Publication list

論文リスト

author(著者）

Literature title(文献のタイトル）

C-dopandMotoki Okinaka*, Yasumasa Hamana1, Takashi Tokuda,
Jun Ohta, Masahiro Nunoshita

MBE growth mode and C incorporation of GeC epilayers
on Si (001) substrates using arc plasma gun as a novel C
courceCharacterisation of NPs by APD

Sang Hoon Kima,, Young Eun Jeonga, Heonphil Haa,Ji,Young Byuna, Young Dok Kimb

Ultra-small platinum and gold nanoparticles by arc plasma Applied Surface Science 297 (2014) 52–58
deposition
10.1016/j.apsusc.2014.01.072

No.

A field of study of an academic area（分野）123Sang Hoon Kim

4

Kun'ichi Miyazawa, Masaru Yoshitake, Yumi Tanaka

Nanocatalyst Materials Prepared by Arc Plasma
Deposition
HRTEM analyses of the platinum nanoparticles preparedon graphite particles using coaxial arc plasma deposition
Atomic-scale Characterization of Platinum Nanoparticles
Deposited on C60 Fullerene Nanowhiskers and Related
Carbon Nanomaterials

Published magazine, volume, page(発刊雑誌

Appl. Chem. Eng., Vol. 25, No. 4, August 2014, 341-345
J Nanopart Res (2017) 19:19110.1007/s11051-017-3895-6
Nanoscience & Nanotechnology Series No. 55 Chapter 8
Concepts and Design of Materials Nanoarchitectonics
Edited by Omar Azzaroni and Katsuhiko Ariga© The Royal Society of Chemistry 2022
Published by the Royal Society of Chemistry, www.rsc.org

K. Miyazawa*a, M. Yoshitakea and Y. Tanaka

6

Kun'ichi Miyazawa,| Takuro Nagai, Koji Kimoto,| Masaru
Yoshitake and Yumi Tanaka1

7

Kun'ichi Miyazawa,| Takuro Nagai, Koji Kimoto,| Masaru
Yoshitake and Yumi Tanaka1

8

Yoshikiyo Hatakeyama , Satoshi Kimura , Tatsuya
Kameyama , Yoshiaki Agawa d, Hiroyuki Tanaka, KenJudai, Tsukasa Torimoto and Keiko Nishikawa

Temperature-independent formation of Au nanoparticles
in ionic liquids by arc plasma deposition

Chemical Physics Letters 658 (2016) 188–191
10.1016/j.cplett.2016.06.044

D. Phokharatkul, Y. Ohno, H. Nakano, S. Kishimoto, andT. Mizutani1

High-density horizontally aligned growth of CNT withConanoparticles deposited by Arc discharge plasma
methodAPPLIED PHYSICS LETTERS 93, 053112 2008
10.1063/1.2969290

CNT catalyst

HRTEM-EELS cross-sectional structural analyses ofglassy carbon substrate irradiated by platinum ions using a Surf Interface Anal. 2020;52:23–33.
coaxial arc plasma gun
HRTEM-EELS cross-sectional characterization of HOPG
substrate with platinum nanoparticles deposited using aDiamond & Related Materials 101 (2020) 107623
coaxial arc plasma gun

10Toshio Kawahara , Satarou Yamaguchi, Kenzo Maehashi1,
Robust Noise Modulation of Nonlinearity in Carbon
Yasuhide Ohno1, Kazuhiko Matsumoto1, and Tomoji
Nanotube Field-Effect Transistors
Kawai

11

Mineo HIRAMATSU, Hidetoshi NAGAO, Masaki
TANIGUCHI1, Hiroshi AMANO, Yoshinori ANDO andMasaru HORI

High-Rate Growth of Films of Dense, Aligned DoubleWalled Carbon Nanotubes Using Microwave PlasmaEnhanced Chemical Vapor Deposition

12y. zhao, h. nakano h. murakami, t. sugai, h. shinohara ,y.
saito

Controllable growth and characterization of isolated
single-walled carbon nanotubes catalyzed by Co particles
A silicon microcavity selective emitter with smoothsurfaces for thermophotovoltaic power generation

13

Coating

14

Combinatorial

1516ページ)

