ArF Immersion Scanner

Proven Solutions Through Evolution

ArF Immersion Scanner for Middle Critical Layers That Is Ideal for Cutting-edge
Semiconductor Manufacturing
This is the NSR-S625E ArF immersion scanner, which inherits the proven Streamlign platform.
It delivers a throughput approximately 1.3 times that of its predecessor, the NSR-S622D, and has significantly improved
its operational stability.
Incorporating an advanced inline Alignment Station (iAS), the NSR-S625E
contributes to enhanced production efficiency for a wide range ofsemiconductor devices.

NSR-S625E

PerformanceResolution≦ 38 nm

NA1.35

Exposure light source

ArF excimer laser (193 nm wavelength)

Reduction ratio

1:4

Maximum exposure field

26 mm × 33 mm

Overlay≦ 2.5 nm (MMO*1)

Throughput≧ 280 wafers/hour (96 shots)*1 Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S625E#1 to S625E#2)

Key Features•	Streamlign Platform
Stream Alignment• Straight Line Auto-Focus enables quick wafer profile
mapping and enhanced focus control.
• Enables increased alignment sites with minimal
productivity impact using Five-Eye FIA

Bird’s Eye Control• Hybrid encoder/interferometer system delivers optimal
stage performance.
2Modular Structure• Simplifies installation and maintenance by means of themodular design•	Advanced inline Alignment Station (iAS)

Deposition

Resist CoatingiAS

NSR

Meas.

Exposure

Deposition

Feed forward correction
for every wafer
Measure and FF- Dense sampling- High order grid correction
Alignment on the NSR- Sparse sampling- Linear grid correction

WARNING

Resist Coating

Dev.

iAS

OVL
Meas.
Meas.

Etching

NSR

Exposure

Feed backFeed forward correction
for every waferiAS

Measure and FF- Dense sampling- NSR
High order grid correction+

Alignment

Corrections
Alignment on the NSR- Sparse sampling- Linear grid correction

Dev.

OVL
Meas.

Etching

Feed backAn alignmentiAS station enables fast and ultra-precise wafer measurement and grid error correction without
sacrificing the throughput of the lithography system. When connected inline to a lithography system, it is
known as iAS, and allows multi-point alignment for every shot, dramatically enhancing the accuracy of thesystem without impacting its throughput.
NSR
CLASS 1 LASER PRODUCT+Alignment
Corrections

TO ENSURE CORRECT USAGE, READ MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.

The export of this product is controlled by Japanese Foreign Exchange and Foreign Trade Law and International export control regime. It shall not be exported withoutauthorization from the appropriate governmental authorities.
Performance and equipment are subject to change without any notice or obligation on the partof the manufacturer. Products and brand names are trademarks or registered trademarks of theirrespective companies. July 2024
©2024 NIKON CORPORATION

https://www.nikon.com/business/semi/

Nikon Corporation

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