List of Publications

List of publications(1) Papers
1. K.Horikawa, T.Mochizuki, S.Miyamoto, S.Amano, T. Watanabe, D.Li, K.Imasaki, Y.Izawa“Photonuclear reaction of Iodine-129 with laser-Compton scattering gamma-rays using
Nd:YVO4laser and electron storage ring”
Rev. Laser Eng., Vol.39, 445-447(2011)2.

T.Inoue, T.Mochizuki, S.Miyamoto, S.Amano, T.Watanabe, K.Kanda“Soft X-Ray Conversion Efficiencies in Laser-Produced Xenon and Tin Plasmas in a 5-17nm
Wavelength Range”
Jpn. J. Appl. Phys., Vol. 50, 098001 (2011)

3.

Hiroki Nose, Tsukasa Azeta, Masatoshi Kataoka, Yuichi Utsumi,“Propose a Preparation Chip for Integration to 3D Lab-on-a-CD”
to be published in Microsystem Technologies, (2012).

4.

Tsukasa Azeta, Yoshiaki Ukita, Yuichi Utsumi,“Propose 3D micro microfluidic device with capillary bundle structure”
to be published in Microsystem Technologies, (2012).

5.

Hideki Kido, Tomoyuki Kuroki, Masaaki Okubo, Yuichi Utsumi,“Application of photo-etching of polytetrafluoroethylene induced by high energy synchrotron
radiation to LIGA”
to be published in Microsystem Technologies, (2012).

6.

Tsunemasa Saiki, and Yuichi Utsumi,“High Efficiency Mixing Chip with Liquid Flow Actuators Operated by Surface Acoustic Waves”,
to be published in Electronics and Communications in Japan (2012).

7.

Hiroo Kinoshita, Tetsuo Harada, Masato nakasuji, Yutaka Nagata, and Takeo Watanabe,“Development of coherent scatterometry microscope”,
Microelectronic Engineering 88, pp. 2000-2003, 2011.

8.

Yuya Yamaguchi, Yasuyuki Fukushima, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita,“Transmission Grating Fabrication for Replicating Resist Patterns of 20nm and Below”,
Jpn. J. Appl. Phys. 50, 06GB10, 2011

9.

Yasuyuki Fukushima, Naoki Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Yuya
Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita,“Development of Extreme Ultraviolet”
Interference Lithography System, Jpn. J. Appl. Phys. 49, 06GD06, 2010.

10. Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, and Hiroo
Kinoshita,“The coherent EUV scatterometry microscope for actinic mask inspection and metrology”,
Proc. SPIE 8081 (2011) 80810K, DOI: 10.1117/12.896576.
11. Tetsuo Harada, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo
Kinoshita,“Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent ExtremeUltraviolet Scatterometry Microscope at NewSUBARU”,
Jpn. J. Appl. Phys. 50 (2011) 06GB03, DOI: 10.1143/JJAP.50.06GB03.
12. Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Takeo Watanabe, Hiroo Kinoshita, Yutaka
Nagata,71

“Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry
microscope
based on coherent diffraction imaging,”
J. Vac. Sci. Technol. B 29 (2011) 06F503, DOI: 10.1116/1.3657525.
13. H. Yoshida, K. Tsubakimoto, Y. Fujimoto, K. Mikami, H. Fujita, N. Miyanaga, H. Nozawa, H. Yagi,
T. Yanagitani, Y. Nagata, and H. Kinoshita,“ Optical properties and Faraday effect of ceramic terbium gallium garnet for a room temperature
Faraday rotator”,
Opt. Exp. Vol. 19, No. 16 (2011) pp15181-15187, DOI: 10.1109/CLEOE.2011.5942840.
14. Yuriy Platonov, Jim Rodriguez, Michael Kriese, Eric Gullikson, Tetsuo Harada, Takeo Watanabe,and Hiroo Kinoshita,“Multilayers for next generation EUVL at 6.x nm”,
SPIE Proc. 8076, 80760N, 2011.
15. Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani,
Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshit,“Relationships between EUV resist outgassing and contamination deposition at Selete”,
SPIE Proc. 7969, 796921, 2011.
16. Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, Toshiro Itani,“In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at
NewSUBARU”,
Jpn. J. Appl. Phys. 50, 06GB02, 2011.
17. Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima,
Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita,“EUV Interference Lithography for 1X nm”,
J. Photopolym. Sci. Technol, 24, pp. 153-157, 2011.
18. Takuya Goto, Tomoyuki Yasukawa, Kazuhiro Kanda, Shinji Matsui, Fumio Mizutani.
“Inhibition of Electrochemical Fouling against Biomolecules on a Diamond-Like Carbon Electrode”
Analytical Sciences 27 (2011) 91-94.
19. Akira Wada, Takeshi Ogaki, Masahito Niibe, Masahito Tagawa, Hidetoshi Saitoh, Kazuhiro Kanda
and Haruhiko Ito“Local structural analysis of a-SiCx:H films formed by decomposition of tetramethylsilane in
microwave discharge flow of Ar”
Diamond and Related Materials 20 (2011) 364-367.
20. Kazuhiro Kanda, Noriko Yamada, Kumiko Yokota, Masahito Tagawa, Masahito Niibe, Mokoto
Okada, Yuichi Haruyama, and Shinji Matsui“Fabrication of Fluorine-terminated Diamond-Like Carbon Thin Film Using a Hyperthermal Atomic
Fluorine Beam”
Diamond and Related Materials 20 (2011) 703-706.
21. Kazuhiro Kanda, Kumiko Yokota, Masahito Tagawa, Mayumi Tode, Yuden Teraoka, and Shinji
Matsui“Effect of the Soft X-rays on Highly Hydrogenated Diamond-Like Carbon Films”
Japanese Journal of Applied Physics 50 (2011) 055801-1-3.
22. Kazuhiro Kanda, Makoto Okada, Yuji Kang, Tsuneo Suzuki, and Shinji Matsui“Departure Process of Ga from DLC Films Fabricated Using Ga Focused Ion Beam Assisted
Deposition by Heat Treatment”
Transactions of Materials Research Society of Japan 36 (2011) 71-73.
23. Tomoyuki Inoue, Takayasu Mochizuki, Shuji Miyamoto, Takeo Watanabe, and Kazuhiro Kanda
72

