MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan

Tuesday, November 10
Room A (203 and 204, 2F)
13:10-16:45 MNC 2015 Technical Seminar ‘’Nanoimprint Technology’’ in Japanese
Lobby (3F)
17:10-19:10 Get Together Party

Wednesday, November 11
Room P (3F)
11P-1: Plenary Session (9:30-12:10)
Chairpersons: M. Nagase (Univ. of Tokushima), T. Sato (Toshiba) and K. Nishiguchi (NTT)9:30-9:50
Opening Remarks: Y. Miyamoto (Tokyo Inst. of Technol.)Award Presentation: M. Nagase (Univ. of Tokushima) and Y. Miyamoto (Tokyo Inst. of Technol.) , MNC 2014 Outstanding Paper, Most
Impressive Presentation, Most Impressive Poster and Young Author’s Award
Announcement from Committee: Y. Ono (Univ. of Toyama)
11P-1-1 9:50-10:30
Current Policy and R&D Activities for Nano‐Technology in MEXT (Plenary)
M. Nishijo, Ministry of Education, Culture, Sports, Sci. and Technol., Japan
Lobby (3F)
Coffee Break
11P-1-2 10:50-11:30
Bio-Inspired Computing with Memristors (Plenary)
D.B. Strukov, UC Santa Barbara, USA
11P-1-3 11:30-12:10
EUV Lithography, Status and Prospects (Plenary)
J. Benschop, ASML, The Netherlands

Lunch
Room A (203 and 204, 2F)
11A-2: Symposium A: Symp.
on "Big Data" for Advanced
Patterning I
S. Nagahara (Tokyo Electron)
J. Miyazaki (ASML)
11A-2-0
13:30
Greeting
S. Nagahara, Tokyo Electron,Japan

11A-2-1
13:35
Potential of Open Science toChange the Framework of
Manufacturing beyond Industry
4.0 (Invited)
K. Hayashi, Natl. Inst. of Sci. andTechnol. Policy, Japan
11A-2-2
14:05
Technology and Design CoOptimization for era of ''Big Data''
Low k1 Imaging (Pitch Scale) to
Cost Scale (Invited)
J. Kye, Globalfoundries, USA

11A-2-3
14:35
OPC: a Cross Road of Data Flows(Invited)
P.D. Bisschop, IMEC, Belgium

Room B (202, 2F)
11B-2: Organic Nanomaterials
S. Takami (Tohoku Univ.)
H. Kasai (Tohoku Univ.)

Room C (201, 2F)
11C-2: Carbon Nanotube
M. Tanemura (Nagoya Inst. ofTechnol.)
D. Kondo (Fujitsu Labs.)

11B-2-1
13:30
Novel Crystallization Process in a
Hybrid of ''Sublimation andRecrystallization'' via Ionic Liquidfor
Organic
Semiconductor
Materials:
H. Enomoto, S. Maruyama and Y.
Matsumoto, Tohoku Univ., Japan
11B-2-2
13:50
Size-Dependence of Nonlinear
Optical Properties of PolyDCHD
Nanocrystals
H. Maki 1, T. Onodera 1, H. Kasai
1, R. Sato 2, Y. Takeda 2 and H.
Oikawa 1, 1 Tohoku Univ. and 2
NIMS, Japan
11B-2-3
14:10
Direct Observation of Anodic
Dissolution and Filament Growth
Behavior in PEO-Based Atomic
Switch Structures
K. Krishnan, T. Tsuruoka and M.
Aono, NIMS, Japan

11C-2-1
13:30
CarbonNanomaterials
forEnergy Harvesting and Storage
inAutonomous
Electronics(Invited)
G.A.J. Amaratunga, Univ. ofCambridge, UK

11B-2-4
14:30
Organic-Inorganic
HybridDielectric Material Fabricated by
Molecular-Atomic
Layer
Deposition (MALD) for Thin Film
Transistor (TFT) Applications
J. Huang 1, M. Lee 1,2, A. Lucero
1, L. Cheng 1, M.-W. Ha 3 and J.
Kim 1, 1 Univ. of Texas, USA, 2
Dongjin Semichem and 3
Myongji Univ., Korea

11C-2-2
14:00
Dependence of Thermoelectric
Properties on Chiralities of Single
Wall Carbon Nanotubes
Y. Oshima, Y. Kitamura, H.
Kawai , Y. Maniwa and K.
Yanagi, Tokyo Metropolitan
Univ., Japan
11C-2-3
14:20
Adsorption Effects on the Optical
Properties of Single-Walled
Carbon Nanotubes
S. Chiashi 1,2, K. Kono 1, N.
Homma 1, A. Beniya 1, T.
Yamamoto 1 and Y. Homma 1, 1
Tokyo Univ. of Sci. and 2 Univ. ofTokyo, Japan
11C-2-4
14:40
Electrostatic Actuation of Carbon
Nanotube Cantilever on Planar
Substrate
K. Inotani, K. Takei, T. Arie, andS. Akita, Osaka Pref. Univ.,
Japan

-1-

Room D (Special Conf. Room, 2F)
11D-2: BioMEMS, Lab on a
Chip I
A. Matsumoto (Tokyo Med. andDent. Univ.)
Y. Takamura (JAIST)
11D-2-1
13:30
Single Cell and Molecule
AnalysisbyMicroand
Nanofluidic Devices (Invited)
N. Kaji 1,2 and Y. Baba 1,2, 1
Nagoya Univ. and 2 AIST, Japan
11D-2-2
14:00
A
SiliconNanobiosensing
System for Rapid Detection of
Botulinum Neural Toxins
C.W. Chen 1, Y.B. Chiu 2, B.-S.
Yip 2 and J.-T. Sheu 1, 1 Natl.
Chiao Tung Univ. and 2 Natl.
Taiwan Univ. Hospital, Taiwan
11D-2-3
14:20
Simple Detection of Interleukin-6
on a ZnO-Coated Plasmonic
Chip with a Fluorescence
Microscope
K. Tawa 1,2, C. Sasakawa 1,2, T.
Sujino 3 and M. Umetsu 3, 1
Kwansei Gakuin Univ., 2 AIST
and 3 Tohoku Univ., Japan
11D-2-4
14:40
Selective-Layer-Free
Blood
Ionogram
Usinga0D
Nanotransistor Biosensor
R. Sivakumarasamy 1, K.
Nishiguchi 2, A. Fujiwara 2 and
N. Clément 2, 1 CNRS, France
and 2 NTT, JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
11A-2-4
15:05
Lots of Data as Small Nodes –Overcoming Mask Synthesis
Challenges in IC Manufacturing(Invited)
W. Demmerle 1, T. Schmöller 1,
H. Taoka 2 and D. Yim 2, 1
Synopsys, Germany and 2 Nihon
Synopsys G.K., Japan

11B-2-5
14:50
Photon Upconversion in Organic
Nanomaterials (Invited)
N. Yanai 1,2, 1 Kyushu Univ. and2 JST-PRESTO, Japan
11B-2 Author's Interview:
15:20-15:30

11C-2 Author's Interview:
15:00-15:10

11D-2,3 Author's Interview:
17:25-17:35

Lobby (2F)
Coffee BreakRoom A (203 and 204, 2F)
11A-3: Resist and Directed SelfAssembly
T. Nagai (JSR)
H. Yoshida (Hitachi)
11A-3-1
15:55
High-Sensitivity
Metal-based
Resists for EUV Lithography(Invited)
J.J. Santillan, M. Toriumi and T.
Itani, EIDEC, Japan

11A-3-2
16:25
Shot Noise Limit of Sensitivity ofChemically Amplified Resists
Used for Extreme-Ultraviolet(EUV) Lithography
S. Fujii 1, T. Kozawa 2, K.
Okamoto 1, J.J. Santillan 3 and T.
Itani 3, 1 Hokkaido Univ., 2 Osaka
Univ. and 3 EIDEC, Japan
11A-3-3
16:45
High χ Carbohydrate-Based Block
Copolymer Nanostructured Thin
Films for Nanolithpgraphy
D. Ouhab 1,2, S. Halila 1, R. Tiron
2 and R. Borsali 1, 1 Univ.
Grenoble Alpes and 2 CEA-LETI,France11A-3-4
17:05
Morphologies
ofSymmetric
Diblock
Copolymers
inNanotrench
A. Yoshida, K. Yoshimoto and M.
Ohshima, Kyoto Univ., Japan

11A-3 Author's Interview:
17:25-17:35

Room B (202, 2F)
11B-3: Nanofabrication I
K. Makihara (Nagoya Univ.)
Y. Liu (AIST)
11B-3-1
15:55
Growth and Doping Control of
Ge/Si and Si/Ge Core-Shell
Nanowires (Invited)
N. Fukata 1, M. Yu 1, W.
Jevasuwan 1, M. Mitome 1, Y.
Bando 1 and Z.L. Wang 2, 1
NIMS, Japan and 2 Georgia Inst.
of Technol., USA
11B-3-2
16:25
Controlling Nickelidation Processof Si Nanowire by Ar+ Ion
Irradiation
S. Asada 1, S. Hashimoto 1, K.
Takei 1, J. Sun 1, X. Zhang 1, T.
Xu 1, T. Usuda 1, M. Tomita 1,2,3,
R. Imai 3, A. Ogura 3, T.
Matsukawa 4, M. Masahara 4
and T. Watanabe 1, 1 Waseda
Univ., 2 JSPS, 3 Meiji Univ. and 4
AIST, Japan
11B-3-3 Withdrawn
16:45
Periodic Arrays of Tapered
Silicon Nanowires Fabricated by
the O2-Plasma Modified Colloidal
Lithography and Wet Etching
Y.Y. Lin, C.F. Chuang and S.L.
Cheng, Natl. Ctrl. Univ., Taiwan
11B-3-4
17:05
Impact of Embedded MnNanodots on Resistive Switching
Properties of Si-rich Oxides
T. Arai, A. Ohta, K. Makihara and
S. Miyazaki, Nagoya Univ., Japan

Room C (201, 2F)
11C-3:
Inorganic
Nanomaterials I
K. Terabe (NIMS)
X.W. Zhao (Tokyo Univ. of Sci.)
11C-3-1
15:35
I-III-VI2 Colloidal Semiconductor
Quantum Dots; the Present andthe Future (Invited)
T. Omata, Osaka Univ., Japan

Room D (Special Conf. Room, 2F)
11D-3: BioMEMS, Lab on a
Chip II
K. Tawa (Kwansei Gakuin Univ.)
H. Nagai (AIST)
11D-3-1
15:25
Micro and Nano Robotics andBioMedical Applications (Invited)
F. Arai, Nagoya Univ., Japan

11C-3-2
16:05
Characteristics of Cu-doped NiOThin Films Formed by RF
Magnetron Sputtering
K. Sato 1, S. Kim 1, S. Komuro 2
and X. Zhao 1, 1 Tokyo Univ. ofSci. and 2 Toyo Univ., Japan

11D-3-2
15:55
A
Microfluidic
Chip-based
Systemfor
Analyzing
Nanobioparticles
T. Akagi, S. Oniyanagi and T.
Ichiki, Univ. of Tokyo, Japan

11C-3-3 Withdrawn
16:25
Photoluminescenceof
Nanocrystalline Zinc Stannate
Phosphor Powders
M.-T. Tsai, C.-J. Jian and S.-W.
Lu, Natl. Formosa Univ., Taiwan

11D-3-3
16:15
Super-Fine Inkjetting of SubFemtoliter Agarose Microbeads
for Compartmentalized in Vitro
Selection
M. Biyani, B. Sharma, T.
Shimoda and Y. Takamura,
JAIST, Japan
11D-3-4
16:35
Cardiotoxicity
Prediction
Analysis
Using
Electrophysiological Signals in
LinedUp
CardiomyocyteNetwork
F. Nomura, H. Kurotobi, Y. Sugio,
H. Terazono and K. Yasuda,
Tokyo Med. and Dent. Univ.,
Japan
11D-3-5
16:55
Synergistic Effect of ChemoPhotothermal Therapy Using
Remotely Triggerable Polymer
Microneedles
M.-C. Chen and Z.-W. Linm,
Natl. Cheng Kung Univ., Taiwan
11D-2,3 Author's Interview:
17:15-17:25

11C-3-4
16:25
Atomically Flat KBr(111) Crystal
Growth via Ionic Liquid Flux in a
VacuumM. Yamauchi, S. Maruyama, N.
Ohashi and Y. Matsumoto,Tohoku Univ., Japan

11B-3 Author's Interview:
17:25-17:35

11C-3-5
16:45
Highly Durable Co3O4 CoCatalyst on GaN PhotoElectrode for Energy Conversion
System
K. Noda, S. Yotsuhashi, H.
Hashiba, M. Deguchi and Y.
Yamada, Panasonic, Japan
11C-3 Author's Interview:
17:05-17:15
Room A (203 and 204, 2F)

17:35-19:00 Happy Hour
(Sponsored by Technical Exhibitors)
17:35-17:40 Happy Hour Remark
17:40-17:45 JPK Instruments AG
17:45-17:50 Nihon Synopsys G.K.
17:50-17:55 Quantum Design Japan, Inc / SwissLitho AG
17:55-18:00 GenISys

18:00-18:05 Kyodo International, Inc.
18:05-18:10 Nanotechnology Platform Japan, Nanofabrication
Platform Consortium
18:10-18:15 ADVANTEST
18:15-18:20 THERMO RIKO Co., LTD-2-

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan

Thursday, November 12
Room A (203 and 204, 2F)
12A-4: Symposium C: Next
Generation Lab on a Chip I
T. Tsuchiya (Kyoto Univ.)
N. Miki (Keio Univ.)
12A-4-1
9:00
Quartz and Glass Analytical
Microsystems (Invited)
C. Zhang, E. Freeman, G.
Hatipoglu, H. Min, D. Gaddes and
S. Tadigadapa, Pennsylvania
State Univ., USA
12A-4-2
9:30
Micro/Nano Fabrications for
Biophysical Studies of Motor
Proteins (Invited)
R. Yokokawa, Kyoto Univ., Japan

12A-4-3
10:00
Plant-on-a-Chip:
Towards
ImprovingGlobalCrop
Productivity (Invited)
H. Hida, Kobe Univ., Japan

Room B (202, 2F)
12B-4: Nanodevices I
S. Hara (Hokkaido Univ.)
K. Uchida (Keio Univ.)

