NewSUBARU Storage Ring
Y. Shoji

The total operation time in FY2009 was 2544 hrs,
105% of that of FY2008, including the beam downtime. Fig. 1 shows the breakdown. The beam downtime includes not only the down by a failure, butalso off-beam periods by a beam abort or others dueto the beam instability. The normal user time in thisFY, 1670 hrs, was about 109% of that in FY2008.
Time for machine study and special users was 80%of that in FY2008.

Storage Ring Parameters
The machine parameters of the 1.5 GeV storage
ring remain the same as those of the previous year.
They are listed in Table I.
Table I Main parameters of the NewSUBARU
storage ring in FY2009.
Circumference
118.73 m
Bending lattice typemodified DBA
Number of bending cells 6
Straight sections
4m X 4, 15m X 2
Bending radius
3.22 mInjection energy
1.0 GeV
Maximum energy
1.5 GeV
RF frequency
499.955 MHz
Betatron tune
6.30 (H), 2.21 (V)Momentum compaction factor
0.0014
Electron energy
1.0 GeV 1.5 GeV
RF voltage
140 kV 260 kV
Natural energy spread
0.047% 0.072 %Natural emittance
38 nm 67 nm
Maximum beam current 500 mA

Machine Troubles
The machine troubles in FY2009 are listed inTable II. Many of sources of the failures in FY2008
were eliminated. The biggest failure was a vacuum
break down by a miss-operation at BL09.
Machine Study and Special User Time
Table III shows the list of machine studies in
FY 2009. One special theme, a research related toa production of Laser-Compton backscattering ray and its use, took about 1/3 of the machine
study time.
Most of the study reports are open to the public
on the home page of NewSUBARU.

Operation Status
The ring has two user-time operation modes, 1.0
GeV top-up operation mode and 1.5 GeV operation
mode. Basic operation time is 9:00 - 21:00 of
weekdays. Monday is for machine R&D, Tuesday isfor 1.5 GeV user time, Wednesday and Thursday arefor 1.0 GeV top-up user time, Friday is for 1.0 GeV
or 1.5 GeV user time. Night period or weekend isused for machine study and user time with thespecial mode, single bunch operation and LaserCompton Gamma ray, if necessary.

Accelerator Improvements
The ring had several improvements in FY2009.
Bunch current monitor, installed in FY2008
was organized to a new bucket filling control system.
It controls the bucket-selector for the injection andrealizes a wanted bucket filling.
The wave form monitor system, using LabView,
is installed for the pulse bump magnet. The system
can detect very rare miss-firing and abnormal wave
deformation of pulse magnets.
The KEK-type XBPM was installed at BL10. It
monitors vertical x-ray position from the bending
magnet. It is expected to give information for the
improvement of stability of the synchrotron
radiation at beam lines.
The COD correction system started continuousworking. It operates slow COD correction routine
for every one minitues. The software has many subprograms, which stops the continuous operation.
They automatically stop the COD correction during
the rapid injection, during the acceleration, andwhen the correction does not work properly by
unknown reasons.
The visible light port SR5 for beam diagnostics,
built in FY2008, was upgraded. It enables thedetection of THz radiation at outside of the radiation
shield. The corona graph elements were installed asa beam halo monitor.

beam down time by machine troubles
64 hrs (2%)
machine tuning
371 hrs(15%)

machine study &special user time
439 hrs(17%)

user time
1670 hrs(66%)

Fig. 1 Operation time in FY2009.

1

Table IIGroup
OperationRF

Beam transport
VacuumRadiation safety

Table III

Machine trouble in FY2009.

Failure/trouble
Miss-operation
Beam loss by a beam instabilities
Interlock of circulator arc
Interlock of klystron vacuum
Klystron window chiller
Orbit feed-back
Vacuum leak at BL09
Failure at BL02

beam down time (hr)
2
3.6
0.3
6
1
1
42
2

List of machine studies in FY2009. The unit of study time is counted by shifts (typically 12 hrs).

