★★★ ＜第33回知的財産翻訳検定試験【第16回英文和訳】＞ ★★★
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問１．下記英文を日本語に翻訳してください。
The sensor systems in which electrochemical techniques are used foranalysis are called electrochemical sensors. Electrochemical sensors allow
the analysis of target (bio)molecules in a rapid and practical way.
Electrochemical techniques are preferred by researchers compared to othertechniques such as optics and piezoelectrics of the prior art, as they can carryout sensitive and selective detection and at the same time they canminiaturized and can analyse the analyte (on-line), even from complex
samples. In the patent application TR2018/XXX, the development ofelectrochemical sensors from the carbon rods recycled from the waste drybatteries for the analysis of various materials has been described. This
carbon material allows the insertion of a copper wire through it and is cut inthe shape of a disk and graphene and polymer material has been added onto
its surface. Trinitrotoluene determination has been carried out with squarewave voltammetry (SWV) technique. In the patent application TR2016/XXX,
thegold

electrodemodifiedwithP(DTP-Ph-NH2)

conductive

polymer/Cytochrome C/Thilacoid is used as the photo anode, and the gold
electrode that is functionalized with the P(DTP-Naphthyl-NH2) conductive

polymer/bilirubin oxidase enzyme is used as the cathode. By connecting
these two electrodes to each other by a cable, a biosensor has been developed
to be used for the determination of pesticides in domestic and industrial
wastewater of the solar cell that generates electricity.
問２．下記英文を日本語に翻訳してください。
The treating agents used to treat filler (ii) may be selected from one or moreof, for example, organosilanes, polydiorganosiloxanes, or organosilazanes,
hexaalkyl disilazane, short chain siloxane diols, a fatty acid or a fatty acid
ester such as a stearate to render the filler (s) hydrophobic and therefore
easier to handle and obtain a homogeneous mixture with the othercomponents. Specific examples include but are not limited to liquidhydroxyl-terminated polydiorganosiloxane containing an average from 2 to
20 repeating units of diorganosiloxane in each molecule which may
optionally contain fluoro groups and or fluoro containing groups, if desired,hexaorganodisiloxane, hexaorganodisilazane, and the like. A small amountof water can be added together with the silica treating agent (s) as processing
aid. The surface treatment of the fillers makes them easily wetted bypolymers (i) and (i) (a) if the latter is present. These surface modified fillers
do not clump and can be homogeneously incorporated into polymers (i) and(i) (a) resulting in improved rheological behavior, such as lower viscosity andhigher stability in viscosity during storage of the uncured compositions andimprovedroomtemperature

mechanicalproperties

ofthecuredcompositions.
問３．下記英文を日本語に翻訳してください。
(a) N-Carbobenzyloxy-4-hydroxy-L-proline
26.5 g. (0.02 mole) of 4-hydroxy-L-proline and 32.8 ml. (0.23 mole) of benzyl
chloroformate are reacted in 200 ml. of water and 100 ml. of acetone in thepresence of 20 g. (0.02 mole) of potassium bicarbonate and 69.2 g. (0.50 mole)of potassium carbonate and worked up with 90 ml. of concentratedhydrochloricacid

asdescribed

N-carbobenzyloxy-4-hydroxy-L-proline.

