本田財団レポート No.129
第 29 回本田賞授与式 記念講演（2008 年 11 月 17 日）「収差補正による電子顕微鏡の新次元」
マキシミリアン・ハイダー博士
ハラルド・ローズ博士
クヌート・ウルバン博士

With Aberration Correction
to a New Dimension in Electron Microscopy
Commemorative lecture at the 29th Honda Prizeawarding ceremony on the 17th November 2008

Dr. Maximilian Haider
Dr. Harald RoseDr. Knut Urban

マキシミリアン・ハイダー博士
Dr. Maximilian Haider■出身1950 年 1 月 23 日（58 歳） オーストリア・フライシュタット■学 歴
キール大学物理学科入学
ダルムシュタット工科大学 H.ローズ物理学研究室卒業■職 歴1982 年
ダルムシュタット工科大学応用物理研究所
H.ローズ･グループ科学者
1983 年
欧州分子生物学研究所 A.V.ジョーンズ・グループ 科学者
1987 年
ダルムシュタット工科大学 H.ローズ研究室 博士
1989 年
走査型透過電子顕微鏡開発・応用グループ長
1996 年
200 キロボルト級透過型電子顕微鏡収差補正研究
プロジェクト長
1996 年CEOS 社 社長(ハイデルベルグ)■Born
23 January 1950, Freistadt, Austria■Education
Pre-diploma examination, University of Kiel
Continuation of Physics, Darmstadt University of Technology (TU Darmstadt)
Examination of Physics Diploma, TU Darmstadt, Prof. Rose
■Career
1982 Scientist, group of Prof. Dr. H. Rose at Inst. of Applied Physics
1983 Scientist, European Laboratory, Molecular Biology, Dr. A. V. Jones
1987 Ph. D. to Dr. rer. nat. at the TU Darmstadt, Prof Rose
1989 Head of Group, Application of a Scanning Transmission Electron
Microscope and development of Electron Microscopes
1996 Head of research project: Cs-Correction of a 200 kV TEM
1996 Managing Director, CEOS GmbH, Heidelberg

ハラルド Ｈ．ローズ博士
Dr. Harald H. Rose■出身1935 年 2 月 14 日（73 歳） ドイツ・ブレーメン■Born
14 February 1935, Bremen, Germany■学

歴ダルムシュタット工科大学数理物理学科入学
ダルムシュタット工科大学物理学科修士/博士課程卒業■Education
Studies in Physics & Mathematics, TU Darmstadt
Master Degree in Physics and Ph. D. in Physics, TU Darmstadt■職歴1965 年1971 年
1976 年
1977 年
1980 年
1987 年
2003 年■Career
1965 Post Doc. Position, Institute of Theoretical Physics, TU Darmstadt
1971 Associate Professor, Institute of Applied Physics, TU Darmstadt
1976 Principal Research Scientist, New York State Department of Health1977 Adjunct Professor, Rensselaer Polytechnic Institute, Troy, NY
1980 Professor of Physics, Institute of Applied Physics, TU Darmstadt
1987 Visiting Professor, Physics, Jiaotong University Xian, China
2001 Research Fellow, Materials Science, Argonne National Lab., Argonne IL
2003 Research Fellow, Advanced Light Source, L. Berkeley National Lab.

ダルムシュタット工科大学物理理論研究所 研究員
ダルムシュタット工科大学応用物理研究所 准教授
ニューヨーク州厚生部 主席研究科学者
レンセラー総合技術研究所物理学 教授(ニューヨーク州)
ダルムシュタット工科大学応用物理研究所 教授
西安交通大学物理学 客員教授(中国)ローレンス・バークレイ国立研究所 特別研究員(カリフォルニア州)

