ArF Immersion Scanner

Proven Solutions Through Evolution

Improved Overlay Accuracy and Throughput for High-volume Cutting-edge
Semiconductor Manufacturing
The NSR-S635E ArF immersion scanner with integrated inline Alignment Station (iAS) developed for high-volume cuttingedge semiconductor manufacturing.
Adopting the Streamlign platform efficiency, the NSR-S635E delivers improved
overlay accuracy under 2.1 nm MMO and remarkable throughput of more than275 WPH (96 shots) simultaneously.

NSR-S635E

PerformanceResolution≦ 38 nmNA1.35

Exposure light source

ArF excimer laser (193 nm wavelength)

Reduction ratio

1:4Maximum exposure field

26 mm × 33 mm

Overlay≦ 2.1 nm (MMO*1)

Throughput≧ 275 wafers/hour (96 shots)*1 Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S635E#1 to S635E#2)

Features of the inline Alignment Station (iAS)

DepositioniAS

Deposition

Resist Coating

iAS

NSR

Meas.

Exposure

NSR

Resist CoatingMeas.

Exposure

Feed forward correction

Feed forward correction
for every wafer
for every waferiAS
Measure and FF
Measure and FF- Dense sampling- Dense sampling- Highorder grid correction- High order gridcorrectionAlignment
Alignment on theNSR on the NSR- Sparse sampling- Sparse sampling- Linear grid correction- Linear grid correction

NSR

Dev.

Feed back

OVL
Meas.

Dev.

OVL

Etching

Etching Meas.

Feed back

TheiASalignment station performs high-speed, ultra-precise measurement of all
wafers, and then corrects problematic grid errors without reducing thethroughput of the lithography system. The iAS enables comprehensive,
multi-point alignment for all shots on the wafer, realizing remarkable
overlay
NSR improvements, as well as maximized scanner throughput.
+Alignment+Alignment
Corrections
Corrections
CLASS 1 LASER PRODUCTWARNINGTO ENSURE CORRECT USAGE, READ MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.

The export of this product is controlled by Japanese Foreign Exchange and Foreign Trade Law and International export control regime. It shall not be exported withoutauthorization from the appropriate governmental authorities.
Performance and equipment are subject to change without any notice or obligation on the partof the manufacturer. Products and brand names are trademarks or registered trademarks of theirrespective companies. July 2024
©2024 NIKON CORPORATIONhttps://www.nikon.com/business/semi/

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