                      !                   "              In this work, we present a new way of fabrication of optical devicecomponents. These components are passive and polymer based. As corematerial we used a formulation of three materials. As polyfunctionalmonomer we used pentaerythritol triacrylate, then we used
N-methyldiethanolamine as a cosynergist and eosin Y as a dye. This
formulation is a liquid negative-type photoresist material and in thisdissertation thesis we are going to call it by the capitals of its principal
components - PNME. In this work, we present the properties of thismaterial, such as absorption spectrum, refractive indices together with thedispersion curve, light induced self-writing property, and a propagation loss
as a function of waveguide length measured atabsorption spectrum shows a peak atformulation is transparent up to=1.3 m. The measured=0.530 m, otherwise the=1.7 m. Transparency in the telecom

region was also confirmed by subsequent measurement of the propagation
loss in an optical waveguide by cut-back method. The measurement wascarried out at=1.3 m and the measured propagation loss was 

0.99dB/cm. Refractive indices of the formulation were measured to be
n=1.512, n=1.501, and n=1.499 at=0.633 m,=1.3m, and   

=1.55m, respectively. All of the refractive indices were measured withroutine resolution of

0.0005.

The method we used to fabricate the optical waveguides, gratings, and theoptical waveguides with gratings is called cold ultra violet stamping.

The method is based on polymerization of photo-sensitive formulation
PNME inside a vessel of specific shape. For the fabrication of slab opticalwaveguide by cold UV stamping, the vessel was made by two glass plates
separated by a spacer. One of the plates was treated with antisticking
release layer. Therefore the liquid PNME after solidification adhered to theother glass plate. Coming out of this basic concept, elaborate opticalcomponents were fabricated. In order to confirm the suitability of cold UVstamping for fabrication of high precision optical components, a periodic
grating structure was copied onto the slab waveguide. The vessel used inthis experiment was again made of two glass plates separated by a spacer.
This time, a thin film of electron-beam (EB) resist was spun on top of oneof the glass plates. Then a grating with period=0.5

 m was prepared by

EB lithography. This grating structure was then covered by protective andrelease layer and successfully copied onto PNME material. Thus weconfirmed that cold UV stamping is a high resolution fabrication technique.
Another step was a fabrication of a channel optical waveguide. In order todo so, the vessel, which was again made by two glass plates separated by aspacer, was only partially transparent. Instead we used a gold mask toblock the ultra violet light. Therefore, not all the inside volume of thevessel filled with PNME solidified. The mask was made on one of the glassplates. This plate was also covered by a proper cladding material, which
was called C2727 and was supplied by NTT-AT. The other plate supported

a spacer made by SU-8 photoresist made by Microchem Corp. The
thickness of the spacer was controlled by controlling the spincoating
conditions of SU-8.



In this work, we present a new way of fabrication of optical device components.

These components are passive and polymer based. As core material we used aformulation of three materials. As polyfunctional monomer we used pentaerythritol
triacrylate, then we used N-methyldiethanolamine as a cosynergist and eosin Y as a dye.
This formulation is a liquid negative-type photoresist material and in this dissertation
thesis we are going to call it by the capitals of its principal components - PNME. In thiswork, we present the properties of this material, such as absorption spectrum, refractive
indices together with the dispersion curve, light induced self-writing property, and a
propagation loss as a function of waveguide length measured atmeasured absorption spectrum shows a peak atformulation is transparent up to=1.7

 =0.530

 =1.3

 m. Them, otherwise them. Transparency in the telecom region wasalso confirmed by subsequent measurement of the propagation loss in an opticalwaveguide by cut-back method. The measurement was carried out at=1.3m and   

the measured propagation loss was 0.99dB/cm. Refractive indices of the formulation
were measured to be n=1.512, n=1.501, and n=1.499 at
and

=1.55

0.0005.

Second Title

 m,=1.3m,m, respectively. All of the refractive indices were measured with routine

 

resolution of=0.633



The method we used to fabricate the optical waveguides, gratings, and the opticalwaveguides with gratings is called

cold ultra violet stamping.

The method is basedon polymerization of photo-sensitive formulation PNME inside a vessel of specificshape. For the fabrication of slab optical waveguide by cold UV stamping, the vessel
was made by two glass plates separated by a spacer. One of the plates was treated with
antisticking release layer. Therefore the liquid PNME after solidification adhered to theother glass plate. Coming out of this basic concept, elaborate optical components werefabricated. In order to confirm the suitability of cold UV stamping for fabrication ofhigh precision optical components, a periodic grating structure was copied onto the slab
waveguide. The vessel used in this experiment was again made of two glass plates
separated by a spacer. This time, a thin film of electron-beam (EB) resist was spun on
top of one of the glass plates. Then a grating with period=0.5 m was prepared by

EB lithography. This grating structure was then covered by protective and release layerand successfully copied onto PNME material. Thus we confirmed that cold UVstamping is a high resolution fabrication technique. Another step was a fabrication of achannel optical waveguide. In order to do so, the vessel, which was again made by twoglass plates separated by a spacer, was only partially transparent. Instead we used a gold
mask to block the ultra violet light. Therefore, not all the inside volume of the vessel
filled with PNME solidified. The mask was made on one of the glass plates. This plate
was also covered by a proper cladding material, which was called C2727 and wassupplied by NTT-AT. The other plate supported a spacer made by SU-8 photoresist
made by Microchem Corp. The thickness of the spacer was controlled by controlling thespincoating conditions of SU-8.