MNC 2022 (November 8-11, JR Hotel Clement Tokushima, Japan) Program
Keynote (On-demand), You can watch the video file from My Page of the Registration Site
Keynote-11
Masks and Pellicles for HVM EUV
Lithography (Keynote)
Jinho Ahn, Hanyang University, Korea

Keynote-12
Electron beam lithography inprocesses forelectron/Opto/terahertz devices(Keynote)

Keynote-13
Stochastic effects in lithography:
the ultimate resolution limit?
(Keynote)
Peter De Bisschop, Imec, Belgium

Yasuyuki Miyamoto, Nobuhiko
Nishiyama and Safumi Suzuki,
Tokyo Inst. of Technol.., Japan

Keynote-21
Quantum transport and robotic
assembly of van der Waals
junctions of 2D materials(Keynote)
Tomoki Machida, Univ. of Tokyo, Japan

Keynote-22
Semiconductor-based topological
nanophotonics: fundamentals andrecent progress (Keynote)

Keynote-24
Functional Oxides as a Treasure
Box of Oxide Electronics(Keynote)

Keynote-26
Electronic state analysis with highspatial resolution using STEMEELS (Keynote)

Keynote-4
Application of a Plasmon
Enhanced-field to Bio-detection
with a Plasmonic Chip (Keynote)

Satoshi Iwamoto, Univ. of Tokyo,
Japan

Hitoshi Tabata, Univ. of Tokyo, Japan

Hiroki Kurata, Kyoto University, Japan

Keiko Tawa, Kwansei Gakuin Univ.,Japan

Keynote-6A
Atomic Layer Deposition
Application for EUV Photo Resist(Keynote)

Keynote-6B
Recent Progress of Molecular
Layer-Deposited Inhibitor Using
Metalcone film for Nanoscale
Area-Selective Deposition(Keynote)

Jiyoung Kim, Univ. of Texas, USA

Jin-Seong Park, Hanyang Univ.,
Korea

Tuesday, November 8
Room B (Kinsen West) (3F)
13:00-16:45 Technical Seminar’ in Japanese「最先端デバイスとデータ駆動型開発の可能性」
Bellevue (18F)
17:15-19:15 Get Together Party

Wednesday, November 9
Room P1 (Clement Hall, Middle and West) (4F)
9P-1: Plenary Session I
Chairs: Daiyu Kondo (Fujitsu), Koji Asakawa (KIO Kouji Asakawa (KIOXIA), Kazuaki Furukawa (Meisei Univ.) and Seiji Nagahara (Tokyo Electron)

9P-1-0 9:30-9:50
Opening Remarks: Masao Nagase (Tokushima Univ.), Award Presentation: Masao Nagase (Tokushima Univ.) and Daiyu Kondo (Fujitsu)
Local Announcement from Committee: Katsuhiko Nishiguchi (NTT)
9P-1-1 9:50-10:30
Lithography in a Quantum World (Plenary)
Harry Levinson, HJL Lithography, USA

Coffee Break
9P-1-2 10:50-11:30
Forming Three Dimensional Mesostructures and Exploiting Them in Unusual Microsystems (Plenary) (Online)
John A. Rogers, Northwestern Univ., USA

9P-1-3 11:30-12:10
Everlasting CMOS Innovation: The Future Perspectives (Plenary)Real + Online = Room A

Toshiro Hiramoto, Univ. of Tokyo, Japan

9P-1-4 12:10-13:00
Luncheon Meeting by Technical Exhibitor
CRESTEC CORPORATION
Heidelberg Instruments KK
Institute of Post-LED Photonics, Tokushima University
Altech / Obducat Technologies AB
Room A (Kinsen East) (3F)
Room B (Kinsen West) (3F)and On-line (Zoom)
9A-2: 13:30-15:00
9B-2: 13:30-15:10
Symp. A: Emerging
Symp. C: Micro andBreakthroughs in Materials,
Nanotechnology for Detecting
Processes and Equipment for
Bioinformation I
Advanced Lithography I
Chair:
Chairs:Kazuaki Furukawa (Meisei
Tomoki Nagai (JSR)
Univ.)
Julius Santillan (Osaka Univ.)

9A-2-1
13:30
RECENT PROGRESS OF EUVRESIST DEVELOPMENTFOR IMPROVING CHEMICALSTOCHASTIC (Invited)

9B-2-1
13:30
FLEXIBLE AND ADHESIVEELECTRONICS FOR
DIRECTING LIVING BODY
(Invited)

Toru Fujimori, FUJIFILM, Japan

Toshinori Fujie, Tokyo Inst. ofTechnol.., Japan

Real Session = Room B, C, D

Room C (Harmony Hall) (3F)
9C-2: 13:30-15:40
Symp. B: Frontlines of atomic
layer processing researches
and expectations for novel
precursor materials I

Room D (Seifu and Kunpu) (3F)
9D-2: 13:30-14:30
Organic Nanomaterials I
Chairs:Akito Masuhara (Yamagata Univ.)
Sadahiro Masuo (Kwansai Univ.)

Chairs:Hiroshi Arimoto (AIST)
Fumihiko Hirose (Yamagata Univ.)
9C-2-1
13:30
Atomic layer etching by vapor,radical and IR heating for 3D
device fabrication (Invited)
Hiroto Ohtake, Hitachi High-Tech,Japan

9D-2-1
13:30
Proton Conductive Liquid
Crystalline Polymer Thin Films
with Acrylic Acid Side Chains
Yuya Ishizaki 1, Kazuya Hirata 1, Yuki
Nagao 2, Takahiro Seki 3 andShusaku Nagano 1, 1 Rikkyo Univ., 2
JAIST and 3 Nagoya Univ., Japan

Wednesday, November 9, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
9A-2-2
14:00
Development of rinse materials in
advanced lithography andpatterning (Invited)

Room B (Kinsen West) (3F)
9B-2-2
14:00
Self-folding graphene for 3Dneural interfaces (Invited)

Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

9C-2-2
14:00
Study of gate insulator for GaN
power device using atomic layer
deposition (Invited)

9D-2-2
13:50
Polymeric ionic liquid-coated coreshell type nanoparticles-filled type
polymer electrolyte membrane for
HT-PEFC

Hiroshi Yanagita, Rikio Kozaki, Miho
Yamaguchi, Maki Ishii, and Kazuma
Yamamoto, Merck Electronics, Japan

Koji Sakai 1, Tetsuhiko F. Teshima 2,
Toichiro Goto 1, Hiroshi Nakashima
1 and Masumi Yamaguchi 1, 1 NTT,
Japan and 2 NTT Research
Incorporated, USA

9A-2-3
14:30
Realtime analysis of patternformation during the resist
development process (Invited)

9B-2-3
14:30
Selective detection of odorants(limonene) using inhibition of
enzymatic reaction

9C-2-3
14:30
Thermal atomic layer deposition oflithium phosphorus oxynitride as athin-film solid electrolyte (Invited)

9D-2-3
14:10
Synthesis and Optical Propertiesof Multi-Substituted Keto-Indazole
Derivatives

Julius Joseph Santillan and Toshiro
Itani, Osaka Univ., Japan

Miyuki Tabata 1, Tatsuro Saito 2,
Yasutaka Nishida 2, Atsunobu
Isobayashi 2, Hideyuki Tomizawa 2,
Yuji Miyahara 1 and Yoshiaki
Sugizaki 2, 1 Tokyo Medical and
Dental Univ. and 2 Toshiba, Japan

Satoshi Shibata, PanasonicOperational Excellence, Japan

Ryohei Yamakado, Sota Kuroyanagi,
Shumpei Kikuchi and Shuji Okada,
Yamagata Univ., Japan

9B-2-4
14:50
Redox-labelled Electrochemical
Aptasensors with Nanosupported Cancer Cells

9C-2-415:00
Ferroelectric HfxZr1−xO2-based
capacitors with controlledoxidation surface of TiN bottomelectrodeShuo Li 1, Yannick Coffinier 2,
Chann Lagadec 2, Fabrizio Cleri 2,
Katsuhiko Nishiguchi 3, Akira
Fujiwara 3, Teruo Fujii 1, Soo Hyeon
Kim 1 and Nicolas Clément 1, 1
Univ. of Tokyo, Japan, 2 Univ. deLille, France and 3 NTT, Japan

Toshihide Nabatame, NIMS, Japan

Keisuke Tabata, Haruki Nakazaki,
Tsutomu Makino and Akito Masuhara,
Yamagata Univ., Japan

Takashi Onaya 1,2,3, Toshihide
Nabatame 2, Yukinori Morita 1,
Hiroyuki Ota 1, Shinji Migita 1, Koji Kita
4, Takahiro Nagata 2, Kazuhito
Tsukagoshi 2 and Takashi Matsukawa
1 1 AIST, 2 NIMS, 3 JSPS and 4 Univ.
of Tokyo, Japan

9C-2-5
15:20
Surface reactions ofacetylacetone (acacH) withtransition metal for Atomic Layer
Etching (ALE)
Tomoko Ito, Kazuhiro Karahashi and
Satoshi Hamaguchi, Osaka Univ.,
Japan

Lobby (3F)
Coffee Break (14:10-16:10)
9A-3: 15:30-17:00
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography II

9B-3: 15:10-16:40
Symp. C: Micro andNanotechnology for Detecting
Bioinformation I
Chair:

9C-3: 16:10-17:50
Symp. B: Frontlines of atomic
layer processing researches
and expectations for novel
precursor materials II

Chairs:Seiji Nagahara (Tokyo Electron)
Tetsuo Harada (Univ. of Hyogo)

Atsushi Miura (Hokkaido Univ.)

Chairs:

9A-3-1
15:30
SELF-ASSEMBLY OF
CARBOHYDRATE BLOCKCOPOLYMERS:SUB_10NM
NANOSTRUCTURED THINFILMS (Invited)

9B-3-1
15:10
INTEGRATED BIODEVICESFOR SMART CONTACTLENSES (Invited)

Koichi Tokudome (Tosoh)
Shigeo Yasuhara (JAC)
9C-3-1
16:10
ROOM-TEMPARATURE ATOMICLAYER DEPOSITION AND ITSAPPLICATIONS (Invited)

Takeo Miyake, Waseda Univ., Japan

Fumihiko Hirose, Yamagata Univ.,
Japan

9A-3-2
16:00
High NA EUV: Advantages andProgress update (Invited)

9B-3-2
15:40
Ultra-flexible organic electronics
for health monitoring (Invited)

Jan van Schoot 1, Sjoerd Lok 1, Rob
van Ballegoij 1, Eelco van Setten 1,
Marcel Beckers 1, Ruben Maas 1,
Greet Storms 1, Diederik de Bruin 1,
Rudy Peeters 1, Teun van Gogh 1,
Paul Graeupner 2, Peter Kuerz 2,
Thomas Stammler 2 (Invited)t, 1 ASML
and 2 Carl Zeiss SMT, The
Netherlands

Tomoyuki Yokota, Univ. of Tokyo,
Japan

9C-3-2
16:40
Highly conformal Ru thin films for
emerging interconnect materials
by atomic layer deposition
process using a liquid Ru
precursor with high vapor
pressure (Invited)

Redouane Borsali, University Grenoble
Alpes, France

Yohei Kotsugi 1,2, Youn-Hye Kim 2,
Taehoon Cheon 2, and Soo-Hyun Kim
2, 1 TANAKA Precious Metals, Japanand 2 Yeungnam Univ., Korea

9D-3: 15:00-16:00
Organic Nanomaterials II
Chairs:Akito Masuhara (Yamagata Univ.)
Sadahiro Masuo (Kwansai Univ.)

