ADVANCE PROGRAM

M C ’03

9th MICROOPTICSCONFERENCE
http://www.din.or.jp/~microopt/moc03/
Sponsored by

The Japan Society of Applied Physics

In cooperation with
• Optical Society of America• IEEE/Lasers and Electro-Optics Society• Electronics Society, IEICE• The Chemical Society of Japan• The Society of Polymer Science, Japan• The Laser Society of Japan• Optoelectronic Industry and Technology
Development Association• Japan Optoelectro-Mechanics Association

October 29 - 31, 2003
Tokyo International Exchange Center
Odaiba (Waterfront), Tokyo, Japan

MOC ’03 Agenda At-A-Glance
International Conference Hall, Tokyo International Exchange Center

28 October (Tue.)

29 October (Wed.)

8:30

8:30

9:00

9:00

30

30

10:00

10:00

30

30

11:00

11:00

30

30

12:00

12:00

30

30

13:00

13:00

30

30

14:00

14:00

30

30

15:00

15:00

30

30

16:00

16:00

30

30

17:00

17:00

30

30

18:00

18:00

Opening Remarks

A. Plenary

Lunch

B. Wavelength
MUX/DEMUX
Devices
Break

30
19:00
30
20:00

Registration
Get Together(Main Foyer 3F)

30
19:00
30
20:00

C. WaveguideDevicesBreak

D. Nano-Tech & PhC

Refreshment

E. Special Session

MOC ’03 Agenda At-A-Glance
International Conference Hall, Tokyo International Exchange Center

30 October (Thu.)

31 October (Fri.)

8:30

8:30

9:00

9:00

30

F. MEMS& Their Applications

10:00
30

Break

30

G. Micro Fabrication

30
12:00

30

30
Lunch

30

13:00

30

30
(Main Entrance 1F& Main Foyer 3F)
Break

16:00

17:00

18:00
30

30

30
17:00

Break

M. Semiconductor
Lasers

15:00

16:00

30 J. Functional Devices

30

Lunch

14:00
H. Poster Session

30

L. Optical Systems& Applications

30

14:00

15:00

Break

11:00

12:00

13:00

K. Fiber Devices& Assembly

10:00

11:00
30

30

Break
PD. Post Deadline
PapersAward Ceremony& Closing Remarks
Micro Concert

by Machida Philharmony
Baroque30

18:00
Conference Party

19:00 (Youtei-maru, 5min-walk)

30
19:00

30

30

20:00

20:00

AdjournTechnical Program
The 9th MICROOPTICS CONFERENCE (MOC '03) will be heldat Tokyo International Exchange Center, Tokyo, Japan on
October 29-31, 2003. This conference is organized andsponsored by the Japan Society of Applied Physics incooperation with several academic societies and associations.
The MOC '03 is intended to provide a central forum for an
update and review of scientific and technical information
covering a wide range of microoptics field from fundamental
researches to systems and applications.
The content of Advance Program and the latest information will
be seen on the following web site:
http://www.din.or.jp/~microopt/moc03/

Plenary Session
MOC '03 will have the following plenary talks:
K. Tada, Kanazawa Institute of Technology"High speed semiconductor optical modulators / switches"
P. Lagasse, P. Demeester, and A. Ackaert, Gent University"Recent advances in photonic technology research in theEuropean IST programme"
S. C. Wang, National Chiao Tung University"White light – Dawn and semiconductor sun –"Special Session
The special session entitled as "Nanotechnology in
Photonics" is planned on Wednesday, October 29, 2003 toprovide highlighted topics of nanotechnology in relation tophotonics.
Organizers: S. C. Wang, National Chiao Tung University
K. Iga, JSPS
Moderator: T. Miyamoto, Tokyo Institute of Technology
The following are invited talks for special session.
A. Tuennermann and E.-B. Kley,
Friedrich-Schiller-University, Jena
"Photonic crystals in low index contrast for applications intelecommunication"
R. J. Saykally, UC Berkeley"Single nanowire lasers"
S. Noda, Kyoto University"Various engineerings in photonic crystals for manipulationof photons"

Oral Presentation
The presentation time (including discussion) will be 30 min. forinvited and 15 min. for regular papers. All speakers arerequested to present the paper with a data (LCD) projector andto check in at the session registration desk prior to the startingtime of the session. If the other visual equipments are required,please contact with MOC '03 Secretariat.

Technical Program
Poster Session
In the conference, poster session will be held in the afternoon of
October 30. Each author is requested to display materials on a
180 cm wide and 90 cm high bulletin board. The bulletin boards
are available from 10:00 on October 30. Authors should stay inthe vicinity of the bulletin board for the duration of the session toanswer the questions.

Post Deadline Papers
A limited number of post deadline papers will be accepted forthe post deadline session. Latest and significant results
obtained after the regular deadline are most welcome. Post
deadline papers must be submitted electronically to the same
address as the regular papers:
moc03@wave.pe.titech.ac.jp
The deadline for submission is October 7, 2003. Detailed
instructions on how to prepare a paper are available as the
template from the web site:
http://www.din.or.jp/~microopt/moc03/

Special Issue "Microoptics"
A special issue on microoptics of the Japanese Journal ofApplied Physics (JJAP) is scheduled for publication in August,2004. Not only authors of papers for MOC '03 but also people
having activities related to microoptics are strongly encouraged
to submit original papers to the special issue. The deadline forsubmission is January 15, 2004. If you want any further
information, please contact with:
Dr. G. Hatakoshi
Editor/Secretariat, MOC Special Issue
Toshiba Research Consulting Corp.
1 Komukai Toshiba-cho, Saiwai-ku,
Kawasaki 212-8582, Japan
TEL: +81-44-549-2138 FAX: +81-44-520-1501
E-mail: genichi.hatakoshi@toshiba.co.jp

Conference Party
A Conference Party will be held on Thursday evening, Oct. 30
from 18:00 to 20:00 at the Youtei-maru close to the conference
site. All the attendees of MOC '03 are invited to the party.