R＆D theme and special user mode
responsible person
Parameter tuning for 1.5 GeV acceleration
S. Hashimoto
Negative alpha-p operation
S. Hashimoto
Test of wave form monitor for pulse bump magnets
S. Hashimoto
Betatron tune feedback system
S. Hashimoto
Test of new COD control system
Y. Minagawa
Test of new filling control system
Y. Minagawa
Laser-Compton backscattering -rays (incl. Nuclear Transmutation)
S. Miyamoto
Test of bunch-by-bunch feedback system
T. Nakamura
Radiation shield for L4BT beam profile monitor
Y. Shoji
Vertical beam oscillation at the beam injection
Y. ShojiCommissioning of new profile monitor port SR5
Y. ShojiCommissioning of sextupole windings in the invert bends
Y. ShojiTransverse beam matching at the beam injection
Y. Shoji
Effect of the magnetic shield for the DC septum stray field
Y. ShojiStored current dependence of COD
Y. Shoji2study shift
3
2
1
6
1
1
19
1
1
1
2
8
7
1
1

Beamlines
Takeo Watanabe and Hiroo Kinoshita

optics for practice use. Furthermore, BL09C beamline
branched from BL09B for the usage of the EUV
interference lithography to evaluate and develop EUV
resist.
BL02 beamline was constructed for the usage of LIGA
in 2003.
BL05 beamline was constracted in response to ademand in the industrial world, that is enhancement of theanalysis ability in the soft X-ray region with thedevelopment of nanotechnology.
The arrangement of the beamlines in the NewSUBARU
synchrotron radiation facility is shown in Fig.1.

Total eight beamlines are operating in the
NewSUBARU synchrotron facility. Four beamlines of
BL01, BL03, BL06 and BL11 were constructed until 1999.
Three beamlines of BL07, BL09 and BL10 were started theoperation from 2000.
BL03B beamline branched from the BL03 beamline
propose for the usage of the EUVL (extreme ultraviolet
lithography) microscope for the EUVL finished mask
inspection.
BL09B beamline branched from BL09 beamline
propose for the usage of the advanced point diffraction
interferometry for the test alignment of the EUVL imaging

Fig. 1 Beamline arrangement in NewSUBARU.

I. BL01
was installed at this straight section. Upstream side ofthis beamline (BL01B) is intended to be used forvisible and infrared light generated from FEL or SR.

BL01 is a beamline for research and developing newlight sources. This beamline is one of two longstraight section on NewSUBARU. Optical klystron3

gamma-ray irradiation experiments. Specificationsof this gamma-ray source are listed in Table 1.

Downstream side of this beamline (BL01A) is used
for laser Compton scattering gamma-rays source.
Gamma-ray beamline hutch just outside of thestorage ring tunnel was constructed in 2004 for

Table 1. Specification of BL01 gamma beam
CO2 laser
Gamma energy : 1.7 - 4 MeV
Gamma flux* : 9 x106 /s
10.52 m
: 6 x105 /s (1.5-1.7 MeV)
5W
(with 3mm collimator)
Gamma energy : 17 - 40 MeV
Nd laser
Gamma flux* : 7.5 x106 /s
1.064 m
: 3 x105 /s (15-17 MeV)
0.532 m(with 3mm collimator)
5W*Electron beam energy : 1-1.5 GeV*Electron beam current : 250 mA
gamma-ray beam divergence : 0.5 mrad
II. BL02
x-ray mirrors (plane and cylindrical mirror) and Be film
filters. The horizontal angle of the outgoing SR could beobtained up to 12.5 mrad, which corresponds to thehorizontal size of 220 mm (A4 horizontal size) at the
exposure position. The second characteristic performanceof the beamline is the high efficiency differential pumping
system. This was necessary for maintain the vacuum
difference between the storage ring (<10-9 Pa) and theend-station (<10-9 Pa) at which gasses for substrate coolingwill be introduced in the exposure apparatus.
The flexibility for the shapes and functions of
microstructure will be enlarged by achieving 3D
microfabrication process using multi step exposure atvarious configuration between x-ray mask and substrates.
The relative positions between x-ray mask and substrates,
tilt and rotation angle to the SR incident direction can be
moved simultaneously during SR exposure using 5 axis
stages. The movement of each axis is controlled by the PC
in terms of the scanning speeds, scanning length, andrepetition number. In order to decrease the heat load ofsample substrate suffered during SR irradiation helium
introduction and substrate cooling mechanism were alse
equipped. Specification of spectrometer is listed in Table 2.

