Tokyo Electron  Annual Report 2011

Research and Development/Intellectual Property

Research and Development
The Semiconductor Industry will Continue
to Expandlevels of scaling is lowered yield caused by “variability” in transis-Electronics loaded with semiconductors currently pervade every

tor performance. One of the many causes of variability is thecorner of the globe and semiconductors will play an ever more

excess energy generated by the plasma and heat used in theinstrumental part in people’s lives in the future. Semiconductor

manufacturing process.

One technical issue that has threatened to impede higher

applications are also expanding. About 60% of semiconductors

Tokyo Electron is addressing this issue by developing low-­

are currently used for computing and telecommunications, but astemperature, low-energy plasma manufacturing technologies.

cloud computing and other types of network infrastructure

One technology commercialized by Tokyo Electron is a novel dry

become integrated into the energy, healthcare, agriculture, andetch system, Tactras™ RLSA™ Etch, which enables damage-freeother industries, it is clear there will be an increasing demand foretching with low energy and high electron density.

semiconductors to support the new applications.

New functional materials are indispensable to enable further

Technology is supporting this expansion. An important role ofscaling of semiconductors. Tokyo Electron develops CVD systems

research and development is to create sophisticated technology

for making High-k/metal gates for logic devices, novel dielectric

in a timely manner. Tokyo Electron is improving the efficiency offilm and electrodes for DRAM capacitors, and phase change andits fundamental research activities by teaming up with universities

resistive materials for the emerging memory devices.

and research consortia like SEMATECH and imec. As part of thisScaling is not the only hot topic in the industry. Three-­approach, Tokyo Electron has decided to establish a newdimensional (3D) memory cell stack and 3D chip stack technolo-research facility in Tsukuba, Ibaraki Prefecture in the spring ofgies have also attracted significant attention in recent years.

2012—TEL Technology Center Tsukuba—with the aim of leverag-In 3D memory cell stacks, flash memory cells are stacked

ing the R&D-focused environment of Tsukuba to accelerate thevertically to increase density. Tokyo Electron has contributed topace of Tokyo Electron’s research activities. The Company builds

the development of this groundbreaking integration processdevelopment facilities close to customers at the application stage

with high aspect ratio contact hole (HARC) etching and metalin order to facilitate strong collaborative ties with customers andfilling technologies.

to accelerate commercialization of products.
From 2010, the corporate R&D division began to widen its

In 3D chip stacks, a multitude of complete chips are stacked toprovide higher functionality. Tokyo Electron aims to be a top

research scope to include not only silicon (Si) integrated circuits,

equipment supplier in this field as well, and has commercialized abut also a range of new semiconductor materials, including com-high rate through-silicon via (TSV) etch system. Additionally,

pound semiconductors and organic semiconductors, along with

Tokyo Electron is also developing a dielectric polyimide deposition

new manufacturing technologies. Tokyo Electron is aiming tosystem for through holes.

make a leap into a new semiconductor world through this combination of nanometer-level scaling technology and new materials.

Successfully Pushing the Boundaries ofSPE Technology
The value of semiconductors is rooted in scaling, or miniaturization. Two technologies are pushing the boundaries of successful
scaling: double patterning technology and extreme ultraviolet(EUV) lithography.
Tokyo Electron possesses a proprietary double patterning technology that uses the deposition of silicon oxide films at room
temperature, enabling half pitch 13nm line and space patterns. Thedevelopment of further improvements this year have successfully

Tsukuba in Ibaraki Prefecture, the self-styled city of science and nature, isthe ideal location for Tokyo Electron’s new center. We shall pursue tie-ups

enabled scaling to 11nm patterns as Tokyo Electron continues towith local research institutes and academic institutions to accelerate R&D

rewrite scaling records using current exposure tools.

for new base technologies and core technologies for semiconductor pro-

EUV is regarded as the next-generation lithography technology.
Tokyo Electron has not only developed an innovative coater/developer for EUV, but is enhancing process technology to minimize line edge roughness.

24

TEL Technology Center Tsukuba to be opened in spring 2012duction eguipment as well as for photovoltaic cell production equipment.

