2009B1792                          BL14B2XAFS ࡟ࡼࡿ㧗⃰ᗘ Gd ῧຍ AlN ῝⣸እග※⏝ⷧ⭷ࡢᒁᡤᵓ㐀ゎᯒ
Analysis of Local Structure of AlN:Gd Film for Deep Ultraviolet Light
Source Containing a High Concentration of Gd by XAFS.
ᑠᯘ ᖿᘯ a, ▼ཎ Ⴙ⏕ b, Ἠ ᏹ࿴ b㸪すᮏ ဴᮁ a㸪⏣୰ ᐶஅ a, ౗ᒣ ┿ஓ c
Mikihiro Kobayashi a, Tsuguo Ishihara b, Hirokazu Izumi b,Tetsurou Nishimoto a, Hiroyuki Tanaka a, Shinya Kitayama caa㻔ᰴ㻕࣓ࣘࢵࢡࢫ, b රᗜ┴❧ᕤᴗᢏ⾡ࢭࣥࢱ࣮, c ⚄ᡞ኱ᏛYUMEX Inc., bHyogo Prefectural Institute of Technology., cKobe University.

Ỉ㖟ࣇ࣮ࣜ῝⣸እග※⏝⺯ගయ࡜ࡋ࡚㛤Ⓨࢆ㐍ࡵ࡚ࡁࡓ㧗⃰ᗘ Gd ῧຍ AlN ⷧ⭷࡟ࡘ࠸࡚ࠊᨺ
ᑕග X ⥺ࢆ⏝࠸ࡓᒁᡤᵓ㐀ゎᯒࢆ⾜ࡗࡓࠋῧຍࡋࡓⓎග୰ᚰ࡛࠶ࡿ Gd ࢖࢜ࣥࡢῧຍ⃰ᗘࡀࠊGdࡢᒁᡤᵓ㐀࡟ཬࡰࡍᙳ㡪ࢆ XAFS ᐃ࡟ࡼࡾㄪ࡭ࠊ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥࢫᙉᗘ࡜ࡢᅉᯝ㛵ಀࢆㄪ࡭ࡓࠋࡑࡢ⤖ᯝࠊGd ⃰ᗘࡀ㧗ࡃ࡞ࡿ࡟ᚑ࠸ࠊ➨ 2 㓄఩࡟┦ᙜࡍࡿࣆ࣮ࢡࡢᙉᗘࡀῶᑡࡋࡓࠋࡇ
ࢀࡣ AlN ࡢ Al ࢧ࢖ࢺࢆ⨨᥮ࡋࡓ Gd ࡢ࿘ᅖࡢᵓ㐀ࡀ኱ࡁࡃṍࢇࡔࡓࡵ࡛࠶ࡿ࡜⪃࠼ࡽࢀࡿࠋࡑࡢ
ࡓࡵ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥࢫᙉᗘࡣ Gd ⃰ᗘ 6mol%࡛᭱኱ࢆ♧ࡋࠊ11mol%࡛ࡣᙉᗘࡀ኱ࡁࡃపୗ
ࡋࡓ࡜⪃࠼ࡽࢀࡿࠋ
࣮࣮࢟࣡ࢻ㸸 Gd ῧຍ AlNࠊ῝⣸እග※ࠊXAFS⫼ᬒ࡜◊✲┠ⓗ㸸Ḣᕞࡢ WEEE&RoHS ᣦ௧࡞࡝⎔ቃ᭷ᐖ≀㉁࡟㛵ࡍࡿつไࡣ┈ࠎཝࡋࡃ࡞ࡗ࡚࠸ࡿࠋᡃࠎࡣỈ㖟ࣛࣥࣉࡢ௦᭰฼⏝ࢆ┠ⓗ࡟ࠊAlN ࢆẕయ࡜ࡋ࡚ᕼᅵ㢮ඖ⣲㻔Gd㻕ࢆῧຍࡋࠊGd ࡢ f-f 㟁Ꮚ㑄⛣ࢆ฼⏝ࡋࡓỈ㖟ࣇ࣮ࣜ῝⣸እග※ࡢ㛤Ⓨࢆ⾜ࡗ࡚ࡁࡓ[1]ࠋGd ῧຍ AlN ⷧ⭷ࡢ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥ
ࢫᙉᗘࡣ Gd ⃰ᗘ 6mol%࡛᭱኱ࢆ♧ࡍࡀࠊ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥࢫᙉᗘࡢῶᑡཎᅉ࡜ Gd ᒁᡤᵓ㐀࡜ࡢ㛵ಀࡣゎ᫂ࡉࢀ࡚࠸࡞࠸ࠋᮏ◊✲ࡢ┠ⓗࡣ཯ᛂᛶࢫࣃࢵࢱࣜࣥࢢἲ࡟ࡼࡾస〇ࡋࡓ Gd ῧຍAlN ⷧ⭷ࡢᡂ⭷ ᗘࠊGd ῧຍ⃰ᗘࡀ Gd ࡢᒁᡤᵓ㐀࡟ཬࡰࡍᙳ㡪ࢆ XAFS ᐃ࡟ࡼࡾヲ⣽࡟ㄪ࡭ࠊⓎගࡢ㧗㍤ᗘ໬࡟⧚ࡀࡿᅉᏊࢆゎ᫂ࡍࡿ஦࡛࠶ࡿࠋࡑࡋ࡚ࠊࡉࡽ࡟ Gd ࡢᏑᅾࢧ࢖ࢺ㻔ձAl ࢧ࢖ࢺ࡟⨨᥮ࠊղGdN ࢡࣛࢫࢱ࣮ࡀᙧᡂࠊճ᱁Ꮚ㛫ࢧ࢖ࢺ࡟Ꮡᅾ䠅ࢆ᫂ࡽ࠿࡟ࡍࡿ࡜ඹ࡟ࠊ㓄఩ᵓ㐀ࡢᑐ⛠ᛶࡶ᳨ウࡍࡿࠋᐇ㦂㸸ᐃヨᩱ࡛࠶ࡿ Gd ῧຍ AlN ⷧ⭷ࡣࠊ཯ᛂᛶࢫࣃࢵࢱ
ࣜࣥࢢἲ࡟ࡼࡾ 500Υ௨ୗࡢ ᗘ᮲௳࡛▼ⱥ࢞ࣛࢫᇶᯈ
㻔10mm15mm0.5mm㻕ୖ࡟స〇ࡋࡓࠋᅗ 1 ࡟ ᐃヨᩱࡢእほ෗┿ࢆ♧ࡍࠋᖸ΅Ⰽࡢ࠶ࡿ㏱᫂࡞ⷧ⭷ࡀᙧᡂࡉࢀ࡚࠸ࡿࡢࡀศ࠿ࡿࠋ ᐃࡣ BL14B2 ࢆ⏝࠸ࠊཧ↷ヨᩱ࡜ࡋ࡚‽ഛࡋࡓ Gd2O3 ࠊGdF3ࠊAl94Gd6
ྜ㔠ࡢ Gd-L3 ྾཰➃ࡢࢫ࣌ࢡࢺࣝࡣ㏱㐣ἲ࡟ࡼࡾࠊGd
ῧຍ AlN ⷧ⭷ࠊཬࡧཧ↷ヨᩱ࡜ࡋ࡚స〇ࡋࡓ GdN ⷧ⭷ࡢ Gd-L3 ྾཰➃ࡢࢫ࣌ࢡࢺࣝࡣࠊᐊ ࡛ 19 ⣲Ꮚ SSD ࢆ⏝࠸ࡓ⺯ග XAFS ἲ࡟ࡼࡾ ᐃࢆ⾜ࡗࡓࠋᅗ 1㸬▼ⱥ࢞ࣛࢫᇶᯈୖ࡟ࢫࣃࢵࢱࣜࣥࢢᡂ㛗ࡋࡓ Gd ῧຍ AlNⷧ⭷⤖ᯝ࠾ࡼࡧ⪃ᐹ㸸
ᅗ 2 ࡟ 500Υ࡛ 2 ᫬㛫ࢫࣃࢵࢱᡂ㛗ࡋࡓ Al㻔1-X㻕GdXN㻔X=0.04,0.06,0.11㻕ⷧ⭷࡟ࡘ࠸࡚ࠊ ᐃࡼࡾᚓࡽࢀࡓ Gd-L3 ྾཰➃ࡢືᚄศᕸ㛵ᩘࢆ♧ࡍࠋఱࢀࡢヨᩱࡶཧ↷ヨᩱࡢ GdN ⷧ⭷࡜ࡣ␗࡞ࡿࣃࢱ࣮
ࣥࢆ♧ࡋ࡚࠸ࡿࡇ࡜ࡼࡾࠊῧຍࡋࡓ Gd ࡣ GdN ࢡࣛࢫࢱ࣮ࢆᙧᡂࡍࡿࡢ࡛ࡣ࡞ࡃࠊAlN ࡢ Al ࢧ࢖ࢺ࡟⨨᥮ࡋ࡚࠸ࡿ࡜⪃࠼ࡽࢀࡿࠋGd ⃰ᗘࡀ㧗ࡃ࡞ࡿ࡟ᚑ࠸ࠊ➨ 1 㓄఩࡟┦ᙜࡍࡿ 1.7ύ௜㏆࡟ぢIntensity (arb units)ࡽࢀࡿࣆ࣮ࢡࡀ㛗㊥㞳ഃ࡟ࢩࣇࢺࡋ࡚࠾ࡾࠊGd-N ࡢ⤖ྜ㊥㞳ࡀఙࡧ࡚࠸ࡿࡇ࡜ࢆ♧ࡋ࡚࠸ࡿࠋࡲ
ࡓࠊAl 0.89 Gd 0.11 N ࡢヨᩱ࡟࠾࠸࡚ࡣࠊ➨ 2 㓄఩࡟┦ᙜࡍࡿࣆ࣮ࢡࡢᙉᗘࡀῶᑡࡋ࡚࠾ࡾࠊᑐ⛠ᛶࡀᝏࡃ࡞ࡗ࡚࠸ࡿࡇ࡜ࢆ♧ࡋ࡚࠸ࡿࠋᡃࠎࡀ᳨ウࡋ࡚࠸ࡿẕయᮦᩱࡢ AlN ࡣ࢘ࣝࢶ㖔ᆺᵓ㐀ࢆ࡜
ࡾࠊAl3+ࡢ࢖༙࢜ࣥᚄ㻔0.039nm㸸4 㓄఩㻕࡜Ⓨග୰ᚰ࡛࠶ࡿ Gd3+ࡢ࢖༙࢜ࣥᚄ㻔0.0938nm㸸6 㓄఩㻕࠿ࡽ⪃࠼ࡿ࡜ࠊGd ⃰ᗘࡀ㧗ࡃ࡞ࡿ࡟ࡋࡓࡀ࠸ࠊAlN ࡢ Al ࢧ࢖ࢺࢆ⨨᥮ࡋࡓ Gd ࡢ࿘ᅖࡢᵓ㐀ࡀ኱ࡁࡃṍࢇ࡛࠸ࡿ࡜⪃࠼ࡽࢀࡿࠋࡇࡢࡇ࡜ࡣࠊX ⥺ᅇᢡ ᐃ࡛ࠊGd ⃰ᗘࡢቑຍ࡟ᚑ࠸ AlN ࡢ⤖ᬗᛶ࠾ࡼࡧ㓄ྥᛶࡀపୗࡍࡿࡇ࡜࡜Ⰻࡃ୍⮴ࡋ࡚࠸ࡿࠋࡑࡢࡓࡵᅗ 3 ࡟♧ࡍࡼ࠺࡟ࠊGd ῧຍ AlN ⷧ⭷ࡢ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥࢫᙉᗘࡣ Gd ⃰ᗘ 6mol%࡛᭱኱ࢆ♧ࡋࠊGd ⃰ᗘ 11mol%࡛ࡣᙉᗘࡀ኱ࡁ
ࡃపୗࡋࡓ࡜⪃࠼ࡽࢀࡿ[1]ࠋ

