACETOXYSILANE, tech-90
SIC2439.5 12-CYANODODEC-10-ENYLTRICHLOROSILANE, tech-95
SIN6597.1 NEOPHYLMETHYLDIMETHOXYSILANE
SIB0971.0 BENZYLTRIETHOXYSILANE
SIE4897.5 m,p-ETHYLPHENETHYLTRIMETHOXYSILANE, tech-95
SIP6724.92 4-PHENYLBUTYLTRIMETHOXYSILANE
SIT8041.0 p-TOLYLTRIETHOXYSILANE
SIM6492.53 p-METHOXYPHENYLTRIETHOXYSILANE
SIB0966.0 N-BENZYL-N-METHOXYMETHYL-N-(TRIMETHYLSILYLMETHYL)AMINE, 96%
SIP6926.2 3-(2-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANE
SIP6926.4 3-(4-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANE
SIP6723.7 N-PHENYLAMINOMETHYLTRIETHOXYSILANE
SIP6928.0 2-(4-PYRIDYLETHYL)TRIETHOXYSILANE
SIM6487.1 METHACRYLOXYPROPYLSILATRANE, 95%
SIB0992.0 (5-BICYCLO[2.2.1]HEPT-2-ENYL)TRIETHOXYSILANE
SIT8192.6 (3-TRIETHOXYSILYL)PROPYLSUCCINIC ANHYDRIDE, 95%
SIA0114.0 11-ACETOXYUNDECYLTRICHLOROSILANE
SIP6902.6 O-(PROPARGYL)-N-(TRIETHOXYSILYLPROPYL) CARBAMATE, 90%
SIT8189.8 TRIETHOXYSILYLPROPYLMALEAMIC ACID, tech-90
SIT8384.8 1-(TRIISOPROPYLSILYL)PYRROLE
SIC2265.5 (CHLORODIMETHYLSILYL)-5-[2-(CHLORODIMETHYLSILYL)ETHYL]BICYCLOHEPTANE
SIT8394.0 N-[5-(TRIMETHOXYSILYL)-2-AZA-1-OXOPENTYL]CAPROLACTAM, 95%
SIP6736.2 3-PHENYLHEPTAMETHYLTRISILOXANE, 95%
SIE4666.0 2-(3,4-EPOXYCYCLOHEXYL)ETHYLMETHYLDIETHOXYSILANE
SIM6487.3 METHACRYLOXYPROPYLTRIETHOXYSILANE
SIU9045.0 10-UNDECENYLDIMETHYLCHLOROSILANE
SID3226.0 DI-t-BUTYLISOBUTYLSILYLTRIFLUOROMETHANESULFONATE
SIM6480.73 (3-METHACRYLAMIDOPROPYL)TRIETHOXYSILANE, tech-95
SIT8186.7 N-[3-(TRIETHOXYSILYL)PROPYL]-2-CARBOMETHOXYAZIRIDINE, 95%
SIM6590.0 METHYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95
SIB1907.6 11-BROMOUNDECYLDIMETHYLCHLOROSILANE, 95%
SID4628.0 DODECYLMETHYLDICHLOROSILANE
SIH5844.5 (E)-HEPTENYLDIISOPROPYLSILANOL
SID4610.3 2-(DIVINYLMETHYLSILYL)ETHYLTRIETHOXYSILANE
SIC2464.2 (N-CYCLOHEXYLAMINOMETHYL)TRIETHOXYSILANE, 95%
SIT8189.5 N-(3-TRIETHOXYSILYLPROPYL)-4-HYDROXYBUTYRAMIDE
SIO6712.2 n-OCTYLMETHYLDIETHOXYSILANE
SID2670.0 n-DECYLTRIMETHOXYSILANE
SIT8725.0 TRIS(VINYLDIMETHYLSILOXY)METHYLSILANE, 95%
SIA0194.0 (3-ACRYLOXYPROPYL)METHYLBIS(TRIMETHYLSILOXY)SILANE, tech-90
SIM6486.1 METHACRYLOXYPROPYLBIS(TRIMETHYLSILOXY)SILANOL - blend
SIM6493.4 METHOXYTRIETHYLENEOXYPROPYLTRIMETHOXYSILANE
SIB1140.0 N,N-BIS(2-HYDROXYETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 62% in ethanol
SIA0592.6 N-(6-AMINOHEXYL)AMINOMETHYLTRIETHOXYSILANE, 95%
SIB1835.2 N,N’-BIS(3-TRIMETHOXYSILYLPROPYL)THIOUREA, tech-90
SIB1835.5 N,N’-BIS(3-TRIMETHOXYSILYLPROPYL)UREA, 95%
SIG5820.0 (3-GLYCIDOXYPROPYL)BIS(TRIMETHYLSILOXY)METHYLSILANE
SIT8185.8 1-(TRIETHOXYSILYL)-2-(DIETHOXYMETHYLSILYL)ETHANE
SIB1821.0 BIS(TRIETHOXYSILYL)METHANE
SIB1645.0 BIS(METHYLDIMETHOXYSILYLPROPYL)-N-METHYLAMINE, 95%
SIB1835.0 BIS(3-TRIMETHOXYSILYLPROPYL)-N-METHYLAMINE
SIH6074.0 1,1,1,5,5,5-HEXAETHYL-3-METHYLTRISILOXANE
SIT8719.5 [TRIS(TRIMETHYLSILOXY)SILYLETHYL]DIMETHYLCHLOROSILANE
SIM6500.5 N-METHYLAMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE
SID3352.0 2,4-DICHLOROBENZOYL PEROXIDE, 50% in polydimethylsiloxane

PR

C12H36O4Si5
C12H36O4Si5
C12H36O6Si6
C12H36Si5
C13H11Cl3Si
C13H13ClSi
C13H13F17O3Si
C13H14Si
C13H15F7O3Si
C13H16F12O3Si
C13H16O3Si
C13H16O3Si
C13H18ClNOSi
C13H18Cl4O2Si
C13H18O2Si
C13H19NO3SSi
C13H20O3Si
C13H20O5Si
C13H20O5Si
C13H20O8Si
C13H22Cl3NSi
C13H22O2Si
C13H22O3Si
C13H22O3Si
C13H22O3Si
C13H22O3Si
C13H22O4Si
C13H23NOSi
C13H23NO3SSi
C13H23NO3SSi
C13H23NO3Si
C13H23NO3Si
C13H23NO5Si
C13H24O3Si
C13H24O6Si
C13H25Cl3O2Si
C13H25NO5Si
C13H25NO6Si
C13H25NSi
C13H26Cl2Si2
C13H26N2O5Si
C13H26O2Si3
C13H26O3Si
C13H26O5Si
C13H27ClSi
C13H27F3O3SSi
C13H27NO4Si
C13H27NO5Si
C13H27N3O3Si
C13H28BrClSi
C13H28Cl2Si
C13H28OSi
C13H28O3Si2
C13H29NO3Si
C13H29NO5Si
C13H30O2Si
C13H30O3Si
C13H30O3Si4
C13H30O4Si3
C13H30O5Si3
C13H30O7Si
C13H31NO5Si
C13H32N2O3Si
C13H32N2O6SSi2
C13H32N2O7Si2
C13H32O4Si3
C13H32O5Si
C13H32O6Si2
C13H33NO4Si2
C13H33NO6Si2
C13H34O2Si3
C13H37ClO3Si5
C13H37NO3Si4
C14H6Cl4O4Name

SILICON

Molecular formula Catalog #425

Molecular formula Catalog #C15H28O4Si2
C15H29NSi2
C15H30N2O2Si
C15H30O3Si
C15H30O5Si5
C15H31NO3Si
C15H31NO6Si
C15H31NO6Si
C15H32O3Si
C15H32O3Si4
C15H32O7SSi
C15H33NO3Si
C15H33NO3Si
C15H33NO9Si
C15H34O3Si
C15H34O4Si
C15H36O4Si3
C15H36O5Si4
C15H36O6Si3
C15H36SiSn
C15H36Si4
C15H37NO4Si4
C15H37NO8Si2
C15H38O2Si3
C16H7Cl3F26Si

Molecular formula Catalog #SID4552.5
SID4558.5
SIA0184.0
SIE4901.3
SIT8185.9
SID4352.0
SID4610.5
SIB1891.6
SIT8395.0
SIB0956.0
SIB0957.0(DIPHENYL)METHYL(DIMETHYLAMINO)SILANE(DIPHENYLPHOSPHINO)TRIMETHYLSILANE, 95%(ACRYLOXYMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95
ETHYL 4-(TRIETHOXYSILYL)BENZOATE, 90%
2-(3-TRIETHOXYSILYLPHENYL)-1,3-DIOXOLANE
3-(2,4-DINITROPHENYLAMINO)PROPYLTRIETHOXYSILANE, 95%
1,5-DIVINYL-3-PHENYLPENTAMETHYLTRISILOXANE, 95%[11-(2-BROMO-2-METHYL)PROPIONYLOXY]UNDECYLTRICHLOROSILANE
4-(TRIMETHOXYSILYLETHYL)BENZYLTRIMETHYLAMMONIUM CHLORIDE,60% in methanol
N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-90
N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE hydrochloride,
90%,50% in methanol, 90%
SIB1939.65 4-(t-BUTYLDIMETHYLSILOXY)PHENYLTRIMETHOXYSILANE
SIB1863.7 BIS(TRIMETHYLSILYLMETHYL)BENZYLAMINE
SIV9801.0 VINYLMETHYLBIS(METHYLETHYLKETOXIMINO)SILANE, 95%
SIB1020.0 2,2-BIS(ALLYLOXYMETHYL)-1-TRIMETHYLSILOXYBUTANE, 95%
SIP6719.7 PENTAVINYLPENTAMETHYLCYCLOPENTASILOXANE, 95%
SIC2456.5 11-CYANOUNDECYLTRIMETHOXYSILANE
SIA0180.0 N-(3-ACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE,50% in ethanol
SIT7122.3 3-(O-TETRAHYDROFURFURYL)CARBAMOYLPROPYLTRIETHOXYSILANE
SIC2067.0 10-(CARBOMETHOXY)DECYLDIMETHYLMETHOXYSILANE
SIP6827.0 PHENYLTRIS(TRIMETHYLSILOXY)SILANE
SIT8186.0 3-[2-(3-TRIETHOXYSILYLPROPOXY)ETHOXY]SULFOLANE, 95%
SID4068.0 3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, tech-95
SID4068.1 3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, 98%
SIT8189.0 N-(3-TRIETHOXYSILYLPROPYL)GLUCONAMIDE, 50% in ethanol
SID4635.0 DODECYLTRIMETHOXYSILANE
SIT8627.0 TRI-t-PENTOXYSILANOL, 99%
SIT7122.4 3-(TETRAHYDROFURFURYLOXYPROPYL)HEPTAMETHYLTRISILOXANESIA0210.0 (3-ACRYLOXYPROPYL)TRIS(TRIMETHYLSILOXY)SILANE, tech-95
SIH5945.0 1,1,3,3,5,5-HEXAETHOXY-1,3,5-TRISILACYCLOHEXANE
SNT8585
TRI-n-BUTYLSTANNYLTRIMETHYLSILANE
SIT7307.0 TETRAKIS(TRIMETHYLSILYL)ALLENE
SIA0150.0 3-ACRYLAMIDOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
SIB1832.8 1,11-BIS(TRIMETHOXYSILYL)-4-OXA-8-AZAUNDECAN-6-OL, 50% in methanol
SIO6711.5 3-OCTYLHEPTAMETHYLTRISILOXANE
SIT8176.3 5,5,6,6,7,7,8,8,9,9,10,10,10-TRIDECAFLUORO-2-(TRIDECAFLUOROHEXYL)DECYLTRICHLOROSILANE, 95%
SIP6724.95 (S,S)-2-PHENYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE
SIV9076.0 VINYLDIPHENYLETHOXYSILANE
SIB1968.0 t-BUTYLDIPHENYLCHLOROSILANE
SIC2342.0 3-CHLOROPROPYLDIPHENYLMETHYLSILANE, 95%
SIH5841.2 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIETHOXYSILANE
SIB1709.0 BIS(NONAFLUOROHEXYL)TETRAMETHYLDISILOXANESID4525.0 DIPHENYLDIETHOXYSILANE
SID4599.0 DI(p-TOLYL)DIMETHOXYSILANE
SID4555.6 (DIPHENYLMETHYL)TRIMETHOXYSILANE
SID4589.5 DIPHENYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
SIH5841.7 (HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIS(DIMETHYLAMINO)SILANE
SIB1074.0 BIS(DIMETHYLAMINO)DIPHENYLSILANE
SIB1090.0 BIS[(p-DIMETHYLSILYL)PHENYL]ETHER, 96%
SID4588.0 1,3-DIPHENYLTETRAMETHYLDISILOXANE
SIN6596.8 1-NAPHTHYLTRIETHOXYSILANE
SIB1858.0 1,3-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENE
SIB1858.2 1,4-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENESID4584.0 1,2-DIPHENYLTETRAMETHYLDISILANE
SID4586.0 1,3-DIPHENYL-1,1,3,3-TETRAMETHYLDISILAZANE
SIO6706.0 OCTAVINYL-T8-SILSESQUIOXANE
SIT8191.0 3-(TRIETHOXYSILYLPROPYL)-p-NITROBENZAMIDE
SIT8365.5 (3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTETRASILOXANE
SIP6736.32 6-PHENYLHEXYLDIMETHYL(DIMETHYLAMINO)SILANE
SIB1831.0 BIS(TRIMETHOXYSILYLETHYL)BENZENE, tech-95
SIC2439.7 12-CYANODODEC-10-ENYLTRIMETHOXYSILANE, tech-95
SIA0126.0 3-(N-ACETYL-4-HYDROXYPROLYLOXY)PROPYLTRIETHOXYSILANE, 25% in ethanol
SIM6480.8 O-(METHACRYLOXYETHYL)-N-(TRIETHOXYSILYLPROPYL)CARBAMATE, 90%
SIT7289.0 TETRAKIS(METHYLETHYLKETOXIMINO)SILANE (50% in toluene)
SIB1834.5 BIS(3-TRIMETHOXYSILYLPROPYL) FUMARATE, 96%
SIM6487.35 METHACRYLOXYPROPYLTRIISOPROPOXYSILANE
SIM6487.5 METHACRYLOXYPROPYLTRIS(METHOXYETHOXY)SILANE, tech-80
SID4472.0 4,7-DIOXAOCTADECYLTRICHLOROSILANE, 95%
SIH5920.0 n-HEXADECYLTRICHLOROSILANE, 95%
SIT8162.4 7-(TRICHLOROSILYLMETHYL)PENTADECANE, tech-95
SIM6481.1 N-(3-METHACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE, 50%
in methanol

PR

C16H18ClNOSi
C16H18OSi
C16H19ClSi
C16H19ClSi
C16H19F17O3Si
C16H20F18OSi2
C16H20O2Si
C16H20O2Si
C16H20O3Si
C16H21PSi
C16H22F17N3Si
C16H22N2Si
C16H22OSi2
C16H22OSi2
C16H22O3Si
C16H22Si2
C16H22Si2
C16H22Si2
C16H23NSi2
C16H24O12Si8
C16H26N2O6Si
C16H28F12O4Si4
C16H29NSi
C16H30O6Si2
C16H31NO3Si
C16H31NO7Si
C16H31NO7Si
C16H32N4O4Si
C16H32O10Si2
C16H32O5Si
C16H32O8Si
C16H33Cl3O2Si
C16H33Cl3Si
C16H33Cl3Si
C16H33NO6Si

Molecular Formula Index

426

C16H33NO6Si
C16H34Cl2Si
C16H34Cl2Si
C16H34O4Si2
C16H34O5Si2
C16H36O3Si
C16H36O4Si
C16H36O4Si5
C16H36O8Si
C16H36O8Si
C16H36Si
C16H37NO5Si2
C16H37NSi
C16H38N2O3Si
C16H38O5Si4
C16H38O6Si2
C16H38SiSn
C16H39NO4Si2
C16H39N3Si
C16H42O5Si6
C16H56O20Si16
C17H22OSi
C17H24F18O2Si3
C17H27Cl3OSi
C17H30N2O3Si
C17H31ClN2O3Si

Name

SIV9088.4
SIB1097.0
SID4400.0
SIB1870.0
SIB1115.0
SID2665.0
SIT7062.0
SIT7312.0
SIT7282.0
SIT7288.0
SIT7082.0
SIT8187.2
SIO6710.7
SIA0595.0
SIM6487.6
SIB1829.0
SIT8594.5
SIB1620.0
SID2671.0
SID4611.4
SIO6696.5
SIB1969.0
SIB1708.0
SIP6723.4
SIS6993.0
SIS6994.0

O-(VINYLOXYBUTYL)-N-TRIETHOXYSILYLPROPYL CARBAMATE, tech-95
BIS(2-ETHYLHEXYL)DICHLOROSILANE
DI-n-OCTYLDICHLOROSILANE
BIS(TRIMETHYLSILYL) SEBACATE
1,3-BIS(GLYCIDOXYPROPYL)TETRAMETHYLDISILOXANE
n-DECYLTRIETHOXYSILANETETRA-n-BUTOXYSILANETETRAKIS(VINYLDIMETHYLSILOXY)SILANE, 95%
TETRAKIS(ETHOXYETHOXY)SILANE, tech-95
TETRAKIS(1-METHOXY-2-PROPOXY)SILANE, tech-95
TETRA-n-BUTYLSILANE(1-(3-TRIETHOXYSILYL)PROPYL)-2,2-DIETHOXY-1-AZA-2-SILACYCLOPENTANE, tech-90
n-OCTYLDIISOPROPYL(DIMETHYLAMINO)SILANE
N-(2-AMINOETHYL)-11-AMINOUNDECYLTRIMETHOXYSILANEMETHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE
1,2-BIS(TRIMETHOXYSILYL)DECANE(TRIMETHYLSILYLMETHYL)TRI-n-BUTYLTIN
BIS(METHYLDIETHOXYSILYLPROPYL)AMINE, 95%
n-DECYLTRIS(DIMETHYLAMINO)SILANE
1,3-DIVINYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
OCTAKIS(DIMETHYLSILOXY)-T8-SILSESQUIOXANE
t-BUTYLDIPHENYLMETHOXYSILANE
BIS(NONAFLUOROHEXYLDIMETHYLSILOXY)METHYLSILANE, 95%
11-PHENOXYUNDECYLTRICHLOROSILANE
3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE,40% in methanol
3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE HYDROCHLORIDE, 40% in methanol
SIA0127.0 N-(N-ACETYLLEUCYL)-3-AMINOPROPYLTRIETHOXYSILANE, 12-15% in ethanol
SIP6722.8 PHENETHYLTRIS(TRIMETHYLSILOXY)SILANE
SIO6704.0 S-(OCTANOYL)MERCAPTOPROPYLTRIETHOXYSILANE
SIA0482.0 11-ALLYLOXYUNDECYLTRIMETHOXYSILANE
SIT8194.0 TRIETHOXYSILYLUNDECANAL, tech-95
SIT8588.8 TRIMETHYLSILYLETHYNYLTRI-n-BUTYLTIN
SIC2428.0 11-CHLOROUNDECYLTRIETHOXYSILANE
SIM6481.05 O-(METHACRYLOXYETHYL)-3-[BIS(TRIMETHYLSILOXY)METHYLSILYL]PROPYLCARBAMATE,
tech-95
SID4629.0 DODECYLMETHYLDIETHOXYSILANE
SIH6168.7 4-R-8-HYDRO-9-[BIS(TRIMETHYLSILOXY)METHYLSILYL]LIMONENE
SIM6491.7 11-(2-METHOXYETHOXY)UNDECYLTRIMETHOXYSILANE
SIM6481.15 3-(3-METHACRYLOXY-2-HYDROXYPROPOXY)PROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE, tech-95
SIA0630.0 11-AMINOUNDECYLTRIETHOXYSILANE
SIO6715.7 n-OCTYLTRIS(TRIMETHYLSILOXY)SILANE, 95%
SIT8721.2 TRIS(TRIMETHYLSILOXY)SILYLETHYLTRIETHOXYSILANE
SID4590.0 DIPOTASSIUM TRIS(1,2-BENZENEDIOLATO)O,O’ SILICATE
SIT8645.0 TRIPHENYLCHLOROSILANE, 95%
SIT8655.0 TRIPHENYLFLUOROSILANE
SIT8695.0 TRIPHENYLSILANOL
SIT8690.0 TRIPHENYLSILANETHIOLSIB1760.0 BIS(PHENYLETHYNYL)DIMETHYLSILANE
SIT8665.0 TRIPHENYLSILANE
SIT8628.0 TRIPHENYLAMINOSILANE
SID2754.6 DIBENZYLOXYDIACETOXYSILANE, tech-95
SID2749.0 DIALLYLDIPHENYLSILANE, 95%
SID3540.0 DIMESITYLDICHLOROSILANE
SID4608.0 1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANESID3379.0 DICUMYL PEROXIDE, 25%; in polydimethylsiloxane 40%, with 35% calcium carbonate
SID4607.0 1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILAZANE
SIV9077.0 VINYL(DIPHENYLPHOSPHINOETHYL)DIMETHYLSILANE
SIB0999.5 4-BIPHENYLYLTRIETHOXYSILANE
SID4557.5 (2-DIPHENYLPHOSPHINO)ETHYLDIMETHYLETHOXYSILANE
SIB1955.0 (t-BUTYLDIMETHYLSILYL)DIPHENYLPHOSPHINE, 95%
SIF4908.0 2-FERROCENYLETHYLTRIETHOXYSILANE
SIP6826.5 PHENYLTRIS(METHYLETHYLKETOXIMINO)SILANE, 95%
SIA0489.0 m-ALLYLPHENYLPROPYLTRIETHOXYSILANE
SIP6731.5 (R)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREA
SIP6731.6 (S)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREA
SIT8725.4 TRIS(VINYLDIMETHYLSILOXY)PHENYLSILANE, 95%
SIB1402.0 1,3-BIS(3-METHACRYLOXYPROPYL)TETRAMETHYLDISILOXANESIB1816.6 1,4-BIS(TRIETHOXYSILYL)BENZENE
SIB1833.4 1,3-BIS(TRIMETHOXYSILYLPROPYL)BENZENE
SIB1813.7 1,2-BIS(TRICHLOROSILYL)OCTADECANE
SIB1380.0 1,3-BIS(3-METHACRYLAMIDOPROPYL)TETRAMETHYLDISILOXANE
SIC2295.7 CHLOROMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed m,p; α,β isomers

O
O
F

C15H19NSi
C15H19PSi
C15H22O5Si
C15H24O5Si
C15H24O5Si
C15H25N3O7Si
C15H26O2Si3
C15H28BrCl3O2Si
C15H28ClNO3Si
C15H28N2O3Si
C15H28N2O3Si∙HCl

Name

www.AZmax.co.jp

TEL: 03-5543-1630

C17H36N2O5Si
C17H36O3Si4
C17H36O4SSi
C17H36O4Si
C17H36O4Si
C17H36SiSn
C17H37ClO3Si
C17H37NO6Si3
C17H38O2Si
C17H38O2Si3
C17H38O5Si
C17H38O6Si3

C17H39NO3Si
C17H44O3Si4
C17H46O6Si5
C18H12K2O6Si
C18H15ClSi
C18H15FSi
C18H16OSi
C18H16SSi
C18H16Si
C18H16Si
C18H17NSi
C18H20O6Si
C18H20Si
C18H22Cl2Si
C18H22OSi2
C18H22O2
C18H23NSi2
C18H23PSi
C18H24O3Si
C18H25OPSi
C18H25PSi
C18H28FeO3Si
C18H29N3O3Si
C18H30O3Si
C18H32N2O4Si
C18H32N2O4Si
C18H32O3Si4
C18H34O5Si2
C18H34O6Si2
C18H34O6Si2
C18H36Cl6Si2
C18H36N2O3Si2
C18H37ClO3Si4Gelest, Inc.

(215) 547-1015

www.gelest.com

Molecular Formula Index
n-OCTADECYLTRICHLOROSILANE, 95%
n-OCTADECYLTRICHLOROSILANE
TRI-n-HEXYLCHLOROSILANE
4-(TRIETHOXYSILYLPROPOXY)-2,2,6,6-TETRAMETHYLPIPERIDINE OXIDE, tech-85
DI-n-OCTYLDIMETHOXYSILANE
DODECYLTRIETHOXYSILANE
n-OCTADECYLSILANE
TRI-n-HEXYLSILANE
3-AMINOPROPYLTRIS(METHOXYETHOXYETHOXY)SILANE, 95%
N-TRIMETHOXYSILYLPROPYL-N,N,N-TRI-n-BUTYLAMMONIUM BROMIDE,50% in methanol
N-TRIMETHOXYSILYLPROPYL-N,N,N-TRI-n-BUTYLAMMONIUM CHLORIDE,50% in methanol
BIS[3-(TRIETHOXYSILYL)PROPYL]DISULFIDE, 90%
BIS[3-(TRIETHOXYSILYL)PROPYL]TETRASULFIDE, tech-95
BIS(3-TRIETHOXYSILYLPROPYL)AMINE, 95%
N,N’-BIS(2-HYDROXYETHYL)-N,N’-BIS(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINE,
66-68% in methanol
SIO6660.0 OCTAETHOXY-1,3,5-TRISILAPENTANE
SID2752.0 1,3-DIALLYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
SIZ9920.0 ZIRCONIUM TRIS(2,2,5,5-TETRAMETHYL-2,5-DISILAPYRROLIDINE)CHLORIDE, tech-95
SIB1055.8 1,3-BIS(3-CHLOROPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95
SIC2264.6 CERIUM(III) TRIS[BIS(TRIMETHYLSILYL)AMIDE]
SIE4885.0 ERBIUM TRIS(HEXAMETHYLDISILAZIDE)SIE4907.0 EUROPIUM(III) TRIS(HEXAMETHYLDISILAZIDE)
SIG4998.0 GALLIUM TRIS(HEXAMETHYDISILAZIDE)
SIL6464.0 LANTHANUM TRIS(HEXAMETHYLDISILAZIDE)
SIG4994.0 GADOLINIUM TRIS(HEXAMETHYLDISILAZIDE)SIP6902.1 PRASEODYMIUM TRIS(HEXAMETHYLDISILAZIDE)SIS6943.4 SAMARIUM TRIS(HEXAMETHYLDISILAZIDE)
SIT6997.0 TERBIUM TRIS(HEXAMETHYLDISILAZIDE)
SIY9680.0 YTTRIUM(III) TRIS[BIS(TRIMETHYLSILYLAMIDE)]
SIT8689.0 TRIPHENYLMETHYLSILANE
SIT8570.5 2-TRIMETHYLSILOXY-4-ALLYLOXYDIPHENYLKETONESIB1610.0 BIS(N-METHYLBENZAMIDO)ETHOXYMETHYLSILANE, tech-90
SIB1966.3 t-BUTYLDIMETHYLSILYL-N-PHENYLBENZIMIDATE
SIB0950.0 BENZHYDRYLOXYBIS(TRIMETHYLSILOXY)CHLOROSILANE
SIN6597.25 NITROVERATRYLOXYCARBONYLAMIDOPROPYLTRIETHOXYSILANE,10% in tetrahydrofuran
SIS6995.0 11-(SUCCINIMIDYLOXY)UNDECYLDIMETHYLETHOXYSILANE, 95%
SIB1815.1 1,3-BIS(3-TRICHLOROSILYLPROPOXY)-2-DECYLOXYPROPANE
SIM6487.8 METHACRYLOXYPROPYLTRIS(VINYLDIMETHYLSILOXY)SILANE, tech-95
SIM6590.2 METHYLTRIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
SIT8710.0 TRIS(CYCLOHEXYLAMINO)METHYLSILANE, tech-95
SIO6624.0 n-OCTADECYLMETHOXYDICHLOROSILANE, tech-95
SIO6625.0 n-OCTADECYLMETHYLDICHLOROSILANE
SIO6625.1 n-OCTADECYLMETHYLDICHLOROSILANE
SIA0115.0 11-ACETOXYUNDECYLTRIETHOXYSILANE
SIT8194.5 TRIETHOXYSILYLUNDECANAL, ETHYLENE GLYCOL ACETAL
SIV9073.8 VINYLDI-n-OCTYLMETHYLSILANE
SIO6624.4 OCTADECYLMETHYLCHLOROSILANE
SID4401.5 2-(DI-n-OCTYLMETHYLSILYL)ETHYLTRICHLOROSILANE
SIH5925.0 HEXADECYLTRIMETHOXYSILANE, 95%
SIB1824.56 BIS(3-TRIETHOXYSILYLPROPYL)CARBONATE
SIM6559.0 METHYLTRI-n-HEXYLSILANE
SIB1827.0 N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]THIOUREA, 90%
SIB1828.0 N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]UREA, 60% in ethanol
SIB1818.0 BIS(TRIETHOXYSILYLETHYL)VINYLMETHYLSILANE
SID4627.6 1-DODECYLHEPTAMETHYLTRISILOXANE, 95%
SIT8686.0 (TRIPHENYLMETHYL)METHYLDICHLOROSILANE
SIV9264.0 VINYLTRIPHENOXYSILANE
SIV9265.0 VINYLTRIPHENYLSILANE
SIP6720.71 (4-PERFLUOROOCTYLPHENYL)TRIETHOXYSILANE
SIB1816.0 1,3-BIS(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TETRAMETHYLDISILOXANE
SIT8652.0 TRIPHENYLETHOXYSILANE, tech-95
SIB1205.0 BIS(INDENYL)DIMETHYLSILANE
SIP6720.77 9-PHENANTHRENYLTRIETHOXYSILANE
SID4589.0 (S)-(-)-[(DIPHENYL)TRIMETHYLSILOXYMETHYL]PYRROLIDINE
SIT8571.28 (S)-2-[TRIMETHYLSILOXY(DIPHENYL)METHYL]PYRROLIDINE
SID4609.0 1,5-DIVINYL-3,3-DIPHENYL-1,1,5,5-TETRAMETHYLTRISILOXANE
SIM6502.0 O-4-METHYLCOUMARINYL-N-[3-(TRIETHOXYSILYL)PROPYL]CARBAMATESID4558.0 2-(DIPHENYLPHOSPHINO)ETHYLTRIETHOXYSILANE
SIB1082.0 4,4’-BIS(DIMETHYLETHOXYSILYL)BIPHENYL
SIP6716.0 PENTAFLUOROPHENOXYUNDECYLTRIMETHOXYSILANE
SID4556.0 3,5-DIPHENYLOCTAMETHYLTETRASILOXANE, 95%
SIN6598.0 p-NONYLPHENOXYPROPYLDIMETHYLCHLOROSILANE, tech-95
SIP6729.5 12-PHENYLDODECYLDIMETHYLCHLOROSILANE

C20H36Cl2OSi2
C20H38O3Si2
C20H38O5Si6
C20H40Cl6O3Si2
C20H41Cl3Si
C20H41NO5Si
C20H41O3PSi
C20H42O5Si2
C20H43ClSi
C20H43ClSi
C20H43ClSi
C20H44O12Si
C20H44Si
C20H46OSi2
C20H46O4Si2
C20H46O6Si2
C20H47NSi2
C20H48O9Si3
C20H50O7Si4
C21H20Si
C21H22Si
C21H23ClF26O2Si3

Enabling Your Technology
Name

SIT7087.0
SIB1092.0
SID4582.0
SIB1815.3
SIE4661.0
SIT8190.0
SID3385.0
SIB1765.0
SIO6615.0
SIO6615.1
SIO6615.2
SIT7285.0
SIO6619.0
SID4406.0
SIT8572.8
SIB1824.0
SID4404.0
SIT8716.6
SIB1820.2
SIA0575.0
SIT6997.2
SIB1815.5

1,1,3,3-TETRACYCLOPENTYLDICHLORODISILOXANE
1,3-BIS[2-(3,4-EPOXYCYCLOHEXYL)ETHYL]TETRAMETHYLDISILOXANE, 90%
1,3-DIPHENYLTETRAKIS(DIMETHYLSILOXY)DISILOXANE, 95%
3,3-BIS(TRICHLOROSILYLPROPOXYMETHYL)-5-OXA-TRIDECANE, 95%
EICOSYLTRICHLOROSILANE, 95%(S)-N-TRIETHOXYSILYLPROPYL-O-MENTHOCARBAMATE(2-DICYCLOHEXYLPHOSPHINOETHYL)TRIETHOXYSILANE
1,3-BIS(TETRAHYDROFURFURYLOXYPROPYL)TETRAMETHYLDISILOXANE
n-OCTADECYLDIMETHYLCHLOROSILANE
n-OCTADECYLDIMETHYLCHLOROSILANE, 97%
n-OCTADECYLDIMETHYLCHLOROSILANE, 70% in toluene
TETRAKIS(METHOXYETHOXYETHOXY)SILANE, tech-95
n-OCTADECYLDIMETHYLSILANE
1,3-DI-n-OCTYLTETRAMETHYLDISILOXANE
11-(TRIMETHYLSILOXY)UNDECYLTRIETHOXYSILANE
1,8-BIS(TRIETHOXYSILYL)OCTANE
1,3-DI-n-OCTYL-1,1,3,3-TETRAMETHYLDISILAZANE
1,1,2-TRIS(TRIETHOXYSILYL)ETHANE, tech-95
1,3-BIS(TRIETHOXYSILYLETHYL)TETRAMETHYLDISILOXANEALLYLTRIPHENYLSILANE
m-TERPHENYL-5’-YLTRIMETHYLSILANE
BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLCHLOROSILANE
C21H24F26O2Si3
SIB1815.7 BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLSILANE
C21H24O3Si3
SIT8705.0 1,3,5-TRIPHENYLTRIMETHYLCYCLOTRISILOXANE, 90%
C21H24O3Si3 - C28H32O4Si4 SIP6737.5 PHENYLMETHYLCYCLOSILOXANES, 95%
C21H28O5Si
SIH6198.0 2-HYDROXY-4-(3-METHYLDIETHOXYSILYLPROPOXY)DIPHENYLKETONE, tech-90
C21H29NO3Si
SIC2058.2 3-CARBAZOLYLPROPYLTRIETHOXYSILANE
C21H31O3PSi
SID4558.2 3-(DIPHENYLPHOSPHINO)PROPYLTRIETHOXYSILANE
C21H32O2Si2
SIB1853.5 BIS(TRIMETHYLSILYL)BISPHENOL A
C21H33ClF18O2Si4
SIB1706.0 [BIS(NONAFLUOROHEXYLDIMETHYLSILOXY)METHYL]SILYLETHYLDIMETHYLCHLOROSILANE, 95%
C21H34N2O5SSi
SIT8187.0 N-(TRIETHOXYSILYLPROPYL)DANSYLAMIDE
C21H45N3O12Si3
SIT8717.0 TRIS(3-TRIMETHOXYSILYLPROPYL)ISOCYANURATE, tech-95
C21H46OSi
SIO6618.0 n-OCTADECYLDIMETHYLMETHOXYSILANE
C21H46O2Si
SIO6629.0 n-OCTADECYLMETHYLDIMETHOXYSILANE
C21H46O3Si
SIO6645.0 n-OCTADECYLTRIMETHOXYSILANE, 95%
C21H46O7Si
SIM6493.7 METHOXYTRIETHYLENEOXYUNDECYLTRIMETHOXYSILANE
C21H47ClSi2
SID4401.0 2-(DI-n-OCTYLMETHYLSILYL)ETHYLDIMETHYLCHLOROSILANE
C21H51NO9Si3
SIT8716.2 TRIS(TRIETHOXYSILYLMETHYL)AMINE, tech-90
C22H30O6Si
SIH6200.0 2-HYDROXY-4-(3-TRIETHOXYSILYLPROPOXY)DIPHENYLKETONE, tech-90
C22H38OSi2
SIB1026.2 1,3-BIS[(BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TETRAMETHYLDISILOXANE
C22H42O5Si4SIM6481.48 METHACRYLOXYMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed isomers
C22H43Cl3OSi
SIU9049.4 11-UNDECENYLOXYUNDECYLTRICHLOROSILANE
C22H43Cl3Si
SID4617.0 DOCOSENYLTRICHLOROSILANE, 90%,
C22H44Cl6OSi2
SIB1815.4 BIS(TRICHLOROSILYLUNDECYL) ETHER
C22H45Cl3Si
SID4621.0 DOCOSYLTRICHLOROSILANE, blend
C22H47ClO2Si
SIO6607.0 OCTADECYLDIETHOXYCHLOROSILANE, tech-95
C22H48O3Si
SIH5922.0 HEXADECYLTRIETHOXYSILANE, 95%
C22H49NSi
SIO6617.0 n-OCTADECYLDIMETHYL(DIMETHYLAMINO)SILANE
C22H50ClNO3Si
SIT7090.0 TETRADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 50%
in methanol
C22H58O7Si6
SIB1932.5 [2-(9-BUTYLDECAMETHYLPENTASILOXANYL)ETHYL]TRIETHOXYSILANE
C23H33NOSi
SID4480.0 2-(S)-[(DIPHENYL)(t-BUTYLDIMETHYLSILOXY)METHYL]PYRROLIDINEC23H33N5O7Si
SIN6597.24 4-NITRO-4’(N-ETHYL-N-TRIMETHOXYSILYLCARBAMATO)AMINOAZOBENZENE, tech-95
C23H42O6Si3
SIB1110.0 1,5-BIS(GLYCIDOXYPROPYL)-3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE
C23H48Cl2Si
SID4620.0 DOCOSYLMETHYLDICHLOROSILANE, blend
C23H50O2Si
SIO6627.0 n-OCTADECYLMETHYLDIETHOXYSILANE
C23H52ClNO3Si
SIO6619.5 OCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 60%
in methanol
C24H20Cl2OSi
SID3374.0 1,3-DICHLOROTETRAPHENYLDISILOXANE
C24H20F34OSi2
SIB1120.0 1,3-BIS(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TETRAMETHYLDISILOXANE
C24H20O4Si
SIT7600.0 TETRAPHENOXYSILANE, tech-95
C24H20Si
SIT7755.0 TETRAPHENYLSILANE
C24H26BrPSi
SIT8606.7 (3-TRIMETHYLSILYL-2-PROPYNYL)TRIPHENYLPHOSPHONIUM BROMIDEC24H30O7Si
SIT8186.2 7-TRIETHOXYSILYLPROPOXY-5-HYDROXYFLAVONE, 50% in xylene
C24H38O6Si2
SIB1816.8 4,4’-BIS(TRIETHOXYSILYL)BIPHENYL
C24H42Cl12Si6
SIH6080.0 1,2,3,4,5,6-HEXAKIS[2-(METHYLDICHLOROSILYL)ETHYL]BENZENE
C24H46O9Si2
SIB1390.0 1,3-BIS(3-METHACRYLOXY-2-HYDROXYPROPOXYPROPYL)TETRAMETHYLDISILOXANE,
tech-95
C24H48N4O4Si
SIT7290.0 TETRAKIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
C24H52O3Si
SIO6642.0 n-OCTADECYLTRIETHOXYSILANE, 95%
C24H52Si
SIT8625.0 TRIOCTYLSILANE
C24H54O3Pt2Si6
SIP6830.3 PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMPOUNDS

SIO6640.0
SIO6640.1
SIT8374.0
SIT8186.45
SID4400.4
SID4632.0
SIO6635.0
SIT8376.0
SIA0614.0
SIT8412.0
SIT8414.0
SIB1824.6
SIB1825.0
SIB1824.5
SIB1142.0

PR

C18H44O8Si3
C18H46O5Si6
C18H48ClN3Si6Zr
C18H48Cl2O5Si6
C18H54CeN3Si6
C18H54ErN3Si6
C18H54EuN3Si6
C18H54GaN3Si6
C18H54LaN3Si6
C18H54N3GdSi6
C18H54N3PrSi6
C18H54N3Si6Sm
C18H54N3Si6Tb
C18H54N3Si6Y
C19H18Si
C19H22O3Si
C19H24N2O3Si
C19H25NOSi
C19H29ClO3Si3
C19H32N2O9Si
C19H37NO4Si
C19H38Cl6O3Si2
C19H38O5Si4
C19H39N3O3Si
C19H39N3Si
C19H40Cl2OSi
C19H40Cl2Si
C19H40Cl2Si
C19H40O5Si
C19H40O5Si
C19H40Si
C19H41ClSi
C19H41Cl3Si2
C19H42O3Si
C19H42O9Si2
C19H42Si
C19H44N2O6SSi2
C19H44N2O7Si2
C19H44O6Si3
C19H46O2Si3
C20H18Cl2Si
C20H18O3Si
C20H18Si
C20H19F17O3Si
C20H20F26OSi2
C20H20OSi
C20H20Si
C20H24O3Si
C20H27NOSi
C20H27NOSi
C20H28O2Si3
C20H29NO7Si
C20H29O3PSi
C20H30O2Si2
C20H31F5O4Si
C20H34O3Si4
C20H35ClOSi
C20H35ClSi

Molecular formula Catalog #OOF

C18H37Cl3Si
C18H37Cl3Si
C18H39ClSi
C18H39NO5Si
C18H40O2Si
C18H40O3Si
C18H40Si
C18H40Si
C18H41NO9Si
C18H42BrNO3Si
C18H42ClNO3Si
C18H42O6S2Si2
C18H42O6S4Si2
C18H43NO6Si2
C18H44N2O8Si2

Name

SILICON

Molecular formula Catalog #427

Molecular formula Catalog #Name

Molecular Formula Index

Molecular formula Catalog #

Cu5Si
F4Si
F4Si
F6K2SiF6Li2Si∙2H2O
F6MgSi∙6H2O
F6Na2SiFeSi2
HBr3Si
HCl3Si
HCl3Si
HCl3Si
HCl9Si4
HF3Si
H2Cl2Si
H2Cl2Si
H2Cl2Si
H2Cl2Si
H2F6Si∙H2O
H2I2SiH3ClSi
H4Si
H4Si
H6Si2
H8F6N2Si
H8Si3
H9NSi3
H10Si4
H10Si4
H12Si5
I4Si
Li2O3Si
Li2O11Si5
Li4O4Si
Li6-7Si2
Mg2Si
MoSi2
N4Si3
Na4O4Si
NbSi2
OSi
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si
O2Si∙H2OO3PbSiO4SiZr
S2Si
Si
Si
Si
Si
SiTa2
Si2Ti
Si2W
Si2Zr

Name

SIC2435.0 COPPER SILICIDE
SIT7120.0 TETRAFLUOROSILANE
SIT7120.1 TETRAFLUOROSILANE, 99.99+%
SIP6885.0 POTASSIUM HEXAFLUOROSILICATESIL6466.5 LITHIUM HEXAFLUOROSILICATE, dihydrate
SIM6470.5 MAGNESIUM HEXAFLUOROSILICATESIS6981.0 SODIUM HEXAFLUOROSILICATESIF4910.0 FERROSILICON
Ref. Comp. 9 TRIBROMOSILANE
SIT8155.0 TRICHLOROSILANE, 99%
SIT8155.1 TRICHLOROSILANE, 99.9+%
SIT8155.3 TRICHLOROSILANE, 2M (28-29%) in xylene
SIT8716.1 TRIS(TRICHLOROSILYL)SILANE
SIT8373.0 TRIFLUOROSILANE, 50-75%
SID3368.0 DICHLOROSILANE
SID3368.1 DICHLOROSILANE, 99.9+%
SID3368.3 DICHLOROSILANE, 25% in heptane
SID3368.6 DICHLOROSILANE, 25% in xylene
SIF4920.0 FLUOROSILICIC ACID, 22-25% in water
SID3520.0 DIIODOSILANE, 95%
SIC2414.0 CHLOROSILANE, 95%
SIS6950.1 SILANE, 7.0 - 7.5% in argon
SIS6950.4 SILANE, 7.0 - 7.5% in nitrogen
SID4594.0 DISILANE, 99.9+%
SIA0705.0 AMMONIUM HEXAFLUOROSILICATESIT8709.6 TRISILANE
SIT8715.8 TRISILYLAMINESII6463.4 ISOTETRASILANE
SIT7880.0 n-TETRASILANE
SIN6597.07 NEOPENTASILANE
SIT7123.0 TETRAIODOSILANE
SIL6469.0 LITHIUM METASILICATESIL6469.5 LITHIUM POLYSILICATE, 20% in water
SIL6469.2 LITHIUM ORTHOSILICATE, tech-95
SIL6469.6 LITHIUM SILICIDESIM6472.0 MAGNESIUM SILICIDE, powder
SIM6594.8 MOLYBDENUM DISILICIDE, 99+%
SIS6972.0 SILICON NITRIDE, powder
SIS6986.0 SODIUM ORTHOSILICATE, tech-90
SIN6597.2 NIOBIUM DISILICIDE, 99+%
SIS6970.0 SILICON MONOXIDESID2754.2 DIATOMACEOUS EARTH, calcined
SIS6960.0 SILICON DIOXIDE, amorphous
SIS6961.0 SILICON DIOXIDE, amorphous, OCTAMETHYLCYCLOTETRASILOXANE TREATED
SIS6962.0 SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SIS6962.1M30SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SIS6962.1N30 SILICON DIOXIDE, amorphous, CYCLIC AZASILANE/HEXAMETHYLDISILAZANE TREATED
SIS6963.0 SILICON DIOXIDE, amorphous GEL, 30% in isopropanol
SIS6963.2 SILICON DIOXIDE, amorphous GEL, 15% in water
SIS6963.4 SILICON DIOXIDE, amorphous GEL, 40% in water
SIS6964.0 SILICON DIOXIDE, crystalline
SIS6964.4 SILICON DIOXIDE, fused
SIS6966.0 SILICON DIOXIDE, precipitated
W-SIO-76-03 SILICON DIOXIDE WAFER
SID2754.4 DIATOMACEOUS EARTH, uncalcined
PBL6300
LEAD MONOSILICATESIZ9850.0 ZIRCONIUM SILICATESIS6967.0 SILICON DISULFIDE, 95%
SIS6955.0 SILICON, 99% powder
W-SI-76-0.4 SILICON WAFER
W-SIN-76-0.4 SILICON WAFER
W-SIP-76-0.4 SILICON WAFER
SIT6996.0 TANTALUM SILICIDE, 99.9+%
SIT8005.0 TITANIUM SILICIDE, 95%, powder
SIT8787.0 TUNGSTEN SILICIDESIZ9860.0 ZIRCONIUM SILICIDE, powder, 99%

PR

O
O
F

C24H54O3Pt2Si6
SIP6831.2 PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene
C24H54O3Pt2Si6
SIP6831.2LC PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene, LOW COLOR
C24H54O9Si2
SIB1550.0 BIS(METHOXYTRIETHYLENEOXYPROPYL)TETRAMETHYLDISILOXANE
C24H54O9Si2
SIB1824.4 2,2-BIS(3-TRIETHOXYSILYLPROPOXYMETHYL)BUTANOL, 50% in ethanol
C24H54O11Si2(C2H4O)5-8 SIB1824.2 BIS-[3-(TRIETHOXYSILYLPROPOXY)-2-HYDROXYPROPOXY]POLYETHYLENE OXIDE, 65%
in ethanol
C24H55N3Si
SIO6648.0 n-OCTADECYLTRIS(DIMETHYLAMINO)SILANE
C24H58O9Si4SIM6493.3 [METHOXYTRI(ETHYLENEOXY)PROPYL]HEXAMETHYLTRISILOXANYLETHYLTRIETHOXYSILANE, tech-95
C25H54Si
SIM6577.0 METHYLTRI-n-OCTYLSILANE
C25H58O2Si3
SIO6622.0 3-OCTADECYLHEPTAMETHYLTRISILOXANE, 95%
C26H26OSi2
SIT7754.0 1,1,3,3-TETRAPHENYLDIMETHYLDISILOXANE
C26H26Si2
SID4238.0 1,2-DIMETHYL-1,1,2,2-TETRAPHENYLDISILANE
C26H27NSi2
SIT7753.0 1,1,3,3-TETRAPHENYL-1,3-DIMETHYLDISILAZANE
C26H53Cl3Si
SIH5917.0 HEXACOSYLTRICHLOROSILANE
C26H55ClSi
SIC2266.5 11-(CHLORODIMETHYLSILYL)METHYLTRICOSANE, tech-95
C26H55ClSi
SIO6608.0 n-OCTADECYLDIISOBUTYLCHLOROSILANE, 95%
C26H56N2O4Si
SID4465.0 N,N-DIOCTYL-N’-TRIETHOXYSILYLPROPYLUREA
C26H56Si
SIO6611.0 n-OCTADECYLDIISOBUTYLSILANE
C26H58BrNO3Si
SIT8422.0 N-TRIMETHOXYSILYLUNDECYL-N,N,N-TRI-n-BUTYLAMMONIUM BROMIDE, 25% in
dimethylformamide
C26H58ClNO3Si
SIO6620.0 OCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 60%
in methanol
C26H58O9Si6
SIB1400.0 1,3-BIS(3-METHACRYLOXYPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95
C27H42O4Si5
SIT8662.0 3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE, tech-95
C27H52ClNO6Si2
SIS6989.0 (STYRYLMETHYL)BIS(TRIETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 40% in ethanol
C27H56O8Si
SIT8186.3 TRIETHOXYSILYLPROPOXY(POLYETHYLENEOXY)DODECANOATE, tech-95
C27H60ClNO3Si
SID3392.0 N,N-DIDECYL-N-METHYL-N-(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE,
40-42% in methanol
C27H63NO9Si3
SIT8716.3 TRIS(TRIETHOXYSILYLPROPYL)AMINE, tech-95
C28H26OSi2
SID4616.0 1,3-DIVINYLTETRAPHENYLDISILOXANE, 95%
C28H28Si
SIT7888.0 TETRA-p-TOLYLSILANE
C28H31NSi2
SIB1026.4 1,3-BIS(4-BIPHENYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
C28H32O2Si3
SIT7757.0 1,1,5,5-TETRAPHENYL-1,3,3,5-TETRAMETHYLTRISILOXANE
C28H38O5Si2
SIB1000.0 1,3-BIS[(ACRYLOXYMETHYL)PHENETHYL]TETRAMETHYLDISILOXANE, tech-95
C28H57Cl3Si
SIT8162.0 13-(TRICHLOROSILYLMETHYL)HEPTACOSANE, 95%
C28H58O3Si
SID4618.0 DOCOSENYLTRIETHOXYSILANE, 95%
C28H60O3Si
SID4622.0 DOCOSYLTRIETHOXYSILANE, blend
C28H61NSi
SIO6610.0 n-OCTADECYLDIISOBUTYL(DIMETHYLAMINO)SILANE, 95%
C30H45N3O6Si
SIT8192.4 (R)-N-TRIETHOXYSILYLPROPYL-O-QUININEURETHANE, 95%
C30H50O6S(2-4)Si2
SIB1820.5 BIS[m-(2-TRIETHOXYSILYLETHYL)TOLYL]POLYSULFIDE, tech-90
C30H56O9Si
SIT8715.6 TRIS(GLYCIDOXYPROPYLDIMETHYLSILOXY)PHENYLSILANE, 95%
C30H61Cl3Si
SIT8048.0 TRIACONTYLTRICHLOROSILANE, blend
C30H63ClSi
SIC2266.0 13-(CHLORODIMETHYLSILYLMETHYL)HEPTACOSANE, 95%
C31H62O3Si3
SIP6715.55 3-(m-PENTADECYLPHENOXYPROPYL)HEPTAMETHYLTRISILOXANE, tech-90
C31H64Cl2Si
SIT8046.0 TRIACONTYLMETHYLDICHLOROSILANE, blend
C32H16Cl2N8Si
SIP6828.0 PHTHALOCYANATODICHLOROSILANE, tech-90
C32H58O2Si
SIT8015.0 O-DL-a-TOCOPHEROLYLTRIMETHYLSILANE, tech-90
C32H67ClSi
SIT8045.0 TRIACONTYLDIMETHYLCHLOROSILANE, blend
C32H68O4Si
SIT7283.0 TETRAKIS(2-ETHYLHEXOXY)SILANE
C32H68O12Si
SIT7275.0 TETRAKIS(BUTOXYETHOXYETHOXY)SILANE, tech-95
C32H96N4O16Si8·XH2O SIO6696.9 OCTAKIS(TETRAMETHYLAMMONIUM)-T8-SILSESQUIOXANE, hydrate
C33H34O2Si3
SIP6719.5 1,1,3,5,5-PENTAPHENYL-1,3,5-TRIMETHYLTRISILOXANE
C34H61ClO2Si
SIT8010.0 O-DL-a-TOCOPHEROLYLPROPYLDIMETHYLCHLOROSILANE, tech-90
C34H74OSi2
SIT7590.0 1,1,3,3-TETRA-n-OCTYLDIMETHYLDISILOXANE
C35H74O14Si8
SIM6486.65 METHACRYLOXYPROPYLHEPTAISOBUTYL-T8-SILSESQUIOXANE
C36H30OSi2
SIH6161.0 HEXAPHENYLDISILOXANE
C36H30O3Si3
SIH6145.0 HEXAPHENYLCYCLOTRISILOXANE
C36H30Si2
SIH6155.0 HEXAPHENYLDISILANE
C36H80ClNO6Si2
SIO6606.0 OCTADECYLBIS(TRIETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 50% in ethanol
C37H50O3P2Si2
SIB1091.0 BIS(2-DIPHENYLPHOSPHINOETHYL)METHYLSILYLETHYLTRIETHOXYSILANE,mixed isomers
C37H82O2Si3
SIT8045.4 3-TRIACONTYLHEPTAMETHYLTRISILOXANE, tech-85
C38H70O5Si
SIT8012.0 O-DL-a-TOCOPHEROLYLPROPYLTRIETHOXYSILANE, tech-90
C39H60O12Si2
SIB1824.8 1,7-BIS(4-TRIETHOXYSILYLPROPOXY-3-METHOXYPHENYL)-1,6-HEPTADIENE-3,5-DIONE,
tech-90
C39H76O4Si3
SIT8011.0 O-DL-a-TOCOPHEROLYLPROPYLHEPTAMETHYLTRISILOXANE, tech-90
C42H34Si2
SIB1878.2 m-BIS(TRIPHENYLSILYL)BENZENE
C48H40O4Si4
SIO6705.0 OCTAPHENYLCYCLOTETRASILOXANE, 95%
C48H40O4Si4
SIO6705.1 OCTAPHENYLCYCLOTETRASILOXANE, 98%
C48H40O12Si8
SIO6705.5 OCTAPHENYL-T8-SILSESQUIOXANE
C48H48N8O12Si8
SIO6600.0 OCTA(AMINOPHENYL)-T8-SILSESQUIOXANE
C50H104O20Si2 (av)
SIB1824.9 1,3-[BIS(3-TRIETHOXYSILYLPROPYL)POLYETHYLENOXY]-2-METHYLENEPROPANE
C60H68O4P4Si4
SIT7281.0 TETRAKIS(2-DIPHENYLPHOSPHINOETHYL)TETRAMETHYLCYCLOTETRASILOXANE, 95%
C80H164O4Si
SIT7291.0 TETRAKIS(2-OCTYLDODECYLOXY)SILANE, tech-95

428

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(215) 547-1015

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CAS Index

1,3-DIPHENYLTETRAMETHYLDISILOXANEMETHYLDICHLOROSILANETETRAMETHYLSILANE, 99+%
TETRAMETHYLSILANE, 99.9+%
TRIMETHYLCHLOROSILANE
TRIMETHYLCHLOROSILANE, 99+%
DIMETHYLDICHLOROSILANE, 98%
DIMETHYLDICHLOROSILANE, 99+%
METHYLTRICHLOROSILANE, 98%
METHYLTRICHLOROSILANE, 99%
VINYLTRICHLOROSILANE
TRIPHENYLCHLOROSILANE, 95%
ETHYLTRIETHOXYSILANEVINYLTRIETHOXYSILANETETRAETHOXYSILANE, 98%
TETRAETHOXYSILANE, 99.9+%
DIMETHYLDIETHOXYSILANE, 98%
DIPHENYLDICHLOROSILANE, 95%
DIPHENYLDICHLOROSILANE, 99%
DICUMYL PEROXIDE, 25%; in polydimethylsiloxane 40%, with 35% calcium carbonate
CYCLOHEXYLTRICHLOROSILANEPHENYLTRICHLOROSILANE
ALLYLTRICHLOROSILANEHEXAMETHYLDISILOXANE, 98%
HEXAMETHYLDISILOXANE, 99.9%
OCTAMETHYLTRISILOXANETETRADECAMETHYLHEXASILOXANEPENTYLTRICHLOROSILANE
n-OCTADECYLTRICHLOROSILANE, 95%
n-OCTADECYLTRICHLOROSILANEETHYLTRICHLOROSILANETETRAKIS(2-ETHYLHEXOXY)SILANEVINYLMETHYLDICHLOROSILANE
1,3-BIS(GLYCIDOXYPROPYL)TETRAMETHYLDISILOXANE
2,4-DICHLOROBENZOYL PEROXIDE, 50% in polydimethylsiloxanen-PROPYLTRICHLOROSILANE
DECAMETHYLTETRASILOXANE
DODECAMETHYLPENTASILOXANEDIPHENYLMETHYLCHLOROSILANEPHENYLMETHYLDICHLOROSILANE
1,-3-DISILACYCLOBUTANE
1,3,5-TRISILACYCLOHEXANEDIPHENYLDIFLUOROSILANEDIMETHYLDIFLUOROSILANE
TRIETHOXYFLUOROSILANE, 95%(3,3,3-TRIFLUOROPROPYL)METHYLDIMETHOXYSILANEPHENYLTRIFLUOROSILANE, 95%
METHYLTRIFLUOROSILANE
TRIPHENYLFLUOROSILANE
TRIMETHYLSILYLTRIFLUOROACETATESILICON CARBIDE, powder
TRIMETHYLFLUOROSILANE(3,3,3-TRIFLUOROPROPYL)TRIMETHOXYSILANE, 98%(3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTETRASILOXANE
4-FLUOROPHENYLTRIMETHYLSILANEHEXAPHENYLCYCLOTRISILOXANE
DODECAMETHYLCYCLOHEXASILOXANEDECAMETHYLCYCLOPENTASILOXANEHEXAMETHYLCYCLOTRISILOXANE, 95%
HEXAMETHYLCYCLOTRISILOXANE, 98%
DIETHYLSILANE
3-PHENYLHEPTAMETHYLTRISILOXANE, 95%
PHENYLMETHYLCYCLOSILOXANES, 95%
1,3,5-TRIPHENYLTRIMETHYLCYCLOTRISILOXANE, 90%
OCTAPHENYLCYCLOTETRASILOXANE, 95%
OCTAPHENYLCYCLOTETRASILOXANE, 98%
OCTAMETHYLCYCLOTETRASILOXANE, 98%
DI-t-BUTYLDIFLUOROSILANETETRAACETOXYSILANE, 95%(3,3,3-TRIFLUOROPROPYL)TRICHLOROSILANE
TRIETHYLSILANOLTRIETHYLETHOXYSILANE
TRIETHYLSILANE, 98%

PR

SID4588.0
SIM6504.0
SIT7555.0
SIT7555.1
SIT8510.0
SIT8510.1
SID4120.0
SID4120.1
SIM6520.0
SIM6520.1
SIV9110.0
SIT8645.0
SIE4901.2
SIV9112.0
SIT7110.0
SIT7110.2
SID4121.0
SID4510.0
SID4510.1
SID3379.0
SIC2480.0
SIP6810.0
SIA0520.0
SIH6115.0
SIH6115.1
SIO6703.0
SIT7089.0
SIP6720.0
SIO6640.0
SIO6640.1
SIE4901.0
SIT7283.0
SIV9084.0
SIB1115.0
SID3352.0
SIP6915.0
SID2655.0
SID4626.0
SID4552.0
SIP6738.0
Ref. Comp. 3
SIT8709.3
SID4530.0
SID4122.0
SIT8180.0
SIT8370.0
SIP6821.5
SIM6558.0
SIT8655.0
SIT8618.0
SIS6959.0
SIT8525.0
SIT8372.0
SIT8365.5
SIF4930.0
SIH6145.0
SID4625.0
SID2650.0
SIH6105.0
SIH6105.1
SID3415.0
SIP6736.2
SIP6737.5
SIT8705.0
SIO6705.0
SIO6705.1
SIO6700.0
SID3207.0
SIT6998.0
SIT8371.0
SIT8332.0
SIT8285.0
SIT8330.0

Name631-36-7
675-62-7
681-84-5
681-84-5
682-01-9
690-56-2
694-53-1
701-35-9754-05-2
757-44-8
758-21-4
760-32-7
762-72-1
763-13-3
766-08-5
766-77-8
768-32-1
768-33-2
770-09-2
770-10-5
772-65-6
775-12-2
775-56-4
776-76-1
780-69-8
789-25-3
791-29-7
791-31-1
807-28-3
814-98-2
825-94-5
865-46-3
871-41-0
871-64-7
871-92-1
872-19-5
919-30-2
919-30-2
919-31-3
920-68-3
928-65-4
931-70-4
940-41-0
947-42-2
992-94-9
992-94-9
993-00-0
993-07-7
994-30-9
994-49-0
994-79-6
995-25-5
995-45-9
995-83-5
996-50-9
998-29-8
998-30-1
998-41-4
999-97-3
999-97-3
1000-05-1
1000-50-6
1000-70-0
1001-52-1
1009-93-4
1012-12-0
1020-84-4
1027-62-9
1048-08-4
1066-35-9
1066-40-6
1066-42-8
1066-54-2

TETRAETHYLSILANE(3,3,3-TRIFLUOROPROPYL)METHYLDICHLOROSILANETETRAMETHOXYSILANE, 98%
TETRAMETHOXYSILANE, 99+%
TETRA-n-PROPOXYSILANE
1,3-BIS(TRIFLUOROPROPYL)TETRAMETHYLDISILOXANEPHENYLSILANE
p-TOLYLTRICHLOROSILANEVINYLTRIMETHYLSILANE(2-DIETHYLPHOSPHATOETHYL)TRIETHOXYSILANE, tech-95
ETHYLDIMETHYLSILANEDIETHYLMETHYLSILANE
ALLYLTRIMETHYLSILANE
3-BUTENYLTRIMETHYLSILANEPHENYLMETHYLSILANEPHENYLDIMETHYLSILANEPHENYLTRIMETHYLSILANEPHENYLDIMETHYLCHLOROSILANEBENZYLTRIMETHYLSILANEBENZYLTRICHLOROSILANE
PHENETHYLMETHYLDICHLOROSILANEDIPHENYLSILANEPHENYLMETHYLDIETHOXYSILANEDIPHENYLMETHYLSILANEPHENYLTRIETHOXYSILANE
TRIPHENYLSILANE
TRIPHENYLMETHYLSILANE
TRIPHENYLSILANOL
1,1,3,3-TETRAPHENYLDIMETHYLDISILOXANE
1,1,2,2-TETRAMETHYLDISILANE
CHLOROPHENYLTRICHLOROSILANE, 95%
DIMETHYLFLUOROSILANE
n-HEPTYLTRICHLOROSILANEHEXYLDICHLOROSILANE
n-OCTYLSILANE
DODECYLSILANE
3-AMINOPROPYLTRIETHOXYSILANE
3-AMINOPROPYLTRIETHOXYSILANE 99+%
2-CYANOETHYLTRIETHOXYSILANEHEPTAMETHYLDISILAZANEHEXYLTRICHLOROSILANE
p-TOLYLSILANE
PHENETHYLTRICHLOROSILANEDIPHENYLSILANEDIOLMETHYLSILANE
METHYLSILANE, 99.9+%
METHYLCHLOROSILANE
TRIMETHYLSILANE
TRIETHYLCHLOROSILANEHEXAETHYLDISILOXANETETRA-n-BUTYLSILANE
TRI-n-PROPYLCHLOROSILANE
TRI-n-BUTYLCHLOROSILANE
1,1,3,3,5,5,7,7,9,9-DECAMETHYLPENTASILOXANE, 95%(DIETHYLAMINO)TRIMETHYLSILANE
TRI-n-PROPYLSILANE
TRIETHOXYSILANE
TRI-n-BUTYLSILANE
1,1,1,3,3,3-HEXAMETHYLDISILAZANE
1,1,1,3,3,3-HEXAMETHYLDISILAZANE, 99%
1,1,3,3,5,5,7,7-OCTAMETHYLTETRASILOXANE, 80% in octamethylcyclotetrasiloxane
n-BUTYLDIMETHYLCHLOROSILANE
BIS(TRIMETHYLSILYL)CARBODIIMIDEn-BUTYLDIMETHYLSILANE
1,1,3,3,5,5-HEXAMETHYLCYCLOTRISILAZANE
4-TRIMETHYLSILOXYBENZALDEHYDE
1,1,3,3,5,5,7,7-OCTAMETHYLCYCLOTETRASILAZANEBIS(DIMETHYLAMINO)DIPHENYLSILANETETRAPHENYLSILANEDIMETHYLCHLOROSILANE, 98%
TRIMETHYLSILANOL, tech-95
DIMETHYLSILANEDIOLETHYNYLTRIMETHYLSILANE, 98%

SIT7115.0
SIT8369.0
SIT7510.0
SIT7510.2
SIT7777.0
SIB1828.5
SIP6750.0
SIT8040.0
SIV9250.0
SID3412.0
SIE4894.0
SID3410.0
SIA0555.0
SIB1930.0
SIP6742.0
SIP6729.0
SIP6823.0
SIP6728.0
SIB0973.0
SIB0970.0
SIP6721.5
SID4559.0
SIP6739.0
SID4555.0
SIP6821.0
SIT8665.0
SIT8689.0
SIT8695.0
SIT7754.0
SIT7541.0
SIC2330.0
SID4145.0
SIH5846.0
SIH6165.0
SIO6712.5
SID4629.6
SIA0610.0
SIA0610.1
SIC2445.0
SIH5843.0
SIH6167.0
SIT8038.0
SIP6722.0
SID4560.0
SIM6515.0
SIM6515.1
Ref. Comp. 7
SIT8570.0
SIT8250.0
SIH6070.0
SIT7082.0
SIT8707.0
SIT8091.0
SID2653.0
SID3398.0
SIT8709.0
SIT8185.0
SIT8091.6
SIH6110.0
SIH6110.1
SIO6702.0
SIB1934.0
SIB1856.0
SIB1937.5
SIH6102.0
SIT8570.8
SIO6698.0
SIB1074.0
SIT7755.0
SID4070.0
SIT8570.3
Ref. Comp. 5
SIE4904.0

www.AZmax.co.jp

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Gelest, Inc.

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COMPOUNDS

56-33-7
75-54-7
75-76-3
75-76-3
75-77-4
75-77-4
75-78-5
75-78-5
75-79-6
75-79-6
75-94-5
76-86-8
78-07-9
78-08-0
78-10-4
78-10-4
78-62-6
80-10-4
80-10-4
80-43-3
98-12-4
98-13-5
107-37-9
107-46-0
107-46-0
107-51-7
107-52-8
107-72-2
112-04-9
112-04-9
115-21-9
115-82-2
124-70-9
126-80-7
133-14-2
141-57-1
141-62-8
141-63-9
144-79-6
149-74-6
287-55-8
291-27-0
312-40-3
353-66-2
358-60-1
358-67-8
368-47-8
373-74-0
379-50-0
400-53-3
409-21-2
420-56-4
429-60-7
429-67-4
455-17-4
512-63-0
540-97-6
541-02-6
541-05-9
541-05-9
542-91-6
546-44-1
546-45-2
546-45-2
546-56-5
546-56-5
556-67-2
558-63-4
562-90-3
592-09-6
597-52-4
597-67-1
617-86-7

Enabling Your Technology

CAS Number Catalog #SILICON

Name

O
O
F

CAS Number Catalog #429

CAS IndexName

1067-25-0
1067-43-2
1067-47-6
1067-53-4
1067-57-8
1068-69-5
1070-89-9
1070-89-9
1071-17-6
1071-21-2
1071-22-3
1071-27-8
1072-14-6
1072-54-4
1078-31-5
1078-96-2
1111-74-6
1112-39-6
1112-39-6
1112-48-7
1112-49-8
1112-54-5
1112-55-6
1112-66-9
1112-91-0
1113-12-8
1118-02-1
1125-26-4
1125-27-5
1145-98-8
1172-76-5
1174-72-7
1185-55-3
1185-55-3
1189-93-1
1190-16-5
1206-46-8
1223-16-1
1295-15-4
1302-52-9
1302-62-1
1302-76-7
1302-93-8
1318-93-0
1319-41-1
1332-58-7
1332-58-7
1332-58-7
1386-66-3
1438-79-5
1438-82-0
1450-14-2
1450-23-3
1450-29-9
1473-61-6
1481-41-0
1516-80-9
1529-17-5
1529-65-3
1558-25-4
1558-31-2
1558-33-4
1560-28-7
1586-73-8
1590-87-0
1591-02-2
1600-29-9
1624-01-7
1627-98-1
1628-11-1
1631-70-5
1631-82-9
1631-83-0

n-PROPYLTRIMETHOXYSILANETETRAALLYLOXYSILANE
3-CYANOPROPYLTRIETHOXYSILANEVINYLTRIS(2-METHOXYETHOXY)SILANE
n-BUTYLTRIMETHOXYSILANE
TRIS(TRIMETHYLSILYL)METHANESODIUM BIS(TRIMETHYLSILYL)AMIDE, 95%
SODIUM BIS(TRIMETHYLSILYL)AMIDE, 2M in tetrahydrofuran
BIS(CYANOPROPYL)DICHLOROSILANE
2-CYANOETHYLMETHYLDICHLOROSILANE
2-CYANOETHYLTRICHLOROSILANE
3-CYANOPROPYLTRICHLOROSILANEHEXYLSILANECYCLOTETRAMETHYLENEDIMETHYLSILANE
2-TRIMETHYLSILOXYBENZALDEHYDE
3-CYANOPROPYLPHENYLDICHLOROSILANEDIMETHYLSILANEDIMETHYLDIMETHOXYSILANE, 96%
DIMETHYLDIMETHOXYSILANE, 99+%
TRIETHYLBROMOSILANE
TRIETHYLIODOSILANEVINYLTRIETHYLSILANETETRAVINYLSILANETETRAALLYLSILANE
TRIALLYLMETHYLSILANE
DIALLYLDIMETHYLSILANE, 95%
TRIMETHYLSILYLISOCYANATE, 85%
VINYLPHENYLDIMETHYLSILANEPHENYLETHYLDICHLOROSILANE
1,2-DIPHENYLTETRAMETHYLDISILANE
1,2-DIMETHYL-1,1,2,2-TETRAPHENYLDISILANETETRAPHENOXYSILANE, tech-95
METHYLTRIMETHOXYSILANE
METHYLTRIMETHOXYSILANE, 99%
1,1,3,3,5,5-HEXAMETHYLTRISILOXANE
3-CYANOPROPYLMETHYLDICHLOROSILANEPENTAFLUOROPHENYLTRIMETHYLSILANE
BIS(p-AMINOPHENOXY)DIMETHYLSILANE
1,1’-BIS(DIMETHYLSILYL)FERROCENEBERYLGARNETKYANITEMULLITESODIUM MONTMORILLONITE CLAYMAGNESIUM MONTMORILLONATE
KAOLIN, calcined
KAOLIN, uncalcined
SILLIMANITEDIETHYLAMINODIMETHYLSILANE, 95%
VINYLPENTAMETHYLDISILOXANEPENTAMETHYLDISILOXANEHEXAMETHYLDISILANEHEXAPHENYLDISILANE
1,2-DIVINYLTETRAMETHYLDISILANE, 95%
1,2-BIS(TRIMETHYLSILYL)ETHYLENE, 90%(3,3,3-TRIFLUOROPROPYL)DIMETHYLCHLOROSILANE
TRIPHENYLETHOXYSILANE, tech-95
PHENOXYTRIMETHYLSILANE
1,3,5-TRIVINYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE, 95%
CHLOROMETHYLTRICHLOROSILANE(DICHLOROMETHYL)METHYLDICHLOROSILANE, tech-95
CHLOROMETHYLMETHYLDICHLOROSILANEPENTAMETHYLCHLORODISILANENONAMETHYLTRISILAZANEDISILANE, 99.9+%
DIMETHYLDI-n-BUTOXYSILANE
n-BUTYLSILANETETRAKIS(DIMETHYLAMINO)SILANE
1,1,3,3-TETRAMETHYL-1,3-DISILACYCLOBUTANE
3-CHLOROISOBUTYLMETHYLDICHLOROSILANEBENZYLDIMETHYLSILANEPHENYLMETHYLCHLOROSILANEDIPHENYLCHLOROSILANE, tech-95

PR

SIP6918.0
SIT7010.0
SIC2455.0
SIV9275.0
SIB1988.0
SIT8722.0
SIS6980.0
SIS6980.2
SIB1057.0
SIC2440.0
SIC2442.0
SIC2454.0
SIH6166.2
SIC2566.0
SIT8570.7
SIC2453.7
SID4230.0
SID4123.0
SID4123.1
SIT8210.0
SIT8290.0
SIV9116.0
SIT7897.0
SIT7020.0
SIT8060.0
SID2745.0
SIT8591.0
SIV9093.0
SIP6730.0
SID4584.0
SID4238.0
SIT7600.0
SIM6560.0
SIM6560.1
SIH6117.0
SIC2453.0
SIP6716.8
SIB1022.0
SIB1088.0
SIB0980.0
SIG5100.0
SIK6463.8
SIM6594.85
SIS6985.0
SIM6470.7
SIK6463.5
SIK6463.6
SIS6975.0
SID3395.3
SIV9090.0
SIP6719.0
SIH6109.0
SIH6155.0
SID4611.6
SIB1857.9
SIT8364.0
SIT8652.0
SIP6723.5
SIT8735.0
SIC2298.0
SID3362.0
SIC2290.0
SIP6717.5
SIN6597.9
SID4594.0
SID4080.0
SIB1974.5
SIT7276.0
SIT7538.0
SIC2279.0
SIB0964.0
SIP6737.0
SID4495.0

430

CAS Number Catalog #Name

1631-84-1
1719-53-5
1719-57-9
1719-58-0
1745-72-8
1747-56-4
1759-88-2
1760-24-3
1760-24-3
1777-03-3
1789-58-8
1795-31-9
1822-00-0
1825-58-7
1825-59-8
1825-61-2
1825-62-3
1825-63-4
1825-68-9
1829-40-9
1833-31-4
1833-51-8
1833-53-0
1871-21-2
1873-77-4
1873-88-7
1873-89-8
1873-92-3
1992-48-9
2004-14-0
2031-62-1
2031-67-6
2031-79-0
2039-96-5
2078-18-4
2083-91-2
2097-18-9
2116-84-9
2117-28-4
2157-45-1
2170-06-1
2170-08-3
2182-66-3
2212-08-0
2212-10-4
2212-11-5
2224-33-1
2227-29-4
2288-13-3
2290-62-2
2290-65-5
2295-06-9
2295-12-7
2295-17-2
2344-80-1
2344-83-4
2345-38-2
2351-33-9
2351-34-0
2362-10-9
2370-88-9
2370-88-9
2372-31-8
2374-14-3
2377-86-8
2401-73-2
2406-33-9
2406-34-0
2441-29-4
2469-55-8
2474-02-4
2487-90-3
2488-01-9

PHENYLDICHLOROSILANEDIETHYLDICHLOROSILANE
CHLOROMETHYLDIMETHYLCHLOROSILANEVINYLDIMETHYLCHLOROSILANEDIVINYLDICHLOROSILANE, 90%
1,3,5-TRIMETHYL-1,3,5-TRIETHOXY-1,3,5-TRISILACYCLOHEXANE
1,3-DISILAPROPANE
N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-95
N-(2-AMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 98%
ETHYNYLTRIETHYLSILANEETHYLDICHLOROSILANE
TRIS(TRIMETHYLSILYL)PHOSPHITE, 95%
TRIMETHYLSILYLMETHYLLITHIUM, 1M in hexane
PHENYLDIMETHYLETHOXYSILANEDIPHENYLMETHYLETHOXYSILANE
TRIMETHYLMETHOXYSILANE
TRIMETHYLETHOXYSILANE
TRIMETHYL-n-PROPOXYSILANEDIMETHYLMETHOXYCHLOROSILANE, 90%
HEXAPHENYLDISILOXANE, 95%
BENZYLDIMETHYLCHLOROSILANE(CHLOROMETHYL)DIMETHYLPHENYLSILANE
ISOPROPENOXYTRIMETHYLSILANE, 95%
TRIVINYLCHLOROSILANE, 95%
TRIS(TRIMETHYLSILYL)SILANE
BIS(TRIMETHYLSILOXY)METHYLSILANE
TRIS(TRIMETHYLSILOXY)SILANE
ALLYLMETHYLDICHLOROSILANE, 95%
TETRAISOPROPOXYSILANE
LITHIUM TRIMETHYLSILANOLATEMETHYLDIETHOXYSILANE
METHYLTRIETHOXYSILANEDIETHYLCYCLOSILOXANESTRIMETHYLSILYLPROPANESULFONIC ACID SODIUM SALT, monohydrate
PHENYLACETOXYTRIMETHYLSILANE(N,N-DIMETHYLAMINO)TRIMETHYLSILANEVINYLSILATRANE
PHENYLTRIS(TRIMETHYLSILOXY)SILANE
BIS(TRIMETHYLSILYL)METHANETETRAKIS(METHOXYETHOXY)SILANE, tech-95
PHENYLETHYNYLTRIMETHYLSILANE
BIS(PHENYLETHYNYL)DIMETHYLSILANEDIMETHYLDIACETOXYSILANE
CHLOROMETHYLMETHYLDIISOPROPOXYSILANE
CHLOROMETHYLMETHYLDIETHOXYSILANE
CHLOROMETHYLMETHYLDIMETHOXYSILANEVINYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95
DIISOPROPYLCHLOROSILANE
METHYLSILATRANE
TRIMETHYLSILYLMETHYLTRIMETHYLGERMANE
TRIMETHYLSILYLISOTHIOCYANATE
1,3-BIS(CHLORODIMETHYLSILYL)PROPANECYCLOTRIMETHYLENEDIMETHYLSILANE
1,3-DIETHYLTETRAMETHYLDISILOXANECHLOROMETHYLTRIMETHYLSILANE, 98%
3-CHLOROPROPYLTRIMETHYLSILANE
2-(TRIMETHYLSILYL)ACETIC ACIDCYCLOTRIMETHYLENEDICHLOROSILANECYCLOTRIMETHYLENEMETHYLCHLOROSILANE
1,3-BIS(CHLOROMETHYL)TETRAMETHYLDISILOXANE
1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE, 99+%
TRIVINYLSILANE, tech-95(3,3,3-TRIFLUOROPROPYL)METHYLCYCLOTRISILOXANETETRAKIS(TRIFLUOROACETOXY)SILANE, tech-95
1,3-DICHLOROTETRAMETHYLDISILOXANECYCLOTETRAMETHYLENEDICHLOROSILANECYCLOPENTAMETHYLENEDICHLOROSILANE
1-CHLOROVINYLTRIMETHYLSILANE
1,3-BIS(3-AMINOPROPYL)TETRAMETHYLDISILOXANE
1,7-DICHLOROOCTAMETHYLTETRASILOXANE, 95%
TRIMETHOXYSILANE, 95%
1,4-BIS(DIMETHYLSILYL)BENZENE

SIP6725.0
SID3402.0
SIC2285.0
SIV9070.0
SID4600.0
SIT8617.0
SID4595.0
SIA0591.0
SIA0591.1
SIE4902.0
SIE4890.0
SIT8723.6
SIT8593.5
SIP6728.4
SID4553.0
SIT8566.0
SIT8515.0
SIT8568.0
SID4210.0
SIH6161.0
SIB0962.0
SIC2287.0
SII6460.0
SIT8729.0
SIT8724.0
SIB1844.0
SIT8721.0
SIA0470.0
SIT7271.0
SIL6469.7
SIM6506.0
SIM6555.0
SID3399.0
SIT8599.0
SIP6723.6
SID3605.0
SIV9097.0
SIP6827.0
SIB1863.0
SIT7286.0
SIP6736.0
SIB1760.0
SID4076.0
SIC2293.0
SIC2292.0
SIC2293.2
SIV9280.0
SID3535.0
SIM6518.0
GET8595.5
SIT8592.0
SIB1048.2
SIC2570.0
SID3418.0
SIC2305.0
SIC2411.0
SIT8577.0
SIC2568.0
SIC2572.0
SIB1055.0
SIT7530.0
SIT7530.1
SIT8735.5
SIT8366.0
SIT7295.0
SID3372.0
SIC2564.0
SIC2524.0
SIC2432.0
SIB1024.0
SID3367.0
SIT8392.0
SIB1086.0

OOF

CAS Number Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

CAS Index

1,2-BIS(TRICHLOROSILYL)ETHANE, 95%
2-CYANOETHYLMETHYLDIMETHOXYSILANE
2-CYANOETHYLTRIMETHOXYSILANE(3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE(3- GLYCIDOXYPROPYL)TRIMETHOXYSILANE, 99+%
METHACRYLOXYPROPYLTRIMETHOXYSILANEMETHACRYLOXYPROPYLTRIMETHOXYSILANE, low inhibitor grade(N,N-DIMETHYL-3-AMINOPROPYL)TRIMETHOXYSILANE
3-CHLOROPROPYLTRIMETHOXYSILANEBENZYLTRIETHOXYSILANE
n-PROPYLTRIETHOXYSILANE
ALLYLTRIETHOXYSILANE
3-CHLOROPROPYLTRICHLOROSILANE
ALLYLTRIMETHOXYSILANEDIPHENYLDIETHOXYSILANE
1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
1,2,3,4,5,6 HEXAMETHYLCYCLOTRISILAZANE, tech-95
1,2,3,4,5,6,7,8-OCTAMETHYLCYCLOTETRASILAZANE, 95%(3-GLYCIDOXYPROPYL)TRIETHOXYSILANE
1,4-BIS(TRIETHOXYSILYL)BENZENE
1,3-DIVINYLTETRAMETHYLDISILOXANE
1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANE
3-CHLOROPROPYLDIPHENYLMETHYLSILANE, 95%
n-OCTYLMETHYLDIETHOXYSILANE
1,1,1-TRIETHYL-3,3,3-TRIMETHYLDISILOXANE
O-DL-a-TOCOPHEROLYLTRIMETHYLSILANE, tech-90
BIS(TRIMETHYLSILOXY)DICHLOROSILANE
TRIMETHYLSILOXYTRICHLOROSILANEACETOXYTRIMETHYLSILANE
1,4-BIS(HYDROXYDIMETHYLSILYL)BENZENE, tech-95
PENTYLTRIETHOXYSILANEVINYLTRIMETHOXYSILANEETHYLSILANE
TRIMETHYLBROMOSILANE
1,1,1,3,3,5,5-HEPTAMETHYLTRISILOXANE, 90%(3-GLYCIDOXYPROPYL)METHYLDIETHOXYSILANE
2-(TRIMETHYLSILYL)ETHANOLMETHYLTRIMETHYLSILYLACETATEBIS(CHLOROMETHYL)DIMETHYLSILANE
3-(TRIMETHYLSILYL)-1-PROPANOLACETOXYMETHYLTRIMETHYLSILANE
TRI-n-HEXYLSILANE
n-DECYLTRIETHOXYSILANE
n-OCTYLTRIETHOXYSILANEVINYLMETHYLDIACETOXYSILANE
3-TRIMETHYLSILYLPROPYNALPHENYLTRIMETHOXYSILANEPHENYLTRIMETHOXYSILANE, 99+%
PHENYLMETHYLDIMETHOXYSILANE
N-PHENYLAMINOPROPYLTRIMETHOXYSILANE
N-CYCLOHEXYLAMINOPROPYLTRIMETHOXYSILANEHEXYLTRIMETHOXYSILANE
DODECYLTRIMETHOXYSILANE
N-METHYLAMINOPROPYLTRIMETHOXYSILANE
N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIMETHOXYSILANE, tech-95
4-AMINOBUTYLTRIETHOXYSILANE, 95%
n-OCTYLTRIMETHOXYSILANE
n-OCTADECYLTRIMETHOXYSILANE, 95%(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)METHYLDICHLOROSILANE
CHLOROMETHYLDIMETHYLSILANE
3-AMINOPROPYLMETHYLDIETHOXYSILANE, 95%
HYDROXYMETHYLTRIMETHYLSILANE
1,1,3,3-TETRAMETHYLDISILOXANE, 98%
1,3-BIS(3-CARBOXYPROPYL)TETRAMETHYLDISILOXANE
1,2-BIS(METHYLDICHLOROSILYL)ETHANE
BIS(3-TRIMETHOXYSILYLPROPYL) FUMARATE, 96%
HEXAMETHYLDISILTHIANE
2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIMETHOXYSILANE
1,1,3,5,5-PENTAPHENYL-1,3,5-TRIMETHYLTRISILOXANETRIFLUOROPROPYLTRIS(DIMETHYLSILOXY)SILANETETRAISOCYANATOSILANE
METHYLTRI-n-HEXYLSILANEETHYLTRIMETHYLSILANEPR

SIB1810.0
SIC2441.0
SIC2446.0
SIG5840.0
SIG5840.1
SIM6487.4
SIM6487.4LI
SID3547.0
SIC2410.0
SIB0971.0
SIP6917.0
SIA0525.0
SIC2405.0
SIA0540.0
SID4525.0
SIT7900.0
SIH6103.0
SIO6699.0
SIG5839.0
SIB1816.6
SID4613.0
SID4608.0
SIC2342.0
SIO6712.2
SIT8339.0
SIT8015.0
SIB1837.0
SIT8572.6
SIA0110.0
SIB1135.0
SIP6720.2
SIV9220.0
SIE4898.0
SIT8430.0
SIH5844.0
SIG5832.0
SIT8589.2
SIM6571.5
SIB1051.0
SIT8602.0
SIA0060.0
SIT8376.0
SID2665.0
SIO6715.0
SIV9083.0
SIT8606.3
SIP6822.0
SIP6822.1
SIP6740.0
SIP6724.0
SIC2464.4
SIH6168.5
SID4635.0
SIM6500.0
SIA0589.0
SIA0587.0
SIO6715.5
SIO6645.0
SIH5840.6
SIC2289.0
SIA0605.0
SIH6177.0
SIT7546.0
SIB1027.0
SIB1614.0
SIB1834.5
SIH6116.0
SIE4670.0
SIP6719.5
SIT8372.4
SIT7125.0
SIM6559.0
SIE4901.5

Name3449-26-1
3449-28-3
3473-76-5
3510-72-3
3550-35-4
3555-47-3
3582-71-6
3582-72-7
3634-56-8
3634-67-1
3651-23-8
3682-26-6
3721-17-3
3728-43-6
3768-55-6
3768-56-7
3768-57-8
3768-58-9
3844-94-8
3901-77-7
3908-55-2
3937-28-8
3937-30-2
3944-18-1
3978-58-3
3982-82-9
3989-15-9
4028-23-3
4039-32-1
4039-32-1
4039-32-1
4040-74-8
4071-88-9
4095-09-4
4098-98-0
4099-46-1
4109-96-0
4109-96-0
4109-96-0
4109-96-0
4112-23-6
4130-08-9
4142-85-2
4170-46-1
4170-50-7
4206-67-1
4206-75-1
4211-29-4
4215-80-94253-34-3
4253-34-3
4325-85-3
4342-61-4
4353-77-9
4364-07-2
4364-10-7
4369-14-6
4387-16-0
4405-22-5
4420-74-0
4420-74-0
4451-96-1
4484-72-4
4518-94-9
4519-17-94525-44-4
4526-07-2
4551-15-9
4551-16-0
4619-08-3
4648-54-8
4667-38-3
4667-99-6

1,3-DIPHENYL-1,1,3,3-TETRAMETHYLDISILAZANE
DI-n-BUTYLDICHLOROSILANE
N-PHENYLAMINOMETHYLTRIETHOXYSILANE
METHYLTRI-n-OCTYLSILANE(N,N-DIMETHYLAMINO)TRIETHYLSILANETETRAKIS(TRIMETHYLSILOXY)SILANE
1,5-DICHLOROHEXAMETHYLTRISILOXANE, tech-95
1,3-DICHLORO-1,3-DIPHENYL-1,3-DIMETHYLDISILOXANE, 96%
ISOPROPYLDIMETHYLCHLOROSILANE
TRI-n-HEXYLCHLOROSILANE
DIALLYLDICHLOROSILANE
1,3-DIVINYLTETRAETHOXYDISILOXANE, 95%
TETRAKIS(TRIMETHYLSILYL)ALLENE, 95%
p-TOLYLTRIMETHYLSILANEANILINOTRIMETHYLSILANE(N-PIPERIDINO)TRIMETHYLSILANE
TRIS(DIMETHYLAMINO)METHYLSILANE
BIS(DIMETHYLAMINO)DIMETHYLSILANE
1-TRIMETHYLSILYL-1-HEXYNE
1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILOXANE(METHYLTHIO)TRIMETHYLSILANE
ALLYLDICHLOROSILANE
ALLYLDIMETHYLSILANE, 95%
1-VINYL-1-METHYLSILACYCLOPENTANE(METHACRYLOXYMETHYL)METHYLDIMETHOXYSILANE
1,1,5,5-TETRAPHENYL-1,3,3,5-TETRAMETHYLTRISILOXANE
2-[(TRIMETHYLSILYL)ETHYNYL]TOLUENE
ALLYLDIMETHYLCHLOROSILANE, 95%
LITHIUM HEXAMETHYLDISILAZIDELITHIUM HEXAMETHYLDISILAZIDE, 0.85M in hexane
LITHIUM HEXAMETHYLDISILAZIDE, 1.25M in tetrahydrofuran
CYCLOPENTAMETHYLENEDIMETHYLSILANEETHYL (2-TRIMETHYLSILYL)ACETATEMETHYLTRIBROMOSILANETETRAKIS(TRIMETHYLSILYL)SILANE
BIS(TRIMETHYLSILYL)SELENIDEDICHLOROSILANEDICHLOROSILANE, 99.9+%
DICHLOROSILANE, 25% in heptane
DICHLOROSILANE, 25% in xylene
DIMETHYLMETHYLENESILANEVINYLTRIACETOXYSILANE
BIS(TRICHLOROSILYL)METHANE
ISOPROPYLTRICHLOROSILANE
1,2-DIBROMOETHYLTRICHLOROSILANEIODOMETHYLTRIMETHYLSILANEPHENYLCHLOROSILANE
10-(CARBOMETHOXY)DECYLTRICHLOROSILANE
TRIPHENYLAMINOSILANE
METHYLTRIACETOXYSILANE, 95%
METHYLTRIACETOXYSILANE-ETHYLTRIACETOXYSILANE 80:20 Blend
TRIS(TRIMETHYLSILOXY)BORON
1,2-DICHLOROTETRAMETHYLDISILANE, 95%
TRIMETHYLSILYLCHLOROSULFONATE, 95%
1,4-DISILABUTANE
1,10-DISILADECANE(3-ACRYLOXYPROPYL)TRIMETHOXYSILANE, 96%
BIS(TRIMETHYLSILYL)BISPHENOL A
1,4-DIMETHYLDISILETHANE
3-MERCAPTOPROPYLTRIMETHOXYSILANE
3-MERCAPTOPROPYLTRIMETHOXYSILANE, 99+%
DIPHENYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
DODECYLTRICHLOROSILANE
n-PROPYLMETHYLDICHLOROSILANE
1,4-BIS(VINYLDIMETHYLSILYL)BENZENEETHYLMETHYLDICHLOROSILANE
BIS(TRIMETHYLSILYL)BUTADIYNEPHENYLTHIOTRIMETHYLSILANE
BIS(TRIMETHYLSILYL)TELLURIDE
1,3-DI-n-BUTYLTETRAMETHYLDISILOXANETRIMETHYLSILYL AZIDE, 96%
DIETHOXYDICHLOROSILANE, tech-90
TRIETHOXYCHLOROSILANE, tech-95

SID4586.0
SID3203.0
SIP6723.7
SIM6577.0
SID3603.0
SIT7298.0
SID3360.0
SID3358.0
SII6462.0
SIT8374.0
SID2742.0
SID4611.0
SIT7307.0
SIT8043.0
SIA0710.0
SIP6828.6
SIT8712.0
SIB1072.0
SIT8589.7
SIT8737.0
SIM6518.5
SIA0445.0
SIA0464.0
SIV9087.0
SIM6481.46
SIT7757.0
SIT8588.7
SIA0460.0
SIL6467.0
SIL6467.2
SIL6467.4
SIC2525.0
SIE4901.6
Ref. Comp. 8
SIT7308.0
SIB1871.0
SID3368.0
SID3368.1
SID3368.3
SID3368.6
Ref. Comp. 4
SIV9098.0
SIB1813.0
SII6463.3
SID2756.0
SII6450.0
SIP6724.98
SIC2067.6
SIT8628.0
SIM6519.0
SIM6519.2
SIT8718.0
SID3370.0
SIT8584.0
SID4593.0
SID4593.5
SIA0200.0
SIB1853.5
SID4235.0
SIM6476.0
SIM6476.1
SID4589.5
SID4630.0
SIP6912.0
SIB1878.4
SIE4896.0
SIB1854.0
SIP6770.0
SIB1873.0
SID3349.4
SIT8580.0
SID3393.0
SIT8178.0

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMPOUNDS

2504-64-5
2526-61-6
2526-62-7
2530-83-8
2530-83-8
2530-85-0
2530-85-0
2530-86-1
2530-87-2
2549-99-7
2550-02-9
2550-04-1
2550-06-3
2551-83-9
2553-19-7
2554-06-5
2587-46-4
2587-47-5
2602-34-8
2615-18-1
2627-95-4
2627-97-6
2632-97-5
2652-38-2
2652-41-7
2733-26-8
2750-44-9
2750-45-0
2754-27-0
2754-32-7
2761-24-2
2768-02-7
2814-79-1
2857-97-8
2895-07-0
2897-60-1
2916-68-9
2916-76-9
2917-46-6
2917-47-7
2917-65-9
2929-52-4
2943-73-9
2943-75-1
2944-70-9
2975-46-4
2996-92-1
2996-92-1
3027-21-2
3068-76-6
3068-78-8
3069-19-0
3069-21-4
3069-25-8
3069-29-2
3069-30-5
3069-40-7
3069-42-9
3102-79-2
3144-74-9
3179-76-8
3219-63-4
3277-26-7
3353-68-2
3353-69-3
3371-62-8
3385-94-2
3388-04-3
3390-61-2
3410-32-0
3410-77-3
3429-60-5
3439-38-1

Enabling Your Technology

CAS Number Catalog #SILICON

Name

O
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CAS Number Catalog #431

CAS IndexName

4669-59-4
4712-51-0
4766-57-8
4781-99-1
4840-75-9
4880-04-0
5021-93-2
5089-25-8
5089-28-1
5089-33-8
5089-70-3
5089-72-5
5157-75-5
5157-75-5
5162-63-0
5256-79-1
5272-18-4
5272-36-6
5283-66-9
5290-24-4
5290-29-9
5314-55-6
5356-83-2
5356-84-3
5356-85-4
5356-88-7
5505-72-6
5507-44-8
5565-32-2
5575-48-4
5577-70-8
5577-72-0
5578-42-7
5581-66-8
5582-62-7
5599-27-9
5630-83-1
5637-99-0
5683-30-7
5683-31-8
5796-98-5
5833-47-6
5851-07-0
5851-08-1
5894-60-0
5926-26-1
5926-35-2
5926-38-5
5930-98-3
5931-17-9
6166-86-5
6213-94-1
6224-91-5
6231-68-1
6233-20-1
6485-79-6
6485-81-0
6591-26-0
6651-34-9
6651-36-1
6651-43-0
6675-79-2
6689-19-6
6787-86-6
6834-92-0
6843-66-9
6852-04-6
6917-76-6
6999-19-5
7049-25-4
7087-21-0
7288-28-0
7291-09-0