Room C (201, 2F)
12C-4: Symposium B: Two
Dimensional Nanomaterials I
M. Tanemura (Nagoya Inst. ofTechnol.)
S. Okada (Univ. of Tsukuba)
12B-4-1
12C-4-1
9:00
9:00
Semiconductor Nanowires for Molecular Beam Epitaxy of Large
Optoelectronic
Device Area Metal Dichalcogenide 2D
Semiconductors and van der
Applications (Invited)
Heterostructureson
H. Tan, Australian Natl. Univ., Waals
A1N(0001)/Si(111) and Sapphire
Australia
Substrates (Invited)A.
Dimoulas,N.C.S.R.
''Demokritos'', Greece
12B-4-2
12C-4-2
9:30
9:30
Temperature Dependence of Formation of Trion in CVD
Electrical Characteristics in Gate- Grown
Large-area
WSe2
All-Around Poly-Si Nanowire Monolayer
JunctionlessThin
Film K. Matsuki 1, J. Pu 1, D. Kozawa
Transistors
1, K. Matsuda 2, L.-J. Li 3 and T.
C.-T. Tso, T.-Y. Liu, F.-M. Pan and Takenobu 1, 1 Waseda Univ., 2
J.-T. Sheu, Natl. Chiao Tung Kyoto Univ., Japan and 3
Univ., Taiwan
KAUST, Saudi Arabia
12B-4-3
12C-4-3
9:50
9:50
Investigation of Drift Effect on Transition Metal Dichalcogenide
Silicon Nanowire Field Effect Based Back-Gate FETs forTransistor Based pH Sensor
Dopamine Detection
S. Kim, D.W. Kwon, R. Lee, D.H. T.T. Nguyen 1,2, T. Komeda 1, E.
Kim and B.-G. Park, Seoul Natl. Watanabe 3, H. Oosato 3, D.
Tsuya 3 and A. Ando 2, 1 Tohoku
Univ., Korea
Univ., 2 AIST and 3 NIMS, Japan
12B-4, 5 Author's Interview:
12C-4-4
11:45-11:55
10:10
Local Optical Absorption SpectraofTransition
Metal
Dichalcogenide Monolayer by
Scanning Near-field Optical
Microscopy Measurements
J. Nozaki 1, S. Mori 1, Y. Miyata
1,2, Y. Maniwa 1 and K. Yanagi
1, 1 Tokyo Metropolitan Univ. and2 JST-PRESTO, Japan
12C-4, 5 Author's Interview:
11:55-12:05
Lobby (2F)

Room D (Special Conf. Room, 2F)
12D-4: Nanoimprint, Nanoprint
and Rising Lithography I
J. Taniguchi (Tokyo Univ. of Sci.)
A. Yokoo (NTT)
12D-4-1
9:00
2D or not 2D – the Challenge of
3D Topography (Invited)
H. Schift, Paul Scherrer Inst.,
Switzerland

12D-4-2
9:30
Resin
Concentration
Dependence of Residual Layer
Thickness in UV Reversal
Nanoimprinting
N. Sugano, M. Okada, Y.
Haruyama and S. Matsui, Univ.
of Hyogo, Japan
12D-4-3
9:50
Bubble-Free and High-Speed
UV Nanoimprint Lithography
Using Condensable Gas with
Very Low Global Warming
Potential
K. Suzuki, S.-W. Youn and H.
Hiroshima, AIST, Japan
12D-4-4
Withdrawn
10:10
A Black-photoresist Embedded
Photomask for Soft Contact
Lithography at Sub-Micrometer
Scale
H. Hsieh and Y.-C. Lee, Natl.
Cheng Kung Univ., Taiwan

12D-4, 5 Author's Interview:
11:45-11:55

Coffee BreakRoom A (203 and 204, 2F)
12A-5: Symposium C: Next
Generation Lab on a Chip II
S. Tadigadapa (Univ. of Tokyo)
H. Kotera (Kyoto Univ.)

Room B (202, 2F)
12B-5: Nanodevices II
T. Yanagida (Kyushu Univ.)
N. Banno (NEC)

12A-5-1
10:45
Microstructured
MeshesasPlatforms for Cell Culture andInductionofSelf-AssemblyMediated Organoid Formation(Invited)
O. Kennedy 1, O. Kurosawa 1, S.
Yamazaki 1, H. Oana 1, H. Kotera
2 and M. Washizu 1, 1 Univ. ofTokyo and 2 Kyoto Univ., Japan

12B-5-1
10:25
Nanoscale
Localized
Joule
HeatinginPhase-Change
Memory for Ultra-Low Operation
Current
Y. Yin, Gunma Univ., Japan

12A-5-2
11:15
On-chip Electrical Lysis andExtraction of Cytoplasmic RNA
and Genomic DNA from Single
Cells (Invited)
H. Shintaku 1,2, K. Kuriyama 2
and J.G. Santiago 2, 1 Kyoto
Univ., Japan and 2 Stanford Univ.,
USA

12B-5-2
10:45
Structural Property of AmorphousThin Ta2O5 Films Deposited byDifferent Methods and its Impact
on Their Resistive Switching
Characteristics
C. Mannequin 1, T. Tsuruoka 1, T.
Hasegawa 2 and M. Aono 1, 1
NIMS and 2 Waseda Univ.,Japan

Room C (201, 2F)
12C-5: Symposium B: Two
Dimensional Nanomaterials II
K. Maehashi (Tokyo Univ. ofAgric. and Technol. )D. Kondo (Fujitsu Labs.)
12C-5-1
10:45
Bandgap
EngineeringandSubstitutional
DopingofGraphene Nanoribbons (Invited)
R.R. Cloke 1, T. Marangoni 1,
G.D. Nguyen 1, T. Joshi 1, D.J.
Rizzo 1, C. Bronner 1, T. Cao 1,
S.G. Louise 1, M.F. Crommie 1,2
and F.R. Fischer 1,2, 1 Univ. of
California Berkeley and 2
Lawrence Berkeley Natl. Lab.,USA
12C-5-2
11:15
FormationofParticular
Graphene Structures through H2
Induced Anisotropic Etching
R. Papon, S. Sharma, S.M.
Shinde, A. Thangaraja, G. Kalita
and M. Tanemura, Nagoya Inst.
of Technol., Japan-3-

Room D (Special Conf. Room, 2F)
12D-5: Nanoimprint, Nanoprint
and Rising Lithography II
H. Schift (Paul Scherrer Inst.,
Switzerland)
H. Hiroshima (AIST)
12D-5-1
10:45
Fabrication of Reusable TiO2
Templates for Nanometer andMicrometer-scale
ProteinPatterning by Imprint Lithography
M. Moxey 1,2, A. Johnson 1, O.
El-Zubir 1, M. Cartron 1, S.S.
Dinachali 2, C.N. Hunter 1,
M.S.M. Saifullah 2, K.S.L. Chong
2 and G.J. Leggett 1, 1 Univ. of
Sheffield, UK and 2 A*STAR,
Singapore
12D-5-2
11:05
Development of under 100 nm
Resolution Mold and Silver Ink
Patterning Process
N. Ito 1, M. Abe 1, T. Kitada 1, Y.
Miyazawa 1, M. Ataka 2, T.
Kishiro 2 and S. Matsui 3, 1
Asahi Kasei, 2 Holon and 3 Univ.
of Hyogo, JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12A-5-3
11:45
On-Chip Direct Cytoplasmic
Transfer between Live Single
Cells (Invited)
K. Wada, RIKEN, Japan

Room A (203 and 204, 2F)
12A-6: Electron and Ion BeamTechnologies
H. Yamashita (NuflareTechnol.)J. Yanagisawa (Univ. of Shiga Pref.)12A-6-1
13:30
Multi-Beam SEM Technology forHigh Speed Imaging and DefectInspection (Invited)
T. Kemen, D. Zeidler and G.
Dellemann,
Carl
Zeiss
Microscopy, Germany

12B-5-3
11:05
High-Performance
InGaZnO
Thin-Film Transistor with a
HfO2/Lu2O3/HfO2 Stacked Gate
Dielectric
T.-M. Pan, C.-W. Wang, H.-X. Xie
and J.-L. Her, Chang Gung Univ.,
Taiwan12B-5-4
11:25
Reducing
Source/Drain
Resistance of α-IGZO Thin-Film
Transistors Using an n+-ZnO
Buffer Layer
C.H. Hung, S.-J. Wang, 2, C. Lin,
C.-H. Wu, Y.-H. Chen, P.-Y. Liu,
Y.-C. Tu and T.-H. Lin, Natl.
Cheng Kung Univ., Tainan
12B-4, 5 Author's Interview:
11:45-11:55
Room B (202, 2F)
12B-6: Nanofabrication II
T. Hasegawa (Waseda Univ.)
K. Tomioka (Hokkaido Univ.)
12B-6-1
13:30
Van der Waals Epitaxial GrowthofSemiconductor
Nanostructures (Invited)
Y.J. Hong, Sejong Univ., Korea

12A-6-2
14:00
EBM-9000 : Features andRequirements in Electron-Beam
Mask Writer for Product Mask
Fabrication of 16 nm Half-Pitch
Generation and Beyond (Invited)
H. Takekoshi, T. Kamikubo, S.
Yoshitake, K. Saito and M.
Suganuma,
NuFlareTechnologies, Japan
12A-6-3
14:30
Method of Improving Image
SharpnessforAnnularIllumination Scanning Electron
Microscopes
M. Enyama 1, K. Hamada 1, M.
Fukuda 2 and H. Kazumi 2, 1
Hitachi and 2 Hitachi HighTechnol., Japan

12B-6-2
14:00
Development of High-Precision
Digital Wet Etching Technique for
GaAs-Based
Nanostructure
Formation
R. Kuroda, M. Sato and S. Kasai,
Hokkaido Univ., Japan

12A-6-4
14:50
Simulation of Charging Process of
PMMA Film on Si Substrate underElectron Beam Irradiation
A. Fukuzawa, K. Terada and M.
Kotera, Osaka Inst. of Technol.,Japan
12A-6 Author's Interview:
15:10-15:20

12B-6-4
14:40
Formation and Characteristics of
BaTiO3 Nanoparticles in the
Pores of Mesoporous Silica Thin
Films
A. Kohno and T. Tajiri, Fukuoka
Univ., Japan
12B-6 Author's Interview:
15:00-15:10

12B-6-3
14:20
Oxidation of CuSn Alloy NanoTree and Application for Gas
Sensors
N. Kaneko 1, T. Shimizu 1, Y.
Tada 2 and S. Shingubara 1, 1
Kansai Univ. and 2 Muroran Inst.
of Technol., Japan

12C-5-3
11:35
Fabrication
andElectrical
Porperties of Unzipped SingleLayer Graphene Nanoribbon
H. Tanaka 1, P. Liu 1, T. Fujiwara
1, S. Kasai 2, X. Yin 2, T. Yamada
3, R. Negishi 4, Y. Kobayashi 4,
M. Fukumori 4 and T. Ogawa 4,
1 Kyushu Inst. of Technol., 2
Hokkaido Univ., 3 Chiba Univ.
and 4 Osaka Univ., Japan
12C-4, 5 Author's Interview:
11:55-12:05

12D-5-3
11:25
Nano-Hole and Dot Pattering on
Quartz Substrate by R-Θ EB
Lithography and Nanoimprinting
T. Watanabe, K. Taniguchi, K.
Suzuki, H. Iyama, S. Kishimoto,T. Sato and H. Kobayashi,
HOYA, Japan

Room C (201, 2F)
12C-6:
Inorganic
Nanomaterials II
T. Higuchi (Tokyo Univ. of Sci.)
T. Ohno (Tohoku Univ.)
12C-6-1
13:30
Redox Reactions and Metal Ion
Transport in Cu(Ag)/Ta2O5/Pt
Atomic Switch Structures
T. Tsuruoka 1, I. Valov 2,3, T.
Hasegawa 4, R. Waser 2,3 and
M. Aono 1, 1 NIMS, Japan, 2
Jülich Res. Ctr., 3 RWTH Aachen,
Germany and 4 Waseda Univ.,
Japan
12C-6-2
13:50
Ta2O5-Based Redox Memory
Formed by Neutral Beam
Oxidation
T. Ohno1,2 and S. Samukawa 1,
1 Tohoku Univ. and 2 JSTPRESTO, Japan

Room D (Special Conf. Room, 2F)
12D-6: NanoTool
K. Sugano (Kobe Univ.)
R. Kometani (Univ. of Tokyo)

12C-6-3
14:10
Ionic Conductivity Effect on
Response Speed of All-SolidStateElectric-Double-Layer
Transistor
T. Tsuchiya 1,2, M. Ochi 2, T.
Higuchi 2, K. Terabe 1 and M.
Aono 1, 1 NIMS and 2 Tokyo
Univ. of Sci., Japan
12C-6-4
14:30
Interface
StabilityofElectrode/Bi-contained Relaxor
Ferroelectric
Oxide
Stack
Structure for High Temperature
Operational Capacitor
T. Nagata, S. Kumaragurubaran,
Y. Tsunekawa, Y. Yamashita, S.
Ueda, K. Takahashi, S.-G. Ri, S.
Suzuki, S. Oh and T. Chikyow,
NIMS, Japan
12C-6-5
14:50
Backscattered Electron andMagnetic Force Microscopy
Analysesof
MnAs/InAs
Heterojunction Nanowires
K. Kabamoto, R. Kodaira, S.
Sakita and S. Hara, Hokkaido
Univ., Japan

12D-6-3
14:10
Visualizing Three-Dimensional
Hydration Structure at SolidLiquid Interfaces with Sub
Nanometer
ResolutionbyFrequency Modulation Atomic
Force Microscopy
K. Miyazawa 1, H. Asakawa 1
and T. Fukuma 1,2, 1 Kanazawa
Univ. and 2 JSTA, Japan
12D-6-4
14:30
Mapping of Local Electronic
Density of States of Silicene
Nanoribbons Using Scanning
Tunneling Microscope
O. Kubo, R. Omura, N.
Nakashima, M. Shigehara, R.
Kuga, H. Tabata, N. Mori and M.
Katayama, Osaka Univ., Japan-4-

12D-4, 5 Author's Interview:
11:45-11:55

12D-6-1
13:30
Filament Erasure in Cu/MoOx
ReRAM investigated by in-Situ
TEM
M. Arita, Y. Ohno, A. TsurumakiFukuchi and Y. Takahashi,
Hokkaido Univ., Japan

12D-6-2
13:50
Dynamic Patterning of Organic
Molecules in Aqueous Solutions
Using an Inverted ElectronBeam Lithography System
H. Miyazako, K. Ishihara, K.
Mabuchi and T. Hoshino, Univ. ofTokyo, Japan

12D-6-5
14:50
Influence of Focused-Ion-Beam
ProcessandAnnealing
Treatment on Resonance ofGraphene
NanomechanicalResonator
R. Kometani, K. Kosugi, K.
Tsushima, S. Chiashi, S.
Maruyama and E. Maeda, Univ.
of Tokyo, JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12C-6 Author's Interview:
15:10-15:20

12D-6-6
15:10
Influence of Vacuum Annealingon the Strength and Fracture
Mechanism of Micro andNanoscale FIB-fabricated Silicon
Structures
Y. Goshima 1, T. Fujii 2, S. Inoue
2 and T. Namazu 2, 1 Horiba and2 Univ. of Hyogo, Japan
12D-6 Author's Interview:
15:30-15:40

Lobby (2F)
Coffee Break
Lobby, 2F and 3F

12P-7: 16:00-18:00 POSTER SESSION I
Lobby, 2F

Electron and Ion Beam Technologies
Chairperson: J. Yamamoto (Hitachi)
12P-7-1
12P-7-2
To Oral Session
Solid Immersion Optics for Simulation of Charging Process
Surface Plasmon Excitation in a of PMMA film on Si Substrate
Transmission
Mode under Electron Beam Irradiation
Photoemission
Electron A. Fukuzawa, K. Terada and M.
Microscope
Kotera, Osaka Inst. of Technol.,
V.Viswanathan, A.S. Yusuf, N.R. Japan
Shami, H. Hao and D.S. Pickard,
Natl.
Univ.
of
Singapore,
Singapore
12P-7-5Fabrication and in-Situ EvaluationofCompletely-Flexible
MZ
Waveguide Structure Embedded
in PDMS Thin Film Using
Focused Proton Microbeam
R.K. Parajuli 1, R. Saruya 1, K.
Miura 1, W. Kada 1, S. Kawabata
1,3, Y, Matsubara 1, H. Kato 2, A.
Yokoyama 1,3, M. Koka 3, T.
Satoh 3, Y. Ishii 3, T. Kamiya 3, H.
Nishikawa 2 and O. Hanaizumi 1,
1 Gunma Univ., 2 Shibaura Inst. ofTechnol. and 3 JAEA, Japan

12P-7-3
Negative Tone 40 nm-Line and60
nm-Space
Pattern
Fabrication by Electron Beam
Lithography Using NEB-22
M. Okada and S. Matsui, Univ. of
Hyogo, Japan

12P-7-4
Complex System of MicrometerSized Material Modification and
In-SituElemental
andLuminescence Analysis Using
Proton Microbeam Probe
S. Kawabata 1,2, W. Kada 1, Y.
Matsubara 1, K. Miura 1, T.
Satoh 2, M. Koka 2, N. Yamada
2, T. Kamiya 2 and O. Hanaizumi
1, 1 Gunma Univ. and 2 JAEA,
Japan