Micro Concert
Micro Concert will be performed by Machida Philharmony
Baroque (organized by K. Iga). The concert will start after MOC'03 Award Ceremony and Closing Remarks on Oct. 31 at theInternational Conference Hall. The attendees of MOC and theirfamilies are cordially invited.

Technical Sessions
Wednesday, October 29
International Conference Hall
9:30-9:45
Opening Remarks
Conference Co-chairs of MOC '03
9:45-11:30
Presiders:

Session A: Plenary
H.Nakajima, Waseda University
K.Yokomori, Ricoh Co., Ltd.

A1
9:45

High speed semiconductor optical modulators /switches (Plenary)
K.Tada, Kanazawa Institute of Technology
A2
Recent advances in photonic technology research in the
10:20 European IST programme (Plenary)
P.Lagasse, P.Demeester, and A.Ackaert,
Gent University
A3
White light – Dawn and semiconductor sun –10:55 (Plenary)
S.C.Wang, National Chiao Tung University[Lunch (11:30-13:00)]
13:00-14:15
Presiders:

Session B: Wavelength MUX/DEMUX Devices
H.P.Herzig, University Neuchatel
H.Kanamori, Sumitomo Electric Ind., Ltd.

B1
13:00
B2
13:30

Long-period waveguide gratings (Invited)
K.S.Chiang, City University of Hong-Kong
Design and fabrication of grating demultiplexer using
hollow optical waveguide
M.Ishikawa, T.Miura, A.Matsutani, and F.Koyama,
Tokyo Institute of Technology
B3
Wide range tunable microring resonator filter by
13:45 thermo-optic effect in polymer waveguides
Y.Yanagase, S.Yamagata, and Y.Kokubun,
Yokohama National University
B4
A four-channel X 10-Gbit/s CWDM optical receiver with
14:00 an AWG demultiplexer
T.Ban, M.Shishikura, R.Mita, Y.Matsuoka, H.Ishikawa*, and
H.Uetsuka*, Hitachi, Ltd., *Hitachi Cable, Ltd.

[Break (14:15-14:30)]
14:30-15:45
Presiders:

Session C: Waveguide Devices
N.Peyghambarian, University of Arizona
H.Furuta, Fukuoka University

C1
Efficient and practical modeling of finite waveguide
14:30 grating couplers
K.Cottier, R.E.Kunz, and H.P.Herzig*,
Centre Suisse d'Electronique et de Microtechnique SA(CSEM), *University de Neuchâtel
C2
Ultra-wide range and stable UV trimming of center
14:45 wavelength of microring resonator filter
T.Naganawa, H.Haeiwa, and Y.Kokubun,
Yokohama National University

Technical Sessions
Wednesday, October 29
C3
Multi-stacked integration of microring resonator filter for
15:00 reduction of scattering loss at crossing point of busline
T.Hanai, S.Suzuki, Y.Hatakeyama, and Y.Kokubun,
Yokohama National University
C4Interferometric isolator with CeY2Fe5O12 guiding layer
15:15 employing nonreciprocal phase shift
K.Sakurai, H.Yokoi, and T.Mizumoto,
Tokyo Institute of Technology
C5
Optical harmonic generation using reciprocating optical
15:30 modulators
T.Kawanishi, S.Oikawa*, K.Yoshiara**, T.Sakamoto,
S.Shinada, and M.Izutsu,
Communications Research Lab., *Sumitomo Osaka Cement
Co., Ltd., **Mitsubishi Electric Corp.

[Break (15:45-16:15)]
16:15-17:15
Presiders:
D1
D2
16:15

D3
16:30

D4
16:45
D5
17:00

Session D: Nano-Tech and PhC
M.K.Hibbs-Brenner, Honeywell International
S.Ishihara, OITDA

Molecular transistor (Invited)-- Cancelled
M.E.Welland, University of Cambridge
Realization of photonic crystal blue LED by means ofextended-pitch design
K.Orita, S.Tamura, T.Takizawa, T.Ueda, M.Yuri, S.Takigawa,and D.Ueda, Matsushita Elec. Ind. Co., Ltd.
Near-field evanescent wave power enhancement withnew nano meter sized grating structure and microlens insemiconductor optical array head
K.Goto, T.Kirigaya, and Y.Masuda, Tokai University
Fiber-based optical manipulation system
K.Taguchi, M.Tanaka*, and M.Ikeda*,
Ritsumeikan University, *Fukuyama University
2-dimensional photonic crystal beamsplitters
C.-C.Chen, H.-D. Chien, P.-C.Luan, and Y.-J.Chan,National Central University[Refreshment (17:15-17:45)]
17:45-19:45
Presiders:Moderator:

Session E: Special Session"Nanotechnology in Photonics"
S.C.Wang, National Chiao Tung University
K.Iga, JSPS
T.Miyamoto, Tokyo Institute of Technology

E1
Photonic crystals in low index contrast for application in
17:45 telecommunication (Invited)
A.Tuennermann and E.-B Kley,
Friedrich-Schiller- University, Jena
E2
Single nanowire lasers (Invited)
18:15 R.J.Saykally, UC Berkeley
E3
Various engineerings in photonic crystals for
18:45 manipulation of photons (Invited)
S.Noda, Kyoto University
19:15 Panel Discussion

Technical Sessions
Thursday, October 30
International Conference Hall
9:00-10:30
Presiders:

Session F: MEMS and Their Applications
S.Kang, Yonsei University
R.Sawada, NTT Corp.

