Shizuoka University, Hamamatsu Instrumental Analysis Center
No.

Name
(Model Number)

Manufacture

Adviser

Main
Staff

Sub
Staff

Billing
Unit

1

Thin Layer XRD(RINT Ultima III)

Powder and thin film x-ray diffraction

RigakuSakamoto

KoyamaMiyakeHalf Day2

Laser Microscope(VK-X3000)

Surface profile measurement

KEYENCE

Ishikawa

Ishikawa

Miyake1 Hour3

Shape Mesuring Instrument(VR-3200)

Shape measurement

KEYENCE

Ishikawa

Ishikawa

Hayakawa

1 Hour4

Cross-section Polisher(IB-09020 CP)

Cross-sectioning of samples

JEOL

Ishikawa

KoyamaIshikawa

Half Day5

Ion Milling(EM RES101)

Processing of specimens for TEM using
ion beam

LEICA

Murakami

Ishikawa

Hayakawa Half Day

6

Soft Etching

Surface cleaning

meiwafosis

Murakami

Ishikawa

Miyake7

Surface Area Analyzer(TriStarⅡ Plus)

Surface area and porosity analysis

SHIMADZU

Sakamoto

Hayakawa

Kusanagi Half Day

8

Pt Sputter(JFC-1600)

Pt sputter for SEM

JEOL

Ishikawa

MiyakeHayakawa

1 Hour

9

HR FE-SEM(SU8600)

High resolution surface morphology observation, Elemental analysis

HitachiHigh-Tech

Suda

Ishikawa

Hayakawa

-

10

STEM
(JEM-2100F)

Scanning transmission electron microscopy

JEOL

Sakamoto

Shimizu

Sakamoto Half Day

11

Pt / Carbon Coater(SC701C)

Coater for SEM

Sanyu
Electron

Ishikawa

Ishikawa

Miyake1 Hour

12

GD-OES(GDA750)

Elemental analysis, Layer thickness determination

Rigaku,Spectruma

KikuchiIshikawa

Hayakawa-

13

Raman Spectroscopy(NRS-7100)

Material identification by visible light

JASCO

Ishikawa

Takasawa

Miyake2 Hours
Hayakawa

14

FT-IR(FT/IR-6300, IRT-7000)

Material identification by Infrared ray, Macro /Micro / Mapping measurement

JASCO

Ishikawa

Takasawa

MiyakeHalf Day
Hayakawa

15

Powder XRD(RINT2200)

Powder x-ray diffractometry

RigakuOkuya

MiyakeIshikawa

2 Hours

16

Multi Function XRD(EMPYEAN)

X-ray diffractometry

Malvern
Panalytical

Sakamoto

MiyakeIshikawa

2 Hours17

Micro XRF
(M4 TORNADO PLUS)

X-ray fluorescence spectrometry

BRUKER

Sakamoto

MiyakeIshikawa

1 Hour18

Analytical FE-SEM(JSM-7001F)High resolution surface morphology observation, Elemental analysis

JEOL

Murakami

Ishikawa

Hayakawa 2 Hours

19

On-site FE-SEM(JSM-7001F)High resolution surface morphology observation, Elemental analysis, Crystal phase analysis JEOL, etc.

Murakami

Ishikawa

Hayakawa 2 Hours

20

New Conventional SEM(SU3900)

HitachiHigh-Tech

Iwata

Hayakawa

Ishikawa

21

FE-EPMA(JXA-8530F)

Trace elemental analysis

JEOL

Murakami

KoyamaMurakami Half Day

22

FIB(JIB-4500)

Ion beam processing

JEOL

Sakamoto

Shimizu

Sakamoto Half Day

23

Digital Microscope(KH-7700)

Observation at 35-2500x (3D observationis possible)

Hirox

Shimomura

MiyakeShimizu

1 Hour24

Atomic Absorption(Solar S4-AA)

Elemental analysis by absorption

ThermoElectron

Kohno

Kusanagi

Ishikawa
MiyakeHalf Day

25

ICP(Optima 2100DV)

Quantification of elements in solution

PerkinElmer

Miyabayashi

Ishikawa
MiyakeIshikawa
MiyakeHalf Day

Use

Surface observation by secondary electron

1

1 Hour

1 HourShizuoka University, Hamamatsu Instrumental Analysis Center
No.

Name
(Model Number)

26

Simple AFM(VN-8010)

27

XPS(AXIS ULTRA DLD)

28

Ion Coater(SC-701AT)

29

Use
Surface observation of up to 200 μm
squareManufacture

Adviser

Main
Staff

Sub
Staff

Billing
Unit

KEYENCE

Iwata

Ishikawa

Ishikawa

1 HourIshikawa

MiyakeHalf Day

Identification of surface atoms by photoSHIMADZU Kawaguchi
electronAu coater for SEM

Sanyu
Electron

Murakami

Ishikawa

Hayakawa

1 Hour

General Purpose AFM(SPI-3800)

