Tuesday, November 5
Room E (2F)
13:30-16:40 MNC 2013 Technical Seminar in Japanese
Room F (2F)
17:00-19:00 Get Together Party

Wednesday, November 6
Room A (Royton Hall A, 3F)
6A-1: Plenary Session
Chairpersons: T. Kozawa (Osaka Univ.) and M. Nagase (Univ. of Tokushima)
9:30-9:50
Opening Remarks: T. Meguro (Tokyo Univ. of Sci.)
Award Presentation: T. Kozawa (Osaka Univ.) and T. Meguro (Tokyo Univ. of Sci.)
MNC 2012 Outstanding Paper, Most Impressive Presentation, Most Impressive Poster and Young Author’s Award
Announcement from Committee: Y. Miyamoto (Tokyo Inst. of Technol.)
6A-1-1
9:50
Strategy and Dreams of the Future Lithography (Plenary)
J.J.H. Chen, TSMC, Taiwan
Lobby (in front of Royton Hall, 3F)
Coffee Break
6A-1-2
10:50
STT-MRAM and NV-Logic for Low Power Systems (Plenary)
T. Endoh, Tohoku Univ., Japan

6A-1-3
11:30
Metal Oxide Resistive Switching Memory (RRAM): Devices, Fabrication, and Self-Assembly Patterning for Random Logic and Memory
Devices (SRAM, NAND, RRAM) (Plenary)
H. Yi, Y. Wu, Z. Zhang, H.-Y. Chen, S. Yu, H.-S. P. Wong, Stanford Univ., USA
LUNCH

Room A (Royton Hall A, 3F)
6A-2:Nanoimprint, Nanoprint
and Rising Lithography
Chairpersons:
A. Yokoo (NTT)Room B (Royton Hall B, 3F)
6B-2:Functional Nanodevices
Chairpersons:
K. Nishiguchi (NTT)N. Clement (CNRS)

Room C (Emerald Room A, 3F)
6C-2:Nano-Tool
Chairpersons:K. Sugano (Kobe Univ.)
O. Kubo (Osaka Univ.)

6A-2-1
13:30
Large-area
Nanoimprint
LithographyandIndustrial
Applications (Invited)

6B-2-1
13:30
Atomically Thin MoS2: a Two
Dimensional
Semiconductor
beyond Graphene (Invited)

6C-2-1
13:30
MEMS-in-TEM
for
Characterization of Materials at
the Nanoscale (Invited)

H. Lan 1,2, Y. Ding 2 and H. Liu 2, 1
Qingdao Technological Univ. and 2
Xi'an Jiaotong Univ., China

A. Castellanos Gomez, Delft Univ.
of Technol., The Netherland

6A-2-2
14:00
Study of Transparent Thin Film
Transistors with Periodic Groove
Channels Fabricated by Sol-Gel
Process and Nano Imprint
Technology

6B-2-2
14:00
Fabrication and Characterizationof InGaAs Axial Junction
Nanowire Array Solar Cells

6A-2-3
14:20
Error Rate Analysis and Lifetime
Estimation of Release Coated
NIL Mold

6B-2-3
14:20
Reduced Thermal Conductivities
of Si 1D Phononic Crystal andNanowire

H.J. H. Chen 1, S.-T. Liu 1 and S.-Z.
Chen 2, 1 Natl. Chi Nan Univ. and 2
Natl. Tsing Hua Univ., Taiwan

M. Okada and J. Taniguchi, Tokyo
Univ. of Sci., Japan

6A-2-4
14:40
Pphotonic Crystal Based on
Plasticized PVC for Ion Sensing

S. Aki, T. Endo, K. Sueyoshi and H.
Hisamoto, Osaka Pref. Univ., Japan

E. Nakai 1, M. Yoshimura 1, K.
Tomioka 1,2 and T. Fukui 1, 1
Hokkaido Univ. and 2 JST-PRESTO,
Japan

J. Maire and M. Nomura, Univ. ofTokyo, Japan

6B-2-4
14:40
Seebeck Coefficient of Co-doped
Si Nanowires for High-sensitive
Thermopile
Infrared
Photodetector
Y. Suzuki 1, F. Salleh 1,2, M.
Shimomura 1, A. Ishida 1 and H.
Ikeda 1, 1 Shizuoka Univ. and 2
JSPS, Japan

T. Ishida 1 and H. Fujita 2, 1 Tokyo
Inst. of Technol. and 2 Univ. ofTokyo, Japan

Room D (Emerald Room B, 3F)
6D-2:Advanced
Photolithography
Chairpersons:T. Sato (Toshiba)
J. Miyazaki (ASML)
6D-2-1
13:30
ExaminationofPatterning
Technologies
Downto
Sub-10nm Half Pitch (Invited)
S. Mimotogi, Toshiba., Japan

6C-2-2
14:00
Dynamic
Characteristics
Evaluation of NanomechanicalResonators by the Application ofStroboscopic Scanning Electron
Microscope

6D-2-2
14:00
PerformanceandVolumeIntroduction of ASML's NXE
Platform (Invited)

6C-2-3
14:20
50-nm
ResolutionofTwo-dimensional Patterning in
Water by using Inverted-electron
Beam Lithography

6D-2-3
14:30
ExtendedScalability
with
Self-Aligned Multiple Patterning

6C-2-4
14:40
FabricationofCup-shaped
Superparamagnetic
Metal
Hemispheres for Size-selective
Target Cell Collection

6D-2-4
14:50
Observation Result of Phase
Defects using Micro Coherent
EUV Scatterometry Microscope

K. Nakano, S. Warisawa, S. Ishihara
and R. Kometani, Univ. of Tokyo,
Japan

T. Hoshino, H. Miyazako, A.
Nakayama, O. Fukayama and K.
Mabuchi, Univ. of Tokyo, Japan

H. Kim 1, H. Terazono 1,2, H. Takei
1,3 and K. Yasuda 1,2, 1 Kanagawa
Academy of Sci. and Technol., 2
Tokyo Medical and Dental Univ. and 3
Toyo Univ., Japan

J.-W. van Horst 1, R. Peeters 1, S.
Lok 1, M. van Noordenburg 1, N.
Harned 1, D. Smith 1, P. Kuerz 2, M.
Lowisch 2, H. Keijer 1, D. Ockwell 1,
J. Stoeldraijer 1, 1 ASML, The
Netherlands and 2 Carl Zeiss,
Germany

K. Oyama, S. Yamauchi, S. Natori, A.
Hara, M. Yamato and H. Yaegashi,Tokyo Electron, Japan

Y. Tanaka 1, T. Harada 1, T.
Watanabe 1, Y. Usui 2 and H.
Kinoshita 1, 1 Univ. of Hyogo and 2
EIDEC, Japan

6A-2: Author’s Interview
16:55-17:05

6B-2-5
15:00
Dynamic Tuning SERS of SilverInterdigital Nanogratings under
External Electric Field

6C-2: Author’s Interview
15:00-15:10

W.J. Sun, B.G. Quan, S.B. Tian, L. Li,
Y.L. Li, J.J. Li and C.Z. Gu, Chinese
Academy of Sci., China

K.-H. Ko 1, G.-J. Kim 1, M. Yeung 2,
E. Barouch 3 and H.-K. Oh 1, 1
Hanyang Univ., Korea, 2 Fastlitho
and 3 Boston Univ., USA

6B-2: Author’s Interview
16:55-17:05
Lobby (in front of Royton Hall, 3F)
Room A (Royton Hall A, 3F)
6A-3:Nanoimprint, Nanoprint
and Rising Lithography II
Chairpersons:J. Taniguchi (Tokyo Univ. of Sci.)
H. Lan (Qingdao Technological
Univ.)
6A-3-1
15:15
Patterning
of
InP
by
Nanoelectrode Lithography
A. Yokoo 1, J. Chau 1, M. Fukuda 2
and M. Notomi 1, 1 NTT and 2
Hirosaki Univ., Japan

6D-2-5
15:10
Aerial Image Dependence on
Extreme-ultraviolet
Pellicle
SupportCoffee BreakRoom B (Royton Hall B, 3F)
Room C (Emerald Room A, 3F)
6B-3:Nanoscale Memory
6C-3:Electron and Ion BeamTechnologies
Chairpersons:
Chairpersons:
N. Banno (Leap)
Y. Ishikawa (Nara Inst. of Sci. H. Yamashita (HOYA)
J. Yanagisawa (Univ. of Shiga
and Technol.)Pref.)
6B-3-1
6C-3-1
15:35
15:25
Uniform Bipolar Switching, Large Helium Ion Microscopy (HIM)
On/off Window, and Low Power Technology
forImaging,in HfOx-based ReRAM with a Characterization,and
nanoThin Barrier Layer
Fabrication for nano-Device
S. Ban and O. Kim, POSTECH,
Materials
andStructures
Korea(Invited)

6D-2: Author’s Interview
15:30-15:40

Room D (Emerald Room B, 3F)
6D-3:Nanofabrication
Chairpersons:T. Hasegawa (NIMS)
A. Kohno (Fukuoka Univ.)
6D-3-1
15:55
FormationofOnedimensionallySelf-Aligned
Si-based Quantum Dots and Its
Application to Light Emitting
Diodes (Invited)

S. Ogawa, AIST, JapanK. Makihara and S.
Nagoya Univ., Japan

6B-3-2
15:55
Fabricationof
Nonvolatile
MemoryDeviceswith
Metal-oxide Quantum Dots on
Sandwiched
Graphene
Monolayer between SiO2 Thin
Films

6C-3-2
15:55
Development
ofElectron
Projection Lithography using
Wafer-size
nc-Si
SurfaceElectron Emitter

6D-3-2
16:25
Electrical Properties of the Thin
Film Transistor with IGZO
Channel and ZrO2/LaAlO3 Gate
Dielectric Stack

6A-3-3
15:55
High Quality GaN Template of a2-inchWafer
using
Nanometer-size SiO2 Lattice
Mask Structure fabricated by UV
Nanoimprint Lithography

6B-3-3
16:15
Electroforming-free
Resistive
Switching Characteristics of
GdOx,
TbOx,
and
HoOx
Nonvolatile Memory Devices

6C-3-3
16:15
Electron
Beam
Lithography
Simulation for Nanometer-scale
Patterning

6D-3-3
16:45
Study on Conductive Filaments
formed in ReRAM Devices
throughTemperature
DependenceofElectricalTransport Properties

6A-3-4
16:15
Analysis of Template Releasing
Process based on Fracture
Mechanics

6B-3-4
16:35
Ultralow-write-current
Nano-contact
Phase-change
Memory6A-3-2
15:35
Towards
Waferscale
Nanostructuring of Oxides using
Step-and-flash
Imprint
Lithography

S.S. Dinachali 1,2, J. Dumond 1,
M.S.M. Saifullah 1, K.K. Ansah-Antwi
1,2, R. Ganesan 3, E.S. Thian 2 and
C. He 1,2, 1 A*STAR and 2 Natl. Univ.
of Singapore, Singapore and 3 Birla
Inst. of Technol. & Sci., India

A. Okada 1, H. Shinohara 2, H. Goto2, H. Goto 3, H. Sunakawa 3, T.
Matsueda 3, A. Usui 3, A.A.
Yamaguchi 4, S. Shoji 1 and J.
Mizuno 1, 1 Waseda Univ., 2 Toshiba
Machine, 3 Furukawa and 4
Kanazawa Inst. of Technol., Japan

T. Shiotsu 1,2, S. Ooi 3, Y. Watanabe
3, T. Tochino 1, M. Yasuda 1,2, H.
Kawata 1,2, T. Kobayashi 3 and Y.
Hirai 1,2, 1 Osaka Pref. Univ.,
2JST-CREST and 3 Mechanical
Design, Japan

6A-3-5
16:35
Complex Nanoscale Structures
by Nanoimprinting and Atomic
Layer Deposition

D.U. Lee 1, S.M. Sim 1, K.S. Lee 1,
G. Oh 1, E.K. Kim 1 and H. Im 2, 1
Hanyang Univ. and 2 Dongguk Univ.,
Korea

C.-Y. Chen 1, C.-H. Lu 1, J.-L. Her 1,
K. Koyama 2 and T.-M. Pan 1, 1
Chang Gung Univ., Taiwan and 2
Kagoshima Univ., JapanY. Yin and S. Hosaka, Gunma Univ.,
Japan

6B-3: Author’s Interview
16:55-17:05

A. Kojima 1,2, N. Ikegami 2, H. Ohyi
1, N. Koshida 2 and M. Esashi 3, 1
Crestec, 2 Tokyo Univ. of Agri. &Technol. and 3 Tohoku Univ., Japan

K. Michishita, M. Yasuda, H. Kawata
and Y. Hirai, Osaka Pref. Univ., Japan

C.-H. Wu 1, K.-M. Chang 2, H.-Y. Hsu
2, W.-H. Hsu 2, S.-J. Wang 3, Y.-C.
Liu 2 and J.-p. Leu 2, 1 Chung Hua
Univ., 2 Natl. Chiao Tung Univ. and 3
Natl. Cheng Kung Univ., Taiwan

Y. Hamada, D. Itou, S. Otsuka, T.
Shimizu and S. Shingubara, Kansai
Univ., Japan

6C-3-4
16:35
Miniaturization of Exposure Area
for Electron Beam Lithographyusing Proximity Effect Correction
toward Si Optical Circuits

Y. Atsumi 1, N. Taksatorn 2, N.
Nishiyama 1, Y. Miyamoto 1 and S.
Arai 1, 1 Tokyo Inst. of Technol.,Japan and 2 GenISys, Germany

6C-3: Author’s Interview
16:55-17:05

T. Haatainen, M. Kainlauri, S.
Arpiainen, M. Markkanen, J. Marles,
R.L. Puurunen and J. Ahopelto, VTT
Technical Res. Ctr. of Finland, Finland

6A-3: Author’s Interview
16:55-17:05
Lobby (in front of Royton Hall, 3F)
17:30-19:00
Happy Hour

Miyazaki,

6D-3-4
17:05
Effect of Confining Filaments on
theCurrent–
Voltage
CharacteristicsofResistive
Change Memory by using Anodic
Porous Alumina

Y. Tanimoto 1, Y. Hamada 2, S.
Otsuka 2, T. Shimizu 2, S.
Shingubara 2, T. Watanabe 1, Y.
Takano 1 and K. Takase 1, 1 Nihon
Univ. and 2 Kansai Univ., Japan

6D-3: Author’s Interview
17:25-17:35

Thursday, November 7
Room A (Royton Hall A, 3F)
7A-4:Symposium A: Directed
Self-Assembly(DSA)
Processes and Modeling I
Chairpersons:T. Azuma (EIDEC)
T. Yamaguchi (NTT)
7A-4-1
9:00
An
OverviewoftheComputational Requirements fora Full Chip Patterning solution
using Directed Self Assembly(Invited)

K. Lai 1, M. Ozlem 1, J.W. Pitera 2,
C.-C. Liu 3, M. Guillorn 4, H. Tsai 4
and
J.
Cheng
2,
1
IBM
Semiconductor, 2 IBM Almaden Res.
Ctr., 3 IBM Nanotechnol. Ctr. and 4
IBM Yorktown Res. Ctr., USA

7A-4-2
9:30
Fast, Simplified and Predictive
Modeling of DSA (Invited)

K. Yoshimoto, K. Fukawatase, Y.
Hori and T. Taniguchi, Kyoto Univ.,
Japan

7A-4-3
10:00
Process Variation Analysis forGraphoepitaxial
Directed
Self-assembly
Lithography
based on the Dissipative
Particle
Dynamics
Method(Invited)
K. Kodera, Y. Naka, H. Kanai, S.
Maeda, S. Tanaka, S. Mimotogi, Y.
Seino, H. Yonemitsu, H. Sato andT. Azuma, Toshiba, Japan

Room B (Royton Hall B, 3F)
7B-4:Nanostructure
Engineered Devices
Chairpersons:
A.C. Gomez (Delft Univ. ofTechnol.)
Y. Ishikawa (Nara Inst. of Sci.
and Technol.)
7B-4-1
9:00
High-charge-sensitivity
Radio-frequency
Field-effectTransistor with Large andTunable Readout Frequency

Room C (Emerald Room A, 3F)
7C-4:Graphene
Chairpersons:K. Maehashi (Osaka Univ.)
H. Fukidome (Tohoku Univ.)