Journal of Crystal Growth 249 (2003) 78-86

59

巻Japanese Journal of Applied Physics 49 (2010) 02BD11
10.1143/JJAP.49.02BD11
Japanese Journal of Applied Physics Vol. 44, No. 22, 2005, pp. L 693–L 69510.1143/JJAP.44.L693
Appl. Phys. A (2006) DOI: 10.1007/s00339-006-3678-x

J. Micromech. Microeng. 20 (2010) 104006 (7pp) doi:10.1088/09601317/20/10/104006
Japanese Journal of Applied Physics Vol. 45, No. 4A, 2006, pp. 2708
Seiichi HATA , Ryusuke YAMAUCHI, Junpei SAKURAI
Combinatorial Arc Plasma Deposition of Thin Films–2713
and Akira SHIMOKOHBE
10.1143/JJAP.45.2708
Japanese Journal of Applied Physics Vol. 45, No. 7, 2006, pp. 5911–Ryusuke YAMAUCHI , Seiichi HATA1, Junpei SAKURAI Combinatorial Search for Low Resistivity Pd–Cu–Si Thin
5919
and Akira SHIMOKOHBE
Film Metallic Glass Compositions
10.1143/JJAP.45.5911
Japanese Journal of Applied Physics Vol. 46, No. 4A, 2007, pp. 1590
Junpei SAKURAI , Seiichi HATA1, Ryusuke
Searching for Novel Ru-Based Thin Film Metallic Glass–1595
YAMAUCHI, and Akira SHIMOKOHBE
by Combinatorial Arc Plasma Deposition
10.1143/JJAP.46.1590
Daizen Kirikae, Yuji Suzuki1 and Nobuhide Kasagi

17Seiichi Hata, Junpei Sakurai, Ryusuke Yamauchi andAkira Shimokohbe

18

秦 誠一，藤田敏充，桜井淳平，下河辺明

19

Dye sensitizing

20

Exhaust gas catalyst

2122
23

Search for Novel Amorphous Alloys with High
Crystallization Temperature by Combinatorial Arc Plasma Applied Surface Science, 254, [3], 738-742 (2007)
Deposition
単一アークプラズマガンを用いたコンビナトリアル
蒸着法

Transparent conductive oxide layer-less dye-sensitized
APPLIED PHYSICS LETTERS 94, 093301 2009
solar cells consisting of floating electrode with gradient10.1063/1.3089845
TiOx blocking layer"
Satoshi Hinokuma, Noriko Yamashita, Yasuo Katsuhara, CO oxidation activity of thermally stable Fe–Cu/ CeO2
Catal. Sci. Technol., 2015, 5, 3945
Hayato Kogamia and Masato Machidacatalysts prepared by dual-mode arc-plasma process
10.1039/c5cy00370a
Satoshi Hinokuma, Satoshi Misumi, Hiroshi Yoshidab and Nanoparticle catalyst preparation using pulsed arc plasma Cite this: Catal. Sci. Technol., 2015, 5, 4249
Masato Machidadeposition
10.1039/c5cy00636h
Satoshi Hinokuma, Hiroaki Fujii, Yasuo Katsuhara, Keita Effect of thermal ageing on the structure and catalytic
Catal. Sci. Technol., 2014, 4, 2990
Ikeue and Masato Machidaactivity of Pd/CeO2 prepared using arc-plasma process
10.1039/c4cy00291a
Satoshi Hinokuma, Yasuo Katsuhara, Eriko Ando, Keita
Pd Fe/CeO2 bimetal catalysts prepared by dual arc-plasma Catalysis Today 201 (2013) 92– 97
Ikeue, Masato Machidadeposition
10.1016/j.cattod.2012.03.063
Yoshikazu Yoshida, Shyam S. Pandey, Kenshiro Uzaki,
Shuzi Hayase, Mitsuru Kono, and Yoshihiro Yamaguchi

Satoshi Hinokuma, MadokaOkamoto, ErikoAndo, Keita
Ikeue, Masato Machid

Structure and catalytic property of supported rhodium
catalysts prepared using arc-plasma

