List of Publications

List of publications(1) Papers
1.

D. Li, M. Hangyo, Y. Tsunawaki, Z. Yang, Y. Wei, S. Miyamoto, M. R. Asakawa, and K.
Imasaki,“Growth rate and start current in Smith–Purcell free-electron lasers”, Appl. Phys. Lett.
100, 191101-1-3(2012).

2.

D. Li, M. Hangyo, Y. Tsunawaki, Z. Yang, Y. Wei, S. Miyamoto, M. R. Asakawa and K.
Imasaki, “Theoretical Analysis on Smith-Purcell Free-Electron Laser”,"Free Electron

Lasers", Edited by Sándro Varró,INTECHWEB.ORG, Janeza Trdine 9, 51000 Rijeka, Croatia,
March 2012, ISBN:978-953-51-0279-3. Chapter 6, pp151-174 (2012).
3.

Tomoaki Inoue, Takayasu Mochizuki, Shuji Miyamoto, Kazuya Masuda, Sho Amano, andKazuhiro Kanda, “Characteristics of a Cylindrical Collector Mirror for Laser^Produced Xenon
Plasma Soft X-Rays and Improvement of Mirror Lifetime by Buffer Gas”,Review of Scientific
Instruments, v.83, no.12, 123110-15 (2012).

4.

S.Amano, T,Inoue, “Laser-plasma extreme-ultraviolet source at 6.7nm using a rotating
cryogenic Xe target”, Applied Physics B, Vol.108, 743-747(2012)

5.

Hideki Kido, Tomoyuki Kuroki, Masaaki Okubo, Yuichi Utsumi, “Application of photo-etchingof polytetrafluoroethylene induced by high energy synchrotron radiation to LIGA”,
Microsystem Technologies, 19, 3, 301-307, (2013)

6.

Ryo Takahashi, Takao Fukuoka, Yuichi Utsumi, and Akinobu Yamaguchi, “Optofluidic Devices
with Surface-Enhanced Raman Scattering Active Three- Dimensional Gold Nanostructure”,
Japanese Journal of Applied Physics, in press, (2013)7.

ᳰౝ⵨┨㧘ጯේల૫㧘ౝᶏ⵨৻㧘ᴡวᱜ㧘ᄥ↰ൟ㧘“᡼኿శ⋥ធࠛ࠶࠴ࡦࠣߦࠃࠆ࠹ࡈ
ࡠࡦዉᵄ▤ᮮᢿ࿁〝ߩ⸳⸘ߣ⹜૞”㧘㔚ሶᖱႎㅢାቇળ⺰ᢥ⹹(C), vol.J95-C, no.12,
pp.531-534, Dec. 20128.

Yasuharu Ohgoe, Kenji K. Hirakuri, Hidetoshi Saitoh, Takahiro Nakahigashi, Naoto Ohtake,Atsushi, Hirata, Kazuhiro Kanda, Masanori Hiratsuka, Yasuhiro Fukui,“Classification

of DLC films in terms of biological response”, Surface & Coatings Technology, 207,
350-354 (2012)9.

Tomoaki Inoue, Takayasu Mochizuki, Kazuya Masuda, Sho Amano, Tsugushima Sekioka,
Kazuhiro Kanda, “Effective collision cross section of xenon plasma debris in argon buffergas”, J. Phys. B: At. Mol. Opt. Phys, 45, 115401 (2012)

10. Akihiro Fujimoto, Makoto Okada, Yuji Kang, Masahito Niibe, Shinji Matsui,Kanda, Tsuneo
Suzuki, and Kazuhiro Kanda, “Effective collision cross section of xenon plasma debris inargon buffer gas”, Jpn. J. Appl. Phys., 51, 06FD07 (2012)
11. Akira Wada, Katsuaki Koshimura, Masahito Niibe, Hidetoshi Saitoh, Kazuhiro Kanda,andHaruhiko Ito, “Carbon-K NEXAFS measurements of a-CNx films formed fromdecomposition of BrCN in electron cyclotron resonance plasma of He, Ne, and Ar”,
Journal of Non-Crystalline Solids, 358, 124-128 (2012)
12. Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo
Harada, and Hiroo Kinoshita, "Chemical Reaction Analysis of EUV CA Resist using SR
Absorption Spectroscopy," J. Photopolymer Sci. Technol 25, 569, 2012.
13. Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Isamu Takagi, Kazuhiro Katayama,
Norihiko Sugie, Toshiya Takahashi, Soichi Inoue, Tekeo Watanabe, Tetsuo Harada, andHiroo Kinoshita, Study of EUV outgassing spatial distribution toward witness plate in the
EUV outgas tester, SPIE Proc. 8679, 86790M, 2012.
14. Mitsunori Toyoda, Kenjiro Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi
Tokimasa, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita, At-Wavelength Extreme
Ultraviolet Lithography Mask Observation Using a High-Magnification Objective withThree Multilayer Mirrors, Appl. Phys. Exp. 5, 112501, 2012.
15. Yutaka Nagata, Tetsuo Harada, Masato Nakasuji, Hiroo Kinoshita, Katsumi Midorikawa,“Development of highly spatial-coherent, 13.5-nm high-order harmonics for EUVL mask
inspection using coherent EUV scatterometry microscope”, IEEE, Photonics Conference
Proceeding, 935-936, (2012).
16. Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Yutaka Nagata, Hiroo Kinoshita,

