List of Publications

List of publications(1)Papers
1.

T. Inoue, T. Mochizuki, S. Miyamoto, K. Masuda, S. Amano, and K. Kanda, "Investigation of
Ru Focusing Mirror for 5- to 17-nm Soft X rays from Laser-Produced Plasma", Review ofLaser Engineering、vol.41, no.1, pp.59-62 (2013).

2.

(in Japanese)

D. Li, M. Hangyo, Z. Yang, Y. Tsunawaki, Y. Wei, Y. Wang, S. Miyamoto, M. R. Asakawa,
and K. Imasaki, "Theoretical analysis and simulation of growth rate and start current in
Smith–Purcell free-electron lasers", Terahertz Science and Technology, ISSN 1941-7411, vol.6,
no.3, pp.189 -205 (2013).

3.

Shuji Miyamoto, "Development of Technology and Application of Laser Compton Scattering
Gamma-Ray Beam", Review of Laser Engineering, vol.41, no.11, pp.917-921 (2013). (inJapanese)

4.

Y.Shoji, "Landau Damping of Collective Betatron Oscillation in a Quasi-Isochronous Electron
Storage Ring", Nucl. Instr. and Meth. in Phys. Res. A729, pp.1-2 (2013).

5.

S.Amano, T,Inoue, T.Harada, “Plasma debris sputter resistant x-ray mirror”, Applied Optics,
Vol.52, pp.3845-3848 (2013).

6.

S.Amano, T.Inoue, “Diamond-like carbon sputtering by laser produced Xe plasma”, NIMB,
Vol.314, pp.26-29, (2013).

7.

T.Sekioka, S.Amano, T.Inoue, T.Mochizuki, “Characteristics of fast ions from laser produced
plasma and their applicability to Shallow junction doping”, NIMB, Vol.314, pp.162-165,(2013).

8.

K. Kanda, M. Niibe, A. Wada, H. Ito, T. Suzuki, T. Ohana, N. Ohtake, and H. Saitoh,“Comprehensive Classification of Near-Edge X-Ray Absorption Fine Structure Spectra of
Si-Containing Diamond-Like Carbon Thin Films”, Jpn. J. Appl. 52 pp.095504, (2013).

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9.

K. Ozeki, D. Sekiba, T. Suzuki, K. Kanda, M. Niibe, K.K. Hirakuri, T. Masuzawa, “Influence ofthe source gas ratio on the hydrogen and deuterium content of a-C:H and a-C:D films:
lasma-enhanced CVD with CH4/H2, CH4/D2, CD4/H2 and CD4/D2”, Applied Surface Science,
265, pp.750, (2013).

10. A,.Heya, N. Matsuo, M. Takahashi, K. Ito, and K. Kanda, “Crystallization of Si1-xGex
Multilayer by soft X-ray Irradiation”, Applied Physics Express, 6, pp.065501, (2013).

11. A. Heya, K. Kanda, K. Toko, T. Sadoh, S. Amano, N. Matsuo, S. Miyamoto, M. Miyao, T.
Mochizuki, “Low-temperature crystallization of amorphous silicon and amorphous germanium
by soft X-ray irradiation”, Thin Solid Films, 534 , 334-340, (2013).

12. K. Kanda, T. Hasegawa, M. Uemura, M. Niibe, Y. Haruyama, M. Motoyama, K. Amemiya, S.
Fukushima and T. Ohta, “Construction of a Wide-range High-resolution Beamline BL05 in
NewSUBARU for X-ray Spectroscopic Analysis on Industrial Materials”, J. Phys..: Conf. Ser.
425, pp.065501, (2013).

13. H. Ito, S. Onitsuka, R. Gappa, H. Saitoh, R. Roacho, K. H. Pannell, T. Suzuki, M, Niibe,
K.Kanda, “Fabrication of Amorphous Silicon Carbide Films from Decomposition of
Tetramethylsilane useing ECR plasma of Ar”, J. Phys.: Conf. Ser. 441 ,pp.012039, (2013).

14. S. Honda, R. Tamura, Y. Nosho, A. Tsukagishi, M. Niibe, M. Terasawa, R. Hirase, H. Izumi, H.
Yoshioka, K. Niwase, E. Taguchi, K-Y. Lee, M. Oura, “Transformation of multiwalled carbon
nanotubes to amorphous carbon nanorods under ion irradiation”, Jpn. J. Appl. Phys. 53
02BD06 ,(2014).

15. K. Kanda, K. Fukuda, K. Kidena, R. Imai, M. Niibe, S. Fujimoto, K. Yokota, M. Tagawa:“Hyperthermal atomic oxygen beam irradiation effect on the Ti-containing DLC film”,
Diamond Related Materials, pp.41 49-52, (2014).

16. R. Kawakami, M. Niibe, H. Takeuchi, M. Konishi, Y. Mori, T. Shirahama, T. Yamada, and K.
Tominaga: “Surface damage of 6H-SiC originating from argon plasma irradiations”, Nucl.

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Instrum. Methods in Phys. Res., B pp.315 213-217, (2013).

17. Tsukagishi, S. Honda, R. Osugi, H. Okada, M. Niibe, M. Terasawa, R. Hirase, H. Izumi, H.
Yoshioka, K. Niwase, E. Taguchi, K-Y. Lee, M. Oura, ”Spectroscopic characterization of
ion-irradiated multi-layer graphenes”, Nucl. Instrum. Methods in Phys. Res., B 315 pp.64-67(2013).

