Light Source in 2004
Masahiro KATOHUVSOR Facility, Institute for Molecular Science
1. Status of UVSOR-II
In the fiscal year 2004, we have operated the UVSOR-II accelerators from May ’04 to March ’05. We had
two shut-down periods, in April ’04 and March ’05. The former was to install a new vacuum chamber for thebending magnet, B6. This chamber was specially designed and constructed for the infrared beam-line BL6B(IR)[1]. The latter was to install the new RF accelerating cavity. The new cavity has capability of producing threetimes stronger accelerating field. We also stopped the operation for one week in September for somemaintenance works and for two weeks around the New Years day.
We had only a few troubles on the accelerators during FY2004. The most serious one happened on the
power supply of the booster-synchrotron magnets, which has been working for more than 20 years. Fortunately,
the power supply was soon recovered by replacing the broken electronic device. The users operation wascanceled only for one day. This power supply will be replaced in FY2006. The new one will have capability ofincreasing the maximum beam energy of the booster synchrotron from 600 MeV to 750 MeV. Then, we will beable to inject a full energy electron beam into the storage ring.
We had 36 weeks for the users operation in multi-bunch mode and had two weeks in single bunch mode.
We had two weeks dedicated for machine studies. The monthly statistics of the operation time and the integrated
beam current are shown in Figures 1. The normal operation pattern in a week is as follows. From Tuesday to
Friday, the machine is operated for users. The beam injection is twice a day, at 9:00 and 15:00. The initial beam
current of each run is 350 mA in multi-bunch mode and 100 mA in single bunch mode. On Monday, the machineis operated for machine studies.
4

5 10Integrated Beam Current (mA hr)

300

200

100

4

3 10

4

2 10

4

1 10

Mar. 05

Jan. 05

Feb. 05

Dec. 04

Oct. 04

Nov. 04

Sep. 04

July 04

Aug. 04

Apr. 04

Mar. 05

Jan. 05

Feb. 05

Dec. 04

Oct. 04

Nov. 04

Sep. 04

July 04

Aug. 04

May 04

June 04

Apr. 04

May 0400

Fig. 144 10June 04

Operation Time (hours)

400

Monthly statistics of the operation time (left) and Monthly statistics of the integrated beam current(right).

8

2. Improvements
New Vacuum Chamber for the Bending Magnet B6
The vacuum chamber of the bending magnet B6 was replaced in spring, 2004. The BL6A1 was an infrared
beam-line, which had been in operational for many years [2]. This beam-line was converted to a new infrared
beam-line BL6B, which would be the world most powerful beam-line in the far infrared regime. To constructthis beam-line, we replaced the vacuum chamber of the bending magnet B6. The new chamber has a mirror room
directly connected to the bending beam pipe, as shown in Figure 2. In this chamber, a distributed sputtering ion
pump (DIP), a normal sputtering ion pump (SIP) and a titanium sublimation pump (TGP) are installed. Two setsof the button type beam position monitor were installed at the both ends. The chamber was made of stainlesssteel. The chamber was installed in the ring and baked. The vacuum was almost recovered after the high current
operation for a few weeks.

Fig. 2 New Bending Chamber for B6 just after the installation.

New RF Accelerating Cavity
In the fiscal year 2004, the new RF cavity will be constructed [3]. With the present RF power source whose
maximum output power is 20 kW, the new cavity will produce 150 kV accelerating voltage for the beam currentof 500 mA. This will greatly improve the Touschek lifetime.
The new cavity was delivered in March 2005. The old cavity was removed from a straight section between
the bending magnet B6 and B7. In this section, a short in-vacuum undulator is in operation. This undulator will
move to another short straight section. Then, this section will be available for a new long undulator. The newcavity was installed in the short straight section between B1 and B2.

Fig. 3 Old (left) and new (right) RF cavities.

9

250

Free Electron Laser
The smaller emittance of UVSOR-II has increased
the gain of the free electron laser [4]. We have succeededin oscillating in deep UV region around 250 nm with anaverage power of a few hundred mW, as shown in Fig. 4.
The reinforcement in the RF accelerating system is

Output Power (mW)@250 nm

3. Researches and Developments

200

150

100

50

expected to increase the FEL gain more. We will try an
oscillation in VUV region in near future.

0

0

50

100

150

200

250

I (mA/2bunch)

Fig. 4 Average Output Power of the Free
Electron Laser oscillating at 250 nm.
Observation of Terahertz Bursts
At

the UVSOR-II

storagering, possible

coherent

synchrotron radiation was observed in the wavelength region between 0.2 and 3.0 mm [5]. Bursts of terahertz
emission were detected, as shown in Fig. 5 when the ring was operated in single bunch mode and the beam
current exceeded a certain threshold current, typically around 100 mA. Typical duration and interval of the bursts
are about 200 micro-seconds and 10 - 15 milliseconds, respectively. Each burst contains many peaks and shows
quasi-periodicity of about 30 micro-seconds. The peak intensities of the bursts are 10000 times higher than thatof normal synchrotron radiation in the same wavelength region. The threshold current depends on the operation
condition of the storage ring, especially that of the RF system.
(V rf= 5 5 k V

Detector Output (a.u.)