クヌート Ｗ．ウルバン博士
Dr. Knut Wolf Urban■出身1941 年 ドイツ・シュツットガルト■Born1941, Stuttgart, Germany■学歴シュツットガルト工科大学物理学科卒業
シュツットガルト工科大学自然科学科博士課程修了■Education
Studied physics and Doctor Degree, natural sciences, Technical Univ. of Stuttgart■職歴
マックス・プランク金属研究所 (シュツットガルト) 研究員
バーバー原子力研究所 (インド・ムンバイ)
東北大学多元物質科学研究所
1984 年
1987 年
1987 年
2003 年

エアランゲン大学素材科学部 教授(ドイツ)
アーヘン大学実験物理部長(ドイツ)
ユーリッヒセンター微細構造研究所設立(ドイツ)アーネスト・ルスカ (超高分解能電子顕微鏡) セン
ター設立 (ドイツ)■Career
Max-Planck-Institute for Metals Research in Stuttgart, Germany
Section de Recherche de Metallurgie Physique at CEN de Saclay/ Paris, France
Bhabha Atomic Research Centre, Bombay, India
Institute for Advanced Materials Processing, Tohoku University, Sendai, Japan
1984 Professor in Materials Science, University of Erlangen1987 Chair for Experimental Physics, RWTH Aachen University
1987 Founded Institute for Microstructure Research, Research Centre Juelich
2003 Founded Ernst Ruska Centre
2004 President and Vice-president, German Physical Society

このレポートは、2008 年 11 月 17 日 東京、帝国ホテルにおいて行われた第 29 回本田賞授与式記念講演の要旨をまとめたものです。
This report is the gist of the commemorative lecture at the 29th Honda Prize Awarding Ceremony on the 17th November 2008
Imperial Hotel,Tokyo.

With Aberration Correction
to a New Dimension in Electron Microscopy
Maximilian Haider, Harald Rose and Knut Urban

Fig 1 Richard P. Feynman,„There's Plenty of Room at the Bottom”, 1959

〈Fig 1〉 It would be very easy to make an analysis of any complicated chemical substance;
all one would have to do would be to look at it and see where the atoms are. The only trouble
is that the electron microscope is one hundred times too poor … I put this out as a challenge:
Is there no way to make the electron microscope more powerful?”

1. Introduction.

Fig 2

Fig 3

〈Fig 2〉〈Fig 3〉 To see the atoms is an old dream in science. To be able to derive properties
and functions directly from an observation of the basic building blocks of matter appeared tobe like a view into the workshop of nature. Is there no way to make the electron microscope
more powerful, i.e. to increase its resolution? Today we know the answer: Yes, there is a way,21

and we were able to realize it in recent years. It is based on aberration-corrected electron
optics.

Fig 4

Fig 5

〈Fig 4〉〈Fig 5〉 The resolution limit of a microscope is defined as the smallest distance
between two object points which can just be distinguished as two separate points in the image.
More than 130 years ago, Ernst Abbe showed that this resolution improves when the
wavelength of the employed radiation decreases and when the angular range of rays leaving
the object and entering the objective lens of the microscope increases.

Fig 6〈Fig 6〉 〈Fig 7〉

Fig 7

Electron microscopy makes use of the remarkable property of fastelectrons to behave not only as particles but also as waves. Fast electrons can be produced inaccelerators where they traverse an electric tension of a few hundred thousand Volts. The
faster the electrons the smaller is their wavelength. The accelerator of a modern electron
microscope operates typically at 200,000 or 300,000 Volts, and the corresponding wavelengthamounts to 2.5 or 2.0 picometers, respectively (1 pm = 10-12 m).

22

Fig 8〈 Fig 8 〉 〈 Fig 9〉

Fig 9

Modern light microscopes have reached their maximum physicallypossible resolution in the order of magnitude of the wavelength of light (about 0.5
micrometers). This achievement results from the fact that high-quality lens systems can beconstructed essentially without aberrations. In contrast, until recently the quality of electron
lenses was so bad that, as a result of aberrations, the resolution was limited to about 200
picometers (about one hundred times the wavelength).

