ＣＯＮＴＥＮＴＳPREFACE····································································································································································ⅰ

CONTENTS·································································································································································ⅲ

ORGANIZATION ·······················································································································································ⅳ

CURRENT STATUS OF NewSUBARU
NewSUBARU Storage Ring ·····························································································································································Beamlines ······························································································································································································14

RESEARCH ACTIVITIESDevelopment of Tera-Hertz Light Sources at Compact Electron Linear Accelarator LEENA ························································
Laser-plasma extreme ultraviolet source at 6.7nm using a rotating cryogenic Xe target ································································
Effective collision cross section of xenon plasma debris in argon buffer gas ····················································································
EUV interference Lithography for 1X nm ···········································································································································Imaging of EUV-mask patterns using coherent EUV scatterometry microscope based on coherent diffraction imaging ·············
Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry
Microscope at New SUBARU ······················································································································································Fabrication of Carbon X-ray Mask for High Aspect Ratio X-ray Diffraction Grating ····································································
Fabrication of High Aspect Ratio Au microstructures using Direct Electroforming on Si microstructures ···································SERS Active Three Dimensional Gold Nanostructure Fabrication for Optofluidic Device ·····························································
Fabrication of Integrated Magneto Impedance Sensor forMedical Monitoring ···············································································
Blood separation chip for automated biological analysi ····················································································································Fabrication of fluorocarbon resin micro fluidic chip for processing of amino acid derivatization ·················································
Contamination-Free Internally-Triggered Automatic Flow Sequencing for Microfluidic ·······························································
Reflected Surface Acoustic Wave Actuator Using Micro Groove ······································································································
Damage Analysis of n-GaN Etched with He and N2 Plasmas ············································································································Investigation of analyzing depth of N-K absorption spectra measured using TEY and TFY methods ·············································
Characterization of Electronic States of Ion-irradiated Multi-walled Carbon Nanotubes and Multi-layer Graphens using SoftX-ray Absorption Spectroscopy ···················································································································································Electronic structure of fluorinated diamond-like carbon thin films as a function of annealing temperature using photoelectronspectroscopy ·················································································································································································K and L-edge Spectra of Several Sulfur Compounds ··························································································································
Crystallization Mechanism of a –SiGe Graded Films by Soft X-ray Irradiation ··············································································
Thermal Durability of FIB-DLC Films Containing W ·······················································································································
Comparison of Photon Flux of a BL06 with that of the Sun ···············································································································Stability and alteration of amino acids and related compounds against soft X-rays in interplanetary space ·································
Effective Modification in Silica-Based Films by Synchrotron Radiation ···························································································
Release property of thin PDMS layer for UV nanoimprinting ···········································································································

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ACADEMIC DEGREES ············································································································································85

COVER PHOTOGRAPHS ········································································································································87

EDITORIAR BOAD88···················································································································································ⅲ