Surface observation of up to 20 μm
squareSeiko
Instruments

Iwata

MiyakeIshikawa

Half Day30

UV-Vis Spectrophotometer(V-670)Material identification using UV-Vis
light

JASCO

Murakami

Takasawa

Miyake2 Hours
Hayakawa

31

Fluorescence Spectrophotometer Qualitative and quantitative analysis byfluorescence(FP-8600, FP-8700)

JASCO

Kawai

Takasawa

Ishikawa

Half Day

Measurement of heat resistance temperaSHIMADZU
ture and calorific value

Toda

Kusanagi

Ishikawa
MiyakeHalf Day

Differential scanning calorimetry

SHIMADZU

NeoKusanagi

Ishikawa
MiyakeHalf Day
Half Day

32

Thermal Analysis(DTG-60A)

33

DSC(DSC-60Plus)

34

Organic Trace Elemental Analysis Elemental analysis of organic trace ele(Flash EA)
ments

ThermoElectron

Toda

Kusanagi

Ishikawa
Miyake35

Electrochemical Analysis System
AC impedance cyclic voltammetry(HZ-Pro S4)

HOKUTO
DENKO

Murakami

Kusanagi

Murakami Half Day

36

Battery Charge / Discharge
System (HJ1001SD8)

Charging / discharging characteristics
evaluation

HOKUTO
DENKO

Murakami

Kusanagi

MiyakeHalf Day

37

Zeta Potential Analyzer(Zetasizer Ultra)

Zeta potential and particle size measurements

Malvern
Panalytical

Sakamoto

Hayakawa

Kusanagi

1 Hour38

XRF(EDX-8000)

Elemental analysis

SHIMADZU Murakami

MiyakeHayakawa

1 Hour

39

ESCA(ESCA-3400)

Identification of surface atoms by photoSHIMADZU
electron

Ishikawa

Ishikawa

Hayakawa Half Day

40

W-SEM
(JSM-6360LA)

Surface observation

JEOL

Ishikawa

MiyakeShimizu41

XRD(RINT UltimaⅡ)

X-ray diffractometry

RigakuSakamoto

KoyamaMurakami Half Day

42

Wide Area AFM(XE-70)Surface observation of up to 45 μm
squarePark
Systems

Ishikawa

MiyakeIshikawa

Half Day43

Ion Slicer(EM-09100 IS)

Processing of specimens for TEM

JEOL

Sakamoto

Shimizu

Sakamoto

1 Hour44

Solar Simulator(VK-SS-50, VK-IPCE-10)

Solar cell performance evaluation

SPD LaborMurakami
atory, Inc.

Shimizu

Ishikawa

Half Day

45

Handy Lapping Machine(HLA-2)

Sample polishing

JEOL

Sakamoto

Shimizu

Sakamoto Half Day

46

Osmium Coater(Neoc-ST)

Osmium coating

meiwafosis-

Shimizu-

1 Hour47

NMR(AvanceIII HD400)

Nuclear magnetic
resonance

BRUKER

Tanaka Y

Hayakawa

Hirata1 Hour48

Mass sSpectrometer(micrOTOF)

Mass spectrometry

BRUKER

Sato

Hayakawa

Hirata1 HourJASCO

Tanaka Y

Hayakawa

Takasawa Half Day

Systemcreate

Ishikawa

Hayakawa

Shimizu

49
50

Circular Dichroism spectrome- Molecular circular dichroism measureter (J-720)
ments
3D Printer(Bullulo200)

3D printer (Fused Deposition Modeling)2

Half Day-Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 1

Incident X-ray

CuKα parallel beam collimatedby multilayer mirror

Samplesthin films and powders
profile measurement(Out-of-plane, In-plane)locking curve measurement
Database( PDXL) is introduced.

Name

Thin Layer XRD

Model No.

RINT Ultima III

Manufacture

RigakuMeasurement
MethodLocation

Joint Research Laboratory 101

Miscellaneous

Adviser

Sakamoto Naonori

Staff

Koyama Tadanobu

Features
The X-ray diffraction (XRD) is the technique which characterizes lattice
constants, crystal structures, crystallinity , crystallite sizes, orientations
with X-ray diffraction, which is caused by an incident X-ray and periodic structure of the substance. This instrument is equipped with a sample
stage for thin films, and optimized for characterizing the structure ofthin films. In-plane measurement, which characterizes crystal planes
parallel to the sample surface, can be taken. Of course, so can out-ofplane measurement, which characterizes crystal planes perpendicular tothe sample surface.

No. 2
Name

Laser Microscope

Model No.

VK-X3000

Manufacture

KEYENCE

Location

Joint Research Laboratory 101

Adviser

Ishikawa Makoto

Staff

Ishikawa Makoto

Features
The system can measure the surface topography of sample
workpieces with nanometer-order height resolution using threedifferent measurement methods: laser confocal, white interference and focus variation.