F1
9:00
F2
9:30

From micro-optics to optical MEMS (Invited)
H.P.Herzig, University of Neuchatel
A three-dimensional MEMS optical switch module using
low-cost highly accurate polymer components
T.Yamamoto, J.Yamaguchi, N.Takeuchi, A.Shimizu,
R.Sawada, E.Higurashi, and Y.Uenishi,
NTT Microsystem Integration Laboratories
F3
Self-assembled axial type variable optical attenuator
9:45 using continuously movable pop-up MEMS mirror
Y.-J.Lai, C.Lee, C.-Y.Wu, Y.-S.Lin, and M.H.Tsai,
Asia Pacific Microsystems, Inc.
F4
Bio-MEMS and integration with micro-optics (Invited)
10:00 A.Tixier-Mita, University of Tokyo[Break (10:30-11:00)]
11:00-12:30
Presiders:

Session G: Micro Fabrication
J.E.Batubara, University Pelita Harapan
M.Oikawa, Nippon Sheet Glass Co., Ltd.

G1
Fabrication technology for micro-optics – micromolding
11:00 (Invited)
S.Kang, Yonsei University
G2
Plastic microlens arrays by deep lithography with
11:30 protons: fabrication and characterization
H.Ottevaere, B.Volckaerts, M.Vervaeke, P.Vynck,and H.Thienpont, Vrije Universiteit Brussel
G3
Fabrication method of double micro lens array using
11:45 self-alignment technology
K.Kitamura, K.Okada, N.Fujita, Y.Nagasaka, M.Ueda,
Y.Sekimoto, and Y.Kurata, SHARP Corporation
G4
Fabrication of highly reliable diffraction gratings by the
12:00 sol-gel method
M.Taniyama, K.Shimmo, Y.Sasaki, N.Hikichi, Y.Sekiguchi,
K.Asada, and K.Nakama, Nippon Sheet Glass Co., Ltd.
G5
Micro-optical polarizer with high efficiency
12:15 I.Pola, P.Ruffieux, and T.Scharf, Institute of Microtechnology[Lunch (12:30-14:00)]

Technical Sessions
Thursday, October 30
Main Entrance & Main Foyer
14:00-15:30 Session H: Poster Session
H1

H2

H3

H4

H5

H6

H7

H8

H9

H10

H11

H12

Epitaxial lift-off of GaAs/AlGaAs films with vertical cavity
surface emitting lasers for high-density packaging of
opto-electronic integrations
K.Hiruma, M.Kinoshita, S.Hiramatsu, and T.Mikawa,
Association of Super-Advanced Electronics Technologies(ASET)
Molecular orientation and nonlinear optical properties of
VOPc thin films prepared on polycarbonate substrate
Y.Jin, G.Sawa, Y.Uchida, K.Kojima, A.Ohashi, S.Ochiai, andT.Mizutani*, Aichi Institute of Technology, *Nagoya University
Development of bi-directional electrothermal V-beam
actuators for latched optical switch
W.-C.Chen, C.-Y.Wu, and C.Lee,
Asia Pacific Microsystems, Inc.
A wide-angle full-vector beam propagation method
based on ADI iterations
S.L.Chui and Y.Y.Lu, City University of Hong-Kong
Full vector electro-optic field mapping on a
micro-structured electrodeY.Matsuo, T.Kawanishi, S.Oikawa*, K.Higuma*, andM.Izutsu, Communications Research Lab.,*Sumitomo-Osaka Cement Co., Ltd.
Gallium nitride planar waveguides fabricated bymagnetron sputtering
V.Prajzler, I.Hüttel*, V.Peřina**, J.Špirková*, J.Schröfel, andJ.Oswald**, Czech Technical University, *Institute ofChemical Technology, **Czech Academy of Science
Optical alignment system with a visible light source andan image
J.-Y.Jung, H.-S.Ryu, and H.-S.Kang,
Electronics and Telecommunications Research Institute
Development of ultra compact optical components andgain-block
T.Kato, M.Hoshikawa, C.Nishida, A.Masuda, and M.Suzuki,
FDK Corporation
FDTD studies of gold optical waveguides based on
surface plasmon polariton
K.Hakamata, T.Hayashi, and H.Rikukawa, FDK Corporation
Fabrication of a long-period fiber grating by
femtosecond laser pulses with a novel fiber-positioning
methodT.Fujii, T.Fukuda, S.Ishikawa, Y.Ishii, K.Sakuma,
and H.Hosoya, Fujikura Ltd.
Advanced design and optical thickness control for TFF
based GFF
T.Ito, H.Abe, and K.Mizuno, The Furukawa Electric Co., Ltd.
All-opticalinterconnection
withphotorefractive
cross-polarized four-wave mixing and control beam
T.Yagai, A.Okamoto, K.Sato*, and M.Bunsen,
Hokkaido Unversity, *Hokkai-Gakuen University

