KrF Scanner

Proven Solutions Through Evolution

Employs
Employs Streamlign
Streamlign Platform
Platform forfor Improved
Improved Accuracy
Accuracy andand Productivity
Productivity

The NSR-S220D KrF scanner realizes throughput of more than 230 WPH and high accuracy of below 6 nm MMO.
The extendible
NSR-S220DStreamlign
KrF scannerrealizescontributes
throughputtoofstable
more volume
than 230manufacturing
WPH and highofaccuracyof below 6cutting-edge
nm MMO.
Theplatform
multigenerational
Theextendible
Streamlign
platform
contributes
tostablevolumemanufacturingofmultigenerational
cutting-edge
devices and to reducing the cost of ownership.
devices and to reducing the cost of ownership.

NSR-S220D
NSR-S220D

Performance
Performance
Resolution
Resolution
NANA
Exposure light source
Exposure light source
Reduction ratio
Reduction ratio
Maximum exposure ﬁeld
Maximum exposure ﬁeld
Overlay
Overlay
Throughput
Throughput≦ 110 nm
≦ 110 nm
0.82
0.82
KrF excimer laser (248 nm wavelength)
KrF excimer laser (248 nm wavelength)
1:4
1:4
26 mm × 33 mm
26 mm × 33 mm≦ 6 nm (MMO*1)≦ 6 nm (MMO*1)≧ 230 wafers/hour (96 shots)≧ 230 wafers/hour (96 shots)*1 Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S220D#1 to S220D#2)*1 Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S220D#1 to S220D#2)

Key Features of the Streamlign Platform
Key Features of the Streamlign Platform• Bird’s Eye Control• Bird’sEyesuperior
Control yield
Enabling
Enabling superior yield• Hybrid encoder/interferometer system for wafer stage position measurements• delivers
Hybrid encoder/interferometersystem for wafer stage position measurements
optimal stage performance.
delivers optimal stage performance.
• Use of 2D encoders for reticle stage position measurements delivers• measurements
Use of 2D encoders
reticleposition measurements
deliversof thefor
stagesthatstage
are insensitive
to air fluctuations.
measurements of the stages that are insensitive to air fluctuations.
• Dramatically improves accuracy and stability.
• Dramatically improves accuracy and stability.
• Provides superior focus control.
• Provides superior focus control.
• Improved overlay capabilities of 3 nm or less
• Improved overlay capabilities of 3 nm or less
• Stream Alignment• Enabling
Stream Alignment
optimal affordabilityEnabling optimal affordability• Straight Line Auto-Focus generates dense map of the wafer surface to enhance• focus
Straight
Line (usingAuto-Focus
Unit
controla widegenerates
AF beamdensespan).map of the wafer surface to enhance Illumination
Illumination Unit
focus control (using a wide AF beam span).
• Enables increased alignment sites with minimal productivity impact using• Five-Eye
Enables increasedalignment sites with minimal productivity impact usingFIA.
Five-Eye FIA.
• Greatly reduces wafer overhead time.
• Greatly reduces wafer overhead time.
• Throughput capabilities of 230 WPH or more
• Throughput capabilities of 230 WPH or more
• Modular2 Structure• Enabling
Modular2 rapidStructure
production ramps
Enabling rapid production ramps• Modular design enables efficient installations and simplifies maintenance.
• Modular design enables efficient installations and simplifies maintenance.
• Provides optimal uptime with modular design and replacement of individual components.
• Provides optimal uptime with modular design and replacement of individual components.
• Extendible platform enables multigenerational use.
• Extendible platform enables multigenerational use.

WARNINGWARNING

Encoder
EncoderInterferometer
Interferometer

Wafer Stage
Wafer Stage

Straight Line
Auto-Focus
Straight Line
Auto-Focus

Five-Eye FIA
Five-Eye FIA

Reticle Stage
Reticle Stage
Metrology Frame
Metrology Frame

Projection Lens
Projection Lens

Wafer Stage
Wafer Stage

CLASS 1 LASER PRODUCTCLASS 1 LASER PRODUCTTO ENSURE CORRECT USAGE, READ MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.
TO ENSURE CORRECT USAGE, READ MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.

The export of this product is controlled by Japanese Foreign Exchange and Foreign Trade Law and International export control regime. It shall not be exported without
The
export of fromthis productis controlled
by JapaneseForeign Exchange and Foreign Trade Law and International export control regime. It shall not be exported withoutauthorization
the appropriate
governmentalauthorities.
authorization from the appropriate governmental authorities.
Performance and equipment are subject to change without any notice or obligation on the part of thechange
without
notice orobligationofon
the part of thePerformanceequipment
are subject
https://www.nikon.com/products/semi/
manufacturer.and
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or anyregisteredtrademarks
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Products
and brand
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respective
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respective
July 20242024©2024 NIKONCORPORATION©2024 NIKON CORPORATIONNIKON CORPORATIONNIKONCORPORATION
Semiconductor
Lithography Business Unit
Nikon Corporation

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