The LIGA (abbreviated name of Lithogaphic,
Galvanoformung and Abformung) process which consistsfrom deep x-ray lithography, electroforming, and molding
process is one of the promising candidates for such 3D
micofabrication. More than hundreds aspect ratio for
microstructure can be attained by the usa of the higher
energy x-rays (4-15 keV) from synchrotron radiation (SR)with deeper penetration depth to the photosensitive resist.
In this system we have succeeded to enlarged the exposurearea up to A4 size and the fabrication dimension from
submicron to millimeter by varying the energy of the x-ray
source in accordance with the size of desired microparts.
Micostructure with high aspect ratio over several hundreds
will bi achieved using the x-rays over 10 keV since highenergy x-ray has deep penetration depth to thephoto-sensitive resist materials. Whereas, in the case oflithography for low energy x-rays from 1 keV to 2 keV,submicron structures with high aspect ratio will beachieved using the x-rays mask with precise line-width andthinner absorber, since low energy x-rays has low
penetration depth. Based on this principle, the beamilne for
x-ray exposure have constructed with continuous
selectivity of x-rays frpm 100 eV to 15 keV by using theTable 2. Specification of the LIGA exposure system
OpticsPlane and cylindrical mirror, Be filters
Exposure energy
100 - 2 keV, and 4 – 15 keV
Exposure method
Proximity and multi step exposure
Wafer size
A4 or 8 inch
Exposure area
230 mm(H) 300 mm(V)
Exposure environment< 1 atm (He-gas)

4III. BL03
BL03 is a beamline for the developing the next
generation lithographic technology so called extreme
ultraviolet lithography (EUVL). The exposure tool isinstalled at the end station. Using this exposure tool, theresearch and development of the next generation
lithography such as the less than 70 nm node is going on
process. The exposure wavelength is 13.5 nm.
The semiconductor industry plays a very important rolein the information technology (IT). In 2006, 256 Gbit
DRAM with a gate length of 70 nm will be demanded in
the IT industry. The extreme ultraviolet lithography(EUVL) is a promise technology for fabricating a finepattern less than 70 nm. To meet this schedule, thistechnology has to be developed in the pilot line until 2004.
As for the practical use, it is very important that both toachieve large exposure area and to fabricate fine patterns.
Therefore, at Himeji Institute of Technology, large
exposure field EUV camera consists of three asphericalmirrors was developed. First in the world, we fabricated 60
nm line and space pattern in the large exposure area of 10
mm×10 mm on a wafer. Furthermore, BL03B beamline
branches from the BL03 beamline propose for the usage of
the EUVL microscope for the EUVL finished mask
inspection.

Table 3. Spectification of the exposure tool (ETS-1)
Imaging optics
Three aspherical mirrors
Exposure wavelength13.5 nm
Numerical aperture
0.1
Demagnification
1/5
Resolution
60 nm
Depth of focus
0.9 μmExposure area (static)
30 mm1 mm
Exposure area (scanning)
30 mm28 mm
Mask size
4 inch, 8 inch, and ULE 6025
Wafer size
8 inchExposure environment
In vacuum

IV. BL05
BL05 was constructed in response to a demand in theindustrial world, that is enhancement of the analysis ability
in the soft x-ray region with the development of
nanotechnology. BL05 consists of two branch lines for use
in the wide range from 50 eV to 4000 eV. BL05A and
BL05B are designed to cover the energy range of
1300-4000 eV and 50-1300 eV, respectively. The incident
beam from the bending magnet is provided for two branchlines through different windows of a mask. Therefore,
these two branch lines can be employed simultaneously.

1) The double crystal monochromator was installed at
the BL05A. InSb crystals and Si crystals are prepared for a
double-crystal monochromator. Toroidal mirrors are used
as a pre-mirror and a focusing mirror of BL05A. XAFS
measurement in the total electron yield mode andfluorescence XAFS measurement using SSD (SII Vortex)
can be performed. The fluorescence XAFS spectra can bemeasured for samples at the end station filled with He gas.