18. R. Kawakami, M. Niibe, Y. Nakano, T. Shirahama, T. Yamada, K. Aoki, M. Takabatake, K.
Tominaga, and T. Mukai, “Damage characteristics of n-GaN thin film surfaces etched by N2
Plasmas”, Physica Status Solidi, C 10, pp.1553-1556, (2013).

19. R. Kawakami, M. Niibe, Y. Nakano, M. Konishi, Y. Mori, A. Takeichi, K. Tominaga, and T.
Mukai, “Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by
Capacitively Coupled Radio Frequency Argon Plasmas”, Jpn. J. Appl. Phys. 52, pp.05EC05,(2013).

20. R. Kawakami, M. Niibe, Y. Nakano, M. Konishi, Y. Mori, H. Takeuchi, T. Shirahama, T.
Yamada, and K. Tominaga: “Characteristics of TiO2 Surfaces Etched by Capacitively Coupled
Radio Frequency N2 and He Plasmas”, J. Phys.: Conf. Series, 441, pp.012038, (2013).

21. T. Kobayashi, D. Itami, R. Hashimoto, T. Takashina, H. Kanematsu, K. Mizuta and Y. Utsumi,“Optimizing Structure of LED Light Bulb for Heat Transfer”, Journal of Physics Conference
Series, 433,pp.012016, (2013).

22. T. Kobayashi, M. Doi, T.Fukuda, R.Hashimoto, H.Kanematsu and Y.Utsumi, “Study on
evaluation methods Performance Simulation of Polymer Electrolyte Fuel Cell”, Journal of
Physics: Conference Series 433 (2013), pp.012021, (2013).

23. T. Kobayashi, K.Doi, H. Kanematsu, Y. Utsumi, R. Hashimoto, and T. Takashina “Remote
Sensing of Radiation Dose Rate by a Robot for Outdoor Usage”, Journal of Physics: Conferenc
eSeries 433 (2013) , pp.012030, (2013).

24. T. Kobayashi, S. Kamikawa, Y. Itou, H. Kanematsu and Y. Utsumi, “Effect of Deposition and63

Storage Conditions on the Gas Permeability of SiOx Thin Films” Applied Mechanics andMaterials, 378,

pp.248-252, (2013).

25. 岸原充佳, 山島芸, 内海裕一, “ポスト壁導波路を用いたチップサイズ連続マイクロ波照射構造,” 電気学会論文誌, Sec.E, Vol.133, No.12, pp.365-371, (2013).

26. Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi,
Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Tetsuo Harada, and Hiroo
Kinoshita, “Development of Tool for Contamination Layer Thickness Measurement Using HighPower Extreme Ultraviolet Light and In-Situ Ellipsometer,”, Jpn. J. Appl. Phys. 52 pp.056701-1,
056701-5, (2013).

27. Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi
Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita, “EUV Resist Chemical Reaction
Analysis using SR,”, J. Photopolym. Sci. Technol. 26, pp.635-642, (2013).

28. Isamu Takagi, Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayama, Yukiko Kikuchi, Eishi
Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo
Kinoshita , “Comparison of Resist Family Outgassing Characterization between EUV and EB,”,
J. Photopolym. Sci. Technol. 26, pp.673-678, (2013).

29. Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Kenjiro
Yamasoe, Mitsunori Toyoda, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, and Hiroo
Kinoshita,“Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet

Lithography Mask Using an Extreme Ultraviolet Microscope,”, Appl. Phys. Express 6
pp.046501-1, 046501-3, (2013).

30. Y. Nagata T. Harada, T. Watanabe, K. Midorikawa, and H. Kinoshita,“Defect Sensing of

EUV Mask using Coherent EUV Light,” (in Japanese), Journal of the Institute of ElectricalEngineers of Japan A, 133, pp.509-518, (2013).

31. T. Kudo, K. Kobayashi, S. Ono, N. Teranishi, T. Watanabe, H. Kinoshita, M. Okihara, and T.
Hatsui, “Development of High-Speed Evaluation Method of Radiation hardness of64

Semiconductor Devices,” Silicon Technology Division of the japan Society of Applied Physics
170, “The Effect of Radiation Irradiation to Semiconductor Devices”, pp.24-29, (2014).

32. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, “Comparison Molecular Orientation of Photoinduced Liquid Crystalline Polymer
induced by Thermal Nanoimprintingt to that by Graphoepitaxy”, Journal of Photopolymer
Science and Technology, 26, pp.65-68, (2013).

33. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.
Matsui , “Molecular Orientation of Photoinduced Liquid Crystalline Polymer with 3D Structure
abricated by Thermal Nanoimprinting”, Journal of Photopolymer Science and Technology, 26,
pp.83-85, (2013).

34. T. Oyama, M. Okada, S. Iyoshi, Y. Haruyama, H. Miyake, T. Mizuta and S. Matsui , “Surface
Evaluation of Cationic UV-curable Resin with Fluorine Additive by X-ray Photoelectron
Spectroscopy”, Journal of Photopolymer Science and Technology, 26, pp.129-132, (2013).

35. H. Wakaba, M. Okada, S. Iyoshi, Y. Haruyama and S. Matsui , “Release Property Evaluation of
Fluorinated Antisticking Layer by a Mixture of Release Agents”, Journal of Photopolymer
Science and Technology, 26, pp.143-146, (2013).

36. T. Watanabe, K. Emura, D. Shiono, Y. Haruyama, Y. Muramatsu, K. Ohmori, K. Sato, T. Haradaand H. Kinoshita , “EUV Resist Chemical Reaction Analysis using SR”, Journal of
Photopolymer Science and Technology, 26, pp.635-641, (2013).