“Soft X-ray Conversion Efficiencies in Laser-Produced Xenon and Tin Plasmas in a 5-17 nm
Wavelength Range”
Japanese Journal of Applied Physics 50 (2011) 098001
24. Akira Wada, Tsuneo Suzuki, Masahito Niibe, Haruhiko Ito, and Kazuhiro Kanda“Annealing Effect of W Incorporated Diamond-Like Carbon Fabricated by Ga Focused Ion Beam
Chemical Vapor Deposition”
Japanese Journal of Applied Physics 50 (2011) 06GG05.
25. M. Chinen, Y. Sawada, Y. Haruyama, S. Matsui, M. Okada, and H. Hiroshima“Characterization of pentafluoropropane dissolved UV-nanoimprint resin”,
J. Vac. Sci. Technol. B 29, 06FC18-5, 2011
26. Y. Kang, M. Okada, Y. Nakai, Y. Haruyama, K. Kanda, and S. Matsui“Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane)
mold”,
J. Vac. Sci. Technol. B 29, 06FC10-6, 2011
27. M. Okada, Y. Haruyama, K. Kanda, and S. Matsui“Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting”,
J. Vac. Sci. Technol. B 29, 06FC09-5, 2011
28. M. Okada, Y. Haruyama, S. Matsui, H. Miyake, S. Iyoshi, T. Yukawa, and H. Takeuchi”Evaluation of fluorine additive effect on cationic UV-nanoimprint resin”,
J. Vac. Sci. Technol. B 29, 06FC04-4, 201129. Y. Sawada, Y. Haruyama, K. Kanda, S. Matsui, M. Okada, H. Miyake, T. Ohsaki, Y. Hirai, and H.
Hiroshima“Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by
photo
differential scanning calorimetry and Fourier transform infrared spectroscopy”,
J. Vac. Sci. Technol. B 29, 06FC05-4, 2011
30. Y. Kang, M. Okada, S. Omoto, Y. Haruyama, K. Kanda, and S. Matsui“Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point
solvent”, J. Vac. Sci. Technol. B 29, 06FC03-3, 2011
31. M. Okada, M. Iwasa, H. Hiroshima, Y. Haruyama, K. Kanda, and S. Matsui“Adhesion and frictional force measurements employing scanning probe microscopy in apentafluoropropane gas atmosphere”,
J. Vac. Sci. Technol. B 30, 011601-3, 2012
32. Y. Haruyama, Y. Kang, M. Okada, S. Matsui“Electronic structure of fluorinated diamond-like carbon thin films as a function of annealing
temperature using photoelectron spectroscopy”,
J. Electron Spectrosc. Related Phenom 184, 276-279, 2011
33. K. Kanda, N. Yamada, K. Yokota, M. Tagawa, M. Niibe, M. Okada, Y. Haruyama, and S. Matsui“Fabrication of Fluorine-terminated Diamond-Like Carbon Thin Film Using a Hyperthermal
AtomicFluorine Beam”,
Diamond and Related Materials 20, 703-706, 2011
34. K. Arai, T. Okuda, K. Fukumoto, M. Kotsugi, T. Ohkouchi, K. Kodama, T. Kimura, Y. Haruyama,
T. Nakamura, T. Matsushita, T. Muro, S. Matsui, A. Kakizaki, Y. Otani, and T. Kinoshita“Dynamics of Magnetostatically Coupled Vortices Observed by Time-Resolved Photoemission
Electron Microscopy”, Jpn. J. Appl. Phys. 50, 053001-6, 201173

35. Y. Ikemoto, M. Ishikawa, S. Nakashima, H. Okamura, Y. Haruyama, S. Matsui, T. Moriwaki, T.
Kinoshita“Development of scattering near-field optical microspectroscopy apparatus using an infraredsynchrotron radiation source”, Optics Communications 285 2212–2217, 2012
36. M. Niibe, T. Kotaka, S. Hori, and S. Inoue:”NEXAFS Characterization of c-BN Thin Film Prepared by Sputtering Method”
Adv. X-ray Cem. Anal. Japan 43, 153-160 (2012).
37. T. Kotaka, M. Niibe, and T. Mitamura:”Investigation of Analyzing Depth of N-K Absorption Spectra Measured with TEY and TFY
Method”
Adv. X-ray Cem. Anal. Japan 43, 175-180 (2012).
38. M. Niibe, T. Kotaka, R. Kawakami, T. Inaoka, K. Tominaga, and T. Mukai:”Damage Analysis of Plasma-etched n-GaN Crystal Surface by Nitrogen K-edge NEXAFS
Spectroscopy”
Jpn. J. Appl. Phys., 51, 01AB02 (2012).
39. Wada, K. Koshimura, M. Niibe, H. Saitoh, K. Kanda, H. Ito:
”Carbon-K NEXAFS measurements of a-CNx films formed from decomposition of BrCN inelectron cyclotron resonance plasmas of He, Ne, and Ar” J. Non-crystal. Solids, 358, 124-128 (2012).
40. Y. Nakano, R. Kawakami, M. Niibe, A. Takeichi, T. Inaoka and K. Tominaga:“Photoluminescence Study of Damage Introduced in GaN by Ar- and Kr-Plasmas Etching,”
Material Research Society Symposium Proceedings Vol. 1396, mrsf11-1396-o07-36 (2012).
41. R. Kawakami, A. Takeichi, M. Niibe, T. Inaoka, and K. Tominaga:”Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio
Frequency Helium Plasmas”Jpn. J. Appl. Phys., 50, 08KD01 (2011).
42. Wada, T. Suzuki, M. Niibe, H. Ito, and K. Kanda:”Annealing Effect og W Incorporated Diamond-Like Carbon Fabricated by Ga Focused Ion Beam
Chemical Vapor Deposition”
Jpn. J. Appl. Phys., 50, 06GG05-1~4 (2011).
43. M. Niibe, K. Koida, Y. Kakutani, T. Nakayama, S. Terashima, A. Miyake, H. Kubo, S. Matsunari, T.
Aoki, and S. Kawata:”Nonlinear behavior of decrease in reflectivity of multilayer mirrors for extreme ultraviolet
lithography optics by high-flux extreme ultraviolet irradiationin various vaccum environment”
Jpn. J. Appl. Phys., 50, 06GB05-1~6 (2011).
44. Akira Wada, Takeshi Ogaki, Masahito Niibe, Masahito Tagawa, Hidetoshi Saitoh, Kazuhiro Kanda
andHaruhiko Ito:
“Local structural analysis of a-SiCx:H films formed by decomposition of tetramethylsilane in
microwave discharge flow of Ar”,
Diamond and Related Materials, 20, 364-367 (2011).
45. K. Kanda, N. Yamada, K. Yokota, M. Tagawa, M. Niibe, M. Okada, Y. Haruyama, S. Matsui:”Fabrication of Fluorine-terminated diamond-like carbon thin film using a hyperthermal atomic
fluorine beam”,
Diamond and Related Materials, 20 703-706 (2011).
(2) International Meetings
1.