BIS(DIETHYLAMINO)DIMETHYLSILANE
BIS(TRIMETHYLSILYLMETHYL)SULFIDETETRA-n-BUTOXYSILANE
n-BUTYLTRIETHOXYSILANE
TRIS(DIMETHYLAMINO)PHENYLSILANEMETHACRYLOXYPENTAMETHYLDISILOXANEDIETHYLDIETHOXYSILANE[2-(3-CYCLOHEXENYL)ETHYL]DIMETHYLCHLORO-SILANE
1,8-BIS(CHLORODIMETHYLSILYL)OCTANE, 95%
4-BROMO-N,N-BIS(TRIMETHYLSILYL)ANILINE
3-CHLOROPROPYLTRIETHOXYSILANE
N-(2-AMINOETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 95%
n-OCTADECYLMETHYLDICHLOROSILANE
n-OCTADECYLMETHYLDICHLOROSILANE
1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILAZANE, 95%
OCTAPHENYL-T8-SILSESQUIOXANEPHENYLDIMETHYLSILANOL
3-TRIMETHYLSILYLPROPARGYL ALCOHOL
n-OCTYLTRICHLOROSILANE
3-ACETOXYPROPYLMETHYLDICHLOROSILANE
TRIETHYLACETOXYSILANEETHYLTRIMETHOXYSILANEVINYLDIMETHYLETHOXYSILANEVINYLTRIS(TRIMETHYLSILOXY)SILANEVINYLMETHYLBIS(TRIMETHYLSILOXY)SILANEVINYLTRI-t-BUTOXYSILANE
1,3,5-TRIVINYL-1,3,5-TRIMETHYLCYCLOTRISILAZANE, 95%
VINYLMETHYLDIETHOXYSILANE
CHLOROTRIS(TRIMETHYLSILYL)SILANE, 95%
n-DECYLTRIMETHOXYSILANE(METHACRYLOXYMETHYL)DIMETHYLETHOXYSILANEMETHACRYLOXYMETHYLTRIETHOXYSILANECYCLOHEXYLMETHYLDICHLOROSILANE
METHYLTRI-n-PROPOXYSILANE
PROPARGYLOXYTRIMETHYLSILANEDIMESITYLDICHLOROSILANEACETOXYMETHYLTRIETHOXYSILANE
1,3,5-TRISILAPENTANE
3-TRIMETHYLSILYLPROPIONIC ACID
3-TRIMETHYLSILYLPROPYNOIC ACID
BIS(TRIMETHYLSILYL)PEROXIDE
1,1-DIMETHYL-1-SILA-2-OXACYCLOHEXANE, 96%
HEXAMETHOXYDISILANE, tech-95
HEXAETHOXYDISILANE, tech-95
HEXADECYLTRICHLOROSILANE, 95%
CHLOROMETHYLTRIMETHOXYSILANE
BIS(TRIMETHYLSILYL)METHYL CHLORIDE(DICHLOROMETHYL)TRIMETHYLSILANE, tech-95
4-TRIMETHYLSILYLBUT-3-YN-2-ONE
1,3-BIS(4-HYDROXYBUTYL)TETRAMETHYLDISILOXANE, 95%
1,3,5,7,9-PENTAMETHYLCYCLOPENTASILOXANE, 90%
VINYLOXYTRIMETHYLSILANE
1-TRIMETHYLSILYLPROPYNE
1,2-BIS(PENTAMETHYLDISILOXANYL)ETHANE
2-CHLOROETHYLTRICHLOROSILANE, 95%
TRIISOPROPYLSILANE, 98%
TRIISOBUTYLSILANE
N-(DICHLOROBORYL)HEXAMETHYLDISILAZANE
2-METHYL-1-(TRIMETHYLSILOXY)-1-PROPENE(CYCLOHEXENYLOXY)TRIMETHYLSILANE
1-(TRIMETHYLSILOXY)-1,3-BUTADIENETRIISOPROPOXYSILANE, 95%
3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE, tech-95
1,3-DISILABUTANESODIUM METASILICATEDIPHENYLDIMETHOXYSILANE, 98%
DI-t-BUTOXYDIMETHOXYSILANE, tech-95
ETHYLDIMETHYLCHLOROSILANE
1-TRIMETHYLSILYLBUT-1-YNE-3-OL
1-SILA-3-CYCLOPENTENE, tech-95
ALLYLTRIS(TRIMETHYLSILOXY)SILANE
O,O’-BIS(TRIMETHYLSILYL)THYMINE
VINYLSILANECAS Number Catalog #PR

SIB1068.0
SIB1867.0
SIT7062.0
SIB1986.0
SIT8713.0
SIM6486.14
SID3404.0
SIC2457.0
SIB1048.0
SIB1879.0
SIC2407.0
SIA0590.5
SIO6625.0
SIO6625.1
SIT7899.0
SIO6705.5
SIP6729.2
SIT8604.0
SIO6713.0
SIA0090.0
SIT8195.0
SIE4901.4
SIV9072.0
SIV9300.0
SIV9082.0
SIV9099.0
SIT8736.0
SIV9085.0
SIC2420.0
SID2670.0
SIM6481.3
SIM6482.0
SIC2468.0
SIM6579.0
SIP6903.0
SID3540.0
SIA0050.0
SIT8709.8
SIT8606.0
SIT8606.6
SIB1868.0
SID4234.0
SIH6101.0
SIH5935.0
SIH5920.0
SIC2298.6
SIB1864.0
SID3366.0
SIT8583.2
SIB1130.0
SIP6718.0
SIV9089.0
SIT8606.5
SIB1735.0
SIC2270.0
SIT8385.0
SIT8378.7
SID3354.0
SIM6571.0
SIC2462.0
SIT8571.0
SIT8379.0
SIT8662.0
SID4592.0
SIS6982.0
SID4535.0
SID2792.0
SIE4892.0
SIT8583.0
SIS6951.0
SIA0585.0
SIB1873.4
SIV9096.7

432

7325-84-0
7351-61-3
7379-79-5
7381-30-8
7399-00-0
7418-19-1
7418-20-4
7422-52-8
7439-93-2
7440-21-3
7440-21-3
7440-21-3
7440-21-3
7453-26-1
7521-80-4
7522-27-2
7538-44-5
7631-86-9
7631-86-9
7631-86-9
7631-86-9
7631-86-9
7631-86-9
7631-86-9
7631-86-9
7646-75-5
7671-19-4
7677-24-9
7677-24-9
7688-51-9
7691-02-3
7719-02-0
7719-03-1
7751-38-4
7756-87-8
7783-26-8
7783-29-1
7783-61-1
7783-61-1
7787-82-8
7787-85-1
7787-87-3
7787-93-1
7789-66-4
7803-62-5
7803-62-5
7803-62-5
8049-17-0
10025-78-2
10025-78-2
10025-78-2
10026-04-7
10026-04-7
10090-05-8
10097-28-6
10099-76-0
10101-52-7
10102-24-6
10124-62-6
10137-69-6
10196-49-3
10217-34-2
10256-83-4
10416-59-8
10497-05-910519-87-6
10519-88-7
10519-96-7
10519-96-7
10519-97-8
10557-71-8
10605-40-0
12001-26-2

Name

SID4621.0
DOCOSYLTRICHLOROSILANE, blend
SIM6487.2
METHACRYLOXYPROPYLTRICHLOROSILANE, tech-95
Ref. Comp. 11 TRIMETHYLAMINOSILANE
SIB1840.0
1,2-BIS(TRIMETHYLSILOXY)ETHANE
SIO6642.0
n-OCTADECYLTRIETHOXYSILANE, 95%
SIT7536.0
2,2,5,5-TETRAMETHYL-2,5-DISILA-1-AZACYCLOPENTANE, 95%
SIT7540.0
2,2,5,5-TETRAMETHYL-2,5-DISILA-1-OXACYCLOPENTANE
SIG5820.0(3-GLYCIDOXYPROPYL)BIS(TRIMETHYLSILOXY)METHYLSILANE
SIL6465.0
LEPIDOLITE
SIS6955.0
SILICON, 99% powder
W-SI-76-0.4 SILICON WAFER
W-SIN-76-0.4 SILICON WAFER
W-SIP-76-0.4 SILICON WAFER
SIT7753.0
1,1,3,3-TETRAPHENYL-1,3-DIMETHYLDISILAZANE
SIB1982.0
n-BUTYLTRICHLOROSILANE
SIC2264.8
3-CHLORO-N,N-BIS(TRIMETHYLSILYL)ANILINE
SIB1140.0
N,N-BIS(2-HYDROXYETHYL)-3-AMINOPROPYLTRIETHOXYSILANE, 62% in ethanol
SIS6961.0
SILICON DIOXIDE, amorphous, OCTAMETHYLCYCLOTETRASILOXANE TREATED
SIS6962.0
SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SIS6962.1M30 SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SIS6963.2
SILICON DIOXIDE, amorphous GEL, 15% in water
SIS6963.4
SILICON DIOXIDE, amorphous GEL, 40% in water
SIS6964.0
SILICON DIOXIDE, crystalline
SIS6966.0
SILICON DIOXIDE, precipitated
W-SIO-76-03 SILICON DIOXIDE WAFER
SIS6986.1
SODIUM PHENYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
SIB1843.0
BIS(TRIMETHYLSILOXY)METHYLMETHOXYSILANE
SIT8585.0
TRIMETHYLSILYLCYANIDE
SIT8585.1
TRIMETHYLSILYLCYANIDE, 99%
SIB1852.7
N,N-BIS(TRIMETHYLSILYL)ALLYLAMINE
SID4612.0
1,3-DIVINYL-1,1,3,3-TETRAMETHYLDISILAZANE
SIV9092.0
VINYLPHENYLDICHLOROSILANE
SIA0486.0
ALLYLPHENYLDICHLOROSILANE, 95%
SID3537.0
DIISOPROPYLDICHLOROSILANE
SID3374.0
1,3-DICHLOROTETRAPHENYLDISILOXANE
SIT8709.6
TRISILANE
SIT7880.0
n-TETRASILANE
SIT7120.0
TETRAFLUOROSILANE
SIT7120.1
TETRAFLUOROSILANE, 99.99+%
SIC2269.0
1-CHLOROETHYLTRICHLOROSILANE, tech-95
SIC2267.0
2-CHLOROETHYLMETHYLDICHLOROSILANE
SIC2275.0
1-CHLOROETHYLTRIMETHYLSILANE, 96%
SIC2350.0
3-CHLOROPROPYLMETHYLDICHLOROSILANE
SIT7050.0
TETRABROMOSILANE
Ref. Comp. 9 SILANE
SIS6950.1
SILANE, 7.0 - 7.5% in argon
SIS6950.4
SILANE, 7.0 - 7.5% in nitrogen
SIF4910.0
FERROSILICON
SIT8155.0
TRICHLOROSILANE, 99%
SIT8155.1
TRICHLOROSILANE, 99.9+%
SIT8155.3
TRICHLOROSILANE, 2M (28-29%) in xylene
SIT7085.0
TETRACHLOROSILANE, 98%
SIT7085.1
TETRACHLOROSILANE, 99.99%
SIT8593.0
TRIMETHYLSILYL METHANESULFONATESIS6970.0
SILICON MONOXIDEPBL6300
LEAD MONOSILICATESIZ9850.0
ZIRCONIUM SILICATESIL6469.0
LITHIUM METASILICATESID3544.6
1,2-DIMETHOXYTETRAMETHYLDISILANE
SIC2464.0
3-CYCLOHEXENYLTRICHLOROSILANE
SIT8567.0
2,2,4-TRIMETHYL-1-OXA-4-AZA-2-SILACYCLOHEXANE
SIE4668.0
2-(3,4-EPOXYCYCLOHEXYL)ETHYLTRIETHOXYSILANE
SIT7888.0
TETRA-p-TOLYLSILANE
SIB1846.0
N,O-BIS(TRIMETHYLSILYL)ACETAMIDE
SIT8723.0
TRIS(TRIMETHYLSILYL)PHOSPHATESID4606.0
DIVINYLDIMETHYLSILANE
SID2749.0
DIALLYLDIPHENYLSILANE, 95%
SIP6901.0
POTASSIUM TRIMETHYLSILANOLATE, tech-95
SIP6901.2
POTASSIUM TRIMETHYLSILANOLATE, 2M in tetrahydrofuran
SIA0402.0
ALLYLAMINOTRIMETHYLSILANE, 96%
SIC2334.0
p-CHLOROPHENYLTRIMETHYLSILANE
SIC2336.0
3-CHLOROPROPYLDIMETHYLCHLOROSILANE
SIM6594.9
MUSCOVITEOOFCAS Number Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

CAS Index

SILICON HEXABORIDECALCIUM SILICIDE, tech-95, powder
TUNGSTOSILICIC ACID hydrate
SILICON NITRIDE, powder
NIOBIUM DISILICIDE, 99+%
TANTALUM SILICIDE, 99.9+%
TITANIUM SILICIDE, 95%, powder
TUNGSTEN SILICIDEZIRCONIUM SILICIDE, powder, 99%
SPODUMENEMOLYBDENUM DISILICIDE, 99+%
COPPER SILICIDE
n-BUTYL-1,1,3,3-TETRAMETHYLDISILOXANEFELDSPAR-POTASSIUM
CLINOPTILOLITE
MOLECULAR SIEVES, 13X, powder
HECTORITEATTAPULGITESTAUROLITEPHLOGOPITEZEOLITE-CHABAZITEPYROPHYLLITE
HALLOYSITEZEOLITE-MORDENITE
LITHIUM POLYSILICATE, 20% in watert-BUTOXYTRIMETHYLSILANE
1,6-BIS(TRICHLOROSILYL)HEXANEVINYLDIPHENYLMETHYLSILANETRIISOPROPYLCHLOROSILANETRIISOBUTYLCHLOROSILANE
DI-t-BUTOXYDIACETOXYSILANE, tech-96
DI-t-BUTOXYDIACETOXYSILANE, 98%
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 1.0M in diethyl ether
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 3M in methyltetrahydrofuran
1,4-BIS(TRIMETHYLSILYL)BENZENE
2-TRIMETHYLSILOXYPENT-2-ENE-4-ONE
3,5-DIPHENYLOCTAMETHYLTETRASILOXANE, 95%
TRIS(DIMETHYLAMINO)CHLOROSILANE, 95%
BIS[(p-DIMETHYLSILYL)PHENYL]ETHER, 96%
N-(TRIMETHYLSILYL)MORPHOLINEBIS(DIMETHYLAMINO)VINYLMETHYLSILANEMAGNESIUM SILICATE, hydrous
3-MERCAPTOPROPYLTRIMETHYLSILANE
2-TRIMETHYLSILYL-1,3-DITHIANE
2,2-BIS(TRIMETHYLSILYL)-1,3-DITHIANE
ACETYLTRIMETHYLSILANE
N-(TRIMETHYLSILYL)ACETAMIDELITHIUM ORTHOSILICATE, tech-95
TRIFLUOROSILANE, 50-75%
HEXACHLORODISILANEHEXACHLORODISILANE, 99.9%
CHLOROSILANE, 95%
TETRAIODOSILANESODIUM ORTHOSILICATE, tech-90
BIS(3-TRIETHOXYSILYLPROPYL)AMINE, 95%
2-CHLOROETHYLMETHYLDIMETHOXYSILANE
CHLOROMETHYLDIMETHYLETHOXYSILANE
3-CHLOROPROPYLDIMETHYLETHOXYSILANE
2-TRIMETHYLSILYL-1,2,3-TRIAZOLE
1,2-BIS(CHLORODIMETHYLSILYL)ETHANEOCTACHLOROTRISILANE, tech-95
ISOTETRASILANEIODOSILANE(2-METHYL-2-PHENYLETHYL)METHYLDICHLOROSILANE(3-PHENYLPROPYL)TRICHLOROSILANEPENTYLMETHYLDICHLOROSILANE
1-BROMOVINYLTRIMETHYLSILANEACRYLOXYTRIMETHYLSILANEMETHACRYLOXYTRIMETHYLSILANE(p-CHLOROMETHYL)PHENYLTRICHLOROSILANE, 95%
1,1,1,5,5,5-HEXAETHYL-3-METHYLTRISILOXANEMETHACRYLOXYPROPYLDIMETHYLETHOXYSILANE, 95%(3-ACRYLOXYPROPYL)METHYLDIMETHOXYSILANE, 95%

PR

SIS6968.0
SIC2054.0
SIT8780.0
SIS6972.0
SIN6597.2
SIT6996.0
SIT8005.0
SIT8787.0
SIZ9860.0
SIS6988.5
SIM6594.8
SIC2435.0
SIB1977.0
SIF4906.0
SIC2433.0
SIM6594.7
SIH5840.2
SIA0760.0
SIS6988.6
SIP6827.7
SIZ9692.0
SIP6943.0
SIH5840.15
SIZ9696.0
SIL6469.5
SIB1932.0
SIB1812.0
SIV9076.5
SIT8384.0
SIT8378.6
SID2790.0
SID2790.1
SIT8594.0
SIT8594.1
SIB1853.0
SIT8572.0
SID4556.0
SIT8711.0
SIB1090.0
SIT8596.0
SIB1080.0
SIM6471.0
SIM6479.0
SIT8589.0
SIB1857.7
SIA0130.0
SIT8575.0
SIL6469.2
SIT8373.0
SIH5905.0
SIH5905.1
SIC2414.0
SIT7123.0
SIS6986.0
SIB1824.5
SIC2268.0
SIC2286.0
SIC2337.0
SIT8612.9
SIB1042.0
SIO6601.0
SII6463.4
Ref. Comp. 6
SIM6512.5
SIP6744.6
SIP6719.9
SIB1910.0
SIA0320.0
SIM6491.0
SIC2296.0
SIH6074.0
SIM6486.4
SIA0198.0

Name13735-81-4
13737-04-7
13759-10-9
13760-02-6
13822-56-5
13829-21-5
13862-16-3
13883-39-1
13983-17-0
14031-97-1
14031-97-1
14319-64-3
14513-34-914579-03-4
14579-90-9
14606-42-9
14630-40-1
14642-79-6
14697-86-0
14704-14-4
14760-26-0
14781-45-4
14799-66-7
14799-93-0
14799-94-1
14814-09-6
14857-34-2
14857-35-3
14867-28-8
14986-21-1
15078-96-3
15097-49-1
15112-89-7
15112-89-7
15129-36-9
15180-47-9
15267-95-5
15332-99-7
15396-00-6
15538-93-9
15573-38-3
15573-39-4
15719-56-9
15721-05-8
15901-40-3
15933-59-2
15947-57-6
15948-19-3
15983-86-5
15990-66-6
16029-98-4
16045-78-6
16066-09-4
16066-10-7
16068-37-4
16116-78-2
16205-84-8
16230-35-6
16415-12-6
16415-13-7
16532-02-8
16589-43-8
16687-12-0
16709-86-7
16753-62-1
16871-90-2
16881-77-9
16893-85-9
16919-19-0
16949-65-8
16961-83-4
17043-05-9
17043-05-9

1-PHENYL-1-TRIMETHYLSILOXYETHYLENE
2-PYRIDYLTRIMETHYLSILANE
SILICON DISULFIDE, 95%
DIIODOSILANE, 95%
3-AMINOPROPYLTRIMETHOXYSILANE
n-DECYLTRICHLOROSILANETRISILYLAMINE
3-BROMOPROPYLTRICHLOROSILANECALCIUM METASILICATE
10-UNDECENYLOXYTRIMETHYLSILANE
11-UNDECENYLOXYUNDECYLTRICHLOROSILANE(5-BICYCLO[2.2.1]HEPT-2-ENYL)TRICHLOROSILANEMETHACRYLOXYPROPYLMETHYLDIMETHOXYSILANE, 95%
CYCLOPENTYLTRICHLOROSILANE
1,3-DI-n-PROPYL-1,1,3,3-TETRAMETHYLDISILAZANE
TRIPHENYLSILANETHIOLBIS(TRIMETHYLSILYL)ACETYLENEBENZYLOXYTRIMETHYLSILANEACETOXYHEPTAMETHYLCYCLOTETRASILOXANEMETHOXYMETHYLTRIMETHYLSILANE
ZINC BIS(HEXAMETHYLDISILAZIDE)
COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX
1,6-BIS(CHLORODIMETHYLSILYL)HEXANE, 95%
n-OCTYLMETHYLDICHLOROSILANEHEXYLMETHYLDICHLOROSILANE
3-MERCAPTOPROPYLTRIETHOXYSILANE, 95%
DIMETHYLETHOXYSILANE
2-(3,4-EPOXYCYCLOHEXYL)ETHYLMETHYLDIETHOXYSILANE
3-IODOPROPYLTRIMETHOXYSILANEHEXACHLORODISILOXANE, 95%
GARNET
1-TRIMETHYLSILYLPYRROLIDINE, 95%
TRIS(DIMETHYLAMINO)SILANE
TRIS(DIMETHYLAMINO)SILANE, 99.9+%N-(6-AMINOHEXYL)AMINOMETHYLTRIETHOXYSILANE, 95%(N,N-DIETHYLAMINOMETHYL)TRIETHOXYSILANE
CHLOROMETHYLTRIETHOXYSILANEVINYLTRIISOPROPENOXYSILANE, tech-95
3-ISOCYANOTOPROPYLTRIMETHOXYSILANE, 95%(3-HEPTAFLUOROISOPROPOXY)PROPYLTRICHLOROSILANE
TRIS(TRIMETHYLSILYL)PHOSPHINE, 10% in hexane
BIS(TRIMETHYLSILYL)PHOSPHINE
1-HEPTYNYLTRIMETHYLSILANEHEPTAMETHYLCYCLOTETRASILOXANE, tech-95
TRIS(CYCLOHEXYLAMINO)METHYLSILANE, tech-95
1,1,3,3-TETRAMETHYLDISILAZANE
NEOPENTASILANE
1,3-DIVINYL-1,3-DIMETHYL-1,3-DICHLORODISILOXANE
3-BUTENYLMETHYLDICHLOROSILANETETRAKIS(TRIMETHYLSILOXY)TITANIUM
TRIMETHYLIODOSILANE
1,1,3,3-TETRAVINYLDIMETHYLDISILOXANE, 95%
1,3-BIS(TRIMETHYLSILOXY)-1,3-DIMETHYLDISILOXANE, 95%
1,3,5,7-TETRAETHYLCYCLOTETRASILOXANE, 95%
1,2-BIS(TRIETHOXYSILYL)ETHANE(4-BROMOPHENYLETHYNYL)TRIMETHYLSILANEETHYL 3-(TRIMETHYLSILYL)PROPYNOATEBIS(N-METHYLBENZAMIDO)ETHOXYMETHYLSILANE, tech-90
HEXADECYLTRIMETHOXYSILANE, 95%
HEXADECYLTRIETHOXYSILANE, 95%
BROMOMETHYLDIMETHYLCHLOROSILANESODIUM METHYLSILICONATE, 30% in water
TRIMETHYLSILYL PERRHENATEVINYL(CHLOROMETHYL)DIMETHYLSILANEVINYLMETHYLDIMETHOXYSILANEPOTASSIUM HEXAFLUOROSILICATEMETHYLDIMETHOXYSILANESODIUM HEXAFLUOROSILICATEAMMONIUM HEXAFLUOROSILICATEMAGNESIUM HEXAFLUOROSILICATEFLUOROSILICIC ACID, 22-25% in water
BROMOPHENYLTRIMETHOXYSILANE
p-BROMOPHENYLTRIMETHOXYSILANE

SIP6824.0
SIP6942.0
SIS6967.0
SID3520.0
SIA0611.0
SID2663.0
SIT8715.8
SIB1905.0
SIC2050.0
SIU9049.2
SIU9049.4
SIB0991.0
SIM6486.9
SIC2555.0
SID4591.0
SIT8690.0
SIB1850.0
SIB0968.0
SIA0038.0
SIM6492.0
SIZ9700.0
AKC252.8
SIB1046.0
SIO6712.0
SIH6165.6
SIM6475.0
SID4125.0
SIE4666.0
SII6452.0
SIH5910.0
SIG5105.0
SIT8609.0
SIT8714.0
SIT8714.1
SIA0592.6
SID3395.4
SIC2298.4
SIV9209.0
SII6456.0
SIH5842.0
SIT8723.4
SIB1868.6
SIH5848.0
SIH5842.5
SIT8710.0
SIT7542.0
SIN6597.07
SID4604.0
SIB1926.0
SIT7305.0
SIT8564.0
SIT7896.0
SIB1838.0
SIT7112.0
SIB1817.0
SIB1899.0
SIE4901.8
SIB1610.0
SIH5925.0
SIH5922.0
SIB1890.0
SIS6984.0
SIT8598.0
SIV9065.0
SIV9086.0
SIP6885.0
SIM6508.0
SIS6981.0
SIA0705.0
SIM6470.5
SIF4920.0
SIB1904.0
SIB1904.3

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COMPOUNDS

12008-29-6
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12033-89-5
12034-80-9
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12039-83-7
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12039-90-6
12068-40-5
12136-78-6
12159-07-8
12163-51-2
12168-80-8
12173-10-3
12173-28-3
12173-47-6
12174-11-7
12182-56-8
12251-00-2
12251-32-0
12269-78-2
12298-43-0
12445-20-4
12627-14-4
13058-24-7
13083-94-8
13107-13-6
13154-24-0
13154-25-1
13170-23-5
13170-23-5
13170-43-9
13170-43-913183-70-5
13257-81-3
13270-97-8
13307-05-6
13315-17-8
13368-42-8
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13376-74-4
13399-93-4
13411-42-2
13411-46-6
13411-48-813435-12-6
13453-84-4
13465-71-913465-77-5
13465-77-5
13465-78-6
13465-84-4
13472-30-5
13497-18-2
13508-51-5
13508-53-7
13508-63-9
13518-80-4
13528-93-3
13596-23-1
13597-87-0
13598-42-0
13617-28-2
13617-40-8
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13683-41-5
13688-55-6
13688-56-7
13688-90-913716-38-6
13731-98-1
13732-00-8

Enabling Your Technology

CAS Number Catalog #SILICON

Name

O
O
F

CAS Number Catalog #433

CAS Number Catalog #434

CAS Number Catalog #Name

17980-47-1
17980-64-2
17985-72-7
17988-79-3
17995-04-9
17998-59-3
18001-60-0
18001-97-3
18023-33-1
18027-10-6
18027-45-7
18027-80-0
18035-33-1
18035-74-0
18037-10-0
18038-55-6
18042-54-1
18043-71-5
18043-74-8
18044-09-2
18044-44-5
18048-06-1
18051-88-2
18052-07-8
18052-76-1
18052-92-1
18053-74-2
18056-97-8
18077-31-1
18077-42-4
18081-42-0
18089-94-6
18098-86-7
18105-31-2
18105-64-1
18107-18-1
18107-18-1
18132-63-3
18132-72-4
18142-37-5
18145-83-0
18145-84-1
18146-00-4
18146-08-2
18147-09-6
18147-18-7
18147-23-4
18147-35-8
18147-81-4
18147-84-7
18151-32-1
18151-53-6
18151-85-4
18156-15-5
18156-25-7
18156-74-6
18157-31-8
18159-55-2
18162-48-6
18162-48-6
18162-48-6
18162-48-6
18162-82-8
18162-84-0
18163-07-0
18163-34-3
18163-42-3
18163-47-8
18165-19-0
18166-02-4
18166-37-5
18166-40-0
18166-43-3

ISOBUTYLTRIETHOXYSILANE, 98%
METHYLTRIS(METHOXYETHOXY)SILANE
1,2-BIS(DIMETHYLSILYL)BENZENE
3,5-BIS(CHLOROMETHYL)OCTAMETHYLTETRASILOXANE, 95%
N-6,9-BIS(TRIMETHYLSILYL)ADENINE(1-NAPHTHYLMETHYL)TRICHLOROSILANE
1,1,3,3-TETRAETHOXY-1,3-DIMETHYLDISILOXANE, 95%
1,3-BIS(HYDROXYPROPYL)TETRAMETHYLDISILOXANE, 95%
VINYLTRIISOPROPOXYSILANESODIUM TRIMETHYLSILANOLATE, 96%
PHENYLTRIS(DIMETHYLSILOXY)SILANE
1,3-BIS(CYANOPROPYL)TETRAMETHYLDISILOXANE, 95%
6-PHENYLHEXYLTRICHLOROSILANEDICYCLOHEXYLDICHLOROSILANE
BIS(TRIMETHYLSILYL)CYTOSINEBIS(TRICHLOROSILYL)ACETYLENEPHENYLTRIACETOXYSILANE, tech-90
1,1,3,3-TETRAISOPROPYLDISILOXANE
1,2-BIS(METHYLDIETHOXYSILYL)ETHANE
3-(3-ACETOXYPROPYL)HEPTAMETHYLTRISILOXANE(3-GLYCIDOXYPROPYL)PENTAMETHYLDISILOXANE(2-DIETHYLPHOSPHATOETHYL)METHYLDIETHOXYSILANE, tech-95
n-DECYLMETHYLDICHLOROSILANE
UNDECYLTRICHLOROSILANE
1-NAPHTHYLTRIMETHOXYSILANE(METHACRYLOXYMETHYL)PHENYLDIMETHYLSILANE
DI(CYCLOPENTADIENYL)DIMETHYLSILANE
4-BIPHENYLYLTRIETHOXYSILANE
3-CHLOROPROPYLTRIS(TRIMETHYLSILOXY)SILANE
TRIS(TRIMETHYLSILYLMETHYL)PHOSPHINEBIS(DICHLOROSILYL)METHANE, tech-95(DIPHENYLMETHYL)TRICHLOROSILANE
3-(TRICHLOROSILYL)PROPYLCHLOROFORMATEBIS(TRIMETHYLSILYL) ADIPATE
TRI-t-BUTOXYCHLOROSILANE, 95%
TRIMETHYLSILYLDIAZOMETHANE, 2.0M in hexanes
TRIMETHYLSILYLDIAZOMETHANE, 2M in diethyl ether
DI-n-BUTYLDIMETHOXYSILANE
1,3-BIS(3-CHLOROPROPYL)TETRAMETHYLDISILOXANE
1-PROPENYLMETHYLDICHLOROSILANE, 95%
3-CHLOROISOBUTYLDIMETHYLCHLOROSILANE
4-CHLOROBUTYLDIMETHYLCHLOROSILANE
ALLYLOXYTRIMETHYLSILANE
1,2-DIBROMOETHYLTRIMETHYLSILANE, 95%
METHYL N-TRIMETHYLSILYLCARBAMATE
t-BUTYLMETHYLDICHLOROSILANE
n-BUTYLMETHYLDICHLOROSILANE
ALLYLDIMETHOXYSILANE
2-(CARBOMETHOXY)ETHYLTRICHLOROSILANE, tech 95
2-(CHLOROMETHYL)ALLYLTRICHLOROSILANE
2-CYANOETHYLTRIMETHYLSILANETHEXYLTRICHLOROSILANEMETHACRYLOXYPROPYLPENTAMETHYLDISILOXANE, 95%
3-CYANOPROPYLDIMETHYLCHLOROSILANE
BIS(TRIMETHYLSILYL)SULFUR DIIMIDE, 95%
N-(TRIMETHYLSILYL)IMIDAZOLE
3-CHLOROPROPYLDIMETHYLSILANE
TRI-t-BUTYLSILANE, 95%
t-BUTYLDIMETHYLCHLOROSILANE
t-BUTYLDIMETHYLCHLOROSILANE, 1.0M in methylene chloride
t-BUTYLDIMETHYLCHLOROSILANE, 3M in tetrahydrofurant-BUTYLDIMETHYLCHLOROSILANE, 2.85M in toluene, 48-52% solution
CHLOROMETHYLTRIISOPROPOXYSILANE
n-OCTYLDIMETHYLCHLOROSILANE
2-PROPENYLTRIMETHYLSILANE, 95%
ACETOXYETHYLMETHYLDICHLOROSILANE
2-(CARBOMETHOXY)ETHYLMETHYLDICHLOROSILANE, tech-95
1-IODO-2-(TRIMETHYLSILYL)ACETYLENE
2-CHLOROETHYLSILANE
AMINOMETHYLTRIMETHYLSILANEHEXYLTRIETHOXYSILANE(METHACRYLOXYMETHYL)BIS(TRIMETHYLSILOXY)METHYLSILANE, 95%
TRI-t-BUTOXYSILANOLSII6453.5
SIM6585.0
SIB1084.0
SIB1053.5
SIB1852.3
SIN6596.0
SIT7095.0
SIB1145.0
SIV9210.0
SIS6988.0
SIP6826.0
SIB1058.0
SIP6736.4
SID3382.0
SIB1857.0
SIB1805.0
SIP6790.0
SIT7274.0
SIB1615.0
SIA0088.0
SIG5838.0
SID3411.0
SID2662.0
SIU9050.0
SIN6597.0
SIM6481.5
SID3388.0
SIB0999.5
SIC2413.0
SIT8722.7
SIB1064.0
SID4555.5
SIT8163.0
SIB1852.6
SIT8085.0
SIT8588.0
SIT8588.3
SID3214.0
SIB1056.0
SIP6904.0
SIC2277.0
SIC2265.0
SIA0480.0
SID2758.0
SIM6574.0
SIB1972.2
SIB1972.0
SIA0447.0
SIC2070.0
SIC2281.0
SIC2446.5
SIT7906.6
SIM6487.0
SIC2452.0
SIB1872.0
SIT8590.0
SIC2340.0
SIT8092.0
SIB1935.0
SIB1935.2
SIB1935.4
SIB1935.5
SIC2298.5
SIO6711.0
SIP6905.0
SIA0015.0
SIC2068.0
SII6452.2
SIC2268.5
SIA0596.0
SIH6167.5
SIM6481.2
SIT8088.0

O
O
F

SII6454.0
3-ISOCYANATOPROPYLDIMETHYLCHLOROSILANE
SIM6582.0
METHYLTRIS(DIMETHYLSILOXY)SILANE
SIT7278.0
TETRAKIS(DIMETHYLSILOXY)SILANE
SIB1836.0
1,2-BIS(TRIMETHYLSILOXY)CYCLOBUTENE, 95%
SIT8157.0
2-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE
SIT8158.0
4-[2-(TRICHLOROSILYL)ETHYL]PYRIDINE, 15-20% in toluene
SIB1878.6(4-BROMOBENZYL)TRIMETHYLSILANE
SIM6487.6
METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE
SIM6487.6-06 METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 94%
SIM6487.6-20 METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 80%
SIM6487.8
METHACRYLOXYPROPYLTRIS(VINYLDIMETHYLSILOXY)SILANE, tech-95
SIA0210.0(3-ACRYLOXYPROPYL)TRIS(TRIMETHYLSILOXY)SILANE, tech-95
SIP6721.0
PHENETHYLDIMETHYLCHLOROSILANE
SIP6743.0(3-PHENYLPROPYL)DIMETHYLCHLOROSILANE
SID4558.5(DIPHENYLPHOSPHINO)TRIMETHYLSILANE, 95%
SIE4901.9
ETHYNYLDIPHENYLMETHYLSILANE
SIO6707.0
7-OCTENYLDIMETHYLCHLOROSILANE, tech-95
SIC2294.0
CHLOROMETHYLPENTAMETHYLDISILOXANE
SIC2289.5
3-(CHLOROMETHYL)HEPTAMETHYLTRISILOXANESIB1858.6
BIS(TRIMETHYLSILYL)-5-FLUOROURACIL
SIC2280.4
3-CHLOROISOBUTYLTRIMETHOXYSILANE
SIV9094.0
VINYLPHENYLMETHYLCHLOROSILANE
SIL6466.5
LITHIUM HEXAFLUOROSILICATE, dihydrate
SIM6481.0
METHACRYLOXYETHOXYTRIMETHYLSILANE
SID3533.0(DIISOPROPYLAMINO)TRIMETHYLSILANE
SIP6910.0
n-PROPYLDIMETHYLCHLOROSILANE
SIB1861.0
O,O-BIS(TRIMETHYLSILYL) LACTATE
SIT7283.5
TETRAKIS(2-HYDROXYETHOXY)SILANE, tech 90
SIE4899.0
ETHYLTRIACETOXYSILANE
SIP6719.7
PENTAVINYLPENTAMETHYLCYCLOPENTASILOXANE, 95%
SIT8153.0
TRICHLOROMETHYLTRICHLOROSILANE, 50% in toluene
SIP6744.0(3-PHENYLPROPYL)METHYLDICHLOROSILANE
SIP6724.8
4-PHENYLBUTYLMETHYLDICHLOROSILANE
SIT8572.7
TRIMETHYLSILOXYTRIETHOXYSILANE
SIE4895.0
3-ETHYLHEPTAMETHYLTRISILOXANESIC2458.0[2-(3-CYCLOHEXENYL)ETHYL]METHYLDICHLOROSILANE
SIC2469.0
CYCLOHEXYLMETHYLDIMETHOXYSILANE
SIC2482.0
CYCLOHEXYLTRIMETHOXYSILANE
SIT8571.25
3-(TRIMETHYLSILOXY)-1-BUTYNE
SIP6725.2
PHENYLDIETHOXYSILANE
SIT8042.0
p-TOLYLTRIMETHOXYSILANE
SIP6775.0(PHENYLTHIOMETHYL)TRIMETHYLSILANE
SIT8035.6
p-TOLYLMETHYLDIMETHOXYSILANE
SID2772.0
3,5-DIBROMO-1-TRIMETHYLSILYLBENZENE
SIV9096.0
VINYLPHENYLMETHYLSILANE
SIT8580.7
TRIMETHYLSILYL BENZENESULFONATESIB1863.3
BIS(TRIMETHYLSILYLMETHYL)AMINE
SIP6724.9
4-PHENYLBUTYLTRICHLOROSILANE
SIB1094.0
BIS(ETHOXYDIMETHYLSILYL)METHANESIB1974.0
t-BUTYLPHENYLDICHLOROSILANE
SIP6726.0
PHENYLDIMETHYLACETOXYSILANE
SIP6723.67 (PHENYLAMINOMETHYL)METHYLDIMETHOXYSILANE, 95%
SID4610.5
1,5-DIVINYL-3-PHENYLPENTAMETHYLTRISILOXANE, 95%
SIT8719.0
TRIS(TRIMETHYLSILOXY)CHLOROSILANE
SIT8627.0
TRI-t-PENTOXYSILANOL, 99%
SIB1054.0
1,3-BIS(CHLOROMETHYL)-1,1,3,3-TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
SID3394.0
1,5-DIETHOXYHEXAMETHYLTRISILOXANE
SIM6592.0
METHYLTRIS(TRIMETHYLSILOXY)SILANE
SIV9076.0
VINYLDIPHENYLETHOXYSILANE
SIN6596.8
1-NAPHTHYLTRIETHOXYSILANE
SIT8188.0
TRIETHOXYSILYLPROPYL ETHYLCARBAMATESIB1909.0
11-BROMOUNDECYLTRIMETHOXYSILANE, 95%
SIC2429.0
11-CHLOROUNDECYLTRIMETHOXYSILANE
SNT8585
TRI-n-BUTYLSTANNYLTRIMETHYLSILANE
SIH5945.0
1,1,3,3,5,5-HEXAETHOXY-1,3,5-TRISILACYCLOHEXANE
SID2754.0
1,3-DIALLYLTETRAMETHYLDISILOXANE, 95%
SIO6711.5
3-OCTYLHEPTAMETHYLTRISILOXANE
SIP6742.5
3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE
SIG5825.0(3-GLYCIDOXYPROPYL)DIMETHYLETHOXYSILANE
SIU9047.0
10-UNDECENYLTRICHLOROSILANE
SIC2427.0
11-CHLOROUNDECYLTRICHLOROSILANE
SIG5838.5(3-GLYCIDOXYPROPYL)-1,1,3,3-TETRAMETHYLDISILOXANE
SID3530.0
DIISOBUTYLDIMETHOXYSILANE

PR

17070-70-1
17082-46-1
17082-47-2
17082-61-0
17082-69-8
17082-70-1
17095-20-4
17096-07-0
17096-07-0
17096-07-0
17096-10-5
17096-12-7
17146-08-6
17146-09-7
17154-34-6
17156-65-9
17196-12-2
17201-83-1
17201-87-5
17242-85-2
17256-27-8
17306-05-7
17347-95-4
17407-09-9
17425-88-6
17477-29-1
17596-96-2
17622-94-5
17689-77-9
17704-22-2
17760-13-3
17776-66-8
17776-69-1
17861-35-7
17861-60-8
17864-93-6
17865-32-6
17865-54-2
17869-76-0
17872-93-4
17873-01-7
17873-08-4
17873-30-2
17878-23-8
17878-39-6
17882-06-3
17882-91-6
17886-88-3
17887-25-1
17887-41-1
17887-60-4
17890-10-7
17902-95-3
17905-99-6
17906-35-3
17909-34-1
17928-13-1
17928-28-8
17933-85-6
17938-06-6
17945-05-0
17947-99-8
17948-05-9
17955-46-3
17955-67-8
17955-81-6
17955-88-3
17962-34-4
17963-04-1
17963-29-0
17963-32-5
17980-29-9
17980-32-4

CAS Index

Name

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

CAS Index

ISOBUTYLTRICHLOROSILANE
CHLOROMETHYLDIMETHYLISOPROPOXYSILANE
3-CHLOROPROPYLDIMETHYLMETHOXYSILANE, 95%
3-CHLOROPROPYLMETHYLDIMETHOXYSILANE
1,3-BIS(TRICHLOROSILYL)PROPANE
BIS(CHLOROMETHYL)METHYLCHLOROSILANE, 95%(DICHLOROMETHYL)DIMETHYLCHLOROSILANE, tech-95(DICHLOROMETHYL)(CHLOROMETHYL)DIMETHYLSILANE, tech-95
t-BUTYLTRICHLOROSILANE
t-BUTYLDIMETHYLSILANOL
n-PROPYLMETHYLDIMETHOXYSILANE
1,2-BIS(TRIMETHYLSILYL)ETHYLENE, 90%n-PROPYLDIMETHYLMETHOXYSILANE
1,3-DIMETHYLTETRAMETHOXYDISILOXANE, 95%
3-AMINOPROPYLTRIMETHYLSILANECARBOXYETHYLSILANETRIOL, DISODIUM SALT, 25% in water
ACETOXYETHYLTRICHLOROSILANE
1,3-DIETHYNYLTETRAMETHYLDISILOXANE
DI-n-HEXYLDICHLOROSILANE(N,N-DIMETHYLAMINO)DIMETHYLCHLOROSILANE, 95%
ISOPROPYLDIMETHYLSILANEDIISOPROPYLSILANE
1,2-DIBROMOTETRAMETHYLDISILANE, tech-95
DIISOPROPYLDIMETHOXYSILANEISOBUTYLDICHLOROSILANE
ISOPROPYLMETHYLDICHLOROSILANE
2,2,4,4,6,6-HEXACHLORO-2,4,6-TRISILAHEPTANEVINYLDIMETHYLSILANE
BROMOMETHYLTRIMETHYLSILANETHIOBIS(HEXAMETHYLDISILAZANE)
3-CHLOROISOBUTYLDIMETHYLMETHOXYSILANE
TRIVINYLMETHYLSILANE
2-THIENYLTRIMETHYLSILANE(5-BICYCLO[2.2.1]HEPTYL)TRICHLOROSILANE(5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDICHLOROSILANE, 95%
N-(2-AMINOETHYL)-2,2,4-TRIMETHYL-1-AZA-2-SILACYCLOPENTANE
2-(CARBOXYMETHYLTHIO)ETHYLTRIMETHYLSILANE, 95%
TRIMETHYLSILYL CROTONATEMETHACRYLOXYMETHYLTRIMETHYLSILANE(2-ACRYLOXYETHOXY)TRIMETHYLSILANE
2-CHLOROETHYLTRIETHOXYSILANE, 95%
DIISOBUTYLCHLOROSILANECYCLOOCTYLTRICHLOROSILANE, 95%[2-(3-CYCLOHEXENYL)ETHYL]TRICHLOROSILANE(3-CHLOROPROPYL)PENTAMETHYLDISILOXANETRIMETHYLSILYL BROMOACETATEVINYLDIETHYLMETHYLSILANE
4-BROMOBUTOXYTRIMETHYLSILANE(2-METHYL-2-PROPENYL)TRIMETHYLSILANE
TRIMETHYLSILYLACETONITRILE
1-TRIMETHYLSILYL-1,2,4-TRIAZOLEISOBUTYLMETHYLDIMETHOXYSILANEMETHACRYLAMIDOTRIMETHYLSILANE, tech-95
DIISOBUTYLDIETHOXYSILANE
N,N’-BIS(TRIMETHYLSILYL)UREA
BIS(METHYLDIMETHOXYSILYL)METHANEMETHACRYLOXYPROPYLMETHYLDICHLOROSILANE, 95%
ACETOXYETHYLDIMETHYLCHLOROSILANE
3-AMINOPROPYLDIMETHYLETHOXYSILANEDIMETHYLSILA-11-CROWN-4
ISOOCTYLTRICHLOROSILANE
N-METHYL-AZA-2,2,4-TRIMETHYLSILACYCLOPENTANE
1-ALLYL-1,1,3,3-TETRAMETHYLDISILOXANE
2-CHLOROMETHYL-3-TRIMETHYLSILYL1-PROPENE(CYCLOHEXYLMETHYL)TRICHLOROSILANE
1,3-BIS(3-CHLOROISOBUTYL)TETRAMETHYLDISILOXANE
t-BUTYLTRIMETHOXYSILANEISOBUTYLTRIMETHOXYSILANE
DI-t-BUTYLDICHLOROSILANE
n-HEPTYLMETHYLDICHLOROSILANE(5-BICYCLO[2.2.1]HEPT-2-ENYL)TRIETHOXYSILANETETRADECYLTRICHLOROSILANE
1,2-BIS(TRIMETHOXYSILYL)ETHANEPR

SII6453.0
SIC2286.5
SIC2338.0
SIC2355.0
SIB1815.0
SIB1053.0
SID3361.0
SID3360.5
SIB1985.0
SIB1939.0
SIP6914.0
SIB1857.9
SIP6911.0
SID4236.0
SIA0612.0
SIC2263.0
SIA0020.0
SID3425.0
SID3510.0
SID3546.5
SII6463.1
SID3539.4
SID2768.0
SID3538.0
SII6452.3
SII6463.0
SIH5915.0
SIV9073.5
SIB1892.0
SIT7907.5
SIC2278.0
SIT8734.0
SIT7907.0
SIB0997.0
SIB0990.0
SIA0592.0
SIC2264.0
SIT8584.5
SIM6485.6
SIA0160.0
SIC2271.0
SID3526.0
SIC2490.0
SIC2459.0
SIC2362.0
SIT8582.0
SIV9068.0
SIB1879.1
SIM6513.0
SIT8579.0
SIT8613.0
SII6452.8
SIM6480.6
SID3528.0
SIB1878.0
SIB1635.0
SIM6486.7
SIA0010.0
SIA0603.0
SID4220.4
SII6457.0
SIM6501.4
SIA0490.0
SIC2320.0
SIC2470.0
SIB1048.8
SIB1989.0
SII6453.7
SID3205.0
SIH5845.0
SIB0992.0
SIT7093.0
SIB1830.0

Name

18406-97-8
18407-07-3
18407-94-8
18407-95-9
18408-42-9
18412-57-2
18414-38-5
18414-52-3
18416-07-4
18418-53-6
18418-54-7
18418-72-9
18419-53-9
18419-84-6
18420-09-2
18420-19-4
18441-88-8
18457-04-0
18536-91-9
18547-93-8
18586-22-6
18586-39-5
18623-11-5
18642-94-9
18643-08-8
18643-08-8
18643-08-8
18666-65-4
18666-68-7
18724-32-8
18733-57-8
18752-21-1
18765-09-8
18766-53-5
18769-05-6
18784-74-2
18817-29-3
18920-16-6
19086-72-7
19116-61-1
19309-90-1
19333-10-9
19938-13-5
19980-43-9
20006-68-2
20082-71-7
20083-34-5
20152-11-8
20160-69-4
21130-91-6
21134-38-3
21142-29-0
21331-86-2
21591-53-7
21619-76-1
21700-74-3
21700-74-3
22538-45-0
22705-32-4
22705-33-5
22737-36-6
22737-37-7
22831-39-6
22984-54-9
23029-21-2
23038-10-0
23410-40-4
23432-62-4
23779-32-0
23843-64-3
24400-84-8
24413-04-5
24589-78-4

10-UNDECENYLDIMETHYLCHLOROSILANE
DODECYLMETHYLDICHLOROSILANETETRAKIS(ETHOXYETHOXY)SILANE, tech-95
TETRAKIS(1-METHOXY-2-PROPOXY)SILANE, tech-95
BIS(TRIMETHYLSILYL) SEBACATE
p-TOLYLTRIETHOXYSILANE
DI(p-TOLYL)DICHLOROSILANE, tech-95
DIBENZYLOXYDICHLOROSILANE, tech-95
DI-n-OCTYLDICHLOROSILANE
N,N’-BIS(3-TRIMETHOXYSILYLPROPYL)UREA, 95%
1-(TRIETHOXYSILYL)-2-(DIETHOXYMETHYLSILYL)ETHANE
BIS(TRIETHOXYSILYL)METHANEVINYLDIPHENYLCHLOROSILANE
1,2-DIETHOXYTETRAMETHYLDISILANE
1,1,3,3-TETRAMETHYL-1,3-DIETHOXYDISILOXANEBIS(TRIMETHYLSILYLMETHYL)DICHLOROSILANE(4-CYCLOOCTENYL)TRICHLOROSILANE, 95%
BIS(TRIMETHYLSILYL) MALONATE
DODECYLTRIETHOXYSILANE
1,3-BIS(3-METHACRYLOXYPROPYL)TETRAMETHYLDISILOXANE
1,5-DIVINYL-3,3-DIPHENYL-1,1,5,5-TETRAMETHYLTRISILOXANE
2-(DIPHENYLPHOSPHINO)ETHYLTRIETHOXYSILANE
n-OCTADECYLSILANE
1,3-DI-n-OCTYLTETRAMETHYLDISILOXANE
n-OCTADECYLDIMETHYLCHLOROSILANE
n-OCTADECYLDIMETHYLCHLOROSILANE, 97%
n-OCTADECYLDIMETHYLCHLOROSILANE, 70% in toluene
VINYLTRIPHENOXYSILANEVINYLTRIPHENYLSILANE
1,3-BIS[2-(3,4-EPOXYCYCLOHEXYL)ETHYL]TETRAMETHYLDISILOXANE, 90%
EICOSYLTRICHLOROSILANE, 95%
ALLYLTRIPHENYLSILANETRIOCTYLSILANETETRAKIS(TRIMETHYLSILOXY)GERMANE
1,3-DIVINYLTETRAPHENYLDISILOXANE, 95%
TRIS(TRIETHOXYSILYLPROPYL)AMINE, tech-95
5-HEXENYLTRICHLOROSILANE, 95%
m-BIS(TRIPHENYLSILYL)BENZENE
OLIVINE
3-(HEPTAFLUOROISOPROPOXY)PROPYLTRIMETHOXYSILANE
3-METHACRYLOXYPROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE, 95%
PHTHALOCYANATODICHLOROSILANE, tech-90
1,4-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENE(CYCLOPENTENYLOXY)TRIMETHYLSILANE(3-HEPTAFLUOROISOPROPOXY)PROPYLMETHYLDICHLOROSILANEPENTAFLUOROPHENYLDIMETHYLCHLOROSILANEPENTAFLUOROPHENYLTRIETHOXYSILANE
1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE
BIS(3-ISOCYANATOPROPYL)TETRAMETHYLDISILOXANE, 96%
p-METHOXYPHENYLTRIETHOXYSILANEACRYLOXYMETHYLTRIMETHOXYSILANEMETHACRYLOXYPROPYLTRIETHOXYSILANE
TRIS(DIMETHYLSILYL)AMINE, 95%
9-PHENANTHRENYLTRIETHOXYSILANE
3-CYCLOHEXENYLTRIMETHOXYSILANE
CHLOROPHENYLTRIETHOXYSILANE (p-)
p-CHLOROPHENYLTRIETHOXYSILANEACETOXYETHYLTRIETHOXYSILANE(N,N-DIMETHYLAMINO)DIMETHYLSILANE, 95%
BIS(DIMETHYLAMINO)METHYLSILANE, 96%
O-TRIMETHYLSILYLHYDROXYLAMINE, 95%
N,O-BIS(TRIMETHYLSILYL)HYDROXYLAMINEMAGNESIUM SILICIDE, powder
METHYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95
3-AMINOPROPYLPENTAMETHYLDISILOXANE
1,3-DIVINYL-1,3-DIPHENYL-1,3-DIMETHYLDISILAZANE
N-(2-AMINOETHYL)-3-AMINOISOBUTYLMETHYLDIMETHOXYSILANE, 95%
N-TRIMETHOXYSILYLPROPYLMETHYLCARBAMATEUREIDOPROPYLTRIETHOXYSILANE, 50% in methanol
UREIDOPROPYLTRIMETHOXYSILANE
ALLYLTRIISOPROPYLSILANE(p-CHLOROMETHYL)PHENYLTRIMETHOXYSILANE, 95%
N-METHYL-N-TRIMETHYLSILYLTRIFLUOROACETAMIDE, 96%

SIU9045.0
SID4628.0
SIT7282.0
SIT7288.0
SIB1870.0
SIT8041.0
SID4598.0
SID2755.0
SID4400.0
SIB1835.5
SIT8185.8
SIB1821.0
SIV9074.0
SID3395.2
SIT7534.0
SIB1865.0
SIC2485.0
SIB1862.0
SID4632.0
SIB1402.0
SID4609.0
SID4558.0
SIO6635.0
SID4406.0
SIO6615.0
SIO6615.1
SIO6615.2
SIV9264.0
SIV9265.0
SIB1092.0
SIE4661.0
SIA0575.0
SIT8625.0
GET7296
SID4616.0
SIT8716.3
SIH6164.0
SIB1878.2
SIO6715.9
SIH5842.2
SIM6486.0
SIP6828.0
SIB1858.2
SIC2552.0
SIH5841.9
SIP6716.1
SIP6716.7
SIT7537.0
SIB1250.0
SIM6492.53
SIA0182.0
SIM6487.3
SIT8715.5
SIP6720.77
SIC2464.1
SIC2332.0
SIC2332.3
SIA0025.0
SID3546.6
SIB1075.0
SIT8589.8
SIB1859.0
SIM6472.0
SIM6590.0
SIA0607.0
SID4607.0
SIA0587.5
SIT8407.0
SIU9055.0
SIU9058.0
SIA0535.0
SIC2296.2
SIM6576.0

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

COMPOUNDS

18169-57-8
18171-11-4
18171-14-7
18171-19-2
18171-50-1
18171-56-7
18171-59-0
18171-70-5
18171-74-9
18173-64-3
18173-73-4
18178-60-4
18182-14-4
18186-97-5
18187-14-9
18191-40-7
18204-80-3
18204-93-8
18204-93-8
18209-60-4
18209-61-5
18209-66-0
18209-83-1
18230-61-0
18236-87-8
18236-89-0
18243-10-2
18243-27-1
18243-41-9
18243-89-5
18244-08-1
18244-95-6
18245-28-8
18245-29-9
18245-94-8
18246-33-8
18269-42-6
18269-64-2
18269-97-1
18269-99-3
18279-67-9
18279-73-7
18290-59-0
18290-60-3
18291-27-5
18291-80-0
18292-29-0
18292-36-9
18292-38-1
18293-53-3
18293-54-4
18293-82-8
18295-89-1
18297-14-8
18297-63-7
18297-79-5
18301-56-9
18306-45-1
18306-79-1
18339-94-1
18379-25-4
18387-19-4
18387-26-3
18388-03-9
18388-16-4
18388-70-0
18395-29-4
18395-30-7
18395-90-9
18395-93-2
18401-43-9
18402-22-7
18406-41-2

Enabling Your Technology

CAS Number Catalog #SILICON

Name

O
O
F

CAS Number Catalog #435

CAS Index

Name

24636-31-5
24685-89-0
24801-88-5
24858-02-4
25134-15-025195-85-1
25357-81-7
25374-10-1
25436-07-1
25438-37-3
25498-02-6
25561-30-2
25898-35-5
25898-37-7
26115-70-8
26495-91-0
26798-98-1
26798-99-2
26903-85-5
27137-85-5
27306-78-1
27326-65-4
27490-70-6
27607-77-8
27668-52-6
27692-57-5
27703-88-4
27752-77-8
27804-64-4
28229-56-3
29098-72-4
29159-37-3
29489-57-4
29681-57-0
29706-30-7
30102-73-930736-07-3
31001-77-1
31020-47-0
31024-35-831024-46-1
31024-49-4
31024-56-3
31024-65-4
31024-70-1
31323-44-1
31469-15-5
31795-24-1
32328-67-932395-58-7
33287-52-4
33317-65-6
33491-28-0
33525-68-7
33558-36-0
33567-83-8
33580-59-5
33581-77-0
33734-79-1
33861-17-5
33976-43-1
34036-80-1
34206-40-1
34396-03-7
34708-08-2
34937-00-3
34937-00-3

SIM6486.2
SIT7285.0
SII6455.0
SIV9063.0
SIC2522.0
SIM6497.0
SIA0620.0
SIP6724.6
SIT8616.0
SIT8572.3
SIT7510.3
SIB1876.0
SIC2328.0
SIT8035.0
SIT8717.0
SIC2464.2
SID3546.9
SIB1077.0
SID3545.0
SID3367.6
SIM6492.6
SIP6930.0
SII6452.5
SIT8620.0
SIO6620.0
SIM6487.1
SIT8365.0
SIB1903.0
SIB1069.0
SIP6723.25
SIP6926.2
SIA0608.0
SIT8711.6
SIB1938.0
SIB1144.0
SIH6163.0
SID3342.0
SIM6474.0
SIB1620.0
SIM6498.0
SIA0400.0
SIA0587.2
SIB1932.2
SIB1869.5
SIB1835.0
SIO6605.0
SIM6496.0
SIP6898.0
SIP6724.7
SIO6619.0
SIB1070.0
SIB1055.3
SII6454.45
SIT8189.8
SIB1828.2
SIP6736.8
SIM6493.0
SIT8622.0
SIO6607.0
SIP6747.0
SIA0599.1
SIP6826.5
SIT7289.0
SII6458.0
SIT7908.0
SIS6993.0
SIS6994.0

35141-30-1
35141-36-7
35192-54-2
35239-30-635435-21-3
35450-28-3

SIT8398.0
SIT8415.0
SIB1809.5
SIT8030.0
SII6457.5
SIG4998.0

3-METHACRYLOXYPROPYLDIMETHYLCHLOROSILANE, tech-95
TETRAKIS(METHOXYETHOXYETHOXY)SILANE, tech-95
3-ISOCYANATOPROPYLTRIETHOXYSILANE, 95%
VINYL-t-BUTYLDIMETHYLSILANE, 95%
CYCLOPENTADIENYLTRIMETHYLSILANE(2-METHYLALLYLOXY)TRIMETHYLSILANE, 95%
3-AMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 95%
PHENYLBIS(DIMETHYLAMINO)CHLOROSILANE, 95%
TRIMETHYLSILYLTRICHLOROACETATE
1-(TRIMETHYLSILOXY)PHENYLACETONITRILETETRAMETHOXYSILANE, oligomeric hydrolysate
N,O-BIS(TRIMETHYLSILYL)TRIFLUOROACETAMIDE(CHLOROPHENYL)METHYLDICHLOROSILANE, 95%
p-TOLYLMETHYLDICHLOROSILANE
TRIS(3-TRIMETHOXYSILYLPROPYL)ISOCYANURATE, tech-95(N-CYCLOHEXYLAMINOMETHYL)TRIETHOXYSILANE, 95%
N,N-DIMETHYLAMINOPENTAMETHYLDISILANE
1,2-BIS(DIMETHYLAMINO)TETRAMETHYLDISILANE
2,2-DIMETHOXY-1-THIA-2-SILACYCLOPENTANEDICHLOROPHENYLTRICHLOROSILANE, 95%
2-[METHOXY(POLYETHYLENEOXY)PROPYL]HEPTAMETHYLTRISILOXANE, tech-902-(2-PYRIDYLETHYL)TRIMETHOXYSILANEISOBUTYLDIMETHYLCHLOROSILANE
TRIMETHYLSILYLTRIFLUOROMETHANESULFONATEOCTADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE,60% in methanol
METHACRYLOXYPROPYLSILATRANE, 95%
3-(3,3,3-TRIFLUOROPROPYL)HEPTAMETHYLTRISILOXANEBROMOPHENYLTRICHLOROSILANE
BIS(DIETHYLAMINO)SILANE
3-PHENOXYPROPYLMETHYLDICHLOROSILANE
3-(2-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANE
3-AMINOPROPYLSILANETRIOL, 22-25% in water
TRIS(DIMETHYLAMINO)ETHYLSILANE
t-BUTYLDIMETHYLSILANE
1,3-BIS(3-HYDROXYISOBUTYL)TETRAMETHYLDISILOXANE
5-HEXENYLDIMETHYLCHLOROSILANE, 95%
DI-t-BUTYLSILANE
3-MERCAPTOPROPYLMETHYLDIMETHOXYSILANE, 96%
BIS(METHYLDIETHOXYSILYLPROPYL)AMINE, 95%
N-METHYLAMINOPROPYLMETHYLDIMETHOXYSILANE
3-(N-ALLYLAMINO)PROPYLTRIMETHOXYSILANE, 95%
N-(2-AMINOETHYL)-3-AMINOISOBUTYLDIMETHYLMETHOXYSILANE, 95%
n-BUTYLAMINOPROPYLTRIMETHOXYSILANE
BIS(3-TRIMETHYLSILYLPROPYL)AMINE
BIS(3-TRIMETHOXYSILYLPROPYL)-N-METHYLAMINEOCTACHLOROTRISILOXANE, 95%
1-METHOXY-1-(TRIMETHYLSILOXY)-2-METHYL-1-PROPENEPOTASSIUM METHYLSILICONATE, 40% in water
4-PHENYLBUTYLDIMETHYLCHLOROSILANE
n-OCTADECYLDIMETHYLSILANE
BIS(DIMETHYLAMINO)DIETHYLSILANE
BIS(3-CHLOROPROPYL)DICHLOROSILANE
3-ISOCYANATOPROPYLMETHYLDIETHOXYSILANE, 95%
TRIETHOXYSILYLPROPYLMALEAMIC ACID, tech-90
3,5-BIS(TRIFLUOROMETHYL)PHENYLDIMETHYLSILANE, 95%
PHENYLMETHYLBIS(DIMETHYLAMINO)SILANE
3-METHOXYPROPYLTRIMETHOXYSILANE
TRIMETHYLSILYL (TRIMETHYLSILOXY)ACETATEOCTADECYLDIETHOXYCHLOROSILANE, tech-95
PHENYLSELENOTRIMETHYLSILANE, 95%
p-AMINOPHENYLTRIMETHOXYSILANE, 95%
PHENYLTRIS(METHYLETHYLKETOXIMINO)SILANE, tech-95
TETRAKIS(METHYLETHYLKETOXIMINO)SILANE (50% in toluene)
ISOOCTYLTRIMETHOXYSILANE
3-THIOCYANATOPROPYLTRIETHOXYSILANE, 96%
3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE, 40% in methanol
3-(N-STYRYLMETHYL-2-AMINOETHYLAMINO)PROPYLTRIMETHOXYSILANE HYDROCHLORIDE,
40% in methanol(3-TRIMETHOXYSILYLPROPYL)DIETHYLENETRIAMINE, tech-95
N-TRIMETHOXYSILYLPROPYL-N,N,N-TRIMETHYLAMMONIUM CHLORIDE, 50% in methanol
1,6-BIS(TRICHLOROSILYLETHYL)DODECAFLUOROHEXANE
p-TOLYLDIMETHYLCHLOROSILANE
ISOOCTYLTRIETHOXYSILANEGALLIUM TRIS(HEXAMETHYDISILAZIDE)PR436

CAS Number Catalog #Name35692-27-4
35788-99-935789-00-5
35789-01-6
35789-02-7
35789-03-836198-87-536493-41-1
37244-96-537843-11-1
37843-14-4
37859-57-7
38002-45-8
38051-57-938053-91-7
38170-80-8
38436-16-7
38595-89-0
38755-76-9
38958-24-6
39197-94-939443-39-5
39482-87-6
40195-27-5
40372-72-3
40934-68-7
40949-94-8
40949-94-840965-80-8
41051-80-3
41081-31-6
41309-43-7
41318-68-7
41591-87-1
41836-21-941836-28-6
41879-39-4
41919-30-6
41966-94-3
42003-39-4
42134-49-6
42201-71-8
42292-18-2
48183-36-4
49539-88-049539-88-049749-84-0
50350-62-4
51772-85-1
51826-90-5
51851-37-7
51851-37-7
51895-58-0
52034-14-7
52090-23-0
52112-26-2
52217-52-4
52217-53-5
52217-57-9
52217-60-4
52217-62-6
52770-61-3
52783-38-7
52885-13-9
53116-81-7
53215-95-5
53392-05-5
53605-77-953749-38-5
53883-59-3
54076-73-2
54125-02-954586-78-6

p-METHOXYPHENYLTRIMETHOXYSILANELANTHANUM TRIS(HEXAMETHYLDISILAZIDE)PRASEODYMIUM TRIS(HEXAMETHYLDISILAZIDE)SAMARIUM TRIS(HEXAMETHYLDISILAZIDE)EUROPIUM(III) TRIS(HEXAMETHYLDISILAZIDE)GADOLINIUM TRIS(HEXAMETHYLDISILAZIDE)
O,O’-DIMETHYL(TRIMETHYLSILYL)PHOSPHITE, tech-95
2-[METHOXY(POLYETHYLENEOXY)PROPYL]TRICHLOROSILANE, tech-90
NEPHELINEADAMANTYLETHYLTRICHLOROSILANE(ETHYLMETHYLKETOXIMINO)TRIMETHYLSILANE, 95%
METHYLTRIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
3-BROMO-1-(TRIMETHYLSILYL)-1-PROPYNE, 95%
n-DECYLDIMETHYLCHLOROSILANE
2-(TRIMETHYLSILOXY)-1,3-BUTADIENE
1,3-BIS[(TRIMETHYLSILYL)ETHYNYL]BENZENENONAFLUOROHEXYLMETHYLDICHLOROSILANE(3-ACRYLOXYPROPYL)TRICHLOROSILANEVINYLDIMETHYLFLUOROSILANE
1,4-BIS(METHYLDICHLOROSILYL)BUTANE, 95%
2-(CHLOROMETHYL)ALLYLTRIMETHOXYSILANE
SILICLAD®
1,3-BIS(TRIFLUOROPROPYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
VINYLPHENYLDIETHOXYSILANE
BIS[3-(TRIETHOXYSILYL)PROPYL]TETRASULFIDE, tech-95
n-OCTYLDIMETHYLSILANEPOTASSIUM HEXAMETHYLDISILAZIDE, 11% in toluene, 0.5M
POTASSIUM HEXAMETHYLDISILAZIDE, 20% in THF
N-METHYLAMINOPROPYLTRIS(TRIMETHYLSILOXY)SILANE(N,N-DIETHYL-3-AMINOPROPYL)TRIMETHOXYSILANE
4-BIPHENYLYLDIMETHYLCHLOROSILANE
2-BROMOVINYLTRIMETHYLSILANE
3-PHENOXYPHENYLDIMETHYLCHLOROSILANE, 95%
TETRADECYLDIMETHYL(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE,50% in methanol
CERIUM(III) TRIS[BIS(TRIMETHYLSILYL)AMIDE]
YTTRIUM(III) TRIS[BIS(TRIMETHYLSILYLAMIDE)]
O-(t-BUTYLDIMETHYLSILYL)HYDROXYLAMINE, 95%
CHLOROMETHYLTRIS(TRIMETHYLSILOXY)SILANE(3,3-DIMETHYLBUTYL)TRIETHOXYSILANE
CHLOROMETHYLSILATRANE(3-TRIMETHYLSILYL-2-PROPYNYL)TRIPHENYLPHOSPHONIUM BROMIDEMETHYL 3-TRIMETHYLSILYLPROPYNOATE
3-AMINOPROPYLMETHYLBIS(TRIMETHYLSILOXY)SILANE
1-TRIMETHYLSILYLBENZOTRIAZOLEPHENETHYLTRIMETHOXYSILANE, tech-95
2-PHENYLETHYLTRIMETHOXYSILANE(Z)-2-BUTENYLTRICHLOROSILANETETRAKIS(TRICHLOROSILYL)SILANE
3-METHACRYLOXYPROPYLTRIACETOXYSILANE, tech-90
3-BROMOPROPYLTRIMETHOXYSILANEPERFLUOROALKYLETHYLTRIETHOXYSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIETHOXYSILANE
N-(6-AMINOHEXYL)AMINOPROPYLTRIMETHOXYSILANE, 95%
5-HEXENYLTRIETHOXYSILANE, 95%
3-(DIPHENYLPHOSPHINO)PROPYLTRIETHOXYSILANE
4-BROMOBUTYLDIMETHYLCHLOROSILANE
7-OCTENYLTRICHLOROSILANE, tech-95
1,8-BIS(TRICHLOROSILYL)OCTANE
7-OCTENYLTRIMETHOXYSILANE, tech-95
1,8-BIS(TRIETHOXYSILYL)OCTANE
1,10-BIS(TRICHLOROSILYL)DECANE, tech-95
7-OCTENYLDIMETHYLSILANE, tech-95
STYRYLETHYLTRIMETHOXYSILANE, tech-90(E)-2-BUTENYLTRICHLOROSILANETETRAMETHYLAMMONIUM SILICATE, 16-20% in water
N-BENZYLAMINOMETHYLTRIMETHYLSILANE
CHLOROPHENYLTRIETHOXYSILANE (m-)
11-ACETOXYUNDECYLTRICHLOROSILANE
10-(CARBOMETHOXY)DECYLDIMETHYLCHLOROSILANE
m-(TRIFLUOROMETHYL)PHENYLTRIMETHOXYSILANE[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRICHLOROSILANE, tech-95, endo/exo isomers
1-METHOXY-3-(TRIMETHYLSILOXY)BUTADIENE, 95%
METHACRYLOXYMETHYLTRIMETHOXYSILANE

SIM6492.55
SIL6464.0
SIP6902.1
SIS6943.4
SIE4907.0
SIG4994.0
SID4245.0
SIM6492.66
SIN6597.23
SIA0325.0
SIE4897.0
SIM6590.2
SIB1907.0
SID2660.0
SIT8571.2
SIB1858.0
SIN6597.5
SIA0199.0
SIV9073.0
SIB1612.0
SIC2282.0
SIS6952.0
SIB1828.4
SIV9092.2
SIB1825.0
SIO6711.4
SIP6890.0
SIP6890.1
SIM6500.5
SID3396.0
SIB0999.0
SIB1910.1
SIP6723.0
SIT7090.0
SIC2264.6
SIY9680.0
SIB1963.0
SIC2325.0
SID4069.4
SIC2297.0
SIT8606.7
SIM6575.0
SIA0604.5
SIT8581.0
SIP6722.6
SIP6731.8
SIB1927.4
SIT7294.0
SIM6481.17
SIB1906.0
SIP6720.3
SIT8175.0
SIA0594.0
SIH6164.2
SID4558.2
SIB1879.2
SIO6708.0
SIB1814.0
SIO6709.0
SIB1824.0
SIB1809.0
SIO6707.5
SIS6990.0
SIB1927.2
SIT7516.0
SIB0960.0
SIC2332.0
SIA0114.0
SIC2065.0
SIT8343.0
SIB0986.0
SIM6494.0
SIM6483.0

OOF

CAS Number Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

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LITHIUM (TRIMETHYLSILYL)ACETYLIDE, 0.5M in tetrahydrofuran
1-(t-BUTYLDIMETHYLSILYL)IMIDAZOLEVINYL(p-METHOXYPHENYL)DIMETHYLSILANE(MERCAPTOMETHYL)METHYLDIETHOXYSILANE, 95%(2-DICYCLOHEXYLPHOSPHINOETHYL)TRIETHOXYSILANEGERMANIUM(II) BIS(HEXAMETHYLDISILYL)AMIDE
3-CYANOPROPYLTRIMETHOXYSILANE
BIS(TRIMETHYLSILYL) ITACONATE
3-(m-AMINOPHENOXY)PROPYLTRIMETHOXYSILANE, tech-95(1-METHOXY-2-PROPOXY)TRIMETHYLSILANEVINYL-1,1,3,3-TETRAMETHYLDISILOXANE(PHENYLSELENOMETHYL)TRIMETHYLSILANE, 95%
DI-t-BUTYLCHLOROSILANE
DI-t-BUTYLMETHYLSILANE
t-BUTYLDIMETHYLSILYLNITRILE
BIS[3-(TRIETHOXYSILYL)PROPYL]DISULFIDE, 90%
HYDROXYETHOXYSILATRANEMETHACRYLOXYPROPYLTRIS(METHOXYETHOXY)SILANE, tech-80
ULTRAMARINE BLUE
3-ACRYLAMIDOPROPYLTRIMETHOXYSILANE, tech-95(3-ACETAMIDOPROPYL)TRIMETHOXYSILANE
3-BUTENYLTRIETHOXYSILANE, 95%
N-(3-TRIETHOXYSILYLPROPYL)-4,5-DIHYDROIMIDAZOLE
3-AMINOPROPYLSILANETRIOL, 22-25% in water((CHLOROMETHYL)PHENYLETHYL)TRICHLOROSILANE
BIS(TRIMETHOXYSILYLETHYL)BENZENE, tech-95
t-BUTYLDIPHENYLCHLOROSILANEAPOPHYLLITE, pieces
3-ACETOXYPROPYLTRIMETHOXYSILANE
TRIS(DIMETHYLAMINO)SULFUR(TRIMETHYLSILYL)DIFLUORIDE, tech-95
TIN(ll) BIS(HEXAMETHYLDISILAZIDE)HEXACOSYLTRICHLOROSILANEPROPYLTRIS(TRIMETHYLSILOXY)SILANE
TRIS(VINYLDIMETHYLSILOXY)PHENYLSILANE, 95%
TRIS(VINYLDIMETHYLSILOXY)METHYLSILANE, 95%
TETRAKIS(VINYLDIMETHYLSILOXY)SILANE, 95%
DODECYLMETHYLDIETHOXYSILANE
3-PHENOXYPROPYLTRICHLOROSILANE
SILICON DIOXIDE, fused
3-(TRIETHOXYSILYLPROPYL)-p-NITROBENZAMIDE
2-(TRIMETHYLSILOXY)FURANDIATOMACEOUS EARTH, uncalcined
TRIS(TRICHLOROSILYL)SILANE
METHYL-3-(TRIMETHYLSILOXY)CROTONATEp-(METHYLPHENETHYL)METHYLDICHLOROSILANE, 95%
MOLECULAR SIEVES, 3A, powder
BIS(TRIMETHYLSILYL)AMINODIMETHYLPHOSPHINESEPIOLITE
2-BROMOETHYLTRICHLOROSILANE, 95%
TRIMETHYLSILYLMETHYLTRIFLUOROMETHANESULFONATE, 96%
n-BUTYLDIMETHYLMETHOXYSILANEMETHACRYLOXYPROPYLMETHYLDIETHOXYSILANE, 95%
ACETOXYMETHYLTRIMETHOXYSILANE, 95%(3-GLYCIDOXYPROPYL)METHYLDIMETHOXYSILANE
2-[METHOXY(POLYETHYLENEOXY)PROPYL]TRIMETHOXYSILANE, tech-902-[METHOXY(POLYETHYLENEOXY)PROPYL]TRIMETHOXYSILANE, tech-902-[METHOXY(POLYETHYLENEOXY)PROPYL]TRIMETHOXYSILANE, tech-90
TRIMETHOXYSILYLPROPOXYPOLYETHYLENEOXIDE, METHYL ETHER, tech-85
GLASS SPHERES, (SOLID BOROSILICATE)
DIETHYL(TRIMETHYLSILOXYCARBONYLMETHYL)PHOSPHONATE, 95%
1,2-BIS(t-BUTYLDIMETHYLSILOXY)ETHANEDODECYLDIMETHYLCHLOROSILANEMETHACRYLOXYPROPYLDIMETHYLMETHOXYSILANE, 95%
1,3-DIPHENYLTETRAKIS(DIMETHYLSILOXY)DISILOXANE, 95%
1,1-DIETHOXY-1-SILACYCLOPENT-3-ENE, tech-95
ACRYLOXYMETHYLTRIMETHYLSILANE(t-BUTYLDIMETHYLSILYL)DIPHENYLPHOSPHINE, 95%(S)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREA(N,N-DIMETHYL-3-AMINOPROPYL)METHYLDIMETHOXYSILANETHEXYLDIMETHYLCHLOROSILANE(N,N-DIETHYLAMINOMETHYL)TRIMETHOXYSILANE, 955[2-(3-CYCLOHEXENYL)ETHYL]TRIMETHOXYSILANE
3-[HYDROXY(POLYETHYLENEOXY)PROPYL]HEPTAMETHYLTRISILOXANE, 90%

PR

SIL6470.0
SIB1964.0
SIV9079.0
SIM6473.0
SID3385.0
GEB1025
SIC2456.0
SIB1860.0
SIA0598.0
SIM6492.8
SIV9097.5
SIP6745.0
SID3120.0
SID3258.0
SIB1965.0
SIB1824.6
SIH6171.0
SIM6487.5
SIU8850.0
SIA0146.0
SIA0006.0
SIB1928.0
SIT8187.5
SIA0608.0
SIC2295.3
SIB1831.0
SIB1968.0
SIA0740.0
SIA0100.0
SIT8715.0
SNB1025
SIH5917.0
SIP6921.0
SIT8725.4
SIT8725.0
SIT7312.0
SID4629.0
SIP6723.3
SIS6964.4
SIT8191.0
SIT8571.3
SID2754.4
SIT8716.1
SIM6570.0
SIM6511.0
SIM6593.0
SIB1852.8
SIS6948.0
SIB1880.0
SIT8595.0
SIB1937.3
SIM6486.8
SIA0055.0
SIG5836.0
SIM6492.7
SIM6492.72
SIM6492.73
SIT8408.0
SIG5210.0
SID3420.0
SIB1026.8
SID4627.0
SIM6486.5
SID4582.0
SID3395.0
SIA0186.0
SIB1955.0
SIP6731.6
SID3546.94
SIT7906.0
SID3395.6
SIC2460.0
SIH6185.0

67681-66-7
67776-46-967859-75-0
67873-85-2
67892-56-2
67909-31-3
67963-68-2
68037-53-6
68092-71-7
68128-25-6
68187-15-5
68323-30-8
68400-09-9
68412-37-3
68412-56-6
68440-88-0
68469-60-3
68476-25-5
68478-92-2
68478-92-2
68478-92-2
68479-60-7
68479-61-868583-49-3
68585-32-0
68733-63-1
68845-16-968845-16-9
68848-64-6
68855-54-9
68909-20-6
68909-20-6
68959-06-8
68959-20-6

Name

SIA0485.0
ALLYLMETHYLDIMETHOXYSILANE, tech-95
SIT7292.0
TETRAKIS(2-TRICHLOROSILYLETHYL)SILANE, 95%
SIO6627.0
n-OCTADECYLMETHYLDIETHOXYSILANE
SIB1820.5
BIS[m-(2-TRIETHOXYSILYLETHYL)TOLYL]POLYSULFIDE, tech-90
SID4620.0
DOCOSYLMETHYLDICHLOROSILANE, blend
SIM6565.0
4-METHYL-7-TRIMETHYLSILOXYCOUMARIN
SIB1895.0
p-BROMOPHENOXY(t-BUTYL)DIMETHYLSILANE
SIM6510.0
METHYLHYDROCYCLOSILOXANES, 95%
SIC2295.0((CHLOROMETHYL)PHENYLETHYL)DIMETHYLCHLOROSILANE
SIC2295.5((CHLOROMETHYL)PHENYLETHYL)TRIMETHOXYSILANE
SIP6902.2
PRASEODYMIUM ZIRCONIUM SILICATESIB0988.0[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TRIMETHOXYSILANE, tech-95, endo/exo isomers
SIA0590.0
N-(2-AMINOETHYL)-3-AMINOPROPYLSILANETRIOL, 25% in water, mainly oligomers
SIT7110.3
TETRAETHOXYSILANE, oligomeric hydrolysate
SIP6833.2
PLATINUM-OCTANAL/OCTANOL COMPLEX
SIT7520.0
TETRAMETHYLAMMONIUM SILOXANOLATE
SIA0469.0
ALLYL(4-METHOXYPHENYL)DIMETHYLSILANE
SIF4907.0
FELDSPAR-SODIUM
SIP6830.3
PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEXSIP6831.2
PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene
SIP6831.2LC PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene, LOW COLOR
SIA0790.0
4-(AZIDOSULFONYL)PHENETHYLTRIMETHOXYSILANE, 22-25% in methanol/toluene
SIT8190.0(S)-N-TRIETHOXYSILYLPROPYL-O-MENTHOCARBAMATESIS6961.0
SILICON DIOXIDE, amorphous, OCTAMETHYLCYCLOTETRASILOXANE TREATED
SIP6832.2
PLATINUM-CYCLOVINYLMETHYLSILOXANE COMPLEXSID4552.5(DIPHENYL)METHYL(DIMETHYLAMINO)SILANE
SIB1834.0
N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 62% in methanol
SIB1834.1
N,N’-BIS[(3-TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE, 95%
SIL6469.6
LITHIUM SILICIDESID2754.2
DIATOMACEOUS EARTH, calcined
SIS6962.0
SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SIS6962.1M30 SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
SID2780.0
DI-s-BUTOXYALUMINOXYTRIETHOXYSILANE
SID3392.0
N,N-DIDECYL-N-METHYL-N-(3-TRIMETHOXYSILYLPROPYL)AMMONIUM CHLORIDE, 40-42%
in methanol
SIT8720.0
TRIS(TRIMETHYLSILOXY)ETHYLENE, 96%
SIT7273.0
1,1,3,3-TETRAISOPROPYL-1,3-DICHLORODISILOXANESIB1940.0
2-(t-BUTYLDIMETHYLSILOXY)PENT-2-EN-4-ONE
SIB1828.0
N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]UREA, 60% in ethanol
SID4404.0
1,3-DI-n-OCTYL-1,1,3,3-TETRAMETHYLDISILAZANE
SIO6706.0
OCTAVINYL-T8-SILSESQUIOXANESIO6696.9
OCTAKIS(TETRAMETHYLAMMONIUM)-T8-SILSESQUIOXANE, hydrate
SIP6723.2
3-PHENOXYPROPYLDIMETHYLCHLOROSILANE
SIB1967.0
t-BUTYLDIMETHYLSILYLTRIFLUOROMETHANESULFONATESIB1879.6
4-BROMOBUTYLTRICHLOROSILANE
SIM6481.15 3-(3-METHACRYLOXY-2-HYDROXYPROPOXY)PROPYLBIS(TRIMETHYLSILOXY)METHYLSILANE,
tech-95
SIM6594.5
MOLECULAR SIEVES, 5A, powder
SIB1827.0
N,N’-BIS[3-(TRIETHOXYSILYL)PROPYL]THIOUREA, 90%
SIA0588.8
N-(2-AMINOETHYL)-3-AMINOPROPYLMETHYLDIETHOXYSILANE
SIA0599.0
m-AMINOPHENYLTRIMETHOXYSILANE, 95%
SIP6717.0
1,1,1,3,3-PENTAMETHYL-3-ACETOXYDISILOXANE
SIT8730.0
TRIVINYLETHOXYSILANE, 95%
SIT8048.0
TRIACONTYLTRICHLOROSILANE, blend
SID4220.5
DIMETHYLSILA-14-CROWN-5
SIO6629.0
n-OCTADECYLMETHYLDIMETHOXYSILANE
SIT8045.0
TRIACONTYLDIMETHYLCHLOROSILANE, blend
SIT8187.0
N-(TRIETHOXYSILYLPROPYL)DANSYLAMIDE
SID3255.0
DI-t-BUTYLMETHYLCHLOROSILANE
SIT8378.3
3-(TRIHYDROXYSILYL)-1-PROPANESULFONIC ACID, 30-35% in water
SIM6594.0
MOLECULAR SIEVES, 4A, powder
SIM6594.2
MOLECULAR SIEVES, 4A, beads
SIZ9810.0
ZIRCONIUM BIS(HEXAMETHYLDISILAZIDE)DICHLORIDE
SIB1390.0
1,3-BIS(3-METHACRYLOXY-2-HYDROXYPROPOXYPROPYL)TETRAMETHYLDISILOXANE,tech-95
SIB1816.0
1,3-BIS(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TETRAMETHYLDISILOXANESIC2437.0(3-CYANOBUTYL)METHYLDICHLOROSILANE
SIA0196.0(3-ACRYLOXYPROPYL)METHYLDICHLOROSILANE
SID4352.0
3-(2,4-DINITROPHENYLAMINO)PROPYLTRIETHOXYSILANE, 95%
SIO6618.0
n-OCTADECYLDIMETHYLMETHOXYSILANE
SIC2465.0
CYCLOHEXYLDIMETHYLCHLOROSILANE
SID4074.0(DIMETHYLCHLOROSILYL)METHYL-7,7-DIMETHYLNORPINANE
SIA0030.0
ACETOXYETHYLTRIMETHOXYSILANE, 95%
SIP6829.2
PLATINUM CARBONYL CYCLOVINYLMETHYLSILOXANE COMPLEX

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70942-24-4
70955-01-0
70955-01-0
70969-28-7
71223-24-0
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COMPOUNDS

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56522-24-8
56706-10-6
56929-77-2
57069-48-457455-37-5
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57813-67-9
58068-97-6
58160-99-9
58274-32-1
58298-01-4
58479-61-1
58572-15-959004-18-1
59218-87-0
59863-13-7
60085-14-5
60111-46-8
60111-47-960111-52-6
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64712-50-1
65100-04-1
65625-39-0
65799-47-5
65994-07-2
65994-07-2
65994-07-2
65994-07-2
65997-17-3
66130-90-3
66548-22-9
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Enabling Your Technology

CAS Number Catalog #

O
O
F

Name

SILICONCAS Index

CAS Number Catalog #437

CAS Number Catalog #438

CAS Number Catalog #Name85712-15-8
85807-85-8
85857-16-5
85877-79-8
85912-75-0
86050-32-0
86138-01-4
86318-61-8
86864-60-0
87061-56-1
87135-01-1
87290-97-987576-94-1
87630-35-1
87994-64-7
88276-92-0
88284-48-4
88321-11-3
88346-87-6
88456-93-3
89031-82-3
89031-84-5
89530-43-7
90162-40-6
90393-83-2
90633-16-2
91166-50-6
92511-12-1
92779-72-1
93102-05-7
93254-88-7
93502-75-1
93642-68-3
93763-70-3
93777-98-1
93804-29-6
94071-24-6
96132-98-8
96164-66-8
96220-76-7
96550-26-4
96836-74-7
97057-70-0
97451-53-1
97927-35-0
98299-74-2
98789-40-3
101519-13-5
101947-16-4
101947-16-4
102056-64-4
102191-92-4
102229-10-7
102390-98-7
102488-47-1
102488-49-3
103457-72-3
104164-54-7
104275-58-3
105566-68-5
105732-02-3
106359-89-1
106868-88-6
106948-24-7
106996-32-1
107602-27-7108534-47-0108587-59-3
108587-60-6
109144-59-4
109213-85-6
109433-86-5
110348-62-4

n-OCTYLMETHYLDIMETHOXYSILANE
ALLYLOXY-t-BUTYLDIMETHYLSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRIMETHOXYSILANENONAFLUOROHEXYLTRIMETHOXYSILANE
BIS[m-(2-TRIETHOXYSILYLETHYL)TOLYL]POLYSULFIDE, tech-90
DIMETHYL[BIS(CYCLOPENTADIENYL)SILYL] ZIRCONIUM DICHLORIDE
5,6-EPOXYHEXYLTRIETHOXYSILANEETHYNYL-t-BUTYLDIMETHYLSILANE
2-(t-BUTYLDIMETHYLSILOXY)ETHYLBROMIDE
1,2-BIS(TRIETHOXYSILYL)ETHYLENE, 95%
1,6-BIS(TRIMETHOXYSILYL)HEXANE
PHENYLETHYNYLDIMETHYLSILANE(AZIDOMETHYL)TRIMETHYLSILANE, 95%
1-(TRIISOPROPYLSILYL)PYRROLE
3-AMINOPROPYLTRIS(METHOXYETHOXYETHOXY)SILANE, 95%
TRIETHOXSILYLBUTYRALDEHYDE, tech-90
2-(TRIMETHYLSILYL)PHENYLTRIFLUOROMETHANESULFONATE
BIS(3-TRIETHOXYSILYLPROPYL)CARBONATE
1-(t-BUTYLDIMETHYLSILOXY)-1,3-BUTADIENE, 95%
1-VINYL-3-(CHLOROMETHYL)-1,1,3,3-TETRAMETHYLDISILOXANE
1-(t-BUTYLDIMETHYLSILOXY)-3-CHLOROPROPANE
3-BROMOPROPOXY-t-BUTYLDIMETHYLSILANE
1-PHENYL-3-TRIMETHYLSILYL-2-PROPYN-1-OL
1,4-BIS(TRIMETHYLSILOXY)BENZENETRIS(GLYCIDOXYPROPYLDIMETHYLSILOXY)PHENYLSILANE, 95%
DIISOPROPYLETHOXYSILANE
1,2-BIS(DIMETHYLAMINODIMETHYLSILYL)ETHANE, 96%(4-IODOBUTOXY)-t-BUTYLDIMETHYLSILANE
DI(p-TOLYL)DIMETHOXYSILANE
N-BENZYL-N-METHOXYMETHYL-N-(TRIMETHYLSILYLMETHYL)AMINE, 96%
1,1,1,5,5,5-HEXAMETHYLTRISILOXANE
p-(t-BUTYL)PHENETHYLDIMETHYLCHLOROSILANE(3-TRIETHOXYSILYL)PROPYLSUCCINIC ANHYDRIDE, 95%
PERLITEDIMETHYLBIS(s-BUTYLAMINO)SILANE, 95%
n-OCTYLDIMETHYLMETHOXYSILANE
1,3-DIVINYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
N-(3-METHACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE,50%inmethanol
HEXYLTRIFLUOROSILANE(3,3-DIMETHYLBUTYL)DIMETHYLCHLOROSILANE
6-AZIDOSULFONYLHEXYLTRIETHOXYSILANE, tech-95(DIMETHYLAMINO)METHYLETHOXYSILANE, tech-95
3-(t-BUTYLDIMETHYLSILOXY)-1-PROPYLLITHIUM, 1M in cyclohexane - 20-23 wgt%
6-PHENYLHEXYLDIMETHYLCHLOROSILANE
TRIMETHYLSILYL (TRIMETHYLSILYL)PROPYNOATE
2-(4-PYRIDYLETHYL)TRIETHOXYSILANE
1,2-BIS(METHYLDIMETHOXYSILYL)ETHANEDIPOTASSIUM TRIS(1,2-BENZENEDIOLATO)O,O’ SILICATE(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIETHOXYSILANEPERFLUOROALKYLETHYLTRIETHOXYSILANE(3-CYCLOPENTADIENYLPROPYL)TRIETHOXYSILANE
t-BUTYLDIMETHYLSILOXYACETALDEHYDE, 90%
2-(t-BUTYLDIMETHYLSILOXY)ETHANOLNONAFLUOROHEXYLTRIETHOXYSILANE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLCHLOROSILANEHENEICOSAFLUORODODECYLTRICHLOROSILANEERBIUM TRIS(HEXAMETHYLDISILAZIDE)TRIS(TRIMETHYLSILYL)GERMANE
N-(3-TRIETHOXYSILYLPROPYL)GLUCONAMIDE, 50% in ethanol
1,8-BIS(TRIMETHOXYSILYL)OCTANE(3,3-DIMETHYLBUTYL)TRICHLOROSILANE
2-TRIMETHYLSILOXY-4-ALLYLOXYDIPHENYLKETONE
3-(4-SEMICARBAZIDYL)PROPYLTRIETHOXYSILANE, tech-95
ALLYLDIMETHYL(DIISOPROPYLAMINO)SILANE
N-[5-(TRIMETHOXYSILYL)-2-AZA-1-OXOPENTYL]CAPROLACTAM, 95%
BIS(TRICHLOROSILYLETHYL)BENZENE, tech-95
4-(t-BUTYLDIMETHYLSILOXY)PHENOLMETHACRYLOXYMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed isomers
METHACRYLOXYMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed isomers
t-BUTYLISOPROPYLDIMETHOXYSILANE(3-METHACRYLAMIDOPROPYL)TRIETHOXYSILANE, tech-95
TERBIUM TRIS(HEXAMETHYLDISILAZIDE)n-OCTYLDIMETHYL(DIMETHYLAMINO)SILANE

SIO6712.4
SIA0476.0
SIT8176.0
SIN6597.7
SIB1820.5
SID4045.0
SIE4675.0
SIE4901.83
SIB1939.59
SIB1820.0
SIB1832.0
SIP6732.0
SIA0775.0
SIT8384.8
SIA0614.0
SIT8185.3
SIT8598.5
SIB1824.56
SIB1939.35
SIV9066.0
SIB1939.52
SIB1904.5
SIP6824.6
SIB1835.8
SIT8715.6
SID3539.0
SIB1073.0
SII6400.0
SID4599.0
SIB0966.0
SIH6116.6
SIB1972.5
SIT8192.6
SIP6720.73
SID4040.0
SIO6711.1
SID4611.4
SIM6481.1
SIH6168.0
SID4065.0
SIA0780.0
SID3546.8
SIB1940.6
SIP6736.3
SIT8623.0
SIP6928.0
SIB1632.0
SID4590.0
SIH5841.2
SIP6720.3
SIC2520.0
SIB1939.3
SIB1939.58
SIN6597.65
SIT8170.0
SIH5840.25
SIE4885.0
GET8721.5
SIT8189.0
SIB1832.7
SID4069.0
SIT8570.5
SIS6944.0
SIA0461.0
SIT8394.0
SIB1811.0
SIB1939.6
SIM6481.48
SIM6481.48
SIB1971.0
SIM6480.73
SIT6997.0
SIO6711.3