9D-3-1
15:00
Control of Perovskite Nanocrystal
Assembled Structures Using a
Perylene Bisimide
Supramolecular Aggregate
Naoki Kubo, Mitsuaki Yamauchi and
Sadahiro Masuo, Kwansei Gakuin
Univ., Japan

9D-3-2
15:20
High luminescent perovskite
quantum dot based on bandengineering for light emitting
diode
Ryota Sato 1, Satoshi Asakura 2,
Takayuki Chiba 1 and Akito Masuhara
1, 1 Yamagata Univ. and 2 Ise
Chem., Japan

Wednesday, November 9, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
9A-3-3
16:30
Progress of DUV and EUV lightsource for Lithography, and its
new Application for High density
Packaging of Semiconductor(Invited)
Hakaru Mizoguchi, Hiroaki
Nakarai, Junichi Fujimoto andKouji Kakizaki, Gigaphoton, Japan

Room B (Kinsen West) (3F)

Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

9B-3-3
16:10
Respiration Sensor Measuring
Capacitance Built Across Skin
and Fine Patterning Techniqueon Flexible Film (Invited)

9C-3-3
17:10
Low-temperature atomic layer
deposition of AlN explained byinfrared absorption spectroscopy

9D-3-3
15:40
Studies on stretchable organic
light-emitting material based on
liquid organic semiconductor

Kentaro Saito, Masanori Miura,
Kensaku Kanomata, Bashir Ahmmad,
Shigeru Kubota and Fumihiko Hirose,
Yamagata Univ., Japan

Hikaru Katada 1, Juro Oshima 2,
Takashi Kasahara 3, Yutaro Yamada 3,
Shuichi Shoji 1 and Jun Mizuno 1,4, 1
Waseda Univ., 2 Nissan Chemical, 3Hosei Univ., Japan and 4 Natl. Cheng
Kung Univ., Taiwan

Minoru Sasaki, Toyota TechnologicalInst., Japan

9C-3-4
17:30
Structural change of Ga2O3 film on
GaN(0001) substrate by atomic
layer deposition and postdeposition annealing
Tomomi Sawada 1, Toshihide
Nabatame 1, Makoto Takahashi 2,
Kazuhiro Ito 2,Takashi Onaya 1,
Yoshihiro Irokawa 1, Yasuo Koide 1
and Kazuhito Tsukagoshi 1, 1 NIMS, 2
Osaka Univ., Japan

Lobby (3F)
Coffee Break (15:40-17:15)
9A-4: 17:15-18:45
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography III
Chairs:Sachiko Kobayashi (Kioxia)
Julius Santillan (Osaka Univ.)

9A-4-1
17:15
High-power EUV free-electron
laser for future lithography(Invited)
Norio Nakamura, KEK, Japan

9A-4-2
17:45
The Multi Trigger Resist System
for EUV Lithography (Invited)(Online)C. Popescu, G. O' Callaghan, A.
McClelland, C. Storey, J. Roth, E.
Jackson and A.P.G. Robinson, Univ. ofBirmingham, UK

9A-4-3
18:15
EUV Lithography patterning:
status and challenges towards
High-NA (Invited)
Danilo De Simone, IMEC, Belgium

9C-4: 18:00-18:45
Symp. B: Frontlines of atomic
layer processing researches
and expectations for novel
precursor materials III
Panel Discussion

9D-4: 16:30-17:30
Nanostructures

Coordinator
Fumihiko Hirose, Yamagata Univ.,
Japan

9D-4-1
16:30
Demonstration of GaN:Eu/GaN
nanowire LEDs towards
realization of flexible light-emitting
devices

Panelists
Satoshi. Shibata PanasonicOperational Excellence, Japan
Toshihide Nabatame, National Instituteof Materials Science, Japan
Fumikazu Mizutani, Kojundo Chemical
Lab., Japan
Jiyoung Kim, University of Texas, USA
Jin-Seong Park, Hanyang University,
Korea
Hiroto Ohtake, Hitachi High-Tech,Japan

Chairs:

Shigeo Asahi (Kobe Univ.)
Takeshi Yanagida (Univ. of Tokyo)

T. Otabara, J. Tatebayashi, T.
Yoshimura, D. Timmerman, S.
Ichikawa and Y. Fujiwara, Osaka Univ.,
Japan

9D-4-2
16:50
Study on the shape of high aspectratio polymer microneedles
Mizuki Inada 1, Yukihiro Kanda 1,
Hiroaki Takehara 1,2, and Takanori
Ichiki 1,2, 1 Univ. of Tokyo and 2
iCONM, Japan

9D-4-3
17:10
Electrical characteristics of p-CuO
nanowire/n-TiO2 thin film
heterojunctions fabricated bystress-induced migration
Yoshinari Kimura and Hironori
Tohmyoh, Tohoku Univ., JapanThursday, November 10, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
10A-1: 9:00-10:30
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography IV

Room B (Kinsen West) (3F)

Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

10B-1: 9:00-10:30
Nanodevices

10C-1: 9:00-10:40
BioMEMS, Lab on a Chip I

10D-1: 9:00-10:30
Nanofabrication I

Chairs:Yuuichiro Mitani (Tokyo City Univ.)
Takahisa Tanaka (Univ. of Tokyo)

Chairs:Atsushi Miura (Hokkaido Univ.)
Shinya Kumagai (Meijo Univ.)
Akira Matsumoto (Tokyo Medical and
Dental)Chairs:Hirofumi Tanaka (Kyushu Inst. ofTechnol.)

10A-1-1
9:00
Focus e ects through pitch andabsorber choice for EUV random
logic (Invited) (Online)

10B-1-1
9:00
NEMS-based universal
quantum computer (Invited)(Online)10C-1-1
9:00
Design of Airborne Virus Sampler
with Micro-holes for Versatile andSimple Detection

10D-1-1
9:00
Fabrication of nanopore devices
for Exosomes (Invited)

Martin Burkhardt, Zheng Chen, ScottHalle, Romain Lallement and Stuart
Sieg, IBM Res., USA

Motohiko Ezawa, Shun Yasunaga,
Akio Higo, Tetuya Iizuka and Yoshio
Mita, Univ. of Tokyo, Japan

M. Miyazaki 1, K. Takenaka 1, T. Irie 1,
N. Kumazaki 1, T. Tomiyama 1 and H.
Ito 2, 1 Hitachi and 2 Fujita Health
Univ., Japan

10A-1-2
9:30
Lithography Advancement
enabling High‐Performance andAdaptive Computing (Invited)

10B-1-2
9:30
Magnetization Switching in
CoFe/MgO Nanolayer Patterns
on GaAs (001) Substrates

Toshiyuki Hisamura, AMD, USA

Li Zi 1, Wei Dai 1, Masashi Akabori 2
and Shinjiro Hara 1, 1 Hokkaido
Univ. and 2 JAIST, Japan

10C-1-2
9:20
On-chip synthesis of metal
complex by microwave heating ina microchannel embedded in the
post-wall waveguide

Chairs:Kouji Asakawa (KIOXIA)
Tomoki Nagai (JSR)

10A-1-3
10:00
Controlling EUV resist stochastics(Invited)
Greg Denbeaux, Nabihah Azhari,
Ruiwen Ai, Benjamin Kahl, Micah
Painter, Zachary Adamson, Ashley
Aldrin, Eshan Dilina, Ankit Choudhary
and Robert L. Brainard, SUNY
Polytechnic Institute, USA

10B-1-3
9:50
Room-temperaturemagnetoresistance in
Ni78Fe22/C8-BTBT/Ni78Fe22
nanojunctions fabricated using
magnetic thin-film edges
Mizuki Matsuzaka 1, Yuma Sasaki 2,
Kyohei Hayashi 1, Takahiro Misawa
2, Takashi Komine 3, Tomoyuki
Akutagawa 4, Masaya Fujioka 2,
Junji Nishii 2 and Hideo Kaiju 1, 1
Keio Univ., 2 Hokkaido Univ., 3
Ibaraki Univ. and 4 Tohoku Univ.,
Japan

10B-1-4
10:10
Thermal and mechanicalproperties of nanocrystalline
silicon and its application to
nano-optoelectromechanicalsystems
J. Maire 1, D. Navarro-Urrios 2, A.
Pitanti 3, A. Martinez 4, C.
Sotomayor Torres 5 and J. Ahopelto
6, 1 I2M, France, 2 Univ. ofBarcelona, Spain, 3 NEST 1I2M,
CNRS UMR5295, France, 2Instituteof Nanoscience andNanotechnology, University ofBarcelona, Spain, 3NEST Lab., Italy,
4 Univ. Politecnica de Valencia,
Spain, 5 ICN2, Spain and 6 VTT
Technical Res. Center, Finland

Kaito Fujitani 1, Mitsuyoshi Kishihara
2, Akinobu Yamaguchi 1 and Yuichi
Utsumi 1, 1 Univ. of Hyogo and 2
Okayama Pref. Univ., Japan

10D-1-2
9:30
Layer Transfer of Ultrathin Ge
Layer Segregated on Al/Ge(111)
Keigo Matsushita, Akio Ohta, Noriyuki
Taoka, Katsunori Makihara and Seiichi
Miyazaki, Nagoya Univ., Japan

10C-1-3
9:40
MICROFLUIDIC DEVICE FOR
PARALLEL CHEMICALSTIMULATION TO LOCAL AREA
OF SINGLE CELL SURFACES

10D-1-3
9:50
Weight and position detection byreservoir inspired in-sensor
computing device made of CNTPDMS nanocomposites

Ryuta Nakamura, Hidekuni Takao,
Fusao Shimokawa, Katsuya Hirano
and Kyohei Terao, Kagawa Univ.,Japan

Kouki Kimizuka, Saman Azhari,
Shuhei Ikemoto, Yuki Usami and
Hirofumi Tanaka, Kyushu Inst. ofTechnol., Japan

10C-1-4
10:00
Microscopic and Raman
spectroscopic study of ice grainsin microchannel depending on its
dimensions

10D-1-4
10:10
Gallium nitride two-dimensional
photonic crystal nanocavities
undercut by a two-step photoelectrochemical etching using
laser sources

Ayane Sato and Tadashi Ishida, Tokyo
Inst. of Technol., Japan

10C-1-5
10:20
Three-dimensional
nanofabrication with UV
lithography of SU-8 for opticallydriven microtools
Keisuke Tano, Masahiko Harada,
Hidekuni Takao, Fusao Simokawa andKyohei Terao, Kagawa Univ., Japan

Lobby (3F)
Coffee Break (10:30-11:00)

Soh Ryuzaki, Hokkaido Univ., Japan

M. Yoshida, S. Sosumi, K. Shimoyoshi,
K. Uchida, and T. Tajiri, Univ. ofElectro-Commun., JapanThursday, November 10, Poster Session 1 (9:30-11:30)
Room P2 (Clement Hall, East) (4F)
Poster Session 1 (9:30-11:30): Nanocarbons & 2D Materials
Chair: Shohei Chiashi (Univ. of Tokyo)
10P-1-1
10P-1-2
10P-1-3
Chemical etching of InP assisted
Exfoliation of Al-residual Ti3C2Tx
Development of direct synthesis of
MXene by using
by graphene oxideh-BN on Si substrate and planar
tetramethylammonium bases
type electron emission device
Wataru Kubota, Toru Utsunomiya,
and conductive film applications
Takashi Ichii and Hiroyuki Sugimura,using graphene/h-BN/Si
heterostructure
Yuki Shibata 1, Emi Saita 1, Masaki
Kyoto Univ., Japan

10P-1-5 Withdrawn
Role of few-layer MoS2 flakes
decorated with carbon quantum
dots for highly stable organic solar
cells

Iwata 1, Yuki Matsunaga 1, Rie
Suizu 1,2, Kunio Awaga 1, Jun
Hirotani 2,3 and Haruka Omachi 1, 1
Nagoya Univ., 2 JST-PRESTO and 3
Kyoto Univ., Japan

Masaya Yamamoto 1,2, Hiromasa
Murata 2, Masayoshi Nagao 2,
Hidenori Mimura 1, Yoichiro Neo 1 and
Katsuhisa Murakami 2, 1 Shizuoka
Univ. and 2 AIST, Japan

10P-1-6
Control of water adsorption
states on suspended SWCNTs

10P-1-7
Extraction of aligned carbon
nanotube layer using exfoliation
processes

Ta-Cheng Wei and Chia-Yun Chen,
National Cheng Kung Univ., Taiwan

Koki Kozaki, Ryotaro Kaneda, Shu
Sato, Keigo Otsuka, Shigeo
Maruyama and Shohei Chiashi,
Univ. of Tokyo, Japan

10P-1-9Amino acids adsorption
characteristics of epitaxial
graphene FETs on SiC substrates

10P-1-10
Theoretical prediction of optimal
thermoelectric properties ofcarbon nanotubes

10P-1-11
Blackbody-like far-infraredemission from electrically biased
graphene on SiC