37. M. Okada, H. Miyake, S. Iyoshi, T. Yukawa, T. Katase, K. Tone, Y. Haruyama, S. Matsui“Double patterning in nanoimprint lithography”, Microelectronic Engineering 112, pp.139–142,(2013).

38. M. Okada, Y. Haruyama, S. Matsui, E. Nishioka, R. Hosoda, M. Kondo, N. Kawatsuki, T.
Sasaki and H. Ono, “Reorientation of photoreactive liquid crystalline polymer pattern
fabricated by hybrid nanoimprinting”, Journal Vacuum Science Technology B 31, pp.
06FB04-1-06FB04-4, (2013).

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39. N. Kawatsuki, Y. Inada, M. Kondo, Y. Haruyama, and S. Matsui, “Molecular Orientation at the
Near-Surface of Photoaligned Films Determined by NEXAFS”, Macromolecules 47,
pp.2080–2087, (2014).

(2)Internatonal Meetings

1.

Shuji Miyamoto (invited), "Laser Compton Scattering Gamma-ray Source and Nuclear
Applications - Photo Nuclear Reaction and Transmutation-“, International Conference on Laser
Applications in Nuclear Engineering LANE 2013, Pacifico YOKOHAMA, Japan, Aplil 23-25(2013).

2.

S.Miyamoto, S.Amano, S.Hashimoto, M.Terasawa, A. Koizumi, T. Mochizuki, H. Utsunomiya,
T. Shima, T.Hayakawa, T.Shizuma, K.Imasaki, D.Li, Y.Izawa, F.Hori, Y.Asano and
H.Ohkuma, "Gamma-ray Generation and Application by Laser Compton Scattering", The
Eighth International Conference on Inertial Fusion Science and Applications (IFSA), P.Th_76,
Nara Prefectural New Public Hall, Nara, Japan, Sept. 8-13 (2013).

3.

Shuji Miyamoto (invited). "Gamma-ray Generation and Application by Laser Compton
Scattering", "Interaction Meeting on X-ray Lithography and Microfabrication" , Raja Ramanna
Center for Advanced Technology, Indore, India,December 5-6 (2013).

4.

S.Miyamoto, S.Amano, S.Hashimoto, T.Mochizuki, K.Imasaki, D.Li, Y.Izawa (invited), "Laser
Compton Gamma-ray Application for Nuclear Decommissioning”, International Workshop on
Laser Application to Nuclear Decommissioning and Decontamination (LANDD2013), The
Wakasawan Energy Research Center, Tsuruga, Japan, December 12 (2013).

5.

Shuji Miyamoto (invited), "Laser Compton Gamma-ray Beam Source at NewSUBARU”,
International Workshop on “Nuclear Physics and Gamma-ray sources for Nuclear Security andNonproliferation (NPNSNP)”, Ricotti, Tokai, Japan, January 28-30 (2014).

6.

K. Kobayashi, Y.Kawamoto, W.El-Masry, M.Eto, H. Tokimura, T.Kaneko, Y.Obayashi, H.Mita,

66

Kanda, S.Yoshida, H.Fukuda and Y.Oguri, “Evolution of Interstellar Organics to Meteoritic andCometary Organics: Approaches by Laboratory Simulations”, International Astrobiology
Workshop 2013, Sagamihara, Nov.28-Dec.1,(2013).

7.

K. Kobayashi, H. Mita, H. Yabuta, K. Nakagawa, Y. Kawamoto, K. Kanda, E. Imai,
H.Hashimoto, S. Yokobori, A. Yamagishi, and Tanpopo WG, “pace Exposure of Amino Acids
and Their Precursors in the Tanpopo Mission Using the International Space Station”, 29th
International Symposium on Space Technology and Science, Nagoya, Jun.2-9,(2013).

8.

R. Imai, A. Fujimoto, M. Okada, S. Matsui, T. Yokogawa, E. Miura, T. Yamasaki, T. Suzuki, K.
Kanda, “Soft X-ray Irradiation Effect on the Surface and Material Properties of Highly
Hydrogenated Diamond-like Carbon Thin Films”, New Diamond and Nano Carbons
Conference, Singapore, May. 19-23,(2013).

9.

K. Kanda, K. Fukuda, K. Kidena, R. Imai, M. Niibe, S. Fujimoto, K. Yokota, M. Tagawa,“Hyperthermal Atomic Oxygen Beam Irradiation Effect on the Ti-containing DLC Film”, New
Diamond and Nano Carbons Conference, Singapore, May. 19-23,(2013).

10. M. Niibe, T. Kotaka, R. Kawakami, Y. Nakano, T. Mukai, ”Damage Analysis of N2
Plasma-etched n-GaNcrystal”, 6th International Symposium on Advanced Plasma Science andits Applications for Nitrides and, Nanomaterials, Nagoya, Japan., Mar. 2-6,(2014).

11. Masahito Niibe, Takuya Kotaka, Satoshi Jinguji, Shozo Inoue:, “Evaluation of BN Thin Film
Deposited on Cemented Carbide using Soft X-ray Absorption Spectroscopy”, 15th International
Conference on Toral Reflection X-ray Fluorescence Analysis and Related Methods (TXRF
2013), Sep. Osaka, Japan. Sep.23-27, (2013).

12. M. Niibe, K. Sano, R. Kawakami, Y. Nakano, ”Recovery of disordered spectra of Ti-L
NEXAFS in dry-etched TiO2 thin film by UV irradiation”, 15th International Conference on
Toral Reflection X-ray Fluorescence Analysis and Related Methods (TXRF 2013), Osaka,
Japan. Sep. 23-27, (2013).

