Current Status of NewSUBARUNewSUBARU Storage Ring
Y. Shoji
The total machine time in FY2013 was 2183 hrs,
82% of that of FY2012, including the beam downtime. Fig. 1 shows the breakdown. The beam downtime includes not only the down by a failure, butalso off-beam periods by a beam abort or others dueto the beam instability. The reduced machine timefrom the previous FY was category 'beam line
commissioning' , which had been 659 hrs in FY
2012. The total of the normal user time and the beamline commissioning in this FY, 1192 hrs, was a
100% of that in FY2012. Time for machine study
and special users was 123% of that in FY2012. The
down time due to the machine trouble was 0.8%, 2/3of that in FY 2012.

Storage Ring Parameters
The machine parameters of the 1.5 GeV storage
ring are listed in Table I. Although the machinecondition remains the same, some of the values arerevised according to the new model calculation.
Table I Main parameters of the NewSUBARU
storage ring in FY2013.
Circumference
118.73 m
Bending lattice typemodified DBA
Number of bending cells 6
Straight sections
4m X 4, 15m X 2
Bending radius
3.22 mInjection energy
1.0 GeV
Maximum energy
1.5 GeV
RF frequency
499.955 MHz
Betatron tune
6.29 (H), 2.23 (V)Momentum compaction factor
0.0014
Electron energy
1.0 GeV 1.5 GeV
RF voltage
100 kV 260 kV
Natural energy spread
0.047% 0.072 %Natural emittance
50 nm 112 nm
Maximum beam current 500 mA

Machine Troubles
The machine troubles in FY2013 are listed inTable II. The rate of hardware troubles wereincreasing because they get older.
Machine Study and Special User Time
Table III shows the list of machine studies in
FY 2013. Most of the study reports are open to
the public on the home page of NewSUBARU( http://www. lasti. u-hyogo. ac. jp/
beam_physics/ NewSUBARU).

Operation Status
The ring has two user-time operation modes, 1.0
GeV top-up operation mode and 1.5 GeV operation
mode. The basic operation time is 9:00 - 21:00 of
weekdays. Monday is used for machine R&D,
Tuesday is for 1.5 GeV user time, Wednesday andThursday are for 1.0 GeV top-up user time, Friday isfor 1.0 GeV or 1.5 GeV user time. Night period orweekend is used for machine study and user timewith the special mode, single bunch operation andLaser-Compton Gamma ray, if necessary.

Accelerator Improvements
The top-up operation current had been raised
from 250 mA to 300 mA since October 2012. Fig.2
shows typical operation in these 5 years. That
condition was kept during FY2013, even at a worst
case when the Compton-gamma line was inoperation.
The synchrotron oscillation feed-back system
was installed to reduced the coherent synchrotron
oscillation. It improved the measurement accuracyof machine parameters at a special operation, such asa non-achromatic mode. The longitudinal oscillation
spectrun with the feed-back on and off are shown in
Figure 1.

beam down time by machine troubles
17 hrs (0.8%)

machine tuning
302 hrs (14%)

machine study &special user timenormal user time
1192 hrs(55%)

672 hrs (31%)

Figure 1: Measured time spectrum of thebeam structure with and without feedback ofsynchrotron oscillation. The center line was
the rf frequency and the broad side bands
were synchrotron oscillation.

Figure 1: Machine time in FY2013.

1

The injection timing system of the linac was
improved. It effectively eliminated the dead time forchanging the transportation line, to NewSUBARU or
to the booster synchrotron. It reduced the time for
Table IIGroup
Operation
Control
RF & Timing
MagnetTable IIIthe beam accumulation of 300 mA from 35 min to
25 min (typical value). It also improved the atabilityof the top-up current from +0.5 mA to +0.3 mA.

Machine troubles in FY2013.

Failure/trouble
beam down time (hr)Miss operation (human error)
2.7
Beam loss by a beam instabilities
2.1
Short Lifetime
3.9
Program hung-up
1.0
COD control failure
0.1
Timing module0
Coupler failure
1.0
Circulator arc
0.1
Cooling water leak at Power supply
3.2
Magnet IL failure
2.8

List of machine studies in FY2013. The unit of study time is counted by shifts (typically 12 hrs).

R＆D theme and special user mode
Laser-Compton backscattering γ-rays
Commissioning of visible light profile monitor port SR5
Optimization of vertical beam size for 1.5 GeV user time
Betatron amplitude dependent orbit shift
Coherent synchrotron radiation by chromaticity modulation
Commissioning of the multi-element corrector2

responsible person
S. Miyamoto
Y. Shoji
K. Kanda
Y. Shoji
Y. Shoji
Y. Shojistudy shift
17
3
1
1
15
5

Beamlines
Takeo Watanabe and Hiroo Kinoshita
LASTI, University of Hyogo

Total nine beamlines are operating in the
NewSUBARU synchrotron facility. Four beamlines of
BL01, BL03, BL06 and BL11 were constructed until 1999.
Three beamlines of BL07, BL09 and BL10 were started theoperation from 2000.
BL03B beamline branched from the BL03 beamline
propose for the usage of the EUVL (extreme ultraviolet
lithography) microscope for the EUVL finished mask
inspection.
BL09B beamline branched from BL09 beamline for theusage of the usage of the EUV interference lithography toevaluate. And BL09C beamline branched from BL09B

beamline for the usage of the thickness measurement of the
carbon contamination originated to the resist outgassing
during the EUV exposure.
BL02 beamline was constructed for the usage of LIGA
in 2003.
BL05 beamline was constructed in response to ademand in the industrial world in 2008, which is theenhancement of the analysis ability in the soft X-ray region
with the development of nanotechnology.
The arrangement of the beamlines in the NewSUBARU
synchrotron radiation facility is shown in Fig.1.

