1Interviews

Interview of Professor Herbert Gleiter, Institut of Nanotechnologie,
Forschungszentrum Karlsruhe & International Advisory Board,
WPI-AIMR“Enjoy free discussion with imagination”---Curiosity is the root of science--Prof. Komatsu (K): Please start with what sort of family or where you were born andyour childhood.
Prof. Herbert Gleiter (G): Well, I grew up in Stuttgart which is located in the southernpart of Germany.
K: Stuttgart? A very big city.
G: Well, not on a Japanese scale. About half a million or three-quarters of a million
citizens ie. smaller than Sendai.
Concerning my background, one can find two groups of people in my family. One
was a management-type background. For example, my father was a manager of a bank.
This is the one side. And then some of my relatives had a science or an engineering
background. In fact, a unit is named by one of my forefathers. As you probably know,
if one produce wine, one starts with the sweet juice from grapes. He noticed that bymeasuring the sugar content of the juice of the grapes, one can predict the alcohol
content of the wine. His name was Oechsle. Today, the sugar content of the grape juice
is measured in degrees Oechsle. He was my grand-grandfather.
If one goes through the generations, one can find people doing more business-typethings and then others involved in science. In fact, my brother for example is a
professor at the University of Heidelberg. He is in chemistry. Not far away from what I
am doing. My son is not in science.
K: That’s interesting.
G: Yes. In my case I can say that I was strongly coined by the people I met as a student.
I studied at the University of Stuttgart and received my Diploma Thesis as well as my
Ph.D. Thesis at the Max Planck Institute for Metals Research at Stuttgart. There I
worked with Professors Koester, Seeger, Dehlinger and Hornbogen. These colleagues
had certainly a strong influence on my education.
K: Very famous colleagues.
G: Yes. If you look at my CV, you will notice that I studied first mechanicalengineering, and I finished mechanical engineering with the Diploma degree. During
my studies as a mechanical engineer, I discovered that this field covers my interests5

only partially. I was more interested in questions closely related to physics. This was
the motivation for me study subsequently physics. I obtained my Ph.D. in physics.
First I thought studying two fields was a loss of time. However, later in my life,
when I became one of the presidents of the Research Center at Karlsruhe – one of thetwo largest National Laboratories of Germany - I discovered that my two backgrounds
in mechanical engineering as well as in physics were most useful. As a president of a
research center with a size of several thousand people, one is faced not only withquestions related to science but also with management or economic aspects. These
aspects are better covered by an engineering education than by an education in physics.
K: But before you focused on your target of study, how did you get your interest inengineering or science when you were a boy?
G: Essentially it was the people I met when I was a student. I met several people who
impressed me, for example, Professor Dehlinger was one of them, or Professor
Hornbogen or Seeger or Koester. Professor Koester was the director of the Max Planck
Institute of Metal Research at Stuttgart at that time. And it was by this background, thispersonal contact, that got me interested in the field of materials science and solid statephysics.
K: Why did you choose physics or science instead of literature?
G: It was the way of thinking in physics. Actually, I noticed this preference alreadywhen I was in school.
K: Even in childhood?
G: Even in childhood. In fact, together with my brother we performed experiments inphysics and chemistry.
K: You were influenced by your brother?
G: We both did these experiments together. We had to buy chemicals, instruments,
equipment etc. and then tried to perform the planned experiments together. And I still
can remember when we did one of these experiments. My father and my mother had to
be off at a business meeting of my father. We used that opportunity for someexperiments. Something went wrong and we started a fire. After a short while one of
the curtains started to burn. At that moment my parents returned. You can imagine
their reaction. They stopped us for a while with our experiments.
K: We are interested in such things.
G: It was this experience to see something to happen and being able to understand it.
For example, if there is a chemical reaction, to understand why it exists.
K: It’s very funny. That famous Richard Feynman also had the same experience.
G: It’s a strange thing, indeed. It’s irrational but it seems to be part of our personality

6and it was this experience that triggered my interest in the field. Sometimes in school, I
had some problems with this facet of my personality. I openly said, in which fields I
was most interested in and also made it clear what areas were of minor interest to me.
Unfortunately, some of my teachers, in humanities, for example, were very influential,
and they didn’t like this kind of attitude. However, finally I got my “abitur” degree thatallowed me to enter university.
Clearly, for me the driving force to work was primarily curiosity and interest. The
same applied to my activities during my university education. I was interested in a
subject or I was excited by people who represented a field. I had the same experience
later when I was a post-doctoral fellow at Harvard and at MIT. There were people like
Bloembergen, Cahn, Orowan, Argon, Turnbull or Chalmers.
K: You’ve been to Harvard after graduation?
G: I’ve been at Harvard, first for three years and then one year at MIT.
K: Orowan and Turnbull were there?
G: Yes, they were there. Turnbull’s office was very close to mine.
So I knew all of them. Chalmers was there as well. It was important for me to talk tothese people and discuss with them what I was doing. Also to see what they areinterested in. Every day after lunch we had a coffee break. Most of the members of thefaculty attended. And then one could talk about what one was interested in. And they
told us what they were doing or planning.
K: Every day?
G: Every day.
K: After lunch together? That was very nice.
G: I think that was the most important time of the day, at least for me. You can go tolectures everywhere. However, talking personally to people and also getting their
response when you have an idea, this is what you cannot get at a conference.
K: A very informal way?
G: Yes, very informal.
K: Anything you could ask and discuss.
G: Yes, anything. Many years later, when I became a professor at a university, I used
to have the same tea break after lunch. When I left university and went to Karlsruhe, asa president of the Karlsruhe Research Center, I asked about 20 of my former students(who had become professors when I asked them) what they would consider as the mostimportant factor in their education. They all told me that it was the tea break after lunch.
We sat together and we talked about the things we were doing or planning.
K: That is the same idea I have. In England I learned how important tea time is.

7

G: It’s a very important portion of education. One is relaxed and one can talk openly.
And also, I noticed that some students did not speak up. This is frequently a sign thatsomething goes wrong. Some are shy if they have problems and hence they would not
speak to you. However, by watching them one can find out if something may be wrong.
If a student doesn’t participate in the conversation then that may be a signal that you
better talk to him or her. On the other hand, at an official presentation e.g. at aconference, he or she would sit quietly and one would never notice that they may have aproblem.
Another aspect is that the relationships that originate from that time last over many
decades. Even today, when I need some information or some help, I can just call former
students in the States or anywhere else and they tell me honestly what they know. So
this human aspect is very important in science as well.
K: Yes, it is.
G: I think it was Heisenberg who said we should always keep in mind that science isdone by people. Science is not independent of people.
K: It’s very deeply rooted.
G: Yes. Science and scientists are intimately related.
K: Yes, yes, indeed.
G: I think this is what is often overlooked by people in politics.
K: That’s right. They don’t know.
G: I mean, research plans and programs are all meaningless, unless you have the rightpeople.
K: Politicians often know only the final result.
G: That is true. And that was also my view, when I started the new institute called“Institute of New Materials” at Saarbrucken and later the “Institute of Nanotechnology”
at the Research Center Karlsruhe. I always tried to build the institutes around thepeople. At Karlsruhe, initially we had eight people. They knew each other alreadybefore the institute was founded. The idea of that institute was to form a research
institute bringing together scientists who have a background in physics or chemistry or
engineering either in theory or in experiment. All of them had already an institute at auniversity. What I did was nothing else but bringing them together and providing themwith additional money, additional space, and additional positions. In other words, we
provided them with the means to pick up new ideas or to form new co-operations.
K: Different specialties.
G: Yes.
K: Interdisciplinary discussion and co-operations among colleagues.

8

G: Yes, this is what it was.
K: This is very productive.
G: And they had plenty of opportunities to talk to each other and to the students. We
were very fortunate that we found for the Institute of Nanotechnology a Nobel Prizewinner and four Leibniz Prize-winners. Having outstanding scientists in such an
institute is important in several respects. First of all for the reputation of the institute.
However, also for the students. They can see that famous people also are not protectedfrom making mistakes. This is very important. If a student makes a mistake, he should
not think that he is stupid and the professor is wise.
K: Yes, human beings.
G: We are all human beings and everybody is allowed to make mistakes.
K: Yes, so they can discuss openly.
G: Yes, yes. And ask good questions.
K: Yes, that’s right.
G: I think this is important. Because when one is a student, in the beginning one only
reads textbooks and everything is clear. Then one starts doing research and soon one
discovers that one keeps making mistakes. As a result, one has the feeling - at least I
had the feeling – that I am stupid and everybody else never makes mistakes. Naturally,
later on one discovers all the other people make mistakes as well. It’s only that somepeople occasionally are very successful, and this is what counts.
K: Yes, yes.
G: History of science teaches us that the mistakes a scientist made are forgotten. He
will be remembered for the important contributions he made. This seems to be an
important observation we should teach to the student. In fact, mistakes are sometimes
necessary to open the way to progress. And that’s why - when I had to teach at theuniversities - I copied papers from famous people where famous people said somethingthat turned out to be wrong, and also how they found out later that it was wrong. I

9handed out those publications to the students. A famous person can also make mistakes,
but that’s not important because later on he/she did something which was important andfor that publication we know him/her. So don’t be afraid of making mistakes. Do nothesitate to try something risky. If you fail it doesn’t matter. It’s far better than nottrying.
K: That’s right. It just also happened to Prof. Yukawa who won the Nobel Prize for the
first time in Japan. After he won the Nobel Prize he became a director at a theoreticalinstitute. He had a lot of serious, silly questions and the students were surprised thatsuch a Nobel Prize man is asking such very silly questions.
G: Asking silly questions is okay.
K: We don’t mind.
G: Yes, exactly. That’s the way you get going. I mean, if you look at many discoveries,
they started with silly questions.
K: Yes. And imagination is also very important.
G: Yes. And I remember when I started to pioneer nanocrystalline materials, this work
started by asking the following straightforward question. Conventional polycrystalline
materials consist of crystals with a diameter of e.g. a micron up to many millimeters.
These crystals are connected by interfaces with a thickness of a nanometer or so. In
other words, the volume fraction of the interfaces is negligible in comparison to thevolume fraction of the crystals. My work leading to nanocrystalline materials started
when, I turned the situation upside down and asked the question: What kind of material
do we get if we create a solid with comparable volume fractions of interfaces andcrystals? In order to get this kind of structure, we had to reduce the size of the crystals
to a few nanometers i.e. a few interatomic spacings. We tried it in various ways andafter a short time it worked all right. When we had this new class of materials, westarted to study them. After we had our first results, I gave a talk about them. I think it
was at a special event of the German Metal Society. In this first talk, I explained thebasic idea and what we knew already about this new class of materials. After I finished
my presentation, the president of the German Metal Society got up and said very loud:
he is all crazy, such things do not exist. All I could do was to remind him that we havesuch materials already and that they are fairly stable.
But even if the speculation about the structure and the properties of these newmaterials would have been wrong, at least it would have been worth to try to generatethem. And that was something that I have learned from Dave Turnbull. If one had anidea and explained it to Dave Turnbull, Turnbull thought about it, then he came back thenext day or so and said, this portion of your idea, I think, is correct and this portion10

seem wrong - why don’t you think again about this kind of thing? He never said, don’t
do it.
K: A very good man.
G: Yes I admired Turnbull.
K: There are so many eminent scientists under his guidance.
G: Often it is worth to try something. And one discovers that things work out instrange ways.
I think for a student it’s important to be encouraged. He should realize that he isyounger but he should never have the feeling that he is inferior. Quite often people
believe that a famous man only poses very good questions or is very wise. This is all
nonsense. He also makes mistakes.
And I think it is often the media which generate the impression e.g. if somebody is aNobel Prize-winner, all of a sudden he makes no more mistakes.
K: That is not possible.
K: Your work as a student was on nanocrystalline materials?
G: No. When I studied physics at Stuttgart at the Max Planck Institute I performedsome theoretical work during my Ph.D., and some studies by electron microscopy tocheck if the theory was correct.
K: You did both theoretical and experimental work.
G: Experiments during my Diploma Thesis. The Diploma Thesis was experimental and
the Ph.D. was mostly theoretical work on dislocation theory and the interaction of
dislocations with precipitates. This work brought me to the States, because I did thiswork at a time when dislocation theory became available and people knew empirically
about what is called today superalloys. These nickel-based materials were usedfrequently at that time e.g for turbine blades of jet engines. However, it was not fully
understood why these materials have high strength at high temperatures. By applying
electron microscopy we could see the dislocations and we could see the precipitates aswell. This opened the way to study the interaction between the dislocations and theprecipitates, and that knowledge allowed us to understand and even predict theproperties of these alloys and optimizing their properties. And that’s the way I got toknow other people like Bernie Kear. He was at that time a director at the researchlaboratory of Pratt-Whitney. Pratt-Whitney was a company that was building jet
engines. He became interested in my work on precipitate hardened alloys and invited
me to the States.
K: That was in nineteen sixty-something?
G: That was in ‘67.

11

K: When I went to Bristol in 1965 there was Dr. Thompson who is known for example
by the “Thompson tetrahedron.”
G: Yes, of course.
K: The good old days.
G: So you must have also met Frank, Charles Frank.
K: Of course. Every day I met him at tea time.
G: Yes.
K: Frank was quite a character and he was fond of looking at photographs taken byphase contrast microscopy to observe the very small steps of the surface.
G: That was at the time when Frank was interested in diamond?
K: Yes. And he often looked at a picture for one hour or so, just saying nothing. Quitea remarkable man.
G: I had a similar experience with Dave Turnbull. I can remember there was once
somebody who gave a talk at Harvard. In this talk he criticized Turnbull very badly,
and Turnbull was sitting there and he said nothing. Later I asked him, Dave, why didn’t
you say anything? He said, well, if he is correct, there is no point in saying something,and if he’s not correct, it will turn out anyway. I learned a lot from Turnbull.
K: Very interesting.
G: Yes. Chalmers was totally different. He was more outspoken. If he didn’t likesomething, he expressed it very frankly. He had no problem in saying openly: what one
just explained does not seem to him to be correct, and he then walked away. In fact, I
can remember one such case. We had a visitor. He came—I think from Russia—andBruce Chalmers was standing together with him and me. The visitor told us what he did,and then we talked about it again and he apparently had told us things twice. All of asudden Chalmers walked away without saying anything. Later I asked him, “Bruce,
why did you walk away? That wasn’t too polite.” He said, “Well, if he tells me things
twice, he must think that I am stupid.”
K: I see. So two famous professors, Chalmers and Turnbull. In the same department?
G: They were in the same department, right next to each other. And at MIT it was
Orowan. You probably know him because he was one of the scientists who discovered
the dislocation.
K: Orowan, yes. He proposed the edge dislocation.
G: Yes. What was his background?
K: He had a technically oriented background; different from physics.
G: Yes, that’s right. He was an engineer and he worked at Berlin. He told me how hecame from Hungary to Germany.

12

K: Oh, yes.
G: And he worked at the Kaiser Wilhelm Institute at Berlin, and that’s where heperformed studies on plastic deformation. In one of our many meetings after lunch ordinner, he told me how he discovered the dislocation. He dropped a crystal and henoticed the slip lines and found out that these lines represented step at the surface. Thisobservation made him think how that could happen. He then tried what happens if one
shears a regular arrangement of elastically deformable spheres. In fact, he noticed thatlayers of these spheres do not ride simultaneously above one another. They shift bymoving one row of spheres at a time. These observations were essential for him topropose the idea of a dislocation.
K: He’s in a way a self-made person, learning by himself a lot.
G: Yes. That’s right. He was one of the most brilliant and broadminded people I havemet. At the same time he was very outspoken. He either liked a person or he didn’t likehim. If he didn’t like a person, he didn’t talk to him. It was a strange thing. But he wasa very special person in the sense that he had a broad background. Of course, he knewthat I came from Germany. We had plenty of time to sit together. He told me about his
experience in Germany and in England. He also explained why he left England again
and went to MIT. At the time when I met him, he was interested in economy.
K: Oh really?
G: Yes. When I told him what I was doing, he listened to it, but
his main interest was economy at that time. He thought that it
would be possible for him to contribute something of basic
importance to economy. He thought that in physics many
problems were already solved, and so he preferred to go into
economy. Some of his colleagues had either a very positive
opinion about him or a negative one. The way he approachedpeople was different from the conventional way. In addition to Prof. Orowan, there wasanother impressive scientist at MIT. You might know him. It was John Cahn.
K: I met him. He visited Tohoku University.
G: I see.
K: In which department was he?
G: He was in the Materials Science Department.
G: He was for many years at MIT. And then he went on to NIST, National Institute ofStandards at Washington. He’s now retired and lives in the State of Washington.
K: Is he still alive?
G: Yes, he still is alive. A very active person. I met him recently at a conference

13organized by the National Academy of Engineering.
K: And he put forward a theory about crystal growth from the melt.
G: Yes, that’s one of the contributions he made. Of course everybody knows his
important contributions to our understanding of spinodal decomposition, to theunderstanding of surface tension and to the stability of interfaces.
K: Yes, that’s right. We tried to prove his theory by our experiments.
G: Yes. He was an exciting man to talk to. He had a very broad background. He wasalso born in German and his family had to leave Germany. Sometimes people confuse
him with Robert Cahn in England.
K: He lived in Sussex.
G: Yes, he lived for many years in Sussex. He visited in the 80’s and 90’s quite often
my institutes at Saarbruecken and at Karlsruhe respectively. We had many common
interests and hence we developed a close relationship.
K: I see. He also visited the INM (Institute of New Materials)?
G: Right.
K: And we had a close relationship with him.
G: Robert Cahn made important contributions to the understanding of recovery andrecrystallization. Moreover, he is one of the editors of the famous textbook on physicalmetallurgy
K: Oh yes.
G: Three volumes.
K: Physical metallurgy?
G: Right. That was Robert Cahn. He knew a lot of literature. Often, when I had a newidea, I sent it to Robert and got his comments. I had a similar experience with Orowan.
When I told Orowan about a new idea, he sometimes quoted people from the 18th
century. You know, he knew old portions of the literature, I was not aware of.
K: He knew historical things.
G: Yes.
K: Arts as well. He was a very broad person.
G: Very broad, yes, very impressive. And he had often a very special view and opinion.
He had his own way of thinking and of looking at things, and I learned a lot from him.
K: He wrote his autobiography and it was translated by a friend of mine into Japanese.
G: Ah, that reflects him.
K: Very interesting.
G: Oh, I gained a lot from all of these people.
K: So the people you are talking about are quite familiar for me, from 30 or 40 years

14

ago.
G: Yes, now I’m getting older.
K: We are all getting older.
G: Yes. But there is one thing I learned from this experience: science is not decoupledfrom people. It depends very strongly on to whom you talk. In a way, it’s like aresonance effect. You have to talk to the right person at the right time in order to get the
information or the stimulation you need to develop a new idea.
K: Actually, one of the purposes of this interview is to show that a scientist is not aunique person. A scientist is a very human being.
G: Yes. Heisenberg emphasized that science is done by people; never forget that.
K: Really? He said so?
G: Yes, Heisenberg, many times emphasized that. Science couples to people and iscoined by people. This insight also comes up in the so called Harnack principle of the
Max Planck Society. The Max Planck Society tries to build an institute around theperson and never have a structure and try to find a person that fits into in the structure.
And I think that was very successful.
K: I see.
G: Unless you have such a person that coins a field it is hard to create a world classinstitute.
K: The building itself is only the house to provide the research conditions an
outstanding scientist needs.
G: Yes. They try to get excellent people. Often, they close an institute once the person
dies or retires.
K: They keep their things.
G: This is what many politicians cannot understand. It’s not the structure, it is the
person that is most important. The structure is necessary but not sufficient. You need a
special person.
K: They cannot see. The action of scientists cannot be seen from outside, so politicians
don’t know what scientists are thinking and doing.
G: Yes. In fact it is the same thing I noticed, at the time, when I was at Harvard. Atthat time X-ray studies on the structure of DNA were performed. Collaborators of
Watson and Crick used our x-ray facilities, and again, it was the people who were mostimportant. It was not the X-ray instrument. Naturally, concerning the equipment, theexperiments could have been carried out somewhere else. It was this group of people
that did the work.
K: Very interesting.

15

G: This is what I think young people should keep in mind.
K: Yes, indeed. So perhaps next, let’s go to the exciting findings.
G: Yes, this was the nanocrystalline material. I think we have nowadays several
thousand publications a year on these materials. I’m often asked, why did you do this?
And people always imply—or at least, people who are more outside of science—that it
was the idea to make something useful. This is not true. It was just curiosity.
K: Curiosity. That’s very important.
G: Yes. I was working on interfaces. We studied them by taking two big crystals andhad one interface between them. This work was partially performed during my time atHarvard. When I went back to Germany, I thought about the question: what would
happen if we introduce more and more interfaces into a crystals?
K: So, this was purely out of curiosity.
G: Pure curiosity. Yes. In order to get more and more interfaces into crystals, we madethe crystals smaller and smaller. Finally we arrived at a size of the crystals of a few
nanometers. In other words, our crystals consisted of relatively few atoms only.
K: And how could you make it so small?
G: Well, we made it by a technique which I learned in Greenland. When I was astudent I went to Greenland, on the inland ice cap. And when one looks at a thin sliceof this ice in the light microscope, one can see that inside of the ice there are numerous
very tiny dust crystals which came down from the atmosphere together with the snowthat formed the ice. These tiny crystals are embedded in the ice. Of cause, thesecrystals cannot grow because they are surrounded by the ice.
So, we utilized the same structure, I have seen in Greenland to produce thenanometer-sized crystals which we needed to get the large volume fraction of interfaces
in our material. Our equipment consisted of a bell jar with a cold metallic plate insideof the jar. Water vapor was leaked into the jar. This water vapor formed a thin layer of
ice on the cold plate. Then we started to evaporate gold inside of the jar, the goldcondensed in the form of nanometer-sized crystals on the ice. These tiny gold crystals
got frozen into the ice. So in the end, we had ice which was black. It was black
because it contained many tiny gold crystals. Finally, we sublimated the ice, collected
the gold crystals, and consolidated them at pressures of several Gigapascals. This was
the way how we got the first nanocrystalline materials.
K: Very interesting.
G: But the idea how to produce them was from Greenland.
K: I see. Have you ever published this?
G: Yes, that was published.

16

K: How about your idea initiated by your time at Greenland?
G: No, I never mentioned it in a publication.
K: It often happens. For instance, Prof. Nakaya, who grew artificial snow crystals forthe first time in the world, he studied the shape of snow crystals and took many
beautiful pictures under the microscope, but nobody knows how he could manage to set
the snow crystals under the microscope. It was very simple. He put saliva on the tip ofa matchstick and fixed a snow crystal.
G: And you just take them off.
K: And he didn’t write it, so a lot of people asked, “How can you catch and set snow
crystals?” Nobody knows the secret.
G: From the outside it looks magic. Infact, it is not. However, this is how things oftenwork. Once we had this knowledge, it was easy to get these tiny crystals. Normally if
one produces crystals, they keep growing all the time. The same happened in our
experiments in the beginning. And then I recalled the tiny dust crystals in the ice ofGreenland. This opened the way to the nanocrystalline materials.
Very soon, some of our early equipment will be exhibited in the German Museum ofTechnology at Munich. This museum tries to collect and exhibit equipment that wasused in the past by people who are known today for their contributions to science and/or
technology such as, for example, the first gasoline car by Benz or Roentgen’s X-ray
equipment etc. The museum collects all these historic pieces of equipment, so thatpeople can see how discoveries are made. I think it is important that people see how
new ideas develop. Very often the picture of discoveries conveyed by the media to the
public deviates considerably from reality.
K: That museum must be very famous for science and technology.
G: It’s like the Science Museum at Chicago. However, it is probably larger in size andcertainly older. Hence, they had the opportunity to get the first light microscope, thefirst electron microscope from Ruska, or Lilienthal’s air glider etc.
K: Kept in that museum?
G: They keep it in the museum and they show it to people.
K: Oh, very interesting.
G: And they also have our first piece of equipment that was used by us to produce thefirst nanometer-sized gold crystals following the method I learned from the ice inGreenland. They are preparing at the moment an exhibition on Nanoscience andNanotechnology. This exhibition will open in November 2009. One section of thisexhibition will be on nanomaterials. In this section it will be explained that the driving
force for this development was curiosity. In this exhibition they will also show this17

funny looking piece of equipment, we had used in the beginning to produce tiny gold
crystal embedded in ice. This piece of equipment looks a bit like a Christmas tree.
As I explained already: what we used was an evacuated bell jar and a cold plate that was
kept at liquid nitrogen temperature inside of the jar. Into this bell jar we leaked water
vapor. The water vapor kept freezing onto the cold plate so that it turned white. Abovethe cold plate we had a vertical rotating stick with horizontal arms. From the ends ofthese arms we evaporated the gold from small tungsten boats. During the evaporation
process the stick with its arms kept rotating so that it looked somewhat like a rotating
Christmas tree
K: You made it.
G: We still have it and that will be shown there.
K: But a long time ago.
G: That was in 1975 or so.
K: I see.
G: Yes, that was the first approach to produce these nanocrystalline materials. And
some people came and saw it and they frequently asked us: what are you doing here?
I remember on of these visits when I was at the University of Saarbrucken. At thattime I was awarded the Leibniz Prize. The Leibniz Prize goes along with 5 million
euros of research funds. One of the attractive features of this prize is that you can use
these funds in whatever way you like without writing first proposals etc. After I wasawarded this prize, the minister of research visited our laboratory. When he saw thisrotating “Christmas tree”, he had a problem understanding that this could result in theaward of such a prize with such a high reputation.
K: Yes, that is very good for the younger generation to see.
G: Yes.
K: The initiation of new inventions.
G: And how things develop. Yes.
K: Yes, I how things are developed, yes.
G: They don’t develop like in the textbook.
K: No, not at all. The textbook is too purified and simplified.
G: I can remember, when I was one of the presidents of the Karlsruhe Research Center,I had to talk often to the Federal Minister of Research and Development. This minister
was a lady. She kept emphasizing that for good research you need first of all a network,and secondly, you need a research plan, and finally you have to define your researchgoals before you start.
I kept telling her, when Columbus took off for his first famous voyage, he had no18

network, he had no research plan, and he did not have the goal to sail to America. But
he brought something back.
K: Yes, he did.
G: That’s the difference.
K: Very good.
G: Yes, development is different from research. One can develop something, like
improving a car or designing some kind of equipment if one knows the underlying
physical principles. In order to do it, one can make a plan and one will be successful inmany cases. However, development a totally different thing from research. In research
one may discover something or one may fail. And apparently people who have more ofan administrative background, they don’t like this kind of uncertainty.
K: But uncertainty is the source of science.
G: That’s the only way we can do it. Yes.
K: There is no need for any kind of study if we understand things already.
G: This view is also supported by the results of the Leibniz Prize. The Leibniz Prizeexists now 25 years. Every year 10 scientists are selected from all fields of science toreceive the prize. When this prize existed 20 years, a study was made on theachievements of all the people who received the prize within these 20 years. The
achievements were evaluated by using generally accepted criteria of scientific quality
such as other prizes and awards received by the Leibniz Prize winners in the years after
they were awarded the prize, offers of directorships etc. at other institutes, the same
criteria as are used by the citation index, and five other criteria, such as the number ofNobel Prizes awarded in the subsequent years to the Leibniz Prize winners etc. These
criteria were normalized that per unit of money spent on research by the Leibniz Prizewinners in comparison to the research funds spent by individual proposals approved by
the German National Science Foundation (DFG) and also with group proposals
approved by the same institution.
This evaluation revealed that the Leibniz Prize (which requires no proposals, noresearch plan, and no network) resulted in about 20 times more results per unit ofmoney (measured in the above criteria) than by group proposals and about 10 times
more than by individual proposals. This result tells us something about funding
methods in science. It suggests, if we give a good scientist time and money, he/she will
try to be successful. Moreover, not a single one of the Leibniz Prize winners misused
the money. Not a single case! This teaches us that all this controlling by theadministrations may not be very useful in the sense that we get as much as possible forthe research funds we have spent. I am afraid the administration required to prevent the19very few cases of misuse is far more expensive than the money it saves. We should
accept that good scientists are interested in what they are doing and they are notinterested in misusing funds, at least in science and in engineering.
But this is something I think which is not so easy to understand for other people in
the administration, it seems.
K: Particularly politicians don’t understand it at all.
G: Scientists are a bit like monks. Aren’t they? They are interested in what they are
doing and not all in the public attention. It is unfortunate, that many people cannot
understand it.
K: It’s very interesting.
G: That’s why I always try to advocate this attitude in my function as one of the vicepresidents of the National Academy of Sciences of Germany. Give good people
freedom, don’t constrain them by administrative measures and you will get the
maximum output for your research funds.
K: That’s right.
G: We will get the more success the more freedom we give them. Unfortunately,
politicians hear the words but they cannot believe the message or they do not understandit. This view is supported by many of the big discoveries. They were not planned.
Consider as an example the discovery of the X-rays or of general relativity or ofquantum mechanics. In fact, I got recently interested in quantum mechanics. For thatreason, I read Planck’s original publication again. In doing so, I noticed that hementioned that the concept he proposed in his original publication is a model for
calculating the observed emission spectra. However, the underlying physics may bequite different. We still have to try to understand the physics behind Planck’s idea, as
was emphasized by Feynman.
K: One arrives at the same conclusion if one looks at the discovery/development of ourunderstanding of electricity or ferromagnetism. It was always curiosity.
G: It’s curiosity.
K: When Faraday published his results on electromagnetic induction, people asked,“What is the use of it?” And Faraday said, “Can you say to young people or a newlyborn baby, what he will be, what is his talent? Can you say that about this baby?”
G: Yes. You never know. However, one knows, that in the long run, without science
we will have no progress. And the funds we spent on science and technology correlatewith our standard of living. A high standard of living correlate with large amounts ofmoney spent on developing science and technology. That’s all we can predict. But wecannot say, I do this and that and tomorrow you will have a patent. This is nonsense.

20

K: Nonsense.
G: Yes. Moreover, life would be boring if it were so. As you know, it is curiosity whatmakes life interesting. In that sense, we are a very special class of people, I think.
K: A very, very good story. So the principle features in research have almost all beensaid.
G: Yes, I think so. In a way I was very fortunate because all my life I could do those
things I was most interested in. It’s of course a huge privilege. The salary was a kindof side product, if you wish. If I would have wanted a higher salary, I could have stayed
in engineering. As an engineer I could have joint a big company, and tried to become amanager or a president of a company. In that position I would have probably received ahigher salary than the one I was paid as a professor.
K: But you were interested in science itself.
G: Yes, for me the highest priority was my interest in science.
K: And doing science for your happiness.
G: Yes. And quite often, if one thinks about it, one doesn’t feel thatdoing science is work in the sense as it is defined by most people. As
you know, we are mostly “time-controlled.” It’s the time that limits
what we can do. Even if we would have more money, we could not domore things, because we would not have more time. Isn’t that true?
K: Yes, time is a limiting factor.
G: We only need so much money that the money does not constrain what we do.
However, this limit is mostly fulfilled if we earn say 100,000 € or so per year. Ten
million or a hundreds million euros would be meaningless in that sense; one can’t use it.
I never understood why people wanted to get a salary as high as that. These hugeamounts of money may even yield negative effects. They take our time away because
managing such amounts of money is a full time job.
K: That’s right.
G: Actually, it creates a lot of work, to manage a million or even a billion, doesn’t it?
So it’s a negative effect rather than a positive one, if one applies the above criteria.
K: I think it would be.
G: I think it’s true. All the countries with high standards of living spend considerable
funds on research. But the public is told by the media that we do research because wewant to earn high salaries. It’s a strange thing; in a way it couples into the structure andthe system of values of the society. In fact, the opposite seems to apply as well:countries that do not spend much on research and education, do not get out of poverty.
This is what you can see for example in Africa. As you probably know, Africa is a rich21

country if you consider their resources in raw materials and in people. They have land,
they have people, nevertheless the country remained poor so far. They spent little
money on education and research. Japan I think is an example for the opposite
development. After the Second World War, Japan developed at a remarkable pace.
They spent large amounts of money on research. And the Chinese people are now
doing the same thing.
However, if we point that out, it is always a bit provocative for the politicians. They
tell us: do you want to teach us how we should run a country? I keep saying it
occasionally in small committees. However it makes a difference if you say it under six
eyes or say it under 600 eyes. We have the responsibility for the institutions we
represent.
K: But science, a lot of science is very deep and needs a long history. For instance, thedevelopment of Japan—modern Japan—started more than 130 years ago when the Edo
era changed. They spent a lot of money just for education, reading books and counting
simple things. So the number of illiterate people in Japan became almost zero in the20th century. That was the background to develop modern science. So it took many
years and huge manpower to level up the education.
G: Yes. Today, the situation is, of course, different because the turnover time becamemuch shorter than it was say100 years ago. Nevertheless, the basic arguments and thebackground are still the same. For example, consider China. As you know, in ancient
China high education had always a high value. And it still does. When you go to theUnited States, the Chinese succeed very well. One reason seems to be that the families
offer their children a good education. Whereas, many of the people that live in slums,
do not realize or want to realize that one way out of the slum is education. Of course,
education goes along with hard work. I was reminded of this correlation when I was inSingapore recently. The Government of Singapore published a paper discussing what
distinguishes people in the United States who are successful from the people who are
not successful. What they found out is the following. If in a family education has a low
value, then their children have less success. The opposite applies as well. It’s not only
the background in knowledge. It is also the general attitude. And I think this is one o f
the reasons why Singapore does so well economically. Here education has a very highpriority.
K: And before the war in Japan, scientists or teachers were very much respected andpeople looked down on money.
G: Not anymore? Now their standing is changing? But still they have high respect,
don’t they?

22

K: Moderate respect to Science in modern Japan.
G: Yes. I think this is important, because it attracts young people to these fields.
Moreover, it helps to decouple interest from income. Income is one thing and interest is
another thing. And this respect is something which excites young people to dosomething. It’s not the money so much. There is a different attitude. Otherwise, you
end up with a country full of managers but there is little left to manage.
K: The time is almost up. So your message to the younger generation please.
G: The same as I said already: Do what you are most interested in and you will do it
best.
K: Yes. That’s what you’ve said, yes. Okay, almost finished. What sort of hobby doyou have?
G: Oh, that depends on my spare time. In recent years it’s sailing on the ocean.
K: Oh really. When did you start sailing?
G: I started to sail about 15 years ago. At that time on smaller lakes and then on bigger
and bigger ones and finally across the Atlantic and around Cape Horn.
K: The Atlantic Ocean? Oh!
G: When one has a good boat and if one knowshow to sail in bad weather, it’s not muchof a problem and it is a great experience. You get away from all the things of the daily
life. Secondly, you experience how priorities change. When you are on the land, allthese small problems are close to you. When you are out there the priorities change.
It’s a different world out there.
K: And your brain refreshes.
G: I think that’s important as well.
K: Reloaded.
G: Yes.
K: When you face the wide ocean, then you feel you are very tiny.
G: It’s beautiful. When you sail across the Atlantic, you sail several days and nights.
Before I started sailing on the open ocean, I did some other exciting trips. For example,
I crossed Africa with a Jeep from Maroco to South Africa. When I returned from mywork in the United States in order to accept a professorship in Germany, I bought
myself a car and went from New York to Panama. Shipped the car over to Equador andcontinued to the very tip of South America. On that trip, I had an opportunity to gowith a canoe along one of the tributaries of the Amazon River. This was a lasting
experience too.
K: How long usually do you spend sailing? How many days?
G: The longest trip was about three weeks out on the water. That was down from Spain

23

all the way to the Caribic. This trip was part of a Trans-Atlantic race. Another long tripof about three-and-a-half weeks was from the southern tip of South America over the
Drake Street to the ice shelf of the Antarctic and back. The distance is not long, but thewinds are occasionally very strong there, and the sea may become very rough. Waves
with a height of 6 meters are not uncommon. It’s quite an experience. If you are in it
you ask yourself: why did I do this? However, after the trip one realizes that it is aunique experience.
K: With how many persons?
G: It depends. When I go for smaller sailing trips, I usually go with two friends. One is
the former director of a University Hospital, and the other one owns the boat. It’s
located in a harbor in the Baltic Sea. It is a 42-foot Halberg yacht, a very comfortableboat. There we sail for two weeks or so.
K: Just ten meters long?
G: No. 42 foot is about 13 meters.
K: And for the ocean?
G: For the ocean, in particular when it’s rough seas it is comfortable to use a somewhat
bigger boat.
K: You used this boat for the Atlantic?
G: No, not this boat. However, a boat of similar size. For the Drake Street we had aboat with a steel hull. The size was about the same.
K: It must be very expensive.
G: Yes, to some extent. The owner of the boat we sail in the Baltic Sea is owned by aformer director of a company. He owns the boat and also he takes care of it. That’s his
hobby. He is an engineer, and for him one part of his sailing hobby is keeping the boat
in good condition.
I remember on one of the trips across the Atlantic, we had sometimes storms. So welost several sails, and in the end we had only one sail left when we came out on theother side. There’s not much you can do out on the open water. In particular, you
cannot go up the mast because the boat keeps tilting all the time. If a big wave comes,
you may fall into the water. In fact, during the Trans-Atlantic race, one skipper tried to
repair one of the sails. In order to do so, he was standing at the very front end of theboat. At that moment the wind turned around. The sail turned around as well and threw
him into the water. By the time they found him, he was dead. When the waves are high,you can’t see a person swimming in the water. Very soon he or she disappears between
the waves. On a flat water surface, it would be no problem to pick him/her up.
However, if the water is white due to a storm, he/she disappears very fast. So, one has

24to be careful out there.
Contrary to what many people
think, if one is on one of theseboats, it’s not more dangerous
than anywhere else. One isalways attached by a rope to theboat. So if something would
happen at least one could be
pulled back into the boat. In
other words, if you don’t make a
mistake it’s not dangerous. Most
important is that you have to avoid to panic. That’s the most important thing. Whenyou panic, you are in danger. In that sense it is a good training to keep control ofyourself.
K: You usually use ropes?
G: Yes, we always have a rope and we use it to attach ourselves to the boat. In fact, one
has two ropes. When you walk on the boat, you attach one of the ropes to the boat anddetach the other one and then attach this one and so on. So even if something
unforeseen happens, you are always attached at least by one rope.
K: So what do your friends in Germany say? Do they think it is dangerous?
G: Yes, occasionally. However, it is not more dangerous than many things in life. For
example, crossing a street in a busy city may be more dangerous than sailing, unless you
make a mistake.
K: The ratio of dead people by traffic accidents is higher that of sailing.
Okay, thank you very much. I really enjoyed this interview. Thank you again.
Interviewer: Prof. H. Komatsuin the guest room, WPI Integration Lab. Bldg., September 5th, 200925