Technical Sessions
Thursday, October 30
H13

H14

H15

H16

H17

H18

H19

H20

H21

H22

H23

H24

H25

All-optical bi-directional interconnection with double
mutual-pumped phase conjugation
S.Hondo, A.Okamoto, S.Honma*, and H.Funakoshi,
Hokkaido Unversity, *Yamanashi University
Fault-tolerant
automaticrouting
methodwithphotorefractive double phase conjugate mirrors
H.Kato, A.Okamoto, and M.Bunsen, Hokkaido Unversity
All-optical auto-tracking bi-directional connection
switch with cross polarized DPCM
S.Uemura, A.Okamoto, and S.Honma*,
Hokkaido Unversity, *Yamanashi University
Anisotropic dry etching of Silicon using SF6/O2 withphotoresist mask at room temperature
H.-H.Chen, Industrial Technology Research Institute
Polymer waveguide with holography grating for dynamic
wavelength selection
Y.-T.Lu, C.-L.Yang, and S.Chi*, Industrial Technology
Research Institute, *National Chiao-Tung University
Novel application of arrayed waveguide grating tocompact planar spectroscopic sensors
Y.Komai, K.Kodate, K.Okamoto*, and T.Kamiya**,Japan Women's University, *Okamoto Lab., **National
Institute for Academic Degrees & University Evaluation
Nanostructured random organic/inorganic composites
as transparent materials for optical components
H.Mataki, S.Yamaki, and T.Fukui,Kansai Research Institute, Inc.
Small v-bend optical silica-waveguide using an elliptic
mirror for planar lightwave circuits
T.Suzuki, Y.Shibata, and H.Tsuda, Keio University
A wavelength sensor using a structure of curved opticalwaveguide
R.Panthasa, S.Khuntaweetep, and S.Somkuarnpanit, KMITLA design of a silicon based race track microcavity
resonator using FDTD method
S.Jaturuntruengsri, S.Somkuarnpanit, and K.S.Tang, KMITL
Reflective micro optical element array fabricated byphotofabrication technique
Y.Awatsuji, M.Sasada, N.Kawano, and T.Kubota,
Kyoto Institute of Technology
Error reduction of quantized Fourier modulus in theiterative Fourier transform algorithms used for phaseretrieval
S.Yang and H.Takajo, Kyushu Institute of Technology
New fiber Bragg grating filter assembly for reciprocating
optical modulators
K.Yoshiara,
J.Hoshizaki,
S.Matsumoto,
R.Namiki,
T.Kawanishi*, and M.Izutsu*, Mitsubishi Electric Corporation,*Communications Research Lab.

Technical Sessions
Thursday, October 30
H26

H27

H28

H29

H30

H31

H32

H33

H34

H35

H36

H37

H38

DNA hybridization acceleration by photovoltaic array
C.-C.Chen, W.-C.Ku*,**, S.-K.Chiu*, and C.-M.Tzeng*,
National Central University, *U-Vision Biotech Inc.,**Academia Sinica
Design and analyses of a planar zoom module as a laser
beam expander
A.-C.Wei and H.-P.D.Shieh, National Chiao-Tung University
Thermal controllable polymer waveguide opticalattenuator with large attenuation range
Y.-T.Lu, H.-C.Guo*, H.-T.Wang, H.-H.Chen*, and S.Chi,
National Chiao-Tung University,*Industrial Technology Research InstituteHigh-efficiency and wideband wavelength converters
based on four-wave-mixing in light-holdings SOA's
J.-T.Hsieh, S.-L.Lee*, and J.Wu, National Taiwan University,*National Taiwan University of Science and Technology
One-dimensional photonic crystal waveguide
S.Kittaka, K.Oya, M.Nara, T.Asai, and K.Tsunetomo,
Nippon Sheet Glass Co., Ltd.
A "dual-lens-type dual collimator array system" using aplanar microlens array
S.Wada, K.Yamada, K.Nakamura, and K.Hamanaka,
Nippon Sheet Glass Co., Ltd.
A MUX/DEMUX module for CWDM with concave
micro-mirrors
K.Hadama, T.Sakamoto, and Y.Arai,
NTT Microsystem Integration Laboratories
Parametricfluorescencegenerationin
LiNbO3
quasi-phasematchedwaveguide
pumpedbysemiconductor laser
H.Kintaka and T.Suhara, Osaka University
GaInP/AlGaInP quantum well distributed Bragg reflector
laser using surface curved grating
P.K.Das, K.Hamana, O.Omachi, N.Shimada, M.Uemukai,
and T.Suhara, Osaka University
Profile estimation for microlens fabrication using asimple dry etching model
Y.Satoh, H.Mifune, Y.Kiyosawa, T.Ishii, and S.Satoh,
Ricoh Co., Ltd.
Optical memory with add/drop using all-optical triode
based on a tandem wavelength converter in reflective
semiconductor optical amplifiers
Y.Maeda, K.Narita*, and N.Ojima*,
Toyota Technological Institute, *Connect Japan, Ltd.
Optical isolator with Si guiding layer fabricated by wafer
bonding
H.Yokoi, Y.Shoji, and T.Mizumoto,
Tokyo Institute of Technology
Spin reorientation transitions of epitaxial magnetic thinfilms Cu/Ni/Cu(001) structure by ion irradiation
J.-S.Yang, H.Yokoi, T.Mizumoto, M.C.Sung*, D.G.You*,J.Lee*, and K.Jeong*,
Tokyo Institute of Technology, *Yonsei University.

