TOKYO ELECTRON ANNUAL REPORT 2014

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CONTENTSCONTENTS

Financial Highlights

Business Overview

Top Message

Talking about
Tokyo Electron

Review of Operations
and Business Outlook

Corporate GovernanceCorporate Citizenship

R&D / Intellectual Property

Financial Section

Research and Development

Corporate DataIntellectualIntellectual Property
Property

Research and Development

Continuous Technological Innovation isInitiatives in Miniaturization, 3DI Packaging andRequired in the Semiconductor Industry

Larger Wafer Sizes

The advance of miniaturization and the use of larger wafers have

The evolution of semiconductors has long been synonymous withallowed the semiconductor industry to simultaneously achieve

progress in miniaturization. Tokyo Electron has greatly contributed

higher functionality (faster operation and lower power consump-to device scaling by developing adjacent processes for the latesttion) and cost reduction, building the foundation for the broad
adoption of electronics around the world. In addition to demand

innovative technologies in its products and advance R&D aimed

Initiatives in New Areasat providing even greater value to customers.

Looking to realize sustained growth, Tokyo Electron is also

Going forward, Tokyo Electron will continue to rapidly reflect

focused on utilizing core technologies developed for semiconduc-

Initiatives in Reducing Semiconductor Powerlithography, which has been a driver of miniaturization. Now, theConsumption

business areas.

various technologies related to semiconductors stand at an inflec-Device development going forward is aimed at rapidly processing

gy for OLED panels, which realize reduced power consumption.

for performance improvements, the arrival of smartphones hastion point. Tokyo Electron is developing innovative equipment tolarge-scale data and using less power. Technologies for higher-The Company has released Elius™ 2500, an inkjet printing sys-

created new technical demand for application-oriented semicon-

meet the demands of new technologies.

speed processing include conventional miniaturization with silicon,

tem for manufacturing OLED panels. In place of the evaporation

In the area of Extreme Ultraviolet (EUV) lithography, hailed as thenew materials to overcome the limits of such miniaturization,technology currently used in mass production of OLED panels,

ductor device development, aimed at realizing the functions andtor and flat panel display production equipment to cultivate newIn displays, Tokyo Electron is developing production technolo-

next generation of lithography, Tokyo Electron is engaged in joint

notably indium gallium arsenide (InGaAs) and other III-V semicon-

this system uses inkjet printing to discharge only the necessary

In application-oriented device development, customers look notdevelopment with imec* and other consortia worldwide as well as

ductors, which have high carrier mobility*, as well as layeredamount of organic luminescent material onto large glass sub-only for differentiation in device design, but for diversity of materi-with ASML Holding, the world’s largest supplier of lithography

semiconductor technologies, such as the use of graphene. Tokyo

strates without need of a vacuum, greatly improving productivity

als and process technology as well. Semiconductor production

systems. In double and multiple patterning, which achieves minia-

Electron is actively incorporating the insights of research institu-

in film forming.

equipment manufacturers engage all technical possibilities; Tokyo

turization through the use of deposition and etching technologies,

tions around the world in its development of these next-genera-

Electron implements strategic, efficient technological developmentTokyo Electron is focused on process technologies with priority totion semiconductor technologies.

according to the level of necessity of each technology.

performance that more users want.

Furthermore, in terms of possible applications of printing technology to flat panel display production processes, Tokyo Electron

reducing patterning cost, aiming to bring 10nm nodes to practicalTokyo Electron is engaged in R&D aimed at developing carbon

is involved in JAPERA (Japan Advanced Printed Electronics

Tokyo Electron engages in development aimed at near-term

use. Directed self-assembly (DSA) uses the chemical properties ofmaterials for future practical use with the Low-power ElectronicsTechnology Research Association), assessing cutting-edge appli-

commercialization as well as medium-term development in closematerials to form circuit patterns, without relying on lithography.

Association & Project (LEAP). The Company is furthermore devel-

cation-oriented technologies. Going forward, Tokyo Electron will

collaboration with strategic customers when it is deemed neces-

To quickly establish technology to bring DSA into practical use,

oping technologies related to silicon photonics** for low-power

continue R&D aimed at further growth, exploring business oppor-sary to incorporate core technologies to accelerate commercial-

Tokyo Electron collaborates with imec and participates in EIDEC’s

consumption telecommunications, seeking to realize equipment

tunities in semiconductor and flat panel display production andization. In medium- and long-term development, which will

DSA research program.

and processes that contribute to further power use reduction.

their peripheral areas as well as new business areas.

produce the Company’s mainstay technologies of the future,

At the same time, in the field of 3DI (three-dimensional integration),

As part of efforts to reduce power consumption with next

Tokyo Electron collaborates with universities and consortia towhich utilizes technology for creating high-performance semiconduc-generation devices that operate on new principles, Tokyo

facilitate wide-ranging data gathering and the acquisition of tech-tors through the three-dimensional stacking of chips, Tokyo Electron isElectron participates in a research program focused on STT-nologies. These measures ensure that the Company is compre-

developing equipment and process technology through the process

MRAM (Spin Transfer Torque-Magnetoresistive Random Accesshensively prepared for future technologies. Cutting-edgeintegration evaluation of imec, Sematech and other consortia. WithMemory) at Tohoku University’s Center for Innovated Integrated

technology changes rapidly. Tokyo Electron is boldly advancing

regard to making silicon wafers larger to improve productivity, Tokyo

Electronic Systems, Research and Development.

groundbreaking technological innovation in these areas, laying theElectron is steadily advancing efforts to meet customer demand forpath for future growth.

450mm wafers as a leader in the production equipment market.

facturing technologies for new materials and devices.

* imec: 	imec performs world-leading research in nanoelectronics. Imec leverages its
scientific knowledge with the innovative power of its global partnerships in ICT,
healthcare and energy.

* Carrier mobility: The ease with which electrons can move within a solid substance**	Silicon photonics: Technology for creating integrated circuits that use photons outof silicon

Going forward, Tokyo Electron aims to quickly establish manu-Aiming for sales expansion
through product development inresponse to new technologies

ALD System
NT333™

Metallization System
Triase + ™ EX- ™ TiN

Inkjet Printing System for Manufacturing
OLED Panels EliusTM 2500

Semi-batch ALD system employing a
concept different from existing ALD
processes, realizing high-quality nano-scale
deposition while maintaining highproductivity.

The newest single-wafer metallization system,
for next-generation devices. Compatible with awide range of deposition materials, this system
features lower temperatures, excellent step coverage and film control.

The inkjet process can dispense to ink to just selected areasof substrate without a mask (direct patterning), realizing low
material consumption to greatly reduce production costs.
The inkjet process is excellent for use with large panels andcan be used without a vacuum.

Tohoku University Center for Innovative Integrated Electronic Systems
Tokyo Electron is taking part in the research and development program conducted by Tohoku
University Center for Innovative Integrated Electronic Systems, with the aim of quickly
establishing production equipment technology for STT-MRAM, which is attracting attention asa next-generation memory device.