Yoshiaki Ukita, Saki Kondo, Tsukasa Azeta, Masaki Ishizawa, Chiwa Kataoka, Masahiro Takeo,
Yuichi Utsumi,

74

2.

“Stacked centrifugal microfluidic device with three-dimensional microchannel networks andmultifunctional capillary bundle structures for immunoassay”,
Sensors and Actuators B: Chemical,165, (2012)

3.

Tsunemasa Saiki, Katsuhide Okada, Yuichi Utsumi, “Highly efficient liquid flow actuator operated
by surface acoustic waves”,
Electronics and Communications in Japan, 94, 10, 10-16, (2011)

4.

Tsunemasa Saiki, and Yuichi Utsumi,“Highly efficient liquid flow actuator operated by surface acoustic waves”,
IEEJ Transactions on Electronics, Information and Systems, 132, 1, 70-76, (2012)5.

Tsukasa Azeta, Yuichi Utsumi,“Proposal of High-Integrated Three-Dimensional Microfluidic by Using Centrifugal Force for
Enzyme Linked Immunosorbent Assay” ,Journal of Japan Institute of Electronics packaging, 15, 1,
38-41, (2012).

6.

Mitsuyoshi Kishihara, Hiroaki Ikeuchi, Yuichi Utsumi, Tadashi Kawai, Isao Ohta,“Design and Fabrication of PTFE-Filled Waveguide Components by SR Direct Etching”,
IEICE TRANSACTIONS on Electronics, E95-C,
1, 122-129 (2012).

7.

Hiroo Shizuka, Koichi Okuda, Masayuki Nunobiki, Wei Li, Takanobu Inaoka, Tsunemasa Saiki,
Yuichi Utsumi,“Ductile Mode Cutting of Lithium Niobate”, Journal of the Japan Society for Abrasive Technology,
56, 2, 118-123 (2012)8.

Tsukasa Azeta, Yoshiaki Ukita, Yuichi Utsumi,“Proposal of Three-dimensional Microfluidics Device For Immunoassay Using Centrifugal Force”
The 9th International Workshop on High Aspect”
RatioMicroStructureTechnology (HARMST2011), pp55-56, June 12-18 (2011), Hsin Chu, Taiwan

9.

Tsukasa Azeta, Yoshiaki Ukita, Masahiro Takeo, Kyuya. Nakagawa, Shinichi Yusa, Yuichi Utsumi,“Three-Dimensional Lab-on-a-CD with Enzyme-Linked Immunosorbent Assay ” ,The 9th International Workshop on High Aspect Ratio Micro Structure Technology (HARMST2011),
pp174-175, June 12-18 (2011), Hsin Chu, Taiwan

10. Tsukasa Azeta, Hiroki Nose, Masatoshi Kataoka, Yuichi Utsumi,“Propose a blood separation chip for 3D lab-on-a-CD”,
The 9th International Workshop on High Aspect Ratio Micro Structure Technology (HARMST2011),
pp176-177, June 12-18 (2011), Hsin Chu, Taiwan
11. Mitsuhiro Yoshida, Yoshito Hirose, Yoshiaki Ukita, Masahiro Takeo, Kyuya. Nakagawa, Shinichi
Yusa,
Kunihiko Mabuchi, Yuichi Utsumi,
Proposal of Stacked Electrode Layers for Multiplex Nerve Fibers”,
The 9th International Workshop on High Aspect Ratio Micro Structure Technology (HARMST2011),
pp78-79, June 12-18 (2011), Hsin Chu, Taiwan
12. Mitsuhiro Yoshida, Yuji Yoritama, Akinobu. Yamaguchi, Yuichi Utsumi, “Fabrication of Integrated
Magneto Impedance Sensor for Medical Monitoring”,
The 9th International Workshop on High Aspect Ratio Micro Structure Technology (HARMST2011),
pp178-179, June 12-18 (2011), Hsin Chu, Taiwan
13. Tsunemasa Saiki, Tsukasa Azeta, Kei Kuramoto, Yuichi Utsumi, “High Efficiency Microfluidic
Reactor Chip Operated Only Using Surface Acoustic Wave”,

