MODEL 1040

NanoMill ® TEM Specimen
Preparation System
The NanoMill system uses an ultra-low energy,
concentrated ion beam to produce the highest
quality specimens for transmission electron
microscopy.

• Ultra-low-energy, inert-gas ion source• Concentrated ion beam with scanningcapabilities• Removes damaged layers without
redeposition
TEM REQUIRES HIGH-QUALITY
SPECIMENS
For many of today’s advanced materials,
transmission electron microscopy (TEM) isthe best technique for gathering valuable
information about microstructure andproperties.
Because features in nanotechnology
research and semiconductor device
specimens continue to decrease insize, it is essential that specimens beboth very thin and free of preparationinduced artifacts. These requirements
are even more important when using
TEMs with aberration correction andmonochromated electron sources where
resolution is sub-Ångström.

• Ideal for post-focused ion beam processing• Enhances the results from conventionallyprepared specimens• Room temperature to cryogenically cooled
NanoMilling processSM• Rapid specimen exchange for highthroughput applications• Computer-controlled, fully programmable,
and easy to use• Contamination-free, dry vacuum system

M O D E L 10 4 0 N a n o M il l ® T E M S p e cim e n Pre p a ra t io n Sys t e mCreate thin specimens for TEM
Fischione’s Model 1040 NanoMill® TEM
specimen preparation system is an excellent
tool for preparing the ultra-thin, high-quality
specimens needed for transmission electron
microscopy (TEM) imaging and analysis.
The variable energy ion source generates ion
energies as low as 50 eV. In addition, the beam
size is as small as 1 µm, enabling removal ofamorphization, implantation, or redeposition
from targeted areas.
An ideal application for the NanoMill system
is post-focused ion beam (FIB) processing.
Although the FIB is highly effective in preparing
TEM specimens, its liquid metal (Ga) ion
source often results in amorphization and Ga
implantation. These damaged layers can be
as much as 10 to 30 nm thick. The NanoMill
system is ideally suited to removing these layers.

Targeted, ultra-low-energy milling
The NanoMill system’s ion source features
a filament-based ionization chamber andelectrostatic lenses. This source was specificallydeveloped to produce ultra-low ion energies anda small beam diameter. The source uses an inertgas, argon, and has an operating voltage range of
50 eV to 2 kV at variable working distances. TheION MILLING
Ion milling is used on physical science
specimens to reduce the thickness toelectron transparency. Inert gas, typicallyargon, is ionized and then accelerated
toward the specimen surface. By
momentum transfer, impinging ionssputter material from the specimen ata controlled rate. The NanoMilling
process enhances specimen quality,
which optimizes the results achieved bystate-of-the-art microscopy techniques.
SME.A. FISCHIONE INSTRUMENTS, INC.

source yields sufficient current density to remove
specimen damage within a reasonable time. The
NanoMilling process can be accomplished in as
little as 20 minutes.

The variable

Because the ion beamenergycan be focused into aion source
1 µm diameter spot,
redeposition of sputtered generates ion
material onto the area
energies asof interest is avoided.
low as 50 eV
Beam current and spot
and a beam
size are adjusted byusing different sized
size as small
TEM-type apertures.
as 1 µm
The feedback control
algorithm for theion source automatically produces stable andrepeatable ion beam conditions over a wide varietyof milling parameters.
The beam can be either targeted at a specific point
or scanned over the specimen’s surface. This isparticularly important when targeting a specificarea for selective milling or directing the ion beam
to a FIB lamella positioned on a support grid.
Ion source parameters are easy to program;
simply enter the emission current and accelerating
voltage. In addition, it is easy to establish thespecimen position. Once you enter the operating
parameters, the computer controls the instrumentfunctions.
In the imaging mode, select the scan speed,magnification, focus, brightness, and contrast.
With a 3 mm field of view, the entire surface
of a grid or specimen can be imaged, making it
extremely easy to mill the area of interest. This isuseful when targeting a FIB lamella.

SED specimen targeting
During operation, it is essential to know theposition of the ion beam in relation to thespecimen. This is of particular importance forpost-FIB processing in which the FIB lamella,mounted onto a support grid, can be as small as
10 µm2.
3

M O D E L 10 4 0 N a n o M il l ® T E M S p e cim e n Pre p a ra t io n Sys t e m

The Main tab is used to program instrument functions and displays the instrument’s operating status in real time. The
red rectangle is positioned over the area of interest, which is a FIB lamella attached to an Omniprobe™ grid.

