J. Inst. Electrostat. Jpn.

論静電気学会誌, 29, 1 (2005) 38-43

文ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩ․ᕈߣ NOX ಣℂ߳ߩᔕ↪
᧻੗⦟ᒾ㧖, Ỉ↰ᷕ㧖, દ⮮⾆┨㧖, 㜞ፉ๺ೣ㧖‫ޔ‬᩵ㅴม㧖‫ޔ‬᳓㊁ᓆ㧖,1㧔2004 ᐕ 8 ᦬ 23 ᣣฃઃ㧧2004 ᐕ 11 ᦬ 30 ᣣฃℂ㧕Application of micro-discharge in porous ceramics for NOX treatment
Yoshihiko MATSUI*, Jun SAWADA*, Takahiro ITO*, Kazunori TAKASHIMA*,Shinji KATSURA* and Akira MIZUNO*,1(Received August 23, 2004, Accepted November 30, 2004)

Generation of transient discharge due to back-corona in dielectric porous materials was investigated for NOX
removal. We expected that the application of the discharge generates many narrow micro-discharges inside and thesurface of various ceramics materials. Four types of ceramics that have various perforation level (size of pores) havebeen tested using negative DC high voltage. The stable micro-discharge was formed with DC and AC high voltage
and using ceramics average pores of 90Pm and 15Pm. As the results of NOX gas cleaning, oxidation ability without
C2H4 addition was higher than that with additive at 22͠.
1.

਄⸥ߩࠃ߁ߦࡊ࡜࠭ࡑߣ⸅ᇦߩ૬↪ലᨐߪ⹺߼ࠄࠇߡ޿ߪߓ߼ߦㄭᐕ‫⸅ޔ‬ᇦߣ㕖ᾲᐔⴧࡊ࡜࠭ࡑߣߩ૬↪߇⋓ࠎߦ⎇ⓥߐࠇ
(1-5)ࠆ߇‫ߩࠄࠇߎޔ‬෻ᔕࡔࠞ࠾࠭ࡓߪ޿߹ߛ᣿ࠄ߆ߦߐࠇߡ޿ߥ‫ޔ‬὇ൻ᳓⚛߆ࠄߩ޿. ࠟࠬ⁁‛⾰ࠍᄌ឵ߔࠆ⸅ᇦ෻ᔕߢߪ‫⚦ߦ⊛⥸৻ޔ‬ሹౝߦ᳓⚛↢ᚑߩಽ㊁ߦߡ᦭↪ᕈ߇␜ߐࠇߡ޿ࠆ. ᄙߊߩ⎇ⓥߢߪ

ࠟࠬ߇ๆ⌕ߐࠇ‫⸅ޔ‬ᇦ‛⾰ߣࠟࠬ߇⸅ࠇࠆߎߣߢ෻ᔕ߇⿠ߎࡍ࡟࠶࠻⸅ᇦߣࡊ࡜࠭ࡑࠍ૬↪ߒߚࡄ࠶ࠢ࠼ࡌ࠶࠼ᣇᑼ‫߽ޔ‬ࠅ⣕⌕ߐࠇࠆ. ࡊ࡜࠭ࡑ߇ߎࠇࠄߩ⸅ᇦ෻ᔕࡊࡠ࠮ࠬߦ⋥ធߒߊߪ⸅ᇦᐔ᧼਄ߦᴪ㕙᡼㔚ࠍᒻᚑߔࠆᣇᑼߥߤ߇ਥߦ⹜⊛ߦ૞↪㧔⸅ᇦ‛⾰ߦኻߔࠆዪᚲടᾲ߿㔚⇇ߩᓇ㗀㧕ߔࠆߩ㛎ߐࠇߡ޿ࠆ. ߒ߆ߒ‫ޔ‬ታ↪ࡊࡠ࠮ࠬߢ૶↪ߐࠇߡ޿ࠆࠟࠬ߆‫ޔ‬ੑᰴ⊛ߥ࿃ሶ㧔↢ᚑߒߚ࡜ࠫࠞ࡞ OH‫ޔ‬HO2‫ޔ‬O‫ޔ‬N㧕߇ᵺൻ߿ᡷ⾰⸅ᇦߩ߶ߣࠎߤߪ‫ޔ‬Ყ⴫㕙Ⓧ߇ᄢ߈ߊ‫⾰‛ޔ‬ᄌ឵ᓇ㗀ߒߡ޿ࠆߩ߆ࠍᬌ⸛ߔࠆߎߣߪᄢᄌ⥝๧ᷓߊ‫⸅ޔ‬ᇦߣࡊല₸ߩ㜞޿ࡂ࠾ࠞࡓ᭴ㅧߢ޽ࠆ. ࠃߞߡࡂ࠾ࠞࡓ⸅ᇦߣࡊ࡜࡜࠭ࡑߩ૬↪ࡊࡠ࠮ࠬߩ੹ᓟߩ⊒ዷࠍᜂ߁਄ߢᦨ㊀ⷐ⺖㗴࠭ࡑߩ૬↪߇᦭ലߢ޽ࠆߣ⠨߃ࠄࠇࠆ߇‫ߩߎޔ‬ലᨐ⊛ߥ૬↪

ߢ޽ࠆߣ⠨߃ࠆ. ߎࠇࠄߩⷰὐ߆ࠄ߽‫⸅ޔ‬ᇦ‛⾰ㄭற㧔⚦ሹᣇᴺ߇⷗಴ߖߡ޿ߥ޿ߩ߇⃻⁁ߢ޽ࠅ‫޿⦟ࠅࠃߩࠄࠇߎޔ‬૬ౝ㧕ߢࡊ࡜࠭ࡑࠍᒻᚑߒߚ႐ว‫⸅ޔ‬ᇦ෻ᔕߦኻߔࠆࡊ࡜࠭ࡑ

↪ᣇᴺࠍᮨ⚝ߔࠆߎߣߪ᦭↪ߢ޽ࠆߣ⠨߃ࠆ.

ߩᓇ㗀߇ࠃࠅ᣿⏕ߦߥࠆߣᕁࠊࠇࠆ.

