High Performance
Laser Mirrors- Chirped Mirror- Low Dispersion Mirror- High Power Laser Mirror- Ultra Broad Band Mirror- Ultra High Reflectance Mirror

Boundaries

Schematic of multilayer mirror

Electric fieldin multilayer mirror

For femtosecond lasers

Broad Band Chirped Mirror
with Negative GDDApplication :Pulse compensation of femtosecond laser beam

Feature :Wide band, Dispersion,Flat GDD (<0)

Dispersion compensation in wide wavelength is an

Exampleimportant technology for obtaining an ultrashort

PDpulse with the pulse width less than 10fs. Dielectric2ω

multilayer mirrors can be applied for this purpose, if its

ωTMP

reflective phase,φ, is properly adjusted to the intendedsystems. For up-chirped pulse, negative group delay

dispersion (GDD), - ∂ 2 φ/∂ω 2 , is required. We havedesigned two kinds of chirped mirrors, which cancel
each other oscillation of GDD in order to obtain a nearly

Mirror-2

flat negative GDD as a function of wavelength. Somefeatures of the mirrors are a constant negative GDD

Hishikawa lab.@Nagoya Univ.

Mirror-1

and high reflectance for wavelengths between 600nm1000nm.

Mirror-1

Mirror-2

Average

Mirror-1

Mirror-2

Average

150
100

95

ＧDD(fs2 )Reflectance(%）

10090500-50-100

85-150
80

500

600

700

800

900

1000-200

550

600

650

Wavelength(nm)Wavelength
600-1000nm

AOI0°~ 5°

700

800

850

900

950

1000

Wavelength(nm)Reflectance
≧98%

GDD
2-40fsSize

Part number

φ25.4 x 5t

CGS-002505-10

φ30 x 5t

CGS-003005-10

φ50 x 5t

CGS-005005-10*custom products are also available
4750

www.tokaioptical.com/en/1050

For femtosecond lasers

Broad Band Chirped Mirror
with Negative GDD and TOD
Application :Pulse compensation of femtosecond laser beam

Feature :Wide band, Dispersion compensation up to 3rd order

For the sake of precise control of pulse shape, higher
order dispersion compensation is required. Since, in

Auto correlation

general, group velocity dispersion (GVD) of mediums
is large in shorter wavelength, larger negative GDD isArbitary unit

expected for chirped mirrors. This chirped mirror has
been designed to compensate for GVD up to the 3rdorder dispersion (TOD), -∂3φ/∂ω3, where GDD<0 andTOD<0. By using these mirrors in combination with themirrors listed in P4, pulses with wide spectral width

6.2fs

broaden by self phase modulation are compressed to6.2fs (almost Fourier transformation limit). Measured
auto correlation is shown in the right graph.

Delay time (fs)Hishikawa lab.@Nagoya Univ.

Mirror-1

Mirror-2

Average

Mirror-2

Average100
5095

ＧDD(fs2 )Reflectance(%）

Mirror-1

150

100

90

0-50-100

85-150
80

500

600

700

800

900-200

1000

550

AOI

Reflectance0°~ 5°

700

750

800

850

900

950

1000

GDD

Size-75fs (600nm) ～2-0fs (1000nm)
TOD=-127fs3 (800nm)

φ25.4 x 5t

CTS-002505-10

φ30 x 5t

CTS-003005-10

φ50 x 5t

CTS-005005-10

2600-1000nm

6501050

Wavelength(nm)Wavelength(nm)Wavelength

600

≧98%

Part number*custom products are also available

www.tokaioptical.com/en/

5For femtosecond lasers

Chirped Mirror for 800nm- The fundamental of Ti-sapphire laser Application :Pulse compensation of femtosecond laser beam

Feature :High reflectanceThis chirped mirror is design for theChirped mirror

dispersion compensation of up-chirped pulses
with wavelengths around 800nm. Somefeatures of this mirror are a constant negative
GDD and high reflectance for wavelengths
between 750nm-850nm. The mirror coated on
the rectangular substrate is also listed, which
will be helpful to obtain large amount of GDD
by multiple reflections between two opposite
mirrors.