75The 9th International Workshop on High Aspect Ratio Micro Structure Technology (HARMST2011),
pp139-140, June 12-18 (2011), Hsin Chu, Taiwan
14. Hikaru Tomita, Tsunemasa Saiki, Nozomu Araki, Hiroyuki Ishigaki, Yuichi Utsumi, “Study on
Powder Transport Using Surface Acoustic Wave Actuator”,
The 9th International Workshop on High Aspect Ratio Micro Structure Technology(HARMST2011）, pp137-138, June 12-18 (2011), Hsin Chu, Taiwan
15. Atsushi Tokuoka, Daiji Noda, Tadashi Hattori, “Fabrication of high aspect ratio Au microstructureusing direct electroplating on Si microstructure” ,The 9th International Workshop on High Aspect Ratio Micro Structure Technology(HARMST2011）, pp158-159, June 12-18 (2011), Hsin Chu, Taiwan
16. Mitsuyoshi Kishihara, Hiroaki Ikeuchi, Yuichi Utsumi, Tadashi Kawai, Isao Ohta, “Fabrication of
Waveguide Bandpass Filter Using SR Direct Etching of PTFE and Its Evaluation”,
The 9 th International Workshop on High Aspect Ratio Micro Structure Technology（HARMST2011）, pp121-122, June 12-18 (2011), Hsin Chu, Taiwan
17. Yoshiaki Ukita, Tsukasa Azeta, Saki Kondo, Chiwa Kataoka, Shinichi Yusa, Masahiro Takeo,
Yuichi Utsumi,“Environmental Analysis using Stacked Centrifugal Microfluidics”
The 9 th International Workshop on High Aspect Ratio Micro Structure Technology（HARMST2011）, pp121-122, June 12-18 (2011), Hsin Chu, Taiwan
18. Kyuya Nakagawa, Masahiro Takeo, Yuichi Utsumi,“Ice Creates Microstructure in a Colloidal Suspension: Can it be a useful structuralization in a
microspace?”,
The 9 th International Workshop on High Aspect Ratio Micro
Structure Technology（HARMST2011）, pp101, June 12-18 (2011), Hsin Chu, Taiwan
19. Tsukasa Azeta, Hiroki Nose, Saki Kondo, Yuichi Utsumi,“Three-dimensional Micro Fluidics Device Using Centrifugal Force ”,
International Conference on Electronics Packaging（ICEP2011）, pp955-958, April 13-15(2011), Nara, Japan
20. Mitsuhiro Yoshida, Yoshito Hirose, Yoshiaki Ukita, Kunihiko Mabuchi, Yuichi Utsumi,“Proposal of stacked electrodes for multiplex neural interface” ,International Conference on Electronics Packaging（ICEP2011）,
pp968-971, April 13-15 (2011), Nara, Japan
21. Tsukasa Azeta, Yoshiaki Ukita, Yoshito Hirose, Saki Kondo, Yuichi Utsumi,“High-sensitive Detection of Polychlorinated Biphenyl on Three-dimensional Lab-on-a-CD”,
International Conference on Electronics
Packaging（ICEP2011）, pp963-967, April 13-15 (2011), Nara, Japan
22. Hiroki Nose, Tsukasa Azeta, Yoshiaki Ukita, Saki Kondo, Chiwa Kataoka, Yuichi Utsumi,“High-sensitive Enzyme-linked Immunosorbent Assey in Three-dimensional Lab-on-a-CD”
International Conference on
Electronics Packaging（ICEP2011）, pp959-962, April 13-15 (2011), Nara, Japan
23. Hideki Kido, Masaki Ishizawa, Tsukasa Azeta, Yoshiaki Ukita, Yuichi Utsumi,“Direct Photo-Etching of Fluorocarbon Polymers Induced by High Energy Synchrotron Radistion”,
37th International Confedence on Micro and Nano Engineering (MNE2011) , pp166, September 1923 (2011), Berlin, Germany
24. Takao Fukuoka, Mitsuhiro Yoshida, Daisuke Fukuoka, Yuichi Utsumi,