Fig. 1 Beamline arrangement in NewSUBARU.

3

I. BL01
BL01 is a beamline for research and developing newlight sources. This beamline is one of two long straightsection on NewSUBARU. Optical klystron was installed at
this straight section. Upstream side of this beamline(BL01B) is intended to be used for visible and infrared
light generated from free electron laser (FEL) or
synchrotron radiation (SR). Downstream side of thisbeamline (BL01A) is used for laser Compton scattering
gamma-rays source. Gamma-ray beamline hutch justoutside of the storage ring tunnel was constructed in 2004
for gamma-ray irradiation experiments.

New gamma-ray irradiation hutch "GACKO" was installed
at BL01A, collaborating with Konan University.Table 1.

shows the specification of “GACKO”.

Table 1. Specification of “GACKO
Maximum gamma-ray power
0.33 mW
Maximum gamma-ray energy
1.7 MeV - 73 MeV
CO2 laser, wavelength/power
10.59 µm / 10W
1-1.7MeV gamma-ray flux
2×107 γ/sec@10W/300mA
Nd:YVO4 laser, wavelength/power

1.064 µm/ 30W, 0.532 µm/20W

10-17 MeV gamma-ray flux

5×107 γ/sec@30W/300mA

II. BL02
The LIGA (abbreviated name of Lithogaphic,
Galvanoformung and Abformung) process which consistsfrom deep x-ray lithography, electroforming, and molding
process is one of the promising candidates for such 3D
micofabrication. More than hundreds aspect ratio for
microstructure can be attained by the usage of the higher
energy x-rays (4-15 keV) from synchrotron radiation (SR)with deeper penetration depth to the photosensitive resist.
In this system we have succeeded to enlarge the exposurearea up to A4 size and the fabrication dimension from
submicron to millimeter by varying the energy of the x-ray
source in accordance with the size of desired microparts.
Microstructure with high aspect ratio over several hundred
will be achieved using the x-rays over 10 keV since highenergy x-ray has deep penetration depth to thephoto-sensitive resist materials. Whereas, in the case oflithography for low energy x-rays from 1 keV to 2 keV,submicron structures with high aspect ratio will beachieved using the x-rays mask with precise line-width andthinner absorber, since low energy x-rays has low
penetration depth. Based on this principle, the beamilne for
x-ray exposure have constructed with continuous
selectivity of x-rays from 100 eV to 15 keV by using the

x-ray mirrors (plane and cylindrical mirror) and Be film
filters. The horizontal angle of the outgoing SR could beobtained up to 12.5 mrad, which corresponds to thehorizontal size of 220 mm (A4 horizontal size) at the
exposure position. The second characteristic performanceof the beamline is the high efficiency differential pumping
system. This was necessary for maintain the vacuum
difference between the storage ring (<10-9 Pa) and theend-station (<10-9 Pa) at which gasses for substrate coolingwill be introduced in the exposure apparatus.
The flexibility for the shapes and functions of
microstructure will be enlarged by achieving 3D
microfabrication process using multi step exposure atvarious configuration between x-ray mask and substrates.
The relative positions between x-ray mask and substrates,
tilt and rotation angle to the SR incident direction can be
moved simultaneously during SR exposure using 5 axis
stages. The movement of each axis is controlled by the PC
in terms of the scanning speeds, scanning length, andrepetition number. In order to decrease the heat load ofsample substrate suffered during SR irradiation helium
introduction and substrate cooling mechanism were also
equipped. Specification of spectrometer is listed in Table 2.

4

Table 2. Specification of the LIGA exposure system
OpticsPlane and cylindrical mirror, Be filters
Exposure energy
100 - 2 keV, and 4 – 15 keV
Exposure method
Proximity and multi-step exposure
Wafer size
A4 or 8 inch
Exposure area
230 mm(H) ×300 mm(V)
Exposure environment< 1 atm (He-gas)

III. BL03
BL03 is a beamline for the developing the next
generation lithographic technology so called extreme
ultraviolet lithography (EUVL). The exposure tool isinstalled at the end station. Using this exposure tool, theresearch and development of the next generation
lithography such as the less than 70 nm node is going on
process. The exposure wavelength is 13.5 nm.
The semiconductor industry plays a very important rolein the information technology (IT). In 2006, 256 Gbit
DRAM with a gate length of 70 nm will be demanded in
the IT industry. The extreme ultraviolet lithography(EUVL) is a promise technology for fabricating a finepattern less than 70 nm. To meet this schedule, thistechnology has to be developed in the pilot line until 2004.
As for the practical use, it is very important that both toachieve large exposure area and to fabricate fine patterns.
Therefore, at Himeji Institute of Technology, large
exposure field EUV camera consists of three asphericalmirrors was developed. First in the world, we fabricated 60
nm line and space pattern in the large exposure area of 10
mm×10 mm on a wafer. Furthermore, BL03B beamline
branches from the BL03 beamline propose for the usage of
the EUVL microscope for the EUVL finished mask
inspection. Table 3 shows the specification of ETS-1.