Interview with Professor Masaru TSUKADA, Principal Investigator,
WPI-AIMR“Theoretical Research on Surfaces and Interfaces:
Past and Present”--- Open Minds, Originality, and Perseverance --Prof. Tsukada (T): I was born in Shanghai on January 1, 1943, in the midst of the
Pacific War. In the spring of the year the war ended, I was repatriated to Japan with mymother, my grandmother, and my brothers. I was only three years old and didn’t really
understand what was happening, but I’ve been told that my mother and grandmotherhad a very hard time. My father stayed on at his job and came back to Japan later.
We settled down in Funabashi, in Chiba Prefecture, and I grew up there. Back then,
Funabashi was in the country; it seems incredible today, but there were large areas ofwoods and fields and not many houses. In summer, I ran around in the midst of nature,
catching cicadas and grasshoppers. When I reached senior high school, I went to Kaisei
Academy a top-ranking private boys’ school, whose students in those days went in for ascruffy masculine image, and then I entered the University of Tokyo, in Science Group1.
The first two years are spent at the Komaba campus, and in the second semester of
my sophomore year, professors came from the Faculty of Science on the main Hongo
campus to give us lectures. I was particularly impressed by the lectures of Prof.
Takahiko Yamanouchi and Prof. Masao Kotani. I was clumsy when it came to handson experiments, but I remember being very interested in what Prof. Morizo Hirata had
to say.
Prof. Komatsu (K): Prof. Hirata became president of both the Physical Society ofJapan and the Japan Society of Applied Physics, and he trained under Torahiko Terada,
didn’t he? He did pioneering work in unusual fields, such as fracture research.
T: Yes, that’s right. Third-year students move to the Hongo campus, and those who
intended to do theory had to take an experimental seminar for the first six months. I
went to the lab of Prof. Hideji Suzuki, of “dislocation theory” fame, and did tensile tests
on single-crystal copper-aluminum alloy. I was there together with Eiichi Kuramoto,who later went to Kyushu University. Toshiyuki Ninomiya, then an assistant professor,
was a rising star, and he headed up work on lattice defects. I learned about“dislocation” from these two professors.
In graduate school, my advisor was Prof. Yasutada Uemura, whose specialty was26

condensed matter theory. A year or two ahead of me in his lab there was a talented
lineup that included Kikuo Cho and Eiichi Hanamura. Prof. Hidetoshi Fukuyama wasin my year, in the Kubo Lab next door.
Prof. Uemura’s approach was to have us discover a topic on our own and develop it
freely. He valued the students’ own free thinking. There weren’t many students then,and there was an atmosphere in which we could take our time and enjoy learning.
There were few jobs available that allowed graduates to go on with research, but we all
hoped for the best. There was nothing like the post-doc system that exists today, and a
lot of people simply stayed on at graduate school as what were called “over-doctors.”
There were also many people who intended to go overseas and eventually find a job
there that way.
For my master’s, I tackled the theoretical calculation of electron states in graphite,which Prof. Uemura was interested in at the time. In particular, I investigated the effectof random stacking faults on band structure and calculated their relationship withparticular de Haas – van Alphen oscillations. Prof. Uemura was very pleased with thiswork, and he presented my master’s thesis results at an international semiconductor
conference. Personally, I developed an interest in such areas as disordered systems,
non-crystals, and also surfaces, because I felt that practically everything there was toknow about simple, regularly structured materials like crystals was already known, andthus there was no future in that direction.
In the doctoral course, I got interested in various problems of solid-state physics andtackled – to mention just those topics that come to mind – the strongly anisotropic band
structure in solids of a one-dimensional nature like tellurium and two-dimensional
solids like graphite, and the local electronic states formed by impurities and latticedefects. In the end, I focused on the mechanism that determines electronic states in
random alloys. I wanted to establish a principle for calculating the electronic states andphonon spectra, and to create a general theoretical framework. As yet, no effective
calculation method existed; all we had was a simple perturbative averaging technique. I
wanted to perform electronic state calculations that were expandable and as precise as
possible, incorporating the correlation effects of atomic arrangements with a certain
degree of precision. After various attempts, I arrived at the approach now known as
Molecular Coherent Potential Approximation (Molecular CPA), which has gainedinternational acceptance. This is the most effective way to average randomness,because it doesn’t just average, it averages in a way that allows us to incorporate theeffects of local structure. At long range, what you have is mostly averaging, but at shortrange specific differences in atomic configuration can be expressly incorporated. This27

research was the starting point of my doctoral thesis. When I published it in the Journalof the Physical Society of Japan (JPSJ), I received reprint requests from many countries.
Back before the Internet, we used to request reprints from one another. They poured infrom all over the world, and I was happy to know that if one produced good work, it
would get a response.
K: This was the paper that marked your international debut, then?
T: This approach was later studied mathematically and became established as theMolecular CPA method. It’s clear now that the Green’s function has good analytic
properties. Some people were trying approaches very like the one I proposed in mypaper, and some similar papers appeared after mine. Publishing in a Japanese journalthat wasn’t yet widely circulated put me at a real disadvantage in terms of namerecognition. Authors who published after me but with more fanfare became famous.
When it comes to work published long ago, these days people don’t seem to care much,doesn’t it? Even if one has a greater claim to originality, one is at a disadvantage interms of name recognition.
T: For my part, I saw that methodology could be fun, and I enjoyed it. I think that waswhen I discovered the pleasure of developing a methodology that has generality.
As one tries to understand something fundamentally, thinking about methodology
opens up new worlds and new concepts. And an approach that has generality can beapplied to problems of any kind. This struck me as the essential appeal of physics, andit was very gratifying. So that was my doctoral thesis work.
K: It’s not just a matter of understanding, but of equipping oneself with methods forpenetrating new territory. That would have been in the 1970s.
T: Right after I obtained my doctorate, I was lucky enough to be made Prof. Uemura’s
research associate.
K: Who was his assistant professor?
T: Prof. Hiroshi Kamimura. Actually, in Physics Department of the University ofTokyo, on the theoretical side the assistant professors had such an independent statusthat they held seminars together with the professors. I believe it was different on theexperimental side.
At that time, many members of the Uemura Lab were working with two-dimensional
electron gas in the surface inversion layer of MOS semiconductors. This has sincematured into an important field, following major discoveries like the quantum Hall
effect, but in the 1970s the Uemura Lab was the first to undertake theoretical research inthis area. On the experimental side, Prof. Shinji Kawaji and his colleagues at
Gakushuin University had launched an active research program. In our lab, several

28

years behind me, Tsuneya Ando scored some impressive successes, for example, in thetheory of quantum Hall effects in a two-dimensional electron gas and its physicalproperties.
In my second year as a research associate, I went to do a post-doc
under Prof. Wilhelm Brenig, the foremost theoretician in statistical andsolid-state physics, at the Technical University of Munich. I was there
for two years. This came about when Prof. Ryogo Kubo, who was afriend of Prof. Brenig’s, told Prof. Uemura that he was looking for ayoung researcher. Prof. Brenig was the first person in Europe to deal with the theory ofsolid-state surface physics and, as it happened, he was about to start work in that field
when I went there. I worked on theoretical calculation of the reaction cross section ofadsorbed molecules by electron stimulation. The process as a whole is complicated,because the excited state of the adsorbed molecules is immediately de-excited,
generating an electron-positive hole pair on the metal side, but I made the calculations
using a perturbation expansion of the Dyson diagram. At the Technical University of
Munich, there were authorities on the experimental study of electron-stimulated
desorption, Prof. Dietrich Menzelproposed MGR theory with Gomer and Redhead, andProf. Brenig was to provide the theoretical foundation for his experiments.
On my return to Japan in 1974, I wanted to study surface theory, having made a start,
but there was hardly anyone in Japan doing theoretical research on surfaces. I happened
to be invited to speak at a seminar by Prof. Kenji Tamaru, an authority on catalysts in
the Chemistry Department at the University of Tokyo’s Faculty of Science, and his lab
members showed a lot of interest. That was how I came to get to know people in thechemistry field.
It was a period of truly dramatic advances for “surfaces” as an exact science, marked
by the advent of various new experimental measurement methods, such as ultrahighvacuum techniques. As a nascent field, however, it was still new and unfamiliar to theresearch community; for example, the Physical Society had no “surfaces and interfaces”
category. I recall joining several professors in lobbying the Physical Society to havethem recognize a meeting subdivision for “surfaces and interfaces.”
K: You are a pioneer of surface science in Japan.
T: After that, I went to the Institute for Molecular Science (IMS) in Okazaki. Hideo
Akamatsu was the director at that time. I pursued research there for about five and ahalf years, in close contact with colleagues in the field known as physical chemistry.
This proved very useful in my subsequent research career.
Prof. Keiji Morokuma, a leading young quantum chemist, came back from the United

29

States to set up a theoretical research arm at IMS after spending two very productive
decades at the University of Rochester. Prof. Morokuma had studied under the Nobel
laureate Kenichi Fukui, and I took part in the theory group as his associate professor. I
met Prof. Morokuma for the first time at IMS, and his energetic style of research had agreat influence on me.
K: What was Okazaki like?
T: I’m very fond of Okazaki, I really took a liking to it. We were on the former campusof Aichi University of Education, and it’s true that the area wasn’t yet developed, so
you might be startled by a pheasant flying up when you were strolling along the road.
The Institute’s driver was a local man, and once he caught a pheasant and we held abarbeque, yakitori style.
K: That’s hard to believe now.
T: We all lived together in housing for public service employees about ten minutes’
walk from the Institute. We were all young, even the professors. There was a lively
pioneer spirit in the air.
K: Were you married by then?
T: Yes, I got married shortly before I went to Germany and my wife accompanied methere. She seems to have enjoyed it.
After Okazaki, I returned to the University of Tokyo, Faculty of Science as an
associate professor in the Physics Department. At the University of Tokyo, I began tofocus on surface and interface theory. At first, I thought about applications of firstprinciple calculation. I had to make my own density functional method program in thelab. I knew the theory, and based the program on its principles, but it took me two or
three years to get the software to work accurately. The grad students in the lab thengradually modified it and created a density functional program package developed
entirely in-house. The software is good, it’s very reliable. Looking back now, I think
we missed a chance: if we’d made the software we developed more user-friendly andreleased it, it would most likely have been widely used.
By monopolizing the software you’ve gone to such pains to develop, you can write a
lot of papers. In fact, though, you can make a bigger contribution to society byreleasing it for others to use all over the world. The only trouble is that if you release it
too soon, other people rush to use it and they beat you to the results. It’s hard to get thetiming or the balance right.
K: At that time, where else in the world was similar research being done?
T: The Fritz Haber Institute in Berlin and UC Berkeley, among others. Students inuniversity labs develop various calculation programs for research use, but when they30

graduate these tend not to go anywhere. I approve of students’ developing software if
it’s an integral part of the science, but I wouldn’t want to make it an end in itself, and soperhaps it’s inevitable. If software development becomes an end in itself, I don’t think
we can call that true academic work.
Today, commercial software is readily available and you don’t even need experience
to use it. But problems arise when the software becomes a “black box”: the user can’t
judge whether the results are correct. The data may have been inputted wrongly andnobody noticed. Ideally, the user should have a good knowledge of what happens inside
the black box and of the physical phenomenon being studied.
K: The drawback in using a “black box” is that it doesn’t lead anywhere new. One
can’t locate the problems in terms of the limits of application, accuracy, and so on.
T: In surface research, I also took a look at the atomic arrangements in reconstructedsurfaces of silicon and other semiconductor crystals, which were hot topics at the time –such things as the structure of Si (111)-7u7 surfaces. Experimentally, dozens ofstructural models had been put forward, but I gradually came to favor the DAS model
proposed by Prof. Kunio Takayanagi of Tokyo Institute of Technology. What finallydecided the question, of course, was the scanning tunneling microscope (STM).
The structure and kinetics of Si (100) surfaces were another major area of surface
research where experiments and theory combined to give results. The atomic
reconstruction differs for each low-temperature region. It isn’t simple, because STM
observations show that the true structure is influenced by electron excitation due toelectron injection. Moreover, atomic force microscopy shows a different structure fromthat given by STM. Recently, however, this problem has been settled, up to a point.
I worked jointly with Masakazu Aono of the National Institute for Research in
Inorganic Materials (now part of the National Institute for Materials Science) on aninteresting problem relating to low- energy ion scattering spectroscopy. When you
direct helium atoms at the specimen surface, you get two peaks in the energy spectrumof the reflected ions. We found that this was due to a process in which the incident
helium ions are first neutralized and then re-ionized. We were delighted when, using asimple theoretical analysis, we succeeded in explaining this fully in terms of a kinetic
process involving movement of both electron and ion, but it is also a kind ofobservational problem.
Another interesting research subject was elementary processes in field evaporation.
We set out to theoretically elucidate the mechanism that causes atoms to evaporate one
by one when a strong positive potential is applied to a needle specimen. It’s anextremely interesting question, as the mechanism involves competition between

31

adiabatic and non-adiabatic effects. We traced the transitions theoretically in great
detail. We were personally satisfied with our careful analysis, but if one gets too
abstruse, it doesn’t go over well, right?
Lately, I’ve become interested in the electrochemical aspects of the field. For
example, redox reactions at electrode surfaces: these are chemical reaction processes
occurring in solution, triggered by electron transfer. Field evaporation is traditionally aphenomenon that occurs at metal surfaces under ultra-high vacuum, but, in a certain
sense, the phenomena at interfaces in aqueous solution can be said to resemble fieldevaporation, to be an extension of the same principle. I want to make this one of thecentral topics in my laboratory at WPI-AIMR. At the same time, I want to work towardmaking theoretical connections with the atomic-level structure, kinetic changes,
reactions induced by electron transfer, and other observations that can be made by STM
and atomic force microscopy (AFM) at the electrode-solution interface.
Theoretical research relating to STM and AFM has also ended up as part of my life’swork. When these experimental techniques were first invented, it was a mystery to me
how atoms could be imaged with an STM probe whose radius of curvature is on theorder of 10 nm. By doing electronic state calculations for both the probe and the sample
surface and using them to calculate the tunnel current, we succeeded in reproducing
atomic-scale images like those obtained experimentally. We were also able to show
how the atomic-scale images are influenced by the shape andstructure of the probe.
K: Does that mean that the tip of the probe is not spherical, but
consists of a single atom?
T: That’s correct. It means that the tunnel current and the atomic
forces are concentrated almost in a single atom at the very tip. In
the theory of STM, the tip of the probe had previously been
assumed to have perfect spherical symmetry and the effects ofprobe structure had not been taken sufficiently into account. When two or more atoms
interact with the tunnel current, they interfere with each other and you can’t obtain aclear image. But with a single atom at the needle tip, the image has excellent atomic
resolution.
K: Can’t these results be utilized in experimental measurements?
T: Many STM and AFM images cannot be understood in solely experimental terms, buttheoretical calculations make it possible to interpret them correctly, and in some cases toanalyze them quantitatively. Further, theory allows us to predict new functions ofscanning probe microscopy (SPM) and suggest these to the experimental people. SPM

32

has made striking progress recently in a wide range of fields, including biotechnology; itis even beginning to rival various spectroscopy methods, including nonlinear effects in
optical, infrared, and ultraviolet spectroscopy. SPM theory is taking on an ever-greaterrole in support of such developments.
In addition, it has recently become possible to identify and manipulate atoms by AFM.
In experiments of this kind, the minute details of the shape of the probe tip have an
impact. The atomic forces are fundamental in these cases, rather than the tunnel
current….
K: What exactly are the atomic forces?
T: At long range, you have van der Waals forces, and then there is also a kind ofelectrostatic force. As the probe’s proximity to the sample increases, a force known as
chemical interaction force is generated by quantum hybridization effects of the electron
wave function. At still closer proximity, there occurs a strong repulsive force that stems
from the effect of the Pauli exclusion principle. In an atomic force microscope,
measurements are performed in the range where the attractive force is gradually
increasing. The situation is complicated by the fact that, while the probe as a whole issubject to attractive force, repulsive force is beginning to act at its tip. This fact
becomes relevant to the mechanism of atom manipulation.
Friction force microscopy has also yielded some very interesting findings. According
to experiments that used an AFM probe to investigate friction at the atomic level, forces
are generated parallel and perpendicular to the direction in which the probe is scanned.
This situation can be reproduced beautifully by theoretical simulation. The results ofsuch simulations have shown that friction force microscope images like these areformed by atomic-level stick-slip.
K: So when you can do a theoretical simulation of results obtained experimentally,
you’re convinced? Can you turn that around and predict experimental results?
T: Yes, of course. For example, we have predicted theoretically that when a coherent
current flows through a large molecule or through graphene, the internal current willshow a strong loop current feature, but this doesn’t seem to have been confirmed
experimentally as yet. With regard to SPM simulation, I am presently attempting tosolve the so-called “reverse problem,” that is, to use measurements of standard samples
or target samples to determine the probe structure and sample structure. In another rolefor SPM simulation, we sometimes correctly interpret and quantitatively analyze images
that cannot be understood on a purely experimental basis. For instance, with AFM
experimental data from samples in solution, it is often quite impossible to draw an
intuitive picture. In such cases, theoretical simulation brings great power into play.

33

K: I’ve heard it said that real theoreticians don’t use computers? It’s also said thatpeople turn things over to a computer because they’re stuck.
T: Some people might say that, yes.
In research, lately I’ve come to realize that finding the way out is important. With
regard to SPM theory, I’m currently involved in a JST program of “Development of
System and Technology for Advanced Measurement and Analysis.” The SPM
simulation project calls for building, demonstrating, and commercializing a prototype
simulator.
K: I guess that’s what’s wanted in these times? You’re certainly involved in a lot ofprojects.
T: Well, in fact, that’s a rather difficult question. In fact, I think that when one becomesinvolved in such work, one tends to lose a little of the true joy of doing science, but I
suppose it’s important from a social standpoint.
K: I know what you mean. It’s the murky areas that interest you, and once they’recleared up, you lose the intense determination that was driving you. That I canunderstand very well. The same thing happens with experiments.
T: In the style of research I used to pursue, I would stop once I had an idea of how
things were going to turn out. Actually, though, it seems to me that there are things thateveryone thinks they already know when in fact they don’t, and that sometimes
openings like that can lead to some very innovative science.
K: It’s like the “black box” we were speaking of earlier. It’s taken for granted and one
doesn’t even think about what’s inside.
T: In that connection, you might be wondering why I study organic thin films whenthey’ve already been commercialized, but we still don’t know a lot of fundamental
things regarding their electronic states and electron mobility. For example, at the mostfundamental level of all, there’s the molecule-electrode link structure at the interface
and the related physics. To make it possible to move ahead and take the step ofdeveloping revolutionary, I want to clarify the basics, centered on molecular bridges,
and to understand them properly at the atomic level. I also want to explore theunexpected quantum functions of molecules and make proposals to experimental
researchers accordingly.
K: In that sense, am I right in thinking that here at WPI, you have the chance to gain the
maximum advantage from all the research that you have built up over the years?
T: Yes, there are a lot of research topics likely to yield interesting discoveries if wework on them here together.
K: I don’t want to sound like I’m bragging, but there’s Prof. Kingo Itaya’s liquid STM

34

work, and Prof. Kawasaki’s
experiments on oxides, shear
bands in BMG, to name justa few. There’s a natural
fusion, isn’t there?
T: We don’t have time to go
into detail now, but I’d also
like to do various studies
from a theoretical viewpoint
on BMG.
K: Would you like to tell us about your policy in your research, or what advice you give
your students?
T: It may sound trite, but I think doing science comes down to simple curiosity, and theenthusiasm and originality to find out the answers. You can’t do anything if you justfollow others. I’d say you need to be strongly motivated as an individual, and in realearnest.
K: Dr. Bednorz of IBM talked about that in a recent interview. It’s like what he said
about not being carried along with everyone else, even swimming against the current if
you have to.
T: I’m very happy to have been invited to WPI.
K: WPI is very lucky to have a theoretician like yourself, Professor. This is a key
laboratory for fusion. I want to ask leading theoreticians from around the world to comehere, even if only for a short time, because we have few restrictions in that regard.
Lastly, could you give a word of advice to those who are about to embark on theircareers?
T: A number of things are important. One is to maintain a sustained interest.
Perseverance is might. But I don’t mean you should persevere in a narrow field andwith a fixed methodology. I mean you should discover big questions that you want tosolve yourself among natural phenomena or science and technology, valuing your own
ability to keep an open mind, and then persevere in studying those questions from every
angle, in an interdisciplinary way, until you arrive at the solution.
K: In the end, people do what they enjoy, don’t they?
T: If you do something because you’re forced to, you won’t keep it up. Nothing will
come of it unless you think for yourself, freely and essentially.
K: The spirit of adventure is gradually dying out, isn’t it? Who is the researcher you
respect the most?

35

T: Lev Davidovich Landau. Though I couldn’t be like him if I tried, he was a great man.
He had a clear way of thinking. He gets to the essence of things in simple language.
K: This has been a most enlightening discussion. We haven’t talked much about
failures, but I think there’s probably a mass of them behind any successful piece of
research. Thank you.
Interviewer: Prof. H. Komatsu
in Prof. Tsukada’s office in the WPI-AIMR Annex, April 21st, 200936

