ＣＯＮＴＥＮＴＳPREFACE······················································································································································· ⅰ

CONTENTS···················································································································································· ⅲ

ORGANIZATION········································································································································· ⅳ

CURRENT STATUS OF NewSUBARU
NewSUBARU Storage Ring··························································································································
Beamlines ·····················································································································································Construction of multilayered-mirror monochromator at BL07A ·······························································
Construction of X-ray fluorescence spectrometer in the Ultra-soft X-ray region·······················································
BL05 Operating Status ·································································································································Recent upgrade of 15MeV Electron Linear Accelerator LEENA for THz Radiation Sources ·····················

1310121516RESEARCH ACTIVITIESInvestigation of Spectral recovery of Etching Damage Observed in XAS spectra of TiO2 Thin Films ········ 19Oxidation State Analysis Soft X-ray Absorption Fine Structure Using M4,5 edge of Tin ····························· 21
Surface analysis of GaN treated by Ar ion beam etching ············································································ 23
NEXAFS Study on Soft X-ray Irradiation Effect on Highly Hydrogenated Diamond-like Carbon Films ····
26
Atomic Oxigen beam irradiation Effect on the Si-doped DLC Films ········································································· 28
Molecular Orientation at the Near-surface of Photaligned Films Determined by NEXAFS ······················· 30
EUV Resist Chemical Reastion Analysis using SR ······················································································· 32
Phase defect characterization on an extreme-ultracviolet blank mask using micro coherent extreme-ultraviolet
scatterometry microscope ····························································································································· 39
Low-Temperature Activation of Boron in B10H14-doped Si wafer by Soft X-ray Irradiation ······················· 45
Two Modified Layers in the surface of Silica-Based Films by Undurator Radiation ·································· 47
Microprocessing using Soft X-ray from Laser Produced Xe Plasma··························································· 49
Broadband spectroscopy of magnetic response in a nano-scale magnetic wire ·········································· 51
Dihedral Corner Reflector Array for floating image manufactured by Synchrotron radiation ··················· 56
Evaluation of localized friction for antisticking layer by atomic force microscopy ····································· 58
LIST OF PUBRICATIONSPapers ···························································································································································
International Meetings ··································································································································6166

ACADEMIC DEGREES ·······························································································································81

COVER PHOTOGRAPHS ···························································································································83

EDITORIAR BOAD ······································································································································84ⅲ