Fig 10

Fig 11〈Fig 10〉〈Fig 11〉 This behavior largely excludes the possibility to image and study theatomic structure of matter, to the great regret of scientists and engineers. Actually, modern
science, from materials via technology to biology and medicine, experiences a burning needfor atomic studies.
In principle one always has to deal with two fundamentally different types of lensaberrations, so-called geometrical aberrations and chromatic aberrations. The latter originate
from the fact that the refractive power of a lens varies with the wavelength of the radiation(color) and therefore, when light with a spectrum of colors is employed or an electron beamwith a certain energy width, the lens is unable to focus the constituent rays of different color(energy) into a common point. The most important geometrical aberration is spherical23

aberration. It causes the focal length of a lens to depend on the angle of incidence of theradiation entering the lens. As a result, the focal length is shorter for rays passing the lens at
its periphery compared to paraxial rays passing the lens in its central region. In the past, as aresult of the very low quality of electron lenses, electron-optics engineers made the angle ofthe bundle of rays coming from the object and entering the lens very small by placing anaperture stop at the back focal plane of the lens. However, the information on high-resolution
details (e.g. the atomic structure) is lost by this measure because the high-angle beams
carrying the high-resolution information are excluded from image formation.
Again it was Ernst Abbe who showed (for light optics) that systems consisting of
converging and diverging lenses can be designed in such a way that the individual lenses aremutually compensating their aberrations. Electron lenses consist of suitably formed magnetic
fields produced by coils through which an electric current is flowing. Unfortunately, a majordifference between light-optical (glass) lenses and electron lenses is that, according to thelaws of physics, diverging round lenses cannot be produced for electrons.

Fig 12〈Fig 12〉 This fundamental difficulty was first recognized in 1936 by Otto Scherzer ofDarmstadt University. He also suggested, on the basis of extended theoretical work, a way outof this dilemma by adding multipole lenses to the round lenses of the microscope.

24Fig 13

Fig 14〈Fig 13〉〈Fig 14〉 Moreover, he proved mathematically that special systems consisting ofboth types of elements are-in principle-largely free of aberrations.
Since then several fruitless experimental attempts were made to realize Scherzer’s
correction principles and to construct correctors compensating for the spherical and chromaticaberrations. Although these projects demonstrated that correction works in principle (“proofof principle”), none of them achieved an improvement of resolution.

Fig 15

Fig 16〈Fig 15〉〈Fig 16〉 The main reasons for this failure of the correction experiments were: (a)the basic microscope was not stable enough, (b) the interference with the environment had
been underestimated, (c) the entire system was too complex and could not be aligned within asufficiently short time, and (d) it was not possible to measure all resolution-limiting
aberrations at a sufficient rate and precision and to correct them with the electronic equipment
available at that time. The disappointment was so severe that at the end of the nineteen
eighties a panel of experts advised the American National Science Foundation to no longer
fund such developments since it appeared unlikely that any further progress could be expected
within a reasonable period of time.

25

Fig 17〈Fig 17〉 At about the same time, in 1989, Max. Haider, Harald Rose and Knut Urban had
intensive discussions on the prospects of aberration correction during the “Three Countries
Meeting” on electron microscopy (organized by the Austrian, the German and the Swiss
Electron Microscopical Societies) in Salzburg, Austria. At the end, the three were convincedthat with the help of a new type of corrector involving two hexapole lenses the successfulcorrection of spherical aberration in a modern transmission electron microscope (TEM)should be feasible. They hoped that this would provide for the first time a basis for atomic
resolution. An advanced high-resolution TEM was selected as the basic instrument. In
particular this microscope was equipped with a highly stable field-emission electron source
providing electron beams with an extremely narrow range of energies. Therefore, theexpected result could be achieved by spherical-aberration correction alone, additional
chromatic correction would not be necessary thus substantially simplifying the task.

