November 3, 2009
Cheiron School 2009

X-ray Beamline Design
Shunji Goto
SPring-8/JASRI
1

Table of contents
1.
2.
3.
4.
5.

6.
7.

Introduction
Light source
Monochromator
MirrorOthersPhase retarder
Spatial coherence
Front-end
Transport channel
Shielding hutch
Example of beamline
Summary2

Process of beamline construction
Scientific proposal
by user & facility

New beamline
Review & approval
by IAC,..

1. conceptual design
2. detailed design
3. construction

Support of budget& other resources
by government,..

4. utilization w/ output
Review

5. upgrade or,...

Beamline design is first step and crucial for success of the beamline !
Æ Fundamental of X-ray beamline; light source, monochromator, mirror,...

3

Beamline structure
Beamline = “Bridge” between light source & experimental station

Front-end

Light source
BendingmagnetExperimental
stationInsertion
deviceShielding
hutch

SR

Ring tunnel

Exp. hallÆ Transport and processing of photons
photon energy, energy resolution,
beam size, beam divergence, polarization,..
Optics & transportÆ Vacuumprotection of ring vacuum and beamline vacuum Monochromator, mirror
shutter, slit
Æ Radiation safety
4

Shielding and interlock

pump,..

Light sources & X-ray optics
Check points to be considered for your application:- White or monochromatic- Energy range- Energy resolution- Flux & flux density- Beam size at sample (micro beam?,...)- Beam divergence/convergence at sample (Resolution in k-space)- Higher order elimination w/ mirror- Polarization conversion- Spatial coherency....

Æ Light source, monochromator, mirror,
and other optical devices and components

5BL classification (energy region)
Photon energy (eV) ÆIR

Visible ~ UV~
100

Bendingmagnet

101

SX
102

103

HX
104

105

SAXS

Earth,..
HP/HT

XAFS

IR

Powder XRD
PX

Wiggler

Inelastic
SAXS

Undulator

PEEM
SX-PESSX-MCD

Inelastic
HX-PES

HP/HT
XRD
NRS
6

BL classification (energy resolution)
Energy resolution (ΔE/E) Æ
10-7

10-5

10-3

White

SAXS

XAFS

Single crystal
XRD

Earth,..
HP/HT

PX

BendingmagnetPowder XRD

Topograph

Imaging
Topograph
Inelastic

Wiggler
XAFS
Inelastic

Surface ・interface

XRF

Microbeam, imaging

Undulator

XMCD
NRS
HX-PES

SAXS
PX
HP/HT
XRD

7

Light sources
Bending magnet:
for wide energy range, continuous spectrum
for wide beam application for large samples

Undulator (major part of 3GLS beamline):for high-brilliance beam
for micro-/ nano-focusing beam

Wiggler:for higher energy X-rays > 100 keV.

Brilliance (ph/s/mm2/mrad2/0.1% B.W.)

Bending magnet or insertion devices ?

Æ short-period-length undulator
Power, brilliance, flux density, partial flux,..
can be calculated using code.
e.g. “SPECTRA” by T. Tanaka & H. Kitamura

1022
1020
1018
1016
1014
1012
100

101

102
103
104
Photon energy (eV)105

Brilliance for SPring-8 case8106

Monochromator
Key issues from experimental request:
White or monochromatic ? Æ monochromatic
Energy region Å Bragg’s law
Energy resolution Å Source divergence, Darwin width,..
Throughput Å related to energy resolution
Double-crystal monochromator for fixed-exit
Single-bounce monochromator is for limited caseHeat load Å depending on light source
9X-ray monochromator using perfect crystal
Æ Principle of monochromator
Bragg reflection from perfect single crystal
2d sinθB = nλd: Latiice (d)-spacing,θB: glancing angle (Bragg angle),
λ: X-ray wavelength

Photon energy (keV)

120

θ
d

dsinθ

Æ Crystal: silicon, diamond,..

dsinθ

e.g. for SPring-8 standard DCM

100

Bragg angle: 3~27°

Si 511 refl.

80

Si 311 refl.

60

Photon energy range:40- Crystal & lattice plane

20
0

θ

Si 111 refl.
0

5

10
15
20
Bragg angle (deg)2530- Bragg angle range

10

Reflectivity (intrinsic rocking curve)
Darwin curve (intrinsic rocking curve for monochromatic plane wave)
for Bragg case, no absorption, and thick crystal:

)

(

2

2
γ h Eh2R== W + W −1
γ 0 E0R =1(−1 ≤ W ≤ 1)(

R = W − W −12

Å Total reflection region)

2(W > 1)

1.2

For symmetric Bragg case, sigma polarization:

W = {Δθ sin 2θ BK + χ 0 r }1
Reflectivity(W < −1)

0.8

1

χ hr

Darwin width Æ ΔW= 2

0.6

ω=

0.4
0.2

2 χ hrsin 2θ BK∝ Fh

Crucial for energy resolution and throughput!