O
O
F

SIV9080.0
VINYLMETHYLBIS(METHYLETHYLKETOXIMINO)SILANE, 95%
SIT8172.0(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)METHYLDICHLOROSILANE
SIB1939.7
3-(t-BUTYLDIMETHYLSILOXY)PROPAN-1-OL
SIA0588.0(AMINOETHYLAMINOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-90
SIB1030.0
BIS[2-(CHLORODIMETHYLSILYL)ETHYL]BENZENE
SIB1939.55 2-(t-BUTYLDIMETHYLSILOXY)CYCLOHEXANONE
SIT8582.5
3-(TRIMETHYLSILYL)-1,2-BUTADIENE, 95%
SIH5840.4(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)DIMETHYLCHLOROSILANE
SIM6485.8
METHACRYLOXYMETHYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
SIT8192.0
N-(TRIETHOXYSILYLPROPYL)-O-POLYETHYLENE OXIDE URETHANE, 95%
SIB1660.0
BIS[(3-METHYLDIMETHOXYSILYL)PROPYL]POLYPROPYLENE OXIDESIT8571.5
2-TRIMETHYLSILOXY-1,1,1,5,5,5-HEXAFLUOROPENT-2-ENE-4-ONE
SIH6162.0
HEXAVINYLDISILOXANE, 95%
SIT8572.8
11-(TRIMETHYLSILOXY)UNDECYLTRIETHOXYSILANE
SIA0440.0
ALLYL(CHLOROMETHYL)DIMETHYLSILANE, 95%
SID3351.5
DI-tert-BUTYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
SIB0959.0
BENZOYLOXYPROPYLTRIMETHOXYSILANE
SIC2072.0
2-(CARBOMETHOXY)ETHYLTRIMETHOXYSILANE
SIO6617.0
n-OCTADECYLDIMETHYL(DIMETHYLAMINO)SILANE
SIB1969.0
t-BUTYLDIPHENYLMETHOXYSILANE
SIT8588.5
2-(TRIMETHYLSILYL)ETHOXYMETHYL CHLORIDE, 95%
SIV9077.0
VINYL(DIPHENYLPHOSPHINOETHYL)DIMETHYLSILANE
SIB1852.0
BIS(TRIMETHYLSILYL)ACETYLENEDICARBOXYLATESIP6902.4
PROPARGYLOXY-t-BUTYLDIMETHYLSILANE
SIP6910.3
n-PROPYLDIMETHYL(DIMETHYLAMINO)SILANE
SIB1966.0
N-(t-BUTYLDIMETHYLSILYL)-N-METHYLTRIFLUOROACETAMIDE
SIT8594.5(TRIMETHYLSILYLMETHYL)TRI-n-BUTYLTIN
SIC2459.5[2-(3-CYCLOHEXENYL)ETHYL]TRIETHOXYSILANE
SIH5841.0(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRICHLOROSILANE
SIT8174.0(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)TRICHLOROSILANE
SIN6597.6
NONAFLUOROHEXYLTRICHLOROSILANE
SIB1939.5
4-(t-BUTYLDIMETHYLSILOXY)BUTYNE
SIP6716.4
PENTAFLUOROPHENYLPROPYLTRICHLOROSILANE
SIB1813.5
1,1-BIS(TRICHLOROSILYLMETHYL)ETHYLENE
SIT8612.0
2-TRIMETHYLSILYLTHIAZOLE
SIT8335.0
TRIETHYLSILYLTRIFLUOROMETHANESULFONATESIB1966.5
N-(t-BUTYLDIMETHYLSILYL)PHTHALIMIDESIM6496.3(1-METHOXYVINYL)TRIMETHYLSILANE, 95%
SIB1908.0
11-BROMOUNDECYLTRICHLOROSILANE, 95%
SIC2415.0
2-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in methylene chloride
SIC2415.42-(4-CHLOROSULFONYLPHENYL)ETHYLTRICHLOROSILANE, 50% in toluene
SIH6200.0
2-HYDROXY-4-(3-TRIETHOXYSILYLPROPOXY)DIPHENYLKETONE, tech-90
SII6456.6
ISOOCTYLDIMETHYLCHLOROSILANE
SIC2554.0
CYCLOPENTYLSILANE
SIV9095.0
VINYLPHENYLMETHYLMETHOXYSILANE
SIT8387.0
TRIISOPROPYLSILYLTRIFLUOROMETHANESULFONATESIB1400.0
1,3-BIS(3-METHACRYLOXYPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95
SIM6487.6-06 METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 94%
SIM6487.6-20 METHACRYLOXYPROPYLTRIS(TRIMETHYLSILOXY)SILANE, 80%
SIM6487.35 METHACRYLOXYPROPYLTRIISOPROPOXYSILANE
SIT8410.0
N-(3-TRIMETHOXYSILYLPROPYL)PYRROLE
SIT8280.0
1,1,1-TRIETHYL-3,3-DIMETHYLDISILOXANE
SIT8362.0
TRIFLUOROMETHYLTRIMETHYLSILANE
SIT8588.8
TRIMETHYLSILYLETHYNYLTRI-n-BUTYLTIN
SIC2295.1((CHLOROMETHYL)PHENYLETHYL)METHYLDICHLOROSILANE
SID3349.0
1,3-DI-n-BUTYL-1,1,3,3-TETRAMETHYLDISILAZANE
SIB1833.0
BIS(3-TRIMETHOXYSILYLPROPYL)AMINE, 96%
SIH5841.5(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIMETHOXYSILANE
SIA0777.0
3-AZIDOPROPYLTRIETHOXYSILANE
SIA0774.0
p-AZIDOMETHYLPHENYLTRIMETHOXYSILANE, 90%
SID4220.6
DIMETHYLSILA-17-CROWN-6, 90%
SID4221.0
DIMETHYLSILACROWNS, mixed
SID4220.7
DIMETHYLSILA-20-CROWN-7, 90%
SID4221.0
DIMETHYLSILACROWNS, mixed
SIB1021.5
1,3-BIS(2-AMINOETHYLAMINOMETHYL)TETRAMETHYLDISILOXANE, tech-95
SIV9208.0
VINYL(3,3,3-TRIFLUOROPROPYL)DIMETHYLSILANE
SIB1941.0p-(t-BUTYLDIMETHYLSILOXY)STYRENE
SID4614.0
1,4-DIVINYL-1,1,4,4-TETRAMETHYL-1,4-DISILABUTANE
SIT8405.0
S-(TRIMETHOXYSILYLPROPYL)ISOTHIOURONIUM CHLORIDE, 50% in water
SIT8378.5
3-(TRIHYDROXYSILYL)PROPYL METHYLPHOSPHONATE, MONOSODIUM SALT, 42% in water
SIB1933.0
t-BUTYLDICHLOROSILANE
SID3534.0
DIISOPROPYLBIS(TRIFLUOROMETHANESULFONYL)SILANE
SID3345.0
DI-t-BUTYLSILYLBIS(TRIFLUOROMETHANESULFONATE)

PR

73160-32-4
73609-36-6
73842-99-6
74113-77-2
74129-20-7
74173-08-3
74542-82-8
74612-30-974681-63-3
74695-91-3
75009-88-0
75108-40-6
75144-60-4
75389-03-6
75422-66-1
76181-99-2
76241-02-6
76301-00-3
76328-77-3
76358-47-9
76513-69-4
76734-22-0
76734-92-4
76782-82-6
77303-23-2
77377-52-7
77425-85-5
77756-79-7
78560-44-8
78560-45-978560-47-1
78592-82-2
78900-02-4
78948-04-6
79265-30-8
79271-56-0
79293-84-8
79678-01-6
79769-48-5
79793-00-3
79793-00-3
79876-59-8
79957-95-2
80249-74-7
80252-60-4
80522-42-5
80722-63-0
80722-63-0
80722-63-0
80750-05-6
80906-67-8
80907-11-5
81290-20-2
81353-38-0
81870-64-6
82356-80-7
82985-35-1
83048-65-1
83315-69-9
83315-74-6
83890-22-6
83890-22-6
83890-23-7
83890-23-7
83936-41-8
84442-77-3
84494-81-5
84677-98-5
84682-36-0
84962-98-1
85121-42-2
85272-30-6
85272-31-7

CAS Index

Name

www.AZmax.co.jp

TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

CAS Index

ISOBUTYLISOPROPYLDIMETHOXYSILANE
3-CYANOPROPYLDIMETHYL(DIMETHYLAMINO)SILANE(3-ACRYLOXYPROPYL)DIMETHYLMETHOXYSILANE, 95%(m,p-VINYLBENZYLOXY)TRIMETHYLSILANE
SILICON DIOXIDE, amorphous GEL, 30% in isopropanol
SILICON DIOXIDE, amorphous(5-BICYCLO[2.2.1]HEPT-2-ENYL)METHYLDIETHOXYSILANE
3-CYANOPROPYLDIISOPROPYLCHLOROSILANE
3-ACRYLAMIDOPROPYLTRIS(TRIMETHYLSILOXY)SILANE, tech-95
O-(METHACRYLOXYETHYL)-N-(TRIETHOXYSILYLPROPYL)CARBAMATE, 90%
TRIETHOXYSILYLUNDECANAL, tech-95
3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, tech-95
3-(1,3-DIMETHYLBUTYLIDENE)AMINOPROPYLTRIETHOXYSILANE, 98%
11-AMINOUNDECYLTRIETHOXYSILANE(5-BICYCLO[2.2.1]HEPTYL)DIMETHYLCHLOROSILANE
3-AMINOPROPYLDIISOPROPYLETHOXYSILANE
n-OCTYLDIISOPROPYLCHLOROSILANE
1,3-BIS(TRIETHOXYSILYLETHYL)TETRAMETHYLDISILOXANE(2-PYRIDYL)ALLYLDIMETHYLSILANE, 90%
STYRYLETHYLTRIMETHOXYSILANE, tech-90
NONAFLUOROHEXYLDIMETHYLCHLOROSILANETRIFLUOROMETHYLTRIETHYLSILANE[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]DIMETHYLCHLOROSILANE,tech-95,endo/exo isomers
TRIMETHYLSILYL 2,2-DIFLUORO-2-(FLUOROSULFONYL)ACETATE
11-CHLOROUNDECYLTRIETHOXYSILANE(METHACRYLOXYMETHYL)METHYLDIETHOXYSILANE
5-BROMO-2-(t-BUTYLDIMETHYLSILYL)PYRIMIDINE
N-(2-AMINOETHYL)-11-AMINOUNDECYLTRIMETHOXYSILANE
BIS(NONAFLUOROHEXYL)TETRAMETHYLDISILOXANE
N-(3-ACRYLOXY-2-HYDROXYPROPYL)-3-AMINOPROPYLTRIETHOXYSILANE, 50% in ethanol(S)-GLYCIDOXY-t-BUTYLDIMETHYLSILANE
4,4’-BIS(TRIETHOXYSILYL)BIPHENYL
1,2-BIS(METHYLDIETHOXYSILYL)ETHYLENEOCTADECYLMETHYLCHLOROSILANETETRAKIS(2-DIPHENYLPHOSPHINOETHYL)TETRAMETHYLCYCLOTETRASILOXANE, 95%
OCTAKIS(DIMETHYLSILOXY)-T8-SILSESQUIOXANE
3-{2-[ACETOXY(POLYETHYLENEOXY)PROPYL]}HEPTAMETHYLTRISILOXANE, tech-95
2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in methylene chloride
2-(4-CHLOROSULFONYLPHENYL)ETHYLTRIMETHOXYSILANE, 50% in toluene
1,11-BIS(TRIMETHOXYSILYL)-4-OXA-8-AZAUNDECAN-6-OL, 50% in methanol
DICYCLOPENTYLDIMETHOXYSILANE
1,3-DIBROMOHEXAMETHYLTRISILANE, tech-95
m-TERPHENYL-5’-YLTRIMETHYLSILANE
N-(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINETRIACETATE,TRISODIUM SALT,35% in water[3-(1-PIPERAZINYL)PROPYL]METHYLDIMETHOXYSILANE
7-[3-(CHLORODIMETHYLSILYL)PROPOXY]-4-METHYLCOUMARIN, 10% in acetonitrile
O-4-METHYLCOUMARINYL-N-[3-(TRIETHOXYSILYL)PROPYL]CARBAMATE
1,3-BIS(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TETRAMETHYLDISILOXANE
3-PYRIDYLTRIETHOXYSILANE
6-(t-BUTYLDIMETHYLSILOXY)-3,4-DIHYDRO-2H-PYRAN(R)-N-1-PHENYLETHYL-N’-TRIETHOXYSILYLPROPYLUREAVINYLTRIMETHOXYSILANE, oligomeric hydrolysate
METHOXYTRIETHYLENEOXYPROPYLTRIMETHOXYSILANE
BIS(TRIMETHYLSILYLMETHYL)DIMETHOXYSILANE
3-(p-METHOXYPHENYL)PROPYLMETHYLDICHLOROSILANE
2,3,4,5-TETRAMETHYLCYCLOPENTADIENYLTRIMETHYLSILANE
1,5-DIVINYLHEXAMETHYLTRISILOXANE, 95%
BIS(INDENYL)DIMETHYLSILANE
N-(3-TRIETHOXYSILYLPROPYL) O-t-BUTYLCARBAMATE
4-[BIS(TRIMETHYLSILYL)METHYL]PYRIDINE
t-BUTYL(DICHLOROMETHYL)DIMETHYLSILANEDICYCLOPENTYLDICHLOROSILANE
COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX
1-DODECYLHEPTAMETHYLTRISILOXANE, 95%
1,3-BIS[(ACRYLOXYMETHYL)PHENETHYL]TETRAMETHYLDISILOXANE, tech-95(ACRYLOXYMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95 (m-)(ACRYLOXYMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-95 (p-)
N-TRIMETHOXYSILYLPROPYL-N,N,N-TRI-n-BUTYLAMMONIUM CHLORIDE, 50% in methanol
TRIHYDROXYSILYLETHYL PHENYLSULPHONIC ACID, 25% in water
CYCLOPENTYLTRIMETHOXYSILANE
1,1-BIS(TRIMETHOXYSILYLMETHYL)ETHYLENE, tech-95
BIS(TRIMETHYLSILYLMETHYL)BENZYLAMINE(3-ACRYLOXYPROPYL)METHYLDIETHOXYSILANE, 95%

PR

SII6452.6
SIC2452.2
SIA0190.0
SIV9061.0
SIS6963.0
SIS6960.0
SIB0990.3
SIC2450.0
SIA0150.0
SIM6480.8
SIT8194.0
SID4068.0
SID4068.1
SIA0630.0
SIB0994.0
SIA0602.0
SIO6710.5
SIB1820.2
SIP6923.0
SIS6990.0
SIN6597.3
SIT8356.0
SIB0982.0
SIT8588.4
SIC2428.0
SIM6481.43
SIB1879.5
SIA0595.0
SIB1709.0
SIA0180.0
SIG5805.0
SIB1816.8
SIB1618.0
SIO6624.4
SIT7281.0
SIO6696.5
SIA0075.0
SIC2417.0
SIC2417.4
SIB1832.8
SID3391.0
SID2764.0
SIT6997.2
SIT8402.0
SIP6828.4
SIC2266.8
SIM6502.0
SIB1120.0
SIP6934.0
SIB1939.57
SIP6731.5
SIV9220.2
SIM6493.4
SIB1866.0
SIM6492.4
SIT7525.0
SID4610.0
SIB1205.0
SIT8186.5
SIB1866.6
SIB1932.8
SID3390.0
AKC252.8
SID4627.6
SIB1000.0
SIA0184.0
SIA0184.0
SIT8414.0
SIT8378.1
SIC2557.0
SIB1832.5
SIB1863.7
SIA0197.0

Name147986-73-0
148859-49-8
150112-38-2
151198-82-2
151613-23-9
151613-24-0
151613-25-1
151778-80-2
151837-46-6
152958-91-3
153487-58-2
153723-40-1
156145-62-9
156145-66-3
156214-80-1
156323-66-9
156849-43-3
157223-33-1
157499-19-9
157859-20-6
157923-74-5
159856-61-8
160172-46-3
160676-58-4
160676-60-8
151395-68-5
162578-86-1
162781-70-6
163079-25-2
163124-51-4
163155-56-4
163155-57-5
163794-91-0
165454-24-0
166970-54-3
167160-55-6
167426-89-3
170381-99-4
174094-37-2
174219-86-4
177617-17-3
178884-91-8
179611-74-6
181186-37-8
181231-66-3
181231-67-4
181231-68-5
182008-07-7
182008-07-7
186598-40-3
186599-45-1
186599-46-2
187592-85-4
188541-09-5
193358-40-6
193417-26-4
193828-96-5
194033-87-9
194242-99-4
194243-00-0
194933-15-8
197662-64-9
198087-81-9
198567-47-4
198570-38-6
198570-39-7
200946-85-6
201603-69-2
204760-82-7
205503-61-3
209866-89-7
211923-87-4
211925-40-5

BIS(NONAFLUOROHEXYLDIMETHYLSILOXY)METHYLSILANE, 95%
1,1,3,3-TETRACHLORO-1,3-DISILABUTANE, tech-90
TRIMETHYLGERMYLTRICHLOROSILANE
1,1,2-TRIS(TRIETHOXYSILYL)ETHANE, tech-95
n-OCTADECYLDIISOBUTYL(DIMETHYLAMINO)SILANE, 95%
PHENETHYLDIISOPROPYLCHLOROSILANE
n-OCTYLDIISOPROPYL(DIMETHYLAMINO)SILANE
3-{[DIMETHYL(3-TRIMETHOXYSILYL)PROPYL]AMMONIO}PROPANE-1-SULFONATE, tech 95
DIBENZYLOXYDIACETOXYSILANE, tech-95
4-PHENYLBUTYLTRIMETHOXYSILANE
3-AMINOPROPYLDIMETHYLFLUOROSILANE, 95%
3-CYANOPROPYLMETHYLDIMETHOXYSILANETETRAKIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-90
VINYLMETHYLBIS(METHYLISOBUTYLKETOXIMINO)SILANE, tech-95
N-(3-TRIETHOXYSILYLPROPYL)-4-HYDROXYBUTYRAMIDEBIS(NONAFLUOROHEXYL)DICHLOROSILANE
4-AMINO-3,3-DIMETHYLBUTYLMETHYLDIMETHOXYSILANE
NEOPHYLMETHYLDIMETHOXYSILANEPENTAFLUOROPHENYLPROPYLDIMETHYLCHLOROSILANEACRYLOXYTRIISOPROPYLSILANE
4-AMINO-3,3-DIMETHYLBUTYLTRIMETHOXYSILANEO-(VINYLOXYBUTYL)-N-TRIETHOXYSILYLPROPYL CARBAMATE, tech-95
VINYLTRIS(DIMETHYLSILOXY)SILANE((CHLOROMETHYL)PHENYLETHYL)METHYLDIMETHOXYSILANE((CHLOROMETHYL)PHENYLETHYL)METHYLDIMETHOXYSILANETETRAKIS(2-OCTYLDODECYLOXY)SILANE, tech-95
n-OCTADECYLDIISOBUTYLCHLOROSILANE, 95%
HYDROXYMETHYLTRIETHOXYSILANE, 50% in ethanol
2-THIENYL-t-BUTYLDIMETHYLSILANE
1,3-BIS(3-CHLOROPROPYL)TETRAKIS(TRIMETHYLSILOXY)DISILOXANE, tech-95(3-CYANOBUTYL)TRICHLOROSILANE
3-(p-METHOXYPHENYL)PROPYLTRICHLOROSILANE
3-CYANOPROPYLDIISOPROPYL(DIMETHYLAMINO)SILANE
3-(3-ISOCYANATOPROPYL)HEPTAMETHYLTRISILOXANE, 95%
ALLYL(3-CHLOROPROPYL)DICHLOROSILANE
3-OCTADECYLHEPTAMETHYLTRISILOXANE, 95%
CHLOROMETHYLPHENETHYLTRIS(TRIMETHYLSILOXY)SILANE, mixed m,p; α,β isomers
1,2-BIS(METHYLDIFLUOROSILYL)ETHANE
5-BROMOPENTYLTRICHLOROSILANE
t-BUTYLAMINOPROPYLTRIMETHOXYSILANE(3-ACRYLOXYPROPYL)METHYLBIS(TRIMETHYLSILOXY)SILANE, tech-90
N,N’-BIS-[(3-TRIETHOXYSILYLPROPYL)AMINOCARBONYL]POLYETHYLENE OXIDE (10-15 EO)
BIS(1-IMIDAZOLYL)DIMETHYLSILANE, tech-95
METHYLTRIMETHOXYSILANE, oligomeric hydrolysate
TRIISOPROPYLDIMETHYLAMINOSILANE
n-BUTYLDIMETHYL(DIMETHYLAMINO)SILANE
PHENETHYLDIMETHYL(DIMETHYLAMINO)SILANE
2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE
2,2-DIMETHOXY-1,6-DIAZA-2-SILACYCLOOCTANE, 10% in cyclohexane
DI(t-BUTYLAMINO)SILANE(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIS(DIMETHYLAMINO)SILANENONAFLUOROHEXYLTRIS(DIMETHYLAMINO)SILANE
n-OCTYLTRIS(TRIMETHYLSILOXY)SILANE, 95%
NITROVERATRYLOXYCARBONYLAMIDOPROPYLTRIETHOXYSILANE, 10% in tetrahydrofuran
1,4-BIS(TRIMETHOXYSILYLMETHYL)BENZENE
N-[3-(TRIETHOXYSILYL)PROPYL]-2-CARBOMETHOXYAZIRIDINE, 95%
TRIVINYLMETHOXYSILANE, 95%
TRIS(TRIMETHYLSILOXY)ANTIMONY
13-(TRICHLOROSILYLMETHYL)HEPTACOSANE, 95%
13-(CHLORODIMETHYLSILYLMETHYL)HEPTACOSANE, 95%
1,2,3,4,5,6-HEXAKIS[2-(METHYLDICHLOROSILYL)ETHYL]BENZENEETHYL 4-(TRIETHOXYSILYL)BENZOATE, 90%
BIS[m-(2-TRIETHOXYSILYLETHYL)TOLYL]POLYSULFIDE, tech-90
3-(4-PYRIDYLETHYL)THIOPROPYLTRIMETHOXYSILANE[(5-BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]METHYLDICHLOROSILANE,tech-95,endo/exo isomers
1,3-BIS[(BICYCLO[2.2.1]HEPT-2-ENYL)ETHYL]TETRAMETHYLDISILOXANE(R)-N-TRIETHOXYSILYLPROPYL-O-QUININEURETHANE, 95%
4,4’-BIS(DIMETHYLETHOXYSILYL)BIPHENYL
3-CYANOPROPYLPHENYLDIMETHOXYSILANE, 95%
TRI-(t-BUTYLAMINO)SILANE, 95%
N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE, tech-90
2,2-BIS(ALLYLOXYMETHYL)-1-TRIMETHYLSILOXYBUTANE, 95%
p-(t-BUTYL)PHENETHYLTRICHLOROSILANE

SIB1708.0
SIT7084.0
GET8561
SIT8716.6
SIO6610.0
SIP6720.8
SIO6710.7
SID4241.0
SID2754.6
SIP6724.92
SIA0603.4
SIC2453.5
SIT7290.0
SIV9801.0
SIT8189.5
SIB1705.0
SIA0587.05
SIN6597.1
SIP6716.2
SIA0315.0
SIA0587.07
SIV9088.4
SIV9269.5
SIC2295.2
SIC2295.2
SIT7291.0
SIO6608.0
SIH6175.0
SIT7906.9
SIB1055.8
SIC2438.0
SIM6492.5
SIC2451.0
SII6454.3
SIA0441.0
SIO6622.0
SIC2295.7
SIB1630.0
SIB1894.0
SIB1932.3
SIA0194.0
SIB1824.82
SIB1185.0
SIM6560.2
SIT8384.5
SIB1937.0
SIP6721.2
SID3543.0
SID3543.1
SID2795.0
SIH5841.7
SIN6597.8
SIO6715.7
SIN6597.25
SIB1832.2
SIT8186.7
SIT8732.0
SIT8717.7
SIT8162.0
SIC2266.0
SIH6080.0
SIE4901.3
SIB1820.5
SIP6926.4
SIB0984.0
SIB1026.2
SIT8192.4
SIB1082.0
SIC2453.8
SIT8090.0
SIB0956.0
SIB1020.0
SIB1973.0

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Enabling Your Technology

CAS Number Catalog #SILICON

Name

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CAS Number Catalog #439

CAS Index

Name

211931-07-6
211934-50-8211935-21-6
211945-95-8
211985-18-1
211985-85-2
211985-86-3
213602-91-6
214268-06-1
214362-07-9

SID2752.0
SIO6624.0
SIP6722.8
SIT8716.0
SIV9062.0
SIV9088.0
SIV9205.0
SIP6932.0
SIT8605.0
SIB1142.0

220527-24-2
220727-26-4
221105-38-0
223668-64-2
223668-68-6
225794-57-0
226558-82-3
227085-51-0
228700-87-6
229621-70-9247244-66-2
251453-07-3
253279-88-8
253788-37-3
254455-63-5
255727-67-4
256343-28-9259727-10-1
259818-29-6
261717-41-3
264128-94-1
275378-62-6
282534-42-3
303191-26-6
303746-21-6
307531-94-8
309963-45-9
314021-97-1
314270-00-3
330457-42-6
330457-44-8
330457-46-0
334521-23-2
359859-29-3
376353-50-3
383189-04-6
388606-32-4
394210-97-0
401514-97-4404392-70-7
438569-05-2
441307-02-4
445303-83-3
447440-43-9
469904-32-3
469904-33-4
475213-01-5
475213-02-6
475213-03-7
502925-36-2
502925-40-8
518359-82-5
521069-00-1
521069-01-2
526204-46-6
561069-04-3
618914-44-6
618914-49-1
620987-03-3
623938-90-9

SIC2265.5
SIO6704.0
SIC2058.2
SIP6716.73
SIB1710.0
SIT8719.5
SIB1879.7
SIE4886.0
SIM6493.2
SIB1770.0
SIB1403.0
SIM6492.3
SIE4897.2
SIC2456.5
SIT7275.0
SIB1891.6
SIT8686.0
SID4465.0
SIE4897.5
SIH5844.5
SIH6171.5
SIE4885.8
SIA0070.0
SIP6716.6
SIV9277.0
SIM6486.65
SIB0950.0
SIT8397.0
SIP6917.2
SIB1907.6
SID4618.0
SIH6172.0
SIA0795.0
SID4557.5
SIM6509.0
AKB159.5
SIA0604.0
SIM6479.3
SIT8045.4
SIB1966.3
SIT8177.0
SIB1138.0
SIB1811.5
SIA0433.0
SIT8173.0
SIB1907.8
SIV9073.8
SID4401.5
SID4401.0
SIB1845.0
SIT8186.0
SIO6600.0
SIB1815.7
SIB1815.5
SIP6723.4
SIT8345.0
SIB1932.4
SIA0415.0
SIB1808.0
SIB0957.0

627882-90-0
666829-33-0

SIA0070.0
SIB1824.84

1,3-DIALLYLTETRAKIS(TRIMETHYLSILOXY)DISILOXANE, 95%
n-OCTADECYLMETHOXYDICHLOROSILANE, tech-95
PHENETHYLTRIS(TRIMETHYLSILOXY)SILANE
TRIS(TRICHLOROSILYLETHYL)METHYLSILANE, tech-95
VINYL(BROMOMETHYL)DIMETHYLSILANEVINYLOCTYLDICHLOROSILANEVINYL(TRIFLUOROMETHYL)DIMETHYLSILANE
2-PYRIDYLTRIETHOXYSILANE
3-TRIMETHYLSILYLPROPARGYLMETHACRYLATE, 95%
N,N’-BIS(2-HYDROXYETHYL)-N,N’-BIS(TRIMETHOXYSILYLPROPYL)ETHYLENEDIAMINE,
66-68% in methanol(CHLORODIMETHYLSILYL)-5-[2-(CHLORODIMETHYLSILYL)ETHYL]BICYCLOHEPTANES-(OCTANOYL)MERCAPTOPROPYLTRIETHOXYSILANE
3-CARBAZOLYLPROPYLTRIETHOXYSILANEPENTAFLUOROPHENYLTRIMETHOXYSILANE
BIS(PENTAFLUOROPHENYL)DIMETHOXYSILANE[TRIS(TRIMETHYLSILOXY)SILYLETHYL]DIMETHYLCHLOROSILANE
4-BROMOBUTYLTRIMETHOXYSILANE(3-(N-ETHYLAMINO)ISOBUTYL)TRIMETHOXYSILANE
METHOXYTRIETHYLENEOXYPROPYLTRICHLOROSILANE
1,2-BIS(TETRAMETHYLDISILOXANYL)ETHANE, 95%
1,3-BIS(METHACRYLOXY)-2-TRIMETHYLSILOXYPROPANE, 95%
1-(4-METHOXYPHENYL)-1-CHLOROSILACYCLOBUTANE
m,p-ETHYLPHENETHYLDIMETHYLCHLOROSILANE, tech-95
11-CYANOUNDECYLTRIMETHOXYSILANETETRAKIS(BUTOXYETHOXYETHOXY)SILANE, tech-95[11-(2-BROMO-2-METHYL)PROPIONYLOXY]UNDECYLTRICHLOROSILANE(TRIPHENYLMETHYL)METHYLDICHLOROSILANE
N,N-DIOCTYL-N’-TRIETHOXYSILYLPROPYLUREA
m,p-ETHYLPHENETHYLTRIMETHOXYSILANE, tech-95(E)-HEPTENYLDIISOPROPYLSILANOLN-(HYDROXYETHYL)-N,N-BIS(TRIMETHOXYSILYLPROPYL)AMINE, 65% in methanol(3-(N-ETHYLAMINO)ISOBUTYL)METHYLDIETHOXYSILANE
4-ACETOXYPHENETHYLTRICHLOROSILANEPENTAFLUOROPHENYLPROPYLTRIMETHOXYSILANEVINYLTRIS(1-METHOXY-2-PROPOXY)SILANEMETHACRYLOXYPROPYLHEPTAISOBUTYL-T8-SILSESQUIOXANE, tech-95
BENZHYDRYLOXYBIS(TRIMETHYLSILOXY)CHLOROSILANE(3-TRIMETHOXYSILYL)PROPYL 2-BROMO-2-METHYLPROPIONATEPROPYLTRIETHOXYSILANE, oligomeric hydrolysate
11-BROMOUNDECYLDIMETHYLCHLOROSILANE, 95%
DOCOSENYLTRIETHOXYSILANE, 95%
N-(HYDROXYETHYL)-N-METHYLAMINOPROPYLTRIMETHOXYSILANE, 75% in methanol
11-AZIDOUNDECYLTRIMETHOXYSILANE, 95%(2-DIPHENYLPHOSPHINO)ETHYLDIMETHYLETHOXYSILANE
3,4-METHYLENEDIOXYPHENYLTRIETHOXYSILANE
BORON VINYLDIMETHYLSILOXIDE
N-(3-AMINOPROPYLDIMETHYLSILYL)AZA-2,2-DIMETHYL-2-SILACYCLOPENTANE
11-MERCAPTOUNDECYLOXYTRIMETHYLSILANE
3-TRIACONTYLHEPTAMETHYLTRISILOXANE, tech-85
t-BUTYLDIMETHYLSILYL-N-PHENYLBENZIMIDATEp-(TRIETHOXYSILYL)ACETOPHENONE, 95%
1,3-BIS(3-(2-HYDROXYETHOXY)PROPYL)TETRAMETHYLDISILOXANE, 95%
1,8-BIS(TRICHLOROSILYLETHYL)HEXADECAFLUOROOCTANE(S,S)-2-ALLYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE(TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)SILANE
11-BROMOUNDECYLSILANEVINYLDI-n-OCTYLMETHYLSILANE
2-(DI-n-OCTYLMETHYLSILYL)ETHYLTRICHLOROSILANE
2-(DI-n-OCTYLMETHYLSILYL)ETHYLDIMETHYLCHLOROSILANE
3-[BIS(TRIMETHYLSILOXY)METHYLSILYLPROPOXY]SULFOLANE
3-[2-(3-TRIETHOXYSILYLPROPOXY)ETHOXY]SULFOLANE, 95%
OCTA(AMINOPHENYL)-T8-SILSESQUIOXANE
BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLSILANE
BIS((TRIDECAFLUORO-1,1,2,2-TETRAHYDROOCTYL)DIMETHYLSILOXY)METHYLCHLOROSILANE
11-PHENOXYUNDECYLTRICHLOROSILANE
p-TRIFLUOROMETHYLTETRAFLUOROPHENYLTRIETHOXYSILANE
N-n-BUTYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
N-ALLYL-AZA-2,2-DIMETHOXYSILACYCLOPENTANE
1,2-BIS(TRICHLOROSILYL)DECANE
N-(2-N-BENZYLAMINOETHYL)-3-AMINOPROPYLTRIMETHOXYSILANE hydrochloride,
90%,50% in methanol, 90%
4-ACETOXYPHENETHYLTRICHLOROSILANE
BIS(3-TRIETHOXYSILYLPROPYL)POLYETHYLENE OXIDE (25-30 EO)

PR
440

CAS Number Catalog #Name675129-70-1
680592-40-9684284-12-6
718635-97-3
722542-79-2
722542-80-5
724460-16-6
773893-02-0
793681-94-4
832079-33-1
848821-58-9862911-98-6
862911-99-7
862912-02-5
864466-71-7
865811-55-8
865811-56-9865811-59-2
866935-66-2
870987-68-1
870998-79-0

4-NITRO-4’(N-ETHYL-N-TRIMETHOXYSILYLCARBAMATO)AMINOAZOBENZENE, tech-95(S,S)-2-PHENYL-2-CHLORO-3,4-DIMETHYL-5-PHENYL-[1,3,2]-OXAZASILOLIDINE(-)-CAMPHANYLDIMETHYLCHLOROSILANEp-(METHYLPHENETHYL)METHYLDICHLOROSILANE, 95%(p-METHYLPHENETHYL)METHYLDIMETHOXYSILANE, 95%(p-METHYLPHENETHYL)METHYLDIMETHOXYSILANE, 95%
11-CYANOUNDECYLTRICHLOROSILANE
5-BROMOPENTYLTRIMETHOXYSILANE(3-CYANOBUTYL)METHYLDIMETHOXYSILANE
1,2-BIS(TRIMETHOXYSILYL)DECANE(S)-(-)-[(DIPHENYL)TRIMETHYLSILOXYMETHYL]PYRROLIDINE
2,2-BIS(3-TRIETHOXYSILYLPROPOXYMETHYL)BUTANOL, 50% in ethanol
3,3-BIS(TRICHLOROSILYLPROPOXYMETHYL)-5-OXA-TRIDECANE, 95%
1,3-BIS(3-TRICHLOROSILYLPROPOXY)-2-DECYLOXYPROPANE
2-(S)-[(DIPHENYL)(t-BUTYLDIMETHYLSILOXY)METHYL]PYRROLIDINE
TRIS(DIMETHYLSILOXY)ETHOXYSILANE, tech-95
1,1,3,3-TETRACYCLOPENTYLDICHLORODISILOXANE
1,5-BIS(GLYCIDOXYPROPYL)-3-PHENYL-1,1,3,5,5-PENTAMETHYLTRISILOXANE
TRIETHOXYSILYLUNDECANAL, ETHYLENE GLYCOL ACETALO-(PROPARGYL)-N-(TRIETHOXYSILYLPROPYL) CARBAMATE, 90%[PERFLUORO(POLYPROPYLENEOXY)]METHOXYPROPYLTRIMETHOXYSILANE, 20% in
fluorinated hydrocarbon
10-UNDECENYLTRIMETHOXYSILANE
TRIHYDROXYSILYLETHYL PHENYLSULPHONIC ACID, 25% in water
11-MERCAPTOUNDECYLTRIMETHOXYSILANE, 95%(3-(3-THYMINYL)PROPIONOXY)PROPYLTRIMETHOXYSILANESODIUM (2-THIENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM (2-FURYL)DIMETHYLSILANOLATE(5-BICYCLO[2.2.1]HEPT-2-ENYL)DIMETHYLETHOXYSILANE
4-(TRIETHOXYSILYLPROPOXY)-2,2,6,6-TETRAMETHYLPIPERIDINE N-OXIDE, tech-85
1,3-BIS(4-BIPHENYL)-1,1,3,3-TETRAMETHYLDISILAZANE, 95%
TRIETHOXSILYLBUTYRALDEHYDE, tech-90
O-DL-a-TOCOPHEROLYLPROPYLHEPTAMETHYLTRISILOXANE, tech-90(S)-2-[TRIMETHYLSILOXY(DIPHENYL)METHYL]PYRROLIDINE
11-(2-METHOXYETHOXY)UNDECYLTRICHLOROSILANEPENTAFLUOROPHENOXYUNDECYLTRIMETHOXYSILANE
7-TRIETHOXYSILYLPROPOXY-5-HYDROXYFLAVONE, 50% in xylene
DI-n-OCTYLDIMETHOXYSILANE
1,7-BIS(4-TRIETHOXYSILYLPROPOXY-3-METHOXYPHENYL)-1,6-HEPTADIENE-3,5-DIONE,tech-9011-ACETOXYUNDECYLTRIETHOXYSILANE
n-DECYLTRIS(DIMETHYLAMINO)SILANE
TRIETHOXYSILYLPROPOXY(POLYETHYLENEOXY)DODECANOATE, tech-95(3-CYANOBUTYL)TRIETHOXYSILANE(1-(3-TRIETHOXYSILYL)PROPYL)-2,2-DIETHOXY-1-AZA-2-SILACYCLOPENTANE, tech-90(3-CHLOROPROPOXY)ISOPROPYLDIMETHYLSILANE
11-ALLYLOXYUNDECYLTRIMETHOXYSILANE
10-(CARBOMETHOXY)DECYLDIMETHYLMETHOXYSILANEPENTAFLUOROPHENYLPROPYLMETHYLDICHLOROSILANE
6-PHENYLHEXYLDIMETHYL(DIMETHYLAMINO)SILANE
3-PHENYLPROPYLMETHYLDIMETHOXYSILANE(AZIDOMETHYL)PHENETHYLTRIMETHOXYSILANE, tech-90
TRIS(TRIETHOXYSILYLMETHYL)AMINE, tech-90
4-R-8-HYDRO-9-[BIS(TRIMETHYLSILOXY)METHYLSILYL]LIMONENE
4-R-8-HYDRO-9-[BIS(TRIMETHYLSILOXY)METHYLSILYL]LIMONENEOCTAETHOXY-1,3,5-TRISILAPENTANEN-(ACETYLGLYCYL)-3-AMINOPROPYLTRIMETHOXYSILANE, 5% in methanol
3-(N-ACETYL-4-HYDROXYPROLYLOXY)PROPYLTRIETHOXYSILANE, 25% in ethanol
DI-t-BUTYLISOBUTYLSILANE
DI-t-BUTYLISOBUTYLSILYLTRIFLUOROMETHANESULFONATEVINYL(CHLOROMETHYL)DIMETHOXYSILANEACETOXYETHYLTRIS(DIMETHYLAMINO)SILANE
TRIS(TRIMETHYLSILOXY)SILYLETHYLTRIETHOXYSILANE
3-(TETRAHYDROFURFURYLOXYPROPYL)HEPTAMETHYLTRISILOXANE
2-(3-TRIMETHOXYSILYLPROPYLTHIO)THIOPHENE
2,2,3,3-TETRAMETHYLTETRASILANE, 95%
N-(N-ACETYLLEUCYL)-3-AMINOPROPYLTRIETHOXYSILANE, 12-15% in ethanol
TRIS(SILYLMETHYL)SILANEOCTYLTRIETHOXYSILANE, oligomeric hydrolysate

SIN6597.24
SIP6724.95
SIC2056.2
SIM6511.0
SIM6511.2
SIM6511.2
SIC2456.3
SIB1894.2
SIC2437.5
SIB1829.0
SID4589.0
SIB1824.4
SIB1815.3
SIB1815.1
SID4480.0
SIT8715.4
SIT7087.0
SIB1110.0
SIT8194.5
SIP6902.6
SIP6720.72

OOF

CAS Number Catalog #www.AZmax.co.jp

TEL: 03-5543-1630

872575-06-9 SIU9049.0
876338-08-8 SIT8378.1
877593-17-4 SIM6480.0
879197-67-8 SIT7909.7
879904-87-7 SIS6987.0
879904-88-8 SIS6980.6
899823-76-8 SIB0981.0
913375-27-6 SIT8186.45
916667-75-9 SIB1026.4
917773-12-7 SIT8185.3
920741-92-0 SIT8011.0
937202-23-8 SIT8571.28
943349-49-3 SIM6491.5
944721-47-5 SIP6716.0
945761-08-0 SIT8186.2
947155-81-9 SID4400.4
947329-82-0 SIB1824.8
959053-85-1 SIA0115.0
1015787-64-0 SID2671.0
1041420-54-5 SIT8186.3
1049679-56-2 SIC2439.0
1184179-50-7 SIT8187.2
1191036-21-1 SIC2335.0
1196453-35-6 SIA0482.0
1211488-83-3 SIC2067.0
1220126-66-8 SIP6716.3
1223044-18-5 SIP6736.32
1233513-31-9 SIP6744.2
1245946-78-4 SIA0770.0
1250435-76-7 SIT8716.2
1263043-99-7 SIH6168.7
1263044-00-3 SIH6168.7
1263429-91-9 SIO6660.0
1274903-53-5 SIA0120.2
1300591-79-0 SIA0126.0
1314639-85-4 SID3224.0
1314639-86-5 SID3226.01314981-48-0 SIV9064.0
1356113-09-1 SIA0035.0
1356114-66-3 SIT8721.2
1361237-41-3 SIT7122.4
1364140-50-0 SIT8411.0
1364487-19-3 SIT7580.0
1367348-25-1 SIA0127.0
1385027-19-9 SIT8715.9
1385031-14-0 SIO6715.2

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Silicones

PR

O
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Section 3-Silicone Articles

Ring-Opening Polymerization of Cyclosiloxanes
by Julian Chojnowski . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 443

Telechelic Siloxane Oligomers: Versatile Starting
Materials for Novel Polymers and Applications
by Iskender Yilgor . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 453

Section 4-Silicone Polymers:
Registry of Products and Properties

Silicone Fluids – Stable Inert Media . . . . . . . . . . . . . . . . . . . . . 459
Reactive Silicones – Forging New Polymer Links . . . . . . . . . 489
Silicone Index . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 553

Section 5-Performance Products

Molecular Films . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 559
Thin Films. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 565
Thick Films . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 571
Gels . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 580
Casting Resins . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 582
Encapsulants . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 583
Reprographic Elastomers . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 585

O
O
F

PR
442

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RING-OPENING POLYMERIZATION OF CYCLOSILOXANESBy Julian Chojnowski
Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences
Sienkiewicza 112, 90-363 Łódź, Poland

Introduction

n

Si

O

Si

O
O
F

Ring-opening polymerization (ROP) of cyclic siloxanes is
a process of the transformation of a cyclic siloxane into a linear
siloxane polymer as a result of the cleavage of the SiOSi bond in
the siloxane ring and the subsequent reformation of this bond in
the polymer chain. (Eq. 1)
(1)

Si O

Si

n

For over 60 years this reaction has been extensively used inindustry and in chemical laboratories as the basic method for thegeneration of high molecular weight linear polysiloxanes. It gives
advantages over the polycondensation of difunctional silanes, as
it allows for better control of the size and structure of the desired
siloxanes. In contrast with the polycondensation route, less low
molecular weight side products are formed during the ROP
process and the concentration of the reactive end groups remains
at a low stationary level during chain growth. Reviews on thissubject are available.1-7

PR

A suitable monomer for the ROP of siloxanes may be any
cyclic compound containing a reactive SiOSi group in its ringskeleton, which is thermodynamically less stable compared toits linear counterpart. Many cyclic oligosiloxanes of the generalformula (R1R2SiO)n having various substituents at silicon andvarious ring sizes fulfill this condition. Thus, the family ofmonomers of the ROP process is broad. In addition to the siloxane
moiety, other atoms or groups of atoms in the monomer rings canalso be employed in this process. Examples of some typical ROP
monomers of cyclic siloxanes are shown in Figure 1.
Me

Si
Me
O

O

Si

Me

Me
Si
Me
O

Me

Me
Me
Si O Me
O
Si
Me
Me
Si
O
Me O Si
Me
Me

D3

Me

Me

Me

Si

CF3

F3C

Me

Me

Si

O

O

Me

Si
Me
O

Me

CF3

Si
O

Me

Si
Si

Si

[9] B

O

O
Si

Si
O
Me

D2P

Si

Si

O Si
Me
Me

[8] A

Si

cis-F3

Si

Me

Si

O

Si
O

Me

D4

Me
Si O

The most important monomers are: octamethylcyclotetrasiloxane, abbreviated as D4 (D marks the Me2SiO unit) andhexamethylcyclotrisiloxane, abbreviated as D3. D4 monomer is by
far the most common as it is the most thermodynamically stable
cyclic siloxane.1 While D4 is the monomer most often used in theequilibrium polymerization of cyclosiloxanes (section 3.1), D3
is a common monomer in the kinetically controlled synthesis ofpolysiloxanes (section 3.2).2-7 Cyclosiloxane cis-F3 is an exampleof the monomer having configurational units. The ROP of thistype of monomers may lead to polymers of various tacticities, i.e.,stereochemical structures.13 The polymerization of monomer D2P,
and other cyclosiloxanes with mixed units, may lead to various
sequences of siloxane units in the polymer chain.14 Structures in thelower row of Figure 1 represent examples of monomers with otheratoms in the ring skeleton capable of forming linear polymers or
copolymers by siloxane bond breaking and making mechanisms.

O
O

Si
Si

Si
N

O
Si

Si
N

Si

[10] C[11] D[12] E

Figure 1. Examples of monomers for ROP of cyclosiloxanes8-12

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The ROP of cyclosiloxanes is classified as anionic (AROP)or cationic (CROP) according to the charge of their reactive
intermediates (active propagation centers). The other ROP
classification depends on the way polymer chain growth iscontrolled. Equilibrium ROP, with thermodynamic control ofproducts, can be distinguished from non-equilibrium ROP,
with kinetic control of products. ROP of cyclosiloxanes may
be performed in different conditions: in bulk, in solution, as anemulsion or miniemulsion, and in the solid state.

Anionic and Cationic Routes of ROP
of Cyclosiloxanes

Anionic Ring-Opening Polymerization (AROP)
of Cyclosiloxanes
The AROP of cyclosiloxanes is initiated by strong inorganicor organic bases. Alkali metal hydroxides, such as KOH,
and silanolates derived from them are common catalysts.1-7
Hydroxides and silanolates with quarternary ammonium or
phosphonium counter-ions, such as Me4NOH and Bu4POH,
are very effective AROP catalysts. Their additional benefit isconnected to thermolability, which permits stabilization of thepolymer by the thermal decomposition of the active propagation
centers.15 Organic bases, such as organolithium reagents, arevery reactive and important initiators, often used for precisionsynthesis of polysiloxanes with narrow polydispersivities.
Another class of AROP initiators are organic superbases, suchas peraminooligophosphazenium hydroxides or alkoxides andthermolabile phosphorus ylides.16-19 These are able to initiate very
fast polymerizations under relatively mild conditions.

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AROP of cyclosiloxanes is initiated by ring opening of
the monomeric cyclic producing a silanolate ion, which thenpropagates the polymer chain via subsequent ring opening ofmonomer.20 (Eq. 2-3)O

initiation

Cat+ HO—+propagation

HO Si

Si O— Cat+

Si

HO Si

Si

+ n

Si

O

Si

Si O— Cat+

HO Si

(2)

Si O— Cat+

Si

Si O

(3)

n

quenching

Si OK

backbiting

Si O Si

chain transfer

R
Si O—Cat+R+ Me3SiCl

Si O— Cat++Si O SiSi OSiMe3+ KCl

Si O—Cat++R
Si O Si
R

(4)

Si

O

(5)

Si

Si O—Cat+

+

(6)

PR

Oligosiloxane-α,ω-disilanolates, such as KO(SiMe2O)
OK,
may be used as the initiator, eliminating silanol endn
groups from the polymerization system. These groups strongly
influence the control of the polymer structure.21 In addition,
oligosiloxanediolates having sufficiently long chain are soluble in
the polymerization system.
AROP of cyclosiloxanes is strongly affected by the interactionof the ionic propagation centers.21 The typical active form of asiloxane propagation center is an ion pair. The silanolate ion pair
exhibits a strong tendency for aggregation.22 (Eq. 7)n

Si O—Cat+Si O—Cat+(7)n

The aggregates are not able to propagate, thus they form
dormant propagation centers. The polymerization kinetics are
greatly affected by this phenomenon. Since the equilibriumof aggregation is shifted towards the side of the complex,
polymerization is strongly inhibited and exhibits fractional orderin initiator. Without addition of a promoter, rate is dependent on
the counter-ion: Li+<Na+<K+<Rb+<Cs+~R4N+~R4P+.
Addition of promoter, a strong uncharged nucleophilic
species such as dimethylsulfoxide (DMSO), hexamethyltriamide

444

Crown ethers and cryptands accelerate the reaction
efficiently as they multidentally coordinate the counter-ion.24,25
Bases containing cations with highly delocalized charge,such as peraminooligophosphazenium ions, induce very fastpolymerization. D4 has been reported to be polymerized in 1-5
min at room temperature with such bases.16-18

OO
F

In the absence of water and CO2 from atmosphere or otheracidic contamination, the active propagating species is stable.
Thus, there is no termination and the reaction must be quenched.
Trimethylchlorosilane is a commonly used quench, which
introduces an inert trimethylsilyl unit at the polymer chain end.
(Eq. 4) Propagation of the polymer chain is accompanied bybackbiting, which leads to cyclic oligomers and macrocycles, andchain transfer, which results in randomization of the polymer
chain. (Eq. 5-6)of orthophosphoric acid (HMPA), or dimethylformamide (DMF)
effectively increases the rate of polymerization by forming morereactive ion pairs and increasing the concentration of nonaggregated silanolate.21,23 The same effect is attained when thereaction is performed in a solvent interacting with countercation.
This is the reason why the polymerization of D3 with lithiumsilanolate initiator is complete within several hours in THF solventat room temperature, but no polymerization occurs in bulk orhydrocarbon solvent at temperatures as high as 100 oC.

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Rate of AROP is influence by the monomer structure of thecyclic siloxane —the ring size and substituents.2-7,21,23-26 Within
the same cyclic homologue series, the most reactive are small
strained rings, such as six-membered cyclotrisiloxane rings
and five-membered cyclo-1-oxa-2,5-disilacyclopentane rings.
(Figure 1, structure B) Thus, D3 is opened faster than D4 by
a factor of about 102-103. With further increase of the ring size
the reactivity may change in different ways depending on theinitiator.21,23,26 Electronegative substituents at silicon increase thereactivity, while steric effects decrease the rate.21,23
AROP of cyclosiloxanes is commonly used for the synthesisof polysiloxanes in industry and in research laboratories. It is thepreferred route to polymers of high molar mass, such as used in the
production of HTV (high temperature vulcanized) silicone rubber.1
AROP techniques also allow for the kinetically controlled precisionsynthesis of functionalized polysiloxanes (see section 3.2).2-7

Cationic Ring Opening Polymerization (CROP)
of Cyclosiloxanes

The most common initiators for the CROP of cyclosiloxanes
are strong protic acids. Commonly used initiators include: H2SO4,
CF3SO3H, HClO4, CH3SO3H.1-3,21 CF3SO3H is very effective
and preferred for synthetic use in laboratories, while H2SO4
is primarily used in industry due to cost and safety concerns.
Dodecylbenzenesulfonic acid is used as an initiator and surfactant
in emulsion polymerizations. Initiators composed of a protic acidand a Lewis acid, such as HCl/FeCl3 or HCl/SbCl6, are reported
to be effective for CROP.27-29 Bis(trifluoromethane)sulfonimide
and tetrakis(pentafluorophenyl)borate protic complex were also
reported as very active initiators.30-31 Heterogenic systems, acidactivated minerals or cation exchange resins, are readily used as they
can be easily separated from the polymer product.32-36 Some nonprotic initiators, such as SbCl5/CH3C(O)Cl , (C6H5)3C+B(C6F5)4-/
R3SiH, and bismuth triflate, were demonstrated to initiate the CROP,
but they are of minor importance in synthesis of polysiloxanes.37-39
The high initiating activity of Lewis acids can be attributed to the
products of their interaction with protic contaminants.

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The mechanism of CROP is complex and comprised of many
component reactions. Relative reaction rates differ considerably
depending on monomer, initiator and reaction conditions.
The acid (HA) initiates the opening of the monomer ring.2-5,21(Eq. 8) The reverse condensation processes occur inter- andintramolecularly with stationary concentrations of the acid waterand reactive terminal groups. (Eq. 9-10) The acid activates endgroups for monomer addition and catalyzes reactions 8-10. Water
forms strong hydrogen bond complexes with the acid, affecting
the acid activity.40,41 (Eq. 11)
Si

O

Si

(8)

Si A

HO Si

+

A Si

Si O Si+ HA(9)Si OH +HO Si

Si O Si

H2O

(10)

Si OH

[(HA)n•(H2O)m]n HA + m H2O(11)

There are at least three pathways of siloxane macromolecule
growth in CROP. Contribution of condensation processes to thechain formation may be considerable.40 (Eq. 9-10) However, it
is generally accepted that the polymer is formed primarily fromthe addition of monomer to the end group. This requires acidactivation of either the end group or the monomer, forming atertiary or secondary silyloxonium ion.38,40-43 (Eq. 12-13)
Si A+ HA +

Si

O

Si

activation

deactivation

+ Si
Si O
Si

+ Si
O
Si

HA2—

PR
backbiting

Si OH +O Si

H HA2—
+O
Si
Si

Si

Si

The cationic route is extensively exploited in equilibrium ROP
of siloxanes (section 3.1), but is rarely used in processes performed
with kinetic control (Section 3.2). Some initiation systems
allow for good control of the polymer structure.29 CROP of D3
initiated by SbCl5/HCl/Me2SiCl2 leads to polymers of controlled
molecular weight and low cyclic content. Addition of an excess
of a triorganosilyl ester to the polymerization system initiated by
CF3SO3H considerably reduces cyclic content and permits goodmolecular weight control.48 Cationic polymerization is practiced
in emulsion, miniemulsion and heterogenized polymerization
systems. In these cases, the CROP mechanism is different fromthat in homogeneous media.27,32-36

Equilibrium and Kinetic Control of
The Product in The ROP of Cyclosiloxanes
Equilibrium Polymerization (Equilibration)
Basic knowledge

HA2—

(12)

propagation

Strained ring monomers (e.g. D3) polymerize faster than the
unstrained ones (e.g. D4). Polar and steric effects of substituentsare reported to play an important role in affecting the monomer
reactivity.3 In contrast to anionic polymerization, the rate isdecreased by electron withdrawing polar substituents. The rate of
the polymerization depends largely upon the acid strength, thus
CF3SO3H is a much more active initiator than CH3SO3H.

O
O
F

HA +

formed by intramolecular reactions of end groups and by ringexpansion isomerization of the tertiary oxonium ion.21,41,43,45,46
Backbiting and chain transfer contribute to the polymerizationof unstrained cyclics but are of minor importance in the CROP
of cyclotrisiloxanes.47+
Si OH2 HA2—

(13)

Si

Tertiary silyloxonium ions are very unstable and detected
only at very low temperatures or for monomers of special
design.38,44 Deactivation processes dominate over propagation, so
the polymer chain grows stepwise and the molecular weight of thepolymer increases with monomer conversion.
Since a stationary concentration of acid is maintained
throughout the process, the initiation mechanism presented
in equation 8 occurs continuously throughout the polymer
growth, leading to a broadening of the molecular weight
distribution. Another feature of this polymerization is theformation of considerable amounts of cyclic products. They are

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Equilibrium ROP is carried out until the process achieves theequilibrium state. Since equilibrium is independent of the reaction
mechanism, virtually the same polymer yield and structure is
obtained from both anionic and cationic routes. Knowledge of theequilibrium state is the most important issue in understanding
this process. The equilibrium state is complex, as two series ofhomologues (linear and cyclic) are formed.3,5 (Eq. 14)
OSi

Si O Si

cyclic monomer

linear polymer

+

Si

O

Si

(14)

cyclic mixture

The equilibrium established between all cyclic and linear
homologues may be characterized by three dependencies:
1) equilibrium distribution of linear homologues, 2) equilibrium
distribution of cyclic homologues and 3) equilibrium between
linear and cyclic fractions.
The size distribution of open chains is largely controlled bychain transfer, which occurs randomly, leading to a distribution
often referred to as the Flory distribution.49 The polydispersity
factor (PDI = Mw/Mn) for this distribution equals 2.

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In general, with the exception of strained cyclotrisiloxane
rings, the equilibrium concentrations of cyclics decrease in ahomologous series with the increase of the ring size. For example,
the equilibrium concentration of D3 is negligible at room
temperature, although it becomes significant at high temperatures.
The most abundant is D4, 6.3 wt% of total undiluted equilibrated
PDMS, then D5, 3.7%, and D6, 1.5%.50

Kcn =

0.8
R = MeR = Ph

0.4

Si

O

0.2

R = CF3CH 2CH 2

(15)

Si

C.V.

n

20

PR

Another feature of this equilibrium is its independence oftemperature.52 The cyclics that appear in equilibrium at significant
concentrations are virtually strain-free, and the number andcharacter of chemical bonds is not changed in the ROP process.
The enthalpy of ring opening is effectively equal to zero.
Conformational entropy controls the position of the ring-chainequilibria. The entropy gain in ring opening, the driving force forthe polymerization, is due to high flexibility, i.e., conformational
freedom, of the siloxane chain. All modifications of the monomer
structure decreasing the conformational freedom of the siloxane
chain shift the equilibrium towards cyclics. Thus, the increasing
size or polar character of substituents on the silicon atom reduces
the yield of polymer at equilibrium, which is well illustrated
by low yields and high critical concentrations of poly-3,3,3trifluoropropylmethylsiloxane in the equilibrium ROP (Figure 2)
Linear polydiphenyl-siloxane cannot be obtained by this method.
Practical Use

Equilibrium polymerization of cyclosiloxanes is often used in
the synthesis of polysiloxanes both in industrial processes and inresearch laboratories. Advantages of this approach include:

Me3Si-O-SiMe3 + n (Me2SiO)4

1. This method does not impose any restriction on initiator.
Anionic and cationic initiators may be used, provided they
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C.V.

40

C.V.

60

80

100

total siloxane volume %Since equation 15 holds for all cyclic homologues in theseries, the total weight concentration of cyclics in a systemΣ n M0 Kcn, is also
coexisting in equilibrium with linear polymer, n=3
constant independent of the total weight concentration of cyclic
and linear polysiloxanes. Consequently, the dilution of the systemat equilibrium with a solvent must convert some amount of linear
polymer to cyclics to fulfill equation 15. The yield of polymer
decreases with dilution of the polymerization system, which isillustrated in Figure 2. For each polysiloxane there exists a criticalconcentration below which linear polymer is not formed.

446

R = Et0.6

OO
F

Since the cyclic fraction contains mostly oligomers, theequilibrium between cyclic and open chain fractions gives us
direct information about the yield of polymer. This equilibrium,
as well as the equilibrium distribution of cyclics are controlled
by the elementary ring-closure/ring-opening equilibrium.
These equilibria are approximated by equation 15, in which
the equilibrium concentration of a cyclic SiO n e is equal to theequilibrium constant of the cyclic formation.50 (Eq. 15)

polymer
w. fraction

Figure 2

Weight fraction of polymer in total siloxane vsvolume percent of total siloxane in toluene at 100oC
at equilibrium in the polymerization of (RMeSiO)n, R=Me, Et, Ph, (CH2)2CF3, c.v. marks – criticalsiloxane volume below which no polymer exists at
equilibrium state. (Adapted from Ref. [50] with kindpermission of Kluwer Academic Press).

are tolerated by functional groups in the polymer,. Thus, it
is easy to find an initiator, which drives the system to theequilibrium state relatively fast under mild conditions andcan be easily removed from the polymer.

2. There are no stringent requirements of quenching thereaction in a narrow range of time.
3. There are no requirements for the size of the monomer ring.
The same results are obtained using various monomers of
the same homologue series. A mixture of cyclics or a mixtureof cyclic and linear polysiloxanes is often equilibrated.
4. Molecular weight is readily controlled by using chain
blockers which are disiloxanes or short chain oligosiloxanes
introducing end groups.1 (Eq. 16) The initial concentrationof initiator, which is the other source of end-groups, mustbe much lower than that of the blocker.

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5. The blockers may contain a functional group. Telechelicpolysiloxanes, including macroinitiators or macromonomers,
may be obtained by this method.53 (Eq. 17) This opens theroute to various organosilicon block copolymers.54,55 ROP of
cyclosiloxanes may also serve to extend siloxane sequences
built into a chain of an organic polymer.56

Kinetically Controlled ROP of Cyclosiloxanes
Basic Knowledge

OOF

The fundamental principle of the kinetic controlled ROP
of cyclosiloxanes is explained in Figure 3. ROP of a strained
ring cyclotrisiloxane and its strain-free homologue, e.g.,equilibrium ROP
equilibrium ROP
cyclotetrasiloxane, both lead to the same equilibrium state by
H2NCH2CH2CH2Me2HSi-O-SiMe
CH
CH
CH
NH
+
n
D
2
2 2CH2CH
4 2CH2NH2 + n D4
2NCH2CH22CH22Me22Si-O-SiMe
(17)
(17)
different routes.
The strainless cyclosiloxane produces polymer andequilibrium ROP
H2NCH2CH2CH2Me2Si-O-SiMe2CH2CH2CH2NH2 + n D4
(17)
H2NCH2CH2CH2Me2HSi-[OSiMe]-O-SiMe
CH
CH
CH
NH
+
cyclics
cyclicoligomersin parallel; the latter being formed by back-biting.
NCH
CH
CH
Me
Si-[OSiMe]-O-SiMe
CH
CH
CH
NH
+
cyclics
22 n 2
2
22 n 2
2 2
2
2
2 2
2
2
2
2
The polymer concentration steadily increases to eventually achieve
H2NCH2CH2CH2Me2Si-[OSiMe2]n-O-SiMe2CH2CH2CH2NH2 + cyclics
6. Equilibrium ROP of cyclosiloxane is a convenient route to its equilibrium value. By contrast, the strained cyclotrisiloxane isstatistical copolymers of various siloxanes.57-61 (Eq. 18)
initially transformed into linear polymer, which in the second
step is randomized and partly decomposed to cyclics, eventuallyequilibrium ROP
reaching an equilibrium mixture. (Eq. 19)
Me3Si-O-SiMe3 + n (Me2SiO)4 + m (ViMeSiO)4
Me3Si-[OSiMe2]n-[ViMeSiO]m-SiMe3 + cyclics(18)

monomer

Macromolecules of these copolymers have a uniform composition and random distribution ofmonomer
units.57-59 polymerization
Thus, it is possible
linear polymer
to introduce functional groups pendant to the polysiloxane chain
57-61
which are statistically spread along the polymer backbone.

PR

There are also some limitations of using the equilibrium ROP
of cyclosiloxanes in synthesis.3 The main drawback concerns theformation of cyclic oligomers, reducing the yield of polymer.
Since the yield decreases significantly with the increase of sizeand polar character of substituents, the process is primarily usedin the synthesis of dimethylsiloxane and hydridomethylsiloxane
homopolymers and copolymers. The equilibrium ROP is carriedout in bulk, as any dilution of the polymerization system leads toa decrease in the polymer yield. Equilibrium ROP cannot be used
for the synthesis of polysiloxanes with a narrow molecular weight
distribution or a precisely functionalized single end-group on thepolymer chain. It is not suitable for the synthesis of copolymers
with specific distribution of siloxane units, such as alternate or
gradient copolymers.

The important application of the equilibrium ROP of
cyclosiloxanes is the industrial synthesis of high temperature
vulcanized (HTV) silicone rubber.1 Most of these technologies
are based on the AROP of D4. Addition of vinyl-substituted
cyclosiloxanes is often practiced to introduce pendant vinyl groups
used for cross-linking in the vulcanization process. Monomer
purity requirements are very stringent, because molecular weightsof these polymers are very high, up to 106 g.mol-1, meaning that a
linear macromolecule having 104 siloxane units must be formed.
Any small contamination may considerably change the rheologicalproperties of the material.
Equilibration of siloxanes is also a fundamental method of
the industrial syntheses of various silicone liquids.1 In these cases
the molecular weight of the target polymer is much lower and thepurity of the monomer does not need to be as high, so a mixture ofsiloxane oligomers is often used as the substrate.

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polymerization

equilibration(backbiting
chain scrambling)

linear polymer

equilibrium mixtureof linear polymer
and cyclics

equilibration(backbiting
chain scrambling)(19)

This is because the propagation of the strained ring monomers
is much faster than back-biting and chain transfer. In contrast to
the entropy-driven polymerization of strain-free cyclosiloxanes,
the driving force for the polymerization of cyclotrisiloxane is theenthalpy decrease related to the release of the ring strain. If thepolymerization is quenched at a suitable moment, a high yieldof polymer may be obtained even in the case when the linear
polysiloxane does not reach the equilibrium state. A good example
is the polymerization of (Ar2SiO)3.62

The AROP of cyclotrisiloxanes may gain the features of living
polymerization under two conditions. First, the initiation must be
fast and quantitative. Second, the difference in rates of propagationand the undesired back-biting and chain randomization processes
should be high enough to eliminate the influence of these
undesirable processes on the polymer structure. When both ofthese conditions are fulfilled all macromolecules are growing inparallel without chain breaking. If the polymerization is quenchedin due time, polymer with a narrow molecular weight distribution(PDI) below 1.1 may be obtained.63-66 The kinetically controlled
AROP of cyclotrisiloxane using the selective polymerization system
is a good method for the precision synthesis of functionalized
polysiloxanes. In contrast, the kinetically controlled CROP israrely used for this purpose as it is difficult to eliminate cyclics
formation, chain scrambling and terminal group exchange.
(section 2.2).
The AROP of cyclotrisiloxanes, when used for the precisionsynthesis, requires selective polymerization systems. The mostoften used initiators for the selective AROP of cyclotrisiloxane are
numerous organolithium compounds in combination with various
promoters such as THF, DMSO, HMPA, DMF and cryptand{211}.3-6,21 Recently, ethyl acetate was proposed as a very effective
promoter for the AROP of [(CF3CH2CH2)MeSiO]3.67

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equilibriu
of linear p
and cyclic

In a hydrocarbon solvent the transformation of the RLi initiator into the silanolate propagation center occurs quantitatively.68(Eq. 20)

D3

+

3 RLi

3 RMe2Si-O-Li(20)

Practical Use

OOFThis reaction proceeds rapidly under mild conditions, andno propagation on the lithium silanolate takes place without
a promoter. A two-step initiation is often practiced. First, theorganolithium is quantitatively transformed into the silanolate andthen the propagation is induced by introduction of a promoter. This
procedure gives better precision in the synthesis as some possible
side reactions of RLi are avoided.63 PDMS of narrow molecularweight distribution, PDI < 1.1, may be obtained even in a onestep process with high conversion of D3 (>90%).66 However, forthe synthesis of polymer with higher molar mass (Mn > 105), thepolymerization must be quenched at lower monomer conversions.

also generated by a semibatch process, adding one comonomer
gradually to the polymerization system of the other one.78 On theother hand, one-pot sequential copolymerization of two siloxane
monomers is the route to block copolymer.75,79,80 The second
monomer is introduced when the polymerization of the first one
achieves the quenching window of the kinetically controlled process
so the second block is contaminated with units originating fromthe first monomer. A better block purity is obtained if the slower
propagating monomer is polymerized first.79 Another method of
the synthesis of block siloxane copolymers is the coupling of two
ends of functionalized polysiloxanes.75 All-siloxane copolymers arealso synthesized using a homopolymerization of cyclosiloxanes with
mixed siloxane units.81-85 The controlled AROP of cyclotrisiloxanes
bearing different units leads to alternating copolymers. In somecases the polymerization shows a high regioselectivity thus leading
to a copolymer with highly regular structures.81.82

The kinetically controlled ROP of cyclotrisiloxanes is moredifficult to perform than the equilibrium process. It requires more
expensive monomers and initiators with more stringent conditions.
This method is used in silicones technology for the fabrication ofpolysiloxanes which cannot be obtained in reasonable yield by theequilibrium polymerization, such as poly-(CF3CH2CH2MeSiO).1,67
The AROP of cyclotrisiloxanes is also extensively used in researchlaboratories in cases where the polymerization of unstrained
cyclosiloxanes proceeds very slowly or leads to low yields ofpolymer because of unfavorable thermodynamics.62,67,69 However,
the most important use of kinetically controlled AROP in
research laboratories is the precision synthesis of functionalized
polysiloxanes with well-defined structure for numerous
applications described below.21

Polysiloxanes with functional groups pendant to siloxane
chain are readily obtained by controlled AROP. Precursor groups
such as SiCH=CH2, SiH and Si(CH2)3Cl can be introduced tocyclotrisiloxane.67,82-86 The AROP of these monomers leads to thecontrolled synthesis of polysiloxanes bearing the precursor which
is subsequently transformed to a variety of functionalities. (Eq. 21)
Me

n Me

H

Me3Si

PR
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Si

O

Me

Polysiloxane with functional end groups - polysiloxane
macroinitiators and macromonomers. The precise functionalization of polysiloxanes at a single chain end is possible. A
precursor or target functional group may be introduced either by afunctionalized initiator or by using a terminator bearing additional
functionality.70-72,74 (Eq. 21-22) This is a common route for thesynthesis of macroinitiators for polymerization of various organic
monomers.69-72 Polysiloxane macromonomers may be generated aswell.72 Polymers functionalized at both chain ends may be obtainedby using difunctional initiator, such as LiPh2SiLi.75,76,81
All-siloxane copolymers of regular structures – gradient,block and alternating. If a mixture of two cyclotrisiloxanes issubjected to the kinetically controlled AROP with a selective
initiator, all macromolecules are growing in parallel withoutbackbiting and chain transfer. This propagation leads to a copolymer
that consists of macromolecules with similar structure, i.e. size,
composition of units and distribution along the polymer chain.
This reaction is called gradient copolymerization since all growing
macromolecules, initially rich in the units originating from morereactive monomer, become gradually enriched in the units fromthe less reactive cyclotrisiloxane.77 Gradient copolymers may be

O

Si
O

H

O

Si

Me

Me

Me

Me

Si

O

Me

1 +

Si

1. (LiO)2SiPh2

Me

O

Si

(21)82-78°
2. 2 Me3SiCl

Ph

O

Si

Me n/2

Ph

Me

O

Si

Me

O

Si

O

SiMe3

Me n/2

Pt catalyst

F5

F5

Me
O

O

Me

F5

Me3Si

Si

Me

H

Si
Me

O

Si

Me
O

Me

Si
Me

Ph
O

Si

n/2Ph

Me
O

Si

Me
O

Me

Si
Me

O

Si
Me

O

SiMe3

n/2

Siloxane-organic diblock, triblock and graft copolymers
are obtained by three techniques exploiting the AROP of
cyclotrisiloxanes: 1) macroinitiator, 2) sequential polymerizationand 3) end functional group coupling.64,69,71-74,87-90

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Equation 22 exemplifies the synthesis of a siloxane-organic
block copolymer using the monofunctional polysiloxane atomtransfer radical polymerization (ARTP) macrointiator, which is
obtained by a functionalized terminator approach.72
Bu-Li + n D3

O
+

O

Br

The stereocontrolled synthesis of polysiloxane was
performed by the AROP of cyclotrisiloxanes having different
geminal substituents at silicon, such as monomer F3 presented in
Figure 1. In some cases, cis isomer can be isolated and subsequent
ROP gives a partially stereoregular polymer.13,98 (Eq. 24) Suchpolymers show a crystalline phase, while the polymers obtained
from the mixtures of cis and trans isomers are completely
amorphous.13 The mechanical strength of silicone elastomers may
be improved by using a stereoregular polysiloxane.

OOF

Me Me MeBu Si O Si O Si H
Me Me Men

Pt catalyst

Me Me MeBu Si O Si O Si H
Me Me Men

Me2ClSiH, -LiCl
end capping

AROP

A variety of all-siloxane and siloxane-organic cross-linked
materials was prepared using the AROP of cyclotrisiloxanes
for the synthesis of precursor functionalized polysiloxanes.95,96
Besides conventional networks, various kinds of interpenetrating
networks were obtained.96,97

Me Me MeBu Si O Si O Si
Me Me Me
n

Br

O

X

n

O

Me

Si
O

Me

O

Si

X
Si
Me
O

R-Li, promoter

X X X

X X X X X X

(24)

X X X

X

X = Ph [98] or F3CCH2CH2- [13]butyl acrylate
ATRP

PDMS-block-poly(butyl acrylate)(22)72

Conversely, block copolymers can be generated when organic
macroinitiators or living polymers are used to initiate the controlled
AROP of cyclotrisiloxane.87,88,90 Graft copolymers are formed using
an organic macroinitiator which contains initiating side groups.91
Another method used for the synthesis of polysiloxanes graftedon organic polymers is the copolymerization of polysiloxane
macromonomers with organic monomers.72 Block and graft
copolymers are also generated by coupling of end functionalized
polysiloxanes with organic polymers.74

PR

More complex polymer architectures including starbranched, miktoarm star, star on dendrimer, block star, brushbranched, block-brush branched, dendritic branched andhyper branched structures were generated using functionalized
polysiloxanes obtained by AROP.64,65,73,90,92-94 Star-branchedpolysiloxanes were obtained by using polyfunctional quenchers,or polyfunctional initiators.64,65,92 The precision two-step synthesisof a branched miktoarms organic-siloxane copolymer using
AROP of D3 with trifunctional quencher is shown in equation 23.
Dendritic branched polysiloxanes may be obtained by graft ongraft or graft on star techniques.92

n D3

1. BuMe2Si-O-Li
2. MeSiCl2 (xs)

Bu Si

Si Cl
Cl

Si

Si Cl
Cl

PDMS

PS

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Si

O * PhSiNp

PhO
Si * Si
Np

Ph-Li

0°, 67 h(25)

Special Methods of the ROP of Cyclosiloxanes
Polymerization in the Solid State

High molecular weight materials may be synthesized by solidstate ROP of cyclic siloxanes.101,102 This may be a convenient modeof polymerization for monomers with high meltings points that are
difficult to dissolve in commonly used solvents, such as (Ph2SiO)3.
The AROP of this monomer was initiated by KOH spread on themonomer crystal surface. The propagation proceeds inward fromthe surface of the monomer crystals and leads to a crystalline
polymer. Polymerization and polymer crystallization proceedPS
successively. An interplay between the rates of polymer
chain(23)64to control the
PDMS
polystyryl-SiMe
2OLi
growthand the polymer
crystallization is suggested
polymer yield, molecular weight, polydispersity and crystallinity.
PS in monomer crystals.
The rate is sensitive to structural defects

PS

polystyryl-SiMe2OLi

Optically active all-siloxane polymers may be obtained by
AROP only if monomer bears an optically active substituent.99 On
the other hand, the controlled AROP of a cyclocarbosiloxane witha chiral center in the ring skeleton may lead to an optically active
polymer. An example of a highly stereospecific polymerization ofan optically active enantiomer of oxy-2,5-disilacyclopentane isshown in equation 25.100(23)64

Polymerization in emulsion
The ROP of cyclosiloxanes in emulsion and miniemulsion,both anionic and cationic, attracted the attention of chemists as
it gives many advantages over the classical ROP process.27,103-106
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PR

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112. Yang, B.; He, H.; Chen, R. P.; Ma, L.; Jia, D. M. Int. J.
Polymeric Mater. 2008, 57, 717.

90. Huang, T. Z.; Knauss, D. M. Polym. Bull. 2002, 49, 143.
91. Rahmani, S.; Entezami, A. A. Macromol. Res. 2011, 19, 221.
92. Chojnowski, J.; Cypryk, M.; Fortuniak, M.; Scibiorek, M.;
Rózga-Wijas, K. Macromolecules 2003, 36, 3890.
93. Paulasaari, J. K.; Weber, W. P. Macromolecules 2000, 33, 2005.
94. Novozhilov, O. V.; Pavlichenko, I. V.; Demchenko, N. V.;
Buzin, A. I.; Vasilenko, N. G.; Muzafarov, A. M. Russ. Chem.
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TELECHELIC SILOXANE OLIGOMERS: VERSATILE STARTING
MATERIALS FOR NOVEL POLYMERS AND APPLICATIONS
By Iskender Yilgör
Koç University, Chemistry Department, Sariyer 80910 Istanbul, Turkey

Introduction

OOF

Polyorganosiloxanes, commonly referred to as silicone
or siloxane polymers, form one of the most interesting classesof macromolecular systems [1-4]. The repeating unit ofpolyorganosiloxanes consists of alternating silicon-oxygen atoms,
in which two monovalent organic radicals (substituents) areattached to each of the silicone atom. Since the siloxane (Si–O)
backbone is considered to be inorganic in nature, silicone polymers
display both organic and inorganic character. As a result they form
an important bridge between inorganic and organic polymers. The
type and nature of the organic substituents on the silicon atom
play very critical roles in determining the physical and chemical
properties of the resulting polymer.

111 degrees, respectively, as determined by quantum mechanicalcalculations and spectroscopic studies. As a result, the methylgroups in polydimethylsiloxanes rotate with unusual ease aroundthe (Si–O) bonds.

PR

The most popular silicone polymer, polydimethylsiloxane(PDMS), has only methyl groups as the substituents on thesilicon atom. A wide variety of other groups, such as phenyl,
vinyl, 1,1,1-trifluoropropyl, hydrogen, glycidoxypropyl among
others are also frequently used for tailoring the physicochemical
properties of silicone polymers [1,5,6]. The variations in the
backbone composition have critical effects on the glass transition
temperature (Tg), solubility parameter, thermal stability, reactivity
and surface behavior of the resulting system. This flexibility inbackbone modification of silicone polymers provides almost
unlimited possibilities for their use as specialty polymers or as
modifiers for common organic polymers [1-7]. Unique propertiesof polyorganosiloxanes include excellent low temperature flexibility(Tg as low as –120°C), good thermal and oxidative stability, ozone
and UV resistance, high gas permeability, excellent electricalproperties and physiological inertness or biocompatibility. In
addition, polydimethylsiloxanes also display very low surface
tension values (18-22 mN/m), which is comparable to highly
fluorinated polymers.

This unique combination of properties displayed by silicone
polymers is a result of the unusual molecular structure of thesiloxane bond. Si–O bond length is 1.64±0.03Å [3,6], substantially shorter than the bond length calculated from the additivityof the ionic radii (1.83 Å). This shorter than expected Si–O bondlength can be explained by the substantial ionic character (about
40-50%) of the siloxane bond. The Si–O bond has a dissociationenergy of 460 kJ/mol, which makes it considerably more thermallystable than C–O (357 kJ/mole), C–C (345kJ/mole) and Si–C
(318 kJ/mol) bonds(3,6). There is also a substantial difference
between the Si–O–Si and C–O–C bond angles, which are 140 and

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Despite their many outstanding properties, a major drawback
for linear high molecular weight polyorganosiloxanes (especially
PDMS) is their very poor mechanical properties. Modification of
the PDMS backbone by the incorporation of various substituentson silicon does not help to improve the mechanical properties touseful levels. As a result, for practical applications such as highstrength elastomers, PDMS is always crosslinked and highly filledwith high surface area silica(8). As expected, cross-linking limits
the techniques used for the processing of these PDMS elastomers
and also their fields of applications. It has been demonstrated thathigh-strength, high-performance, linear, thermoplastic silicone
elastomers can effectively be prepared by the controlled synthesis ofblock and segmented copolymers [7,9]. These copolymers usuallycontain PDMS as the soft segments. On the other hand there isa very wide choice of organic backbones as the hard segments[7,9,10]. The resulting copolymers can range from thermoplastic
elastomers to rigid, high-strength thermoplastics dependingon the type and nature of blocks, block lengths and backbone
composition. These block copolymer systems usually show phaseseparated morphologies. In elastomeric systems the organic hard
segment domains serve as physical crosslinks in a continuous
rubbery siloxane matrix. In thermosetting systems PDMS usually
serves as an impact modifier in the rigid organic matrix.

The controlled synthesis of block copolymers has been a very
active field of polymer research since the 1960s. The techniques used
include living anionic, cationic and free radical polymerizations,ring-opening polymerization, group-transfer polymerization andvarious others, all of which are well—described in the literature[10-12]. For the preparation of siloxane-containing copolymers
the most widely used techniques include anionic polymerization[7,10,13], ring-opening polymerization [7,14] and condensation
polymerization reactions [7,9,10]. In anionic polymerizations
siloxane block polymers are obtained by the sequential
polymerization of a vinyl monomer and hexamethylcyclotrisiloxane(D3). Hexaphenylcyclotrisiloxane (D3’) can also be used as a siloxane
monomer in anionic polymerization [3,10]. For the preparationof siloxane copolymers by ring-opening or condensation
polymerizations the most suitable starting materials are ,organofunctionally terminated siloxane oligomers, which are also
called as telechelic siloxane oligomers [7,10,15,16]. In this chapter

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our discussions will focus on the preparation, properties andreactivities of telechelic siloxane oligomers and their use in the
preparation of well-defined siloxane copolymers.

Telechelic Siloxane Oligomers

OOF

As shown in Figure 1, in terms of their chemical structures,
telechelic siloxane oligomers can be divided into two groups. The
first group consists of oligomers where the reactive functionalgroup (X) is directly linked to the terminal silicon atoms. In thesecond group there is a short hydrocarbon bridge (R) between
the terminal silicon atoms and the reactive functional groups.
Although (Si–X)-terminated siloxane oligomers have higher
reactivities towards nucleophilic reagents than their (Si–R–X)
counterparts, when copolymerized with conventional organic
monomers they usually lead to the formation of (Si–O–C)
linkages. These linkages are thermally stable, however they arequite susceptible to hydrolysis under acidic or basic conditions. In
this review we will only discuss telechelic siloxane oligomers with
(Si–R–X) type functionalities.

Figure 1. General structures of telechelic siloxane oligomers

As can be seen in Figure 1, there are four important variablesin (Si–R–X)-terminated siloxane oligomers. These are (i) typeand structure of the reactive end group (X), (ii) structure of thehydrocarbon bridge (R), (iii) type and nature of the substituents (Y)on siloxane backbone, and (iv) average degree of polymerizationof the siloxane backbone (n). A representation of possible
variations in the structure and composition of siloxane oligomers
are summarized in Figure 2.
Reactive end groups (X)
NH2

COOH

NCO

NHMe

N

CH=CH2

Si H

NMe2

NH

PR

OH

CN

Cl

O

Hydrocarbon bridges (R)(CH2)xSuch flexibility in the backbone modification of oligomers
together with the ease of preparation of perfectly ,-terminatedreactive molecules via equilibration reactions [1,7,17,18] maketelechelic siloxane oligomers very versatile and highly-useful. As
expected, the terminal functional groups mainly determine thereactivity of these siloxane oligomers towards other reactants.
Variations in the backbone composition have critical effects
on the glass transition temperature (Tg), solubility parameter,
thermal stability and the surface energy of the resulting oligomers[1,6,7,15,19]. In addition (Si-H) and (Si-CH=CH2) substituents arereactive and can be used in the preparation of graft copolymers
or network systems. The average degree of polymerization (n) has
critical effects on the microphase morphologies and the surface
energies of the copolymers produced. This in turn controls thethermal and mechanical properties, solution behavior, surface
activity and processibility of the resulting multiphase copolymericmaterials. It has been shown that in order to obtain copolymers withsilicone-like surface properties the number average molecular weightof PDMS oligomers must be above a critical molecular weight [7,20].

or(CH2)x(C6H4)

or

Preparation of Telechelic Siloxane Oligomers
As discussed before, the (Si-O) bond is quite strongly ionic andtherefore can be cleaved by strong acids or bases. This is the main
rationale behind the “equilibration” or “redistribution” reactions
used in the preparation of organofunctionally-terminatedtelechelic siloxane oligomers from cyclic siloxanes and siloxane“end-blockers”, which is described in Figure 3. Strong acids suchas, sulfuric acid, trichloroacetic acid, trifluoromethanesulfonicacid and toluenesulfonic acid and strong bases, such as sodium
and potassium hydroxide and quaternary ammonium hydroxides
can be used as catalysts. Reaction temperatures between 50 to
100°C usually provide reasonable rates for these equilibration
reactions. Selection of a specific catalyst is mainly determined by
the nature and the reactivity of the organofunctional end group.
In general strong acids are used for the preparation of oligomers
with acidic end groups, such as –COOH and strong bases are used
for basic end groups, such as amines. Special care must be taken incatalyst selection for end groups which are reactive, such as epoxy
groups, which may react with strong acids and bases at elevatedtemperatures. During the preparation of hydroxypropyl orhydroxybutyl terminated siloxane oligomers, backbiting reactions
may lead to destruction of the end groups [21].

(CH6H4)x=1-6

Important Substituents on Siloxane backbone (Y)

Me
Si O
Me

Me
Si O
CH2CH2CF3Me
Si O
CH=CH2

Me
Si O
H

Me
Si O
C 6H 5(Si-O)x+Y

heatcatalystMe Y
X R Si O
O
Me Y

n

Me
Si R XMe+ cyclics

Figure 3. Preparation of telechelicsiloxane oligomers by equilibration reactions

Figure 2. Possible variations in the structure andcomposition of telechelic siloxane oligomers
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Y"end blocker"

Average degree of polymerization (n) n = 0 _ 250

454

Me Me
X R Si O Si R X
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Siloxane Containing Copolymers
Organofunctionally-terminated, telechelic siloxane oligomers
are versatile starting materials for the preparation of a wide varietyof block and segmented copolymers through reactions with a large
selection of commercially available organic monomers. Resulting
polymers, which show microphase separated morphologies,
display properties of both the siloxane and organic segments.
This unique combination of properties include silicone-like
properties, such as, extremely low temperature flexibility, goodgas permeability, biocompatibility and depending on the type andnature of the organic blocks, other properties such as excellent
mechanical strength, elastomeric properties and thermal andoxidative stability.

OOF

In equilibration reactions catalysts can only cleave the (Si–O)
bonds in the cyclic and linear species including that of the end
blocker and growing chains. However, (Si–R) or (R–X) bonds
are stable. Therefore, at the end of the reactions linear oligomers
are functionally-terminated and cyclic side products, which arearound 10-15% by weight depending on the number averagemolecular weight of the oligomer prepared, are non-functional [10,15, 16]. After elimination of the catalyst cyclic side products can beremoved from the mixture by vacuum distillation or supercriticalfluid extraction [22, 23]. The number average molecular weightof the final product is determined by the initial ratio of the cyclic
monomers to the end blocker.
As can be seen in Figure 3, a key starting material for the
preparation of telechelic siloxane oligomers is the “end blocker”.
Several methods are available for the preparation of the end blockers.
The most widely used method is the reaction of (Si–H) terminatedsiloxanes with unsaturated organic compounds, which also containreactive end groups, such as allylic compounds (CH2=CH–CH2–X)
or others with a general structure of CH2=CH–R–X, where (R)represents an alkyl, aryl or aralkyl moiety and (X) represents
the reactive end group. Hydroxybutyl terminated silicone end
blockers can be prepared by the reaction of tetrahydrofuran anddimethyldichlorosilane in the presence of magnesium metal [24].
A new method for the preparation of aminopropyl terminated end
blockers, which eliminates the use of highly toxic allylamine, hasbeen developed by Schaefer and co-workers [25]. In this method,
first the 3-chloropropyldimethylsiloxane is reacted with ammonia
to form 3-chloropropyl-terminated tetramethyldisilazane, which
is further reacted with excess ammonia to form a cyclic precursor
as shown in Figure 4. Aminopropyl terminated telechelic siloxane
oligomers can then be obtained by the reaction of silanolterminated silicone fluids with this precursor.
ClCH2CH2CH2SiMe2Cl + 3 NH3

Me

Me

PR
Me

A detailed list of recent articles on the preparation andcharacterization of a large number of siloxane-containing
copolymers through the use of organofunctionally-terminatedtelechelic siloxane oligomers is provided in Table 1. In addition
to these, telechelic siloxane oligomers are also used in thechemical modification of various thermosetting systems andin the preparation of interpenetrating network (IPN) typestructures [56-60].
Table 1. Literature survey on siloxane containing copolymers

ClCH2CH2CH2Si-NH-SiCH2CH2CH2Cl

Me

Silicone-containing copolymers can be prepared by a large
number of well-documented techniques, well documented in theliterature [2-4, 7, 9, 10]. Copolymerization of telechelic siloxane
oligomers with conventional telechelic organic monomers areusually carried out through step-growth addition or condensation
reactions or ring-opening polymerizations. Synthetic schemes forthe preparation of a segmented siloxane-urea copolymer [26, 27](step-growth addition reaction) and a triblock polycaprolactoneb-PDMS copolymer [14] (ring-opening polymerization) withvery interesting properties and interesting applications are given
in Figures 5 and 6.

Copolymer system
Siloxane-urethane
Siloxane-urea
Siloxane-carbonate
Siloxane-ester
Siloxane-amide
Siloxane-imide
Siloxane-alkylene oxide
Siloxane-sulfone
Siloxane-polyether
Siloxane-liquid crystalline
OthersMe

Me

ClCH2CH2CH2Si-NH-SiCH2CH2CH2Cl + 3 NH3

Me

Me

Me Me
Me Si N SiCH2CH2CH2Cl
Me

Me

Me

Si

N

Me

Me

SiCH2CH2CH2Cl + HO

Si

Me

Me

Me

H2NCH2CH2CH2

Si
Me

Me

O

Me

Me

O

Si
Me

Si

Me

O

Si

OH

n Me

Applications of Siloxane-Copolymers

Me

O

Si

CH2CH2CH2NH2n Me

Figure 4. Preparation of aminopropyl-terminated telechelicsilicone oligomers by cyclic disilazane route [25]www.AZmax.co.jp TEL: 03-5543-1630

References
28, 31, 45-47
26, 27, 36
7, 10, 29, 30
10, 30, 35
37, 389, 40-42, 78
9, 43, 44
10, 4884, 85
9, 50
49,51-55

Telechelic siloxane oligomers and siloxane-containing
copolymers, which show a very unique combination of properties,
unmatched by other polymeric systems, have already foundnumerous interesting applications in many diversified fields [61].
As discussed in detail below, these applications include biomaterials

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with improved blood and tissue compatibilities, contact lenses
with excellent oxygen permeabilities, high performance gas
separation membranes, atomic oxygen resistant coatings for spaceand electronic applications, radiation curable release coatings
for paper and plastic films, protective textile coatings, processing
aids for polyolefins, surface modifying additives for textile andindustrial fibers and impact modifiers for rigid thermoplastic andthermosetting resins.

nMe
Si CH2CH2CH2NH2 + O C N R N C O
MeTHF/rtMe Me
CH2CH2CH2 Si O Si O
Me Me

n

Me
HO H
H O H
Si CH2CH2CH2 N C N R N C NMexFigure 5. Preparation of siloxane-urea segmented copolymers
through the stoichiometric reaction between an aminopropylterminated telechelic PDMS oligomer and a diisocyanate
Me Me
HO(CH2)6 Si O Si O
Me Me

n

Me
Si (CH2)6OH + 2x
Me

O
Me Me
HO-(CH2)5 C O(CH2)6 Si O Si O
Me Me

n

O

O

catalyst

150 °

Me
O
Si (CH2)6O C (CH2)5-OH
Me

Figure 6. Preparation of polycaprolactone-b-PDMS triblock
copolymers by ring-opening polymerizationPR

Due to their physiological inertness, one of the most important
applications of siloxane copolymers is in the production of
biomaterials [61, 62], especially blood-contacting devices, such as
blood pumps, vascular grafts and catheters [63, 64]. For this purposesiloxane copolymers can either be used directly or as a surface
modifying additive for a base polymer, such as polyurethanes,poly(vinyl chloride), polyolefins, among others. [37, 53, 65-68].
In addition to its biocompatibility, the PDMS backbone also hasvery high oxygen permeability [1], therefore siloxane copolymers
find applications in the production of contact lenses [61, 69,70]. Due to their high gas permeabilities, siloxane containing
copolymers, especially siloxane-imides and siloxane-carbonates,
also find applications as gas separation membranes and sensors[71, 72, 78, 79]. An important, high volume industrial applicationfor organoepoxy- or organoacrylate-terminated telechelic siloxane
oligomers is in the production of paper or polymer based (PP, PETor polyamide) release films [73, 74]. In these applications, thereactive end groups of the siloxane oligomers are usually cured byelectron beam or UV radiation, leading to the formation of network
structures. The backbone composition and average molecularweight of the siloxane oligomers and the crosslink density of the456

In addition to these applications, telechelic organosiloxane
oligomers and siloxane-containing copolymers also find uses
in many other fields. These include uses such as; processing aidsin improving the extrusion output of polyolefins [80, 81],
biofouling release coatings or marine paints [82], protective
coatings with improved flame resistance [83] and surfactants andwetting agents [84, 85], which is most probably the largest field ofcommercial application for siloxane-polyether and siloxane-alkyl
type copolymers.

O
O
F

Me Me
H2NCH2CH2CH2 Si O Si O
Me Meresulting network serve to control the release properties of thefilms formed. Siloxane-containing copolymers, such as siloxaneimides also find applications as atomic oxygen-resistant highperformance coatings for space and electronic applications [75,76, 78]. It is well known that surfaces of siloxane copolymers aremainly covered by the low surface energy PDMS [51, 77]. Uponreaction with atomic oxygen, the methyl groups on PDMS chainsare replaced by oxygen. This leads to the formation of a protective,
silicone dioxide network at the surface of the film [76, 78].

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Conclusions

Siloxane polymers and especially polydimethylsiloxanes arevery interesting materials which display a unique combinationof properties. Organofunctionally-terminated, telechelic siloxane
oligomers enable us to combine these interesting properties ofsiloxanes with those of organic polymers. Therefore, they forma very important bridge between organic and inorganic polymer
chemistry. Some of the most attractive features of telechelicsiloxane oligomers include (i) the ease of preparation of perfectly
difunctional oligomers with desired number average molecularweights, (ii) flexibility in the modification of the silicone backbone
and as a result the physical properties of the oligomers producedand (iii) availability of a wide range of reactive end groups andreaction techniques.
Through the chemical combination of telechelic siloxane
oligomers with conventional organic monomers/oligomers it ispossible to prepare a wide range of tailor-made, thermoplastic
block, segmented and graft copolymer systems. It is also possible
to use these oligomers in the modification of network systems,
such as epoxy or cyanate ester resins, or in the preparation ofinterpenetrating networks (IPN). Inorganic-organic hybrid
polymer systems thus produced find many applications in very
diversified fields.

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OOF

47. Wynne, K. J.; Ho, T.; Nissan, R.A.; Chen, X.; Gardella, J. A.
in Inorgamic and Organometallic Polymers II, Zeldin, M.;
Wynne, K. J.; Allcock, H. R. Eds., ACS Symp. Ser. 572, ACS,
Washington, D. C., 1994, pp.64-80.

66. Childs, M. A.; Matlock, D. D.; Dorgan, J. R.
Biomacromolecules, 2001, 2, 526.

48. Webster, D. C.; Hedrick, J. L; McGrath, J. E. Natl. Sampe
Symp., Proc., 1984, 29, 1085.

49. Riffle, J. S.; Yilgor, I. US Patent 4,659,777 (April 21, 1987)
50. White, M. S. Ch. 6 in Ref. 2.

51. Dwight, D.; McGrath, J. E.; Lawson, G.; Patel, N.; York,G. in Contemporary Topics in Polymer Science. Multiphase
Macromolecular Systems, Vol. 6, Culbertson, B. M. Ed.,
Plenum Press, NY, 1989, pp. 265-288.

52. Kumpf, R. J.; Gordon III, B. in Contemporary Topics in
Polymer Science. Multiphase Macromolecular Systems, Vol. 6,
Culbertson, B. M. Ed., Plenum Press, NY, 1989, pp. 301-313.

53. Martin, D.J.; Warren, L. A. P.; Gunatillake, P. A.; McCarthy,
S. J.; Meijs, G. F.; Schindhelm, K. Biomaterials, 2000, 21, 1021.
54. Allcock, H. R.; Prange, R. Macromolecules, 2001, 20, 6858.
55. B. G.. Risch, D. E. Rodrigues, G. L. Wilkes, K. L. and J. E.
McGrath, Polymer, 37, 1229, 1996.
56. Yilgor, E.; Yilgor, I. Polymer, 1998, 39, 1691.

PR

57. Sysel, P.; Hobzova, R.; Sindelar, V.; Brus, J. Polymer, 2001,
42, 10079.
58. Arkles, B. US Patent, 4,714,739, 1987.
59. Arkles, B. US Patent, 4,970,263, 1990.

60. Takeichi, T.; Agag, T.; Zeidam, R. J. Polym. Sci., Polym. Chem.,
2001, 39, 2633.
61. Arkles, B. Chemtech, 1999, 29, 7.

62. Abbasi, F.; Mirzadeh, H.; Kattab, A. A. Polym. Int., 2001,
50, 1279.
63. Farrar et, D. J.; al., J. Thor. Cardiov. Surgery, 1988, 95, 191.

64. Product information and technical reports at
http://www.thoratec.com

71. Smaihi, M.; Schrotter, J. C.; Lesimple, C.; Prevost, I.; Guizard,
C. J. Memb. Sci., 1999, 161, 157.
72. Scheerder, J.; Walton, D. J.; Peterson, I. R.; Miller, L. S. Adv.
Mater. Opt. Electr., 1998, 8, 309.
73. Wewers, D.; Weitemeyer, C.; Jachmann, J. US Patent,
5,034,491 (07.23.1991).

74. Crivello, J. V.; Lee, J. L. in Radiation curing of Polymeric
Materials, Hoyle, C. E.; Kinstle, J. F., Eds., ACS Symp. Ser.,
417, ACS, Washington, D. C., 1990, Ch. 28.
75. Cella, J. US Patent, 4,808,686, 1989.

76. Yilgor, I. in Adhesives, Sealants and Coatings for Harsh Environments, Lee, L. H., Ed., Plenum Press, NY 1988, pp. 249-264.
77. Zhao, J.; Rojstaczer, S. R.; Chen, J.; Xu, M.; Gardella, J. A.
Macromolecules, 1999, 32, 455.

78. McGrath, J. E.; Dunson, D. L.; Mecham, S. J.; Hedrick, J. L.
Adv. Polym. Sci., 1999, 140, 61.

79. Chen, S. H.; Lee, M. H.; Lai J. Y. Eur. Polym. J., 1996, 32, 1403.

80. Yilgor, I.; Yilgor, E.; Suzer, S. J. Appl. Polym. Sci.,2002, 83, 1625.
81. Yilgor, E.; Sinmazcelik, T.; Yilgor, I. J. Appl. Polym. Sci.,
2002, 84, 535.

82. Burnell, T.; Carpenter, J.; Truby, K.; Serth-Guzzo, J.; Stein, J.;
Wiebe, D. Ref. 4. Ch. 11., 599.
83. Benrashid, R.; Nelson, G. L. in Fire and Polymers II, Nelson,
G. L. Ed., ACS Symp. Ser., 599, ACS, Washington, D. C.,
1995, pp. 217-235.
84. Gruning, B. in Silicones. Chemistry and Technology, Koerner,
G.; Schulze, M.; Weis, Eds., J. Vulkan-Verlag, Essen,
Germany, 1991, pp. 111-122.
85. Silicone Surfactants, Hill, R. M. Ed., Marcel Dekker, NY, 1999.