ߡ߅ࠅ‫ޔ‬NOX‫ޔ‬PM‫ޔ‬VOC 㘃ߩಽ⸃ಣℂ৻ᣇ‫࠼࠶ࡌ࠼ࠢ࠶ࡄޔ‬ᣇᑼߩࡊ࡜࠭ࡑ෻ᔕེߩ႐ว‫ޔ‬㔚⇇ᧄ⎇ⓥߢߪ‫ޔ‬ᄙሹᕈ࠮࡜ࡒ࠶ࠢࠬ⴫㕙෸߮ౝㇱߩᓸዊⓨ㑆㓸ਛߦࠃࠆᒝ޿ࡊ࡜࠭ࡑ߇ᒻᚑߐࠇࠆߩߪࡍ࡟࠶࠻ߣࡍ࡟ߦ‫ޔ‬᡼㔚ࠍ⿠ߎߔᚻᴺߣߒߡㅒ㔚㔌⃻⽎ߦᵈ⋡ߒߚ. ㅒ㔚㔌࠶࠻ߩធὐ߇ਥߢ޽ࠅ‫ޔ‬ᓥ᧪⸅ᇦ෻ᔕ߇ㅴዷߔࠆߣߐࠇࠆ⚦ߦ⿠࿃ߔࠆࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩ⊒↢᧦ઙࠍᮨ⚝ߔࠆሹㄭறߦ߅ߌࠆࡊ࡜࠭ࡑᒻᚑߪዋߥ޿ߣ⠨߃ࠄࠇࠆ. ߎߩߎߚ߼ߦ‫⚦ޔ‬ሹᓘߩ⇣ߥࠆ 4 ⒳㘃ߩᄙሹᕈ࠮࡜ࡒ࠶ࠢࠬ෸߮⋥ߣ߆ࠄࡊ࡜࠭ࡑࠍ࠮࡜ࡒ࠶ࠢࠬ⴫㕙‫ޔ‬ౝㇱⓨ㓗߿⚦ሹౝߩᄙᵹ㜞㔚࿶ࠍ↪޿ߡ⹜㛎ࠍⴕߞߚ. ╩⠪ࠄߪ᧚⾰ߩ⇣ߥࠆᢙ⒳ߊߩ႐ᚲߢᒻᚑߔࠆߎߣ߇಴᧪ࠇ߫‫⸅ޔ‬ᇦߣ᡼㔚ߩ૬↪ലᨐ㘃࠮࡜ࡒ࠶ࠢࠬߦߡ⋥ᵹߦࠃࠆࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ⊒߇ᄢ߈ߊ⃻ࠇࠆߎߣ߇ᗐ௝ߢ߈ࠆ. ߹ߚ‫ࠬࠢ࠶ࡒ࡜࠮ޔ‬ౝㇱ⃻ࠍ⏕߆߼ߡ޿ࠆ(6). ᧄ⎇ⓥߢߪ⽶ᭂᕈ⋥ᵹ㜞㔚࿶‫ޔ‬໡↪๟ߢߩ᡼㔚߇ታ⃻ߢ߈ࠇ߫‫⸅ࡓࠞ࠾ࡂޔ‬ᇦࠍ↪޿ߚലᨐ⊛ߥ᡼ᵄᢙ 60Hz ߩ੤ᵹ㜞㔚࿶ࠍ↪޿ߡࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩ㔚ᣇᴺࠍឭ᩺ߔࠆߎߣ߇น⢻ߣߥࠆ.

⊒↢ࠍ⏕⹺ߒߚ‫⥄ޔߡ޿↪ࠍࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑߚ߹ޕ‬ࠠ࡯ࡢ࡯࠼㧦ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ, ࡊ࡜࠭ࡑ, ࠮࡜ࡒ࠶ࠢࠬో㕙᡼㔚, ㅒ㔚㔌, NOX,* ⼾ᯅᛛⴚ⑼ቇᄢቇ ࠛࠦࡠࠫ࡯Ꮏቇ♽ (441-8580 ⼾ᯅᏒᄤષ↸㔕㓴ࡩਐ 1-1)
Department of Ecological Engineering, Toyohashi University ofTechnology, Tempaku-cho, Toyohashi 441-8580, Japan.
1
mizuno@eco.tut.ac.jpേゞឃࠟࠬਛߩ᦭ኂᚑಽߢ޽ࠆ NOX ಣℂ⹜㛎ࠍᬌ⸛ߒߚ.
2.

ታ㛎᭎ⷐ෸߮ⵝ⟎2.1ㅒ㔚㔌⃻⽎㔚᳇㓸Ⴒᯏߦ߅޿ߡ‫ߌ߆⷗ߩ࠻ࠬ࠳ޔ‬㔚᳇ᛶ᛫₸߇⚂ 51010ǡcm એ਄ߩ㜞ᛶ᛫࠳ࠬ࠻㓸Ⴒᤨߢߪ‫࠻ࠬ࠳ޔ‬ጀߩ⴫㕙ߦ

マイクロディスチャージの特性と NOX 処理への応用（松井良彦ら）⩄㔚߇⿠߈⛘✼⎕უߦ⿠࿃ߔࠆㅒ㔚㔌㧔Back Corona㧕ߣ޿߁

39ࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩ᜼േࠍᬌ⸛ߒߚ. ᱜᭂᕈ෸߮⽶ᭂᕈ⋥ᵹ

(7)⇣Ᏹ⃻⽎߇⿠ߎࠆ . ㅢᏱ‫ߩߎޔ‬ㅒ㔚㔌⃻⽎ߪ㔚᳇㓸Ⴒᯏߩ㜞㔚࿶‫ޔ‬໡↪๟ᵄᢙ 60Hz ߩ੤ᵹ㜞㔚࿶ࠍߘࠇߙࠇශടߒ⹜

㓸Ⴒᕈ⢻ࠍ⪺ߒߊૐਅߐߖࠆ⃻⽎ߣߒߡ⍮ࠄࠇߡ޿ࠆ. ᧄ⎇㛎ࠍⴕߞߚ.

ⓥߢߪ‫ߩߎޔ‬ㅒ㔚㔌ࠍ࠮࡜ࡒ࠶ࠢ⴫㕙෸߮ౝㇱߦ߅޿ߡᗧ࿑

DC H.V.

⊛ߦᒻᚑߔࠆߎߣߢ⸅ᇦߣ᡼㔚ߩ⚵ߺวࠊߖߦ߅ߌࠆᣂߚMesh electrodeߥ᡼㔚ᚻᴺࠍᬌ⸛ߒߚ.
Fig.1 ߦᧄታ㛎ߩ⁓޿ߢ޽ࠆㅒ㔚㔌ࠍ↪޿ߚࡑࠗࠢࡠ࠺ࠖ

Ceramics

20mmࠬ࠴ࡖ࡯ࠫߩ᭎ᔨ࿑ࠍ␜ߔ. (1)㊎㔚ᭂ߽ߒߊߪࡔ࠶ࠪࡘ㔚ᭂߦ⋥ᵹ㜞㔚࿶ࠍශടߒ‫⴫ࠬࠢ࠶ࡒ࡜࠮ޔ‬㕙ߦ᡼㔚ࠍ⿠ߎߔ.

3mm

ߎࠇߦࠃߞߡ(2)࠮࡜ࡒ࠶ࠢࠬ⴫㕙ߦ㔚⩄߇࠴ࡖ࡯ࠫࠕ࠶ࡊ
ߐࠇࠆ. ࠮࡜ࡒ࠶ࠢࠬ⴫㕙߇⩄㔚ߐࠇ‫ࠆ޽ޔ‬㔚૏ࠍ⿥߃ߚߣ

20mm

߈‫ߩࠄࠇߎޔ‬㔚⩄߇࠮࡜ࡒ࠶ࠢࠬౝㇱࠍㅢߞߡធ࿾㔚ᭂ஥߳Mesh electrode᡼㔚ࠍ⿠ߎߔ. (1)‫(ޔ‬2)ߩ⃻⽎ࠍ➅ࠅ㄰ߔߎߣߦࠃࠅ(3)࠮࡜ࡒ

Fig.2 Micro-discharge reactor (Mesh-mesh electrodes).

࠶ࠢࠬ⴫㕙෸߮ౝㇱߢߩ᡼㔚⃻⽎߇ᜬ⛯ߔࠆߎߣࠍᦼᓙߔ
ࠆ.

DC H.V.

--

Table1 Properties of ceramics

e ee- e- e- e- e- e- e- e- e(2)---PorePowder

Porosity

Al2O3[%]

size[Pm]size[Pm][%]

Ceramics A

92

90

100

37

Ceramics B

92

1540

42

Ceramics C

99

0.8

238

Ceramics D-800-

80㨪90e(1)-Proportion-- ---

2.3-e e e e e e e e eታ㛎ⵝ⟎ታ㛎ߢߪ‫ޔ‬㜞㔚࿶஥ߦ㔚ᵹ೙㒢↪ߣߒߡ 5Mǡߩᛶ᛫ࠍ⸳

(3)⟎ߒ᡼㔚ㇱ߳ߣធ⛯ߒߚ. ᛶ᛫ߩធ⛯߿㔚ᵹ‫ޔ‬㔚࿶᷹ቯߩ᭽ሶࠍ Fig.3 ߦ␜ߔ. ශട㔚࿶ߪᛶ᛫ࠍ฽߹ߥ޿႐วߦ߅޿ߡ

Fig.1 Schematic illustration of micro-discharge by back corona (e-:ࡕ࠾࠲ߒߚ. 㔚࿶ߪ㜞㔚࿶ࡊࡠ࡯ࡉ㧔Tektronix P6015㧕෸߮ࠝ

negative ionic charge).