1x1051x10

41x10324681012GdN mole fraction (%)ᅗ 2㸬Gd-L3 ྾཰➃ࡢືᚄศᕸ㛵ᩘ㻔Gd ⃰ᗘ㸸4㸣㸪6%㸪11%㻕

ᅗ 3㸬Gd ⃰ᗘ࡜Ⓨගᙉᗘࡢ㛵ಀ

Intensity඾ᆺⓗ࡞ࢹࣂ࢖ࢫ࠿ࡽࡢⓎගࢫ࣌ࢡࢺࣝࢆᅗ 4 ࡟♧ࡍࠋἼ㛗 317nm ࡟್༙ᖜ 1nm㻔ศගჾࡢศゎ⬟㝈⏺㻕ࡢ㗦࠸Ⓨගࣆ࣮ࢡ࡜Ἴ㛗 312nm ࡟➨ 2 ບ㉳‽఩࠿ࡽࡢⓎගࢫ࣌ࢡࢺࣝࢆ☜ㄆࡋࡓࠋᅗ 5࡟ࢫࣃࢵࢱᡂ㛗 ᗘ࡜Ⓨගᙉᗘࡢ㛵ಀࢆ♧ࡍࠋᡃࠎࡣࡇࢀࡲ࡛࡟⤖ᬗᡂ㛗 ᗘࢆୗࡆࡿࡇ࡜࡟ࡼ
ࡿⓎගᙉᗘࡢቑᙉࢆぢ࠸ࡔࡋ࡚࠸ࡿࠋ