12P-7-8
Ordering Analysis of in-Plane
Cylindrical
DomainsofPolystyrene-bPolydimethylsiloxane Formed by
Thermal Annealing
T. Yamaguchi and A. Fujiwara,NTT, Japan

12P-7-9Computational Study of a
Combining Process of BlockCopolymer Self-Assembly with
Electrohydrodynamic
Jet
Printing
S.-K. Kim, Hanyang Univ., Korea

12P-7-110L
Dependence of Charging ofInsulator Film by Electron Beam
Irradiation on the Bias-Voltage
Y. Handa, M. Toukai, T.
Kawamoto and M. Kotera, Osaka
Inst. of Technol., Japan

Resist and Directed Self-Assembly
Chairperson: K. Yoshimoto (Kyoto Univ.)
12P-7-6
12P-7-7
Nanohaiga: Creative Use of Investigation of the Micro-Phase
Visual Art and Haiku Poems for Separation Limit of PS-b-PMMA
Demonstration of Electron Resist Doped with Organic Acidand Direct Self-assembly Related Compounds for Sub-10nm Line
Density Multiplication
Materials and Processes
Y. Kawamonzen, N. Kihara, Y.
N. Panova, A. Gangnaik, T. Seino, H. Sato, Y. Kasahara, K.
Ghoshal, Y.M. Georgiev and J.D. Kobayashi, K. Kodera, H. Kanai,
Holmes, Univ. College Cork, H. Kubota, K. Miyagi, S.
Ireland
Minegishi, T. Tobana, M. Shiraishi
and T. Azuma, EIDEC, Japan
12P-7-10
Sub-20nm Contact Holes Using
Directed Self-Assembly of Block
Copolymers: Process Flow andElectrical Verification
P. Rincon-Delgadillo 1, B.T. Chan
1, J. Doise 1,2 and R. Gronheid 1,
1 imec and 2 Katholieke Univ.
Leuven, Belgium-5-MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
Lobby, 3F

Nanocarbons
Chairperson: M. Tanemura (Nagoya Inst. of Technol.)
12P-7-11
First-Principles Calculations for
Desolvation of Li(EC)4 at theGraphiteEdge
withHydrogen/Carbonylic
Terminations
T. Kawai 1,2, S. Okada 2 and M.
Otani 3, 1 NEC, 2 Univ. of
Tsukuba and 3 AIST, Japan

12P-7-15
Electronic Properties of CNT Thin
Films under an Electric Field
U. Ishiyama and S. Okada, Univ.
of Tsukuba, Japan

12P-7-12
DirectObservationofGraphitizationfor
GeIncorporated Carbon Nanofibers
by in Situ Transmission Electron
Microscopy
Y. Yaakob 1,2, M.Z.M. Yusop 1,3,
Y. Kuwataka 1, M.S. Rosmi 1,4,
S. Sharma 1, G. Kalita 1 and M.
Tanemura 1, 1 Nagoya Inst. ofTechnol., Japan, 2 Univ. Putra
Malaysia, 3 Univ. Teknologi
Malaysia and 4 Univ. Pendidikan
Sultan Idris, Malaysia
12P-7-16
High Quality Graphene on SiC
Formed by the Surface Structure
Control Technique
T. Aritsuki, T. Nakashima, K.
Kobayashi, Y. Ohno and M.
Nagase, Univ. of Tokushima.,Japan

12P-7-19
Hybrid Structure of Vertically
Aligned Li4Ti5O12 Nanowire andFreestanding Ultrathin Graphite
Film as an Anode for Flexible
Lithium Ion Batteries
S.D. Kim, K. Rana and J.-H. Ahn,
Yonsei Univ., Korea
12P-7-23
Resonance Control of Carbon
Nanotube Mechanical Resonatorby Electron Beam Induced
Electrostatic Attraction
M. Yasuda, K. Takei, T. Arie andS. Akita, Osaka Pref. Univ., Japan

12P-7-20
Transmission, Reflection, andAbsorption Spectroscopy ofGraphene Microribbons in the
Terahertz Region
S. Suzuki, M. Takamura and H.
Yamamoto, NTT, Japan

12P-7-27
Synthesis of WS2 Crystals on
CVD Grown Graphene and h-BN
Films
A. Thangaraja, S.M.Shinde, G.
Kalita and M. Tanemura, Nagoya
Inst. of Technol., Japan

12P-7-28
Top-Gated Graphene Field-EffectTransistors by Low-Temperature
Synthesized SiNx Insulator on
SiC Substrates
Y. Ohno 1, M. Nagase 1 and K.
Matsumoto 2, 1 Univ. ofTokushima. and 2 Osaka Univ.,
Japan
12P-7-114LFirst-principles
StudyofElectronic
StructuresofGraphene on Y2O3
T. Kaneko 1,2 and T. Ohno 1,2,3,
1 NIMS, 2 Materials Res.
Consortium for Energy EfficientElectronic Devices and 3 Univ. ofTokyo, Japan

12P-7-113L
The Role of Dangling Bonds at {1100} Step in Fabricating RibbonShaped (6 √ 3 × 6 √ 3) R30 º
Graphene Precursor Layer on 4HSiC (0001)
D. Dojima, Y. Kutsuma, K. Ashida
and T. Kaneko, Kwansei Gakuin
Univ., Japan

12P-7-24
Design of Novel Elemental
Semiconductors:
TwoDimensional Covalent Networksof Fused C36 Fullerenes
M. Maruyama 1, N.T. Cuong 2
and S. Okada 1, 1 Univ. of
Tsukuba and 2 NIMS, Japan

12P-7-13
The Densification Effect on
Carbon Nanotube Pillars Arrayfor Field Emission
K.-Y. Wang and H.-C. Cheng,
Natl. Chiao Tung Univ., Taiwan

12P-7-14
Super-StrongandUltraLightweight Carbon Nanotube
Spinning Threads from Carbon
Nanotube Forest towards LowCarbon Societies
Y. Hayashi 1, T. Iijima 1, D.
Suzuki 1, H. Kinoshita 1, T.
Tokunaga 2, S. Ichimura 1, Z. Lin
1, K.P. Selvam 1 and T.
Nishikawa 1, 1 Okayama Univ.
and 2 Nagoya Univ., Japan

12P-7-17
In situ TEM Observation of theGraphitization of Copper-Carbon
Composite
Nanoneedles
Induced by Joule Heating
M.S. Rosmi 1,2, Y. Yaakob 1,3,
S. Sharma 1, M. Zamri 4, G.
Kalita 1 and M. Tanemura 1, 1
Nagoya Inst. of Technol., Japan,
2 Univ. Pend. Sultan Idris2, 3
Univ. Putra Malaysia and 4 Univ.
Tech. Malaysia, Malaysia
12P-7-21
ComputerAided-Molecular
DesignofFunctionalized
Fullerenes and Graphenes:
Density Functional Theory (DFT)Study
H. Tachikawa and H. Kawabata,
Hokkaido Univ., Japan
12P-7-25
Effect of the Force Constant on
theElectrical-Mechanical
Response of Carbon Nanofiber Atomic Force Microcopy Probes
G Rius 1, M. Lorenzoni 2, K.
Taniyama 1, M. Tanemura 1 andF. Perez-Murano 2, 1 Nagoya
Inst. of Technol., Japan and 2
IMB-CNM-CSIC, Spain
12P-7-111L
Morphologyof MoS2on
Al2O3(0001) Substrate
H. Jippo, K. Hayashi, S. Sato and
M. Ohfuchi, Fujitsu Labs., Japan

12P-7-18
Geometric
andElectronic
Structures of One-Dimensionally
Polymerized
Coronene
Molecules
K. Narita and S. Okada, Univ. of
Tsukuba, Japan

12P-7-22
First-Principles Study on Bottomup Fabrication Process ofAtomically Precise Graphene
Nanoribbons
T. Kaneko 1, N. Tajima 1 and T.
Ohno 1,2, 1 NIMS and 2 Univ. ofTokyo, Japan
12P-7-26
Selective Diamond Etching by
Solid Solution Reaction of
Carbon to Nickel
K. Nakanishi, D. Miyata, N.
Tokuda and T. Inokuma,
Kanazawa Univ., Japan

12P-7-112L
Electrical Properties of MoS2
Transistors Doped with F4TCNQ
L. Jiang 1, N. Harada 1,2, S. Sato
1,2, and N. Yokoyama 1,2, 1
AIST and 2 Fujitsu Labs., Japan

12P-7-115L
Inducing Strain to Encapsulated
Graphene
H. Tomori 1,2, R. Hiraide 1, Y.
Ootuka 1, K. Watanabe 3, H.
Taniguchi 3 and A. Kanda 1, 1
Univ. of Tsukuba, 2 JST-PREST
and 3 NIMS, Japan

Nanodevices
Chairperson :T. Yanagida (Kyushu Univ.)
12P-7-29
12P-7-30
On the Indium Mole Fraction The Effect of Dual-Spacer
Distribution of InGaP/InGaAs Dielectrics
on
Low-Power
Pseudomophic Triple Doping- Performance of Sub-10 nm
channel Field-Effect Transistors
Tunneling Field-Effect Transistor
Y.-T. Chao and J.-H. Tsai, Natl. Y.J. Yoon 1, J.H. Seo 1, S. Cho 2,
Kaohsiung Normal Univ., Taiwan
H.-I. Kwon 3, J.-H. Lee 1 and I.M.
Kang 1, 1 Kyungpook Natl. Univ.
and 2 Gachon Univ. and 3
Chung-Aug Univ., Korea

12P-7-31
Fabrication of Triple-Dot SingleElectron Transistor and its
Turnstile Operation
M. Jo 1, T. Uchida 1, A.
Tsurumaki-Fukuchi 1, M. Arita 1,
A. Fujiwara 2, Y. Ono 3, K.
Nishiguchi 2, H. Inokawa 4 and
Y. Takahashi 1, 1 Hokkaido Univ.,
2 NTT, 3 Univ. of Toyama and 4
Shizuoka Univ., Japan-6-

12P-7-32
Accurate Quantitative Analysis of
Top Gate Effect of Triple-Gate
FinFET Using 3D Device
Simulation
T. Tsutsumi, T. Nakamura, S.
Fukuoka and N. Yokoyama, Meiji
Univ., JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12P-7-33
Drain Doping Dependence on
Switching Characteristics ofTunnel Field-Effect Transistor(TFET) Inverters
D.W. Kwon, J.H. Kim, E. Park, J.
Lee, T. Park, R. Lee, S. Kim and
B.-G. Park, Seoul Natl. Univ.,
Korea
12P-7-37
Thin Film Growth of (110)
RutileTiO2 on (100) Ge Substrateby Pulsed Laser Deposition
Y. Suzuki 1,2, T. Nagata 2,3, Y.
Yamashita 2, T. Nabatame 2, A.
Ogura 1 and T. Chikyow 2, 1 Meiji
Univ., 2 NIMS and 3 JSTPRESTO, Japan

12P-7-34
Synaptic Device and CMOS
Neuron Circuit Using Floating
Body MOSFET with Spike
Timing-Dependent Plasticity
M.-W. Kwon, J. Park, H. Kim and
B.-G. Park, Seoul Natl. Univ.,
Korea

12P-7-116L
Reduction Method of Gate-toDrain Capacitance by Oxide
Spacer Formation in Tunnel FieldEffect Transistor (TFET) with
Elevated Drain
D.W. Kwon, J.H. Kim, E. Park, J.
Lee, T. Park, R. Lee, S. Kim, andB.-G. Park, Seoul Natl. Univ.,
Korera12P-7-117L
Effects of Pillar Thickness on
DC/AC Characteristics of Tunnel
Field-Effect Transistor (TFET)
with Vertical Structures
D.W. Kwon, J.H. Kim, E. Park, J.
Lee, T. Park, R. Lee, S. Kim, andB.-G. Park, Seoul Natl. Univ.,
Korera12P-7-38
Study on the Super-Linear Onset
ofTunneling
Field-EffectTransistors
J.H. Kim, D.W. Kwon, J. Lee, E.
Park, T.-H. Park and B.-G. Park,
Seoul Natl. Univ., Korea

12P-7-35
AnalysisonTemperature
Dependent Current MechanismofTunneling
Field-EffectTransistors
J. Lee, H.W. Kim, D.W. Kwon,
J.H. Kim, E. Park, T. Park, S.
Kim, R. Lee, J.-H. Lee and B.-G.
Park, Seoul Natl. Univ., Korea
12P-7-39
Theoretical
FrameworktoRealize Terahertz Emitters by
Considering Realistic Boundary
Conditions for Strained Silicon
Resonant
Plasma-Wave
Transistors
J.Y. Park, S.-H. Kim and K.R.
Kim, Ulsan Natl. Inst. of Sci. andTechnol., Korea
12P-7-118L
In Situ Transmission Electron
Microscopy of Single-Particle
Junctions Assembled Using
CarbonNanocapsules
Encapsulating
Lanthanum
CarbideM. Tedura and T. Kizuka, Univ. of
Tsukuba, Japan

12P-7-36 Withdrawn
Atmospheric Pressure Gas
Ionization
Sensor
with
Horizontal-Aligned
CNTElectrodes on Flexible Substrate
K.-Y. Wang and H.-C. Cheng,
Natl. Chiao Tung Univ., Taiwan

12P-7-44
FabricationofHigh
Transmittance SiO2 Nanotexture
with
OptimalSpin-coating
MethodC.-C. Hsu 1, C.-T. Meng 1, C.-C.
Cheng 1, C.-C. Wu 2 and C.-L.
Dai 3, 1 Yuan Ze Univ., 2
Tamkang Univ. and 3 Natl.
Chung Hsing Univ., Taiwan
12P-7-48
Hierarchical and Broadband
Light Harvesting Structures for cSi Solar Cells Fabricated byDifferent Etching Process
M.-L. Lee 1, S.-H. Lin 2, C.-H.
Hsu 1 and C.-H. Kuan 1, 1 Natl.
Taiwan Univ. and 2 Tung Hai
Univ., Taiwan

12P-7-40
New Analysis of 6T-SRAM and
its Extensibility to Multi-Bit SRAM
Based on Negative Differential
ResistanceandTransconductance
Characteristics
S. Shin and K.R. Kim, Ulsan Natl.
Inst. of Sci. and Technol., Korea
12P-7-129L
High-Resolution Transmission
Electron Microscopy of Melting
Action of Tantalum Nanocontacts
T. Kizuka, Y. Suzuki, M. Tedura,
and S. Murata, Univ. of Tsukuba,
Japan

Nanofabrication
Chairperson: H. Tanaka (Kyushu Inst. of Technol.)
12P-7-41 Withdrawn
Growth and Properties of
Pyroelectric Nano-crystals
S. Berger, Technion-Israel inst. ofTechnol., Israel

12P-7-42
EDX Analysis of Si Sidewall
Surface Etched by Deep-RIE
ProcessA. Matsutani, M. Sato, K.
Nishioka and D. Shoji, Tokyo Inst.
of Technol., Japan

12P-7-43
One-Step
FabricationofNanostructure-Covered
Microstructures Using Selective
Aluminum Anodization Based on
Non-Uniform Electric Field
Y.M. Park, E.D. Han, B.H. Kim
and Y.H. Seo, Kangwon Natl.
Univ., Korea

12P-7-45
Origin of Preferential Diffusion of
Ni along Si/SiO2 Interface in Si
Nanowire
S. Hashimoto 1, K. Takei 1, J. Sun
1, S. Asada 1, X. Zhang 1, T. Xu
1, T. Usuda 1, M. Tomita 1,2,3, R.
Imai 3, A. Ogura 3, T. Matsukawa
4, M. Masahara 4 and T.
Watanabe 1, 1 Waseda Univ., 2
JSPS, 3 Meiji Univ. and 4 AIST,Japan
12P-7-49
Fabrication of Micro-Materials
Array Using Buried Structure byElectromigration
Y. Kimura and M. Saka, Tohoku
Univ., Japan