Annual Report 2011

Tokyo Electron

Tackling Environment and Energy-related Issues

Exploring New Fields

The Tokyo Electron Group is leveraging all of its resources to tackle

Tokyo Electron is exploring medicine, energy, and other fields

the global issues of the environment and energy.

where there is potential to apply its accumulated semiconducor

The first major contribution is through the development ofproduction equipment (SPE) technology. Digital cameras andenergy-saving technology. In the area of power devices, which

portable digital music players paved the way for NAND flash

have the potential to greatly contribute to energy-saving, siliconmemory and are an example of how new products can drive thecarbide (SiC) semiconductors are regarded as a once-in-several-development of new manufacturing technologies. For this reason,decades breakthrough. In 2010, Tokyo Electron began sales of aTokyo Electron’s business units collaborate closely with the R&D

SiC epitaxial CVD system the Company had developed that isdivision to study the possibility of entering new fields from bothcritical for the manufacture of SiC semiconductors. Lighting isthe market and technological perspectives.

another area where energy-saving technology is needed. TokyoTo enhance new technology development, Tokyo Electron has

Electron is developing proprietary production equipment forformed collaborations with universities, business consortia, andorganic electro-luminescence devices, which are regarded as theventure companies that possess complementary technology. These

next generation of power-saving technology.

collaborations are not limited to Japanese universities but include

The second major contribution is through the development ofresearch programs in foreign countries as part of the Company’s

photovoltaic cell (PV) production equipment. For the Si thin film

quest to achieve excellent research activities and pursue promisingPV, which has high growth potential, Tokyo Electron is leveraging

technologies through active collaborations worldwide.

its semiconductor and FPD production equipment technology todevelop equipment with high productivity. Moreover, the Company is conducting R&D on high-efficiency, low-cost PV production equipment which uses materials other than Si thin films.

hp 45nmhp 23nm

hp 11nmTokyo Electron achieved an extremely fine pattern with a half pitch of 11nm by applying its proprietary “double patterning” technology twice.

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Tokyo Electron  Annual Report 2011

Intellectual Property
Policy for Intellectual Property Activities

cooperate closely with sales and marketing departments and to

Tokyo Electron understands that the significance of intellectual

grasp the market and technological trends, patent engineers inproperty activities at manufacturing companies is its contribution

charge of surveys and external affairs related to intellectual prop-

to increasing corporate revenues by supporting business activities.

erties are assigned to headquarters, which has sales and market-

In order to make our intellectual property strategy effective, it ising functions. In addition, patent engineers assigned to the plant

important to integrate this strategy with our technological andand headquarters, a sales or marketing division manager, and anproduct strategies.

R&D division manager have meetings periodically so that ourThus, in building and implementing our intellectual property
strategy, our primary goal is to differentiate our own products andintellectual property activities are conducted along with themarket and technological trends.

bolstering our competitive advantages with our intellectual property rights, rather than generating income from licensing them to

Status of Intellectual Property Rights

other companies.

In addition to filing applications for core technologies vital to ourTechnologies are becoming increasingly advanced and compli-strategies in each business division, Tokyo Electron vigorously

cated in our business fields; the risk in developing new productsbuilds a patent portfolio that also encompasses the technologies

increases significantly unless we fully respect the intellectual property

adjacent to core ones.

rights of other companies. From this viewpoint, Tokyo Electron

In each country, we always optimize the numbers of ourappropriately monitors intellectual property held by other companies.

patent applications and patents held, reflecting market andTo minimize the risks of disputes, we take appropriate approaches,competitor trends in our business fields. The graph in this sec-

including obtaining licenses from others if necessary.

tion shows the numbers of patent applications and patents heldby Tokyo Electron in each country. In recent years, we have filed

Management of Intellectual Property Activities

about 70%*1 of our applications globally, reflecting the impor-Tokyo Electron continues to conduct aggressive R&D activities totance of overseas markets for our business. In particular, werespond to the advanced needs of device manufacturers, whohave been increasing the numbers of patent applications andare our customers. In order to maintain our competitivenesspatents held in South Korea and China. These numbers arebased on the outcome of R&D activities, it is necessary that webased on our patent strategies reflecting the recent growing

steadily protect these achievements through our intellectual

importance of the South Korean and Chinese markets for ourproperty rights. To cooperate closely with our R&D operations,business, as well as the rise of semiconductor and FPD produc-patent engineers in charge of patent prosecutions are assignedtion equipment manufacturers in South Korea.

to every plant that has R&D functions.

*1 This figure is the percentage of patents filed overseas out of all our patents filed with theJapan Patent Office. The average among Japanese companies is about 25%.

At the same time, Tokyo Electron must respond flexibly todramatically changing markets and various technological trends inorder to effectively conduct intellectual property activities. To

Number of Tokyo Electron Patent Applications

Number of Patents Held by Tokyo Electron(Fiscal year)(As of March 31)

1,000

4,000

800

3,000600
2,000400
1,000200
0007

08Japan26

U.S.

09

10Europe

South Korea

11
Taiwan

07
China

08
Japan

U.S.

09

10Europe

South Korea

11
TaiwanChina