13. Masahito Niibe, Keiji Sano, Takuya Kotaka, Retsuo Kawakami, Kikuo Tomonaga, Yoshitaka

67Nakano, “Etching Damage and Its Recovery by Soft X-ray Irradiation Observed in Soft X-ray
Absorption Spectra of TiO2 Thin Film”, 38th International conference on Vacuum Ultraviolet
and X-ray Physics, Hefei, China, Jul.12-19, (2013).

14. Masahito Niibe, Takuya Kotaka, Satoshi Jinguji, Shozo Inoue, “Characterization of BN Thin
Film Deposited on Cemented Carbide Using Near Edge X-ray Absorption Fine Structure
Spectroscopy”, 38th International conference on Vacuum Ultraviolet and X-ray Physics, Hefei,
China, Jul.12-19, (2013).

15. R. Kawakami, M. Niibe, H. Takeuchi, T. Shirahama, M. Konishi, Y. Mori, T. Yamada. K.
Tominaga, “Damage characteristics of 6H-SiC surface etched using capacitively-coupledhelium plasmas driven by a radio frequency power”, 12th International symposium on
Sputtering and Plasma Processes, Kyoto, Japan, Jul.10-12, (2013).

16. R. Kawakami, M. Niibe, Y. Nakano, M. Konishi, T. Shirahama, K. Tominaga and T. Mukai :“Damage Characteristics of n-GaN Thin Film Surfaces Etched by Ultraviolet Light-Assisted
Helium Plasmas”, The 4th International Symposium on Organic and Inorganic Electronic
Materials and Related Nanotechnologies (EM-NANO2010), Kanazawa, Jun, (2013).

17. Y.Nakano, M.Niibe, M.Lozac'h, L.Sang, M.Sumiya,"Electrical Investigation of p-i-n Junction
Based on Thick i-InGaN Film", 4th International Symposium on Organic and Inorganic
Electronic Materials and Related Nanotechnologies , . Kanazawa, Jun. (2013).

18. Y.Nakano, M.Niibe, M.Lozac'h, L.Sang, M.Sumiya,"Electrical Characterization of Thick
InGaN Films with Various In Contents for Photovoltaic Applications", 4th International
Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies
Kanazawa, Jun, (2013).

19. R. Kawakami, M. Konishi, Y. Mori, T. Shirahama, T. Yamada, K. Tominaga, M. Niibe, Y.
Nakano, T. Mukai, “Damage Characteristics of n-GaN Thin Film Surfaces Etched by N2
Plasmas” , The 40th International Symposium on Compound Semiconductors, Kobe, May(2013).

6820. R. Takahashi, T. Fukuoka, Y. Utsumi, “Microfluidic Devices with Three-dimensional Gold
Nanostructure for Surface Enhanced Raman Scattering”, IEEE International Conference on
Nano/Micro Engineered and Molecular Systems (IEEE-NEMS), pp722-725, Suzhou, China,
Apr. 7-10, (2013).

21. Hideki Kido, Ikuo Okada, Yuichi Utsumi, Hajime Mita, “Fabrication of PTFE micro fluidic
chipfor amino acid derivatization process”, International Conference on Electronics Packaging（ICEP2013）, pp881-884, Osaka, Japan , Apr. 10-12, (2013).

22. M. Ishizawa, H. Nose, Y. Ukita, and Y. Utsumi, “Proposal of a Novel Internally-Triggered
Automatic Flow Sequencing on Centrifugal Microfluidics”, International Conference on
Electronics Packaging（ICEP2013）, Osaka, Japan. pp.890-893, Apr. 10-12, (2013).

23. R. Takahashi, T. Fukuoka, Y. Utsumi, A. Yamaguchi, “Microfluidic Devices with SERS Active
Three-dimensional Gold Nanostructure”, International Conference on Electronics Packaging（ICEP2013）, pp.885-888, Osaka, Japan. Apr. 10-12, (2013).

24. R. Hara, R. Takahashi, T. Fukuoka, A. Yamaguchi, Y. Utsumi, “Three-dimensional Silver
Nanostructure for Surface Enhanced Raman Scattering”, International Conference on
Electronics Packaging（ICEP2013）, pp.885-888, Osaka, Japan Apr. 10-12, (2013).

25. Yamaguchi, K. Motoi, H. Miyajima and Y. Utsumi, “Broadband noise spectroscopy of anano-scale magnetic wire”, 10th International Workshop on High Aspect Ratio Micro and Nano
System Technology (HARMST2013), Apr.21-24, (2013).

26. M. Kishihara, H. Ikeuchi, H. Kido, Y. Utsumi, A. Yamaguchi, and I. Ohta, “Trial Fabrication of
180 GHz Waveguide by SR Direct Etching of PTFE”, 10th International Workshop on High
Aspect Ratio Micro and Nano System Technology (HARMST2013)，pp.114-115, Apr. 21-24,(2013).

27. Yasuto Arisue, Yuya Matsui, Tsunemasa Saiki, Kazusuke Maenaka, Akinobu Yamaguchi
and ,Yuichi Utsumi, “Powder Transport Direction Control Method by Using Drive Frequency
of Surface Acoustic Wave”, Proc. of 10th International Workshop on High Aspect Ratio Micro

69

Structure Technology (HARMST2013), pp.143-144, Berlin, Germany , Apr. 21-24, (2013).

28. H. Kido, I. Okada, H. Mita, A. Yamaguchi, Y. Utsumi, “Fabrication of amino acid analysis chipusing SR direct dry etching of PTFE”, 10th International Workshop on High Aspect Ratio
Micro Structure Technology (HARMST2013), pp.58-59, Berlin, Germany, Apr.21-24, (2013).