ࠪࡠࠬࠦ࡯ࡊ㧔Tektronix TDS 644A㧕ࠍ↪޿᷹ቯߒߚ. 㔚ᵹA1 ߪ㔚Ḯ㧔TREK Model 20/20C㧕ߦౝ⤳࠲ࠗࡊߩ㔚ᵹ⸘෸߮

2.2ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ෻ᔕེࠝࠪࡠࠬࠦ࡯ࡊࠍ‫ޔ‬㔚ᵹ A2 ߪࠕ࠽ࡠࠣ㔚ᵹ⸘ࠍ↪޿ߡ᷹ቯFig.2 ߦࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩታ㛎ߦ↪޿ߚ᡼㔚㔚ᭂߒߚ.

෸߮࠮࡜ࡒ࠶ࠢࠬ㈩⟎ࠍ␜ߔ. ታ㛎ߪࡔ࠶ࠪࡘኻࡔ࠶ࠪࡘ㔚ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩᔕ↪ߣߒߡ NOX ಣℂ⹜㛎ࠍⴕᭂ࠲ࠗࡊߩ᡼㔚ࠪࠬ࠹ࡓࠍ↪޿ߡⴕߞߚ. 㔚ᭂߣߒߡ૶↪ߒ

ߞߚ. Fig.4 ߦឃࠟࠬಣℂ⹜㛎ߩታ㛎ࠪࠬ࠹ࡓࠍ␜ߔ. ࠮࡜ࡒߚࡔ࠶ࠪࡘߪࠬ࠹ࡦ࡟ࠬߩ 20 ࡔ࠶ࠪࡘߩ߽ߩࠍ↪޿‫ޔ‬㜞㔚࠶ࠢࠬ A ࠍࠟ࡜ࠬ▤ౝߦ࿕ቯߒ‫ࡘࠪ࠶ࡔޔ‬㔚ᭂߢ࠮࡜ࡒ࠶ࠢ

࿶஥‫ޔ‬ធ࿾஥౒ߦ⋥ᓘ 20mm ߩ౞⁁ߣߒߚ.

ࠬࠍ᜽ߺࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫࠍ⿠ߎߔߎߣߢ⹜㛎ࠍⴕታ㛎ߦߪ 4 ⒳㘃ߩ࠮࡜ࡒ࠶ࠢࠬࠍ૶↪ߒߚ. Table1 ߦߘߩߞߚ. ࡑࠬࡈࡠ࡯ࠦࡦ࠻ࡠ࡯࡜࡯ߦࠃߞߡ⺞ᢛ‫ޔ‬ᷙวߒߚᮨ

⹦⚦ࠍ␜ߔ. ࠮࡜ࡒ࠶ࠢࠬߪߔߴߡ‫⋥ޔ‬ᓘ 26mm‫ޔ‬ෘߐ 3mm

ᡆࠟࠬࠍ෻ᔕེߦዉ౉ߒ‫ޔ‬NOX ಣℂ․ᕈࠍᬌ⸛ߒߚ. ෻ᔕེߩ౞ᩇᒻߩ࠮࡜ࡒ࠶ࠢࠬ᧼ߢ޽ࠆ. Ceramics A‫ޔ‬B‫ޔ‬C ߪࠕ࡞౉ญ෸߮಴ญࠟࠬߪ‫ޔ‬NOX ⸘㧔HORIBA PG-250㧕‫ޔ‬GC-FIDࡒ࠽☸ሶߩ὾⚿૕ߢ޽ࠅ‫ࠇߙࠇߘޔ‬ේᢱ☸ሶᓘ‫ޔ‬ᐔဋ⚦ሹࠨ

㧔Shimazu, 14A㧕‫ޔ‬FT-IR㧔Bio-Rad FTS3000㧕ࠍ↪޿᷹ቯࠍⴕ

ࠗ࠭߇⇣ߥࠆ. Ceramics D ߪࠦ࡯ࠫࠚ࡜ࠗ࠻ߣࠕ࡞ࡒ࠽ߩᷙ

ߞߚ. ߹ߚࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߦ߅ߌࠆ NOX ಣℂ᷷ᐲ․ว࠮࡜ࡒ࠶ࠢࠬߢ޽ࠅ‫ޔ‬ⓨ㓗₸߇ 80㨪90㧑ߣ㕖Ᏹߦ㜞ߊ‫ޔ‬ᐔᕈࠍᛠីߔࠆߚ߼ߦ‫ޔ‬Ᏹ᷷㧔22͠㧕ߣ 150͠ߦ߅޿ߡ⹜㛎ࠍ

ဋ800P㨙⒟ᐲߩⓨ㓗߇޽ࠆ. ᧄ⎇ⓥߢߪߎࠇࠄߩ⚦ሹᓘߩ⇣

ⴕߞߚ. ߥ߅‫ߦ․ޔ‬ᢿࠄߥ޿㒢ࠅ‫⺰ᧄޔ‬ᢥߢߪ NO ߣ NO2 ߩߥࠆ 4 ⒳㘃ߩ࠮࡜ࡒ࠶ࠢࠬࠍ↪޿‫ޔ‬ㅒ㔚㔌⃻⽎ߦࠃࠆࡑࠗࠢ

๺ࠍ NOX ߣ⴫ߔ‫ޕ‬
- 2 -

40

静電気学会誌

第 29 巻

第 1 号（2005）

࿶ 8kV ઃㄭ߆ࠄᓢ‫ߦޘ‬㔚ᵹ߇Ⴧടߔࠆ௑ะ߇⷗ࠄࠇߚ߇‫ޔ‬A‫ޔ‬High Voltage Power SourceB ߩࠃ߁ߥࡄ࡞ࠬ⊛ߥ㔚࿶㒠ਅߪߥ߆ߞߚ. ࠮࡜ࡒ࠶ࠢࠬࠍA1↪޿ߥ޿‫ࡘࠪ࠶ࡔޔ‬㔚ᭂߩߺߩ႐วߢߪ‫ޔ‬ශട㔚࿶ 10kV ઃㄭ߆ࠄ‫࠽ࡠࠦޔ‬᡼㔚߇⿠ߎࠅ‫ޔ‬1500PA ⒟ᐲߩ㔚ᵹ߇ᵹࠇᆎ

5 Mǡ߼ߚ. ᱜᭂᕈ⋥ᵹ㜞㔚࿶ࠍ↪޿ߚ႐วߦ߽‫⽶ޔ‬ᭂᕈߩ႐วߣ
ห᭽ߩ௑ะ߇⷗ࠄࠇ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A‫ޔ‬B ߩߺߢ‫⊛ࠬ࡞ࡄޔ‬Vߥ㔚࿶㒠ਅࠍ઻߁‫ߚߒ↢⊒߇ࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬.

3.0
Average current [PA]A2

Fig.3 V-I measurement system.
GC-FID
FT-IR

Ceramics A

2.5

Ceramics B

2.0

Ceramics C

1.5

No Ceramics

1.0
0.5
00

ExhaustMass FlowControllers

NOX
Analyzer

200Digital
Oscilloscope

Voltage [kV]

-3OvenFig.4 Experimental setup.

3.1

15

polarity.

