MNC 2022 (November 8-11, JR Hotel Clement Tokushima, Tokushima, Japan) Schedule
Tuesday, November 8
Room B (Kinsen West) (3F)Technical Seminar in Japanese Registration Desk
November 8, 12:30 - 16:00 (3F Lobby)

13:00-16:45 MNC 2022 Technical Seminar in Japanese
Bellevue (18F)

Conference Registration Desk
November 8, 13:30 - 18:30 (3F Lobby)
November 9, 8:30 - 17:30 (3F Lobby)
November 10, 8:30 - 17:00 (3F Lobby)
November 11, 9:00 - 15:30 (3F Lobby)

17:15-19:15 Get Together Party

Wednesday, November 9
Room P1 (Clement Hall, Middle and West) (4F)
9AP-1: Opening & Plenary Session 9:30-12:10
12:20-13:00 Luncheon Seminar by Technical Exhibitor
Room A (Kinsen East) (3F) +On-line
9A-2: 13:30-15:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography I

Room B (Kinsen West) (3F)

Room C (Harmony Hall) (3F)

9B-2: 13:30-15:10
9C-2: 13:30-15:40
Symp. C: Micro and Nanotechnology for Symp. B: Frontlines of atomic layer
Detecting Bioinformation I
processing researches andexpectations for novel precursor
materials IRoom D (Seifu and Kunpu) (3F)
9D-2: 13:30-14:30
Organic Nanomaterials I

Lobby (3F)
Coffee Break
9B-3: 15:10-16:40
9A-3: 15:30-17:00
Symp. A: Emerging Breakthroughs in Symp. C: Micro andMaterials, Processes and Equipment Nanotechnology for Detecting
Bioinformation I
for Advanced Lithography II

9C-3: 16:10-17:50
Symp. B: Frontlines of atomic layer
processing researches andexpectations for novel precursor
materials II
Lobby (3F)

9D-3: 15:00-16:00
Organic Nanomaterials II

Coffee BreakRoom A (Kinsen East) (3F) +On-line

Room C (Harmony Hall) (3F)

9A-4: 17:15-18:45
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography III

9C-4: 18:00-18:45
Symp. B: Frontlines of atomic layer
processing researches andexpectations for novel precursor
materials, Panel Discussion

Room D (Seifu and Kunpu) (3F)
9D-4: 16:30-17:30
Nanostructures

Thursday, November 10
Room A (Kinsen East) (3F) +On-line
10A-1: 9:00-10:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography IV

Room B (Kinsen West) (3F)
10B-1: 9:00-10:30
Nanodevices

Room C (Harmony Hall) (3F)
10C-1: 9:00-10:40
BioMEMS, Lab on a Chip I

Room D (Seifu and Kunpu) (3F)
10D-1: 9:00-10:30
Nanofabrication I

Lobby (3F)

Room P2 (Clement Hall, East) (4F)
10P-1: 9:30-11:30
Poster Session 1(1)Nanocarbons, (2)Organic
Nanomaterials and (3)Atomic Layer
Processing (ALP)

Coffee BreakRoom A (Kinsen East) (3F) +On-line
10A-2: 11:00-12:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography V

Room B (Kinsen West) (3F)
10B-2: 11:00-12:20
Electronic Devices

Room C (Harmony Hall) (3F)
10C-2: 11:00-12:30
BioMEMS, Lab on a Chip II

Room D (Seifu and Kunpu) (3F)
10D-2: 11:00-12:50
Nanofabrication II

Lunch
Room A (Kinsen East) (3F) +On-line
10A-3: 13:30-15:00
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography VI

Room B (Kinsen West) (3F)
10B-3: 13:30-14:50
CNTs

Room C (Harmony Hall) (3F)
10C-3: 13:30-14:30
Mirosystem Technology and MEMS I

Room D (Seifu and Kunpu) (3F)

10P-2: 13:30-15:30
Poster Session 2(4)Inorganic Nanomaterials,and(5)BioMEMS, Lab on a Chip, andNanobiotechnology and10D-4: 15:30-17:40
Inorganic Nanomaterials I

10P-3: 16:00-18:00
Poster Session 3(2)Nanodevices and(4)Nanoimprint, Hybrid-NIL,
Biomimetics, and Functional
Surfaces,

Lobby (3F)
Coffee Break
10A-4: 15:00-16:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography VII
10A-5: 17:00-18:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography VIII

10B-4: 15:20-16:40
CNTs & graphene

10C-4: 15:30-16:30
Mirosystem Technology and MEMS II

Room P2 (Clement Hall, East) (4F)

10D-3: 14:00-15:00
Nanofabrication III

Room P2 (Clement Hall, East) (4F)

Room P1 (Clement Hall, Middle and West) (4F)
18:40-20:40 Banquet

Friday, November 11
Room A (Kinsen East) (3F) +On-line
11A-1: 9:00-11:10
Nanoimprint, Hybrid-NIL, Biomimetics,and Functional Surf

Room B (Kinsen West) (3F)
11B-1: 9:00-10:30
TMDCs I

Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

11C-1: 9:00-10:30
Inorganic Nanomaterials II

Lobby (3F)
Coffee Break
11A-2: 11:30-12:20
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography IX

11B-2: 11:00-12:00
TMDCs II

11C-2: 11:00-12:20
Inorganic Nanomaterials III

Lunch
11A-3: 13:30-14:30
Symp. A: Emerging Breakthroughs inMaterials, Processes and Equipment for
Advanced Lithography X

Lobby (3F)
Coffee Break
11A-4: 15:00-17:00
Symp. A: Emerging Breakthroughs in Materials, Processes and Equipment for
Advanced Lithography XI, Panel Discussion11D-1: 11:10-12:20
NanoTool

Room P2 (Clement Hall, East) (4F)
11P-4: 9:00-11:00
Poster Session 4(1)Advanced Lithography andPatterning, (2)Electron and Ion BeamTechnologies, (3)Patterning Materials,(4)Nanofabrication (5)NanoTool and(6)Microsystem Technology andMEMS