Current StatusofLight SourceandBeamlines

7

Light Source in 2006
Masahiro KATOHUVSOR Facility, Institute for Molecular Science
1. Status of UVSOR-II
In the fiscal year 2006, we have operated the UVSOR-II accelerators from April ’06 to March ’07. We had one
9 week shut-down period in July and August ’06 and two 2 week ones in October and March ’07. The long shut
down in summer was to replace the magnet power supply of the booster synchrotron and to install a new beam
duct at a straight section between B6 and B7 for new undulator. Construction of new radiation shield wall was
also done during this period. The short shut down in October was to install a new variably polarized undulator.
The shut down in March is to replace the bending magnet power supply of the beam transport line, preparing for
full energy injection. We also stopped the operation for one week in the holiday week of May and for two weeks
around the New Years day.
Fortunately, we had very few troubles on the accelerators during FY2006. We only had a few minor troubles ona kicker magnet power supply of the storage ring and the RF amplifier of the linear accelerator. All of them did
not affect the operation schedule.

Figure 1

Monthly statistics of the operation time (left) and of the integrated beam current (right).

We had totally 31 weeks for the users operation, 29 weeks in multi-bunch mode and two weeks in single bunchmode. We had five weeks dedicated for machine studies. The monthly statistics of the operation time and theintegrated beam current are shown in Figures 1. The normal operation pattern in a week is as follows. From
Tuesday to Friday, the machine is operated for users. The beam injection is twice a day, at 9:00 and 15:00. The
initial beam current of each run is 350 mA in multi-bunch mode and 100 mA in single bunch mode. On Monday,
the machine is operated for machine studies.

2. Improvements8Commissioning of New Magnet Power Supplies for Booster Synchrotron
The magnet power supplies of the booster synchrotron had been working for more than twenty years. In theseyears, we had a few very serious troubles on then. In July, 2006, these power supplies were finally replaced.
New power supplies have capability of accelerating the electron beam up to the full energy of the storage ring,
750 MeV. In August, we have commissioned the power supplies with the 600 MeV acceleration mode. In March,
the power supply for the bending magnets of the beam transport line has been replaced. New power supply iscompatible with the full energy injection. In April, 2007, the full energy acceleration, transportation andinjection will be started.

Figure 2

New Magnet Power Supplies for Booster Synchrotron

Progress in Orbit Stabilization
The electron orbit of UVSOR-II shows drift motion of a few hundred microns with a time scale of hours. To
suppress the orbit drift, a feedback system is under development. As the first step, a sub-system has been
constructed to correct the orbit displacement in the horizontal plane automatically by controlling the RF
frequency [1]. This system has been successfully commissioned and the orbit drift in the horizontal plane isreduced significantly. The system has been working for about one year and the change of the RF frequency has
been recorded, which is strongly correlated with the temperature of the storage ring room floor [1].
As the second step, a sub-system to monitor the positions of the beam position monitors has been developed
and tested [2]. The synchrotron irradiation cause thermal deformation of the beam ducts, which results indisplacements of the beam position monitors mounted on them. The measurement shows that most of the beam
position monitors show the displacements of a few tens of microns. So at present, this is not a serious problem
but, in future, when we try to stabilize the orbit within ten microns, it should be considered.

New Undulator for BL7U
A new undulator was installed in the straight section between B6 and B7 in October. This undulator will provide
VUV light of linear polarization in both horizontal and vertical planes. It can also provide circular polarized

9

VUV light. The configuration of the magnet array is of APPLE-II type [3]. The main parameters are shown in
Table 1. The undulator is now under commissioning and partly opened for users.
Before installing the new undulator, another undulator of in-vacuum type, which had occupied a part of thestraight section, was moved to another short straight section between B5 and B6. It will provide soft X-rays to
BL6U, which is now under designing.

Figure 3 New APPLE-II undulator for BL7U (upper) and In-vacuum undulator for BL6U (lower)

3. Researches and Developments
Free Electron Laser
In FY2006, one watt lasing in deep UV region (230nm) was successfully demonstrated [4]. The lower
emittance and the higher peak current of the electron beam in UVSOR-II made this possible. Several user
experiments have been started. On example is related to the magnet circular dichroism which is described inthese reports [5].
Coherent harmonic generation (CHG) is a method to produce coherent radiation in shorter wavelength region
where no good mirror is available for the optical cavity. By using the Ti:Sa laser introduced for the bunch slicing
experiment, the CHG was successfully demonstrated in collaboration with French group [6]. Coherent third
harmonics of the injected laser was clearly observed.

Laser Bunch Slicing
By using a TiSa laser of 1 kHz repetition rate and 2.5 mJ pulse energy, we have succeeded in producing
intense coherent terahertz radiation [7]. The short pulse laser interacts only with a part of the electron bunch
inside an undulator. There is produced strong energy modulation at the interacting part. As the electron bunch isproceeding in the storage ring, the modulated part is separated from the bunch and there is created a dip on the10bunch. This fine structure on the longitudinal density distribution is the origin of the intense coherent radiation.

