®

DLT2B - FLOW RATIO CONTROLLER
PROCESS OPTIMIZATION THROUGH PRECISE FLOW RATIO CONTROLW W W . M K S I N S T . C O M

Flow Solutions

DELTA II EtherCAT™

The DELTA™ II Flow Ratio Controller is a critical process control instrument in the MKS lineof digital control, web-enabled products providing the latest in gas flow ratio measurement
and control technology necessary to meet the demands of multi-channel flow distribution.
The DELTA II mass flow ratio controller divides and controls mixed process gas flows toeither multiple chambers or zones within a process chamber at ratios specified by the user
to maximize process uniformity and repeatability. The DELTA II flow ratio controller with its
improved performance and more compact design is the second generation of MKS industry
leading DELTA controllers enabling process gas flow ratio control.
Widely used in a variety of flow splitting applications such as etch, strip, and CVD, theDELTA II provides the user with the ability to distribute gas or gas mixtures to two different
zones in a process chamber. Send the DELTA II a gas – or any mixture – and a ratio set
point and the DELTA II will split the gas into two separate output channels automatically andprecisely.

Features & Benefits
Improves Process Performance• Wider dynamic ratio control range andfaster gas flow response resulting inshorter process cycle time and 		increased throughput• Accurately controls flow ratio providing
for better process optimization andrepeatability• Digital control loop provides rapid
response to set point independent of
the gas mix• Embedded e-diagnostics increases
tool uptime through reduction of“No Problem Found” product replacements— Ability to check functionality without		 removing the controller— Allows monitoring of performance		 parameters during operation
Protected under one or more of the following U.S.
patents: No. 6,668,642, No. 7,007,007, US07621290B2 orInternational Patents and Patents pending.

Easy to Integrate and Operate• Straightforward configuration and 		diagnostics through Ethernet interface— Uses standard web browser, no 				 special software required— Includes remote PC application
Reduces Costs and Complexity• Fewer components than dual MFC 		
arrangements reducing critical I/O costs• Smaller footprint

Throughput and process control have always been criticalto the semiconductor device manufacturer. With theadvent of 300 mm wafers and dual process chambers,
new methods of control gas flow distribution have become
increasingly needed. 300 mm wafer processing often
requires tunable control of gas distribution across thewafer to provide better process uniformity. Dual processchambers require proper gas distribution for chambermatching from single source gas panels.
The DELTA II flow ratio controller is the second generationof MKS DELTA controllers enabling process gas flow ratiocontrol. The DELTA II has a wider dynamic ratio control
range and faster development of chamber flow while being
more adaptive to different tool and process conditions.
MKS has developed a unique patented ratio control
algorithm enabling ratio and flow response times of lessthan two (2) seconds (See Figure 1). This control algorithm
also enables a twenty to one ratio control range, morethan double its industry leading predecessor. The DELTA
II maintains tight ratio control while input flow is changed(See Figure 2). All this in a more compact packagewith the additional features of web enabled setup anddiagnostics.

Figure 1 — Ratio ResponseThe DELTA II ratio controller has a dynamic ratio range of up to 20:1 withratio response times under 2 seconds.

The DELTA II’s diagnostic feature allows the user to checkthe DELTA’s performance in-situ, lowering costs throughreduced removal of “No Problem Found” devices. Thisfeature is enabled through a web browser utility accessed
through the device’s Ethernet port. This utility uses a
standard web browser – no special software is required.

Figure 2 — Flow Response
The DELTA II ratio controller maintains ratio while input flow is changed.

Specifications
PerformanceFull Scale Ranges (each channel)(nitrogen equivalent – Q)

