25th	  Jun	  2015	  (Thu.)
9:55 -­‐ 10:00 Opening	  Remarks

TypeH.	  Yurimoto	  	  (Hokkaido	  Univ.,	  SISS-­‐17,	  Japan)

10:00 -­‐

10:40 Fundamentaｌ,	  SpuJering

Tutorial,	  Review	  &	  Plennary

A.	  Wucher	  	  (Universität	  Duisburg-­‐Essen,	  Germany)

10:40 -­‐

11:10 Fundamentaｌ,	  SpuJering

InvitedL.	  Houssiau	  	  (University	  of	  Namur,	  Belgique)11:10 -­‐

11:40 Fundamentaｌ,	  SpuJering

InvitedLi	  Yang	  	  (Xi’an	  Jiaotong	  Liverpool	  University,	  China)

11:40 -­‐
12:10 -­‐

12:10 Fundamentaｌ,	  SpuJering
13:00 Lunch

InvitedLuchK.	  Kimura	  	  (Kyoto	  University.,	  Japan)

13:00 -­‐

13:30 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

InvitedK.	  Nishikawa	  	  (Toyota	  Central	  R&D	  Labs.,	  Inc.,	  Japan)

13:30 -­‐

14:00 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

InvitedC.	  Magee	  	  (Evans	  Analybcal	  Group,	  Inc.,	  USA)

14:00 -­‐

14:20 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

Oral

J.	  Sameshima (Toray	  Research	  Center	  Inc.,	  Japan)

14:20 -­‐

14:40 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

Oral

14:40 -­‐

15:00 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

Oral

15:00 -­‐

15:20 Inorganic	  	  (Aid	  for	  Power	  &	  Photo	  Electronics)

Oral

15:20 -­‐
15:35 -­‐
15:55 -­‐
16:15 -­‐
16:35 -­‐
16:55 -­‐
17:25 -­‐
18:55 -­‐

15:35 Coﬀee	  Break
15:55 Maker
16:15 Maker
16:35 Maker
16:55 Maker
17:25 Short	  presentabon
18:55 Poster
20:30 Recepbon

Coﬀee	  Break
Oral
Oral
Oral
Oral
Short	  Presentabon
Poser
Recepbon

26th	  Jun	  2015	  (Fri.)
9:00 -­‐ 9:30 Organic	  &	  Bio-­‐Medical	  	  1Invited

9:30 -­‐

9:50 Organic	  &	  Bio-­‐Medical	  	  1Oral

9:50 -­‐

10:20 Organic	  &	  Bio-­‐Medical	  	  1Invited

10:20 -­‐

10:50 Organic	  &	  Bio-­‐Medical	  	  1Invited10:50 -­‐
11:05 -­‐
11:35 -­‐

11:05 Coﬀee	  Break
11:35 Organic	  &	  Bio-­‐Medical	  	  211:55 Organic	  &	  Bio-­‐Medical	  	  2Coﬀee	  BreakInvitedOral

11:55 -­‐

12:25 Organic	  &	  Bio-­‐Medical	  	  2Invited12:25 -­‐
13:15 -­‐
13:45 -­‐
14:05 -­‐
14:25 -­‐
14:45 -­‐
15:00 -­‐

13:15 Lunch
13:45 Organic	  &	  Bio-­‐Medical	  	  （Sensibvity	  using	  Cluster	  Ion）
14:05 Organic	  &	  Bio-­‐Medical	  	  （Sensibvity	  using	  Cluster	  Ion）
14:25 Organic	  &	  Bio-­‐Medical	  	  （Sensibvity	  using	  Cluster	  Ion）
14:45 Organic	  &	  Bio-­‐Medical	  	  （Sensibvity	  using	  Cluster	  Ion）
15:00 Coﬀee	  Break
15:20 SIMS	  Related	  Technique

LuchInvited
Oral
Oral
Oral
Coﬀee	  BreakOral

15:20 -­‐

15:50 SIMS	  Related	  Technique

Invited

15:50 -­‐

16:20 SIMS	  Related	  Technique

Invited

16:20 -­‐

16:40 SIMS	  Related	  TechniqueOral

16:40 -­‐

17:10 SIMS	  Related	  Technique

Invited17:10 -­‐
17:30 -­‐

17:30 SIMS	  Related	  Technique
17:50 SIMS	  Related	  Technique

Oral
Oral

H.	  Téllez	  (Kyushu	  University,	  Japan	  /	  Imperial
College	  London,	  UK)T.	  Asakawa	  	  （Seiko	  Epson,	  Japan）
Chunli	  Dai	  (Shenyang	  Nabonal	  Laboratory	  forMaterials	  Science,	  Insbtute	  of	  Metal	  Research,
Chinese	  Academy	  of	  Science)
Ty	  Prosa	  (AMETEK-­‐CAMECA)
T.	  Miyayama	  	  (ULVAC-­‐PHI,	  Inc.,	  Japan)
T.	  Ishikawa	  	  (TOYAMA	  CO.	  LTD.,	  Japan)
T.	  Grehl	  	  (ION-­‐TOF	  GmbH,	  Germany)

D.	  Miura	  	  (Kyushu	  University,	  Japan)
N.Masaki	  (Hamamatsu	  University	  School	  ofMedicine,	  Japan)M.	  Kraj	  	  University	  of	  Illinois,	  USA)
P.	  Sjövall	  	  (SP	  Technical	  Research	  Insbtute	  ofSweden,	  Sweden)
B.	  Hagenhoﬀ	  	  (Tascon	  GmbH,	  Germany)
H.	  Noda	  	  (FUJIFILM	  Corporabon,	  Japan)
F.	  Inagaki	  	  (Japan	  Agency	  for	  Marine-­‐Earth	  Science
and	  Technology	  (JAMSTEC),	  Japan)
N.	  Lockyer	  	  (The	  University	  of	  Manchester,	  UK)K.	  Moritani	  	  (University	  of	  Hyogo,	  Japan)
M.	  Fujii	  	  (Kyoto	  University,	  Japan)
Y.	  Yokoyama	  	  (Seikei	  University,	  Japan)
M.	  Kusakari	  	  (Kyoto	  University	  Japan)
Sung-­‐Kyu	  Kim	  	  (NINT(Nabonal	  Insbtute	  forNanomaterials	  Technology),	  POSTECH,	  Korea)
K.	  Nishida	  	  （CRIEP,	  Japan)
M.	  Taniguchi	  	  (Kanazawa	  Insbtute	  of	  Technology,Japan)
H.	  Brongersma	  	  (Eindgoven	  Univesity	  /	  ION-­‐TOF
GmbH	  /	  Tascon	  GmbH,	  Netherlands)
T.	  Grehl	  	  (ION-­‐TOF	  GmbH,	  Germany)
J.	  Druce (Kyusyu	  University,	  Japan)