Fig 18

Fig 19〈Fig 18〉〈Fig 19〉 At the end of 1990 the three submitted a grant application to the German
Volkswagen Foundation. Their proposal was approved one year later and the development of
the corrector started in January 1992. The joint project to improve the resolution of a medium-26

voltage instrument for atomic characterization of materials was covered by the electronoptical theory of Rose at the Technical University of Darmstadt, the experimental
development of Haider at the EMBL (European Molecular Biology Laboratory) at Heidelberg,
and the subsequent application in materials science by the group of Urban at the ResearchCentre Jülich. Already in 1994, the correction power of the novel hexapole-corrector could bedemonstrated successfully on an optical test bench. This corrector generates a negative
spherical aberration that suffices to compensate for the spherical aberration of the objective
lens. Based on this proof of principle, the project obtained from the Volkswagen Foundation
the final funding for realizing the corrected microscope at the Heidelberg laboratory.
2. Design Principles of the Hexapole Corrector
A magnetic hexapole field produces a force on an electron, whose strength is proportional
to the square of the lateral distance from the optical axis. The direction of this force depends
on the azimuth angle about the axis and changes its sign every 60 angular degrees. Therefore,a bundle of electrons propagating on the mantle of a cylinder parallel to the axis experiences athree-fold deformation (ray deviation of second order) after passing the hexapole field.
However, due to the particular dependence of the force on magnetic-field strength also athird-order rotationally symmetric deformation occurs. As a result, a three-fold axial
aberration of second order and a rotationally symmetric spherical aberration of third orderarise at the image plane. The sign of the latter aberration is opposite to that of the sphericalaberration of a round lens. Therefore, hexapoles can be employed to compensate for the
spherical aberration of the objective lens of an electron microscope.

Fig 20

Fig 21〈Fig 20〉〈Fig 21〉 In order to utilize the negative spherical aberration of the hexapoles, onemust first get rid of their awkward large second-order aberrations. However, it is not possible
to eliminate the second-order path deviation in a system consisting solely of hexapoles. To

27compensate for this deviation, one needs two identical hexapoles and a telescopic round-lensdoublet. One hexapole is placed at the front focal plane of the first round lens, the otherhexapole at the back focal plane of the second lens. The transfer-doublet images the firsthexapole inversely onto the second hexapole. In this way, the second-order path deviations
cancel out whereas the third-order deviations add up. The resulting negative sphericalaberration at the image plane is proportional to the square of the hexapole strength. Hence, byappropriately adjusting this strength, the negative spherical aberration of the corrector
compensates for the positive spherical aberration of the objective lens. Since this corrector
only introduces a negative spherical aberration, one can conceive it as "spectacles" for theimperfect objective lens of the electron microscope.
3. Adjustment of the spherical-aberration corrected TEM

Fig 22〈Fig 22〉 The lenses of light-optical microscopes are manufactured with micrometer (10-6m) accuracy and subsequently glued together in an essentially for ever stable arrangement. In
order to achieve atomic resolution in an electron microscope, the electron lenses would haveto be produced and aligned with a precision in the nanometer (10-9 m) range. However, theelectrodes and the pole-pieces of electron-optical elements can neither be produced nor
mechanically aligned with this accuracy. Even if an ideal geometry of the pole-pieces could
be attained, the unavoidable magnetic inhomogeneities prevent the necessary accuracy of theimaging field. To maintain the required precision of the ray path within the lens system,
additional electromagnetic adjustment elements are needed. For this purpose, additional socalled stigmators and deflectors are incorporated into the system at appropriate positions.
With the help of these elements the unavoidable residual aberrations can be subsequently
eliminated.

28

Fig 23

Fig 24

Fig 25〈Fig 23〉〈Fig 24〉〈Fig 25〉 In order to be able to utilize the hexapole corrector and tosuccessfully set the stigmators and deflectors, the current state of the aberrations and of thealignment has to be known. Actually the design and implementation of high-precision
diagnostics and alignment procedures turned out to be a major task in the successful
realization of the project. The residual aberrations can be measured by employing the socalled “diffractogram-tableau” method. A diffractogram is obtained by taking an image of anamorphous specimen which is then subjected to a Fourier transform in a computer andsquared. The diffractogram tableau is composed of several such diffractograms each takenwith a different direction of illumination and arranged according to the direction of incidence.
By evaluating the tableau, one can measure the resolution limiting coherent aberrations andthus determine the state of correction of the whole microscope.