WPI-AIMR PI Ⴆ↰ᝰᢎ᝼ߦ߈ߊ
(Interview with Professor Masaru TSUKADA㧙Japanese version)⴫㕙࡮⇇㕙ߩℂ⺰⎇ⓥߩ੹ᤄ
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ߦᲣ߿␲Უ‫ޔ‬ఱᒉߚߜߣ৻✜ߦᒁ߈਄ߍߡ߈߹ߒߚ‫ޕ‬3 ᱦߩᤨߢߔ߆ࠄ‫ࠅ߆ࠊߊࠃߪߦ⑳ޔ‬߹ߖࠎߢߒߚ߇‫ޔ‬Უ߿␲Უߪᄢᄌ⧰ഭࠍߒߚߘ߁ߢߔ‫ޕ‬ῳߪᄖ࿾ߩൕ߼వߦ⇐߹ߞߡ޿ߡ‫ޔ‬ᓟ߆ࠄᏫ࿖ߒ߹ߒߚ‫ޕ‬
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2 ᐕ↢ߩᓟඨߦߪᧄㇹ߆ࠄℂቇㇱߩవ↢ߩ⻠⟵߇޽ࠅ߹ߒߚ‫ޕ‬ਛߢ߽⚛☸ሶߩጊౝᕶᒾవ
↢‫‛ޔ‬ᕈߩዊ⼱ᱜ㓶వ↢ߩ⻠⟵ߦߪᗵ㌏ࠍฃߌ߹ߒߚ‫ߪ⑳ޕ‬ታ㛎ߢ⋥ធᚻࠍേ߆ߔߎߣߢ
ߪਇེ↪ߢߒߚ߇‫ޔ‬ᐔ↰᫪ਃవ↢ߩ߅⹤ߪᄢᄌ㕙⊕߆ߞߚߎߣࠍ⸥ᙘߒߡ޿߹ߔ‫ޕ‬ዊ᧻㧦ᐔ↰వ↢ߪ‛ℂቇળ‫ޔ‬ᔕ↪‛ℂቇળߣ߽ߦળ㐳ࠍߥߐߞߚᣇߢኹ↰ኑᒾߩ߅ᒉሶߐ
ࠎߢߔߨ‫ޕ‬ഀࠇ⋡ߩ⎇ⓥߥߤ࡙࠾࡯ࠢߥಽ㊁ࠍ㐿ᜏߐࠇ߹ߒߚ‫ޕ‬Ⴆ↰㧦ߘ߁ߢߔ‫ޕ‬3 ᐕ↢ߦߥߞߡᧄㇹߦⴕߊߩߢߔ߇‫ޔ‬ℂ⺰ᔒᦸߩቇ↢ߪඨᐕ㑆‫ޔ‬ታ㛎ߩ⎇ⓥቶߢീᒝߔࠆߎߣߦߥߞߡ޿߹ߒߚ‫ޟߪ⑳ޕ‬ォ૏⺰‫ߩޠ‬㋈ᧁ⑲ᰴవ↢ߩߣߎࠈߦࠁ߈‫ޔ‬㌃න⚿᥏ߩᒁᒛࠅ⹜㛎ࠍߒ߹ߒߚ‫਻ޕ‬ᄢߦⴕߞߚ⬿ᧄ⧷৻ߐࠎ߽৻✜ߢߒߚ‫ޕ‬ੑችᢅⴕవ
↢ߪᣂㅴ᳇㍈ߩഥᢎ᝼ߢ‫ޟޔ‬ᩰሶᰳ㒱‫ߩޠ‬ᣛ㗡ߢߒߚ‫߅ߩߎޕ‬ੑੱ߆ࠄ‫ޟ‬ォ૏‫ࠍߣߎߩޠ‬ቇ߮߹ߒߚ‫ޕ‬ᄢቇ㒮ߪ‫ޟ‬࿕૕㔚ሶ⺰‫ߩޠ‬ᬀ᧛ᵏᔘవ↢ߩᚲߦⴕ߈߹ߒߚ‫⎇ޕ‬ⓥቶߩᢙᐕ਄ߩవヘߦߪᒛ♿ਭᄦߐࠎ‫᧛⧎ޔ‬᭢৻ߐࠎߥߤᄙᓀߥᣇ‫ޕߔ߹޿߇ޘ‬ਭ଻⎇ߦⴕߞߚ⑔ጊ⑲ᢅߐࠎߪ‫ޔ‬㓞ߩਭ଻⎇ⓥቶߢห⚖↢ߢߔ‫ޕ‬ ᬀ᧛వ↢ߩᣇ㊎ߪ‫⥄ߦ↱⥄ޔ‬ಽߢ࠹࡯ࡑࠍ⷗ߟߌߡዷ㐿ߖࠃߣ޿߁ߎߣߢ‫ޔ‬ቇ↢⥄りߩ⥄↱ߥ⊒ᗐࠍߣߡ߽ᄢಾߦߐࠇߡ޿߹ߒߚ‫ޕ‬ᒰᤨߪቇ↢ᢙ߽ዋߥߊ‫ߣࠅߊߞࠁޔ‬ቇ໧ࠍᭉߒ߻ߎߣߩߢ߈ࠆ㔓࿐᳇߇޽ࠅ߹ߒߚ‫⎇ޕ‬ⓥ߇⛯ߌࠄࠇࠆࠃ߁ߥዞ⡯ญߪዋߥ߆ߞߚߩߢ
ߔ߇‫߇⊝ߣߐࠆߥ߆ߣࠎߥޔ‬ᭉⷰ⊛ߢߒߚ‫ߥ߁ࠃߩࠢ࠼ࠬࡐߩ੹ޕ‬೙ᐲ߽ߥߊ‫߹߹ߩߘޔ‬ᄢቇ㒮ߦᱷࠆࠝ࡯ࡃ࡯࠼ࠢ࠲࡯߇ᄢ൓޿߹ߒߚ‫ޕ‬ᄖ࿖ߦ಴ߡߘߩ߁ߜ૗ߣ߆⡯ࠍ⷗ߟߌࠃ
߁ߥߤߣ޿߁ੱߚߜ߽ᄙ߆ߞߚߩߢߔ‫ޕ‬ ୃ჻⺖⒟ߢߪᒰᤨᬀ᧛వ↢߇⥝๧ࠍᜬߞߡ߅ࠄࠇߚࠣ࡜ࡈࠔࠗ࠻ߩ㔚ሶ⁁ᘒߩℂ⺰⸘▚ߦขࠅ⚵ߺ߹ߒߚ‫ߚߞ౉ߦࡓ࠳ࡦ࡜ߦ․ޕ‬Ⓧጀᰳ㒱߇ࡃࡦ࠼᭴ㅧߦ෸߷ߔᓇ㗀ࠍ⺞ߴ‫․ޔ‬37ᱶߥ࠼ࡂ࡯ࠬࡈࠔࡦࠕ࡞ࡈࠚࡦᝄേߣߩ㑐ଥߥߤࠍ⸘▚ߒ߹ߒߚ‫ޕ‬ᬀ᧛వ↢ߪᄢᄌ༑ࠎߢ
ߊߛߐߞߡ‫ୃޔ‬჻⺰ᢥߩᚑᨐࠍඨዉ૕࿖㓙ળ⼏ߢ⚫੺ߒߡਅߐ޿߹ߒߚ‫⥄⑳ޕ‬りߪ‫⚿ޔ‬᥏ߩࠃ߁ߦ᭴ㅧ߇߈ߜࠎߣߒߚන⚐ߥ‛⾰ߪ߽߁ᱴߤ߇ಽ߆ߞߡ޿ߡ‫ޔ‬వ߇ߥ޿ࠃ߁ߥ᳇߇
ߒߡ޿ߚ߽ߩߢߔ߆ࠄ‫⚿ޔ♽ߚࠇੂޔ‬᥏ߢߥ޿߽ߩ‫⴫ޔ‬㕙߽ߘ߁ߢߔ߇‫ߦࠈߎߣߥࠎߘޔ‬⥝๧ࠍᗵߓߡ޿߹ߒߚ‫ޕ‬ ඳ჻ࠦ࡯ࠬߦ౉ߞߡ߆ࠄߪ‛ᕈ‛ℂߩ޿ࠈ޿ࠈߥ໧㗴ߦ⥝๧ࠍᜬߜ߹ߒߚ߇‫⸥ޔ‬ᙘߦᱷߞߡ޿ࠆ߽ߩߣߒߡߪ‫⇣ޔ‬ᣇᕈߩᒝ޿ߚߣ߃߫࠹࡞࡞ߩࠃ߁ߥ৻ᰴర⊛ߥ࿕૕߿‫ࡈ࡜ࠣޔ‬ࠔࠗ࠻ߩࠃ߁ߥੑᰴరᕈ࿕૕ߥߤߩࡃࡦ࠼᭴ㅧ߿‫ޔ‬ਇ⚐‛߿ᩰሶᰳ㒱߇ᒻᚑߔࠆዪᚲ⊛ߥ㔚ሶ⁁ᘒߥߤߦขࠅ⚵ߺ߹ߒߚ‫ߩ♽ࡓ࠳ࡦ࡜ߪߦ⊛⚳ᦨޕ‬ว㊄ߢ‫ߩߘޔ‬㔚ሶ⁁ᘒ߇ߤߩࠃ
߁ߥᯏ᭴ߢ᳿߹ࠆߩ߆ߦ⥝๧ࠍᜬߜ߹ߒߚ‫ޕ‬㔚ሶ⁁ᘒ߿ࡈࠜࡁࡦࠬࡍࠢ࠻࡜ࡓࠍ⸘▚ߔࠆߚ߼ߩේℂࠍ᣿ࠄ߆ߦߒߡ‫ߥ⊛⥸৻ޔ‬ℂ⺰ߩࡈ࡟ࠗࡓࡢ࡯ࠢࠍ૞ࠅߚ޿ߣᕁߞߚ⸶ߢߔ‫ޕ‬ߘࠇ߹ߢߪ᦭ലߥ⸘▚ᣇᴺ߇ߢ߈ߡ߅ࠄߕ‫ޔ‬៨േ⊛ߦᐔဋൻࠍߔࠆ⚛ᧉߥᣇᴺ߇޽ߞߚߛ
ߌߢߔ‫ޕ‬ේሶ㈩೉ߩ⋧㑐ലᨐࠍ޽ࠆ⒟ᐲᱜ⏕ߦขࠅ౉ࠇ‫ߌߛࠆ߈ߢޔ‬ᱜ⏕ߢ⊒ዷᕈߩ޽ࠆ
㔚ሶ⁁ᘒߩ⸘▚ࠍߒߚ޿ߣ⠨߃ߡ޿߹ߒߚ‫⚿ߚߒࠍߺ⹜ߥࠈ޿ࠈ޿ޕ‬ᨐ‫ߩߟ৻ޔ‬⠨߃ߦ೔㆐ߒ߹ߒߚ‫ߪߢ੹ޕ‬ಽሶ CPA㧔Molecular Coherent Potential Approximation㧕ߣ๭߫ࠇߡ࿖㓙⊛ߦㅢߞߡ޿߹ߔ߇‫᦭߽ᦨࠍࠬࡀࡓ࠳ࡦ࡜ߪࠇߎޔ‬ലߦᐔဋൻߔࠆᣇᴺߢߔ‫ޕ‬නߦᐔဋൻߔࠆߩߢߪߥߊ‫ޔ‬ዪᚲ᭴ㅧߩലᨐࠍขࠅ౉ࠇࠆߎߣ߇ߢ߈ࠆࠃ߁ߦᐔဋൻߒ߹ߔ‫ޕ‬㆙޿ߣߎࠈߪᱴߤᐔဋൻߐࠇࠆ߇‫ޔ‬ㄭߊߢߪ୘‫ߩޘ‬ේሶߩ㈩⟎ߩ㆑޿߇޽ࠄࠊߦขࠅ౉ࠇ
ࠄࠇࠆߣ޿߁ᣇᴺߢߔ‫⎇ߩߎޕ‬ⓥ߇ඳ჻⺰ᢥߩ಴⊒ὐߦߥࠅ߹ߒߚ‫ޕ‬JPSJ㧔Journal of the
Physical Society of Japan㧕ߦ಴ߒߚࠄ‫ޔ‬ฦ࿖߆ࠄ೎೚ࠅ⺧᳞߇ᄙᢙ᧪߹ߒߚ‫ࡀ࡯࠲ࡦࠗޕ‬࠶࠻߇ή߆ߞߚᒰᤨߢߪ೎೚ࠅ⺧᳞ࠍ੕޿ߦࠃߊߒߚ߽ߩߢߒߚ‫⺧ߩࠎߐߊߚࠎ߱޿ߕޕ‬᳞߇਎⇇ฦ࿖߆ࠄ᧪ߡ‫ࠍߩ߽޿⦟ޔ‬಴ߖ߫෻㗀߇޽ࠆߎߣ߇ࠊ߆ࠅᄢᄌሜߒ߆ߞߚߢߔ‫ޕ‬ዊ᧻㧦వ↢ߩ࿖㓙⊛ߥᦨೋߩ࠺ࡆࡘ࡯૞ߢߔߨ‫ޕ‬Ⴆ↰㧦ߘߩᓟ‫ߩߎޔ‬⠨߃ᣇߪᢙቇ⊛ߦ߽ᬌ⸛ߐࠇ MolecularCPA ᴺߣߒߡ⏕┙ߐࠇ‫࡝ࠣޔ‬࡯ࡦ㑐ᢙ߇⸃ᨆ⊛ߦ⦟޿ᕈ⾰ࠍ߽ߟߎߣ߇᣿⏕ߦߥߞߡ޿߹ߔ‫ߚߒ⴫⊒߇⑳ޕ‬ឭ᩺ߦᄢᄌ
ㄭ޿ᣇᴺߢ⹜ߺࠍߒߡ޿ߚੱߚߜ߿‫ߩ⑳ޔ‬ᓟߦ߿ߞߚੱߚߜ߇޿߹ߒߚ‫࡟ࡘࠠ࡯ࠨߪ⑳ޕ‬࡯࡚ࠪࡦ߇߹ߛࠃߊߥ߆ߞߚᣣᧄߩࠫࡖ࡯࠽࡞ߦ಴ߒߚ߽ߩߢߔ߆ࠄ‫ޔ‬⍮ฬᐲߣ޿߁ὐߢ
ߪߕ޿߱ࠎ៊ࠍߒ߹ߒߚ‫ޕ‬ᓟ߆ࠄᵷᚻߦࠕࡇ࡯࡞ߒߚ߶߁߇᦭ฬߦߥߞߚߩߢߔ‫ᦨޕ‬ㄭߩੱߪᤄߩ઀੐ߪ⺕߇߿ߞߡ޿ࠃ߁ߣ‫ޕߨߔ߹ࠅ޽߇ࠈߎߣ߁޿ߣ޿ࠃ߽ߢ߁ߤޔ‬ዊ᧻㧦ߎࠇߪᣣᧄੱߦߪࠃߊ޽ࠆߎߣߢߔߨ‫ޔ߽ߡߞ޽ߦࠄߜߎߪ࡯ࠖ࠹࡝࠽ࠫ࡝ࠝޕ‬⍮ฬᐲߢ៊ࠍߔࠆ‫ޕ‬Ⴆ↰㧦⑳⥄りߪᣇᴺ⺰ߩ㕙⊕ߐߦ᳇ߠ߈‫ޔ‬ᭉߒ߆ߞߚߢߔ‫⥸৻ޕ‬ᕈߩ޽ࠆᣇᴺ⺰ࠍ૞ࠅ਄ߍࠆᭉߒߐࠍߎࠇߢⷡ߃ߚ᳇߇ߒ߹ߔ‫ޕ‬߽ߩߏߣࠍᩮᧄ߆ࠄℂ⸃ߒࠃ߁ߣߒߡ޿ࠆ߁ߜߦ‫ޔ‬ᣇᴺ⺰ߩᬌ⸛߆ࠄᣂߒ޿਎⇇߿ᣂߒ޿ࠦࡦ࠮ࡊ࠻߇㐿ߌߡߊࠆߒ‫⥸৻ޔ‬ᕈ߇޽ࠇ߫ߤࠎߥ໧㗴ߦߢ߽૶߃ࠆ‫‛߇ߎߎޔ‬ℂቇߩ
ߛ޿ߏ๧ߩࠃ߁ߥᗵߓ߇ߒߡሜߒ߆ߞߚߢߔ‫߇ࠇߎޕ‬ඳ჻⺰ᢥߩ઀੐ߢߔ‫ޕ‬38ዊ᧻㧦නߦℂ⸃ߔࠆߛߌߢߥߊ‫ޔ‬ᣂߒ޿㗔ၞߦ᡹߼ㄟࠎߢࠁߊᣇᴺࠍりߦઃߌࠆߎߣߦ߽
ߥࠅ߹ߔߨ‫ ߇ࠇߎޕ‬1970 ᐕઍߢߔߨ‫ޕ‬Ⴆ↰㧦ඳ჻ࠍᓧߚ⋥ᓟ‫ޔ‬ᄢᄌ࡜࠶ࠠ࡯ߥߎߣߦ‫ޔ‬ᬀ᧛వ↢ߩഥᚻߦߒߡ߽ࠄ޿߹ߒߚ‫ޕ‬ዊ᧻㧦ഥᢎ᝼ߩᣇߪߤߥߚߢߒߚ߆‫ޕ‬Ⴆ↰㧦਄᧛ᵲవ↢ߢߒߚ‫᧲߽ߣߞ߽ޕ‬ᄢߩ‛ℂᢎቶߢߪ‫ޔ‬ℂ⺰♽ߩ⎇ⓥቶߪഥᢎ᝼ߩੱߚ
ߜ߽⁛┙ߒߡ޿ߡ‫ޔ‬ᢎ᝼ߩ⎇ⓥቶߣߪ࠮ࡒ࠽࡯ࠍ৻✜ߦ߿ࠆߊࠄ޿ߢߒߚ‫ޕ‬ታ㛎♽ߪߘ߁ߢߪߥ߆ߞߚࠃ߁ߢߔ߇‫ޕ‬ ߘߩᒰᤨ‫ޔ‬ᬀ᧛⎇ߩᄙߊߩᣇ߇‫ޔ‬MOS ඨዉ૕⴫㕙෻ォጀߦ߅ߌࠆੑᰴర♽㔚ሶࠟࠬࠍᛒ
ߞߡ޿߹ߒߚ‫ߪߢ੹ޕ‬㊂ሶࡎ࡯࡞ലᨐߥߤߣ޿߁ᄢ⊒⷗߽޽ࠅᄢಽ㊁ߣߒߡᚑᾫߒߡ޿߹
ߔ߇‫ޔ‬1970 ᐕઍߩᒰᤨ‫ޔ‬ᬀ᧛⎇߇ೋ߼ߡℂ⺰㕙ߩ⎇ⓥߦ⌕ᚻߒߚ߽ߩߢߔ‫ޕ‬ታ㛎㕙ߪቇ⠌㒮ᄢቇߩᎹ〝⚩ᴦవ↢ߚߜ߇ᵴ⊒ߥ⎇ⓥࠍᆎ߼ߡ޿߹ߒߚ‫⎇ޕ‬ⓥቶߩ⑳ߩᢙᐕᓟヘߦ቟⮮ᕡ਽ߐࠎ߇޿߹ߒߚ߇‫ޔ‬ੑᰴర㔚ሶࠟࠬߩ⏛᳇ᛶ᛫ലᨐ߿ߘߩ‛ᕈߦ㑐ߔࠆℂ⺰ߥߤߢ⚛
᥍ࠄߒ޿ᚑഞࠍ෼߼ߡ޿߹ߒߚ‫ޕ‬
 ⑳ߪഥᚻߦߥߞߡ 2 ᐕ⋡ߦ‫‛⸘⛔ޔ‬ℂℂ⺰߿࿕૕ℂ⺰ߩᄢᓮᚲߢ޽ࠆࡒࡘࡦࡋࡦᎿ⑼ᄢ
ቇߩ࠙ࠖ࡞ࡋ࡞ࡓ࡮ࡉ࡟࠾࠶ࡅవ↢ߩᚲߦࡐࠬ࠼ࠢߢⴕ߈‫ޔ‬2 ᐕ㑆ṛ࿷ߒ߹ߒߚ‫ޕ‬ਭ଻੫੖వ↢ߣⷫߒ߆ߞߚࡉ࡟࠾࠶ࡅᢎ᝼߇⧯޿⎇ⓥ⠪ࠍតߒߡ޿ࠆߣ‫ޔ‬ᬀ᧛వ↢ߦ⹤ߐࠇߚߩ߇
߈ߞ߆ߌߢߔ‫ࡅ࠶࠾࡟ࡉޕ‬ᢎ᝼ߪ࿕૕⴫㕙‛ℂߩℂ⺰ࠍ࡛࡯ࡠ࠶ࡄߢᦨೋߦᚻដߌߚੱߢ
ߔ‫ޔߪ⑳ޕ‬หᢎ᝼߇ߘߩಽ㊁ࠍৼᐲࠬ࠲࡯࠻ߐߖࠆᤨᦼߦⴕߞߚߎߣߦߥࠅ߹ߔ‫⴫ޕ‬㕙਄ߩๆ⌕ಽሶ߇㔚ሶೝỗߢ⣕㔌ߔࠆߣ߈ߩ෻ᔕᢿ㕙Ⓧࠍℂ⺰⊛ߦ⸘▚ߔࠆ઀੐ࠍߒ߹ߒߚ‫ޕ‬ๆ⌕⚿วߩബ⿠⁁ᘒߪ㊄ዻ஥ߩ㔚ሶᱜሹኻࠍ↢ᚑߒߡߔߋߐ߹⣕ബ⿠ߔࠆߩߢ‫ోޔ‬૕ߩࡊࡠ࠮ࠬߪⶄ㔀ߦߥࠅ߹ߔ߇‫ߩࡓ࡜ࠣࠕࠗ࠳ࡦ࠰ࠗ࠳ࠍࠇߘޔ‬៨േዷ㐿ߢ⸘▚ߒ߹ߒߚ‫ࡒޕ‬ࡘࡦࡋࡦᎿ⑼ᄢቇߦߪ‫࡞ࠚ࠷ࡦࡔޔ‬ᢎ᝼ߣ޿߁㔚ሶೝỗ⣕㔌ߩታ㛎ߩᄢኅ߇޿߹ߒߚ߇‫ޔ‬ߎߩታ㛎ߩℂ⺰⊛ၮ␆ࠍࡉ࡟࠾࠶ࡅవ↢߇ਈ߃ࠆߎߣߦߥࠅ߹ߒߚ‫ޕ‬
 1974 ᐕߦᏫ࿖ߒߚߣ߈‫ߊ߆ߞߖޔ‬ീᒝߒߪߓ߼ߚߣ޿߁ߎߣ߽޽ࠅ⴫㕙ߩℂ⺰ࠍᔒߒߡ޿ߚߩߢߔ߇‫ޔ‬ᣣᧄߦߪ⴫㕙ߩℂ⺰⎇ⓥ⠪ߪᱴߤ޿߹ߖࠎߢߒߚ‫᧲߹ߚ߹ߚޕ‬ᄢℂቇㇱߩൻቇᢎቶߦ⸅ᇦ⎇ⓥߩᄢኅߢ޽ࠆ↰ਣ⻞ੑవ↢߇޿ߡ‫⎇ޔ‬ⓥቶ࠮ࡒ࠽࡯ߦ๭߫ࠇߡ⹤ߦⴕ
߈߹ߒߚ߇‫⎇߈ߣߩߘޔ‬ⓥቶߩᣇ‫ࠄ߆ޘ‬ᄢᄌߦ⥝๧ࠍᜬߞߡ߽ࠄ޿߹ߒߚ‫ߢߎߘޕ‬ൻቇߩᣇ‫ߣޘ‬⍮ࠅว߁߈ߞ߆ߌߦߥࠅ߹ߒߚ‫ޕ‬ᒰᤨߪ♖ኒ⑼ቇߣߒߡߩ‫⴫ޟ‬㕙‫⿥ߪޠ‬㜞⌀ⓨᛛⴚࠍߪߓ߼ᣂߒ޿⸘᷹ታ㛎ᚻᴺ߇޿ࠈ޿ࠈߣ↢ࠇ‫ߦߐ߹ޔ‬ഺ⥝ᦼߢߒߚ‫ޔߒ߆ߒޕ‬ᣂߒߊ⺀↢ߒߚಽ㊁ߥߩߢ‫ޔ‬ᄙߊߩ⎇ⓥ⠪ߦߣߞߡߥߓߺߩߥ޿ᣂߒ޿ಽ㊁ߢ޽ࠅ‫‛߫߃଀ޔ‬ℂቇળߦߪ‫⴫ޟ‬㕙࡮⇇㕙‫߁޿ߣߤߥޠ‬ಽ㊁߽ߥ߆ߞߚߩߢߔ‫‛ ޕ‬ℂቇળߦ‫⴫ޟ‬㕙࡮⇇㕙‫ߩޠ‬ಽ⑼ࠍ⹺߼ߡ߽ࠄ߁ࠃ߁ߦ‫ޔ‬૗ੱ߆ߩవ↢ᣇߣㆇേߒߚߎߣࠍ⸥ᙘߒߡ߅ࠅ߹ߔ‫ޕ‬ዊ᧻㧦⴫㕙⑼ቇߩ⨲ಽߌߢߔߨ‫ޕ‬Ⴆ↰㧦ߘߩᓟ‫ޔ‬ጟፒߩಽሶ⑼ቇ⎇ⓥᚲ㧔ಽሶ⎇㧕ߦࠁ߈߹ߒߚ‫⑲᧻⿒ޕ‬㓶ᚲ㐳ᤨઍߢߔ‫ޕ‬ߘߎߢ⚂ 5 ᐕඨ⎇ⓥ↢ᵴࠍㅍࠅ߹ߒߚ߇‫‛ޔ‬ℂൻቇߣ๭߫ࠇࠆಽ㊁ߩᣇ‫ߊߒⷫߣޘ‬੤ᵹߔ39ࠆߎߣ߇ߢ߈‫ߩߘߩ⑳ޔ‬ᓟߩ⎇ⓥᱧߦߣߞߡ㕖Ᏹߦ᦭⋉ߢߒߚ‫ޕ‬㊂ሶൻቇಽ㊁ߩ⧯ᚻߩᄢኅߢ޽ߞߚ⻉ᾢᢎ᝼߇‫ޔ‬ੑචᢙᐕ㑆ࡠ࠴ࠚࠬ࠲࡯ᄢቇߢᵴべߐࠇߚᓟ‫ޔ‬ಽሶ⎇ߩℂ⺰⎇ⓥ♽ࠍഃ⸳ߔࠆߚ߼ߦ☨࿖߆ࠄᏫߞߡߎࠄࠇ߹ߒߚ‫⻉ޕ‬ᾢవ↢ߪ
ࡁ࡯ࡌ࡞⾨ߩ⑔੗⻞৻వ↢ߩ߅ᒉሶߐࠎߢߔ߇‫⻉ߪ⑳ޔ‬ᾢᢎ᝼ߩഥᢎ⛼ߣߒߡℂ⺰ࠣ࡞࡯ࡊߦෳടߒ߹ߒߚ‫⻉ߩߎߪ⑳ޕ‬ᾢᢎ᝼ߣಽሶ⎇ߢೋ߼ߡ߅ળ޿ߒߡ‫ࡘࠪ࠶ࠡ࡞ࡀࠛߩߘޔ‬ߥ⎇ⓥ߱ࠅࠍ᜙⷗ߒߡᄢ߈ߥᓇ㗀ࠍ߁ߌ߹ߒߚ‫ޕ‬ዊ᧻㧦ጟፒߪߤ߁ߢߒߚ߆㧫Ⴆ↰㧦⑳ߪᄢᄌጟፒ߇ᅢ߈ߢ‫ޔ‬᳇ߦ౉ߞߡ޿߹ߒߚ‫߆ߒߚޕ‬ᗲ⍮ᢎ⢒ᄢቇߩ⒖ォ〔ߢ‫ޔ‬ᒰᤨߪઃㄭߩ㐿⊒߇ㅴࠎߢ޿ߥߊߡ‫ޔ‬૗ߍߥߊ㆏ࠍᱠ޿ߡ޿ࠆߣࠠࠫ߇㘧߮಴ߡ߈ߚࠅߒ߹
ߒߚ‫ޕ‬ㆇォᚻߐࠎ߇࿯࿾ߩੱߢ‫ࠍࠫࠠߩߘޔ‬᝝߃ߡ὾߈㠽ࡄ࡯࠹ࠖ࡯ࠍߒߚߎߣ߽޽ࠅ߹
ߒߚ㧔ᄢ╉޿㧕‫ޕ‬ዊ᧻㧦੹ߢߪାߓࠄࠇ߹ߖࠎߨ‫ޕ‬Ⴆ↰㧦⎇ⓥᚲ߆ࠄᱠ޿ߡ 10 ಽߊࠄ޿ߩߣߎࠈ߇౏ോຬኋ⥢ߢ‫ߦ✜৻ޔ⊝ޔ‬૑ࠎߢ޿߹ߒߚ‫ޕ‬ᢎ᝼ߩᣇ‫ࠍޘ‬฽߼‫⨲ޕߨߔߢߚߞ߆⧯⊝ޔ‬ഃᦼߩᵴ᳇ߦ޽߰ࠇߡ޿߹ߒߚ‫ޕ‬ዊ᧻㧦వ↢ߪߏ⚿ᇕߐࠇߡ޿ߚߩߢߔ߆㧫Ⴆ↰㧦ߪ޿‫ߊⴕߦ࠷ࠗ࠼ޔ‬ዋߒ೨ߦ⚿ᇕߒߡ޿ߡ‫ޔ‬ੑੱߢ࠼ࠗ࠷ߦṛ࿷ߒ߹ߒߚ‫ޕ‬ኅౝߪᭉߒ߆ߞߚࠃ߁ߢߔ‫ޕ‬ጟፒߩ޽ߣ‫᧲ޔ‬ᄢℂቇㇱߩ‛ℂᢎቶ߳ഥᢎ᝼ߦߥߞߡᚯࠅ߹ߒߚ‫᧲ޕ‬ᄢߢߪ⴫㕙࡮⇇㕙ߩℂ⺰ࠍਛᔃߦ⎇ⓥࠍᆎ߼߹ߒߚ‫ᦨޕ‬ೋߦ╙৻ේℂ⸘▚ߩㆡ↪ࠍ⠨߃߹ߒߚ‫ޕ‬ኒᐲ᳢㑐ᢙ
ᴺߦࠃࠆ⸘▚ᴺߩࡊࡠࠣ࡜ࡓ⥄૕ࠍ‫⎇ޔ‬ⓥቶߢ⥄૞ߖߨ߫ߥࠅ߹ߖࠎߢߒߚ‫ޕ‬ℂ⺰ߘߩ߽ߩߪࠊ߆ߞߡ޿ࠆߩߢ‫ߩߘޔ‬ේℂࠍ߽ߣߦ૞ࠆߩߢߔ߇‫ޔ‬ᱜ⏕ߦേߊ࠰ࡈ࠻ߦߔࠆߚ߼ߦ
ߪ 2‫ޔ‬3 ᐕ߆߆ࠅ߹ߒߚ‫ߩߘޕ‬ᓟ߽⎇ⓥቶߩ㒮↢߇ዋߒߕߟᚻࠍട߃ߡ޿ߞߡ‫⥄ޔ‬೨ߩኒᐲ᳢㑐ᢙ↪ߩࡊࡠࠣ࡜ࡓࡄ࠶ࠤ࡯ࠫࠍ૞ࠅ߹ߒߚ‫ߪࠕࠛ࠙࠻ࡈ࠰ߩߎޕ‬㕖Ᏹߦା㗬ᐲߩ㜞ߊ⦟޿߽ߩߢߔ‫ߡߞߥߦ੹ޕ‬⠨߃ࠆߣ‫ߢߎߎޔ‬㐿ᜏߒߚ࠰ࡈ࠻ࠍ߽ߞߣ૶޿ᤃߊߒߡ৻⥸ߦ౏㐿ߔࠇ߫‫ޔ‬ᐢߊቯ⌕ߒߚߩߢߪߥ޿߆ߣᱷᔨߦᕁ޿߹ߔ‫ޕ‬⥄ಽ߇⧰ᔃߒߡ૞ߞߚ࠰ࡈ࠻ߢ‫⁛ޔ‬භߒߡ߿ࠇ߫ߤࠎߤࠎ⺰ᢥ߇ᦠߌ߹ߔ‫ᧄޔߒ߆ߒޕ‬ᒰߪߎࠇࠍ਎⇇ਛߦ౏㐿ߒߡ⊝߇૶߃ࠆࠃ߁ߦߒߚᣇ߇‫ޔ‬਎ߩਛߩᓎߦ┙ߞߡ⽸₂߇ߢ߈ࠆߣ޿߁ߎߣߢߔ‫౏ߛߚޕ‬㐿߇ᣧߔ߉ࠆߣઁߢߤࠎߤࠎ૶ࠊࠇߡ‫ޔ‬ᚑᨐࠍขࠄࠇߡߒ߹߁‫ޕ‬ߘߩ౏㐿ߩ࠲ࠗࡒࡦࠣ߿ࡃ࡜ࡦࠬ߇߻ߟ߆ߒ޿ߢߔ‫ޕ‬ዊ᧻㧦ᒰᤨ‫ޔ‬਎⇇ߢߪߤߩ޽ߚࠅ߇వ↢ߩ⎇ⓥߦㄭ޿⎇ⓥࠍߒߡ޿߹ߒߚ߆㧫Ⴆ↰㧦ࡌ࡞࡝ࡦߩࡈ࡝࠶࠷࡮ࡂ࡯ࡃ࡯⎇ⓥᚲ߿ࠞ࡝ࡈࠜ࡞࠾ࠕ࡮ࡃ࡯ࠢ࡟ࠗᩞߥߤߢߔ‫ޕ‬ᄢቇߩ⎇ⓥቶߢߪቇ↢߇޿ࠈ޿ࠈ⎇ⓥ↪ߩ⸘▚ࡊࡠࠣ࡜ࡓࠍ૞ߞߡ޿߹ߔ߇‫ޔ‬තᬺߔࠆߣ
┙ᶖ߃ߦߥࠆߎߣ߇ᄙ޿ߩߢߔ‫৻ߩࠬࡦࠛࠗࠨߪ࠻ࡈ࠰ޕ‬Ⅳߣߒߡቇ↢߇૞ࠆߩߪ⦟޿ߩ
ߢߔ߇‫ޔ‬ቇ↢ࠍߘࠇߛߌߦ૶ߞߡߒ߹߁ߎߣߪߒߚߊߥ޿ߩߢ߿߻ࠍ߃ߥ޿ߎߣ߽޽ࠅ߹
ߔ‫ޔࠄߚߞߥߦ߁ࠃࠆߥߦ⊛⋡߇ߩ߽ߩߘࠅߊߟ࠻ࡈ࠰ޕ‬ቇ໧ߣߪ⸒߃ߥ޿ߣᕁ޿߹ߔ‫ޕ‬ ੹ߢߪࠦࡑ࡯ࠪࡖ࡞ࡌ࡯ࠬߢ࠰ࡈ࠻߇⥄↱ߦᚻߦ౉ࠅ‫⚻ޔ‬㛎ߩߥ޿ੱ߽૶߃߹ߔ‫ߛߚޕ‬40ߘߩᤨߦ໧㗴ߥߩߪ‫ߚߞߥߣޠࠬࠢ࠶ࡏࠢ࠶࡜ࡉޟ߇࠻ࡈ࠰ޔ‬႐วߢߔ‫⚿ޕ‬ᨐ߇ᱜߒ޿߆
ߤ߁߆್ᢿߢ߈߹ߖࠎ‫౉ޕ‬ജ߇㑆㆑ߞߡ޿ߡ߽᳇ߠ߆ߥ޿ߎߣ߽಴ߡ߈߹ߔ‫ࡏࠢ࠶࡜ࡉޕ‬࠶ࠢࠬౝߩ઀⚵ߺ߿‫ޔ‬ኻ⽎ߩ‛ℂ⃻⽎߇ࠃߊಽ߆ߞߡ޿ࠆੱ߇૶߁ಽߦߪࠃ޿ߩߢߔ߇‫ޕ‬ዊ᧻㧦‫ߩߣߎ߁૶ࠍޠࠬࠢ࠶ࡏࠢ࠶࡜ࡉޟ‬ᰳὐߪ‫ࠄ߆ߎߘޔ‬ᣂߒ޿⊒ዷ߇↢ࠇߥ޿‫ޕ‬ㆡ↪㒢⇇߿♖ᐲߩߤߎߦ໧㗴߇޽ࠆߩ߆್ᢿߢ߈ߥ޿‫ޕ‬Ⴆ↰㧦⴫㕙ߩ⎇ⓥߢߪ‫ޔ‬ᒰᤨࡎ࠶࠻ߥ⹤㗴ߛߞߚࠪ࡝ࠦࡦ‫ߩઁߩߘޔ‬ඨዉ૕⚿᥏⴫㕙ߩౣ᭴ᚑේሶ㈩೉‫ ߩ଀ޔ‬Si㧔111㧕㕙ߩ 77 ᭴ㅧߥߤ߽ᚻ߇ߌ߹ߒߚ‫ޕ‬ታ㛎⊛ߦߪ૗චߣ޿߁
᭴ㅧࡕ࠺࡞߇ឭ᩺ߐࠇߚߩߢߔ߇‫᧲ޔ‬Ꮏᄢߩ㜞ᩉᢎ᝼ߩ DAS ࡕ࠺࡞߇⦟޿ࠄߒ޿ߣ޿߁ߎ
ߣ߇‫ޔ‬Ბ‫ߦޘ‬ಽ߆ߞߡ᧪߹ߒߚ‫ᦨߒ߆ߒޕ‬ᓟߩ᳿߼ᚻߪ STM㧔⿛ᩏ࠻ࡦࡀ࡞㗼ᓸ㏜㧕ߢߒߚߨ‫ޕ‬ ߹ߚ‫ߩࡦࠦ࡝ࠪޔ‬㧔100㧕㕙ߩ᭴ㅧ߿േ⊛ㆊ⒟ߥߤ߇‫ޔ‬ታ㛎ߣℂ⺰ߣ߇දജߒߡᚑᨐࠍ↢ࠎߛ⴫㕙⎇ⓥߩᄢ߈ߥᵹࠇߢߒߚ‫ޕ‬ૐ᷷ߢߩ᷷ᐲ㗔ၞߏߣߦේሶౣ᭴ᚑߩ᭽ሶ߇ᄌࠊࠅ߹
ߔ‫ޕ‬STM ߦࠃࠆ᷹ⷰߢߪ‫ޔ‬㔚ሶᵈ౉ߦࠃࠆ㔚ሶബ⿠ߦࠃߞߡ⌀ߩ᭴ㅧ߇ᓇ㗀ࠍฃߌࠆߩߢ
න⚐ߢߪߥ޿ߩߢߔ‫ޔߚ߹ޕ‬ේሶ㑆ജ㗼ᓸ㏜ߢߪ STM ߦࠃࠆ߽ߩߣߪ⇣ߥࠆ᭴ㅧ߇⷗಴ߐ
ࠇ߹ߔ‫ᦨޔߒ߆ߒޕ‬ㄭߢߪ޽ࠆ⒟ᐲ‫ߩߎޔ‬໧㗴ߦ᳿⌕߇ߟ޿ߡ߈߹ߒߚ‫ޕ‬ ૐㅦࠗࠝࡦᢔੂಽశߦ㑐ㅪߒߡ‫ޔ‬ήᯏ᧚⎇㧔⃻‫᧚⾰‛ޔ‬ᢱ⎇ⓥᯏ᭴㧕ߩ㕍㊁ᱜ๺ߐࠎߣ
౒ห⎇ⓥߒߚ໧㗴߽㕙⊕߆ߞߚߢߔ‫⹜ޕ‬ᢱ⴫㕙ߦࡋ࡝࠙ࡓේሶࠍᒰߡࠆߣ෻኿ࠗࠝࡦߩࠛ
ࡀ࡞ࠡ࡯ࠬࡍࠢ࠻࡞ߦࡇ࡯ࠢ߇ 2 ߟ಴ࠆߩߢߔ߇‫౉ߪࠇߘޔ‬኿ࡋ࡝࠙ࡓࠗࠝࡦ߇޿ߞߚࠎ
ਛᕈൻߐࠇߡ߆ࠄౣࠗࠝࡦൻߔࠆࡊࡠ࠮ࠬ߇฽߹ࠇࠆߚ߼ߢ޽ࠆߎߣ߇ಽ߆ࠅ߹ߒߚ‫ޕ‬㔚
ሶ⒖േߣࠗࠝࡦߩㆇേߣ߇⛊ߺวߞߚേ⊛ㆊ⒟ߣߒߡ‫◲ޔ‬නߥℂ⺰⸃ᨆߢߔߴߡ⺑᣿ߢ߈ߚߣ߈ߪሜߒ߆ߞߚߢߔ߇‫৻ߪࠇߎޔ‬⒳ߩ᷹ⷰ໧㗴ߦ߽ߥߞߡ޿ࠆߩߢߔ‫ޕ‬ 㔚⇇⫳⊒ߩ⚛ㆊ⒟ߩ⎇ⓥ߽‫⥝ޔ‬๧޽ࠆ߽ߩߢߒߚ‫⹜ޕ‬ᢱࠍ㊎⁁ߦߒߡᒝ޿ᱜ㔚૏ࠍਈ߃‫ޔ‬ේሶࠍ৻ߟߕߟ⫳⊒ߐߖࠆࡔࠞ࠾࠭ࡓߩℂ⺰⊛⸃᣿ߢߔ‫ߪߦࡓ࠭࠾ࠞࡔߩߘޕ‬ᢿᾲᕈߣ㕖ᢿᾲᕈߩ┹ว߇޽ࠅߣߡ߽㕙⊕޿໧㗴ߥߩߢߔ߇‫ߩߘޔ‬⒖ࠅᄌࠊࠅࠍৼካߦℂ⺰⊛ߦ⸃᣿ߒ߹ߒߚ‫⸃ߣࠎߜ߈ߪߜߚ⑳ޕ‬ᨆߒߡḩ⿷ߒߚߩߢߔ߇‫ߡߞ޿ࠍߣߎ޿ߒ߆ߟ߻ࠅ߹޽ޔ‬߽ฃߌ߹ߖࠎߨ㧔╉޿㧕‫ޕ‬ ߣߎࠈ߇ߎߎᦨㄭߦߥࠅ߹ߒߡ㔚᳇ൻቇ♽‫ޔ߫߃଀ޔ‬㔚ᭂ⴫㕙ߦ߅ߌࠆ㉄ൻㆶర෻ᔕߦ
⥝๧ࠍᜬߟࠃ߁ߦߥࠅ߹ߒߚ‫ޕ‬㔚ሶ⒖േ߇࠻࡝ࠟ࡯ߔࠆṁᶧౝߩൻቇ෻ᔕㆊ⒟ߢߔ‫ޕ‬㔚⇇⫳⊒ߪ⿥㜞⌀ⓨਅߢߩ㊄ዻ⴫㕙਄ߩ⃻⽎ߢߒߚ߇‫੹ޔ‬ᐲߪ᳓ṁᶧౝߩ⇇㕙਄ߩ⃻⽎ߢ‫޽ޔ‬ࠆᗧ๧ߢߪ㔚⇇⫳⊒ߣ㘃ૃߒߚߘߩ⊒ዷ⊛ߥ⃻⽎ߣ޿߃߹ߔ‫ޕ‬WPI-AIMR ߢߩ⑳ߩ⎇ⓥቶ
ߩਛᔃ࠹࡯ࡑߩ৻ߟߦߒߚ޿ߣᕁߞߡ޿߹ߔ‫৻ޕ‬ᣇ‫ޔ‬STM ߿ AFM㧔ේሶ㑆ജ㗼ᓸ㏜㧕ߢⷰኤߐࠇࠆ㔚ᭂ࡮ṁᶧ⇇㕙਄ߩේሶ࡟ࡌ࡞᭴ㅧ‫ޔ‬േ⊛ᄌൻ‫ߣࠇߘޔ‬㔚ሶ⒖േ߇⺃⿠ߔࠆ෻ᔕߥߤߩℂ⺰ߣ߽㑐ㅪߐߖߡ⎇ⓥࠍㅴ߼ߚ޿ߣᕁߞߡ޿߹ߔ‫ޕ‬ ⿛ᩏ࠻ࡦࡀ࡞㗼ᓸ㏜㧔STM㧕߿ේሶ㑆ജ㗼ᓸ㏜㧔AFM㧕ߩℂ⺰⎇ⓥ߽‫࡯ࡢࡈࠗ࡜ߩ⑳ޔ‬
ࠢߩ৻Ⅳߣߥߞߡߒ߹޿߹ߒߚ‫ߩࠄࠇߎޕ‬ታ㛎ᴺ߇⊒᣿ߐࠇߚᒰೋߪ‫₸ᦛߗߥޔ‬ඨᓘ߇
10nm ⒟߽޽ࠆត㊎ߢ STM ௝ߣߒߡේሶ߇⷗߃ࠆߩ߆㧫ోߊಽ߆ࠄߥ߆ߞߚߩߢߔ‫ߚ⑳ޕ‬

41ߜߪ‫ޔ‬ត㊎ߣ⹜ᢱ⴫㕙ߩ෺ᣇߢ㔚ሶ⁁ᘒ⸘▚ࠍ⸘▚ߒ‫࡞ࡀࡦ࠻ࠄ߆ࠇߎޔ‬㔚ᵹࠍ⸘▚ߔࠆߎߣߦࠃࠅ‫ޔ‬ታ㛎ߢⷰኤߐࠇࠆࠃ߁ߥේሶዤᐲࠗࡔ࡯ࠫࠍౣ⃻ߔࠆߎߣߦᚑഞߒ߹ߒߚ‫ޕ‬ត㊎ߩᒻ⁁߿᭴ㅧ߇ߤߩࠃ߁ߦේሶዤᐲ௝ߦᓇ㗀ߔࠆ߆߽᣿ࠄ߆ߦ಴᧪߹ߒߚ‫ޕ‬ዊ᧻㧦ࡊࡠ࡯ࡉߩవ┵ߪ⃿⁁ߢߥߊ‫ޔ‬1 ේሶߣ޿߁ߎߣߢߔ߆‫ޕ‬Ⴆ↰㧦ߘ߁ߢߔ‫ᦨޕ‬వ┵ߩ 1 ේሶߦ࠻ࡦࡀ࡞㔚ᵹ߿ේሶ㑆ജ߇㓸ਛߒߡ޿ࠆߣ޿߁ߎߣߢߔ‫ ߢ߹ࠇߘޕ‬STM ߩℂ⺰ߢߪ‫ߩࡉ࡯ࡠࡊޔ‬వ┵ࠍቢోߥ⃿ኻ⒓ߦ઒ቯߒߡ㊎ߩ᭴ㅧߩലᨐ
ࠍ߈ߜࠎߣ⠨߃ߡ޿ߥ߆ߞߚߩߢߔ‫ޕ‬2 ߟએ਄ߩේሶ߇࠻ࡦࡀ࡞㔚ᵹߦ㑐ㅪߒߡߊࠆߣ‫ޔ‬੕޿ߦᐓᷤߒ޽ߞߡ߈ࠇ޿ߥ௝߇ᓧࠄࠇߥߊߥࠅ߹ߔ߇‫ޔ‬㊎వ┵ߦ৻୘ߛߌේሶ߇޽ࠆ႐ว
ߦߪ௝߇⷗੐ߦේሶಽ⸃⢻ࠍ␜ߔࠃ߁ߦߥࠅ߹ߔ‫ޕ‬ዊ᧻㧦ߎߩ⚿ᨐߪታ㛎ߩ⸘᷹ߦᵴ↪ߢ߈߹ߖࠎ߆㧫Ⴆ↰㧦ታ㛎ߛߌ߆ࠄߢߪℂ⸃ߢ߈ߥ޿ STM ௝߿ AFM ௝ߪᄙ޿ߩߢߔ߇‫ޔ‬ℂ⺰⸘▚ߦࠃࠅߎࠇࠄࠍᱜ⏕ߦ⸃㉼ߒ‫ޔ‬႐วߦࠃߞߡߪቯ㊂⊛ߦ⸃ᨆߔࠆߎߣ߇น⢻ߣߥࠅ߹ߔ‫ߦࠄߐޕ‬⿛ᩏဳࡊࡠ࡯ࡉ㗼ᓸ㏜㧔SPM㧕ߩᣂߒ޿ᯏ⢻ࠍℂ⺰⊛ߦ੍᷹ߒ‫ޔ‬ታ㛎ኅߦឭ⸒ߔࠆߎߣ߽
ߢ߈߹ߔ‫ᦨޕ‬ㄭߩ SPM ߩㅴᱠߪ‫ࠍ♽ࠝࠗࡃޔ‬฽߼ᐢ᳢ߥಽ㊁ߢ⋡ⷡ߹ߒߊ‫ޔ‬นⷞ‫⿒ޔ‬ᄖ‫ޔ‬⚡ᄖߩ㕖✢ᒻലᨐࠍ฽߼ߚߐ߹ߑ߹ߥಽశᴺߦ߽඘ᢜߔࠆࠃ߁ߦߥࠅߟߟ޽ࠅ߹ߔ߇‫ߘޔ‬ߩࠃ߁ߥ SPM ߩዷ㐿ࠍน⢻ߣߔࠆߚ߼ߦ SPM ℂ⺰ߩᓎഀߪ߹ߔ߹ߔᄢ߈ߊߥߞߡ޿߹ߔ‫ޕ‬߹ߚ‫ޔ‬AFM ߢේሶߩหቯ߿ේሶࠍേ߆ߔᠲ૞ࠍߔࠆߎߣ߇‫ᦨޔ‬ㄭߢߪน⢻ߣߥߞߡ޿߹
ߔ‫ߥ߁ࠃߩߎޕ‬ታ㛎ߦߥࠆߣ‫ޔ‬㊎వ┵ߩ⹦⚦ߥᒻ⁁߇ᓇ㗀ߔࠆࠃ߁ߦߥࠅ߹ߔ‫ߩߎޕ‬႐วߪ࠻ࡦࡀ࡞㔚ᵹߢߥߊේሶ㑆ജ߇ᧄ⾰⊛ߢߔ߇̖‫ޕ‬ዊ᧻㧦ߣߎࠈߢේሶ㑆ജߩታ૕ߪ૗ߢߔ߆㧫Ⴆ↰㧦㆙ᣇߢߪࡈࠔࡦ࠺࡞ࡢ࡯࡞ࠬജߢ‫ࡦࠝࠗޔ‬ൻߒߡ޿ࠇ߫㕒㔚᳇ജ⊛ߥ߽ߩ߽౉ࠅ߹
ߔ߇‫ޔ‬ត㊎ߣ⹜ᢱߣ߇ㄭធߔࠆߦߟࠇߡ‫ޔ‬ൻቇ⊛⋧੕૞↪ജߣ޿ߞߡᵄേ㑐ᢙߩ㊂ሶ⊛ᷙᚑലᨐߦࠃߞߡജ߇⊒↢ߒ߹ߔ‫ߣߞ߽ޕ‬ធㄭߔࠆߣࡄ࠙࡝ߩឃઁᓞߦ⿠࿃ߔࠆᒝ޿෻⊒ജ߇↢ߓ߹ߔ‫ޕ‬ේሶ㑆ജ㗼ᓸ㏜ߢߪ‫ޔ‬ᒁജ߇ዋߒߕߟᒝ߹ࠆ㗔ၞߢ⸘᷹ߒߡ޿߹ߔ‫ⶄޕ‬㔀ߥߩߪ㊎ో૕ߣߒߡߪᒁജࠍᗵߓ߹ߔ߇‫ޔ‬వ┵ㇱಽߪᢺജ߇௛߈ᆎ߼ߡ޿ࠆߎߣߢߔ‫ߩߎޕ‬ߎߣߪࠕ࠻ࡓ࡮ࡑ࠾ࡇࡘ࡟࡚ࠗࠪࡦߩࡔࠞ࠾࠭ࡓߦ⛊ࠎߢ߈߹ߔ‫ޕ‬ ៺ᡂജ㗼ᓸ㏜ߦ߽⥝๧ᷓ޿⊒⷗߇޽ࠅ߹ߔ‫ޕ‬AFM ត㊎ߢේሶ࡟ࡌ࡞ߩ៺ᡂࠍ⺞ߴߚታ㛎ߦࠃࠅ߹ߔߣ‫ޔ‬㊎ࠍᒁᒛࠆᣇะߣ⋥ⷺߩᣇะߦജ߇⊒↢ߒߚࠅߒ߹ߔ‫⁁ߥ߁ࠃߩߎޕ‬ᴫࠍ
ℂ⺰ࠪࡒࡘ࡟࡯࡚ࠪࡦߪ‫⷗ޔ‬੐ߦౣ⃻ߔࠆߎߣ߇ߢ߈߹ߔ‫ޕ‬ේሶ࡟ࡌ࡞ߩࠬ࠹࠶ࠢ࡮ࠬ࡝
࠶ࡊߦࠃࠅ‫៺ߥ߁ࠃߩߎޔ‬ᡂജ㗼ᓸ㏜௝߇ᒻᚑߐࠇࠆߎߣࠍ‫ޔ‬ℂ⺰ࠪࡒࡘ࡟࡯࡚ࠪࡦߩ⚿ᨐߪ␜ߒ߹ߒߚ‫ޕ‬ዊ᧻㧦ታ㛎ߢᓧࠄࠇߚߎߣࠍℂ⺰⊛ߦࠪࡒࡘ࡟࡯࡚ࠪࡦߒߡ⚊ᓧߔࠆߩߢߔ߆‫ޕ‬ㅒߦࡊ࡟࠺࡚ࠖࠢࠪࡦ㧔੍ᗐ㧕߽ߢ߈߹ߔ߆㧫Ⴆ↰㧦ߎࠇߪ߽ߜࠈࠎน⢻ߢߔ‫߫߃଀ޕ‬ᄢ߈ߥಽሶ߿ࠣ࡜ࡈࠚࡦౝㇱߦࠦࡅ࡯࡟ࡦ࠻ߥ㔚ᵹ߇ᵹࠇࠆߣ߈ߩౝㇱ㔚ᵹߦ‫ޔ‬ᒝ޿࡞࡯ࡊ㔚ᵹ߇ᵹࠇࠆߎߣࠍℂ⺰⊛ߦ੍⸒ߒߡ޿߹ߔ߇‫ޔ‬߹ߛ⏕⹺ߢ߈ࠆࠃ߁ߥታ㛎ߪߢ߈ߡ޿ߥ޿ࠃ߁ߢߔ‫ޕ‬SPM ߩࠪࡒࡘ࡟࡯࡚ࠪࡦߦ㑐ߒߡߪ‫ޔ‬42ᮡḰ⹜ᢱ߿ኻ⽎⹜ᢱߩ⸘᷹⚿ᨐ߆ࠄត㊎᭴ㅧߣ⹜ᢱ᭴ㅧߣࠍ᳿ቯߔࠆ‫ࠆࠁࠊ޿ޔ‬ㅒ໧㗴ࠍ⸃߈ߚ޿ߣᕁ޿߹ߒߡ੹⹜ߺߡ޿߹ߔ‫ޔߚ߹ޕ‬SPM ࠪࡒࡘ࡟࡯࡚ࠪࡦߩᓎഀߣߒߡߪ‫ޔ‬ታ㛎ߛߌߢߪోߊℂ⸃ߢ߈ߥ޿௝ߩᱜߒ޿⸃㉼ߣቯ㊂⊛ߥ⸃ᨆࠍߔࠆߎߣ߽޽ࠅ߹ߔ‫߃଀ޕ‬߫‫ޔ‬ṁᶧਛ⹜ᢱߩේሶ㑆ജ㗼ᓸ㏜ߩታ㛎࠺࡯࠲ߪ‫ߥ⊛ⷰ⋥ޔ‬₀௝߇ోߊឬߌߥ޿߽ߩ߇ᄙ
޿ߩߢߔ‫ߥ߁ࠃߩߎޕ‬႐วߦ‫ޔ‬ℂ⺰ࠪࡒࡘ࡟࡯࡚ࠪࡦߪᄢ߈ߥᆭജࠍ⊒ើߒ߹ߔ‫ޕ‬ዊ᧻㧦߹ߞߣ߁ߥℂ⺰ኅߪࠦࡦࡇࡘ࡯࠲ࠍ૶ࠊߥ޿ߥߤߣ޿޿߹ߔ߇㧫಴᧪ߥ޿߆ࠄࠦࡦ
ࡇࡘ࡯࠲ߦᜬߜㄟ߻ߥߤߣ޿߁ੱ߽޿߹ߔ߇‫ޕ‬Ⴆ↰㧦ߘ߁޿߁ੱ߽޿ࠆ߆߽ߒࠇ߹ߖࠎ㧔╉޿㧕‫ޕ‬ ⎇ⓥߦߪ಴ญ߇ᄢಾߥߎߣ߽‫ᦨޔ‬ㄭ‫ޕߚߒ߹ࠅߥߦ߁ࠃࠆߔ⼂⹺ޔ‬S㧼M ℂ⺰ߦ㑐ㅪߒߡ‫ޔ‬⃻࿷ JST㧔⁛┙ᴺੱ⑼ቇᛛⴚᝄ⥝ᯏ᭴㧕ߩవ┵⸘᷹ࡊࡠࠫࠚࠢ࠻ߦෳടߒߡ޿߹ߔ‫ࡠࡊޕ‬࠻࠲ࠗࡊߩࠪࡒࡘ࡟࡯࠲ࠍ૞ᚑߒߡ‫ࠍࠇߎޔ‬ታ⸽ታ↪ൻߔࠆ⸘↹ߢߔ‫ޕ‬ዊ᧻㧦ᤨઍߩⷐ᳞ߢߔ߆‫઀ޕ‬੐߇৻᧰ߢߔߨ‫ޕ‬Ⴆ↰㧦޿߿‫ᧄޔ‬ᒰߪߘߎߩߣߎࠈ߇ዋߒ㔍ߒ޿ߩߢߔ‫ߩࠬࡦࠛࠗࠨߢࠈߎߣߥ߁ࠃߩߘޕ‬㉑㉓๧߇ዋߒᄬࠊࠇࠆࠃ߁ߦ߽ᕁ޿߹ߔ߇‫␠ޔ‬ળ⊛ߥ⷗࿾߆ࠄߪ㊀ⷐߢߪߥ޿ߢߒࠂ߁߆‫ޕ‬ዊ᧻㧦ߘ߁ߢߔߨ‫ޕ‬ᷙᴋߣߒߚߣߎࠈߦߎߘ㕙⊕ߺ߇޽ࠅ‫ࠗࠔࡈࠆ߿߁߽ࠄߚ߈ߡߞ್ޔ‬࠻ࠍᄬ߁ߣ޿߁ߎߣ‫ߊࠃޔ‬ಽ߆ࠅ߹ߔ‫ޕ‬ታ㛎߽หߓߎߣ߇޽ࠅ߹ߔ‫ޕ‬Ⴆ↰㧦ᓥ᧪ߩ⑳ߩ⎇ⓥߩᵹ௾ߢߪ‫⷗ޔ‬ᒰ߇ߟ޿ߡߊࠆߣᱛ߼ߡ޿߹ߒߚ‫ߩߘޔߒ߆ߒޕ‬ㅒߦ‫߇⊝ޔ‬ಽ߆ߞߡ޿ࠆߣᕁߞߡ޿ࠆߎߣߩਛߦ‫ޔ‬ታߪᧄᒰߩߣߎࠈ߇ಽ߆ߞߡ޿ߥ޿ߎߣ
߽޽ࠅ‫ߚ߹ࠄ߆ߎߘޔ‬㕖Ᏹߦ㕟ᣂ⊛ߥ⑼ቇ߇㐿ߌࠆߣ޿߁ߎߣ߽޽ࠅ߁ࠆߩߢߪߥ޿ߢߒ
ࠂ߁߆㧫ዊ᧻㧦వ߶ߤߩ‫߁߽ޕߨߔߢޠࠬࠢ࠶ࡏࠢ࠶࡜ࡉޟ‬᳿߹ࠅಾߞߚ߽ߩߢౝኈࠍᬌ⸛ߔࠆߎ
ߣ߽ߒߥ޿‫ޕ‬Ⴆ↰㧦ߘߩὐߢ᦭ᯏ⭯⤑ߪ߽߁ታ↪ൻߐࠇߡ޿ࠆߩߦ૗ߢ߿ࠆߩߣ޿ࠊࠇࠆ߆߽ߒࠇ߹ߖ
ࠎ߇‫ޔ‬㔚ሶ⁁ᘒ߿㔚ሶ⒖േߦ㑐ㅪߒߡ‫ޔ‬ၮᧄ⊛ߥߣߎࠈ߇ࠃߊࠊ߆ߞߡ޿ߥ޿ߎߣ߇ᄙ޿
ߩߢߔ‫⇇ߥ⊛⾰ᧄ߽ߣߞ߽ޔ߫߃଀ޕ‬㕙ߢߩ㔚ᭂߣಽሶߣߩ࡝ࡦࠢ᭴ㅧߣߎࠇߦ㑐ଥߔࠆ㔚ሶ‛ᕈ߿㔚ሶ⒖േߩࡔࠞ࠾࠭ࡓߢߔ‫ߡ߃⿥ࠍ⁁⃻ޕ‬ᰴ਎ઍߩ↹ᦼ⊛ߥᯏ⢻♽ࠍ㐿⊒ߔࠆࠬ࠹࠶ࡊࠍน⢻ߣߔࠆߚ߼‫ޔ‬ಽሶ᨞ᯅ♽ࠍਛᔃߦ‫ޔ‬ၮᧄ⊛ߥߎߣࠍේሶ࡟ࡌ࡞ߢ⸃᣿ߒ߈
ߜࠎߣℂ⸃ߒߡ߅߈ߚ޿ߣᕁߞߡ޿߹ߔ‫ޕ‬หᤨߦಽሶߩᕁ޿߇ߌߥ޿㊂ሶ⊛ߥᯏ⢻ࠍត⚝ߒታ㛎ኅߦឭ⸒ߒߚ޿ߣᕁ޿߹ߔ‫ޕ‬ዊ᧻㧦ߘ߁޿߁ᗧ๧ߢߪߎࠇ߹ߢవ↢߇Ⓧߺ㊀ߨߡߎࠄࠇߚ⎇ⓥ߇ߎߩ WPI ߢᵴ߆ߖࠆ࠴
ࡖࡦࠬߢߔߨ‫ޕ‬Ⴆ↰㧦ߎߎߦߪ৻✜ߦ߿ߞߚࠄ㕙⊕޿ߎߣ߇ಽࠅߘ߁ߛߣ޿߁⎇ⓥ߇޿ߞ߬޿޽ࠅ߹ߔ‫ޕ‬ዊ᧻㧦⑳߇⸒߁ߩߪᄌߢߔ߇‫⼱᧼ޔ‬వ↢ߩᶧਛ STM ߿‫ޔ‬Ꮉፒవ↢ߩታ㛎‫ޔ‬BMG ߩ Shear bandߥߤ‫⥄ޕߨߔߢ߁ߘࠅ޽ࠈ޿ࠈ޿ޔ‬ὼߦࡈࡘ࡯࡚ࠫࡦ㧔Fusion㧕ߒ߹ߔߨ‫ޕ‬Ⴆ↰㧦⹦ߒߊ߅⹤ߒߔࠆᤨ㑆߽߽߁޽ࠅ߹ߖࠎ߇‫ޔ‬BMG ߽ℂ⺰ߩ┙႐߆ࠄ޿ࠈ޿ࠈߣ⎇ⓥߒߚ޿ߢߔߨ‫ޕ‬43ዊ᧻㧦వ↢ߩ⎇ⓥ਄ߩࡐ࡝ࠪ࡯߿ቇ↢ߐࠎߦࠃߊ⸒ߞߡ޿ࠆߎߣࠍᢎ߃ߡਅߐ޿߹ߖࠎ
߆㧫Ⴆ↰㧦᦬ਗߺߢߔ߇‫ߥᧉ⚛ߪࠬࡦࠛࠗࠨޔ‬ᅢᄸᔃߣ‫⸃ࠍࠇߎޔ‬᣿ߒࠃ߁ߣߔࠆᾲᗧߣ⁛ഃᕈߦዧ߈ࠆߣᕁ޿߹ߔ‫ߩੱޕ‬ᓟㅊ޿ߢߪ૗߽߿ࠇߥ޿‫ޕ‬୘ੱ߇ࡂࡦࠣ࡝࡯ߢ⌀೶ൎ⽶ࠍߔࠆߎߣߢߒࠂ߁߆‫ޕ‬ዊ᧻㧦ߘࠇߪߎߩ೨ߩࠗࡦ࠲ࡆࡘ࡯ߢ߽ IBM ߩࡌ࠼ࡁ࡞࠷ߐࠎ߇⸒ߞߡ޿߹ߒߚ߇‫ੱޟޔ‬ߣหߓᵹࠇߦਸ਼ࠄߥ޿‫ޕ‬႐วߦࠃߞߡߪᵹࠇߦㅒⴕߔࠆ‫ߣޠ‬หߓߢߔߨ‫ޕ‬Ⴆ↰㧦⑳ߪ WPI ߦ᧪ߐߖߡ޿ߚߛ޿ߡߔߏߊᐘߖߢߔ‫ޕ‬ዊ᧻㧦޿߿‫ޔ‬WPI ߽వ↢ߩࠃ߁ߥℂ⺰ኅ߇޿ࠆߎߣ߇ᐘߖߢߔ‫ࡏ࡜ࠗࠠߩࡦ࡚ࠫ࡯ࡘࡈޕ‬࡜࠻࡝࡯ߢߔ‫ޕ‬਎⇇ਛ߆ࠄఝ⑲ߥℂ⺰ኅߦ⍴ᦼ㑆ߢ߽޿޿߆ࠄ᧪ߡ޿ߚߛߊߎߣ߽߅㗿޿ߒߚ޿ߢߔ‫ޕ‬WPI ߪੱߦ᧪ߡ޿ߚߛߊ਄ߢߩ೙㒢߇ዋߥ޿ߪߕߢߔ߆ࠄ‫ޕ‬ ᦨᓟߦ‫ࠄ߆ࠇߎޔ‬િ߮ߡࠁߎ߁ߣߔࠆੱߚߜߦ৻⸒߅㗿޿ߒ߹ߔ‫ޕ‬Ⴆ↰㧦޿ࠈ޿ࠈ޽ࠅ߹ߔߨ‫ߪߟ৻ޕ‬ᜬ⛯ߒߚ⥝๧ࠍᜬߟߎߣ‫ޕ‬‫ޟ‬ᜬ⛯ߪജߥࠅ‫ߚޕߨߔߢޠ‬ߛߒ‫ߪࠇߎޔ‬㒢ቯߒߚಽ㊁ߢߒ߆߽᳿߹ߞߚᣇᴺ⺰ߢ⎇ⓥࠍ⛯ߌࠆߣ޿߁ᗧ๧ߢߪోߊ޽
ࠅ߹ߖࠎ‫⥄ޕ‬ಽߩ⚛ᧉߥ⊒ᗐࠍᄢ੐ߦߒߥ߇ࠄ‫⥄ޔ‬ὼ⃻⽎߿⑼ቇᛛⴚߩਛߢ‫߈⸃ࠄ⥄ޔ‬᣿߆ߒߚ޿ᄢ߈ߥ໧㗴ࠍ⊒⷗ߔࠆߎߣ‫⸃ߩߘޔ‬᳿ߦߖ߹ࠆߚ߼ߦಽ㊁ࠍ⿥߃ߡ޽ࠄࠁࠆⷺᐲ
߆ࠄ⎇ⓥࠍ⛯ߌࠆߣ޿߁ߎߣߢߔ‫ޕ‬ዊ᧻㧦ੱߪ⚿ዪߪᅢ߈ߥߎߣࠍ߿ߞߡ޿߹ߔߨ‫ޕ‬Ⴆ↰㧦ੱߦᒝ೙ߐࠇߡߔࠆߎߣߪ⛯߈߹ߖࠎߨ‫ߦ↱⥄ޕ‬ታ⾰⊛ߦ⥄ಽߢ⠨߃ߡߔࠆߎߣ߇
ߥ޿ߣ૗߽↢ࠇ߹ߖࠎߨ‫ޕ‬ዊ᧻㧦౨㒾ᔃ߇Ბ‫ޘ‬ዊߐߊߥߞߡ߈ߡ޿߹ߔߨ‫ޕ‬ዅᢘߔࠆ⎇ⓥ⠪ߤࠎߥੱߢߔ߆㧫Ⴆ↰㧦࡜ࡦ࠳࠙㧔Lev Davidovich Landau㧕ߢߔߨ‫ޕ‬ᓐߩࠃ߁ߦᚑࠅߚߊߡ߽ߥࠇ߹ߖࠎ
߇‫ޕߨߔߢੱ޿ߏߔޔ‬⠨߃ᣇ߇ࠢ࡝ࡗ࡯ߢߔߩߢ‫◲ޕ‬නߥ⴫⃻ߢᧄ⾰ࠍߟ߈߹ߔߨ‫ޕ‬ዊ᧻㧦੹ᣣߪᄢᄌീᒝߦߥࠅ߹ߒߚ‫ޕ‬ᄬᢌߩ⹤ߪ૛ࠅ޽ࠅ߹ߖࠎߢߒߚ߇‫ޔ‬ᄙಽ৻ߟߩ⎇ⓥߩⵣߦߪᄬᢌߩጊⓍߺ߇޽ࠆߣᕁ޿߹ߔ‫ޕߚߒ߹޿ߑߏ߁ߣ߇ࠅ޽ޕ‬2009 ᐕ 4 ᦬ 21 ᣣ
WPI-AIMR ࠕࡀ࠶ࠢࠬ᫟ PI Ⴆ↰ᝰᢎ᝼⎇ⓥቶߦߡ
߭ࠈߒ

