October 26, 2012

Additional Program (Late News Paper Program)Oral Session
31B-2:Nanostructure
Engineered Devices

Poster Session
1P-7: 15:40-17:40 Poster Session I
Lithography and Metrology

31B-2-5L 14:50
Direct Fabrication of WxCy SNS
Josephson Junction by Using
Focused-ion-beam
ChemicalVapor Deposition

1P-7-106L
ElectronBeam
Current
DependenceofSurface
Potential Distribution at a Resist
Film

J. Dai 1,2, K. Onomitsu 2, R.
Kometani 1, Y. Krockenberger 2, H.
Yamaguchi 2, S. Ishihara 1 and S.
Warisawa 1, 1 Univ. of Tokyo and 2

A. Osada, M. Otani, K. Kumagai and
M. Kotera, Osaka Inst. of Technol.,Japan

2P-11: 14:40-16:40 Poster Session IINanocarbons

Nanofabrication

2P-11-114L
2P-11-115L
2P-11-116L
2P-11-117L
2P-11-118LofAu
Nanoparticle Direct
Plasma-oxidized Al2O3 for Gate Position-controlled
Direct Highly Sensitive Biosensors RoleEB
PatterningofDielectrics in Graphene Field Graphene Synthesis on SiO2 Based on Fragment-modified Decoration on Cross-linked WO 3 Functional Oxide Mask on NonGraphene FET
Effect Transistors
Surface by Laser Irradiation
Nanodomes for Selective Gas plant Surfaces Applied for GaAs
Nanostructures
Sensing
G.-H. Park, M.-H. Jung, S. Inomata, K. Koshida, K. Gumi, Y. Ohno, K. S. Okamoto, T. Ikuta, S. Zaifuddin, Y.-S. Shim 1,2, H.G. Moon 1, D.H. Y. Matsuoka, K. Ashida and T.
H. Fukidome, T. Suemitsu, T. Otsuji Maehashi, K. Inoue and K. Y. Ohno, K. Maehashi, K. Inoue and Kim 1, H.W. Jang 3, Y.S. Yoon 2, 1 Kaneko, Kwansei Gakuin Univ.,
K. Matsumoto, Osaka Univ., Japan KIST , 2 Yonsei Univ. and 3 Seoul Japanand M. Suemitsu, Tohoku Univ., Matsumoto, Osaka Univ., Japan
Natl. Univ., Korea
JapanNanomaterials

BioMEMS, Lab on a Chip

2P-11-119L
2P-11-120L
2P-11-121L
2P-11-122L
2P-11-123Lof
Hydrophilic
Sensor Application Based on A
Microstructure-embedded Fabrication
Hydrothermal Synthesis andPhotophysical Properties ofCVD-synthesized Graphene
Microfluidic Chip for Continuous Polydimethylsiloxane (PDMS)Electrochemical
Europium doped Ceramics
Sample Separating Applications with Wrinkled Surface
Characterization of TiO2(B)Nanoparticles in Bio/medicalPolymer Matrix
Nanosheets for Battery
A liWuti1, M.H. Hon 1, C.Y. Kuan 1 S. Abe 1, Y. Hamba 1, S. Yamagata S. Zaifuddin 1, S. Okamoto 1, Y. S.K. Hsiung 1, R.C. Lin 1, H.C. D.K. Lee, C.K. Oh, and O.C.
H.Y.
and I.C. Leu 2, 1 National Cheng
Kung Univ. and 2 Natl. Univ. ofTainan, Taiwan1, M. Uo 2, J. Iida 1, T. Kiba 1, A.
Ohno 1, T. Ikuta 1, K. Maehashi Lee 2, Y.F. Chen 3, C.T. Wu 3 Jeong, Inje Univ, Korea
Murayama 1 and F. Watari 1, 11, M. Miyake 1,2 and K. and C.H. Lin 2, 1 Fooyin Univ., 2Hokkaido Univ. and 2 Tokyo MedicalMatsumoto 1, 1 Osaka Univ. Natl. SunYat-Sen Univ. and 3and Dental Univ., Japanand 2 AIXTRON, Japan

