IDW ’04
THE 11TH INTERNATIONALDISPLAY WORKSHOPS

Workshops on• LC Science and Technologies• Active Matrix Displays• FPD Manufacturing, Materials andComponents• CRTs• Plasma Displays• EL Displays, LEDs and Phosphors• Field Emission Display• Organic LED Displays• 3D/Hyper-Realistic Displays
and Systems• Applied Vision and Human Factors• Projection and Large-Area Displays,
and Their Components

Topical Session on• Electronic Paper

Advance Program
Niigata Convention Center
Toki Messe, Niigata, Japan
December 8 - 10, 2004

CONTENTS
Program Highlights ...................................................................................... 04
General Information ..................................................................................... 06
Hotel and Travel Information ........................................................................ 08
Plenary Sessions
Wednesday, December 8
IDW ’04 Opening .......................................................................................... 12
IDW ’04 Keynote Addresses ........................................................................ 12
IDW ’04 Invited Addresses ........................................................................... 12
Workshop on LC Science and Technologies
Wednesday, December 8
LCT1 Novel Alignment Technologies ...................................................... 13
LCT2 LC Alignment and Anchoring ........................................................ 13
LCT3 LC Materials and Evaluation .......................................................... 14
Thursday, December 9
LCT4 Transflective LCDs ........................................................................ 14
LCT5 Novel LC Modes ............................................................................ 15
LCTp1 Poster: LC Modes ......................................................................... 16
LCTp2 Poster: Transflective LCDs ........................................................... 17
LCTp3 Poster: LC Alignment .................................................................... 17
LCTp4 Poster: Analysys & Characterization .............................................. 18
Friday, December 10
VHF5/LCT6
Pixel Arrangement and Image Quality ................................ 20
VHF6/LCT7
Moving Image Quality ......................................................... 20
Workshop on Active Matrix Displays
Wednesday, December 8
AMDp Poster: Active-Matrix Display ......................................................... 22
AMD/OLEDp Poster: Active-Matrix OLED ................................................ 24
EP3/AMD1Electronic Paper (3) ............................................................ 25
Thursday, December 9
AMD2/OLED4 AM-OLED (1) ...................................................................... 25
AMD3/OLED5 AM-OLED (2) ...................................................................... 26
AMD4 LC-TV ............................................................................................ 27
AMD5 TFT Technologies .......................................................................... 27
Friday, December 10
AMD6 Mobile Display ............................................................................... 28
AMD7 System on Panel ........................................................................... 28
AMD8 Organic TFT Technologies ............................................................ 29
AMD9 Flexible Display .............................................................................. 29
Workshop on FPD Manufacturing, Materials and Components
Wednesday, December 8
FMCp Poster: FPD Manufacturing, Materials & Components .................. 31
FMC1 Materials (1) ................................................................................. 32
FMC2 Manufacturing Technologies (1) ................................................... 33
FMC3 Color Filter ...................................................................................... 33
Thursday, December 9
FMC4 Advanced Technologies ................................................................ 33
FMC5 Manufacturing Technologies (2) .................................................... 34
FMC6 Manufacturing Technologies (3) .................................................... 35
FMC7 Materials (2) ................................................................................... 35

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Friday, December 10
FMC8 Optical Films ................................................................................. 36
FMC9 Backlight Systems (1) ................................................................... 36
FMC10 Backlight Systems (2) ................................................................... 37
FMC11 Optical Systems ............................................................................. 37
Workshop on CRTs
Wednesday, December 8
CRTp Poster: CRTs .................................................................................. 39
Thursday, December 9
CRT1 For the Revival of CRT ................................................................... 39
CRT2 Masks & Screens ........................................................................... 40
CRT3 Deflection Yokes ............................................................................ 40
CRT4 Cathodes & Getters ........................................................................ 41
Workshop on Plasma Displays
Wednesday, December 8
PDP1 Discharge Mechanism ................................................................... 42
PDP2 Cell Structure & Materials ............................................................. 42
PDP3 Components ................................................................................... 43
Thursday, December 9
PH2/PDP4
Phosphors for PDPs ............................................................ 43
PDPp1 Poster: Cell Design ....................................................................... 44
PDPp2 Poster: Discharge Mechanisms .................................................... 45
PDPp3 Poster: Discharge Gases .............................................................. 45
PDPp4 Poster: Driving Methods ................................................................ 46
PDPp5 Poster: MgO .................................................................................. 46
PDPp6 Poster: Manufacturing Processes ................................................. 47
PDPp7 Poster: Discharge Simulation ......................................................... 47
Friday, December 10
PDP5 Addressing ..................................................................................... 48
PDP6 Driving Methods ............................................................................. 48
PDP7 Novel PDPs .................................................................................... 49
Workshop on EL Displays, LEDs and Phosphors
Wednesday, December 8
PHp Poster: EL Displays, LEDs and phosphors ....................................... 50
Thursday, December 9
PH1
ELDs ............................................................................................. 51
PH2/PDP4
Phosphors for PDPs ........................................................... 52
PH3
ELDs ............................................................................................. 52
PH4
Phosphors for LEDs ....................................................................... 53
Friday, December 10
FED2/PH5
FEDs and Phosphors for FEDs ........................................... 53
Workshop on Field Emission Display
Friday, December 10
FED1 FEDs and Novel Devices ............................................................... 55
FED2/PH5
FEDs and Phosphors for FEDs ........................................... 56
FED3 FE Materials and Emission Characteristics (1) .............................. 56
FED4 FE Materials and Emission Characteristics (2) .............................. 57
Workshop on Organic LED Displays
Wednesday, December 8
OLED1 Panel ............................................................................................. 59
OLED2 Material .......................................................................................... 592

OLED3 Device Structure ............................................................................. 60
AMD/OLEDp Poster: Active-Matrix OLED ................................................ 60
Thursday, December 9
AMD2/OLED4 AM-OLED (1) ...................................................................... 61
AMD3/OLED5 AM-OLED (2) ...................................................................... 62
OLEDp Poster: OLED poster ...................................................................... 62
Workshop on 3D/Hyper-Realistic Displays and Systems
Wednesday, December 8
3D1
Hyper Reality .................................................................................. 66
3D2
3D Displays .................................................................................... 66
3D3
3D processing ................................................................................ 67
Thursday, December 9
3Dp
Poster: 3D Displays & Related Technologies ................................ 67
VHF4/3D4
3D Vision ............................................................................. 68
Workshop on Applied Vision and Human Factors
Wednesday, December 8
VHFp Poster: Human Factor and Image Quality ...................................... 69
Thursday, December 9
VHF1 Human Factor (1) ........................................................................... 70
VHF2 Human Factor (2) ........................................................................... 70
VHF3 Human Factor (3) ........................................................................... 71
VHF4/3D4
3D Vision ............................................................................. 71
Friday, December 10
VHF5/LCT6
Pixel Arrangement and Image Quality ................................ 72
VHF6/LCT7
Moving Image Quality ......................................................... 72
VHF7 Image Quality and Tone Reproduction .......................................... 73
VHF8 Color Reproduction ........................................................................ 73
Workshop on Projection and Large-Area Displays, and Their
Components
Thursday, December 9
LADp Poster: Optics & Components ......................................................... 75
Friday, December 10
LAD1 Digital Cinema & Imaging Technologies ........................................ 75
LAD2 Optics & Components .................................................................... 76
LAD3 Microdisplay & System Designs .................................................... 76
Topical Session on Electronic Paper
Wednesday, December 8
EP1Electronic Paper (1) ....................................................................... 77
EP2
Electronic Paper (2) ....................................................................... 77
EP3/AMD1Electronic Paper (3) ............................................................ 78
Thursday, December 9
EPp
Poster: Electronic Paper Posters ................................................... 78
IDW ’04 Timetable ........................................................................... Centerfold
IDW ’04 Session Navigator ............................................................. Centerfold
IDW ’04 Committees .................................................................................... 80
Floor Plan .................................................................................................... 883

PROGRAM HIGHLIGHTS
Scientific and technological advances in research and development on
information displays will be found at the 11th International Display
Workshops (IDW ’04). A feature of the IDW ’04 is an integration of thefollowing eleven workshops and one topical session.
Workshops on• LC Science and Technologies• Active Matrix Displays• FPD Manufacturing, Materials and Components• CRTs• Plasma Displays• EL Displays, LEDs and Phosphors• Field Emission Display• Organic LED Displays• 3D/Hyper-Realistic Displays and Systems• Applied Vision and Human Factors• Projection and Large-Area Displays, and Their Components
Topical Session on• Electronic Paper
The three-day conference will feature 401 papers, including two keynote
addresses, two invited addresses, 70 invited papers, 154 oral and 173 poster
presentations, and some additional late-news papers will also be arranged.
Following keynote and invited addresses on Wednesday morning,presentations will begin and continue in six parallel sessions through Friday.
Poster sessions and author interviews will enable participants to discusspresented issues in detail. Exhibitions from display and related industries will
also be featured from Wednesday to Friday in parallel with workshops and a
topical session. The IDW ’04 should be of interest not only to researchersand engineers, but also to those who manage companies and institutions in
the display community.
Workshop on LC Science and Technologies (LCT)
Recent advances in LC materials and device technologies are presented.
The session covers from fundamental studies to recent development of LCD
technologies. Novel alignment technologies, LC alignment and anchoring, LC
materials and evaluation, transflective LCDs, and novel LC modes are
discussed.
Workshop on Active Matrix Displays (AMD)Recent progress in TFT technologies and active matrix displays are widely
discussed in this workshop. Sessions cover device and process
technologies for a-Si, poly-Si and organic TFTs, featuring sixteen topicalinvited talks. Their applications to electronic papers, LC-TVs, mobile
displays, OLED displays and system on panels are also discussed.
Workshop on FPD Manufacturing, Materials and Components (FMC)
This workshop includes 17 invited papers dealing with the overview oftechnical trends and the new related technologies on FPDs. In the technicalsessions, papers deal with optical components, lamps, substrates, process
technologies, measurement system, etc. for FPDs.
Workshop on CRTs (CRT)This workshop covers the entire field of CRT technologies. This year, a
topical session “For the Revival of CRT” is organized.
Workshop on Plasma Displays (PDP)The 40-year anniversary of PDP will be celebrated by 55 papers including
invited papers, "In Celebrating of 40 Years of PDP History" by Dr. L. F.
Weber, and "A Technology Roadmap for Developing Large Capacity
Electronic Display Fabrics" by Dr. R. L. Johnson. There are many excellent
papers ranging from surface-discharge fundamentals to extra-large 80-inch
PDP development. Recent research activities towards high efficacy and highresolution PDPs, such as long gap discharges, high Xe contents, and new
driving waveforms, will also be discussed.

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Workshop on EL Displays, LEDs and Phosphors (PH)This workshop covers the latest R&D achievements in inorganic ELDs,
phosphors for emissive displays and solid-state illumination as well as LEDs.
Invited talks present inorganic EL studies in Tottori University—in memory ofProf. Tanaka: large-screen full-color ELDs, sphere-supported ELDs,
degradation mechanism of blue phosphors for PDPs, phosphors for whiteLEDs and phosphors for FEDs. Contributed papers also include interesting
topics such as nano-sized particle phosphors, thin-film phosphor
development using combinatorial deposition and new phosphor materials for
ELDs and PDPs. In addition, joint sessions will be held with the PDP
Workshop and the FED Workshop.
Workshop on Field Emission Display (FED)
Recent progresses in FEDs fabricated by using carbon-nanotubes (CNT) andgraphite-nanofibers (GNF) as field emitters are presented. Operating
characteristics of FEDs with Spindt-type FEAs and Phosphor technologies
for FEDs are also discussed at the joint session with “EL Displays, LEDs andPhosphors workshop. ”
Workshop on Organic LED Displays (OLED)This workshop includes recent developments in organic EL materials,
devices and fabrication process. New organic fluorescent andphosphorescent materials are reported, and highly efficient EL devices using
these materials are presented. Durability of the EL devices will be alsopresented.
Workshop on 3D/Hyper-Realistic Display and Systems (3D)This workshop focuses on recent developments in 3D and immersive/hyperrealistic display. It also covers 3D image processing such as multiview
interpolation and coding technology. Invited talks in this workshop include thetopics from a forefront of 3D technologies and the recent research into hyperrealistic display systems.
Workshop on Applied Vision and Human Factors (VHF)
This workshop covers the latest R&D achievements in human factors, suchas usability of various display, visual fatigue related to display, 3D vision.
The workshop also covers image quality issues of displays, such as pixel
arrangement, moving image quality, tone and color reproduction. Recent
progress in applied vision and human factors field related to displays arewidely discussed.
Wo rkshop on Proje ctio n a nd Large-Area D isplays, and Their
Components (LAD)
The worldwide hottest technologies for projection displays will make thisworkshop exciting. Invited talks will cover topics on an extremely highperformance projector for Digital Cinema Systems. In the general talks, lightvalve technology, peripheral circuit, light source and optical systems forenhancing display performance will be discussed.
Topical Session on Electronic Paper (EP)This session will focus on current topics on Electronic Paper, Paper-like
Display, and Rewritable Paper. Various novel technologies including
electrophoresis, electrochromism, liquid crystal, and electrowetting will bereported. Concepts, systems, devices, and materials in this field are
expected to be discussed.
Outstanding Poster Paper Awards
A limited number of outstanding poster papers will be awarded on December
10, from 12:20 to 13:30 at Exhibition Hall B following Niigata Festival.
Exhibition
The IDW ’04 exhibition of display components and systems will open at
12:00 on December 8 and conclude at 14:00 on December 10. The latest
display devices, appliance, manufacturing equipments, measuring
instruments, software systems and materials for display technologies will bepresented in Exhibition Hall B. Please take this opportunity to enjoy
informative discussion with exhibitors.
December 8: 12:00 – 18:30
December 9: 10:00 – 18:00
December 10: 10:00 – 14:00

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GENERAL INFORMATIONSPONSORSHIP
IDW ’04 is sponsored by the Institute of Image Information and Television
Engineers (ITE) and Society for Information Display (SID).
WORKSHOP SITE
Niigata Convention Center (Toki Messe)
6-1, Bandaijima, Niigata
Niigata 950-0078, Japan
Phone: +81-25-246-8400 Fax: +81-25-246-8411
ON-SITE SECRETARIAT
Telephone and fax machines for IDW ’04 use will be temporarily set up in thesecretariat room at the Niigata Convention Center (Toki Messe) (December
7-10).
Phone: +81-25-249-9911 Fax: +81-25-249-9912
BANQUETA buffet-style banquet will be held on December 8 from 19:30 to 21:30 inContinental Room at Hotel Okura Niigata. As the number of tickets is limited,
you are urged to make an advance reservation by completing the enclosed
registration form and returning it with payment.
Note: Free shuttle buses are available at 18:20, 18:45 and 19:10 from Niigata
Convention Center (Toki Messe) to banquet site. On return from banquet site
to Niigata Convention Center (Toki Messe) free buses are available at only
21:50.
EVENING GET-TOGETHER WITH WINE
A get-together will be held on December 7 from 18:00 to 20:00 at Room
Hoou (30F), Hotel Nikko Niigata. Wine (sponsored by Merck Ltd., Japan) will
be served to participants with a relaxed atmosphere for informal discussion.
OUTSTANDING POSTER PAPER AWARDS AND NIIGATA FESTIVAL
Poster Awards will be given to outstanding poster papers, following Niigata
Traditional Dance and Drums, on December 10 from 12:20 to 13:30 in
Exhibition Hall B.
REGISTRATION
Registration is available in advance and also on site. However, proceedings
book might not be guaranteed for the on-site registrants in case of theunexpected excess of the on-site registration. Advance registration isstrongly recommended.
Registration Fees
The registration fee for IDW ’04 includes admission to the conference, a copyof the proceedings in book or in USB memory, and CD-ROM. The
proceedings in USB memory can be selected only by those who registeredand paid by November 1.
Paid by Nov. 1
After Nov. 1
Member of SID/ITE/ASO*¥ 30,000¥ 35,000
Non-Member¥ 35,000¥ 40,000
Student**¥ 8,000¥ 10,000
Life Member of SID/ITE¥ 8,000¥ 10,000Banquet¥ 8,000¥ 10,000
Note that the reduced registration fee must be paid by November 1. In caseof the payment after November 1 or on site, prices after November 1 will beapplied even if you sent the registration form by November 1, 2004. Also
note that the number of banquet tickets to register on site is limited.
*ASO: Academic Supporting Organizations(See p.86 as well as "Supporting Organizations and Sponsors" at the end ofeach workshop/topical session section.)**Student ID is required.

6

For additional sets of the proceedings book or USB memory*, and CD-ROM
Book & CD-ROM USB & CD-ROM
at the conference site
¥ 8,000¥8,000Airmail after the conference¥13,000
not available
Sea/Domestic mail after the conference ¥10,000
not available*Additional Sets of USB memory and CD-ROM can be selected only by theapplication with payment by November 1.
Payment
Three ways are provided for the registration.
(1) e-Registration
Access the following URL.
http://idw.ee.uec.ac.jp/regist.html
The e-Registration is acceptable until November 22, 2004.
(2) Mail or Fax Registration
Complete the registration form (FORM A) at the centerfold and send it to thesecretariat together with all necessary payments no later than November 22,
2004.
IDW ’04 Secretariat
c/o The Convention, Annecy Aoyama 2F
2-6-12, Minami-Aoyama, Minato-ku, Tokyo 107-0062, Japan
Phone: +81-3-3423-4180 Fax: +81-3-3423-4108
The registration fee should be remitted by one of the following methods.
1. Bank transfer (only applicable to domestic participants) to:
Account name: IDW
Account no.: 4049628 (ordinary account)
Bank name: Mizuho Bank
Branch name: Sendai Branch
Please attach a copy of your bank remittance form with the registration
form to avoid possible troubles.
2. Bank check made payable to "IDW" together with the registration form
3. Credit card (only VISA or MasterCard accepted)
All above payments should be made in JAPANESE YEN.
Also, please note that personal and traveler's checks will not be accepted.
(3) On-site Registration
Conference registration desk will be open:
Tuesday, December 7
18:00-20:00
Wednesday, December 88:30-18:00
Thursday, December 9
8:30-17:00
Friday, December 10
8:30-15:00
The on-site registration fee will be payable by:
1. Cash (JAPANESE YEN only)
2. Credit card (VISA or MasterCard only)
Bank transfer, bank check, and personal/traveler's checks are not accepted.
Payment by cash is recommended.
Cancellation Policy
Refunds for registration, banquet, additional sets of proceedings etc. will bemade on written cancellation received by IDW ’04 secretariat by November
1. For cancellations received after November 1 or no-shows, refunds will not
be made. However, after IDW ’04 closes, a set of the proceedings book/USB
memory and CD-ROM will be sent to the registrants who have paid theregistration fees.
INQUIRY
IDW ’04 Secretariat
c/o The Convention, Annecy-Aoyama, 2F
2-6-12, Minami-Aoyama, Minato-ku, Tokyo 107-0062, Japan
Phone: +81-3-3423-4180 Fax: +81-3-3423-4108
Please pay attention to the website (http://idw.ee.uec.ac.jp/home.html) for
latest information.

7

HOTEL AND TRAVEL INFORMATIONHOTEL RESERVATIONS
IDW ’04 executive committee has secured enough rooms for the participants.
However, this year IDW ’04, Hotel Reservation System is changed from theprevious IDWs. Participants who want to stay in Niigata during IDW ’04
should make reservations directly with the hotel by themselves as follows.
Reservation will be made on a first-come, first-served basis.
Methods of Application
1. Through the IDW website (http://idw.ee.uec.ac.jp/hotelform.html)
2. By fax, using enclosed Form B (Please copy the form.)
Confirmation from the Hotels
1. Confirmation will be sent to the applicants directly from the hotel in a few
days upon receiving your application.
2. If your application is not accepted by the hotel, please select another hotel
and send your request to make reservation to the hotel through the web or by
fax using Form B.
3. In case of no vacancy for your request again, please follow the proceduredescribed above.
VISAS
Visitors from countries whose citizens must have visas should apply to a
Japanese consular office or diplomatic mission in their respective country.
For further details, please contact your travel agent or the local consular
office in your country.
Attention: For some countries’ citizens, official documents prepared by thesecretariat will be needed. Please ask the secretariat for its application atleast two months before the conference.
JAPAN RAIL PASS
Tourists visiting Japan from abroad can save with a Japan Rail Pass. These7-, 14-, 21-day passes are valid for unlimited travel on the Shinkansen trains(except NOZOMI ) and other JR lines, plus its buses and ferries.
For details, please ask your travel agent and purchase an exchange order at
an authorized agent before coming to Japan. This pass cannot be purchased
in Japan.
After you arrive in Japan, you turn in the exchange order to receive yourJAPAN RAIL PASS at an applicable JR station that has a JAPAN RAILPASS exchange office.
Ex.
Narita Airport Terminal 1
Narita Airport Terminal 2
Kansai Airport

Travel Service Center 11:30-19:00
Ticket Office
6:15-11:30, 19:00-21:45
Travel Service Center 11:30-19:00
Ticket Office
6:30-11:30, 19:00-21:50
Ticket Office
5:30-23:00

CLIMATE
The average temperature in Niigata during the period is around 5°C, with 8°C
in the daytime and 2°C at night on the average.

8

NIIGATA CITY
Niigata City is located in the center of the Japanese Islands and 250 km
north of Tokyo. Niigata has a long history as a port and is distinguished
for being the site of one of only five international ports opened in 1868
when Japan resumed contact with other countries after nearly 250
years of self-imposed isolation. Since that time, Niigata has developed
into one of the most important modern international ports in Japan.
Geographically, the city is distinctive in that it is surrounded by water.
The Shinano and Agano, two of the largest rivers in Japan, run throughthe heart of Niigata before emptying into sea. In addition, until relatively
recently, the city was crisscrossed by a series of canals used totransport goods. Although the canals have been filled in to make theconstruction of modern roadways possible, the willows that lined thesecanals still remain today and now serve to lend a gentle air to thebustling downtown area.
When Niigata is mentioned, many people often think immediately of thearea's delicious rice and sake or the city's beautiful sunsets, but theresidents of Niigata themselves take pride, rather, in the spirit of
hospitality and community that so distinguishes the city.
PLACES OF INTEREST
Sado Island
Sado Island lies isolated from the mainland by 35 km, and is accessible
by Sado Kisen, a ferry service from Niigata city which takes two and ahalf hour by car ferry or only one hour by jet foil. Sado Island is 263 km
in perimeter and 854.6 km2 in area. It is one of the largest islands inJapan. Many tourists come from all over the country every year to visit
Sado; an island rich in nature beauty and historic monuments. In theancient and middle ages, Sado was the island of exile. Not a few noble
or holy people, the ex-Emperor "Juntoku” (1197-1242), a Buddhist
priest "Nichiren Shonin" (1222-1282) and a Noh player "Zeami" (1363 1443), for example, were banished there. They left a lot of historic relics
as well as a strong influence on the culture of Sado.
Niigata Furusatomura
This facility displays and provides information relating to Niigata’s
history, culture and sightseeing spots. There are shops selling various
traditional crafts and local products, such as sake, rice and fish, forwhich Niigata is famous throughout the country. In addition, there is afood court serving delicious local dishes.
Bandai Bridge
The present Bandai Bridge is the third to have spanned the ShinanoRiver (the first was built in 1887, the second in 1909 and the third
in1929). The bridge is 307 m long, 21.9 m wide and consists of 6arches. It was not only strong enough to survive the Niigata Earthquake
during 1960s, but has become one of the symbols of Niigata city.
Prefectural Government Memorial Hall
Built in 1884, this building was formerly home to the Niigata prefectural
Assembly. This Western-style building fuses elements of Western andtraditional Japanese architecture. It is the only prefectural assemblybuilding dating from the early Meiji era still in existence in Japan andwas designated as a nationally important cultural property.
More information is available on
http://www.city.niigata.niigata.jp/
http://www.nvcb.or.jp/
NIIGATA INFORMATION DESK
Information concerning hotels and tours will be available during theconference period.