7625. “Noble Metal Nanostructure for Near Infrared Localized Plasmon Sensing”,
37th International Confedence on Micro and Nano Engineering(MNE2011) , pp340, September 19-23 (2011), Berlin, Germany
26. Tsunemasa Saiki, Hikaru Tomita, Hiroo Shizuka, Koichi Okuda, Kazusuke Maenaka, Yuichi Utsumi,“Reflected Surface Acoustic Wave Actuator Using Micro Groove”,
37th International Confedence on Micro and Nano
Engineering (MNE2011) , pp490, September 19-23 (2011), Berlin, Germany
27. Hiroki Nose, Tsukasa Azeta, Masatoshi Kataoka, Masahiro Takeo, Kyuya Nakagawa, Shinichi Yusa,
Yuichi Utsumi,“Proposal a Preparation Chip for 3D Lab-no-a-CD”,
37th International Confedence on Micro and Nano Engineering (MNE2011) , pp534, September 1923 (2011), Berlin, Germany
28. Masaki Ishizawa, Tsukasa Azeta, Hiroki Nose, Yoshiaki Ukita, Masahiro Takeo, Kyuya Nakagawa,Shinichi Yusa, Yuichi Utsumi,“Multi Stacked Centrifugal Microfluidics for Enzyme-linked Immunosorbent Assay”,
37th International Confedence on Micro and Nano Engineering (MNE2011) , pp602-603, September
19-23 (2011), Berlin, Germany
29. Yoshiaki Ukita, Y. Takamura, Yuichi Utsumi,“A Novel Flow Sequencing Method on Centrifugal Microfluidic
Device using “Liquid Clock””,
25th International Microprocesses and Nanotechnology Conference (MNC2011),
26P-7-147L, October 24-27 (2011), Kyoto, Japan
30. Hideki Kido, Masaki Ishizawa, Tukasa Azeta, Yoshiaki Ukita, Yuichi Utsumi,“Direct Photo-Etching of Fluorocarbon Polymers Induced by High Energy Synchrotron Radiation”,
25th International Microprocesses and Nanotechnology Conference (MNC2011), 26P-7-136, October
24-27 (2011), Kyoto, Japan
31. Masaki Ishizawa, Tsukasa Azeta, Hiroki Nose, Yoshiaki Ukita, Yuichi Utsumi,“Three-Dimensional Lab-on-a-CD with Enzyme-Linked Immunosorbent Assay”,
Nano/Micro Engineered and Molecular Systems (IEEENEMS 2012), pp285-289, March 5-8 (2012), Kyoto, Japan
32. Hideki Kido, T Kuroki, M Okubo, Yuichi Utsumi,“Application of Surface Modification and Photo-Etching of Polytetrafluoroethylene for LIGA”,
Nano/Micro Engineered and Molecular Systems (IEEE-NEMS 2012),
pp750-751, March 5-8 (2012), Kyoto, Japan
33. Takao Fukuoka, Mitsuhiro Yoshida, Ryo Takahashi, M Suzuki, Yuichi Utsumi,“Gold Nanorod Arrays for Near
Infrared Optofluidic Device”, Nano/Micro Engineered and Molecular Systems (IEEE-NEMS 2012),
pp439-440, March 5-8 (2012), Kyoto, Japan
34. H. Fujita, R. Bhushan, K. Iyama, K. Tsubakimoto, H. Yoshida, N. Miyanaga, and M. Nakatsuka,“High Average Power Short Pulse Laser for Generation of Coherent 13.5 nm Light”, The 3rdInternational Conference on Laser Peening, Osaka, Japan, 2011/10/11-14.
35. H. Kinoshita, T. Harada, and T. Watanabe,“Overview of EUV Mask Inspection System in NewSUBSRU,”
EUVL Workshop, 2011.6, Maui
36. H. Yoshida, K. Tsubakimoto, H. Fujita, N. Miyanaga, Y. Nagata, H. Kinoshita,“Stimulated-Brillouin-scattering via phase-conjugation-mirror for high-average-power Nd:YAG
laser systems”,
77CLEO Europe-EQEC 2011, ICM International Congress Centre, Munich, Germany, 2011/5/22-26.
37. H. Yoshida, K. Tsubakimoto, Y. Fujimoto, H. Fujita, N. Miyanaga, H. Nozawa, H. Yagi, T.
Yanagitani, Y. Nagata, H. Kinoshita,“Optical properties and Faraday effects on terbium gallium garnet ceramics for Faraday rotator”,
CLEO Europe-EQEC 2011, 22-26 May 2011, ICM - International Congress Centre, Munich,Germany. ICM - International Congress Centre, Munich, Germany, 2011/5/22-26.
38. Yuriy Platonov, Jim Rodriguez, Michael Kriese, Eric Gullikson, Tetsuo Harada, Takeo Watanabe,and Hiroo Kinoshita,“Multilayers for next generation EUVL at 6.X nm”, EUV and X-Ray Optics, Prague, Czech
Republic,
2011/4/20.
39. Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi
hiobara,Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita,“Resist outgassing characterization for qualification in high power EUV lithography“, Extreme
Ultraviolet (EUV) Lithography III,San Jose, California, USA, 2012/02/13.
40. T. Watanabe, H. Kinoshita,“R&D status of EUVL program in Japan,” EUVL Workshop, 2011.6, Matsui
41. Takeo Watanabe, Yuya Yamaguchi, Takuro Urayama, Naohiro Matsuda, Tetsu Harada and Hiroo
inosita,”EUV Interference Lithography for 1X nm (P8),”
EUVL Workshop, 2011.6, Maui
42. Takuro Urayama, Naohiro Matsuda, Yuya Yamaguchi, Takafumi Iguchi, Yasuyuki Fukushima,
Tetsuo Harada, Hiroo Kinoshita, and Takeo Watanabe,“EUV Interference Lithography for 1X nm”,
ICPST-28, Chiba, Japan, 2011/6/21-24.
43. T. Harada, M. Nakasuji, T. Kimura, T. Watanabe, H. Kinoshita, Y. Nagata,“Imaging of EUV-Mask Patterns using the Coherent Scatterometry Microscope based on a Coherent
Diffraction Imaging”,
EIPBN 55th, Las Vegas, USA, 2011/5/31.
44. Y. Nagata, T. Harada, H. Kinoshita, K. Midorikawa,“Generation of highly coherent, bright 13 nm light with phase-matched high-order harmonics forcoherent scatterometry microscope,”
EIPBN 55th, Las Vegas, USA, 2011/5/31.
45. Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada, Yutaka Nataga, Takeo Watanabe, Katsumi
Midorikawa, Hiroo Kinoshita,“Development of Coherent EUV Scatterometry Microscope with High-order Harmonic
Generation Source for EUV Mask Inspection and Metrology,” MNC2011, Kyoto, Japan, 2011/10/26.
46. Yuya Yamaguchi, Yasuyuki Fukushima, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita,“Extreme Ultraviolet Interference Lithography toward 1X nm Nodes”,
EIPBN 55th, Las Vegas, USA, 2011/5/31.
47. Tetsuo Harada, Masato Nakasuji, Akifumi Tokimasa, Takeo Watanabe, Youichi Usumi, Hiroo
Kinoshita, "Micro Coherent EUV Scatterometry Microscope for a Defect Characterization on an
EUV Mask", MNC2011, Kyoto, Japan, 2011/10/26.
48. Fujimoto, M. Okada, Y. Kang, M. Niibe, S. Matsui, T. Suzuki, and K. Kanda“Thermal Durability of FIB-DLC Films containing W”
78