ዊ᧻ ໪

44

Interview with Professor John H. PEREPEZKO, Professor,
University of Wisconsin-Madison & Adjunct Professor, WPI-AIMR“We must have a long view of science”---You cannot shorten time with extra money--Prof. Perepezko (P): I grew up in New York City and then when I was a teenager I
moved to a suburb called Long Island.
Prof. Komatsu (K): Long Island, I see. Beautiful place, maybe.
P: That is where I went to high school. Yes, it was a really good environment at thattime. I did my undergraduate work at the Polytechnic Institute of Brooklyn. The
name has changed a few times and it is now merged with New York University. There,
I studied metallurgical engineering. I was always interested in making things andworking with different types of materials. It was really fascinating to study formallydifferent materials and to work on laboratory experiments.
I remember once my father gave me some materials and said that if you are a goodmaterials person, tell me what these are. I had only a few tools at home, but I was able
to determine that they were actually semiconductors and he was very impressed.
K: It was right.
P: Yes, it turned out to be correct. After I finished my Masters program I went to
Pittsburgh and I worked for 2 years at the United States Steel Research Laboratory.
This was a very famous place at that time.
K: Yeah, U.S. Steel is a big company internationally known.
P: Right. The head of the laboratory was L. S. Darken.
K: Famous book “Physical Chemistry of Metals” was written by Darken and Gurry.
P: Darken and Gurry, yes. I was the youngest member and at lunch table were allthese famous people who published in the journals that I read.
K: Very good.
P: In fact, the group I was working in had the first Field Ion Microscope, atom probe
machines. This was in 1969. The man who made it was Sid Brenner. I went tograduate school in the evening at Carnegie Mellon University and worked during theday. After leaving U.S. Steel, I was able to finish my PhD degree full time. My
advisor was Professor Massalski.
K: T. B. Massalski is a famous teacher.
is well known.

“Structure of Metals” by Barret and Massalski

P: I was able to continue my interest in materials with him and work on phase45

transformations. During that time I became very interested in nucleation reactions andthat continues today. As you know, all transformations have to start somewhere andnucleation is an important aspect, including bulk metallic glasses where the objective is
to avoid nucleation. In order to control a transformation process you must understandthe mechanism.
K: You have been to Stanford?
P: No.
K: I thought you might have been in Stanford where you met Prof. Kazumi Nishioka
since he got Ph.D. at Stanford and I often heard your name from him. Then where did
you meet him?
P: I met him because he came to Michigan Technological University for a sabbaticaland he visited me in Madison. I had one of his students as a Ph.D. student in mylaboratory. That is how we made contact. We had some exchanges after this but his
department was precision mechanics and our communication decreased over time.
K: Yes, he graduated at Osaka University originally, and he got a position in
Tokushima University. Have you been to Tokushima?
P: No, I have not.
K: You have not been there?
P: No. I have visited many places in Japan but not Tokushima. Anyhow, nucleation
has been one of my main interests and also it relates to phase stability which is anotherimportant part of bulk metallic glasses. You know famous three golden rules ofProfessor Inoue are all related to phase stability.
K: Yes. So, your father was also an engineer?
P: No.
K: Because he put semiconductor to you.
P: Right. But he worked in the construction business. He would come to different
places and one time he was at a semiconductor plant.
K: That is why he had semiconductor.
P: Right. He did not tell me that though.
K: I see, very interesting.
P: Yes, now I have been in Madison for over 30 years at the University of Wisconsin
and it is a very nice town to live in. My children have grown up there and they haveenjoyed it very much. I have been able to work with many very bright students andsee them develop their careers afterwards. It is very nice.
K: Yes, and maybe next topics.
P: Motivation to science.

46

K: Yes, when it started?
P: When it started? I think as a small child I was always curious about things and I
built a little crystal radio.
K: That was about 1950?
P: Ye, you could build things like that in those days, simple things. I remember I
made some castings from lead alloys on the kitchen stove. I was also interested inalloys. Materials was something I enjoyed. I remember being fascinated to watch a
blacksmith once as a child and how he made this iron pieces.
K: Naturally, you developed taste for industries; mechanical or material science
gradually and you selected university in that sense.
P: Exactly.
K: Brooklyn Polytechnic Institute.
P: Right. And when I went to Pittsburgh, Carnegie Mellon University was the top
school and had a long history.
K: So you did some work in the Carnegie Mellon? What sort of work did you do?
P: My thesis work was on phase transformations, a solid-state transformation called themassive transformation.
K: And your professor was Massalski.
P: He was very famous in that area. I was growing single crystals using solid statephase transformation and I measured the kinetics of transformation.
K: What sort of material did you use?
P: I worked on iron- nickel alloys and also silver-aluminum alloys. I stayed a shorttime after my Ph.D. to do some postdoctoral work and then I got a call at Wisconsin.
At Wisconsin I started my work on solidification because during the time I was at
Carnegie Mellon, there were other graduate students studying rapid solidification. I
found rapid solidification to be interesting and started to work on that at Wisconsin.
K: I see. Around what time of the year?
P: This is 1975. Then, while at Wisconsin I worked with some colleagues and wedeveloped droplet techniques for getting very large liquid undercooling to study
formation of metastable phases and amorphous phases.
We made carefulmeasurements of some of the properties such as specific heat and analyzed the different
phases that are produced during solidification because these different phases havedifferent structures and different properties. This was in the early 1980s.
K: Did you do laser fusion?
P: No, we studies liquid droplets that showed a large undercooling during slow cooling.
I had a colleague in electrical engineering and I remember him telling me at lunch one

47

day that there were many problems in the microelectronics industry related tointerdiffusion between the very thin metal layers and that most of this was controlled bygrain boundary diffusion. I looked at him and I said “why not get rid of the grainboundaries?” And he said “how? The single crystal thin film growth was very
difficult.” I said “no, make the layer amorphous.”
We tried this strategy and it worked very well. We have some patents on it. The
method is used today. The transition from aluminum metallization to copper
metallization requires a very strong diffusion barrier to the silicon because copper
impurities in silicon destroy the semiconducting performance. It was very exciting to
be able to do that. This experience shows another very important aspect of materials
science in that you study in one area, but the principles and the experience can beapplied in many other areas. For example, I serve on Ph.D. committees in pharmacy.
K: In pharmacy?
P: It turns out that the companies that make drugs often use amorphous materials
because in the amorphous state they can get more homogenous mixing of thecomponents in the drug. They worry about the effect of moisture on changing theglass transition and causing crystallization. In other aspects, some of the structuresthat make up these drugs have different possible crystal structures; they are calledpolymorphs. Each polymorph will react differently with our bodies.
K: It depends on what kind of function is there.
P: Yes, a function is related directly to the structure and the composition.
important to be able to identify clear ways of making different structures.

It is

K: Very interesting.
P: I have also served on a Ph.D. committee for a student who was studying candy.
Many candies are wrapped in cellophane and when you pull the wrapper, the cellophane
should come off easily. But if the cellophane is moist, it sticks. This is because thecandy picks up moisture from the air and changes the glass transition temperature. I
learned much about amorphous materials by serving on these different committees.
This shows you how broad an application is working with glasses, because we do notappreciate that many of the materials we work with are actually amorphous. The drugs
that we take for health and the sweets that we enjoy for treats are all often amorphous.
K: Yeah, chocolate might be…
P: Chocolate, this is another interesting example. Chocolate that we buy in the store isin a metastable phase. On a hot summer day you can often get little white spots toform on the chocolate. This occurs because the metastable phase is transforming to astable phase which has a white color. The chocolate companies do not like this48

because the chocolate has to last on the shelf many months without change.
K: I see. They have to prevent this whitening.
P: When chocolate is made, it is cooled fast enough to get the preferred metastablephase. Chocolate is a very complex, multi-component material and the taste is related
to how fine grained this metastable phase is produced.
K: Maybe amorphous.
P: Well, not the chocolate, the metastable phase has different grain sizes.
is very sensitive for not just taste but also for feeling.

The tongue

K: Yes, indeed. Very interesting.
P: It has been very exciting to learn about new fields and see how the principles frommy field can be applied.
K: So your title of Ph.D. thesis was…
P: It was ‘Massive Transformations in Silver-Aluminum System.’
K: This brings you to understand similar phenomena on the basis of your experiments
and the interpretation.
P: Exactly. This illustrates some of the principles of research. The trend that ishappening today of more and more expansion of interdisciplinary activities, I think, is
an important one but we should be careful because you become diluted. There are stillsome very core subjects that must be covered. For example, there is a very popular
trend to go to biological materials.
With metals, ceramics, and polymers, we can deal with common types of structure
types and processing. When you consider the biological molecules, there is a whole
new language which you must learn; the biological terms. This is similar to learning a
new language but then once you learn this you see, all the principles are really similar;transport between cells, nucleation of cells.
K: OK, maybe one thing is a bit different from metallurgy is that they are using water.
Without water, no biological materials. That is quite a big difference.
P: It is a quite big difference, right. The interface between biological materials andinorganic materials is the key to controlling function. The compatibility is controlled
by the interactions between the water molecules and inorganic materials.
K: This is a kind of a new field which technologists have never experienced for a longtime.
P: Right, but at the same time biologists have never considered our field.
strangers are meeting.

It is like two

K: Yeah, this combination should be very productive in the future.
P: We hope so, yes. We certainly hope so. But I think we have to keep in mind that49

the basic core principles in the field must be retained. This is very important. The
body works because of certain chemistry and certain material reactions that allow you
take in food and make energy.
K: And also membrane is a sort of a critical value.
P: Right.
K: We have to go through.
P: I know one of the important applications of bulk metallic glasses that Professor Inoue
is looking at relates to using it medical applications, like dental applications where the
BMG offers high performance, good compatibility with the body, and low corrosion.
They are very important.
K: And you have found several things but please tell us your exciting findings here.
P: I think this use of amorphous metals, as diffusion barriers in microelectronics is one
example.
K: You have got it patented already.
P: Yes, I have a patent on it but this was a brand new application in amorphousmaterials.
K: How did you find this? There must be several difficulties you have to cross over.
P: Yes, the first was in trying to understand the details. Most of the work on materials
in this field has been done by electrical engineers who may have a poor understandingof material science. They start with silicon and then they have aluminum on it orcopper. During operation they see reactions between the layers. Their approach isput something between the reacting layers.
K: OK and they do not know about the phase diagram.
P: Right. They do not understand the phase diagram. They put another metal
between the layers and they get other reactions. Their solution is to add so that instead50

of having two metals, they put three, four. They keep adding complexity. When I
looked at the problem, I decided that you do not want to add complexity, but you wantto simplify the system because in terms of industrial applications or in terms of
reliability, fewer components is better.
K: Yes, sure.
P: I also recognized the grain boundary transport is very important in thin films.
we have to remove that and simplify.

I saidK: By the way, copper is very easy to diffuse in the silicon maybe.
P: That is correct.
K: So it was used for decoration or dislocation sometimes.
P: Exactly. In order to get the extra performance copper is used because it has a lower
electrical resistivity than aluminum so there is less heat generated. Modern
microelectronics have a high component density. Even though the current is verysmall in each component over a time the heat builds up. For example, my laptop is too
warm for my lap.
K: And heat dissipation is very important, efficient heat dissipation.
P: Exactly. You can improve the performance of materials by reducing theinefficiency.
K: Yes, heat is generated in vain.
P: Exactly. That is waste. With all the concern about energy, efficiency is important.
K: That is right.
P: For example, people are talking about the new sources of energy, but the easiest
source of energy is to make less waste then we have more useful energy. I think themetallic glasses can contribute to that in a very important way because they have many
functions in magnetic and electrical properties which can be very attractive. They are
truly multi-functional, not just structural but other functions.
K: Not excavated yet.
P: Not completely. I think the future is still very bright.
K: Nice expectation.
P: Thank you.
K: So what is your principles or motto which when you come across a difficulty?
P: Well, one of the important lessons I try to give to students when they come to mewith their results is to have them ask the right questions.
K: Yes, right question is important.
P: You have an understanding of the past experience from the literature. From thisknowledge you should be able to formulate a critical question or hypothesis. If this is51

true then maybe that is true. I will test this. That is my hypothesis and I will test it.
You have to have some working hypothesis. Often students will say, “Well, I am notsure, it could be this or it could be that.” I will tell them, “That is your question?”
K: Just try and find out.
P: Exactly. Because if you ask a good question, the result will always be maybe not
the answer you are expecting but a new result.
K: Yes, indeed. Good questions lead to good results.
P: Exactly. That is the most important lesson for students because they read in
textbooks the facts and the analysis of those facts is very clear. If you do not have theend of the chapter, just the beginning, how do you get to the end? That is the lesson toteach students and that is why graduate education is more than just lectures andclassroom or reading books. It is working with your faculty advisor to learn how toformulate these questions and how to design experiments to answer those questions.
K: How to sort out your experiments and what you extract from…
P: Exactly.
K: By your own eyes.
P: A message to the next generation is, that I think there is a bright
future in materials and many new properties to be discovered. Ten
years ago we did not have these special materials we have today. I
think I should point it out in the biological area there will be many
new advances. We will see benefits of joining of material science and biology.
K: However, in general the number of students interested in science has been
diminishing. So what can you say or what can you do to the people to get interested inscience and technology.
P: I think each one of us must make a commitment to reach out. I know in mylaboratory I have actually high school students who work with my graduate students.
K: Oh, really?
P: Yes. We have a program for the summer where the high school student is given
registration as a special student. Then, they work in my laboratory next to mygraduate students.
K: How many days?
P: They work for the summer period. I have had four students work for us. One
came back to material science as a major. My wife is a school teacher. She teaches
second grade and the one thing I noticed is that the young children are all scientists.
They have a natural curiosity, they want to seek answers.
K: That is very important.

52

P: They are always touching and examining.
K: That is right.
P: But then when they get older it is beaten out of them somehow.
K: Something wrong in education maybe.
P: Our education system maybe is too rigid. “You must learn just this but what about
that? No, no.”K: Non-elastic.
P: We have a fixed direction but curiosity and to ask questions what is this, what is that
– no, we ask only certain questions.
K: That is right.
P: You have to learn this. I will give you exam on only this.
K: Your wife studied science?
P: Education. One of my daughters, my older daughter is a biomedical engineer.
She works with materials. I have two younger daughters who are going to college
now.
K: I also got three daughters.
P: It is wonderful.
K: Yes, three daughters are wonderful.
P: When I give demonstrations to my wife’s class and it is very exciting to see thestudents’ reaction to them.
K: Yes. They have a pure interest about science or technology or nature.
P: We have programs in our university where the public schools come to our campus
and visit laboratories. We have a public open house where our students make exhibitsthat the public can come and see.
K: How many high schools boys or girls?
P: In Madison or in…?
K: To this summer school.
P: Oh, the summer school.
K: About 50 or 30?
P: Yes. About 50 and we also have a program for teachers.
K: Oh, even teachers, school teachers?
P: Yes, to come to the university and upgrade their understanding.
K: And you show the laboratories and equipments.
P: Exactly.
K: Dr. Max Lagally is also…
P: Yes, Professor Lagally is in my department.

53

K: A colleague?
P: Yes.
K: I see. He will also join the summer school.
P: Well, it is run mainly by the students but I know Professor Lagally gives
demonstrations and I have given demonstrations as well.
K: Every professor?
P: It is an individual choice. There are formal programs that are again very rigid in
their objective. I want more flexibility. I think that is important.
K: And you can sometimes learn from the amateur new things.
really important.

Their question is

P: Absolutely. I think you are absolutely correct. In the United States the number ofstudents entering science and engineering has been decreasing and there are all theseconcerns about trying to improve that.
K: Yes, and of course scientists or engineering technology should be paid much better
than the modern literature because salary is important.
P: Well, the benefit to society – in our world today we live in a technological society,the benefits are enormous.
K: So they have to pay a lot to the scientists or engineers, if they are very good.
P: We would hope so. I think this WPI program in Japan is an excellent example ofthe directions to the future because again we have many cultures coming together in thiscommon science. You get different perspectives and influence on this theme thatenhances the performance of each person and the output. During my recent visit to
Sendai I enjoyed working with the staff. I have a postdoctoral fellow who I worked
with closely but I enjoyed working with other students, graduate students and post-docs
in the institute and it was very nice. It is a very open atmosphere and you work very
hard.
K: Scientific world must be enjoyable, not be forced, but enjoyable, from bottom of theheart, open heart, open discussion.
P: Right.
K: And our life is nothing if it is too laborious and nothing gained. Then, nobody
wants to come to the science.
P: It is very satisfying to be able to ask the right questions and see the answers comeand then have this deeper understanding and say, oh now we can do this and it works.
Wow, that is great. That really is great.
K: Right. You do have a hobby or you like sports or reading or history.
P: I enjoy gardening.

54

K: Oh gardening, good. You have a big garden in Wisconsin?
P: A reasonable garden.
K: Flowers?
P: Mainly vegetables. We also have some special flowers and some fruit trees.
K: OK, all of your family works together?
P: Yes, my children work with me and they keep the garden watered when I am away
but we all enjoy the fresh vegetables in the summertime.
K: Very good.
P: And I enjoy going to symphonies. I wish I had more time to do more but…
K: Do you play yourself?
P: No.
K: OK, and what sort of symphony do you like?
P: Classical.
K: Yes, such as, composer?
P: Bach, and Mozart, and Beethoven.
K: Beethoven is your favorite or Mozart?
P: There is no special favorite. They are all good. Now reading, it is nice to be able
to read outside of science.
K: Yes, sure. You have to sometimes relax your brain.
P: It also gives you a better understanding of how people view some things. Often I
think science has become too political in this world. The politicians think that theyknow how to make science work but I am sorry to say that they do not..
K: I am sorry too.
P: I do not feel that they have the proper training and credentials to make scientificdecisions, but unfortunately the money that they decide to direct to certain areas
determines the science.
K: Money is very, very deficit.
P: I think one of the important lessons for the future is that we must have a long view ofscience. If it takes 10 years to achieve an objective then it cannot be achieved in 2
years with five times the amount of money. You cannot shorten time with extra
money. It still takes time for people to understand. The politicians do not understandthis.
K: They say just the amount of money can make everything clear.
impossible.

No, it is

P: There are big programs in energy now with large amounts of money and they want tosee fast results.

55

K: So to do this carefully
we have to know the natureofproduct
globally.
Humankind is too selfish
for the total biologicalworld.
P: Well, I think this global
view is one of the benefitsof the WPI.
It brings
together many different
groups like here in Grenoble, France, we have a little bit of Sendai.
K: Sure. What sort of book are you interested in?
P: Mostly true stories.
K: True stories, documentaries.
P: Yes, documentaries of events. I recently read some books on how business works
in the stock market and Wall Street because I was curious about these people who getsuch large bonuses and how they do their job. I had no idea how they make these
deals and it is very strange to me that they should make so much money.
K: It started from your curiosity just like science.
P: Exactly.
K: “What mechanism basically working?”
P: So I think we have covered everything.
K: We have covered almost everything. Thank you very much.
P: Yes, thank you.
K: I really enjoyed talking with you.
P: It is really enjoyable and I look forward to continuing my work with the WPI.
Interviewer: Prof. H. Komtasu
in the lobby of Hôtel Angleterre in Grenoble, August 25th, 200956

News Update

Dr. Yamamoto's 2008 Chemical Review paper is selected
as a featured New Hot Paper
We are happy to forward you a note by Thomson Reuters (ISI) to Yoshi Yamamoto,
our WPI Director, informing that one of his 2008 paper (Nitin T. Patil and Yoshinori
Yamamoto, “Coinage metal-assisted synthesis of heterocycles,” Chem. Rev. 108, pp.
3395–3442 (2008)) was selected as a featured New Hot Paper, being one of themost-cited papers (as you see below).
“Science Watch” is a bi-monthly periodical published by Thomson Reuters with widecirculations in global science community.
The citation profiles of Drs. Y. Yamamoto and M. Kawasaki, two highly citedresearchers of WPI-AIMR, follows just for your information.
Sent: Wednesday, November 25, 2009 5:08 AM
To: yoshi@mail.tains.tohoku.ac.jp
Subject: Thomson Reuters ScienceWatch has selected your article as a featured New
Hot Paper.
Dear Dr. Yoshinori Yamamoto,We are pleased to inform you that your article entitled “Coinage metal-assisted synthesisof heterocycles,” as published in the journal CHEMICAL REVIEWS in August, 2008, hasbeen identified by Thomson Reuters Essential Science Indicators as a featured New
Hot Paper in the field of Chemistry, which means it is one of the most-cited papers in its
discipline published during the past two years.
We are asking for your comments as corresponding author on the following questions andwe would like to add your response to the Thomson Reuters Science Watch website on
Monday, January 4, 2009 at the following link: http://www.sciencewatch.com/. You may
reply directly using this email.
Please be sure to include your current title and affiliation along with a personal photo(in .jpg, .gif, .bmp, .png, or tiff formats) which will be used to accompany your commentary.
You may also choose to provide as many as three images [along with text descriptions]which describe your research.
Essential Science Indicators is a resource that enables researchers to conduct ongoing,
quantitative analyses of research performance and track trends in science. Covering a
multidisciplinary selection of 11,000+journals from around the world, this in-depth
analytical tool offers data for ranking scientists, institutions, countries, and journals.
This unique and comprehensive compilation of science performance statistics andscience trends data is based on journal article publication counts and citation data fromthe Thomson Reuters scientific database. Available as a ten-year rolling file, ESI covers
10 million articles in 22 specific fields of research, and is updated every two months.
Yours Sincerely,
Doug Benson
Data Coordinator, Essential Science Indicators
Thomson Reuters

59

Citation of Y. Yamamoto
November 2009
Number of Papers found: 761, Sum of the Times Cited: 22,929,
Average Citations per Item: 30.13, h-index: 67

Only the recent 20 years are displayed.

Only the recent 20 years are displayed.

60



61

J.Org.Chem.47,119(1982).

LEWISACIDMEDIATEDREACTIONSOFORGANOCOPPERREAGENTSͲENTRAINMENTINTHECONJUGATEADDITIONTO
ALPHA,BETAͲUNSATURATEDKETONES,
ESTERS,ANDACIDSVIATHERCU.BF3SYSTEMYAMAMOTO,Y;YAMAMOTO,S;
YATAGAI,H;ISHIHARA,Y;
MARUYAMA,K

8

J.Am.Chem.Soc.102,7107
(1980).

ERYTHROͲSELECTIVEADDITIONOF
CROTYLTRIALKYLTINSTOALDEHYDESREGARDLESSOFTHEGEOMETRYOFTHE
CROTYLUNITͲSTEREOSELECTIONINDEPENDENTOFTHESTEREOCHEMISTRYOFPRECURSORSHeterocycles18,357(1982).

Angew.Chem.ͲInt.Edit.Engl.25,
947(1986).

SELECTIVESYNTHESISBYUSEOFLEWISͲACIDS
INTHEPRESENCEOFORGANOCOPPERAND
RELATEDREAGENTS

YAMAMOTO,Y;MARUYAMA,K

YAMAMOTO,Y

5

AccountsChem.Res.20,243
(1987).

ACYCLICSTEREOCONTROLVIAALLYLICORGANOMETALLICCOMPOUNDS

7

YAMAMOTO,Y

4

Article

Article

Note

Article

Review

Review

Chem.Rev.104,2127(2004).

TransitionͲmetalͲcatalyzedreactionsin
heterocyclicsynthesis

ORGANOͲMETALLICCOMPOUNDSFOR
STEREOREGULATEDSYNTHESISOFACYCLICSYSTEMSͲTHEIRAPPLICATIONTOTHE
SYNTHESISOFTHEPRELOGͲDJERASSILACTONICACID

Nakamura,I;Yamamoto,Y

3

Review

Chem.Rev.100,2901(2000).

YAMAMOTO,Y;YATAGAI,H;
NARUTA,Y;MARUYAMA,K

Saito,S;Yamamoto,Y

2

RecentadvancesinthetransitionͲmetalͲ
catalyzedregioselectiveapproachesto
polysubstitutedbenzenederivatives

Document
Type
Review

Source,Volume,pageandyear

SELECTIVEREACTIONSUSINGALLYLICMETALS Chem.Rev.93,2207(1993).

TI

6

YAMAMOTO,Y;ASAO,N

AU

1

 



Citation of Y. Yamamoto
November 2009

226

231

242

258

331

409

429

1238

TC

62

J.Am.Chem.Soc.120,4242
(1998).
Chem.Soc.Rev.28,199(1999).
J.Am.Chem.Soc.116,6019
(1994).
J.Am.Chem.Soc.100,3240
(1978).

PalladiumcatalysedpronucleophileadditiontounactivatedcarbonͲcarbonmultiplebonds
PALLADIUMͲCATALYZEDADDITIONOF
ACTIVATEDMETHYLENEANDMETHYNECOMPOUNDSTOALLENES
RCU.BF3.3.CONJUGATEADDITIONTOPREVIOUSLYUNREACTIVESUBSTITUTEDENOATEESTERSANDENOICACIDSYamamoto,Y;Radhakrishnan,U

YAMAMOTO,Y;ALMASUM,M;
ASAO,N

YAMAMOTO,Y;MARUYAMA,K

16

17

18

13

Catalyticasymmetricallylationofiminesvia
chiralbisͲpiͲallylpalladiumcomplexes

J.Org.Chem.56,4370(1991).

Nakamura,I;Yamamoto,Y

12

Nakamura,H;Nakamura,K;
Yamamoto,YAdv.Synth.Catal.344,111(2002).

TransitionmetalͲcatalyzedreactionsof
methylenecyclopropanes

Nakamura,H;Iwama,H;Yamamoto,
Y

15

J.Am.Chem.Soc.118,6641
(1996).

PalladiumͲandplatinumͲcatalyzedadditionofaldehydesandimineswithallylstannanes.
Chemoselectiveallylationofiminesinthe
presenceofaldehydesAsao,N;Takahashi,K;Lee,S;
Kasahara,T;Yamamoto,Y

11

14

J.Am.Chem.Soc.124,12650
(2002).

AuCl3Ͳcatalyzedbenzannulation:Synthesisof
naphthylketonederivativesfromoͲalkynylbenzaldehydeswithalkynes

YAMAMOTO,Y;NISHII,S;
MARUYAMA,K;KOMATSU,T;ITO,W

10

AHIGHLYSTEREOSELECTIVESYNTHESISOF(E)Ͳ
ALKENEDIPEPTIDEISOSTERESVIA
ORGANOCYANOCOPPERͲLEWISACIDMEDIATEDREACTION

J.Am.Chem.Soc.108,7778
(1986).

VERYHIGH1,2ͲASYMMETRICAND1,3Ͳ
ASYMMETRICINDUCTIONINTHEREACTIONSOFALLYLICBORONͲCOMPOUNDSWITH
CHIRALIMINES

9

IBUKA,T;HABASHITA,H;OTAKA,A;
FUJII,N;OGUCHI,Y;UYEHARA,T;
YAMAMOTO,Y

Tetrahedron40,2239(1984).

STEREOCONTROLANDREGIOCONTROLOF
ACYCLICSYSTEMSVIATHELEWISACIDMEDIATEDREACTIONOFALLYLICSTANNANESWITHALDEHYDESYAMAMOTO,Y;YATAGAI,H;
ISHIHARA,Y;MAEDA,N;
MARUYAMA,K

Note

Note

Review

Article

Article

Review

Article

Article

Article

Article

130

130

133

139

146

150

165

167

186

207

63

Article

Article

ArticleJ.Am.Chem.Soc.107,5968
(1985).
J.Am.Chem.Soc.125,10921
(2003).

LEWISACIDMEDIATEDREACTIONSOFORGANOCOPPERREAGENTSͲAREMARKABLY
J.Am.Chem.Soc.102,2318
ENHANCEDREGIOSELECTIVEGAMMAͲATTACK(1980).
OFALLYLICHALIDESANDDIRECTALKYLATION
OFALLYLICALCOHOLSVIARCUͲBF3SYSTEM
Pd(II)actssimultaneouslyasaLewisacidand
asatransitionͲmetalcatalyst:Synthesisof
J.Am.Chem.Soc.124,764(2002).
cyclicalkenylethersfromacetylenicaldehydes

J.Am.Chem.Soc.102,4548
(1980).

J.Am.Chem.Soc.126,7458
(2004).

LewisacidͲcatalyzedbenzannulationvia
unprecedented[4+2]cycloadditionofoͲ
alkynyl(oxo)benzenesandenynalswithalkynesPalladiumͲcatalyzedcontrolled
carbopalladationofbenzyne
ANEWPROCEDUREFORTHE
STEREOSELECTIVESYNTHESISOF(Z)Ͳ2Ͳ
ALKENYLSILANESANDALKENYLͲTINSAND
THEIRAPPLICATIONTOERYTHROͲSELECTIVE
SYNTHESISOFBETAͲALKYLALCOHOLDERIVATIVES
AuBr3Ͳcatalyzed[4+2]benzannulation
betweenanenynalunitandenol

Asao,N;Nogami,T;Lee,S;
Yamamoto,YRingopeninginthepalladiumͲcatalyzed
Tsukada,N;Shibuya,A;Nakamura,I;
J.Am.Chem.Soc.119,8123
hydrocarbonationofmethylenecyclopropanesYamamoto,Y(1997).
withpronucleophiles

J.Am.Chem.Soc.122,7280
(2000).

TRIANGULARPLATINUMANDNICKELCLUSTERSͲTHETINKERͲTOYCONSTRUCTION
OFCHAINSWITHHIGHNUCLEARITYUNDERWOOD,DJ;HOFFMANN,R;
TATSUMI,K;NAKAMURA,A;
YAMAMOTO,YYAMAMOTO,Y;YAMAMOTO,S;
YATAGAI,H;MARUYAMA,K

Asao,N;Nogami,T;Takahashi,K;
Yamamoto,YYoshikawa,E;Radhakrishnan,KV;
Yamamoto,YYATAGAI,H;YAMAMOTO,Y;
MARUYAMA,K

Asao,N;Aikawa,H;Yamamoto,Y

21

22

23

24

25

26

27

28

Article

Note

Article

Article

Article

ArticleChem.Lett.,681(1995).

CATALYTICADDITIONOFAROMATICCͲH
BONDSTOACETYLENESKAKIUCHI,F;YAMAMOTO,Y;
CHATANI,N;MURAI,S

20

Article

YAMAMOTO,Y;ITO,W

19

Tetrahedron44,5415(1988).

STUDIESONTHEREACTIONOFALPHAͲIMINOESTERSWITHORGANOMETALLICCOMPOUNDS

101

102

102

104

108

108

108

111

111

117

64

J.Am.Chem.Soc.106,5031
(1984).

VERYHIGH1,2ͲASYMMETRICINDUCTIONIN
THEREACTIONOFALLYLͲ9ͲBBNWITH
CERTAINIMINESͲEVIDENCEFORA
STEREOELECTRONICEFFECTTOENHANCETHE
CRAMSELECTIVITY
ZINCͲCHLORIDEASARADICALINITIATORAS
WELLASACHELATINGAGENT
Palladiumbenzoicacidcatalyzedhydroaminationofalkynes

YAMAMOTO,Y;KOMATSU,T;
MARUYAMA,K

YAMAMOTO,Y;ONUKI,S;YUMOTO,
M;ASAO,N

Kadota,I;Shibuya,A;Lutete,LM;
Yamamoto,Y

36

37

38

J.Org.Chem.64,4570(1999).

J.Am.Chem.Soc.116,421(1994).