10040

ＧDD(fs 2)

Reflectance(%）

20
95
90

0-20
-40

85-60

80

-100-80
700

720

740

760

780

800

820

840

860

880

900

920

720

740

760

780

Wavelength(nm)Wavelength
750-850nm

AOI0°~ 5°

800

840

860

880900

Wavelength(nm)Reflectance≧99.5%

GDD
2-40fsSize

Part number

φ25.4 x 5t

CTF-002505-10

φ30 x 5t

CTF-003005-10

φ50 x 5t

CTF-005005-10□20 x 40 x 5t

CTF-204005-10*custom products are also available
6820

www.tokaioptical.com/en/

920

For femtosecond lasers

Chirped Mirror for UV- The second harmonics of Ti-sapphire laser Application :Pulse compensation of UV femtosecond laser beam

Feature :High reflectance and dispersion compensation in UV region

Dispersion compensation is an important
technology in the Ti-Sapphire laser systems.
In the molecular science, there are many

Chirped mirrors

800nm

cases where the second harmonics of theultrashort pulses are used. In these cases,
careful attention is required for larger

BBO

dispersion of the group velocity of medium

400nm

in the ultraviolet (UV) region. With this inmind and through the collaboration with
Hishikawa lab. of Nagoya University, thisChirped mirrors

chirped mirror has been developed for thesake of the dispersion compensation in theUV region.
10050952ＧDD(fs )Reflectance(%）

100900-508580-100-150360380400420

440460385

390

Wavelength(nm)Wavelength395-405nm

AOI
0°~ 5°395

400405410415

Wavelength(nm)Reflectance≧99.5%

GDD
2-50fsSize

Part number

φ25.4 x 5t

CUV-002505-10

φ30 x 5t

CUV-003005-10

φ50 x 5t

CUV-005005-10□20 x 40 x 5t

CUV-204005-10*custom products are also available

www.tokaioptical.com/en/

7

For femtosecond lasers

Low Dispersion Mirror
Application :Turning mirror for ultra short pulses

Feature :Low dispersion and high reflectanceFemtosecond pulses are easily broadened
and lose their high intensity peak when
they propagate in mediums or are reflectedby standard multilayer mirrors. This leads
to difficulty with utilizing the femtosecond
pulses’ high peak during use. This mirror isdesigned to reduce changes in pulse shapethrough reflection. The result is shownin the image to the right. The short pulse
sustains the sharpness even after changing
its propagating direction from this mirror.
Energy loss can be reduced compared to thatof metal mirrors.

45deg s-pol.

45deg s-pol.

45deg p-pol.

45deg p-pol.

150100ＧDD(fs2 )Reflectance(%）

100

95
90
85
80
660

500-50
-100
-150

700

740

780

820

860

900

680

940

720

760

840

880

Wavelength(nm)Wavelength(nm)Wavelength

AOI

Reflectance

GDD

Size

700-900nm(s-pol.)750-850nm(p-pol.)45°≧99%(s-pol.)≧97%(p-pol.)≦-50fs2Part number

φ25.4 x 5t

LDF-002505-10

φ30 x 5t

LDF-003005-10

φ50 x 5t

LDF-005005-10*custom products are also available
8800

www.tokaioptical.com/en/920

For femtosecond lasers

High Power Laser Mirror
Application :High power laser systemsFeature :High laser induced damage thresholdIn high power laser systems, multilayer mirrors arepolarization states are independent of each other. In

required to have high laser induced damage threshold

general, the intensities became large near the incident(LIDT), since damage to the mirrors prevents increasing

medium. It had been pointed out that if the strong

the output energy of the system. To make a mirror’s

intensity peaks are located at boundaries, the mirror is

LIDT high, our mirrors are designed by taking into

easily broken down by high powered laser beams[1,2].

account the distribution of the electric field (EF) formed
by incident laser beams in the mirrors.

For the sake of application for high power laser
systems, our mirrors are optimized to shift the EF

The right figure shows standing waves of EF in a

intensity peaks from boundaries (shown by verticalmirror for 1064nm. The intensities are normalized bydotted line), keeping high reflectance for the wave.

the intensity of incident waves. The standing waves[1] B.E. Newman, S.R. Folty, L.J. Jolin and C.K. Carniglia,originate in the interference between propagating waves
and reflected waves from respective boundaries, wherewaves in orthogonal

45deg s-pol.

2.0
EF intensity

Reflectance(%)

45deg p-pol.

95908580

Publ.638, p.3 63[2] Y. Sato, M. Kobiyama, S. Kimura and S. Tamura:daikoshi kiho, 39-4, p156 (1988) (in Japanese)

45deg s-pol.

100“Laser Induced Damage in Optical Materials:1981”, NBS Spec.

1.5
1.0
0.5
0.0900950

1000 1050 1100 1150 1200 1250

45deg p-pol.

0(Air)

500

1000

1500

2000

2500

3000

(→Substrate)

Thickness from the suface(nm)Wavelength(nm)Wavelength
1064nm
532nm
355nm
248nm

AOI

Reflectance≧99%(s and p-pol.)45°≧99%(s and p-pol.)≧99%(s and p-pol.)≧99%(s and p-pol.)LIDT♯(p-pol.)134 J/cm 2
121 J/cm 247 J/cm 2
5.8 J/cm 2

Size

Part number

φ25.4 x 5t
φ30 x 5t

Listed on P14

φ50 x 5t

*custom products are also available# Evaluation method: 1-on-1, pulse width: 8~10ns
The LIDT’s listed in the table are typical values (not guaranteed).