Sota Yamasaki, Yasuhide Ohno, andMasao Nagase, Tokushima Univ.,Japan

Manaho Matsubara, Kenji Sasaoka,
Takahiro Yamamoto and Hidetoshi
Fukuyama, Tokyo Univ. of Sci.,
Japan

Taichi Kataoka, Takuma Kuhara,
Fumiya Fukunaga, Motoki Ohi, Hayate
Murakami, Yasuhide Ohno and Masao
Nagase, Tokushima Univ., Japan

10P-1-13
One-Step Fabrication of Ni
Nanoparticles Incorporated
Carbon Nanocomposites forSupercapacitor Electrodes at
Room-Temperature

10P-1-14
Synthesis of relatively smalldiameter WS2 nanotubes bysulfurization of poly(ethylene
glycol) treated thin tungsten
oxide nanowires

10P-1-15
Chemical Etching of Silicon
Assisted by PhotochemicallyPatterned Graphene Oxide

Tatsuya Akiyama 1,2, Shuhei Nakanishi
1, Yazid Yaakob 3, Vikaskumar Gupta
1, Bhagyashri Todankar 1, Toru Asaka
1, Yosuke Ishii 1, Shinji Kawasaki 1 andMasaki Tanemura 1, 1 Nagoya Inst. ofTechnol., 2 F.C.C., Japan and 3 Univ.
Putra Malaysia, Malaysia

Md. Ashiqur Rahman 1,2, Yohei
Yomogida 1, Kan Ueji 1, Mai
Nagano 1, Ryoga Tanaka 1,
Yasumitsu Miyata 1 and Kazuhiro
Yanagi 1, 1 Tokyo Metropolitan Univ.,
Japan and 2 Comilla Univ.,
Bangladesh

10P-1-17
Conformal deposition of WS2
layered film by low-temperature
MOCVD

10P-1-18 Withdrawn
Hydrothermally Synthesized
SnO2/RGO Nanocomposite for
Acetic Acid Detection at Room
Temperature

K. Cho 1, N. Sawamoto 1, H. Machida2, M. Ishikawa 2, H. Sudoh 2, H.
Wakabayashi 3, R. Yokogawa 1 and A.
Ogura 1, 1 Meiji Univ., 2 Gas-Phass
Growth and 3 Tokyo Inst. of Technol.,Japan

Norazreen Abd Aziz 1, Mohd Faizol
Abdullah 2, Mohd Rofei Husin 2 andAbdul Manaf Hashim 3, 1 Univ.
Kebangsaan Malaysia, 2 MIMOS
Semiconductor and 3 Univ.
Teknologi Malaysia, Malaysia

Shigeki Saito, Kan Ueji, Yohei
Yomogida and Kazuhiro Yanagi, Tokyo
Metropolitan Univ., Japan

Toru Utsunomiya, Hiroshi Shimakawa,
Wataru Kubota, Takashi Ichii and
Hiroyuki Sugimura, Kyoto Univ., Japan

10P-1-38L
Low-frequency noisecharacteristics by molecularadsorption on graphene devices
Takashi Ikuta 1, Tomohiro Oketa 1,
Hiroshi Masai 2, Takashi Tamaki 3, Jun
Terao 2 and Kenzo Maehashi 1, 1
Tokyo Univ. of Agriculture andTechnol., 2 Univ. of Tokyo and 3 Kyoto
Univ., Japan

10P-1-4
Dark current suppression
achieved by designing 0D/2D all
carbon-based UV photodetectors
with high transparency
Po-Hsuan Hsiao and Chia-Yun Chen,
National Cheng Kung Univ., Taiwan

10P-1-8
Microwave and Infrared
Absorbance of Graphite
Tomoyuki Hamada, Takahisa Ohno
and Jun Nara, NIMS, Japan

10P-1-12
Resistive switching behavior ingraphene-stacked junction
Motoki Ohi 1, Fumiya Fukunaga 1,
Hayate Murakami 1 Hiroyuki
Kageshima 2, Yasuhide Ohno 1 andMasao Nagase 1, 1 Tokushima Univ.
and 2 Shimane Univ., Japan

10P-1-16
Electronic structure of graphene
networks embedded in h-BN
Hui Zhang, Yanlin Gao, Mina
Maruyama and Susumu Okada, Univ.
of Tsukuba, Japan

10P-1-39L
Fabrication and characterizationof CO2 gas sensor with
ZnO/graphene heterojunction
structure
Soon Yeol Kwon, June Soo Kim,
Maeum Han, Seung Deok Kim, Jae
Yong Lee, Noah Jang, Jiajie Wang,
Hyun Jun Kim, Da Ye Kim, Mansoor
Adeeba and Seong Ho Kong,
Kyungpook Natl. Univ., Korea

10P-1-40L
Theoretical Study on theElectronic States of Twisted
Bilayer Graphene
Jun Nara, Tomoyuki Hamada and
Takahisa Ohno, NIMS, Japan

Poster Session 1 (9:30-11:30): Organic Nanomaterials
Chair: Akito Masuhara (Yamagata Univ.)
10P-1-19
10P-1-20
Control of thermal- and photoOne-Dimensional Arrangement
induced self-assemblies via cisof Quantum Dots Using
azobenzene with hydrogen-bondMolecular Assemblies ofmoieties
Cholesterol Derivatives
Erika Kida, Mitsuaki Yamauchi and
Sadahiro Masuo, Kwansei Gakuin
Univ., Japan

Kanako Nakatsukasa, Mitsuaki
Yamauchi and Sadahiro Masuo,
Kwansei Gakuin Univ., Japan

10P-1-21
Photoresponsive Liquid Crystal
Polymer Chains Exhibiting
Random Planar Orientation and
Their Application to In-plane
Photoalignment for Microphase
Separation Structure

10P-1-22
Induced highly ordered smectic
phase in side-chain liquid
crystalline copolymers andpolymer blends withheterogeneous mesogenic
interactions

Shoto Suzuki 1, Yuya Ishizaki 1,
Mitsuo Hara 2, Takahiro Seki 2 andShusaku Nagano 1, 1 Rikkyo Univ.
and 2 Nagoya Univ., Japan

Tatsunaga Nakajima 1, Naoki Hida 2,
Takahiro Seki 2 and Shusaku Nagano
1, 1 Rikkyo Univ. and 2 Nagoya Univ.,JapanThursday, November 10, Poster Session 1 (9:30-11:30)
10P-1-23
Ultra-Thin and Conductive Films
Composed of Single-Walled
Carbon Nanotubes for Dielectric
Elastomer Actuators
Tatsuhiro Horii, Kei Okada andToshinori Fujie, Tokyo Inst. of Technol.,Japan

Room P2 (Clement Hall, East) (4F)
10P-1-24 Withdrawn
10P-1-25
The Characteristics of
DEVELOPMENT OF
ELECTROSPINNING
Temperature Coefficient ofResistance as Phase Transition of
NANOFIBERS CONTAINING
Vanadium Oxides (VOx) thin films
CHITOSAN/PEO AND THEIRANTIBACTERIAL
Junyeop Lee, Youngsam Kim, Dong
PROPERTIES
Geon Jung, Bo Hee Maeng, Jin Beom
Kun-Yauh Shih and Zi-Ting Chen,
Natl. Pingtung Univ., Taiwan

Kwon, Yi Jun Yang, Dong Hyuk Jung,
Yuntae Ha, He Kyung An, Hyun Jeong
Son and Daewoong Jung, KITECH,
Korea

10P-1-27
Broadband terahertz
spectroscopy of enantiomeric
polylactide

10P-1-28
Hydrogen Storage Mechanismin the Graphene NanoflakeLithium-H2 System

S. Ohnishi 1, A. Ebata 1, B. Ohnishi 1,
H. Tsuji 1, S. Tanaka 1, N. Hiroshiba 2
and S. Ariyoshi 1, 1 Toyohashi Univ. ofTechnol., and 2 Osaka Inst. ofTechnol., Japan

Hiroto Tachikawa, Tetsuji Iyama andHiroshi Kawabata, Hokkaido Univ.,
Japan

10P-1-29
Imine-linked porous organic
polymer (POP) and covalentorganic framework (COF) for thetargeted sensing of
neurotransmitters

10P-1-31
Aggregation-induced emission
behavior and its thermal
responsivity of Push-Pull typeazobenzene

10P-1-32
Effect of Curvature on Radical
Addition of Carbon Belt Surface
using DFT

Eriko Machida, Mitsuaki Yamauchi,
Sadahiro Masuo, Kwansei Gakuin
Univ., Japan

Hiroshi Kawabata, Tetsuji Iyama and
Hiroto Tachikawa, Hokkaido Univ.,
Japan

Poster Session 1 (9:30-11:30): Atomic Layer Processing (ALP)
Chair: Fumikazu Mizutani (Kojundo Chemical Lab.)
10P-1-33
10P-1-34
Transition of Ferroelectric and
Evaluation of atomic scale
Antiferroelectric Properties inoxygen etching of Si(110) for
Atomic-Scale-Engineered HfO2
nanosheet transistor application
and ZrO2 Superlattice Films
Yukinori Morita, Shota Nunomura,
Shinji Migita, Shutaro Asanuma, Yuta
Saito, Yukinori Morita and Hiroyuki
Ota, AIST, Japan

Toshifumi Irisawa, Hiroyuki Ota andKazuhiko Endo AIST, Japan

10P-1-37
High Temperature Atomic Layer
Deposition of Zirconium Oxide
using Homoleptic Zirconium
Aminoalkoxide Precursor

10P-1-42L
Plasma-enhanced atomic layer
deposition of zinc oxide thinfilms using a liquid
cyclopentadienyl-based
precursor and oxygen plasma

Akihiro Nishida 1,2, Tomoharu Yoshino
2, Masako Hatase 2, Yoshiki Ooe 2,
Chiaki Mitsui 2, and Yasutaka Matsuo
1, 1 Hokkaido Univ. and 2 ADEKA,
Japan

Fumikazu Mizutani 1, Makoto Mizui
1, Nobutaka Takahashi 1, Mari Inoue2, and Toshihide Nabatame 2, 1
Kojundo Chemical Lab. and 2 NIMS,
Japan

Jose Paul and Jongsung Kim, Gachon
Univ., Korea

10P-1-26 Withdrawn
Perylene-derived hydrophiliccarbon dots with polychromatic
emissions as superior bioimaging
and NIR-responsive photothermal
bactericidal agent
Md Moniruzzaman and Jongsung Kim,
Gachon Univ., Korea

10P-1-30
Emissive liquid crystals based on
fluorene-mesogenic skelton forblue phase photonic crystal
Masanaso Era 1, Yuuki Okazaki 1, andHirotsugu Kikuchi 2, 1 Saga Univ. and2 Kyushu Univ., Japan

10P-1-41L
Molecular Design of Organic
Radical-Functionalized Graphene:
Density Functional Theory (DFT)
Study
Shigeaki Abe 1, Ikuya Watanabe 1 and
Hiroto Tachikawa 2, 1 Nagasaki Univ.
and 2 Hokkaido Univ., Japan

10P-1-35
Atomic layer etching with gas
cluster ion beam of SiNx film forphotoelectron transmittancewindow
Masaya Takeuchi, Reki Fujiwara andNoriaki Toyoda, Univ. of Hyogo, Japan

10P-1-36
Thermal atomic layer deposition of
yttrium fluoride thin films and theirdry etch resistance
Sunao Kamimura 1, Takashi Teramoto
1, Takashi Ono 1, Christian Dussarrat
1, Nicolas Blasco 2, Nicolas Gosset 1
and Gregory Nikiforov 2, 1 Air Liquide
Labs., Japan and 2 Air Liquide
Advanced Materials, USAThursday, November 10, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
10A-2: 11:00-12:30
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography V
Chairs:Hiroshi Yamashita (Nuflare Technol.)Julius Santillan (Osaka Univ.)