3

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 3
Name

Shape Mesuring Instrument

Model No.

VR-3200

Manufacture

KEYENCE

Location

Joint Research Laboratory 101

Adviser

Ishikawa Makoto

Staff

Ishikawa Makoto

FeaturesNon-contact measurement of a wide range of 3D
shapes.

No. 4
Name

Cross-section Polisher

Model No.

IB-09020 CP

Manufacture

JEOL

Location

Joint Research Laboratory 101

Adviser

Ishikawa Makoto

Staff

Koyama Tadanobu

Features
It's used to prepare a cross-sectional sample.

4

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 5
Name

Ion Milling

Model No.

EM RES101

Manufacture

LEICA

Location

Joint Research Laboratory 101

Adviser

Murakami Kenji

Staff

Ishikawa Makoto

Features
It prepares TEM samples with ion beams.

No. 6
Name

Soft Etching

Manufacture

meiwafosis

Location

Joint Research Laboratory 101

Adviser

Murakami Kenji

Staff

Ishikawa Makoto

Features
It's used to remove a contamination layer on sample

5

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 7
Name

Surface Area Analyzer

Model No.

TriStarⅡ Plus

Manufacture

SHIMADZU

Location

Joint Research Laboratory 101

Adviser

Sakamoto Naonori

Staff

Hayakawa Toshihiro

Features
It can measure the specific surface area and pore distributionof solid and powder samples.
■spec
Adsorption gas

NitrogenSpecific surface area range

0.01 m2/g or more

Pore size range

1～100 nm

No. 8
Name

Pt Sputter

Model No.

JFC-1600

Manufacture

JEOL

Location

Joint Research Laboratory 101

Adviser

Ishikawa Makoto

Staff

Miyake Aki

FeaturesThis is specimen coating device for SEM. You can
use this machine to coat a non-conducting specimen
with Pt.

6

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 9
Name

HR FE-SEM

Model No.

SU8600

Manufacture

Hitachi High-Tech

Location

Joint Research Laboratory 101

Adviser

Suda Seiichi

Staff

Ishikawa Makoto

Features
Observation capabilities with high spatial resolution anddiverse signal detection enable observation and analysis in

SE resolution

0.6nm@15kV, 0.7nm@1kV

Magnification

20~2,000,000 x

and detection signal control function enable high-contrast

Electron gun

Cold cathode field emission electron gun

images to be acquired with high resolution.

Acceleration voltage 0.5~30kV

a wide range of fields, from device and materials analysis
to life sciences. A high-brightness cold FE electron gun

Detector

Upper detector (UD),
Lower detector (LD),Top detector (TD)Sample size

Max. 150 mm dia.

Specifications

Resolution:
0.1 nm (lattice image)
0.23 nm (particle image)
0.2 nm (STEM image)No. 10Name

STEM

Model No.

JEM-2100F

Manufacture

JEOL

Location

Joint Research Laboratory 102

Adviser

Sakamoto Naonori

Staff

Shimizu Hikaru

Features

Magnification:
50 ~ 6,000x (low)2,000 ~ 1,500,000x (high)Electron Gun

Thermal field-emission electron gun
Accelerating voltage 200 kV

Type of Image

TEM image, STEM image, SE image, Electron
diffraction pattern, etc.

EDS

Detectable elements: B - U
Resolution: 138 eV*Qualitative analysis

Analysis Function *Standardess quantitative analysis*High-speed X-ray mapping

STEM is a transmission electron microscope equipped witha field-emission electron gun. It enables ultra-high resolution image observation and analysis at the nanoscale. A
high-sensitivity scanning transmission imaging system(STEM) and an energy-dispersive X-ray analyzer (EDS) areincorporated to obtain various data efficiently and easily. It
is also equipped with CCD cameras, which enables image
observation on the monitor and saving of images in electronic file format.

7

Shizuoka University, Hamamatsu Instrumental Analysis CenterNo. 11Name

Pt / Carbon Coater

Model No.

SC701C

Manufacture

Sanyu Electron

Location

Joint Research Laboratory 101

Adviser

Ishikawa Makoto

Staff

Ishikawa Makoto

Features
It forms carbon and platinum thin films on the surface of nonconductive samples for SEM observation.

No. 12Name

GD-OES

Model No.

GDA750

Manufacture

Rigaku, Spectruma

Location

Joint Research Laboratory 102

Adviser

Kikuchi Shoichi

Staff

Ishikawa Makoto

FeaturesBy cathoding the sample, the sample itself is sputtered andthe luminescence phenomenon associated with the energychange is used for measurement. Bulk and depth profile
measurements are possible. Not only intensity and time
calculations, but also concentration and depth calculations(calibration required).

8

Shizuoka University, Hamamatsu Instrumental Analysis CenterNo. 13Name

Raman Spectroscopy

Model No.