Satoshi Misumi, Hiroshi Yoshida, Satoshi Hinokuma,
Tetsuya Sato & Masato Machida
Satoshi Hinokuma , Hayato Kogami , Noriko Yamashita ,Yasuo Katsuhara , Keita Ikeue , Masato Machida
S. Hinokuma, K. Murakami, K. Uemura, M. Matsuda, K.
Ikeue, N. Tsukahara, M. Machida

A nanometric Rh overlayer on a metal foil surface as ahighly efficient three-way catalyst
Subnano-particle Ce catalyst prepared by pulsed arcplasma process
Arc Plasma Processing of Pt and Pd Catalysts Supported
on c-Al2O3 Powders

28

芳 田

金属薄膜型三元触媒の研究開発

29

日隈 聡士

242526273031323334353637

Fuel cell

材料， 58,[10]，821-826 (2009)

嘉志, 町田 正人

Catalysis Today xxx (2011) xxx–xxx
10.1016/j.cattod.2011.03.008
10.1038/srep29737
Catalysis Communications 54 (2014) 81–85
10.1016/j.catcom.2014.05.025
Top Catal (2009) 52:2108–2111
10.1007/s11244-009-9387-x
触媒Vol. 61 No. 6

2019 p341-345

触媒 Vol. 58 No. 3 2016 p127-129
アークプラズマ法を用いる高分散担持触媒の設計
Pt-Ni Nanoparticle-Stacking Thin Film: Highly Active
ACS Catal. 2015, 5, 2209-2212
Naoto Todoroki,* Takashi Kato, Takehiro Hayashi,Electrocatalysts for Oxygen Reduction Reaction
10.1021/acscatal.5b00065
Shuntaro Takahashi, and Toshimasa Wadayama
Dealloying of Nitrogen-Introduced Pt-Co Alloy
DOI: 10.1021/acsomega.6b00412
Shuntaro Takahashi, Naoki Takahashi, Naoto Todoroki,
Nanoparticles:Preferential Core-Shell Formation withACS Omega 2016, 1, 1247-1252
and Toshimasa Wadayama
Enhanced Activity for Oxygen Reduction Reaction
Naoto Todoroki , Shuntaro Takahashi, Kotaro Kawaguchi, Dry synthesis of single-nanometer-scale PtSi fine particles Journal of Electroanalytical Chemistry 876 (2020) 114492
for electrocatalysis
Yusuke Fugane and Toshimasa Wadayama
Phys.Chem.Chem.Phys.,2015, 17, 18638 DOI: 10.1039/c5cp02048d
Shuntaro Takahashi,* Hiroshi Chiba, Takashi Kato, Shota Oxygen reduction reaction activity and structuralEndo, Takehiro Hayashi, Naoto Todoroki and Toshimasa stability of Pt–Au nanoparticles prepared byarc-plasma deposition
Wadayama
Ligand-effect-induced Oxygen Reduction Reaction
ACS Applied Energy Materials, 2 (2019) 4597-4601.
K. Daisuke, S. Kaneko, R. Myochi, Y. Chida, N.
Activity Enhancement for Pt/Zr/Pt(111) Surfaces with
DOI:10.1021/acsaem.9b00873
Todoroki, T. Tanabe, T. Wadayama
Tensile Strain Relieved by Stacking Faults
Effective surface termination with Au on PtCo@Pt core- Journal of Electroanalytical Chemistry 876 (2020) 114492 Volume
Shuntaro Takahashi , Naoto Todoroki , Rikiya Myochi ,842, 1 June 2019, Pages 1-7
Tetsuro Nagao , Noboru Taguchi , Tsutomu Ioroi , Felix E. shell nanoparticle: Microstructural investigations andFeiten , Yuki Wakisaka , Kiyotaka Asakura , Oki Sekizawa oxygen reduction reaction properties, Tomohiro Sakata , Kotaro Higashi , Tomoya Uruga ,Yasuhiro Iwasawa , Toshimasa Wadayama
Oxygen Reduction Reaction Activity of Nano-Flake
Electrocatalysis, 10 (2019) 232-242. DOI: 10.1007/s12678-019N. Todoroki, R. Sasakawa, K. Kusunoki, T. Wadayama
Carbon-Deposited Pt75Ni25(111) Surfaces
00517-6
燃料電池, 18, 2018, pp. 73-79.
金子聡真, 妙智力也, 渡邉裕文, 番土陽平, 高橋俊太郎, 歪み制御した単結晶Ptシェルの酸素還元反応活性https://www.fcdic.com/pdf/toukouronbun/toukou24.pdf
轟直人, 田邉匡生, 和田山智正