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9

For high power lasers

Dual Wavelength Mirror
for High Power Lasers
Application :Second harmonic generation, High power laser systems

Feature :High laser induced damage threshold for 1064nm and 532nm
LIDT evaluation

simultaneously in an optical system. Fore x a m p l e , t h e l a s e r b e a m s a r e N d : YA G

Optical layout

fundamental wave (1064nm) and its second
harmonic wave (532nm) generated by thePol.HWP

wavelength conversion technique. The optics
used in the system, such as multilayer mirrors
and optical thin film filters, are expected

f 2000or
f 1000CCD camera
Biplanar

BSto have complex spectral reflectance and/orDM
KTP crystal
7 x 7 x 7 HWP@532Samples
Wave length
Pulse length
Spot size x
Spot size y
AOImethod. The high LIDTs of this mirror havebeen confirmed experimentally by the InstituteReflectance(%)

This mirror
Standard mirror *1064nm 532nm 1064nm 532nm
11.8ns8.2ns 11.8ns
8.2ns
208μm
202μm 316μm
438μm
373μm
276μm 430μm
695μm
0 deg

LIDT100

This mirror
112 J/cm2>180 J/cm280

1064nm532nm

604020500

600

Pol. HWP

Conditions (1-on-1)

designed by extending the conventional design0BSPM
1064nm[ Institute for Laser Technology ]both 1064nm and 532nm, where this mirror isof Laser Technology.

1064nm BSDM

powered laser beams.
laser induced damage thresholds (LIDT) forPM
532nm

532nm

Sampletransmittance as well as the resistance for highWe propose dual wavelength mirror with highPulse selector& Amplifier

with different wavelength are often used

Quanta-ray(Spectra-Physics)
1064nm, 10ns

R e c e n t l y, t w o h i g h - p o w e r l a s e r b e a m s

700

8009001000

1100

Standard mirror *67 J/cm2
46 J/cm2* The “Standard mirror” ’s data are shown to compare
the LIDT to this mirror’s LIDT. The both mirrors havebeen coated by the same coating process using samelayer materials.

Wavelength(nm)Wavelength
532nm / 1064nm

AOI

Reflectance

LIDT*Size

Part number

112 J/cm2(1064nm)> 180 J/cm2(532nm)

φ25.4 x 5t

HPD-002505-10

0°≧99%(1064nm)≧99%(532nm)

φ30 x 5t

HPD-003005-10

φ50 x 5t

HPD-005005-10* The LIDT’ s listed in the table are typical values (not guranteed).
10

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For special application

Ultra Broad Band Mirror
Application :Harmonics of Nd:YAG laser, gas laser, etc.,

Feature :High reflectance at wide AOI in wide wavelength

This mirror is constructed by dielectric

100

materials with over 200 layers. Since the film
ion beam sputtering to the coating process,the optical loss is very low regardless ofthe film’s high thickness. The main feature

95
Reflectance(%)

quality is very high as a result of applying90(Al mirror)

85(Ag mirror)

0°80of this mirror is to have high reflectance

75for wide wavelengths and a wide angle of70

50°(s-pol.)50°(p-pol.)

300

400

500

600

incidence regardless of the polarization. This700

800

900 1000 1100 1200

Wavelength(nm)mirror will allow greater flexibility whenconstructing laser systems.
For reference, the spectral reflectance iscompared to that of an Ag mirror and Al
Reflectance(%)

mirror in the right graph.

Angleofincidth(nm)encegWavelen(°)

Nd:YAG 1064nm
Yb:YAG 1030nm
Ti:Sapphire 600-1100nm
He-Ne 633nm

Nd:YAG (THG) 355nm
Ar 458, 488, 514nm
Nd:YAG (SHG) 532nm

Wavelength350-1100nm

AOIReflectance0°~ 50°≧98%Size

Part number

φ25.4 x 5t

BBM-002505-10

φ30 x 5t

BBM-003005-10

φ50 x 5t

BBM-005005-10

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11

For special application

Ultra High Reflectance Mirror
Application :: Cavity ring down spectroscopy

Feature :: High reflectance over 99.99%

This mirror has an extremely high reflectanceof over 99.99% at 1064nm. Although a highCavity ring down measurement

reflectance of nearly 100% is possible theoretically,This mirror

it is difficult to actually coat such mirrors. Special
attention should be paid to the quality of coating

Leaking light1064nmmaterials and the substrate as well as the coatingprocess.
Normalized light Intensity
leaking from the cavity

We produce this mirror by using the ion beam
sputtering method in the coating process. The
right graph is an evaluation of the mirror by thecavity ring down method. From the fittings of lightintensity leaking from the cavity constructed bythese mirrors with plano and 1m concave surface,

10.8
0.6m/sm0.4

Fitting curve

0.20

the geometric mean of the respective mirror’s

0reflectance is evaluated as R>99.99%.

