As of Aug. 2024

Instruments List
No. Name (Model Number)

UseJoint Research Laboratory 101
1 Thin Layer XRD (RINT Ultima III)
Powder and thin film x-ray diffraction
2 Laser Microscope (VK-X3000)
Surface profile measurement
Shape Measuring Instrument
3
Shape measurement(VR-3200)
4 Cross-section Polisher (IB-09020 CP) Cross-sectioning of samples
5 Ion Milling (EM RES101)
Processing of specimens for TEM using ion beam
6 Soft Etching
Surface cleaning
7 Surface Area Analyzer (TriStarⅡ Plus) Surface area and porosity analysis
8 Pt Sputter (JFC-1600)
Pt sputter for SEM
High resolution surface morphology observation,
9 HR FE-SEM (SU8600)
Elemental analysis
Joint Research Laboratory 102
10 STEM (JEM-2100F)
Scanning transmission electron microscopy
11 Pt / Carbon Coater (SC701C)
Coater for SEM
12 GD-OES (GDA750)
Elemental analysis, Layer thickness determination
Joint Research Laboratory 103
13 Raman Spectroscopy (NRS-7100)
14 FT-IR (FT/IR-6300, IRT-7000)
15 Powder XRD (RINT2200)
16 Multi Function XRD (EMPYEAN)
17 Micro XRF (M4 TORNADO PLUS)
Joint Research Laboratory 104
18 Analytical FE-SEM (JSM-7001F)
19 On-site FE-SEM (JSM-7001F)
20212223

New Conventional SEM (SU3900)
FE-EPMA (JXA-8530F)
FIB (JIB-4500)
Digital Microscope (KH-7700)

Material identification by visible light

Manufacture

Adviser

Main
Staff

Sub
Staff

Billing
Unit

RigakuKEYENCE

Sakamoto
Ishikawa

KoyamaIshikawa

MiyakeMiyakehalf day
1 hour

1400250

KEYENCE

Ishikawa

Ishikawa

Hayakawa

1 hour

150

JEOL
LEICA
meiwafosis
SHIMADZUJEOLIshikawa
Murakami
Murakami
Sakamoto
Ishikawa

KoyamaIshikawa
Ishikawa
Hayakawa
MiyakeIshikawa
Hayakawa
MiyakeKusanagi
Hayakawa

half dayhalf day1 hourhalf day
1 hour

600
600
150
1400150

Hitachi High-Tech

Suda

Ishikawa

Hayakawa-JEOL
Sanyu ElectronRigaku, Spectrume

Sakamoto
Ishikawa
Kikuchi

Shimizu
Ishikawa
Ishikawa

Sakamoto
MiyakeHayakawa

half day
1 hour-1400150-

JASCO

Ishikawa

Takasawa

2 hours500

half day1000

2 hours
2 hours
1 hour

300
700
200

Material identification by Infrared ray, Macro / Micro /JASCO
Mapping measurement
Powder x-ray diffractometry
RigakuX-ray diffractometry
Malvern Panalytical
X-ray fluorescence spectrometry
BRUKER
High resolution surface morphology observation,JEOL
Elemental analysis
High resolution surface morphology observation,JEOL, etc.
Elemental analysis, Crystal phase analysis
Surface observation by secondary electron
Hitachi High-Tech
Trace elemental analysis
JEOL
Ion beam processing
JEOL
Observation at 35-2500x (3D observation is possible) Hirox

UnitCharge-Okuya
Sakamoto
Sakamoto

MiyakeHayakawa
MiyakeTakasawa
Hayakawa
MiyakeIshikawa
MiyakeIshikawa
MiyakeIshikawa