300

310
320
Wavelength (nm)330

ᅗ 4㸬ࢹࣂ࢖ࢫ࠿ࡽࡢⓎගࢫ࣌ࢡࢺࣝ

ᅗ 5㸬⤖ᬗᡂ㛗

ᗘ࡜Ⓨගᙉᗘࡢ㛵ಀᅗ 6 ࡟ 30 ศࢫࣃࢵࢱᡂ㛗ࡋࡓ Al 0.94 Gd 0.06 N ⷧ⭷㻔ᡂ⭷ ᗘ㸸100Υࠊ300Υࠊ500Υ㻕࡟ࡘ࠸࡚ࠊᐃࡼࡾᚓࡽࢀࡓ Gd-L3 ྾཰➃ࡢືᚄศᕸ㛵ᩘࢆ♧ࡍࠋ➨ 1 㓄఩࡟┦ᙜࡍࡿ 1.8ύ௜㏆࡟ぢࡽࢀࡿࣆ࣮ࢡ࡟࡯࡜ࢇ࡝ኚ໬ࡀぢࡽࢀ࡞࠸ࡇ࡜࠿ࡽࠊGd-N ࡢ㓄఩≧ែ࡟ኚ໬ࡀ࡞࠸࡜⪃࠼ࡽࢀࡿࠋ୍᪉ࠊᡂ㛗 ᗘࡀప࠸࡯࡝➨ 2 㓄఩࡟┦ᙜࡍࡿ 2.7ύ௜㏆࡟ぢࡽࢀࡿࣆ࣮ࢡࡣࠊࣆ࣮ࢡ఩⨨࡟ኚ໬ࡀぢࡽࢀ࡞࠸ࡀࠊࣆ࣮ࢡᙉᗘࡣ኱ࡁࡃ࡞ࡿࠋࡇࡢࡇ࡜ࡣᡂ㛗 ᗘࡀప࠸࡯࡝ࠊ࢘ࣝࢶ㖔ᆺᵓ㐀ࢆ࡜ࡿ AlN
୰࡛ࠊ➨ 2 㓄఩ࢆ࡜ࡿ࡜⪃࠼ࡽࢀࡿ Gd-Al ࡲࡓࡣ Gd-Gd ࡢᑐ⛠ᛶࡀྥୖࡋ࡚࠸ࡿࡇ࡜ࢆ♧၀ࡋ࡚࠸ࡿࠋⓎගຠ⋡ࡢྥୖࡣ Gd ࡢᒁᡤᵓ㐀ࡢ㓄఩ᑐ⛠ᛶࡀྥୖࡋ࡚࠸ࡿࡇ࡜ࢆ♧၀ࡋ࡚࠸ࡿࠋ
Gd ࡢ࿘ᅖࡢᵓ㐀ࡢᑐ⛠ᛶࡢྥୖࡀ࢝ࢯ࣮ࢻ࣑ࣝࢿࢵࢭࣥࢫᙉᗘࡢቑຍ࡟ࡘ࡞ࡀࡿ࡜⪃࠼ࡽࢀ
ࡿࡀࠊX ⥺ᅇᢡ ᐃ࡛ᡂ㛗 ᗘࡀపࡃ࡞ࡿ࡟ࡋࡓࡀ࠸ࠊẕయ࡛࠶ࡿ AlN ࡢ⤖ᬗᛶࡀపୗࡍࡿࡢ࡜
ࡣ㏫ࡢഴྥࢆ♧ࡋ࡚࠾ࡾࠊ௒ᚋヲ⣽࡞ゎᯒࡀᚲせ࡛࠶ࡿ[2]ࠋ

ᅗ 6㸬Gd-L3 ྾཰➃ࡢືᚄศᕸ㛵ᩘ㻔ᡂ⭷ ᗘ㸸100Υ, 300Υ, 500Υ㻕௒ᚋࡢㄢ㢟㸸
㧗⃰ᗘ Gd ῧຍ AlN ⷧ⭷ࡢᒁᡤᵓ㐀࡟ཬࡰࡍࣂࢵࣇ࢓࣮ᒙ࡜⭷ཌࡢຠᯝࢆ᫂ࡽ࠿࡟ࡋࠊX ⥺ᅇᢡ ᐃ࡟ࡼࡿᵓ㐀ゎᯒ࡞ࡽࡧ࡟Ⓨග≉ᛶࡢホ౯⤖ᯝࢆ࠶ࢃࡏ࡚ࠊⓎගࡢ㧗㍤ᗘ໬࡟⧅ࡀࡿᅉᏊࢆ
ゎ᫂ࡋࠊᡂ⭷ࣉࣟࢭࢫࡢᨵⰋ࡟ࡼࡿ Gd ࢧ࢖ࢺࡢ⢭ᐦไᚚ࡜㧗⃰ᗘ Gd ῧຍ AlN ⷧ⭷ࡢ㧗ရ㉁໬࡟
ࡼࡾࠊⓎගຠ⋡ࡀቑ኱ࡋࡓ㧗㍤ᗘⓎගᮦᩱࡢ㛤Ⓨ࡟⧅ࡆࡿࠋཧ⪃ᩥ⊩㸸[1] T. Kita et al., Appl. Phys. Lett., 93, 21190㻌㻔2008㻕.
[2] S. Kitayama et al., :IOP Conf. Series: Materials Science and Engineering 1, 012001 㻔2009㻕.