MNC 2014 (November 4-7, Hilton Fukuoka Sea Hawk, Fukuoka, Japan) Schedule
Tuesday, November 4
Room A （Rigel, 3F）
13:00-16:10 MNC 2014 Technical Seminar in JapaneseTechnical Seminar in Japanese Registration Desk
November 4, 12:20 - 15:00 (1F Lobby)
Conference Registration Desk
November 4, 15:30 - 18:30 (1F Lobby)
November 5, 8:30 - 12:10 (1F Lobby)
November 5, 12:20 - 18:00 (3F Lobby)
November 6, 8:30 - 18:00 (3F Lobby)
November 7, 8:30 - 16:00 (3F Lobby)

Seala Brasserie and Lounge (4F)
17:30-19:30 Get Together Party

Wednesday, November 5
Room P-1 （Argos A, 1F）
5P-1: Opening & Plenary Session 9:30-12:10
Opening Remark and 2014 Award Presentation
T. Mayer, Pennsylvania State Univ., USA
J. Hone, Columbia Univ., USA
K. Kataoka Univ. of Tokyo, Japan
Lunch
Room A （Vega, 3F）
Room B （Rigel, 3F）
5A-2: 13:30-15:10
5B-2: 13:30-15:20
Electron and Ion Beam Technologies Inorganic Nanomaterials I
5A-2 Author's Interview: 15:10-15:20

Room C （Chapel, 3F）
5C-2: 13:30-15:00
Nanofabrication I

5B-2 Author's Interview: 15:20-15:30

Room D （Boardroom, 3F）
5D-2: 13:30-15:10
Symp. B: Hybrid Nanosystem I

5C-2 Author's Interview: 15:00-15:10

Garden Lobby (3F)
Coffee Break
5C-3: 15:25-17:05
Innovative Microdevices

5A-3: 15:25-16:55
Symp. A: Advanced Patterning I

5B-3: 15:30-17:20
BioMEMS, Lab on a Chip I

5A-3 Author's Interview: 16:55-17:05

5B-3 Author's Interview: 17:20-17:30

5C-3 Author's Interview: 17:05-17:15

5D-3: 15:25-17:05
Symp. B: Hybrid Nanosystem II
5D-2,3 Author's Interview: 17:05-17:15

Vega (3F) and Garden Lobby (3F)
17:30-19:00 Happy Hour

Thursday, November 6
Room A （Vega, 3F）
6A-4: 9:00-10:30
Advanced Photolithography

Room B （Rigel, 3F）
6B-4: 9:00-10:30
Nanostructure Engineerred Devices

Room C （Chapel, 3F）
6C-4: 9:00-10:30
Process and Characterization I

Room D （Boardroom, 3F）
6D-4: 9:00-10:30
Graphene Appilication

6A-4 Author's Interview: 10:30-10:40

Garden Lobby (3F)
6A-5: 10:45-12:15
Symp. A: Advanced Patterning II

Coffee Break
6B-5: 10:40-12:10
6C-5: 10:35-12:15
Optelectric Devices and Materials
Process and Characterization II

6D-5: 10:35-12:15
Nanocarbon Property

6A-5 Author's Interview: 12:15-12:25

6B-4,5 Author's Interview: 12:10-12:25

6D-4,5 Author's Interview: 12:15-12:25

6C-4, 5 Author's Interview: 12:15-12:25

Lunch
6C-6: 13:20-15:30
Nano Tool

6A-6: 13:40-15:30
Nanofabrication II

6B-6: 13:40-15:20
Inorganic Nanomaterials II

6A-6 Author's Interview: 15:30-15:40

6B-6 Author's Interview: 15:20-15:30

6C-6 Author's Interview: 15:30-15:40

6D-6: 13:20-15:30
BioMEMS, Lab on a Chip II
6D-6 Author's Interview: 15:30-15:40

Garden Lobby (3F)
Coffee BreakRoom P-2 （Argos D, 1F）
6P-7: 15:40-17:40 Poster Session I
Advanced Photolithography, Electron and Ion Beam Technologies, Nanocarbons, Nanofabrication, Inorganic Nanomaterials, BioMEMS, Lab on a Chip andMicrosystem Technology and MEMS
Penthouse (34F)
18:00-20:00 Banquet

Friday, November 7
Room A （VEGA, 3F）
7A-8: 9:00-10:00
Symp. A: Advanced Patterning III

Room B （Rigel, 3F）
7B-8: 9:00-10:20
Organic Nanomaterials

Room C （Chapel, 3F）
7C-8: 9:00-10:20
Nanofabrication III

7B-8 Author's Interview: 10:20-10:30

Room D （Boardroom, 3F）
7D-8: 9:00-10:30
Nanotube Application

7C-8 Author's Interview: 10:20-10:30

Garden Lobby (3F)
Room A （Vega, 3F）
7A-9: 10:15-11:45
Symp. A: Advanced Patterning IV

Coffee BreakRoom B （Rigel, 3F）
Room C （Chapel, 3F）
7B-9: 10:45-11:55
7C-9: 10:45-11:45
Nanoimprint, Nanoprint and Rising
Nanoscale Memory
Lithography I

Room D （Boardroom, 3F）
7D-9: 10:45-12:05
Transition Metal Dichalcogenides

7A-8, 9 Author's Interview: 11:45-11:55

7B-9 Author's Interview: 11:55-12:05

7D-8, 9 Author's Interview: 12:05-12:15

7A-10: 13:00-14:30
Resist and Directed Self-Assembly

Lunch
7B-10: 13:00-14:30
7C-10: 13:10-14:30
Sensing Devices
Nanoimprint, Nanoprint and Rising
Lithography II

7D-10: 13:10-14:30
Inorganic Nanomaterials III

7A-10 Author's Interview: 14:30-14:40

7B-10 Author's Interview: 14:30-14:40

7D-10 Author's Interview: 14:30-14:40

7C-9 Author's Interview: 11:45-11:55

7C-10 Author's Interview: 14:30-14:40

Room P-2 （Argos D, 1F）
7P-11: 14:40-16:40 Poster Session IISymp. B: Hybrid Nanosystem, Resist and Directed Self-Assembly, Nanocarbons, Nanodevices, Nanofabrication, Inorganic Nanomaterials, OrganicNanomaterials, NanoTool and Nanoimprint, Nanoprint and Rising Lithography