1 .5

Ib = 2 0 6 m A )

1
0 .5
0
-0 .5
0

Fig. 50 .0 50 .1
0 .1 5
T im e (s e c )0 .2

Terahertz Bursts observed at BL6B(IR) in a single bunch operation.

[1] S. Kimura, E. Nakamura, J. Yamazaki, M. Katoh, T. Nishi, H. Okamura, M. Matsunami, L. Chen, T. Nanba,
Proceedings of 8th International Conference on Synchrotron Radiation Instrumentation (2004) 416.
[2] T. Nanba et al., Int. J. Infrared and Millimeter Waves 7 (1986) 1769.
[3] A. Mochihashi et al., in this report.
[4] M. Hosaka, M. Katoh, A. Mochihashi, J. Yamazaki, K. Hayashi, Y. Takashima, Nucl. Inst. Methods Phys. Res.
A 528 (2004) 291.
[5] Y. Takashima et al., in this report10Parameters of UVSOR Accelerator Complex

Accelerator complex in the UVSOR facility

Parameters of UVSOR-II Storage Ring
EnergyInjection Energy
Maximum Stored Current
Natural Emittance
Circumference
RF Frequency
Harmonic Number
Bending Radius
Lattice
Straight Section
RF Voltage
Betatron Tune
Horizontal
VerticalMomentum Compaction
Natural Chromaticity
Horizontal
Vertical
Energy Spread
Natural Bunch Length

750 MeV
600 MeV
500 mA (multi bunch)
100 mA (single bunch)
27.4 nm-rad
53.2 m90.1 MHz16
2.2 m
Extended DBA × 4(4 m × 4) + (1.5 m × 4)
55 kV
3.75
3.20
0.028
-8.1
-7.3
4.2 × 10-4
160 ps11

Parameters of Injection Linear Accelerator
EnergyLengthFrequency
Accelerating RF Field
Klystron Power
Energy Spread
Repetition Rate

15 MeV
2.5 m
2856 MHz2S/3 Traveling Wave
1.8 MW~ 1.6 MeV
2.6 HzParameters of Booster Synchrotron
EnergyInjection Energy
Beam Current
Circumference
RF Frequency
Harmonic Number
Bending Radius
Lattice
Betatron Tune
Horizontal
VerticalMomentum Compaction
Repetition Rate

600 MeV
15 MeV
32 mA (uniform filling)
26.6 m90.1 MHz8
1.8 m
FODO × 8
2.25
1.25
0.138
2.6 HzElectron Beam Optics of UVSOR-II Storage Ring

Horizontal/verticalbetatronfunctionsanddispersion

function(left),

horizontal/vertical electron beam sizes and beam divergences (right) of UVSOR-II

12

and

Parameters of the insertion devices

Brilliance of radiation from the insertion devices (U3, U5 and U7) and abending magnet of UVSOR-II

BL3U In-vacuum Undulator

BL7U In-vacuum Undulator

Number of Periods

50

Number of Periods

26

Period Length

38mm

Period Length

36mm

Pole Length

1.9 m

Pole Length

0.94m

Pole Gap

15~40mmPole Gap

15~40mmDeflection Parameter2.0~0.24

Deflection Parameter2.0~0.19

BL5U Helical Undulator / Optical KlystronBending Magnets

Number of Periods

21 / 9+9(Opt. Kly.)

Bending Radius

2.2 m

Period Length

110mm

Critical Energy

425 eV

Pole Length

23.5mmPole Gap

30~150mm

Deflection Parameter4.6~0.07(Helical)
8.5~0.15(Linear)13

Beamlines in 2004
Eiji SHIGEMASAUVSOR Facility, Institute for Molecular Science
Eight bending magnets and three insertion devices are available for utilizing synchrotron radiation at
UVSOR. There is a total of sixteen operational beamlines, which are classified into two categories. Eight ofthem are so-called "Open beamlines", which are open to scientists of universities and research institutes
belonging to the government, public organizations, private enterprises and those of foreign countries. The rest of
the eight beamlines are so-called "In-house beamlines", and are dedicated to the use of research groups within
IMS. We have one soft X-rays station equipped with a double-crystal monochromator, seven extreme ultraviolet
and soft X-rays stations with a grazing incidence monochromator, three vacuum ultraviolet stations with anormal incidence monochromator, one infrared (IR) station equipped with Fourier-Transform interferometers,
one station with a multi-layer monochromator, and three non-monochromatized stations for irradiation ofwhite-light, as shown in the appended table for all available beamlines at UVSOR.
Discussion with users, concerning the improvements and upgrades of the beamlines at UVSOR, has been
continuously held as series of UVSOR workshops. The upgrade project of the UVSOR storage ring, in which thecreation of four new straight sections and the achievement of much smaller emittance (27 nm-rad) were planned,
has been approved in the fiscal year of 2002 and has been accomplished on schedule. Keeping pace with thisproject, a new in-vacuum undulator and high performance monochromator for BL3, and a new high-resolution
photoelectron energy analyzer for the end station at BL5U, have been successfully installed. The renewal of thevacuum duct at BL6 has been made during the regular shutdown in the spring of 2004. In coincidence with this,a so-called magic mirror has been installed as the first mirror for a new IR beamline, BL6B. It has been
confirmed that the highest intensity in the world, has been achieved in the wavelength range from sub-milli tonear IR region. Two vacant lots are left at BL2A and BL6A to construct novel beamlines. A new RF cavity has
been installed to the short straight section between B01 and B02 before the end of March 2005; BL2A will be a
bending-magnet beamline while BL6A is to be an undulator one, which will be called BL6U. Regarding theutilization for the long straight section between B06 and B07, a UVSOR workshop has been held in March 2005.
On the basis of the review and evaluation report on the present status of UVSOR in 2004, a high resolution andhigh flux variable polarization beamline for spectroscopy in the VUV range has been proposed and possible
scientific cases performed on this beamline have been discussed. Further serious discussion toward utilizing theavailable straight sections most effectively and formulating a basic plan on the beamline construction, will be
continued.
All users are required to refer to the beamline manuals and the UVSOR guidebook (latest revision in 1999),
on the occasion of conducting the actual experimental procedures. Those wishing to use the open and in-housebeamlines are recommended to contact the stationmaster/supervisor and the representative, respectively. For
updated information of UVSOR, http://www.uvsor.ims.ac.jp/.