Room D (Emerald Room B, 3F)
7D-4:Inorganic Nanomaterials I
Chairpersons:M. Sakurai (NIMS)
K. Terabe (NIMS)

7C-4-1
9:00
Graphenetronics: from Growth toApplications (Invited)

7D-4-1
9:00
Novel Functionalities CausedbyMechanical
Strainin
SnO2-based
Materials(Invited)

7B-4-2
9:20
Dual-gate Silicon Single-electronTransistor Threshold Voltage
Mapping at Nanoscale with a
Scanning Microwave Microscope

7C-4-2
9:30
Intercalation of Molecules into
Multi-layer Graphene for LSI
Interconnects

7B-4-3
9:40
Gate-all-aroundPoly-Si
Nanowire Junctionless TFTs withan Improved ON/OFF Current
Ratio

7C-4-3
9:50
Inducing
Local
StraininGraphene without Direct E-beam
Exposure

7D-4-3
9:50
Enhanced Relative Humidity
Sensing Performance of Laterally
Grown ZnO Nanosheets

7B-4-4
10:00
Fabrication of Ge/Si Core/shell
Nanowire Quantum Dots

7C-4-4 Withdrawn
10:10
Stacking Structure Observation in
Twisted Bilayer Graphene using
Aberration-correctedTransmission
Electron
Microscopy

7D-4-4
10:10
Fabrication of Zinc Oxide andZinc Hydroxide Nanosheets andthe Photoluminescent Propiertiesof their Layered Materials

K. Nishiguchi 1, H. Yamaguchi 1, A.
Fujiwara 1, H.S. J. van der Zant 2 andG.A. Steele 2, 1 NTT, Japan and 2
Delft Univ. of Technol., The
Netherlands

N. Clément 1, F. Wang 1, K.
Nishiguchi 2, A. Fujiwara 2, G.
Patriarche 1, D. Troadec 1, B.
Legrand 1, G. Dambrine 1 and D.
Théron 1, 1 CNRS, France and 2
NTT, Japan

T.-Y. Liu 1, S.-C. Lo 2 and J.-T. Sheu
1, 1 Natl. Chiao Tung Univ. and 2
ITRI, Taiwan

K. Wada 1,2, R. Wang 1, T. Suzuki
1,2, R.S. Daecon 1, N. Fukata 3 andK. Ishibashi 1,2, 1 Riken, 2 Chiba
Univ. and 3 NIMS, Japan

7A-4: Author’s Interview
12:15-12:25

7B-4-5
10:20
Study on Weak Biological Signal
Detection utilizing Stochastic
Resonance in a GaAs-based
Nanowire FET

P.-W. Chiu, National Tsing Hua Univ.,
TaiwanM. Sakurai 1, K. Liu 1,2 and M. Aono
1, 1 NIMS, Japan and 2 Chinese
Academy of Sci., China

H. Nakano, B. Zhou, D. Kondo, K.
Hayashi, S. Nakaharai, S. Sato and
N. Yokoyama, AIST, Japan

H. Tomori, R. Hiraide, H. Tanaka, K.
Katakura, Y. Itou, Y. Ootuka and A.
Kanda, Univ. of Tsukuba, Japan

7D-4-2
9:30
Fabrication and Characterizationof Lateral MnAs Nanowires bySelective-Area
Metal-Organic
Vapor Phase Epitaxy

H. Kato 1, S. Sakita 1, M. Fischer 2
and S. Hara 1, 1 Hokkaido Univ.,
Japan and 2 Justus-Liebig Univ.
Giessen, Germany

F.-S. Tsai, S.-J. Wang, Y.-C. Tu and
T.-H. Lin, Natl. Cheng Kung Univ.,
TaiwanJ.M. Yuk 1,2,3, H.Y. Jeong 1, N.Y.
Kim 1, M.J. Lee 1, J.Y. Lee 2,3 and Z.
Lee 1, 1 UNIST., 2 Inst. for Basic Sci.
and 3 KAIST, Korea

Ö. Sağlam 1, Y. Matsuda 2, A.
Shigeta 2 and Y. Matsumoto 2,3, 1
Technische Universität München,
Germany, 2 Kumamoto Univ. and 3
JST-CREST, Japan

7C-4: Author’s Interview
12:05-12:15

7D-4: Author’s Interview
12:35-12:45

Y. Imai, M. Sato, T. Tanaka and S.
Kasai, Hokkaido Univ., Japan

7B-4-6
10:40
Improved Internal Quantum
Efficiency of GaN-based Light
Emmitting Diodes using p-AlGaN
Trench in Multi-quantum Well

G. Kim 1, J. Kim 1, E. Park 1, D. Kang
2 and B.-G. Park 1, 1 Seoul Natl.
Univ. and 2 Samsung Electronics,
Korea

7B-4: Author’s Interview
11:00-11:10
Lobby (in front of Royton Hall, 3F)
Room A (Royton Hall A, 3F)
7A-5: Symposium A: Directed
Self-Assembly(DSA)
Processes and Modeling II
Chairpersons:S. Nagahara (Tokyo Electron)
K. Yoshimoto (Kyoto Univ.)

Coffee BreakRoom B (Royton Hall B, 3F)
Room C (Emerald Room A, 3F)
7B-5:BioMEMS: Biochip
7C-5:Nanocarbon Application
Chairpersons:
Chairpersons:
H. Hisamoto (Osaka Pref. Univ.)
M. Tanemura (Nagoya Inst. of
Y. Takamura (JAIST)
Technol.)
S. Chiashi (Univ. of Tokyo)

Room D (Emerald Room B, 3F)
7D-5:Nanofabrication II
Chairpersons:S. Shingubara (Kansai Univ.)
Y. Liu (AIST)7A-5-1
10:45
Computational
StudiesofDefectivity
inDirected
Self-Assembly (Invited)

7B-5-1
11:25
Molecular Nanogap Transistor
applied to DNA Sequencing

7A-5-2
11:15
ReviewofComputational
Simulations and ParametricStudies for DSA Process
Development, DSA-friendly IC
DesignExploration
andSolution of the Inverse DSA
Problem (Invited)

7B-5-2
11:45
DevelopmentofRobot-freeHigh-density Protein Biochips for
Global Proteomics Research

7C-5-2L
11:05
Graphene
Field-effectTransistor-based Influenza-virus
Detection

7D-5-2
11:15
Patterning
AbilityofaMass-production-ready Anti-wear
probe

7A-5-3
11:45
Applicable simulation methods
for DSA on OCTA system-From simulation technique toanalysis method- (Invited)

7B-5-3
12:05
Sensitive and Multi Detection ofInterleukin-6 (IL-6) by Grating
Coupled-surface Plasmon-field
Enhanced Fluorescence Imaging

7C-5-3
11:25
Stretchable
Single-walled
Carbon-nanotube
FilmTransistors

7D-5-3
11:35
Patterned Growth of Gold
Nanostructures on Silicon via
Reaction
betweenInducedSilicon Dangling Bonds andProtic Solvents

T. Iwama 1,2, N. Laachi 2, K.T.
Delaney 2, B. Kim 2, R. Bristol 3, D.
Shykind 3, C.J. Weinheimer 3 andG.H. Fredrickson 2, 1 Asahi Kasei,
Japan and 2 Univ. of California, USA

Y.-S. Chen, C.-H. Lee, B.-H. Tsai and
G.S. Huang, Natl. Chiao Tung Univ.,
TaiwanM. Biyani 1,2, Y. Tanaka 1 and T.
Ichiki 1,2, 1 Univ. of Tokyo and 2
JST-CREST, Japan

A. Latypov, G. Garner, M. Preil, G.
Schmid, W.-L. Wang, J. Xu and Y.
Zou, GLOBALFOUNDRIES, USA

H. Morita, AIST, Japan

7A-5: Author’s Interview
12:15-12:25

M. Tsuneyasu 1,2, C. Sasakawa 1, N.
Naruishi 1, Y. Tanaka 1, Y. Yoshida 1
and K. Tawa 1,2, 1 AIST and 2
Kwansei Gakuin Univ., Japan

7C-5-1
10:45
Graphene Oxide forEngineering Application

TissueE. Nishida 1, H. Miyaji 1, H. Takita 1, I.
Kanayama 1, M. Tsuji 2, M.
Kawanami 1, 1 Hokkaido Univ. and 2
Mitsubishi Gas Chemical Company,
Japan

T. Oe 1, Y. Ohno 1, K. Maehashi 1, K.
Matsumoto 1, Y. Watanabe 1, K. Ikuta
1, T. Kawahara 2 and Y. Suzuki 2, 1
Osaka Univ. and 2 Chubu Univ.,
Japan

H. Hamahata 1, Y. Nobusa 1, K.
Yanagi 2 and T. Takenobu 1, 1
Waseda Univ. and 2 Tokyo
Metropolitan Univ., Japan

7C-5-4
11:45
Cantilevered Carbon Nanotube
Hygrometer

7B-5: Author’s Interview
12:25-12:35

T. Kuroyanagi, Y. Terada, K. Takei, S.
Akita and T. Arie, Osaka Pref. Univ.,Japan

7C-5: Author’s Interview
12:05-12:15

7D-5-1
10:55
Effect of the Thermal History on
Ni Silicidation Rate in Si
Nanowires

H. Yamashita 1, H. Kosugiyama 1, Y.
Shikahama 1, S. Hashimoto 1, K.
Takei 1, J. Sun 1, T. Matsukawa 2, M.
Masahara 2 and T. Watanabe 1, 1
Waseda Univ. and 2 AIST, Japan

Y. Li 1, M. Sugiyama 2 and H. Fujita
2, 1 Toshiba and 2 Univ. of Tokyo,
Japan

H. Itasaka, M. Nishi and K. Hirao,
Kyoto Univ., Japan

7D-5-4
11:55
FormationofOrientation-controlledThin(-50nm) Ge(111)-on-Insulator by
Rapid-melting Growth Combinedwith Narrow-striping
S. Muta 1, M. Anisuzzaman 1, A.M.
Hashim 1,2 and T. Sadoh 1, 1 Kyushu
Univ., Japan and 2 Univ. Teknologi
Malaysia, Malaysia

7D-5-5
12:15
Fabrication of Ag Nanowire on
Glass by Nano Ion-exchange
Lithography
S. Esaki, T. Yano and T. Kishi, Tokyo
Inst. of Technol., Japan

7D-5: Author’s Interview
12:35-12:45
LUNCH

7A-6:Resist
andDirected
Self-Assembly
Chairpersons:T. Hirayama (Tokyo Ohka)
K. Okamoto (Hokkaido Univ.)
7A-6-1
14:00
Realizing
sub-10nm
patterning through industrial
and academic approaches

7B-6:BioMEMS:
Cell
andMembrane
Chairpersons:
K. Furukawa (NTT)T. Ichiki (Univ. of Tokyo)
7B-6-1
14:00
Cell-laden
Microfiber
forBottom-up Tissue Engineering(Invited)

I. Mori, T. Itani, S. Inoue and T.
Azuma, EIDEC, Japan

S. Takeuchi, Univ. of Tokyo andJST-ERATO, Japan

7A-6-2
14:30
Effects of Effective Reaction
Radius for Neutralization on
PerformanceofChemically
Amplified Resists

7B-6-2
14:30
Microfluidic Fabrication of in-situ
GelableChitosan-dextran
Microgels

7A-6-3
14:50
Roughness Controllability using
Photoresist
SmoothingandHardening

7B-6-3
14:50
Effects of Wrinkled PDMS
Surface on Cell Survival Rateand Spreading

T. Kozawa 1, J.J. Santillan 2 and T.
Itani 2, 1 Osaka Univ. and 2 EIDEC,Japan

M. Yamato 1, A. Hara 1, S. Natori 1,
S. Yamauchi 1, K. Oyama 1, H.
Yaegashi 1, M. Honda 2 and K.
Kobayashi 2, 1 Tokyo Electron and 2
Tokyo Electron Miyagi, Japan

C. Cha 1 and J. Oh 2, 1 Harvard
Medical School, USA and 2 Chonbuk
Natl. Univ., Korea

C.K. Oh, W.H. Jeong, J.Y. Hong, D.G.
Lee and O.C. Jeong, Inje Univ., Korea

7C-6:Organic Nanomaterials
Chairpersons:K. Nagai (Tokyo Inst. of Technol.)T. Lee (Seoul Natl. Univ.)

7D-6:Nanofabrication III
Chairpersons:T. Shinada (AIST)
K. Takase (Nihon Univ.)

7C-6-1
13:40
Organic Nanoparticles based
p-n Junction for Full-spectrumvisible-light
Photocatalyst(Invited)

7D-6-1
14:00
Phase Shift Optics for
Nanopatterning (Invited)

7C-6-2
14:10
Fabrication and Morphology
Control of Fullerenol Nanosheets
and Nanocrystals

7D-6-2
14:30
Optimization of SERS Active
Three-Dimensional
Gold
Nanostructure
with
High
Sensitivity

K. Nagai 1, P. Arunachalam 1, S.
Zhang 1, T. Iyoda 1 and T. Abe 2, 1
Tokyo Inst. of Technol. and 2
Hirosaki Univ., Japan

H. Ogata, Y. Sano and K. Baba,
Hosei Univ., Japan

7C-6-3
14:30
Rare-metal-free
Organic
Thin-film Solar Cells using a
Plasmonic ElectrodeK. Takatori 1, T. Nishino 2, T.
Okamoto 2, H. Takei 3, K. Ishibashi 2
and R. Micheletto 1, 1 Yokohama City
Univ., 2 Riken and 3 Toyo Univ.,
Japan

3D

J.K. Hyun, J. Park, C. Ahn, E. Kim, D.
Kim and S. Jeon, KAIST, Korea

R. Takahashi, T. Fukuoka and Y.
Utsumi and A. Yamaguchi, Univ. of
Hyogo, Japan

7D-6-3
14:50
A Novel Method of Fabricating
Large-area Nano-metal Meshes
for Organic Device Applications

Y. Hsu 1, X. Fang 2, H.-W. Zan 1,
H.-F. Meng 1 and L.A. Wang 2, 1 Natl.
Chiao Tung Univ. and 2 Natl. Taiwan
Univ., Taiwan

7A-6-4
15:10
Directed Self-Assembly of Liquid
Crystalline Block Copolymer andStructural Transcription to Gold
Nanorod Array

N. Yamashita 1, M. Komura 1, K.
Nagai 1, T. Iyoda 1, K. Aida 2, Y. Tada
2 and H. Yoshida 2, 1 Tokyo Inst. ofTechnol. and 2 Hitachi, Japan

7A-6-5
15:30
Directed Self Assembly Materials
for Sub 10nm NodeS. Minegishi, Y. Anno, Y. Namie, T.
Naruoka and T. Nagai, JSR, Japan

7B-6-4
15:10
Importanceof
SpatialArrangement of Cell Network
Patterns for Precise and Stable
Measurement
of
in
Vitro
Properties of Cells

7C-6-4
14:50
Molecular- and Polymer-based
Electronic Devices on Rigid andFlexible Substrates (Invited)
T. Lee, Seoul National Univ., Korea

F. Nomura, T. Hamada, A. Hattori, K.
Matsu-ura, H. Terazono and K.
Yasuda, Tokyo Medical and Dental
Univ., Japan

7B-6-5
15:30
Platform
for
Low
Noise
Biosensors using Microwells
Sealed with Lipid Bilayers

Y. Kashimura, R. Forbes and K.
Sumitomo, NTT, Japan

7D-6-415:10
10 nm Vertical In0.53Ga0.47As Line
Etching
Processfor
III-V
MOSFET Fabrication by using
Inductively Coupled Plasma(ICP) Etcher in Cl2/CH4/H2
Chemistry
X. Li, O. Ignatova, M. Cao, U.
Peralagu, M. Steer, M. Mirza, H. Zhou
and I. Thayne, Univ. of Glasgow, UK