Technical Sessions
Thursday, October 30
H39

H40

H41

H42

H43

H44

H45

H46

H47

H48

H49

H50

Measurement of intensity-dependent response of
GaInAsP distributed feedback waveguide
J.-K.Seo, S.-H.Jeong, T.Mizumoto, M.Takenaka*,
and Y.Nakano*,
Tokyo Institute of Technology, *University of Tokyo
Control of group delay and chromatic dispersion intunable hollow waveguide with highly reflective mirrors
Y.Sakurai and F.Koyama, Tokyo Institute of Technology
Analysis of higher-order transverse mode suppression
using a convex mirror in VCSELs including thermal
lensing effectT.Uchida, T.Miyamoto, and F.Koyama,
Tokyo Institute of Technology
A novel spot-size converter using cylindrical micro GRIN
slab tip
K.Shiraishi*,**, C.S.Tsai*,***, H.Yoda**, T.Ito**, andI.Tomita**, *University of California, Irvine, **Utsunomiya
University, ***Academia Sinica
Nonlinearity reduction in WDM system using equilibriumphase strategic rotation cancelling
C.H.Hum,
S.D.Walker,
V.Lalithambika*,
F.C.Lin*,
D.M.Holburn*, R.J.Mears*, and M.C.Parker**,
University of Essex, *University of Cambridge,**Fujitsu Network Communications
Optical add/drop multiplexers using slanted fiber bragg
gratings
S.Hagiwara, M.Endo, S.Kawai, H.Miyakawa*, and Y.Ohta**,
University of Industrial Technology, *Tokyo University ofAgriculture and Technology, **NEC Patent Service, Ltd.
Temperature dependence of photorefractive effect in
PVK-based composites
G.B.Jung, M.Ozawa, T.Akasaka, T.Shimura, K.Araki,
and K.Kuroda, University of Tokyo
Fabrication of silica-based glass optical waveguide by
UV beam scanning
K.Kashiwagi and S.Yamashita, University of Tokyo
Deep lithography with protons for mastering refractive
micro-optical components and modules
B.Volckaerts,
H.Ottevaere,
P.Tuteleers,
M.Vervaeke,
P.Vynck, C.Debaes, R.Krajewski, A.Hermanne, andH.Thienpont, Vrije Universiteit Brussel
Optical switch with a few-micron-length structure
K.Furuhashi, H.Okayama*, and H.Nakajima,
Waseda University, *Oki Electric Industry
Chaotic communication using LD-transmitter / receiverarray
S.Ebisawa and S.Komatsu, Waseda University
Narrow band-pass transmission filter consisting of two
fiber Bragg gratings with different periods
Y.Yamada, Y.Yabe, and S.Komatsu, Waseda University[Break (15:30-15:45)]

Technical Sessions
Thursday, October 30
International Conference Hall
15:45-17:30
Presiders:

Session J: Functional Devices
H.J.S.Dorren, COBRA Research InstituteY.Fujii, Nihon University

J1
Multifunctional nonlinear optical polymer and molecular
15:45 assemblies (Invited)
N.Peyghambarian, University of Arizona
J2
Polysilane/polysilazane composite: novel material for
16:15 opticalwaveguides
andits
applicationtomode-conversion filters
H.Mataki, S.Yamaki, T.Fujiki*, S.Kawasaki*, N.Tanabe**,H.Okayama**, and H.Nakajima**, Kansai Research Institute,Inc., *Osaka Gas Co., Ltd., **Waseda University
J3
Low-driving-voltage electro-optic modulator with novel
16:30 KTN crystal waveguides
S.Toyoda, K.Fujiura, M.Sasaura, K.Enbutsu, A.Tate,
M.Shimokozono, H.Fushimi*, T.Imai, K.Manabe, T.Matsuura,
and T.Kurihara, NTT Photonics Laboratories, *Sendai
National College of Technology
J422mW UV second harmonic generation in a first-order
16:45 periodically poled MgO:LiNbO3 waveguideT.Sugita,
K.Mizuuchi,
K.Yamamoto,T.Kawaguchi*,
T.Yoshino*, and M.Imaeda*, Matsushita Electric IndustrialCo., Ltd., *NGK Insulators, Ltd.
J5
Fabrication of domain-inverted gratings in MgO:LiNbO3
17:00 by voltage application with ultraviolet light irradiation
through photomask at room temperature
M.Fujimura, T.Sohmura, and T.Suhara, Osaka University
J6
Sum-frequency generation in periodically poled
17:15 KTiOPO4 with large tolerances of temperature andwavelength
Y.Furukawa, H.Sakata, and T.Yagi, Canon Research Center"Youtei-maru" of Funeno-kagakukan
18:00-20:00

Conference Party

Technical Sessions
Friday, October 31
International Conference Hall
9:00-10:30
Presiders:

Session K: Fiber Devices and Assembly
K.S.Chiang, City University of Hong-Kong
T.Watanabe, Fujikura Ltd.

K1
9:00

Microstructure optical fibers (Invited)
D.J.Trevor, R.Bise, E.Monberg, and F.Dimarcello,
OFS Laboratories
K2
Recent advances in applications of holey fibers
9:30 T.Hasegawa, T.Saitoh, D.Nishioka, E.Sasaoka,
and T.Hosoya, Sumitomo Electric Industries, Ltd.
K3
Compact 64-fiber PLC connector utilizing angled
9:45 connection for super-multi-channel optical modules
S.Asakawa, M.Kobayashi, Y.Abe, and R.Nagase,
NTT Photonics Laboratories.
K4
Subminiature
micro-optic
deviceswithmini
10:00 quartz-rod-lensY.Noguchi, K.Nishiwaki, K.Oda, K.Asano, and H.Hosoya,
Fujikura Ltd.
K5
Ultra compact optical sub assembly using surface
10:15 mountable silicon microlens
K.Kotani, H.Sasaki, M.Uekawa, D.Shimura, Y.Maeno,
and T.Takamori, Oki Electric Industry Co., Ltd.