Murakami

Ishikawa

Hayakawa

2 hours

600

Murakami

Ishikawa

Hayakawa

2 hours600

Iwata
Murakami
Sakamoto
Ishikawa

HayakawaKoyama
Shimizu
Miyake1 hourhalf dayhalf day
1 hour200
1200
1400150

Kusanagi

Ishikawa
Murakami
Sakamoto
Shimizu
Ishikawa
MiyakeIshikawa
MiyakeIshikawa

half day1000

half day1800

1 hour300

Ishikawa

24 Atomic Absorption (Solar S4-AA)

Elemental analysis by absorption

Thermo Electron

Kohno

25 ICP (Optima 2100DV)

Quantification of elements in solution

PerkinElmer

Miyabayashi

26 Simple AFM (VN-8010)

Surface observation of up to 200 μm square

KEYENCE

Iwata

Ishikawa
MiyakeIshikawa

27 XPS (AXIS ULTRA DLD)
28 Ion Coater (SC-701AT)
Joint Research Laboratory 304

Identification of surface atoms by photoelectron
Au coater for SEM

SHIMADZU
Sanyu Electron

Kawaguchi
Murakami

Ishikawa
Ishikawa

MiyakeHayakawa

half day
1 hour

1400
150

29 General Purpose AFM (SPI3800)

Surface observation of up to 20 µm square

Seiko
Instruments

Iwata

MiyakeIshikawa

half day

1000

30 UV-Vis Spectrophotometer (V-670)

Material identification using UV-Vis light

JASCO

Murakami

Takasawa

MiyakeHayakawa

2 hours

400

Qualitative and quantitative analysis by fluorescence

JASCO

Kawai

Takasawa Ishikawa

half day800

half day1000half day

1000

half day1000

31Fluorescence Spectrophotometer(FP-8600, FP-8700)

32 Thermal Analysis (DTG-60A)

Measurement of heat resistance temperature andSHIMADZU
calorific value

Toda

Kusanagi

33 DSC (DSC-60Plus)

Differential scanning calorimetry

SHIMADZU

NeoKusanagi

Elemental analysis of organic trace elements

Thermo ElectronToda

Kusanagi

AC impedance cyclic voltammetry

HOKUTO DENKO

Murakami

Kusanagi

Murakami

half day

600

Charging / discharging characteristics evaluation

HOKUTO DENKO

Murakami

Kusanagi

Miyakehalf day

800*1

Zeta potential and particle size measurements
Elemental analysis
Identification of surface atoms by photoelectron

Malvern Panalytical
SHIMADZUSHIMADZU

Sakamoto
Murakami
Ishikawa

Hayakawa Kusanagi
MiyakeHayakawa
Ishikawa Hayakawa

1 hour
1 hourHalf day250
150600Surface observation
X-ray diffractometry

JEOL
RigakuIshikawa
Sakamoto

MiyakeKoyamaShimizu
Murakami

half dayhalf day

600
600

Surface observation of up to 45 μm square
Processing of specimens for TEM

Park Systems
JEOL

Ishikawa
Sakamoto

MiyakeShimizu

Ishikawa
Sakamoto

half day
1 hour800150

Solar cell performance evaluation

SPD Laboratory, Inc.

Murakami

Shimizu

Ishikawa

half day800

Sample polishing

JEOL

Sakamoto

Shimizu

Sakamoto

Half day

Osmium coatingmeiwafosis-Shimizu-1 hour

120
100 yenper 1 coat

Innovation Building 208
47 NMR (Avance III HD400)
Nuclear magneticresonance
48 Mass spectroscopy (micrOTOF)
Mass spectrometry
49 Circular Dichroism spectrometer (J-720) Molecular circular dichroism measurements
Other

BRUKER
BRUKERJASCO

Tanaka YSatoTanaka Y

Hayakawa Hirata
Hayakawa Hirata
Hayakawa Takasawa

1 hour
1 hourhalf day

50 3D Printer (Bullulo200)

Systemcreate

Ishikawa

Hayakawa Shimizu

900 yen per
100 g of material

Organic Trace Elemental Analysis(Flash EA)
Electrochemical Analysis System
35(HZ-Pro S4)Battery Charge / Discharge System
36(HJ1001SD8)
37 Zeta Potential Analyzer (Zetasizer Ultra)
38 XRF (EDX-8000)
39 ESCA (ESCA-3400)
Joint Research Laboratory 1010
40 W-SEM (JSM-6360LA)
41 XRD (RINT UltimaII)
Research Institute of Electronics 243
42 Wide Area AFM (XE-70)
43 Ion Slicer (EM-09100 IS)
Solar Simulator
44(VK-SS-50, VK-IPCE-10)
45 Handy Lapping Machine (HLA-2)
34

46 Osmium Coater (Neoc-ST)

3D printer (Fused Deposition Modeling)*1…If the measurement takes a long time, some discount might be introduced.

Ishikawa
MiyakeIshikawa
MiyakeIshikawa
Miyake300
2501000