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Fig. 2

Schematic conguration of SPring8 XFEL facility.

r[ªzÌV~[VÆCFEL úËÁ«ÌV~[VR[hiSIMPLEX12)jðgÝí¹ÄvZ
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Aerial view of SPring­8 campus.

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58  úËõ March 2009 Vol.22 No.2

[^àÌr[O¹ÌÎüpð\·p[^Mbvð²®·é±ÆÅÏðà ¡ SPring­8 É¨¯é XFEL/EUV_FEL r[CTable 1

Parameters of electron beam and undulator

Electron beam
Beam energy (GeV)

8

Peak current (kA)

4.4

Slice emittance (pmm.mrad)

0.77

Slice energy spread

7.1e_5

Total charge (nC)

0.29

Bunch width (fs, FWHM)

55

Beam size at ID exit (um, rms)

35

Repetition rate (Hz)Fig. 3

Peak power and pulse energy as a function of photon energy.
The corresponding K­parameters are shown in the graph.

Fig. 4

Time spectrum at K2.2. The red line shows a guide line af­
ter smoothing.

Fig. 5

Energy spectrum at K2.2. The red line shows a guide line
after smoothing.

60 (max) to 1 (min)Undulator
Periodic length, lU (mm)18

Segment length (m)5Number of segment

18

Maximum deection parameter, K

2.3

Average betatron function bx/by (m)25/25Table 2

FEL radiation parameters at K2.2 (for fundamental
radiation)

FEL parameter

4.4e_4

Radiation wavelength (nm)0.13

Photon energy (keV)

9.9

Bandwidth

9.2e_4Source size ( mm, rms)

33

Angular divergence ( mrad, rms)

0.73

Beam sizesample position( mm, rms, 100 m from ID exit)

80

Peak power (GW)

29

Pulse energy (mJ/pls)

0.78

Photons per pulse (phs/pls)

5.0e11

Pulse width (fs, FWHM)

30

Repetition rate (Hz)60 (max) to 1 (min)Power ratio of higher­order harmonic(2nd:1st)

1.3e_4

Power ratio of higher­order harmonic(3rd:1st)

2.8e_
3¤ðSÉ½åÈv£ªúÒ³êéB±¢ÄCFigs. 4 Æ 5 ÉCGlM[XyNgCÔX
yNgð¦·BXyNgÌ÷×\¢ÍC©­õÌVbgmCYð½fµ½àÌÅèCpXÉÙÈé±éBFig. 4 É¦·æ¤ÉCXFEL ÌXÅ«éBK lð2.2©ç1.1ÜÅÏ¦é±ÆÅCõqGl

ÆÉÓ·éKvªM[ð10©ç20 keV ´ÜÅ¸Å«éB±ÌõqGl

pXÍ30 fsiFWHMjöxÆ©ÏàçêÄ¢éB±M[ig·jÌ¸ÍCdqr[ÌGlM[ÌÏXÌlÍCTable 1 É¦·dqr[Ìo`·i50 fsjæÉæÁÄà´IÉÍÂ\ÅèàZ­ÈÁÄ¢éB±ÌRÍCÊíÌúËõÆÙÈèC

éªCÁ¬íp[^Ìå«ÈÏXðº¤½ßZÔÅÌØÖÍïµ¢BAW

XFEL Ì­xÍdqÆñü`ÌÖWÉ[^Éæég·¸ÍCÅèMbvAW[^ð`Ìëªªæè­²³êéÆ¢¤±ÆÉîÃ¢Ä¢éBÌpµ½ LCLS ÉÍÝçêÈ¢å«ÈÁ¥ÅèCªõ

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úËõ March 2009 Vol.22 No.2  59

Table 3

Mirror
1&2a

Mirror
1&2b

Double­crystal
monochromator

Incident angle

4 mrad2 mrad3.7`30

Photon energy range`9 keV `18 keVwith SiC with SiC

4`30 keVwith Si 111

\

\

0.01÷
with Si 111

Length of optics along
optical axis

400 mm

400 mm

100 mmSpatial acceptance

1.6 mm

0.8 mm6.4 mm

Bandwidth

Fig. 6

Parameters of main opticsConguration of beamline in the Experimental Hall. OH:
Optics Hutch, EH: Experimental Hutch.