14Station Masters and Supervisors of Open Beamlines in FY2004
Beamline

Station Master

Sub MasterSupervisor

1A

N. Kondo

E. Shigemasa

E. Shigemasa

1B

M. Hasumoto

S. Kimura

S. Kimura

5U

T. ItoS. Kimura

S. Kimura

5B

M. Hasumoto

E. Nakamura

E. Shigemasa

6B

S. Kimura

E. Nakamura

S. Kimura

7B

M. Hasumoto

S. Kimura

S. Kimura

8A

E. Nakamura

Y. Hikosaka

E. Shigemasa

8B1

Y. Hikosaka

E. Nakamura

E. Shigemasa

Representatives of In-House Beamlines in FY2004
Beamline

Representative

Affiliation

2B

K. Mitsuke

Dep. VUV Photoscience

3U

N. Kosugi

Dep. VUV Photoscience

3B

K. Mitsuke

Dep. VUV Photoscience

4A1

T. Urisu

Dep. VUV Photoscience

4A2

T. Urisu

Dep. VUV Photoscience

4B

E. Shigemasa

UVSOR

7U

T. Urisu

Dep. VUV Photoscience

8B2

T. Urisu

Dep. VUV Photoscience15

Beamlines at UVSOR-II
Beamline
1A

Double-Crystal

1B

1m Seya-Namioka

2B

18m Spherical Grating

3U

Energy Region(eV)

Monochromator,
Spectrometer

Experiments

Beamline
masterSolid (Absorption)

N. Kondo
nkondo@ims.ac.jp

1.9 eV 40 eV

Solid (Reflection,
Absorption)

M. Hasumoto
hasumoto@ims.ac.jp

20 eV 200 eV

Gas (Photoionization, K. Mitsuke
Photodissociation)
mitsuke@ims.ac.jp

600 eV

Varied-Line-Spacing
Plane Grating(Monk-Gillieson)

40 eV

3B

3m Normal Incidence(Dragon)

3 eV 40 eV

4A1

Multi-Layered-Mirror

4 keV

Gas (Photoionization, T. Hatsui
Photodissociation),
hatsui@ims.ac.jp
Solid (Photoemission)

600 eVGas (Photoemission)

K. Mitsuke
mitsuke@ims.ac.jp

Irradiation

T. Urisu
urisu@ims.ac.jp
T. Urisu
urisu@ims.ac.jp

50 eV 95 eV
4A2

None

Irradiation

4B

Varied-Line-Spacing
Plane Grating(Monk-Gillieson)

Gas (Photoionization, E. Shigemasa
Photodissociation),sigemasa@ims.ac.jp
Solid (Photoemission)

5U
(FEL)

None
(Optical Klystron)

5U

Spherical Grating(SGM-TRAIN*)

5B

80 eV

800 eV

Free Electron Laser

5 eVSolid (Photoemission) T. Ito
tito@ims.ac.jp

250 eV

Plane Grating
5 eV

J. Yamazakiyamazaki@ims.ac.jp

600 eV

Calibration,
Solid (Absorption)

M. Hasumoto
hasumoto@ims.ac.jp

6B
(IR)

Martin-Puplett FT-FIR,
2.5 eV
Michelson FT-IR
0.25 meV

Solid (Reflection,
Absorption)

S. Kimurakimura@ims.ac.jp

7U

None

Irradiation

Y. Nonogaki
nonogaki@ims.ac.jp

7B

3m Normal Incidence

Solid (Reflection,
Absorption)

M. Hasumoto
hasumoto@ims.ac.jp

Irradiation, Users'
Instruments

E. Nakamura
eiken@ims.ac.jp

Solid (Absorption)

