250mm wide Seamless Roller Mold
Using Fast EB Lithography (rEBL) for R2R Process
More information about SRM : ped01-ml@aml.asahi-kasei.co.jp )Asahi Kasei corporation, Corporate Production Technology Div.

Large-area Seamless Roller Mold (SRM)㻌 㻌 㻌 with linewidth under 100nm

3. Exposure method for periodic pattern

1um

EBMask5um

Split beams(Patterned beams)

X-axisstep & repeat

5 PmRoller

Stageθ-axis
step & repeat<Dimensions of the roll are D:100[mm]/W:50[mm]>rEBL process can transfer the mask pattern to the roller surface at equal size.
With this technology, any pattern on a mask can be transferred to a rollsurface.

Line width 100nm
Pitch 200nm

4. Experimental result<Grid pattern , dimensions of the roll are D:100[mm]/W:50[mm]>Line width 50nm
Pitch 200nm

Line width 100nm
Pitch 200nm

Resist pattern after development

Mold pattern after post-process

1. Introduction

ResistZEP520A

Resist thickness

150 nmProbe current

2.0 uA

Acc. voltage

5.0 kV

Dimensions of roll

D100 mm / W50mm

Throughput

150 min

Exposure conditions

Many companies and institutes are developing flexible electronics devices
and optical devices. An important feature of flexible electronics is low cost,which is enabled through manufacturing by roll-to-roll (R2R) process.

䕕4um㽢P5um

Mold pattern after post-process
Exposedmask pattern
Rotational
direction

Gap errors

However, this R2R process requires a large-area seamless roller mold(SRM) which has not been easy to achieve. We have succeeded in thedevelopment to enable the achievement of such a SRM. This SRM‘sdiameter is 100 mm, and roller width is 50 mm. On our recent work, wehave succeeded to make 250mm wide SRM.

Gap errors variation compared with design value
We are making a big effort to achieve the higher resolution pattern(<100nm) and wider SRM for flexible electronics and R2R process.

5. Latest Workwe achieved to make 250mm-wide SRM

2. Process for SRM

Fabricating a Super
Smooth Surface Roller(S3R)

Exposure

CoatingDevelopment

Pre-baking

Post-Process

250mm-wide (left) and 50mm-wide (right) SRM
We have succeeded in fabricating the 250mm-wide SRM and several kindof patterns have exposed on the roller surface. The SRM can be used forthe future R2R process to manufacture PE products.

High Resolution R2R printing technology
for Flexible sensors using Large Area Seamless Roller Mold

More information about SRM : ped01-ml@aml.asahi-kasei.co.jp )Asahi Kasei corporation, Corporate Production Technology Div.

3. Imprinted and printed samples

1. Introduction
Many companies and institutes are developing flexible electronics devices
and optical devices. At Asahi Kasei, we have successfully commercializedproducts such as Wire Grid polarization Film, and we are accelerating thedevelopment of other films for flexible electronics.
ŘǼsŘŘǊ®ʹĵ®ʰË®ʴʺPhoto of seamless imprinted patterns on PET filmǢsŘǣŸǋǋǋɴrŘsǋ¶ɴÌǋɚsǣǼÞŘ¶< Imprinted and Printed samples >Image of Flexible sensor sheet
As you know ‘High resolution and seamed’ or ‘Low resolution and seamless’imprinted films are reported in some previous studies. However ‘Highresolution and seamless’ imprinted films are difficult to make because there
was not such a seamless roller mold. We have developed large area
seamless roller mold (SRM) using EB-Lithography and we have obtained‘High resolution and seamless’ imprinted films using SRM and roll-to-roll(R2R) equipment.

5 um

Mold pattern

Imprinted patternǢǊō

Mold pattern

125 um

Imprinted patternIm䡌rinted patterns using SRM (UV curable resign)

Image R2R PE process

Conductive
Material
PET

2. SRM and Pattern Variations
Large-area Seamless Roller Mold (SRM)㻌 㻌 㻌 㻌 㻌 㻌 㻌 with minimum line width under 100nm
we achieved to make 250mm-wide SRMˡˤ˟ŘŎɟÞ_ǼÌƻǋÞŘǼs_NŸŘ_ȖOǼÞɚsƼǼǼsǋŘŸŘƻrǻ
PrintedPi t d patterntt

Conductive
Material
PETˡ˟˟˟ƼƼÞǻ®ǻƼǼǼsǋŘʹˤ˟˟ŘŎOÌŘŘsĶʺŸŘƻrǻ
Printed pattern

Printed patterns using SRM (Silver nano ink)

4. Roadmap
Asahi Kasei has been producing optical films and various kind of electricdevices. We are going to produce further variety of products with R2R
processes.
Now we are developing to make SRM larger and finer. It will be needed torealize future products. Near future, we will be able to show you the detail ofa new SRM.

250mm-wide and 50mm-wide SRM<Patterning variation sample>
1um
5um

Line width 100nm
Pitch 200nm

Line width 50nm
Pitch 200nm

line and Space patterns

125 um
TFT-200ppi

TFT-2,000ppi

TFT electrodes pattern12.5 um