GlM[ðº°é±ÆÅC·g·¤ÖÌAv[`àÂ\ÅéB

3. XFEL r[CÆîÕZp
3.1\¬

Fig. 7XFEL r[CÍCtgGhCõwnÉA
nCõwnb`ÉÀ±nb`Æ¢Á½vf©ç\¬³ê

Layout of beamline components. Main optical components
are indicated as the blue line for high­energy double mirror,
the red line for low­energy double mirror, and the green line
for DCM, respectively.

éiFig. 6jB±Ì¤¿CtgGhÍõ¹û[àÉÝu³êCR[^ÉæèsvÈn[ðæè­B»êÈOÌªÍCÀ±z[àÉzu³êéBõwnÉA

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Table 4
Parameter

Target Performance of multi­port charge coupled device (MP_CCD) detector
Target Value

Units

Pixel size

50~50
100~100

mm2

Operating Temperature

0`|50CC

Detection Eciency
System Noise

80

÷

20
0.2

photons

330

e|

5
Full Well Capacity

Schematic sensor format of multi­port charge­coupleddevices (MP­CCDs) with 8 readout nodes (left), and a tiled
detector with stepped array of 8 devices with total pixel
number of 4k~4k (right). Each readout node operating 5
M pixel/sec readout rate enables synchronization to the
XFEL repetition rate of 60 pps. The tiled detector has athrough hole at the center, of which the size can be con­trolled remotely.

3100
20
12400

Comments
in 2~2 binning mode

6 keV x­rays
12 keV x­raysfor 6 keV x­rays

Me_/pixel

for 6 keV x­rays

photons/pixel
Me_/pixel

in unbinned mode

photons/pixel

Frame Rate

60

Hz

Dead area width

300

mm

Tiling Capability

3­side buttable

N/A

Radiation Hardness

4~1011

photons/pixelfor 6 keV x­raysin 2~2 binning mode

3 eective pixels in 2~2 binning modefor 12 keV x­ray

úËõ March 2009 Vol.22 No.2  63

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éB±Ì½ßðà ¡ SPring­8 É¨¯é XFEL/EUV_FEL r[CTable 5

Radiation properties of EUV_FEL at a beam energy of EB
250 MeV (for fundamental radiation)b ^[C§ ß^õ­x j^[C§ ß^õÊu j^[Cªò`o[jðzu·éBu` D, E, F,

Radiation wavelength at saturation
condition (nm)50`61Photon energy at saturation condition (eV)20`25

Bandwidth`1e_2

ð®õ·é\èÅSource size ( mm, rms)`90

¯úµ½õw[U[VXeð®õµCÜ½[U[ÌAngular divergence ( mrad, rms)

`90

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Unfocused beam sizesample position(mm, rms, 27 m from ID exit)`3

Pulse energy at sample ( mJ/pls)`10

Photons per pulse (phs/pls)`3e12

p¤ÍC2007N10©ç2008N 3 É©¯ÄC¶Intensity uctuation (÷)

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Polarization

Horizontally linear

Repetition rate (Hz)20 (max) to 1 (min)(Design max.: 60)

Power ratio of higher­order harmonic(2nd:1st)
Power ratio of higher­order harmonic(3rd:1st)

`1e_3
`1e_2

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ÉC±êçÌÀ±©ç SCSS ±Á¬íÌp¤É¨¯éÌ¬Êà¾çê½11) B±êðó¯ÄCi{ÅÍ2008N 1 `2 É©¯ÄÛèöåðs¢C5 æè{iIÈpÀ±ðJnµ½B2008NxÍ 3 úÉª¯ÄöåªsíêCv25¤ÛèiXFEL piÛè17ÛèCêÊp 8 ÛèjªÌð³ê½BêÊÛèÌÉÍCtXChCcCO©çÌÛèàÌð³êÄ¢éB
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Fig. 12 Spectra of EUV_FEL. The blue and black lines show in­
dependent single­shot spectra, while the red line cor­
responds to an average prole over 100­shots.