0
-5

-4

-3

-2

-1

0
W

1

2

3

4

5

11

Intrinsic rocking curve for silicon
For Bragg case, with absorption, and thick crystal:1
0.8

Si 333 refl.
30 keVSi 111 refl.
10 keV

Reflectivity

回折幅
0.6
0.4
0.2
0
-100

-50

0
Δθ (µrad)50

・Darwin width of 0.1～100 µrad
・Peak ~1 with small absorption

100

12

Source divergence and diffraction width
Natural divergence103- Bending magnet

FWHM (µrad)102

σ r ′ ≈ 0.597

Bending magnet
Undulator

101

1

γ

- Undulator

λ
1
∝
λc
hω

Si 111 refl.

σ r′ ≈

Si 311 refl.

100

λ
1
∝
2 Nλu
hω

Si 511 refl.

For SPring-8 case:

10-1
0

20

40

60

Photon energy (keV)

80

100

- Bending magnet
σ r ′ ≈ 60 μrad

- Undulator (N= 140)
σ r′ ≈ 5 μrad

Divergence of undulator radiation ~ diffraction width

13

Energy resolution
ΔE= cot θ B Ω 2 + ω 2
E

Ω: source divergence,
ω: diffraction widthφ
10-2Light source
distribution

BM & Si 311 refl.

10-3

Acceptanceby crystal

Resolution

Angle ÆAngle-energy diagram(DuMond diagram)

BM & Si 511 refl.

ΔE/E

Photon energy Æ

BM & Si 111 refl.

Undulator & Si 111 refl.

10-4

10-5
0

20

40

60

80

100

Photon energy (keV)

For usual beamline : ΔE/E=10-5～10-3

14

DuMond diagram: undulator ~DCM
SPring-8 standard undulatorφ(λu= 32 mm, N= 140, K= 1.34, E1st= 10 keV)
+ DCM (Si 111 refl.)

200

600

10 keV (1st)1000

30 keV (3rd)

50 keV (5th)0

ΔE (eV)ΔE (eV)ΔE (eV)

Intensity
distribution ofundulator
00

Acceptanceby crystal
-200

-600
-50

0
φ (μrad)

50

-1000
-50

0
φ (μrad)

50

-50

0
φ (μrad)Wider slit increases unused photons (power) on the monochromator ! 15

50

Acceptanceby crystal

Resolution

Slit width

Photon energy ÆLight source
distribution

Resolution

Angle ÆAngle Æ(A) Collimation using slit(B) Collimation using pre-optics
w/ collimation mirror, CRL,..
Photon energy Æ

Photon energy Æ

Photon energy Æ

Improvement of energy resolution

Resolution

Angle Æ(C) Additional crystal
w/ (+,+) setting

Resolution

Angle Æ(D) HR monochromator of
π/2 reflection (~meV)(B)~(D): restriction on photon energy

16

Photon flux after monochromator
Photon flux (throughput) after monochromator can be
estimated using effective band width:
Photon flux (ph/s) =Photon flux from light source (ph/s/0.1%bw)
x 1000

Photon energy Æ

x Effective band width of monochromator

Light source
distribution
Acceptanceby crystal

Effective
band width

Angle ÆThroughput is estimated by overlapped area.
Note difference from energy resolution.

17

Darwin width Æ energy widthStarting with Darwin width and neglecting anomalous scattering factor f’χ hr ∝ λ2 f 0 (d hkl )λ= ω cot θ B =2 χ hrsin 2θ B

cot θ Bχ hr
2 χ hr==4dhkl
λ sin 2 θ B
λ2

Δλ10 keV
30 keV

0.8

Reflectivity2

Δλ

1

0.6
1.4x10-4
0.4
0.2

Energy width:
Δλ
ΔE
2
=−
∝ d hkl f 0 (d hkl )E
λIndependent of photon energy

0
-5

-4

-3

-2

-1

0

ΔE/E

1

2

3

4

5

(x10-4)e.g. for Si 111 refl. DCM case
Note relative energy width is constant.
18

Effective band width (Integrated intensity)

χ hr⎛ ΔE ⎞
2
=
R
(
W
)
dW
⎜
⎟
2
∫
⎝ E ⎠ Eff 2 sin θ BK
= ~2

Effective band width

For double-crystal monochromator(x10-5)14
Si 111 refl.