Table 3. Specification of the exposure tool (ETS-1)
Imaging optics
Three aspherical mirrors
Exposure wavelength13.5 nm
Numerical aperture
0.1
Demagnification
1/5
Resolution
60 nm
Depth of focus
0.9 µmExposure area (static)
30 mm×1 mm
Exposure area (scanning)
30 mm×28 mm
Mask size
4 inch, 8 inch, and ULE 6025
Wafer size
8 inchExposure environment
In vacuum

IV. BL05
BL05 was constructed in response to a demand in theindustrial world, which is enhancement of the analysis
ability in the soft x-ray region with the development of
nanotechnology. BL05 consists of two branch lines for use
in the wide range from 50 eV to 4000 eV. BL05A and
BL05B are designed to cover the energy range of
1300-4000 eV and 50-1300 eV, respectively. The incident
beam from the bending magnet is provided for two branchlines through different windows of a mask. Therefore,
these two branch lines can be employed simultaneously. At
the end stations of each branch, the transfer vessel systems
were mounted for the measurements of sample without

exposure to air. In addition, globe box was placed for the
preparation of samples into transfer vessel.
1) The double crystal monochromator was installed at
the BL05A. InSb, Ge, Si, SiO2, Beryl and KTP crystals areprepared for a double-crystal monochromator. Toroidal
mirrors are used as a pre-mirror and a focusing mirror of
BL05A. XAFS measurement in the total electron yieldmode and fluorescence XAFS measurement using SSD(SII Vortex) can be performed. The fluorescence XAFS
spectra can be measured for samples at the end station
filled with He gas. Table 4 shows the specification of
monochromater.

5

Monochromator
Monochromator crystals
Energy range
Resolution

Table 4. Monochromator specification
Double crystal monochromator
SiO2（1010）, InSb（111）, Ge（111）, Beryl（1010）, KTP（110）, Si（111）1300-4000 eV
E/⊿E=3000

2) The constant-deviation monochromator consisting of ademagnifying spherical mirror and a varied-line-spacing
plane grating (VLSPG), which can provide high resolution,
simple wavelength scanning with fixed slits, was mounted
on BL05B. The optical system consists of a first mirror(M0), a second mirror (M1), an entrance slit (S1), a
pre-mirror (M2), and three kinds of plane grating (G), an
exit slit (S2) and a focusing mirror (M3). The including
angle of the monochromator is 175°. Two measurement

Monochromator
Grating
Energy range
Resolution

chambers are prepared at the end station of BL05B. The
XAFS spectra in the total electron yield mode andfluorescence XAFS spectra using SDD (Ourstex) can bemeasured in a high vacuum chamber. In addition, thephotoelectron spectrum can be measured using sphericalelectron analyzer (VG Sienta, R3000) in an
ultrahigh-vacuum chamber. The chambers can be replacedby each other within 1 hour. Table 5 shows the
specification of the monochromator.

Table 5. Monochromator specification
Varied-line-spacing plane grating monochromator
100 l/mm, 300 l/mm, 800 mm/l
50-1300 eV
E/⊿E=3000

V. BL06
BL06 has been mainly developed for irradiation
experiments such as photochemical reaction, SR-CVD,
photo-etching, surface modification. The white radiation
beam from bending magnet is introduced to the sample
stage using a pair of mirror, whose incident angle was 3°.
The SR at BL06 sample stage had a continuous spectrum
from IR to soft x-ray, which was lower than 1 keV. A

differential pumping system can be utilized forexperiments in a gas atmosphere, which is difficult in thesoft x-ray region. A sample holder can install four pieces ofsamples at a time. By using heater set in the sample holder,
the sample can be heated from room temperature to 220°C.
The temperature of sample is monitored using a Cr-Al
thermocouple mounted on the sample holder.

VI. BL07A and BL07B
This beamline was designed for the development of
new materials by SR technology. This beamline consists of
two branch lines, which are provided with an incident
beam from a 3-m-long undulator by switching the firstmirror. One of them is a high photon-flux beamline with amultilayered-mirror monochromator for the study of
SR-process (BL07A) and another is a high-resolution
beamline with a varied line spacing grating
monochromator for the evaluation of nano-structure
characteristics by SR-spectroscopy (BL07B). The usefulrange of emitted photons from 50 to 800 eV is covered atboth beamlines. The light source of BL07 is a 3-m lengthplanar undulator, which consists of 29 sets of permanent
magnets, a period length of which is 76 mm. The incident
beam from the undulator is provided for two branch lines
by translational switching of first mirror.
1) BL07A
The multilayered-mirror (MLM) monochromator,
which has high reflectivity in the soft X-ray region, wasinstalled at the BL07A. It consists of a switching mirror
chamber, a slit chamber, a MLM monochromator, a filter
chamber and a reaction chamber. To obtain a large photon
flux, we decided to use only first mirror (switching mirror),M0, for focusing. The MLM monochromator is designed tocover an energy range of up to about 800 eV by
combination of three kinds of mirror pairs with 4 kinds offilter. The flux deliver by this design is estimated to be
between a maximum of 1017 photons/s at 95 eV and aminimum 2×1014 photons/s at 300 eV for a 500 mA ring
current. Table 6 shows the summary of BL07A. In addition,
X-ray fluorescence (XRF) apparatus using spherical variedline spacing grating was mounted at the downstream ofirradiation chamber. The poly capillary was used toenhance beam-condensing efficiency. Measurement energy
range was from 30 eV to 450 eV. This XRF apparatus was
expected to utilize the chemical analysis on the light metals,
Li and Be, and light elements, B, C and N.