Y. Hikosaka
hikosaka@ims.ac.jp

1.2 eV 30 eV
8A

None or Filters

8B1

15m Constant Deviation
30 eVGrazing Incidence

8B2

600 eV

Solid (Photoemission) D. Yoshimura
daisukey@ims.ac.jp

Plane Grating
1.9 eV 150 eV
<1
200
E
(eV)
λ >10-610-8(m)>1µm 10nm

400

600

800 1000<
1keV<
10-9>
1nm>

16

* Spherical Grating Monochromatorwith Translating and Rotating
Assembly Including Normal
incidence mountBL1A
Soft X-Ray Beamline for Photoabsorption Spectroscopy
BL1A is a soft X-ray beamline for photoabsorption spectroscopy. The beamline is equipped with a focusing
premirror and a double crystal monochromator [1]. The monochromator serves soft X-rays in the energy region
from 585 to 4000 eV by using several kinds of single crystals such as E-Al2O3, beryl, KTP (KTiOPO4), quartz,
InSb, and Ge. The throughput spectra measured by a Si photodiode (AXUV-100, IRD Inc.) are shown in Fig. 1.
Typical energy resolution (E/'E) of the monochromator is about 1500 for beryl and InSb. There are no
experimental setups specific of this beamline, except for a small vacuum chamber equipped with an electron
multiplier (EM) detector. Photoabsorption spectra for powdery samples are usually measured in a total electron
yield mode, with the use of the EM detector.
[1] Hiraya at al, Rev. Sci. Instrum., 63, 1264 (1992).

Photon Flux(photons/sec./100mA)

4

Beta-alumina
Beryl
KTP
InSb
Ge

2

1098
6
4
2

1088
6
4

1000

2000

3000

4000

5000

Photon Energy(eV)Fig. 1 Throughput spectra of the double crystal
monochromator at BL1A.

Fig. 2 A side view of BL1A.

Beamline Specifications
Monochromator

Double crystal monochromator

Monochromator crystals:

E-Al2O3 (22.53 Å, 585-1609 eV), beryl (15.965 Å, 826-2271 eV),

(2d value, energy range)

KTP (10.95 Å, 1205-3310 eV), quartz (8.512 Å, 1550-4000 eV),InSb (7.481 Å, 1764-4000 eV), Ge (6.532 Å, 2094-4000 eV)Resolution

E/'E = 1500 for beryl and InSb

Experiments

Photoabsorption spectroscopy

17

BL1B
Seya-Namioka Monochromator for General Purposes
BL1B has been constructed to perform various spectroscopic investigations such as absorption, reflectivity,and luminescence in condensed matters. This beamline consists of a pre-focusing mirror, a 1-m Seya-Namioka
type monochromator, and post-focusing mirrors with different focal lengths. Three gratings of 600, 1200, and2400 l/mm can cover the wavelength region ranging from 40 to 650 nm (hQ = 2 – 30 eV). The post mirror with alonger focal length is usually used with an LiF window to separate the vacuum condition of the monochromatorfrom a main experimental station, which make experiments for liquids and bio-specimens possible, while theother is mainly utilized for solid-state spectroscopy. The output flux from this monochromator is about 1010
photons/sec. around 200 nm with 0.1 mm slit openings. The spectral distributions for two gratings measured by aconventional photomultiplyer are shown in Fig. 1. A second monochromator (Spex 270M) and a LN-cooled
CCD detector (Princeton Inc.) are available for luminescence measurements, together with a liquid helium-flow
type cryostat. To perform time-resolved experiments, a TAC system is also available.

Fig. 1 Photocurrent at the sample position at BL1B.

Fig. 2 Photo of BL1B.

Beamline Specifications
Monochromator

1-m Seya-Namioka type

Wavelength Range

40 to 600 nm (2-30 eV)Resolution

E/¨E~1000 at 100 nm (10 eV)

Experiment

Absorption, reflection, luminescence spectroscopy for solids

18

BL2B
Beamline for Gas Phase Photoionization and Reaction Dynamics
This beamline has been developed for the purpose of studying ionization, excitation and decay dynamics
involving inner-valence electrons, 2p electrons of the third row atoms, and 4d electrons of the lanthanides. The
monochromator is a spherical grating Dragon-type with 18-m focal length. High throughput (1 u 1010 photonss-1) and high resolution (E/'E = 2000 - 8000) are achieved simultaneously under the condition of the ring currentof 100 mA [1]. A second-order light of 7 % is contained at a photon energy of 45.6 eV (G3). The optical system
consists of two prefocusing mirrors, an entrance slit, three spherical gratings (G1 - G3), two folding mirrors, amovable exit slit and a refocusing mirror [2]. The monochromator is designed to cover the energy range of 23 205 eV with the three gratings: G1 (2400 lines mm-1, R = 18 m) at 80 - 205 eV; G2 (1200 lines mm-1, R = 18 m)
at 40 - 100 eV; G3 (2400 lines mm-1, R = 9.25 m) at 23 - 50 eV.
We have been taking photoion yield curves of various fullerenes. Geometrical structures and electronic
properties of fullerenes have attracted widespread attention because of their novel structures, novel reactivity,and novel catalytic behaviors as typical nanometer-size materials. However, spectroscopic information is very
limited in the extreme UV region, which has been probably due to difficulties in acquiring enough amount ofsample. This situation has been rapidly changed in these few years, since the techniques of syntheses, isolation,and purification have been advanced so rapidly that appreciable amount of fullerenes can be readily obtained.
[1] M. Ono et al., Nucl. Instrum. Meth. Phys. Res. A 467-468, 577 (2001).
[2] H. Yoshida and K. Mitsuke, J. Synchrotron Radiat. 5, 774 (1998).