ReactorN2 O2 NO C2H4

10Fig.5 VI characteristics using ceramics A, B, C with negative

Power Source

3.

5

Applied Voltage [kV]

-6-9-12-15ታ㛎⚿ᨐ෸߮⠨ኤ-18ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߩ VI ․ᕈ

0⋥ᵹ㜞㔚࿶ࠍශടߒ‫ޔ‬VI ․ᕈࠍᬌ⸛ߒߚ. ᧄ⹜㛎ߢߪ‫ޔ‬ෘߐ

0.2
0.3Time [sec]3mm ߩ࠮࡜ࡒ࠶ࠢࠬࠍ 2 ᨎ㊀ߨߢ↪޿‫ޔ‬㔚ᭂ㑆〒㔌ࠍ 6mm

Fig.6 Micro-discharge voltage waveform using ceramics B withߣߒߚ‫ޔ‬᷷ᐲ᧦ઙߪ 22͠‫ߪࠬࠟࡌࡦࡏޔ‬ᵹߐߕ‫ޔ‬ᄢ᳇㐿᡼⁁DC negative polarity.

೨ㅀߒߚ⚦ሹᓘߩ⇣ߥࠆ࠮࡜ࡒ࠶ࠢࠬ᧼ࠍ↪޿ߡᱜ‫ߩ⽶ޔ‬

0.1

0.4

0.5

ᘒߢ⹜㛎ࠍⴕߞߚ. Fig.5 ߦ‫⽶ޔ‬ᭂᕈ⋥ᵹ㜞㔚࿶ශടᤨߦ߅ߌࠆ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A‫ޔ‬B‫ޔ‬C ෸߮࠮࡜ࡒ࠶ࠢࠬࠍ↪޿ߥ޿ࡔ࠮࡜ࡒ࠶ࠢࠬ A‫ޔ‬B ߦ߅޿ߡ‫ޔ‬㔚ᵹߩჇടߣࡄ࡞ࠬ⊛㔚࿶࠶ࠪࡘ-ࡔ࠶ࠪࡘߩߺߩ㔚ᭂߦ߅ߌࠆ V-I ․ᕈࠍ␜ߔ. ߎߎߢ㒠ਅ߇⊒↢ߒߚℂ↱ߣߒߡ‫⴫ࠢ࠶ࡒ࡜࠮ޔ‬㕙ߦ㔚⩄߇⫾Ⓧߒ‫ޔ‬ߪ෻ᔕེߦ߆߆ࠆ㔚࿶ߣ㔚ᵹ‫ޔ‬V ෸߮ A2 ߩᜰ␜୯ࠍ Fig.5 ߦ⍫ශߢ␜ߒߚශട㔚࿶୯ࠍႺߦ‫ޔ‬ㅒ㔚㔌⃻⽎ࠍ⿠ߎߒ‫࡜࠮ޔ‬ࡊࡠ࠶࠻ߒߡ޿ࠆ. 㔚ᵹߪࠕ࠽ࡠࠣ⸘ࠍ↪޿ߡ᷹ቯߒߡ߅ࠅ‫ޔ‬ࡒ࠶ࠢౝㇱߦࡄ࡞ࠬ⊛ߥ᡼㔚߇⿠ߎߞߚߎߣ߇␜ໂߐࠇࠆ.

ᤨ㑆ᐔဋߩ୯ߣߥߞߡ޿ࠆ.

߹ߚⓨ㓗ࠨࠗ࠭߇ዊߐ޿ߚ߼‫ޔ‬᡼㔚࠴ࡖࡀ࡞߇චಽߦિ߮߈Fig.5 ਛ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A ෸߮ B ߦ߅޿ߡ‫ޔ‬ශട㔚࿶߇⍫ࠄߕߦㅪ⛯⊛ߥࠕ࡯ࠢ᡼㔚߳ߩ⒖ⴕ߇⿠ߎࠄߥ޿ߎߣ߇੍
ᗐߐࠇࠆ.

ශߢ␜ߒߚ▎ᚲࠍ⿧߃ߚ㔚࿶ࠃࠅ‫ޔ‬㔚ᵹ୯߇ᕆỗߦჇടߒߚ.
ߘߩ⚿ᨐ‫ޔ‬Fig.6 ߦ␜ߔࠃ߁ߥࡄ࡞ࠬ⊛ߥ㔚࿶㒠ਅࠍ↢ߓ‫࠮ޔ‬ᧄታ㛎ߦ߅޿ߡ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A‫ޔ‬B ࠍ↪޿ߚ႐ว‫ޔ‬೨ㅀ࡜ࡒ࠶ࠢࠬߩ⴫㕙߿ౝㇱߩ޿ߚࠆߣߎࠈߢ‫✢ޔ‬㚅⧎Ἣߩࠃ߁ߩࠃ߁ߥㅒ㔚㔌ߦ⿠࿃ߔࠆߣᕁࠊࠇࠆࡄ࡞ࠬ⊛ߥ᡼㔚߇⷗ߥ⊒శ߇ᄙᢙⷰኤߐࠇߚ. ৻ᣇ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬C ߢߪශട㔚

ࠄࠇߚ. ৻ᣇ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A‫ޔ‬B ߦᲧߴ‫⚦ޔ‬ሹᓘߩዊߐ޿
- 3 -マイクロディスチャージの特性と NOX 処理への応用（松井良彦ら）

࠮࡜ࡒ࠶ࠢࠬ C ߢߪߎߩࠃ߁ߥ᡼㔚⃻⽎߇⷗ࠄࠇߥ߆ߞߚ.

41ലᨐ߇ᦼᓙߢ߈ࠆ.

ⓨ᳇ࠍ᡼㔚ࠟࠬߣߒߚ႐ว‫ޔ‬࿶ജߣ᡼㔚ࠡࡖ࠶ࡊߩⓍߢ޽ࠆ

Voltage [kV]Pd ࡒ࠾ࡑࡓߪ 0.3㨪0.6[cm㨯Torr]ઃㄭߣߥࠆ (7). ᄢ᳇࿶ਅ(760Torr)ߢߪ‫ޔ‬᡼㔚ࠡࡖ࠶ࡊ d ߩ▸࿐߇ 4Pm㨪8Pm ߦ߅޿ߡἫ⧎㔚࿶ߩℂ⺰୯߇ᦨዊߣߥࠆ. ࠃߞߡ‫ࠇߎޔ‬એਅߩ᡼㔚ࠡ
ࡖ࠶ࡊ〒㔌ߢߪ᡼㔚ߩㅴዷ߇⪺ߒߊ㒖ኂߐࠇࠆߎߣߣߥࠆ.
ታ㛎ߦ↪޿ߚ࠮࡜ࡒ࠶ࠢࠬ A‫ޔ‬B ߪߘࠇߙࠇᐔဋ⚦ሹᓘ߇
90Pm‫ޔ‬15P㨙ߢ޽ࠅ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬C ߪ 0.8Pm ߢ޽ࠆ. ߎߩ

10-1-2-3-4-5-6-7

Voltage

Current

1.6
1.2
0.8
0.4
00ࡖ࡯ࠫࠍ↢ᚑߒߚߣ⠨߃ࠄࠇ‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬C ߢߪࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ߇⊒↢ߒߥ߆ߞߚߎߣ߇⠨ኤߢ߈ࠆ. ߹ߚ‫ޔ‬(a) Micro-discharge waeform - range 0 to 1.0 msec.