Developmentofstandalone

coherent

EUV

scatterometry

microscopewithhigh-harmonic-generation EUV source, SPIE Proc. 8441, 8441-2, 2012. (invited paper)
17. Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe,
Katsumi Midorikawa, Hiroo Kinoshita, Development of Coherent Extreme-Ultraviolet
Scatterometry

MicroscopewithHigh-Order

Harmonic

Generation

Sourcefor

Extreme-Ultraviolet Mask Inspection and Metrology, Jpn. J. Appl. Phys. 51, 06FB09, 2012.
18. Tetsuo Harada, Masato Nakasuji, Akifumi Tokimasa, Takeo Watanabe, Youichi Usui, andHiroo Kinoshita, Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent
Extreme-Ultraviolet Scatterometry Microscope, Jpn. J. Appl. Phys. 51, 06FB08, 2012.
19. ᧛᧻ᐽม㧘ẩ↰᣿ା㧘ේ↰ື↵㧘ᧁਅඳ㓶㧘࠾ࡘ࡯ࠬࡃ࡞ᄙ⋡⊛ࡆ࡯ࡓ࡜ࠗࡦ BL-10
ߦ߅ߌࠆエ㨄✢ๆ෼ಽᨆ㧔㧝㧕㧧ಽశ․ᕈ⹏ଔߣシర⚛ᮡḰ઀᭽ߩ XANES ᷹ቯ㧘㨄✢ಽᨆߩㅴᱠ ╙ 43 㓸㧘407, 2012. (in Japanese)
20. ᷰㆻஜᄦ㧘ේ↰ື↵㧘ᧁਅඳ㓶㧘‫ޟ‬EUV ࡝࠰ࠣ࡜ࡈࠖ⎇ⓥ㐿⊒࠮ࡦ࠲࡯ߦ߅ߌࠆ࡝
࠰ࠣ࡜ࡈࠖ㐿⊒‫ޠ‬㧘ࠢ࡝࡯ࡦ࠹ࠢࡁࡠࠫ࡯2012 ᐕ 6 ᦬ภ, 2012. (in Japanese)
21. Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi,
Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo
Kinoshita, Resist outgassing characterization for qualification in high power EUV
Lithography, SPIE Proc. 8322, 83221E, 2012.
22. ᧁਅඳ㓶, 䇸䊅䊉䊂䊋䉟䉴㊂↥䈮ะ䈔䈢ᭂ┵⚡ᄖ✢䊥䉸䉫䊤䊐䉞ᛛⴚ䈱㐿⊒䇹, ᔕ↪‛ℂ81, pp. 391-395, 2012. (in Japanese)
23. M. Okada, M. Iwasa, H. Hiroshima, Y. Haruyama, K. Kanda, and S. Matsui, “Adhesion andfrictional force measurements employing scanning probe microscopy in a pentafluoropropane
gas atmosphere”, J. Vac. Sci. Technol. B 30, 011601-3, 2012
24. S. Iyoshi, M. Okada, T. Katase, K. Tone, K. Kobayashi, S. Kaneko, Y. Haruyama, M. Nakagawa,
H. Hiroshima, and S. Matsui, “Step and Repeat Ultraviolet Nanoimprinting under
Pentafluoropropane Gas Ambient”, Jpn. J. Appl. Phys. 51, 06FJ08-6, 2012
25. K Kanda, T Hasegawa, M Uemura, M Niibe, Y Haruyama, M. Motoyama, K Amemiya, S