9

ACCESS TO NIIGATA
NARITA
INTERNATIONALAIRPORT(NRT)
By JR Narita Exp.
¥ 2,070 / 70 min.

KANSAIINTERNATIONALAIRPORT(KIX)INCHEON
INTERNATIONALAIRPORT- KOREA -75 min. by Bus¥ 1,700

By JR Haruka Exp.
¥ 2,980 / 45 min.

By International Flights
120 min.
3 flights per week

OSAKA
AIRPORT(ITAMI)

SHIN-OSAKASTATION

SHANGHAIINTERNATIONALAIRPORT- CHINA -By JR Shinkansen By Domestic Flights
Nozomi65 min.
¥ 14,050 / 160 min.
6 flights per day

By International Flights
150 min.
3 flights per week

TOKYO STATIONNIIGATA AIRPORT(KIJ)

By JR Shinkansen
Toki¥ 10,270 / 130 min.

25 min. by Bus¥ 350

15-20 min. by Taxi
¥ 2,000-3,000

NIIGATA STATION
3 min. on foot5 min. on foot5 min. on foot5 min. on foot7 min. on foot15 min. by Bus¥ 180

Niigata Tokyu Inn
Niigata Washington Hotel
Hotel Sunroute Niigata
Niigata Toei Hotel
Bandai Silver Hotel

10 min.
by taxi

Hotel Okura Niigata

10 min.
by taxi

Niigata Grand Hotel

10 min.
by taxi

Hotel Nikko Niigata

Adjacent

Taxi or Bus
Taxi or Bus
Taxi or Bus
Taxi or Bus
Taxi or Bus
Taxi
Taxi

5-10 min.
by Taxi

Niigata Convention Center (Toki Messe)(as of July, 2004)10

Hotel Map (Access to Conference Site)

Conference Site
Niigata Convention Center(Toki Messe)

To Niigata
AirportBus stop(Toki Messe)
Bandai Bridge.

Bandai Bus
Terminal

Bandai-guchi Exit

JR Niigata Station

500 m
Gate 6, Bandai-guchi bus terminal
Bus route 17A; bound for Sado Ferry Terminal via Toki Messe

Bus route

Hotel Okura Niigata (Banquet Site)
Hotel Nikko Niigata (Get Together)
Niigata Grand Hotel
Bandai Silver Hotel
Niigata Tokyu Inn
Niigata Washington Hotel
Niigata Toei Hotel
Hotel Sunroute Niigata
11

Wednesday

December 8

IDW ’04
Wednesday, December 8
9:00 - 9:10

Snow Hall

Opening
Master of Ceremony: T. Sugiura, Executive Chair
Opening Remarks
9:00
T. Uchida, General Chair
Y. Shimodaira, Program Chair
9:10 - 10:30

Snow Hall

Keynote Addresses
Co-Chairs:

Y. Shimodaira, Program Chair
T. Uchida, General Chair

Keynote Address - 1 Displays: Past, Present and Future
9:10
R. W. G. Hunt
Colour Consultant, UK
Keynote Address - 2
9:50

Digital Broadcasting Technologies : TV for the
21st Century

K. EnamiNHK, Japan----- Break -----

10:40 - 11:50

Snow Hall

Invited Addresses
Co-Chairs:

Y. Iimura, Program Vice-Chair
K. Betsui, Program Vice-Chair

Invited Address - 1 Ubiquitous Displays for Ubiquitous Computing
10:40
H. Nakashima
Future Univ. Hakodate, Japan
Invited Address - 2 Research and Development of E-Books
11:15
M. T. Johnson
Philips Res. Labs., The Netherlands----- Lunch -----

12

Wednesday

December 8

Workshop on
LC Science and Technologies
Wednesday, December 8
13:30 - 14:40

Snow Hall B

LCT1: Novel Alignment Technologies
Chair:
Co-Chair:S. Sato, Akita Univ., Japan
K. Tarumi, Merck, Germany

LCT1 - 1:
13:30

Invited Molecular Alignment Pattern Formation by theMicrorubbing Process for LC Optical Device Applications
T. Nose, M. Honma
Akita Pref. Univ., Japan

LCT1 - 2:
13:55

Invited Novel Alignment Technique of Liquid Crystal Using
Hydrophilic/Hydrophobic Pattern Layer
A. Suemasu, K. Ikegami, N. Maji, T. Tanaka
Dai Nippon Printing, Japan

LCT1 - 3
14:20

Control of the Liquid Crystal Alignment by TwoDirectional Rubbing
K. Kuboki, T. Miyashita, T. Uchida
Tohoku Univ., Japan----- Break -----

15:10 - 16:35

Snow Hall B

LCT2: LC Alignment and Anchoring
Chair:
Co-Chair:M. Hasegawa, IBM Res., Japan
H. Okada, Toyama Univ., Japan

LCT2 - 1:
15:10

Invited Photo-Rubbing: A Method to Induce Stable LiquidCrystal Pretilt Angle on Photo-Alignment Films
M. Kimura*,**, A. Kumano*, Y. Takeuchi**, H. Yokoyama****JSR, Japan**Nat. Inst. of Advanced Ind. Sci. & Tech., Japan***Int. Ctr. for Materials Res., Japan

LCT2 - 2
15:35

Dual Image Writing on the Liquid Crystal Cell Using
Unpolarized UV Light
R. Yamaguchi, T. Kawamura, S. Sato
Akita Univ., Japan

LCT2 - 3
15:55

Highly-Reliable Method of Measuring the Elastic
Constants Ratio and Anchoring Energy Using LC Cells
with Different Gaps
W. Kaneko, T. Ishinabe, T. Oono, T. Miyashita, T. Uchida
J. Watanabe*, H. Mori*
Tohoku Univ., Japan*Fuji Photo Film, Japan13

Wed./Thu.
LCT2 - 4
16:15

December 8/9
Slow Orientational Dynamics and Memory Effects in
Nematic Layers at a Weak Surface Anchoring
S. V. Pasechnik, V. G. Chigrinov*, D. V. Shmeliova,
V. A. Tsvetkov
Moscow State Ac. of Instr. Eng. & Computer Sci., Russia*Hong Kong Univ. of Sci. & Tech., Hong Kong----- Break -----

16:45 - 18:10

Snow Hall B

LCT3: LC Materials and Evaluation
Chair:
Co-Chair:V. G. Chigrinov, Hong Kong Univ of Sci. & Tech., Hong Kong
M. Kimura, JSR, Japan

LCT3 - 1:
16:45

Invited Recent Liquid Crystal Material Development for TV
Application
K. Tarumi, M. Klasen-Memmer
Merck, Germany

LCT3 - 2
17:10

A New Design for Transmissive Color NB-STN-LCDs by
Using Twisted-Nematic Compensators
A. Mutou, T. Uesaka, Y. Kumagai*, S. Nishimura, T. Toyooka
Nippon Oil, Japan*Nippon Oil LC Film, Japan

LCT3 - 3
17:30

Universal Design Parameter Tz to Determine the Viewing
Angle Property of Biaxial Retardation Films
T. Higano, T. Ishinabe, T. Uchida
Tohoku Univ., Japan

LCT3 - 4
17:50

A High-Speed Cell Parameter Measurement of Reflective
Liquid Crystal Panels by Using a Polarization Converting
DeviceM. Kawamura, S. Sato
Akita Univ., Japan

Author Interviews
18:10 – 19:00

Thursday, December 9
9:00 - 10:25

Snow Hall B

LCT4: Transflective LCDs
Chair:
Co-Chair:

14

S. Komura, Hitachi, Japan
H. Fujikake, NHK, JapanThursday
LCT4 - 1:
9:00

December 9
Invited Technologies towards Patterned Optical Foils
Applied in Transflective LCDs
B. M. I. van der Zande, C. Doornkamp, S. J. Roosendaal
J. Steenbakkers, A. Op t Hoog, J. T. M. Osenga, J. J. van
Glabbeek, L. Stofmeel, J. Lub, Y. Iefuji*, L. Weegels*
Philips Res., The Netherlands*Philips Mobile Display Syss., Japan

LCT4 - 2
9:25

Low Interference In-Cell Diffuse Reflectors forTransflective Liquid Crystal Displays
N. Sumi, H. Nakamura, Y. Hamawaki, Y. Iefuji, L. M. Weegels
Philips Mobile Display Syss., Japan

LCT4 - 3
9:45

Double-Faced TFT-LCD Having One LC Panel and one
Lighting System
T. Taguchi, K. Nakamura, K. Tsuda, Y. Itoh, N. Kimura
Sharp, Japan

LCT4 - 4
10:05

3-Color Filter Substrate with Multi Thickness Technology
Used in Transflective Type Liquid Crystal Display
O. Mikami*, X. Gu, X. Y. Gong, C. Schmidgall, N. Bergeron
Philips Mobile Display Syss., China*Mitsumura Printing, Japan----- Break -----

10:40 - 11:40

Snow Hall B

LCT5: Novel LC Modes
Chair:
Co-Chair:B. M. I. van der Zande, Philips Res., The Netherlands
M. Suzuki, Merck, Japan

LCT5 - 1
10:40

Electro-Optical Properties of the Hybrid Color Reflective
VA-LCD
Y. Asao, R. Isobe
Canon, Japan

LCT5 - 2
11:00

Low Power LC Shutter with High Contrast Ratio and Fast
Response Time
S. A. Studentsov, V. A. Brezhnev, B. I. Gorfinkel
N. D. Zhukov, V. G. Chigrinov*, H. S. Kwok*
R&D Inst. "VOLGA", Russia*Hong Kong Univ. of Sci. & Tech., Hong Kong

LCT5 - 3
11:20

Bendy Field-Sequential-Color Displays Using A4-Sized
Ferroelectric Liquid Crystal Driven by Active Matrix
MethodH. Fujikake, H. Sato, T. Murashige, Y. Fujisaki, H. Kikuchi
T. Kurita
NHK, Japan

Author Interviews
17:00 – 18:00

15

Thursday

December 9

14:00 - 17:00

Exhibition Hall B

Poster LCTp1: LC Modes
LCTp1 - 1

Fabrication Process of A4-size Flexible Ferroelectric
Liquid Crystal Displays
H. Sato, H. Fujikake, T. Murashige, H. Kikuchi, T. Kurita
NHK, Japan

LCTp1 - 2

Influence of Polymer Wall Formation on Electrooptic
Behaviors of Ferroelectric Liquid Crystal
T. Murashige, H. Fujikake, H. Sato, H. Kikuchi, T. Kurita
NHK, Japan

LCTp1 - 3Single-Crystal Morphologies of Pentacene Organic
Semiconductor Segregated in Liquid Crystal
H. Fujikake, T. Suzuki*, Y. Fujisaki, T. Murashige, H. Sato,
H. Kikuchi, T. Kurita
NHK, Japan*Tokyo Univ. of Sci., Japan

LCTp1 - 4

White Fluorescent Display Properties in Liquid Crystal
Cells Using Dichroic Dyes
R. Yamaguchi, K. Moriyama, S. Sato, X. Zhang*,
T. Thiemann*, S. Mataka*
Akita Univ., Japan*Kyushu Univ., Japan

LCTp1 - 5

Multi-Dimensional Alignment for Fast transition from
Splay to Bend States in a Pi Cell
C. G. Jhun, J. L. Lee, S. H. Kang, S. R. Lee, J. C. Kim,
T.-H. Yoon, J. Y. Lee*,
Pusan Nat. Univ., Korea*BOE-HYDIS Tech., Korea

LCTp1 - 6

Design of a Wide Viewing-Angle OCB Cell with Circular
Polarizers
M. J. Jung, C. G. Jhun, J. C. Kim, T. H. Yoon, J. Y. Lee
Pusan Nat. Univ., Korea*BOE-HYDIS Tech., Korea

LCTp1 - 7

Evaluation of Induced Polarization Dependence in PhotoPolymerization Process of Holographic Polymer
Dispersed Liquid Crystal Films
A. Ogiwara, M. Takeda, H. Matsuda*, O. Tanaka*
Takamatsu Nat. College of Tech., Japan*Okura Ind., Japan

LCTp1 - 8

Nematic Diffractive Grating Induced by Nano-Treated
Silicon Oxide Surface
M. I. Gritsenko, S. I. Kucheev, P. M. Litvin*
Chernigov Univ., Ukraine*Inst. of Physics, Ukraine

LCTp1 - 9

Liquid Crystal Diffractive Optical Devices Fabricated byMicrorubbing Process
M. Honma, M. Takeishi, T. Nose
Akita Pref. Univ., Japan16

Thursday

December 9

LCTp1 - 10Compensation Element of OCB LCD
S. H. Chang, C. L. Pan
Chunghwa Picture Tubes, Taiwan

LCTp1 - 11

Photoaligned Large Cell Gap Permanent Grayscale in
Bistable TN Liquid Crystal Display
Y. W. Li, S. Y. Yeung, H. S. Kwok
Hong Kong Univ. of Sci. & Tech., Hong Kong

LCTp1 - 12

Multidimensional Alignment Structure for Long-Term
Memory in a Bistable Chiral-Splay Nematic Liquid Crystal
DeviceS. H. Kang, C. G. Jhun, S. R. Lee, J. C. Kim, T.-H. Yoon
Pusan Nat. Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster LCTp2: Transflective LCDs
LCTp2 - 1

Reduced Power Consumption in a Single-Polarizer
Reflective TN-LCD with One Retardation Film
H. Hando
Kanazawa Inst. of Tech., Japan

LCTp2 - 2

Multimode Transflective LCD
J. S. Gwag, G. S. Lee, J. C. Kim, T.-H. Yoon
Pusan Nat. Univ., Korea

LCTp2 - 3

Vertically Aligned Transflective Liquid Crystal Display with
Inner Retarders
S. J. Park, C. G. Jhun, K.-H. Park, J. C. Kim, T.-H. Yoon
Pusan Nat. Univ., Korea

LCTp2 - 4

Configuration of a Transflective IPS LCD with an Optical
Dummy Layer
K. H. Park, Y. J. Ko, J. C. Kim, T. H. Yoon
Pusan Nat. Univ., Korea

LCTp2 - 5

Electro-Optic Characteristics of In-Plane Driven
Transflective LCD
I. Yu, J. Song, S. Lee
Chonbuk Nat. Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster LCTp3: LC Alignment
LCTp3 - 1

Evaluation of the Surface Anchoring Strength of the
Alignment Film for High Pretilt by Means of theRenormalized Transmission Spectroscopic Ellipsometry
N. Tanaka, M. Kimura, T. Akahane
Nagaoka Univ. of Tech., Japan

LCTp3 - 2

Evaluation of Polar Anchoring Strength by SymmetricOblique Incident Transmission Ellipsometry
Y. Abe, N. Tanaka, M. Kimura, T. Akahane
Nagaoka Univ. of Tech., Japan17

Thursday
LCTp3 - 3

December 9Characterization of Polyimide Molecular Orientation of LC
Alignment Film by Grazing Incidence X-ray Diffraction
I. Hirosawa
Japan Synchrotron Radiation Res. Inst., Japan

LCTp3 - 4

Investigation of the Surface Alignment of Liquid Crystal
Multi-Layers Evaporated on Photoalignment Polyimide
Film
T. N. Oo, T. Iwata*, M. Kimura, T. Akahane
Nagaoka Univ. of Tech., Japan*Core Sys., Japan

LCTp3 - 5

Photoalignment Evaluation in In-Plane Switching LC Cells
D. J. Chen, T. Y. Ho, S. Y. Fuh, Y. M. Chen, C. W. Hsiao,
J. L. Chen, C. W. Wu, H. C. Chiang
Taiwan TFT LCD Assn., Taiwan

LCTp3 - 6

Novel Photo-Aligned Twisted Nematic Liquid Crystal Cell
D. D. Huang, V. M. Kozenkov, V. G. Chigrinov, H. S. Kwok,
H. Takada*, H. Takatsu*
Hong Kong Univ. of Sci. & Tech., Hong Kong
*Dainippon Ink & Chems., Japan

14:00 - 17:00

Exhibition Hall B

Poster LCTp4: Analysis & Characterization
LCTp4 - 1

Study on Phase Transition of the Optically Compensated
Splay (OCS) Cell
B. S. Jung, S. J. Kim, S. M. Oh, J. Y. Hwang*, D.-S. Seo*,
S. H. Lee
Chonbuk Nat. Univ., Korea*Yonsei Univ., Korea

LCTp4 - 2

Study on Color Characteristics of the E- and O-Modes in
the Fringe-Field Switching ModeI. Song, I. Baik, H. Y. Kim*, K. H. Lee*, S. Y. Kim*, Y. J. Lim*,
S. Lee*Chonbuk Nat. Univ., Korea*BOE-HYDIS Tech., Korea

LCTp4 - 3

Analysis of Electro-Optic Characteristics in Fringe-Field
Switching ModeJ. B. Park, H. Y. Kim, K. H. Kim, S. Y. Kim, Y. J. Lim
BOE-HYDIS, Korea

LCTp4 - 4

The Electro-Optical Characteristics of an LCD with
Respect to Material Species of the Black Matrix
C.-S. Lee, S.-K. Yoon, S.-H. Yoon, H.-Y. Youn*, D.-W. Kim*,
M.-S. Jung*, T. Won*
Sanayi Sys., Korea*Inha Univ., Korea

18

Thursday
LCTp4 - 5

December 9
The Optical Characteristics of a New MVA-LCD Using
Computer Simulation
D.-W. Kim, M.-S. Jung, H.-J. Yoon, C.-S. Lee*, S.-I. Yoon*,
S.-H. Yoon*, T. Won
Inha Univ., Korea*Sanayi Sys., Korea

LCTp4 - 6

Transient Behaviors of Polymer Stabilized Twisted
Nematic Liquid Crystal Cells
M. Kamio, M. Nanaumi, T. Takahashi, S. Saito
Kogakuin Univ., Japan

LCTp4 - 7

Experimental and Theoretical Studies of Transient
Current of Nematic Liquid Crystals with Negative
Dielectric Anisotropy Excited by Step Voltage Application
Y. Iwata, H. Naito, M. Inoue*, H. Ichinose**,M. Klasen-Memmer***, K. Tarumi***Osaka Pref. Univ., Japan*Toyo, Japan**Merck, Japan***Merck, Germany

LCTp4 - 8

Effect of Electrode Interval in the PVA Mode
H.-Y. Youn, D.-W. Kim, M.-S. Jung, C.-S. Lee*, S.-K. Yoon*,
S.-H. Yoon*, T. Won
Inha Univ., Korea*Sanayi Sys., Korea

LCTp4 - 9

New Approach to LCD Modeling: 2D Version
V. G. Chigrinov, D. A. Yakovlev*, V. I. Tsoi*
Hong Kong Univ. of Sci. & Tech., Hong Kong
*Saratov State Univ., Russia

LCTp4 - 10

A Simple Measurement System for Determining Cell
Thickness and Twist Angle in Reflective Liquid Crystal
Displays
M. Kawamura, M. Konda, S. Sato
Akita Univ., Japan

LCTp4 - 11

The Effect of Polarity of Contamination on LCD
Performance
K.-N. Yang
AU Optronics, Taiwan

LCTp4 - 12

Ring Projector from Surface Stabilized CholestericTexture Film
C.-Y. Huang, C.-Y. Hu
Nat. Changhua Univ. of Education, Taiwan

LCTp4 - 13

High-Throughput Screening of the Helical Twisting Power
Property Using Micro-FTIR Spectroscopy for Novel Chiral
Materials
J. H. Ma, Y. P. Lin, W. C. Chen, R. J. Wu
ITRI, Taiwan

19

Friday

December 10

Friday, December 10
9:00 - 10:10

Room 301

VHF5/LCT6: Pixel Arrangement and Image Quality
Chair:
Co-Chair:Y. Shimodaira, Shizuoka Univ., Japan
M. Ozaki, Osaka Univ., Japan

VHF5/LCT6 - 1: Invited PenTile LCDs
9:00
C. Elliott
Clairvoyante, USA
VHF5/LCT6 - 2 Color Image Improvement in Display with a Novel String
9:30
Pixel Architecture
C.-S. Chang, C.-J. Chen, J.-P. Pang
InnoLux Display, Taiwan
VHF5/LCT6 - 3 Optical and Electrical Characterization of Flickering of
9:50
Color STN-LCD
R. Chen, X. Zhang
Philips Mobile Display Sys., China----- Break -----

10:30 - 12:00

Room 301

VHF6/LCT7: Moving Image Quality
Chair:
Co-Chair:

C. Elliott, Clairvoyante, USA
Y. Shimodaira, Shizuoka Univ., Japan

VHF6/LCT7 - 1: Invited A Review of MPRT Measurement Method for
10:30
Evaluating Motion Blur of LCDs
J. Someya, Y. Igarashi*
Mitsubishi Elec., Japan*Hitachi Displays, Japan
VHF6/LCT7 - 2 Dynamic Gamma: A Metric for the Temporal Response
11:00
Contribution to Motion Blur
H. Pan, X. Feng, S. Daly
Sharp Labs. of America, USA
VHF6/LCT7 - 3 Parameters of Motion Picture Blurring Measured by Using
11:20
a Pursuit Camera
K. Oka, K. Kitagishi, Y. Enami
Otsuka Elect., Japan
VHF6/LCT7 - 4 Motion Picture Quality of Colored Image Measured by
11:40
Using a Pursuit Camera System
Y. Enami, K. Kitagishi, K. Oka
Otsuka Elect., Japan

Author Interviews
17:00 – 18:00

20

Friday

December 10

Supporting Organizations:LC Physics and Condensed Matter Forum, JLCS
Chemistry and LC Material Forum, JLCS
Liquid Crystal Display Forum, JLCSLC Photonics and Optical Device Forum, JLCS
Bionics and Lyotropic Liquid Crystal Forum, JLCSTechnical Group on Information Display, ITE
Technical Committee on Electronic Information Displays, Electronics
Society, IEICE
Technical Committee on Electron Devices, Electronics Society, IEICE

Late-News Papers
due October 4, 2004
Submit a two-page
camera-ready manuscript ofA4-sized pages, reflecting
important new findings or developments
via on-line submission:
http://idw.ee.uec.ac.jp/authinfo.html