NRS-7100

Manufacture

JASCO

Location

Joint Research Laboratory 103

Adviser

Ishikawa Makoto

Staff

Takasawa Taishi

FeaturesThis is the laser Raman microspectrograph with 4
lasers of wavelength 325, 532, 785 and 1064 nm anda fast mapping function. Accessories include stretching, cooling and heating stages.
Measuring
Wavenumber
Range

50～8000 cm-1

Max Resolution

0.7 cm-1 / pixel (excitation at 532 nm)

No. 14Name

FT-IR

Model No.

FT/IR-6300, IRT-7000

Manufacture

JASCO

Location

Joint Research Laboratory 103

Adviser

Ishikawa Makoto

Staff

Takasawa Taishi

Features
FT-IR is an instrument for measuring the infraredabsorption spectrum of a substance and evaluating
its substructure (e.g. functional groups) and compositions. Both micro- and macro- measurements are
possible. It is equipped with a mapping function.

9

Shizuoka University, Hamamatsu Instrumental Analysis CenterNo. 15Name

Powder XRD

Model No.

RINT2200

Manufacture

RigakuLocation

Joint Research Laboratory 103

Adviser

Okuya Masayuki

Staff

Miyake Aki

FeaturesThis is a X-ray diffractometer for powder samples. The
sample holder is a glass sample plate. For small sample
quantities, a silicon non-reflective sample plate canalso be used.

No. 16
Name

Multi Function XRD

Model No.

EMPYREAN

Manufacture

Malvern Panalytical

Location

Joint Research Laboratory 103

Adviser

Sakamoto Naonori

Staff

Miyake Aki

FeaturesMultipurpose X-ray diffractometer for special use. It is
adapted to many optional measurements, such as a thin film
measurement, a residual stress measurement, a variable temperature measurement(-190℃ to 600℃).
You can use Cu or Cr as an anode target. A 2D solid-state hy-

10

X-ray Tube

Cu

Optical System

focusing beam

Scan Mode2θ/θ linked, θ, 2θ alone

Goniometer Radius

185 mmShizuoka University, Hamamatsu Instrumental Analysis CenterNo. 17Name

Micro XRF

Model No.

M4 TORNADO PLUS

Manufacture

BRUKER

Location

Joint Research Laboratory 103

Adviser

Sakamoto Naonori

Staff

Miyake Aki

FeaturesThis is the Micro XRF for detection and analysis of
all elements form C to Am. It uses 20 µm diameter
X-rays and allows local analysis and elemental map-

No. 18Resolution:
1.2 nm (at 30kV), 3.0 nm (at 1 kV)

Name

Analysical FE-SEM

Model No.

JSM-7001F

Manufacture

JEOL

Location

Joint Research Laboratory 104

Adviser

Murakami KenjiType of Image BSE image (COMPO image, TOPO image)

Staff

Ishikawa Makoto

EDS

Specifications

Magnification: 10 - 1,000,000x
SampleMax 150 mmφ, height limit 10 mm

Electron Gun

Cold field-emission electron gun
Accelerating voltage 0.2 ~ 30 kV
SE image

Features
It is a scanning electron microscope equipped with a field-emission
electron gun and an energy dispersive X-ray spectrometer. It enables not only high-resolution surface morphology observation in thelow- and medium-voltage regions, but also elemental analysis ofsamples and orientation analysis of crystalline samples.

11

Resolution: 123 eV
Detectable elements: Be - U

Shizuoka University, Hamamatsu Instrumental Analysis CenterNo. 19Name

On-site FE-SEM

Model No.

JSM-7001F

Manufacture

JEOL, etc.

Location

Joint Research Laboratory 104

Adviser

Murakami Kenji

Staff

Ishikawa Makoto

Features
The field-emission electron gun enables observation at ultra-high magnification.
It also enables the high magnification observa-

Magnification

SEI: 10 - 1,000,000x (under the best conditions)tion at low voltage by using a TTL (ThroughElectron Gun

In-lens thermal FEG

The Lens) detector.

Observation Mode

SE image, BSE image, TTL

Analysis

EDS (Energy Dispersive X-ray Spectroscopy)
EBSD (Electron Backscatter Diffraction)

No. 20Name

New Conventional SEM

Model No.

SU3900

Manufacture

Hitachi High-Tech

Location

Joint Research Laboratory 104

Adviser

Iwata Futoshi

Staff

Hayakawa Toshihiro

Features
A general-purpose SEM for the observation of large, heavy specimens, where everything from electron beam irradiation after specimen setting to image adjustment is automated, enabling SEM images to be acquired immediately after the start of observation.