10A-2-1
11:00
Patterning concepts using
ultrathin layers (Invited)
Douglas J. Guerrero, Brewer Sci.,
Belgium

Room B (Kinsen West) (3F)
10B-2: 11:00-12:20
Electronic Devices
Chairs:Sanguan Anantathanasarn(Furukawa FITEL)
Munetoshi Seki (Univ. of Tokyo)

10B-2-1
11:00
Room-temperature singleelectron sensor for AC signals
beyond an RC time constant ~Energy transfer via a nonleakage DRAM in nonequilibrium ~Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

10C-2: 11:00:-12:30
BioMEMS, Lab on a Chip II

10D-2: 11:00-12:50
Nanofabrication II

Chairs:Atsushi Miura (Hokkaido Univ.)
Shinya Kumagai (Meijo Univ.)
Akira Matsumoto (Tokyo Medical and
Dental)Chair:
Tsuyoshi Hatano (Nihon Univ.)

10C-2-1
11:00
MICROFLUIDICTECHNOLOGIES FORARTIFICIAL CELL STUDIES(Invited)

10D-2-1
11:00
Quantum transport phenomena in
hBN/graphene moiré superlattices(Invited)
Takuya Iwasaki, NIMS, Japan

Hiroaki Suzuki, Chuo Univ., Japan

Katsuhiko Nishiguchi, Akira Fujiwara
and Kensaku Chida, NTT, Japan

10A-2-2
11:30
INVERSE LITHOGRAPHYTECHNOLOGY (ILT):
30 YEARS FROM CONCEPT TO
PRACTICAL, FULL-CHIP
REALITY (Invited)

10B-2-2
11:20
Carrier trapping characteristicsof fluorographene for nonvolatilememory applications

10C-2-2
11:30
Microfabrication process ofpolymer/metal laminates forbioabsorbable electronics

10D-2-2
11:30
Frequency Dependence ofOperations in a Ag2S Island
Network Reservoir

Linyong(LEO) Pang, D2S, USA

Rino Kawashima, Hiroshi Nohira,
Ryousuke Ishikawa and Yuichiro
Mitani, Tokyo City Univ., Japan

Kazuki Shimada 1, Hiroaki Takehara
1,2, and Takanori Ichiki 1,2, 1 Univ. ofTokyo and 2 iCONM, Japan

Kazuki Minegishi, Yosuke Shimizu andTsuyoshi Hasegawa, Waseda Univ.,
Japan

10A-2-3
12:00
CNT-based pellicles for the next
generation of EUV scanners(Invited) (Online)

10B-2-3
11:40
Extremely-Low-Power RRAM
Array with Triple Tunneling
LayersTakahiro Ueda 1, Marcio D. Lima 1,
Tetsuo Harada 2 and Takeshi Kondo 1,
1 LINTEC OF AMERICA, USA and 2
Univ. of Hyogo, Japan

Kyungho Hong 1, Sungjoon Kim 1,
Tae-Hyeon Kim 1, Hyungjin Kim 2
and Woo Young Choi 1, 1 Seoul
Natl. Univ. and 2 Inha Univ., Korea

10C-2-3
11:50
Development of micro perfusion
system for stable cell culture
utilizing stimuli by non-thermal
atmospheric pressure plasma
exposure

11:50
10D-2-3
Stable analog resistance change
in a Ag-ion controlled moleculargap atomic switch achieved by
reducing a switching area

10C-2-4
12:10
Analytic Formula for a Single Cell
Impedance with the Cell Position
Dependence

12:10
10D-2-4
FABRICATION OF REFLECTIVEMETALENS BY THERMALOXIDATION OF HIGH-ASPECTRATIO SILICON NANOPILLARS

10B-2-4
12:00
Stochastic Modeling of
Cryogenic and Room
Temperature Operation of
ReRAM

Takahisa Tanaka 1, Koichiro
Okamoto 2, Munehiro Tada 2 and
Ken Uchida 1, 1 Univ. of Tokyo and 2
NanoBridge Semiconductor, Japan

Ryota Yamada, Hayata Okino,
Motonari Suzuki and Shinya Kumagai,
Meijo Univ., Japan

Yusuke Sugahara and Shigeyasu Uno,
Ritsumeikan Univ., Japan

Naonari Tanimoto and Tsuyoshi
Hasegawa, Waseda Univ., Japan

Taiyu Okatani, Yuya Naito andYoshiaki Kanamori, Tohoku Univ.,
Japan

12:30
10D-2-5
Development of three-dimensional
periodic nanostructured film using
SU-8 template and solutionderived ZnO for the thermoelectricmaterial
Naoya Miyajima, Itsuki Nakahara andYasuaki Ishikawa, Aoyama Gakuin
Univ., Japan

10A-3: 13:30-15:00
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography VI

10B-3: 13:30-14:50
CNTs
Chairs:Shohei Chiashi (Univ. of Tokyo)
Keisuke Shinokita (Kyoto Univ.)

10C-3: 13:30-14:30
Mirosystem Technology and
MEMS I
Chair:
Ryo Takigawa (Kyushu Univ.)

10D-3: 14:00-15:00
Nanofabrication III
Chair:You Yin (Gunma Univ.)

Chairs:Makoto Sakakibara (Hitachi)
Junichi Yanagisawa (Univ. of Shiga Pref.)10A-3-1
13:30
Inspection and metrology
challenges for lateral gate-allaround device (Invited)
T. Shohjoh 1, M. Isawa 2, G.F. Lorusso
3, N. Horiguchi 3, B. Briggs 3, H.
Mertens 3, J. Bogdanowicz 3, P. De
Bisschop 3, A.-L. Charley 3
1 Hitachi, 2 Hitachi High-Tech, Jaan
and 3 imec, Belgium

10B-3-1
13:30
In situ XAFS analysis ofchemical state of catalyst
particles during single-walledcarbon nanotube growth bychemical vapor deposition

Takahiro Maruyama, Shusaku
Karasawa, Kamal Prasad Shrama,
Shigeya Naritsuka and Takahiro
Saida, Meijo Univ., Japan

10C-3-1
13:30
Soft Pneumatic Finger Integrated
with Laser-Induced Graphene
Bending Feedback Sensor

10D-3-1
14:00
Voice Classification of Ag2Se
Nanowire Network as Reservoir
DeviceChao-Shin Hsu, Yi-Chun Chuang, YuHsin Yen and Yao-Chuan Tsai, Natl.
Chung Hsing Univ., Taiwan

Takumi Kotooka, Yuichiro Tanaka,
Hakaru Tamkoh, Yuki Usami and
Hirofumi Tanaka, Kyushu Inst. ofTechnol., JapanThursday, November 10, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
10A-3-2
14:00
Development of EUV blanks andfuture challenges (Invited)

Room B (Kinsen West) (3F)

Room C (Harmony Hall) (3F)

Room D (Seifu and Kunpu) (3F)

10B-3-2
13:50
Out-of-plane heat and electricalflows in semiconducting singlewalled carbon nanotube films
with sp3 defects

10C-3-2
13:50
A Simulation Environment for
SAE-MEMS Vibration Energy
Harvesters using Electric Circuit
Simulator

10D-3-2
14:20
Fabrication and Characterizationof MoS2 Nanotube Field EffectTransistors

Kan Uej 1, Yohei Yomogida 1,
Takashi Yagi 2, Jana Zaumseil 3,
Kazuhiro Yanagi 1, 1 Tokyo
Metropolitan Univ., 2 AIST, Japanand 3 Univ. Heidelberg, Germany

K. Tokuno 1, T. Naganawa 1, S.
Kinoshita 1, Y. Tanaka 2 and D.
Yamane 1, 1 Ritsumeikan Univ. and 2
Gunma Univ., Japan

10A-3-3
14:30
Actinic patterned mask inspection
for EUV lithography (Invited)

10B-3-3
14:10
Circular dichroism of trion insingle walled carbon nanotubes

Tsunehito Kohyama, Hiroki Miyai and
Toshiyuki Todoroki, Lasertec, Japan

Yuuya Hosokawa, Kan Ueji, Yohei
Yomogida and Kazuhiro Yanagi,
Tokyo Metropolitan Univ., Japan

10C-3-3
14:10
Fabrication and evaluation of
capacitive pressure sensor using
thin film metallic glass

Onoue Takahiro, HOYA Group LSI
Division, Japan

H. Otsuka, T. Ninoseki, C. Oka, S.
Hata and J. Sakurai, Nagoya Univ.,
Japan

10B-3-4
14:30
Highly temperature-tolerant ptype carbon nanotube transistor
doped with 1,4,5,8,9,11hexaazatriphenylenehexacarbo
nitrileYuki Matsunaga 1, Jun Hirotani 2,3,
Haruka Omachi 1, 1 Nagoya Univ., 2
Kyoto Univ. and 3 JST-PREST,
Japan

Lobby (3F)
Coffee Break (14:00-15:30)

Naoya Shiraiwa, Takeshi Ito, Shoso
Shingubara and Tomohiro Shimizu,
Kansai Univ., Japan

10D-3-3
14:40
Electrohydrodynamically driven
pattern formation by tuning a timescale parameter and its
applications
Hyunje Park, Heejoon Chae and Dae
Joon Kang, Sungkyunkwan Univ.,
Korea

Thursday, November 10, Poster Session 2 (13:30-15:30)
Room P2 (Clement Hall, East) (4F)
Poster Session 2 (13:30-15:30): Inorganic Nanomaterials
Chair: Kazuto Hatakeyama (AIST)
10P-2-2
10P-2-1
10P-2-3 Withdrawn
Efficient couplings of solar light ofHigh monodispersity of PbS
ELECTRONIC BAND
quantum dots separated using
STRUCTURE OF LAYERED0D/1D heterostructures featuringhollow fiber membranes
PEROVSKITE NIOBATE
improved photovoltaic
Jun Tanaka 1,2, Sena Suzuki 1, Reo
performances
HCa2Nb3O10

10P-2-4 Withdrawn
Facile synthesis of gelatin-coatedZIF-8 nanocomposites asimproved lithium-storage anodematerials

Zihao Zhang 1, Jun Kano 1, Yutaka
Takaguchi 2, Masahiro Yamagami
1and Tomoko Okubo 1, 1 Okayama
Univ. and 2 Toyama Univ., Japan

Hatta 1 and Kohki Mukai 1, 1
Yokohama Natl. Univ. and 2 Unitika,Japan

Shih-Hsiu Chen and Chia-Yun Chen,
Natl. Cheng Kung Univ., Taiwan

JinHyeok Lee, Won Sik Jung andSang-Wha Lee, Gachon Univ., Korea

10P-2-5
Anomalous Oxide Ion Conductionof BaCe0.5Pr0.3Y0.2O3-δ thin filmwith Mixed Valence States

10P-2-6
Observation of inhomogeneous
carrier generation in a CH₃NH₃
PbBr₃ crystal by femtosecond
transient absorption microscopy

10P-2-7
Physical property modification of
ZnO-based n-type semiconductor
channel materials for tunnel FETs

10P-2-8
Experimental investigation of thelocal bonding states of nitrogendoped SnOx thin-film

Yuki Daimon 1,2, Toyohiro Chikyow 2,
Atsushi Ogura 1 and Takahiro Nagata
1,2, 1 Meiji Univ. and 2 NIMS, Japan

Kotaro Watanabe, Takuma
Kawaguchi, Tomohiro Yamaguchi,
Takeyoshi Onuma, Tohru Honda andShinya Aikawa, Kogakuin Univ., Japan

10P-2-11
Volume control of thermoresponsive gels including
magnetic-nanoparticle

10P-2-12 Withdrawn
Size dependence of the magnetic
properties and spectroscopic
characteristics of chromium-ironspinel nanoparticles synthesized by
combustion method

Takemasa Kadowaki 1, Hideaki
Murasawa 1, Go Notake 1, Kaito Yako
1, Tomoki Wada 1, Daisuke Shiga 2,
Hiroshi Kumigashira 2 and Tohru
Higuchi 1, 1 Tokyo Univ. of Sci. and 2
Tohoku Univ., Japan

10P-2-9
Metal-Insulator-Transition of VO2
fabricated on m-plane sapphire by
mist chemical vapor deposition
Naoki Matsuura, Kazuki Ushioda,
Osamu Kubo, Hiroshi Tabata and
Mitsuhiro Katayama, Osaka Univ.,
Japan

10P-2-13 Withdrawn
GAS PHASE FABRICATION OF
TIN DOPED INDIUM OXIDENANOPARTICLES WITH
MORPHOLOGY CONTROL
Yilun Jiang, Ji'an Chen, Zhengyang
Du, Fei Liu, Peng Mao and Min Han,
Nanjing Univ., China