65. White, K. A.; Ward, R. S.; Gill, R. S.; Lim, F.; Coviello, S. K. in
Surface Modification of Polymeric Biomaterials, Ratner, B. D.;
Castner, D. G. Eds., Plenum, NY, 1997, pp. 27-33.

458

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PR

O
O
F

SILICONE FLUIDS

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11 East Steel Rd.
Morrisville, PA 19067

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FAX: (215) 547-2484
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SILICONE FLUIDS Property Profile Guide
Comment

Thermal Properties

High Temp °C

pag

Conventional
Silicone Fluids

The
Sili

1,000 hours
in air, max.
indefinite
O free, max.
pour point,
low value

175°

260

200°

280

-70°

-73

O
O
F

High Temp °C

page 466

2

Low Temp °CRheological Properties

Viscosity, cSt.
Visc.-temp. coeff.

range
low value

3 - 2x107
0.51

50 0.61

Electrical Properties

Dielectric Strength
volts/milDielectric Constantrange

360-400400

range, 100Hz

2.50-2.77

2.78@ 20,000 psi

9.1
0.90-0.98

5.5
0.98

insoluble

inso

aromatic/
aliphaticsoluble/partialsolu
solu

Refractive Index n25

range

1.393-1.403

1.42

Surface Tension,
dynes/cm

range

19.2-21.6

20.5

2-3

1.8-

Mechanical Properties

Compressibility, %Density, g/cc

Compatibility Properties

Water solubility

Hydrocarbon
solubility

D

PR

Optical Properties
Release &Wettability Properties

Wear/Lubricity Properties

Four ball wear, mm
at 75°C, 40 kg. load
steel on steel, one hr.

Notes:All data on this table are for comparative purposes.The classesof fluids have a range of properties that do not represent theperformance of an actual fluid.
Values reported for fluids including the paraffin hydrocarbon
oil are without additives such as EP agents or stabilizers.

460

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page 478

page 479

page 481

Thermal
Silicone Fluids

Organic
Compatible
Silicone Fluids

Fluorosilicone
FluidsHydrophilic
and Polar
Silicone Fluids

Low
Temperature
Silicone Fluids

TypicalHydrocarbon(Paraffin)
Fluids

260°

150°

190°

135°

235°

130°

280°

—

230°

—

260°

—

-50°

-47°

-50°

-100°

-30°

500 - 1x104
0.75

80 -1x104
0.84

20-5,000
—

4-400
0.5

—
—

—

175-200—

300-400—

2.5-3.0

6.95-7.35———

approx. 5-8
0.88-1.04

7.5
1.25-1.30

approx. 7
1.00-1.07

11.9
0.76-1.09

4.4-4.9
0.8-0.9

insolublepartial
soluble/solubleinsoluble

insoluble

insoluble

insoluble/
insoluble

insolublesoluble
partial/insoluble

soluble/solublesoluble/soluble1.443-1.493

1.336-1.387

1.441-1.454

1.335-1.588

1.410-1.430

22.0-39.5

25.7-28.7

23.6-27.0

15.9-26.7

21-28

0.7

0.8

2-6

0.9-2.5

0.7-73°
50 - 3.0x105
0.61
400-420
2.78-2.95
5.5
0.98-1.15
insoluble
soluble/soluble1.428-1.582
20.5-28.5

PR3

page 476

O
O
F

nal
uids

page 474

1.8-2.5

TABLE OF CONTENTS

Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 462
Definitions and Terms . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 463
Selection Guide . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 464
Fluid Properties . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 468
SiBrid® Fluids . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 484
Thermoplastic & Preceramic Materials . . . . . . . . . . . . . . . . . . . page 486
Refractive Indices of Pure Fluids . . . . . . . . . . . . . . . . . . . . . . . . page 487
Viscosity Conversion Chart. . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 488
Blending Chart. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . page 488

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461

SILICONE FLUIDS
Stable Inert MediaAn introduction to silicone fluids
and their uses

Silicone Fluids can be divided into six general classes:n Conventional Fluids ...................page 466
n Thermal Fluids ............................page 474

O
OF

Silicone fluids have unique properties because they
are not products of petroleum or organic chemistry.
They were the first, and are still the only, major classof polymers that are products of inorganic chemistry.
Silicone fluids consist of a broad range of different
materials with the following characteristics:n Organic Compatible Fluids........page 476

n Fluorosilicone Fluids ..................page 478

n Hydrophilic Fluids.......................page 479

n Wide Service Temperature Rangen Low Viscosity Changes vs. Temperaturen Thermal Stabilityn Low Flammabilityn Shear Stabilityn Low Temperature Fluids.............page 481

The conventional fluids, also referred to as polydimethylsiloxanes, exhibit all the properties of the silicone
family. The other classes of fluids can be considered
modifications of the conventional fluids in which one
set of properties has been enhanced, but generally otherproperties are altered or sacrificed.

n Dielectric Stabilityn High Compressibilityn Chemical Inertness

n Low Surface Tension

PR

n Low Toxicity

These features have facilitated the adoption of silicones
as dielectric, hydraulic, heat transfer, power transmission
and damping fluids. They have found applications whenincorporated as additives into plastics and rubbers asprocess and release aids, into coatings for flow and level
control and into process streams as antifoams. Other uniqueproperties have led to their introduction in acousticalapplications such as ultrasonic sensor and sonar buoys.
Light refractive and index matching properties have allowed
the use of silicones in fiberoptics and optoelectronics.
This proliferation of applications has engendered many
improvements and refinements of silicone fluids.

462

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Enabling Your Technology

DEFINITIONS AND TERMS
A unit of kinematic viscosity, equaling 1 mm2/sec.

Consistency

The resistance offered by a real fluid to deformation.

Fluid

A substance which undergoes continuous deformation when subjected to sheer stress.

Glass Transition Temperature

The temperature associated with a change from a glass state to a plastic state. For
silicones the Tg is usually substantially below room temperature.

Kinematic Viscosity

Differs from viscosity in that it is the measure of volume flow of a liquid, defined as a
stoke (St.) A stoke equals 1 cm.2/sec. or 10 -4m2/sec. A centistoke, cSt. = .01 St. =1 mm.2/sec. Kinematic viscosity of a liquid (stokes) can be converted to viscosity (poise)by multiplying by the density of the fluid.

O
O
F

Centistoke

Non-Newtonian Fluid

A fluid with consistency which varies as a function of shear stress as well as

Pascal-Second

temperature and pressure.
Pa.s, the SI unit for viscosity, equalling 1 kg(m.s) or 10 Poise.

Saybolt Viscosity

A measure of kinematic viscosity. To convert from SSU to St., apply the following formula for SSU > 100: St. = .00220(SSU) – 1.35/t.

Relative Viscosity

For a fluid polymer solution, the ratio of solution viscosity to solvent viscosity at thesame temperature; µr=µ/µ .
0Viscosity

Constant consistency under fixed pressure and temperature of simple liquids orgases. Perfect or ideal fluids offer no resistance to shear and have zero consistency.
Viscosity dimensions are force per area x time. The unit of viscosity is the poise (p.)= 1g/(cm.)(sec.) and is a measure of mass flow of a liquid. One poise is equal to 0.1Pa•sin SI units.

Viscosity-Temperature Coefficient

A measure of the change of fluid viscosity over the temperature range 38°C to 99°C;
V.T.C. = 1-(viscosity @99°C/viscosity @ 38°C). Thus, the lower the V.T.C. the less thechange in viscosity over the temperature range.

PR

NOTES AND SPECIFICATIONS
Molecular Weights

Compositional Percentages
Viscosities
Temperature
R&D only

Reported values are derived from kinematic viscosity measurements and correlate tonumber average molecular weight. GPC Number average molecular weights for dimethylsiloxanes have been related to polystyrene standards according to Pekala (American
Laboratory 15, 4 1983): log Mw PDMS/MwPST = 1.1813 + 0.0769V, where V is retention
volume.
All copolymer percentages are mole %; graft and block polymer percentages are weight %.
Reported values for kinematic viscosities for homopolymer fluids are ± 10% for fluids≤100,000 cSt and ± 15% for fluids>100,000 cSt. Reported viscosities for copolymer
fluids are ±20%.
When not indicated, reported properties for silicone fluids are at 25°C (298.15°K).
Indicates that the product is not registered with the EPA for commercial or industrialuse. Products not listed as R&D only are registered for industrial use - TSCA listed.

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463

Silicone Fluid Selection Guide
Selecting A Silicone Fluid

Function
Dielectric
Coolant/Fluid

Lubrication

O
OF

There are two approaches to selecting the proper silicone fluidfor an application. The fluid class can be chosen by comparing
specific physical property requirements in the property profile byclass chart located inside the front cover or by comparing function
and application requirements in the following table. Once thefluid class is selected, a specific grade can be determined on thenext few pages by following the color key.

Application

Fluid Class

Transformers, Rectifiers
Capacitorsn

Conventional

MagnetronnnConventional
Thermal

Dielectric Impregnationof Porous SubstratenConventional

Mold Release

n
n
n
n

Conventional
Organic Compatible
Emulsion

n
n
n
n
n
n
n

Organic Compatible

n
n
n
n
n
n
n
n
n

Hydrophilic

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Aluminum Machining
and Extruding
Die CastingPR

Ball Bearing and Gear
Lubrication
Airborne Radar

Rubber/Plastic Contact
Fiber/Plastic Contact

Metal/Plastic Contact

Metal/Metal Contact
Grease464

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Organic Compatible

Organic Compatible
ThermalFluorosilicone
Low Temperature
Conventional
Organic Compatible

Organic Compatible
ThermalFluorosilicone
Organic Compatible
Thermal (Chlorophenyl)
Conventional,
Thermal or
Fluorosilicone
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Function

Application

Fluid Class

Working Media

Fluid Clutch

Conventional
ThermalRefrigerated Systems

n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n
n

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Smart Fluids
Hydraulic Fluid

Shock Absorber

General Damping
Meter Damping
Timing Devices

Magnetic Amplifier
Diffusion Pump

Performance
Additive

Surfactant/Antifoam

Hydrocarbon Compatibility
Flow Control
Wetting

PR

Radiation ResistanceAcoustical

SonobuoySound Coupling/Lensing

Optical

Optical Coupling Fluid
Anti-fog Agent

Gloss Enhancement

Heat Transfer

Low Temperature,
Conventional
ThermalConventional (Intermediate Viscosity)

O
O
F

Brake Fluid

Conventional
Organic Compatible

Heat Treatment BathConstant Temperature BathTemperature Measurement
DeviceClosed Loop Heating

Conventional
Thermal orConventional
ThermalFluorosilicone
Conventional
Conventional
ThermalThermalThermal (Oligomeric)Conventional (Low Viscosity),
Hydrophilic
Fluorosilicone
Organic Compatible

Conventional (Low Viscosity)
Hydrophilic
ThermalConventional (Reduced Volatility)
Fluorosilicone
ThermalHydrophilic
Conventional (Low-Intermediate Viscosity)
ThermalConventional (Intermediate Viscosity)
ThermalConventional, (Intermediate Viscosity),
ThermalFluorosilicone
ThermalLow Temperature
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465

Conventional Silicone Fluids
Polydimethylsiloxanes, Trimethylsiloxy TerminatedConventional fluids are the wellknown general purpose silicones
described in chemical notation as
polydimethylsiloxanes. They are commercially produced in viscosities ranging
from 0.65 to 20,000,000 cSt.

Properties

Product Code*Viscosity
Viscosity
Temp.
cSt.
Coefficient

Pourpoint°C

Specific
Gravity

Coeff. ofRefractive
Index

.65
1.0
1.5
2.0
3.0

.32
.37
.46
.48
.51

-68
-85
-75
-80
-70

.761
.818
.853
.873
.898

1.37501.38251.38801.39001.3935

DMS-T05
DMS-T07
DMS-T11
DMS-T12
DMS-T15

5.0
7.0
10
20
50

.54
.55
.56
.59
.59

-65
-65
-65
-65
-65

.918
.930
.935
.950
.960

1.39701.39801.39901.40001.4015

DMS-T21
DMS-T22
DMS-T23
The fluids are thermally stableindefinately at 150°C in air. Fluids with DMS-T25
viscosities of 50 cSt. or greater have neg- DMS-T31

100
200
350
500
1,000

.60
.60
.60
.60
.61

-65
-60
-60
-55
-50

.966
.968
.970
.971
.971

1.40251.40301.40311.40331.4034

DMS-T35
DMS-T41
DMS-T41.2
DMS-T43
DMS-T46

5,000
10,00012,50030,00060,000

.61
.61
.61
.61
.61

-48
-48
-46
-43
-42

.973
.974
.974
.976
.976

1.40351.40351.40351.40351.4035

DMS-T51
DMS-T53
DMS-T56
DMS-T61
DMS-T63
DMS-T72

100,000
300,000
600,000
1,000,000
2,500,000
20,000,000

.61
.61
.61
.62
.62
.62

-41
-41
-41
-39
-38
-35

.977
.977
.978
.978
.978
.979

1.40351.40351.40351.40351.40351.4035OOF

DMS-T00
DMS-T01
DMS-T01.5
DMS-T02
DMS-T03

Conventional silicone fluids arecomposed of polymer chains with uniqueflexibility. Polydimethylsiloxane has
virtually no energy barrier for rotation.
This results in one of the lowest glasstransition temperatures of any polymer.
The liquid surface tension of polydimethylsiloxane is lower than the criticalsurface tension of wetting (24 dynes/cm). This causes polymers to spread overtheir own adsorbed films. An importantconsequence of the low intermolecularforces in polysiloxanes is the highest
permeability coefficients of any polymer
for oxygen and nitrogen.

ligible vapor pressure.

PR

At viscosities greater than 1,000 cSt.
correlating to molecular weights greaterthan 30,000, polymer chain entanglement
occurs, resulting in leveling of physicalproperty change vs. viscosity. Refractive
index, surface tension, density andviscosity-temperature coefficients are
strikingly flat.

*Product code Definition
Prefix:
DMS=DiMethylSiloxane

Suffix:
1st character=Trimethylsiloxy terminated

2nd character=viscosity in decades, i.e. 10X

3rd character=viscosity to 1 significant figure466

Viscosity specifications for polydimethylsiloxanes: ± 10% for fluids 100,000 cSt. and less; ± 15% for
fluids >100,000 cSt.
Data in the above table provide properties that vary significantly with viscosity and molecular weight. Manyof the properties of polydimethylsiloxanes do not vary significantly when viscosity is greater than 10 cSt. Tables
and graphs on the next pages provide information on the following properties: ACCOUSTICAL, DENSITY,
ELECTRICAL, MECHANICAL, MOLECULAR WEIGHT, OPTICAL, RADIATION RESISTANCE,REACTIVITY, RHEOLOGY, SOLUBILITY, THERMAL PERMEABILITY.

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Enabling Your Technology

CAS: [9016-00-6] and [63148-62-9]
ThermalThermalConductivity
SurfaceExpansion x10-4 cal/cm. sec. x10-4 °C Tension

11.2
11.0
10.8
10.7
10.6
9.3
9.3
9.3
9.3
9.3

9.2
9.2
9.2
9.2
9.2
9.2

100g

1 gallon container

5 gallon container

14kg /
14kg /
15kg /
15kg /
15kg /
15kg /
15kg /
16kg /
16kg /
16kg /
16kg /
16kg /
16kg /
16kg /
17kg /
17kg /
17kg /
17kg /
17kg /
17kg /
17kg /
17kg /
17kg /
17kg /
—
—

2.4
2.4
2.5
2.6
2.7

15.9
17.4
18.0
18.7
19.2

2.20
2.30
2.39
2.45
2.50

300
350
350
350
350

-1
39
63
79
100

162
237
340
410
550

¥6,900¥11,400¥12,200¥13,800¥12,200

2.5kg / ¥38,200
2.5kg / ¥75,000
2.5kg / ¥82,700
2.5kg / ¥82,700
2.5kg / ¥82,700

2.8
3.0
3.2
3.4
3.6

19.7
19.9
20.1
20.6
20.8

2.60
2.65
2.68
2.72
2.75

375
375
375
375
400

135
150
163
232
285

770
950
1,250
2,000
3,780

¥6,900¥6,900¥6,400¥6,400¥6,400

3.7
3.7
3.8
3.8
3.8

20.9
21.0
21.1
21.1
21.2

2.75
2.75
2.75
2.75
2.75

400
400
400
400
400

315
315
315
315
315

5,970
9,430
13,65017,25028,000¥6,400¥6,400¥6,400¥6,400¥6,400

3.8
3.8
3.8
3.8
3.8

21.3
21.5
21.5
21.5
21.5

2.75
2.75
2.75
2.75
2.75

400
400
400
400
400

315
315
315
315
315

49,35062,70067,70091,700116,500¥7,400¥7,400¥9,000¥9,000¥9,000

3.8
3.8
3.8
3.8
3.8
3.8

21.5
21.5
21.6
21.6
21.6
21.6

2.75
2.75
2.75
2.75
2.75
2.75

400
400
400
400
400
400

321
321
321
321
321
321

139,000
204,000
260,000
308,000
423,000>500,000¥11,900¥11,900¥11,900¥14,900¥17,500¥14,900

3kg / ¥72,700
3kg / ¥46,400
3kg / ¥39,300
3kg / ¥39,300
3kg / ¥39,300
3kg / ¥35,800
3kg / ¥39,300
3kg / ¥39,300
3kg / ¥39,300
3kg / ¥39,300
3.5kg / ¥44,900
3.5kg / ¥44,900
3.5kg / ¥48,600
3.5kg / ¥48,600
3.5kg / ¥48,600
3.5kg / ¥69,800
3.5kg / ¥69,800
3.5kg / ¥69,800
3.5kg / ¥89,700
3.5kg / ¥117,800
3.5kg / ¥112,200

PR

9.3
9.3
9.3
9.3
9.2

PRICE

Molecular
Weight

O
O
F

13.4
13.4
13.4
11.7
11.4

DielectricDielectric Strength Flashpoint
Constant volts/milC°*Available in drop-wise dispenser bottle

Low Volatility Grades
Volatile Cyclic Silicones
Emulsions
Colored Silicone Fluids
Branched Methyl Fluids

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page 472
page 472
page 473
page 473
page 482(215) 547-1015

Drum pricing available upon request.

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467

Properties of Conventional Silicone Fluids (Polydimethylsiloxanes) – continued
Polydimethylsiloxane properties that do not vary significantly for fluids with viscosities greater than 10 cSt. are listed below.

Acoustical*

DensityDensity vs. Temperatureof Dimethylsiloxane Fluids
1.02
1.00
98

Density g/cc

0.65
2.0
20
100
1,000

Velocity of sound, m/s
30°C
50.7°C
873
795
931
863
975
918
985
930
987
933

96

1000

94

100

cSt

cSt

O
O
F

Fluid Viscosity (cSt.)* for additional information see: Pouey, M. et al, Phys. Chem.
Chem Phys., 2003, 5, 73

92
90

10 c

88

St

86
84
82
80

-25

0

25

50

75

100

125

150

TEMPERATURE, °C

Electrical

Dielectric Strength
Dielectric Constant 102-106Hz, 20°C
Dissipation Factor
Volume Resistivity
Dielectric Constant

Dimethylsiloxane
used in smart
magnetic &electrorheologicalfluids.

350-400V/mil
2.44-2-2.76
0.00011x1015ohm-cm at 20°C

Dielectric Strength in kV/mm

3

PR

2.5
2

0

100

kV/mm

16
14
12
10

200

0

100

TEMPERATURE, °C

0.01

0.001

0.0001

0

100

200

Moisture Absorption vs. Resistivity
Volume Resistivity (|/cm)

Power Factor

1016

1015

1014

1013
0

50

TEMPERATURE, °C

468

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200

TEMPERATURE, °C

100

150

WATER (ppm)

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200

250

Enabling Your Technology

Mechanical
Coefficient of adiabatic compressibility

1.10x10-10cm2/dyne

Volume reduction of 100 cSt. fluid
at 1,000 psi

0.70-0.75%

at 10,000 psi

5.50-5.90%

at 20,000 psi

9.00-9.20%

at 40,000 psi

13.30-13.80%

O
O
F

Fluid dampeners utilize electrorheologicalfluids that contain polydimethylsiloxane

Molecular Weight

Note: The straight portion of the slope corresponds to A.J.
Barry’s relationship on molecular weights>2,500:
log µ

cSt

100,000

VISCOSITY at 25°C. cSt

Viscosity, µ, of Polydimethylsiloxanes as a function of a degree ofpolymerization “n”.

= 1.00 + 0.0123M0.5

10,000

1,000

100

10

1

n

PR

MOLECULAR WEIGHT (Calculated)

Optical

1

5

162

2,000

10

5,000

20

10,00050,00040

100,000

Radiation ResistanceRefractive index, 25°C

1.397-1.404

Verdet constant ofmagnetic rotary power

16.2-16.9x10 mm/gm/cm-3

VISCOSITY at 25°C. cSt

10,000Effect of Gamma Radiation
on Viscosity of Silicone Fluids
25°C

200°C 150°C

DMS-T31 Polydimethylsiloxane

1,000

200°C
150°C

25°C

PMM-0025 Polymethylphenylsiloxane

200°C
150°C
100

Gelest, Inc.

25°C

PMM-5021 Dimethyl-Phenylmethylsiloxane copolymer

0

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30

10Radiation dose (megarads)(215) 547-1015

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100

469

Properties of Conventional Silicone Fluids (Polydimethylsiloxanes) – continued
Polydimethylsiloxane properties that do not vary significantly for fluids with viscosities greater than 10cSt. are listed below

Reactivity
While they exhibit low reactivity under many conditions,certain environments are destructive to silicone fluids. Hydrogen
fluoride, for example, attacks the silicon-oxygen bond to produce
dimethylsilyl fluorides and water, which generate corrosive gases.
Strong bases such as methanolic potassium hydroxide destroy
silicone fluids and create resinous byproducts.

Solubility of Water
The equilibrium water absorption of silicones is 100-200ppm
at 50-85% relative humidity. Drying of fluids is recommended for
maximum performance in electrical applications. A typical drying
protocol is to apply 1mm vacuum for 1 hour, which typicallyreduces water levels below 25ppm.

O
O
F

Thermal degradation at elevated temperatures causes
rearrangement of the silicon-oxygen bonds to product volatile
byproducts. Free-radical reaction of the methyl groups to form
cross-linked materials by oxidation with peroxy compounds
increases fluid viscosity and causes the fluid to gel.

and dihexyladipate. They are insoluble in methanol, cyclohexanol
and ethylene glycol. The solubility parameter for 100 cSt. fluid is 7.4.

Solubility of Fluids

Methylene chloride, chlorofluorocarbons, ethyl ether, xylene
and methylethyl ketone are typical solvents for dimethylsiloxanes.
Low viscosity polymers are also soluble in acetone, ethanol, dioxane

Solubility of Gases
Gas
Nitrogenml gas/ml liquid @25°C
0.16-0.17

Carbon Dioxide

1.00

Air

0.16-0.19

Hydrogen0.11-0.12

Gaseous Permeability of Polydimethylsiloxane
Gas
H2
He
NH3
H2O
CO
N2
NO

Gas

P* x 109

97

N2O

650

n-C6H14

1410

52

NO2

1140

n-C8H18

1290

885

SO2

2250

n-C10H22

645

5400

CS2

1350

HCHO

1665

51

CH4

142

CH3OH

2085

42

C2H6

375

COCI2

2250

90

C2H4

200

Acetone

835

90

C2H2

3960

Pyridine

2865

1500

C3H8

615

Benzene

1620

PR

O2

P* x 109

H2S

Gas

Ar

90

n-C4H101350

Phenol

3150

CO2

410

n-C5H12

3000

Toluene1370*cm 3/s • cm 2 • cm Hg
values adjusted from filled silicone membranes

Thermal470

P* x 109Specific heat
Heat of formation

0.35-0.37 cal/gm/°C-2.41 kcal/gm

Heat of combustion (>50 cSt.)

6.13 kcal/gm

Glass transition temperature-128°C

Gel time, 150°C

indefinite

Gel time for intermediate viscosity fluids, 200°C

200 hours

Gel time for high viscosity fluids, 200°C

100 hours

Autoignition temperature for fluids >10 cSt.

greater than 460°C

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Enabling Your Technology

Rheological Behavior Under Shear
At shear rates commonly encountered (≤10 4s -1) polydimethylsiloxanes behave, at viscosities up to 1,000 cSt., like Newtonian
fluids. Viscosity is constant and independent of the velocity
gradient. Apparent viscosity is identical with viscosity extrapolated
to zero velocity gradient.

Critical velocity
gradient (s-1)

Apparent
viscosity
for a velocity
gradient of
10,000 s-1(in cSt.)

2,500
200
150
30

850
4,700
6,000
8,200

O
O
F

For oils of a higher viscosity than 1,000 cSt., this ratio is only
constant for velocity gradients below a certain value. Beyond thisvalue, becoming lower as the product becomes more viscous—
the ratio is no longer constant: apparent viscosity falls below realviscosity (extrapolated for a zero velocity gradient) and the behavior
is then known as “pseudoplastic.” This change is perfectly reversible,
and behavior again becomes Newtonian when the velocity gradientfalls once more below the critical value. Viscosity returns to its
initial level even after intense shearing of long duration.
As a guide, the table indicates the “critical” velocity gradientsfor polydimethylsiloxanes (where change of rheological behavior
occurs) as well as apparent viscosity measured at velocity gradientequal to 10,000 s-1.

1,000
12,50030,000100,000

Apparent Viscosity as a Function of Velocity Gradient2,000,000
1,500,000
500,000

500,000
200,000
100,000PR

200,000

2,000,000

Viscosity in cSt.

100,000
50,00020,00010,000
5,000
2,000
1,000

60,00030,00020,00012,50010,000
5,000
2,000
1,000

500

0.1

0.2

0.3

1

2

5

10

20

50

Temperature 25°C
100

200

500 1,000 2,000

5,000

10,00020,000100,000
500,000
50,000200,000
1,000,000

VELOCITY GRADIENT (s-1)
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471

Low Volatility
PolyDimethylsiloxanes
Reduced Volatility PolyDimethylsiloxanes
wt% volatiles measured after 4 hours at 150°C in air
Product CodeViscosity

wt % Volatiles

Price/1kg

DMS-T07R

7

10¥45,700

DMS-T12R

20

3.0¥59,000

O
O
F

Volatile, low molecular weight components are present
in polydimethylsiloxanes as a consequence of the equilibrium
polymerization utilized in their manufacture. Typically,silicones with viscosities below 50 cSt. have >10% volatiles,
while those with viscosities greater than 50 cSt. have
0.5-4.0% volatiles. Low molecular weight components canimpart undesirable effects in certain critical applications.
These can cause outgassing, migration, bleed, plasticization,and stress-cracking in contact with certain plastics andrubbers. Devolatilized silicones are offered in two classes.
Reduced Volatility Silicones have >90% low-molecularweight components removed and are generally acceptablefor polymer contacting applications. Extreme Low Volatility
Silicones have virtually zero volatiles and are suitable forextreme vacuum applications including systems deployed inspace exploration and communication. An example of a space
application is as a damping fluid for solar panels.

Volatile Cyclic
PolyDimethylsiloxanes Cyclomethicones

DMS-T21R

100

0.5¥43,100

DMS-T31R

1,000

0.1

¥65,600

see also FMS-222R in Fluorosilicone section(7)-476

Extreme Low Volatility PolyDimethylsiloxanes<0.01wt% volatiles measured after 24 hours at 125°C 10-5 torr
vacuum, according to ASTM-E595-85 and NASA SP-R0022A
Product CodeViscosity

Price/100g

DMS-T23E

350¥80,400

DMS-T31E

1,000¥80,400

DMS-T41.2E

12,500¥80,400

PR

Low molecular weight silicone that possess a cyclic
structure rather than a chain structure serve as volatile carriers
for a variety of formulations. Low heats of vaporization andthe ability to select a desired vapor pressure has led to theiruse as cosmetic vehicles. While most display a broad rangeof liquid behavior, the most volatile cyclic dimethylsiloxane,
D3, is a solid at room temperature.

Volatile Cyclic Dimethylsiloxanes (Cyclomethicones)

Product Code

Name

Viscosity,cSt.

Boiling
Point, °C

Vapor
Pressure,
25°C, mmHeat ofVaporization
Kcal/moleSpecific
Gravity

Refractive
Index

Molecular
WeightPrice/
100g

SIH6105.0

D3

solid, 65° m.p.

134°

10

9.5

1.02

-

222.46¥8,200-

SIO6700.0

D4

2.3

175-176°

1.3

10.9

0.96

1.397

296.61¥4,500¥24,000

SID2650.0

D5

3.9

210°

0.4

12.0

0.96

1.398

370.77¥4,500¥33,600

SID4625.0

D6

6.6

245°

0.02

-

0.97

1.402

445.93¥58,300¥345,800

2.4

134-245°

1.5

-

0.96

-

222-445-¥18,800

SID4075.0 D3-6(blend)

472

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Price/
2kg

Enabling Your Technology

Silicone Emulsions
Silicone emulsions are easy-to-use, water-dilutable, fineparticle dispersions of conventional polydimethylsiloxane
fluids. They are employed as release agents and lubricantsin a variety of rubber and plastic applications including
molding of mechanical rubber parts such as O-rings andfootwear, producing shell molds and cores for metal casting,wire and cable extrusion and conveyance devices in highspeed printing. They are usually diluted with water to a final
solids concentration of 0.1-3.5% at the point of application.

PolyDimethylsiloxane Silicone Emulsions
emulsifier content: 3-6 wt %wt % Solids

Base fluid
Emulsion TypePrice/100g

Price/3kg

Price/18kg

DMS-T21M50

100

53-56

Non-ionic¥7,400¥31,300¥118,000DMS-T31M50

1,000

54-58

Non-ionic¥6,600¥28,700¥103,000DMS-T41M50

10,00051-55

Non-ionic¥6,600¥28,700¥103,000DMS-T51M35>100,000

33-36

Anionic¥7,400¥32,100¥121,000

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473

O
O
F
Viscosity

Product Code

Silicone Fluid Blends

Very high viscosity silicone fluids are difficult to apply
as thin films. Solutions in volatile low viscosity silicones areeasy to handle and facilitate film spread.

PolyDimethylsiloxane Fluid Blends
Product CodeDMS-T51B20

100,000

15-20x106Viscosity, cSt

Blend
Price/100g

Price/3kg

20

200-500¥11,900¥67,100

15

4,000-8,000¥14,600¥85,700PR

DMS-T72B15

High Viscosity,
Component, cSt wt % Solids

Colored Silicone Fluids

Dyes in silicone fluids provide coloration without compromising transparency. The fluids may be used directly
in applications such as gauge fluids or as tint additives forsilicone fluids and elastomers.

Product CodeDescription

Price/100g

Price/1kg

DMS-T21BLU Blue Dye in 100 cSt. fluid¥8,800¥25,800

DMS-T21RED Red Dye in 100 cSt. fluid¥8,800¥25,800

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Thermal Silicone Fluids

Thermal Silicone Fluids for Mechanical andHeat Transfer Applications (Aromatic siloxanes)
DiPhenylsiloxane-DiMethylsiloxane Copolymers

The thermal silicone fluids are described in chemical notation as aromaticsiloxanes because of the presence ofphenyl groups.

At elevated temperatures, and in thepresence of oxygen, silicone polymers are
subject to two types of degradation:
R
Si
R

R
O

Si
R

R

O

Oxidizing attack

PDM-0421

100

29

0.62

-73

-

150-200

PDM-0821

100-125

30-32

0.63

-70

-

1200-1500

PDM-1922

150-250

26-28

0.78

-40

-

1500-2000

R

PhenylMethylsiloxane-DiMethylsiloxane Copolymers

CAS: [63148-52-7]

PMM-1015

50

14

0.61

-70

-121

220-260

PMM-1021

100

35

0.62

-70

-121

210-230

PMM-1025

500

180

0.62

-70

-121

180-200

PMM-1043

30000

5500

0.63

-65

-121

<100

PMM-5021

125

20

0.78

-51

-100

1000-1400

PMM-6025

500

60

0.79

-34

-

1500-1900

PhenylMethylsiloxane Homopolymers

CAS: [9005-12-3]

PMM-0011

10-20

<5

-

-55

-

>flashpoint**

PMM-0021

100-200

14-20

0.79

-

-

1600-2100

PMM-0025

500

35

0.88

-20

-86

1500-2000

PhenylMethylsiloxane-Diphenylsiloxane Copolymers

Si

Thermal attack

Phenyl groups provide enhanced
thermal properties by two mechanisms:

PMP-5025

2. The lower susceptibility of thephenyl group to oxidative attack.

As phenyl groups replace methylgroups in a polysiloxane, several changes
occur. Oxidation resistance, thermal
stability and shear resistance are enhanced.
For polyphenylmethylsiloxane the service
temperature is -55°C to 290°C. The geltime of several fluids is provided in theaccompanying table. In closed oxygen-freesystems the polyphenylmethyl-siloxanes
are stable for thousands of hours at 250°C.
The materials are used in heating baths.
The phenyl group also introduces
rigidity in the silicone chain. When sub-300-600--

CAS: [308073-01-0]

-10

-

-

PhenylMethylsiloxane Oligomers - Diffusion Fluids
1,1,5,5-Tetraphenyl-1,3,3,5-tetramethyltrisiloxane
PDM-7040
35-40
<5
-

-35

CAS: [3982-82-9]>flashpoint**

1,1,3,5,5-Pentaphenyl-1,3,5-trimethyltrisiloxane
PDM-7050
170-5
6
-

-15

-

PR

1. Better protection of the chain
Si—O—Si—O by steric hindrance.

474

Viscosity 25°C Viscosity, 99°C
Viscosity
PourTransition Gel time, hours
cSt.
cSt.
Temp. Coeff. Point, °C Temp.,Tg °C 250°C in air *OOFHigh phenyl content fluids are utilized
as heat-exchange fluids, dielectric coolants,
impregnants for sintered metal bearing, andbase oils for high temperature fluids. Low
phenyl content fluids are utilized at lower
temperatures than high phenylsilicones
and find extended temperature service
applications as lubricating oils for criticaldevices such as timers and systems
involving rubber, plastic and aluminum
mating surfaces.

Product Code

CAS: [68083-14-7]

Tetrachlorophenylsilsesquioxane-Dimethylsiloxane Copolymers
PTT-1117

70-5

18

0.68

CAS: [3390-61-2]>flashpoint**
CAS: [68957-05-1]-73-

270-280* The gel time for conventional fluids (DMS-T31) is <10 hours; coking time for mineral oil is <2 hours**Unsafe operating temperature in air.

stitution exceeds 75 mole percent, thepolymers are solid. Refractive index also
increases with phenyl concentration. At
15-16 mole percent phenyl concentrations,the refractive index matches that of opticalfibers and amorphous silica allowing “invisible” connections and transparent blends.
Low viscosity phenyl fluids, PDM7040 and PDM-7050, are used as diffusion
pump fluids. Chlorinated aromated siloxanes

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provide superior lubrication for metal-metal
contact. The polyphenylmethylsiloxanes also
exhibit good radiation resistance, remaining
serviceable up to 200 megarads exposure.
(See page 469)
The compressibility of phenyl containing siloxanes is reduced in comparison
to dimethyl fluids. The compressibility of
selected thermal fluids at 20,000 psi are asshown in the accompanying table.

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Enabling Your Technology

Refractive
Index

SurfaceTensionDielectric
Constant

Flashpoint°C

Ignition
Temp., °C

Comonomer
mole %

Molecular
Weight

Price
100g

Price
1kg

Price
10kg

0.98

1.422

22.6

2.75

280

484

4-6*

3,500-4,000¥7,400¥34,600¥244,000

0.99

1.436

22.8

2.78

280

484

7-10*

2,800-3,200¥6,900¥30,300¥213,000

1.05

1.490

24.5

2.83

285

488

18-22*
1,600-2,400*Diphenylsiloxane¥9,800¥52,600¥339,000

1.00

1.425

1.00

1.425

1.00

1.425

1.00

1.425

1.07

1.500

1.08

1.507

1.01

1.470

1.09

1.520

1.11

1.533

1.10

1.543

1.07

1.556

1.09
1.05

O
O
F

Specific
Gravity

2.77

275

482

8-12**

1,500-1,600¥8,800¥42,800¥288,000

24.5

2.79

280

482

8-12**

3,000-4,000¥10,900¥57,100¥330,000

24.4

2.80

285

482

8-12**

9,000-11,000¥9,500¥49,700¥324,000

24.8

2.82

285

482

8-12**

40,000-50,000 ¥20,400¥125,500

-

24.5

2.87

296

482

45-50**

2,000-2,200¥9,500¥49,700¥324,000

2.89

285

482

58-62**
3,500-4,000**Phenylmethylsiloxane¥9,300¥42,800¥288,000

-

-

220

420

-

350-450¥29,700¥182,800

-

-

2.93

280

484

-

700-1200¥26,300

-

-

28.5

2.95

300

487

-

2,500-2,700¥9,500¥49,700¥326,000

-

-

300

-

¥326,000

-

37.3

-

221

425

-

485

¥14,600¥82,800¥532,000

1.588

36.5

-

245

440

-

547

¥18,600¥112,000¥652,000

1.428

21.0

2.90

300

480

-

1,600-3,000¥12,700¥70,100¥410,000

PR

25.0

Thermodynamic Properties*

Thermal Expansion, (25-150°C), cc/cc/°C:
Thermal Conductivity, cal/(sec.)(cm2)(°C/cm):
Specific Heat, 38°C, cal/gm/°C:

Volume Resistivity, Ω-cm:

25°C: 1-4 x 10
50°C: 1-5 x 1012

Dielectric Strength, kV/mm:

14

Dissipation Factor:

at 102 Hz: 1.1-5.1 x 10-4
at 106 Hz: 0.1-1.1 x 10-4-

Compressibility at 20,000 psi

7.5-9.4 x 10
3 x 10-4
0.34-0.39

Electrical Properties*

45-55**
600-800**Phenylmethylsiloxane-4

Product CodeCompressibility, % Description

PTT-1117

8.3(Tetrachlorophenyl)Dimethylsiloxane
Branch Copolymer

PMM-1025

7.9

Phenylmethylsiloxane
Dimethylsiloxane Copolymer

PMM-1922

6.5

Diphenyldimethylsiloxane Copolymer

PMM-0025

5.5

Polyphenylmethylsiloxane

14*Properties do not apply to PTT-1117

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475

Organic Compatible Silicone Fluids
Alkyl Silicones

Modification of the alkyl chain length
allows for varying the organic characteristicsof the siloxanes. A longer alkyl chain translates
to higher compatibility with hydrocarbon oils
and increases in pour point. The series moves
from liquid at room temperature (octyl) topour points just above room temperature(tetradecyl) to creamy solids at room
temperature (octadecyl and higher).

O
O
F

Silicones wth alkyl or aromatic substituted alkyl side chains
can allow for many of the advantages of silcones to be formulated
in organic based formulations. The alkyl modfied silicones
offer greater organic compatibility with organic materials,
improved lubricity, reduced tack, higher viscosity-temperature
coefficients, lower compressibility and decreased oxidation
stability when compared to polydimethylsiloxanes. Both ethylenedimethylsiloxane and alkylsiloxane-dimethylsiloxane copolymers
are readily miscible in many hydrocarbons allowing for the
introduction of silicone properties.

AlkylMethylsiloxane Homopolymers
PourPoint, °C

Specific
Gravity

-44

0.91

1.445

30.4

30

0.89

1.455

35.0

0.89 (50°C) 1.443

39.5

CAS: [68440-90-4]¥35,000¥239,000
CAS: [76684-67-8]¥9,000¥44,000¥258,000(solid at room temperature) CAS: [68607-75-0]¥9,000¥50,000¥289,000(45-55% HexadecylMethylsiloxane) - (DiMethylsiloxane) Copolymer
ALT-281
40-70
19
0.86
1.448
28.3
(27-33% OctadecylMethylsiloxane) - (DiMethylsiloxane) Copolymer
ALT-292
25-50 (40°C)
40
0.89
1.440
(1-2% TriacontylMethylsiloxane) - (DiMethylsiloxane) Copolymer
ALT-561
2000-4000 (100°C) 75-

CAS: [191044-49-2]¥9,000¥50,000¥289,000(solid at room temperature) CAS: [67762-83-8]¥14,600¥84,000
CAS: [17525-30-0]¥21,000 ¥129,000-

Product CodeViscositycSt.

polyOctylMethylsiloxane
ALT-143600-1000
polyTetradecylMethylsiloxane
ALT-173700-1200
polyOctadecylMethylsiloxane
ALT-192
250-500 (50°C)

50

Refractive Surface
Index
TensionFlashpoint
°C

250

Price
100g

Price
1kg

Price
10kg

¥7,400

AlkylMethylsiloxane DiMethylsiloxane Copolymers

Alkyl Terminated PolyDiMethylsiloxanes

0.92

1.413

-

>150

¥13,500[R&D Only]¥53,000

Octadecyl Terminated PolyDiMethylsiloxane
DMA-091
20-30 (35°C)
14

0.88

1.434

25.1

>150

¥14,600

CAS: [128446-57-1]¥84,000-

Hexacosyl Terminated PolyDiMethylsiloxane
DMA-13165 (55°C)
44-5

0.87

1.415

-

>150

¥15,400[R&D Only]¥87,000¥14,600

CAS: [1283601-17-1]¥45,200-

PR

Butyl Terminated PolyDiMethylsiloxane
DMA-02110-15-40

MonoHexacosyl Terminated Polydimethylsiloxane
MMA-131
45
18-9
0.89

476

www.AZmax.co.jp TEL: 03-5543-1630

1.428

-

>150

Alkyl fluids improve plastic on plastic
lubrication and have greatercompatibility during processing
and molding.

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Enabling Your Technology

Aryl-Alkyl Silicones

O
O
F

Aryl-alkyl silicones exhibit an extended range of organic compatibility and lubricity
when compared to dimethyl silicones. They behave as broad spectrum compatibilizing agentsfor silicone/hydrocarbon/fatty acid formulations in the lubricant and cosmetic industries.
Fluids with methyl and 2-phenylpropyl groups maintain excellent release properties without
interfering with paintability, making them preferred in mold release agent formulations forrubber and plastics and die casting. Other uses for organic compatible silicone fluids include
surfactants or de-airing molded urethane and epoxy parts during fabrication and die-cast
metal lubrication.

AlkylMethylsiloxane-ArylalkylMethylsiloxane Copolymers
Product CodeViscosity
cSt.

PourPoint, °C

Specific
Gravity

Refractive
Index

SurfaceTensionFlashpoint°C¥9,000¥9,000¥8,200¥9,000

Price
1kg

Price
10kg

CAS: [71329-48-1]¥50,000¥289,000
CAS: [68037-77-4]¥50,000¥289,000
CAS: [68952-01-2]¥39,000¥264,000
CAS: [68037-76-3]¥50,000¥289,000PR

poly(2-Phenylpropyl)Methylsiloxane
APT-133
1000
1.02
1.480
28.4
258
(75-85% EthylMethylsiloxane) - (15-25% 2-PhenylpropylMethylsiloxane) Copolymer
APT-2131200-1600
1.01
1.462
28.5
209
(45-55% HexylMethylsiloxane) - (45-55% 2-PhenylpropylMethylsiloxane) Copolymer
APT-233
1500-2000
1.04
1.493
28.8
275
(60-70% DodecylMethylsiloxane) - (30-40% 2-PhenylpropylMethylsiloxane) Copolymer
APT-263
1100-1300
0.91
1.464
32.3
277

Price
100g

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477

Fluorosilicone Fluids
Many advantages of fluorocarbons and silicones are combinedin fluorosilicones. The materials are useful from -40° to 230°C
in a wide range of aggressive service environments. They haveachieved a number of unique applications due to their chemicaland solvent resistance to lubricity.

The fluids are excellent lubricants under extreme pressure
applications. This characteristic, considered with resistance tofuels has led to many automotive and aerospace lubrication
applications, since they are not easily leached by fuels frommechanical joints. In addition, fluorosilicones, particularly the
copolymers, have been employed as lubricants for electricalcontacts and precision timing devices. Greases formulatedFluorosilicones

from fluorosilicones and solid fluoropolymer thickeners havebeen used in sealed transmission and other extreme pressure
applications.

O
O
F

Fluorosilicones are not miscible with fuels or oils. They
have a solubility parameter of 9.6. They have been employed inmechanical vacuum pumps where exposure to high temperaturemoisture and oxygen is encountered.

The high density of these fluids has led to their use as a flotation
medium for inertial guidance systems. Acoustic velocities influorosilicones are lower than conventional silicones,allowing sonarlens development. Trifluoropropylmethylsiloxane homopolymers
have a compressibility of 7.5% at 20,000 psi. Volume resistivity for
fluids >500cSt: 1013 ohms-cm.

Poly (3,3,3-Trifluoropropylmethylsiloxane)

CAS: [63148-56-1]

Product CodeViscosity, Viscosity
Pour- Transition Specific Refractive Surface Dielectric Dielectric Flashpoint Molecular
cSt. Temp. Coeff. Point,°C Temp., Tg°C Gravity Index Tension Constant Strength Temp.,°C
WeightFMS-12180-120

FMS-123 300-350
FMS-125 400-500
FMS-131

1000

FMS-141

10,000

Price
25g

Price
100g

Price
1kg

-

-47

-

1.24

1.382

23.7

-

-

-

900-1000 ¥14,100 ¥37,900 ¥203,000

0.84

-47

-74

1.25

1.381

25.7

6.95

200

260

2400

¥10,100 ¥25,200 ¥157,000

0.84

-44

-74

1.26

1.381

25.7

6.95

200

270

3000

¥11,900 ¥27,100

0.85

-40

-74

1.28

1.382

26.1

7.35

200

290

4600

¥6,900 ¥14,600 ¥84,000

0.87

-30

-74

1.30

1.383

28.7

7.35

175

315

14,000¥6,900 ¥14,600 ¥84,000-

Specialty Fluorosilicones

Viscosity, Viscosity
Pour- Transition Specific Refractive Surface Dielectric Dielectric Flashpoint Molecular
cSt. Temp. Coeff. Point,°C Temp., Tg°C Gravity Index Tension Constant Strength Temp.,°C
WeightPR

Product Code(48-52% 3,3,3-Trifluoropropylmethylsiloxane) - (48-52% Dimethylsiloxane) Copolymer
FMS-221 80-120-55-1031.16 1.387 21.4
(48-52% 3,3,3-Trifluoropropylmethylsiloxane) - (48-52% Dimethylsiloxane) Copolymer
FMS-222R* 140-200-55-1031.17 1.388 21.4
(25-35%-Nonafluorohexylmethylsiloxane) - (65-75% Dimethylsiloxane) Copolymer
FMS-411 8-12cSt-40
1.22 1.365(15-20%-Tridecafluorooctylmethylsiloxane) - (80-85% Dimethylsiloxane) Copolymer
FMS-736 4000-7000 1.21 1.375 21.1
315
1,3-Bis(Tridecafluorooctyl)Tetramethyldisiloxane
SIB1816.0 6-7
1.46 1.337*reduced volatility grade (<2% volatiles measured after 4 hours at 150°C)

Price
25g

Droppingpoint, °C

4-ball wearmm, 232°C

Price
100g

Price
1kg

PP1-LUB01
320-340200-210*1200rpm, 40kg, 2hrs, M-10 steel

1.60-1.65*¥44,600¥231,000

478

Penetration
60 Stroke

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Price
1kg

CAS: [115361-68-7]¥7,200 ¥14,900 ¥86,000
CAS: [115361-68-7]
2,000¥10,600 ¥26,800 ¥167,000
CAS: [882878-48-0]
1,000¥16,200 ¥44,800 ¥235,000
CAS: [115340-95-9]
40,000 ¥18,600 ¥52,500 ¥264,000[R&D only] CAS: [71363-70-7]
826¥30,800 ¥92,600–
1,800

Fluorocarbon - Fluorosilicone Light Grease

Product Code

Price
100g

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Enabling Your Technology

Hydrophilic Silicones
Polyalkylene Oxide Silicones

Hydrophilic silicones differ from conventional silicones bydemonstrating a much greater compatibility with aqueous systems.
They have slight to complete solubility in water. They are composedof dimethylsiloxane molecular backbones in which some of themethyl groups are replaced by polyalkylenoxy or pyrrolidone groups
linked through a propyl group to the silicone atom.

O
O
F

They are widely used as surfactants and emulsifiers. By altering
the amounts of hydrophile and lipophile, the desired surfactant
properties may be balanced. The higher the alkylene oxide content
the higher the hydrophilicity. Materials with ethylene oxide contentsof 75% and higher are freely soluble in water.

At the other extreme, DBE-224 is a water-insoluble copolymer used
as a lubricant in plastic on metal wear applications and as a lubricant
for fibers. Anti-tack and mar resistance are imparted to urethane
coatings. High molecular weight copolymers, such as DBE-224,
are excellent emulsifiers. DBE-821 reduces static charge generation
during fiber processing. It has also been incorporated into rolling oil
formulations for metal drawing and stamping. DBE-712 and DBP732 provide slip in flexographic and gravure inks.

DBE-712 is the lowest molecular weight material containing 6-8
EO units and is miscible with water in all concentrations. It is used
as an anti-fog treatment for glass and optical surfaces. It is also used
to facilitate wetting and spread of developers on lithographic plates.

CMS-832 is a high refractive index fluid that provides gloss andsmooth touch in polishes.

Hydrophilic Silicones (R=OMe)

Dimethylsiloxane-Ethylene Oxide Block/Graft Copolymers
Wt %Glycol Viscosity
Product Code Non-Siloxane CappingcSt.

Molecular
WeightSpecific Refractive Pour
Water Surface
Gravity
Index
Point,°C Solubility Tension

DBE-224*

Price
100g

CAS#

Price
1kg

Price
10kg

25

OMe

400

10,000

1.02

1.414

-29

-

23.8

68938-54-5

DBE-311*** 30-35

OMe

10

800-1,200

0.97

1.425

-

-

-

68938-54-5 ¥10,100 ¥50,000-

DBE-411*** 45-50

OMe

5-10

400-500

0.94

1.425

-

-

-

68938-54-5 ¥10,100 ¥50,000-

DBE-621**

50-55

OMe

100

2,500

1.03

1.434

-15

+/-

23.1

68938-54-5¥8,200 ¥34,000 ¥235,000

DBE-712‡

60-70

OMe

20

600

1.01

1.442

0

+

23.6

27306-78-1¥6,600 ¥29,000 ¥187,000

DBP-732◊

65-70

OMe

1800

20,000

1.02

1.446

-50

+

22.0

67762-85-0¥6,600 ¥29,000 ¥187,000

DBE-713

75

OAc

30

600-750

1.03

1.446

-

+

-

125997-17-3 ¥22,500

OMe

40-50

80

1000

-

-

1.04

1.452

-14

+

26

117272-76-1 ¥10,100 ¥50,000 ¥340,000

PR

DBE-814‡¥8,200 ¥43,000 ¥235,000

DBE-821‡80-85

OMe 100-120

4400

1.07

1.454

0

+

27

68938-54-5

DBE-92185-90

OMe 100-120

5000

1.08

1.451

0

+

37.3

68938-54-5 ¥16,200 ¥83,000 ¥471,000¥6,600 ¥29,000 ¥187,000*~10 mole% EO Substituted; DP~100 **~25% EO Substituted; DP~15 ***R&D only ‡ reduced volatility grades available ◊EO/PO (40/60)

Hydroxylic Silicones (R=OH)
Wt %Product Code Non-Siloxane

GlycolGlycolCapping

ViscositycSt.

Molecular
WeightSpecific
Gravity

Refractive
Index

CAS#

Price
100g

Price
1kg

Price
10kg

CMS-221

20-25

EO

OH

125-150

4,000

1.00

1.419

68937-54-2¥8,800¥53,000-

CMS-222
DBP-C22

20
45-55

PO
PO

OH
OH

150-200
200-300

5500-6500
2500-3200

0.98
0.99

1.411
1.434

68957-00-6
161755-53-9¥14,100¥15,600¥69,000¥80,000¥400,000

DBP-534

55

EO/PO (60/40) OH

4,000

30,000

0.98

1.414

68937-55-3¥8,200¥34,000¥235,000

CMS-832*

50-60

EO

OH

1000-2000

2000-5000

1.09

1.505

200443-93-2¥16,200¥95,000-

DBE-C25

60

EO

OH

400-450

3500-4500

1.07

1.450

68937-54-2¥11,100¥53,000

CMS-626

65

EO

OH

550-650

4500-5500

1.09

1.458

68937-54-2¥13,800¥68,000¥354,000*(Hydroxypolyethyleneoxypropyl)methylsiloxane-(3,4-Dimethoxyphenylpropyl)methylsiloxane-Dimethylsiloxane terpolymer

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479

Polar Silicones

Polar Silicones

silicones are hydrophilic and have compatibility with mostconventional silicones. Cyanoalkylsilicones have even lesstendency to swell substrates than fluorosilicones and, in thin films,
facilitate ion transport. Fluorosilicones are the most common
polar silicones, but are usually considered as a class by themselves.

O
OF

Polar silicones are utilized in specialty applications wherereadily swellable materials such as soft rubber have poor
dimensional stability in contact with other lubricants. Pyrrolidone
functional silicones are the most hydrophilic silicones that are
not derived from polyethylene glycols (PEGs). Furan functional(N-Pyrrolidonepropyl)Methylsiloxane - Dimethylsiloxane Copolymers
Product CodeYAD-122
YBD-125

Pyrrolidone Substitution

dimethylaminopropylcarboxamide
carboxylate

ViscositycSt.

Specific Water Refractive
Gravity Solubility Index

150-300
400-600

0.96
0.98

-

Price
100g

CAS#

1.406
1.405

179005-02-8
179005-03-9

Price
1kg

¥34,700 ¥212,000¥19,900 ¥121,000

Tetrahydrofurfuryloxypropylmethylsiloxane

Mole % Tetrahydrofurfuryloxypropylmethylsiloxane

ViscositycSt.

Specific
Gravity

DCF-405

100

5

0.93

PR

Product Code

Water
Refractive
Solubility
Index

-

SurfaceTension

1.426

23.8

Price
100g

CAS#

Price
1kg

1361237-41-3 ¥21,200 ¥132,000

CyanopropylMethylsiloxane

Product Code Mole % Cyanopropylmethylsiloxane

ViscositycSt.

Specific Water Refractive
Index
Gravity Solubility

YMS-T31800-1400

1.07

100

Amphiphilic Silicones

Silicone fluids which are both hydrophilic and olephilic are
said to be amphiphilic. This is in distinction to the more generaldefinition that considers an amphiphile to be a material which isboth hydrophilic and hydrophobic. Amphiphilic silicones have theability to form stable water-in-oil emulsions allowing formulationof a wide range of gels and creams. They are also useful as surface
treatments for dispersion of polar particles in hydrocarbon media.

Amphiphilic Silicones

DodecylMethylsiloxane-HydroxypolyalkyleneoxypropylMethylsiloxane Copolymer
Product CodeViscositycSt.

Molecular
WeightABP-263
1000-4000
1800-2000
contains 15-20% isostearyl alcohol
480

Price
100g

¥24,400 ¥148,800

67762-86-1

1.459

-

Price
10g

CAS#

CAS: [145686-74-4]

Mole % HydroxypolyalkyleneoxypropylMethylsiloxane

Active%Specific
Gravity

Price
100g

Price
1kg

30-40

80-85

0.85

¥15,600¥92,000

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Enabling Your Technology

Low Temperature Fluids
Comparative Low Temperature Properties
Description

Viscosity
25° C, cSt.

Viscosity
0° C, cSt.

Viscosity-20° C, cSt.

Viscosity-40° C, cSt.

Viscosity-80° C, cSt.

DMS-T15
DES-T11
DES-T15
FMS-123

PolyDiMethylsiloxane
PolyDiEthylsiloxane
PolyDiEthylsiloxane
Fluorosilicone

50
10
50
300

60
17
69
5,500

108
30
143
10,500205
70
340
20,000frozenfluid
fluid
frozenMTT-1015
SIM6559.0
SIM6577.0
SIP6827.0
SAE10

Methyl-T-Branched PDMS
MethylTriHexylSilane
MethylTriOctylSilane
PhenylTris(trimethylsiloxy)silane

50
6
19
4

90
19
62
6.5

180
48
200
12

380
150
frozen
20

fluid
fluid
frozenfrozenPetroleum Oil

100

500

11,000235,000

frozenO
OF

Product CodePolyDiEthylsiloxanes

Polydiethylsiloxanes offer improved metal-metal lubricationand low temperature properties when compared to polydimethylsiloxanes. They are oxidatively stable to 150°C and thermallystable under inert atmospheres to 225°C.

PolyDiethylsiloxanes, Triethylsiloxy terminated CAS:[63148-61-8]
Product CodeViscosity
cSt.

Pour
Point,°C

ThermalConductivity, W/m°C

Density

Refractive
Index

Flashpoint°C

Molecular
Weight

Price
100g

Price
1kg

DES-T02
DES-T03
DES-T11
DES-T12
DES-T15
DES-T23

2
3-5
7-12
15-20
40-50
200-400

-115
-115
-110
-110
-110
-96

0.133
0.138
0.142
0.157

0.844
0.844
0.913
0.93
0.958
0.991

1.434
1.436
1.439
1.439
1.442
1.447

76
80
110
125
170
256

245
275-325350-400
400-500
500-800
1300-2000¥15,600¥16,200¥16,200¥22,000¥11,400¥13,500¥79,000¥83,000¥83,000¥118,000¥61,000¥66,000

PR

Other Properties: Glass Transition Temperature: -139°C
Specific Heat, 20-100°: 0.40-0.47 cal/mole°C
Surface Tension: 25-28 dynes/cm Viscosity Temperature Coefficient: 0.77 Volume Resistivity: 1013-1014 ohm-cm@20°C

Silahydrocarbons

Silahydrocarbons are low molecular weight fluids that havea remarkable ability to provide excellent lubrication and liquidbehavior at low temperatures. Low viscosity and hydrocarbon
compatability allows use of these material as internal lubricants
in ink-jet and microfluidic applications.
Silahydrocarbons
Product Code

Name

CAS

Viscocity, cSt. Density

SIM6559.0

Methyltri-n-Hexylsilane[3429-60-5]

SIM6577.0
SIT7082.0

Methyltri-n-Octylsilane*
Tetra-n-Butylsilane[3510-72-3][994-79-6]

m.p.

b.p.

Refractive Index flashpoint °C Price/100g

60.81 <-80°

255°

1.445

>

19
10

0.81 <-31°
0.80 -56°

380°
230°

1.452
1.447

>

*4-ball wear (440C SS), 23°: 0.03-0.04 x 10 x mm /mm @100 rpm, 200N in vacuum
-9

110°

¥45,900

110°
75°¥35,300¥72,400

3

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481

Branched Fluids
Branched and low viscosity silicone fluids offer properties that are significantly different than higher molecular weight versions
since chain entanglements are limited and end-groups have influence on properties. Apart from the obvious mechanical advantage ofthe low viscosity in many applications, they offer higher purity levels, discrete vapor pressures and more linear rheology as a functionof pressure and temperature.
T-structure Siloxanes Organosilsesquioxanes, Trimethylsilyl Terminated Tris(Trimethylsiloxy)Silanes

Branched Fluids
Product CodeViscosity
cSt.

Pour
Point,°C

Viscosity Temp.
Coefficient

Density

1.388

64

Price
100g

Price
1kg

Price
10kg

CAS: [17928-28-8]¥8,500¥40,900 ¥279,000
CAS: [68037-74-1]
1650¥11,400¥60,000 ¥371,000[R&D only] CAS: [187592-85-4]
409¥11,100¥37,000 ¥353,000[R&D only] CAS: [187593-69-7]
1080¥9,000¥39,100 ¥268,000
1000¥11,400¥60,000
CAS: [2116-84-9]
373¥8,800¥38,800 ¥265,000
CAS: [73559-47-4]
500-700¥8,800¥37,500 ¥257,000
700-900¥9,000¥39,100
900-1200¥11,100¥51,500[R&D only] CAS: [211935-21-6]
401¥31,000
CAS: [68857-05-1]
1600-3000¥12,700¥70,100 ¥410,000
311

O
O
F

Methyltris(trimethylsiloxy)silane
SIM6592.0
1.6
-74
0.85
Methyl-T-Branched PolyDimethylsiloxane
MTT-1015
50-80
-85
0.57
0.97
Octyltris(trimethylsiloxy)silane
SIO6715.7
4-5
<-76
0.86
Octyl-T-Branched Polysilsesquioxane, Trimethylsilyl terminated
OTT-1012
15-30
<-76
0.91
OTT-1023
200-400<-40
0.95
Phenyltris(trimethylsiloxy)silane
SIP6827.0
4
<-60
0.55
0.92
Phenyl-T-Branched Polysilsequioxane, Trimethylsilyl terminatedPTT-1012
15-25
<-60
0.98
PTT-1022
150-300
1.01
PTT-1025
400-600
1.05
Phenethyltris(trimethylsiloxy)silane
SIP6722.8
4
-55
0.68
0.93
Tetrachlorophenyl-T-Branched PolyDimethylsiloxane
PTT-1117
70-75
-73
0.68
1.05

Refractive Flashpoint Molecular
Index°C
Weight

1.403

285

1.411

106

1.428
1.444

>110
>110

1.437

127

1.460
1.481
1.489

>125
>125
>125

1.440

135

1.428

300

Low Temperature Silicate Ester Fluids

PR

Silicate esters are dielectric fluids with thermal stability and low temperature
properties that meet the requirements of airborne electronic equipment. These
fluids are often used in low temperature aerospace hydraulics or as performance
additive to synthetic hydrocarbons. Successful long term application of thefluids requires sealed systems to prevent moisture absorption.
Product Code Name

Viscosity, cSt. Density

SIT7283.0 Tetrakis(2-ethylhexoxy)silane
-50°C

0°C

50°C

100°C

KINEMATIC VISCOSITY, CENTISTOKES

100
50
30
20
10

SIT7283.0

3.0
2.0

1.50
1.00
0.90
0.80
0.70

0.60
-100°F -65°F

0°F

100°F

200°F

b.p.

Refractive
Index flashpoint °C

0.88 <-78° 198°/1mm 1.4388

188°

300°F

400°F

500°F

Other Properties:
viscosity, 38°: 6.89 cSt;
viscosity, -40°: 310 cSt;
vapor pressure, 25°: <0.1mm
Hvap: 169 kcal/mole
coefficient of thermal expansion: 0.88 x 10-3
volume resistivity: 1x10-11 ohm-cm
dielectric constant: 2.46
surface tension: 26.7 dynes/cm
specific heat: 0.48 cal/g/°
autoignition temp.: 304°

TEMPERATURE

482

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CAS

Price/100g[115-82-2] ¥11,900

150°C 200°C 250°C

3,000
1,000
500

5.0

10

m.p.

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Enabling Your Technology

Volatile, Low
Temperature Fluids
Disiloxanes
Disiloxane fluids are utilized as vehicles and solvents where purity, low temperature or
dielectric properties are critical factors. Since they are pure chemicals, rather than polymers,
viscosities and other properties have virtually no variation.
Viscosity,cSt.
Density

Product Code Namem.p.

b.p. / mm-67°

99-100°Refractive
Index flashpoint °C

CAS

Price/100g

SIH6115.0

Hexamethyldisiloxane

SID3418.0

1,3-Diethyltetramethyldisiloxane

1

0.797

-120°

155-6°

1.401

30°[R&D only]¥61,800

SIH6070.0

Hexaethyldisiloxane

2.35

0.844

-115°

231°

1.434

76°

999-49-0¥23,300

SID4406.0

1,3-Dioctyltetramethyldisiloxane

4.11

0.891

-36°

122-5°/0.2 1.474>110°[R&D only]¥30,800

SID4588.0

1,3-Diphenyltetramethyldisiloxane

3.45

0.976

-89°

155-8°/13

1.518

156°

56-33-7¥46,200

SIB1828.5

1,3-Bis(trifluoropropyl)tetramethyldisiloxane

21.085 -88 to -90

75°/101.363-[R&D only]¥75,100

0.764

1.377

-1°

107-46-0¥4,400OOF

SIB1709.0

0.65

Bis(nonafluorohexyl)tetramethyldisiloxane

3.6

1.331

-89°

150°/45

1.340

156°

122179-35

25g/¥22,500¥92,600

SIB1816.0

1,3-Bis(tridecafluorooctyl)tetramethyldisiloxane

6-71.460 -40 to -45

81-2°/11

1.337

>150°

[R&D only]

SIB1120.0

1,3-Bis(heptadecafluoro-1,1,2,2tetrahydrodecyl)tetramethyldisiloxane

7-10

1.51

-5 to 0>90°/5

1.335

>110°

[R&D only] 10g/¥53,800

SIB1055.0

1,3-Bis(chloromethyl)tetramethyldisiloxane

2

1.05

-90°

204-5°

1.440

73°

2362-10-9¥31,000

SIB1735.0

Bis(pentamethyldisiloxanyl)ethane

2.7

0.82

-52°

254-5°

1.410

92°[R&D only]¥34,500

Trisiloxane Fluids

PR

Trisiloxane fluids are low viscosity materials that have unique wetting, surfactant andsolubility characteristics. Their unusual characteristics are derived from having a small“cloud” of silicone hydrophobic groups from which other functionalities extend. While they
are considered polymeric fluids, their stuctures are extremely well-defined in chemical terms
since they are low molecular weight species. This table identifies the common trisiloxane fluids.
Further details are found in Gelest Silicon Compounds literature.
Trisiloxanes

Product Code Name

Refractive
Index flashpoint °C

Viscosity, cSt.

Densitym.p.

b.p. / mm

1

0.82

<-60°

172°

1.394

45°

CAS

Price/100g

SIE4895.0

3-Ethylheptamethyltrisiloxane

SID4627.6

3-Dodecylheptamethyltrisiloxane

5

0.83

-14°

180°/0.3

1.422>120° [R&D only]

SIO6622.0
SIO6711.5

3-Octadecylheptamethyltrisiloxane
3-Octylheptamethyltrisiloxane

13
3

0.82
0.82

-62°

84°/0.3

1.433
1.413

>120° [R&D only] ¥26,300
69° [17955-88-3] ¥21,500

SIP6736.2

3-Phenylheptamethyltrisiloxane

2

0.91

-56°

95°/5

1.447

64°

[R&D only]¥43,200¥50,900[17861-60-8] ¥11,100¥24,700

Substituted Trisiloxanes
SIT8365.0(Trifluoropropyl)heptamethyltrisiloxane

2

0.93

<-78°

66-8°/10

1.375

69°

[R&D only]

SIA0075.0

2-(Acetoxypolyethyleneoxypropyl)heptamethyltrisiloxane(Chloromethyl)heptamethyltrisiloxane

30

1.03

-

-

1.446

79°

[12597-17-3] ¥22,500

1

0.92

-85°

185-6°

1.406

>65°

[R&D only]

SIC2289.5

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www.gelest.com¥50,100

483

SiBrid® Inert SiliconesO
O
F

SiBrid® inert silicones are hybrid organic-inorganic liquid polymers that combine, on a molecular level, structural features associatedwith conventional organic polymers and silicones. SiBrid® silicones offer the wide range of thermal performance, surface properties
associated with silicones, but with compatibility and solubility with organic systems, particularly organic polymers. They can introduce
release properties into coating and cosmetic formulations. They behave as internal lubricants and impact modifiers for thermoplastics.

Naturally Derived Silicones
Product CodeDescription

PR

MCR-NA07 MonoAnisyl terminated Polydimethylsiloxane
MCR-NL07 MonoLimonenyl terminated Polydimethylsiloxane
DMS-NL04 Limonenyltrisiloxane

Viscosity

CAS

Specific
Gravity

7-8
7-8
4-5

1283601-14-8
1283601-16-0
1263044-00-3

0.940
0.920
0.880

Refractive Molecular
Index
Weight Price/100g

1.430
1.424
1.426

650-850
650-850358¥39,300¥36,900¥39,300

Solubility Panel

484

Product

DMA-131

DCE-7521

D5PDMS, 10cSt
Stearyl Methicone
Hydrogenated Polydecene
10% Microcrystalline wax
Ceresin
Octyldodecyl Stearate
Triisostearyl Citrate
Ethylhexyl Palmitate
OctyldodecanolCastor Oil

S (hot)S (hot)
S
S
S
S
S
S
S
S
I

S
S
S
S
I
I
S (hot)S
S
I
I

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MCR-NA07 MCR-NL07

S
S
S
S
I
I
S
S
S
S
I

S
S
S
S
I
I
S
S
S
S
S

(215) 547-1015

DMS-NL04

S
S
S
S
I
I
S
S
S
S
I
S = Soluble

PDMS

S
S
S
S
I
I
I
I
S
I
I
I = Insoluble

www.gelest.com

Price/1kg¥199,000¥196,400¥196,000

Enabling Your Technology

SiBrid® Inert Silicones

O
O
F

Ethylene Siloxane Copolymers are used as additives to compatibilize or stabilize mixed silicone organic formulations. Incorporation
at low levels, typically 1-3%, helps stabilize silicone-organic mixtures that have a tendency to phase separate during storage. Silethylphenylene containing copolymers offer increased thermostability and higher refractive index.

Ethylene - Dimethylsiloxane copolymers
Product Code

7-10
25-25
80-120**[26710-23-6]

Mole %
SiloxaneSpecific
Gravity

Refractive
Index

Molecular
WeightPrice/100g

Price/1kg

66-70
66-70
75-76

0.87
0.89
0.92

1.426
1.433
1.431

450-650
750-1000>2000¥16,200¥16,200¥15,400¥83,000¥83,000¥78,000

PR

DCE-7007*
DCE-7012*
DCE-7521***[1035218-85-9];

Viscosity

Silethylphenylene - Dimethylsiloxane copolymers
Product CodeViscosity

Mole %
SiloxaneSpecific
Gravity

Refractive
Index

Molecular
WeightPrice/100g

Price/1kg

DCS-8024

350-600

78-82

0.98

1.444

5000-6000¥24,100¥130,000

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485

2n

2n

CH3 n CH3

CH3

p33

O

CF3

CF3

CH2

CH2

CH2OCC CH2CH2 CH3
CF3
CH2CH

CH3CH2CH2CH2 Si O

Si O

Si

CF3

Si CH2CH2CH2CH3

CH2

2

MFS-M15
Thermoplastic
for MeltCHProcessingor Solution
Casting
CH2
CH2
CH2 Resins
2
CH3

O

Si

O

CH3 n CH3
CH3
OCH 3
O

CH3

CH3

Si O

Si CH2CH2CH2

O

C

p39

n CH3
SSP-080

CH3C

O

CH3 m CH3

O
n p

CH3

p52

SSP-080(DIMETHYLSILOXANE)(BISPHENOL -A CARBONATE) copolymer(15 - 20% polydimethylsiloxane)
thermoplastic; tensile strength: 50MPa[202483-49-6] TSCA HMIS: 1-1-0-X

N

O

N

O

O

CH 3

N

O

density: 1.19
100g / ¥35,300

O
O
F

O

Vicat mp: 145°

CH 3

O

O

CH 3

N

CH 2CH 2CH 2 Si O Si O Si CH 2CH 2CH 2 N
CH 3

OCH 3 n CH 3

O

O

O

SSP-085(DIMETHYLSILOXANE)(ETHERIMIDE) copolymer(35-40% polydimethylsiloxane)phenylenediaminepolyetherimide
thermoplastic; tensile strength: 2800psi
Tg: 168°C[99904-16-2] TSCA HMIS: 1-1-0-X

density: 1.18
100g / ¥35,300

CH3

SSP-070
POLY(TRIMETHYLSILYL)PROPYNE

C

forms viscous 5% solutions in toluene/tetrahydrofuranhigh oxygen permeability1; PO2/PN2 = 1.7
1. Masuda, T.; et al, J. Am. Chem. Soc., 1983, 105, 7473.
[87842-32-8] HMIS: 1-1-0-X

SiMe 3PR

10g / ¥53,800

CH3Pre-Ceramic Polymers

Si

PSS-1M01
Poly(DIMETHYLSILANE)

employed in CVD of SiC films.1
1. Scarlete, M., et al; US Patent 7,396,563; 2008 (Label Licensed Gelest Product)[30107-46-8] / [28883-63-8] TSCA HMIS: 1-1-0-X

CH3 n
100g / ¥33,900

OO B O Si O

SSP-040
POLY(BORODIPHENYLSILOXANE) solid, Tg: 95-100°, Tm: 140-1°
employed in preparation of ceramic fibers.1
1. Yajima, S.; et al, Nature, 1977, 266, 521.
[70914-15-7] TSCA HMIS: 2-0-0-X

486

www.AZmax.co.jp TEL: 03-5543-1630

C

25g / ¥22,500

Gelest, Inc.

100g / ¥65,500(215) 547-1015

www.gelest.com

OEnabling Your Technology

Silicone Fluids for Optical Applications

Product CodeViscosity(cSt)@25°

1.335
1.336
1.340
1.375
1.382
1.387
1.400
1.402
1.403
1.413
1.414
1.422
1.428
1.436
1.439
1.445
1.452
1.462
1.480
1.490
1.493
1.500
1.501
1.507
1.520
1.533
1.543
1.556
1.588

7-10
6-7
3.6
6000
80-12080-120
20
100
200
3
400
100
70-5
100-12515-20
600-1000
40-50
1200-1600
1000
150-250
1500-2000
125
15
500
100-200500
300-600
35-40
170-175

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Gelest, Inc.

SIB1120.0
SIB1816.0
SIB1709.0
FMS-736
FMS-121
FMS-221
DMS-T12
DMS-T21
DMS-T22
SIO6711.5
DBE-224
PDM-0421
PTT-1117
PDM-0821
DES-T12
ALT-143
DBE-814
APT-213
APT-133
PDM-1922
APT-233
PMM-5021
SIT8662.0
PMM-6025
PMM-0021
PMM-0025
PMP-5025
PDM-7040
PDM-7050

Price/25g

Price/100g

OOF

Refractive
Index@25°
589.3nmPR

Gelest offers pure silicone fluids (not blends) with a wide range of refractive indices. Listed below are fluids with refractive indicesand viscosities. Fluids with the same product code prefix can be blended to exact refractive index requirements.

10g ¥53,800¥30,800¥22,500¥18,600¥14,100¥7,200¥9,000¥25,200(215) 547-1015

www.gelest.com¥52,500¥37,900¥14,900¥6,400¥6,400¥6,400¥21,500¥8,200¥7,400¥12,700¥6,900¥22,000¥7,400¥10,100¥9,000¥9,000¥9,800¥8,200¥9,500¥9,300¥26,300¥9,500¥37,900¥14,600¥18,600487

Appendix 1 – Viscosity Conversion Chart
1
10
20
40
60
80
100
200
300
400
500
1,000
2,000
3,000
4,000
5,000
6,000
7,000
8,000
9,000
10,00015,00020,00030,00040,00050,00060,00070,00080,00090,000100,000
125,000
150,000
175,000
200,000

Poise

.01
.10
.20
.40
.60
.80
1.0
2.0
3.0
4.0
5.0
10.0
20.0
30.0
40.0
50.0
60.0
70.0
80.0
90.0
100
150
200
300
400
500
600
700
800
900
1,000
1,250
1,500
1,750
2,000

SSU

.31
60
100
210
320
430
530
1,000
1,475
1,950
2,480
4,600
9,400
14,50018,50023,50028,00032,50037,00041,00046,50069,40092,500138,600
185,600
231,000
277,500
323,500
370,500
415,500
462,000
578,000
694,000
810,000
925,000

Zahn
#1

Zahn
#2

30
37
52
68
81

16
18
22
27
34
41
82

Zahn
#3

12
28
34
46
58

Zahn
#4

10
17
24
30
38
69

Zahn
#5

Ford
#3
9
12
25
33
41
50
90
130
170
218
390
800
1,230
1,570

10
15
20
25
49

Ford
#4

Krebs
Units

5
10
18
25
31
34
58
74
112`
143
264
540
833
1,060
1,350
1,605
1,870
2,120
2,360
2,670

33
37
40
52
60
64
68
85
103
121
133

SAE

LiquidExample
Water

10
20

olive oil

30
40
90

glycerine
castor oil
molassescorn syrupO
O
F

Centistokes

honeysour creammolasses*peanut butter

viscosities at 25°C unless otherwise stated*measured at 2°C (a cold winter day)

Note: The precision of conversion in this table is limited by two factors. It assumes that the density of liquids is 1 so that stokes and poises are
the same and that viscosity is independent of shear rate, i.e., the fluid is Newtonian. To correct for density inconverting
fromInc.
centistokes to   Gelest,
centipoises, multiply specific gravity by centistokes.
10
9
8
7
6
5
4.5
4
3.5
3

100000Blending Silicone
Fluids Fluids
Appendix 2 – Blending
Silicone

30000

2.5
2
1.5
10
9
8
7
6
5
4.5
4
3.5
3
2.5
2

10000

Viscosity Centistokes

PR

Any standard viscosity grade of polydimethylsiloxane can be
blended together with another viscosity grade of the same
fluid to produce an intermediate viscosity. This chart provides
a means for determining the proper blend ratio. The chart
should be used as follows:
Decide upon the viscosity grades to be blended. For highaccuracy, measure the actual viscosity of the blending
fluids.
Locate the lower viscosity on the left hand scale.
Locate the higher viscosity on the right hand scale.
Connect these two points with a straight line.
Locate the point where the line indicating the desired
blend viscosity intersects the constructed line. From thispoint, follow down to the horizontal scale to read thepercent of the higher viscosity fluid to use in the blend.
This method is reasonably accurate in predicting blend viscosity when the two fluids differ in viscosity by no more than
one magnitude (one power of ten). When fluids covering awider range are blended, the chart will only approximate thefinished viscosity. To achieve a viscosity of 800 cSt. as shownin the example, 68% of 1000 cSt. and 32% of 500 cSt. fluids
are blended.

60000

5000

2000

1.5
1000

10
9
8
7
6
5
4.5
4
3.5
3
2.5

500
350

2

200

1.5

The calculation basis for blending is:log =A log1 + B log2
A+B

100

10

20

30

40

50

60

70

80

90

Percent of Higher Viscosity Fluid

REACTIVE SILICONES:FORGING NEW POLYMER LINKSOOFREACTIVE SILICONES

MATERIALS FOR:PR

Adhesives
Binders
Ceramic Coatings
Dielectric Coatings
Encapsulants
Gels
Membranes
Optical Coatings
Photolithography
Polymer Synthesis
Sealants

Enabling your technology

Functional Silicone Reactivity Guide

p. 492

Class

Reactivity/Product Class

Vinyl

peroxide activated cure(heat cured rubber)
vinyl addition (platinum cure)

Hydridedehydrogenative coupling (metal salt cure)(foamed silicones, water repellent coatings)

p.507

Silanolmoisture cure 1-part RTVs

O
O
F

p. 502condensation cure 2-part RTVs

p. 534

Alkoxy/Polymeric Alkoxide

p. 511Amine

sol-gel (ceramics, ormosil)
polyureas, polyimides
epoxy addition

p. 515

Epoxy

cationic UV
polyesterCarbinolp. 521

Methacrylate/Acrylate

radical (including UV) curep. 524

Mercapto

thiol-ene UV curethermal curep. 525Acetoxy/Chlorine/Dimethylaminemoisture curep. 534

Polymeric Alkoxide

silicon dioxide

p. 537

Silsesquioxanes

silicon dioxide

p. 541Polysilazanes

silicon nitride

p. 541Polysilanes

silicon carbidePR

p. 518490

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Enabling Your Technology

CONTENTS

Reactivity Guide for Silicone Fluids .....................................................................................................................page 490
Vinyl Functional Fluids..........................................................................................................................................page 492
Hydride Functional Fluids .....................................................................................................................................page 502
Silanol Functional Fluids .......................................................................................................................................page 507

O
O
F

Amine Functional Fluids .......................................................................................................................................page 511
Epoxy Functional Fluids ........................................................................................................................................page 515
Carbinol (Hydroxyalkyl) Functional Fluids ........................................................................................................page 518
Methacrylate/Acrylate Functional Fluids ............................................................................................................page 521
Selected Functional Fluids (non-hydrolyzeable)(Isocyanate, Carboxylate, Anhydride, Mercapto, Chloroalkyl) ..................................................................page 523
Selected Functional Fluids (hydrolyzeable)(Chlorine, Acetoxy, Dimethylamine, Alkoxy) ..............................................................................................page 525
Mono-disperse Reactive Silicones ........................................................................................................................page 526
Macromers and Monofunctional Terminated Fluids ........................................................................................page 527
Emulsions and Water-borne Reactive Fluids .....................................................................................................page 533
Polymeric Alkoxides ...............................................................................................................................................page 534
Silsesquioxanes ........................................................................................................................................................page 537

PR

PolySilazanes and PolySilanes ...............................................................................................................................page 541
Sibrid® Silicone - Organic Hybrids ........................................................................................................................page 540

Specialty Silicon Containing Polymers ................................................................................................................page 544
Vinyl Addition Cure (Catalysts, Inhibitors, Adhesion Promoters) ................................................................page 545
Condensation Cure (Crosslinkers, Catalysts) .....................................................................................................page 547
Activated Cure (Peroxides) ...................................................................................................................................page 549
Pigments, Reinforcements, Fillers .......................................................................................................................page 550
Polymerization Catalysts .......................................................................................................................................page 551
Product Code Definition........................................................................................................................................page 552

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491

Si

CH CH 2

Vinyl Functional Polymers
The reactivity of vinyl functional polymers is utilized in two major regimes.1 Vinyl terminated polymers are employed inaddition cure systems. The bond forming chemistry is the platinum catalyzed hydrosilylation reaction which proceeds according to
the following equation:

O

CH 3

CH Si

O

O

Pt

CH 3

O Si CH 2CH 2 Si

O

O
O
F

O Si H + H2C

CH 3
CH 3

CH 3

CH 3

Vinylmethylsiloxane copolymers and vinyl T-structure fluids are mostly employed in peroxide activated cure systems, which involve
peroxide-induced free radical coupling between vinyl and methyl groups. Concomitant and subsequent reactions take place among
methyl groups and between crosslink sites and methyl groups. The initial crosslinking reaction is depicted in the following equation:O

O Si CH 3
CH 3

+ H2C

O

CH Si O
CH 3

RO•
-ROH

O

O Si

O
•
CHCH 2CH 2Si O

CH 3

CH 3

Addition Cure (Platinum Cure)

PR

Addition cure chemistry provides an extremely flexible basis for formulating silicone elastomers. An important feature of thecure system is that no byproducts are formed, allowing fabrication of parts with good dimensional stability. Cures below 50°C, Room
Temperature Vulcanizing (RTV), cures between 50° and 130°C, Low Temperature Vulcanizing (LTV), and cures above 130°C, High
Temperature Vulcanizing (HTV), are all readily achieved by addition cure. The rheology of the systems can also be varied widely,
ranging from dip-cures to liquid injection molding (LIM) and conventional heat-cure rubber (HCR) processing. Vinyl-terminatedpolydimethylsiloxanes with viscosities greater than 200 cSt generally have less than 2% volatiles and form the base polymers for thesesystems. More typically, base polymers range from 1000 to 60,000 cSt. The crosslinking polymer is generally a methylhydrosiloxanedimethylsiloxane copolymer with 15-50 mole % methylhydrosiloxane. The catalyst is usually a complex of platinum in alcohol, xylene,
divinylsiloxanes or cyclic vinylsiloxanes. The system is usually prepared in two parts. By convention, the A part typically contains thevinyl-containing silicone and the platinum catalyst at a level of 5-10ppm, and the B part usually contains the hydride functional siloxane.
Formulation of addition cure silicones must address the following issues:

Strength- Unfilled silicones have extremely poor mechanical properties and will literally crumble under pressure from a fingernail.
The most effective reinforcing filler is hexamethyldisilazane treated fumed silica. Alternatively, if clarity must be maintained, vinyl “Q”
reinforcing resins are employed.
1

Arkles, B., CHEMTECH, 1983, 13, 542.

Platinum Catalysts- see p. 545

Addition Cure Modifiers- see p. 546

492

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Enabling Your Technology

Hardness- Higher crosslink density provides higher durometer elastomers. Gels are weakly crosslinked systems and even contain
substantial quantities of “free” fluids. In principal, molar equivalents of hydrides react with vinyls. See the section on hydride functional
fluids for further information. Also, polymers with vinyl pendant on the chain rather than at chain ends are utilized to modify hardness
and compression set.
Consistency- The viscosity of the base polymer and a variety of low surface area fillers ranging from calcium carbonate toprecipitated silica are used to control the flow characteristics of silicone elastomers.

O
O
F

Temperature of Cure- Selection of platinum catalysts generally controls the preferred temperature of cure.1 Platinum invinyldisiloxanes is usually used in room temperature cures. Platinum in cyclic vinylsiloxanes is usually used in high temperature cures.
See the Platinum listings in the catalyst section.(p. 493)
Work Time (Speed of Cure)- Apart from temperature, moderators (sometimes called retarders) and inhibitors are used tocontrol work time. Moderators slow, but do not stop platinum catalysts. A typical moderator is tetravinyltetramethylcyclotetrasiloxane.
Inhibitors stop or “shut-down” platinum catalysts and therefore are fugitive, i.e volatile or decomposed by heat or light (UV). Acetylenic
alcohols such as methylisobutynol are volatile inhibitors. Patent literature shows that t-butylhydroperoxide is an effective inhibitor thatbreaks down at temperatures above 130°.
Low Temperature Properties, Optical Properties- The introduction of vinyl polymers with phenyl groups alters physicalproperties of elastomers. At levels of 3-4 mole %, phenyl groups improve low temperature properties. At higher levels, they are used
to alter refractive index of elastomers, ranging from matching fillers for transparency to optical fiber applications. Unfortunately,
increased phenyl substitution lowers mechanical properties of elastomers.
Shelf Life- A fully compounded elastomer is a complex system. Shelf-life can be affected by moisture, differential adsorption ofreactive components by fillers and inhibitory effects of trace impurities. Empirical adjustments of catalyst and hydride levels are madeto compensate for these effects.
Compounding- All but the lowest consistency elastomers are typically compounded in sigma-blade mixers, planetary mixers,
two-roll mills or, for large scale production, twin-screw extruders.

Quick Start Formulation Transfer and Impression Molding Elastomer

This low strength formulation is useful as a reproductive molding compound. It is presented here because it can be preparedwithout special equipment and is an instructive starting point for addition cure silicone elastomers.
1000 cSt vinyl-terminated polydimethylsiloxane

PR

DMS-V31

100 parts

SIS6962.0

hexamethyldisilazane treated silica

50 parts

HMS-301

methylhydrosiloxane-dimethylsiloxane copolymer

3-4 parts

SIP6830.3

platinum complex solution

150-200ppm

In small portions, work the DMS-V31 into the silica with a spatula. After a uniform dispersion is produced, work in the HMS-301.
The blend may be stored in this form. Just prior to use add the platinum solution with an eyedropper and work it in rapidly. Working
time is 5-10 minutes. The rate of cure can be retarded by adding tetravinyltetramethylcyclotetrasiloxane (SIT7900.0).
1

Lewis, L. et al. J. Mol. Cat. A: Chem. 1996, 104, 293.; Lewis, L. et al. J. Inorg. Organomet. Polym. 1996, 6, 123.

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Peroxide Activated CureO
OF

Activated cure silicone elastomers are processed by methods consistent with conventional rubbers. These silicone products are referred
to as HCRs (heat cured rubbers). The base stocks are high molecular weight linear polydiorganosiloxanes that can be converted from a highly
viscous plastic state into a predominantly elastic state by crosslinking. Vinylmethylsiloxane-dimethylsiloxane copolymers of extremely highmolecular weights are the typical base stocks for activated cure silicone elastomers. The base stocks are commonly referred to as gums. Gums
typically have molecular weights from 500,000 to 900,000 with viscosities exceeding 2,000,000 cSt. Free radical coupling (cure) of vinyl andmethyl groups is usually initiated by peroxides at process temperatures of 140°-160°. Generally, peroxide loading is 0.2-1.0%. Following thecure, a post-cure at 25-30° higher temperature removes volatile peroxide decomposition products and stabilizes polymer properties. The
most widely used peroxides include dibenzoylperoxide (often as a 50% concentrate in silicone oil), dicumylperoxide (often 40% on calcium
carbonate), 2,5-dimethyl-2,5-di-t-butylperoxyhexane and bis(dichlorobenzoyl)peroxide1. The last peroxide is particularly recommended foraromatic-containing siloxanes. Terpolymer gums containing low levels of phenyl are used in low temperature applications. At increased phenyl
concentrations, they are used in high temperature and radiation resistant applications and are typically compounded with stabilizing fillers
such as iron oxide. Phenyl groups reduce cross-linking efficiency of peroxide systems and result in rubbers with lower elasticity. Fluorosilicone
materials offer solvent resistance. Lower molecular weight vinylsiloxanes are frequently added to modify processability of base stocks.
While the use of peroxide activated cure chemistry for vinylmethylsiloxanes is well established for gum rubber stocks, its to use is
growing in new applications that are comparable to some peroxide cure acrylic systems. Relatively low viscosity vinylmethylsiloxanes
and vinyl T-fluids are employed as grafting additives to EPDM elastomers in the wire and cable industry to improve electrical properties.
They also form reactive internal lubricants for vulcanizeable rubber formulations. At low levels they are copolymerized with vinyl
monomers to form surfactants for organosols.
1

Lynch, W., “Handbook of Silicone Rubber Fabrication”, Van Nostrand Reichold, 1978.

PR

Peroxide Catalysts- see p. 549

494

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CH 3

CH 3

CH 3

CH 3 nCH 3

O Si

Vinyl Terminated PolyDimethylsiloxanes
CodeViscosity

DMS-V21
DMS-V22
DMS-V25

Molecular
Weight Wgt % Vinyl Vinyl - Eq/kg

Density

Price/100g

0.33-0.37
0.21-0.24
0.11-0.13

0.97
0.97
0.97

0.18-0.26
0.12-0.15
0.10-0.13

0.07-0.10
0.05-0.06
0.04-0.05

0.08-0.12
0.07-0.09
0.04-0.06

0.03-0.04
0.025-0.030
0.018-0.020-¥10,400¥8,100¥9,000¥55,400¥48,000¥50,700¥138,000¥122,000¥128,000

0.97
0.97
0.97

¥7,800¥9,000¥7,800¥44,300¥50,700¥44,300¥114,000¥128,000¥114,000

0.97
0.98
0.98

¥9,000¥10,400¥10,400¥50,700¥55,400¥55,400¥128,000¥138,000¥138,000DMS-V51
100,000
140,000
0.03-0.05
0.016-0.018
0.98
DMS-V52
165,000
155,000
0.03-0.04
0.013-0.016
0.98
These materials are most often employed in 2-part addition cure silicone elastomers.

¥11,900¥11,900¥64,500¥64,500¥174,000¥174,000DMS-V41
DMS-V42
DMS-V46

186
500
800

29
10-12
7-9

10.9
3.6-4.3
2.4-2.9

100
200
500

6000
9400
17,2000.8-1.2
0.4-0.6
0.37-0.43

1000
3500
5000

28,00043,00049,50010,00020,00060,00062,70072,000117,000

0.81
0.92
0.93

¥16,300¥24,400¥25,000

Price/3kg Price/16kg¥160,100¥210,900¥216,100

DMS-V31
DMS-V33
DMS-V35

0.7
2-3
4-8

CAS: [68083-19-2] TSCA

(7)-483OOF

DMS-V00
DMS-V03
DMS-V05

CH 3

O Si CH CH 2

Monodisperse Vinyl Terminated PolyDimethylsiloxane
DMS-Vm31
1000
28,0000.18-0.26
0.07-0.10
DMS-Vm35
5000
49,5000.10-0.13
0.04-0.05

0.97
0.97

¥24,700¥24,700¥158,200¥158,200

Reduced Volatility Grades*
DMS-V25R
500
DMS-V35R
5000

0.97
0.97

¥22,400¥28,200¥148,800¥181,000

Price/100g¥13,400

Price/3kg Price/16kg¥81,400 ¥195,000

COMMERCIAL

H2C CH Si

Monodisperse telechelic silicone fluids offer advantages over traditional telechelic fluids. These materials contain little or no low
molecular weight non-functional components which can plasticize and migrate out of cured elastomers, reducing or eliminating
migratory contamination issues.

0.37-0.43
0.10-0.13

PR17,20049,5000.11-0.13
0.04-0.05*total volatiles, 4 hours @ 150°C: 0.2% maximum

Fumed Silica Reinforced Vinyl Terminated PolyDimethylsiloxane
Base Fluid
Code
Viscosity
Viscosity wt% Silica Vinyl - Eq/Kg Density
DMS-V31S15
3000
1000
15-18
0.06
1.1

Precompounded base materials provide access to low durometer formulations without the need for special compounding
equipment required to mix fumed silica. The following is a starting-point formulation.
Part ADMS-V31S15
SIP6831.2

Base
Catalyst

99.85%
0.15%

Part BDMS-V31
HMS-301

Vinyl Silicone
Crosslinker

90.0%
10.0%

Prepare Part A and Part B separately. When ready to cure mix 3 parts A to 1 part B. The mix will cure over 4 hours at room
temperature to give the following properties.
Hardness:Elongation

20-30 Shore A
400-450%

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Tensile Strength
Tear Strength

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CH 3

CH 3

CH 3

CH 3 mH2C CH Si O Si

O

Si

CH 3

O Si CH CH 2
CH 3

n

Vinyl Terminated Diphenylsiloxane-Dimethylsiloxane Copolymers CAS: [68951-96-2] TSCA
Mole %
Diphenylsiloxane Viscosity

Code

Molecular
WeightVinyl –
Eq/Kg

(7)-481

Refractive
Index
Price/100g Price/3kg

3.0-3.5
3.0-3.5
3.0-3.5
3.0-3.5500
1000
10,00060,00015,50027,00062,00078,0000.10-0.16
0.065-0.11
0.027-0.037
0.017-0.021

1.420
1.420
1.420
1.420

¥14,100¥15,400¥16,200¥18,300¥96,600¥106,900¥113,300¥130,800

PDV-0525
PDV-0535
PDV-0541

4-6
4-6
4-6

500
5000
10,00014,00047,50060,0000.12-0.16
0.03-0.06
0.027-0.038

1.430
1.430
1.430

¥17,200¥16,200¥20,200¥96,600¥113,300¥145,000

PDV-1625
PDV-1631
PDV-1635
PDV-1641

15-17
15-17
15-17
15-17

500
1000
5,000
10,0009,500
19,00035,30055,0000.19-0.23
0.09-0.12
0.052-0.060
0.033-0.040

1.465
1.465
1.465
1.465

¥17,400¥23,300¥31,300¥43,200¥104,500¥170,800¥196,000¥255,000

PDV-2331
PDV-2335

22-25
22-25

1000-1500
4000-5000

12,50023,0000.13-0.19
0.07-0.10

1.493
1.493

¥65,800¥76,400¥342,000¥403,000

Vinyl Terminated polyPhenylMethylsiloxane
Code
PMV-9925

Mole %
PhenylMethylsiloxane
99-100Viscosity
300-600

Molecular
Weight2000-3000

Vinyl–
Eq/Kg
0.5-1.2

COMMERCIALO
O
F

PDV-0325
PDV-0331
PDV-0341
PDV-0346

CAS: [225927-21-9] TSCA-L

Refractive
Index
Density Price/100g
1.537
1.11
¥40,600

These materials are most often employed in 2-part addition cure silicone elastomers where special thermal or
optical properties are required.

VinylPhenylMethyl Terminated VinylPhenylsiloxane - PhenylMethylsiloxane Copolymer CAS: [68037-82-1]TSCAPR

Mole %Code
PhenylMethylsiloxane
PVV-3522
30-40
Crosslinks with dicumyl peroxide.

Viscosity
80-150

Molecular
Weight800-1500

Vinyl–
Eq/Kg
6.0-7.5

Refractive
Index
Density Price/100g
1.530
1.10
¥45,900

Vinyl Terminated TrifluoropropylMethylsiloxane - Dimethylsiloxane Copolymer
Mole %
Molecular Refractive
Code CF3CH2CH2MeSiO Viscosity
WeightIndex
FMV-4035
35-45
4,000-6,000
6,000-9,000
1.388
FMV-4042
35-45
14,000-18,000 25,000-35,000 1.388

CAS: [68951-98-4] TSCA

Specific
Gravity Price/100g Price/1kg
1.13¥32,600 ¥186,500
1.13¥49,900 ¥254,400

Trifluoropropylmethylsiloxane copolymers offer greater solvent resistance (lower hydrocarbon solubility) and lower
refractive index than analogous dimethylsiloxane homopolymers.
496

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Vinyl Terminated Diethylsiloxane - Dimethylsiloxane Copolymers
Mole %
Diethylsiloxane
18-22

Viscosity
150-300

Molecular
Weight8000-12,000

Refractive
Index
1.413

Specific
Gravity Price/100 g
0.953¥51,200

O
O
F

Code
EDV-2022

Diethylsiloxane copolymers offer better hydrocarbon compatibility (greater solubility) and higher refractive
index than analogous dimethylsiloxane homopolymers.