3940

41

42

43

4445

Gold catalyst

Tadahiro Fujitani,* Isao Nakamura, Tomoki Akita,
Mitsutaka Okumura, and Masatake Haruta

46
47

Graphene layer growth catalyst

48

Hydrogen peroxide solution

49

Magnetic thin film

50
51

Oxidation process

52

53

Photo catalyst

54

55

Ultrahigh Vacuum Synthesis of Strain-Controlled Model The Journal of the Physical Chemistry Letters, 8, 2017, pp. 5360Pt(111)-Shell Layers: Surface Strain and Oxygen5365. http://dx.doi.org/10.1021/acs.jpclett.7b02525
Reduction Reaction Activity
2D Platinum Network ORR Catalyst on Carbon andECS Transactions, 64 (3) 181-189 (2014)
C. Xu1, J. Yang, B. L. Pence, K. Gath1, P. Pietrasz, M.
Niobium Oxide Hybrid Support
10.1149/06403.0181ecst
Sulek, K. Sun, E. Sohm, G. Meng
Physical vapor deposition process for engineering Pt based Journal of Power Sources 451 (2020) 227709 journal homepage:
Chunchuan Xu , Jun Yang , Ershuai Liu , Qingying Jia ,www.elsevier.com/locate/jpowsour
Gabriel M. Veith , Gokul Nair ,Stephen DiPietro , Kai Sun oxygen reduction reaction catalysts on NbOx templated, Jixin Chen , P. Pietrasz , Zijie Lu , Mark Jagner , Kerrie carbon support
K. Gath ,Sanjeev Mukerjee , James R. Waldecker
Preparation of Pt/C Catalyst by Coaxial Arc Plasma
ECS Electrochemistry Letters, 4 (10) F57-F60 (2015)
Yoshiaki Agawa, Masayuki Kunimatsu, Takeshi Ito,
Deposition for Polymer Electrolyte Membrane Fuel Cells 10.1149/2.0091510eel
Yasutaka Kuwahara, and Hiromi Yamashita
Preparation of a platinum electrocatalyst bySci. Technol. Adv. Mater. 16 (2015) 024804 (7pp) doi:10.1088/1468Yoshiaki Agawa, Hiroyuki Tanaka, Shigemitsu Torisu,
6996/16/2/024804
Satoshi Endo, Akihiro Tsujimoto, Narishi Gonohe, Victor coaxial pulse arc plasma deposition
Malgras, Ali Aldalbahi, Saad M Alshehri, Yuichiro
Kamachi, Cuiling Li and Yusuke Yamauchi
Plasma-Devised Pt/C Model Electrodes for Understanding ACS Appl. Energy Mater., Just Accepted Manuscript • DOI:
Xiao Zhao, Yutaka Hamamura, Yusuke Yoshida, Takuma
Doubly Beneficial Roles of Nanoneedle-Carbon
10.1021/acsaem.0c00528
Kaneko, Takao Gunji, Shinobu Takao, Kotaro Higashi,
Morphology and Strong Pt-Carbon Interface in Oxygen
Tomoya Uruga, and Yasuhiro Iwasawa
Reduction Reaction
ナノ粒子形成パルスアークプラズマソースにより作製した 燃料電池 Vol.11, NO3. 2012
阿川 義昭, 遠藤 聡, 松浦正道, 石井 芳一
燃料電池用白金/カーボン触媒の評価
Mechanism and Active sites of the Oxidation of CO
Angew, Chem. Int. Ed. 2011, 50, 10144-10147 DOI:10, 1002/anie.
Tadahiro Fujitani and Isao Nakamura
Au/TiO2
201104694
S. Kaneko, R. Myochi, S. Takahashi, N. Todoroki, T.
Wadayama, and T. Tanabe