Yuichi Ikura 1, Yuma Fujita 1,
Yuichiro Akagi 1, Tetsuro Katayama
1,2 and Akihiro Furube 1, 1
Tokushima Univ. and 2 JSTSOHATSU, Japan

10P-2-10
First-Principles Simulation of
Stability and Electronic
Properties in Curved Sheet
Structures of Transition Metal
Dichalcogenides
Koichi Nakamura, Kyoto Univ. of
Advanced Sci., Japan

10P-2-14 Withdrawn
GAS PHASE FABRICAT
TIME-DEPENDENTABSORPTION OF CO BY
LiFeO2 NANOPARTICLESYing-Zhen Chen, Tse-Yen Ting,
Kuan-Ting He, Bing-Heng Xie, ZiHao Huang, Pei-Ying Lin, Aleksandr
Spivakov and Chun-Rong Lin, Natl.
Pingtung Univ., Taiwan

Naoki Okada, Junpei Sakurai, Seiichi
Hata and Chiemi Oka, Nagoya Univ.,Japan

Zi-Hao Huang, Pei-Ying Chuang, Li-Huai
Huang, Aleksandr Spivakov and ChunRong Lin, Natl. Pingtung Univ., Taiwan

10P-2-15
Neuromorphic Learning andForget2ting Functions ofPt⁄Ti0.99Sc0.01O2−δ /Pt Multilayer by
Schottky Barrier Contro

10P-2-16 Withdrawn
MAGNETIC BEHAVIOR OF THE
FACILE SYNTHESIS OF CARBONENCAPSULATED Fe/Fe3C
NANOCOMPOSITE PARTICLES

Mitsuki Taniguchi 1, Tomoasa Takada 1,
Kisara Tomiyoshi 1, Kaito Yako 1,
Daisuke Shiga 2, Hiroshi Kumigashira
2 and Tohru Higuchi 1, 1 Tokyo Univ. ofSci. and 2 Tohoku Univ., Japan

Pei-Ying Chuang, Bing-Heng Xie, Tse-Yen
Ting, Kuan-Ting He, Zi-Hao Huang, PeiYing Lin, Aleksandr Spivakov and ChunRong Lin, Natl. Pingtung Univ., Taiwan

10P-2-26L
Study of factors affecting the stability improvement of electrochromic
devices by preparation conditions of Au nano-particles
M. Hasegawa, Y. Yasuda, F. Koshiji, T. Uchida and K. Yamada, Tokyo
Polytechnic Univ., Japan

Poster Session 2 (13:30-15:30): BioMEMS, Lab on a Chip, and Nanobiotechnology
Chair: Shinya Kumagai (Meijo Univ.) Atsushi Miura (Hokkaido Univ.) and Akira Matsumoto (Tokyo Medical and Dental)
10P-2-17
10P-2-18
10P-2-19
10P-2-20
Flexible Induction Heater Based
Flow length-dependent
Development of Through-Hole
Rapid and Sensitive Detection of
on the Polymeric Thin-film andevaluation of separation andType Nanoblade Array for Single
Candida Mannan Related to
Inkjet-Printed Au Wirings toward
concentration functions of
Cell Dissection
Immune System with a
Local Thermotherapy
microfluidic chips for allergy
Plasmonic Sensor Chip
Kota Ninomiya, Ryotaro Inoue,
testing using pseudo-cells
Hidekuni Takao, Fusao Simokawa andMasato Saito 1, Eiichi Kanai 2, Hajime
M. Yako 1, T. Taichi 1, S. Shimizu 1, K.
Fujita 1, Noriyuki Matsutani 3 andToshinori Fujie 1, 1 Tokyo Inst. ofTechnol., 2 Azabu Univ. and 3 Teikyo
Univ. Hospital, Japan

Shunsuke Shinuchi 1, Koichiro
Kobayashi 2, Yuhki Yanase 3 andKenji Sakamoto 1, 1 Kyusyu Inst. ofTechnol., 2 Natl. Inst. of Technol.,
Oshima College and 3 Hiroshima
Univ., Japan

Kyohei Terao, Kagawa Univ., Japan

Tawa 1 and H. Kurita 2, Kwansei
Gakuin Univ. and 2 Shinshu Univ.,
Japan

10P-2-21
Investigation of Thinning Effect on
Sensitivity of Silicon Nanowire
Biosensor for Ultra-Sensitive andSpecific Biomolecule Detection

10P-2-22
Prototype of a Stacking Biofuel
Cell Using Graphene Coated
Carbon Fiber Cloth

10P-2-23
Development of a highly
stretchable nanofiber-based
colorimetric sensor for harmfulgas detection

10P-2-24
Equivalent circuit analysis of AC
impedance fluctuation measured
across free-standing bilayer lipid
membranes mixed with carbon
nanotubes

Hui Zhang 1, Yawei Qiu 1, Fumiya
Osawa 1, Meiko Itabashi 1, Noriyasu
Ohshima 1, Taira Kajisa 2, Toshiya
Sakata 3, Takashi Izumi 4 and Hayato
Sone 1, 1 Gunma Univ., 2 Toyo Univ.,
3 Univ. of Tokyo and 4 Teikyo Heisei
Univ., Japan

10P-2-25
Spatial Dissection of Fixed Tissue
Slices Using Si Blade Array
DeviceKoki Ueta 1, Taro Shiomi 1, Hidekuni
Takao 1, Fusao Shimokawa 1,
Fumihito Miura 2 and Kyohei Terao 1,
1 Kagawa Univ. and 2 Kyusyu Univ.,Japan

Ryo Matsuoka and Satomitsu Imai,
Nihon Univ., Japan

Bohee Maeng, Dong Hyuk Jeong, Hee
Kyung An and Daewoong Jung,
KITECH, Korea

Daiki Hiramatsu 1, Riku Sato 1,
Masataka Moriya 1, Hiroshi Shimada
1, Daisuke Tadaki 2, Ayumi HiranoIwata 2 and Yoshinao Mizugaki 1,
1Univ. of Electro-Communications and2 Tohoku Univ., JapanThursday, November 10, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
10A-4: 15:00-16:30
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography VII
Chairs:Hiroshi Yamashita (Nuflare Technol.)
Makoto Sakakibara (Hitachi)

10A-4-1
15:00
Electron multi-beam mask writer(Invited) (Online)
Haruyuki Nomura, Jumpei Yasuda,
Hiroshi Matsumoto, Noriaki
Nakayamada and Hiroshi Yamashita,
NuFlare Technology, Japan

10A-4-2
15:30
The EUV Mask Exposed (Invited)(Online)Vicky Philipsen 1, Devesh Thakare
1,2, Ling Ee Tan 1, Dongbo Xu 1, Rik
Jonckheere 1, Mike Cooke 3, Andy
Goodyear 3, Jetske Stortelder 4,
Sascha Brose 5, Qais Saadeh 6 andVictor Soltwisch 6, 1 Imec, 2 KU
Leuven, Belgium, 3 Oxford
Instruments Plasma Technol., UK, 4
TNO, The Netherlands, 5 RWTH
Aachen and 6 PhysikalischTechnische Bundesanstalt, Germany

Room B (Kinsen West) (3F)
10B-4: 15:20-16:40
CNTs & Graphene
Chairs:Haruka Omachi (Nagoya Univ.)
Masaki Tanemura (Nagoya Inst. ofTechnol.)

10B-4-1
15:20
Physical reservoir computing
using electrochemical reaction
at carbon nanotube electrodes

Room C (Harmony Hall) (3F)
10C-4: 15:30-16:30
Mirosystem Technology and
MEMS II
Chair:
Sumito Nagasawa (Shibaura Inst. ofTechnol.)

Room D (Seifu and Kunpu) (3F)
10D-4: 15:30-17:40
Inorganic Nanomaterials I
Chairs:Shu Nakaharai (NIMS)
Yurina Terasawa (Waseda Univ.)

10C-4-1
15:30
Degradation Mechanism
Comparison of Sintered Silver Die
in Thermal and MechanicalCycling Tests

10D-4-1
15:30
Nano/micro-scale phase change
electronics using functionaloxides/2D material
heterostructures (Invited)

Keisuke Wakamoto 1,2, Takukazu
Otsuka 1, Ken Nakahara 1 andTakahiro Namazu 2, 1 ROHM and 2
Kyoto Univ. of Advanced Sci., Japan

Hidekazu Tanaka 1, Shingo Genchi 1,
Azusa N. Hattori 1, Kenji Watanabe 2,
Takashi Taniguchi 2, Shu Nakaharai 2,
Yutaka. Wakayama 2, 1 Osaka Univ.
and 2 NIMS, Japan

10C-4-2
15:50
Modified surface activatedbonding of InP and SiO2 at room
temperature

10D-4-2
16:00
Step-like electric current switchingin VO2/hBN device using
individual metallic domains

Zhang Gufei, Kaname Watanabe and
Ryo Takigawa, Kyushu Univ., Japan

Shingo Genchi 1, Shu Nakaharai 2,
Kenji Watanabe 2, Takashi Taniguchi
2, Yutaka Wakayama 2 and Hidekazu
Tanaka 1, 1 Osaka Univ. and 2 NIMS,
Japan

10B-4-3
16:00
Metal phthalocyanine-modified
graphene FET for highly
sensitive sensing of NO2

10C-4-3
16:10
Development and evaluation of
microwave microfluidic devices
made of PDMS

10D-4-3
16:20
High performance reservoir
computing with interfered spinwave multi-detection

Naoki Yazawa, Takashi Ikuta andKenzo Maehashi, Tokyo Univ. ofAgriculture and Technol., Japan

Ryota Tanaka 1, Tomoyuki Nakano 1,
Kaito Fujitani 1, Mitsuyoshi Kishihara
2, Akinobu Yamaguchi 1 and Yuichi
Utsumi 1, 1 Univ. of Hyogo and 2
Okayama Pref. Univ., Japan

Wataru Namiki 1, Daiki Nishioka 1,2,
Yu Yamaguchi 1,2, Takashi Tsuchiya 1,
Tohru Higuchi 2, and Kazuya Terabe 1,
1 NIMS and 2 Tokyo Univ. of Sci.,Japan

Taro Shingu, Takeshi Watanabe andYutaka Ohno, Nagoya Univ., Japan

10B-4-2
15:40
Fabrication of ultra-thin, carbon
nanotube-based flexible devices
with sacrificial layer of graphene
oxide
Nanaka Yokota, Haruki Uchiyama
and Yutaka Ohno, Nagoya Univ.,
Japan

10A-4-3
16:00
0.33 NA EUV Systems andpellicle for High Volume
Manufacturing (Invited) (Online)

10B-4-4
16:20
Unusual resonance property ofgraphene/h-BN stacked
mechanical resonators

Guido Salmaso, Raymond Maas,
Christophe Smeets, Mark van de
Kerkhof, ASML Netherlands B.V., The
Netherlands

Kazuki Yasoshima 1, Ryo Oishi 1,
Kuniharu Takei 2, Takayuki Arie 2
and Seiji Akita 2, 1 Osaka Pref. Univ.
and 2 Osaka Metropolitan Univ.,
Japan

10D-4-4
16:40
Visible light switching enhanced
high dimensionality in spin wave
interference-based reservoir
computing
Y. Yamaguchi 1,2, W. Namiki 1, D.
Nishioka 1,2, T. Tsuchiya 1, T. Higuchi
2 and K. Terabe 1, 1 NIMS and 2
Tokyo Univ. of Sci., Japan

10D-4-5
17:00
Resistivity Switching Control of
VO2 thin films with Nb-TiO2 andLiCoO2 buffer layers
Kaito Yako 1, Shohei Nishi 1,2, Hiroki
Ito 1, Mitsuki Taniguchi 1, Kisara
Tomiyoshi 1, Tomoasa Takada 1,
Daisuke Shiga 2, Hiroshi Kumigashira2, Tohru Higuchi 1, 1 Tokyo Univ. ofSci. and 2 Tohoku Univ., Japan

