• Rotational speed up to 12.000 rpm• Two rotational speed ramps• Programmable ramp duration: 3 s .. 600 s• Two rotational speed target values• Programmable dwell time: 3 s .. 600 s• Alphanumeric four-line display (20 characters/line)• 10 rotational speed sequences storable
in non-volatile memory• Display of remaining processing time
• Total process times: 12 s .. 40 minutes• Active vacuum suction of the sample• Film thickness range 10 nm to 10 µm• Easy-to-use and maintenance free design• Rotational platforms for substrates up to 90 mmdiameter

Novocontrol Technologies
GmbH & Co. KG
Aubachstr. 156410 Montabaur
Germany
Phone: +49 2602 9196690
Fax:+49 2602 91966933
e­mail: novo@novocontrol.de
web: http://www.novocontrol.de

SCC­200

Microprocessor­Controlled
Spin Coater SCC­200

NOVOCONTROLOur microprocessor-controlled spin coater SCC200 helps you prepare thin films easily within afew minutes. Films are produced on a substratethat is fixed to an exchangable rotational platformby a pump-generated underpressure.
Both circular and rectangular substrates up to 90
mm diameter can be placed on the rotational plat‐form (various sizes available, see the accessories
list).
The resulting film thickness merely depends on thesolid/solvent concentration, rotational speed, andtime.
The ergonomic design makes the SCC-200 spincoaters an efficient tool for the preparation of thinfilms of both organic and inorganic substances for

microscopic or spectroscopic investigations.
Spin coating using the SCC-200 neither requires
specific skills nor prior experience and is mainte‐
nance free.
During operation, a built-in digital four-line
display with 20 characters per line informs aboutthe rotation speed and the remaining ramp or dwelltimes for testing under reproducible conditions. It
also substantially facilititates the set-up of the spincoater. For the sake of reproducibility, 10 program‐ming sequences can be stored permanently in theSCC-200 non-volatile memory. These programmesconsist of two rotational speeds up to 200 rps(12.000 rpm), ramp times, and dwell times, respec‐tively. The latter may be varied over a wide range,i.e., between 3 s and 600 s, providing substantial
flexibility to the spin coating process with total
process times between 12 s and 40 minutes.
Operating and setting up the SCC-200 is easily
performed by single-knob control.
Using the SCC-200, thin and ultra thin layers ofextraordinary homogeneity are easily achieved.
As a high quality product, this spin coater comeswith 2 years guarantee.

SCC­200
Accessories for the SCC­200• Vacuum pump MVP with hose and quick coup‐ling (highly recommended)• VT-25p: rotational platform (plane chuck; Ø 25mm, for small and irregularly shaped subtrates)• VT-25pr6: VT-25p with inserted O-ring 6x1• VT-25pr20: VT-25p with inserted O-ring 20x1
• VT-25pr: VT-25p with inserted O-rings 6x1 and20x1• VT-30: rotational platform (Ø 30 mm)• VT-50: rotational platform (Ø 50 mm)• VT-70: rotational platform (Ø 70 mm)• VT-90: rotational platform (Ø 90 mm)
All rotational platforms are made of aluminium.
Regular platforms are equipped with small chan‐nels on their surface to ensure uniform pressure on
the substrate.
Plane platforms lack these channels; evacuation isperformed exclusively through the center hole.
This arrangement is better suited for small or irre‐
gularly shaped substrates that would leave majorparts of the channel structure uncovered.
The SCC-200 comes with a switching power sup‐ply and a VT-30 rotational platform.

Small Vaccum Pump MVP• Underpressure of −33,3 kPa• Flow of 7 litres/min• Max. 40 dB(A) noise• Note: exact appearance may vary.