Outstanding
Poster Paper Awards
Friday, December 10
12:20 – 13:30(after Niigata Festival)
Exhibition Hall B
See page 5 for details
21

Wednesday

December 8

Workshop on Active Matrix Displays
Wednesday, December 8
13:30 - 16:30

Exhibition Hall B

Poster AMDp: Active-Matrix Display
AMDp - 1

MED Sometimes Defeats GAP: A Performance Study on
Multi-Valued Image Entropy Coding
H. Sasaki, T. Arai, M. Hachiuma, A. Masuko
Toshiba, Japan

AMDp - 2

Optimization of the Driving Voltage for Fast Response of
AMLCDsS.-I. Yoon, S.-H. Yoon*, C.-S. Lee*, H.-J. Youn, D.-W. Kim,
M.-S. Jung, T. Won
Inha Univ., Korea*Sanayi Sys., Korea

AMDp - 3

Design and Implementation of mini-LVDS Receiver in
0.35µm CMOS Process
J.-H. Kim, J.-C. Choi, J.-S. Lee, C.-S. Jang*, J.-S. Yoo*,
D.-H. Lee*, O.-K. Kwon, I.-J. Chung*Hanyang Univ., Korea*LG.Philips LCD, Korea

AMDp - 4

Effects of Capping SiO2 Layer on the Location-Controlled
Si Grain by µ-Czochralski (grain filter) Process with
Excimer-Laser
M. He, R. Ishihara, Y. Hiroshima*, S. Inoue*, T. Shimoda*,
J. W. Metselaar, C. I. M. Beenakker
Delft Univ. of Tech., The Netherlands*Seiko Epson, Japan

AMDp - 5

Low Threshold Voltage Polysilicon TFTs with Dual-Layer
SiNx/SiO2 Gate Dielectric
P.-H. Tsai, H.-T. Chen, C.-L. Chen
ERSO/ITRI, Taiwan

AMDp - 6

Numerical Analysis for Spatial Period of Periodic Grain
Boundary in Si Thin Film Crystallized by Linearly Polarized
Nd:YAG Pulse Laser with Oblique Incidence
H. Kaki, K. Nishioka, S. Horita
JAIST, Japan

AMDp - 7

Uniformity Improvement of Plasma Source Using SingleLayer Slotted Waveguide Array
T. Ide, A. Sasaki, K. Azuma, Y. Nakata, T. Hirano*, M. Ando*
ALTEDEC, Japan*Tokyo Inst. of Tech., Japan

AMDp - 8

Low Energy Doping and 450˚C Thermal Activation
Process Developments for LTPS TFT Device
J. G. Jung, C. K. Yoo, C. Yi, C. W. Kim
Samsung Elect., Korea

22

Wednesday
AMDp - 9

December 8

Analysis of the Leakage Current in Poly-Si p-Channel TFT
Due to Doping Condition
J. Y. Yang, Y. J. Kim, S. W. Lee, S. H. Kim, H. C. Kang,
K. M. Lim, C. D. Kim, I. J. Chung
LG.Philips LCD, Korea

AMDp - 10

Highly Stable a-Si:H TFTs Prepared with Optimum SiNx
Films by PECVD Using Taguchi Method
C.-Y. Wu , C.-H. Chen, Y.-C. Kuan, K.-S. Sun
Chunghwa Picture Tubes, Taiwan

AMDp - 11

Extreme Grain Growth of Poly-Si Film by Excimer Laser
Annealing for Sputtered a-Si Film at Room Temperature
D. Y. Kim*, J. S. Jung*, H. S. Cho*, J. Y. Kwon*, K. B. Park*,
H. Lim*, T. Noguchi*,***Samsung Advanced Inst. of Tech., Korea**Sungkyunkwan Univ., Korea

AMDp - 12

Drain-Induced Barrier Lowering in Polysilicon Thin-Film
Transistors
B. D. Choi, Y. G. Mo
Samsung SDI, Korea

AMDp - 13

Continuous Argon Laser Crystallization of Patterned
SiliconJ.-F. Michaud, A. Saboundji, R. Rogel, T. Mohammed-Brahim,
M. Sarret, O. BonnaudUniv. de Rennes 1, France

AMDp - 14

Crystallization of RF Sputter Deposited Amorphous
Silicon Thin Film and Transistor Characteristics
Y.-H. Kim, D.-I. Kim, C.-H. Chung, J. W. Lim, S. J. Yun,
D.-W. Kim, D.-J. Park, Y.-H. Song, J. H. Lee
ETRI, Korea

AMDp - 15

3.8-in. System on Panel LCD Employing Advanced CMOS
LTPS Technology
J. S. Yoo, K. M. Lim, K. E. Lee, S. W. Lee, J. M. Yoon,
M. K. Baek, J. S. Yu, J. K. Park, J. K. Kang, C. D. Kim,
I. J. Chung
LG.Philips LCD, Korea

AMDp - 16

Improvement of LTPS TFT Digital Circuit Performance for
System-On-Panel Application
J.-G. Kim, J. H. Hur*, J. Y. Jeong
Univ. of Suwon, Korea*Anyang Univ., Korea

AMDp - 17

A New Offset Compensation Circuit for High Gray Scale
TFT-LCD Data Driver
J.-C. Choi, J.-S. Lee, O.-K. Kwon
Hanyang Univ., Korea

AMDp - 18

The Circuit Development of Liquid Crystal Display Driverfor New Type COG Panel
K. Nishi, Y. Doi, T. Ohmori, Y. Date
Matsushita Elec. Ind., Japan23

Wednesday
AMDp - 19

December 8

A New All-P TFT(or All-N TFT) Robust Shift Register
J.-R. Lin, C.-F. ChungERSO/ITRI, Taiwan

AMDp - 20

Fabrication of Organic TFTs with High-K Gate Insulator
Deposited by RF Sputtering Method
Y. Kouda, A. Kobayashi, Y. Iimura
Tokyo Univ. of A&T, Japan

AMDp - 21

Low Temperature Processable Inherently Photosensitive
Polyimide as a Gate Insulator for Organic Thin Film
Transistors
S. M. Pyo, H. S. Son, Y. J. Lee, K. Y. Choi, M. H. Yi
Korea Res. Inst. of Chem. Tech., Korea

AMDp - 22

Bias-Stress Effect on the Performance of OTFT on Plastic
Substrate
S. H. Han, S. H. Kim, S. M. Cho, J. Jang
Kyung Hee Univ., Korea

AMDp - 23

Pentacene Organic Thin-Film Transistors with MoW andITO Contact and SiO2 Gate Dielectric
M. S. So, B. D. Choi, Y. G. Mo
Samsung SDI, Korea

AMDp - 24

Chracterization of Photosensitive Polymer Insulator
Materials
G. H. Kim, S.-M. Yoon, I.-. Ryu, S. Y. Kang, K. S. Suh
ETRI, Korea

AMDp - 25

Effects of Inorganic Gas Barriers on the Overlay
Tolerance in TFT Fabrication on Plastic Substrates
D.-J. Park, J.-W. Lim, C.-H. Chung, S.-J. Yun, Y.-H. Kim,
Y.-H. Song, D.-W. Kim, J. H. Lee
ETRI, Korea

AMDp - 26

Low-Damaged Dry Etching of BCB Polymer Film forInterlayer Dielectrics of Poly-Si TFT on Plastic Substrate
D. W. Kim, S. J. Yun, Y.-H. Kim, C.-H. Chung, J. W. Lim,
Y.-H. Song, D.-J. Park, J. H. Lee
ETRI, Korea

13:30 - 16:30

Exhibition Hall B

Poster AMD/OLEDp: Active-Matrix OLED
AMD/OLEDp - 1 A Circuit for Testing TFT-Arrays of AMOLED Displays
D. Nakano, Y. Sakaguchi, K. Imura, A. Ohta
IBM Japan, Japan
AMD/OLEDp - 2 Active Organic Light Emitting Diode Drive Circuit
H.-R. Han*,**, C.-C. Kuo*,**, W.-T. Liao*, S.-T. Lo*,
W.-C. Wang**Wintek, Taiwan**Nat. Chung Hsing Univ., Taiwan

24

Wed./Thu.

December 8/9

AMD/OLEDp - 3 A New AMOLED Pixel Driving Scheme Employing Vdd
Line Elimination
W.-J. Nam, J.-H. Lee, S.-H. Jung, C.-W. Han, M.-K. Han
Seoul Nat. Univ., Korea
AMD/OLEDp - 4 A New AMOLED Pixel Design Compensating Threshold
Voltage Degradation of a-Si:H TFT and OLEDJ. H. Kim, J.-H. Lee, W.-J. Nam, B.-H. You, M.-K. Han
Seoul Nat. Univ., Korea
AMD/OLEDp - 5 Uniformity of AM-OLED Pixels Circuits Using asDeposited Polysilicon TFTs Improved by Slicing Effect
A. Gaillard*,**, T. Mohammed-Brahim*, S. Crand*, R. Rogel*,
C. Prat**, P. Leroy***Univ. de Rennes 1, France**Thomson Multimedia R&D, France

16:50 - 17:55

Room 201

EP3/AMD1: Electronic Paper (3)Chair:
Co-Chair:H. Kawai, Seiko Epson, Japan
M. Kimura, Ryukoku Univ., Japan

EP3/AMD1 - 1: Invited Driving an Active Matrix Electrophoretic Display
16:50
G. F. Zhou, M. T. Johnson, R. Cortie, R. Zehner*,
K. Amundson*, A. V. Henzen**, J. van de Kamer**Philips Res., The Netherlands*E Ink, USA**Philips Emerging Display Tech., The Netherlands
EP3/AMD1 - 2
17:15

A Fully Integrated Low-Power High-Voltage Bistable
Display Driver for Smartcard Applications
W. Hendrix, J. Doutreloigne, A. Van Calster
Ghent Univ., Belgium

EP3/AMD1 - 3
17:35

An Intelligent Driving Scheme for High-Voltage Display
Drivers
A. Monte, J. Doutreloigne, A. Van Calster
Ghent Univ., Belgium

Author Interviews
18:10 – 19:00

Thursday, December 9
9:00 - 10:25

Marine Hall

AMD2/OLED4: AM-OLED (1)Chair:
Co-Chair:G. Zhou, Philips Res. Labs., The Netherlands
T. Shirasaki, Casio Computer, Japan25

Thursday

December 9

AMD2/OLED4 - 1: Invited High-Performance and Low-Power AMOLED
9:00
Using White Emitter with Color-Filter Array
K. Mameno, R. Nishikawa, T. Omura, S. Matsumoto,
S. A. Van Slyke*, A. D. Arnold*, T. K. Hatwar*, M. V. Hettel*,
M. E. Miller*, M. J. Murdoch*, J. P. Spindler*
Sanyo Elec., Japan*Eastman Kodak, USA
AMD2/OLED4 - 2 2.2-in. QVGA AMOLED with Current De-Multiplexer TFT
9:25
Circuits
Y. Matsueda, D. Y. Shin, K. N. Kim, D. H. Ryu, B. Y. Chung,
H. K. Kim, H. K. Chung, O. K. Kwon*
Samsung SDI, Korea*Hanyang Univ., Korea
AMD2/OLED4 - 3 Optical Cross Talk in AMOLED Displays with Optical
9:45
Feedback
A. Giraldo, W. Oepts, M. C. J. M. Vissenberg, D. A. Fish*,N. D. Young*
Philips Res. Labs., The Netherlands*Philips Res. Labs., UK
AMD2/OLED4 - 4 Comparison of Driving Methods for TFT-OLEDs and Novel
10:05
Proposal Using Time Ratio Grayscale and Current
Uniformization
M. Kimura
Ryukoku Univ., Japan----- Break -----

10:40 - 12:05

Marine Hall

AMD3/OLED5: AM-OLED (2)Chair:
Co-Chair:K. Mameno, Sanyo Elec., Japan
R. Hattori, Kyushu Univ., Japan

AMD3/OLED5 - 1: Invited Solution for Large-Area Full-Color OLED
10:40
Television - Light Emitting Polymer and a-Si TFT
Technologies T. Shirasaki, T. Ozaki, T. Toyama, M. Takei, M. Kumagai,
K. Sato, S. Shimoda, T. Tano, K. Yamamoto, K. Morimoto,J. Ogura, R. Hattori*
Casio Computer, Japan*Kyushu Univ., Japan
AMD3/OLED5 - 2 A Novel Digital-Gray-Scale Driving Method with a Multiple
11:05
Addressing Sequence for AM-OLED Displays
A. Tagawa, T. Numao, T. Ohba
Sharp, Japan
AMD3/OLED5 - 3 A 2.0-in. AMOLED Panel with Voltage Programming
11:25
Pixel Circuits and Point Scanning Data Driver Circuits
N. Komiya, C. Y. Oh, K. Y. Eom, Y. W. Kim, S. C. Park,
S. W. Kim
Samsung SDI, Korea

26

Thursday

December 9

AMD3/OLED5 - 4
11:45

A Simple Data Driver Architecture to Improve Uniformityof Current-Driven AMOLED
H. Y. Huang, W. T. Sun, C. C. Chen, J. C. Tseng, S. Hopf,
C. F. Sung, C. H. Li, S. H. Li, J. C. Peng, Y. F. Wang, J. J. Lih,
C. S. Yang
AU Optronics, Taiwan----- Lunch -----

13:45 - 15:00

Marine Hall

AMD4: LC-TV
Chair:
Co-Chair:J. Jang, Kyung Hee Univ., Korea
H. Hamada, Sanyo Elec., Japan

AMD4 - 1:
13:45

Invited Recent Development of High Quality LCD-TVs
M. Shigeta, M. Shiomi, M. Hirata, H. Fukuoka
Sharp, Japan

AMD4 - 2:
14:10

Invited High Performance IPS Technology for LCD-TVs:
AS-IPS2
K. Ono, I. Mori, R. Oke, Y. Tomioka*, Y. Satou
Hitachi Displays, Japan*Hitachi, Japan

AMD4 - 3:
14:35

Invited Recent Progress of LC-TVs Using OCB Mode
A. Takimoto, H. Wakemoto, K. Nakao
Toshiba Matsushita Display Tech., Japan----- Break -----

15:35 - 17:00

Marine Hall

AMD5: TFT Technologies
Chair:
Co-Chair:

C.-C. Lee, ERSO/ITRI, Taiwan
T. Asano, Kyushu Inst. of Tech., Japan

AMD5 - 1:
15:35

Invited Research, Development and Fabrication ofIntegrated Amorphous Silicon Drivers AMLCDs: A Review
J. Magarino, T. Kretz, H. Lebrun, N. Szydlo
Thales Avionics LCD, France

AMD5 - 2
16:00

Kink-Current Reduced Poly-Si TFTs Employing
Asymmetic Dual-Gate Design for AMOLED Pixel Elements
W.-J. Nam, J. H. Kim, S.-H. Jung, H.-S. Shin, M.-K. Han
Seoul Nat. Univ., Korea

AMD5 - 3
16:20

Reduction of Kink Current in Single Grain TFTs Fabricatedby Micro-Czochralski Process
V. Rana, R. Ishihara, Y. Hiroshima*, S. Inoue*, T. Shimoda*,
J. W. Metsalaar, C .I. M. Beenakker
Delft Univ. of Tech., The Netherlands*Seiko Epson, Japan27

Thu./Fri.

December 9/10

AMD5 - 4
16:40

Lateral Crystallization of Amorphous Silicon Using Single
Pulsed Excimer Laser for Poly-Si TFT
K. B. Park*, H. S. Cho*, H. Yin*, J. S. Jung*, D. Y. Kim*,
W. Xianyu*, J. Y. Kwon*, Y. S. Park*, T. Noguchi* ,***Samsung Advanced Inst. of Tech., Korea**Sungkyunkwan Univ., Korea

Author Interviews
17:00 – 18:00

Friday, December 10
9:00 - 10:30

Marine Hall

AMD6: Mobile Display
Chair:
Co-Chair:C. W. Kim, Samsung Elect., Korea
K. Ono, Hitachi Displays, Japan

AMD6 - 1:
9:00

Invited System-On-Glass Displays for Mobile Applications
H. Asada
NEC, Japan

AMD6 - 2:
9:25

Invited Advanced Laser-Crystallization Technologies of Si
for Next-Generation TFTs
M. Hiramatsu
ALTEDEC, Japan

AMD6 - 3
9:50

A 1.9-in. QVGA a-Si AMLCD with Gate Driver Integrationand High Brightness
T. Inada, S. C. Deane*, M. Cassidy*, K. Yamashita, A. Iwatsu,
S. Kawata, M. Yoshiga, J. R. Hector*, M. Inoue
Philips Mobile Display Syss., Japan*Philips Res. Labs., UK

AMD6 - 4
10:10

Integrated Gate Driver Circuit Using a-Si TFT with Dual
Pull-Down Structure
Y. H. Jang, S. Y. Yoon, B. Kim, M. D. Chun, H. N. Cho,
N. W. Cho, C.-D. Kim, I. J. Chung
LG.Philips LCD, Korea----- Break -----

10:45 - 11:55

Marine Hall

AMD7: System on Panel
Chair:
Co-Chair:Y. Yamamoto, Sharp, Japan
K. Takatori, NEC, Japan

AMD7 - 1:
10:45

Invited Advanced TFT Technologies for System-on Glass
G. Kawachi
ALTEDEC, Japan28

Friday
AMD7 - 2:
11:10

December 10
Invited Development of SLS-Based Mobile Displays
C.-W. Kim, K.-C. Moon, H.-J. Kim, K.-C. Park, C.-H. Kim,
I.-G. Kim, C.-M. Kim, S.-Y. Joo, J.-K. Kang, U.-J. Cung
Samsung Elect., Korea

AMD7 - 3
11:35

A Vth-Self-Compensated Analog Buffer Using Low
Temperature Poly-Silicon Thin Film Transistors
S. H. Yeh, W. T. Sun, C. S. Yang
AU Optronics, Taiwan----- Lunch ----12:20-13:30
Outstanding Poster Paper Awards at Exhibition Hall B

13:40 - 15:15

Marine Hall

AMD8: Organic TFT Technologies
Chair:
Co-Chair:H. Sirringhaus, Univ. of Cambridge / Plastic Logic, UK
S. Utsunomiya, Seiko Epson, Japan

AMD8 - 1:
13:40

Invited Active-Matrix Display Driven by Organic Thin-Film
Transistors on Flexible Substrate
C. C. Lee, J. C. Ho, L. Y. Huang, T. S. Hu, Y. W. Wang,
C. C. Hsieh, W. K. Hwang, W. L. Lin, H. Y. Cheng, T. H. Lin,Y. K. Wang, P. S. Wu
ERSO/ITRI, Taiwan

AMD8 - 2:
14:05

Invited Active-Matrix OLED Panel Driven by Organic TFTs
Y. Inoue, Y. Fujisaki, T. Suzuki, S. Tokito, T. Kurita,
M. Mizukami*, N. Hirohata*, T. Tada*, S. Yagyu*
NHK, Japan*JVC, Japan

AMD8 - 3:
14:30

Invited Large Area, High Performance OTFT Arrays
T. W. Kelley, P. F. Baude, M. A. Haase, D. A. Ender,
D. V. Muyres, S. D. Theiss, R. A. Boehmer, J. H. Tokie,
G. Lee3M, USA

AMD8 - 4
14:55

Liquid Crystal Display Cells Fabricated on a Flexible
Plastic Substrate Driven by a Low Voltage Operation
Organic TFT
Y. Fujisaki, Y. Inoue, H. Sato, H. Fujikake, S. Tokito, T. Kurita
NHK, Japan----- Break -----

15:30 - 17:00

Marine Hall

AMD9: Flexible Display
Chair:
Co-Chair:T. W. Kelley, 3M, USA
M. Ikeda, Toshiba, Japan

29

Friday

December 10

AMD9 - 1:
15:30

Invited Printing of Polymer Transistors for Flexible Active
Matrix Displays
H. Sirringhaus*,***Univ. of Cambridge, UK**Plastic Logic, UK

AMD9 - 2:
15:55

Invited Rollable Displays and Integrated Drivers Based on
Organic Electronics
E. Van Veenendaal, L. Schrijnemakers, M. Van Mil,P. Van Lieshout, F. Touwslager, G. Gelinck, E. Huitema
Philips Res. Lab., The Netherlands

AMD9 - 3
16:20

Development of a Transmissive a-Si TFT-LCD withTransparent Plastic Substrates
Y. Chikama, H. Nishiki, Y. Nakatani, N. Watanabe, H. Gotoh*,
H. Umeda*, W. Oka*
Sharp, Japan*Sumitomo Bakelite, Japan

AMD9 - 4
16:40

Fabrication of High Performance Polymer Thin-Film
Transistors on a Paper
Y. H. Kim, C. J. Lee, D. G. Moon, W. K. Kim, J. I. Han
KETI, Korea

Author Interviews
17:00 – 18:00

Supporting Organizations:Chemistry and LC Material Forum, JLCSLC Physics and Condensed Matter Forum, JLCS
Liquid Crystal Display Forum, JLCSTechnical Group on Information Displays, ITE
Technical Committee on Electronic Information Displays, Electronics
Society, IEICE
Technical Committee on Electron Devices, Electronics Society, IEICE
Technical Committee on Silicon Devices and Materials, IEICEEVENING GET-TOGETHERWITH WINE
Tuesday, December 7
18:00 – 20:00
at Hoou Room (30F),
Hotel Nikko Niigata(Sponsored by Merck Ltd., Japan)
See page 6 for details
30Wednesday

December 8

Workshop on FPD Manufacturing,
Materials and Components
Wednesday, December 8
13:30 - 16:30

Exhibition Hall B

Poster FMCp: FPD Manufacturing, Materials & Components
FMCp - 1

P-Type SrCu2O2 Thin Film Prepared by Reactive Thermal
Co-Evaporation
A. Uemura, E. Noma, K. Saiki, H. Ohnishi
Ehime Univ., Japan

FMCp - 2

Transfer-Film Technology to Eliminate Color-Mixing
Problem of Inkjet Technology Used in Color Filter
Manufacturing
F.-L. Hsu, Y.-C. Lo, H.-A. Li, C.-C. Chien
Chunghwa Picture Tubes, Taiwan

FMCp - 3

Research of Coating PI Alignment-Film by Using Ink-Jet
Technology
H.-A. Li, Y.-C. Lo, K.-H. Chen, C.-C. Chien, F.-L. Hsu
Chunghwa Picture Tubes, Taiwan

FMCp - 4

Laser Absorption Spectroscopy of Ternary Gas Mixture of
He-Ne-Xe in External Electrode Fluorescent Lamp (EEFL)
J. H. Lee, P. Y. Oh, J. Y. Lee, G. S. Cho, E. H. Choi
Kwangwoon Univ., Korea

FMCp - 5

New Rubbing Cloths for Reliable Alignment Process to
Manufacture Advanced LCDs
T. Inoue, H. Tabira, Y. Hirota*, K. Nishiguchi*
Hitachi, Japan*Hayashi Telempu, Japan

FMCp - 6

Novel Photoalignment Process and Materials For LC
Patterned Retarder
T. Kim, P. Jung*
adVue, Korea*Hansol LCD, Korea

FMCp - 7

The Optical Simulation Analysis and Actual Material Testof a High Brightness Prism Light-Guide Plate for
Backlighting Transmissive LCDs
D. K. Yoon, J. M. Han, Y. S. Oh, K. W. Bae, Y. H. Kim,
Y. J. Lim
BOE-HYDIS Tech., Korea

FMCp - 8

The Electric-Optical Characteristics of Backlight Unit withLED Light Source
M. S. Lee, D. S. Park, Y. S. Oh, J. M. Han, K. W. Bae,K. H. Kim, Y. J. Lim
BOE-HYDIS Tech., Korea

31

Wednesday
FMCp - 9

December 8

Direct LED Backlight System Using Novel High-Refractive
PolymerN. Harada, I. Suehiro, Y. Hotta
Nitto Denko, Japan

FMCp - 10

Statistic Error for Fast Optimization of LCD Backlight
C. R. Ou, S. C. Chung
ITRI/OES, Taiwan

FMCp - 11

Super Bright Backlighting System for Gen. 6 LCD Panel
Visual Inspection System
S. Lim, K. K. Lee*
Dankook Univ., Korea*GLDTEK, Korea

FMCp - 12

Inductively Coupled Plasma Etch Process of Al2O3 Films
for the Fabrication of Very Low Temperature Poly-Si TFTs
on a Plastic Substrate
S. J. Yun, K.-H. Kwon*, D.-W. Kim, J. W. Lim, Y.-H. Kim,
C.-H. Chung, D. J. Park, J.-H. Lee
ETRI, Korea*Hanseo Univ., Korea

FMCp - 13

Plasma-Resistant Glass
K. Arai, S. Hashimoto, T. Takahata
Tosoh, Japan

13:30 - 14:50

Snow Hall A

FMC1: Materials (1)Chair:
Co-Chair:D. Arthur, Eikos, USA
T. Miyashita, Tohoku Univ., Japan

FMC1 - 1:
13:30

Invited Non-Diffuse Cu-Alloy Thin-Film for TFT-LCDs
T. Ueno, N. Oda, J. P. Chu
DEPT, Japan

FMC1 - 2:
13:50

Invited Individually Dispersed ITO Nanoparticle Ink forTransparent Conductive Film Formation
M. Oda, H. Yamaguchi, N. Abe, T. Atsuki, S. Ukishima,
H. Takei, S. Ishibashi, R. Kiyoshima*, S. Shiraishi*,T. Hayashi*
ULVAC, Japan*JEMCO, Japan

FMC1 - 3
14:10

Reduced Power Consumption of a Touch Panel Using
Patterned Indium Tin Oxide Resistors
C.-M. Hsu, Y.-Z. Chang, H.-M. Liu, H.-E. Chen, W.-T. Wu
Southern Taiwan Univ. of Tech., Taiwan

FMC1 - 4:
14:30

Invited Transparent Carbon Nanotube Electrodes for LCD
Color Filters
D. Arthur, P. Wallis, J. Luo
Eikos, USA----- Break -----

32

Wed./Thu.