38

Thermoelectric element

Hydrogen Dissociation by Gold Clusters

Graphene layer growth on silicon substrates with nickel
film by pulse arc plasma deposition
Takeshi Ito ,, Masayuki Kunimatsu , Satoru Kaneko, Yasuo High performance ofhydrogenperoxidedetectionusing Pt
Hirabayashi, Masayasu Soga, Yoshiaki Agawa, Koji
nanoparticles dispersedcarbonelectrodepreparedbypulsed
Suzukiarc plasma deposition
M. Nakano, M. Sahara,a K. Yamawaki, T. Yanai, and H. Magnetic properties of Nd–Fe–B thick film magnets
Fukunaga
prepared by using arc deposition
Masaki Nakano, Tomoaki Tsutsumi, Takeshi Yanai, andNanocomposite Nd-Fe-B/α-Fe Thick-Film Magnets
Hirotoshi Fukunaga
Prepared by Vacuum Arc Deposition
K. Fujita, K. Banno, H. R. Aryal, and T. Egawa

Kamran Qadir,†,§ Sang Hoon Kim,‡,§ Sun Mi Kim,†Heonphil Ha,‡ and Jeong Young Park

Support Effect of Arc Plasma Deposited Pt
Nanoparticles/TiO2 Substrate on Catalytic Activity of COOxidation

Sang Hoon Kima,1, Chan-Ho Jungb,c,1, Nruparaj Sahub,c,Catalytic activity of Au/TiO2 and Pt/TiO2 nanocatalysts
Dahee Parkb,c, Jung Yeul Yund, Heonphil Haa, Jeong
prepared with arc plasma deposition under CO oxidation
Young Parkb
Improved Inactivation Effect of Bacteria: Fabrication ofH. Oveisi, S. Rahighi, X. J., Y. Agawa, A. Beitollahi, S.
Mesoporous Anatase Films with Fine Ag Nanoparticles
Wakatsuki, and Y. Yamauchi
Prepared by Coaxial Vacuum Arc Deposition
Fabrication of CuInS2 Photocathodes on Carbon
Hiroya Homura, Osamu Tomita, Masanobu Higashi andMicrofiber Felt by Arc Plasma Deposition for EfficientRyu Abe
Water Splitting Under Visible LightFabrication by Coaxial-Type Vacuum Arc Evaporation
M. UCHINO, K. KATO, H. HAGINO, and K. MIYAZAKI Method and Characterization of Bismuth Telluride Thin
FilmsAngew. Chem. Int. Ed. 2009, 48, 9515 –9518
10.1002/anie.200905380
APPLIED PHYSICS LETTERS 101, 163109 (2012)10.1063/1.4761474
Talanta 99(2012)865–870
10.1016/j.talanta.2012.07.048
JOURNAL OF APPLIED PHYSICS 107, 09A744 201010.1063/1.3348233
IEEE TRANSACTIONS ON MAGNETICS, VOL. 50, NO. 11,
NOVEMBER 2014
J. Phys. Chem. C 2012, 116, 24054 -24059

Applied Catalysis A: General 454 (2013) 53– 58Chem. Lett. 2011, 40, 420422

doi:10.1246/cl.2011.420

DOI: 10.1039/C7SE00008A
Journal of ELECTRONIC MATERIALS, 2013 TMS
10.1007/s11664-012-2438-2