Table 4. Monochromator specification
Monochromator
Double crystal monochromator
Monochromator crystals
InSb(111), Si(111)Energy range
1300-4000 eV
E/䏓E=3000
Resolution(M0), a second mirror (M1), an entrance slit (S1), a
pre-mirror (M2), and three kinds of plane grating (G), an
exit slit (S2) and a focusing mirror (M3). The including
angle of the monochromator is 175°. Two measurement
chambers are prepared at the end station of BL05B. The

2) The constant-deviation monochromator consisting of ademagnifying spherical mirror and a varied-line-spacing
plane grating (VLSPG), which can provide high resolution,
simple wavelength scanning with fixed slits, was mounted
on BL05B. The optical system consists of a first mirror

5electron analyzer (VG Sienta, R3000) in an ultra
high-vacuum chamber. The chambers can be replaced byeach other within 1 hour.

XAFS spectra in the total electron yield mode andfluorescence XAFS spectra using SDD (EDAX) can bemeasured in a high vacuum chamber. In addition, thephotoelectron spectrum can be measured using spherical

Monochromator
Grating
Energy range
Resolution

Table 5. Monochromator specification
Varied-line-spacing plane grating monochromator
100 l/mm, 300 l/mm, 800 mm/l
50-1300 eV
E/䏓E=3000

V. BL06
BL06 has been mainly developed for irradiation
experiments such as photochemical reaction, SR-CVD,
photo-etching, surface modification. The white radiation
beam from bending magnet is introduced to the sample
stage using a pair of mirror, whose incident angle was 3r.
The SR at BL06 sample stage had a continuous spectrum
from IR to soft x-ray, which was lower than 1 keV. A

differential pumping system can be utilized forexperiments in a gas atmosphere, which is difficult in thesoft x-ray region. A sample holder can install four pieces ofsamples at a time. By using heater set in the sample holder,
the sample can be heated from room temperature to 220qC.
The temperature of sample is monitored using a Cr-Al
thermocouple mounted on the sample holder.

VI. BL07A and BL07B
This beamline was designed for the development of
new materials by SR technology. This beamline consists of
two branch lines, which are provided with an incident
beam from a 3-m undulator by switching the first mirror.
One of them is a high photon-flux beamline with amultilayered-mirror monochromator for the study of
SR-process (BL07A) and another is a high-resolution
beamline with a varied line spacing grating
monochromator for the evaluation of nano-structure
characteristics by SR-spectroscopy (BL07B). The usefulrange of emitted photons from 50 to 800 eV is covered atboth beamlines. The light source of BL07 is a 3-m lengthplanar undulator, which consists of 29 sets of permanent
magnets, a period length of which is 76 mm. The incident
beam from the undulator is provided for two branch lines
by translational switching of first mirror.

Energyrange(eV)Material

50-60
60-95

Mo/Si

90-140140-194
190-400
400-560

Mo/B4C
Ni/C

1) BL07A
The multilayered-mirror (MLM) monochromator,
which has high reflectivity in the soft X-ray region, wasinstalled at the BL07A. It consists of a switching mirror
chamber, a slit chamber, a MLM monochromator, a filter
chamber and a reaction chamber. To obtain a large photon
flux, we decided to use only first mirror (switching mirror),M0, for focusing. The MLM monochromator is designed tocover an energy range of up to about 800 eV by
combination of three kinds of mirror pairs with 4 kinds offilter. The flux deliver by this design is estimated to be
between a maximum of 1017 photons/s at 95 eV and aminimum 2u1014 photons/s at 300 eV for a 500 mA ring
current.

Table 6. Summary of BL07A.
Multilayer mirror
spacing
Thickness number of
Ratio
layers
20 nm
11 nm
5 nm

0.8

20

0.5

25

0.5

60

550-800

6'E/E

Filtermaterial thickness
Al

100 nm

None



Ag

100 nmCr

500 nmNi

500 nm

6.2 %
3.3 %
2.5 %

focusing mirror (M2). The monochromator is designed tocover the energy range 50-800 eV with three gratings, ofwhich including angle are 168q. The VLSPG has been wellknown to obtain high resolution in extreme ultraviolet
region by diminishing various kinds of aberration. The
total resolving power about 3000 can be realized in thewhole energy region.