12P-7-46
Electrostatic Assembly of HOPAEs Capped TiO2 Nanoparticles on Cotton Fabric
S.J. Xu 1, F. Zhang 2, S.Y. Chen
3, J. C. Song 1, H. Morikawa 1,
Y.Y. Chen 3 and H. Lin 3, 1
Shinshu Univ., Japan, 2 Shazhou
Inst. of Technol. and 3 Soochow
Univ., China

12P-7-47
Self-Formation of Asymmetric
Microporous Polysulfone Hollow
Fiber Using a Single Spinneretand Reduction of PhaseInversion Speed
C.S. Jang, H.J. Kim, Y.H. Lee,
B.H. Kim and Y.H. Seo,
Kangwon Natl. Univ., Korea

12P-7-50
Depth Effect of Randomly
Distributed
NanoholesonSpecular Structural Colors
W.K. Jang, Y.M. Park, D.H. Min,
B.H. Kim and Y.H. Seo, Kangwon
Natl. Univ., Korea

12P-7-119L
Fabrication and Optical Propertyof Nanoparticle Using Anodic
Porous Alumina Membrane
K. Takase 1, T. Shimizu 2, K.
Sugawa 1, T. Aono 1, Y. Shirai 1,
T. Nishida 2 and S. Shingubara
2, 1 Nihon Univ. and 2 Kansai
Univ., Japan

12P-7-120L
SynthesizedandCharacterization of Perovskite
Sm-Doped
LaFeO3
Nanopowders Prepared by SolGel Method
A. Karaphun and E. Swatsitang,
Khon Kaen Univ., Thailand

12P-7-52
ElectricalandStructual
Properties of Pt/TiO2-δ/Pt Thin
Film Prepared by RF Magnetron
Sputtering Using Oxygen Radical
K. Kawamura 1, N. Suzuki 1, T.
Tsuchiya 1, M. Minohara 2, H.
Kumigashira 2 and T. Higuchi 1, 1
Tokyo Univ. of Sci. and 2 KEK,
Japan

12P-7-53
Fabrication and Characterizationof
TiO2/Water
Solid-Liquid
Heterojuction Solar Cell Basedon TiO2 Hollow Spheres
Constructed Three-Dimensional
Nanomaterial
W.-J. Lee, Y. Tseng, J.S. Lee andC.-R. Lin, Natl. Pingtung Univ.,
Taiwan12P-7-54
Withdrawn
Photoexcited Hole
Cooling
Dynamics
in
PbSe/CdSe
Core/Shell Quantum Dots
Y. Zhang 1, J. Chang 1, T. Izuishi
1, K. Ono 1, Y. Ogomi 2,4, S.
Hayase 2,4, K. Katayama 3, T.
Toyoda 1,4 and Q. Shen 1,4, 1
Univ.
ofElectroCommunications., 2 Kyushu Inst.
of Technol., 3 Chuo Univ. and 4
JST-CREST, Japan

Inorganic Nanomaterials
Chairperson: K. Kobayashi (NIMS)
12P-7-51
Photoluminescence and Local
Structure Analysis of Nd-Doped
TiO2 Thin Films with Al Co-Doping
Y. Yanagida 1, Y. Aizawa 1, S.
Komuro 2, T. Izumi 3 and X. Zhao
1, 1 Tokyo Univ. of Sci., 2 Toyo
Univ. and 3 JAEA, Japan-7-

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12P-7-55
Withdrawn
Low Temperature Growth High
Quality Germanium Epilayers on
Silicon Substrates Using Reduce
Pressure
Chemical
Vapor
Deposition
W.-C. Kuo, W.-C. Chen, H.-C.
Hsieh, J.-Y. Chang and C.-C. Lee,
Natl. Ctrl. Univ., Taiwan
12P-7-59
Withdrawn
Dependence of Substrate Crystal
Orientation
onAdsorption,
Ionization
Potential,
andPhotoinduced Electron Transfer
Dynamics of CdSe Quantum
Dots/TiO2 System
T. Toyoda 1,5, W. Yindeesuk 1, K.
Kamiyama 2, K. Katayama 3, S.
Hayase 4,5 and Q. Shen 1,5, 1
Univ. of Electro-Commun., 2
Bunkoukeiki, 3 Chuo Univ., 4
Kyushu Inst. of Technol. and 5
JST-CREST, Japan
12P-7-121L
RealizationofThin-FilmTransistors with Channel Regions
Formed by Sprayed n-type and ptype ZnO Nano Particle Layers
D. Itohara, T. Yoshida and Y.
Fujita, Shimane Univ., Japan

12P-7-56
PhysicalandElectrical
CharacteristicsofPb1.2(Zr0.53Ti0.47)O3 Thin-Films for
the Applications of Tunable
Energy Harvesting and Sensing
Devices
S.P. Bag, T.-M. Pan and J.-L. Her,
Chang Gung Univ., Taiwan
12P-7-60
Effect of Interface Passivation on
Photovoltaic Properties andCarrier Recombination of Sb2S3
Sensitized Solid Solar Cells
K. Yamazaki 1, K. Sato 1,2, T.
Toyoda 1,4, K. Katayama 2, Y.
Ogomi 3,4, S. Hayase 3,4 and Q.
Shen 1,4, 1 Univ. of ElectroCommun., 2 Chuo Univ., 3
Kyushu Inst. of Technol. and 4
JST-CREST, Japan

12P-7-57
Enhanced Oxidation of Si Using
Low-Temperature
Oxidation
Catalyst SrTi1-xMgxO3-α
L. Li, A. Ikeda and T. Asano,
Kyushu Univ., Japan

12P-7-58
Withdrawn
Hydrothermal Synthesis of Cubic
Hematites Using Dimaines
K.-W. Kim, S.-B. Bae, T.A.
Nguyen and S.-W. Lee, Gachon
Univ., Korea

12P-7-61
Control of Higher-Order Facet
Structures for Novel Electron
Emissive Surfaces with Negative
Electron Affinity (NEA) Nature
S. Tanaka 1, M. Hirao 1, K.
Matsuo 1, H. Iijima 1, T.
Shiokawa 2 and T. Meguro 1, 1
Tokyo Univ. of Sci. and 2 RIKEN,
Japan

12P-7-62
Effects of Metal Oxidation
Reactions to In-Ga-Zn-O Thin
Film Transistors Based Sol-Gel
Precursor at Low Temperature
S.-H. Kim, K.-W. Jo and W.-J.
Cho, Kwangwoon Univ., Korea

12P-7-122L
ElectricalandStructural
Characterization of AnodicallyEtched GaAs Nanowires toWards Functional Electronic
DevicesS. Aikawa 1, K.Yamada 1, H.
Asoh 1, H. Hashimoto 1, Y.-I. Kim
2, E. Nishikawa 2 and S. Ono 1,
1 Kogakuin Univ. and 2 Tokyo
Univ. of Sci., Japan

12P-7-123L
FatigueStrengthofNanostructured Ni-Pd Film
Fabricated by LIGA Process
Y. Ichinosawa 1, Y. Saotome 2,
S. Kinuta 1 and S. Saito 3, 1
Optnics Precision, 2 Tohoku
Univ. and 3 Ashikaga Inst. ofTechnol., Japan

Organic Nanomaterials
Chairperson: S. Takami (Tohoku Univ.)
12P-7-63
12P-7-64
Fabrication of DBTTF-TCNQ Chemical Structures of Flexible
Complex Organic Crystals by Conducting
Polymer/metal
Vacuum Co-Deposition into Ionic Compounds Investigated with XLiquid Layer
Ray
Photoemission
K. Kuroishi 1, N. Ohashi 2, S. Spectroscopy
Maruyama 1 and Y. Matsumoto 1, D. Gerlach, J. Kawakita and T.
1 Tohoku Univ. and 2 AIST, Japan Chikyow, NIMS, Japan
12P-7-67
12P-7-68
Exceptionally
Low
Thermal Fabrication of Titania Pastes
Conductivity
ofPoly(3- Containing
BiologicalInkhexylthiophene) Single Nanowire Particles for Dye-Sensitized
L.-C. Li and K.W. Sun, Natl. Chiao Solar Cells
Tung Univ., Taiwan
T. Matsuura 1, S. Nagai 2, K.
Ogasawara 1, M. Sakai 3, K.
Minato 2 and T. Ueno 2, 1
Hokkaido Univ., 2 Hakodate Natl.
College of Technol. and 3
Fisheries Res. Agemcy, Japan
12P-7-71
12P-7-72
Withdrawn
Preparation and Characterization Chitosan and Chondroitin Sulfate
of Electropolymerized PEDOT Nanoparticles as Drug Delivery
Thin Films with Different Dopant for Fluorouracil
AnionsH.-C. Yang 1, H.-H. Chou 1 and
T. Deguchi, H. Tomeoku and M. S.-K. Ning 2, 1 Kun Shan Univ.
Takashiri, Tokai Univ., Japanand 2 Natl. Univ. of Kaohsiung,Taiwan12P-7-65
Synthesis and Characterizationof InP QDs Loaded Poly (Methyl
Methacrylate) Nanocomposites
Y. Kwon and J. Kim, Gachon
Univ., Korea

12P-7-66
Photoresponsive
andFluorescence Behaviors ofAzobenzene-Containing Block
Copolymers
C.-T. Lo and T.-L. Lee, Natl.
Cheng Kung Univ., Taiwan

12P-7-69
N-(4-tert-butylphenyl)-N-phenyl4-(9,10-diphenylanthracen-3yl)benzenamine for Blue Organic
Light-Emitting Diodes
Y.S. Kim 1, D.Y. Kim 1, S.E. Lee
2, Y.K. Kim 2 and S.S. Yoon 1, 1
Sungkyunkwan Univ. and 2
Hongik Univ., Korea

12P-7-70
Blue
Emitting
Materials
Containing
Dibenzo[b,d]furan
and Dibenzo[b,d]thiophene for
Organic Light-Emitting Diodes
H.W. Lee 1, S.J. Jeong 1, S.E.
Lee 2, Y.K. Kim 2 and S.S. Yoon
1, 1 Sungkyunkwan Univ. and 2
Hongik Univ., Korea

12P-7-124L
Molecular
DesignofFunctionalized
Nano-Carbon
Materials: Styrene-Functionalized
Graphene and C60
T. Fukuzumi, T. Iyama, H.
Kawabata and H. Tachikawa,
Hokkaido Univ., Japan

12P-7-125L
Computer Aided Molecular
Design of Electronic Device of
the Smallest Fullerene C20:
Interaction with Alkali ion andAtom, Solvation Process
H. Kawabata and H. Tachikawa,
Hokkaido Univ., Japan

12P-7-75
Effects of Dehydration andCritical Point Drying on Human
Chromosome Inner Structure
Observed by FIB/SEM
K. Kaneyoshi 1, S. Fukuda 1, A.
Dwiranti 1, J. Kato 2, Y. Otsuka 2,
H. Takata 1, S. Uchiyama 1, S.
Ogawa 1,3 and K. Fukui 1, 1
Osaka Univ., 2 Toray Res. Ctr.
and 3 AIST, Japan

12P-7-76
Silicon Membrane Reshaping
Technique Using Ga Ion
Implantation
T. Kozeki, S. Inoue and T.
Namazu, Univ. of Hyogo, Japan

NanoTool
Chairperson: R. Kometani (Univ. of Tokyo)
12P-7-73
12P-7-74
Interface Characterization of Ultrathin High-k/Metal Gate
Nanometer Scale CdS Buffer Multilayer Thin Films Thickness
Layer in Chalcopyrite Solar Cell
Evaluation by X-Ray Reflectivity
S.-H. Lin 1 and T.-H. Cheng 2, 1 andElectron
Microscopy
Tung Hai Univ. and 2 LiveStrong Technology
Optoelectronics, Taiwan
Y.-S. Chien 1, M.-C. Chen 2, S.Y. Lu 2, M.-L. Chen 2, B.-C. He 1,
G.-D. Chen 1, Y.-S. Su 1 and W.E. Fu 1, 1 ITRI and 2 TSMC,
Taiwan-8-

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12P-7-77
Programmable Polymerization of
DNA Origami Structures with
Double Crossovers Connection
Z. Ma 1, N. Yamashita 1, S. Park
1, K. Kawai 2, Y. Hirai 1, T.
Tsuchiya 1 and O. Tabata1, 1
Kyoto Univ. and 2 Osaka Univ.,
Japan

12P-7-78
Fabrication and Development ofMicro-magnetic
Tags
toTransport Biological Information
Y. Fujiwara 1, H. Ishikawa 1 andY. Yamanishi 1,2, 1 Shibaura Inst.
of Technol. and 2 JST-PRESTO,
Japan

12P-7-79
Biosensor Using Vanadium
Oxide Microthermistors
N. Inomata 1, L. Pan 1, Z. Wang
2, M. Kimura 2 and T. Ono 1, 1
Tohoku Univ. and 2 Tohoku
Gakuin Univ., Japan

12P-7-80
Photonic Absorber with NanoFins for Wavelength Detection
with Mechanical Resonator in
Near-infrared Region
E. Maeda and R. Kometani, Univ.
of Tokyo, Japan

12P-7-83
DevelopmentofSiliconcontaining Additives to Improve
Etching Durability for sub-50 nm
Patterning by UV Nanoimprint
Lithography
S. Ito 1, H. Sato 2, K. Watanuki
2, N. Nemoto 2 and M.
Nakagawa 1, 1 Tohoku Univ. and2 Nihon Univ., Japan
12P-7-87
Fabrication of Isolated Metal Dot
Pattern in Hole Features Using
Roll to Roll Machine and Silver
Ink
K. Ojima, N. Unno and J.
Taniguchi, Tokyo Univ. of Sci.,
Japan

12P-7-84
Evaluation of Mold Fixing
Methods
inUltrasonicNanoimprint Lithography Aimed
at Low Energy Loss
H. Mekaru 1 and T. Yano 2, 1
AIST and 2 Inst. of MolecularSci., Japan

12P-7-91
Resonance Laser Effect on
OpticalTrappingof
Cell
Adhesion Molecules on Neurons
C. Hosokawa 1, N. Takeda 1,2,
S.N. Kudoh 2 and T. Taguchi 3, 1
AIST, 2 Kwansei Gakuin Univ.
and 3 NICT, Japan
12P-7-95
Morphology
Imaging
Microdroplet Sorting System for
Identification and Acquisition of
Target Objects in Droplets
M. Girault 1, A. Hattori 1, H. Kim
1,2, S. Kawada 2, K. Tatsuura 1,
M. Odaka 1, H. Terazono 1,2 andK. Yasuda 1,2, 1 Kanagawa
Academy of Sci. and Technol.
and 2 Tokyo Med. and Dent.
Univ., Japan

12P-7-92
Embeddable
PolymericMicroneedles as a Sustained
Delivery System of Goserelin for
Prostate Cancer Treatment
Y.-Y. Chen, S.-Y. Chen and M.-C.
Chen, Natl. Cheng Kung Univ.,
Taiwan12P-7-96
Identification of Cell Clusters inCancerCell-implanted
Rat
Bloods Based on Measurementsof Imaging Biomarkers Using onChip
Multi-Imaging
Flow
Cytometry System
M. Odaka 1,2, H. Kim 1,2, M.
Girault 2, A. Hattori 2, H.
Terazono 1,2, K. Matsuura 2, F.
Nomura 1 and K. Yasuda 1,2, 1
Tokyo Med. and Dent. Univ. and2 Kanagawa Academy of Sci.
and Technol. Japan