J.Org.Chem.66,270(2001).

PalladiumͲcatalyzedadditionofalcohol
pronucleophilestoalkylidenecyclopropanes

Camacho,DH;Nakamura,I;Saito,S;
Yamamoto,Y35

J.Org.Chem.64,2614(1999).

YAMAMOTO,Y;MARUYAMA,K

33

34

TetrahedronLett.21,4607(1980).

ZIRCONIUMENOLATESASANEWERYTHROͲSELECTIVEALDOLCONDENSATIONREAGENTNakamura,I;Itagaki,H;Yamamoto,Y

32ChiralpiͲallylpalladiumͲcatalyzedasymmetric
allylationofimines:Replacementof
allylstannanesbyallylsilanes

LetterJ.Org.Chem.63,6458(1998).

Ringopeninginthehydroaminationof
methylenecyclopropanescatalyzedby
palladium

YAMAMOTO,Y;CHOUNAN,Y;
NISHII,S;IBUKA,T;KITAHARA,H

31

Nakamura,K;Nakamura,H;
Yamamoto,Y

Article

DIASTEREOSELECTIVITYOFTHECONJUGATEADDITIONOFORGANOCOPPERREAGENTSTOGAMMAͲALKOXYALPHA,BETAͲUNSATURATED J.Am.Chem.Soc.114,7652
CARBONYLDERIVATIVESͲIMPORTANCEOF
(1992).
THEREAGENTTYPEANDTHEDOUBLEͲBONDGEOMETRY

30

Article

Note

Note

ArticleLetter

Article

ArticleJ.Org.Chem.50,3115(1985).

DIASTEREOFACIALSELECTIVITYINTHE
REACTIONOFALLYLICORGANOMETALLICCOMPOUNDSWITHIMINESͲSTEREOELECTRONICEFFECTOFIMINEGROUPYAMAMOTO,Y;KOMATSU,T;
MARUYAMA,K

ArticleJ.Org.Chem.48,1286(1983).

OXIDATIONOFPRIMARYANDSECONDARYALCOHOLSBYTHECATALYSISOFPALLADIUMTAMARU,Y;YAMADA,Y;INOUE,K;
YAMAMOTO,Y;YOSHIDA,Z

29

81

82

83

83

88

91

92

96

99

101

65

J.Chem.Soc.ͲPerkinTrans.1,
1053(1987).
Angew.Chem.ͲInt.Edit.40,1298
(2001).

Novel[3+2]cycloadditionof
alkylidenecyclopropaneswithaldehydes
catalyzedbypalladium

HIRATAKE,J;INAGAKI,M;
YAMAMOTO,Y;ODA,J

Nakamura,I;Oh,BH;Saito,S;
Yamamoto,Y

46

44

45

43

ENANTIOTOPICͲGROUPDIFFERENTIATIONͲCATALYTICASYMMETRICRINGͲOPENINGOFPROCHIRALCYCLICACIDANHYDRIDESWITHMETHANOL,USINGCINCHONAALKALOIDSYAMAMOTO,Y;NISHII,S;YAMADA,J

42

J.Am.Chem.Soc.122,5662
(2000).

OGAWA,H;ONITSUKA,K;JOH,T;
TAKAHASHI,S;YAMAMOTO,Y;
YAMAZAKI,H

41

IndolesynthesisviapalladiumͲcatalyzed
intramolecularcyclizationofalkynesand
iminesOrganometallics7,2257(1988).

SYNTHESIS,CHARACTERIZATION,AND
MOLECULARͲSTRUCTUREOFMUͲETHYNEDIYLCOMPLEXES[X(PR3)MC=CM(PR3)2X](M=PD,
PT,R=ME,ET,NͲBU,X=CL,I)

IBUKA,T;NAKAI,K;HABASHITA,H;
HOTTA,Y;FUJII,N;MIMURA,N;
MIWA,Y;TAGA,T;YAMAMOTO,Y

40

Takeda,A;Kamijo,S;Yamamoto,Y

Angew.Chem.ͲInt.Edit.Engl.33,
652(1994).

ANOVELROUTETODIASTEREOMERICALLY
PURE(E)ͲALKENEDIPEPTIDEISOSTERESFROMBETAͲAZIRIDINYLͲALPHA,BETAͲENOATESBYTREATMENTWITHORGANOCOPPERREAGENTSYAMAMOTO,Y;YATAGAI,H;SAITO,
Y;MARUYAMA,K

39

J.Am.Chem.Soc.108,7116
(1986).

J.Org.Chem.49,1096(1984).

REGIOCHEMICALCONVERGENCEINTHE
REACTIONOFHETEROSUBSTITUTEDALLYLICCARBANIONSVIAALLYLICALUMINUMAND
BORONATECOMPLEXES

Ibuka,T;Mimura,N;Aoyama,H;
Akaji,M;Ohno,H;Miwa,Y;Taga,T;
Nakai,K;Tamamura,H;Fujii,N;
Yamamoto,Y

IMPORTANCEOFTHETIMINGOFBOND
BREAKINGANDBONDMAKINGINACETALTEMPLATESͲENANTIODIVERGENTSYNTHESISOFSTEROIDALSIDEͲCHAINS

J.Org.Chem.62,999(1997).

AthermodynamicpreferenceofchiralNͲmethanesulfonylandNͲarenesulfonyl2,3ͲcisͲ
3ͲalkylͲ2Ͳvinylaziridinesovertheir2,3ͲtransͲ
isomers:Usefulpalladium(0)Ͳcatalyzedequilibrationreactionsforthesynthesisof(E)Ͳ
alkenedipeptideisosteres

Article

Article

Article

Note

Article

Article

Article

Review

77

78

78

80

80

80

81

81

66

TetrahedronLett.40,4089(1999).

Synthesisofindenolsandindanonesvia
catalyticcyclicvinylpalladationofaromatic
aldehydes

Yoshikawa,E;Yamamoto,YGevorgyan,V;Quan,LG;Yamamoto,Y

MEGURO,M;ASAO,N;YAMAMOTO, YTTERBIUMTRIFLATECATALYZEDRINGͲYOPENINGOFAZIRIDINESWITHAMINES

48

49

50

Article

Article

Article

ENANTIOSELECTIVEADDITIONOF
DIETHYLZINCTOARYLALDEHYDESCATALYZEDBYCHIRALCOBALT(II)ANDPALLADIUM(II)
COMPLEXES

Synthesisof2,3Ͳdisubstitutedbenzofuransby
J.Am.Chem.Soc.127,15022
platinumͲolefinͲcatalyzedcarboalkoxylationof
(2005).oͲalkynylphenylacetals
DirectMannichandnitroͲMannichreactionswithnonͲactivatedimines:AgOTfͲcatalyzed
additionofpronucleophilestoorthoͲ
alkynylarylaldiminesleadingto1,2Ͳ
dihydroisoquinolines

OGUNI,N;OMI,T;YAMAMOTO,Y;
NAKAMURA,A

Nakamura,I;Mizushima,Y;
Yamamoto,YAsao,N;Yudha,S;Nogami,T;
Yamamoto,Y

53

54

55

Angew.Chem.ͲInt.Edit.44,5526
(2005).

Chem.Lett.,841(1983).

Article

ArticleGoldͲcatalyzedintermolecularhydroamination
Angew.Chem.ͲInt.Edit.45,3314
ofalleneswitharylaminesandresultinghigh(2006).
chiralitytransfer

J.Am.Chem.Soc.103,1969(1981).

Nishina,N;Yamamoto,YYAMAMOTO,Y;YATAGAI,H;
MARUYAMA,K

Article

Article

Article

Article52

51

REACTIONOFALLYLICBORONAND
ALUMINUMATECOMPLEXESWITHORGANICHALIDESANDCARBONYLͲCOMPOUNDSͲ
TRIALKYLBORANESASREGIOͲSELECTIVE,
STEREOSELECTIVEANDCHEMOSELECTIVECONTROLELEMENTS

Angew.Chem.ͲInt.Edit.39,173
(2000).

PalladiumͲcatalyzedintermolecularcontrolled
insertionofbenzyneͲbenzyneͲalkeneand
benzyneͲalkyneͲalkeneͲSynthesisofphenanthreneandnaphthalenederivatives

TetrahedronLett.35,7395(1994).

TetrahedronLett.39,5421(1998).

Meguro,M;Yamamoto,Y47

Anewmethodforthesynthesisofnitrogen
heterocyclesviapalladiumcatalyzed
intramolecularhydroaminationofallenes

73

73

75

75

76

76

76

76

77

67

TOTALSYNTHESISOFHEMIBREVETOXINͲB

YAMAMOTO,Y;YAMADA,J;
KADOTA,I

KADOTA,I;JUNGYOUL,P;
KOUMURA,N;POLLAUD,G;
MATSUKAWA,Y;YAMAMOTO,YYAMAMOTO,Y;NISHII,S;IBUKA,T

57

58

59

ArticleNote

Thetwocomponentpalladiumcatalystsystem
TetrahedronLett.38,6071(1997).
forintermolecularhydroaminationofallenes
AMIDECUPRATEREAGENTSASANEWCLASSOFNITROGENNUCLEOPHILESͲAPPLICATION
TOASYMMETRICͲSYNTHESISOFBETAͲLACTAMS

AlMasum,M;Meguro,M;
Yamamoto,YYAMAMOTO,Y;ASAO,N;UYEHARA,
T

63

64

J.Am.Chem.Soc.114,5427
(1992).

Angew.Chem.ͲInt.Edit.38,3365
(1999).

PalladiumͲcatalyzedhydroalkoxylationof
methylenecyclopropanes

Camacho,DH;Nakamura,I;Saito,S;
Yamamoto,Y

Article

Article62

J.Am.Chem.Soc.99,8068(1977).

NOVELCLASSOFALKYLATINGREAGENT,
RCU.BF3.SUBSTITUTIONOFALLYLHALIDESWITHCOMPLETEALLYLICREARRANGEMENTMARUYAMA,K;YAMAMOTO,Y

61

ArticleJ.Chem.Soc.ͲChem.Commun.,
162(1981).

60

ERYTHROͲSELECTIVEALDOLCONDENSATION
VIATRIPHENYLTINENOLATESͲSTEREOSELECTIONINDEPENDENTOFTHE
STEREOCHEMISTRYOFTHEENOLATESYAMAMOTO,Y;YATAGAI,H;
MARUYAMA,K

Article

DIASTEREOSELECTIVITYOFCONJUGATEADDITIONTOGAMMAͲALKOXYͲALPHA,BETAͲUNSATURATEDESTERSVIAORGANOCOPPERͲ
J.Chem.Soc.ͲChem.Commun.,
LEWISACIDSANDRELATEDREAGENTSͲ
464(1987).
IMPORTANCEOFTHEDOUBLEͲBONDGEOMETRYINCONTROLLINGTHESELECTIVITY

Article

Article

STEREOCONTROLLEDINTRAMOLECULARCYCLIZATIONOFOMEGAͲTRIBUTYLSTANNYL
TetrahedronLett.32,7069(1991).
ETHERALDEHYDESͲSYNTHESISOFTHE6.7.7.6
RINGͲSYSTEMOFPOLYCYCLICETHERS

Fernandes,RA;Stimac,A;
Yamamoto,Y

56

TetrahedronLett.36,5777(1995).

Article

ChiralbisͲpiͲallylpalladiumcomplexcatalyzed
asymmetricallylationofimines:Enhancement J.Am.Chem.Soc.125,14133
oftheenantioselectivityandchemicalyieldin (2003).
thepresenceofwater

69

69

69

70

70

70

70

71

73

68



Org.Lett.4,3509(2002).

J.Org.Chem.54,4734(1989).

Radicaladditionofetherstoiminesinitiated
bydimethylzinc
NEWMETHODFORTHESYNTHESISOFBͲ10
CONTAININGNUCLEOSIDEDERIVATIVESFOR
NEUTRONͲCAPTURETHERAPYVIA
PALLADIUMͲCATALYZEDREACTION
Amphiphiliccatalyticallylatingreagent,bisͲpiͲ
allylpalladiumcomplex
AnewpalladiumͲcatalyzedbenzannulationof
conjugatedenynes

Yamada,K;Fujihara,H;Yamamoto,
Y;Miwa,Y;Taga,T;Tomioka,K

YAMAMOTO,Y;SEKO,T;NEMOTO,
H

Nakamura,H;Shim,JG;Yamamoto,Y

Saito,S;Salter,MM;Gevorgyan,V;
Tsuboya,N;Tando,K;Yamamoto,Y

67

68

69

70

J.Chem.Soc.ͲChem.Commun.,
157(1992).

TetrahedronLett.30,4255(1989).

SYNTHESISOFCARBORANESCONTAINING
NUCLEOSIDEBASESͲUNEXPECTEDLYHIGHCYTOSTATICANDCYTOCIDALTOXICITYTOWARDSCANCERͲCELLSAMINOLEADCOMPOUNDSASANEW
REAGENTFORREGIOSELECTIVERINGͲOPENINGOFEPOXIDESYAMAMOTO,Y;SEKO,T;
NAKAMURA,H;NEMOTO,H;HOJO,
H;MUKAI,N;HASHIMOTO,YYAMADA,J;YUMOTO,M;
YAMAMOTO,Y

71

72

J.Am.Chem.Soc.118,3970
(1996).

J.Am.Chem.Soc.119,8113
(1997).

Chem.Rev.108,3395(2008).

CoinagemetalͲassistedsynthesisofheterocycles

Patil,NT;Yamamoto,Y

66

TetrahedronLett.32,4505(1991).

SUZUKI,T;SATO,O;HIRAMA,M;
YAMAMOTO,Y;MURATA,M;
YASUMOTO,T;HARADA,N

65

ENANTIOSELECTIVESYNTHESISOFTHEABͲ
RINGFRAGMENTOFGAMBIERTOXINͲ4BͲ
IMPLICATIONFORTHEABSOLUTEͲ
CONFIGURATIONOFGAMBIERTOXINͲ4BANDCIGUATOXINArticle

Article

Article

ArticleLetter

Article

Review

Article

67

67

67

67

68

68

68

69

Citation of M. Kawasaki
December 2009
Number of Papers found: 477; Sum of the Times Cited: 15,872,
Average Citations per Item: 33.27; h-index: 61

Only the recent 20 years are displayed.

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69



70



Matsumoto, Y; Murakami, M; Shono,
T; Hasegawa, T; Fukumura, T;
1 Kawasaki, M; Ahmet, P; Chikyow, T;
Koshihara, S; Koinuma, H
Tang, ZK; Wong, GKL; Yu, P;
2 Kawasaki, M; Ohtomo, A; Koinuma,
H; Segawa, Y
Tsukazaki, A; Ohtomo, A; Onuma, T;
Ohtani, M; Makino, T; Sumiya, M;
3 Ohtani, K; Chichibu, SF; Fuke, S;
Segawa, Y; Ohno, H; Koinuma, H;
Kawasaki, M
Ohtomo, A; Kawasaki, M; Koida, T;
4 Masubuchi, K; Koinuma, H; Sakurai,
Y; Yoshida, Y; Yasuda, T; Segawa, Y
Zu, P; Tang, ZK; Wong, GKL;
5 Kawasaki, M; Ohtomo, A; Koinuma,
H; Segawa, Y
KAWASAKI, M; TAKAHASHI, K;
MAEDA, T; TSUCHIYA, R;
6 SHINOHARA, M; ISHIYAMA, O;
YONEZAWA, T; YOSHIMOTO, M;
KOINUMA, H
Fukumura, T; Jin, ZW; Ohtomo, A;
7
Koinuma, H; Kawasaki, M
Fukumura, T; Jin, ZW; Kawasaki, M;
8 Shono, T; Hasegawa, T; Koshihara,
S; Koinuma, H
Jin, ZW; Fukumura, T; Kawasaki, M;
Ando, K; Saito, H; Sekiguchi, T; Yoo,9YZ; Murakami, M; Matsumoto, Y;
Hasegawa, T; Koinuma, H

AU

Science 266, 1540 (1994)

Appl. Phys. Lett. 75, 3366 (1999)
Appl. Phys. Lett. 78, 958 (2001)

Appl. Phys. Lett. 78, 3824 (2001)

An oxide-diluted magnetic semiconductor: Mndoped ZnO
Magnetic properties of mn-doped ZnOHigh throughput fabrication of transition-metaldoped epitaxial ZnO thin films: A series ofoxide-diluted magnetic semiconductors andtheir properties

Appl. Phys. Lett. 72, 2466 (1998)

MgxZn1-xO as a II-VI widegap semiconductor
alloy

ATOMIC CONTROL OF THE SRTIO3
CRYSTAL-SURFACENat. Mater. 4, 42 (2005)

Repeated temperature modulation epitaxy for
p-type doping and light-emitting diode basedon ZnO

Solid State Commun. 103, 459(1997)

Appl. Phys. Lett. 72, 3270 (1998)

Room-temperature ultraviolet laser emission
from self-assembled ZnO microcrystallite thin
films

Ultraviolet spontaneous and stimulated
emissions from ZnO microcrystallite thin films
at room temperature

Science 291, 854 (2001)

Source,volume,pageandyearRoom-temperature ferromagnetism intransparent transition metal-doped titanium
dioxideTICitation of M. Kawasaki
December 2009

ArticleArticleArticleArticleArticleArticleArticleArticleArticleDocument
type

262

288

316

511

533

562

640

973

980

TC

71

12

145

143

Appl. Phys. Lett. 57, 727 (1990)

Appl. Phys. Lett. 75, 2635 (1999)

Science 302, 92 (2003)

Phys. Status Solidi B-Basic Res.
202, 669 (1997)

J. Phys. Soc. Jpn. 68, 3790 (1999) Article
Jpn. J. Appl. Phys. Part 2 - Lett.
Express Lett. 44, L643 (2005)
Appl. Phys. Lett. 77, 975 (2000)

Appl. Phys. Lett. 77, 2204 (2000)

Jpn. J. Appl. Phys. Part 2 - Lett.
38, L603 (1999)

Single crystalline ZnO films grown on latticematched ScAlMgO4(0001) substrates
The anomalous Hall effect and magnetic
monopoles in momentum space
Growth of ZnO thin film by laser MBE: Lasingof exciton at room temperature
Orbital-state-mediated phase-control ofmanganites
Blue light-emitting diode based on ZnO
Room-temperature luminescence of excitonsin ZnO/(Mg, Zn)O multiple quantum wells on
lattice-matched substrates
Room-temperature stimulated emission of
excitons in ZnO/(Mg, Zn)O superlattices
Combinatorial laser molecular beam epitaxy(MBE) growth of Mg-Zn-O alloy for band gap
engineering

ArticleArticleArticleArticleProceedings
Paper

ArticleArticleArticle

130

131

133

148

154

155

174

198

227

LOW-NOISE YBA2CU3O7-DELTA GRAINBOUNDARY JUNCTION DC SQUIDSArticleArticleAppl. Phys. Lett. 75, 980 (1999)

Appl. Phys. Lett. 85, 4073 (2004)

235

Hysteretic current-voltage characteristics andresistance switching at a rectifying
Ti/Pr0.7Ca0.3MnO3 interface
Structure and optical properties of
ZnO/Mg0.2Zn0.8O superlattices

ArticleSawa, A; Fujii, T; Kawasaki, M;
Tokura, Y

Ohtomo, A; Kawasaki, M; Ohkubo, I;
Koinuma, H; Yasuda, T; Segawa, Y
GROSS, R; CHAUDHARI, P;
13 KAWASAKI, M; KETCHEN, MB;
GUPTA, A
Ohtomo, A; Tamura, K; Saikusa, K;
14 Takahashi, K; Makino, T; Segawa, Y;
Koinuma, H; Kawasaki, M
Fang, Z; Nagaosa, N; Takahashi,
KS; Asamitsu, A; Mathieu, R;
15
Ogasawara, T; Yamada, H;
Kawasaki, M; Tokura, Y; Terakura, K
Segawa, Y; Ohtomo, A; Kawasaki,
16 M; Koinuma, H; Tang, ZK; Yu, P;
Wong, GKL
Konishi, Y; Fang, Z; Izumi, M;
17 Manako, T; Kasai, M; Kuwahara, H;
Kawasaki, M; Terakura, K; Tokura, Y
Tsukazaki, A; Kubota, M; Ohtomo, A;
18 Onuma, T; Ohtani, K; Ohno, H;
Chichibu, SF; Kawasaki, M
Makino, T; Chia, CH; Tuan, NT; Sun,19 HD; Segawa, Y; Kawasaki, M;
Ohtomo, A; Tamura, K; Koinuma, H
Ohtomo, A; Tamura, K; Kawasaki, M;
Makino, T; Segawa, Y; Tang, ZK;
20
Wong, GKL; Matsumoto, Y;
Koinuma, H
Matsumoto, Y; Murakami, M; Jin,
21 ZW; Ohtomo, A; Lippmaa, M;
Kawasaki, M; Koinuma, H

11

Yasuda, T; Koinuma, H

Appl. Phys. Lett. 78, 1237 (2001)

Band gap engineering based on MgxZn1-xO
and CdyZn1-yO ternary alloy films

Makino, T; Segawa, Y; Kawasaki, M;

10 Ohtomo, A; Shiroki, R; Tamura, K;

72

Makino, T; Chia, CH; Tuan, NT;

KAWASAKI, M; CHAUDHARI, P;
GUPTA, A

Mater. Sci. Eng. B-Solid State
Mater. Adv. Technol. 56, 239(1998)
Jpn. J. Appl. Phys. Part 2 - Lett.
40, L1204 (2001)

Phys. Rev. B 70, 224403 (2004)

Appl. Phys. Lett. 72, 824 (1998)

Appl. Phys. Lett. 78, 2700 (2001)

Phys. Rev. B 42, 10735 (1990)

J. Cryst. Growth 184, 601 (1998)

Excitonic ultraviolet laser emission at room
temperature from naturally made cavity in ZnO
nanocrystal thin films
Ferromagnetism in co-doped TiO2 rutile thinfilms grown by laser molecular beam epitaxy

Colossal electroresistance of aPr0.7Ca0.3MnO3 thin film at room temperature
Determination of surface polarity of c-axis
oriented ZnO films by coaxial impact-collision
ion scattering spectroscopy
Large magneto-optical effect in an oxide
diluted magnetic semiconductor Zn1-xCoxO
SCALING BEHAVIOR IN ELECTRICAL
TRANSPORT ACROSS GRAINBOUNDARIES IN YBA2CU3O7-DELTA
SUPERCONDUCTORS
Room-temperature gain spectra and lasing in
microcrystalline ZnO thin films

GROSS, R; CHAUDHARI, P;
31
KAWASAKI, M; GUPTA, A

32 Kawasaki, M; Ohtomo, A; Koinuma,

H; Segawa, Y

Yu, P; Tang, ZK; Wong, GKL;

J. Appl. Phys. 89, 7284 (2001)

Magneto-optical properties of ZnO-based
diluted magnetic semiconductors

Appl. Phys. Lett. 76, 3549 (2000)

Phys. Rev. Lett. 68, 1065 (1992)

Jpn. J. Appl. Phys. Part 2 - Lett.
42, L347 (2003)

1/F NOISE IN YBA2CU3O7-DELTA
SUPERCONDUCTING BICRYSTAL GRAINBOUNDARY JUNCTIONS
Exciton spectra of ZnO epitaxial layers on
lattice-matched substrates grown with lasermolecular-beam epitaxy
High mobility thin film transistors withtransparent ZnO channels

A; Tamura, K; Koinuma, H
Nishii, J; Hossain, FM; Takagi, S;
Aita, T; Saikusa, K; Ohmaki, Y;
24 Ohkubo, I; Kishimoto, S; Ohtomo, A;
Fukumura, T; Matsukura, F; Ohno, Y;
Koinuma, H; Ohno, H; Kawasaki, M
Ando, K; Saito, H; Jin, ZW;
25 Fukumura, T; Kawasaki, M;
Matsumoto, Y; Koinuma, H
Kawasaki, M; Ohtomo, A; Ohkubo, I;
26 Koinuma, H; Tang, ZK; Yu, P; Wong,
GKL; Zhang, BP; Segawa, Y
Matsumoto, Y; Takahashi, R;
Murakami, M; Koida, T; Fan, XJ;
27 Hasegawa, T; Fukumura, T;
Kawasaki, M; Koshihara, SY;
Koinuma, H
Odagawa, A; Sato, H; Inoue, IH;
28 Akoh, H; Kawasaki, M; Tokura, Y;
Kanno, T; Adachi, H
Ohnishi, T; Ohtomo, A; Kawasaki, M;
29 Takahashi, K; Yoshimoto, M;
Koinuma, H
Ando, K; Saito, H; Jin, ZW;
30 Fukumura, T; Kawasaki, M;
Matsumoto, Y; Koinuma, H

23 Segawa, Y; Kawasaki, M; Ohtomo,

22

Proceedings
Paper

Note

ArticleArticleArticleArticleProceedings
Paper

Proceedings
Paper

ArticleArticleArticle

100

100

106

106

107

108

116

121

124

127

127

73

Fujii, T; Kawasaki, M; Sawa, A;
Akoh, H; Kawazoe, Y; Tokura, Y

Tsukazaki, A; Ohtomo, A; Kita, T;
Ohno, Y; Ohno, H; Kawasaki, M

43

44

Segawa, Y; Koinuma, H
Zhang, BP; Binh, NT; Wakatsuki, K;
40 Segawa, Y; Yamada, Y; Usami, N;
Kawasaki, M; Koinuma, H
Murakami, M; Matsumoto, Y;
Nakajima, K; Makino, T; Segawa, Y;
41
Chikyow, T; Ahmet, P; Kawasaki, M;
Koinuma, H
Sun, HD; Makino, T; Segawa, Y;
42 Kawasaki, M; Ohtomo, A; Tamura, K;
Koinuma, H

39 Tsukazaki, A; Kawasaki, M; Sota, T;

Koida, T; Chichibu, SF; Uedono, A;

KAWASAKI, M; SARNELLI, E;
38 CHAUDHARI, P; GUPTA, A;
KUSSMAUL, A; LACEY, J; LEE, W

Toyosaki, H; Fukumura, T; Yamada,
Y; Nakajima, K; Chikyow, T;
33
Hasegawa, T; Koinuma, H;
Kawasaki, M
Yamada, H; Ogawa, Y; Ishii, Y; Sato,34
H; Kawasaki, M; Akoh, H; Tokura, Y
Fukumura, T; Ohtani, M; Kawasaki,
M; Okimoto, Y; Kageyama, T; Koida,35
T; Hasegawa, T; Tokura, Y;
Koinuma, H
Izumi, M; Konishi, Y; Nishihara, T;
36 Hayashi, S; Shinohara, M; Kawasaki,
M; Tokura, Y
Fukumura, T; Yamada, Y; Toyosaki,
37 H; Hasegawa, T; Koinuma, H;
Kawasaki, M
Appl. Phys. Lett. 77, 3426 (2000)

Appl. Phys. Lett. 73, 2497 (1998)

Appl. Surf. Sci. 223, 62 (2004)

Rapid construction of a phase diagram of
doped Mott insulators with a compositionspread approach
Atomically defined epitaxy and physicalproperties of strained La0.6Sr0.4MnO3 films
Exploration of oxide-based diluted magnetic
semiconductors toward transparent spintronics

J. Appl. Phys. 91, 1993 (2002)

Enhancement of exciton binding energies in
ZnO/ZnMgO multiquantum wells

Science 315, 1388 (2007)

Appl. Phys. Lett. 86, 12107 (2005)

Appl. Phys. Lett. 78, 2664 (2001)

Anatase TiO2 thin films grown on latticematched LaAlO3 substrate by laser molecularbeam epitaxy

Hysteretic current-voltage characteristics andresistance switching at an epitaxial oxide
Schottky junction SrRuO3/SrTi0.99Nb0.01O3
Quantum Hall effect in polar oxide
heterostructures

Appl. Phys. Lett. 84, 4098 (2004)

Formation of highly aligned ZnO tubes onsapphire (0001) substrates

Appl. Phys. Lett. 82, 532 (2003)

Appl. Phys. Lett. 62, 417 (1993)

Science 305, 646 (2004)

Engineered interface of magnetic oxides

WEAK LINK BEHAVIOR OF GRAINBOUNDARIES IN ND-BASED, BI-BASED,AND TL-BASED CUPRATE
SUPERCONDUCTORS
Correlation between the photoluminescence
lifetime and defect density in bulk and epitaxial
ZnO

Nat. Mater. 3, 221 (2004)

Anomalous Hall effect governed by electron
doping in a room-temperature transparent
ferromagnetic semiconductor

ArticleArticleArticleArticleArticleArticleArticleProceedings
Paper

ArticleArticleArticleArticle

79

79

80

83

84

85

85

93

94

96

97

99

74

GONG, JP; KAWASAKI, M; FUJITO,

Ohtomo, A; Shiroki, R; Ohkubo, I;
Koinuma, H; Kawasaki, M

52

53

Mizokawa, T; Nambu, T; Fujimori, A;
Fukumura, T; Kawasaki, M
Ohtomo, A; Kawasaki, M; Sakurai, Y;
54 Ohkubo, I; Shiroki, R; Yoshida, Y;
Yasuda, T; Segawa, Y; Koinuma, H
Makino, T; Segawa, Y; Yoshida, S;
55 Tsukazaki, A; Ohtomo, A; Kawasaki,
M
Manako, T; Izumi, M; Konishi, Y;
56 Kobayashi, K; Kawasaki, M; Tokura,Y

Izumi, M; Murakami, Y; Konishi, Y;
Manako, T; Kawasaki, M; Tokura, Y

51

KOINUMA, H
Sun, HD; Makino, T; Tuan, NT;
Segawa, Y; Tang, ZK; Wong, GKL;
46Kawasaki, M; Ohtomo, A; Tamura, K;
Koinuma, H
Sumiya, M; Tanaka, M; Ohtsuka, K;
Fuke, S; Ohnishi, T; Ohkubo, I;
47
Yoshimoto, M; Koinuma, H;
Kawasaki, M
Ohtomo, A; Kawasaki, M; Sakurai, Y;
48 Yoshida, Y; Koinuma, H; Yu, P;
Tang, ZK; Wong, GKL; Segawa, Y
Kato, H; Okuda, T; Okimoto, Y;
49 Tomioka, Y; Takenoya, Y; Ohkubo,
A; Kawasaki, M; Tokura, Y
Weng, HM; Yang, XP; Dong, JM;
50 Mizuseki, H; Kawasaki, M; Kawazoe,
Y

45 K; TSUCHIYA, R; YOSHIMOTO, M;

Appl. Phys. Lett. 81, 328 (2002)

Metallic ordered double-perovskite Sr2CrReO6
with maximal Curie temperature of 635 K

ArticleProceedings
Paper

Mater. Sci. Eng. B-Solid State
Mater. Adv. Technol. 56, 263(1998)
Appl. Phys. Lett. 85, 759 (2004)

Appl. Phys. Lett. 74, 2215 (1999)

Fabrication of alloys and superlattices basedon ZnO towards ultraviolet laser
Gallium concentration dependence of roomtemperature near-band-edge luminescence inn-type ZnO : Ga
Epitaxial thin films of ordered double
perovskite Sr2FeMoO6

ArticleArticleArticleArticlePhys. Rev. B 65, 85209 (2002)

Appl. Phys. Lett. 75, 4088 (1999)

Phys. Rev. B 60, 1211 (1999)

ArticleArticleElectronic structure and optical properties of
the Co-doped anatase TiO2 studied from firstprinciples
Structure characterization and magnetic
properties of oxide superlattices
La0.6Sr0.4MnO3/La0.6Sr0.4FeO3Thermal stability of supersaturated MgxZn1-xO
alloy films and MgxZn1-xO/ZnO
heterointerfaces
Electronic structure of the oxide-diluted
magnetic semiconductor Zn1-xMnxO

Phys. Rev. B 69, 125219 (2004)

Mater. Sci. Eng. B-Solid State
Proceedings
Mater. Adv. Technol. 54, 24 (1998) Paper

Room temperature ultraviolet laser emission
from ZnO nanocrystal thin films grown by laser
MBE

ArticleAppl. Phys. Lett. 75, 674 (1999)

Analysis of the polar direction of GaN film
growth by coaxial impact collision ion
scattering spectroscopy

ArticleArticleAppl. Phys. Lett. 77, 4250 (2000)

Phys. Rev. B 50, 3280 (1994)

Stimulated emission induced by excitonexciton scattering in ZnO/ZnMgO
multiquantum wells up to room temperature

INVESTIGATION OF PRECIPITATEFORMATION ON LASER-ABLATEDYBA2CU3O7-DELTA THIN-FILMS

65

66

66

66

67

68

69

69

71

73

73

78

75



Makino, T; Chia, CH; Tuan, NT;

A; Tamura, K; Koinuma, H
Makino, T; Yasuda, T; Segawa, Y;
58 Ohtomo, A; Tamura, K; Kawasaki, M;
Koinuma, H
Makino, T; Segawa, Y; Kawasaki, M;
59
Koinuma, H
Hossain, FM; Nishii, J; Takagi, S;
60 Ohtomo, A; Fukumura, T; Fujioka, H;
Ohno, H; Koinuma, H; Kawasaki, M
Tsukazaki, A; Saito, H; Tamura, K;
61 Ohtani, M; Koinuma, H; Sumiya, M;
Fuke, S; Fukumura, T; Kawasaki, M

57 Segawa, Y; Kawasaki, M; Ohtomo,Appl. Phys. Lett. 79, 1282 (2001)
Semicond. Sci. Technol. 20, S78(2005)
J. Appl. Phys. 94, 7768 (2003)

Appl. Phys. Lett. 81, 235 (2002)

Optical properties of excitons in ZnO-based
quantum well heterostructures
Modeling and simulation of polycrystalline ZnO
thin-film transistors
Systematic examination of carrier polarity incomposition spread ZnO thin films codopedwith Ga and N

Appl. Phys. Lett. 77, 1632 (2000)

Strain effects on exciton resonance energies of
ZnO epitaxial layers

Radiative and nonradiative recombination
processes in lattice-matched(Cd,Zn)O/(Mg,Zn)O multiquantum wells

ArticleArticleArticleArticleArticle

61

62

62

63

64

Funding Program for World-Leading Innovative R&D
on Science and Technology.
“Research and development of integrated microsystems.”
Masayoshi Esashi
WPI-AIMR, Tohoku University, Sendai 980-8579, Japan
Thirty researchers were chosen in Japan for the Funding Program for World-Leading
Innovative R&D on Science and Technology. Prof. Hideo Ohno (Spintronics) in the ResearchInstitute for Electrical Communication and Prof. Masayoshi Esashi (Integrated microsystems)
are the principle researches from Tohoku University. The term and the budget of this programare 2009~2013 (fiscal year) and ~5M$ / year respectively.
The program of the “integrated microsystems” is the collaboration with Dr. Ryutaro Maeda
in Advanced Manufacturing Research Institute (AMRI) in National Institute of Advanced
Industrial Science and Technology (AIST) in Tsukuba. Supporting the competitiveness ofindustry is aimed based on the technology called MEMS (Micro Electro Mechanical Systems).
Social problems as aging and preserving environment and industrial problems as the
economical crisis of advanced LSI are expected to be solved in the program by the following
approach.
‫ޟ‬Heterogeneous integration‫ޠ‬to integrated heterogeneous components for value added
devices.
‫ޟ‬Hands-on access to fab.‫ޠ‬for lowering the barrier to start development without own facility.
‫ޟ‬Shared wafer‫ޠ‬for MEMS processes on LSI to minimize risks in R&D by reducing adevelopment cost.
‫ޟ‬Development of massive parallel electron beam exposure systems‫ޠ‬to produce small volume
advanced LSI cost effectively.
‫ޟ‬Fundamental technology for sensor-net green-fab.‫ޠ‬to preserve environment and to saveenergy.

Fig.1

Scheme of the research and development of integrated microsystems
76

The New WPI Joint Seminar Series
by M. Tsukada and T. Hashizume
The 11th Seminar Oct. 23 (Fri.) 16:00~17:00
Prof. Weihua Wang (Institute of Physics, CAS, Beijing):“Microalloying induced giant properties & GFA change in BMGs”
The 12th Seminar Oct. 30 (Fri.) 15:00~17:20
Dr. Tsuneya Ando (Tokyo Inst. of Technology):“Physics of graphene and its multilayers: From zero-mode anomalies to band-gap
opening”
Dr. Keith McKenna (WPI-AIMR):“Electronic and optical properties of polycrystalline metal-oxide materials”
The 13th Seminar Nov. 6 (Fri.) 15:00~17:00
Prof. Andreas Züttel (EMPA Materials Sciences and Technology):“What We Learn From The Past To Master The Future With H2”
Prof. Shin-ichi Orimo (IMR, Tohoku University):“Metal Borohydrides for Energy Applications”
The 14th Seminar Nov. 20 (Fri.) 15:00~17:00
Dr. Katsuya Iwaya (WPI-AIMR):“Tutorial to Scanning Tunneling Microscopy (STM)”
Dr. Terukazu Nishizaki (IMR, Tohoku University):“Low-temperature STM studies on superconductors”
Prof. Taro Hitosugi (WPI-AIMR):“Introduction to low temperature SPM at WPI-AIMR”
The 15th Seminar Dec. 18 (Fri.) 15:00~17:00
Dr. Ali Khademhosseini (Harvard Medical School):“Microengineered hydrogels for stem cell bioengineering and tissue regeneration”
Dr. Douglas B. Weibel (University of Wisconsin-Madison):“Transforming Microbiology Using Soft, Biocompatible Polymers”

77Research ProspectMEMS with new functional materials
Yu-Ching Lina, Masayoshi Esashia and Thomas Gessnera,b,ca
WPI Research Center, Advanced Institute for Materials Research, Tohoku University,
Sendai 980-8577, Japanb
Fraunhofer ENAS, Chemnitz 09126, GermanycCenter for Microtechnologies, Chemnitz University of Technology,
Chemnitz 09126, Germany

1. MEMS bonding technologies
Recent advances in commercialization of micro electro mechanical systems (MEMS)
products rely on development of integration technologies for packaging, combining
MEMS with integrated circuit or other systems, and to realize 3d device stacking.
Bonding technology is the key for wafer level packaging and 3d integration, and isgetting more and more significance for MEMS device. For an industrial MEMS device[1-3] more than 70 % costs come from bonding process and its evaluation. Wafer
bonding technology got its start in the manufacture of MEMS, for protection andsealing purposes of fragile MEMS structures, also for a interconnection between top
and bottom wafers. Especially for novel consumer MEMS applications, such as Apple
iPhone or the Nintendo Wii, that have to keep record-small form factors, wafer bonding
is a major contributor to reduce the manufacturing costs of the final package. New
bonding schemes for wafer-level-packages (protection, interconnection and testing at
the wafer level) are being discussed with regards to market potential and equipment
requirements.
The successful technology transfer of wafer bonding and related advanced
manufacturing technologies from MEMS packaging into 3D wafer stacking of CMOS
based applications [1]. Recent development of wafer level bonding to combine MEMS
device with LSI decreases size and cost significantly and exhibits low electrical noise.
Bonding technology with temperature below 400 ͠ and achieve both mechanical andelectrical bonding at the same time have been paid large attention and is a critical issue
for practice application. Table 1 shows the overview of MEMS wafer bonding
technology. Only a few bonding choices can satisfy sealing packaging and electricalbonding at the same time. In which, some technical problems are always need tochallenge, such as strength of the bonds, bond yield, adhesion with both sides wafers etc.