December 8/9

15:10 - 15:50

Snow Hall A

FMC2: Manufacturing Technologies (1)Chiar:
Co-Chair:D. Grigg, Zygo, USA
K. Dantani, Dai Nippon Printing, Japan

FMC2 - 1:
15:10

Invited New Optical Metrology Techniques for Color Filter
Inspection and Process Control
D. Grigg, R. Garden, M. Mino, H. Lu
Zygo, USA

FMC2 - 2:
15:30

Invited Optical Inspection System for the Next Generation
LCD Production
N. Kakishita
Kubotek, Japan----- Break -----

16:50 - 17:50

Snow Hall A

FMC3: Color Filter
Chair:
Co-Chair:D. Grigg, Zygo, USA
K. Dantani, Dai Nippon Printing, Japan

FMC3 - 1
16:50

High Sensitivity and High OD Value Carbon Dispersed
Black Resist for LCD Color Filter
K. Uchikawa
Tokyo Ohka Kogyo, Japan

FMC3 - 2:
17:10

Invited Fabrication System of Patterned Spacers withHigh Uniformity by Transfer Method
H. Itoh, S. Yoshinari, K. Hasebe
Fuji Photo Film, Japan

FMC3 - 3
17:30

New Color Filter Carried Out by a Roll-to-Roll Process
T. Eguchi, A. Sonehara, A. Sugizaki, T. Ito*, A. Kumano**,T. Takahashi***Tech. Res. Assn. for Advanced Display Materials, Japan*Sumitomo Bakelite, Japan**JSR, Japan***Dai Nippon Printing, Japan

Author Interviews
18:10 – 19:00

Thursday, December 9
9:00 - 10:20

Snow Hall A

FMC4: Advanced Technologies
Chair:
Co-Chair:W. Becker, Merck, Germany
Y. Fujimura, Nitto Denko, Japan33

Thursday
FMC4 - 1:
9:00

December 9
Invited New EU Legislation (WEEE) Compliant Recovery
Processes for LCDs
R. Martin, B. Simon-Hettich, W. Becker
Merck, Germany

FMC4 - 2
9:20

New Simulation Methods for Optimizing the Visual
Ergonomics of Displays
J. Delacour, L. Fournier, E. Humbert, J.-P. Menu*
Optis, France*IMNSSA, France

FMC4 - 3
9:40

New 3-D MEMS Approach for Precision Manufacturing of
Flat Panel Displays
M. Nosaka, L. Creagh
Spectra, USA

FMC4 - 4:
10:00

Invited Inkjet Printed LCDs
J. Vogels*, S. Klink*, R. Penterman*, H. de Koning*,
H. Huitema*, D. Broer*,***Philips Res., The Netherlands**Tech. Univ. of Eindhoven, The Netherlands----- Break -----

10:40 - 12:00

Snow Hall A

FMC5: Manufacturing Technologies (2)Chair:
Co-Chair:J. Jang, Kyung Hee Univ., Korea
K. Saito, ULVAC, Japan

FMC5 - 1:
10:40

Invited Contactless Panel Transportation System
S. Yamamoto
Orbotech Japan, Japan

FMC5 - 2
11:00

The Latest PECVD Technology for Large-Size TFT-LCD
T. Takehara, S. Sun, I. D. Kang
AKT, USA

FMC5 - 3:
11:20

Invited New PE-CVD Concept for Next Generation
D. Y. Yang
Jusung Eng., Korea

FMC5 - 4
11:40

Wide ECR Plasma Source by Parallel Introduction of
Synchronized-Phase Microwaves for Large Area
Substrates
K. Saito, H. Takagi, T. Takahashi, T. Nozaki, S. Matsuo
NTT Afty, Japan----- Lunch -----

34

Thursday

December 9

14:00 - 15:20

Snow Hall A

FMC6: Manufacturing Technologies (3)Chair:
Co-Chair:

K. R. Sarma, Honeywell, USA
Y. Ukai, Sony, Japan

FMC6 - 1:
14:00

Invited Solid State YAG2ω Laser Annealing System for the
Fabrication of Poly-Si TFT-FPDs
K. Tamagawa, T. Ohnishi, T. Kikuchi, M. Hayama
ULVAC, Japan

FMC6 - 2
14:20

DPSS Green Laser Crystallization Technology Based on
Double-Pulse Control
T. Kudo, K. Yamazaki, T. Akashi
Sumitomo Heavy Inds., Japan

FMC6 - 3
14:40

Laser CVD Repair Technology for Final Yield
Improvement Method in Mass and Large Size TFT-LCD
Production Process
K. Wakabayashi, K. Mitobe, T. Torigoe
Laserfront Tech., Japan

FMC6 - 4
15:00

A Narrow Bezel LCD Panel with a Shielding Pattern
Design for ODF Process
L. Jiang, H.-J. Chu, C.-K. He, W.-H. Liu, S.-H. Hou
Chunghwa Picture Tubes, Taiwan----- Break -----

15:40 - 16:40

Snow Hall A

FMC7: Materials (2)Chaiir:
Co-Chair:J. Hanna, Tokyo Inst. Tech., Japan
T. Nagahara, Clariant, Japan

FMC7 - 1:
15:40

Invited Deposition of High Crystallinity Polycrystalline Si
and SiGe Thin Films on Glass Substrates by Reactive
Thermal CVD
J. Hanna
Tokyo Inst. of Tech., Japan

FMC7 - 2:
16:00

Invited Materials for Printed Organic Thin Film Transistors
T. Kamata, T. Kodzasa, S. Uemura, M. Yoshida, S. Hoshino,
K. YaseNat. Inst. of Advanced Ind. Sci. & Tech., Japan

FMC7 - 3
16:20

UV-Nanoimprint Lithography Using New Photo-Curable
Materials and 3-Demensional Patterning Method
N. Sakai, M. Ohtaguchi, K. Kawaguchi*, J. Taniguchi*,
I. Miyamoto*Toyo Gosei, Japan*Tokyo Univ. of Sci., Japan

Author Interviews
17:00 – 18:00

35

Friday

December 10

Friday, December 10
9:00 - 10:20

Snow Hall A

FMC8: Optical Films
Chair:
Co-Chair:J. S. Yu, LG Chem, Korea
H. Mori, Fuji Photo Film, Japan

FMC8 - 1:
9:00

Invited Nano Crystal-Doped Zero-Birefringence Optical
Polymers for Liquid Crystal Displays
A. Tagaya* ,**, H. Ohkita*,**, Y. Koike*,***Keio Univ., Japan**Japan Sci. & Tech. Agency, Japan

FMC8 - 2:
9:20

Invited Novel Design Method Using Birefringence
Dispersion Control of Retardation Films for a HighContrast LCD in Wide Viewing Angle Range
A. Uchiyama*,**, T. Ishinabe*, T. Miyashita*, T. Uchida*,
Y. Ono**, Y. Ikeda***Tohoku Univ., Japan**Teijin, Japan

FMC8 - 3
9:40

Depth-Dependent Determination of Molecular Orientation
for WV-Film
Y. Takahashi, H. Watanabe, T. Kato*
Fuji Photo Film, Japan*Josai Univ., Japan

FMC8 - 4
10:00

A New Polarizer with Wide Viewing Angle and Low Color
Shift Characteristics Designed for In-Plane-Switching
Liquid Crystal Display (IPS-LCD)
J. S. Yu, S. V. Belyaev, M. S. Park, B. K. Jeon, D. Cho,
J.-S. Park, N. V. Malimonenko
LG Chem, Korea----- Break -----

10:40 - 12:00

Snow Hall A

FMC9: Backlight Systems (1)Chair:
Co-Chiar:

M. J. J. Jak, Philips Res. Labs., The Netherlands
K. Käläntär. Nippon Leiz, Japan

FMC9 - 1:
10:40

Invited Efficient Polarized-Light Backlights

FMC9 - 2
11:00

Spatially Controlled Light Extraction from a Planar
Waveguide for Dynamic Backlighting

H. J. Cornelissen*, D. J. Broer*,**, K. W. Chien***,H. J. B. Jagt*, C. W. M. Bastiaansen***Philips Res. Labs., The Netherlands**Eindhoven Univ. of Tech., The Netherlands***Nat. Chiao Tung Univ., Taiwan

M. J. J. Jak*, H. de Koning*, H. J. Cornelissen*,
D. J. Broer*,**, S. Y. Thang****Philips Res. Labs., The Netherlands**Eindhoven Univ. of Tech., The Netherlands***Philips MDS, China

36

Friday

December 10

FMC9 - 3
11:20

Novel Beam Shaping Structure for the CCFL Based Direct
Backlight System
S. C. Chung, C. R. Ou, H. Y. Lin, C. C. Lin, H. H. Lo,
C. X. Tseng
ITRI/OES, Taiwan

FMC9 - 4
11:40

Application of Adaptive Dimming Technique to a 17-in.
LCTV for Reducing Backlight Power
N. Takeo, S. Kuwahara, T. Shiga, S. Mikoshiba
Univ. of Electro-Commun., Japan----- Lunch ----12:20-13:30
Outstanding Poster Paper Awards at Exhibition Hall B

14:00 - 15:20

Snow Hall A

FMC10: Backlight Systems (2)Chair:
Co-Chair:H. Cornelissen, Philips Res. Labs., The Netherlands
M. Takagi, Harison Toshiba Lighting, Japan

FMC10 - 1
14:00

The Latest Technologies of a CCFL for a Large Area
LCD-TVN. Hashimoto, K. Matsuo, H. Yamashita, K. Yamada*Matsushita Elec. Ind., Japan*West Elec., Japan

FMC10 - 2: Invited 32-in. LCD TV Backlight Unit Using a Hg-free Flat
14:20
Lamp System
O. Kuo, C.-M. Wang, F. Yu, N. Haas*, L. Hitzschke*,
R. Lecheler*, C. Schraft*, F. Vollkommer*, K. Ziemssen*
Young Lighting Tech., Taiwan*Osram, Germany
FMC10 - 3
14:40

RGB-LED Backlighting Monitor/TV for Reproduction of
Images in Standard and Extended Color Spaces
K. Käläntär, M. Okada
Nippon Leiz, Japan

FMC10 - 4
15:00

Prism-Sheetless High-Brightness Backlight System for
Mobile Phone
A. Funamoto, Y. Kawabata, M. Ohira, S. Aoyama
Omron, Japan----- Break -----

15:40 - 16:40

Snow Hall A

FMC11: Optical Systems
Chair:
Co-Chair:J. Bruinink, Philips Res. Lab., The Netherlands
T. Hayashi, Sumitomo 3M, Japan37

Friday

December 10

FMC11 - 1: Invited Photonic Functions of Periodic Microstructures on
15:40
Glass
J. NishiiNat. Inst. of Advanced Ind. Sci. & Tech., Japan
FMC11 - 2
16:00

Design, Fabrication and Characteristics of Binary
Gratings Consisting of Silica Glass
T. Nakazawa, K. Oya*, S. Kittaka, K. Tsunetomo,
K. Kintaka**, J. Nishii**, K. Hirao***
Nippon Sheet Glass, Japan*New Glass Forum, Japan**Nat. Inst. of Advanced Ind. Sci. & Tech., Japan***Kyoto Univ., Japan

FMC11 - 3
16:20

Brightness Enhancement in Transflective AMLCDs by
Using Micro-Lens Arrays
J. Bruinink, D.K.G. de Boer, H. J. Cornelissen, M. Creusen*
Philips Res. Labs., The Netherlands*Philips Mobile Display Syss., The Netherlands

Author Interviews
17:00 – 18:00

Supporting Organizations:
The Japan Society for Printing Science and Technology
Japan Society of Colour Material
The Technical Association of Photopolymers, JapanThe Imaging Society of Japan
Society of Photographic Science and Technology, Japan
Japan Printed Circuit Assossiaton
The Society of Radtech, JapanThe Society of Polymer Science, JapanThe Japanese Research Assosiation of Organic Electronics Materials

BANQUET
Wednesday, December 8
19:30 – 21:30
at Continental Room
Hotel Okura Niigata
Free Shuttle Bus;
From Toki Messe to Banquet Site
at 18:20, 18:45 and 19:10
From Banquet Site to Toki Messe
at 21:50
See page 6 for details
38

Wed./Thu.

December 8/9

Workshop on CRTs
Wednesday, December 8
13:30 - 16:30

Snow Hall B

Poster CRTp: CRTs
CRTp - 1

A Screen-Printed Cathode with Acicular Conductive
Particles
T. W. Kim, J. S. Choi, S. K. Kim, T. M. Jo, Y. J. Youn,
H. C. Kim
Samsung SDI, Korea

CRTp - 2

Mathematical Approach to Emission and Cutoff
Degradation in CRTs
B. M. Weon
LG.Philips Displays, Korea

CRTp - 3

Reducing the Number of Focusing Grid Pieces of MiniNeck CRT Gun
C. T. Chan, W. N. Chang*, C. H. Yeh*, P. H. Chong,
C. C. Chao
Chunghwa Picture Tubes, Malaysia*Chunghwa Picture Tubes, Taiwan

CRTp - 4

Optimized Mask & Frame Structure for Improving theAnti-Doming Performance in CRTs
N. J. Koh, P. S. Jung, J. E. Choi, S. Y. Park, J. C. Park
LG.Philips Displays, Korea

CRTp - 5

Reduction of Phosphor Aging Time in Projection CRT
L. C. Yang
CPTF Optronics, China

Thursday, December 99:00-9:05

Room 302

Opening
Opening Remarks
9:00
S. Shirai, Workshop Chair
9:05 - 10:15

Room 302

CRT1: For the Revival of CRT
Chair:
Co-Chair:D. den Engelsen, LG.Philips Displays, The Netherlands
S. Shirai, Hitachi Displays, Japan

CRT1 - 1:
09:05

Invited CRT Industry, Time to Fight Back
H.-Y. Chen
Chunghwa Picture Tubes, Taiwan

39

Thursday
CRT1 - 2:
9:30

December 9
Invited Recent Developments and Prospects on Glass
Technology for Still Brightly Shining CRTs
T. Sugawara
Asahi Glass, Japan

CRT1 - 3
9:55

A New Self-Converging System with Combination ofMagnetic Lens and Uniform Horizontal Deflection Field
H. Sakurai, E. Tagami
Matsushita Toshiba Picture Display, Japan----- Break -----

10:30 - 12:10

Room 302

CRT2: Masks & Screens
Chair:
Co-Chair:N. J. Koh, LG.Philips Displays, Korea
M. Maeda, Maeda Consulting, Japan

CRT2 - 1
10:30

Robust CRT Shadow Mask Optimization Using an Integral
Meta-Modeling Approach
A. Grubben, J. van der Heijden, P. Martens, T. Spanjer
LG.Philips Displays, The Netherlands

CRT2 - 2
10:50

Study of AK Shadow Mask with Material Coating for Flat
CPTs
S. M. Kim, P. S. Jeong, J. Y. Kim, N. J. Koh, S. Y. Park,J. C. Park, J . E. Choi
LG.Philips Displays, Korea

CRT2 - 3
11:10

An Improved Microphony Measurement System for CRTs
J. H. Kim, K. D. Ha
Samsung SDI, Korea

CRT2 - 4
11:30

Analysis of Mis-Landing Caused by Increased Beam
Current in Color CRTs
K. Ohta, Y. Wada
Matsushita Toshiba Picture Display, Japan

CRT2 - 5
11:50

Heat Transfer Analysis of New Coolant for an OpticalEngineM. Liu, C.-C. Chen, I.-H. Yen, C.-L Liu, C.-N. Mo, S.-T. Yang
Chunghwa Picture Tubes, Taiwan----- Lunch -----

14:00 - 15:20

Room 302

CRT3: Deflection Yokes
Chair:
Co-Chair:40

H. Y. Chen, Chungwa Picture Tubes, Taiwan
Y. Wada, Matsushita Toshiba Picture Display, JapanThursday

December 9

CRT3 - 1
14:00

Magnetic Ring for Convergence Improvement in
Rectangular Shaped DYs
I. H. T. Fierkens
LG.Philips Displays, The Netherlands

CRT3 - 2
14:20

A High-Efficiency Velocity Modulation System for Color
CRTs
K. Taniwa, A. Sato, K. Iwasaki
Matsushita Toshiba Picture Display, Japan

CRT3 - 3
14:40

Minimization of Acoustic Noise from Deflection Yokes
J. W. Nam, S. G. Hwang
Samsung SDI, Korea

CRT3 - 4
15:00

A Deflection Yoke for Projection TV with Reduced
Geometrical Distortion
Y. Takahiko, I. Katsuyo
Matsushita Toshiba Picture Display, Japan----- Break -----

15:40 - 17:00

Room 302

CRT4: Cathodes & Getters
Chair:
Co-Chair:P. van der Heide, LG.Philips Displays, The Netherlands
T. Higuchi, Matsushita Toshiba Picture Display, Japan

CRT4 - 1:
15:40

Invited Centennial of the Oxide CathodeD. den Engelsen, G. Gaertner*
LG.Philips Displays, The Netherlands*Philips Res. Labs., Germany

CRT4 - 2
16:00

Lifetime Improvement of the Bimetal Oxide-CoatedCathodeJ.-L. Ricaud, F. Poret, J.-M. Roquais
Thomson, France

CRT4 - 3:
16:20

Invited The Behavior of Ba-Films in Color CRTs
D. den Engelsen, B. Ferrario*
LG.Philips Displays, The Netherlands*Saes Getters, Italy

CRT4 - 4
16:40

A Study of Correlation between Residual Gas andEmission Life
Y. Hayashida, S. Nakagawa
Matsushita Toshiba Picture Display, Japan

Author Interviews
17:00 – 18:00
Supporting Organizations:Technical Group on Information Display, ITE
Technical Committee on Electronic Information Displays, Electronics
Society, IEICE

41

Wednesday

December 8

Workshop on Plasma Displays
Wednesday, December 8
13:30 - 14:50

Marine Hall

PDP1: Discharge Mechanism
Chair:
Co-Chair:K. W. Whang, Seoul Nat. Univ., Korea
S. Mikoshiba, Univ. of Electro-Commun., Japan

PDP1 - 1:
13:30

Invited In Celebration of 40 Years of PDP History
L. F. Weber
Consultant, USA

PDP1 - 2
13:50

Electron Density and Temperature Profiles of StriatedPlasma in an AC PDP-Like Discharge
S. Hassaballa, K. Tomita, Y-J. Kim, Y. Yamagata,
Kiichiro. Uchino, H. Hatanaka*, Y. M. Kim*, S. E. Lee*,S. H. Shon*, S. H. Jang*
Kyushu Univ., Japan*Samsung Advanced Inst. of Tech., Korea

PDP1 - 3
14:10

Three-Dimensional Fully Kinetic Simulations of the
Discharge Pulse in an AC PDP Cell
V. P. Nagorny, V. N. Khudik
Plasma Dynamics, USA

PDP1 - 4
14:30

Analysis of Micro-Discharge with Long Discharge Path in
AC PDP Based on ICCD Observation
J. Y. Kim, H. Kim, B. S. Kim, H.-S. Tae, J.-H. So*,S. H. Jang**, Y. M. Kim**
Kyungpook Nat. Univ., Korea*Incheon Univ., Korea**Samsung Advanced Inst. of Tech., Korea----- Break -----

15:10 - 16:30

Marine Hall

PDP2: Cell Structure & Materials
Chair:
Co-Chair:B. P. Wang, Southeast Univ., China
M. Uchidoi, Pioneer, Japan

PDP2 - 1:
15:10

Invited A 34-in. Diagonal PDP with Metal Barrier Rib
B. Wang, X. Zhang, Q. Li, Y. Tang, Y. Tu, J. Xia, Y. Zheng,
Z. Fang, H. Yin, L. TongSoutheast Univ., China

PDP2 - 2
15:30

Improvement in Address Discharge Response with Stripe
Ribs and Discharge Deactivation Films
S. Nagano, K. Sano, K. Hirose, S. Makino
Mitsubishi Elec., Japan42

Wed./Thu.

