Complete Purification Solutions with

NANOCHEM® Purifiers
Since 1985, MATHESON NANOCHEM® purifiers haveprovided unprecedented purification solutions to theelectronic industry. NANOCHEM® purifiers were thefirst point-of-use purifiers to deliver up to nine 9’s
purity gas to the semiconductor industry. Today,
NANOCHEM® purifiers offer comprehensive solutions
for the source, point-of-use, bulk and proximate
purification requirements of specialty gas users.
NANOCHEM® purifiers combine gas-specificpurification media and ultra-high purity hardware in
one system to eliminate impurities caused by:• Upstream leaks• Improper cylinder change-outs• Increasing impurity concentration during gas
cylinder depletion• Gas system component contamination• Virtual leaks from component / piping"dead pockets" and soft seats
NANOCHEM® purifiers offer the highest lifetimes
and the best efficiencies for impurity removal.
NANOCHEM® purifiers are available for:• Silicon-source gases• Nitride gases• Etchants• Purge gases• Dopant gases• Carrier gases
Oxygen, moisture and other contaminants are
removed to < 100 ppt (parts per trillion) and arelimited only by the detection limits of evenstate-of-the-art analytical instrumentation.
Compact and easy to use, NANOCHEM® purifiers canbe installed within the gas cabinet or at the process
tool. Most purifiers require no heating or cooling andare capable of handling a broad range of flows andpressures.
MATHESON has one of the most extensive, in-houseevaluation laboratories in the industry to assess thequality of gas system components. The benefit is thatcomponents selected for NANOCHEM® purification
products are of the highest quality available. "Livegas" testing is done to ensure purifiers meet or
exceed performance specifications in the specificprocess gas for which they are marketed.

Purification Performance Benefits &Applications
NANOCHEM® purifiers offer a number of benefits,
such as reduced equipment downtime andprotection against fluctuations in gas supply quality
and upstream system upsets. Typical performance
benefits for the semiconductor / compound
semiconductor industry are:
• Increased carrier concentration, increased
mobility• Faster crystal growth rates• Improved uniformity of surface
morphology• Fewer defects in epi layers and substrates• Longer equipment life & reduced
component corrosion
Semiconductor applications include manufacture of
ICs and high brightness LEDs. Welding applications
include piping for semiconductor fabs,
manufacture of aerospace components, andmanufacture of process equipment for chemicaland biotech industries.

Gas Specific Purification
NANOCHEM® purification media have long been theindustry standards for purifying inert gases, such as
nitrogen, argon, and sulfur hexafluoride, as well asreactive gases, such as hydrogen, hydrocarbons, andhydride gases (including ammonia, silane, arsine andphosphine). Applications include biotech, chemical

processing, aerospace, analytical, petroleum refining, andsemiconductor / compound semiconductor processes,
including low temperature SiGe Epi, SiN and GaN MOCVD
processes. Over twelve (12) different purification media
are available to purify about 40 different gases.

NANOCHEM® Media -- Gases Purified & Specifications
GASES
PURIFIED
InertsNitrogen
Argon
HeliumXenon
KryptonNeon

CHEMICAL PURIFICATIONFORMULAMEDIUM

N2
Ar
He
Xe
Kr
Ne

Flammables - Partial List
MethaneEthaneCyclopropane
PropaneButaneHydrogen
Deuterium

CH4
C2H6
C3H6
C3H8
C4H10

H2
D2

EFFICIENCYEND POINT
DETECTION

H2O, O2, CO2,
THC except CH4
Halocarbons except CF4
CO at Low Flow
Hydrocarbons
High surface area inorganic medium
except CH4
Halocarbons except CF4
Reactive agents on an inorganic support H2O, O2, CO, CO2
THC except CH4
Halocarbons< 100 ppt, LDL

DC only< 1 ppb< 100 ppt, LDL

Not available< 100 ppt, LDL

DC only

H2O, O2, CO2,
THC except CH4
Halocarbons except CF4
CO at Low FlowOMX™
H2O, O2, CO2
Reactive agents on a polymeric support
CO at Low FlowOMX-Plus™ Reactive agents on a polymeric support
H2O, O2, CO2,
THC except CH4
w/inorganic agent for NMHC removal
Halocarbons except CF4
CO at Low Flow
HCX™
Hydrocarbons
High surface area inorganic medium
except CH4,
Halocarbons except CF4
In2Go™
Reactive agents on an inorganic support H2O, O2, CO, CO2
THC except CH4
Halocarbons< 100 ppt, LDL

DC only{

OMX-Plus™

{

OMX-Plus™

{

HCX™

In2Go™

PURIFICATION MEDIUMDESCRIPTION

IMPURITIESREMOVED

Reactive agents on a polymeric support
w/ inorganic agent for NMHC removal

Reactive agents on a polymeric support
w/inorganic agent for NMHC removal< 1 ppb< 100 ppt, LDL< 1 ppb< 100 ppt, LDL

DC only
DC only< 1 ppb< 100 ppt, LDL

Not available< 100 ppt, LDL

DC only< 100 ppt, LDL

DC only

Please contact customer service for other flammables, that can be purified.