81

In this study, bonding technology with metallic glass [4-5] has been proposed tocreate a new bonding technique field. In addition of using new bonding materials,
nanostructured [6-7] metal pads have also considered to achieve low temperaturebonding and provide a conductive functionality to anodic bonding, the most usedbonding method for device encapsulation.
Table 1. Overview of MEMS wafer bonding technology (WBT).
WBT with intermediate layer
Eutectic
bonding

Diffusion
bonding

Electric conductive

Glass fritbonding

Polymer

WBT without
intermediate layer
Anodicbonding

Non electric conductive

Si direct
bonding
Plasma bonding

Bonding temperature

190-380

300-400

400-550250-350 /
120-160

350-400

RT-300Electrical connection

䂾

䂾

×

×

×

×

Low vacuum

䂾

䂾

䂾

䂾/㬍

䂾

䂾

High vacuum

䂾

䂾

×

㬍

䂾

䂾

Alignment accuracy (ȝm)

<2

<2

< 10

<2/ <5<2<2

Surface roughness
requirement

ȝm

nm

ȝm

ȝm

< 10nm< 1nm

Mechanicalhermetic
sealing

1.1 MEMS bonding with AuSi
Eutectic bonding has got a special importance today because both hermetically sealed
package and electrical interconnects could be performed within one process.
Furthermore, there are some advantages such as low processing temperature, low
resultant stress induced in the final assembly, high strength of the bonding, large
fabrication yield, and a good reliability.
Since the early 90-ies eutectic bonding is known from very large scale integration(VLSI) chip bonding and is used very often in industry. The AuSi eutectic bondprocess is a well known technique in the field of single chip packaging. The bondmechanism relies on the formation of eutectics at the interface. The AuSi eutectic
bonding dramatically decreases the process temperature to be under 400°C, provides
good mechanical stability, and has availability in micro technologies.
Wafer-to-wafer AuSi eutectic bonding has been investigated in our group [8-9].
Single crystalline Si, amorphous Si and poly crystalline Si were bonded with Au layers
and observed by optical measurements. Material composition, adhesion layer, electricalinsulation, bonding parameters, and surface pre-treatments were discussed and have82

improved bonding performance. Bond strength determined by micro-chevron-test andshear test was evaluated as well as hermeticity. High bond yield was achieved with 4
inch and 6 inch wafer stacks. Figure 1 shows SEM images of 100 % AuSi eutectic
bonded 6 inch wafer pairs.

ġ
(a)
(b)
Figure 1. (a) Infrared images and (b) ultra sonic images of 6 inch AuSi eutectic bonded
wafers.
1.2 MEMS bonding with new materials - metallic glasses
The main goal is to develop new MEMS bonding field with metallic glasses. It is
expected to achieve unprecedented high-capabilities bonding performance. With
creation of a novel bonding technique with metallic glass, the developments of metallic
glass deposition technologies are also expected to become as MEMS compatible
fabrication processes to open further MEMS application with metallic glass materials
simultaneously. This research will not only show the possibility but also challenge theconventional MEMS bonding field.
Metallic glass with superior material properties, e.g. tough, anticorrosion, glasstransition behavior and material variegation, has be considered as a candidate of novel
bonding material. As a MEMS bonding material, metallic glass is like a mixture of
eutectic bonding and glass frit bonding. During bonding process, the apply temperature
above its glass transition temperature (Tg) exhibits a low temperature bonding byselection a proper kind of metallic glass.
The requisite properties of bonding materials are adhesion capability with both sides
materials, large bond strength, high electrical conductivity, anticorrosion, and MEMS
compatible manufacture. Metallic glass is well known with large strength andanticorrosion. It has material variegation and there are already more than 2000 kinds ofmetallic glass have been developed. By selecting proper base materials, it has highpotential to achieve adhesion capability and high electrical conductivity to answer
bonding requirements.

83

84

1.3. Nanostructured intermediate layer for MEMS bonding - nanoporous metals
Metallic nano-lawn and Au particles have been identified earlier [11-12] aspromising candidates for applications in low temperature bonding. Even if theirintroduction into technological flow schemes is only about to start, potential
applications attractive for advanced packaging have been already demonstrated. For
further low cost, simple process, and large area fabrication, nanoporous metals has been
proposed in this study.

Cr-Au

Pressure and heat

Nanoporous metals

h1h2h1 > h2

Figure 4. Schematic of wafer bonding with nanoporous structured intermediate layers.
Nano-porous metallic formation has been well developed with sheet style. This
technology will be transferred as an on-wafer process and combined with MEMS
electrodeposition. Figure 4 shows the schematic of wafer bonding with nanoporous
metals. Experimental setting of Au-Sn alloy electrodeposition and dealloying precess
are shown in Figure 5.

Au-Sn alloy

Electrolyte:
KAuCl4
SnCl2·2H2O
Na 2SO3
Ammonium Citrate
Ascorbic acid

HCl (HNO3) solution
Sn

Sn
Sn

Sn

Sn

Sn
Sn

(a)
(b)
Figure 5. Fabrication of nanoporous metals (a) Au-Sn alloy electrodeposition andthen (b) dealloying.

85

1.4 Anodic bonding with conductive functionality
Anodic bonding is popular method for the cap bonding process. Most MEMS cavity
packages are hermetically sealed by anodic bonding. However, anodic bonding can not
perform electrical conductive functionality that is required for many practicalapplications. Here, nanostructured metal pads will be fabricated for standard anodic
bonding with nanoporous metals and nanostructured metallic glasses to create its
electrical conductive functionality for packaging application.
Figure 6 shows schematic of anodic bonding with structured metal pads. The
structured metal pads have a larger thickness (h2) than bonding frame (h1) to makeelectric connect surely. When press two wafers together with heat applying, structured
metal pads crush and then diffuse into interconnection on both sides without overflow.
MechanicalThrough via hole
Anodically-bondable
sealing frame
substrate (e.g. Glass, LTCC)(e.g. Si material)

Pressure and heat

h2
h1

h1
h2 > h1

Nanoporous metals or nanostructured metallic glass㽲 㫅 㪸㫅 㫆 㫇 㫆 㫉㫆 㫌 㫊 㫄 㪼㫋㪸㫃㫊㪑㪤㫆 㫃㪻 㩷㫇 㪸㫋㫋㪼㫉㫅 㫀㫅 㪾 㩷 㪂 㩷㪸㫃㫃㫆 㫐㩷㪻 㪼㫇 㫆 㫊㫀㫋㫀㫆 㫅 㩷 㪂 㩷㪻 㪼㪸㫃㫃㫆 㫐㫀㫅 㪾㽳 㫅 㪸㫅 㫆 㫊㫋㫉㫌 㪺㫋㫌 㫉㪼㪻 㫄 㪼㫋㪸㫃㫃㫀㪺㩷 㪾 㫃㪸㫊㫊㪑㪤㫆 㫃㪻 㩷㫇 㪸㫋㫋㪼㫉㫅 㫀㫅 㪾 㩷 㪂 㩷㫅 㪸㫅 㫆 㫀㫄 㫇 㫉㫀㫅 㫋 㪆㫅 㪸㫅 㫆 㫄 㫆 㫌 㫃㪻 㫀㫅 㪾

Figure 6. Schematic of anodic bonding with a structured metal pad.

The metal pads can be made with nanoporous metals or nanosturctured metallic glass.
Fabrication of nanoporous metals has been described in section 1.3. Nanosturctured
metallic glass could be formed by nanoimprint or nanomoulding with supercooled
liquid region of metallic glass. The mold nanopatterning is proposed to use self
assembling diblock copolymer or porous alumina as substitute resist layers without
conventional expensive photo lithography. Figure 7 and 8 show the nanopatterns of
diblock copolymer and porous alumina.

86

ġġ
(a)
(b)
Figure 7. Self assembled nanostructure of diblock copolymer [13]. (a) Surface-paralleloriented phase PS-b-PMMA diblock copolymer patterns. (b) Surface-perpendicularoriented cylindrical phase PS-b-PMMA diblock copolymer patterns.

ġ
(a)
(b)
Figure 8. Pattern transfer from porous alumina to diamond and resist [14]. (a) Porousalumina (b) Diamond mold
2. Fabrication of micro mirrors with metallic glasses
MEMS have been synthesized in a variety of applications from electronics to biotechnology, using advanced micromachining and nanomachining technologies based on
the extended semiconductor microfabrication. As an important part of MEMS,
micro/nano machine has a critical requirement for materials.
Silicon MEMS devices such as micro-mirrors, however, are prone to earlymechanical failure even with a small crack during fabrication, which results from lackof ductility in Si. Also, most prcesses of micro mirror use expensive SOI (Silicon On
Insulator) wafers. Continued desires of higher performance, extensive durability andlow cost in the sophisticated MEMS devices have been a continuous driving force insearch of more advanced MEMS material. Recently, stainless steel was proposed as analternative to overcome the substrate fragility, nevertheless, the curvature in thesubstrate induced by residual stresses inhibits its successful replacement of Si.
Therefore, a novel material with desirable combination of high strength, good wearresistance and electrical conductivity with a MEMS-compatible simple process is the87key to overcome current bottleneck in MEMS material performance thus to create a new
field in MEMS world. Metallic glasses can be shaped at elevated temperatures into
various complex forms at a wide variety of scales even down to atomic scale. Moreover,versatility in composition and properties of available MG alloys significantly enhances
their promise in MEMS applications.
Mircro scanning mirrors driven by an electrostatic force [15], piezo [16], andmagnetic force [17] have been extensively reported. In which electromagnetic actuation
is a promising technique to drive microdevices. The noncontact electromagnetic
actuator is able to deliver a large force and a large displacement. In this study, metallic
glass micro mirror will use a coilless driven actuation [18]. The magnetostatic force
resulted from a magnetic interaction as well as the Lorentz force that is induced by aneddy current as shown in Figure 9. The eddy current is exploited here to generate theLorentz force without conducting wire in an ac magnetic field. Meanwhile, themagnetostatic force will also be induced in the magnetic field to drive the scanner. The
eddy current can be induced in metal, particularly ferromagnetic metallic glass materials
with higher permeability. This eliminates complicated coil routing and insulation layer
deposition and simplifies fabrication allowing easy integration with micromachining
and complementary metal–oxide–semiconductor processes.
AC magnetic field

Secondary induced current
Permanent
magnetN S

Lorentz force

N S

Ferromagnetic mirror(magnetic static force)Primary current

Figure 9. Concept of coil-less MEMS scanning micro mirror.
Two-axis micromachined scanning mirror is a key enabling component for opticalapplications such as the compact display system. In general, the scanning mirror
employs microactuators to manipulate incident light in two orthogonal directions. Thus,
the design considerations include large scanning angle, high frequency response, and88low driving voltages. Two-dimensional scanning patterns can be easily tuned byvarying the combination of driving frequencies. Figure 10 shows typical fabricatedmicro mirrors.

(a)
(b)
(c)
Figure 10. SEM images of typical fabricated (a) one-axis, (b) two-axis micro mirrors andmirror array [19].
With fusion of bulk metallic glasses, micro-/nano- device/systems andnanomechanics, this proposed research aims at developing a novel metallic glass micro
mirror and MEMS compatible fabrication technologies of metallic glass including
moulding and surface planarization, integration with other materials etc. for actuation,
control or handling. In addition to search of more advanced material, development of a
MEMS-compatible fabrication process is of the most importance to a successful MEMS
application with metallic glasses. In light of this desire, this research is expected tomake a bridge between metallic glass and MEMS and further innovative applications ofmetallic glasses and to create a new regime in MEMS.
Acknowledgements
We acknowledge Prof. Akihisa Inoue, Prof. Ming Wei Chen, Prof. Dmitri Louzguine,
Dr. Deng Pang, Dr. Na Chen, Dr. Sharma and Dr. Lu Yang Chen for their collaborationin this work.
References[1] J. Frömel, T. Gessner, 12th International Micromachine / Nanotech Symposium,
Tokyo, 08.11.2006 (invited)[2] K. Rajanna, S. Tanaka, T. Itoh and M. Esashi, Materials Science Forum, 457-460(2004)[3] H. Seki, T. Ono, Y. Kawai and M. Esashi, J.of Micromech. Microeng., 18, 085003(5pp) (2008)89

[4] N. Chen, D. V. Louzguine-Luzgin, G. Q. Xie, T. Wada, A. Inoue, Acta Mater, inpress (2009)[5] D.V. Louzguine-Luzgin, G.Q. Xie, T. Tsumura, H. Fukuda, K. Nakata, H.M.
Kimura, A. Inoue, Materials Science and Engineering B 148, N: 1-3, 88–91 (2008)[6] T. Gessner, T. Otto, B. Michel, R. Baumann, S.E. Schulz, C. Hedayat, mstnews, pp.
40-43 (2008)[7] L. H. Qian, M. W. Chen, Applied Physics Letters, 91, 083105 (2007)[8] Y. –C. Lin, M. Baum, M. Haubold, J. Frömel, M. Wiemer, T. Gessner, M. Esashi,
Proceedings of international conference on smart system integration, (2009)[9] Y. –C. Lin, M. Baum, M. Haubold, J. Frömel, M. Wiemer, T. Gessner, M. Esashi,
Proceedings of international conference on solid-state sensors and actuators(Transducers ’09), 244-247 (2009)[10] P. Sharma, N. Kaushik, H. Kimura, Y. Saotome and A. Inoue , Nanotechnology 18,035302 (2007).
[11] S. Fiedler, M. Zwanzig, R. Schmidt, E. Auerswald, M. Klein, W. Scheel, and H.
Reichl, Proceedings of international conference on Electronics Systemintegration
Technology, 886-891 (2006)[12] TANAKA KIKINZOKU KOGYO, NIKKEI Microdevice (2008)[13] C. T. Black, R. Ruiz, G. Breyta, J. Y. Cheng, M. E. Colburn, K. W. Guarini, H.-C.
Kim, Y. Zhang, IBM J. RES. & DEV. vol. 51 no. 5 (2007)[14] T.Ono, C. Konoma and M. Esashi, Jpn. J. Appl. Phys., 42, Part 1, No.6B, p.3867(2003)[15] D. S. Greywall, P. A. Busch, F. Pardo, D. W. Carr, G. Bogart, and H. T. Soh, J.
Microelectromech. Syst., vol. 12, no. 5, pp. 708–712 (2003)[16] M. Ikeda, H. Goto, H. Totani, M. Sakata, and T. Yada, Proc. SPIE, vol. 3008, pp.
111–122 (1997)[17] H. Urey, A. D. Yalcinkaya, T. Montague, D. Brown, R. Sprague, O. Anac, C.
Ataman, and I. Basdogan, in Proc. IEEE-LEOS Opt. MEMS, Oulu, Finland, pp.
17–18 (2005)[18] H. A. Yang, T. L. Tang, S. T. Lee and W. Fang, Journal of Microelectromechanical
Systems, vol. 16, no. 3, pp. 511–520 (2007)

90

Science Based New Silicon Technologies Based on New Manufacturing
Equipment Completely Free From Contaminations and Damages
Tadahiro Ohmi(1),(2), Masaki Hirayama(2), Tetsuya Goto(2), Atsutoshi Inokuchi(2),Masafumi Kitano(2), Minoru Tahara(2)(1)
World Premier International Research Center, Tohoku University(2)
New Industry Creation Hatchery Center, Tohoku University
Abstract
Current silicon technologies are now facing with very severe standstill, i.e., the speed
performance of microprocessors can not be improved any more at the current maximum
clock rate of 3.8GHz. Current silicon technologies are characterized by the thermaloxidation at high temperatures using O2 and/or H2O molecules to form the gate insulator
films of MOS transistors, resulting in the fact that relatively high integrity silicon dioxide films (SiO2) are obtained only on the (100) silicon surface while there are obtained
very poor quality oxide films on the other silicon surfaces. Thus, silicon LSI (Large
Scale Integration Circuit) can be fabricated only on the (100) silicon surface using two
dimensional (2D) structure MOS transistors, so that the very limited capability of thesilicon crystal can be used to the practical applications by the current silicon technologies.
The stagnation of the silicon LSI induces very severe standstill of Information andCommunication Technologies (ICT), resulting in the standstill of the progress ofworld-wide entire industries.
In order to overcome these stagnations of silicon technologies, we must develop very
new manufacturing technologies to form very high integrity gate insulator films on any
crystal orientation silicon surface with the same formation speed based on the radical
reactions, resulting in the creation of science based new silicon technologies where very
high integrity SiO2 films and Si3N4 films can be formed using oxygen radicals O* andNH* radicals on any crystal orientation silicon surface with the same oxidation speed
and the same nitridation speed, so that the three-dimensional (3D) structure MOS transistors are fabricated on any crystal orientation silicon surface. Thus, the entire capability of the silicon crystal will be used to the practical applications where the speed
performance of silicon LSI will be improved greater than 100 GHz by introducing balanced CMOS of accumulation mode MOS transistors on the (551) surface SOI wafers,
i.e., science based new silicon technologies will start just right now.

93

1. Introduction
Radical reaction based semiconductor manufacturing has been confirmed to exhibit
very high quality process results such as oxidations, nitridations, plasma CVD and reactive ion etching (RIE) by using 2.45 GHz Horn Antenna excited high density plasma
with very low electron temperatures (1), where the speed performance of the silicon LSI
is speculated to improve greater than 50 GHz clock rate (2). Typical results of radicaloxidation and radical nitridation are shown in Fig. 1, where the leakage current densitiesof current thermal oxide, radical oxide (400͠) and radical nitride (600͠) are plotted asa function of the effective oxide thickness (EOT) for an applied voltage of 1 volt. It
has been demonstrated in Fig. 1 that the leakage current density of radical oxide andradical nitride has been improved to decrease down to less than 1/1,000 compared tothat of current thermal oxide. But, 2.45 GHz Horn Antenna excited high density plasma can be applied only to the small size substrates such as 5cm to 10cm in diameter. It
is very essential for us to develop new plasma process equipment for the very large size
substrates in order to introduce these very high quality radical reaction based semiconductor manufacturing to the practical applications because current plasma equipment
can not be used to the transistor fabrication in the semiconductor manufacturing due toits very severe contaminations and very severe damages such as the charge-up damages
and the ion bombardment induced damages. Thus, current plasma equipment is used

Radical Si3 N4

for an applied voltage of 1 volt

Leakage
LeakageCurrent
CurrentDensity
Density(A/cm2)(A/cm2)

1.E+02102
1.E+00100

Radical SiO2

1.E-0210-2

Thermal Oxide

1.E-0410-4Nitridation :Xe + e 㸢 Xe*
Xe* + NH3 㸢 Xe + NH* + H2
3Si + 4NH* 䋽 Si3 N4 + 2H2
䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭䇭at600㷄
Oxidation :Kr + e 㸢 Kr*
Kr* + O2 㸢 Kr + 2O*
Si + 2O* 䋽 SiO2 at 400㷄

1.E-0610-6
10-8
1.E-08

1.E-1010-10
1.E-12
10-12
0

0.5

1

1.5

2

2.5

3

3.5

4

EOT (nm)
Figure 1 The leakage current densities of current thermal oxide, radical oxide and radical nitride are plotted as a function of effective oxide thickness from 3 nm to 1 nm for an applied
voltage of 1 volt.

94

only to the interconnects fabrications.
We are now developing new plasma process equipment completely free from contaminations and damages such as 915MHz Metal Surfacewave Excitation Plasma (MSEP)
with single shower plate structure and dual shower plate structure, and Rotation Magnet
Sputtering having very high target utilization efficiency (3). In this paper, we will describe the importance and the practical applications of 915 MHz MSEP. The metal
surfacewave is newly discovered propagation mode of the electromagnetic waves propagating along with the plasma sheath region between the metal surface covered with
Al2O3 passivation film and the high density plasma. In order to obtain the very stable
plasma excitation and low electron temperature plasma, the electromagnetic wave must
be reflected at the surface of excited plasma, so that the electron density in the plasma
excitation region must be completely higher than the cutoff density nc given by
meH 0Z 2,(1)e2
where me and e are the electron muss and the electric charge, ǭ0 is dielectric connc

stant of the free space and ȁ is angular frequency. The cutoff electron density of915MHz is very low such as 1.041010cm-3, so that we can obtain very stable plasma
excitation even for 100% O2 gas ambience and 100% F2 gas ambience at very wide
range of working pressures where the oxygen and the fluorine have large electronegativity such as 3.5 and 4.0 resulting in the generation of negative ions by absorbing electrons, i.e., corresponding to the drastic decrease of electron concentrations in the plasma.
This clearly indicates that we can obtain very stable and uniform plasma excitation forvery wide variety gas combinations and working pressures i.e., very wide process windows.
In order to eliminate charge-up damages and ion bombardment induced damages, thesilicon substrates must be set in the diffusion plasma region separated from the plasma
excitation region, where the electron current and the ion current flowing into the substrate surface are completely equal to each other at any time, so that the electric charges
do not remain at the substrate surface even if the plasma is turned-off at any time.
Charge-up damages are principally eliminated by setting the substrate in the diffusion
plasma region. To eliminate ion bombardment induced damages, the electron temperature of the diffusion plasma region must be decreased as small as possible, because thebombarding ion energy is given byEion

kTe § 0.43mi ·¸,ln¨
2 ¨© me ¸¹

(2)

95

Etching Rate (nm/min)where Te is the electron temperature of the diffusion plasma region, mi is mass of ion
and k is the Boltzmann constant. Typical bombarding ion energy is tabulated in Table
1. The electron temperature must be decreased down to less than 2.0 eV, so that higher
frequency plasma excitation is essentially required such as 915 MHz.
By decreasing the electron temperature of the diffusion plasma region, the bombarding ion energy becomes very small, so that we can introduce the lower shower plate
supplying various process gases to the diffusion plasma region without suffering sputtering. Various process gases are supplied to the substrate surface through the diffusion plasma region having very low electron temperatures, so that process gas molecules do not decompose even if they suffer electron collisions. Thus, process gas molecules can reach to the bottom of very narrow and very deep throughholes without absorbing to the inlet sidewall of these throughholes, resulting in the same etching speed
to the entire pattern sizes as shown in Fig. 2. Current plasma equipment exhibits very
severe pattern size dependence ofTable 1 Table 1 Bombarding ion energy to the subthe process speed as shown in strate surface of various electron temperature of theplasma region for various ions from H+ to
Fig. 2, where the etching speed diffusion+
Xe .
strictly decreases with a progress
Te
2.0eV 1.5eV 1.0eV 0.7eVof pattern size miniaturization.
Ion
(1)
H+
6.8
5.1
3.4
2.4
Thus, current silicon industry
(4)
He+
8.1
6.1
4.1
2.9
must replace to new process
(14)
N+
9.4
7.0
4.7
3.3
+
SiH
(30)
10.2
7.6
5.1
3.6
2
equipment cyclically with a
(40)
Ar+
10.4
7.8
5.2
3.7
progress of device miniaturiza(84)
Kr+
11.2
8.4
5.6
3.9
+
(131)
11.6
8.7
5.8
4.1
Xe
tion.
But newly developed
Damage Free
Damageplasma process equipment completely free from damages has
600
been confirmed to be contiNew Technology
nuously used to the entire tech500
nology node right now. In cur400
rent semiconductor manufactur300
ing, about 100 plasma processCurrent Technology
200
ings such as plasma CVD, RIE(Parallel Plate Etcher)100
and sputtering film depositions
0
having severe charge-up damag0.1
1
es are used through the entire
Contact Diameter (um)processings of silicon LSI pro- Figure 2 SiO2 film etching rate dependence on patternsize from 2 um to 80 nm by Ar/C5F8/O2.
ductions, so that the very severe96regulation must be introduced to circuit layout patterns to realize high yield productions
where the antenna ratio defined by the gate interconnect total area to the gate electrodearea of MOS transistor must be smaller than 100. These regulations to the circuit
layout patterns of LSI can be completely eliminated by an introduction of new plasma
process equipment completely free from damages(1), so that the performance of silicon
LSI will be enhanced drastically.
Furthermore, the gas flow patterns in the process chamber of newly developed plasma equipment are very well regulated by introducing the shower plate structure supplying the plasma excitation gases and the radical generation gases from the upper shower
plate and process gases for thin film depositions and pattern etchings from the lower
shower plate where the shower plate consists of very many gas injection holes having a
diameter of 0.15mm to 0.20mm at the surface of aluminum alloy such as Al Mg(4.5%) Ce (1%) Zr (0.1%) covered with Al2O3 passivation films having complete anticorrosion capability and no moisture molecule emissions (4). The total number of gas
injection holes is designed that the gas injection speed to the process chamber must becompletely smaller than the sound velocity (340m/sec) to maintain the very uniform
laminar flow patterns in the process chamber, while the gas flow patterns in the current
plasma process equipment are completely different from the uniform laminar flow, i.e.,
the turbulent gas flow patterns resulting in a huge amount of reaction product adhesion
to the inner surface of the process chamber. In the newly developed process chamberhaving very uniform laminar flow pattern, there does not appear the reaction productadhesion to the inner surface of the process chamber.
Thus, completely new processings will become available, i.e., different thin film continuous depositions in the same process chamber only by changing process gasses anddifferent thin film continuous etchings in the same process chamber only by changing
process gases succeedingly. These are completely impossible so far, we are now getting into the new era of manufacturing of semiconductor devices, large size flat panel
display and silicon thin film new solar cells where the volume production productivity
will be improved very drastically by a factor of at least ten with keeping very high quality process results and improving the device performance drastically, i.e., the realizationof the revolutional progress.
2. 915MHz Metal Surfacewave Excitation Plasma
In order to realize completely damage free radical reaction based processing and continuous deposition and etching of multilayer thin films in the same process chamberwith changing the process gases, which drastically increase the productivities and97

reduce the production
915 MHz microwave“Cellular” plasma
Plasma excitation withcosts, we have developed
plasma excitation
excitation“metal surface wave”
a new plasma process
quipment collaborating
MSEP 䋨Metal Surfacewave Excitation Plasma䋩with Tokyo Electron Limited. Five new techNonaqueous anodic oxide
nologies to realize MSEPHigh purity Ce-Mg-Zr-Al alloy
passivation film on Al alloy
are summarized in Fig. 3.
The first one is 915 MHz Figure 3 Five key technologies to realize newly developed
plasma equipment “MSEP”.
microwave plasma excitation. The electron temperatures of the microwave plasma are generally very low(typically < 1 eV in the diffusion plasma region), since the alternate microwave electricfield in the plasma changes before the electrons are accelerated by the microwave electric field and get high kinetic energies. The kinetic energies of the ions incident on thesubstrate and the chamber walls, which are proportional to the electron temperature as
given by Eq. (2), are also kept very low. Therefore MSEP is completely free fromplasma-induced damages and metal contaminations from the chamber walls. When theelectron density in the plasma is lower than the cutoff density, the incident microwave
to the plasma propagates into the plasma. Then, unstable plasma is excited near thesubstrate. The electron temperature around the substrate becomes high. It is notsuitable for the plasma processing. On the other hand, when the electron density ishigher than the cutoff density, the incident microwave reflects at the plasma surface.
The plasma is excited in the vicinity of the plasma surface by the evanescent electricfield. The stable plasma with the low electron temperature can be produced around thesubstrate. It is applicable for plasma processing. The stable plasma with low electron temperature can be produced only when the electron density at the plasma surface
is much higher than the cutoff density over the entire plasma excitation area. In thisrespect, the cutoff density nc should be lower, because the stable plasma is produced
even at the lower electron densities. Most popular frequency to excite the microwave
plasma is 2.45 GHz. At 2.45 GHz, the value of the cutoff density nc is 7.451010 cm-3.
This value is too high to always produce stable and uniform plasmas for various process
conditions. The process window must be much wider to realize continuous depositionand etching of multilayer thin films in the same process chamber. By decreasing theplasma excitation frequency from 2.45 GHz to 915 GHz, the cutoff density nc becomes
about 1/7 (1.041010 cm-3). Thus, the stable plasma can be excited even at extremely
low electron densities and the process window becomes much wider.

98

We have discovered that the microwave propagates along with the plasma sheath
between the metal and the plasma as a TM (transverse magnetic) mode. The width of

2O/3=218 mm

the plasma sheath is 50~300 Pm for the typical process conditions. The power densityof the metal surfacewave is extremely high as compared with other propagation types.
We have also revealed that the metal surfacewave efficiently excites high-density plasma. By the way, if the wavelength of the surface wave is longer than about 100 mm, it
may be difficult to produce the uniform plasma over the entire substrate surface. The
free space wavelength of 915 MHz is 328 mm (>100 mm). But fortunately, the wavelength of the metal surfacewave is much shorter than the free space wavelength.
Figure 4 shows the structure of MSEP cell. The dotted lines in Fig. 4(a) are virtual
boundaries of the cell. The cell size is 218218 mm in this case. In the center of theeach cell, there is a rectangular metal electrode. A rectangular dielectric plate is inserted between the metal electrode and a large top Al alloy plate. The top plate is also
covered with rectangular metal covers. The shape and size of the metal electrode issame as the metal cover. The
Metal covers
915 MHz microwave is fedvethrough the coaxial waveguideawein the center of the cell, and
(a)
c
fa
ur
radially propagates in the disalelectric plate. At the edge ofetM
the dielectric plate, the microwave becomes the metal
surfacewave and propagateson the metal electrodes andMetalelectrode2O/3=218 mm
the metal covers covered with
Boundaries
Al2O3 passivation film. On
of unit cells(b)
the metal electrodes and the
Coaxial waveguideAl2O3 plate
Microwave
metal covers, two-dimensional
standing waves arise by theinterference of the multi-directional metal surfacewaves. The patterns of thestanding wave on the metalelectrodes and the metal covers are completely same because the shapes and the sizes

Al alloy
Al alloy

Metal electrodeAl alloy
Al alloy

Al alloy

PlasmaMetal
surface wave

Metal covers

Figure 4 Structure of MSEP cell. (a):bottom view, (b)cross sectional view.

99are the same. By this symmetrical structure, the uniform plasma can be excited over awide range of the process condition. Figure 5 shows the photographs of typical Ar/O2,
O2 and NF3 gas ambience plasmas produced in the MSEP equipment. In the MSEP, it
can be seen that uniform and stable plasma is excited at relatively low power densities
even for 100% O2 gas ambience and 100% NF3 gas ambience. We also revealed thatthe stable plasma without mode jump can be produced over a wide range of electron
density from 11011 to 11013 cm-3.
Figure 6 shows the cross sectional sketch of the MSEP equipment for semiconductor
manufacturing. For the plasma CVD and RIE, both of an upper shower plate and alower shower plate are settled above the wafer stage. The upper shower plate supplies
the plasma excitation gases and the radical generation gases such as Ar, Kr, Xe, O2, H2,
and NH3 and etc. The lower shower plate supplies the process gases for deposition or

1.86 W/cm2

2.33 W/cm2

2.33 W/cm2

Ar/O2 (50%)

O2 (100%)

NF3 (100%)

Figure 5 Photographs of Ar/O2, O2, and NF3 plasmas produced in an experimental MSEP
equipment. The gas pressure was 67 Pa.
915 MHz microwave
CoaxialPlasmaMicrowave divider
waveguides excitation gas
Ceramic nozzles
Al 2O3 plate
Al alloy

Al alloy
Al alloy

Al alloy

Processgas

Metal cover Metal electrodes

Lower
showerplate
exhaustUpper shower
platesWafer
RF bias300mm Wafer

exhaustFigure 6 Cross sectional sketch of MSEP for semiconductor manufacturing100etching. The lower shower plate is settled in the diffusion plasma region where theelectron temperature is very low. On the other hand, for the radical oxidation, nitridation, oxinitridation, and plasma doping, only upper shower plate is settled. The upper
shower plate consists of four metal electrodes and one metal cover, which are regularly
arranged on the bottom of the top plate. The 915 MHz microwave fed from the top
coaxial waveguide is divided by a microwave divider. The 915 MHz microwave withcompletely same amplitude and same phase is supplied to four metal electrodes. The
microwave propagation lines are carefully designed to minimize the microwave reflections and maximize the plasma excitation efficiency. The chamber, metal electrodes,
metal cover, lower shower plate and top plate are made of high purity Ce-Mg-Zr-Al alloy, whose surfaces are covered with nonaqueous anodic oxide passivation film Al2O3
with perfect anticorrosion resistance and no moisture molecule emission.
Current high dose ion implantations induce serious charge-up damage in the silicon
crystal, because there is little charge compensation mechanism when the huge amountof positive-charged ions are implanted to silicon substrate such as 11015 cm-2 highdose implantation to the source and drain region. Very high electric field intensity
larger than 1105 kV/cm appears in the silicon due to this positive charge, which isenough to induce huge amount of serious damages in silicon crystal. MSEP equipment
is quite suitable for realizing very advanced damage free plasma doping technology.
915 MHz MSEP can realize very stable plasma excitation for the gas ambience of 100%
PF3 and BF3 such as PF3 ψ PF2+ + F-, BF3 ψ BF2+ + F-, where the very high self-bias
voltages up to –5 kV and –10 kV can be easily produced on the silicon substrate surface
by applying RF power to the substrate electrode without disturbing the plasma with thevery effective grounded plane of MSEP. Furthermore, to eliminate charge-up damage
completely, high dose doping is divided to 㨪105 times doping by introducing pulsed
RF application to the substrate electrode. Typical process sequence is shown in Fig. 7,
where the pulsed RF bias (pulse width of 10㨪20 us, duty ratio of 10㨪20%) is applied
to generate the pulsed self-bias voltages of –5㨪–10 kV. Generated positive charges
on the silicon surface are completely cancelled by the electrons flowing from the diffusion plasma region cyclically. Figure 8 shows typical ion implanted profile obtainedby simulation, where (a) energy distribution function of BF2+ ions subject to the silicon
substrate, (b) implanted depth profile of boron, (c) energy distribution function of PF2+
ions subject to the silicon substrate, and (d) implanted depth profile of phosphorous as aparameter of frequencies of RF power application from 1 MHz to 10 MHz. In this simulation, 70,000 times –5 keV implantation for determining implanted front and 30,000
times –0.3 keV implantation for maximizing the boron concentration at the silicon sur-101

face (larger than 2 1020 cm-3) are performed with a total dose of 3×1014cm-2. In thecase of PF2+ ions implantation, 45,000 times –7 keV implantation, 22,000 times –3 keV
implantation, and 33,000 times –0.3 keV implantation are performed with total dose of
5×1014cm-2. It is revealed that RF frequency of 4㨪6 MHz is optimum for applying
plasma doping. The plasma doping is carried out to the bare silicon surface not thethrough oxide implantation, so that the annealing temperature can be decreased down toless than 600͠(5).
MSEP is the unique plasma equipment that enables completely damage free radical
reaction based processing and continuous deposition and etching of multilayer thinfilms in the same process chamber only by changing the process gases. The process
performances in the radical oxidation, nitridation, oxinitridation, plasma CVD, RIE, andplasma doping will be drastically improved. We plan to produce a lot of MSEP
equipments for the volume productions of semiconductors, solar panels, and flat panel
displays.

MSEP Plasma Excitation Region

-

PF2+
BF2+

-

-

PF2+
BF2+

-5kV
10 ~ -10kV

10

20
ȝs

20
ȝs

~

~

Ion
Doping
PF2+,
BF2+

BF2+

-

PF2+
BF2+

Substrate

Substrate
Electrode

RF Pulse
Bias

PF2+

-5kV
~ -10kV

80 ~ 90ȝsec

80 ~ 90ȝsecElectronCancellation

Electron
Ion
Cancellation
DopingPF2+,
BF2+

Figure 7 Typical process sequence, where the pulsed RF bias (pulse width of 10㨪20
us, duty ratio of 10㨪20%) is applied to generate the pulsed self-bias voltages of -5㨪
-10 kV.

102

1
1.0

1.E+221022

BF2+䇭 10MHz

00.6
.6

Concentration (cm-3)

6MHz

f f(E)
(E)

4MHz

00.4
.4

2MHz

00.2
.2

1MHz
5
5

10
10

1.E+211021
1.E+20
1020

4MHz
2MHz

1.E+191019

6MHz

1.E+181018

15
15

1.E+171017
0

10E (k e V )2030

1.E+22
1022

PF2+䇭

(c)

4MHz
2MHz

1MHz
0
5
5

10
10

15
15

1.E+211021

Concentration (cm-3)

ff(E)
(E)

6MHz

Concentration (cm-3)

10MHz
00.6
.6

00.2
.2

50

PF2+䇭

(d)

00.8
.8

00.4
.4

40

Depth (nm)

1
1.0

0
0

1MHz

10MHz

0
0
0

BF2+䇭

(b)
Concentration (cm-3)

00.8
.8

(a)

1.E+201020

4MHz

1.E+191019
1.E+18
1018

2MHz

6MHz
6MHz

1MHz

10MHz
1.E+171017
0

E (keV )

10

20

30

40

50

Depth (nm)Figure 8 Typical ion implanted profile obtained by simulation, where (a) energy distributionfunction of BF2+ ions subject to the silicon wafer substrate, (b) implanted depth profile ofboron, (c) energy distribution function of PF2+ ions subject to the silicon wafer substrate, (d)implanted depth profile of phosphorous as a parameter of frequencies of RF power application from 1 MHz to 10 MHz.

3. Al2O3 Passivation Films on Aluminum Alloy (AlMg CeZr) Surface
In order to establish very reliable MSEP equipment described in the previous section,
Al2O3 passivation films having complete anticorrosion resistance and no moisture molecule emissions must be introduced on aluminum alloy surfaces where the high density
plasma of various gas ambience such as O2, H2, and halogen gases (Cl2, HCl, HBr, NF3,
BF3, PF3 C5F8 and etc.) is excited continuously. Al2O3 passivation films have beendeveloped on pure aluminum surface and aluminum alloy (AlMgZr) surface by introducing the nonaqueous anodic oxidation using the nonaqueous electrolyte solution(79% ethylene glycol + 20% ultra pure water + 1% ammonium adipate{H4NO2C(CH2)4CO2NH4}) (4). The ammonium adipate is unique electrolyte material
to obtain electro-conductivity at around pH of 7.0, which is strictly required for the103

aluminum alloy surface as shown in Fig. 9, where aluminum alloy surfaces are going to
be dissolved to the solution having pH value lower than 4.0 and higher than 8.5. The
relative dielectric constant of this nonaqueous electrolyte solution is 51, so that the applied voltage can be increased up to 200V without accompanying heterolysis dissociation of H2O molecules (H2O ψ H+OH-). The thickness of Al2O3 films is limited to
0.3Ǵm coming from this applied voltage (4). The nonaqueous anodic oxide Al2O3 hasbeen confirmed to exhibit no moisture molecule emission so that the process ambiencein the process chamber is maintained completely clean. Newly developed Al2O3 films
is completely different from conventional aqueous anodic oxidation alumite film whichemit huge amount of moisture molecules (4).
In order to increase the passivation film thickness, we have introduced diethylene
glycol instead of ethylene glycol so that the nonaqueous electrolyte solution is converted to (79.5% diethylene glycol + 20% ultra pure water + 0.5% ammonium adipate)
which relative dielectric constant is decreased down to 44. This newly introduced
nonaqueous electrolyte solution exhibits higher viscosity, so that the practical viscosity
must be decreased to obtain high quality Al2O3 passivation films. We have evaluated

ORP䋨 V vs. NHE䋩

two different processings such as to add IPA (Isopropyl alcohol: having a viscosity of
2.3 cp and a relative dielectric constant of 18), and to increase the temperature of theelectrolyte solution, as shown in Fig. 10. It becomes very clear from Fig. 10 that thevoltage during the constant current mode of 1mA/cm2 increases completely linear manner up to 400V only when the electrolyte
Al : 1ppm in Water
solution temperature is increased higher
1.5
Dissolu
Dissolution
passivthan 40͠, so that the temperature of
tion
ation
1.0
newly introduced diethylene glycol electrolyte solution is maintained at 50͠
0.5
for practical productions. Al2O3 film
Al2 O3
䊶3H2O
3+Al
AlO2thickness can be increased to 0.5Ǵm.
0In order to increase the mechanicalstrength of aluminum alloy, Mg concen-0.5
tration is increased to 4.5% and addi-1.0
tionally 1% Ce is introduced. The anticorrosion capability of aluminum alloy-1.5
Al2O3 passivation films particularly to
0 2 4 6 8 10 12 14
Cl2 ambience is enhanced very drastipH
cally as shown in Fig. 11, where the Figure 9 Pourbaix diagram of aluminum
weight loss of the aluminum alloy sam-104

ple covered by Al2O3 films is plotted after the Cl2 ambience exposure test, i.e. the samples are exposed to 100% Cl2 ambience of 0.3 MPa during 6 hours at 200͠. After theCl2 ambience exposure test, the samples are cleaned up by the ultra pure water for
10min. The weight loss due to this high pressure and high temperature 100% Cl2 ambience exposure test having 0.3 MPa at 200͠ during 6 hours has been confirmed todecrease down to 0.02% from 0.87% by adding 1% Ce to Al 4.5% Mg 0.1% Zr alloy.
Thus, we are now using Al 4.5% Mg 1% Ce 0.1% Zr alloys to the very advanced
plasma process equipment, where the standard enthalpy of formation to form oxides is–279 kJ/mol of Al2O3, -301kJ/mol of MgO, -299 kJ/mol of Ce2O3 and –275kJ/mol ofZrO2 as shown in Fig. 12, so that we can obtain very high integrity Al2O3 passivation
film on this aluminum alloy.

