Semiconductor Production Equipment
Continuous advances in semiconductors are driving the information andwithout continuous advances in the semiconductor production equipment (SPE)tion by helping chipmakers execute their product strategies successfully.

RAPIDLY EXPANDING END-USE APPLICATIONS DRIVE INDUSTRY GROWTH
At one time, personal computers were the main end-use application for semiconductors. Today,
however, a broad array of products rely on semiconductors to offer increased performance andfunctionality, including mobile phones, personal digital assistants (PDAs), game consoles, DVD players and other digital consumer electronic products. Furthermore, new, yet-to-be-imagined applications will continue to fuel demand for chips.

Thermal Systems
Ion Implantation Systems
TOKYO ELECTRON IS A LEADER IN
WAFER FABRICATION EQUIPMENT

Film Deposition Systems

Wafer fabrication equipment uses mainly physical andchemical processes to create minute, multi-layer circuits on round silicon wafers. While various types ofequipment are used for performing these microscopic

Wafer
Fabrication
Equipment

processes, most of these products can be grouped
into several broad categories. Most equipment sup-Lithography/Patterning Systems

pliers focus on a single market segment, but Tokyo
Electron is a world leader in many of them.

Removal Systems

8TOKYO ELECTRON LIMITED— The Source of Innovation
communications revolution. This revolution, however, would not be possiblethat is used to make chips. Tokyo Electron operates at the heart of this revolu-

SEMICONDUCTOR PRODUCTION EQUIPMENT – A LARGE AND
INTEGRAL PART OF THE SEMICONDUCTOR INDUSTRY
The semiconductor production equipment industry is a large and integral part of the semiconductor industry. Information and communications products demand higher performance chips from chipmakers, who demand higher performance equipment from equipment suppliers, whose advances drive the information and communications revolution.

Facilities, etc. 20%

WAFER FABRICATION EQUIPMENT IS A PRIMARY SPE MARKET
Semiconductor production equipment is largely segmented into wafer fabrication equip-Wafer fabricationequipment 55%

ment that is used in the initial stages of semiconductor production, and testing andassembly equipment that is used in the latter stages. Wafer fabrication equipment
accounted for about 55 percent of the $33 billion of total world capital spending for
Testing & assembly equipment 25%

semiconductors in 1999. Tokyo Electron primarily participates in this wafer fabrication

Percent of total capital spending occupied
by wafer fabrication equipment(Source: TEL estimate)equipment market and it maintains a very strong presence globally.

Furnace
Wafer

LP-CVD
RTP
Chemical Vapor Deposition (CVD)
Physical Vapor Deposition (PVD)

Wafer
Wafer

Spin-on Deposition (SOD)Electroplating
Stepper/Scanner
Coater/Developer
Etcher
Asher

Wafer

Wet cleaning
CMP
Tokyo Electron has its own products in these segments
TOKYO ELECTRON LIMITED

9New Mega Trends Drive SPE Demand
Three major trends are taking place simultaneously in the semiconductor industry:– in particular, copper for metalization and low-k (k = dielectric constant) dielectrics
SPE to stay at the leading edge of technology. Tokyo Electron already offers proven
1970
Calculator

1975

1980

1985

Mainframe

Desktop PC

Application

Design Rule

10µm

3µm

0.8µm

Wafer Diameter

50mm

1075mm

100mm

125mm

Front End of Line
Gate materials

Oxide

Front End of Line
Capacitor materials

Oxide / Nitride

Back End of LineInterconnect andInsulator materials

Aluminum + Silicon Dioxide

LARGER WAFER SIZE
REDUCES UNIT COST OFCHIPS

a particularly strong position to capitallineup of 300mm-ready equipment, andSMALLER FEATURE SIZESINCREASE YIELDS ANDPERFORMANCE

Larger wafers reduce unit costs

a fully dedicated 300mm New Process

Current feature sizes are approxi-

because processing a 300mm wafer

Technology Center to support cus-mately 100 times smaller than they

costs little more than processing thetomers’ demands in their transition towere just three decades ago, allowing

current industry standard 200mm

300mm technology.