inReferenceThisproductAistoobtain

reactedwithcyclohexylamine to form the cyclohexylamine salt yield 69 g., m.p.
193ºC-195ºC. The salt (34 g.) is neutralized with N-hydrochloric acid toobtain 27 g. of free acid as a colorless glass.
(b) N-carbobenzyloxy-4-keto-L-proline
21.5 g. (0.81 mole) of N-carbobenzyloxy-4-hydroxy-L-proline is oxidized in 1.2liters of acetone with 83 ml. of 8 N chromic acid in sulfuric acid. In order tofacilitate the subsequent filtration of chromium salts, 30 g. of Celite® isadded to the acetone solution before introduction of the oxidizing agent. An
air stirrer is employed. The reaction mixture is filtered and the acetone
filtrate is concentrated to approximately 300 ml. before diluting with 1 literof chloroform. The solution is washed with 300 ml. of saturated sodium
chloride (four times), dried (MgSO4), filtered and the solvent evaporated togive N-carbobenzyloxy-4-keto-L-proline (22.8 g.) which is crystallized fromether (50 ml)-hexane (150 ml) to obtain 17.2 g. (81%) of product, m.p.
99ºC-101ºC.
問４．下記の*** START ***, *** END ***の間の英文を日本語に翻訳してください。
*** START ***1. A method of producing boron nitride nanotubes, the method comprising:a. providing an integrated production apparatus, the apparatus comprising:a pressurized reaction chamber containing a continuously fed boron
containing target having a boron target tip, a source of pressurized nitrogenand a moving belt condenser apparatus including a belt surface; a hutchchamber proximate the pressurized reaction chamber containing a target
feed system wherein the target feed system provides a continuously fed
boron containing target to the pressurized reaction chamber, a nitrogen
control system in communication with the pressurized nitrogen; a laser
beam and optics wherein the optics direct the laser beam though a laser
beam tube, the hutch and into the pressurized reaction chamber; and asafety shield positionable to surround at least a portion of the pressurizedchamber;b. providing nitrogen gas to the pressurized reaction chamber tomaintain a pressure of about 150 to 200 psi in the pressurized reaction
chamber;c. providing a laser beam and maintaining a laser power of about1000 to about 2500 W;
d. directing the laser beam to the tip of the boron target; ande. collecting boron nitride nanotubes on the belt surface of the moving
belt condenser apparatus.
*** END ***参考用の明細書部分（問題文ではありませんので翻訳不要です。）[0018] Referring to FIG. 1 which is a schematic drawing of one embodimentof the integrated production apparatus for production of boron nitride
nanotubes via the pressure vapor-condenser method. The apparatus
comprises a pressurized reaction chamber 16, a hutch chamber 20 proximate
the pressurized reaction chamber 16, a laser beam 12, and a sliding safety
shield 2. The hutch chamber 20 further comprises a target feed system 9, an
optical bench 15, gas pressure and flow controls 13 and electronic controls 14.
The target feed system 9 provides for supporting and continuously feeding aboron target 36 into the pressurized reaction chamber 16. The gas pressureand flow controls 13 comprise a needle valve, pressure gauge and a regulator
and are used for admitting nitrogen into the system and regulating the flowof nitrogen to maintain pressure in the pressurized reaction chamber 16.
Flow rate is monitored by a chamber exhaust meter (not shown). The
electronic controls 14 provide for control of the target feed system 9, controlof the boron target 36 position and feed rate and laser beam 12 manipulation.
During operation of the apparatus the operator may adjust the flow rate,pressure, laser power, laser focus, feed rate of the boron target 36, andposition of the boron target 36 by adjusting one or more appropriate gaspressure and flow control 13 and/or one or more appropriate electroniccontrol 14. The electronic controls 14 also provide for the control andadjustment of the rate of motion and position of the moving belt condenser(not shown in FIG. 1) in the pressurized chamber 16.
[0023] The pressurized reaction chamber 16 is pressurize by admitting

nitrogen via nitrogen supply line 7 and valve 34 into the pressurized reaction
chamber 16. In one representative embodiment, the nitrogen gas ismaintained at a pressure of about 150 to about 200 psi. The introduction of
nitrogen is controlled by a nitrogen control system.
[0024] Hot boron vapor is formed as the laser beam 12 vaporizes the boron
target tip 31 of the boron target 36 and the boron vapor mixes with thenitrogen gas which dissociates to atomic nitrogen under the conditions
present in the pressurized reaction chamber 16. The mixture of vaporizedboron and nitrogen travels toward the continuous belt condenser 29. The
continuous belt condenser 29 is has a moving belt 37 with a belt surface 30.
In a preferred embodiment, both the position of the continuous belt
condenser 29 and the rate of movement of the belt 37 are adjustable. The belt
surface 30 acts as a filament nucleation site.
参考図