[Break (10:30-11:00)]
11:00-12:30
Presiders:

Session L: Optical Systems and Applications
D.J.Trevor, OFS Labs.
A.Arimoto, PENTAX Corp.

L1
All-Optical signal processing based on ultrafast carrier
11:00 dynamics in semiconductor optical amplifiers (Invited)
H.J.S.Dorren, COBRA Research Institute
L2
Guided-mode-selective focusing grating coupler for
11:30 optical add/drop multiplexing of free-space wave withguided waves
Y.Imaoka, J.Ohmori, M.Hamada, S.Ura, K.Kintaka*,
R.Satoh**, and H.Nishihara***,Kyoto Institute of Technology, *National Institute of Advanced
Industrial Science and Technology, **Osaka Univ., ***The
University of the Air
L3
Ultra-fast facial recognition system based on Vanderlugt
11:45 correlator
E.Watanabe and K.Kodate, Japan Women's University
L4
A method for personal identification based on the
12:00 recognition of three-dimensional objects
J.Kobayashi and S.Komatsu, Waseda University
L5
A practical laser projector with new illumination optics
12:15 for reduction of speckle noise
K.Kasazumi, Y.Kitaoka, K.Mizuuchi, and K.Yamaoto,
Matsushita Electric Industrial Co., Ltd.

[Lunch (12:30-14:00)]

Technical Sessions
Friday, October 31
14:00-15:15
Presiders:

Session M: Semiconductor Lasers
C.S.Tsai, University of California, Irvine
S.Tsuji, Hitachi Ltd.

M1
Advances in short wavelength (650nm and 780nm)
14:00 VCSELs (Invited)
M.K.Hibbs-Brenner, J.Kim, and A.Cox,
Honeywell International
M2
High-efficiency
InGaAs/AlGaAsquantumwell
14:30 distributed Bragg reflector laser with curved grating
M.Uemukai, K.Kitano, N.Shimada, and T.Suhara,
Osaka University
M3
Optimization of low temperature flip chip bonding for
14:45 VCSEL arrays for polymeric-waveguide-integrated
optical interconnection systems
K.-M.Chu, J.-S.Lee, B.S.Rho*, H.S.Cho*, H.-H.Park*, and
D.Y.Jeon, Korea Advanced Institute of Science andTechnology, *Information and Communications University
M4
Characterization of single wavelength optically pumped
15:00 GaInAsP/InP VCSELs with dielectric mirrors
J.Kinoshita, T.Miyamoto, Y.Onishi, and F.Koyama,
Tokyo Institute of Technology[Break (15:15-15:45)]
15:45-16:15

Session PD: Post Deadline Papers

16:15-16:45 Award Ceremony and Closing Remarks
Program Co-chairs: T.Mizumoto, Tokyo Institute of Technology
Y.Handa, Canon Inc.
16:45-18:00 Micro Concert
By Machida Phil harmony Baroque (organized by K.Iga)

Check!
Important Deadlines
Pre-Registration:
October 7, 2003
Post Deadline Papers: October 7, 2003
Hotel Accommodations: October 1, 2003

Registration
Registration Fees
Before/On Oct. 7, 2003 After Oct. 8, 2003
Conference (General)¥40, 000¥45, 000(Student)¥7, 000¥8, 000
Extra Copy of Digest¥6, 000¥6, 000
The registration fee includes admission to MOC '03, a copy ofTechnical Digest. The attached Registration Form should besent to:
MOC '03 Desk, Kinki Nippon Tourist Co., Ltd.,
Corporate Branch, Kanda
c/o SAITOWER BLDG 6F, 19,
Kandamatsunaga-cho,
Chiyoda-ku, Tokyo 101-0023 JAPANTEL: 81-3-5256-1712 FAX: 81-3-5256-1772
E-Mail: kanda-fox@or.knt.co.jp
MOC '03 Organizing Committee entrusts Kinki Nippon Tourist
Co., Ltd. with a part of the management (Registration and Hotel
Reservation). All payment should be made in Japanese yen by
one of the following methods:
1. Bank transfer to(Oversea attendees)
Sumitomo Mitsui Banking Corporation, Tokyo Daiich Branch
Account Name: Kinki Nippon Tourist Co., Ltd.,
Corporate Branch, Kanda
Account No. 7886096
Phone: +81-47-425-4861(Domestic attendees)
三井住友銀行 東京第一支店 (普) NO．７８８６０９６
近畿日本ツーリスト㈱ 神田法人旅行支店
2. Credit card: VISA, Master Card, American Express andDiner's Club are available only for overseas attendees. Personal
checks are NOT accepted.
Pre-registration, by October 7, 2003, is encouraged and will beentitled to reduced fees. Upon receipt of registration form andpayment, MOC '03 Desk will send a letter of confirmation whichshould be presented at the Conference Registration Desk.
No refunds of the registration fee will be made for any reasons
whatever. In the event of registrant unable to attend theconference, a copy of Technical Digest will be sent after the
conference.

