Electrostatic Dose Modulator
The Electrostatic Dose Modulator (EDM) is a fast beam blanking system with a pre-sample electrostatic
deflector, including electronics and software control. With EDM, the beam can switch on or off in lessthan 20 ns. This 100,000x improvement in blanking speed immediately improves the clarity of data taken
at fast exposure times. EDM can also attenuate electron illumination without affecting imaging conditions,giving TEM and STEM users exceptional control over the dose on their samples. Cutting-edge electronics
and software add-ons unlock advanced applications such as temporal dose structuring and STEM
synchronization.

• Lightning-fast speeds:

EDM systems achieve switching times fasterthan 20 ns.

• Independent intensity adjustment:

By rapidly turning the beam on and off withvariable pulse widths, the EDM makes it easy
to adjust the average beam intensity withoutchanging the image conditions. A desktop
accessory knob provides an intuitive interface
to adjust the dose attenuation factor.

CFEG

Electrostatic
Shutter Driver• Dose structuring:

Users can take control of their illumination
by applying dose in pulses with variable
durations as short as 100 ns and frequencies
up to 500 kHz.

SignalCombiner

Electrostatic
Shutter• Modern control software:

The EDM works out of the box as a fast
beam blanker. Control software is included
for programmable dose attenuation,logging, and more.

Attenuation
Control Knob• Integration:
Attenuation
Control Software

The EDM acts as a fast and reliable presample beam blanker while supporting acompanion Relativity Sub-Framing System
as well as third-party hardware.

Fast beam blanking
Quantity

ValueMaximum pulse frequency

500 kHz

Transition time 90%-10%< 20 ns

Blanking signals

3 inputs

Dose attenuation
Configuration

EDM Basic

EDM Advanced

Application

TEM imaging

TEM and STEM, pump-probe dynamics

Pulse width increment

62.5 ns

10 ns

Minimum pulse width

125 ns

100 nsSynchronization

No synchronization

TTL trigger input

Pulse repetition frequency (max)

500 kHz

Applicable model: JEM-ARM300F2, JEM-ARM200F (CFEG), NEOARM (CFEG), JEM-F200 (CFEG), JEM-2200FS*, JEM-2100F*(*These models should be equipped with a standard column without the Cs corrector.)

Pulsed Beam TEM Illumination *a/b = ratio %Electrostatic dose modulatorab

Pulsed Illuminationor Single shot
Specimen

Intermittent Illumination (pulsed illumination)
Low %High %

Pulsed Beam STEM Illumination *Electrostatic dose modulatorb = 2 µs

Dose Attenuation: Illumination ratio=

90%

Dose Attenuation: Illumination ratio=50%

a = 1.8 µs

Specimena/b = ratio %Electrostatic dose modulator
a = 1 µsb = 2 µs

Specimen

1 nm

Dose attenuation by pulsed illumination with Frequency of 500 kHz (2 μs) in a high resolution STEM at 300 kV using Si [110]in the condition of pixel dwell time with 19 μs/pixel (1024 ×1024 pixels), by changing duration ratio from 90% to 50%
during acquisition of one STEM image in 20 s.
*Electrostatic Dose Modulator (EDM) offers two versions, EDM Basic and EDM Advanced. EDM Basic provides Pulsed Beam TEM Illumination, and EDM Advanced
does both Pulsed Beam TEM Illumination and Pulsed Beam STEM Illumination.

IDES INC, 5653 Stoneridge Drive Unit 117, Pleasanton, CA 94588, USA

www.ides-inc.com

Specifications subject to change without notice.

No. 1003D106X Printed in Japan, Kp