MDR Format Specification

June 2010
Association of Super-Advanced Electronics Technology (ASET)
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MDR format specifications
1 Purpose
Mask D2I/ASET are aiming towards importing a concept for mask data rank in order todescribe the importance of the mask data, and the proposal of an effective manufacturing flowwhich thinks about the importance of mask pattern.
Mask data rank shows the priority definition of pattern importance which has converted
design intents into numbers and can be utilized for mask manufacturing. Utilizing mask datarank, we can identify and sort out the importance of reticle patterns in mask writing andinspection. Optimizing the max beam size in mask writing and controlling defect sensing
threshold in mask inspection by utilizing importance of patterns, TAT could be reduced. This
document defines the mask data rank format specifications, namely “MDR”.
2 Scope
MDR specification applies to the input data format for mask inspection and writing tools.
NOTICE: This specification does not purport to address safety issues, if any, associated withits use. It is the responsibility of the users of this specification to establish
appropriate safety and health practices and determine the applicability ofregulatory or other limitations prior to use.
3 Limitations
This document will always be required to remain compliant with SEMI P39 OASIS, so that
this document is always a formal subset of SEMI P39 OASIS.
4 Referenced Standards and Documents
4.1 SEMI Standards
SEMIP39OASISTM OPEN ARTWARK SYSTEM INTERCHANGE STANDARD
NOTICE: Unless otherwise indicated, all documents cited shall be the latest publishedversions.
5 Terminology
5.1 Abbreviations and Acronyms
5.1.1 OASISTM OPEN ARTWARK SYSTEM INTERCHANGE STANDARD
5.2 Symbol
5.2.1 A — acceptable record
The records are generated as needed in the input data for mask tools by the software. Themask tools perform processing according to the contents of the records.
5.2.2 I — ignore record
The records may be generated in the input data for mask tools by the software, but will beignored by the mask tools. The mask tools do not respond to the records.
5.2.3 M — mandatory record
The records must be generated in the input data for EB mask tools by the software. If therecords do not exist, the mask tools treat it as an error.
5.2.4 X — prohibited record
The records are prohibited to exist in the input data for mask tools. If the records exist, themask tools treat it as an error.

6 Requirements
6.1 Background
Since it is impossible to feed the design data from semiconductor companies to mask shops interms of information confidentiality, a practical measure needs to be sought for smoothconveyance of the design intent. Thus we have defined MDR (Mask Date Rank) format todescribe mask data rank information.
The MDR format is the format for Feed-forward information flow called DAM shown in
Figure 1, and it is based on the OASIS format. The priority is expressed as polygon records
with data type values which identify the criticality of the areas. Since there is only polygon
data in MDR, it has no sensitive information. Thus, design engineers can readily give thedesign intent information to mask manufacturing engineers by utilizing MDR.

DesignDFM

Feedback to design side(e.g. Critical points in mfg.)

Wall

DFM in a broad sense

Mfg.

Feedforward to mfg. side・ Design Intent・ HotSpot

DAM (Design Aware Mfg.)

Figure 1. DAM
6.2 Concept of MDR
The MDR format is based on the OASIS format and the priority is expressed as polygon
records with data type values which identify the criticality of the areas. The MDR polygons
have three types: GLOBAL, LOCAL and LOCATION.
The GLOBAL polygons are used to specify the priority regions on a full mask level, such as
main die or peripheral area. In order to express the priority regions based on individual maskpatterns, the LOCAL polygons are used. LOCAL polygons are usually larger than the originalmask patterns so that they enclose the mask patterns with some marginal distances.
LOCATION polygons are generated where it is judged to be a hotspot or are used to specify thepriority of space between patterns between polygons.
The required manufacturing accuracy can be specified by the INNERALLOWANCE orOUTERALLOWANCE property value. These allowance values are maximum allowabledisplacement of manufactured mask edges from their true locations. Utilizing INTENT
property values, it is possible to describe any information by character.
6.3 Specification of MDR(a) When MDR is the same area of mask data, applying any mask data is acceptable.
(b) There is no restriction in class.
(c) With reference to GLOBAL, LOCAL and LOCATION, figures are written to differentlayers.

(d) Importance is defined by datatype. 0 is the most important, and priority decrease as thenumbers rise.
(e) Only the internal connotation of each figure is valid.
(f) If there are multiple figures on the same layer, the number closes to 0 gets priority.
(g) If there are multiple figures on a different layer, which layer gets priority isapplication-dependent.
(h) The data that extends over more than one file is disabled.
(i) The area designation figures POLYGON, RECT, TRAPEZOID and CTRAPEZOID can beused. PATH, CIRCLE and XGEOMETRY can not be used.
6.4 OASIS Format Specification
See SEMI P39 for OASIS Format Specification.
6.5 Additional Records in MDR
In MDR, following standard user properties are added to PROPERTY record. Theseproperties contain file-level and polygon-level standard properties.
6.5.1 file-level standard properties
6.5.1.1 S_MDR_VERSIONThis property declares the version of MDR specification. Its value consists of a single a-string
record. With this specification, the value is “1”. It is a mandatory record in MDR.
6.5.1.2 S_MDR_GLOBALPRIORITY_LAYERThis property shows a layer number for the GLOBAL. Its value consists of a single
unsigned-integer record. The GLOBAL is shown in Figure 2. The priority of chip units isdefined. Slanting lines are not allowed.