7C-6-5
15:20
Via
Filling
Methods
with
Metal/Polymer Composite for
3D-LSIB. Horvath, J. Kawakita and T.
Chikyow, NIMS, Japan

7D-6-5
15:30
Throughput
ComparisonofMulti-exposure and Multi-beam
Laser Interference Lithography
on Nano Patterned Sapphire
Substrate Process
T. Lin, T. Huang, Y. Yang and C. Fu,
Natl. Tsing Hua Univ., Taiwan

7A-6: Author’s Interview
15:50-16:00

7B-6: Author’s Interview
15:50-16:00

7C-6-6
15:40
Numerical
InvestigationofOrganic Thin-film Transistors
using a Thermionic Field
Emission Model

7D-6: Author’s Interview
15:50-16:00

K. Noda 1, Y. Wada 1 and T. Toyabe
2, 1 Keio Univ. and 2 Toyo Univ.,
Japan

7C-6: Author’s Interview
16:00-16:10
Lobby (in front of Royton Hall, 3F)
Coffee BreakRoom P (Royton Hall B and C, 3F)

7P-7: Poster Session I (16:20-18:20)
Resist and Directed Self-Assembly
Chairpersons: H. Yamamoto (Osaka Univ.) and J. Kon (Fujitsu)
7P-7-1
7P-7-2
Placement Error of the Contact Microphase Separation of aHole Shrunk by Directed Nematic Liquid Crystalline Block
Self-assemblyofBlock Copolymer Thin Film assisted by
Copolymers
Small Nematic Liquid Crystalline
T. Druzhinina 1, S. Wuister 1, E.v.d. Molecules
Heijden 1, D. Ambesi 1, J. Finders 1
and E. Peeters 2, ASML, The
Netherlands

S. Kubo 1, S. Kobayashi 1, S.
Hadano 2, M. Komura 3, T. Iyoda 3
and M. Nakagawa 1, 1 Tohoku Univ.,
2 Kochi Univ. and 3 Tokyo Inst. ofTechnol., Japan

7P-7-5
Pulse Radiolysis Study ofPolystyrene-based
Polymers
with
Adding
Photoacid
Generators (PAGs): Molecular
Dynamics of Extreme-ultraviolet
and Electron Beam Resist

7P-7-6Novel EUV Resist Materials
based on Noria (Water-wheel
Like Cyclic Oligomer) Derivatives
with Pendant Ethoxy andAdamantyl Ester Groups

7P-7-9Viscosity Effect on Deprotonation
DynamicsofPoly(4-hydroxystyrene)

7P-7-10
Acid Generation Mechanism in
Solid
Poly(4-hydroxystyrene)
upon Exposeure to Electron
Beam

7P-7-3
Nanometrology of Sub-20 nm 2D
Featuresfrom
BCPs
Self-assembly by NIL Technology

C. Simão 1, W. Khunsin 1, D.
Tuchapsky 2, N. Kehagias 1, A.
Amann 2, M. A. Morris 2,3 and C.M.
Sotomayor Torres 1,4, 1 Inst. Catalanof Nanotechnol., Spain, 2 Univ.
College Cork 3 Trinity College Dublin,
Ireland and 4 Catalan Inst. of Res.
and Advanced Studies, Spain

7P-7-4
Contact Hole Shrink by Directed
Self-assembly:
Process
Integration
andStability
monitored on 300mm Pilot Line

I. Servin 1, R. Tiron 1, A. Gharbi 1, M.
Argoud 1, X. Chevalier 2, X. Bossy 1,
J. Belledent 1, P. Pimenta Barros 1,
C. Navarro 2, G. Cunge 1, S. Barnola
1, M. Asai 3 and C. Pieczulewski 4, 1
CEA-LETI, 2 ARKEMA, France, 3Dainippon Screen, and 4 Sokudo,Japan

7P-7-7
Chemical Reaction Analysis of
PHS CA Resist System for EUVL
using Soft X-ray Absorption
Spectroscopy

7P-7-8SimulationofKineticsinHigh-density
Ionization
Extra-ultraviolet (EUV) Resist
Process

Chairpersons: M. Tanemura (Nagoya Inst. of Technol.) and S. Okada (Univ. of Tsukuba)
7P-7-11
7P-7-12
7P-7-13Fabrication and Characterization In-situ Optical Microscopy of Removalof
Metallicof Ni-NiO/carbon Composite Initial Growth Stage of Carbon Single-walled Carbon Nanotubes
Nanofibers for Energy Storage Nanocoils
using Molecular Glass Thin Films
Applications
T. Gohara, T. Arie and S. Akita, Osaka K. Otsuka, T. Inoue, S. Chiashi and S.

7P-7-14
Energetics
andElectronic
Structures of C60 included within[n]Cyclacene Molecules

K. Okamoto 1, K. Tominaga 1, T. Hori
1, H. Yamamoto 2, T. Kozawa 2, R.
Fujiyoshi 1 and T. Sumiyoshi 1, 1
Hokkaido Univ. and 2 Osaka Univ.,
Japan

T. Ishida 1, K. Okamoto 1, H.
Yamamoto 1, T. Kozawa 2, R.
Fujiyoshi 1 and T. Sumiyoshi 1, 1
Hokkaido Univ. and 2 Osaka Univ.,
Japan

S. Matsubara 1, H. Kudo 1, T.
Watanabe 2, K. Emura 2 and H.
Kinoshita 2, 1 Kansai Univ. and 2
Univ. of Hyogo, Japan

K. Emura 1, T. Watanabe 1, M.
Yamaguchi 1, H. Tanino 1, T. Fukui 1,
D. Shiono 2, Y. Haruyama 1, Y.
Muramatsu 1, K. Ohmori 2, K. Sato 2,
T. Harada 1 and H. Kinoshita 1, 1
Univ. of Hyogo and 2 Tokyo Ohka
Kogyo, JapanK. Nishino 1, K. Okamoto 1, T.
Kozawa 2, R. Fujiyoshi 1 and T.
Sumiyoshi 1, 1 Hokkaido Univ. and 2
Osaka Univ., Japan

H. Yamamoto and T. Kozawa, Osaka
Univ., Japan

Nanocarbons

T. Sintprajim and S. Meansiri,
Suranaree Univ. of Technol., Thailand

Pref. Univ., Japan

Maruyama, Univ. of Tokyo, Japan

S. Kigure 1 and S. Okada 1,2, 1 Univ.
of Tsukuba and 2 JST-CREST, Japan

7P-7-15
Improvement of Adhesion of
Ni-based Carbon Nanotube
Composite Coating on StainlessSteels by using a ScanningElectroplating

7P-7-16
Low Temperature Synthesized
Graphene by Surface Wave
Plasma CVD as Effective
Oxidation Barrier

7P-7-18
Formation Mechanism of Carbon
Nano-ribbons/Tetrahedra
via
Collapse of Multiwalled Carbon
Nanotubes

T. Suzuki and M. Kato, Yamagata
Res. Inst. of Technol., Japan

G. Kalita 1, D. Ghimire 2, K. Wakita 2,
M. Umeno 2 and M. Tanemura 1, 1
Nagoya Inst. of Technol. and 2 Chubu
Univ., Japan

7P-7-17Graphene
Fabrication
fromDecomposition of Hydrocarbons
by using Non-transferred Arc
Plasma7P-7-19
Floating-Bridge
Graphene
Devices on Ionic Liquid

7P-7-20Growth of CdTe Structures on
Graphene

7P-7-21FabricationofFlexible
Transparent Conductive Films
with Graphene Nanosheets andSilver Nanowires

7P-7-22
Modification of Paraffin Phase
ChangeMaterials
using
Nanographite Additives

Y. Yamashiro, Y. Ohno, K. Maehashi,
K. Inoue and K. Matsumoto, Osaka
Univ., Japan

Y. Jung, G. Yang, S. Chan, D. Kim
and J. Kim, Korea Univ., Korea

J.-J. Baek, T.-H. Kim, S. Choi and
D.-W. Park, Inha Univ., Korea

P.H. Jian 1, M.J. Huang 1, N.W. Pu 2,
Y.M. Liu 1 and M.D. Ger 1, 1 Natl.
Defense Univ. and 2 Yuan Ze Univ.,
TaiwanH. Kohno, T. Komine and S. Ichikawa,
Osaka Univ., Japan

C.W. Liao 1, C.H. Wu 1, G.N. Shi 1,
N.W. Pu 2, Y.M. Liu 1 and M.D. Ger 1,
1 Natl. Defense Univ. and 2 Yuan Ze
Univ., Taiwan

7P-7-23
Structural
DependenceofElectronic
Properties
ofGraphene Nanoribbons on an
Electric Field

7P-7-24
Modulation of Carrier Mobility inGraphene
DoubleLayer
Structure
byDielectric
Environment Effect

7P-7-25
Two-dimensional sp2 Carbon
Network of Fused Pentagons: All
Carbon Ferromagnetic Sheet

7P-7-26
Direct Graphene Synthesis on
Insulated Substrates using Ni/Pd
Catalytic Layers

7P-7-27
Amperometric Urea Biosensor
based on Carbon Nanotubes andMetal Catalysts

7P-7-115L
Enhanced Performance of 2D
Graphene
Ozide/ZnO
Nanoparticle in Dye-sensitizedSolar Cells

7P-7-116L

7P-7-117L
Production of Carbon Nanocoils
using a Spray Pyrolysis Chemical
Vapor Deposition Method

7P-7-119L
Responses
formechanicalstrain/stress of single walledcarbon nanotube thin film
depositedonpiezoelectric
flexible sheet

7P-7-120L
Computer-Aided
Molecular
Design of Functional Graphene
Nano-flakes: DFT Study

A. Yamanaka 1 and S. Okada 1,2, 1
Univ. of Tsukuba and 2 JST-CREST,Japan

H. Wu, M.H. Koo, N.T.M. Linh and
H.H. Yoon, Gachon Univ., Korea

7P-7-118L
Solution-processed Al2O3 forgate dielectrics in the Top-Gated
Graphene
Field
EffectTransistors

G.-H. Park, H. Fukidome, T.
Suemitsu, T. Otsuji and M.
Suemitsu, , Tohoku Univ., JapanK. Hosono and K. Wakabayashi,
NIMS, Japan

M. Maruyama 1 and S. Okada 1,2, 1
Univ. of Tsukuba and 2 JST-CREST,
Japan

W.K. Huang 1, K.J. Chung 1, Y.M. Liu
1, N.W. Pu 2, M.D. Ger 1, M.J. Youh3, 1 Natl. Defense Univ., 2 YuanZeUniv. and 3 Hsing Wu Univ., Taiwan

C.-H. Hsu 1,2, C.-C. Chen 1, C.-C.
Lai 2, L.-G. Chen 1 and P.-S. Chan 1,
1 Natl. Taipen Univ. of Technol. and 2
Bichen Technol., Taiwan

T. Taira , T. Ikawa, H. Hotta, H.
Tabata, O. Kubo and M. Katayama,
Osaka Univ., JapanT. Ikuta, Y. Ohno, K. Maehashi, K.
Inoue and K. Matsumoto, Osaka
Univ., Japan

S. Abe and H. Tachikawa, Hokkaido
Univ., Japan

Nanodevices
Chairpersons: Y. Ishikawa (Nara Inst. of Sci. and Technol.) and N. Banno (Leap)
7P-7-28
7P-7-29
7P-7-30 Withdrawn
Reusable
SodiumChloride High
Performance
GdTixOy Hybrid Nanostructure consistingSensor
with
Poly-silicon Electrolyte-insulator-semiconduct of a Nanoneedle and Nanodot for
Nanowireor Biosensors
Ionization
Gas
Sensing
C.-C. Hsu 1, C.Y. Yang 1, W.-K. Ho 1, C.-W. Wang 1, T.-M. Pan 1 and L. Chi Application

7P-7-31
Room Temperature Ammonia
Gas Sensor Base on Hybridized
P3HT:Au/ZnO NPs Films

V. Kruefu 1, A. Wisitsoraat 2, A.
Tuantranont 2 and S. Phanichphant3, 1 Maejo Univ., 2 NECTEC and 3
Chang Mai Univ., Thailand

C.-J. Lai 1 and S.-C. Tseng 2, 1 Yuan
Ze Univ. and 2 ITRI, Taiwan

2, 1 Chang Gung Univ., Korea and 2
Westfälische
Wilhelms-Universität
Münster, Germany

H. Liu and Y. Huang, Nanyang
Technological Univ., Singapore

7P-7-32
Highly CO Sensitivity of ZnO
Tetrapods modified by TiO2
Powder

7P-7-33
Characteristics of InGaP/InGaAs
Field-effect Transistor Typed
Hydrogen Sensor with Pd
Nanoparticle Catalytic Metal

7P-7-34
Structural
andElectrical
Properties
ofElectrolyte-insulator-metal
Device based Anodic Aluminum
Oxide with Variation of Second
Anodizing time for Biosensor

7P-7-35
Light Trapping Performance inThin Film Silicon Solar Cell using
Indium Nanoparticle Plasmonics
on the Different Thickness of
TiO2 Space Layer

7P-7-38
Novel Fabrication Method forCu(In,Ga)Se2 Solar Cells

7P-7-39
The Cu Concentration Effect on
the Electro-optical Properties of
Cu2ZnSnSe4
Thin
Films
Prepared by a Non-vacuum
Solution-based
Nano-inks
Process

T. Santhaveesuk 1,2, K. Shimanoe 3,
M. Yuasa 3, D. Wongratanaphisan 2
and S. Choopun 2, 1 Pibulsongkram
Rajabhat Univ. and 2 Chiang Mai
Univ., Thailand and 3 Kyushu Univ.,
Japan

7P-7-36
Novel Fabrication Technique of
Amorphous Carbon Thin Filmfrom Palm Oil Precursor by
Bias-assisted Pyrolysis-CVD for
Amorphous Carbon Solar Cells
A. Ishak, K. Dayana and M. Rusop,
Univ. Teknologi MARA, Malaysia

7P-7-40
Fabrication of Aligned ZnONanorod Arrays on Sn-doped
ZnO Seed Layer by Simple
Sonicated Sol-gel Immersion for
Dye-sensitized Solar Cells

I. Saurdi, M.H. Mamat, N.D. Sidin,
M.F. Malik and M. Rusop, Univ.
Teknologi MARA, Malaysia

J.-H. Tsai, Natl. Kaohsiung Normal
Univ., Taiwan

7P-7-37A
StudyofPhotoelectric
Conversion Efficiency depending
on Defect States of InAs
Quantum Dot Solar Cell grownby Molecular Beam Epitaxy

Y.-J. Kim, T.-H. Lee, J.-H. Yeo and
S.-G. Lee, Gyeongsang Natl. Univ.,
Korea

P. Choi, D. Baek, H. Kim, K. Kim, H.
Park, S. Kim and B. Choi,
Sungkyunkwan Univ., Korea

K.S. Lee 1, D.U. Lee 1, E.K. Kim 1
and W.J. Choi 2, 1 Hanyang Univ.
and 2 KIST, Korea

7P-7-41
Inorganic-organic
CdSe/ZnS
Quantum
Dot-poly(Methyl
Methacrylate) Composite-based
Unipolar Resistive Switching
MemoryY.-C. Chen 1, H.-C. Yu 1, Y.-K. Su 1,2,
C.-Y. Huang 3, T.-H. Liu 1 and T.-H.
Chang 1, 1 Natl. Cheng Kung Univ., 2
Kun Shan Univ. and 3 Natl. Taitung
Univ., Taiwan

Y.-Y. Lee, W.-J. Ho, J.-J. Liu and C.-H.
Lin, Natl. Taipei Univ. of Technol.,TaiwanP.-Y. Lee 1, S.-P. Chang 1, E.-H. Hsu
2, S.-J. Chang 1, 1 Natl. Cheng Kung
Univ. and 2 Natl. Univ. of Tainan,
Taiwan7P-7-42
BipolarResistive
Switching
Behavior
in
Au/Pt-Fe2O3
Core-shell
Nanoparticles
Assembly/Ti with 3 x 3 Crossbar
Array Structure