12
10
8
6
4

Si 311 refl.

20

Si 511 refl., Si 333 refl.
0

20

40
60
Photon energy (keV)

80

100

Effective band-width is obtainedby integration of rocking curve.

When you need flux Æ Lower order (Si 111 refl.,..)
When you need resolution Æ Higher order (Si 311, Si 511 refl,..)19

Photon flux at bending magnet beamline
Photon flux density (ph/s/mA/mm2)

109

(a)
(b)

8

10

(a): SPring-8 bending magnet(c)(b): (a)×Double Pt mirror, 5 mrad

7

10

(d)

(c): (b)×0.75-mm-thick Be window(d): (c)×DCM (Si 111 refl.)

106
105
104
103

0

10

20

30

40

50

Photon energy (keV)

Example of photon flux estimation at bending magnet beamline
BL02B1. (Photon flux density at 50 m from the source)
20

Photon flux at undulator beamline
10

15
2

Flux (ph/s/100 mA)(a) Partial flux (/0.1%b.w./1x1 mm @30 m)
10

14

10

13

10

12

11

10

10

(b): (a) x Si 111 refl. x2

10

0

10

20

30

40

Photon energy (keV)

We can obtain photon flux of 1013～1014 ph/s/100 mA/mm2
using standard undulator sources and Si 111 reflections at
SPring-8 beamlines.

21

Double-crystal monochromator

Fixed-exit operation for usability at experimental station.
Choose suitable mechanism for energy range(Bragg angle range).
Precision, stability, rigidity,...

22θ1 + translation + θ2 computer link
2nd crystal

θ -stage

1st crystal

θ -stagehyTranslation stage

SPring-8 BL15XU
SPring-8 information Vol. 5, No.1 (2000)

h= 100 mm, θB= 5.7~72°(for lower energy range)
Large offset, long-stroke translation
Difficulty of adjustment between 1st and 2nd crystal

23θ + two translation (KEK-PF)

1st crystal

2nd crystal
O
Exit beam
θB
θB B

A
z

y

OffsethθBh= 25 mm, θB= 5~70°
Two cams for two translation-stages
PF BL-4C..
Matsushita et al., NIM A246 (1986)

Rotation center at 2nd crystal
24

SPring-8 standard DCM

Offset h= 30 mm

θB =3~27º for higher energy range
Yabashi et al., Proc. SPIE 3773, 2 (1999)

High-precision adjustment stages
for undulator beamline DCM
Sub-µm & sub-µrad control

25

Crystal cooling
Why crystal cooling？
Qin (Heat load by SR) = Qout (Cooling + Radiation,..)Æ with temperature rise ΔT
Æ αΔT = Δd (d-spacing change)
α: thermal expansion coefficientor Æ Δθ (bump of lattice due to heat load)
Miss-matching between 1st and 2nd crystals occurs:Æ Thermal drift, Loss of intensity, Broadening of beam, loss of brightness
Æ Melting or limit of thermal strain Æ Broken !
Qin

Radiation & convection
T1
Heat conduction in crystal

CrystalT0

熱伝達

Coolant/holder

Heat transfer
to coolant/holder
26

Solution for crystal cooling
We must consider:
Thermal expansion of crystal: α,Thermal conductivity in crystal: κ,
Heat transfer to coolant and crystal holder.
Solutions:(S-1) κ/α Æ Larger(S-2) Large contact area between crystal and coolant/holderÆ larger(S-3) Irradiation area Æ Larger, and power density Æ smaller27

Figure of merit
SiliconSiliconDiamond

300 K

80 K

300 K

κ (W/m/K) 150

1000

2000

α (1/K)-5x10-7

1x10-62000

2000

2.5x10-6

κ / α x106 60

Figure of merit of cooling:
Good for silicon (80 k) and diamond (300 K)
28

For SPring-8 case
Bending magnet beamline
Power and density : ~100 W, ~1 W/mm2 @40 m
Method:Æ Direct cooling with fin crystal

Å S-2

Undulator beamline(Linear undulator, N= 140, λu= 32 mm)
Power and density : ~500 W , ~500 W/mm2 @40 m
Methods:
Æ Direct cooling of silicon pin-post crystal+ Rotated inclined geometry (Æ10 W/mm2)
Æ or Cryogenic cooling using LN2 circulation
Æ or Indirect cooling of IIa diamond crystal