49. 24rd International Microprocesses and Nanotechnology Conference (MNC2011), ANA Hotel Kyoto,
October24-27 [27P-11-28].
50. Takuto Fukuoka, Akira Heya, Naoto Matsuo, Kazuhiro Kanda and Takashi Noguchi“Novel activation method of B by soft X-ray undulator”
2011 International Conference on Solid State Devices and Materials (SSDM 2011), Aichi Industry& Labor Center (WINC AICHI), Nagoya, Japan, Sep. 28-30, 2011
51. Kazuhiro Kanda, Masahito Niibe, Masahito Tagawa, Kumiko Yokota“Reaction Mechanism of the Irradiation of Soft X-ray to the Diamond-Like Carbon Films”
10th International Space Conference on Protection of Materials and Structures from the Space
Environment (ICPMSE-10J), Bankokushinryoukann, Nago, Jum 12-17, 2011 [C-8]52. Kumiko Yokota, Masahito Tagawa, Koji Matsumoto, Yuichi Furuyama, Akira Kitamura, Kazuhiro
Kanda, Mayumi Tode, Akitaka Yoshigoe, Yuden Teraoka“Hydrogen Removal from Hydrogenated Diamond-Like Carbon Films by Photon and Energetic
Atomic Oxygen Beam Exposure”
10th International Space Conference on Protection of Materials and Structures from the Space
Environment (ICPMSE-10J), Bankokushinryoukann, Nago, Jum 12-17, 2011 [PE-2]
53. Kazuhiro Kanda, Masahito Niibe, Akira Wada, Haruhiko Itoh, Tsuneo Suzuki, and Hidetoshi Saitoh“Near-Edge X-ray Absorption Fine Structure Spectra of Si-containing DLC Thin Films”
5th International Conference on New Diamond and Nano Carbons(NDNC2011)
Kunibiki Messe, Matsue, May 16-20, 2011 [16-5]
54. Yohei SAWADA, Makoto OKADA, Hiroto MIYAKE, Takeshi OHSAKI, Yoshihiko HIRAI,
YuichiHARUYAMA, Kazuhiro KANDA, Hiroshi HIROSHIMA, Shinji MATSUI“Evaluation of curing time and calorific value of UV-curable resin under pentafluoropropane gas
ambient by photo-differential scanning calorimetry”
International Conference on Materials for Advanced Technologies (ICMAT2011), Suntec,
Singapore, Jun. 26 – Jul. 1, 2011, [C1-5]
55. Makoto OKADA, Masayuki IWASA, Yuichi HARUYAMA, Kazuhiro KANDA,
Hiroshi HIROSHIMA, Shinji MATSUI“Release Effect Evaluation of Pentafluoropropane Gas by Scanning Probe Microscopy”
International Conference on Materials for Advanced Technologies (ICMAT2011), Suntec,
Singapore, Jun. 26 – Jul. 1, 2011, [C-PO4-1]
56. Mika CHINEN, Makoto OKADA, Yuichi HARUYAMA, Kazuhiro KANDA,
Hiroshi HIROSHIMA, Shinji MATSUI“Evaluation of dynamic wettability of UV nanoimprint resin under pentafluoropropane gas ambient
by dynamic contact angle measurement”
International Conference on Materials for Advanced Technologies (ICMAT2011), Suntec,
Singapore, Jun. 26 – Jul. 1, 2011, [C-P04-5]
57. Y. Kang, Y. Nakai, M. Okada, Y. Haruyama and S. Matsui, “Mechanical characteristics ofnanostructuresfabricated by nanoimprint”, The 55th International Conference on electron, ion, photon beamtechnology and fabrication, Las Vegas, 2011/6/1
58. Y. Nakai, K. Yuji, M. Okada, Y. Haruyama, K. Kanda, T. Ichiahshi and S. Matsui, “Annealing
dependence of deposit morphology for Fe-Ga contained DLC film formed by FIB-CVD withferrocene source gas”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
59. M. Okada, H. Miyake, S. Iyoshi, T. Yukawa, H. Takeuchi, Y. Haruyama and S. Matsui79

