MNC 2023 (November 14-17, Keio Plaza Hotel Sapporo, Sapporo, Hokkaido, Japan) Schedule
Tuesday, November 14
Room B (Rose Room) (2F)Technical Seminar in Japanese Registration Desk
November 14, 12:30 - 16:00 (2F Lobby)

13:00-17:20 MNC 2023 Technical Seminar in Japanese
Room P1 (Plaza Hall) (B1F)

Conference Registration Desk
November 14, 13:30 - 18:30 (2F Lobby)
November 15, 8:40 - 18:00 (2F Lobby)
November 16, 8:30 - 18:00 (2F Lobby)
November 17, 8:30 - 16:00 (2F Lobby)

17:40-19:40 Get Together PartyWednesday, November 15
Room A (Eminence Hall) (2F)

15A-1: Opening & Plenary Session 9:30-12:10
12:20-13:10 Luncheon Seminar by Technical Exhibitor
Room A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
Room C (Crown Hall) (2F)
15C-2: 13:30-15:20
15A-2: 13:30-15:00
15B-2: 13:30-15:20
BioMEMS, Lab on a Chip, andSymp. A. Challenge to the physical limit Symp. C. Process and Device
for lithography and devices: Are we ready Technologies for Quantum Computing Nanobiotechnology I
to boost the scaling roadmap? IIRoom D (Clover Room) (2F)
15D-2: 13:30-15:00
Nanocarbon & 2D Materials I

15D-2: 15:00-15:10 Author's Interview

Lobby (2F)

Coffee Break
15A-3: 15:30-17:00
Symp. A. Challenge to the physical limit
for lithography and devices: Are we readyto boost the scaling roadmap? II

15B-3: 15:40-17:15
15C-3: 15:30-16:50
Symp. C. Process and Device
BioMEMS, Lab on a Chip, andTechnologies for Quantum Computing Nanobiotechnology IIII

15C-2, 3: 16:50-17:00 Author's Interview

15D-3: 15:30-16:30
Nanocarbon & 2D Materials II

15D-3: 16:30-16:40 Author's Interview

Lobby (2F)

Coffee BreakRoom A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
15A-4: 17:30-18:30
15B-4: 17:40-18:50
Advanced Lithography and Patterning Atomic Layer Processing I

Room C (Crown Hall) (2F)
15C-4: 17:20-19:00
Nanofabrication I

Room D (Clover Room) (2F)
15D-4: 17:00-18:40
Organic Nanomaterials

15A-4: 18:30-18:40 Author's Interview

15C-4: 19:00-19:10 Author's Interview

15D-4: 18:40-18:50 Author's Interview

15B-4: 18:50-19:00 Author's Interview

Thursday, November 16
Room A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
16A-1: 9:00-10:30
16B-1: 9:00-10:10
Symp. A. Challenge to the physical limit Atomic Layer Processing II
for lithography and devices: Are we readyto boost the scaling roadmap? III

16B-1: 10:10-10:20 Author's Interview

Room C (Crown Hall) (2F)
16C-1: 9:00-10:50
Nanofabrication II

Room D (Clover Room) (2F)
16D-1: 9:00-10:30
Nanocarbon & 2D Materials III

16C-1: 10:50-11:00 Author's Interview

16D-1: 10:30-10:40 Author's Interview

Lobby (2F)

Coffee BreakRoom A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
16A-2: 11:00-12:00
16B-2: 10:40-11:30
1-3: Patterning Materials
Atomic Layer Processing III
16A-2: 12:00-12:10 Author's Interview

16B-2: 11:30-11:40 Author's Interview

Room C (Crown Hall) (2F)
16C-2: 11:20-12:40
Nanofabrication III

Room D (Clover Room) (2F)
16D-2: 11:00-12:20
Nanocarbon & 2D Materials IV

16C-2: 12:40-12:50 Author's Interview

16D-2: 12:20-12:30 Author's Interview

Lunch
Room A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
16B-3: 13:30-14:30
16A-3: 13:30-15:00
Symp. A. Challenge to the physical limit Symp. D. Lipid Membrane Micro andfor lithography and devices: Are we ready Nanotechnology I