[1] K. Suzumura et al., in this report[2] K. Suzumura et al., in this report[3] S. Sasaki, Nucl. Instr. Meth. A347 (1994) 83[4] M. Hosaka et al., in this report[5] T. Nakagawa, T. Yokoyama, M. Hosaka, M. Katoh, in this report[6] M. Labat et al., in this report[7] M. Shimada et al., in this report

11

0

12

5

15MeV Linac

600/750MeV
Booster
Synchrotron

10m

Beam Transport

BL5B

BL5U

BL6B

FEL Optical Cavity

BL4B

BL4A2

BL4A1

BL7U

BL7B

3rd
Harmonic Cavity

Vari able Polarized
Undu lator

In-v acuum
Undu lator

Main Cavity

Septum

750MeVElectron
Storage Ring

Helical Undu lator

FEL
Optical Cavity

BL3U

BL8B1

BL8B2

BL1A

BL1B

BL2B

UVSOR Accelerator Complex

Parameters of Injection Linear Accelerator

EnergyLengthFrequency
Accelerating RF Field
Klystron Power
Energy Spread
Repetition Rate

15 MeV
2.5 m
2856 MHz2/3 Traveling Wave
1.8 MW~ 1.6 MeV
2.6 HzParameters of Booster Synchrotron

EnergyInjection Energy
Beam Current
Circumference
RF Frequency
Harmonic Number
Bending Radius
Lattice
Betatron Tune
Horizontal
VerticalMomentum Compaction
Repetition Rate

600 / 750 MeV
15 MeV
32 mA (uniform filling)
26.6 m90.1 MHz8
1.8 m
FODO × 8
2.25
1.25
0.138
2.6 / 1 Hz (600 / 750 MeV)

13

Parameters of UVSOR-II Storage Ring
EnergyInjection Energy
Maximum Stored Current

750 MeV
600 / 750 MeV
500 mA (multi bunch)
100 mA (single bunch)
27.4 nm-rad
53.2 m90.1 MHz16
2.2 m
Extended DBA × 4(4 m × 4) + (1.5 m × 4)
100 kV

Natural Emittance
Circumference
RF Frequency
Harmonic Number
Bending Radius
Lattice
Straight Section
RF Voltage
Betatron Tune
Horizontal
VerticalMomentum Compaction
Natural Chromaticity
Horizontal
Vertical
Energy Spread
Natural Bunch Length

3.75
3.20
0.028
-8.1
-7.3
4.2 × 10-4
108 psElectron Beam Optics of UVSOR-II Storage Ring

Horizontal/verticalbetatronfunctionsanddispersion

function(left),

horizontal/vertical electron beam sizes and beam divergences (right) of UVSOR-II

14

and

10

20

UVSOR -II,27 nm-rad
10500 mA, 3 % Coupling

18

U7 (Helical)

2

2

B rilliance (Photon s/ sec/ mrad / mm / 0.1 % b. w.)

Parameters of the insertion devices

10

U7 (Planar)

U3 (In-Vacuum)U5 (Helical)

16

U6(In-Vacuum)U5 (Planar)
10

14

10

12

10

10

BM

1

10

100

1000

Photon Energy (eV)Brilliance of radiation from the insertion devices (U3, U5, U6 and U7)
and a bending magnet of UVSOR-II
BL3U In-vacuum Undulator

BL6U In-vacuum Undulator

Number of Periods

50

Number of Periods

26

Period Length

38 mm

Period Length

36 mmPole Length

1.9 m

Pole Length

0.94 mPole Gap

15~40mmPole Gap

15~40 mmDeflection Parameter2.00~0.24

Deflection Parameter

1.78~0.19

BL5U Helical Undulator / Optical Klystron

BL7U Apple-II variable polarization undulator

Number of Periods

21 / 9+9(Opt. Kly.)

Number of Periods

40

Period Length

110mm

Period Length

76mm

Pole Length

2.35 mPole Length

3.04 mPole Gap

30~150 mm

Pole Gap

24~200 mm

Deflection Parameter4.6~0.07(Helical)

Deflection Parameter

5.4 (max. horizontal)

8.5~0.15(Linear)

3.6 (max. vertical)
3.0 (max. helical)

Bending Magnets
Bending Radius

2.2 m

Critical Energy

425 eV15

Beamlines in 2006
Eiji SHIGEMASAUVSOR Facility, Institute for Molecular Science
Eight bending magnets and three insertion devices are available for utilizing synchrotron radiation at
UVSOR. There is a total of thirteen operational beamlines in 2006, which are classified into two categories.
Eight of them are so-called "Open beamlines", which are open to scientists of universities and research institutes
belonging to the government, public organizations, private enterprises and those of foreign countries. The restof the five beamlines are so-called "In-house beamlines", and are dedicated to the use of research groups within
IMS.