Å S-2
Å S-3
Å S-1
Å S-1
29

Crystal monochromator at SPring8
X-rays<Bending magnet beamline>
Power & power density:~100 W, ~1 W/mm2

O-ringFin crystal direct-cooling - (S2)Water flow

Si-Au-Sibondingb) Silicon cryogenic cooling - (S1)

<Undulator beamline>
Linear undulator, N= 140, λu= 32 mm
Power & power density: 300~500 W ,300~500 W/mm2a)Direct cooling of silicon pin-post
crystal – (S2) & (S3)0.2 mm 0.6 mmc) IIa diamond withindirect water cooling - (S1)

0.6 mm
0.5 mmWater flow30

Mirror- Higher harmonics rejection- Bent mirror for focusing/collimation- Figured mirror for micro~nanobeam

31

Mirror quality
Mirror quality must be considered.
Æ Micro-roughness- Reduction of reflectivity- Lower-energy shift of critical energy- Diffuse scattering
Optical (Zygo) range (<1 mm): ~ 0.3 nm rms or less
AFM range (<1 µm): ~ 1 nm rms or less
Æ Insufficient coating- Reduction of reflectivity- Lower-energy shift of critical energy
Should be ~100%Æ Slope error- Beam shape deformation- Wave-front distortion- Flux density loss
LTP range (<1 m): ~1 µrad or less32

Mirror reflectivity
Mirror reflectivity for sigma-polarization:k −k
R = iz tz exp( −2kiz ktzσ 2 )kiz + ktz
kiz =

2π

λ

cos θ , ktz =

2π

λ

2

n 2 − cos 2 θkiz, ktz: Normal components of incidence and transmitted wave vectors
n: complex index of refraction

θ: glancing angle
σ: high-spatial-frequency roughness (AFM region)

Surface roughness must be consideredaround critical energy (angle).
33

Effect of roughness
e.g. reflectivity of Pt mirror
s-polarization
Glancing angle: 3 mrad
Film thickness: 50 nm
1
Smooth surface w/ 100% density

Reflectivity

0.8
0.6

1 nm rms w/ 100% density

0.4

2 nm rms w/ 90% density

0.2
0
0

10

20

30

40

50

Photon energy (keV)34

Example of mirror reflectivity
1
0.8
Reflectivity

Rh, 2 mradPt, 2 mrad

0.6
0.4
Rh, 5 mrad

0.2

Pt, 5 mrad

0
0

10

20

30

40

50

60

Photon energy (keV)

Thickness 50 nm, roughness 1 nm
35

Material, glancing angle, length Material
Si, SiC for white radiation
SiO2, Glass,.. for monochromatic beam

 CoatingPt, Rh, Ni,...
Depending on energy, reflectivity, absorption edges,..

 Glancing angle
2~10 mrad (For SPring-8 X-ray beamline)
Depending on energy, reflectivity, absorption edges,..

 Mirror length
400 mm~1 m (For SPring-8 X-ray beamline)
Depending on the beam size and glancing angle
e.g. 100 µrad×50 m/5 mrad= 1 m
36

Focusing with mirror
For beam focusing or collimation, we need;elliptical mirror, ellipsoidal mirror, parabolic mirror, paraboloidal mirror,...
ÎWe can approximate by bending:flat Æ meridional cylinder,
sagittal cylinder Æ toroidal,...
R

r
p

q

q
p

Sagittal focusing
w/ sagittal cylinder

r=

2 pq
sin θ
p+q

Meridional focusing

2 pq
R=
w/ meridional cylinder( p + q ) sin θe.g.) θ= 5 mrad, p= 40 m, q= 10 m
r= 80 mm, R= 3.2 km※ When q→∞
We obtain parallel beam:r = 2 p sin θ
R = 2 p sin θ

37

SPring-8 standard mirror support
For SPring-8 X-ray beamline
 For undulator beamline
400-mm-long, vertical deflection, plane
700-mm-long, horizontal deflection, plane For bending magnet beamline

For 400-mm-long mirror,
Vertical deflection, w/ bender

1-m-long, vertical deflection,plane/cylindrical

Options
・Bender・Indirect water-cooling (side cooling)
For 1-m-long mirror,
vertical deflection,w/ bender, Indirect water-cooling38

Focusing with mirror
Beam size using meridional cylinder mirror:
0.5

Fcoma = 2.35ΣM

FFabrication = 2 × 2.35Δ fabrication Mp

[

2

]

Beam size (mm)0.4

3L2θ (1 − M 2 )Fspherical =16 pM

Ftotal = (Fcoma + Fspherical ) + F 2 fabricationcoma
spherical
slope error
Total

e.g.