Registration Desk
The registration desk will be located in the Lobby (Main Foyer)of Tokyo International Exchange Center. The hours are:Tuesday, October 28
18:00 – 20:00
Wednesday, October 29
08:30 – 17:00
Thursday, October 30
08:30 – 17:00
Friday, October 31
08:30 – 12:00

General Information
HOTEL ACCOMMODATIONS
Kinki Nippon Tourist Co., Ltd. will be the official agent for hotel
accommodations and the other travel arrangements.
The attached "Registration and Hotel Reservation Form" should
be sent to MOC '03, Desk Kinki Nippon Tourist Co., Ltd. no later
than October 01, 2003, together with the payment of Deposit(JPY 10,000 per room) and Handling charge (JPY 500 per
room)

A-S

Room
Type
SingleRoomCharge17,000yen

A-T

Twin

24,140yen

B-SSingle12,070yen

B-T

Twin

21,200yen

C-SSingle10,075yen

C-T

Twin

15,950yen

Hotel Name

Code

Mitsui
Urban Hotel
Ginza
Tokyo Bay
AriakeWashington
Hotel
Sun Hotel
Shimbashi

Hotel Location
3min. walk fromYURIKAMOME"Shimbashi" station
3min. walk fromYURIKAMOME"Ariake" station
3min. walk fromYURIKAMOME"Shimbashi" station* The above rates are per room, including service charge, andconsumption tax.
Breakfast is included. (Except Sun Hotel Shimbashi)* No reservation will be made without payment of deposit andhandling charge.

CANCELLATIONS
Any kind of cancellation or reservation change must be
submitted in writing to MOC '03 Desk, Kinki Nippon Tourist Co.,Ltd.
1) REGISTRATION FEE REFUND POLICY
In case of cancellation of registration and / or purchase of theextra copy of Digest, please note neither the registration fee nor
the Digest fee can be refunded.
2) HOTEL DEPOSIT REFUND POLICY
In case of cancellation of hotel reservation, your deposit will be
refunded after deducting bank charge/commission andcancellation fee as follows. Please note the handling charge
cannot be refunded.
If cancellation notification is received:a. 10 days or more prior to the date of arrival.
→No charge
b. 8 to 2 days prior.
→20% of one night accommodation fee
c. Fewer than 2 days prior, or no notice given.
→100% of one night accommodation fee

General Information
Visa
Visitors from countries whose citizens must have visas should
apply to a Japanese consular office or diplomatic mission in theirrespective country. For details, please contact with your travel
agent or the local consular office in your country.

ClimateThe weather in Tokyo during the period of the conference istypically sunny with temperature ranges between 15°C and
22°C.

Currency Exchange
Only Japanese yen (¥) is acceptable at regular stores andrestaurants. Certain foreign currencies and credit cards may be
accepted at a limited number of hotels, restaurants and souvenir
shops. You can exchange your currency with Japanese yen atforeign exchange banks and other authorized money
exchangers on presentation of your passport.

Traveler's Checks and Credit Cards
Traveler's checks are accepted only by leading banks and major
hotels in principal cities, and the use of traveler's checks inJapan is not as popular as in some other countries. VISA,
Master Card, Dinners Club, and American Express are widely
accepted at hotels, department stores, shops, restaurants andnightclubs.

Tipping
In Japan, tips are not necessary anywhere, even at hotels andrestaurants.

Electrical Appliances
Japan operates on 100 volts for electrical appliances. The
frequency is 50 Hz in eastern Japan including Tokyo, and 60 Hz
in western Japan including Osaka and Kyoto.

Committee Members
Organizing Committee
Conference Co-chairs
H. Nakajima(Waseda University)
K. Yokomori(Ricoh Co., Ltd.)
Members
N. Arai
A. Arimoto
K. Chikuma
Y.
Fujii
T.
Fukunaga
H. Furuta
T.
HatanoN. HoriH. Hosokawa
K. Hotate
A. Ibaraki
I.
Ishibai
K. Ishida
S. Ishihara
Y.
Iwasaki
H. Kanamori
M. Kawachi
K. KodateY.
Koike
S. Komatsu
T.
KoyamaS. Kubota
Y.
KurataN. Nishida
H. Nishihara
Y.
Ohta
Y.
Okino
Y.
Ono
H. Sasaki
H. SatoM. Setani
T.
ShimuraK. TadaY.
Tamagawa
H. Toratani
S. Tsuji
H. Uetsuka
K. Ueyanagi
A. Watabe
M. WatanabeT.
WatanabeI.
Yamaguchi
K. Yamamoto
T.
Yatagai(KONICA Corp.)(PENTAX Corp.)(Pioneer Corp.)(Nihon University)(Fuji Photo Film Co., Ltd.)(Fukuoka University)(Minolta Co., Ltd.)(Topcon Corp.)(OMRON Corp.)(University of Tokyo)(Sanyo Electric Co., Ltd.)(Matsushima High Precision Co., Ltd.)(Chitose Inst. Sci. Tech.)(OITDA)(Nikon Corp.)(Sumitomo Electric Ind., Ltd.)(NTT Corp.)(Japan Women's University)(Keio University)(Waseda University)(Nippon Sheet Glass Co., Ltd.)(Sony Corp.)(Sharp Corp.)(The University of Tokushima)(The University of the Air)
(NEPAS)(Kansai University)(Ritsumeikan University)(OKI Electric Co., Ltd.)(ASAHI GLASS CO., LTD.)(Canon Inc.)(University of Tokyo)(Kanazawa Institute of Technology)(Mitsubishi Electric Corp.)(HOYA Corp.)(Hitachi Ltd.)(Hitachi Cable Ltd.)(Fuji Xerox Co., Ltd.)(NTT AFTY Co.)(AIST)(Fujikura Ltd.)(Gunma University)(Olympus Optical Co., Ltd.)(University of Tsukuba)

The organizing committee includes 31 program committee
members from Japan.