We have one soft X-rays station equipped with a double-crystal monochromator, seven extreme

ultraviolet and soft X-rays stations with a grazing incidence monochromator, three vacuum ultraviolet stations
with a normal incidence monochromator, one infrared (IR) station equipped with Fourier-Transform
interferometers, one station with a multi-layer monochromator, and three non-monochromatized stations forirradiation of white-light, as shown in the appended table for all available beamlines at UVSOR.
The upgrade project of the UVSOR storage ring, in which the creation of four new straight sections and theachievement of much smaller emittance (27 nm-rad) were planned, has been approved in the fiscal year of 2002
and has been accomplished on schedule.

Keeping pace with the upgrade project, the improvements andupgrades of the beamlines at UVSOR have been continuously discussed with users in a series of UVSOR
workshops. From a viewpoint of the radiation safety, the experiments carried out at the experimental stations
on the second floor such as BL3B and BL7B, and the fine tunings of the laser system installed inside the shieldwalls during the machine study, seem to become quite risky due to the introduction in the near future of theso-called top-up operation of the UVSOR storage ring. Accordingly we have decided to put two old beamlines,
BL8A and BL3B, out of service until the middle of March 2006.

In order to transfer the experimental

endstation for BL7B to the space after the removal of BL8A, the optical path downstream the exit slit has beenchanged and a new refocusing mirror system has been installed.

It was found through the alignment work at

BL7B that the first mirror with a torodial shape had been misaligned seriously, which essentially degrades theperformance of the monochromator.

It may take several weeks to accomplish the alignment of this mirror,

since the change of the position of the first mirror leads to the realignment of all the optical elements of thebeamline. We have planned to make the realignment of BL7B in April and May of 2007. The laser system
has been moved to the empty lot of BL3B by the machine group.
Regarding the utilization for the long straight section between B06 and B07, a UVSOR workshop has been
held in March 2005. A high resolution and high flux variable polarization beamline for spectroscopy in the
VUV range has been proposed and possible scientific cases performed on this beamline have been discussed
there. The construction of the new beamline BL7U has been completed during the regular summer shutdown in2006 as had planned.

BL7U is composed of a modified Wadsworth-type monochromator with threeinterchangeable spherical gratings (R=10 m; 1200, 2400, and 3600 lines/mm), and a hemispherical photoelectron
analyzer, where high-resolution angle-resolved photoemission experiments can be performed. A new APPLE-II
type undulator for the light source of BL7U has successfully been installed at the end of October 2006. It has
been confirmed that the total performance of BL7U, after careful tunings of the monochromator and the analyzer,
nearly reaches the theoretically expected level.

Concerning the utilization of the first in-vacuum type undulator,

which has been relocated from the long straight section U7 to the short one between B05 and B06, a new projectfor constructing the undulator beamline BL6U is just beginning execution. A preliminary design study for the16monochromator at BL6U has been terminated, thanks to the collaboration with KEK-PF. The monochromator
will cover the photon energy range from 30 to 500 eV, with the resolving power higher than 10000 and thephoton flux more than 1010 photons/sec. The construction of BL6U is expected to start from the spring of 2008.
Further serious discussion toward utilizing the available straight sections most effectively and formulating abasic plan on the beamline construction, will be continued.
All users are required to refer to the beamline manuals and the UVSOR guidebook (latest revision in 1999),
on the occasion of conducting actual experimental procedures.

Those wishing to use the open and in-housebeamlines are recommended to contact the stationmaster/supervisor and the representative, respectively.
updated information of UVSOR, http://www.uvsor.ims.ac.jp/.

17

For

Station Masters and Supervisors of Open Beamlines in FY2006
Beamline

Station Master

Sub MasterSupervisor

1A

N. Kondo

E. Shigemasa

E. Shigemasa

1B

M. Hasumoto

S. Kimura

S. Kimura

5U

T. ItoS. Kimura

S. Kimura

5B

M. Hasumoto

E. Nakamura

E. Shigemasa

6B

S. Kimura

E. Nakamura

S. Kimura

7B

M. Hasumoto

S. Kimura

S. Kimura

8B1

Y. Hikosaka

E. Nakamura

E. Shigemasa

8B2

R. Sumii

E. Nakamura

S. Kimura

Station Masters and Supervisors of In-House Beamlines in FY2006
Beamline

Representative

Affiliation

2B

K. Mitsuke

Dep. VUV Photoscience

3U

N. Kosugi

Dep. VUV Photoscience

4A1/4A2

T. Urisu

Dep. VUV Photoscience

4B

E. Shigemasa

UVSOR

18

Beamlines at UVSOR-II
Beamline

Energy Region(eV)

Monochromator,
Spectrometer

1A

Double-Crystal

1B

1m Seya-Namioka

2B

18m Spherical Grating
20 eV 200 eV(Dragon)