for smaller, faster chips with substan-ize on this trend, with a comprehensivewafer, but the larger wafers yield signifi-

tiallycantly more chips. Tokyo Electron is in

Decreasing chip size by shrinking fea-

TOKYO ELECTRON LIMITED

increasedperformance.

the move toward larger 300mm wafers, smaller feature sizes and new materials
as insulators. These trends are driving chipmakers to invest in new, highly advanced
solutions for 300mm wafers, smaller feature sizes and low-k dielectrics.
1990

1995

Notebook PCMobile phone

Car navigation system

0.5µm

150mm

0.35µm2000

2005
PDAGame console

0.25µm

0.18µm200mm

0.13µm

300mm

SiON, High-kHigh-εCopper + Low-k

FEOL (transistor) process, andproduced from the same wafer. AsNEW MATERIALS BOOSTCHIP PERFORMANCE

the world’s leading supplier ofIn the 0.13µm generation and beyond,nect and insulation materials in thecoater/developers and oxide etch sys-

decreasing signal delay will become crit-

BEOL

tems that are directly related toical in creating faster chips. The solu-

Historically strong in providing FEOL

reducing feature sizes, Tokyo Electrontion to this problem is new materials.

solutions, Tokyo Electron is also work-

is well positioned to take advantage ofIn the early 2000s, two dramatic

ing to provide integrated BEOL solu-

this trend.

changes will begin to take place: thetions around its core spin-on dielectric

ture sizes allows more chips to be

adoption of high-k and high-ε materials

copper and low-k materials as intercon(interconnect)

process.

system for low-k materials.

for gate and capacitor formation in theTOKYO ELECTRON LIMITED11

Tokyo Electron’s Low-k Toolset Offers
Interconnect Processes
Continuous improvements in semiconductor device performance andLaw, which states that chip density doubles approximately every 18 months.
because the signal time delay has become the largest bottleneck.

Breakthrough Technology

SOD Materials

Dielectric Constant

3.5

Inorganic

3.0

Organic
Hybrid2.5

Inorganic Porous

2.0

Organic Porous
Hybrid Porous
1.5

1999

2000

2001
Year

12TOKYO ELECTRON LIMITED

2002

2003

Integrated Solutions for Advanced
functionality have been achieved by scaling devices according to Moore’s
Further improvements, however, cannot be achieved by scaling alone
TEL’S LOW-K
TECHNOLOGY SOLUTIONStion level. By employing spin-on dielec-

Copper interconnects recently started

Electron enables numerous materials toto come into use as a partial solution to

be used on its tool platforms for coat-the signal delay barrier. To further im-

ing, curing, etching and cleaning. Our

prove device performance and com-

longstanding collaborative alliances withplete the solution, low-k dielectric ma-leading SOD material suppliers around

terials are currently being developed.

the world also ensure that chipmakers

tric (SOD) low-k technology, TokyoTokyo Electron's low-k toolset pro-

receive the optimum technological so-vides chipmakers with the current-best

lutions with the freedom to choose thedielectric k value at the mass-produc-

chemistry that best suits their needs.

Low-k Materials
4.5

Dielectric Constant

4.0

TEOS (SiO2)

3.5

2.5
SOD

2.0

Etch System• UNITY® Ver. IIeFurnace• ALPHA (α)-8SE

HDP-FSG

OSG
3.0

1.5
250

180

150

1301007050

Design Rule (nm)

Cleaning System• PR200Z

Spin-on Dielectric System• CLEAN TRACK ACT® 8 SOD
TOKYO ELECTRON LIMITED

13ENVIRONMENTA C O M M I T M E N T TO S O C I A L R E S P O N S I B I L I T YTokyo Electron believes that preserving and constantly improving the global environment are objectives of thehighest priority both for the Company and for humanity, and must be considered in management. Based on
this philosophy, we are determined to remain in harmony with the global environment through a wide range
of environmental protection activities as we expand our business. Doing so will help us retain the trust ofcustomers, shareholders, employees, local communities and society in general.