December 8/9

PDP2 - 3
15:50

Defects in Vacuum Evaporated MgO Thin Films Observed
by Cathodoluminescence Analysis
T. Hirakawa, H. Uchiike
Saga Univ., Japan

PDP2 - 4
16:10

Hybrid Protective Layer with ZnO Nanowires for AC PDPs
S. H. Yoon, Y. S. Kim
Hongik Univ., Korea----- Break -----

16:50 - 17:50

Marine Hall

PDP3: Components
Chair:
Co-Chair:H. Tolner, Consultant, The Netherlands
T. Shinoda, Fujitsu Labs., Japan

PDP3 - 1:
16:50

Invited Recent Trends and Issues for Large Size PDPGlass Substrates
H. Ishikawa, K. Maeda, Y. Asano
Asahi Glass, Japan

PDP3 - 2
17:10

Front Filter Directly Applied on Panel Surface without
Air Gap
T. Oishi
Pioneer, Japan

PDP3 - 3
17:30

PDP Scan Driver IC with Smart Gate Controlled IGBTs
H. Kobayashi, H. Sumida, A. Fukuchi, H. Shimabukuro,
Y. Shigeta, G. Tada
Fuji Elec. Device Tech., Japan

Author Interviews
18:10 – 19:00

Thursday, December 9
10:40 - 12:10

Room 301

PH2/PDP4: Phosphors for PDPs
Chair:
Co-Chair:M. Shiiki, Hitachi, JapanY. Murakami, NHK, Japan

PH2/PDP4 - 1: Invited Degradation Mechanism of BaMgAl10O17:Eu2+
10:40(BAM) Blue Phosphor for PDPs
S. Fukuta, T. Onimaru, T. Misawa, K. Sakita, S. Kasahara,
K. Betsui
Fujitsu Labs., Japan43

Thursday
PH2/PDP4 - 2
11:10

December 9
Luminescent and Aging Characteristics of Test-PDP
Panel Using Gd-Codoped CaMgSi2O6:Eu2+ Phosphors
T. Kunimoto, S. Yamaguchi*, K. Ohmi*, H. Kobayashi
Tokushima Bunri Univ., Japan*Tottori Univ., Japan

PH2/PDP4 - 3
11:30

Thermal Quenching of the Blue Phosphors for Plasma
Display Panels
N. Tanamachi, K. Egoshi, H. Tanno, Q. Zeng, S. Zhang
Daiden, Japan

PH2/PDP4 - 4
11:50

A New Synthesis of Germanate Phosphor for PDP
Application
J. H. Kim, I. K. Choi, Y. C. You, D. S. Zang
Samsung SDI, Korea

Author Interviews
17:00 – 18:00

14:00 - 17:00

Exhibition Hall B

Poster PDPp1: Cell Design
PDPp1 - 1

Discharge and Luminous Characteristics of AC PDPs
with a Grooved Front Dielectric Layer
S. J. Yoon, I. Lee, O. D. Kim, J. H. Jeong, J. R. Lim,K. Y. Choi
LG Elect., Korea

PDPp1 - 2

Characteristics of AC PDP with Box Shaped Apertures inTransparent Dielectric Layer
M. H. Nam, S. H.Son*, Y. M. Kim*, B. S. Kim, S. Y. Choi
Kyungpook Nat. Univ., Korea*Samsung Advanced Inst. of Tech., Korea

PDPp1 - 3

Effects of Barrier Rib Height and Electrode Geometry on
Discharge Characteristics of AC PDPs
E.-Y. Jeong, J.-C. Ahn, K.-D. Kang, H.-S. Yoo, E.-G. Heo,
W.-J. Yi, K.-S. Lee
Samsung SDI, Korea

PDPp1 - 4

Effects of Priming Particles on the Discharge Mode in AC
PDP Driven by Ramp Voltage Waveform
D. K. Lee
Pusan Univ., Korea

PDPp1 - 5

Effect of Subpixel Aspect Ratio on Luminous Efficiency of
AC PDPs
H. S. Bae, T. J. Kim, K.-W. Whang
Seoul Nat. Univ., Korea

44

Thursday

December 9

14:00 - 17:00

Exhibition Hall B

Poster PDPp2: Discharge Mechanisms
PDPp2 - 1

Temporal Image Sticking Phenomena in AC PDP with
Large Sustain Gap
J.-W. Han, B.-G. Cho, K.-H. Park, J. Y. Kim, H.-S. Tae,
S.-I. Chien, B. J. Shin*
Kyungpook Nat. Univ., Korea*Sejong Univ., Korea

PDPp2 - 2

Three-Dimensional Measurement of Electron
Temperature and Plasma Density in Coplanar AC PDP
M. W. Moon, W. B. Park, Y. H. Seo, G. S. Cho, E. H. Choi
Kwangwoon Univ., Korea

PDPp2 - 3

Influence of Sustain Electrode Gap on 1s5 Metastable
Xenon Detected with Laser Absorption Spectroscopy in
AC PDP
P. Oh, H. Lee, H. Moon*, J. Hong, W. Jeon, G. Cho, E. Choi
PDP Res. Ctr. / Kwangwoon Univ., Korea*Ctr. for Info. & teleCommun. Standards,
Korea Res. Inst. of Standards & Sci., Korea

PDPp2 - 4

Improvement of Luminous Efficacy in AC PDP with Open
Dielectric Structure
D.-S. Lee, H.-J. Lee, H.-J. Lee, D.-H. Kim, C.-H. Park
Pusan Univ., Korea

PDPp2 - 5

Analysis of Discharge Phenomena in AC PDP with
Coplanar Long-Sustain Gap and Auxiliary ElectrodeS. D. Park, N. H. Shin, B. J. Shin, K. C. Choi
Sejong Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster PDPp3: Discharge Gases
PDPp3 - 1

A Study of New Penning Gas for the Improvement of
Luminance and Luminous Efficiency in AC PDP
S.-O. Kwon, H.-J. Hwang
Chung-Ang Univ., Korea

PDPp3 - 2

Spatiotemporal Behaviors of Excited Kr Atoms in Kr-Ne
Gas Mixtures AC PDP
J.-S. Oh, S. Kawai, O. Sakai, H. Hatanaka*, Y.-M. Kim*,
K. Tachibana
Kyoto Univ., Japan*Samsung Advanced Inst. of Tech., Korea

PDPp3 - 3

Influence of Binary and Ternary Gas Mixtures of (He,Ne)Xe on the Vacuum Ultraviolet Luminous Efficiency in AC
PDPs
K. B. Jung, J. H. Lee, W. B. Park, W. Jeon, P. Y. Oh,
G. S. Cho, H. S. Uhm*, E. H. Choi
Kwangwoon Univ., Korea*Ajou Univ., Korea

45

Thursday

December 9

PDPp3 - 4

Dependence of VUV Band Emission from Xe2* Dimers on
Gas Pressure in Fine Pitch AC PDP
K. Ishii, Y. Hirano, Y. Motoyama, Y. Murakami, K. Tachibana*NHK, Japan*Kyoto Univ., Japan

14:00 - 17:00

Exhibition Hall B

Poster PDPp4: Driving Methods
PDPp4 - 1

New Address Waveform for Improvement of the Priming
Effect and Contrast Ratio in AC PDPs at Address Period
J. S. Kim, B. K. Joung, H. J. Hwang
Chung-ang Univ., Korea

PDPp4 - 2

An Error Diffusion Technique with Reduced Artifacts for
Representation of Gray Levels in Dark Areas on PDP
Y. H. Kim, C. W. Kim
Inha Univ., Korea

PDPp4 - 3

Analysis of Driving Method for Long Gap Discharge byUsing Vth Close Curve in AC PDP
M. S. Kim, W. J. Kim, K. D. Cho, K. J. Jeong, S. I. Lee,Y. C. Choi, K. R. Shim, B. H. Kim, S. H. Kang, J. H. Ryu
LG Elect., Korea

PDPp4 - 4

High Speed Addressing Method for AC PDPs Using Wall
Charge Acceleration Pulse
J.-Y. Kim, J.-G. Bae, I.-M. Lee
Sejong Univ., Korea

PDPp4 - 5

A Novel Discharge AND-Gate PDP for Retrenchment of
Circuitry Cost
J. Ryeom
Kyongju Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster PDPp5: MgO
PDPp5 - 1

Oblique Ion-Induced Secondary Electron Emission
Coefficient and Work Function of MgO Thin Film in AC
PDPs
W. B. Park, K. B. Jung, J. C. Jeong, G. S. Cho, E. H. Choi
Kwangwoon Univ., Korea

PDPp5 - 2

Influences of Degradation of MgO Protective Layer andPhosphor on Ion-Induced Secondary Electron Emission
Coefficient and Basic Discharge Characteristics in
AC PDPJ. E. Lim, H. S. Jeong, W. B. Park, J. Y. Lim, K. B. Jung,
E. H. Choi
Kwangwoon Univ., Korea

46

Thursday

December 9

PDPp5 - 3

Work Function Change on MgO Protective Layer after RF
Plasma Treatment Using Ar, O2, and H2 Gases
J. C. Jung, H. S. Jeong, W. B. Park, E. H. Choi, J. Cho
Kwangwoon Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster PDPp6: Manufacturing Processes
PDPp6 - 1

PDP Margin Voltage Inspection Using Image Processing
MethodW.-C. Tai, C.-J. Lin, C.-L. Liu, C.-N.. Mo, S.-T. Yang
Chunghwa Picture Tubes, Taiwan

PDPp6 - 2

Characteristics of PDP with Reflection Layers of High
Thermal Conductivities
D. Y. Park, Y. S. Kim, S. E. Lee*, Y. M. Kim*
Hongik Univ., Korea*Samsung Advanced Inst. of Tech., Korea

PDPp6 - 3

Semi-Closed Discharge Cells for PDP with Capillary
Molding Process
T. J. Chang, K. I. Kim, Y. S. Kim
Hongik Univ., Korea

PDPp6 - 4

Consideration of Compositions and Properties ofTransparent Dieletrics for PDPs
J. S. Park, S. M. Han, J. H. Hwang, T. Y. Lim, C. Y. Kim,
M. Takaki*
Korea Inst. of Ceramic Eng., Korea*Halla Univ., Korea

PDPp6 - 5

Influence of RO Components on Properties of Pb-Free
Glass Frits for PDPs
S. M. Han, J. S. Park, J. H. Hwang, T. Y. Lim, K. J. Kim,
M. Takaki*
Korea Inst. of Ceramic Eng., Korea*Halla Univ., Korea

14:00 - 17:00

Exhibition Hall B

Poster PDPp7: Discharge Simulation
PDPp7 - 1

Effect of Bus Electrode Position on Discharge andLuminous Characteristics of AC PDPs
I. Lee, S. J. Yoon, O. D. Kim, K. Y. Choi
LG Elect., Korea

PDPp7 - 2

Performances of an AC PDP Cell with Counter SustainElectrodes and an Auxiliary Electrode for Versatile Driving
SchemesS. Kawai, K. Tachibana, J. S. Oh, H. Asai*, N. Kikuchi*,S. Sakamoto*
Kyoto Univ., Japan*Noritake, Japan47

Friday

December 10

Friday, December 10
9:00 - 10:20

Snow Hall B

PDP5: Addressing
Chair:
Co-Chair:G. Oversluizen, Philips Res. Lab., The Netherlands
R. Murai, Matsushita Elec. Ind., Japan

PDP5 - 1:
9:00

Invited Technology for the World Largest 80-in. Full-HD
PDP
E. HeoSamsung SDI, Korea

PDP5 - 2
9:20

New Reset While Address (RWA) Driving Scheme forSingle Scan of XGA Grade AC PDP with High Xe Content
B.-G. Cho, H.-S. Tae
Kyungpook Nat. Univ., Korea

PDP5 - 3
9:40

Bipolar Scan Driving Scheme for High-Speed Address in
AC PDP
S.-K. Jang, K.-H. Park, H.-S. Tae
Kyungpook Nat. Univ., Korea

PDP5 - 4
10:00

Improvement of the Discharge Time Lag of Address Pulse
in AC PDP with High Xe Content
S. H. Lee, K. S. Lee, S. Y. Park, B. J. Shin, K. C. Choi
Sejong Univ., Korea----- Break -----

10:40 - 11:40

Snow Hall B

PDP6: Driving Methods
Chair:
Co-Chair:

R. L. Johnson, Info. Tech., USA
K. Nunomura, NEC Plasma Display, Japan

PDP6 - 1:
10:40

Invited Exciting Developments in Plasma Displays
H. Tolner
PDP Consultant, The Netherlands

PDP6 - 2
11:00

A New High Contrast and High Speed Reset Waveform
D. C. Jeong, K.-W. Whang
Seoul Nat. Univ., Korea

PDP6 - 3
11:20

Study on Reset Discharges in AC PDPs
B. J. Shin, K. C. Choi
Sejong Univ., Korea----- Lunch ----12:20-13:30
Outstanding Poster Paper Awards at Exhibition Hall B

48

Friday

December 10

14:00 - 15:00

Snow Hall B

PDP7: Novel PDPs
Chair:
Co-Chair:L. F. Weber, Consultant, USA
H. Uchiike, Saga Univ., Japan

PDP7 - 1:
14:00

Invited A Technology Roadmap for Developing Large
Capacity Electronic Display Fabrics
R. Johnson
Info. Tech., USA

PDP7 - 2
14:20

Discharge Characteristics of a New Structure AC PDP
Using Thick Film Ceramic Sheet Technology
S. Mori, S. Ajisaka, A. Oku, K. Ikesue, S. Mori, K. Tanaka,
H. Asai, N. Kikuchi, S. Sakamoto
Noritake, Japan

PDP7 - 3
14:40

Light and Flexible Plasma Tube Array with Film Substrate
K. Shinohe, Y. Yamazaki, A. Tokai, H. Hirakawa, H. Yamada,
M. Ishimoto, K. Awamoto, T. Shinoda
Fujitsu Labs., Japan

Author Interviews
17:00 – 18:00

Sponsor:Plasma Display Technical Meeting

SID ’05
Society for Information Display
Symposium, Seminar & Exhibition
May 22–27, 2005
Boston, MA, USA
http://www.sid.org
49

Wednesday

December 8

Workshop on
EL Displays, LEDs and Phosphors
Wednesday, December 8
13:30 - 16:30

Exhibition Hall B

Poster PHp: EL Displays, LEDs and phosphors
PHp - 1High Brightness Warm-White LED Lamps Using Ca-aSiAlON Phosphors
K. Sakuma, Y. Yamamoto*, K. Omichi, N. Hirosaki*, R.-J. Xie*,
M. Ohashi, N. Kimura, T. Suehiro*, D. Tanaka
Fujikura, Japan*Nat. Inst. for Materials Sci., Japan

PHp - 2

Surface Modification and Low Voltage
Cathodoluminescence of SrTiO3:Pr, Al, Ga Phosphor
J. H. Kang, J. Y. Kim*, D. Y. Jeon, S. A. Bukesov**
KAIST, Korea*Samsung Advanced Inst. of Tech., Korea**Seoul Semiconductor, Korea

PHp - 3

Study on YAG:Ce and TAG:Ce Phosphors for the
Application to White-Emitting Light Source Using BlueEmitting LEDs
H. S. Jang, W. B. Im, D. C. Lee, J. H. Kang, D. Y. Jeon
KAIST, Korea

PHp - 4

Crystalline Analysis and Luminescent Properties of
ZnS:Mn Phosphor Thin Films Prepared with NanoParticles
S. Okamoto, K. Tanaka, S. Kuzue*, K. Takizawa*
NHK, Japan*Seikei Univ., Japan

PHp - 5Photoluminescent Properties and Local Structural
Analysis of ZnS:Mn 2+ Nanocrystal Phosphors Modified
with 2-Mercaptoethanol
E. Nakamura, T. Isobe, T. Nakano*, M. Ishitsuka*, M. Saito*
Keio Univ., Japan*Sumitomo Osaka Cement, Japan

PHp - 6Thin-Film Phosphor Development Utilizing Combinatorial
Deposition by r.f. Magnetron Sputtering Using a
Subdivided Powder Target
T. Minami, Y. Mochizuki, T. Miyata, K. Ihara
Kanazawa Inst. of Tech., Japan

PHp - 7High-Luminance Red-Emitting TFEL Devices Using EuActivated (Ga2O3)1-x-(SnO2)x Thin Films Preparedby PLD
T. Miyata, Y. Minamino, T. Minami
Kanazawa Inst. of Tech., Japan50

Wed./Thu.

December 8/9

PHp - 8

Evaluation of Rare Earth-Doped Zn-Y-O Powders
Synthesized by Citric Acid Gel Method
K. Takebayashi, H. Kominami, Y. Nakanishi, Y. Hatanaka*
Shizuoka Univ., Japan*Aichi Univ. of Tech., Japan

PHp - 9Structural Properties and Conduction Control of ZnMgOThin Film by Oxidization of Sulfide on Si Substrates
K. Ohara, T. Harakawa, T. Seino*, A. Nakamura, T. Aoki,
H. Kominami, Y. Nakanishi, Y. Hatanaka**
Shizuoka Univ., Japan*Japan Steel Works, Japan**Aichi Univ. of Tech., Japan
Luminescent Properties of Tb3+ Substituted YAG:Ce,Gd
Phosphors

PHp - 10

Y. S. Lin, R. S. Liu, B.-M. Cheng*, H. Y. Su**Nat. Taiwan Univ., Taiwan*Nat. Synchrotron Radiation Res. Ctr., Taiwan**Lite-On Tech., Taiwan
PHp - 11

Effect of X-Ray Irradiation on Doped Europium in
BaMgAl10O17 Studied by X-ray Absorption Fine
Structure
I. Hirosawa, T. Honma, K. Kato, N. Kijima*, Y. Shimomura**
Japan Synchrotron Radiation Res. Inst., Japan*Mitsubishi Chem., Japan**Kasei Optonix, Japan

PHp - 12

Photoluminescent Characteristics of New Yttrium
Aluminophosphate Phosphors under VUV Excitation
J. H. Kang, W. B. Im, D. Y. Jeon
KAIST, Korea
Blue-Emitting MAl2Si2O8:Eu2+(M=Ca, Ba) Phosphor for
PDP Application

PHp - 13W. B. Im, J. H. Kang, D. Y. Jeon
KAIST, Korea

Thursday, December 9
9:00 - 10:20

Room 301

PH1: ELDs
Chair:
Co-Chair:

H. Yamamoto, Tokyo Univ. of Tech., JapanX. Wu, iFire Tech., Canada

PH1 - 1:
9:00

Invited The Inorganic Electroluminescent Studies in
Tottori University - in Memory of Professor Tanaka H. Kobayashi
Tokushima Bunri Univ., Japan

PH1 - 2:
9:30

Invited Sphere-Supported Thin-Film EL Technology
A.-H. Kitai, Y. Xiang, M. Bulk, B. Cox
McMaster Univ., Canada

51

Thursday
PH1 - 3
10:00

December 9
Defect Density Results of Successful Scaling of TDEL
Display from 17" to 34"
P. Balmforth, R. Yang, A. Gauthier, H. Abe*, Y. Yoshida*,
H. Hamada*, M. Kutsukake**iFire Tech., Canada*Sanyo Elec., Japan**Dai Nippon Printing, Japan----- Break -----

10:40 - 12:10

Room 301

PH2/PDP4: Phosphors for PDPs
Chair:
Co-Chair:M. Shiiki, Hitachi, JapanY. Murakami, NHK, Japan

PH2/PDP4 - 1: Invited Degradation Mechanism of BaMgAl10O17:Eu2+
10:40(BAM) Blue Phosphor for PDPs
S. Fukuta, T. Onimaru, T. Misawa, K. Sakita, S. Kasahara,
K. Betsui
Fujitsu Labs., Japan
PH2/PDP4 - 2
11:10

Luminescent and Aging Caracteristics of Test-PDP Panel
Using Gd-Codoped CaMgSi2O6:Eu2+ Phosphors
T. Kunimoto, S. Yamaguchi*, K. Ohmi*, H. Kobayashi
Tokushima Bunri Univ., Japan*Tottori Univ., Japan

PH2/PDP4 - 3
11:30

Thermal Quenching of the Blue Phosphors for Plasma
Display Panels
N. Tanamachi, K. Egoshi, H. Tanno, Q. Zeng, S. Zhang
Daiden, Japan

PH2/PDP4 - 4
11:50

A New Synthesis of Germanate Phosphor for PDP
Application
J. H. Kim, I. K. Choi, Y. C. You, D. S. Zang
Samsung SDI, Korea----- Lunch -----

14:00 - 15:10

Room 301

PH3: ELDs
Chair:
Co-Chair:P. Balmforth, iFire Tech., Canada
N. Miura, Meiji Univ., Japan

PH3 - 1:
14:00

Invited Large-Screen Flat-Panel Displays Based on TDEL
Technology
X. Wu
iFire Tech., Canada

52

Thu./Fri.