3U

Varied-Line-Spacing
Plane Grating(Monk-Gillieson)

4A1

600 eV4 keV

1.9 eV 40 eV

Beamline
masterSolid (Absorption)

N. Kondo
nkondo@ims.ac.jp

Solid (Reflection,
Absorption)

M. Hasumoto
hasumoto@ims.ac.jp

Gas (Photoionization, K. Mitsuke
Photodissociation)
mitsuke@ims.ac.jp
Gas (Photoionization, T. Hatsui
Photodissociation)
hatsui@ims.ac.jp
Solid (Photoemission)

600 eV

40 eVExperiments

Multi-Layered-Mirror

Irradiation

T. Urisu
urisu@ims.ac.jp

Irradiation

T. Urisu
urisu@ims.ac.jp

50 eV 95 eV
4A2

None

4B

Varied-Line-Spacing
Plane Grating(Monk-Gillieson)

5U
(FEL)

None
(Optical Klystron)

5U

Spherical Grating(SGM-TRAIN*)

5B

25 eV

800 eVGas (Photoionization, E. Shigemasa
Photodissociation)
sigemasa@ims.ac.jp
Solid (Photoemission)
Free Electron Laser

5 eVSolid (Photoemission) T. Ito
tito@ims.ac.jp

250 eV

Plane Grating
600 eV

5 eV

J. Yamazakiyamazaki@ims.ac.jp

Calibration
Solid (Absorption)

M. Hasumoto
hasumoto@ims.ac.jp
S. Kimurakimura@ims.ac.jp

6B
(IR)

Martin-Puplett FT-FIR
2.5 eV
Michelson FT-IR
0.25 meV

Solid (Reflection,
Absorption)

7U

10m Normal Incidence(Modified Wadsworth) 6 eV 40 eV

Solid (Photoemission) S. Kimura
kimura@ims.ac.jp

7B

3m Normal Incidence

Solid (Reflection,
Absorption)

M. Hasumoto
hasumoto@ims.ac.jp

Solid (Absorption)

Y. Hikosaka
hikosaka@ims.ac.jp

1.2 eV 30 eV
8B1

8B2

15m Constant Deviation
30 eVGrazing Incidence

600 eV

Plane Grating

Solid (Photoemission) R. Sumii
sumii@ims.ac.jp

1.9 eV 150 eV
1
200
E
(eV)
L 10-610-8(m)
1Mm 10nm

400

600

800 1000
1keV
10-9
1nm

19

* Spherical Grating Monochromatorwith Translating and Rotatin
ing Assembly
Including Normal incidence mountBL1A
Soft X-Ray Beamline for Photoabsorption Spectroscopy
BL1A is a soft X-ray beamline for photoabsorption spectroscopy.

The beamline is equipped with a focusing

premirror and a double crystal monochromator [1]. The monochromator serves soft X-rays in the energy region
from 585 to 4000 eV by using several kinds of single crystals such as -Al2O3, beryl, KTP (KTiOPO4), quartz,
InSb, and Ge. The throughput spectra measured by a Si photodiode (AXUV-100, IRD Inc.) are shown in Fig. 1.
Typical energy resolution (E/E) of the monochromator is about 1500 for beryl and InSb.

There are no

experimental setups specific of this beamline, except for a small vacuum chamber equipped with an electron
multiplier (EM) detector. Photoabsorption spectra for powdery samples are usually measured in a total electron
yield mode, with the use of the EM detector.

Photon Flux(photons/sec./100mA)[1] Hiraya at al, Rev. Sci. Instrum. 63 (1992) 1264.

4

Beta-alumina
Beryl
KTP
InSb
Ge

2
9

10 8
6
4
2
8
10 8
6
4

1000

2000

3000

4000

5000

Photon Energy(eV)Fig. 1 Throughput spectra of the double crystal

Fig. 2 A side view of BL1A.

monochromator at BL1A.

Beamline Specifications
Monochromator

Double crystal monochromator

Monochromator crystals:

-Al2O3 (22.53 Å, 585-1609 eV), beryl (15.965 Å, 826-2271 eV),

(2d value, energy range)

KTP (10.95 Å, 1205-3310 eV), quartz (8.512 Å, 1550-4000 eV),InSb (7.481 Å, 1764-4000 eV), Ge (6.532 Å, 2094-4000 eV)Resolution

E/E = 1500 for beryl and InSb

Experiments

Photoabsorption spectroscopy

20

BL1B
Seya-Namioka Monochromator for General Purposes
BL1B has been constructed to perform various spectroscopic investigations such as absorption, reflectivity,and luminescence in condensed matters. This beamline consists of a pre-focusing mirror, a 1-m Seya-Namioka
type monochromator, and post-focusing mirrors with different focal lengths. Three gratings of 600, 1200, and2400 l/mm can cover the wavelength region ranging from 40 to 650 nm (h = 2 – 30 eV). The post mirror with alonger focal length is usually used with an LiF window to separate the vacuum condition of the monochromatorfrom a main experimental station, which make experiments for liquids and bio-specimens possible, while theother is mainly utilized for solid-state spectroscopy. The output flux from this monochromator is about 1010
photons/sec. around 200 nm with 0.1 mm slit openings. The spectral distributions for two gratings measured by aconventional photomultiplyer are shown in Fig. 1. A second monochromator (Spex 270M) and a LN-cooled
CCD detector (Princeton Inc.) are available for luminescence measurements, together with a liquid helium-flow
type cryostat. To perform time-resolved experiments, a TAC system is also available.

