Features
An advanced multifunctional TOF-SIMS
instrument with a sophisticated style, capableof achieving precise surface mass analysis inmicroscale areas, all within a single system

Time of Flight Secondary Ion Mass SpectrometryHigh-precision analysis with TRIFT analyzer
Continuous unattended measurement of insulating materials
Unique ion beam technology
Molecular structure analysis based on Parallel Imaging MS/MS
A wide selections of options

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2

Triple Focusing Electrostatic Analyzer
for Complex Sample Geometries
TRIFT Analyzer for a Wide Range of Sample
Geometries, Wide Bandpass Energy, and WideAcquisition Angle
In general, secondary ions are emitted from the surface of the sample
at different energies and angles. As a result, even secondary ions withexactly the same mass will have different flight times in the analyzer.
This is particularly noticeable for samples with height differences or
uneven surfaces.
The Triple Ion Focusing Time-of-flight (TRIFT) spectrometer is able
to simultaneously compensate for differences in flight time caused bydifferences in energy and emission angle. This is a key feature of theTRIFT spectrometer, which achieves high mass resolution and highdetection sensitivity, as well as imaging with reduced shadows asdemonstrated in the examples below.

TOF-SIMS image from polymer sphere
C4H5O2C3H3O2TOF-SIMS images from micro via holeCu✚100 µm

3C₂H₃✚

Primary Ion Gun for High-Precision Analysis
Advanced Ion Beam Technology Achieves High Spatial Resolution andHigh Mass Resolution
PHI nanoTOF 3+ offers TOF-SIMS analysis with a high spatial resolution of < 500 nm in high mass resolution mode and < 50 nmin high spatial resolution mode. The combination of a high brightness ion source, a high precision pulse mechanism and a highresolution spectrometer ensures low noise, high sensitivity and high resolution measurements. In both modes, measurements arecompleted within a few minutes.
PHI nanoTOF 3 [conventional]

PHI nanoTOF 3+

45 nm

100250TOF-SIMS images from medicine

m/z = 59.05

m/z = 163.06

m/z = 369.20

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The first-ever automated unattended TOF-SIMS
analysis of multiple insulating samples
With the newly developed auto sample bias adjustment feature, itPETPC

Paperis now possible to perform unattended TOF-SIMS measurements
on samples including insulating samples. The process is thoroughly

simplified; 1) taking an intro photo, 2) selecting the analysis points on

the intro photo, and 3) pressing the start button. In the past, skilled
operators had to be dedicated to the instrument for analysis, but now
Glass

the high quality data can be obtained regardless of operator skill.

Automated Sample Transport System and Parking
Position as Standard
The instrument is equipped with an automatic sample transfer systemthat has been proven in more than 300 XPS Q-Series units. Sample
sizes of up to 100 mm × 100 mm are possible, and the analysis
chamber has a built-in parking position as standard. The systemallows continuous automated unattended analysis of large numbers ofsamples.

PET spectrum acquired with auto-tuning function

104.0265
C₇H₄O✚m/⊿m
10,000

103.8

104.0
m/z

5104.2

New Pulsed Argon Ion Gun for Complete
Turnkey Charge Neutralization

Bi ionThe pulsed low-energy electrons and argon ions can easily
neutralize surface charge for both positive and negative ion
polarities regardless of the type and shape of the insulatingsample.
* For Ar ion gun option is selected.

Low energy electrons
Low energy Ar ions

Insulator Sample
Sample Holder

Remote Access Function
Allows the Instrument to beControlled Remotely

Operation PC

The PHI nanoTOF 3+ allows you to accessthe instrument via your company's local area
LANnetwork or the internet. Once the sample
holder is mounted in the intro chamber,functions such as transferring the sample intoserver

the analysis chamber, sample
holder exchange with the parking position,
VPN

setting of the measurement conditions(including all options), and data acquisition
can all be performed remotely. Diagnostics ofthe instrument hardware and electronics canalso be accessed remotely.

Remotedesktopapp,* For more information on remote diagnostics, please contact
our Customer Service Department.

6FIB Fabrication Followed by Cross-section
Imaging within a Single LMIGFIB Function with Standard LMIGFIB processing function has newly been

FIB Processing

added to LMIG for primary ion source.

Eucentric Rotation
TOF-SIMS measurement

This makes it possible to perform from FIB
processing to cross-sectional TOFSIMS
imaging with a single ion gun. Stage rotation
is involved from processing to observation,
but the Eucentric function allows the stage toreturn to the same field of view after rotation,easy identifying the FIB position.
To achieve 3D tomography, the dedicated GaFIB option is recommended. The Ga-FIB may
be further optioned to operate as a second
analysis beam.
FIB-TOF Imaging of Battery Materials

surfaceLi metal
cross-section
Cu electrode7

Intensity (Counts)
Intensity (Counts)
Intensity (Counts)

Molecular Structure Analysis based on
Parallel Imaging MS/MS (Option)
Simultaneous Acquisition ofMS1 and MS2 Data
By combining a tandem mass spectrometer (MS2) with aconventional TOF-SIMS analyzer (MS1), MS1 and MS2 data
can be acquired simultaneously in the same measurement
field with high sensitivity and speed.
The MS1 spectrum can be complex due to the large numberof mass peaks generated by all components and fragments.
Conversely, the MS 2 spectrum, which is extracted andsegmented by the precursor selector, has a much simpler
spectral pattern. This provides information about themolecular structure, such as terminal groups, linear chains,or double bonds, and enables specific molecular structure
imaging.