Features

SE resolution: 3.0nm (Acc. voltage 30 kV, WD = 5 mm, high vacuum mode)
BSE resolution: 4.0 nm (Acc. voltage 30 kV, WD = 5 mm, low vacuum mode)
Magnification: 5 ~ 300,000 x
Electron gun: W hairpin filament

Electron optics Acceleration voltage: 0.3 kV ~ 30 kV
Stage

Max. sample size: 300mm dis.
Max. observation range: 200mm dia.
Max. mountable height: 130 mm

12

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 21Name

FE-EPMA

Model No.

JXA-8530F

Manufacture

JEOL

Location

Joint Research Laboratory 104

Adviser

Murakami Kenji

Staff

Koyama Tadanobu

Features
The FE-EPMA is an instrument which tells us whichelements compose a substance, their composition ratios,
and their distribution, by detecting characteristic X-rays
derived by irradiated with a focused electron beam. Additionally, you can also obtain the surface shape withSE (secondary electron) images and BSE (backscatteredelectron) images.

Accelerating Voltage

1 - 30 kV (0.1 kV step)

Probe Current

1 x 10-11 - 5 x 10-7 A (25 kV)

X-ray Spectrometry Range

0.087 - 9.3 nm

Number of X-ray Spectrometers

Up to 5

No. 22Name

FIB

Model No.

JIB-4500

Manufacture

JEOL

Location

Joint Research Laboratory 104

Adviser

Sakamoto Naonori

Staff

Shimizu Hikaru

Features
FIB enables microfabrication at the nanoscale by irradiating asample with a convergent Ga ion beam and stripping away
atoms from a sample surface. It is also used to cut out samples
for STEM. In addition to an ion gun for FIB, this system is

Ion source: Ga liquid metal ion source
Accelerating voltage: 1 - 30 kV
Specifications
Magnification: 100 ~ 300,000x
of FIB Part
Imaging resolution: 5nm (at 30 kV)
Beam current: 0.5 pA - 30 nA (at 30 kV)

also equipped with an electron gun for SEM and an EDS detector, allowing surface morphology observation and elemental
analysis to be performed simultaneously with microfabrica-

Accelerating voltage: 0.3 - 30 kV
Specifications
Magnification: 5 - 300,000x
of SEM Part
Imaging resolution: 2.5nm (at 30 kV)

tion.

13

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 23Name

Digital Microscope

Model No.

KH-7700

Manufacture

Hirox

Location

Joint Research Laboratory 104

Adviser

Ishikawa Makoto

Staff

Miyake Aki

FeaturesThis is the digital microscope which enables 35 - 2500x
and 3D observation. You can conduct observation,measurement and recording smoothly. Not only 2D
measurement and image processing, but also depth synthesis, 3D image construction and image linking can bedone.

Specifications

No. 24
Name

Atomic Absorption

Model No.

Solar S4-AA

Manufacture

Thermo Electron

Location

Joint Research Laboratory 104

Adviser

Kohno Yoshiumi

Staff

Kusanagi Hiroki

Features
Sample solutions are sprayed into the flame and target
elements are converted into atomic vapors. When thesample is irradiated with light of a wavelength specificto the target element, the ground state atom absorbs thelight and transitions to an excited state. The concentration of the target element can be determined from theabsorption of this light (=absorbance).

14

35 - 2500x observation can be done
2D / 3D observation

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 25Name

ICP-OES

Model No.

Optima 2100DV

Manufacture

PerkinElmer

Location

Joint Research Laboratory 104

Adviser

Miyabayashi Keiko

Staff

Ishikawa Makoto / Miyake Aki

Features
It allows quantitative analysis of trace elements (ppb
to ppm order) in aqueous solutions. Atomised liquidsamples are introduced into the plasma and the emission observed in the plasma is spectroscopically analysed for each element using a spectrometer for qualitative and quantitative analysis of the elements.

Specifications

Around 70 elements, mainly metallic elements, canAnalysable elements:
Most of elements except H, O and F
Sequential type

be analysed.

No.26
Name

Simple AFM

Model No.

VN-8010

Manufacture

KEYENCE

Location

Joint Research Laboratory 104

Adviser

Iwata Futoshi

Staff

Ishikawa Makoto

FeaturesIt enables to observe the nano-region by selectingfrom optical microscope image by mouse operation.
XY direction: 200 nm - 200 μm,
Z direction: ± 10 μm

You can specify the AFM measurement area withnanometer precision because the positioning can bedone under the optical microscope. From the AFM

Specifications
AFM Part

data obtained, it is possible to analyse the surface

Scanner: Voice Coil Motor (VCM) using
Vertical resolution: 0.3 nm
Self-sensing system, Contact / DFM / SS
Magnification: 250 - 1250x

Specifications
Optical Microscope Part

15

Observation range:
1000(H) x 750(V) μm - 200(H) x 150(V) μm
motorised zoom, motorised focus,
motorised lighting apertureShizuoka University, Hamamatsu Instrumental Analysis Center
No. 27Name

XPS

Model No.