Fukushima, and T Ohta, “Construction of a Wide-range High-resolution Beamline BL05 in
NewSUBARU for Soft X-ray Spectroscopic Analysis on Industrial Materials”, Journal of
Physics: Conference Series 425, 132005, 2013
26. Masahito Niibe, Takuya Kotaka, Tohru Mitamura, ”Investigation of analyzing depth of N-K
absorption spectra measured using TEY and TFY method”, J. Phys.: Conf. Series, 425, 132008(2013).
27. Masahito Niibe, Keigo Koida, Yukinobu Kakutani: ”Contamination expreiments for Mo/Si
multilayer mirrors with the use of single-bunch synchrotron radiation”, J. Phys.: Conf. Series,
425, 132021 (2013).
28. M. Niibe, K. Sano, T. Kotaka, R. Kawakami, K. Tominaga, Y. Nakano: ”Etching Damage and
Its Recovery by Soft X-ray Irradiation Observed in Soft X-ray Absorption Spectra of TiO2 ThinFilm”, J. Appl. Phys., 113, 126101 (2013).
29. S. Hori, M. Niibe, T. Kotaka, K. Fujii, K. Yoshiki, T. Namazu and S. Inoue, ”X-ray Absorption
Studies on the Growth Process of RF Magnetron Sputtered BN Films: Bias Voltage andSubstrate Temperature Effects”, Jpn. J. Appl. Phys., 52, 045602 (2013).
30. M. Niibe, T. Kotaka, R. Kawakami, Y. Nakano, T. Inaoka, K. Tominaga, T. Mukai, ”Damage
Analysis of n-GaN Crystal Etched with He and N2 Plasmas”, Jpn. J. Appl. Phys. 52, 01AF04(2013). Ranked in the Top 20 Most Downloaded Articles in JJAP (February 2013).
31. Y. Nakano, K. Nakamura, M. Niibe, R. Kawakami, N. Ito, T. Kotaka, K. Tominaga, ”Effect of
UV Irradiation on Ar-Plasma Etching Characteristics of GaN”, ECS J. Solid State Sci. &Technol., 2, 110-113 (2013).
32. R. Kawakami, A. Takeichi, M. Niibe, M. Konishi, Y. Mori, T. Kotaka, T. Inaoka, K. Tominaga,
T. Mukai: ”Capacitively coupled radio frequency nitrogen plasma etch damage to N-typegallium nitride”, Vacuum 87, 136-140 (2013).
33. S. Honda, S. Nanba, Y. Hasegawa, Y. Nosho, A. Tsukagoshi, M. Niibe, M. Terasawa, R. Hirase,
H. Izumi, H. Yoshioka, K-Y. Lee, K. Niwase, E. Taguchi, M. Oura, ”Defect Evolution in
Multiwalled Carbon Nanotube Films Irradiated by Ar Ions” Jpn. J. Appl. Phys., 51 110202(2012).

34. R. Kawakami, M. Niibe, A. Takeichi, Y. Mori, M. Konishi, T. Kotaka, F. Matsunaga, T.
Takasaki, T. Kitano, T. Miyazaki, T. Inaoka, K. Tominaga: ”Characteristics of TiO2 Thin Film
Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasma”, Jpn. J. Appl. Phys.
51, 08HB04 (2012).

(2)International Meetings
1. Yoshihiro ASANO, Shuji MIYAMOTO, and LEPS-II collaboration, "Shielding Design of Laser
Electron Photon Beamlines at SPring-8", "12th International Conference on Radiation
Shielding(ICRS-12) & Topical Meeting of RPS Division of American Nuclear Society(RPSD-2012)", September 2-7, 2012, Nara Prefectural New Public Hall, Nara, Japan
2.

Shuji Miyamoto, "Gamma-ray Beambeamline on NewSUBARU" , "Science and Technology
with MeV Photons at Canadian Light Source", Uiv. of Saskatuwan, Jan. 18-19 (2013).

3.

S.Amano, and T.Inoue, “Diamond-Like Carbon Sputtering by Laser Produced Xe Plasma”,8th
International Symposium on Swift Heavy Ions in Matter (SHIM2012), Kyoto, Oct.24-27, 2012.

4.

T.Sekioka, S.Amano, T.Inoue, and T.Mochizuki, “Characteristics of Fast Ions from
Laser-Induced Plasma and their Applicability to Shallow Junction Doping”8th International
Symposium on Swift Heavy Ions in Matter (SHIM2012), Kyoto, Oct.24-27, 2012.

5.

Hiroki Nose, Masaki Ishizawa, Kazuhisa Kuroda, Takeshi Kunisada, Masatoshi Kataoka,
Yuichi Utsumi, “Blood separation chip for automated biological analysis”, RSC(Royal Societyof Chemistry) Tokyo International Conference, pp12, September 6-7 (2012), Chiba, Japan

6.

Ryo Takahashi, Takao Fukuoka, Yuichi Utsumi, “ERS Active Self-assembled Nanostructures
toward Higher Dimension III: Sterically-bulky Self Assembles Array”, RSC(Royal Society ofChemistry) Tokyo International Conference, p12, September 6-7 (2012), Chiba, Japan

7.

Takao Fukuoka, Ryo Takahashi, Yuichi Utsumi, Motofumi Suzuki, “SERS Active
Self-assembled Nanostructures toward Higher Dimension II : Physically Self-assembled
Nanoparticles Array”, RSC(Royal Society of Chemistry) Tokyo International Conference, p11,
September 6-7 (2012), Chiba, Japan

8.

Ryo Takahashi, Takao Fukuoka, Yuichi Utsumi, “Three Dimensional Gold Nanostructure for
Plasmonic Sensing”, Gold Science Technology and its Applications, the 6th International
Conference, 2P-043, September 5-8 (2012), Tokyo, Japan

9.