࠮࡜ࡒ࠶ࠢࠬ D ࠍ↪޿ߡ‫ޔ‬ห᭽ߩታ㛎ࠍⴕߞߚߣߎࠈ‫ࠆ޽ޔ‬

Voltageශട㔚࿶ࠍ⿧߃ߚߣߎࠈ߆ࠄࡄ࡞ࠬ⊛ߥ㔚࿶㒠ਅ߇⊒↢ߒ‫ޔ‬

4⋥ߜߦࠕ࡯ࠢ᡼㔚ߦ⒖ⴕߒ‫ޔ‬శߣᾲࠍ઻ߞߚዪᚲ⊛ߥᒝ޿᡼

Voltage [kV]㔚߇⿠ߎߞߚ. ߎࠇߪ‫ޔ‬ⓨ㓗߇ᄢ߈ߔ߉ࠆߚ߼ߦ‫࠶ࡒ࡜࠮ޔ‬ࠢࠬ A‫ޔ‬B ߢⷰኤߐࠇߚࠃ߁ߥࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ߇⿠ߎࠅߦߊ޿ߎߣ߇⠨߃ࠄࠇࠆ.
3.2

ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫࠍ↪޿ߚ NOX ಣℂ

0.25

1.0-0.4

0.50.75
Time [msec]ߚ߼‫ ࠬࠢ࠶ࡒ࡜࠮ޔ‬A ߣ B ߇Ყセ⊛቟ቯߥࡑࠗࠢࡠ࠺ࠖࠬ࠴

Current

20-2-4-6ߎߎߢߪ‫ ߚ޿↪ࠍࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬NOX ࠟࠬಣℂ-8⹜㛎ࠍⴕߞߡ޿ࠆ. 100ppmv ߩ NO‫ޔ‬10vol%ߩ O2‫ࠬࡦ࡜ࡃޔ‬ࠟࠬࠍ N2 ߣߒ‫ޔ‬ᮨᡆࠟࠬ 0.6L/min ࠍࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯

00.05

0.15
0.1
Time [µsec]

0.2

2
1.5
1
0.5
0-0.5
-1
-1.5

Current [A]ࠨࠗ࠭߇㑐ㅪߒߡ޿ࠆߣ⠨߃ࠆ. ࡄࠪࠚࡦߩᴺೣߦࠃࠇ߫‫ޔ‬Current [A]ߎߩℂ↱ߣߒߡ᡼㔚ߩㅴዷߦᔅⷐߥ࠮࡜ࡒ࠶ࠢࠬౝߩⓨ㓗ࠫ෻ᔕེߦㅢㆊߐߖ‫⽶ޔ‬ᭂᕈ⋥ᵹ㜞㔚࿶߽ߒߊߪ໡↪๟ᵄᢙ(b)Micro-discharge waeform - range 0 to 0.2 Psec.

60Hz ߩ੤ᵹ㜞㔚࿶ࠍ࠮࡜ࡒ࠶ࠢࠬߦශടߒታ㛎ࠍⴕߞ

Fig.7 Micro-discharge waveform of DC high voltage using

ߚ.C2H4 ࠍ NOX ಣℂ↪ߩᷝട೷ߣߒߡ↪޿‫ޔ‬ᷝട೷޽ࠅ‫ߥޔ‬ceramics A㧔DC, Negative polarity, Applied voltage -5.5kV㧕.

ߒ෺ᣇߦ߅޿ߡ⹜㛎ࠍⴕߞߚ. ታ㛎ߦవ┙ߞߡ෻ᔕེㇱߩ࿶ജ៊ᄬࠍ᷹ቯߒߚ‫ ࠬࠢ࠶ࡒ࡜࠮ޕ‬A‫ޔ‬B ฦ 1 ᨎࠍࡑࠗࠢࡠ࠺Fig.8 ߦ⽶ᭂᕈ⋥ᵹ㜞㔚࿶ශടߦࠃࠆࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖࠖࠬ࠴ࡖ࡯ࠫ෻ᔕེߦ⸳⟎ߒߚߣߎࠈ‫ޔ‬᷷ᐲ 22͠‫ࠬࠟޔ‬ᵹㅦ࡯ࠫࠍ↪޿ߚ NOX ಣℂ⹜㛎⚿ᨐࠍ␜ߔ. ታ㛎ߪ‫ޔ‬ቶ᷷㧔22͠㧕

0.6L/min ߩ᧦ઙߦ߅޿ߡ࿶ജ៊ᄬߪߘࠇߙࠇ‫ޔ‬140Pa ෸߮ߢⴕ޿‫ޔ‬NOX ㆶర㒰෰ߩᷝട೷ߣߒߡ C2H4 ࠍ 300ppm ᷝടߒ1500Pa ߢ޽ߞߚ. ߎߩߚ߼‫ᧄޔ‬ታ㛎ߢߪ࿶ജ៊ᄬߩዋߥ޿࠮

ߡ޿ࠆ. Ἧ⦡ߢ␜ߔㇱಽ߇㜞㔚࿶ࠍශടߒ‫ࠬࠖ࠺ࡠࠢࠗࡑޔ‬࡜ࡒ࠶ࠢࠬ A࡮㧝ᨎࠍࡔ࠶ࠪࡘ㔚ᭂߦ᜽ߺ‫ޔ‬㔚ᭂ㑆〒㔌ߪ࠴ࡖ࡯ࠫߩ⊒↢ࠍᜬ⛯ߐߖߚㇱಽߢ޽ࠆ. ὐ✢ߢ␜ߒߚ߽ߩ

3mm ߣߒߡታ㛎ࠍⴕߞߚ.ߎߩߣ߈ߩࠟࠬṛ⇐ᤨ㑆ߪ 0.08 ⑽ߪ౉ญ⹜ᢱࠟࠬਛߩ NO Ớᐲߢ޽ࠅ‫ޔ‬100ppm ߣߒߡ޿ࠆ.
Fig.8 ࠃࠅ‫ޔ‬㜞㔚࿶ශടߥߒߢߪ‫ޔ‬NOX‫ޔ‬C2H4 Ớᐲߣ߽ߦ㧔SV:43000hr-1㧕ߢ޽ࠆ.
Fig.7 ߦ NOX ಣℂ⹜㛎ߦ↪޿ߚ⽶ᭂᕈ⋥ᵹශട㔚࿶-6.4kVᄌൻߒߥ޿ߎߣ߇ࠊ߆ࠆ. ᷝട೷ߥߒߩ᧦ઙߢߪ㜞㔚࿶ශടߦ߅ߌࠆ㔚࿶㒠ਅᵄᒻ෸߮ߘߩ㓙ߩ㔚ᵹᵄᒻࠍ␜ߔ. 㔚࿶‫ޔ‬ᓟߦ NO‫ޔ‬NOX Ớᐲߣ߽ߦ৻ᤨᷫዋߒߚᓟ‫ࠬࠖ࠺ࡠࠢࠗࡑޔ‬㔚ᵹߪ㜞㔚࿶ࡊࡠ࡯ࡉ‫ޔ‬㔚Ḯౝ⤳࠲ࠗࡊߩ㔚ᵹ⸘෸߮ࠝࠪࡠ