“Evaluation of effect of fluorine additive agent for cationic UV-nanoimprint resin”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
60. M. Okada, Y. Haruyama, K. Kanda and S. Matsui“Evaluation of PDMS thin layer as antisticking layer for UV nanoimprinting”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas,2011/6/1
61. S. Omoto, M. Okada, K. Yuji, Y. Nakai, Y. Haruyama, H. Umekawa and S. Matsui“Evaluation of SiOx containing UV nanoimprint resin”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
62. M. Chinen, M. Okada, Y. Haruyama, H. Hiroshima and S. Matsui“Effect evaluation of pentafluoropropane gas for UV nanoimprint resin by using contact angle
meter”The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
63. D. Yamashita, M. Okada, Y. Nakai, Y. Haruyama and S. Matsui“Comparison of surface condition of nanoimprint antisticking layers formed by CVD and dip-coat
methods”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
64. Y. Sawada, M. Okada, H. Miyake, T. Ohsaki, Y. Hirai, Y. Haruyama, K. Kanda, H. Hiroshima and
S. Matsui“Evaluation of curing process of UV resin in PFP gas ambient by photo-differential scanningcalorimetry”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
65. M. Okada, M. Iwasa, Y. Haruyama, K. Kanda, H. Hiroshima and S. Matsui“Adhesion and frictional forces measurement by scanning probe microscopy underpentafluoropropane gas atmosphere”
The 55th International Conference on electron, ion, photon beam technology and fabrication, Las
Vegas, 2011/6/1
66. Y. Kang, M. Okada, K. Kanda, Y. Haruyama, S. Matsui“SiOx Moth-eye Structure Fabrication by Room-temperature Nanoimprint Using Hydrogen
Silsesquioxane”
The 12th International Conference on Radiation Curing in Asia, Yokohama, 2011/6/23
67. Y. Sawada, M. Okada, Y. Haruyam, K. Kanda, Y. Hirai, S. Matsui“Evaluation of Synthesized Radical- and Cationic-UV Nanoimprint Resins”
The 12th International Conference on Radiation Curing in Asia, Yokohama, 2011/6/23
68. M. Chinen, M. Okada, M. Iyo, S. Tachibana, Y. Haruyama, K. Kanda, S. Matsui“Characteristics of Calixarene Derivative for UV-nanoimprinting”
The 12th International Conference on Radiation Curing in Asia, Yokohama, 2011/6/23
69. M. Okada, M. Iwasa, Y. Haruyama, K. Kanda, Y. Hirai, S. Matsui“ Viscoelasticity Evaluation of UV Nanoimprint Resin by Scanning Probe Microscopy”
The 12th International Conference on Radiation Curing in Asia, Yokohama, 2011/6/23
70. M. Okada, M. Iwasa, Y. Haruyama, K. Kanda, H. Hiroshima, S. Matsui“Release Effect Evaluation of Pentafluoropropane Gas by Scanning Probe Microscopy”
80Asian Nanoimprint Lithiography Symposium, Singapore, 2011/6/30
71. Y. Sawada, M. Okada, H. Miyake, T. Ohsaki, Y. Hirai, Y. Haruyama, K. Kanda, H. Hiroshima, S.
Matsui“Evaluation of Curing Time and Calorific Value of UV-curable Resin Under Pentafluoropropane
Gas Ambient by Photo-differential Scanning Calorimetry”
Asian Nanoimprint Lithiography Symposium, Singapore, 2011/6/30
72. Y. Kang, Y. Nakai, M. Okada, Y. Haruyama, S. Matsui“Young’s Modulus Measurement of Nanostructures Fabricated by Nanoimprint”
Asian Nanoimprint Lithiography Symposium, Singapore, 2011/6/30
73. M. Chinen, M. Okada, Y. Haruyama, K. Kanda, H. Hiroshima, S. Matsui“Evaluation of Dynamic Wettability of UV Nanoimprint Resin Under Pentafluoropropane Gas
Ambient by Dynamic Contact Angle Measurement”
Asian Nanoimprint Lithiography Symposium, Singapore, 2011/6/30
74. S. Omot, M. Okada, Y. Kang, Y. Nakai, Y. Haruyama, H. Umekawa, S. Matsui“Evaluation of SiOx Containing UV Nanoimprint Curable Resin”
Asian Nanoimprint Lithiography Symposium, Singapore, 2011/6/30
75. D. Yamashita, M. Okada, Y. Nakai, Y. Haruyama, S. Matsui“Characterization of nanoimprint antisticking layers formed by cvd and dip-coat methods”
76. M. Okada, K. Kuramoto, M. Iwasa, Y. Haruyama, S. Matsui“Characteristic evaluation of antisticking layer by scanning probe microscopy”
37th International Conference on Micro and Nano Engineering (Berlin), 2011/9/20
77. M. Okada, H. Miyake, S. Iyoshi, T. Yukawa, H. Takeuchi, Y. Haruyama, S. Matsui“Effect evaluation of fluorine additive in UV nanoimprint resin”,
37th International Conference on Micro and Nano Engineering, Berlin, 2011/9/20
78. Y. Kang, M. Okada, Y. Haruyama, S. Matsui“Evaluation of liquid-phase HSQ resin for roomtemperature nanoimprinting”,
37th International Conference on
Micro and Nano Engineering, Berlin, 2011/9/20
79. M. Okada, M. Kurita, M. Kondo, Y. Haruyama, N. Kawatsuki, S. Matsui“Investigation for orientation of photoinduced liquid crystalline polymer imprinted by using moldwith various patterns”
37th International Conference on Micro and Nano Engineering, Berlin, 2011/9/20
80. M. Okada, H. Miyake, S. Iyoshi, T. Yukawa, T. Katase, K. Tone, Y. Haruyama, S. Matsui“Double patterning nanoimprint lithography”
37th International Conference on Micro and Nano Engineering, Berlin, 2011/9/21
81. M. Okada, Y. Haruyama, and S. Matsui“Characteristics of thin polydimethylsiloxane layer formed by using silane coupling agent”
The 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, 2011/10/19
82. M. Okada, H. Miyake, S. Iyoshi, T. Yukawa, T. Katase, K. Tone, Y. Haruyama, and S. Matsui“Double patterning by UV-Nanoimprinting”
The 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, 2011/10/19
83. Y. Sawada, M. Okada, H. Miyake, T. Ohsaki, Y. Haruyama, Y. Hirai, H. Hiroshima, and S. Matsui“Evaluation of polymerization degrees of UV-nanoimprinting patterns fabricated in PFP gas
ambient”
The 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, 2011/10/19
8184. Y. Kang, M. Okada, Y. Haruyama, and S. Matsui“Characteristics of liquid-phase HSQ resin effects on the room-temperature nanoimprinting”
The 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, 2011/10/19
85. M. Chinen, M. Okada, Y. Haruyama, and S. Matsui“Evaluation of interaction between UV-nanoimprint resin and antisticking layer by dynamic contact
angle measurement”
The 10th International Conference on Nanoimprint and Nanoprint Technology, Jeju, 2011/10/19
86. M. Okada, Y. Haruyama and S. Matsui“Double Pattering by Room-temperature Nanoimprint using Organic Spin-on-glass”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/26
87. S. Iyoshi, M. Okada, K. Kobayashi, S. Kaneko, T. Katase, K. Tone, Y. Haruyama, M.
Nakagawa,H.Hiroshima and S. Matsui“Step and Repeat UV Nanoimprinting under Pentafluoropropane Gas Ambient”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
88. Y. Sawada, M. Okada, H. Miyake, T. Ohsaki, Y. Haruyama, Y. Hirai, H. Hiroshima and S. Matsui“Evaluation of Polymerization Degrees of Patterns fabricated by UV-nanoimprint in PFP Gas
Ambient”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
89. M. Okada, M. Iwasa, Y. Haruyama, H. Hiroshima and S. Matsui“Evaluation of Fluorinated Self-assembled Monolayers under Pentafluoropropane Gas Ambient by
Scanning Probe Microscopy”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
90. M. Chinen, M. Okada, Y. Haruyama and S. Matsui“Evaluation of Interaction Force between UV-nanoimprint Resin and Antisticking Layer by
Dynamic Contact Angle Measurement”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
91. Y. Kang, Y. Nakai, M. Okada, Y.Haruyama and S. Matsui“Change in Young's Modulus of Imprinted Nanopillar after Residual Layer Removal by Reactive
IonEtching”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
92. D. Yamashita, M. Okada, Y. Nakai, Y. Haruyama and S. Matsui“Comparison of Surface Characterization of Antisticking Layer formed by CVD and Dip-coat
Methods for Nanoimprint Lithography”
93. 24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
94. Y. Nakai, Y. Kang, M. Okada, Y. Haruyama and S. Matsui“Development of the Thermal-actuators fabricated by FIB-CVD”
24st International Microprocesses and Nanotechnology Conference, Kyoto, 2011/10/27
95. Y. Kang, Y. Nakai, M. Okada, Y. Haruyama, and S. Matsui“Change in Young’s modulus of imprinted nanopillar after reactive ion etching”
The International Meeting on Novel Catalyst Design and Surface Science, Himeji, 2011/12/9
96. M. Okada, Y. Haruyama, T. Sugimura, and S. Matsui“Nanostructure fabrication for catalysis by electron beam and nanoimprint lithographyies”
The International Meeting on Novel Catalyst Design and Surface Science, Himeji, 2011/12/9
97. M. Niibe, T. Kotaka, R. Kawakami, Y. Nakano, T. Inaoka, K. Tominaga, and T. Mukai:”Damage analysis of n-GaN crystals etched with He and N2 plasma”
824th Int’l. Symposium on Advanced Plasma Sci. and its Applications, Nagoya, Japan 4-8 March(2012).
98. Y. Nakano, R. Kawakami, M. Niibe, A. Takeichi, T. Inaoka, K. Tominaga”Photoluminescence Study of Plasma-Induced Etching Damages in GaN”
Materials Research Society 2011 Fall Meeting, 28 Nov-2Dec (2011), Boston, USA
99. R. Kawakami, M. Niibe, A. Takeichi, Y. Mori, M. Konishi, T. Kotaka, F. Matsunaga, T. Takasaki, T.
Kitano, T. Miyazaki, T. Inaoka, and K. Tominaga:”Characteristics of TiO2 Thin Film Surfaces Treated by Dielectric Barrier Discharge Helium and Air
Plasmas”
Proc. of Internat. Symp. of Dry Process 2011 (2011, Kyoto) pp. 75-76, ISBN: 978-4-86348-216-6.
100. Masahito Niibe, Takuya Kotaka, Satoko Hori, Shozo Inoue:”Characterization of Crystalline Structure of BN Thin Film Using Soft X-ray Absorption
Spectroscaopy”
15th International Conf. Thin Films (ICTF-15), 8~11 Nov. 2011, Kyoto, Japan.
101. Fujimoto, M. Okada, Y. Kang, M. Niibe, S. Matsui, T. Suzuki, and K. Kanda:”Thermal Durability of FIB-DLC Films containing W”, 24th Internat. Microprocesses andNanotechnology Conf. (MNC2011), ANA Hotel Kyoto, Oct. 24-27, [27P-11-28].
102. S. Honda, Honda, S. Nanba, Y. Hasegawa, M. Niibe, and M. Terasawa, R. Hirase, H. Yoshioka, H.
Izumi, K.-Y. Lee:
”Raman spectroscopy and X-ray absorption near-edge structure study of defects in vertically aligned
multi-walled carbon nanotube films introduced by Ar ion irradiation” 22nd European Conference on
Diamond, Diamond-like Materials, Carbon Nanotubes, and Nitrides, 7 September, 2011, Bavaria,
Germany
103. M. Sakamoto, F. Tsumuraya, M. Niibe:”A Development plan of sputtering system for large scale telescope mirror coating at Nish-Harima
astronomical observatory”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.
104. S. Hori, K. Fujii, M. Niibe, K. Yoshiki, T. Namazu, S. Inoue:”Effect of substrate temperature and bias voltage on the crystalline structure of BN films prepared by
rf magnetron sputtering”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.
105. T. Kotaka, M. Niibe, R. Kawakami, T. Inaoka, K. Tominaga, T. Muaki:”Damage analysis of gallium nitride crystals etched by He and Ar plasmas”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.
106. R. Kawakami, A. Takeichi, M. Niibe, M. Konishi, Y. Mori, M. Kodama, T. Kotaka, T. Inaoka, K.
Tominaga:”Capacitively coupled radio frequency helium plasma treatment effect on TiO2 thin film surfaces”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.
107. Takeichi, R. Kawakami, M. Niibe, M. Konishi, Y. Mori, M. Kodama, T. Kotaka, T. Inaoka, K.
Tominaga:”Capacitively coupled radio frequency nitrogen plasma etch damage to n-type gallium nitride”
11th Internattional Symp. Sputtering & Plasma Processes (ISSP2011), 6~8 July 2011 Kyoto, Japan.
108. Kazuhiro Kanda, Masahito Niibe, Masahito Tagawa, Kumiko Yokota:“Reaction Mechanism of the Irradiation of Soft X-ray to the Diamond-Like Carbon Films”
10th International Space Conference on Protection of Materials and Structures from the Space
Environment (ICPMSE-10J), Bankokushinryoukann, Nago, June 12-17, 2011 [C-8].