Nanoimprint, Nanoprint and Rising Lithography
Chairperson: M. Okada (Univ. of Hyogo)
12P-7-81
12P-7-82
Analysis of Demolding Process of Anisotropic Oxygen Reactive Ion
Bi-Layer
Structure
Using Etching for Residual Layer
Nanoimprinting
Removal of UV Nanoimprinted
Q. Wang, X. Zheng and R. Zhang, 45-nm-Wide Line Patterns
Shandong Univ. of Sci. and T. Uehara, S. Kubo, N. Hiroshiba
Technol., China
and M. Nakagawa, Tohoku Univ.,
Japan
12P-7-85
Discharge of Droplets of Viscous
UV-Curable Resins by Screen
Printing for UV Nanoimprint
Lithography
A. Tanabe 1, T. Uehara 1, K.
Nagase 2, H. Ikedo 2, N.
Hiroshiba 1 and M. Nakagawa 1,
1 Tohoku Univ. and 2 Mino Group,Japan

12P-7-86
New Organic Photo-Curable SoftNIL Resist ''mr-NIL210'' forIndustrial Mass Fabrication Using''UV-PDMS'' Stamps
M. Messerschmidt 1, A. Greer 2,
F. Schlachter 3, J. Barnett 3,
M.W. Thesen 1, N. Gadegaard 2
and G. Grütznera, 1 micro resist
technol., Germany, 2 Univ. of
Glasgow, UK and 3 AMO,
Germany

12P-7-88
Impact of Molecular Weight onLine Edge Roughness in
Nanoimprint Lithography by
Molecular Dynamics Study
N. Iwata, M. Yasuda, H. Kawata
and Y. Hirai, Osaka Pref. Univ.,Japan

BioMEMS, Lab on a Chip
Chairperson: Y. Murakami (Toyohashi Univ. of Technol.)
12P-7-89
12P-7-90
Plasmon-Enhanced
Optical High-Speed Microfluidic RTTrapping of Nanoparticles on a qPCR
Plasmonic Chip
H. Nagai, M. Takashima, N.
K. Miyauchi 1,2, K. Tawa 1,2, S.N. Naruishi and S. Furutani, AIST,
Kudoh 2, T. Taguchi 3, C. Japan
Hosokawa 1,2, 1 AIST, 2 Kwansei
Gakuin Univ. and 3 NICT, Japan
12P-7-93
12P-7-94
DNA Aptamer-based Label-free Identification of Normal-Cancer
Protein Sensing Using Extended Cells by the Difference in theirGate Field-Effect Transistors
Adhesionon
Organosilane
T. Goda, A. Matsumoto and Y. Monolayer
Templates:aMiyahara, Tokyo Med. and Dent. Feasibility Study
Univ., Japan
Y. Takeuchi 1, R. Sakamoto 1, H.
Wakabayashi 1, H. Yamamoto 2,
Y. Sato 3 and T. Tanii 1, 1
Waseda Univ., 2 Tohoku Univ.
and 3 Japanese Red Cross
College of Nursing, Japan
12P-7-97
High Throughput Monodisperse
Water-in-oil Droplets Formation
for in Vitro Compartmentalization
Using
Electrostatic
InkjetTechnology
B. Sharma, Y. Takamura, T.
Shimoda and M. Biyani, JAIST,Japan

12P-7-98
Sensitivity Enhancement ofElectrical
Impedance
Immunosensor by Deposition of
Nanoparticle on InterdigitatedElectrode
A.K. Yagati, J. Park and S. Cho,
Gachon Univ., Korea

12P-7-126L
Bright Field/Fluorescent Dual
Imaging Cell Sorter System for
Precise Purification of Circulating
Tumor Cells
H. Kim 1,2, M. Odaka 1,2, M.
Girault 1, A. Hattori 1, H.
Terazono 1,2, K. Yasuda 1,2, 1
Kanagawa Academy of Sci. andTechnol. and 2 Tokyo Med. Dent.
Univ., Japan

Microsystem Technology and MEMS
Chairperson: T. Tsuchiya (Kyoto Univ.)
12P-7-99
12P-7-100
Evaluation of Polymer-Based Highly Sensitive PVDF-Based
Candle-like
Microneedle Infrared Sensor and its WirelessElectrodesfor Measurement System
Electroencephalogram
H. Choi and K. Lee, Ajou Univ.,
Measurement from the Hairy Part
Korea
of the Scalp
M. Arai 1, Y. Kudo 1 and N. Miki
1,2, 1 Keio Univ. and 2 JSTPRESTO, Japan

12P-7-101
Metachronal Wave of Artificial
Cilia Array Actuated by Applied
Magnetic Field
R. Marume, F. Tsumori, A. Saijo,
K. Kudo, T. Osada and H. Miura,
Kyushu Univ., Japan-9-

12P-7-102
Effect of Temperature and Scaleon Plastic Deformation of Single
Crystal SI
K. Ueno and T. Ando,
Ritsumeikan Univ., JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12P-7-103
Improvement of a Nonthermal
Atmospheric-Pressure PlasmaJet Nozzle
H.J. Bae, T.J. Kim and S.S. Yang,
Ajou Univ., Korea

12P-7-104
Scan-Projection
Lithography
onto Overall Circumferences of
Small-Diameter Pipes
T. Horiuchi, T. Furuhata and H.
Muro, Tokyo Denki Univ., Japan

12P-7-107
Evaluation on 60 MHz SingleCrystal Silicon Pn Diode Vibration
Sensors
K. Baba, H. Tanigawa, T. Nishino,
T. Furutsuka and K. Suzuki,
Ritsumeikan Univ., Japan

12P-7-108
Direct Fabrication of MicroTemperature
SensorUsing
Femtosecond Laser Reduction
Patterning
M. Mizoshiri, Y. Ito, S. Arakane, J.
Sakurai and S. Hata, Nagoya
Univ., Japan

12P-7-105
Investigationon
Metal
Contamination Generated by a
TSV Reveal Process Using
Direct Si/Cu Grinding and
Residual Metal Removal
N. Watanabe 1, M. Aoyagi 1, D.
Katagawa 2, T. Bandoh 3, T.
Mitsui 3 and E. Yamamoto 3, 1
AIST, 2 Apprecia Technol. and 3
Okamoto Machine Tool Works,
Japan
12P-7-109
Atmospheric
Vapor
Phase
Deposition of Nanometer-Thick
Anti-stiction
Coatings
ofFluoropolymer
for
SiliconSurfaceS. Itoh 1, K. Takahashi 2, H.
Morita 1, K. Fukuzawa 1 and H.
Zhang 1, 1 Nagoya Univ. and 2
Toyohashi Univ. of Technol.,Japan

12P-7-128L
Bonding Dynamics of Compliant
Micro-Bump During Ultrasonic
Bonding Investigated by Using Si
Strain Gauge
K. Iwanabe 1,2, K. Nakadozono 1,
Y. Senda 1 and T. Asano1,2, 1
Kyushu Univ. and 2 JST-CREST,Japan
ANA Crowne Plaza Toyama (Room Ohtori, 3F)
18:20-20:20

Banquet- 10 -

12P-7-106
Development of 3D Printing
System for Magnetic Elastomer
with Control of Magnetic
Anisotropy in the Structure
H. Kawanishi 1, F. Tsumori 2, K.
Kudo 2, T. Osada 2 and H. Miura2, Kyushu Univ., Japan

12P-7-127L
Fabrication of Metal-InsulatorMetal Sub-Micron Gratings byHigh Aspect Ratio Nanoimprint
M. Mitsudome 1, H. Honma 1,2,
S. Itoh 3, M. Ishida 1, K. Sawada
1 and K. Takahashi 1, 1
Toyohashi Univ. of Technol., 2
JSPS, 3 Nagoya Univ., JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan

Friday, November 13
Room A (203 and 204, 2F)
13A-8: Symposium A: Symp.
on "Big Data" for Advanced
Patterning II
A. Yamaguchi (Hitachi)
H. Yamashita (NuflareTechnol.)
13A-8-1
9:00
Holistic Lithography: a Data
Driven Framework for Advanced
Patterning Optimization (Invited)
S. Hunsche and Y. Zou,
ASML/Brion Technologies, USA
13A-8-2
9:30
Litho Turnkey Solution with Smart
Data Management (Invited)
T. Matsuyama, H. Aoyama, S.
Kudo, H. Kono, A. Sugiyama, P.
Seemoon and K. Masaki, Nikon,
Japan

Room A (203 and 204, 2F)
13A-9: Symposium A: Symp.
on "Big Data" for Advanced
Patterning III
T. Sato (Toshiba)
T. Azuma (EIDEC)
13A-9-1
10:15
Advanced Manufacturing Insight :A Framework for Big Data
Analytics
inSemiconductor
Manufacturing (Invited)
B.E. Stine, R. Burch, K.
Subramanian and L. Zhu, PDF
Solutions, USA
13A-9-2
10:45
Small Number, Big Data –Patterning Challenges for Nano
Scale (Invited)
K. Nawa, Tokyo Electron, Japan

Room B (202, 2F)
13B-8: Nanofabrication III
S. Shingubara (Kansai Univ.)
R. Hasunuma (Tsukuba Univ.)
13B-8-1
9:00
Si-Based Light Trapping NanoStructuresforDeviceApplications (Invited)
J. Xu, Nanjing Univ., China

Room C (201, 2F)
13C-8:
Nanocarbon
Application I
K. Yanagi (Tokyo Metropolitan
Univ.)
S. Chiashi (Univ. of Tokyo)
13C-8-1
9:00
Wearable Electronics Using
Carbon Hybrid Nanostructures(Invited)
J.-U. Park, UNIST, Korea

13B-8-2
9:30
Synthesis of Ge-core/Si-shell
Nanowires with Conformal Shell
Thickness Deposited after Au
RemovalM. Simanullang, G.B.M. Wisna,
T. Noguchi, K. Usami and S.
Oda., Tokyo Inst. of Technol.,Japan
13B-8-3
9:50
Switching and Magnetoresistance
Characteristics Observed in the
ReRAM
Devicewith
Ferromagnetic Electrodes
H. Yoshida, D. Itou, T. Shimizu, T.
Ito and S. Shingubara, Kansai
Univ., Japan
13B-8,9 Author's Interview:
11:45-11:55

13C-8-2
9:30
Photovoltaic Performance of
Perovskite Solar Cells Using
Carbon Nanotubes/Graphene
Oxide Layer
F. Wang 1, M. Endo 1, S. Mouri
1, Y. Miyauchi 1, Y. Ohno 2, A.
Wakamiya 1, Y. Murata 1 and K.
Matsuda 1, 1 Kyoto Univ. and 2
Nagoya Univ., Japan
13C-8-3
9:50
Carbon Nanotube MechanicalResonator
ControlledbyGraphene Induced Van-derWaals Interaction
A. Nagataki 1,2, K. Takei 1, T.
Arie 1 and S. Akita 1, 1 Osaka
Pref. Univ. and 2 NIMS, Japan
13C-8-4
10:10
Electrical
DetectionofPolymerase Chain Reaction
Using Graphene Field-EffectTransistors
M. Okano 1, S. Norhayati 1, V.
Rajiv 1, T. Ono 1, Y. Kanai 1, Y.
Ohno 1,2, K. Maehashi 1,3, K.
Inoue 1, F. Takei 4, K. Nakatani 1
and K. Matsumoto 1, 1 Osaka
Univ., 2 Univ. of Tokushima., 3
Tokyo Univ. of Agric. andTechnol. and 4 Natl. Defense
Med. College, Japan
13C-8, 9 Author's Interview:
11:55-12:05
Lobby (2F)

Coffee BreakRoom B (202, 2F)
Room C (201, 2F)
13B-9: Nanofabrication IV
13C-9:
Nanocarbon
A. Kohno (Fukuoka Univ.)
Application II
S. Okada (Univ. of Tsukuba)
K. Takase (Nihon Univ.)
K. Yanagi (Tokyo Metropolitan
Univ.)
13B-9-1
13C-9-1
10:25
10:45
Formation of Artificial Two- Improving Composite Properties
Dimensional Electron Systems and Biosensors Sensitivity Using
Cost
Nanostructured
Using
Atom
Manipulation Low
Carbons (Invited)TechniqueP. Jagadale 1, F.R. Hernandez 2,
M. Nantoh and K. Ishibashi, D. Demarchi 1 and A. Tagliaferro
RIKEN, Japan1, 1 Politecnico Torino, Italy and2 Univ. of Houston, USA
13B-9-2
13C-9-2
10:45
11:15
Hydrogel-Encapsulated
Silica Polythiophene-Molecular-Basedwith
GrapheneCore combined with Chitosan Transistor
Chains as an Efficient Drug Nanogap Electrodes
T. Ikuta 1, S. Tamba 1, Y. Kanai
Delivery System
1, T. Ono 1, Y. Ohno 1,2, K.
S.B. Bae and S.W. Lee, Gachon Maehashi 1,3, K. Inoue 1, Y. Ie 1,
Univ., Korea
Y. Aso 1, K. Matsumoto 1, 1
Osaka Univ., 2 Univ. ofTokushima and 3 Tokyo Univ. ofAgric. and Technol., Japan- 11 -

Room D (Special Conf. Room, 2F)
13D-8:
Microsystem
Technology and MEMS I
T. Namazu (Univ. of Hyogo)
E. Iwase (Waseda Univ.)
13D-8-1
9:00
MEMS_BasedInformation
Communication
Technology(Invited)
N. Miki 1,2, 1 Keio Univ. and 2
JST-PRESTO, Japan
13D-8-2
9:30
Information Transfer
Using
Wearable Thin Electro Tactile
Displays with Micro Needle
Electrodes
M. Tezuka 1, N. Kitamura 1 and
N. Miki 1,2, 1 Keio Univ. and 2
JST-PRESTO, Japan
13D-8-3
9:50
Finger-Tip Size Quantitative
Real-time PCR Device for Early
Detection of Cancer
Y. Kimura, M. Ikeuchi and K.
Ikuta, Univ. of Tokyo, Japan
13D-8-4
10:10
Surface Fluorination of Sputterdeposited TiO2 Thin Films for
Accelerating
Responseof
Optically-Driven Capillary Pump
T. Kobayashi, H. Maeda and S.
Konishi, Ritsumeikan Univ.,
Japan

13D-8, 9 Author's Interview:
11:45-11:55

Room D (Special Conf. Room, 2F)
13D-9:
Microsystem
Technology and MEMS II
R. Takigawa (Kyushu Univ.)
M. Ikeuchi (Univ. of Tokyo)
13D-9-1
10:45
FIB-Induced-Damage Recovery
Mechanism of Silicon Nanowires
by Vacuum Annealing
T. Fujii 1,2, T. Kozeki 1, K. Sudoh
3, E. Miura-Fujiwara 1, S. Inoue
1 and T. Namazu 1, 1 Univ. of
Hyogo, 2 JSPS and 3 Osaka
Univ. Japan
13D-9-2
11:05
Thermoreflectance-BasedSpatially-Resolved
StressDistribution
Measurement
Technique for Single Crystal
Silicon Structures
S. Miyake 1, T. Kato 1, H.
Taguchi 1 and T. Namazu 2, 1
Kobelco Res. Inst. and 2 Univ. of
Hyogo, JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
13A-9-3
11:15''Big data'' in Semiconductor
Metrology and Inspection: Whyand How? (Invited)H.
Fukuda,
HitachiHightechnologies, Japan

Room A (203 and 204, 2F)
13A-10:
Advanced
Photolithography
J. Miyazaki (ASML)
T. Uchiyama (Toshiba)
13A-10-1
13:30
Extending EUV lithography toSub-8nm Resolution (Invited)
J.T. Neumann and R. Garreis,
Carl Zeiss SMT, Germany

13A-10-2
14:00
Observation Result of Actual
Phase Defects on an EUV Mask
Using Micro Coherent EUV
Scatterometry Microscope
H. Hashimoto 1, T. Harada 1, T.
Amano 2, H. Kinoshita 1 and T.
Watanabe 1, 1 Univ. of Hyogo and2 EIDEC, Japan
13A-10-3
14:20
Measurement Result of an EUV
Collector Mirror Using a Large
Reflectometer at NewSUBARU
H. Iguchi 1, H. Hashimoto 1, M.
Kuki 1, T. Harada 1, H. Kinoshita
1, T. Watanabe 1, Y.Y. Platonov 2,
M.D. Kriese 2 and J.R. Rodriguez
2, 1 Univ. of Hyogo, Japan and 2
Rigaku Innovative Technol., USA
13A-10 Author's Interview:
14:40-14:50

