Automatic Macro Inspection SystemAMI-5700

Automatic Macro Inspection SystemAMI-5700

The AMI-5700 makes both high throughput and exceptional detection sensitivity very achievable. The aim of this device is torealize higher sensitivity and accuracy than previous models. It achieves high-speed measurement and inspection by
performing batch imaging of the entire wafer surface. This is an innovative device that can perform inspection andmeasurement as a single unit.

Key Features• Nikon's diffracted light detection system detects patternvariations along the Z-axis, especially focus error andpoor coating, with high sensitivity. In addition, accurate
recognition of the diffracted light only from the top
pattern layer is possible, allowing defects in underlying
patterns to be discriminated.

• A high-speed measurement function has been
implemented for the first time in the AMI series. CD
measurement, film thickness measurement and focus
measurement are possible at speeds that surpass previous
methods.
• Complies with the RoHS directive and REACH
regulations concerning the environment.

• High quality images with reduced chromatic aberration
can be obtained by the newly developed optical system
and improved collection mirror.

• A unique learning function utilizes AI image processing
technology to quantify the characteristics of a good wafer.

• An improved mirror tilting mechanism greatly contributes
to the reduction of under-layer noise, realizing moreaccurate inspection, such as the accurate detection ofchanges in the top layer pattern.

• The versatile automatic recipe creation function allows
even inexperienced operators to create optimal recipes in ashort time.
• In addition to the Automatic Defect Classification (ADC)
function, operators can specify their own rework criteria
in a recipe in order to automate rework judgments.

• Detects particles and scratches as small as 5 μm byscattering inspection, achieving even higher sensitivity
than previous models.

• Hole process inspections are also supported.

• Achieves high throughput of 180 wafers/hour, even when
performing diffraction and scattering inspection as a batch
inspection of the entire wafer. Also supports 3 load ports
and enables efficient operation according to the line,
greatly contributing to improved productivity.

Specifications• Enables 3x, 2x, 1x nanometer lithography (supports EUV, DSA and Quad Patterning)• Applicable for 3D Memory/LOGIC/CMOS image sensor devices• Provided with pattern edge roughness (PER) function and mirror tilting optical system• Inspection throughput: 180 or more wafers/hour (standard magnification: scattering and diffraction inspection or mirror
reflection inspection)• Measurement throughput: 25 wafers/25 minutes (when batch imaging of the entire wafer is implemented 3 times under
different conditions with the shortest exposure time)• Enables measurement of up to 75,000 points (26 mm × 33 mm) in one capture.
WARNINGTO ENSURE CORRECT USAGE, READ MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.

The export of this product is controlled by Japanese Foreign Exchange and Foreign Trade Law and International export control regime. It shall not be exported withoutauthorization from the appropriate governmental authorities.
Performance and equipment are subject to change without any notice or obligation on the part ofthe manufacturer. Products and brand names are trademarks or registered trademarks of theirrespective companies. July 2024
©2024 NIKON CORPORATION

https://www.nikon.com/business/semi/Nikon CorporationNikon Precision Taiwan Ltd.

1-5-20, Nishioi, Shinagawa-ku, Tokyo 140-8601, Japan
Tel: +81-3-6743-5533

Nikon Singapore Pte. Ltd.

Precision Equipment Group
Marketing Department

Nikon Precision Inc.

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Tel: +1-(650)-508-4674

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Nikon Instruments Korea Co., Ltd.

21F, City Air Tower, 36, Teheran-ro 87gil, Gangnam-gu, Seoul, 06164 Korea
Tel: +82-2-6288-1900

3F.-1, NO.28, Taiyuan Street, Zhubei City, Hsinchu County 302, Taiwan, R.O.C.
Tel: +886-3-552-5888
18 Tai Seng Street #04-08, 18 Tai Seng, Singapore 539775
Tel: +65-6559-3618

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11-12F, Tower 5, Crystal Plaza No. 36, Ping Jia Qiao Road, Pudong New District,
Shanghai 200126, China
Tel: +86-21-5899-0266

Nikon Precision Malaysia Sdn. Bhd.

No. 37-03-01, Ideal Golden Triangle, Jalan Dato’ Ismail Hashim, 11900 Bayan Lepas,Penang, Malaysia
Tel: +60-4-371-7830