Fig. 1 Photocurrent at the sample position at BL1B.

Fig. 2 Photo of BL1B.

Beamline Specifications
Monochromator

1-m Seya-Namioka type

Wavelength Range

40 to 600 nm (2-30 eV)Resolution

E/∆E~1000 at 100 nm (10 eV)

Experiment

Absorption, reflection, luminescence spectroscopy for solids

21

BL2B
Beamline for Gas Phase Photoionization and Reaction Dynamics
This beamline has been developed for the purpose of studying ionization, excitation and decay dynamics
involving inner-valence electrons, 2p electrons of the third row atoms, and 4d electrons of the lanthanides. The
monochromator is a spherical grating Dragon-type with 18-m focal length. High throughput (1  1010 photonss-1) and high resolution (E/E = 2000 - 8000) are achieved simultaneously under the condition of the ring currentof 100 mA [1]. The optical system consists of two prefocusing mirrors, an entrance slit, three spherical gratings(G1 - G3), two folding mirrors, a movable exit slit and a refocusing mirror [2]. The monochromator is designed
to cover the energy range of 23 - 205 eV with the three gratings: G1 (2400 lines mm-1, R = 18 m) at 80 - 205 eV;
G2 (1200 lines mm-1, R = 18 m) at 40 - 100 eV; G3 (2400 lines mm-1, R = 9.25 m) at 23 - 50 eV. The percentageof the second-order light contamination at h = 45.6 eV is 23 % for G2 or 7 % for G3.
We have been taking the yield curves of various fullerene ions [3]. Geometrical structures and electronic
properties of fullerenes have attracted widespread attention because of their novel structures, novel reactivity,and novel catalytic behaviors as typical nanometer-size materials. However, spectroscopic information was very
limited in the extreme UV region, owing to difficulties in acquiring enough amount of sample. This situation has
been rapidly changed since the start of this century, because the techniques of syntheses, isolation, andpurification have been advanced so rapidly that appreciable amount of fullerenes can be readily obtained.

Fig .1 18-m spherical grating
monochromator at BL2B.

Fig. 2 End station of BL2B for gas phase
spectroscopy of refractory materials.

[1] M. Ono, H. Yoshida, H. Hattori and K. Mitsuke, Nucl. Instrum. Meth. Phys. Res. A 467-468, 577 (2001).
[2] H. Yoshida and K. Mitsuke, J. Synchrotron Radiation 5 (1998) 774.
[3] J. Kou, T. Mori, Y. Kubozono and K. Mitsuke, Phys. Chem. Chem. Phys. 7 (2005) 119.
Beamline Specifications
Monochromator

18-m spherical grating Dragon-type

Wavelength Range

6 – 55 nm

Resolution

2000-8000

Experiment

Mass spectrom.; Photoelectron spectrosc.

22

BL3U
Varied-line-spacing Plane Grating Monochromatorfor Molecular Soft X-ray Spectroscopy
The beamline BL3U is equipped with an in-vaccum undulator composed of 50 periods of 3.8 cm period length.
The emitted photons are monochromatized by the varied-line-spacing plane grating monochromator (VLS-PGM)
designed for various spectroscopic investigations in the soft x-ray range including soft x-ray emission studies.
Three holographically ruled laminar profile plane gratings are designed to cover the photon energy range from
60 eV to 800 eV. The beamline has two endstations, namely XES setup and Multi-purpose setup. The XES setup
is used for soft x-ray emission spectroscopy. The beam is horizontally focused onto the sample position byplane-elliptical mirror, M2X. In the Multi-purpose setup, the beam is focused by the toroidal mirror M2.
Between the sample position and M2, the differential pumping is placed.

Top View

S0

XES Setup
S1X
M1: Spherical G: VLSP
R=88.826 m

in-vacuum
M0: Cylindricalplane undulator R=47.253 m

sample176

M2X: Plane-Elliptical
r1=11.7 m
r2=0.5 m
M2: Toroidal
R=81.65 m= 37.23 mm

Multi-purpose setup S1

sample

176
700
0

5300

3100
6000

400
9100

Side View

2203

500

9500

11703

G

M2X

800
12203

1600
13003

14603

S1X
sample

176
177

173

M1

S1

M0

M2

sampleFig. 1. Schematic layout (left) and the photography (right) of the BL3U. The distances along the beam from thecenter of the in-vacuum plane undulator are shown in mm. S1X and M2X can be replaced with the other exit slit
S1 so that experiments can be carried out at either the XES or multi-purpose endstation. In the XES setup, thesample is placed at 5-10 mm downstream of S1X.