29. Y. Kang, R. Takahashi, T. Fukuoka, Y. Utsumi, Y. Haruyama, S. Matsui, “Fabrication of gold
nanoparticles pattern using imprinted HSQ pattern for SERS measurement”, 10th International
Workshop on High Aspect Ratio Micro Structure Technology (HARMST2013), pp.260-261,
Berlin, Germany, Apr. 21-24, (2013).

30. R. Takahashi, T. Fukuoka, Y. Utsumi, A. Yamaguchi, “Optimization of Surface Enhanced
Raman Scattering Active Three- Dimensional Gold Nanostructure”, 10th International
Workshop on High Aspect Ratio Micro Structure Technology (HARMST2013), pp.152-153, ,Berlin, Germany, Apr.21-24, (2013).

31. T. Yamane, S. Maekawa, I. Okada, Y. Utsumi, A. Yamaguchi, “Micro-Mirror Array Device for
Floating image manufactured by Synchrotron radiation”, 10th International Workshop on High
Aspect Ratio Micro Structure Technology (HARMST2013), pp.227-228, Berlin, Germany,
Apr.21-24, (2013).

32. R. Hara, R. Takahashi, T. Fukuoka, A. Yamaguchi, Y. Utsumi, “Fabrication of SARS Active
Three-dimensional Silver Nanostructure”, 10th International Workshop on High Aspect Ratio
Micro and Nano System Technology，pp.146-147, Berlin, Germany, Apr. 21-24, (2013).

33. T. Kunisada, H. Nose, M. Ishizawa, K. Kuroda, I. Okada, A. Yamaguchi and Y. Utsumi, “Bloodseparation chip for automated biological analysis”, 10th International Workshop on High
Aspect Ratio Micro and Nano System Technology，pp.194-195, Berlin, Germany, Apr.21-24,(2013).

34. T. Yamamoto, Y. Yoritama, T. Uchiyama, Y. Utsumi, A. Yamaguchi, “Fabrication andcharacterization of three-dimensional type micro magneto-impedance sensor”, 10th
International Workshop on High Aspect Ratio Micro and Nano System Technology，pp.225-226,

70

Berlin, Germany, Apr.21-24, (2013).

35. A.Yamaguchi and H. Miyajima, “Detection and stochastic analysis of magnetization fluctuation
in a nano-scale magnetic wire”, 8th International Symposium on Metallic Multilayers(MML2013), Kyoto, May 19-24, (2013).

36. T Yamamoto, Y. Yoritama, T. Uchiyama, Y. Utsumi, A. Yamaguchi, “Estimation of magnetic
impedance of a thin Fe19Ni81 wire using built up micro-scale pickup coil”,8th International
Symposium on Metallic Multilayers (MML2013), pp.288-289, Kyoto, May 19-24, (2013).

37. T. Kobayashi, S. Kamikawa, Y. Itou, H. Kanematsu and Y. Utsumi, International Conference on
Applied Mechanics, Materials, and Manufacturing (AMMM), Hong Kong, August 17-18,(2013).

38. R. Takahashi, R. Hara, T. Fukuoka, Y. Utsumi, A. Yamaguchi, “Microfluidic Devices withSERS Active Self-assembled Gold Nanostructures”, RSC Tokyo International Conference,
A222, Makuhari, Chiba, Sep.5-6, (2013).

39. T. Kobayashi, T. Yokoyama, Y. Utsumi, H. Kanematsu and T. Masuda, “Measuring the Ductilityof Organic Semiconductor Materials”, 19th International Vacuum Congress (IVC-19), Paris,
France, Sep. 9-13, (2013).

40. T. Saiki, Y. Arisue, Y. Matsui, K. Kasai, A. Yamaguchi, M. Takeo, K. Maenakab, Y. Utsumi,“ Design of Surface Acoustic Wave Actuator using Bragg Reflection for Powder Transport”,
Proc. of 39th International Conference on Micro and Nano Engineering (MNE2013),
pp.172-173, London, UK, Sep.6-19, (2013).

41. M. Takeo, S. Nii, D. Kato, S. Negoro, S. Yusa, T. Saiki,Y. Takizawa, Y. Utsumi, “Developmentof a Portable Fluidic and Detection System for ELISA in a 3-Dimensional

Microreactor”,

Proc. of 39th International Conference on Micro and Nano Engineering (MNE2013),
pp.178-179, London, UK, Sep.6-19. (2013).

42. T. Kobayashi, I. Hashimoto, R. Hashimoto, T. Takashina, H. Kanematsu and Y. Utsumi,

71

“Comparison of Heat Transfer Performance among Solid, Hollow and Sodium Encapsulated
Engine Valves”, The Irago Conference 2013, Tahara, Aichi, Japan, Oct. 24-25, (2013).

43. T. Kobayashi, Y. Sakate, R. Hashimoto, T. Takashina, H. Kanematsu, and Y. Utsumi, “Researchon Optimization of Cooling Structure of LED Element (The 2nd Report)”, The Irago
Conference 2013, Tahara, Aichi, Japan. Oct. 24-25,(2013).

44. T. Kobayashi, J. Okamoto, Y. Utsumi, H. Kanematsu and T. Masuda, “Measuring theDeformation characteristics of The Films for Flexible Organic Light Emission Diode”, The
Irago Conference 2013, Tahara, Aichi, Japan. Oct. 24-25, (2013).

45. T. Kobayashi, S. Ishikawa, R. Hashimoto, T. Takashina, H. Kanematsu, K. Mizuta and Y.
Utsumi, “ Optimizing Structure of LED Light Bulb for Heat Transfer (Part 2)”, The Irago
Conference 2013, Tahara, Aichi, Japan. Oct. 24-25, (2013).