10D4-6
17:20
Optimization of N2 concentrationin Ar/N2 sputtering deposition for
p-type N-doped SnOx thin-film
Takuma Kawaguchi, Kotaro
Watanabe, Tomohiro Yamaguchi,
Takeyoshi Onuma, Tohru Honda andShinya Aikawa, Kogakuin Univ., JapanThursday, November 10, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
10A-5: 17:00-18:30
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography VIII
Chairs:Julius Santillan (Osaka Univ.)
Junichi Yanagisawa (Univ. of Shiga Pref.)10A-5-1
17:00
High NA EUVL Resist Metrology(Invited)
Gian Francesco Lorusso 1, Christophe
Beral 1, Janusz Bogdanowicz 1, Danilo
De Simone 1, Mahmudul Hasan 1,
Christiane Jehoul 1, Alain Moussa 1,
Mohamed Saib 1, Mohamed Zidan 1,
Joren Severi 1, Vincent Truffert 1, Dieter
Van Den Heuvel 1, Bappaditya Dey 1,
Sandip Halder 1, Alex Goldenshtein 2,
Kevin Houchens 2, Gaetano Santoro 2,
Daniel Fischer 3, Angelika Muellender3, Joey Hung 4, Roy Koret 4, Igor
Turovets 4, Kit Ausschnitt 5, Chris Mack
6, Tsuyoshi Kondo 7, Tomoyasu
Shohjohg 7,8, Masami Ikota 7, AnneLaure Charley 1 and Philippe Leray 1, 1
imec, Belgium, 2 Applied Materials,
Israel, 3 Carl eiss SMT, Germany, 4
NOVA, 5 David Fikes, Israel, 6 KAC,
USA, 7 Fractilia, USA, 8 Hitachi HighTech, Japan and 9 Hitachi, Japan

10A-5-2
17:30
High-Throughput Scanning Probe
Microscopy for Semiconductor
Metrology and Inspection (Invited)(Online)Irene Battisti 1, Curtis Yu 1, Arseniy
Kalinin 1, Gian Francesco Lorusso 2,
Alain, Moussa 2, Joren Severi 2,
Danilo De Simone 2, Anne-LaureCharley 2, Rudi Wilhelm 1 and Hamed
Sadeghian 1, 1 NearField Instruments,
Netherlands and 2 imec, Belgium

10A-5-3
18:00
Low Landing Energy Electron
Beam Metrology of Thin
Photoresist using AberrationCorrected SEM (Invited)
Mohamed Zidan 1,2, Daniel Fischer 3,
Joren Severi 1,2, Danilo De Simone 2,
Alain Moussa 2, Angelika Müllender 3,
Chris Mack 4, Anne-Laure Charley 2,
Philippe Leray 2, Stefan De Gendt 1,2
and Gian Francesco Lorusso 2
1 KU Leuven, 2 imec, Belgium, 3 Carl
Zeiss SMT, Germany and 4 Fractilia,
USA.

Thursday, November 10, Poster Session 3 (16:00-18:00)
Room P2 (Clement Hall, East) (4F)
Poster Session 3 (16:00-18:00): Nanodevices
Chair: Nobuhiko Ozaki (Wakayama Univ.)
10P-3-1
10P-3-2
10P-3-3Integrated heterostructure ofDemonstration of nanobeam
Magnetic Domain Analysis of Ni
photonic crystal waveguides forphotonic crystal nanocavities
Electrodes Deposited on Different
ultra-small terahertz sourcewith improved Q-factor based
Types of Substrate for Si
applications
on Er,O-codoped GaAs
Nanowire Devices

10P-3-4
Cylindrical membrane made ofenrolled GaAs/AlGaOx core-shell
nanowires through the strain
deformation of shell oxides

Yota Koyama 1, Hisaya Oda 2, Naoki
Ikeda 3, Yoshimasa Sugimoto 3 andNobuhiko Ozaki 1, 1 Wakayama Univ.,
2 Chitose Inst. Sci. Technol. and 3
NIMS, Japan

Zhidong Fang, Jun Tatebayashi,
Hirotake Kajii, Masahiko Kondow
and Yasufumi Fujiwara, Osaka Univ.,Japan

Zhe-rui Gu and Shinjiro Hara,
Hokkaido Univ., Japan

Hidetoshi Hashimoto 1, Takeru
Tanigawa 1, Keisuke Minehisa 1, Kaito
Nakama 1, Kazuki Nagashima 2,
Takeshi Yanagida 2 and Fumitaro
Ishikawa 1,3, 1 Ehime Univ., 2 Univ. ofTokyo and 3 Hokkaido Univ., Japan

10P-3-5
Giant emergent magnetoinductance devices using Ni78Fe22
thin films on polycarbonate
substrates

10P-3-6
Microcontroller-Controlled
Dielectrophoretic Assembly ofGold Nanoparticle Arrays toward
Realization of PhysicalReservoir Devices

10P-3-7
Conductance change
characteristics of ReRAM under
DC voltage pulses with different
off time

10P-3-8Comparative study of roomtemperature deposited ITO and Bdoped In2O3 on PET for flexible
transparent electrode application

C.Y. Huang, M. Tanaka, T. Shimizu, T.
Ito and S. Shingubara, Kansai Univ.,Japan

Shun Mori, Kanta Kibishi, Shinri
Yamadera, Ayumu Nodera, Kotaro
Watanabe, Ichiro Takano and Shinya
Aikawa, Kogakuin Univ., Japan

10P-3-10
Crystal-plane dependence of
CO2 sensitivity on In2O3-basedthin-film transistors

10P-3-11
Improvement of pursuit circuit for
single-electron circuit mimicking
behavior of herd of wolves

10P-3-12
Circular Ferroelectric Tunnel
Junction for Endurance
Improvement

Ayumu Nodera, Shun Mori andShinya Aikawa, Kogakuin Univ.,
Japan

Riku Ogawa and Takahide Oya,Yokohama Natl. Univ., Japan

Dong-Oh Kim 1,2, Kitae Lee 1,
Changha Kim 1, Sihyun Kim 1, HyunMin Kim 1, Daewoong Kwon 3, Woo
Young Choi 1, 1 Seoul Natl. Univ. and
2 Samsung Electronics and 3 Inha
Univ., Korea

10P-3-13 Withdrawn
Development of dual channel
field-effect transistor-based gas
sensor for NO2 and CO2 sensing
applications

10P-3-14 Withdrawn
Simulation of Gated Graphene
Three Branch Junction based
Circuits using Transistor
Compact Model

10P-3-15
Design of signal route switchingcircuit for single-electron circuitwith simple structure

Gurpreet Singh, Sihyeok Kim andKeekeun Lee, Ajou Univ., Korea

Alireza Kalantari, Shaharin Fadzli
Abd Rahman and Abdul Manaf
Hashim, Univ. Teknologi Malaysia,
Malaysia

Yu Matsushima 1, Yuri Ohashi 1, Zijing
Zhang 1, Kazuhiro Yamauchi 1,
Gang Xiao 2 and Hideo Kaiju 1, 1 Keio
Univ. and 2 Brown Univ., USA

10P-3-9
Design for Suppression Electric
Field Crowding at the Bottom of
the Gate Oxide in 1.2 kV SiC
Trench MOSFET
Yeongeun Park, Hyowon Yoon,
Chaeyun Kim, Gwangjae Kim,
Gyuhyeok Kang and Ogyun Seok,
Kumoh Natl. Inst. of Technol., Korea

Yoshinao Mizugaki, Tetsuya Uraeand Hiroshi Shimada, Univ. ofElectro-Communications, Japan

Seiji Tsukada and Takahide Oya,Yokohama Natl. Univ., Japan

Poster Session 3 (16:00-18:00): NanodevicesNanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces
Chair: Jun Taniguchi (Tokyo Univ. of Sci.)
10P-3-16
10P-3-17
10P-3-18
10P-3-19
Two-tone pattern transfer using
Micro-print and nano-imprint
Patterning of Chemically
Friction force measurements ofnanoimprint and silver ink
method using adhesive
Strengthened Glass by Means of
the anisotropic metal microgroove
molecular layers with low
Nanoimprint Lithography (NIL)
structures.
K.Enomoto and J.Taniguchi, Tokyo
Univ. of Sci., Japan
Yohei Shimada, Yuji Hirai andsurface-free-energy andCombined with Reactive Ion
Masatsugu Shimomura, Chitose Inst.
chemisorption
Etching (RIE)

10P-3-20
Similarity of thermal
characteristics of thermoplastics
resin in NIL for machine learningand simulations
Kai Kameyama 1, Yuusei Kunitou 2,
Hiroaki Kawata 2, Masaaki Yasuda 2
and Yoshihiko Hirai 2, 1 Osaka Pref.
Univ. and 2 Osaka Metropolitan Univ.,
Japan

Kanta Kawasaki, Akiko Onuma,
Hiromasa Niinomi and Masaru
Nakagawa, Tohoku Univ., JapanJoão Gaspar 1, Ye Zhou 1, Prasanna
Venkatesh Krishnan 1, Kristian Thulin
1, Patrik Lundström 1, Virginia Soares
2 and Virginia Chu 2, 1 Obducat
Technologies AB, Sweden and 2
INESC Microsistemas eNanotechnologieas, Portugal

10P-3-21
Photo-oxidative decompositionof a fluorinated antisticking
molecular layer monitored bycontact angle measurements
and time of flight secondary ion
mass spectrometry

10P-3-22L
Application of nano imprint to
optical components
Katsutoshi Suzuki, Yoshiko Tanaka,
Koji Ichimura, Dai Nippon Printing,Japan

Kanta Kawasaki, Rie Shishido, Akiko
Onuma, Hiromasa Niinomi and
Masaru Nakagawa, Tohoku Univ.,Japan

Room P1 (Clement Hall, Middle and West) (4F)
Banquet (18:40-20:40)
Awa Odori (Awa Dance) Performanceof Sci. and Technol., Japan

Friday, November 11, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
11A-1: 9:00-11:10
Nanoimprint, Hybrid-NIL,
Biomimetics, and Functional
Surf
Chairs:Jun Taniguchi (Tokyo Univ. of Sci.)
Yuji Hirai (Chitose Inst. of Sci. andTechnol.)

11A-1-1
9:00
Further Improvement andapplication of Nanoimprint
technology for High volume
semiconductor manufacturing(Invited)

Room B (Kinsen West) (3F)
11B-1: 9:00-10:30
TMDCs I

11C-1: 9:00-10:30
Inorganic Nanomaterials II

Chairs:Susumu Okada (Univ. of Tsukuba)
Taishi Takenobu (Nagoya Univ.)

Chairs:Takashi Tsuchiya (NIMS)
Takao Shimizu (NIMS)

11B-1-1
9:00
2D-semiconductor-based
heterostructures (Invited)

11C-1-1
9:00
A perpendicular magnetic
anisotropy in crystallographicallyheterogeneous graphene/L10FePd interface(Invited)

Ryo Kitaura, NIMS and Nagoya
Univ., Japan

Hirotoshi Torii 1, Mitsuru Hiura 1, Yukio
Takabayashi 1, Atsushi Kimura 1,
Yoshio Suzaki 1, Toshiki Ito 1, Kiyohito
Yamamoto 1, Jin Choi 2, Teresa
Estrada 2, 1 Canon, Japan and 2
Canon Nanotechnologies, USA

11A-1-2
9:30
Development of a highperformance, self-cleaning optical
diffuser inspired by Morpho
butterflies
Kazuma Yamashita 1, Takuma Hattori
1,2, Yuji Kuwahara 1,2 and Akira Saito
1,2, 1 Osaka Univ. and 2 RIKEN
SPring-8, Japan

11A-1-3
9:50
Fog water harvester based on
biomimetic hydrophilic andsuperhydrophobic composite
surface
Cheng-Chieh Hsieh and Yao-Chuan
Tsai, Natl. Chung Hsing Univ., Taiwan

11A-1-4
10:10
Barnacle Settlements on the Dotpatterned SAM surfaces

Hiroshi Naganuma, Tohoku Univ.,
Japan

11B-1-2
9:30
Twisted and non-twisted MoTe2
epitaxial domains on
GaAs(111)B
Akihiro Ohtake and Jun Nara, NIMS,
Japan

Wen-Ting Wang 1, Zih-Wei Ye 1,
Henry J. H. Chen 1, Shin-Lun Tseng 2,
Sun-Zen Chen 3 and Tuo-Hung Hou 2,
1 Natl. Chi Nan Univ., 2 Natl. Yang
Ming Chiao Tung Univ. and 3 Natl.
Tsing Hua Univ., Taiwan