Committee Members
Program Committee
Co-chairs
T.
MizumotoY.
Handa(Tokyo Inst. Tech.)(Canon Inc.)

Members
M. Fushimi
K. GotoG. Hatakoshi
H. Hosoya
K. IgaK. Imoto
T.
Ishigure
S. KawaiY.
KokubunK. KurodaT.
Miyamoto
N. Mori
H. Nakajima
S. Nakatsuka
K. Nishizawa
Y.
Ogura
Y.
OtsukaS. Ozawa
T.
SanoT.
Shibuya
H. ShojiT.
SuharaM. Taniyama
Y.
ToriumiY.
Uenishi
H. Yabumoto
K. Yamamoto
S. Yamashita
K. Yokomori(PENTAX Corp.)(Tokai University)(Toshiba Research Consulting Corp.)(Fujikura Ltd.)(JSPS)(New Glass Forum)(Keio University)(Polytechnic University)(Yokohama National University)(University of Tokyo)(Tokyo Inst. Tech.)(KONICA Opto Corp.)(Waseda University)(Hitachi Ltd.)(Polytechnic University)(NEC Corp.)(University of Tokyo)(The Furukawa Electric Co., Ltd.)(Sumitomo Electric Ind., Ltd.)(Tokai University)(Fujitsu Quantum Devices Ltd.)(Osaka University)(Nippon Sheet Glass Co., Ltd.)(Sony Corp.)(NTT Corp.)(ASAHI GLASS CO., LTD.)(Matsushita Elect. Ind. Co., Ltd.)(University of Tokyo)(Ricoh Co., Ltd.)

Overseas Members
E.
AcostaJ. E. Batubara
A.
CarencoP. S. Chung
S.
Fleming
G. D. Khoe
J. R. Leger
Y.
Liu
T.
Possner
H. K. Shin
C. G. Someda
C.M.de Sterke
W. J. Stewart
L.
ThylénW. B. Veldkamp(University of Santiago de Compostela)(University Pelita Harapan)(ALCATEL/OPTO＋)(City University of Hong Kong)(The University of Sydney)(Eindhoven University Tech.)(University of Minnesota)(ITRI)(GRINTECH)(Opticis Co., Ltd.)(University of Padova)(OSA SEC Representative /The University of Sydney)(Formerly Marconi)(KTH)(MIT Lincoln Lab.)

Committee Members
International Advisory Committee
K. J. Ebeling(Infineon Tech. AG)
W. A. Gambling(LTK Industries Ltd.)A. K. Ghatak(Indian Inst. Tech., New Delhi)C.
Gomez-Reino (University of Santiago de Compostela)
M.
Kawazu(MegaOpto Co., Ltd.)B. Y. Kim
(KAIST)P.
Lagasse(Gent University)
S.
Minami(Formerly, Canon Inc.)
R. V. Ramaswamy (University of Florida)
G. C. Righini(IFAC-CNR)L.
Ross(M.u.T)P. T. C.Shih(National Science Council)
Y.
Suematsu(National Inst. Info.)
J.
Tomlinson(JDS Uniphase Corp.)
C. S. Tsai(UC Irvine)
T.
Uchida(Tokai University)

Access
Location of Conference Site
The conference site, Tokyo International Exchange Center,
Tokyo, is located in Odaiba (Waterfront-Area).
Tokyo International Exchange Center
2-79 Aomi, Koto-ku, Tokyo 135-8630 JAPANTEL: +81-3-5520-6001, FAX: +81-3-5520-6011
http://www.tap.aiej.or.jp/index_e.html

Map nearby Tokyo International Exchange Center
Access to Tokyo International Exchange Center; 3-minute walk from "Fune-no-Kagakukan" station on New Transit"Yurikamome" line. It takes 20-minutes from Shimbashi to"Fune-no-Kagakukan" station.
 15-minute walk from "Tokyo Teleport" station on "Rinkai" line. It
takes 15-minutes from Osaki to "Tokyo Teleport" station.
Access to Tokyo area from Narita airport;
 60-minutes from Narita airport to Tokyo by JR "Narita-Express".
 60-minutes from Narita airport to Ueno by "Keisei Skyliner".

Floor Layout
Tokyo International Exchange Center 3rd floor

Registration Desk Open
Tuesday, October 28
Wednesday, October 29
Thursday, October 30
Friday, October 31

18:00 – 20:00
08:30 – 17:00
08:30 – 17:00
08:30 – 12:00

International Conference Hall

MOC '03
October 29-31, 2003
atTokyo International Exchange CenterTokyo, Japan

Important Deadlines
Pre-Registration:
Post Deadline Papers:

October 7, 2003
October 7, 2003

Hotel Accommodations: October 1, 2003

MOC '03 Secretariat
c/o Prof. Tetsuya Mizumoto
Program Co-chair, MOC '03
Dept. of Electrical and Electronic Eng.
Tokyo Institute of Technology
2-12-1 Ookayama, Meguro-ku,
Tokyo 152-8552 JAPANTEL/FAX: +81-3-5734-2578
E-mail: tmizumot@pe.titech.ac.jp
http://www.din.or.jp/~microopt/moc03/