Room C (Crown Hall) (2F)
16C-3: 13:30-15:00
Nanomaterials and nanostructures I

Room D (Clover Room) (2F)
16D-3: 13:30-15:00
Nanodevices I

16C-3: 15:00-15:10 Author's Interview

16D-3: 15:00-15:10 Author's Interview

to boost the scaling roadmap? IVLobby (2F)

Coffee Break
16A-4: 16:00-17:40
Nanoimprint, Hybrid-NIL

16B-4: 15:00-16:30
Symp. D. Lipid Membrane Micro andNanotechnology II

16A-4: 17:40-17:50 Author's Interview

16C-4: 15:30-17:00
Ferroelectrics

16D-4: 15:30-16:50
Nanodevices II

16C-4: 17:00-17:10 Author's Interview

16D-4: 16:50-17:00 Author's Interview

Room P (Eminence Hall) (2F)
16P-1: 14:00-16:00
Poster Session 1
2-1: Nanocarbons & 2D Materials
2-3: Nanofabrication
2-5: Organic Nanomaterials
2-6: Nano Surfaces, Interfaces, andAdvanced Microscopy
3: Nanoimprint, Hybrid-NIL,
Biomimetics, and Functional Surfaces
4: BioMEMS, Lab on a Chip, andNanobiotechnology
6: Atomic Layer Processing (ALP)

Room P1 (Plaza Hall) (B1F)

18:20-20:20 Banquet

Friday, November 17
Room A (Eminence Hall) (2F) +On-line
Room B (Rose Room) (2F)
17B-1: 9:00-10:30
17A-1: 9:00-10:30
Symp. A. Challenge to the physical limit Nanodevices III
for lithography and devices: Are we readyto boost the scaling roadmap? V

17B-1: 10:30-10:40 Author's Interview

Room C (Crown Hall) (2F)
17C-1: 9:00-10:30
Nanomaterials and nanostructures II

Room D (Clover Room) (2F)
17D-1: 9:00-10:50
Microsystem Technology and MEMS I

17C-1: 10:30-10:40 Author's Interview

17D-1: 10:50-11:00 Author's Interview

Lobby (2F)
Coffee Break
17A-2: 11:00-12:00
Symp. A. Challenge to the physical limit

17B-2: 11:00-12:00
Nanodevices IVfor lithography and devices: Are we readyto boost the scaling roadmap? VI

17B-2: 12:00-12:10 Author's Interview

17C-2: 11:00-12:20
Neuromorphic computing devices andmaterials17D-2: 11:20-12:40
Microsystem Technology and MEMS II

17C-2: 12:20-12:30 Author's Interview

17D-2: 12:40-12:50 Author's Interview

Lunch
17A-3: 13:30-14:30
Electron and Ion Beam Technologies

17B-3: 13:30-15:00
Symp. B. Material Intelligence:
Potential of in-materio computing I

17A-3: 14:30-14:40 Author's Interview

17D-3: 13:30-15:00
Biomimetics, and Functional Surfaces

17C-3: 15:00-15:10 Author's Interview

17D-3: 15:00-15:10 Author's Interview

Lobby (2F)
Coffee Break
17A-4: 15:00-17:00
Symp. A. Panel Discussion

17B-4: 15:30-16:30
Symp. B. Material Intelligence:
Potential of in-materio computing II

Room P (Eminence Hall) (2F)

17C-3: 13:30-15:00
Nano Surfaces, Interfaces, andAdvanced Microscopy I

17C-4: 15:30-16:50
Nano Surfaces, Interfaces, andAdvanced Microscopy II
17C-4: 16:50-17:00 Author's Interview

17P-1: 14:00-16:00
Poster Session 2
1-1: Advanced Lithography andPatterning
1-2: Electron and Ion BeamTechnologies
1-3: Patterning Materials
2-2: Nanodevices
2-4: Inorganic Nanomaterials
2-6: Nano Surfaces, Interfaces, andAdvanced Microscopy
5: Microsystem Technology and MEMS