83109. Kazuhiro Kanda, Masahito Niibe, Akira Wada, Haruhiko Itoh, Tsuneo Suzuki, and Hidetoshi Saitoh:“Near-Edge X-ray Absorption Fine Structure Spectra of Si-containing DLC Thin Films”
5th International Conference on New Diamond and Nano Carbons(NDNC2011)Kunibiki Messe,
Matsue, May 16-20, 2011, [16-5]
110. Masahiro Ohka, Takuya Matsunaga, Daiji Noda and Tadashi Hattori, “Experimental Tactile Sensor
Using Optical Flow”, 4th International Conference on Manufacturing, Machine Design andTribology (ICMDT 2011), Gamagori, Japan, April 24-27, 2011111. Daiji Noda, Atsushi Tokuoka, Megumi Katori, Tadashi Hattori, “Fabrication of New X-ray Mask
Using Carbon Membrane”, 4th International Conference on Manufacturing, Machine Design andTribology (ICMDT 2011), Gamagori, Japan, April 24-27, 2011112. Daiji Noda, Atsushi Tokuoka, Tadashi Hattori: “Fabrication of carbon X-ray mask for high aspectratio X-ray grating”, 9th International Workshop on High-Aspect-Ratio Micro-Structure Technology(HARMST2011), Hsinchu, Taiwan, June 12-18, 2011113. Daiji Noda, Yuu Kuboyama, Tadashi Hattori, “Fabrication of high precision microstructure using
ICP etching for capacitive inclination sensor”, 9th International Workshop on High-Aspect-Ratio
Micro-Structure Technology (HARMST2011), Hsinchu, Taiwan, June 12-18, 2011114. Daiji Noda, Atsushi Tokuoka, Megumi Katori, Yasuto Minamiyama, Kenji Yamashita, Satoshi
Nishida and Tadashi Hattori, “Fabrication of Large Area X-ray Diffraction Grating for X-ray Phase
Imaging”, International Workshop on X-ray and Neutron Phase Imaging with Gratings (XNPIG),
Tokyo, Japan, March 5-7, 2012115. Daiji Noda, Atsushi Tokuoka and Tadashi Hattori, “Fabrication of High Aspect Ratio X-ray Grating
Using Silicon Dry Etching Method”, International Workshop on X-ray and Neutron Phase Imaging
with Gratings (XNPIG), Tokyo, Japan, March 5-7, 2012(3)Book
S.Amano: “RECENT ADVANCES IN NANOFABRICATION TECHNIQUES ANDAPPLICATIONS”, B.Cui, edits, (INTEC, Croatia 2011), Chap.18,”Laser-Plasma Extreme Ultraviolet
Source Incorporating a Cryogenic Xe target”, pp.353-368.
(4) Award
木下博雄” 極端紫外線リソグラフィー技術の先駆的研究”
平成 23 年度科学技術分野の文部科学大臣表彰 科学技術賞（研究部門）

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