Q. Hu, J.H. Shim, T.-S. Lee, H.K. Lee,
T.-S. Yoon, Y.J. Choi and C.J. Kang,
Myongji Univ., Korea

7P-7-43
Analysis of Resistive Switching
Characteristics of Nickel Oxide
Thin Films

M.R. Park 1, S.I. Lee 2, W.J. Song 1,
D.H. Lee 2, T.S. Yoon 1, Y.J. Choi 1,
B.H. Park 2 and C.J. Kang 1, 1
Myongji Univ. and 2 Konkuk Univ.,
Korea

7P-7-44
Study of Reliability Testing in
GaN-based Blue Lithgt-emmiting
Diodesby
DopingTiO2
Nanoparticles in Encaspsulantion
Silicone

7P-7-45
Fabrication
Technology
ofLarge-area OLEDs Lightings with
Shadow
Mask
Patterning
Technology

7P-7-46
Effects of Current Spreading in
GaN-based
Light-emitting
Diodes using ITO Spreading
Pillar

7P-7-48 Withdrawn
Field-emission
andPhotodetector Characteristics of
GZO Nanorods

7P-7-121L
PlanarJunctionlessPoly-siThin-film Transistors with Single
Gate and Double Gate

7P-7-122L
Fabrication of the Field Emission
Lamp and Morphology Transform
Analysis of Carbon Nano-coils

P.-C. Wang 1, C.-L. Lin 2, P.-C. Chien
2 and Y.-K. Su 1,2, 1 Natl. Cheng
Kung Univ. and 2 Kun-Shan Univ.,
TaiwanC.-S. Huang 1, C.-H. Hsiao 2, M.-Y.
Chuang 2, Y.-C. Chen 2, S.-J. Young3, Y.-K. Su 2 and S.-J. Chang 2, 1
Natl. Yunlin Univ. of Sci. and Technol.,
2 Natl. Cheng Kung Univ. and 3 Natl.
Formosa Univ., Taiwan

C.Y. Park, J.H. Lee and B.H. Choi,
Korea Inst. of Industrial Technol.,
Korea

C.H. Chou, I.-C. Lee, D.-C. Lei and
H.-C. Cheng, Natl. Chiao Tung Univ.,
TaiwanJ.H. Kim 1, G. Kim 1, J.K. Song 2,
D.H. Kang 2 and B.-G. Park 1, 1
Seoul Natl. Univ. and 2 Samsung,Korea

7P-7-47
Improve Performance of β-Ga2O3
Nanowire Field Emitter by UV
Irradiation

Y.H. Lin, Y.L.Wu and S.J. Chang,Natl. Cheng Kung Univ., Taiwan

K.J. Chung 1, C.C.Chiang 1, Y.M. Liu
1, M.J. Youh 1, N.W. Pu 3 and M.D.
Ger 1, 1 National Defense Univ. 2
Hsing Wu College and 3 Yuan Ze
Univ., Taiwan

Nanofabrication
Chairpersons: A. Kohno (Fukuoka Univ.) and T. Shinada (AIST)
7P-7-49
Study on Collective Morphology
Dependenceof
OpticalReflectance Properties for a HighDensity
ArrayofSiliconNanowires

7P-7-50
Fabrication of Ultrahigh Density
10-nm-order sized C Nanodot
Array as a Pattern-transfer Mask

7P-7-53
Large Area Fabrication ofUmbrella-like
SiliconCone
Arrays Decorated with Au
NanospheresforSurfaceEnhanced Raman Scattering

T. Yamaguchi 1, T. Shimizu 1, Y.
Morosawa 2, K. Takase 2 and S.
Shingubara 1, 1 Kansai Univ. and 2
Nihon Univ., JapanZ. Hu, B. Quan, Y. Li, J. Li and C. Gu,
Chinese Academy of Sci., China

7P-7-57
Fabrication and Application of
Nanostructrues using AAO Mold
Pre-textured by Self-assembled
Nanospheres Template

K.-H. Lu, R.-H. Hong, S.-P. Lin and
S.-Y. Yang, Natl. Taiwan Univ., Taiwan

7P-7-51 Withdrawn
Electrical Characterization ofMetal-ferroelectric-insulator-semi-conductor
havingDoubleLayered Insulator for Memory
Applications

7P-7-52
Effect of the Working Pressure
on the Boron Trichloride based
ICP-RIE of Lithium Niobate
Substrate

7P-7-54
Fabrication
andOpticalProperties of Organic-inorganic
Nanohybrids
basedon
Self-organizing Nature of Lead
Halide-based
LayeredPerovskites

7P-7-55
Angled Dry Etching Process of
Nb-TiO2 Substrate by SF6
Plasma7P-7-56
The Fabrication of PSi/ZnO
Nanostructures as Chemical
Sensors for the Detection of
Ethanol Solution using an
Electrochemical
Impedance
Technique

7P-7-58 Withdrawn
Nanosilver Particles Composite
Prepare by Isopropanol Cold
Plasma Interface Layer andUV-graft PolyAAc for Post
Reduction of Silver Ion on the
Substrate

7P-7-59
XANES
Analysisof
CoxMn1-xFe2O4
Nanoparticles
preparedbyHydrothermal
MethodM. Huda, J. Liu, Y. Yin and S.
Hosaka, Gunma Univ., Japan

M. Era, K. Soda, Y. Shironita and K.
Sakaguchi, Saga Univ., Japan

K.-S. Chen 1, Y.-S. Wei 1, C.-W.
Chou 2, C.-K. Feng 3 and W.-Y. Chen
4, 1 Univ. of Tatung, 2 China Medical
Univ., 3 Veterans General Hospitaland 4 Natl. Taiwan Univ., Taiwan

L.N. Ismail, M.H. Wahid, Z. Habibah,
S.H. Herman, M.D. Rozana and M.
Rusop, Univ. Teknologi MARA,
Malaysia

A. Matsutani 1, K. Nishioka 1, D. Shoji
1, M. Sato 1, D. Kobayshi 1, T. Isobe
1, A. Nakajima 1, T. Tatsuma 2 and S.
Matsushita 1, 1 Tokyo Inst. ofTechnol. and 2 Univ. of Tokyo, Japan

N. Wiriya 1, S. Maensiri 2 and E.
Swatsitang 1, 1 Khon Kaen Univ. and
2 Suranaree Univ., Thailand

M.-H. Shiao 1, C.-M. Chang 1,2, J. Su
1, P.-L. Chen 1, W.-J. Hsueh 2 andC.-N. Hsiao 1, 1 Natl. Applied Res.
Labs. and 2 Natl. Taiwan Univ.,
TaiwanF.S. Husairi, K.Eswar, Z.N Atikah, A.
Azlinda, M. Rusop and S. Abdullah,
Univ. Teknologi MARA, Malaysia

7P-7-123L
ComparisonofElectromagnetically
InducedTransparency between Silver
and Gold Metamaterials at
Wavelengths around 800 nm
R. Hokari, Y. Kanamori and K. Hane,
Tohoku Univ., Japan

7P-7-124L
Aluminum Doping of 4H-SiC
using Chemical Wet Laser
Processing

D. Marui, A. Ikeda, K. Nishi, H.
Ikenoue, T. Asano, Kyushu Univ.,
Japan

Inorganic Nanomaterials
Chairpersons: K. Terabe (NIMS) and X.W. Zhao (Tokyo Univ. of Sci.)
7P-7-60
7P-7-617P-7-62
Low Temperature Crystallization Synthesis of ZnO Nanoparticles Photocatalytic
Efficiency
ofof TiO2-δ Thin Film by RF in Aqueous Solution and their N/3SnO2 Co-doped TiO2 Thin
Magnetron Sputtering using Antibacterial Activities
Films coated on Glass Fibers
Oxygen Radical
G. Zhang 1, H. Morikawa 1 and Y. P. Kongsong, L. Sikong, S. Niyomwas

7P-7-63
Effect of Synthesis Temperatureof h-MoO3 on their Photochromic
Properties

Y. Shimazu 1, T. Higuchi 1, T.
Okumura 1, E. Sakai 2, H.
Kumigasira 2, M. Okawa 1 and T.
Saitoh 1, 1 Tokyou Univ. of Sci. and 2
KEK, Japan

Chen 2, 1 Shinshu Univ., Japan and 2
Soochow Univ., China

and V. Rachapech, Prince of Songkla
Univ., Thailand

P. Jittiarporn, L. Sikong, K.
Kooptanond and W. Taweepreda,
Prince of Songkla Univ., Thailand

7P-7-64
Decolorization of Methylene Blueby Ag/SrSnO3 composites under
Ultraviolet Radiation

7P-7-65
Surface Modification of ZnO with
SilverParticles
andIts
Photocatalytic Activity

7P-7-66
Synthesis, Characterization andPhotocatalytic
Propertyof
Gd-doped ZnO Nanorods

7P-7-67
Phase Transformation of VO2Nanoparticles
assistedbyMicrowave Heating

P. Junploy, S. Thongtem and T.
Thongtem, Chiang Mai Univ.,
ThailandT. Srivorakul 1, K. Thongpanchang 1,
C. Suwanchawalit 1, S. Buddee 2
and S. Wongnawa 2, 1 Silpakorn
Univ. and 2 Prince of Songkla Univ.,
ThailandO. Yayapao 1, S. Thongtem 1, T.
Thongtem 1 and A. Phuruangrat 2, 1
Chiang Mai Univ. and 2 Prince ofSongkla Univ., Thailand

P. Phoempoon and L. Sikong, Princeof Songkla Univ., Thailand

7P-7-68
Synthesis and Characterizationof Co-precipitation prepared
La-doped BiFeO3 Nanopowders
and Its Bulk Dielectric Properties

B. Yotburut 1, T. Yamwong 2 and S.
Maensiri 1, 1 Suranaree Univ. ofTechnol. and 2 Natl. Metals andMaterials Technol. Ctr., Thailand

7P-7-72 Withdrawn
Effect of Extra Pb Excess onDielectric and Structural Propertyof PbTiO3 Thin Films Capacitor
Z. Nurbaya, L.N Ismail, Z. Habibah
and M. Rusop, Univ. Teknologi
MARA, Malaysia

7P-7-69
Hydrothermal Synthesis andCharacterization of Bi2MoO6
Nanoplates
and
Their
Photocatalytic Activities

7P-7-70
Fabrication of PIN Devices
Consisting of ZnO Quantum Dots
Embedded in Ga2ZnO4 FilmP.
Dumrongrojthanath
1,A.
Phuruangrat 2, S. Thongtem 1 and T.
Thongtem 1, 1 Chiang Mai Univ. and2 Prince of Songkla Univ., Thailand

X. Zhang 1, K. Kobayashi 1, Y.
Kohono 1, Y. Tomita 1, Y. Maeda 1
and S. Matsushima 2, 1 Shizuoka
Univ. and 2 Kitakyushu Natl. College
of Technol., Japan

7P-7-73
Dielectric Properties of Bulk
CoFe2O4 Ceramic Prepared from
Nanocrystalline
CoFe2O4
Powders

7P-7-74
PreparationofMesoporous
NiO-Ce0.8Sm0.2O1.9 Cermets forAnode Low-temperature Solid
Oxide Fuel Cells

A. Khamkongkaeo 1, T. Yamwong 2
and S. Maensiri 3, 1 Khon Kaen
Univ., 2 Natl. Metal and Materials
Technol. Ctr. and 3 Suranaree Univ.
of Technol., Thailand

S.J. Ma, S.M. Ham and S.-J. Park,
Gachon Univ., Korea

7P-7-71
StructuralandPhotoluminescence Properties of
Ag-doped ZnO Nanoparticles
synthesized by a Simple Solution
Combusting Method

M. Silambarasan 1, S. Saravanan 1,2
and T. Soga 2, 1 Sona College ofTechnol., India and 2 Nagoya Inst. ofTechnol., Japan

7P-7-75
CeO2
Nanoparticles
using
Lemongrass Plant Extracted
Solution: Synthesis and Optical
Properties

S. Maensiri 1, S. Labauyai 2, P.
Laokul 3, J. Klinkaewnarong 4 and E.
Swatsitang 2, 1 Suranaree Univ. ofTechnol., 2 Khon Kaen Univ., Univ.,
Mahasarakham Univ. and Udon
Thani Rajabhat, Thailand

7P-7-76
Preparation of TiO2 Nanowire
Arrays and their pH Sensing
Characteristics

F.-S. Tsai, S.-J. Wang and Y.-C.
Huang, Natl. Cheng Kung Univ.,
TaiwanOrganic Nanomaterials
Chairpersons: S. Takami (Tohoku Univ.) and H. Kasai (Tohoku Univ.)
7P-7-77
7P-7-78
7P-7-79
Size Estimation of Biological Ink Electrical Properties of Carbon Single Crystalline Electrospun
Particles
dispersed
in Nanotubes Synthesis by Double P(VDF-TrFE）Nanofiber
Suspensions Utilizing Atomic Furnace
Thermal-CVD M. Noyori, Y.Neo and H.Mimura,
Force Microscopy
TechniqueatDifferent Shizuoka Univ., Japan
T. Matsuura 1, T. Saeki 1, T. Sasaki 1, Temperatures on Porous Silicon
K. Minato 2 and T. Ueno 2, 1 Template
Hokkaido Univ. of Education and 2
Hakodate Natl. College of Technol.,Japan

F.S. Husairi, S.A.M Zobir, M. Rusop
and S. Abdullah, Univ. Teknologi
MARA, Malaysia

7P-7-81
FabricationofFluorescent
Copper Complex Nanoparticles
through the Heterogeneous
Reaction

7P-7-82
Fabrication of SN-38 Derivatives
Nanoparticles
and
their
Anticancer Properties

7P-7-85
Efficiency
EnhancementofTandem Organic Light-emitting
Devices fabricated utilizing an
Organic p-type HAT-CN and an
Organicn-type
BEDT-TTF
Charge Generation Layer

7P-7-86
Preparation of Tripolyhosphate /Chitosan Nanoparticles Intended
for Drug Delivery System

R. Suzuki, H. Noguchi, T. Onodera,
H. Kasai and H. Oikawa, Tohoku
Univ., Jpan

Y. Koseki 1, Y. Ikuta 1, T. Murakami 2,
T. Onodera 1, H. Oikawa 1 and H.
Kasai 1, 1 Tohoku Univ. and 2 Kyoto
Univ., Japan

H.-C. Yang, Kun Shan Univ., Taiwan

7P-7-83
StableEmissionandNano-particle Formation of P3HT
in Electrospray Deposition for
Fabrication of Organic Solar Cell
S. Baba, T. Kimura, N. Yamaguchi
and T. Sakamoto, Kogakuin Univ.,
Japan

7P-7-80
Template-freeOne-step
Electrochemical Synthesize of
Polypyrrole Nanoparticles
A.A.
Daryakenaria
and
J.-J.
Delaunay, Univ. of Tokyo, Japan

7P-7-84
Faburication of Oled using
Needle-electro-spray Deposition

T. Okada, S. Izawa, S. Tutamori and
T. Sakamoto, Kogakuin Univ., Japan

7P-7-125L
Microcontact
Printing
ofThermo-sensitive
Nano
Pd
Catalytic Ink For High Uniformity
Nickel Pattern
P.C. Wang, Y.C. Chen, W.K. Huang,
C.P. Chang, Y.M. Liu and M.D. Ger, 1
Natl. Defense Univ., Taiwan

J.T. Cho, D.H. Kim and T.W. Kim,
Hanyang Univ., Korea

Nano-Tool
Chairpersons: T. Hoshino (Univ. of Tokyo) and R. Kometani (Univ. of Tokyo)
7P-7-87
7P-7-88
7P-7-89
The Growth Height Correction on Chromosome Higher Order InfluenceofMicrowave
theThree-dimensional Structure revealed by FIB/SEM
Annealingona
SilverNanostructure Fabrication using T. Hamano 1, K. Kaneyoshi 1, S. Nano-particle Probe Applied to
Focused-ion-beam
Chemical Fukuda 1, H. Takata 1, S. Uchiyama High-sensitivity Scanning Kelvin
1, R. Kometani 2, M. Nakao 2 and K. Probe Microscopy
Vapor Deposition
R. Kometani, Y. Murao, S. Ishihara
and S. Warisawa, Univ. of Tokyo,Japan