×½ªCÀ±Xe[VðSÆµÄÜ¾èªñÁÄ¢È¢ªÍRÏµÄ¢éBäXÉÍS­©¦Ä¢È¢ªàéÉá¢È¢B³çÉCXFEL ÍCPÉ­ÍÈ X üÌ­¶uÉÆÇÜç¸Cù¶ÌTCGXðZÉ­W³¹CVµ¢¤ðn¢·éêÆµÄÌðªúÒ³êÄ¢éBÀÛÉC[U[ÈwâåKÍV~[Vð

Í¶ßÆµ½lXÈæ[ªìÆÌR{[VªÅß}¬ÉiñÅ¢éBÜ½COÆÌ£É¦²àêwåKÍÉÈÁÄ«½B±Ìæ¤È]ÌÏOªÊpµÈ¢¬×Æµ½óµðØè²¯Ä¢­½ßÉÍCvWFNgÌ
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éBlÉ§³êé

¹ÅÍÈ¢ªC¢¥ÌrìðJñ·é`Xà»¤éàÌÅÍÈ¢B{eªC»ÌêàÖÌêÆÈé±ÆðúÒ·éBFig. 13

Layout of EUV­FEL beamline.

XFEL r[CÌÝvÉJ­É½ÁÄÍCi{ÌÀSÝvO[vióìFTO[vfBN^[jyÑ§änÝO[vicÇ¾YO[vfBNàÌu` B ÍC{Ý¤Ì¤ÊîÕ@íivt@^[j©çSÊIÈT|[gð¸¢Ä¢éBÜ½CFJ³

Cj^[CõÊ²®pAbel[^[CpX§äVF{·CkºpjO[vfBN^[CV|ÏOúËõ March 2009 Vol.22 No.2  65[vfBN^[ðnßÆ·évWFNgÌo[ÉàúéãÜµð¸¢Ä¢éB³çÉCJASRI õ¹Éõ8)

wnå©çà½åÈé²w±É²¦Íð¸¢Ä¢éBü

9)
10)
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12)

ßÄ´ÓÌÓð\µ½¢B

Ql¶£
1)
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1977Nåwåw@Hwn¤È¨HwêUC1982N
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åwHw¨HwÈ³öC1996N»w¤åC¤õðoÄC2006N10æè»EBðà ¡ SPring­8 É¨¯é XFEL/EUV_FEL r[CXFEL/EUV­FEL beamlines at SPring­8
Makina YABASHI1, Takaki HATSUI1, Tadashi TOGASHI1, Kenji TAMASAKU1,
Mitsuru NAGASONO1, Atsushi HIGASHIYA1, Togo KUDO1,2, Hiroaki KIMURA1,2,
Haruhiko OHASHI1,2, Shunji GOTO1,2, Sunao TAKAHASHI1,2, Yoshihito TANAKA1,
Hiromitsu TOMIZAWA1,2, Takashi TANAKA1, Toru HARA1, Hitoshi TANAKA1,
Kazuaki TOGAWA1 and Tetsuya ISHIKAWA1
1RIKEN, XFEL Project Head Oce, Kouto 1_
1_1, Sayo, Hyogo 679_
5148
2JASRI, Kouto 1_
1_1, Sayo, Hyogo 679_5198

Abstract We report on the present status of FEL beamlines at SPring­8. An XFEL beamline is under con­struction towards the launch of user operation scheduled in 2011. Plans for a beamline conguration, an opti­
cal scheme, a data acquisition system, 2_D detectors, and a synchronized laser system are described. For EUV_FEL utilization, a beamline was constructed at the SCSS test accelerator. User operation started in May,
2008.

úËõ March 2009 Vol.22 No.2  69