Beamline Specifications
Monochromator

Varied-line-spacing plane grating monochromator

Energy Range

60-800 eVResolution

E/E > 10 000

Experiment

Soft X-ray spectroscopy (XPS, XES, XAS)

Beam Size

Gaussian shape(XES Endstation)

Vertical 5-20 m; Horizontal 41 m (FWHM)

23

BL4A1
Irradiation Desorption on XeF2 Gas Etching
BL4A1 has been constructed to perform the synchrotron radiation induced etching of Si and SiO2 using XeF2
as an etching gas. This beam-line is composed of a multilayered mirror (MLM) monochromator, a beam
condenser system, and a differential pump system. The XeF2 pressure during the etching will reach to 0.5 Torr,so a differential pump apparatus is installed in the vacuum system and the etching chamber as shown in Fig. 1.
The etching chamber is evacuated independently and is designed to achieve high pressure (0.5 Torr) keeping
other vacuum system at low pressure (< 10-5 Torr) by an aperture flange and a sequence of pressure stages. The
condenser mirror focuses the divergent radiation onto the sample surface in the etching chamber, and obtains an
extreme higher photon flux can be obtained.

Fig. 1 Section view of differential pump apparatus installed in
the etching chamber (reaction cell) and the entrance of beam.

Fig.2 A side view of the end-station at BL4A1.

Beamline Specifications
Monochromator

Multilayered mirror monochromator

Wavelength Range

13.3 ~ 22.5 nm

Resolution

5 ~ 9 eV (FWHM)

Experiment

Irradiation

Miscellaneous

Not-in-use for SR users

24

BL4A2SR-induced Photo Etching and CVD Beam Line
This beam line is used for synchrotron radiation (SR)-induced photo-etching and chemical vapor
deposition (CVD) experiments. The beam line has no monochromator for high photon flux to irradiate andconsists of only two mirrors. One is for focusing and the other is for branching. At the beam line, the gas supply
and extinction system is equipped for using legally controlled high pressure gasses such as SiH4, Si2H6 and GeH4.
They are commonly used to CVD of semiconductor crystals.
The SR-CVD and photo-etching chambers are connected to the beam line as shown in Fig. 1. In thosechambers, infrared reflection absorption spectroscopy (IRRAS) system is installed to study the surface
photochemistry on Si surfaces modified with various kinds of molecules.

Figure 1

Top view of BL4A2

Specifications
Spectral range: whole range of synchrotron radiation from UVSOR

25

BL4B
Varied-line-spacing Plane Grating Monochromator for Molecular Soft
X-ray Spectroscopy
The beamline BL4B equipped with a varied-line-spacing plane grating monochromator (VLS-PGM) wasconstructed for various spectroscopic investigations in a gas phase and/or on solids in the soft X-ray range.
Three holographically ruled laminar profile plane gratings with SiO2 substrates are designed to cover the photon
energy range from 25 eV to 800 eV.

The gratings with the groove densities of 100, 267, and 800 l/mm cover

the spectral ranges of 25-100, 60-300, and 200-1000 eV, respectively, and are interchangeable without breaking
the vacuum.

Fig. 1 shows the absolute photon flux for each grating measured by a Si photodiode (IRD Inc.),with the entrance- and exit-slit openings set at 50 and 50 m, respectively.

The maximum resolving power(E/E) achieved for each grating is more than 5000.

1E12

Intensity (photons/s )

G3
1E11

Slit: 50m-50 m

G2

1E10

G1
1E9

1E8
0

200

400

600

800

1000

1200

Photon Energy (eV)Fig. 1 Throughput from the VLS-PGM monochromator

Fig. 2 Photo of BL4B.

on BL4B.

Beamline Specifications
Monochromator

Varied-line-spacing Plane Grating Monochromator

Energy range

25-1000 eVResolution

E/E  5000 (at maximum)

Experiments

Soft X-ray spectroscopy (mainly, angle-resolved photoion spectroscopy forgaseous targets and photoelectron spectroscopy for gaseous and solid targets)

26

BL5U
Photoemission Spectroscopy of Solids and Surfaces
This beamline is designed for a high-resolution angle-resolved photoemission study on solids and surfaces
with horizontal-linearly and circularly (CW, CCW) polarized synchrotron radiation from a helical undulator.
The beamline consists of a Spherical Grating Monochromator with Translational and Rotational Assembly
Including a Normal incidence mount (SGM-TRAIN), and a high-resolution angle-resolved photoemission
spectrometer.
The SGM-TRAIN is an improved version of a constant-length SGM to aim the following points; (1) covering
the wide energy range of 5-250 eV, (2) high energy resolving power, (3) use of linearly and circularly polarized
undulator light, (4) reduction of higher order light, and (5) two driving modes (rotation and translation ofgratings) by computer control.