Targeting directs the beam to a specific areaof interest. An Everhart-Thornley secondary
electron detector (SED) is used to image the ioninduced secondary electrons generated from thetargeted area. The SED output is processed by theNanoMill system’s imaging electronics to provide
a real-time view of the specimen, implicitlyaligned with the ion beam. You can select thescan speed – either faster imaging or enhanced
image quality. Frame averaging is employed toreduce noise.
The SED image is displayed on the Main tab. In
point mode, place the cursor on the specimen
to focus the ion beam to that point. If you needto thin a larger area, select the area and the ion
E.A. FISCHIONE INSTRUMENTS, INC.

beam will scan within it. The position and thedimensions of the scan box are displayed (inmicrons).

Computer control
The NanoMill system operates with minimaluser intervention. Milling conditions, such as
ion source parameters, milling angle, specimen
position, temperature threshold, and processing
time, are programmed via a single window. The
system software allows you to:•Store and reuse milling sequences (recipes),which leads to highly reproducible results•Control access to the various instrument
4M O D E L 10 4 0 N a n o M il l ® T E M S p e cim e n Pre p a ra t io n Sys t e mcontrols and maintenance functionality
through the assignment of user privileges•Use shortcut keys to speed programming andoperation•Review system operation through the Dataand Error Logs

•Configure alerts that will notify you of
preventive maintenance tasks

Typical processing sequence
For effective specimen preparation, a series ofoperational sequences can be established. Typicalmethodology starts with rapid milling at higherion energies. As the specimen thins, the ion energy
is reduced, resulting in a lower milling rate thateliminates artifacts. User-determined ion beamtargeting at each step of the operation ensures thatthe proper area of the specimen is processed.

Automatic gas control
Gas is regulated automatically using precisionmass flow control technology. An integral
particulate filter ensures that high-purity gas isdelivered to the ion source. This reduces specimen
contamination and allows the NanoMill system
to operate for longer cumulative periods before
maintenance is required. The ion source uses low
flow resulting in minimal gas consumption.

Contamination-free, fully integrated
dry vacuum system
The fully integrated vacuum system includes aturbomolecular drag pump backed by a multistage
diaphragm pump. This oil-free system assures aclean environment for specimen processing.
The operating system vacuum is 1 x 10-4 mbar
and the base vacuum is 3 x 10-7 mbar. The
chamber vacuum level is measured with a
combination cold cathode and Pirani gauge.
Vacuum status is displayed on the Main tab andthe vacuum level is displayed on the Maintenancetab.
E.A. FISCHIONE INSTRUMENTS, INC.

Specimen mounting
To prevent specimen shadowing, a uniquespecimen holder provides unobstructed ion
trajectories to the specimen, even at 0°. This isparticularly important when the ion beam istargeted at the leading edge of a FIB-preparedspecimen.
The specimen is mechanically affixed to thespecimen holder, thus eliminating the possibilityof contamination from an adhesive. A separate
loading station (included) provides a platform forthe specimen that eases holder positioning.

Automatic load lock for quick
specimen transfer
The NanoMill system features a load lock for
rapid specimen exchange. The specimen holder isconnected to the end of a conventional transferrod. After the load lock door is closed and theload lock is evacuated, an automatic gate valve
opens and the specimen holder is manuallyinserted into the specimen stage using thetransfer rod.

PLASMA CLEANING
Following the NanoMilling process,Fischione highly recommends thatyou plasma clean the specimen andspecimen holder.
SM

During fine-probe microanalysis,organic contamination may build up
on the specimen. A 10 seconds to 2
minutes cleaning time in the FischioneModel 1020 Plasma Cleaner orModel 1070 NanoClean removes
the contamination without altering thespecimen’s structure or composition.
Longer cleaning times can remove
contamination spots caused byprevious TEM viewing of specimensthat were not plasma cleaned.

5M O D E L 10 4 0 N a n o M il l ® T E M S p e cim e n Pre p a ra t io n Sys t e mNanoMill® TEM specimen preparation
system specimen exchange port with load
lock door open.

You can observe the specimen holder througha viewing window during transfer to and fromthe specimen stage. A chamber light facilitates
the transfer process. Once closed, the gate valve
prevents light from entering the chamber andaffecting the SED signal. After the load lock isvented, the specimen can be rapidly transferred to
the TEM, thus reducing specimen contaminationfrom ambient conditions.

