Activities of the BEANS Laboratory

An Overview of Projects Planned for 2010
First administered directly by the Ministry of Economy,
Trade and Industry in 2008, the Hetero-functional Integrated
Device Technology Development Project (the BEANS Project)
was converted last year to a commissioned project under theNew Energy and Industrial Technology Development
Organization (NEDO). The BEANS Project is now entering its
third year, which is the interim evaluation year. We will be
implementing the following R&D projects (1)–(4) in order toachieve our interim goals. Owing to a supplementary budget
carried forward from last year, we have also added a fifth R&D
project, but the details of this project will be provided in thenext issue.

In addition to achieving defect-free silicon nanostructureswith an aspect ratio of 30 or greater using neutral beam etching,we will also control the sidewall inclination andisotropic/anisotropic nature of etching. We will demonstrate thesuperiority of ultra-low-damage etching in producing MEMS
structures to conventional techniques. We also hope to improve
the speed and selectivity for the formation of 3D structures
through nano-domain modification with a femtosecond laser.
2) Bottom-up-technology for heterogeneous integrationof materials and functions on 3D platform
As an example of highly conformal supercritical-fluid
deposition on 3D nanostructures, we will form functional film
through conformal deposition of oxide film, metal film, andorganic film on the surface of microchannels having an aspectratio of 30 or greater, or complex 3D surfaces. We will also
develop a technology for site-selective formation of functional
nanostructures, such as nanoparticles, nanodots, andnanotubes, on probe arrays or pillar arrays.
3) 3D nano-fabrication for aerospace applications
Since our interim objectives of developing a basic
technology for the optimal structural design of filters for
multiband observation from space, element and basic
processing technologies, and basic evaluation techniques were
met last year ahead of schedule, this fiscal year we will branch
off and study practical applications of these technologies.

1. R&D Project (1): Development of bio/organic
material integration processes
1A) Bio/nano interface treatment
We will develop a process for forming lipid bilayers thatfunction stably for more than two hours in order to establish aresearch foundation for future implantable devices andultrasensitive molecular measuring devices. Based on theresults of forming molecular imprinted interfaces throughelectron beam-induced polymerization, and molecular surface
modification of biocompatible polymers, we will select materials
and techniques for forming biocompatible interfaces. We willfurther evaluate high multistage reactivity based on microbialmodels using carbon dioxide fixation, for example.
2A) Biomaterial higher-order structure formation
In order to create a foundation for future pharmacokinetic
screening and artificial organ research, we will conduct
experiments to implement glucose-responsive fluorescent gel
beads in mice and verify the effectiveness of the beads to find asuitable implanting location. We will also acquire guidelines on
selecting a technique for inducing the formation of billiary
canaliculi by controlling the spatial organization of cells.
1B) Organic/nano interface treatment
We will narrow the organic nanostructure formation
processes by means of nanoimprint lithography and the filling
process in order to create a research foundation for highly
sensitive and efficient organic devices using synthetic organic
materials such as future organic semiconductors. We will also
study a new technology for crystal growth control, whereinorganic materials are filled using nano-marking. In addition, wewill propose device designs making use of orientation, createfunctional devices with unique light and electronic properties,
and verify the effectiveness of the processes.
2B) Organic material higher-order structure formation
In order to create a research foundation for highly sensitiveand efficient organic devices using synthetic organic materials
such as future organic semiconductors, we hope to establish
processes for forming self-assembled nanostructures such asorganic molecular nanopillar structures having a less than 50 nm
diameter, organic molecular nanoporous structures with uniform
pores of less than 100 nm diameter, and mesh or linear structures
having a less than 100 nm line-and-space (L/S) pattern.

3. R&D Project (3): Development of large-area
continuous process of micro/nano structure1) Non-vacuum, large-area deposition techniques ofhigh-quality nano/micro materials
We will install and set up a gush-type atmospheric pressureplasma deposition apparatus and develop a basic process forforming films with electronic functions and films withmechanical functions. We will also clarify the specifications forequipment capable of covering larger areas by studying
scanning techniques. We will also develop a large-areananomaterial coating technology capable of depositing auniform film thickness within 10%, with a patterning
resolution no greater than 200 µm.
2) Continuous nano/micro-machining and integration
process for fiber substrates
We will develop a film coating process for fiber substrates
employing a die coater with a high speed of 10 m/min orgreater. We will also establish a 3D patterning technology forthe curved surfaces of fiber substrates, a reel-to-reel imprinting
technology having a high feeding speed of 5 m/min or greater,
and a 3D hollow fiber formation technology. In addition, we willdevelop a basic weaving integration process for weaving
heterogeneous fiber substrates.

4. R&D Project (4): Building up of a knowledge
database for hetero-functional integrated
device technology development
Functions and categorization considered by the Knowledge
Database Compilation Committee will be incorporated in theknowledge database system. We will also upgrade the functionsof the database system and continue to accumulate more datafrom the BEANS centers and the four working groups to enrich
the database.

2. R&D Project (2): Development of novel fabrication
technology for 3D nano structures
1) Top-down fabrication of monolayer-flat, defect-free
3D structure5