7P-7-126L
Electricaltransportinmulti-layered silicene measuredbymultiple-scanning-probe
microscope

O. Kubo1,2, P. De Padova 3, B.
Olivieri 4, C. Quaresima 3, G. Le Lay
5, M. Aono 2 and T. Nakayama 2,6, 1
Osaka Univ., 2 NIMS, Japan and 3
ISM, 4 ISAC, Italy, 5 Aix-Marseille
Univ., France and Univ. of Tsukuba,
Japan

Fukui 1, 1 Osaka Univ. and 2 Univ. ofTokyo, Japan

M.-H. Yu 1, C.-T. Lin 2, C.-T. Wu 2,
Y.-J. Lee 1,2, M.-H. Shiao 2, M.-N.
Chang 1, 1 Natl. Chung Hsing Univ.
and 2 NARL, Taiwan

7P-7-90
Calibration of a Micro-force
Sensor using an Electrostatic
Sensing and Actuating Force
Measurement System
S.-J. Chen, S.-S. Pan, Y.-S. Yeh andY.-C. Lin, ITRI, Taiwan

Nanoimprint, Nanoprint and Rising Lithography
Chairpersons: Y. Hirai (Osaka Pref. Univ.) and H. Hiroshima (AIST)
7P-7-91
7P-7-92
Enhancement of Out-coupling Efficiency
Enhancementof
Efficiency with Nano Sized High Organic Thin Film Solar Cells byRefractive Index Pattern
using
Electrodes
with
JH. Choi, HJ. Choi and H Lee, Korea Nanoimprinted Light Guiding
Univ., Korea
Structures

7P-7-93
Nanoimprinting of Self-organizedAtomic Scale Patterns ofMinerals onto the Oxide Glass
Surface

7P-7-94
The High Speed Roll to Roll
Thermal Nanoimprint for Unique
Organic/Inorganic
HybridMaterial Coated Plastic Film

7P-7-95
InvestigationofFluorinatedMolecular and Polymer Additives
Suitable for a Viscous Acrylate
Monomer in UV Nanoimprinting

7P-7-97
Development of Improved SOFC
Electrolyte Sheet by Micro
Imprinting Process for Layered
Material

7P-7-98
Comparison of Cavity Filling
BehaviorsinUltraviolet
Nanoimprint Lithography using
Condensing Gases with Different
Saturated Vapor Pressure

J.-Y. Chen, M.-H. Yu, C.-Y. Chang,
Y.-H. Chao, C.-S. Hsu and K.W. Sun,
Natl. Chiao Tung Univ., Taiwan

S. Ito 1 and M. Nakagawa 1,2, 1
Tohoku Univ. and 2 JST-CREST,Japan

7P-7-99
HSQ Replica Mold with Release
Property fabricated by Room
Temperature Nanoimprinting

N. Sugano, M. Okada, Y. Haruyama
and S. Matsui, Univ. of Hyogo, Japan

7P-7-96
Study of the Resistance ofAntisticking Layer on Repeated
UV Nanoimprint (2)S. Iyoshi 1,5, M. Okada 1,5,6, K.
Kobayashi 3,5, S. Kaneko 3,5, T.
Katase 2, K. Tone 2, Y. Haruyama
1,5, M. Nakagawa 3,5, H. Hiroshima
4,5 and S. Matsui 1,5, 1 Univ. of
Hyogo, 2 Meisyo Kiko, 3, Tohoku
Univ., 4 AIST and 5 JST-CREST,Japan

7P-7-100
XPS Analyses of Ultrathin UV
Nanoimprint Resin added with
Fluorine Additive

T. Oyama 1,3, M. Okada 1,3, S.
Iyoshi 1,3, Y. Haruyama 1,3, H.
Miyake 2, T. Mizuta 2 and S. Matsui
1,3, 1 Univ. of Hyogo, 2 Daicel and 3
JST-CREST, Japan

N. Inoue 1, R. Yamauchi 1, G. Tan 1,
H. Oi 2, M. Mita 2, N. Okuda 3, S.
Kaneko 1,4, A. Matsuda 1 and M.
Yoshimoto 1, 1 Tokyo Inst. ofTechnol., 2 Kyodo International, 3
SCIVAX and 4 Kanagawa Industrial
Technology Ctr., Japan

Y. Tanaka, F. Tsumori, Y. Xu, T. Osadaand H. Miura, Kyushu Univ., JapanK. Kumazawa, H. Shibata and H.
Suzuki, Nippon Soda, Japan

S.-W. Youn 1,2, K. Suzuki 1,2, Q.
Wang 1,2 and H. Hiroshima 1,2, 1
AIST and 2 JST-CREST, Japan

7P-7-101
Fabrication of Double-sided
Self-supporting
Antireflection-structured Film by
UV-NILN.B. Abu, T. Yusof and J. Taniguchi,
Tokyo Univ. of Sci., Japan

BioMEMS, Lab on a Chip
Chairpersons: K. Furukawa (NTT) and T. Ichiki (Univ. of Tokyo)
7P-7-102
7P-7-103
Highly Sensitive Analysis of Development of a Microfluidic
Water-insoluble
Nanoparticles Device
Forming
Oxygenand soluble Proteins in Liquid by Gradient for Cellular Experiments
Resonant
SurfaceAcoustic A. Sato, H. Uchida, A. Miyamyama
and K. Tsukada, Keio Univ., Japan
Wave Modulation Measurement

7P-7-104
Creating
Uniform
Amino-terminated
Layeron
Glass Surface using Water as
Solvent

7P-7-105
Design and Simulation of aSingle Optical Fiber Scanner with
High-Order Vibration Modal for
Realizing Large Scanning Angle

7P-7-106
Fabrication of a Ring Structure at
a Hole Aperture for Lipid
Suspension

7P-7-108
Development of Potable Urine
AnalyzeronAndroidforPregnant-care Service

7P-7-109
Heterogeneously
Integrated
Laser Induced Fluorescence
Detection Devices – Integrationof an Excitation Source –K. Ogawa 1,3, T. Abe 1, Y. Seino 1, T.
Torigoe 2, Y. Tada 3, K. Uesugi 3, H.
Fukuda 3, K. Sawada 3 and T. Iwasa
3, 1 Fine Crystal, 2 Sapporo Medical
Univ. and 3 Muroran Inst. of Technol.,Japan

T. Goto 1, Y. Harada 1, D. Cox 2,3
and K. Sumitomo 1, 1 NTT, Japanand 2 Natl. Physical Lab. and 3 Univ.
of Surrey, UK

7P-7-110
Sensitive
Detectionof
α-fetoprotein (AFP) with the
Enhanced Fluorescence on the
Plasmonic Chip

F. Kondo 1,2, H. Hirayama 3, Y. Aoki
3 and K. Tawa 1,2, 1 AIST, 2 Kwansei
Gakuin Univ. and 3 Konica Minolta,
Japan

7P-7-107
Centrifugal Microfluidic Chip for
Blood Separation
M. Ishizawa 1, T. Kunisada 1, K.
Kuroda 1, C. Kataoka 2, A.
Yamaguchi 1 and Y. Utsumi 1, 1 Univ.
of Hyogo and 2 Carbuncle
BioScientech, Japan

7P-7-111
Rapid Compartmentalization of
Microwell Arrays using a
Microfluidic Device

T. Fukuda 1, S. Sato 1, S. Ueno 1,2,
M. Biyani 1,2 and T. Ichiki 1,2, 1 Univ.
of Tokyo and 2 JST-CREST, Japan

H. Kuramochi 1,2, S. Ueno 1,2, T.
Fukuda 2, S.R. Kumal 2, A. Ono 2
and T. Ichiki 1,2, 1 JST-CREST and 2
Univ. of Tokyo, Japan

W.I. Jang 1, E.J. Jeong 1, S.J. Yun 2,
K.P. Nam 2, C.K. Kim 2, S.M. Kim 2
and C. Ihm 3, 1 Electronics andTelecommunications Res. Inst., 2
SmartCare and 3 Eulji Univ. Hospital,
Korea

7P-7-112
Effects of the Height of Pillar
Arrays fabricated by Proton
Beam Writing on the Trapping
Capability of Bacteria by 3-D
Dielectrophoresis

G. Ayugase 1, H. Nishikawa 1, T. Sato2, Y. Ishii 2, T. Kamiya 2, H. Tokita 3
and S. Uchida 3, 1 Shibaura Inst. ofTechnol., 2 JAEA and 3 Tokyo
Metropolitan Univ., Japan

7P-7-114
On-chip Ionization Source forProtein Coupled with Time of
Flight Mass Spectrometry

K. Sugiyama, H. Harako, Y. Ukita and
Y. Takamura, JAIST, Japan

Room A (Royton Hall A, 3F)
18:30-20:30
BanquetB. Sun 1, Y. Peng 1, Z. Yang 2, Y.
Zhang 2, T. Itoh 2, R. Maeda 2 and R.
Sawada 1, 1 Kyushu Univ. and AIST,Japan

K. Sumitomo, S. Ito, R. Takigawa, N.
Tsujimura, H. Kato, T. Kobayashi, R.
Maeda and T. Kamei, AIST, Japan

7P-7-113
A
Lap-on-chipfor
Phosphorus Analysis

Total

D.G. Jung 1, J.C. Choi 1, Y.C. Choi 1,
S.H. Han 1, M.M. Hossain 1, W.I.
Jang 2 and S.H. Kong 1, 1
Kyungpook Natl. Univ. and 2
Electronics and Telecommunications
Res. Inst., Korea

Friday, November 8
Room A (Royton Hall A, 3F)
8A-8:Symposium B: Directed
Nanostructure Science I
Chairpersons:
Y. Hirai (Osaka Pref. Univ.)
M. Nakagawa (Tohoku Univ.)
8A-8-1
9:00
Directed Self-assembly of Block
Copolymers (Invited)
M. Takenaka, Kyoto Univ., Japan

Room B (Royton Hall B, 3F)
8B-8:Advanced Microdevices I
Chairpersons:N. Miki (Keio Univ.)
M. Sohgawa (Niigata Univ.)

Room C (Emerald Room A, 3F)
8C-8:BioMEMS: Microfluidics
Chairpersons:K. Tawa (AIST)
M. Tokeshi (Hokkaido Univ.)

8B-8-1
9:00
Integrated
Silicon
MEMS
Technology and Novel Functional
Sensor Devices (Invited) H.

8C-8-1
9:00
The Implementation of a Thermal
Bubble Actuated Microfluidic
Chip with Microvalve, Micropump
and Micromixer

Takao, Kagawa Univ., Japan

C. Huang, W. Li and C. Tsou, Feng
Chia Univ., Taiwan

8A-8-2
9:30
Single-nanodot
ArraysandSingle-nanohalf-pitch
Lines
Formedusing
PS-PDMS
Self-assembly and Electron
Beam Drawing(Invited)

8B-8-2
9:30
Surfaces Virtually created by a
MEMS Tactile Display

8A-8-3
10:00
Moiré
Analysisof
Block
Copolymer
Self-Assembly(Invited)

8B-8-3
9:50
Trajectory Control of Autorotating
MEMS Falling Object

Y. Kosemura 1, H. Ishikawa 1, J.
Watanabe 1 and N. Miki 1,2, 1 Keio
Univ. and 2 JST-PRESTO, JapanS. Hosaka, M. Huda, H. Zhang, T.
Komori, Y. Yin, Gunma Univ., Japan

S. Sakurai, H. Ohnogi, T. Harada, S.
Sasaki and T. Isshiki, Kyoto Inst. ofTechnol., Japan

H. Yamane and S. Nagasawa,
Shibaura Inst. of Technol., Japan

8B-8-4
10:10
Micro-sized Exothermic Reactive
Particles
Fabricatedby
Sputtering to Mesh Substrates

T. Matsuda 1, S. Inoue 1 and T.
Namazu 1,2, Univ. of Hyogo and 2
JST-PRESTO, Japan

8A-8: Author’s Interview
11:45-11:55

Room A (Royton Hall A, 3F)
8A-9:Symposium B: Directed

Nanostructure Science II

Chairpersons:
Y. Hirai (Osaka Pref. Univ.)
M. Nakagawa (Tohoku Univ.)
8A-9-1
10:45
Orientation
andPositionControl of DSA Lithography for
Bit-patterned Media (Invited)
R. Yamamoto, M. Kanamaru, K.
Sugawara, N. Sasao, Y. Ootera, T.
Okino, N. Kihara, Y. Kamata and A.
Kikitsu, Toshiba, Japan

8A-9-2
11:15
A Master-mold Fabrication by EB
Lithography
followedbyNanoimprinting and Self-aligned
Double-patterning (Invited)

T. Watanabe, K. Suzuki, H. Iyama, T.
Kagatsume, S. Kishimoto, T. Satoand H. Kobayashi, HOYA, Japan

M. Simanullang, K. Usami, T. Kodera,
Y. Kawano and S. Oda, Tokyo Inst. ofTechnol., Japan

8C-8-2
9:20
Anticoagulant Nano Porous
Polyethersulfone
Membrane
Coatedwith
FluorinatedDiamond-like Carbon for Dialysis
Membrane

8D-8-2
9:20
Effect of Silver Metal on the
Antibacterial Properties of the
Titanium Dioxide Nanocomposite

8C-8-3
9:40
Ultimate
IntegrationofaPDMS-based Lab-on-a-chip with
Nanotransistor Biosensors

8D-8-3
9:40
Sensitization
Effectof
Al-codopingon
Nd-related
PhotoluminescenceinTiO2
MatrixI. Sanada 1, H. Ito 1, G.S. Prihandana
1, M. Noborisaka 1, Y. Kanno 2 andN. Miki 1, 1 Keio Univ. and 2 Tokyo
Medical Univ., Japan

R. Sivakumarasamy 1, K. Nishiguchi
2, A. Fujiwara 2, D. Vuillaume 1 and
N. Clément 1, 1 CNRS, France and 2
NTT, Japan

8C-8-4
10:00
Evaluation of Zeta Potential of
Exosomes after Treated with
Neuraminidase
using
Microcapillary
Electrophoresis
Chips

N. Hanamura, T. Akagi, K. Kato, M.
Kobayashi and T. Ichiki, Univ. ofTokyo, Japan

8B-8: Author’s Interview
8C-8: Author’s Interview
11:45-11:55
10:20-10:30
Lobby (in front of Royton Hall, 3F)
Coffee BreakRoom B (Royton Hall B, 3F)
Room C (Emerald Room A, 3F)
8B-9:Process
and 8C-9:Nanocarbon Property I
Characterization
Chairpersons:
Chairpersons:S. Okada (Univ. of Tsukuba)
T. Namazu (Univ. of Hyogo)
S. Akita (Osaka Pref. Univ.)
T. Ando (Ritsumeikan Univ.)
8B-9-1
8C-9-1
10:45
10:45
Influence of FIB-induced Surface Synthesis and Applications of
Damageon
Mechanical Novel
Low-dimensional
Properties of Silicon Nanowaires Nanomaterials (Invited)
T. Fujii 1, K. Sudoh 2, S. Sakakihara
2, M. Naito 3,4, S. Inoue 1 and T.
Namazu 1,5, 1 Univ. of Hyogo, 2
Osaka Univ., 3 Konan Univ., 4
JST-CREST and 5 JST-PRESTO,Japan

H. Zhang, Nanyang Technological
Univ.,Singapore

8B-9-2
11:05
Room
Temperature
DirectbondingofElectroplated
Multi-wall Au Patterns Smoothedby Thermal Imprint Process