13B-9-3
11:05
Nanofabrication Technique forHigh Density Magnetic RAMs
T. Sugii, H. Noshiro, Y. Yamazaki,
C. Yoshida and Y. Iba, Fujitsu,
Japan

13C-9-3
11:35
Graphene-Based
Flexible
Capacitive Touch Panels andtheir Performance
M. Kang and J.-H. Ahn, Yonsei
Univ., Korea

13B-9-4
11:25
Fabrication
andElectrical
Properties
ofNanogap
Electrodes Using Semiconductor
Process
Y. Yoshimizu, Y. Tanaka, H.
Tomita and K. Asakawa, Toshiba,Japan
13B-8,9 Author's Interview:
11:45-11:55
Room B (202, 2F)
13B-10: Nanodevices III
T. Maemoto (Osaka Inst. ofTechnol.)
Y. Ishikawa (Nara Inst. of Sci. andTechnol.)
13B-10-1
Withdrawn
13:30
Improvement of Efficiency Droop
in Blue InGaN Light Emitting
Diode With p-InGaN/GaN SPS
Last Barrier and p-AlGaN/GaN
SPS EBL
P.K. Lin 1, C.K. Wang 1, Y.Z.
Chiou 1, S.P. Chang 2 and S.J.
Chang 2, 1 Southern Taiwan
Univ. of Sci. and Technol. and 2
Natl. Cheng Kung Univ., Taiwan
13B-10-2
13:50
Design of Dual Pass Color Filter
for
Multi-spectral
Imaging
Applications
M.G. Shin and Y.M. Song, Pusan
Natl. Univ., Korea

13C-8, 9 Author's Interview:
11:55-12:05

13B-10-3
14:10
InvestigationofSensorPerformance in Tunneling Field
Effect Transistor (TFET) as
Highly Sensitive and MultiSensing Biosensors
R. Lee, D.W. Kwon, S. Kim, D.H.
Kim and B.-G. Park, Seoul Nat.
Univ., Korea
13B-10-4
14:30
Cryogenic Charge Pumping
Using Silicon on Insulators
T. Watanabe 1, M. Hori 1, T.
Saruwatari 1, A. Fujiwara 2 and Y.
Ono 1, 1 Univ. of Toyama and 2
NTT, Japan

Room C (201, 2F)
13C-10:
Nanocarbon
Application III
K. Yanagi (Tokyo Metropolitan
Univ.)
S. Chiashi (Univ. of Tokyo)
13C-10-1
13:30
Effect of Metal Contact on
Transport
Properties
ofGraphene Field Effect Devices
Y. Ito 1, K. Katakura 1, H.
Sonoda 1, S. Higuchi 1, Y.
Ootuka 1, H. Tomori 1, 2 and A.
Kanda 1, 1 Univ. of Tsukuba and2 JST-PRESTO, Japan
13C-10-2
13:50
Electron-State Tuning of Bilayer
Graphene by Defects
K. Kishimoto and S. Okada, Univ.
of Tsukuba, Japan

13C-10-3
14:10
Position-Controlled Graphene
Growth Using Micropatterning on
Catalytic Copper Surface
Y. Mori 1, T. Ikuta 1, T. Ono 1, Y.
Kanai 1, Y. Ohno 1,2, K.
Maehashi 1,3, K. Inoue 1 and K.
Matsumoto 1, 1 Osaka Univ., 2
Univ. of Tokushima. and 3 Tokyo
Univ. of Agric. and Technol.,Japan
13C-10-4
14:30
Electric Double Layer LightEmitting Diodes of Monolayer
WSe2
T. Fujimoto 1, J. Pu 1, J.-K.
Huang 2, L.-J. Li 2, T. Sakanoue
1 and T. Takenobu 1, 1 Waseda
Univ, Japan and 2 KAUST, Saudi
Arabia13B-10 Author's Interview:
13C-10 Author's Interview:
14:50-15:00
14:50-15:00
Lobby (2F)
Coffee Break- 12 -

13D-9-3
11:25
A Stiffness Tunable Device
Encapsulating
Magnetorheological Fluids intoThin Flexible Polymer Structure
H. Ishizuka and N. Miki, Keio
Univ., Japan
13D-8, 9 Author's Interview:
11:45-11:55

Room D (Special Conf. Room, 2F)
13D-10:Microsystem
Technology and MEMS III
T. Tsuchiya (Kyoto Univ.)
S. Nagasawa (Shibaura Inst. ofTechnol.)
13D-10-1
13:30
DevelopmentofTwo
Dimensional Scanning MicroMirror Made by Magnetic
Polymer Composite
J. Suzuki 1, K. Terao 1, H. Takao
1, F. Shimokawa 1, F. Oohira 2,
T. Namazu 3 and T. Suzuki 4, 1
Kagawa Univ., 2 Open Univ. ofJapan, 3 Univ. of Hyogo and 4
Gunma Univ., Japan
13D-10-2
13:50
TheThree-Dimensional
Actuation of the MEMS Scannerwith Single Pair of Beams andSingle Driving System
Y. Oguchi, C. Iino and E. Iwase,
Waseda Univ., Japan
13D-10-3
14:10
First Demonstration of an X-Ray
Mirror Using Focused Ion Beam
M. Numazawa 1, Y. Ezoe 1, K.
Ishikawa 2, T. Ogawa 1, M. Sato1, K. Nakamura 1, K. Takeuchi 1,
M. Terada 1, T. Ohashi 1, K.
Mitsuda 3, R. Kelly 4 and K.
Murata 5, 1 Tokyo Metropolitan
Univ., 2 RIKEN, 3 JAXA, Japan,
4 FEI, USA and FEI Japan
Nanoport, Japan
13D-10-4 Withdrawn
14:30
Characterization of Transfer
Printed Ultrathin Piezoelectric
Strain Sensor
T. Yamashita 1,2, S. Takamatsu
1,2, H. Okada 1,2, T. Itoh 2,3 andT. Kobayashi 1,2, 1 AIST, 2
NMEMS
Technol.
Res.
Organization and 3 Univ. ofTokyo, Japan
13D-10 Author's Interview:
14:30-14:40

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
Lobby, 2F and 3F

13P-11: 15:20-17:20 POSTER SESSION I
Lobby, 2F

Advanced Photolithography
Chairperson: J. Miyazaki (ASML)
13P-11-1
Novel
3-Dimensional
Photolithography Using Coherent
Proximity Exposure
T. Tanaka, H. Kikuta, H. Kawata,
M. Yasuda, M. Sasago and Y.
Hirai, Osaka Pref. Univ., Japan

13P-11-2
Thermal Behavior Analysis ofMulti-Stack Extreme-Ultraviolet
Pellicle
S.-G. Lee, E.-S. Park, J.-H. Lee
and H.-K. Oh, Hanyang Univ.,
Korea

13P-11-3
Improvement of Bandwidth
Stability in ArF Excimer Laser for
Multiple-Patterning Immersion
Lithography
K. Ishida, T. Kumazaki, A.
Kurosu, H. Tsushima, S. Tanaka,
T. Ohta, T. Matsunaga and H.
Mizoguchi, Gigaphoton, Japan

13P-11-100L
Computational Study of Pattern
Formation in Extreme Ultra Violet
Lithography
M. Yasuda, A. Iwai, S. Hitomi, H.
Kawata and Y. Hirai, Osaka Pref.
Univ., Japan

Electron and Ion Beam Technologies
Chairperson: H. Yamamoto (Osaka Univ.)
13P-11-4
13P-11-5
13P-11-6
UV-Curable Hybrid Polymers for Pulse Radiolysis in Concentrated Development of in-Situ Outgas
the Manufacturing of Individually Poly(4-hydroxystyrene) Solution: Monitoring
Systemby
Designed
3D(Micro)optical Acid Generation Dynamics in Quadrupole Mass Spectrometry
EUV and Electron Beam During Heating and/or Electron
Elements
Chemically Amplified Resist
J.J. Klein 1, A. Schleunitz 1, M.M. K. Okamoto 1, T. Ishida 1, Irradiation to Resist
Russew 1, R. Houbertz 2 and G. H.Yamamoto 2, T. Kozawa 2, R. S. Takahashi, Y. Minami, M.
Grützner 1, 1 micro resist technol. Fujiyoshi 1 and K. Umegaki 1, 1 Kadoi, Y. Matsumoto and A.
and 2 Multiphoton Optics, Hokkaido Univ. and 2 Osaka Sekiguchi, Litho Tech Japan,
GermanyJapan
Univ., Japan
13P-11-102L
Radiation
Chemistryof
Fluorinated Compounds with 2Hydroxyhexafluoro-Isopropyl
Group :Reaction Mechanism ofExtreme Ultraviolet Resist
N. Nomura 1, K. Okamoto 1, H.
Yamamoto 2, T. Kozawa 2, R.
Fujiyoshi 1 and K. Umegaki 1, 1
Hokkaido Univ. and 2 Osaka
Univ., Japan
Lobby, 3F

13P-11-101L
Effect of Acid Generator
Concentration on Dissolution
Behavior of Chemically Amplified
Resist Used for Ionizing
Radiations
A. Konda 1, H. Yamamoto 1, S.
Yoshitake and T. Kozawa 1, 1
Osaka Univ. and 2 NuFlareTechnol., Japan

Nanocarbons
Chairperson: K. Hirahara (Osaka Univ.)
13P-11-7
Withdrawn
13P-11-8
Understanding
the Effect of Access Length on I-V
Nanoindentation Mechanisms of CharacteristicofGraphenea Fullerene Monolayer on Silicon Memory
Substrate
K. Lee, POSTECH, Korea
W.-J. Lee 1,2 and M.-S. Ho 2, and
1 Natl. Ctr. For High-Performance
Computing and 2 Natl. Chung
Hsing Univ., Taiwan
13P-11-11
13P-11-12
Electric Field Screening of Fabrication of Ni-P Alloy /Fullerene Cages: Energetics of a Graphene Composite Films by
Water Molecule Encapsulated in Electroless
PlatingandFullerenes
Evaluation of Their Heat
J. Sorimachi and S. Okada, Univ. Dissipation Characteristics
of Tsukuba, Japan
N. Noguchi 1, S. Arai 1, Y. Suwa
2, K. Kawamura 2, 1 Shinshu
Univ. and 2 Shinko ElectricIndustries, Japan
13P-11-15
Electrical Properties of Trimetallic
Nitride Endohedral Fullerene
Y3N@C80 Solid
K. Sezaimaru and Y. Sun, Kyushu
Inst. of Technol., Japan

13P-11-16
Theoretical Analyses on NH4
Adsorbed
Graphene
Nanoribbons for Gas Sensing
Material
N. Harada and S. Sato, FujitsuLabs., Japan

13P-11-9
Energetics of Edge Formation
Processes of Graphene
A. Yamanaka and S. Okada,
Univ. of Tsukuba, Japan

13P-11-13
Growth of Carbon Nanoflakes on
Glass Substrates by RF
Sputtering for Electron Field
Emission Application
W.-C. Shih 1, K.-Y. Lee 2 and C.H. Lai 2, 1 Tatung Univ. and 2
China Univ. of Sci. and Technol.,Taiwan13P-11-17
A Structural Investigation of theSpherical Carbon by theMethane Decomposition with
Oxidized Diamond-Supported
Copper-Nickel Catalysts
M. Shiraishi 1, R. Shiraishi 1, K.
Komatsu 1, H. Ota 1, K. ando 1,
K. Nakagawa 2, H. Gamo 3, M.
Eguchi 4, T. ando 5, T.
Katsumata 1 and M.N.-Gamo 1,
1 Toyo Univ., 2 Kansai Univ., 3
Toppan Printing and 4 Ibaraki
Univ. and 5 NIMS, Japan- 13 -

13P-11-10
Effect of Filler Particle Sizes onDielectric Properties of Carbon
NanotubeBaTiO3/Polyvinylidene Fluoride
Three-Phase Composites
K. Silakaew, W. Saijingwong, E.
Swatsitang and P. Thongbai,
Khon Kaen Univ., Thailand
13P-11-14
Boron and Nitrogen Co-Doped
Graphene
SynthesizedbyMicrowave-hydrothermal
Method for Metal-Free ElectroCatalyst
I.T. Kim, M.J. Song, Y.B. Kim and
M.W. Shin, Yonsei Univ., Korea

13P-11-18
EffectofElectrodeposition
Conditions on Morphology of Tin
Film Deposited on Cu/MWCNT
Composite Film
K. Matsunaga and S. Arai ,Shinshu Univ., JapanMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
13P-11-19
Properties of Single-Layer MoS2
Film Fabricated by Combinationof Sputtering Deposition andPost-Deposition
Sulfurization
Annealing Using (t-C4H9)2S2
S. Ishihara 1, Y. Hibino 1, N.
Sawamoto 1, K. Suda 1, T.
Ohashi 2, K. Matsuura 2, H.
Machida 3, M. Ishikawa 3, H.
Sudoh 3, H. Wakabayashi 2 andA. Ogura 1, 1 Meiji Univ., 2 Tokyo
Inst. of Technol. and 3 Gas-phase
Growth, Japan
13P-11-23
H2 Induced Anisotropic Etching ofChemical
Vapor
Deposited
Hexagonal Boron Nitride (hBN)S. Sharma, G. Kalita and M.
Tanemura, Nagoya Inst. ofTechnol., Japan
13P-11-104L
Electron
Emission
Using
Multilayered-Graphene/SiO2/Si
Heterodevice Driven with LowVoltage Supply in Low Vacuum
D. Yoshizumi 1,2, K. Nishiguchi 1,
Y. Sekine 1, K. Furukawa 1, A.
Fujiwara 1 and M. Nagase 2, 1
NTT and 2 Tokushima Univ.,Japan

13P-11-20
Thermoelectric Properties of
CVD-Grown Transition Metal
Dichalcogenide Monolayers
K. Kanahashi 1, J. Pu 1, N.T.
Cuoug 2, L.-J. Li 3, S. Okada 4,
H. Ohta 5 and T. Takenobu 1, 1
Waseda Univ., 2 NIMS, Japan, 3
KAUST, Saudi Arabia, 4 Univ. of
Tsukuba and 5 Hokkaido Univ.,Japan

13P-11-21
Characterizationof
X-Ray
ChargeNeutralizer
Using
Carbon-Nanotube Field Emitter
S. Okawaki, S. Abo, F. Wakaya,
H. Yamashita, M. Abe and M.
Takai, Osaka Univ., Japan

13P-11-22
Rayleigh
Scattering
Spectroscopy of Single Walled
CarbonNanotubes
under
Various Environment
T. Osawa, T. Okochi, Y.
Furukawa, S. Chiashi and S.
Maruyama, Univ. of Tokyo,
Japan

13P-11-24
Single-Walled Carbon Nanotube
Growth Using Pd Catalyst by
Alcohol Gas Source Method inHigh Vacuum
H. Kiribayashi, S. Ogawa, A.
Kozawa, T. Saida, S. Naritsuka
and T. Maruyama, Meijo Univ.,Japan
13P-11-105L
High Performance Self-Aligned
Graphene Transistors using
Contamination-Free Process
G.-H. Park, H. Fukidome, T.
Suemitsu, T. Otsuji and M.
Suemitsu, Tohoku Univ., Japan

13P-11-25
Effect of Copper Foil Annealing
Process on Large Graphene
Crystal Growth by AtmosphericPressure
Chemical
Vapor
Deposition (AP-CVD)
K.P. Sharma, S. Sharma, G.
Kalita and M. Tanemura, Nagoya
Inst. of Technol., Japan