29

Fig 26

Fig 27

Fig 28〈Fig 26〉〈Fig 27〉〈Fig 28〉 To achieve the required precise adjustment in the shortest
possible time, the images are acquired with a CCD camera and the associated diffractogramsof the images are calculated on-line with a computer. The aberrations are deduced from thediffractograms by measuring the changes of focus and two-fold astigmatism induced byaltering the direction of incidence. This analysis provides also the values of the remaining
higher-order aberrations. An additional calculation gives the needed output of the voltages
and current drivers of the stigmators and deflectors for the compensation of all relevant
aberrations. By means of microprocessors the voltages and currents are applied to theappropriate electrodes and coils.
4. Experimental results and applications
The demonstration of the improvement of the resolution limit from 0.245 nm for theuncorrected microscope down to about 0.125 nm for the corrected instrument was achieved in
the first half of 1997. At this time, Bernd Kabius, a member of Urban’s group, started
working with the instrument in order to learn how to operate it for real materials science30

applications. On June 24th, 1997, he succeeded to obtain the first atomic-resolution images ofgallium-arsenide, a semiconductor employed in high-speed electronics. After this success, thefirst ever aberration-corrected transmission electron microscope was transferred to Jülich andinstalled there.

Fig 29Fig 30

Fig 31〈Fig 29〉〈Fig 30〉〈Fig 31〉 The first years of operation of the instrument at Jülich required
some patience. Although the innovative optics performed perfectly, it took painstaking two
additional years to trace down and cure a number of conventional technical problems. During
this time Haider also implemented a few modifications, which largely improved the electricalstability of the instrument. By the end of 2000 the instrument was in a perfect shape, anddemonstrates till today extraordinary performance. The materials science community was
enthusiastic about the progress achieved, i.e. genuine atomic resolution, when the group gave
their first extended report on a meeting of the American Materials Research Society in San
Francisco on April 17th, 2001. The auditorium could not accommodate all the scientists whowanted to hear about the new developments, the doors had to remain open to allow
participants standing in the corridor to listen.
31

The work at Jülich in the following years revealed that with an aberration-corrected
instrument a number of entirely new operation modes are possible. These were worked out indetail and set on a theoretically sound foundation. In particular, it is the NCSI (negative
spherical aberration-imaging) technique which has opened up entirely new possibilities foratomic-resolution materials investigations. Since for the first time oxygen and other lightnuclear-charge elements can be imaged directly (oxygen could in fact never be studied before
by any microscopic technique) scientists working on oxides, ceramics or other technicallyimportant compounds were enthusiastic about the potential of aberration-corrected electron
microscopy for their fields.

Fig 32

Fig 33

Fig 34〈 Fig 32 〉 〈 Fig 33 〉 〈 Fig 34 〉

An example of the results obtained in Jülich is themeasurement of how oxygen occupies particular atomic sites in Bariumtitanat (BaTiO3) andStrontiumtitanat (SrTiO3). Both ceramic materials belong to the group of perovskites
according to their atomic structure. They are used in the form of thin films in the electronics
field and can, for example, be found in memory chips used in cash cards. Their attractivefunctional properties are however only guaranteed if the material sticks to the chemical
32

formula down to the atomic level. Previously, one could only measure the mean occupation of
the atomic sites with the individual elements by chemical methods. This turned out to be notsufficient for a reliable materials characterization. Taking advantage of the novel imaging
modes applicable in the corrected TEM a new measuring technique was developed by which
the oxygen distribution over particular atomic sites can be measured very precisely. Thus it
was found that, employing current thin-film production techniques, a high density of defects
is formed in which the chemical formula is violated and a third of the oxygen positions is left
vacant. This changes dramatically the electronic properties there. The corresponding
publications in prestigious scientific journals found a lot of interest, and these results will help
to improve thin-film deposition techniques to achieve better materials and superior device
performance.