Beamline Specifications
Monochromator 18-m spherical grating
Dragon-type
Wavelength

6 – 55 nm

Range
Resolution

2000-8000

Experiment

Mass spectrometry;
Photoelectron spectroscopy

Fig. 118-m spherical grating monochromator

installed at the Beamline 2B.

19

BL3U
Varied-Line-Spacing Plane Grating Monochromator for MolecularSoft X-Ray Spectroscopy
The beamline BL3U is equipped with an in-vaccum undulator composed of 50 periods of 3.8 cm period length.
The emitted photons are monochromatized by the varied-line-spacing plane grating monochromator (VLS-PGM)
designed for various spectroscopic investigations in the soft x-ray range including soft x-ray emission studies.
Three holographically ruled laminar profile plane gratings are designed to cover the photon energy range from
60 eV to 800 eV. The beamline has two endstations, namely XES setup and Multi-purpose setup. The XES setup
is used for soft x-ray emission spectroscopy. The beam is horizontally focused onto the sample position byplane-elliptical mirror, M2X. In the Multi-purpose setup, the beam is focused by the toroidal mirror M2.
Between the sample position and M2, the differential pumping is placed.

Top View

S0

XES Setup
S1X
M1: Spherical G: VLSP
R=88.826 m

in-vacuum
M0: Cylindricalplane undulator R=47.253 m

sample176o

M2X: Plane-Elliptical
r1=11.7 m
r2=0.5 m
M2: Toroidal
R=81.65 m
ρ= 37.23 mm

Multi-purpose setup S1

sample

176o
700
0

5300

3100

400

6000

9100

Side View

2203

500

9500

11703

G

M2X

800
12203

13003

14603

S1X
sample

176o
177o

1600

173o

M1

S1

M0

M2

sampleFig. 1 Schematic layout (left) and the photography (right) of the BL3U. The distances along the beam from thecenter of the in-vacuum plane undulator are shown in mm. S1X and M2X can be replaced with the other exit slit
S1 so that experiments can be carried out at either the XES or multi-purpose endstation. In the XES setup, thesample is placed at 5-10 mm downstream of S1X.

Beamline Specifications
Monochromator

Varied-line-spacing plane grating monochromator

Energy Range

60-800 eVResolution

E/'E > 7000

Experiment

Soft X-ray spectroscopy (XPS, XES, XAS)

Beam Size

Gaussian shape(XES Endstation)

Vertical 5-20 Pm; Horizontal 68 Pm (FWHM)

20

BL3B
Beamline for Gas Phase Photoelectron Spectroscopy
This beam line is devoted to studies of elementary atomic and molecular processes induced by excitation ofvalence electrons. A monochromator is a vertically dispersed normal incidence type with 3m focal length and
10q angle between the incident and diffracted photon beams. The maximum wavelength resolution of 0.007nm is
narrow enough to separate vibrational levels of excited states for various molecules. A main component in anexperimental chamber is a spherical sector electrostatic energy analyzer which has been designed and setup forphotoelectron spectroscopy. One can perform two-dimensional photoelectron spectroscopy with good resolution( 30meV) in which the photoelectron yield is measured as a function of both photon energy and electron kinetic
energy (binding energy). A two-dimensional spectrum, usually represented as a contour plot, contains richinformation on photoionization dynamics and properties of superexcited states. A great variety of interestinghigh-lying states involved in autoionization have been studied [1-5].
[1] K. Mitsuke et al., J. Electron Spectrosc. Rel. Phenom. 79, 395 (1996).
[2] H. Hattori and K. Mitsuke, ibid. 80, 1 (1996); H. Hattori et al., J. Chem. Phys. 106, 4902 (1997).
[3] Y. Hikosaka et al., J. Chem. Phys. 105, 6367 (1996); ibid. 107, 2950 (1997); ibid. 110, 335 (1999).
[4] K. Mitsuke et al., J. Electron Spectrosc. Rel. Phenom. 112, 137 (2000).
[5] Y. Hikosaka and K. Mitsuke, J. Phys. Chem. 105, 8130 (2001); J. Chem. Phys. 121, 792 (2004).

Photon intensity / arb. units

40

60

80

100

10000

10000

8000

8000

6000

6000

4000

4000

2000

2000

0

0
40

60

80

100

Wavelength / nm

Fig. 1 Relative photon intensity at the sample pointof BL3B.

Fig. 2

Apparatus for gas-phase photoelectron

spectroscopy at the Beamline 3B.

Beamline Specifications
Monochromator

3-m normal incidence

Wavelength Range

30 – 200 nm

Resolution

14000 at 100 nm

Experiment

Photoelectron Spectroscopy

21

BL4A1
SR-Induced Sputtering Deposition and Annealing Beamline
This beam line is used for synchrotron radiation (SR)-induced sputtering deposition and annealing onto
substrates. The beam line has multilayered-mirror (MLM) monochromator. The beam line optics is optimized toobtain a high photon flux. Optimization concerning the reduction of the low energy background due to the totalreflection has been made for the combination of the Mo/Si MLMs and the C filter. Mo/Si MLMs have a (normal
incident) reflectivity of over 60% can be made for the energy region around 100 eV, which contains the coreelectron binding energies of Al and Si [1].
The SR-induced sputtering deposition and annealing chamber is connected to the beam line as shown in Fig. 1.
The sample and deposition source can be easily introduced into the chamber, and the angle of them can bechanged from outside.
[1] H. Mekaru et al., Rev. Sci. Instrum. 70 (1999) 2601.