46. T. Kobayashi, M. Kameyama, Y. Yabunaka, R. Hashimoto, T. Takashina, H. Kanematsu and Y.
Utsumi, “Creation of a Taguchi Method Education System using Simulation of Golf Ball
Trajectory”, The Irago Conference 2013, Tahara, Aichi, Japan. Oct. 24-25, (2013).

47. T. Kobayashi, T. Yokoyama, Y. Utsumi, H. Kanematsu, T. Masuda and M. Yamamoto,“Improvement of ductility of Organic Semiconductor Materials for Flexible Organic Light
Emitting Diode” 8th International Symposium on Advanced Science and Technology inExperimental Mechanics (8th ISEM '13-Sendai), Sendai, Japan, Nov. 3-6, (2013).

48. T. Kobayashi, H. Ikeda, Y. Utsumi, H. Kanematsu, T. Masuda and M. Yamamoto,“Measurement of Reduced Elastic Modulus of Organic Semiconductor Materials for Flexible
Organic Light Emitting Diode”, 8th International Symposium on Advanced Science andTechnology in Experimental Mechanics, Sendai, Japan, Nov. 3-6, (2013).

49. Y. Arisue, T. Saiki, A. Ymaguchi, and Y. Utsumi, “Study on Reflected Surface Acoustic Wave
Actuator for Powders using a Grating Reflector”, Proc. of 2013 International Microprocesses
and Nanotechnology Conference (MNC2013), 8P-11-88, Sapporo, Japan, Nov.5-8, (2013).

72

50. M. Ishizawa, T. Kunisada, K. Kuroda, C. Kataoka , A. Yamaguchi and Y. Utsumi, “Centrifugal
Microfluidic Chip for Blood Separation”, Proc. of 2013 International Microprocesses andNanotechnology Conference (MNC2013), 7P-7-107, Sapporo, Japan, Nov. 5-8, (2013).

51. R. Takahashi, T. Fukuoka, Y. Utsumi, A. Yamaguchi, “Optimization of SERS Active
Three-Dimensional Gold Nanostructure with High Sensitivity”, Proc. of 2013 International
Microprocesses and Nanotechnology Conference (MNC2013), 7D-6-2, Sapporo, Japan, Nov.
5-8, (2013).

52. T. Kobayashi, M. Fukushima, H. Kanematsu, Y. Utsumi and Y. Shimamoto, “Design andPrototyping of a Fuel Cell Controlling Equipment for Small Hybrid driving Airship System”,
International Conference on Control Engineering (ICCE 2014), Singapore, Feb. 9-10, (2014).

53. M. Ishizawa, Y. Arisue, I. Okada, A. Yamaguchi, and Y. Utsumi, “Novel Pressure-Controlling
Valve of Centrifugal Microfluidics”, PITTCON2014, pp.560-21P, Chicago, USA, Mar.2-6,(2014).

54. Yasuto Arisue, Masaki Ishizawa, Akinobu Yamaguchi, Yuichi Utsumi, “Proposal of a
Lab-on-a-CD for immunoassay using nonmechanical pump and valves”, PITTCON2014,
pp.820-9P, Chicago, USA, Mar.2-6, (2014).

55. T. Yamane, S. Maekawa, T. Fukuoka, I. Okada, Y. Utsumi, A. Yamaguchi, “Micro-Mirror Array
Device for Floating image manufactured by Synchrotron radiation”, PITTCON2014,
pp.1120-11P, Chicago, USA, Mar.2-6, (2014).

56. Takao Fukuoka, Ryo Takahashi, Yuichi Utsumi, Akinobu Yamaguchi, “SERS Active Three
Dimensional Gold Nanostructure”, PITTCON2014, pp.2380-1, Chicago, USA, Mar.2-6, (2014).

57. Takao Fukuoka, Ryo Takahashi, Yuichi Utsumi, Akinobu Yamaguchi, “Optofluidic Device withSERS Active Three Dimensional Gold Nanostructure”, PITTCON2014, pp.1430-3P, Chicago,
USA, Mar.2-6, (2014).

58. Takeo Watanabe, “UVL Activities in Japan”, 2013 International Workshop on EUV

73

Lithography, ,Maui, Hawaii, USA, Jun. 10 – 14, (2013).

59. Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita, “Recent Activities of the Actinic Mask
Inspection using the EUV Microscope at Center for EUVL”,

2013 International Workshop on

EUV Lithography, Maui, Hawaii, USA, Jun. 10 – 14, (2013).

60. Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita, “Recent Activities of the EUV Resist
Research and Development at Center for EUVL”, 2013 International Workshop on EUV
Lithography, Maui, Hawaii, USA, Jun. 10 – 14, (2013).

61. Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi
Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita, “EUV Resist Chemical Reaction
Analysis using SR”, The 30th International Conference of Photopolymer Science andTechnology, Chiba, Japan, Jun. 25 – 28, (2013).

62. Isamu Takagi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Yukiko Kikuchi, Eishi
Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita,“Comparison of Resist Family Outgassing Characterization”, The 30th International Conferenceof Photopolymer Science and Technology, Chiba, Japan, Jun. 25 – 28, (2013).

63. Takeo Watanabe, “Development of the EUV Resist at Center for EUVL”, The 3rd Sino-Japan
Symposium on Information and Electronic Materials, Shanhai, China, Sep. 9, (2013).

64. Takeo Watanabe, “Development of the EUV Resist at Center for EUVL”, The 3rd Sino-Japan
Symposium on Information and Electronic Materials, Beijing, China, Sep. 12, (2013).