13P-11-103L
Influence of Deformations ofCarbon Nanotubes on Carrier
Accumulation under an Electric
Field
A. Hasegawa and S. Okada,
Univ. of Tsukuba, Japan

13P-11-106L
ThermalConvective
Inclinometer Using Carbon
Nanotube Yarn
D.-W. Jung 1,3, Y.-H. Hwang 1,
D.G. Jung 2, B.M. Sung 2, S.J.
Bang 2, S.H. Kong 2 and G.S.
Lee 3, 1 Korea Inst. of Industrial
Technol., 2 Kyungpook Natl.
Univ., Korea and 3 Univ. of Texas
at Dallas, USA

13P-11-107L
Quantum Interference of 2DBand Raman Modes of Carbon
Nanotubes Observed by TipEnhanced Raman Spectroscopy
S. Chaunchaiyakul, T. Yano, K.
Khoklang, P. Krukowski, M. AkaiKasaya, A. Saito and Y.
Kuwahara, Osaka Univ., Japan

13P-11-28
Withdrawn
Investigation the Effect of Nitridebased LEDs with Different
Growing Temperature in the hole
Injection Layer
K.W. Chiang 1, C.K. Wang 1,
Y.Z. Chiou 1, S.W. Wang 2 and
S.J. Chang 2, 1 Southern Taiwan
Univ. of Sci. and Technol. and 2
Natl. Cheng Kung Univ., Taiwan
13P-11-32
Micro-fabricated Devices for
Investigating One-Dimensional
Thermoelectric Properties in Si
Nanowires
T.-S. Lee, Y.-J. Tseng, and S.-W.
Lee, Natl. Ctrl. Univ., Taiwan

13P-11-29
Gate Tunable Schottky Barriersin Few-layer Graphene/MoS2
Transistors
D. Qiu and E.K. Kim, Hanyang
Univ., Korea

Nanodevices
Chairperson: Y. Ishikawa (Nara Inst. of Sci. and Technol.)
13P-11-26
13P-11-27
The Study of Optical Cavity Optimization of Current Injection
Structure for High-Sensitivity for High-Power Light-Emitting
LTPS Lateral PIN Photo Detector Diode (LED) by Novel Contact
with 40 Nanometer Thick Structuring
Absorption Layer
S. Kim 1,2, S. Kim 1, S. Cho 3, G.
Y.-C. Wei, I.-C. Lee and H.-C. Kim 2 and B.-G. Park 1, 1 Seoul
Cheng, Natl. Chiao Tung Univ., Natl.
Univ.,
2
Samsung
TaiwanElectronics and 3 Gachon Univ.,
Korea
13P-11-30
13P-11-31
Withdrawn
Single TiO2 Nanotube Devices Hot Electroluminescence inUsing Ion and Electron Beam- Nanowire Devices
Assisted Deposition
A. Lugstein, S. Glassner, S. Kral
M. Lee 1, D. Cha 1, M.-W. Ha 2 and E. Bertagnolli, Technicaland J. Kim 1, 1 Univ. of Texas, Univ. of Vienna, Austria
USA and 2 Myongji Univ., Korea

13P-11-34
Structural
andElectrical
Characteristics of High-κ Yb2O3
Gate Dielectrics for InGaZnO
Thin-Film Transistors
T.-M. Pan, C.-H. Chen, H.-J.
Wang and J.-L. Her, Chang Gung
Univ., Taiwan

13P-11-35
Sub 10 ns Fast Switching andResistance Control in Lateral
GeTe-Based
Phase-Change
MemoryY. Yin, Y. Zhang, Y. Takehana, R.
Kobayashi, H. Zhang and S.
Hosaka, Gunma Univ., Japan

13P-11-108L Withdrawn
Self-Rectifying
Resistive
Switching Behavior Observed in
Silicon Nitride-Based Resistive
Switching Memory Using Low
Pressure
Chemical
Vapor
Deposition
H.-D. Kim 1, M. Yun 1, S. Kim 1,
S. Kim 2 and B.-G. Park 2, 1
Sejong Univ. and 2 Seoul Natl.
Univ., Korea

13P-11-109L Withdrawn
StableNonpolar
Resistive
Switching Characteristics of Fully
Transparent Resistive Switching
Memory Using Only ITO Films
H.-D. Kim 1, M. Yun 1, S. Kim 1,
S. Kim 2 and B.-G. Park 2, 1
Sejong Univ. and 2 Seoul
National Univ., Korea

13P-11-36 Withdrawn
Impact of Thickness andCompliance Current on Resistive
Switching Behavior of SiNxBased RRAM for 3D Vertical
Resistive
Random-Access
Memory Application
S. Kim 1, S. Jung 1, M.-H. Kim 1,
H.-D. Kim 2, S. Cho 3 and B.-G.
Park 1, 1 Seoul Natl. Univ., 2
Sejong Univ. and 3 Gachon
Univ., Korea
13P-11-110L Withdrawn
Controlling Tunnel Barrier in
Si3N4-Based RRAM Embedding
SiO2 for Low-Power and HighDensity
Cross-Point
Array
Applications
S. Kim 1, S. Jung 1, M.-H. Kim 1,
H.-D. Kim 2, S. Cho 3 and B.-G.
Park 1, 1 Seoul Natl. Univ., 2
Sejong Univ. and 3 Gachon
Univ., Korea- 14 -

13P-11-33
Withdrawn
The Performance Improvementof LaAlO3/ZrO2/IGZO-TFTs with
AP-PECVD by KrF Excimer
Laser Annealing
C.-H. Wu 1, B.-W. Huang 2, K.M. Chang 2 and S.-J. Wang 3, 1
Chung Hua Univ., 2 Natl. Chiao
Tung Univ. and 3 Natl. Cheng
Kung Univ., Taiwan
13P-11-37
Designof
Thermal-NoiseHarnessing
Single-Electron
Circuit for Efficient Signal
Propagation
R. Hirashima and T. Oya,Yokohama Natl. Univ., Japan

13P-11-111L
Negative Bias Temperature
Instability and Channel Hot
Carrier Characteristics underDifferent Gate Structure
S. Park 1,2, C. Lee 2, S.-H. Lee
1 and B.-G. Park 1, 1 Seoul Natl.
Univ.
and
2
Samsung
Electronics, Korea

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan

Nanofabrication
Chairperson: R. Hasunuma (Univ. of Tsukuba)
13P-11-38
13P-11-39
Mobility
A Novel Fabrication Method of Anomalousin
Ultra-LowMicroneedle
Masters
Using Improvement
Temperature
Polycrystal-lineMass-Transport-Limited Etching
M.
Chiaranairungroj,
W. Silicon Thin-Film Transistors on
Flexible Substrate after Laser
Luangveeraa, A. Pimpin and W. Lift-off Process
Srituravanich,Chulalongkorn Y.-C. Wei, I.-C. Lee and H.-C.
Univ., Thailand
Cheng, Natl. Chiao Tung Univ.,
Taiwan13P-11-42
13P-11-43
Nanocrystalline
Continuous
Synthesisof CaCu3Ti4O12
Monodisperse
Inorganic Powder Prepared by a Gel
MethodUsing
Nanoparticles by a Dry Process in Combustion
Glycineas
Fuel:
Preparation,
Open Air Using an AtmosphericCharacterization, and its Bulk
Plasma Jet and a Metal Wire
Non-Ohmic and Giant Dielectric
O. Shimizu and Y. Hakuta, AIST, PropertiesJapan
T. Nachaithong, E. Swatsitang
and P. Thongbai, Khon Kaen
Univ., Thailand
13P-11-46
13P-11-47
Ultra Shallow (<14 nm) p+/n Preparation of Al2O3 Thin Film at
Junction in Silicon Using Nano- Extremely Low Pressure by
Second Laser Thermal Annealing Using Liquid Precursor Delivery
S.M. Jung, C.J. Park, H.S. Jeong System
and M.W. Shin, Yonsei Univ., J.H. Lee and B.H. Choi, KITECH,
Korea
Korea

13P-11-112L
Growth Mechanism and Phonon
Confinement Effect in a Single
CuO Nanowire
P.-H. Shih and S.Y. Wu, Natl.
Dong Hwa Univ., Taiwan

13P-11-40
Flower-like Au Nanostructure
Electrodeposited on Graphene
Oxide-modified ITO Glass as aHighly Efficient SERS Substrate
T.-A. Nguyen and S.-W. Lee,
Gachon Univ., Korea

13P-11-41
Fabrication of Nanocone Arrays
Using Two Step Metal Assisted
Chemical Etching Method
N. Tanaka, T. Shimizu, T. Ito and
S. Shingubara, Kansai Univ.,Japan

13P-11-44
Patterningof
Sapphire
Substrates with Displacement
Talbot Lithography for LED
Fabrication
H.H. Solak, L. Wang, C. Dais and
F. Clube, Eulitha, Switzerland

13P-11-45
Withdrawn
InvestigationofRemovalMechanism of the Tungsten Thin
Film in CMP Process
T. Momozaki, M. Mizutani, H.
Ono, H. Sakurai and S. Nomura,
Hitachi, Japan

13P-11-48
Formation of Mn-Ge Nanodots
Induced by Remote Hydrogen
PlasmaY. Wen, K. Makihara, A. Ohta
and S. Miyazaki, Nagoya Univ.,Japan

13P-11-49
Na0.5Y0.5Cu3Ti4O12
Nanocrystalline Synthesized bya Urea Combustion Method:
Preparation, Characterization,and their High Dielectric
Permittivity
P. Saengwong 1, B. Putasaeng
2, E. Swatsitang 1, P. Thongbai 1
and S. Maensiri 3, 1 Khon Kaen
Univ., 2 Natl. Sci. and Technol.
Develop.
Agencyand3Suranaree Univ. of Technol.,Thailand

13P-11-52
First-Principles Simulation on
Seebeck
Coefficientin
Semiconducting Nanomaterials
K. Nakamura 1,2, 1 Kyoto Univ.,
Japan and 2 Egypt-Japan Univ.
of Sci. and Technol., Egypt

13P-11-53
Raman Mapping Investigation of
Semiconductor Nanowires
H. Rho 1, H. Kim 1 and J.D. Song2 , 1 Chonbuk Natl. Univ. and 2
KIST, Korea

13P-11-56
ElectricalandStructural
Properties
of
BaCe0.85Ru0.05Y0.10O3-δ Thin Film
Prepared by RF Magnetron
Sputtering
M. Ochi 1, N. Suzuki 1, T.
Suetsugu 1, S. Yamaguchi 1, M.
Minohara 2, H. Kumigashira 2
and T. Higuchi 1, 1 Tokyo Univ. ofSci. and 2 KEK, Japan
13P-11-60
Magneto-plasmonics
onPerpendicular Magnetic CoPt
Nanostructures Formed by
Surface Agglomerations of Ag
and AuH. Yamane 1, K. Takeda 2 andM. Kobayashi 2, 1 Akita
Industrial Technol. Ctr. and 2
Chiba Inst. of Technol., Japan

13P-11-57
Metal-Insulator Transition of VO2
Thin
Film
with
OxygenVacancies
T. Suetsugu 1, T. Tsuchiya 1, M.
Kobayashi 2, M. Minohara 2, K.
Horiba 2, H. Kumigashira 2 and
T. Higuchi 1, 1 Tokyo Univ. of Sci.
and 2 KEK, Japan

13P-11-113L
Silicon Window for Low-Price
Thermal Imaging System
B.M. Sung 1, S.H. Son 1, S.Y.
Kwon 1, S.Y. Kwon 1, W.I Jang 2
and S.H. Kong 1, 1 Kyungpook
Natl. Univ. and 2 ETRI, Korea

Inorganic Nanomaterials
Chairperson: K. Terabe (NIMS)
13P-11-50
Pure VO2(M) with Rod and StarLiked Morphologies Synthesized
by Controlling Hydrothermal
Pressure
Y.C. Lu 1, C.Y. Kuan 2 and M.H.
Hon 1, 1 Natl. Cheng Kung Univ.
and 2 Thintech Materials
Technol., Taiwan

13P-11-54
Facile Single-Step AmmonolysisofMicrocrystalline
Gallium
Phosphide
GaP
to
Nanocrystalline Powders of Widebandgap Semiconductor Gallium
Nitride GaN
J.F. Janik, M. Drygas and M.M.
Bucko, AGH Univ. of Sci. andTechnol., Poland
13P-11-58
Electronic Structure of α-Fe2O3
Thin Film with Lattice Distortion
Prepared by RF Magnetron
Sputtering
K. Kawamura 1, N. Suzuki 1, S.
Yamaguchi 1, M. Ochi 1, T.
Tsuchiya 1, M. Minohara 2, M.
Kobayashi 2, K. Horiba 2, H.
Kumigashira 2 and T. Higuchi 1 ,1 Tokyo Univ. of Sci. and 2 KEK,Japan

13P-11-51
Withdrawn
EffectofNanostructured
MorphologyonElectronic
StructuresofTiO2
Photoelectrodes: Inverse Opal
and Nanoparticulate Cases
T. Toyoda 1,4, W. Yindeesuk 1, T.
Okuno 1, M. Akimoto 1, K.
Kamiyama 2, S. Hayase 3,4 and
Q. Shen 1,4, 1 Univ. of ElectroCommu., 2 Bunkoukeiki, 3
Kyushu Inst. of Technol. and 4
JST-CREST, Japan
13P-11-55
Metal Organic FrameworksDerived
Co3O4/Carbon
Composites for Non-Aqueous
Lithium-Air Battery
M.J. Song, I.T. Kim, Y.B. Kim and
M.W. Shin, Yonsei Univ., Korea

13P-11-59
Structure,
Magnetic
andElectrochemical Properties of
Cu-Doped BiFeO3 Nanoparticles
Prepared by a Simple Solution
MethodJ. khajonrit and S. Maensiri,
Suranaree Univ. of Technol.,Thailand- 15 -

13P-11-61
Ni-doped
La0.5Sr0.5TiO3Nanofibers: Fabrication andIntrinsic Ferromagnetism
W.
Ponhan1,
V.
Amornkitbamrung 1 and S.
Maensiri 2, 1 Suranaree Univ. ofTechnol. and 2 Khon Kaen Univ.,
ThailandMNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
13P-11-114L
Hydrophobicity
C-Functional
Groups on TiO2 for Removing
Low-Concentration
Elemental
Mercury
C. Y. Tsai 1, Y.H. Tseng 2, C.W. Liu
1, T.H. Kuo 3, Y.T. Pan 4 and H.C.
His 1, 1 Natl. Taiwan Univ., 2
Taiwan Univ. of Sci. and Technol.,
3 Tungnan Univ. and 4 Natl. Taipei
Univ. of Technol., Taiwan

13P-11-115L
Exploring the Size Effect of Nickel
Dopingin
Zn-Ferrite
Nanoparticles
Y.-T. Tseng 1, O.A. Li 1,2, K.-Y.
Shih 1, C.-R. Lin 1, H.-M. Chung
1, K.-W. Wu 1, H.-Y. Chen 1, H.S. Hsu 1, J.-S. Lee 1, I.S.
Edelman 3, 1 Natl. Pingtung
Univ., 2 Siberian Federal Univ., 3
Kirensky Inst. of Physics, Taiwan

13P-11-116L
Luminescence
Propertyof
BaSiO3:Eu3+ Phosphor with
H3BO3 as Flux
K.-Y. Shih, C.-R. Lin, H.-M.
Chung, Y.-T. Tseng and T.-C.
Kuo, Natl. Pingtung Univ.,
Taiwan13P-11-117L
Novel Y Doped BiVO4 Thin Film
ElectrodesforEnhanced
Photoactivity of Rhodamine B
Degradation
Y. Zhang 1, Z. Yi 2, G. Wu 3 and
Q. Shen 1,4, 1 Univ. of ElectroCommun., Japan 2 Fujian Inst. ofRes. on the Structure of Matter,
China, 3 Nihon Univ. and 4 JSTCREST, Japan