6

Energyrange(eV)

Material

50-60
60-95

Mo/Si

90-140140-194
190-400
400-560

Mo/B4C
Ni/C

Table 6. Summary of BL07A.
Multilayer mirror
spacing
Thickness number of
Ratio
layers
20 nm
11 nm
5 nm

0.8

20

0.5

25

0.5

60

550-800
2) BL07B
The constant-deviation monochromator consisting of ademagnifying spherical mirror and varied line spacing
plane grating (VLSPG), which can provide to highresolution, simple wavelength scanning with fixed slits,
was mounted on BL07B. The optical system consists of afirst mirror (M0), an entrance slit (S1), a premirror (M1),and three kinds of plane grating (G), an exit slit (S2) and afocusing mirror (M2). The monochromator is designed to∆E/E

Filtermaterial ThicknessAl
100 nm

6.2 %
None



Ag

100 nmCr

500 nmNi

500 nm

3.3 %
2.5 %

cover the energy range 50-800 eV with three gratings, ofwhich including angle are 168°. The VLSPG has been wellknown to obtain high resolution in extreme ultraviolet
region by diminishing various kinds of aberration. The
total resolving power about 3000 can be realized in thewhole energy region. Table 7 shows the specification of themonochromator.

Table 7. Monochromator specification
Mount type
Hettrick-Underwood type
Grating G1, G2, G3
Plane VLS (600 l/mm, 1200 l/mm, 2400 l/mm)
Energy range
50-150 eV, 150 – 300 eV, 300-800 eVResolving power (E/ΔE)～3000
VII. BL9A purpose of this beamline is studies on a soft x-ray
interferometry or a holographic exposure experiment withmaking use of highly brilliant and coherent photon beams
radiated from 11 m long undulator in NewSUBARU.
BL09 consists of M0 mirror, M1 mirror, G grating andM2 and M3 mirror. M0 and M3 mirrors are used forhorizontal deflection and beam convergence, M1 is usedfor vertical beam convergence at the exit slit, and M2 isused for vertical deflection and beam convergence. A
monochromator is constructed by M1 and a plane grating.
The maximum acceptance of the undulator beam is 0.64
mrad in horizontal and 0.27 mrad in vertical. The
acceptance can be restricted by 4-jaw slits equipped at
upstream of the M0 mirror.
BL09A beamline is used for material analysis: X-ray

absorption spectroscopy (XAS) and X-ray photoelectron
spectroscopy (XPS). In 2013, X-ray emission spectrometer(XAS) was introduced at the endstation of the BL09A. Theenergy range and resolution of the XAS was designed to beabout 50-600 eV and 1500, respectively.
BL09B beamline branched from BL09 beamline for theusage of the EUV interference lithography for theevaluation of the exposure characteristics of EUV resist.
Coherence length of 1 mm at the resist exposure position
was achieved using BL09B beamilne. And BL09C
beamline branched from BL09B beamline for the usage ofthe thickness measurement of the carbon contamination
originated to the resist outgassing during the EUV
exposure. Table 8 shows the specification of themonochromator.

Table 8. Monochromator specification
Mount typeMonk-Gillieson type
Grating
Plane VLS (300, 900, 1200 l/mm)
Energy range
50 – 750 eVResolving power (E/ΔE)
～3000

7

VIII. BL10
BL10 is for the global use in the Himeji Institute ofTechnology. M0 mirror is used for horizontal deflection andbeam convergence, M1 is used for vertical beam
convergence at the exit slit, and M2 is used for verticaldeflection and beam convergence. A monochromator isconstructed by M1 and a plane grating. At the beginning,the multiplayers reflectivity measurement was carried out at
this beamline. The characteristics of this beamline and theresult of the Mo/Si multiplayers measurement are carriedout for the development of the EUV- mask technology.
BL10 utilizes a monochromator of the varied line spacing
plane grating monochromator (VLS-PGM). The line
density of the monochromator in central region of thegratings were 600, 1800 and 2,400 lines/mm. The
reflectometer is a two axis vacuum goniometer using two
Huber goniometers. One axis carries the sample, which
may for examplee be a mirror at the center of thereflectometer vacuum tank (θ-motion). The other(ϕ-motion) carries the detector on a rotating arm. In

addition there are through-vacuum linear motions totranslate the sample in two orthogonal directions (x,y). All
motors are controlled by computer. The sample itself ismounted on a kinematic holder. The control stage
monochromator rotation, and data analysis were programusing LABVIEW software. The reflectivity result obtainedat BL10 has a good agreement with that at LBNL. Table 9shows the specification the monochromator.
The micro-CSM tool was adapted at the mostdownstream of the BL10 beamline for the EUV mask
defect inspection. This too is very effective for theinspection of the actinic patterned mask.
A large reflectometer was installed in a branch line for large
EUV optical component including EUV collector mirrors.
The reflectometer has a sample stage with y, z, θ, φ, and Tilt
axis, which can hold large optical elements with amaximum weight of 50 kg, a diameter of up to 800 mm,
and a thickness of 250 mm. The entire sample surface isable to be measured.

