FEATURES

ᰋ From UV to MIR

ᰋ Continuous power monitoring and diagnostics
ᰋ Pumped by PHAROS-UP for ultrashort pulses
ᰋ Up to 80 W, 800 µJ pump at up to 2 MHz

ᰋ Fully integrated wavelength extensions
ᰋ Second repetition rate pump option
ᰋ Exceptional output stability

industrial design, all configurations ensure remarkable
long‑term stability. Most importantly, the device is equippedwith multiple detectors for pump beam position tracking andcontinuous monitoring of output parameters. This results inthe fastest remote diagnostics and troubleshooting capability.

ORPHEUS-NEO is the next-generation optical parametricamplifier. With its simple-to-use and hassle-free design,
ORPHEUS-NEO emerges as an invaluable tool in even themost demanding scientific applications.
The ORPHEUS-NEO is available in several different
configurations providing high-power UV – MIR(210 – 16000 nm). Furthermore, ORPHEUS-NEO can bepumped by sub-100 fs PHAROS-UP, see ORPHEUS-NEO-UP
and ORPHEUS-NEO-ONE-UP. Thanks to its robust

Output power, mW

5000
3000
2000100

30201000

10500

5300200

32100

150

0.5200300500 700 1000
2000 3000
Wavelength, nm

6000

SignalIdler
DFG
VIS–NIR extension

10000

50Output power, mW

10000

20020000

Pulse energy, µJ

SignalIdler
SHS
SHITHS
DFG1
DFG2

5000
4000
3000

50
4030

2000

20

1000

10500
400
300

543200

2100
500

0.3
10000 16000

100

1700

1000 1400

2000

3000 4000

6000

10000

16000

Wavelength, nm

Typical tuning curves of ORPHEUS-NEO in HP configuration.
Pump: 80 W, 800 µJ, 100 kHz

Typical tuning curves of ORPHEUS-NEO-ONE in ONE configuration.
Pump: 80 W, 800 µJ, 100 kHz

Pulse energy, µJ

20020000

30

Inspired by the most demanding users, ORPHEUS-NEO has
been engineered to become the most stable and versatile
tool in ultrafast spectroscopy, and many other scientificapplications.

SCIENTIFIC APPLICATIONS | MICROSCOPY SOURCES | SPECTROSCOPY SYSTEMS | OPCPA SYSTEMS | WAVELENGTH-TUNABLE SOURCES | FEMTOSECOND LASERS

Next-Generation Optical Parametric Amplifier

Output power, a.u.

1.10
NRMSD = 0.4%
1.05
1.00
0.95
0.90

051015202530354045Time, h5055606570758085

Typical long-term power stability of ORPHEUS-NEO at 800 nm

REV. 2303515 | SALES@LIGHTCON.COM | WWW.LIGHTCON.COM29

SCIENTIFIC APPLICATIONS | MICROSCOPY SOURCES | SPECTROSCOPY SYSTEMS | OPCPA SYSTEMS | WAVELENGTH-TUNABLE SOURCES | FEMTOSECOND LASERSORPHEUS-NEO SPECIFICATIONSORPHEUS-NEO

Model
Configuration

ORPHEUS-NEO-ONE

ORPHEUSORPHEUS-ONE

Pump power

Up to 80 W

Pump pulse energy

20 – 800 µJ

Repetition rate 1)

Up to 2 MHz

Tuning range

Conversion efficiency
Spectral bandwidth

640 – 1000 nm (Signal)1050 – 2600 nm (Idler)

1350 – 2000 nm (Signal)
2100 – 4500 nm (Idler)> 7% @ 700 nm(40 – 800 μJ pump; up to 1 MHz)

> 9% @ 1550 nm(40 – 800 μJ pump; up to 1 MHz)> 3.5% @ 700 nm(20 – 40 μJ pump; up to 2 MHz)

> 6% @ 1550 nm(20 – 40 μJ pump; up to 2 MHz)80 – 220 cm-1 @ 700 – 960 nm

60 – 150 cm-1 @ 1450 – 2000 nm

120 – 250 fs

100 – 300 fs

Pulse duration 2)
2

Beam quality (M )< 1.3 @ 800 nm< 1.5 @ 1550 nm

Long-term power stability, 8 h 3)