Precise angle adjustment
The impingement angle of the ion beam isprogrammable from ‒12° (glancing incidence) to+30°. The ion source is fixed in position and thespecimen stage tilts to achieve the programmed
milling angle that is set through the Main tab.
The ion beam can be simultaneously targeted atboth specimen surfaces when the angle is set to 0°.
The angle can also be set so that the ion beam isdirected at either specimen surface.
Milling operations at low angles of incidence(less than 10°) minimizes irradiation damage
and specimen heating. Because low-angle
milling facilitates the uniform thinning of
dissimilar materials, it is highly beneficial when
preparing layered or composite materials, as wellas conventionally prepared cross-section TEM(XTEM) specimens.

Specimen position control
The NanoMill system is ideally suited for
preparing specimens from heterogeneous or layeredmaterials. Its specimen holder and stage make iteasy to position the specimen for optimal milling.
E.A. FISCHIONE INSTRUMENTS, INC.

Integrated specimen cooling
Although milling at low angles and ion beamenergies reduces specimen heating, temperaturesensitive specimens may require further cooling.
Liquid nitrogen cooling of the specimen stage
is very effective in eliminating heat-inducedartifacts.
The cryogenic cooling system is highly efficient;initial cool down of the system takes only 20
minutes. When the stage is precooled, thespecimen reaches cryogenic temperature in lessthan 5 minutes of insertion.
The cooling system features an integral dewarthat is interlocked through the NanoMill
system’s advanced control. Specimen stage
temperatures to ‒170 °C are common. Dewar
hold time is 4 to 6 hours, depending on
operating conditions. Stage temperature isdisplayed on the Main tab.
At the conclusion of the NanoMilling process
at cryogenic temperatures, the transfer rod isused to retrieve the specimen holder from thespecimen stage and position it in the load lock.
To avoid specimen contamination, an integral
heater automatically raises the specimen holder
temperature to 20 °C before venting.
In addition, a thermal safeguard can be
programmed to a specific temperature at which
the ion source will be automatically deactivated.
This is particularly beneficial if the liquid
nitrogen in the dewar becomes depleted and arise in specimen temperature is intolerable.
6M O D E L 10 4 0 N a n o M il l ® T E M S p e cim e n Pre p a ra t io n Sys t e m

Process termination
In addition to temperature-based process termination, theNanoMilling process can be automatically stopped at a
programmed elapsed time.
Following termination by either time or temperature, the specimen
holder remains in the specimen stage under vacuum until you
extract it and move it into the load lock for subsequent venting andtransfer to the TEM. At any time during milling, you can manuallystop the process.

Vacuum chamber
The chamber, in combination with the turbomolecular drag pump,provides a hydrocarbon-free specimen environment for effective
processing. In addition, it allows the ion source to be positioned
in an orientation that creates ideal ion beam properties at thespecimen. Because the processing chamber is under constantvacuum, milling can begin almost immediately after specimen
insertion.

Model 190 Cryo-Can

To further enhance vacuum integrity, the optional Fischione Model
190 Cryo-Can can be connected to the load lock. Once it is filledwith liquid nitrogen, contaminants condense onto the cold surface
of its inner vessel. Removing the cold vessel eliminates the trapped
contamination from the NanoMill system chamber.
A spare port on the chamber is ideally suited for connecting a
residual gas analyzer to the NanoMill system.

Minimal maintenanceAll system components are easily accessible for service. The ion
source is designed for both long component life and extended
maintenance intervals. When needed, the filament can be readily
replaced. Password-protected diagnostic software allows complete
control over all instrument functions.

E.A. Fischione Instruments, Inc.
9003 Corporate Circle
Export, PA 15632 USA
Tel: +1 724.325.5444
Fax: +1 724.325.5443
info@fischione.com
www.fischione.com©2013 E.A. Fischione Instruments, Inc. All rights reserved.
NanoMill is a registered trademark of E.A. Fischione Instruments, Inc.
NanoMilling is a service mark of E.A. Fischione Instruments, Inc. Allother trademarks are the property of their respective owners.
The NanoMill system is the subject of United States patent numbers
7,132,673 and 7,504,623. Other patents pending.
Document Number PB1040 Revision 01 09/2013