Yuji Yoritama, T. Uchiyama , Akinobu Yamaguchi, Yuichi Utsumi, “Fabrication of Integrated
Magneto Impedance Sensor for Medical Monitoring”, 38th International Conference on Microand Nano Engineering (MNE2012) , p298-378, September 16-20 (2012), Toulouse, France

10. Masaki Ishizawa, Yuichi Utsumi, “Contamination-Free Internally-Triggered Automatic Flow
Sequencing for Microfluidics”, 38th International Conference on Micro and Nano Engineering(MNE2012) , p338-313, September 16-20 (2012), Toulouse, France
11. Hideki Kido, Yuichi Utsumi, Toshihiko Asami, Hajime Mita, “Fabrication of fluorocarbon
resin micro fluidic chip for processing of amino acid derivatization” , 38th International
Conference on Micro and Nano Engineering (MNE2012), p342-339, September 16-20 (2012),
Toulouse, France
12. Ryo Takahashi, Takao Fukuoka, Yuichi Utsumi, “SERS Active Three Dimensional Gold
Nanostructure Fabrication for Optofluidic Device” , 38th International Conference on Microand Nano Engineering (MNE2012), p343-346, September 16-20 (2012), Toulouse, France
13. Ryo Takahashi, Mitsuhiro Yoshida, Yuichi Utsumi, “Single Molecule Detection Using
Sterically-bulky Self Assembles of Gold Nanoparticles”, 38th International Conference on
Micro and Nano Engineering (MNE2012), p123-546, September 16-20 (2012), Toulouse,
France
14. Tsunemasa Saiki, Yasuto Arisue, Kei Kuramoto, Hiroo Shizuka, Masahiro Takeo, Kazusuke
Maenaka, Yuichi Utsumi, “Direction Control of Powder Transport on Solid Substrate by Drive
Frequency of Surface Acoustic Wave Actuator”, 38th International Conference on Micro andNano Engineering (MNE2012), p279-022, September 16-20 (2012), Toulouse, France
15. Yoshiaki Ukita, Takayuki Oguro, Masaki Ishizawa, Hiroki Nose, Yuichi Utsumi, Yuzuru
Takamura, “Visualization of Biological Fluid Behaviour on Spinning Centrifugal Microfluidics
using Coaxial Micro-Stroboscope” 38th International Conference on Micro and Nano
Engineering (MNE2012), p398-304, September 16-20 (2012), Toulouse, France

16. Y. Kang, R. Takahashi, T. Fukuoka, Y. Utsumi, Y. Haruyama, and S. Matsui, “Self-assemblyof gold nanoparticles using imprinted HSQ pattern for SERS measuremen”, 11th International
Conference on Nanoimprint and Nanoprint Technology (NNT12), October 24-26, Napa, USA
17. Masahiro Takeo, Isao Kawaji, Akihiro Nakasuji, Takaaki Tone, Yoshiaki Ukita, Dai-ichiro
Kato, Seiji Negoro, Shinichi Yusa, Makoto Katayama, Yuichi Utsumi, “Automatic ELISA
Analytical System for a Trace Amount of Environmental Chemicals Using A 3-Dimensional
Microreactor with a Novel Antigen-Bound Microfilter”, 16th International Conference on
0LQLDWXUL]HG 6\VWHPV IRU &KHPLVWU\ DQG /LIH 6FLHQFH ȝ7$6  S-1164, October 28November 1 (2012), Okinawa, Japan
18. Yoshiaki Ukita, Masaki Ishizawa, Yuzuru Takamura, Yuichi Utsumi, “Internally Triggerd
Multistep Flow Sequencers Using Clepsydra”, 16th International Conference on Miniaturized
6\VWHPVIRU&KHPLVWU\DQG/LIH6FLHQFH ȝ7$6 S-1467, October 28- November 1 (2012),
Okinawa, Japan
19. Kyuya Nakagawa, Akihiro Tamura, Yuki Goto, Masahiro Takeo, Yuichi Utsumi, “Preparation ofFreeze-Dried Porous Media in a Microchannel: A New Platform for Enzymatic Reactions”,
16th International Conference on Miniaturized SysWHPVIRU&KHPLVWU\DQG/LIH6FLHQFH ȝ7$6 
p1765-1767, October 28- November 1 (2012), Okinawa, Japan
20. Hideki Kido, Ikuo Okada, Yuichi Utsumi, Toshihiko Asami, Hajime Mita, “Fabrication of
PTFE micro fluidic chip for processing of amino acid derivatization”, 25th International
Microprocesses