Milestones in Environmental ProtectionTo 1995:
Carried out studies for an environmental management system
Eliminated CFC usage
1996:
Established first Tokyo Electron Environmental Committee
Implemented environmental management system
1997-1999:
Obtained ISO 14001 certification of the environmental
management systems at seven main domestic plants
1999:
Created Product EHS Roadmap
2000:
Began environmental accounting

Specific Activities
ISO 14001 Certification
Tokyo Electron has devoted substantial resources to obtaining ISO 14001 certification, an international standard for environmental management systems.
The Company began working to obtain this certification in 1997, and obtained
it for all domestic plants by the end of 1999, with the exception of Tokyo
Electron Miyagi Limited. As the certifying body, Tokyo Electron used Det
Norske Veritas (DNV), which has extensive experience in environmental management and had carried out the Company’s audit for ISO 9001 certification.
Preparations for certification are under way at Tokyo Electron Miyagi Limited,which began operations in 1998, and the Company is aiming for certification inApril 2002. In the future, Tokyo Electron plans to obtain ISO 14001 certification for its U.S. plants.
Development of Environmentally Friendly ProductsTokyo Electron is active in developing products with reduced environmental impact. The CLEAN TRACK ACT® 8 coater/developer and the UW200Z cleaningsystem both incorporate new design concepts that significantly reduce footprint,
energy consumption and chemical usage compared with previous models.
Moreover, the Company is conducting R&D with C5F8, a fluorine gas that reduces the effects that lead to global warming without any sacrifice in technicalspecifications, and is now using it in the etching system process. The C5F8
process received recognition as a method to combat global warming from14

TOKYO ELECTRON LIMITEDSemiconductor Equipment and Materials International (SEMI) Japan in December1999. Also in 1999, Tokyo Electron created its Product EHS Roadmap to support concrete measures to reduce the environmental impact of each system theCompany supplies, in an effort to produce products that are even more environmentally friendly.
Chemical Management
The control of chemical substances requires not only compliance with the law,
but also comprehensive management that includes toxicity evaluation and measures for safe storage and dealing with emergencies. Tokyo Electron is therefore
striving to establish a system for reviewing and registering newly purchasedchemical substances, and is moving forward with a rigorous program to stop pollution before it is produced. Moreover, in April 2000, domestic facilities implemented the Pollutant Release and Transfer Register (PRTR) system, which entails computing the amounts of each listed chemical substance released into theenvironment and providing reports to governmental and trade organizations.
Waste Reduction, Recycling and Other Activities
Demonstrating the effectiveness of Tokyo Electron’s efforts to reduce waste
products and consumption of energy and resources and to promote recyclingand green purchasing, domestic facilities produced 21 percent less waste in 1998
than in 1997. The Company’s recycling ratio has increased significantly, from
15.3 percent in 1996 to 40.9 percent in 1997 and 49.7 percent in 1998.
Administrative divisions are promoting the purchase of environmentally friendly
paper products, office supplies and printed matter.
Contribution to Customers, Communities and the Industry
Tokyo Electron’s proactive efforts to develop environmentally friendly products
make a material contribution to our customers’ efforts to protect the environment. We also cooperate with environmental initiatives in every region weserve. In addition, we actively participate at every stage, from planning to implementation, of industry efforts regarding disclosure and standards. We intend tofurther build on our record of corporate citizenship.
Implementation of Environmental Accounting
From the year ending March 2001, Tokyo Electron’s domestic operations will
begin using environmental accounting in order to quantify the effectiveness of environmental protection activities.
Disclosure
Tokyo Electron will promote broader awareness and understanding of its efforts
to protect the environment by publishing an annual environmental report beginning in 2001.

TOKYO ELECTRON LIMITED15