500, 1000, 2000, 3000, 5000 and 10000 sccm 				Percentage Accuracy1			
±2% set point (for percent set points above 10%)Channel Flow Control Range 			 0, 5 to 100% Full Scale
Input Ratio Range 			 1:1 to 20:1 and 20:1 to 1:1
Percentage Repeatability 			 ±0.3% of set point
Resolution 			
0.02% of channel Full Scale
Maximum Operating Outlet Pressure 		 200 Torr at maximum flow rate through all channels
Maximum Allowable Outlet Pressure Differential		
50 Torr with the same percentage flow through all channels			(highest to lowest pressure channel)
Normal Operating Pressure Differential		
<150 Torr (<450 Torr for 10000/10000)
Percentage Settling Time 			 <3 seconds (typical dependent on downstream conductance matching)
Maximum Inlet Pressure 			
150 psig (non-operational)
Temperature Coefficients
Zero			 <0.05% Full Scale/°C (500 ppm)						Span			
<0.08% of Reading/°C (800 ppm)
Warm Up Time 			 60 minutes (minimum with device powered and at equilibrium with ambient)
Normal Operating Temperature 			 10 to 60°C
Storage Temperature		 -20 to 65°C
Storage Humidity 			 0 to 95% relative humidity, non-condensing
Temperature Accuracy 			+2°C
Temperature Resolution			 0.1°C
Compliance2CE
12Includes non-linearity, hysteresis, and non-repeatability.										An overall metal braided, shielded cable, properly grounded at both ends, is required during use.		

Mechanical		
Fittings
Inlet
OutletSwagelok® 4 VCR® 							Male (non-rotatable)							Male (non-rotatable)

Leak Integrity										External (scc/sec He)<1x10-10
Through Closed Valve< 2% of Channel F.S. at 400 Torr differential to < 1 Torr

Wetted Materials		

316 S.S. VAR (equivalent to 316 S.S. SCQ for semiconductor quality);		
316 S.S., Inconel®, KM-45, PTFE, Hastelloy® (sensor tube only)

Surface Finish

5 microinch average Ra

WeightLess than 5 lbs. (2.3 kg)		

Electrical		EtherCAT®

Input Power Required+24 VDC ±10% (10 Watts)

Connector

2 x RJ-45 (comm.) male, M8 male, 5 pin (power)

Data Rate Switch/Selection

No switch

Comm. Rate(s)100 Mbps

MAC ID Switches/Addresses

3 switches, 16 positions

Network Size

Up to 4095 nodes

Visual Indicators

LED Power (green), LED Run (green), LED Error (red), LED Comm (green)

The MKS DELTA III Flow Ratio Controller shall not be used with any gas mixture which will react with each other as gas reactions are likely to affect thedevice flow measurements and may damage the device.
The MKS DELTA III Flow Ratio Controller uses thermal sensors which add heat energy to the gas (and gas mixture) which may cause the gas to decompose
and a mixture to react. Please consult MKS Applications Engineering if this is a concern for the intended application of the device.

Ordering Information
Ordering Code Example: DLT2B052183R110

CodeConfiguration

DELTA II Flow Ratio Controller

DLT2B

DLT2B

ReservedReserved

0Channel Flow Ranges (Flow 2/Flow 1) (XX)500/500
1000/1000
2000/2000
3000/3000
5000/5000
10000/10000
For other ranges, consult factory.

052			13			23			33			5253			
14			Ratio (Flow 2:Flow 1) (Y)1:1
Connector (B)EtherCAT
Control I/O (C)EtherCAT (units must select 3)
Control Type (A)Ratio: Q2/Q1 or Q1/Q2
Control Channel (Z)Q1 Control: Q1/Q2 or Q1/(Q1+Q2)
Q2 Control: Q2/Q1 or Q2/(Q1+Q2)
Firmware (QQ)
Firmware Revision
Unless otherwise specified, MKS will ship firmware revision current to date.

118833RR

1			121010

Dimensional Drawing —Note: Dimensions are nominal values
in inches (reference only).

DELTA II EtherCAT - 12/18© 2018 MKS Instruments, Inc.
All rights reserved.

MKS Instruments, Inc.
Global Headquarters

MKS Instruments, Inc.
Flow Solutions

2 Tech Drive, Suite 201
Andover, MA 01810

Six Shattuck Road
Andover, MA 01810

Tel: 978.645.5500			
Tel: 800.227.8766 (in U.S.A.)
Web: www.mksinst.com

Tel:978.975.2350

MKS products provided subject to the US Export Regulations. Diversion or transfer contrary to US law is prohibited.
Specifications are subject to change without notice. mksinst™ and DELTA™ are trademarks of MKS Instruments, Inc., Andover,MA. Swagelok® and VCR® are registered trademarks of Swagelok Marketing Co., Solon, OH. Inconel® is a registeredtrademark of Inco Alloys International. Hastelloy® is a registered trademark of Haynes International, Kokomo, IN. EtherCAT®
is a registered trademark and patented technology, licensed by Beckhoff Automation GmbH, Germany.