December 9/10

PH3 - 2
14:30

Blue-Emitting Ba2SiS 4:Ce Thin-Film Electroluminescent
Devices Prepared by Electron-Beam Evaporation
S. Usui, Y. Samura, K. Ohmi, H. Kobayashi*
Tottori Univ., Japan*Tokushima Bunri Univ., Japan

PH3 - 3
14:50

New and Improved Electroluminescent Ink Systems
A Buchholz, M. Lewandowski
Acheson Colloids, USA----- Break -----

15:30 - 16:20

Room 301

PH4: Phosphors for LEDs
Chair:
Co-Chair:A. Kitai, McMaster Univ., Canada
S. Okamoto, NHK, Japan

PH4 - 1:
15:30

Invited a-SiAlON-Based Oxynitride/Nitride Phosphors:
Synthesis, Properties and Applications
R. J. Xie, N. Hirosaki, M. Mitomo, Y. Yamamoto, T. Suehiro,
K. Sakuma*
Nat. Inst. for Materials Sci., Japan*Fujikura, Japan

PH4 - 2
16:00

Enhancement of Absorption Around 400 nm in Bi-doped
Y2O3:Eu Red Phosphors for UV LEDs
R. S. Liu, L. S. Chi
Nat. Taiwan Univ., Taiwan

Author Interviews
17:00 – 18:00

Friday, December 10
10:40 - 11:50

Room 302

FED2/PH5: FEDs and Phosphors for FEDs
Chair:
Co-Chair:Y. Nakanishi, Shizuoka Univ., Japan
M. Nakamoto, Shizuoka Univ., Japan

FED2/PH5 - 1: Invited Development of Field Emission Display
10:40
S. ItohFutaba, Japan
FED2/PH5 - 2
11:10

Novel Display Panel Utilizing Field Effect-FerroelectricElectron Emitters
Y. Takeuchi, T. Nanataki, I. Ohwada
NGK Insulators, Japan53

Friday

December 10

FED2/PH5 - 3 Eu2+ Doped A2A’(BO3)2 (A=Ba,Sr, A’=Mg,Ca) Phosphor
11:30
Thin Films Prepared by Pulsed Laser Deposition
TechniqueM. Mizumo, T. Kunimoto*, K. Ohmi, H. Kobayashi*
Tottori Univ., Japan*Tokushima Bunri Univ., Japan

Author Interviews
17:00 – 18:00

Sponsors:
The 125th Research Committee on Mutual Conversion between Light andElectricity, JSPS
Phosphor Research Society, ECSJEXHIBITION
12:00 – 19:00 Wednesday, Dec. 8
10:00 – 18:00 Thursday, Dec. 9
10:00 – 14:00 Friday, Dec. 10
Exhibition Hall B
Free admission with your registration name tag

IDW Tutorial in Japanese
Tuesday, December 7
Room 301
Niigata Convention Center
Detail information will be available in October:
http://www.sidchapters.org/japan/J-menu.htm
Contact address:
idw-tutorial@ml.labs.fujitsu.com
54

Friday

December 10

Workshop on Field Emission Display
Friday, December 10
9:10 - 9:20

Room 302

Opening
Opening Remarks
9:10
M. Takai, Workshop Chair
9:20 - 10:20

Room 302

FED1: FEDs and Novel Devices
Chair:
Co-Chair:J. Ishikawa, Kyoto Univ., Japan
N. Egami, NHK, Japan

FED1 - 1
9:20

A 4-in. QVGA AMCNT-FED Driven by High Voltage LTPSTFTs
H.-Y. Tseng, Y.-W. Wang, C.-M. Chen, C.-Y. Huang,
S.-S. Sheu, W.-Y. Lin, C.-T. Lee, T.-H. Chen, P.-S. Wu,
Y.-H. Yeh, C.-C. Lee
ERSO/ITRI, Taiwan

FED1 - 2
9:35

Improvement of Emission and Focusing Characteristics
for CNT-FED
S. Watanabe, T. Shiroishi, A. Hosono, S. Nakata,
K. Nishimura, T. Sawada, M. Fujikawa, T. Yamamuro,
Z. Shen, F. Abe, S. Okuda, K. Oono, Y. Hirokado, A. Inoue,
M. Inumochi
Mitsubishi Elec., Japan

FED1 - 3
9:50

A 4.8-in. QVGA Graphite Nanofiber FED with Mesh Gate
M. Hirakawa, H. Nakano, H. Murakami, K. Okasaka*,
K. Azami*, T. Hoshino*, T. Sasaki*, T. Sakai**, T. Takei**,T. Yamamoto**
ULVAC, Japan*ULVAC Coating, Japan**NHK, Japan

FED1 - 4
10:05

Flat Lamp Fabrication Using Double-Walled Carbon
Nanotubes Synthesized by Thermal CVD
Y.-D. Lee*,***, H. J. Lee*, S. I. Moon*, H.-S. Hwang**,
J. H. Han**, J.-E. Yoo**, Y.-H. Lee***, S. Nahm***, B.-K. Ju**KIST, Korea**Iljin Nanotech, Korea***Korea Univ., Korea----- Break -----

55

Friday

December 10

10:40 - 11:50

Room 302

FED2/PH5: FEDs and Phosphors for FEDs
Chair:
Co-Chair:Y. Nakanishi, Shizuoka Univ., Japan
M. Nakamoto, Shizuoka Univ., Japan

FED2/PH5 - 1: Invited Development of Field Emission Display
10:40
S. ItohFutaba, Japan
FED2/PH5 - 2 Novel Display Panel Utilizing Field Effect-Ferroelectric
11:10
Electron Emitters
Y. Takeuchi, T. Nanataki, I. Ohwada
NGK Insulators, Japan
FED2/PH5 - 3 Eu2+ Doped A2A’(BO3)2 (A=Ba,Sr, A’=Mg,Ca) Phosphor
11:30
Thin Films Prepared by Pulsed Laser Deposition
TechniqueM. Mizumo, T. Kunimoto*, K. Ohmi, H. Kobayashi*
Tottori Univ., Japan*Tokushima Bunri Univ., Japan----- Lunch ----12:20-13:30
Outstanding Poster Paper Awards at Exhibition Hall B

13:35 - 15:15

Room 302

FED3: FE Materials and Emission Characteristics (1)Chair:
Co-Chair:

H.-Y. Tseng, ERSO/ITRI, Taiwan
H. Mimura, Shizuoka Univ., Japan

FED3 - 1:
13:35

Invited Laser Irradiation to CNT Cathodes for Large
Diagonal FEDs
K. Murakami, W. Rochanachirapar, N. Yamasaki, S. Abo,
F. Wakaya, M. Takai, A. Hosono*, S. Okuda*
Osaka Univ., Japan*Mitsubishi Elec., Japan

FED3 - 2
14:00

Enhanced Electron Emission from the CNT Grown with a
SiNx Capping Layer
S. H. Lim, K. C. Park, J. H. Moon, H. S. Yoon, J. Jang,
D. Pribat*
Univ. of Kyung Hee, Korea*Ecole Polytech., France

FED3 - 3
14:15

Measurement of Field Emission Characteristics of Laser
Irradiated Carbon Nanotubes
Y. Gotoh, Y. Kawamura, K. Ishizu, H. Tsuji, J. Ishikawa,
S. Nakata*, S. Okuda*
Kyoto Univ., Japan*Mitsubishi Elec., Japan56

Friday
FED3 - 4
14:30

December 10
Field Emission Properties from Different Kinds of
CNT Film
C.-Y. Hsiao, Y.-A. Li, J.-L. Tsai, K. Cheng, S.-H. Lee,
P.-H. Chang, C.-H. Hsiao, W.-S. Hsu, J.-S. Fang, C.-C. Kuo,
T.-F. Chan
TECO Nanotech, Taiwan

FED3 - 5
14:45

Investigation of Graphite Nanofiber as an Emitter for FED
M. Ushirozawa, K. Hagiwara, T. Sakai, T. Takei,
T. Yamamoto, M. Hirakawa*, H. Nakano*, H. Murakami*,
K. Okasaka**, T. Sasaki**NHK, Japan*ULVAC, Japan**ULVAC Coating, Japan

FED3 - 6
15:00

Self-Focused Gate Structure for Carbon Nanotube Field
Emitters
Y.-H. Song, K.-B. Kim, S.-H. Lee, C.-S. Hwang, J. H. Lee,
K.-Y. Kang
ETRI, Korea----- Break -----

15:30 - 17:00

Room 302

FED4: FE Materials and Emission Characteristics (2)Chair:
Co-Chair:T. Asano, Kyushu Inst. of Tech., Japan
M. Nakamoto, Shizuoka Univ., Japan

FED4 - 1
15:30

HfC Coated Si-FEA with a Built-in Poly-Si TFT
M. Nagao, Y. Sacho, S. Kanemaru, T. Matsukawa, J. ItohNat. Inst. of Advanced Ind. Sci. & Tech., Japan

FED4 - 2
15:45

Effect of Thermal Annealing On Leakage Current of Field
Emitters Fabricated Using Beam Assisted Processes
K. Murakami, N. Yamasaki, S. Abo, F. Wakaya, M. Takai
Osaka Univ., Japan

FED4 - 3
16:00

Effects of the Thermal Annealing on the Field Emission
Characteristics of an Oxidized Porous Polysilicon Field
Emitter
S. K. Han, S. I. Kwon, S. C. Bae, S. Y. Choi
Kyungpook Nat. Univ., Korea

FED4 - 4
16:15

Field Emission Energy Distributions from Silicon Field
Emitters
H. Shimawaki, Y. Suzuki*, K. Sagae*, Y. Neo**, H. Mimura**
Hachinohe Inst. of Tech., Japan*Tohoku Univ., Japan**Shizuoka Univ., Japan

FED4 - 5
16:30

Boron Nitride Field Emitter on Patterned Substrate
C. Kimura, H. Shima, K. Okada, Y. Yamamuro, T. Sugino
Osaka Univ., Japan57

Friday

December 10

FED4 - 6
16:45

Reduction of the Work Function on Mo(100) Surface
Covered with ZrO2
H. Nakane, S. Satoh, H. Adachi
Muroran Inst. of Tech., Japan

Author Interviews
17:00 – 18:00

Sponsors:
158th Committee on Vacuum Nanoelectronics, JSPS
’04 Asian Vacuum Microelectronics Conference

Niigata Festival
Niigata Traditional Dance and Drums
Friday, December 10
12:20 – 13:30(before Outstanding Poster Paper Awards)
Exhibition Hall B
Niigata Convention Center
See page 6 for details

Late-News Papers
due October 4, 2004
Submit a two-page
camera-ready manuscript ofA4-sized pages, reflecting
important new findings or developments
via on-line submission:
http://idw.ee.uec.ac.jp/authinfo.html
58

Wednesday

December 8

Workshop on Organic LED Displays
Wednesday, December 8
13:20 - 14:45

Room 301

OLED1: Panel
Chair:
Co-Chair:J. Kido, Yamagata Univ., JapanK. Ueno, Canon, Japan

OLED1 - 1: Invited Polymer OLED Television Image Quality
13:20
J. J. L. Hoppenbrouwers, F. P. M. Budzelaar,
N. C. Van der Vaart, C. N. Cordes
Philips Res. Labs., The Netherlands
OLED1 - 2
13:45

Development of Thin Film Passivated 14.1" a-Si AMOLED
J. H. Jung, H. Kim, J. S. Lim, J. S. Rhee, S. P. Lee, N. D. Kim,
J. W. Lee*, B. K. Ju*, K. Chung
Samsung Elect., Korea*KIST, Korea

OLED1 - 3
14:05

High Efficiency Top Emitting OLEDs on a-Si Active Matrix
Backplanes with Large Aperture Ratio
J. Birnstock, J. Blochwitz-Nimoth, K. Leo*
Novaled, Germany*Tech. Univ. Dresden, Germany

OLED1 - 4
14:25

Operating Physics and Newly Developed Technologies ofHigher Performance Full Color OLEDs Based on Color
Conversion Method
K. Sakurai, H. Kimura, K. Kawaguchi, M. Kobayashi,
T. Suzuki, Y. Kawamura, H. Sato, M. Nakatani
Fuji Elec. Advanced Tech., Japan----- Break -----

15:00 - 16:25

Room 301

OLED2: Material
Chair:
Co-Chair:J. Hoppenbrouwer, Philips
Y. Sato, Mitsubishi Chem., Japan

OLED2 - 1: Invited Phosphorescent OLEDs by Organic Vapor Phase
15:00
Deposition
T. X. Zhou, B. D'Andrade, T. Ngo, S. R. Forrest*, M. Shtein*,J. J. Brown
Universal Display, USA*Princeton Univ., USA
OLED2 - 2
15:25

Flexible Color OLED Display using White Light-Emissive
Layer based on Phosphorescent Polymers
M. Suzuki, T. Suzuki, T. Tsuzuki, S. Tokito, T. Kurita, F. Sato
NHK, Japan59

Wednesday
OLED2 - 3
15:45

December 8

Temperature Dependence of L and V of OLED Devices
E. Young, S. Grabowski*, H. Boerner*
Philips Res., The Netherlands*Philips Res., Germany

OLED2 - 4
16:05

Novel Mg:Alq3/WO3 Connecting Layer for Tandem White
Organic Light Emitting Diodes (WOLEDs)
C.-C. Chang, S.-W. Hwang, H.-H. Chen, C. H. Chen,
J.-F. Chen
Nat. Chiao Tung Univ., Taiwan----- Break -----

16:40 - 18:05

Room 301

OLED3: Device Structure
Chair:
Co-Chair:J. Brown, Universal Display, USA
S. Tokito, NHK, Japan

OLED3 - 1: Invited A Challenge to Material Design for High
16:40
Performance OLED
K. Ueno, S. Okada, A. Senoo
Canon, Japan
OLED3 - 2
17:05

White Multi-Photon Emission OLED without Optical
Interference
M. Horii, Y. Jinde, S. Tanaka, A. Ogawa, Y. Kawakami,
Y. Naito
Stanley Elec., Japan

OLED3 - 3
17:25

Very High-Efficiency Deep Blue Organic Light-Emitting
Devices Having a Carrier-Blocking Polymer Layer
A. Mikami, T. Koshiyama, T. Tsubokawa
Kanazawa Inst. of Tech., Japan

OLED3 - 4
17:45

High Efficient Red Organic Light-Emitting Devices Having
the Dotted-Line Doping Structure in an Alq3+Rubrene
Mixed Host Emitting Layer
C. M. Lee, D. I. Kim, J. W. Han
Sejong Univ., Korea

Author Interviews
18:10 – 19:00

13:30 - 16:30

Exhibition Hall B

Poster AMD/OLEDp: Active-Matrix OLED
AMD/OLEDp - 1 A Circuit for Testing TFT-Arrays of AMOLED Displays
D. Nakano, Y. Sakaguchi, K. Imura, A. Ohta
IBM Japan, Japan60

Wed./Thu.

December 8/9

AMD/OLEDp - 2 Active Organic Light Emitting Diode Drive Circuit
H.-R. Han*,**, C.-C. Kuo*,**, W.-T. Liao*, S.-T. Lo*,
W.-C. Wang**Wintek, Taiwan**Nat. Chung Hsing Univ., Taiwan
AMD/OLEDp - 3 A New AMOLED Pixel Driving Scheme Employing Vdd
Line Elimination
W.-J. Nam, J.-H. Lee, S.-H. Jung, C.-W. Han, M.-K. Han
Seoul Nat. Univ., Korea
AMD/OLEDp - 4 A New AMOLED Pixel Design Compensating Threshold
Voltage Degradation of a-Si:H TFT and OLEDJ. H. Kim, J.-H. Lee, W.-J. Nam, B.-H. You, M.-K. Han
Seoul Nat. Univ., Korea
AMD/OLEDp - 5 Uniformity of AM-OLED Pixels Circuits Using asDeposited Polysilicon TFTs Improved by Slicing Effect
A. Gaillard*,**, T. Mohammed-Brahim*, S. Crand*, R. Rogel*,
C. Prat**, P. Leroy***Univ. de Rennes 1, France**Thomson Multimedia R&D, France

Thursday, December 9
9:00 - 10:25

Marine Hall

AMD2/OLED4: AM-OLED (1)Chair:
Co-Chair:G. Zhou, Philips Res. Labs., The Netherlands
T. Shirasaki, Casio Computer, Japan

AMD2/OLED4 - 1: Invited High-Performance and Low-Power AMOLED
9:00
Using White Emitter with Color-Filter Array
K. Mameno, R. Nishikawa, T. Omura, S. Matsumoto,
S. A. Van Slyke*, A. D. Arnold*, T. K. Hatwar*, M. V. Hettel*,
M. E. Miller*, M. J. Murdoch*, J. P. Spindler*
Sanyo Elec., Japan*Eastman Kodak, USA
AMD2/OLED4 - 2
9:25

2.2-in. QVGA AMOLED with Current De-Multiplexer TFT
Circuits
Y. Matsueda, D. Y. Shin, K. N. Kim, D. H. Ryu, B. Y. Chung,
H. K. Kim, H. K. Chung, O. K. Kwon*
Samsung SDI, Korea*Hanyang Univ., Korea

AMD2/OLED4 - 3
9:45

Optical Cross Talk in AMOLED Displays with Optical
Feedback
A. Giraldo, W. Oepts, M. C. J. M. Vissenberg, D. A. Fish*,N. D. Young*
Philips Res. Labs., The Netherlands*Philips Res. Labs., UK

AMD2/OLED4 - 4 Comparison of Driving Methods for TFT-OLEDs and Novel
10:05
Proposal Using Time Ratio Grayscale and Current
Uniformization
M. Kimura
Ryukoku Univ., Japan----- Break -----

61

Thursday

December 9

10:40 - 12:05

Marine Hall

AMD3/OLED5: AM-OLED (2)Chair:
Co-Chair:K. Mameno, Sanyo Elec., Japan
R. Hattori, Kyushu Univ., Japan

AMD3/OLED5 - 1: Invited Solution for Large-Area Full-Color OLED
10:40
Television – Light Emitting Polymer and a-Si TFT
Technologies –T. Shirasaki, T. Ozaki, T. Toyama, M. Takei, M. Kumagai,
K. Sato, S. Shimoda, T. Tano, K. Yamamoto, K. Morimoto,J. Ogura, R. Hattori*
Casio Computer, Japan*Kyushu Univ., Japan
AMD3/OLED5 - 2 A Novel Digital-Gray-Scale Driving Method with a Multiple
11:05
Addressing Sequence for AM-OLED Displays
A. Tagawa, T. Numao, T. Ohba
Sharp, Japan
AMD3/OLED5 - 3 A 2.0-Inch AMOLED Panel with Voltage Programming
11:25
Pixel Circuits and Point Scanning Data Driver Circuits
N. Komiya, C. Y. Oh, K. Y. Eom, Y. W. Kim, S. C. Park,
S. W. Kim
Samsung SDI, Korea
AMD3/OLED5 - 4 A Simple Data Driver Architecture to Improve Uniformity
11:45
of Current-Driven AMOLED
H. Y. Huang, W. T. Sun, C. C. Chen, J. C. Tseng, S. Hopf,
C. F. Sung, C. H. Li, S. H. Li, J. C. Peng, Y. F. Wang, J. J. Lih,
C. S. Yang
AU Optronics, Taiwan

Author Interviews
17:00 – 18:00

14:00 - 17:00

Exhibition Hall B

Poster OLEDp: OLED Poster
OLEDp - 1

Organic Polymer Films Doped by Organic Dyes for OLEDs
Y. Nakanishi*, L. Fenenko*,**, P. Smertenko***Shizuoka Univ., Japan**V. E. Lashkaryov Inst. of Semiconductor Physics of NASU,
UkraineOLEDp - 2

Red Electrophosphorecence from Polyactylene-BasedLight Emitting DiodeZ. L. Xie, J. W. Y. Jacky*, M. Wong, B. Z. Tang, H. S. Kwok
Hong Kong Univ. of Sci. & Tech., Hong Kong

OLEDp - 3

Deep Blue Dopant for High Performance OLEDs andColor Purity
M.-T. Lee, C.-M. Yeh, C. H. Chen
Nat. Chiao Tung Univ., Taiwan

62

Thursday
OLEDp - 4

December 9
Indole Based Compounds as Host Materials for Triplet
Emitters in Organic Light Emitting Diodes
M.-H. Ho, Y.-S. Wu, S.-F. Hsu, T.-Y. Chu, C. H. Chen
Nat. Chiao Tung Univ., Taiwan

OLEDp - 5

Effects of Double Buffer Layers on the Optical Propertiesof White Organic Light Emitting Diodes
M. Yokoyama, G. T. Chen, S. H. Su, J. L. Kwo, S. L. Fu
I-Shou Univ., Taiwan

OLEDp - 6

Highly Efficiect Photoresponsive Organic Light-Emitting
Devices with Phosphorescent Materials
M. Chikamatsu*, H. Konno*, T. Oosawa*,**, M. Yamashita**,
Y. Yoshida*, K. Yase**Nat. Inst. of Advanced Ind. Sci. & Tech., Japan**Tokyo Univ. of Sci., Japan

OLEDp - 7

Top Emitting OLEDs on Flexible Substrate
C.-S. Hwang, S.-H. Ko Park, S. M. Jeong, J. Y. Oh,
M. Y. Yoon, J. I. Lee, Y. S. Yang, M. K. Kim, H. Y. Chu
ETRI, Korea

OLEDp - 8

White OLEDs with a Single Emissive Layer
H. Y. Chu, J.-I. Lee, Y.S. Yang, J. Y. Oh, S.-H. K. Park,
M.-K. Kim, C.-S. Hwang, D.-H. Hwang, J. Jang
ETRI, Korea*Kumo Univ., Korea**Kyung Hee Univ., Korea

OLEDp - 9

Improvement of Efficiency and Brightness by Insertion of
the Novel Layer in Alq3-Based OLEDs
Y. M. Kim*,**, J. W. Lee*,****, J. M. Kim*,***, J. S. Park*,****,
M. Y. Sung**, M. H. Oh***, J. Jin****, B. K. Ju*, J. K. Kim*
*KIST, Korea**Korea Univ., Korea***Dankook Univ., Korea****Kyunghee Univ., Korea

OLEDp - 10

All-Wet-Process Organic Electroluminescent Device
Using Electron Transporting and Alcohol-Soluble Organic
Semiconductor
Y. Goto, T. Hayashida*, M. Noto*
Kyushu Elec. Power, Japan*Daiden, Japan

OLEDp - 11

Improving Characteristics of OLED with Low Work
Function AnodeS.-H. Park, J.-I. Lee, C.-S. Hwang, H. Y. Chu
ETRI, Korea

OLEDp - 12

Preparation of ITO Thin Films for Display Application by
FTS (Facing Targets Sputtering) System
G. H. Kim, H. W. Kim, H. K. Kim*, M. J. Keum, K. H. Kim
Kyungwon Univ., Korea*Samsung SDI, Korea

63

Thursday
OLEDp - 13

December 9
Deposition of AZO Thin Films by FTS System with
Sputtering Current
H. W. Kim, G. H. Kim, M. J. Keum, I. H. Son*, H. W. Choi,
K. H. Kim
Kyungwon Univ., Korea*Shinsung College, Korea

OLEDp - 14

Characteristics Improvement of Flexible Organic LightEmitting Devices by Nickel-Doped Indium Tin Oxide
Anode
C.-M. Hsu, C.-L. Tsai, C.-F. Lu, W.-T. Wu
Southern Taiwan Univ. of Tech., Taiwan

OLEDp - 15

Aluminum-Doped Zinc Oxide Film for PolymericElectroluminescent Devices
X.-T. Hao, F.-R. Zhu, K.-S. Ong, Y.-Q. Li, L.-W. Tan
Inst. of Materials Res. & Eng., Singapore

OLEDp - 16

Fabrication of OLEDs on Epoxy Substrates with
SiNx/CNx:H Multi-Layer Barrier Films
K. Akedo, A. Miura, H. Fujikawa, Y. Taga, Y. Akada*,
T. Umehara*
Toyota CRDL, Japan*Nitto Denko, Japan

OLEDp - 17Synthesis and Properties of Colorless Polyimide and Its
Nanocomposite
J. C. Won, S-L. Ma, Y. S. Kim, M. H. Yi, J. H. Lee, K-Y. Choi
Korea Res. Inst. of Chem. Tech., Korea

OLEDp - 18

Selective Growth of Encapsulation Layer and Its Influence
on Organic Light Emitting Diodes
J. Oh, S.-H. K. Park, C.-S. Hwang, Y. S. Yang, J.-I. Lee,H. Y. Chu
ETRI, Korea

OLEDp - 19

Flexible Transparent Organic Light Emitting Devices(FTOLED)T. Uchida, S. Kaneta, M. Ichihara, M. Ohtsuka, S. Hoshi*,S. Webster**, R. Czerw**, D. L. Carroll**
Tokyo Polytech. Univ., Japan*Yazaki Meter, Japan**Wake Forest Univ., USA

OLEDp - 20

Flexible Barrier Substrates with Parylene Buffer Layer for
Flexible Orgarnic Light Emitting Diode (FOLED)
S. C. Nam, H. Y. Park, K. C. Lee, K. G. Choi, C. J. Lee*,D. G. Moon*, Y. S. Yoon**
Nuricell, Korea*Korea Elect. Tech. Inst., Korea**Konkuk Univ., Korea