Table 9. Monochromator specification
Mount type
Hettrick-Underwood type
Grating
Plane VLS (600, 1800, 2400 l/mm)
Energy range
50 – 1,000 eVResolving power (E/ΔE)～1000

IX. BL11
A beam line BL11 is constructed for exposure Hard
X-ray Lithography (DXL) in the LIGA (German acronym
for Lithographite Galvanoformung and Abformung)process. LIGA process, that utilizes a useful industrial
application of SR, is one of the promising technologies forfabrication of extremely tall three-dimensional (3D)
microstructures with a large aspect ratio. This process wasinvented at the Institut Fur Mikrostrukturtechnik (IMT) of
the Karlstuhe Nuclear Center (KfK) in 1980.
Microstructures with height of over a few hundreds µm
have been widely applied to various fields such as
micro-mechanics, micro-optics, sensor and actuator
technology, chemical, medical and biological engineering,and so on. This beam line was designed by the criteria ;photon energy range from 2 keV to 8 keV, and a density of
total irradiated photons ≥ 1011 photons/cm2. The BL11 canprovide the most suitable photon energy for
microfabrication in X-ray lithography, while the BL2 isequipped for fabricating fine pattern submicron-scale

structure and microstructure with high aspect ratio byselectivity of X-rays using movable mirror system. That is,
LIGA process in NewSUBARU can provide the best 3D
microfabrication because the BL11 and BL2 arecomplementary. The beamline BL11 is consisting of anabsorber chamber, a first-mirror chamber (M1), a 4-way
slit chamber, a Be and polyimide window chamber, and an
exposure chamber. The horizontal angle of the outgoing
SR could be obtained up to 17.8 mrad, providing a beam
spot size on the exposure stage ≥ 80 × 10 mm2. The
micron-scale structure with high aspect ratio will beachieved using the toroidal typed mirror M1 which can
produce a parallel collimated beam of X-rays. In addition,
the homogeneity of the beam is excellently controlled by anovel adding system.
Using the precision stage in the exposure chamber, theflexibility for the shaped and functions of microstructure
will be enlarged by achieving 3D microfabrication processusing multi step exposure at various configuration

8

between x-ray mask and substrates. The exposure area of
200 mm × 200 mm is brought to fruition. In order todecrease the heat load of sample substrate suffered during

SR irradiation, helium introduction and substrate coolingsystem were also equipped. The specification of the LIGA
exposure system is listed in Table 10.

Table 10. Specification of the LIGA exposure system
Exposure method
Proximity exposure
Wafer size
8 inch200 mm(H)×200 mm(V)
Exposure area
Exposure environment< 1atm (He-gas)

Acknowledgement
We would like to thank all the staff who work at
NewSUBARU synchrotron light facility for their help
to describe the update details of the beamlines.

9Construction of multilayered-mirror monochromator at
BL07A
Shotaro TANAKA1, Ryo IMAI1, Kazuhiro KANDA1, and Sei FUKUSHIMA2LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Ako, Hyogo 678-1205 Japan
2
National Institute for Materials Science, 1-2-1 Sengen, Tsukuba-shi, Ibaraki, 305-0047, Japan
1

Abstract
A new multilayered-mirror monochromator was constructed at a 3-m undulator beamline, BL07A.
This monochromator was designed to cover an energy range from 80 eV to 800 eV using three kindsof multilayer mirror pairs. Using this monochromator, BL07A can be used as a high-photon flux andenergy tunable beamline.
Introduction
A multilayered-mirror (MLM) monochromator designed especially for synchrotron radiation (SR) stimulated
process experiments and a light source of X-ray fluorescence spectrometer has been constructed at BL07A. The
light source of BL07 is a 3m length planar undulator. Undulator light has higher photon flux compared to lightfrom a bending magnet but it is quasi-monochromatic, because several higher harmonic lights are generated
corresponding to an undulator gap. A MLM monochromator can monochromatize incident soft X-rays with a highthroughput and its resolving power, E/E, is lower than 10, but, it is sufficient to remove the higher harmoniclights from undulator light except the purpose light. As a result, BL07A can be utilized as a high-photon flux andenergy tunable beamline by the combination of undulator with a MLM. By the elimination of unnecessary
harmonic lights, BL07A can be used for the SR stimulated process experiments at low temperature, such as
crystallization of amorphous silicon, modification of glass as an optical wave guide, and any other surface
modification using soft X-rays. In addition, a high-flux photon beam monochromatized with a MLM
monochromator can be useful as a light source of X-ray fluorescence spectrometer which is mounted downstreamof irradiation chamber of BL07A.
Specification
The MLM monochromator constructed in the present study covers an energy range from 80 eV to 800 eV by
combinations of mirror pairs with filter. Soft X-ray is absorbed at the material surface to have high energy, andreflectance is extremely low. The multilayered reflecting mirror stacks a light element and a heavy element in turnand can achieve high reflectance by the borrowed light from the border of the layer interfering it, and strengthening
it. The reflectance is decided at the properties of matter of the multilayer film material, a layer thickness anddepends on the incidence angle to use interference. Three kinds of mirror pairs are prepared for this MLM
monochromator, Mo/Si, Mo/B4C, and Ni/C, whose bilayer spacing , d, are 19.5, 11.2, and 5.1, respectively, andwhose ratios of thickness of metal layer by d spacing, , are 0.22, 0.53, and 0.51, respectively. Incident angle ofthis MLM monochromator can be varied from 4 to 65. The filter is used to eliminate higher energy radiation
included in reflected light from multilayered reflecting mirror. Three kinds of metal foil are prepared as a filter,
Ag , Cr, and Ni, whose thickness are 100, 500, and 500 nm, respectively and their energy of absorption edge are
368 eV (Ag, M-shell), 574 eV (Cr, L-shell), and 852 eV (Ni, L-shell). As a result, the MLM monochromator
constructed in the present study covers an energy range from 80 eV to 800 eV by combinations of three kinds ofmirror pairs with three kinds of filter as summarized in Table 1.

