Research and Development

Even as technologies become more advanced, competition is intensi-

Tackling Environmental and Energy Issues

fying. Amid this change in the environment, early adoption andThe entire Tokyo Electron Group is working together to address

speed are more crucial now than ever to R&D activities. The Tokyo

global environment- and energy-related issues.

Electron Group is enhancing its exploration of new technologies

First are our efforts in the field of photovoltaic cell production equip-

through industrial academic collaboration, utilizing such consortia toment. We are leveraging vacuum, plasma, and spin coating technolo-

accelerate development of equipment and processes, in addition togies acquired through our experience in semiconductor and FPD

our own R&D activities.

manufacturing equipment to develop high-productivity equipment for
manufacturing thin-film silicon photovoltaic cells, the mainstream

Targeting the Frontiers of Semiconductor Production Technology
Tokyo Electron is continuing the perpetual quest for miniaturization,format in use today.
We are also actively engaged in R&D of photovoltaic cell produc-

the main pillar supporting the value of semiconductors.

tion equipment that use compound and organic semiconductors,

In the field of microfabrication technologies, we have developedwith a view to enhancing the efficiency and lowering the costs ofunique double patterning technologies, for example, a silicon oxide

photovoltaic cells.

film that forms at room temperature, enabling ultra-microfabrication

Second are our contributions to energy conservation. In the fieldthat exceeds the resolution limit of exposure tools.

of power electronics, silicon carbide semiconductors are expected to

We are also supporting the miniaturization and high performance

usher in a major, once-in-decades innovation. We have developedof transistors by developing high-k CVD systems with mass produc-

epitaxial growth equipment that is crucial to the production of thesetivity, MOCVD technologies, and silicon fabrication and various othernew, high-potential semiconductors. This equipment boasts thefilm deposition technologies for the era of three-dimensional transistors.

highest performance in terms of epitaxial film quality and productivity

Another technology that is the focus of much attention is 3D chipof any in the world.

stacking technology. In this area, Tokyo Electron is preparing for theadvent of the age of stacked-chip technology by developing propri-Unearthing the World’s Most Promising Technologies

etary technologies such as a High speed Through-Silicon-Via etching

Technological development increasingly requires open innovation. Tokyosystem, low-temperature dielectric film deposition, and metal deposi-Electron participates in research programs at Japanese universities andtion system.

Tokyo Electron’s R&D Framework(As of June 2009)

Product development in existing SPE and FPD business units
Tokyo Electron AT Limited

Etch system, CVD system, FPD Etch/ash system

Tokyo Electron Kyushu Limited

Coater/developer, Cleaning system, FPD Coater/developer

Tokyo Electron Tohoku Limited

Thermal processing system

Tokyo Electron TS Limited

Wafer proberTokyo Electron Software Technologies Limited

Software technology

Timbre Technologies, Inc.

Integrated metrology

R&D for new and advanced technologies
Tokyo Electron Technology Development Center

Research and development

Tokyo Electron Leading-edge Process Development Center

Process development

Tokyo Electron Technology Development Institute, Inc.

RLSA plasma technology

Tokyo Electron PV Limited

Thin-film silicon PV cell plasma CVD technology

TEL Technology Center, America, LLC

Process development

TEL Epion Inc.

Gas cluster ion beam technology

Identification of promising technologies
TEL Venture Capital, Inc.

12

Tokyo Electron Limited  Annual Report 09

R&D Locations

Leading-edge ProcessDevelopment CenterTokyo Electron PV Limited(Nirasaki City, Yamanashi)Tokyo Electron Technology Development Institute, Inc.
(Sendai City, Miyagi)

TEL Epion Inc.
(Billerica, Massachusetts)

R&D Expenses

Kansai Technology Center(Amagasaki City, Hyogo)(Billions of Yen)
80

57.0

49.2

43.9

4066.160

61.0

IMEC (Belgium)
Collaboration R&D with IMEC on
immersion lithography and extreme
ultraviolet (EUV) lithography

TEL Technology Center,America, LLC(Albany, New York)20

About IMECIMEC is a world-leading independent research center in nanoelectronics and nanotechnology. Its research focuses on the next generations of chips and systems, and on theenabling technologies for ambient intelligence.

00506070809

overseas to discover outstanding research, and actively conducts

at the forefront of industry, and to generate synergy effects between

domestic and international joint research on promising technologies.

devices and processes.

The Group has also established TEL Venture Capital, Inc., a Silicon

In Japan, Tokyo Electron participates in the MIRAI Project, while

Valley-based company that works to uncover promising technologies. Invest-overseas the Company participates in the International SEMATECH

ments and joint research are already underway at a number of companies.

project in the United States and the Albany NanoTech project promoted by the New York State government, as well as collaborating

Promoting More Efficient R&D Via Consortia Participation

with IMEC in Belgium. These consortia allow the Company to comeIn order to improve the efficiency of R&D, it is important to match

into contact with global semiconductor industry needs and refine

industrial “needs” with the “seeds” of innovation. Consortia offer aTokyo Electron’s products through evaluation of equipment by otherpromising venue for equipment manufacturers to learn about needs

participating parties.

Annual Report 09

Tokyo Electron Limited13