Fig 35

Fig 36

Fig 37

Fig 3833

Fig 39〈Fig 35〉〈Fig 36〉〈Fig 37〉〈Fig 38〉〈Fig 39〉 A second example of the innumerable
important applications, which can only be realized with the aberration-corrected electron
microscope, is the measurement of atomic positions with an unprecedented precision in thepicometer range. Just as a reminder: a picometer is typically a hundredth of the diameter of anatom.

Fig 40〈Fig 40〉 The Jülich group investigated the well-known compound Pb(Zr0.2Ti0.8)O3, atechnically important ferroelectric material, used for instance in the form of thin films inferroelectric memories.

34

Fig 41〈Fig 41〉 Employing aberration-corrected electron microscopy, they were able to study theatomic details of switching the direction of the ferroelectric polarization, i.e. the elementary
process which allows one to write and store information into the material. Over and above the
new insight that can be obtained this way with respect to the atomic background oftechnologically relevant processes, this study demonstrated that it is now possible to deriveand measure physically relevant materials properties on the basis of observations atom foratom.

Fig 42

Fig 4335

Fig 44

Fig 45

Fig 46

Fig 47〈Fig 42〉〈Fig 43〉〈Fig 44〉〈Fig 45〉〈Fig 46〉〈Fig 47〉 This means that about fifty years
after Richard Feynman’s famous lecture the materials scientists dream has become true,
thanks to aberration-corrected electron microscopy.

36

5. Impact on jobs

Fig 48

Fig 49〈Fig 48〉〈Fig 49〉 In 1996, Max. Haider and Joachim Zach founded the company CEOS
GmbH (Corrected Electron Optical Systems) at Heidelberg.

Fig 50

Fig 51

Fig 52

Fig 53〈Fig 50〉〈Fig 51〉〈Fig 52〉〈Fig 53〉 This company focuses on research, development andproduction of advanced optical components for modern and future generations of37

transmission, scanning transmission and scanning electron microscopes. Among these areaberration correction systems and electron monochromators, and the company is continuously
developing even more complex components for future generations of instruments. Financially,
this start-up was supported by an order for the development of a spherically and chromaticallycorrected scanning electron microscope by the Japanese company JEOL. Currently besides
JEOL other customers of CEOS are the Japanese company HITACHI, the American-Dutch
company FEI and the German ZEISS company. CEOS has now generated almost forty solidjobs. The world’s first spherical-aberration corrected transmission electron microscope has
become the “mother” of an entirely new generation of commercial aberration-corrected TEMs,
and currently the production capacity in industry is hardly sufficient to satisfy the
extraordinary demand.

Fig 54〈 Fig 54 〉 Unfortunately, the flourishing electron optics industry and the researchlaboratories applying the new technology are facing the problems arising from an especiallytense labor market. Since one and a half decades universities worldwide have cut theireducation and scientific working capacity in the field of electron optics. As a result, there areby far not enough physicists and engineers to satisfy the urgent need for specialists in electron
optics technology, and the research laboratories both in industry and in research can hardly
find the experts to realize the new opportunities offered by aberration-corrected electron
microscopy. It is hoped that the particular attention the new technology is appreciating
recently in science policy and in funding institutions will trigger a corresponding initiative inacademic education and training.

38

6. What does the future hold?

Fig 55〈Fig 55〉 After spherical-aberration correction has successfully been accomplished andwhile the new generation of aberration-corrected instruments is in the process of conquering
the science laboratories, is there still space for improvement?
Today the best instruments offer a resolution of 0.08 nm and a precision of themeasurements of atomic positions of a few picometers. Can one do better? In order to answer
this question, we have to explore what is currently limiting the optical performance of these
instruments.