Vinylmethylsiloxane - Dimethylsiloxane Copolymers, trimethylsiloxy terminatedSpecific
Gravity
0.97
0.97
0.97
0.98
0.97
0.96
0.98
0.98

Vinylmethylsiloxane - Dimethylsiloxane Copolymers, silanol terminated, 4-6% OH
VDS-1013
10-15
25-40
550-650
0.9-1.4

0.99

PRMole %
Molecular
Code
Vinylmethylsiloxane Viscosity, cSt.
Weight Vinyl - Eq/kg
VDT-123
0.8-1.2
250-350
12,0000.11-0.15
VDT-127
0.8-1.2
700-800
23,0000.11-0.15
VDT-1310.8-1.2
800-1200
28,0000.11-0.15
VDT-163
0.3-0.7
2,000,000-4,000,000 425,000
0.04-0.08
VDT-431
4.0-5.0800-1200
28,0000.5-0.7
VDT-731
7.0-8.0800-1200
28,0000.9-1.1
VDT-954
11.0-13.0
300,000-500,000
225,000
1.1-1.4
VDT-503548-52
4500-5500
50,0006.0-6.5

CAS: [67762-94-1] TSCA

Price/100 g¥10,100¥13,400¥10,100¥20,000¥10,600¥10,100¥36,600¥15,900

Price/1kg¥50,000¥73,000¥50,000¥118,000¥55,000¥50,000¥202,000¥90,000

Vinyl containing copolymers are used as crosslinkers in Pt and peroxide cure elastomer. High vinyl content copolymers form
elastomers used in high accuracy soft lithography1,2,3.
1Choi, D. et al. Mat. Sci. Eng. C. 2004, 24, 213.
2Infuehr, R. et al. Appl. Surf. Sci. 2003, 254, 836.
3
Schmid, H.; Michel. B. Macromolecules 2000, 33, 3042.

CAS: [67923-19-7] TSCA

Vinylmethylsiloxane - Dimethylsiloxane Copolymers, vinyl terminated
VDV-0131

0.3-0.4

800-1200

28,0000.04-0.055¥17,800¥107,000

CAS: [68083-18-1] TSCA

0.97

¥24,700-

These materials are modifiers for addition cure and activated cure elastomers.
See also MCS-V212, p. 500
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Vinyl Terminated Ethylene-Siloxane Copolymer Fluids
Code
DCE-V7512

Mole %
Siloxane
70-80

Viscosity
150-250

Specific
Gravity
0.907[26710-23-6]

Refractive
Index
1.429

Molecular
Weight>2000

Price/100g¥35,300

Price/1kg¥214,000OOF

Ethylene-siloxane copolymer polymers exhibit reversion resistant behavior.
CH2

CH3

CH3 Si

O

CH3

CH3

CH

R

CH3

O

Si O

Si O

Si

CH3 m

CH3 n

CH3

p CH3

Si

Vinyl Gums (balance dimethylsiloxane unless otherwise specified)Mole %
Code
Vinylmethylsiloxane
VGM-0210.2-0.3
VGP-061
0.1-0.2
VGF-991
1.0-2.0%
DGM-000*
0.0

CH3

TSCA

Comonomer %6-7% Diphenylsiloxane
98-9% Trifluoropropylmethylsiloxane
100% dimethylsiloxane* This gum is listed here for convenience. It contains no vinyl functionality.

Specific
Gravity
0.98
0.99
1.35
0.98

Price/100 g¥13,000¥13,000¥20,400¥13,000

Price/1kg¥38,000¥54,000¥108,000¥38,000

PR

These materials are base polymers for activated cure specialty silicone rubbers.

Vinyl Q Resins Dispersions
Code
Base
VQM-135*
DMS-V41
VQM-146*
DMS-V46
VQX-22150% in xylene*20-25% Q-resin

Viscosity
4,500-7000
50,000-60,000-

CAS: [68584-83-8] TSCA
Refractive
Vinyl Eq/kg
Index
0.2-0.3
1.405
0.18-0.23
1.406
0.4-0.6-

Density
1.02
1.02
1.05

Price/100g¥8,500¥10,100¥11,400

Price/3kg¥87,000¥110,000¥131,000

Vinyl Q resins are clear reinforcing additives for addition cure elastomers.
See also Hydride Q resins.
498

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Vinylmethylsiloxane Homopolymers
Code

Description

TSCA

Molecular Weight

Viscosity

Density

Price/100g

Price/3kg

O
O
F

VMS-005
cyclics
258-4313-7
0.99¥15,400¥76,000
VMS-T11*linear1000-1500
7-15
0.96¥32,600¥363,000*CAS: [68037-87-6]
Low molecular weight vinylmethylsiloxanes are primarily used as moderators (cure-rate retarders) for vinyl-addition cure silicones.
They also are reactive intermediates and monomers.

Vinyl T-structure Polymers
Code

Branch Point Branch Terminus

Vinyl –
Eq/Kg Viscosity
2-4
5-8
3-6
15-30

DensityPR

VTT-106*
Vinyl
Methyl0.90
MTV-112
MethylVinyl
0.96*CAS: [126581-51-9] TSCA
T-structure polymers contain multiple branch points.
These materials are additives and modifiers for addition cure and activated cure elastomers.

CH3

H Si

O

CH3

150-250

8000-10,000

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Index

Price/100g

1.407¥16,200¥32,600

CH2
CH3
Si

O

CH3

m

CH

CH3

Si O

Si H

CH3 n

CH3

VinylMethylsiloxane – Dimethylsiloxane copolymer, hydride terminatedMolecular
Refractive SpecificVinylCodeViscosity
WeightIndex
Gravity
Eq/Kg
VDH-422

Refractive

-

0.98

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0.3-0.5(215) 547-1015

Price/100g Price/1kg¥19,400¥118,000

www.gelest.com

499

Vinyl Functional Macromers
Hetero bi-functional silicone fluids contain little or no low molecular weight components. They can be used as additives into
traditional RTV-2 silicone formulations or undergo a stepgrowth process when catalyzed by platinum, resulting in a silicone elastomer.1
1. Goff, J. et al, (Polymer Preprints) 2012, 53(1), 487.

CH3

H2C

CH

Si

CH3

O

CH3

Si H
n CH3

O
O
F

a-MonoVinyl-Ω-MonoHydride Terminated PolyDimethylsiloxane
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
GravityDMS-HV15
40-60
2000-3000
1.404
0.96
DMS-HV22
150-250
10,000
1.403
0.97

H2 C

CH

Si

O

CH3

CH3

CH3

Si O

Si

Price/100g¥43,200¥43,200

H

CH3 n CH3

α-MonoVinyl-MonoPhenyl-Ω-MonoHydride Terminated PolyDimethylsiloxane
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/100g
PMM-HV1220
2000
1.41350.97¥41,900

PR

Mono-vinyl functional silicone fluids can be used as components in silicone gels and modifiers inrelease coatings.

MonoVinyl Terminated PolyDimethylsiloxanes - asymmetric
Molecular
Refractive
Code
Viscosity
WeightIndex
MCR-V2180-1205500-6500
1.403
MCR-V41
8000-12000
55,000-65,000
1.404

MonoVinyl Functional PolyDimethylsiloxane - symmetric
Molecular
Refractive
Code
Viscosity
WeightIndex
MCS-V21216-24
1200-1400
1.419

500

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Specific
Gravity
0.97
0.98

Price/100g¥32,600¥59,100

CAS: [689252-00-1]

Density
0.95(215) 547-1015

Price/100g¥32,600
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CH3

H3 C Si

CH3

CH2

R

CH

O

Si O
CH3

CH3

CH3

CH3 n CH3

pCH3

Si O

m

Si O Si CH3

VinylMethylsiloxane Terpolymers

OO
F(3-5% Vinylmethylsiloxane)-(35-40% Octylmethylsiloxane)-(Dimethylsiloxane) terpolymer CAS: [597543-32-3] TSCA
Refractive
Molecular
VinylCodeViscosity
WeightDensity
Index
Eq/Kg
Price/100g Price/1kg
VAT-4326
500-700
10,000-12,000
0.93
1.437
0.20-0.24
Vinyl-alkyl terpolymers are used in hybrid organic polymer-silicone applications.
Employed as a matrix polymer in vapor sensor films.1
1
Blok, E. et al, US Patent 7,138,090, 2006.

¥18,000

VPT-1323¥16,200¥92,000(3-5% Vinylmethylsiloxane)-(35-40% Phenylmethylsiloxane)-(Dimethylsiloxane) terpolymer
Refractive
Molecular
VinylCodeViscosity
WeightDensity
Index
Eq/Kg
Price/100g Price/1kg
250-350

2500-3000

1.03

1.467

0.25-0.29¥95,000

Vinyl-phenyl terpolymers are used in refractive index match applications.

Dimethylsiloxane-vinylmethylsiloxane – (Propylene Oxide – Ethylene Oxide) Block Copolymers
Refractive
Molecular
VinylCodeViscosity
WeightDensity
Index
Eq/Kg
Price/100g Price/1kg
DBP-V102200
10,0000.08-0.10¥23,300¥126,000
DBP-V052200
10,0000.03-0.05¥23,300¥126,000
Vinyl functional glycol-silicone copolymers are used as hydrophilic additives in silicone RTV-2 formulations.
CH2
CH

O

Si

CH Si

PR

H2C

OCH3

OCH3

OCH3

O

Si CH

CH2

OCH3 m OCH3

Vinylmethoxysiloxane Homopolymer
Code

Description

VMM-010*oligomer*R.I.: 1.428; 22-3 wgt% vinyl

CAS: [131298-48-1] TSCA

Viscosity

Density

Price/100g

Price/1kg

8 - 12

1.10¥10,900¥58,000

Vinylethoxysiloxane Homopolymer
Code

Description

VEE-005*

oligomer

CAS: [29434-25-1] TSCA

Viscosity
4-7

Density
1.02

Price/100g¥13,000

Price/1kg¥73,000*19-22 wgt% vinyl

Vinylethoxysiloxane-Propylethoxysiloxane Copolymer
Code

Description

Viscosity

TSCA

Density

Price/100g

Price/1kg

VPE-005*
oligomer
3-7
1.02¥13,000¥73,000*9-11 wgt% vinyl
These materials are employed as adhesion promoters for vinyl-addition cure RTVs, as crosslinking agents for neutral cure
RTVs, and as coupling agents in polyethylene for wire and cable applications.
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501

Hydride Functional Polymers
Hydride functional siloxanes undergo three main classes of reactivity: hydrosilylation, dehydrogenative coupling and hydride transfer.

O
O
F

Hydrosilylation

Dehydrogenative Coupling

Reduction

PR

Hydrosilylation - Addition Cure

The hydrosilylation of vinyl functional siloxanes by hydride functional siloxanes is the basis of addition cure chemistry used in
2-part RTVs and LTVs.1,2 The most widely used materials for these applications are methylhydrosiloxane-dimethylsiloxane copolymers
which have more readily controlled reactivity than the homopolymers and result in tougher polymers with lower cross-link density.
The preferred catalysts for the reactions are platinum complexes such as SIP6830.3 and SIP6832.2. In principle, the reaction of hydride
functional siloxanes with vinyl functional siloxanes takes place at 1:1 stoichiometry. For filled systems, the ratio of hydride to vinyl ismuch higher, ranging from 1.3:1 to 4.5:1. The optimum cure ratio is usually determined by measuring the hardness of cured elastomers
at different ratios. Phenyl substituted hydrosiloxanes are used to crosslink phenylsiloxanes because of their greater solubility and closer
refractive index match. The following chart gives some examples of starting ratios for common polymers and crosslinkers calculated at
1.5 Hydride to Vinyl ratio.
1. Warrick, E. et al. Rubber Chem. Tech. 1979, 52, 437.
2. Dolgov, O. et al. Organosilicon Liquid Rubbers, Int’l Poly. Sci. & Tech. Monograph #1, RAPRA, 1975.

502

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Starting Ratios of Hydride Functional Siloxanes (parts) to 100 parts of Vinylsiloxane*
HMS-013HMS-151

HMS-301

DMS-V31
DMS-V41
PDV-0341

80.8
11.5
11.9

4.2
1.8
1.9

2.1
0.9
0.9

O
O
F

Hydrosiloxane
Vinylsiloxane* formulation is based on 1.5 Si-H to 1 CH2=CH-Si; filled formulations may require up to 3x the amount listed

The hydrosilylation of olefins is utilized to generate alkyl- and arylalkyl-substituted siloxanes, which form the basis of organic
compatible silicone fluids. The hydrosilylation of functional olefins provides the basis for formation of silicone block polymers.

Dehydrogenative Coupling - Water Repellency, Foamed Silicones

Hydroxyl functional materials react with hydride functional siloxanes in the presence bis(2-ethylhexanoate)tin, dibutyldilauryltin,zinc octoate, iron octoate or a variety of other metal salt catalysts. The reaction with hydroxylic surface groups is widely used to impartwater-repellency to glass, leather, paper and fabric surfaces and powders. A recent application is in the production of water-resistantgypsum board. Application is generally from dilute (0.5-2.0%) solution in hydrocarbons or as an emulsion. The coatings are generally
cured at 110-150°C. Polymethylhydrosiloxane is most commonly employed. Polyethylhydrosiloxane imparts water-repellency, but has
greater organic compatibility.
Silanol terminated polydimethylsiloxanes react with hydride functional siloxanes to produce foamed silicone materials. In addition
to the formal chemistry described above, the presence of oxygen and moisture also influences cross-link density and foam structure.

Reductions3

PR

Polymethylhydrosiloxane is a versatile low cost hydride transfer reagent. It has a hydride equivalent weight of 60. Reactions arecatalyzed by Pd0 or dibutyltin oxide. The choice of reaction conditions leads to chemoselective reduction, e.g. allyl reductions in thepresence of ketones and aldehydes.4,5,6 Esters are reduced to primary alcohols in the presence of Ti(OiPr)47.
See brochure “Silicon-Based Reducing Agents”.

Physical Properties

Polymethylhydrosiloxanes exhibit the highest compressibility of the silicone fluids, 9.32% at 20,000 psi and the lowest viscosity
temperature coefficient, 0.50.
3. Larson, G. L., Fry, J. L., “Ionic and Organometallic-Catalyzed Organosilane Reductions”, in Organic
Reactions S. E. Denmark, Ed. Volume 71, John Wiley and Sons, pp 1-771, 2008.
4. Lipowitz, J. et al. J. Org. Chem. 1973, 38, 162.

5. Keinan, E. et al. Israel J. Chem. 1984, 24, 82. and J. Org. Chem. 1983, 48, 3545
6. Mukaiyama, T. et al. Chem. Lett. 1983, 1727.
7. Reding, M. et al. J. Org. Chem. 1995, 60, 7884.

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503

Hydride Terminated PolyDimethylsiloxanes
CodeViscosity

Molecular
Weightwt% H

Equivalent
WeightSpecific Refractive
Gravity
Index

CAS: [70900-21-9] TSCA

Price/100g

Price/1kgO
OF

DMS-H032-3
400-500
0.5
225
0.90
1.395
¥17,800¥68,000
DMS-H11
7-10
1000-1100
0.2
550
0.93
1.399
¥17,800¥68,000
DMS-H21100
4000-5000
0.04
3,000
0.97
1.403
¥28,600¥115,000DMS-H25500
17,200
0.01
8,600
0.97
1.403
¥20,100¥78,000
DMS-H311000
28,0000.007
14,0000.97
1.403¥20,100¥78,000
DMS-H41
10,00062,7000.003
31,3500.97
1.403¥21,900¥86,000
Hydride terminated silicones are chain extenders for vinyl-addition silicones, enabling low viscosity, high elongation formulations.
They are also intermediates for functionally terminated silicones.

Monodisperse Hydride Terminated PolyDimethylsiloxane
Code

Viscosity

Molecular
Weightwt% H

Equivalent
WeightDMS-Hm15
DMS-Hm25

50
500

3000-3500
17,200

0.07
0.01

1,625
8,600

Specific Refractive
Gravity
Index
0.96
0.97

1.403
1.403

polyMethylHydrosiloxanes, Trimethylsiloxy terminatedTg: -119° V.T.C: 0.50
Molecular
Mole % Equivalent Specific Refractive
Code
Viscosity
Weight(MeHSiO) Weight
Gravity
Index

Price/100g

Price/1kg¥26,000¥26,000¥161,000¥161,000

CAS: [63148-57-2] TSCA

Price/100g

Price/3kg

PR

HMS-991
15-25
1400-1800
100
67
0.98
1.395
¥7,700¥40,600
HMS-992
20-35
1800-2100
100
65
0.99
1.396
¥8,500¥47,000
HMS-99330-45
2100-2400
100
64
0.99
1.396
¥10,900¥73,000
MethylHydrosiloxane homopolymers are used as water-proofing agents, reducing agents and as components in some foamed
silicone systems.

MethylHydrosiloxane - Dimethylsiloxane Copolymers, Trimethylsiloxy terminated
Code

Viscosity

Molecular
WeightHMS-013
5000-8000
45,000-60,000
HMS-031
25-35
1900-2000
HMS-053
750-1000
20,000-25,000
HMS-064
6000-9000
50,000-60,000
HMS-071
25-35
1900-2000
HMS-082110-150
5500-6500
HMS-151
25-35
1900-2000
HMS-301*
25-35
1900-2000
HMS-501
10-15
900-1200*available in reduced volatility grade

504

Mole % Equivalent(MeHSiO) Weight
0.5-1.5
3-4
4-6
4-8
6-7
7-9
15-18
25-35
45-55

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10,000
1600
1475
1240
1000
925
490
245
135

Gelest, Inc.

Specific Refractive
Gravity
Index
0.97
0.97
0.97
0.97
0.97
0.97
0.97
0.98
0.96

1.404
1.401
1.403
1.403
1.401
1.403
1.400
1.399
1.394

(215) 547-1015

CAS: [68037-59-2] TSCA

Price/100g

Price/3kg¥18,000¥15,400¥16,700¥20,400¥19,400¥9,800¥9,800¥8,500¥9,800¥168,600¥95,000¥117,500¥194,100¥122,800¥62,300¥62,300¥51,200¥62,300

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Enabling Your Technology

Specialty Hydrosiloxanes
MethylHydrosiloxane - Dimethylsiloxane Copolymers, Hydride terminatedMolecular
Mole % Equivalent Specific Refractive
Code
Viscosity
Weight(MeHSiO) Weight
Gravity
Index

CAS: [69013-23-6] TSCA

Price/100g

Price/3kg

O
OF

HMS-H271
24-60
2000-2600
25-30
200
0.96
1.402
¥11,700¥84,400
HMS-HM271*
30-70
2000-3000
25-30
200
0.96
1.402
¥10,900¥71,100*mixed methyl, hydride terminated.
MethylHydrosiloxane copolymers are the primary crosslinkers for vinyl-addition silicones and intermediates for functional copolymers.

MethylHydrosiloxane - OctylMethylsiloxane copolymers and terpolymers
Mole %
Equivalent Specific Refractive
Code
Viscosity(MeHSiO)
WeightGravity
Index

PR

HAM-301*
30-80
25-30
440-480
0.91
HAM-3012**
20-60
25-30
280-3200.93*CAS: [68554-69-8] TSCA ** contains, 30-35% C8H17MeSiO, 35-40% Me2SiO

Hydride Q Resin
Code

Viscosity

Hydride Eq/kg

HQM-105
3-5
7.8-9.2
HQM-1076-8
7.5-9.0
see also SST-3MH1.1 p.538; SST-H8HS8 p540

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1.442
1.425

¥19,400¥16,700¥55,200¥46,400

CAS: [68988-57-8] TSCA

Equivalent
WeightSpecific
Gravity

Refractive
Index

110-130
115-135

0.94
0.95

1.410
1.410

Gelest, Inc.

Price/25g Price/100g(215) 547-1015

Price/25g Price/100g¥8,500¥11,100

www.gelest.com¥19,900¥28,400505

Phenyl Functional Hydrosiloxanes

CH3
H Si

O

CH3

CH3
Si
CH3

O

Si H

n CH3

O
O
F

polyPhenylMethylsiloxane, Hydride Terminated*
Code
PMS-H03
PMS-H11

Mole %
Equivalent
WeightViscosity [(HMe2SiO)(C6H5Si)O]
2-5
300-500
200
8 - 12900-1100
500

Specific
Gravity
0.93-

Refractive
Index
1.463

Price/25g Price/100g¥23,100¥67,100

PR

polyPhenyl - (DiMethylHydrosiloxy)siloxane, hydride terminatedMole %
Equivalent Specific
WeightGravity
CodeViscosity [(HMe2SiO)(C6H5Si)O]
HDP-11150-80
99-100150-155
1.01

Refractive
Index
Price/100g Price/1 kg
1.453¥35,300¥43,200-

CAS: [115487-49-5] TSCA
MethylHydrosiloxane - PhenylMethylsiloxane copolymer, hydride terminatedMole %
Equivalent Specific Refractive
Code
Viscosity(MeHSiO)
WeightGravity
Index
Price/25g Price/100g
HPM-502*75-11045-50
160-170
1.08
1.500¥18,000¥49,900*unit MW: 200
Component in flexible optical waveguides.1
1
Bichler, S. et al, Optical Materials, 2012, 34, 772.

506

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Enabling Your Technology

Si OH
Silanol Functional Polymers
CH3

CH3

CH3

HO Si O

Si O

Si OH

CH3

CH3

O
O
F

n CH3

Terminal silanol groups render polydimethylsiloxanes susceptible to condensation under both mild acid and base conditions. They
are intermediates for most room temperature vulcanizeable (RTV) silicones. Low molecular weight silanol fluids are generally producedby kinetically controlled hydrolysis of chlorosilanes. Higher molecular weight fluids can be prepared by equilibrating low molecularweight silanol fluids with cyclics, equilibrium polymerization of cyclics with water under pressure or methods of polymerization thatinvolve hydrolyzeable end caps such as methoxy groups. Low molecular weight silanol fluids can be condensed to higher molecularweight silanol fluids by utilization of chlorophosphazene (PNCl2) catalysts.
Condensation cure one-part and two-part RTV systems are formulated from silanol terminated polymers with molecular weights
ranging from 15,000 to 150,000. One-part systems are the most widely used. One-part systems are crosslinked with moisture-sensitive
multi-functional silanes in a two stage reaction. In the first stage, after compounding with fillers, the silanol is reacted with an excess ofmulti-functional silane. The silanol is in essence displaced by the silane. This is depicted below for an acetoxy system.
O

O

CH3

CH3

CH3

CH3

CH3CO

OCCH 3 O

HO Si O Si O Si OH + 2 CH3CH3 n CH3SiOO CCH3CH3CH3CH3 OCCH 3

H3C Si O Si O Si O Si O Si

OCCH 3

CH3CO

O

O

CH3

CH3

CH3 n CH3 OCCH 3O

PRThe silicone now has two groups at each end that are extremely susceptible to hydrolysis. The silicone is stored in this form andprotected from moisture until ready for use. The second stage of the reaction takes place upon use. When the end groups are exposed tomoisture, a rapid crosslinking reaction takes place.
O

CH3

CH3

H3C Si O Si O Si O Si O Si
O

CH3

O

CH3 O

CH3

CH3

CH3 O

H3C Si O Si O Si O Si O Si
CH
3 O
CH3
CH3 n CH3 O
CH3 n CH3H3C Si O Si O Si O Si O Si CH3
CH3
CH3
CH3 O
O
CH3
CH3 n CH3 O
H3C Si O Si O Si O Si O Si
CH3

O

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CH3

CH3

CH3

CH3

CH3 n CH3 O(215) 547-1015

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O

Gelest, Inc.

CH3

507

The most common moisture cure systems are:Acetoxy

Oxime
Alkoxy
Amine

O
O
F

Enoxy

The crosslinking reaction of alkoxy systems are catalyzed by titanates, frequently in combination with tin compounds and othermetal-organics. Acetoxy one-part systems usually rely solely on tin catalysts. The tin level in one-part RTV systems is minimally about
50ppm with a ratio of ~2500:1 for Si-OR to Sn, but typical formulations have up to ten times the minimum. Other specialty crosslinking
systems include benzamido and mixed alkoxyamino. The organic (non-hydrolyzeable) substituents on the crosslinkers influence thespeed of cure. Among the widely used crosslinkers vinyl substituted is the fastest: vinyl > methyl > ethyl >> phenyl.
Two-part condensation cure silanol systems employ ethylsilicates (polydiethoxysiloxanes) such as PSI-021 as crosslinkers anddialkyltincarboxylates as accelerators. Tin levels in these systems are minimally 500ppm, but typical formulations have up to ten times
the minimum. Two-part systems are inexpensive, require less sophisticated compounding equipment, and are not subject to inhibition.
The following is a starting point formulation for a two-part RTV.
10:1 ratio of A to B.

PR

Part APart BDMS-S45

silanol fluid

70%

DMS-T21100 cSt. silicone fluid

50%

SIS6964.0

silica powder

28%

SIS6964.0

silica powder

45%

PSI-021ethylsilicate

2%

SND3260

DBTL tin catalyst

5%This low tear strength formulation can be improved by substituting fumed silica for silica powder.

Incorporation of hydride functional (Si-H) siloxanes into silanol elastomer formulations results in foamed structures. The blowing
agent is hydrogen which forms as a result of silanol condensation with hydrosiloxanes. Foam systems are usually two components which
are compounded separately and mixed shortly before use.
Condensation Cure Catalysts- see p. 548
Condensation Cure Crosslinkers- see p. 547

508

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Enabling Your Technology

Silanol terminated diphenylsiloxane copolymers are employed to modify low temperature properties or optical properties ofsilicone RTVs. They are also utilized as flow control agents in polyester coatings. Diphenylsiloxane homopolymers are glassy materials
with softening points >120°C that are used to formulate coatings and impregnants for electrical and nuclear applications.

OOF

The reactivity of silanol fluids is utilized in applications other than RTVs. Low viscosity silanol fluids are employed as filler
treatments and structure control additives in silicone rubber compounding. Intermediate viscosity, 1000-10,000 cSt. fluids can beapplied to textiles as durable fabric softeners. High viscosity silanol terminated fluids form the matrix component in tackifiers andpressure sensitive adhesives.

Silanol Terminated PolyDimethylsiloxanes

CAS: [70131-67-8] TSCA

Viscosity

Molecular
Weightwt% (OH)(OH) - Eq/kg

Specific
Gravity

16-32
35-45
45-85

400-700
700-1500
2000-3500

4.5-7.5
3.0-4.0
0.9-1.2

2.3-3.5
1.7-2.3
0.53-0.70

0.95
0.96
0.96

1.401
1.402
1.402

¥10,100¥8,800¥8,800¥55,200¥47,200¥47,200¥197,000¥163,000¥163,000

90-120700-800

4200
18,0000.8-0.9
0.2

0.47-0.53
0.11-0.13

0.97
0.97

1.402
1.403

¥8,000¥7,400¥41,700¥37,700¥106,000¥99,000

DMS-S31
DMS-S32
DMS-S33*
DMS-S35

1000
2000
3500
5000

26,00036,00043,50049,000

0.1
0.09
0.08
0.07

0.055-0.060
0.050-0.055
0.045-0.050
0.039-0.043

0.98
0.98
0.98
0.98

1.403
1.403
1.403
1.403

¥7,400¥7,400¥7,400¥8,000¥37,700¥37,700¥37,700¥41,700¥99,000¥99,000¥99,000¥104,000

DMS-S42DMS-S45

18,00050,00077,000110,000

0.04
0.03

0.023-0.025
0.015-0.017

0.98
0.98

1.403
1.403

¥8,800¥8,800¥45,600¥45,600¥114,000¥114,000

0.010-0.015

0.98

1.403

¥13,300¥87,000¥217,000

DMS-S12DMS-S14DMS-S15PR

DMS-S21DMS-S27

DMS-S51 90,000-150,000
139,000
0.02*also available as an emulsion (see DMS-S33M50 pg 533

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Refractive
Index Price/100g(215) 547-1015

Price/3kg Price/16kg

www.gelest.com

COMMERCIAL

Code

509

Silanol Terminated Diphenylsiloxane - Dimethylsiloxane Copolymers
Molecular
WeightRefractive
Index
wt% (OH) Price/100g

Viscosity

Mole %
Diphenylsiloxane

Molecular
WeightRefractive
Index
wt% (OH) Price/100g

glassy solid

100

1000-1400

Viscosity

Mole %
Diphenylsiloxane

PDS-0338*
6000-8000
2.5-3.5
50,000
PDS-1615**
50-60
14-18
900-1000*CAS: [68083-14-7]**CAS: [68951-93-9]
Employed as color stabilizers in sintered PTFE composites.

1.420
1.473

0.4-0.7
3.4-4.8

Silanol Terminated PolyDiphenylsiloxane

PDS-9931

Silanol Terminated PolyTrifluoropropylMethylsiloxane
Viscosity
50-160150-250

Mole %
CF3CH2CH2MeSiO
100
100

PR

Code
FMS-9921
FMS-9922

Molecular
Weight550-800
800-1200¥18,800¥15,600¥293,000¥278,000

CAS: [63148-59-4] TSCA

1.610

Refractive
Index
1.379
1.379

Silanol-Trimethylsilyl Modified Q Resins

2.4-3.4¥25,700

Price/1kg¥168,700

CAS: [68607-77-2] TSCA

wt% (OH)
5-7%
3-5%

Specific
Gravity
1.28
1.28

Price/100g¥27,300¥38,500

CAS: [56275-01-5] TSCA

Code

Wgt %
Q resin

Molecular
Weightwt%(OH)

Base
Resin

solvent

SQO-299
SQD-255
SQT-221
SQS-261

100
50
60
35-40

3000-4000
3000-4000
3000-4000
3000-4000

1.7-2.0-

DMS-S61*

50% D540% toluene
40% toluene

Price/100g Price/3kg¥30,500¥10,100¥8,500¥15,400¥280,000¥63,000¥45,000¥92,000*300,000-400,000 MW silanol terminated polydimethylsiloxane
Silanol-Trimethylsilyl-modified Q resins are often referred to as MQ resins. They serve as reinforcing resins in silicone elastomers
and tackifying components in pressure sensitive adhesives.

Silanol terminated vinylmethylsiloxane copolymers - see Vinylmethylsiloxane Dimethylsiloxane
Copolymers, silanol terminated, p. 494

510

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COMMERCIAL

Tm: 142-155°; contains cyclics

Code

Price/3kg

O
O
F

Code

TSCA

Enabling Your Technology

Amino Functional Silicones

O
O
F

Aminoalkylfunctional silicones have a broad array of applications as a result of their chemical reactivity, their ability to formhydrogen bonds and, particularly in the case of diamines, their chelating ability. Additional reactivity can be built into aminoalkyl
groups in the form of alkoxy groups. Aminoalkylsiloxanes are available in the three classes of structures typical for silicone polymers:
terminated, pendant group and T-structure.
Aminopropyl terminated polydimethylsiloxanes react to form a variety of polymers including polyimides, polyureas1 andpolyurethanes. Block polymers based on these materials are becoming increasingly important in microelectronic (passivation layer)
and electrical (low-smoke generation insulation) applications. They are also employed in specialty lubricant and surfactant applications.
Phosphorylcholine derivatives have been utilized as coatings for extended wear contact lens 2.

Amino functionality pendant from the siloxane backbone is available in two forms: (aminopropyl)-methylsiloxane-dimethylsiloxane
copolymers and (aminoethylaminopropyl)-methylsiloxane-dimethylsiloxane copolymers. They are frequently used in modification ofpolymers such as epoxies and urethanes, internal mold releases for nylons and as lubricants, release agents and components in coatings
for textiles and polishes.

PR

Aminoalkyl T-structure silicones are primarily used as surface treatments for textiles and finished metal polishes (e.g. automotive
car polishes). The resistance to wash-off of these silicones is frequently enhanced by the incorporation of alkoxy groups which slowlyhydrolyze and form crosslink or reactive sites under the influence of the amine. The same systems can be reacted with perfluorocarboxylic
acids to form low surface energy (<7 dynes/cm) films.3
Riess, C. Monatshefte Chem. 2006, 137, 1434.
Willis, S. et al Biomaterials, 2001, 22, 3261.
3
Thürman, A. J. Mater. Chem. 2001, 11, 381.
1

2

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511

Code

Molecular
WeightViscosity

10-15
20-30
50-60
100-120900-1100
1800-2200
4000-6000

Specific
Gravity

wt% Amine (NH2)

850-900
900-1000
3000
5000
25,00030,00050,0003.2-3.8
3.0-3.2
1.0-1.2
0.6-0.7
0.11-0.12
0.08-0.09
0.05-0.06

0.98
0.98
0.97
0.98
0.98
0.98
0.98

CAS: [106214-84-0] TSCA
Refractive
Index
Price/100g

Price/1kg

1.412
1.411
1.408
1.407
1.407
1.404
1.404

¥24,100¥19,400¥14,900¥13,800¥13,800¥11,100¥13,800¥130,000¥102,000¥68,000¥68,000¥68,000¥53,000¥71,000

0.98

1.404

¥23,600¥117,000

Specific
Gravity

Refractive
Index

O
O
F

DMS-A11DMS-A12DMS-A15
DMS-A21DMS-A31
DMS-A32
DMS-A35

Tg: -123°

COMMERCIAL

Aminopropyl Terminated PolyDimethylsiloxanes

Reduced Volatility Grades
1900-2300

30,0000.08-0.09

N-EthylAminoisobutyl Terminated PolyDimethylsiloxane
Code

Viscosity

8-12
32-40

% Amine (NH)800-1000
2500-3000

2.8-3.2
1.0-1.4

PR

DMS-A211
DMS-A214

Molecular
Weight

CH3
CH3

Code

AMS-132
AMS-152
AMS-162
AMS-163
AMS-191
AMS-1203

Viscosity

80-120100-300 H C
364-2001800-2200
40-60
900-1100

CH2

CH3

512

O

CH3

Si
m

CH3
O

CH3

Si

Si O

Specific
Gravity

0.96
0.97
0.97
0.97
0.97
0.98
O

Gelest, Inc.

HOCH 2CH2OCH 2CH2CH2 Si O

Refractive
Index

ECMS-227
1.404
1.408
p27
1.410
1.411
1.412
1.426

Si R O C (CH2)5CH3 n CH3

CH3

p22

CH3

n CH3

CH32-3 CH3CH34500-6000
7000-9000
Si O Si O
Si 4-5O Si CH3
4000-5000
6-7
CH
CH3
m CH36-7n CH3
3
50,0002000-3000
9-11
20,000
20-25
O
CH3
CH3

www.AZmax.co.jp TEL: 03-5543-1630

Price/1kg¥179,000¥179,000

AMS-132

CH2

Mole % (Aminopropyl)
MethylSiloxane

HO (CH2)5 C O Rm¥28,900¥28,900

CH2

AminopropylMethylsiloxane - Dimethylsiloxane Copolymers
Molecular
WeightPrice/100g

1.422
1.411

NH 2

H3C Si O Si
O

0.93
0.96

CAS: [254891-17-3] TSCA

(215) 547-1015

CH3

CH3

Si

Si C4H9Om

OH

CAS: [99363-37-8] TSCA
Price/100g¥12,500¥12,500¥12,500¥26,000¥23,300¥23,300
DBL-C31
p29

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MCR-C12p30

Price/3kg¥66,000¥66,000¥66,000¥150,000¥141,000¥141,000

COMMERCIALDMS-A32R**total volatiles, 4 hours @ 150°C: 2.0 wt% maximum

Enabling Your Technology

Code

O
O
F

AminoethylaminopropylMethylsiloxane - Dimethylsiloxane Copolymers
AMS-233
AMS-2202

Viscosity

900-1200
300-500

Molecular
Weight-Mole % (Diaminopropyl)MethylSiloxane

2-4
18-24

Specific
Gravity

0.98
0.98

AminoethylaminoisobutylMethylsiloxane - Dimethylsiloxane Copolymers
Code

AMS-242

Viscosity

120-150

Molecular
Weight-Mole % (Diaminoisobutyl)MethylSiloxane

3-5Specific
Gravity

0.97

Refractive
Index

1.407
1.41

Refractive
Index

1.404

CAS: [71750-79-3] TSCA

Price/100g¥12,500¥24,700

Price/3kg¥75,000¥139,000

CAS: [106842-44-8] TSCA
Price/100g¥16,200

Price/3kg¥101,000

PR

Amine Functional Siloxanes with Alkoxy Groups

AminoethylaminopropylMethoxysiloxane - Dimethylsiloxane Copolymers
Code

Viscosity

Molecular
WeightATM-1112
100-200
5000-6500
ATM-1322* 200-300*also available as an emulsion

Mole % (Diaminopropyl)MethoxySiloxane

0.5-1.5
2-4

with branch structure
CAS: [67923-07-3] TSCA
Specific
Base Equiv.
Gravitymeq/gPrice/100g Price/3 kg

0.97
0.97

0.55
-

¥18,300¥11,100¥129,000¥58,000

Diaminoalkoxysiloxanes cure to form durable films on metal substrates.
See ATM-1322M50; p. page 533

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513

Hindered Amine Functional Siloxanes

O
O
F

Hindered Amine Light Stabilizers (HALS) may be incorporated into polysiloxane structures affording an ultraviolet light stabilizer
system that is compatible with other stabilizers such as hindered phenolics and organophosphites and is strongly resistant to water extraction.

(Tetramethylpiperidinyloxy)propylMethylsiloxane-Dimethylsiloxane copolymer
Viscosity
10000
250

mole % HALS
functional MethylSiloxane
4-67-9Specific
Gravity
1.00
0.98

Refractive
Index
1.408
1.409

Price/100g¥22,500¥19,400

PR

Code
UBS-0541
UBS-0822

CAS: [182635-99-0] TSCA

514

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Price/1kg¥140,000¥118,000

Enabling Your Technology

Epoxy Functional Silicones

O
OF

Difunctional and multifunctional epoxy silicones include lower molecular weight siloxanes with discrete structures and higher
molecular weight silicones with either pendant or terminal epoxy functionalization. Depending on specific structures and formulations,they selectively impart a wide range of properties, associated with silicones-low-stress, low temperature properties, dielectric properties
and release. Properties of cured silicone modified epoxies vary from hydrophilic to hydrophobic depending on the epoxy content,
degree of substitution and ring-opening of epoxides to form diols. The ring-strained epoxycyclohexyl group is more reactive than theepoxypropoxy group and undergoes thermally or chemically induced reactions with nucleophiles including protic surfaces such as
cellulosics of polyacrylate resins.
The compatibility of epoxy functional silicones with conventional epoxies varies. In simple unfilled systems, total solubility is required.
For filled systems, it is often desireable to consider systems that are miscible but have only limited solubility since microphase separation canallow a mechanism for stress-relief.
Epoxysilicones with methoxy groups can be used to improve adhesion to substrates such as titanium, glass or silicon. They also can
improve chemical resistance of coatings by forming siloxane crosslinks upon exposure to moisture.

Silicone - Epoxy Compatibility

Gelest ProductBisphenol

SIB1092.0
PMS-E11
DMS-E09
DMS-E11
EMS-622

misciblesolublesolubleinsoluble
insoluble

Epoxy Type
Polyglycol

Cycloaliphatic

solublesolublesolublemiscible
misciblesolublesolublesolublemiscible
insoluble

PR(10% silicone 90% epoxy)

A UV initiator for cycloaliphatic epoxides is OMBO037 described in the Catalyst Section. Epoxy functional siloxane copolymers
with polyalkyleneoxide functionality provide hydrophilic textile finishes.

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515

Epoxypropoxypropyl Terminated PolyDimethylsiloxanes
Molecular
Code
Viscosity
WeightEpoxy-Eq/kg

Specific Refractive
Gravity
Index
0.99
0.98
0.98
0.98

Price/100g Price/1 kg

1.446
1.419
1.417
1.408

¥19,400¥27,300¥35,300¥35,300¥118,000¥148,000¥204,000¥204,000OOFDMS-E09
8-11
363
5.5
DMS-E1112-18
500-600
1.9-2.2
DMS-E1220-35
1000-1400
1.6-1.9
DMS-E21100-140
4500-5500
0.45-0.35
Used in preparation of photocurable silicone for soft lithography1.
1Choi, D. et al, JACS, 2003, 125, 4060.

[102782-97-8] TSCA

(Epoxypropoxypropyl Methylsiloxane)-(Dimethylsiloxane) Copolymers
EMS-622200-300

7,000-9,000

5-7

CAS: [68440-71-7] TSCA

0.99

1.412

1.01
1.01

[102782-98-9] TSCA
1.475
¥51,200
1.490¥59,100

Epoxypropoxypropyl Terminated PolyPhenylMethylsiloxanes
PMS-E11PMS-E15

15-30
30-50

500-600
1200-1500

3.0-3.6
1.0-1.7

CH3

H2C

O

O

CHCH 2OCH 2CH2CH2

CH3

CH3

Si O

Si O

O

Si

CH3

CH3

CH3

O

O

O

Si O Si CH2CH2CH2OCH 2CH
O

m CH3

DMS-EX21

80-1203500-4000

CH3

H3C Si O

0.98

EBP-234

CH
CH
CH
Multifunctional
Siloxanes
Si O
Si O Si CH
3

2

CH2

[188958-73-8] TSCA
1.408
¥16,400

3

CH2

Si O

-

DMS-EX21
p26

CH3

CH2
0.48-0.5

3¥85,000

p27

3

p CH
CH
O
3 3
Si O Si (CH2)3OCH2
CH3 n CH3O
CH3CH3
CH3CH3CH3O DMS-CA21
HOCH 2CH2
CH 2CH2OH
Si 2CH(CH) OCH2
NCH 2CH2CH2 Si
Si OO Si Si
O SiOCH2CH
2N 2 3p29
HOCH 2CH2
CH2CH2OHCH
O3 CH3CHn 3CH3n CH3
CH3
CH3
O
Si O Si (CH2)3OCH2
CH3 n CH3
O
O
CH3

m

CH3 nCH3 CH3

PR

CH3

2

¥52,300

CH3

CH3

O
(CH CH O)qCH(Epoxypropoxypropyl)dimethoxysilyl Terminated
PolyDimethylsiloxanesO2¥11,400

CH3

CH3

CH3

3

3

3

DMS-Z21

OO
p33
MonoPhenyl functional Tris(Epoxy
Terminated
PolyDimethylsiloxane)[90393-83-2] TSCA
CH CH CHSi O Si O Si CH CH CH
CH
CH
CH
Molecular
Epoxy–
MeltingSpecific
Refractive
n
O
O
O
Code
Viscosity
WeightEq/Kg
Point
Gravity
Index
Price/25g
CH OCC CH
2

MCT-EP13

30-35

2

2

500-750 CF3

CH2

CH3
CH2
(CH3)3CSiOCH 2CH2CH2 Si O

2

2

CF3

CH2 CH3
4-6
CF3

CH2
Si O

Si

CH2

CH2

2

2

-73°

3

3

n

O

CH2
CH2

CH2
Si O

3

CH3

O
OCH 3
H2CH
C 3 CHCH
CH3
2O(CH 2)3 Si OO
Si CH2CH2CH2

CH3 m CH3

O

3

516

10-15
100-120

1000
5000

n

C

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p39

CH3

3

CH3

SiCH3 O

Si

CH
CH33

n CHn 3p

0.96
0.97

Gelest, Inc.

CH3

CH3
C

CH3

0.8-1.2
0.1-0.3¥18,000

Si CH2CH2CH2OSiC(CH 3)3

Mono-(2,3-Epoxy)Propylether Terminated PolyDimethylsiloxane
Molecular
Epoxy–
Specific
CodeViscosity
WeightEq/Kg
Gravity
MCR-E11
MCR-E211.05 MFS-M15 1.4742

CF3

CH2

Epoxy
Functional
Macromers
CH
CH
CH
CH
CH

CH3

Si O

2

O

C4HSSP-080
9p52

CAS: [127947-26-6]
Refractive
Index
Price/100g Price/1 kg
1.410
1.408

(215) 547-1015¥27,300¥26,000

www.gelest.com¥168,700¥140,900

CH2
CH2
CH3

CH3

H3C Si O Si
CH3

O

H3C

O

CH3

Si

Si O

Si O

CH3

CH3

Si

O

CH3 n

m

CH3
O

Si

p22

CH3

Enabling Your Technology

n CH3

CH3

m

CH3

CH3

AMS-132

CH2

CH3

ECMS-227

Si CH3p27

CH3

Cycloaliphatic
Epoxy
Silicones
O
CH
CH

O

3

DBL-C31O
O
F

3These materials, characterized by a combinationof cycloaliphatic
and siloxane
outstanding
characteristics,
HO (CHSi R have
O C(CH )5 weatheringOH
Si O structures,
2)5 C O R
p29
controlled release and coefficient of friction and excellent
electricalmproperties. They can be cured either by2cationic
UV
photoinitiatorsorm
CHepoxyCH3 combine the properties of reactive diluents
conventional epoxy hardeners. In cationic UV-cure systems the cycloaliphatic
3 n silicones
with surfactant properties. The release properties can be employed to make parting layers for multilayer films. If high levels of epoxy
functional silicones are used in UV-cure formulations, cationic photoinitiators with hydrophobic substitution are preferred.

CH3

CH3

CH3

MCR-C12

HOCH 2CH2OCH 2CH2CH2 Si O
Si O
Si C4H9
p30(EpoxycyclohexylethylMethylsiloxane) - Dimethylsiloxane Copolymers
CAS: [67762-95-2]
TSCA
+
p37
CH3
CH3 n CH3
Code

Viscosity

ECMS-127
ECMS-227
ECMS-327
ECMS-924

Molecular
WeightMole % (Epoxycyclohexyl)ethylMethylSiloxane

Specific Refractive
Gravity
Index Price/100g Price/1 kg

O
CH3
CH
500-1200 12,000-15,000 O
1-2CH30.983
1.407¥8,500¥36,200
CH31.407
650-800
18,000-20,000HOC(CH ) CH2-3
0.98 (CH¥8,500 DMS-B12¥36,200
3 Si
O Si O Si
2n2)nCOH
O
CH
CH
O
CH
650-850
18,000-20,000
3-4
0.99
1.409
¥8,500O
3
3
3
O ¥36,200
CH3CH3 n CH3
CHCH
CH
H
C
OCH
CH
CH
Si
O
O
Si
O
Si
O
Si
CH
CH
OCH
CH
CH
Si
p33
300-450 2 10,000-12,000
8-10
0.97
1.421
¥44,100222
2
22
2¥9,800
2
2
O

CH3

CH3

CH3

O

m
OCH3

CF3

CF3

CH2

CH2

CH2
3
CH3CH2CHCH
CH
Si
O
2
2

CH2
CH3
Si
O

CH2
O CH3 Si O

PRO

H3C Si O
CH3

CH

CH

2

CH2

CH2
Si

DMS-EX21
p26

CH3

CH2OCC CH2
CH
(CH
CH
2CH
2 2O)qCH33
CF3
O
CH
CH 2
CH

CF3

CH2

EBP-234

2

Si O
Si O
Si O Si CH3
CH
CH
CH3
CH
3
3
n
CH3 3 p CH3
CH3
m CH3 n
OCH 3

CH2

MFS-M15

p27

Si CH2CH2CH2CH3

p39

n CH3

EBP-234

4000-5000

3 m
HOCH 2CH2
25,000-36,000

3

2

2

2

0.75-0.80 CH3

CAS: [69669-36-9] TSCAO
Epoxycyclohexylethyl Terminated PolyDimethylsiloxanes
CH3

2

2

1.03
CH3 n CH3 1.445

CH3

CHSpecific32CH¥9,3002CH 2OH3
p29¥40,900

O
CAS: [102782-98-9]
TSCA
DMS-Z21

Code

Viscosity

MolecularO
WeightDMS-EC1325-35

O
900-1100

CH3
CH3 n CH3
1.9-2.0
0.99

1.433O¥51,200¥231,000

DMS-EC1760-80

3200-3600

0.5-0.7

1.412¥51,200-

CH2CH2CH
Si O Si O
Epoxy-Eq/Kg
2

see also SIB1092.0
www.AZmax.co.jp TEL: 03-5543-1630
CH3

CF3

CH2
(CH3)3CSiOCH 2CH2CH2 Si O
CH3

CF3

CH
CHInc.
Gelest,
2
2

CH3

CH2
Si O

RefractiveO

Si Gravity
CH2CH2CH2Index
O

0.98

CH2OCC CH2CH2 CH3
CF3
CF3
CH2 (215)CH
547-1015CH
2Si

CH3 n CH3

O

CH2
Si O

CH3

SSP-080

CHO

3
3 MethoxypolyalkyleneoxyMethylSiloxane)-(Dimethylsiloxane)
3(2-3% EpoxycyclohexylethylMethylsiloxane)(10-15%
Terpolymers
C
Si
O
Si
CH
CH
CH
O
C
O
O
Molecular
2
2 CH
2 Specific
CHRefractive
CH3
3
3
DMS-CA21
HOCH 2CH2
CH 2CH2OH
CodeViscosity
WeightEpoxy-Eq/Kg
Gravity
Index
Price/100g Price/1
CHCH
CH kg Price/10 kg n
NCH CH CH Si O Si O Si CH CH CH N

2

CH2

p33

Price/100g Price/1 kg

www.gelest.com
CH3

Si CH2CH2CH2OSiC(CH 3)3

n CH3

CH3

MFS-M15
p39

517

p

p52

O
O
F

Carbinol Functional Silicones
Carbinol (Hydroxy) Functional Siloxanes

The term carbinol refers to a hydroxyl group bound to carbon (C-OH) and is frequently used in silicone chemistry to differentiatethem from hydroxyl groups bound to silicon (Si-OH) which are referred to as silanols. Carbinol terminated siloxanes contain primaryhydroxyl groups which are linked to the siloxane backbone by non-hydrolyzeable transition groups. Frequently a transition block ofethylene oxide or propylene oxide is used. Carbinol functional polydimethylsiloxanes may be reacted into polyurethanes, epoxies,
polyesters and phenolics.

Applications include additives for urethane leather finishes and as reactive internal lubricants for polyester fiber melt spinning.
They are also utilized as surfactants and processing aids for dispersion of particles in silicone formulations.
Polyethyleneoxide transition blocks are more polar than polypropyleneoxide blocks and maintain a broad range of liquid behavior.
Carbinol terminated siloxanes with caprolactone transition blocks offer a highly polar component which enables compatibility in avariety of thermoplastic resins.

PR

Mono(dicarbinol) terminated polydimethylsiloxanes are macromers with diol termination on one end of a polydimethylsiloxane
chain. In contrast with telechelic carbinol terminated polydimethylsiloxanes, they have the unique ability to react with isocyanates toform urethanes with pendant silicone groups. In this configuration the mechanical strength of the polyurethane is maintained whileproperties such as hydrophobicity, release and low dynamic coefficient of friction are achieved. For example, a 2 wgt % incorporationof MCR-C61 or MCR-C62 into an aromatic urethane formulation increases water contact angle from 78° to 98°. The reduction ofcoefficient of friction and increased release of urethanes formulated with diol terminated macromers has led to their acceptance asadditives in synthetic leather.

Carbinol functional Macromers - see Macromers p. 530

518

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Enabling Your Technology

NH 2
CH2
CH2
CH3

CH3

AMS-132

CH2

Carbinol (Hydroxyl) Terminated PolyDimethylsiloxanes

H
O%
Molecular
Weight3C Si O SiCH3Si Specific
O Si

p22

CH
Refractive
3

CH3

CH
3 3 n
m CH

CH3
O

(CH2CH2O)qCH3
CH3
O
O
Si O
Si R O C (CH2)5OH
CH2m
CH3 n CH3
CH2

O

CH3

HO (CH2)5 C O RmCarbinol (Hydroxyl) Terminated
PolyDimethylsiloxanes
CH
CH
Code

3

3

Molecular
O Weight
Si O

Weight %Si CHO3
Non-Siloxane

52-6° CH
5700-6900
CH23CH2CHnm 2 CH
HOCH
Si350 O
3 2OCH
2CH

PR

DBL-C31*
DBL-C32**

MeltingHPoint3C Si

80-85°DMS-EX21
p26

CH3

CH3

7000-8000

25-30

CH2

DBL-C31

p29
EBP-234
p27

CH3

Specific
Refractive
SiCH
O
Si
CH
CH
Gravity3
3 3IndexCH
Si 31.05
O p CHSi 3 C4H-9
1.05-

Price/100g
MCR-C12

Price/1kg¥20,400¥23,300
p30¥111,000¥130,000

CH3 **m=7-10
A-B-A caprolactone - dimethylsiloxane - caprolactone block CH
polymer,*m=15-20;
3
n CH3CAS: [120359-07-1]

+ p37

CH3
CH3
CH3
CH 2CH2OH
O
O
CH3
CH3
CH3
NCH 2CH2CH2 Si O Si O Si CH2CH2CH2N
DMS-B12O Si O Si (CH2)nCOH
HOCH 2CH2HOC(CH 2)n Si CH
CH2CH2OH
CH
CH
3
3 n
3
CH3
CH3 n CH3
p33
HOCH 2CH2[Bis(Hydroxyethyl)Amine] Terminated PolyDimethylsiloxanes
O
Molecular
WeightO

CodeViscosity

DMS-CA21

120-160

O

Weight %Specific
CH2OCC Gravity
CH2
Non-Siloxane

CH2O
CH3CH2CH2CH2 Si O

2Price/100g

2

Si O

CH3

CF3
Si CH2CH2CH2

Si

O

Gelest, Inc.

Si
O

¥31,600

O

2

2

CH3 n CHCH3

CH CH3

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CH3
CH3

Si O

O

CH0.97
3
3000
10CH
1.414
2
CH
CH
CF3
3
CF3
CF3CH3CF33
CHCH
Si2 O Si
2CH 2CH 2CH Si O CH
2CH 2
CHCH CH2CH
2

CH3

Refractive
Index

O
Si CH2CH2CH2CH3

CH2

2

O

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CH
CH
CH
CH
OCC
CH
n
3
3
n2
3
2
OCH 3
CH
CH2 O 3
CF3 CH3
CF3
CF3

O
CH

C

O

COMMERCIAL

O
O
F

Code
Viscosity
WeightIndex
Price/100g
Price/1kg
CH3 Non-Siloxane
CH3 m CHGravity
3 n CH 3
DMS-C15
30-50
20
0.98
1.417
¥22,500¥121,000
O 1000DMS-C1650-65
600-850
0.97
1.416¥20,700¥110,000
DMS-C21110-140
4500-5500
4
0.98
1.407
¥14,600¥73,000
DMS-C23300-350
10,0000.98
1.406CH 3¥16,200¥83,000
CH3 DBE-C25*
400-450
3500-4500
60
1.07
1.450
¥11,100¥53,000
O 45-55 CH3
CH
CH31.434O
O 200-300
DBP-C22**2500-3200
0.993¥15,600¥80,000 O
ECMS-227
note: for DMS-C15,
DMS-C21,
DMS-C23m=1[156327-07-0];
TSCA
CH2CH2CHH2C CHCH
CH2CH
SiCH
O3 Si CHO 3forSiDMS-C16
O Sim=0OCAS:
Si[104780-66-7]
CH2
CH
2OCH
2 CAS:
2OCH 2CH
3 2*A-B-A ethylene oxide - dimethylsiloxane - ethylene oxide block polymer CAS: [68937-54-2]
OSi oxide
O p27
CH
CH3 CAS:
H3oxideC Si
O Si O - propylene
OCHblock
3Si CHmm=12-16**A-B-A propylene- dimethylsiloxane
copolymer[161755-53-9]
3 3

C

DMS-CA21
p29

Price/1kg

DMS-Z21¥206,000

p33

MFS-M15
p39

519

O

SSP-080
MFS-M15

NH 2
CH2
CH2
CH3

CH3

H3C Si O Si
CH3O

AMS-132

CH2
O

CH3

Si

CH3
O

p22

CH3

n CH3

CH3

m

Si

(Carbinol functional)Methylsiloxane-Dimethylsiloxane Copolymers
Code

wt%
OH
CH3
Non- Content Glycol
H3C Si O Si O
Siloxane (meq/g) chains/mol
Viscosity
CH

CH

CH3

m

ECMS-227

CH3

Molecular Specific Refractive p27
Si O Si CH3
WeightGravity Index
CAS
CH

Price
100g

CH

n

Price
1kg

O
O
F

3
3
3
CMS-221
20-25 0.7-0.9
3-4 3 125-150
4000
1.00
1.419 68937-54-2 ¥8,800 ¥8,800
CMS-22220
0.4-0.6
2-3
150-200
5500-6500
0.98
1.411 68957-00-6 ¥14,100 ¥69,000
OCH
O1.505 200443-93-2
CH3
3
CMS-832*
50-60 0.2-0.3
1000-2000
2000-5000
1.09¥16,200 ¥95,000
DBL-C31
HO
(CH
)
C
O
R
O
Si
R
O
C
(CH
)
OH
Si
CMS-62665
0.3-0.5
1-3
550-650
4500-5500
1.09
1.458 2 5 68937-54-2 p29¥13,800 ¥68,000
25mm
CH3 n CH3*(Hydroxypolyethyleneoxypropyl)methylsiloxane-(3,4-Dimethoxyphenylpropyl)methylsiloxane-Dimethylsiloxane
terpolymer

Carbinol Functional Macromers

CH3

CH3

Si

Si C4H9CH3HOCH 2CH2OCH 2CH2CH2 Si O
CH3

O

CH3

MCR-C12
p30

n CH3

+ p37

MonoCarbinol Terminated PolyDimethylsiloxane CH3 CH3 CH3CAS: [207308-30-3] TSCAO2NCH 2CH2CH
O9 structure 1
Molecular
SpecificH
CH23 Refractive
SiCHO3 SiCHO3 Si
C4H
DMS-B12
Code
Viscosity
WeightIndex
Gravity
Price/1kg
HOC(CH 2)n Si O CH
Si 3 O CH
Si3 n(CHCH23)nCOH Price/100g
MCR-C12
MCR-C18
MCR-C2215-20
60-140
250

CH3

1000
0.96
¥36,600
H2C CHCH¥144,500
O(CH 2CH2O)nSi CH3
CH3 1.409
CH3 n CH3
p33 2
CH3
3
5000 CH3 CH
1.405
0.97
¥24,900¥134,500
CH3
structure 2 ¥23,300
O SiO C4H9 0.98
HORCH
10,000 2 Si O Si1.404¥116,000
structure 14
2OCC CH 2
CHCH
3 n CH 3
CH2 CH3
CF3
CF3 O (CH2CH2O)CF
3
n H
CHCH
2
(CH
)
CH2 CHCH
CH
3 2
23
3
2

CH3

O

CF3

O 2 Si O Si CH3 CH2CH23 Si CH
CH3CH2CH2CH2 Si O CHSi
OCH3 Si CHO3
Si O
3

PR

H2C

C

CH2
structure 3
CH2

CH3

C O(CH 2CH2O)nSi

CH3

MFS-M15Si CH2CH2CH2CH3

CH3

CH3
structure 15

p39

CH3 n CH3
3
3
n CH3 CAS: [67674-67-3] TSCA
MonoCarbinol Terminated FunctionalCH
PolyDimethylsiloxanes- CH
symmetric
HOCH 2
CH3
CH3
OCH 3 CH3
SSP-080CH
OSpecific
CH3
CHMolecular
Refractive
3
CH3CH2CCH2OCH 2CH2CH2 Si O Si O Si C4H9 3 structure 4
CodeViscosity
WeightIndex O
Price/100g
Price/1kg
C
Si O Si CH
C Gravity
OO
2CH 2CH 2
CH3

HOCH 2CH3 mCH3

MCS-C11*
5-15 CH3 m CH3280-380
1.413
0.905
¥14,100
- n p
CH3
O
CH
CH3
CH
MCS-C13**35-40
550-650
1.446 31.02 3¥16,200¥82,300
structure 5
HOC(CH 2)10 Si O Si O Si C4H9
* n=0, CAS [17962-67-3] **n=6-9, CAS[67674-67-3]
CH3

CH3 n CH3CH3O
H2C CHCH 2O(CH 2)3 Si O

CH3

CH3

Si O

Si

CH3

CH3

n CH3

MonoDiCarbinol Terminated PolyDimethylsiloxane
CH3
CH3
CH3
Molecular
Refractive
Specific
H Si O Si O Si C4H9
CodeViscosity
WeightIndex
Gravity
CH3

CH3 n CH3
1.417
0.97
CH3
CH3
CH3

CH3

www.AZmax.co.jp TEL: 03-5543-1630

CH3

Gelest, Inc.

CH3

CH2

CH3CH2CH2CH2 Si O

Si O

Si

Si

CAS: [218131-11-4]¥19,400¥19,400 8
structure¥133,200¥133,200

CH3O

structure 6

Price/1kg

CH3 n CH3O(215) 547-1015
CH2OCC CH2CH2 CH3CH3

C4H9

structure
7
Price/100g

MCR-C61
50-60
1000
O
MCR-C62
100-125
5000
1.409
0.97
H2C C C O(CH 2)3Si O Si O Si C4H9
Diol terminated silicones improve electricaland release properties of polyurethanes.
520

p52

www.gelest.com

CH3
O

Si CH2CH2CH2CH3

structure 9

Enabling Your Technology

Methacrylate and Acrylate Functional Siloxanes

O
OF

Methacrylate and Acrylate functional siloxanes undergo the same reactions generally associated with methacrylates and acrylates,
the most conspicuous being radical induced polymerization. Unlike vinylsiloxanes which are sluggish compared to their organic
counterparts, methacrylate and acrylate siloxanes have similar reactivity to their organic counterparts. The principal applications ofmethacrylate functional siloxanes are as modifiers to organic systems. Upon radical induced polymerization, methacryloxypropyl
terminated siloxanes by themselves only increase in viscosity. Copolymers with greater than 5 mole % methacrylate substitution
crosslink to give non-flowable resins. Acrylate functional siloxanes cure at greater than ten times as fast as methacrylate functionalsiloxanes on exposure to UV in the presence of a photoinitiator such as ethylbenzoin. They form permeable membranes for fiber-optic
oxygen and glucose sensors.1
Oxygen is an inhibitor for methacrylate polymerization in general. The high oxygen permeability of siloxanes usually makes it
necessary to blanket these materials with nitrogen or argon in order to obtain reasonable cures.

Methacryloxypropyl Terminated PolyDimethylsiloxanes
Code

DMS-R05
DMS-R11DMS-R18
DMS-R22
DMS-R31

Viscosity
4-6
8-14
50-90
125-250
1000

Molecular
Weight380-550
900-1200
4500-5500
10,00025,000CAS: [58130-03-3]

Refractive
Index

Specific
Gravity

1.448
1.422
1.409
1.405
1.404

0.97
0.98
0.98
0.98
0.98

PR

(3-Acryloxy-2-hydroxypropoxypropyl) Terminated PolyDimethylsiloxanes
Code
DMS-U21

Viscosity
60-140

Molecular
Weight
600-900

Refractive
Index
1.426

Specific
Gravity
0.99

Price/25g¥19,900¥24,100¥24,100¥24,100¥20,700

Price/100g¥57,000¥70,800¥70,800¥70,800¥59,700

CAS: [128754-61-0]
Price/25g¥12,700

Price/100g¥32,900

Acryloxy Terminated Ethyleneoxide - Dimethylsiloxane-Ethyleneoxide ABA Block Copolymers CAS: [117440-21-8] TSCA
Code
DBE-U12*
DBE-U22**

Viscosity
80-120110-150

Molecular
Weight1500-1600
1700-1800

MW
PDMSO block
700-800
1000-1200* 45-55 wgt% CH2CH2O **30-35 wgt% CH2CH2O

Refractive
Index
1.450
1.445

Specific
Gravity
1.03
1.03

Methacryloxypropyl Terminated Branched PolyDimethylsiloxanes

Molecular
Code
Viscosity
Weight
SIB1400.0
14-18
683
see also- methacrylate functional macromers

Refractive
Index
1.432

Price/100g¥19,400¥14,100

Price/1kg¥118,000¥81,000

CAS: [80722-63-0]
Specific
Gravity
0.99

Price/25g¥16,400

Price/100g¥44,800

Li, L. et al. Analyt. Chem. 1995, 67, 3746.

1

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

521

O
CH2 O C C CH2
CH2
CH3

CH3

CH3 Si O Si
CH3

CH3

CH2
O

CH3

CH3

Si
m

O

CH3

Si

CH3

n CH3

(Methacryloxypropyl)methylsiloxane - Dimethylsiloxane Copolymers
Specific
Gravity
0.98
0.98
0.99

Viscosity
8000-10,000
1000-2000
2000-3000

O
O
F

Code
RMS-044
RMS-033
RMS-083

CAS: [104780-61-2] TSCA
Mole % (Methacryloxypropyl)Methylsiloxane
Price/100g
4-6¥69,700
2-4¥43,200
7-9¥52,500(Acryloxypropyl)methylsiloxane - Dimethylsiloxane Copolymers
Code
UMS-182
UMS-992**homopolymer

Specific
Mole % (AcryloxyViscosity
Gravity
propyl)Methylsiloxane
Price/100g
80-1201.01
15-20¥40,600
50-125
1.10
99-100¥32,600
Refractive Index: UMS-182 = 1.426; UMS-992 = 1.464 UMS-182-CAS: 158061-40-6(3-Acryloxy-2-Hydroxypropoxypropyl)Methylsiloxane-Dimethylsiloxane Copolymer
Code
UCS-052
amber liquid

Viscosity
500-1,500

Mole % (Acryloxyfunctional)Methylsiloxane
4-6Price/100g¥24,100

CH3
CH3
Si O Si CH3CH3 n CH3
O
O
CH3
CH3
C C O (CH2)3 Si O Si O Si CH3CH3 n CH3
O
CH3
CH3
CH3
Si O Si CH3CH3 n CH3PR

H2C

Molecular
Weight
7500-8500

Methacryloxypropyl T-structure Siloxanes

Molecular
Code
Viscosity
Weight
RTT-1011
10 - 20570-620contains multiple branch points (>2 methacrylate groups)

Acryloxypropyl T-structure Siloxanes

Molecular
Code
Viscosity
WeightUTT-1012
10 - 30
500-900
contains multiple branch points (>2 acrylate groups)

Specific
Gravity
0.95

Specific
Gravity
0.96

CAS: [67923-18-6] TSCA

Refractive
Index
1.421

Price/100g¥26,300

Price/100g¥32,600

Methacrylate functional macromers- see p. 530, 531
522

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

HOCH 2CH2

CH3

CH3

CH3

CH 2CH2OH

CH3

CH3 n CH3

CH2CH2OH

NCH 2CH2CH2 Si O Si O Si CH2CH2CH2N

HOCH 2CH2

DMS-CA21
Enablingp29
Your Technology

NH

2
Anhydride, Bicycloheptenyl, and Carboxylatefunctional Silicones

CH2

O

CH3

O

CH2CH2CH2

O

CHCH
3 3

H3C Si O Si

CH3O
Anhydride functional Silicones

CH3CH CH3
2

Si O Si O

O

CH3

CH3

O

CH2

Si

Si

m

O

CH3 n CH3

CH3

O

CH3

O

CH2CH2CH2

Si

CH3

n CH3

AMS-132
DMS-Z21
p22

p33

O

O
O
F

Anhydride functional siloxanes can be reacted directly withCH
aminesepoxidesor hydrolyzed to give dicarboxylic
CH
2OCCand2
acid terminated siloxanes.
CH2 CH3
CF3
MFS-M15
CF3
CF3
CF3
Succinic Anhydride Terminated PolyDimethylsiloxane
CH
2
CH
CH2
CH2 SpecificCH2
Molecular
Refractive
2
p39
CH
CH3
Code
Viscosity
WeightGravity
Index
Price/100g
CHECMS-227
3
CH2
CH2
CH2
2 Price/25g
CH3
CH3
CH3
DMS-Z21¥24,700¥72,100(CH3)75-100
Si O 1.06
Si O
Si 1.436O
Si CH
3CSiOCH 2CH 2CH600-800
2 Si O2CH 2CH 2OSiC(CH3)3H3C SiCH O
CH3Si O CH Si CHO SiCHCH3 CH
3
3 n
3
3
CH3
m CH3 n CH3

CH3

CH3

3

OCH 3

n CH3

O

p27

CH3

CH3

SSP-080

O CH CHO
CH3
3
Si O Si CH
OCHCCO DBL-C31 p52
2
2
2
Bicycloheptenylfunctional
Silicones
n 1,2p
HO CH(CHR
Si R O C (CH
OH
Si O
CH
5 3C O2)35(ROMP)
3 m2)CH
Bicycloheptenyl terminatedsilicones
undergo ring-opening metathesis polymerization
reactions.p29mm
CH3 n CH3
1
Finkelstein, E. 10th Int’l Organosilicone Symp. Proc, 1993,
P-120.
2

Angeletakis, C. et al, US Pat. 6,455,029, 2002.

(Bicycloheptenyl)ethyl Terminated PolyDimethylsiloxane
CH3Specific CH3 Refractive
CH3
Molecular
Viscosity
400-600
1300-1800

Weight12,000-16,000
16,000-20,000

Gravity
Index
Price/25g
Price/100g
Si O
Si C4H9
0.98
1.406¥24,700p30 ¥70,000+ p37
CH3 0.96 CH3 n1.406
CH3¥24,700¥70,000

HOCH 2CH2OCH 2CH2CH2 Si O

PR

Code
DMS-NB25
DMS-NB32

CAS: [945244-93-9]
MCR-C12OCH3HOC(CH 2)n

CH3

CH3

Si O Si O
CH3

Si

O
DMS-B12(CH2)nCOH

CH3 n CH3

p33

Carboxylate functional Silicones

Carboxylic acid functional siloxanes are excellent rheology andOwetting modifiers for polyesters. When reacted withinorganic bases or amines, they perform as anti-static surfactants
and lubricants.
CH OCCCH
2

2(Carboxyalkyl) Terminated PolyDimethylsiloxaneCH
2
Molecular
CF3
CF3
Code
Viscosity
WeightTermination
CH2
CH
CH
DMS-B12*
15-30
10002
CH
DMS-B25*450-550
10,000
2
CH3CH
CH
CH
Si
O
DMS-B31**800-1200
28,000222*CAS: [58130-04-4] ** [158465-59-9]
CH

2
Carboxydecyl
CH
Carboxydecyl
2
SiCarboxypropyl
O
Si

CH3
Specific
CF3

O

CF3
Refractive
Gravity
Index
Price/25g Price/100g
CH2
CH2
0.96
1.421
¥18,800¥54,000 MFS-M15
CH2
CH2
0.97
1.403
¥17,200¥49,000
Si O
Si- CH2CH
0.98¥17,200
p39
2CH 2CH 3¥49,000

CH3 n CH3
CH3 n CH3
OCH 3
www.AZmax.co.jp
O 547-1015
CH3
CH3 TEL: 03-5543-1630 Gelest, Inc.
(215)
3

Si O

Si CH2CH2CH2

CH3 m CH3OC

O

www.gelest.com
CH3

C
CH3

523

SSP-080

n p

p52

O

Chloroalkyl and Mercapto Functional Silicones
Chloroalkyl-functional Silicones

O
O
F

Chlororopropyl-functional silicones are moderately stable fluids which are reactive with polysulfides and durable press fabrics. They
behave as internal lubricants and plasticizers for a variety of resins where low volatility and flammability resistance is a factor. Chloromethyl
and chloromethylphenethyl terminated polydimethylsiloxanes offer access to block copolymers through various polymerization chemistries
such as ATRP & RAFT.

(Chloropropyl)Methylsiloxane - Dimethylsiloxane Copolymers
Code
LMS-152

Viscosity
300-450

Molecular
Mole % (ChloroSpecific
Weightpropyl)MethylSiloxane Gravity
7500-10,000
14 - 16
1.01

Chloromethyl terminated PolyDimethylsiloxane
Code
DMS-L21

Viscosity
100-150

Molecular
Weight6000-8000-

Chloromethylphenethyl terminated PolyDimethylsiloxane
Code
DMS-LP21

Viscosity
100-150

Molecular
Weight
5000-

Refractive
Index
1.420

Specific
Gravity
0.98

Refractive
Index
1.406

Specific
Gravity
0.98

Refractive
Index
1.420

CAS: [70900-20-8] TSCA
Price/100g¥28,900

Price/1kg¥156,400

CAS: [158465-60-2]
Price/100g¥24,700

Price/1kg¥153,000

Price/100g¥32,600

Price/1kg-

Mercapto-functional Silicones

PR

Mercapto-functional siloxanes strongly adsorb onto fibers and metal surfaces. High performance toner fluids for reprographic
applications are formulated from mercapto-fluids. As components in automotive polishes they are effective rust inhibitors. They act asinternal mold release agents for rubber and semi-permanent lubricants for automotive weather stripping. Mercapto-fluids are valuableadditives in cosmetic and hair care products. They also undergo radical initiated (including UV) addition to unsaturated resins.
Homopolymers are used as crosslinkers for vinylsiloxanes in rapid UV cure fiber optic coatings1 and soft lithography stamps.2
12

Mueller, U. et al. J. Macromol. Sci. Pure Appl. Chem. 1996, A43, 439.
Campos, L. et al. Chem. Mater. 2009, 21, 531.

Mercaptopropyl terminated PolyDimethylsiloxane
Code
DMS-SM21

Viscosity
80-120

Molecular
Weight
10000-

Specific
Gravity-

Refractive
Index-(Mercaptopropyl)Methylsiloxane - Dimethylsiloxane Copolymers
Code
SMS-022
SMS-042
SMS-142
SMS-992*

Viscosity
120-250
120-170
100-200
75-150*homopolymer, contains cyclics

524

Molecular
Weight6000-8000
6000-8000
3000-4000
4000-7000

Gelest, Inc.

Price/1kg-

CAS: [102783-03-9] TSCA

Mole % (MercaptoSpecificpropyl) MethylSiloxane Gravity
2-3
0.97
4-6
0.98
13 - 17
0.98
99-1000.97

www.AZmax.co.jp TEL: 03-5543-1630

Price/100g¥51,200

Refractive
Index
1.406
1.408
1.410
1.496

(215) 547-1015

Price/100g¥9,300¥9,300¥19,400¥35,300
www.gelest.com

Price/1kg¥40,900¥40,900¥117,300-

Enabling Your Technology

Polydimethylsiloxanes with Hydrolyzable Functionality

Polydimethylsiloxanes with hydrolyzable functionality react with water to produce silanol terminated fluids of equivalent or
higher degrees of polymerization. Polymers with this category of reactivity are almost never directly hydrolyzed. Chlorine anddimethylamine terminated fluids are usually employed in ordered chain extension and block polymer synthesis, particularly urethanes
and polycarbonates. Acetoxy and dimethylamine terminated fluids can also be used as unfilled bases for rapid cure RTVs.

Chlorine Terminated PolyDimethylsiloxanes
Viscosity
3-8
20-50
500-800

Specific
Gravity
1.00
0.99
0.99

CAS: [67923-13-1] TSCA
Price/100g¥19,400¥35,300¥28,400

Price/1kg¥110,000¥199,000¥175,000

O
O
F

Code
DMS-K05
DMS-K13
DMS-K26

Molecular
Weight425-650
2000-4000
15,000-20,000

Chlorine Terminated Nonafluorohexylmethylsiloxane –Dimethylsiloxane Copolymers
Code
FMS-K11

Molecular
Weight500-1000

Viscosity
5-15

Diacetoxymethyl Terminated PolyDimethylsiloxanes
Code
DMS-D33

Molecular
Weight36,000Viscosity
2000-4000

Dimethylamino Terminated PolyDimethylsiloxanes
Code
DMS-N05
DMS-N12
hazy liquids

Molecular
Weight450-600
1550-2000

Viscosity
3-8
15 - 30

Ethoxy Terminated PolyDimethylsiloxanes
Viscosity
5-10

PR

Code
DMS-XE11

Molecular
Weight
800-900

TriEthoxysilylethyl Terminated PolyDimethylsiloxanes
Code
DMS-XT11

Molecular
Weight
600-900

Viscosity
8-12

Methoxy Terminated PolyDimethylsiloxanes
Code
DMS-XM11

Molecular
Weight900-1000

Viscosity
5-12

Specific
Gravity
1.46

Specific
Gravity
0.99

Specific
Gravity
0.93
0.95

Specific
Gravity
0.94

Specific
Gravity
0.96

Specific
Gravity
0.94

CAS: [908858-79-7] TSCA-L

Price/25g¥25,200

CAS: [158465-54-4] TSCA

Price/100g¥20,400

Code
Viscosity
XMS-5025.2*
2-5*20% in isopropanol

Mole %
MethoxyMethylsiloxane
10-20

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

Specific
Gravity
0.83

Price/1kg

CAS: [67762-92-9] TSCA

Price/100g¥45,900¥40,600

Price/1kg-

CAS: [70851-25-1] TSCA

Price/100g¥11,900

Price/1kg¥61,600

CAS: [195158-81-7]
Price/100g¥11,900

Price/1kg¥61,600

CAS: [68951-97-3] TSCA
Price/100g¥11,100

MethoxyMethylsiloxane-Dimethylsiloxane copolymer
methoxy terminated with branch structure

Price/1kg¥74,000

Price/1kg¥55,800

CAS: [68440-84-6] TSCA
Price/100g¥11,400(215) 547-1015

Price/1kg¥70,000

www.gelest.com

525

Monodisperse Reactive Silicones via Anionic Living Polymerization
Monodisperse silicones offer certain advantages over standard telechelic silicones. They have a discrete molecularweight and no low molecular weight non-functional cyclic siloxanes that can migrate out of the fluid or materials
produced with them. Higher molecular weight vinyl functional materials can be used as base silicones for 2-part RTVs.

CH 3

CH 3

CH 3

CH 3 nCH 3

H2C CH Si

O Si

CH 3

O Si CH CH 2OOF

Monodisperse Vinyl Terminated PolydiMethylsiloxane
Code
DMS-Vm31
DMS-Vm35

Viscosity
1000
5000

Molecular
Weight28,00049,500

Wt% Vinyl
0.18-0.26
0.10-0.13

Specific
Gravity
0.97
0.97

Vinyl – Eq/kg
0.07-0.10
0.04-0.05

Monodisperse Hydride Terminated PolyDimethylsiloxane
Code
DMS-Hm15
DMS-Hm25

Molecular
Viscosity Weight50
3000-3500
500
17,200

Wt% H
0.07
0.01

Equivalent
Weight1,625
8,600

Refractive
Index
0.96
0.97

CH3

H2C

CH

Si

CH3

PR
Viscosity
40-60
150-250

Molecular
Weight2000-3000
10,000

H2 C

CH

O

O

CH3

Price/100g¥26,000¥26,000

Price/1kg¥161,000¥161,000

Si H

n CH3

Refractive
Index
1.404
1.403

Si

Price/3kg¥158,200¥158,200CH3

α-MonoVinyl-Ω-MonoHydride Terminated PolyDimethylsiloxane
Code
DMS-HV15DMS-HV22

Specific
Gravity
1.403
1.403

Price/100g¥24,700¥24,700

Specific
Gravity
0.96
0.97

CH3

CH3

Si O

Si

Price/100g¥43,200¥43,200

Price/1kg¥201,000¥201,000

H

CH3 n CH3

α-MonoVinyl-MonoPhenyl-Ω-MonoHydride-Terminated PolyDimethylsiloxane
Code
PMM-HV12

526

Viscosity
20

Molecular
Weight2000

www.AZmax.co.jp TEL: 03-5543-1630

Refractive
Index
1.4135

Gelest, Inc.

Specific
Gravity
0.97(215) 547-1015

Price/100g¥41,900

Price/1kg¥208,000

www.gelest.com

Enabling Your Technology

Macromers and Monofunctional Silicones
Macromers are relatively high molecular weight species with a single functional polymerizeable group which, although used asmonomers, have high enough molecular weight or internal monomer units to be considered polymers. A macromer has one end-groupwhich enables it to act as a monomer molecule, contributing only a single monomeric unit to a chain of the final macromolecule. The
term macromer is a contraction of the word macromonomer. Copolymerization of macromers with traditional monomers offers a routeto polymers that are usually associated with grafting. Macromers provide a mechanism for introducing pendant groups onto a polymer
backbone with conditions consistent with radical, condensation or step-growth polymerization but result in pendant groups that areusually associated with significantly different polymerization conditions and significantly different physical properties than the main
polymer chain. Siloxane macromers afford a mechanism for introducing a variety of desirable properties without disrupting the main
chain integrity of an organic polymer.

O
OF

Two general classes of siloxane macromers are available: asymmetric and symmetric. Asymmetric macromers have been the most widelyused, but symmetric monomers, which open a path for hyper-branched polymers, are anticipated to have increased commercial utilization.
Macromers are primarily defined by the functional group anticipated to be the reactive functionality in a polymerization. Other modifications
usually effect a greater degree of compatibility with the proposed bulk polymer. These include modifying or replacing the most widely usedsiloxane building block, dimethylsiloxane, with other siloxanes, typically trifluoropropylmethylsiloxane.

MonoAminopropyl Terminated PolyDimethylsiloxanes

MonoAminopropyl Terminated PolyDimethylsiloxanes are most widely used as intermediates for acrylamide functional macromers
or as terminating groups for polyamides and polyimides.

H2NCH 2CH2CH2

CH3

CH3

CH3

Si O

Si O Si C4H9 structure 1

CH3

CH3 n CH3

H2C

MonoAminopropyl Terminated PolyDimethylsiloxanes
asymmetricCH3CH3 - CH
3
Code
MCR-A11
MCR-A12

Viscosity
8-12
18-25

CHCH 2structure 2
Molecular
HORCH
O Si C4H9 Specific
2 Si O SiRefractive
WeightGravity
Price/100g
CH3
CH3Index
n CH3800-1000
1.411
0.92¥49,900
O
(CH
CH
O)
H
2000
1.411
0.97
¥48,500
H2C
2
2
n
CH3

(CH2)3 CH3PR

CH3 Si O Si O Si CH3
CH3

CH3

O(CH 2CH2O)nSi
CH3

CH3
structure 15

CH3

HOCH 2

CH3CH2CCH2OCH 2CH2CH2

CH3

CH3

Si O

Si O Si C4H9

CH3CH3 mCH3
CH3

HOCH 2
O

CH3

CH3

CH3

HOC(CH 2)10 Si O Si O Si C4H9
CH3

CH3

CH3

Si O

Si

CH3

CH3

n CH3

CH3

structure 4

structure 5

CH3 n CH3CH3O
H2C CHCH 2O(CH 2)3 Si O
CH3

C4H9

structure 6

CH3

H Si O Si O Si C4H9

structure 7

CH3
O

www.AZmax.co.jp TEL: 03-5543-1630

H2C

C C

CH3

CH3 n CH3
CH3
CH3
CH3

Gelest,Inc.
O(CHO Si O Si C4H92)3Si(215) 547-1015

CH3

CH3 n CH3O
CH2OCC

CH2

CH3

structure 14
Price/1kg
OCH3¥240,000
C¥222,000
C O(CH 2CH2O)nSi CH3
CH3

structure 3

CH3

structure8
www.gelest.com

527

CH3

CH3
H3C Si O

Si O

CH3

CH3

Si

O

CH3 n

m

CH3

ECMS-227

Si CH3p27

CH3

MonoCarbinol
O Terminated
CH3O
CH3PolyDimethylsiloxanes

DBL-C31

Monocarbinol terminated silicones are pigment dispersants and compatibilizers for a variety of resin systems including epoxies,
HO (CH2)5materials
C OhasRbeen likened
Si R forOnon-aqueous
C (CH2)5systems.
OH
Si Oto surfactants
p29
urethanes and silicones. The action of thesemm

CH3 n CH3

CH3
HOCH 2CH2OCH 2CH2CH2 Si O

CH3

Si

Si C4H9O

MCR-C12
p30

CH
CH3 3
CH33 n CH

+ p37

O
O
F

CHCH
3 3

CH3

H2NCH 2CH2CH2Si O

Si O Si C4H9 structure 1

O

CH
CH33

CH
CH3 3 n CHO
3

MonoCarbinol Terminated PolyDimethylsiloxanes - asymmetric

CH3

CAS: [207308-30-3] TSCA

Molecular
Refractive
Specific
DMS-B12
Code
Viscosity
WeightIndex
Price/100g
Price/1kg
H2C CHCH 2
HOC(CH 2)n Si O Si O Si Gravity(CH2)nCOH
MCR-C12
15-20
1000CH
1.409
0.96¥36,600¥144,500
CH
CH
3
3
3
CH
3 n CH 3 0.97
MCR-C1880-90
5000 CH 3
1.405¥24,900¥134,500
p33
structure
2 ¥116,000
O
Si
O
Si
C
H
HORCH
Si
MCR-C22
250
10000
1.404
0.98
¥23,300
2
4 9
Ohydroxyethoxypropyl terminatedCH
CH3 nCH
CH3
CH33
CH
O
3
3

O(CH 2CH2

CH2OCC CH2
Si O O Si (CHO SiCHCO)
H structure 1
H2C C C O(CH 2CH2O
2 43 9n H
CH2 2CH
CF
CF
CF
CH3
3
CH) 3 nCH
CH3 3
33 (CH
CHCH
CH3
3
2CH
3
3
2
CHH22C 3CHCH 2 O(CH 2CH2O)nSi CH3
CH2
CH2
CH2
structure
CH
Si
O
Si
O
Si
CH
MFS-M15
3
CH3
CH3
CH3
CH2
CH3
CH2
CH2 3
CH2
structure
2
CH
CH
CH
HORCH
Si O Si
Si3 O
CH3CH2CHO Si 3SiC4H9O 3 Si O
Si CH2CH2CH2CH3
structure 1
p39
2CH 2 2Si OCAS:[67674-67-3]
TSCA
MonoCarbinol Terminated Functional
PolyDimethylsiloxanes
symmetric
CH3CH
3 n CH
3 3
CH
CH
CH
CH
CH3
HOCH
3
CH33 n CH
CH33
CH3 O
2 3 nRefractive
Molecular
OCH 3 Specific
O (CH2CHCH
H Gravity
Code
WeightIndex
Price/1kg
H2CSi CHCC O(CHCH32O) CH
structure
4 nSi SSP-080
CH3Viscosity
CHCH
2CH 2O)SiO O Price/100g
Si O
C43H
3 3CH 2CCH 2OCH22n 2
9MCS-C11*
5-15
0.905¥14,100
CH3CH280-380(CH2)3 CH3 1.413 O
CH3
CH3C
Si O35-40
Si CH
C1.02 O CH
O
2HOCH
2CH 2
CH
CH
MCS-C13**550-650
1.446¥16,200
3 3
3 m
3¥82,300
structure
2
CH
O Si O Si CH3
p52 1
n p structure* n=0, CAS [17962-67-3]**n=6-9,
CAS[67674-67-3]
CH3 m
CH33 Si
CH3
O
CH3
CH3
CH3
CH3
CH3
CH3

PR

H2NCH 2CH2CH2
CF3

HOCH 2

HOC(CH 2)10 Si O Si O Si C4H9CH3CH3CH2CCH2OCH 2CH2CH2

CH3

CH3

Si O

CH

CH3 n3 CH3structure 4

Si O Si C4H9CH3CH3 CH 3CH3
CH
HOCH 2 O
m 3
H2C O CHCH 2O(CHCH 2)3CHSi OCH Si O
3

3

MonoDiCarbinol Terminated PolyDimethylsiloxanes - asymmetricstructure 5

3

CH3
Si

C4H9

structure 6

CAS: [218131-11-4] TSCA

HOC(CH 2)10 Si O Si CH
O 3 Si C4HCH
9 3

Code
MCR-C61
MCR-C62

Viscosity
50-60
100-125 O

CH3 5
nstructure
Refractive
Specific
Index
CHCH
CH3CH 3 Price/100g Price/1kg
3Gravity
3 3 CHCH
3 n
1.417
0.97
¥19,400¥133,200
C4H¥19,400
H CH
Si1.409O SiCH O0.97SiCH
structure
79¥133,200
3
3
3

CHSi 3 O n CH
Si3 C4H9 structure 6
O
CH3 CH3 CH3CHn3 CHCH
3 3
structure 8
www.AZmax.co.jp TEL: 03-5543-1630 CH
www.gelest.com(215)
547-1015
Inc.
CH
CH
H2C C C Gelest,
O(CH
)
Si
O
Si
O
Si
C
H
3
3
2 33
4 9
H2C

528

Molecular
Weight
1000
5000

CHCH 2O(CH 2)3 SiCHO3

C4HCH
9 3 nstructure
CH3 7
CHH3 Si O Si OCHSi
3
CH3
CH3 n CH3
O

PR

O
O
F

(CH2)Si
CH3Si O Si C H structure 1
CH3
CH3
3
3 O
H2NCHCH2CH 2CH 2
4 9structure
3
CH3 Si O Si O
CHstructure
CH3Si CHCH3 3 n CH3
3
CH3
CH3
CH3
H2C CHCH 2 O(CH 2CH2O)nSi CH3
CH3
CH3
CH3
Enabling Your Technology CH 3
HOCH 2
CH3
CH
CH23
3
structure
HORCH 2 Si O Si O Si C4H9
structure 1
CH3CH2CCH2OCH 2CH2CH2 Si O Si O Si C4H9 structure 4
CH
CH
CH
MonoCarboxy
Terminated3
3 n
3 PolyDimethylsiloxanes
O
CH3
CH
CH3
CH3
HOCH
3 surfactants.
2 esters. They also behave as
Carboxylic acid terminated silicones formm
O (CH2CH2O) n H
H2C C C O(CH 2CH2O)nSi CH3
O
CH3
CH3
CH3
CH3 (CH2)3 CH3
CH3
CH3
structure 5
HOC(CH 2)10 Si O Si O structure
Si C4H39
CH3 Si O Si O Si CH3
structure
CH3
CH3 n CH3
CH3
CH3
CH3
CH3 CHCH3
CH
CH3 3
CH3
3
MonoCarboxydecyl Terminated
PolyDimethylsiloxanes- asymmetric
O
HOCH
CH
CH
CH 1
2
3
3
structureHSi ) OSi SiRefractive
HSpecific
2CH 2CH
2
9
H22NCHC CHCHO(CHO O Si
Si C4O
Si 3C4H
structure 6
2Molecular23
9structure
4
CH
CH
Si
O
Si
O
Si
C
H
CH3
Code
Viscosity
WeightIndex
Gravity
Price/100g
Price/1kg
3CH 2CCH 2OCH
2CH
2
2
4
9
CH3 CHCH3 n CH
CH3 3 n CH33
MCR-B12
20
1500
1.415
¥51,200
CH3
CH30.94
HOCH 2
mCH3 H2C CHCH 2 O(CH 2CH2O)nSi CH3
CH3
CH3
CH3
CH3
CH3
CH
CH3
O
CH3 3 CH3
CH3
Si C4Hstructure
HO SiSi OO SiSi O
structure
7
2
MonoEpoxyTerminated
PolyDimethylsiloxanes
9
HORCH
Si
C
H
2
structure 14
structure 5
HOC(CH 2utilized)10 Si as modifiers
O 4 Si9 forO aliphatic
Si C4H
9 systems.
Monofunctional epoxy terminated silicones have been
epoxy
They have been used as thermal
CH
CH
CH
3
3
n
3
CH3
CHapplications.
3 n CH 3 They have also been acrylated to form UVO
stress reduction additives to epoxies employed in electronic
curable macromers. CH 3
CH3
CH n CH3
CH3 3 CHO
CH3
3
structure
O (CH2CH2O) n H
H2C 8 C C O(CH 2CH2O)nSi CH3
H2C C OC O(CH 2)3Si OCHSi
O CH
Si 3 C4H9 CH33
CH3 (CH2)3 CH3
CH3
CH3
H2CH
C 3 CHCH 2O(CHO 3 nSiCH
O
Si
CH
structure
3 C4H9 structure 62)33 Si CH
3
CH3 Si O Si O Si CH3
structure 1O 3 n CH3
CH3
CH
CH3
CH3
CH3
CH2
CAS:[1108731-31-2]/
CH3 CHCH
CH3
2OCC
3
Mono (2,3-Epoxy)Propylether Terminated PolyDimethylsiloxanes - asymmetric[127947-26-6] TSCA
CH
HOCH 2 H Si O Si CH
CH
OCH
H9Specificstructure
7
2 C4CH
3Si
33
3
Molecular
Refractive
structurePrice/1kg
4
CH
OCH
CHCH
CH
SiCH
O 3 Si C4H
CH
CodeViscosity
Gravity
Price/100g
CH
3CH 2CCH 2CH
2CH
9 3
3Weight
2 3 Si CH
32 3 2CH 3IndexnO
MCR-E11 CH CH CH
10-15CHO Si O1000Si
1.410
0.96O 3 Si¥27,300¥168,700
structure 9
CH3Si
Si 33 OCH
CH2CH2CHCH
CH3O CH
3 mCH
32 HOCH2
22
2CH 3
MCR-E21
120
5000
1.408
0.97
¥26,000¥140,900
structure 8CH
CH3CH
O3 2)3SiCH
H2C C C CH
O(CHO n3 SiCH
O3 3 Si CH
C43H39 n CH3
Mono (2,3-Epoxy)Propylether Functional PolyDimethylsiloxanes - symmetricstructure 5
Si3 nOCH
Si3 C4H9CH3 HOC(CH 2)CH
10 3Si OCH
Molecular
Refractive
Specific
CH3
CH3O CH CH3
CH
CodeViscosity
Weight CH
Price/100g Price/1kg
3 Index
3 n Gravity
3
10
H2C800-900
CH Si O 1.398
Si2OCCO
Si 2 C4H9 ¥40,600structure
CH
CH
MCS-E1545-55
1.09¥215,000
CH
CH
CH
3
3
3
O
CH
CH3
CH
CH
n 3CH32 3
H2C CHCH 2O(CH 2)3 Si OPolyDimethylsiloxanes
Si O
Si C4H9 structure 6
MonoHydrideTerminated
CH
CH
CH3
CH
CH
3
3
2
3 hydrosilylation.
Hydride functional macromer can be derivatized or reactedCHwith a varietyof olefins
They are also modifiers for
CH
CH
n by
3
3
3
structure 9
platinum-cure silicone elastomers.
CH3CH2CH2CH2 Si O Si O
Si O
Si O
Si CH2CH2CH2CH3
CH3
CH3
CH3
CH3
CH3 n CH3
CH3 n CH3
H Si O Si
O Si C4H9
structure 7
CH3

CH
CH3
CH3
CH3 3 n CH
3
O
CH3
CH3
CH3
MonoHydride Terminated PolyDimethylsiloxanes
CAS:[1038821-58-7]
10
8structureTSCA
H2C CH Si -Oasymmetric
Si O
Si Cstructure
4H 9
H2C C C O(CH
ORefractive
Si O Si Specific
C4H9
2)3Si
MolecularCH
CH3 n CH3
Code
Viscosity
WeightCH 3 Index
CH3
CH3 n CH3Gravity Price/100g Price/1kg
3
MCR-H075-8
800-900
1.404¥40,600¥210,000
O 0.96
MCR-H11
MCR-H218-12
80-120900-1100
4500-5000

CH3
www.AZmax.co.jp TEL: 03-5543-1630
CH3CH2CH2CH2 Si O
CH3

1.407
0.96
CH2OCC 0.96
CH2
1.411
CH2 CH3CH3
CH2Gelest,
Inc.

Si O

Si

CH3 n CH3

¥32,600¥32,600

3(215)CH
547-1015

O

Si
CH3

O

¥195,100¥195,100

CH
www.gelest.com
3
Si CH2CH2CH2CH3

n CH3

529

structure 9

Polar Endcapped Symmetric Macromers
Macromers with polar terminations can be used as additives into more polar organic resins to add silicone characteristics with
reduced likelihood of phase separation.

