P e r f o r m a n c e , R e l i a b i l i t y, a n d V e r s a t i l i t yTranspector® CPM
Fast, Field-ready Process Monitoring SystemPrecision measurement formodern semiconductor processes
INFICON Transpector CPM has been thefilms. Process optimization requires precise

market-leading Residual Gas Analyzer

control over precursor chemical doses. With(RGA) process monitoring system in thea measurement speed of 555 data points

semiconductor industry for over a decade. Now

per second and industry-leading sensitivity,

Transpector CPM provides industry-leading

the enhanced Transpector CPM can meetmeasurement speed and sensitivity throughthe challenges of atomic layer depositiona field-proven pumping and inlet systemprocesses.

integrated with a new sensor and electronics.
Transpector CPM is the ideal RGA process

In addition to being the fastest RGA processmonitor for new and established semiconductor

monitor available, Transpector CPM also

processes such as ALD, CVD, PVD, and etch.

delivers maximum uptime due to a longlife closed ion source and field-replaceable

TRANSPECTOR CPM IS
FAST AND FIELD READYelectron multiplier. To counter the extremely

INFICON understands that modern

as etch and CVD, the Transpector CPM

semiconductor processes are more demanding

HexBlock™ inlet is machined from a single

than ever. Designed to provide premier trace

piece of chemically resistant 316 stainlessgas analysis for semiconductor applications,steel, and the turbo pump and foreline pump

Transpector CPM is the choice instrument

have been designed to maximize resistancefor monitoring advanced processes such asto corrosion. Transpector CPM remains theALD and HDP CVD. Atomic layer processesmost reliable and versatile RGA process

require depositing extremely thin and uniform

monitor on the market.

corrosive gases found in applications such

Transpector CPM has improved speed (555 data points per second) and industry-leading sensitivity to effectively monitor
the challenges of ALD applications.

FEATURES AT A GLANCE■■■ALD-ready with measurementwith FabGuard software andspeed of 1.8 ms per point

supported by INFICON world-class

Diaphragm Gauge (CDG)—CDG(555 data points per second)

applications experts

allows user to monitor the process

Field-proven durability and reliability■

integration into production

etch applications

semiconductor equipment■

HexBlock with up to three pressure

Transpector CPM becomes ainlets and reduced surface area

powerful process monitoring andto minimize surface reactions anddiagnostics tool when integrated

response times

Corrosion resistant Capacitancepressure and automaticallyCompact size—allows for easyin the most demanding CVD andApplication integration—■

protect the system from pressure
excursions■

Automated calibration—ensureslong-term data stability andaccuracy for sensor to sensor andtool to tool chamber matching

FAST DATACOLLECTION

AUTOMATED CALIBRATION

Redesigned electronics
enable shorter RF
settling times for datacollection speed up to1.8 milliseconds per data point (approximately555 data points per second). With this fast data
speed, Transpector CPM is ideal for challenging
semiconductor applications such as ALD and
HDP CVD.

Automated calibration can be easily performed
with FabGuard software using an integrated
calibration reference gas mixture.

LONG-LIFEION SOURCE

PROCESS CHARACTERIZATION AND
MONITORING FOR:Transpector CPM includes
a robust, field-replaceable
closed ion source that willkeep maintenance costs
low over the lifetime of theinstrument.

■■■

 dvanced Processes including Atomic Layer
ADeposition (ALD)
 tch processes including: metal, dielectric, silicon
Eetch and high density plasma etch
 VD Processes including: high k dielectrics,C
HDP-CVD, LP-CVD, SA-CVD, CVD low k, PE-CVD■

Diffusion and Epitaxy processes■300 mm wafer degas■

Ion implantation

SIMPLIFIED CABLE BOX DESIGN
Improved cable box design protects and organizes
Transpector CPM cables.

INNOVATIVE ELECTRONMULTIPLIER
A new low-noise, high-gain
continuous dynode electron
multiplier can be replaced inthe field, resulting in decreased
maintenance downtime andincreased tool uptime.

FABGUARD DATA COLLECTION
AND ANALYSIS
When integrated with the INFICON FabGuard
software suite, Transpector CPM becomes a
powerful process monitoring and diagnostics
tool which can be used for: Advanced process control(end point detection)

FIELD-PROVEN INLET SYSTEMThe Transpector CPM pumping and inlet system
includes the INFICON field-proven HexBlock
inlet—adaptable enough to sample up to threedifferent process pressures, yet robust enoughto withstand the most challenging corrosive
applications.

PROCESS GAUGE
Upgraded corrosion resistant CDG processpressure gauge for longer life in aggressive
applications.