13P-11-64
A Negative-Charged PlatinumSilicide Nanoparticle-Modified Si
Tip Apex for Electrostatic ForceMicroscopy
C.-T. Lin 1, Y.-W. Chen 2, J. Su
1, C.-T. Wu 1, C.-N. Hsiao 1, M.H. Shiao 1, M.-N. Chang 2, 1
Natl. Applied Res. Labs. and 2
Natl. Chung Hsing Univ., Taiwan
13P-11-68
Optical Assembling of LightAbsorbing Nanoparticles andMicroparticles
M. Miyai, Y. Yamamoto, Y.
Nishimura, S. Tokonami and T.
Iida, Osaka Pref. Univ., Japan

13P-11-65
Energy-Level Alignment andElectronic Coupling at SingleMolecule Junctions of PyridylAnchoring Group on Au, Pd, andPt
S.-T. Chuang, M.-J. Huang andC.-H. Chen, Natl. Taiwan Univ.,
Taiwan13P-11-69
Challenge to Control 5-nm-Sized
Dot Arrays with a Pitch of <10 nm
in a Long-Range Order along
EB-Drawn Guide Lines Using
PS-PDMS Self-assembly
H. Zhang, S. Hosaka and Y. Yin,
Gunma Univ., Japan

13P-11-72
Withdrawn
Tunable Optical-Strain Sensor
by High-Index-Contrast Gratingwith Nano-Imprint Lithography
J.-H. Huh, H.-J. Choi, Y.-H.
Seong, P. Jung, J. Jun, M.-S.
Byun, Y.-J. Yoo, C. Kim and H.
Lee, Korea Univ., Korea

13P-11-73
Study of the Durability ofAntisticking
LayeragainstRepeated
Ultra
VioletNanoimprinting
S. Iyoshi, M. Okada, Y.
Haruyama and S. Matsui, Univ.
of Hyogo, Japan

13P-11-76
Metallic Antireflection Structure
Made from Silver Ink Using
LiquidTransfer
Imprint
TechniqueT. Uchida, N. Unno and J.
Taniguchi, Tokyo Univ. of Sci.,
Japan

13P-11-77
Fast Hot Embossing Process forLarge Size Light Guide Plate
Fabrication
H.-C. Wang and F.-Y. Chang,
Taiwan Univ. of Sci. andTechnol., Taiwan

NanoTool
Chairperson: K. Sugano (Kobe Univ.)
13P-11-62
13P-11-63
Visualizationof
Hydration Direct Visualization of Proteins in
Structures at Aqueous Interface of Aqueous Solution by Frequency
SrTiO3(100) by 3D Force Mapping Modulation
AtomicForce
Method Based on FM-AFM
Microscopy
S. Hasegawa , K. Kobayashi and Z. Cui 1, M. Miyamoto 1, H.
H. Yamada, Kyoto Univ., Japan
Kominami 1, K. Kobayashi 1, Y.
Hirata 2 and H. Yamada 1, 1
Kyoto Univ. and 2 AIST, Japan
13P-11-66
13P-11-67
Gold Nanoparticle Synthesis Surface
Enhanced
Raman
Using High-Speed Pulsed Mixing Spectroscopy of Graphene by
Microfluidic Device
Gold Nanoparticles with Micro
K. Sugano, A. Maedomari, Y. Beads
Tanaka and Y. Isono, Kobe Univ., H. Matsumura, S. Yanagiya, H.
Japan
Kishikawa and N. Goto, Univ. ofTokushima., Japan
13P-11-118L
13P-11-119L
A Constrained Rigid Body Temporal
ControlofBrownian Dynamics Simulation Bacteriophage
T4
DNA
for On-Chip Size-Separation of Concentration on a Nanopore by
Cross-linked DNA Origami Tiles
Using Inverted-Electron Beam
S. Park 1, Z. Ma 1, N. Yamashita Lithography
1, K. Kawai 2, D.-N. Kim 3, Y. Hirai A. Hoshino and K. Mabuchi, Univ.
1, T. Tsuchiya 1 and O. Tabata 1, of Tokyo, Japan
1 Kyoto Univ., 2 Osaka Univ. and3 Seoul Natl. Univ., Korea

Nanoimprint, Nanoprint and Rising Lithography
Chairperson: M. Okada (Univ. of Hyogo)
13P-11-70
13P-11-71
Chlorine-Based
Inductively Computational
Studyon
Coupled Plasma Etching of GaAs Mechanism of Peeling Release
Using
Tripodal Paraffinic MethodinNanoimprint
Triptycene(TripC12)
asa Lithography
Nanoimprint Resist Mask
T. Tochino, F. Chalvin, T. Iida, M.
A. Matsutani 1, F. Ishiwari 1, Y. Yasuda, H. Kawata and Y. Hirai,
Shoji 1, T. Uehara 2, M. Osaka Pref. Univ., Japan
Nakagawa 2 and T. Fukushima 1,
1 Tokyo Inst. of Technol. and 2
Tohoku Univ., Japan
13P-11-74
Withdrawn
13P-11-75
ofMolecular
Fabrication of Anti-Reflection Evaluation
Glass with Sub-Wavelength Orientation of Photo-CrossLiquid
Crystalline
Structures based on Roll-to-Sheet Linkable
Polymer in 200 nm-Line andNanoimprinting
Space Pattern by Measuring
C.-H. Chuang, K.-C. Wang and P.- Diffraction Efficiency
H. Wang, Southern Taiwan Univ. M. Okada 1, Y. Taniguchi 1, Y.
of Sci. and Technol., Taiwan
Haruyama 1, H. Ono 2, N.
Kawatsuki 1 and S. Matsui 1, 1
Univ. of Hyogo and 2 Nagaoka
Univ. of Technol., Japan
13P-11-120L
13P-11-121L
Patterning of Different Substrate Sub-20 nm Lift-off Techniques
Materials with Thermoplastic without
ChargedParticle
Hardmask Resist SiPol
DamageUsing
ThermalD. Virganavicius, V.J. Cadarso, M. Scanning Probe Lithography
Bednarzik and H. Schift, Paul C. Rawlings 1, S. Bonanni 2, M.
Spieser 2, P. Mensch 1, S. Karg
Scherrer Inst., Switzerland
1, P. Paul 2, H. Wolf 1, U. Duerig
1, A. Knoll 1 and F. Holzner 2, 1
IBM Res.and 2 SwissLitho,
Switzerland- 16 -

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan

BioMEMS, Lab on a Chip
Chairperson: Y. Murakami (Toyohashi Univ. of Technol.)
13P-11-78
Withdrawn
13P-11-79
Needle-Free Insulin Delivery Immunoreaction-Period
Systems for Diabetic Patents: Independent
Microfluidic
PolymericMicrocubesfor Diagnosis Device for Detection of
Sustained Transdermal Delivery Prostate Specific Antigen
of Insulin
H.J. Kim, E.D. Han, Y.H. Seo and
M.H. Ling and M.-C. Chen, Natl. B.H. Kim, Kangwon Natl. Univ.,
Cheng Kung Univ., Taiwan
Korea
13P-11-82
Separation of Large DNA
Molecules by Size Exclusion
Chromatography Type Microchip
withon-Chip
Concentration
Structure
N. Azuma, S. Itoh, K. Fukuzawa
and H. Zhang, Nagoya Univ.,Japan
13P-11-86
Predictive Human Cardiotoxicity
Measurement Assay Using a
Lined-Up
ThousandCardiomyocyte Cell Network
A. Hattori 1, F. Nomura 2, H. Kim
1, H. Terazono 2, K. Matsuura 1,
M. Odaka 1, M. Girault 1 and K.
Yasuda 1,2, 1 Kanagawa
Academy of Sci. and Technol. and
2 Tokyo Med. and Dent. Univ.,Japan

13P-11-83
Laser-Scanning Photocatalytic
Lithography of Organosilane
Monolayers for Fabrication of
Artificial Neuronal Circuits
K. Sekine 1, H. Yamamoto 2, S.
Kono 1, S. Fujishiro 1, T. Ikeda 3,
A. Kuroda 3 and T. Tanii 1, 1
Waseda Univ., 2 Tohoku Univ.
and 3 Hiroshima Univ., Japan
13P-11-87
Direct Digital Manufacturing ofAutonomous
Centrifugal
Microfluidic Device
Y. Ukita 1, Y. Takamura 2, and Y.
Utsumi 3, 1 Univ. of Yamanashi, 2
JAIST and 3 Univ. of Hyogo,Japan

13P-11-80
Label-Free
Detectionof
Exosomes for Cancer Diagnosis
Using Optical Diffraction by
Nanostructures
T. Ajiri 1, T. Yasui 2, A. Ishida 1,
H. Tani 1, Y. Baba 2 and M.
Tokeshi 1,2, 1 Hokkaido Univ.
and 2 Nagoya Univ., Japan
13P-11-84
Two-Dimensional
Micropatterning of Cells using
Cell-Surface Specific binding of
Hetero-Bifunctional
DNA
Aptamers
H. Terazono, H. Kim, A. Hattori,
F. Nomura and K. Yasuda, Tokyo
Med. and Dent. Univ., Japan

13P-11-81
Matrix Effect on Mass Spectra of
Cytochrome C in Pulse-Heating
Ionization for on-Chip Mass
Spectrometry
X. Luo, K. Sugiyama and Y.
Takamura, JAIST, Japan

13P-11-90
Temperature Dependence of theElectrical Conductance in p-Type
3C-SiC Thin Films Transferredon Glass Substrates Using FIB
H.-P. Phan 1, T. Kozeki 2, T. Dinh
1, G. Ina 2, A. Qamar 1, T.
Namazu 2, N.-T. Nguyen 1 and
D.V. Dao 1, 1 Griffith Univ.,
Australia and 2 Univ. of Hyogo,Japan
13P-11-94
Fabrication of Thermoelectric
Generators with Anti-Reflection
Structures
Using
SelfAssembled Silica Microspheres
T. Kondou, M. Mizoshiri, M.
Mikami, Y. Itou, J. Sakurai and S.
Hata, Nagoya Univ., Japan
13P-11-98
20 MHz Pn-diode Silicon Ring
Resonator
within-PlaneVibration Mode
Y. Asahi, H. Tanigawa, T.
Nishino, T. Furutsuka and K.
Suzuki, Ritsumeikan Univ.,Japan
13P-11-124L
Parallel Tensile-Mode Fatigue
Testing of Silicon Microstructureswith Integrated Piezoresistive
Stain Sensors
A. Uesugi, Y. Hirai, T. Tsuchiya
and O. Tabata, Kyoto Univ.,Japan

13P-11-91
A Long-range Focal Length
Controllable Convex Micromirror
Actuated by Electromagnetic
Force
M.M. Hossain, W. Bin and S.H.
Kong, Kyungpook Natl. Univ.,
Korea

13P-11-85
Optical Control of Biomolecular
Recognition
with
Metallic
Nanoparticles
T. Iida, M. Tamura, Y. Nishimura
and S. Tokonami, Osaka Pref.
Univ., Japan

Microsystem Technology and MEMS
Chairperson: T. Namazu (Univ. of Hyogo)
13P-11-88
13P-11-89
Workload Assessment Aided by Shape, Size, and Porosity
Non-invasive and Unobtrusive ControlofPorous
SilicaMicro-fabricated Optical Sensors
Nanoparticles Using Atomized
C.C.C. Torres 1, K. Sampei 1, H. Heating Method
Riyogo 1, N. Miki 1,2, 1 Keio Univ. K. Kiyohara, K. Inoue, S. Inoueand 2 JST-PRESTO, Japanand T. Namazu, Univ. of Hyogo,Japan

13P-11-92
Vortex Flows Pulsated by
Thermoplasmonic
Marangoni
EffectT. Sono, K. Namura and M.
Suzuki, Kyoto Univ., Japan
13P-11-96
Design of MEMS Cantilever for
Low Frequency Vibration Energy
Harvesters
R. Takei 1, N. Makimoto 1, H.
Okada 1, T. Itoh 1,2 and T.
Kobayashi 1, 1 AIST and 2 Univ.
of Tokyo, Japan
13P-11-122L
Design Method for Cylindrical
Self-Folding of Films
using a Triple-Layered Structurewith Internal Stress
S. Shimbo, T. Fujie and E. Iwase,
Waseda Univ., Japan

13P-11-93
Fabrication of the Electroformed
Long-Period Fiber Grating by
MEMS Process for Temperature
Sensing Application
C.-C. Chiang, K.-X. Lin and J.-W.
Wu, Natl. Kaohsiung Univ. ofApplied Sci., Taiwan
13P-11-97
Intensity and Direction Controlsof Light Beam by Modulating
SAW Gratings
Y.-O. Lee and K.K. Lee, Ajou
Univ., Korea
13P-11-123L
A Long-Wavelength Infrared
Spectrometer Based on Tunable
Fabry-Perot Interferometer
D.G. Jung 1, S.M. Baek 1, J.Y.
Lee 1, S.Y. Kwon 1, W.I. Jang 2
and S.H. Kong 1, 1 Kyungpook
Natl. Univ. and 2 ETRI, Korea- 17 -

13P-11-95
Study on Reducing Thermal
Resistancein
ReactivelyBonded Solder Joints
S. Kanetsuki 1, S. Miyake 1, J.
Kuroishi 2 and T. Namazu 2, 1
Kobelco Res. Inst. and 2 Univ.
Hyogo, Japan
13P-11-99
Electrodeposition
andCharacterization of CNTs-Cu
Nanocomposite Thin Film
Z. An and T. Ono, Tohoku Univ.,Japan

MNC 2015, November 10-13, 2015, Toyama International Conference Center, Toyama, Japan
12A-6-4 Withdrawn
14:50
Process-Integration
Achievements for Multiple EBeam Direct Write
I. Servin 1, P. Brandt 2, M.-L.
Pourteau 1, J. Pradelles 1, P.
Pimenta-Barros 1, L. Lattard 1
and M. Wielandb 1, 1 CEA-LETI,Franceand
2
MAPPER
Lithography, The Netherlands
13P-11-110L Withdrawn
Controlling Tunnel Barrier in
Si3N4-Based RRAM Embedding
SiO2 for Low-Power and HighDensity
Cross-Point
Array
Applications
S. Kim 1, S. Jung 1, M.-H. Kim 1,
H.-D. Kim 2, S. Cho 3 and B.-G.
Park 1, 1 Seoul Natl. Univ., 2
Sejong Univ. and 3 Gachon Univ.,
Korea

12P-7-36
AtmosphericPressure Gas
Ionization
Sensor
with
Horizontal-Aligned
CNTElectrodes on Flexible Substrate
K.-Y. Wang and H.-C. Cheng,
Natl. Chiao Tung Univ., Taiwan

12P-7-41
Growth and Properties of
Pyroelectric Nano-crystals
S. Berger, Technion-Israel inst. ofTechnol., Israel

13P-11-36 Withdrawn
Impact of Thickness andCompliance Current on Resistive
Switching Behavior of SiNxBased RRAM for 3D Vertical
Resistive
Random-Access
Memory Application
S. Kim 1, S. Jung 1, M.-H. Kim 1,
H.-D. Kim 2, S. Cho 3 and B.-G.
Park 1, 1 Seoul Natl. Univ., 2
Sejong Univ. and 3 Gachon Univ.,
Korea

13D-10-4 Withdrawn
14:30
Characterization of Transfer
Printed Ultrathin Piezoelectric
Strain Sensor
T. Yamashita 1,2, S. Takamatsu
1,2, H. Okada 1,2, T. Itoh 2,3 andT. Kobayashi 1,2, 1 AIST, 2
NMEMS
Technol.
Res.
Organization and 3 Univ. ofTokyo, Japan- 18 -

11C-3-3
16:25
Photoluminescenceof
Nanocrystalline Zinc Stannate
Phosphor Powders
M.-T. Tsai, C.-J. Jian and S.-W.
Lu, Natl. Formosa Univ., Taiwan