࠴ࡖ࡯ࠫ㐿ᆎ߆ࠄ 5 ಽᓟ⒟ᐲߦߪ‫ޔ‬NOX Ớᐲ߇ 100ppm ⒟ᐲ

ࠬࠦ࡯ࡊࠍ↪޿ߡ᷹ቯߒߡ޿ࠆ. Fig.7(a)ࠃࠅ‫ޔ‬㧝msec ߩ㑆ߦ‫ޔ‬߹ߢ਄᣹ߒߡ޿ࠆ.ߐࠄߦ‫ޔ‬㔚࿶ශട 10 ಽએ㒠ߪ NOX Ớᐲ߇

⚂ 8 ࿁ߩ㔚࿶㒠ਅ߇⿠ߎࠆߎߣ߇ࠊ߆ࠆ.߹ߚߎߩ㔚࿶㒠ਅ

140ppm ⒟ᐲߣߥߞߡ⪭ߜ⌕޿ߚ. NO ߪ৻ᣤ࠯ࡠߣߥࠅ‫ޔ‬᡼ߩ࠲ࠗࡒࡦࠣߣหᤨߦ㔚ᵹ߇ᵹࠇߡ޿ࠆ.߹ߚ‫ޔ‬Fig7 (b)ߦ␜

㔚㐿ᆎ 10 ಽ⒟ᐲࠃࠅჇടࠍߪߓ߼‫ ⚂ޔ‬80ppm ⒟ᐲߦ⪭ߜ⌕ߔࠃ߁ߦ‫ޔ‬㔚࿶ߩ┙ߜ਄߇ࠅߪᢙච nsec ⒟ᐲߢ޽ࠅ‫ߩߘޔ‬㓙

޿ߚ. C2H4 ࠍᷝടߒߚ႐วߢߪ‫ޔ‬᡼㔚㐿ᆎ⋥ᓟࠃࠅ NOX Ớᐲߦ᡼㔚㔚ᵹ߇ᵹࠇߡ޿ࠆ. ߎߩ᡼㔚ᣇᴺߦࠃࠅ⍴ᤨ㑆ߦᒝ޿߇਄᣹ߒ 140ppm ⒟ᐲߦ⪭ߜ⌕޿ߚ. NO Ớᐲߪ㔚࿶ශട⋥ᓟ᡼㔚ࠍᄙᢙ⿠ߎߔߎߣ߇ߢ߈ࠆߎߣ߆ࠄ‫ޔ‬ᄢ߈ߥឃࠟࠬಣℂߦ࠯ࡠߣߥࠅ‫ޔ‬ᓢ‫ߦޘ‬Ⴧടߒ‫ޔ‬ᷝട೷ߥߒߣห᭽ߦ 80ppm ⒟- 4 -42

静電気学会誌

第 29 巻

第 1 号（2005）ᐲߦ⪭ߜ⌕޿ߚ.
80006000ࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߦࠃࠅ‫ޔ߇ࠆ޽ߪߢ⊛ࠬ࡞ࡄޔ‬㗫❥ߦ㔚

4000

Voltage [V]ࠬ⴫㕙᷷ᐲࠍ᷹ቯߒߚߣߎࠈ‫ޔ‬90͠ߢ޽ߞߚ‫ࠗࡑޔߪࠇߎޕ‬ᵹ߇ᵹࠇ‫ࠬࠢ࠶ࡒ࡜࠮ޔ‬ౝߩ᷷ᐲ߇਄᣹ߒߚߎߣࠍ␜ߒߡ޿
ࠆ‫ࠬࠢ࠶ࡒ࡜࠮ޔ߼ߚߩߎޕ‬਄ߢߩ NO ߆ࠄ NO2 ߳ߩ㉄ൻ߇᷷ᐲ਄᣹ߦࠃࠅ㒖ኂߐࠇߚߎߣ᜼ߍࠄࠇࠆ. ߹ߚᾲߣ᡼㔚‫ޔ‬

0.6

Voltage

0.40.2

2000

00-2000-0.2

Current෺ᣇߩലᨐߦࠃࠅ࠮࡜ࡒ࠶ࠢࠬⓨ㓗᳇⋧ਛߢ NOX ࠍ↢ᚑߒ-4000-0.4

ߡߒ߹ߞߚߎߣ߇⠨߃ࠄࠇࠆ. Fig.8 ࠃࠅᷝട೷ߥߒߢߪ‫ޔ‬᡼

-6000

-0.6

㔚㐿ᆎᓟ‫ޔ‬ᓢ‫ߦޘ‬෻ᔕེ᷷ᐲ਄᣹߇⿠ߎࠅ‫ޔ‬ᷝട೷޽ࠅߢߪ‫ޔ‬-1204-8ᷝട೷ߩ෻ᔕᾲ߇ᓇ㗀ߒߡ᷷ᐲ਄᣹߇ᣧ޿ߎߣ߇੍ᗐߐࠇ

48-4 120
16Time [msec]

820

Current [A]NOX ಣℂታ㛎⚳ੌᓟ‫⿒ޔ‬ᄖ᡼኿᷷ᐲ⸘ࠍ↪޿ߡ࠮࡜ࡒ࠶ࠢ

1224

ࠆ‫⹜ᧄޕ‬㛎ߦ߅޿ߡ‫ޔ‬㔚࿶‫ޔ‬㔚ᵹᵄᒻࠃࠅ᭎▚ߒߚᛩ౉ࠛࡀ

Fig.9 Micro-discharge waveform of AC high voltage using࡞ࠡ࡯ߪᢙ kJ/L ߣߥࠆ. N2 ߣ O2 ሽ࿷᧦ઙߦߡ᡼㔚ߢᢙ kJ/Lceramics A (60Hz, Applied voltage 11kVp-p).

ߩࠛࡀ࡞ࠡ࡯ࠍᛩ౉ߒߚ႐ว‫ޔ‬NOX ߇↢ᚑߒߡߒ߹߁ߎߣ߇
Fig.9 ߦ␜ߒߚ 60Hz ߩ AC 㜞㔚࿶ࠍශടߒ‫ޔ‬NOX ಣℂ⹜㛎ߔ߉ࠆߚ߼ߦ NOX ߇↢ᚑߒߡߒ߹ߞߚߎߣ߇ផ᷹ߐࠇࠆ.

ࠍⴕߞߚ. ෻ᔕེߪࠝ࡯ࡉࡦߦ౉ࠇ‫ޔ‬᷷ᐲ᧦ઙ 22͠෸߮ታ

160
140
120
100
80
60
40200NONO (with C2H4)
C2H4㓙ߩឃ᷷ࠟࠬᐲߢ޽ࠆ 150͠ߣߒߡߘࠇߙࠇ⹜㛎ࠍⴕߞߚ‫ޕ‬
NOxNOx (with C2H4)

Plasma ON
01020Time [min]30᡼㔚㔚ജߪ࠻࡜ࡦࠬߩ৻ᰴ஥ߦߡ᷹ቯߒ‫ޔ‬10W ߦ࿕ቯߒߚ.
Fig.10 ߦ AC 㜞㔚࿶ශടᤨߦ⊒↢ߔࠆࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ
350
300
250
200
150
100
500

C2H4 Concentration [ppm]NO, NOX Concentration [ppm]ႎ๔ߐࠇߡ޿ࠆ(8). ᧄ⎇ⓥߦ߅޿ߡ߽ࠛࡀ࡞ࠡ࡯ᛩ౉㊂߇ᄙ࡯ࠫࠍ↪޿ߚ NOX ಣℂ⹜㛎⚿ᨐࠍ␜ߔ. ෻ᔕེ᷷ᐲߪቶ᷷22͠ߣߒߚ. ࠣ࡟ࠗߩㇱಽ߇ AC 㜞㔚࿶ࠍශടߒߚㇱಽߢ޽ࠆ.ᷝട೷ߣߒߡ C2H4 ࠍ↪޿ߚ႐วߦߟ޿ߡ߽⹜㛎ࠍⴕߞߚ.
ᷝട೷ߥߒߩ႐วߢߪ‫ࠅࠃߦࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬NO ߇㉄ൻߐࠇߡ߅ࠅ‫ ⚂ޔ‬80ppm ߩ NO ߇ᷫዋߒߡ޿ࠆ. ৻ᣇ‫ޔ‬ᷝട೷޽ࠅߢߪ‫ޔ‬NO ߩ㉄ൻᕈ⢻߇ᖡߊߥࠆ௑ะ߇⷗ࠄ
ࠇߚ. NOX Ớᐲߦ㑐ߒߡߪᷝട೷޽ࠅ‫ߤࠎߣ߶ߦ߽ߣߒߥޔ‬ᷫዋߒߥ߆ߞߚ. ᡼㔚⹜㛎⚳ੌᓟߩ࠮࡜ࡒ࠶ࠢࠬ⴫㕙᷷ᐲߪ

Fig.8 NOX removal results using DC micro-discharge with30͠ߢ޽ࠅ‫⋥ޔ‬ᵹ㜞㔚࿶ශടᤨߦᲧߴ᷷ᐲ਄᣹ࠍᛥ߃ࠆߎߣ

andwithout additive (DC, Negative polarity, Applied voltage߇ߢ߈ߚ‫ ߼ߚߩߎޕ‬Fig.8 ߢ⷗ࠄࠇߚࠃ߁ߥ NOX ߩ↢ᚑߪ

-5.5kV).