8P-9-2
11:15
Interacting Spins in Honeycomb
Ribbons with Zigzag Edges

Y. Kurashima, A. Maeda and H.
Takagi, AIST, Japan

Room D (Emerald Room B, 3F)
8D-8:Inorganic Nanomaterials
II
Chairpersons:T. Higuchi (Tokyo Univ. of Sci.)
K. Terabe (NIMS)
8D-8-1
9:00
Surface
PassivationofGermanium Nanowires using
Al2O3 and HfO2 deposited via
Atomic Layer Deposition (ALD)
TechniqueS. Dutta and K. Wakabayashi, NIMS,
Japan

K. Ubonchonlakat 1, L. Sikong 1 andY. Poo-arporn 2, 1 Prince of Songkla
Univ. and 2 Syncrotron Light Res.
Inst., Thailand

Y. Aizawa 1, T. Ohtsuki 1, S. Harako
1, S. Komuro 2, N. Hirao 3 and X.
Zhao 1, 1 Tokyo Univ. of Sci., 2 Toyo
Univ. and 3 JAEA, Japan

8D-8-4
10:00
The
EffectofTiO2Particle/nanotube Composition
Powder for Dye-sensitized Solar
Cells

C.H. Lee, C.W. Bark and H.W. Choi,
Gachon Univ., Korea

8D-8: Author’s Interview
11:55-12:05

Room D (Emerald Room B, 3F)
8D-9:Inorganic Nanomaterials
III
Chairpersons:
X.W. Zhao (Tokyo Univ. of Sci.)
T. Higuchi (Tokyo Univ. of Sci.)
8D-9-1
10:35
Crystallization
BehaviorofPhosphorus-doped Silicon-rich
Silicon Nitride Films grown by
Electron Cyclotron ResonanceChemical Vapor Deposition

Y.-C. Wang, P.-J. Wu, I.-C. Chen 1,
C.-C. Lee, J.-Y. Chang and T. Li, Natl.
Central Univ., Taiwan

8D-9-2
10:55
DLTS
Characterizationof
In(Ga)As-quantum
Dots
Fabricated using Bi as a
Surfactant

H. Okamoto 1, S. Suzuki 1, H. Narita
1, T. Tawara 2, K. Tateno 2 and H.
Gotoh 2, 1 Hirosaki Univ. and 2 NTT,Japan

8B-9-3
11:25
Room-temperature
Hermetic
Sealing using Ultrasonic Bonding
with Au Compliant Rim

8A-9: Author’s Interview
11:45-11:55

R. Takigawa, K. Iwanabe, T. Shuto, T.
Takao and T. Asano, Kyushu Univ.,
Japan

8C-9-3
11:35
Wave-Packet
Dynamics
Simulation
onElectronic
Transport in Carbon Nanotubes
with Topological Line Defects

8D-9-3 Withdrawn
11:15
Si1-xGex
Core-shell
Alloy
Nanowires with Defected Shell
for Low Thermal Conductivity

Y. Takada and T. Yamamoto, Tokyo
Univ. of Sci., Japan

8B-9: Author’s Interview
11:45-11:55

8C-9: Author’s Interview
11:55-12:05

8D-9-4
11:35
First-principles Simulation on
Orientation
DependenceofPiezoresistivity
in
3C-SiC
Nanostructures

J. Lee 1,2, E.K. Lee 1, K. Heo 1,3, L.
Yin 4, C. Yu 4, B.L. Choi 1, D. Whang
1,2 and S. Hwang 1, 1 Samsung
Advanced Inst. Technol., 2
Sungkyunkwan Univ., 3 Korea Univ.,
Korea and 4 Texas A&M Univ., USA

K. Nakamura, Kyoto Univ., Japan andEgypt-Japan Univ. of Sci. andTechnol., Egypt

8D-9: Author’s Interview
11:55-12:05
LUNCH

8A-10:Symposium B: Directed
Nanostructure Science III
Chairpersons:
Y. Hirai (Osaka Pref. Univ.)
M. Nakagawa (Tohoku Univ.)
8A-10-1
13:00
Fabrication and characterizationof Metallic Nanostructures with
Single Nanometer-sized Gap(Invited)
K. Ueno, Hokkaido
JST-PRESTO, Japan

Univ.

and

8A-10-2
13:30
Electroless Plated Nanogap
Electrodes and their Device
Applications (Invited)

Y. Majima, Tokyo Inst. of Technol.,
JST-CREST, Japan and Sunchon
Natl. Univ., Korea

8A-10-3
14:00
ImprovementofTransportinassembled
Nanowires (Invited)

Electrical
DirectedPolymeric

8B-10:Advanced Microdevices
II
Chairpersons:
E. Iwase (Waseda Univ.)
T. Sakata (NTT)
8B-10-1
13:10
2
6
GHz
Monolithic
Multi-frequency-variable
Band
Elimination Filter utilizing Fluid
Microelectromechanical System
Variable Capacitors

8C-10:Nanocarbon Property II
Chairpersons:K. Wakabayashi (NIMS)
M. Nagase (Univ. of Tokushima)

8B-10-2
13:30
Metallic
Glass
Based
PiezoelectricResonant
Micro-mirror with Large Scanning
Angle for Endoscopic Optical
Coherence Tomography

8C-10-2
13:30
Enhanced
Photocurrent
inSingle-walled
CarbonNanotubes
byExcitonInteractions

8B-10-3
13:50
Embedded Optical Shearing
Force Measurement Device

8C-10-3
13:50
In Situ TEM Observation of Field
Emission
Properties
fromBi-layers Graphene

Y. Yamada, T. Yamanaka, T.
Furutsuka
andK.
Suzuki,Ritsumeikan Univ., Japan

Y.-C. Tsai 1, T. Naono 2, Y.-C. Lin 1,
J.-W. Lee 1, M. Esashi 1, T. Fujii 2
and T. Gessner 1,3,4, 1 Tohoku Univ.,
and 2 Fujifilm, Japan, 3 Fraunhofer
ENAS and 4 Chemnitz Univ. ofTechnol., Germany

T. Iwasaki, T. Takeshita, K. Harisaki
and R. Sawada, Kyushu Univ., JapanY. Wakayama, NIMS, Japan

8A-10: Author’s Interview
14:30-14:40

8B-10-4
14:10
Fabrication of a Membrane
Probe Card using Transparent
Film for 3D-IC Testing

N. Watanabe 1, M. Suzuki 1, K.
Kawano 2 , M. Eto 2 and M. Aoyagi 1,
1 AIST and 2 STK Technol., Japan

8B-10: Author’s Interview
14:30-14:40

8C-10-1
13:10
Water Adsorption on the
Surface of a Single-walled
Carbon Nanotube
S. Chiashi 1,2, K. Kono 1, D.
Matsumoto 1, J. Shitaba 1, S. Sato
1, T. Yamamoto 1 and Y. Homma 1,
1 Tokyo Univ. of Sci. and 2 Univ. ofTokyo, Japan

S. Konabe and S. Okada, Univ. of
Tsukuba, Japan

M. Zamri 1,2, Y. Yaakob 1, G. Kalita 1
and M. Tanemura 1, 1 Nagoya Inst. ofTechnol., Japan and 2 Univ. Teknologi
Malaysia, Malaysia

8C-10-4
14:10
High
Rate
Capability
Supercapacitor Electrodes basedon Holey Graphene Nanosheets

Y.Y. Peng 1, P.C. Wang 1, J.N. Shi 1,
N.W. Pu 2, C.H. Wu 1, W.M. Liu 1
and M.D. Ger 1, 1 Natl. Defense Univ.
and 2 Yuan Ze Univ., Taiwan

8C-10: Author’s Interview
14:30-14:40

Lobby (in front of Royton Hall, 3F)
Coffee Break

8D-10:Inorganic
Nanomaterials IV
Chairpersons:
X.W. Zhao (Tokyo Univ. of Sci.)
8D-10-1
13:10
Electrical
Conductivityof
Sc-doped TiO2 Thin Film
prepared by RF Magnetron
Sputtering

T. Inoue 1, T. Okumura 1, E. Sakai 2,
H. Kumigashira 2 and T. Higuchi 1, 1
Tokyo Univ. of Sci. and 2 KEK, Japan

8D-10-2
13:30
ThermalConductivity
of
nm-scale Membranes by Raman
Thermometry

E. Chávez-Ángel 1,2, S.S. Reparaz 1,
J. Gomis-Bresco 1, M.R. Wagner 1, J.
Cuffe 3, A. Shchepetov 4, M. Prunnila
4, J. Ahopelto 4, F. Alzina 1 and C.M.
Sotomayor Torres 1,5, 1 ICN2 and 2
UAB, Spain, 3 MIT, USA, 4 VTT
Technical. Res. Ctr. of Finland,
Finland and 5 ICREA, Spain

8D-10-3
13:50
using Astronomical Liquid Mirrors
to Prepare Ultra-high-sensitive
Surface-enhanced
Raman
Scattering Substrates

Y.-C. Lee 1, T.-Y. Lu 1, Y.-T. Yen 1,
C.-C. Yu 1, Y.-C. Tsai 2, Y.-C. Tseng
1, H.-L. Chen 1, 1 Natl. Taiwan Univ.
and 2 Academia Sinica, Taiwan

8D-10-4
14:10
Synthesisof
Novel
Nanostructure B6O and SPS
Densificationof
B6O-B4C
Composite
S.S. Xie 1, I. Solodkyi 2,3, H.
Borodianska 4, P. Badica 5, O.
Vasylkiv 1,2 and A.I.Y. Tok 1, 1
Nanyang
Technological
Univ.,
Singapore, 2 NIMS, Japan, 3 Natl.
Technical Univ. of Ukraine and 4
NASU, Ukraine and 5 Natl. Inst. ofMeterial Physics, Romania

8D-10: Author’s Interview
14:30-14:40

Room P (Royton Hall B and C, 3F)

8P-11: Poster Session I (14:40-16:40)
Advanced Photolithography
Chairpersons: H. Kawai (Nikon) and T. Sato (Toshiba)
8P-11-1
8P-11-2
RobustScaling
Capability Process Enhancement withThrough Sa-Multiple-Patterning SRAF Printing Model
Process
J. Park, Y.K. Kim, S.I. Lee, Y.C. Kim
H. Yaegashi, K. Oyama, S.
Yamauchi, A. Hara, S. Natori and M.
Yamato, Tokyo Electron, Japanand J. Choi, Samsung Electronics,
Korea

8P-11-5
Shock Waves and Magnetic
Rayleigh Taylor Instabilities in
Z-pinchGas
Discharge
Produced
PlasmaExtremeUltraviolet Sources

8P-11-6
Update of HVM High Power EUV
Source Development

B. Huang, T. Tomizuka, M. Watanabe
and E. Hotta, Tokyo Inst. of Technol,
Japan

H. Mizoguchi, H. Nakarai, T. Abe, T.
Ohta, K.M. Nowak, Y. Kawasuji, H.
Tanaka, Y. Watanabe, T. Hori, T.
Kodama, Y. Shiraishi, T. Yanagida, T.
Yamada, T. Yamazaki, S. Okazaki
and T. Saitou, Gigaphoton, Japan

8P-11-3
Quadruple ArF- i Computational
Lithography and 3D-TCAD for
1Xnm Node Fin-SRAM Designfor Manufacturing

8P-11-4
Injection-locked ArF Excimer
Laser
for
Multi-patterning
Lithography

K. Kadota 1, K. Fukuda 2, S. O'uchi 2
and M. Masahara 2, 1 TEI Solutions
and 2 AIST, Japan

M. Igarashi, A. Kurosu, T. Kumazaki,
H. Tsushima, K. Kakizaki, T.
Matsunaga and H. Mizoguchi,
GIGAPHOTON, Japan

8P-11-7
Internal-external
Photolithography Method
Hollow Cylindrical Substrate

8P-11-8
Irradiance
Distributionin
Proximity Lithography of Annulus
Aperture Arrayfor

D. Kubota and S. Nagasawa,
Shibaura Inst. of Technol., Japan

J.-C. Tsai, G.-S. Sie and J.-W. Fan,
Natl. Chung-Hsing Univ., Taiwan

8P-11-119L
Removal of Micro Bubble
Trapped on Resist Micro Pattern
by Dipping into Low Surface
Tension Developer

K. Takahashi 1, A. Takano 2 and A.
Kawai 2, 1 Nissan Chemical
Industries and 2 Nagaoka Univ. ofTechnol., Japan

Electron and Ion Beam Technologies
Chairpersons: J. Yanagisawa (Univ. of Shiga Pref.) and J. Yamamoto (Hitachi)
8P-11-92
8P-11-10
8P-11-11
2Tbit/in Dot Array Fabrication Exposure
Control
Circuit Modeling Secondary Electronusing
150kV-EB
Mastering Response Optimization Method Emission from Line Edge
Systemfor Improving Throughput of Patterns in Scanning Ion
T. Ito, Y. Kojima, S. Nagai, S. Kodama Electron
Beam
Lithography Microscopes
and K. Yokota, Elionix, Japan
Considering Patterning Fidelity
K. Ohya and T. Yamanaka, Univ. of

8P-11-12
Study on Formation Mechanismof Line Width Roughness (LWR)
in Electron Beam Resists

8P-11-13
The Phonon-ssisted
Significant for the
Patterning

T. Yamazaki, H. Yamamoto and T.
Kozawa, Osaka Univ., Japan

S.-C. Huang, S.-Y. Chen, Y.-T. Shen,
H.-P. Lee and K.-Y. Tsai, Natl. Taiwan
Univ., Taiwan

Tokushima, Japan

8P-11-14
The Structural and Magnetic
Properties of NiFe/α-Fe2O3 Thin
Films
via
Ion-beam
Bombardment

8P-11-120L
Surface potential distribution of a
resist film irradiated by electron
beam

8P-11-121L
Measurement and simulation of
fogging electron distribution in ascanning electron microscope

Chairpersons: H. Fukidome (Tohoku Univ.) and K. Maehashi (Osaka Univ.)
8P-11-15
8P-11-16
8P-11-17
Microwave
Synthesisof Synthesis of Large Area and Non-thermal and Reversible
Graphene/Fe3O4 Composites for High Quality Graphene on Oxidation of Graphene throughimproving the Capacity of Copper Foil using Waste Plastic UV/O3 Treatment
Lithium-ion Batteries
as Carbon Source
Y. Mulyana 1, M. Horita 1,3, Y.