datatype=0→highest priority
datatype=1→second highest priority
blank→lowest priority

Figure 2. GLOBAL area

6.5.1.3 S_MDR_LOCALPRIORITY_LAYERThis property shows a layer number for LOCAL. Its value consists of a single
unsigned-integer record. LOCAL is shown in Figure 3. The priority of pattern is defined.
Slanting lines are allowed.
datatype=0→highest priority
datatype=1→second highest priority
blank→lowest priority

Figure 3. LOCAL area
6.5.1.4 S_MDR_LOCATION_LAYERThis property shows a layer number for LOCATION. Its value consists of a single
unsigned-integer record. LOCATION is shown in Figure 4. The priority of space between
patterns is defined.
datatype=0→highest priority
datatype=1→second highest priority
blank→lowest priority

Figure 4. LOCATION area
6.5.2 polygon level standard property
6.5.2.1 S_MDR_INNERALLOWANCE
This property shows the margin of error between the layers on the inner side. Its value
consists of a single signed-integer record. It is based on the database unit.
INNERALLOWANCE is shown in Figure 5. This value is the maximum inner allowabledisplacement of manufactured mask edges from their true locations.
Activ layer

IN/OUT=10nm
IN/OUT=15nm
IN/OUT=20nm

Figure 5. Inner/outer allowance6.5.2.2 S_MDR_OUTERALLOWANCE
This property shows the margin of error between the layers on the outer side. Its value
consists of a single signed-integer record. It is based on the database unit.
OUTERLLOWANCE is shown in Figure 5. (refer back to Figure 5) This value is maximum
outer allowable displacement of manufactured mask edges from their true locations.
6.5.2.3 S_MDR_INTENTThis property shows the information of design intent. Its value consists of the character
record. It is recommended to use reference mode in PROPSTRING for compression. INTENT isshown in Figure 6. This value shows design intent information.

CRITICAL_NET
DUMMY
HOTSPOT NECKING

Figure 6. Intent information
6.6 Specification of the MDR Restrictions
6.6.1 Concept
MDR format is pursuant to SEMI P39.
6.6.2 Restrictions on OASIS Record
It is pursuant to SEMI P39.
6.6.3 Restrictions for property
The restrictions on file level standard property record of OASIS are shown in Table 1. And
the restrictions on figure level standard property record of OASIS are shown in Table 2.

Table 1. Restriction for standard property (file level)
No1234Property name
S_MDR_VERSIONS_MDR_GLOBALPRIORITY_LAYER
S_MDR_LOCALPRI
ORITY_LAYER
S_MDR_LOCATION_LAYER

flags
Layer-number
Layer-number
Layer-number

Content of restriction
Restriction
item
Minimum Maximum
Step
Unit
MDR
formatversion
Layer
01
264-1
numberLayer10264-1
numberLayer10264-1
numberComment
Fixed to 1

Propriety
MAAA

M: Mandatory, A: Acceptable, I: Ignore, X: Prohibited
Table 2. Restriction for standard property (figure level)
No
123Property name
S_MDR_INNERALLOWANCE
S_MDR_OUTERALLOWANCE
S_MDR_INTENT

inner allowanceouter allowancestringRestriction
item
Inner
allowance
Outerallowance
Information
for design
intentContent of restriction
Minimum Maximum
Step
Unit

CommentPropriety

12 -1

64

1

Grid

A

12 -164

1

Grid

A

164

2 -1

Recommend
to refer
PROPSTRI
NG recordA

M: Mandatory, A: Acceptable, I: Ignore, X: Prohibited
6.6.4 Restrictions for hierarchy
Restriction for hierarchy is shown as Table 3.
Table 3. Restrictions for hierarchy of OASISNoRestriction item

Content of restriction

Record12Cell reference
Hierarchy num

Other MDF file cells are non-readable
No restrictions

PLACEMENT
PLACEMENT

6.6.5 Restrictions for cell name
There are no restrictions for cell name.
6.6.6 Restrictions for file name
There are no restrictions for file mane.
6.6.7 Restrictions for figure(a) The area designation figures POLYON, RECT, TRAPEZOID and CTRAPEZOID can beused. PATH, CIRCLE, XGEOMETRY and XELEMENT can not be used.
(b) Only the internal connotation of each figure is valid.
(c) Importance is defined by datatype. 0 is the most important, and priority decrease as thenumbers rise.
(d) If there are overlapping figures with different priority on the same layer, figures withhigher importance get priority.
(e) If there are overlapping figures on a different layer, which layer gets priority isapplication-dependent.
(f) There are no restrictions for blank area.

MDR Format Specification
Produced by Mask Design, Drawing, and Inspection Technology Research Department,
Association of Super-Advanced Electronics Technologies (ASET)
June 2010
Copyright © Association of Super-Advanced Electronics Technologies (ASET), 2010, All rights reserved.