⷗ࠄࠇߥ߆ߞߚߎߣ߇ಽ߆ࠆ‫ ߚ߹ޕ‬AC 㜞㔚࿶ࠍ↪޿ࠆߎߣߢ‫࡯ࠡ࡞ࡀࠛޔ‬ᛩ౉㊂ࠍᛥ೙ߒ‫ޔ‬NO ㉄ൻല₸߇਄᣹ߒߚߎߘߎߢ‫ޔ‬ᛩ౉ࠛࡀ࡞ࠡ࡯ࠍᛥ೙ߒ‫࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬ߣ߇᜼ߍࠄࠇࠆ.

ࠫߩ⊒⃻㗫ᐲࠍᷫࠄߔߚ߼‫ޔ‬60Hz ߩ AC 㜞㔚࿶ࠍ↪޿ߡ⹜㛎หゲ౞╴ߩࡃ࡝ࠕ᡼㔚෻ᔕེߥߤࠍ↪޿ߚࡊ࡜࠭ࡑ᳇⋧ࠍⴕߞߚ. Fig.9 ߦ AC 㜞㔚࿶ࠍශടߒߚ႐วߩ㔚࿶‫ޔ‬㔚ᵹᵄ෻ᔕߢߪ‫ޔ‬C2H4 ߹ߚߪ C3H6 ߩᷝടߦࠃࠅ‫ޔ‬NO ߆ࠄ NO2 ߳ᒻࠍ␜ߔ. ⋥ᵹ㜞㔚࿶ශടᤨߣห᭽ߦ੤ᵹ㜞㔚࿶ශടߦ߅޿ߩ㉄ൻ߇㕖Ᏹߦଦㅴߐࠇࠆߎߣ߇ᄙߊႎ๔ߐࠇߡ޿ࠆ(3-5).

ߡ߽‫⽶ޔ‬ᭂ‫ޔ‬ᱜᭂߩ㔚࿶ࡇ࡯ࠢߦ߅޿ߡ㔚࿶㒠ਅ߇⿠ߎࠆ. ߹ᧄ⹜㛎ߢߪ‫ޔ‬C2H4 ࠍᷝടߒߚ႐วߦᲧߴ‫ޔ‬ᷝടߒߥ޿႐ว߇ߚหᤨߦ࠮࡜ࡒ࠶ࠢࠬ⴫㕙߿ౝㇱߦ߅޿ߡ‫⊒ޔ‬శ߇⷗ࠄࠇࡑNO ߩ㉄ൻᕈ⢻߇⦟ᅢߢ޽ߞߚ. ߎࠇߪ೨ㅀߒߚࡊ࡜࠭ࡑ᳇ࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫࠍ⏕⹺ߢ߈ߚ. 㔚ᵹᵄᒻࠃࠅ‫ޔ‬AC 㔚࿶⋧෻ᔕߣߪ߹ߞߚߊ⇣ߥߞߚߥߞߚ෻ᔕ⚻〝߇ሽ࿷ߔࠆߎශടᤨߦ߅޿ߡ߽⋥ᵹߣห᭽ߦᄙߊߩ㔚ᵹ߇ᵹࠇࠆ߇‫⋥ޔ‬ᵹߣࠍ␜ໂߒߡ޿ࠆ. NO ࠍ NO2 ߳㉄ൻߔࠆߎߣߢ‫⸅ޔ‬ᇦߦࠃࠆ㔚࿶ශടᤨ(Fig.7a)ߦᲧߴ‫ޔ‬㔚࿶㒠ਅߩ㗫ᐲ߇ 4msec ߦ⚂ 1 ࿁NOX ಣℂല₸߇਄᣹ߔࠆߎߣ߇⍮ࠄࠇߡ޿ࠆ(4-5)‫ߚ߹ޕ‬ૐ᷷᧦ߣ㕖Ᏹߦዋߥ޿. ߎࠇߪ࠮࡜ࡒ࠶ࠢ⴫㕙ߦ߅޿ߡ‫ࡠࠢࠗࡑޔ‬ઙߦ߅ߌࠆ PM (Particulate matter) ㉄ൻಣℂߦ NO2 ߇ലᨐ⊛࠺ࠖࠬ࠴ࡖ࡯ࠫߦᔅⷐߥ㔚࿶ଏ⛎ᤨ㑆߇⍴ߊ‫ޔ‬ଏ⛎ߐࠇࠆ㔚ߢ޽ࠆߎߣ߽ႎ๔ߐࠇߡ޿ࠆ(9). ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫ᡼⩄㊂߇⋥ᵹߦᲧߴዋߥ޿ߚ߼ߢ޽ࠆ. ߎߩߚ߼ NOX ಣℂ⹜㛎㔚ࠍ↪޿ࠆߎߣߢᷝട೷ࡈ࡝࡯ߢߩ NO ㉄ൻࠪࠬ࠹ࡓ߇૞ᚑ

ߦ߅ߌࠆ㔚ജᶖ⾌㊂ࠍᛥ߃ࠆߎߣ߇಴᧪ࠆߣ⠨߃ࠄࠇࠆ.

ߢ߈ࠆน⢻ᕈ߇޽ࠆ‫ޕ‬- 5 -NONO (with C2H4)
C2H4120NOxNOx (with C2H4)3503002502001501008060Plasma ON4020100500001020Time [min]3043⊛ᄢ߈ߥ⚦ሹࠨࠗ࠭㧔15Pm㨪㧕ߢ޽ࠇ߫‫ࠬࠢ࠶ࡒ࡜࠮ޔ‬ౝߢ᡼㔚ࠍ⿠ߎߖࠆߣ޿߁ࡔ࡝࠶࠻߇޽ࠆ. ੹ᓟ⾆㊄ዻߥߤߩ⸅

C2H4 Concentration [ppm]NO, NOX Concentration [ppm]

マイクロディスチャージの特性と NOX 処理への応用（松井良彦ら）

ᇦ‛⾰ࠍ࠮࡜ࡒ࠶ࠢࠬ⚦ሹౝߦઃ⌕ߐߖ‫࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬ࡖ࡯ࠫࠍⴕ߁ߎߣߢࠃࠅല₸⊛ߥࡊࡠ࠮ࠬߩ᭴▽߇น⢻ߢ޽ࠆߣ⠨߃ࠆ.
4.