10Table 1 Summary of MLM monochromator
Energy range(eV)

Current[μA]

Mo/Si
Mo/B4C

10000

Filter80-140①Mo/SiNone

125-140②Mo/B4 C

None

50000

140-200①Mo/Si140-360

②Mo/B
4C
40000

260-400

③Ni/C

Ag
Mo/Si
Ag
Mo/B4CAg

Current[μA]15000

Multilayer

30000

400-560③Ni/C

Cr

560-800

③Ni/C
20000

Ni

5000
For the estimationof a photon flux, current detected with a photodiode (PD) was measured. During this10000

experiment, the electron energy of the NewSUBARU ring was 1.5 GeV. Measured PD current was normalized byring current at 300
Figures 1-5 depict normalized PD current at
00 mA, because the ring current decreased with time.
100
150
100
120
140
160
each harmonic light with a kindEnergy[eV]of filter. We can obtained photon flux from thesedata.
Energy[eV]
50000
15000
Current[μA]

Current[μA]

Mo/Si
Mo/B4C

40000

Mo/Si
Mo/B4C

10000

30000
20000

5000

10000
0
100

120

140

0

160

100

Energy[eV]Fig. 1 PD current at 1st harmonic lightwithout filter.
40000

Fig. 2 PD current at 3rd harmonic lightwithout filter.

Mo/Si
Mo/B4C
Ni/C

Mo/B4C
Ni/C

Current[μA]20000

Current[μA]

30000

150
Energy[eV]

20000

10000

10000
0

200

0

300

250

300
Energy[eV]Energy[eV]Fig. 3 PD current at 3rd harmonic lightwith a Ag filter.

Fig. 4 PD current at 5st harmonic lightwith a Ag filter.

30000
Mo/B4C
Ni/C
Current[μA]

20000

10000

0

250

300

350

Energy[eV]Fig. 5 PD current at 7st harmonic light with a Ag filter.

11

350

Construction of X-ray fluorescence spectrometerin the Ultra-soft X-ray region
H. Takamatsu1, K. Kidena1, K. Kanda1, and S. FUKUSHIMA2
1
LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Ako, Hyogo 678-1205 Japan
2
National Institute for Materials Science, 1-2-1 Sengen, Tsukuba-shi, Ibaraki, 305-0047, Japan
Abstract
We constructed a ultra-soft X-ray spectrometer, which can be measured
in the range of ultra-soft X-rays of about 33-470 eV at the undulator line
BL07A. The high-flux and high-resolution is performed by the use of two
kinds of spherical varied-line spacing gratings, a poly-capillary, and abackside illumination type CCD camera. This spectrometer is expected
to a high-resolution analysis of light-elements, light-metals, andtransition metals.
Introduction
An X-ray fluorescence (XRF) spectrometer is used for routine, relatively
non-destructive chemical analyses of industrial materials, biological materials, andenvironmental materials. The analysis of major and trace elements in samples by X-ray
fluorescence is made possible by the behavior of atoms when they interact withradiation. When materials are excited with X-rays, they can become ionized. If theenergy of the radiation is sufficient to dislodge a tightly-held inner electron, the atom
becomes unstable and an outer electron replaces the missing inner electron. When thishappens, energy is released due to the decreased binding energy of the inner electron
orbital compared with an outer one. The emitted radiation is of lower energy than the
primary incident X-rays and is termed fluorescent radiation. Because the energy of theemitted photon is characteristic of a transition between specific electron orbitals in aparticular element, the resulting fluorescent X-rays can be used to detect theabundances of elements that are present in the sample.
For the measurement of XRF spectra, the use of SR presents especially thefollowing advantages: 1) SR has high brilliance. 2) The excitation energy can be selected
and adapted to the problem. 3) The radiation is linearly polarized. We constructed the
SR-XRF setup at BL07A in the NewSUBARU facility. BL07A has a 3-m undulator as alight source and a high-photon flux and energy tunable light is supplied from amultilayered-mirror monochromator in the energy range from 50 eV to 800 eV. .
Specifications
Undulator light dispersed by a MLM monochromator was introduced to a
Cr-coated planer mirror Cr mounted upstream XRF spectrometer to eliminate the highenergy light higher than 500 eV, especially for oxygen, from the MLM monochromator.
A schematic view of the XRF spectrometer is shown in Fig. 1. Reflected light at theplane mirror was incident to a sample. The fluorescent radiation in the ultra-soft X-ray