Σ = 10 µm

0.3

L= 400 mm

Δfabrication = 3 µrad0.2

θ = 4 mrad

1/ 2

Σ: source size
M: magnification = q/p0.1

p = 40 m

0
0

0.1

0.2

0.3
0.4
Magnification

0.5

0.6

L: mirror lengthΔfabrication: slope error
θ: glancing angle
J. Susini, Opt. Eng. 34, 361 (1995)

For micro~nonofocusing, we needprecisely-polished and large NA
elliptical K-B mirror near exp. station.
39

Figured mirror for
micro~nanobeam

For micro~nonofocusing, we needprecisely-polished and large NA
elliptical K-B mirror near exp. station.

H. Mimura et al.,Appl. Phys. Lett. 90, 051903 (2007)40

Diffraction-limited focusing(a)Mirror
(b)
x
K0

w

θ

Kd

θ+φ
Oblique aperture

Estimation by oblique aperture modelÆ Angular spread due toFraunhofer diffraction
λλ
FWHM φ = 2.7831≈ 0.8858πw
L sin θÆ Spatial spread at q
FWHM X = 0.8858

λq
L sin θθave= 3 mrad
λ= 0.083 nm (E= 15 keV)
L= 45 mmq= 50 mm
Î FWHM = 27 nm

41Polarization conversion
Phase retarder is used to convert the polarization
for XMCD and other applications.
Horizontal polarization Æ right-/left-circular polarization
Horizontal polarization Æ vertical polarization...
Crystal: IIa diamond,..

42

Polarization conversion
σ-pol.
Perfect crystal

π-pol.

Diffracted x-rays

Right-circular pol.
Left-circular pol.

Linearly polarized
incident x-rays

Transmitted x-rays

Offset angle of crystal: θB±Δθ

K0

Crystalkh- σπ-pol.

K0

Kh

H

kh- π
h

σ-pol.

k0- σ
k0- π

O

Offset angle (-)

KhtCrystalkh- πKdπ-pol.
σ-pol.

H

kh- σ
k0- π
k0- σ

t
Kd

h

O

Offset angle (+)

43

Diamond phase plate system BL39XU
Diamond
Diamond crystal
crystalDiffracted
Diffracted beam
beam

X-rays
X-rays fromfrom DCM
DCM

Transmitted
Transmitted beam
beam totosamplesample0.45-mm-thick (111)diamond plateStages and vacuum chamber ofphase retarder

Switcher of phase44

Selection of phase plate

Thickness
(mm)

Index

Reflection

Energy (keV)

Transmittance(%)

111 Bragg

5~5.8

3~7

220 Laue

5.8~7.5

7~41

0.34

(111)

0.45

(111)

220 Laue

6~9

5~53

0.73

(111)

220 Laue

8~12

22~65

2.7

(001)

220 Laue

11~16

13~47

45

Spatial coherence
We need:- small source size (σs) & long beamline (L)lcoh ∝

λL
σs(depend on machine performance and facility design !)- w/ speckle-free optics.

MirrorÆultra smoothsurface
100 mm

Be windowÆvoid-free &polished

e.g. x-ray images using coherent x-rays

300 µm46

Front-end(1) Vacuum chamber(with ion pumps,..)Pressure (10-7～10-5 Pa)(2) Main beam shutter(MBS)・Water-cooled absorber・Beam shutter(3) Mask, XY-slit

e.g. SPring-8 BL19LXU front-end

Spatial power control

It reduces source power of 33 kW down to 500 W(4) Water-cooled Be windows

for downstream optics

Protection of UHV(5) Beam position monitor

Grazing incidence technique w/ GlidCopÆ 10 kW/m47

Flux (ph/s/100 mA/0.1%b.w.)