2) BL07B
The constant-deviation monochromator consisting of ademagnifying spherical mirror and varied line spacing
plane grating (VLSPG), which can provide to highresolution, simple wavelength scanning with fixed slits,
was mounted on BL07B. The optical system consists of afirst mirror (M0), a entrance slit (S1), a premirror (M1),and three kinds of plane grating (G), an exit slit (S2) and a

Table 7. Monocromator specification
Mount type
Hettrick-Underwood type
Grating G1, G2, G3
Plane VLS (600 l/mm, 1200 l/mm, 2400 l/mm)
Energy range
50-150 eV, 150 – 300 eV, 300-800 eVResolving power (E/ǼE)㹼3000

VII. BL9A purpose of this beamline is studies on a soft x-ray
interferometry or a holographic exposure experiment withmaking use of highly brilliant and coherent photon beams
radiated from 11 m long undulator in NewSUBARU.
BL09 consists of M0 mirror, M1 mirror, G grating andM2 and M3 mirror. M0 and M3 mirrors are used forhorizontal deflection and beam convergence, M1 is usedfor vertical beam convergence at the exit slit, and M2 isused for vertical deflection and beam convergence. A
monochromator is constructed by M1 and a plane grating.
The maximum acceptance of the undulator beam is 0.64
mrad in horizontal and 0.27 mrad in vertical. The

acceptance can be restricted by 4-jaw slits equipped at
upstream of the M0 mirror.
BL09B beamline branched from BL09 beamline for theusage of the advanced point diffraction interferometry forthe test alignment of the EUVL imaging optics for practiceuse.
BL09C beamline branched from BL09B beamline forthe usage of the EUV interference lithography for theevaluation of the exposure characteristics of EUV resist.
Coherence length of 1 mm at the resist exposure position
was achieved using BL09C beamilne.

Table 8. Monochromator specification
Mount type
Hettrick-Underwood type
Grating
Plane VLS (900 l/mm)
Energy range
50 – 600 eVResolving power (E/ǼE)㹼3000

Function
SampleBeam size
Degree of Vacuum
Photon number

Table 9. Specification of the BL09 End Station
Extreme ultra-violet (EUV) point diffraction interferometry
EUV imaging optics. Presently, Schwarzschild optics.
80(w) x 120(h) ȣm
5 10-4 Pa (differential evacuation system, upstream)
1.2 1013 photons/sec, at 95 eV, Ie=40mA

VIII. BL10
BL10 is for the global use in the Himeji Institute ofTechnology. M0 mirror is used for horizontal deflection andbeam convergence, M1 is used for vertical beam
convergence at the exit slit, and M2 is used for verticaldeflection and beam convergence. A monochromator isconstructed by M1 and a plane grating. At the beginning,the multiplayers reflectiveity measurement was carried out
at this beamline. The characteristics of this beamline andthe result of the Mo/Si multiplayers measurement are
carried out for the development of the EUVL mask

7techmology.
BL10 utilizes a monochromator of the varied line
spacing plane grating monochromator (VLS-PGM). Theline density of the monochromator in central region of thegrating is 600 lines/mm. The reflectometer is a two axis
vacuum goniometer using two Huber goniometers. One
axis carries the sample, which may for examplee be amirror at the center of the reflectometer vacuum tank(T-motion). The other (M-motion) carries the detector on arotating arm. In addition there are through-cacuum linear
motions to translate the sample in two orthogonal directions(x,y). All motors are controlled by computer. The sample
itself is mounted on a kinematic holder. The controlstage
monochromator rotation, and data analysis were programusing LABVIEW software. The reflectivity result obtainedat BL10 has a good agreement with that at LBNL.