andNanotechnology

Conference(MNC2012),

2P-11-91,

October

30-Nobember 2 (2012), Kobe, Japan
21. Yasuto Arisue, Tsunemasa Saiki, Kei Kuramoto, Yutaka Hata, Hiroo Shizuka, Kazusuke
Maenaka, Yuichi Utsumi, “Proposal of Particle Size Sorting Method by Surface Acoustic
Wave”, 25th International Microprocesses and Nanotechnology Conference (MNC2012),
2P-11-96, October 30-Nobember 2 (2012), Kobe, Japan
22. Masaki Ishizawa, Yuichi Utsumi, “Clepsydra-based Autonomous Flow Sequencer with Liquid
Trap Reservoir”, 25th International Microprocesses and Nanotechnology Conference(MNC2012), 2P-11-92, October 30-Nobember 2 (2012), Kobe, Japan23. Ryo Takahashi, Takao Fukuoka, Yuichi Utsumi, “Optofluidic Device with SERS Active Three
Dimensional Gold Nanostructure”, 25th International Microprocesses and Nanotechnology
Conference (MNC2012), 2P-11-102, October 30-Nobember 2 (2012), Kobe, Japan
24. Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata,“Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask
Observation”, EIPBN2012, Hilton Waikoloa Village, Hawaii, USA, 2012/05/30.
25. Mitsunori Toyoda, Kenji Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi Tokimasa,
Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita, “At-Wavelength EUV Lithography
Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors,”
EIPBN2012, Hilton Waikoloa Village, Hawaii, USA, 2012/05/30.
26. Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi,
Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue Testuo Harada, and Hiroo
Kinoshita, “Development of the Novel Evaluation Tool with an In-situ Ellipsometer for theThickness Measurement of the Contamination Originated by the High Power EUV Irradiation
on EUV Resist”, 2012 International Workshop on EUV Lithography, Maui, Hawaii, USA,
2012/6/6.
27. Takeo Watanabe, Daiju Shiono, Yuichi Haruyama, Tetsuo Harada, and Hiroo Kinoshita,“Chemical Reaction Analysis based on the SR Absorption Spectroscopy for the High Sensitive
EUV Resist”, 2012 International Workshop on EUV Lithography, Maui, Hawaii, USA,
2012/6/6.
28. Hiroo Kinoshita, “Possibility of EUVL system at the Wavelength of 6.8 nm”, 2012 International
Workshop on EUV Lithography, Maui, Hawaii, USA, 2012/6/6.
29. Hiroo Kinoshita, Tetsuo Harada, Yutaka Nagata, Mitsunori Toyoda, and Takeo Watanabe,“Development of Actinic Mask Inspection Systems”, 2012 International Workshop on EUV
Lithography, Maui, Hawaii, USA, 2012/6/6.
30. K. Tsubakimoto, H. Yoshida, H. Fujita, N. Miyanaga, Y. Nagata, H. Kinoshita, “240W, 10kHz
Green Laser from Harmonic Converted Nd:YAG MOPA”, Advanced Lasers and Photon
Sources 2012, Yokohama, Japan, Apr. 25-27, 2012.

31. Tetsuo Harada,

Masato Nakasuji, Takeo Watanabe, Yutaka Nagata, Hiroo Kinoshita,“Development of Coherent EUV Scatterometry Microscope with High Harmonic Generation
EUV Source”, 2012 International Symposium on Extreme Ultraviolet Lithography, Brussel,
Belgium, Sept. 30 – Oct. 4, 2012.
32. Takeo Watanabe, Daiju Shiono, Yuuichi Haruyama, Kazuya Emura, Takuro Urayama, Katsumi
Ohmori, Kazufumi Sato, Tetsuya Harada, and Hiroo Kinoshita, “The Mitigation of EUV Resist
for the High Sensitivity and the Effect of Acid Diffusion for LWR on the basis of the Chemical
Reaction Analysis”, 2012 International Symposium on Extreme Ultraviolet Lithography,
Brussel, Belgium, Sept. 30 – Oct. 4, 2012.
33. Yukiko Kikuchi, Toshiya Takahashi, Norihiko Sugie, Takeo Watanabe, Tetsuo Harada, Hiroo
Kinoshita, Kazuhiro Katyama, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, and Soichi
Inoue, “The Characterization of the Witness Sample Testing for the Outgassing Qualification of
EUV Resists”, 2012 International Symposium on Extreme Ultraviolet Lithography, Brussel,
Belgium, Sept. 30 – Oct. 4, 2012.
34. Isamu Takagi, Toshiya Takahashi, Norihiko Sugie, Takeo Watanabe, Tetsuo Harada, Hiroo
Kinoshita, Kazuhiro Katayama, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, and Soichi
Inoue, “Study of Contamination due to EUV Resist Outgassing”, 2012 International
Symposium on Extreme Ultraviolet Lithography, Brussel, Belgium, Sept. 30 – Oct. 4, 2012.
35. Hiroo Kinoshita, Takeo Watanabe, Tetsuo Harada, “Recent Activities on EUVL in
NewSUBARU,” Micro Nano Conference, Kobe, Japan, Nov. 1, 2012.
36. Tetsuo Harada, Masato Nakasuji, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita,“Phase Imaging of EUV Mask using Coherent EUV Scatterometry Microscope,” Micro Nano
Conference, Kobe, Japan, Nov. 1, 2012.
37. Takeo Watanabe, Daiju Shiono, Yuichi Haruyama, Kazuya Emura, Takuro Urayama, Katsumi
Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita, “The Analytical Mitigation of
EUV Resist for the High Sensitivity and the Low LWR using SR Absorption Spectroscopy,”
Micro Nano Conference, Kobe, Japan, Nov. 1, 2012.
38. Mitsunori Toyoda, Kenji Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi Tokimasa,
Tetsuo Harada, Hiroo Kinoshita, Tsuyoshi Amano, and Tsuneo Terasawa, “An EUV