Gene Target Technol., TaiwanMicrosystem Technology and MEMS
2P-11-124L
2P-11-125L
2P-11-126L
2P-11-127L
2P-11-128L
SupportingStructure Dry Etching of Quartz Glass Design and Fabrication of Tip Fabrication of High Resolution High-responsivity WavelengthTactile Sensor Using Through- selective
Gate/body-tied
Optimization
foraHigh- using C4F8/He Plasmas for attached MEMS Test Socket
Si-via Technology
MOSFET-type
Photodetector
Frequency Quartz Resonator
Microtrenches with Photoresist
with Metal-gratingand Metal Mask
J. Ji, H. Ohigawa, M. Zhao and H. Y.-H. Tang, M.-J. Huang and M.-H. J.M. Lee 1, S.W. Kim 1, J.W. Nam H. Yokoyama 1, M. Sohgawa 1, T. S.-H. Jo 1, H.H. Lee 1, M. Bae 1, J.
Yu, T. Ueda, Waseda Univ., Japan Shiao, Natl. Applied Res. Labs., 2, B.H. Kim 3, C.S. Cho 4 and H.S. Kanashima 1, M. Okuyama 1 and H. Choi 1, J. Ahn 1, S. Kim 1, H.-K. Lyu
TaiwanChoi 1, 1 DGIST, Korea, 2 Noma 2, 1 Osaka Univ. and 2 2 and J.-K. Shin 1, 1 Kyungpook
CoreMEMS, USA, 3 Catholic Univ. Advanced Telecommunications Res. Natl. Univ. and 2 Daegu-Gyeongbuk
of Daegu and 4 Kyungpook Natl. Inst. Internatl., Japan
Inst. of Sci. and Technol., Korea
Univ., Korea
Kyungpook Natl. Univ. and 2 DaeguGyeongbuk Inst. of Sci. andWithdrawn List
Lithography and Metrology
1P-7-2 Withdrawn

Lithography and Metrology
1P-7-8 Withdrawn

Generation and Transport ofPhase
DefectPrintability
Volatile Metal Hydrides in EUVL Prediction
using
EUV
upon Atomic Hydrogen
Microscope Technique
E Ugur 1,2, A.J. Storm1, R. Verberk T. Terasawa 1, T. Amano 1, O. SugaD.
1, J.C. Brouwer 2 and W.G. Sloof 2, 1, Y. Arisawa 1, T. Yamane 1, H.
1 TNO Sci. & Industry and 2 Delft
Watanabe 1 and M. Toyoda 2, 1
University of Technol., The
EIDEC and 2 Tohoku Univ., Japan
Netherlands

2C-8: Nanomaterials III
2C-8-1 Withdrawn

2C-9: Nanomaterials IV
2C-9-4 Withdrawn

9:00
11:35
Efficiency
Controlof Manipulation of the Optical Spin
Fluorescence
Resonance Injection in a Precisely Chosen
Energy Transfer FRET from Composition of Magnetic/nonProtein
Donors-to- magnetic Hybrid Structure
semiconductor CdS Quantum

M. Ghali, Kafrelsheikh Univ., Egypt

M. Ghali, Kafrelsheikh Univ., Egypt

Nanodevices
2P-11-24 Withdrawn

Nanodevices
2P-11-29 Withdrawn

Microsystem Technology and MEMS
BioMEMS, Lab on a Chip
2P-11-122L Withdrawn
2P-11-109 Withdrawn
Cd-free Color Tunable I-II-VI High Selective Etching of Si/Si1- AMicrostructure-embedded A High-efficiency Beam Splitter
Semiconductor NCs for Color xGex in Inductively Coupled Microfluidic Chip for Continuous of a Double-groove Blazed
Convertor in white Led
PlasmaSample Separating Applications Grating using Ultra-precision
Manufacturing

W. Chung, H.C. Jung, C.H. Lee and A. Rubin, King Abdullah Univ. of Sci. S.K. Hsiung 1, R.C. Lin 1, H.C. Lee
S.H. Kim, Korea Univ., Koreaand Technol., Saudi Arabia
2, Y.F. Chen 3, C.T. Wu 3 and C.H. J.-H. Hsu 1, C.-H. Lee 2 and R.
Lin 2, 1 Fooyin Univ., 2 Natl. Chen 1, 1 Natl. Tsing Hua Univ. andSunYat-Sen Univ. and 3 Gene 2 Feng Chia Univ., Taiwan
Target Technol., Taiwan