Reduction of power at front-end
10

16

10

15

10

14

10

13

10

12

Total flux

2

Partial flux (1x1 m m @ 30 m )
10

11

0

10

20

30

40

Photon energy (keV)e.g. Radiation From standard x-ray undulator λu=32 mm, N= 140,
fundamental peak of 10 keV
Front-end eliminates the out-of-axis power spatially and reduce thepower on the first optical element48

Transport channele.g. BL14B2

 Transport channel components
Exhaustion unit (ion-pump, TMP,..)
Down stream shutter (W or Pb)
Gamma stopper (Pb)
Beryllium window
Screen monitor

49

Shielding hutch @SPring-8
Air inlet duct
Air exhaust duct
Upper deck

Hutch panel module
Movable stairway
Manual sliding door
Mechanical sliding door
Cable duct

Optics hutch
contains optics and transport channel components introducing white radiation
Experimental hutch
contains experimental station equipments introducing monochromatic beam・PanelSteel/ Lead/ steel sandwich structure
・Lead thickness
Depends on the radiation condition (3～50 mm)
・ModulePanel, Door, Cable duct, Air inlet/exhaust duct,...
・UtilityCompressed air, Chilled water, electric power50

Other issues on beamline design- Boundary condition
storage ring and tunnel, neighboring beamline,..

- Radiation safety for shielding hutch, shutter,..
Radiation shielding calculation (EGS4, STAC8,..)- Control and interlock
Common scheme in the facility.
Connection with machine and safety control- Others
Utilities: electricity, water, compressed air, air conditioning.
Environmental: vibration of floor, temperature of air,..

Cooperation with each specialist in the facility is crucial !

51

Example of x-ray beamline- SPring-8 case -52

XAFS & single crystal diffraction- Bending magnet- Collimator mirror,+ DCM,+ refocusing mirror(a)Double-crystal
Downstream
monochromator
shutterGamma
Collimator
stopper
Bellows
mirror

Refocusing
mirrorRoller
G1

J1

J2

G2

J4 G3 J5

J3

J6

Motor
Shaft

Link

G1-G3: Gear box

J1-J6: Jack

Ideal reflection axis
y

(b)

δ

(0, h)(x0, y0)h-y0xFixed point

Beamline center

53

Protein crystallography- Bending magnet- DCM + focusing mirror

Optics hutch with standard components

Double-crystal
Focusing mirror
monochromator (Vertical deflection)

Experimental hutch

Shielded tube

30 m

40 m

50 m
Distance from the source

54

High resolution inelastic scattering- Undulator- DCM + back-reflection monochromator & analyzer (w/ ~meV resolution)

Optics hutch

Experimental
hutch 1

Downstream
shutter 1

Double-crystal
monochromator

Experimental
hutch 2

Experimental hutch 3(Back scattering hutch)

Experimental hutch 4(Analyzer hutch)

Dual movableend-stopper

Focusing mirror
Downstream
shutter 3

Downstream shutter 2(Dual shutter)
Shielded beam duct

Sample position
Inclination stage

Si 111 double-crystal
beam displacer
Back scattering
monochromator

5

30 m

40 m

50 m

60 m

70 m

80 m
Distance from the source55200-m-long beamline- Bending magnet- DCM
Storage ring building

Roots pump with dry pump

Optics hutch with standard transport channel and optics
Experimental hutch 1
Dry pump

Front end
40 m

60 m

140 m

160 m

120 m

100 m

80 m

Dry pump

400-mm-diameter shielded beam duct

Arcade120 m

Beam monitor andgate valve

Biomedical imaging center
Experimental hutch 2 and 3

180 m

200 m

220 m
Distance from the source

300-mm-wide beam at end-station
56

1-km-long beamline- Undulator- DCM + tandem mirror
Storage ring building

Experimental hutch 1

Optics hutch

Experimental hall

Double-crystal Beryllium window
monochromator
Movable end-stopper

Two-story beam transport

5

40 m

60 m

80 m

100 m

120 m

Long beamline building
The open air
Vacuum component hutch (pump station)

100 m

120 m

140 m

960 m

Experimental hutch 2
Beryllium window

980 m

1000 mDistance from the source

Wide and spatially-coherent X-rays at 1-km end station
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Summary- Starting point of X-ray beamline design is shown here,
w/ light source, monochromator, mirror,...
- It helps to figure out what we can obtain from the beamline.
- We will have to go into details of design refinement using;
FEA (ANSYS), ray-tracing (SHADOW,...), shielding calculation,...
- Standardization of good components helps beamline designand saves the cost, man-power, and other resources.
- Ray-tracing Æ wave simulation for “diffraction limited source and optics”
58Thanks to:
H. Kitamura, T. Tanaka, S. Takahashi, K. Takeshita,
N. Nariyama, Y. Asano, H. Ohashi, T. Mochizuki,
M. Yabashi, H. Yamazaki, K. Tamasaku, A. Baron,
M. Suzuki, T. Uruga, T. Matsushita, T. Ohata,
Y. Furukawa, and T. Ishikawa

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Thank you for your attention.

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