mask-imaging microscope for lithography generations with sub-16 nm half pitch,” Micro Nano
Conference, Kobe, Japan, Nov. 1, 2012.
39. Y. Kang, R. Takahashi, T. Fukuoka, Y. Utsumi, M. Okada, Y. Haruyama, S. Matsui, “Goldnanoparticles self-assembly assisted with imprinted HSQ pattern for SERS measurement”, 25th
International Microprocesses and Nanotechnology Conference (MNC2012), 2P-11-78, October
30-Nobember 2 (2012), Kobe, Japan
40. Hiroki Nose, Masaki Ishizawa, Takeshi Kunisada, Kazuhisa Kuroda, Akinobu Yamaguchi,
Yuichi Utsumi, “Blood separation lab-on-a-CD with controlled surface” , 7th International
Conference on Molecular Electronics and Bioelectronics (M&BE7), pp89, March 17-19 (2013),
Fukuoka, Japan
41. Yuji Yoritama, S. Yamamoto, T. Uchiyama , Akinobu Yamaguchi, Yuichi Utsumi,“Three-Dimensional Magneto Impedance Sensor using a Multi Layers Electroplating
technique” , 7th International Conference on Molecular Electronics and Bioelectronics(M&BE7), pp178, March 17-19 (2013), Fukuoka, Japan
42. Mitsuyoshi Kishihara, M. Yamashima, Yuichi Utsumi, “A Chip-Size Structure for Continuous
Microwave Irradiation by Post-Wall Waveguide”, Proc. of 2012 Asia-Pacific Microwave
Conference, 2D3-01, pp.265-267, December 4-7 (2012), Kaohsiung, Taiwan
43. Ryo Imai, Kazuhiro Fukuda, Masaharu Uemura, Takayuki Hasegawa, Muneyuki Motoyama,
Mititaka Terasawa, Kazuhiro Kanda, “The Classification of Diamond-Like Carbon Thin
Films Using BL05 in NewSUBARU”, Royal Society of Chemistry-Tokyo International
Conference 2012 (RSC-TIC 2012), Chiba, 2012/9/6-7
44. M.Uemura, T.Hasegawa, M.Sawa, N.Yokoi, N.Fukada, M.Shimizu, T.Tsurui, K.Amemiya,
T.Ohta, M.Motoyama, K.Kanda, S.Fukushima, “L-edge for the 1st period transition
elements”, The 14th European Conference on X-Ray Spectrometry (EXES 2012), Vienna,
2012/6/18-22
45. T.Hasegawa, M.Uemura, T. Tanigawa, M.Sawa, N.Yokoi, N.Fukada, M.Shimizu, T.Tsurui,
K.Amemiya, T.Ohta, M.Motoyama, K.Kanda, S.Fukushima, “K and L-edge Spectra of
Several Sulfur Compounds”, The 14th European Conference on X-Ray Spectrometry(EXES 2012), Vienna, 2012/6/18-22

46. K. Kanda, T. Hasegawa, M. Uemura, M. Niibe, Y. Haruyama, M. Motoyama, K. Amemiya,
S. Fukushima, and T. Ohta, “Construction of a Wide-range High-resolution Beamline BL05
in NewSUBARU for Soft X-ray Spectroscopic Analysis on Industrial Materials”, The 11th
International Conference on Synchrotron Radiation Instrumentation (SRI 2012), Lyon,
2012/7/9-13
47. Y. Nakano, K. Nakamura, M. Niibe, R. Kawakami, N. Ito, T. Kotaka, K. Tominaga, ”Effectof UV Irradiation on Ar-Plasma Etching Characteristics of GaN”, 5th International
Symposium on Advanced Plasma Science and its Applications for Nitrides andNanomaterials, January 28-February1 (2013), Nagoya, Japan.
48. Y Nakano, M. Niibe, M. Lozac’h, L. Sang, M. Sumiya, ”Deep level investigation of thick
InGaN films”, 5th International Symposium on Advanced Plasma Science and its
Applications for Nitrides and , Nanomaterials, January 28-February1 (2013), Nagoya, Japan.
49. S. Honda, Y. Nosho, A. Tsukagoshi, H. Okada, M. Niibe, M. Terasawa, R. Hirase, H. Yoshioka,
H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura, ”Change of Diameters ofMulti-walled Carbon Nanotubes by Multiply Charged Ar Ion Irradiation”, 25th International
Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.
50. S. Honda, Y. Nosho, A. Tsukagoshi, S. Miyamoto, M. Niibe, M. Terasawa, T. Tokushima, Y.
Horikawa, R. Hirase, H. Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura:
51. ”Analysis of the C1s X-UD\ 3KRWRHOHFWURQ 6SHFWUXP DQG & .Į ;-ray Emission Spectrum ofMulti-walled Carbon Nanotubes Irradiated by Multiply Charged Ar Ion”, 25th International
Conf. on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.
52. R. Kawakami, M. Niibe, H. Takeuchi, M. Konishi, Y. Mori, T. Shirahama, T. Yamada K.
Tominaga, ”SiC Surface Damage Originating from Synergy Effect of Ar Plasma Ion andPlasma-Induced Ultraviolet Light Irradiations” 25th International Conf. on Atomic Collisions in
Solids, Oct. 21-25 (2012), Kyoto, Japan.
53. A. Tsukagoshi, R. Osugi, H. Okada, S. Honda, M. Niibe, M. Terasawa, R. Hirase, H. Yoshioka,
H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura, ”Spectroscopic Characterization of
Ion-irradiated Multi-layer Graphenes”, 25th International Conf. on Atomic Collisions in Solids,