11C-1-2
9:30
Angle-Resolved Polarized Raman
Spectroscopy to Study
Ferroelectric Phase Transition of
BaTi2O5
Shinya Tsukada 1, Taichi Esumi 1 andYasuhiro Fujii 2, 1 Shimane Univ. and2 Ritsumeikan Univ., Japan

11B-1-3
9:50
All-dry flip-over stacking of 2D
crystal flakes using polyvinyl
chloride11C-1-3
9:50
Ferroelectric Properties of
Triglycine Sulfate Crystals by
Doping with Glycine Analogues

Momoko Onodera 1, Yusai Wakafuji
1, Taketo Hashimoto 2, Satoru
Masubuchi 1, Rai Moriya 1, Yijin
Zhang 1, Kenji Watanabe 3, Takashi
Taniguchi 1,3, Tomoki Machida 1,2,
1 Univ. of Tokyo and 2
RikenTechnos and 3 NIMS, Japan

Yukana Terasawa 1, Toshio Kikuta 2,
Masaaki Ichiki 3 and Toru Asahi 1, 1
Waseda Univ., 2 Univ. of Toyama, 3
AIST, Japan

Jumpei Watanabe 1, Takayuki
Murosaki 2, Yasuyuki Nogata 3,
Masatsugu Shimomura 1, Yuji Hirai 1,
1 Chitose Inst. of Sci. and Technol., 2
Asahikawa Medical Univ. and 3
CRIEPI, Japan

11A-1-5
10:30
NANOIMPRINT
TRANSFERRING OF
SOLUTION-PROCESSEDINDIUM OXIDE FOR IONSENSITIVE FIELD-EFFECT
TRANSISTOR APPLICATIONSRoom C (Harmony Hall) (3F)

11C-1-4
10:10
Annealing Effect on Ge Nanowire
Growth on Si (111) Substrates byVaper-Liquid-Solid Method
M. Makino 1, S. Okuda 1, D. Goto 1,
W. Jevasuwan 2, N. Fukata 2 and S.
Hara 1, 1 Hokkaido Univ. and 2 NIMS,
Japan

11B-1-4
10:10
Contributing Factors to Heat
Transport in 2D Materials
Marianna Sleezinska 1, Peng Xiao
1,2, Emigdio Chavez-Angel 1,
Alexandros El Sachat 1,3, Stefano
Chaitoglou 3, A. Dimoulas 3 andClivia M. Sotomayor Torres 1,4, 1
ICN2, 2 Univ. Autónoma deBarcelona, Spain, 3 Natl. Center for
Scientific Res. ''Demokritos'', Greeceand 4 ICREA, Spain

11A-1-6
10:50
Investigation of the friction on
Necrophila japonica surface
microstructure
Kazuma Tsujioka 1, Yuji Hirai 2,
Masatsugu Shimomura 2 andYasutaka Matsuo 1, 1 Hokkaido Univ.
and 2 Chitose Inst. of Sci. andTechnol., Japan

Lobby (3F)
Coffee Break (10:30-11:30)

Room D (Seifu and Kunpu) (3F)

Friday, November 11, Poster Session 4 (9:00-11:00)
Room P2 (Clement Hall, East) (4F)
Poster Session 4 (9:00-11:00): Lithography, Metrology and Related Technologies
Chair: Makoto Sakakibara (Hitachi) and Hiroki Yamamoto (QST)
11P-4-1
11P-4-2
11P-4-3
PERFORMANCES OF
Novel EUV light source
Holistic imaging for yield
STEREOPHONIC PROJECTION
fabrication with carbon nanotube improvements enabled by highLITHOGRAPHY USING A
based cold cathode electron
availability, and lowenvironmental
PARABOLLIC MIRROR SET
beam (C-beam)
impact light sources
ILLUMINATED BY COLLIMATED
Sung Tae Yoo and Kyu Chang Park,
James Bonafede, Natallia Karlitskaya,
LIGHT
Kyung Hee Univ., Korea
Thomas Yang, David Manley, PeterOh, Yingbo Zhao, Rajasekhar Rao,
Marc Sells, Josh Thornes, Will Conley,
ASML- Cymer Light Sources, USA

Toshiyuki Horiuchi, Jun-ya Iwasaki andHiroshi Kobayashi, Tokyo Denki Univ.,
Japan

11P-4-5
A new model-based MPC for highNA EUV mask imaging contrast
enhancement
Chun-Hung Liu 1, Ze-An Ding 1 andKuen-Yu Tsai 2, 1 Natl. Taitung Univ.
and 2 Natl. Taiwan Univ., Taiwan

11P-4-6
Water-soluble bio-sourced resist
interactions with fluorine
plasmas in etch lithography
processP. Durin 1, C. Gablin 1, A.
Benamrouche 1, S. Hajjar-Garreau
2,3, A. Teolis 1,4, N. Rochat 4, T.
Géhin 1, S. Trombotto 1, T. Delair
1, I. Servin 4, R. Tiron 4, A. Bazin 4,
O. Sysova 2,3, O. Soppera 2,3, E.
Laurenceau 1, J.L. Leclercq 1, Y.
Chevolot 1, D

Poster Session 4 (9:00-11:00): Nanofabrication
Chair: Kouichi Takase (Nihon Univ.)
11P-4-8
11P-4-9In-materio reservoir computing
Ag2S Island Network Reservoir
based on electrochemicalthat works with Direct Optical
dynamics
Signal Inputs

11P-4-4
Overlay and CD uniformity
variation due to wafer thermal
deformation caused by EUV
exposure
Hee-Chang Ko, Won-Young Choi, JiHyun Jeon, Min-Woo Kim, Da-Kyung
You and Hye-Keun Oh, Hanyang
Univ., Korea

11P-4-7
A method to improve the patternfidelity of parametric point spreadfunction for High-NA EUV mask

11P-4-34L
DIRECT WRITING OF LIQUIDMETALS FOR PRINTEDELECTRONICS

Chun-Hung Liu, Shuen-Ping Wang,
Ze-An Ding, Hsiang-Yi Hsieh, YunChin Li, Chieh-Sheng Lee, AiLing
Chang, Yi-Xuan Chen, Yung-Hsiang
Chang, Yo-Sheng Tung, Bo-Wei Tsai,
Chen-Kai Wen, Wei-Lun Lin and KaiJun Weng, Natl. Taitung Univ., Taiwan

Navid Hussain 1, Tongtong Fu 1,
Gabriel Marques 1, Chittaranjan Das
1, Torsten Scherer 1, Uwe Bog 2,
Lukas Berner 3, Irene Wacker 3,
Rasmus R. Schröder 3, Jasmin
Aghassi-Hagmann 1, Michael Hirtz 1,
1 Karlsruhe Institute of Technology(KIT), 2 n.able GmbH, and 3
Heidelberg University, Germany

11P-4-10
Reservoir performance evaluation
using noise control by lightirradiation

11P-4-11
Effect of a Pinhole in a Molecularlayer on an Operation of
Molecular-Gap Atomic Switches

Yuki Usami 1,2 Yuichiro Tanaka 1,
Takumi Kotooka 1, Hakaru Tamukoh 1,
Takuya Matsumoto 2, Wilfred G. vander Wiel 3 and Hirofumi Tanaka 1, 1
Kyushu Inst. of Technol., 2 Osaka
Univ., Japan and 3 Univ. of Twente,
The Netherlands

Yosuke Shimizu 1, Kazuki Minegishi
1, Hirofumi Tanaka 2 and Tsuyoshi
Hasegawa 1, 1 Waseda Univ. and 2
Kyushu Inst. of Technol., Japan

Masaya Hakoshima, Yuki Usami,
Takumi Kotoka and Hirofumi Tanaka,
Kyushu Inst. of Technol., Japan

Haruki Ishijima and Tsuyoshi
Hasegawa, Waseda Univ., Japan

11P-4-12
Selective bridging and multifunctionalization of graphene
nanoribbon fabricated byunzipping method

11P-4-13Fabrication of single-walledcarbon nanotube/Ag-Ag2S
nanoparticle thin film random
network to realize an in-materio
reservoir computing device

11P-4-14
Magnetic properties of TiO2
nanoparticles pulverlized by a ballmill

11P-4-15
N-Ti Codoped Zn5Sb3Te1
Chalcogenide for Artificial
Synaptic Functional Material

Taiga Yamanouchi , Takuto Nakazawa,
Akihiro Fukawa, Josuke Tamura andKouichi Takase, Nihon Univ., Japan

Takao Fujiwara, Koji Niiyama and You
Yin, Gunma Univ., Jap an

11P-4-18
Room temperature ferromagnetic
behavior in antiferromagnetic
insulator Cr2O3

11P-4-19
MIM diode with HSQ insulating
thin film for optical rectenna

Rikuto Oyabu, W.W. Aji, Yuki Usami,
Hirofumi Tanaka, Kyushu Inst. ofTechnol., Japan

11P-4-16
Magnetic properties of VO2nanoparticles pulverized by a ballmill
Akihiro Fukawa 1, Takuto Nakazawa 1,
Taiga Yamanouchi 1, Josuke Tamura
1, Masanobu Miyata 2, Mikio Miyata 2
and Kouichi Takase 1, 1 Nihon Univ.
and 2 JAIST, Japan

Banerjee Deep, Yuki Usami and
Hirofumi Tanaka, Kyushu Inst. ofTechnol., Japan

11P-4-17
Room temperature
ferromagnetism of ZnO
nanoparticles prepared by amilling treatment
Josuke Tamura 1, Takuto Nakazawa
1, Akihiro Fukawa 1, Taiga
Yamanouchi 1, Tomohiro Shimizu 2
and Kouichi Takase 1, 1 Nihon Univ.
and 2 Kansai Univ., Japan

11P-4-35L
Effect of SiO2 Mask on SelectiveArea Growth of Ge Nanowires on
Si (111) Substrates by VaporLiquid-Solid Method

11P-4-36L Withdrawn
Synthesis of ZrB2@SiC
composite nanoparticle throughsol-gel and carbothermal
reduction

Michiharu Makino 1, Shohei Okuda 1,
Daiki Goto 1, Wipakorn Jevasuwan 2,
Naoki Fukata 2, and Shinjiro Hara 1, 1
Hokkaido Univ. and 2 NIMS, Japan

Gye Seok An 1, Jin Soon Han 2 andSungWook Mhin 1, 1 Kyonggi Univ.
and 2 Hanyang Univ., Korea

Takuto Nakazawa 1, Akihiro Fukawa 1,
Josuke Tamura 1, Taiga Yamanouchi
1, Kyosuke Murata 2, Tomohiro
Shimizu 2, Atushi Yamasaki 3,
Masanobu Miyata 4, Mikio Koyano 4
and Kouichi Takase 1, 1 Nihon Univ. 2
Kansai Univ., 3 Konan Univ. and 4
JAIST, Japan

Takashi Akahane, Keisuke
Yanagisawa, and You Yin, Gunma
Univ., Japan

11P-4-37L
Spherical crystal growth of InSb
and the magnetic property

11P-4-38L
Room temperature
ferromagnetism of In2O3 thin films

Naruya Serizawa, Toshinori Kodama,
Chiehisa Takeoka, Takuto Nakazawa,
Akihiro Fukawa and Kouichi Takase,
Nihon Univ., Japan

Toshinori Kodama, Naruya Serizawa,
Chiehisa Takeoka, Takuto Nakazawa,
Akihiro Fukawa, Josuke Tamura andKouichi Takase, Nihon Univ., Japan

Friday, November 11, Poster Session 4 (9:00-11:00)
Room P2 (Clement Hall, East) (4F)
Poster Session 4 (9:00-11:00):NanoTool
Chair: Osamu Kubo (Osaka Univ.)
11P-4-20
11P-4-21
11P-4-22
MICROSCALE
Detecting nuclear spins in an
Observation of energy transfer
ELECTROPHORETIC
organosilane monolayer using
dynamics in a phycocyanin
DEPOSITION BY USING THE
NV centers for analysis ofprotein crystal by utilizing
VC DISPLAY
precursor self-assembly
femtosecond transient absorption
microscopy
Tatsuki Nomura, Yoshiki Osanai andYuki Ueda 1, Yuto Miyake 1, Kazuki
Takayuki Hoshino, Hirosaki Univ.,Japan