Fig. 1Top view of BL4A1.

Fig. 2Annealing chamber.

Beamline Specifications
Monochromator

Multilayered-mirror monochromator

Energy Range

50-95 eVResolution

5-9 eV (FWHM)

Experiments

Synchrotron radiation (SR)-induced sputtering deposition and annealing
onto substrates

22

BL4A2Beamline for Synchrotron Radiation Chemical Vapor Deposition
This beam line is used for synchrotron radiation chemical vapor deposition (SR-CVD) and photo-etchingexperiments. The beam line has no monochromator for high photon flux to irradiate and consists of only two
mirrors. One is for focusing and the other is for branching. At the beam line, the gas supply and extinction
system is equipped for using legally controlled high pressure gasses such as SiH4, Si2H6 and GeH4. They arecommonly used to CVD of semiconductor crystals.
The SR-CVD and photo-etching chambers are connected to the beam line as shown in Fig. 1. In thosechambers, infrared reflection absorption spectroscopy (IRRAS) system is installed to study the surface
photochemistry on Si surfaces modified with various kinds of molecules.

Fig. 1Top view of BL4A2.

Beamline Specifications
Monochromator

None

Energy Range

The whole energy range of the synchrotron radiation

Resolution—

Experiments

Synchrotron radiation chemical vapor deposition, and photo-etchingexperiments

23

BL4B
Varied-Line-Spacing Plane Grating Monochromator for MolecularSoft X-Ray Spectroscopy
The beamline BL4B equipped with a varied-line-spacing plane grating monochromator (VLS-PGM) wasconstructed for various spectroscopic investigations in a gas phase and/or on solids in the soft X-ray range. Twoholographically ruled laminar profile plane gratings with SiO2 substrates are designed to cover the photon energy
range from 80 eV to 800 eV. The gratings with the groove densities of 267 and 800 l/mm cover the spectral
ranges of 60-300 and 200-1000 eV, respectively, and are interchangeable without breaking the vacuum. Fig. 1
shows the absolute photon flux for each grating measured by a Si photodiode (IRD Inc.), with the entrance- andexit-slit openings set at 25 and 10 Pm, respectively. Under this condition, the corresponding resolving power(E/'E) for the 800 l/mm grating is expected to be more than 8000 at 400 eV.
10

10 8
6

800 l/mm
267 l/mm

4

Flux (photons/sec. /100mA)

2

S1=25
=25µm
S2=10
S2=10µm

1098
6
4
2
8

10 8
6
4
2
7

10

Fig. 1

200

400

600
800
Photon Energy (eV)

1000

1200

Throughput from the VLS-PGM monochromator on

BL4B.

Fig. 2A photo of BL4B taken from theupper platform of BL3B.

Beamline Specifications
Monochromator

Varied-line-spacing Plane Grating Monochromator

Energy range

60-1000 eVResolution

E/'E ! 5000 (at maximum)

Experiments

Soft X-ray spectroscopy (mainly, angle-resolved photoion spectroscopy forgaseous targets and photoelectron spectroscopy for gaseous and solid targets)

24

BL5U
Photoelectron Spectrometer for Solids and Surfaces
This beamline is designed for high-resolution angle-resolved photoemission study for solids and surfaces withthe linearly and circularly polarized synchrotron radiation from a helical undulator. The beamline consists of aSpherical Grating Monochromator with Translational and Rotational Assembly Including a Normal incidence
mount (SGM-TRAIN), and a high-resolution angle-resolved photoemission spectrometer.
The SGM-TRAIN is an improved version of a constant-length SGM to aim the following points; (1) wide
energy range of 5-250 eV, (2) high resolving power, (3) use of linearly and circularly polarized light, (4)reduction of second-order light, and (5) two driving modes by a computer control. The second-order light is well
suppressed by using laminar profile gratings and combinations of mirrors and gratings.

Fig. 1 Throughput spectra from the SGM-TRAIN monochromator on BL5U.

Beamline Specifications
Monochromator

SGM-TRAIN

Energy Range

5-250 eVResolution

0.5-80 meV(with slits width of 0.01 mm)

Experiment

ARPES, AIPES, XAS

Flux

1x 1012 photons/s for undulator
radiation in MPW mode

Main Instruments

Hemispherical photoelectron

Fig. 2 High-resolution angle-resolved

analyzer (MBS-Toyama, A-1), LEED

photoemission apparatus for BL5U.

of reverse type (OMICRON), Liq-He
flow cryostat (5 – 400 K)

25

BL5B
Calibration Apparatus for Optical Elements and Detectors
BL5B has been constructed to perform calibration measurements for optical elements and detectors. This
beamline is composed of a plane grating monochromator (PGM) and three end stations in tandem. The most
upstream station is used for calibration measurements of optical elements, the middle one for opticalmeasurements for solids and the last for photo-stimulated desorption experiments. The experimental chamber at
the most downstream station is sometimes changed to a chamber for photoemission spectroscopy.
The calibration chamber shown in Fig. 2 is equipped with a goniometer for the characterization of opticalelements, which has six-degree-of-freedom; X-Y translation of a sample, and interchange of samples and filters.
These are driven by pulse motors in vacuum. Since the polarization of synchrotron radiation is essential for suchmeasurements, the rotation axis can be made in either horizontal or vertical direction (s- or p-polarization).