Halocarbons - Partial List
Carbon Tetrafluoride

CF4

OMX-Plus™

Reactive agents on a polymeric support
w/inorganic agent for NMHC removal

Hexafluoroethane

C 2F 6OMX™

Reactive agents on a polymeric support

Perfluoropropane

C 3F 8OMX™

Reactive agents on a polymeric support

Please contact customer service for other halocarbons, that can be purified.

ppb = Part per billion
ppt = Part per trillion
THC = Total Hydrocarbons
LDL = Lower Limit of Detection by state-of-the-art analytical instrumentation.
Please contact customer service for other gases not included in this list

2

H2O, O2, CO2,
THC except CH4 &Other Halocarbons
CO at Low Flow
H2O, O2, CO2
CO
H2O, O2, CO2< 1 ppb< 100 ppt, LDL< 1 ppb< 100 ppt, LDL

DC only
DC onlyNANOCHEM® Media -- Gases Purified & Specifications (continued)
GASES
PURIFIED
HydridesAmmonia

CHEMICAL PURIFICATIONFORMULAMEDIUMNH3{

PURIFICATION MEDIUMDESCRIPTION

In2Go™

Reactive agents on an inorganic support

OMA™

Reactive agents on a polymeric support

SilaneSiH4Reactive agents on a polymeric support
OMX™
ArsineAsH3High surface area inorganic medium
ASX-II™
Phosphine
PH3
Reactive agents on an inorganic support
PHX™
Germane
GeH3
Desicore™ Reactive agents on an inorganic support
Hydride/Inert Mixes (N2, Ar, He, Xe, Kr, Ne, & H2)
1-10% Arsine
AsH3
OMX™
Reactive agents on a polymeric support
1-10% Germane
GeH4
1-10% Phosphine
PH3
Corrosives
Boron Trichloride
BCl3
Chlorine
Cl2
Silicon Tetrachloride
SiCl4
High purity high surface area inorganic
Trichlorosilane
SiHCl3
Metal-X™
mediumDichlorosilane
SiH2Cl2
Hydrogen Bromide
HBr
Hydrogen Chloride
HCl
Hydrogen Fluoride
HF
CleanCorr™
High high surface area inorganic
mediumOthersCarbon Monoxide
CO
Metal-X™ High purity high surface area inorganic
Nitric OxideNO
mediumOPX™
High surface area inorganic medium
Carbon Dioxide
CO2
HCX™
High surface area inorganic medium
Nitrous Oxide
N2O
OxygenDimethyl Ether
Sulfur Hexafluoride
Acetylene

O2(CH3)2O
SF6
C2H2

{

IMPURITIESREMOVEDEFFICIENCY< 10 ppb, LDL
H2O< 11 ppb, LDL
CO2< 5 ppb, LDL
O2< 1 ppb, LDL
GeH4< 1 ppb, LDL
SiH4< 40 ppb, LDL
TEOS< 100 ppt, LDL
H2O, O2, CO2 in inert
gas< 10 ppb, LDL
H2O in ammonia< 100 ppt, LDL
H2O, O2, CO2, CO< 75 ppb H2O in AsH3, LDL< 33 ppb H2O in PH3, LDL< 5 ppb H2O in GeH3, LDL
H2O, O2, CO2< 1 ppb

END POINT
DETECTION

DC only

DC only

DC only
Not available
Not available
Not available
Not available

H2O < 100 ppb, LDL
Volatile Metals-Fe, Mo, Cr, Ti, Ni, Mn

Not available

H2O < 2 ppm, LDL

Not available

H2O < 100 ppb, LDL
Volatile Metals-Fe, Mo, Cr, Ti, Ni, Mn
H2O< 10 ppb
Hydrocarbons< 100 ppt, LDL
except CH4
Halocarbons except CF4
H2O< 10 ppb
OPX
High surface area inorganic medium
H2O, O2, CO2< 100 ppt, LDLOMX™
Reactive agents on a polymeric support
H2O, O2< 10 ppb, LDLOMS™
Reactive agents on a polymeric support
H2O< 1 ppm, LDL
AcetyClean™
High high surface area inorganic
mediumNot available
Not available
Not available

Not available
DC only
DC only
Not available

ppm = Part per million
ppb = Part per billion
ppt = Part per trillion
THC = Total Hydrocarbons
LDL = Lower Limit of Detection by state-of-the-art analytical instrumentation.
Please contact customer service for other gases not included in this list
NOTE: Shown above are specifications for impurities removed by NANOCHEM® gas purification media. However, individual
media may remove many other impurities, not listed above. For example, NANOCHEM® OMX™ and OMX-Plus™ will also remove
siloxanes, chlorosilanes, and disilane in silane service and Halocarbon 11, Halocarbon 12, Halocarbon 113 in dimethylether service.
CleanCorr™ may also remove hydrocarbons from hydrogen fluoride.