OLEDp - 21

Manufacturing of Encapsulation Layers for OLED in
Polymerization and Plasma Diffusion
C.-C. Lu, J.-H. Wu, S.-K. Lo, L. Yu, C.-K. Tzen, S.-J. Tang
Chunghwa Picture Tubes, Taiwan

64Thursday
OLEDp - 22

December 9
Novel Photoelectron Spectrometer Equipped with OpenCounter for Ionization Potential Measurements of OLED
Materials
Y. Nakajima, D. Yamashita, A. Endo*, T. Oyamada*,
C. Adachi*, M. Uda**
Rikenkeiki, Japan*Chitose Inst. of Sci. & Tech., Japan**Waseda Univ., Japan

OLEDp - 23

The Temperature Dependence of PL Intensity andFluorescence Lifetime in Polymer Light-Emitting Diodes
H. Uchida, Y. Fujita, M. Koden, C. Adachi*
Sharp, Japan*Chitose Inst. of Sci. & Tech., Japan

OLEDp - 24

Analysis of the Deterioration Mechanism of
Phosphorescence OLED
R. Kamoto, M. Ichikawa*, K. Araki*, Y. Taniguchi*
Micro Analysis Lab., Japan*Shinshu Univ., Japan

OLEDp - 25

Integrated Host/Dopant Deposition for Large OLED Panel
Manufacturing
M. Shibata, R. Hartmann*, P. Chow*
Sumitomo, Japan*SVT Associates, USA

OLEDp - 26

A Simulation of Current-Voltage Characteristics for Alq3
Single Layer Organic Light Emitting Diodes
N. Nakamura, A. Takahashi, S. Suwa, T. Wakimoto,
M. Kunigita
Asahi Glass, Japan

OLEDp - 27

Effective Power Reduction in a Non-Emissive State ofPassive-Matrix OLED
R. Hattori, S. Ohashi, S. Sugimoto, G. Yip
Kyushu Univ., Japan

Outstanding
Poster Paper Awards
Friday, December 10
12:20 – 13:30(after Niigata Festival)
Exhibition Hall B
See page 5 for details
65

Wednesday

December 8

Workshop on 3D/Hyper-Realistic
Displays and Systems
Wednesday, December 8
13:30-14:50

Room 302

3D1: Hyper Reality
Chair:
Co-Chair:I. Yuyama, Utsunomiya Univ., JapanY. Komiya, Olympus, Japan

3D1 - 1:
13:30

Invited Development of CyberDome - a Scalable
Immersive Projection Display with Hemi-Spherical Screen
N. Shibano, K. Sawada, H. Takemura*
Matsushita Elec. Ind., Japan*Osaka Univ., Japan

3D1 - 2:
14:00

Invited Mixed Reality Audio-Visual Reproduction System
H. Okubo, Y. Nakayama, T. Ikenaga, S. Komiyama
NHK, Japan

3D1 - 3
14:30

An Immersive Display System with Hemispherical Screen
and Multiple Projectors - Fast Calibration and DistortionFree Coordinate Transformation Method H. Haneishi, T. Ajito*, T. Kumano*, A. Watanabe, K. Ohsawa*,
Y. Komiya*, T. Yamazaki*
Chiba Univ., Japan*Olympus, Japan----- Break -----

15:10-16:30

Room 302

3D2: 3D Displays
Chair:
Co-Chair:J.-Y. Son, Hanyang Univ.
T. Mishina, NHK, Japan

3D2 - 1
15:10

Flat Panel Time Multiplexed Autostereoscopic Display
Using an Optical Wedge Waveguide
C. Moller, A. R. L. Travis
Cambridge Univ., UK

3D2 - 2
15:30

A Multi-Viewer, Mobile-Viewer, Head-Tracked 3D
Television Display
P. Surman, I. Sexton, R. Bates, K. C. Yow, W. K. Lee
De Montfort Univ., UK

3D2 - 3
15:50

Volumetric 3D TFT Flat Panel Display System Design
W. Mphepo
Dalarna Univ., Sweden

66

Wed./Thu.

December 8/9

3D2 - 4
16:10

Depth- and Viewing-Angle-Enhanced ThreeDimensional/Two-Dimensional Convertible Display Basedon Integral Imaging
J.-H. Park, H.-R. Kim, Y. Kim, J. Kim, J. Hong, S.-D. Lee,
B. LeeSeoul Nat. Univ., Korea----- Break -----

16:50-18:00

Room 302

3D3: 3D Processing
Chair:
Co-Chair:T. Fujii, Nagoya Univ., JapanT. Ajito, Olympus, Japan

3D3 - 1:
16:50

Invited 3D Computer Graphics Based on Integral
Photography
T. Naemura
Univ. of Tokyo, Japan

3D3 - 2
17:20

Pixel Pattern for Voxels in Rhomb Shape Pixel Cell
J.-Y. Son, V. Saveljev, K.-T. Kim*, S.-S. Kim**
Hanyang Univ., Korea*Hannam Univ., Korea**Samsung Elect., Korea

3D3 - 3
17:40

A Real-Time Time-Multiplexed Stereoscopic Image
Converter
K. W. Kim, H. H. Cho*, C. H. Choi, M. R. Choi
Hanyang Univ., Korea*Commun. Elec. Network, Korea

Author Interviews
18:10 – 19:00

Thursday, December 9
14:00 - 17:00

Exhibition Hall B

Poster 3Dp: 3D Displays & Related Technologies
3Dp - 1A New Pseudoscopic Moving-Image 3D Display without
Glasses Using Moire
C. Yamada, H. Isono
Nippon Inst. of Tech., Japan

3Dp - 2

Flat-Panel Autostereoscopic View-Sequential 3D Display
Backlight
C. M. G. Lee, A. R. L. Travis
Cambridge Univ., UK

67

Thursday
3Dp - 3

December 9
Volumetric Display System Based on Three-Dimensional
Scanning with an Inclined Optical Image
D. Miyazaki, K. Shiba, K. Sotsuka, K. Matsushita
Osaka City Univ., Japan

3Dp - 4

Design Optimization of the Multi-Central Depth Plane
Integral Imaging for Three-Dimensional Display
J. Hong, J. Kim, J.-H. Park, B. Lee
Seoul Nat. Univ., Korea

3Dp - 5

Stereoscopic Cameras and Displays System over Internet
ProtocolH. Noto, Y. Yamada, H. Yamamoto, Y. Hayasaki,
S. Muguruma*, Y. Nagai*, Y. Shimizu*, N. Nishida
Univ. of Tokushima, Japan*Nichia, Japan

15:10 - 17:00

Room 201

VHF4/3D4: 3D Vision
Chair:
Co-Chair:

H. Isono, Nippon Inst. of Tech., JapanS. Yano, NHK, Japan

VHF4/3D4 - 1: Invited 3D Structure and Volume Perception from Motion
15:10
M. Idesawa, M. Uchida, T. H. Moe*
Univ. of Electro-Commun., Japan*Myanmar Radio & Television, Myanmar
VHF4/3D4 - 2
15:40

Mathematical Simulation of the Mime Effect
R. Mtibaa, M. Idesawa, Y. Sakaguchi
Univ. of Electro-Commun., Japan

VHF4/3D4 - 3
16:00

Evaluation of Discontinuity in 3D Images Generated by
High-Density Directional Images
M. Watanabe, H. Nate*, Y. Takaki
Tokyo Univ. of A&T, Japan*Tokyo Polytech. Univ., Japan

VHF4/3D4 - 4
16:20

A New Method of Stereo Matching for Curved Surface
Z. Xu, M. Idesawa
Univ. of Electro-Commun., Japan

VHF4/3D4 - 5
16:40

Development and Evaluation of Stereoscopic 3D Display
with Dynamic Optical Correction
T. Shibata, T. Kawai, M. Otsuki*, N. Miyake*, Y. Yoshihara**,T. Iwasaki***, N. Terashima
Waseda Univ., Japan*Nikon, Japan**Arisawa Manufacturing, Japan***Univ. of Occupational & Environmental Health, Japan

Author Interviews
17:00 – 18:00
Supporting Organization:
Technical Group on Artistic Image Technology, ITE

68

Wed./Thu.

December 8/9

Workshop on
Applied Vision and Human Factors
Wednesday, December 8
13:30 - 16:30

Exhibition Hall B

Poster VHFp: Human Factor and Image Quality
VHFp - 1

Using Human Eye Model to Study the Image Quality of
Display System
C. R. Ou, T. J. Chen
ITRI/OES, Taiwan*Yuan Ze Univ., Taiwan

VHFp - 2

Just Noticeable Difference (JND) Contrast of "Mura" in
LCDs on the Five Background Luminance Levels
T. Tamura, K. Tanaka, M. Baba, M. Suzuki, T. Furuhata
Tokyo Polytech. Univ., Japan

VHFp - 3

Evaluation of Visual Fatigue Relative in the Viewing of a
Depth-Fused 3D Display and 2D Display
Y. Ishigure, S. Suyama, H. Takada, K. Nakazawa,
J. Hosohata*, Y. Takao*, T. Fujikado*
NTT, Japan*Osaka Univ., Japan

VHFp - 4

Securing Information Display by Use of Multiple Decoding
Masks Based on Visual Encryption and Decryption
H. Yamamoto, Y. Hayasaki, N. Nishida
Univ. of Tokushima, Japan

VHFp - 5

Automatic Display Monitoring to Detect Human Bodies byUsing Edge Vector
H. Hadano, F. Saitoh
Gifu Univ., Japan

VHFp - 6

Contrast Improvement of Displayed Scene Image
Including a Moving Object
Y. Kuze, F. Saitoh
Gifu Univ., Japan

VHFp - 7

Triple Density Error Diffusion for Medical Monochrome
LCDs and Evaluation of Its Performance
N. Oka, N. Kuroki, M. Numa, K. Yamamoto
Kobe Univ., Japan

Thursday, December 9
9:00 - 9:10

Room 201

Opening
Opening Remarks
9:00
H. Isono, Workshop Chair

69

Thursday

December 9

9:10 - 10:20

Room 201

VHF1: Human Factor (1)Chair:
Co-Chair:J. L. Bergquist, Nokia Japan, Japan
T. Tamura, Tokyo Polytech. Univ., Japan

VHF1 - 1:
9:10

Invited To Expanding Application Horizons of User
Friendly Digital AV Contents on KANSEI Engineering
M. Kasuga, M. Sato
Utsunomiya Univ., Japan

VHF1 - 2
9:40

A Study on a Presentation Method for Interactive Poster
I. Kishida, T. Sugihara*, Y. Hirano, K. Mase
Nagoya Univ., Japan*Ricoh, Japan

VHF1 - 3
10:00

Simulator Sickness Symptoms Caused by a Visual Search
Task in a Monocular Virtual Display
J. Häkkinen, J. Takatalo*, J. Havukumpu*, J. Komulainen*,
H. Särkelä**, G. Nyman*
Nokia Res. Ctr., Finland*Univ. of Helsinki, Finland----- Break -----

10:40 - 11:50

Room 201

VHF2: Human Factor (2)Chair:
Co-Chair:M. Kasuga, Utsunomiya Univ., Japan
S. Clippingdale, NHK, Japan

VHF2 - 1:
10:40

Invited Human Perception of LED Sources Pulsed above
the Critical Fusion Frequency
R. Sharpe, C. M. Cartwright, W. A. Gillespie, E. Billen,
C. Wall*, J. A. F. Taylor*
Univ. of Abertay Dundee, UK*Nat. Physical Lab., UK

VHF2 - 2
11:10

Does Eye Tracking Provide a Window to the Soul of
Mobile Phone Users?
M. Pölönen, J. Häkkinen, J. Laarni*
Nokia Res. Ctr., Finland*Helsinki School of Economics, Finland

VHF2 - 3
11:30

Walking-Caused Vibration and Small Display Legibility
M. Olkkonen, T. Mustonen
Nokia Res. Ctr., Finland----- Lunch -----

70

Thursday

December 9

13:50 - 14:50

Room 201

VHF3: Human Factor (3)Chair:
Co-Chair:R. Sharp, Univ. of Abertay, UK
S. Clippingdale, NHK, Japan

VHF3 - 1
13:50

Human Factors Guidelines for Paper-Like Displays
S.-C. Jeng, Y.-R. Lin, C.-C. Liao, C.-H. Wen, C.-S. Wei*,
P. Shaw*, H. W. Zan*
ITRI, Taiwan*Nat. Chiao Tung Univ., Taiwan

VHF3 - 2
14:10

Ergonomic Evaluation of a Projector Using FieldSequential Color Projection System
E. Umezawa, T. Shibata, T. Kawai, K. Ukai
Waseda Univ., Japan

VHF3 - 3
14:30

Scanning Aspects of Emissive Passive-Matrix Displays
A. Sempel, P. J. Snijder, K. BrunnerPhilips Res. Labs., The Netherlands----- Break -----

15:10 - 17:00

Room 201

VHF4/3D4: 3D Vision
Chair:
Co-Chair:

H. Isono, Nippon Inst. of Tech., JapanS. Yano, NHK, Japan

VHF4/3D4 - 1: Invited 3D Structure and Volume Perception from Motion
15:10
M. Idesawa, M. Uchida, T. H. Moe*
Univ. of Electro-Commun., Japan*Myanmar Radio & Television, Myanmar
VHF4/3D4 - 2
15:40

Mathematical Simulation of the Mime Effect
R. Mtibaa, M. Idesawa, Y. Sakaguchi
Univ. of Electro-Commun., Japan

VHF4/3D4 - 3
16:00

Evaluation of Discontinuity in 3D Images Generated by
High-Density Directional Images
M. Watanabe, H. Nate*, Y. Takaki
Tokyo Univ. of A&T, Japan*Tokyo Polytech. Univ., Japan

VHF4/3D4 - 4
16:20

A New Method of Stereo Matching for Curved Surface
Z. Xu, M. Idesawa
Univ. of Electro-Commun., Japan71

Thu./Fri.
VHF4/3D4 - 5
16:40

December 9/10
Development and Evaluation of Stereoscopic 3D Display
with Dynamic Optical Correction
T. Shibata, T. Kawai, M. Otsuki*, N. Miyake*, Y. Yoshihara**,T. Iwasaki***, N. Terashima
Waseda Univ., Japan*Nikon, Japan**Arisawa Manufacturing, Japan***Univ. of Occupational & Environmental Health, Japan

Author Interviews
17:00 – 18:00

Friday, December 10
9:00 - 10:10

Room 301

VHF5/LCT6: Pixel Arrangement and Image Quality
Chair:
Co-Chair:Y. Shimodaira, Shizuoka Univ., Japan
M. Ozaki, Osaka Univ., Japan

VHF5/LCT6 - 1: Invited PenTile LCDs
9:00
C. Elliott
Clairvoyante, USA
VHF5/LCT6 - 2 Color Image Improvement in Display with A Novel String
9:30
Pixel Architecture
C.-S. Chang, C.-J. Chen, J.-P. Pang
InnoLux Display, Taiwan
VHF5/LCT6 - 3 Optical and Electrical Characterization of Flickering of
9:50
Color STN-LCD
R. Chen, X. Zhang
Philips Mobile Display Sys., China----- Break -----

10:30 - 12:00

Room 301

VHF6/LCT7: Moving Image Quality
Chair:
Co-Chair:

C. Elliott, Clairvoyante, USA
Y. Shimodaira, Shizuoka Univ., Japan

VHF6/LCT7 - 1: Invited A Review of MPRT Measurement Method for
10:30
Evaluating Motion Blur of LCDs
J. Someya, Y. Igarashi*
Mitsubishi Elec., Japan*Hitachi Displays, Japan
VHF6/LCT7 - 2 Dynamic Gamma: A Metric for the Temporal Response
11:00
Contribution to Motion Blur
H. Pan, X. Feng, S. Daly
Sharp Labs. of America, USA72

Friday

December 10

VHF6/LCT7 - 3
11:20

Parameters of Motion Picture Blurring Measured by Usinga Pursuit Camera
K. Oka, K. Kitagishi, Y. Enami
Otsuka Elect., Japan

VHF6/LCT7 - 4 Motion Picture Quality of Colored Image Measured by
11:40
Using a Pursuit Camera System
Y. Enami, K. Kitagishi, K. Oka
Otsuka Elect., Japan----- Lunch -----

14:00 - 15:00

Room 301

VHF7: Image Quality and Tone Reproduction
Chair:
Co-Chair:J. Someya, Mitsubishi Elec., JapanT. Kurita, NHK, Japan

VHF7 - 1
14:00

Development of 45-Inch High Quality LC-TV
Y. Yoshida, H. Furukawa, M. Ueno, E. Ikuta, S. Daly, X. Feng,
I. Sezan, Y. Kikuchi, T. Fujine, M. Sugino
Sharp, Japan

VHF7 - 2
14:20

An Image Enhancement Algorithm of Flat Panel Display
H. H. Cho, M. R. Choi
Hanyang Univ., Korea

VHF7 - 3
14:40

A New Gamma Determination Method in FPD
Measurement
T. J. Jun, G. C. Park, J. S. Lee, S. Y. Lee
Samsung Elect., Korea----- Break -----

15:20 - 17:00

Room 301

VHF8: Color Reproduction
Chair:
Co-Chair:T. Kurita, NHK, Japan
J. Someya, Mitsubishi Elec., Japan

VHF8 - 1
15:20

Wide Color Gamut and High Brightness WUXGA LCD
Monitor with Color Calibrator
H. Kaneko, S. Kagawa, M. Ozawa, H. Sugiura, H. Tanizoe*,
H. Ueno*, T. Kimura*, H. Katou*
Mitsubishi Elec., Japan*NEC-Mitsubishi Elec. Visual Syss., Japan

VHF8 - 2
15:40

Displaying sYCC Still Images on a Wide Color Gamut
Television
T. Matsumoto, Y. Akiyama, T. Nakatsue, S. Haga, T. Arai,
H. Shibata, Y. Kuze, M. Hatanaka, K. Kakinuma
Sony, Japan73

Friday
VHF8 - 3
16:00

December 10
Reproduction of sRGB Image on PDP
Y. Kwak, D. Park, W. Choe, C. Y. Kim
Samsung Advanced Inst. of Tech., Korea

VHF8 - 4
16:20

Color Conversion Method for Multi Primary Displays inorder to Reduce the Power Consumption and Conversion
Time
M. Takaya, K. Ito, G. Ohashi, Y. Shimodaira
Shizuoka Univ., Japan

VHF8 - 5
16:40

The 3-Factors Color Mapping Method
M. D. Yung, I. L. Ho, K. H. Peng, P. C. Chen, T. T. Lin
Chi Mei Optoelect.ronics, Taiwan

Author Interviews
17:00 – 18:00

SID ’05
Society for Information Display
Symposium, Seminar & Exhibition
May 22–27, 2005
Boston, MA, USA
http://www.sid.org

BANQUET
Wednesday, December 8
19:30 – 21:30
at Continental Room
Hotel Okura Niigata
Free Shuttle Bus;
From Toki Messe to Banquet Site
at 18:20, 18:45 and 19:10
From Banquet Site to Toki Messe
at 21:50
See page 6 for details
74Thu./Fri.

December 9/10

Workshop on
Projection and Large-Area Displays,
and Their Components
Thursday, December 9
14:00 - 17:00

Exhibition Hall B

Poster LADp: Optics & Components
LADp - 1

Fabrication of Continuous-Relief Planar Blazed Grating
Using Laser LIGA for LC Rear-Projection Display Systems
P. H. Yao, C. F. Chen*, R. T. Zheng
ITRI, Taiwan*Nat. Chung Cheng Univ., Taiwan

LADp - 2

The Application of the YAG Filter in LCOS Optical Engine
C.-A. Yang, M. Liu, S.-M. Wu, C.-N. Mo, S.-T. Yang
Chunghwa Picture Tubes, Taiwan

LADp - 3

Gradient Angle Design of Dichroic Mirrors Used in LCD
Projection Display
W. Lu, Z. Zheng, P. Gu, A. Guan*
Zhejiang Univ., China*Zhejiang Univ. of Sci. & Tech., China

Friday, December 10
09:00 - 10:10

Room 201

LAD1: Digital Cinema & Imaging Technologies
Chair:
Co-Chair:

C. Y. M. Cheng, Moxtek, USA
K. Ohara, TI Japan, Japan

LAD1 - 1:
9:00

Invited Recent Progress on Digital Cinema Systems
T. Fujii, K. Shirakawa, M. Nomura, T. Yamaguchi
NTT, Japan

LAD1 - 2
9:30

Digital Microdisplay Backplane with Bit Serial SIMD
Processing
K. Guttag
Kagutech, USA

LAD1 - 3
9:50

Sensing Technology for Automatic Keystone Correction in
Projectors
M. Kobayashi, H. Matsuda, O. Wada, S. Arazaki,
H. Kamakura
Seiko Epson, Japan----- Break -----

75

Friday

December 10

10:40 - 12:00

Room 201

LAD2: Optics & Components
Chair:
Co-Chair:M. Robinson, ColorLink Inc., USA
T. Hayashi, Sumitomo 3M, Japan

LAD2 - 1
10:40

Full Color QXGA Projection Display with VA-FLC
Resolution-Enhancing Device
K. Fujita, A. Takaura, T. Tokita, H. Sugimoto, T. Murai,
Y. Takiguchi
Ricoh, Japan

LAD2 - 2
11:00

Dual Paraboloid Reflectors and Light Pipe Based
Illumination Systems for Projection Display
K. Li, S. Sillyman, S. Inatsugu
Wavien, USA

LAD2 - 3
11:20

Optical Efficiency Improvements in Wire Grid Polarizing
Beamsplitter in LC Projection Displays
C. Y. M. Cheng, R. Perkins, D. Hansen, P. Steve
Moxtek, USA

LAD2 - 4
11:40

Method of Optical Evaluation for Projection Screen
A. Kagotani, T. Kaizuka, S. Iwata, T. Tomono, S. Takahashi,
T. AbeToppan Printing, Japan----- Lunch -----

14:00 - 14:40

Room 201

LAD3: Microdisplay & System Designs
Chair:
Co-Chair:K. Guttag, Kagutech, USA
Z. Tajima, Hitachi Displays, Japan

LAD3 - 1
14:00

Fringe-Field Induced Disclinations in VAN LCoS Panels
D. Cuypers, H. De Smet*, A. Van Calster*
IMEC, Belgium*Ghent Univ., Belgium

LAD3 - 2
14:20

Optimization of Three-Panel Liquid Crystal on Silicon
Video Projection Systems
M. G. Robinson, J. Chen, G. D. Sharp
ColorLink, USA

Author Interviews
17:00 – 18:00
Supporting Organizations:Technical Group on Information Display, ITE
Tehchnical Committee on Electronic Information Displays, Electronics
Society, IEICE
Opto-Electronic Materials and Devices Study Specialty Section, IEIJ
Liquid Crystal Display Forum, JLCS76

Wednesday

December 8

Topical Session on Electronic Paper
Wednesday, December 8
13:30 - 14:35

Room 201

EP1: Electronic Paper (1)Chair:
Co-Chair:T. Fujisawa, Dainippon Ink & Chem., Japan
Y. Toko, Stanley Elec., Japan

EP1 - 1:
13:30

Invited A New Color Imaging Method for PhotoAddressable Electronic Paper
H. Harada, H. Kobayashi, M. Gomyo, Y. Okano, H. Arisawa
Fuji Xerox, Japan

EP1 - 2
13:55

Black and White Cholesteric Liquid Crystal Display
Y. A. Sha, H. L. Wang, C. C. Liao, C. C. Lu, Y. R. Lin,S. C. Jeng, K. H. Chang, L. P. Hsin, C. Y. Lin, J. M. Ding,
K. H. Liu, Y. C. Hung, A. Y. G. Fuh*, Y. L. Huang*
ITRI, Taiwan*Nat. Cheng Kung Univ., Taiwan

EP1 - 3
14:15

A New Approach for Grey Scales in BiNem LCDs
C. Joubert, J. Angele, C. Body, A. Boissier, J.-D. Laffite,
F. Leblanc, J. Lehoux, R. Vercelletto
Nemoptic, France----- Break -----

15:10 - 16:15

Room 201

EP2: Electronic Paper (2)Chair:
Co-Chair:M. Omodani, Tokai Univ., JapanS. Maeda, Oji Paper, Japan

EP2 - 1:
15:10

Invited 1-in. Active Matrix Addressed Electrowetting
Displays
B. J. Feenstra, R. A. Hayes, I. G. J. Camps, L. M. Hage,
R. van Dijk, T. J. P. Biggelaar, J. M. E. Baken
Philips Res. Labs., The Netherlands

EP2 - 2
15:35

Movement of Triboelectrically Charged Particles forElectronic Paper
T. Kitamura, N. Mizuno, S. Nakamura
Chiba Univ., Japan

EP2 - 3
15:55

Computer Simulation of Electrophoretic Display
H. Kodama, K. Takeshita, T. Araki*, H. Tanaka*
Mitsubishi Chem. Group Sci. & Tech. Res. Ctr., Japan*Univ. of Tokyo, Japan----- Break -----

77

Wed./Thu.