O

CH3

C

C

CH3

(CH2)3

Si

Si

O

CH2

CH3
(CH2)3OCH3

O Si

O
O
F

CH3O(CH2)3

O

CH3

n CH3

CH3 n

MonoMethacryloxypropyl Functional PolyDimethylsiloxanes, methoxypropyl terminated - symmetric
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/100g Price/1kg
MCS-MX11
8-12
1000
0.96
¥59,100-

CH2

CH3O(CH2CH2O)2(CH2)3

CH3

CH

Si

Si

O

CH3

CH3

(CH2)3(OCH2CH2)2OCH3

O Si

n CH3

CH3 n

PR

MonoVinyl Functional PolyDimethylsiloxanes, methoxy(diethyleneoxide)propyl terminated - symmetric
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/100g Price/1kg
MCS-VX15
40-60
5000
0.96
¥59,100-

530

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

CH3(CH2)3 CH3CH3 Si O Si O Si CH3
H2NCH 2CH2CH2

CH

CH3

Si O

Si O Si C4H9 structure 1

CH33

CH3

CH3CH2CCH2OCH 2CH2CH2
CH3

CH3

CH3

Si O

structure
H2CO CHCHSi
Si C24H9O(CH2CH 2O)4nSi

CH3 n CH3

3

CH3

structure 15

CH3

CH3

HOCH
CH2

CH3

CH3

structure 3

CH3

CH3

CH3 Your Technology
Enabling

MonoMethacrylateTerminated
PolyDimethylsiloxanes
CH3 2 CH3
CH
HOCH 2structure
m 3

CH3

CH3

HORCH 2 Si O Si O Si C4H9

structure 14

1
The most widely employed silicone macromers are methacrylatefunctional.
CH3
CHApplications
CH3 have been reported for hair spray , contact
3
CH4 3
CH3 nOCH3
2
3
OCH
lens , pigment dispersion and adhesive release . The materials copolymerize smoothly with other acrylatemonomers as
3
structureand
5 styrenic
HOC(CH ) Si O Si O Si C4H9O (CH2CH2O)2n10H
indicated by their reactivity ratios.
H2C C C O(CH 2CH2O)nSi CH3

CH

CH

CH

3
3 n
3
1. US Pats 5166276, 5480634; 2. JP-A-230115/90, US
3. US
CHPat
(CH2)3 CHCH3
3 6,943,203;
3 Pat 6,991,884; 4. US Pat 4,728,571 CH 3
structureof
3 Macromers in Polar Monomers
Reactivity Ratios
Solubility
CH3 Si O SiO O Si CH3
CH3
CH3
CH3
structure 15

O
OF

Monomers
Solubility(wt%) inSolubility (wt%) in
CHr1:r2*
CH2O(CHSi O
Si C4H9 structure 6
3H 2CCHCHCH
332)3 Si O
MCR-M11:methylmethacrylate
nm**:1.60
Macromer
Dimethylacrylamide Hydroxyethylmethacrylate
CH
n CH
3
HOCH
CH3 MCR-M11
CH33
CHCH
2
MCR-M22:methylmethacrylate
nm**:2.10
43
1
3
CH
CH
CH
structure
43
3
3
MCR-M11:styrene
0.26:1.07
MCS-M118
2
CH3CH2CCH2OCH 2CH2CH2 Si O Si O Si C4H9
MCR-M11:acrylonitrile
2
SiCH3O Si
H Si
structure 7
CH3OMFR-M15
CHC H100 (miscible)
HOCH 5.4:0.89
2
m 34 9*M1M1°/M1M2°:M2M2°/M2M1°; **no meaningful results
CH
CH
CH
O

CH3

3 3n
CH

3 3
CH

3

CH3 Si CH
HOC(CHOC4H
392)10 Si O Si O

H2C

CH3structure 5
structure 8
C C O(CHSi 3 On CH
Si3 O Si C4H9
CH3 2)3CHCH3
3 3 CH 3CHn3 CH 3
CH3 CHCHOO
H2C CHCH 2O(CH 2)3 Si O
Si O
Si C4H9

structure 6
MonoMethacryloxypropyl Terminated PolyDimethylsiloxanesCH- asymmetric
CAS: [146632-07-7] TSCAOCC CHCH3

Code

MCR-M07
MCR-M11
MCR-M17
MCR-M22
inhibited with BHT

Viscosity

Molecular
CH3
CH3
WeightCH3

n CH2 3

Refractive CH Specific
CH3
2
CH3
Index
Gravity

Si 3 O SiCHC34H9
H Si O CH

2

CH
CHstructure
7 3
2Price/100g
CH3

Price/1kg

6-9
600-800
1.416
0.96¥36,600¥202,000
CH3CH2CH2CH32 SiCHO
Si 3 OSi O
Si O
Si CH CH CH2CH3CH
10
800-1000 3 n 1.411
0.96¥23,3002 2 ¥131,900
O
CH
CH
CH
CH3
CH3 n ¥27,300
3 3n CH 3 structure
70-80
5000 3CH3 3 CH
1.406
0.97
¥160,800
8
H
C
C
C
O(CH
)
Si
O
Si
O
Si
C
H
2
2
3
4
9
150-200
10000
1.405
0.97
¥27,300¥160,800
CH
CH3 nCH33
H C CH Si O O

CH3

CH3

2

CH3

CH3

Si O

Si C4H9

CH2OCC CH2
CH3
CH3
CH3
CH

structure 9

structure 10

n CH3

2

CH3

CH3

CH2

CH3CH2CH2CH2 Si O

Si O

Si

O

CH3 n CH3

Si

CH3

CH3

O

Si CH2CH2CH2CH3

MonoMethacryloxypropyl Functional PolyDimethylsiloxanes- symmetric
CH
CH3
CH3
3
structure 10
HMolecular
CH
Si
C
O
Si
O
Si
C4H
Refractive
Specific
2
9
Code
Viscosity
WeightCH3
Index
Price/100g
CH
n CH3 Gravity
3
MCS-M117-9
800-1000
1.417
0.93¥20,700
inhibited with BHT

MonoMethacryloxypropyl Terminated PolyDimethylsiloxanes - asymmetric
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/100g
MFR-M1550-70
800-1000
1.398
1.09¥61,800
inhibited with BHT
MonoMethacryloxypropyl Terminated PolyTrifluoropropylMethylsiloxanes - symmetric
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/100g
MFS-M1540-60
800-1000
1.398
1.09¥51,200
inhibited with BHT
www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

structure 9

n CH3

PR

CH3

CH3

(215) 547-1015

TSCA
Price/1kg¥118,600

Price/1kg-

Price/1kg-

www.gelest.com

531

O
CH2OCC CH2
CH3
CH
2

CH3

CH3

CH2

CH3CH2CH2CH2 Si O

Si O

Si

CH3
O

Si

CH3
O

structure 9

Si CH2CH2CH2CH3

MonoVinylTerminated PolyDimethylsiloxanes
CH3

CH3

CH3 n CH3n CH3

Monovinyl functional siloxanes are utilized to control modulus and tack in silicone gels, elastomers and coatings.

CH3

CH3

CH3

H2C CH Si O

Si O

Si C4H9

CH3

CH3

n CH3

Specific
Gravity
0.97
0.98

O
O
F

MonoVinyl Terminated PolyDimethylsiloxanes - asymmetric
Molecular
Refractive
Code
Viscosity
WeightIndex
MCR-V2180-1205500-6500
1.403
MCR-V41
8000-12000
55000-65000
1.404
MonoVinyl Functional PolyDimethylsiloxanes - symmetric
Molecular
Refractive
Code
Viscosity
WeightIndex
MCS-V21216-24
1200-1400
1.419

H 2CH2CH2

structure 10

CH3

CH3

CH3

CH3 n CH3

Price/100g¥32,600¥59,100

Price/1kg¥175,500¥238,000

TSCA

Specific
Gravity
0.97

Price/100g¥32,600

Price/1kg¥152,700

Silylated Organic Macromers

CH3Silylated macromers provide a route to incorporation of polar monomers into mixtures of non-polar monomers. Subsequent to1polymerization,group is removedby hydrolysis.
Si O Si Othe trimethylsilyl
Si C4H9 structure

CH3

PR

H2C CHCH 2 O(CH 2CH2O)nSi CH3
CH3
CH3
CH3
CH3
CH3
CH3
CH3
structure
CH2CH2 Si O Si O Si C4H9structure
2 1
H 2 Si O Si O Si C4H9
structure 14
CH
MonoAllyl-Mono
Trimethylsiloxy Terminated Polyethylene Oxide- asymmetric
CH3CH
3
3 n CH 3
CH3
CH3 n CH
3
CHCH
MolecularO O(CH
Refractive
Specific3
H2C CHCH2
2CH 2O) nSi
3
CodeViscosity
WeightIndex
Gravity
Price/25g Price/100g
O 3 (CHCH
CH3CH
H2C C C O(CH 2CH2O)CH
Si
CH
2CH
3 2O) n H3
n 3
SIA0479.0 structure20-25
500
1.456
1.04
¥13,000¥34,500
2
CH3O (CH
)3 Si
CHC
Si 2O
CH
CH3
3 4H 92 Si
3structure
14
structure 3
Si
CH3O Si
CH3O n Si
CHCH
3 3
O
CH3 structure 15
CH3 O CH
CHO)
3 CH
3
(CH
H2C C C O(CH 2CH2O)nSi CH3
2
2
n H
CH
CH3
CH3
OCH
3 2 (CH 2)3 CH 3
CH3
CH3
CH3
structure3
i O Si O Si CH
Si O Si C4H9 structure 4
structure 15
2CCH 2OCH 2CH 2CH 2 3 Si O
MonoMethacryloxy-Mono Trimethylsiloxy Terminated Polyethylene Oxide - asymmetric
CH3
CH3
CH3
CH3
CH3 mCH3
OCH
2
Molecular
Refractive
Specific
CodeViscosity
WeightIndex
Gravity
Price/25g Price/100g
O
CHCH
H2
3 3 CH 3CH 3CH 3CH 3
SIM6485.9

-

400

-

structure 54
HOC(CH)102 Si SiO OSi Si
O Si
CH2OCH
O C
Si4HC
9 4H 92CH 22CHCHCH
3 3 CH 3CHn3CH 3CH 3
H2m
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532
CH3
CH3CH3 CH3 CH
CH
33
O O
CHCH 2O(CH)3 Si
HOC(CHO O
Si O SiSi OC4H9Si
2)10 2Si
CH3CH3 CH3 CH
3 3 n CH 3n CH

5
C4structure
H9 structure
61.02(215) 547-1015¥28,900

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Enabling Your Technology

Reactive Silicone Emulsions
Emulsions of reactive silicones are playing an increasing role in formulation technology for water-borne systems. Primary
applications for silicone emulsions are in textile finishes, release coatings and automotive polishes. Silanol fluids are stable under neutral
conditions and have non-ionic emulsifiers. Aminoalkylalkoxysiloxanes are offered with cationic emulsifiers.

Reactive Silicone Emulsions
emulsifier content: 3-6%

Code

TSCA

silicone classbase fluid
viscosity

wt% solids

silanol

3500

Price/18kg

50

nonionic¥6,100¥36,900¥99,000

50

cationic¥6,100¥37,000¥104,000OOF

DMS-S33M50

emulsiontype
Price/100 g Price/3kg

ATM-1322M50* diamino/alkoxy
200-300*0.45mEq/g combined primary and secondary amine

Water-borne Silsesquioxane Oligomers

H2N

H2C
H2C

+
NH 2δ

CH2

Si

H δ−
O

OH

O

H2C

CH2

CH2
Si
O
OH

CH3

Si

m OH

+
NH 2δ

δ− H
O

CH2

Si

O

n

OH

CH2
CH2

H2 N
H2 C

CH2

NH

H2 C

H2 C

H2 C

CH2

HN

δ+

Si

H −
δ
O

OH

H2 C

NH 2

H2 N

CH2

H2 C

CH2

H

CH2
Si
O

O

Si

O

Si

m OH

OH

δ−
O

CH3

n

OH

CH2

NH δ
CH2
+

CH2
CH2

PR

Water-borne silsesquioxane oligomers act as primers for metals, additives for acrylic latex sealants and as coupling agents forsiliceous surfaces.1 They offer both organic group and silanol functionality. These amphoteric materials are stable in water solutions
and, unlike conventional coupling agents, have very low VOCs.

Water-borne Silsesquioxane Oligomers
CodeFunctionalGroup

Molecular Weight % SpecificMole % Weight in solution Gravity Viscosity

WSA-7011*
Aminopropyl
65-75
WSA-9911**
Aminopropyl
100
WSA-7021
Aminoethylaminopropyl
65-75
WSAV-6511‡
Aminopropyl, vinyl
60-65
WSAF-1511 Aminopropyl, fluoroalkyl
15-20*CAS[1411854-75-5] **[29159-37-3] ‡[207308-27-8]
1

250-500
270-550
370-650250-500
—

19-21
21-26
23-27
15-20
15-20

1.10
1.06
1.10
1.11
1.06

5-15
5-15
5-10
3-10
1-5

TSCA
pH

10-10.5
10-10.5
10-11
10-11
3-5

Price/100g Price/3kg¥7,200¥8,500¥11,100¥12,700¥15,400¥107,000¥87,000¥127,000¥139,000¥172,000

Arkles, B. in “Silanes & Other Coupling Agents”, Mittal, K. L. Ed. 1992, p91, Utrecht.

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533

O

R

R

O

O

M

M

O

O

R

O

O

R

O
O
F

Polymeric Metal Alkoxides

Polymeric metal alkoxides fall into two main classes: oxo-bridged, which can be regarded as partially hydrolyzed metal alkoxides,
and alkoxide bridged which can be regarded as organo diester alkoxides. Both classes have the advantages of high metal content andlow volatility.
Polymeric metal alkoxides are used primarily as curing agents for 2-part RTVs and in the preparation of binders and coatings
including investment casting resins and zinc-rich paints. The latter appplications can be considered as special examples of Sol-Geltechnology. Sol-Gel is a method for preparing specialty metal oxide glasses and ceramics by hydrolyzing a chemical precursor or mixtureof chemical precursors that pass sequentially through a solution state and a gel state before being dehydrated to a glass or ceramic.

Sol-Gel Process Technology and Chemistry

Preparation of metal oxides by the sol-gel route proceeds through three basic steps: 1) partial hydrolysis of metal alkoxides to form
reactive monomers; 2) the polycondensation of these monomers to form colloid-like oligomers (sol formation); 3) additional hydrolysis
to promote polymerization and cross-linking leading to a 3-dimensional matrix (gel formation). Although presented sequentially, thesereactions occur simultaneously after the initial processing stage.

PR

MONOMER FORMATION (PARTIAL HYDROLYSIS)SOL FORMATION (POLYCONDENSATION)

534

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Enabling Your Technology

O
O
F

Gelation (Cross-Linking)PR

As polymerization and cross-linking progress, the viscosity of the sol gradually increases until the sol-gel transition point is reached.
At this point the viscosity abruptly increases and gelation occurs. Further increases in cross-linking are promoted by drying and otherdehydration methods. Maximum density is achieved in a process called densification in which the isolated gel is heated above its glasstransition temperature. The densification rate and transition (sintering) temperature are influenced primarily by the morphology andcomposition of the gel.

REFERENCES:METAL ALKOXIDES AND DIKETONATES
Bradley, D. C.; Mehrotra, R. C.; Gaur, D. P. Metal Alkoxides, Acadmeic Press, 1978.
Mehrotra, R. C.; Bohra, R.; Gaur, D. P. “Metal Diketonates and Allied Derivatives” Academic Press, 1978.

SOL-GEL TECHNOLOGY
Brinker, C. J.; Scherer, G. W. Sol-Gel Science, Academic Press, 1990.
Brinker, C. J.; Clark, D. E.; Ulrich, D. R. Better Ceramics Through Chemistry, (Materials Research Society Proceedings 32), Elsevier, 1984.
Brinker, C. J.; Clark, D. E.; Ulrich, D. R. Better Ceramics Through Chemistry II, III, IV (IV add’l ed. B. J. Zelinski) (Materials Research Society
Proceedings 73, 121, 180) Mat’l. Res. Soc., 1984, 1988, 1990.
Hench, L. L.; Ulrich, D. R. Ultrastructure Processing of Ceramics, Glasses and Composites, Wiley, 1984.
Hench, L. L.; Ulrich, D. R. Science of Ceramid Processing, Wiley, 1986.
Klein, L. C. Sol-Gel Technology for Thin Fillms, Fibers, Preforms, and Electronics, Noyes, 1988.

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535

Polymeric Metal Alkoxides
namemetal content

PSI-021
Poly(DIETHOXYSILOXANE)
20.5-21.5% Si(40-42% SiO2 equivalent)[(C2H5O)2SiO]
crosslinker for two-component condensation cure (silanol) RTVs.
[68412-37-3] TSCA
23.0-23.5% Si(48-52% SiO2 equivalent)viscosity, cSt

density134.203-5

1.05-1.07

100g / ¥6,100

2kg / ¥24,600

134.2020-35

1.12-1.15

106.156-9

1.14-1.16

100g / ¥11,900500g / ¥38,500

O
O
F

PSI-023
Poly(DIETHOXYSILOXANE)[(C2H5O)2SiO]
base for zinc-rich paints[68412-37-3] TSCA

unit M.W.

100g / ¥7,700

PSI-026
Poly(DIMETHOXYSILOXANE)
26.0-27.0% Si[(CH3O)2SiO]
highest SiO2 content precursor for sol-gel[25498-02-6] TSCA

PSIAL-007
DIETHOXYSILOXANE -s-BUTYLALUMINATE copolymer
sol-gel intermediate for aluminum silicates.1
1. J. Boilot in “Better Ceramics Through Chemistry III, p121
[68959-06-8] TSCA
PSITI-019
DIETHOXYSILOXANE - ETHYLTITANATE copolymer[(C2H5O)2SiO][(C2H5O)2TiO]
employed in formation of titania-silica aerogels.1
1. Miller, J.; et al. J. Mater. Chem. 1995, 5, 1795.

PR

PSIPO-019
DIETHOXYSILOXANE - ETHYLPHOSPHATE copolymer
hygroscopic[(C2H5O)2SiO][(C2H5O)OPO][51960-53-3]
PAN-040
Poly(ANTIMONY ETHYLENE
GLYCOXIDE)[C6H12O6Sb2] [29736-75-2] TSCA

39.8-40.4% Sb
catalyst for transesterification

PTI-023
Poly(DIBUTYLTITANATE)[(C4H9O)2TiO][9022-96-2] TSCA

22.0-23.0% Ti
stabilized with ~5% ethylene glycol

7.5-8.5%Al
6.6-7.6% Si

0.90-1.00

100g / ¥24,100500g / ¥87,300

19.1-19.6% Si
2.1-2.3% Ti

10-25

25g / ¥14,100

100g / ¥37,900

19.1-19.6% Si
1.4-1.5% P
25g / ¥14,100

8-12
R.I.: 1.400
100g / ¥37,900

303.55solid

25g / ¥9,000

100g / ¥19,000

210.103200-3500

100g / inquire

500g / inquire

PTI-008
Poly(OCTYLENEGLYCOL7.5-7.6% Ti
482.54
1700
TITANATE)
contains ~5% free 2-ethyl-1,3-hexanediol, oligomeric
flashpoint: 50°C(122°F)[OCH2CHEt(CH2)4OTi(CH2CHEt(CH2)4OH)2]n[5575-43-9]
25g / inquire
100g / inquire536

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1.09-1.11

1.07-1.10

1.035

Enabling Your Technology

PolySilsesquioxanes and T-Resins
RSiO1.5
PolySilsesquioxanes and T-resins are highly crosslinked materials with the empirical formula RSiO . They are named from theorganic group and a one and a half (sesqui) stoichiometry of oxygen bound to silicon. T-resin, an alternate designation, indicates that
there are three (Tri-substituted) oxygens substituting the silicon. Both designations simplify the complex structures that have now
come to be associated with these polymers. A variety of paradigms have been associated with the structure of these resins ranging from
amorphous to cubes containing eight silicon atoms, sometimes designated as T8 structures. Ladder structures have been attributed tothese resins, but the current understanding is that in most cases these are hypothetical rather than actual structures.

O
O
F

1.5

Amorphous

T8 cubeHypothetical Ladder

Polysilsesquioxanes are used as matrix resins for molding compounds, catalyst supports and coating resins. As dielectric,planarization and reactive ion etch resistant layers, they find application in microelectronics. As abrasion resistant coatings they protect
plastic glazing and optics. As preceramic coatings they convert to silicon dioxide, silicon oxycarbide, and silicon carbide depending on
the oxidizing conditions for the high temperature thermal conversion.

PR

Polysilsesquioxane resins containing silanols (hydroxyls) can be cured at elevated temperatures. Formulation and catalysis is
generally performed at room-temperature or below. At temperatures above 40°C most resins soften and become tacky, becoming
viscous liquids by 120°C. The condensation of silanols leads to cure and the resins become tough binders or films. The cure is usually
accelerated by the addition of 0.1-0.5% of a catalyst such as dibutyltindiacetate, zinc acetate or zinc 2-ethylhexanoate. The resins can also
be dispersed insolvents such as methylethylketone for coating applications.

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Polymeric Q resins with cage structure(according to Wengrovius)

see Vinyl, Silanol & Hydride Q Resins

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537

polySilsesquioxanes Liquid T-Resins
Viscosity
M.W.
Refractive(cSt)(approximate) Index

Name

SLT-3A101

poly(Methylsilsesquioxane)[181186-37-8] TSCA

SLT-3A302

poly(Propylsilsesquioxane)[314270-00-3] TSCA

SLT-3A802

poly(Octylsilsesquioxane)
400-600
1000-1800[1385031-14-0] TSCA-L
ethoxy terminatedSpecific
Gravity

Price/100g

Price/1kg

20-30
700-1100
1.402
1.143
methoxy terminated (alkoxy wgt% 25-30)¥10,300-

25-40
ethoxy terminated

1.424

1.035

¥9,800

-

1.454

0.979

¥16,200

-

O
O
F

Code

These materials are oligomeric alkoxysilane hydrolyzates and are the basis of coating resins.

polySilsesquioxanes Solid T-Resins

M.W.
(approximate)% (OH)

Refractive
Index

Specific
Gravity

Price/100g

Price/1kg

7000-8000

4.0-6.0

1.42-¥20,400¥108,000

2.5-4.0-

1.08¥19,400¥102,000

SST-3MH1.1

poly(Methyl-Hydridosilsesquioxane)
90% Methyl, 10% Hydride
10 wt% sol’n in methyltetrahydrofuran 0.91

¥19,400-

SST-3P01

poly(Phenylsilsesquioxane)
100% Phenyl[70131-69-0] TSCA

SST-3PM1

poly(Phenyl-Methylsilsesquioxane)
90% Phenyl, 10% Methyl[181186-29-8]

Name

SST-3M01

poly(Methylsilsesquioxane)
100% Methyl[68554-70-1] TSCA

SST-3M02

poly(Methylsilsesquioxane)
100% Methyl[68554-70-1] TSCA

1200-1600

PR

Code

4.5-6.5

1.56¥22,500¥135,000-

1.55¥19,400¥118,000¥15,100¥89,000

SST-3PM2(Phenylsilsesquioxane)-(Dimethylsiloxane) copolymer
70% Phenyl, 30% DiMethyl
3.0-5.0[73138-88-2] TSCA

SST-3PM4(40% Phenyl- 45% Methylsilsesquioxane)-(5% Phenylmethylsiloxane) (10% Diphenylsiloxane) tetrapolymer
85% Silsesquioxane, 15% Siloxane
2.0-3.0
1.08¥19,400¥118,000[181186-36-7] TSCA 1400-1600

SST-3PP1poly(Phenyl-Propylsilsesquioxane)
70% Phenyl, 30% Propyl 1500-1800
3.5-5.5[68037-90-1] TSCA (equivalent weight: 400)

SST-3PV1poly(Phenyl-Vinylsilsesquioxane)
90% Phenyl, 10% Vinyl
1000-1300

SST-3Q01

poly[(Octadecyldimethylammoniumchloride)propylsilsesquioxane][1353244-79-7]
water soluble

SST-3R01

poly(Methacryloxypropylsilsesquioxane)
1000-3000

-

-

-

1.08

1.54

1.25

¥8,500¥37,000--¥26,300--¥24,700--¥51,200--

Water - borne silsesquioxanes- see p. 533
538

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Enabling Your Technology

Thermally & UV Labile Polysilsesquioxanes
Silsesquioxanes containing -electron withdrawing groups can be converted to silicon dioxide via elimination and hydrolysis
at low temperatures or under UV exposure.1 The thermal reaction cascade for -substituted silsesquioxanes leading to SiO2-rich
structures with a low level of carbon occurs at temperatures above 180°.2
O

O

O

CH3CO
UV or ∆ Bu 4N +F Si

CH3CCH2CH2

CH3COCH 2CH2
Si

O

Si

O OH

- CH 2=CH 2, HOAc

O
O

CH3CO

CH3CO

CH3CO
O

Si

O OH

O
O

O
O
F

O

O

Si
O

O

-HOAc

Si

O

Si
O

O

O

O

O
O OCCH 3SiOO

H 2O, ∆

Si

-HOAc

O

O

O

Si

O

Si

O

O O
Si

O

O

O

O

UV exposure results in pure SiO2 films and suggests that patterning -substituted silsesquioxane films can lead to direct fabricationof dielectric architectures.
1. Arkles, B.; Berry, D.; Figge, L.; J. Sol-Gel Sci. & Technol. 1997, 8, 465.
2. Ezbiansky, K. et al, Mater. Res. Soc. Proc., 2001, 606, 251.

Thermally & UV labile polysilsesquioxanes

M.W.
(approximate)

SST-BAE1.2

poly(2-Acetoxyethylsilsesquioxane)
converts to SiO2 >350°C

SST-BCE1.2

poly(2-Chloroethylsilsesquioxane)
converts to SiO2 >300°C
800-1400PR-

SST-BBE1.2

poly(2-Bromoethylsilsesquioxane)
1200-2000
converts to SiO2 by UV% (OH)

Price/100g-

18-20% sol’n in methoxypropano

CAS: [349656-50-4] TSCA
¥25,700

3.0-5.5

14-16% sol’n in methoxypropanol

CAS: [188969-12-2]¥24,100

2.0-4.0

14-16% sol’n in methoxypropanol¥32,600

2-Acetoxyethylsilsesquioxane
TGA/MS with 5% Bu4N+F -www.AZmax.co.jp TEL: 03-5543-1630

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539

Specialty polysilsesquioxanes

O
O
F

Specialty polysilsesquioxanes can be utilized as models and precursors for silica surfaces andzeolites. If a silicon is removed from a T8 cube, the open position of the remaining T7 cube can besubstituted with catalytically active metals .1 T7 cubes can be converted to functionalized T8 cubes.
Functionalized T8 cubes are sometimes designated POSS (polyhedral oligomeric silsesquioxane)
monomers. Methacrylate T8 cubes can be copolymerized with a variety of monomers to form
homopolymers and copolymers. The polymers may be viewed structurally as nanocomposites or
hybrid inorganic-organic polymers. The cube structures impart excellent mechanical properties
and high oxygen permeability .2 Hydride substituted T8 cubes can be introduced into vinyl-addition
silicone rubbers.3 T8 cubes in which all silicon atoms are substituted with hydrogen have demonstrated
utility as flowable oxide precursors in microelectronics.
Feher, F.; et al, J. Am. Chem. Soc., 1989, 111, 1741.
Lichtenhan, J.; et al, Macromolecules, 1995, 28, 8435.
3
Lichtenhan, J.; Comments Inorg. Chem. 1995, 17, 115.
1
2

Specialty polySilsesquioxanes
Code

Name

POSS materials
SST-A8C42

SST-R8C42

Solubility

Price/10g

Allyl substituted poly(Isobutylsilsesquioxane)
T8 cube with single substitution, employed in epoxy nanocomposites
851.55
THF, hexane¥22,500

Methacryloxypropyl substituted poly(Isobutylsilsesquioxane)
T8 cube with single substitution with polymerizeable functionality[307531-94-8]
943.64
THF, hexane¥28,900

poly(Hydridosilsesquioxane) - polymeric T8 with all silicons hydride substituted
T8 cube [137125-44-1]
3000-5000 17-20% hazy solution in methylisobutylketone; density 0.88

¥60,500

PR

SST-H8H01

M.W.
(approximate)

SST-H8HS8poly(Hydridosilsesquioxane) - T8 with all silicons dimethylsiloxy (HSiMe2O) substituted
T8 cube [125756-69-6]
1017.98
see also HQM-107 p.16.

¥36,900

SST-V8V01

poly(Vinylsilsesquioxane) - T8 with all silicons vinyl substituted
T8 cube [69655-76-1]
633.04¥75,600

540

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Enabling Your Technology

R

Polysilazanes and Polysilanes
polySILAZANES -(Si-N)-

Si

N

CH3

R’ n

Polysilazanes are preceramic polymers primarily utilized for the preparation of silicon nitride for thermal shock resistantrefractories and dielectric coatings for microelectronics.1
PSN-2H01.2
poly(PERHYDROSILAZANE) telomer[176948-80-4]

10wt% in heptanes

O
O
F

PSN-2M01
poly(1,1-DIMETHYLSILAZANE) telomer[89535-60-4] Tg: -82° >50 cSt. M.W.: 500-900

10g / ¥51,200

PSN-2M02
poly(1,1-DIMETHYLSILAZANE) crosslinked>1000 cSt.

D 20: 1.04

10g / ¥37,900

4% char, 700°: 15-20%

PSN-2M11poly(1,2-DIMETHYLSILAZANE)
100-300 cSt.

10g / ¥47,200

D 20: 0.99

10g / ¥49,900

4

1. Kroke, E. et al, Material Science and Engineering Reports, 2000, 26, 97.

R

Si

R’ n

polySILANES -(Si-Si)-

Polysilanes have applications as preceramic polymers and photolabile coatings. Applications for polysilanes with methyl
and phenyl group substitution are usually limited to silicon carbide precursors.
solid

1.0g / ¥51,200

PSS-1H01
poly(DIHEXYLSILANE)[207925-46-0]

solid

1.0g / ¥27,300

PSS-1K02
poly(PERCHLOROSILANE) oligomer
4 or more silicon atoms

solid

10g / ¥61,800

PR

PSS-1C01
poly(DICYCLOHEXYLSILANE)

PSS-1M01
poly(DIMETHYLSILANE) MW 1000-3000
DP: 25-50
Flashpoint: 103° Tm: 250-270° (substantial degradation before mp)
Solid state source for volatile siliconcarbonitride (SiCN) precursors utilized in passivation of silicon-based photovoltaics
Employed in CVD of silicon carbonitride films.1
1. Scarlete, M.; et al; US Patent 7,396,563; 2008 (Label Licensed Gelest Product)
2. Yajima, S. et al. J. Mater. Sci. 1978, 13, 2569.
[30107-43-8] / [28883-63-8] TSCA
10g / ¥13,000
100g / ¥33,900
PSS-1P01(50% DIMETHYLSILANE)(50% PHENYLMETHYLSILANE) copolymer[143499-71-2]]
solid

10g / ¥32,600

PSS-1P11
poly(PHENYLMETHYL)SILANE[146088-00-8]
Tg: 112-122°

10g / ¥40,600

Density: 1.12
fluorescent emission: 360nm

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541

Silicone-Organic Hybrids with Hydrolyzable Functionality
Hybrid organic inorganic polymers containing alkoxy substitutions on silicon allow formulation of moisture cure adhesives, sealants
and elastomers with physical properties, including adhesion and strength, which are significantly higher than conventional silicones.
Moisture produces a condensation cure analogous to moisture cure silicones. Preferred catalysts are dibutylbispentanedionatetin,
dimethyldineodecanoate tin and dibutyldilauryltin at levels of 0.2-1.0%. In order to allow through-section cure, maximum thickness is
usually 1/4”, (5mm).

Polyether
O

O

Si

O
O
F

O

Si

O

O

O

n

SIB1660.0
BIS[3-METHYLDIMETHOXYSILYL)PROPYL]POLYPROPYLENE OXIDE
visc: 6000-10,000 cSt. M.W. 600-800
density: 1.00
base resin for tin catalyzed moisture-cure RTVs
[75009-80-0] HMIS: 3-1-1-X
100g / ¥8,500

O

O

O

O

O

Si

25-30

Si

O

O

O

PR

SIB1824.84
BIS(3-TRIETHOXYSILYLPROPYL)POLYETHYLENE OXIDE (25-30 EO) 1,400 - 1,600
Hydrolytically stable hydrophilic silane
Proton conducting polymer electrolyte.1
1. Ghosh, B. et al. Chem. Mater. 2010, 22, 1483.
See also SIB1860.0
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[666829-33-0] HMIS: 2-1-1-X

O(38-42°)25g / ¥25,700

O

HN

O

2kg / ¥69,100

NH
O

O

Si
O

n

O

Si
O

O

SIB1824.82
N,N’-BIS-[(3-TRIETHOXYSILYLPROPYL)AMINOCARBONYL]POLYETHYLENE OXIDE (10-15 EO)
UREASIL
1,000 - 1,200
1.088
1.458325
Dipodal hydrophilic silane
In combination with sulfolane forms gel electrolyte for solar cells.1
Forms proton conducting hybrid organic-inorganic polymer electrode membranes.2
1. Stathatos, E. et al. Adv. Funct. Mater. 2004, 14, 45.
2. Honma, I. et al. J. Membr. Sci. 2001, 185, 83.
HYDROLYTIC SENSITIVITY: 7: reacts slowly with moisture/water[178884-91-8] TSCA HMIS: 1-1-1-X
25g / ¥18,300
100g / ¥51,700
Antifog coatings can be formed from combinations of polyalkylene oxide functional silanes and film-forming hydrophilic silanes542

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Enabling Your Technology

Multi-Functional and Polymeric Silanes
name

MW

Polybutadiene
CH2

CH2

CH

CH

CH2CHCH 2CHCH 2CH

CH2

CH

CH

CH2CHCH 2CHCH 2CH

CH2CH2Si(OC2H5)3

CH2

CH2

CH

D

0.90

2.0kg / ¥190,000

CH

CH2 CH CH2 CH CH2 CH

CH2CH2Si(OC2H5)2CH3(CH2CH)m (CH2CH)n(CH2CH

CHCH 2)pCH2CH2Si(OC2H5)3

0.93

2.0kg / ¥204,000

Developmental

CH2

SSP-055
TRIETHOXYSILYL MODIFIED POLY-1,2-BUTADIENE,
3500-4500
50% in toluene
viscosity: 75-400 cSt.
coupling agent for EPDM resins[72905-90-9] TSCA HMIS: 2-4-1-X store <5°100g / ¥22,000
SSP-056
TRIETHOXYSILYL MODIFIED POLY-1,2-BUTADIENE,
3500-4500
50% in volatile silicone
viscosity: 600-1200 cSt.
primer coating for silicone rubbers[72905-90-9] TSCA HMIS: 2-3-1-X store <5°100g / ¥24,700
SSP-058
DIETHOXYMETHYLSILYL MODIFIED POLY-1,2-BUTA3500-4500
DIENE, 50% in toluene
viscosity: 75-150 cSt.
water tree resistance additive for crosslinkable HDPE cable cladding
HMIS: 2-4-1-X store <5°100g / ¥26,300
SSP-255(30-35%TRIETHOXYSILYLETHYL)ETHYLENE4500-5500(35-40% 1,4-BUTADIENE) - (25-30% STYRENE) terpolymer, 50% in toluene
viscosity: 20-30 cSt.
HMIS: 2-3-1-X
100g / ¥28,600

n 20

O
O
F

CH2CH2Si(OC2H5)3

D420

0.90

-

Polyamine

SSP-255

H

N+ Cl

H

N

PR

N

H

SSP-060
TRIMETHOXYSILYLPROPYL MODIFIED
1500-1800
0.92(POLYETHYLENIMINE), 50% in isopropanol
visc: 125-175 cSt~20% of nitrogens substituted
employed as a coupling agent for polyamides.1
in combination with glutaraldehyde immobilizes enzymes.2
1. Arkles, B; et al, SPI 42nd Composite Inst. Proc., 21-C, 1987
2. Cramer, S; et al, Biotech. & Bioeng. 1989, 33(3), 344.
[136856-91-2]/[37251-86-8] TSCA HMIS: 2-4-1-X
100g / ¥10,900
2.0kg / ¥106,000
SSP-065
DIMETHOXYMETHYLSILYLPROPYL MODIFIED
1500-1800
0.92(POLYETHYLENIMINE), 50% in isopropanol
visc: 100-200 cSt~20% of nitrogens substituted
primer for brass[1255441-88-5] TSCA HMIS: 2-4-1-X
100g / ¥14,600
3.0kg / ¥203,000

Si(OCH 3)3

H

N

H

N + ClH

N

Si(OCH 3)2

CH3

Polyethylene

CH2 CH2 CH2 CHCH 2 CH2Si(OCH3 )3

SSP-050
TRIMETHOXYSILYL MODIFIED POLYETHYLENE
0.927
0.5-1.2 mole % vinyltrimethoxysilane - ethylene copolymer
moisture crosslinkable thermoplastic
melt process temp: 170 - 200°
[35312-82-4] TSCA HMIS: 1-1-1-X
100g / ¥13,000
2.0kg / ¥124,000

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543

CH3 n CH3

CH3

p33

O

CF3

CF3

CH2

CH2

CH2OCC CH2CH2 CH3
CF3
CH2
CH

CH2
CH3CH2CH2CH2 Si O

CH2
Si O

CH2
Si O

CF3
CH2

2

MFS-M15CH2Si O Processing
Si CHorp39
2CHSolution
2CH 2CH 3
Thermoplastic Resins for Melt
Casting
CH3

CH3 n CH3
CH3
OCH 3
O

CH3

CH3

Si O

Si CH2CH2CH2

O

C

n CH3

C

CH3 m CH3

p52

n p

density: 1.19

100g / ¥35,300

O
O
F

N

O

CH3

SSP-080(DIMETHYLSILOXANE)(BISPHENOL -A CARBONATE) copolymer(15 - 20% polydimethylsiloxane)
thermoplastic; tensile strength: 50MPa
Vicat mp: 145°
[202483-49-6] TSCA HMIS: 1-1-0-X
O

SSP-080

CH3
O

O

O

O

CH 3

N

N

O

CH 3

O

O

CH 3

N

CH 2CH 2CH 2 Si O Si O Si CH 2CH 2CH 2 N
CH 3

OCH 3 n CH 3

O

SSP-085(DIMETHYLSILOXANE)(ETHERIMIDE) copolymer(35-40% polydimethylsiloxane)phenylenediaminepolyetherimide
thermoplastic; tensile strength: 2800psi
Tg: 168°C[99904-16-2] TSCA HMIS: 1-1-0-X

density: 1.18

SSP-070
POLY(TRIMETHYLSILYL)PROPYNE
forms viscous 5% solutions in toluene/tetrahydrofuranhigh oxygen permeability1,2,3; PO2/PN2 = 1.7
1. Masuda, T.; et al, J. Am. Chem. Soc., 1983, 105, 7473.
2. Claes, S. et al, J. Membrane Sci., 2012, 389, 459.
3. Claes, S. et al, Macromolecules, 2011, 44, 2766.
[87842-32-8] HMIS: 1-1-0-X

O

O

O

100g / ¥35,300

CH3

C

C

SiMe 310g / ¥53,800

PR

Pre-Ceramic Polymers

CH3

Si
PSS-1M01
poly(DIMETHYLSILANE) MW 1000-3000
CH3 n
DP: 25-50
Flashpoint: 103° Tm: 250-270° (substantial degradation before mp)
Solid state source for volatile siliconcarbonitride (SiCN) precursors utilized in passivation of silicon-based photovoltaics
Employed in CVD of silicon carbonitride films.1
1. Scarlete, M.; et al; US Patent 7,396,563; 2008 (Label Licensed Gelest Product)
2. Yajima, S. et al. J. Mater. Sci. 1978, 13, 2569.
[30107-43-8] / [28883-63-8] TSCA
10g / ¥13,000
100g / ¥33,900

OO B O Si O

SSP-040
POLY(BORODIPHENYLSILOXANE)
solid, Tg: 95-100°, Tm: 140-1°
employed in preparation of ceramic fibers.1
1. Yajima, S.; et al, Nature, 1977, 266, 521.
[70914-15-7] TSCA HMIS: 2-0-0-X
25g / ¥22,500

544

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100g / ¥65,500(215) 547-1015

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Enabling Your Technology

Precious Metal Catalysts for Vinyl-Addition Silicone CureThe recommended starting point for platinum catalysts is 20ppm platinum or 0.05-0.1 parts of complex
per 100 parts of vinyl-addition silicone formulation. Rhodium catalyst starting point is 30ppm based on
rhodium. Other platinum concentrations are available upon request.

O
OF

SIP6829.2
PLATINUM CARBONYL CYCLOVINYLMETHYLSILOXANE COMPLEX
1.85-2.1% platinum concentration in vinylmethylcyclicsiloxanes
density: 1.02
catalyst for Si-H addition to olefins - silicone vinyl addition cure catalyst
employed in elevated temperature curing silicones
5.0g / ¥19,400
25g / ¥67,100[73018-55-0] TSCA 2-2-0-X
SIP6830.3
PLATINUM - DIVINYLTETRAMETHYLDISILOXANE COMPLEX
3-3.5% platinum concentration in vinyl terminated polydimethylsiloxane, neutral density: 0.98
catalyst for Si-H addition to olefins - silicone vinyl addition cure catalyst
employed in room temperature curing silicones[68478-92-2] TSCA 2-2-0-X
5.0g / ¥16,400
25g / ¥55,400

SIP6831.2
PLATINUM - DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene
density: 0.90
2.1-2.4% platinum concentration flashpoint: 38°C (100°F)“hot” catalyst employed in room temperature curing silicones[68478-92-2] TSCA 2-3-0-X
5.0g / ¥19,400
25g / ¥67,100
SIP6831.2LC
PLATINUM - DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene - LOW COLOR
2.1-2.4% platinum concentration flashpoint: 38°C (100°F) density: 0.90[68478-92-2] TSCA 2-3-0-X
10.0g / ¥45,900

PR

SIP6832.2
PLATINUM - CYCLOVINYLMETHYLSILOXANE COMPLEX
2-2.5% platinum concentration in cyclic methylvinylsiloxanes, neutral
density: 1.02
catalyst for Si-H addition to olefins - silicone vinyl addition cure catalyst
employed in moderate elevated temperature curing silicones[68585-32-0] TSCA 2-2-0-X
5.0g / ¥18,000
25g / ¥59,100
SIP6833.2
PLATINUM-OCTANALDEHYDE/OCTANOL COMPLEX
density: 0.84
2.0-2.5% platinum concentration in octanol
catalyst for Si-H addition to olefins - silicone vinyl addition cure catalyst
increases flammability resistance of silicones[68412-56-6] TSCA 2-3-0-X
5.0g / ¥15,100
25g / ¥50,100

INRH078
TRIS(DIBUTYLSULFIDE)RHODIUM TRICHLORIDE
3.0-3.5% rhodium concentration in toluene
density: 0.91
catalyst for Si-H addition to olefins - silicone vinyl addition cure catalyst, less susceptible to inhibition
employed in moderately elevated temperature curing silicones[55425-73-5] TSCA HMIS: 3-4-0-X
5.0g / ¥28,500
25g / ¥101,000

Poisons for platinum catalysts used in vinyl-addition crosslinking must be avoided. Examples are:Sulfur compounds (mercaptans, sulfates, sulfides, sulfites, thiols
and rubbers vulcanized with sulfur will inhibit contacting surfaces)
Nitrogen compounds (amides, amines, imides, nitriles)
Tin compounds (condensation-cure silicones, stabilized PVC)

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545

Modifiers for Vinyl Addition Silicones
The following are the most common materials employed to modify aspects of platinum-cured vinyl-addition silicones. Other
materials are found in the Silicon Compounds section.

Inhibitors and Moderators of Hydrosilylation
Product CodeM.W.

SID4613.0
1,3-DIVINYLTETRAMETHYLDISILOXANE
C8H18OSi2

density

R.I.

186.40139°
0.811
1.4123TOXICITY- orl rat, LD50 >12,500mg/kg
flashpoint: 24°C(76°F)
50g / ¥6,000
2kg / ¥110,000

OOF[2627-95-4] TSCA HMIS: 2-4-0-X

b.p.

SIT7900.0
1,3,5,7-TETRAVINYL-1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE
C12H24O4Si4[2554-06-5] TSCA HMIS: 2-1-0-X

344.66110°/100.998(-43°)mp
flashpoint: 112°C (234°F)
25g / ¥7,600

Adhesion Promoters
SIA0540.0
ALLYLTRIMETHOXYSILANE
C6H14O3Si[2551-83-9] TSCA HMIS: 3-2-1-X

162.26
146-8°
0.96325
flashpoint: 46°C(115°F)
10g / ¥10,900

Special Crosslinkers
SIP6826.0
PHENYLTRIS(DIMETHYLSILOXY)SILANE
330.6891°/2
0.942
C10H26O3Si4
flashpoint: 87°C(190°F)
crosslinker for medium refractive index vinyl addition silicone elastomers[18027-45-7] TSCA HMIS: 2-1-1-X
25g / ¥13,000

PR

SIT7278.0
TETRAKIS(DIMETHYLSILOXY)SILANE
C8H28O4Si5
crosslinker for Pt cure 2-component RTVs
[17802-47-2] TSCA HMIS: 2-2-1-X

SIT8372.4
TRIFLUOROPROPYLTRIS(DIMETHYLSILOXY)SILANE
C9H25F3O3Si4[3410-32-0] TSCA HMIS: 2-2-0-X

1.4342

2kg / ¥112,100

1.403625

50g / ¥33,200

1.44025

2kg / ¥203,000

328.73
188-90°0.886
flashpoint: 67°C(153°F)

1.384125g / ¥14,100

100g / ¥37,900

350.6398-9°/40

0.962

1.375325g / ¥24,100

Diluent Fluids for Gel Hardness and Tactile Response

546

DMS-T31
polyDIMETHYLSILOXANE, 1000 cSt.

100g / ¥6,400

3kg / ¥39,300

ALT-143
polyOCTYLMETHYLSILOXANE, 600-1000 cSt.

100g / ¥7,400

1kg / ¥35,000

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Enabling Your Technology

Crosslinking Agents for Condensation Cure Silicones
Acetoxy Crosslinkers
Code
M.W.
density
SID2790.0
DI-t-BUTOXYDIACETOXYSILANE, tech-96
292.401.0196SILICON DI-t-BUTOXIDE DIACETATE(-4°)mpC12H24O6Si
flashpoint: 95°C (203°F)
adhesion promoter for silicone RTVs
[13170-23-5] TSCA HMIS: 3-2-2-X
50g / ¥9,000
3kg / ¥68,700

SIT7777.0
TETRA-n-PROPOXYSILANE
264.440.9158C12H28O4Si(<-80°)mp
flashpoint: 95°C (203°F)
viscosity: 1.66 cSt[682-01-9] TSCA HMIS: 2-2-1-X
100g / ¥7,200
2kg / ¥41,000

OOF

SIE4899.0
ETHYLTRIACETOXYSILANE
C8H14O6Si
flashpoint: 106°C(223°F)
liquid crosslinker for silicone RTVs
[17689-77-9] TSCA HMIS: 3-1-1-X

Code
M.W.
density
SIT7110.0
TETRAETHOXYSILANE, 98%
208.330.9335TETRAETHYLORTHOSILICATE TEOS(-77°)mp
C8H20O4Si
TOXICITY - oral rat, LD50: 6270mg/kg
flashpoint 46°C (116°F)
vapor pressure, 20°: 11.8mm
viscosity: 0.8 cSt[78-10-4] TSCA HMIS: 2-1-1-X
100g / ¥3,400
3kg / ¥17,000

243.281.143(7-9°)mp

25g / ¥3,400

2kg / ¥48,000

SIM6519.0
METHYLTRIACETOXYSILANE, 95%
220.25
1.175
C7H12O6Si(40°)mpvapor pressure, 94°: 9mm
flashpoint: 85°C(185°F)
most common cross-linker for condensation cure silicone RTVs
[4253-34-3] TSCA HMIS: 3-2-1-X
50g / ¥4,000
2kg / ¥62,000
SIM6519.2
METHYLTRIACETOXYSILANEETHYLTRIACETOXYSILANE 80:20 BLEND
liquid crosslinker blend for silicone RTVs
[4253-34-3]
100g / ¥10,100

1kg / ¥53,100

SIV9098.0
VINYLTRIACETOXYSILANE
232.26
1.167
C8H12O6Si
flashpoint: 88°C (190°F)[4130-08-9] TSCA HMIS: 3-2-1-X
100g / ¥5,600
2kg / ¥55,000

PR

Alkoxy Crosslinkers

SIB1817.0
BIS(TRIETHOXYSILYL)ETHANE
354.590.957
HEXAETHOXYDISILETHYLENE
C14 H34 O6Si2
additive to formulations that enhances adhesion[16068-37-4] TSCA HMIS: 3-1-1-X
25g / ¥7,400
2kg / ¥104,100

SIM6555.0
METHYLTRIETHOXYSILANE
178.300.8948
C7H18O3Si
TOXICITY- oral rat, LD50: 12,500mg/kg[2031-67-6] TSCA HMIS: 1-3-1-X
25g / ¥3,400
2kg / ¥35,000
SIM6560.0
METHYLTRIMETHOXYSILANE
136.22
0.955
C4H12O3Si(-78°)mp
TOXICITY- oral rat, LD50: 12,500mg/kg
viscosity: 0.50 cSt
flashpoint: 8°C(46°F)[1185-55-3] TSCA HMIS: 3-4-1-X
25g / ¥3,400
2kg / ¥22,000

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SIV9220.0
VINYLTRIMETHOXYSILANE
148.23123°
0.970
C5H12O3Si
TOXICITY- oral rat, LD50: 11,300mg/kg
viscosity: 0.6 cSt
flashpoint: 28°C (82°F)[2768-02-7] TSCA HMIS: 3-4-1-X 25g / inquire
2kg / inquire
Oxime Crosslinkers

SIM6590.0
METHYLTRIS(METHYLETHYLKETOXIMINO) SILANE, tech-95
METHYLTRIS(2-BUTANONEOXINO)SILANE
301.46
0.982
C13H27N3O3Si
TOXICITY- oral rat, LD50: 2000-3000mg/kg
flashpoint: 90°C (194°F)
neutral crosslinker for condensation cure silicones[22984-54-9] TSCA HMIS: 2-2-1-X 100g / ¥7,700
2kg / ¥48,500

SIV9280.0
VINYLTRIS(METHYLETHYLKETOXIMINO) SILANE, tech-95
C14H27N3O3Si
313.470.982[2224-33-1] TSCA HMIS: 3-3-1-X 50g / ¥7,700
2kg / ¥56,400
Enoxy (Acetone) Crosslinkers

SIV9209.0
VINYLTRIISOPROPENOXYSILANE, tech-95
226.35
0.926
C11H18O3Si[15332-99-7] TSCA HMIS: 3-1-1-X 25g / ¥8,500
100g / ¥19,900
Amino and Benzamido Crosslinkers
SIB1610.0
BIS(N-METHYLBENZAMIDO)ETHOXYMETHYL- 356.50
SILANE, tech-90
C19H24N2O3Si[16230-35-6] TSCA HMIS: 2-1-1-X 25g / ¥10,600
100g / ¥26,800
SIT8710.0
TRIS(CYCLOHEXYLAMINO)METHYLSILANE, tech-95 337.62
C19H39N3Si
flashpoint: 72°C(161°F)[15901-40-3] TSCA HMIS: 3-2-1-X 25g / ¥18,300
100g / ¥51,700

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547

Tin Catalysts for Silicone Condensation Cure
name

M.W.

d20

name

M.W.

d20

SND3160
DI-n-BUTYLDIACETOXYTIN, tech-95
351.01
1.320
DIBUTYLTINDIACETATE(-10°)mp
C12H24O4Sn
TOXICITY - oral mus, LD50: 109.7mg/kg
flashpoint: 143°C (290°F)
high activity catalyst for one-component condensation RTVs
suitable for acetoxy cure and neutral alkoxy cureuse level 0.1-0.3%[1067-33-0] TSCA HMIS: 3-1-1-X
25g / ¥7,000
2.5kg / ¥54,000

SNB1101
BIS(2-ETHYLHEXANOATE)TIN, 50%
405.11
1.12
in polydimethylsiloxane TIN II OCTOATEC16H30O4Sn
predilution results in better compatibility with silicones[301-10-0] TSCA HMIS: 2-1-1-X
100g / ¥7,000
1kg / ¥23,500

SND3260
DI-n-BUTYLDILAURYLTIN, tech-95
631.55
1.066
DIBUTYLTIN DILAURATETOXICITY-orl rat, LD50: 175-1600mg/kg
C32H64O4Sn
flashpoint: 231°C (448°F)
viscosity, 25°: 31-4 cSt
widely used catalyst for two-component condensation RTVs
moderate activity, longer pot life, employed in silicone emulsions
FDA allowance as curing catalyst for silicones- 21CFR121.2514
use level: 0.2-0.6%[77-58-7] TSCA HMIS: 2-1-1-X
100g / ¥7,500
2.5kg / ¥36,500

OOF

SNB1100
BIS(2-ETHYLHEXANOATE)TIN tech-95405.11
1.28
TIN II OCTOATE
contains free 2-ethylhexanoic acid
C16H30O4Sn
TOXICITY - orl rat, LD50: 5,810 mg/kg
catalyst for two-component condensation RTVs
highest activity, short pot life,
does not cause silicone reversion
use level: 0.1-0.3%[301-10-0] TSCA HMIS: 2-1-1-X
100g / ¥7,500
2.5kg / ¥34,000

SNB1710
BIS(NEODECANOATE)TIN tech-90461.23
1.16
TIN II NEODECANOATE
contains free neodecanoic acid
C20H38O4Sn
dark viscous liquid
catalyst for two-component condensation RTVs
slower than SNB1100
does not cause reversion
use level: 0.2-0.4%[49556-16-3] TSCA HMIS: 2-1-0-X 50g / ¥9,300
250g / ¥23,500

PR

SND2930
DI-n-BUTYLBIS(2-ETHYLHEXYLMALEATE)TIN, tech-95 687.46 1.145
DIBUTYLTIN DIISOOCTYLMALEATEC32H56O8Sn
catalyst for one-component RTVs
good adhesion to metal substrates[25168-21-2] TSCA HMIS: 2-2-0-X 50g / ¥7,000
250g / ¥14,500

SND2950
DI-n-BUTYLBIS(2,4-PENTANEDIONATE)TIN, tech-95 431.13 1.2
C18H32O4Sn
flashpoint: 91°C (196°F)
stable tin+4 catalyst with reduced reversion
can be used in conjunction with SND3260
catalyst in silicone RTV cures1,2.
1. T. Lockhardt et al, US Pat. 4,517,337, 1985
2. J. Wengrovius, US Pat. 4,788, 170, 1988
[22673-19-4] TSCA HMIS: 2-2-1-X 25g / ¥7,000
2kg / ¥44,500
SND3110DI-n-BUTYLBUTOXYCHLOROTIN, tech-95
341.48C12H27ClOSn
catalyst for two-component condensation cure silicone RTVs.1
1. Chadho, R.; et al, US Pat. 3,574,785, 1971
[14254-22-9] TSCA HMIS: 3-2-1-X 25g / ¥11,000
100g / ¥25,500

548

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SND4220
DIMETHYLDINEODECANOATETIN, tech-95
491.26
1.136
DIMETHYLTIN DINEODECANOATETOXICITY- oral rat, LD50: 1470mg/kg
C22H44O4Sn
flashpoint: 153°C (307°F)
catalyst for one- and two-component condensation RTVs
use level: 0.5-0.8%[68928-76-7] TSCA HMIS: 2-1-0-X
50g / ¥7,500
250g / ¥15,500
SND4240
DIMETHYLHYDROXY(OLEATE)TIN, 85%447.23
1.15
C20H40O3Sn viscous liquid
TOXICITY - oral rat, LD50: 800mg/kg
elevated temperature catalyst for condensation cure silicones
use level: 0.8-1.2%[43136-18-1] TSCA HMIS: 2-1-0-X
25g / ¥7,500
100g / ¥14,500

SND4430
DIOCTYLDILAURYLTIN tech-95
743.76
0.998
DIOCTYLTINDILAURATETOXICITY - oral rat, LD50: 6450mg/kg
C40H80O4Sn
flashpoint: 70°C (158°F)
low toxicity tin catalyst
moderate activity, longer pot life
applications in silicone emulsions and solvent based adhesives
use level: 0.8-1.3%[3648-18-8] TSCA HMIS: 2-2-1-X
25g / ¥7,000
2kg / inquire
SNT7955
TIN II OLEATE, tech-90
681.61
C36H66O4Sn contains free oleic acid[1912-84-1] HMIS: 2-1-0-X
100g / ¥16,500

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1.06

Enabling Your Technology

Titanate Catalysts for Alkoxy and Oxime Neutral Cure RTVs
name

MW

AKT853
TITANIUM DI-n-BUTOXIDE (BIS-2,4PENTANEDIONATE)
C18H32O6Ti

b.p./mm(m.p.) d20

n20

392.32
1.085
flashpoint: >110°C(230°F)
100g / ¥12,000[16902-59-3] TSCA HMIS: 2-3-1-X

364.260.992
1.4935TOXICITY- oral rat, LD50: 2,870mg/kg
flashpoint: 12°C (54°F)
viscosity, 25°: 8-11 cSt
100g / ¥7,500
2kg / ¥25,500

OOF

AKT855
TITANIUM DIISOPROPOXIDE(BIS-2,4-PENTANEDIONATE), 75% in isopropanol
C16H28O6Ti
TIACA
miscible: aqueous acetone, most organics

500g / ¥34,500[17927-72-9] TSCA HMIS: 2-3-1-X

AKT865
TITANIUM DIISOPROPOXIDE BIS(ETHYLACETOACETATE), 95%
C18H32O8Ti
11.0 - 11.2% Ti[27858-32-8] TSCA HMIS: 2-3-1-X

424.33
1.05
TOXICITY - oral rat, LD50: 23,020 mg/kg
viscosity, 25°: 45-55 cSt
flashpoint: 27°C (80°F)
100g / ¥8,500
500g / ¥20,500

AKT867
TITANIUM 2-ETHYLHEXOXIDETETRAOCTYLTITANATE
8.4-8.6% Ti
C32H68O4Ti
catalyst for silicone condensation RTVs

564.79194°/0.25
0.937
viscosity, 25°: 120-130 cSt.
flashpoint: 71°C (160°F)[1070-10-6] TSCA HMIS: 2-2-1-X

100g / ¥7,500

2kg / ¥25,500

SIT7305.0
TITANIUM TRIMETHYLSILOXIDETETRAKIS(TRIMETHYLSILOXY)TITANIUM
C12H36O4Si4Ti

404.66110°/10
flashpoint: 51°C (124°F)

0.900

25g / ¥14,600

100g / ¥39,500

1.4278PR[15990-66-6] HMIS: 2-2-1-X

1.482

Peroxide Catalysts for Heat-Cured Silicone Rubber

SID3352.0
2,4-DICHLOROBENZOYL PEROXIDE,
MW: 380.00
density: 1.26
50% in polydimethylsiloxane
paste consistency
silicone compounding temp. <50°; cure temp. >90°; recommended cure temp: 105-120°[133-14-2] TSCA HMIS: 3-4-1
100g / ¥13,300
500g / ¥43,800
SID3379.0
DICUMYL PEROXIDE, 25%
MW: 270.36
in polydimethylsiloxane, 40% w/ calcium carbonate, 35%
silicone compounding temp. <60°; cure temp. >125°; recommended cure temp: 155-175°
C18H22O2[80-43-3] TSCA HMIS: 2-3-2-X
100g / ¥13,800500g / ¥45,900

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

549

Pigments and Coloration
Pigment concentrates in silicone oil are readily dispersed in all silicone cure systems. Pigments are generally mixed at 1-4 parts per
hundred with the A part of two part vinyl addition silicones. Silicone coatings generally employ 2-6 parts per hundred.

Pigment Concentrates (dispersed in silicone)
Color
White
Red
Orange-Red
OrangeYellow
Green
Blue
Beige
Brown
Black - nonconductive
Black - conductive
X-Ray OpaqueConcentration
Pigment TypePrice/100g Price/1kg
45%
titanium dioxide¥12,700¥61,600
50%
cadmium sulfoselenide¥12,700¥61,600
45%
iron oxide¥12,700¥61,600
15-25%
diarylide pyrazolone¥12,700¥61,60055%
bismuth vanadate¥12,700¥61,600
30-40%
cobalt titanate¥12,700¥61,60045%
sodium aluminosulfosilicate ¥12,700¥61,600
50-60%
mixed Fe-Mg-Ti oxides¥12,700¥61,600
55%
mixed Fe-Cr-Cu oxides¥12,700¥61,600
55%
manganese ferrite¥12,700¥61,60045%
carbon¥12,700¥61,600
35%
barium sulfate¥12,700¥61,600

O
O
F

Code
PGWHT01
PGRED01
PGORR01
PGORA01PGYLW01PGGRN01
PGBLU01
PGFLS01
PGBRN01
PGBLK01
PGBLK02PGXRA01

Dyes in silicone oils provide coloration without compromising transparency. The fluids may be used directly in applications such as
gauges or as tints for silicone elastomers.
DMS-T21BLU (Blue dye in 100cSt. silicone)
DMS-T21RED (Red dye in 100cSt. silicone)

100g / ¥8,800
100g / ¥8,800

1kg / ¥25,800
1kg / ¥25,800

Fillers and Reinforcements

Hexamethyldisilazane treated silica is the preferred filler for silicones. The material is very fine and hydrophobic. Enclosed highshear compounding equipment is required for adequate dispersion.
Product CodeM.W.

density

2.5kg / ¥17,400

SIS6962.0
SILICON DIOXIDE, AMORPHOUS
60.09
2.2
HEXAMETHYLDISILAZANE TREATED
FUMED SILICA, HMDZ TREATED
surface area, 150-200m2/g
SiO2 ultimate article size: 0.02m
reinforcing filler for high tear strength silicone rubbers[168909-20-6]/[7631-86-9] TSCA HMIS: 2-0-0-X
500g / ¥17,300

2kg / ¥50,000

SIS6964.0
SILICON DIOXIDE, CRYSTALLINEQUARTZ POWDER
SiO2 hardness: 7.0[7631-86-9] TSCA HMIS: 1-0-0-X

10kg / ¥47,000

PR

SIC2050.0
CALCIUM METASILICATE
116.16
2.69
WOLLASTONITE
hardness: 4.5-5
CaO3Siweakly reinforcing filler for silicone rubbers- suitable for putty[13983-17-0] TSCA HMIS: 1-0-0-X
500g / ¥7,400

550

www.AZmax.co.jp TEL: 03-5543-1630

60.09
2.65
TOXICITY- oral- rat, LD50: 3160mg/kg
500g / ¥7,200

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology

Polymerization Catalysts
CH3

CH3
+
N CH3 O

H3C

-

O H3C

Si

+

CH3 3-4
nominal structure

CH3

CH3
N CH3
CH3

O
O
F

SIT7520.0
TETRAMETHYLAMMONIUM SILOXANOLATE
density: 0.98
1.5-2.0% nitrogen as endcapped polydimethylsiloxane
catylyst for ring opening polymerization of cyclic siloxanes at 85-100°;
decomposes >120°C with release of trimethylamine[68440-88-0] TSCA HMIS: 3-3-1-X
25g / ¥12,500

Cl

Cl

Cl

P

N

Cl

Cl

P

100g / ¥32,600

P

N

Cl

INPH055POLYPHOSPHONITRILIC CHLORIDE, 95%
Cl3(NPCl2)nNOCl3.PCl6
for silanol oligomer polymerization1,2,3
1. Nitzsche, S.; et al, US Pat. 3,839,388, 1974
2. Nye, S.; et al, US Pat. 5,753,751, 1988
3. Dittrich, U.; et al, US Pat. 5,919,883, 1999
[31550-05-7] HMIS: 3-1-1-X+-

Cl PCl6

n Cl

mp 60-80°

10g / ¥35,500

PR

CH3

F

CH3

HC

I

+

F

B

-

F

CH3

F

OMBO037(p-ISOPROPYLPHENYL)(p-METHYLPHENYL)mp 120-133°
IODONIUM TETRAKIS(PENTAFLUOROPHENYL) BORATE
UV initiator for cationic polymerizations, e.g. cycloaliphatic epoxides[178233-72-2] TSCA HMIS: 2-1-0-X
5g / ¥16,500

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

25g / ¥52,500

www.gelest.com

551

Product Code Definitions for Reactive Fluids
Note: All comonomer % are in mole %All block copolymer % are in weight %3 Character Suffix for Functional Termination 4 Character Suffix for Functional Copolymers
Prefix:
DMS = DiMethylSiloxane

Prefix:
1st character describes non-methyl substitution
A = Amino
C = Carbinol
D = Dimethyl
E = Epoxy
EC = Epoxy Cyclohexy
F = TriFluoropropyl
H = Hydride
L = ChLorine (non-hydrolyzeable)
M = Methyl
P = Phenyl
R = MethacRylate
S = Mercapto
U = Acrylate (UV) or UV stabilizer
V = Vinyl
X = MethoXy or EthoXy
Y = Polar Aprotic (cYano, pYrrolidone)
Z = Anhydride

PR

O
O
F

Suffix:
1st character describes termination
A = Amino
B = CarBoxy
C = Carbinol
D = Diacetoxy
E = Epoxy
F = TriFluoropropyl
H = Hydride
I = Isocyanate
K = Chlorine (hydrolyzeable)
L = ChLorine (non-hydrolyzeable)
M = Methyl
N = DimethylamiNe
R = MethacRylate
S = Mercapto
T = Trimethylsily
U = Acrylate (UV) or UV stabilizer
V = Vinyl
X = MethoXy or EthoXy
Y = Polar Aprotic (cYano, pYrrolidone)
Z = Anhydride

2nd character = substitution type for 1st digit
B = Block
D = Difunctional
M = Monofunctional
3rd character = termination type including block
E = Ethylene oxide block
P = Propylene oxide block
S = Silanol
V = Vinyl

2nd character = viscosity in decades, i.e. 10x
3rd character = viscosity to 1 significant figure

Suffix:
1st 2 characters = mole % non-dimethyl monomer

Example: DMS-V41

Prefix = DMS = DiMethylSiloxane
Suffix = V41 = Vinyl Terminated (104 x 1 ) cSt
or Vinyl Terminated polyDimethylsiloxane, 10,000 cSt

552

www.AZmax.co.jp TEL: 03-5543-1630

3rd character = viscosity in decades, i.e. 10x
4th character = viscosity to 1 significant figure
Example: PDS – 1615
Prefix = PDS
P = Phenyl
D = Di (i.e. Diphenyl)
S = Silanol
Suffix = 1615
1st 2 digits = 16%
2nd 2 digits = (10 1 x 5) cSt
or 16% Diphenylsiloxane-Dimethylsiloxane

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology

Silicones Product Code Index
ABP-263
ALT-143
ALT-143 - ALT-192
ALT-173
ALT-192
ALT-292
ALT-281 - ALT-561
AMS-132 - AMS-162
AMS-233 - AMS-2202
AMS-242
APT-133
APT-213
APT-213 - APT-263
APT-233
ATM-1112 - ATM-1322
ATM-1322M50
CMS-221 - CMS-626
CMS-832

DodecylMethylsiloxane-HydroxypolyalkyleneoxypropylMethylsiloxane, copolymer
polyOctylMethylsiloxane
AlkylMethylsiloxane homopolymers
polyTetradecylMethylsiloxane
polyOctadecylMethylsiloxane
OctadecylMethylsiloxane-Dimethylsiloxane copolymer
AlkylMethylsiloxane-Dimethylsiloxane
AminopropylMethylsiloxane-Dimethylsiloxane copolymers
AminoethylaminopropylMethylsiloxane-Dimethylsiloxane copolymer
AminoethylaminoisobutylMethylsiloxane-Dimethylsiloxane copolymer
poly(2-phenylpropyl)methylsiloxane
EthylMethylsiloxane - 2-PhenylpropylMethylsiloxane copolymer
AlkylMethylsiloxane-ArylalkylMethylsiloxane copolymers
HexylMethylsiloxane-2-PhenylpropylMethylsiloxane copolymer
AminoethylaminopropylMethoxysiloxane-Dimethylsiloxane copolymer
AminoethylaminopropylMethoxysiloxane-Dimethylsiloxane - emulsion(Hydroxyalkylfunctional)Methylsiloxane - Dimethylsiloxane copolymers(Hydroxyalkylfunctional)Methylsiloxane - (3,4-DimethoxyphenylpropylMethylSiloxane-

480
476
476
476
476
476
476
512
513
513
477
477
477
477
512
533
479, 520
479

Inert
Inert/Reactive
Reactive
Reactive
Inert
Inert/Reactive
Reactive

DBE-224 - DBE-921
DBE-C25
DBE-U12 - DBE-U22
DBL-C31 & DBL-C32
DBP-732
DBP-C22
DBP-V052 - DBP-V102

479
479, 519
521
519
479
479, 519
501

Inert
Reactive
Inert
Inert
Inert
Reactive
Inert
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive

DCE-7007 - DCE-7521
DCE-V7512
DCF-405
DCS-8024
DES-T02 - DES-T23
DGM-000
DMA-021 - DMA-131
DMS-A11 - DMS-A35
DMS-A211 - DMS-A214
DMS-B12 - DMS-B31
DMS-C15 - DMS-C23
DMS-CA21
DMS-D33
DMS-E09 - DMS-E21
DMS-EC13
DMS-EX21
DMS-H03 - DMS-H41
DMS-Hm15 - DMS-Hm25

Dimethylsiloxane - Ethylene Oxide Block copolymers
polyDimethylsiloxane, hydroxy(polyethyleneoxy) terminatedpolyDimethylsiloxane, Acryloxypolyethyleneoxy terminatedpolyDimethylsiloxane, hydroxy(polycaprolactone) terminatedDimethylsiloxane - Propylene Oxide Block copolymers
polyDimethylsiloxane, hydroxy(polypropyleneoxy) terminatedDimethylsiloxane - Vinylmethylsiloxane - (Propylene Oxide - Ethylene Oxide)
Block Copolymers
Ethylene-Dimethylsiloxane copolymer
Ethylene-Dimethysiloxane copolymer, vinyl terminatedTetrahydrofurfuryloxypropylmethylsiloxane
Silethylphenylene-Dimethylsiloxane copolymer
polyDiEthylsiloxane
polyDimethylsiloxane, gum
Alkyl terminated polydimethylsiloxane
polyDimethylsiloxane, aminopropyl terminatedpolyDimethylsiloxane, N-ethylaminoisobutyl terminatedpolyDimethylsiloxane, carboxylic acid terminatedpolyDimethylsiloxane, hydroxyethoxypropyl terminatedpolyDimethylsiloxane, bis(hydroxyethyl)amine terminatedpolyDimethylsiloxane, diacetoxymethyl terminatedpolyDimethylsiloxane, epoxy terminatedpolyDimethylsiloxane, epoxycyclohexylethyl terminatedpolyDimethylsiloxane, (epoxypropoxypropyl)dimethyoxysilyl terminatedpolyDimethylsiloxane, hydride terminatedpolyDimethylsiloxane, hydride terminated; mono disperse

485
498
480
485
481
498
476
512
512
523
519
519
525
516
517
516
504
504, 526

Reactive
Reactive
Reactive
Reactive
Reactive

DMS-HV15 - DMS-HV22
DMS-K05 - DMS-K26
DMS-L21
DMS-LP21
DMS-N05 - DMS-N12

polyDimethylsiloxane, vinyl (mono) - hydride (mono) terminatedpolyDimethylsiloxane, chlorine terminatedpolyDimethylsiloxane, chloromethyl terminatedpolyDimethylsiloxane, chlorophenethyl terminatedpolyDimethylsiloxane, dimethylamine terminated500, 526
525
524
524
525

PR

O
O
F

Inert
Inert
Inert
Inert
Inert
Inert
Inert
Reactive
Reactive
Reactive
Inert
Inert
Inert
Inert
Reactive
Reactive
Inert/Reactive
Inert/Reactive

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

553

Bicycloheptenyl terminated polydimethylsiloxane
Limonenyltrisiloxane
polyDimethylsiloxane, methacryloxypropyl terminatedpolyDimethylsiloxane, silanol terminatedpolyDimethylsiloxane, silanol terminated - emulsion
polyDimethylsiloxane, mercaptopropyl terminatedpolyDimethylsiloxane, trimethylsiloxy terminatedpolyDimethylsiloxanes, reduced volatility
polyDimethylsiloxane emulsions
polyDimethylsiloxanes, extreme low volatility
polyDimethylsiloxane, 3-acryloxy-2-hydroxypropyl terminatedpolyDimethylsiloxane, vinyl terminatedpolyDimethylsiloxane, vinyl terminated; mono disperse
polyDimethylsiloxane, vinyl terminated, reduced volatility
polyDimethylsiloxane, vinyl terminated - silica reinforced
polyDimethylsiloxane, ethoxy terminatedpolyDimethylsiloxane, methoxy terminatedpolyDimethylsiloxane, triethoxysilylethyl terminatedpolyDimethylsiloxane, anhydride terminated(Epoxycyclohexylethyl)Methylsiloxane-MethoxypolyethyleneoxypropylMethylsiloxaneEpoxycyclohexylethylMethylsiloxane - Dimethylsiloxane copolymer
DiEthylsiloxane-Dimethylsiloxane, vinyl terminated
Epoxypropoxypropylmethylsiloxane - Dimethylsiloxane copolymer
polyTrifluoropropylmethylsiloxane homopolymers
Trifluoropropylmethylsiloxane-Dimethylsiloxane copolymer
TridecafluorooctylMethylsiloxane-Dimethylsiloxane copolymer
polyTrifluoropropylmethylsiloxane, silanol terminatedpolyNonafluorohexylmethylsiloxane - Dimethylsiloxane copolymer, chlorine terminated
TrifluoropropylMethylsiloxane-Dimethylsiloxane copolymer, vinyl terminatedMethylHydrosiloxane-OctylMethylsiloxane copolymer
MethylHydrosiloxane-OctylMethylsiloxane - Dimethylsiloxane terpolymer
poly(DimethylHydrosiloxy)Phenylsiloxane, hydride terminatedMethylHydrosiloxane-Dimethylsiloxane copolymers
polyMethylHydrosiloxanes, trimethylsiloxy terminatedMethylHydrosiloxane-Dimethylsiloxane copolymer, Hydride TerminatedMethylHydrosiloxane-PhenylMethylsiloxane, hydride terminatedHydride Q Resin(Chloropropyl)Methylsiloxane-Dimethylsiloxane copolymer
Macromers
polyDimethylsiloxane, aminopropyl (mono) terminatedpolyDimethylsiloxane, carboxylic acid (mono) terminatedpolyDimethylsiloxane, carbinol (mono) terminatedpolyDimethylsiloxane, dicarbinol (mono) terminatedpolyDimethylsiloxane, epoxy (mono) terminatedpolyDimethylsiloxane, hydride (mono) terminatedpolyDimethylsiloxane, anisyl (mono) terminatedMonoLimonenyl terminated Polydimethylsiloxane
polyDimethylsiloxane, methacryloxypropyl (mono) terminatedpolyDimethylsiloxane, vinyl (mono) terminatedpolyDimethylsiloxane, carbinol (mono) terminated - symmetric

554

522
484
520
509
533
524
466
472
473
472
521
495
495, 526
495
495
525
525
525
523
517
517
497
516
478
478
478
510
525
496
505
505
506
504
504
505
506
505
524
526-532
527
529
528
528
529
529
484
484
531
500, 532
520, 528OOF

DMS-NB25 - DMS-NB32
DMS-NL04
DMS-R05 - DMS-R31
DMS-S12 - DMS-S51
DMS-S33M50
DMS-SM21
DMS-T00 - DMS-T72
DMS-T07R - DMS-T31R
DMS-T21M50 - DMST51M35
DMS-T23E - DMS-T41.2E
DMS-U21
DMS-V00 - DMS-V52
DMS-Vm31 - DMS-Vm35
DMS-V25R - DMS-V35R
DMS-V31S15
DMS-XE11
DMS-XM11
DMS-XT11
DMS-Z21
EBP-234
ECMS-127 - ECMS-424
EDV-2022
EMS-622
FMS-121 - FMS-141
FMS-221 - FMS-222R - FMS411
FMS-736
FMS-9921-FMS-9922
FMS-K11
FMV-4035 - FMV-4042
HAM-301
HAM-3012
HDP-111HMS-013 - HMS-501
HMS-991 - HMS-993
HMS-H271 - HMS-HM271
HPM-502
HQM-105 - HQM-107
LMS-152
MCR-A11 - MFS-M15
MCR-A11 - MCR-A12
MCR-B12
MCR-C12 - MCR-C22
MCR-C61 - MCR-C62
MCR-E11 - MCR-E21
MCR-H07 - MCR-H21
MCR-NA07
MCR-NL07
MCR-M07 - MCR-M22
MCR-V21 - MCR-V41
MCS-C11 - MCS-C13

PR

Reactive
Inert
Reactive
Reactive
Reactive
Reactive
Inert
Inert
Inert
Inert
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Inert
Inert
Inert
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Inert
Inert
Reactive
Reactive
Reactive

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology
monoHexacosyl terminated Polydimethylsiloxane
Methylsilsesquioxane-Dimethylsiloxane copolymer
Methyl T branched polydimethylsiloxane, vinyl terminatedPhotoinitiator
Octyl T-branched silsesquioxane
poly(Antimony Ethylene Glycoxide)
DiPhenyl-Dimethylsiloxane copolymer
Diffusion Pump Fluids
DiPhenyl-Dimethylsiloxane copolymer, silanol terminatedpolyDiphenylsiloxane, silanol terminated
DiPhenylsiloxane-Dimethylsiloxane copolymer, vinyl terminatedPigment concentrates in silicone
polyPhenylmethylsiloxanes, trimethylsiloxy terminatedPhenylMethylsiloxane-Dimethylsiloxane copolymer
polyDimethylsiloxane, vinyl (mono) - phenyl (mono) - hydride (mono) terminatedPhenylmethylsiloxane-DiPhenylsiloxane copolymer
polyPhenylmethylsiloxane, epoxypropoxypropyl terminatedPhenylMethylsiloxane, hydride terminatedpolyPhenylMethylsiloxane homopolymer, vinyl terminatedVinylPhenylsiloxane - PhenylMethylsiloxane, VinylPhenylMethyl TerminatedFluorocarbon-Fluorosilicone Grease
polyDiEthoxysiloxane homopolymers and copolymers
polyDiMethoxysiloxane homopolymer
polyDiEthoxysiloxane - s-Butylaluminate copolymer
polySilazanes
polySilanes
polyAlkoxytitanate polymers and copolymers
Phenyl T-branched silsesquioxane
Tetrachlorophenylsilsesquioxane-Dimethylsiloxane copolymer(Methacryloxypropyl)Methylsiloxane-Dimethylsiloxane copolymer
Methacryloxypropylsilsesquioxane-Dimethylsiloxane copolymer
Silicone-Organic Hybrids with Hydrolyzable Functionality
1,3-Bis(Tridecafluorooctyl)Tetramethyldisiloxane
Volatile Cyclic Dimethylsiloxanes
Peroxide catalysts dispersed in silicone
Platinum catalysts(Mercaptopropyl)Methylsiloxane-Dimethylsiloxane copolymer
Tin catalysts
Silanol-Trimethylsilyl Modified Q resins
polyBoroDiPhenylsiloxane
polyEthylene, trimethoxysilyl modified
poly1,2-Butadiene, triethoxysilyl modified
poly1,2-Butadiene, diethoxymethylsilyl modified
polyEthyleneimine, trimethoxysilylpropyl modified
polyEthyleneimine, dimethoxymethylsilyl modifiedpoly(Trimethylsilylpropyne)(Dimethylsiloxane)-(Bisphenol-A carbonate) copolymer
poly(Dimethylsiloxane)Etherimide copolymer
T-resins (Silsesquioxanes polymers), liquid
polyTriethoxysilylethylene - 1.4-BUTADIENE - STYRENE terpolymer

476
481
499
551
482
536
474
474
510
510
496
550
474
474
499, 526
474
516
506
496
496
478
536
536
536
541
541
536
482
474,482
522
522
542
478
472
549
545
524
548
510
544
543
543
543
543
543
544
544
544
538
543

O
O
F

MMA-131
MTT-1015
MTV-112OMBO037
OTT-1012 - OTT-1023
PAN-040
PDM-0421 - PDM-1922
PDM-7040 - PDM-7050
PDS-0338 - PDS-1615
PDS-9931
PDV-0325 - PDV-2335
PGWHT01-PGXRA01
PMM-0011 - PMM-0025
PMM-1015 - PMM-6025
PMM-HV12
PMP-5025
PMS-E11 - PMS-E15
PMS-H03 - PMS-H11
PMV-9925
PVV-3522
PP1-LUB01
PSI-021 - PSITI-019
PSI-026
PSIAL-007
PSN-2H01.2 - PSN-2M11
PSS-1C01 - PSS-1P11
PTI-008 - PTI-023
PTT-1012 - PTT-1025
PTT-1117
RMS-033 - RMS-083
RTT-1011
SIB1660.0 - SIB1824.82
SIB1816.0
SID2650.0 - SIO6700.0
SID3352.0 - SID3379.0
SIP6829.2 - SIP6833.2
SMS-022 - SMS-992
SNB1100 - SNT7955
SQD-225 - SQT-221
SSP-040
SSP-050
SSP-055 - SSP-056
SSP-058
SSP-060
SSP-065
SSP-070
SSP-080
SSP-085
SLT-3A101 - SLT-3A802
SSP-255

PR

Inert
Inert
Reactive
Reactive
Inert
Reactive
Inert
Inert
Reactive
Reactive
Reactive
Reactive
Inert
Inert
Reactive
Inert
Reactive
Reactive
Reactive
Reactive
Inert
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Inert
Inert
Reactive
Reactive
Reactive
Inert
Inert
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive

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555

SST-3M01 - SST-3ROI
SST-3MH1.1
SST-3P01
SST-3PM1
SST-3PM2
SST-3PP1
SST-3PV1
SST-BAE1.2
SST-BBE1.2
SST-BCE1.2
SST-A8C42 - SST-V8V01
UCS-052
UMS-182 - UMS-992
UTT-1012

T-resins (Silsesquioxane polymers), solid
Methylsilsesquioxane-Hydridosilsesquioxane copolymer
polyPhenylsilsesquioxane
Phenylsilsesquioxane-Methylsilsesquioxane copolymer
Phenylsilsesquioxane-Dimethylsiloxane copolymer
Phenylsilsesquioxane-Propylsilsesquioxane copolymer
Phenylsilsesquioxane-Vinylsilsesquioxane copolymer
poly(2-Acetoxyethylsilsesquioxane)
poly(2-Bromoethylsilsesquioxane)
poly(2-Chloroethylsilsesquioxane)
T8 cube silsesquioxanes
3-Acryloxy-2-hydroxypropoxypropyl)Methylsiloxane-Dimethylsiloxane copolymer(Acryloxypropyl)Methylsiloxane-Dimethylsiloxane copolymer
Acryloxypropylsilsesquioxane-Dimethylsiloxane copolymer

538
538
538
538
538
538
538
539
539
539
540
522
522
522

O
O
F

Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive

VAT-4236

Vinylmethylsiloxane - Octylmethylsiloxane - Dimethylsiloxane terpolymer

501

VDH-422

Vinylmethylsiloxane - Dimethylsiloxane copolymer, hydride terminated499

Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Reactive
Inert
Inert

VDS-1013
VDT-123 - VDT-5035
VDV-0131
VEE-005
VGF-991
VGM-021
VGP-061
VMM-010
VMS-005
VMS-T11
VPE-005
VPT-1323
VQM-135 - VQX-221
VTT-106
UBS-0541 - UBS-0822
WSA-7011 - WSAV-6511
XMS-5025.2
YAD-122 - YBD-125
YMS-T31

VinylMethylsiloxane-Dimethylsiloxane copolymers, silanol terminatedVinylMethylsiloxane-Dimethylsiloxane copolymers, trimethylsiloxy terminatedVinylMethylsiloxane-Dimethylsiloxane copolymers, vinyl terminated
polyVinylEthoxysiloxane, ethoxy terminated
TrifluoropropylMethylsiloxane-VinylMethylsiloxane copolymer, gum
VinylMethylsiloxane-Dimethylsiloxane copolymer, gum
VinylMethylsiloxane-DiPhenylsiloxane-Dimethylsiloxane terpolymer, gum
polyVinylMethoxysiloxane, methoxy terminated
polyVinylMethylsiloxane, cyclic
polyVinylMethylsiloxane, trimethylsiloxy terminated
polyVinyl-PropylEthoxysiloxane, ethoxy terminatedVinylMethylsiloxane-PhenylMethylsiloxane-Dimethylsiloxane terpolymer
Vinyl Q Resin Dispersions
Vinyl T branched polyDimethylsiloxane, trimethylsiloxy terminated(Tetramethylpiperidinyl)oxypropylMethylsiloxane - Dimethylsiloxane copolymers
Aminoalkylsilsesquioxanes in aqueous solution
MethoxyMethylsiloxane-Dimethylsiloxane copolymer
PyrrolidonepropylMethylsiloxane-Dimethylsiloxane copolymer
polyCyanopropylMethylsiloxane homopolymer

497
497
497
501
498
498
498
501
499
499
501
501
498
499
514
532
525
480
480

PR

Reactive
Reactive

General Index and Search Functions

An interactive data base with the ability to search by name,
CAS#, Product Code, Structure, Substructure and Empirical formula
is available on the Gelest website: www.Gelest.com
An explanation of the website functionality is found on pages 13-15.

556

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PERFORMANCEPRODUCTS

O
O
F

Pt

Molecular and Thin
Film Coatings

Thick Film Coatings
for Thermal,
Mechanical and
Optical Properties

PR

Pt

Pt

Clear Gels

Clear Encapsulants
Microfluidic
Elastomers
High Strength
Encapsulants

PERFORMANCE PRODUCTS

Contents

Molecular and Thin Film Coatings for Surface Modification
Aquaphobe® CM
Aquaphobe® CF
Glassclad® 18
Siliclad®
Siliglide™ 10
Aquaphile™ AQ

water-repellent molecular films for glass and vitreous surfaces
water-repellent and oleophobic molecular films for vitreous surfaces
water-repellent, dielectric films for glass including fluorescent lights
water-repellent, low friction films with anti-stiction properties
low-friction, “glide” surfaces for glass, vitreous and metal substrates
water-wettable anti-fog coating for glass and ceramics

559
560
561
562
563
564

O
O
F

Thin Films for Dielectric, Mechanical and Optical Properties
Seramic™ SI
Seramic™ SI-A
Seramic™ BST
Hardsil™ AM
Hardsil™ AP
Hardsil™ AR

dielectric, thermally resistant SiO2 coatings
dielectric, thermally resistant SiO2 coatings, deep UV curable
high dielectric constant barium/strontium titanate films
scratch and abrasion resistant coating for polycarbonateshigh refractive index protective coating for thermoplastics
scratch, abrasion and heat resistant coating for optical surfaces

565
566
567
568
569
570

Thick Film Coatings for Thermal, Mechanical and Optical Properties
SiBrid® TI
Zipcone™ CE
Zipcone™ CG
Zipcone™ FA
Zipcone™ FN
Zipcone™ TC
Zipcone™ TR
Zipcone™ UA
Zipcone™ UE
Clear Gels

571
572
573
574
575
576
577
578
579

optically clear 1.41 deformable silicone gel - moderate penetration
optically clear 1.41 deformable silicone gel - high penetration
optically clear 1.38 deformable silicone gel - moderate penetration
optically clear 1.43 deformable silicone gel - moderate penetration

580
580
581
581

PR

Gelest® Gel D200
Gelest® Gel D300
Gelest® Gel F065
Gelest® Gel P065

high gas permeability, high strength films and coatings
low viscosity conformable coating for device protection
intermediate viscosity conformable coating for device protection
adhesive filler-free silicone films for glass and compatible metals
filler-free silicone release films for glass and compatible metals
thermally conductive, dielectric opaque coating
thermally reflective, dielectric opaque coating
UV cure optical coating for solvent-sensitive plastics
UV cure transparent coating with scratch resistance

Clear Encapsulants
Gelest® CC
Gelest® OE41
Gelest® OE41.2
Gelest® OE41.4
Gelest® OE41.6
Gelest® OE41.7
Gelest® OE42
Gelest® OE43

clear 1.53 high modulus casting and impregnation resin for high temperature applications
optically clear 1.41 flexible 2-component low temperature cure
optically clear 1.41 flexible 2-component room temperature cure
optically clear 1.41 flexible 2-component extended cure
optically clear 1.41 flexible low volatility 2-component low temperature cure
optically clear 1.41 flexible 1-component solvent-borne low temperature cure
optically clear 1.42 flexible 2-component low temperature cure
optically clear 1.43 flexible 2-component low temperature cure

582
583
583
583
583
583
584
584

High Strength Encapsulants – Microfluidic Elastomers
Gelest® RG01
Gelest® RG02
Gelest® RG03

translucent, high-strength reprographic grade encapsulant
translucent, high-strength reprographic grade encapsulant, oleophilictranslucent, high-strength reprographic grade encapsulant, hydrophilic

585
585
585

fluorocarbon-fluorosilicone light greaseadhesive/primer for glass to organic polymers and polymer coatingspure silicone fluids for refractive index requirements

586
587
487

Selected Products

Gelest® PP1-LUB01
SiBrid® Primer A1
Optical Silicone Fluids
558

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Enabling Your Technology

Gelest Aquaphobe® CM
Hydrophobic Treatments For Glass and Ceramics
Features: Provides water-repellent silicone, molecular films with high durability for glass and vitreous
surfaces. Acidic byproducts remove surface alkali from soda-lime glass substrates.

Capsular
Description:OOF

Applications:
Laboratory Glassware - improves drainage, reduce breakage.
Optical Fibers - reduces moisture adsorption and surface fracture.
Clinical Analysis - reduces protein and lipid adsorption. (Not for food or drug use.)
Glass Plate and Glazing - provides high water contact angle, facilitate forced air blow-off.
Thickness

molecular

Cure

Hardness

air/moisture

low

Type
100% active
1-partAquaphobe® CM chlorinated polydimethylsiloxane

Description
Aquaphobe® CM is a chlorine terminated polydimethylsiloxane
oligomer. The chlorines react with hydroxy and silanol groups ofglass, siliceous surfaces and other metal oxide surfaces to form achemically bound polydimethylsiloxane “siliconized” surface.
Properties of Treated Surfaces(Values reported are for glass slides dipped in 1% solutions ofAquaphobe® CM and cured at 100°C.)
Critical Surface Tension
untreated
gc = 78 dynes/cm
treated (hydrophobic)
gc = 25 dynes/cm

PR

Typical Properties of Aquaphobe™ CM% active100%
flashpoint
15°C
specific gravity
0.99-1.01
viscosity
3-6 cSt.

Standard Packaging
PP1-AQCM Aquaphobe® CM
100g / ¥10,300
1kg / ¥57,900
18kg/commercial package / inquire

Cautions

Aquaphobe® is a mixture of corrosive chlorinated polysiloxanes. Avoid skin and eye contact. Use in a well ventilated area.
Wear gloves and safety glasses.
Application Methods

1. Aquaphobe® coatings are most frequently applied as a 2-10% solution in dry solvents such as hexane, methylene chloride or toluene.
Articles are dipped or wiped. Articles can be cured by air drying for 24 hours at conditions of <75% relative humidity. Heat curing at
110°C for 15-20 minutes in an exhausted oven provides the most effective surface treatment.
2. A master batch of Aquaphobe® in isopropanol or ethanol is desirable when large areas are to be treated and the acidic byproducts are
difficult to handle. A 0.5-2.0% solution in isopropanol is prepared in a well-ventilated area. Hydrogen chloride fumes issue during thisstage. Acidic character is reduced for subsequent surface treatment.
Over treatment results in a cloudy surface. The concentration should be reduced to eliminate this effect.
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559

Gelest Aquaphobe® CF
Hydrophobic and Oleophobic Treatments For Glass and Ceramics
Features: Provides water-repellent, fluorinated silicone molecular films with high durability for glass and vitreous
surfaces. Acidic byproducts remove surface alkali from soda-lime glass substrates.

Capsular
Description:OOF

Applications:
Microcontact Printing - provides durable release films for photocureable resins.
Optical Fibers - reduces moisture adsorption and surface fracture.
Clinical Analysis - reduces protein and lipid adsorption. (Not for food or drug use.)
Glass Plate and Glazing - provides high water contact angle, facilitate forced air blow-off.
Thickness

molecular

Cure

Hardness

air/moisture

low

Type
100% active
1-partAquaphobe® CF chlorinated fluoroalkylmethylsiloxane

Description
Aquaphobe® CF is a chlorine terminated polyfluoroalkyl-methylsiloxane
oligomer. The chlorines react with hydroxy and silanol groups of glass,siliceous surfaces and other metal oxide surfaces to form a chemicallybound, low surface energy, fluorinated silicone surface.
Properties of Treated Surfaces(Values reported are for glass slides dipped in 1% solutions ofAquaphobe® CF and cured at 100°C.)
Critical Surface Tension
untreated
gc = 78 dynes/cm
treated (hydrophobic)
gc = 16-19 dynes/cm
Typical Properties of Aquaphobe® CF% active100%
flashpoint
65°C
specific gravity
1.40-1.43
refractive index
1.358
viscosity
6-10 cSt.

PR

Application and Reference Data:
J. Taniguchi et al, Jpn. Soc. Appl. Phys. 2002, 41, 4194, Part 1, No. 6B.

Standard Packaging

PP1-AQCF Aquaphobe® CF
25g / ¥25,200
100g / ¥73,700

Cautions

Aquaphobe® is a mixture of corrosive chlorinated polysiloxanes. Avoid skin and eye contact. Use in a well ventilated area.
Wear gloves and safety glasses.
Application Methods

1. Aquaphobe® coatings are most frequently applied as a 2-10% solution in dry solvents such as hexane, methylene chloride or toluene.
Articles are dipped or wiped. Articles can be cured by air drying for 24 hours at conditions of <75% relative humidity. Heat curing at
110°C for 15-20 minutes in an exhausted oven provides the most effective surface treatment.
2. A master batch of Aquaphobe® in isopropanol or ethanol is desirable when large areas are to be treated and the acidic byproducts are
difficult to handle. A 0.5-2.0% solution in isopropanol is prepared in a well-ventilated area. Hydrogen chloride fumes issue during thisstage. Acidic character is reduced for subsequent surface treatment.
Over treatment results in a cloudy surface. The concentration should be reduced to eliminate this effect.
560

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Enabling Your Technology

Gelest Glassclad®18

Hydrophobic Water-Dispersible Coatings For Glass and Ceramics
Features: Provides water-repellency, lubricity, surface resistivity to glass and vitreous surfaces.

Capsular
Description:OOF

Applications:
Laboratory Glassware - improves drainage, reduces breakage.
Optical Fibers - provides lubricity and reduces breakage during fabrication and operational flexing.
Clinical Analysis - decreases protein adsorption of analytical and diagnostic equipment, decreases
hemolysis and increases clotting time of blood. Glassclad®18 is not for food or drug use.
Fluorescent Light Bulbs - increases scratch resistance, reducing breakage, increases surface resistivity.
Porcelain Ware - provides a glide surface and reduces adhesion to other porcelain ware.
Thickness

molecularCure

air/moisture

HardnessTypesolvent-borne
1-partlow

Description
Glassclad®18 is a monomeric octadecylsilane derivative in a mixture of
t-butanol and diacetone alcohol that reacts with water to form a silanol-rich
prepolymer. The silanol-rich prepolymer condenses with available hydroxyl
groups of siliceous substrates to form a chemically bound alkylsilicone.

Solution Properties of Glassclad®18
solidscolor, gardner scalespecific gravity
flashpoint
viscosity
pour point

Properties of Treated Surfaces
Values reported are for glass slides dipped in 1% solutions of Glassclad®18
and cured 5 minutes at 100°C.

Application and Reference Data:
B. Arkles et al in “Silanes, Surfaces, Interfaces” D. Leyden ed, Gorden &Breach, 1986, p91.

Critical Surface Tension
untreated
gc = 78 dynes/cm
treated (hydrophobic)
gc = 31 dynes/cm
Surface Resistivity
untreated
1 x 1012 ohms
treated
1.2 x 1013 ohms
Coefficient of Friction, Static (glass slide on glass slide)untreated
0.9-1.0
treated
0.2-0.3
Blood Protein Adsorption(comparative 100 hour adsorption value for whole human blood on borosilicate glass surfaces)
untreated
0.13mg/mm2
treated
0.01-0.02mg/mm2

Shelf Life of Glassclad®18
The shelf life of Glassclad®18 is six months in sealed containers. The
product is normally hazy. A small amount of precipitate does not affectthe performance of the solution.