߹ߣ߼ᧄ⎇ⓥߢߪ‫⚦ޔ‬ሹ⋥ᓘߩ⇣ߥࠆ࠮࡜ࡒ࠶ࠢࠬߦᱜᭂᕈ෸߮
⽶ᭂᕈߩ⋥ᵹ㜞㔚࿶ࠍශടߔࠆߎߣߢ‫⴫ࠬࠢ࠶ࡒ࡜࠮ޔ‬㕙෸߮ౝㇱߦㅒ㔚㔌⃻⽎ࠍ↢ߓߐߖ‫ࠍࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬Fig.10 NOX removal results using AC micro-discharge with and⊒↢ߐߖࠆߎߣࠍ⹜ߺߚ. ߎߩ⚿ᨐ‫⚦ޔ‬ሹᓘ߇ 90Pm‫ޔ‬15Pm

without additive (60Hz, Applied voltage 11kVp-p).

ߩ࠮࡜ࡒ࠶ࠢࠬ A‫ޔ‬B ߢߪㅒ㔚㔌ߦ⿠࿃ߔࠆߣ⷗ࠄࠇࠆࡄ࡞ࠬ⊛ߥ㔚࿶㒠ਅ߇↢ߓ‫߈ߢ⹺⏕߇ࠫ࡯ࡖ࠴ࠬࠖ࠺ࡠࠢࠗࡑޔ‬ᰴߦ෻ᔕེ᷷ᐲࠍ 150͠৻ቯߦ࿕ቯߒ‫ޔ‬AC ᡼㔚ߦࠃࠆ NOXߚ. ࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫࠍ↪޿ߚ NOX ಣℂ⹜㛎ߢߪ‫ޔ‬ಣℂ⹜㛎ࠍⴕߞߚ. ⹜㛎⚿ᨐࠍ Fig.11 ߦ␜ߔ. C2H4 ᷝടߩ᦭60Hz ߩ AC 㜞㔚࿶ශട‫ޔ‬᷷ᐲ᧦ઙ 22͠‫ޔ‬C2H4 ࠍᷝട೷ߣߒήߦ㑐ࠊࠄߕ‫ޔ‬NO ߩ㉄ൻ෻ᔕ߇⪺ߒߊ㒖ኂߐࠇ‫ޔ‬
C2H4 ޽ࠅ‫ޔ‬ߡ↪޿ߥ޿႐ว߇‫ޔ‬ᷝട೷޽ࠅߩ႐วߦᲧߴߡ NO ߩ㉄ൻ߇ߥߒߩ෺ᣇߦ߅޿ߡ‫ޔ‬NO ߆ࠄ NO2 ߳ߩ㉄ൻߪ 20ppm ⒟ᐲߦ

ࠃࠅଦㅴߐࠇߚ. ⽶ᭂᕈ⋥ᵹ㜞㔚࿶ශടߢߪࡑࠗࠢࡠ࠺ࠖࠬߣߤ߹ߞߚ. ߐࠄߦ‫ᤨޔ‬㑆⚻ㆊߦᓥ޿‫ޔ‬NOX Ớᐲ߇౉ญỚᐲ࠴ࡖ࡯ࠫߦࠃࠅ‫ ⚂ޔ‬40ppm ⒟ᐲߩ NOX ߇↢ᚑߒߡߒ߹߁ߎ

ࠃࠅ߽਄᣹ߔࠆ௑ะ߇⷗ࠄࠇߚ. એ਄ߩ⚿ᨐࠃࠅ‫࠶ࡒ࡜࠮ޔ‬ߣ߇್᣿ߒߚ.

᷷ࠢࠬᐲ߇ࠃࠅૐ޿႐วߦ NO ㉄ൻ෻ᔕ߇ଦㅴߐࠇࠆߎߣ߇
ታ㛎ߦ㓙ߒᄙߊߩࠕ࠼ࡃࠗࠬࠍ㗂޿ߚࠬࡠࡃࠠࠕ

ࠊ߆ߞߚ. ߹ߚ࠮࡜ࡒ࠶ࠢࠬߩ᷷ᐲ਄᣹ߦࠃࠅ‫ޔ‬NOX ↢ᚑ߇

Comenius ᄢቇ‫ޔ‬Karol Hensel ඳ჻ߦᗵ⻢޿ߚߒ߹ߔ‫⎇ᧄޕ‬ⓥ

NONO (with C2H4)
C2H4140ߩ৻ㇱߪ‫⑼ޔ‬ቇ⎇ⓥ⵬ഥ⾌ߢ޽ࠆ․೎⎇ⓥຬᅑബ⾌(15-8345)‫ޔ‬NOxNOx (with C2H4)

෸߮ᢥㇱ⑼ቇ⋭ 21 ਎♿ COE‫␠᧪ᧂޟ‬ળߩ↢ᘒᕡᏱᕈᎿቇ‫ޠ‬3501203001002508020060150

Plasma ON4010020500001020Time [min]ߩഥᚑߦࠃߞߡⴕࠊࠇ߹ߒߚ㧚ߎߎߦ⻢ᗧࠍ⴫ߒ߹ߔ.
C2H4 Concentration [ppm]NO, NOX Concentration [ppm]⿠ߎࠆߎߣ߇␜ໂߐࠇࠆ.

ෳ⠨ᢥ₂1)

H. H. Kim, Y. H. Lee, A. Ogata, S. Futamura, Catal. Commun.
Vol.4, (2003) 347.

2)

Y. Matsui, S. Sato, K. Takashima, S. Katsura, A. Mizuno, SAE
Tech. Paper 2003-01-1185.

3)

Y. Matsui, A. Sakaguchi, M. Hashimoto, K. Takashima, A.
Mizuno, SAE Tech. Paper 2001-01-3511.

304)

Fig.11 NOX removal results using AC micro-discharge with andH.H.Kim, K. Takashima, S. Katsura, and A. Mizuno,J.Physics D: Appl. Phys. 34 (2001) 604.

5)

without additive at 150͠ (60Hz, Applied voltage 11kVp-p).

T. Hammer, T. Kishimoto, B. Krutzsch, R. Andorf, C. Plog
SAE Tech. Paper 2001-01-3565.

6)Ᏹ᷷ߦߡ NOX ಣℂࠍⴕߞߚ Fig.10 ߩ⚿ᨐߢߪᷝട೷ࠍ↪

K. Hensel, Y. Matsui, S. Katsura, A. Mizuno, Czech. J. Phys.
54 (2004) C683.

޿ߥ޿႐ว߇‫ޔ‬NO ㉄ൻ෻ᔕࠍଦㅴߢ߈ߚ. ߐࠄߦቶ᷷ઃㄭߩૐ᷷߇⦟޿⚿ᨐ㧔Fig.11㧕ߣߥߞߚ. ߎࠇߪࡊ࡜࠭ࡑ᳇⋧෻7)㕒㔚᳇ቇળ✬㧦㕒㔚᳇ࡂࡦ࠼ࡉ࠶ࠢ‫( ␠ࡓ࡯ࠝޔ‬1998)ᔕߢߪ⷗ࠄࠇߥ޿᜼േߢ޽ࠅ‫ࠬࠢ࠶ࡒ࡜࠮ޔ‬ⓨ㓗ౝߩ᡼㔚߇8)

S. Futamura, A. Zhang, T. Yamamoto, IEEE Trans. on Ind., 36,Nov./Dec. (2000) 1507.

ነਈߒߡ޿ࠆน⢻ᕈ߇޽ࠆ.
9)

ᧄᚻᴺߢ↪޿ߚࡑࠗࠢࡠ࠺ࠖࠬ࠴ࡖ࡯ࠫߦࠃࠆ᡼㔚ᒻᘒ

M. Okubo, T. Kuroki, T. Yamamoto, JSAE Ann. Cong. Proc.
28-04 (2004) 17.

ߪ‫ޔ‬ᐔ᧼ߩ⸅ᇦ߿ࡂ࠾ࠞࡓ⸅ᇦ߳ߩㆡ↪߇น⢻ߢ޽ࠅ‫ޔ‬Ყセ- 6 -