The second-order light is well suppressed by using laminar profile gratings andcombinations of mirrors and gratings.

Fig. 1. Throughput spectra from the SGM-TRAIN monochromator at BL5U.
Beamline Specifications
Monochromator
Energy Range
Resolution
Experiment
Flux

SGM-TRAIN
5-250 eV

Main Instruments

Hemisphericalphotoelectron
analyzer (MBS-Toyama ‘Peter’A-1), LEED of reverse type
(OMICRON), Liq-He flow cryostat(5 – 400 K)

h/E >2,000 for < 40m slits
ARPES, AIPES, XAS<1011 photons/s for < 40m slits (atthe sample position)

Fig. 2. High-resolution angle-resolved
photoemission apparatus at BL5U

27

BL5B
Calibration Apparatus for Optical Elements and Detectors
BL5B has been constructed to perform calibration measurements for optical elements and detectors. This
beamline is composed of a plane grating monochromator (PGM) and three end stations in tandem. The most
upstream station is used for calibration measurements of optical elements, the middle one for opticalmeasurements for solids and the last for photo-stimulated desorption experiments.

The experimental chamberat the most downstream station is sometimes changed to a chamber for photoemission spectroscopy.
The calibration chamber shown in Fig. 2 is equipped with a goniometer for the characterization of opticalelements, which has six-degree-of-freedom; X-Y translation of a sample, and interchange of samples and filters.
These are driven by pulse motors in vacuum.

Since the polarization of synchrotron radiation is essential forsuch measurements, the rotation axis can be made in either horizontal or vertical direction (s- or p-polarization).

G1M0
G1M1
G1M2
G2M1
G2M2
G2M3
G2M4
G3M3
G3M4
G3M5
G3M6

Photocurrent (A)

10 -9

10

-10

10

-11

1

2

3

4

5

6

7 8 9

10

2

3

4

5

6

7 8 9

100

2

Wavelength (nm)Fig. 1 Throughput spectra for possible combinations ofFig. 2 A side view of the experimental chamber for

gratings and mirrors at BL5B measured by a gold mesh.

calibration measurements.

Beamline Specifications
Monochromator

Plane Grating Monochromator

Energy range

6-600 eV (2-200 nm)

Resolution

E/E  500

Experiments

Calibration of optical elements, absorption of solids, photo-stimulated
desorption from rare gas solids

28

BL6B (IR)Infrared and Terahertz Spectroscopy of Solids
SR has a good performance (high brilliance and high flux) not only in VUV and SX regions but also in IR andterahertz regions. This beamline covers in the IR and terahertz regions. The previous beamline BL6A1 that has
been constructed in 1985 is the pioneer of the infrared SR research. The beamline was upgraded in the spring of2004 and the name was changed to be BL6B (IR). The front-end part including the bending duct #6 was replaced
to a new one with higher acceptance angle using a magic mirror as shown in Fig. 1.
The beamline is equipped with two interferometers, one is Michelson-type (Bruker IFS-66v) and the otherMartin-Puplett-type (JASCO FARIS-1), for the wide spectral region from several to 20,000 cm-1 (h = several
100 eV – 2.5 eV) as shown in Fig. 2. The experimental chamber in which users bring can be equipped at thefree port. In the near future, an IR microscope covering down to terahertz region will be set up.

Magic mirror
B6
BL6U
First focusing
point
Martin-Puplett
FT-FIR

Radiation
shieldMichelson
FT-IR

Fig. 1 The design of optics and front endof BL6B.

Free
port

IR microscope(planned)

Fig. 2 Schematic figure of top view of BL6B.

Interferometer
Wavenumber Range(Energy range)
Resolution in cm-1
Experiments
Miscellaneous

Beamline Specifications
Michelson (Bruker IFS66v), Martin-Puplett (JASCOFARIS-1)
several – 20,000 cm-1, (several 100 eV – 2.5 eV)
0.1cm-1 for IFS66v, 0.25cm-1 for FARIS-1
Reflectivity
andtransmission,
Magneto-optics(Microspectroscopy)
Users can bring their experimental system in this beamline.

29

BL7U
Angle-resolved Photoemission of Solids in the VUV region
The beamline 7U is constructed to provide the photon flux with high energy resolution and high flux mainly
for high-resolution angle-resolved photoemission spectroscopy of solids. An APPLE-II-type variable
polarization undulator is equipped for the light source. The undulator can make high intense VUV light withhorizontal/vertical linear and right/left circular polarization. The undulator light is monochromatized by themodified Wadsworth-type monochromator with three gratings (R = 10 m; 1200, 2400 and 3600 lines/mm
optimized at h = 10, 20, and 33 eV). The energy resolution of light (h/h) is more than 104 with the photon
flux of more than 1011  1012 ph/s on samples in the whole energy region.
The beamline has a photoemission end station which equips a 200-mm-radius hemispherical photoelectron
analyzer (MB Scientific AB, A-l analyzer) and a liquid-helium-cooled cryostat with a 6-axes pulse motor control(A-VC Co. Ltd., i-GONIO). The main purpose is to determine the three-dimensional Fermi surface andelectronic structure of solids at low temperatures and their temperature dependence to reveal the origin of thephysical properties.