Oct. 21-25 (2012), Kyoto, Japan.
54. S. Honda, Y. Nosho, A. Tsukagoshi, R. Mukouda, M. Niibe, M. Terasawa, R. Hirase, H.
Yoshioka, H. Izumi, K. Niwase, E. Taguchi, K.-Y. Lee and M. Oura: ”Raman and X-ray
Absorption Spectroscopic Study on Defects in Vartically Aligned Multi-walled Carbon
Nanotubes irradiated with Ar Ions”, 25th International Conf. on Atomic Collisions in Solids,
Oct. 21-25 (2012), Kyoto, Japan.
55. M. Niibe, T. Kotaka, K. Sano, R. Kawakami, K. Tominaga, Y. Nakano, ”Etching Damage
Analysis of TiO2 Thin Film with Soft X-ray Absorption Spectroscpy”, 25th International Conf.
on Atomic Collisions in Solids, Oct. 21-25 (2012), Kyoto, Japan.
56. Y. Nakano, K. Nakamura, M. Niibe, R. Kawakami, N. Ito, T. Kotaka, K. Tominaga, ”Effect of
UV irradiation on Ar-plasma etching of GaN”, International Workshop on Nitride
Semiconductors 2012, October 14-19 (2012), Sapporo, Japan.
57. S.Honda, Y.Nosho, A.Tsukagoshi, S.Miyamoto, M.Niibe, M.Terasawa, T.Tokushima,
Y.Horikawa, R.Hirase, H.Yoshioka, H.Izumi, K.Niwase, E.Taguchi, K,-Y.Lee, and M.Oura,“Electronic Structure of Multi-walled Carbon Nanotubes Irradiated by Multiply Charged Ar
Ions”, 12th International Conference on Electronic Spectroscopy and Structure (ICESS 2012),
Sait-Malo, France, September 16-21, 2012.
58. M. Niibe, T. Kotaka, T. Mitamura, ”Investigation of analyzing depth of N-K absorption spectra
measured by TEY and TFY metthods., 11th Int’l. Conf. on Syncrotron Rad. Instrum., 9-13 July(2012), Lyon, France.
59. M. Niibe, K. Koida, Y. Kakutani, ”Contamination Experiment for Mo/Si Multilayer Mirrors
with the use of Single-bunch Synchrotron Radiation”, 11th Int’l. Conf. on Syncrotron Rad.
Instrum., 9-13 July (2012), Lyon, France.
60. Y. Kang, Y. Nakai, M. Okada, Y. Haruyama and S. Matsui, “Characteristics of mechanicalvibration in imprinted nanostructures”, The 56th International Conference on electron, ion,
photon beam technology and fabrication, Hawaii, 2012/5/30
61. M. Okada, M. Kurita, E. Nishioka, M. Kondo, Y. Haruyama, A. Emoto, H. Ono, N. Kawatsuki
and S. Matsui, “Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline

Polymer by Thermal Nanoimprinting”, The 56th International Conference on electron, ion,
photon beam technology and fabrication, Hawaii, 2012/5/30
62. M. Okada, M. Kurita, E. Nishioka, M. Kondo, Y. Haruyama, A. Emoto, H. Ono, N. Kawatsuki
and S. Matsui, “Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid
Crystalline Polymer Fabricated by Thermal Nanoimprinting”, The 56th International
Conference on electron, ion, photon beam technology and fabrication, Hawaii, 2012/5/30
63. S. Iyoshi, M. Okada, Y. Haruyama, S. Matsui, K. Kobayashi, S. Kaneko, M. Nakagawa, H.
Hiroshima, “Study of demolding Characteristics in continuous UV nanoimprinting”, The 56th
International Conference on electron, ion, photon beam technology and fabrication, Hawaii,
2012/5/30
64. K. Kanda, T. Hasegawa, M. Uemura, M. Niibe, Y. Haruyama, K. Amemiya, S. Fukushima, T.
Ohta, “Construction of a Wide-range High-resolution Beamline BL05 in NewSUBARU forSoft X-ray Spectroscopic Analysis on Industrial Materials”, The 11th International Conference
on Synchrotron Radiation Instrumentation, Lyon, France, 2012/7/12
65. Y. Haruyama, M. Okada, T. Ishida, S. Matsui, “Evaluation of the fluorinated self-assemblemonolayer by using photoemission and absorption spectroscopy”, Asian Conference on
Nanoscience & Nanotechnology 2012, Lijiang, China, 2012/9/7
66. Y. Haruyama, M. Okada, and S. Matsui, “The electronic structure of the fluorinatedself-assemble monolayer by photoemission and absorption spectroscopy”, The 12th
International Conference on Electron Spectroscopy and Structure, Saint-Malo, France,
2012/9/17
67. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T, Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, “Reorientation Pattern Of Photoinduced Liquid Crystalline Polymer Imprinted By
Thermal Nanoimprinting Using A Dot Pattern Mold”, The 38th International Micro & Nano
Engineering Conference, Toulouse, France, 2012/9/17
68. Y. Kang, M. Okada, Y. Haruyama and S. Matsui, “Residual Layer Removal By Reactive Ion
Etching”, The 38th International Micro & Nano Engineering Conference, Toulouse, France,
2012/9/17

69. M. Okada, Y. Haruyama, and S. Matsui, “Frictional Force Measurement By Scanning Probe
Microscopy Using Cantilever With And Without Antisticking Layer”, The 38th International
Micro & Nano Engineering Conference, Toulouse, France, 2012/9/17
70. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T, Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, “Reorientation of Photoinduced Liquid Crystalline Polymer Induced by Thermal
Nanoimprinting with Linearly Polarized UV Irradiation”, The 11th International Conference on
Nanoimprint & Nanoprint Technology, Napa, USA, 2012/10/25
71. M. Okada, Y. Haruyama, and S. Matsui, “Evaluation of interaction between antisticking layerand UV nanoimprint resin by scanning probe microscopy”, The 11th International Conference
on Nanoimprint & Nanoprint Technology, Napa, USA, 2012/10/25
72. Y. Kang, R. Takahashi, T. Fukuoka, Y. Utsumi, M. Okada, Y. Haruyama, and S. Matsui,“Self-assembly of gold particles using imprinted HSQ pattern for SERS measurement”, The
11th International Conference on Nanoimprint & Nanoprint Technology, Napa, USA,
2012/10/26
73. S. Iyoshi, M. Okada, K. Kobayashi, S. Kaneko, T. Katase, K. Tone, Y. Haruyama, M. Nakagawa,
H. Hiroshima and S. Matsui, “ Study of the Resistance of Antisticking Layer on Repeated UVNanoimprint”, 25th International Microprocesses and Nanotechnology Conference, Kobe,
2012/11/1
74. T. Watanabe, D. Shiono, Y. Haruyama, K. Emura, T. Urayama, K. Ohmori, K. Sato, T. Haradaand H.Kinoshita, “The Analytical Mitigation of EUV Resist for the High Sensitivity and the
Low LWR using SR Absorption Spectroscopy”, 25th International Microprocesses andNanotechnology Conference, Kobe, 2012/11/1
75. M. Okada, E. Nishioka, M. Kondo, Y. Haruyama, T. Sasaki, H. Ono, N. Kawatsuki and S.
Matsui, ”Optical Evaluation of Photoinduced Liquid Crystalline Polymer Pattern fabricated by
Thermal Nanoimprinting with Linearly Polarized UV Irradiation”, 25th International
Microprocesses and Nanotechnology Conference, Kobe, 2012/11/1
76. Y. Sawada, H. Miyake, T. Ohsaki, M. Okada, S. Iyoshi, Y. Haruyama, H. Hiroshima and S.
Matsui, “Thickness Dependency of Polymerization Efficiency on UV-nanoimprint Resins”,
25th International Microprocesses and Nanotechnology Conference, Kobe, 2012/11/1

77. Y. Kang, R. Takahashi, T. Fukuoka, Y. Utsumi, M. Okada, Y. Haruyama and S. Matsui, “Gold
Nanoparticles Self-assembly assisted with Imprinted HSQ Pattern for SERS Measurement”,
25th International Microprocesses and Nanotechnology Conference, Kobe, 2012/11/2
78. M. Chinen, Y. Kang, M. Okada, Y. Haruyama, H. Hiroshima and S. Matsui, “Evaluation ofInteraction Force between UV Resin and F-SAMs by Dynamic Contact Angle Measurement in
PFP Gas Ambient”, 25th International Microprocesses and Nanotechnology Conference, Kobe,
2012/11/2