12

region was c focused onto aslit using the poly-capillary,
whose beam spot was ≈1 mm
diameter.
Dispersed
ultra-soft X-rays by a gratingwere detected with a CCD
camera. This spectrometercan measure the range ofultra-soft X-rays of about
33-470 eV.
This
spectrometerhas three characteristics. At
first, two kinds of spherical
VLS (varied line spacing)gratings designed with
Fig. 1 A schematic view of the ultra-soft X-ray fluorescenceequal focal curves are used
spectrometerasthedispersion
components. By using an appropriate grating properly by the energy range, XRF
spectra can be obtained easier than a use of a single grating. The second feature is theuse of a poly-capillary as the input component of the spectrometer. Using a
poly-capillary, it is possible to increase the effective capturing angle of the ultra-soft
X-rays, such that the ultra-soft X-rays can be efficiently converged and the detection
efficiency increases. Moreover, the slit can be positioned on the poly-capillay’s focus
point to get the X-rays dispersed by gratings. The picture of the tip of the poly-capillary
is shown in Fig. 2. The final feature is the use of backside illumination type CCD
camera. This CCD camera has not a movable part and can detect the X-rays dispersedby the grating. The dispersion direction of the grating is set precisely to match thedirection of the pixel lines on the projection plane. This setting made it possible toobtain the spectrum of ultra-soft X-rays because this measures the total signal strengthof a pixel line perpendicular to the distributed direction. At the last, the specifications of
the main components of the spectrometer are listed in Table 1.

Fig. 2 The photograph of the tip of a poly-capillary

13

Table 1. The specifications of the main components of the spectrometer
grating
flat field spherical varied line spacing typeRadius of curvature: 6005 mm
braze angle: 1.7 ± 0.3o
the incidence angle: 87.19o
the incidence focal length: 240 mm
the injection focal length: 300 mm
size: 52×32 mm
grating 1 (33 eV–140 eV)
the number of the central fissure line: 300 Lmm-1
grating 2 (106 eV–470 eV)
the number of the central fissure line: 1090 Lmm-1
poly-capillarycollective solid angle: 0.072 Sr.
input focal distance: 19.75 mm
output focal distance: 215 mm
CCD camera
Roper SC-1300B (back side illuminated type)
number of pixel: 1340×1300
pixel size: 20 µm×20 µm
detection area size: 26.8 mm×26 mm
slit
1mmφ, 100 µm×2 mm, 50 µm×2 mm, 2 mmφ (full open)
vacuum system
magnetic-levitating turbo-molecular pump
spectrometer chamber: ~1×10-5 Pa, sample chamber : ~1×10-7 Pa

14

BL05 Operating Status
T. Hasegawa1, M. Uemura1, N. Fukada1, N. Umesaki2 and K. Kanda2
1 Synchrotron Analysis L.L.C., 3-2-24 Wadamiya-dori, Hyogo-ku, Kobe, Hyogo 652-0863 Japan
2 LASTI, University of Hyogo, 3-1-2 Koto Kamigori, Ako, Hyogo 678-1205 Japan
Abstract
A material analysis beamline for the industrial enterprises’ use was completed at BL05 in March
2008. This beamline is constructed on the basis of strong demand of industrial users for X-ray
absorption fine structure (XAFS) spectroscopy. The used time of BL05 increased steadily every
year. BL05 was broadly upgraded corresponding to the user’s demands. This upgrading was
expected to increase used time and to expand the industrial users.
Introduction
BL05 consists of two branch lines, one is a double crystal monochromator beamline (BL05A) for the use in
the higher-energy region (1300-4000 eV) and the other is a varied line spacing plane grating (VLSPG)
monochromator beamline (BL05B) for the use in the lower-energy region (50-1300 eV) [1]. These branches canbe operated simultaneously. BL05 is managed and maintained by the Synchrotron Analysis L.L.C. (SALLC),
which is composed of the industrial companies, in cooperation with the staffs of the Laboratory of Advanced
Science and Technology for Industry in University of Hyogo.
1.

BL05 Operating Status
The operation for public use of BL05 has
started since 2008. In Fig.1, used time ofBL05 is shown. The used time of BL05
increased every year. This beamline can beused as a trial use from 2010, which is
supported from the ministry of education,
cultur, sports, science and technology. Total
used time, which included paid use and trialuse, reached for 185 hours at total time of
2011, and broke through 200 hours in 2012.
The used time of 2013 exceeded that of theprevious year, although machine time of New
SUBARU decreased due to the repair ofSPring-8. The upgradings of BL05,
installation of the calculation and combination
type double crystal monochromator , systemsof measurement in an in-situ environment,
introduction systems for anaerobic sample,
and the operation of beamline optics byremote control, were completed in 2014.

Fig.1. Transition of used time of BL05.

2.

The training program for industrial
researchers
For the purpose of enhancement theanalytical skills using synchrotron radiation ofindustrial enterprises, we have opened thetraining program for industrial researchers from2011 in cooperation with local public body etc(Fig.2). This program is covered not only lessonin the classroom, but hands-on practice ofanalysis using beamline. Some of the companies
that participated in the program, used BL05 as apaid use.
Reference[1] T.Hasegawa et al., Advances in X-ray Chem.
Anal. Jpn., 41, pp.99-106 (2010) [in Japanese].