65. Takeo Watanabe, Kazuya Emura, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi
Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita, “Chemical Reaction Analysis by
SR Absorption Spectroscopy to Increase the Acid Generation Efficiency of EUV CA Resist”,
66. 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, Oct. 6 – 10,(2013).

67. Kazuhiro Katayama, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Yukiko Kikuchi, Eishi

74

Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita,“Resist outgassing characterization of PAG-blended and PAG-bound systems”, ,2013
International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, Oct. 6 – 10,(2013).

68. Yukiko Kikuchi, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Kazuhiro Katayama, Eishi
Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita,“Study of the relation between Resist components and outgassing contamination species”, 2013
International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, Oct. 6 – 10,(2013).

69. Yusuke Tanaka, Tetsuo Harada, Takeo Watanabe, Yuichi Usui, and Hiroo Kinoshita,“ Development of Micro Coherent EUV Scatterometry Microscope for EUV Mask DefectCharacterization”, 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama,
Japan, Oct. 6 – 10, (2013).

70. Y. Tanaka, T. Harada, T. Watanabe, Y. Usui, and H. Kinoshita,“Observation Result of Phase

Defects using Micro Coherent EUV Scatterometry Microscope”, 25th Microprocesses andNanotechnology Conference, Sapporo, Hokkaido, Japan, Nov. 5 – 8, (2013).

71. Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi,
Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo
Kinoshita , “Resist outgassing characterization based on the resist compositions and process”,
SPIE Advanced Lithography 2013, San Jose, California, USA, Feb. 23 – 27, (2013).

72. S. Matsubara, H. Kudo, T. Watanabe, K. Emura, and H. Kinoshita “Novel EUV Resist Materials
based on Noria (Water-wheel Like Cyclic Oligomer) Derivatives with Pendant Ethoxy andAdamantyl Ester Groups”, 25th Microprocesses and Nanotechnology Conference, Sapporo,
Hokkaido, Japan, Nov. 5 -8, (2013).

73. K. Emura, T. Watanabe, M. Yamaguchi, H. Tanino, T. Fukui, D. Shiono, Y. Haruyama, Y.
Muramatsu, K. Ohmori, K. Sato, T. Harada, and H. Kinoshita, “Chemical Reaction Analysis of
PHS CA Resist System for EUVL using Soft X-ray Absorption Spectroscopy”, 25th75

Microprocesses and Nanotechnology Conference, Sapporo, Hokkaido, Japan, Nov. 5-8, (2013).

74. Tsuneo Terasawa, Tsuyoshi Amano,Takeshi Yamane, Hidehiro Watanabe, Mitsunori Toyoda,
Tohoku, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita,At wavelength observation ofphase defect embedded in EUV mask using microscope “technique”, SPIE Advanced
Lithography 2014, San Jose, California, USA, Feb. 23-27, (2014).

75. Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada,
Takeo Watanabe, and Hiroo Kinosihta, “Observation of phase defect on extreme ultraviolet
mask using an extreme ultraviolet microscope”, SPIE Advanced Lithography 2014, San Jose,
California, USA, Feb. 23-27, (2014).

76. Yukiko Kikuchi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Toshiya Takahashi,
Hiroyuki Tanaka, Eishi Shiobara, and Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo
Kinoshita, “Correlation study on resist outgassing by EUV irradiation tool and E-beamirradiation tool”,SPIE Advanced Lithography 2014, San Jose, California, USA, Feb. 23-27,(2014).

77. Tetsuo Harada, Yusuke Tanaka, Tsuyoshi Amano, Youichi Usui, Takeo Watanabe, and Hiroo
Kinoshita, “At wavelength observation of phase defects using focused lensless microscope”,
SPIE Advanced Lithography 2014, San Jose, California, USA, Feb. 23-27, (2014).

78. S. Ono, T. Hatsui, M. Omodani, T. Kudo, K. Kobayashi, N. Teranishi, T. Watanabe, T. Imamura,T. Ohmoto, and A. Iwata, “Noise Analysis of a Silicon-on-Insulator (SOI) Pixel Sensor with
500 μm Thick High Resistivity Silicon for X-Ray Free-Electron Laser Experiments”, IEEE
NSS/MIS, NP01-11, Seoul, South Korea, November, (2013).

79. M. Okada, Y. Haruyama, S. Matsui, “Abrasion Test for Antisticking Layer by Scanning Probe
Microscopy”, 57th International Conference on electron, ion, photon beam technology andfabrication, (EIPBN 2013), Nashville, USA, May.29, (2013).

80. T. Oyama, M. Okada, S. Iyoshi, Y. Haruyama, S. Matsui, H. Miyake, T. Mizuta, “Evaluation offluorine additive segregation in UV nanoimprint resin by X-ray photoelectron spectroscopy”,

7657th International Conference on electron, ion, photon beam technology and fabrication,(EIPBN 2013), Nashville, USA, May.29, (2013).

81. H. Wakaba, M. Okada, S. Iyoshi, Y. Haruyama, S. Matsui, “Selective Patterning of FluorinatedSelf-assembled Monolayer by UV Nanoimprinting for Directed Self-Assembly”, 57th
International Conference on electron, ion, photon beam technology and fabrication, (EIPBN
2013), Nashville, USA, May.29, (2013).

82. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, N. Kawatsuki, S. Matsui, H. Ono,
“Reorientation Evaluation of Photoinduced Liquid Crystalline Polymer Pattern Fabricated byHybrid Nanoimprinting with Linearly Polarized Ultra Violet Irradiation”, 57th International
Conference on electron, ion, photon beam technology and fabrication, (EIPBN 2013), Nashville,
USA, May.29, (2013).