G1M0
G1M1
G1M2
G2M1
G2M2
G2M3
G2M4
G3M3
G3M4
G3M5
G3M6

Photocurrent (A)

10 -9

10

-10

10

-11

1

2

3

4

5

6

7 8 9

10

2

3

4

5

6

7 8 9

2

100

Wavelength (nm)Fig. 1 Throughput spectra for possible combinations ofFig. 2 A side view of the experimental chamber

gratings and mirrors at BL5B measured by a gold mesh.

for calibration measurements.

Beamline Specifications
Monochromator

Plane Grating Monochromator

Energy range

6-600 eV (2-200 nm)

Resolution

E/'E a 500

Experiments

Calibration of optical elements, absorption of solids, photo-stimulated
desorption from rare gas solids

26

BL6B (IR)Infrared and Terahertz Spectroscopy of Solids
SR has a good performance (high brilliance and high flux) not only in VUV and SX regions but also in IR andterahertz regions. This beamline covers in the IR and terahertz regions. The previous beamline BL6A1 that has
been constructed in 1985 is the pioneer of the infrared SR research. The beamline was upgraded in the spring of2004 and the name was changed to be BL6B (IR). The front-end part including the bending duct #6 was replaced
to a new one with higher acceptance angle using a magic mirror as shown in Fig. 1.
The beamline is equipped with two interferometers, one is Michelson-type (Bruker IFS-66v) and the otherMartin-Puplett-type (JASCO FARIS-1), for the wide spectral region from several to 20,000 cm-1 (hQ = several
100 PeV – 2.5 eV) as shown in Fig. 2. The experimental chamber in which users bring can be equipped at thefree port. In the near future, an IR microscope covering down to terahertz region will be set up.

Magic mirror
B6
BL6U
First focusing
point
Martin-Puplett
FT-FIR

Radiation
shieldMichelson
FT-IR

Fig. 1 The design of optics and front endof BL6B.

Free
port

IR microscope(planned)

Fig. 2 Schematic figure of top view of BL6B.

Interferometer
Wavenumber Range(Energy range)
Resolution in cm-1
Experiments
Miscellaneous

Beamline Specifications
Michelson (Bruker IFS66v), Martin-Puplett (JASCOFARIS-1)
several – 20,000 cm-1, (several 100 PeV – 2.5 eV)
0.1cm-1 for IFS66v, 0.25cm-1 for FARIS-1
Reflectivity
andtransmission,
Magneto-optics(Microspectroscopy)
Users can bring their experimental system in this beamline.

27

BL7U
Undulator Irradiation Beamline for STM Observation
This beamline has been constructed for STM observation of surface photochemical reactions stimulated byundulator irradiation. The schematic drawing of the BL7U is shown in Fig. 1. The undulator is in-vacuum type,of which the period is 36 mm and the number of the period is 26. The 1st harmonic is tuned from 70 eV to 140
eV [4]. Two Pt-coated cylindrical mirrors are used for the vertical and horizontal focusing. These two mirrors
also suppress the higher harmonics of the undulator radiation into ~10% with respect to the first harmonic. The
focus point is set at the point of 9100 mm downstream from the middle of the undulator. The spot size on thesample surface was 1.0 mm (H) x 0.4 mm (V) and the estimated photon flux density was 1018 photons (cm2 sec
100 mA)-1.

Fig. 1 Schematic drawing of BL7U.

Beamline Specifications
Monochromator

None

Wavelength Range

70 – 140 eV (1st harmonic)

Resolution~10 -Experiment

Undulator Irradiation and STM Observation

Miscellaneous

28

BL7B
3-m Normal Incidence Monochromator for Solid-State Spectroscopy
BL7B has been constructed to provide sufficiently high resolution for conventional solid-state spectroscopy,
enough intensity for luminescence measurements, a wide wavelength coverage for Kramers-Kronig analyses,
and the minimum deformation to the polarization characteristic of the incident synchrotron radiation. This
beamline consists of a 3-m normal incidence monochromator which covers the vacuum ultraviolet, ultraviolet,
visible and infrared, i.e. the wavelength region of 40 -1000 nm, with three gratings (1200, 600, and 300 l/mm).
Two interchangeable refocusing mirrors provide two different focusing positions. For the mirror with the longer
focal length, an LiF or a MgF2 window valve can be installed in between the end valve of the beamline and thefocusing position. Figure 1 shows absolute photon intensity for each grating with the entrance and exit slit
openings of 0.5 mm. A silicon photodiode (AXUV-100, IRD Inc.) was utilized for measuring the photon
intensity and the absolute photon flux was estimated, taking the quantum efficiency of the photodiode into
account.