■

FORELINE GAUGE Statistical process control (SPC)■ Run-by-run and real-time fault detection andclassification■

New Pirani foreline pressure gauge for simpler
pumping system diagnostics.

We have a global network of experts to provide
fast and local applications and product support.

Transpector CPM has provided proven return on investment
to our semiconductor partners for over a decade.
INDUSTRY-LEADING MEASUREMENTTECHNOLOGY Innovative sensor design for industry-leading sensitivity
and stability leads to more accurate process control
decisions in your fab.

■

 Modern electronic control with decreased RF settling
times enables superior measurement speeds crucial for
ALD analysis.

■ Patented low noise, high gain electron multiplier means
more measurement from your investment.

■

EASE OF MAINTENANCE Long lifetime components for longer mean time
between maintenance.

■ Field-replaceable electron multiplier, ion source,
and gauges allow you to schedule maintenance atyour convenience, taking repair delays out of theuptime equation.

■ Field-serviceable diaphragm pump.

■

ROBUST AND ADAPTIVE ARCHITECTURE Configurable HexBlock inlet allows for sampling up
to three different process pressures, enabling you toadjust according to the ever-changing semiconductor
process landscape.

■ Wide pressure measurement range from high vacuum
to atmosphere■ Corrosion resistant inlet, pumping package, and sensor
for harsh environment manufacturing. Includes theTranspector CPM ion source with an additional anodeliner which can be configured specifically for CVD oretch applications.

■SUPERIOR PRODUCT SUPPORT World leader in RGAs for the semiconductor market fordecades, with a global network of experts to provide fastand local applications and product support.

■ INFICON has the resources, expertise, and experience
to develop innovative, reliable monitoring systems thatenhance yields.

■

SPECIFICATIONS
Mass range

1 to 100 amu

1 to 200 amu

Peak width @ 10% peak maximum		<1 amuIon source type		

Closed Ion Source

1 to 300 amu

Total pressure range1		5E-7 to 1E-3 Torr (6.6E-7 to 1.3E-3 mbar)
Total pressure accuracy2		
±25% 1E-6 to 1E-3 Torr (1.3E-6 to 1.3E-3 mbar)
Maximum ion source operating pressure3		

1E-3 Torr (1.3E-3 mbar)

Nominal ion source operating pressure 		2E-4 Torr (2.6E-4 mbar)

System operating pressure		(with orifices/capillary)

1E-8 Torr (1.3E-8 mbar) to 1.2 atmospheres

4Sensitivity@ low emission, FC mode

>4.0E-6 amps/Torr>2.0E-6 amps/Torr>1.0E-6 amps/Torr(>3E-6 amps/mbar)(>1.5E-6 amps/mbar)(>7.6E-7 amps/mbar)>2.0E-5 amps/Torr>1.0E-5 amps/Torr>5.0E-6 amps/Torr(>1.5E-5 amps/mbar)(>7.6E-6 amps/mbar)(>3.8E-6 amps/mbar)

1.0E-13 Torr
(1.3E-13 mbar)

2.0E-13 Torr
(2.6E-13 mbar)

4.0E-13 Torr
(5.3E-13 mbar)@ high emission, FC mode
Minimum detectable partial pressure5

Maximum Data Rate 		(analog scans OR selected peaks)		

1.8 ms per point(555 data points per second)

Abundance sensitivity6<5 ppm<10 ppm<100 ppm

Zero blast7<2 ppm<25 ppm<200 ppm<1 ppm<2 ppm<4 ppmDetection limit

8Linearity9±20%

Minimum background pressure		<1.0E-8 Torr (<1.3E-8 mbar)

Maximum sensor and inlet		
operating temperature

150°C

1

Pressure reading at low emission using total pressure lens5	MDPP with EM on at 10,000 gain and 1-second dwell time2	Total pressure accuracy at low emission

6	Mass 40 contribution onto 41 amu

3	Maximum ion source operating pressure at low emission

7(filament turn-off threshold)4	2E- 4 Torr in the closed ion source will produce about 1E-5 Torr in
the quadrupole region

Zero blast contribution onto 2 amu

8	Minimum detectable concentration with krypton in air at a 1-second dwell9	For 1 Torr orifices and lower. Linearity at low emission at 0.1 to 2 times

the nominal orifice pressure

DIMENSIONS

152 mm
(6.0 in.)

378 mm(14.9 in.)

545 mm
(21.5 in.)www.inf icon.com

reachus @in f ico n .co m

Transpector and FabGuard are registered trademarks of INFICON and HexBlock is a trademark of INFICON.
Due to our continuing program of product improvements, specifications are subject to change without notice.
aibc04a1-d©2015 INFICON