83. S. Iyoshi, M. Okada, Y. Haruyama, S. Matsui, K. Kobayashi, S. Kaneko, M. Nakagawa, H.
Hiroshima, “Effects of Fluorosurfactants on Antisticking Layer Resistance in Repeated UVNanoimprint”, 57th International Conference on electron, ion, photon beam technology andfabrication, (EIPBN 2013), Nashville, USA, May.30,.(2013).

84. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, “Comparison Molecular Orientation of Photoinduced Liquid Crystalline Polymer
induced by Grapho epitaxy to that by Thermal Nanoimprinting”, 30th International Conferenceof Photopolymer Science and Technology (ICPST-30), Chiba, Japan, Jun.27, (2013)

85. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, “Molecular Orientation of 3D-photoinduced Liquid Crystalline Polymer Structure
fabricated by Thermal Nanoimprinting”, 30th International Conference of Photopolymer
Science and Technology (ICPST-30), Chiba, Japan, Jun.27, (2013).

86. T. Oyama, M. Okada, S. Iyoshi, Y. Haruyama, H. Miyake, T. Mizuta and S. Matsui, “Surface
Evaluation of Cationic UV-curable Resin with Fluorine Additive by XPS”, 30th International
Conference of Photopolymer Science and Technology (ICPST-30), Chiba, Japan, Jun.27,(2013).

7787. H. Wakaba, M. Okada, S. Iyoshi, Y. Haruyama and S. Matsui, “Release Property Evaluation of
Fluorinated Antisticking Layer by a Mixture of Release Agents”, 30th International Conferenceof Photopolymer Science and Technology (ICPST-30), Chiba, Japan, Jun.27, (2013).

88. T. Watanabe, K. Emura, D. Shiono, Y. Haruyama, Y. Muramatsu, K. Ohmori, K. Sato, T.
Harada and H. Kinoshita, “EUV Resist Chemical Reaction Analysis using SR”, 30th
International Conference of Photopolymer Science and Technology (ICPST-30), Chiba, Japan,
Jun.27, (2013).

89. N. Kawatsuki, Y. Inada, K. Goto, M. Kondo, Y. Haruyama, and S. Matsui, “NEXAFS Study on
Photoalignment of Liquid Crystalline Polymeric Films”, 17th International Symposium on
Advanced Display Materials and Devices (ADMD2013), Shanghai, China, Jun.28, (2013)

90. Y. Haruyama, M. Okada, E. Nishioka, M. Kondo, N. Kawatsuki, and S. Matsui, “NEXAFS
studies of photoreactive liquid crystalline polymer”, 8th International conference on Vacuum
Ultraviolet and X-ray Physics (VUVX-38), Hefei, China, Jul.15, (2013).

91. M. Okada, R. Hosoda, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki, and S.
Matsui, “Enhanced molecular orientation of photoreactive liquid crystalline polymer inducedby thermal nanoimprinting compared to graphoepitaxy”, 39th International Conference on
Micro and Nano Engineering (MNE2013), London, United Kingdom, Sep.19,(2013)

92. M. Okada, R. Hosoda, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki, and S.
Matsui, “Molecular Orientation of Photoreactive Liquid Crystalline Polymer Induced by
Nanoimprint-graphoepitaxy”, 12th International Conference on Nanoimprint and Nanoprint
Technology (NNT2013), Barcelona, Spain, Oct.22, (2013).

93. K. Emura, T. Watanabe, M. Yamaguchi, H. Tanino, T. Fukui, D. Shiono, Y. Haruyama, Y.
Muramatsu, K. Ohmori, K. Sato, T. Harada and H. Kinoshita, “Chemical Reaction Analysis of
PHS CA Resist System for EUVL using Soft X-ray Absorption Spectroscopy”, 26th
International Microprocesses and Nanotechnology Conference (MNC 2013), Sapporo, Japan,
Nov.17, (2013).

7894. S. Iyoshi, M. Okada, K. Kobayashi, S. Kaneko, T. Katase, K. Tone, Y. Haruyama, M. Nakagawa,
H. Hiroshima and S. Matsui, “Study of the Resistance of Antisticking Layer on Repeated UVNanoimprint”, 26th International Microprocesses and Nanotechnology Conference (MNC2013), Sapporo, Japan, Nov.17, (2013).

95. N. Sugano, M. Okada, Y. Haruyama and S. Matsui, “HSQ Replica Mold with Release Property
fabricated by Room Temperature Nanoimprinting”, 26th International Microprocesses andNanotechnology Conference (MNC 2013), Sapporo, Japan, Nov.17, (2013).

96. T. Oyama, M. Okada, S. Iyoshi, Y. Haruyama, H. Miyake, T. Mizuta and S. Matsui, “XPS
Analyses of Ultrathin UV Nanoimprint Resin added with Fluorine Additive”, 26th International
Microprocesses and Nanotechnology Conference (MNC 2013), Sapporo, Japan, Nov.17,(2013).

97. M. Okada, Y. Haruyama and S. Matsui, “Evaluation of Abrasion Resistance for Antisticking
Layer by Scanning Probe Microscopy”, 26th International Microprocesses and Nanotechnology
Conference (MNC 2013), Sapporo, Japan, Nov.8, (2013).

98. M. Okada, R. Hosoda, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.Matsui,“Material Dependency of Molecular Orientation in Liquid Crystalline Polymer induced by
Nanoimprint-graphoepitaxy”,

26thInternational

Microprocesses

Conference (MNC 2013), Sapporo, Japan, Nov.8, (2013).

79

and

Nanotechnology

80