AXIS ULTRA DLD

Manufacture

SHIMADZU

Location

Joint Research Laboratory 104

Adviser

Kawaguchi Takahiko

Staff

Ishikawa Makoto

Features
In an ultra-high vacuum, the sample is irradiated with X-rays
from the anode (Al, Mg) and the energy of the knocked-out
electrons (photoelectrons) is measured to determine the typeand bonding state of the atoms at the top surface of the sample(within a few nm). Mapping and depth analysis with the cluster
ion gun are also possible. The Al ion gun is equipped with amonochromator. It also has a neutralisation gun to avoid sample charging.

No. 28Name

Ion Coater

Model No.

SC-701AC

Manufacture

Sanyu Electron

Location

Joint Research Laboratory 104

Adviser

Murakami Kenji

Staff

Ishikawa Makoto

Features
It applies a thin coating of Au onto a non-conducting
specimen for SEM observation.
The Au coating films typically have a thickness range

Specifications

16

The discharge gas : Air
Standard ion current : 5 mA

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 29Name

General Purpose AFM

Model No.

SPI-3800

Manufacture

Seiko Instruments

Location

Joint Research Laboratory 304

Adviser

Iwata Futoshi

Staff

Miyake Aki

Features
A probe (cantilever) scans a few nm away from thesurface of the sample to measure sample shape. The
resolution in the height direction is so high that steps ofa single atomic layer can be observed.

No. 30Name

UV-Vis Spectrophotometer

Model No.

V-670

Manufacture

JASCO

Location

Joint Research Laboratory 304

Adviser

Murakami Kenji

Staff

Takasawa Taishi

FeaturesThis is an UV-VIS-NIR spectrophotometer. Measurementsfrom 190 - 3200 nm are possible. An automatic absolute reflectance measuring device is also equipped.

17

Detection

Optical lever

Measurement Modes

AFM (contact mode)
DFM (tapping mode)

Scan Range

X, Y = 20 μm, Z = 1.5 μm

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 31Name

Fluorescence Spectrophotometer

Model No.

FP-8600, FP-8700

Manufacture

JASCO

Location

Joint Research Laboratory 304

Adviser

Kawai Hideki

Staff

Takasawa Taishi

Features
It is an instrument for qualitative andquantitative analysis using fluorescence.

Specifications

Light source: 150W, shielded house xenon lamp
Sensitivity: S/N > 150 (P-P), S/N > 600 (RMS)

Measuring Wavenumber
Range

200 - 850 nm (ex) and zeroth-order light
100 - 1010 nm (em) and zeroth-order light

Band Width1, 2.5, 5, 10, 20, L5, L10 nm (ex)2, 5, 10, 20, 40, L5, L10, L20 nm (em)Wavelength Scanning
Speed

10～60000 nm/min (ex)20～120000 nm/min (em)Resolution (at 546.1 nm)

1.0 nm (ex), 2.0 nm (em)No. 32Name

Thermal Analysis (TG-DTA)

Model No.

DTG-60A

Manufacture

SHIMADZU

Location

Joint Research Laboratory 1304

Adviser

Toda Mitsuo

Staff

Kusanagi Hiroki

Features
Thermal analysis is a method of measuring the properties of a substance as a function of temperature ortime while changing the temperature of the substanceaccording to a set program. This machine can measure thermo gravimetry (TG) and differential thermal
analysis (DTA) simultaneously. TG data indicate theamount of components changed from the sample.

Measuring temperature range

room temperature～1000℃

Measuring range (TG)±500mgMeasuring range (DTA)±1～±1000μV

DTA data show the transition temperature of thesample and whether it is an exothermic or endothermic phenomenon.

18

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 33Name

DSC

Model No.

DSC-60Plus

Manufacture

SHIMADZU

Location

Joint Research Laboratory 304

AdviserNeo Yoichiro

Staff

Kusanagi Hiroki

FeaturesBy detecting the heat flow difference between a reference material and a sample, Differential Scanning
Calorimetry (DSC) obtain a DSC signal with the vertical axis being the calorific value (mW), which canbe used to determine the temperature (melting point,
glass transition temperature) and calorific value(reaction energy) of endothermic and exothermic
reactions of the material. It is also equipped with
optional software for specific heat analysis. The DSC
measurement has the additional measurement requirement of a temperature range at which the sample
does not decompose.

Measuring temperature range-140℃～600℃

Heat flow sensing range±150mW

No. 34
Name

Organic Trace Elemental Analysis

Model No.

Flash EA

Manufacture

Thermo Electron

Location

Joint Research Laboratory 304

Adviser

Toda Mitsuo

Staff

Kusanagi Hiroki

Features
It can determine the proportions of C, H, N and S
components in organic compounds. Sample is combustion-cracked and oxidised at temperatures above
900°C and in an oxygen atmosphere. Then the combustion gases are reduced and become CO2, H2, N2

Analytical principle

Gas chromatography

and SO2 at last. They are passed through a separation

Combustion method

Dynamic flash-burning method

AnalyteCHNS

Detection limits

Less than 1μg

column to separate the peaks and determined thecontent of each component.