< 1% @ 800 nm< 1% @ 1550 nm

Pulse-to-pulse energy stability, 1 min 3)< 1% @ 800 nm< 1% @ 1550 nm

210 – 320 nm (THS); > 0.4% at peak
Wavelength extension options;conversion efficiency

640 – 1000 nm and 1050 – 1350 nm;> 1% at peak

320 – 500 nm (SHS) and 525 – 640 nm (SHI);> 1.2% at peak
2100 – 4500 nm (DFG1); > 3% at 3000 nm

4500 – 16000 nm (DFG);> 0.3% at 10000 nm (for > 30 µJ pump)4500 – 16000 nm (DFG2); > 0.2% at 10000 nm¹⁾ Second repetition rate pump option (up to 20 µJ) is available for signal and extension range in HP configuration;
contact sales@lightcon.com²⁾ Output pulse duration depends on selected wavelength and pump laser pulse duration.
³⁾ Expressed as NRMSD (normalized root mean squared deviation).

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTEDOR SCATTERED RADIATION

CLASS 4 LASER PRODUCTORPHEUS-NEO-UP SPECIFICATIONSORPHEUS-NEO-UP

Model
Configuration

ORPHEUS-NEO-ONE-UP

ORPHEUSORPHEUS ONE

Pump power

Up to 20 W

Pump pulse energy
Repetition rate

20 – 400 µJ
Up to 1 MHz1)

640 – 1000 nm (Signal)1050 – 2600 nm (Idler)

Tuning range

1450 – 2000 nm (Signal)
2100 – 4500 nm (Idler)

Conversion efficiency> 7% @ 700 nm> 9% @ 1550 nm

Spectral bandwidth

120 – 250 cm-1 @ 700 – 2600 nm

150 – 250 cm-1 @ 1500 – 1900 nm & 2200 – 3500 nm 2)< 100 fs @ 700 – 1000 nm< 120 fs @ 1060 – 2000 nm< 100 fs @ 1500 – 1900 nm< 1.3 @ 800 nm< 1.5 @ 1550 nm< 1% @ 800 nm< 1% @ 1550 nm< 1% @ 800 nm< 1% @ 1550 nm

Pulse duration 3)
Beam quality (M2)Long-term power stability, 8 h4)

Pulse-to-pulse energy stability, 1 min 4)

210 – 320 nm (THS); > 0.2% at peak
Wavelength extension options;conversion efficiency

320 – 500 nm (SHS) and 525 – 640 nm (SHI);> 1.2% at peak

4500 – 14000 nm (DFG);> 0.2% at 10000 nm

2600 – 4500 nm (DFG1); > 3% at 3000 nm
4500 – 14000 nm (DFG2); > 0.1% at 10000 nm¹⁾ Second repetition rate pump option (up to 20 µJ) is available for signal and extension range in HP configuration;
contact sales@lightcon.com²⁾ Spectral bandwidth is equal to 150 – 250 cm–¹ @ 5000 – 12000 nm.
³⁾ Output pulse duration depends on selected wavelength and pump laser pulse duration.
⁴⁾ Expressed as NRMSD (normalized root mean squared deviation).

30

DANGER: VISIBLE AND/OR INVISIBLE
LASER RADIATION AVOID EYE OR SKINEXPOSURE TO DIRECT, REFLECTEDOR SCATTERED RADIATION

CLASS 4 LASER PRODUCTWWW.LIGHTCON.COM | SALES@LIGHTCON.COM | REV. 2303515

766
46.5

677
2662426030

12512514453

25 (1”)

525 (21”)

For M6 (1/4-20 UNC) screw

390425 (17”)

6 mounting holes

ORPHEUS-NEO / ORPHEUS-NEO-UP drawings

SCIENTIFIC APPLICATIONS | MICROSCOPY SOURCES | SPECTROSCOPY SYSTEMS | OPCPA SYSTEMS | WAVELENGTH-TUNABLE SOURCES | FEMTOSECOND LASERS

DRAWINGS

www.phototechnica.co.jp〒336-0017 埼玉県さいたま市南区南浦和 1-2-17

TEL:048-871-0067 FAX:048-871-0068

e-mail:voc@phototechnica.co.jp
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