Table 10. Monochromator specification
Mount type
Hettrick-Underwood type
Grating
Plane VLS (600 l/mm)
Energy range
50 – 600 eVResolving power (E/ǼE)㹼1000

IX. BL11
A beam line BL11 is constructed for exposure Hard
X-ray Lithography (DXL) in the LIGA (German acronym
for Lithographite Galvanoformung and Abformung)process. LIGA process, that utilizes a useful industrial
application of SR, is one of the promising technologies forfabrication of extremely tall three-dimensional
microstructures with a large aspect ratio. This process wasinvented at the Institut Fur Mikrostrukturtechnik (IMT) of
the Karlstuhe Nuclear Center (KfK) in 1980.
Microstructures with height of over a few hundreds μm
have been widely applied to various fields such as
micro-mechanics, micro-optics, sensor and actuator
technology, chemical, medical and biological engineering,and so on. This beam line was designed by the criteria ;photon energy range 4 keV to 6 keV, a beam spot size on
the exposure stage t 50u5 mm2, a density of total
irradiated photons t 1011 photons/cm2. BL11 of anabsorber chamber, a first-mirror chamber (M1), a
second-mirror chamber (M2), a 4-way slit chamber, a Be
window chamber, and an exposure chamber. The second
pre-mirror is bent elliptically using a bending mechanism.

Fine bending adjustment of the M2 mirror can be made in
the UHV by the pulse motor. The LIGA process needs thephoton energies of 3 keV to 6 keV, the optics of a LIGA
beam line generally employ a Pt monolayered-mirror anda Be window, which cuts off low-energy photons. The
reflectivity of a Pt-coated mirror is about 55 % in therange of photon energy from 2 keV to 4 keV, however, it
drops to 30 % at the photon energy of 6 keV. Therefore,
new materials with a high reflectivity must to be found for
Deep X-ray lithography (DXL) in this energy range. We
propose the use of a Ni/W/C multilayered-mirror with agraded d-spacing in the range of photon energy from 3 eV
to 6 keV. The calculated reflectivity of the Ni/W/C
multilayered-mirror is higher than 56 % at the photon
energy of 6 keV with a glazing incident angle of 0.8
degrees, and photons that have higher photon energy than
6 keV can be removed A 200 μm-thick beryllium (Be)window in a Be window chamber is used to separate theultra-high vacuum part from the low vacuum part and to
cut off low-energy photons.

Table 11. Specification of the LIGA exposure system
Exposure method
Proximity exposure
Wafer size
4 inch50mm(H)80mm(V)Exposure area
Exposure environment< 1atm (He-gas)

8

Improvement of beam injection using the injection bump
waveform monitor at NewSUBARUS. Hashimoto, T. Shinomoto#, Y. Minagawa#, S. Miyamoto
LASTI, University of Hyogo#
JASRI / SPring-8
Abstract
Although stable beam injections are necessary for the top-up operation of a storage ring, timing
jitters and misfires were often observed in injection bump waveforms in NewSUBARU storage
ring. Using a bump waveform monitor, we could find that timing jitters come from a timing
signal module. By replacing this module, timing jitters can be drastically reduced from 1.9 % to
0.2 %. And no misfire of bump waveforms is observed now, although it occurred about ten times
a day before. We are now always watching the waveforms of injection bump magnets by thismonitor system to keep the stable top-up operation.
before waveform analyzing.

Introduction
In the NewSUBARU facility the top-up
operation has been performed in the 1.0 GeV user
time. The efficiency of beam injection has to bestably high for keeping the stored current constant.
To realize this purpose, many kinds of stabilities
are required, that is, stabilities of injection beamfrom linac, a pulse septum magnet, and injection
bump magnets and so on.
In general, electron beams are injected to a
storage ring using four pulse magnets called“bump” magnets, which make closed orbit ofcirculating beams at the injection point to shift
horizontally for a very short period so that a beamfrom an injector can be successfully injected.
In the NewSUBARU storage ring, the numberof beam injection exceeds over one thousand aday. Looking at bump waveforms in detail, little
discrepancies in waveforms can be found. We
developed bump waveform monitor [1,2] to watch
bump waveforms. In this paper we report the
improvement of the timing jitter and the misfireof bump waveforms by using this monitor.

Fig.1.
Electron beam injection from theSPring-8 linac to the NewSUBARU storage ringusing four bump magnets.