December 8/9

16:50 - 17:55

Room 201

EP3/AMD1: Electronic Paper (3)Chair:
Co-Chair:H. Kawai, Seiko Epson, Japan
M. Kimura, Ryukoku Univ., Japan

EP3/AMD1 - 1: Invited Driving an Active Matrix Electrophoretic Display
16:50
G. F. Zhou, M. T. Johnson, R. Cortie, R. Zehner*,
K. Amundson*, A. V. Henzen**, J. van de Kamer**Philips Res., The Netherlands*E Ink, USA**Philips Emerging Display Tech., The Netherlands
EP3/AMD1 - 2
17:15

A Fully Integrated Low-Power High-Voltage Bistable
Display Driver for Smartcard Applications
W. Hendrix, J. Doutreloigne, A. Van Calster
Ghent Univ., Belgium

EP3/AMD1 - 3
17:35

An Intelligent Driving Scheme for High-Voltage Display
Drivers
A. Monte, J. Doutreloigne, A. Van Calster
Ghent Univ., Belgium

Author Interviews
18:10 – 19:00

Thursday, December 9
14:00 - 17:00

Exhibition Hall B

Poster EPp: Electronic Paper Posters
EPp - 1

Improvement of Response Properties for Mobile Fine
Particle Display Cells by Adding Charge Transfer Complex
DopantT. Takahashi, Y. Toko*, K. Kobayashi**, M. Kamio, S. Saito,
M. Kimura**, T. Akahane**
Kogakuin Univ., Japan*Stanley Elec., Japan**Nagaoka Univ. of Tech., Japan

EPp - 2

Microencapsulated Liquid Crystal Display for Paper-Like
Display
S. H. Liu, Y. C. Lin, W. S. Tzeng, K. L. Cheng, L. P. Hsin,
Y. A. Sha, C. M. Ding, C. C. Liao, I. J. Lin
ITRI, Taiwan

EPp - 3

Transient Current Properties in Electronic Paper
T. Bert, F. Beunis*, H. De Smet, K. Neyts*
Ghent Univ. & IMEC, Belgium*Ghent Univ., Belgium

78

Thursday
EPp - 4

December 9Electrochromic Properties of Dimethyl Terephthalate andIts Derivatives for Paper-Like Color Display
H. Urano, S. Sunohara, H. Ohtomo*, N. Kobayashi*
Japan Chem. Innovation Inst., Japan*Chiba Univ., Japan

Supporting Organization:
The Imaging Society of Japan

Late-News Papers
due October 4, 2004
Submit a two-page
camera-ready manuscript ofA4-sized pages, reflecting
important new findings or developments
via on-line submission:
http://idw.ee.uec.ac.jp/authinfo.html

EVENING GET-TOGETHERWITH WINE
Tuesday, December 7
18:00 – 20:00
at Hoou Room (30F),
Hotel Nikko Niigata(Sponsored by Merck Ltd., Japan)
See page 6 for details
79

IDW ’04 COMMITTEESORGANIZING COMMITTEE
General Chair:
General Vice-Chair:
Standing (ITE):
Standing (SID):
Standing (SID Japan Chapter):Committee (ITE):
Committee (Executive Chair):Committee (Program Chair):T. Uchida
S. Naemura
M. Ohsawa
P. M. Heyman
Y. Shimodaira
M. OhsawaT. Sugiura
Y. Shimodaira

Tohoku Univ.
Merck
Hitachi
Display Consultant, USA
Shizuoka Univ.
HitachiToppan Printing
Shizuoka Univ.

OVERSEAS ADVISORS
P. J. Bos
Kent State Univ., USA
J. Burroughes
CDT, UK
M.-K. Han
Seoul Nat. Univ., Korea
P. M. Heyman
Display Consultant, USA
W. E. Howard
Howard Consulting, USA
J. Jang
Kyung Hee Univ., Korea
H. S. Kwok
Hong Kong Univ. of Sci. & Tech., Hong Kong
A. C. Lowe
Lambent Consultancy, UK
E. Lueder
Univ. of Stuttgart / Electro-Optical Consultancy, USA
F.-C. Luo
AU Optronics, Taiwan
A. Mosley
CRL Opto, UK
M. H. Oh
Dankook Univ., Korea
J.-N. Perbet
Thales Avionics, France
H.-P. D. ShiehNat. Chiao Tung Univ., Taiwan
D. Theis
Siemens, Germany
H. Tolner
Consultant, The Netherlands / Southeast Univ., China
B. Wang
Southeast Univ., China
FINANCIAL SUPPORTING COMMITTEE
Chair:
T. Uchida
Vice-Chair:
H. Uchiike
EXECUTIVE COMMITTEE
Executive Chair:T. Sugiura
Program Chair:Y. Shimodaira
Program Vice-Chair:
Y. Iimura
K. Betsui
Program Secretary:
M. Suzuki
M. DateTreasurer:
S. Naemura
General Secretary:
Y. Tsuchiya
Publication Chair:
M. Uchidoi
Publication:
M. Ozeki
S. Kikukawa
Local Arrangement Chair: T. Akahane
Local Arrangement Vice-Chair: K. Kato
Local Arrangement:
M. Kimura
S. Ohta
H. OnoH. Saito
K. Shinbo
Exhibition Chair:
A. Mikami
Exhibition Vice-Chair:
Y. Yanagi
Web Chair:T. Shiga
Web Secretary:
T. Taguchi
Senior Executive Member: H. Uchiike
Member:T. Sonehara
T. Kojima

80

Tohoku Univ.
Saga Univ.
Toppan Printing
Shizuoka Univ.
Tokyo Univ. of A&T
Fujitsu Labs.
Merck
NTT
Merck
NHK
Pioneer
Asahi Glass
ChissoNagaoka Univ. of Tech.
Niigata Univ.
Nagaoka Univ. of Tech.
Nippon Seiki
Nagaoka Univ. of Tech.
Nagaoka Univ. of Tech.
Niigata Univ.
Kanazawa Inst. of Tech.
Tokki
Univ. of Electro-Commun.
Toppan Printing
Saga Univ.
Seiko Epson

Committee:
LCT WS
AMD WS
FMC WS
CRT WSPDP WSPH WS
FED WS
OLED WS
3D WS
VHF WS
LAD WS
EP TS
Members

H. Fujikake
S. Horita
K. Niwa
S. Shirai
Y. Murakami
M. Shiiki
M. Nakamoto
R. Hattori
S. YanoT. Tamura
Z. Tajima
S. Maeda
M. Anma
H. AraiY. Chikazawa
K. Dantani
Y. Hamakawa
M. Hasegawa
Y. Hirai
H. HoriS. Hoshino
S. Hotta
N. Ibaraki
H. Inoue
M. Inoue
Y. Ishii
S. Itoh
S. Kakita
S. Kaneko
M. KanoT. Kawada
H. Kawakami
K. Kobayashi
S. Kobayashi
Y. Komiya
T. Kusumoto
M. Maeda
K. Matsuhiro
S. Matsushima
M. Matsuura
S. Mikoshiba
H. Mori
H. Murakami
Y. Nagae
T. Nagatsuka
K. Nakazawa
Y. Nishimura
K. Niwa
T. Nonaka
K. Nunomura
Y. Oana
M. Ohsawa
H. OhseS. Okabayashi
S. Okuda
J. Onodera
H. SaitoT. Saito
A. Sasaki
F. SatoH. SekiK. Shibata
K. Shimoda

NHK
JAIST
JSR
Hitachi Displays
NHK
HitachiShizuoka Univ.
Kyushu Univ.
NHK
Tokyo Polytechnic Univ.
Hitachi Displays
Oji Paper
Corning Japan
K.C.C. ShokaiThomson Japan
Dai Nippon Printing
Ritsumeikan Univ.
IBM Res.
Optrex
Konica Minolta Sensing
Matsushita Elec. Ind.
Toshiba Matsushita
Display Tech.
Hitachi High-Tech.
Toyo
Sharp
FutabaKasei Optonix
NEC
Alps Elec.
Nanao
Hitachi Displays
Advanced Display
Tokyo Univ. of Sci.,
Yamaguchi
Olympus Optical
Idemitsu Kosan
Maeda Consulting
Arisawa Manufacturing
Seiko Epson
Sharp
Univ. of Electro-Commun.
Fuji Photo Film
Dai Nippon Printing
Hitachi Displays
Nitto Denko
NTT
AKT
JSR
Clariant JapanNEC Plasma Display
IDTechHitachi
Noritake
Meijyo Univ.
Mitsubishi Elec.
Tokyo Ohka Kogyo
ChissoTokyo Cathode Lab.
Osaka Electro-Commun. Univ.
NHK
Hachinohe Inst. of Tech.
Sanyo Elec.
Pioneer81

T. Shinoda
S. Shiwa
M. Sumitomo
T. Sunata
K. Suzuki
M. Takagi
K. Takeuchi
Y. Takeuchi
Y. Takiguchi
C. Tani
Y. Toko
M. Tsumura
S. UemuraY. Ukai
S. Yamamoto
H. Yokoyama
M. Yokozawa
M. YukiWorkshop/Topical Session Chair:
LCT WS
S. Sato
AMD WS
T. Asano
FMC WS
T. Miyashita
CRT WS
S. Shirai
PDP WS
H. Uchiike
PH WS
H. Kobayashi
H. Yamamoto
FED WS
M. Takai
OLED WS
J. Kido
3D WS
I. Yuyama
VHF WS
H. Isono
LAD WS
Z. Tajima
EP TS
M. Omodani
PROGRAM COMMITTEE
PProgram Chair:Y. Shimodaira
Program Vice-Chair:
Y. Iimura
K. Betsui
Program Secretary:
M. Suzuki
M. DateCommittee:
LCT WS
H. Okada
AMD WS
M. Ikeda
FMC WS
K. Dantani
CRT WS
Y. UedaPDP WSPH WS
FED WS
OLED WS
3D WS
VHF WS
LAD WSEP TS

H. OhseT. Minami
N. Egami
Y. SatoY. Komiya
T. Kurita
H. Kikuchi
H. Arisawa

Fujitsu Labs.
Tokyo Denki Univ.
NichiaPhilips Mobile Display Syss.
Kobe
Toshiba
Harison Toshiba Lighting
Dainippon Ink & Chem.
ICMR
Ricoh
Astro Design
Stanley Elec.
Furure Vision
Noritake ItronSony
Seiko Instrs.
Nat. Inst. of Advanced Ind.
Sci. & Tech.
Tokyo Univ. of Info. Sci.
Asahi Glass
Akita Univ.
Kyushu Inst. of Tech.
Tohoku Univ.
Hitachi Displays
Saga Univ.
Tokushima Bunri Univ.
Tokyo Univ. of Tech.
Osaka Univ.
Yamagata Univ.
Utsunomiya Univ.
Nippon Inst. of Tech.
Hitachi Displays
Tokai Univ.
Shizuoka Univ.
Tokyo Univ. of A&T
Fujitsu Labs.
Merck
NTT
Toyama Univ.
ToshibaDai Nippon Printing
Matsushita Toshiba Picture
Display
NoritakeKanazawa Inst. of Tech.
NHK
Mitsubishi Chem. Res. Ctr.
Olympus OpticalNHK
NHK
Fuji Xerox

Workshop on LC Science and Technologies
Workshop Chair:S. SatoAkita Univ.
Program Chair:
H. Okada
Toyama Univ.
General Secretary:
H. Fujikake
NHK
Program Vice-Chair:
M. Suzuki
Merck
Program Vice-Chair:
S. Komura
Hitachi
Program Committee:
M. Hasegawa
IBM Res.
Y. Shimizu
AIST Kansai
M. Ozaki
Osaka Univ.

82

H. Seki
A. Yoshizawa
A. Mochizuki
O. Okumura
M. Kimura
K. Miyachi
E. Tajima
K. Ishikawa
Workshop on Active Matrix Displays
Workshop Chair:
T. Asano
Program Chair:
M. Ikeda
Program Vice-Chair:
S. Utsunomiya
Executive Committee:
S. Horita
Program Committee:
N. Matsuo
T. Sunata
Y. Yamamoto
M. Tsumura
K. Azuma
H. HamadaK. Takatori
Y. Mishima
M. KimuraHachinohe Inst. of Tech.
Hirosaki Univ.
Nano Loa
Seiko Epson
JSR
Sharp
Citizen Watch
Tokyo Inst. of Tech.
Kyushu Inst. of Tech.
Toshiba
Seiko Epson
JAIST
Hyogo Inst. of Tech.
Philips Mobile Display Syss.
Kobe
Sharp
Future Vision
ALTEDEC
Sanyo Elec.
NEC
Fujitsu Labs.
Ryukoku Univ.

Workshop on FPD Manufacturing, Materials and Components
Workshop Chair:
T. Miyashita
Tohoku Univ.
General Secretary:
K. Niwa
JSR
Program Vice-Chair:
Y. IimuraTokyo Univ. of A&T
Program Chair:
K. Dantani
Dai Nippon Printing
Workshop Vice-Chair:
T. Taguchi
Toppan Printing
Program Commiittee:
Y. UkaiSony
H. Saito
ChissoM. Takagi
Harison Toshiba Lighting
Y. Fujimura
Nitto Denko
T. Hayashi
Sumitomo 3M
H. Takeuchi
Stanley Elec.
K. Tanitsu
Tokyo Ohka Kogyo
F. Shimo
Tokyo Electron
Y. Fujimoto
Dainippon Screen MFG
N. Yoshizaki
Canon Sales
T. Matsuura
Nikon
T. Nagahara
Clariant Japan
H. MoriFuji Photo Film
K. SaitoULVAC
T. ItohCorning Japan
Senior Executive Member: T. Sugiura
Toppan Printing
Senior Executive Member: K. Matsushima
ChissoWorkshop on CRTs
Workshop Chair:
Program Chair:S. Shirai
Y. UedaGeneral Secretary:
Exhibition Committee:
Program Committee:

S. Shirai
S. Okuda
T. Higuchi
T. Saito
M. Okada
H. Nakanishi
Ir. T. G. Spanjer
C. H. Yeh
S. LeeS. C. Shin

Hitachi Displays
Matsushita Toshiba Picture
Display
Hitachi Displays
Mitsubishi Elec.
Matsushita Toshiba Picture
Display
Tokyo Cathode Lab.
Sony
LG.Philips Displays,
The Netherlands
Chunghwa Picture Tubes,
TaiwanLG.Philips Displays, Korea
Samsung SDI, Korea

83

Workshop on Plasma Displays
Workshop Chair:
H. Uchiike
Program Chair.
H. OhseGeneral Secretary:
Y. Murakami
Program Committee:
K. AndoK. Igarashi
M. Uchidoi
R. MuraiT. Ogawa
T. Shinoda
Y. Nakao
K. SanoK. Nunomura
T. Hamaguchi
S. Mikoshiba

Saga Univ.
Noritake
NHK
Hitachi
Univ. of Electro-Commun.
Pioneer
Matsushita Elec. Ind.
Fujitsu Hitachi Plasma
Display
Fujitsu Labs.
Asahi Glass
Mitsubishi Elec.
NEC Plasma Display
D. A. P. Tech.
Univ. of Electro-Commun.

Workshop on EL Displays, LEDs and Phosphors
Workshop Co-Chair:
H. Kobayashi
Tokushima Bunri Univ.
Workshop Co-Chair:
H. Yamamoto
Tokyo Univ. of Tech.
General Secretary:
M. Shiiki
Hitachi
Program Chair:
T. Minami
Kanazawa Inst. of Tech.
Program Committee:
S. ItohFutabaK. OhnoSony
K. OhmiTottori Univ.
S. Okamoto
NHK
M. Katayama
Denso
M. Sumitomo
NichiaM. Tamatani
Toshiba Res. Consulting
Y. Nakanishi
Shizuoka Univ.
T. HaseKasei Optonix
N. Miura
Meiji Univ.
A. Mikami
Kanazawa Inst. of Tech.
Y. YanoTDKT. Yagi
Lumileds Lighting Japan
M. Yoshida
Sharp
Workshop on Field Emission Display
Workshop Chair:
M. Takai
Program Chair:
J. Ishikawa
General Secretary:
M. Nakamoto
Program Committee:
M. TakaiK. Yokoo
T. Asano
J. ItohN. Egami
M. Nakamoto
I. Fujimoto
H. C. Cheng
Exhibition Committee:

J. D. Lee
M. NakamotoWorkshop on Organic LED Displays
Workshop Chair:
J. KidoProgram Chair:Y. SatoGeneral Secretary/
Exhibition Committee:
R. Hattori
Program Committee:
H. Onnagawa
C. Adachi
M. Tsuchida
H. Takahashi
T. Kusumoto
S. Miyashita
T. Tsutsui
S. Tokito

84

Osaka Univ.
Kyoto Univ.
Shizuoka Univ.
Osaka Univ.
Tohoku Univ.
Kyushu Inst. of Tech.
AISTNHK
Shizuoka Univ.
Hiroshima Inst. of Tech.
Nat. Chiao-Tung Univ.,
TaiwanSeoul Nat. Univ., Korea
Shizuoka Univ.
Yamagata Univ.
Mitasubishi Chem. Res. Ctr.
Kyushu Univ.
Toyama Univ.
Chitose Inst. of Sci. & Tech.
Pioneer
Sanyo Elec.
Idemitsu Kosan
Seiko Epson
Kyushu Univ.
NHKH. Miyazaki
S. Mataka
T. Inoue

Nippon Steel Chem.
Kyushu Univ.
TDK

Workshop on 3D/Hyper-Realistic Displays and Systems
Workshop Chair:
I. Yuyama
Utsunomiya Univ.
Program Chair:
Y. Komiya
OlympusGeneral Secretary:
S. YanoNHK
Exhibition Committee:
K. Mashitani
Sanyo Elec.
Program Committee:
T. Fujii
Nagoya Univ.
W.-J. Hsueh
Industrial Tech. Res. Inst.,
TaiwanT. Mishima
NHK
N. Nishida
Univ. of Tokushima
S. Ohtsuka
NTT Data
J. -Y. Son
Hannam Univ., Korea
H. Takemura
Osaka Univ.
C. TaniAstro Design
T. Yoshida
Toppan Printing
Workshop on Applied Vision and Human Factors
Workshop Chair:
H. Isono
Nippon Inst. of Tech.
Program Chair:
T. Kurita
NHK
General Secretary/
Exhibition Commiittee:
T. TamuraTokyo Polytechnic Univ.
Program Committee:
Y. Shimodaira
Shizuoka Univ.
J. L. Bergquist
Nokia Japan
S. Clippingdale
NHK
M. Idesawa
Univ. of Electro-Commun.
S. Kubota
Seikei Univ.
T. Mitsuhashi
Shobi Univ.
T. Nakano
Meijo Univ.
T. Wake
Chukyo Univ.
R. Yoshitake
IBM Japan
Workshop on Projection and Large-Area Displays,
and Their Components
Workshop Chair:
Z. Tajima
Hitachi Displays
General Secretary
M. Takaso
Techno Sys. Res.
Program Chair.
H. Kikuchi
NHK
Program Vice-Chair:
T. Hayashi
Sumitomo 3M
Program Committee
K. Takeda
Seiko Epson
K. Terada
Sanyo Elec.
S. Koike
Seiko Epson
Y. Ootsuka
HitachiR. Igarashi
Ushio Elec.
K. Matsumoto
Toppan Printing
H. NakanoBarco
S. Shikama
Mitsubishi Elec.
T. Okada
Matsushita Elec. Ind.
T. Ogura
Matsushita Elec. Ind.
K. Oohara
Texas Instrs. JapanY. Kondo
Matsushita Elec. Works
K. KaiseSony
Topical Session on Electronic Paper
Topical Session Chair:
M. Omodani
General Secretary:
S. Maeda
Program Chair:
H. Arisawa
Program Committee:
Y. Hotta
T. Fujisawa
H. Kawai
Exhibition Committee:
Y. TokoTokai Univ.
Oji PaperFuji Xerox
Ricoh
Dainippon Ink & Chem.
Seiko Epson
Stanley Elec.

85

ACADEMIC SUPPORTING ORGANIZATIONSThe Chemical Society of JapanThe Electrochemical Society of Japan (ECSJ)The Illuminating Engineering Institute of JapanThe Imaging Society of Japan
Information Processing Society of JapanThe Institute of Electrical Engineers of JapanThe Institute of Electronics, Information andCommunication Engineers (IEICE)The Institute of Image Electronics Engineers of Japan
Japan Ergonomics Society
Japanese Liquid Crystal Society (JLCS)The Japan Society of Applied Physics
The Japanese Society of Ophthalmological Optics
The Virtual Reality Society of Japan

Funds for the conference are furnished in part by the following
organizations:• Support Center for Advanced Telecommunications Technology Research,
Foundation• The Murata Science Foundation• Niigata Prefectural Government• Niigata Visitors & Convention Bureau (Niigata City)

86

IDW Tutorial in Japanese
Tuesday, December 7
Room 301
Niigata Convention Center
Detail information will be available in October:
http://www.sidchapters.org/japan/J-menu.htm
Contact address:
idw-tutorial@ml.labs.fujitsu.com

87