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Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 35
Name

Electrochemical Analysis System

Model No.

HZ-Pro S4

Manufacture

HOKUTO DENKO

Location

Joint Research Laboratory 304

Adviser

Murakami Kenji

Staff

Kusanagi Hiroki

Features
HZ-Pro is a modular multi-channel electrochemical
analysis system for all electrochemical measurements,
including battery evaluation tests, corrosion tests andMaximum output current±500mA

Control voltage±10V

Current detection range±500mA～±50nA

Measuring frequency range

10μHz～1MHz

analytical tests. The most commonly used measurement methods in our center are chronoamperometry(CA), cyclic voltammetry (CV), constant potential AC
impedance (IMP) and TAFEL extrapolation (TAFEL).
Charge and discharge measurements (CDC) are also
possible.

No. 36
Name

Battery Charge / Discharge System

Model No.

HJ1001SD8

Manufacture

HOKUTO DENKO

Location

Joint Research Laboratory 304

Adviser

Murakami Kenji

Staff

Kusanagi Hiroki

FeaturesThis system automatically performs 'charging' and'discharging' to evaluate battery performance, and issuitable for a wide range of measurements, from basic
battery research and development to life and evaluation

Channel

8 channels, Independent format,
extensible

Voltage range

10V

Current range

1A～100μA、AUTO

Control mode

Constant current (CC), constant current/
constant voltage (CC/CV), etc.

tests. The independent format of each channel allows
individual condition settings. It can also be used forlong-term measurements of up to 100 days.

20

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 37
Name

Zeta Potential Analyzer

Model No.

Zetasizer Ultra

Manufacture

Malvern Panalytical

Location

Joint Research Laboratory 304

Adviser

Sakamoto Naonori

Staff

Hayakawa Toshihiro

Features
The particle size and zeta potential of particles dispersedin solution can be measured■particle size
Measuring
principles■zeta potential

Non-Invasive Back-Scatter (NIBS),
Dynamic light scattering (90 and 13 degree),Multi-Angle Dynamic Light Scattering (MADLS)

Measuring principle

Measuring angle 173, 13, 90 degree
Measuring
Diameter: 0.3 nm～15 μm
range

Concentration
range

3.8 nm～100 μm

Concentration range

1 mg/mL～40 %w/v

range

Max: 40 %w/v

methods and light scattering phase analysis.

Size range

Sample conductivity

Min: 0.1 mg/mL (15 kDa protein)

Combination of mixed-mode measurement

Max: 260 mS/cm

No. 38Name

XRF

Model No.

EDX-8000

Manufacture

SHIMADZU

Location

Joint Research Laboratory 304

Adviser

Murakami Kenji

Staff

Miyake Aki

Features
It is an Energy dispersive X-ray fluorescence analyser(EDX-XRF). It can also measure light elements by evacuating its sample chamber. Not only for the qualitative andquantitative determination of elements in samples, but also
for the measurement of plating thickness.
Detectable Elements

21

Vacuum mode: C ~ U
Atmosphere: Al ~ U

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 39Name

ESCA

Model No.

ESCA-3400

Manufacture

SHIMADZU

Location

Joint Research Laboratory 304

Adviser

Ishikawa Makoto

Staff

Ishikawa Makoto

Features
ESCA (Electron Spectroscopy for Chemical
Analysis), which is also known as XPS, is aneffective method to analyse elements in the very

Specifications

surface layer of solids 5 to 50 Å. This is the way

Sensitivity: 700000 cps at half-width 1.15 eV in Ag 3d 5/2(Mg 300 W equivalent)
Resolution: FWHM 0.8 eV at Mo 3d 5/2

to determine the binding energy of core electrons

Sampleon a solid surfaces based on the measurement of

X-ray Gun Conical type, Anode Mg, Voltage 0 - 12 kV

the kinetic energy of photoelectrons emitted bysoft X-ray irradiation.

Max 10 mmφ, Thickness 5 mm, Max 10 loading possible

Analyser

Retarding field analyser, Pass energy 25, 75, 150 eV

EnergyScanning -10 - 1150 eV (Mg), Accuracy ±0.2 eV

No. 40Name

W-SEM

Model No.

JSM-6360LA

Manufacture

JEOL

Location

Joint Research Laboratory 1010

Adviser

Ishikawa Makoto

Staff

Miyake Aki

Features
It is a general-purpose SEM. Its filament is tungsten(W). Observation at magnifications of up to 10,000x
is possible. Low vacuum mode is equipped.

Specifications

Resolution:
3.0 nm (at High Vacuum Mode and 30 kV)
4.0 nm (at Low Vacuum Mode and 30 kV)
Magnification: 5 - 300,000x (5x possible)

SampleMax 32 mmφ

Electron Gun

Accelerating voltage: 0.5 -30 kV

Type of Image

SE image (HV mode), BSE image (LV mode)

Sample Exchange Stage draw out type22

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 41Name

XRD

Model No.