TOF-SIMS images from polymer surface
MS1: m/z 284

MS2: m/z 60 & m/z 88

100 µm

100 µm8

A Wide Selection of Options to Expand thePotential of TOF-SIMS Applications

Heating / Cooling Sample Holder can beTransferred without air exposure
The 25 mm-sample heating/cooling sample holder, wellrecognized from the PHI GENESIS and PHI VersaProbeseries, is also available for use with the PHI nanoTOF 3 +.
Furthermore, this sample holder enables sample transfer froma glove box to the analysis chamber without air exposure.

Transfer Vessel Compatible with Multiple PHISurface Analysis Instruments
The inert gas/vacuum transfer vessel is an option for
introducing samples into the nanoTOF 3+ without exposure tothe atmosphere. Typically, the samples are mounted in a glove
box and then transferred to the instrument.
The samples can later be returned to the glove box after
measurement without exposure to the atmosphere. This isideal for samples that react easily with the atmosphere, suchas lithium ion batteries.

25 mmTransfer vessel

Transfer vessel and transfer vessel
adaptorInert Gas Glove Box for
Sample Introduction Chamber
A glove box that can be attached directly to the sample intro chamber.
It is possible to attach samples that easily react with the atmosphere,
such as lithium-ion batteries and organic EL materials, to the sample
stage while maintaining a low dew point.

Argon Gas Cluster Ion Gun for Low-Damage Depth Profiling
The use of an argon gas cluster ion beam enables low-damage ion etching for organic materials. This allows depth profiling oforganic compounds while maintaining their molecular structure.

Cesium Ion Gun and Argon/Oxygen Ion Gun for Rapid Depth Profiling ofInorganic Materials
Cesium and oxygen ion gun are used to expand the range of applications for depth analysis of inorganic materials. Both ionguns are capable of generating short pulses for rapid depth profiling by alternately irradiating the sample with primary andsputter ions at high repetition rates.

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Utility Requirements
Utility Requirements

Environmental Requirements

Electrical.................................... 200-230 V AC,

Static Magnetic Fields............. less than 100 µT (1 G)

single-phase 50 A 50/60 Hz

Variation of Magnetic Field.... less than 0.3 µT (3 mG)

Earth ground protection.......... Protection Class 1Vibration.................................... Not to exceed 6.35 µm/sec. below (1~100 Hz)

Compressed Dry Air................. 550~700 kPa

Temperature.............................. 24±3℃

Dry Nitrogen.............................. 18 kPa maximum

Relative Humidity..................... less than 70％ (no condensation should occur)

Ar gas......................................... 99.9995 %PHI nanoTOF 3+

Typical Floor Plan Layout (mm)Rough Pump

Rough Pump
(Option)

GCIB(Option)

MS/MS (Option)

Diaphram Pump
(H/C Option)

Water Chiller(Option)

LN2 Warmer(H/C Option)

LN2 Dewar(H/C Option)Transfer Vessel(Option)

Facilities Requirements
Laboratory Entrance: 1,220 mm minimum door width,
2,050 mm minimum door height* 2,500 minimum ceiling height when MS/MS option is selected

Operation Table(Option)
1000 x 800

Performance Specifications (using a Bi3++ primary ion beam)
Mass Resolution at Low Mass: ≥ 15,000 m/∆m at m/z = 28Si+ on silicon wafer
Mass Resolution on Insulators: ≥ 15,000 m/∆m at m/z = C7H4O+ on the polymer PET
Minimum Beam Size: 50 nm (Minimum Pulsed Beam Diameter), 		0.5 µm (Minimum Pulsed Beam Diameter at High Mass Resolution)

Optional Accessories
Parallel imaging MS/MS • Ar Gas Cluster Ion Beam Gun (GCIB) • C60 Ion Gun • Cs Ion Gun • Ar/ O2 Gas Gun • Hot/ColdSample Stage Module • High Temperature Sample Stage Module • Transfer Vessel • Oxygen Flood Module • Focused
Ion Beam (FIB) Gun • FIB Software • Sample Preparation Chambers • Intro Chamber Glove Box • Off-line Data Reduction
Software • Static SIMS Library

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Contact
East and Southeast Asia, India and Japan
https://www.ulvac-phi.com/

Americas, Europe, Middle East Asia,Africa and Oceania
https://www.phi.com/

www.ulvac-phi.com
2500 Hagisono Chigasaki, Kanagawa, 253-8522, Japan

Printed in Japan MT0101/WTS