Otani 1, Mastato Tsugawa 1, Daiki
Saito 1, Shuntaro Usui 1, Tokuyuki
Teraji 2, Shinobu Onoda 3, Takahiro
Shinada 4, Hiroshi Kawarada 1,
Takashi Tanii 1, 1 Waseda Univ., 2
NIMS, 3 Natl. Inst. for Quantum Sci.
and Technol. and 4 Tohoku Univ.,Japan

Shuto Ueda 1, Akira Yamamoto 1,
Yuma Fujita 1, Tetsuro Katayama 1,
Akihiro Furube 1 and Yasufumi Umena
2, 1 Tokushima Univ. and 2 Nagoya
Univ., Japan

11P-4-39L
Electrical characterization of
methylated germanane thin-film
transistors
Yuuki Hiraoka, Osamu Kubo, Naoki
Matsuura, Yudai Suzuki, Hiroshi
Tabata and Mitsuhiro Katayama,
Osaka Univ., Japan

Poster Session 4 (9:00-11:00):Microsystem Technology and MEMS
Chair: Daisuke Yamane (Ritsumeikan Univ.)
11P-4-23
11P-4-24
11P-4-25 Withdrawn
Fabrication of LiNbO3/Si bondFlexible Capacitive Tactile
Monolithic integration of GaNSensor Base on Flexible Printed based optocouplerinterface using room temperature
Circuit Board for Tomato
direct bonding
Chengshiun Liou and Chingfu Tsou,
Firmness Detection Application
Seigo Murakami, Kaname Watanabe
Feng Chia Univ., Taiwan

11P-4-26
Effect of Ar Fast Atom Beam
irradiation on alpha-Al2O3 forsurface activated room
temperature bonding

and Ryo Takigawa, Kyushu Univ.,
Japan

Chu-Hsuan Chiu, Yu-Wen Lai, YingChieh Chen and Yao-Chuan Tsai,Natl. Chung Hsing Univ., Taiwan

Ryo Takakura and Ryo Takigawa
Kyushu Univ., Japan

11P-4-27
A novel process of heatgeneration on material surface
applied Al/Ni exothermic reaction
with micro-porous Ni plating

11P-4-28
DEVELOPMENT OF
MICROFLUIDIC-BASEDTASTE SENSOR FOR
DETECTION OF TIMEDEPENDENT TASTE

11P-4-29
Non-invasive Heart Rate
Measurement System Using
Laser Doppler Flowmetry and
Load Sensor for Husbandry
Training

Yuma Kurihara 1, Ryo Takigawa 2,
Fumihiro Sassa 2 and Yusuke
Tahara 1, 1 Shinshu Univ. and 2
Kyushu Univ., Japan

Takumi Hiejima 1, Hirofumi Nogami 1,
Aya Ono 2, Kazuyuki Ban 3, Ryo
Takigawa 1, D.S.V. Bandara 1 andJumpei Arata 1, 1 Kyushu Univ., 2
Omuta City Zoo and 3 Toyohashi Zoo
and Botanical Park, Japan

11P-4-31
High-overtone bulk acoustic
resonator with epitaxial AlN layergrown on n-SiC

11P-4-32
Piezoelectric MEMS Wideband
Acoustic Sensor Coated by
Organic Film

11P-4-33
Plantar pressure measuring
devices powered by flexible allsolid-state batteries

11P-4-40L
MEMS Fabrication Techniques for
Three-Dimensional Origami
Microstructures

Megumi Kurosu, Daiki Hatanaka,
Ryuichi Ota, Keiko Takase, Hiroshi
Yamaguchi, Yoshitaka Taniyasu andHajime Okamoto, NTT, Japan

Hiroyuki Kuchiji 1,2, and Naoki
Masumoto 1 and Akiyoshi Baba 2, 1
Nisshinbou MicroDevices and 2
Kyushu Inst. of Technol., Japan

Muneyasu Suzuki, Kanako Nakajima,
Yoshuyuki Kobayashi, Harutaka
Mekaru and Hirobumi Ushijima, AIST,Japan

Mizuki Mori, Maria Kikuchi and Sumito
Nagasawa, Shibaura Inst. of Technol.,Japan

11P-4-41L
Sheet-typed Micro Robot Hand for
Small Interface Robot with SU-8
Multi-layer Structure,

Hiroto Ikushima 1, Kenji Tanimoto 2
and Shugo Miyake 1, 1 Kobe City
College of Technol., and 2 Kinki
Boushoku, Japan

Yuma Nitta and Sumito Nagasawa,
Shibaura Inst. of Technol., Japan

11P-4-30
Optimization of micro-heatergeometry for improving MEMSbased gas sensor performance
Dong Geon Jung, Junyeop Lee, Bo
Hee Maeng, Jin Beom Kwon, YoungSam Kim, Yi Jun Yang, Dong HyukJung, Yun Tae Ha, Su Ji Choi, Hee
Kyung An, Hyun Jeong Son andDaewoong Jung, KITECH, Korea

Friday, November 11, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
11A-2: 11:30-12:20
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography IX
Chairs:Sachiko Kobayashi (Kioxia)
Tetsuo Harada (Univ. of Hyogo)

11A-2-1
11:30
Advanced Lithography andPatterning Application of DUV
optical maskless scanner for
fabrication of large area device
with high resolution (Invited)
Yoji Watanabe 1, Yuho Kanaya 1,
Yusuke Saito 1, Toshiaki Sakamoto 1,
Soichi Owa 1, Thomas Koo 2,
David Tseng 2, Conrad Sorensen 2,
Stephen Renwick 2, Noriyuki
Hirayanagi 2 and Bausan Yuan 2
1 Nikon, Japan and 2 Nikon Res.of
America, USA

11A-2-2
12:00
High NA EUV CAR and 0.33 NA
MOR stochastic resist modelingconsidered with development
parameters
R. Tsuzuki, X. Liu and K. Oyama,
Tokyo Electron, Japan

Room B (Kinsen West) (3F)

Room C (Harmony Hall) (3F)

11B-2: 11:00-12:00
TMDCs I

11C-2: 11:00-12:20
Inorganic Nanomaterials III

11D-1: 11:10-12:20
NanoTool

Chairs:Atsushi Ando (AIST)
Kazuhiro Yanagi (Tokyo Metropolitan
Univ.)

Chairs:Jun Kano (Okayama Univ.)
Shinya Tsukada (Shimane Univ.)

Chairs:Takayuki Hoshino (Hirosaki Univ.)
Koji Sugano (Kobe Univ.)

11B-2-1
11:00
Observation of carrier dynamics
in MoS2 thin layer by
femtosecond transientabsorption microscopy

11C-2-1
11:00
COEXISTENCE OF SCHOTTKYBARRIER AND SKEWED
ELECTRONIC BANDSTRUCTURE IN
FERROELECTRIC BaTiO3 THIN
FILM

11D-2-1
11:10
Integrative work of nanometricmotor proteins toward
macroscopic power tool (Invited)

Akira Yamamoto 1, Yuma Fujita 1,
Yuichiro Akagi 1, Tetsuro Katayama
1,2 and Akihiro Furube 1,2, 1Tokushima Univ. and 2 JSTSOHATSU, Japan

11B-2-2
11:20
Electric double layer doping in
WSe2/WS2 van der Waals
heterostructure
Rei Usami 1, Koshi Oi 1, Motoki
Matsuno 1, Takahiko Endo 2
Yasumitsu Miyata 2, Jiang Pu 1,
Taishi Takenobu 1, 1 Nagoya Univ.
and 2 Tokyo Metropolitan Univ.,
Japan

11B-2-3
11:40
Gate-dependent carrier
distribution in in-plane
heterostructures of MoS2 andWS2Mina Maruyama 1, Nanami Ichinose
2, Yanlin Gao 1, Ryo Kitaura 2 andSusumu Okada 1, 1 Univ. of
Tsukuba and 2 Nagoya Univ., Japan

11C-2-2
11:20
Effect of Zn solid solution on
defects and electronic structure of
MnS buffer layer for non-polar AlN
growth studied by hard x-ray
photoelectron spectroscopy

11D-2-2
11:40
SENSITIVITY IMPROVEMENT
OF SERS-BASED BIOSENSORSUSING GOLD NANOPARTICLE
DIMER

11C-2-3
11:40
Modification of Electronic
Structure and Defects of β-Ga2O3
Structure by (GaxIn1-x)2O3 Solid
Solution System

11D-2-3
12:00
Transient Responses of Lambda
DNA/YOYO-1 Complex Induced
by Dynamic Virtual Cathode

Takahiro Nagata 1.2, Masaya Morita
1,2, Okkyun Seo 3, Ibrahima Gueye 1,
Keiji Ishibashi 1,4, Kenichiro Takahashi
1,4, Atsushi Ogura 2 and Toyohiro
Chikyow 1, 1 NIMS, 2 Meiji Univ., 3
JASRI and 4 COMET, Japan

Hao Cheng 1,2, Takeshi Hoga 3,
Shigenori Ueda 2, Atsushi Ogura 1,
Toyohiro Chikyow 2 and Takahiro
Nagata 1,2, 1 Meiji Univ., 2 NIMS, 3
Natl. Inst. of Technol, Tsuruoka
College, Japan

Yuma Fujita 1, Yuichiro Akagi 1,
Tetsuro Katayama 1,2 and Akihiro
Furube 1, 1 Tokushima Univ. and 2
JST-SOHATSU, Japan

Chairs:Sachiko Kobayashi (Kioxia)
Tetsuo Harada (Univ. of Hyogo)

11A-3-1
13:30
Development of low-energyelectron-flood-exposure tool
(LEEFET)
Wataru Kusada, Shinji Yamakawa,
Tetsuo Harada and Takeo Watanabe,
Univ. of Hyogo, Japan

Ryuzo Kawamura, Saitama Univ.,
Japan

Shibei Huang 1, Shintaro Yasui 2, Akira
Yasui 3, Eiji Ikenaga 4, Norihiro Oshime
5, Toshio Kikuta 6, Yukana Terasawa 7,
Sou Yasuhara 2, Satoshi Hinokuma 8,
Zihao Zhang 1, Tomoko Okubo 1 and
Jun Kano 1, 1 Okayama Univ., 2 Tokyo
Inst. of Technol., 3 JASRI, 4 IMass, 5
QST, 6 Univ. of Toyama, 7 Waseda
Univ. and 8 AIST, Japan

11C-2-4
12:00
Observation of electronic spectra
modulation in a CH₃NH₃PbBr₃
crystal by utilizing transientabsorption microscopy

Room A (Kinsen East) (3F)and On-line (Zoom)
11A-3: 13:30-14:40
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography X

Room D (Seifu and Kunpu) (3F)Y Yuanzhi Chang, Akio Uesugi, Koji
Sugano and Yoshitada Isono,
Kobe Univ., JapanKen Sasaki and Takayuki Hoshino,
Hirosaki Univ., Japan

Friday, November 11, Oral Session
Room A (Kinsen East) (3F)and On-line (Zoom)
11A-3-2
13:50
Ultra-thick positive photoresist
layers for maskless grayscale
lithography
D. Collé and G. Ekindorf, Heidelberg
Instruments Mikrotechnik, Germany

11A-3-3
14:10
Photoresist stochastic defectgeneration depending on alkalibased developer’s alkyl chain
length and concentration

Masahiko Harumoto 1,2, Andreia
Figueiredo dos Santos 3, Julius Joseph
Santillan 1, Toshiro Itani 1 and Takahiro
Kozawa 1, 1 Osaka Univ. and 2
SCREEN Semiconductor Solutions,Japan and 3 SCREEN SPE, Germany

Lobby (3F)
Coffee Break (14:30-15:00)
Room A (Kinsen East) (3F)and On-line (Zoom)
11A-4: 15:00-17:00
Symp. A: Emerging
Breakthroughs in Materials,
Processes and Equipment for
Advanced Lithography
Panel Discussion
Facilitator
Seiji Nagahara (Tokyo Electron)
Koji Asawaka (KIOXIA)
Panelists
Toshiyuki Hisamura, AMD, USA
Jan van Schoot, ASML, The
Netherlands
Toru Fujimori, FUJIFILM
Corporation, Japan
Douglas Guerrero, Brewer Science
Gian Lorusso, imec, Belgium
Linyong Pang, D2S, USA

Wrap up:
Tetsuo Harada, Univ. of Hyogo,Japan