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vfZpvOuî X ü½w¾Ì 1 Å ¸xgÊâ³ZpÌJ­vÌ¬ðó¯ÄÀ{µ½BÜ½C½³¤\
ÊvZXðÍ¤ªìÌö´üA³öC]äYy³öCLcõI³ÉÍ°÷¾Àp»ÌÏ_©ç½åÈ¾ð¸¢½±ÆðtLµC´ÓvµÜ·BQÆ¶£1)
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á¦ÎCgªCRºL ¤ÎFX üõwi|ÙC1999).
T. Kimura, S. Handa, H. Mimura, H. Yumoto, D. Yamaka­wa, S. Matsuyama, K. Inagaki, Y. Sano, K. Tamasaku, Y,Nishino, M. Yabashi, T. Ishikawa and K. Yamauchi: J. Jpn.
Appl. Phys. 48, 072503_4 (2009).
H. Mimura, S. Handa, T. Kimura, H. Yumoto, D. Yamaka­wa, H. Yokoyama, S. Matsuyama, K. Inagaki, K.
Yamamura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi,
T. Ishikawa and K. Yamauchi: Nature Phys. 6, 122_125(2010).
I. A. Artyukov, A. V. Vinogradov, Y. S. Kas'yanov and S. V.
Savel'ev: Quantum Electronics 34, 691_692 (2004).
T. Hatano, T. Harada and M. Yamamoto: PF Activity
Report 2007 #25, PART A, 64_65 (2009).
T. Ejima, F. Ishida, H. Murata, M. Toyoda, T. Harada, T.
Tsuru, T. Hatano, M. Yanagihara, M.Yamamoto and H.

186  úËõ May 2010 Vol.23 No.3

18)
19)
20)
21)

22)
23)
24)
25)
26)
27)
28)
29)

Mizutani: Opt. Express 18, 7203_7209 (2010).
R{³÷FIsotope News 659, 2_6 (2009).
M. Yamamoto: Nucl. Instrum. Methods A 467_468, 1282_1285 (2001).
K. Yamashita, K. Akiyama, K. Haga, H. Kunieda, G. S.
Lodha, N. Nakajo, N. Nakamura, T. Okajima, K. Tamura
and Y. Tawara: J. Synchrotron Rad. 5, 711_713 (1998).
R. Maruyama, D. Yamazaki, T. Ebisawa, M. Hino and K.
386, 1256_1258 (2006).
Soyama: Physica B 385_
T. W. Barbee, Jr., S. Mrowka and M. C. Hettrick: Appl.
Opt. 24, 883_886 (1985).
H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii: J. Vac. Sci.
Technol. B7, 1648_1651 (1989).
http://henke.lbl.gov/multilayer/survey.html
M. Yamamoto and T. Namioka: Appl. Opt. 31, 1622_1630(1992).
682 (1993).
R{³÷Fp¨ 62, 676_H½ìFõw 31, 532_537 (2002).
M. Watanabe, T. Hatano, K. Saito, W. Hu, T. Ejima, T.
Tsuru, M. Takahashi, H. Kimura, T. Hirono, Z. Wang, M.
Cui, M. Yamamoto and M. Yanagihara: Nuclear Science andTechniques 19, 193_203 (2008).
A. G. Michette and Z. Wang: Opt. Commun. 177, 47_55(2000).
T. Tsuru: AIP Conf. Proc. 879, 1524_1527 (2007).
T. Harada, T. Hatano and M. Yamamoto: IPAP Conf. Series
7, 195_197 (2006).
T. Matsushita, E. Arakawa, Y. Niwa, Y. Inada, T. Hatano,T. Harada, Y. Higashi, K. Sakurai, M. Ishii, M. Nomura and
K. Hirano: Eur. J. Special Topics (Proc. SXNS10) 167, 113_119 (2009).
M. Yamamoto, Y. Hotta and M. Sato: Thin Solid Films 433,
224_229 (2003).
T. Tsuru, T. Tsutou and M. Yamamoto: Thin Solid Films
455_456, 705_709 (2004).
T. Tsuru and M. Yamamoto: Thin Solid Films 515, 947_951(2006).
M. Yamamoto and T. Namioka: Appl. Opt. 31, 1612_1621(1992).
E. Hecht: Optics (Addison Wesley, 2001) p. 226.
A. Tosaka, Y. Sakai, T. Tsuru and M. Yamamoto: J. Vac.
Soc. Jpn. 51, 115_117 (2008).
T. Tsuru, A. Tosaka, Y. Sakai and M. Yamamoto: J. Phys.:Conf. Ser. 186, 012077_3 (2009).
T. Tsuru, Y. Sakai, T. Hatano and M. Yamamoto: acceptedto AIP Conf. Proc.

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Development of high throughput and wavefront error
corrected soft X­ray multilayer imaging optics
Toshihide TSURU1, Tadashi HATANO1,Tetsuo HARADA2 and Masaki YAMAMOTO1
1Institute of Multidisciplinary Research for Advanced Materials, Tohoku University,

2_1_1 Katahira, Aoba­ku, Sendai 980_8577

2Laboratory of Advanced Science and Technology for Industry, University of Hyogo,

3_1_2 Koto, Kamigori, Ako, Hyogo 678_1205

Abstract In the soft X­ray wavelength region, peak wavelength matching was achieved by controlling thenm­period thickness and its distribution of Mo/Si multilayer imaging optics. Soft X­ray interferometry on mul­tilayer reection phase manipulation by surface milling showed a good feasibility of sub­nm digital wavefront
error correction of multilayer mirrors for the diraction limited imaging.

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