RINT Ultima II

Manufacture

RigakuLocation

Joint Research Laboratory 1010

Adviser

Sakamoto Naonori

Staff

Koyama Tadanobu

FeaturesThis is a previous model of the Thin Layer XRD(No.N1), which is optimized for thin film analysis. It
can measure as well as No.N1.

No. 42Name

Wide Area AFM

Model No.

XE-70

ManufacturePark Systems

Location

Research Institute of Electronics 243

Adviser

Ishikawa Makoto

Staff

Miyake Aki

FeaturesThis is the Atomic Force Microscope (AFM), which allows
even beginners to make high magnification and high quality
observations. The included optical microscope allows direct
observation of the sample surface from above with the cantile-

Specifications

ver attached, making it highly accessible and extremely easy

Horizontal resolution: less than 1.5 nm
Vertical resolution: less than 0.05 nm
Z-axis coarse resolution:
0.08 μm (stroke: 27.5 mm)

to adjust the optical path. True non-contact observation is

SampleMax 100 mm x 100mm x T 20 mm

possible because of the mechanical independence of the XY

Scanning Range

Max 50 μm x 50 μm x 12 μm

Optical Microscope

XGA 1024 x 768 pixel CCD(flame max 20 Hz)

Field of View

480 μm x 360 μm

and Z scans and the high response frequency of the wide-area
Z-axis drive (liner movement mechanism).

23

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 43Name

Ion Slicer

Model No.

EM-09100 IS

Manufacture

JEOL

Location

Research Institute of Electronics 243

Adviser

Sakamoto Naonori

Staff

Shimizu Hikaru

FeaturesThis is a thin film sample preparation equipment. It irradiate themasking belt set on the sample surface with an ion beam toform a thin area.

No. 44
Name

Solar Simulator

Model No.

VK-SS-50, VK-IPCE-10

Manufacture

SPD Laboratory, Inc.

Location

Research Institute of Electronics 243

Adviser

Murakami Kenji

Staff

Shimizu Hikaru

FeaturesThis device measures the I-V characteristics, etc. of solar cells by exposing them to LED-simulated sunlight.
In addition, IPCE characteristics can be measured.
Light source

22 LEDs (70mW/cm2, 0.01SUN～1SUN)

Exposure area

50mm×50mm

Spectral response measuring instrument

Constant energy or constant photon irradiation (10mm×10mm), 100μW

Measurements

I-V measurement (±10V, ±1A(1pA possible)), optimum operating point, maximum output operating voltage, maximum output operating current, open circuit voltage, short circuit current, curve
factor, conversion efficiency, maximum power point tracking (MPPT) function, IPCE measurement, spectral response (A/W) (350nm～1000nm)

24Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 45Name

Handy Lapping Machine

Model No.

HLA-2

Manufacture

JEOL

Location

Research Institute of Electronics 243

Adviser

Sakamoto Naonori

Staff

Shimizu Hikaru

Features
Sample polishing

No. 46
Name

Osmium Coater

Model No.

Neoc-ST

Manufacture

meiwafosis

Location

Research Institute of Electronics 243

Staff

Shimizu Hikaru

Features
Osmium metal film is deposited by a CVD deposition method in which osmium tetroxide sublimation
gas is introduced into the vacuum chamber and plas-

25

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 47Name

NMR

Model No.

Avance III HD400

Manufacture

BRUKER

Location

Innovation and Social
Collaboration Building 208

Adviser

Tanaka Yasutaka

Staff

Hayakawa Toshihiro

Features
Nuclear Magnetic Resonance

No. 48Name

Mass sSpectrometer

Model No.

micrOTOF

Manufacture

BRUKER

Location

Innovation and Social
Collaboration Building 208

Adviser

Sato Kohei

Staff

Hayakawa Toshihiro

Features
Mass Spectrometer26

Shizuoka University, Hamamatsu Instrumental Analysis Center
No. 49Name

Circular Dichroism spectrometer

Model No.

J-720

Manufacture

JASCO

Location

Innovation and Social
Collaboration Building 208

Adviser

Tanaka Yasutaka

Staff

Hayakawa Toshihiro

Features
Determination of stereo-chirality of optically active
molecules and determination of the secondary structureof biopolymers such as proteins and nucleic acids canbe carried out using samples in solution. Standard
measuring wavelength: 165-900 nm.

No. 50Name

3D PrinterModel No.

Bellulo200

Manufacture

Systemcreate

Location

Joint Research Laboratory 204

Adviser

Ishikawa Makoto

Staff

Hayakawa Toshihiro

Features
It is an FDM 3D printer. The filament types are PLA and
ABS. A software "Simplify3D" attaches. You can start 3D
printing soon by bringing your STL data.

27