400

Effect of Al2O3 Film Improvement
IPA addition㧨increase ofelectrolyte temperature

350
300
Voltage [V]1.2

Material : 2%Mg-0.1%Zr-Al Alloy

0.8

DEG/23͠

250

0.6

200

DEG/40͠150

0.4

DEG/50%IPA/23͠

100

0.2

DEG/20%IPA/23͠

50
0

1.0

0

500

1000

1500

2000

2500

Current Density [mA/cm2]

450

0
3000

Time [sec]Figure 10 Current voltage characteristics for two different processings such as to add IPA(Isopropyl alcohol: having a viscosity of 2.3 cp and a relative dielectric constant of 18), andto increase the temperature of the electrolyte solution.

Rate of Weight Loss [%]

1
0.9

0.87

0.8
0.7

Condition of Cl2 Corrosion Test :(100%Cl2, 0.3MPa, 200͠×6hr) +(UPW×10min, Rinse)

0.6
0.5
0.4
0.3
0.2
0.1
0

0.02

4.5%Mg-0.1%Zr-Al Alloy

1%Ce-4.5%Mg-0.1%Zr-Al Alloy

Figure 11 Cl2 corrosion test results for Al 4.5% Mg 1% Ce 0.1% Zr alloy and Al 1% Ce 4.5% Mg 1% Ce 0.1% Zr alloy.

105

106

facturing equipment where the process speed decreases with a decrease of the patternsize, so that the current process equipment can be used only two to three technology
node, i.e., industries must replace the manufacturing equipment cyclically every two to
three technology node by investing huge amount of money.
Furthermore, damage free plasma process equipment has been confirmed to eliminate
the regulation of the circuit layout pattern of LSI circuit such as antenna ratio regulation.
About 100 plasma processings are used for the entire LSI productions at present, so thatthe antenna ratio of the circuit layout must be designed less than 100 in order to obtainhigh yield productions. For the circuit layout patterns including higher antenna ratio
larger than 1,000 and 10,000, the production yield is going to degrade with an increaseof antenna ratio. Arbitrary free circuit layout patterns can be used by an introductionof damage free plasma process equipment right now, i.e., the very exciting progress of
LSI performance.
Gas flow patterns in the process chamber of MSEP covered with Al2O3 passivation
films having perfect anticorrosion capability and no moisture molecule emission arevery well regulated to the very uniform laminar flow pattern by an introduction of very
advanced shower plate structures, resulting in no adhesion of reaction products to theinner surface of the process chamber. Thus, very difficult and completely new processings such as different thin film continuous depositions and different thin film continuous etchings in the same process chamber only by changing the process gases continuously will become available, i.e., the revolutional progress of the volume production
productivity by a factor of at least ten with keeping very high quality process results andsimultaneously improving the performance of silicon LSI for example over 100 GHz
clock rate very high speed operations.
References(1) T. Ohmi, M. Hirayama and A. Teramoto, J. Phys. D Appl. Phys.39(2006) R1(2) T. Ohmi, A. Teramoto, R. Kuroda and N. Miyamoto, IEEE Trans. Electron Devices,54(2007) 1471
(3) T. Goto, T. Matsuoka and T. Ohmi, J. Vac. Sci.A 27. 4(2009) 653(4) Y. Kawase, M. Kitano, F. Mizutani, M. Saeki, Y. Shirai and T. Ohmi, J. Electrochem.
Soc. 154 (2007) C530
(5) T. Nitta, T. Ohmi, Y. Ishihara, A. Okita, T. Shibata, J. Sugiura and N. Ohwada, J.
Appl. Phys., 67 (1990) 7404.

107

On the structure, properties and applications of metallic glasses
K. Georgarakis, M. Aljerf, K. Chornokhvostenko, A. LeMoulec, A.R. Yavari
WPI-AIMR European Branch, Euronano, Institut Polytechnique de Grenoble, France(euronano@minatec.inpg.fr)
1 .Introduction
Metallic glasses (MGs), currently on the cutting edge of Materials Science research,
are metastable materials that lack the long range order of conventional crystalline metals.
Inspite of their non-crystalline structure, the attractive interactions and the size
differences between constituting atomic species lead to a short and medium-range ordercharacterized by clusters of atoms which connect to fill the space nearly as densely as
their crystalline counterparts [1].
For about two decades after the discovery of the first glassy alloy quenched from theliquid in 1960, the critical cooling rate for suppression of crystallisation was extremely
high (of the order of 106 K/s), limiting the sample thicknesses to less than 100 ȝm and
impeding their wide application. In the 80’s, an improvement of the maximum size ofglassy specimens was achieved for a few alloys using fluxing techniques, bringing
down the critical cooling rates to about 104K/s. However, the trend changed in the early
90’s and bulk metallic glasses emerged as an important and promising new class ofmaterials. Since then, a large number of bulk alloys has been quenched to a glassy statewith thicknesses reaching several centimeters and critical cooling rates sometimes as
low as 1 K/s. This dramatic improvement in the glass formability was related to alloys
having three main features, i.e. multi-component systems, significant atomic size
differences above 12% between their components and negative heats of mixing [2].
The disordered atomic structure of metallic glasses results in a combination of
exceptional mechanical, electrochemical, tribological and soft magnetic properties
which are often superior to those of their crystalline counterparts. The combination of
their unique properties with their good formability through viscous flow in the
supercooled liquid state, and their near-net-shape casting ability has led to several
applications as in sensors, magnetic devices, reinforcements for high-performancesports equipment, micromotors, springs, armor devices, biomedical implants andornaments. However, the field of metallic glasses is believed to possess high potential
for further development.
Here we report on the structure, the deformation behavior and some applications ofmetallic glasses. In section 2.1 we show that binary Zr-Cu binary metallic glass can be111approximated as an ideal solution, whereas the addition of Al induces deviations fromthe ideal solution behavior. In section 2.2 using synchrotron radiation in transmissionmode, we report X-ray microprofiling diffraction data of a 30 mm diameter bulk sample
prepared at the WPI-AIMR of Tohoku University. In section 3, we report on thetemperature rise in the shear bands and the effect of sample size on the deformation
mechanism in metallic glasses. In section 4 we propose a new application for metallic
glasses; their use as reinforcements for the development of novel light weightcomposites with high specific strength.
2. Structure
2.1 Detection of deviations from ideal solution behavior in Zr-Cu metallic glasses
with addition of Al using synchrotron light
The use of synchrotron light can be highly advantageous for analyzing the structure ofmetallic glasses [3]. Whereas conventional X-ray beams are completely absorbed near
the surface, high energy, high flux radiation penetrates even thick samples, providing a
deeper understanding of the unique internal structure of metallic glasses.

Figure 1: Pair distribution functions for Zr-Cu binary (a) and Zr-Cu-Al ternary (b) metallic
glasses. Insets: close-up of the first PDF peak [4].

Using real space pair distribution functions (PDFs) derived from high precision x-ray
diffraction data, we attempt to probe the internal structure of metallic glasses based on
Zr and Cu and investigate the effect of a third element (Al) in their atomic structure.
The results provide a guide for producing thicker glassy alloys with enhanced
functionalities.
The PDFs of the Zr-Cu binary metallic glasses (figure 1a) reveal how the atomic
structure changes with the Zr/Cu atomic ratio. Increasing Cu content generates
112significant differences in the PDFs, suggesting modifications in the short (SRO) andmedium range order (MRO) up to 1.5 nm. As expected, the structural changes in thenearest neighbor (nn) shell [inset figure 1(a)], indicate an increased number of Zr-Zr
atomic bonds for the Zr-rich compositions, and increased number of Cu-Zr and Cu-Cu
atomic bonds for the Cu-rich site.
Addition of Al to the Zr-Cu metallic glasses leads to significant modifications of short(SRO) and medium range order (MRO), figure 1b. The nn shell [inset figure 1(b)]indicates the formation of a significant number of Zr-Al atomic bonds. This behavior
can be attributed to strongly attractive Zr-Al atomic interactions consistent with thehighly negative heat of mixing ǻHmix of -44 kJ/mol which is twice as negative as for ZrCu (-23 kJ/mol) whereas ǻHmix for Cu-Al is negligible (-1 kJ/mol). Al has anintermediate atomic size between those of Zr and Cu atoms. Because of the strongly
negative heat of mixing between Zr and Al atoms, addition of Al promotes chemical
short range ordering in the liquid, improves the local packing efficiency and slows
down long range atomic diffusion required for crystallization, leading to increased glass
forming ability (GFA).

Figure 2: Gaussian fitting of the first PDF peak for a) Zr50Cu50 and b) Zr50Cu40Al10 metallic
glasses. Thick black curves: experimental PDFs, thin red curves: calculated partial PDFs derived
from the experimental total PDFs, thin blue discontinuous curves: Gaussian partial PDFs scaled
to the weight factors of an ideal solution and thick discontinuous light blue curves: expected total
PDFs based on the weight factors [4], c) schematic diagram showing how the atoms in Zr–Cu
based metallic glasses form icosahedral clusters that pack tightly together by sharing faces (right)
or edges (left) [5].
For an ideal solution, the total pair distribution function (PDF) for Zr-Cu binary
alloys would be correlated with the partial PDF of Zr-Zr, Zr-Cu, and Cu-Cu atomic
pairs according to the following relation.
113

G(r)=WZrZrGZrZr+WCuCuGCuCu+2WZrCuGZrCu(1)
Approaching the ternary ZrCuAl alloys as ideal solutions, the correlation between
total and partial PDFs would be given as following:
G(r)=WZrZrGZrZr+WCuCuGCuCu+WAlAlGAlAl+2WZrCuGZrCu+2WZrAlGZrAl+2WCuAlGCu (2)where Wij= CiCjFiFj/(Ȉ CiFi)2, Wij are the ideal solution weight factors, Ci are the atomic
concentrations, Fi are the atomic form factors, G(r) are the total PDFs and Gij are thepartial PDFs.
The PDFs deriving from experimental XRD results for Zr-Cu binary metallic glasses
were found to be in good agreement with those expected from the weight factors of eq(1) (figure 2a), indicating that the Zr–Cu metallic glass can be satisfactorily
approximated as an ‘ideal solid solution’. Because of the relatively weak interactions
between Zr-Cu atoms in the binary alloy, only thin glasses can be cast from Zr–Cu
liquid alloys. However, adding a third strongly interacting component, aluminum (Al),to the liquid alloy leads to a stronger glass that can be cast at thicknesses of up to
several millimeters.
We have therefore determined that in contrast to the binary Zr–Cu, ternary Zr–Cu–Al
metallic glasses deviate markedly from ideal solution behavior, figure 2b. Zr–Cu–Al
liquids and glasses are comprised of finite regions of atomic order, providing the extra
resistance to crystallization needed to form thicker glasses. This phenomenon isbelieved to be due to attractive interactions between the sp-electrons of aluminum andthe d-electron shell of the larger zirconium atoms. The atoms arrange in clusters
resembling icosahedra, which pack together tightly in the glass (figure 2c), as observedin a previous study [5].
2.2 X-ray diffraction micro-profiling of a 30 mm diameter Zr based BMG from the
WPI-AIMR Tohoku University at the European Synchrotron Radiation Facility
A Zr-based bulk metallic glass sample with composition Zr55Cu30Ni5Al10, received
from Dr. Y. Yokoyama of the WPI-AIMR Tohoku University was examined by X-ray
diffraction in transmission using high-energy synchrotron light at the European
Synchrotron Radiation Facility (ESRF). The sample had the shape of a cylindrical rod
with 30 mm diameter and 12 mm height. X-ray diffraction micro-profiling was carriedout on 0.75 mm thick slices cut along the casting and the radial axes. X-ray diffraction
patterns acquired every 100 ȝm, revealed the amorphous structure of the examined bulk
sample as manifested by the successive diffraction halos and the absence of Bragg
peaks in the plots of XRD intensity versus the wave vector Q (Q = 4ʌ sinș/Ȝ where ș isthe diffraction angle and Ȝ the wavelength), figure 3b.


114

a

b

Figure 3: a) Image of the Zr based BMG, b) X-ray diffraction micro-profiling along the cast axis.

3. Size effect on the deformation mechanism of metallic glasses
Metallic glasses exhibit remarkable mechanical properties, such as high mechanicalstrength up to 5 GPa [6], elasticity up to 2% strain, and good formability throughviscous flow in the supercooled liquid state. However, their limited ductility at ambient
temperature, especially in tension, serves as a major impediment to their wider
application. This behavior is attributed to work-softening and inhomogeneous flow
localized in shear bands.
We have recently shown clear and direct evidence of melting in the shear bands insome bulk metallic glasses due to elastic energy release in the form of heat in the shear
zones. Shear steps were found at several instances to have been formed in successive
increments with evident wear and tear on a thickness scale larger than the expected
thickness of about 10 nm for the shear band itself (figure 4). The estimated range ofattained temperatures and the observed morphologies are consistent with shear steps
forming at a subsonic speed limited by a required redistribution of local microscopic
stresses. Calculations indicated that a 0.2 ȝm thick layer melts in the vicinity of a shear
band forming a shear step of the order of 1 ȝm [7].

Figure 4: a) SEM images of shear steps formed on the surface of a Zr-based BMG, b) a ratherfeatureless step having formed meniscus with the upper part of the specimen indicating that theentire width of the step of about 5 ȝm melted at some point, c) arrows show U-shaped meniscus
locations at the step bottom indicating viscous behavior and high temperatures at the end of theshear event. [7].

115

However, below a critical sample size, the temperature rise in the shear bands would
be expected to be insignificant.
In addition, a scientifically interesting andtechnologically attractive discovery has been made recently, reporting a transition frominhomogeneous deformation and shear banding to a homogenous deformation mode
when the sample size is reduced to below 400 nm [8].

Figure 5: SEM images of the surface of heavily deformed Zr-based metallic glasses [9].

Using a special “soft” ball milling technique, we heavily deformed metallic glass
ribbons and obtained foil specimens with thickness in the range of 200 nm to 2 ȝm. The
SEM images of figure 5 correspond to Zr based metallic glasses after such heavy
deformation with thickness of the order of 1-2 ȝm. On the surface of these samples,shear steps can easily be observed, indicating that deformation was carried out by shear
banding, in an inhomogeneous deformation mode.
On the other hand, with the decrease of the samples size to thicknesses of the order of
250-300 nm, shear steps disappear from the surfaces of the heavily deformed samples(figure 6), indicating that deformation in these ultra-thin samples was no longer by
shear banding, but by a homogenous deformation mechanism. This sample-size
induced transition in the deformation mode may be attributed to a critical strained
volume necessary to reach sufficiently high energies for the formation of a shear band[8].



Figure 6: SEM images of the surface of a deformed Zr-based metallic glass with thickness of 
the order of 250-300 nm [7].
116Transmission electron microscopy (TEM)
revealed the presence of shear bands in heavily
deformed Pd-based metallic glass samples
with thickness in the range of 0.5-1 ȝm (figure
7),
indicatingthatthe
predominant
deformation mechanism is still localized flow
and shear banding, as expected for metallic
glasses with dimensions above 400-500 nm.
The thickness of the observed shear bands isof the order of 20-25 nm.
TEM examination of a Zr based metallic
glass with thickness of about 250-300 nm after
heavy deformation revealed only ahomogenous structure, without any evidence
for the existence of shear bands (figure 8).
This observation indicates that during “soft”
ball milling, the thickness of the sample
becomes small enough (below 400 nm) toallowed a transition from heterogeneous
deformation and shear banding (which is the
expected deformation mechanism of metallic
glasses at temperatures well below their glasstransition) to homogeneous deformation. The
above observations seem to be in good
agreement with the SEM observations of
figures 5 and 6 [9].
a

shearbands

Figure 7: TEM image of a heavily
deformed Zr-based metallic glass withthickness around 1ȝm.

Figure 8: TEM image of a heavily
deformed Zr-based metallic glass withthickness below 300 nm.

b

Figure 9: a) Pair distribution functions (PDFs) of metallic glass in the non-deformed anddeformed state, b) close-up in the first and second nearest neighbour (nn) shell [9].
117The effect of deformation on the atomic structure of metallic glasses was studied
using real space pair distribution functions (PDFs) derived from high precision x-ray
diffraction data acquired at the European Synchrotron Radiation Facility (ESRF).
Figure 9 shows the pair distribution function of a Zr based metallic glass in the as cast(ribbons) deformed (milled) and annealed state (Ribbons Annealed and Milled
Annealed, annealing performed at temperatures between glass transition Tg andcrystallization temperatures Tx). No significant changes can be observed in the PDFs
between the deformed and non-deformed state (figure 9b). However, a close up of thefirst and second PDF peak (right figures below) reveals some small differences between
the deformed and non-deformed state in the first and second nearest neighbour’s shell.
This indicates small modifications in the short and medium range order of the atomic
structure of metallic glasses induced by heavy deformation. Since we showed earlier
that shear banding can result in significant local heating, it is likely that the similarity inatomic structure of the deformed and undeformed metallic glass is due to fast reestablishment of any local (SRO or MRO) atomic order perturbed by the deformation.
4. Some applications of metallic glasses
In addition to the other reported applications of metallic glasses, metallic glasses canalso be used as efficient reinforcements in light weight composites with high specificstrength, as recently demonstrated [10, 11].
Light-weight materials of advanced performance are now experiencing global interest
due to the growing importance of environmental issues and energy saving strategies inland and air transportation and machinery industries. We have recently developed novel
light weight composites with improved engineering properties using commercial grade
light alloy metal matrices with micro and nanometer scale metallic glass particles asreinforcements. The metallic glass particle dispersions serve both as binder and as
reinforcement in Mg-based and Al-based industrial alloys, resulting in composites withfull density and good mechanical properties. This novelty uses advantageously theunique property of metallic glass particles to become very soft above their glasstransition temperatures (Tg) allowing them to act as a soft binder phase and remove
porosity during hot compaction together with light alloy powders. After compaction to
full density (fig. 4a) and cooling to below Tg and down to room temperature, the same
glassy particles become the hard reinforcement phase due to their 2% elastic strain
range, resulting in composite materials with significantly improved strength.
The microstructure of an Al alloy composite reinforced with Cu based metallic glass
particles is shown in figure 10a. The bright particles in the back-scattered electron SEM118

image correspond to the metallic glass phase. The distribution of the glassy particles in
the matrix is uniform without any preferred orientation and without any visible pores in
the matrix, indicating successful full densification of the composite. Though, a few %of metallic glass particles are still quite large (about 40 μm in one dimension), a
significant fraction of the particles is in the range from a few hundred nanometers to 10
μm.

a



b

Figure 10: a) Microstructure of a novel light weight composite with Al-based matrix and Cubased metallic glass reinforcement, b) Compression stress-strain curves of the same composite
material in comparison with the matrix Al alloy [10].

The yield strength of the Al alloy/ metallic glass composite is about three times higher
than that of the matrix alloy. In addition the composite exhibits a mechanical strengthat fracture of about 840 MPa and an appreciable plastic strain before fracture of about
13% (figure 10b). This combination of mechanical properties is remarkable and among
the best ever reported for an aluminum alloy matrix composite. Furthermore, the results
are fascinating in the sense that the composite sintered from powders is much stronger
than the matrix alloy produced by casting. This is a reliable indication of successful
sintering that produced excellent bonding between the powder particles of the matrix aswell as between the matrix and the metallic glass reinforcement particles [10].

abFigure11: a) Microstructure of a novel light weight composite with Mg-based matrix and Zrbased metallic glass reinforcement, b) Compression stress-strain curves of the same
composite material in comparison with the matrix Mg alloy [11].
119Similarly, composites with a Mg alloy matrix and a Zr-based metallic glass were also
developed recently [11]. The mechanical strength of the composite is markedly
increased compared to the Mg alloy, retaining a plastic strain before fracture of about
10%, leading again to a noticeable combination of mechanical properties which isamong the best reported for magnesium alloy matrix composites.
5. Summary
Binary Zr-Cu binary metallic glass can be satisfactorily approximated as an ideal
solution, due to weak interactions between Zr-Cu atoms. However, adding a third
strongly interacting component, aluminum (Al), to the liquid alloy leads to strong
deviations from the ideal solution behavior and to a stronger glass that can be cast at
thicknesses of up to several millimeters.
SEM observations of shear steps on deformed BMGs show direct evidence of melting
as expected from elastic energy release in form of heat during shear deformation. A
scientifically interesting and technologically attractive transition from heterogeneous
deformation localized in shear bands to a homogeneous deformation mode occurs with
reducing samples size down to the 100 nanometer scale. Submicron thickness samples
can be produced by a special “soft” ball milling technique.
Micron and submicron metallic glass particles can be used as reinforcements in Mg
alloy based and Al alloy based composites producing light weight materials withsuperior mechanical performance, and thus attractive for energy saving applications in
the transportation, aviation and heavy machinery industries.
Acknowledgements
The authors are grateful to Prof. W. Botta of UFSCar, Brazil, for providing TEM
facilities and fruitful discussions and to Dr G. Vaughan and the ESRF for synchrotron
beamtime and precious advice. This work was done in collaboration with Professor A.
Inoue of Tohoku University and Prof. D. Louzguine of the WPI-AIMR.
References[1] A.R. Yavari, Nature 439 (2006) 405.
[2] A. Inoue Acta Mater. 2000; 48.
[3] Yavari, A. LeMoulec, A. Inoue, N. Nishiyama, N. Lupu, E. Matsubara, W. Botta, G.
Vaughan, M. Di Michiel, Å. Kvick, Acta Mater. 53 (2005) 1611.
[4] K. Georgarakis, A.R. Yavari, D.V. Louzguine, J. Antonowicz, M. Stoica, M. Satta,
G. Vaughan, A. Inoue, Appl. Phys. Let. 94 (2009) 191912.

120

[5] Ch.E. Lekka, A. Ibenskas, A.R. Yavari and G.A. Evangelakis, Appl. Phys. Lett. 91(2007) 214103.
[6] A. Inoue, B.L. Shen , H. Koshiba , H. Kato, A.R. Yavari, Nature Materials, 2 (2003)
661.
[7] K. Georgarakis, M. Aljerf, Y. Li, A. LeMoulec, F. Charlot, A.R. Yavari, K.
Chornokhvostenko, E. Tabachnikova, G.A. Evangelakis, D.B. Miracle, A.L Greer, T.
Zhang, Appl. Phys. Let. 93 (2008) 031907.
[8] Volkert CA, Donohue A, Spaepen F. J. Appl. Phys. 103 (2008) 083539.
[9] K. Georgarakis, A.R. Yavari, A. Inoue, “Deformation and Shear Bands in Metallic
Glasses”, invited presentation at E-MRS Fall Meeting, Sept. 2009, Warsaw, Poland.
[10] D. Dudina, K. Georgarakis, Y. Li, M. Aljerf, A. LeMoulec, A.R. Yavari, A. Inoue,
J. Mat. Scie., (submitted).
[11] D.V. Dudina, K. Georgarakis, Y. Li, M. Aljerf, A. LeMoulec, A.R. Yavari, A.
Inoue, Composites Science and Technology 69 (2009) 2734.



121

Newly Appointed
Junior Principal Investigators

Curriculum Vitae of Junior PI

Ali KHADEMHOSSEINIPRIMARY AFFILIATION:
Assistant Professor
Harvard-Massachusetts Institute of Technology
Division of Health Sciences and Technology
Harvard Medical School / Brigham and Women's Hospital
65 Landsdowne Street, Rm. 265
Cambridge, MA, 02139, USA
Tel: +1-617-768-8395 / Fax: +1- (617) 768-8477
Email: alik@rics.bwh.harvard.edu
ACADEMIC:
1999 B.S. in Chemical Engineering, University of Toronto, USA
2001 M.S. in Chemical and Biomedical Engineering, University of Toronto, USA
2005 Ph.D. in Bioengineering, Massachusetts Institute of Technology, USA
PROFESSIONAL EXPERIENCE:
2005-2006
Postdoctoral Associate, Harvard-MIT Division of Health Sciences and Technology
Massachusetts Institute of Technology, Harvard University, USA
2005-present Associate Bioengineer, Brigham and Women’s Hospital, USA
2006-present Assistant Professor, Department of Medicine, Harvard Medical School, USA
2006-present Assistant Professor, Division of Health Sciences and Technology (HST), Massachusetts
Institute of Technology, Harvard University, USA
2009-present Junior Principal Investigator, WPI Advanced Institute for Materials Research, Tohoku
University
RECOGNITION:‫ܕ‬MIT's Outstanding Undergraduate Research Mentor (2003-2004)‫ܕ‬Poitras pre-doctoral fellowship (2004-2005)‫ܕ‬Biomedical Engineering Society Outstanding Graduate Student Award (2005)‫ܕ‬OMNOVA/MIT PPST Award - Outstanding Polymer-related Research (2004-2005)‫ܕ‬Coulter Foundation Young Investigator Award in Bioengineering (2006)‫ܕ‬TR35 Top Young Innovator Award, Technology Review (2007)‫ܕ‬BMW Scientific Award (2007)‫ܕ‬Victor K. LaMer Award, Surface and Colloid Science Division, American Chemical Society (2008)‫ ܕ‬IEEE EMBS Early Career Achievement Award (2008)‫ ܕ‬NSF CAREER Award (2009)‫ ܕ‬International Academy of Medical and Biological Engineering Young Faculty Member Award (2009)
CURRENT RESEARCH:

Broadly described, my research involves the merger of microfabrication techniques and advanced
biomaterials for generation of engineering systems that can be of benefit for biological and biomedical
applications. This is based on developing micro- and nanoscale technologies to control cellular behavior
with particular emphasis in developing microscale biomaterials and engineering systems for tissue
engineering. We have made a number of important contributions in developing technologies to control theformation of vascularized tissues with appropriate microarchitectures as well as regulating stem celldifferentiation within microengineered systems. At Tohoku University my lab will focus on developing
microfluidic system that can be used for disease diagnostics as well as engineering of biomaterials that canbe integrated into these systems to enhance functionality.
125Curriculum Vitae of Junior PI

Winfried TEIZERPRIMARY AFFILIATION:
Associate Professor
Department of Physics
Texas A&M University
College Station,
TX 77843-4242, USA
Tel.: +1-979-845-7730
Fax: +1-979-845-2590
Email: teizer@physics.tamu.edu
ACADEMIC:
1995 M.S., University of Massachusetts, Amherst, USA
1997 Diplom, Universität Karlsruhe, Germany
1998 Ph.D., University of Massachusetts, Amherst, USA

PROFESSIONAL EXPERIENCE:
1991-1992
Assistant Lecturer, Institut für Angewandte Mathematik, Universität Karlsruhe, Germany
1993-1996
Teaching Assistant, Physics Department, University of Massachusetts, Amherst, USA
1994-1998
Research Assistant, University of Massachusetts, Amherst, USA
1998-2001
Post-doc, University of California, USA
2001-2006
Assistant Professor, Texas A&M University, College Station (TAMU), USA
2003-present Director of Center for Nanoscale Science and Technology (CNST), TAMU, USA
2004-present Joint Assistant Professor, Electrical and Computer Engineering, TAMU, USA
2006-present Associate Professor, Physics & Joint Ass. Professor, Electrical and Computer Engineering,
TAMU, USA2008-present Chair of the Faculty Senate Research Committee, TAMU, USA
2009-present Junior Principal Investigator, WPI Advanced Institute for Materials Research, Tohoku
University
RECOGNITION:‫ܕ‬Exchange Fellowship: Massachusetts, USA í Baden-Württemberg, Germany (1992-1993)‫ܕ‬European Union/Science and Technology Agency, Japan Post-Doc Fellow (1998-1999), declined‫ܕ‬Montague/Center for Teaching Excellence Scholar, Texas A&M University (2004)

CURRENT RESEARCH:y Biophysics: Biomolecular Motility and Adsorption Studiesy Nanomagnetism: Single Molecule Magnets
y Highly Correlated Materials: Metal-Insulator Transition in disordered Electronic Systems

126Curriculum Vitae of Junior PI

Hongkai WU
PRIMARY AFFILIATION:
Assistant Professor
Department of Chemistry
Hong Kong University of Science and Technology
Clear Water Bay, Kowloon,
Hong Kong, P.R.China
Tel: +852-2358-7246
Fax: +852-2358-1594
Email: chhkwu@ust.hk.
ACADEMIC:
1995 B.S. in Chemistry; University of Science &Technology of China, P.R.China
1997 M.S. in Chemistry; University of Science &Technology of China, P.R.China
2002 Ph.D., Harvard University, USA

PROFESSIONAL EXPERIENCE:
2002-2005
Postdoctoral Fellow, Stanford University, USA
2005-2007
Professor, Chemistry Department, Tsinghua University, P.R.China
2007-present Assistant Professor, Chemistry Department, Hong Kong University of Sci.&Tech.,
P.R.China
RECOGNITION:‫ ܕ‬Guo Moruo Prize, University of Sci.&Tech. of China (1995)‫ ܕ‬Tsinghua “Hundred Talents” award (2005)‫ ܕ‬Li Foundation Heritage Prize (2006-2007)‫ ܕ‬DuPont Young Professor Grant (2007-2009)
CURRENT RESEARCH:y Microfluidics, BioMEMS, Materials and Surface Chemistry, Micro/nanofabrication.

127

WPI-AIMR
Newly Appointed Research Staff

Curriculum Vitae

Naoki ASAO
Professor
E-mail: asao@m.tains.tohoku.ac.jp

ACADEMIC:
1987 B.Sc. in Chemistry, Faculty of Science, Tohoku University
1989 M.Sc. in Chemistry, Graduate School of Science, Tohoku University
1992 Ph.D. in Chemistry, Graduate School of Science, Tohoku University
ACADEMIC DEGREE: Doctor of Science, 1992

PROFESSIONAL EXPERIENCE:
1991-1992
JSPS Fellow, Graduate School of Science, Tohoku University
1992-1993
Research Associate, Graduate School of Science, Tohoku University
1993-1995
Research Associate, Institute for Molecular Science
1995
Research Associate, Graduate School of Science, Tohoku University
1995-1998
Lecturer, Graduate School of Science, Hokkaido University
1998-2001
Lecturer, Graduate School of Science, Tohoku University
2001-2009
Associate Professor, Graduate School of Science, Tohoku University
2004
Visiting Scientist, MIT, USA
2009
Professor, Graduate School of Science, Tohoku University
2009-present
Professor, WPI Advanced Institute for Materials Research, Tohoku University
RECOGNITION:‫ܕ‬Daicel Chemical Industries Award in Synthetic Organic Chemistry, Japan (1995)‫ܕ‬Chemical Society of Japan Award for Young Chemists (1997)

CURRENT RESEARCH:
My current research is focused on the development of new nanostructured metals, such as supported
metal nanoparticles and nanoporous metals, as heterogeneous metal catalysts for synthesis offunctional organic materials.

131Curriculum Vitae

YongSeok CHO (Jho)Assistant Professor
E-mail: jho@wpi-aimr.tohoku.ac.jp

ACADEMIC:
1998 B.S. in Physics, Korea Advance Institute of Science and Technology
2000 M.S. in Physics, Korea Advance Institute of Science and Technology
2006 Ph.D. in Physics, Korea Advance Institute of Science and Technology
PROFESSIONAL EXPERIENCE:
2006-2007
Postdoctoral Fellow, Department of Physics, Korea Advance Institute of Scienceand Technology
2007-2009
Postdoctoral Fellow, Material Research Laboratory, University of California at
Santa Barbara
2009-presentResearch Associate, WPI-Advanced Institute for Materials Research,
Tohoku University
CURRENT RESEARCH:
x Theoretical and computational study on charged biological materials
x Multiscale computational study on biological and soft condensed materials

Arnaud CARON
Research Associate
E-mail: a.caron@wpi-aimr.tohoku.ac.jp

ACADEMIC:
1998 Maîtrise in Metallurgy, University Henry Poincaré, France
2004 Graduate Engineer (Dipl.-Ing.) in Materials Science, Saarland University,
Germany
2009 Dr. Eng., Saarland University, Germany
PROFESSIONAL EXPERIENCE:
2004 - 2006
Assistant Researcher, Saarland University and Fraunhofer-IZFP, Germany
2007 - 2009
Assistant Researcher, Institute of Micro- and Nanomaterials, University of Ulm,
Germany
2009
Postdoctoral Researcher, Institute of Micro- and Nanomaterials, University of Ulm,
Germany
2009-present
Research Associate, WPI-Advanced Institute for Materials Research,
Tohoku University
CURRENT RESEARCH:
x Further development of Atomic Force Acoustic Microscopy (AFAM) and application toengineering and biological materials, i.e. measurement of elastic / visco-elastic properties andinvestigation of internal frictionx Elastic / anelastic and mechanical properties of Bulk Metallic Glasses
132

Curriculum Vitae

Xingyou LANG
Research Associate
E-mail: xylang@wpi-aimr.tohoku.ac.jp
URL: http://www.wpi-aimr.tohoku.ac.jp/chen_labo/

ACADEMIC:
2002 B.S. in Chemistry, Jilin University, P.R.China
2007 Dr. Eng. in Engineering, Jilin University, P.R.China
PROFESSIONAL EXPERIENCE:
2002
Research Assistant, Changchun Institute of Applied Chemistry, Chinese Academyof Sciences, P.R.China.
2007-2009
JSPS Postdoctoral Fellow, Institute for Materials Research, Tohoku University
2009-present
Research Associate, WPI-Advanced Institute for Materials Research,
Tohoku University
CURRENT RESEARCH:
x Nanoporous metal and their applications;x Optical properties of metallic nanostructures and their applications.
x Phase transition thermodynamics of nanomaterials.

Hao LIU
Research Associate
E-mail: liuhao@wpi-aimr.tohoku.ac.jp

ACADEMIC:
2004 B.S. in Applied Chemistry, Huazhong University of Science and Technology,
P.R.China.
2009 Dr. in Polymer Physics, Changchun Institute of Applied Chemistry, P.R.China
PROFESSIONAL EXPERIENCE:
2009-present
Research Associate, WPI Advance Institute for Materials Research,
Tohoku University
CURRENT RESEARCH:
Preparation of polymer nanocomposites by high shear blending. Investigation of the nanocomposites
by means of nanomechanical mapping, transmitting electron tomography, etc.

133Curriculum Vitae

Yoichi TANABE
Research Associate
E-mail: youichi@sspns.phys.tohoku.ac.jp

ACADEMIC:
2004 B.E. in Applied Physics, Tohoku University
2006 M.E. in Applied Physics, Tohoku University
2009 Ph. D. in Applied Physics, Tohoku University
PROFESSIONAL EXPERIENCE:
2008-2009
SPS Research Fellow, Department of Applied Physics, Tohoku University
2009-present Research Associate, WPI-Advanced Institute for Materials Research,
Tohoku University
CURRENT RESEARCH:y Physics of condensed matter (Superconductivity)
y Study on clathrate materials, high-Tc cuprate superconductors

Kai ZHAO
Research Associate
E-mail: kzhao@wpi-aimr.tohoku.ac.jp

ACADEMIC:
1999 B.S. in Materials and Process Engineering, Shenyang Institute ofTechnology, P.R.China
2002 M.S.in Materials and Process Engineering, Heibei University of Technology, P.R.China
2006 Dr. in Materials Science, Institute of Metal Research, Chinese Academy of Sciences,
P.R.China
PROFESSIONAL EXPERIENCE:
2006-2008
Assistant Professor, Institute of Metal Research, Chinese Academy of Sciences,
P.R.China
2008-2009
Postdoctoral Fellow, National Institute for Materials Science
2009-present Research Associate, WPI Advanced Institute for Materials Research, Tohoku
University
CURRENT RESEARCH:
x Crystallization of Multicomponent Bulk Metallic Glasses

134

WPI-IFCAMWPI-IFCAMInternational Frontier Center for Advanced Materials (IFCAM) was inaugurated in Institute forMaterials Research (IMR), Tohoku University, in October 2001 to function, simply stated, as theworld-first “materials science think-tank.” With wise steering by past directors, IFCAM has been
performing well in its mission until now by 1) bringing in many world-renown researchers to IMR
in the greater field of materials science/engineering, 2) enlightening / encouraging young scientists,
post-doctoral fellows and graduate students by organizing and supporting workshops/summer
schools, and 3) establishing and coordinating IFCAM branch offices around the world, including
those in Cambridge University, Harvard University, Stanford University, and Institute of Physics,
P.R. China.
We were also so fortunate to have had a government initial-equipment fund in 2002 to acquire
several advanced tools, such as 3-dimention atom-probe tomography (3-D AP) and low energy
electron microscope (LEEM). With untiring effort of able faculty members and their staff /graduate students, the LEEM program of IFCAM, for instance, has quickly become one of the mostactive and successful research centers in the world.
Realizing that IFCAM and newly established WPI-AIMR have essentially the same mission:
namely, further promote international collaboration and cooperation in innovative research on
advanced materials on a global bases, IFCAM was transferred from IMR to WPI-AIMR, effectiveof April 2008.
Briefly stated, WPI-IFCAM has following function and service.
1. Visiting Professorship
2. Workshops / summer schools
í. Visiting Professorship
Qualified researchers who may be interested in IFCAM visiting professorship should first contact
the WPI principal investigator(s) of the related research fields. Your contact PIs will initiate thefurther process to materialize the joint research.
(1) Tenure: For a period of minimum one month to a maximum of 3 months.
(2) Financial: The salary varies, depending on the qualifications, based on the Tohoku University
regulations. Roughly speaking, “full professor” receives Y600,000 per month and “Associate
Professor” receives Y500,000 per month.
î. Workshops / summer schools
WPI-IFCAM will financially support the workshops and summer schools, if the scientific aims arealong the WPI-AIMR missions. For more information, please contact WPI Administrative Office.

137㪦㪩㪜㪪㪟㪢㪠㪥㪃㩷㪘㫅㪻㫉㪼㫀㪠㫍㪸㫅㫆㫍㫀㪺㪿㪎 㪚㪟㪜㪥㪃㩷㪟㫆㩷㪪㫆㫌㪍㪌 㪮㪘㪥㪞㪃㩷㪮㪼㫀㪿㫌㪸㪋 㪡㪠㪘㪃㩷㪡㫀㫅㪽㪼㫅㪾㪘㪅㩷㪠㫅㫆㫌㪼

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138

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WPI Activity Report of Professor W. H. Wang
Aug. 5th, 2009- Oct 30th, 2009
Host: Professor M. W. Chen
Two objectives were achieved during this short period of three months at WPI-AIMR
in Tohoku University. The first was investigating the role of microalloying on theglass-forming ability and mechanical and physical properties of bulk metallic glasses.
Minor addition or microalloying technique, which has been widely used in othermetallurgical fields, plays effective and important roles in formation, crystallization,
thermal stability and property improvement of bulk metallic glasses. This simple
approach can induce giant properties changes in metallic glasses and provides a
powerful tool for the BMG-forming alloys development and design. However, up toknow, little work has been done on the atomic and electronic origins for the
microalloying effect on the properties of the glass-forming alloys. We try here tounderstand the roles of the minor addition in the formation and the properties of the
BMGs and the BMG-based composites by using atom probe technique and simulation.
Some interesting data were obtained and a manuscript entitled “Giant properties
changes in metallic glasses induced by microalloying” is in preparation.
Another study started was to investigate the correlation between the plastic
deformation and relaxation in metallic glasses. Primary work shows that the
deformation unit of shear transformation zone (STZ) has close correlation with slow
Beta-relaxation in metallic glasses. The study could provide insight on the plastic
deformation mechanism and of the metallic glasses, on the other hand, This result has
significance for revealing the origin of the beta relaxation in metallic glasses. Work isgoing on this aspect and it will be continued in future cooperation with Prof. Chen’sgroup in WPI.
I would like to thanks Prof. Ming Wei Chen and WPI for offering me the opportunity
to visit here. The administrative help and support provided by Ms. Mariko Onodera and
Ms. Saitoh, and member in Prof. Chen’s group is greatly appreciated.