Fig.2. Hands-on practice of analysis usingsynchrotron radiation.

15

Recent upgrade of 15MeV Electron Linear
Accelerator LEENA for THz Radiation Sources
S. Hashimoto, K. Kobayashi, K. Kawata, Y. Minagawa#, Y. Takemura#, S. Amano and S. Miyamoto
LASTI, University of Hyogo#
JASRI
Abstract
The 15MeV electron linear accelerator LEENA has been upgraded towards tunable andhigh-power tera-hertz (THz) light sources using relativistic electrons. Recently we installed asolenoid coil for electron beam focusing and an OTR monitor for beam profile measurement.
And also we constructed a THz beam-line for user experiments.
Introduction
In the building of NewSUBARU synchrotron light facility, we are developing tunable andhigh-power THz radiation sources using relativistic electron beams from a 15 MeV compact
linear accelerator LEENA [1].
Synchrotron radiation from a bending magnet andSmith-Purcell radiation from a metal grating have been successfully observed in THz regime.
A general layout of LEENA is shown in Fig. 1. Main parameters of the accelerator are shownin Table 1. If the electron bunch length is shorter than the wavelength of radiatedelectromagnetic wave, the electron beam coherently emits high-power radiation. In the lastyear several components of LEENA have been upgraded; (1) the installation of a solenoid magnet forfocusing electron beam radius just after an electron gun, (2) the installation of OTR monitor for measuring
electron beam profile and (3) the construction of THz beam-line.

Table 1.

Main parameters of LEENA accelerator.

Beam energy

6 – 15MeV

Macro pulse current

100mA

Macro pulse width

5µs

Repetition rate

1-10Hz

RF frequency

2856 MHz

Normalized emittance< 10πmm-mrad

Energy spread<±0.5%@15MeVElectron gun

RF gunCathodeLaB6 (thermal)

THz radiation sources

Bend, Smith-Purcell

Radius Curvature (BM3)

0.2m

Fig.1

Layout of LEENA.

Solenoid magnet for electron beam focusing
One of problems on beam operation was the beam divergence at low energy region just after an electrongun. In order to correct the divergence of the beam radius, a new water-cooled solenoid coil of 22500
AmpereTurns as shown in Fig.2 is designed and installed at 10cm downstream of the RF electron gun. The
maximum current of 300A generates
magnetic field of 0.37T. Outside of
the coil is covered with an iron plate of
5mm thickness to prevent the magnetic
field from leaking. Figure 2 also
shows the magnetic field calculatedusing POISSON code [2] with
two-dimensional axial symmetry. It
founds that field components on acathode of the RF gun, which causes
beam emittance growth, is very weak.
Fig.2 Solenoid coil (left) and 2D axial symmetric magnetic field
With fine-tuning of the solenoid field,
calculated using POISSON code (right).
beam current loss became very small.

16

OTR monitor for measuring beam profile
When an electron passes through a surface of a thin metal film
such as aluminum, the transition radiation is observed due to thedifference of the dielectric constants of the vacuum and the metal.
The transition radiation in the optical regime is commonly used as anelectron beam monitor in linear accelerators (Fig. 3). Changing
focal length of CCD camera lens, both the spot size and thedivergence angle of an electron beam pulse can be measured.
The installed film is aluminum of thickness 12 um. An
Fig.3 Optical Transition Radiation
IEEE1394 camera observes the OTR of 5 us time duration in(OTR).
synchronization with the electron beam. The acquired CCD image
data is transferred to a PC and the application software developed by
LabVIEW performs the real-time image processing and beam parameters can be evaluated as shown in Fig.
4.
Beam size measured using the OTR monitor is 0.8 mm in horizontal and 0.24 mm in vertical. And themeasured beam divergence is 52 mrad in horizontal and 150 mrad in vertical. Thus the measured
normalized emittances of 13.2π mm-mrad in horizontal and 11.5π mm-mrad in vertical are wellcorresponding to the designed value of 10 πmm-mrad. The OTR monitor is useful tool for the optimizationof beam parameters towards the THz light source.

	 	
 Fig.4 Observation of Optical Transition Radiation (OTR). Beam spot image and data fitting in verticaldirection (left). Beam divergence and data fitting in vertical direction (right).

THz beam-line for user experiments
THz radiation was previously measured inside
the concrete tunnel for the radiation protection. It
was inconvenient to stop the machine every time
we enter the tunnel for measurement setup.
In the newly constructed beam-line, THz
radiation from the bending magnet is focused andtransmitted using two curved-mirrors through apenetration hole in the concrete wall to the next
experimental room, where an optical table isequipped for user experiment.

Fig.5

THz beam-line.

Recent operation status and future plans
The beam operation of LEENA has been stopped since January 2014 because of the failure of ahigh-voltage power supply for the RF klystron. The beam operations towards the generation of the coherent
THz radiation by the short-bunched electron beams would be resumed after completion of the repair.
References[1] S.Hashimoto et al., IEEJ Transactions on Electronics, Information and Systems, vol.134 No.4 pp.495-501(2014)[2] K. Halbach and R. F. Holsinger, Particle Accelerators 7, pp.213-222 (1976)17

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