56

TiN film

57

Ultrananocrystalline Diamond/HydrogenatedAmorphous Carbon Composite Films

58

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60

61

62

63

64

65

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Hiroshi Kinoshita,, Shunsuke Yamamoto, Hideaki Yatanib, Synthesis of TiN thin film on diamond surface for ferrous Applied Surface Science 258 (2012) 3002– 3006
Tetsuo Nakaic, Nobuo Ohmae
metal contacts by a new atom beam method
10.1016/j.apsusc.2011.11.026
Structural and Physical Characteristics ofT. Yoshitake, Y. Nakagawa, A. Nagano, R. O., H.
Ultrananocrystalline Diamond/Hydrogenated Amorphous
Setoyama1, E. Kobayashi1, K. Sumitani1, Y. Agawa andJpn. J. Appl. Phys. 49 (2010) 015503
Carbon Composite Films Deposited Using a Coaxial ArcK. Nagayama
Plasma Gun
Boron-Induced Dramatically Enhanced Growth ofDiamond Grains in Nanocrystalline
Yu-ki Katamune, Shinya Ohmagari, and Tsuyoshi
Japanese Journal of Applied Physics 51 (2012) 078003
Diamond/Hydrogenated Amorphous Carbon
Yoshitake
DOI: 10.1143/JJAP.51.078003
Composite Films Deposited by Coaxial Arc Plasma
Deposition
Time-Resolved Spectroscopic Observation of Deposition
Kenji Hanada, Tsuyoshi Yoshitake, Takashi Nishiyama,
Processes of Ultrananocrystalline
Jpn. J. Appl. Phys. 49 (2010) 08JF09
DOI:and Kunihito Nagayama
Diamond/Amorphous Carbon Composite Films by Using a 10.1143/JJAP.49.08JF09
Coaxial Arc Plasma Gun
Heterojunction Diodes Comprising p-TypeYu¯ ki Katamune, Shinya Ohmagari, Sausan Al-Riyami,
Ultrananocrystalline Diamond Films
Jpn. J. Appl. Phys. 52 (2013) 065801
Seishi Takagi, Mahmoud Shaban, and Tsuyoshi Yoshitake Prepared by Coaxial Arc Plasma Deposition and n-Type
http://dx.doi.org/10.7567/JJAP.52.065801
Silicon Substrates
Si and Cr Doping Effects on Growth and Mechanical
Mohamed Egiza1, , Hiroshi Naragino, Aki Tominaga,
Properties of UltrananocrystallineDiamond/Amor- phous Joint Journal of Novel Carbon Resource Sciences & Green Asia
Kouki Murasawa, Hidenobu Gonda ,Masatoshi Sakurai,Carbon Composite Films Deposited on Cemented Carbide Strategy, Volume 03, Issue 01, pp. 32-36
TsuyoshiYoshitake
Substrates by CoaxialArc Plasma Deposition
Room-temperature hard coating of ultrananocrystalline
Hiroshi Naragino, Mohamed Egiza1, Aki Tominaga1, Koki
diamond/nonhydrogenatedJapanese Journal of Applied Physics 55, 030302 (2016)
Murasawa, Hidenobu Gonda, Masatoshi Sakurai, andamorphous carbon composite films on tungsten carbide
http://doi.org/10.7567/JJAP.55.030302
Tsuyoshi Yoshitakeby coaxial arc plasma deposition
Hiroshi Naragino, Aki Tominaga, Kenji Hanada, andSynthesis method for ultrananocrystalline diamondApplied Physics Express 8, 075101 (2015)
Tsuyoshi Yoshitakein powder employing a coaxial arc plasma gun
http://dx.doi.org/10.7567/APEX.8.075101
Optical emission spectroscopy of deposition process ofKenji Hanada , Takashi Nishiyama , Tsuyoshi Yoshitake, ultrananocrystalline 2 diamond/hydrogenated amorphous Diamond & Related Materials 101 (2020) 107623
Kunihito Nagayama
carbon composite films by using 3 a coaxial arc plasma
doi:10.1016/j.diamond.2010.02.019
gunKenji Hanada • Tomohiro Yoshida • You Nakagawa •Hardness and modulus of ultrananocrystalline diamond/Hiroki Gima • Aki Tominaga • Masaaki Hirakawa •Appl. Phys. A (2006)
DOI:
hydrogenated amorphous carbon composite films prepared
Yoshiaki Agawa • Takeharu Sugiyama • Tsuyoshi
10.1007/s00339-006-3678-x
by coaxial arc plasma deposition
YoshitakeVacuum Arc Deposition of Homogeneous Amorphous
New Diamond and Frontier Carbon Technology Vol.16, No.5 2006
Mutsumi Horikoshi and Atsushi Hirata
carbon films at High Growth Rate.
p267-277
阿川 義昭,
吉武 剛

松浦正道,

遠藤聡,

石井 芳一,

同軸型アークプラズマガンによる超ナノ微結晶ダイヤモンド（UNCD）の成膜と応用

月刊トライポロジ

2010.4 p64-65