Fig. 1 Throughput spectra of BL7B measured by aFig. 2 Photo of BL7B.

silicon photodiode.

Beamline Specifications
Monochromator

3-m Normal Incidence Monochromator

Wavelength Range

50 to 1000 nm (1.2 - 25 eV)Resolution

E/'E = 4000 8000 for 0.01 mm slits

Experimentabsorption, reflection, fluorescence spectroscopy, mainly for solids

29

BL8A
Irradiation Beamline for Studies of Photochemical Reaction on Solids
The beamline BL8A was constructed for providing synchrotron radiation without monochromatizaion. The
white synchrotron radiation is focused into a 3.5 mm × 2.5 mm size by use of a toroidal mirror. The focusing
mirror can be removed for obtaining a bigger irradiation area. A differential pumping system with three stages is
introduced, which enables users to perform experiments under a very low vacuum condition (<0.5 Torr). The
intense white light available at this beamline is suitable for studies on photochemical reaction, chemical vapor
deposition, photo-etching and irradiation damage effects. No standing experimental stations are placed at thebeamline; users may install their own experimental chambers, while some standard chambers are arranged by
UVSOR.

Fig. 1 A top-view photo of the beamline.

Beamline Specifications
Monochromator

None

Energy Range

The whole energy range of the synchrotron radiation

Resolution—

Experiments

Photochemical reaction, chemical vapor deposition and photo-etchingexperiments

Miscellaneous

Beam spot size: (H)3.5 mm × (V)2.5 mm

30

BL8B1
Spherical Grating Monochromator for Soft X-Ray Spectroscopic
Studies on Solids and Surfaces
The beamline BL8B1 equipped with a constant-deviation constant-length spherical grating monochromator [1]provides soft X-ray photons in the energy range 30-800 eV with medium energy resolution. The photon energy
range is covered by using three gratings (R=15 m; 1080 l/mm, R=15 m; 540l/m, and R=7.5m; 360 l/mm) which
are interchangeable in vacuum. Figure 1 shows a throughput spectrum measured with the entrance- and exit-slit
openings of 10 Pm. Under this condition, the achievable resolving power is about 4000 at 400 eV and 3000 at
245 eV, respectively.
An experimental chamber is equipped for conventional measurements of electron yield spectra, or
pseudo-photoabsorption spectra, under a ~1×10-6 Torr vacuum condition.
[1] Hiraya at al, Rev. Sci. Instrum. 66, 2104 (1995).

Flux (Photons/sec./100mA)

1010

Slits: 10 µm

G3: 360 l/mm

109

G2: 540 l/mm
8

10

107

G1: 1080 l/mm
6

10

0

200

Fig. 1 Photo of the monochromator at BL8B1.

400
600
800
Photon Energy (eV)1000

Fig. 2 Throughput of the monochromator at
BL8B1.

Beamline Specifications
Monochromator

Constant-deviation constant-length spherical grating type

Energy range

30-800 eVResolution

E/'E = 4000 at 400 eV and 3000 at 245 eVExperiments

Photoabsorption

spectroscopy,

electron

spectroscopy

coincidence spectroscopy for solids and surfaces

31

and

electron-ion

BL8B2
Angle-Resolved Ultraviolet Photoelectron Spectrometer for Solids
BL8B2 is a beamline for angle-resolved ultraviolet photoemission spectroscopy (ARUPS) system which isdesigned for measuring various organic solids such as molecular crystals, organic semiconductors, andconducting polymers. This beamline consists of a plane-grating monochromator (PGM), a sample preparationchamber with a fast entry Load-Lock chamber, a measurement chamber with an accurate for temperaturedependence (base pressure 1u10-10Torr), a cleaning chamber (base pressure 1u10-10Torr), and a sample
evaporation chamber (base pressure 3u10-10Torr). The cleaning chamber is equipped with a back-view
LEED/AUGER, an ion gun for Ar+ sputtering, and an infrared heating unit. The PGM consists of premirrors, aplane grating, focusing mirror, and a post-mirror, with an exit slit. It covers the wide range from 2 to 150eV withexchanging two gratings (G1: 1200l/mm, G2: 450l/mm) and five cylindrical mirrors. The toroidal mirror focuses
the divergent radiation onto the sample in the measurement chamber. The spot size of the zeroth-order visible
light at the sample surface is about 1u1mm2. Figure 1 shows the throughput spectra of PGM (slit=100µm). Theenergy resolution at a slit width of 100µm was found to be 0.004-0.3eV in the wavelength range from 2 to 130eV.
A hemi-spherical electron energy analyzer of 75mm mean radius with an angular resolution less than 2q can berotated around vertical and horizontal axes. The sample mounted on a manipulator can be also rotated around
two axes.

Fig. 1

Fig. 2 A photo of BL8B2.

Throughput spectra of plane-grating

monochromator at BL8B2 (slit=100µm).
Beamline Specifications
Monochromator

Plane-grating monochromator

Wavelength Range

9- 600nm

Resolution

E/'E = 1000

Experiment

Angle-resolved ultraviolet photoemission spectroscopy

32