Fig 56〈Fig 56〉 In any case, there is always an effect on resolution by mechanical vibrations andother instabilities of the microscope column reacting sensitively to environmental effects suchas noise, vibration of the microscope foundation or temperature instabilities. In addition, there
are effects due to magnetic stray fields which are everywhere in a modern technicalenvironment. Measures have to be taken to reduce these disturbances to the lowest technicallyfeasible level. Aside from these effects there are electronic and optical limitations. These arise

39

from the finite energy spread of the electrons leaving the electron source, instabilities of theelectrical supplies of the electron accelerator, the electromagnetic lenses, the stigmators anddeflectors and the like.

Fig 57〈Fig 57〉

It has to be pointed out that so far only the spherical aberration has beencorrected. However, in order to advance any further, the chromatic aberration of the
microscope’s objective lens has to be corrected as well. There are two ways to reduce theeffect of chromatic aberration. The first is to reduce the energy spread of the electrons byplacing an electron energy filter, a monochromator, behind the electron source. The second is
to construct a novel multipole correction element which simultaneously corrects bothspherical and chromatic aberration. At the same time all the modern technical means have to
be exploited to electronically stabilize currents and voltages.

40Fig 58

Fig 59〈Fig 58〉〈Fig 59〉 A project, within which such improvements are in the process of being
realized, is the so- called TEAM project of the United States Department of Energy. One of
the goals of this endeavor is to construct an instrument offering a resolution of 0.05 nm (= 50pm). This instrument should in principle allow measurements on atomic positions with a
precision of 1 pm.

Fig 60

Fig 61〈Fig 60〉〈Fig 61〉 The project is to a large part carried out by CEOS. To realize its very
ambitious goals, requirements for the correction system must be satisfied which aresubstantially more complex than those for present spherical-aberration correctors. The
combined chromatic and spherical aberration corrector is about three times as long as thepresent double-hexapole corrector. The corrector designed by CEOS consists of 17 opticalelements, and for the operation more than 150 current drivers are required instead of the 28
for the hexapole corrector. Chromatic correction requires an extraordinary unprecedented
relative stability of about 1: 100,000,000 for the voltage and the current supplies. Suchextremely stable supplies were only a few years ago considered as not feasible and theirrealization by CEOS involves to most recent technical achievements in electronics. The
TEAM instrument is currently installed at the laboratories of CEOS in Heidelberg. The
41

simultaneous correction could already be demonstrated successfully, and the project is on its
way to realize its objectives on time. With this development science will be offered an
instrument which, with respect to the first generation of aberration-corrected instruments, will
provide another almost doubling of the primary resolution.

Fig 62

Fig 63〈Fig 62〉〈Fig 63〉 However, resolution is not an end in itself, this type of instrumentation
will be employed in research on topics such as CO2-free power plants, high-efficiency solar
cells, artificial photosynthesis, biological cell functions and molecules and molecularaggregates for life. It will help to tackle the problems for a better and healthier world and it
will contribute to open the gate to a better understanding of the world we are living in todaywith the goal to hand it over intact to our children and future generations.
Acknowledgments

Fig 64〈Fig 64〉 The success of our project was made possible by the generous financial supportof the Volkswagen Foundation and by their reviewers who recommended the project for
funding. In order to reach our goal many sub-tasks had to be solved, which were essential for42the successful completion of the very demanding project. For example, the development of an
efficient alignment procedure would not have been possible without the continuous efforts ofStefan Uhlemann. We are highly honored by the decision of the Honda Foundation to award
us the prestigious Honda-Prize. We would like to express our sincere appreciation for thishighly recognized award.
〈MEMO〉■ This report can be viewed in the Honda Foundation’s website.
You may not use the proceedings for the purposes other than personal use without theexpress written consent of The Honda Foundation.

43

発行責任者
Editor in chief

原 田 洋 一Yoichi Harada

104-0028 東京都中央区八重洲 2-6-20 ホンダ八重洲ビル
Tel. 03-3274-5125

Fax. 03-3274-5103

6-20, Yaesu 2-chome, Chuo-ku, Tokyo 104-0028 Japan
Tel. +81 3 3274-5125
Fax. +81 3 3274-5103

http://www.hondafoundation.jp