3

Purification Applications - Where to Use Purification

1. Purge gas purification ensures thatcylinder changes do not contaminate
the process lines and that the purest
purge gas is used.

2. Source gas purification of corrosive
gases ensures that cylinder moisturedoes not corrode the purge manifold,
distribution or process lines.

3. Proximate gas purification allows
economical purification with a single
source purifier for multi-tool
applications.

4. Point-of-connection gas purification
ensures process gas consistency forlarger flow applications.

5. Point-of-use gas purification
eliminates virtually all variables ofcontamination including gas jungle
variables. Typical location would bedirectly before the chamber or mass
flow controller.

6. Bulk gas purification offers
economical purification to a central areaor entire facility.

7. Replacement purifiers for
replacement of other brand purifiers,
previously installed.** Drop-In Replacement with identical dimensions

4

Purification Applications - Where to Use Purification

POINT-OF-USE Purification

MiniSentry™
• Up to 1 slpm (0.06 NM3/hr)• 3000 psig (20.8 MPa) rating• Diffusion barrier limits exposure to atmosphere during
installation

H-Series• Ultra-clean construction• Built-in 1-valve bypass• Up to 50 slpm (3 NM3/hr) with H-Series• Optional electronic endpoint detection• 150 psig (1.1 MPa) with end-point• 500 psig (3.5 MPa) without end-point

PuriFilter®
• Up to 3 slpm (0.18 NM3/hr)• 1000 psig (7 MPa) rating• Poppet valves limit exposure to atmosphere during
purifier installation• Poppet valves limit exposure to residual process gas
during purifier replacement

PROXIMATE Purification(Larger Flow than POU)

L-Series, J-Series• Up to 150 slpm (9 NM3/hr)• Inlet / outlet valves• Optional 3-valve Bypass• Optional electronic end-point detection• 150 psig (1.1 MPa) with end-point• 500 psig (3.5 MPa) without end-point• J-Series with Fujikin valves

A-Series• For 100% arsine & phosphine service• For use in ASM & Matheson Tri-Gas SideCar™
custom purification cabinet• Optional electronic endpoint detection• Up to 20 slpm (1.2 NM3/hr) in AsH3/PH3 service• Up to 60 psig (0.4 MPa) in AsH3/PH3 service• Up to 150 slpm (9 NM3/hr) in inert gas service• Up to 500 psig (3.5 MPa) in inert gas service• Competitor Drop-In Replacement Design

White Knight Series™
• Competitor Drop-In Replacement Design• Up to 1000 slpm (60 NM3/hr)• Up to 500 psig (3.5 MPa)
• Optional poppet valves• Optional inlet & outlet valves

NOTE: 0.003 µm particulate filter with 9-log retention
standard on most purifier models.
Optional on L-60, MS-Series.
5

BULK Purification

Megashield™ (MS-Series)• Up to 1000 slpm (60 NM3/hr)• Up to 150 psig (1.1 MPa) with end-point• Up to 350 psig (2.5 MPa) without end-point• Optional bypass manifold

HIGH PRESSURE Purification (Source)High Technology Welding

WeldAssure™ Series• Up to 50 slpm (100 cfh, 3 NM3/hr))• Up to 200 psig (1.5 MPa)
• Built-in 1-valve (4-Way valve) bypass• Check valve at outlet to protect canister media from
air intrusion when gas flow is stopped• Visual end-point detection• Field-replaceable canister• Inexpensive – Brass components & disposable
aluminum canister• Optional refillable stainless canister• Optional stainless components with stainless canister

CUSTOM Purification
HP-Series• For installation after cylinder CGA connection• Reduce manifold corrosion with corrosive gases• Up to 2,850 psig (19.7 MPa)
• Flow rates up to 50 slpm (3 NM3/hr)• Built-in 1-Valve Bypass

SideCar™
• Custom cabinet with A-Series H2, N2 and HCl purifiers• Designed for ASM America Epsilon and Polygon tools• Can be used as stand-alone cabinet• Optional NanoShield process protection system• Up to 100 psig (0.7 MPa)
• H2 and N2: Up to 150 slpm (9NM3/hr)• HCl: Up to 50 slpm (3 NM3/hr)

Specifications are subject to change. Please check www.mathesongas.com
for most current information.
NANOCHEM and Bloc Purifier are registered trademarks of Matheson Tri-Gas, Inc.
A-Series, H-Series, HP-Series, L-Series, WhiteKnight, MegaShield, MiniSentry, Purifilter, Doc, SideCar, NanoShield, WeldAssure, AcetyClean,
CleanCorr, OMX, OMX-Plus, OMA, OMS, ASX, ASX-II, HCX, PHX, OPX, In2Go, and Metal-X are trademarks of Matheson Tri-Gas, Inc.
Epsilon and Polygon are registered trademarks of ASM America, Inc., Phoenix, AZ

Equipment Technology Center
166 Keystone Drive
Montgomeryville, PA 18936
Tel: 800-828-4313 • Fax: 215-619-0458
Email: info@mathesongas.com
www.mathesongas.com
Printed in USA

PB-46 11/2021