8P-11-18
Observation of Graphene using
Magnetic Force Microscopy

Events
SurfaceT. Murakami, M. Nomura and S.T.
Nakagawa, Okayama Univ. of Sci.,
Japan

C. Shueh, K.-W. Lin 1, T.-C. Lan 1, C.
Shueh 1, Y.-H. Chen 2, T.-H. Wu 2, R.
Desautels 3 and J. van Lierop 3, 1
Natl. Chung Hsing Univ. and 2 Natl.
Yunlin Univ. of Sci. and Technol.,Taiwan and 3 Univ. of Manitoba,
CanadaK. Kumagai, M. Otani, S. Hosoi and
M. Kotera, Osaka Inst. of Technol.,Japan

S. Hosoi, M. Otani, K. Kumagai and
M. Kotera, Osaka Inst. of Technol.,Japan

Nanocarbons

C.H. Wu 1, Y.Y. Peng 1, G.N. Shi 1,
Y.C. Chen 1, N.W. Pu 2, Y.M. Liu 1
and M.D. Ger 1, 1 Natl. Defense
Univ., 2 Yuan Ze Univ., Taiwan

S. Sharma, G. Kalita, R. Papon and
M. Tanemura, Nagoya Inst. ofTechnol., Japan

Ishikawa 1,3, Y. Uraoka 1,3, K.
Miyake 1 and S. Koh 2, 1 Nara Inst. ofSci. and Technol., 2 Aoyama Gakuin
Univ. and 3 JST-CREST, Japan

8P-11-19
Graphene Point Contact as aSingle-level System

8P-11-20
Effects of UV Light on
Electrochemical Wet Etching ofSilicon Carbide for Suspended
Graphene Fabrication

8P-11-21
Structures and Electronic Statesof the Radicals adsorbed on
Graphene

8P-11-24
A Simple Solution-based Methodofproducing
Crumpled
Graphene Oxide for Inkjet
Printing

8P-11-25
Rollable Organic Photovoltaic
Cells using Electrstatically doped
Graphene Electrodes

H.-Y. Deng and K. Wakabayashi,
NIMS, Japan

8P-11-23
Ab-initio Study on ThermoelectricPower of CNT-thin Film

T. Kato 1, S. Usui 2 and T. Yamamoto
1, 1 Tokyo Univ. of Sci. and 2
Quantum Wise Japan, Japan

R.S. O 1,2, M. Takamura 1, K.
Furukawa 1, M. Nagase 2 and H.
Hibino 1, 1 NTT and 2 Univ. ofTokushima, Japan

D.W.H. Fam 1, A.I.Y. Tok 1, S.
Azoubel 2, M. Layani 2, L. Liu 2, S.
Magdassi 2 and D. Mandler 2, 1
Nanyang
Technological
Univ.,
Singapore and 2 Hebrew Univ. of
Jerusalem, Israel

H. Tachikawa, Hokkaido Univ., JapanK. Maruishi, F. Wakaya, S. Abo and
M. Takai, Osaka Univ., Japan

8P-11-22
DependenceofElectronic
Properties on Stacking in
Double-layer
Graphene
Heterostuctures
M. Ni 1,2 and K. Wakabayashi 1, 1
NIMS, Japan and 2 Hefei Univ. ofTechnol., China

K.-O. Kim 1,2, S.-H. Bae 2 and J.-H.
Ahn 2, 1 Sungkyunkwan Univ. and 2
Yonsei Univ., Korea

8P-11-26
Collective
Properties
Superconducting Grapheneof

D. Inotani 1, Y. Ohashi 2 and S.
Okada 1, 1 Univ. of Tsukuba and 2
Keio Univ., Japan

8P-11-27
Electrochemical Properties of
TiO2/Marimo Carbon Composite
as an Electrode Material for
Lithium Secondary Batteries

K. Iwasawa 1, K. Miyoshi 1, M.
Eguchi 1, M. Nishitani-Gamo 2, T.
Ando 3, Ibaraki Univ., 2 Toyo Univ.
and 3 NIMS, Japan

8P-11-28
EffectofElectron
Beam
Irradiation on Raman Spectra
and Transport Properties in
Graphene

8P-11-29
Effect of Hydrogen Edge
Passivation on BC3 Ribbons

S. Dutta and K. Wakabayashi, NIMS,
Japan

H. Tomori, R. Hiraide, H. Tanaka, Y.
Ito, K. Katakura, Y. Ootuka and A.
Kanda, Univ. of Tsukuba, Japan

8P-11-30
The Nitrogen Post Treatment to
Improve the Field Emission
Property of the Cabon Nano-coil
Cathode Wire

G.F. Xu 1, J.C. Jiang 1, K.J. Chung 1,
W.K. Huang 1, K. Cheng 1, Y.M. Liu
1, M.D. Ger 1 and N.W. Pu 2, 1 Natl.
Defense Univ. and 2 Yuan Ze Univ.,
Taiwan8P-11-31
Rapid Prototyping of Electrodes
with Patterned and Aligned
Multi-walled CNT for Flexible
Thin Films

C.-Y. Chou, T.-L. Chang, C.-R. Yangand Y.-C. Lan, Natl. Taiwan Normal
Univ., Taiwan

Nanodevices
Chairpersons: K. Nishiguchi (NTT) and T. Maemoto (Osaka Inst. of Technol.)
8P-11-32
8P-11-33
8P-11-34
Novel Tri-State Latch based on Long-term Reliability of High Evaluation of Soft Error in
Negative Differential Resistance Performance on a-IGZO TFTs Silicon-on-insulator
StaticDevices with Single Peak for without Passivation Layer by Random Access Memory using
Extendable Multi-valued Logic using Microwave Irradiation
High-energy Heavy-ion Probes
and Memory
Y.-H. Hwang 1, H.-M. An 2 and W.-J. M. Hazama 1, S. Abo 1, F. Wakaya 1,
S. Shin and K.R. Kim, Ulsan Natl.
Inst. of Sci. and Technol., Korea

Cho 1, 1 Kwangwoon Univ. and 2
Osan College, Korea

T. Makino 2, S. Onoda 2, T. Ohshima
2, T. Iwamatsu 3, H. Oda 3 and M.
Takai 1, 1 Osaka Univ., 2 JAEA and 3
Renesas Electronics, Japan

8P-11-36
Possibility and Design ofResonant Terahertz Emittersbased on Nanoscale Strained
Silicon Plasma Wave Transistors
with Enhanced Mobility

8P-11-37
Tunneling Field-effect Transistor
with Si/SiGe Material for High
Current Drivability

8P-11-38
The Effect of Spacer Dielectrics
on Performance of Ge-based
Tunneling FETs

8P-11-40
Analysis of Electron Transfer
among Quantum Dots in
Two-dimensional Quantum Dot
Network

8P-11-41
ElectricalandReliability
Characteristics of Sm2O3 andSmTixOy Gate Dielectrics in
InGaZnO Thin-film Transistors

J.Y. Park, S.-H. Kim and K.R. Kim,
Ulsan Natl. Inst. of Sci. and Technol.,Korea

H. Fujino and T. Oya, Yokohama Natl.
Univ., Japan

8P-11-44
Ultra-thin 4.5nm Nickel SilicideFilm
byTwo-step
Low
Temperature Microwave Anneal

C.-T. Wu 1, Y.-J. Lee 1,2, F.-K. Hsueh
1, P.-J. Sung 1, T.-C. Cho 3, M.I.
Current 4 and T.-S. Chao 3, 1 NARL,
2 Natl. Chung Hsing Univ. and 3 Natl.
Chiao Tung Univ., Taiwan and 4
Current Scientific, USA

8P-11-48
Nanoscale Energy and Optical
Analysisusing
Cathodoluminescence in the
TEM
A. Maigne and D.J. Stowe, Gatan,
USA

H.W. Kim 1, S.W. Kim 1, M.-C. Sun
1,2, J.H. Kim 1, E. Park 1 and B.-G.
Park 1, 1 Seoul Natl. Univ. and 2
Samsung Electronics, Korea

C.-H. Chen 1, F.-H. Chen 1, Y.-S.
Shen 1, J.-L. Her 1, K. Koyama 2,
and T.-M. Pan 1, 1 Chang Gung
Univ., Korea and Kagoshima Univ.,
Japan

8P-11-45
Preliminary Analysis of Channel
Electron Scattered from Drain
Region of Silicon Decanano
Diode at Low Drain Voltage using
NEGF Method
T. Tsutsumi and K. Tomizawa, Meiji
Univ., Japan

Y.J. Yoon 1, G.M. Yoo 1, S. Cho 2 and
I.M. Kang 1, 1 Kyungpook Natl. Univ.
and 2 Gachon Univ., Korea

8P-11-42
Study of Vth Fluctuation Induced
Source/Drain Extension Dopingof Tri-gate Transistor using 3D
Device Simulation

T. Tsutsumi, J. Lee and K. Tomizawa,
Meiji Univ., Japan

8P-11-46
Deformable Silicone Grating
fabricated with a Photo-imprinted
Polymer Mold

T. Ishihara 1, I. Yamada 1, J.
Yanagisawa 1, J. Nishii 2 and M.
Saito 3, 1 Univ. of Shiga Pref., 2
Hokkaido Univ. and 3 Ryukoku Univ.,
Japan

8P-11-35
Novel Design of Standard
Ternary Inverter and its Noise
Margin Analysis based on
Controllable
Off-leakage
Currents in 32nm CMOS
Technology

Y. Kim, E.-S. Jang, S. Shin and K.R.
Kim, Ulsan Natl. Inst. of Sci. andTechnol., Korea

8P-11-39
Physical Modeling and Analysis
for Performance Enhancement of
Plasmonic THz Detector basedon Silicon Field-effect Transistor
with Ultra-thin Gate Dielectric

M.W. Ryu, J.S. Lee, B.R. Kim and
K.R. Kim, Ulsan Natl. Inst. of Sci. andTechnol. Korea

8P-11-43
Active Dopant Profiling using
Scanning Probe at Ultra-shallow
as Implanted Si activated by
Combination of Spike Lamp andLaser Annealing
H. Osae 1, S. Abo 1, F. Wakaya 1, T.
Iwamatsu 2, H. Oda 2 and M. Takai 1,
1 Osaka Univ. and 2 Renesas
Electronics, Japan

8P-11-47
Active Water Harvesting toEnhance Self-cleaning Property
using Biomimetic Functional
Surface Structure
C.-Y. Yang, C.-Y. Yang and C.-K.
Sung, Natl. Tsing Hua Univ., Taiwan

8P-11-49
Non-ohmic
andElectrical
PropertiesofCaCu3Ti4O12
Ceramics prepared by an Aloe
Vera Solution Method

E. Swatsitang 1 and T. Putjuso 2, 1
Khon Kaen Univ. and 2 Rajamangala
Univ. of Technol., Thailand

Nanofabrication
Chairpersons: S. Shingubara (Kansai Univ.) and Y. Liu (AIST)
8P-11-50
8P-11-51
Enhanced Light Output of In-plane Oblique Pulsed-laser
Vertical GaN-based LEDs with Deposition for Growth of Metal
SurfaceRoughenedby Oxide
Nanostructures
with
Refractive-index-matched
Laterally Modulated Profiles
Si3N4/GaN Nanowire Arrays
K. Fujiwara, T. Kushizaki, Y. Fujiwara,
T.-H. Lin, Y.-C. Tu, G.-Y. Lin, Y.-W. Lo,
R.-W. Wu and S.-J. Wang, Natl.
Cheng Kung Univ., Taiwan

K. Okada, A.N. Hattori and H.
Tanaka, Osaka Univ., Japan

8P-11-52
Light Intensity and Temperature
Dependence of Field Emission
Current from a p-type Si Emitter
milled by Gallium Focused Ion
Beam
T. Yoshimoto 1 and T. Iwata 2, 1 Toyo
Univ. and 2 Mie Univ., Japan

8P-11-53
Formation of Nanohole for
Positioning of Colloidal Quantum
Dot

T. Sakai 1, A. Hirota 1, S. Nakashima
1,2 and K. Mukai 1, 1 Yokohama Natl.
Univ. and 2 Riken Advanced Res.
Inst., Japan

8P-11-54
Selective
GrowthofAg
Nanostructures on FIB-induced
Amorphous Silicon
E. Nakamura, M. Nishi, H. Itasaka, T.
Matsuoka, Y. Shimotsuma, K. Miuraand K. Hirao, Kyoto Univ., Japan

8P-11-58
Low Temperature Conformal
Formation of Silicon Carbide on
the Surface of Nanostructures
A. Fallah, Y. Nakayama and Y.
Yonetani, Osaka Univ., Japan

8P-11-55
High Performance of Electrical
Characteristic on Solution IGZO
Thin
Film
Transistors
byMicrowave Irradiation with a Low
Thermal Budget

8P-11-56
Seedless Growth of High-density
Zinc Oxide Nanorods on
Multilayer
GraphenebyElectrochemical Deposition

8P-11-59
La1.7Sr0.3NiO4Nanocrystalline
Powders
preparedbyaCombustion Method using Urea
as
Fuel:
Preparation,
Characterization,
and
their
Colossal Dielectric Constant

8P-11-60
FabricationofCorrugatedMicrofiber Bragg Gratings by
Two-beamInterference
Lithography Method

J.-G. Gu 1, K.-S. Kim 1, H.-M. An 2
and W.-J. Cho 1, 1 Kwangwoon Univ.
and 2 Osan College, Korea

K. Meeporn 1, T. Yamwong 2 and P.
Thongbai 1, 1Khon Kaen Univ. and 2
Natl. Metal and Materials Technol.
Ctr., Thailand

N.S.A. Aziz 1, T. Nishiyama 2, N.I.
Rusli 3, M.R. Mahmood 4, K. Yasui 2
and A.M. Hashim 1,5, 1 Univ.
Teknologi Malaysia, Malaysia, 2Nagaoka Univ. of Technol., Japan, 3
Univ. Malaysia Perlis and 4 Universiti
Teknologi MARA, Malaysia

8P-11-57
Dense Packing of Colloidal
Quantum Dots on Patterned
Substrate

Y. Shimizu 1, I. Morimoto 1, S.
Nakashima 1,2 and K. Mukai 1, 1
Yokohama Natl. Univ. and 2 Riken
Advanced Res. Inst., Japan

Y.-C. Lin and L.A. Wang, Natl. Taiwan
Univ., Taiwan

Inorganic Nanomaterials
Chairpersons: X.W. Zhao (Tokyo Univ. of Sci.) and K. Terabe (NIMS)
8P-11-61 Withdrawn
8P-11-62
8P-11-63
Fabrication of V2O3 Thin Film by Preparation and Properties of
RF Magnetron Sputtering using Al2O3/SiC Nanocomposites using
Oxygen Radical and V-metal
SiC Nanoparticles Synthesized
Y. Shimazu 1, T. Suetsugu 1, E. Sakai by Mechanochemical Method

8P-11-64
Synthesis of Cu2ZnxFe1-xSnS4
Nanoparticles with Tunable Band
Gap

8P-11-65
Synthesis andCharacterizationof CaF2:Eu2+ and SrF2:Eu2+
Nanocrystals

8P-11-68
Different
Microstructuresof
BiVO4 Photocatalysts and their
Photocatalytic Performance on
Dye Degradation

S. Rungrodnimitchai 1, D. Kotatha 1,
C. Dokbua 1, Y. Hasegawa 2 and T.
Kawai 3, 1 Thammasat Univ.,
Thailand, 2 Hokkaido Univ. and 3
Nara Inst. of Sci. and Technol., Japan

8P-11-69
Co-doped Titanate Nanotubes:
Synthesis, Characterization, andProperties

P. Kasian 1, T. Yamwong 2 and S.
Maensiri 1, 1 Suranaree Univ. ofTechnol. and 2 Natl. Metals andMaterials Technol. Ctr., Thailand

8P-11-73
Eucalyptus Globulus Leaf Extract
Mediated Synthesis of Silver
Nanoparticles

M. Balamurugan and S. Saravanan,
Sona College of Technol., India

8P-11-122L
Optical and Thermal Study ofSynthesized SnS Nanomaterials

M.D. Chaudhary 1 and S.H. Chaki 1,
Sardar Patel University, India2, H. Kumigasira 2 and T. Higuchi 1, 1
Tokyo Univ. of Sci. and 2 KEK, JapanS. Kangwantrakool, Suranaree Univ.
of Technol., Thailand

8P-11-66
One Step Synthesis of Pt-Co and
Pt-Ce/TiO2 Catalysts by Flame
Spray
Pyrolysisfor
Hydrogenation of 3-Nitrostyrene

8P-11-67 Withdrawn
Synthesis of Gallium Nitride
Nanoparticles by DC Arc
Thermal Plasma

8P-11-70
Enhancing
Performanceof
Dye-sensitized Solar Cells by
TiCl4 Treatment of Different
concentration

8P-11-71
Nanosize
Effecton
Thermoelectric Properties

S.
Pisduangdaw
1,O.
Mekasuwandumrong 2, H. Yoshida 3,
S. Fujita 3, M. Arai 3 and J. Panpranot
1, 1 Chulalongkorn Univ. and 2
Silpakorn Univ., Thailand and 3
Hokkaido Univ., Japan

T.S. Eom, K.H. Kim and H.W. Choi,
Gachon Univ., Korea

8P-11-74
Ferromagnetic Analysis of ZnO(Core)/crystalline Carbon (Shell)

M. Subramanian, Z. Zulkifli, M.
Tanemura and T. Hihara, Nagoya
Inst. of Technol., Japan

8P-11-123L
Temperature Dependence of
Sulfur Vapor Annealing of FeS2
Films
by
ElectroSpray
Deposition Method

T. Doe, Y. Ishikawa, K. Nabesaka, M.
Horita and Y. Uraoka, Nara Inst. ofSci. and Technol., Japan

8P-11-126L
In situ Observation of Negative
Electron Affinity Surfaces during
Photoelectron
EmissionbySurface
Photo-Absorption
MethodK. Hayase, K. Suzuki, Y. Inagaki, R.
Chiba, S. Midorikawa, H. Iijima, andT. Meguro,, Tokyo University of
Science, JapanT.-H. Kim, S. Choi and D.-W. Park,
Inha Univ., Korea

theT. Takami 1, J.-G. Cheng 2, J.-S.
Zhou 3 and J.B. Goodenough 3, 1
Osaka Univ., Japan, 2 Chinese
Academy of Sci., China and 3 Univ. of
Texas at Austin, USA

8P-11-75
Optical and Electrical Properties
of GaN Thin Films deposited on
the Graphene and Sapphire
Substrates by Magnetron Sputter

S.M. Sim, D.U. Lee, G. Oh and E.K.
Kim, Hanyang Univ., Korea

8P-11-124L
Synthesis of ZnSe Nanocrystals
in Apoferritin Cavity
S. Li and S. J. Park
, Gachon Univ., Korea

E. Ha, L.Y.S. Lee and K.-Y. Wong,
Hong Kong Polytechnic Univ., China

C. Suwanchawalit 1, P. Wandee 1, S.
Buddee 2 and S. Wongnawa 2, 1
Silpakorn Univ. and 2 Prince ofSongkla Univ., Thailand

8P-11-72
Deposition of Ti-Si-C Thin Films
onto Silicon and Stainless Steel
SubstratesbyMagnetron
Sputtering
using
Elemental
Targets
T. Sonoda, S. Nakao
Ikeyama, AIST, Japan

and

M.