139

WPI Activity Report of Professor A.I. Oreshkin
September 4th, 2009- December 3th, 2009
Host: Professor Tomihiro HASHIZUME
Self-organized nanostructures and thin films of organic materials compatible with Sibased semiconductor systems are currently of great interest for expanding
microelectronic technologies to nanoscale range and for applications in optoelectronic
devices. Among them, carbon fullerenes and their derivatives are very promising forthe fabrication of electro-active elements in photovoltaic solar cells, active layers inorganic field-effect transistors, and as building blocks for chemical manipulation in
nano-science applications to develop new functionalities. During my stay at WPIAIMR in Tohoku University I was working on project: “The initial adsorption of single
C60F18 molecules on Si(100)-2×1 surface.” In contrast to C60F46÷48 molecules (whichhave been studied before) tortoise-shaped polar (! 9 Debye!) C60F18 molecules are very
asymmetrical: all the 18 fluorine atoms are bound to one hemisphere of C60 only andflatten its shape. It has been found that the all C60F18 molecules are very stable and do
not react with the surface at room temperature. The step edges and terraces areadsorption sites of equal priority. Being deposited on Si(100)-2×1 surface C60F18
molecules occupied the troughs between dimmer rows. High resolution STM images ofindividual molecule and theoretical calculations of adsorption energy allowed us getting
conclusion about possible orientation of C60F18 molecule with regard to substrate. The
adsorption energy of the molecule, Ead is calculated from Ead = E(C60F18) + E(Si) E(C60F18/Si), where E(C60F18), E(Si), and E(C60F18/Si) are the total energies of a free
C60F18 molecule, Si(100)-2u1 surface, and the combined system, respectively. Amongthe three different orientations of a C60F18 molecule considered on Si(100)-2u1 surface,
the adsorption energy for the bottom orientation is very high as compared to for the top
and for the side orientations. Accordingly it is expected that C60F18 molecule would
instantaneously align to the bottom orientation, with the fluorine atoms pointing
towards the Si substrate. In the mean time our experimental results show that the C60F18
molecule always tilted with regard to Si(100)-2×1 surface. Attractive electrostaticinteractions between the strongly polarized C60F18 molecules probably account for thecloseness of the molecules. Step by step annealing of up to 500° C has not revealed anychanges in molecular structure. At 500° C molecule starts to decompose. It has beenfound that in the presence of C-defects on the Si(100)-2×1 surface, they work as
attractive centers for C60F18 molecules. The manuscript is under the preparation.
I would like to emphasize that I have found an enjoyable and stimulating scientificenvironment in the WPI-AIMR and I would like to thank the direction of WPI-AIMR
and Tohoku University for giving me opportunity to work here. I am very grateful for
their kindness and hospitality during my stay in Sendai.
140

Professor Ho S Chen, WPI Activity Report
October 1, 2009 – November 30, 2009
Host: Professor Akihisa Inoue
The author has conducted series of investigations on the relaxation dynamics ofmetallic glasses since the early development in 1970’s and 1980’s. Calorimetric andmechanical dynamic measurements of glassy alloys revealed the sort of secondary
relaxation, or beta-relaxation, clearly for many ternary alloys but is nearly absent inbinary alloys. In mechanical dynamic relaxation measurements, at f ~ 1 Hz, beta –relaxation loss peak appears, and being well separated from the primary alpha –relaxation at T well below Tg (T ~ ¾ Tg) for many BMG. The most and significant
observation is the appearance of two relaxation loss peaks, called sub Tg- and primary
Tg – relaxations. The sub Tg- relaxation appears as a shoulder to the Tg – alpharelaxation peak, while the alpha peak is very narrow and can be fitted fairly well with
Debye peak.
Recently, there have renewed interest on the studies of mechanical and structural
relaxations of BMG. Two major issues emerge regarding the secondary relaxation andprimary relaxation at Tg. Firstly whether all glass forming liquids show high frequency
dynamic modes of Johari-Goldstein (J-G) relaxation distinct from the primary alpharelaxations. Secondly the so-called slow beta-relaxation, or excess wing (EW) is justthe low free energy tail of the activation barrier distribution of primary alpha-relaxation,
and whether the secondary relaxation connected with fragility of BMG.
For past month or so, we critically examined the calorimetric and mechanicaldynamic relaxations of classic BMG, Pt-Ni-P, Pd-Ni-P and Pd-Cu-Si alloy glasses.
These three glasses belong to rather fragile glasses of m ~ 50 – 60. We find a distinct
difference regarding the occurrence of beta- relaxation between Pd-Cu-Si, and Pa-Ni-P
and Pt-Ni-P glasses. In all three glasses, there appears distinct beta – relaxation in as
quenched samples. However after reheating the samples to Tg, the beta-relaxation
disappears in Pd-Ni-P and Pt-Ni-P glass but Pd-Cu-Si glass. Clearly the beta-relaxationin BMG may correlate to fragility as has been proposed by many researchers, but may
be not the dominant factor. We suggest that it is the medium-range topologicalordering of the glass structure influences greatly the secondary relaxation in BMG.
We also have initiated investigation on the two-step relaxation processes at Tg. We
hope that these studies will shade-light better understanding of glass transition of BMG.

141

Announcement

Announcement
The 2010 WPI-AIMR Annual Workshop
March 25, Thursday - March 27, Saturday, 2010
Sendai Excel Hotel Tokyu and Sendai International Center
http://www.wpi-aimr.tohoku.ac.jp/workshop/
In the process of realizing three major goals of WPI Advanced Institute for Materials
Research (WPI-AIMR) of Tohoku University; (1) Invent and develop new andinnovative functional materials, (2) Establish a system adequate as a World Premier
Research Center, and (3) Strengthen international cooperation and construct a world
visible center,
http://www.wpi-aimr.tohoku.ac.jp/en/modules/wraps/index.php/greetings/message2.html,

we have been organizing WPI-AIMR Annual Workshops. Following the 2009
Workshop held on March 1, Sunday, through 6, Friday, 2009, at Miyagi-Zao Royal
Hotel, we are announcing the 2010 WPI-AIMR Annual Workshop which will be heldon March 25, Thursday, through March 27, Saturday, 2010, at Sendai Excel Hotel
Tokyu and Sendai International Center. In the afternoon of March 26, Friday, we plan
to have a special session, inviting Professor Thaddeus B. Massalski of Carnegie Mellon
University, and also an Executive Secretary of Acta Materialia, Inc., Professor Akihisa
Inoue, President of Tohoku University, and Dr. Chikara Hayashi, Chair of Ulvac, Inc.
for celebrating Professor Inoue’s 2010 Acta Materialia Gold Medal Award;
http://www.materialsaustralia.com.au/scripts/cgiip.exe/WService=MA/ccms.r?PageId=20071.

In the afternoon of March 25 and on March 26 and 27, we will have plenary sessions
and parallel sessions including invited presentations by world premier researchers of thefour fields of WPI-AIMR research (thrusts), which are Bulk Metallic Glasses (BMG),
Nanophysics, NanoChemBio and Device/Systems;
http://www.wpi-aimr.tohoku.ac.jp/en/modules/wraps/index.php/outline/organization/manageme
nt_system.html.

In the parallel sessions, we highlight current and forthcoming Fusion Researches andsessions of (1) BMG and Nanophysics, (2) Nanophysics, Nonochemistry andDevice/System, and (3) NanoChemBio will be arranged. For encouraging younger
researchers and further discussing the Fusion Researches, we have a poster session on
March 26.
We would appreciate very much if you could join the Workshop.

145

Tentative Schedule:

March 25 (Thursday): Sendai Excel Hotel Tokyu
15:30 Registration
16:00 - 16:10 Opening session
16:10 - 17:40 Evening plenary session
18:00 - 20:00 Dinner/Mixer
March 26 (Friday): Sendai International Center
09:00 - 10:30 Morning plenary session
10:50 - 12:20 Parallel sessions
12:20 - 15:30 Poster session and Discussion
15:30 - 17:45 Afternoon special session
March 27 (Saturday): Sendai International Center
09:00 - 10:30 Morning plenary session
11:00 - 12:30 Parallel sessions
13:30 - 15:00 Parallel sessions
15:30 - 17:00 Afternoon plenary session
17:00 - 17:15 Closing remarks
18:00 - 20:00 Banquet: Sendai Excel Hotel Tokyu

Tentative list of Invited speakers:
Pulikel M. Ajayan, Rice University, USA
Masayoshi Esashi, WPI-AIMR
Hans-Joerg Fecht, Ulm University, Germany
Alan Lindsay Greer, University of Cambridge, UK
Chikara Hayashi, ULVAC, Inc.
Zhaomin Hou, RIKEN Advanced Science InstituteAkihisa Inoue, Tohoku University
Do Hyang Kim, Yonsei University, Korea
Brian Korgel, University of Texas, USA
Jörg F. Löffler, ETH, Switzerland
Thaddeus B. Massalski, Carnegie Mellon University, USA
Gerhard Meyer, IBM Zurich, Switzerland
Yoshio Nishi, Stanford University, USA
Matthew J. Rosseinsky, University of Liverpool, UK
Jan Schroers, Yale University, USA
Masatsugu Shimomura, WPI-AIMR
H. Eugene Stanley, Boston University , USA
Zhigang Suo, Harvard University, USA
Takashi Takahashi, WPI-AIMR
Hajime Tanaka, The University of Tokyo
Richard Tilley, Richard Tilley, New Zealand
Yasuteru Urano, University of Tokyo
James J. Watkins, University of Massachusetts, USA
Alain Reza Yavari, Institute National Polytecnique de Grenoble, France
Jing Zhu, Tsinghua University, China
146

Junior Faculty/Post-doctoral Positions
Tohoku University
WPI-AIMR
Effective October 1, 2007, Tohoku University created a new Research Institute, theAdvanced Institute for Materials Research (AIMR), based on an initiative of theJapanese Department of Education (MEXT) for World Premier International ResearchCenter Initiative (WPI) to bring together scientists involved in research on nano-scienceand technology.
In the 21st century, material science, broadly defined as the study of how complex/novel
properties arise in matters/materials from the interactions of individual components, willcomprise of inter-discipline collaboration.
(HTTP://WWW.WPI-AIMR.TOHOKU.AC.JP).
Over the next few years, as many as one hundred new appointments at the levels of
post-doctoral fellows and junior faculty will be available. All innovative researchers
are welcome as active promoters of basic/applied sciences in the fields of physicalmetallurgy, physics, chemistry, precision mechanical engineering and electronic /informational engineering.
We are continuously looking for excellent applicants throughout the year.
Please submit
1) a curriculum vitae,
2) research proposal (<3,000 words),
3) summary of previous research accomplishments (<2,000 words),
4) copies of 5 significant publications, and
5) 2 letters of recommendationby email to
wpi-office@bureau.tohoku.ac.jp
ᲢChemistsᲣ yoshi@mail.tains.tohoku.ac.jp
ᲢPhysicistsᲣsakurai@imr.tohoku.ac.jp.
All files must be submitted electronically in pdf or Word format.
Applications from, or nominations of, women and minority candidates are encouraged.
Tohoku University WPI-AIMR is an affirmative action / equal opportunity employer.

147

Graduate Student scholarship
In Materials Science/Engineering
WPI-AIMR
Graduate Student scholarship
Effective October 1, 2007, Tohoku University created a new Research Institute, theAdvanced Institute for Materials Research (AIMR), based on an initiative of theJapanese Department of Education (MEXT) for World Premier International ResearchCenter Initiative (WPI) to bring together scientists involved in research on nano-scienceand technology.
In the 21st century, material science, broadly defined as the study of how complex/novel
properties arise in matters/materials from the interactions of individual components, will
becomes an essential and most important research topics(HTTP://WWW.WPI-AIMR.TOHOKU.AC.JP).
TU WPI-AIMR is now looking for young motivated Ph.D. graduate student candidates
in the fields of physical metallurgy, physics, chemistry, mechanical engineering andelectronic / informational technology. All innovative M. S. students are welcome asactive promoters of basic/applied sciences in these fields.
Applications are continuously screened throughout the year.
Please submit
1) a curriculum vitae,
2) research proposal (<1,000 words),
3) 2 letters of recommendation,by email to
wpi-office@bureau.tohoku.ac.jp
ᲢChemistsᲣ yoshi@mail.tains.tohoku.ac.jp
ᲢPhysicistsᲣsakurai@imr.tohoku.ac.jp.
All files must be submitted electronically in pdf or Word format.

148

WPI-AIMR
Workshop Guideline
Tohoku University’s new Research Institute, the Advanced Institute for Materials
Research (WPI-AIMR) solicits several applications per year for International
Workshops in the field of “broadly defined Materials Science.”
Guidelines:
1) Organizers
Qualified research staff of academic institutions and public or private researchestablishments can submit the application for an international workshop to be held at
WPI-AIMR or its Satellite branches, jointly with the WPI-AIMR principal
investigator(s) whose research interest overlaps with the scope of the workshop.
2) Financial support
Under normal circumstances, WPI-IMR supports up to 2/3 of the workshop budget,
while the organizer is expected to cover the rest.
3) deadline
The application must be received at least four months in advanceto
wpi-office@bureau.tohoku.ac.jp
ᲢChemistsᲣ yoshi@mail.tains.tohoku.ac.jp
ᲢPhysicistsᲣsakurai@imr.tohoku.ac.jp.
All files must be submitted electronically in pdf or Word format.

149

AppendixDIRECTORY
As of December 24, 2009
Name

Phone Number

E-mail Address(+81-(0)22- _____)<Administration>
1. YAMAMOTO, Yoshinori (Institute Director)

217-5130

yoshi@mail.tains.tohoku.ac.jp

2. IWAMOTO, Wataru (Specially Appointed Professor and Director of Administrative Office)217-5965

iwamoto@wpi-aimr.tohoku.ac.jp

3. ADSCHIRI, Tadafumi (PI, Prof.)

217-5629

ajiri@tagen.tohoku.ac.jp

4. HOJO, Daisuke (Assist. Prof.)

217-5631

dhojo@tagen.tohoku.ac.jp

5. MINAMI, Kimitaka (Assist. Prof.)

217-5631

nankim@tagen.tohoku.ac.jp

6. RANI, Varu (Research Assist.)

217-5630

chauhan@mail.tagen.tohoku.ac.jp

7. YOO, Jungwoo (Research Assist.)

217-5630

jw-yoo@mail.tagen.tohoku.ac.jp

8. ATASHFARAZ, Mehrnoosh (Researcher)217-5630

mehr@mail.tagen.tohoku.ac.jp

9. TOGASHI, Takanari (Researcher)217-5630

togashi@tagen.tohoku.ac.jp

10. WEN, Bin (Researcher)217-5630

wenbin@mail.tagen.tohoku.ac.jp

11. CHEN, Mingwei (PI, Prof.)

217-5992

mwchen@wpi-aimr.tohoku.ac.jp

12. FUJITA, Takeshi (Assist. Prof.)

217-5959

tfujita@wpi-aimr.tohoku.ac.jp

13. HIRATA, Akihiko (Assist. Prof.)

217-5959

hirata@wpi-aimr.tohoku.ac.jp

14. CHEN, Luyang (Research Assoc.)

217-5959

chenly@wpi-aimr.tohoku.ac.jp

15. GUAN, Pengfei (Research Assoc.)

217-5959

pf.guan@wpi-aimr.tohoku.ac.jp

16. LANG, Xingyou (Research Assoc.)

217-5959

xylang@wpi-aimr.tohoku.ac.jp

17. ZHAO, Kai (Research Assoc.)

217-5959

kzhao@wpi-aimr.tohoku.ac.jp

18. ESASHI, Masayoshi (PI, Prof.)

795-6934

esashi@mems.mech.tohoku.ac.jp

19. AKIYAMA, Kotone (Assist. Prof.)

795-6937

akiyama@mems.mech.tohoku.ac.jp

20. MUROYAMA, Masanori (Assist. Prof.)

795-6937

muroyama@mems.mech.tohoku.ac.jp

21. YOSHIDA, Shinya (Assist. Prof.)

795-6936s-yoshida@mems.mech.tohoku.ac.jp

22. MAKIHATA, Mitsutoshi (Research Assist.)795-6937

makihata@mems.mech.tohoku.ac.jp

23. PARK, Kyeongdong (Research Assist.)795-6937

kd_park@mems.mech.tohoku.ac.jp

24. FUKUDA, Tsuguo (Adjunct Prof.)

217-5983

ts-fukuda@wpi-aimr.tohoku.ac.jp

25. EHRENTRAUT, Dirk (Assoc. Prof.)

217-5983

ehrentraut@wpi-aimr.tohoku.ac.jp<Research Staff><Adschiri Group><Chen Group><Esashi Group><Fukuda Group>

X-19

Name

Phone Number E-mail Address(+81-(0)22- _____)<Gessner Group>
26. GESSNER, Thomas (PI)+49-37-53124060

thomas.gessner@zfm.tu-chemnitz.de

27. LIN, Yu-Ching (Assist. Prof.)

795-6256

yclin@mems.mech.tohoku.ac.jp

28. LEE, Jae Wung (Research Assoc.)795-6256dlwodnd77@mems.mech.tohoku.ac.jp<Greer Group>
29. GREER, Alan Lindsay (PI)+44-1223-334308

30. MADGE, Shantanu V. (Research Assoc.)

217-5956

alg13@cam.ac.uk
shantanu.madge@wpi-aimr.tohoku.ac.jp<Hashizume Group>
31. HASHIZUME, Tomihiro (PI, Prof.)
217-5943/+81-49-2966111

tomihiro.hashizume.qb@hitachi.com

32. HITOSUGI, Taro (Assoc. Prof.)

217-5944

hitosugi@wpi-aimr.tohoku.ac.jp

33. IWAYA, Katsuya (Assist. Prof.)

217-5948

iwaya@wpi-aimr.tohoku.ac.jp

34. OHSAWA, Takeo (Assist. Prof.)

217-5948

ohsawa@wpi-aimr.tohoku.ac.jp

35. FUKUI, Nobuyuki (Research Assoc.)

217-5948

n-fukui@wpi-aimr.tohoku.ac.jp

36. SHIMIZU, Ryota (Research Assist.)

217-5948

shimizu@chem.s.u-tokyo.ac.jp< Hemker Group>
37. HEMKER, Kevin (PI)+1-410-5164489

hemker@jhu.edu+81-3-58417688

ikuhara@sigma.t.u-tokyo.ac.jp<Ikuhara Group>
38. IKUHARA, Yuichi (PI, Prof.)
39. TSUKIMOTO, Susumu (Lecturer)

217-5934

tsukimoto@wpi-aimr.tohoku.ac.jp

40. SAITO, Mitsuhiro (Assist. Prof.)

217-5933

saito@wpi-aimr.tohoku.ac.jp

41. GU, Lin (Research Assoc.)

217-5933

gu@wpi-aimr.tohoku.ac.jp

42. WANG, Zhongchang (Research Assoc.)

217-5933

zcwang@wpi-aimr.tohoku.ac.jp

43. ITAYA, Kingo (PI, Prof.)

795-5868

itaya@atom.che.tohoku.ac.jp

44. KUZUME, Akiyoshi (Assist. Prof.)

795-5869

kuzume@atom.che.tohoku.ac.jp

45. KOMINO, Takeshi (Research Assoc.)

795-5869

komino@atom.che.tohoku.ac.jp<Itaya Group>

46. MUKKANNAN, Azhagurajan (Research Assist.) 795-5869

X-20

alagurajabs1@atom.che.tohoku.ac.jp

Name

Phone NumberE-mail Address(+81-(0)22- _____)<Kawasaki Group>
47. KAWASAKI, Masashi (PI, Prof.)

215-2085

kawasaki@imr.tohoku.ac.jp

48. MAKINO, Takayuki (Lecturer)

215-2088

tmakino@imr.tohoku.ac.jp

49. UENO, Kazunori (Assist. Prof.)

215-2088

uenok@imr.tohoku.ac.jp

50. HIRAGA, Hiroki (Research Assoc.)

215-2088

hiraga.hiroki@imr.tohoku.ac.jp< Khademhosseini Group>
51. KHADEMHOSSEINI, Ali (Junior PI)+1-617-768-8395

alik@rics.bwh.harvard.edu+1-608-2632078

lagally@engr.wisc.edu<Lagally Group>
52. LAGALLY, Max G. (PI)<Louzguine Group>
53. LOUZGUINE, Dmitri V. (PI, Prof.)

217-5957

dml@wpi-aimr.tohoku.ac.jp

54. NAKAYAMA, Koji (Assoc. Prof.)

217-5950

kojisn@wpi-aimr.tohoku.ac.jp

55. TAKEUCHI, Akira (Assoc. Prof.)

217-5956

takeuchi@wpi-aimr.tohoku.ac.jp

56. YOKOYAMA, Yoshihiko ([Assoc. Prof. (Concurrent)])
215-2199

yy@imr.tohoku.ac.jp

57. QIN, Chunling (Assist. Prof.)

217-5956

clqin@wpi-aimr.tohoku.ac.jp

58. ZHANG, Qingsheng (Assist. Prof.)

217-5956

qszhang@wpi-aimr.tohoku.ac.jp

59. CARON, Arnaud (Research Assoc.)

217-5956

a.caron@wpi-aimr.tohoku.ac.jp

60. CHEN, Na (Research Assoc.)

217-5956

chenn@wpi-aimr.tohoku.ac.jp

217-5956

sergiogs@wpi-aimr.tohoku.ac.jp

217-5956

lisong@wpi-aimr.tohoku.ac.jp

63. MIYAZAKI, Terunobu (PI, Prof.)

217-6000

miyazaki@wpi-aimr.tohoku.ac.jp

64. MIZUKAMI, Shigemi (Assist. Prof.)

217-6003

mizukami@wpi-aimr.tohoku.ac.jp

65. SAJITHA, E. P. (Research Assoc.)

217-6003

sajitha@wpi-aimr.tohoku.ac.jp

66. WATANABE, Daisuke (Research Assoc.)

217-6004

watanabe@wpi-aimr.tohoku.ac.jp

67. WU, Feng (Research Assoc.)

217-6004

fengwu@wpi-aimr.tohoku.ac.jp

217-5522

nakazawa@riec.tohoku.ac.jp

61. SANCHEZ, Sergio Gonzalez (Research Assoc.)

62. LI, Song (Researcher)<Miyazaki Group><Nakazawa Group>
68. NAKAZAWA, Masataka (Adjunct PI, Prof.)

X-21

Name

Phone NumberE-mail Address(+81-(0)22- _____)<Nishi Group>
69. NISHI, Toshio (PI, Prof.)

217-5926

nishi.toshio@wpi-aimr.tohoku.ac.jp

70. NAKAJIMA, Ken (Assoc. Prof.)

217-5927

knakaji@wpi-aimr.tohoku.ac.jp

71. FUJINAMI, So (Research Assoc.)

217-5928

fujinami@wpi-aimr.tohoku.ac.jp

72. LIU, Hao (Research Assoc.)

217-5928

liuhao@wpi-aimr.tohoku.ac.jp

73. WANG, Dong (Research Assoc.)

217-5928

wangdthu@wpi-aimr.tohoku.ac.jp795-3952

ohmi@fff.niche.tohoku.ac.jp+1-413-5452680

russell@mail.pse.umass.edu

76. SHIMOMURA, Masatsugu (PI, Prof.)

217-5329

shimo@tagen.tohoku.ac.jp

77. ISHII, Daisuke (Assist. Prof.)

217-5824

dishii@tagen.tohoku.ac.jp

78. HIGUCHI, Takeshi (Research Assoc.)

217-5825

higuchi@mail.tagen.tohoku.ac.jp<Ohmi Group>
74. OHMI, Tadahiro (PI, Prof.)<Russell Group>
75. RUSSELL, Thomas (PI)<Shimomura Group>

79. IWASAKI, Junko (Tech. Staff)+81-11-758-0056

iwasaki@poly.es.hokudai.ac.jp

80. KIMURA, Konomi (Tech. Staff)+81-11-758-0056

kimura@poly.es.hokudai.ac.jp<Shluger Group>
81. SHLUGER, Alexander (PI) 217-5942/+44-(0)20 7679 1312

a.shluger@ucl.ac.uk

82. MCKENNA, Keith (Assist. Prof.)

217-5942

k.mckenna@wpi-aimr.tohoku.ac.jp

83. TREVETHAN, Thomas (Assist. Prof.)

217-5942

tomt@wpi-aimr.tohoku.ac.jp

84. TAKAHASHI, Takashi (PI, Prof.)

795-6417

t.takahashi@arpes.phys.tohoku.ac.jp

85. RICHARD, Pierre (Assist. Prof.)

795-6477

p.richard@arpes.phys.tohoku.ac.jp

86. SOUMA, Seigo (Assist. Prof.)

795-6477

s.souma@arpes.phys.tohoku.ac.jp

87. SUGAWARA, Katsuaki (Research Assoc.)795-6477

k.sugawara@arpes.phys.tohoku.ac.jp

88. TANIGAKI, Katsumi (PI, Prof.)

795-6469

tanigaki@sspns.phys.tohoku.ac.jp

89. NOUCHI, Ryo (Assist. Prof.)

795-6468

nouchi@sspns.phys.tohoku.ac.jp

90. TANG, Jung (Assist. Prof.)

795-6468

tangjun@sspns.phys.tohoku.ac.jp

91. TANABE, Yoichi (Research Assoc.)795-6469

youichi@sspns.phys.tohoku.ac.jp

92. XU, Jing Tao (Research Assoc.)795-6468

jtxu@sspns.phys.tohoku.ac.jp<Takahashi Group><Tanigaki Group>

X-22

Name

Phone NumberE-mail Address(+81-(0)22- _____)<Teizer Group>
93. TEIZER, Winfried (Junior PI)+1-979-845-7730

teizer@physics.tamu.edu<Tokuyama Group>
94. TOKUYAMA, Michio (PI, Prof.)

217-5953

tokuyama@wpi-aimr.tohoku.ac.jp

95. XU, Limei (Assist. Prof.)

217-5954

limei.xu@wpi-aimr.tohoku.ac.jp

96. CHO, Young Seok (Research Assoc.)

217-5954

jho@wpi-aimr.tohoku.ac.jp

97. CHUTIA, Arunabhiram (Research Assoc.)

217-5954

arun@wpi-aimr.tohoku.ac.jp

98. FUJII, Hiroyuki (Research Assist.)

217-5954

fujii@athena22.wpi-aimr.tohoku.ac.jp

99. NARUMI, Takayuki (Research Assist.)

217-5954

takayuki.narumi@wpi-aimr.tohoku.ac.jp

100. TSUKADA, Masaru (PI, Prof.)

217-5937

tsukada@wpi-aimr.tohoku.ac.jp

101. AKAGI, Kazuto (Assoc. Prof.)

217-5940

akagi@wpi-aimr.tohoku.ac.jp

102. HAMADA, Ikutaro (Assist. Prof.)

217-5938

ikutaro@wpi-aimr.tohoku.ac.jp

103. TAMURA, Hiroyuki (Assist. Prof.)

217-5938

hiroyuki@wpi-aimr.tohoku.ac.jp

104. MASAGO, Akira (Research Assoc.)

217-5939

masago@wpi-aimr.tohoku.ac.jp

105. ARAIDAI, Masaaki (Visiting Scientist)

217-5939

araidai@wpi-aimr.tohoku.ac.jp<Tsukada Group><Wan Group>106. WAN, Li-Jun (PI)+86-62558934

107. WEN, Rui (Research Assoc.)

795-5869

wanlijun@iccas.ac.cn
ruiwen@atom.che.tohoku.ac.jp<Weiss Group>
108. WEISS, Paul S. (PI)+1-310-2675993

psw@cnsi.ucla.edu<Wu Group>
109. WU, Hongkai (Junior PI)

chhkwu@ust.hk.

<Xue Group>
110. XUE, Qikun (PI)+86-10-62795618

111. LIU, Hongwen (Assist. Prof.)

qkxue@mail.tsinghua.edu.cn

217-5948

liu@wpi-aimr.tohoku.ac.jp

112. YAMADA, Kazuyoshi (PI, Prof.)

215-2035

kyamada@imr.tohoku.ac.jp

113. SATO, Toyoto (Assist. Prof.)

215-2039

toyoto@imr.tohoku.ac.jp

114. HORIGANE, Kazumasa (Research Assoc.)

215-2039

khorigane@imr.tohoku.ac.jp<Yamada Group>

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Name

Phone NumberE-mail Address(+81-(0)22- _____)<Yamaguchi Group>
115. YAMAGUCHI, Masahiko (PI, Prof.)

795-6812

yama@mail.pharm.tohoku.ac.jp

116. YASUI, Yoshizumi (Assist. Prof.)

795-6815

yasui@mail.pharm.tohoku.ac.jp

117. AN, Zengjian (Research Assoc.)795-6815zjan@mail.pharm.tohoku.ac.jp

118. YAMAMOTO, Yoshinori

217-5130

yoshi@mail.tains.tohoku.ac.jp

119. ASAO, Naoki (Prof.)

795-3898

asao@m.tains.tohoku.ac.jp<Yamamoto Group><Yavari Group>
120. YAVARI, Alain Reza (PI)+33-(0) 4 76 82 65 16

121. GEORGARAKIS, Konstantinos (Assist. Prof.)

yavari@minatec.inpg.fr
georgara@minatec.inpg.fr

X-24

Name

Phone NumberE-mail Address(+81-(0)22- _____)<Supporting Staff>
122. HAGA, Hideko (Deputy Director of Administrative Office)217-5980

123. KOMATSU, Hiroshi (Specially Appointed Professor and Associate Editor)

General Affairs Section

217-5922 or 5971 (FAX: 217-5129)

haga-h@bureau.tohoku.ac.jp
hiroshi@wpi-aimr.tohoku.ac.jp

wpi-shomu@wpi-aimr.tohoku.ac.jp

124. HASHIMOTO, Keiichi (Chief)k-hashi@wpi-aimr.tohoku.ac.jp

125. SAITO, Asuka

asuka-s@bureau.tohoku.ac.jp

126. CHIGIRI, Atsuko

chigiri@wpi-aimr.tohoku.ac.jp

127. CHIBA, Yoko

217-5956

128. ONODERA, Marikom.onodera@wpi-aimr.tohoku.ac.jp

129. UNOURA, Sayaka

217-5922 or 5963

130. SATO, Kaori
Accounting Section

ykchiba@wpi-aimr.tohoku.ac.jp

unoura-0@wpi-aimr.tohoku.ac.jp
sato-0@wpi-aimr.tohoku.ac.jp

217-5923 (FAX: 217-5129)

wpi-keiri@wpi-aimr.tohoku.ac.jp

131. WAGATSUMA, Yasushi (Chief)

wagatsu@bureau.tohoku.ac.jp

132. OKAZAKI, Tomohiro

tokazaki@bureau.tohoku.ac.jp

133. ZENIYA, Ippei

zeniya@bureau.tohoku.ac.jp

134. KOBAYASHI, Yuki

y-kobayashi@bureau.tohoku.ac.jp

Property Management Section

217-5924 (FAX: 217-5129)

wpi-yodo@wpi-aimr.tohoku.ac.jp

135. YOSHIDA, Masahiro (Chief)masa-y@bureau.tohoku.ac.jp

136. HIRAYAMA, Hirotaka

h-hiraya@bureau.tohoku.ac.jp

137. YOSHIDA, Hajime

hyoshi@bureau.tohoku.ac.jp

138. ONO, Toshio

toshi-ono@bureau.tohoku.ac.jp

139. DAIGAKU, Norikodaigaku@bureau.tohoku.ac.jp

140. OHTOMO, Yumi

yumi-o@bureau.tohoku.ac.jp

International Academic Affairs Section 217-5971 (FAX: 217-5129)

wpi-kenkyo@wpi-aimr.tohoku.ac.jp

141. YANAGAWA, Yasukazu

yanagawa@bureau.tohoku.ac.jp

142. SAITO, Ikuo

s-ikuo@bureau.tohoku.ac.jp

143. HAGITA, Etsuko

217-5978hagita@bureau.tohoku.ac.jp

144. OKAMOTO, Ayumi

217-5978a-okamoto@bureau.tohoku.ac.jp

Safety and Health Management Section

217-5970

wpi-safety@wpi-aimr.tohoku.ac.jp

145. KAMOSHIDA, Kazuyoshi (Manager)kamoshida@bureau.tohoku.ac.jp

146. UMEZAWA, Akiko

akiko_umezawa@bureau.tohoku.ac.jpX-25

2009 WPI-AIMR News
Contents(Volume - page)Preface………………………………………………………………………………………… 5 - 1 / 7 - 1 / 8 - 1
Modification of the Structure and Clarification of Vision of WPI-AIMR………………………….. 6 - 1
Interviews
Heinrich ROHRER (1986 Physics Nobel Laureate & Chair, International Advisory board, WPI-AIMR)………………………………………………………………………………………………………. 5 - 5
J. Georg BEDNORZ (1987 Physics Nobel Laureate, Fellow, IBM Zurich Research Laboratory &International Advisory board member, WPI-AIMR)………………………………………………... 5 - 19
Tsuyoshi MASUMOTO (Person of Cultural Merit, The Japanese Government, Emeritus
Professor of Tohoku University)……………………………………………………………………. 5 - 37
Reproduction of JST NEWS 5 -6-9, 2008…………………………………………………………… 5 - 48
Alain Reza YAVARI (Principal Investigator, WPI-AIMR)…………………………………………. 6 - 7
Terunobu MIYAZAKI (Principal Investigator, WPI-AIMR)……………………………………….. 7 - 5
Hans-Joachim FREUND (Director, Department of Chemical Physics, Fritz-Haber-Institut,
Max-Planck-Gesellschaft)………………………………………………………………………….. 7 - 14
Herbert GLEITER (Professor, Institut of Nanotechnologie, Forschungszentrum Karlsruhe &International Advisory Board, WPI-AIMR)………………………………………………………… 8 - 5
Masaru TSUKADA (Principal Investigator, WPI-AIMR)………………………………………….. 8 - 26
John H. PEREPEZKO (Professor, University of Wisconsin-Madison & Adjunct Professor,
WPI-AIMR)…………………………………………………………………………………………. 8 - 45
Honorary Degree Ceremony for Prof. V. Narayanamurti on May 22, 2009
President Inoue’s Introduction of Professor Venky Narayanamurti………………………………… 6 - 21
“Frontiers in Engineering Education and Research in the 21st Century” by Prof. V. Narayanamurti………………………………………………………………………………………………………. 6 - 23
News Update2009 WPI-AIMR Annual Workshop Report………………………………………………………… 5 - 55
Attending 2009 APS March Meeting……………………………………………………………….. 5 - 57
Surface Kinetics International (SKI) Conference…………………………………………………… 5 - 62
Note on 2009/2010 WPI Joint Seminar Series……………………………………………………… 5 - 64
Mingwei CHEN, Physical Review Letters 2009 in Press…………………………………………… 5 - 68
Kotone AKIYAMA (Reproduction of metamorphosis no.14 -26-27, 2008)………………………... 5 - 69
Koji S. NAKAYAMA (Reproduction of The Nikkei Business Daily News, Feb. 24 and 25, 2009 -13)………………………………………………………………………………………………………. 5 - 71
Yoshinori YAMAMOTO (Reproduction of milsil vol.2 -2-5, 2009)………………………………... 5 - 73

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Atsuko CHIGIRI, U. S. Short-stay Report………………………………………………………….. 5 - 77
Open House Ceremony of Integration Laboratory on May 22, 2009a) President Inoue's Congratulatory Remarks at the Open House Ceremony…………………… 6 - 59b) Program Director Dr. Kuroki’s Congratulatory Remarks……………………………………... 6 - 62
Professor A. Inoue’s “Acta Materialia Gold Medal”………………………………………………... 6 - 64
Professor T. Miyazaki’s “9th JSAP Outstanding Achievement Award”……………………………... 6 - 67
Professor Y. Yamamoto’s “RSC Centenary Prize 2009”……………………………………………. 6 - 68
AIM Research by M. Kawasaki…………………………………………………………………….. 6 - 69
Oxide Interfaces Tremendous Opportunities for Basic and Applied Research by M. Kawasaki…..

6 - 74

Atomic-scale imaging of individual dopant atoms in a buried interface by Y. Ikuhara……………. 6 - 75
Thermodynamic origins of shear band formation and universal scaling law of metallic glass
strength by M. Chen………………………………………………………………………………… 6 - 76
New Organization Chart…………………………………………………………………………….. 7 - 33
New Administrative Director, W. Iwamoto…………………………………………………………. 7 - 34
Atomic-scale heterogeneity of a multicomponent bulk metallic glass with excellent glass forming
ability by M. Chen…………………………………………………………………………………... 7 - 52
Dr. Yamamoto’s 2008 Chemical Review paper is selected as a featured New Hot Paper…………. 8 - 59
Citation Profile of Yoshinori Yamamoto……………………………………………………………. 8 - 60
Citation Profile of Masashi Kawasaki………………………………………………………………. 8 - 69
Funding Program for World-Leading Innovative R&D on Science and Technology“Research and development of integrated microsystems.” by Masayoshi Esashi…………………. 8 - 76
The New WPI Joint Seminar Series by M. Tsukada & T. Hashizume
The 1st - The 5th Seminar…………………………………………………………………………. 6 - 77
The 6th - The 10th Seminar……………………………………………………………………….. 7 - 53
The 11th - The 15th Seminar………………………………………………………………………. 8 - 77
(Seminar Summary)
Chemical Study on Helicene Derivatives Directed to the Development of Novel Chiral
Materials by M. Yamaguchi……………………………………………………………………… 6 - 78
Let’s set up observing teatime, at least once a day, among different research groups by H. Komatsu…………………………………………………………………………………………………… 6 - 79
Nanostructures of Metallic Glass by K. S. Nakayama…………………………………………… 7 - 54
Nature of the Glassy State and Democracy by T. Egami………………………………………… 7 - 56
The three-dimensional nano- and microstructure fabrications by focused-ion-beam chemical
vapor deposition, and their applications by R. Kometani………………………………………… 7 - 57
2009 MEXT Research Grant List (As of June 1, 2009)…………………………………………….. 6 - 80
WPI-INPG Europe Workshop………………………………………………………………………. 7 - 59

X-30

Research Prospect
Masayoshi ESASHI…………………………………………………………………………………. 6 - 85
Yuichi IKUHARA…………………………………………………………………………………... 6 - 99
Terunobu MIYAZAKI………………………………………………………………………………. 6 - 117
Kazuyoshi YAMADA………………………………………………………………………………. 6 - 131
Kingo ITAYA……………………………………………………………………………………….. 7 - 63
Masatsugu SHIMOMURA………………………………………………………………………….. 7 - 75
Thomas GESSNER…………………………………………………………………………………. 8 - 81
Tadahiro OHMI……………………………………………………………………………………... 8 - 93
Alain Reza YAVARI………………………………………………………………………………… 8 - 111
Newly Appointed Junior Principal Investigators…………………………………………………... 8 - 125
WPI-AIMR Newly Appointed Research Staff…………………………….. 5 - 81 / 6 - 143 / 7 - 85 / 8 - 131
Newly Appointed Adjunct Professors……………………………………… 5 - 91 / 6 - 147 / 7 - 89
WPI-IFCAM
Visiting Professorship and Workshops / Summer schools………………… 5 - 97 / 6 - 153 / 7 - 93 / 8 - 137
2009-2010 WPI-IFCAM Visiting Scholars………………………………..

5 - 98 / 6 - 154 / 7 - 94 / 8 - 138

Activity Reports……………………………………………………………. 5 - 99 / 7 - 95 / 8 - 139
Announcement
Open House of Integration Laboratory of the WPI-AIMR on May 22, 2009………………………. 5 - 103
Workshop WPI-INPG-Europe………………………………………………………………………. 5 - 104
Daily Tea-Time (Get together)……………………………………………………………………… 6 - 157
WPI-Europe Workshop on Metallic Glasses and Related Materials………………………………... 6 - 158
Announcement The 2010 WPI-AIMR Annual Workshop………………………………………….. 8 - 145
Junior Faculty/Post-Doctoral Positions……………………………………. 5 - 105 / 6 - 162 / 7 - 105 / 8 - 147
Graduate Student Scholarship In Materials Science/Engineering………… 5 - 106 / 6 - 163 / 7 - 106 / 8 - 148
WPI-AIMR Workshop Guideline………………………………………….. 5 - 107 / 6 - 164 / 7 - 107 / 8 - 149
Appendix
Snapshots………………………………………………………………….. 5 - x-1 / 6 - x-1 / 7 - x-1 / 8 - x-1
WPI members……………………………………………………………………………………….. 5 - x-35
Directory……………………………………………………………… 5 - x-41 / 6 - x-19 / 7 - x-19 / 8 - x-19
2009 WPI-AIMR News Contents…...………………………………………………………………. 8 - x-29

X-31