Injection bump waveform monitor system
To get bump waveforms, an oscilloscope(Agilent TDS3054B) acquires monitor outputs ofpower supplies for bump magnets as shown in Fig.
1. Signals are externally triggered with beam
injection pre-trigger signal. The oscilloscope isconnected to a GPIB-Ethernet converter. A PC
in the control room can communicate with theoscilloscope through local area network.
A software program developed withLabVIEW acquires, inspects in real-time andsaves waveform data (Fig. 2).
The other
program analyzes each waveforms saved in PC
and makes statistical analysis. This program cancalculate a rise time (10-90%), peak-height,
peak-position of each wavelength and show these
distributions. Because bump is a high-voltage
and pulsed magnet, acquired signals may be noisy.
For noise reduction, data smoothing can be used

Fig.2. Front panel of the program for dataacquisition, real-time inspection and data save.

9

narrow and its standard deviation was 0.2 %.
Thus the timing jitter was drastically improved byreplacement of the troubled module.

Finding a trouble source with the monitor
The timing jitter and the misfire of bump
waveforms may come from those of timing
signals, in addition to failures of power supplies
for bump magnets. To find the trouble source intiming signals, we checked signals form several
NIM modules such as counter, FAN in/out,
logical delay, and so on with the waveform
monitor. The upper and lower limits in themonitor are correctly configured for testing digital
signal waveforms.
As results, we found that a counter module(508 MHz, 30 bit counter) was a trouble source.
After the new module replaced this one, no
misfire of trigger signal form the module wasobserved.

Improvement of misfire of bump waveform
Although no misfire was observed at the newmodule after the replacement, misfire of bump
waveforms was still observed about ten times aday.
However, misfire of bump magnets
suddenly disappeared in March 2010.
We
suspicious that it was due to some troubles in theother modules or a loose connection of cables.
Summary
Various kinds of high stabilities are necessary
for the stable top-up operation of storage rings.
In the NewSUBARU storage ring we could findthe source of timing jitter and misfire of bump
waveform using the bump waveform monitor.
By replacing the troubled timing module, the jitter
becomes drastically small. Although misfire of
the bump waveform was observed about ten times
a day after the replacement, this suddenly
disappeared. The reason may be due to the othertiming module or a loose connection of cables,etc.
Now we are always watching bump
waveforms during user operation using the bump
waveform monitor. If there is something wrong
in beam injection, quick search of trouble sourcesand quick recovery can be possible.

Improvement of timing jitter of bump
waveform
Peak-height, peak-position (timing jitter) andrise-time before and after the replacement of thetroubled counter module are shown in Fig. 3.
Standard deviations of these distributions are also
shown in Table. I.

References[1] T. Shinomoto et al., Proc. of Particle
Accelerator Society of Japan, (2009).
[2] S. Hashimoto et al., LASTI Annual report,
vol.9, (2009).

Fig.3. Discrepancies of bump waveforms in
one day. Peak-height (top), peak-position(middle) and rise-time (bottom) are shown before(left) and after (right) replacement of the countermodule. After the replacement, timing jitters ofbump waveforms were drastically reduced.
Standard deviation (%)
Peak position
Peak height
Rise time

Before
1.9
0.8
1.2

After
0.2
0.3
0.9

Table I. Standard deviation of peak-position,peak-height and rise-time of bump waveforms
before and after the replacement of the troubled
timing module.
Although the standard deviation ofpeak-position was 1.9 % before the replacement,
after the replacement its distribution became very

10Development of automatic tune measurement andcorrection system at NewSUBARU storage ring
S. Hashimoto, Y. Hamada, Y. Minagawa#, T. Shinomoto#, S. Miyamoto
LASTI, University of Hyogo#
JASRI / SPring-8
Abstract
The automatic measurement and correction system for betatron tunes has been developed in
NewSUBARU electron storage ring. Tunes are evaluated by analyzing beam signals from abeam position monitor. If differences between measured tunes and desired ones are large, tunes
are automatically corrected using winding coils for ring quadrupole magnets Q1, Q2. We havesuccessfully demonstrated that tune shifts can be suppressed using the system during an energy
ramping.
fluctuations of electron beam orbit and tunes are
relatively large. Sometimes these cause slight or
critical beam losses.
To make the energy ramping stable, we havedeveloped an automatic tune measurement andcorrection system. In this paper we report thesystem and experimental results of the automatic
tune correction during energy ramping.