8P-11-76
A
SimpleAloe
Vera
Plant-extracted
Solution
Hydrothermal and Magnetic
Properties of NiCuZn Ferrite
Nanoparticles
S. Phumying 1, S. Labuayai 1, E.
Swatsitang 1, V. Amornkitbamrung 1
and S. Maensiri 2, 1 Khon Kaen Univ.
and 2 Suranaree Univ. of Technol.,Thailand

8P-11-125L
Preparation of WO3 Nanorods bya Hydrothermal Method forElectrochromic Device

C.-H. Lu 1, M. H. Hon 1, C.-Y. Kuan 1
and I.-C. Leu 2, 1 Natl. Cheng Kung Univ. and 2 Natl.
Univ. of Tainan, Taiwan

Nanoimprint, Nanoprint and Rising Lithography
Chairpersons: Y. Hirai (Osaka Pref. Univ.) and H. Hiroshima (AIST)
8P-11-77
8P-11-78
A Novel Fabrication of Silver Flexible
Fluorine-based
Nanostructure
inthe Micro-lens
ArraysforMoth-eye-like
Surface Photovoltaic Modules Application
Morphology
K. Satoh and T. Matsuura, Daikin

8P-11-79
EvaluationofAbrasion
Resistance for Antisticking Layer
by Scanning Probe Microscopy

C.-H. Liu, C.-K. Sung and C.-Y. Lo,
Natl. Tsing Hua Univ., Taiwan

Industries, Japan

8P-11-81
Large Area Seamless Roller
Mold using Fast EB Lithography(rEBL) for R2R Process

8P-11-82
Circular Imprint for Polylactide
Stent Fabrication

8P-11-83
SimpleIn-liquid
Alignment
System using High Contrast
Mold for UV Nanoimprint
Lithography

N. Ito 1, M. Abe 1, T. Kitada 1, Y.
Miyazawa 1, M. Ataka 2, T. Kishiro 2
and S. Matsui 3, 1 Asahi Kasei, 2Holon and 3 Univ. of Hyogo, Japan

8P-11-85
Fine
Nanoscale
Structure
Fabrication using Combination of
UV-Nanoimprint Lithography andAnisotropic Wet Etching Toward
Single Nanoscale Interconnects
H. Kuwae, J. Mizuno, A. Okada andS. Shoji, Waseda Univ., Japan

P.-T. Teng, F.-Y. Chang and M.-J. Lin,
Taiwan Univ. of Sci. and Technol.,Taiwan8P-11-86
Novel
Template
Releasing
Methods for Low Defective
Process
T. Kitagawa 1,2, N. Nakamura 1, T.
Shiotsu 1,2, H. Kawata 1,2 and Y.
Hirai 1,2, 1 Osaka Pref. Univ. and 2
JST-CREST, JapanM. Okada 1,2, Y. Haruyama 1,2 and
S. Matsu i1,2, 1 Univ. of Hyogo and 2
JST-CREST, Japan

K. Suzuki 1,2, S.-W. Youn 1,2, Q.
Wang 1,2 and H. Hiroshima 1,2, 1
AIST and 2 JST-CREST, Japan

8P-11-80
Material
Dependency
ofMolecular Orientation in Liquid
Crystalline Polymer induced by
Nanoimprint-graphoepitaxy

M. Okada 1, R. Hosoda 1, M. Kondo
1, Y. Haruyama 1, T. Sasaki 2, H. Ono
2, N. Kawatsuki 1 and S. Matsui 1, 1
Univ. of Hyogo and 2 Nagaoka Univ.
of Technol., Japan

8P-11-84
Methods of Forming and Scaling
Up a 3 Dimensional Hierarchical
Nickel Mold

Y.C. Loke, J.B.K. Law, W.S. Tan,
C.Y.L. Tan, S.M. Man, K.A. Mahabadi
and H.Y. Low, A*STAR, Singapore

8P-11-87
Sensitivity
Improvementof
Heterostructured
Organic
Photodiodefor
Radiation
Detection using Nanoimprint
Lithography
K. Tada 1, E. Takada 1, K. Uemura 2,
K. Fujii 1, T. Noma 2, H. Kawata 2
and Y. Hirai 2, 1 Toyama Natl. College
of Technol. and Osaka Pref. Univ.,Japan

BioMEMS, Lab on a Chip
Chairpersons: K. Furukawa (NTT) and A. Matsumoto (Tokyo Medical and Dental Univ.)
8P-11-88
8P-11-89
8P-11-90
Study on Reflected Surface Microfluidic Chip for detecting Preparation of PLGA Micro
Acoustic Wave Actuator for Enzymatic Reaction of Botulinum Carrier
using
GeometricallyPowders using a Grating using FRET
Passive Break Up Microfluidic
Reflector
Y.M. Bae, K.-H. Lee, J. Yang and S. Chip

8P-11-91
Characterization
andOptimization of On-chip Short
Peptides Synthesis by following
the Principle of Fmoc-solid
Phase Peptide Synthesis

Y. Arisue 1, T. Saiki 2, A. Yamaguchi 1
and Y. Utsumi 1, 1 Univ. of Hyogo and2 Hyogo Pref. Inst. of Technol., Japan

Jeon, Korea Electrotechnology Res.
Inst., Korea

C.M. Kim and G.M. Kim, Kyungpook
Natl. Univ., Korea

8P-11-92
ABO-Rh Blood grouping with
Whole Blood by Array SPR
Imaging Technique

8P-11-93
Effect of Immobilized Antibody
and Red Blood Cell (RBC)
Antigen on the Adhesion
Strength

8P-11-94
FabricationofHydrophobic
Microchannel by Gas-assisted
Thermoforming Process using
Anodic Aluminum Oxidation Mold

8P-11-95
Fabrication of β-glucosidase
Microarray by in situ Protein
Synthesis and Immobilization

K.-Y. Hsiao, R.-H. Hong, N.-W. Changand S.-Y. Yang, Natl. Taiwan Univ.,
TaiwanT. Hirai 1, S. Sato 1, S. Ueno 1,2, M.
Biyani 1,2, R. Iizuka 1,2, T. Funatsu
1,2 and T. Ichiki 1,2, 1 Univ. of Tokyo,
2 JST-CREST, Japan

8P-11-97
Tubular Cell-laden Microgel
Formation inside Glass Capillary
for Tissue-engineered Blood
Vessel Applications

8P-11-98
Quantitative Evaluation of Origin
of
ChangesinElectrophysiological Properties ofCells on Micro Electrodes using
Impedances
Analysis
Measurement Setup

8P-11-99
Improvement
ofThin
Metal-layers for Application of theEnhanced Fluorescence with the
Plasmonic
ChiptoEnzyme-linked Immunosorbent
Assay (ELISA)

8P-11-102
ComparisonofOptimized
Condition for Inductively Coupled
Plasma-reactive Ion Etching of
Quartz Substrate and its Optical
Applications

8P-11-103
CMOS Integrated High-Q MEMS
Resonator

8P-11-106
Development of Ultra-high-speed
Microfluidic
Submicron-droplet
PCR Device using Circulating
Water System and a Photo
Detector

8P-11-107
Improvement of Tensile Strengthof Freestanding Single Crystal
Silicon Microstructures using
Localized Harsh Laser Treatment

N.
Houngkamhang
1,
A.
Vongsakulyanon 1, P. Peungthum 1,
K. Sudprasert 1, P. Kitpoka 1, M.
Kunakorn 1, B. Sutapun 2, R. Amarit
3, A. Somboonkaew 3 and T. Srikhirin
1, 1 Mahidol Univ., 2 Suranaree Univ.
of Technol. and 3 NECTEC, Thailand

8P-11-96
Development of On-chip Flow
Cytometry System based on
BrightField/FluorescentDual-image Analysis
A. Hattori 1, H. Kim 2 and K. Yasuda
1,2, 1 Tokyo Medical and Dental Univ.
and Kanagawa Academy of Sci. andTechnol., JapanT. Srikhirin 1, C. Pipatpanukul 1, K.
Sudprasert 1, P. Peungthum 1, A.
Vongsakulyanon 1, P. Kitpoka 1, M.
Kunakorn 1, B. Sutapun 2, R. Amarit
3 and A. Somboonkaew 3, 1 Mahidol
Univ., 2 Suranaree Univ. of Technol.
and 3 NECTEC, Thailand

J. Jung 1, J. Oh 2, K. Kim 3, C. Cha 4
and J. Oh 1, 1 Chonbuk Natl. Univ.,
Korea, 2 Univ. of Pennsylvania, USA,
3 Univ. of British, Canada and 4
Harvard Medical School, USA

K. Matsuura, A. Hattori, F. Nomura, T.
Hamada, H. Terazono and K.
Yasuda, Tokyo Medical and Dental
Univ., Japan

L. NG, Y. Ukita and Y. Takamura,
JAIST, Japan

K. Tawa 1,2, T. Nakayama 1,2, T.
Taga 1,2 and K. Kintaka 1, 1 AIST
and 2 Kwansei Gakuin Univ., Japan

Microsystem Technology and MEMS
Chairpersons: N. Miki (Keio Univ.) and T. Namazu (Univ. of Hyogo)
8P-11-100
8P-11-101
A Fully MEMS-compatible Wet A Study of Electroless NiP
Etching
Technology
of Diffusion Barrier in TSV for 3D
Electroless Nickel Alloy Film
Packaging
Y. Zhang 1, A. Toda 2, Q. Zhu 1, T.
Itoh 1 and R. Maeda 1, 1 AIST and 2
Meltex, Japan

H.-J. Son, T.-Y. Kim, S.-K. Lim and
S.-J. Suh, Sungkyunkwan Univ.,
Korea

8P-11-104
FabricationofPreciseMulti-thread Helical Grooves onto
Inner Surfaces of Small-diameter
Copper Pipes

8P-11-105
Modeling and Analysis ofStretchable Interconnections in
Elastomeric Electronic Device

T. Horiuchi and Y. Suzuki, Tokyo
Denki Univ., Japan

H. Hocheng and C.-M. Chen, Natl.
Tsing Hua Univ., Taiwan

S.-H. Tseng, H.-H. Tsai and Y.-Z.
Juang, NARL, Taiwan

Y.-H. Tang, Y.-H. Lin, P.-L. Chen,
M.-H. Shiao and C.-N. Hsiao, NARL,
TaiwanH. Terazono 1,3, H. Kim 1, H. Takei
1,2, A. Hattori 3 and K. Yasuda 1,3, 1
Kanagawa Academy of Sci. andTechnolo., 2 Toyo Univ. and 3 Tokyo
Medical and Dental Univ., Japan

M. Elwi Mitwally 1, T. Tsuchiya 1, O.
Tabata 1 and S. Sedky 2, 1 Kyoto
Univ., Japan and 2 Zewail City of Sci.
and Technol., Egypt

8P-11-108
Actuation of Magnetic Particles
on Array of Magnetic Elements

8P-11-109
Influence of Bonded Area Sizeon
Cracking
inReactive
Soldering with Al/Ni Multilayer
Films

8P-11-110
Fabrication of Convex Si
Microstructures with 45° Mirror
Plane
for
ApplicationofMicrofluidic Channels

8P-11-111
Structure Control of Carbon
Nanotubes
ElectrodeforHigh-Power Glucose Fuel Cell

8P-11-112
Vacuum-controlled Wafer-level
Packaging for MicromechanicalDevices

8P-11-113
Improvement of Microbolometer
Responsivity by Down Scaling

8P-11-114
A MEMS-based Convective Tilt
Sensor with Expanded Operating
Range and Improved Sensitivity

8P-11-115
Fabrication and Characteristics
of Electromagnetically ActuatedOptical Micro Chopper

8P-11-116
Fabrication of Electroforming
Long Period Fiber Grating

8P-11-117
A Novel Micro-machined Mesh
Grid for a Triode-type Carbon
Nanotube Field Emitter

8P-11-118
Fabrication Method for Inclined
Micro Ciliary Actuator using
Self-oscillating Gel

8P-11-127L
Micro Pattern Fabrication of
Perflurosulfonic Acid (PFSA) Filmby CF4 RIE Process

F. Tsumori, T. Abe, S. Seki and K.
Nagasawa, Kyushu Univ., Japan

S.J. Kang 1,2, Y.S. Moon 1 and S.Y.
Choi 1, 1 Kyungpook Natl. Univ. and
2 Samsung Electronics., Korea

C.-C. Chiang, J.-C. Chao and C.-Y.
Ho, Natl. Kaohsiung Univ. of AppliedSci., Taiwan

8P-11-128L
Photoresist/Pt
Electrode/
Perflurosulfonic Acid (PFSA)Multilayer Structure for Single
Chip Micro Direct Methanol Fuel
Cell (SC-μDMFC)

Y. Sakurai, D. Tanaka, S. Ohata and
A. Kawai, Nagaoka Univ. of Technol.,Japan

S. Ito 1, T. Morikaku 1, S. Inoue 1 and
T. Namazu 1,2, 1 Univ. of Hyogo and2 JST-PRESTO, Japan

A. Tiwari, H. Satoh, M. Aoki, M.
Takeda, N. Hiromoto and H. Inokawa,Shizuoka Univ., Japan

K.J. Lee, N.T. Hong, M. Jo, S. Lee
and S.S. Yang, Ajou Univ., Korea

8P-11-129L
Chip-lessWireless
NeuralProbes based on One-port SAW
Delay
Line
and
NeuralFiring-dependent Capacitors

I.K. Jung and K. Lee, Ajou Univ.,
Korea

Y. Koide, D. Teramoto, S. Konishi and
T. Ando, Ritsumeikan Univ., Japan

J.C. Choi 1, D.G. Jung 1, Y.C. Choi 1,
H.W. Kim 1, R.A. Lemelemu 1, W.I
Jang 2 and S.H. Kong 1 1 Kyungpook
Natl. Univ. and 2 Electronics andTelecommunications
Res.
Inst.,Korea

T. Kogure, R. Okada, S. Maeda and
S. Nagasawa, Shibaura Inst. ofTechnol., Japan

Y. Bamba, T. Shimizu and M. Yang,
Tokyo Metropolitan Univ., Japan

H.W. Kim, J.C. Choi, D.G. Jung, Y.C.
Choi, R.A. Lemelemu and S.H. Kong,
Kyungpook Natl. Univ., Korea

Y. Sakurai, D. Tanaka, S. Ohata and
A. Kawai, Nagaoka Univ. of Technol.,Japan