100.00
99.99
99.98
99.97
99.96
99.95
99.94
99.93
99.92
99.91
99.90
980 1000 1020 1040 1060

246Time (×10-5s)

8Reflectance(%）↑

R ＞ 99.99%@1064nm

1080 1100

1120

1140

1160

Wavelength(nm)Wavelength1064 nm
1064 nm
12AOI
0°0°Reflectance≧99.99%≧99.99%Size

Part number

φ25. x 5t(Plano)
φ25.4 x 5t(1m concave)

UHR-002505-10
UHR-002505-20

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10www.tokaioptical.com/en/13Products list
Classification

Name

Part number

TypeCGS-002505-10
Broad Band
Chirped Mirror
with negative GDDBroad Band
Chirped Mirror
with Negative GDD
and TOD
Chirped Mirror
For ultrafast lasers

Chirped Mirror
for 800nm

Chirped Mirror
for UVCGS-003005-10
CGS-005005-10

2 pair□20×40×5t
φ25.4×5t

CTS-005005-10

2 pair

CTF-002505-10

φ25.4×5t

CTF-003005-10
CTF-005005-10

1 piece□20×40×5t
φ25.4×5t

CUV-003005-10
CUV-005005-10

LDF-003005-10

1 piece

φ30×5t
φ50×5tφ30×5tφ30×5t1 piece

HPF-005005-10≧98%-75fs2(600nm)～0fs2(1000nm),
TOD=-127fs3(800nm)

750-850nm

0°～ 5°≧99.5%-40fs2395-405nm

0°～ 5°≧99.5%-50fs2700-900nm(s-pol.)750-850nm(p-pol.)45°≧99% (s-pol.)≧97% (p-pol.)≦-50fs2

1064nm

45°

≧99%

-

532nm

45°

≧99%

-

φ30×5t

355nm

45°

≧99%

-

φ30×5t

266nm

45°

≧99%

-

φ30×5t

248nm

45°

≧99%

-

1064nm (R)532nm (R)

0°≧99% (1064nm)≧99% (532nm)-

1064nm（T)/532nm（R）

45°≧99% @1064nm≦0.5% @532nm-532nm（T）/355nm（R）

45°≧99% @532nm≦0.5% @355nm-350nm-1100nm

0°-50°≧98%(s and p-pol)-φ25.4×5t
1 piece

HPD-005005-10

φ30×5t
φ50×5t

BSF-002505-10

φ25.4×5t
1 piece

BSF-005005-10

φ30×5t
φ50×5t

BSS-002505-10

φ25.4×5t
1 piece

BSS-005005-10

φ30×5t
φ50×5tBBM-002505-10

φ25.4×5t
1 piece

BBM-005005-10

φ30×5t
φ50×5t1 piece

φ25.4×5t
Plano1064nm0°≧99.99%-1 piece

φ25.4×5t
1m concave

1064nm0°≧99.99%-Ultra High Reflectance Mirror
UHR-002505-20

0°～ 5°

φ50×5t

HPD-002505-10

UHR-002505-10

600-1000nm

φ25.4×5t
1 piece

HPK-005005-10

BBM-003005-10-40fs2

φ50×5t

HPK-002505-10

BSS-003005-10≧98%

φ25.4×5t
1 piece

φ25.4×5t

BSF-003005-10

0°～ 5°

φ50×5tHPF-002505-10

HPD-003005-10

600-1000nm

φ25.4×5t
1 piece

φ50×5t

HPK-003005-10

GDD

φ50×5t

HPT-005005-10

HPF-003005-10

Reflectance

φ25.4×5t
1 piece

HPT-002505-1014

φ30×5t
φ50×5tφ25.4×5t
1 piece

HPS-005005-10

HPT-003005-10

AOI□20×40×5t

HPS-002505-10
HPS-003005-10

For specialapplications

φ50×5tCTF-204005-10

HPF-005005-10

Ultra Broad Band Mirror

φ30×5t

CUV-002505-10

HPF-002505-10

Beam Splitter

φ50×5t□20×40×5t

HPF-003005-10

Dual Wavelength Mirror
for High Power Lasers

φ30×5tCTS-204005-10

LDF-005005-10

For high power lasers

φ50×5t

CTS-002505-10

LDF-002505-10

High Power Laser Mirror

φ30×5tCGS-204005-10

CTS-003005-10

Wavelength

φ25.4×5t

CUV-204005-10

Low Dispersion MirrorSize(mm)www.tokaioptical.com/en/www.tokaioptical.com/en/15

www.tokaioptical.com/en/

121 Koeda, Shinpukuji-cho, Okazaki-city, Aichi, 444-2106, JAPANTel:+81-564-45-8000

Fax:+81-564-45-8001

E-mail: thinfilm@tokaiopt.co.jp