PR

Glassclad®18 Hydrophobic Coating

20%
8
0.88
10°C
8-20 cSt.
4°C

Standard Packaging

PP1-GC18 Glassclad®18
100g / ¥8,800
1.5kg / ¥51,100
15kg/commercial package / ¥206,000
180kg/commercial package / inquire

Application Methods
Glassclad®18 is most frequently used as a dilute aqueous dispersion containing 0.1-1.0% of reactive silane. A 0.2% solution of active chemical can be easily prepared by adding one part by weight of the product as supplied to 99 parts of water while stirring. The following treatment method is frequently employed.
1. Thoroughly clean objects with an alkaline detergent. Used or old glass surfaces may require immersion in 2-3% sodium hydroxide. All detergent andalkali should be removed with a final rinse.
2. Prepare a 1% solution of Glassclad®18 in water. Ordinary tap water is acceptable. “Hard water” or “fluoridated water,” is not acceptable.
3. Immerse the glass or vitreous surface in the solution for 5-10 seconds, ensuring that all surfaces are wetted by the solution. Agitation of the solution
or the object generally results in more uniform deposition. After immersion, remove the part and gently but thoroughly rinse with water to remove
excess Glassclad®18 from the surface.
4. Cure Glassclad®18 by bringing surface temperature to 100°C for 3-5 minutes. Room temperature cure may be accomplished by air drying for 24 hours
if relative humidity is 65% or less.
Each liter of solution will coat approximately 80 one liter beakers, 600 15cm test tubes, or approximately 250 m2 of surface.
®

Stability of Glassclad 18 Solutions
Aqueous solutions are not stable and will turn cloudy and precipitate after standing for several days. The solution stability can be optimized by adjusting
pH to 4.5-5.
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561

Gelest Siliclad®
Hydrophobic Water-Dispersible Coatings For Glass and Ceramics
Features: Provides water-repellency, lubricity, surface resistivity to glass and vitreous surfaces.

O
OF

Applications:
Semiconductor Substrates - provides hydrophobic anti-stiction coatings for silicon.
Laboratory Glassware - improves drainage, reduces breakage.
Optical Fibers - provides lubricity and reduces breakage during fabrication and operational flexing.
Clinical Analysis - decreases protein adsorption of analytical and diagnostic equipment decreases
hemolysis and increases clotting time of blood. Siliclad® is not for food or drug use.
Porcelain Ware - provides a glide surface and reduces adhesion to other porcelain ware.
Capsular
Description:

Thickness

molecularCure

air/moisture

Siliclad® Hydrophobic Coating

Description®
Siliclad is a monomeric octadecylsilane derivative in a mixture of tertiary alcohols
and diacetone alcohol that reacts with water to form a silanol-rich prepolymer.
The silanol-rich prepolymer condenses with available hydroxyl groups of siliceous
substrates to form a chemically bound alkylsilicone.
Properties of Treated Surfaces®
Values reported are for glass slides dipped in 1% solutions of Siliclad and cured
5 minutes at 100°C.

low

Type
solvent-borne
1-partSolution Properties of Siliclad®
solids20%
color, gardner scale
7
specific gravity
0.88
flashpoint
25°C
viscosity
8-20 cSt.

Application and Reference Data:
Almanza-Workman, A. et al. J. Electrochem. Soc. 2002 149, H6.
Rojas, E. et al. J. Coll. and Interface Sci. 2006, 301, 617.
®

Shelf Life of Siliclad ®
The shelf life of Siliclad is six months in sealed containers. The product isnormally hazy.
A small amount of precipitate does not affect the performance of the solution.
Standard Packaging®

SIS6952.0 Siliclad

100g / ¥8,800
1.5kg / ¥54,000
15kg/commercial package / ¥213,000

PR

Critical Surface Tension
untreated
gc = 78 dynes/cm
treated (hydrophobic)
gc = 31 dynes/cm
Surface Resistivity
untreated
1 x 1012 ohms
treated
1.2 x 1013 ohms
Coefficient of Friction, Static (glass slide on glass slide)untreated
0.9-1.0
treated
0.2-0.3
Blood Protein Adsorption(comparative 100 hour adsorption value for whole human blood on borosilicate
glass surfaces)
untreated
0.13mg/mm2
treated
0.01-0.02mg/mm2

Hardness

Application
Methods®
Siliclad is most frequently used as a dilute aqueous dispersion containing 0.1-1.0% of reactive silane. A 0.2% solution of active chemical can be easily prepared by adding one part by weight of the product as supplied to 99 parts of water while stirring. The following treatment method is frequently employed.
1. Thoroughly clean objects with an alkaline detergent. Used or old glass surfaces may require immersion in 2-3% sodium hydroxide. All detergent and alkali should be
removed with a final rinse.
®
2. Prepare a 1% solution of Siliclad in water. Ordinary tap water is acceptable. “Hard water” or “fluoridated water,” is not acceptable.
3. Immerse the glass or vitreous surface in the solution for 5-10 seconds, ensuring that all surfaces are wetted by the solution. Agitation of the solution
or the object®
generally results®in more uniform deposition. After immersion, remove the part and gently but thoroughly rinse with water to remove excess Siliclad from the surface.
4. Cure Siliclad by bringing surface temperature to 100°C for 3-5 minutes. Room temperature cure may be accomplished by air drying for 24 hours if relative
humidity is 65% or less.
Each liter of solution will coat approximately 80 one liter beakers, 600 15cm test tubes, or approximately 250 m2 of surface.
®

Stability of Siliclad Solutions
Aqueous solutions are not stable and will turn cloudy and precipitate after standing for several days. The solution stability can be optimized by adjusting pH to 4.5-5.

562

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Enabling Your Technology

Siliglide™ 10
Release and Slip Coating For Glass, Ceramics and Nonferrous Metals
Features: Provides a low coefficient of friction molecular film with a “glide” surface for glass, vitreous and metal
substrates.

Capsular
Description:OOF

Applications:
Display Glass - provides a smooth tactile surface, low surface conductivity and improved scratch resistance.
Ceramic Parts - reduces contact binding and adhesion, reduces scratching.
Nonferrous - provides a clear high water contact angle with excellent release properties.

Thickness

molecularCure

air/moisture

Hardness

high

Type
solvent-borne
1-partSiliglide™ 10

Description
Siliglide™ 10 is a siloxane modified polysilazane that reacts withglass, siliceous surfaces and other metal oxide surfaces to form achemically bound polymethylsiloxane resin “siliconized” surface.
The cure is activated by small quantities of water normally foundon the surfaces of substrates.
Properties of Treated Surfaces(Values reported are for glass slides dipped in 5% solutions of
Siliglide™ 10 and cured at room temperature for 30 minutes)
Critical Surface Tension
untreated
gc = 78 dynes/cm
treated (hydrophobic)
gc = 25 dynes/cm

PR

Typical Properties of Siliglide™ 10% active5%
flashpoint
26°C
specific gravity
0.89-0.90
viscosity
1-2 cSt.
PP1-SG10 Siliglide™ 10100g / ¥10,300
1kg / ¥57,900

Cautions

Siliglide™ 10 is a dispersion in flammable solvents. Avoid skin and eye contact. Use in a well ventilated area wearing gloves andsafety glasses.
Application Methods

1. Siliglide™ 10 coatings are most frequently applied as supplied or diluted to a 1-2% solution in dry solvents such as mineral spirits oresters such as isobutyl acetate. Articles are dipped or wiped. Articles can be cured by air drying for 25 minutes at conditions of <75%
relative humidity. Buffing or wiping the surface with a soft rag during cure optimizes release by insuring a thin film covers surface
imperfections. Over treatment results in a cloudy surface. The concentration should be reduced to eliminate this effect.
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563

Gelest Aquaphile™ AQHydrophilic Treatment For Glass and Ceramics
Features: Provide water-wettable silicone molecular films with high durability for glass and vitreous surfaces.

Capsular
Description:OOF

Applications:
Optical Lenses - provides an anti-fog coating.
Clinical Analysis - provides non-specific (albumin-like) binding of proteins and DNA.
(Not for food or drug use.)Thickness

molecularCure

air/moisture

HardnesslowTypesolvent-borne
1-partGelest Aquaphile™ AQPolyamine functional silane that provides low-contact
angle surfaces

Description
Aquaphile™ AQ is a partially quaternized polyamine functionalsilane in isopropanol. Air-dried films bond tenaciously to glass andceramic substrates by reacting with hydroxy and silanol groups.
Properties of Treated Surfaces(Values reported are for glass slides dipped in solutions ofAquaphile™ AQ and cured at room emperature for 4 hours.)

PR

Typical Properties of Aquaphile™ AQ% active25%
flashpoint
12°C
specific gravity
0.84-0.86
viscosity
PP1-AQAQ Aquaphile™ AQ
100g / ¥9,800
1kg / ¥50,500

Cautions

Aquaphile™ AQ is dispersed in isopropanol, a flammable solvent. Avoid skin and eye contact. Use in a well ventilated area
wearing gloves and safety glasses.
Application Methods

Aquaphobe™ coatings are most frequently applied directly or as a 10-20% mixture with dry alcohol . Articles are dipped or wiped.
Articles can be cured by air drying for 4 hours at conditions of <75% relative humidity. Heat curing at 90-100°C for
10-15 minutes in an exhausted oven provides the most effective surface treatment.
Over treatment results in a cloudy surface. The concentration should be reduced to eliminate this effect564

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Enabling Your Technology

Gelest Seramic™ SI
High Density Silicon Dioxide Films
Features: Provides thermally resistant dielectric coatings by dip or spin-on application.

Capsular
Description:OOF

Applications:Electronics - provides dielectric layers for capacitors and other critical insulation applications.
Optics - provides overcoats for glass and quartz for index matching applications and as diffusion barriers.

Thickness

thin

Cure

thermalor UV

Hardness

high

Type
solvent-borne
1-partSeramic™ SI Silicon Dioxide Precursor

Description
Seramic™ SI is a β-chloroethylsilsesquioxane solution
in methoxypropanol.
Film Properties
color
dielectric constantrefractive index
uncured films:
cured films:

1.51
2.1-2.2

Solution Properties
form
solidsdensity
viscosity
flashpoint

solution
14-16%
0.96 g/cc
3-5 cSt.
35°C

clear
3.2-3.6

PR

Shelf life: 6 months when stored below 5°C in sealed containers.
Containers should be warmed to 15°C before opening to reducecondensation of water.
Standard Packaging
PP1-SESI Seramic™ SI
100g / ¥24,100750g / ¥102,800

Cautions

Use in a well ventilated area.
Flammable.
Avoid contact with skin and eyes.
Application Methods

Thermal- Gelest Seramic™ SI is applied as a coating by dipping or spin-on. After solvent evaporation, the system cures in 30-60 minutes
at 300°C. As supplied, typical film deposition is 1500-2000 Å by spin-on application. Thinner films may be prepared by diluting withmethoxypropanol or diglyme. The cure process liberates small amounts of ethylene and hydrogen chloride.
UV- Gelest Seramic™ SI is converted to silicon dioxide on exposure to deep UV (<210nm). Exposed areas are insoluble, while
unexposed areas may be removed by a solvent wash.
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565

Gelest Seramic™ SI-A
High Density Silicon Dioxide Films
Features: Provides thermally resistant dielectric coatings by dip or spin-on application.
Applications:Electronics - provides dielectric layers for capacitors and other critical insulation applications.
Optics - provides overcoats for glass and quartz for index matching applications and as diffusion barriers.
Thickness

Cure

HardnessTypesolvent-borne
1-partO
OF

Capsular
Description:

thin

thermalhighSeramic™ SI-A Silicon Dioxide Precursor
Description
Seramic™ SI-A is a β-acetoxyethylsilsesquioxane solution
in methoxypropanol.
Film Properties
color
clear
dielectric constant
3.2-3.6
refractive index
uncured films:
1.40-1.45
cured films:
2.1-2.2
Solution Properties
form
solutionsolids18-20%
density:
0.97g/cc
viscosity:
3-5 cSt.
flashpoint
35°C
Application and Reference Data:
Ezbiansky, K. et al. MRS. Symposium Proc. 2000, 606, 251.

PR

Shelf life: 6 months when stored below 5°C in sealed containers.
Containers should be warmed to 15°C before opening to reducecondensation of water.
Standard Packaging
PP1-SESIA Seramic™ SI-A
100g / ¥25,700
750g / ¥132,500

Cautions

Use in a well ventilated area.
Flammable. Avoid contact with skin and eyes.
Application Methods

Thermal- Gelest Seramic™ SI-A is applied as a coating by dipping or spin-on. After solvent evaporation, the system cures in 30-60 minutes
at 350°C. The conversion temperature can be reduced to below <250°C by incorporation of 2% tetrabutylammonium fluoride. Films cured
by catalysis have no absorption >190nm. As supplied typical film deposition is 1500-2000 Å by spin-on application. Thinner films may be
prepared by diluting with methoxypropanol or diglyme. The cure process liberates small amounts of ethylene and acetic acid.
UV- Gelest Seramic™ SI-A is converted to silicon dioxide on exposure to deep UV (<240nm). Exposed areas are insoluble, while unexposed areas may be removed by a solvent wash.
566

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Enabling Your Technology

Gelest Seramic™ BST
High Dielectric Constant Barium Strontium Titanate Films
Features: Provide thermally resistant dielectric coatings by dip or spin-on application.
Applications:Electronics - provides high dielectric constant layers for capacitors and electroluminescent applications.
Optics - provide overcoats for glass and quartz for index matching applications and as diffusion barriers.

Capsular
Description:O
OF

MEMS - reduces driving voltage in electrowetting applications.
Thickness

thin

Cure

thermalHardness

high

Type
solvent-borne
1-partSeramic™ BST Barium Strontium Titanate Precursor

Description
Seramic™ BST is mixed barium strontium and titanium double metal
alkoxides in a solution of higher alcohols. Cure is two-stage, moisture
followed by thermal.
Film Properties
color
metal atom ratio
refractive Index:

clear
0.5:0.5:1.0 Ba:Sr:Ti
1.8-1.9

Solution Properties
form
amber solution
solids36-40%
flashpoint:
39°C
density:
1.00g/cc
grams of BaSr0.5Ti0.5O3 per 100 grams sol’n
11.0-12.0

PR

Application and Reference Data:
Vasudev, A. et al, J. Micromech. And Microeng., 2009, 19, 075005.

Shelf life: 6 months when stored below 5°C in sealed containers. Containers
should be warmed to 15°C before opening to reducecondensation of water.
Standard Packaging
PP1-SEBS Seramic™ BST
100g / ¥32,600
1kg / ¥175,500

Cautions

Use in a well ventilated area.
Flammable.
Avoid contact with skin and eyes:
Application Methods

Gelest Seramic™ BST is applied as a coating by dipping or spin-on. After solvent evaporation at 40-60% RH, the system cures in
15 minutes at 650°C. As supplied, typical film deposition is 1200-1500 Å by spin-on application at 3000rpm. Thinner films may
prepared by diluting with methoxypropanol or diglyme.
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567

Gelest HardSil™ AM
Silicone Resin Hard Coatings
Features: Provides clear silicone hard coat with excellent optical properties. HardSil™ A series are curable polysilsesquioxane T-resins with excellent abrasion resistance.

Capsular
Description:OOF

Applications:
Optical Thermoplastics - provides effective scratch-resistant coatings with good weather resistancefor polycarbonates and polyacrylates. Examples include glazing, windscreen,computer screen and ophthalmic applications.
Laminated Structures - hard, heat resistant impregnants for continuous exposures up to 360°C.
Thicknessthin-thickCurethermalHardness

high

Type
solvent-borne
1-partHardSil™ AM Abrasion Resistant Coating - Thermal Cure

Description
HardSil™ AM is a primerless acrylated silicone nanocomposite
dispersed in a mixture of alcohols including methanol, n-butanol
and isopropanol. The nanocomposite structure imparts scratch
resistance to a clear film structure.
Film Properties
Color
Abrasion Resistance,
Taber 500 cycles 500g CS10F

5

Solution Properties
Form
SolidsFlashpoint
Specific Gravity
Viscosity

solution
19-21%
19°C
0.91
5-15 cSt.

PR

clear

Shelf life: 3 months when stored below 5°C in sealed containers.
Containers should be warmed to 15°C before opening to reducecondensation of water.
Standard Packaging
PP1-HSAM HardSil™ AM
100g / ¥13,800
750g / ¥60,900
10kg/commercial package / inquire

Cautions

Use in a well ventilated area.
Flammable.
Avoid contact with skin and eyes.
Application Methods

Gelest HardSil™ AM is applied as a coating by spraying, dipping or brushing. After solvent evaporation, the system cures in
30-60 minutes at 125-140°C. As supplied, typical film deposition is 6-8 microns. Thinner films may be prepared by diluting withmethoxypropanol or isopropanol.
568

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Enabling Your Technology

Gelest HardSil™ AP
Silicone Resin Hard Coatings
Features: Provides clear silicone hard coat with excellent optical properties. HardSil™ AP series are curable
polysilsesquioxane T-resins with excellent abrasion resistance.

Capsular
Description:OOF

Applications:
Optical Thermoplastics - provides effective scratch-resistant coatings with good weather resistancefor polycarbonates and polyacrylates. Examples include glazing, windscreen,computer screen and ophthalmic applications.
Laminated Structures - hard, heat resistant impregnants for continuous exposures up to 360°C.
Microfluidics - Forms bonded silsesquioxane layers which may be plasma treated.
Thicknessthin-thickCurethermalHardness

high

Type
solvent-borne
1-partHardSil™ AP Abrasion Resistant Coating - Thermal Cure

Description
HardSil™ AP is a primerless phenyl modified silicone dispersed inmethoxypropanol for continuous use at temperatures up to 360°C.
Film Properties
Color
Hardness, Rockwell R
Tensile Strength
Refractive Index

clear
120R
3500psi
1.54-1.56

Solution Properties
Form
SolidsFlashpoint
Specific Gravity
Viscosity

liquid
20%
35°C
0.95
3-5 cSt.

PR

Application and Reference Data:
Leichle, T. et al, Sensors and Actuators B: Chemical, 2012, 161, 805.

Shelf life: 12 months when stored below 25°C in sealed containers.
Keep container sealed after dispensing product.
Standard Packaging
PP1-HSAP HardSil™ AP
100g / ¥11,100750g / ¥45,000
10kg/commercial package / inquire

Cautions

Use in a well ventilated area.
Flammable.
Avoid contact with skin and eyes.
Application Methods

Gelest HardSil™ AP is applied as a coating by spraying, dipping or brushing. Material is allowed to dry for 1 hour and then cured at
240°C for 20-30 minutes. Thinner films may be prepared by diluting with methoxypropanol. Cure can be accelerated by adding 0.5%
zinc 2-ethylhexanoate.
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569

Gelest HardSil™ AR
Electrical and Optical Barrier Silicone Resin Coating
Features: A clear silicone hard coat with excellent thermal and optical properties that provides a mechanical andoxidation barrier. HardSil™ AR is a curable polysilsesquioxane T-resin modified to provide sufficient flexibility
to withstand thermal cycling associated with power-up of electrical and optical circuit components.

Capsular
Description:OOF

Applications:
Optical Components - provides effective scratch-resistant coatings with good adhesion to glass.
High refractive index provides a step-index cladding.
Electrical components - hard, heat resistant coating for thermal cycling from room temperature to
290°C. Examples include resistor and capacitor coatings.
Thicknessthin-thickCurethermalHardness

high

Type
solvent-borne
1-partHardSil™ AR High Temperature Electrical Coating Thermal Cure

Description
HardSil™ AR is a primerless modified phenyl silicone resinfor continuous use at temperatures up to 325°C, dispersed
in methoxypropanol.
clear
110
1.56-1.58
1x1013 ohm-cm

Solution Properties
Form
SolidsFlashpoint
Specific Gravity
Viscosity

liquid
20%
35°C
0.92
3-5 cSt.

PR

Film Properties
Color
Hardness, Rockwell R
Refractive Index
Volume Resistivity

Shelf life: 12 months when stored below 25°C in sealed containers.
Keep container sealed after dispensing product.
Standard Packaging
PP1-HSAR HardSil™ AR
100g / ¥11,100
1kg / ¥57,900
10kg/commercial package / inquire

Cautions

Use in a well ventilated area.
Flammable.
Avoid contact with skin and eyes.
Application Methods

Gelest HardSil™ AR is applied as a coating by spraying, dipping or brushing. Material is allowed to dry for 1 hour and then cured at
220°C for 20-25 minutes. Thinner films may be prepared by diluting with methoxypropanol. Cure can be accelerated by adding 0.5%
zinc 2-ethylhexanoate, although this will reduce volume resistivity.
570

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Enabling Your Technology

Gelest Sibrid® TI
Thermoplastic Silicone-Block Polymers
Features: Provides thin film high strength coatings and films. Sibrid® T series are fully cured thermoplastic silicone block polymers with the ability to form thin film sections combined with high permeability allowing maximum transport of water and oxygen.

Capsular
Description:OOF

Applications:Electronic Devices - strippable low dielectric constant coatings.
Microelectrodes - electrolyte confinement with high gas transport.
Membranes - form high strength, high O2 and H2O transport rate films.
Thickness

thin

Cure

Hardness

air/moisturemediumType
solvent-borne
1-partSibrid®TI Thermoplastic Silicone-Polyimide

Description
Sibrid® TI is a fully cured thermoplastic silicone-polyimide block
copolymer dissolved in N-methylpyrrolidone solvent. It is suitablefor casting or coating.
Film Properties
Color
Tensile Strength
Dielectric ConstantSpecific Gravity
Glass Transition
Permeability, O2

light gold-amber>3500 psi
2.56
1.18
168°C
35
(10-9 cc O2(RTP) cms., cm2, cmHg ∆P

PR

Solution Properties
Form
solution
Solids
14-16%
Flashpoint
86°C
Specific Gravity 1.1
Refractive Index 1.49

Standard Packaging
PP1-SBTI Sibrid® TI
100g / ¥8,500
1kg / ¥41,500
10kg/commercial package / inquire

CautionUse in a well ventilated area.
Flammable.
Avoid contact with skin and eyes.

Application Methods
Gelest Sibrid® TI is applied as a coating by spraying, dipping or brushing. The solvent is removed by evaporation at 75°C-125°C in an
exhausted oven. As supplied, typical film deposition is 25-50 microns. Thinner films (<10 micron) may be prepared by diluting with
THF, NMP or dioxane.
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571

Gelest Zipcone™ CE
Conformal Coating Pure Silicone Elastomer
Features: Provides conformal silicone elastomer films with excellent electrical properties that may be removed
mechanically or by solvent systems. Systems are high-speed moisture cure.

Capsular
Description:OOF

Applications:Electronic Devices - forms a soft conformal coating.
Temporary Conformable Gaskets and Seals - may be applied by dipping or brushing.
Thicknessthin-thickCureair/moisture

Hardnesslow

Type100% active
1-partGelest Zipcone™ CE low viscosity, solvent-freepolydimethylsiloxane RTV

Description
Zipcone™ CE is a moisture activated silicone RTV containing nofillers. In the presence of atmospheric moisture, a condensation ofsilicone prepolymers occurs. The byproduct of the cure reaction is
acetone. The system is designed as a physical and moisture barrier
for electrical and optical assemblies which can be debonded formaintenance. A UV tracer dye has been incorporated to enable
inspection of coating integrity.
Cured Properties
Tensile Strength
50psi
Elongation
40%
Durometer, Shore A
30
Volume Resistivity, ohm-cm 1x1014

PR

Uncured Properties of Zipcone™ CE
Solids97%
Viscosity
60-70 cSt.
Skin-over time
4-6 minutes
Cure time (0.25mm)
6-9 hours
Specific gravity
0.97Standard Packaging
PP1-ZPCE Zipcone™ CE
100g / ¥13,500
750g / ¥53,000
17kg/commercial package / inquire

Application Methods

Zipcone™ C series is applied by dipping, brushing, flow-coat or spin-on. Cure is at room temperature. After opening, containers should
be inerted with dry air or nitrogen before sealing, to avoid cure in the container.

572

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Enabling Your Technology

Gelest Zipcone™ CG
Conformal Coating Pure Silicone Elastomers
Features: Provides conformal silicone elastomer films with excellent electrical properties that may be removed
mechanically or by solvent systems. Systems are high-speed moisture cure.

Capsular
Description:OOF

Applications:Electronic Devices - forms a soft conformal coating.
Temporary Conformable Gaskets and Seals - may be applied by dipping or brushing.
MEMS - Ultrasonic Coupling.
Thicknessthin-thickCureair/moisture

Hardnesslow

Type100% active
1-partGelest Zipcone™ CG medium viscosity, solvent-free polydimethylsiloxane RTV

Description
Zipcone™ CG is a moisture activated 100% solids silicone RTV. In the presence of
atmospheric moisture, a condensation of silicone prepolymers occurs. The byproductof the cure reaction is acetone. The system is designed as a physical and moisture barrier
for electrical and optical assemblies which can be debonded for maintenance. A UV tracer
dye has been incorporated to enable inspection of coating integrity.
Cured Properties
Tensile Strength
Elongation
Durometer, Shore A
Volume Resistivity, ohm-cm>110psi>100%
25
3x1014PR

Uncured Properties of Zipcone™ CG
Solids100%
Viscosity
2500 cSt.
Skin-over time
5-6 minutes
Cure time (0.25mm)
6-9 hours
Specific gravity
1.03

Application and Reference Data:
Oppenheim, Z. et al, IEEE Trans. Ultrason., Ferroelectr., Freq. Control, 2003, 50(3), 805.

Standard Packaging
PP1-ZPCG Zipcone™ CG
100g / ¥15,400
1kg / ¥77,500
17kg/commercial package / inquire

Application Methods
Zipcone™ C series is applied by dipping, brushing, flow-coat or spin-on. Cure is at room temperature. After opening, containers should
be inerted with dry air or nitrogen before sealing, to avoid cure in the container.
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573

Gelest Zipcone™ FA

Filler-Free Fast-Cure Pure Silicone Elastomers
Features: Provides thick film rapid-cure pure silicone elastomers with good adhesion to metals, glass and solvent
compatible plastics and fibers. Products are free of abrasive-silica. Systems are high-speed moisture cure.

Capsular
Description:OOF

Applications:Electronic Devices - forms a soft conformal coating, free of abrasive silica.
Rubber and Plastic Overcoat - provides a uniform low-roughness coating suitable forrelease and with an exceptionally smooth touch.
Supported Membranes - filler-free silicone allows maximum transport of gases.
Thin Film Seals and Conformable Gaskets - may be applied by dipping or brushing.
Thicknessthin-thickCureair/moisture

HardnesslowTypesolvent-borne
1-partGelest Zipcone™ FA polydimethylsiloxane RTV
for maximum adhesion to polar substrates

Description
Zipcone™ FA is a moisture activated filler-free silicone RTV
dispersed in a solution of methyltetrahydrofuran. In the presenceof atmospheric moisture, a condensation of silicone prepolymers
occurs. The byproduct of the cure reaction is acetic acid which
imparts a vinegar-like odor. The system is designed for wet out
and adhesion to polar substrates.
Cured Properties
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength>100psi
>150%
>8
>5pli

PR

Uncured Properties of Zipcone™ FA
Solids48-52%
Viscosity
200-400 cSt.
Skin-over time
30-45 minutes
Cure time (0.25mm)
6-9 hours
Specific gravity
1.05
Flashpoint-11°C

Standard Packaging
PP1-ZPFA Zipcone™ FA
100g / ¥9,300
750g / ¥40,200
10kg/commercial package / inquire

Cautions

Zipcone™ F series contain flammable solvents and cure released byproducts which are eye irritants. Avoid skin and eye contact. Usein a well ventilated area wearing gloves and safety glasses. Consult MSDS of the specific product used for additional safety information.
Application Methods
Zipcone™ F series is applied by dipping, brushing or spin-on. Solvent is allowed to evaporate in an exhausted area. Cure is at room
temperature. After opening, containers should be inerted with dry air or nitrogen before sealing to avoid cure in the container.
574

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Enabling Your Technology

Gelest Zipcone™ FNFiller-Free Fast-Cure Pure Silicone Elastomer for Maximum Release
Features: Provides thick film rapid-cure pure silicone elastomers with good adhesion to metals, glass and solvent
compatible plastics and fibers. Products are free of abrasive-silica. Systems are high-speed moisture cure.

Capsular
Description:OOF

Applications:Electronic Devices - forms a soft conformal coating, free of abrasive silica.
Rubber and Plastic Overcoat - provides a uniform low-roughness coating suitable forelease and with an exceptionally smooth touch.
Supported Membranes - filler-free silicone allows maximum transport of gases.
Thin Film Seals and Conformable Gaskets - may be applied by dipping or brushing.
Thicknessthin-thickCureair/moisture

HardnesslowTypesolvent-borne
1-partGelest Zipcone™ FN polydimethylsiloxane RTV
for rapid, neutral cure, maximum release

Description
Zipcone™ FN is a moisture activated filler-free silicone RTV
dispersed in odorless hydrocarbon. In the presence of atmosphericmoisture, a condensation of silicone prepolymers occurs. The
byproduct of the cure reaction is an amine. Amine byproducts havelittle or no corrosive effects on most metals, but copper is affected.
Cured Properties
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength
Refractive Index>50psi
>150%
>5
>5pli
1.403

PR

Uncured Properties of Zipcone™ FNSolids32-35%
Viscosity
100-150 cSt.
Skin-over time
15 minutes
Cure time (0.25mm)
2 hours
Specific gravity
0.81Flashpoint
0°C

Standard Packaging
PP1-ZPFN Zipcone™ FN100g / ¥10,900
650g / ¥42,100
10kg/commercial package / inquire

Cautions

Zipcone™ F series contain flammable solvents and cure released byproducts which are eye irritants. Avoid skin and eye contact. Usein a well ventilated area wearing gloves and safety glasses. Consult MSDS of the specific product used for additional safety information.
Application Methods
Zipcone™ F series is applied by dipping, brushing or spin-on. Solvent is allowed to evaporate in an exhausted area. Cure is at room
temperature. After opening, containers should be inerted with dry air or nitrogen before sealing to avoid cure in the container.
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575

Gelest Zipcone™ TC
Fast-Cure Thermal Control White Silicone Elastomer
Features: Provides highly thermal conductivity silicone elastomeric coatings with excellent heat resistance,electrical insulation and good adhesion to a variety of substrates.

Capsular
Description:OOF

Applications:Appliances - soft white insulating coatings with a comfortable touch.
Electrical Devices and Connectors - insulating coatings with heat dissipation properties.
Thickness

thick

Cure
air/moisture

HardnessmediumType
solvent-borne
1-partZipcone™ TC Thermally Conductive Coating

Description
Zipcone™ TC is a high magnesium oxide load, oxime cure
RTV dispersed in odorless mineral spirits.
Film Properties
Color
Durometer, Shore A
Specific Gravity
Tensile strength
Elongation

white
20-25
1.2
>250psi>250%

PR

Solution Properties
Form
Liquid Dispersion
Solids65%
Viscosity
400-600 cSt.
Flashpoint
57°C
Standard Packaging
PP1-ZPTC Zipcone™ TC
100g / ¥14,600
1kg / ¥57,400

Cautions

Use in a well ventilated area.
Combustible -Avoid flame and ignition sources.
Application Methods

Zipcone™ TC is applied by brushing or dipping. Recommended coating thickness is 100 microns (4-5mils). Room temperature cureprofile at 50% R.H. is skin over: 20 min; tack free: 90 min; full cure 5 days. Thinner coatings may be applied by diluting with dry
solvents such as toluene, naptha, or hexane.

576

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Enabling Your Technology

Gelest Zipcone™ TR
Fast-Cure Highlight Reflectivity White Silicone Elastomers
Features: Provides high light reflectivity silicone elastomeric coatings with excellent heat resistance, electricalinsulation and good adhesion to a variety of substrates.

Capsular
Description:OOF

Applications:Aerospace - reflective/conductive coatings withstand weather and thermal extremes.
Electrical Devices and Connectors - insulating silicones with heat dissipation properties.
Silicone Rubber Fabrication - marking inks and seals.
Thickness

thick

Cure
air/moisture

HardnessmediumType
solvent-borne
1-partZipcone™ TR Reflective Thermal Control Coating

Description
Zipcone™ TR is a high titanium dioxide load, oxime cure RTV
dispersed in odorless mineral spirits.
Film Properties
Color
Durometer, Shore A
Specific Gravity
Tensile strength
Elongation

white
25-30
1.54
>250psi>250%

PR

Solution Properties
Form
Liquid Dispersion
Solids70%
Viscosity
500-700 cSt.
Flashpoint
57°C
Standard Packaging
PP1-ZPTR Zipcone™ TR
100g / ¥14,600
1kg / ¥72,800

CautionUse in a well ventilated area.
Combustible - Avoid flame and ignition sources.
Application Methods

Zipcone™ TR is applied by brushing or dipping. Recommended coating thickness is 100 microns (4-5mils). Room temperature cureprofile at 50% R.H. is skin over: 20 min; tack free: 90 min; full cure 5 days. Thinner coatings may be applied by diluting with dry
solvents such as toluene, naptha, or hexane.

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577

Gelest Zipcone™ UA
Ultraviolet Cure Clear Silicone Elastomer for Polymethacrylates
Features: Provide UV cure silicone elastomer coatings with high transparency and refractive index control.

Capsular
Description:OOF

Applications:
Optical Component Coating - effective cladding and elastomeric seals.
Optical Thermoplastics - provides index matching (UA) for polymethacrylates. Applications include
glazing, windscreens and computer screens.

Thicknessthin to thick

Cure

UV

HardnessmediumType

1-partZipcone™ UA Index matching - UV Cure

Description
Zipcone™ UA is a clear acrylate modified silicone designed
for UV cure.
clear
1.464
>60
80-120psi
1%

Uncured Properties
Form
SolidsViscosity
Specific Gravity
Flashpoint

liquid100%
40-180 cSt.
1.10
>65°C

PR

Film Properties
Color
Refractive Index
Hardness, Shore A
Tensile Strength
Elongation

Shelf life: 3 months when stored below 15°C in sealed,light-protected containers.
Standard Packaging
PP1-ZPUA Zipcone™ UA
100g / ¥32,600
1kg / ¥175,500

CautionUse in a well-ventilated area.
Avoid contact with skin and eyes.
Application Methods

Zipcone™ UA is applied as a coating by dipping, brushing or syringing. Exposure to UV irradiation at 250-364 nm (mercury lamp)cures the coating in <1 minute. Oxygen inhibits film formation. Nitrogen blanket or other methods of air exclusion are recommended.
578

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Enabling Your Technology

Gelest Zipcone™ UE
Ultraviolet Cure Clear Silicone Elastomers
Features: Provides an abrasion resistant UV cure silicone elastomer coatings with high transparency and refractive
index control.

Capsular
Description:OOF

Applications:
Optical Component Coating - effective cladding and elastomeric seals.
Optical Thermoplastics - provides scratch resistance for polycarbonates and polymethacrylates.
Applications include glazing, windscreens and computer screens.

Thicknessthin to thickCure

HardnessUV

mediumType

1-partZipcone™ UE Abrasion Resistant - UV Cure

Description
Zipcone™ UE is a primerless epoxycyclohexyl modified silicone
designed for UV cure.
Film Properties
Color
Abrasion Resistance,
Taber 500 cycles 500g CS10F
Refractive Index

PR

Uncured Properties
Form
SolidsViscosity
Specific Gravity
Flashpoint

clear

4-9
1.470

liquid100%
25-75 cSt.
0.99
57°C

Shelf life: 3 months when stored below 25°C in sealed,light-protected containers.
Standard Packaging
PP1-ZPUE Zipcone™ UE
100g / ¥17,000
1kg / ¥101,400

CautionUse in a well-ventilated area.
Combustible.
Avoid contact with skin and eyes.
Application Methods

Zipcone™ UE is applied as a coating by spraying, dipping or brushing. Exposure to UV irradiation at 250-300 nm (type H lamp preferred with a minimum energy density of 150mj/cm2 cures the coating in <1 minute. Thinner coatings may be applied by diluting withdry methoxypropanol or isopropanol.
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579

Gelest® GEL Series
Clear Dimethylsilicone Gel Elastomers
Features: Gels are solids with fluid characteristics. They provide mechanical protection and dampening with goodcohesion, high instantaneous deformation.

Capsular
Description:OOF

Applications:
Shock Absorption - provide a property range extending from vibration dampening to soundabsorption.
Electrical Devices - provide low stress protection to delicate components.

Thickness

thick

Cure

Pt

catalyst

Hardness

Type

low

100% active
2-partGelest® Gel D200 2-Part Silicone Gel

Gelest® Gel D300 2-Part Silicone Gel

Description
Gel D200 is a temporarily deformable medium penetration gel withtypical dimethylsilicone properties and a refractive index of 1.41.

Description
Gel D300 is a temporarily deformable high penetration gel withtypical dimethylsilicone properties and a refractive index of 1.41.

Gel Properties
Color
Refractive Index
Penetration
Specific Gravity

clear
1.407
150-250mm
0.97

Gel Properties
Color
Refractive Index
Penetration
Specific Gravity

clear
1.407
200-400mm
0.97

liquid1000 cSt

Uncured Properties
Form
Viscosity

liquid350 cSt

Uncured Properties
Form
Viscosity

Processing
Gel D300 is a 2-part addition cure system. Each system comprises
an “A” part and a “B” part which are mixed in a 10:1 ratio. After
thoroughly mixing 10 parts “A” to 1 part “B”, allow mix to de-air.
Pot life is 3-4 hours. Pour or syringe around part or into cavity.
Cure at 115-120°C for 30-60 minutes or at room temperaturefor 48 hours. If the gel is too firm (low penetration), increase theratio of A to B to 11:1, 12:1 etc.

Caution: Avoid contact with skin and eyes

Caution: Avoid contact with skin and eyes

Shelf life: 12 months when stored below 25°C in sealed containers.

Shelf life: 12 months when stored below 25°C in sealed containers.

Standard Packaging
PP2-D200 Gelest® Gel D200
1kg (910g D200A, 90g D200B) / ¥21,800

Standard Packaging
PP2-D300 Gelest® Gel D300
1kg (910g D300A, 90g D300B) / ¥23,200

PR

Processing
Gel D200 is a 2-part addition cure system. Each system comprises
an “A” part and a “B” part which are mixed in a 10:1 ratio. After
thoroughly mixing 10 parts “A” to 1 part “B”, allow mix to de-air.
Pot life is 3-4 hours. Pour or syringe around part or into cavity.
Cure at 115-120°C for 30-60 minutes or at room temperaturefor 48 hours. If the gel is too firm (low penetration), increase theratio of A to B to 11:1, 12:1 etc.

580

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Enabling Your Technology

Gelest® GEL Series
Clear Specialty Silicone Gel Elastomers
Features: Gels are solids with fluid characteristics. They provide mechanical protection and dampening with goodcohesion, high instantaneous deformation and good resilience with a wide range of chemical resistance andrefractive index control.

Capsular
Description:OOF

Applications:
Optical Component Coating - coupling media and elastomeric seals.
Shock Absorption - provide a property range extending from vibration dampening to sound absorption.
Electrical Devices - provide low stress protection to delicate components.
Thickness

thick

Cure

Pt

catalyst

Hardness

Type

low

100% active
2-part/1-partGelest® Gel P065 2-Part Silicone Gel

Gelest® Gel F065 1-Part Silicone Gel

Description
Gel P065 is a temporarily deformable material with excellent low
temperature properties and a refractive index of 1.43. It performs
as a dielectric gel from 115° to 235°C.

Description
Gel F065 is a temporarily deformable material with fluorosilicone
properties, providing fuel resistant properties and a low refractive
index. The one part addition cure system is technically achievedby incorporating a fugitive inhibitor to the catalyzed mix.

clear
1.430
60-80mm
0.99
2.8

Gel Properties
Color
Refractive Index
Penetration
Specific Gravity

clear
1.384
60-80mm
1.27

Uncured Properties
Form
Viscosity (initial mix)

liquid700-800 cSt

Uncured Properties
Form
Viscosity

liquid1200-1500 cSt

PR

Gel Properties
Color
Refractive Index
Penetration
Specific Gravity
Dielectric Constant

Processing
Gel P065 is a 2-part addition cure system. It is comprised of “A”
and “B” parts which are mixed in a 1:1 ratio. After thoroughly
mixing 1 part “A” to 1 part “B”, allow mix to de-air. Pot life is 3-4
hours. Pour or syringe around part or into cavity. Cure at 115120°C for 30-60 minutes or at room temperature for 48 hours.
If the gel is too firm (low penetration) increase the ratio of A to B
to 1.1:1, 1.2:1 etc.
Caution: Avoid contact with skin and eyes

Shelf life: 12 months when stored below 25°C in sealedcontainers.
Standard Packaging
PP2-P065 Gelest® Gel P065
100g / ¥20,700
1kg / ¥109,400

www.AZmax.co.jp TEL: 03-5543-1630

Processing
Gel F065 is a 1-part addition cure system. Pour or syringearound part or into cavity. Cure at 100-150°C for 20-30 minutes.
If the gel is too firm (low penetration), FMV-4035 fluorosilicone
polymer can be added at 5-20% levels prior to cure.
Caution: Avoid contact with skin and eyes
Shelf life: 6 months when stored below <0°C in sealedcontainers.
Standard Packaging
PP1-F065 Gelest® Gel F065
100g / ¥45,900

Gelest, Inc.

(215) 547-1015

www.gelest.com

581

Gelest HardSil™ CC
High Modulus Clear Casting and Impregnation Resin
Features: Provides rigid silicone resins with excellent optical properties. HardSil™ C is a curable phenyl silicone
resin with excellent thermal stability and good electrical properties.

Capsular
Description:OOF

Applications:Electrical Components - high temperature, high power encapsulating and mounting resin.
Laminated Structures - hard, heat resistant impregnants for continuous exposures up to 300°C.
X-ray Equipment - radiation resistant encapsulating resin.

Thickness

thick

Cure
thermalHardness

high

Type

HardSil™ CC Clear Casting and Impregnation Resin

Description
HardSil™ CC is a peroxide curable solventless silicone resin
supplied with catalyst.
clear-straw transparent
350 volts/mil
5 x 1015 ohm-cm
1.530

Resin Properties
Form
Flashpoint
Specific Gravity
Viscosity

liquid>180°C
1.10
80-150 cSt.

PR

Bulk Properties
Color
Dielectric Strength (1/8”)
Volume Resistivity
Refractive Index

Application Methods
Gelest HardSil™ CC Part A (resin) and 1 wgt % Part B (peroxide)
are combined and mixed thoroughly. The mix is poured or applied
as an an encapsulant or impregnant. Cure is for 6 hours at 150°C
followed by two hours at 200°C. If the component is operating above
200°C, it should be cured for three hours at the maximum operating
temperature before entering service.
Cautions
Use in a well ventilated area.
Avoid contact with skin and eyes.
Part B catalyst is an oxidizer and should be stored away fromflammables.
Shelf life: 12 months when stored below 25°C in sealed containers.
Standard Packaging
PP2-HSCC HardSil™ CC 99:1 kit
100g / ¥40,600
1kg / ¥206,000

582

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Gelest, Inc.

(215) 547-1015

www.gelest.com

2-partEnabling Your Technology

Gelest® Flexible Optical Encapsulant Series
Filler-Free 2-part Silicone Elastomers

Capsular
Description:

O
OF

Features: Provide rapid-cure pure silicone elastomers with high optical transmission They have relatively low viscosityand extended pot-life, allowing potting, embedding and coating. Systems are vinyl-addition (platinum) cure.
Applications:Electronic Devices - provide mechanical and chemical protection to electronic components,
free of abrasive silica.
Optical Devices - index matching, cladding or transmission media applications.
Supported Membranes - filler-free silicone allows maximum transport of gases.
Microfluidics - employed as a mold master.1
Thickness

Cure

thick

Pt

catalyst

Gelest® OE 41 1.41 refractive index 2-part silicone RTV
encapsulant, supplied as 1:1 kit

Description
Gelest® OE 41 is a flexible, optically clear molding, encapsulationand coating compound. The low viscosity of the catalyzed mix,
long pot-life at room temperature and moderate cure temperature
make this extremely useful in laboratory, prototype and small
production run applications.
Cured Properties
Refractive Index
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength

PR

Application Methods
Thoroughly mix Part A with Part B in a 1:1 ratio. De-air mix
under vacuum for about 20 minutes. The pot-life is 18 hours at
25°C. Pot-life may be extended by storing at 5°C. Pour into
mold or apply to substrate. Avoid entrapping air. Cure at 55°C
for 4 hours or at room temperature over 72 hours.
100.0

PP2-OE41: Standard Cure 55C

10000

1.000E5
10000

10.00

1.000
100.0

0.1000G cross-over point
Time: 91.6 min.
G: 193.8 Pa

10.00

1.000
100.0
10.00

0.1000

1.000

1.000

0.01000

0.1000
0.0

25.0

50.0

75.0
100.0
global time (min.)mediumType

Standard Packaging
PP2-OE41 Gelest® OE 41
1 kg kit (500g OE41A, 500g OE41B)
6 kg kit (3kg OE41A, 3kg OE41B)

100% active
2-part¥28,200¥147,000

Gelest® OE 41 is available in other versions in which
cure speed or volatile content has been varied to match
special requirements.

Gelest® OE 41.2 Accelerated Cure
Rapid cure version of standard Gelest® OE 41, cures in less than
1 hour at room temperature, has a working time of about 10 minutes.
PP2-OE41.2 Gelest® OE 41.2
1 kg kit (500g OE41.2A, 500g OE41.2B)¥31,400
6 kg kit (3kg OE41.2A, 3kg OE41.2B)¥147,000

1.407>300psi140-200%
15-30
5-15pli

Uncured Properties of Gelest® OE 41
Viscosity (1:1) catalyzed: 1750-2500 cSt.

1.000E5

Hardness

125.0

Gelest® OE 41.4 Extended Cure
Slow cure version of standard Gelest® OE 41, offers a pot-lifeof 48 hours at room temperature. Cures in one hour at 120°C
PP2-OE41.4 Gelest® OE 41.4
1 kg kit (500g OE41.4A, 500g OE41.4B)¥31,400
6 kg kit (3kg OE41.4A, 3kg OE41.4B)¥147,000

Gelest® OE 41.6 Low Volatility
Low volatility content of Gelest® OE 41.6 offers advantages
in electrical and high vacuum where bleed or migration of low
molecular weight species can have deleterious effects.
PP2-OE41.6 Gelest® OE 41.6
1 kg kit (500g OE41.6A, 500g OE41.6B)¥48,400
Gelest® OE 41.7 Low Volatility in solution
A single component solution version in toluene which cures after
evaporation of solvent i 24 ours to form optically clear films.
Product must be stored <5°C
PP1-OE41.7 Gelest® OE 41.7
100g / ¥26,000
Application and Reference Data:
1. Lien, V. et al. IEEE Photon. Technol. Lett., 2004, 16(6), 1525.
2. Jeong, J. et al. Organic Electronics, 2011, 12, 2095.

0.1000150.0

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

583

Gelest® Flexible Optical Encapsulant Series
Filler-Free 2-part Silicone Elastomers
Features: Provide rapid-cure pure silicone elastomers with high optical transmission They have relatively low viscosityand extended pot-life, allowing potting, embedding and coating. Systems are vinyl-addition (platinum) cure.

Capsular
Description:OOF

Applications:Electronic Devices - provide mechanical and chemical protection to electronic components,
free of abrasive silica.
Optical Devices - index matching, cladding or transmission media applications.
Supported Membranes - filler-free silicone allows maximum transport of gases.

Thickness

thick

Cure

Pt

catalyst

Hardnessmedium

Type

100% active
2-partGelest® OE 42 1.42 refractive index
2-part silicone RTV encapsulant,
supplied as 1:1 kit

Gelest® OE 43 1.43 refractive index
2-part silicone RTV encapsulant,
supplied as 1:1 kit

Description
Gelest® OE 42 is a flexible, optically clear molding, encapsulationand coating compound, offering improved adhesion to substrates
compared to Gelest OE™ 41. The low viscosity of the catalyzed
mix, long pot-life at room temperature and moderate curetemperature make this extremely useful in laboratory, prototype
and small production run applications.

Description
Gelest® OE 43 is a flexible, optically clear molding, encapsulationand coating compound, offering improved adhesion to substrates
compared to Gelest® OE 41. The low viscosity of the catalyzed
mix, long pot-life at room temperature and moderate curetemperature make this extremely useful in laboratory, prototype
and small production run applications.

Cured Properties
Refractive Index
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength

Cured Properties
Refractive Index
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength

PR

1.420
>200psi
90-150%10-25
5-10pli

1.430>200psi
75-100%5-15
5-10pli

Uncured Properties of Gelest® OE 42
Viscosity (1:1) catalyzed: 1500-2000 cSt.

Uncured Properties of Gelest® OE 43
Viscosity (1:1) catalyzed: 800-1500 cSt.

Standard Packaging
PP2-OE42 Gelest® OE 42
1 kg kit (500g OE42A, 500g OE42B)
6 kg kit (3kg OE42A, 3kg OE42B)

Application and Reference Data:
Employed in microfluidics waveguides.
Kee, J. et al, Optics Express, 2009, 17(14), 11739.

¥53,700¥228,000

Standard Packaging
PP2-OE43 Gelest® OE 43
1 kg kit (500g OE43A, 500g OE43B)
6 kg kit (3kg OE43A, 3kg OE43B)¥53,700¥228,000

Application Methods
Thoroughly mix Part A with Part B in a 1:1 ratio. De-air mix under vacuum for about 20 minutes. The pot-life is 18 hours at 25°C.
Pot-life may be extended by storing at 5°C. Pour into mold or apply to substrate. Avoid entrapping air. Cure at 55°C for 4 hours orat room temperature over 72 hours.

584

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Enabling Your Technology

Gelest® Reprographic and Microfluidic Elastomers
Reinforced Silicone Elastomers
Features: Provide low surface roughness silicone elastomers with high definition in thin sections with moderate
viscosity and extended pot-life for accurate reprographic and prototype transfer technologies. Systems are vinyladdition (platinum) cure.

Capsular
Description:OOF

Applications:
Micro-Contact Printing - provides stamp and transfer detail to dimensions of 1 micron.
Design Transfer - high definition allows accurate image transfer from prototypes.
Thickness

thick

Cure

Pt

Hardnesscatalyst

medium

Type

100% active
2-partGelest® RG 01 2-part reprographic silicone
elastomer, supplied as 10:1 kit

Gelest® RG 02 2-part oleophilic reprographic Gelest® RG 03 2-part hydrophilic silicone
silicone elastomer, supplied as 10:1 kit
elastomer supplied as a 10:1 kit

Description
Gelest® RG 01 is a flexible, clear molding
and encapsulation compound. The moderate
viscosity of the catalyzed mix and long potlife at room temperature make this extremely
useful in microcontact printing, prototype
and small production run applications.

Description
Gelest® RG 02 is a clear to translucent
molding and encapsulation compoundwith greater adsorption of hydrocarbons
than conventional silicones making it able
to transfer a wider range of chemicals for
self-assembly techniques.

Cured Properties
Refractive Index
Dielectric ConstantCritical Surface Tension
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength
Specific Gravity
Contact Angle, water

Description
Gelest® RG 03 is a clear to translucent
molding and encapsulation compoundwith lower water contact angle, reduced
coefficient of friction and improved surface
wettability compared to conventional
silicones. Microfluidic features exhibit lower
hydrodynamic pressures.

Cured Properties
Refractive Index
Dielectric ConstantCritical Surface Tension
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength
Specific Gravity

Cured Properties
Refractive Index
Contact Angle, water
Coefficient of Friction(aqueous environment, 37°C)
Tensile Strength
Elongation
Durometer, Shore A
Tear Strength
Specific Gravity

PR

1.43
2.7
23-24 dynes/cm
800-1000psi
80-100%45-60
10-15pli
1.04
105°

1.43
2.6
27-29 dynes/cm
600-800psi
80-100%25-35
10-12pli
1.04

1.43
85°

~1-1.5500-800psi
100-200%
40-60
10-12pli
1.04

Uncured Properties of Gelest® RG
Viscosity (10:1) catalyzed: 3500-4500 cSt
Viscosity- Part A (base): 5000-5500 cSt
Part B (crosslinker): 50-75 cSt

Uncured Properties of Gelest® RG
Viscosity (10:1) catalyzed: 3000-4000 cSt
Viscosity- Part A (base): 5000-5500 cSt
Part B (crosslinker): 75-125 cSt

Application Methods
Thoroughly mix Part A with Part B in a
10:1 ratio. Try to avoid introducing bubbles.
For critical applications, de-air mix undervacuum for about 20 minutes. The pot-life
is 12 hours at 25˚C. Avoid entrapping
air. Cure at 55˚C for 4 hours or at room
temperature over 36 hours.

Application Methods
Thoroughly mix Part A with Part B in a 10:1
ratio. Try to avoid introducing bubbles. For
critical applications, de-air mix under vacuum
for about 20 minutes. The pot-life is 12 hours
at 25˚C. Pot-life may be extended by storingat 5˚C. Apply to substrate. Avoid entrapping
air. Cure at 55˚C for 4 hours or at room
temperature over 36 hours.

Application Methods
Thoroughly mix Part A with Part B in a 10:1
ratio. Try to avoid introducing bubbles. For
critical applications, de-air mix under vacuum for about 20 minutes. The pot-life is
12 hours at 25˚C. Pot-life may be extended
by storing at 5˚C. Apply to substrate. Avoid
entrapping air. Cure at 55˚C for 4 hours orat room temperature over 36 hours.

Standard Packaging
PP2-RG02 Gelest® RG 02
1.1 kg kit (1000g RG02-A,
100g RG02-B)¥69,800

Standard Packaging
PP2-RG03 Gelest® RG 03
1.1 kg kit (1000g RG03-A,
100g RG03-B)

Standard Packaging
PP2-RG01 Gelest® RG 01
1.1 kg kit (1000g RG01-A,
100g RG01-B)¥53,900

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

Uncured Properties of Gelest® RG
Viscosity (10:1) catalyzed: 3000-4000 cSt
Viscosity- Part A (base): 3500-4500 cSt
Part B (crosslinker): 50-75 cSt(215) 547-1015

www.gelest.com

585

Gelest PP1-LUB01
Fluorocarbon-Fluorosilicone Light Grease
Features: Provides a clean nonstick/slip boundary lubricant for electrical contact and precision timing devices.

Slip
LubricantO
O
F

Capsular
Description:

Description
Gelest PP1-LUB01 is a highly lubricious gel consisting ofsubmicron particles of fluoropolymer dispersed in a fluorinatedsilicone copolymer. The gel has the unusual property of exhibiting
increased slip as higher shear force is applied.
Addition of 5wt% antimony dialkyldithiocarbamate EP additive
enables aerospace grease application.1
Lubrication Properties
4-ball wear, mm, 232°C:(1200 rpm, 40 kg, 2hrs, M-10 steel)
Dropping-point, °C:
Penetration, 60 stroke:
Coefficient of friction, static
carbon steel after break-in
Bulk Properties
Viscosity, cSt:
Specific gravity:

1.60-1.65
200-210320-340
0.10-0.12

8000-9000
1.41

PR

Application and Reference Data:
1. Christian, J. et al. Lubrication Engineering, 1974, 30, 136.
Standard Packaging
PP1-LUB01
100g / ¥44,600
1kg / ¥231,000

586

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Gelest, Inc.

(215) 547-1015

www.gelest.com

Enabling Your Technology

Gelest Sibrid® Primer A1Hybrid Silicone Primer for Low Polarity Surfaces®

Features: Provide thin adhesive films that act as primers for organic resins on metal and glass substrates. Sibrid
Primer A1 is a silane modified organic polymer with the ability to form thin films on siliceous and metal substrates
and then crosslink with subsequently applied organic resins at room or moderately elevated temperatures.

Capsular
Description:OOF

Applications:- optical-electronic interface device assembly and packaging.
- thin film adhesive protective coatings.
- primer on metals, glass and concrete for organic coatings.
Thicknessthin-thickCureair/moisture

HardnessmediumType
solvent-borne
1-partGelest® Primer A1 Adhesive/primer for low polarity resins

Description
Gelest® Primer A1 is a linear polymer containing reactive
alkoxysilane, anhydride and unsaturation functionality dissolved
in toluene. It is suitable for nonpolar resins including silicones
and polyolefins. The primer is normally applied to the inorganic
substrate and after drying the polymer is applied.
Solution Properties
Form
SolidsFlashpoint
Specific Gravity
Viscosity

amber solution
12-14%
5°C
0.85
2-5 cSt.

PR

Shelf life: 12 months when stored below 25°C in sealed containers.
Keep container sealed after dispensing product.
Standard Packaging
PP1-SBPA1 Gelest® Primer A1100g / ¥11,100
1kg / ¥52,100

CautionUse in a well ventilated area.
Flammable. Avoid contact with skin and eyes.
Product is moisture sensitive. Containers should be tightly sealed.
Application Methods

Gelest® Primer A1 is applied as a coating by spraying, dipping or brushing. The solvent is removed by evaporation in an exhausted area
Simultaneous with evaporation, moisture induced cross-linking is initiated. After drying, maximum bond strength with the substrate isachieved by heating to 80°C for 30 minutes, but normally this is not necessary.
www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

587

O
O
F

PR
588

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Gelest, Inc.

(215) 547-1015

www.gelest.com

C

O
O
F

METAL-ORGANICS
for Materials,
Polymers & Synthesis

Si

Ge

PR

Ti

Sn

Zr

Hf

Pb

Metal-Organics(Abbreviated Listing)
PRODUCT

SIZE 1 PRICE 1

ALANE-DIMETHYLETHYLAMINE COMPLEXALANE-DIMETHYLETHYLAMINE COMPLEX, 0.5M in toluene (~12 wgt %)ALANE-TRIMETHYLAMINE COMPLEXALUMATRANE, tech-90
ALUMINUM ACETATE, DIBASIC, tech-90
ALUMINUM ACRYLATEALUMINUM n-BUTOXIDE, tech-95
ALUMINUM s-BUTOXIDE, 75% in s-butanol
ALUMINUM s-BUTOXIDE, 96%
ALUMINUM s-BUTOXIDE, 99+%
ALUMINUM s-BUTOXIDE BIS(ETHYLACETOACETATE), tech-95
ALUMINUM t-BUTOXIDE, tech-95
ALUMINUM 5-CHLORO-8-HYDROXYQUINOLINATE
ALUMINUM DI-s-BUTOXIDE ETHYLACETOACETATE, tech-95
ALUMINUM DIISOPROPOXIDE ETHYLACETOACETATEALUMINUM DIISOPROPYLDITHIOCARBAMATE, tech-95
ALUMINUM ETHOXIDEALUMINUM ETHOXYETHOXYETHOXIDE, 15% in ethoxydiethyleneglycol
ALUMINUM FORMATE, trihydrate
ALUMINUM 3,5-HEPTANEDIONATE
ALUMINUM HEXAFLUORO-2,4-PENTANEDIONATE
ALUMINUM 3-HYDROXY-2-METHYL-4-PYRONATE
ALUMINUM 8-HYDROXYQUINOLINATE, 99+%
ALUMINUM ISOPROPOXIDEALUMINUM ISOPROPOXIDE (99.9%)
ALUMINUM MAGNESIUM ISOPROPOXIDEALUMINUM METHACRYLATEALUMINUM N-NITROSOPHENYLHYDROXYLAMINEALUMINUM 9-OCTADECENYLACETOACETATE DIISOPROPOXIDE, tech-90
ALUMINUM OXIDE WAFER
ALUMINUM OXYSTEARATE, tech-85
ALUMINUM(III) 2,4-PENTANEDIONATE
ALUMINUM 2,4-PENTANEDIONATE BIS(ETHYLACETOACETATE)ALUMINUM PHENOXIDE 96%
ALUMINUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
ALUMINUM TITANIUM DOUBLE METAL ALKOXIDE, (0.85 M)
ALUMINUM TRIFLUOROACETATE, monohydrate
ALUMINUM TRIFLUOROMETHANESULFONATE
ALUMINUM YTTRIUM DOUBLE METAL ALKOXIDEALUMINUM ZIRCONIUM DOUBLE METAL ALKOXIDE (0.67 M)
DI-s-BUTOXYALUMINOXYTRIETHOXYSILANEDIETHOXYSILOXANE -s-BUTYLALUMINATE COPOLYMERDIISOBUTYLALUMINUM HYDRIDE, 1M in heptane (19-20 wgt%)
DIISOBUTYLALUMINUM HYDRIDE, 1M in methylene chloride (11-12 wgt%)
DIISOBUTYLALUMINUM HYDRIDE, 1M in tetrahydrofuran (16-17 wgt%)
DIISOBUTYLALUMINUM HYDRIDE, 1M in toluene (16-17 wgt%)
DIMETHYLALUMINUM CHLORIDEDIMETHYLALUMINUM CHLORIDE, 1M in heptane
DIMETHYLISOPROPOXYALUMINUMETHYLALUMINUM DICHLORIDE, 1M in heptane (16-18 wgt%)
ETHYLALUMINUM DICHLORIDE, 1.8M in toluene (24-26 wgt%)
LITHIUM ALUMINUM HYDRIDE, pellets
MAGNESIUM ALUMINUM DOUBLE METAL ALKOXIDE, (0.75M)
MAGNESIUM ALUMINUM DOUBLE METAL ALKOXIDE, (1.0M)
POLY(OXOALUMINUM 2-ETHYLHEXANOATE), 60% in isopropyl 2-ethylhexanoate, 8-9% Al
SODIUM ALUMINUM DICAPROLACTAM BIS(2-METHOXYETHOXIDE), 80% in toluene
SODIUM ALUMINUM HYDRIDE BIS(METHOXYETHOXIDE), 70% (3.4M) in toluene
TRIISOBUTYLALUMINUM
TRIISOBUTYLALUMINUM, 1M in heptane (25-28 wgt%)
TRIMETHYLALUMINUM, 2M in heptane (20-21 wgt%)
TRIMETHYLALUMINUM, 2M in toluene (17-18 wgt%)
TRIOCTYLALUMINUM, 25% in heptane
TRIS(DIETHYLAMIDO)ALUMINUM, dimer

25g
25g
5g
25g
100g
25g
10g
250g
250g
250g
25g
10g
5g
100g
100g
10g
25g
50g
25g
10g
5g
5g
5g
100g
25g
10g
10g
25g
100g
Each
500g
100g
25g
5g
1.0g
100g
25g
10g
25g
100g
25g
100g
1.5kg
2kg
1.5kg
1.5kg
100g
1.5kg
10g
1.5kg
1.5kg
25g
25g
25g
25g
25g
100g
1.5kg
1.5kg
250g
1.5kg
500g
10g

590

inquireinquireinquire¥11,800¥8,000¥18,000¥14,500¥7,500¥7,500¥16,500¥14,000¥13,300¥76,000¥8,500¥8,500¥39,500¥13,500¥11,500¥10,500¥13,500¥22,500¥36,500¥26,500¥7,500¥13,600¥41,000¥13,500¥14,000¥11,800¥55,200¥12,500¥8,500¥9,500¥19,500¥10,500¥10,800¥34,500¥18,000¥13,000¥11,800¥11,900¥24,100
inquireinquireinquireinquireinquireinquireinquireinquireinquire¥14,500¥9,000¥9,000¥9,300¥22,500¥15,800
inquireinquireinquireinquireinquireinquireSIZE 2 PRICE 2

100g
25g
100g
2kg

inquireinquire¥28,000¥44,500

O
O
F

PR

CODE
ALUMINIUMOMAL005
OMAL006
OMAL008
AKA005CXAL012CXAL015
AKA010
AKA020.5
AKA020
AKA020.1
AKA023
AKA030
AKA036
AKA040
AKA050
AKA054
AKA060
AKA061CXAL045
AKA062
AKA063
AKA065
AKA067
AKA070
AKA071
AKA074CXAL050
AKA076
AKA078W-ALO-51-50
CXAL073
AKA080
AKA081
AKA082
AKA085DALTI50CXAL080
CXAL083
DALY080DALZR50
SID2780.0
PSIAL-007
OMAL021.2
OMAL021.4
OMAL021.5
OMAL021.7
OMAL020
OMAL020.2
OMAL025
OMAL033.2
OMAL033.7
INLI009
DMGAL30DMGAL50
PAL-008
AKS725.5
AKS726
OMAL082
OMAL082.2
OMAL086.2
OMAL086.4
OMAL088
OMAL090

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

50g ¥44,500
1.5kg ¥18,500
2kg ¥21,500

100g ¥35,500
50g ¥39,500

500g ¥20,500500g ¥20,500

100g ¥33,500
50g ¥40,500
25g ¥76,500

1kg ¥13,500
100g ¥35,500

100g ¥35,500
500g ¥33,500500g ¥20,500
100g ¥24,500

5g ¥28,500
500g ¥28,500

100g
500g
100g
500g
14kg

¥32,000¥33,500¥31,000¥87,300
inquire

250g
100g
100g
100g

¥61,500¥19,300¥19,300¥20,000

2kg ¥47,500
1.5kg inquire

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

SIZE 2 PRICE 2

ANTIMONY ACETATEANTIMONY(III) n-BUTOXIDEANTIMONY(III) ETHOXIDEMETHACRYLOXYDIPHENYLANTIMONY, 96%p-(OCTYLOXYPHENYL)PHENYLIODONIUM HEXAFLUOROANTIMONATE
Poly(ANTIMONY ETHYLENE GLYCOXIDE)(THIOPHENOXYPHENYL)DIPHENYLSULFONIUM HEXAFLUOROANTIMONATE- BLEND
TRIPHENYLANTIMONYTRIPHENYLANTIMONY DICHLORIDE
TRIS(DIMETHYLAMINO)ANTIMONYTRIS(TRIMETHYLSILOXY)ANTIMONY

100g
25g
2.5g
10g
25g
25g
25g
25g
5g
10g
5g

¥8,500¥21,500¥12,500¥22,500¥24,000¥9,000inquire¥9,300¥14,500¥34,500¥28,400

2kg ¥45,500
100g ¥59,750
10g ¥30,500

ARSENIC TRIETHOXIDEGALLIUM ARSENIDE WAFER
TRIPHENYLARSINE
TRIS(DIMETHYLAMINO)ARSINE

5g
Each
5g
25g

¥49,500¥81,700¥9,300¥94,500

BARIUM ACETATEBARIUM ACRYLATE, hydrate
BARIUM(II) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATE, dihydrate
BARIUM HEXAFLUORO-2,4-PENTANEDIONATEBARIUM ISOPROPOXIDEBARIUM ISOPROPOXIDE, 20% in isopropanol
BARIUM METHACRYLATE, dihydrate
BARIUM(II) METHOXYPROPOXIDE, 25% in methoxypropanol
BARIUM NEODECANOATEBARIUM 2,4-PENTANEDIONATE, hydrate
BARIUM(II) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE, hydrate
BARIUM(II) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE, anhydrous
BARIUM TITANIUM DOUBLE METAL ALKOXIDE (0.5 M)
BARIUM TRIFLUOROACETATEBARIUM TRIFLUOROMETHANESULFONATEBARIUM YTTRIUM DOUBLE METAL ALKOXIDE (0.3 M)
BARIUM ZIRCONIUM DOUBLE METAL ALKOXIDE (0.33 M)

100g
25g
5g
5g
2.5g
25g
25g
25g
10g
25g
5g
5g
25g
25g
10g
25g
25g

¥8,300¥19,500¥41,500¥16,500¥11,000¥11,800¥12,500¥9,500¥16,500¥12,000¥25,800¥28,500¥9,500¥15,000¥16,500¥15,500¥10,000

BERYLLIUM 2,4-PENTANEDIONATE

10g ¥14,300

BISMUTH(III) ACETATEBISMUTH 2-ETHYLHEXANOATE, 80-85% in mineral spirits
BISMUTH GERMANATEBISMUTH HEXAFLUORO-2,4-PENTANEDIONATEBISMUTH(III) ISOPROPOXIDEBISMUTH NEODECANOATE, 99+%
BISMUTH NEODECANOATE, 70% in neodecanoic acid
BISMUTH SALICYLATEBISMUTH(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEBISMUTH TRIFLUOROMETHANESULFONATE, hydrate
TRIPHENYLBISMUTH

25g
100g
10g
2.5g
2.5g
10g
25g
25g
5g
5g
25g

¥19,500¥9,300¥14,500¥14,300¥41,500¥19,500¥10,500¥10,500¥36,500¥15,000¥16,500

BORANE-TRIETHYLAMINE complex
BORATRANE
BORAZINE
BORON ALLYLOXIDEBORON n-BUTOXIDEBORON t-BUTOXIDEBORON ETHOXIDEBORON ISOPROPOXIDEBORON METHOXIDEBORON METHOXIDE, 70% in methanol
BORON METHOXYETHOXIDEBORON n-PROPOXIDEBORON TRIFLUORIDE ETHERATEBORON VINYLDIMETHYLSILOXIDEN-(DICHLOROBORYL)HEXAMETHYLDISILAZANEDIMETHYLANILINIUM TETRAKIS(PENTAFLUOROPHENYL) BORATEDIPHENYLBORANE 8-HYDROXYQUINOLINATE(p-ISOPROPYLPHENYL)(p-METHYLPHENYL)IODONIUM TETRAKIS(PENTAFLUOROPHENYL) BORATELITHIUM TETRAKIS(PENTAFLUOROPHENYL)BORATE DIETHYL ETHER COMPLEXPOTASSIUM HYDROTRIS(1-PYRAZOLATO)BORATE, hydrate
SILICON HEXABORIDE
TIN(II) FLUOROBORATE, 47% in water
TITANIUM BORIDE, powder
1,3,5-TRIMETHYLBORAZINE
TRIPHENYLBORANE, 95%

100g
25g
50g
25g
100g
25g
100g
25g
25g
100g
25g
100g
25g
10g
10g
2.5g
5g
5g
5g
5g
25g
250g
50g
25g
10g

¥47,000¥9,500inquire¥25,500¥8,000¥18,500¥12,000¥9,300¥7,000¥7,500¥9,000¥8,000¥8,300¥22,300¥35,300¥50,500¥52,000¥16,500¥53,500¥62,500¥35,300¥10,000¥13,300
inquire¥28,000

100g
100g
100g
100g

¥67,800¥19,000
inquire¥20,000

25g ¥23,500

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

10g ¥25,800
100g ¥28,000
100g ¥20,800
100g ¥29,000
25g ¥88,500
100g ¥22,500
100g ¥40,300
100g ¥22,500
50g ¥43,500

10g ¥36,000

100g ¥20,800
1.5kg
100g
500g
100g
2kg
2kg
100g
500g
750g

¥36,500¥50,000¥34,500¥22,500¥20,500¥13,500¥19,300¥18,500¥16,500

25g ¥52,500

METAL ORGANICS

PR

O
O
F

CODE
ANTIMONYCXAN010
AKA090
AKA100CXAN052
OMAN071
PAN-040
OMAN076
OMAN078
OMAN079
OMAN080
SIT8717.7
ARSENICAKA115W-GAL-51-0.5
OMAS078
OMAS080
BARIUM
CXBA010
CXBA015
AKB118
AKB119
AKB120AKB121
CXBA050
AKB130
CXBA060
AKB140AKB144
AKB144.1
DBATI50
CXBA080
CXBA083
DBAY060
DBAZR50BERYLLIUM
AKB150BISMUTHCXBI010CXBI040
GEB1700
AKB151
AKB152CXBI060
CXBI061
CXBI074
AKB153.5
CXBI083
OMBI078
BORON
INBO022
AKB153.8
INBO009
AKB154
AKB155
AKB156
AKB156.2
AKB156.5
AKB157
AKB157.1
AKB158
AKB158.5
INBO060
AKB159.5
SID3354.0
OMBO028
AKB156.4
OMBO037
OMBO039
OMBO073
SIS6968.0
SNT7942
INTI027
OMBO061
OMBO078591

SIZE 1 PRICE 1

SIZE 2 PRICE 2

TRIS(PENTAFLUOROPHENYL)BORON
TRIS(PENTAFLUOROPHENYL)BORON, 10% in toluene
TRIS(TRIMETHYLSILOXY)BORON

PRODUCT

1.0g ¥18,000
25g ¥77,000
25g ¥13,500

5g ¥58,500

CADMIUM ACETATE, dihydrate
CADMIUM DIETHYLDITHIOCARBAMATE, 96%
CADMIUM FORMATECADMIUM IODIDECADMIUM 2,4-PENTANEDIONATE, hydrate
DIMETHYLCADMIUMDIMETHYLCADMIUM, 10% in heptane

25g
25g
25g
25g
10g
25g
250g

¥7,500¥14,300¥24,000¥12,500¥20,500
inquireinquire100g ¥14,300
100g ¥43,500

CALCIUM ACETATE, monohydrate
CALCIUM ACRYLATE, tech-90
CALCIUM ETHOXIDECALCIUM 2-ETHYLHEXANOATECALCIUM FORMATECALCIUM D-GLUCONATE, hemihydrate
CALCIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATECALCIUM HEXAFLUORO-2,4-PENTANEDIONATECALCIUM LACTATE, pentahydrate
CALCIUM METASILICATECALCIUM METHACRYLATE, hydrate
CALCIUM METHOXIDE, 95%
CALCIUM METHOXYETHOXIDE, 20% in methoxyethanol
CALCIUM 2,4-PENTANEDIONATE dihydrate, 95%
CALCIUM SILICIDE, tech-95, powder
CALCIUM STANNATECALCIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATECALCIUM TRIFLUOROMETHANESULFONATECALCIUM UNDECYLENATE

100g
25g
10g
5g
100g
100g
5g
5g
250g
500g
25g
25g
25g
25g
250g
25g
1.0g
10g
25g

¥7,000¥9,300¥15,800¥10,500¥10,000¥7,500¥34,500¥16,500¥11,800¥7,400¥12,500¥15,000¥14,300¥10,500¥11,900¥13,500¥11,500¥19,500¥14,000

2kg ¥24,000
2kg ¥102,000
50g ¥49,500

CERIUM(III) ACETATE, hydrate
CERIUM(IV) t-BUTOXIDECERIUM(lll) 2-ETHYLHEXANOATECERIUM(III) 2-ETHYLHEXANOATE, 50% in mineral spirits (38%) / 2-ethylhexanoic acid (12%)
CERIUM(III) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATECERIUM(lV) ISOPROPOXIDECERIUM(IV) METHOXYETHOXIDE, 18-20% in methoxyethanol
CERIUM(III) OXALATE, nonahydrate
CERIUM(III) 2,4-PENTANEDIONATE, hydrate
CERIUM(IV) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATECERIUM(IV) THENOYLTRIFLUOROACETONATE, 95%
CERIUM(III) TRIFLUOROMETHANESULFONATE, hydrate
CERIUM(IV) TRIFLUOROMETHANESULFONATE, hydrate
CERIUM(III) TRIS[BIS(TRIMETHYLSILYL)AMIDE]

25g
2.5g
25g
100g
5g
1.0g
25g
25g
25g
1.0g
1.0g
5g
5g
5g

¥8,500¥28,500¥11,500¥9,300¥53,500¥13,000¥21,500¥9,300¥13,500¥19,500¥38,500¥12,500¥14,300¥77,700

CESIUM ACETATECESIUM FORMATE, monohydrate
CESIUM METHOXIDE, 10% in methanol
CESIUM TRICHLOROGERMANATE, 95%
CESIUM TRIFLUOROACETATE

25g
100g
25g
5g
10g

¥14,500¥25,000¥31,500¥15,800¥12,000

CHROMIUM(III) ACETATE HYDROXIDECHROMIUM(III) BENZOYLACETONATE
CHROMIUM(III) DICHLORIDE HYDROXIDE - METHACRYLIC ACID - AQUA COMPLEX, 40% soln.
CHROMIUM(III) 2-ETHYLHEXANOATE, 65-70% in mineral spirits
CHROMIUM(III) HEXAFLUORO-2,4-PENTANEDIONATE- TETRAHYDROFURAN COMPLEX
CHROMIUM(III) METHOXYPROPOXIDE, 10-12% in methoxypropanol
CHROMIUM(III) 2,4-PENTANEDIONATE
CHROMIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
CHROMIUM(III) 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE

100g
2.5g
100g
100g
1.0g
10g
100g
1.0g
1.0g

¥9,000¥23,500¥14,500¥11,000¥20,500¥19,500¥10,500¥13,800¥27,000

COBALT(II) ACETATE, tetrahydrate
COBALT(II) BENZOYLACETONATECOBALT CARBONYLCOBALT(II) 2,4-PENTANEDIONATE, hydrate
COBALT(III) 2,4-PENTANEDIONATECOBALT(II) PHTHALOCYANINECOBALT(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATECOBALT TRICARBONYL NITROSYLCYCLOPENTADIENYLCOBALT DICARBONYL

25g
5g
25g
50g
50g
10g
5g
10g
10g

¥7,000¥19,500¥27,000¥11,500¥13,500¥32,000¥42,000¥77,000¥49,500

COPPER(II) ACETATE, monohydrate
COPPER(II) ALLYLOXYETHOXYTRIFLUOROACETOACETATE

100g ¥9,000
1.0g ¥32,000PR
592

100g ¥36,300

50g ¥68,500

O
O
F

CODE
OMBO087
OMBO087.4
SIT8718.0
CADMIUM
CXCD010
AKC159.8
CXCD045
INCD070
AKC160
OMCD020
OMCD020.2
CALCIUM
CXCA010CXCA015
AKC162
CXCA040
CXCA045
CXCA046
AKC162.5
AKC163
CXCA049
SIC2050.0
CXCA050
AKC165
AKC167
AKC170
SIC2054.0
SNC2060
AKC172
CXCA083
CXCA085
CERIUM
CXCE010
AKC176
CXCE040
CXCE041
AKC178
AKC180
AKC186
CXCE070
AKC190
AKC191
AKC191.5
CXCE082
CXCE083
SIC2264.6
CESIUM
CXCS010
CXCS045
AKC192
GEC2150
CXCS080
CHROMIUMCXCR012
AKC195CXCR036
CXCR042
AKC198
AKC205
AKC210
AKC216
AKC218COBALT
CXCO010
AKC225
INCO030
AKC230
AKC235
AKC238
AKC240
INCO032
OMCO018
COPPERCXCU010
AKC242

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

25g ¥52,500

2.5kg ¥17,400
100g ¥38,500
100g ¥43,500
100g ¥24,0005g ¥32,500

100g ¥17,500

100g ¥27,300
2kg ¥32,0005g ¥38,500
100g ¥59,500

100g ¥33,800
5g ¥64,500

25g ¥49,500

50g ¥64,500
500g ¥28,500
5g ¥41,500

250g ¥32,500250g ¥40,500

2kg ¥37,500

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

COPPER(II) BENZOYLACETONATE
COPPER(II) BENZOYLTRIFLUOROACETONATE
COPPER(II) DIMETHYLAMINOETHOXIDECOPPER(II) DIMETHYLDITHIOCARBAMATE
COPPER 1,3-DIPHENYL-1,3-PROPANEDIONATE
COPPER(II) ETHOXIDECOPPER(II) ETHYLACETOACETATE
COPPER(II) 2-ETHYLHEXANOATE
COPPER(II) FORMATE, tetrahydrate
COPPER(II) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATE
COPPER(I) HEXAFLUORO-2,4-PENTANEDIONATE 2-BUTYNE COMPLEX
COPPER(I) HEXAFLUORO-2,4-PENTANEDIONATE CYCLOOCTADIENE COMPLEX
COPPER(I)/(II) HEXAFLUORO-2,4-PENTANEDIONATE - VINYLTRIMETHYLSILANE COMPLEX
COPPER(II) HEXAFLUORO-2,4-PENTANEDIONATE, dihydrate
COPPER 8-HYDROXYQUINOLINATE
COPPER(II) METHACRYLATE, monohydrate
COPPER(II) METHACRYLOXYETHYLACETOACETATE
COPPER(II) METHOXIDECOPPER(II) METHOXYETHOXYETHOXIDE, 10-12% in methoxyethoxyethanol
COPPER(II) 2,4-PENTANEDIONATE
COPPER(II) PHTHALOCYANINECOPPER SILICIDE
COPPER(II) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
COPPER(1) THIOPHENOXIDECOPPER(II) TRIFLUOROACETATE, hydrate
COPPER(II) TRIFLUOROMETHANESULFONATE
COPPER(II) 1,1,1-TRIFLUORO-2,4-PENTANEDIONATEINDIUM COPPER BIS(ETHYLTHIOLATE)TRIPHENYLPHOSPHINE COMPLEXINDIUM COPPER BIS(PHENYLSELENATE)TRIPHENYLPHOSPHINE COMPLEX

5g
5g
5g
25g
5g
5g
10g
25g
100g
1.0g
2.5g
2.5g
10g
5g
50g
25g
10g
5g
25g
50g
25g
25g
1.0g
10g
5g
5g
10g
10g
5g

¥16,500¥33,500¥49,500¥11,000¥16,500¥18,500¥15,000¥20,500¥11,500¥12,300¥20,500¥18,300¥20,500¥12,500¥9,500¥16,500¥16,500¥17,500¥15,800¥8,500¥17,500¥26,300¥9,800¥13,000¥16,500¥14,500¥15,000¥39,500¥59,500

DYSPROSIUM ACETATE, hydrate
DYSPROSIUM 2,4-PENTANEDIONATE, hydrate
DYSPROSIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
DYSPROSIUM TRIFLUOROMETHANESULFONATE

25g
5g
1.0g
5g

¥11,500¥16,000¥11,500¥13,500

ERBIUM(III) ACETATE, tetrahydrate
ERBIUM(III) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATEERBIUM HEXAFLUORO-2,4-PENTANEDIONATEERBIUM 8-HYDROXYQUINOLINATEERBIUM METHOXYETHOXIDE, 15-16% in methoxyethanol
ERBIUM 2,4-PENTANEDIONATEERBIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEERBIUM TRIFLUOROMETHANE SULFONATEERBIUM TRIS(HEXAMETHYLDISILAZIDE)

25g
1.0g
5g
1.0g
25g
5g
1.0g
5g
5g

¥16,500¥10,500¥35,500¥32,500¥16,500¥15,800¥11,000¥14,500¥80,400

EUROPIUM ACETATE, hydrate
EUROPIUM 1,3-DIPHENYL-1,3-PROPANEDIONATEEUROPIUM 1,3-DIPHENYL-1,3-PROPANEDIONATE-1,10-PHENANTHROLINEEUROPIUM(III) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATEEUROPIUM(III) METHACRYLATEEUROPIUM 2,4-PENTANEDIONATEEUROPIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEEUROPIUM(III) THENOYLTRIFLUOROACETONATE, 95%
EUROPIUM(III) TRIS(HEXAMETHYLDISILAZIDE)

5g
5g
1.0g
1.0g
5g
1.0g
1.0g
1.0g
5g

¥20,500¥50,000¥94,500¥11,000¥28,500¥15,000¥11,500¥16,500¥59,100

GADOLINIUM ACETATE, tetrahydrate
GADOLINIUM(III) DIETHYLENETRIAMINEPENTAACETIC ACID, hydrate
GADOLINIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATEGADOLINIUM 2,4-PENTANEDIONATE, trihydrate
GADOLINIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEGADOLINIUM TRIS(HEXAMETHYLDISILAZIDE)

10g
10g
1.0g
2.5g
5g
5g

¥12,500¥21,500¥20,000¥10,000¥33,500¥85,700

DIETHYLGALLIUM CHLORIDEDIMETHYLGALLIUM 2,4-PENTANEDIONATEGALLIUM ARSENIDE WAFERGALLIUM(III) ETHOXIDEGALLIUM 8-HYDROXYQUINOLINATE, 99+%
GALLIUM ISOPROPOXIDEGALLIUM(III) 2,4-PENTANEDIONATEGALLIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEGALLIUM TRIIODIDEGALLIUM TRIS(HEXAMETHYDISILAZIDE)TRIMETHYLGALLIUM
TRIS(DIMETHYLAMINO)GALLIUM

10g
25g
Each
2.5g
5g
5g
2.5g
5g
10g
5g
100g
2.5g

inquire¥242,000¥81,700¥39,500¥25,000¥49,500¥9,500¥49,500¥25,500¥77,700
inquire¥49,500

SIZE 2 PRICE 2

25g ¥52,500
25g ¥60,500
50g ¥46,500
500g ¥32,500
5g ¥35,500
50g ¥68,500
50g ¥59,500
250g ¥24,500

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g ¥41,000
250g ¥20,500
5g ¥25,500

50g ¥46,500

5g ¥32,500

5g ¥28,500

100g ¥43,500
25g ¥49,500
5g inquire

5g ¥30,500
5g ¥46,500
5g ¥32,500
5g ¥52,500

10g ¥23,500

10g ¥20,800

METAL ORGANICS

PR

O
O
F

CODE
AKC246
AKC247
AKC248
AKC248.5
AKC249
AKC250
AKC252CXCU040CXCU045
AKC252.4
AKC252.5
AKC252.7
AKC252.8
AKC253
AKC253.2
CXCU050
AKC253.5
AKC254
AKC255
AKC260
AKC261
SIC2435.0
AKC262
AKC263CXCU080
CXCU083
AKC264
AKI362.2
AKI362.4
DYSPROSIUM
CXDY010
AKD270
AKD272CXDY083
ERBIUM
CXER010
AKE274
AKE275
AKE276
AKE277
AKE280
AKE282
CXER083
SIE4885.0
EUROPIUMCXEU010
AKE286
AKE286.5
AKE287CXEU050
AKE290
AKE295
AKE297
SIE4907.0
GADOLINIUMCXGD010CXGD024
AKG299
AKG300
AKG306
SIG4994.0
GALLIUM
OMGA025
OMGA038
W-GAL-51-0.5
AKG320
AKG308
AKG321
AKG310
AKG322
INGA070
SIG4998.0
OMGA079
OMGA080593

PRODUCTSIZE 1 PRICE 1

ALLYLTRICHLOROGERMANE
ALLYLTRIETHYLGERMANE
ALLYLTRIMETHYLGERMANE
3-AMINOPROPYLTRIBUTYLGERMANE
AMMONIUM HEXAFLUOROGERMANATEBENZYLTRICHLOROGERMANE
BIS[BIS(TRIMETHYLSILYL)AMINO]GERMANIUM(ll)BIS[BIS(TRIMETHYLSILYL)METHYL]GERMANIUM(ll)BIS(CHLOROMETHYL)DIMETHYLGERMANE, 95%
BISMUTH GERMANATEt-BUTYLDIMETHYLCHLOROGERMANE
n-BUTYLGERMANE
t-BUTYLGERMANE
n-BUTYLTRICHLOROGERMANE
t-BUTYLTRICHLOROGERMANE
CARBOXYETHYLGERMANIUM SESQUIOXIDECARBOXYETHYLTRICHLOROGERMANE
CESIUM TRICHLOROGERMANATE, 95%
CHLOROMETHYLMETHYLDICHLOROGERMANE
CHLOROMETHYLTRIMETHYLGERMANE
3-CHLOROPROPYLTRICHLOROGERMANE, 95%
CYCLOPENTADIENYLTRIMETHYLGERMANE
DI-n-BUTYLDIACETOXYGERMANE, tech-90
DI-n-BUTYLDICHLOROGERMANE, 95%
DI-n-BUTYLGERMANEDICHLOROMETHYLTRIMETHYLGERMANE, 95%
DIETHYLDICHLOROGERMANE
DIETHYLDIETHOXYGERMANE
DIETHYLGERMANE
DIGERMANE, 60 wgt.% in hydrogen
DIMETHYLAMINOTRIMETHYLGERMANEDIMETHYLDICHLOROGERMANEDIMETHYLGERMANEDIPHENYLDICHLOROGERMANEDIPHENYLDIMETHYLGERMANEDIPHENYLGERMANEETHYLGERMANEETHYLTRICHLOROGERMANEETHYLTRIETHOXYGERMANEGERMANEGERMANE 99.99+%
GERMANE, 10% in hydrogen (v/v)
GERMANIUM, 99.99%
GERMANIUM WAFERGERMANIUM DICHLORIDE-DIOXANE COMPLEXGERMANIUM DIIODIDEGERMANIUM DIOXIDE, 99.99%
GERMANIUM DISELENIDEGERMANIUM DISULFIDEGERMANIUM NITRIDEGERMANIUM(ll) SULFIDEGERMANIUM TELLURIDEGERMANIUM TETRABROMIDEGERMANIUM TETRACHLORIDE, 99.9+%
GERMANIUM TETRACHLORIDE 99.999%
GERMANIUM TETRAFLUORIDE, 99.9+%
GERMANIUM TETRAIODIDEHEXAETHYLDIGERMANE
HEXAETHYLDIGERMOXANEHEXAMETHYLDIGERMANE
HEXAPHENYLDIGERMANE
HEXAPHENYLDIGERMOXANEHYDROXYGERMATRANE, monhydrate
ISOBUTYLGERMANE
LITHIUM METAGERMANATEMETHACRYLOXYMETHYLTRIMETHYLGERMANE
METHACRYLOXYTRIETHYLGERMANE
METHYLGERMANE
METHYLTRICHLOROGERMANE
METHYLTRIETHOXYGERMANE
PHENYLDIMETHYLCHLOROGERMANE
PHENYLGERMANE
PHENYLTRICHLOROGERMANE
PHENYLTRIMETHYLGERMANE

5g
5g
2.5g
2.5g
5g
5g
2.5g
1.0g
2.5g
10g
2.5g
5g
5g
5g
5g
5g
5g
5g
2.5g
2.5g
5g
1.0g
1.0g
2.5g
5g
2.5g
2.5g
10g
5g
2.5g
2.5g
2.5g
10g
2.5g
2.5g
1.0g
10g
5g
1.0g
10g
10g
10g
10g
Each
5g
2.5g
10g
5g
5g
5g
5g
5g
5g
25g
100g
10g
10g
2.5g
10g
2.5g
1.0g
2.5g
5g
5g
25g
2.5g
5g
10g
2.5g
5g
1.0g
5g
2.5g
5g

PR
594

¥53,500¥53,000¥53,000¥59,500¥16,800¥43,500¥25,500¥37,500¥57,000¥14,500¥26,000¥28,500¥37,500¥19,500¥21,500¥11,500¥33,500¥15,800¥47,500¥39,500¥63,500¥32,000¥16,500¥16,800¥74,500¥43,500¥21,800¥52,000¥76,000¥76,000¥45,500¥17,500
inquire¥24,000¥18,300¥16,800
inquire¥26,500¥13,000¥13,000¥13,000
inquire¥24,500¥45,900¥16,500¥24,500¥17,500¥38,500¥32,000¥37,500¥39,500¥44,500¥24,500¥23,500
inquireinquire¥24,000¥35,500¥36,500¥36,000¥15,800¥26,500¥14,500¥49,500¥35,500¥23,500¥45,500
inquire¥15,000¥37,500¥15,000¥69,500¥20,500¥26,000

SIZE 2 PRICE 2

25g ¥101,000
25g ¥64,500
25g ¥72,500
25g ¥32,500

O
O
F

CODE
GERMANIUM
GEA0515
GEA0530
GEA0550
GEA0600
GEA0700
GEB0969
GEB1025
GEB1026
GEB1050
GEB1700
GEB1933
GEB1969.5
GEB1970
GEB1975
GEB1980
GEC2100
GEC2262
GEC2150
GEC2289.8
GEC2300
GEC2400
GEC2550
GED3150
GED3200
GED3300
GED3365
GED3400
GED3404
GED3410
GED3450
GED3600
GED4100
GED4150
GED4500
GED4538
GED4550
GEE4695
GEE4700
GEE4710
GEG5000
GEG5001
GEG5001-H1
GEG5020
W-GE-25-1.0
GEG5180
GEG5200
GEG5300
GEG5350
GEG5355
GEG5420
GEG5430
GEG5480
GEG5500
GEG5600
GEG5601
GEG5700
GEG5800
GEH6000
GEH6066
GEH6100
GEH6150
GEH6160
GEH6170
GEI6480
GEL6467
GEM6485
GEM6490
GEM6499
GEM6500
GEM6550
GEP6727
GEP6749
GEP6800
GEP6806

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

25g ¥49,500

10g ¥44,500

10g ¥60,500

10g ¥46,800

10g ¥63,000
10g ¥49,300
5g ¥53,500
25g
5g
50g
50g

¥92,500¥38,500¥38,500¥38,500

50g ¥84,500

25g ¥52,500
10g ¥69,500
50g ¥56,500

25g ¥84,500
100g ¥66,500
50g ¥82,500

5g ¥49,500
25g ¥44,500
10g ¥66,500
10g ¥38,500
5g ¥46,500
10g ¥56,500

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

POTASSIUM HEXAFLUOROGERMANATESODIUM METAGERMANATE, hydrate, 95%
TETRAALLYLGERMANETETRA-n-BUTOXYGERMANETETRA-n-BUTYLGERMANETETRAETHOXYGERMANETETRAETHOXYGERMANE, 99.999%
TETRAETHYLGERMANETETRAISOPROPOXYGERMANETETRAKIS(DIMETHYLAMINO)GERMANETETRAKIS(TRIMETHYLSILOXY)GERMANETETRAMETHOXYGERMANETETRAMETHYLGERMANETETRAPHENYLGERMANETETRA-n-PROPYLGERMANE
TRI-n-BUTYLBROMOGERMANE, 95%
TRI-n-BUTYLCHLOROGERMANE, tech-90
TRI-n-BUTYLGERMANE, 99%
TRICHLOROGERMANE
3-(TRICHLOROGERMYL)PROPIONYLCHLORIDE
TRIETHYLBROMOGERMANE
TRIETHYLCHLOROGERMANE
TRIETHYLGERMANE
TRIFLUOROMETHYLTRIIODOGERMANE
TRIISOPROPYLCHLOROGERMANE
TRIMETHYLBROMOGERMANE
TRIMETHYLCHLOROGERMANE
TRIMETHYLGERMANE
TRIMETHYLGERMYLTRICHLOROSILANE
TRIMETHYLIODOGERMANE
TRIMETHYLSILYLMETHYLTRIMETHYLGERMANE
TRIPHENYLBROMOGERMANE, tech-95
TRIPHENYLCHLOROGERMANE, tech-95
TRIPHENYLGERMANE
TRIS(TRIFLUOROMETHYL)IODOGERMANE
TRIS(TRIMETHYLSILYL)GERMANE
VINYLTRIETHYLGERMANE, 95%

5g
5g
1.0g
5g
5g
10g
25g
2.5g
2.5g
5g
2.5g
10g
2.5g
5g
10g
5g
5g
2.5g
10g
2.5g
10g
5g
5g
2.5g
5g
5g
5g
2.5g
10g
2.5g
5g
5g
2.5g
2.5g
2.5g
1.0g
2.5g

¥24,500¥16,800¥14,500¥14,000¥13,500¥15,000¥84,500¥14,500¥12,500¥26,500¥44,500¥18,300¥11,800¥13,500¥43,500¥32,500¥18,000¥23,500¥52,000¥39,000¥37,500¥30,500¥49,500¥77,000¥33,500¥25,800¥24,500¥33,500¥41,500¥26,800¥40,500¥27,500¥16,800¥21,500¥72,000¥49,500¥33,500

SIZE 2 PRICE 2
25g
5g
25g
25g
50g

¥53,500¥44,500¥42,500¥40,500¥46,500

10g ¥37,000
10g ¥30,500
50g ¥59,500
10g ¥28,000

OOFGOLD COATED GLASS SLIDESTRIETHYLPHOSPHINE GOLD(I) CHLORIDE
TRIETHYLPHOSPHINOGOLD(I) DIETHYLDITHIOCARBAMATE

5 slides ¥88,300
1.0g ¥30,800
0.5g ¥49,500

25g ¥58,500
10g ¥66,300

25g ¥89,500
25g ¥84,500
10g ¥99,000

10g ¥44,300
10g ¥59,500
10g ¥76,000
5g ¥110,000

2.5g
25g
25g
5g
100g
5g
5g
5g
25g
5g
25g
10g
100g
10g
5g
2.5g
5g
2.5g
5g
5g
1.0g

¥34,500¥18,000¥8,500¥29,500¥20,800¥34,500¥41,000¥16,800¥19,500¥33,500¥20,500¥16,000¥34,500¥40,800¥30,500¥23,300¥38,500¥14,000¥27,000¥84,500¥32,000

HOLMIUM(III) ACETATE, monohydrate
HOLMIUM(III) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATE
HOLMIUM 2,4-PENTANEDIONATE
HOLMIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE

5g
5g
2.5g
1.0g

¥11,500¥57,000¥20,500¥12,500

5g ¥36,500

DIMETHYLINDIUM CHLORIDEINDIUM COPPER BIS(ETHYLTHIOLATE)TRIPHENYLPHOSPHINE COMPLEXINDIUM COPPER BIS(PHENYLSELENATE)TRIPHENYLPHOSPHINE COMPLEXINDIUM DIISOPROPYLDITHIOCARBAMATEINDIUM HEXAFLUORO-2,4-PENTANEDIONATE, 95%
INDIUM METHOXYETHOXIDE, 15-18% in methoxyethanol

5g
10g
5g
10g
5g
5g

inquire¥39,500¥59,500¥32,000¥53,500¥12,500

25g ¥36,500

PR

BIS(PENTAMETHYLCYCLOPENTADIENYL)HAFNIUM DICHLORIDEHAFNIUM n-BUTOXIDEHAFNIUM n-BUTOXIDE, 45% in hexane
HAFNIUM t-BUTOXIDEHAFNIUM DI-n-BUTOXIDE (BIS-2,4-PENTANEDIONATE), tech, 50% in toluene/n-butanol
HAFNIUM DIETHYLAMIDEHAFNIUM DIMETHYLAMIDEHAFNIUM ETHOXIDEHAFNIUM 2-ETHYLHEXOXIDE, 95%
HAFNIUM 2-METHOXYMETHYL-2-PROPOXIDEHAFNIUM n-OCTOXIDE, 95%
HAFNIUM 2,4-PENTANEDIONATEHAFNIUM TETRACHLORIDEHAFNIUM TETRAIODIDEHAFNIUM TETRAKIS(ETHYLMETHYLAMIDE)
HAFNIUM TETRAKIS(TRIFLUOROMETHANESULFONATE), hydrate
HAFNIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEHAFNIUM 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE
HAFNOCENE DICHLORIDEPENTAMETHYLCYCLOPENTADIENYLHAFNIUM TRICHLORIDETETRABENZYLHAFNIUM

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g ¥48,500
100g ¥17,500

25g ¥53,500

50g ¥50,500
25g ¥109,000
10g ¥35,500

METAL ORGANICSCODE
GEP6894
GES6940
GET7000
GET7060
GET7080
GET7100
GET7101
GET7150
GET7280
GET7277
GET7296
GET7500
GET7550
GET7750
GET7850
GET8075
GET8080
GET8100
GET8150
GET8160
GET8200
GET8240
GET8300
GET8360
GET8383
GET8440
GET8500
GET8560
GET8561
GET8562
GET8595.5
GET8630
GET8640
GET8660
GET8717
GET8721.5
GEV9200
GOLD
W-GOG-75-1.1
OMGO017
OMGO019
HAFNIUMOMHF016
AKH325
AKH325.1
AKH326
AKH328
OMHF075
OMHF080
AKH330
AKH332
AKH333
AKH334
AKH335
INHF065
INHF070
OMHF083
CXHF083
AKH345
AKH350
OMHF085
OMHF050
OMHF077
HOLMIUMCXHO010
AKH358
AKH360
AKH362
INDIUM
OMIN020
AKI362.2
AKI362.4
AKI363
AKI364
AKI365595

PRODUCTSIZE 1 PRICE 1

INDIUM METHYL(TRIMETHYLACETYL)ACETATEINDIUM 2,4-PENTANEDIONATEINDIUM PHOSPHIDE WAFER
INDIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEINDIUM 1,1,1-TRIFLUORO-2,4-PENTANEDIONATEINDIUM TIN
INDIUM TIN OXIDE COATED GLASS SLIDESTRIMETHYLINDIUM

5g
2.5g
Each
1.0g
1.0g
25g
5 slides25g¥34,500¥11,500¥168,500¥21,800¥24,000¥22,000¥25,700
inquireIRIDIUM(I) CYCLOOCTADIENE CHLORIDE, dimer
IRIDIUM(I) DICARBONYL 2,4-PENTANEDIONATE
IRIDIUM(III) 2,4-PENTANEDIONATE
IRIDIUM(l) 2,4-PENTANEDIONATE-CYCLOOCTADIENE COMPLEX

2.5g
1.0g
0.5g
1.0g

¥59,500¥49,500¥21,500¥57,000

1,1’-BIS(DIMETHYLSILYL)FERROCENE
1,1’-BIS(DIPHENYLPHOSPHINO)FERROCENE
2-FERROCENYLETHYLTRIETHOXYSILANEFERROSILICON
IRON(II) ACETATE
IRON(III) ACRYLATE, 95%
IRON(III) BENZOYLACETONATE
IRON(lll) t-BUTOXIDEIRON CARBONYL, tech-95
IRON(lll) CITRATE, hydrate, tech-95
IRON(III) DIMETHYLDITHIOCARBAMATE
IRON(III) DIPHENYLPROPANEDIONATE
IRON(III) ETHOXIDEIRON(III) ETHOXIDE, 22-25% in tetrahydrofuran
IRON(III) HEXAFLUORO-2,4-PENTANEDIONATE
IRON(III) METHACRYLATE, 95%
IRON(II,III) OXIDE MAGNETOFLUID, 1.8% dispersed in light mineral oil
IRON(II,III) OXIDE MAGNETOFLUID, 3.6% dispersed in water
IRON(III) 2,4-PENTANEDIONATE
IRON(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
IRON(III) 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE
IRON(II) TRIS(1,10-PHENANTHROLINE) HEXAFLUOROPHOSPHATESTRONTIUM FERRITE, powder
VINYLFERROCENE

1.0g
10g
1.0g
500g
10g
25g
5g
2.5g
25g
100g
25g
5g
5g
100g
1.0g
50g
10g
5g
100g
10g
5g
5g
100g
5g

¥31,000¥28,500¥61,800¥10,900¥16,500¥26,000¥15,800¥94,500¥10,500¥9,300¥19,500¥41,500¥16,500¥33,500¥25,000¥26,000¥27,000¥26,000¥9,000¥37,500¥15,800¥75,500¥8,500¥64,500

LANTHANUM ACETATE, sesquihydrate
LANTHANUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATELANTHANUM ISOPROPOXIDE, 95%
LANTHANUM METHOXYETHOXIDE, 10-12% in methoxyethanol
LANTHANUM 2,4-PENTANEDIONATE, hydrate
LANTHANUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATELANTHANUM TRIFLUOROMETHANESULFONATELANTHANUM TRIS(HEXAMETHYLDISILAZIDE)

50g
1.0g
2.5g
25g
10g
1.0g
5g
5g

¥9,300¥19,500¥17,500¥16,000¥9,500¥12,000¥15,800¥77,700

LEAD, powder
LEAD(II) ACETATE, trihydrate
LEAD(II) ACRYLATELEAD BISILICATELEAD(II) CARBONATE
LEAD(II) CHLORIDE
LEAD(II) 2-ETHYLHEXANOATE, 95%
LEAD(II) FLUORIDE
LEAD(II) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATE
LEAD(II) HEXAFLUORO-2,4-PENTANEDIONATE
LEAD(II) METHACRYLATELEAD METHANESULFONATE, 50% in water
LEAD MONOSILICATELEAD(II) NEODECANOATE, 60% in heptane
LEAD(II) NITRATE
LEAD(II) OXIDELEAD(IV) OXIDELEAD(II) 2,4-PENTANEDIONATE, tech-95
LEAD(IV) PROPIONATE, tech-95
LEAD TETRAACETATE, tech-95
LEAD(II) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
LEAD TITANATE
LEAD TITANIUM OXOACETOXYETHOXIDELEAD(II) TRIFLUOROACETATE, hemihydrate
LEAD ZIRCONATE TITANATE WAFERTETRA-n-BUTYLLEAD, tech-95
TETRAETHYLLEADTETRAPHENYLLEAD, 95%

250g
250g
25g
250g
250g
250g
250g
100g
2.5g
5g
25g
25g
250g
25g
250g
500g
250g
25g
25g
100g
2.5g
100g
50g
10g
Each
5g
5g
5g

¥7,500¥12,500¥16,800¥14,000¥8,500¥11,800¥21,800¥13,000¥18,000¥18,500¥14,500¥12,500¥12,500¥20,500¥11,500¥10,500¥15,800¥14,000¥16,800¥16,500¥15,800¥10,800¥30,500¥14,500¥11,900
inquireinquire¥16,500

PR596

SIZE 2 PRICE 2
10g ¥27,300

100g ¥61,500

2.5g ¥72,500

50g ¥101,000

O
O
F

CODE
AKI373
AKI370W-INP-51-0.3
AKI374
AKI375DINSN20
W-ITO-75-1.1
OMIN079
IRIDIUM
OMIR017
AKI378
AKI380
AKI383
IRON
SIB1088.0
OMFE022
SIF4908.0
SIF4910.0
CXFE010CXFE015
AKI396
AKI396.5
INFE030
CXFE030
AKI397
AKI398
AKI400
AKI402
AKI405CXFE050
INFE043
INFE044
AKI410
AKI412
AKI415
AKI411
INSR036
OMFE090LANTHANUMCXLA010
AKL418
AKL420
AKL424
AKL430
AKL435
CXLA083
SIL6464.0
LEAD
PBL6180
PBL6190
PBL6193
PBL6195
PBL6210
PBL6220
PBL6280
PBL6285
PBL6286
PBL6287
PBL6295
PBL6298
PBL6300
PBL6340
PBL6360
PBL6380
PBL6400
PBL6420
PBL6430
PBL6455
PBL6458
PBL6465
PBL6459
PBL6470
W-PZT-25-02
PBL6457
PBL6459.5
PBL6460

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

25g ¥49,500

100g ¥22,500

25g ¥53,500

50g ¥94,500
25g ¥90,500
1kg ¥36,000

25g ¥49,500

10g
100g
50g
5g

¥46,800¥42,000¥24,500¥34,500

25g ¥60,500
250g ¥30,500

100g ¥35,500
10g ¥41,000

25g inquire

Enabling Your Technology
PRODUCTLUTETIUM 2,4-PENTANEDIONATE, hydrate

SIZE 1 PRICE 1

SIZE 2 PRICE 2

0.5g ¥16,500

2.5g ¥52,500

n-BUTYLLITHIUM, 2.5M in hexane
LITHIUM ACETATE, dihydrate
LITHIUM ACRYLATELITHIUM ALUMINUM HYDRIDE, pellets
LITHIUM t-BUTOXIDELITHIUM t-BUTOXIDE, 2M in THF
LITHIUM ETHOXIDE, 2M in ethanol
LITHIUM FORMATE, monohydrate
LITHIUM HEXAFLUOROSILICATE, dihydrate
LITHIUM HEXAMETHYLDISILAZIDELITHIUM HEXAMETHYLDISILAZIDE, 0.85M in hexane
LITHIUM HEXAMETHYLDISILAZIDE, 1.25M in tetrahydrofuran
LITHIUM ISOPROPOXIDELITHIUM METAGERMANATELITHIUM METASILICATELITHIUM METHACRYLATELITHIUM METHOXIDELITHIUM METHOXIDE, 2.25M in methanol (9-10 wgt %)LITHIUM NIOBATE WAFER
LITHIUM NIOBIUM DOUBLE METAL ALKOXIDE (0.85 M)
LITHIUM ORTHOSILICATE, tech-95
LITHIUM 2,4-PENTANEDIONATE
LITHIUM POLYSILICATE, 20% in water
LITHIUM SILICIDELITHIUM TANTALUM DOUBLE METAL ALKOXIDELITHIUM TETRAKIS(PENTAFLUOROPHENYL)BORATE DIETHYL ETHER COMPLEXLITHIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
LITHIUM TRIFLUOROACETATE, monohydrate
LITHIUM TRIFLUOROMETHANESULFONATE
LITHIUM TRIMETHYLSILANOLATE
LITHIUM (TRIMETHYLSILYL)ACETYLIDE, 0.5M in tetrahydrofuran
TRIMETHYLSILYLMETHYLLITHIUM, 1M in hexane

1.25kg
100g
25g
25g
25g
100g
100g
25g
10g
25g
100g
100g
5g
25g
500g
25g
25g
25g
Each
25g
25g
25g
100g
25g
10g
5g
5g
25g
25g
10g
25g
100g

inquire¥8,000¥16,500¥14,500¥18,500¥20,500¥29,000¥8,000¥20,400¥11,400¥8,300¥13,500¥11,500¥35,500¥26,800¥13,000¥14,500¥7,500¥80,400¥25,500¥67,100¥9,500¥6,100¥51,200¥22,500¥53,500¥20,500¥13,300¥15,000¥22,500¥13,000¥38,500

ALUMINUM MAGNESIUM ISOPROPOXIDEMAGNESIUM ACRYLATEMAGNESIUM ALUMINUM DOUBLE METAL ALKOXIDE, (0.75M)
MAGNESIUM ALUMINUM DOUBLE METAL ALKOXIDE, (1.0M)
MAGNESIUM t-BUTOXIDE, tech-90
MAGNESIUM ETHOXIDEMAGNESIUM HEXAFLUORO-2,4-PENTANEDIONATE, dihydrate
MAGNESIUM HEXAFLUOROSILICATEMAGNESIUM HYDRIDEMAGNESIUM LACTATE, trihydrate
MAGNESIUM METHACRYLATEMAGNESIUM METHOXIDE, 7-8% in methanol
MAGNESIUM METHOXYETHOXIDE, 25% in methoxyethanol
MAGNESIUM METHYL CARBONATE, 2M in dimethylformamide
MAGNESIUM MONTMORILLONATEMAGNESIUM 2,4-PENTANEDIONATE, dihydrate
MAGNESIUM SILICATE, hydrous
MAGNESIUM SILICIDE, powder
MAGNESIUM TITANIUM DOUBLE METAL ALKOXIDE (1.0M)
MAGNESIUM TRIFLUOROMETHANESULFONATEMAGNESIUM 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE, dihydrate
MAGNESIUM ZIRCONIUM DOUBLE METAL ALKOXIDE 1.0M)
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 1.0M in diethyl ether
TRIMETHYLSILYLMETHYLMAGNESIUM CHLORIDE, 3M in methyltetrahydrofuran

10g
25g
25g
25g
25g
100g
5g
500g
100g
250g
5g
25g
25g
100g
500g
100g
2.5kg
25g
25g
10g
5g
25g
100g
100g

¥41,000¥15,000¥9,000¥9,000¥13,500¥9,500¥28,500¥10,400¥44,500¥14,500¥9,000¥7,000¥10,500¥27,500¥9,600¥11,500¥17,700¥19,400¥9,800¥13,500¥16,800¥11,000¥28,400¥40,600

1.5kg ¥16,500
100g ¥24,000

MANGANESE(II) ACETATE, tetrahydrate
MANGANESE(II) ETHYLENEBIS(DITHIOCARBAMATE), tech-90
MANGANESE(II) 2,4-PENTANEDIONATE, tech-95
MANGANESE(III) 2,4-PENTANEDIONATE
MANGANESE(lll) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEMETHYLCYCLOPENTADIENYLMANGANESE TRICARBONYL

25g
25g
50g
50g
5g
25g

¥9,000¥16,500¥14,300¥15,500¥49,500¥34,500

250g ¥43,500
250g ¥48,500

MERCURY(II) ACETATEPHENYLMERCURIC ACETATE

25g ¥12,000
100g ¥28,500

MOLYBDENUM DISILICIDE, 99+%
MOLYBDENUM(V) ETHOXIDE, 90%
MOLYBDENUM HEXACARBONYL
MOLYBDENUM(VI) OXIDE BIS(2,4-PENTANEDIONATE)
MOLYBDENYL DIETHYLDITHIOCARBAMATE

100g
10g
100g
10g
10g

250g ¥61,500
100g ¥50,000
25g ¥13,500
100g ¥29,400
2.5kg ¥95,000
2kg ¥62,000

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015¥25,700¥35,500¥57,000¥10,500¥16,500

www.gelest.com

100g ¥37,000
500g ¥32,000

100g ¥72,800

100g ¥20,800
1kg ¥12,300

100g ¥38,800
100g ¥34,500

100g ¥19,300
100g ¥19,300
1kg ¥39,500

10kg ¥81,000

10kg ¥48,000
1kg ¥53,500
10kg ¥54,000
100g ¥21,500
25g ¥53,500
100g ¥25,500

METAL ORGANICS

PR

O
O
F

CODE
LUTETIUM
AKL480LITHIUM
OMLI012CXLI010CXLI015
INLI009
AKL454
AKL454.4
AKL458CXLI045
SIL6466.5
SIL6467.0
SIL6467.2
SIL6467.4
AKL459GEL6467
SIL6469.0
CXLI050
AKL460
AKL461
W-NBL-25-01
DLINB050
SIL6469.2
AKL470
SIL6469.5
SIL6469.6
DLITA050
OMBO039
AKL472CXLI080
CXLI083
SIL6469.7
SIL6470.0
SIT8593.5
MAGNESIUM
AKA074CXMG015DMGAL30DMGAL50
AKM490
AKM500
AKM502
SIM6470.5
INMG040
CXMG040
CXMG050
AKM503
AKM503.5
AKM506
SIM6470.7
AKM510SIM6471.0
SIM6472.0
DMGTI50
CXMG083
AKM524DMGZR50
SIT8594.0
SIT8594.1
MANGANESECXMN010
AKM528
AKM540
AKM545
AKM546
OMMN038MERCURYCXHG010CXHG070
MOLYBDENUM
SIM6594.8
AKM548
INMO030
AKM550
AKM54750g ¥28,500
50g ¥47,500

597

PRODUCTSIZE 1 PRICE 1

NEODYMIUM ACETATE, hydrate
NEODYMIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATENEODYMIUM HEXAFLUORO-2,4-PENTANEDIONATE, dihydrate
NEODYMIUM ISOPROPOXIDENEODYMIUM METHACRYLATE, trihydrate
NEODYMIUM METHOXYETHOXIDE, 16-18% in methoxyethanol
NEODYMIUM NEODECANOATE, 60% in heptane
NEODYMIUM NEODECANOATE, 45% in hexane
NEODYMIUM(III) 2,4-PENTANEDIONATE, monohydrate
NEODYMIUM 2,2,6,6-TETRAMETHYL-3-5-HEPTANEDIONATENEODYMIUM(III) 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE

25g
1.0g
5g
5g
5g
25g
25g
25g
1.0g
1.0g
2.5g

¥9,300¥15,000¥18,300¥34,500¥28,500¥21,500¥20,500¥11,500¥10,500¥12,500¥16,500

1,3-BIS(DIPHENYLPHOSPHINO)PROPANE NICKEL(II) CHLORIDENICKEL(II) ACETATE, tetrahydrate
NICKEL DI-n-BUTYLDITHIOCARBAMATE
NICKEL DIMETHYLDITHIOCARBAMATE
NICKEL FORMATE, dihydrate
NICKEL(II) HEXAFLUORO-2,4-PENTANEDIONATE, hydrate
NICKEL(II) 2,4-PENTANEDIONATE
NICKEL(II) 2,2,6,6-TETRAMETHYL-3-5-HEPTANEDIONATE
NICKEL(ll) TRIFLUOROMETHANESULFONATE
NICKEL(ll) 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE, dihydrate

5g
50g
25g
10g
25g
5g
25g
5g
5g
5g

¥23,000¥7,000¥12,500¥11,000¥8,300¥15,800¥9,500¥36,000¥25,500¥36,000

LITHIUM NIOBATE WAFER
LITHIUM NIOBIUM DOUBLE METAL ALKOXIDE (0.85 M)
NIOBIUM(V) n-BUTOXIDENIOBIUM DISILICIDE, 99+%
NIOBIUM(V) ETHOXIDENIOBIUM 2-ETHYLHEXANOATE, 95%
NIOBIUM OXALATE, MONOOXALATE ADDUCT

Each
25g
5g
25g
5g
10g
10g

¥80,400¥25,500¥17,500¥31,600¥14,500¥27,000¥13,300

BIS(BENZONITRILE)DICHLOROPALLADIUM(II)PALLADIUM(II) ACETATE, 99%
PALLADIUM HEXAFLUORO-2,4-PENTANEDIONATEPALLADIUM 2,4-PENTANEDIONATEPALLADIUM TRIFLUOROACETATETETRAKIS(TRIPHENYLPHOSPHINE)PALLADIUM(0)

1.0g
1.0g
1.0g
1.0g
1.0g
5g

¥13,000¥14,500¥20,800¥15,000¥20,500¥33,500

BIS(2-DIPHENYLPHOSPHINOETHYL)METHYLSILYLETHYLTRIETHOXYSILANE, mixed isomers
1,1’-BIS(DIPHENYLPHOSPHINO)FERROCENE[1,2-BIS(DIPHENYLPHOSPHINO)ETHANE]TUNGSTEN TETRACARBONYL
1,3-BIS(DIPHENYLPHOSPHINO)PROPANE
1,3-BIS(DIPHENYLPHOSPHINO)PROPANE NICKEL(II) CHLORIDEBIS(TRIMETHYLSILYL)AMINODIMETHYLPHOSPHINEBIS(TRIMETHYLSILYL)PHOSPHINE
t-BUTYLDICHLOROPHOSPHINE(t-BUTYLDIMETHYLSILYL)DIPHENYLPHOSPHINE, 95%
1-BUTYL-3-METHYLIMIDAZOLIUM HEXAFLUOROPHOSPHATE
DI-tert-BUTYL(TRIMETHYLSILYLMETHYL)PHOSPHINEDICYCLOHEXYLPHOSPHINE(2-DICYCLOHEXYLPHOSPHINOETHYL)TRIETHOXYSILANEDIETHOXYSILOXANE - ETHYLPHOSPHATE COPOLYMERDIETHYLDODECYLPHOSPHONATE
DIETHYLOCTADECYLPHOSPHONATE(2-DIETHYLPHOSPHATOETHYL)METHYLDIETHOXYSILANE, tech-95(2-DIETHYLPHOSPHATOETHYL)TRIETHOXYSILANE, tech-95
DIETHYLPHOSPHITE
DIETHYL(TRIMETHYLSILOXYCARBONYLMETHYL)PHOSPHONATE, 95%
O,O’-DIMETHYL(TRIMETHYLSILYL)PHOSPHITE, tech-95
DIPHENYLCHLOROPHOSPHINEDIPHENYLPHOSPHINEDIPHENYLPHOSPHINE, 20% in heptane(2-DIPHENYLPHOSPHINO)ETHYLDIMETHYLETHOXYSILANE
2-(DIPHENYLPHOSPHINO)ETHYLTRIETHOXYSILANE
3-(DIPHENYLPHOSPHINO)PROPYLTRIETHOXYSILANE(DIPHENYLPHOSPHINO)TRIMETHYLSILANE, 95%
DIPHENYLPHOSPHORYL AZIDEDIPHENYL(TRIMETHYLSILYLMETHYL)PHOSPHINE
DODECYLPHOSPHONIC ACIDHEXADECYLPHOSPHONIC ACIDHEXYLPHOSPHONIC ACIDINDIUM PHOSPHIDE WAFER
O,O’-DIMETHYL(TRIMETHYLSILYL)PHOSPHITE, tech-95
OCTADECYLPHOSPHONIC ACIDOCTYLPHOSPHONIC ACID

1.0g
10g
5g
25g
5g
10g
10g
10g
2.5g
50g
2.5g
25g
5g
25g
5g
5g
10g
25g
25g
10g
10g
25g
25g
25g
10g
5g
1.0g
5g
25g
5g
5g
5g
5g
Each
10g
5g
5g

¥60,700¥28,500¥35,500¥34,500¥23,000¥46,900
inquire¥16,500¥51,200¥59,500¥88,300
inquire¥45,900¥14,100¥49,500¥49,500¥24,100¥17,200¥8,000¥53,800¥24,700¥26,000
inquireinquire¥41,600¥15,400¥26,300¥37,400¥18,000¥77,700¥39,500¥64,500¥64,500¥168,500¥24,700¥39,500¥64,500

PR598

SIZE 2 PRICE 2
100g ¥20,000

2kg
5g
5g
10g

¥94,500¥28,500¥36,500¥43,500

2kg ¥34,500
100g ¥30,500

O
O
F

CODE
NEODYMIUMCXND010
AKN552
AKN554
AKN555CXND050
AKN556CXND060
CXND061
AKN560
AKN564
AKN566
NICKELINNI023
CXNI010
AKN572
AKN575CXNI045
AKN578
AKN580
AKN584CXNI083
AKN586NIOBIUM
W-NBL-25-01
DLINB050
AKN588
SIN6597.2
AKN590CXNB040CXNB070
PALLADIUM
INPD024
CXPD010
AKP595
AKP600CXPD080
OMPD082
PHOSPHORUS
SIB1091.0
OMFE022
INTU022
OMPH009
INNI023
SIB1852.8
SIB1868.6
OMPH011
SIB1955.0
OMPH012SID3351.5
OMPH018
SID3385.0
PSIPO-019
OMPH020
OMPH023
SID3411.0
SID3412.0
OMPH027
SID3420.0
SID4245.0
OMPH025
OMPH029
OMPH029.2
SID4557.5
SID4558.0
SID4558.2
SID4558.5
OMPH056
SID4589.5
OMPH058
OMPH059
OMPH060
W-INP-51-0.3
SID4245.0
OMPH062
OMPH061

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

25g ¥49,500
100g ¥20,500

100g ¥72,800
25g ¥56,500

50g ¥74,500

5g
5g
5g
5g
5g

¥36,500¥44,500¥69,500¥46,500¥68,500

50g ¥101,000

100g ¥37,900

100g ¥48,300
100g ¥15,800

100g inquire
25g ¥51,200

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

PHOSPHINE
POLY(PHOSPHONITRILIC CHLORIDE), 95%
SODIUM DI(ISOBUTYL)DITHIOPHOSPHINATE, 50% in water
TETRABUTYLPHOSPHONIUM CHLORIDETETRABUTYLPHOSPHONIUM CHLORIDE, 50% in toluene
TETRABUTYLPHOSPHONIUM HYDROXIDE, 40% in water
TETRADECYL(TRIHEXYL)PHOSPHONIUM CHLORIDETETRAKIS(2-DIPHENYLPHOSPHINOETHYL)TETRAMETHYLCYCLOTETRASILOXANE, 95%
TETRAKIS(TRIPHENYLPHOSPHINE)PALLADIUM(0)(THIOPHENOXYPHENYL)DIPHENYLSULFONIUM HEXAFLUOROPHOSPHATE - BLEND
TIN(II) PYROPHOSPHATE, hydrate
TITANIUM TRIS(DIOCTYLPYROPHOSPHATO)ISOPROPOXIDE, tech-90
TRI-tert-BUTYLPHOSPHINE
TRI-n-BUTYLTETRADECYLPHOSPHONIUM CHLORIDE, 95%
TRICYCLOHEXYLPHOSPHINE, 20-22% in toluene
TRIETHYLPHOSPHATE
TRIETHYLPHOSPHINE GOLD(I) CHLORIDE
TRIETHYLPHOSPHINOGOLD(I) DIETHYLDITHIOCARBAMATETRIETHYLPHOSPHITE
3-(TRIHYDROXYSILYL)PROPYL METHYLPHOSPHONATE, MONOSODIUM SALT, 42% in water
TRIMETHYLPHOSPHITE(3-TRIMETHYLSILYL-2-PROPYNYL)TRIPHENYLPHOSPHONIUM BROMIDETRIOCTYLPHOSPHINE, 95%
TRI-n-OCTYLPHOSPHINE SELENIDE
TRIPHENYLPHOSPHINE OXIDETRIS(2,4-DI-t-BUTYLPHENYL)PHOSPHITE
TRIS(4-ISOCYANATOPHENYL)THIOPHOSPHATE, 25-7% solution in ethyl acetate
TRIS(TRIMETHYLSILYLMETHYL)PHOSPHINE
TRIS(TRIMETHYLSILYL)PHOSPHATE
TRIS(TRIMETHYLSILYL)PHOSPHINE, 10% in hexane
TRIS(TRIMETHYLSILYL)PHOSPHITE, 95%
TRIS(TRIPHENYLPHOSPHINE)RHODIUM(I) CHLORIDE
TRIS(TRIPHENYLPHOSPHINE)RUTHENIUM(II) DICHLORIDETRI(o-TOLYL)PHOSPHINE
VINYL(DIPHENYLPHOSPHINOETHYL)DIMETHYLSILANE
ZINC O,O-DI-n-BUTYLPHOSPHORODITHIOATEZIRCONIUM (BIS-2-2-(ALLYLOXYMETHYL)BUTOXIDE)TRIS(DIOCTYLPHOSPHATE), 95%

25g
10g
25g
100g
100g
100g
25g
1.0g
5g
25g
25g
25g
5g
25g
100g
25g
1.0g
0.5g
100g
100g
100g
5g
25g
1.0g
100g
100g
25g
1.0g
25g
10g
10g
1.0g
5g
10g
5g
25g
25g

inquire¥35,500¥12,500¥14,500
inquire¥14,500¥8,500¥59,100¥33,500¥13,000¥10,500¥11,500
inquire¥21,500
inquire¥7,000¥30,800¥49,500¥7,000¥8,500inquire¥62,900¥13,500¥32,000¥12,500¥9,300¥16,500¥54,900¥14,600¥27,300¥22,500¥21,800¥39,000
inquire¥46,900¥14,300¥10,500

DIMETHYLPLATINUM(II) CYCLOOCTADIENE COMPLEXPLATINUM CARBONYL CYCLOVINYLMETHYLSILOXANE COMPLEXPLATINUM-CYCLOVINYLMETHYLSILOXANE COMPLEXPLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEXPLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene
PLATINUM-DIVINYLTETRAMETHYLDISILOXANE COMPLEX in xylene, LOW COLORPLATINUM-OCTANAL/OCTANOL COMPLEXPLATINUM 2,4-PENTANEDIONATE

1.0g
5g
5g
5g
5g
10g
5g
1.0g

¥59,500¥19,400¥18,000¥16,400¥19,400¥45,900¥15,100¥28,500

DIPOTASSIUM TRIS(1,2-BENZENEDIOLATO)O,O’ SILICATEFELDSPAR-POTASSIUMPOTASSIUM ACETATEPOTASSIUM ACRYLATEPOTASSIUM ACRYLATE, hemihydrate
POTASSIUM ACRYLATE, 18-20% in methanol
POTASSIUM BENZOATEPOTASSIUM t-BUTOXIDEPOTASSIUM t-BUTOXIDE, 1M in tetrahydrofuran (12-14 wgt%)
POTASSIUM t-BUTOXIDE, 1.6M in tetrahydrofuran (19-20 wgt%)
POTASSIUM ETHOXIDE, 95%
POTASSIUM ETHOXIDE, 20-22% in ethanol
POTASSIUM FORMATEPOTASSIUM HEXAFLUOROGERMANATEPOTASSIUM HEXAFLUOROSILICATEPOTASSIUM HEXAMETHYLDISILAZIDE, 11% in toluene, 0.5M
POTASSIUM HEXAMETHYLDISILAZIDE, 20% in THF
POTASSIUM HYDROTRIS(1-PYRAZOLATO)BORATE, hydrate
POTASSIUM ISOPROPOXIDE, 18 - 20% in isopropanol
POTASSIUM METHACRYLATEPOTASSIUM METHACRYLATE, hemihydrate
POTASSIUM METHOXIDE, 95%
POTASSIUM METHOXIDE, 3.4M in methanol (24-26%)
POTASSIUM 2-METHYL-2-BUTOXIDE, 14-16% in cyclohexane
POTASSIUM METHYLSILICONATE, 40% in water
POTASSIUM 2,4-PENTANEDIONATE, hydrate
POTASSIUM PHENYLDIMETHYLSILANOLATE, 95%
POTASSIUM n-PROPOXIDE, 18-20% in n-propanol
POTASSIUM STANNATE, trihydrate

10g
500g
250g
50g
100g
250g
100g
50g
25g
2kg
25g
25g
100g
5g
500g
400g
400g
5g
25g
50g
100g
25g
250g
100g
500g
50g
10g
100g
100g

¥20,400¥9,600¥8,300¥15,500¥15,000¥13,300¥8,000¥8,300¥7,000inquire¥7,000¥7,000¥7,500¥24,500¥23,400¥37,200¥23,400¥62,500¥8,500¥13,500¥12,500¥9,500¥10,500¥13,500¥13,000¥14,000¥32,600¥21,500¥7,500SIZE 2 PRICE 2

100g ¥30,500500g ¥44,500
500g ¥44,500
100g ¥17,500
2kg inquire
100g ¥27,300

100g ¥11,800
5g ¥110,000

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

500g ¥14,500
500g ¥24,700

500g ¥23,500
100g ¥39,500
50g ¥98,900
5g ¥73,500

100g ¥24,000
25g
25g
25g
25g

¥67,100¥59,100¥55,400¥67,100

25g ¥50,1005g ¥101,000
8kg ¥49,000
2kg ¥19,500

250g ¥19,500
2kg ¥64,500
500g ¥20,000
2kg ¥41,000
2kg ¥38,500
2kg ¥126,500
2kg ¥79,800
2kg ¥89,500
2kg inquire
250g ¥24,500
2kg ¥42,000
2kg ¥84,500

METAL ORGANICS

PR

O
O
F

CODE
INPH050
INPH055
AKS733
OMPH064
OMPH064.2
OMPH057
OMPH066
SIT7281.0
OMPD082
OMPH076
SNT7980
AKT889.1
OMPH072
OMPH073
OMPH073.4
OMPH074
OMGO017
OMGO019
OMPH077
SIT8378.5
OMPH079
SIT8606.7
OMPH080
OMSE082
OMPH081
OMPH082
OMPH088
SIT8722.7
SIT8723.0
SIT8723.4
SIT8723.6
INRH082
OMRU083
OMPH081.4
SIV9077.0
AKZ932.7
AKZ941
PLATINUM
OMPT021
SIP6829.2
SIP6832.2
SIP6830.3
SIP6831.2
SIP6831.2LC
SIP6833.2
AKP610POTASSIUM
SID4590.0
SIF4906.0
CXPO010CXPO015CXPO016
CXPO017CXPO020
AKP630
AKP631
AKP632
AKP640
AKP641CXPO045
GEP6894
SIP6895.0
SIP6890.0
SIP6890.1
OMBO073
AKP643CXPO050CXPO051
AKP645
AKP646
AKP648
SIP6898.0
AKP650
SIP6898.5
AKP652
SNP6900

500g ¥15,500

599

PRODUCTSIZE 1 PRICE 1

POTASSIUM SULFOPROPYLACRYLATEPOTASSIUM SULFOPROPYLMETHACRYLATEPOTASSIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEPOTASSIUM THIOACETATEPOTASSIUM TRIETHYLSILANOLATE, 95%
POTASSIUM TRIFLUOROACETATEPOTASSIUM TRIFLUOROMETHANESULFONATEPOTASSIUM TRIMETHYLSILANOLATE, 95%
POTASSIUM TRIMETHYLSILANOLATE, 2M in tetrahydrofuran
POTASSIUM VINYLDIMETHYLSILANOLATE, tech-90
POTASSIUM poly(VINYLSULFATE)

25g
25g
5g
25g
10g
25g
10g
25g
25g
10g
10g

inquire¥9,500¥19,500¥12,500¥19,400¥11,800¥10,500¥14,600¥8,800¥18,300¥49,500

PRASEODYMIUM ACETATE, trihydrate
PRASEODYMIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATE
PRASEODYMIUM HEXAFLUORO-2,4-PENTANEDIONATE
PRASEODYMIUM METHOXYETHOXIDE, 15-17% in methoxyethanol
PRASEODYMIUM 2,4-PENTANEDIONATE, hydrate
PRASEODYMIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
PRASEODYMIUM TRIS(HEXAMETHYLDISILAZIDE)PRASEODYMIUM ZIRCONIUM SILICATE

25g
1.0g
1.0g
25g
10g
5g
5g
25g

¥11,000¥16,500¥14,500¥22,500¥14,500¥32,500¥81,400¥14,600

METHYLTRIOXORHENIUM(VII)RHENIUM CARBONYL
TRIMETHYLSILYL PERRHENATE

0.5g ¥22,500
1.0g ¥19,500
2.5g ¥46,400

RHODIUM(II) ACETATE, dimer
RHODIUM (1,5-CYCLOOCTADIENE)-2,4-PENTANEDIONATERHODIUM(I) DICARBONYL 2,4-PENTANEDIONATERHODIUM(l) HYDRIDOCARBONYLTRIS(TRIPHENYLPHOSPHINE)
RHODIUM(III) 2,4-PENTANEDIONATERHODIUM 1,1,1-TRIFLUORO-2,4-PENTANEDIONATE
TRIS(DIBUTYLSULFIDE)RHODIUM TRICHLORIDE, 20-22% in toluene
TRIS(TRIPHENYLPHOSPHINE)RHODIUM(I) CHLORIDE

0.5g
1.0g
0.5g
1.0g
0.5g
0.5g
5g
1.0g

RUBIDIUM ACETATERUBIDIUM 2,4-PENTANEDIONATE, hydrate
RUBIDIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE

10g ¥18,300
5g ¥50,500
5g ¥37,500

BATHOPHENANTHROLINE RUTHENIUM DICHLORIDEDIETHYLRUTHENOCENEPHENANTHROLINE RUTHENIUM DICHLORIDE, monohydrate
RUTHENIUM(ll) CYCLOOCTADIENE BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)
RUTHENIUM(III) OXOACETATE, trihydrate
RUTHENIUM(III) 2,4-PENTANEDIONATERUTHENIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATERUTHENOCENE
TRIS(TRIPHENYLPHOSPHINE)RUTHENIUM(II) DICHLORIDE

1.0g
5g
1.0g
1.0g
1.0g
1.0g
1.0g
5g
5g

¥49,500¥99,500¥26,000¥35,800¥40,500¥16,800¥45,800¥93,300¥39,000

SAMARIUM ACETATE, hydrate
SAMARIUM(III) ISOPROPOXIDESAMARIUM 2,4-PENTANEDIONATE, hydrate
SAMARIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
SAMARIUM(III) THENOYLTRIFLUOROACETONATE
SAMARIUM TRIFLUOROMETHANESULFONATE
SAMARIUM TRIS(HEXAMETHYLDISILAZIDE)

25g
2.5g
10g
1.0g
1.0g
5g
1.0g

¥15,800¥18,500¥12,500¥13,000¥40,000¥12,500¥42,700

SCANDIUM ACETATE, hydrate
SCANDIUM(III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE, hydrate
SCANDIUM TRIFLUOROMETHANESULFONATE5g ¥59,500
0.5g ¥15,000
1.0g ¥15,000

BIS(TRIMETHYLSILYL)SELENIDEDIPHENYLDISELENIDEGERMANIUM DISELENIDE
PHENYLSELENIUM CHLORIDE(PHENYLSELENOMETHYL)TRIMETHYLSILANE, 95%
PHENYLSELENOTRIMETHYLSILANE, 95%
SELENIUM DIMETHYLDITHIOCARBAMATE, 95%
TRI-n-OCTYLPHOSPHINE SELENIDE

1.0g
25g
5g
10g
5g
5g
25g
1.0g

¥86,700¥32,000¥38,500¥32,500¥52,200¥73,500¥15,500¥32,000

SILVER ACETATE, 99%
SILVER ACRYLATESILVER DIETHYLDITHIOCARBAMATESILVER(I) 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATESILVER(I) HEXAFLUORO-2,4-PENTANEDIONATE - CYCLOOCTADIENE COMPLEXSILVER LACTATE, monohydrate
SILVER METHACRYLATE

10g
1.0g
5g
1.0g
2.5g
5g
1.0g

¥13,300¥13,300¥14,300¥16,500¥32,000¥28,500¥13,300

PR
600

SIZE 2 PRICE 2
100g inquire
100g ¥20,800
50g ¥67,100
100g ¥39,500
2kg ¥90,900

5g ¥52,500
5g ¥44,500

O
O
F

CODE
CXPO074
CXPO076
AKP654CXPO077
SIP6899.0
CXPO080
CXPO083
SIP6901.0
SIP6901.2
SIP6902.0
CXPO091
PRASEODYMIUMCXPR010
AKP656
AKP657
AKP658
AKP660
AKP661
SIP6902.1
SIP6902.2
RHENIUM
OMRE047
INRE030
SIT8598.0
RHODIUM
CXRH010
AKR662
AKR663
INRH065
AKR665
AKR667
INRH078
INRH082
RUBIDIUMCXRB010
AKR668
AKR668.5
RUTHENIUMOMRU018
OMRU027OMRU026
AKR669CXRU010
AKR670
AKR672OMRU055
OMRU083
SAMARIUMCXSM010
AKS676
AKS680
AKS686
AKS687CXSM083
SIS6943.4
SCANDIUMCXSC010
AKS688CXSC083
SELENIUM
SIB1871.0
OMSE028
GEG5350OMSE080
SIP6745.0
SIP6747.0
AKS704
OMSE082
SILVERCXSV010CXSV015
AKS720
AKS723
AKS724CXSV049
CXSV050

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015¥33,500¥77,000¥32,000¥36,000¥27,000¥36,500¥28,500¥21,800

www.gelest.com

50g ¥44,500

5g ¥64,500

2.5g ¥121,000

2.5g ¥115,000
5g ¥125,000
2.5g ¥94,500

25g ¥101,0005g ¥73,500

5g ¥53,300

10g ¥50,000
50g ¥36,500
5g ¥38,500

2.5g ¥46,500
5g ¥46,500
5g ¥167,000

100g ¥40,300
50g ¥39,500

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

SILVER NEODECANOATE, 95%
SILVER NEODECANOATE, 25% in xylene
SILVER 2,4-PENTANEDIONATE, 95%
SILVER p-TOLUENESULFONATESILVER TRIFLUOROACETATESILVER TRIFLUOROMETHANESULFONATE

10g
25g
5g
10g
10g
10g

¥14,300¥9,000¥27,500¥20,500¥18,000¥22,500

FELDSPAR-SODIUM
SODIUM ACETATESODIUM 2-ACRYLAMIDO-2-METHYLPROPANE SULFONATE
SODIUM 2-ACRYLAMIDO-2-METHYLPROPANE SULFONATE, 50% in water
SODIUM ACRYLATE, anhydrous
SODIUM ACRYLATE, hemihydrate
SODIUM polyACRYLATE, 45% in water
SODIUM ALLYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM ALLYLOXYETHOXIDE, 20% in allyloxyethanol
SODIUM ALLYLSULFONATE, 35% in water
SODIUM ALUMINUM DICAPROLACTAM BIS(2-METHOXYETHOXIDE), 80% in toluene
SODIUM ALUMINUM HYDRIDE BIS(METHOXYETHOXIDE), 70% (3.4M) in toluene
SODIUM poly-D,L-ASPARTATE, 40-42% in water
SODIUM BIS-2-(ALLYLOXYMETHYL)BUTOXIDE, 10% in toluene
SODIUM BIS(TRIMETHYLSILYL)AMIDE, 95%
SODIUM BIS(TRIMETHYLSILYL)AMIDE, 2M in tetrahydrofuran
SODIUM n-BUTOXIDE, 20% in n-butanol
SODIUM t-BUTOXIDESODIUM DI-n-BUTYLDITHIOCARBAMATE, 47% in water
SODIUM DIETHYLDITHIOCARBAMATE, 23-25% in water
SODIUM DI(ISOBUTYL)DITHIOPHOSPHINATE, 50% in water
SODIUM DIISOPROPYLDITHIOCARBAMATE, tech-90
SODIUM DIMETHYLDITHIOCARBAMATE, hydrate
SODIUM DIMETHYLDITHIOCARBAMATE, 40% in water
SODIUM ETHOXIDE. 95%
SODIUM ETHOXIDE, 21% in ethanol
SODIUM FORMATE, hydrate
SODIUM FUMARATESODIUM (2-FURYL)DIMETHYLSILANOLATE
SODIUM HEXAFLUORO-2,4-PENTANEDIONATE
SODIUM HEXAFLUOROSILICATESODIUM ISOPROPOXIDE, 20% in tetrahydrofuran
SODIUM ITACONATE
SODIUM MALEATE, hydrate
SODIUM METAGERMANATE, hydrate, 95%
SODIUM METASILICATESODIUM METHACRYLATESODIUM METHACRYLATE, hemihydrate
SODIUM polyMETHACRYLATE, 40% in water
SODIUM METHOXIDE, 95%
SODIUM METHOXIDE, 25% in methanol
SODIUM METHOXYETHOXIDE, 20% in methoxyethanol
SODIUM METHYLACETOACETATESODIUM 2-METHYL-2-BUTOXIDESODIUM (4-METHYLPHENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM METHYLSILICONATE, 30% in water
SODIUM MONTMORILLONITE CLAY
SODIUM poly[(NAPHTHALENEFORMALDEHYDE) SULFONATE]
SODIUM ORTHOSILICATE, tech-90
SODIUM OXALATE, 99%
SODIUM 2,4-PENTANEDIONATE
SODIUM PHENOXIDE, 95%, anhydrous
SODIUM PHENOXIDE, 20% in methanol
SODIUM PHENYLDIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM n-PROPOXIDE, 20% in n-propanol
SODIUM STANNATE, trihydrate
SODIUM p-STYRENE SULFONATE, hydrate, tech-95
SODIUM (2-THIENYL)DIMETHYLSILANOLATE, 2M in tetrahydrofuran
SODIUM THIOPHENOXIDE, tech-95
SODIUM TIN ETHOXIDE, 95%
SODIUM TRIFLUOROACETATESODIUM TRIFLUOROMETHANESULFONATE
SODIUM TRIMETHYLSILANOLATE, 96%
SODIUM VINYLSULFONATE, 25% in water
3-(TRIHYDROXYSILYL)PROPYL METHYLPHOSPHONATE, MONOSODIUM SALT, 42% in water

500g
100g
25g
100g
50g
100g
100g
10g
25g
25g
25g
100g
25g
25g
50g
100g
100g
50g
25g
100g
25g
25g
25g
100g
50g
25g
100g
100g
10g
5g
25g
100g
10g
25g
5g
500g
50g
100g
100g
50g
25g
25g
100g
25g
10g
100g
100g
100g
500g
100g
50g
25g
100g
10g
25g
100g
100g
10g
25g
10g
25g
10g
25g
25g
100g

¥9,600¥7,500¥13,500¥9,300¥19,500¥20,500¥7,500¥51,200¥19,500¥9,300¥22,500¥15,800¥9,300¥11,800¥35,300¥13,000¥9,300¥9,000¥9,300¥16,500¥12,500¥24,500¥16,500¥9,300¥10,500¥7,000¥7,500¥8,500¥49,900¥15,000¥7,400¥12,500¥10,500¥11,800¥16,800¥8,800¥11,500¥15,000¥7,000¥7,000¥7,000¥10,500¥11,800¥7,500¥35,300¥6,600¥6,600¥11,500¥23,600¥10,500¥13,500¥12,500¥9,000¥27,300¥10,500¥8,500¥16,000¥49,900¥16,500¥16,800¥10,500¥14,000¥19,900¥12,500¥8,500STRONTIUM ACETATE, hemihydrate
STRONTIUM ACRYLATE, hydrate
STRONTIUM HEXAFLUORO-2,4-PENTANEDIONATE

25g ¥7,000
25g ¥14,300
2.5g ¥10,000

SIZE 2 PRICE 2
100g ¥19,300
25g ¥94,500
50g ¥58,500
10kg ¥48,000
500g ¥16,500
2.5kg ¥39,500
4kg ¥25,500

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g ¥20,000
2kg ¥47,500

100g ¥28,000
2kg
500g
2kg
100g

¥136,000¥23,500¥64,500¥20,000

100g ¥30,500

2.5kg
2kg
2kg
500g
2kg

¥25,500¥49,500¥28,500¥16,500¥49,500

25g ¥46,500
500g ¥12,500500g ¥36,500
25g ¥53,500
3kg ¥28,400
250g ¥32,500
4kg
2kg
2kg
100g

¥16,500¥18,000¥16,500¥24,000

100g ¥14,500
2.5kg ¥26,000
2kg ¥25,600

100g ¥30,500500g ¥22,500
100g ¥24,000
500g ¥20,500

100g ¥57,000

METAL ORGANICS

PR

O
O
F

CODE
CXSV060CXSV061
AKS725CXSV078
CXSV080
CXSV083
SODIUM
SIF4907.0
CXSO010
CXSO008
CXSO009
CXSO015
CXSO016
CXSO017
SIS6977.0
AKS725.2
CXSO018
AKS725.5
AKS726
CXSO019
AKS727
SIS6980.0
SIS6980.2
AKS728
AKS730
AKS732
AKS732.5
AKS733
AKS734
AKS735
AKS736
AKS740
AKS741CXSO045
CXSO046
SIS6980.6
AKS745
SIS6981.0
AKS751CXSO048
CXSO049
GES6940
SIS6982.0
CXSO050
CXSO051
CXSO052
AKS760
AKS761
AKS762
AKS764
AKS768
SIS6983.0
SIS6984.0
SIS6985.0
CXSO054
SIS6986.0
CXSO070
AKS770
AKS775
AKS775.2
SIS6986.1
AKS780
SNS6950
CXSO073
SIS6987.0
AKS784
SNS6960
CXSO080
CXSO083
SIS6988.0
CXSO092
SIT8378.5
STRONTIUMCXSR010CXSR015
AKS786500g ¥24,700

10g ¥20,800

601

PRODUCTSIZE 1 PRICE 1

STRONTIUM FERRITE, powder
STRONTIUM ISOPROPOXIDESTRONTIUM METHOXYPROPOXIDE, 18-20% in methoxypropanol
STRONTIUM NEODECANOATESTRONTIUM 2,4-PENTANEDIONATE, hydrate
STRONTIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE, anhydrous
STRONTIUM TITANIUM DOUBLE METAL ALKOXIDESTRONTIUM ZIRCONIUM

100g
2.5g
25g
10g
25g
1.0g
25g
25g

¥8,500¥12,000¥9,800¥19,500¥21,500¥10,300¥18,500¥19,500

LITHIUM TANTALUM DOUBLE METAL ALKOXIDETANTALUM(V) n-BUTOXIDETANTALUM(V) ETHOXIDETANTALUM(V) ISOPROPOXIDETANTALUM(V) METHOXIDETANTALUM PENTABROMIDETANTALUM PENTAFLUORIDETANTALUM PENTAKIS(DIMETHYLAMIDE)
TANTALUM SILICIDE, 99.9+%
TANTALUM SODIUM METHOXIDETANTALUM TETRAETHOXIDE DIMETHYLAMINOETHOXIDETANTALUM(V) TETRAETHOXIDE 2,4-PENTANEDIONATETANTALUM(V) TRIFLUOROETHOXIDETRIS(DIETHYLAMINO)(t-BUTYLIMINO) TANTALUM
TRIS(DIMETHYLAMIDO)tert-AMYLIMIDOTANTALUM

10g
5g
5g
5g
2.5g
25g
25g
5g
10g
2.5g
10g
10g
25g
10g
25g

¥22,500¥18,500¥12,500¥44,500¥15,500¥41,500¥57,000¥47,500¥16,200¥15,800¥45,500¥24,500¥57,000¥84,500¥84,500

BIS(TRIMETHYLSILYL)TELLURIDEGERMANIUM TELLURIDETELLURIUM(IV) DIETHYLDITHIOCARBAMATE, 95%
TELLURIUM(IV) ETHOXIDE. 85%

2.5g
5g
25g
10g

¥88,300¥44,500¥10,000¥27,500TERBIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATETERBIUM 2,4-PENTANEDIONATE, trihydrate
TERBIUM 3,5-HEPTANEDIONATETERBIUM ACETATE, hydrate
TERBIUM TRIS(HEXAMETHYLDISILAZIDE)

1.0g
1.0g
5g
5g
1.0g

¥15,000¥10,000¥32,000¥21,500¥48,000

THALLIUM BENZOYLACETONATE
THALLIUM(I) ETHOXIDETHALLIUM FORMATE
THALLIUM HEXAFLUORO-2,4-PENTANEDIONATE
THALLIUM 2,4-PENTANEDIONATE
THALLIUM 2,2,6,6-TETRAMETHYL3,5-HEPTANEDIONATE

5g
25g
1.0g
1.0g
5g
1.0g

¥45,500¥44,500¥11,800¥19,500¥21,500¥19,500

THULIUM ACETATE, hydrate
THULIUM 2,4-PENTANEDIONATE, trihydrate
THULIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE5g ¥34,500
1.0g ¥13,300
1.0g ¥15,000

ACRYLOXYTRI-n-BUTYLTINACRYLOXYTRIPHENYLTIN, tech-95
ALLYLTRI-n-BUTYLTINALLYLTRIMETHYLTIN, tech-95
ALLYLTRIPHENYLTINBIS[BIS(TRIMETHYLSILYL)AMINO]TIN(ll), 95%
BIS(CARBOMETHOXYETHYL)DICHLOROTIN, 95%
BIS(CARBOMETHOXYETHYL)DIMETHYLTIN
BIS(2-ETHYLHEXANOATE)TIN, tech-95
BIS(2-ETHYLHEXANOATE)TIN, 50% in polydimethylsiloxane
BIS(1R,2S,5R)-MENTHYLDIPHENYLTIN
BIS(NEODECANOATE)TIN, tech-90
BIS(PENTAMETHYLCYCLOPENTADIENYL)TIN
BIS(2,4-PENTANEDIONATO)DICHLOROTIN
BIS(TRI-n-BUTYLSTANNYL)ACETYLENE
trans-BIS(TRI-n-BUTYLSTANNYL)ETHYLENE
BIS(TRI-n-BUTYLTIN)ACETYLENEDICARBOXYLATE, 90%
BIS(TRI-n-BUTYLTIN)OXIDEBIS(TRI-n-BUTYLTIN)SULFIDEBIS(TRICYCLOHEXYLTIN)OXIDE, 95%
BIS(TRIETHYLTIN)OXIDEBIS(TRINEOPHYLTIN)OXIDE, tech-95
BIS(TRIPHENYLTIN)OXIDEBIS(TRIPHENYLTIN)SULFIDEBUTYLCHLORODIHYDROXYTIN
n-BUTYLDIMETHYLCHLOROTIN
n-BUTYLTIN HYDROXIDE OXIDEt-BUTYLTRI n-BUTYLTIN
n-BUTYLTRICHLOROTIN

10g
10g
10g
5g
10g
5g
10g
10g
100g
100g
5g
50g
5g
10g
1.0g
5g
5g
100g
25g
5g
5g
10g
25g
10g
100g
10g
100g
10g
25g

PR
602

SIZE 2 PRICE 2
10g ¥29,000
100g ¥21,500
100g
5g
100g
100g

¥59,500¥27,500¥50,000¥53,300

25g ¥60,500
25g ¥36,500
10g ¥40,300

O
O
F

CODE
INSR036
AKS790
AKS793CXSR060
AKS800
AKS802DSRTI50DSRZR50TANTALUMDLITA050
AKT805
AKT810
AKT813
AKT815INTA070
INTA075
OMTA075
SIT6996.0
AKT816
AKT817
AKT818.2
AKT818.5
OMTA082
OMTA084
TELLURIUM
SIB1873.0
GEG5480
AKT818.8
AKT819TERBIUM
AKT821
AKT820
AKT819.5
CXTB010
SIT6997.0
THALLIUM
AKT822
AKT825CXTL055
AKT828
AKT830
AKT832
THULIUM
CXTM010
AKT840
AKT840.5
TIN
SNA0310
SNA0330
SNA0500
SNA0560
SNA0580
SNB1025
SNB1026.6
SNB1026.8
SNB1100
SNB1101
SNB1250
SNB1710
SNB1730
SNB1750
SNB1790
SNB1794
SNB1792
SNB1800
SNB1805
SNB1815.4
SNB1826
SNB1879
SNB1900
SNB1920
SNB1933
SNB1936
SNB1960
SNB1979
SNB2000

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015¥16,500¥19,500¥12,000¥41,500¥11,000¥12,500¥25,800¥35,500¥7,500¥7,000¥39,500¥9,300¥74,500¥13,300¥12,000¥69,500¥34,500
inquire¥21,500¥37,500
inquire¥36,500¥13,500¥22,500¥11,000¥19,500¥11,000¥27,000¥7,500www.gelest.com

25g ¥177,000

50g ¥84,500

100g ¥22,500
5g ¥46,500
5g ¥26,500

5g ¥39,500
5g ¥46,500

50g ¥34,500
25g ¥36,500
2.5kg ¥34,000
1kg ¥23,500
250g ¥23,500
5g ¥34,500
1kg inquire

100g ¥33,800500g ¥30,500500g ¥30,500
250g ¥24,000

Enabling Your Technology
CODE

PRODUCT

SIZE 1 PRICE 1

SNB2050
SNC2060
SNC2078
SNC2308
SNC2500
SND2600
SND2700
SND2730
SND2740
SND2800
SND2900
SND2901
SND2930
SND2950
SND2980
SND3110
SND3160
SND3164
SND3175
SND3180
SND3250
SND3253
SND3255
SND3257
SND3260
SND3258
SND3280
SND3285
SND3320
SND3340
SND3350
SND3351
SND3355
SND3383
SND3384
SND3403
SND3375
SND3515
SND3534
SND3550
SND3610
SND4055
SND4060
SND4062
SND4063
SND4115
SND4200
SND4201
SND4203
SND4205
SND4220
SND4240
SND4242
SND4320
SND4410
SND4430
SND4435
SND4450
SND4460
SND4480
SND4505
SND4520
SND4589
SND4592
SND4600
SND4617
SNE4620
SNE4621
SNE4900.3
SNE4901.7
SNE4900
SNF4915
SNH5900
SNH5918
SNH6120
SNH6126n-BUTYLTRIS(2-ETHYLHEXANOATE)TIN
CALCIUM STANNATE
CARBOMETHOXYETHYLTRICHLOROTIN
CHLOROMETHYLTRIMETHYLTINCYCLOPENTADIENYLTRI-n-BUTYLTIN
1,3-DIACETOXY-1,1,3,3-TETRABUTYLTIN OXIDEDIACETOXYTIN, tech-95
DIALLYLDIBROMOTIN, tech-95
DIALLYLDI-n-BUTYLTIN
DI-n-BUTYLBIS(DODECYLTHIO)TIN, tech-95
DI-n-BUTYLBIS(2-ETHYLHEXANOATE)TIN, tech-95
DI-n-BUTYLBIS(2-ETHYLHEXANOATE)TIN, 50% in xylene
DI-n-BUTYLBIS(2-ETHYLHEXYLMALEATE)TIN, tech-95
DI-n-BUTYLBIS(2,4-PENTANEDIONATE)TIN, tech-95
DI-n-BUTYLBIS(1-THIOGLYCEROL)TIN
DI-n-BUTYLBUTOXYCHLOROTIN, tech-95
DI-n-BUTYLDIACETOXYTIN, tech-95
DI-n-BUTYLDIACRYLATETIN, tech-95
DI-n-BUTYLDIBROMOTIN
DI-n-BUTYLDI-n-BUTOXYTIN, 95%
DI-n-BUTYLDICHLOROTIN
DI-t-BUTYLDICHLOROTIN
DI-n-BUTYLDIFLUOROTIN
DI-n-BUTYLDIISOTHIOCYANATOTIN
DI-n-BUTYLDILAURYLTIN, tech-95
DI-n-BUTYLDIMETHACRYLATETIN, 95%
DI-n-BUTYLDIMETHOXYTIN
DI-n-BUTYLDINEODECANOATETIN, tech-95
DI-n-BUTYL(MALEATE)TIN
DI-n-BUTYL-S,S’-BIS(2-ETHYLHEXYLMERCAPTOACETATE)TIN, tech-95
DI-n-BUTYLTIN OXIDE
DI-t-BUTYLTIN OXIDE
DI-n-BUTYLTIN SULFIDE, tech-95
DICYCLOHEXYLDICHLOROTINDICYCLOHEXYLDIMETHYLTINDIETHYLDICHLOROTIN
DIETHYLTIN OXIDE
4,5-DIHYDRO-2-FURYLTRI-n-BUTYLTIN(N,N-DIISOPROPYLCARBAMOYL)TRIBUTYLTINDIMETHYLAMINOTRI-n-BUTYLTINDIMETHYLAMINOTRIMETHYLTIN, tech-95
DIMETHYLBIS(DODECYLTHIO)TIN, tech-95
DIMETHYL-S,S’-BIS(2-ETHYLHEXYLMERCAPTOACETATE)TIN, tech-80
DIMETHYLBIS(2,4-PENTANEDIONATE)TIN
DIMETHYLBIS(8-QUINOLATO)TIN
DIMETHYLDIBROMOTIN, 95%
DIMETHYLDICHLOROTIN
DIMETHYLDICHLOROTIN, 50% in water
DIMETHYLDIFLUOROTIN
DIMETHYLDIIODOTIN
DIMETHYLDINEODECANOATETIN, tech-95
DIMETHYLHYDROXY(OLEATE)TIN, tech-85
DIMETHYLTIN OXIDEDINEOPHYLDICHLOROTIN
DIOCTYLDICHLOROTIN, tech-95
DIOCTYLDILAURYLTIN, tech-95
DIOCTYLDINEODECANOATETIN, tech-95
DIOCTYL(MALEATE)TIN, tech-95
DIOCTYLTIN OXIDE
DI-n-PENTYLDICHLOROTIN, tech-95
DIPHENYLDI-n-BUTYLTINDIPHENYLDICHLOROTIN, tech-95
DIPHENYLTIN OXIDE
DI-n-PROPYLDICHLOROTIN
DIVINYLDI-n-BUTYLTIN
DIVINYLDICHLOROTIN
1-ETHOXYVINYLTRI-n-BUTYLTIN
2-ETHOXYVINYLTRI-n-BUTYLTINETHYL-3-(TRI-n-BUTYLTIN)PROPENOATEETHYLTRIMETHYLTINETHYNYLTRI-n-BUTYLTIN, 95%
p-FLUOROPHENYLTRI-n-BUTYLTIN, 95%
HEXA-n-BUTYLDITINHEXA(CYCLOHEXYL)DITINHEXAMETHYLDITINHEXANEOPHYLDITIN

100g
25g
10g
5g
5g
25g
10g
5g
10g
100g
25g
25g
50g
25g
25g
25g
25g
50g
10g
25g
100g
5g
25g
1.0g
100g
10g
5g
50g
100g
50g
100g
2.5g
25g
5g
5g
1.0g
5g
2.5g
5g
10g
5g
25g
25g
25g
10g
5g
10g
25g
1.0g
5g
50g
25g
5g
5g
25g
25g
25g
50g
50g
1.0g
25g
25g
5g
1.0g
5g
10g
5g
5g
1.0g
10g
2.5g
5g
10g
5g
5g
1.0g

SIZE 2 PRICE 2
1kg ¥25,500

25g ¥40,500
50g ¥58,500
2kg
100g
450g
250g
2kg
100g
100g
2.5kg

¥52,500¥30,500¥20,800¥14,500¥44,500¥20,000¥25,500¥54,000

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g ¥24,000
1kg ¥28,500

2.5kg
50g
25g
250g
500g
250g
500g

¥36,500¥40,500¥27,500¥16,500¥28,500¥20,500¥19,500

100g ¥25,500

50g ¥43,500

100g ¥36,300
100g ¥24,000

50g ¥53,500
2kg ¥70,500

250g ¥15,500
100g ¥14,500
25g ¥24,500
100g ¥29,000
100g ¥16,000
100g ¥24,000
250g ¥26,500
100g ¥37,000
100g ¥30,500
25g ¥36,500

25g ¥76,500

10g ¥51,000

METAL ORGANICS

PR

O
O
F

¥8,000¥13,500¥26,000¥45,000¥13,500¥15,000¥18,000¥20,500¥25,500¥8,000¥12,500¥7,000¥7,000¥7,000¥9,300¥11,000¥7,000¥37,500¥13,500¥10,500¥9,300¥25,500¥34,000¥15,800¥7,500¥13,500¥10,300¥7,500¥10,500¥8,500¥8,300¥19,500¥11,000¥23,000¥27,500¥25,500¥26,500¥34,500¥34,500¥14,300¥25,500¥14,300¥10,500¥20,500¥26,000¥28,500¥16,500¥9,300¥22,500¥28,500¥7,500¥7,500¥9,500¥32,000¥12,000¥7,000¥10,500¥12,500¥10,000¥57,000¥14,500¥12,500¥12,500¥21,500¥15,000¥27,000¥22,500¥34,500¥27,500¥26,500¥18,800¥49,500¥14,000¥49,500¥26,500¥57,000

50g ¥42,500

603

CODE

PRODUCT

SIZE 1 PRICE 1

SNH6159DINSN20
W-ITO-75-1.1
SNM6488
SNM6512.8
SNM6521
SNO6714
SNP6734
SNP6765
SNP6740
SNP6820
SNP6828.2
SNP6828.4
SNP6900
SNP6925
SNP6929
SNP6935
SNP6936
SNS6950
SNS6960
SNT6990
SNT7040
SNT7064
SNT7072
SNT7075
SNT7260
SNT7261
SNT7262
SNT7270
SNT7278
SNT7280
SNT7294
SNT7350
SNT7560
SNT7560.1
SNT7730
SNT7660
SNT7760
SNT7885
SNT7894
SNT7906
SNT7909
SNT7910
SNT7914
SNT7915
SNT7920
SNT7921
SNT7930
SNT7935
SNT7940
SNT7942
SNT7943
SNT7945
SNT7946
SNT7947
SNT7950
SNT7955
SNT7960
SNT7968
SNT7970
SNT7971.2
SNT7976
SNT7980
SNT7990
SNT7993
SNT8049
SNT8060
SNT8065
SNT8070
SNT8076
SNT8085
SNT8087
SNT8090
SNT8095
SNT8105
SNT8108

HEXAPHENYLDITIN
INDIUM TIN
INDIUM TIN OXIDE COATED GLASS SLIDESMETHACRYLOXYTRI-n-BUTYLTIN(2-METHYLPROPENYL)TRI-n-BUTYLTINMETHYLTRICHLOROTIN, 95%
OCTYLTRICHLOROTIN, tech-95
PHENYLETHYNYLTRI-n-BUTYLTIN, 95%
PHENYLTHIOTRI-n-BUTYLTIN, 95%
PHENYLTRI-n-BUTYLTINPHENYLTRICHLOROTIN, tech-95
PHTHALOCYANATODICHLOROTIN(IV)
PHTHALOCYANATOTIN(II)POTASSIUM STANNATE, trihydrate
PROPYNYLTRI-n-BUTYLTIN, 95%(2-PYRAZINYL)TRI-n-BUTYLTIN
2-PYRIDYLTRI-n-BUTYLTIN, 95%
3-PYRIDYLTRI-n-BUTYLTIN, 95%
SODIUM STANNATE, trihydrate
SODIUM TIN ETHOXIDE, 95%
TETRAACETOXYTIN, 95%
TETRAALLYLTINTETRA-t-BUTOXYTINTETRABUTYLAMMONIUM TRIPHENYLDIFLUOROTINTETRABUTYLDILAURYLDISTANNOXANE, tech-95
TETRA-n-BUTYLTIN, tech-95
TETRA-n-BUTYLTIN, 99%
TETRACYCLOHEXYLTINTETRAETHYLTINTETRAISOPROPOXYTIN-ISOPROPANOL ADDUCTTETRAISOPROPYLTINTETRAKIS(DIETHYLAMINO)TIN, 95%
TETRAKIS(DIMETHYLAMINO)TIN
TETRAMETHYLTINTETRAMETHYLTIN, 99%
TETRA-n-OCTYLTIN, 95%
TETRA-n-PENTYLTINTETRAPHENYLTINTETRA-n-PROPYLTINTETRA-p-TOLYLTINTETRAVINYLTIN
2-THIENYLTRI-n-BUTYLTIN, 95%
TIN, powder
TIN(II) BROMIDETIN(IV) BROMIDETIN(II) CHLORIDE, anhydrous
TIN(II) CHLORIDE, dihydrate
TIN(IV) CHLORIDE, anhydrous
TIN(II) ETHOXIDETIN(II) FLUORIDE
TIN(II) FLUOROBORATE, 47% in water
TIN(II) HEXAFLUORO-2,4-PENTANEDIONATE
TIN(II) IODIDETIN(IV) IODIDE, 95%
TIN(II) METHANESULFONATE, 50% in water
TIN(II) METHOXIDETIN(II) OLEATE, tech-90
TIN(II) OXALATE
TIN(II) OXIDETIN(IV) OXIDETIN(lV) OXIDE, amorphous gel, 50% in methanol
TIN(II) 2,4-PENTANEDIONATE
TIN(II) PYROPHOSPHATE, hydrate
TIN(II) SULFATE
TIN(II) TRIFLUOROMETHANESULFONATE
TRIBENZYLCHLOROTIN
TRI-n-BUTYLACETOXYTIN
TRI-n-BUTYLAZIDOTIN, 95%
TRI-n-BUTYLBENZOYLOXYTIN
TRI-n-BUTYLBROMOTIN, 95%
TRI-n-BUTYLCHLOROTIN
TRI-n-BUTYLCYANOTIN
TRI-n-BUTYLETHOXYTIN
TRI-n-BUTYLFLUOROTIN
TRI-n-BUTYLIODOTIN, tech-95
TRI-n-BUTYLISOCYANATOTIN

10g
25g
5 slides
50g
5g
1.0g
5g
10g
10g
10g
5g
5g
5g
100g
5g
1.0g
5g
2.5g
100g
10g
5g
5g
5g
5g
25g
100g
25g
5g
1.0g
5g
5g
5g
5g
25g
10g
25g
5g
100g
10g
10g
5g
10g
100g
50g
50g
250g
500g
25g
2.5g
100g
250g
5g
25g
10g
1.5kg
10g
100g
100g
100g
100g
100g
2.5g
25g
100g
5g
5g
50g
5g
25g
5g
100g
5g
25g
25g
10g
10g

SIZE 2 PRICE 2
100g ¥61,500

5g ¥25,500
25g ¥23,500
50g ¥62,500
25g ¥25,500
500g ¥15,500

O
O
F

PR
604

¥32,000¥22,000¥25,700
inquire¥49,500¥9,800¥9,300¥11,500¥32,000¥19,000¥9,800¥46,500¥46,500¥7,500¥41,000¥32,000¥22,500¥35,500¥8,500¥16,800¥18,000¥22,500¥20,000¥44,500¥14,300¥7,300¥9,500¥34,500¥10,500¥16,000¥26,000¥34,500¥24,000
inquireinquire¥11,500¥22,500¥14,300¥49,500¥16,500¥18,500¥12,500¥9,000¥25,000¥15,000¥11,000¥16,500¥8,500¥13,500¥11,800¥10,000¥23,000¥24,000¥14,000¥26,000¥34,500¥16,500¥9,000¥10,500¥10,500¥16,500¥13,500¥10,500¥10,500¥21,000¥27,000
inquire¥20,500¥26,000¥14,500
inquire¥13,000¥12,500
inquire¥12,000¥43,000

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

500g ¥20,500

25g ¥58,500
25g ¥76,500
25g ¥66,500

2kg ¥46,500
100g ¥24,500

5g ¥28,500
25g ¥50,500
25g ¥90,500

100g inquire

100g ¥27,300

500g ¥43,500

50g ¥52,500
25g ¥60,500500g ¥22,500250g ¥46,500

500g ¥19,500
10g ¥33,800500g ¥33,500500g ¥22,500500g ¥28,500
500g ¥28,500
10g ¥34,000
500g ¥28,500
25g ¥70,500
250g inquire
25g
1kg
25g
100g
100g
50g

¥44,500
inquire¥37,500¥30,500
inquire¥34,500

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

SIZE 2 PRICE 2

TRI-n-BUTYLMETHOXYTIN
TRI-n-BUTYLMETHYLTIN
2-TRI-n-BUTYLSTANNYLBENZOTHIOPHENE
2-(TRI-n-BUTYLSTANNYL)DITHIANE
2-TRIBUTYLSTANNYLFURAN
TRI-n-BUTYLSTANNYLTRIMETHYLSILANE
TRI-n-BUTYLTIN HYDRIDE
TRI-n-BUTYL(TRIFLUOROMETHANESULFONATE)TIN, 95%
TRICYCLOHEXYLCHLOROTIN, 95%
TRICYCLOHEXYLHYDROXYTIN, 95%
TRICYCLOHEXYLTIN HYDRIDE
TRIETHYLBROMOTIN, 95%(TRIISOPROPOXYTITANOXY)TRI-n-BUTYLTIN, tech-95
TRIMETHYLBROMOTIN
TRIMETHYLCHLOROTIN
TRIMETHYLCHLOROTIN, 1M in THF
TRIMETHYLFLUOROTIN
TRIMETHYLIODOTIN
TRIMETHYLSILYLETHYNYLTRI-n-BUTYLTIN(TRIMETHYLSILYLMETHYL)TRI-n-BUTYLTIN
TRINEOPHYLTIN HYDRIDE
TRI-n-OCTYLCHLOROTIN, tech-95
TRI-n-PENTYLCHLOROTIN, tech-95
TRIPHENYLACETOXYTIN
TRIPHENYLCHLOROTIN, tech-95
TRIPHENYLFLUOROTIN, 95%
TRIPHENYLHYDROXYTIN, tech-90
TRIPHENYLIODOTIN, 95%
TRIPHENYLTIN HYDRIDE, 95%
TRI-n-PROPYLCHLOROTIN
TRIS(2-PERFLUOROHEXYLETHYL)TIN HYDRIDE
TRI-p-TOLYLCHLOROTIN, 95%
TRI-p-TOLYLHYDROXYTIN, tech-90
VINYLTRI-n-BUTYLTIN
ZINC STANNATE

25g
10g
1.0g
5g
10g
2.5g
10g
10g
5g
10g
5g
1.0g
10g
1.0g
10g
100g
5g
1.0g
10g
10g
10g
5g
1.0g
25g
100g
5g
100g
5g
5g
5g
5g
10g
10g
5g
25g

¥11,500¥12,500¥32,000¥74,500¥16,500¥13,500¥9,300¥16,800¥16,500¥26,500¥59,500¥10,500¥12,000¥14,300¥15,800¥24,000¥56,000¥25,500¥29,400¥27,100¥22,500¥34,500¥24,500
inquireinquireinquireinquire¥16,500¥25,500¥25,500¥74,500¥18,500¥30,500¥18,500¥10,300

100g ¥27,300
50g ¥36,500

O-ALLYLOXY(POLYETHYLENEOXY)TRIISOPROPOXYTITANATE, 95%
ALUMINUM TITANIUM DOUBLE METAL ALKOXIDE, (0.85 M)
AMMONIUM HEXAFLUOROTITANATEBARIUM TITANIUM DOUBLE METAL ALKOXIDE (0.5 M)
BIS(t-BUTYLCYCLOPENTADIENYL)TITANIUM DICHLORIDEBIS(CYCLOPENTADIENYL)TITANIUM(III) CHLORIDEBIS(CYCLOPENTADIENYL)TITANIUM DIFLUORIDEBIS(2,6-DIFLUORO-3-(1-HYDROPYRROL-1-YL)PHENYL)TITANOCENE
BIS(PENTAMETHYLCYCLOPENTADIENYL)TITANIUM DICHLORIDECYCLOPENTADIENYLTITANIUM TRICHLORIDEDICYCLOPENTADIENYLDICARBONYL TITANIUM(II)DIETHOXYSILOXANE - ETHYLTITANATE COPOLYMERHEXAFLUOROTITANIC ACID, 60% in water
LEAD TITANATE
LEAD TITANIUM OXOACETOXYETHOXIDEMAGNESIUM TITANIUM DOUBLE METAL ALKOXIDE (1.0M)
METHYLTITANIUM TRIISOPROPOXIDE, 1M in tetrahydrofuran
PENTAMETHYLCYCLOPENTADIENYLTITANIUM TRICHLORIDEPENTAMETHYLCYCLOPENTADIENYLTITANIUM TRIMETHOXIDEPHENYLTITANIUM TRIISOPROPOXIDE, 1M in tetrahydrofuran
PHTHALOCYANINE TITANIUM OXIDEPOLY(DIBUTYLTITANATE)
POLY(OCTYLENEGLYCOLTITANATE)TETRAKIS(TRIMETHYLSILOXY)TITANIUM
TITANIUM ALLYLACETOACETATETRAIISOPROPOXIDETITANIUM BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)DICHLORIDETITANIUM BIS(TRIETHANOLAMINE)DIISOPROPOXIDE, 80% in isopropanol
TITANIUM BORIDE, powder
TITANIUM n-BUTOXIDETITANIUM s-BUTOXIDETITANIUM t-BUTOXIDETITANIUM(III) CHLORIDE, tetrahydrofuran complex
TITANIUM CHLORIDE TRI-n-BUTOXIDETITANIUM CHLORIDE TRIISOPROPOXIDE, 95%
TITANIUM CHLORIDE TRIISOPROPOXIDE, 2M in hexane
TITANIUM CHLORIDE TRIISOPROPOXIDE, 1.25M in tetrahydrofuran
TITANIUM CHLORIDE TRIISOPROPOXIDE, 2M in heptane
TITANIUM DI-n-BUTOXIDE BIS(2-ETHYLHEXANOATE)TITANIUM DI-s-BUTOXIDE BIS(3,5-HEPTANEDIONATE)
TITANIUM DI-n-BUTOXIDE BIS(2,4-PENTANEDIONATE)

25g
100g
25g
25g
2.5g
5g
2.5g
10g
5g
5g
5g
25g
1.5kg
100g
50g
25g
25g
5g
5g
25g
1.0g
100g
25g
25g
25g
5g
25g
50g
100g
100g
25g
25g
25g
100g
25g
25g
25g
25g
10g
100g

¥8,500¥10,800¥16,800¥9,500¥38,500¥61,000¥39,500¥32,000¥64,500¥24,500¥84,500¥14,100¥16,000¥10,800¥30,500¥9,800¥49,500¥53,500¥67,500¥47,000¥25,500
inquireinquire¥14,600¥9,800¥24,500¥10,500¥13,300¥7,000¥18,000¥37,500¥69,500¥12,500¥10,000¥8,500¥9,300¥9,300¥13,500¥35,500¥12,000

100g ¥16,800
500g ¥28,500

10g
50g
50g
25g

¥33,800¥23,500¥53,500¥52,500

5g ¥28,500
50g ¥34,500
50g ¥49,500

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g
500g
25g
500g

inquireinquireinquireinquire50g ¥60,500

25g ¥60,500
100g ¥23,000

100g ¥22,500
10g ¥115,000

25g ¥84,500

100g ¥37,900

100g ¥21,500

5g
500g
100g
100g
100g

¥88,500
inquireinquire¥39,500¥20,500

100g ¥24,000
2kg ¥25,500

500g
750g
750g
750g

¥26,500¥21,500¥25,500¥25,500

METAL ORGANICS

PR

O
O
F

CODE
SNT8110
SNT8120
SNT8133
SNT8122
SNT8125
SNT8585
SNT8130
SNT8140
SNT8159
SNT8161
SNT8163
SNT8210
SNT8380
SNT8445
SNT8520
SNT8520.2
SNT8530
SNT8565
SIT8588.8
SIT8594.5
SNT8623.5
SNT8624
SNT8583
SNT8595
SNT8650
SNT8670
SNT8680
SNT8683
SNT8700
SNT8708
SNT8715.7
SNT8727
SNT8728
SNV9100
SNZ9760
TITANIUM
AKT841DALTI50
INTI004
DBATI50OMTI008
OMTI010OMTI012OMTI014OMTI016
OMTI018
OMTI020PSITI-019
INTI021
PBL6465
PBL6459DMGTI50OMTI046
OMTI050OMTI052
OMTI054
OMTI057
PTI-023
PTI-008
SIT7305.0
AKT843
AKT844
AKT845
INTI027
AKT850
AKT850.1
AKT850.2
INTI079
AKT850.5
AKT851
AKT851.1
AKT851.2
AKT851.3
AKT852
AKT852.5
AKT853500g ¥34,500

605

PRODUCTSIZE 1 PRICE 1

SIZE 2 PRICE 2

TITANIUM DICHLORIDE DIETHOXIDE, 95%
TITANIUM DIETHYLDITHIOCARBAMATE
TITANIUM DIISOPROPOXIDE BIS(ETHYLACETOACETATE), 95%
TITANIUM DIISOPROPOXIDE BIS(2,4-PENTANEDIONATE), 75% in isopropanol
TITANIUM DIISOPROPOXIDE BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)
TITANIUM 3,6-DIOXAHEPTANOATETITANIUM ETHOXIDE, tech-95
TITANIUM ETHOXIDE, 99%
TITANIUM 2-ETHYLHEXOXIDETITANIUM IODIDE TRIISOPROPOXIDE, 1.25M in tetrahydrofuran
TITANIUM ISOBUTOXIDETITANIUM ISOPROPOXIDETITANIUM LACTATE, AMMONIUM SALT, 50% in water
TITANIUM METHACRYLATE TRIISOPROPOXIDETITANIUM METHACRYLOXYETHYLACETOACETATE TRIISOPROPOXIDE, 88% in isopropanol
TITANIUM METHOXIDE, 95%
TITANIUM METHOXYPROPOXIDETITANIUM METHYLPHENOXIDE, tech-90
TITANIUM n-NONYLOXIDE, 95%
TITANIUM OXIDE BIS(2,4-PENTANEDIONATE)
TITANIUM OXIDE BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)
TITANIUM n-PROPOXIDETITANIUM SILICIDE, 95%, powder
TITANIUM TETRABROMIDE (99.9% on metals basis)
TITANIUM TETRACHLORIDE, 99%
TITANIUM TETRACHLORIDE, 1M in toluene (19.7 wgt%)
TITANIUM TETRACHLORIDE - BIS(TETRAHYDROFURAN) COMPLEXTITANIUM TETRAHYDROFURFURYLOXIDE, 50% in isopropanol, tetrahydrofuran
TITANIUM TETRAIODIDE (99.9% on metals basis)
TITANIUM TETRAIODIDE (99+%)
TITANIUM TETRAKIS(BIS 2,2-(ALLYLOXYMETHYL)BUTOXIDE)TITANIUM TETRAKIS(DIETHYLAMIDE), 99+%
TITANIUM TETRAKIS(DIMETHYLAMIDE), 99+%
TITANIUM TETRAKIS(ETHYLMETHYLAMIDE), 99+%
TITANIUM TRIACRYLATE METHOXYETHOXYETHOXIDE, 90% in methoxydiethyleneglycol
TITANIUM TRIISOSTEAROYLISOPROPOXIDE, tech-90
TITANIUM TRIMETHACRYLATE METHOXYETHOXYETHOXIDE, 70% in methoxydiethyleneglycol/isopropanol
TITANIUM TRIS(DIOCTYLPYROPHOSPHATO)ISOPROPOXIDE, tech-90
TITANIUM TRIS(DODECYLBENZENESULFONATE)ISOPROPOXIDE, tech-90
TITANIUM(III) TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)
TITANOCENE DICHLORIDE(TRIISOPROPOXYTITANOXY)TRI-n-BUTYLTIN, tech-95

25g
10g
100g
100g
5g
25g
100g
25g
100g
25g
100g
100g
25g
25g
25g
25g
25g
25g
25g
25g
2.5g
25g
25g
25g
25g
400g
25g
25g
100g
50g
25g
5g
5g
5g
100g
100g
100g
25g
25g
1.0g
100g
10g

¥13,000¥22,500¥8,500¥7,500¥25,000¥25,500¥9,300¥23,500¥7,500¥15,000¥9,500¥7,000¥9,300¥9,800¥11,500¥9,000¥16,500¥10,000¥16,500¥19,500¥21,500¥8,500¥8,500¥16,500
inquire¥20,000¥25,500¥18,000¥26,000¥32,500¥11,800¥19,500¥19,500¥24,500¥11,500¥9,300¥9,800¥11,500¥8,000¥22,500¥28,000¥12,000

100g ¥32,000[1,2-BIS(DIPHENYLPHOSPHINO)ETHANE]TUNGSTEN TETRACARBONYLTUNGSTEN(V) ETHOXIDE, 95%
TUNGSTEN HEXACARBONYLTUNGSTEN(VI) PHENOXIDETUNGSTEN SILICIDETUNGSTOSILICIC ACID hydrate

5g
5g
50g
5g
25g
50g

¥35,500¥16,500¥53,300¥16,000¥24,100¥32,600

VANADIUM(IV) OXIDE BIS(BENZOYLACETONATE)
VANADIUM(IV) OXIDE BIS(HEXAFLUORO-2,4-PENTANEDIONATE), monohydrate
VANADIUM(IV) OXIDE BIS(2,4-PENTANEDIONATE)
VANADIUM OXIDE TRIS(METHOXYETHOXIDE)VANADIUM(III) 2,4-PENTANEDIONATEVANADIUM TRIISOBUTOXIDE OXIDE, 95%
VANADIUM TRIISOPROPOXIDE OXIDEVANADIUM TRI-n-PROPOXIDE OXIDE

5g
10g
50g
25g
50g
25g
25g
10g

¥32,500¥41,000¥13,500¥32,500¥16,500¥19,500¥24,500¥12,500

YTTERBIUM ACETATE, tetrahydrate
YTTERBIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATEYTTERBIUM 3,5-HEPTANEDIONATEYTTERBIUM HEXAFLUORO-2,4-PENTANEDIONATEYTTERBIUM 2,4-PENTANEDIONATEYTTERBIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEYTTERBIUM TRIFLUOROMETHANESULFONATE, hydrate

25g
1.0g
5g
1.0g
1.0g
1.0g
25g

¥18,300¥16,500¥27,000¥19,500¥11,800¥12,800¥28,500

ALUMINUM YTTRIUM DOUBLE METAL ALKOXIDEBARIUM YTTRIUM DOUBLE METAL ALKOXIDE (0.3 M)
YTTRIUM ACETATE, tetrahydrate
YTTRIUM 6,6,7,7,8,8,8-HEPTAFLUORO-2,2-DIMETHYL-3,5-OCTANEDIONATEYTTRIUM HEXAFLUOROISOPROPOXIDE DIAMMONIA complex, 10% in diethylether
YTTRIUM HEXAFLUORO-2,4-PENTANEDIONATEYTTRIUM ISOPROPOXIDE, 95%
YTTRIUM METHACRYLATE

25g
25g
25g
1.0g
10g
5g
2.5g
10g

¥13,000¥15,500¥9,500¥22,500¥41,500¥21,500¥15,000¥28,500

PR
606

500g ¥20,500
2kg ¥25,500
500g ¥23,500
2kg ¥25,500
500g
2kg
100g
100g
100g
100g
100g
250g

¥24,500¥19,500¥20,000¥20,500¥27,300¥19,300¥41,500¥43,000

O
O
F

CODE
AKT854
AKT854.5
AKT865
AKT855
AKT857CXTI038
AKT860
AKT861
AKT867
AKT868.2
AKT870
AKT872
AKT875
AKT877
AKT878
AKT880
AKT880.5
AKT881
AKT882
AKT883
AKT884
AKT885
SIT8005.0
INTI060
INTI065
INTI065.5
INTI068
AKT886
INTI070
INTI071
AKT887
OMTI075
OMTI080
OMTI083
AKT887.2
AKT887.5
AKT888
AKT889.1
AKT889.3
AKT889.4
OMTI085
SNT8380
TUNGSTENINTU022
AKT890
INTU030
AKT893
SIT8787.0
SIT8780.0
VANDIUM
AKV897
AKV898
AKV900
AKV920
AKV905
AKV908
AKV910
AKV915YTTERBIUMCXYB010
AKY921
AKY921.2
AKY921.5
AKY920
AKY922CXYB083
YTTRIUM
DALY080
DBAY060
CXYO010
AKY922.5
AKY923.1
AKY924
AKY925CXYO050

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g ¥53,300

100g ¥17,500
100g ¥19,900

2.5kg inquire
2kg ¥47,000

1kg ¥165,000

100g
25g
25g
25g

¥28,000¥64,500¥64,500¥84,500

500g
500g
100g
100g

¥23,500¥24,000¥27,300¥16,000

500g ¥98,500
50g ¥34,500
25g ¥52,500

25g ¥50,500

250g ¥40,500
250g
100g
100g
50g

¥52,500¥53,300¥69,500¥36,500

5g ¥64,500
5g ¥33,500
5g ¥37,500
100g ¥32,000
100g ¥40,300

25g ¥72,500
10g ¥38,500

Enabling Your Technology
PRODUCT

SIZE 1 PRICE 1

YTTRIUM METHOXYETHOXIDE, 15-18% in methoxyethanol
YTTRIUM 2,4-PENTANEDIONATE, hydrate
YTTRIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEYTTRIUM TRIFLUOROACETATE, hydrate
YTTRIUM TRIFLUOROMETHANESULFONATE, hydrate
YTTRIUM(III) TRIS[BIS(TRIMETHYLSILYLAMIDE)]

25g
10g
1.0g
10g
5g
5g

¥8,500¥13,500¥13,300¥17,600¥12,500¥67,100

DIETHYLZINC, 95%
DIETHYLZINC BIS(METHOXYETHYL) ETHER COMPLEX, 50% in diglyme
DIETHYLZINC, 1M in heptane
DIPHENYLZINC, 95%
ZINC ACETATE, dihydrate
ZINC ACRYLATEZINC BIS(HEXAMETHYLDISILAZIDE)ZINC DI-n-BUTYLDITHIOCARBAMATEZINC O,O-DI-n-BUTYLPHOSPHORODITHIOATEZINC DIETHYLDITHIOCARBAMATEZINC N,N-DIMETHYLAMINOETHOXIDEZINC DIMETHYLDITHIOCARBAMATEZINC 2-ETHYLHEXANOATEZINC FORMATE, dihydrate
ZINC HEXAFLUORO-2,4-PENTANEDIONATE, hydrate
ZINC 8-HYDROXYQUINOLINATE
ZINC METHACRYLATEZINC METHOXYETHOXIDE, 95%
ZINC NEODECANOATE, tech-95
ZINC 2,4-PENTANEDIONATE, hydrate
ZINC STANNATE
ZINC 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
ZINC UNDECYLENATE

500g
500g
500g
5g
100g
100g
1.0g
25g
25g
25g
2.5g
25g
100g
25g
1.0g
5g
100g
2.5g
100g
100g
25g
1.0g
100g

inquireinquireinquire¥77,000¥7,000¥9,300¥38,500¥9,500¥14,300¥7,000¥20,500¥7,000¥9,300¥14,500¥15,800¥14,500¥14,300¥16,800¥9,300¥12,000¥10,300¥11,800¥9,000

ALUMINUM ZIRCONIUM DOUBLE METAL ALKOXIDE (0.67 M)
BARIUM ZIRCONIUM DOUBLE METAL ALKOXIDE (0.33 M)
BIS(n-BUTYLCYCLOPENTADIENYL)ZIRCONIUM DICHLORIDEBIS(METHYLCYCLOPENTADIENYL)ZIRCONIUM DICHLORIDEBIS(PENTAMETHYLCYCLOPENTADIENYL)ZIRCONIUM DICHLORIDEDIMETHYL[BIS(CYCLOPENTADIENYL)SILYL] ZIRCONIUM DICHLORIDE
LEAD ZIRCONATE TITANATE WAFERMAGNESIUM ZIRCONIUM DOUBLE METAL ALKOXIDE 1.0M)
PRASEODYMIUM ZIRCONIUM SILICATETETRABENZYLZIRCONIUM, 10-12% in toluene
TETRAKIS(TRIMETHYLSILOXY)ZIRCONIUMZIRCONIUM (BIS-2-2-(ALLYLOXYMETHYL)BUTOXIDE)TRIS(DIOCTYLPHOSPHATE), 95%
ZIRCONIUM BIS(DIETHYLCITRATO)DI-n-PROPOXIDE, 75% in n-propanol/ethanol
ZIRCONIUM BIS(HEXAMETHYLDISILAZIDE)DICHLORIDE, tech-95
ZIRCONIUM n-BUTOXIDE, 80% in n-butanol
ZIRCONIUM t-BUTOXIDEZIRCONIUM DI-n-BUTOXIDE BIS(2,4-PENTANEDIONATE), 25% in n-butanol/toluene
ZIRCONIUM DICHLORIDE BIS(2,4-PENTANEDIONATE)
ZIRCONIUM DIISOPROPOXIDE BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE), tech-90
ZIRCONIUM DIMETHACRYLATE DIBUTOXIDE, 25% in toluene/n-butanol
ZIRCONIUM ETHOXIDEZIRCONIUM 2-ETHYLHEXANOATE, 90%
ZIRCONIUM 2-ETHYLHEXOXIDE, 70% in 2-ethylhexanol
ZIRCONIUM 3,5-HEPTANEDIONATEZIRCONIUM HEXAFLUORO-2,4-PENTANEDIONATEZIRCONIUM ISOPROPOXIDE, 70-75% in heptane
ZIRCONIUM METHACRYLATE, 95%
ZIRCONIUM 2-METHOXYMETHYL-2-PROPOXIDEZIRCONIUM 2-METHYL-2-BUTOXIDEZIRCONIUM 2,4-PENTANEDIONATEZIRCONIUM n-PROPOXIDE, 70% in n-propanol
ZIRCONIUM SILICATEZIRCONIUM SILICIDE, powder, 99%
ZIRCONIUM TETRACHLORIDE, 99+%
ZIRCONIUM TETRAIODIDEZIRCONIUM TETRAKIS(DIMETHYLAMIDE)
ZIRCONIUM TETRAKIS(ETHYLMETHYLAMIDE)
ZIRCONIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATEZIRCONIUM 1,1,1-TRIFLUORO-2,4-PENTANEDIONATEZIRCONIUM TRIMETHYLSILYLETHOXIDEZIRCONIUM TRIS(2,2,5,5-TETRAMETHYL-2,5-DISILAPYRROLIDINE)CHLORIDE, tech-95
ZIRCONOCENE DICHLORIDEZIRCONYL DIMETHACRYLATE, hydrate
ZIRCONYL PROPIONATE, 75%

100g
25g
5g
5g
2.5g
1.0g
Each
25g
25g
25g
10g
25g
25g
10g
100g
5g
100g
5g
5g
25g
10g
100g
25g
10g
5g
5g
25g
5g
10g
50g
100g
500g
25g
100g
5g
5g
5g
5g
2.5g
10g
10g
25g
25g
25g

¥11,800¥10,000¥57,000¥74,500¥39,500¥64,400¥11,900¥11,000¥14,600¥102,000¥39,500¥10,500¥8,000¥31,600¥8,000¥19,500¥13,500¥16,500¥23,000¥13,500¥10,500¥10,500¥12,000¥15,800¥19,500¥11,500¥19,500¥44,500¥13,300¥9,000¥7,000¥10,900¥13,000¥12,000¥32,000¥27,000¥34,500¥23,500¥11,800¥59,500¥77,700¥20,500¥13,000¥11,800

SIZE 2 PRICE 2
100g ¥17,500
50g ¥40,500
5g ¥39,500

2kg ¥129,000
500g ¥23,500
100g ¥20,800

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com

100g
10g
100g
500g

¥12,500¥52,500¥12,500¥24,000

25g ¥44,500
10g ¥44,500

500g ¥34,500
100g ¥23,0005g ¥33,500500g ¥33,500
100g ¥22,500

100g ¥25,500

100g ¥24,000
100g ¥16,000
2kg ¥41,500
25g ¥64,500
25g ¥52,500
50g ¥28,500
100g
50g
25g
25g

¥29,000¥49,500¥64,500¥32,500

50g
500g
2kg
2.5kg

¥39,500¥36,000¥32,000¥35,500

500g ¥34,500
25g ¥94,500
25g ¥125,000
10g ¥20,500

METAL ORGANICS

PR

O
O
F

CODE
AKY927
AKY930
AKY932
CXYO080
CXYO083
SIY9680.0
ZINC
OMZN017OMZN019OMZN018OMZN040CXZN010CXZN015
SIZ9700.0
AKZ932.5
AKZ932.7
AKZ932.8
AKZ933
AKZ933.5
CXZN040CXZN045
AKZ933.7
AKZ933.8
CXZN050
AKZ934CXZN062
AKZ935
SNZ9760
AKZ938CXZN085ZIRCONIUMDALZR50
DBAZR50OMZR007
OMZR014OMZR016
SID4045.0
W-PZT-25-02
DMGZR50
SIP6902.2
OMZR078
SIT7306.0
AKZ941
AKZ938.6
SIZ9810.0
AKZ945
AKZ946
AKZ947
AKZ947.5
AKZ948
AKZ949AKZ950CXZR043
AKZ951
AKZ952
AKZ953
AKZ955CXZR050
AKZ968
AKZ965
AKZ970
AKZ975
SIZ9850.0
SIZ9860.0
INZR065
INZR070
OMZR080
OMZR083
AKZ980
AKZ985
AKZ990
SIZ9920.0
OMZR085
CXZR051CXZR075

607

O
O
F

PR
608

www.AZmax.co.jp TEL: 03-5543-1630

Gelest, Inc.

(215) 547-1015

www.gelest.com