Introduction
One of important parameters of a storage ringis betatron tune, i.e., the number of horizontal orvertical oscillations of stored electron beams
around a closed orbit during one turn of the ring
circumference.
If tunes are not correctly
adjusted, some troubles in the operation of storagerings, including degradation of beam lifetime,
beam loss by instabilities, may occur.
In NewSUBARU electron storage ring,horizontal and vertical tunes are 6.30 and 2.23,
respectively. However, tunes vary according tostored beam current and filling pattern. And
during energy ramping from 1.0 to 1.5 GeV,
Storage ring

Automatic tune measurement system
The automatic tune measurement system isshown in Fig. 1.
Horizontal and verticalbetatron tunes are measured by BPM (beamposition monitor) signals. We use a difference

Q1, Q2 magnet
BPM
difference-

Q1, Q2 additional windings

Amplifiere-beamMain power
suppliesfor Q1, Q2
Spectrum analyzer
Polarity change

Polarity switcher

Private LAN

Spectrumdata

Q1, Q2
Polarity setting
Power supply
for Q1, Q2
additional windings

GPIB
PC
Compact FieldPoint

Analog voltage

Q1, Q2Current setting

PS controller
PLC network
Fig. 1.

Automatic tune measurement and correction system.

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Calculation
Tune measurement
Tune correction

between signals from two diagonal electrodes of a
BPM. The difference signal is analyzed infrequency domain by a spectrum analyzer.
Spectrum data is transferred to a PC via GPIB.
At the PC, the LabVIEW application programautomatically detects two signal peaks around RF
frequency and evaluates horizontal and verticaltunes in every 50 msec. Because the raw data
for spectrums is relatively noisy, we use bothaveraging and smoothing methods in the signal
processing. The measured tune values can besaved to a database every one second.

and Q2 windings are externally controlled.
To correct tunes both positively andnegatively, the power supplies should be bi-polar.
We used mono-polar power supplies with apolarity-switcher, which includes relay circuits
and can control polarity according to external
control signals, which are given by National
Instruments Compact FieldPoint.
Tune correction during energy ramping
Measured tunes during energy ramping, whichtakes about 15 minutes, are shown in Fig. 2.
Without tune corrections, variations of horizontal
and vertical tunes were about 0.02.
With tune corrections, tune shifts became
small and were within 0.005. Thus betatrontunes could be kept almost constant during energy
ramp by this system.

Automatic tune correction system
The configuration of the automatic tune
correction system is also shown in Fig. 1. In the
NewSUBARU storage there are seven families ofquadrupole magnets. For tune corrections weused two families Q1 and Q2.
Additional
windings are equipped to Q1, Q2 magnets andadditional power supplies feed current to thesewinding coils. A correction program on the PC
calculates tune shift x and y which are
differences from nominal values. Then currents
fed to Q1, Q2 winding coils are given by thefollowing equations:
IQ1 = E*(4.58E5*x + 6.03E4*y)+ IQ1(old),
IQ2 = E*(7.00E4*x + 5.06E4*y)+ IQ2(old),
where E is beam energy, IQ1, IQ2 are currents fed
to Q1, Q2 winding coils, respectively. The
above equations were evaluated by comparingkick strength by additional winding coils andresults of lattice calculations.
The PC sends calculated values of IQ1 and IQ2
to the controller every one second via a PLC
network. The controller generates the equivalentanalog voltage, by which power supplies for Q1

Summary
We have developed the measurement andcorrection system for betatron tunes in the
NewSUBARU storage ring. This system canmeasure horizontal and vertical tunes every 50 ms
and correct tune shifts every one seconds.
During energy ramping from 1.0 to 1.5GeV, tunes
are successfully corrected within 0.005 with thissystem.
This system also can correct tune shifts incurrent decay operations.
Furthermore, asapplications of this system, an automatic tune
survey is possible, which can automaticallymeasure beam lifetime or injection efficiency at
various operating points in a tune diagram.

Fig. 2. Horizontal (upper) and vertical (lower) tunes during energy ramp without (left)
and with (right) the automatic tune corrections.

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