Fig.1. Schematic figure of BL7U.

Beamline Specifications
Light source
Monochromator
Photon energy range
Resolution (h/ h)
Photon flux on sample
Beam size on sample
Experiments

APPLE-II type undulator (u = 76mm, N = 36)
10-m Normal Incidence Monochromator(modified Wadsworth-type)6  40 eV ( = 30  200 nm)
1104 5104
1012  1011 ph/s (depend on h)200(H)50(V) m2
Angle-resolved photoemission of solids(MB Scientific A-1 analyzer)

30

BL8B1
Spherical Grating Monochromatorfor Soft X-Ray Spectroscopic
Studies on Solids and Surfaces
The beamline BL8B1 equipped with a constant-deviation constant-length spherical grating monochromator[1] provides soft X-ray photons in the energy range 30-800 eV with medium energy resolution.

The photon

energy range is covered by using three gratings (R=15 m; 1080 l/mm, R=15 m; 540l/m, and R=7.5m; 360 l/mm)
which are interchangeable in vacuum.
exit-slit openings of 10 m.

Figure 1 shows a throughput spectrum measured with the entrance- andUnder this condition, the achievable resolving power is about 4000 at 400 eV and3000 at 245 eV, respectively.
An experimental chamber is equipped for conventional measurements of electron yield spectra, or
pseudo-photoabsorption spectra, under a ~1×10-6 Torr vacuum condition.
[1] Hiraya et al., Rev. Sci. Instrum. 66 (1995) 2104.

Flux (Photons/sec./100mA)

1010

109

G2: 540 l/mm
10

8

107

G1: 1080 l/mm
1060Fig. 1 Photo of BL8B1.

Slits: 10 Mm

G3: 360 l/mm

200

400
600
800
Photon Energy (eV)1000

Fig. 2 Throughput of the monochromator at BL8B1.

Beamline Specifications
Monochromator

Constant-deviation constant-length spherical grating type

Energy range

30-800 eVResolution

E/E = 4000 at 400 eV and 3000 at 245 eVExperiments

Photoabsorption

spectroscopy,

electron

spectroscopy

coincidence spectroscopy for solids and surfaces

31

and

electron-ion

BL8B2
Angle-Resolved Ultraviolet Photoelectron Spectrometer for Solids
BL8B2 is a beamline for angle-resolved ultraviolet photoemission spectroscopy (ARUPS) system which isdesigned for measuring various organic solids such as molecular crystals, organic semiconductors, andconducting polymers. This beamline consists of a plane-grating monochromator (PGM), a sample preparationchamber with a fast entry Load-Lock chamber, a measurement chamber with an accurate for temperaturedependence (base pressure 1×10-10Torr), a cleaning chamber (base pressure 1×10-10Torr), and a sample
evaporation chamber (base pressure 3×10-10Torr). The cleaning chamber is equipped with a back-view
LEED/AUGER, an ion gun for Ar+ sputtering, and an infrared heating unit. The PGM consists of premirrors, aplane grating, focusing mirror, and a post-mirror, with an exit slit. It covers the wide range from 2 to 130eV withexchanging two gratings (G1: 1200l/mm, G2: 450l/mm) and five cylindrical mirrors. The toroidal mirror focuses
the divergent radiation onto the sample in the measurement chamber. The spot size of the zeroth-order visible
light at the sample surface is about 1×1mm2. Figure 1 shows the throughput spectra of PGM (slit=100μm). Theenergy resolution at a slit width of 100μm was found to be E/∆E = 1000 in the wavelength range from 2 to130eV. A hemi-spherical electron energy analyzer of 75mm mean radius with an angular resolution less than 2°
can be rotated around vertical and horizontal axes. The sample mounted on a manipulator can be also rotatedaround two axes.

Sample Current / A / R.C(100mA=1)

1E-8

1E-9

1E-10

GM[24]
GM[13]
GM[12]
GM[11]

1E-11

1E-12

0

20

40

60

80

100 120 140

Photon Energy / eV

Fig. 2 A photo of BL8B2.

Fig. 1 Throughput spectra of plane-grating
monochromator at BL8B2 (slit=100μm).
Beamline Specifications

Monochromator

Plane-grating monochromator

Wavelength Range

9- 600nm

Resolution

E/∆E = 1000

Experiment

Angle-resolved ultraviolet photoemission spectroscopy

32